WO2020104801A1 - Noble gas recovery method and apparatus - Google Patents

Noble gas recovery method and apparatus

Info

Publication number
WO2020104801A1
WO2020104801A1 PCT/GB2019/053289 GB2019053289W WO2020104801A1 WO 2020104801 A1 WO2020104801 A1 WO 2020104801A1 GB 2019053289 W GB2019053289 W GB 2019053289W WO 2020104801 A1 WO2020104801 A1 WO 2020104801A1
Authority
WO
WIPO (PCT)
Prior art keywords
fluid
insulated
vessel
adsorption vessel
adsorption
Prior art date
Application number
PCT/GB2019/053289
Other languages
French (fr)
Inventor
Rob GRANT
Original Assignee
Gas Recovery And Recycle Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gas Recovery And Recycle Limited filed Critical Gas Recovery And Recycle Limited
Priority to US17/295,274 priority Critical patent/US20220016568A1/en
Priority to EP19809600.0A priority patent/EP3883669A1/en
Publication of WO2020104801A1 publication Critical patent/WO2020104801A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/047—Pressure swing adsorption
    • B01D53/0476—Vacuum pressure swing adsorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B01D53/0438—Cooling or heating systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/047—Pressure swing adsorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/20—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising free carbon; comprising carbon obtained by carbonising processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/30—Processes for preparing, regenerating, or reactivating
    • B01J20/34—Regenerating or reactivating
    • B01J20/3408—Regenerating or reactivating of aluminosilicate molecular sieves
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C01B23/001—Purification or separation processes of noble gases
    • C01B23/0036—Physical processing only
    • C01B23/0052—Physical processing only by adsorption in solids
    • C01B23/0057—Physical processing only by adsorption in solids characterised by the adsorbent
    • C01B23/0068—Zeolites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/106—Silica or silicates
    • B01D2253/108—Zeolites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/106—Silica or silicates
    • B01D2253/108—Zeolites
    • B01D2253/1085—Zeolites characterized by a silicon-aluminium ratio
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/12—Oxygen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/18—Noble gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/20—Carbon monoxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/22—Carbon dioxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2256/00—Main component in the product gas stream after treatment
    • B01D2256/24—Hydrocarbons
    • B01D2256/245—Methane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/10—Single element gases other than halogens
    • B01D2257/102—Nitrogen
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/50—Carbon oxides
    • B01D2257/504—Carbon dioxide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/80—Water
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/40007—Controlling pressure or temperature swing adsorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/40—Further details for adsorption processes and devices
    • B01D2259/416—Further details for adsorption processes and devices involving cryogenic temperature treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00054—Controlling or regulating the heat exchange system
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0029—Obtaining noble gases
    • C01B2210/0034—Argon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0043—Impurity removed
    • C01B2210/0045—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0043—Impurity removed
    • C01B2210/0046—Nitrogen
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0043—Impurity removed
    • C01B2210/005—Carbon monoxide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0043—Impurity removed
    • C01B2210/0051—Carbon dioxide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2210/00—Purification or separation of specific gases
    • C01B2210/0043—Impurity removed
    • C01B2210/0068—Organic compounds
    • C01B2210/007—Hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B23/00—Noble gases; Compounds thereof
    • C01B23/001—Purification or separation processes of noble gases
    • C01B23/0036—Physical processing only
    • C01B23/0052—Physical processing only by adsorption in solids
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/40—Capture or disposal of greenhouse gases of CO2

Definitions

  • the present invention relates to a process of purifying a fluid used in a manufacturing process, particularly in the manufacture of silicon wafers, by removing one or more impurities.
  • Silicon wafers are thin layers (slithers) of crystalline silicon, a semiconductor material, and are commonly used in solar photovoltaic cells and in microelectronic devices such as computers and mobile phones. Silicon wafers are typically cut from silicon ingots that may be manufactured in a vacuum furnace, a high temperature crystallization process under a controlled atmosphere. Such processes are commonly carried out under a noble gas, particularly argon, atmosphere and there is a need for high purity noble gases for use in the vacuum furnace process.
  • a noble gas particularly argon
  • the impurity levels required for the photovoltaic industry are achieved through the distillation of liquid air, a standard industrial process, whereas further purification steps are required to meet the ultra-high purity specifications required by the microelectronics industry, in particular to achieve the ultra-low nitrogen and methane levels required.
  • Ambient temperature purifiers are a known method of removing impurity species to the levels required by the microelectronics industry.
  • medium temperature chemical looping is a known method of removing impurity species to the levels required by the microelectronics industry.
  • combustionbased purification systems are another known method.
  • these methods do not remove methane or nitrogen, the impurity levels of which will rise with repeated recycling to ultimately unacceptable levels.
  • a frequently used purification process to remove nitrogen and methane is the use of hot metal getters (eg titanium, zirconium, vanadium, aluminium, iron and/or alloys thereof) at a temperature of 400-700°C.
  • hot metal getters eg titanium, zirconium, vanadium, aluminium, iron and/or alloys thereof
  • the materials are expensive and cannot be regenerated.
  • such hot metal getter processes are only efficient at removing nitrogen and methane at impurity levels of ⁇ 10ppm. Impurity levels, greater than approximately lOppm cause breakthrough, resulting in the need to stop the process and replace the getter, with associated costs and delay.
  • W02011/092507A1 discusses a process of recovering an inert gas from a gas stream comprising the noble gas and oxidisable impurities, the process comprising oxidising the impurities in a chemical looping combustion (CLC) reactor and removing the resulting carbon dioxide and water from the gas stream.
  • CLC chemical looping combustion
  • the invention provides a process for purifying a fluid, the process comprising the steps of:
  • an insulated adsorption vessel (1) comprising an adsorptive media, preferably an aluminosilicate;
  • the process of the invention may comprise an additional preliminary adsorption step prior to the process steps described above.
  • the invention therefore further provides a process for purifying a fluid, the process comprising the steps of:
  • a first adsorption vessel which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from +40°C to -40°C, preferably from +15°C to +30°C;
  • a second adsorption vessel which is insulated, comprising an adsorptive media, preferably an aluminosilicate;
  • the one or more impurities Gl have a lower freezing point than the one or more impurities Gl-0.
  • the invention further provides an alternative process for purifying a fluid, the process comprising the steps of
  • the invention further provides apparatus for use in a process for purifying, recovering and recycling a fluid according to the present invention, the apparatus comprising: o
  • a heat exchange unit suitable for cooling a fluid FI to a temperature in the range of from -40°C to -130°C,
  • An insulated adsorption vessel comprising an adsorptive media
  • Figure 1 shows an apparatus of the invention.
  • Figure 2 shows an apparatus of the invention wherein the fluid is cooled using a heat exchange unit.
  • Figure 3 shows an apparatus of the invention comprising a pair of adsorption vessels.
  • Figure 4 shows the construction of the adsorption vessel.
  • Figure 5 shows an apparatus of the invention comprising a pair of adsorption cells and further comprising an alternative regeneration process.
  • Figure 6 shows an apparatus of the invention comprising two adsorption cells operating at different temperatures.
  • Figure 7 shows the adsorption of lOOppm of Nitrogen during the process of the invention.
  • the invention provides an improved process for removing impurities such as nitrogen, oxygen, carbon dioxide, carbon monoxide and methane from a fluid useful in, or recovered from, manufacturing processes.
  • the process of the invention provides an efficient and cost-effective method of purifying and recycling gases from industrial processes, such as vacuum furnace processes.
  • industrial processes such as vacuum furnace processes.
  • vacuum for regeneration has clear advantages, including requiring less time for regeneration; requiring less energy; and having a lower associated cost.
  • the process of the invention is effective at removing nitrogen impurities up to a level of 500ppm or higher so that the gases may be recycled for long periods, such as up to 12 months, up to 18 months, or up to 24 months, without causing the purification process to lose efficiency.
  • the invention provides a process for purifying a fluid, the process comprising the steps of:
  • the invention provides a process according to embodiment 1, the process further comprising the precursory steps:
  • a first adsorption vessel which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from +40°C to -40°C, preferably from +15°C to +30°C;
  • the invention provides a process comprising:
  • a first adsorption vessel which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from +40°C to -40°C, preferably from +15°C to +30°C;
  • a second adsorption vessel which is insulated, comprising an adsorptive media, preferably an aluminosilicate (i.e, the insulated adsorption vessel according to embodiment 1);
  • the one or more impurities Gl have a lower freezing point than the one or more impurities Gl-0.
  • the second adsorption vessel of Embodiment is the insulated adsorption vessel as defined in Embodiment 1.
  • the invention provides a process according to embodiment 1 or 2, wherein the first fluid FI or Fl-0 is any fluid useful in manufacturing and each Gl or Gl-0 is independently selected from nitrogen, oxygen, carbon dioxide, carbon monoxide, methane and mixtures thereof.
  • the invention provides a process according any preceding embodiment, wherein FI or Fl-0 is a noble gas or mixture thereof, more preferably FI or Fl-0 is selected from argon, xenon, helium, neon, and mixtures thereof; and each G1 or Gl-0 is independently selected from nitrogen, oxygen, carbon dioxide, carbon monoxide, methane and mixtures thereof.
  • the invention provides a process according to any one of embodiments 1 to 3, wherein FI of Fl-0 is methane and G1 or Gl-0 is carbon dioxide.
  • the invention provides a process according to any preceding Embodiment or according to Embodiment 13, wherein the insulated adsorption vessel (1) as defined in
  • Embodiment 1 or the second adsorption vessel as defined in Embodiment 2, or the first pair of insulated adsorption vessels as defined in Embodiment 13, has an operating temperature T1 of from -80°C to -130°C.
  • the invention provides a process according to any preceding embodiment, or according to Embodiment 13, wherein the insulated adsorption vessel (1) as defined in
  • Embodiment 1 or the second adsorption vessel as defined in Embodiment 2, or the first pair of insulated adsorption vessels as defined in Embodiment 13, has an operating temperature of from -90°C to -110°C.
  • the invention provides a process according to any preceding embodiment, or according to embodiment 13, wherein the insulated adsorption vessel (1) as defined in
  • Embodiment 1 or the second adsorption vessel as defined in Embodiment 2, or the first pair of insulated adsorption vessels as defined in Embodiment 13, has an operating temperature of from -100°C to -120°C.
  • the invention provides a process according to any one of embodiments 2 to 8, wherein the operating temperature Tl-0 is greater than 0°C and less than or equal to +40°C, more preferably in the range from +15°C to +30°C.
  • the operating temperature Tl-0 is ambient temperature (i.e. about 25°C ⁇ 5°C).
  • the vessel is insulated.
  • the invention provides a process according to any one of embodiments 2 to 9, further comprising:
  • the invention provides a process according to Embodiment 10, wherein: o Temperature Tl-0 is greater than 0°C and less than or equal to +40°C, preferably in the range from +15°C to +30°C;
  • Temperature Tl is in the range from 0°C to -50 °C;
  • Temperature T2 is in the range from -40°C to -130°C, preferably from -90°C to -110°C.
  • the process provides a pair of insulated adsorption vessels 1A and IB in order to avoid the need to pause the process during
  • the invention provides a process according to any one of the preceding embodiments, the process comprising:
  • the invention provides a process according to any one of embodiments 2 to 11, the process comprising
  • an adsorption vessel (1) which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from -40°C to +40°C, preferably from +15°C to +30°C;
  • the one or more impurities Gl have a lower freezing point than the one or more impurities Gl-0.
  • the invention provides a process according to any one of embodiments 2 to 11 and 13, wherein the first fluid Fl-0 comprises argon.
  • the invention provides a process according to any one of embodiments 2 to 11 and 13 to 14, wherein the one or more impurities Gl or Gl-0 comprise CO2, FI2O, or mixtures thereof.
  • the invention provides a process according to any one of embodiments 2 to 11 and 13 to 15, wherein the one or more impurities Gl or Gl-0 comprise N2, O2, and mixtures thereof.
  • each insulated adsorption vessel independently comprises adsorptive media selected from zeolites, molecular sieves, calcium chloride, calcium sulphate activated carbon, and metal organic frameworks (MOF).
  • the first adsorption vessel preferably comprises adsorptive media selected from molecular sieves, calcium chloride, calcium sulphate and activated carbon; and the second adsorption vessel preferably comprises adsorptive media selected from zeolites, molecular sieves, activated carbon, and metal organic frameworks (MOF).
  • each insulated adsorption vessel is vacuum insulated. It will be understood that the first adsorption vessel according to embodiment 2 does not require insulation when the operating temperature is from 0°C to +40°C , more particularly from +15°C to +30°C.
  • W02011092507 discloses a process for purifying a noble gas stream, the process comprising oxidizing impurities in the gas stream and removing the resulting carbon dioxide and water. Such an oxidation step may be carried out prior to the process of the invention.
  • the invention therefore provides an alternative process for purifying a fluid, the process comprising the steps of:
  • an insulated adsorption vessel (1) comprising an adsorptive media, preferably an aluminosilicate;
  • the invention provides a process according to embodiment 19, wherein the oxidation reactor comprises a solid state oxygen carrier; preferably comprising at least one transition metal oxide; optionally the transition metal oxide is provided on an inert support material comprising an oxide of an element selected from the periodic table classification Group MIA, Group IVA, Group NIB, Group IVB and the lanthanide series.
  • the oxidation reactor comprises a solid state oxygen carrier; preferably comprising at least one transition metal oxide; optionally the transition metal oxide is provided on an inert support material comprising an oxide of an element selected from the periodic table classification Group MIA, Group IVA, Group NIB, Group IVB and the lanthanide series.
  • the invention provides a process according to any preceding embodiment wherein the step of regenerating the one or more adsorption vessels by vacuum occurs at a pressure in the range of l.OxlO 4 and 1.0xl0 3 mb; preferably about 6.0 x 10 3 mbar, more preferably about 8.0 x 10 3 mbar.
  • the pressure is 2.0xl0 3 mb or less, preferably 2.0xl0 4 mb or less, more preferably 5.0xl0 5 mb or less.
  • the purified fluid collected from the process according to any embodiment of the invention may be recycled for use in a further industrial process such as in a vacuum furnace process for silicon wafer manufacture or in an additive manufacturing process for 3D printing of metallic parts.
  • the cold purified fluid (F2 or F3) removed from the one or more adsorption vessels may be utilized in a heat exchange process to partially cool fluid FI in accordance with any preceding embodiment.
  • fluid FI is cooled in a two-part process: 1) the temperature of the fluid FI is reduced in a gas-to-gas heat exchange unit which comprises the fluid F2 (or F3) removed from the first adsorption vessel, or from an additional adsorption vessel; and 2) the fluid FI is cooled further in a second liquid-to-gas heat exchange unit.
  • a gas-to-gas heat exchange unit which comprises the fluid F2 (or F3) removed from the first adsorption vessel, or from an additional adsorption vessel.
  • the invention provides a process according to any preceding embodiment wherein the step of cooling the Fluid FI comprises the use of a heat exchange unit; preferably a gas-to-gas heat exchange unit.
  • the invention provides a process according to any preceding embodiment, wherein the purified fluid F2 or F3 s utilized to cool the fluid FI in a gas-to-gas heat exchange unit.
  • the invention provides a process according to embodiment 22 or 23, wherein the step of cooling the fluid FI additionally comprises the use of a second heat exchange unit, preferably a liquid-to-gas heat exchange unit, which is connected to a low temperature generator comprising a cryogenic liquid in the temperature range -80°C to -150°C.
  • a second heat exchange unit preferably a liquid-to-gas heat exchange unit
  • the invention provides a process according to embodiment 24, wherein the cryogenic liquid is selected from any suitable liquid, preferably propanol.
  • the adsorptive media remains cold for many adsorption/desorption (or regeneration) cycles, thus reducing energy requirements.
  • the invention provides an apparatus for use in a process as defined in any one of the preceding embodiments, the apparatus comprising: o
  • a heat exchange unit suitable for cooling a fluid FI to a temperature in the range of from -40°C to -130°C, preferably from -90°C to -110°C,
  • An insulated adsorption vessel comprising an adsorptive media, preferably an
  • the invention provides an apparatus according to embodiment 26, wherein the heat exchange unit comprises a first gas-to-gas heat exchange unit; and optionally a second liquid-to-gas heat exchange unit which is connected to a low temperature generator comprising a cryogenic liquid in the temperature range of from -80°C to -150°C.
  • the invention provides an apparatus according to embodiment 26 or 27, wherein the insulated adsorption vessel is vacuum insulated.
  • the invention provides an apparatus according to any one of embodiments 26 to 28, wherein the adsorptive media is selected from zeolites, molecular sieves, calcium chloride, calcium sulphate, activated carbon, and metal organic frameworks (MOF).
  • the adsorptive media is selected from zeolites, molecular sieves, calcium chloride, calcium sulphate, activated carbon, and metal organic frameworks (MOF).
  • crystalline metal aluminosilicates are preferred. Particularly preferred are Group A, X and Y and zeolite Socony mobil-5 (ZSM-5) aluminosilicate zeolites.
  • the invention provides an apparatus according to any one of embodiments 26 to 29, wherein the multi-stage vacuum pump is suitable for reducing the pressure in the adsorption vessel to a pressure in the range l.OxlO 4 and 1.0xl0 3 mb, over a period of 5 to 10 hours; preferably the multi-stage vacuum pump is a two-stage or three stage vacuum pump.
  • the multi-stage vacuum pump is suitable for reducing the pressure to 2.0xl0 3 mb or less, preferably 2.0xl0 4 mb or less, more preferably 5.0xl0 5 mb or less.
  • the invention provides an apparatus according to any one of embodiments 26 to 30, which further comprises a vent valve to reduce the pressure inside the adsorption vessel to atmospheric pressure.
  • the invention provides an apparatus according to any one of embodiments 26 to 31, wherein the adsorption vessel comprises a pair of insulated adsorption vessels (1A and IB).
  • the invention provides an apparatus according to any one of embodiments 26 to 32, which comprises two or more heat exchange units.
  • the invention provides an apparatus according to any one of embodiments 26 to 33, which further comprises a moisture sensor.
  • the invention provides an apparatus according to any one of the
  • embodiments 26 to 33 which comprises one adsorption vessel operating at a temperature in the range of +15°C to +30°C and one insulated adsorption vessel operating at a temperature of -40°C to -130°C, preferably from -90°C to -110°C each vessel independently comprising an adsorptive media.
  • a fluid as used herein refers to both the gaseous and liquid state.
  • a fluid FI, F2, F3
  • FI, F2, F3 may be in the liquid state at one temperature but in the gaseous state at a higher temperature.
  • 'noble gas' refers to the gases of group 18 (also referred to as group 8) and comprises the gases helium, neon, argon, krypton, xenon and radon.
  • 'adsorption' refers to adhesion of molecules of a gas or liquid to the surface of a solid material (the adsorptive media).
  • 'adsorptive media' refers to a solid material which is capable of adsorption of one or more impurities in the fluid (FI).
  • 'molecular sieves' refers to crystalline metal aluminosilicates, or zeolites, having a three-dimensional interconnecting network of silica and alumina tetrahedra. Crystalline metal aluminosilicates are preferred. Zeolites are crystalline aluminosilicate minerals that have a characteristic pore structure and can be grouped according to the Si/AI ratio in their atomic structure. Group A zeolites have a Si/AI ratio of 1. Group X zeolites have a Si/AI ratio of 1 to 1.5. Group Y zeolites have a Si/AI ratio of 1.5 to 3.0 and the ZSM group have Si/AI ratios greater than 10. Particularly preferred for use in the invention are Group A, X and Y zeolites and zeolite Socony mobil-5 (ZSM-5) aluminosilicate zeolites.
  • MOF metal organic framework
  • 'vacuum regeneration' refers to a process of removing the impurities adsorbed onto the adsorptive media by reducing the pressure in the adsorption vessel using a multi-stage vacuum pump. Vacuum regeneration is suitably carried out at a pressure of 2.0xl0 3 mb or lower;
  • FIG. 1 The apparatus for use in the process of the invention is depicted in Figure 1 wherein a fluid FI is passed through the adsorption vessel 1 to produce a second fluid F2.
  • the fluid to be purified FI (the inlet gas) enters the system at 2 and passes through vacuum insulated gas lines to the insulated adsorption vessel 1, where the various impurity species are removed such as nitrogen, methane, oxygen etc, before exiting the system at 16.
  • the insulated adsorption vessel 1 is cycled between online, where it operates to remove impurities from the fluid FI, to regeneration, where the impurities absorbed by the adsorptive media within the vessel are removed.
  • vacuum valve 12 is closed isolating vessel 1 from the multi-stage vacuum pump 11.
  • vacuum valves 8, 9 and 14 are closed, and the vessel 1 is vented to atmosphere 15 through vacuum valve 13.
  • Valve 13 is then closed and vacuum valve 14 opened to allow the vessel 1 to be evacuated by the multi-stage vacuum pump 11
  • FIG. 2 The apparatus for use in the process of the invention is depicted in Figure 2 wherein a fluid FI is first cooled and then purified on being passed through the adsorption vessel 1 to produce a second fluid F2.
  • the fluid to be purified FI enters the system at 2 and passes through a first gas-gas heat exchanger 3, where it is cooled by the purified second fluid (the outlet gas stream) F2.
  • FI then passes through a second liquid-gas heat exchanger 4 where it is cooled further to the operating temperature of between -50 and -130 °C and the cooled fluid FI then passes through vacuum insulated gas lines to the insulated adsorption vessel 1.
  • the cooling fluid for heat exchanger 4 is generated in a cryo-cooler 5 and circulated through heat exchanger 4 through insulated lines 6.
  • the insulated adsorption vessel 1 is cycled between online, where it operates to remove impurities from the fluid FI, to regeneration, where the impurities absorbed by the adsorptive media within the vessel are removed.
  • Vacuum valve 12 is closed isolating vessel 1 from the multi stage vacuum pump 11.
  • the fluid FI passes through vessel 1 where the various impurity species are removed such as nitrogen, methane, oxygen etc, and exits through valve 9 as a purified fluid F2.
  • F2 is passed through further insulated gas lines 10 to heat exchanger 3 where F2 (outlet gas) cools the fluid FI (inlet gas) and is itself warmed prior to exiting the system at 16.
  • vacuum valves 8, 9 and 14 are closed, and the vessel 1 is vented to atmosphere 15 through vacuum valve 13.
  • Valve 13 is then closed and vacuum valve 14 opened to allow the vessel 1 to be evacuated by the multi-stage vacuum pump 11
  • the apparatus for use in the process of the invention comprises two insulated adsorption vessels 1A and IB as shown in Figure 3.
  • the system comprises two absorption vessels 1A, IB which are vacuum insulated.
  • the vessels are cycled between online, where they operate to remove impurities from the gas stream, to regeneration where the impurities adsorbed by the material within the vessel are removed.
  • the following sequence assumes a starting point where vessel 1A is online and vessel IB is in regeneration.
  • Cooled fluid FI exiting heat exchanger 4 passes through insulated gas lines 7 and through valve 8A into the absorption vessel 1A.
  • Vacuum valve 12A is closed isolating vessel 1A from the multi-stage vacuum pump and valve 8B and 9B are closed isolating vessel IB from the inlet and outlet gas streams.
  • vessel 1A The fluid passes through vessel 1A, where the various impurity species are removed, and the purified fluid F2 exits through valve 9A passing through further insulated gas lines 10 to heat exchanger 3 where it cools the fluid FI (inlet gas) and is itself warmed prior to exiting the system at 16.
  • vessel IB Whilst vessel 1A is online, vessel IB is being regenerated by the multi-stage vacuum pump 11 with valves 8B, 9B and 13 closed to isolate the system and vacuum valves 12B and 14 open.
  • the pressure in vessel IB is reduced to a pressure in the range l.OxlO 4 and 1.0xl0 3 mb and the impurity species thus removed.
  • vessel 1A requires regeneration and vessel IB is to be brought online, the vessels are briefly operated in parallel before regenerating vessel 1A.
  • valves 12B and 14 are closed, valve 8B is opened to allow pressurization of vessel IB, and when IB is at the operating pressure, valve 9B is opened so that the vessels operate in parallel. Subsequently, valves 8A and 9A are closed, isolating vessel 1A from the inlet and outlet gas streams (FI and F2). Valve 13 and vacuum valve 12A are opened allowing vessel 1A to depressurize through vent line 15. Once vessel 1A is at atmospheric pressure, valve 13 is closed and vacuum valve 14 opened to pump down vessel 1A.
  • the above sequence is cycled every 8-10 hours or at a frequency governed by the temperature of the vessel being regenerated, such that the temperature is maintained at no more than 50°C above the temperature of the fluid FI, typically no more than 20°C, preferably no more than 10°C.
  • the construction of the adsorption vessel 1 is shown more clearly in Figure 4.
  • the adsorption vessel 1 comprises a core of adsorptive media 18, surrounded by an insulated sleeve 17 which is preferably vacuum insulated.
  • valves 21 through to 23 An alternative method to complete the regeneration of the offline vessel (1A or IB) is shown in Figure 5 through the addition of valves 21 through to 23.
  • Such an arrangement allows for cooling of the regenerated bank using fluid 1 prior to passing through the online adsorption vessel.
  • the additional valves are operated such that valve 21A is open, Valve 22A is shut and valve 23A is open along with valves 8A and 9A routing gas through vessel 1A as before, whilst valve 21B is shut, valve 22B is shut and valve 23B is shut along with 8B and 9B.
  • valves 12B and 14 are closed and valves 21B and 8B are opened to allow pressurisation of vessel IB.
  • valves 9b and 22B When valves 9b and 22B are opened whilst valve 21A is closed, fluid FI is routed through the now regenerated vessel IB, cooling it in the process, and then through vessel 1A as before.
  • vessel IB Once vessel IB is within 10-50°C, typically within 20°C, of the temperature of the incoming fluid FI, valve 23B is opened and valve 23A closed, routing fluid FI through the cooled and regenerated vessel IB and out.
  • Valves 8A, 9A are now closed, isolating vessel 1A.
  • the pressure in 1A is now reduced relative to atmospheric by opening valve 12A and valve 13 and venting through 15.
  • the vacuum regeneration process then continues as detailed above.
  • valves 23A and 23B could be combined into a 3-port valve. In so doing, dead volumes are reduced.
  • the valve logic could be combined into a single multi-ported rotary driven valve to effect the same process as shown in figures 3 and 5.
  • Figure 6 depicts the process according to embodiment 2, wherein Tl-0 is in the range of form 0°C to -40°C.
  • a fluid Fl-0 is purified on being passed through the adsorption vessel (1) at
  • the fluid to be purified Fl-0 enters the system at 2 and passes through a first gas-gas heat exchanger 3, where it is cooled by the purified third fluid (the outlet gas stream) F2.
  • Fl-0 then passes through a first liquid-gas heat exchanger 4 where it is cooled further to the operating temperature, Tl-0, and the cooled fluid Fl-0 then passes through vacuum insulated gas lines to the insulated adsorption vessel (1) and is purified resulting in fluid FI.
  • the cooling fluid for heat exchanger 4 is generated in a cryo-cooler 5 and circulated through heat exchanger 4 through insulated lines 6.
  • FI then passes through a second liquid-gas heat exchanger 104 where it is cooled further to the operating temperature T1 of between -40°C and -130 °C, and the cooled fluid FI then passes through vacuum insulated gas lines to the insulated adsorption vessel 101 and is purified, resulting in fluid F2.
  • the cooling fluid for heat exchanger 104 is generated in a cryo-cooler 105 and circulated through heat exchanger 104 through insulated lines 106.
  • the insulated adsorption vessels 1 and 101 are cycled between online, where they operate to remove impurities from the fluids Fl-0 and FI, to regeneration, where the impurities absorbed by the adsorptive media within the vessel are removed using vacuum.
  • the operating temperature of the adsorption vessel (I) is in the range 0°C to + 40°C, it is not necessary to cool the fluid Fl-0 by passing the fluid through the gas-gas heat exchanger 3 and liquid-gas hear exchanger 4.
  • the fluid Fl-0 may pass from point 2 into the adsorption vessel (I) without prior cooling.
  • the insulated adsorption vessels 1 and 101 comprise pairs of insulated adsorption vessels (1A and IB, 101A and 101B) as described in embodiment 13. Results
  • a range of aluminosilicate and carbon-based materials were tested in cryogenic conditions (from - 70°C to -110 °C) for the removal of N2 from an Ar feed fluid.
  • the feed fluid (FI) composition varied from 50 ppm to 200 ppm N2 (with the balance Ar), and the N2 impurity was removed by suitable adsorptive media via gas adsorption.
  • the saturated materials were later regenerated by vacuum. This process was investigated in two columns with internal diameters of around 10 mm and 40 mm. The 10 mm-column allowed preliminary tests for various adsorptive media and a more detailed investigated was carried out using the 40 mm-diameter column, a fixed bed normally fully packed with adsorptive media.
  • Table 2 Adsorptive Media Tested in a 40 mm-diameter (60g scale) column at an operating temperature (Tl) of -105°C + 2° C.
  • Adsorption was tested in different adsorptive media at an operating temperature (Tl) of -90°C to -110°C (Range 1), using the 40mm diameter column.
  • Tl operating temperature
  • the media tested showed a time of > 40 min for 10 ppm breakthrough of nitrogen.
  • the zeolites 5A and 13X showed a time of >130 min for breakthrough for 10 ppm nitrogen.
  • the zeolite 13X was also tested at an operating temperature of -65°C to -75°C (range 2). At this temperature range, 10 ppm breakthrough was observed within 10 minutes.
  • the insulated adsorption vessel (1) was de-gassed using a multi-stage vacuum pump before adsorption. The vacuum level was observed to reach an initial level of 4.4xl0 3 mbar to 4.8 xlO 3 mbar. Following adsorption with 100 ppm N2 (balance Ar) to reach breakthrough, the insulated adsorption vessel (1) was regenerated or partially regenerated using the multi-stage vacuum pump, depending on the regeneration temperature.
  • Figure 7A depicts the adsorption of 100 ppm Nitrogen when the process of the invention is operated using a 10mm diameter column.
  • Aluminosilicate 13X was used as the adsorptive media, with an operating temperature T1 of -105°C +/- 2°C, with a gas flow rate of 1 slm, in a 40 mm-scale insulated adsorption column. Breakthrough at 0.1 ppm or below for 315 minutes, while 10 ppm breakthrough was observed only after 380 minutes.
  • Figure 7B depicts the adsorption of 100 ppm Nitrogen using pre-adsorbed 5A as the adsorptive media in a 40 mm-scale adsorption column. Other conditions were as described for Figure 7A. In this example, 10 ppm breakthrough was observed after 160 minutes.
  • E6 A process according to any one of embodiments E1-E5, wherein fluid FI is a noble gas or mixture thereof; and each Gl is independently selected from nitrogen, oxygen, carbon dioxide, carbon monoxide, methane and mixtures thereof.
  • E7 A process according to any one of embodiments E1-E6, wherein each insulated adsorption vessel independently comprises adsorptive media selected from zeolites, molecular sieves, calcium chloride, calcium sulphate activated carbon, and metal organic frameworks (MOF).
  • adsorptive media selected from zeolites, molecular sieves, calcium chloride, calcium sulphate activated carbon, and metal organic frameworks (MOF).

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Abstract

The invention provides a process of purifying a fluid useful in a manufacturing process, particularly in the manufacture of silicon wafers, by removing one or more impurities; and apparatus for use in the process.

Description

NOBLE GAS RECOVERY METHOD AND APPARATUS
TECHNICAL FIELD
The present invention relates to a process of purifying a fluid used in a manufacturing process, particularly in the manufacture of silicon wafers, by removing one or more impurities.
BACKGROUND
Silicon wafers are thin layers (slithers) of crystalline silicon, a semiconductor material, and are commonly used in solar photovoltaic cells and in microelectronic devices such as computers and mobile phones. Silicon wafers are typically cut from silicon ingots that may be manufactured in a vacuum furnace, a high temperature crystallization process under a controlled atmosphere. Such processes are commonly carried out under a noble gas, particularly argon, atmosphere and there is a need for high purity noble gases for use in the vacuum furnace process. The microelectronics industry requiring a total impurity level of lppb while the solar photovoltaic industry requires a total impurity level of l-2ppm. Typically, the impurity levels required for the photovoltaic industry are achieved through the distillation of liquid air, a standard industrial process, whereas further purification steps are required to meet the ultra-high purity specifications required by the microelectronics industry, in particular to achieve the ultra-low nitrogen and methane levels required.
There is a further need for methods of purifying gases removed from such vacuum furnace processes to a high level of purity in order for the gases to be recycled. Ambient temperature purifiers are a known method of removing impurity species to the levels required by the microelectronics industry. Alternatively, medium temperature chemical looping
combustionbased purification systems are another known method. However, these methods do not remove methane or nitrogen, the impurity levels of which will rise with repeated recycling to ultimately unacceptable levels. A frequently used purification process to remove nitrogen and methane is the use of hot metal getters (eg titanium, zirconium, vanadium, aluminium, iron and/or alloys thereof) at a temperature of 400-700°C. However, the materials are expensive and cannot be regenerated. Furthermore, such hot metal getter processes are only efficient at removing nitrogen and methane at impurity levels of <10ppm. Impurity levels, greater than approximately lOppm cause breakthrough, resulting in the need to stop the process and replace the getter, with associated costs and delay.
The use of molecular sieves as an adsorptive media at low temperatures for gas purification is discussed in US2016/0362298A1, and the process is stated to have the advantage that the molecular sieves can be regenerated. However, the known temperature swing process for regeneration of such media is time consuming, requires high energy input, and is therefore expensive since the apparatus must be warmed, regenerated, and then re-cooled.
Known vacuum swing adsorption processes are also inefficient at removing the adsorbed gas and do not provide sufficiently high purity for industries such as the solar photovoltaic and microelectronic fields.
W02011/092507A1 discusses a process of recovering an inert gas from a gas stream comprising the noble gas and oxidisable impurities, the process comprising oxidising the impurities in a chemical looping combustion (CLC) reactor and removing the resulting carbon dioxide and water from the gas stream.
SUMMARY OF THE INVENTION
The invention provides a process for purifying a fluid, the process comprising the steps of:
1.1 Providing an insulated adsorption vessel (1) comprising an adsorptive media, preferably an aluminosilicate;
1.2 Providing a first fluid FI;
1.3 Cooling the insulated adsorption vessel (1) and/or cooling the first fluid, FI, to an operating temperature T1 in the range of from -40°C to -130°C, preferably from -90°C to - 110°C;
1.4 Contacting the fluid FI with the insulated adsorption vessel (1) to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the insulated adsorption vessel (1) by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C (i.e. in the range +10°C to -130°C; preferably from -40°C to -110°C). The process of the invention may comprise an additional preliminary adsorption step prior to the process steps described above. The invention therefore further provides a process for purifying a fluid, the process comprising the steps of:
0.1 Providing a first adsorption vessel, which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from +40°C to -40°C, preferably from +15°C to +30°C;
0.2 Providing a first fluid Fl-0;
0.3 Contacting the first fluid Fl-0 with the adsorption vessel to remove one or more impurities Gl-0;
0.4 Collecting the resulting purified first fluid FI;
1.1 Providing a second adsorption vessel, which is insulated, comprising an adsorptive media, preferably an aluminosilicate;
1.3 Cooling the second adsorption vessel and/or cooling the first fluid, FI, to an operating temperature T1 in the range of from -40°C to -130°C, preferably from -90°C to -110°C;
1.4 Contacting the fluid FI with the second adsorption vessel to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the second adsorption vessel by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C (i.e. in the range +10°C to -130°C; preferably from -40°C to -110°C);
wherein the one or more impurities Gl have a lower freezing point than the one or more impurities Gl-0.
The invention further provides an alternative process for purifying a fluid, the process comprising the steps of
0.1 Contacting a fluid F0 with an oxidation reactor to oxidise impurities in F0 to CO2 and FI2O;
0.2 Contacting the resulting fluid F0' with an adsorption vessel, A, to remove CO2 and with an additional adsorption vessel, B, to remove FI2O; or
0.3 Contacting the resulting fluid F0' with a combined adsorption vessel AB to remove CO2 and FI2O;
0.4 Collecting the resulting Fluid FI; 1.1 Providing an insulated adsorption vessel (1) comprising an adsorptive media, preferably an aluminosilicate;
1.3 Cooling the insulated adsorption vessel (1) and/or the fluid FI to an operating temperature T1 in the range of from -40°C to -130°C, preferably from -90°C to -110°C;
1.4 Contacting the optionally cooled fluid FI with the insulated adsorption vessel to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the insulated adsorption vessel (1) by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C (i.e. in the range +10°C to -130°C; preferably from -40°C to -110°C).
The invention further provides apparatus for use in a process for purifying, recovering and recycling a fluid according to the present invention, the apparatus comprising: o Optionally a heat exchange unit suitable for cooling a fluid FI to a temperature in the range of from -40°C to -130°C,
o An insulated adsorption vessel comprising an adsorptive media;
o One or more isolation valves; and
o A multi-stage vacuum pump.
BRIEF DESCRIPTION OF THE DRAWINGS
Figure 1 shows an apparatus of the invention.
Figure 2 shows an apparatus of the invention wherein the fluid is cooled using a heat exchange unit.
Figure 3 shows an apparatus of the invention comprising a pair of adsorption vessels.
Figure 4 shows the construction of the adsorption vessel.
Figure 5 shows an apparatus of the invention comprising a pair of adsorption cells and further comprising an alternative regeneration process.
Figure 6 shows an apparatus of the invention comprising two adsorption cells operating at different temperatures.
Figure 7 shows the adsorption of lOOppm of Nitrogen during the process of the invention.
DETAILED DESCRIPTION The invention provides an improved process for removing impurities such as nitrogen, oxygen, carbon dioxide, carbon monoxide and methane from a fluid useful in, or recovered from, manufacturing processes. The process of the invention provides an efficient and cost-effective method of purifying and recycling gases from industrial processes, such as vacuum furnace processes. In particular, the use of vacuum for regeneration has clear advantages, including requiring less time for regeneration; requiring less energy; and having a lower associated cost. Furthermore, the process of the invention is effective at removing nitrogen impurities up to a level of 500ppm or higher so that the gases may be recycled for long periods, such as up to 12 months, up to 18 months, or up to 24 months, without causing the purification process to lose efficiency.
In embodiment 1, the invention provides a process for purifying a fluid, the process comprising the steps of:
1.1 Providing an insulated adsorption vessel (1) comprising an adsorptive media;
1.2 Providing a first fluid FI;
1.3 Cooling the insulated adsorption vessel (1) and/or cooling the first fluid, FI, to an operating temperature T1 in the range of from -40°C to -130°C;
1.4 Contacting the fluid FI with the insulated adsorption vessel (1) to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the insulated adsorption vessel (1) by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C.
In embodiment 2, the invention provides a process according to embodiment 1, the process further comprising the precursory steps:
0.1 Providing a first adsorption vessel, which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from +40°C to -40°C, preferably from +15°C to +30°C;
0.2 Providing a first fluid Fl-0; 0.3 Contacting the first fluid Fl-0 with the adsorption vessel to remove one or more impurities Gl-0;
0.4 Collecting the resulting purified first fluid FI.
The purified first fluid FI is then provided to the process steps as defined in Embodiment 1. Therefore, in embodiment 2, the invention provides a process comprising:
0.1 Providing a first adsorption vessel, which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from +40°C to -40°C, preferably from +15°C to +30°C;
0.2 Providing a first fluid Fl-0;
0.3 Contacting the first fluid Fl-0 with the adsorption vessel to remove one or more impurities Gl-0;
0.4 Collecting the resulting purified first fluid FI;
1.1 Providing a second adsorption vessel, which is insulated, comprising an adsorptive media, preferably an aluminosilicate (i.e, the insulated adsorption vessel according to embodiment 1);
1.3 Cooling the second adsorption vessel and/or cooling the first fluid, FI, to an operating temperature T1 in the range of from -40°C to -130°C, preferably from -90°C to -110°C;
1.4 Contacting the fluid FI with the second adsorption vessel to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the second adsorption vessel by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C (i.e. in the range +10°C to -130°C; preferably from -40°C to -110°C);
wherein the one or more impurities Gl have a lower freezing point than the one or more impurities Gl-0.
It will be appreciated that the second adsorption vessel of Embodiment is the insulated adsorption vessel as defined in Embodiment 1.
In embodiment 3, the invention provides a process according to embodiment 1 or 2, wherein the first fluid FI or Fl-0 is any fluid useful in manufacturing and each Gl or Gl-0 is independently selected from nitrogen, oxygen, carbon dioxide, carbon monoxide, methane and mixtures thereof. In embodiment 4, the invention provides a process according any preceding embodiment, wherein FI or Fl-0 is a noble gas or mixture thereof, more preferably FI or Fl-0 is selected from argon, xenon, helium, neon, and mixtures thereof; and each G1 or Gl-0 is independently selected from nitrogen, oxygen, carbon dioxide, carbon monoxide, methane and mixtures thereof.
In an alternative embodiment, 5, the invention provides a process according to any one of embodiments 1 to 3, wherein FI of Fl-0 is methane and G1 or Gl-0 is carbon dioxide.
In embodiment 6, the invention provides a process according to any preceding Embodiment or according to Embodiment 13, wherein the insulated adsorption vessel (1) as defined in
Embodiment 1, or the second adsorption vessel as defined in Embodiment 2, or the first pair of insulated adsorption vessels as defined in Embodiment 13, has an operating temperature T1 of from -80°C to -130°C.
In embodiment 7, the invention provides a process according to any preceding embodiment, or according to Embodiment 13, wherein the insulated adsorption vessel (1) as defined in
Embodiment 1, or the second adsorption vessel as defined in Embodiment 2, or the first pair of insulated adsorption vessels as defined in Embodiment 13, has an operating temperature of from -90°C to -110°C.
In embodiment 8, the invention provides a process according to any preceding embodiment, or according to embodiment 13, wherein the insulated adsorption vessel (1) as defined in
Embodiment 1, or the second adsorption vessel as defined in Embodiment 2, or the first pair of insulated adsorption vessels as defined in Embodiment 13, has an operating temperature of from -100°C to -120°C.
In embodiment 9, the invention provides a process according to any one of embodiments 2 to 8, wherein the operating temperature Tl-0 is greater than 0°C and less than or equal to +40°C, more preferably in the range from +15°C to +30°C. Preferably the operating temperature Tl-0 is ambient temperature (i.e. about 25°C ± 5°C). Where the temperature Tl-0 is in the range -40°C to 0°C, the vessel is insulated. Flowever, the skilled person will understand that at warmer temperatures, where Tl-0 is in the range 0°C to +40C, and particularly in the range +15°C to +30°C, it is not required to use an insulated vessel. In embodiment 10, the invention provides a process according to any one of embodiments 2 to 9, further comprising:
2.1 Providing a third adsorption vessel, which is insulated, comprising an adsorptive media;
2.2 Adjusting the temperature of the third adsorption vessel and/or the second fluid F2 to an operating temperature T2 in the range of from less than T1 to -130°C;
2.3 Contacting the second fluid F2 with the third adsorption vessel to remove one or more impurities G2;
2.4 Collecting the resulting purified fluid F3; and
2.5 Independently regenerating the second and third adsorption vessels by vacuum whilst maintaining the temperature of each vessel in the range of from the operating temperature (Tl, T2) to the operating temperature +50°C (i.e. the second insulated adsorption vessel is maintained at a temperature in the range of from +10°C to -130°C; preferably from -40°C to - 110°C, and the third insulated adsorption vessel is maintained at a temperature of from less than +10°C to -130°C) ; wherein the one or more impurities G1 have a lower freezing point than the one or more impurities Gl-0, and the one or more impurities G2 have a lower freezing point than the one or more impurities Gl.
In Embodiment 11, the invention provides a process according to Embodiment 10, wherein: o Temperature Tl-0 is greater than 0°C and less than or equal to +40°C, preferably in the range from +15°C to +30°C;
o Temperature Tl is in the range from 0°C to -50 °C; and
o Temperature T2 is in the range from -40°C to -130°C, preferably from -90°C to -110°C.
It is a preferred embodiment of the process that the process provides a pair of insulated adsorption vessels 1A and IB in order to avoid the need to pause the process during
regeneration. As described in more detail hereinbelow, when a pair of insulated adsorption vessels 1A and IB are used in the process of the invention, one vessel may be online while the other vessel is in regeneration or standby mode. Therefore, in embodiment 12, the invention provides a process according to any one of the preceding embodiments, the process comprising:
1.1 Providing a pair of insulated adsorption vessels (1A, IB) each independently comprising an adsorptive media, preferably an aluminosilicate;
1.2 Providing a first fluid FI;
1.3 Cooling the pair of insulated adsorption vessels (1A, IB) and/or cooling the first fluid FI to an operating temperature T1 in the range of from -40°C to -130°C, preferably from -90°C to - 110°C;
1.4 Contacting the first fluid FI with one of the pair of insulated adsorption vessels to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating one of the pair of insulated adsorption vessels (1A, IB) by vacuum whilst maintaining the temperature of the vessel in the range of T1 to T1 + 50°C (i.e. in the range +10°C to -130°C; preferably from -40°C to -110°C).
In embodiment 13, the invention provides a process according to any one of embodiments 2 to 11, the process comprising
0.1 Providing an adsorption vessel (1), which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from -40°C to +40°C, preferably from +15°C to +30°C;
0.2 Providing a first fluid Fl-0;
0.3 Contacting the first fluid Fl-0 with the adsorption vessel (1) to remove one or more impurities Gl-0;
0.4 Collecting the resulting purified first fluid FI;
1.1 Providing a first pair of insulated adsorption vessels comprising an adsorptive media, preferably an aluminosilicate; 1.3 Cooling the first pair of insulated adsorption vessels and/or cooling the first fluid, FI, to an operating temperature T1 in the range of from -40°C to -130°C, preferably from - 90°C to -110°C;
1.4 Contacting the fluid FI with one of the first pair of insulated adsorption vessel to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating one of the first pair of insulated adsorption vessel by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C (i.e. in the range +10°C to -130°C; preferably from -40°C to -110°C);
wherein the one or more impurities Gl have a lower freezing point than the one or more impurities Gl-0.
In embodiment 14, the invention provides a process according to any one of embodiments 2 to 11 and 13, wherein the first fluid Fl-0 comprises argon.
In embodiment 15, the invention provides a process according to any one of embodiments 2 to 11 and 13 to 14, wherein the one or more impurities Gl or Gl-0 comprise CO2, FI2O, or mixtures thereof.
In embodiment 16, the invention provides a process according to any one of embodiments 2 to 11 and 13 to 15, wherein the one or more impurities Gl or Gl-0 comprise N2, O2, and mixtures thereof.
In embodiment 17, the invention provides a process according to any preceding embodiment, wherein each insulated adsorption vessel independently comprises adsorptive media selected from zeolites, molecular sieves, calcium chloride, calcium sulphate activated carbon, and metal organic frameworks (MOF). When the process is as defined in any one of embodiments 2 to 11 and 13 to 16, the first adsorption vessel preferably comprises adsorptive media selected from molecular sieves, calcium chloride, calcium sulphate and activated carbon; and the second adsorption vessel preferably comprises adsorptive media selected from zeolites, molecular sieves, activated carbon, and metal organic frameworks (MOF). In the process according to any preceding embodiment, crystalline metal aluminosilicates are preferred. Particularly preferred are Group A, X and Y and zeolite Socony mobil-5 (ZSM-5) aluminosilicate zeolites. In embodiment 18, the invention provides a process according to any preceding embodiment, wherein each insulated adsorption vessel is vacuum insulated. It will be understood that the first adsorption vessel according to embodiment 2 does not require insulation when the operating temperature is from 0°C to +40°C , more particularly from +15°C to +30°C.
W02011092507 discloses a process for purifying a noble gas stream, the process comprising oxidizing impurities in the gas stream and removing the resulting carbon dioxide and water. Such an oxidation step may be carried out prior to the process of the invention.
In embodiment 19, the invention therefore provides an alternative process for purifying a fluid, the process comprising the steps of:
0.1 Contacting a fluid F0 with an oxidation reactor to oxidise impurities in F0 to CO2 and FI2O;
0.2 Contacting the resulting fluid F0' with an adsorption vessel, A, to remove CO2 and with an additional adsorption vessel, B, to remove FI2O; or
0.3 Contacting the resulting fluid F0' with a combined adsorption vessel AB to remove CO2 and FI2O;
0.4 Collecting the resulting Fluid FI;
1.1 Providing an insulated adsorption vessel (1) comprising an adsorptive media, preferably an aluminosilicate;
1.3 Cooling the insulated adsorption vessel (1) and/or the fluid FI to an operating temperature T1 in the range of from -40°C to -130°C, preferably from -90°C to -110°C;
1.4 Contacting the optionally cooled fluid FI with the insulated adsorption vessel to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the insulated adsorption vessel (1) by vacuum whilst maintaining the temperature of the vessel in the range from the operating temperature (Tl) to the operating temperature + 50°C (i.e. from +10°C to -130°C, preferably from -40°C to -110°C). In embodiment 20, the invention provides a process according to embodiment 19, wherein the oxidation reactor comprises a solid state oxygen carrier; preferably comprising at least one transition metal oxide; optionally the transition metal oxide is provided on an inert support material comprising an oxide of an element selected from the periodic table classification Group MIA, Group IVA, Group NIB, Group IVB and the lanthanide series.
In embodiment 21, the invention provides a process according to any preceding embodiment wherein the step of regenerating the one or more adsorption vessels by vacuum occurs at a pressure in the range of l.OxlO 4 and 1.0xl03mb; preferably about 6.0 x 103 mbar, more preferably about 8.0 x 103 mbar. In one embodiment, the pressure is 2.0xl03 mb or less, preferably 2.0xl04mb or less, more preferably 5.0xl05mb or less.
The purified fluid collected from the process according to any embodiment of the invention (F2 or F3) may be recycled for use in a further industrial process such as in a vacuum furnace process for silicon wafer manufacture or in an additive manufacturing process for 3D printing of metallic parts. The cold purified fluid (F2 or F3) removed from the one or more adsorption vessels may be utilized in a heat exchange process to partially cool fluid FI in accordance with any preceding embodiment. Preferably, fluid FI is cooled in a two-part process: 1) the temperature of the fluid FI is reduced in a gas-to-gas heat exchange unit which comprises the fluid F2 (or F3) removed from the first adsorption vessel, or from an additional adsorption vessel; and 2) the fluid FI is cooled further in a second liquid-to-gas heat exchange unit.
Therefore, in embodiment 22, the invention provides a process according to any preceding embodiment wherein the step of cooling the Fluid FI comprises the use of a heat exchange unit; preferably a gas-to-gas heat exchange unit.
In embodiment 23, the invention provides a process according to any preceding embodiment, wherein the purified fluid F2 or F3 s utilized to cool the fluid FI in a gas-to-gas heat exchange unit.
In embodiment 24, the invention provides a process according to embodiment 22 or 23, wherein the step of cooling the fluid FI additionally comprises the use of a second heat exchange unit, preferably a liquid-to-gas heat exchange unit, which is connected to a low temperature generator comprising a cryogenic liquid in the temperature range -80°C to -150°C. In embodiment 25, the invention provides a process according to embodiment 24, wherein the cryogenic liquid is selected from any suitable liquid, preferably propanol.
The skilled person will appreciate that since the adsorption vessels are insulated, the adsorptive media remains cold for many adsorption/desorption (or regeneration) cycles, thus reducing energy requirements.
In embodiment 26, the invention provides an apparatus for use in a process as defined in any one of the preceding embodiments, the apparatus comprising: o Optionally a heat exchange unit suitable for cooling a fluid FI to a temperature in the range of from -40°C to -130°C, preferably from -90°C to -110°C,
o An insulated adsorption vessel comprising an adsorptive media, preferably an
aluminosilicate;
o One or more isolation valves; and
o A multi-stage vacuum pump.
In embodiment 27, the invention provides an apparatus according to embodiment 26, wherein the heat exchange unit comprises a first gas-to-gas heat exchange unit; and optionally a second liquid-to-gas heat exchange unit which is connected to a low temperature generator comprising a cryogenic liquid in the temperature range of from -80°C to -150°C.
In embodiment 28, the invention provides an apparatus according to embodiment 26 or 27, wherein the insulated adsorption vessel is vacuum insulated.
In embodiment 29, the invention provides an apparatus according to any one of embodiments 26 to 28, wherein the adsorptive media is selected from zeolites, molecular sieves, calcium chloride, calcium sulphate, activated carbon, and metal organic frameworks (MOF). In the apparatus according to embodiment 29, crystalline metal aluminosilicates are preferred. Particularly preferred are Group A, X and Y and zeolite Socony mobil-5 (ZSM-5) aluminosilicate zeolites.
In embodiment 30, the invention provides an apparatus according to any one of embodiments 26 to 29, wherein the multi-stage vacuum pump is suitable for reducing the pressure in the adsorption vessel to a pressure in the range l.OxlO 4 and 1.0xl03mb, over a period of 5 to 10 hours; preferably the multi-stage vacuum pump is a two-stage or three stage vacuum pump. In the apparatus according to embodiment 30, the multi-stage vacuum pump is suitable for reducing the pressure to 2.0xl03 mb or less, preferably 2.0xl04mb or less, more preferably 5.0xl05mb or less.
In embodiment 31, the invention provides an apparatus according to any one of embodiments 26 to 30, which further comprises a vent valve to reduce the pressure inside the adsorption vessel to atmospheric pressure.
In embodiment 32, the invention provides an apparatus according to any one of embodiments 26 to 31, wherein the adsorption vessel comprises a pair of insulated adsorption vessels (1A and IB).
In embodiment 33, the invention provides an apparatus according to any one of embodiments 26 to 32, which comprises two or more heat exchange units.
In embodiment 34, the invention provides an apparatus according to any one of embodiments 26 to 33, which further comprises a moisture sensor.
In embodiment 35, the invention provides an apparatus according to any one of the
embodiments 26 to 33 which comprises one adsorption vessel operating at a temperature in the range of +15°C to +30°C and one insulated adsorption vessel operating at a temperature of -40°C to -130°C, preferably from -90°C to -110°C each vessel independently comprising an adsorptive media.
Definitions
The term 'a' or 'an' as used herein refers to both the singular and plural.
The term 'fluid' as used herein refers to both the gaseous and liquid state. For example, a fluid (FI, F2, F3) may be in the liquid state at one temperature but in the gaseous state at a higher temperature.
The term 'noble gas' as used herein, refers to the gases of group 18 (also referred to as group 8) and comprises the gases helium, neon, argon, krypton, xenon and radon. The term 'adsorption' as used here refers to adhesion of molecules of a gas or liquid to the surface of a solid material (the adsorptive media).
The term 'adsorptive media' as used herein refers to a solid material which is capable of adsorption of one or more impurities in the fluid (FI).
The term 'molecular sieves', as used herein refers to crystalline metal aluminosilicates, or zeolites, having a three-dimensional interconnecting network of silica and alumina tetrahedra. Crystalline metal aluminosilicates are preferred. Zeolites are crystalline aluminosilicate minerals that have a characteristic pore structure and can be grouped according to the Si/AI ratio in their atomic structure. Group A zeolites have a Si/AI ratio of 1. Group X zeolites have a Si/AI ratio of 1 to 1.5. Group Y zeolites have a Si/AI ratio of 1.5 to 3.0 and the ZSM group have Si/AI ratios greater than 10. Particularly preferred for use in the invention are Group A, X and Y zeolites and zeolite Socony mobil-5 (ZSM-5) aluminosilicate zeolites.
The term 'metal organic framework (MOF)' as used herein refers to crystalline materials that consist of coordination bonds between transition-metal cations and multidentate organic linkers, and have an open framework that can be porous.
The term 'vacuum regeneration' refers to a process of removing the impurities adsorbed onto the adsorptive media by reducing the pressure in the adsorption vessel using a multi-stage vacuum pump. Vacuum regeneration is suitably carried out at a pressure of 2.0xl03 mb or lower;
preferably at a pressure of 2.0xl04mb or lower or a pressure of 5.0xl05mb or lower.
Examples
The invention is described in further detail hereinbelow with reference to the figures.
The apparatus for use in the process of the invention is depicted in Figure 1 wherein a fluid FI is passed through the adsorption vessel 1 to produce a second fluid F2.
The fluid to be purified FI (the inlet gas) enters the system at 2 and passes through vacuum insulated gas lines to the insulated adsorption vessel 1, where the various impurity species are removed such as nitrogen, methane, oxygen etc, before exiting the system at 16.
The insulated adsorption vessel 1 is cycled between online, where it operates to remove impurities from the fluid FI, to regeneration, where the impurities absorbed by the adsorptive media within the vessel are removed. When the adsorption vessel 1 is in operation, vacuum valve 12 is closed isolating vessel 1 from the multi-stage vacuum pump 11. To regenerate, vacuum valves 8, 9 and 14 are closed, and the vessel 1 is vented to atmosphere 15 through vacuum valve 13. Valve 13 is then closed and vacuum valve 14 opened to allow the vessel 1 to be evacuated by the multi-stage vacuum pump 11
The apparatus for use in the process of the invention is depicted in Figure 2 wherein a fluid FI is first cooled and then purified on being passed through the adsorption vessel 1 to produce a second fluid F2.
The fluid to be purified FI (the inlet gas) enters the system at 2 and passes through a first gas-gas heat exchanger 3, where it is cooled by the purified second fluid (the outlet gas stream) F2. FI then passes through a second liquid-gas heat exchanger 4 where it is cooled further to the operating temperature of between -50 and -130 °C and the cooled fluid FI then passes through vacuum insulated gas lines to the insulated adsorption vessel 1. The cooling fluid for heat exchanger 4 is generated in a cryo-cooler 5 and circulated through heat exchanger 4 through insulated lines 6. The insulated adsorption vessel 1 is cycled between online, where it operates to remove impurities from the fluid FI, to regeneration, where the impurities absorbed by the adsorptive media within the vessel are removed.
Cooled fluid FI, exiting heat exchanger 4, then passes through insulated gas lines 7 and through valve 8 into the absorption vessel 1. Vacuum valve 12 is closed isolating vessel 1 from the multi stage vacuum pump 11. The fluid FI passes through vessel 1 where the various impurity species are removed such as nitrogen, methane, oxygen etc, and exits through valve 9 as a purified fluid F2. F2 is passed through further insulated gas lines 10 to heat exchanger 3 where F2 (outlet gas) cools the fluid FI (inlet gas) and is itself warmed prior to exiting the system at 16.
To regenerate, vacuum valves 8, 9 and 14 are closed, and the vessel 1 is vented to atmosphere 15 through vacuum valve 13. Valve 13 is then closed and vacuum valve 14 opened to allow the vessel 1 to be evacuated by the multi-stage vacuum pump 11
Preferably the apparatus for use in the process of the invention comprises two insulated adsorption vessels 1A and IB as shown in Figure 3. The system comprises two absorption vessels 1A, IB which are vacuum insulated. The vessels are cycled between online, where they operate to remove impurities from the gas stream, to regeneration where the impurities adsorbed by the material within the vessel are removed. The following sequence assumes a starting point where vessel 1A is online and vessel IB is in regeneration. Cooled fluid FI exiting heat exchanger 4 passes through insulated gas lines 7 and through valve 8A into the absorption vessel 1A. Vacuum valve 12A is closed isolating vessel 1A from the multi-stage vacuum pump and valve 8B and 9B are closed isolating vessel IB from the inlet and outlet gas streams. The fluid passes through vessel 1A, where the various impurity species are removed, and the purified fluid F2 exits through valve 9A passing through further insulated gas lines 10 to heat exchanger 3 where it cools the fluid FI (inlet gas) and is itself warmed prior to exiting the system at 16. Whilst vessel 1A is online, vessel IB is being regenerated by the multi-stage vacuum pump 11 with valves 8B, 9B and 13 closed to isolate the system and vacuum valves 12B and 14 open. The pressure in vessel IB is reduced to a pressure in the range l.OxlO 4 and 1.0xl03mb and the impurity species thus removed. When vessel 1A requires regeneration and vessel IB is to be brought online, the vessels are briefly operated in parallel before regenerating vessel 1A. At the change over time, vacuum valves 12B and 14 are closed, valve 8B is opened to allow pressurization of vessel IB, and when IB is at the operating pressure, valve 9B is opened so that the vessels operate in parallel. Subsequently, valves 8A and 9A are closed, isolating vessel 1A from the inlet and outlet gas streams (FI and F2). Valve 13 and vacuum valve 12A are opened allowing vessel 1A to depressurize through vent line 15. Once vessel 1A is at atmospheric pressure, valve 13 is closed and vacuum valve 14 opened to pump down vessel 1A. The above sequence is cycled every 8-10 hours or at a frequency governed by the temperature of the vessel being regenerated, such that the temperature is maintained at no more than 50°C above the temperature of the fluid FI, typically no more than 20°C, preferably no more than 10°C.
The construction of the adsorption vessel 1 is shown more clearly in Figure 4. The adsorption vessel 1 comprises a core of adsorptive media 18, surrounded by an insulated sleeve 17 which is preferably vacuum insulated.
An alternative method to complete the regeneration of the offline vessel (1A or IB) is shown in Figure 5 through the addition of valves 21 through to 23. Such an arrangement allows for cooling of the regenerated bank using fluid 1 prior to passing through the online adsorption vessel. Taking the example above, with vessel 1A online and vessel IB under vacuum, the additional valves are operated such that valve 21A is open, Valve 22A is shut and valve 23A is open along with valves 8A and 9A routing gas through vessel 1A as before, whilst valve 21B is shut, valve 22B is shut and valve 23B is shut along with 8B and 9B. As detailed above, valves 12B and 14 are closed and valves 21B and 8B are opened to allow pressurisation of vessel IB. When valves 9b and 22B are opened whilst valve 21A is closed, fluid FI is routed through the now regenerated vessel IB, cooling it in the process, and then through vessel 1A as before. Once vessel IB is within 10-50°C, typically within 20°C, of the temperature of the incoming fluid FI, valve 23B is opened and valve 23A closed, routing fluid FI through the cooled and regenerated vessel IB and out. Valves 8A, 9A are now closed, isolating vessel 1A. The pressure in 1A is now reduced relative to atmospheric by opening valve 12A and valve 13 and venting through 15. The vacuum regeneration process then continues as detailed above. It is noted that in a preferred embodiment, valves 23A and 23B could be combined into a 3-port valve. In so doing, dead volumes are reduced. In addition, the valve logic could be combined into a single multi-ported rotary driven valve to effect the same process as shown in figures 3 and 5.
Figure 6 depicts the process according to embodiment 2, wherein Tl-0 is in the range of form 0°C to -40°C. A fluid Fl-0 is purified on being passed through the adsorption vessel (1) at
temperature Tl-0 to produce a purified fluid FI, the purified fluid FI being further purified on being passed through a second adsorption vessel (101) at temperature T1 to produce a second fluid F2. The fluid to be purified Fl-0 enters the system at 2 and passes through a first gas-gas heat exchanger 3, where it is cooled by the purified third fluid (the outlet gas stream) F2.
Fl-0 then passes through a first liquid-gas heat exchanger 4 where it is cooled further to the operating temperature, Tl-0, and the cooled fluid Fl-0 then passes through vacuum insulated gas lines to the insulated adsorption vessel (1) and is purified resulting in fluid FI. The cooling fluid for heat exchanger 4 is generated in a cryo-cooler 5 and circulated through heat exchanger 4 through insulated lines 6. FI then passes through a second liquid-gas heat exchanger 104 where it is cooled further to the operating temperature T1 of between -40°C and -130 °C, and the cooled fluid FI then passes through vacuum insulated gas lines to the insulated adsorption vessel 101 and is purified, resulting in fluid F2. The cooling fluid for heat exchanger 104 is generated in a cryo-cooler 105 and circulated through heat exchanger 104 through insulated lines 106.
The insulated adsorption vessels 1 and 101 are cycled between online, where they operate to remove impurities from the fluids Fl-0 and FI, to regeneration, where the impurities absorbed by the adsorptive media within the vessel are removed using vacuum.
When the operating temperature of the adsorption vessel (I) is in the range 0°C to + 40°C, it is not necessary to cool the fluid Fl-0 by passing the fluid through the gas-gas heat exchanger 3 and liquid-gas hear exchanger 4. In this embodiment, the fluid Fl-0 may pass from point 2 into the adsorption vessel (I) without prior cooling.
In a preferred embodiment, the insulated adsorption vessels 1 and 101 comprise pairs of insulated adsorption vessels (1A and IB, 101A and 101B) as described in embodiment 13. Results
A range of aluminosilicate and carbon-based materials were tested in cryogenic conditions (from - 70°C to -110 °C) for the removal of N2 from an Ar feed fluid. The feed fluid (FI) composition varied from 50 ppm to 200 ppm N2 (with the balance Ar), and the N2 impurity was removed by suitable adsorptive media via gas adsorption. The saturated materials were later regenerated by vacuum. This process was investigated in two columns with internal diameters of around 10 mm and 40 mm. The 10 mm-column allowed preliminary tests for various adsorptive media and a more detailed investigated was carried out using the 40 mm-diameter column, a fixed bed normally fully packed with adsorptive media. The results showed an acceptable performance for a number of different media, with the best results observed using 13X and 5A zeolite, both of which were shown to give promising duration for breakthrough of nitrogen. The effect of H2O (around 100 ppm), CO2 (around 2500 ppm) on the adsorption of N2 in cold was also investigated. The presence of moisture and CO2 was observed to affect the N2 adsorption, and was also observed to significantly slow down the vacuum regeneration of the material. Table 1: Adsorptive Media Tested in a 10 mm Column at an operating temperature (Tl) of - 105°C ± 2° C.
Figure imgf000020_0001
Figure imgf000021_0001
Table 2: Adsorptive Media Tested in a 40 mm-diameter (60g scale) column at an operating temperature (Tl) of -105°C + 2° C.
Figure imgf000021_0002
Adsorption Temperature
Adsorption was tested in different adsorptive media at an operating temperature (Tl) of -90°C to -110°C (Range 1), using the 40mm diameter column. The media tested showed a time of > 40 min for 10 ppm breakthrough of nitrogen. The zeolites 5A and 13X showed a time of >130 min for breakthrough for 10 ppm nitrogen. The zeolite 13X was also tested at an operating temperature of -65°C to -75°C (range 2). At this temperature range, 10 ppm breakthrough was observed within 10 minutes.
Vacuum Level Typically, the insulated adsorption vessel (1) was de-gassed using a multi-stage vacuum pump before adsorption. The vacuum level was observed to reach an initial level of 4.4xl03 mbar to 4.8 xlO 3 mbar. Following adsorption with 100 ppm N2 (balance Ar) to reach breakthrough, the insulated adsorption vessel (1) was regenerated or partially regenerated using the multi-stage vacuum pump, depending on the regeneration temperature.
Figure 7A depicts the adsorption of 100 ppm Nitrogen when the process of the invention is operated using a 10mm diameter column. Aluminosilicate 13X was used as the adsorptive media, with an operating temperature T1 of -105°C +/- 2°C, with a gas flow rate of 1 slm, in a 40 mm-scale insulated adsorption column. Breakthrough at 0.1 ppm or below for 315 minutes, while 10 ppm breakthrough was observed only after 380 minutes.
Figure 7B depicts the adsorption of 100 ppm Nitrogen using pre-adsorbed 5A as the adsorptive media in a 40 mm-scale adsorption column. Other conditions were as described for Figure 7A. In this example, 10 ppm breakthrough was observed after 160 minutes.
FURTHER EM BODIMENTS
The invention is further illustrated by the following embodiments:
El A process for purifying a fluid, the process comprising the steps of:
■ Providing an insulated adsorption vessel (1) comprising an adsorptive media;
■ Providing a first fluid FI;
■ Cooling the insulated adsorption vessel (1) and/or cooling the first fluid, FI, to an operating temperature T1 in the range of from -40°C to -130°C;
■ Contacting the fluid FI with the insulated adsorption vessel (1) to remove one or more impurities Gl;
■ Collecting the resulting purified fluid F2; and
■ Regenerating the insulated adsorption vessel (1) by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C.
E2 A process for purifying a fluid, the process comprising the steps of:
■ Providing a first insulated adsorption vessel (1) comprising an adsorptive media;
■ Providing a first fluid FI;
■ Optionally adjusting the temperature of the first insulated adsorption vessel (1) and/or the first fluid, FI, to an operating temperature T1 in the range of from +40°C to -130°C;
■ Contacting the first fluid FI with the first insulated adsorption vessel to remove one or more impurities Gl;
■ Collecting the resulting purified second fluid F2;
■ Providing a second insulated adsorption vessel (101) comprising an adsorptive media;
■ Optionally adjusting the temperature of the second insulated adsorption vessel and/or the second fluid F2 to an operating temperature T2 in the range of from less than T1 to -130°C;
■ Contacting the second fluid F2 with the second insulated adsorption vessel to remove one or more impurities G2;
■ Collecting the resulting purified fluid F3; and ■ Independently regenerating each of the insulated adsorption vessels (1, 101) by vacuum whilst maintaining the operating temperature of each vessel in the range of from the operating temperature (Tl, T2) to the operating temperature + 50°C ; wherein the one or more impurities G2 have a lower freezing point than the one or more impurities Gl.
E3 A process according to embodiment El, the process comprising:
■ Contacting a fluid F0 with an oxidation reactor to oxidise impurities in F0 to CO2 and FI2O;
■ Contacting the resulting fluid F0' with an adsorption vessel, A, to remove CO2 and with an additional adsorption vessel, B, to remove FI2O; or
■ Contacting the resulting fluid F0' with a combined adsorption vessel AB to remove CO2 and FI2O;
■ Collecting the resulting Fluid FI;
■ Providing an insulated adsorption vessel (1) comprising an adsorptive media;
■ Cooling the insulated adsorption vessel (1) and/or the fluid FI to an operating temperature Tl in the range of from -40°C to -130°C;
■ Contacting the fluid FI with the insulated adsorption vessel to remove one or more impurities Gl;
■ Collecting the resulting purified fluid F2; and
■ Regenerating the insulated adsorption vessel (1) by vacuum whilst
maintaining the temperature of the vessel at a temperature in the range Tl to Tl + 50°C.
E4 A process according to embodiment El, the process comprising:
■ Providing a pair of insulated adsorption vessels (1A, IB) each independently comprising an adsorptive media
■ Providing a first fluid FI;
■ Cooling the insulated adsorption vessels (1, 101) and/or cooling the first fluid FI to an operating temperature Tl in the range of from -40°C to -130°C;
■ Contacting the first fluid FI with one of the pair of insulated adsorption
vessels to remove one or more impurities Gl; ■ Collecting the resulting purified fluid F2; and
■ Regenerating one of the pair of insulated adsorption vessels (1A, IB) by vacuum whilst maintaining the temperature of each vessel in the range of T1 to T1 + 50°C.
E5 A process according to Embodiment E3, the process comprising
■ Providing a first pair of insulated adsorption vessels each independently comprising an adsorptive media;
■ Providing a first fluid, FI;
■ Adjusting the temperature of one or both of first pair of insulated adsorption vessels and/or the first fluid FI to an operating temperature in the range of +40°C to -130°C
■ Contacting the first fluid FI with one of the first pair of insulated adsorption vessel to remove one or more first impurities Gl;
■ Collecting the resulting purified second fluid F2;
■ Providing a second pair of insulated adsorption vessels comprising an adsorptive media;
■ Adjusting the temperature of one or both of the second pair of insulated adsorption vessels and/or the second fluid F2 to an operating temperature T2 in the range of less than T1 to -130°C;
■ Contacting the second fluid F2 with one of the second pair of insulated adsorption vessels to remove one or more second impurities G2; and
■ Independently regenerating one of the first and second pair of insulated adsorption vessels by vacuum whilst maintaining the temperature of the vessels in the range of the operating temperature (T1 or T2) to the operating temperature + 50°C; wherein the one or more second impurities G2 have a lower freezing point than the one or more first impurities Gl.
E6 A process according to any one of embodiments E1-E5, wherein fluid FI is a noble gas or mixture thereof; and each Gl is independently selected from nitrogen, oxygen, carbon dioxide, carbon monoxide, methane and mixtures thereof. E7 A process according to any one of embodiments E1-E6, wherein each insulated adsorption vessel independently comprises adsorptive media selected from zeolites, molecular sieves, calcium chloride, calcium sulphate activated carbon, and metal organic frameworks (MOF).

Claims

1. A process for purifying a fluid, the process comprising the steps of:
1.1 Providing an insulated adsorption vessel (1) comprising an adsorptive media;
1.2 Providing a first fluid FI;
1.3 Cooling the insulated adsorption vessel (1) and/or cooling the first fluid, FI, to an operating temperature T1 in the range of from -40°C to -130°C;
1.4 Contacting the fluid FI with the insulated adsorption vessel (1) to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the insulated adsorption vessel (1) by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C (i.e. in the range +10°C to -130°C).
2. A process for purifying a fluid according to claim 1, the process comprising the steps of:
0.1 Providing a first adsorption vessel, which may be insulated, comprising an adsorptive media at an operating temperature Tl-0 in the range of from +40°C to - 40°C, preferably from +15°C to +30°C;
0.2 Providing a first fluid Fl-0;
0.3 Contacting the first fluid Fl-0 with the adsorption vessel to remove one or more impurities Gl-0;
0.4 Collecting the resulting purified first fluid FI;
1.1 Providing a second adsorption vessel which is an insulated adsorption vessel as defined in claim 1;
1.3 Cooling the second adsorption vessel and/or cooling the first fluid, FI, to an operating temperature T1 in the range of from -40°C to -130°C);
1.4 Contacting the fluid FI with the second adsorption vessel to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the second adsorption vessel by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C (i.e. in the range +10°C to -130°C);
wherein the one or more impurities Gl have a lower freezing point than the one or more impurities Gl-0.
3. A process for purifying a fluid according to claim 1, the process comprising the steps of
0.1 Contacting a fluid F0 with an oxidation reactor to oxidise impurities in F0 to CO2 and FI2O;
0.2 Contacting the resulting fluid F0' with an adsorption vessel, A, to remove CO2 and with an additional adsorption vessel, B, to remove FI2O; or
0.3 Contacting the resulting fluid F0' with a combined adsorption vessel AB to remove CO2 and FI2O;
0.4 Collecting the resulting Fluid FI;
1.1 Providing an insulated adsorption vessel (1) as defined in claim 1;
1.3 Cooling the insulated adsorption vessel (1) and/or the fluid FI to an operating temperature T1 in the range of from -40°C to -130°C;
1.4 Contacting the optionally cooled fluid FI with the insulated adsorption vessel to remove one or more impurities Gl;
1.5 Collecting the resulting purified fluid F2; and
1.6 Regenerating the insulated adsorption vessel (1) by vacuum whilst maintaining the temperature of the vessel at a temperature in the range T1 to T1 + 50°C (i.e. in the range +10°C to -130°C).
4. A process according to any one of claims 1 to 3, wherein the operating temperature T1 is in the range -90°C to -110°C.
5. A process according to any one of claims 1 to 4, wherein each adsorptive media is
independently selected from crystalline metal aluminosilicates.
6. A process according to any one of claims 1 to 5, wherein regeneration of the insulated adsorption vessel in step 1.6 is carried out at a pressure in the range of from l.OxlO 4 mbar to 1.0xl03mbar.
7. A process according to any one of claims 1 to 6, wherein the insulated adsorption vessel comprises a pair of insulated adsorption vessels.
8. An apparatus for use in a process as defined in any one of claims 1 to 7, the apparatus comprising:
o Optionally a heat exchange unit suitable for cooling a fluid FI to a temperature in the range of from -40°C to -130°C,
o An insulated adsorption vessel comprising an adsorptive media;
o One or more isolation valves; and
o A multi-stage vacuum pump.
PCT/GB2019/053289 2018-11-20 2019-11-20 Noble gas recovery method and apparatus WO2020104801A1 (en)

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