WO2019214255A1

WO2019214255A1 - Method for detecting position of sensor crystal in vapor deposition device, vapor deposition method, and related device

Info

Publication number: WO2019214255A1
Application number: PCT/CN2018/124441
Authority: WO
Inventors: 白玉庭; 张超
Original assignee: 京东方科技集团股份有限公司; 鄂尔多斯市源盛光电有限责任公司
Priority date: 2018-05-10
Filing date: 2018-12-27
Publication date: 2019-11-14
Also published as: CN108893722B; CN108893722A

Abstract

A device for detecting the position of a sensor crystal (200) in a vapor deposition device, comprising: at least two metal electrode plates (100), the metal electrode plates (100) being non-parallel, and each metal electrode plate (100) separately forming a capacitor (C, C1, C2, C3, C4) with the sensor crystal (200) positioned in the center of a detection aperture (A); sensors (S), the sensors (S) corresponding one-to-one with the capacitors (C, C1, C2, C3, C4), and being separately connected to the sensor crystal (200) and the metal electrode plates (100) of the capacitors (C, C1, C2, C3, C4) by means of wires (300); a processor, the processor being connected to the sensors (S) and used to determine, on the basis of the capacitance value of the capacitors (C, C1, C2, C3, C4) detected by the sensors (S), whether the position of the sensor crystal (200) relative to the center of the detection aperture (A) is abnormal. When it is determined that such an abnormality has occurred, the abnormal sensor crystal (200) is replaced. Further disclosed are a method employing the device to detect the position of a sensor crystal (200) in a vapor deposition device, a vapor deposition device, and a vapor deposition method.

Description

Method for detecting position of crystal oscillator in vapor deposition equipment, vapor deposition method and related device

This application claims priority to the Chinese Patent Application filed on May 10, 2018, the Chinese Patent Office, Application No. 201810442144.0, entitled "Detection Method of Crystal Oxygen Sheet Position in Evaporation Equipment, Evaporation Method and Related Devices", The entire content of this application is incorporated herein by reference.

Technical field

The present disclosure relates to the field of display technologies, and in particular, to a method for detecting a position of a crystal oscillator in an evaporation device, an evaporation method, and related devices.

Background technique

In the production line of Organic Light-Emitting Diode (OLED), the crystal oscillator in the evaporation equipment is used to monitor the evaporation rate in real time, so as to ensure the film thickness of each organic layer is controlled within the error range (Spec) Inside. During the working of the crystal oscillator, the crystal oscillator itself vibrates or the motor rotates abnormally, which causes the crystal oscillator to deviate from the center of the detection hole, causing abnormal fluctuation of the vapor deposition rate, which not only affects the production capacity, but also reduces the yield of the product in severe cases.

Summary of the invention

The apparatus for detecting the position of a crystal oscillator in an evaporation apparatus provided by the embodiment of the present disclosure includes:

At least two metal electrode plates, each of the metal electrode plates are not parallel to each other, and each of the metal electrode plates forms a capacitor with a crystal oscillator plate located at a center of the detecting hole;

a sensor, each of the sensors is in one-to-one correspondence with each of the capacitors, and the sensors are respectively connected to a crystal plate and a metal electrode plate forming the capacitor through wires;

a processor, the processor being connected to each of the sensors, configured to determine, according to a capacitance value of the capacitor detected by the sensor, whether an abnormality occurs in a position of the crystal oscillator relative to a center of the detecting hole; When an abnormality occurs, the abnormal crystal piece is replaced.

Optionally, in the embodiment of the present disclosure, four identical metal electrode plates are respectively located around the crystal oscillation plate, and four capacitors are formed with the crystal oscillation plate.

Optionally, in an embodiment of the present disclosure, the wire is connected to a center of the crystal piece.

Optionally, in the embodiment of the present disclosure, the processor is specifically configured to detect an initial capacitance value of each of the capacitors, and determine a capacitance value of the capacitor that is detected by the sensor and the initial capacitance value. Whether the difference between the difference is out of the set range; if so, determining that the position of the crystal piece relative to the center of the detecting hole is abnormal; if not, determining that the position of the crystal piece relative to the center of the detecting hole is normal .

Optionally, in the embodiment of the present disclosure, the processor is specifically configured to determine whether a difference between the capacitance values of the two metal electrode plates that are opposite in position and the capacitor formed by the crystal oscillator plate exceeds a set range; If yes, it is determined that the position of the crystal piece relative to the center of the detecting hole is abnormal; if not, the position of the crystal piece with respect to the center of the detecting hole is determined to be normal.

Correspondingly, a method for detecting a position of a crystal oscillator in an evaporation device according to an embodiment of the present disclosure, wherein the detecting method is implemented by using the detecting device, includes:

During the operation of the crystal oscillator, the capacitance values of the capacitors formed by the metal electrode plates and the crystal oscillator pieces are detected in real time;

Determining, according to the detected capacitance value of the capacitor, whether the position of the crystal oscillator relative to the center of the detecting hole is abnormal;

When it is determined that an abnormality has occurred, the abnormal crystal piece is replaced.

Optionally, in the embodiment of the present disclosure, the real-time detecting the capacitance value of the capacitor formed by the metal electrode plate and the crystal oscillator piece respectively includes:

A capacitance value of the capacitor is detected by a sensor connected to each of the capacitors.

Optionally, in the embodiment of the present disclosure, before detecting the capacitance value of the capacitor formed by the metal electrode plate and the crystal oscillator piece in real time, the method further includes: detecting an initial capacitance value of each of the capacitors;

Determining, according to the detected capacitance value of the capacitor, whether the position of the crystal oscillator relative to the center of the detecting hole is abnormal, specifically:

Determining whether the difference between the capacitance value of the capacitor detected this time and the initial capacitance value exceeds a set range;

If yes, determining that the position of the crystal piece relative to the center of the detecting hole is abnormal;

If not, it is determined that the position of the crystal piece relative to the center of the detecting hole is normal.

Optionally, in the embodiment of the present disclosure, four identical metal electrode plates are respectively located around the crystal oscillation plate, and four capacitors are formed with the crystal oscillation plate;

Determining whether a difference between the capacitance values of the two metal electrode plates opposite to each other and the capacitor formed by the crystal oscillation plate exceeds a set range;

Correspondingly, an embodiment of the present disclosure provides an evaporation apparatus including the above detection apparatus.

Correspondingly, an evaporation method provided by an embodiment of the present disclosure includes:

In the process of material evaporation, the above-described method of detecting the position of the crystal plate is employed.

DRAWINGS

1 is a schematic structural view of a device for detecting a position of a crystal oscillator in an evaporation device according to an embodiment of the present disclosure;

2 is another schematic structural diagram of a device for detecting a position of a crystal oscillator in an evaporation device according to an embodiment of the present disclosure;

3 is a schematic structural diagram of a crystal oscillator in an evaporation device according to an embodiment of the present disclosure;

4 is a flow chart of a method for detecting a position of a crystal oscillator in an evaporation device according to an embodiment of the present disclosure.

detailed description

The present disclosure will be further described in detail with reference to the accompanying drawings, in which FIG. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present disclosure without departing from the inventive scope are the scope of the disclosure.

The shapes and sizes of the various components in the drawings do not reflect true proportions, and are merely intended to illustrate the present disclosure.

The apparatus for detecting the position of the crystal oscillator in the vapor deposition apparatus provided by the embodiment of the present disclosure, as shown in FIG. 1 and FIG. 2, specifically includes:

At least two metal electrode plates 100, each of the metal electrode plates are not parallel to each other, and each of the metal electrode plates 100 forms a capacitor C (1, 2, 3 or 4) with the crystal piece 200 located at the center of the detecting hole A;

a sensor S, each sensor S is in one-to-one correspondence with each capacitor C, and the sensor S is respectively connected to the crystal plate 200 and the metal electrode plate 100 forming the capacitor C (1, 2, 3 or 4) through the wire 300;

a processor (not shown) connected to each sensor S for determining the crystal plate 200 relative to the detection hole A based on the capacitance value of the capacitor C (1, 2, 3 or 4) detected by the sensor S Whether the position of the center is abnormal; when it is determined that an abnormality has occurred, the abnormal crystal piece 200 is replaced.

Specifically, in the detecting device for the position of the crystal oscillator in the vapor deposition device provided by the embodiment of the present disclosure, at least two metal electrode plates that are not parallel to each other are disposed, and each of the metal electrode plates and the crystal plate at the center of the detecting hole are respectively The capacitor is formed, so that the positional information of the crystal oscillator piece can be monitored in real time by detecting the capacitance value of the capacitor formed by the crystal oscillator plate and the metal electrode plate, so that the crystal oscillator piece with abnormal position can be replaced in time to avoid steaming due to the deviation of the crystal oscillator piece from the center of the detection hole. Abnormal fluctuations in plating rate can increase productivity and product yield.

In a specific implementation, each metal electrode plate may be located in the same plane or in different planes, and the metal electrode plate may be in the same plane as the crystal oscillator piece, or may be slightly deviated from the plane of the crystal oscillator piece, as long as the metal electrode plate It is only necessary to form a capacitor with the crystal piece, and the specific position of each metal plate is not limited here.

Specifically, as shown in FIG. 1 and FIG. 2, the metal electrode plate 100 and the sensor S are in one-to-one correspondence. One end of one wire 300 may be fixedly connected to each metal electrode plate 100, and the other end of the wire 300 is connected to a sensor S. The crystal oscillator 200 generally consists of a plurality of laminated film layers. As shown in FIG. 3, the gold-plated (silver) electrode 01, the first chromium adhesive layer 02, the quartz crystal 03, and the second chromium are sequentially arranged from top to bottom. Adhesive layer 04 and gold-plated (silver) pattern electrode 05. It can be seen that the gold-plated (silver) electrode 01 and the gold-plated (silver) pattern electrode 05 are both conductive electrodes, and therefore, one end of the wire 300 can be connected to one of them, and the other end of the wire 300 is connected to the sensor S.

Optionally, in the above detection device provided by the embodiment of the present disclosure, as shown in FIG. 1 , four identical metal electrode plates 100 may be respectively disposed around the crystal oscillation plate 200 and form four capacitors C with the crystal oscillation plate 200 . (1, 2, 3 or 4). For example, four identical metal electrode plates 100 can be divided into two groups, each group comprising two metal electrode plates 100 parallel to each other. As shown in FIG. 1, the two groups are respectively placed in four directions of front, rear, left and right, in the x direction. The crystal oscillation plate 200 forms two capacitors C1 and C2, and two capacitors C3 and C4 are formed in the y direction, and the x direction and the y direction are perpendicular to each other. By forming the four capacitors C formed in the x direction and the y direction, it is possible to detect the positional abnormality of the crystal oscillation piece 200 in the x direction and the y direction with respect to the center of the detection hole A, that is, an abnormality occurs in any one of the directions in either direction. That is, it is confirmed that the position of the crystal oscillation piece 200 is abnormal and needs to be replaced in time.

Moreover, the position of each set of the metal electrode plate 100 and the crystal oscillation piece 200 can be adjusted to form a capacitor C (1, 2, 3 or 4) having the same capacitance value, so as to facilitate the capacitor C according to the detection in the subsequent steps. The capacitance value of 2, 3 or 4) can quickly and accurately determine whether the position of the crystal oscillator 200 is abnormal and make a quick response.

Alternatively, in the above detecting apparatus provided by the embodiment of the present disclosure, as shown in FIG. 2, two mutually non-parallel metal electrode plates 100 are used to form a capacitor with the crystal piece 200 located at the center of the detecting hole A; for example; Capacitors C1 and C3 may be formed respectively with the crystal plate 200 in the x direction and the y direction by using two mutually non-parallel metal electrode plates 100, and the x direction and the y direction may be perpendicular to each other or may not be perpendicular, as long as the x direction and the y direction. Not parallel. The displacement of the crystal oscillation plate 200 in these two directions can be monitored by the capacitors C1 and C2 formed in two different directions, and it is judged whether or not the position thereof is abnormally required to be replaced. Of course, a plurality of capacitors C1, C2, ... can be formed by using more than two metal electrode plates 100 and the crystal oscillator 200, thereby monitoring the displacement of the crystal oscillator 200 in a plurality of directions, which is not limited herein.

Optionally, in the above detecting apparatus provided by the embodiment of the present disclosure, as shown in FIGS. 1 and 2, the wire 300 may be connected to the center of the crystal oscillator 200. As shown in FIG. 3, it can be seen that the crystal oscillator 200 is generally circular, so that as shown in FIGS. 1 and 2, the wire 300 can be connected to the center of the crystal plate 200 so as to be formed with each of the metal electrode plates 100. Capacitors with the same capacitance value.

Optionally, the foregoing detecting apparatus provided by the embodiment of the present disclosure further includes a processor, which may be specifically configured to detect an initial capacitance value of each capacitor C (1, 2, 3, or 4); and determine that the sensor S is detected this time. Whether the difference between the capacitance value of the capacitor C (1, 2, 3 or 4) and the initial capacitance value exceeds the set range; if so, it is determined that the position of the crystal oscillation piece 200 with respect to the center of the detection hole A is abnormal; Then, it is determined that the position of the crystal oscillation piece 200 with respect to the center of the detection hole A is normal.

Specifically, by calculating the difference between the detected capacitance values and the corresponding initial capacitance values in real time, and comparing with the preset range, and determining at least any difference exceeds the preset range, the position of the crystal oscillator is considered to occur. Abnormally, the position of the crystal oscillator can be quickly detected and feedback can be made by the above method.

Optionally, in the above detecting apparatus provided by the embodiment of the present disclosure, four identical metal electrode plates 100 are respectively placed around the crystal oscillation plate 200, and four capacitors C (1, 2, 3 or 4 are formed with the crystal oscillation plate). When the processor is specifically used to determine whether the difference between the capacitance values of the capacitors C (1, 2, 3 or 4) formed by the two metal electrode plates 100 and the crystal oscillation plate 200 in the opposite position exceeds the set range If so, it is determined that the position of the crystal oscillation piece 200 with respect to the center of the detection hole A is abnormal; if not, it is determined that the position of the crystal oscillation piece 200 with respect to the center of the detection hole A is normal.

Specifically, the difference between the capacitance values of the capacitors formed by the two metal electrode plates and the crystal oscillator plates is compared with the preset range, and at least any difference is determined to exceed the preset range, and the crystal oscillator is considered to be An abnormality occurs in the position. In the above manner, the position of the crystal oscillator can be quickly detected and feedback can be made.

Based on the same inventive concept, an embodiment of the present disclosure further provides a method for detecting a position of a crystal oscillator in an evaporation device, which is implemented by using the above detection device, and the principle of solving the problem by the detection method is the same as in the foregoing evaporation device. The detecting device of the position of the crystal oscillator is similar, so the implementation of the detecting method can be referred to the implementation of the detecting device, and the repeated description will not be repeated.

Specifically, the method for detecting the position of the crystal oscillator in the vapor deposition apparatus provided by the embodiment of the present disclosure, as shown in FIG. 4, may include the following steps:

When the crystal oscillator is working, detecting the capacitance value of the capacitor formed by the metal electrode plate and the crystal oscillator sheet in real time;

According to the detected capacitance value of the capacitor, it is determined whether an abnormality occurs in the position of the crystal oscillation plate with respect to the center of the detection hole; when it is determined that an abnormality occurs, the abnormal crystal oscillation piece is replaced.

Specifically, in the method for detecting the position of the crystal oscillator in the vapor deposition apparatus provided by the embodiment of the present disclosure, by detecting the capacitance value of the capacitor formed by the crystal oscillator and the metal electrode plate, the position information of the crystal oscillator can be monitored in real time, thereby The crystal plate with abnormal position is replaced in time to avoid abnormal fluctuation of the evaporation rate due to the deviation of the crystal plate from the center of the detection hole, which can improve the productivity and product yield.

In the production process of the organic electroluminescent display panel, the crystal oscillator piece can be placed in the evaporation chamber of the vapor deposition apparatus, and during the evaporation process, the surface of the crystal oscillator sheet is vapor-deposited with a layer of vapor deposition material, along with the crystal oscillator. The thickness of the vapor deposition material on the surface of the sheet increases, and the vibration frequency of the crystal oscillator sheet gradually decreases. By monitoring the vibration frequency of the crystal oscillator sheet, the thickness of the vapor deposition material on the surface of the crystal oscillator sheet can be indirectly obtained, thereby obtaining an organic electroluminescence display panel. The rate of evaporation.

Specifically, in the above detection method provided by the embodiment of the present disclosure, a plurality of crystal oscillator pieces are generally disposed in the vapor deposition apparatus, and only one crystal oscillator piece is located at the center of the detection hole in the vapor deposition process, and the crystal oscillator located at the center of the detection hole As a working crystal oscillator, the positional relationship with the center of the detecting hole affects the vapor deposition rate of the detection, and other crystal oscillators serve as the spare crystal oscillator. Therefore, after each replacement of the crystal piece for opening the cavity, or after replacing the crystal piece located at the center of the detecting hole before vapor deposition or evaporation, the position between the crystal piece located at the center of the detecting hole and the center of the detecting hole is generally checked. Whether the relationship is acceptable, that is, whether the crystal oscillator is located at the center of the detecting hole before the operation of the crystal oscillator, and after determining the initial position of the crystal oscillator, the above-mentioned detecting method provided by the embodiment of the present disclosure may be performed.

In a specific implementation, at least two non-parallel metal electrode plates are used to form a capacitor with the crystal oscillator plate located at the center of the detecting hole, which can be implemented in the following manner:

Four identical metal electrode plates are respectively placed around the crystal plate to form four capacitors with the crystal plate.

Specifically, as shown in FIG. 1, the above four identical metal electrodes can be uniformly placed around the crystal oscillator piece. For example, four identical metal electrode plates 100 can be divided into two groups, each group including two parallel to each other. The metal electrode plate 100 is respectively placed in four directions of front, rear, left and right, two capacitors C1 and C2 are formed in the x direction with the crystal oscillation piece 200, and two capacitors C3 and C4 are formed in the y direction, and the x direction and the y direction are perpendicular to each other. . By the four capacitors C formed in the x direction and the y direction, it is possible to detect a positional abnormality in the x direction and the y direction with respect to the center of the detection hole A, that is, an abnormality in a position in either direction in both directions, That is, it is confirmed that the position of the crystal oscillation piece 200 is abnormal and needs to be replaced in time.

Moreover, the position of each set of the metal electrode plate 100 and the crystal oscillation piece 200 can be adjusted to form a capacitor C having the same capacitance value. For example, the metal electrode plate 100 on the left side and the metal electrode plate 100 on the right side can be adjusted in FIG. The position of the crystal oscillation piece 200 at the center of the detection hole is located at the middle of the metal electrode plate 100. If the crystal oscillation piece 200 is located at the center of the detection hole, the capacitance values of the capacitor C1 and the capacitor C2 should be equal in principle, and thus, The difference between the capacitance value C1 and the capacitance value C2 is determined to determine whether the crystal oscillation piece 200 deviates from the center of the detection hole, so that the position of the crystal oscillation piece 200 can be quickly and accurately determined according to the detected capacitance value of the capacitor C in the subsequent step. An exception occurs and a quick response is made.

Alternatively, optionally, using at least two non-parallel metal electrode plates to form a capacitor with the crystal plate located at the center of the detecting hole may also be implemented in the following manner:

Two mutually non-parallel metal electrode plates are used to form a capacitor with a crystal piece located at the center of the detecting hole; for example, as shown in FIG. 2, two mutually non-parallel metal electrode plates 100 may be used in the x direction and the y direction with the crystal oscillator. The sheets 200 form capacitors C1 and C3, respectively, and the x direction and the y direction may or may not be perpendicular to each other as long as the x direction and the y direction are not parallel. The displacement of the crystal oscillation plate 200 in these two directions can be monitored by the capacitors C1 and C3 formed in two different directions, thereby judging whether the crystal oscillation piece 200 deviates from the center of the detection hole, and judging whether its position is abnormal or not needs to be replaced. Of course, a plurality of capacitors C may be formed by using more than two metal electrode plates 100 and the crystal oscillator 200 to monitor the displacement of the crystal oscillator 200 in multiple directions, which is not limited herein.

Optionally, in the foregoing detection method provided by the embodiment of the present disclosure, the capacitance value of the capacitor formed by the real-time detecting metal electrode plate and the crystal oscillator piece may be specifically implemented in the following manner:

The capacitance of the capacitor is detected by a sensor connected to each capacitor.

Specifically, as shown in FIG. 1 and FIG. 2, the metal electrode plate 100 and the sensor S are in one-to-one correspondence. One end of one wire 300 may be fixedly connected to each metal electrode plate 100, and the other end of the wire 300 is connected to a sensor S. The crystal oscillator 200 generally consists of a plurality of laminated film layers. As shown in FIG. 3, the gold-plated (silver) electrode 01, the first chromium adhesive layer 02, the quartz crystal 03, and the second chromium are sequentially arranged from top to bottom. Adhesive layer 04 and gold-plated (silver) pattern electrode 05. It can be seen that the gold-plated (silver) electrode 01 and the gold-plated (silver) pattern electrode 05 are both conductive electrodes, and therefore, one end of the wire 300 can be connected to one of them, and the other end of the wire 300 is connected to the sensor S. The sensor S may be an instrument capable of measuring a capacitance value, such as a capacitive sensor or a multimeter, and is not limited herein.

Optionally, in the above detection method provided by the embodiment of the present disclosure, a wire may be connected to the center of the crystal oscillator. As shown in FIG. 3, it can be seen that the crystal oscillator 200 is generally circular, so that as shown in FIGS. 1 and 2, the wire 300 can be connected to the center of the crystal plate 200 so as to be formed with each of the metal electrode plates 100. Capacitors with the same capacitance value. In addition, the crystal oscillator 200 may have other shapes, which are not limited herein.

Optionally, in the foregoing detecting method provided by the embodiment of the present disclosure, determining whether an abnormality occurs in a position of the crystal oscillator piece relative to the center of the detecting hole according to the detected capacitance value of the capacitor may be performed according to a capacitance value of the capacitor in various manners. Determine if the position of the crystal oscillator is abnormal.

For example, the capacitance value of the detected capacitor can be compared with the initial capacitance value to determine whether the position of the crystal oscillation plate is abnormal. Specifically, before the real-time detection of the capacitance value of the capacitor formed by the metal electrode plate and the crystal oscillation plate, The method may further include: detecting an initial capacitance value of each capacitor; that is, when the position of the crystal oscillation plate is not abnormal, the capacitance value of each capacitor is recorded as an initial capacitance value.

Correspondingly, determining whether the position of the crystal oscillator relative to the center of the detecting hole is abnormal according to the capacitance value of the detected capacitor may specifically include:

If yes, it is determined that the position of the crystal oscillator piece relative to the center of the detecting hole is abnormal;

Taking the structure shown in FIG. 2 as an example, the crystal oscillation piece 200 is placed at the center of the detection hole, and a metal electrode plate 100 is placed on the left side of the crystal oscillation plate 200 to constitute a capacitor C1, and a rear side of the crystal oscillation piece 200 is placed. The metal electrode plate 100 is configured to constitute a capacitor C3. The metal electrode plate 100 and the crystal oscillation plate 200 constituting each capacitor are respectively connected to the corresponding sensor S through the wire 300, and the initial capacitance values of the capacitor C1 and the capacitor C2 are respectively detected before the crystal oscillation piece 200 operates. When the crystal oscillator 200 operates, the capacitance values of the capacitor C1 and the capacitor C2 are detected in real time, and the difference between the capacitance values of the capacitor C1 and the capacitor C2 and the corresponding initial capacitance value is monitored, if one capacitor exists in the capacitor C1 and the capacitor C2 If the difference between the capacitance value and the initial capacitance value exceeds the set range, it is determined that the position of the crystal oscillation piece 200 with respect to the center of the detection hole is abnormal, so that the crystal oscillation piece can be replaced in time. In a specific implementation, the specific value of the set range may be determined according to the capacitance value of the capacitor formed by the metal electrode plate 100 and the crystal oscillator 200, and the deviation of the allowable capacitance value, for example, the capacitance value is approximately 100 μF, and the allowable capacitance value is If the deviation occurs in the range of 0 to 5%, the setting range can be set to 0 to 5 μF. This is only an example, and the capacitance value and setting range are not limited.

Alternatively, in the above detection method provided by the embodiment of the present disclosure, when four identical metal electrode plates are respectively placed around the crystal oscillation plate and four capacitors are formed with the crystal oscillation plate, correspondingly, the above detection is performed. The capacitance value of the capacitor to be determined to determine whether the position of the crystal oscillator relative to the center of the detecting hole is abnormal may specifically include:

Taking the structure shown in FIG. 1 as an example, the crystal oscillation piece 200 is placed at the center of the detection hole, and a metal electrode plate 100 is placed around the crystal oscillation piece 200. For example, the metal electrode plate 100 can be placed before and after the crystal oscillation plate 200. Four directions left and right. The metal electrode plate 100 and the crystal oscillation plate 200 constituting each capacitor are respectively connected to the corresponding sensor S through the wire 300, and the capacitance values of the respective capacitors (C1, C2, C3, and C4) are detected in real time during the operation of the crystal oscillation plate 200, and monitored. The difference between the capacitance value between the capacitor C1 and the capacitor C2, and the difference between the capacitance value between the capacitor C3 and the capacitor C4, if the difference between the capacitance values between the capacitor C1 and the capacitor C2 exceeds the set range, or If the difference between the capacitance value between the capacitor C3 and the capacitor C4 exceeds the set range, or both of them exceed the set range, it can be determined that the position of the crystal oscillation piece 200 relative to the center of the detection hole is abnormal, so that the crystal oscillation piece can be replaced in time. . Similar to the structure shown in FIG. 2, in a specific implementation, the specific value of the set range may be determined according to the magnitude of the capacitance value of the capacitor formed by the metal electrode plate 100 and the crystal oscillation plate 200, and the deviation of the allowable capacitance value. The specific values of the capacitance value and the setting range are not limited.

Based on the same inventive concept, an embodiment of the present disclosure further provides an evaporation apparatus, including the above detection apparatus provided by the embodiment of the present disclosure. Since the principle of solving the problem of the vapor deposition device is similar to the detection device for the position of the crystal oscillator in the vapor deposition device, the implementation of the vapor deposition device can be referred to the implementation of the detection device, and the repeated description is omitted.

Based on the same inventive concept, an embodiment of the present disclosure further provides an evaporation method, including: in the process of performing material evaporation, the method for detecting the position of the crystal oscillator provided by the embodiment of the present disclosure. Since the principle of solving the problem by the vapor deposition method is similar to the method for detecting the position of the crystal oscillator in the vapor deposition apparatus, the implementation of the vapor deposition method can be referred to the implementation of the detection method, and the repeated description will not be repeated.

The method for detecting the position of the crystal oscillator in the vapor deposition apparatus provided by the embodiment of the present disclosure, the vapor deposition method and the related device employ at least two metal electrode plates which are not parallel to each other, and form a capacitor with the crystal plate located at the center of the detection hole; When the chip is working, the capacitance value of the capacitor is detected in real time; according to the detected capacitance value of the capacitor, whether the position of the crystal oscillator piece relative to the center of the detecting hole is abnormal is determined; when it is determined that an abnormality occurs, the abnormal crystal piece is replaced. In the process of material evaporation, by detecting the capacitance value of the capacitor formed by the crystal oscillator and the metal electrode plate, the position information of the crystal oscillator piece can be monitored in real time, so that the crystal oscillator piece with abnormal position can be replaced in time to avoid the deviation detection of the crystal oscillator piece. The center of the hole causes abnormal fluctuations in the vapor deposition rate, which can increase productivity and product yield.

While the preferred embodiment of the present disclosure has been described, it will be apparent that those skilled in the art can make further changes and modifications to the embodiments. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and the modifications

It is apparent that those skilled in the art can make various modifications and variations to the embodiments of the present disclosure without departing from the spirit and scope of the embodiments of the present disclosure. Thus, the present disclosure is intended to cover such modifications and variations as the modifications and variations of the embodiments of the present disclosure.

Claims

A device for detecting the position of a crystal oscillator in an evaporation device, which comprises:

At least two metal electrode plates, each of the metal electrode plates are not parallel to each other, and each of the metal electrode plates forms a capacitor with a crystal oscillator plate located at a center of the detecting hole;

a sensor, each of the sensors is in one-to-one correspondence with each of the capacitors, and the sensors are respectively connected to a crystal plate and a metal electrode plate forming the capacitor through wires;

a processor, the processor being connected to each of the sensors, configured to determine, according to a capacitance value of the capacitor detected by the sensor, whether an abnormality occurs in a position of the crystal oscillator relative to a center of the detecting hole; When an abnormality occurs, the abnormal crystal piece is replaced.
The detecting device according to claim 1, wherein four identical metal electrode plates are respectively located around the crystal oscillation plate, and four capacitors are formed with the crystal oscillation plate.
The detecting device according to claim 2, wherein the wire is connected to a center of the crystal piece.
The detecting device according to any one of claims 1 to 3, wherein the processor is specifically configured to detect an initial capacitance value of each of the capacitors, and determine a capacitance value of the capacitor that the sensor detects this time. Whether the difference between the initial capacitance value and the initial capacitance value exceeds a set range; if yes, determining that the position of the crystal oscillation plate relative to the center of the detection hole is abnormal; if not, determining the crystal oscillation piece relative to the The position of the center of the detection hole is normal.
The detecting device according to claim 2, wherein the processor is specifically configured to determine whether a difference between capacitance values of the two metal electrode plates and the capacitors formed by the crystal plate are out of a set range If yes, it is determined that the position of the crystal piece relative to the center of the detecting hole is abnormal; if not, the position of the crystal piece with respect to the center of the detecting hole is determined to be normal.
A method for detecting a position of a crystal oscillator in an evaporation apparatus, wherein the detection method is implemented by the detecting apparatus according to any one of claims 1 to 5, comprising:

During the operation of the crystal oscillator, the capacitance values of the capacitors formed by the metal electrode plates and the crystal oscillator pieces are detected in real time;

Determining, according to the detected capacitance value of the capacitor, whether the position of the crystal oscillator relative to the center of the detecting hole is abnormal;

When it is determined that an abnormality has occurred, the abnormal crystal piece is replaced.
The detecting method according to claim 6, wherein the real-time detecting the capacitance value of the capacitor formed by the metal electrode plate and the crystal oscillator respectively comprises:

A capacitance value of the capacitor is detected by a sensor connected to each of the capacitors.
The detecting method according to claim 6 or 7, wherein before detecting the capacitance values of the capacitors formed by the metal electrode plates and the crystal oscillator pieces in real time, the method further comprises: detecting an initial capacitance value of each of the capacitors;

Determining, according to the detected capacitance value of the capacitor, whether the position of the crystal oscillator relative to the center of the detecting hole is abnormal, specifically:

Determining whether the difference between the capacitance value of the capacitor detected this time and the initial capacitance value exceeds a set range;

If yes, determining that the position of the crystal piece relative to the center of the detecting hole is abnormal;

If not, it is determined that the position of the crystal piece relative to the center of the detecting hole is normal.
The detecting method according to claim 6, wherein four identical metal electrode plates are respectively located around the crystal oscillation plate, and four capacitors are formed with the crystal oscillation plate;

Determining, according to the detected capacitance value of the capacitor, whether the position of the crystal oscillator relative to the center of the detecting hole is abnormal, specifically:

Determining whether a difference between the capacitance values of the two metal electrode plates opposite to each other and the capacitor formed by the crystal oscillation plate exceeds a set range;

If yes, determining that the position of the crystal piece relative to the center of the detecting hole is abnormal;

If not, it is determined that the position of the crystal piece relative to the center of the detecting hole is normal.
An evaporation apparatus comprising the detecting device according to any one of claims 1 to 5.
An evaporation method, comprising:

In the process of performing material evaporation, the method for detecting the position of the crystal oscillator according to any one of claims 6 to 9 is employed.