WO2019138723A1 - Display device and method for manufacturing display device - Google Patents

Display device and method for manufacturing display device Download PDF

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Publication number
WO2019138723A1
WO2019138723A1 PCT/JP2018/044125 JP2018044125W WO2019138723A1 WO 2019138723 A1 WO2019138723 A1 WO 2019138723A1 JP 2018044125 W JP2018044125 W JP 2018044125W WO 2019138723 A1 WO2019138723 A1 WO 2019138723A1
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Prior art keywords
substrate
display device
identification unit
identifier
area
Prior art date
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PCT/JP2018/044125
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French (fr)
Japanese (ja)
Inventor
直久 安藤
Original Assignee
株式会社ジャパンディスプレイ
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Publication date
Application filed by 株式会社ジャパンディスプレイ filed Critical 株式会社ジャパンディスプレイ
Publication of WO2019138723A1 publication Critical patent/WO2019138723A1/en

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    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/871Self-supporting sealing arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/871Self-supporting sealing arrangements
    • H10K59/8722Peripheral sealing arrangements, e.g. adhesives, sealants

Definitions

  • the present invention relates to a display device and a method of manufacturing the display device.
  • a light emitting element is provided in each pixel, and an image is displayed by individually controlling light emission.
  • an organic EL element is provided in each pixel, and the organic EL element is a layer including an organic EL material between a pair of electrodes consisting of an anode electrode and a cathode electrode. It has a structure (hereinafter, referred to as "organic EL layer").
  • organic EL layer an organic EL display device
  • an anode electrode is provided as an individual pixel electrode for each pixel
  • a cathode electrode is provided as a common pixel electrode to which a common potential is applied across a plurality of pixels.
  • the organic EL display device controls the light emission of the pixel by applying the potential of the pixel electrode to each pixel with respect to the potential of the common pixel electrode.
  • Patent Document 1 discloses a semiconductor wafer, in particular, an alignment mark used after a wiring process.
  • the display panel When cutting a large panel for multiple chamfering into pieces, for example, after temporarily cutting and individualizing the large panel for multiple chamfering around the adjacent display panel, the display panel is obtained by cutting the outer periphery of each display panel You may cut out. Alternatively, the display panels may be cut out one by one by directly cutting the outer periphery of each display panel. Alternatively, display panels arranged in a matrix may be cut out together. In any case, it is necessary to select a laser beam according to the characteristics of each material constituting the multi-faceted large panel. For this reason, the same location may need to be subjected to multiple laser irradiations.
  • the first laser irradiation may cause damage in the vicinity of the cutting region and the alignment mark may disappear.
  • An object of the present invention is to suppress a decrease in position detection accuracy even when a part of an alignment mark can not be visually recognized when cutting a large panel for multiple chamfering into pieces.
  • a method of manufacturing a display device in which a plurality of display devices including a display region, a peripheral region, and a boundary region are formed on a first substrate for multiple chamfers.
  • a first identification unit forming a pixel and disposed in the boundary region located at the boundary of the display device; and a second identification unit disposed in the peripheral region located between the display region and the boundary region , And the second substrate for multiple chamfers is formed on the first substrate for multiple chamfers across the plurality of display devices; Aligning the position of the laser and the first substrate for multiple chamfering using the identification unit, cutting the second substrate for multiple chamfering in the boundary area, and using the second identification unit, the laser and the first multiple chamfering substrate Aligning the substrate, the chamfering at the boundary area Cutting the first substrate, and cutting the second substrate for multi-chamfering comprises carbonizing at least a portion of the first substrate for multi-chamfering. Ru.
  • a display area in which a plurality of pixels are arranged, a boundary area located at a boundary of a display device, and a peripheral area located between the display area and the boundary area.
  • An identifier including one substrate, a first identification unit disposed in the boundary region, and a second identification unit disposed in the peripheral region, the display region, the peripheral region, and the boundary region And a second substrate, wherein at least a part of the first substrate in the boundary area is carbonized.
  • the plurality of films when a plurality of films are formed by performing etching or light irradiation on a certain film, the plurality of films may have different functions or roles. However, the plurality of films are derived from the film formed as the same layer in the same step, and have the same layer structure and the same material. Therefore, these multiple films are defined as existing in the same layer.
  • the expression “a certain structure is exposed from another structure” means an aspect in which a part of a certain structure is not covered by another structure.
  • the part which is not covered also includes the aspect covered by another structure.
  • FIG. 1 is a perspective view showing a schematic configuration of a display device 100 according to the present embodiment.
  • FIG. 2 is a plan view showing a schematic configuration of the display device 100 according to the present embodiment.
  • a display area 106 is provided on the first substrate 102.
  • the display area 106 is configured by arranging a plurality of pixels 108 in a matrix.
  • a second substrate 104 is provided on the top surface of the display area 106 as a sealing material.
  • the second substrate 104 entirely covers the display area 106 and covers the boundary area 130 located at the boundary of the display device 100 and the peripheral area 140 located between the display area 106 and the boundary area 130.
  • the second substrate 104 is fixed by an adhesive layer 110 that bonds the first substrate 102 and the second substrate 104.
  • the display area 106 formed in the first substrate 102 is sealed by the second substrate 104 which is a sealing material so as not to be exposed to the air. Deterioration of the light emitting element provided in the pixel is suppressed by such a sealing structure.
  • a sealing material disposed to surround the display area 106 It may be fixed by the like.
  • a terminal region 114 is provided at one end of the first substrate 102.
  • the terminal area 114 is disposed in the peripheral area 140 outside the display area 106. Furthermore, the terminal region 114 is disposed outside the second substrate 104.
  • the second substrate 104 is formed on substantially the entire surface of the first substrate 102 so as to cover the terminal region 114 as described later, and then the portion overlapping the terminal region 114 is removed. However, the present invention is not limited to this, and the second substrate 104 may be formed so as not to cover the terminal area 114.
  • the terminal area 114 is constituted by a plurality of connection terminals 116.
  • the connection terminal 116 forms a contact point with a wiring substrate which connects the display device 100 with a device that outputs a video signal, a power supply, or the like. Therefore, the connection terminal 116 is exposed to the outside.
  • the first substrate 102 is provided with a first drive circuit 111 and a second drive circuit 112 for outputting a video signal input from the terminal area 114 to the display area 106.
  • the first drive circuit 111 and the second drive circuit 112 are disposed in the peripheral area 140 outside the display area 106.
  • the first drive circuit 111 is disposed inside the second substrate 104
  • the second drive circuit 112 is disposed outside the second substrate 104.
  • the second substrate 104 is formed on substantially the entire surface of the first substrate 102 so as to cover the second drive circuit 112, and then the portion overlapping with the second drive circuit 112 is removed.
  • the present invention is not limited to this, and the second substrate 104 may be formed so as not to cover the second drive circuit 112.
  • the display area 106 and the first drive circuit 111 and the second drive circuit 112 are connected by wiring.
  • the display area 106 is provided with scanning signal lines and video signal lines in addition to the pixels 108.
  • Each pixel 108 in the display area 106 is connected to the first drive circuit 111 and the second drive circuit 112 by these wires.
  • the first drive circuit 111 is a drive circuit that outputs a scan signal to the display area 106 via a scan signal line
  • the second drive circuit 112 outputs a video signal to the display area 106 via a video signal line. It is a drive circuit.
  • the identifier 200 is provided on the first substrate 102.
  • the identifier 200 is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102).
  • the identifier 200 is arranged in a boundary area 130 which is the outer periphery of the display device 100 and a peripheral area 140 located between the display area 106 and the boundary area 130.
  • the identifier 200 is disposed at one of the corner portions formed by one side where the terminal area 114 is provided and the other side adjacent thereto.
  • the present invention is not limited to this, and the identifier 200 may be disposed in the vicinity of an intersection point formed by two adjacent sides of the first substrate 102.
  • the number of identifiers 200 is not particularly limited, and may be one or more. The arrangement and structure of the identifier 200 will be described in detail later.
  • the display device 100 In the display device 100 according to the present embodiment, at least a part of the outer peripheral side surface of the display device 100 is carbonized. That is, at least a part of the side surfaces of the first substrate 102 and the second substrate 104 that are the same as the outer periphery of the display device 100 is carbonized. Furthermore, in the display device 100, at least a part of the boundary region 130 connected to the outer peripheral side surface of the display device 100 is carbonized. That is, in the first substrate 102 and the second substrate 104, at least a part of the boundary region 130 connected to the side surface coinciding with the outer periphery of the display device 100 is carbonized.
  • carbonization of the first substrate 102 indicates a state in which more carbon atoms are contained than the first substrate 102
  • carbonization of the second substrate 104 indicates a state in which more carbon atoms are contained than the second substrate 104.
  • carbonization of the surface (side and top surfaces) of the boundary region 130 may be in a state where carbide of any of the organic substances constituting the outer periphery of the display device 100 is scattered. The carbonized area is colored black and the transmittance is significantly reduced.
  • FIG. 3 is a cross-sectional view showing a schematic structure of the display area 106 according to the present embodiment.
  • FIG. 3 is an enlarged schematic cross-sectional view taken along a dashed-dotted line AA ′ in FIG.
  • the plurality of pixels 108 disposed in the display area 106 have circuit elements.
  • the circuit element layer includes the semiconductor film 162, the gate insulating film 164, the gate electrode 166, the source / drain electrodes 168 and 170, the capacitance electrode 172, the interlayer film 174, the flattening film 176, the connection electrode 178, and the additional capacitance electrode. It has a multilayer structure including an additional capacitance insulating film 182, a partition wall 184, a pixel electrode 190, an EL layer 192, and a passivation film 196.
  • Each of the plurality of pixels 108 in the display area 106 has a drive transistor DRT, a storage capacitance Cs, an additional capacitance Cad, and a light emitting element OLED.
  • the driving transistor DRT controls light emission of the light emitting element OLED.
  • the first substrate 102 can include an organic resin material.
  • the first substrate 102 can also be provided with flexibility by using an organic resin material.
  • the organic resin material polymers such as polyimide, polyamide, polyester, polycarbonate and the like can be mentioned, and among them, polyimide having high heat resistance is preferable.
  • the undercoat 160 may have a single layer structure as shown in FIG. 3 or may be composed of a plurality of films. In the case of using a plurality of films, a film containing silicon oxide, a film containing silicon nitride, and a film containing a film containing silicon oxide may be sequentially formed on the first substrate 102.
  • the driving transistor DRT includes a semiconductor film 162, a gate insulating film 164, a gate electrode 166, and source / drain electrodes 168 and 170.
  • the gate insulating film 164 is sandwiched between the gate electrode 166 and the semiconductor film 162.
  • the gate electrode 166 is disposed to intersect at least a part of the semiconductor film 162 with the gate insulating film 164 interposed therebetween, and a channel region 162 a is formed in a region where the gate electrode 166 of the semiconductor film 162 overlaps.
  • the semiconductor film 162 further includes a channel region 162a, a low concentration impurity region 162c doped with an impurity, and a source / drain region 162b doped with an impurity.
  • the impurity concentration of the low concentration impurity region 162c is lower than that of the source / drain region 162b.
  • the drive transistor DRT is a top gate type transistor.
  • the present invention is not limited to this, and the structure of the transistor included in the circuit element may be a bottom gate transistor.
  • the upper / lower relationship between the source / drain electrodes 168 and 170 and the semiconductor film 162 is not limited.
  • a capacitor electrode 172 present in the same layer as the gate electrode 166 is provided to overlap with one of the source / drain regions 162 b via the gate insulating film 164.
  • An interlayer film 174 is provided on the gate electrode 166 and the capacitor electrode 172.
  • An opening reaching the semiconductor film 162 is formed in the interlayer film 174 and the gate insulating film 164, and source / drain electrodes 168 and 170 are disposed to cover the opening.
  • a part of the source / drain electrode 170 overlaps with a part of the source / drain region 162 b and the capacitor electrode 172 through the interlayer film 174, and a part of the source / drain region 162 b, a part of the gate insulating film 164, a capacitor electrode A storage capacitance Cs is formed by the portion 172, the interlayer film 174, and a part of the source / drain electrode 170.
  • a planarization film 176 is further provided on the drive transistor DRT and the storage capacitor Cs.
  • the planarization film 176 has an opening reaching the source / drain electrode 170, and a connection electrode 178 covering the opening and a part of the top surface of the planarization film 176 is provided in contact with the source / drain electrode 170.
  • An additional capacitance electrode 180 is further provided on the planarization film 176.
  • the connection electrode 178 and the additional capacitance electrode 180 may be formed at the same time, or may be formed in different steps so as to have different materials. When the connection electrode 178 and the additional capacitance electrode 180 are simultaneously formed, the connection electrode 178 and the additional capacitance electrode 180 exist in the same layer and have the same composition.
  • An additional capacitance insulating film 182 is formed to cover the connection electrode 178 and the additional capacitance electrode 180.
  • the additional capacitance insulating film 182 does not cover a part of the connection electrode 178 at the opening of the planarization film 176, and exposes the upper surface of the connection electrode 178. Thereby, the electrical connection between the pixel electrode 190 and the source / drain electrode 170 provided thereon is enabled via the connection electrode 178.
  • the additional capacitance insulating film 182 may be provided with an opening 186 for permitting contact between the partition 184 provided thereon and the planarizing film 176. The formation of the connection electrode 178 and the opening 186 is optional.
  • connection electrode 178 By providing the connection electrode 178, corrosion of the surface of the source / drain electrode 168 can be prevented in a subsequent process, and an increase in contact resistance of the source / drain electrode 168 can be prevented. Impurities in the planarization film 176 can be removed through the opening 186, which can improve the reliability of the circuit element and the light emitting element OLED.
  • a pixel electrode 190 is provided on the additional capacitance insulating film 182 so as to cover the connection electrode 178 and the additional capacitance electrode 180.
  • the storage capacitor insulating film 182 is sandwiched between the storage capacitor electrode 180 and the pixel electrode 190, and a storage capacitor Cad is formed by this structure.
  • the pixel electrode 190 is shared by the additional capacitance Cad and the light emitting element OLED.
  • a partition 184 covering the end of the pixel electrode 190 is provided on the pixel electrode 190.
  • the partition wall 184 unevenness due to the pixel electrode 190 can be alleviated, and cutting of the electroluminescent layer (hereinafter, EL layer) 192 and the counter electrode 194 provided thereon can be prevented.
  • An EL layer 192 and a counter electrode 194 covering the EL layer 192 are provided to cover the partition wall 184 and the pixel electrode 190.
  • the pixel electrode 190 is configured to transmit visible light.
  • the pixel electrode 190 is configured to reflect visible light.
  • the pixel electrode 190 contains a metal such as silver or aluminum having a high reflectance of visible light.
  • the pixel electrode 190 may have a stacked structure of a film containing a conductive oxide and a film containing a metal with high reflectance. For example, a stacked structure of a first conductive film containing a conductive oxide, a second conductive film containing a metal such as silver or aluminum, and a third conductive film containing a conductive oxide can be employed.
  • the structure of the EL layer 192 is arbitrary, and functional layers such as a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, an electron blocking layer, a hole blocking layer, an exciton blocking layer, etc. It can be formed in combination.
  • the structure of the EL layer 192 may be the same between all the pixels 108, and some structures may differ between the adjacent pixels 108.
  • the pixels 108 may be configured such that the structure or material of the light emitting layer is different between adjacent pixels 108, and the other layers have the same structure.
  • a hole transport layer 192a, a light emitting layer 192b, and an electron transport layer 192c are shown as representative functional layers in consideration of easy viewing.
  • the counter electrode 194 is configured to reflect visible light. Specifically, it is formed using a metal with high reflectance such as aluminum, silver, magnesium or an alloy thereof (for example, an alloy of magnesium and silver).
  • the pixel electrode 190 is configured to include a conductive oxide capable of transmitting visible light.
  • the above-described metal or alloy may be formed to a thickness that allows visible light to be transmitted. In this case, a conductive oxide film showing translucency to visible light may be further formed.
  • a passivation film 196 is disposed on the counter electrode 194 as an optional configuration.
  • the structure of the passivation film 196 can be arbitrarily determined, and either a single layer structure or a laminated structure may be employed. In the case of having a stacked structure, for example, a structure in which a first layer 196a containing a silicon-containing inorganic compound, a second layer 196b containing a resin, and a first layer 196a containing a silicon-containing inorganic compound can be sequentially stacked can be employed.
  • the silicon-containing inorganic compound include silicon nitride and silicon oxide.
  • the resin include epoxy resin, acrylic resin, polyester, polycarbonate and the like.
  • the second substrate 104 is disposed via the adhesive layer 110 so as to cover the display area 106 and the first drive circuit 111.
  • the second substrate 104 can include an organic resin material such as polyvinyl alcohol or polyethylene terephthalate.
  • the second substrate 104 includes an optical film such as a polarizing plate and a phase plate.
  • the optical film covers the plurality of pixels 108 and is disposed on the outer surface of the second substrate 104.
  • the optical film is disposed in order to suppress deterioration in visibility due to the external light incident on the display device 100 being reflected by the pixel electrode 190.
  • a first film may be disposed below the first substrate 102, and a second film may be disposed above the second substrate 104.
  • the structure of the first film and the second film can be arbitrarily determined, and either a single layer structure or a laminated structure may be adopted.
  • an organic resin material such as polyethylene terephthalate can be included.
  • FIG. 4A and FIG. 4B are diagrams showing a schematic configuration of a multiple panel 10 according to an embodiment of the present invention.
  • FIG. 4A is a plan view showing the multiple panel 10 according to one embodiment of the present invention.
  • FIG. 4B is a cross-sectional view of the multi-chamfered panel 10 of FIG.
  • FIG. 5A and FIG. 5B are enlarged plan views showing a schematic configuration of the multiple panel 10 and the display device 100 according to the embodiment of the present invention.
  • 5A is an enlarged plan view of region B of FIG. 4A.
  • 5B is an enlarged plan view of the display device 100 after the panel 10 for multiple chamfers of FIG. 5A is cut into pieces.
  • the circuit elements included in each pixel 108 of the plurality of display devices 100 are simultaneously formed in the plurality of display regions 106 on the first substrate 102 'for multiple chamfering.
  • FIG. 4A four display areas 106 corresponding to four display devices 100 are disposed on the first substrate 102 'for multiple chamfers.
  • the second substrate for multiple chamfer 104 ' is disposed on substantially the entire surface of the first substrate for multiple chamfer 102'.
  • substantially the entire surface of the first substrate for multiple chamfer 102 ′ is sealed by the second substrate for multiple chamfer 104 ′ as a sealing material so that the display region 106 is not exposed to the air.
  • the present invention is not limited to this, and the second substrate for multiple chamfer 104 ′ may be formed so as not to cover the terminal area 114 of each display device 100.
  • the second substrate for multiple chamfer 104 ′ may be formed so as not to cover the terminal area 114 of each display device 100.
  • two multi-faceted second substrates 104 ' may be disposed on one multi-facet first substrate 102' for each of the display regions 106 of the upper and lower two display devices 100. That is, in order to expose the terminal area 114 of each display device 100, the display devices 100 adjacent in the lateral direction may be sealed by the second substrate for multiple chamfers 104 '.
  • the cutting site 120 is disposed at the boundary of each display device 100.
  • Each display device 100 can be obtained by cutting the multi-chamfered panel 10 at the cutting site 120 and further exposing the terminal area 114.
  • an extra space is arranged around each display device 100. That is, two cutting portions 120 are disposed between the adjacent display devices 100.
  • the space between the two cutting portions 120 outside the display devices 100 is also referred to as a peripheral area 140.
  • the present invention is not limited to this, and the display devices 100 may be arranged adjacent to each other. In this case, one cutting site 120 is disposed between the adjacent display devices 100.
  • Each cut portion 120 located at the boundary of the display device 100 and the vicinity thereof are defined as a boundary region 130. Therefore, the outer peripheral side surface of the display device 100 cut out from the multi-chamfered panel 10 is also set as the boundary region 130. Furthermore, the boundary region 130 in the display device 100 indicates not only the outer peripheral side surface of the display device 100 to be a cut surface but also the vicinity of the outer peripheral side surface that can be affected by cutting. For example, the above-described carbonization is caused by cutting of the second substrate for multiple bevel 104 ′ by the carbon dioxide gas laser described later, and the area connected to the outer peripheral side surface to which such thermal influence is applied is also used as the boundary area 130. .
  • the cutting order for cutting out each display device 100 from the multi-chamfered panel 10 is not particularly limited. For example, after temporarily cutting and dividing the multi-chamfered panel 10 in the peripheral region 140 between the adjacent display devices 100 The display device 100 may be cut out by cutting each cutting site 120. The display device 100 may be cut out one by one by cutting the cutting portion 120 corresponding to the outer periphery of each display device 100 sequentially for each side. In addition, two display devices 100 may be cut out together for each of the cut portions 120 arranged linearly in the vertical and horizontal directions.
  • an identifier 200 is provided at each intersection of the cleavage site 120.
  • one identifier 200 is disposed at one intersection point.
  • the identifier 200 is located at one of the corners formed by the intersection of the cutting sites 120.
  • FIG. 4A and FIG. 4B by arranging the identifiers 200 at the corners located in the same direction at each intersection point, each of the plurality of display devices 100 on the multi-chamfer panel 10 has one identifier 200 each. Is placed.
  • the present invention is not limited to this, and the place where the identifier 200 is arranged at each intersection may be all within the display device 100 or may be all outside the display device 100. Further, the number of identifiers 200 at each intersection is not limited to this, and one or more per intersection may be sufficient.
  • the identifier 200 has a first identification unit 210 and a second identification unit 220.
  • the first identification unit 210 is disposed in the boundary area 130.
  • the second identification unit 220 is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130.
  • the first identification unit 210 and the second identification unit 220 are connected.
  • Each of the first identification unit 210 and the second identification unit 220 has a corner.
  • the present invention is not limited to this, and the first identification unit 210 and the second identification unit 220 may be separated as shown in FIGS. 9A and 9B, and may further be rounded (not shown). .
  • the first identification unit 210 is not disposed on the cutting site 120.
  • the present invention is not limited to this, and the first identification unit 210 may be disposed on the cutting site 120, and may be disposed across the cutting site 120 as shown in FIG.
  • the first identification unit 210 and the second identification unit 220 are both disposed at one corner formed by the intersection of the cutting sites 120.
  • the present invention is not limited to this, and the first identification unit 210 and the second identification unit 220 may be disposed at different corners formed by the intersection of the cutting portions 120 as illustrated in FIGS. 11A to 11C.
  • the first identification unit 210 may be disposed in the boundary area 130
  • the second identification unit 220 may be disposed in the peripheral area 140, and may have a structure capable of independently determining the intersections formed by the two cutting portions 120.
  • the boundary region 130 is carbonized. Therefore, at least a part of the first identification unit 210 disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130.
  • the identifier 200 is provided between the first substrate 102 and the second substrate 104. At least a part of the first identification unit 210 can not be viewed due to the carbonization of the second substrate 104 provided on the first identification unit 210.
  • the second substrate 104 near the terminal region 114 may be peeled off in order to expose the terminal region 114, for example.
  • the second identification unit 220 disposed in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate 102).
  • the display device 100 is rectangular. For this reason, one display device 100 can be cut out from the multi-faceted panel 10 by cutting at least four cutting sites 120.
  • the identifier 200 is disposed near each of the four intersections formed by the four cutting sites 120.
  • the at least four identifiers 200 can identify four cleavage sites 120 by determining four intersection points.
  • the present invention is not limited to this, and the number of identifiers 200 can be appropriately selected according to the shape of the display device 100.
  • the identifier 200 is formed of one of the metal materials constituting the circuit element layer provided in the display area 106. That is, the identifier 200 is formed when forming circuit elements of a plurality of pixels. In the present embodiment, the identifier 200 is formed in the same layer as the gate electrode 166 constituting the transistor. However, the present invention is not limited to this, and the identifier 200 may be formed separately from the circuit element.
  • the boundary region 130 of the display device 100 includes the first substrate 102, the undercoat 160, the adhesive layer 110, and the second substrate 104.
  • the present invention is not limited to this, and the boundary region 130 of the display device 100 may be an organic resin material or silicon nitride constituting a circuit element layer provided in the display region 106 between the first substrate 102 and the second substrate 104. Etc. may be included. With such a configuration, the step in the stacking direction between the display area 106 and the boundary area 130 may be planarized.
  • the display device having such an identifier 200 enables the second identification unit 220 even when a part of the first identification unit 210 can not be visually recognized when cutting from a multi-faceted panel into individual pieces. Can be used to suppress the decrease in position detection accuracy.
  • FIG. 6 is a plan view showing a multiple panel 10a according to a modification of the present invention.
  • FIGS. 7A and 7B are enlarged plan views showing schematic configurations of the multiple panel 10a and the display device 100a according to a modification of the present invention.
  • FIG. 7A is an enlarged plan view of the region C of FIG. 7B is an enlarged plan view of the display device 100a after the panel 10a for multiple chamfers of FIG. 7A is cut into pieces.
  • the configurations of the panel for multiple chamfers 10a and the display device 100a according to the present modification are the same as the configurations of the panel for multiple chamfers 10 and the display device 100 according to the first embodiment except for the number and arrangement of the identifiers 200a. . For this reason, the same parts as those of the first embodiment will not be described in detail.
  • Display device configuration As shown in FIGS. 6, 7A and 7B, in the display device 100a according to this modification, four identifiers 200a are provided on the first substrate 102.
  • the identifier 200 a is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102).
  • the identifier 200 a is disposed in the boundary area 130 which is the outer periphery of the display device 100 a and the peripheral area 140 located between the display area 106 and the boundary area 130.
  • the identifier 200a is disposed at each corner formed by one side of the outer periphery of the display device 100a and the other side adjacent to one side.
  • the four identifiers 200a are disposed one by one at the corners of the display device 100a.
  • the cutting site 120 is disposed at the boundary of each display device 100a.
  • Each display device 100 a can be obtained by cutting the multiple-chamfered panel 10 a at the cutting portion 120 and further exposing the terminal area 114.
  • an identifier 200a is provided at each intersection of the cleavage site 120.
  • four identifiers 200a are arranged at one intersection point.
  • the identifiers 200 a are respectively disposed at four corners formed by the intersection of the cutting sites 120.
  • four identifiers 200 a are arranged in each of the plurality of display devices 100 a on the multi-chamfer panel 10 a.
  • the present invention is not limited to this, and the number of identifiers 200a at each intersection may be one or more per intersection.
  • the identifier 200a includes a first identification unit 210a and a second identification unit 220a.
  • the first identification unit 210 a is disposed in the boundary area 130.
  • the second identification unit 220 a is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130. In the present modification, the first identification unit 210a and the second identification unit 220a are connected.
  • the boundary area 130 is carbonized in the display apparatus 100a cut out from the panel 10a for multiple chamfers. For this reason, at least a part of the first identification unit 210 a disposed in the boundary area 130 can not be visually recognized due to carbonization of the boundary area 130.
  • the peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220a disposed in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate 102).
  • the display device 100a according to the present modification has a plurality of identifiers 200a, so that the position detection accuracy can be improved when the multiple-chamfered panel 10a is cut into pieces, and a part of the first identification unit 210a Even if it can not be visually recognized, the second identification unit 220a can be used to suppress a decrease in position detection accuracy.
  • FIGS. 8A and 8B are enlarged plan views showing schematic configurations of the multiple panel 10b and the display device 100b according to a modification of the present invention.
  • FIG. 8A is an enlarged plan view of the intersection of the cutting site 120.
  • FIG. 8B is an enlarged plan view of the display device 100b after the panel 10b for multiple chamfers of FIG. 8A is cut into pieces.
  • the configurations of the panel for multiple chamfers 10b and the display device 100b according to the present modification are the same as the configurations of the panel for multiple chamfers 10 and the display device 100 according to the first embodiment except for the shape of the identifier 200b. For this reason, the same parts as those of the first embodiment will not be described in detail.
  • the identifier 200b is provided on the first substrate 102.
  • the identifier 200 b is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102).
  • the identifier 200 b is arranged in a boundary area 130 which is the outer periphery of the display device 100 b and a peripheral area 140 located between the display area 106 and the boundary area 130.
  • the identifier 200 b is disposed at one of the corner portions formed by one side where the terminal area 114 is provided and the other side adjacent thereto.
  • the cutting site 120 is disposed at the boundary of each display device 100b.
  • Each display device 100 b can be obtained by cutting the multiple-chamfered panel 10 b at the cutting site 120 and further exposing the terminal area 114.
  • an identifier 200b is provided at each intersection of the cleavage site 120.
  • one identifier 200 b is disposed at one intersection point.
  • the identifier 200 b is located at one of the corners formed by the intersection of the cutting sites 120.
  • one identifier 200b is arranged in each of the plurality of display devices 100b on the panel for multiple chamfers 10b.
  • the present invention is not limited to this, and the place where the identifier 200b is disposed at each intersection may be all within the display device 100b or all outside the display device 100b. Further, the number of identifiers 200b at each intersection is not limited to this, and one or more per intersection may be sufficient.
  • the identifier 200b includes a first identification unit 210b and a second identification unit 220b.
  • the first identification unit 210 b is disposed in the boundary area 130.
  • the second identification unit 220 b is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130.
  • the first identification unit 210b and the second identification unit 220b are partially connected.
  • the identifier 200b has a space 230b between the first identification unit 210b and the second identification unit 220b, and the first identification unit 210b and the second identification unit 220b are partially separated. That is, the second identification unit 220 b is partially separated from the boundary region 130.
  • the boundary area 130 is carbonized about the display apparatus 100b cut out from the panel 10b for multiple chamfers. For this reason, at least a part of the first identification unit 210 b disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130.
  • the peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220b disposed in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate 102). In the present modification, the second identification unit 220 b is partially separated from the boundary region 130. For this reason, even if the boundary region 130 is carbonized, the outer shape of the second identification unit 220b can be easily identified, and the position of the second identification unit 220b can be detected more accurately.
  • the first detection unit 210b and the second detection unit 220b of the identifier 200b are partially separated, so that position detection accuracy is obtained when the multiple-chamfering panel 10b is cut into pieces. Further, even if a part of the first identification unit 210b can not be visually recognized, the second identification unit 220b can be used to suppress a decrease in position detection accuracy.
  • FIGS. 9A and 9B are enlarged plan views showing schematic configurations of a multiple panel 10c and a display device 100c according to a modification of the present invention.
  • FIG. 9A is an enlarged plan view of the intersection of the cutting site 120.
  • FIG. 9B is an enlarged plan view of the display device 100c after the panel 10c for multiple chamfers of FIG. 9A is cut into pieces.
  • the configurations of the panel for multiple chamfers 10c and the display device 100c according to the present modification are the same as the configurations of the panel for multiple chamfers 10 and the display device 100 according to the first embodiment except for the shape of the identifier 200c. For this reason, the same parts as those of the first embodiment will not be described in detail.
  • the identifier 200c is provided on the first substrate 102.
  • the identifier 200c is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102).
  • the identifier 200c is disposed in the boundary area 130 which is the outer periphery of the display device 100c, and in the peripheral area 140 located between the display area 106 and the boundary area 130.
  • the identifier 200c is disposed at one of the corner portions formed by one side where the terminal area 114 is provided and the other side adjacent thereto.
  • the cutting site 120 is disposed at the boundary of each display device 100c.
  • Each display device 100c can be obtained by cutting the multiple-chamfered panel 10c at the cutting portion 120 and further exposing the terminal area 114.
  • an identifier 200c is provided at each intersection of the cleavage site 120.
  • one identifier 200c is disposed at one intersection point.
  • the identifier 200 c is located at one of the corners formed by the intersection of the cutting sites 120.
  • one identifier 200c is arranged in each of the plurality of display devices 100c on the panel for multiple chamfers 10c.
  • the present invention is not limited to this, and the place where the identifier 200c is disposed at each intersection may be all within the display device 100c or may be entirely outside the display device 100c. Further, the number of identifiers 200c at each intersection is not limited to this, and one or more per intersection may be sufficient.
  • the identifier 200c has a first identification unit 210c and a second identification unit 220c.
  • the first identification unit 210 c is disposed in the boundary area 130.
  • the second identification unit 220 c is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130.
  • the first identification unit 210c and the second identification unit 220c are separated. That is, the identifier 200c has a space 230c between the first identification unit 210c and the second identification unit 220c, and the first identification unit 210c and the second identification unit 220c are separated.
  • the boundary region 130 is carbonized. For this reason, at least a part of the first identification unit 210 c disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130.
  • the peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220c disposed in the peripheral region 140 is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). In the present modification, the second identification unit 220 c is separated from the boundary region 130. Therefore, even if the boundary region 130 is carbonized, the outer shape of the second identification unit 220c can be more easily identified, and the position of the second identification unit 220c can be detected more accurately.
  • the first identification unit 210c and the second identification unit 220c of the identifier 200c are separated, so that the position detection accuracy is further improved when the multiple panels 10c are cut into pieces. Even if a part of the first identification unit 210c can not be visually recognized, the second identification unit 220c can be used to suppress a decrease in position detection accuracy.
  • FIG. 10 is a plan view showing a multiple panel 10d according to a modification of the present invention.
  • FIG. 11A to FIG. 11C are enlarged plan views showing schematic configurations of the multiple panel 10d and the display device 100d according to a modification of the present invention.
  • 11A is an enlarged plan view of the region D of FIG. 11B and 11C are enlarged plan views of the display device 100d after the panel 10d for multiple chamfers of FIG. 11A is cut into pieces.
  • the configurations of the panel 10d for multiple chamfering and the display device 100d according to the present modification are the same as the configurations of the panel 10 for multiple chamfering and the display device 100 according to the first embodiment except for the shape and arrangement of the identifier 200d. . For this reason, the same parts as those of the first embodiment will not be described in detail.
  • an identifier 200d is provided on the first substrate 102.
  • the identifier 200 d is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102).
  • the identifier 200 d is disposed in the boundary area 130 which is the outer periphery of the display device 100 d and the peripheral area 140 located between the display area 106 and the boundary area 130.
  • one identifier 200d is divided into two corner portions of the display device 100d.
  • the cutting site 120 is disposed at the boundary of each display device 100d.
  • Each of the display devices 100 d can be obtained by cutting the multiple chamfered panel 10 d at the cutting portion 120 and further exposing the terminal area 114.
  • an identifier 200d is provided at each intersection of the cleavage site 120.
  • one identifier 200d is disposed at one intersection point.
  • the identifier 200 d is divided into two of the four corners formed by the intersection of the cutting sites 120.
  • one identifier 200d is arranged in each of the plurality of display devices 100d on the panel for multiple chamfers 10d.
  • the present invention is not limited to this, and the place where the identifier 200d is disposed at each intersection may be all within the display device 100d or may be entirely outside the display device 100b.
  • the number of the identifiers 200 d at each intersection is not limited to this, and it is sufficient that the number is one or more per intersection.
  • the identifier 200d includes a first identification unit 210d and a second identification unit 220d.
  • the first identification unit 210 d is disposed in the boundary area 130.
  • the second identification unit 220 d is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130.
  • the first identification unit 210d and the second identification unit 220d are separated. That is, in the identifier 200d, the first identification unit 210d and the second identification unit 220d are separated. Furthermore, the first identification unit 210d and the second identification unit 220d are separately arranged at different corner portions.
  • the boundary region 130 is carbonized. For this reason, at least a part of the first identification unit 210d disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130.
  • the peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220d disposed in the peripheral region 140 is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). In the present modification, the second identification unit 220 d is separated from the boundary region 130. Therefore, even if the boundary region 130 is carbonized, the outer shape of the second identification unit 220d can be more easily identified, and the position of the second identification unit 220d can be detected more accurately.
  • the position detection accuracy is further increased when the multiple panels 10d are cut into pieces. This can be improved, and even if a part of the first identification unit 210d can not be visually recognized, the second identification unit 220d can be used to suppress a decrease in position detection accuracy.
  • FIG. 12 is a plan view showing a multiple panel 10e according to a modification of the present invention.
  • FIG. 13 is an enlarged plan view showing a schematic configuration of a multiple panel 10e according to a modification of the present invention.
  • FIG. 13 is an enlarged plan view of the area E of FIG. 14A to 14D are enlarged plan views of the display device 100e after the panel 10e for multiple chamfers of FIG. 12 is cut into pieces.
  • the configurations of the panel for multiple chamfers 10e and the display device 100e according to the present modification are the same as the configurations of the panel for multiple chamfers 10 and the display device 100 according to the first embodiment except for the shape and arrangement of the identifier 200e. . For this reason, the same parts as those of the first embodiment will not be described in detail.
  • the identifier 200e is provided on the first substrate 102.
  • the identifier 200 e is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102).
  • the identifier 200 e is disposed in the boundary area 130 which is the outer periphery of the display device 100 e and the peripheral area 140 located between the display area 106 and the boundary area 130.
  • one identifier 200e is divided into four corner portions of the display device 100e.
  • the cutting site 120 is disposed at the boundary of each display device 100 e.
  • Each display device 100 e can be obtained by cutting the multiple-chamfered panel 10 e at the cutting site 120 and further exposing the terminal area 114.
  • an identifier 200e is provided at each intersection of the cleavage site 120.
  • one identifier 200e is disposed at one intersection point.
  • the identifier 200 e is disposed across the four corners formed by the intersection of the cutting sites 120.
  • the present invention is not limited to this, and the number of identifiers 200e may be one or more per intersection point.
  • the identifier 200 e has a first identification unit 210 e and a second identification unit 220 e.
  • the first identification unit 210 e is disposed in the boundary area 130 so as to straddle two cutting sites 120 forming an intersection point.
  • the second identification unit 220 e is disposed in the peripheral area 140.
  • the first identification unit 210e and the second identification unit 220e are separated. That is, in the identifier 200e, the first identification unit 210e and the second identification unit 220e are separated. Furthermore, the first identification unit 210e is disposed across four different corners. For this reason, it is possible to save the space for arranging the identifier 200e.
  • the boundary region 130 of the display device 100e cut out from the multi-chamfered panel 10e is carbonized. Therefore, at least a part of the first identification unit 210 e disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130.
  • the peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized.
  • the second identification unit 220e disposed in the peripheral region 140 is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102).
  • the second identification unit 220 e is separated from the boundary region 130. Therefore, even if the boundary region 130 is carbonized, the outer shape of the second identification unit 220e can be more easily identified, and the position of the second identification unit 220e can be detected more accurately.
  • the display device 100e can save the space where the identifier 200e is disposed by arranging the first identification unit 210e of the identifier 200e across the cut portion 120.
  • the first identification unit 210e and the second identification unit 220e of the identifier 200e it is possible to further improve the position detection accuracy when cutting the panel 10e for multi-chamfering into individual pieces, and the first identification unit Even if a part of 210 e can not be visually recognized, the second identification unit 220 e can be used to suppress a decrease in position detection accuracy.
  • Second Embodiment a method of manufacturing the display device 100 will be described with reference to FIGS. 15A to 15C.
  • the manufacturing method of the panel 10 for multiple chamfers it does not specifically limit except forming the identifier 200 mentioned above, and the existing method can be used. Therefore, the description of the method of manufacturing the panel 10 for multiple chamfers is omitted, and in FIGS. 15A to 15C, a method for forming the display device 100 by cutting the panel 10 for multiple chamfers into pieces will be described.
  • the boundary region 130 of the multi-chamfering panel 10 includes the first substrate 102 'for multi-chamfering, the undercoat 160, the adhesive layer 110, and the second substrate 104' for multi-chamfering.
  • an identifier 200 is disposed between the multiple bevel first substrate 102 'and the multiple bevel second substrate 104'.
  • the first identification unit 210 of the identifier 200 is disposed in the boundary area 130 of the multi-chamfering panel 10.
  • a second identification unit 220 of the identifier 200 is disposed in the peripheral area 140 of the multi-chamfered panel 10.
  • the identifier 200 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate for multiple beveling 102 ′).
  • the multi-chamfering second substrate 104 ' is cut using a laser.
  • the position detection of the first substrate for multi-chamfering 102 'of the panel 10 for multi-chamfering is performed.
  • the position of the multiple beveling first substrate 102 ′ of the beveling panel 10 and the laser is aligned, and the multiple bevel second substrate 104 ′ is cut at the cutting portion 120 of the boundary region 130.
  • a carbon dioxide gas laser for cutting the second substrate for multiple bevel 104 '.
  • the cutting of the second substrate for multiple bevel 104 ′ by the carbon dioxide gas laser cuts the second substrate for multiple bevel 104 ′, the adhesive layer 110, and the undercoat 160.
  • the present invention is not limited to this, and an organic resin material or silicon nitride constituting a circuit element layer further provided in the display region 106 between the first substrate 102 'for multiple chamfers and the second substrate 104 for multiple chamfers. And the like, and these layers may also be cut by a carbon dioxide gas laser.
  • a carbon dioxide laser generates heat. For this reason, at least a part of the boundary region 130 of the first substrate 102 'for multiple chamfers and the second substrate 104' for multiple chamfers is carbonized under the thermal influence of the carbon dioxide gas laser.
  • the range of influence of the carbon dioxide gas laser depends on the irradiation conditions (intensity and range) of the laser.
  • the panel 10 with multiple chamfers is thermally affected by a carbon dioxide gas laser in a range of 10 ⁇ m or more from the cutting site 120 and 100 ⁇ m or less from the cutting site. Therefore, the boundary region 130 can be appropriately set in a range of 10 ⁇ m or more from the cutting site 120 and 100 ⁇ m or less from the cutting site 120.
  • Carbonization by a carbon dioxide gas laser can extend to all the organic substances constituting the boundary area 130.
  • the cut surface may be in a state where carbide of any of the organic substances constituting the boundary area 130 is scattered.
  • the first identification portion 210 of the identifier 200 located in the boundary area 130 becomes invisible.
  • the second identification portion 220 of the identifier 200 located in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the multiple bevel first substrate 102 ′).
  • the multi-chamfering first substrate 102 ' is cut using a laser.
  • the position detection of the first substrate for multiple chamfer 102 ′ of the panel for multiple chamfers 10 is performed using the second identification unit 220 of the identifier 200.
  • the position of the multiple chamfering first substrate 102 ′ of the multiple chamfering panel 10 and the laser is aligned, and the multiple chamfering first substrate 102 ′ is cut at the cutting portion 120 of the boundary region 130.
  • the first substrate for multiple chamfer 102 ′ includes polyimide. For this reason, it is preferable to use a UV laser for cutting the first substrate 102 'for multiple chamfering.
  • ⁇ Modification 6> [Method of manufacturing display device]
  • the method of manufacturing the display device 100 according to the present modification is the same as the method of manufacturing the display device 100 according to the second embodiment except that the first film 197 and the second film 198 are further cut. For this reason, the same parts as those of the second embodiment will not be described in detail.
  • the boundary region 130 of the multi-chamfered panel 10 includes the first film 197, the first multi-chamfered substrate 102 ', the undercoat 160, the adhesive layer 110, the second multi-chamfered substrate 104', and the second film. It consists of 198.
  • an identifier 200 is disposed between the multiple bevel first substrate 102 'and the multiple bevel second substrate 104'.
  • the first identification unit 210 of the identifier 200 is disposed in the boundary area 130 of the multi-chamfering panel 10.
  • a second identification unit 220 of the identifier 200 is disposed in the peripheral area 140 of the multi-chamfered panel 10.
  • the identifier 200 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate for multiple beveling 102 ′).
  • the multiple-face second substrate 104 ' is cut using a laser.
  • the position detection of the first substrate for multi-chamfer 102 'of the panel 10 for multi-chamfering is performed.
  • the position of the multiple beveling first substrate 102 ′ of the beveling panel 10 and the laser is aligned, and the multiple bevel second substrate 104 ′ is cut at the cutting portion 120 of the boundary region 130.
  • the present invention is not limited to this, and an organic resin material or silicon nitride constituting a circuit element layer further provided in the display region 106 between the first substrate 102 'for multiple chamfers and the second substrate 104 for multiple chamfers. And the like, and these layers may also be cut by a carbon dioxide gas laser.
  • the first identification portion 210 of the identifier 200 located in the boundary area 130 becomes invisible.
  • the second identification portion 220 of the identifier 200 located in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the multiple bevel first substrate 102 ′).
  • the multi-chamfering first substrate 102 ' is cut using a laser.
  • the position detection of the first substrate for multiple chamfer 102 ′ of the panel for multiple chamfers 10 is performed using the second identification unit 220 of the identifier 200.
  • the position of the multiple chamfering first substrate 102 ′ of the multiple chamfering panel 10 and the laser is aligned, and the multiple chamfering first substrate 102 ′ is cut at the cutting portion 120 of the boundary region 130.
  • the first substrate for multiple chamfer 102 ′ includes polyimide.
  • the cutting of the first substrate for multiple bevel 102 ′ by the UV laser cuts the first substrate for multiple bevel 102 ′ and the first film 197.
  • the identifier 200 including the first identification unit 210 and the second identification unit 220, a part of the first identification unit 210 is visually recognized when the multi-chamfered panel is cut into pieces. Even if it becomes impossible, the second identification unit 220 can be used to suppress the decrease in position detection accuracy.
  • Panel for multiple bevel: 10 display device: 100, first substrate: 102, second substrate: 104, display region: 106, pixel: 108, adhesive material: 110, first drive circuit: 111, second drive circuit: 112, terminal area: 114, connection terminal: 116, cutting site: 120, boundary area: 130, peripheral area: 140, identifier: 200, first identification unit: 210, second identification unit: 220

Abstract

Provided is a method for manufacturing a display device in which a plurality of display devices each including a display region, a peripheral region, and a boundary region is created on a first substrate for singulation. The method for manufacturing a display device comprises: forming an identifier on the first substrate for singulation, the identifier including a first identification section disposed in the boundary region located at the boundary of the display device and a second identification section disposed in the peripheral region located between the display region and the boundary region; cutting a second substrate for singulation in the boundary region by positioning a laser with respect to the first substrate for singulation using a first identification section; and cutting the first substrate for singulation in the boundary region by positioning the laser with respect to the first substrate for singulation using a second identification section. The cutting of the second substrate for singulation includes carbonizing at least a portion of the first substrate for singulation.

Description

表示装置及び表示装置の製造方法Display device and method of manufacturing display device
 本発明は、表示装置及び表示装置の製造方法に関する。 The present invention relates to a display device and a method of manufacturing the display device.
 表示装置は、各画素に発光素子が設けられ、個別に発光を制御することで画像を表示する。例えば発光素子として有機EL素子を用いる有機EL表示装置においては、各画素に有機EL素子が設けられ、有機EL素子は、アノード電極、およびカソード電極から成る一対の電極間に有機EL材料を含む層(以下、「有機EL層」という)を挟んだ構造を有している。有機EL表示装置は、アノード電極が画素ごとに個別画素電極として設けられ、カソード電極は複数の画素に跨って共通の電位が印加される共通画素電極として設けられている。有機EL表示装置は、この共通画素電極の電位に対し、画素電極の電位を画素ごとに印加することで、画素の発光を制御している。 In the display device, a light emitting element is provided in each pixel, and an image is displayed by individually controlling light emission. For example, in an organic EL display using an organic EL element as a light emitting element, an organic EL element is provided in each pixel, and the organic EL element is a layer including an organic EL material between a pair of electrodes consisting of an anode electrode and a cathode electrode. It has a structure (hereinafter, referred to as "organic EL layer"). In the organic EL display device, an anode electrode is provided as an individual pixel electrode for each pixel, and a cathode electrode is provided as a common pixel electrode to which a common potential is applied across a plurality of pixels. The organic EL display device controls the light emission of the pixel by applying the potential of the pixel electrode to each pixel with respect to the potential of the common pixel electrode.
 複数の表示パネルを同時に形成する表示装置の製造方法において、多面取り用大型パネルは個片に切断する必要がある。このとき、表示パネル上にはアライメントマークが設けられ、多面取り用大型パネルを切断する際の位置合わせ(アライメント)に使用される。 In a method of manufacturing a display device in which a plurality of display panels are simultaneously formed, it is necessary to cut a large panel for multiple chamfering into pieces. At this time, an alignment mark is provided on the display panel, and is used for alignment at the time of cutting the multi-chamfered large panel.
 特許文献1には、半導体ウェハ、特に配線工程以後に使用するアライメントマークが開示されている。 Patent Document 1 discloses a semiconductor wafer, in particular, an alignment mark used after a wiring process.
特開平08-264423号公報Japanese Patent Application Publication No. 08-264423
 多面取り用大型パネルを個片に切断する場合、例えば、多面取り用大型パネルを隣接する表示パネルの周辺で仮切断して個別化してから、各々の表示パネルの外周を切断することで表示パネルを切り出してもよい。また、各々の表示パネルの外周を直接切断することで、表示パネルを1つずつ切り出してもよい。また、マトリックス状に配置される各々の表示パネルをまとめて切り出してもよい。いずれの場合においても、多面取り用大型パネルを構成する各材料の特性に応じたレーザー光を選ぶ必要がある。このため、同一箇所に複数回のレーザー照射が必要になることがある。例えば、多面取り用大型パネルに偏光板が貼ってある場合、炭酸ガスレーザーとUVレーザーとを重ね打ちをする必要がある。しかしながら、最初のレーザー照射によって、切断領域近傍にダメージが生じアライメントマークが消失する可能性がある。 When cutting a large panel for multiple chamfering into pieces, for example, after temporarily cutting and individualizing the large panel for multiple chamfering around the adjacent display panel, the display panel is obtained by cutting the outer periphery of each display panel You may cut out. Alternatively, the display panels may be cut out one by one by directly cutting the outer periphery of each display panel. Alternatively, display panels arranged in a matrix may be cut out together. In any case, it is necessary to select a laser beam according to the characteristics of each material constituting the multi-faceted large panel. For this reason, the same location may need to be subjected to multiple laser irradiations. For example, in the case where a polarizing plate is attached to a large panel for multiple chamfering, it is necessary to overstrike a carbon dioxide gas laser and a UV laser. However, the first laser irradiation may cause damage in the vicinity of the cutting region and the alignment mark may disappear.
 本発明は、多面取り用大型パネルを個片に切断するときに、アライメントマークの一部が視認できなくなっても位置検出精度の低下を抑制することを目的の一つとする。 An object of the present invention is to suppress a decrease in position detection accuracy even when a part of an alignment mark can not be visually recognized when cutting a large panel for multiple chamfering into pieces.
 本発明の一実施形態によると、多面取り用第1基板の上に、表示領域と周辺領域と境界領域とを含む複数の表示装置を形成する表示装置の製造方法において、前記表示領域に複数の画素を形成し、前記表示装置の境界に位置する前記境界領域に配置される第1識別部と、前記表示領域と前記境界領域の間に位置する前記周辺領域に配置される第2識別部と、を含む識別子を前記多面取り用第1基板の上に形成し、前記複数の表示装置に渡って、前記多面取り用第1基板の上に多面取り用第2基板を形成し、前記第1識別部を用いてレーザーと前記多面取り用第1基板の位置を合わせ、前記境界領域で前記多面取り用第2基板を切断し、前記第2識別部を用いてレーザーと前記多面取り用第1基板の位置を合わせ、前記境界領域で前記多面取り用第1基板を切断すること、を含み、前記多面取り用第2基板を切断することは、前記多面取り用第1基板の少なくとも一部を炭化すること、を含む表示装置の製造方法が提供される。 According to one embodiment of the present invention, there is provided a method of manufacturing a display device in which a plurality of display devices including a display region, a peripheral region, and a boundary region are formed on a first substrate for multiple chamfers. A first identification unit forming a pixel and disposed in the boundary region located at the boundary of the display device; and a second identification unit disposed in the peripheral region located between the display region and the boundary region , And the second substrate for multiple chamfers is formed on the first substrate for multiple chamfers across the plurality of display devices; Aligning the position of the laser and the first substrate for multiple chamfering using the identification unit, cutting the second substrate for multiple chamfering in the boundary area, and using the second identification unit, the laser and the first multiple chamfering substrate Aligning the substrate, the chamfering at the boundary area Cutting the first substrate, and cutting the second substrate for multi-chamfering comprises carbonizing at least a portion of the first substrate for multi-chamfering. Ru.
 本発明の一実施形態によると、複数の画素が配置される表示領域と、表示装置の境界に位置する境界領域と、前記表示領域と前記境界領域の間に位置する周辺領域と、を含む第1基板と、前記境界領域に配置される第1識別部と、前記周辺領域に配置される第2識別部と、を含む識別子と、前記表示領域と前記周辺領域と前記境界領域とに配置される第2基板と、を含み、前記境界領域における前記第1基板の少なくとも一部は炭化している表示装置が提供される。 According to an embodiment of the present invention, there is provided a display area in which a plurality of pixels are arranged, a boundary area located at a boundary of a display device, and a peripheral area located between the display area and the boundary area. An identifier including one substrate, a first identification unit disposed in the boundary region, and a second identification unit disposed in the peripheral region, the display region, the peripheral region, and the boundary region And a second substrate, wherein at least a part of the first substrate in the boundary area is carbonized.
本発明の一実施形態に係る表示装置の概略構成を示す斜視図である。It is a perspective view showing a schematic structure of a display concerning one embodiment of the present invention. 本発明の一実施形態に係る表示装置の概略構成を示す平面図である。It is a top view which shows schematic structure of the display apparatus which concerns on one Embodiment of this invention. 本発明の一実施形態に係る表示装置の表示領域の概略構造を示す断面図である。It is sectional drawing which shows schematic structure of the display area of the display apparatus which concerns on one Embodiment of this invention. 本発明の一実施形態に係る多面取り用パネルの概略構成を示す平面図である。It is a top view which shows schematic structure of the panel for multiple chamfers which concerns on one Embodiment of this invention. 本発明の一実施形態に係る多面取り用パネルの概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the panel for multiple chamfers which concerns on one Embodiment of this invention. 本発明の一実施形態に係る多面取り用パネルの概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the panel for multiple chamfers which concerns on one Embodiment of this invention. 本発明の一実施形態に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view showing the schematic structure of the display concerning one embodiment of the present invention. 本発明の変形例1に係る多面取り用パネルの概略構成を示す平面図である。It is a top view which shows schematic structure of the panel for multiple chamfers which concerns on the modification 1 of this invention. 本発明の変形例1に係る多面取り用パネルの概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the panel for multiple chamfers which concerns on the modification 1 of this invention. 本発明の変形例1に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 1 of this invention. 本発明の変形例2に係る多面取り用パネルの概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the panel for multiple chamfers which concerns on the modification 2 of this invention. 本発明の変形例2に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 2 of this invention. 本発明の変形例3に係る多面取り用パネルの概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the panel for multiple chamfers which concerns on the modification 3 of this invention. 本発明の変形例3に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 3 of this invention. 本発明の変形例4に係る多面取り用パネルの概略構成を示す平面図である。It is a top view which shows schematic structure of the panel for multiple chamfers which concerns on the modification 4 of this invention. 本発明の変形例4に係る多面取り用パネルの概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the panel for multiple chamfers which concerns on the modification 4 of this invention. 本発明の変形例4に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 4 of this invention. 本発明の変形例4に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 4 of this invention. 本発明の変形例5に係る多面取り用パネルの概略構成を示す平面図である。It is a top view which shows schematic structure of the panel for multiple chamfers which concerns on the modification 5 of this invention. 本発明の変形例5に係る多面取り用パネルの概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the panel for multiple chamfers which concerns on the modification 5 of this invention. 本発明の変形例5に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 5 of this invention. 本発明の変形例5に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 5 of this invention. 本発明の変形例5に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 5 of this invention. 本発明の変形例5に係る表示装置の概略構成を示す拡大平面図である。It is an enlarged plan view which shows schematic structure of the display apparatus which concerns on the modification 5 of this invention. 本発明の一実施形態に係る製造方法を示す断面図である。It is sectional drawing which shows the manufacturing method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る製造方法を示す断面図である。It is sectional drawing which shows the manufacturing method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る製造方法を示す断面図である。It is sectional drawing which shows the manufacturing method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る製造方法を示す断面図である。It is sectional drawing which shows the manufacturing method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る製造方法を示す断面図である。It is sectional drawing which shows the manufacturing method which concerns on one Embodiment of this invention. 本発明の一実施形態に係る製造方法を示す断面図である。It is sectional drawing which shows the manufacturing method which concerns on one Embodiment of this invention.
 以下、図面を参照して、本発明のいくつかの実施形態に係る表示装置について詳細に説明する。但し、本発明は多くの異なる態様で実施することが可能であり、以下に例示する実施形態の記載内容に限定して解釈されるものではない。本発明の実施形態では、特に有機EL表示装置を好適な応用例として例示するが、これに限定されるものではない。 Hereinafter, a display according to some embodiments of the present invention will be described in detail with reference to the drawings. However, the present invention can be implemented in many different modes, and is not construed as being limited to the description of the embodiments exemplified below. In the embodiment of the present invention, in particular, an organic EL display device is exemplified as a preferable application example, but the present invention is not limited to this.
 図面は説明をより明確にするため、実際の態様に比べ、各部の幅、厚さ、形状等について模式的に表される場合があるが、あくまで一例であって、本発明の解釈を限定するものではない。また、図面の寸法比率は、説明の都合上、実際の比率とは異なったり、構成の一部が図面から省略されたりする場合がある。本明細書と各図において、既出の図に関して前述したものと同様の要素には、同一の符号を付して、詳細な説明を適宜省略する。 Although the drawings may be schematically represented with respect to the width, thickness, shape, etc. of each portion in comparison with the actual embodiment in order to make the description clearer, this is merely an example, and the interpretation of the present invention is limited. It is not a thing. In addition, the dimensional ratio of the drawings may be different from the actual ratio or part of the configuration may be omitted from the drawings for convenience of explanation. In the specification and the drawings, the same elements as those described above with reference to the drawings are denoted with the same reference numerals, and the detailed description will be appropriately omitted.
 本明細書において、ある一つの膜に対してエッチングや光照射を行って複数の膜を形成した場合、これら複数の膜は異なる機能、役割を有することがある。しかしながら、これら複数の膜は同一の工程で同一層として形成された膜に由来し、同一の層構造、同一の材料を有する。したがって、これら複数の膜は同一層に存在しているものと定義する。 In this specification, when a plurality of films are formed by performing etching or light irradiation on a certain film, the plurality of films may have different functions or roles. However, the plurality of films are derived from the film formed as the same layer in the same step, and have the same layer structure and the same material. Therefore, these multiple films are defined as existing in the same layer.
 本明細書において、ある部材又は領域が、他の部材又は領域の「上(又は下)」にあるとする場合、特段の限定がない限り、これは他の部材又は領域の直上(又は直下)にある場合のみでなく、他の部材又は領域の上方(又は下方)にある場合を含み、すなわち、他の部材又は領域の上方(又は下方)において間に別の構成要素が含まれている場合も含む。 In this specification, when one member or area is "above (or below)" another member or area, this is directly above (or just below) the other member or area unless there is a particular limitation. Not only when it is in the region above but also when it is above (or below) other members or areas, that is, when another component is included above (or below) other members or areas Also includes.
 本明細書において、「ある構造体が他の構造体から露出するという」という表現は、ある構造体の一部が他の構造体によって覆われていない態様を意味し、この他の構造体によって覆われていない部分は、さらに別の構造体によって覆われる態様も含む。 In the present specification, the expression “a certain structure is exposed from another structure” means an aspect in which a part of a certain structure is not covered by another structure. The part which is not covered also includes the aspect covered by another structure.
<第1実施形態>
[表示装置の構成]
 図1及び図2を参照し、本実施形態に係る表示装置100の概略構成について説明する。図1は、本実施形態に係る表示装置100の概略構成を示す斜視図である。図2は、本実施形態に係る表示装置100の概略構成を示す平面図である。表示装置100は、第1基板102上に表示領域106が設けられている。表示領域106は複数の画素108がマトリックス状に配列することによって構成されている。表示領域106の上面には封止材として第2基板104が設けられている。第2基板104は、表示領域106を全体的に覆い、表示装置100の境界に位置する境界領域130と、表示領域106と境界領域130の間に位置する周辺領域140とを覆う。第2基板104は、第1基板102と第2基板104とを接着する接着層110によって固定されている。第1基板102に形成された表示領域106は、封止材である第2基板104よって大気に晒されないように封止されている。このような封止構造により画素に設けられる発光素子の劣化を抑制している。尚、第2基板104の固定にあたり、ここでは表示領域106を覆う接着層110を用いる構成で説明したが、この構成に限られるものではなく、例えば表示領域106を囲むように配置されるシール材などによって固定されてもよい。
First Embodiment
[Display device configuration]
The schematic configuration of the display device 100 according to the present embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a perspective view showing a schematic configuration of a display device 100 according to the present embodiment. FIG. 2 is a plan view showing a schematic configuration of the display device 100 according to the present embodiment. In the display device 100, a display area 106 is provided on the first substrate 102. The display area 106 is configured by arranging a plurality of pixels 108 in a matrix. A second substrate 104 is provided on the top surface of the display area 106 as a sealing material. The second substrate 104 entirely covers the display area 106 and covers the boundary area 130 located at the boundary of the display device 100 and the peripheral area 140 located between the display area 106 and the boundary area 130. The second substrate 104 is fixed by an adhesive layer 110 that bonds the first substrate 102 and the second substrate 104. The display area 106 formed in the first substrate 102 is sealed by the second substrate 104 which is a sealing material so as not to be exposed to the air. Deterioration of the light emitting element provided in the pixel is suppressed by such a sealing structure. Note that although the configuration using the adhesive layer 110 covering the display area 106 is described here for fixing the second substrate 104, the present invention is not limited to this configuration. For example, a sealing material disposed to surround the display area 106 It may be fixed by the like.
 第1基板102には、一端部に端子領域114が設けられている。端子領域114は表示領域106の外側の周辺領域140に配置されている。さらに端子領域114は第2基板104の外側に配置されている。第2基板104は、後述するように端子領域114を覆うように第1基板102の略全面に形成した後、端子領域114と重なる部分を除去する。しかしながらこれに限定されず、第2基板104は端子領域114を覆わないように形成されてもよい。端子領域114は、複数の接続端子116によって構成されている。接続端子116は、映像信号を出力する機器や電源などと表示装置100とを接続する配線基板との接点を形成する。このため接続端子116は、外部に露出している。 A terminal region 114 is provided at one end of the first substrate 102. The terminal area 114 is disposed in the peripheral area 140 outside the display area 106. Furthermore, the terminal region 114 is disposed outside the second substrate 104. The second substrate 104 is formed on substantially the entire surface of the first substrate 102 so as to cover the terminal region 114 as described later, and then the portion overlapping the terminal region 114 is removed. However, the present invention is not limited to this, and the second substrate 104 may be formed so as not to cover the terminal area 114. The terminal area 114 is constituted by a plurality of connection terminals 116. The connection terminal 116 forms a contact point with a wiring substrate which connects the display device 100 with a device that outputs a video signal, a power supply, or the like. Therefore, the connection terminal 116 is exposed to the outside.
 第1基板102には端子領域114から入力された映像信号を表示領域106に出力する第1駆動回路111および第2駆動回路112が設けられている。第1駆動回路111と第2駆動回路112とは表示領域106の外側の周辺領域140に配置されている。本実施形態において、第1駆動回路111は第2基板104の内側に、第2駆動回路112は第2基板104の外側に配置されている。第2基板104は、第2駆動回路112を覆うように第1基板102の略全面に形成した後、第2駆動回路112と重なる部分を除去する。しかしながらこれに限定されず、第2基板104は第2駆動回路112を覆わないように形成されてもよい。 The first substrate 102 is provided with a first drive circuit 111 and a second drive circuit 112 for outputting a video signal input from the terminal area 114 to the display area 106. The first drive circuit 111 and the second drive circuit 112 are disposed in the peripheral area 140 outside the display area 106. In the present embodiment, the first drive circuit 111 is disposed inside the second substrate 104, and the second drive circuit 112 is disposed outside the second substrate 104. The second substrate 104 is formed on substantially the entire surface of the first substrate 102 so as to cover the second drive circuit 112, and then the portion overlapping with the second drive circuit 112 is removed. However, the present invention is not limited to this, and the second substrate 104 may be formed so as not to cover the second drive circuit 112.
 表示領域106と、第1駆動回路111及び第2駆動回路112とは、それぞれ配線によって接続される。表示領域106は、画素108以外に走査信号線および映像信号線が設けられている。表示領域106の各画素108は、これらの配線により第1駆動回路111、第2駆動回路112と接続されている。例えば、第1駆動回路111は、走査信号線を介して表示領域106に走査信号を出力する駆動回路であり、第2駆動回路112は映像信号線を介して表示領域106に映像信号を出力する駆動回路である。 The display area 106 and the first drive circuit 111 and the second drive circuit 112 are connected by wiring. The display area 106 is provided with scanning signal lines and video signal lines in addition to the pixels 108. Each pixel 108 in the display area 106 is connected to the first drive circuit 111 and the second drive circuit 112 by these wires. For example, the first drive circuit 111 is a drive circuit that outputs a scan signal to the display area 106 via a scan signal line, and the second drive circuit 112 outputs a video signal to the display area 106 via a video signal line. It is a drive circuit.
 図1及び図2に示すように、本実施形態に係る表示装置100は、第1基板102上に識別子200が設けられている。識別子200は、積層方向(第1基板102の上面と直交する方向)から視認可能である。識別子200は、表示装置100の外周である境界領域130、および表示領域106と境界領域130の間に位置する周辺領域140に配置されている。本実施形態において識別子200は、端子領域114が設けられている一辺と、隣接する他辺とが構成する角部の1つに配置されている。しかしながらこれに限定されず、識別子200は、第1基板102の隣接する2辺が構成する交点付近に配置されればよい。また識別子200の数は特に限定されず、1つ以上であればよい。なお、識別子200の配置および構造については後で詳しく説明する。 As shown in FIGS. 1 and 2, in the display device 100 according to the present embodiment, the identifier 200 is provided on the first substrate 102. The identifier 200 is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). The identifier 200 is arranged in a boundary area 130 which is the outer periphery of the display device 100 and a peripheral area 140 located between the display area 106 and the boundary area 130. In the present embodiment, the identifier 200 is disposed at one of the corner portions formed by one side where the terminal area 114 is provided and the other side adjacent thereto. However, the present invention is not limited to this, and the identifier 200 may be disposed in the vicinity of an intersection point formed by two adjacent sides of the first substrate 102. The number of identifiers 200 is not particularly limited, and may be one or more. The arrangement and structure of the identifier 200 will be described in detail later.
 本実施形態に係る表示装置100は、表示装置100の外周側面の少なくとも一部が炭化されている。すなわち、第1基板102および第2基板104は、表示装置100の外周と一致する側面のすくなくとも一部が炭化されている。さらに表示装置100は、表示装置100の外周側面と接続する境界領域130の少なくとも一部が炭化されている。すなわち、第1基板102および第2基板104は、表示装置100の外周と一致する側面と接続する境界領域130の少なくとも一部が炭化されている。ここで第1基板102の炭化とは第1基板102より炭素原子が多く含まれる状態を示し、第2基板104の炭化とは第2基板104より炭素原子が多く含まれる状態を示す。また、境界領域130表面(側面および上面)の炭化は、表示装置100の外周を構成する有機物いずれかの炭化物が飛散した状態であってもよい。炭化した領域は、黒く着色し、透過率が著しく低下する。 In the display device 100 according to the present embodiment, at least a part of the outer peripheral side surface of the display device 100 is carbonized. That is, at least a part of the side surfaces of the first substrate 102 and the second substrate 104 that are the same as the outer periphery of the display device 100 is carbonized. Furthermore, in the display device 100, at least a part of the boundary region 130 connected to the outer peripheral side surface of the display device 100 is carbonized. That is, in the first substrate 102 and the second substrate 104, at least a part of the boundary region 130 connected to the side surface coinciding with the outer periphery of the display device 100 is carbonized. Here, carbonization of the first substrate 102 indicates a state in which more carbon atoms are contained than the first substrate 102, and carbonization of the second substrate 104 indicates a state in which more carbon atoms are contained than the second substrate 104. Further, carbonization of the surface (side and top surfaces) of the boundary region 130 may be in a state where carbide of any of the organic substances constituting the outer periphery of the display device 100 is scattered. The carbonized area is colored black and the transmittance is significantly reduced.
[画素の構造]
 次に図3を参照し、本実施形態に係る表示装置100の表示領域106の概略構造について説明する。図3は、本実施形態に係る表示領域106の概略構造を示す断面図である。図3は、図2の鎖線A-A´に沿った拡大断面模式図である。図3に示すように、表示領域106に配置される複数の画素108は回路素子を有する。本実施形態において回路素子層は、半導体膜162、ゲート絶縁膜164、ゲート電極166、ソース/ドレイン電極168、170、容量電極172、層間膜174、平坦化膜176、接続電極178、付加容量電極180、付加容量絶縁膜182、隔壁184、画素電極190、EL層192、パッシベーション膜196を含む多層構造を有する。表示領域106の複数の画素108の各々は、駆動トランジスタDRT、保持容量Cs、付加容量Cad、発光素子OLEDを有する。駆動トランジスタDRTは発光素子OLEDの発光を制御する。
[Pixel structure]
Next, with reference to FIG. 3, a schematic structure of the display area 106 of the display device 100 according to the present embodiment will be described. FIG. 3 is a cross-sectional view showing a schematic structure of the display area 106 according to the present embodiment. FIG. 3 is an enlarged schematic cross-sectional view taken along a dashed-dotted line AA ′ in FIG. As shown in FIG. 3, the plurality of pixels 108 disposed in the display area 106 have circuit elements. In this embodiment, the circuit element layer includes the semiconductor film 162, the gate insulating film 164, the gate electrode 166, the source / drain electrodes 168 and 170, the capacitance electrode 172, the interlayer film 174, the flattening film 176, the connection electrode 178, and the additional capacitance electrode. It has a multilayer structure including an additional capacitance insulating film 182, a partition wall 184, a pixel electrode 190, an EL layer 192, and a passivation film 196. Each of the plurality of pixels 108 in the display area 106 has a drive transistor DRT, a storage capacitance Cs, an additional capacitance Cad, and a light emitting element OLED. The driving transistor DRT controls light emission of the light emitting element OLED.
 表示領域106の複数の画素108に含まれる回路素子はアンダーコート160を介し、第1基板102上に設けられる。第1基板102は有機樹脂材料を含むことができる。有機樹脂材料を用いることで第1基板102に可撓性を付与することもできる。有機樹脂材料としては、ポリイミドやポリアミド、ポリエステル、ポリカルボナートなどの高分子が挙げられ、中でも耐熱性の高いポリイミドが好ましい。 Circuit elements included in the plurality of pixels 108 in the display area 106 are provided on the first substrate 102 via the undercoat 160. The first substrate 102 can include an organic resin material. The first substrate 102 can also be provided with flexibility by using an organic resin material. As the organic resin material, polymers such as polyimide, polyamide, polyester, polycarbonate and the like can be mentioned, and among them, polyimide having high heat resistance is preferable.
 アンダーコート160は図3に示すように単層構造を有していてもよく、複数の膜から構成されていてもよい。複数の膜を用いる場合、酸化シリコンを含む膜、窒化シリコンを含む膜、および酸化シリコンを含む膜を含む膜を順次第1基板102上に形成すればよい。 The undercoat 160 may have a single layer structure as shown in FIG. 3 or may be composed of a plurality of films. In the case of using a plurality of films, a film containing silicon oxide, a film containing silicon nitride, and a film containing a film containing silicon oxide may be sequentially formed on the first substrate 102.
 駆動トランジスタDRTは、半導体膜162、ゲート絶縁膜164、ゲート電極166、ソース/ドレイン電極168、170を含む。ゲート絶縁膜164はゲート電極166と半導体膜162によって挟まれる。ゲート電極166は、ゲート絶縁膜164を介して半導体膜162の少なくとも一部と交差するように配置され、半導体膜162のゲート電極166が重なる領域にチャネル領域162aが形成される。半導体膜162はさらに、チャネル領域162aを挟持し、不純物がドープされた低濃度不純物領域162c、およびこれらを挟持し、不純物がドープされたソース/ドレイン領域162bを有する。低濃度不純物領域162cの不純物の濃度は、ソース/ドレイン領域162bのそれよりも低い。図3に示した例では駆動トランジスタDRTはトップゲート型のトランジスタである。しかしながらこれに限定されず、回路素子に含まれるトランジスタの構造はボトムゲート型トランジスタでも良い。また、ソース/ドレイン電極168、170と半導体膜162との上下関係にも制約は無い。 The driving transistor DRT includes a semiconductor film 162, a gate insulating film 164, a gate electrode 166, and source / drain electrodes 168 and 170. The gate insulating film 164 is sandwiched between the gate electrode 166 and the semiconductor film 162. The gate electrode 166 is disposed to intersect at least a part of the semiconductor film 162 with the gate insulating film 164 interposed therebetween, and a channel region 162 a is formed in a region where the gate electrode 166 of the semiconductor film 162 overlaps. The semiconductor film 162 further includes a channel region 162a, a low concentration impurity region 162c doped with an impurity, and a source / drain region 162b doped with an impurity. The impurity concentration of the low concentration impurity region 162c is lower than that of the source / drain region 162b. In the example shown in FIG. 3, the drive transistor DRT is a top gate type transistor. However, the present invention is not limited to this, and the structure of the transistor included in the circuit element may be a bottom gate transistor. In addition, the upper / lower relationship between the source / drain electrodes 168 and 170 and the semiconductor film 162 is not limited.
 ゲート絶縁膜164を介し、ゲート電極166と同一の層に存在する容量電極172が一方のソース/ドレイン領域162bと重なるように設けられる。ゲート電極166、容量電極172の上には層間膜174が設けられる。層間膜174とゲート絶縁膜164には、半導体膜162に達する開口が形成され、この開口を覆うようにソース/ドレイン電極168、170が配置される。ソース/ドレイン電極170の一部は、層間膜174を介してソース/ドレイン領域162bの一部と容量電極172と重なり、ソース/ドレイン領域162bの一部、ゲート絶縁膜164の一部、容量電極172、層間膜174、およびソース/ドレイン電極170の一部によって保持容量Csが形成される。 A capacitor electrode 172 present in the same layer as the gate electrode 166 is provided to overlap with one of the source / drain regions 162 b via the gate insulating film 164. An interlayer film 174 is provided on the gate electrode 166 and the capacitor electrode 172. An opening reaching the semiconductor film 162 is formed in the interlayer film 174 and the gate insulating film 164, and source / drain electrodes 168 and 170 are disposed to cover the opening. A part of the source / drain electrode 170 overlaps with a part of the source / drain region 162 b and the capacitor electrode 172 through the interlayer film 174, and a part of the source / drain region 162 b, a part of the gate insulating film 164, a capacitor electrode A storage capacitance Cs is formed by the portion 172, the interlayer film 174, and a part of the source / drain electrode 170.
 駆動トランジスタDRTや保持容量Csの上にはさらに平坦化膜176が設けられる。平坦化膜176は、ソース/ドレイン電極170に達する開口を有し、この開口と平坦化膜176の上面の一部を覆う接続電極178がソース/ドレイン電極170と接するように設けられる。平坦化膜176上にはさらに付加容量電極180が設けられる。接続電極178や付加容量電極180は同時に形成してもよく、異なる材料を有するように異なる工程で形成してもよい。接続電極178や付加容量電極180を同時に形成する場合、接続電極178や付加容量電極180は同一の層に存在し、同一の組成を有する。 A planarization film 176 is further provided on the drive transistor DRT and the storage capacitor Cs. The planarization film 176 has an opening reaching the source / drain electrode 170, and a connection electrode 178 covering the opening and a part of the top surface of the planarization film 176 is provided in contact with the source / drain electrode 170. An additional capacitance electrode 180 is further provided on the planarization film 176. The connection electrode 178 and the additional capacitance electrode 180 may be formed at the same time, or may be formed in different steps so as to have different materials. When the connection electrode 178 and the additional capacitance electrode 180 are simultaneously formed, the connection electrode 178 and the additional capacitance electrode 180 exist in the same layer and have the same composition.
 接続電極178と付加容量電極180を覆うように付加容量絶縁膜182が形成される。付加容量絶縁膜182は、平坦化膜176の開口では接続電極178の一部を覆わず、接続電極178の上面を露出する。これにより、接続電極178を介し、その上に設けられる画素電極190とソース/ドレイン電極170間の電気的接続が可能となる。付加容量絶縁膜182には、その上に設けられる隔壁184と平坦化膜176の接触を許容するための開口186を設けてもよい。接続電極178や開口186の形成は任意である。接続電極178を設けることにより、その後のプロセスにおいてソース/ドレイン電極168の表面の腐食を防止することができ、ソース/ドレイン電極168のコンタクト抵抗の増大を防止することができる。開口186を通して平坦化膜176中の不純物を除去することができ、これによって回路素子や発光素子OLEDの信頼性を向上させることができる。 An additional capacitance insulating film 182 is formed to cover the connection electrode 178 and the additional capacitance electrode 180. The additional capacitance insulating film 182 does not cover a part of the connection electrode 178 at the opening of the planarization film 176, and exposes the upper surface of the connection electrode 178. Thereby, the electrical connection between the pixel electrode 190 and the source / drain electrode 170 provided thereon is enabled via the connection electrode 178. The additional capacitance insulating film 182 may be provided with an opening 186 for permitting contact between the partition 184 provided thereon and the planarizing film 176. The formation of the connection electrode 178 and the opening 186 is optional. By providing the connection electrode 178, corrosion of the surface of the source / drain electrode 168 can be prevented in a subsequent process, and an increase in contact resistance of the source / drain electrode 168 can be prevented. Impurities in the planarization film 176 can be removed through the opening 186, which can improve the reliability of the circuit element and the light emitting element OLED.
 付加容量絶縁膜182上には、接続電極178と付加容量電極180を覆うように、画素電極190が設けられる。付加容量絶縁膜182は付加容量電極180と画素電極190によって挟持され、この構造によって付加容量Cadが形成される。画素電極190は、付加容量Cadと発光素子OLEDによって共有される。 A pixel electrode 190 is provided on the additional capacitance insulating film 182 so as to cover the connection electrode 178 and the additional capacitance electrode 180. The storage capacitor insulating film 182 is sandwiched between the storage capacitor electrode 180 and the pixel electrode 190, and a storage capacitor Cad is formed by this structure. The pixel electrode 190 is shared by the additional capacitance Cad and the light emitting element OLED.
 画素電極190の上には、画素電極190の端部を覆う隔壁184が設けられる。隔壁184により、画素電極190に起因する凹凸が緩和され、この上に設けられる電界発光層(以下、EL層)192や対向電極194の切断を防止することができる。隔壁184と画素電極190を覆うようにEL層192、およびEL層192を覆う対向電極194が設けられる。発光素子OLEDからの発光を画素電極190を通して取り出す場合には、画素電極190は可視光を透過するように構成される。この場合、具体的な材料としてはインジウム-スズ酸化物(ITO)、インジウム-亜鉛酸化物(IZO)などの可視光を透過可能な導電性酸化物が用いられる。一方、発光素子OLEDからの発光を対向電極194を通して取り出す場合には、画素電極190は可視光を反射するように構成される。この場合、画素電極190は銀やアルミニウムなどの可視光の反射率が高い金属を含む。あるいは画素電極190は、導電性酸化物を含む膜と反射率が高い金属を含む膜の積層構造を有してもよい。例えば、導電性酸化物を含む第1の導電膜、銀、アルミニウムなどの金属を含む第2の導電膜、導電性酸化物を含む第3の導電膜の積層構造を採用することができる。 A partition 184 covering the end of the pixel electrode 190 is provided on the pixel electrode 190. By the partition wall 184, unevenness due to the pixel electrode 190 can be alleviated, and cutting of the electroluminescent layer (hereinafter, EL layer) 192 and the counter electrode 194 provided thereon can be prevented. An EL layer 192 and a counter electrode 194 covering the EL layer 192 are provided to cover the partition wall 184 and the pixel electrode 190. When light emitted from the light emitting element OLED is extracted through the pixel electrode 190, the pixel electrode 190 is configured to transmit visible light. In this case, as a specific material, a conductive oxide capable of transmitting visible light such as indium-tin oxide (ITO) or indium-zinc oxide (IZO) is used. On the other hand, when light emitted from the light emitting element OLED is taken out through the counter electrode 194, the pixel electrode 190 is configured to reflect visible light. In this case, the pixel electrode 190 contains a metal such as silver or aluminum having a high reflectance of visible light. Alternatively, the pixel electrode 190 may have a stacked structure of a film containing a conductive oxide and a film containing a metal with high reflectance. For example, a stacked structure of a first conductive film containing a conductive oxide, a second conductive film containing a metal such as silver or aluminum, and a third conductive film containing a conductive oxide can be employed.
 EL層192の構造は任意であり、正孔注入層、正孔輸送層、発光層、電子輸送層、電子注入層、電子ブロッキング層、正孔ブロッキング層、励起子ブロッキング層などの機能層を適宜組み合わせて形成することができる。EL層192の構造はすべての画素108間で同一でもよく、隣接する画素108間で一部の構造が異なってもよい。例えば隣接する画素108間で発光層の構造、あるいは材料が異なり、他の層は同一の構造を有するよう、画素108を構成してもよい。図3では、見やすさを考慮し、代表的な機能層としてホール輸送層192a、発光層192b、電子輸送層192cが示されている。 The structure of the EL layer 192 is arbitrary, and functional layers such as a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, an electron injection layer, an electron blocking layer, a hole blocking layer, an exciton blocking layer, etc. It can be formed in combination. The structure of the EL layer 192 may be the same between all the pixels 108, and some structures may differ between the adjacent pixels 108. For example, the pixels 108 may be configured such that the structure or material of the light emitting layer is different between adjacent pixels 108, and the other layers have the same structure. In FIG. 3, a hole transport layer 192a, a light emitting layer 192b, and an electron transport layer 192c are shown as representative functional layers in consideration of easy viewing.
 発光素子OLEDからの発光を画素電極190を通して取り出す場合には、対向電極194は可視光を反射するように構成される。具体的には、アルミニウム、銀、マグネシウムなどの反射率の高い金属やこれらの合金(例えばマグネシウムと銀の合金)を用いて形成される。一方、発光素子OLEDからの発光を対向電極194を通して取り出す場合には、可視光を透過可能な導電性酸化物を含むように画素電極190が構成される。あるいは、上述した金属や合金を可視光が透過可能な厚さで形成してもよい。この場合、可視光に対して透光性を示す導電性酸化物の膜をさらに形成してもよい。 When light emitted from the light emitting element OLED is extracted through the pixel electrode 190, the counter electrode 194 is configured to reflect visible light. Specifically, it is formed using a metal with high reflectance such as aluminum, silver, magnesium or an alloy thereof (for example, an alloy of magnesium and silver). On the other hand, when light emitted from the light emitting element OLED is extracted through the counter electrode 194, the pixel electrode 190 is configured to include a conductive oxide capable of transmitting visible light. Alternatively, the above-described metal or alloy may be formed to a thickness that allows visible light to be transmitted. In this case, a conductive oxide film showing translucency to visible light may be further formed.
 任意の構成として、対向電極194上にはパッシベーション膜196が配置される。パッシベーション膜196の構造も任意に決定することができ、単層構造、積層構造のいずれを採用してもよい。積層構造を有する場合、例えばケイ素含有無機化合物を含む第1の層196a、樹脂を含む第2の層196b、ケイ素含有無機化合物を含む第1の層196aが順次積層した構造を採用することができる。ケイ素含有無機化合物としては窒化ケイ素や酸化ケイ素が挙げられる。樹脂としてはエポキシ樹脂やアクリル樹脂、ポリエステル、ポリカルボナートなどが挙げられる。 A passivation film 196 is disposed on the counter electrode 194 as an optional configuration. The structure of the passivation film 196 can be arbitrarily determined, and either a single layer structure or a laminated structure may be employed. In the case of having a stacked structure, for example, a structure in which a first layer 196a containing a silicon-containing inorganic compound, a second layer 196b containing a resin, and a first layer 196a containing a silicon-containing inorganic compound can be sequentially stacked can be employed. . Examples of the silicon-containing inorganic compound include silicon nitride and silicon oxide. Examples of the resin include epoxy resin, acrylic resin, polyester, polycarbonate and the like.
 表示領域106および第1駆動回路111を覆うように、接着層110を介して第2基板104が配置される。第2基板104はポリビニルアルコール、ポリエチレンテレフタレートなどの有機樹脂材料を含むことができる。第2基板104は、偏光板及び位相板等の光学フィルムを含む。光学フィルムは、複数の画素108を覆い、第2基板104の外側表面に配置される。光学フィルムは、表示装置100に入射した外光が、画素電極190で反射することによる視認性の劣化を抑制するために配置される。 The second substrate 104 is disposed via the adhesive layer 110 so as to cover the display area 106 and the first drive circuit 111. The second substrate 104 can include an organic resin material such as polyvinyl alcohol or polyethylene terephthalate. The second substrate 104 includes an optical film such as a polarizing plate and a phase plate. The optical film covers the plurality of pixels 108 and is disposed on the outer surface of the second substrate 104. The optical film is disposed in order to suppress deterioration in visibility due to the external light incident on the display device 100 being reflected by the pixel electrode 190.
 任意の構成として、第1基板102の下には第1フィルム、第2基板104の上には第2フィルムが配置されてもよい。第1フィルムおよび第2フィルムの構造は任意に決定することができ、単層構造、積層構造のいずれを採用してもよい。単層構造を有する場合、例えばポリエチレンテレフタレートなどの有機樹脂材料を含むことができる。 As an optional configuration, a first film may be disposed below the first substrate 102, and a second film may be disposed above the second substrate 104. The structure of the first film and the second film can be arbitrarily determined, and either a single layer structure or a laminated structure may be adopted. In the case of having a single-layer structure, for example, an organic resin material such as polyethylene terephthalate can be included.
[多面取り用パネルの構成]
 図4A、図4B及び図5A、図5Bを参照し、本実施形態に係る多面取り用パネル10の概略構成について説明する。図4Aおよび図4Bは、本発明の一実施形態に係る多面取り用パネル10の概略構成を示す図である。図4Aは、本発明の一実施形態に係る多面取り用パネル10を示す平面図である。図4Bは、図4Aの多面取り用パネル10の切断部位120における断面図である。図5Aおよび図5Bは、本発明の一実施形態に係る多面取り用パネル10および表示装置100の概略構成を示す拡大平面図である。図5Aは、図4Aの領域Bの拡大平面図である。図5Bは、図5Aの多面取り用パネル10を個片に切断した後の表示装置100の拡大平面図である。
[Configuration of panel for multiple chamfers]
The schematic configuration of the multiple panel 10 according to the present embodiment will be described with reference to FIGS. 4A, 4B and 5A, 5B. FIG. 4A and FIG. 4B are diagrams showing a schematic configuration of a multiple panel 10 according to an embodiment of the present invention. FIG. 4A is a plan view showing the multiple panel 10 according to one embodiment of the present invention. FIG. 4B is a cross-sectional view of the multi-chamfered panel 10 of FIG. FIG. 5A and FIG. 5B are enlarged plan views showing a schematic configuration of the multiple panel 10 and the display device 100 according to the embodiment of the present invention. 5A is an enlarged plan view of region B of FIG. 4A. 5B is an enlarged plan view of the display device 100 after the panel 10 for multiple chamfers of FIG. 5A is cut into pieces.
 本実施形態において複数の表示装置100の各画素108に含まれる回路素子は、多面取り用第1基板102’上の複数の表示領域106に同時形成される。図4Aにおいて、多面取り用第1基板102’上には4つの表示装置100に対応する4つの表示領域106が配置されている。図4Bにおいて、多面取り用第1基板102’の略全面に、多面取り用第2基板104’が配置されている。多面取り用第1基板102’の略全面は、各回路素子を形成後、封止材である多面取り用第2基板104’によって、表示領域106が大気に晒されないように封止される。しかしながらこれに限定されず、多面取り用第2基板104’は各々の表示装置100の端子領域114を覆わないように形成されてもよい。例えば、図4Aにおいては、上下2つの表示装置100の表示領域106毎に、2つの多面取り用第2基板104’を1つの多面取り用第1基板102’上に配置してもよい。すなわち、各々の表示装置100の端子領域114を露出するように、横方向に隣接する表示装置100毎に多面取り用第2基板104’によって封止してもよい。 In the present embodiment, the circuit elements included in each pixel 108 of the plurality of display devices 100 are simultaneously formed in the plurality of display regions 106 on the first substrate 102 'for multiple chamfering. In FIG. 4A, four display areas 106 corresponding to four display devices 100 are disposed on the first substrate 102 'for multiple chamfers. In FIG. 4B, the second substrate for multiple chamfer 104 'is disposed on substantially the entire surface of the first substrate for multiple chamfer 102'. After forming each circuit element, substantially the entire surface of the first substrate for multiple chamfer 102 ′ is sealed by the second substrate for multiple chamfer 104 ′ as a sealing material so that the display region 106 is not exposed to the air. However, the present invention is not limited to this, and the second substrate for multiple chamfer 104 ′ may be formed so as not to cover the terminal area 114 of each display device 100. For example, in FIG. 4A, two multi-faceted second substrates 104 'may be disposed on one multi-facet first substrate 102' for each of the display regions 106 of the upper and lower two display devices 100. That is, in order to expose the terminal area 114 of each display device 100, the display devices 100 adjacent in the lateral direction may be sealed by the second substrate for multiple chamfers 104 '.
 各々の表示装置100の境界には、切断部位120を配置する。各々の表示装置100は、多面取り用パネル10を切断部位120で切断し、さらに端子領域114を露出することで得ることができる。本実施形態において、各々の表示装置100の周りには余分なスペースが配置されている。すなわち、隣り合う表示装置100の間に切断部位120は2つ配置される。ここで、各々の表示装置100の外側の、2つの切断部位120に挟まれるスペースも周辺領域140とする。しかしながらこれに限定されず、各々の表示装置100は隣接するように配置されてもよい。この場合、隣り合う表示装置100の間に切断部位120は1つ配置される。 The cutting site 120 is disposed at the boundary of each display device 100. Each display device 100 can be obtained by cutting the multi-chamfered panel 10 at the cutting site 120 and further exposing the terminal area 114. In the present embodiment, an extra space is arranged around each display device 100. That is, two cutting portions 120 are disposed between the adjacent display devices 100. Here, the space between the two cutting portions 120 outside the display devices 100 is also referred to as a peripheral area 140. However, the present invention is not limited to this, and the display devices 100 may be arranged adjacent to each other. In this case, one cutting site 120 is disposed between the adjacent display devices 100.
 表示装置100の境界に位置する各切断部位120とその近傍を境界領域130とする。したがって、多面取り用パネル10から切り出した表示装置100の外周側面も境界領域130とする。さらに表示装置100における境界領域130は、切断面となる表示装置100の外周側面だけではなく、切断によって影響を受け得る外周側面近傍を示す。例えば、上述した炭化は、後述する炭酸ガスレーザーによる多面取り用第2基板104’の切断に起因するものであり、このような熱的影響がおよぶ外周側面に接続する領域も境界領域130とする。 Each cut portion 120 located at the boundary of the display device 100 and the vicinity thereof are defined as a boundary region 130. Therefore, the outer peripheral side surface of the display device 100 cut out from the multi-chamfered panel 10 is also set as the boundary region 130. Furthermore, the boundary region 130 in the display device 100 indicates not only the outer peripheral side surface of the display device 100 to be a cut surface but also the vicinity of the outer peripheral side surface that can be affected by cutting. For example, the above-described carbonization is caused by cutting of the second substrate for multiple bevel 104 ′ by the carbon dioxide gas laser described later, and the area connected to the outer peripheral side surface to which such thermal influence is applied is also used as the boundary area 130. .
 多面取り用パネル10から各々の表示装置100を切り出す切断順序は特に限定されず、例えば、多面取り用パネル10を隣接する表示装置100間の周辺領域140内で仮切断して個片化してから、各々の切断部位120を切断することで表示装置100を切り出してもよい。各々の表示装置100の外周に当たる切断部位120を各辺毎に順に切断することで、表示装置100を1つずつ切り出してもよい。また、縦横に直線状に配置される各々の切断部位120毎に表示装置100を2つずつまとめて切り出してもよい。 The cutting order for cutting out each display device 100 from the multi-chamfered panel 10 is not particularly limited. For example, after temporarily cutting and dividing the multi-chamfered panel 10 in the peripheral region 140 between the adjacent display devices 100 The display device 100 may be cut out by cutting each cutting site 120. The display device 100 may be cut out one by one by cutting the cutting portion 120 corresponding to the outer periphery of each display device 100 sequentially for each side. In addition, two display devices 100 may be cut out together for each of the cut portions 120 arranged linearly in the vertical and horizontal directions.
 切断部位120を特定するため、切断部位120の各交点には識別子200が設けられている。本実施形態においては、1つの交点に1つの識別子200が配置されている。識別子200は、切断部位120の交差によって形成される角部の1つに配置されている。図4Aおよび図4Bに示すように、各々の交点において同じ方向に位置する角部に識別子200を配置することで、多面取り用パネル10上の複数の表示装置100には、各々1つの識別子200が配置される。しかしながらこれに限定されず、各々の交点において識別子200を配置する場所は、すべて表示装置100内であってもよく、すべて表示装置100外であってもよい。また、各々の交点における識別子200の数もこれに限定されず、各交点あたり1つ以上であればよい。 In order to identify the cleavage site 120, an identifier 200 is provided at each intersection of the cleavage site 120. In the present embodiment, one identifier 200 is disposed at one intersection point. The identifier 200 is located at one of the corners formed by the intersection of the cutting sites 120. As shown in FIG. 4A and FIG. 4B, by arranging the identifiers 200 at the corners located in the same direction at each intersection point, each of the plurality of display devices 100 on the multi-chamfer panel 10 has one identifier 200 each. Is placed. However, the present invention is not limited to this, and the place where the identifier 200 is arranged at each intersection may be all within the display device 100 or may be all outside the display device 100. Further, the number of identifiers 200 at each intersection is not limited to this, and one or more per intersection may be sufficient.
[識別子の構造]
 図5Aおよび図5Bに示すように、識別子200は、第1識別部210および第2識別部220を有する。第1識別部210は、境界領域130に配置される。第2識別部220は、表示領域106と境界領域130の間に位置する周辺領域140に配置される。本実施形態において、第1識別部210および第2識別部220は接続している。第1識別部210および第2識別部220は、各々、角部を有する。しかしながらこれに限定されず、第1識別部210および第2識別部220は、図9Aおよび図9Bに示すように分離していてもよく、さらに丸みを有していてもよい(図示せず)。本実施形態において、第1識別部210は、切断部位120上には配置されない。しかしながらこれに限定されず、第1識別部210は、切断部位120上に配置されてもよく、図13に示すように切断部位120を跨いで配置されてもよい。本実施形態において、第1識別部210および第2識別部220は、いずれも切断部位120の交差によって形成される1つの角部に配置される。しかしながらこれに限定されず、第1識別部210と第2識別部220とは、図11Aから図11Cに示すように各々、切断部位120の交差によって形成される異なる角部に配置されてもよい。第1識別部210は境界領域130に、第2識別部220は周辺領域140に配置され、各々、独立して2つの切断部位120が形成する交点を決定できる構造であればよい。
[Identifier structure]
As shown in FIGS. 5A and 5B, the identifier 200 has a first identification unit 210 and a second identification unit 220. The first identification unit 210 is disposed in the boundary area 130. The second identification unit 220 is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130. In the present embodiment, the first identification unit 210 and the second identification unit 220 are connected. Each of the first identification unit 210 and the second identification unit 220 has a corner. However, the present invention is not limited to this, and the first identification unit 210 and the second identification unit 220 may be separated as shown in FIGS. 9A and 9B, and may further be rounded (not shown). . In the present embodiment, the first identification unit 210 is not disposed on the cutting site 120. However, the present invention is not limited to this, and the first identification unit 210 may be disposed on the cutting site 120, and may be disposed across the cutting site 120 as shown in FIG. In the present embodiment, the first identification unit 210 and the second identification unit 220 are both disposed at one corner formed by the intersection of the cutting sites 120. However, the present invention is not limited to this, and the first identification unit 210 and the second identification unit 220 may be disposed at different corners formed by the intersection of the cutting portions 120 as illustrated in FIGS. 11A to 11C. . The first identification unit 210 may be disposed in the boundary area 130, and the second identification unit 220 may be disposed in the peripheral area 140, and may have a structure capable of independently determining the intersections formed by the two cutting portions 120.
 図5Bに示すように、多面取り用パネル10から切り出した表示装置100は、境界領域130の少なくとも一部が炭化されている。このため境界領域130に配置される第1識別部210の少なくとも一部は、境界領域130の炭化により視認できない。識別子200は、第1基板102と第2基板104の間に設けられている。第1識別部210の少なくとも一部は、第1識別部210の上に設けられる第2基板104の炭化によって視認できない。ここで表示装置100は個片に切断した後に、例えば端子領域114を露出するため、端子領域114付近の第2基板104が剥離されてもよい。このとき、第1識別部210の少なくとも一部は、第1識別部210の上に設けられる第2基板104を剥離しても、第1基板102の炭化によって視認できない。一方で、表示領域106と境界領域130の間に位置する周辺領域140は炭化されない。このため、周辺領域140に配置される第2識別部220は、積層方向(第1基板102の上面と直交する方向)から視認可能である。 As shown in FIG. 5B, in the display device 100 cut out from the multi-chamfered panel 10, at least a part of the boundary region 130 is carbonized. Therefore, at least a part of the first identification unit 210 disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130. The identifier 200 is provided between the first substrate 102 and the second substrate 104. At least a part of the first identification unit 210 can not be viewed due to the carbonization of the second substrate 104 provided on the first identification unit 210. Here, after the display device 100 is cut into pieces, the second substrate 104 near the terminal region 114 may be peeled off in order to expose the terminal region 114, for example. At this time, even if the second substrate 104 provided on the first identification unit 210 is peeled off, at least a part of the first identification unit 210 can not be viewed visually due to the carbonization of the first substrate 102. On the other hand, the peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220 disposed in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate 102).
 本実施形態において、表示装置100は矩形である。このため、1つの表示装置100は、少なくとも4つの切断部位120を切断することによって多面取り用パネル10から切り出すことができる。識別子200は、4つの切断部位120が形成する4つの交点付近それぞれに配置される。少なくとも4つの識別子200は、4つの交点を決定することで、4つの切断部位120を特定することができる。しかしながらこれに限定されず、表示装置100の形状によって識別子200の数も適宜選択することができる。 In the present embodiment, the display device 100 is rectangular. For this reason, one display device 100 can be cut out from the multi-faceted panel 10 by cutting at least four cutting sites 120. The identifier 200 is disposed near each of the four intersections formed by the four cutting sites 120. The at least four identifiers 200 can identify four cleavage sites 120 by determining four intersection points. However, the present invention is not limited to this, and the number of identifiers 200 can be appropriately selected according to the shape of the display device 100.
 識別子200は、表示領域106に設けられている回路素子層を構成する金属材料の1つで形成されている。すなわち、識別子200は複数の画素の回路素子形成時に形成される。本実施形態において、識別子200は、トランジスタを構成するゲート電極166と同一の層に形成される。しかしながらこれに限定されず、回路素子とは別に識別子200が形成されてもよい。 The identifier 200 is formed of one of the metal materials constituting the circuit element layer provided in the display area 106. That is, the identifier 200 is formed when forming circuit elements of a plurality of pixels. In the present embodiment, the identifier 200 is formed in the same layer as the gate electrode 166 constituting the transistor. However, the present invention is not limited to this, and the identifier 200 may be formed separately from the circuit element.
 本実施形態において、表示装置100の境界領域130は、第1基板102、アンダーコート160、接着層110、第2基板104から構成される。しかしながらこれに限定されず、表示装置100の境界領域130は、第1基板102および第2基板104の間に、さらに表示領域106に設けられている回路素子層を構成する有機樹脂材料または窒化シリコンなどを含んでもよい。このような構成とすることで、表示領域106と境界領域130との間の積層方向における段差を平坦化してもよい。 In the present embodiment, the boundary region 130 of the display device 100 includes the first substrate 102, the undercoat 160, the adhesive layer 110, and the second substrate 104. However, the present invention is not limited to this, and the boundary region 130 of the display device 100 may be an organic resin material or silicon nitride constituting a circuit element layer provided in the display region 106 between the first substrate 102 and the second substrate 104. Etc. may be included. With such a configuration, the step in the stacking direction between the display area 106 and the boundary area 130 may be planarized.
 本実施形態に係る表示装置はこのような識別子200を有することで、多面取り用パネルから個片に切断するときに、第1識別部210の一部が視認できなくなっても第2識別部220を用いて位置検出精度の低下を抑制することができる。 The display device according to the present embodiment having such an identifier 200 enables the second identification unit 220 even when a part of the first identification unit 210 can not be visually recognized when cutting from a multi-faceted panel into individual pieces. Can be used to suppress the decrease in position detection accuracy.
<変形例1>
 図6及び図7Aおよび図7Bを参照し、本変形例に係る多面取り用パネルおよび表示装置の概略構成について説明する。図6は、本発明の一変形例に係る多面取り用パネル10aを示す平面図である。図7Aおよび図7Bは、本発明の一変形例に係る多面取り用パネル10aおよび表示装置100aの概略構成を示す拡大平面図である。図7Aは、図6の領域Cの拡大平面図である。図7Bは、図7Aの多面取り用パネル10aを個片に切断した後の表示装置100aの拡大平面図である。ここで、本変形例に係る多面取り用パネル10aおよび表示装置100aの構成は、識別子200aの数と配置以外、第1実施形態に係る多面取り用パネル10および表示装置100の構成と同様である。このため、第1実施形態と同様である部分は、その詳しい説明を省略する。
<Modification 1>
The schematic configurations of the panel for multiple chamfering and the display device according to the present modification will be described with reference to FIGS. 6 and 7A and 7B. FIG. 6 is a plan view showing a multiple panel 10a according to a modification of the present invention. FIGS. 7A and 7B are enlarged plan views showing schematic configurations of the multiple panel 10a and the display device 100a according to a modification of the present invention. FIG. 7A is an enlarged plan view of the region C of FIG. 7B is an enlarged plan view of the display device 100a after the panel 10a for multiple chamfers of FIG. 7A is cut into pieces. Here, the configurations of the panel for multiple chamfers 10a and the display device 100a according to the present modification are the same as the configurations of the panel for multiple chamfers 10 and the display device 100 according to the first embodiment except for the number and arrangement of the identifiers 200a. . For this reason, the same parts as those of the first embodiment will not be described in detail.
[表示装置の構成]
 図6及び図7Aおよび図7Bに示すように、本変形例に係る表示装置100aは、第1基板102上に識別子200aが4つ設けられている。識別子200aは、積層方向(第1基板102の上面と直交する方向)から視認可能である。識別子200aは、表示装置100aの外周である境界領域130、および表示領域106と境界領域130の間に位置する周辺領域140に配置されている。本変形例において識別子200aは、表示装置100aの外周の一辺と、一辺と隣接する他辺とが構成する角部にそれぞれ配置されている。4つの識別子200aは、表示装置100aの角部に1つずつ配置されている。
[Display device configuration]
As shown in FIGS. 6, 7A and 7B, in the display device 100a according to this modification, four identifiers 200a are provided on the first substrate 102. The identifier 200 a is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). The identifier 200 a is disposed in the boundary area 130 which is the outer periphery of the display device 100 a and the peripheral area 140 located between the display area 106 and the boundary area 130. In the present modification, the identifier 200a is disposed at each corner formed by one side of the outer periphery of the display device 100a and the other side adjacent to one side. The four identifiers 200a are disposed one by one at the corners of the display device 100a.
[多面取り用パネルの構成]
 各々の表示装置100aの境界には、切断部位120を配置する。各々の表示装置100aは、多面取り用パネル10aを切断部位120で切断し、さらに端子領域114を露出することで得ることができる。切断部位120を特定するため、切断部位120の各交点には識別子200aが設けられている。本変形例においては、1つの交点に4つの識別子200aが配置されている。識別子200aは、切断部位120の交差によって形成される4つの角部にそれぞれ配置されている。図6に示すように、多面取り用パネル10a上の複数の表示装置100aには、各々4つの識別子200aが配置される。しかしながらこれに限定されず、各々の交点における識別子200aの数は各交点あたり1つ以上であればよい。
[Configuration of panel for multiple chamfers]
The cutting site 120 is disposed at the boundary of each display device 100a. Each display device 100 a can be obtained by cutting the multiple-chamfered panel 10 a at the cutting portion 120 and further exposing the terminal area 114. In order to specify the cleavage site 120, an identifier 200a is provided at each intersection of the cleavage site 120. In this modification, four identifiers 200a are arranged at one intersection point. The identifiers 200 a are respectively disposed at four corners formed by the intersection of the cutting sites 120. As shown in FIG. 6, four identifiers 200 a are arranged in each of the plurality of display devices 100 a on the multi-chamfer panel 10 a. However, the present invention is not limited to this, and the number of identifiers 200a at each intersection may be one or more per intersection.
[識別子の構造]
 図7Aおよび図7Bに示すように、識別子200aは、第1識別部210aおよび第2識別部220aを有する。第1識別部210aは、境界領域130に配置される。第2識別部220aは、表示領域106と境界領域130の間に位置する周辺領域140に配置される。本変形例において、第1識別部210aおよび第2識別部220aは接続している。
[Identifier structure]
As shown in FIGS. 7A and 7B, the identifier 200a includes a first identification unit 210a and a second identification unit 220a. The first identification unit 210 a is disposed in the boundary area 130. The second identification unit 220 a is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130. In the present modification, the first identification unit 210a and the second identification unit 220a are connected.
 図7Bに示すように、多面取り用パネル10aから切り出した表示装置100aは、境界領域130の少なくとも一部が炭化されている。このため境界領域130に配置される第1識別部210aの少なくとも一部は、境界領域130の炭化により視認できない。表示領域106と境界領域130の間に位置する周辺領域140は炭化されない。このため、周辺領域140に配置される第2識別部220aは、積層方向(第1基板102の上面と直交する方向)から視認可能である。 As shown to FIG. 7B, at least one part of the boundary area 130 is carbonized in the display apparatus 100a cut out from the panel 10a for multiple chamfers. For this reason, at least a part of the first identification unit 210 a disposed in the boundary area 130 can not be visually recognized due to carbonization of the boundary area 130. The peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220a disposed in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate 102).
 本変形例に係る表示装置100aは複数の識別子200aを有することで、多面取り用パネル10aから個片に切断するときに位置検出精度を向上することができ、第1識別部210aの一部が視認できなくなっても第2識別部220aを用いて位置検出精度の低下を抑制することができる。 The display device 100a according to the present modification has a plurality of identifiers 200a, so that the position detection accuracy can be improved when the multiple-chamfered panel 10a is cut into pieces, and a part of the first identification unit 210a Even if it can not be visually recognized, the second identification unit 220a can be used to suppress a decrease in position detection accuracy.
<変形例2>
 図8Aおよび図8Bを参照し、本変形例に係る多面取り用パネルおよび表示装置の概略構成について説明する。図8Aおよび図8Bは、本発明の一変形例に係る多面取り用パネル10bおよび表示装置100bの概略構成を示す拡大平面図である。図8Aは、切断部位120の交点の拡大平面図である。図8Bは、図8Aの多面取り用パネル10bを個片に切断した後の表示装置100bの拡大平面図である。ここで、本変形例に係る多面取り用パネル10bおよび表示装置100bの構成は、識別子200bの形状以外、第1実施形態に係る多面取り用パネル10および表示装置100の構成と同様である。このため、第1実施形態と同様である部分は、その詳しい説明を省略する。
<Modification 2>
The schematic configuration of the panel for multiple chamfers and the display device according to the present modification will be described with reference to FIGS. 8A and 8B. FIG. 8A and FIG. 8B are enlarged plan views showing schematic configurations of the multiple panel 10b and the display device 100b according to a modification of the present invention. FIG. 8A is an enlarged plan view of the intersection of the cutting site 120. FIG. 8B is an enlarged plan view of the display device 100b after the panel 10b for multiple chamfers of FIG. 8A is cut into pieces. Here, the configurations of the panel for multiple chamfers 10b and the display device 100b according to the present modification are the same as the configurations of the panel for multiple chamfers 10 and the display device 100 according to the first embodiment except for the shape of the identifier 200b. For this reason, the same parts as those of the first embodiment will not be described in detail.
[表示装置の構成]
 図8Aおよび図8Bに示すように、本変形例に係る表示装置100bは、第1基板102上に識別子200bが設けられている。識別子200bは、積層方向(第1基板102の上面と直交する方向)から視認可能である。識別子200bは、表示装置100bの外周である境界領域130、および表示領域106と境界領域130の間に位置する周辺領域140に配置されている。本変形例において識別子200bは、端子領域114が設けられている一辺と、隣接する他辺とが構成する角部の1つに配置されている。
[Display device configuration]
As shown in FIGS. 8A and 8B, in the display device 100b according to the present modification, the identifier 200b is provided on the first substrate 102. The identifier 200 b is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). The identifier 200 b is arranged in a boundary area 130 which is the outer periphery of the display device 100 b and a peripheral area 140 located between the display area 106 and the boundary area 130. In the present modification, the identifier 200 b is disposed at one of the corner portions formed by one side where the terminal area 114 is provided and the other side adjacent thereto.
[多面取り用パネルの構成]
 各々の表示装置100bの境界には、切断部位120を配置する。各々の表示装置100bは、多面取り用パネル10bを切断部位120で切断し、さらに端子領域114を露出することで得ることができる。切断部位120を特定するため、切断部位120の各交点には識別子200bが設けられている。本変形例においては、1つの交点に1つの識別子200bが配置されている。識別子200bは、切断部位120の交差によって形成される角部の1つに配置されている。各々の交点において同じ方向に位置する角部に識別子200bを配置することで、多面取り用パネル10b上の複数の表示装置100bには、各々1つの識別子200bが配置される。しかしながらこれに限定されず、各々の交点において識別子200bを配置する場所は、すべて表示装置100b内であってもよく、すべて表示装置100b外であってもよい。また、各々の交点における識別子200bの数もこれに限定されず、各交点あたり1つ以上であればよい。
[Configuration of panel for multiple chamfers]
The cutting site 120 is disposed at the boundary of each display device 100b. Each display device 100 b can be obtained by cutting the multiple-chamfered panel 10 b at the cutting site 120 and further exposing the terminal area 114. In order to specify the cleavage site 120, an identifier 200b is provided at each intersection of the cleavage site 120. In the present modification, one identifier 200 b is disposed at one intersection point. The identifier 200 b is located at one of the corners formed by the intersection of the cutting sites 120. By arranging the identifiers 200b at the corners located in the same direction at each of the intersections, one identifier 200b is arranged in each of the plurality of display devices 100b on the panel for multiple chamfers 10b. However, the present invention is not limited to this, and the place where the identifier 200b is disposed at each intersection may be all within the display device 100b or all outside the display device 100b. Further, the number of identifiers 200b at each intersection is not limited to this, and one or more per intersection may be sufficient.
[識別子の構造]
 図8Aおよび図8Bに示すように、識別子200bは、第1識別部210bおよび第2識別部220bを有する。第1識別部210bは、境界領域130に配置される。第2識別部220bは、表示領域106と境界領域130の間に位置する周辺領域140に配置される。本変形例において、第1識別部210bおよび第2識別部220bは部分的に接続している。別言すると、識別子200bは、第1識別部210bおよび第2識別部220bの間にスペース230bを有し、第1識別部210bおよび第2識別部220bの間が部分的に離間している。すなわち、第2識別部220bは境界領域130と部分的に離間している。
[Identifier structure]
As shown in FIGS. 8A and 8B, the identifier 200b includes a first identification unit 210b and a second identification unit 220b. The first identification unit 210 b is disposed in the boundary area 130. The second identification unit 220 b is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130. In the present modification, the first identification unit 210b and the second identification unit 220b are partially connected. In other words, the identifier 200b has a space 230b between the first identification unit 210b and the second identification unit 220b, and the first identification unit 210b and the second identification unit 220b are partially separated. That is, the second identification unit 220 b is partially separated from the boundary region 130.
 図8Bに示すように、多面取り用パネル10bから切り出した表示装置100bは、境界領域130の少なくとも一部が炭化されている。このため境界領域130に配置される第1識別部210bの少なくとも一部は、境界領域130の炭化により視認できない。表示領域106と境界領域130の間に位置する周辺領域140は炭化されない。このため、周辺領域140に配置される第2識別部220bは、積層方向(第1基板102の上面と直交する方向)から視認可能である。本変形例において第2識別部220bは、境界領域130と部分的に離間している。このため、境界領域130が炭化しても、第2識別部220bの外形を識別しやすく、第2識別部220bの位置をより正確に検出することができる。 As shown to FIG. 8B, at least one part of the boundary area 130 is carbonized about the display apparatus 100b cut out from the panel 10b for multiple chamfers. For this reason, at least a part of the first identification unit 210 b disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130. The peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220b disposed in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate 102). In the present modification, the second identification unit 220 b is partially separated from the boundary region 130. For this reason, even if the boundary region 130 is carbonized, the outer shape of the second identification unit 220b can be easily identified, and the position of the second identification unit 220b can be detected more accurately.
 本変形例に係る表示装置100bは識別子200bの第1識別部210bおよび第2識別部220bが部分的に離間していることで、多面取り用パネル10bから個片に切断するときに位置検出精度をさらに向上することができ、第1識別部210bの一部が視認できなくなっても第2識別部220bを用いて位置検出精度の低下を抑制することができる。 In the display device 100b according to the present modification, the first detection unit 210b and the second detection unit 220b of the identifier 200b are partially separated, so that position detection accuracy is obtained when the multiple-chamfering panel 10b is cut into pieces. Further, even if a part of the first identification unit 210b can not be visually recognized, the second identification unit 220b can be used to suppress a decrease in position detection accuracy.
<変形例3>
 図9Aおよび図9Bを参照し、本変形例に係る多面取り用パネルおよび表示装置の概略構成について説明する。図9Aおよび図9Bは、本発明の一変形例に係る多面取り用パネル10cおよび表示装置100cの概略構成を示す拡大平面図である。図9Aは、切断部位120の交点の拡大平面図である。図9Bは、図9Aの多面取り用パネル10cを個片に切断した後の表示装置100cの拡大平面図である。ここで、本変形例に係る多面取り用パネル10cおよび表示装置100cの構成は、識別子200cの形状以外、第1実施形態に係る多面取り用パネル10および表示装置100の構成と同様である。このため、第1実施形態と同様である部分は、その詳しい説明を省略する。
<Modification 3>
The schematic configuration of the panel for multiple chamfers and the display device according to the present modification will be described with reference to FIGS. 9A and 9B. FIG. 9A and FIG. 9B are enlarged plan views showing schematic configurations of a multiple panel 10c and a display device 100c according to a modification of the present invention. FIG. 9A is an enlarged plan view of the intersection of the cutting site 120. FIG. FIG. 9B is an enlarged plan view of the display device 100c after the panel 10c for multiple chamfers of FIG. 9A is cut into pieces. Here, the configurations of the panel for multiple chamfers 10c and the display device 100c according to the present modification are the same as the configurations of the panel for multiple chamfers 10 and the display device 100 according to the first embodiment except for the shape of the identifier 200c. For this reason, the same parts as those of the first embodiment will not be described in detail.
[表示装置の構成]
 図9Aおよび図9Bに示すように、本変形例に係る表示装置100cは、第1基板102上に識別子200cが設けられている。識別子200cは、積層方向(第1基板102の上面と直交する方向)から視認可能である。識別子200cは、表示装置100cの外周である境界領域130、および表示領域106と境界領域130の間に位置する周辺領域140に配置されている。本変形例において識別子200cは、端子領域114が設けられている一辺と、隣接する他辺とが構成する角部の1つに配置されている。
[Display device configuration]
As shown in FIGS. 9A and 9B, in the display device 100c according to the present modification, the identifier 200c is provided on the first substrate 102. The identifier 200c is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). The identifier 200c is disposed in the boundary area 130 which is the outer periphery of the display device 100c, and in the peripheral area 140 located between the display area 106 and the boundary area 130. In the present variation, the identifier 200c is disposed at one of the corner portions formed by one side where the terminal area 114 is provided and the other side adjacent thereto.
[多面取り用パネルの構成]
 各々の表示装置100cの境界には、切断部位120を配置する。各々の表示装置100cは、多面取り用パネル10cを切断部位120で切断し、さらに端子領域114を露出することで得ることができる。切断部位120を特定するため、切断部位120の各交点には識別子200cが設けられている。本変形例においては、1つの交点に1つの識別子200cが配置されている。識別子200cは、切断部位120の交差によって形成される角部の1つに配置されている。各々の交点において同じ方向に位置する角部に識別子200cを配置することで、多面取り用パネル10c上の複数の表示装置100cには、各々1つの識別子200cが配置される。しかしながらこれに限定されず、各々の交点において識別子200cを配置する場所は、すべて表示装置100c内であってもよく、すべて表示装置100c外であってもよい。また、各々の交点における識別子200cの数もこれに限定されず、各交点あたり1つ以上であればよい。
[Configuration of panel for multiple chamfers]
The cutting site 120 is disposed at the boundary of each display device 100c. Each display device 100c can be obtained by cutting the multiple-chamfered panel 10c at the cutting portion 120 and further exposing the terminal area 114. In order to specify the cleavage site 120, an identifier 200c is provided at each intersection of the cleavage site 120. In this modification, one identifier 200c is disposed at one intersection point. The identifier 200 c is located at one of the corners formed by the intersection of the cutting sites 120. By arranging the identifiers 200c at the corners located in the same direction at each of the intersections, one identifier 200c is arranged in each of the plurality of display devices 100c on the panel for multiple chamfers 10c. However, the present invention is not limited to this, and the place where the identifier 200c is disposed at each intersection may be all within the display device 100c or may be entirely outside the display device 100c. Further, the number of identifiers 200c at each intersection is not limited to this, and one or more per intersection may be sufficient.
[識別子の構造]
 図9Aおよび図9Bに示すように、識別子200cは、第1識別部210cおよび第2識別部220cを有する。第1識別部210cは、境界領域130に配置される。第2識別部220cは、表示領域106と境界領域130の間に位置する周辺領域140に配置される。本変形例において、第1識別部210cおよび第2識別部220cは分離している。すなわち、識別子200cは、第1識別部210cおよび第2識別部220cの間にスペース230cを有し、第1識別部210cおよび第2識別部220cの間が離間している。
[Identifier structure]
As shown in FIGS. 9A and 9B, the identifier 200c has a first identification unit 210c and a second identification unit 220c. The first identification unit 210 c is disposed in the boundary area 130. The second identification unit 220 c is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130. In the present modification, the first identification unit 210c and the second identification unit 220c are separated. That is, the identifier 200c has a space 230c between the first identification unit 210c and the second identification unit 220c, and the first identification unit 210c and the second identification unit 220c are separated.
 図9Bに示すように、多面取り用パネル10cから切り出した表示装置100cは、境界領域130の少なくとも一部が炭化されている。このため境界領域130に配置される第1識別部210cの少なくとも一部は、境界領域130の炭化により視認できない。表示領域106と境界領域130の間に位置する周辺領域140は炭化されない。このため、周辺領域140に配置される第2識別部220cは、積層方向(第1基板102の上面と直交する方向)から視認可能である。本変形例において第2識別部220cは、境界領域130と離間している。このため、境界領域130が炭化しても、第2識別部220cの外形をより識別しやすく、第2識別部220cの位置をより正確に検出することができる。 As shown in FIG. 9B, in the display device 100c cut out from the multiple-chamfering panel 10c, at least a part of the boundary region 130 is carbonized. For this reason, at least a part of the first identification unit 210 c disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130. The peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220c disposed in the peripheral region 140 is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). In the present modification, the second identification unit 220 c is separated from the boundary region 130. Therefore, even if the boundary region 130 is carbonized, the outer shape of the second identification unit 220c can be more easily identified, and the position of the second identification unit 220c can be detected more accurately.
 本変形例に係る表示装置100cは識別子200cの第1識別部210cおよび第2識別部220cが離間していることで、多面取り用パネル10cから個片に切断するときに位置検出精度をさらに向上することができ、第1識別部210cの一部が視認できなくなっても第2識別部220cを用いて位置検出精度の低下を抑制することができる。 In the display device 100c according to the present modification, the first identification unit 210c and the second identification unit 220c of the identifier 200c are separated, so that the position detection accuracy is further improved when the multiple panels 10c are cut into pieces. Even if a part of the first identification unit 210c can not be visually recognized, the second identification unit 220c can be used to suppress a decrease in position detection accuracy.
<変形例4>
 図10及び図11Aから図11Cを参照し、本変形例に係る多面取り用パネルおよび表示装置の概略構成について説明する。図10は、本発明の一変形例に係る多面取り用パネル10dを示す平面図である。図11Aから図11Cは、本発明の一変形例に係る多面取り用パネル10dおよび表示装置100dの概略構成を示す拡大平面図である。図11Aは、図10の領域Dの拡大平面図である。図11Bおよび図11Cは、図11Aの多面取り用パネル10dを個片に切断した後の表示装置100dの拡大平面図である。ここで、本変形例に係る多面取り用パネル10dおよび表示装置100dの構成は、識別子200dの形状と配置以外、第1実施形態に係る多面取り用パネル10および表示装置100の構成と同様である。このため、第1実施形態と同様である部分は、その詳しい説明を省略する。
<Modification 4>
The schematic configuration of the panel for multiple chamfers and the display device according to the present modification will be described with reference to FIGS. 10 and 11A to 11C. FIG. 10 is a plan view showing a multiple panel 10d according to a modification of the present invention. FIG. 11A to FIG. 11C are enlarged plan views showing schematic configurations of the multiple panel 10d and the display device 100d according to a modification of the present invention. 11A is an enlarged plan view of the region D of FIG. 11B and 11C are enlarged plan views of the display device 100d after the panel 10d for multiple chamfers of FIG. 11A is cut into pieces. Here, the configurations of the panel 10d for multiple chamfering and the display device 100d according to the present modification are the same as the configurations of the panel 10 for multiple chamfering and the display device 100 according to the first embodiment except for the shape and arrangement of the identifier 200d. . For this reason, the same parts as those of the first embodiment will not be described in detail.
[表示装置の構成]
 図10及び図11Aから図11Cに示すように、本変形例に係る表示装置100dは、第1基板102上に識別子200dが設けられている。識別子200dは、積層方向(第1基板102の上面と直交する方向)から視認可能である。識別子200dは、表示装置100dの外周である境界領域130、および表示領域106と境界領域130の間に位置する周辺領域140に配置されている。本変形例において1つの識別子200dは、表示装置100dの2つの角部に分かれて配置されている。
[Display device configuration]
As shown in FIGS. 10 and 11A to 11C, in the display device 100d according to the present modification, an identifier 200d is provided on the first substrate 102. The identifier 200 d is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). The identifier 200 d is disposed in the boundary area 130 which is the outer periphery of the display device 100 d and the peripheral area 140 located between the display area 106 and the boundary area 130. In the present variation, one identifier 200d is divided into two corner portions of the display device 100d.
[多面取り用パネルの構成]
 各々の表示装置100dの境界には、切断部位120を配置する。各々の表示装置100dは、多面取り用パネル10dを切断部位120で切断し、さらに端子領域114を露出することで得ることができる。切断部位120を特定するため、切断部位120の各交点には識別子200dが設けられている。本変形例においては、1つの交点に1つの識別子200dが配置されている。識別子200dは、切断部位120の交差によって形成される4つの角部のうちの2つに分かれて配置されている。各々の交点において同じ方向に位置する角部に識別子200dを配置することで、多面取り用パネル10d上の複数の表示装置100dには、各々1つの識別子200dが配置される。しかしながらこれに限定されず、各々の交点において識別子200dを配置する場所は、すべて表示装置100d内であってもよく、すべて表示装置100b外であってもよい。また、各々の交点における識別子200dの数もこれに限定されず、各交点あたり1つ以上であればよい。
[Configuration of panel for multiple chamfers]
The cutting site 120 is disposed at the boundary of each display device 100d. Each of the display devices 100 d can be obtained by cutting the multiple chamfered panel 10 d at the cutting portion 120 and further exposing the terminal area 114. In order to specify the cleavage site 120, an identifier 200d is provided at each intersection of the cleavage site 120. In this modification, one identifier 200d is disposed at one intersection point. The identifier 200 d is divided into two of the four corners formed by the intersection of the cutting sites 120. By arranging the identifiers 200d at the corners located in the same direction at each of the intersections, one identifier 200d is arranged in each of the plurality of display devices 100d on the panel for multiple chamfers 10d. However, the present invention is not limited to this, and the place where the identifier 200d is disposed at each intersection may be all within the display device 100d or may be entirely outside the display device 100b. Further, the number of the identifiers 200 d at each intersection is not limited to this, and it is sufficient that the number is one or more per intersection.
[識別子の構造]
 図11Aおよび図11Bに示すように、識別子200dは、第1識別部210dおよび第2識別部220dを有する。第1識別部210dは、境界領域130に配置される。第2識別部220dは、表示領域106と境界領域130の間に位置する周辺領域140に配置される。本変形例において、第1識別部210dおよび第2識別部220dは分離している。すなわち、識別子200dは、第1識別部210dおよび第2識別部220dの間が離間している。さらに、第1識別部210dおよび第2識別部220dは異なる角部に分かれて配置されている。
[Identifier structure]
As shown in FIGS. 11A and 11B, the identifier 200d includes a first identification unit 210d and a second identification unit 220d. The first identification unit 210 d is disposed in the boundary area 130. The second identification unit 220 d is disposed in the peripheral area 140 located between the display area 106 and the boundary area 130. In the present modification, the first identification unit 210d and the second identification unit 220d are separated. That is, in the identifier 200d, the first identification unit 210d and the second identification unit 220d are separated. Furthermore, the first identification unit 210d and the second identification unit 220d are separately arranged at different corner portions.
 図11Bに示すように、多面取り用パネル10dから切り出した表示装置100dは、境界領域130の少なくとも一部が炭化されている。このため境界領域130に配置される第1識別部210dの少なくとも一部は、境界領域130の炭化により視認できない。表示領域106と境界領域130の間に位置する周辺領域140は炭化されない。このため、周辺領域140に配置される第2識別部220dは、積層方向(第1基板102の上面と直交する方向)から視認可能である。本変形例において第2識別部220dは、境界領域130と離間している。このため、境界領域130が炭化しても、第2識別部220dの外形をより識別しやすく、第2識別部220dの位置をより正確に検出することができる。 As shown in FIG. 11B, in the display device 100d cut out from the multiple-chamfering panel 10d, at least a part of the boundary region 130 is carbonized. For this reason, at least a part of the first identification unit 210d disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130. The peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. Therefore, the second identification unit 220d disposed in the peripheral region 140 is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). In the present modification, the second identification unit 220 d is separated from the boundary region 130. Therefore, even if the boundary region 130 is carbonized, the outer shape of the second identification unit 220d can be more easily identified, and the position of the second identification unit 220d can be detected more accurately.
 本変形例に係る表示装置100dは、識別子200dの第1識別部210dおよび第2識別部220dが離間していることで、多面取り用パネル10dから個片に切断するときに位置検出精度をさらに向上することができ、第1識別部210dの一部が視認できなくなっても第2識別部220dを用いて位置検出精度の低下を抑制することができる。 In the display device 100d according to the present modification, when the first identification unit 210d and the second identification unit 220d of the identifier 200d are separated, the position detection accuracy is further increased when the multiple panels 10d are cut into pieces. This can be improved, and even if a part of the first identification unit 210d can not be visually recognized, the second identification unit 220d can be used to suppress a decrease in position detection accuracy.
<変形例5>
 図12、図13、図14Aから図14Dを参照し、本変形例に係る多面取り用パネルおよび表示装置の概略構成について説明する。図12は、本発明の一変形例に係る多面取り用パネル10eを示す平面図である。図13は、本発明の一変形例に係る多面取り用パネル10eの概略構成を示す拡大平面図である。図13は、図12の領域Eの拡大平面図である。図14Aから図14Dは、図12の多面取り用パネル10eを個片に切断した後の表示装置100eの拡大平面図である。ここで、本変形例に係る多面取り用パネル10eおよび表示装置100eの構成は、識別子200eの形状と配置以外、第1実施形態に係る多面取り用パネル10および表示装置100の構成と同様である。このため、第1実施形態と同様である部分は、その詳しい説明を省略する。
<Modification 5>
The schematic configuration of the panel for multiple chamfering and the display device according to the present modification will be described with reference to FIGS. 12, 13 and 14A to 14D. FIG. 12 is a plan view showing a multiple panel 10e according to a modification of the present invention. FIG. 13 is an enlarged plan view showing a schematic configuration of a multiple panel 10e according to a modification of the present invention. FIG. 13 is an enlarged plan view of the area E of FIG. 14A to 14D are enlarged plan views of the display device 100e after the panel 10e for multiple chamfers of FIG. 12 is cut into pieces. Here, the configurations of the panel for multiple chamfers 10e and the display device 100e according to the present modification are the same as the configurations of the panel for multiple chamfers 10 and the display device 100 according to the first embodiment except for the shape and arrangement of the identifier 200e. . For this reason, the same parts as those of the first embodiment will not be described in detail.
[表示装置の構成]
 図12、図13、図14Aから図14Dに示すように、本変形例に係る表示装置100eは、第1基板102上に識別子200eが設けられている。識別子200eは、積層方向(第1基板102の上面と直交する方向)から視認可能である。識別子200eは、表示装置100eの外周である境界領域130、および表示領域106と境界領域130の間に位置する周辺領域140に配置されている。本変形例において1つの識別子200eは、表示装置100eの4つの角部に分かれて配置されている。
[Display device configuration]
As shown in FIG. 12, FIG. 13, and FIG. 14A to FIG. 14D, in the display device 100e according to the present modification, the identifier 200e is provided on the first substrate 102. The identifier 200 e is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). The identifier 200 e is disposed in the boundary area 130 which is the outer periphery of the display device 100 e and the peripheral area 140 located between the display area 106 and the boundary area 130. In this modification, one identifier 200e is divided into four corner portions of the display device 100e.
[多面取り用パネルの構成]
 各々の表示装置100eの境界には、切断部位120を配置する。各々の表示装置100eは、多面取り用パネル10eを切断部位120で切断し、さらに端子領域114を露出することで得ることができる。切断部位120を特定するため、切断部位120の各交点には識別子200eが設けられている。本変形例においては、1つの交点に1つの識別子200eが配置されている。識別子200eは、切断部位120の交差によって形成される4つの角部を跨いで配置されている。各々の交点において同じ方向に識別子200eを配置することで、多面取り用パネル10e上の複数の表示装置100eには、各々1つの識別子200eが配置される。しかしながらこれに限定されず、識別子200eの数は各交点あたり1つ以上であればよい。
[Configuration of panel for multiple chamfers]
The cutting site 120 is disposed at the boundary of each display device 100 e. Each display device 100 e can be obtained by cutting the multiple-chamfered panel 10 e at the cutting site 120 and further exposing the terminal area 114. In order to specify the cleavage site 120, an identifier 200e is provided at each intersection of the cleavage site 120. In this modification, one identifier 200e is disposed at one intersection point. The identifier 200 e is disposed across the four corners formed by the intersection of the cutting sites 120. By arranging the identifiers 200e in the same direction at each intersection point, one identifier 200e is arranged in each of the plurality of display devices 100e on the multiple panel 10e. However, the present invention is not limited to this, and the number of identifiers 200e may be one or more per intersection point.
[識別子の構造]
 図13に示すように、識別子200eは、第1識別部210eおよび第2識別部220eを有する。第1識別部210eは、境界領域130に、交点を形成する2つの切断部位120を跨いで配置される。第2識別部220eは、周辺領域140に配置される。本変形例において、第1識別部210eおよび第2識別部220eは分離されている。すなわち、識別子200eは、第1識別部210eおよび第2識別部220eの間が離間している。さらに、第1識別部210eは4つの異なる角部を跨いで配置されている。このため、識別子200eを配置する場所を省スペース化することができる。
[Identifier structure]
As shown in FIG. 13, the identifier 200 e has a first identification unit 210 e and a second identification unit 220 e. The first identification unit 210 e is disposed in the boundary area 130 so as to straddle two cutting sites 120 forming an intersection point. The second identification unit 220 e is disposed in the peripheral area 140. In the present modification, the first identification unit 210e and the second identification unit 220e are separated. That is, in the identifier 200e, the first identification unit 210e and the second identification unit 220e are separated. Furthermore, the first identification unit 210e is disposed across four different corners. For this reason, it is possible to save the space for arranging the identifier 200e.
 図14Aから図14Dに示すように、多面取り用パネル10eから切り出した表示装置100eは、境界領域130の少なくとも一部が炭化されている。このため境界領域130に配置される第1識別部210eの少なくとも一部は、境界領域130の炭化により視認できない。表示領域106と境界領域130の間に位置する周辺領域140は炭化されない。このため、周辺領域140に配置される第2識別部220eは、積層方向(第1基板102の上面と直交する方向)から視認可能である。本変形例において第2識別部220eは、境界領域130と離間している。このため、境界領域130が炭化しても、第2識別部220eの外形をより識別しやすく、第2識別部220eの位置をより正確に検出することができる。 As shown in FIGS. 14A to 14D, at least a part of the boundary region 130 of the display device 100e cut out from the multi-chamfered panel 10e is carbonized. Therefore, at least a part of the first identification unit 210 e disposed in the boundary area 130 can not be viewed due to carbonization of the boundary area 130. The peripheral area 140 located between the display area 106 and the boundary area 130 is not carbonized. For this reason, the second identification unit 220e disposed in the peripheral region 140 is visible from the stacking direction (direction orthogonal to the upper surface of the first substrate 102). In the present modification, the second identification unit 220 e is separated from the boundary region 130. Therefore, even if the boundary region 130 is carbonized, the outer shape of the second identification unit 220e can be more easily identified, and the position of the second identification unit 220e can be detected more accurately.
 本変形例に係る表示装置100eは、識別子200eの第1識別部210eを切断部位120を跨いで配置することで、識別子200eを配置する場所を省スペース化することができる。識別子200eの第1識別部210eおよび第2識別部220eが離間していることで、多面取り用パネル10eから個片に切断するときに位置検出精度をさらに向上することができ、第1識別部210eの一部が視認できなくなっても第2識別部220eを用いて位置検出精度の低下を抑制することができる。 The display device 100e according to the present modification can save the space where the identifier 200e is disposed by arranging the first identification unit 210e of the identifier 200e across the cut portion 120. By separating the first identification unit 210e and the second identification unit 220e of the identifier 200e, it is possible to further improve the position detection accuracy when cutting the panel 10e for multi-chamfering into individual pieces, and the first identification unit Even if a part of 210 e can not be visually recognized, the second identification unit 220 e can be used to suppress a decrease in position detection accuracy.
<第2実施形態>
[表示装置の製造方法]
 本実施形態では、表示装置100の製造方法について、図15Aから図15Cを用いて説明する。なお、多面取り用パネル10の製造方法については、上述した識別子200を形成すること以外、特に限定せず、既存の方法を用いることができる。このため多面取り用パネル10の製造方法については説明を省略し、図15Aから図15Cにおいては多面取り用パネル10を個片に切断し、表示装置100を形成する方法について説明する。
Second Embodiment
[Method of manufacturing display device]
In the present embodiment, a method of manufacturing the display device 100 will be described with reference to FIGS. 15A to 15C. In addition, about the manufacturing method of the panel 10 for multiple chamfers, it does not specifically limit except forming the identifier 200 mentioned above, and the existing method can be used. Therefore, the description of the method of manufacturing the panel 10 for multiple chamfers is omitted, and in FIGS. 15A to 15C, a method for forming the display device 100 by cutting the panel 10 for multiple chamfers into pieces will be described.
 図15Aから図15Cは、本発明の一実施形態に係る製造方法を示す断面図である。本実施形態において、多面取り用パネル10の境界領域130は、多面取り用第1基板102’、アンダーコート160、接着層110、多面取り用第2基板104’から構成される。図15Aに示すように、多面取り用第1基板102’と多面取り用第2基板104’との間には、識別子200が配置されている。多面取り用パネル10の境界領域130には、識別子200の第1識別部210が配置されている。多面取り用パネル10の周辺領域140には、識別子200の第2識別部220が配置されている。識別子200は、積層方向(多面取り用第1基板102’の上面と直交する方向)から視認可能である。 15A to 15C are cross-sectional views showing a manufacturing method according to an embodiment of the present invention. In the present embodiment, the boundary region 130 of the multi-chamfering panel 10 includes the first substrate 102 'for multi-chamfering, the undercoat 160, the adhesive layer 110, and the second substrate 104' for multi-chamfering. As shown in FIG. 15A, an identifier 200 is disposed between the multiple bevel first substrate 102 'and the multiple bevel second substrate 104'. The first identification unit 210 of the identifier 200 is disposed in the boundary area 130 of the multi-chamfering panel 10. A second identification unit 220 of the identifier 200 is disposed in the peripheral area 140 of the multi-chamfered panel 10. The identifier 200 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate for multiple beveling 102 ′).
 図15Bに示すように、切断部位120において多面取り用パネル10を個片に切断するために、多面取り用第2基板104’をレーザーを用いて切断する。まず、識別子200の第1識別部210および第2識別部220を用いて、多面取り用パネル10の多面取り用第1基板102’の位置検出を行う。多面取り用パネル10の多面取り用第1基板102’とレーザーとの位置を合わせ、境界領域130の切断部位120で多面取り用第2基板104’を切断する。多面取り用第2基板104’は偏光板を含む。このため多面取り用第2基板104’の切断には、炭酸ガスレーザーを用いることが好ましい。本実施形態において炭酸ガスレーザーによる多面取り用第2基板104’の切断は、多面取り用第2基板104’、接着層110、およびアンダーコート160を切断する。しかしながらこれに限定されず、多面取り用第1基板102’および多面取り用第2基板104’の間には、さらに表示領域106に設けられている回路素子層を構成する有機樹脂材料または窒化シリコンなどを含んでもよく、これらの層も炭酸ガスレーザーによって切断されてもよい。 As shown in FIG. 15B, in order to cut the multi-chamfering panel 10 into pieces at the cutting site 120, the multi-chamfering second substrate 104 'is cut using a laser. First, using the first identification unit 210 and the second identification unit 220 of the identifier 200, the position detection of the first substrate for multi-chamfering 102 'of the panel 10 for multi-chamfering is performed. The position of the multiple beveling first substrate 102 ′ of the beveling panel 10 and the laser is aligned, and the multiple bevel second substrate 104 ′ is cut at the cutting portion 120 of the boundary region 130. The multi-chamfering second substrate 104 'includes a polarizing plate. For this reason, it is preferable to use a carbon dioxide gas laser for cutting the second substrate for multiple bevel 104 '. In the present embodiment, the cutting of the second substrate for multiple bevel 104 ′ by the carbon dioxide gas laser cuts the second substrate for multiple bevel 104 ′, the adhesive layer 110, and the undercoat 160. However, the present invention is not limited to this, and an organic resin material or silicon nitride constituting a circuit element layer further provided in the display region 106 between the first substrate 102 'for multiple chamfers and the second substrate 104 for multiple chamfers. And the like, and these layers may also be cut by a carbon dioxide gas laser.
 炭酸ガスレーザーは熱を発生する。このため、多面取り用第1基板102’および多面取り用第2基板104’の境界領域130の少なくとも一部は炭酸ガスレーザーの熱的影響を受けて炭化される。炭酸ガスレーザーの影響範囲は、レーザーの照射条件(強度と範囲)に依存する。多面取り用パネル10は、例えば、切断部位120から10μm以上、切断部位120から100μm以下の範囲の領域で炭酸ガスレーザーの熱的影響を受ける。したがって、境界領域130は、切断部位120から10μm以上、切断部位120から100μm以下の範囲の領域で適宜設定することができる。炭酸ガスレーザーによる炭化は、境界領域130を構成するすべての有機物に及び得る。また切断面は、境界領域130を構成する有機物いずれかの炭化物が飛散した状態であってもよい。 A carbon dioxide laser generates heat. For this reason, at least a part of the boundary region 130 of the first substrate 102 'for multiple chamfers and the second substrate 104' for multiple chamfers is carbonized under the thermal influence of the carbon dioxide gas laser. The range of influence of the carbon dioxide gas laser depends on the irradiation conditions (intensity and range) of the laser. For example, the panel 10 with multiple chamfers is thermally affected by a carbon dioxide gas laser in a range of 10 μm or more from the cutting site 120 and 100 μm or less from the cutting site. Therefore, the boundary region 130 can be appropriately set in a range of 10 μm or more from the cutting site 120 and 100 μm or less from the cutting site 120. Carbonization by a carbon dioxide gas laser can extend to all the organic substances constituting the boundary area 130. In addition, the cut surface may be in a state where carbide of any of the organic substances constituting the boundary area 130 is scattered.
 炭酸ガスレーザーによる炭化によって、境界領域130に位置する識別子200の第1識別部210の少なくとも一部は視認できなくなる。周辺領域140に位置する識別子200の第2識別部220は、積層方向(多面取り用第1基板102’の上面と直交する方向)から視認可能である。 By carbonization with a carbon dioxide gas laser, at least a part of the first identification portion 210 of the identifier 200 located in the boundary area 130 becomes invisible. The second identification portion 220 of the identifier 200 located in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the multiple bevel first substrate 102 ′).
 図15Cに示すように、切断部位120において多面取り用パネル10を個片に切断するために、多面取り用第1基板102’をレーザーを用いて切断する。識別子200の第2識別部220を用いて、多面取り用パネル10の多面取り用第1基板102’の位置検出を行う。多面取り用パネル10の多面取り用第1基板102’とレーザーとの位置を合わせ、境界領域130の切断部位120で多面取り用第1基板102’を切断する。本実施形態において、多面取り用第1基板102’はポリイミドを含む。このため多面取り用第1基板102’の切断には、UVレーザーを用いることが好ましい。 As shown in FIG. 15C, in order to cut the multi-chamfering panel 10 into pieces at the cutting site 120, the multi-chamfering first substrate 102 'is cut using a laser. The position detection of the first substrate for multiple chamfer 102 ′ of the panel for multiple chamfers 10 is performed using the second identification unit 220 of the identifier 200. The position of the multiple chamfering first substrate 102 ′ of the multiple chamfering panel 10 and the laser is aligned, and the multiple chamfering first substrate 102 ′ is cut at the cutting portion 120 of the boundary region 130. In the present embodiment, the first substrate for multiple chamfer 102 ′ includes polyimide. For this reason, it is preferable to use a UV laser for cutting the first substrate 102 'for multiple chamfering.
 本実施形態のように、第1識別部210および第2識別部220を含む識別子200を有することで、多面取り用パネルから個片に切断するときに、第1識別部210の一部が視認できなくなっても第2識別部220を用いて位置検出精度の低下を抑制することができる。
<変形例6>
[表示装置の製造方法]
 本実施形態では、表示装置100の製造方法の変形例について、図16Aから図16Cを用いて説明する。ここで、本変形例に係る表示装置100の製造方法は、第1フィルム197および第2フィルム198をさらに切断すること以外、第2実施形態に係る表示装置100の製造方法と同様である。このため、第2実施形態と同様である部分は、その詳しい説明を省略する。
As in the present embodiment, by having the identifier 200 including the first identification unit 210 and the second identification unit 220, a part of the first identification unit 210 is visually recognized when the multi-chamfered panel is cut into pieces. Even if it becomes impossible, the second identification unit 220 can be used to suppress the decrease in position detection accuracy.
<Modification 6>
[Method of manufacturing display device]
In this embodiment, a modification of the method of manufacturing the display device 100 will be described with reference to FIGS. 16A to 16C. Here, the method of manufacturing the display device 100 according to the present modification is the same as the method of manufacturing the display device 100 according to the second embodiment except that the first film 197 and the second film 198 are further cut. For this reason, the same parts as those of the second embodiment will not be described in detail.
 図16Aから図16Cは、本発明の一実施形態に係る製造方法を示す断面図である。本実施形態において、多面取り用パネル10の境界領域130は、第1フィルム197、多面取り用第1基板102’、アンダーコート160、接着層110、多面取り用第2基板104’、第2フィルム198から構成される。図16Aに示すように、多面取り用第1基板102’と多面取り用第2基板104’との間には、識別子200が配置されている。多面取り用パネル10の境界領域130には、識別子200の第1識別部210が配置されている。多面取り用パネル10の周辺領域140には、識別子200の第2識別部220が配置されている。識別子200は、積層方向(多面取り用第1基板102’の上面と直交する方向)から視認可能である。 16A to 16C are cross-sectional views showing a manufacturing method according to an embodiment of the present invention. In the present embodiment, the boundary region 130 of the multi-chamfered panel 10 includes the first film 197, the first multi-chamfered substrate 102 ', the undercoat 160, the adhesive layer 110, the second multi-chamfered substrate 104', and the second film. It consists of 198. As shown in FIG. 16A, an identifier 200 is disposed between the multiple bevel first substrate 102 'and the multiple bevel second substrate 104'. The first identification unit 210 of the identifier 200 is disposed in the boundary area 130 of the multi-chamfering panel 10. A second identification unit 220 of the identifier 200 is disposed in the peripheral area 140 of the multi-chamfered panel 10. The identifier 200 is visible from the stacking direction (the direction orthogonal to the upper surface of the first substrate for multiple beveling 102 ′).
 図16Bに示すように、切断部位120において多面取り用パネル10を個片に切断するために、多面取り用第2基板104’をレーザーを用いて切断する。まず、識別子200の第1識別部210および第2識別部220を用いて、多面取り用パネル10の多面取り用第1基板102’の位置検出を行う。多面取り用パネル10の多面取り用第1基板102’とレーザーとの位置を合わせ、境界領域130の切断部位120で多面取り用第2基板104’を切断する。多面取り用第2基板104’は偏光板を含む。このため多面取り用第2基板104’の切断には、炭酸ガスレーザーを用いることが好ましい。本実施形態において炭酸ガスレーザーによる多面取り用第2基板104’の切断は、第2フィルム198、多面取り用第2基板104’、接着層110、およびアンダーコート160を切断する。しかしながらこれに限定されず、多面取り用第1基板102’および多面取り用第2基板104’の間には、さらに表示領域106に設けられている回路素子層を構成する有機樹脂材料または窒化シリコンなどを含んでもよく、これらの層も炭酸ガスレーザーによって切断されてもよい。 As shown in FIG. 16B, in order to cut the multi-faceted panel 10 into pieces at the cutting site 120, the multiple-face second substrate 104 'is cut using a laser. First, using the first identification unit 210 and the second identification unit 220 of the identifier 200, the position detection of the first substrate for multi-chamfer 102 'of the panel 10 for multi-chamfering is performed. The position of the multiple beveling first substrate 102 ′ of the beveling panel 10 and the laser is aligned, and the multiple bevel second substrate 104 ′ is cut at the cutting portion 120 of the boundary region 130. The multi-chamfering second substrate 104 'includes a polarizing plate. For this reason, it is preferable to use a carbon dioxide gas laser for cutting the second substrate for multiple bevel 104 '. In the present embodiment, the cutting of the second substrate for multiple bevel 104 ′ by the carbon dioxide gas laser cuts the second film 198, the second substrate for multiple bevel 104 ′, the adhesive layer 110, and the undercoat 160. However, the present invention is not limited to this, and an organic resin material or silicon nitride constituting a circuit element layer further provided in the display region 106 between the first substrate 102 'for multiple chamfers and the second substrate 104 for multiple chamfers. And the like, and these layers may also be cut by a carbon dioxide gas laser.
 炭酸ガスレーザーによる炭化によって、境界領域130に位置する識別子200の第1識別部210の少なくとも一部は視認できなくなる。周辺領域140に位置する識別子200の第2識別部220は、積層方向(多面取り用第1基板102’の上面と直交する方向)から視認可能である。 By carbonization with a carbon dioxide gas laser, at least a part of the first identification portion 210 of the identifier 200 located in the boundary area 130 becomes invisible. The second identification portion 220 of the identifier 200 located in the peripheral region 140 is visible from the stacking direction (the direction orthogonal to the upper surface of the multiple bevel first substrate 102 ′).
 図16Cに示すように、切断部位120において多面取り用パネル10を個片に切断するために、多面取り用第1基板102’をレーザーを用いて切断する。識別子200の第2識別部220を用いて、多面取り用パネル10の多面取り用第1基板102’の位置検出を行う。多面取り用パネル10の多面取り用第1基板102’とレーザーとの位置を合わせ、境界領域130の切断部位120で多面取り用第1基板102’を切断する。本実施形態において、多面取り用第1基板102’はポリイミドを含む。このため多面取り用第1基板102’の切断には、UVレーザーを用いることが好ましい。本実施形態においてUVレーザーによる多面取り用第1基板102’の切断は、多面取り用第1基板102’および第1フィルム197を切断する。 As shown in FIG. 16C, in order to cut the multi-chamfering panel 10 into pieces at the cutting site 120, the multi-chamfering first substrate 102 'is cut using a laser. The position detection of the first substrate for multiple chamfer 102 ′ of the panel for multiple chamfers 10 is performed using the second identification unit 220 of the identifier 200. The position of the multiple chamfering first substrate 102 ′ of the multiple chamfering panel 10 and the laser is aligned, and the multiple chamfering first substrate 102 ′ is cut at the cutting portion 120 of the boundary region 130. In the present embodiment, the first substrate for multiple chamfer 102 ′ includes polyimide. For this reason, it is preferable to use a UV laser for cutting the first substrate 102 'for multiple chamfering. In the present embodiment, the cutting of the first substrate for multiple bevel 102 ′ by the UV laser cuts the first substrate for multiple bevel 102 ′ and the first film 197.
 本実施形態のように、第1識別部210および第2識別部220を含む識別子200を有することで、多面取り用パネルから個片に切断するときに、第1識別部210の一部が視認できなくなっても第2識別部220を用いて位置検出精度の低下を抑制することができる。 As in the present embodiment, by having the identifier 200 including the first identification unit 210 and the second identification unit 220, a part of the first identification unit 210 is visually recognized when the multi-chamfered panel is cut into pieces. Even if it becomes impossible, the second identification unit 220 can be used to suppress the decrease in position detection accuracy.
 以上、本発明の好ましい実施形態による表示装置及びその製造方法について説明した。しかし、これらは単なる例示に過ぎず、本発明の技術的範囲はそれらには限定されない。実際、当業者であれば、特許請求の範囲において請求されている本発明の要旨を逸脱することなく、種々の変更が可能であろう。よって、それらの変更も当然に、本発明の技術的範囲に属すると解されるべきである。 The display device according to the preferred embodiment of the present invention and the method of manufacturing the same have been described above. However, these are merely examples, and the technical scope of the present invention is not limited to them. Indeed, various modifications may be made by those skilled in the art without departing from the scope of the invention as claimed in the claims. Therefore, it is to be understood that those modifications are also within the technical scope of the present invention.
多面取り用パネル:10、表示装置:100、第1基板:102、第2基板:104、表示領域:106、画素:108、接着材:110、第1駆動回路:111、第2駆動回路:112、端子領域:114、接続端子:116、切断部位:120、境界領域:130、周辺領域:140、識別子:200、第1識別部:210、第2識別部:220 Panel for multiple bevel: 10, display device: 100, first substrate: 102, second substrate: 104, display region: 106, pixel: 108, adhesive material: 110, first drive circuit: 111, second drive circuit: 112, terminal area: 114, connection terminal: 116, cutting site: 120, boundary area: 130, peripheral area: 140, identifier: 200, first identification unit: 210, second identification unit: 220

Claims (20)

  1.  多面取り用第1基板の上に、表示領域と周辺領域と境界領域とを含む複数の表示装置を形成する表示装置の製造方法において、
     前記表示領域に複数の画素を形成し、
     前記表示装置の境界に位置する前記境界領域に配置される第1識別部と、前記表示領域と前記境界領域の間に位置する前記周辺領域に配置される第2識別部と、を含む識別子を前記多面取り用第1基板の上に形成し、
     前記複数の表示装置に渡って、前記多面取り用第1基板の上に多面取り用第2基板を形成し、
     前記第1識別部を用いてレーザーと前記多面取り用第1基板の位置を合わせ、前記境界領域で前記多面取り用第2基板を切断し、
     前記第2識別部を用いてレーザーと前記多面取り用第1基板の位置を合わせ、前記境界領域で前記多面取り用第1基板を切断すること、を含み、
     前記多面取り用第2基板を切断することは、前記多面取り用第1基板の少なくとも一部を炭化すること、を含む表示装置の製造方法。
    In a method of manufacturing a display device, a plurality of display devices including a display region, a peripheral region, and a boundary region are formed on a first substrate for multiple chamfering,
    Forming a plurality of pixels in the display area;
    An identifier including a first identification unit disposed in the boundary region located at the boundary of the display device, and a second identification unit disposed in the peripheral region located between the display region and the boundary region. Formed on the first substrate for multiple chamfers;
    Forming a second substrate for multiple chamfers on the first substrate for multiple chamfers across the plurality of display devices;
    Aligning the position of the laser and the first substrate for multiple chamfering using the first identification unit, and cutting the second substrate for multiple chamfering at the boundary region,
    Aligning the position of the laser and the first substrate for multiple chamfering using the second identification unit, and cutting the first substrate for multiple chamfering at the boundary region,
    A method of manufacturing a display device, wherein cutting the second substrate for multiple chamfers comprises carbonizing at least a part of the first substrate for multiple substrates.
  2.  前記境界領域の前記多面取り用第1基板の少なくとも一部を炭化することは、前記第1識別部の少なくとも一部を視認不可能にすることを含む、請求項1に記載の表示装置の製造方法。 The manufacturing of the display device according to claim 1, wherein carbonizing at least a part of the first substrate for multiple chamfers in the boundary area includes making at least a part of the first identification portion invisible. Method.
  3.  前記多面取り用第2基板を切断することは、前記境界領域の前記多面取り用第2基板の少なくとも一部を炭化することを含む、請求項1に記載の表示装置の製造方法。 The method of manufacturing a display device according to claim 1, wherein cutting the multiple bevel second substrate includes carbonizing at least a part of the multiple bevel second substrate in the boundary region.
  4.  前記多面取り用第2基板を炭酸ガスレーザーを用いて切断し、前記多面取り用第1基板をUVレーザーを用いて切断する、請求項1に記載の表示装置の製造方法。 The method for manufacturing a display device according to claim 1, wherein the second substrate for multiple beveling is cut using a carbon dioxide gas laser, and the first substrate for multiple beveling is cut using a UV laser.
  5.  前記識別子を複数形成する、請求項1に記載の表示装置の製造方法。 The method for manufacturing a display device according to claim 1, wherein a plurality of the identifiers are formed.
  6.  前記第1識別部と前記第2識別部とを不連続に形成する、請求項1に記載の表示装置の製造方法。 The method according to claim 1, wherein the first identification unit and the second identification unit are formed discontinuously.
  7.  前記識別子を形成することは、
     前記識別子を前記複数の画素の形成時に形成する、請求項1に記載の表示装置の製造方法。
    Forming the identifier is:
    The method for manufacturing a display device according to claim 1, wherein the identifier is formed when forming the plurality of pixels.
  8.  前記画素はトランジスタを含み、
     前記複数の画素を形成することは、
     前記識別子と同一の層に前記トランジスタを構成するゲート電極を形成することを含む、請求項1に記載の表示装置の製造方法。
    The pixel comprises a transistor,
    Forming the plurality of pixels is:
    The method according to claim 1, further comprising forming a gate electrode that configures the transistor in the same layer as the identifier.
  9.  前記多面取り用第1基板は有機樹脂材料で形成される、請求項1に記載の表示装置の製造方法。 The method for manufacturing a display device according to claim 1, wherein the first substrate for multiple beveling is formed of an organic resin material.
  10.  前記多面取り用第2基板は偏光板を含む、請求項1に記載の表示装置の製造方法。 The method for manufacturing a display device according to claim 1, wherein the second substrate for multiple chamfers includes a polarizing plate.
  11.  前記複数の表示装置に渡って前記多面取り用第1基板の下に第1フィルムを形成し、

     前記複数の表示装置に渡って前記多面取り用第2基板の上に第2フィルムを形成すること、をさらに含み、
     前記多面取り用第2基板を切断することは、前記第2フィルムを切断することを含み、
     前記多面取り用第1基板を切断することは、前記第1フィルムを切断することを含む、請求項1に記載の表示装置の製造方法。
    Forming a first film under the multiple beveling first substrate across the plurality of display devices;

    Forming a second film on the second substrate for multi-chamfer over the plurality of display devices;
    Cutting the second substrate for multi-chamfering includes cutting the second film,
    The method of manufacturing a display device according to claim 1, wherein cutting the first substrate for multiple chamfers comprises cutting the first film.
  12.  複数の画素が配置される表示領域と、表示装置の境界に位置する境界領域と、前記表示領域と前記境界領域の間に位置する周辺領域と、を含む第1基板と、
     前記境界領域に配置される第1識別部と、前記周辺領域に配置される第2識別部と、を含む識別子と、
     前記表示領域と前記周辺領域と前記境界領域とに配置される第2基板と、を含み、
     前記境界領域における前記第1基板の少なくとも一部は炭化している表示装置。
    A first substrate including a display area in which a plurality of pixels are arranged, a boundary area located at the boundary of the display device, and a peripheral area located between the display area and the boundary area;
    An identifier including a first identification unit disposed in the boundary area and a second identification unit disposed in the peripheral area;
    A second substrate disposed in the display area, the peripheral area, and the boundary area;
    The display device in which at least a part of the first substrate in the boundary area is carbonized.
  13.  前記第1基板の炭化により、前記第1識別部の少なくとも一部は視認不可能である請求項12に記載の表示装置。 The display device according to claim 12, wherein at least a part of the first identification unit is not visible due to carbonization of the first substrate.
  14.  前記境界領域における前記第2基板の少なくとも一部は炭化している請求項12に記載の表示装置。 The display device according to claim 12, wherein at least a part of the second substrate in the boundary area is carbonized.
  15.  前記識別子は複数配置される、請求項12に記載の表示装置。 The display device according to claim 12, wherein a plurality of the identifiers are arranged.
  16.  前記第1識別部と前記第2識別部とは分離されている、請求項12に記載の表示装置。 The display device according to claim 12, wherein the first identification unit and the second identification unit are separated.
  17.  前記複数の画素はトランジスタを含み、前記識別子と同一の層に前記トランジスタを構成するゲート電極を含む、請求項12に記載の表示装置。 The display device according to claim 12, wherein the plurality of pixels include a transistor, and a gate electrode that configures the transistor in the same layer as the identifier.
  18.  前記第1基板は有機樹脂材料を含む、請求項12に記載の表示装置。 The display device according to claim 12, wherein the first substrate comprises an organic resin material.
  19.  前記第2基板は偏光板を含む、請求項12に記載の表示装置。 The display device of claim 12, wherein the second substrate comprises a polarizer.
  20.  前記第1基板の下に配置される第1フィルムと、
     前記第2基板の上に配置される第2フィルムと、をさらに含む請求項12に記載の表示装置。
    A first film disposed below the first substrate;
    The display device according to claim 12, further comprising: a second film disposed on the second substrate.
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