WO2020060106A1

WO2020060106A1 - Device and method for forming glass pattern

Info

Publication number: WO2020060106A1
Application number: PCT/KR2019/011822
Authority: WO
Inventors: 조형식; 김정겸
Original assignee: 크루셜텍(주)
Priority date: 2018-09-17
Filing date: 2019-09-11
Publication date: 2020-03-26
Also published as: KR20200031774A; KR102115307B1

Abstract

The present invention relates to a device and method for forming a glass pattern and, more specifically, to a device and method for forming a glass pattern, which etch glass in a region covered by a mask.

Description

Glass pattern forming device and glass pattern forming method

The present invention relates to a glass pattern forming device and a glass pattern forming method, and more particularly, to a glass pattern forming device and a glass pattern forming method for etching glass in an area covered by a mask.

Glass is widely used in buildings and automobiles. In addition, glass may be used for display devices and portable electronic devices. Glass (glass) can have a variety of transparency, and because it has electrical insulation, it can be usefully applied to electronic devices.

On the other hand, the optical properties of the glass can be greatly affected by the surface state of the glass. For example, the roughness of the surface of the glass may have an inverse relationship with the reflectivity of the glass. For example, the roughness of the glass surface may have a positive correlation with the degree of diffuse reflection of the glass. Accordingly, research has been conducted to set and implement various degrees of roughness of the surface of the glass according to the location.

As a method of variously implementing the roughness of the glass surface depending on the location, a method using, for example, etching may be considered. To etch the glass, a mask can be attached to the glass. In the case of the process of bonding the mask to the glass and etching the glass, the mask may be in close contact with the glass. In this case, the roughness of the glass surface may correspond to a pattern of holes formed in the mask (hereinafter “mask pattern”).

However, when the glass is in close contact with the mask, the masked region may hardly receive the effect of etching. In this case, a boundary corresponding to the boundary of the mask pattern may be formed on the glass. That is, a gradation effect may not appear in the glass pattern formed on the glass according to the roughness of the glass surface. Since the glass pattern having a gradation may play a key role in realizing the optical properties of the glass, a process of implementing a glass pattern having a gradation on the glass surface may be required.

The technical problem to be achieved by the present invention is to provide a method for forming a glass pattern in which particles are sprayed by spaced apart masks at a predetermined interval in a process of forming a pattern on the surface of the glass.

The technical problem to be achieved by the present invention is to provide a glass pattern forming method for forming a glass pattern having a gradient on the glass surface.

The technical problems to be achieved by the present invention are not limited to the technical problems mentioned above, and other technical problems not mentioned can be clearly understood by those skilled in the art from the following description. There will be.

In order to achieve the above technical problem, according to an aspect of the present invention, the present invention, a frame for mounting a glass (glass); A holder supporting a mask forming a plurality of holes; An actuator unit coupled to at least one of the frame and the holder to provide a driving force to determine the position of the holder relative to the frame; A control unit electrically connected to the actuator unit and the particle injection device; And it is electrically connected to the control unit, and includes a sensor unit for acquiring the positional information of the holder with respect to the frame, one surface of the mask facing the glass, and the control unit, wherein the particle injection device is the other surface of the mask It is possible to provide a glass pattern forming device that controls to provide particles toward the surface and drives the actuator portion so that the holder is spaced at a predetermined interval with respect to the frame.

According to another aspect of the present invention, the control unit may drive the actuator unit to periodically change the position of the holder with respect to the frame.

According to another aspect of the present invention, the sensor unit may generate a first signal including the relative position information of the holder with respect to the frame and provide it to the control unit.

According to another aspect of the present invention, the control unit may generate an output signal based on the first signal and a preset algorithm, and provide the output signal to the actuator unit.

According to another aspect of the present invention, the actuator unit, when receiving the output signal, may perform an operation corresponding to the output signal.

According to another aspect of the present invention, the step of disposing a mask forming a plurality of holes (hole) to be spaced apart from the upper surface of the glass (S100); Spraying particles toward the mask from the top of the mask (S200); Separating the mask from the glass (S300); And it may provide a glass pattern forming method (S10), including the step of cleaning the glass (S400).

According to another aspect of the present invention, in the spraying step S200, the relative position of the mask with respect to the glass may periodically change.

According to another aspect of the present invention, in the spraying step S200, the mask may periodically move in a horizontal direction and a vertical direction with respect to the glass.

According to another aspect of the present invention, the plurality of holes formed in the mask may have different sizes according to positions.

According to another aspect of the present invention, a plurality of holes formed in the mask may have different water densities depending on positions.

According to another aspect of the present invention, the spraying step S200 may include a step of spraying particles toward the mask from the top of the mask to etch the glass (S201).

According to another aspect of the present invention, the spraying step S200 may include spraying particles toward the mask from the top of the mask to deposit the particles on the glass (S202). have.

In the glass pattern method according to an embodiment of the present invention, particles may be sprayed by spacing the mask at a predetermined interval.

The glass pattern forming method according to an embodiment of the present invention may form a glass pattern having a gradient on the glass surface.

It should be understood that the effects of the present invention are not limited to the above-described effects, and include all effects that can be deduced from the configuration of the invention described in the detailed description or claims of the present invention.

1 is a view showing a surface treatment process of a glass according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view of the glass and mask shown in FIG. 1 taken along A-A.

3 is a view showing an example of a mask.

4 is a block diagram of a glass pattern forming device according to an embodiment of the present invention.

5 and 6 are flow charts showing a glass pattern forming process according to an embodiment of the present invention.

Hereinafter, the present invention will be described with reference to the accompanying drawings. However, the present invention may be implemented in various different forms, and thus is not limited to the embodiments described herein. In addition, in order to clearly describe the present invention in the drawings, parts irrelevant to the description are omitted, and like reference numerals are assigned to similar parts throughout the specification.

Throughout the specification, when a part is "connected (connected, contacted, coupled)" to another part, this is not only when it is "directly connected", but also "indirectly" with another member in between. "It also includes the case where it is. Also, when a part is said to “include” a certain component, this means that other components may be further provided instead of excluding the other component unless otherwise stated.

The terms used in this specification are only used to describe specific embodiments, and are not intended to limit the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this specification, terms such as “include” or “have” are intended to indicate that a feature, number, step, operation, component, part, or combination thereof described in the specification exists, and that one or more other features are present. It should be understood that the existence or addition possibilities of fields or numbers, steps, operations, components, parts or combinations thereof are not excluded in advance.

Referring to FIG. 1, a surface treatment process of glass 100 according to an embodiment of the present invention may be shown. The glass 100 according to an embodiment of the present invention may have a shape of a plate. In FIG. 1, the glass 100 has a shape of a plate, but the shape of the glass 100 may not be limited thereto. For example, the glass 100 may have a curved shape. In FIG. 1, for convenience of description, the glass 100 may be located on a horizontal surface. That is, the lower surface of the glass 100 can face the horizontal surface.

The mask 200 may be disposed on the top surface of the glass 100. The mask 200 may include a mask body 210. The mask body 210 may form a skeleton of the mask 200. The outer circumference of the mask body 210 may correspond to the glass 100. The mask body 210 may have rigidity. For example, the mask body 210 may include metal.

The mask pattern 220 may be formed on the mask body 210. The mask pattern 220 may include a plurality of holes or openings. The mask pattern 220 may be referred to as “hole” or “opening”. The plurality of holes 220 may have a profile. The profile of the mask pattern 220 may be determined by the number density of the holes 220. Alternatively, the profile of the mask pattern 220 may be determined by the size of the hole 220. Alternatively, the profile of the mask pattern 220 may be determined by the size and number density of the hole 220.

For example, the size of the hole 220 may vary depending on the location. For example, as it goes from the center of the mask body 210 to one edge, the size of the hole 220 may be reduced. For example, as the distance from the center of the mask body 210 to the opposite edge increases, the size of the hole 220 may decrease. The other side of the mask body 210 may be located opposite to one side of the mask body 210.

In the state in which the mask 200 is disposed on the glass 100, the sand blast device 300 may be positioned on the top of the mask 200. The sand blast apparatus 300 may provide a sand blow 400 on the top surface of the mask 200.

The sand blow 400 may be a flow of small particles. For example, the sand blow 400 may be a flow of at least one of sand particles, metal grains, and mineral grains. The sand blow 400 may be referred to as “particle blow” or “grain blow”. The sand blasting device 300 may be referred to as a “particle spraying device”.

The sand blow 400 may be, for example, a flow of particles deposited on the glass 100. The sand blast apparatus 300 may be referred to as a “deposition apparatus”. When the sand blow 400 is applied to the glass 100, particles forming the sand blow 400 may be deposited on the glass 100. The particles forming the sand blow 400 may include the same or similar molecules as the material forming the glass 100. The pattern formed on the glass 100 may vary depending on the amount of particles deposited on the glass 100.

For another example, the sand blow 400 may be a flow of fluid that can etch the glass 100. The sand blow 400 may be referred to as “fluid blow” or “fluid flow”. The sand blast device 300 may be referred to as a “fluid injection device”.

For example, the sand blow 400 may be a flow of plasma. For example, the sand blow 400 may be a flow of etchant. The etchant may be provided in the form of a mist.

The sand blow 400 may be applied to the glass 100 through the mask pattern 220. When the sand blow 400 is applied to the upper surface of the glass 100, the upper surface of the glass 100 may form a pattern. The pattern formed on the glass 100 may be referred to as a “glass pattern”. That is, the sand blow 400 may form a glass pattern.

After the sandblasting device 300 is operated, the mask 200 can be removed from the glass 100. The upper surface of the glass 100 may be roughened by a sand blow 400. That is, the surface state of the upper surface of the glass 100 may be changed by the sand blow 400.

The sand blow 400 may correspond to the size of the mask pattern 220 and may be applied to the glass 100. The sand blow 400 may be applied to the center of the top surface of the glass 100 relatively, for example. The sand blow 400 may be applied relatively little to both sides (one side and the other side) of the upper surface of the glass 100, for example.

The surface state of the upper surface of the glass 100 may correspond to the mask pattern 220. For example, the center-side surface of the top surface of the glass 100 may be relatively rough. For example, the surfaces on both sides (one side and the other side) of the upper surface of the glass 100 may be relatively less rough. Therefore, the glass pattern formed on the top surface of the glass 100 may correspond to the mask pattern 220 to form a gradation.

The roughness of the top surface of the glass 100 may have a negative correlation with the slippery degree or slip of the glass 100. When the glass 100 is applied to a mobile terminal or a portable electronic device, the roughness of the surface of the glass 100 may provide an effect on the grip of the device.

The optical properties of the top surface of the glass 100 may correspond to a glass pattern. For example, the reflectivity of the center of the top surface of the glass 100 may be smaller than the reflectivity of portions adjacent to both sides of the top surface of the glass 100. That is, the center portion of the upper surface of the glass 100 may be less dazzling than the portions adjacent to both sides of the upper surface of the glass 100. Alternatively, the degree to which light is diffusely reflected from the center of the top surface of the glass 100 may be greater than the degree to which light is diffusely reflected from portions adjacent to both sides of the top surface of the glass 100. That is, the degree to which light is distributed in the center of the top surface of the glass 100 may be greater than information in which light is dispersed in portions adjacent to both sides of the top surface of the glass 100.

When the sand blasting device 300 is operated while the mask 200 is in close contact with the glass 100, the glass pattern formed on the upper surface of the glass 100 may be substantially the same as the mask pattern 220. That is, since the portion of the mask body 210 between adjacent holes 220 can protect the glass 100 from the sand blow 400, the mask pattern formed on the upper surface of the glass 100 is the shape of the mask body 210 Can have Therefore, the glass pattern formed on the upper surface of the glass 100 may correspond to the shape of the mask body 210.

The mask 200 may be disposed spaced apart from the top surface of the glass 100. When the sand blow 400 is applied to the mask 200 in a state in which the mask 200 is spaced apart from the upper surface of the glass 100, the glass located below the portion of the mask body 210 between adjacent holes 220 Sand blow 400 may be applied to the region of (100). When the sand blow 400 is applied to the region of the glass 100 located below the portion of the mask body 210 between the adjacent holes 220, the glass pattern formed on the upper surface of the glass 100 is the mask pattern 220. It may correspond to a profile.

2 is a view showing a cross-section of the glass 100 and the mask 200 shown in FIG. 1 along A-A. 2 (a) may indicate the arrangement of the mask 200 and the size of the hole 220. 2 (b) may show the glass 100 affected by the mask 200.

2 (a), the mask 200 may be spaced apart from the glass 100. For example, the mask 200 may be spaced apart from the glass 100 by a first height h1. The mask 200 may form a thickness. For example, the thickness of the mask 200 may be the first thickness t1. The size of the hole 220 may be the first size r1. The first size r1 may vary depending on the location (point, 地點) of the glass 100 (see FIG. 1).

Referring to FIG. 2B, one surface (for example, an upper surface) of the glass 100 may include a first area 101 and a second area 103. The first region 101 may correspond to the hole 220. The first region 101 may face the hole 220. The second region 103 may correspond to the mask body 210. The second region 103 may face the mask body 210.

The state in which the mask 200 comes into contact with the glass 100 may be considered. When the sand blow 400 (see FIG. 1) is applied to the mask 200 while the mask 200 is in contact with the glass 100, the sand blow 400 (see FIG. 1) may be applied to the first region 101. have. However, the second region 103 may be covered by the mask body 210 and thus may not be affected by the sand blow 400 (see FIG. 1).

As illustrated in FIGS. 1 and 2, a state in which the mask 200 is spaced apart from the glass 100 may be considered. When the sand blow 400 (see FIG. 1) is covered by the mask 200, the sand blow 400 (see FIG. 1) may be directly applied to the first region 101. Also, the sand blow 400 (see FIG. 1) may be applied to the second region 103 through the spaced apart space of the glass 100 and the mask 200. Therefore, the second region 103 may be affected by the sand blow 400 (see FIG. 1).

When the second region 103 is affected by the sand blow 400 (see FIG. 1), the glass pattern may have a gradient. That is, the roughness of the second region 103 may be changed by the sand blow 400 (see FIG. 1). Thus, the mechanical or / and optical properties of the surface of the glass 100 may be gradually changed depending on the position of the surface of the glass 100. In other words, the roughness of the surface of the glass 100 may have a smoothing effect based on the position of the surface of the glass 100.

The degree to which the second region 103 is affected by the sand blow 400 (see FIG. 1) may include at least one of the first size r1, the first thickness t1, and the first height h1, or the like. It can be by combination. For example, the degree to which the second region 103 is affected by the sand blow 400 (see FIG. 1) may have a positive correlation with the first size r1. For example, the degree to which the second region 103 is affected by the sand blow 400 (see FIG. 1) may have a positive correlation with the first height h1. For example, the degree to which the second region 103 is affected by the sand blow 400 (see FIG. 1) may have a negative correlation with the first thickness t1.

1 and 2, while the sand blasting device 300 is operated, the first height h1 may be varied. That is, while the sand blasting device 300 is operating, the distance between the mask 200 and the glass 100 may be changed. For example, while the sand blasting device 300 is operated and the sand blow 400 is applied to the mask 200, the distance between the mask 200 and the glass 100 may be reduced and increased. That is, the mask 200 may move vertically (or move) with respect to the glass 100.

While the sandblasting device 300 is operating, the mask 200 may move horizontally (or move) with respect to the glass 100. The mask 200 is fixed and the glass 100 can move horizontally (or move). Alternatively, the glass 100 is fixed and the mask 200 may move horizontally (or move). Alternatively, the glass 100 and the mask 200 may simultaneously move (or move).

When the mask 200 moves in a horizontal direction with respect to the glass 100, the first region 101 and the second region 103 may be changed. For example, when the mask 200 moves in a horizontal direction with respect to the glass 100, the first region 101 becomes the second region 103 and the second region 103 becomes the first region 101. Can be.

As the mask 200 moves in the vertical direction and / or the horizontal direction with respect to the glass 100, the second region 103 corresponding to the mask body 210 can be effectively affected by the sand blow 400. The vertical or / or horizontal movement of the mask 200 with respect to the glass 100 may be similar to the movement of the pendulum. For example, vertical or / or horizontal movement of the mask 200 with respect to the glass 100 may correspond to movement of a simple pendulum.

3 is a diagram showing an embodiment of the mask 200. 3 is a view showing an upper surface of the mask pattern 220. Referring to (a) of FIG. 3, the mask pattern 220 may be smaller as it moves away from the center of the mask 200. The mask pattern 220 may have a profile having a lower density as it moves radially away from the center of the mask 200.

Referring to FIG. 3B, the mask pattern 220 may have a narrowing width from one side to the other side. The other side of the mask 200 may be located opposite to one side of the mask 200. The mask pattern 220 may have a profile having a lower density from one side of the mask 200 to the other side.

In addition to the mask pattern 220 shown in FIGS. 1 to 3, the mask pattern 220 may have various size patterns and density patterns. For example, a mask pattern 220 having an “X” shape as a whole may be formed. For example, a mask pattern 220 having a wave pattern as a whole may be formed.

4 is a block diagram of a glass pattern forming device 500 according to an embodiment of the present invention. The glass pattern forming device 500 may form a pattern on the glass 100 (see FIGS. 1 and 2) together with the sand blasting apparatus 300.

The glass pattern forming device 500 may include a frame 510. The frame 510 can accommodate the glass 100 (see FIGS. 1 and 2). That is, the glass 100 (see FIGS. 1 and 2) may be seated on the frame 510.

The glass pattern forming device 500 may include a holder 520. The holder 520 may support the mask 200 (see FIGS. 1 to 3). The holder 520 may determine the relative position of the mask 200 (see FIGS. 1 to 3) with respect to the glass 100 (see FIGS. 1 and 2).

The glass pattern forming device 500 may include a sensor unit 530. The sensor unit 530 may generate the first signal S1. The sensor unit 530 may acquire relative position (or speed) information of the holder 520 with respect to the frame 510. The first signal S1 may include relative position (or speed) information of the holder 520 with respect to the frame 510. Alternatively, the sensor unit 530 may acquire the relative position (or velocity) information of the mask 200 (see FIGS. 1 to 3) with respect to the glass 100 (see FIGS. 1 and 2). The first signal S1 may include relative position (or velocity) information of the mask 200 (see FIGS. 1 to 3) with respect to the glass 100 (see FIGS. 1 and 2).

The glass pattern forming device 500 may include a control unit 540. The control unit 540 may receive the first signal S1. The controller 540 may generate the second signal S2, the third signal S3, and the fourth signal S4 based on the first signal S1 and a preset algorithm. The output signals S2, S3, and S4 may mean at least one of the second signal S2, the third signal S3, and the fourth signal S4. The actuator signals S3 and S4 may mean at least one of the third signal S3 and the fourth signal S4.

The control unit 540 may provide the second signal S2 to the sand blast device 300. The second signal S2 may include information regarding the operation of the sand blast device 300. For example, the sand blast device 300 may start or end the operation according to the second signal S2.

The glass pattern forming device 500 may include an actuator unit 550. The actuator unit 550 may be coupled to the frame 510 or to the holder 520. Alternatively, the actuator unit 550 may be coupled to the frame 510 and the holder 520. The actuator unit 550 may change the relative position of the holder 520 with respect to the frame 510.

The actuator unit 550 may include a first actuator 551 and a second actuator 553. The movement direction of the holder 520 by the first actuator 551 relative to the frame 510 may be a first direction. The direction of movement of the holder 520 by the second actuator 553 relative to the frame 510 may be the second direction. The first direction may be different from the second direction. For example, the first direction may be a horizontal direction. For example, the second direction may be a vertical direction.

The first actuator 551 may receive the third signal S3 from the control unit 540. The third signal S3 may include information regarding the operation of the first actuator 551. The first actuator 551 may be operated according to the third signal S3.

The second actuator 553 may receive the fourth signal S4 from the control unit 540. The fourth signal S4 may include information regarding the operation of the second actuator 553. The second actuator 553 may be operated according to the fourth signal S4.

The controller 540 may communicate with an external device. The control unit 540 may include a communication module. For example, the controller 540 may include a wired communication module (eg, RS-232 method). For example, the control unit 540 may include a wireless communication module (for example, a Wi-Fi method or a Bluetooth method).

5 is a flow chart showing a glass pattern forming method (S10) according to an embodiment of the present invention. The glass pattern forming method S10 may be referred to as a “glass pattern forming process” or a “glass gradient forming method” or a “glass gradient forming process”. 5 can be described in conjunction with FIGS. 1 to 4.

Referring to FIG. 5, the glass pattern forming method (S10) may include a step (S100) of placing the mask 200 on the glass 100. This step (S100) may be referred to as a “mask installation step”. In this step (S100), the mask 200 may be disposed spaced apart from the glass 100. For example, in this step S100, the mask 200 may be spaced apart from the glass 100 by a first height h1. In this step (S100), the glass 100 is seated on the frame 510, the mask 200 may be coupled to the holder 520.

In this step S100, the control unit 540 may receive the first signal S1 from the sensor unit 530. In this step (S100), the control unit 540 may obtain the relative position information of the mask 200 with respect to the glass 100 from the first signal (S1). When the relative position of the mask 200 with respect to the glass 100 is different from predetermined position information, the control unit 540 operates the actuator unit 550 to adjust the relative position of the mask 200 with respect to the glass 100. You can.

The glass pattern forming method (S10) may include a step (S200) of spraying particles onto the glass 100. In this step (S200), the sand blasting device 300 may spray particles toward the mask 200 from the top of the mask 200. This step S200 may be referred to as an “injection step”.

In this step S200, the controller 540 may provide the second signal S2 to the sand blast device 300. When the second blast signal S2 is received, the sand blast apparatus 300 may provide the sand blow 400 to the mask 200.

In this step S200, the controller 540 may provide the third signal S3 or / and the fourth signal S4 to the actuator unit 550. The actuator unit 550 may receive the third signal S3 or / and the fourth signal S4. The actuator unit 550 may adjust the relative position of the mask 200 with respect to the glass 100 according to the third signal S3 or / and the fourth signal S4.

The step of spraying particles (S200) may include a step of etching the glass 100 (S201). This step S201 may be referred to as an “etching step” or an “etching step”. In this step (S201), the sand blasting apparatus 300 may provide the sand blow 400 to etch the glass 100.

The step of spraying particles (S200) may include the step of depositing particles (S202) on the glass 100. This step S202 may be referred to as a “deposition step”. In this step (S202), the sand blasting apparatus 300 may provide particles to deposit particles on the surface of the glass 100.

The glass pattern forming method S10 may include a step S300 of separating the mask 200 from the glass 100. This step S300 may be referred to as a “mask separation step”. In this step (S300), the mask 200 may be separated from the glass 100.

The glass pattern forming method S10 may include washing the glass 100 (S400). This step S400 may be referred to as a “washing step” or a “washing step” or a “washing step”. In this step (S400), the glass 100 may be cleaned.

6 is a flow chart showing an etching step. 6 can be described in conjunction with FIGS. 1 to 5. Referring to FIG. 6, the spraying step (S200) may include a step (S210) of initiating spraying of the sand blasting device 300. This step S210 may be referred to as a “starting step”. In this step (S210), the operation of the sand blasting device 300 may be started. In this step (S210), a sand blow 400 may be applied to the mask 200.

In this step (S210), the mask 200 may be moved horizontally and / or vertically with respect to the glass 100. For example, in this step (S210), the mask 200 may start a pendulum motion (movement) with respect to the glass 100. In this step (S210), the control unit 540 may control the actuator unit 550 to periodically move the mask 200 with respect to the glass 100.

The injection step (S200) may include a step (S220) of determining the reason for the termination. In this step (S220), the control unit 540 may determine whether the reason for the termination of the injection step (S200) has occurred. For example, the control unit 540 may obtain a signal including termination command information from the outside.

The injection step (S200) may include the step (S230) of ending the injection of the sand blasting device 300. If it is determined that the reason for the termination of the injection step (S200) has occurred, the controller 540 may perform this step (S230). In this step (S230), the control unit 540 may end the sand blasting apparatus 300 and end the operation of the actuator unit 550.

If it is not determined that the reason for the termination of the injection step S200 has occurred, the controller 540 may perform the step S220 of determining the reason for the termination. If it is not determined that the reason for the termination of the injection step S200 has occurred, the control unit 540 may continuously operate the sand blast device 300 and the actuator unit 550.

The above description of the present invention is for illustration only, and those of ordinary skill in the art to which the present invention pertains can understand that it can be easily modified into other specific forms without changing the technical spirit or essential features of the present invention. will be. Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive. For example, each component described as a single type may be implemented in a distributed manner, and similarly, components described as distributed may be implemented in a combined form.

The scope of the present invention is indicated by the following claims, and all changes or modifications derived from the meaning and scope of the claims and equivalent concepts should be interpreted to be included in the scope of the present invention.

Forms for carrying out the invention have been described together in the best mode for carrying out the invention above.

According to the glass pattern forming device and the glass pattern forming method of the present invention, particles can be sprayed by spaced apart masks at regular intervals, and a glass pattern having a gradation can be formed on the glass surface.

Claims

Disposing a mask in which a plurality of holes are formed to be spaced apart from the upper surface of the glass (S100);

Spraying particles toward the mask from the top of the mask (S200);

Separating the mask from the glass (S300); And

Comprising the step of cleaning the glass (S400),

Glass pattern forming method (S10).
According to claim 1,

In the injection step (S200),

The position of the mask relative to the glass changes periodically,

Glass pattern forming method (S10).
According to claim 2,

In the injection step (S200),

The mask,

With respect to the glass, periodically moving in the horizontal direction and the vertical direction,

Glass pattern forming method (S10).
According to claim 1,

The plurality of holes formed in the mask,

Different sizes depending on the location,

Glass pattern forming method (S10).
According to claim 1,

The plurality of holes formed in the mask,

Different water density depending on the location,

Glass pattern forming method (S10).
According to claim 1,

The injection step (S200),

Including the step (S201) of etching the glass by spraying particles toward the mask from the top of the mask,

Glass pattern forming method (S10).
According to claim 1,

The injection step (S200),

Including the step (S202) of depositing the particles on the glass by spraying particles from the top of the mask toward the mask,

Glass pattern forming method (S10).