WO2020090901A1 - Dispositif et procédé d'usinage au laser - Google Patents

Dispositif et procédé d'usinage au laser Download PDF

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Publication number
WO2020090901A1
WO2020090901A1 PCT/JP2019/042600 JP2019042600W WO2020090901A1 WO 2020090901 A1 WO2020090901 A1 WO 2020090901A1 JP 2019042600 W JP2019042600 W JP 2019042600W WO 2020090901 A1 WO2020090901 A1 WO 2020090901A1
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Prior art keywords
processing
state
laser
laser processing
line
Prior art date
Application number
PCT/JP2019/042600
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English (en)
Japanese (ja)
Inventor
克洋 是松
剛志 坂本
Original Assignee
浜松ホトニクス株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2019073181A external-priority patent/JP7352372B2/ja
Application filed by 浜松ホトニクス株式会社 filed Critical 浜松ホトニクス株式会社
Priority to CN201980071656.3A priority Critical patent/CN112996628B/zh
Priority to KR1020217015670A priority patent/KR102692293B1/ko
Publication of WO2020090901A1 publication Critical patent/WO2020090901A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50—Working by transmitting the laser beam through or within the workpiece
    • B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks

Definitions

  • One aspect of the present invention relates to a laser processing apparatus and a laser processing method.
  • Patent Document 1 describes a laser processing apparatus that includes a holding mechanism that holds a work, and a laser irradiation mechanism that irradiates the work held by the holding mechanism with laser light.
  • a laser irradiation mechanism having a condenser lens is fixed to a base, and movement of a work along a direction perpendicular to the optical axis of the condenser lens is performed by a holding mechanism. Be implemented.
  • a modified region may be formed along the virtual surface inside the object by irradiating the object with laser light.
  • a part of the object is peeled off with the modified region extending over the virtual surface as a boundary.
  • an aspect of the present invention is to provide a laser processing apparatus and a laser processing method capable of easily grasping whether or not an object can be peeled off.
  • a laser processing apparatus is a laser processing apparatus that forms a modified region along a virtual surface inside an object by irradiating the object with laser light, and supports the object.
  • a processing state monitoring unit that monitors the processing state from the imaging result of the image capturing unit, and the processing state monitoring unit is provided along a single processing line.
  • the first slicing state is a state in which cracks extending from a plurality of reforming spots included in the reforming region extend in a direction along a single processing line
  • the second slicing state is monitored.
  • the state is a state in which cracks extending from a plurality of modified spots included in the modified region extend and are connected to each other in a direction along the parallel lines and in a direction intersecting the parallel lines.
  • the laser processing apparatus monitors whether the processing state when the modified region is formed along one processing line is the first slicing state, and / or It is monitored whether the processing state is the second slicing state when the modified region is formed along the processing line having a plurality of parallel lines arranged side by side. Therefore, according to the monitoring result, it becomes possible to easily grasp whether or not the object can be peeled off.
  • the control unit includes a plurality of parallel lines arranged side by side on a first portion including a peripheral portion having a side surface that intersects the laser light incident surface in the object.
  • a machining line having a first machining condition in which a laser beam is irradiated under the first machining condition, and after the first machining process, a second part inside the first part of the object is lined up.
  • a second processing process of irradiating a laser beam under the second processing condition is performed along a processing line having a plurality of parallel lines arranged, and the processing state monitoring unit performs the first processing process in the first processing process.
  • the laser processing apparatus includes an input unit that receives an input from a user, and the control unit sets at least one of the first processing condition and the second processing condition based on the input of the input unit. May be. Thereby, at least one of the first processing condition and the second processing condition can be set as desired.
  • the control unit determines whether the processing state after the laser processing of the first specified amount in the first processing is the second slicing state based on the monitoring result of the processing state monitoring unit. Alternatively, it may be determined whether or not the processing state after the second prescribed amount of laser processing in the second processing process is the second slicing state. In this case, the control unit can automatically determine from the monitoring result whether the machining state is the second slicing state.
  • the control unit determines the processing state when the modified region is formed along one processing line based on the monitoring result of the processing state monitoring unit. You may judge whether it is a slicing state. In this case, the control unit can automatically determine whether the machining state is the first slicing state from the monitoring result.
  • the processing state monitoring unit may further monitor whether the processing state after completion of processing is the second slicing state. Thereby, it is possible to understand that the object can be peeled off after the processing is completed.
  • the laser processing apparatus may include a peripheral edge monitoring unit that monitors the warp of the peripheral edge portion of the object that has a side surface that intersects the laser light incident surface. It is found that when the crack along the virtual surface reaches the peripheral portion, the peripheral portion is warped. Therefore, by monitoring the warp of the peripheral portion, the arrival of the crack in the peripheral portion can be grasped.
  • a laser processing method is a laser processing method for forming a modified region along a virtual surface inside an object by irradiating the object with laser light, and A step of irradiating a target object with a laser beam along the same to form a modified region, a step of imaging the target object in a direction along the incident direction of the laser light, and a step of monitoring the processing state from the imaging result, In the step of monitoring the processing state, it is monitored whether the processing state when the modified region is formed along one processing line is the first slicing state, and / or the two are arranged side by side.
  • the processing state is the second slicing state when the modified region is formed along the processing line having a plurality of parallel lines, and the first slicing state is the first slicing state. Is it a quality spot?
  • the extending cracks are in a state of extending in the direction along one processing line, and the second slicing state is such that the cracks extending from a plurality of reforming spots included in the reforming region are in a direction along the parallel lines and in the parallel line. It is a state where they extend in a direction intersecting with and are connected to each other.
  • this laser processing method it is monitored whether or not the processing state when the modified region is formed along one processing line is the first slicing state, and / or a plurality of the processing elements are arranged side by side. It is monitored whether the processing state is the second slicing state when the modified region is formed along the processing line having the parallel line. Therefore, according to the monitoring result, it becomes possible to easily grasp whether or not the object can be peeled off.
  • FIG. 1 is a perspective view of the laser processing apparatus according to the embodiment.
  • FIG. 2 is a front view of a part of the laser processing apparatus shown in FIG.
  • FIG. 3 is a front view of the laser processing head of the laser processing apparatus shown in FIG.
  • FIG. 4 is a side view of the laser processing head shown in FIG.
  • FIG. 5 is a configuration diagram of an optical system of the laser processing head shown in FIG.
  • FIG. 6 is a configuration diagram of an optical system of a laser processing head of a modified example.
  • FIG. 7 is a front view of a part of the laser processing apparatus of the modified example.
  • FIG. 8 is a perspective view of a laser processing apparatus of a modified example.
  • FIG. 9 is a plan view showing a schematic configuration of the laser processing apparatus according to the first embodiment.
  • FIG. 9 is a plan view showing a schematic configuration of the laser processing apparatus according to the first embodiment.
  • FIG. 10A is a plan view showing an example of the object.
  • FIG. 10B is a side view of the object shown in FIG.
  • FIG. 11A is a side view of the object for explaining the method for manufacturing the semiconductor device using the laser processing apparatus according to the first embodiment.
  • FIG. 11B is a side view of the object showing the continuation of FIG. 11A.
  • FIG. 12A is a side view of the object showing the continuation of FIG. 11B.
  • FIG. 12B is a plan view of the object showing the continuation of FIG.
  • FIG. 12C is a side view of the object shown in FIG.
  • FIG. 13A is a side view of the object showing the continuation of FIG. 12B.
  • FIG. 13B is a side view of the object showing the continuation of FIG. FIG.
  • FIG. 14A is a plan view of an object that is a target of the peeling process according to the first embodiment.
  • FIG. 14B is an enlarged side view showing a portion within a broken line frame of FIG. 14A.
  • FIG. 15 is a plan view for explaining a plurality of modified spots formed in the peeling process according to the first embodiment.
  • FIG. 16A is an image showing a slicing stealth state.
  • FIG. 16B is an image showing a slicing half cut state.
  • FIG. 17A is another image showing the slicing stealth state.
  • FIG. 17B is another image showing the slicing half cut state.
  • FIG. 18A is an image showing a slicing full-cut state in the processed state after the laser processing of the first specified amount.
  • FIG. 18B is an image showing a slicing full-cut state after the second prescribed amount of laser processing.
  • FIG. 19 is a flowchart showing the peeling process according to the first embodiment.
  • FIG. 20A is a plan view of the object for explaining the peeling process according to the first embodiment.
  • FIG. 20B is a plan view of the object showing the continuation of FIG.
  • FIG. 21A is a plan view of the object showing the continuation of FIG. 20B.
  • 21B is a plan view of the object showing the continuation of FIG.
  • FIG. 22 is a plan view of an object for explaining a crack extending from the modified region.
  • FIG. 23 is a diagram showing a result of observing cracks of the object of FIG. FIG.
  • FIG. 24A is a plan view of the object for explaining the peeling process according to the modified example of the first embodiment.
  • FIG. 24B is a plan view of the object showing the continuation of FIG.
  • FIG. 25 is a diagram showing an example of a GUI setting screen.
  • FIG. 26 is a diagram showing another example of the GUI setting screen.
  • FIG. 27 is a diagram showing an example of the administrator mode of the GUI setting screen.
  • FIG. 28 is a diagram showing an experimental result of investigating the optimum pulse energy in the peeling process.
  • FIG. 29A is a plan view of an object for explaining the peeling process according to the second embodiment.
  • FIG. 29 (b) is a plan view of the object showing the continuation of FIG. 29 (a).
  • FIG. 30 is a flowchart showing the peeling process according to the second embodiment.
  • FIG. 30 is a flowchart showing the peeling process according to the second embodiment.
  • FIG. 31 is a flowchart showing the peeling process according to the modification of the second embodiment.
  • FIG. 32 is a flowchart showing the peeling process according to the third embodiment.
  • FIG. 33 is a flowchart showing an example of processing when determining the half-cut processing condition in the peeling processing according to the fourth embodiment.
  • FIG. 34 is a flowchart showing an example of processing when determining the first processing condition in the peeling processing according to the fourth embodiment.
  • FIG. 35 is a flowchart showing an example of processing in the case of determining the second processing condition in the peeling processing according to the fourth embodiment.
  • FIG. 36A is a side view of the object for explaining the method for manufacturing the semiconductor device according to the modification.
  • FIG. 36 (b) is a side view of the object showing the continuation of FIG. 36 (a).
  • FIG. 37A is a side view of an object for explaining a method for manufacturing a semiconductor device according to another modification.
  • FIG. 37 (b) is a side view of the object showing the continuation of FIG. 37 (a).
  • FIG. 38A is a side view of an object for explaining a method for manufacturing a semiconductor device according to another modification.
  • FIG. 38 (b) is a side view of the object showing the continuation of FIG. 38 (a).
  • FIG. 39 is a plan view of an object to be peeled off according to the modification.
  • FIG. 40 is a plan view of the laser processing apparatus of the modified example.
  • FIG. 41 is a plan view showing an example of an object shown in FIG. 41 (a).
  • FIG. 42 is a plan view of a laser processing apparatus for explaining a method of manufacturing a semiconductor device using the laser processing apparatus of the modified example.
  • FIG. 43A is a side view of the object for explaining the method of manufacturing the semiconductor device using the laser processing apparatus of the modified example.
  • 43 (b) is a side view of the object showing the continuation of FIG. 43 (a).
  • FIG. 44 (a) is a side view of the object showing the continuation of FIG. 43 (b).
  • FIG. 44 (b) is a plan view of the object showing the continuation of FIG. 44 (a).
  • FIG. 44 (c) is a side view of the object shown in FIG. 44 (b).
  • FIG. 45 is a plan view of the laser processing apparatus for explaining the method of manufacturing the semiconductor device using the laser processing apparatus of the modified example.
  • FIG. 45 is a plan view of the laser processing apparatus for explaining the method of manufacturing the semiconductor device using the laser processing apparatus of the modified example.
  • FIG. 46 is a side view of a part of the laser processing apparatus for explaining the method of manufacturing a semiconductor device using the laser processing apparatus of the modified example.
  • FIG. 47 is a side view of the peripheral portion of the object showing the continuation of FIGS. 44 (b) and 44 (c).
  • FIG. 48A is a side view of the object showing the continuation of FIG. 47.
  • 48B is a side view of the object showing the continuation of FIG. 48A.
  • FIG. 49A is a diagram showing a cross-sectional photograph of the peripheral portion of the object.
  • FIG. 49B is a diagram showing a cross-sectional photograph in which a part of FIG. 49A is enlarged.
  • FIG. 50 is a side view of a part of the laser processing apparatus for explaining the method of manufacturing a semiconductor device using the laser processing apparatus of the modified example.
  • the laser processing apparatus 1 includes a plurality of moving mechanisms 5 and 6, a support 7, a pair of laser processing heads 10A and 10B, a light source unit 8, and a controller 9. I have it.
  • the first direction will be referred to as the X direction
  • the second direction perpendicular to the first direction will be referred to as the Y direction
  • the third direction perpendicular to the first and second directions will be referred to as the Z direction.
  • the X direction and the Y direction are horizontal directions
  • the Z direction is a vertical direction.
  • the moving mechanism 5 has a fixed portion 51, a moving portion 53, and a mounting portion 55.
  • the fixed portion 51 is attached to the device frame 1a.
  • the moving unit 53 is attached to a rail provided on the fixed unit 51, and can move along the Y direction.
  • the attachment portion 55 is attached to a rail provided on the moving portion 53 and can move along the X direction.
  • the moving mechanism 6 has a fixed portion 61, a pair of moving portions 63 and 64, and a pair of mounting portions 65 and 66.
  • the fixed portion 61 is attached to the device frame 1a.
  • Each of the pair of moving portions 63 and 64 is attached to a rail provided on the fixed portion 61, and each of them can move independently along the Y direction.
  • the attachment portion 65 is attached to a rail provided on the moving portion 63 and can move along the Z direction.
  • the attachment portion 66 is attached to a rail provided on the moving portion 64 and can move along the Z direction. That is, with respect to the device frame 1a, each of the pair of mounting portions 65 and 66 can move along the Y direction and the Z direction.
  • Each of the moving units 63 and 64 constitutes a first and second horizontal moving mechanism (horizontal moving mechanism).
  • Each of the mounting portions 65 and 66 constitutes a first and second vertical movement mechanism (vertical movement mechanism).
  • the support portion 7 is attached to a rotary shaft provided on the attachment portion 55 of the moving mechanism 5, and can rotate about an axis parallel to the Z direction as a center line. That is, the support part 7 can move along each of the X direction and the Y direction, and can rotate about the axis parallel to the Z direction as the center line.
  • the support part 7 supports the object 100.
  • the object 100 is, for example, a wafer.
  • the laser processing head 10A is attached to the attachment portion 65 of the moving mechanism 6.
  • the laser processing head 10A irradiates the object 100 supported by the support 7 with the laser light L1 (also referred to as “first laser light L1”) while facing the support 7 in the Z direction.
  • the laser processing head 10B is attached to the attachment portion 66 of the moving mechanism 6.
  • the laser processing head 10B irradiates the object 100 supported by the support 7 with the laser light L2 (also referred to as “second laser light L2”) while facing the support 7 in the Z direction.
  • the laser processing heads 10A and 10B form an irradiation unit.
  • the light source unit 8 has a pair of light sources 81 and 82.
  • the light source 81 outputs laser light L1.
  • the laser light L1 is emitted from the emitting portion 81a of the light source 81 and guided to the laser processing head 10A by the optical fiber 2.
  • the light source 82 outputs laser light L2.
  • the laser light L2 is emitted from the emitting portion 82a of the light source 82, and is guided to the laser processing head 10B by another optical fiber 2.
  • the control unit 9 controls each unit of the laser processing apparatus 1 (the supporting unit 7, the plurality of moving mechanisms 5, 6, the pair of laser processing heads 10A and 10B, the light source unit 8 and the like).
  • the control unit 9 is configured as a computer device including a processor, a memory, a storage, a communication device, and the like.
  • the software (program) read into the memory or the like is executed by the processor, and the reading and writing of data in the memory and the storage and the communication by the communication device are controlled by the processor. Thereby, the control unit 9 realizes various functions.
  • An example of processing by the laser processing apparatus 1 configured as above will be described.
  • An example of the processing is an example in which a modified region is formed inside the object 100 along a plurality of lines set in a grid pattern in order to cut the object 100, which is a wafer, into a plurality of chips.
  • the moving mechanism 5 moves the supporting portion 7 along the X direction and the Y direction so that the supporting portion 7 supporting the object 100 faces the pair of laser processing heads 10A and 10B in the Z direction. To move. Then, the moving mechanism 5 rotates the support part 7 with the axis line parallel to the Z direction as the center line so that the plurality of lines extending in one direction on the object 100 are along the X direction.
  • the moving mechanism 6 moves the laser processing head 10A along the Y direction so that the focus point (a part of the focus area) of the laser beam L1 is located on one line extending in one direction. To move. On the other hand, the moving mechanism 6 moves the laser processing head 10B along the Y direction so that the focal point of the laser light L2 is located on the other line extending in one direction. Then, the moving mechanism 6 moves the laser processing head 10A along the Z direction so that the focusing point of the laser beam L1 is located inside the object 100. On the other hand, the moving mechanism 6 moves the laser processing head 10B along the Z direction so that the focal point of the laser beam L2 is located inside the object 100.
  • the light source 81 outputs the laser light L1 and the laser processing head 10A irradiates the object 100 with the laser light L1, and the light source 82 outputs the laser light L2 and the laser processing head 10B lasers the object 100.
  • the light L2 is emitted.
  • the focal point of the laser light L1 relatively moves along one line extending in one direction
  • the focal point of the laser light L2 relatively moves along another line extending in one direction.
  • the moving mechanism 5 moves the supporting portion 7 along the X direction so that the supporting portion 7 moves in the X direction. In this way, the laser processing apparatus 1 forms the modified region inside the object 100 along each of the plurality of lines extending in one direction on the object 100.
  • the moving mechanism 5 rotates the support part 7 with the axis line parallel to the Z direction as the center line so that the plurality of lines extending in the other direction orthogonal to the one direction in the object 100 are along the X direction. ..
  • the moving mechanism 6 moves the laser processing head 10A along the Y direction so that the focus point of the laser light L1 is located on one line extending in the other direction.
  • the moving mechanism 6 moves the laser processing head 10B along the Y direction so that the focus point of the laser light L2 is located on another line extending in the other direction.
  • the moving mechanism 6 moves the laser processing head 10A along the Z direction so that the focusing point of the laser beam L1 is located inside the object 100.
  • the moving mechanism 6 moves the laser processing head 10B along the Z direction so that the focal point of the laser beam L2 is located inside the object 100.
  • the light source 81 outputs the laser light L1 and the laser processing head 10A irradiates the object 100 with the laser light L1, and the light source 82 outputs the laser light L2 and the laser processing head 10B lasers the object 100.
  • the light L2 is emitted.
  • the focal point of the laser beam L1 moves relatively along one line extending in the other direction
  • the focal point of the laser beam L2 moves relatively along the other line extending in the other direction.
  • the moving mechanism 5 moves the supporting portion 7 along the X direction so that the supporting portion 7 moves in the X direction. In this way, the laser processing apparatus 1 forms the modified region inside the object 100 along each of the plurality of lines extending in the other direction orthogonal to the one direction in the object 100.
  • the light source 81 outputs the laser light L1 that is transmissive to the target object 100, for example, by the pulse oscillation method, and the light source 82 outputs the laser light L1 to the target object 100, for example, by the pulse oscillation method.
  • the laser beam L2 having transparency is output.
  • the laser light is condensed inside the object 100, the laser light is particularly absorbed in a portion corresponding to the condensing point of the laser light, and a modified region is formed inside the object 100.
  • the modified region is a region where the density, refractive index, mechanical strength, and other physical properties are different from the surrounding unmodified region.
  • the modified region includes, for example, a melt-processed region, a crack region, a dielectric breakdown region, and a refractive index change region.
  • a plurality of modified spots are lined up. Are formed so as to be lined up in a row along the line.
  • One modified spot is formed by irradiation with one pulse of laser light.
  • the one-row reforming region is a set of a plurality of reforming spots arranged in one row. Adjacent modified spots may be connected to each other or may be separated from each other depending on the relative moving speed of the condensing point of the laser light with respect to the object 100 and the repetition frequency of the laser light.
  • the shape of the line to be set is not limited to the grid shape, and may be a ring shape, a straight line shape, a curved shape, or a shape in which at least one of these is combined. [Configuration of laser processing head]
  • the laser processing head 10A includes a housing 11, an incident section 12, an adjusting section 13, and a condensing section 14.
  • the housing 11 has a first wall portion 21 and a second wall portion 22, a third wall portion 23 and a fourth wall portion 24, and a fifth wall portion 25 and a sixth wall portion 26.
  • the first wall portion 21 and the second wall portion 22 face each other in the X direction.
  • the third wall portion 23 and the fourth wall portion 24 face each other in the Y direction.
  • the fifth wall portion 25 and the sixth wall portion 26 face each other in the Z direction.
  • the distance between the third wall portion 23 and the fourth wall portion 24 is smaller than the distance between the first wall portion 21 and the second wall portion 22.
  • the distance between the first wall portion 21 and the second wall portion 22 is smaller than the distance between the fifth wall portion 25 and the sixth wall portion 26.
  • the distance between the first wall portion 21 and the second wall portion 22 may be equal to the distance between the fifth wall portion 25 and the sixth wall portion 26, or alternatively, the fifth wall portion 25 and the sixth wall portion 26. It may be larger than the distance to the portion 26.
  • the first wall portion 21 is located on the side opposite to the fixed portion 61 of the moving mechanism 6, and the second wall portion 22 is located on the fixed portion 61 side.
  • the third wall portion 23 is located on the mounting portion 65 side of the moving mechanism 6, and the fourth wall portion 24 is located on the side opposite to the mounting portion 65 and on the laser processing head 10B side (FIG. 2).
  • the fifth wall portion 25 is located on the side opposite to the support portion 7, and the sixth wall portion 26 is located on the support portion 7 side.
  • the housing 11 is configured such that the housing 11 is attached to the mounting portion 65 with the third wall portion 23 arranged on the mounting portion 65 side of the moving mechanism 6. Specifically, it is as follows.
  • the mounting portion 65 has a base plate 65a and a mounting plate 65b.
  • the base plate 65a is attached to a rail provided on the moving unit 63 (see FIG. 2).
  • the mounting plate 65b is erected on the end of the base plate 65a on the laser processing head 10B side (see FIG. 2).
  • the casing 11 is attached to the attachment portion 65 by screwing the bolt 28 to the attachment plate 65b via the pedestal 27 while the third wall portion 23 is in contact with the attachment plate 65b.
  • the pedestal 27 is provided on each of the first wall portion 21 and the second wall portion 22.
  • the housing 11 is attachable to and detachable from the mounting portion 65.
  • the incident part 12 is attached to the fifth wall part 25.
  • the incident unit 12 causes the laser light L1 to enter the housing 11.
  • the incident portion 12 is offset to the second wall portion 22 side (one wall portion side) in the X direction and is offset to the fourth wall portion 24 side in the Y direction. That is, the distance between the incident portion 12 and the second wall portion 22 in the X direction is smaller than the distance between the incident portion 12 and the first wall portion 21 in the X direction, and the incident portion 12 and the fourth wall portion 24 in the Y direction. Is smaller than the distance between the incident portion 12 and the third wall portion 23 in the X direction.
  • the incident portion 12 is configured so that the connection end portion 2a of the optical fiber 2 can be connected.
  • the connection end portion 2a of the optical fiber 2 is provided with a collimator lens that collimates the laser light L1 emitted from the emission end of the fiber, and is not provided with an isolator that suppresses return light.
  • the isolator is provided in the middle of the fiber on the light source 81 side with respect to the connection end portion 2a. As a result, the connection end portion 2a is downsized, and the incident portion 12 is downsized.
  • An isolator may be provided at the connection end 2a of the optical fiber 2.
  • the adjusting unit 13 is arranged in the housing 11.
  • the adjusting unit 13 adjusts the laser light L1 incident from the incident unit 12.
  • Each component of the adjusting unit 13 is attached to an optical base 29 provided inside the housing 11.
  • the optical base 29 is attached to the housing 11 so as to partition the area inside the housing 11 into an area on the third wall portion 23 side and an area on the fourth wall portion 24 side.
  • the optical base 29 is integrated with the housing 11.
  • the components included in the adjusting unit 13 are attached to the optical base 29 on the fourth wall 24 side. Details of each configuration of the adjustment unit 13 will be described later.
  • the light collector 14 is arranged on the sixth wall 26. Specifically, the light collecting section 14 is arranged in the sixth wall section 26 while being inserted into the hole 26 a formed in the sixth wall section 26 (see FIG. 5).
  • the condensing unit 14 condenses the laser light L1 adjusted by the adjusting unit 13 and emits it to the outside of the housing 11.
  • the light collecting section 14 is offset to the second wall section 22 side (one wall section side) in the X direction and is biased to the fourth wall section 24 side in the Y direction. That is, the distance between the light collecting section 14 and the second wall section 22 in the X direction is smaller than the distance between the light collecting section 14 and the first wall section 21 in the X direction, and the light collecting section 14 and the fourth wall in the Y direction are fourth.
  • the distance from the wall portion 24 is smaller than the distance between the light collecting portion 14 and the third wall portion 23 in the X direction.
  • the adjusting unit 13 has an attenuator 31, a beam expander 32, and a mirror 33.
  • the incident unit 12, the attenuator 31, the beam expander 32, and the mirror 33 of the adjusting unit 13 are arranged on a straight line (first straight line) A1 extending along the Z direction.
  • the attenuator 31 and the beam expander 32 are arranged between the incident part 12 and the mirror 33 on the straight line A1.
  • the attenuator 31 adjusts the output of the laser light L1 incident from the incident unit 12.
  • the beam expander 32 expands the diameter of the laser light L1 whose output is adjusted by the attenuator 31.
  • the mirror 33 reflects the laser light L1 whose diameter has been expanded by the beam expander 32.
  • the adjusting unit 13 further includes a reflective spatial light modulator 34 and an image forming optical system 35.
  • the reflective spatial light modulator 34 of the adjustment unit 13, the imaging optical system 35, and the condensing unit 14 are arranged on a straight line (second straight line) A2 extending along the Z direction.
  • the reflective spatial light modulator 34 modulates the laser light L1 reflected by the mirror 33.
  • the reflective spatial light modulator 34 is, for example, a reflective liquid crystal (LCOS: Liquid Crystal on Silicon) spatial light modulator (SLM: Spatial Light Modulator).
  • the image forming optical system 35 constitutes a double-sided telecentric optical system in which the reflecting surface 34a of the reflective spatial light modulator 34 and the entrance pupil surface 14a of the condensing unit 14 are in an image forming relationship.
  • the image forming optical system 35 is composed of three or more lenses.
  • the straight line A1 and the straight line A2 are located on a plane perpendicular to the Y direction.
  • the straight line A1 is located on the second wall portion 22 side (one wall portion side) with respect to the straight line A2.
  • the laser beam L1 enters the housing 11 from the incident part 12, travels on the straight line A1, is sequentially reflected by the mirror 33 and the reflective spatial light modulator 34, and then the straight line A2.
  • the light travels upward and is emitted from the light collecting unit 14 to the outside of the housing 11.
  • the order of arrangement of the attenuator 31 and the beam expander 32 may be reversed.
  • the attenuator 31 may be arranged between the mirror 33 and the reflective spatial light modulator 34.
  • the adjusting unit 13 may have other optical components (for example, a steering mirror arranged in front of the beam expander 32).
  • the laser processing head 10A further includes a dichroic mirror 15, a measurement unit 16, an observation unit 17, a drive unit 18, and a circuit unit 19.
  • the dichroic mirror 15 is arranged on the straight line A2 between the imaging optical system 35 and the condensing unit 14. That is, the dichroic mirror 15 is arranged in the housing 11 between the adjusting unit 13 and the light collecting unit 14. The dichroic mirror 15 is attached to the optical base 29 on the side of the fourth wall portion 24. The dichroic mirror 15 transmits the laser light L1. From the viewpoint of suppressing astigmatism, the dichroic mirror 15 may be, for example, a cube type or two plate types arranged so as to have a twist relationship.
  • the measuring unit 16 is arranged inside the housing 11 with respect to the adjusting unit 13 on the first wall 21 side (the side opposite to the one wall side).
  • the measuring unit 16 is attached to the optical base 29 on the fourth wall 24 side.
  • the measurement unit 16 outputs measurement light L10 for measuring the distance between the surface of the object 100 (for example, the surface on the side on which the laser light L1 is incident) and the light condensing unit 14, and through the light condensing unit 14.
  • the measurement light L10 reflected by the surface of the object 100 is detected. That is, the measurement light L10 output from the measurement unit 16 is applied to the surface of the object 100 via the light condensing unit 14, and the measurement light L10 reflected on the surface of the object 100 passes through the light condensing unit 14. And is detected by the measuring unit 16.
  • the measurement light L10 output from the measurement unit 16 is sequentially reflected by the beam splitter 20 and the dichroic mirror 15 attached to the optical base 29 on the side of the fourth wall 24, and then the light collection unit 14 outputs the light. It goes out of the housing 11.
  • the measurement light L10 reflected on the surface of the object 100 enters the housing 11 from the light condensing unit 14, is sequentially reflected by the dichroic mirror 15 and the beam splitter 20, enters the measuring unit 16, and then the measuring unit 16 Detected in.
  • the observing unit 17 is arranged in the housing 11 on the first wall 21 side (the side opposite to the one wall side) with respect to the adjusting unit 13.
  • the observation section 17 is attached to the optical base 29 on the side of the fourth wall section 24.
  • the observation unit 17 outputs the observation light L20 for observing the surface of the object 100 (for example, the surface on the side where the laser light L1 is incident), and is reflected by the surface of the object 100 via the light condensing unit 14.
  • the observation light L20 thus generated is detected. That is, the observation light L20 output from the observation unit 17 is applied to the surface of the object 100 via the light condensing unit 14, and the observation light L20 reflected by the surface of the object 100 passes through the light condensing unit 14. And is detected by the observation unit 17.
  • the observation light L20 output from the observation unit 17 passes through the beam splitter 20, is reflected by the dichroic mirror 15, and is emitted from the condensing unit 14 to the outside of the housing 11.
  • the observation light L20 reflected on the surface of the object 100 enters the housing 11 from the light condensing unit 14, is reflected by the dichroic mirror 15, passes through the beam splitter 20, and enters the observation unit 17, Detected at 17.
  • the wavelengths of the laser light L1, the measurement light L10, and the observation light L20 are different from each other (at least the respective central wavelengths are deviated from each other).
  • the drive section 18 is attached to the optical base 29 on the side of the fourth wall section 24.
  • the driving unit 18 moves the condensing unit 14 arranged on the sixth wall unit 26 along the Z direction by the driving force of the piezoelectric element, for example.
  • the circuit portion 19 is arranged on the third wall portion 23 side with respect to the optical base 29 in the housing 11. That is, the circuit unit 19 is arranged on the third wall 23 side with respect to the adjustment unit 13, the measurement unit 16, and the observation unit 17 in the housing 11.
  • the circuit unit 19 is, for example, a plurality of circuit boards.
  • the circuit unit 19 processes the signal output from the measurement unit 16 and the signal input to the reflective spatial light modulator 34.
  • the circuit unit 19 controls the drive unit 18 based on the signal output from the measurement unit 16.
  • the circuit unit 19 maintains the distance between the surface of the object 100 and the light condensing unit 14 constant based on the signal output from the measurement unit 16 (that is, the surface of the object 100).
  • the drive unit 18 is controlled so that the distance from the condensing point of the laser light L1 is kept constant).
  • the housing 11 is provided with a connector (not shown) to which wiring for electrically connecting the circuit unit 19 to the control unit 9 (see FIG. 1) and the like is connected.
  • the laser processing head 10B includes a housing 11, an incident section 12, an adjusting section 13, a condensing section 14, a dichroic mirror 15, a measuring section 16, and an observing section 17,
  • the drive unit 18 and the circuit unit 19 are provided.
  • each configuration of the laser processing head 10B is, as shown in FIG. 2, each configuration of the laser processing head 10A with respect to a virtual plane that passes through the midpoint between the pair of mounting portions 65 and 66 and is perpendicular to the Y direction. Are arranged so as to have a plane symmetry relationship with.
  • the fourth wall portion 24 is located closer to the laser processing head 10B side than the third wall portion 23, and the sixth wall portion 26 is the fifth wall. It is attached to the attachment portion 65 so as to be located on the support portion 7 side with respect to the portion 25.
  • the fourth wall portion 24 is located closer to the laser processing head 10A side than the third wall portion 23, and the sixth wall portion 26 is the second wall portion. It is attached to the attachment portion 66 so as to be located on the support portion 7 side with respect to the five wall portion 25.
  • the housing 11 of the laser processing head 10B is configured such that the housing 11 is attached to the mounting portion 66 with the third wall portion 23 arranged on the mounting portion 66 side. Specifically, it is as follows.
  • the mounting portion 66 has a base plate 66a and a mounting plate 66b.
  • the base plate 66a is attached to a rail provided on the moving unit 63.
  • the mounting plate 66b is erected at the end of the base plate 66a on the laser processing head 10A side.
  • the housing 11 of the laser processing head 10B is attached to the attachment portion 66 with the third wall portion 23 in contact with the attachment plate 66b.
  • the housing 11 of the laser processing head 10B can be attached to and detached from the mounting portion 66. [Action and effect]
  • the housing 11 can be downsized. Further, in the housing 11, the distance between the third wall portion 23 and the fourth wall portion 24 is smaller than the distance between the first wall portion 21 and the second wall portion 22, and the collection disposed on the sixth wall portion 26.
  • the light portion 14 is biased toward the fourth wall portion 24 side in the Y direction.
  • another configuration for example, the laser processing head 10B
  • the condensing unit 14 can be brought close to the other configuration. Therefore, the laser processing head 10A is suitable for moving the condensing unit 14 along the direction perpendicular to the optical axis thereof.
  • the incident portion 12 is provided on the fifth wall portion 25 and is offset to the fourth wall portion 24 side in the Y direction.
  • the region such as disposing another configuration (for example, the circuit unit 19) in a region on the third wall 23 side with respect to the adjustment unit 13 in the region inside the housing 11. it can.
  • the condensing portion 14 is offset to the second wall portion 22 side in the X direction. Accordingly, when the housing 11 is moved along the direction perpendicular to the optical axis of the light condensing unit 14, for example, even if another configuration exists on the second wall 22 side, the other configuration is collected. The light unit 14 can be brought closer.
  • the incident portion 12 is provided on the fifth wall portion 25 and is offset to the second wall portion 22 side in the X direction.
  • other regions for example, the measuring unit 16 and the observing unit 17
  • the measuring unit 16 and the observing unit 17 are arranged in the region on the first wall 21 side with respect to the adjusting unit 13 in the region inside the housing 11, and the circuit unit 19 is
  • the dichroic mirror 15 is arranged on the side of the third wall portion 23 with respect to the adjustment unit 13 in the area inside the housing 11, and the dichroic mirror 15 is arranged between the adjustment unit 13 and the light collection unit 14 in the housing 11. ing. Thereby, the area in the housing 11 can be effectively used.
  • the laser processing apparatus 1 can perform processing based on the measurement result of the distance between the surface of the object 100 and the light condensing unit 14. Further, the laser processing apparatus 1 can perform processing based on the observation result of the surface of the object 100.
  • the circuit section 19 controls the drive section 18 based on the signal output from the measuring section 16. Thereby, the position of the condensing point of the laser beam L1 can be adjusted based on the measurement result of the distance between the surface of the object 100 and the condensing unit 14.
  • the incident section 12, the attenuator 31, the beam expander 32, and the mirror 33 of the adjusting section 13 are arranged on the straight line A1 extending along the Z direction, and the adjusting section 13 is provided.
  • the reflective spatial light modulator 34, the imaging optical system 35, the condensing unit 14, and the condensing unit 14 are arranged on a straight line A2 extending along the Z direction. Accordingly, the adjusting unit 13 including the attenuator 31, the beam expander 32, the reflective spatial light modulator 34, and the imaging optical system 35 can be configured compactly.
  • the straight line A1 is located closer to the second wall portion 22 than the straight line A2.
  • another optical system for example, the measuring unit 16 and the observing unit 17
  • the light condensing unit 14 is provided in the region on the first wall 21 side with respect to the adjusting unit 13 in the region in the housing 11.
  • the light condensing unit 14 of the laser processing head 10A is offset to the laser processing head 10B side in the housing 11 of the laser processing head 10A, and the light condensing unit 14 of the laser processing head 10B is The housing 11 of the processing head 10B is offset to the laser processing head 10A side.
  • each of the pair of mounting portions 65 and 66 moves along each of the Y direction and the Z direction. Thereby, the object 100 can be processed more efficiently.
  • the support portion 7 moves along each of the X direction and the Y direction, and rotates about an axis parallel to the Z direction as a center line. Thereby, the object 100 can be processed more efficiently.
  • the incident section 12, the adjusting section 13, and the light condensing section 14 may be arranged on a straight line A extending along the Z direction.
  • the adjusting unit 13 can be configured compactly.
  • the adjusting unit 13 may not include the reflective spatial light modulator 34 and the imaging optical system 35.
  • the adjusting unit 13 may include an attenuator 31 and a beam expander 32.
  • the adjusting unit 13 including the attenuator 31 and the beam expander 32 can be configured compactly. The order of arrangement of the attenuator 31 and the beam expander 32 may be reversed.
  • the housing 11 at least one of the first wall portion 21, the second wall portion 22, the third wall portion 23, and the fifth wall portion 25 is on the mounting portion 65 (or mounting portion 66) side of the laser processing apparatus 1. It suffices that the housing 11 is configured to be attached to the attachment portion 65 (or the attachment portion 66) in the arranged state. Further, the light collecting section 14 may be offset to the fourth wall section 24 side at least in the Y direction. According to these, when the housing 11 is moved along the Y direction, even if there is another configuration on the fourth wall 24 side, for example, the light collection unit 14 can be brought close to the other configuration. it can. Further, when the housing 11 is moved along the Z direction, for example, the light condensing unit 14 can be brought close to the object 100.
  • the light collecting section 14 may be offset toward the first wall section 21 side in the X direction. According to this, when the housing 11 is moved along the direction perpendicular to the optical axis of the condensing unit 14, for example, even if there is another configuration on the first wall 21 side, the other configuration is present.
  • the light condensing unit 14 can be brought close to. In that case, the incident portion 12 may be offset toward the first wall portion 21 side in the X direction.
  • another region (for example, the measurement unit 16 and the observation unit 17) is arranged in the region on the second wall 22 side with respect to the adjustment unit 13 in the region inside the housing 11, and the region is adjusted. It can be used effectively.
  • FIG. 7 is a front view of a part of the laser processing apparatus 1 in which the laser light L1 is guided by the mirror.
  • the mirror 3 that reflects the laser light L1 moves so as to face the emitting portion 81a of the light source unit 8 in the Y direction and face the incident portion 12 of the laser processing head 10A in the Z direction. It is attached to the moving portion 63 of the mechanism 6.
  • the mirror 3 may be attached to the moving unit 63 of the moving mechanism 6 so that at least one of the angle adjustment and the position adjustment can be performed. According to this, the laser light L1 emitted from the emission portion 81a of the light source unit 8 can be more reliably incident on the incidence portion 12 of the laser processing head 10A.
  • the light source unit 8 may have one light source. In that case, the light source unit 8 may be configured so that a part of the laser light output from one light source is emitted from the emitting portion 81a and the rest of the laser light is emitted from the emitting portion 82b.
  • the laser processing apparatus 1 may include one laser processing head 10A. Even in the laser processing apparatus 1 including one laser processing head 10A, when the housing 11 is moved along the Y direction perpendicular to the optical axis of the condensing unit 14, for example, another configuration is provided on the fourth wall 24 side. Even if there is, the condensing unit 14 can be brought close to the other configuration. Therefore, the object 100 can be efficiently processed even by the laser processing apparatus 1 including one laser processing head 10A. Further, in the laser processing apparatus 1 including one laser processing head 10A, if the attachment portion 65 moves along the Z direction, the object 100 can be processed more efficiently. Further, in the laser processing apparatus 1 including one laser processing head 10A, if the support portion 7 moves along the X direction and rotates about the axis parallel to the Z direction as the center line, the object 100 can be more efficiently processed. It can be processed.
  • the laser processing apparatus 1 may include three or more laser processing heads.
  • FIG. 8 is a perspective view of a laser processing apparatus 1 including two pairs of laser processing heads.
  • the laser processing apparatus 1 shown in FIG. 8 includes a plurality of moving mechanisms 200, 300 and 400, a support 7, a pair of laser processing heads 10A and 10B, a pair of laser processing heads 10C and 10D, and a light source. And a unit (not shown).
  • the moving mechanism 200 moves the support portion 7 along each of the X direction, the Y direction, and the Z direction, and rotates the support portion 7 with the axis parallel to the Z direction as the center line.
  • the moving mechanism 300 has a fixed portion 301 and a pair of mounting portions (first mounting portion, second mounting portion) 305 and 306.
  • the fixed portion 301 is attached to a device frame (not shown).
  • Each of the pair of attachment portions 305 and 306 is attached to a rail provided on the fixed portion 301, and each of them can independently move along the Y direction.
  • the moving mechanism 400 has a fixed portion 401 and a pair of mounting portions (first mounting portion, second mounting portion) 405, 406.
  • the fixed portion 401 is attached to a device frame (not shown).
  • Each of the pair of attachment portions 405 and 406 is attached to a rail provided on the fixed portion 401, and each of them can independently move along the X direction.
  • the rails of the fixed portion 401 are arranged so as to three-dimensionally intersect the rails of the fixed portion 301.
  • the laser processing head 10A is attached to the attachment portion 305 of the moving mechanism 300.
  • the laser processing head 10A irradiates the object 100 supported by the support 7 with laser light while facing the support 7 in the Z direction.
  • Laser light emitted from the laser processing head 10A is guided by an optical fiber 2 from a light source unit (not shown).
  • the laser processing head 10B is attached to the attachment portion 306 of the moving mechanism 300.
  • the laser processing head 10B irradiates the object 100 supported by the support 7 with laser light in a state of facing the support 7 in the Z direction.
  • the laser light emitted from the laser processing head 10B is guided by the optical fiber 2 from a light source unit (not shown).
  • the laser processing head 10C is attached to the attachment portion 405 of the moving mechanism 400.
  • the laser processing head 10C irradiates the object 100 supported by the support 7 with laser light in a state of facing the support 7 in the Z direction.
  • Laser light emitted from the laser processing head 10C is guided by an optical fiber 2 from a light source unit (not shown).
  • the laser processing head 10D is attached to the attachment portion 406 of the moving mechanism 400.
  • the laser processing head 10D irradiates the object 100 supported by the support 7 with laser light in a state of facing the support 7 in the Z direction.
  • Laser light emitted from the laser processing head 10D is guided by an optical fiber 2 from a light source unit (not shown).
  • the configuration of the pair of laser processing heads 10A and 10B in the laser processing apparatus 1 shown in FIG. 8 is the same as the configuration of the pair of laser processing heads 10A and 10B in the laser processing apparatus 1 shown in FIG.
  • the configuration of the pair of laser processing heads 10C and 10D in the laser processing apparatus 1 shown in FIG. 8 is the same as that of the pair of laser processing heads 10A and 10B in the laser processing apparatus 1 shown in FIG.
  • the configuration is the same as that of the pair of laser processing heads 10A and 10B when rotated by 90 ° as the center line.
  • the fourth wall portion 24 is located on the laser processing head 10D side with respect to the third wall portion 23, and the sixth wall portion 26 is the fifth wall. It is attached to the attachment portion 65 so as to be located on the support portion 7 side with respect to the portion 25.
  • the condensing portion 14 of the laser processing head 10C is offset to the fourth wall portion 24 side (that is, the laser processing head 10D side) in the Y direction.
  • the fourth wall portion 24 is located on the laser processing head 10C side with respect to the third wall portion 23, and the sixth wall portion 26 is the fifth wall portion 25. It is attached to the attachment portion 66 so as to be located on the side of the support portion 7.
  • the condensing portion 14 of the laser processing head 10D is offset to the fourth wall portion 24 side (that is, the laser processing head 10C side) in the Y direction.
  • the condensing portion 14 of the laser processing head 10A and the laser processing head 10B are moved.
  • the light condensing section 14 of the above can be brought close to each other.
  • the condensing portion 14 of the laser processing head 10C and the condensing portion 14 of the laser processing head 10D can be brought close to each other. ..
  • the laser processing head and the laser processing apparatus are not limited to those for forming the modified region inside the object 100, and may be those for performing other laser processing.
  • the laser processing apparatus 101 shown in FIG. 9 forms a modified region on the target object 100 by irradiating the target object 100 with a focus point (at least a part of the focus region) and irradiating it with laser light.
  • the laser processing apparatus 101 performs trimming processing and peeling processing on the object 100 to obtain (manufacture) a semiconductor device.
  • the trimming process is a process for removing an unnecessary portion of the object 100.
  • the peeling process is a process for peeling a part of the object 100.
  • the object 100 includes, for example, a disc-shaped semiconductor wafer.
  • the object is not particularly limited, and may be formed of various materials and may have various shapes.
  • a functional element (not shown) is formed on the surface 100a of the object 100.
  • the functional element is, for example, a light receiving element such as a photodiode, a light emitting element such as a laser diode, a circuit element such as a memory, or the like.
  • an effective area R and a removal area E are set in the object 100.
  • the effective region R is a portion corresponding to the semiconductor device to be acquired.
  • the effective region R is a disc-shaped portion including the central portion when the object 100 is viewed from the thickness direction.
  • the removal area E is an area outside the effective area R of the object 100.
  • the removal area E is an outer edge portion of the object 100 other than the effective area R.
  • the removal area E is an annular portion that surrounds the effective area R.
  • the removal area E includes a peripheral edge portion (outer edge bevel portion) when the object 100 is viewed from the thickness direction.
  • a virtual surface M1 as a planned separation surface is set on the object 100.
  • the virtual surface M1 is a surface where the modified region is to be formed.
  • the virtual surface M1 is a surface facing the back surface 100b which is the laser light incident surface of the object 100.
  • the virtual surface M1 is a surface parallel to the back surface 100b and has, for example, a circular shape.
  • the virtual surface M1 is a virtual area and is not limited to a flat surface, and may be a curved surface or a three-dimensional surface.
  • the control unit 9 can set the effective area R, the removal area E, and the virtual surface M1.
  • the effective area R, the removal area E, and the virtual surface M1 may have coordinates specified.
  • the object 100 has a line M3 as a planned trimming line.
  • the line M3 is a line which is scheduled to form the modified region.
  • the line M3 extends annularly inside the outer edge of the object 100.
  • the line M3 here extends in an annular shape.
  • the line M3 is set at the boundary between the effective region R and the removal region E in a portion on the side opposite to the laser light incident surface with respect to the virtual surface M1 inside the object 100.
  • the setting of the line M3 can be performed by the control unit 9.
  • the line M3 is a virtual line, but may be an actually drawn line.
  • the line M3 may have coordinates designated.
  • the laser processing apparatus 101 includes a stage 107, a laser processing head 10A, a first Z-axis rail 106A, a Y-axis rail 108, an imaging unit 110, a GUI (Graphical User Interface) 111, and a control unit 9. Equipped with.
  • the stage 107 is a support part on which the object 100 is placed.
  • the stage 107 has the same structure as the supporting portion 7 (see FIG. 1).
  • the target object 100 is placed with the back surface 100b of the target object 100 on the upper side which is the laser light incident surface side (the front surface 100a is on the lower side which is the stage 107 side).
  • the stage 107 has a rotation axis C provided at the center thereof.
  • the rotation axis C is an axis extending along the Z direction.
  • the stage 107 can rotate around the rotation axis C.
  • the stage 107 is rotationally driven by the driving force of a known driving device such as a motor.
  • the laser processing head 10A irradiates the target object 100 placed on the stage 107 with the first laser light L1 (see FIG. 11A) along the Z direction, thereby forming a modified region inside the target object 100.
  • the laser processing head 10A is attached to the first Z-axis rail 106A and the Y-axis rail 108.
  • the laser processing head 10A is linearly movable in the Z direction along the first Z-axis rail 106A by the driving force of a known driving device such as a motor.
  • the laser processing head 10A is linearly movable in the Y direction along the Y-axis rail 108 by the driving force of a known driving device such as a motor.
  • the laser processing head 10A constitutes an irradiation unit.
  • the laser processing head 10A includes the reflective spatial light modulator 34 as described above.
  • the laser processing head 10A includes a distance measuring sensor 36.
  • the distance measuring sensor 36 emits distance-measuring laser light to the laser light incident surface of the object 100 and detects the distance measuring light reflected by the laser light incident surface to detect the object 100.
  • the displacement data of the laser light incident surface is acquired.
  • a sensor of a triangulation distance measuring method, a laser confocal method, a white confocal method, a spectral interference method, an astigmatism method or the like is used. be able to.
  • the distance measuring sensor 36 is a sensor coaxial with the first laser beam L1
  • a sensor of an astigmatism type or the like can be used.
  • the circuit unit 19 (see FIG. 3) of the laser processing head 10A drives the drive unit 18 (see FIG. 5) so that the condensing unit 14 follows the laser light incident surface based on the displacement data acquired by the distance measuring sensor 36. Drive.
  • the light condensing unit 14 is based on the displacement data so that the distance between the laser light incident surface of the object 100 and the first light condensing point that is the light condensing point of the first laser light L1 is maintained constant. Move along the Z direction.
  • the first Z-axis rail 106A is a rail extending along the Z direction.
  • the first Z-axis rail 106A is attached to the laser processing head 10A via the attachment portion 65.
  • the first Z-axis rail 106A moves the laser processing head 10A along the Z direction so that the first focus point of the first laser light L1 moves along the Z direction (direction intersecting with the virtual plane M1). ..
  • the first Z-axis rail 106A corresponds to the rail of the moving mechanism 6 (see FIG. 1) or the moving mechanism 300 (see FIG. 8).
  • the Y-axis rail 108 is a rail extending along the Y direction.
  • the Y-axis rail 108 is attached to the first Z-axis rail 106A.
  • the Y-axis rail 108 moves the laser processing head 10A along the Y direction so that the first focus point of the first laser light L1 moves along the Y direction (direction along the virtual plane M1).
  • the Y-axis rail 108 corresponds to the rail of the moving mechanism 6 (see FIG. 1) or the moving mechanism 300 (see FIG. 8).
  • the image capturing unit 110 captures an image of the object 100 from a direction along the incident direction of the first laser light L1.
  • the image capturing section 110 includes an alignment camera AC and an image capturing unit IR.
  • the alignment camera AC and the imaging unit IR are attached to the attachment portion 65 together with the laser processing head 10A.
  • the alignment camera AC images, for example, a device pattern or the like using light that passes through the target object 100. The image obtained by this is used for alignment of the irradiation position of the first laser beam L1 with respect to the object 100.
  • the image pickup unit IR picks up an image of the target object 100 with light that passes through the target object 100.
  • the image pickup unit IR has a light source, an objective lens, and a photodetector.
  • the light source outputs light that is transparent to the object 100.
  • the light source includes, for example, a halogen lamp and a filter, and outputs light in the near infrared region, for example.
  • the light output from the light source is guided by an optical system such as a mirror, passes through an objective lens, and is irradiated onto the object 100.
  • the objective lens allows the light reflected by the surface of the object 100 opposite to the laser light incident surface to pass through. That is, the objective lens passes the light propagated (transmitted) through the object 100.
  • the numerical aperture (NA) of the objective lens is, for example, 0.45 or more.
  • the objective lens has a correction ring.
  • the correction ring corrects the aberration generated in the light in the object 100 by adjusting the distances between the plurality of lenses forming the objective lens, for example.
  • the light detector detects the light that has passed through the objective lens.
  • the photodetector is composed of, for example, an InGaAs camera, and detects light in the near infrared region.
  • the imaging unit IR can image at least one of the modified region formed inside the object 100 and the crack extending from the modified region.
  • the imaging unit IR constitutes a processing state monitoring unit that monitors (internal monitoring) the processing state of laser processing inside the object 100.
  • GUI111 displays various information.
  • the GUI 111 includes, for example, a touch panel display.
  • Various settings relating to the processing conditions are input to the GUI 111 by an operation such as a user touch.
  • the GUI 111 constitutes an input unit that receives an input from the user.
  • the control unit 9 is configured as a computer device including a processor, a memory, a storage, a communication device, and the like.
  • the software (program) read into the memory or the like is executed by the processor, and the reading and writing of data in the memory and the storage and the communication by the communication device are controlled by the processor.
  • the control unit 9 controls each unit of the laser processing apparatus 101 and realizes various functions.
  • the control unit 9 controls at least the stage 107, the laser processing head 10A, and the moving mechanism 6 (see FIG. 1) or the moving mechanism 300 (see FIG. 1).
  • the control unit 9 controls the rotation of the stage 107, the irradiation of the first laser light L1 from the laser processing head 10A, and the movement of the first focus point of the first laser light L1.
  • the control unit 9 can execute various controls based on rotation information (hereinafter, also referred to as “ ⁇ information”) regarding the rotation amount of the stage 107.
  • the ⁇ information may be acquired from the driving amount of the driving device that rotates the stage 107, or may be acquired by a separate sensor or the like.
  • the ⁇ information can be acquired by various known methods.
  • the ⁇ information here includes the rotation angle based on the state when the object 100 is located at the position in the 0 ° direction.
  • the control unit 9 rotates the stage 107 and positions the first condensing point at a position along the line M3 (peripheral edge of the effective region R) on the object 100, while the laser machining head is based on the ⁇ information.
  • a trimming process for forming a modified region along the peripheral edge of the effective region R is executed.
  • the trimming process is a process of the control unit 9 that realizes the trimming process. In the trimming process of the present embodiment, before the peeling process (first processing process described later), along the line M3, a portion on the opposite side of the virtual light surface M1 inside the object 100 from the laser light incident surface.
  • the first laser beam L1 is irradiated to form the modified region.
  • the control unit 9 causes the laser processing head 10A to irradiate the first laser beam L1 while controlling the movement of the first focus point in the Y direction while rotating the stage 107, so that the virtual inside of the object 100 is obtained.
  • a peeling process is performed to form the modified region along the surface M1.
  • the peeling process is a process of the control unit 9 that realizes the peeling process.
  • the control unit 9 controls the display of the GUI 111. Trimming processing and peeling processing are executed based on various settings input from the GUI 111.
  • the formation of the reformed area and the switching of its stop can be realized as follows.
  • the laser processing head 10A by starting and stopping (ON / OFF) the irradiation (output) of the first laser light L1, it is possible to switch between the formation of the modified region and the stop of the formation. ..
  • ON / OFF of the Q switch AOM (acousto-optic modulator), EOM (electro-optic modulator), etc.
  • the ON / OFF of the output of the semiconductor laser that constitutes the seed laser and the amplifier (for excitation) laser is switched to start and stop the irradiation of the first laser light L1.
  • the ON / OFF of the irradiation of the first laser light L1 is turned on / off by switching the ON / OFF of the external modulation element (AOM, EOM, etc.) provided outside the resonator. Can be switched at high speed.
  • the formation of the modified region and the switching of its stop may be realized as follows.
  • the optical path of the first laser light L1 may be opened and closed by controlling a mechanical mechanism such as a shutter to switch the formation of the modified region and the stop of the formation.
  • the formation of the modified region may be stopped by switching the first laser light L1 to CW light (continuous wave).
  • CW light continuous wave
  • the modified region of the modified region is displayed. The formation may be stopped.
  • the formation of the modified region may be stopped by controlling the output adjusting unit such as an attenuator and lowering the output of the first laser beam L1 so that the modified region cannot be formed.
  • the formation of the modified region may be stopped by switching the polarization direction.
  • the formation of the modified region may be stopped by scattering (flying) the first laser light L1 in a direction other than the optical axis and cutting it.
  • the manufacturing method described below is a method in which a removed portion (a portion that is not used as a semiconductor device in the target object 100) removed from the target object 100 by the trimming process and the peeling process can be reused.
  • the target object 100 is placed on the stage 107 with the back surface 100b facing the laser light incident surface side.
  • the surface 100a side of the object 100 on which the functional element is mounted is protected by a support substrate or a tape material adhered thereto.
  • the stage 107 is rotated at a constant rotation speed while the first focus point P1 is located at the position on the line M3 of the object 100.
  • the first laser beam L1 is emitted from the laser processing head 10A.
  • the irradiation of the first laser light L1 is repeated by changing the position of the first focus point P1 in the Z direction. That is, as shown in FIGS. 10B and 11B, before the peeling process, along the line M3, on the side opposite to the laser light incident surface with respect to the virtual surface M1 inside the object 100.
  • the modified region 43 is formed in the portion.
  • peeling is performed. Specifically, as shown in FIG. 12A, while the stage 107 is rotating at a constant rotation speed, the laser processing head 10A irradiates the first laser beam L1 and the first focus point P1 changes.
  • the laser processing head 10A is moved along the Y-axis rail 108 so as to move inward in the Y direction from the outer edge side of the virtual surface M1.
  • FIGS. 12B and 12C a spiral shape (centered around the position of the rotation axis C (see FIG. 9)) along the virtual plane M1 inside the object 100 ( A modified region 4 extending along the involute curve is formed.
  • the formed modified region 4 includes a plurality of modified spots. As a result, as shown in FIG.
  • a part of the object 100 is peeled off with the crack extending from the modified region 4 and the modified spot of the modified region 4 across the virtual surface M1 as a boundary.
  • the removal region E is removed with the cracks extending from the modified region 43 and the modified spots of the modified region 43 along the line M3 as boundaries.
  • the peeling of the object 100 and the removal of the removal area E may be performed using, for example, a suction jig.
  • the object 100 may be peeled off on the stage 107 or may be moved to an area dedicated to peeling.
  • the object 100 may be peeled off by using an air blow or a tape material.
  • the modified regions 4 and 43 may be selectively etched with an etching solution (KOH, TMAH, or the like) that reacts with the object 100. This makes it possible to easily peel off the object 100.
  • the stage 107 is rotated at a constant rotation speed, the rotation speed may be changed.
  • the rotation speed of the stage 107 may be changed so that the pitch of the reforming spots included in the reforming region 4 is constant.
  • the separation surface 100h of the object 100 is subjected to finish grinding or polishing with an abrasive such as a grindstone.
  • an abrasive such as a grindstone.
  • a line (processing line) M11 is set in the target object 100 that is the target of peeling processing.
  • the line M11 is a line for forming the modified region 4.
  • the line M11 spirally extends inward from the peripheral side of the object 100. In other words, the line M11 extends in a spiral shape (involute curve) centered on the position of the rotation axis C (see FIG. 9) of the stage 107.
  • the line M11 is a processing line having a plurality of parallel lines M11a arranged side by side. For example, one rounded portion in a spiral form one parallel line M11a.
  • the line M11 is a virtual line, but may be an actually drawn line.
  • the line M11 may have coordinates designated.
  • the object 100 has a bevel portion (peripheral portion) BB having a side surface that intersects the back surface 100b that is the laser light incident surface.
  • the bevel portion BB is, for example, a chamfered surface for improving strength.
  • the bevel portion BB is formed by forming the corner of the peripheral edge of the object 100 into a curved surface (R surface).
  • the bevel portion BB is, for example, a portion between the peripheral edge and the inner side of 200 to 300 ⁇ m in the object 100.
  • the target object 100 is provided with an alignment target 100n.
  • the alignment target 100n has a fixed relationship in the ⁇ direction (the rotation direction around the rotation axis C of the stage 107) with respect to the position of the target object 100 in the 0 ° direction.
  • the position in the 0 ° direction is the position of the reference object 100 in the ⁇ direction.
  • the alignment target 100n is a notch formed on the peripheral side of the target 100.
  • the alignment target 100n is not particularly limited, and may be the orientation flat of the target 100 or the pattern of the functional element.
  • the control unit 9 executes the first processing process of irradiating the bevel peripheral portion (first portion) 100X including the bevel portion BB with the first laser light L1 under the first processing condition. After the first processing, the control unit 9 causes the first laser to be provided on the inner peripheral portion (second portion) 100Y inside the bevel peripheral portion 100X in the object 100 under the second processing condition different from the first processing condition. The second processing process of irradiating the light L1 is executed. The first processing processing and the second processing processing are included in the peeling processing. The sizes of the bevel peripheral portion 100X and the inner peripheral portion 100Y in the object can be input via the GUI 111.
  • the lines M11 are arranged in a line along an inclination direction C2 that is inclined with respect to an orthogonal direction orthogonal to the extending direction C1 (processing progress direction).
  • the first laser light L1 is branched so that the plurality of modified spots SA are formed on the virtual surface M1.
  • the branching of the first laser light L1 can be realized by using, for example, the reflective spatial light modulator 34 (see FIG. 5).
  • the first laser light L1 is branched into four to form four modified spots SA.
  • the spacing in the extending direction C1 of the line M11 is the branching pitch BPx
  • the spacing in the direction orthogonal to the extending direction C1 is the branching pitch BPy.
  • the interval in the extending direction C1 is the pulse pitch PP for the pair of modified spots SA formed by the irradiation of the continuous two pulses of the first laser light L1.
  • the angle between the extending direction C1 and the inclination direction C2 is the branch angle ⁇ .
  • the first laser beam L1 is irradiated onto the target object 100, and the position of the first focus point P1 is set along the spiral line M11 from the peripheral edge toward the inside.
  • the modified region 4 is formed along the line M11. That is, in the first and second processing operations, the region forming the modified region 4 in the object 100 is changed in the first direction from the peripheral edge toward the inside.
  • the first processing condition and the second processing condition are the processing state inside the object 100 (hereinafter, referred to as the processing state when the modified region 4 is formed by irradiating the first laser beam L1 along one processing line).
  • the condition also simply referred to as a “processed state” is a condition in which a slicing half-cut state (first slicing state) described later is obtained.
  • the first processing condition and the second processing condition are the case where the modified region 4 is formed by irradiating the first laser beam L1 along the line M11 which is a processing line having a plurality of parallel lines arranged side by side.
  • it is a condition that the processing state becomes a slicing full cut state (second slicing state) described later.
  • the first processing condition is a condition where the processing state after the laser processing of the first specified amount becomes the slicing full cut state.
  • the second processing condition is a condition in which the processing state after the laser processing of the second specified amount larger than the first specified amount becomes the slicing full cut state.
  • Specific parameters of the first processing condition and the second processing condition include the number of branches of the first laser beam L1, the branch pitches BPy and BPx, the pulse energy, the pulse pitch and the pulse width, and the processing speed.
  • the processing condition that the processing state becomes the slicing half cut state is a processing condition in which parameters are appropriately set based on a known technique so that the processing state becomes the slicing half cut state.
  • the processing condition that the processing state is the slicing full cut state is a processing condition in which the parameters are appropriately set based on a known technique so that the processing state is the slicing full cut state.
  • the first processing condition is that the number of branches is 4, the branch pitch BPy is 20 ⁇ m, the branch pitch BPx is 30 ⁇ m, the pulse energy is 16.73 ⁇ J, the processing speed is 800 mm / s, the pulse pitch is 10 ⁇ m, and the pulse width is 700 ns.
  • the second processing condition is the same as the first processing condition except that the branch pitch BPy is 30 ⁇ m.
  • 16 (a) and 17 (a) are images showing a slicing stealth state.
  • 16B and 17B are images showing a slicing half-cut state.
  • FIG. 18A is an image showing a slicing full-cut state in the processed state after the laser processing of the first specified amount.
  • FIG. 18B is an image showing a slicing full-cut state after the second prescribed amount of laser processing.
  • FIGS. 16 (a) to 18 (b) are images at the position of the virtual plane M1 taken by the image pickup unit IR from the laser light incident surface.
  • FIG. 16A and FIG. 16B show a processing state when the modified region 4 is formed by irradiating the first laser beam L1 along one processing line (parallel line).
  • 17 (a) to 18 (b) show a processing state when the modified region 4 is formed by irradiating the first laser beam L1 along a plurality of processing lines.
  • the processing line is set to extend linearly in the left and right directions in the drawing. As shown in FIGS. 16 (a) to 18 (b), it can be seen that the processing state changes in three stages depending on the pulse energy, the branch pitch, and the like.
  • the slicing stealth state is a state in which only the modified spot SA can be observed. In the slicing stealth state, since there is no crack extension, the state does not change to the slicing full cut state even if the number of processing lines is increased.
  • the slicing full cut (SFC) state is a state in which cracks extending from a plurality of modified spots SA included in the modified region 4 extend and are connected to each other in a direction along a plurality of processing lines and in a direction intersecting the processing lines.
  • the slicing full cut state is a state in which a crack extending from the modified spot SA extends vertically and horizontally on the image and is connected across a plurality of processing lines. As shown in FIGS. 18A and 18B, in the slicing full-cut state, the modified spot SA cannot be confirmed on the image (the space or gap formed by the crack is confirmed).
  • the slicing full-cut state is a state in which a crack is formed across a plurality of processing lines, so that the modified region 4 is irradiated with the first laser light L1 along one processing line. If formed, it cannot occur.
  • the slicing full cut state includes the first slicing full cut state and the second slicing full cut state.
  • the first slicing full-cut state is a slicing full-cut state that occurs after laser processing a first prescribed amount (see FIG. 18A).
  • the second slicing full-cut state is a slicing full-cut state that occurs after laser processing of a second prescribed amount that is larger than the first prescribed amount (see FIG. 18A).
  • the first prescribed amount of laser processing is, for example, the case where the modified region 4 is formed by irradiating the first laser light L1 along a plurality of parallel lines of less than 100 lines.
  • the first prescribed amount of laser processing is, for example, the case where the width of the region forming the modified region 4 in the object 100 in the index direction is less than 12 mm.
  • the index direction is a direction orthogonal to the extending direction of the processing line when viewed from the laser light incident surface.
  • the second prescribed amount of laser processing is, for example, a case where the modified region 4 is formed by irradiating the first laser light L1 along a plurality of 100 or more processing lines.
  • the second prescribed amount of laser processing is, for example, a case where the width of the region forming the modified region 4 in the object 100 in the index direction is 12 mm or more.
  • the first specified amount and the second specified amount are not particularly limited and may be various parameter amounts.
  • the first period fixed amount and the second specified amount may be, for example, processing time.
  • the first-phase quantification and the second prescribed amount may be a combination of a plurality of parameter amounts.
  • FIGS. 16 (a) to 18 (b) are images taken by the image pickup unit IR, the same images as in FIGS. 16 (a) to 18 (b) when taken by a normal IR camera. Is obtained.
  • the results of FIGS. 16 (a) to 18 (b) are not particularly limited to the shape and size of the object 100, and even if the object 100 is a hole wafer or a small piece wafer, the results of FIGS. The same result as in FIG. 18B is obtained.
  • the results of FIGS. 16A to 18B are the results of only the laser processing (the results performed on the assumption that no stress is applied). Even when the modified region 4 is formed by irradiating the first laser beam L1 along a plurality of processing lines of less than 100 lines, a slicing full cut state is obtained by applying stress to the object 100. There is.
  • the control unit 9 sets the first processing condition and the second processing condition based on the input from the user via the GUI 111.
  • the display and input of the GUI 111 will be described later.
  • the control unit 9 causes the GUI 111 to display the imaging result of the imaging unit IR, that is, the processing state inside the object 100.
  • the imaging unit IR monitors whether the processing state when the modified region 4 is formed along the spiral line M11 is the slicing half cut state.
  • the imaging unit IR monitors whether the processing state after the laser processing of the first specified amount is the slicing full cut state (that is, whether the processing state is the first slicing full cut state).
  • the imaging unit IR monitors whether the processing state after the laser processing of the second specified amount is the slicing full cut state (that is, the second slicing full cut state).
  • Monitoring the state includes realizing an action of watching the state, and / or acquiring information (for example, image acquisition) that can determine the state.
  • the control unit 9 determines whether or not the processing state after the laser processing of the first specified amount in the first processing is the second slicing full cut state, and whether the processing in the second processing is performed. 2 It is determined whether or not the processing state after the laser processing of the specified amount is the second slicing full cut state.
  • the processing state can be determined using various known image processing methods.
  • the processing state may be determined using a learned model (AI; artificial intelligence) obtained by deep learning. The same applies to other determinations in the control unit 9.
  • the second processing process is performed to realize the peeling of the object 100.
  • the control unit 9 controls each unit of the laser processing apparatus 101 and executes the following processes.
  • the stage 107 is rotated and the laser processing head 10A is moved to the Y-axis rail 108 and the first position so that the alignment camera AC is positioned directly above the alignment target 100n of the target object 100 and the alignment target AC is in focus. It is moved along the 1Z-axis rail 106A.
  • An image is taken by the alignment camera AC.
  • the position of the object 100 in the 0 degree direction is acquired based on the image captured by the alignment camera AC.
  • the diameter of the target object 100 is acquired based on the captured image of the alignment camera AC.
  • the diameter of the target object 100 may be set by an input from the user.
  • the stage 107 is rotated to position the object 100 at a position in the 0 degree direction.
  • the laser processing head 10A is moved along the Y-axis rail 108 so that the first focus point P1 is located at the predetermined peeling start position in the Y direction.
  • the laser processing head 10A is moved along the first Z-axis rail 106A so that the first focus point P1 is located on the virtual plane M1 in the Z direction.
  • the peeling start predetermined position is a predetermined position farther from the object 100.
  • the rotation of the stage 107 is started.
  • the tracking of the back surface 100b by the distance measuring sensor is started. Before the tracking of the distance measuring sensor is started, it is confirmed in advance that the position of the first focus point P1 is within the range in which the distance measuring sensor can measure the length.
  • the rotation speed of the stage 107 becomes constant (constant speed)
  • irradiation of the first laser light L1 by the laser processing head 10A is started.
  • the laser processing head 10A While irradiating the bevel peripheral portion 100X with the first laser light L1 under the first processing condition, the laser processing head 10A is moved to the Y-axis rail 108 so that the first focus point P1 moves to the inner peripheral side along the Y direction. It is moved along (step S1, first processing step).
  • the region forming the modified region 4 in the object 100 is changed in the first direction E1 from the peripheral edge toward the inside.
  • laser processing is performed with the index direction as the first direction E1.
  • the first condensing point P1 is moved from the peripheral edge toward the inside along the spiral line M11 to form the modified region 4.
  • the irradiation of the first laser light L1 may be started at a time when the optical axis of the first laser light L1 is still located outside the object 100, or it is located in the bevel peripheral portion 100X. It may be time.
  • step S2 After the first prescribed amount of the first machining process, the rotation of the stage 107 and the irradiation of the first laser beam L1 are stopped, and the first machining process is stopped. Based on the image pickup result of the image pickup unit IR, it is determined whether or not the processing state after processing the first specified amount is the slicing full cut state (step S2). If Yes in step S2, the rotation of the stage 107, the irradiation of the first laser beam L1 and the like are restarted, and the first processing step is restarted (step S3). As a result, in the bevel peripheral portion 100X, the modified region 4 is formed along the spiral line M11, and the processing state becomes the slicing full cut state (see FIG. 20B).
  • step S4 laser processing is performed with the index direction as the first direction E1.
  • step S4 the modified region 4 is formed by moving the first condensing point P1 along the spiral line M11 from the peripheral edge toward the inside.
  • step S5 After the second prescribed amount of the second machining process, the rotation of the stage 107 and the irradiation of the first laser beam L1 are stopped, and the second machining process is stopped. Based on the image pickup result of the image pickup unit IR, it is judged whether or not the processing state after the processing of the second specified amount is the slicing full cut state (step S5). In the case of Yes in the step S5, the rotation of the stage 107, the irradiation of the first laser beam L1 and the like are restarted, and the second processing step is restarted (step S6). As a result, in the inner peripheral portion 100Y, the modified region 4 is formed along the spiral line M11, and the processing state becomes the slicing full cut state (see FIG. 21B).
  • the modified region 4 is formed along the line M11 in the entire virtual surface M1, and the processing is completed (step S7).
  • the processing state after the processing is completed is the slicing full cut state in the entire virtual surface M1 (step S8).
  • Yes in the above step S8 it is determined that the peeling process is normally completed, and the process is normally ended.
  • No in step S2 No in step S5, or No in step S8
  • the first processing condition and the second processing condition are reset by a separate process (for example, the process of the fourth embodiment described later).
  • the bevel portion BB may warp during the second processing.
  • the width of the bevel peripheral portion 100X in the index direction is larger than 35 mm, the bevel portion BB may be warped during the first processing.
  • FIG. 22 is a plan view of the object 100 for explaining a crack extending from the modified region 4 formed along the virtual plane M1.
  • FIG. 23 is a diagram showing a result of observing cracks in the object 100 of FIG. FIG. 22 shows a state in which the object 100 is viewed from the laser light incident surface.
  • the modified region 4 is arranged along a plurality of linear processing lines arranged in parallel. Is formed.
  • processing set for the crack on the index direction rear side of the inner peripheral portion 100F (the outer peripheral portion 100G side), the crack on the index direction front side of the inner peripheral portion 100F, and the crack on the index direction front side of the outer peripheral portion 100G.
  • the number of processing lines which is the number of working lines, is changed and observed.
  • the horizontal direction is the scanning direction (extending direction of the processing line), and the vertical direction is the index direction.
  • the number of branches of the first laser beam L1 is 4, the branch pitch BPy is 20 ⁇ m, the branch pitch BPx is 30 ⁇ m, the pulse energy is 16.73 ⁇ J, the processing speed is 800 mm / s, the pulse pitch is 10 ⁇ m, and the pulse width is 700 ns.
  • the object 100 is a silicon wafer having a (100) plane as a main surface. The thickness of the object 100 is 775 ⁇ m.
  • the crack extension amount on the front side in the index direction largely varies and does not depend on the number of processing lines.
  • the crack extension amount increases as the number of processing lines increases. It can be seen that the crack extends in the direction opposite to the index direction (the rear side in the index direction). It can be seen that the crack extension amount of the crack depends on the number of processing lines. That is, when the modified region 4 is formed along the virtual surface M1, the extension direction of the crack extending from the modified region 4 along the virtual surface M1 is the transition of the region forming the modified region 4 in the object 100. It is found to make a significant contribution to the direction (index direction). Specifically, it is found that the crack is likely to stably spread in a direction opposite to the transition direction.
  • the width of the modified area is the width in the index direction. “ ⁇ ” means No Good, “ ⁇ ” means Good, and “ ⁇ ” means Very Good.
  • the experimental results are as follows.
  • the experimental results are as follows.
  • the width of the modified area is the width in the index direction. “ ⁇ ” means No Good, “ ⁇ ” means Good, and “ ⁇ ” means Very Good.
  • the crack can reach the bevel portion BB when the modified area is in the slicing full cut state. It can be seen that it is difficult for the crack to reach the bevel portion BB when the modified area is processed in the slicing half-cut state. That is, in order to extend the crack in the bevel portion BB, at least the processing state of the modified area is required to be the slicing full cut state.
  • the region forming the modified region 4 in the bevel peripheral portion 100X is changed to the first direction E1 inward from the peripheral edge. That is, the index direction of the first laser light L1 is the first direction E1.
  • the crack is likely to stably spread in the direction from the inner side, which is the direction opposite to the first direction E1, toward the peripheral edge.
  • the crack easily and stably spreads in the direction from the inner side of the modified region 4 opposite to the first direction E1 toward the peripheral edge.
  • the crack can be formed even in the bevel portion BB, which is difficult to process, and the object 100 can be reliably peeled off.
  • the inner peripheral portion 100Y which is inside the bevel peripheral portion 100X, it is possible to perform laser processing in which the desired processing condition is the second processing condition, and it is possible to perform laser processing according to various needs such as tact up.
  • the modified region 4 is formed from the periphery to the inside along the line M11 that extends spirally inward from the periphery of the object 100. Or a plurality of modified regions 4 are formed in this order from the peripheral edge to the inner side along a plurality of linear parallel lines arranged inward from the peripheral edge in the object 100. Thereby, it is possible to specifically realize the transition of the region forming the modified region 4 in the bevel peripheral portion 100X including the bevel portion BB to the first direction E1 inward from the peripheral edge.
  • the first processing condition and the second processing condition are such that the processing state is a slicing half when the modified region is formed by irradiating the laser light along one processing line. This is the condition for cutting. Under such processing conditions, the object 100 can be reliably peeled off.
  • the first processing condition and the second processing condition are that the first laser is along a processing line (a spiral line M11 and a plurality of straight lines) having a plurality of parallel lines. This is a condition under which the processing state becomes the slicing full cut state when the modified region 4 is formed by irradiating the light L1. Under such processing conditions, the object 100 can be reliably peeled off.
  • the first processing condition is a condition in which the processing state after the laser processing of the first specified amount becomes the slicing full cut state.
  • the second processing condition is a condition in which the processing state after the laser processing of the second specified amount larger than the first specified amount becomes the slicing full cut state.
  • the surface of the target object 100 is higher than the imaginary plane M1 along the line M3 extending annularly inside the peripheral edge of the target object 100.
  • a trimming process (trimming process) for forming the modified region 43 is performed on the portion on the side of 100a.
  • trimming processing for removing the peripheral portion of the line M3 can be realized. Since the trimming process can be performed before peeling the object 100, avoid irradiating the first laser beam L1 so as to pass through the crack generated by the peeling, as compared with the case where the trimming process is performed after the peeling. You can Further, the removed portion removed from the object 100 by the trimming process and the peeling process can be reused.
  • the region of the target object 100 where the modified region 4 is formed is changed in the first direction E1. That is, the index direction of the first laser light L1 in the second processing process or the second processing process is the first direction E1. This makes it possible to reliably peel off the object 100.
  • the laser processing apparatus 101 and the laser processing method monitor whether the processing state when the modified region 4 is formed along the line M11 is the slicing full cut state. According to the monitoring result, it becomes possible to easily grasp whether or not the object 100 can be peeled off.
  • the first processing it is monitored whether the processing state after the laser processing of the first specified amount is the slicing full cut state.
  • the second processing it is monitored whether the processing state after the laser processing of the second specified amount is the slicing full cut state. According to this, it is possible to easily understand whether or not the object 100 can be peeled off by the first processing process (first processing step). It is possible to easily grasp whether or not the target object 100 can be peeled off by the second processing process (second processing step).
  • the control unit 9 determines, based on the monitoring result of the imaging unit IR, whether or not the processing state after the laser processing of the first specified amount in the first processing is the slicing full cut state, and the second. It is determined whether the processing state after the second prescribed amount of laser processing in the processing process is the slicing full cut state. In this case, the control unit 9 can automatically determine whether the processing state is the slicing full cut state based on the monitoring result.
  • step S8 of determining whether the processing state is the slicing full-cut state after the completion of the processing and each processing related thereto can be omitted.
  • the imaging unit IR may monitor whether the processing state when the modified region 4 is formed along one processing line is the slicing half cut state. For example, when the processing line includes a plurality of lines, the processing state when the modified region 4 is formed along any one of the lines may be monitored. Further, for example, in the case where the processing line is the spiral line M11, the processing state when the modified region 4 is formed along the line of the one circumference portion may be monitored.
  • the control unit 9 determines, based on the monitoring result of the imaging unit IR, whether the processing state when the modified region 4 is formed along one processing line is the slicing half cut state. May be. This makes it possible to automatically determine whether the machining state is the slicing half-cut state based on the monitoring result. If the processing state when the modified region 4 is formed along one processing line is not the slicing half cut state (the slicing stealth state), it is determined that there is an error in the processing state, for example, the processing state. The error may be notified via the GUI 111, and the processing conditions may be reset separately.
  • the first processing (first processing method) is performed on the bevel peripheral portion 100X, and the second processing (second processing) is performed on the inner peripheral portion 100Y.
  • the first processing (first processing) may be performed on the entire area of the object 100 without performing the processing (second processing).
  • the region forming the modified region 4 is changed to the second direction E2.
  • the bevel peripheral portion 100X is subjected to laser processing with the index direction as the first direction E1
  • the modified region 4 is provided on the bevel peripheral portion 100X along the line M11 from the spiral outer edge toward the inner periphery.
  • the inner peripheral portion 100Y is subjected to laser processing with the index direction as the second direction E2, and the modified region 4 is formed in the inner peripheral portion 100Y along the line M11 from the spiral inner periphery toward the outer edge.
  • the distance of the bevel peripheral portion 100X in the index direction may be less than or equal to a preset predetermined distance.
  • the predetermined distance or less is, for example, a distance of 35 mm or less, specifically 20 mm. As a result, the object 100 can be peeled off without cracking.
  • the order of the first machining process (first machining process) and the second machining process (second machining process) may be exchanged, and the first machining process may be performed after the second machining process.
  • cracks are likely to occur during processing of the bevel peripheral portion 100X, but at least the bevel peripheral portion 100X can be peeled off.
  • the index direction of the first machining process is the first direction E1
  • other machining conditions the order of the first and second machining processes, the machining state of the first and second machining processes, etc.
  • the input from the user can be accepted by the GUI 111, and at least one of the first processing condition and the second processing condition can be set by the control unit 9 based on the input of the GUI 111.
  • the first processing condition and the second processing condition can be set as desired.
  • the setting screen displayed on the GUI 111 will be exemplified below.
  • FIG. 25 is a diagram showing an example of the setting screen of the GUI 111.
  • the setting screen shown in FIG. 25 is used during mass production or when the user determines the processing conditions.
  • a processing method selection button 201 for selecting any of a plurality of processing methods
  • an input field 202 for setting the width of the bevel peripheral portion 100X
  • a width of the inner peripheral portion 100Y are set. It includes an input field 203 and a detail button 204 for shifting to detailed settings.
  • the plurality of processing methods differ in the index direction in the first processing, the index direction in the second processing, and the presence / absence of the second processing.
  • the input field 202a has an option of "entire surface".
  • FIG. 26 is a diagram showing another example of the setting screen of the GUI 111.
  • the setting screen shown in FIG. 26 is a screen at the time of detailed setting when, for example, the detail button 204 (see FIG. 25) is touched by the user.
  • the setting screen shown in FIG. 26 includes a processing condition selection button 211 for selecting a processing condition, a branch number column 212 for inputting or selecting the number of branches of the first laser beam L1, and a laser along one processing line.
  • an index field 213 for inputting an index that is a moving distance to the next processing line, an image diagram 214 for inputting or displaying the number of branches and the index, and a position of the modified spot SA in the Z direction are input.
  • a processing Z height field 215, a processing speed field 216 for inputting a processing speed, and a condition switching method button 217 for selecting a processing condition switching method are included.
  • the processing condition selection button 211 it is possible to select which of the first processing condition and the second processing condition is to be set.
  • the index column 213 when the number of branches is 1, the laser processing head 10A is automatically moved in the index direction by the input value.
  • the number of branches is larger than 1, the laser processing head 10A is automatically moved in the index direction by the index based on the following calculation formula.
  • Index (number of branches) x index input value
  • the image diagram 214 includes an index input value display unit 214a and an output input field 214b for inputting the output of each modified spot SA.
  • the machining speed column 216 may be the number of revolutions because the stage 107 actually rotates. In the processing speed column 216, the input processing speed may be automatically replaced with the rotation speed and displayed. With the condition switching method button 217, the second machining process is automatically continued when the first machining process is completed, or when the first machining process is completed, the apparatus is once stopped to monitor the state and then the first machining process is performed. Select whether to continue.
  • FIG. 27 is a diagram showing an example of the administrator mode of the setting screen of the GUI 111.
  • the setting screen shown in FIG. 27 includes a branch direction selection button 221 for selecting the branch direction of the first laser light L1, a branch number column 222 for inputting or selecting the number of branches of the first laser light L1, and a branch pitch BPx.
  • a balance adjustment start button 229 is included.
  • the distance of the optical axis is automatically calculated, and if the calculated value is a distance that causes an error due to the imaging optical system 35 (see FIG. 5), the GUI 111 is displayed. Display that effect. Information regarding the imaging optical system 35 may be input for the calculation.
  • a plurality of branching pitches 227a may be hidden in the optical axis image diagram 227.
  • the masses of the branch pitches 227a and 227b in the optical axis image diagram 227 may be increased or decreased depending on the number of branches.
  • the input values of the branch pitch row number input field 224 and the branch pitch input field 225 are applied, but when each check box CK is checked, the branch pitch corresponding to the checked check box CK is checked.
  • the distance between 227a and 227b can be changed.
  • FIG. 28 is a diagram showing an example of investigating the optimum pulse energy in the peeling process.
  • FIG. 28 shows a processing state when laser processing is performed along one processing line, and whether or not peeling is possible after laser processing is performed along a plurality of processing lines (parallel lines).
  • the number of branches of the first laser light L1 is 4, the branch pitches BPx and BPy are both 30 ⁇ m, the processing speed is 800 mm / s, the pulse pitch is 10 ⁇ m, and the pulse width is 700 ns.
  • “SST” in the figure means a slicing stealth state.
  • SHC in the figure means a slicing half cut state. As shown in FIG.
  • the optimum pulse energy generated in the slicing half-cut state is in the range of 9.08 to 56 ⁇ J. Further, it can be seen that peeling can be performed without any problem particularly when the pulse energy is 12.97 to 25 ⁇ J.
  • the pulse pitch is larger than 10 ⁇ m, the optimum pulse energy tends to be higher than the experimental result in the figure.
  • the pulse pitch is smaller than 10 ⁇ m, the optimum pulse energy tends to be smaller than the experimental result in the figure.
  • the machining state is automatically determined by the control unit 9, but the user may determine the machining state based on the monitoring result of the imaging unit IR.
  • the determination that the processing state is the slicing full-cut state corresponds to the determination that the processing state is neither the slicing half-cut state nor the slicing stealth state.
  • a plurality of reforming spots SA included in the reforming region 4 to be formed are made to have a finer pitch, and the reforming spots SA are spread on the virtual plane M1 as a planned plane for peeling. 100 may be peeled off.
  • the processing conditions are such that the cracks do not relatively extend from the modified spot SA (for example, the wavelength of the laser light is a short wavelength (1028 nm), the pulse width is 50 nsec, and the pulse pitch is 1 to 10 ⁇ m (particularly 1. 5 to 3.5 ⁇ m)) is selected.
  • the processing condition the condition that the crack extends along the virtual plane M1 is selected.
  • the wavelength of the first laser light L1 is selected to be a long wavelength (for example, 1099 nm) and the pulse width is 700 nsec. There is. As a result, new processing states (slicing half-cut state, slicing full-cut state, etc.) have been found.
  • the control unit 9 executes a third processing process in which the bevel peripheral portion 100X is irradiated with the first laser light L1 under another processing condition different from the first processing condition, during the first processing process.
  • the third processing step of irradiating the bevel peripheral portion 100X with the first laser light L1 under another processing condition different from the first processing condition may be performed during the first processing step.
  • the other processing conditions are not particularly limited and may be various conditions. What are the other processing conditions? For example, it may be processing conditions when the processing state inside the object 100 becomes the slicing stealth state, the slicing half cut state, or the slicing full cut state. Even in this case, it is possible to reliably peel off the object 100.
  • the spacing of the machining lines in the index direction in the third machining process (third machining process) may be wider than the spacing of the machining lines in the index direction in the first machining process (first machining process).
  • the machining when switching between the first machining process (first machining process) and the second machining process (second machining process), the machining may be temporarily stopped and switched, or the machining may be switched without being stopped. May be.
  • the processing when switching between the first processing process (first processing process) and the third processing process (third processing process), the processing may be temporarily stopped and switched, or the processing may be switched without stopping the processing. May be.
  • the processing (processing) is switched without stopping the processing, the processing conditions may be switched gently. For example, when the difference between the first processing condition and the second processing condition is only the branch pitch BPy, when changing the branch pitch BPy from 20 ⁇ m to 30 ⁇ m, the processing is not stopped and switched, but the branch pitch BPy is gradually changed. (20 ⁇ m, 21 ⁇ m, 22 ⁇ m, 23 ⁇ m ... 30 ⁇ m in this order) may be changed without stopping the rotation of the stage 107.
  • the peeling process is realized by the first and second processing processes, whereas in the present embodiment, the peeling process is realized by one processing process. That is, as shown in FIGS. 29A and 29B, in the present embodiment, laser processing is performed on the entire area of the object 100 including the bevel peripheral portion 100X and the inner peripheral portion 100Y under one processing condition. Therefore, it is different from the first embodiment.
  • the control unit 9 executes a processing process of irradiating the entire area of the object 100 with the first laser light L1 under the second processing condition. Specifically, the target 100 is irradiated with the first laser light L1 under the second processing condition, and the position of the first focus point P1 is set along the spiral line M11 from the peripheral edge toward the inside. And the modified region 4 is formed along the line M11. That is, the region forming the modified region 4 in the object 100 is changed in the first direction E1 from the peripheral edge toward the inside.
  • the control unit 9 operates so that the suction jig that sucks the object 100 after laser processing is twisted around the Z direction. As a result, external stress can be applied to the object 100 so that it peels off.
  • control unit 9 controls each unit of the laser processing apparatus 101 and executes the following processes. That is, the rotation of the stage 107 is started. While irradiating the object 100 with the first laser light L1 under the second processing condition, the laser processing head 10A is moved along the Y-axis rail 108 so that the first focus point P1 moves to the inner peripheral side along the Y direction. And move (step S11, processing step).
  • step S11 laser processing is performed with the index direction as the first direction E1.
  • step S11 the modified region 4 is formed by moving the first focus point P1 from the peripheral edge toward the inside along the spiral line M11.
  • the timing of starting the irradiation of the first laser light L1 may be when the optical axis of the first laser light L1 is still outside the target object 100, or is located in the bevel peripheral portion 100X. It may be time.
  • step S12 it is determined whether or not the processing state after the processing of the second specified amount is the slicing full cut state (that is, whether the processing state is the second slicing full cut state) (step S12). In the case of Yes in the above step S12, the rotation of the stage 107, the irradiation of the first laser beam L1 and the like are restarted, and the processing step is restarted (step S13).
  • the modified region 4 is formed along the spiral line M11, and the processing state becomes the slicing full cut state (see FIG. 29 (b)). As described above, the modified region 4 is formed along the line M11 over the entire virtual surface M1, and the processing is completed (step S14).
  • step S15 Based on the image pickup result of the image pickup unit IR, it is determined whether or not the processing state after the processing is completed is the slicing full cut state in the entire virtual surface M1 (step S15). In the case of Yes in the above step S15, stress is applied so that a part of the object 100 is peeled off (step S16). In the step S16, the external stress may be applied to the target object 100, for example, by twisting the suction jig that sucks the target object 100 around the Z direction. After that, assuming that the peeling process is normally completed, the process is normally terminated.
  • step S17 it is determined that there is an error in the machining state and, for example, an error in the machining state is notified via the GUI 111 (step S17).
  • the second processing condition is reset by a separate process (for example, the process of the fourth embodiment described later).
  • the same effect as that of the first embodiment can be obtained.
  • the processing state can be set to the slicing full cut state only by laser processing, and the object 100 can be peeled off by applying stress.
  • the processing condition may be a condition that the processing state is the slicing half cut state. Further, the processing condition may be a condition in which the processing state is the first slicing full cut state. Under the processing condition that the processing state is the first slicing full cut state, the step S16 of applying stress may be omitted.
  • the method and structure for applying stress are not particularly limited.
  • a physical stress may be applied (adsorption, pressurization, water pressure, or the like) to extend the crack and peel the crack.
  • stress may be applied by laser preheating and ultrasonic waves to spread the cracks and peel off.
  • FIG. 31 is a flowchart showing a peeling process according to a modified example of the second embodiment.
  • laser processing and stress application are performed to separate the processed state into a slicing full cut state.
  • the following processes shown in FIG. 31 are performed instead of the process shown in FIG. That is, while the rotation of the stage 107 is started and the first laser beam L1 is irradiated to the object 100 under the third processing condition, the laser is moved so that the first focus point P1 moves to the inner peripheral side along the Y direction.
  • the processing head 10A is moved along the Y-axis rail 108 (step S21).
  • the third processing condition is a condition that the processing state becomes a slicing half cut state when the modified region 4 is formed by irradiating the first laser beam L1 along one processing line, and the third processing condition should be lined up. This is a condition under which the slicing full cut state does not occur when the modified region 4 is formed by irradiating the first laser beam L1 along the processing line having the plurality of parallel lines arranged.
  • Such a third processing condition is appropriately set with various parameters based on a known technique so that the processing state is a slicing half-cut state and not a slicing full-cut state.
  • the modified region 4 is formed along the line M11 in the entire virtual surface M1 and the processing is completed (step S22).
  • a stress is applied to the object 100 so that the processing state becomes the slicing full cut state (step S23).
  • step S24 Based on the image pickup result of the image pickup unit IR, it is determined whether or not the processing state after the processing is completed is the slicing full cut state in the entire virtual surface M1 (step S24). In the case of Yes in the above step S24, it is determined that the peeling process is normally completed, and the process is normally ended. On the other hand, in the case of No in step S24, it is determined that there is an error in the machining state, and, for example, an error in the machining state is notified via the GUI 111 (step S25). Also in the laser processing apparatus and the laser processing method according to such a modified example, the same effects as the above can be obtained.
  • the distance measuring sensor 36 (see FIG. 9) of the laser processing head 10A monitors the warp of the bevel portion BB by detecting the height (displacement) of the bevel portion BB.
  • the control unit 9 controls each unit of the laser processing apparatus 101 to execute the following processes shown in FIG. 32.
  • step S31 While irradiating the bevel peripheral portion 100X with the first laser light L1 under the first processing condition, the laser processing head 10A is moved to the Y-axis rail 108 so that the first focus point P1 moves inward along the Y direction. It is moved along (step S31). While irradiating the inner peripheral portion 100Y with the first laser light L1 under the first processing condition or the second processing condition, the laser processing head 10A is moved so that the first focus point P1 moves toward the inner peripheral side along the Y direction. It is moved along the Y-axis rail 108 (step S32). In steps S31 and S32, the modified region 4 is formed by moving the first focus point P1 from the peripheral edge toward the inside along the spiral line M11.
  • step S33 when the height of the bevel portion BB detected by the distance measuring sensor 36 is equal to or higher than the predetermined height set in advance, it is determined that the bevel portion BB is warped.
  • step S33 the rotation of the stage 107, the irradiation of the first laser beam L1 and the like are restarted, and the laser processing on the inner peripheral portion 100Y is restarted (step S34). After that, the modified region 4 is formed along the line M11 in the entire virtual surface M1, and the processing is completed (step S35).
  • step S36 it is determined that there is an error in the processing state, and for example, an error in the processing state is notified via the GUI 111 (step S36).
  • the first processing condition and the second processing condition are reset by a separate process (for example, the processing of the fourth embodiment described later).
  • the same effect as that of the first embodiment can be obtained. Further, it is found that when the crack extends to the inside of the bevel portion BB along the virtual plane M1, the bevel portion BB is warped. From this, in the laser processing apparatus 101 and the laser processing method of this embodiment, the arrival of the crack in the bevel portion BB can be grasped by monitoring the warp of the bevel portion BB (monitoring the appearance).
  • the amount of warp of the bevel portion BB is calculated from the detection result of the distance measuring sensor 36, and the amount of warp of the bevel portion BB is a predetermined value set in advance. If it is above, you may transfer to the process of the said step S36 which notifies an error.
  • the bevel portion BB tends to warp. is there. If the laser processing is further performed after the laser processing with the second direction E2 from the inner circumference to the peripheral edge of the object 100 as the index direction, the object 100 may be cracked due to the stress of the warp. Therefore, in this case, it is possible to prevent cracking of the object 100 in advance by monitoring that the warpage has not occurred before performing the laser processing with the second direction E2 as the index direction.
  • the distance measuring sensor 36 is used as the peripheral edge monitoring unit that monitors the warp of the bevel portion BB, but the present invention is not limited to this. If the outer appearance of the bevel portion BB can be monitored, various devices can be used as the peripheral edge monitoring portion, for example, an observation camera or a non-contact sensor. When the warp of the bevel portion BB is monitored using the non-contact sensor, the presence or absence of warp of the bevel portion BB and the warp amount can be monitored in real time without stopping the laser processing. In the present embodiment, the controller 9 determines the warp of the bevel portion BB, but the user may determine the warp of the bevel portion BB based on the detection result of the distance measuring sensor 36. This embodiment can be applied not only to the first embodiment but also to the second embodiment.
  • a half-cut processing condition which is a processing condition when the processing state inside the target object 100 becomes a slicing half-cut state, is determined in advance before actually performing the laser processing on the target object 100. (Refine).
  • the control unit 9 irradiates the object 100 with the first laser light L1 under the half-cut processing condition along one processing line to form the modified region 4 on the object 100 by one-line processing.
  • (Second preprocessing) is executed.
  • the imaging unit IR acquires a 1-line image (second image) showing the processing state when the modified region 4 is formed along one processing line by the 1-line processing.
  • the control unit 9 determines the processing state shown in the one-line image, and changes the half-cut processing condition according to the determination result. Specifically, the control unit 9 determines whether or not the processing state shown in the one-line image is the slicing half-cut state, and changes the half-cut processing condition when it is not the slicing half-cut state.
  • the half-cut processing condition is a condition that is a prerequisite of the above-described first and second processing conditions.
  • the control unit 9 sets the half-cut processing condition (processing condition of the second preprocessing) based on the input of the GUI 111.
  • FIG. 33 is a flow chart showing an example of processing when the half-cut processing condition is determined.
  • the control unit 9 controls each unit of the laser processing apparatus 101 and executes the following processes illustrated in FIG. 33.
  • the object 100 is irradiated with the first laser light L1 under a set half-cut processing condition along one processing line to form the modified region 4 on the object 100 (step S41, 1 line processing).
  • a one-line image showing the processing state when the modified region 4 is formed in step S41 is acquired by the image pickup unit IR (step S42). Based on the 1-line image, it is determined whether the processing state is the slicing half cut state (step S43).
  • step S44 the currently set half-cut processing condition is determined as the final processing condition (step S44).
  • step S45 the half-cut processing condition is adjusted (step S45).
  • step S45 for example, the pulse energy of the first laser light L1 is optimized (see FIG. 28) and / or the branch pitches BPy, BPx or the pulse pitch is narrowed.
  • the process returns to step S41.
  • the initial value of the half-cut processing condition in step S41 can be set by the user via the GUI 111.
  • the first processing condition which is the processing condition when the processing state inside the object 100 becomes the first slicing full cut state, is set before the laser processing is actually performed on the object 100. Determine (determine) in advance.
  • the control unit 9 irradiates the object 100 with the first laser light L1 under the first processing condition along the processing line having a plurality of lines (parallel lines) arranged side by side to modify the target object 100.
  • Plural line processing (first pretreatment) for forming the region 4 on the object 100 is executed.
  • the imaging unit IR acquires a multi-line image (first image) showing a processing state when the modified region 4 is formed by multi-line processing.
  • the control unit 9 determines the processing state shown in the multi-line image, and changes the first processing condition according to the determination result.
  • the control unit 9 sets the first processing condition based on the input of the GUI 111.
  • the imaging unit IR acquires, as a multi-line image, a first multi-line image showing a processing state after laser processing a first specified amount.
  • the control unit 9 determines whether the processing state after the laser processing of the first specified amount is the slicing full cut state (that is, whether the processing state is the first slicing full cut state) based on the first multiple line image.
  • the control unit 9 changes the first processing condition when the processing state is not the first slicing full cut state.
  • FIG. 34 is a flowchart showing an example of processing when the first processing condition is determined.
  • the control unit 9 controls each unit of the laser processing apparatus 101 to execute the following processes illustrated in FIG. 34.
  • Step S51 multi-line processing
  • the imaging unit IR acquires a first plurality of line images, which is the processing state when the modified region 4 is formed in step S51 and reflects the processing state after the first prescribed amount of laser processing (step S52). Based on the first multiple line image, it is determined whether or not the processing state after the laser processing of the first specified amount is the slicing full cut state (first slicing full cut state) (step S53).
  • step S53 the currently set first machining condition is determined as the final machining condition (step S54). If No in step S52, the first processing condition is adjusted (step S55). In step S55, for example, the pulse energy of the first laser light L1 is optimized (see FIG. 28) and / or the branch pitches BPy, BPx or the pulse pitch is narrowed. After step S55, the process returns to step S51.
  • the initial value of the first processing condition in step S51 can be set by the user via the GUI 111.
  • the second processing condition which is a processing condition when the processing state inside the object 100 becomes the second slicing full cut state is set before the laser processing is actually performed on the object 100. Determine (determine) in advance.
  • the control unit 9 causes the target object 100 to be irradiated with the first laser light L1 under the second processing condition along the processing line having a plurality of lines (parallel lines) arranged side by side to modify the target object 100.
  • Plural line processing (first pretreatment) for forming the region 4 on the object 100 is executed.
  • the imaging unit IR acquires a multi-line image (first image) showing a processing state when the modified region 4 is formed by multi-line processing.
  • the control unit 9 determines the processing state shown in the multi-line image, and changes the second processing condition according to the determination result.
  • the control unit 9 sets the second processing condition based on the input of the GUI 111.
  • the imaging unit IR acquires, as a multi-line image, a second multi-line image showing a processing state after laser processing a second specified amount and after applying stress.
  • the stress application can be realized, for example, in the same manner as the stress application in step S16 (see FIG. 30).
  • the control unit 9 determines whether or not the processing state after the laser processing of the second prescribed amount is the slicing full cut state (that is, whether or not the second slicing full cut state) based on the second multiple line image.
  • the control unit 9 changes the second processing condition when the processing state is not the second slicing full cut state.
  • the imaging unit IR acquires, as the multi-line image, the first multi-line image showing the processing state after the first prescribed amount of laser processing.
  • the control unit 9 determines whether the processing state is the first slicing full cut state based on the first multiple line image. When the processing state is the first slicing full cut state, the control unit 9 changes the second processing condition.
  • the imaging unit IR acquires, as the multiple line image, a second multiple line image showing the processed state after the laser processing of the second specified amount. The control unit 9 determines whether the processing state is the second slicing full cut state based on the second multiple line image. When the processing state is not the second slicing full cut state, the control unit 9 changes the second processing condition.
  • FIG. 35 is a flow chart showing an example of processing when the second processing condition is determined.
  • the control unit 9 controls each unit of the laser processing apparatus 101 and executes the following respective processes illustrated in FIG. 35.
  • Step S61 multi-line processing
  • the imaging unit IR acquires a first multiple line image showing the processing state after the laser processing of the first prescribed amount (step S62). Based on the first multiple line image, it is determined whether or not the processing state after the laser processing of the first specified amount is the slicing full cut state (first slicing full cut state) (step S63).
  • step S63 If the result of step S63 is NO, that is, if the machining state is the slicing stealth state or the slicing half-cut state, the plural lines are continuously machined (step S64).
  • a second plural line image showing the processing state after the laser processing of the second prescribed amount is acquired by the imaging unit IR (step S65). Based on the second multiple line image, it is determined whether or not the processing state after the laser processing of the second specified amount is the slicing full cut state (second slicing full cut state) (step S66).
  • step S66 the currently set second machining condition is determined as the final machining condition (step S67). If YES in step S63, the second processing condition is adjusted (step S68). In step S68, for example, the branch pitches BPy, BPx or the pulse pitch is widened.
  • step S69 the second processing condition is adjusted (step S69).
  • step S69 for example, the pulse energy of the first laser light L1 is optimized (see FIG. 28) and / or the branch pitches BPy, BPx or the pulse pitch is narrowed.
  • step S68 or step S69 the process returns to step S61.
  • the initial value of the second processing condition in step S61 can be set by the user via the GUI 111.
  • the same effect as that of the first embodiment can be obtained. Further, it is found that there is a correlation between the peeling of the object 100 and the processing state when the modified region 4 is formed along the processing line having a plurality of parallel lines. Therefore, in the laser processing apparatus 101 and the laser processing method of the present embodiment, a multi-line image showing the processing state when the modified region 4 is formed along the processing line having a plurality of parallel lines is acquired. Based on this multi-line image, it becomes possible to set the processing conditions so that the object 100 can be peeled off. Therefore, the object 100 can be reliably peeled off.
  • the processing state shown in the one-line image is determined.
  • the half-cut processing condition is changed according to the determination result.
  • the half-cut processing condition can be automatically changed according to the one-line image.
  • the half-cut processing condition is changed when the processing state shown in the one-line image is not the slicing half-cut state. This makes it possible to set the half-cut processing conditions so that the object 100 can be peeled off.
  • the processing state reflected in a multi-line image is determined.
  • the first and second processing conditions are changed according to the determination result.
  • the first and second processing conditions can be automatically changed according to the first image.
  • the target object 100 is obtained. It has been found that can be reliably peeled. Therefore, in the laser processing apparatus and the laser processing method of the present embodiment, it is determined whether the processing state after the laser processing of the first specified amount is the slicing full cut state based on the first multiple line image, and the slicing full cut state is determined. If not, the first processing condition is changed. As a result, it becomes possible to set the first processing condition that allows the object 100 to be reliably peeled off.
  • the modified region 4 is formed along a processing line having a plurality of parallel lines, if the laser processing is performed so that the processing state after the second prescribed amount of laser processing becomes the slicing full cut state, the tact becomes worse. It is found that the object 100 can be peeled off while suppressing the above. Therefore, in the laser processing apparatus 101 and the laser processing method of the present embodiment, it is determined whether the processing state after the laser processing of the second specified amount is the slicing full cut state based on the second multiple line image, and the slicing full cut state is determined. If it is not in the state, the second processing condition is changed. As a result, it becomes possible to set the second processing condition that allows the object 100 to be peeled off while suppressing the deterioration of the tact.
  • the half-cut processing condition, the first processing condition, and the second processing condition are determined, but at least one of these may be determined.
  • the machining state is automatically determined by the control unit 9, but the user may determine the machining state based on the imaging result of the imaging unit IR.
  • the steps S51 and S61 form a first pre-process, and the steps S52 and S62 form a first imaging process. This embodiment can be applied not only to the first embodiment but also to the second embodiment or the third embodiment.
  • the object 100 used when determining the processing conditions in the present embodiment is, for example, a wafer for condition determination that is a practice wafer that does not finally become a semiconductor device (product) due to separation processing or the like, and for example, separation A semiconductor device wafer that is a production wafer that will eventually become a semiconductor device by processing or the like.
  • a processing line may be set in any of the entire area of the wafer to determine the processing conditions.
  • a processing line may be set in the outer edge region that has little influence on the peeling quality of the wafer, the processing conditions may be determined, and the peeling processing may be continuously performed under the determined processing conditions. ..
  • the latter may be adopted, for example, when it is necessary to adjust the processing conditions for each wafer due to variations in the backside film of the wafer.
  • the trimming process for forming the modified region 43 is performed before the object 100 is peeled by the peeling process.
  • the peeling process is performed.
  • the removal area E may be removed by trimming. Also in this case, the removed portion removed from the object 100 by the peeling process can be reused.
  • the trimming process is performed.
  • the removal area E may be removed.
  • the object 100 may be peeled off by a peeling process after the removal region E is removed by a trimming process.
  • the processing line is not limited to the spiral line M11, and processing lines of various shapes may be set on the object 100.
  • a plurality of linear lines (parallel lines) M12 may be set on the object 100 so as to be arranged in a predetermined direction.
  • the plurality of lines M12 are included in the line (processing line) M20.
  • the line M12 is a virtual line, but may be an actually drawn line.
  • the line M12 may have coordinates designated. A part or all of the plurality of lines M12 arranged so as to be aligned may be connected, or may not be connected.
  • the above embodiment may include a plurality of laser processing heads as the irradiation unit.
  • a plurality of laser processing heads are provided as the irradiation unit, the above-described first processing process (first processing process), second processing process (second processing process), first pre-processing (first pre-process) and second pre-processing
  • laser processing may be performed using a plurality of laser processing heads.
  • the reflective spatial light modulator 34 is adopted, but the spatial light modulator is not limited to the reflective type, and a transmissive spatial light modulator may be adopted.
  • the type of the target object 100, the shape of the target object 100, the size of the target object 100, the number and direction of crystal orientations of the target object 100, and the plane orientation of the main surface of the target object 100 are not particularly limited. ..
  • the back surface 100b of the object 100 is the laser light incident surface, but the front surface 100a of the object 100 may be the laser light incident surface.
  • the modified region may be, for example, a crystal region, a recrystallized region, or a gettering region formed inside the object 100.
  • the crystal region is a region in which the structure of the object 100 before processing is maintained.
  • the recrystallized region is a region which is once solidified as a single crystal or a polycrystal when it is solidified again after being vaporized, turned into plasma or melted.
  • the gettering region is a region that exhibits a gettering effect of collecting and trapping impurities such as heavy metals, and may be formed continuously or intermittently.
  • the above embodiment may be applied to processing such as ablation.
  • the pitch of the modified spots SA included in the modified region 4 may be blocked. Sex can occur. In this case, other processing conditions may be changed so that the pitch is constant.
  • the laser processing apparatus 1 ⁇ / b> A includes an alignment camera AC and an imaging unit IR, and the laser processing head (first irradiation unit) 10 ⁇ / b> B is attached to the mounting portion 66 via the turning mechanism 67.
  • the point of attachment is mainly different from the laser processing apparatus 1 described above.
  • the laser processing apparatus 1A trims a target object 100 having a surface 100a (hereinafter also referred to as “first main surface 100a”) and a surface 100b (hereinafter also referred to as “second main surface 100b”). Then, a peeling process is performed to obtain (manufacture) a semiconductor device.
  • the trimming process is a process for removing an unnecessary portion of the object 100.
  • the peeling process is a process for peeling a part of the object 100.
  • the configuration of the laser processing apparatus 1A will be described focusing on the differences from the laser processing apparatus 1 described above. Note that, in FIG. 40, the device frame 1a, the light source unit 8 and the like are omitted.
  • the alignment camera AC and the imaging unit IR are attached to the attachment section 65 together with the laser processing head (second irradiation section) 10A.
  • the alignment camera AC images, for example, a device pattern or the like using light that passes through the target object 100.
  • alignment of the irradiation position of the laser light L1 with respect to the target object 100 is performed.
  • the imaging unit IR images the object 100 with light that passes through the object 100. For example, when the object 100 is a wafer containing silicon, light in the near infrared region is used in the imaging unit IR. Based on the image obtained by the imaging unit IR, confirmation of the modified region formed inside the object 100 and the state of cracks extending from the modified region are performed.
  • the laser processing head 10B is attached to the attachment portion 66 via the turning mechanism 67.
  • the turning mechanism 67 is attached to the mounting portion 66 so as to turn about an axis parallel to the X direction as a center line.
  • the moving mechanism 6 causes the optical axis of the condensing part (first condensing part) 14 of the laser processing head 10B to be parallel to the second main surface 100b of the object 100 in the Y direction (perpendicular to the surface of the object. So that the optical axis of the condensing part 14 of the laser processing head 10B is along the Z direction (second direction) perpendicular to the second main surface 100b.
  • the direction of the laser processing head 10B can be changed.
  • the state where the optical axis of the condensing unit 14 is along the first direction means a state in which the optical axis makes an angle of 10 ° or less with respect to the first direction.
  • the state where the optical axis of the portion 14 is along the second direction means a state where the optical axis makes an angle of 10 ° or less with the second direction.
  • the target object 100 includes, for example, a disc-shaped semiconductor wafer.
  • the object 100 may be formed of various materials and may have various shapes.
  • a functional element (not shown) is formed on the first main surface 100a of the object 100.
  • the functional element is, for example, a light receiving element such as a photodiode, a light emitting element such as a laser diode, a circuit element such as a memory, or the like.
  • an effective portion RR and a peripheral portion EE are set in the object 100.
  • the effective portion RR is a portion corresponding to the semiconductor device to be acquired.
  • the effective portion RR is, for example, a disk-shaped portion including a central portion when the object 100 is viewed from the thickness direction.
  • the peripheral portion EE is a region outside the effective portion RR of the object 100.
  • the peripheral edge portion EE is an outer edge portion of the object 100 other than the effective portion RR.
  • the peripheral edge portion EE is, for example, an annular bevel portion (bevel portion) surrounding the effective portion RR.
  • a virtual surface M1 as a planned separation surface is set on the object 100.
  • the virtual surface M1 is a surface where the modified region is to be formed.
  • the virtual surface M1 is a surface that faces the second main surface 100b that is the laser light incident surface of the object 100 (that is, a surface that faces the second main surface 100b).
  • the virtual surface M1 includes a first area M1a and a second area M1b.
  • the first region M1a is a region located in the effective portion RR of the virtual surface M1.
  • the second area M1b is an area located on the peripheral edge portion EE of the virtual surface M1.
  • the virtual surface M1 is a surface parallel to the second principal surface 100b and has, for example, a circular shape.
  • the virtual surface M1 is a virtual area and is not limited to a flat surface, and may be a curved surface or a three-dimensional surface.
  • the control unit 9 can set the effective portion RR, the peripheral portion EE, and the virtual surface M1.
  • the effective portion RR, the peripheral portion EE, and the virtual surface M1 may have coordinate designations.
  • the object 100 has a line M3 as a planned trimming line.
  • the line M3 is a line which is scheduled to form the modified region.
  • the line M3 extends annularly inside the outer edge of the object 100.
  • the line M3 extends, for example, in an annular shape.
  • the line M3 is set at the boundary between the effective portion RR and the peripheral edge portion EE at the portion inside the object 100 on the side opposite to the laser light incident surface with respect to the virtual surface M1.
  • the setting of the line M3 can be performed by the control unit 9.
  • the line M3 may have coordinates designated.
  • the manufacturing method described below is a method in which a removed portion (a portion that is not used as a semiconductor device in the target object 100) removed from the target object 100 by the trimming process and the peeling process can be reused.
  • the object 100 is supported by the support portion 7 with the second main surface 100b facing the laser light incident surface side.
  • a substrate such as a support substrate is bonded or a tape material is attached to the first main surface 100a side of the object 100 on which the functional element is formed.
  • the object 100 is trimmed.
  • the condensing part (second condensing part) 14 of the laser processing head 10A is located above the line M3, and the first converging point P1 of the laser beam L1 is located at a position on the line M3.
  • the moving mechanism 5 moves the support portion 7 and the moving mechanism 6 moves the laser processing head 10A so that the “focus point P1” is simply located.
  • the moving mechanism 5 rotates the support portion 7 at a constant rotation speed with the rotation axis C (hereinafter, also referred to as “axis C”) as a center line, and at the position on the line M3, the focus point P1 of the laser light L1.
  • axis C the rotation axis C
  • Laser beam L1 is emitted from the laser processing head 10A in the state of being positioned. Such irradiation of the laser beam L1 is repeated by changing the position of the condensing point P1 in the Z direction.
  • the line M3 is formed in the portion on the opposite side of the virtual surface M1 (see FIG. 41) inside the object 100 from the laser light incident surface.
  • the modified region 43 is formed along the line (see FIG. 41).
  • the optical axis of the light condensing unit 14 of the laser processing head 10A is along the Z direction, and the second main surface 100b of the object 100 is the incident surface of the laser beam L1.
  • the moving mechanism 5 causes the laser processing head 10A to emit the laser beam L1 while rotating the support portion 7 around the axis C as the center line at a constant rotation speed, and at the same time, the first region M1a (of the virtual surface M1 ( In FIG. 41), the moving mechanism 6 moves the laser processing head 10A so that the focal point P1 moves from the outside to the inside along the Y direction.
  • the reformed region 4 extending in a spiral shape (involute curve) inside the object 100 along the first region M1a (see FIG. 41).
  • the optical axis of the condensing portion 14 of the laser processing head 10A is along the Z direction
  • the second main surface 100b of the object 100 is the incident surface of the laser beam L1. Is.
  • the control unit 9 places the first inside the effective portion RR in a state where the optical axis of the condensing unit 14 of the laser processing head 10A is along the Z direction.
  • the support 7, the laser processing head 10A, and the plurality of moving mechanisms 5 and 6 are controlled so that the modified region 4 is formed along the region M1a.
  • the peripheral edge portion EE of the object 100 is subjected to a peeling process.
  • the moving mechanism 6 changes the direction of the laser processing head 10B so that the optical axis of the condensing portion 14 of the laser processing head 10B is in the Y direction, and is shown in FIGS. 41 and 47.
  • the moving mechanism 5 moves the support portion 7 and the moving mechanism 6 moves the laser processing head 10B so that the focus point P2 of the laser light L2 is located at the position on the second area M1b of the virtual surface M1.
  • the laser processing is performed with the focus point P2 of the laser light L2 positioned at the position on the second region M1b.
  • the laser beam L2 is emitted from the head 10B.
  • the modified region 4a is formed inside the peripheral portion EE along the second region M1b.
  • the crack 4b extends from the modified region 4a to the inside (that is, the modified region 4 side along the first region M1a) and the outside (that is, the side face EE1 side of the object 100).
  • the optical axis of the condensing part 14 of the laser processing head 10B is along the Y direction
  • the side surface EE1 of the object 100 is the incident surface of the laser beam L2.
  • the side surface EE1 is a surface perpendicular to the first main surface 100a and the second main surface 100b among the side surfaces intersecting the first main surface 100a and the second main surface 100b (first It is a surface perpendicular to the first main surface 100a and the second main surface 100b when viewed from a direction parallel to the main surface 100a and the second main surface 100b.
  • the side surface EE2 is a chamfer formed between the first main surface 100a and the side surface EE1 and between the second main surface 100b and the side surface EE1 among the side surfaces intersecting the first main surface 100a and the second main surface 100b.
  • the surface is, for example, a round shape that is convex outward.
  • the side surface EE1 and the side surface EE2 are included in the peripheral edge portion EE. In this embodiment, the side faces EE1 and EE2 form a bevel portion.
  • the control unit 9 changes the inside of the peripheral edge portion EE in a state where the optical axis of the condensing portion 14 of the laser processing head 10B is along the Y direction.
  • the support portion 7, the laser processing head 10B, and the plurality of moving mechanisms 5 and 6 are controlled so that the quality region 4a is formed.
  • the control unit 9 controls the support unit 7 with the axis C perpendicular to the second main surface 100b of the object 100 as a center line in a state where the optical axis of the light condensing unit 14 of the laser processing head 10B is along the Y direction.
  • the moving mechanism 5 is controlled so as to rotate.
  • the polarization direction of the laser light L2 emitted from the condensing part 14 of the laser processing head 10B is the condensing of the laser light L2.
  • the point P2 is along the moving direction of the object 100.
  • a part of the object 100 is peeled off with the modified region across the virtual plane M1 (see FIG. 41) and the crack extending from the modified region as boundaries.
  • the peripheral edge portion EE is removed with the modified region along the line M3 (see FIG. 41) and the crack extending from the modified region as boundaries.
  • the peeling of a part of the object 100 and the removal of the peripheral edge portion EE may be performed by using, for example, a suction jig.
  • Part of the object 100 may be peeled off on the support portion 7 or may be moved to an area dedicated to peeling.
  • a part of the object 100 may be peeled off by using an air blow or a tape material.
  • the modified regions 4 and 43 may be selectively etched with an etching solution (KOH, TMAH, or the like) that reacts with the object 100. Thereby, the object 100 can be easily peeled off.
  • an etching solution KOH, TMAH, or the like
  • the support portion 7 is rotated at a constant rotation speed, the rotation speed may be changed.
  • the rotation speed of the support portion 7 may be changed so that the pitch of the reforming spots included in the reforming region 4 is constant.
  • the separation surface 100h of the object 100 is subjected to finish grinding or polishing with an abrasive such as a grindstone.
  • an abrasive such as a grindstone.
  • the pitch of a plurality of reforming spots included in the reforming region 4 to be formed is made dense, and the reforming spots are spread on the virtual plane M1 as the planned peeling surface, thereby reducing the target object. 100 may be peeled off.
  • the processing conditions are such that the cracks do not relatively extend from the modified spot (for example, the wavelength of the laser light is a short wavelength (1028 nm), the pulse width is 50 nsec, and the pulse pitch is 1 to 10 ⁇ m (particularly, 1.5 ⁇ m). .About.3.5 ⁇ m)) is selected.
  • the processing condition the condition that the crack extends along the virtual plane M1 is selected.
  • the wavelength of the laser light L1 is selected to be a long wavelength (for example, 1099 nm) and the pulse width is 700 nsec.
  • the laser processing head 10B collects light in a state where the optical axis of the condensing unit 14 of the laser processing head 10B is along the Y direction intersecting the direction perpendicular to the second main surface 100b of the object 100.
  • the laser light L2 is condensed and emitted from the portion 14 to form the modified region 4a inside the peripheral edge portion EE of the object 100.
  • the laser is provided inside the peripheral edge portion EE of the object 100 including the side surfaces EE1 and EE2.
  • the light L2 can be condensed appropriately. Therefore, according to the laser processing apparatus 1A, the modified region 4a can be accurately formed inside the peripheral portion EE of the object 100.
  • FIG. 49 (a) is a diagram showing a cross-sectional photograph of the peripheral portion of the object
  • FIG. 49 (b) is a diagram showing a partially enlarged cross-sectional photograph of FIG. 49 (a).
  • the object is a silicon wafer and the peripheral portion is a bevel portion.
  • the width of the bevel portion in the horizontal direction (direction parallel to the main surface of the silicon wafer) is about 200 to 300 ⁇ m, and the vertical direction of the side surface of the bevel portion which is perpendicular to the main surface of the silicon wafer ( The width in the direction perpendicular to the main surface of the silicon wafer) was about 100 ⁇ m.
  • the surface perpendicular to the main surface of the silicon wafer is the laser light incident surface, and the laser light is incident from the outside of the bevel portion to the inside of the bevel portion.
  • the laser light was focused along the direction. As a result, a modified region and a crack extending horizontally inward and outward from the modified region were formed inside the peripheral portion.
  • the extension amount of the crack was about 120 ⁇ m.
  • the condensing unit 14 of the laser processing head 10A With the optical axis of the condensing unit 14 of the laser processing head 10A being along the Z direction perpendicular to the second main surface 100b of the object 100, the condensing unit 14 of the laser processing head 10A.
  • the laser beam L1 is emitted while being collected from the target region 100, so that the modified region 4 is formed inside the effective portion RR of the object 100 along the virtual plane M1. Thereby, the modified region 4 can be accurately formed inside the effective portion RR of the object 100 along the virtual plane M1.
  • the support portion 7 is rotated about the axis C perpendicular to the second main surface 100b as a center line.
  • the modified region 4a is formed inside the peripheral portion EE of the object 100.
  • the modified region 4a can be efficiently formed inside the peripheral portion EE of the object 100.
  • the polarization direction of the laser light L2 emitted from the light condensing unit 14 of the laser processing head 10B is in the state where the optical axis of the light condensing unit 14 of the laser processing head 10B is along the Y direction.
  • the condensing point P2 of the laser light L2 is along the direction in which it moves with respect to the object 100.
  • the moving mechanisms 5 and 6 may be configured to move at least one of the support 7 and the laser processing head 10A. Similarly, the moving mechanisms 5 and 6 may be configured to move at least one of the support portion 7 and the laser processing head 10B.
  • control unit 9 forms the modified region 4 along the virtual plane M1 inside the effective portion RR of the object 100 in a state where the optical axis of the condensing unit 14 of the laser processing head 10B is along the Z direction.
  • the support 7, the laser processing head 10B, and the moving mechanisms 5 and 6 may be controlled. Thereby, the modified region 4 can be accurately formed along the virtual plane M1 inside the effective portion RR of the object 100 together with or instead of the laser processing head 10A.
  • the laser processing head 10B is changed to the object 100 in both the state where the optical axis of the light condensing portion 14 is along the Z direction and the state where the optical axis of the light condensing portion 14 is along the Y direction.
  • the laser processing apparatus 1A may not include the laser processing head 10A.
  • the laser processing head 10B is dedicated to forming the modified region 4a in the peripheral edge portion EE of the object 100 with the optical axis of the condensing portion 14 along the Y direction. May be. Also in that case, when the laser processing apparatus 1A is dedicated to forming the modified region 4a on the peripheral edge portion EE of the object 100, the laser processing apparatus 1A includes the laser processing head 10A. You don't have to.
  • the optical axis of the condensing portion 14 of the laser processing head 10B intersects the direction perpendicular to the second main surface 100b of the object 100 (that is, the Z direction).
  • the laser beam L2 is emitted from the condensing part 14 of the laser processing head 10B so that the modified region 4a is formed inside the peripheral edge portion EE of the object 100 in a direction other than the Y direction among the directions. It may be emitted while being collected.
  • the light of the light condensing portion 14 of the laser processing head 10B is appropriately focused so that the laser light L2 is focused inside the peripheral edge portion EE.
  • the angle of the axis can be adjusted.
  • the direction in which the optical axis of the condensing part 14 of the laser processing head 10B intersects the direction perpendicular to the second main surface 100b of the object 100 is: For example, a direction forming an angle of 10 to 90 ° with respect to a direction perpendicular to the second main surface 100b of the object 100, or a direction of 30 to 90 ° with respect to a direction perpendicular to the second main surface 100b of the object 100. It is a direction that forms an angle.
  • the peripheral portion EE of the target object 100 is subjected to the release processing after the effective portion RR of the target object 100 is subjected to the release processing, but the peripheral edge portion EE of the target object 100 is subjected to the release processing. After that, the effective portion RR of the object 100 may be subjected to a peeling process.
  • the second main surface 100b of the object 100 is the laser light incident surface, but the first main surface 100a of the object 100 may be the laser light incident surface.
  • the laser processing device 1A may be applied to processing such as ablation.
  • the type of the target object 100, the shape of the target object 100, the size of the target object 100, the number and direction of crystal orientations of the target object 100, and the plane orientation of the main surface of the target object 100 are not particularly limited.
  • the modified region may be a crystal region, a recrystallization region, a gettering region, or the like formed inside the object 100.
  • the crystal region is a region in which the structure of the object 100 before processing is maintained.
  • the recrystallized region is a region which is solidified as a single crystal or a polycrystal when re-solidified after being evaporated, turned into plasma or melted.
  • the gettering region is a region that exhibits a gettering effect of collecting and trapping impurities such as heavy metals.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
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  • Laser Beam Processing (AREA)

Abstract

L'invention concerne un dispositif d'usinage au laser qui comporte une unité de support, une unité d'irradiation, un mécanisme de déplacement, une unité de commande et une unité de surveillance d'état d'usinage. L'unité de surveillance d'état d'usinage : surveille si l'état d'usinage, lorsqu'une région de modification est formée le long d'une ligne d'usinage, est un premier état de coupe ou non ; et/ou surveille l'état d'usinage, lorsqu'une région de modification est formée le long d'une ligne d'usinage ayant une pluralité de lignes parallèles agencées dans une ligne, est un second état de coupe ou non. Dans le premier état de coupe, des fissures s'étendant à partir d'une pluralité de points de modification inclus dans la région de modification s'étendent dans une direction suivant la ligne d'usinage. Dans le second état de coupe, des fissures s'étendant à partir de la pluralité de points de modification inclus dans la région de modification s'étendent dans une direction suivant les lignes parallèles et dans une direction croisant les lignes parallèles, et les fissures se connectent entre elles.
PCT/JP2019/042600 2018-10-30 2019-10-30 Dispositif et procédé d'usinage au laser WO2020090901A1 (fr)

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CN201980071656.3A CN112996628B (zh) 2018-10-30 2019-10-30 激光加工装置及激光加工方法
KR1020217015670A KR102692293B1 (ko) 2018-10-30 2019-10-30 레이저 가공 장치 및 레이저 가공 방법

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JP2018-204114 2018-10-30
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6127526B2 (fr) * 1977-10-20 1986-06-26 Seiken Co
JP2017204574A (ja) * 2016-05-12 2017-11-16 株式会社ディスコ サファイアウェーハの加工方法及びレーザー加工装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6127526B2 (fr) * 1977-10-20 1986-06-26 Seiken Co
JP2017204574A (ja) * 2016-05-12 2017-11-16 株式会社ディスコ サファイアウェーハの加工方法及びレーザー加工装置

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