WO2020118703A1 - 一种柔性显示屏及其制备方法,柔性显示装置 - Google Patents
一种柔性显示屏及其制备方法,柔性显示装置 Download PDFInfo
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- WO2020118703A1 WO2020118703A1 PCT/CN2018/121269 CN2018121269W WO2020118703A1 WO 2020118703 A1 WO2020118703 A1 WO 2020118703A1 CN 2018121269 W CN2018121269 W CN 2018121269W WO 2020118703 A1 WO2020118703 A1 WO 2020118703A1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/873—Encapsulations
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- the present application relates to the field of flexible display technology, in particular to a flexible display screen, a method for manufacturing the same, and a flexible display device.
- a flexible display screen is a flexible display device made of flexible materials, which includes electronic paper, a flexible liquid crystal display, and a flexible organic electroluminescent OLED (Organic Light-Emitting Diode, OLED) device.
- Flexible display screens have important applications in the field of display and lighting due to their advantages of light weight, small size, and thinness.
- TFT Thin Film Transistor
- the present application aims to provide a flexible display screen and a preparation method thereof.
- the flexible display device solves the technical problem that the traditional flexible display screen is prone to delamination and scrap when folded.
- a technical solution adopted in the embodiments of the present application is: to provide a method for preparing a flexible display screen, the method comprising: providing a flexible substrate; forming a thin film transistor device layer on a flexible substrate, a thin film transistor device layer Along the extension direction of the flexible substrate, there are alternately distributed protrusions and depressions; a display module is provided on the thin film transistor device layer.
- the thin film transistor device layers alternately undulate along the extending direction of the flexible substrate.
- the protrusions and depressions of the thin film transistor device layer are smooth arcs.
- the forming the thin film transistor device layer on the flexible substrate includes: stretching the flexible substrate; forming a thin film transistor device layer on the stretched upper surface of the flexible substrate; releasing the stretched material In the flexible substrate, the thin film transistor device layer is pressed to form alternately distributed protrusions and depressions.
- the upper surface of the flexible substrate carrying the thin film transistor device layer forms an alternating distribution of undulations.
- the lower surface of the flexible substrate facing away from the thin film transistor device layer remains flat.
- the method further includes: forming a flat layer on the thin film transistor device layer.
- the disposing the display module on the thin film transistor device layer includes forming a display module on the flat layer.
- a technical solution adopted by the embodiments of the present application is to provide a flexible display screen including: a flexible substrate; a thin film transistor device layer formed on the upper surface of the flexible substrate, And the thin film transistor device layer has alternately distributed protrusions and depressions along the extending direction of the flexible substrate; and, a display module, the display module is disposed on the thin film transistor device layer.
- the thin film transistor device layers alternately undulate along the extending direction of the flexible substrate.
- the protrusions and depressions of the thin film transistor device layer are smooth arcs.
- the upper surface of the flexible substrate carrying the thin film transistor device layer forms undulations distributed alternately.
- the lower surface of the flexible substrate facing away from the thin film transistor device layer remains flat.
- the display module includes: a flat layer formed on the thin film transistor device layer.
- a technical solution adopted by the embodiments of the present application is to provide a flexible display device, including the flexible display screen as described above and an encapsulation layer prepared outside the flexible display screen.
- the thin film transistor device layer has alternately distributed protrusions and depressions along the extension direction of the flexible substrate, which increases the strain that the thin film transistor device layer can bear when bending, so that the flexible display screen can be protected It is not damaged during bending, which improves the bending resistance of the flexible display.
- FIG. 1 is a schematic structural diagram of a flexible display screen provided by an embodiment of the present application.
- FIG. 2 is a schematic structural view of the flexible module in FIG. 1;
- FIG. 3 is a schematic diagram of the shape change of the flexible substrate provided by the embodiment of the present application during the process of applying tensile deformation and recovering from releasing tension.
- the flexible display screen has high flexibility, and can be wound into a cylinder or bent into a non-planar shape to improve the portability of the display or to be used for specific display purposes.
- the flexible display screen can be realized by a flexible organic electroluminescence OLED (Organic Light-Emitting Diode, OLED) device.
- OLED Organic Light-Emitting Diode
- the OLED device usually includes a light emitting unit, a thin film transistor, and a flexible substrate.
- the flexible substrate is used as a base to support the light emitting unit and the thin film transistor TFT (Thin Film Transistor, TFT) array.
- TFT Thi Film Transistor
- the flexible display is not limited to OLED, but can also be micro LED, electronic paper, liquid crystal display, etc.
- the embodiment of the present application is to improve the structure of the thin film transistor device.
- the brittle characteristic of the thin film transistor device can be well improved, and the flexible display screen can be improved under multiple bending Reliability and expanding the bending ability of the flexible display screen make it have better application value.
- FIG. 1 is a schematic structural diagram of the flexible display screen 100 provided by the embodiment of the present application.
- the flexible display screen 100 includes: a flexible substrate 10, a thin film transistor device layer 20, and a display module 30.
- the flexible substrate 10 is a supporting structure of a flexible display screen, which is obtained by preparing a specific base material and has a flexible film layer having a thickness and strength that meet the requirements of use.
- the flexible substrate 10 can be prepared by selecting any type of polymer material according to actual needs.
- the polymer material may be selected from polyethylene terephthalate, polyethylene naphthalate, polyimide, polyethersulfone resin, polyethylene, polystyrene, poly Any one or more of carbonate, polyurethane, or silicone rubber.
- the flexible substrate formed by using the above polymer has good flexibility.
- the thickness of the flexible substrate 10 may be 10-50 ⁇ m so that the flexible substrate 10 can have a strong supporting force in addition to satisfying the conditions of the flexible display screen 100 being thin and light.
- the thin film transistor device layer 20 formed by the thin film transistors distributed in an array is closely arranged on one surface of the flexible substrate 10 and is used to drive the light emitting unit to emit light.
- both the light emitting unit and the thin film transistor device can be obtained by using OLED materials commonly used in the art for preparing light emitting devices.
- FIG. 1 illustrates that the surface of the flexible substrate 10 used for carrying the light-emitting unit and the thin film transistor device is the upper surface 101.
- the thin film transistor device layer 20 is formed on the upper surface 101 of the flexible substrate 10, and the thin film transistor device layer 20 has protrusions and depressions alternately distributed along the extending direction of the flexible substrate 10, the protrusions And the depression alternates ups and downs.
- the protrusions and depressions alternately undulate are smooth arcs, and are smoothly connected to form a wavy curved surface as shown in FIG. 1.
- the wavy curved surface specifically refers to an uneven curved surface composed of a series of arcs with opposite directions sequentially connected alternately.
- the radius or curvature of the arc can be set according to actual conditions.
- the thin film transistor device layer 20 has alternating distribution of protrusions and depressions. When bending, winding or otherwise deforming the flexible display screen 100, these alternating distribution of protrusions and depressions can be well dispersed due to bending The stress is not prone to stress concentration. In this way, the thin film transistor device layer 20 can withstand greater strain than the conventional flat structure, reduce the damage of the flexible display screen 100, and improve the reliability of the flexible display screen 100 when used.
- these thin film transistor devices are formed on the upper surface 101 of the flexible substrate 10 by a deposition process.
- the structure of the thin film transistor device layer 20 corresponds to the structure of the upper surface 101 of the flexible substrate 10.
- the upper surface 101 of the flexible substrate 10 is an uneven uneven surface with alternately distributed protrusions and depressions, so that the thin film transistor device layer 20 generates corresponding protrusions and depressions with alternating distribution .
- the lower surface 102 of the flexible substrate 10 facing away from the thin film transistor device layer 20 remains flat as shown in FIG. 1.
- the display module 30 is a display structure of the flexible display screen 100 and is stacked on the thin film transistor device layer 20.
- the display module 30 includes an organic light-emitting unit and a passivation layer encapsulated on the organic light-emitting unit, and emits light under the drive of a thin film transistor.
- the organic light emitting unit may be composed of an anode, a cathode, and one or more organic layers.
- the thin film transistor device layer has alternately distributed protrusions and depressions, which can effectively increase the strain that the thin film transistor device layer can withstand when bending, to protect the flexible display screen from bending It is damaged and the bending resistance of the flexible display screen is improved.
- FIG. 2 is a schematic structural diagram of the display module 30 in FIG. 1 provided by an embodiment of the present application. As shown in FIG. 2, the display module 30 includes a flat layer 31, a light emitting device layer 32 and a passivation layer 33.
- the flat layer 31 is stacked on the thin film transistor device layer 20 to provide a flat surface.
- the light emitting device layer 32 is stacked on the flat surface provided by the flat layer 31, and the light emitting device layer 32 is composed of a plurality of OLED devices distributed in an array.
- the OLED devices in the light emitting device layer 32 are respectively connected to the corresponding thin film transistor devices in the thin film transistor device layer 20, and the thin film transistors drive the OLED devices to emit light to realize the display function of the flexible display screen 100.
- the pleated structure shown in FIG. 1 can be realized by a variety of different preparation methods.
- the embodiment of the present application also provides a preparation method for realizing the above-mentioned pleated structure.
- the preparation method may include the following steps:
- Step 10 Provide a flexible substrate, and form a thin film transistor device layer on the flexible substrate.
- the thin film transistor device layer has alternately distributed protrusions and depressions along the extending direction of the flexible substrate.
- the flexible substrate is the supporting structure of the entire flexible display screen, and can be prepared by selecting a suitable type of polymer material. It is a flexible film layer with a specific thickness, which can be stretched without breaking within the allowable range.
- the polymer raw material may be selected from polyethylene terephthalate, polyethylene naphthalate, polyimide, polyethersulfone resin, polyethylene, poly One or more of styrene, polycarbonate, polyurethane or silicone rubber to make the flexible substrate have sufficient tensile properties.
- a thin film transistor device layer is formed on the flexible substrate.
- the thin film transistor device layer has alternating protrusions and depressions along the extending direction of the flexible substrate, which can be achieved as follows:
- Step 101 Stretch the flexible substrate to form a thin film transistor device layer on the stretched upper surface of the flexible substrate.
- the thin film transistors can be deposited in an array on a flexible substrate to form the thin film transistor device layer of the above flexible display screen, which can be deposited on the upper surface of the flexible substrate by any suitable method according to actual needs, for example, physical Vapor deposition (Physical Vapor Deposition, PVD), chemical vapor deposition (Chemical Vapor Deposition, CVD), etc.
- PVD Physical Vapor Deposition
- CVD chemical vapor deposition
- the stretched length of the flexible substrate may be set to 10%-30% of the original length of the flexible substrate. After many experiments, it has been confirmed that the flexible substrate has the best elastic recovery ability within this length range.
- Step 102 The stretched flexible substrate is released, so that the thin film transistor device layer is pressed to form alternately distributed protrusions and depressions.
- the flexible substrate After the flexible substrate is released and the pulling force applied to the flexible substrate is removed, the flexible substrate will be contracted by the resilience and the thin film transistor device layer will eventually form the above-mentioned alternately distributed protrusions and depressions as shown in FIG. 1.
- Step 20 Set a display module on the thin film transistor device layer.
- the display module is a display structure of a flexible display screen, which includes an organic light-emitting unit and a passivation layer encapsulated on the organic light-emitting unit, which is arranged on a thin film transistor device layer and emits light under the drive of the thin film transistor.
- the preparation method of the embodiments of the present application utilizes the flexibility and resilience of the flexible substrate itself, and by applying tension and recovery steps to the flexible substrate, a non-flat surface is formed on the upper surface of the flexible substrate with alternating distribution
- the protrusions and depressions cause corresponding alternating distribution of protrusions and depressions in the thin film transistor device layer.
- the alternately distributed protrusions and depressions shown in FIG. 1 can also be obtained by other suitable processes and are not limited to the above-mentioned preparation methods.
- an uneven surface may be etched on the upper surface 101 of the flexible substrate 10 so as to deposit on the upper surface 101 of the flexible substrate 10 to cause the thin film transistor device layer 20 to have a wrinkle structure to achieve the same technical effect, or A flexible substrate with a pleated structure is directly produced by hot press molding.
- the wrinkle structure can avoid the occurrence of stress concentration, can bear greater strain, and improve the bending ability and reliability of the flexible display screen.
- FIG. 3 is a schematic diagram of a shape change of a flexible substrate during a process of applying tensile deformation and recovering from releasing tension provided by an embodiment of the present application.
- FIG. 3 takes the flexible substrate 310 having a set thickness as an example.
- the flexible substrate 310 has an uneven and wavy surface, and its shape changing process is as follows:
- a tensile force F as shown in FIG. 3 is applied to both ends of the flexible substrate 310, so that the flexible substrate 310 produces a tensile deformation, and the original uneven wave-like surface deformation It must be relatively flat. That is, the height of the protrusions and the depth of the depressions of the wavy surface both decrease, and the slope of the curve becomes smaller.
- a thin film transistor array is formed on the flattened surface by physical vapor deposition or chemical vapor deposition, and a thin film transistor device layer 320 is generated.
- the embodiments of the present application further provide a flexible display device.
- the flexible display device includes: a flexible display screen, and an encapsulation layer prepared outside the flexible display screen .
- the flexible display screen includes: a flexible substrate with a wrinkle area formed on the surface of the flexible substrate; a thin film transistor device layer deposited on the wrinkle area with alternating protrusions and depressions; A display module, which is disposed on the thin film transistor device layer.
- the encapsulation layer protects the flexible display screen by encapsulating or covering the outside of the flexible display screen, and is used to provide a stable and reliable working environment for the flexible display screen and ensure that the flexible display screen has high stability and reliability Sex.
- the package can be achieved by passivating the outside of the flexible display screen to generate a dense oxide film or compound.
- the bending resistance principle of the flexible display device provided by the embodiment of the present application is the same as the bending resistance principle of the flexible display screen in the above embodiments.
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Abstract
一种柔性显示屏(100)及其制备方法、柔性显示装置,该制备方法包括:提供柔性基板(10),在柔性基板(10)上形成薄膜晶体管器件层(20),薄膜晶体管器件层(20)沿柔性基板(10)的延伸方向具有交替分布的凸起及凹陷;在薄膜晶体管器件层(20)上设置显示模组(30)。该柔性显示屏(100)的薄膜晶体管器件层(20)沿柔性基板(10)的延伸方向具有交替分布的凸起及凹陷,增加了薄膜晶体管器件层(20)弯曲时所能承受的应变,可以保护柔性显示屏(100)在弯曲时不受破坏,提高了柔性显示屏(100)的抗弯折性能。
Description
本申请涉及柔性显示技术领域,尤其是涉及一种柔性显示屏及其制备方法,柔性显示装置。
柔性显示屏是采用柔性材料制成的可弯曲变形的显示装置,其包括电子纸、柔性液晶显示器和柔性有机电致发光OLED(Organic Light-Emitting Diode,OLED)器件。柔性显示屏以其重量轻、体积小、薄型化等优点在显示与照明领域有着重要应用。
目前柔性显示屏的制作方法一般包括:使用高分子材料作为柔性基板,然后在柔性基板上形成薄膜晶体管TFT(Thin Film Transistor)以及其他显示层,并进行封装。由于TFT是偏脆性的元器件,在柔性显示屏发生弯曲、折叠时其容易受到较大的应变应力使该层发生脱落而毁坏,导致柔性显示屏报废。
发明内容
本申请旨在提供一种柔性显示屏及其制备方法,柔性显示装置以解决传统柔性显示屏在折叠时,容易发生分层而报废的技术问题。
为解决上述技术问题,本申请实施例采用的一个技术方案是:提供一种柔性显示屏的制备方法,所述方法包括:提供柔性基板;在柔性基板上形成薄膜晶体管器件层,薄膜晶体管器件层沿柔性基板的延伸方向具有交替分布的凸起及凹陷;在所述薄膜晶体管器件层上设置显示模组。
可选地,所述薄膜晶体管器件层沿所述柔性基板的延伸方向交替起伏。
可选地,所述薄膜晶体管器件层的所述凸起和所述凹陷均为平滑的弧形。
可选地,所述在柔性基板上形成薄膜晶体管器件层,包括:将所述柔性基板拉伸;在所述柔性基板被拉伸的上表面上形成薄膜晶体管器件层;释放被拉伸的所述柔性基板,使所述薄膜晶体管器件层被挤压形成交替分布的凸起及凹陷。
可选地,在所述柔性基板被释放之后,所述柔性基板承载所述薄膜晶体管器件层的上表面形成交替分布的起伏。
可选地,在所述柔性基板被释放之后,所述柔性基板背离所述薄膜晶体管器件层的下表面保持平坦。
可选地,在所述薄膜晶体管器件层上设置显示模组之前,所述方法还包括:在薄膜晶体管器件层上形成平坦层。
所述在所述薄膜晶体管器件层上设置显示模组,包括:在所述平坦层上形成显示模组。
为解决上述技术问题,本申请实施例采用的一个技术方案是:提供一种柔性显示屏,包括:柔性基板;薄膜晶体管器件层,所述薄膜晶体管器件层形成于所述柔性基板的上表面,并且在所述薄膜晶体管器件层沿所述柔性基板的延伸方向具有交替分布的凸起及凹陷;以及,显示模组,所述显示模组设置于所述薄膜晶体管器件层上。
可选地,所述薄膜晶体管器件层沿所述柔性基板的延伸方向交替起伏。
可选地,所述薄膜晶体管器件层的所述凸起和所述凹陷均为平滑的弧形。
可选地,所述柔性基板承载所述薄膜晶体管器件层的上表面形成交替分布的起伏。
可选地,所述柔性基板背离所述薄膜晶体管器件层的下表面保持平坦。
可选地,所述显示模组包括:平坦层,所述平坦层形成于所述薄膜晶体管器件层上。
为解决上述技术问题,本申请实施例采用的一个技术方案是:提供一种柔性显示装置,包括:如上所述的柔性显示屏和制备于所述柔性显示屏外部的封装层。
本申请实施例提供的柔性显示屏,其薄膜晶体管器件层沿柔性基板的延伸方向具有交替分布的凸起及凹陷,增加了薄膜晶体管器件层弯曲时所能承受的应变,这样可以保护柔性显示屏在弯曲时不受破坏,提高了柔性显示屏的抗弯折性能。
图1是本申请实施例提供的柔性显示屏的结构示意图;
图2是图1中柔性模组的结构示意图;
图3是本申请实施例提供的柔性基材在施力拉伸形变和释放拉力恢复的工艺过程中的形状变化示意图。
为了使本申请的目的、方案及优点更加清楚明白,以下结合实施例,对本申请进行进一步详细说明。应当理解,此处所描述的具体实施例仅用以解释本申请,并不用于限定本申请。此外,下面所描述的本申请不同实施例中所涉及的技术特征只要彼此之间未构成冲突就可以相互结合。
柔性显示屏具有较高的柔韧性,可以被卷绕形成圆柱或者弯曲成非平面形状以提高显示器的便携性或者用以完成特定显示目的。
惯常的,柔性显示屏可以通过柔性有机电致发光OLED(Organic Light-Emitting Diode,OLED)器件实现。该OLED器件通常包括发光单元、薄膜晶体管以及柔性基板。其中,柔性基板作为基底,用于支撑发光单元和薄膜晶体管TFT(Thin Film Transistor,TFT)阵列。当然,柔性显示屏也并不限于OLED,还可以是micro LED、电子纸、液晶显示屏等。
本申请实施例即对薄膜晶体管器件的结构进行改善,应用本申请实施例提供的薄膜晶体管器件结构,可以很好的改善薄膜晶体管器件的易脆特性,提高柔性显示屏在多次弯折下的可靠性,拓展柔性显示屏的弯曲能力使其具有更好的应用价值。
以下首先对本申请实施例提供的柔性显示屏进行介绍,请参阅图1,图1是本申请实施例提供的柔性显示屏100的结构示意图。其中,图1中以柔性有机电致发光OLED器件为例,所述柔性显示屏100包括:柔性基板10、薄膜晶体管器件层20和显示模组30。
柔性基板10是柔性显示屏的支撑结构,由特定的基材制备获得的,具有满足使用要求的厚度和强度的柔性膜层。该柔性基板10可以根据实际情况的需要,选择任何类型的聚合物材料制备获得。
在一些实施例中,所述聚合物材料可以选自聚对苯二甲酸乙二酯、聚萘二甲酸乙二醇酯、聚酰亚胺、聚醚砜树脂、聚乙烯、聚苯烯、聚碳酸酯、聚氨酯或者硅橡胶中的任一种或多种。采用上述聚合物形成的柔性基板具有较好的柔 韧性。
具体的,该柔性基板10的厚度可以为10-50μm以使所述柔性基板10在满足柔性显示屏100轻薄的条件外,还可以具有较强的支撑力。
薄膜晶体管呈阵列式分布形成的薄膜晶体管器件层20紧贴设置在柔性基板10的其中一个表面上,用以驱动发光单元发光。具体的,所述发光单元和薄膜晶体管器件都可以使用本领域常用的制备发光器件的OLED材料制备获得。
图1以柔性基板10用于承载所述发光单元和薄膜晶体管器件的表面为上表面101进行示意。所述薄膜晶体管器件层20形成于所述柔性基板10的上表面101,并且在所述薄膜晶体管器件层20沿所述柔性基板10的延伸方向具有交替分布的凸起及凹陷,所述凸起及凹陷交替起伏。
在一具体示例中,所述凸起及凹陷交替起伏,均为平滑的弧形,并且平滑连接,形成如图1所示的波浪状弯曲面。该波浪状弯曲面具体是指由一系列朝向相反的圆弧依次交替连接组成的凹凸不平的曲面。该圆弧的半径或者曲率具体可以根据实际情况设置。
所述薄膜晶体管器件层20由于具有交替分布的凸起及凹陷,在弯曲、卷绕或以其他方式使柔性显示屏100变形时,这些交替分布的凸起及凹陷可以很好的分散因弯曲产生的应力,不容易出现应力集中的现象。这样可以使得所述薄膜晶体管器件层20相对于常规的平整结构,能够承受更大的应变,减少柔性显示屏100被破坏的情况,提高了柔性显示屏100使用时的可靠性。
通常这些薄膜晶体管器件都是采用沉积工艺形成于柔性基板10的上表面101。这样,薄膜晶体管器件层20的结构与柔性基板10的上表面101的结构相对应。
在一具体示例中,所述柔性基板10的上表面101是一个凹凸不平的非平整面,具有交替分布的凸起及凹陷,以便薄膜晶体管器件层20产生相应的具有交替分布的凸起及凹陷。
柔性基板10背离所述薄膜晶体管器件层20的下表面102则如图1所示,保持平坦。
显示模组30是柔性显示屏100的显示结构,层叠设置于薄膜晶体管器件层20上。所述显示模组30包括有机发光单元和封装在有机发光单元上的钝化层组成,在薄膜晶体管驱动下发光。一般的,有机发光单元可以由阳极、阴极以及 一个或者多个有机层组成。
本申请实施例提供的柔性显示屏中,薄膜晶体管器件层具有具有交替分布的凸起及凹陷,可以有效的增加薄膜晶体管器件层弯曲时所能承受的应变,以保护柔性显示屏在弯曲时不受破坏,提高了柔性显示屏的抗弯折性能。
图2为本申请实施例提供的图1中显示模组30的结构示意图。如图2所示,所述显示模组30包括:平坦层31、发光器件层32以及钝化层33。
所述平坦层31层叠设置于薄膜晶体管器件层20上,提供一个平坦的表面。
所述发光器件层32层叠在所述平坦层31提供的平坦表面上,所述发光器件层32由多个呈阵列分布的OLED器件组成。
处于发光器件层32的OLED器件分别与处于薄膜晶体管器件层20的对应的薄膜晶体管器件相连,由薄膜晶体管驱动OLED器件发光以实现柔性显示屏100的显示功能。
图1所示的褶皱结构具体可以通过多种不同的制备方法来实现。本申请实施例还提供一种实现上述褶皱结构的制备方法。所述制备方法可以包括如下步骤:
步骤10:提供柔性基板,在柔性基板上形成薄膜晶体管器件层,薄膜晶体管器件层沿柔性基板的延伸方向具有交替分布的凸起及凹陷。
该柔性基板是整个柔性显示屏的支撑结构,具体可以选用合适类型的聚合物原料制备获得,其是一个具有特定厚度的柔性膜层,可以在允许的范围内被拉伸而不断裂。
具体的,根据实际的工艺要求,所述聚合物原料其可以选自聚对苯二甲酸乙二酯、聚萘二甲酸乙二醇酯、聚酰亚胺、聚醚砜树脂、聚乙烯、聚苯烯、聚碳酸酯、聚氨酯或者硅橡胶中的一种或多种以使柔性基板具有足够的拉伸性能。
在柔性基板上形成薄膜晶体管器件层,该薄膜晶体管器件层沿柔性基板的延伸方向具有交替分布的凸起及凹陷,可以通过如下方式实现:
步骤101:将所述柔性基板拉伸,在所述柔性基板被拉伸的上表面上形成薄膜晶体管器件层。
该薄膜晶体管可以呈阵列分布式沉积在柔性基板上以形成上述柔性显示屏的薄膜晶体管器件层,其具体可以根据实际情况的需要,通过任何合适的方式沉积在柔性基板的上表面,例如,物理气相沉积(Physical Vapor Deposition, PVD),化学气相沉积(Chemical Vapor Deposition,CVD)等。
所述柔性基板的拉伸长度可以设置为所述柔性基板原始长度的10%-30%,经过多次实验证实,在该长度范围内,柔性基板具有最佳的弹性恢复能力。
步骤102:释放被拉伸的所述柔性基板,使所述薄膜晶体管器件层被挤压形成交替分布的凸起及凹陷。
在释放柔性基板,撤除施加在柔性基板上的拉力以后,柔性基板会受到回弹力的影响而收缩,薄膜晶体管器件层最终便会形成上述如图1所示的交替分布的凸起及凹陷。
步骤20:在所述薄膜晶体管器件层上设置显示模组。
显示模组是柔性显示屏的显示结构,其包括有机发光单元和封装在有机发光单元上的钝化层组成,其设置在薄膜晶体管器件层上,在薄膜晶体管驱动下发光。
本申请实施例的制备方法利用柔性基板自身具有的柔韧性和回弹力,通过对柔性基板施加拉力和恢复的步骤,简便的在柔性基板的上表面上形成一个非平整的表面,具有交替分布的凸起及凹陷,令薄膜晶体管器件层产生相应的交替分布的凸起及凹陷。
应当说明的是,图1所示的交替分布的凸起及凹陷也可以采用其它合适的工艺制程获得,而不限于上述制备方法。例如,也可以在柔性基材10的上表面101蚀刻出凹凸不平的非平整表面以使得沉积于柔性基板10的上表面101,使薄膜晶体管器件层20产生褶皱结构,达到相同的技术效果,或者通过热压成型的方式直接制作出褶皱结构的柔性基材。褶皱结构可以避免应力集中现象的发生,能够承受更大的应变,提高柔性显示屏的弯折能力和可靠性。
图3为本申请实施例提供的,柔性基材在施力拉伸形变和释放拉力恢复的工艺过程中的形状变化示意图。图3以具有设定厚度的柔性基材310为例。从图3可以看出,该柔性基材310具有凹凸不平的波浪状表面,其形状变化过程具体如下:
首先,通过合适的夹具工装或者其它类型的设备,在柔性基材310的两端施加如图3所示的拉力F,使得柔性基材310产生拉伸形变,原有凹凸不平的波浪状表变得比较平整。亦即,波浪状表面的凸起的高度和凹陷的深度均下降,曲线的斜率变小。
然后,通过物理气相沉积或者化学气相沉积的方式,在变得平坦的表面沉积形成薄膜晶体管阵列,产生薄膜晶体管器件层320。
最后,释放施加在柔性基材310两端的拉力。此时柔性基材310基于自身具备的回弹力,恢复至初始的波浪状表面,同时使得膜晶体管器件层形成褶皱结构。
基于上述实施例公开的柔性显示屏的制备方法,本申请实施例还进一步提供了一种柔性显示装置,所述柔性显示装置包括:柔性显示屏,以及制备于所述柔性显示屏外部的封装层。所述柔性显示屏包括:柔性基板,所述柔性基板的表面上形成有褶皱区;薄膜晶体管器件层,所述薄膜晶体管器件层沉积于所述褶皱区上,具有交替分布的凸起及凹陷;显示模组,所述显示模组设置于所述薄膜晶体管器件层上。
所述封装层通过封装或者覆盖在柔性显示屏的外部,对柔性显示屏起到保护的作用,用于为柔性显示屏提供一稳定可靠的工作环境,并保证柔性显示屏具有高稳定性和可靠性。在一具体实例中,可以通过对柔性显示屏的外部进行钝化处理,以生成致密的氧化膜或化合物来实现封装。
本申请实施例提供的柔性显示装置其抗弯折原理与上述实施例中的柔性显示屏的抗弯折原理一致,具体可以参考上述实施例中的柔性显示屏的抗弯折原理,在此不再赘述。
以上所述仅为本申请的实施例,并非因此限制本申请的专利范围,凡是利用本申请说明书及附图内容所作的等效结构或等效流程变换,或直接或间接运用在其他相关的技术领域,均同理包括在本申请的专利保护范围内。
Claims (16)
- 一种柔性显示屏的制备方法,其特征在于,所述方法包括:提供柔性基板;在柔性基板上形成薄膜晶体管器件层,所述薄膜晶体管器件层沿所述柔性基板的延伸方向具有交替分布的凸起及凹陷;在所述薄膜晶体管器件层上设置显示模组。
- 根据权利要求1所述的制备方法,其特征在于,所述薄膜晶体管器件层沿所述柔性基板的延伸方向交替起伏。
- 根据权利要求1所述的制备方法,其特征在于,所述薄膜晶体管器件层的所述凸起和所述凹陷均为平滑的弧形。
- 根据权利要求1所述的制备方法,其特征在于,所述在柔性基板上形成薄膜晶体管器件层,包括:将所述柔性基板拉伸;在所述柔性基板被拉伸的上表面上形成薄膜晶体管器件层;释放被拉伸的所述柔性基板,使所述薄膜晶体管器件层被挤压形成交替分布的凸起及凹陷。
- 根据权利要求4所述的制备方法,其特征在于,在所述柔性基板被释放之后,所述柔性基板承载所述薄膜晶体管器件层的上表面形成交替分布的起伏。
- 根据权利要求4所述的制备方法,其特征在于,在所述柔性基板被释放之后,所述柔性基板背离所述薄膜晶体管器件层的下表面保持平坦。
- 根据权利要求4所述的制备方法,其特征在于,在所述薄膜晶体管器件层上设置显示模组之前,所述方法还包括:在薄膜晶体管器件层上形成平坦层。
- 根据权利要求7所述的制备方法,其特征在于,所述在所述薄膜晶体管器件层上设置显示模组,包括:在所述平坦层上形成显示模组。
- 根据权利要求4所述的制备方法,其特征在于,所述柔性基板的拉伸长度为所述柔性基板原始长度的10%-30%。
- 一种柔性显示屏,其特征在于,包括:柔性基板;薄膜晶体管器件层,所述薄膜晶体管器件层形成于所述柔性基板的上表面,并且在所述薄膜晶体管器件层沿所述柔性基板的延伸方向具有交替分布的凸起及凹陷;以及,显示模组,所述显示模组设置于所述薄膜晶体管器件层上。
- 根据权利要求10所述的柔性显示屏,其特征在于,所述薄膜晶体管器件层沿所述柔性基板的延伸方向交替起伏。
- 根据权利要求10所述的柔性显示屏,其特征在于,所述薄膜晶体管器件层的所述凸起和所述凹陷均为平滑的弧形。
- 根据权利要求10所述的柔性显示屏,其特征在于,所述柔性基板承载所述薄膜晶体管器件层的上表面形成交替分布的起伏。
- 根据权利要求10所述的柔性显示屏,其特征在于,所述柔性基板背离所述薄膜晶体管器件层的下表面保持平坦。
- 根据权利要求10所述的柔性显示屏,其特征在于,所述显示模组包括:平坦层,所述平坦层形成于所述薄膜晶体管器件层上。
- 一种柔性显示装置,其特征在于,包括:如权利要求10-15任一项所述的柔性显示屏和制备于所述柔性显示屏外部的封装层。
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| US8217381B2 (en) * | 2004-06-04 | 2012-07-10 | The Board Of Trustees Of The University Of Illinois | Controlled buckling structures in semiconductor interconnects and nanomembranes for stretchable electronics |
| KR102316211B1 (ko) * | 2014-11-24 | 2021-10-22 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
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| US20130100053A1 (en) * | 2011-10-20 | 2013-04-25 | Samsung Electronics Co., Ltd. | Flexible display device |
| CN106847832A (zh) * | 2017-03-23 | 2017-06-13 | 武汉华星光电技术有限公司 | 柔性基板及柔性显示器 |
| CN107564415A (zh) * | 2017-08-28 | 2018-01-09 | 上海天马有机发光显示技术有限公司 | 柔性显示面板、显示装置及其制作方法 |
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