WO2019128741A1 - Electron transport material and preparation method therefor, and quantum dot light emitting diode - Google Patents

Electron transport material and preparation method therefor, and quantum dot light emitting diode Download PDF

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Publication number
WO2019128741A1
WO2019128741A1 PCT/CN2018/121252 CN2018121252W WO2019128741A1 WO 2019128741 A1 WO2019128741 A1 WO 2019128741A1 CN 2018121252 W CN2018121252 W CN 2018121252W WO 2019128741 A1 WO2019128741 A1 WO 2019128741A1
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Prior art keywords
divalent
salt
doped
zinc oxide
electron transporting
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PCT/CN2018/121252
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French (fr)
Chinese (zh)
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吴龙佳
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Tcl集团股份有限公司
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Publication of WO2019128741A1 publication Critical patent/WO2019128741A1/en
Priority to US16/910,795 priority Critical patent/US11258030B2/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14Carrier transporting layers
    • H10K50/16Electron transporting layers
    • H10K50/165Electron transporting layers comprising dopants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H10K50/115OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising active inorganic nanostructures, e.g. luminescent quantum dots

Definitions

  • the invention belongs to the technical field of materials, and in particular relates to an electron transporting material, a preparation method thereof and a quantum dot light emitting diode.
  • Quantum Dot Light Emitting Diode QLED
  • QLED Quantum Dot Light Emitting Diode
  • a method for preparing an electron transporting material comprises the following steps:
  • Another aspect of the present invention provides a quantum dot light emitting diode comprising an anode, a cathode, and a quantum dot emitting layer between the anode and the cathode, and an electron transport is disposed between the cathode and the quantum dot emitting layer
  • the layer, the electron transport layer is composed of the above-described electron transport material of the present invention.
  • An electron transporting material is prepared on the cathode by the above-described method for producing an electron transporting material of the present invention to form the electron transporting layer.
  • the electron transporting material and the quantum dot light emitting diode of the invention utilize a high-low-value metal ion co-doped zinc oxide material, and the doped zinc oxide material is doped by a low-valent metal ion (divalent metal ion) , significantly increasing the doping limit of high-valent metal ions in the zinc oxide material, thereby significantly improving the electrical conductivity of zinc oxide as an electron transporting material, and finally improving the luminous efficiency of the quantum dot light emitting diode device;
  • the doping of metal ions can be very selective.
  • divalent metal ions that conform to the conditions of easy oxidation and ionic radius and zinc ion can be used, and thus can be specifically used for electron transport materials in practical applications. Requires targeted selection with strong applicability and practicality.
  • the electron transporting material and the method for preparing the quantum dot light emitting diode provided by the invention adopts a partially oxidizable divalent metal ion doped zinc oxide material to be used as an electron transporting material, and the oxidation processing of the electron transporting material is used to obtain a high and low level.
  • the two functions of the conductive property of the zinc electron transporting material significantly save the synthesis cost of the doped zinc oxide nanocolloid solution, and the oxidation treatment process used in the invention is very simple, low in cost, easy to operate, and requires less equipment, and Reproducible.
  • Example 1 is a schematic view showing the structure of a QLED prepared in Example 5 of the present invention.
  • an embodiment of the present invention provides an electron transporting material, wherein the electron transporting material is metal ion doped zinc oxide, and the metal ion is two or three metal ions of different valence states of the same metal element. And the lowest valence state of the metal ion is positive divalent.
  • the electron transporting material provided by the embodiment of the present invention utilizes the same metal element ion co-doped zinc oxide material in a high-price state, and the doped zinc oxide material is doped by a low-valent metal ion (divalent metal ion)
  • the doping limit of the high-valent metal ions in the zinc oxide material is remarkably improved, thereby further improving the conductivity of the zinc oxide electron transporting material, and finally improving the luminous efficiency of the quantum dot light emitting diode device;
  • the valence-doped metal ion can be widely selected, for example, a divalent metal ion which is easy to oxidize and has a ionic radius and a relatively close contact with zinc ions can be used, and thus can be used for an electron-transporting material according to practical applications. Specific requirements for targeted selection, with strong applicability and practicality.
  • Zinc oxide is a semiconductor material having a wurtzite structure.
  • zinc ions are located at the center of a tetrahedron composed of oxygen ions, that is, each zinc ion is surrounded by four oxygen ions to form a coordination. A number of four cations.
  • high-valent metal ions Al 3+ , Ga 3+ , etc.
  • high-valent metal ions replace the Zn 2+ sites, thereby generating free electrons. Increases the electron density, which in turn increases the electrical conductivity of the zinc oxide material. Therefore, this doping method is widely used to improve the electrical conductivity of zinc oxide materials.
  • each doping ion has a doping limit in the host material.
  • the doping amount exceeds the doping limit, excess dopant ions will precipitate from the host material in the form of a second phase, which in turn has an unpredictable effect on the properties of the host material.
  • One of the main factors determining the doping limit is the difference in ionic radius between the bulk ion and the dopant ion: the greater the difference in ionic radius between the two ions, the more the lattice distortion caused by ion doping Severe, the resulting kinetic instability causes the dopant ions to tend to precipitate out of the host material. Since the ionic radius of high-valence doping ions (Al 3+ , Ga 3+ , etc.) commonly used in industry is much smaller than the ionic radius of zinc ions (see Table 1 below), this difference exceeds 20% of the radius of zinc ions. Therefore, the solid solubility of these high-valent ions in the zinc oxide material is very limited.
  • the embodiment of the present invention oxidizes a zinc oxide electron transport material doped with a plurality of specific divalent metal ions, so that some divalent metal ions are oxidized to a higher valence state, thereby forming the same species.
  • the ionic radius of the high-valence metal-doped ions formed after the oxidation treatment is still much smaller than the ionic radius of the zinc ions, the high-valence ion doping is caused by the existence of the low-cost co-doping of the same metal ions.
  • the lattice distortion has become a certain relief, which in turn increases the doping limit of high-valent metal ions in zinc oxide. Therefore, by adjusting the doping percentage of the divalent metal ions and the parameters of the oxidation treatment process, the doping ratio of the high-valent metal ions in the zinc oxide material can be remarkably improved, and finally the zinc oxide electron transporting material having more excellent electrical conductivity can be obtained. .
  • a part of the divalent doped metal ion can be oxidized to a higher valence metal ion by doping the divalent metal element into the zinc oxide nanoparticle and performing heating oxidation.
  • the electron transporting material is zinc oxide co-doped including Fe 3+ and Fe 2+ ; or the electron transporting material is co-doped including Mn 4+ and Mn 2+ Zinc oxide; or the electron transporting material is zinc oxide co-doped with Co 4+ and Co 2+ ; or the electron transporting material is zinc oxide co-doped with Cr 4+ and Cr 2+ .
  • the oxidation of the divalent metal ions is incomplete, possibly producing metal ions in the middle valence state.
  • the electron transporting material is zinc oxide including Mn 4+ and Mn 2+ co-doping, a small amount of Mn 3 is also included.
  • the electron transport material of the present invention include Fe 2+ and Fe 3+ co-doped zinc oxide
  • the molar ratio of Fe 3+ and Fe 2+ is from 20: 1 to 1: 1; preferably 10:1-1:1; more preferably 4:1-5:4; still more preferably 9:5-3:2;
  • Cr 2+ and Cr 4+ molar ratio 20: 1 to 1: 2, preferably 10: 1 to 1: 2 More preferably 3:1-2:3; still more preferably 3:2-2:3;
  • the electron transporting material is zinc oxide co-doped including Mn 4+ and Mn 2+
  • the molar ratio of Mn 4+ to Mn 2+ is 10:1 to 2:3; preferably 5:1-2: 3; more preferably 2:1-1:1; still more preferably 3:2-1:1;
  • the electron transport material include Co 2+ and Co 4+ co-doped zinc oxide
  • the molar ratio of Co 2+ and Co 4+ is 10: 1-2: 3; preferably 5: 1-2: 3; more preferably 2:1-1:1; still more preferably 3:2-1:1.
  • a specific embodiment of the present invention provides a method for preparing an electron transporting material, comprising the following steps:
  • S01 providing a zinc salt and a divalent doped metal salt, dissolving the zinc salt and the divalent doped metal salt in a first solvent, and obtaining a divalent metal ion doped zinc oxide nanometer under alkaline conditions Granular solution;
  • S04 depositing the divalent metal ion doped zinc oxide colloid solution on a substrate and performing an oxidation treatment to obtain the electron transporting material.
  • the method for preparing an electron transporting material utilizes a partially oxidizable divalent metal ion doped zinc oxide material and is made into an electron transporting material, and the same metal element is obtained by oxidizing the electron transporting material.
  • An electron transporting material in which different valence ions are co-doped with zinc oxide the preparation method significantly improves the solid solubility limit of the high-valent metal ion in the zinc oxide material, and further optimizes the electrical conductivity of the zinc oxide electron transporting material, such an electron
  • the transmission material can improve the luminous efficiency and device performance of the QLED device as a whole; in the preparation method, only one metal ion needs to be doped to simultaneously improve the doping limit of the high-valent metal ion in the zinc oxide material and improve the zinc oxide electron.
  • the two functions of the conductive properties of the transmission material significantly save the synthesis cost of the doped zinc oxide nano-colloid solution, and the oxidation treatment process used in the embodiment of the invention is very simple, low in cost, easy to operate, and requires less equipment, and Reproducible.
  • the preparation method can be carried out at room temperature, and is a low temperature solution method, and may be one of a low temperature alcoholysis method, a low temperature hydrolysis method, and the like.
  • the zinc salt is at least one selected from the group consisting of zinc acetate, zinc nitrate, zinc sulfate, zinc chloride, and hydrates of the above various zinc salts;
  • the divalent doped metal salt is at least one selected from the group consisting of a divalent iron salt, a divalent manganese salt, a divalent chromium salt, and a divalent cobalt salt; specifically, the divalent metal salt includes but is not limited to FeSO 4 , FeCl 2 , MnSO 4 , MnCl 2 , Mn(CH 3 COO) 2 , Mn(NO 3 ) 2 , Co(NO 3 ) 2 , Co(CH 3 COO) 2 , CoSO 4 , CoCl 2 , CrCl 2 And one of the above hydrates of various metal salts.
  • the first solvent and the second solvent are independently selected from at least one of water, methanol, ethanol, propanol, butanol, ethylene glycol, ethylene glycol monomethyl ether, and dimethyl sulfoxide (DMSO). ;
  • the temperature at which the alkali solution is added to carry out the reaction is 0-70 ° C; the time for adding the alkali solution to carry out the reaction is 0.5-4 h; specifically, the temperature of the mixed salt solution is first adjusted to 0-70 ° C, and the reaction temperature is selected.
  • the reaction temperature is lower than 0 ° C, the reaction temperature is too low, which will significantly slow down the formation of zinc oxide nanoparticles, and even can not form zinc oxide nanoparticles, but only the hydroxide intermediate; and when the reaction temperature is higher than 70 ° C The obtained nanoparticles have poor dispersibility and agglomeration, which affects the late film formation of the doped zinc oxide colloidal solution. More preferably, the reaction temperature is selected from the range of room temperature to 50 ° C, and the reaction time is selected from 30 min to 4 h to ensure the formation of doped zinc oxide nanoparticles and control the particle size of the nanoparticles.
  • the reaction time is selected to be 1 ⁇ 2h.
  • the alkali liquid is selected from at least one of lithium hydroxide, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide (TMAH), aqueous ammonia, ethanolamine, and ethylenediamine.
  • the ratio of the sum of the amount of the substance of the zinc ion to the amount of the substance of the divalent metal ion and the amount of the substance of the OH - is 1: (1.5 - 2.5) by adding the alkali solution for reaction; to ensure doping Formation of zinc oxide nanoparticles and reduction of reaction by-product formation.
  • the hydroxide ion is too small, the metal salt is relatively excessively excessive, resulting in a large amount of metal salt unable to form doped zinc oxide nanoparticles; when the hydroxide ion is excessive, the excess hydroxide ion and the hydroxide intermediate form a stable The complex cannot be polycondensed to form doped zinc oxide nanoparticles.
  • the ratio of the amount of the substance of the zinc ion to the amount of the substance of the divalent metal ion and the amount of the substance of the OH - is 1: (1.7 - 1.9) and the alkali solution is added to carry out the reaction.
  • a precipitant may be added to the divalent metal ion doped zinc oxide nanoparticle solution to remove the solvent to obtain divalent metal ion doped zinc oxide nanoparticles.
  • the volume ratio of the precipitant to the divalent metal ion doped zinc oxide nanoparticle solution is (2-6):1; that is, the divalent metal ion doped zinc oxide nanoparticle solution after the end of the reaction A precipitant having a volume ratio of (2-6):1 was added thereto and then centrifuged to obtain divalent metal ion-doped zinc oxide nanoparticles.
  • the obtained divalent metal ion doped zinc oxide nanoparticles are redissolved in the first solvent, and the washing process is repeated a plurality of times to remove the reactants that are not involved in the reaction.
  • the finally obtained metal ion doped zinc oxide nanoparticles are dissolved in the second solvent to obtain a divalent metal ion doped zinc oxide colloid solution.
  • the volume ratio of the precipitant to the divalent metal ion doped zinc oxide nanoparticle solution is selected to be (2-6):1 to ensure that no excessive precipitant occurs under the premature precipitation of the doped zinc oxide nanoparticles. Destroy the solubility of doped zinc oxide particles.
  • the volume ratio of the precipitant to the divalent metal ion doped zinc oxide nanoparticle solution is selected to be (3-5): 1;
  • the precipitating agent is selected from the group consisting of ethyl acetate, n-hexane, n-heptane, acetone At least one of them.
  • the molar concentration of Fe 2+ is 7%-27%; the molar concentration of Co 2+ is 4%-23%; the molar concentration of Mn 2+ is 4%-23% The molar concentration of Cr 2+ is 4%-18%.
  • the doping molar concentration of Fe 2+ is 10%-25%; the molar concentration of Co 2+ is 8%-20%; the molar concentration of Mn 2+ is 8%-20% The molar concentration of Cr 2+ is 8%-15%.
  • the key point of the embodiment of the present invention is that after the oxidation treatment of the doped zinc oxide electron transporting material, a sufficient amount of divalent metal ions are preserved to increase the doping limit of the high-valent metal ions in the zinc oxide material, and Sufficient high-valence doping metal ions are formed and doped into the zinc oxide crystal structure.
  • the oxidation treatment time in the oxidation treatment mode is the key to regulating the doping ratio of the high-low-state metal ions in the zinc oxide electron transport material.
  • the oxidation treatment time is too short, the amount of divalent doped metal ions oxidized to high-valent doped metal ions is too small to improve the conductivity of the zinc oxide electron transport material; and when the oxidation treatment time is too long, Excessive high-valence doping metal ions are generated, resulting in too little residual divalent-doped metal ions, which cannot improve the doping limit of high-valent metal ions in zinc oxide, and thus partially generated high-valence metal ions will The form of the second phase is precipitated from the zinc oxide material, which adversely affects the electrical conductivity of the zinc oxide electron transport material.
  • Cr 2+ and Cr 4+ molar ratio 20: 1 to 1: 2, preferably 10: 1 to 1: 2 More preferably 3:1-2:3; still more preferably 3:2-2:3;
  • the electron transporting material is zinc oxide co-doped including Mn 4+ and Mn 2+
  • the molar ratio of Mn 4+ to Mn 2+ is 10:1 to 2:3; preferably 5:1-2: 3; more preferably 2:1-1:1; still more preferably 3:2-1:1;
  • the electron transport material include Co 2+ and Co 4+ co-doped zinc oxide
  • the molar ratio of Co 2+ and Co 4+ is 10: 1-2: 3; preferably 5: 1-2: 3; more preferably 2:1-1:1; still more preferably 3:2-1:1.
  • Embodiments of the present invention also provide a quantum dot light emitting diode comprising an anode, a cathode, and a quantum dot emitting layer between the anode and the cathode, and an electron transport is disposed between the cathode and the quantum dot emitting layer
  • the layer, the electron transport layer is composed of the above-described electron transport material of the embodiment of the present invention.
  • a method for preparing a quantum dot light emitting diode comprising the following steps:
  • An electron transporting material is prepared on the cathode by the above-described method for producing an electron transporting material according to an embodiment of the present invention to form the electron transporting layer.
  • A firstly depositing a doped zinc oxide colloid solution on the cathode substrate, and performing an oxidation treatment to obtain the high-low-value homogenous doped zinc ion electron transport layer of the same metal ion;
  • the substrate in which the functional layers are deposited is placed in a vapor deposition chamber, and a 15-30 nm metal silver or aluminum is thermally evaporated through the mask as an anode, or a nano-Ag wire or a Cu wire is used, which has a small
  • the resistor allows the carriers to be injected smoothly.
  • iron ion doped zinc oxide colloidal solution The synthesis of iron ion doped zinc oxide colloidal solution, the preparation of iron ion doped zinc oxide electron transport material and its oxidation treatment process are described in detail below by taking iron ion doped zinc oxide electron transport material as an example.
  • an appropriate amount of zinc acetate and a ferric salt FeSO 4 were added to 50 ml of a methanol solvent to form a mixed salt solution having a total concentration of 0.1 mol/L, wherein the Fe 2+ molar concentration was 20%.
  • an appropriate amount of potassium hydroxide powder was dissolved in another 50 ml of methanol solvent to form a lye having a concentration of 0.3 mol/L.
  • the mixed salt solution was then heated to 50 ° C, and the potassium hydroxide solution was added dropwise until the molar ratio of hydroxide ions to metal ions was 1.7:1.
  • the mixed solution was further stirred at 50 ° C for 2 hours to obtain a homogeneous transparent solution.
  • a 3:1 volume ratio of ethyl acetate solvent was added to the homogeneous clear solution to produce a large amount of white precipitate in the clear solution.
  • the cloudy solution was centrifuged at 7000 rpm, and the resulting white precipitate was again dissolved in a methanol solvent. This cleaning process is repeated four times.
  • the finally obtained white precipitate was dissolved in an appropriate amount of ethanol solvent to obtain a divalent iron ion-doped zinc oxide colloid solution having a concentration of 30 mg/ml.
  • an appropriate amount of zinc nitrate and a divalent chromium salt CrCl 2 were added to 50 ml of an ethanol solvent to form a mixed salt solution having a total concentration of 0.1 mol/L, wherein the molar concentration of Cr2+ was 15%.
  • an appropriate amount of lithium hydroxide powder was dissolved in another 50 ml of ethanol solvent to form a lye having a concentration of 0.2 mol/L.
  • the mixed salt solution was then heated to 40 ° C and the lithium hydroxide solution was added dropwise until the molar ratio of hydroxide ions to metal ions was 1.9:1.
  • the mixed solution was further stirred at 30 ° C for 1 h to obtain a uniform transparent solution.
  • a 4:1 by volume heptane solvent was added to the homogeneous clear solution to produce a large amount of white precipitate in the clear solution.
  • the cloudy solution was centrifuged at 7000 rpm, and the resulting white precipitate was again dissolved in an ethanol solvent. This cleaning process is repeated four times.
  • the finally obtained white precipitate was dissolved in an appropriate amount of an ethanol solvent to obtain a divalent chromium ion-doped zinc oxide colloidal solution having a concentration of 30 mg/ml.
  • a substrate on which a divalent chromium ion-doped zinc oxide electron transport material is deposited is placed in a muffle furnace.
  • the zinc oxide electron transport material was heated to 200 ° C in an oxygen atmosphere with a purity of 99.5%, and was kept at this temperature for 4 h to obtain a zinc oxide electron transport material co-doped with high-valent chromium ions.
  • an appropriate amount of zinc sulfate and a manganese salt Mn(CH 3 COO) 2 were added to 50 ml of DMSO solvent to form a mixed salt solution having a total concentration of 0.1 mol/L, wherein the molar concentration of Mn 2+ was 15%.
  • an appropriate amount of TMAH powder was dissolved in another 30 ml of ethanol solvent to form a lye having a concentration of 0.3 mol/L.
  • the mixed salt solution was then added dropwise to the TMAH solution at room temperature until the molar ratio of hydroxide ions to metal ions was 1.5:1.
  • the mixed solution was further stirred at room temperature for 2 hours to obtain a uniform transparent solution.
  • a 4:1 volume ratio of ethyl acetate solvent was added to the homogeneous clear solution to produce a large amount of white precipitate in the clear solution.
  • the cloudy solution was centrifuged at 7000 rpm, and the resulting white precipitate was again dissolved in an ethanol solvent. This cleaning process is repeated four times.
  • the finally obtained white precipitate was dissolved in an appropriate amount of an ethanol solvent to obtain a divalent manganese ion-doped zinc oxide colloidal solution having a concentration of 30 mg/ml.
  • a substrate on which a divalent manganese ion-doped zinc oxide electron transport material is deposited is placed in a muffle furnace.
  • the doped zinc oxide electron transport material was heated to 300 ° C in an oxygen atmosphere with a purity of 99.5%, and kept at this temperature for 6 h to obtain a zinc oxide electron transport material co-doped with high-value manganese ions.
  • an appropriate amount of zinc chloride and a divalent cobalt salt Co(NO 3 ) 2 were added to 50 ml of a methanol solvent to form a mixed salt solution having a total concentration of 0.1 mol/L, wherein the molar concentration of Co 2+ was 15%.
  • an appropriate amount of sodium hydroxide powder was dissolved in another 50 ml of methanol solvent to form a lye having a concentration of 0.3 mol/L.
  • the mixed salt solution was then heated to 50 ° C, and the sodium hydroxide solution was added dropwise until the molar ratio of hydroxide ions to metal ions was 1.8:1.
  • the mixed solution was further stirred at 50 ° C for 1 h to obtain a uniform transparent solution.
  • a n: hexane solvent in a volume ratio of 5:1 was added to the homogeneous clear solution to produce a large amount of white precipitate in the clear solution.
  • the cloudy solution was centrifuged at 7000 rpm, and the resulting white precipitate was again dissolved in a methanol solvent. This cleaning process is repeated four times.
  • the finally obtained white precipitate was dissolved in an appropriate amount of an ethanol solvent to obtain a divalent cobalt ion-doped zinc oxide colloid solution having a concentration of 30 mg/ml.
  • the obtained 30 mg/ml divalent cobalt ion doped zinc oxide colloid solution was deposited on the ITO substrate by spin coating.
  • the spin coating speed is 3000 rpm, and the spin coating time is 30 s to control the thickness of the doped zinc oxide electron transport material to be about 50 nm.
  • the method for preparing the QLED device comprises the following steps:
  • A firstly spin-coating a doped zinc oxide electron transport layer on an ITO substrate and oxidizing
  • FIG. 1 is a schematic structural diagram of a QLED device.
  • the QLED device includes a substrate 1, a cathode 2, an electron transport layer 3, a quantum dot light-emitting layer 4, and an empty layer from bottom to top.
  • the material of the substrate 1 is a glass piece
  • the material of the cathode 2 is an ITO substrate
  • the material of the electron transport layer 3 is any high-low-value metal ion co-doped zinc oxide of any of the embodiments 1-4.
  • the material of the hole transport layer 5 is TFB
  • the material of the anode 6 is Al.

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Abstract

An electron transport material and a preparation method therefor, and a quantum dot light emitting diode. The electron transport material is a metal ion doped zinc oxide, the metal ions being two or three metal ions of the same metal element in different valence states, the lowest valence state of the metal lines being positive divalent. The present electron transport material uses ions of the same metal element in high and low valences to co-dope the zinc oxide material, the doping of the zinc oxide material by means of the low valence metal ions obviously increasing the doping limit of the high valence metal ions in the zinc oxide material, significantly improving the electrical conductivity of the zinc oxide electron transport layer and ultimately improving the light emitting efficiency of the device.

Description

电子传输材料及其制备方法和量子点发光二极管Electron transport material, preparation method thereof and quantum dot light emitting diode 技术领域Technical field
本发明属于材料技术领域,具体涉及一种电子传输材料及其制备方法和量子点发光二极管。The invention belongs to the technical field of materials, and in particular relates to an electron transporting material, a preparation method thereof and a quantum dot light emitting diode.
背景技术Background technique
近来,随着显示技术的不断发展,以量子点材料作为发光层的量子点发光二极管(Quantum Dot Light Emitting Diode,QLED)正越来越受到人们的关注,其发光效率高、发光颜色可控、色纯度高、器件稳定性好、可用于柔性用途等特点,使QLED在显示技术、固态照明等领域具有了巨大的应用前景。Recently, with the continuous development of display technology, quantum dot light-emitting diodes using quantum dot materials as light-emitting layers (Quantum Dot) Light Emitting Diode (QLED) is getting more and more people's attention. It has high luminous efficiency, controllable color, high color purity, good device stability, and can be used for flexible applications. QLED is used in display technology, solid-state lighting, etc. The field has great application prospects.
氧化锌作为量子点发光二极管中普遍采用的电子传输层材料,其与阴极和量子点发光层之间具有良好的能级匹配关系,可显著降低电子从阴极到量子点发光层的注入势垒,并且其较深的价带能级又可以起到有效阻挡空穴的功能。此外,氧化锌材料还具有优良的电子传输能力,其电子迁移率高达10 -3 cm 2/V·S。这些特性使氧化锌材料成为量子点发光二极管器件中电子传输层的首先材料,可显著提升器件的稳定性和发光效率。 As the electron transport layer material commonly used in quantum dot light-emitting diodes, zinc oxide has a good energy level matching relationship with the cathode and quantum dot light-emitting layer, which can significantly reduce the injection barrier of electrons from the cathode to the quantum dot light-emitting layer. And its deeper valence band energy level can also function to effectively block holes. In addition, the zinc oxide material has excellent electron transport capability and its electron mobility is as high as 10 -3 cm 2 /V·S. These characteristics make the zinc oxide material the first material of the electron transport layer in the quantum dot light emitting diode device, which can significantly improve the stability and luminous efficiency of the device.
为了进一步提高量子点发光二极管的器件性能,金属离子掺杂氧化锌电子传输层的方式被广泛采用。该方法可以在一定程度上调节氧化锌电子传输层的禁带宽度,优化氧化锌电子传输层的导电率和能级结构,进而提高量子点发光二极管的发光效率。比如,用高价态金属离子,如Al 3+,Ga 3+等,掺杂氧化锌材料,可以提高氧化锌材料的自由载流子密度,得到优良的电导率性能。而为了进一步提高氧化锌材料的电导率,就必须加大掺杂剂的量。然而,由于常用的高价态金属离子与Zn 2+之间存在较大的离子半径差异,这大大限制了高价金属离子在氧化锌中的固溶度,使得氧化锌材料的电导率难以进一步提高。因此,现有技术还有待于改进和发展。 In order to further improve the device performance of the quantum dot light emitting diode, a method in which a metal ion is doped with a zinc oxide electron transport layer is widely used. The method can adjust the forbidden band width of the zinc oxide electron transport layer to a certain extent, optimize the conductivity and energy level structure of the zinc oxide electron transport layer, and thereby improve the luminous efficiency of the quantum dot light emitting diode. For example, doping a zinc oxide material with a high-valent metal ion such as Al 3+ or Ga 3+ can increase the free carrier density of the zinc oxide material and obtain excellent conductivity performance. In order to further increase the electrical conductivity of the zinc oxide material, it is necessary to increase the amount of the dopant. However, due to the large ionic radius difference between the commonly used high-valent metal ions and Zn 2+ , this greatly limits the solid solubility of the high-valent metal ions in the zinc oxide, making it difficult to further improve the electrical conductivity of the zinc oxide material. Therefore, the prior art has yet to be improved and developed.
技术问题technical problem
本发明的目的在于提供一种电子传输材料及其制备方法和量子点发光二极管,旨在解决现有高价态金属离子掺杂氧化锌时其固溶度有限,以致使氧化锌的导电性能难以提高,从而量子点发光二极管的发光效率提高效果不理想的技术问题。The object of the present invention is to provide an electron transporting material, a preparation method thereof and a quantum dot light emitting diode, which aim to solve the problem that the solid solubility of the existing high-valent metal ion doped zinc oxide is limited, so that the conductive property of zinc oxide is difficult to be improved. Therefore, the luminous efficiency of the quantum dot light emitting diode is not satisfactory.
技术解决方案Technical solution
为实现上述发明目的,本发明采用的技术方案如下:In order to achieve the above object, the technical solution adopted by the present invention is as follows:
本发明一方面提供一种电子传输材料,所述电子传输材料为金属离子掺杂的氧化锌,所述金属离子为同一种金属元素的不同价态的两种或三种金属离子,且所述金属离子的最低价态为正二价。An aspect of the invention provides an electron transporting material, which is metal ion doped zinc oxide, the metal ions being two or three metal ions of different valence states of the same metal element, and the The lowest valence state of metal ions is positive divalent.
相应地,一种电子传输材料的制备方法,包括如下步骤:Correspondingly, a method for preparing an electron transporting material comprises the following steps:
提供锌盐和二价掺杂金属盐,将所述锌盐和所述二价掺杂金属盐溶于第一溶剂中,在碱性条件下得到二价金属离子掺杂的氧化锌纳米颗粒;Providing a zinc salt and a divalent doped metal salt, dissolving the zinc salt and the divalent doped metal salt in a first solvent, and obtaining divalent metal ion doped zinc oxide nanoparticles under alkaline conditions;
将所述二价金属离子掺杂的氧化锌纳米颗粒分散于第二溶剂中得二价金属离子掺杂的氧化锌胶体溶液;Dispersing the divalent metal ion doped zinc oxide nanoparticles in a second solvent to obtain a divalent metal ion doped zinc oxide colloid solution;
将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上,进行氧化处理,得金属离子掺杂的所述电子传输材料,所述金属离子为同一种金属元素的不同价态的两种或三种金属离子,且所述金属离子的最低价态为正二价。Depositing the divalent metal ion doped zinc oxide colloid solution on the substrate and performing an oxidation treatment to obtain the electron transporting material doped with metal ions, wherein the metal ions are two different valence states of the same metal element Or three metal ions, and the lowest valence state of the metal ions is positive divalent.
本发明另一方面提供一种量子点发光二极管,包括阳极、阴极以及位于所述阳极和所述阴极之间的量子点发光层,所述阴极和所述量子点发光层之间设置有电子传输层,所述电子传输层由本发明上述电子传输材料组成。Another aspect of the present invention provides a quantum dot light emitting diode comprising an anode, a cathode, and a quantum dot emitting layer between the anode and the cathode, and an electron transport is disposed between the cathode and the quantum dot emitting layer The layer, the electron transport layer, is composed of the above-described electron transport material of the present invention.
相应地,一种量子点发光二极管的制备方法,所述量子点发光二极管为反置型量子点发光二极管,且所述量子点发光二极管包括电子传输层,所述制备方法包括如下步骤:Correspondingly, a method for preparing a quantum dot light emitting diode, wherein the quantum dot light emitting diode is an inverted quantum dot light emitting diode, and the quantum dot light emitting diode comprises an electron transport layer, the preparation method comprising the following steps:
提供基板,所述基板上设置有阴极;Providing a substrate on which a cathode is disposed;
利用本发明的上述电子传输材料的制备方法在所述阴极上制备电子传输材料,形成所述电子传输层。An electron transporting material is prepared on the cathode by the above-described method for producing an electron transporting material of the present invention to form the electron transporting layer.
有益效果Beneficial effect
本发明的电子传输材料和量子点发光二极管,利用高低价态同种金属离子共掺杂氧化锌材料,该掺杂氧化锌材料通过低价态金属离子(二价金属离子)掺杂的存在,显著提升了高价态金属离子在氧化锌材料中的掺杂极限,进而明显改善了氧化锌作为电子传输材料的导电性能,最终提高了量子点发光二极管器件的发光效率;本发明所用的二价掺杂金属离子的可选择性很广,例如,如符合易于氧化以及离子半径与锌离子较为接近这两个条件的二价金属离子都可以使用,因此可根据实际应用中对于电子传输材料的具体要求进行有针对性的选择,具有很强的适用性和实用性。The electron transporting material and the quantum dot light emitting diode of the invention utilize a high-low-value metal ion co-doped zinc oxide material, and the doped zinc oxide material is doped by a low-valent metal ion (divalent metal ion) , significantly increasing the doping limit of high-valent metal ions in the zinc oxide material, thereby significantly improving the electrical conductivity of zinc oxide as an electron transporting material, and finally improving the luminous efficiency of the quantum dot light emitting diode device; The doping of metal ions can be very selective. For example, divalent metal ions that conform to the conditions of easy oxidation and ionic radius and zinc ion can be used, and thus can be specifically used for electron transport materials in practical applications. Requires targeted selection with strong applicability and practicality.
本发明提供的电子传输材料和量子点发光二极管的制备方法,利用部分易氧化的二价金属离子掺杂氧化锌材料制成电子传输材料,通过对该电子传输材料的氧化处理,制得了高低价态同种金属离子共掺杂氧化锌的电子传输材料;该制备方法显著提高了高价态金属离子在氧化锌材料中的固溶度极限,进一步优化了氧化锌作为电子传输材料的导电性能,进而整体提高了量子点发光二极管的发光效率和器件性能;该制备方法中,只需要掺杂一种金属离子即可以同时实现提高了高价态金属离子在氧化锌材料中的掺杂极限以及改善氧化锌电子传输材料的导电性能这两大功能,显著节约了掺杂氧化锌纳米胶体溶液的合成成本,另外本发明所用的氧化处理过程非常简单,成本低廉,易于操作,对设备要求较低,且可重复性好。The electron transporting material and the method for preparing the quantum dot light emitting diode provided by the invention adopts a partially oxidizable divalent metal ion doped zinc oxide material to be used as an electron transporting material, and the oxidation processing of the electron transporting material is used to obtain a high and low level. An electron transporting material in which a valence state of the same metal ion is co-doped with zinc oxide; the preparation method significantly improves the solid solubility limit of the high-valent metal ion in the zinc oxide material, and further optimizes the electrical conductivity of the zinc oxide as an electron transporting material, Furthermore, the luminous efficiency and device performance of the quantum dot light-emitting diode are improved as a whole; in the preparation method, only one metal ion needs to be doped to simultaneously improve the doping limit of the high-valent metal ion in the zinc oxide material and improve oxidation. The two functions of the conductive property of the zinc electron transporting material significantly save the synthesis cost of the doped zinc oxide nanocolloid solution, and the oxidation treatment process used in the invention is very simple, low in cost, easy to operate, and requires less equipment, and Reproducible.
附图说明DRAWINGS
图1为本发明实施例5制备的QLED结构示意图。1 is a schematic view showing the structure of a QLED prepared in Example 5 of the present invention.
本发明的实施方式Embodiments of the invention
为了使本发明要解决的技术问题、技术方案及有益效果更加清楚明白,以下结合附图和实施例,对本发明进行进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。The present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It is understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
一方面,本发明实施例提供了一种电子传输材料,所述电子传输材料为金属离子掺杂的氧化锌,所述金属离子为同一种金属元素的不同价态的两种或三种金属离子,且所述金属离子的最低价态为正二价。In one aspect, an embodiment of the present invention provides an electron transporting material, wherein the electron transporting material is metal ion doped zinc oxide, and the metal ion is two or three metal ions of different valence states of the same metal element. And the lowest valence state of the metal ion is positive divalent.
本发明实施例提供的电子传输材料,利用高低价态的同种金属元素离子共掺杂氧化锌材料,该掺杂氧化锌材料通过低价态金属离子(二价金属离子)掺杂的存在,显著提升了高价态金属离子在氧化锌材料中的掺杂极限,进而明显改善了氧化锌电子传输材料的导电性能,最终提高了量子点发光二极管器件的发光效率;本发明实施例所用的二价掺杂金属离子的可选择性很广,例如,如符合易于氧化以及离子半径与锌离子较为接近这两个条件的二价金属离子都可以使用,因此可根据实际应用中对于电子传输材料的具体要求进行有针对性的选择,具有很强的适用性和实用性。The electron transporting material provided by the embodiment of the present invention utilizes the same metal element ion co-doped zinc oxide material in a high-price state, and the doped zinc oxide material is doped by a low-valent metal ion (divalent metal ion) The doping limit of the high-valent metal ions in the zinc oxide material is remarkably improved, thereby further improving the conductivity of the zinc oxide electron transporting material, and finally improving the luminous efficiency of the quantum dot light emitting diode device; The valence-doped metal ion can be widely selected, for example, a divalent metal ion which is easy to oxidize and has a ionic radius and a relatively close contact with zinc ions can be used, and thus can be used for an electron-transporting material according to practical applications. Specific requirements for targeted selection, with strong applicability and practicality.
氧化锌是具有纤锌矿结构的半导体材料,在氧化锌的结构中,锌离子位于由氧离子构成的四面体的中心,即每个锌离子都被四个氧离子所环绕,构成了配位数为四的阳离子。对于氧化锌材料而言,将高价态金属离子(Al 3+,Ga 3+等)掺杂到氧化锌的纤锌矿结构中,高价态金属离子替代Zn 2+位点,由此产生自由电子,增加了电子密度,进而提高了氧化锌材料的电导率。因此这一掺杂方法被广泛应用于提高氧化锌材料的导电性能方面。理论上而言,高价态离子的掺杂量越大,氧化锌材料的电导率就越高,但实际上,每种掺杂离子在主体材料中都存在有掺杂极限。当掺杂量超过掺杂极限时,过量的掺杂离子将以第二相的形式从主体材料中析出,进而对主体材料的性能产生不可预测的影响。而决定掺杂极限的主要因素之一,就是主体离子和掺杂离子之间的离子半径差异:当两种离子之间的离子半径差异越大时,离子掺杂所引起的晶格畸变就越严重,由此引起的动力学不稳定性会使掺杂离子越趋向于从主体材料中析出。由于工业中常用的高价态掺杂离子(Al 3+,Ga 3+等)的离子半径要远小于锌离子的离子半径(见下表1),这一差值超过了锌离子半径的20%,因此使得这些高价态离子在氧化锌材料中的固溶度都十分有限。 Zinc oxide is a semiconductor material having a wurtzite structure. In the structure of zinc oxide, zinc ions are located at the center of a tetrahedron composed of oxygen ions, that is, each zinc ion is surrounded by four oxygen ions to form a coordination. A number of four cations. For zinc oxide materials, high-valent metal ions (Al 3+ , Ga 3+ , etc.) are doped into the wurtzite structure of zinc oxide, and high-valent metal ions replace the Zn 2+ sites, thereby generating free electrons. Increases the electron density, which in turn increases the electrical conductivity of the zinc oxide material. Therefore, this doping method is widely used to improve the electrical conductivity of zinc oxide materials. Theoretically, the higher the doping amount of high-valent ions, the higher the electrical conductivity of the zinc oxide material, but in fact, each doping ion has a doping limit in the host material. When the doping amount exceeds the doping limit, excess dopant ions will precipitate from the host material in the form of a second phase, which in turn has an unpredictable effect on the properties of the host material. One of the main factors determining the doping limit is the difference in ionic radius between the bulk ion and the dopant ion: the greater the difference in ionic radius between the two ions, the more the lattice distortion caused by ion doping Severe, the resulting kinetic instability causes the dopant ions to tend to precipitate out of the host material. Since the ionic radius of high-valence doping ions (Al 3+ , Ga 3+ , etc.) commonly used in industry is much smaller than the ionic radius of zinc ions (see Table 1 below), this difference exceeds 20% of the radius of zinc ions. Therefore, the solid solubility of these high-valent ions in the zinc oxide material is very limited.
表1Table 1
  Zn2+ Zn2+ Al3+ Al3+ Ga3+ Ga3+ Mn4+ Mn4+ Mn2+ Mn2+  
离子半径(Å) Ion radius (Å) 0.60 0.60 0.39 0.39 0.46 0.46 0.40 0.40 0.68 0.68  
  Fe3+ Fe3+ Fe2+ Fe2+ Cr4+ Cr4+ Cr2+ Cr2+ Co4+ Co4+ Co2+ Co2+
离子半径(Å) Ion radius (Å) 0.49 0.49 0.64 0.64 0.41 0.41 0.71 0.71 0.40 0.40 0.67 0.67
为了解决高价态离子在氧化锌材料中固溶度较小的问题,本发明实施例选用了一些特定的二价金属离子(如Fe 2+、Mn 2+、Cr 2+、Co 2+等)进行氧化锌掺杂。这些二价金属离子有两大特性:一方面,这些离子的离子半径与Zn 2+非常接近并且会比Zn 2+略大一些(见表1),可以大量掺杂进入氧化锌的晶体中而不会析出;另一方面,这些金属离子非常容易被氧化,在氧气的气氛下,只需要相对较低的温度,就可以将这些金属离子氧化到更高的价态。利用这两大特性,本发明实施例将掺杂了大量特定二价金属离子的氧化锌电子传输材料进行氧化处理,使部分二价金属离子被氧化到更高的价态,进而形成了同种金属元素不同价态离子共掺杂的氧化锌电子传输材料。此处,虽然氧化处理后形成的高价态金属掺杂离子的离子半径仍然远小于锌离子的离子半径,但是由于低价共掺杂同种金属离子的存在,使得高价态离子掺杂所引起的晶格畸变得到了一定的缓解,进而提高了高价态金属离子在氧化锌中的掺杂极限。因此,通过调整二价金属离子的掺杂百分比和氧化处理工艺的参数,可以显著提高了高价态金属离子在氧化锌材料中的掺杂比例,最终得到具有更优异导电性能的氧化锌电子传输材料。 In order to solve the problem that the high-valence ions have a small solid solubility in the zinc oxide material, the present invention selects some specific divalent metal ions (such as Fe 2+ , Mn 2+ , Cr 2+ , Co 2+ , etc.). Zinc oxide doping is performed. These divalent metal ions have two major characteristics: on the one hand, the ionic radii of these ions are very close to Zn 2+ and will be slightly larger than Zn 2+ (see Table 1), and can be heavily doped into the crystals of zinc oxide. On the other hand, these metal ions are very easily oxidized, and in an oxygen atmosphere, only relatively low temperatures are required to oxidize these metal ions to a higher valence state. By using these two characteristics, the embodiment of the present invention oxidizes a zinc oxide electron transport material doped with a plurality of specific divalent metal ions, so that some divalent metal ions are oxidized to a higher valence state, thereby forming the same species. A zinc oxide electron transporting material in which metal elements are co-doped with different valence ions. Here, although the ionic radius of the high-valence metal-doped ions formed after the oxidation treatment is still much smaller than the ionic radius of the zinc ions, the high-valence ion doping is caused by the existence of the low-cost co-doping of the same metal ions. The lattice distortion has become a certain relief, which in turn increases the doping limit of high-valent metal ions in zinc oxide. Therefore, by adjusting the doping percentage of the divalent metal ions and the parameters of the oxidation treatment process, the doping ratio of the high-valent metal ions in the zinc oxide material can be remarkably improved, and finally the zinc oxide electron transporting material having more excellent electrical conductivity can be obtained. .
本发明实施例通过将二价金属元素掺杂到氧化锌纳米颗粒中,进行加热氧化,可以将部分二价掺杂金属离子氧化为更高价态金属离子。在本发明优选实施例的电子传输材料中,电子传输材料为包括Fe 3+和Fe 2+共掺杂的氧化锌;或所述电子传输材料为包括Mn 4+和Mn 2+共掺杂的氧化锌;或所述电子传输材料为包括Co 4+和Co 2+共掺杂的氧化锌;或所述电子传输材料为包括Cr 4+和Cr 2+共掺杂的氧化锌。在特定条件下,二价金属离子氧化不完全,可能产生中间价态的金属离子,例如所述电子传输材料为包括Mn 4+和Mn 2+共掺杂的氧化锌时,还包括少量Mn 3+掺杂,即所述电子传输材料为Mn 4+、Mn 2+和Mn 3+共掺杂的氧化锌;所述电子传输材料为包括Co 4+和Co 2+共掺杂的氧化锌时,还包括少量Co 3+掺杂,即所述电子传输材料为Co 4+、Co 2+和Co 3+共掺杂的氧化锌;所述电子传输材料为包括Cr 4+和Cr 2+共掺杂的氧化锌时,还包括少量Cr 3+掺杂,即所述电子传输材料为Cr 4+、Cr 2+和Cr 3+共掺杂的氧化锌。 In the embodiment of the present invention, a part of the divalent doped metal ion can be oxidized to a higher valence metal ion by doping the divalent metal element into the zinc oxide nanoparticle and performing heating oxidation. In the electron transporting material of the preferred embodiment of the present invention, the electron transporting material is zinc oxide co-doped including Fe 3+ and Fe 2+ ; or the electron transporting material is co-doped including Mn 4+ and Mn 2+ Zinc oxide; or the electron transporting material is zinc oxide co-doped with Co 4+ and Co 2+ ; or the electron transporting material is zinc oxide co-doped with Cr 4+ and Cr 2+ . Under certain conditions, the oxidation of the divalent metal ions is incomplete, possibly producing metal ions in the middle valence state. For example, when the electron transporting material is zinc oxide including Mn 4+ and Mn 2+ co-doping, a small amount of Mn 3 is also included. + doping, that is, the electron transporting material is zinc oxide co-doped with Mn 4+ , Mn 2+ and Mn 3+ ; and the electron transporting material is zinc oxide co-doped with Co 4+ and Co 2+ And further comprising a small amount of Co 3+ doping, that is, the electron transporting material is Co 4+ , Co 2+ and Co 3+ co-doped zinc oxide; the electron transporting material comprises Cr 4+ and Cr 2+ When doped zinc oxide, a small amount of Cr 3+ doping is also included, that is, the electron transporting material is Cr 4+ , Cr 2+ and Cr 3+ co-doped zinc oxide.
进一步地,当本发明所述的电子传输材料为包括Fe 3+和Fe 2+共掺杂的氧化锌时,Fe 3+和Fe 2+的摩尔比为20:1-1:1;优选为10:1-1:1;更优选为4:1-5:4;更进一步优选为9:5-3:2; Further, when the electron transport material of the present invention include Fe 2+ and Fe 3+ co-doped zinc oxide, the molar ratio of Fe 3+ and Fe 2+ is from 20: 1 to 1: 1; preferably 10:1-1:1; more preferably 4:1-5:4; still more preferably 9:5-3:2;
当所述电子传输材料为包括Cr 4+和Cr 2+共掺杂的氧化锌时,Cr 4+和Cr 2+的摩尔比20:1-1:2,优选为10:1-1:2;更优选为3:1-2:3;更进一步优选为3:2-2:3; When the electron transport material including Cr 4+ and Cr 2+ co-doped zinc oxide, Cr 2+ and Cr 4+ molar ratio of 20: 1 to 1: 2, preferably 10: 1 to 1: 2 More preferably 3:1-2:3; still more preferably 3:2-2:3;
当所述电子传输材料为包括Mn 4+和Mn 2+共掺杂的氧化锌时,Mn 4+和Mn 2+的摩尔比为10:1-2:3;优选为5:1-2:3;更优选为2:1-1:1;更进一步优选为3:2-1:1; When the electron transporting material is zinc oxide co-doped including Mn 4+ and Mn 2+ , the molar ratio of Mn 4+ to Mn 2+ is 10:1 to 2:3; preferably 5:1-2: 3; more preferably 2:1-1:1; still more preferably 3:2-1:1;
当所述电子传输材料为包括Co 4+和Co 2+共掺杂的氧化锌时,Co 4+和Co 2+的摩尔比为10:1-2:3;优选为5:1-2:3;更优选为2:1-1:1;更进一步优选为3:2-1:1。 When the electron transport material include Co 2+ and Co 4+ co-doped zinc oxide, the molar ratio of Co 2+ and Co 4+ is 10: 1-2: 3; preferably 5: 1-2: 3; more preferably 2:1-1:1; still more preferably 3:2-1:1.
相应地,本发明具体的实施例提供一种电子传输材料的制备方法,包括如下步骤:Correspondingly, a specific embodiment of the present invention provides a method for preparing an electron transporting material, comprising the following steps:
S01:提供锌盐和二价掺杂金属盐,将所述锌盐和所述二价掺杂金属盐溶于第一溶剂中,在碱性条件下得到二价金属离子掺杂的氧化锌纳米颗粒溶液;S01: providing a zinc salt and a divalent doped metal salt, dissolving the zinc salt and the divalent doped metal salt in a first solvent, and obtaining a divalent metal ion doped zinc oxide nanometer under alkaline conditions Granular solution;
S02:去除二价金属离子掺杂的氧化锌纳米颗粒溶液中的溶剂和未反应杂质,得二价金属离子掺杂的氧化锌纳米颗粒;S02: removing solvent and unreacted impurities in the divalent metal ion doped zinc oxide nanoparticle solution to obtain divalent metal ion doped zinc oxide nanoparticles;
S03:将所述二价金属离子掺杂的氧化锌纳米颗粒溶于第二溶剂中得二价金属离子掺杂的氧化锌胶体溶液;S03: dissolving the divalent metal ion doped zinc oxide nanoparticles in a second solvent to obtain a divalent metal ion doped zinc oxide colloid solution;
S04:将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上,进行氧化处理,得所述电子传输材料。S04: depositing the divalent metal ion doped zinc oxide colloid solution on a substrate and performing an oxidation treatment to obtain the electron transporting material.
本发明实施例提供的电子传输材料的制备方法,利用部分易氧化的二价金属离子掺杂氧化锌材料并制成电子传输材料,通过对该电子传输材料的氧化处理,制得了同种金属元素不同价态离子共掺杂氧化锌的电子传输材料;该制备方法显著提高了高价态金属离子在氧化锌材料中的固溶度极限,进一步优化了氧化锌电子传输材料的导电性能,这样的电子传输材料可整体提高QLED器件的发光效率和器件性能;该制备方法中,只需要掺杂一种金属离子即可以同时实现提高高价态金属离子在氧化锌材料中的掺杂极限以及改善氧化锌电子传输材料的导电性能这两大功能,显著节约了掺杂氧化锌纳米胶体溶液的合成成本,另外本发明实施例所用的氧化处理过程非常简单,成本低廉,易于操作,对设备要求较低,且可重复性好。该制备方法可常温进行,是低温溶液法,可以是低温醇解法、低温水解法等中的一种。The method for preparing an electron transporting material provided by the embodiment of the invention utilizes a partially oxidizable divalent metal ion doped zinc oxide material and is made into an electron transporting material, and the same metal element is obtained by oxidizing the electron transporting material. An electron transporting material in which different valence ions are co-doped with zinc oxide; the preparation method significantly improves the solid solubility limit of the high-valent metal ion in the zinc oxide material, and further optimizes the electrical conductivity of the zinc oxide electron transporting material, such an electron The transmission material can improve the luminous efficiency and device performance of the QLED device as a whole; in the preparation method, only one metal ion needs to be doped to simultaneously improve the doping limit of the high-valent metal ion in the zinc oxide material and improve the zinc oxide electron. The two functions of the conductive properties of the transmission material significantly save the synthesis cost of the doped zinc oxide nano-colloid solution, and the oxidation treatment process used in the embodiment of the invention is very simple, low in cost, easy to operate, and requires less equipment, and Reproducible. The preparation method can be carried out at room temperature, and is a low temperature solution method, and may be one of a low temperature alcoholysis method, a low temperature hydrolysis method, and the like.
进一步地,步骤S01中,所述锌盐选自醋酸锌、硝酸锌、硫酸锌和氯化锌及以上各种锌盐的水合物等中的至少一种;Further, in step S01, the zinc salt is at least one selected from the group consisting of zinc acetate, zinc nitrate, zinc sulfate, zinc chloride, and hydrates of the above various zinc salts;
所述二价掺杂金属盐选自二价铁盐、二价锰盐、二价铬盐和二价钴盐中的至少一种;具体地,所述的二价金属盐包括但不局限于FeSO 4、FeCl 2、MnSO 4、MnCl 2、Mn(CH 3COO) 2、Mn(NO 3) 2、Co(NO 3) 2、Co(CH 3COO) 2、CoSO 4、CoCl 2、CrCl 2及以上各种金属盐的水合物等中的一种。 The divalent doped metal salt is at least one selected from the group consisting of a divalent iron salt, a divalent manganese salt, a divalent chromium salt, and a divalent cobalt salt; specifically, the divalent metal salt includes but is not limited to FeSO 4 , FeCl 2 , MnSO 4 , MnCl 2 , Mn(CH 3 COO) 2 , Mn(NO 3 ) 2 , Co(NO 3 ) 2 , Co(CH 3 COO) 2 , CoSO 4 , CoCl 2 , CrCl 2 And one of the above hydrates of various metal salts.
所述第一溶剂和所述第二溶剂独立选自水、甲醇、乙醇、丙醇、丁醇、乙二醇、乙二醇单甲醚和二甲基亚砜(DMSO)中的至少一种;The first solvent and the second solvent are independently selected from at least one of water, methanol, ethanol, propanol, butanol, ethylene glycol, ethylene glycol monomethyl ether, and dimethyl sulfoxide (DMSO). ;
提供锌盐和二价掺杂金属盐,将所述锌盐和所述二价掺杂金属盐溶于第一溶剂中,在碱性条件下得到二价金属离子掺杂的氧化锌纳米颗粒溶液。将锌盐和选定掺杂用的二价金属盐按一定比例在室温下溶解在溶剂中,同时将反应碱在室温下也溶解或者稀释在另一份相同或者不同的溶剂中,得到碱液;向锌盐和二价金属盐的混合溶液中加入碱液反应生成氢氧化物中间体,随后氢氧化物中间体发生缩聚反应逐步生成二价金属离子掺杂的氧化锌纳米粒子。所述加入碱液进行反应的温度为0-70℃;所述加入碱液进行反应的时间为0.5-4h;具体地,先将混合盐溶液的温度调整至0-70℃,反应温度选在0-70℃的范围,以确保掺杂氧化锌纳米粒子的形成和获得良好的颗粒分散性。当反应温度低于0℃时,反应温度过低会显著减缓氧化锌纳米粒子的生成,甚至无法生成氧化锌纳米粒子,而只能得到氢氧化物中间体;而当反应温度高于70℃时,所得纳米粒子的分散性较差,团聚严重,影响掺杂氧化锌胶体溶液的后期成膜。更优选地,反应温度选在室温至50℃范围内,反应时间选为30min-4h,以确保掺杂氧化锌纳米粒子的形成和控制纳米粒子的粒径。当反应时间少于30min时,反应时间过短,掺杂氧化锌纳米粒子形成不充分,并且所得纳米粒子的结晶性较差;而当反应时间超过4h时,过长的颗粒长大时间使生成的纳米粒子过大并且粒径不均匀,影响掺杂氧化锌胶体溶液的后期成膜。更优的,反应时间选为1~2h。所述碱液选自于氢氧化锂、氢氧化钠、氢氧化钾、四甲基氢氧化铵(TMAH)、氨水、乙醇胺和乙二胺中的至少一种。Providing a zinc salt and a divalent doped metal salt, dissolving the zinc salt and the divalent doped metal salt in a first solvent, and obtaining a divalent metal ion doped zinc oxide nanoparticle solution under alkaline conditions . Dissolving the zinc salt and the divalent metal salt for the selected doping in a solvent at a room temperature, and simultaneously dissolving or diluting the reaction base in another identical or different solvent to obtain a lye Adding an alkali solution to the mixed solution of the zinc salt and the divalent metal salt to form a hydroxide intermediate, and then the polycondensation reaction of the hydroxide intermediate gradually forms a divalent metal ion doped zinc oxide nanoparticle. The temperature at which the alkali solution is added to carry out the reaction is 0-70 ° C; the time for adding the alkali solution to carry out the reaction is 0.5-4 h; specifically, the temperature of the mixed salt solution is first adjusted to 0-70 ° C, and the reaction temperature is selected. A range of 0-70 ° C to ensure the formation of doped zinc oxide nanoparticles and to obtain good particle dispersibility. When the reaction temperature is lower than 0 ° C, the reaction temperature is too low, which will significantly slow down the formation of zinc oxide nanoparticles, and even can not form zinc oxide nanoparticles, but only the hydroxide intermediate; and when the reaction temperature is higher than 70 ° C The obtained nanoparticles have poor dispersibility and agglomeration, which affects the late film formation of the doped zinc oxide colloidal solution. More preferably, the reaction temperature is selected from the range of room temperature to 50 ° C, and the reaction time is selected from 30 min to 4 h to ensure the formation of doped zinc oxide nanoparticles and control the particle size of the nanoparticles. When the reaction time is less than 30 min, the reaction time is too short, the formation of doped zinc oxide nanoparticles is insufficient, and the obtained nanoparticles have poor crystallinity; and when the reaction time exceeds 4 h, the excessively long particles grow up to generate The nanoparticles are too large and the particle size is not uniform, which affects the late film formation of the doped zinc oxide colloid solution. More preferably, the reaction time is selected to be 1~2h. The alkali liquid is selected from at least one of lithium hydroxide, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide (TMAH), aqueous ammonia, ethanolamine, and ethylenediamine.
进一步地,按锌离子的物质的量与二价金属离子的物质的量之和与OH 的物质的量之比为1:(1.5-2.5)加入所述碱液进行反应;以确保掺杂氧化锌纳米粒子的形成和减少反应副产物的生成。当氢氧根离子过少,金属盐相对会显著过量,导致大量金属盐无法生成掺杂氧化锌纳米粒子;当氢氧根离子过多,过量的氢氧根离子与氢氧化物中间体形成稳定的络合物,无法缩聚生成掺杂氧化锌纳米颗粒。更优的,按锌离子的物质的量与二价金属离子的物质的量之和与OH 的物质的量的比为1:(1.7-1.9)加入所述碱液进行反应。 Further, the ratio of the sum of the amount of the substance of the zinc ion to the amount of the substance of the divalent metal ion and the amount of the substance of the OH - is 1: (1.5 - 2.5) by adding the alkali solution for reaction; to ensure doping Formation of zinc oxide nanoparticles and reduction of reaction by-product formation. When the hydroxide ion is too small, the metal salt is relatively excessively excessive, resulting in a large amount of metal salt unable to form doped zinc oxide nanoparticles; when the hydroxide ion is excessive, the excess hydroxide ion and the hydroxide intermediate form a stable The complex cannot be polycondensed to form doped zinc oxide nanoparticles. More preferably, the ratio of the amount of the substance of the zinc ion to the amount of the substance of the divalent metal ion and the amount of the substance of the OH - is 1: (1.7 - 1.9) and the alkali solution is added to carry out the reaction.
进一步地,在步骤S02中,可以向二价金属离子掺杂的氧化锌纳米颗粒溶液加入沉淀剂,去除溶剂,得到二价金属离子掺杂的氧化锌纳米颗粒。优选的,所述沉淀剂与二价金属离子掺杂的氧化锌纳米颗粒溶液的体积比为(2-6):1;即向反应结束后的二价金属离子掺杂的氧化锌纳米颗粒溶液中加入体积比为(2-6):1的沉淀剂后离心,得到二价金属离子掺杂的氧化锌纳米颗粒。将所得二价金属离子掺杂的氧化锌纳米颗粒再次溶于第一溶剂中,此清洗过程重复多次以去除没有参与反应的反应物。最终所得金属离子掺杂的氧化锌纳米颗粒溶于第二溶剂中,即得到二价金属离子掺杂的氧化锌胶体溶液。沉淀剂与二价金属离子掺杂的氧化锌纳米颗粒溶液的体积比选为(2-6):1,以确保在充分沉淀掺杂氧化锌纳米粒子的前提下,不会出现过多沉淀剂破坏掺杂氧化锌粒子溶解性的情况。更优的,沉淀剂与二价金属离子掺杂的氧化锌纳米颗粒溶液的体积比选为(3-5):1;所述沉淀剂选自乙酸乙酯,正己烷,正庚烷,丙酮中的至少一种。Further, in step S02, a precipitant may be added to the divalent metal ion doped zinc oxide nanoparticle solution to remove the solvent to obtain divalent metal ion doped zinc oxide nanoparticles. Preferably, the volume ratio of the precipitant to the divalent metal ion doped zinc oxide nanoparticle solution is (2-6):1; that is, the divalent metal ion doped zinc oxide nanoparticle solution after the end of the reaction A precipitant having a volume ratio of (2-6):1 was added thereto and then centrifuged to obtain divalent metal ion-doped zinc oxide nanoparticles. The obtained divalent metal ion doped zinc oxide nanoparticles are redissolved in the first solvent, and the washing process is repeated a plurality of times to remove the reactants that are not involved in the reaction. The finally obtained metal ion doped zinc oxide nanoparticles are dissolved in the second solvent to obtain a divalent metal ion doped zinc oxide colloid solution. The volume ratio of the precipitant to the divalent metal ion doped zinc oxide nanoparticle solution is selected to be (2-6):1 to ensure that no excessive precipitant occurs under the premature precipitation of the doped zinc oxide nanoparticles. Destroy the solubility of doped zinc oxide particles. More preferably, the volume ratio of the precipitant to the divalent metal ion doped zinc oxide nanoparticle solution is selected to be (3-5): 1; the precipitating agent is selected from the group consisting of ethyl acetate, n-hexane, n-heptane, acetone At least one of them.
进一步地,步骤S03中:所述二价金属离子掺杂的氧化锌胶体溶液中,所述二价金属的掺杂浓度为2%-30%;即在步骤S01中,按二价掺杂金属盐中掺杂金属离子的物质的量占总金属离子的物质的量的摩尔百分数为2%-30%,将所述锌盐和所述二价掺杂金属盐溶于第一溶剂中(其中,所述总金属离子的物质的量是指所述掺杂金属离子的物质的量和锌离子物质的量之和),从而得到二价金属离子掺杂的氧化锌胶体溶液中,所述二价金属的掺杂浓度为2%-30%。所述的二价金属离子掺杂离子的掺杂摩尔浓度取决于二价金属离子掺杂离子和锌离子的离子半径差异:离子半径差异越小,二价金属离子在氧化锌材料中的掺杂极限就越高,可掺杂的摩尔浓度也就越高。因此,根据不同二价金属离子掺杂离子与锌离子的离子半径差异(见表1),就可确定二价金属离子的掺杂摩尔浓度。所述的二价金属离子掺杂离子包括易被氧化为更高价态的Fe 2+、Mn 2+、Cr 2+、Co 2+等,具体是,Fe 2+的掺杂摩尔浓度为5%-30%;Co 2+的掺杂摩尔浓度为2%-25%;Mn 2+的掺杂摩尔浓度为2%-25%;Cr 2+的掺杂摩尔浓度为2%~20%。所述的二价金属离子掺杂离子的掺杂摩尔浓度在不超过掺杂极限的基础上,只有达到一定掺杂摩尔浓度后,才能提高氧化处理后高价态金属离子在氧化锌中的掺杂极限,进而实现进一步提高氧化锌电子传输材料导电性能的效果。因此,更优的,Fe 2+的掺杂摩尔浓度为7%-27%;Co 2+的掺杂摩尔浓度为4%-23%;Mn 2+的掺杂摩尔浓度为4%-23%;Cr 2+的掺杂摩尔浓度为4%-18%。进一步,更优的,Fe 2+的掺杂摩尔浓度为10%-25%;Co 2+的掺杂摩尔浓度为8%-20%;Mn 2+的掺杂摩尔浓度为8%-20%;Cr 2+的掺杂摩尔浓度为8%-15%。最优的,Fe 2+的掺杂摩尔浓度为14%-22%;Co 2+的掺杂摩尔浓度为12%-18%;Mn 2+的掺杂摩尔浓度为12%-18%;Cr 2+的掺杂摩尔浓度为10%-14%。在最优的金属离子掺杂摩尔浓度下,足够量的低价态金属离子的存在可以充分发挥降低高价态金属离子所引起的晶格畸变的作用,最大限度提升高价态金属离子在氧化锌材料中的掺杂极限,同时也有足够量的高价态金属离子掺杂进入氧化锌晶体结构中,最大限度的提升了氧化锌材料的导电率。 Further, in step S03, in the divalent metal ion doped zinc oxide colloid solution, the doping concentration of the divalent metal is 2%-30%; that is, in step S01, the divalent metal is doped The amount of the metal ion doped substance in the salt is 2% to 30% by mole of the total metal ion, and the zinc salt and the divalent doped metal salt are dissolved in the first solvent (wherein The amount of the total metal ion substance refers to the sum of the amount of the metal ion doping substance and the amount of the zinc ion substance, thereby obtaining a divalent metal ion doped zinc oxide colloid solution, the second The doping concentration of the valence metal is 2% to 30%. The doping molar concentration of the divalent metal ion doping ions depends on the difference of the ionic radius of the divalent metal ion doping ion and the zinc ion: the smaller the ion radius difference, the doping of the divalent metal ion in the zinc oxide material The higher the limit, the higher the molar concentration of doping. Therefore, according to the difference in ionic radius of the doping ions and zinc ions of different divalent metal ions (see Table 1), the doping molar concentration of the divalent metal ions can be determined. The divalent metal ion doping ions include Fe 2+ , Mn 2+ , Cr 2+ , Co 2+ , etc. which are easily oxidized to a higher valence state, specifically, the doping molar concentration of Fe 2+ is 5%. -30%; the molar concentration of Co 2+ is 2%-25%; the molar concentration of Mn 2+ is 2%-25%; the molar concentration of Cr 2+ is 2%-20%. The doping molar concentration of the divalent metal ion doping ions does not exceed the doping limit, and the doping of the high-valent metal ions in the zinc oxide after the oxidation treatment can be improved only after reaching a certain doping molar concentration. The limit further realizes the effect of further improving the electrical conductivity of the zinc oxide electron transporting material. Therefore, more preferably, the molar concentration of Fe 2+ is 7%-27%; the molar concentration of Co 2+ is 4%-23%; the molar concentration of Mn 2+ is 4%-23% The molar concentration of Cr 2+ is 4%-18%. Further, more preferably, the doping molar concentration of Fe 2+ is 10%-25%; the molar concentration of Co 2+ is 8%-20%; the molar concentration of Mn 2+ is 8%-20% The molar concentration of Cr 2+ is 8%-15%. Optimum, the molar concentration of Fe 2+ is 14%-22%; the molar concentration of Co 2+ is 12%-18%; the molar concentration of Mn 2+ is 12%-18%; Cr The molar concentration of 2+ is 10% to 14%. At the optimal metal ion doping molar concentration, the presence of a sufficient amount of low-valent metal ions can fully exert the effect of lowering the lattice distortion caused by high-valence metal ions, and maximize the high-valence metal ions in the zinc oxide material. In the doping limit, a sufficient amount of high-valent metal ions are doped into the zinc oxide crystal structure to maximize the conductivity of the zinc oxide material.
进一步地,将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上的沉积方法,包括但不局限于旋涂法、刮涂法、印刷法、喷涂法、滚涂法、电沉积法等中的一种,然后进行氧化处理以制得所述氧化锌电子传输材料。Further, a deposition method for depositing the divalent metal ion doped zinc oxide colloid solution on a substrate includes, but is not limited to, spin coating, blade coating, printing, spray coating, roll coating, electrodeposition One of the laws and the like is then subjected to an oxidation treatment to produce the zinc oxide electron transporting material.
进一步地,步骤S04中,将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上,进行氧化处理的步骤包括:将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上,在氧气环境中,对所述基板进行加热处理,加热处理温度为100-400℃,加热处理时间为0.5-12h。其中,氧气环境中的具体条件是:所用氧气为纯度99.5%以上的工业级纯氧。所述氧化处理的条件可以根据二价掺杂金属离子在氧气中易于氧化的程度不同(相对而言,在氧气气氛和相同的加热温度下,Fe 2+和Cr 2+最容易被氧化,其次为Mn 2+,而最为缓慢的则是Co 2+)进行进一步的优化。因此,更优选地,Fe 2+掺杂氧化锌电子传输材料的加热处理温度为100-300℃,加热处理时间为30min-6h;Cr 2+掺杂氧化锌电子传输材料的加热处理温度为100-300℃,加热处理时间为30min-6h;Mn 2+掺杂氧化锌电子传输材料的加热处理温度为200-400℃,加热处理时间为1-8h;Co 2+掺杂氧化锌电子传输材料的加热处理温度为300-400℃,加热处理时间为4h-12h。 Further, in step S04, the divalent metal ion doped zinc oxide colloid solution is deposited on the substrate, and the step of performing the oxidation treatment comprises: depositing the divalent metal ion doped zinc oxide colloid solution on the substrate. The substrate is subjected to heat treatment in an oxygen atmosphere at a heat treatment temperature of 100 to 400 ° C and a heat treatment time of 0.5 to 12 hours. Among them, the specific conditions in the oxygen environment are: the oxygen used is industrial grade pure oxygen with a purity of 99.5% or more. The conditions of the oxidation treatment may be different depending on the degree of easy oxidation of the divalent doped metal ions in oxygen (relatively, Fe 2+ and Cr 2+ are most easily oxidized under an oxygen atmosphere and the same heating temperature, and secondly It is Mn 2+ and the slowest is Co 2+ ) for further optimization. Therefore, more preferably, the heat treatment temperature of the Fe 2+ -doped zinc oxide electron transport material is 100-300 ° C, the heat treatment time is 30 min-6 h; the heat treatment temperature of the Cr 2+ -doped zinc oxide electron transport material is 100 -300 ° C, heat treatment time is 30min-6h; Mn 2+ doped zinc oxide electron transport material heat treatment temperature is 200-400 ° C, heat treatment time is 1-8h; Co 2+ doped zinc oxide electron transport material The heat treatment temperature is 300-400 ° C, and the heat treatment time is 4 h-12 h.
所述氧化处理过程中,氧化处理温度的选择要确保高价态金属离子的生成和防止对衬底的破坏。当氧化处理温度过低时,二价金属离子掺杂离子向高价态同种金属离子的转变过程将变得十分缓慢,甚至使得该氧化过程无法发生;而当氧化处理温度过高时,则可能对电子传输材料的衬底造成破坏,并且使得二价金属离子掺杂离子的氧化过程过快而难以控制。During the oxidation treatment, the oxidation treatment temperature is selected to ensure the formation of high-valent metal ions and to prevent damage to the substrate. When the oxidation treatment temperature is too low, the conversion process of the divalent metal ion doping ions to the high-valent state metal ions will become very slow, even making the oxidation process impossible; and when the oxidation treatment temperature is too high, it is possible The substrate of the electron transporting material is destroyed, and the oxidation process of the divalent metal ion doping ions is too fast to be controlled.
本发明实施例的关键在于,氧化处理掺杂氧化锌电子传输材料后,在有足够量的二价金属离子保存下来以提高高价态金属离子在氧化锌材料中的掺杂极限的同时,又有足够的高价态掺杂金属离子生成并掺杂到氧化锌晶体结构中。而所述氧化处理方式中的氧化处理时间则成为调控氧化锌电子传输材料中高低价态同种金属离子掺杂比例的关键。当氧化处理时间过短时,被氧化为高价态掺杂金属离子的二价掺杂金属离子过少,无法起到提高氧化锌电子传输材料导电性能的作用;而当氧化处理时间过长时,过量的高价态掺杂金属离子生成,导致剩余的二价掺杂金属离子过少,无法起到提高高价态金属离子在氧化锌中掺杂极限的作用,因而部分生成的高价态金属离子会以第二相的形式从氧化锌材料中析出,对氧化锌电子传输材料的导电性能产生不良的影响。The key point of the embodiment of the present invention is that after the oxidation treatment of the doped zinc oxide electron transporting material, a sufficient amount of divalent metal ions are preserved to increase the doping limit of the high-valent metal ions in the zinc oxide material, and Sufficient high-valence doping metal ions are formed and doped into the zinc oxide crystal structure. The oxidation treatment time in the oxidation treatment mode is the key to regulating the doping ratio of the high-low-state metal ions in the zinc oxide electron transport material. When the oxidation treatment time is too short, the amount of divalent doped metal ions oxidized to high-valent doped metal ions is too small to improve the conductivity of the zinc oxide electron transport material; and when the oxidation treatment time is too long, Excessive high-valence doping metal ions are generated, resulting in too little residual divalent-doped metal ions, which cannot improve the doping limit of high-valent metal ions in zinc oxide, and thus partially generated high-valence metal ions will The form of the second phase is precipitated from the zinc oxide material, which adversely affects the electrical conductivity of the zinc oxide electron transport material.
本发明所述的纳米氧化锌电子传输材料为Fe 3+和Fe 2+共掺杂的氧化锌时,Fe 3+和Fe 2+的摩尔比为20:1-1:1;优选为10:1-1:1;更优选为4:1-5:4;更进一步优选为9:5-3:2; When the nano zinc oxide electron transporting material of the present invention is Fe 3+ and Fe 2+ co-doped zinc oxide, the molar ratio of Fe 3+ to Fe 2+ is 20:1 to 1:1; preferably 10: 1-1:1; more preferably 4:1-5:4; still more preferably 9:5-3:2;
当所述电子传输材料为包括Cr 4+和Cr 2+共掺杂的氧化锌时,Cr 4+和Cr 2+的摩尔比20:1-1:2,优选为10:1-1:2;更优选为3:1-2:3;更进一步优选为3:2-2:3; When the electron transport material including Cr 4+ and Cr 2+ co-doped zinc oxide, Cr 2+ and Cr 4+ molar ratio of 20: 1 to 1: 2, preferably 10: 1 to 1: 2 More preferably 3:1-2:3; still more preferably 3:2-2:3;
当所述电子传输材料为包括Mn 4+和Mn 2+共掺杂的氧化锌时,Mn 4+和Mn 2+的摩尔比为10:1-2:3;优选为5:1-2:3;更优选为2:1-1:1;更进一步优选为3:2-1:1; When the electron transporting material is zinc oxide co-doped including Mn 4+ and Mn 2+ , the molar ratio of Mn 4+ to Mn 2+ is 10:1 to 2:3; preferably 5:1-2: 3; more preferably 2:1-1:1; still more preferably 3:2-1:1;
当所述电子传输材料为包括Co 4+和Co 2+共掺杂的氧化锌时,Co 4+和Co 2+的摩尔比为10:1-2:3;优选为5:1-2:3;更优选为2:1-1:1;更进一步优选为3:2-1:1。 When the electron transport material include Co 2+ and Co 4+ co-doped zinc oxide, the molar ratio of Co 2+ and Co 4+ is 10: 1-2: 3; preferably 5: 1-2: 3; more preferably 2:1-1:1; still more preferably 3:2-1:1.
本发明实施例还提供一种量子点发光二极管,包括阳极、阴极以及位于所述阳极和所述阴极之间的量子点发光层,所述阴极和所述量子点发光层之间设置有电子传输层,所述电子传输层由本发明实施例的上述电子传输材料组成。Embodiments of the present invention also provide a quantum dot light emitting diode comprising an anode, a cathode, and a quantum dot emitting layer between the anode and the cathode, and an electron transport is disposed between the cathode and the quantum dot emitting layer The layer, the electron transport layer is composed of the above-described electron transport material of the embodiment of the present invention.
相应地,一种量子点发光二极管的制备方法,所述量子点发光二极管为反置型量子点发光二极管,且所述量子点发光二极管包括电子传输层,所述制备方法包括如下步骤:Correspondingly, a method for preparing a quantum dot light emitting diode, wherein the quantum dot light emitting diode is an inverted quantum dot light emitting diode, and the quantum dot light emitting diode comprises an electron transport layer, the preparation method comprising the following steps:
提供基板,所述基板上设置有阴极;Providing a substrate on which a cathode is disposed;
利用本发明实施例的上述电子传输材料的制备方法在所述阴极上制备电子传输材料,形成所述电子传输层。An electron transporting material is prepared on the cathode by the above-described method for producing an electron transporting material according to an embodiment of the present invention to form the electron transporting layer.
该量子点发光二极管的制备方法,利用部分易氧化的二价金属离子掺杂氧化锌材料制成电子传输材料,通过对该电子传输材料的氧化处理,制得了高低价态同种金属离子共掺杂氧化锌的电子传输材料层;该制备方法显著提高了高价态金属离子在氧化锌材料中的固溶度极限,进一步优化了氧化锌电子传输材料的导电性能,进而整体提高了器件的发光效率和器件性能。The preparation method of the quantum dot light-emitting diode is made by using a partially oxidizable divalent metal ion doped zinc oxide material to form an electron transporting material, and by oxidizing the electron transporting material, a high-low-valent state metal ion is obtained. The electron transport material layer doped with zinc oxide; the preparation method significantly improves the solid solubility limit of the high-valent metal ion in the zinc oxide material, further optimizes the electrical conductivity of the zinc oxide electron transport material, and thereby improves the overall illumination of the device. Efficiency and device performance.
具体一实施例中,一种QLED器件的制备方法包括:In a specific embodiment, a method for preparing a QLED device includes:
A:首先在阴极衬底上沉积掺杂氧化锌胶体溶液,并进行氧化处理,得到本发明所述的高低价态同种金属离子共掺杂氧化锌电子传输层;A: firstly depositing a doped zinc oxide colloid solution on the cathode substrate, and performing an oxidation treatment to obtain the high-low-value homogenous doped zinc ion electron transport layer of the same metal ion;
B:然后在电子传输层上沉积量子点发光层;B: depositing a quantum dot luminescent layer on the electron transport layer;
C:最后沉积空穴传输层于量子点发光层上,并蒸镀阳极于空穴传输层上,得到量子点发光二极管。C: Finally, a hole transport layer is deposited on the quantum dot light-emitting layer, and the anode is vapor-deposited on the hole transport layer to obtain a quantum dot light-emitting diode.
本发明所述衬底材料为玻璃片,所述阴极为ITO基板。The substrate material of the present invention is a glass piece, and the cathode is an ITO substrate.
进一步地,将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上的沉积方法,包括但不局限于旋涂法、刮涂法、印刷法、喷涂法、滚涂法、电沉积法等中的一种,以制得掺杂氧化锌电子传输层,所述的掺杂氧化锌电子传输层的厚度为10-100nm,当所述电子传输层的厚度小于10nm时,膜层很容易被电子击穿,无法保证载流子的注入性能;当所述电子传输层的厚度大于100nm时,则会阻碍电子的注入,影响器件的电荷注入平衡。Further, a deposition method for depositing the divalent metal ion doped zinc oxide colloid solution on a substrate includes, but is not limited to, spin coating, blade coating, printing, spray coating, roll coating, electrodeposition a method of preparing a doped zinc oxide electron transport layer having a thickness of 10 to 100 nm, and when the thickness of the electron transport layer is less than 10 nm, the film layer is very It is easy to be broken down by electrons, and the injection performance of carriers cannot be guaranteed. When the thickness of the electron transport layer is greater than 100 nm, electron injection is hindered and the charge injection balance of the device is affected.
所述QLED器件制备方法中,所述量子点发光层的量子点为红、绿、蓝三种中的一种量子点。可以为CdS、CdSe、CdTe、ZnO、ZnS、ZnSe、ZnTe、GaAs、GaP、GaSb、HgS、HgSe、HgTe、InAs、InP、InSb、AlAs、AlP、CuInS、CuInSe、以及各种核壳结构量子点或合金结构量子点中的至少一种。可以为常见的红、绿、蓝三种的任意一种量子点或者其它黄光均可以,该步骤量子点可以为含镉或者不含镉。该量子点发光层材料具有激发光谱宽并且连续分布,发射光谱稳定性高等特点。量子点发光层的制备:将已旋涂上电子传输层的基板置于匀胶机上,将配制好一定浓度的发光物质溶液旋涂成膜,通过调节溶液的浓度、旋涂速度和旋涂时间来控制发光层的厚度,约20~60 nm,在适当温度下干燥。In the method for preparing a QLED device, the quantum dots of the quantum dot light-emitting layer are one of red, green, and blue. Can be CdS, CdSe, CdTe, ZnO, ZnS, ZnSe, ZnTe, GaAs, GaP, GaSb, HgS, HgSe, HgTe, InAs, InP, InSb, AlAs, AlP, CuInS, CuInSe, and various core-shell quantum dots Or at least one of the alloy structure quantum dots. It can be any of the common red, green and blue quantum dots or other yellow light. The quantum dots in this step can be cadmium-containing or cadmium-free. The quantum dot luminescent layer material has the characteristics of wide excitation spectrum and continuous distribution, and high stability of emission spectrum. Preparation of quantum dot luminescent layer: The substrate which has been spin-coated with the electron transport layer is placed on the homogenizing machine, and a solution of a certain concentration of the luminescent substance is spin-coated to form a film, and the concentration of the solution, the spin coating speed and the spin coating time are adjusted. To control the thickness of the luminescent layer, about 20~60 Nm, dry at the appropriate temperature.
所述QLED器件制备方法中,所述空穴传输层可采用本领域常规的空穴传输材料制成,包括但不限于TFB、PVK、Poly-TPD、TCTA、CBP等或者为其任意组合的混合物,亦可以是其它高性能的空穴传输材料。空穴传输层:将已旋涂上量子点发光层的基板置于匀胶机上,,用配制好的空穴传输材料的溶液旋涂成膜;通过调节溶液的浓度、旋涂速度和旋涂时间来控制膜厚,然后在适当温度下干燥。In the QLED device manufacturing method, the hole transport layer may be made of a hole transporting material conventional in the art, including but not limited to TFB, PVK, Poly-TPD, TCTA, CBP, etc. or a mixture of any combination thereof. It can also be other high performance hole transport materials. Hole transport layer: the substrate on which the quantum dot light-emitting layer has been spin-coated is placed on a homogenizer, and spin-coated with a solution of the prepared hole transport material; by adjusting the concentration of the solution, the spin coating speed and spin coating Time to control the film thickness and then dry at the appropriate temperature.
接着,将沉积完各功能层的衬底置于蒸镀仓中通过掩膜板热蒸镀一层15-30nm的金属银或者铝作为阳极,或者使用纳米Ag线或者Cu线,具有较小的电阻使得载流子能顺利的注入。Next, the substrate in which the functional layers are deposited is placed in a vapor deposition chamber, and a 15-30 nm metal silver or aluminum is thermally evaporated through the mask as an anode, or a nano-Ag wire or a Cu wire is used, which has a small The resistor allows the carriers to be injected smoothly.
进一步的,将得到的QLED进行封装处理,所述封装处理可采用常用的机器封装,也可以采用手动封装。优选的,所述封装处理的环境中,氧含量和水含量均低于0 .1ppm,以保证器件的稳定性。Further, the obtained QLED is subjected to a packaging process, and the package process may be a common machine package or a manual package. Preferably, in the environment of the encapsulation treatment, the oxygen content and the water content are both lower than 0. .1ppm to ensure the stability of the device.
本发明先后进行过多次试验,现举一部分试验结果作为参考对发明进行进一步详细描述,下面结合具体实施例进行详细说明。The present invention has been subjected to a number of tests in succession, and a part of the test results are now described in further detail as a reference, and will be described in detail below in conjunction with specific embodiments.
实施例1Example 1
下面以铁离子掺杂氧化锌电子传输材料为例详细介绍铁离子掺杂氧化锌胶体溶液的合成,铁离子掺杂氧化锌电子传输材料的制备及其氧化处理过程。The synthesis of iron ion doped zinc oxide colloidal solution, the preparation of iron ion doped zinc oxide electron transport material and its oxidation treatment process are described in detail below by taking iron ion doped zinc oxide electron transport material as an example.
首先将适量的醋酸锌和二价铁盐FeSO 4加入到50ml甲醇溶剂中形成总浓度为0.1mol/L的混合盐溶液,其中Fe 2+的掺杂摩尔浓度为20%。同时将适量的氢氧化钾粉末溶解到另一份50ml甲醇溶剂中形成浓度为0.3mol/L的碱液。随后将混合盐溶液加热至50℃,并逐滴加入氢氧化钾溶液直到氢氧根离子与金属离子的摩尔比为1.7:1时停止。氢氧化钾溶液滴注完成后,将混合溶液在50℃下继续搅拌2h,得到一均匀透明溶液。随后,向均匀透明溶液中加入体积比为3:1的乙酸乙酯溶剂,使透明溶液中产生大量白色沉淀。将浑浊溶液以7000rpm的速度进行离心,所得白色沉淀再次溶于甲醇溶剂中。此清洗过程重复进行四次。最终所得白色沉淀溶于适量乙醇溶剂中,得到浓度为30mg/ml的二价铁离子掺杂的氧化锌胶体溶液。 First, an appropriate amount of zinc acetate and a ferric salt FeSO 4 were added to 50 ml of a methanol solvent to form a mixed salt solution having a total concentration of 0.1 mol/L, wherein the Fe 2+ molar concentration was 20%. At the same time, an appropriate amount of potassium hydroxide powder was dissolved in another 50 ml of methanol solvent to form a lye having a concentration of 0.3 mol/L. The mixed salt solution was then heated to 50 ° C, and the potassium hydroxide solution was added dropwise until the molar ratio of hydroxide ions to metal ions was 1.7:1. After the completion of the dropwise addition of the potassium hydroxide solution, the mixed solution was further stirred at 50 ° C for 2 hours to obtain a homogeneous transparent solution. Subsequently, a 3:1 volume ratio of ethyl acetate solvent was added to the homogeneous clear solution to produce a large amount of white precipitate in the clear solution. The cloudy solution was centrifuged at 7000 rpm, and the resulting white precipitate was again dissolved in a methanol solvent. This cleaning process is repeated four times. The finally obtained white precipitate was dissolved in an appropriate amount of ethanol solvent to obtain a divalent iron ion-doped zinc oxide colloid solution having a concentration of 30 mg/ml.
将所得30mg/ml二价铁离子掺杂的氧化锌胶体溶液以旋涂的方法沉积在ITO基板上。其中旋涂转速为3000rpm,旋涂时间为30s,以控制掺杂氧化锌电子传输材料的厚度在50nm左右。The obtained 30 mg/ml divalent iron ion doped zinc oxide colloid solution was deposited on the ITO substrate by spin coating. The spin coating speed is 3000 rpm, and the spin coating time is 30 s to control the thickness of the doped zinc oxide electron transport material to be about 50 nm.
最后,将沉积有二价铁离子掺杂氧化锌电子传输材料的基板放入马弗炉中。在纯度为99.5%的氧气气氛下,将掺杂氧化锌电子传输材料加热至200℃,并在此温度下保温2h,即制得了高低价态铁离子共掺杂的氧化锌电子传输材料。Finally, the substrate on which the divalent iron ion-doped zinc oxide electron transport material is deposited is placed in a muffle furnace. The zinc oxide electron transporting material was heated to 200 ° C in an oxygen atmosphere with a purity of 99.5%, and kept at this temperature for 2 h to obtain a zinc oxide electron transporting material co-doped with high-and low-valent iron ions.
实施例2Example 2
下面以铬离子掺杂氧化锌电子传输材料为例详细介绍铬离子掺杂氧化锌胶体溶液的合成,铬离子掺杂氧化锌电子传输材料的制备及其氧化处理过程。The synthesis of chromium ion doped zinc oxide colloidal solution, the preparation of chromium ion doped zinc oxide electron transport material and its oxidation treatment process are described in detail below by taking chromium ion doped zinc oxide electron transport material as an example.
首先将适量的硝酸锌和二价铬盐CrCl 2加入到50ml乙醇溶剂中形成总浓度为0.1mol/L的混合盐溶液,其中Cr2+的掺杂摩尔浓度为15%。同时将适量的氢氧化锂粉末溶解到另一份50ml乙醇溶剂中形成浓度为0.2mol/L的碱液。随后将混合盐溶液加热至40℃,并逐滴加入氢氧化锂溶液直到氢氧根离子与金属离子的摩尔比为1.9:1时停止。氢氧化锂溶液滴注完成后,将混合溶液在30℃下继续搅拌1 h,得到均匀透明溶液。随后,向均匀透明溶液中加入体积比为4:1的正庚烷溶剂,使透明溶液中产生大量白色沉淀。将浑浊溶液以7000rpm的速度进行离心,所得白色沉淀再次溶于乙醇溶剂中。此清洗过程重复进行四次。最终所得白色沉淀溶于适量乙醇溶剂中,得到浓度为30mg/ml的二价铬离子掺杂的氧化锌胶体溶液。 First, an appropriate amount of zinc nitrate and a divalent chromium salt CrCl 2 were added to 50 ml of an ethanol solvent to form a mixed salt solution having a total concentration of 0.1 mol/L, wherein the molar concentration of Cr2+ was 15%. At the same time, an appropriate amount of lithium hydroxide powder was dissolved in another 50 ml of ethanol solvent to form a lye having a concentration of 0.2 mol/L. The mixed salt solution was then heated to 40 ° C and the lithium hydroxide solution was added dropwise until the molar ratio of hydroxide ions to metal ions was 1.9:1. After the completion of the dropwise addition of the lithium hydroxide solution, the mixed solution was further stirred at 30 ° C for 1 h to obtain a uniform transparent solution. Subsequently, a 4:1 by volume heptane solvent was added to the homogeneous clear solution to produce a large amount of white precipitate in the clear solution. The cloudy solution was centrifuged at 7000 rpm, and the resulting white precipitate was again dissolved in an ethanol solvent. This cleaning process is repeated four times. The finally obtained white precipitate was dissolved in an appropriate amount of an ethanol solvent to obtain a divalent chromium ion-doped zinc oxide colloidal solution having a concentration of 30 mg/ml.
将所得30mg/ml二价铬离子掺杂的氧化锌胶体溶液以旋涂的方法沉积在ITO基板上。其中旋涂转速为1500rpm,旋涂时间为30s,以控制掺杂氧化锌电子传输材料的厚度在80nm左右。The obtained 30 mg/ml divalent chromium ion doped zinc oxide colloid solution was deposited on the ITO substrate by spin coating. The spin coating speed is 1500 rpm, and the spin coating time is 30 s to control the thickness of the doped zinc oxide electron transport material to be about 80 nm.
最后,将沉积有二价铬离子掺杂氧化锌电子传输材料的基板放入马弗炉中。在纯度为99.5%的氧气气氛下,将掺杂氧化锌电子传输材料加热至200℃,并在此温度下保温4h,即制得了高低价态铬离子共掺杂的氧化锌电子传输材料。Finally, a substrate on which a divalent chromium ion-doped zinc oxide electron transport material is deposited is placed in a muffle furnace. The zinc oxide electron transport material was heated to 200 ° C in an oxygen atmosphere with a purity of 99.5%, and was kept at this temperature for 4 h to obtain a zinc oxide electron transport material co-doped with high-valent chromium ions.
实施例3Example 3
下面以锰离子掺杂氧化锌电子传输材料为例详细介绍锰离子掺杂氧化锌胶体溶液的合成,锰离子掺杂氧化锌电子传输材料的制备及其氧化处理过程。The synthesis of manganese ion doped zinc oxide colloidal solution, the preparation of manganese ion doped zinc oxide electron transport material and its oxidation treatment process are described in detail below by taking manganese ion doped zinc oxide electron transport material as an example.
首先将适量的硫酸锌和二价锰盐Mn(CH 3COO) 2加入到50ml DMSO溶剂中形成总浓度为0.1mol/L的混合盐溶液,其中Mn 2+的掺杂摩尔浓度为15%。同时将适量的TMAH粉末溶解到另一份30ml乙醇溶剂中形成浓度为0.3mol/L的碱液。随后将混合盐溶液保持在室温下逐滴加入TMAH溶液直到氢氧根离子与金属离子的摩尔比为1.5:1时停止。TMAH溶液滴注完成后,将混合溶液在室温下继续搅拌2 h,得到均匀透明溶液。随后,向均匀透明溶液中加入体积比为4:1的乙酸乙酯溶剂,使透明溶液中产生大量白色沉淀。将浑浊溶液以7000rpm的速度进行离心,所得白色沉淀再次溶于乙醇溶剂中。此清洗过程重复进行四次。最终所得白色沉淀溶于适量乙醇溶剂中,得到浓度为30mg/ml的二价锰离子掺杂的氧化锌胶体溶液。 First, an appropriate amount of zinc sulfate and a manganese salt Mn(CH 3 COO) 2 were added to 50 ml of DMSO solvent to form a mixed salt solution having a total concentration of 0.1 mol/L, wherein the molar concentration of Mn 2+ was 15%. At the same time, an appropriate amount of TMAH powder was dissolved in another 30 ml of ethanol solvent to form a lye having a concentration of 0.3 mol/L. The mixed salt solution was then added dropwise to the TMAH solution at room temperature until the molar ratio of hydroxide ions to metal ions was 1.5:1. After the completion of the dropwise addition of the TMAH solution, the mixed solution was further stirred at room temperature for 2 hours to obtain a uniform transparent solution. Subsequently, a 4:1 volume ratio of ethyl acetate solvent was added to the homogeneous clear solution to produce a large amount of white precipitate in the clear solution. The cloudy solution was centrifuged at 7000 rpm, and the resulting white precipitate was again dissolved in an ethanol solvent. This cleaning process is repeated four times. The finally obtained white precipitate was dissolved in an appropriate amount of an ethanol solvent to obtain a divalent manganese ion-doped zinc oxide colloidal solution having a concentration of 30 mg/ml.
将所得30mg/ml二价锰离子掺杂的氧化锌胶体溶液以旋涂的方法沉积在ITO基板上。其中旋涂转速为4500rpm,旋涂时间为30s,以控制掺杂氧化锌电子传输材料的厚度在20nm左右。The obtained 30 mg/ml divalent manganese ion doped zinc oxide colloid solution was deposited on the ITO substrate by spin coating. The spin coating speed was 4500 rpm and the spin coating time was 30 s to control the thickness of the doped zinc oxide electron transport material to be about 20 nm.
最后,将沉积有二价锰离子掺杂氧化锌电子传输材料的基板放入马弗炉中。在纯度为99.5%的氧气气氛下,将掺杂氧化锌电子传输材料加热至300℃,并在此温度下保温6h,即制得了高低价态锰离子共掺杂的氧化锌电子传输材料。Finally, a substrate on which a divalent manganese ion-doped zinc oxide electron transport material is deposited is placed in a muffle furnace. The doped zinc oxide electron transport material was heated to 300 ° C in an oxygen atmosphere with a purity of 99.5%, and kept at this temperature for 6 h to obtain a zinc oxide electron transport material co-doped with high-value manganese ions.
实施例4Example 4
下面以钴离子掺杂氧化锌电子传输材料为例详细介绍钴离子掺杂氧化锌胶体溶液的合成,钴离子掺杂氧化锌电子传输材料的制备及其氧化处理过程。The synthesis of cobalt ion doped zinc oxide colloidal solution, the preparation of cobalt ion doped zinc oxide electron transport material and its oxidation treatment process are described in detail below by taking cobalt ion doped zinc oxide electron transport material as an example.
首先将适量的氯化锌和二价钴盐Co(NO 3) 2加入到50ml甲醇溶剂中形成总浓度为0.1mol/L的混合盐溶液,其中Co 2+的掺杂摩尔浓度为15%。同时将适量的氢氧化钠粉末溶解到另一份50ml甲醇溶剂中形成浓度为0.3mol/L的碱液。随后将混合盐溶液加热至50℃,并逐滴加入氢氧化钠溶液直到氢氧根离子与金属离子的摩尔比为1.8:1时停止。氢氧化钠溶液滴注完成后,将混合溶液在50℃下继续搅拌1 h,得到均匀透明溶液。随后,向均匀透明溶液中加入体积比为5:1的正己烷溶剂,使透明溶液中产生大量白色沉淀。将浑浊溶液以7000rpm的速度进行离心,所得白色沉淀再次溶于甲醇溶剂中。此清洗过程重复进行四次。最终所得白色沉淀溶于适量乙醇溶剂中,得到浓度为30mg/ml的二价钴离子掺杂的氧化锌胶体溶液。 First, an appropriate amount of zinc chloride and a divalent cobalt salt Co(NO 3 ) 2 were added to 50 ml of a methanol solvent to form a mixed salt solution having a total concentration of 0.1 mol/L, wherein the molar concentration of Co 2+ was 15%. At the same time, an appropriate amount of sodium hydroxide powder was dissolved in another 50 ml of methanol solvent to form a lye having a concentration of 0.3 mol/L. The mixed salt solution was then heated to 50 ° C, and the sodium hydroxide solution was added dropwise until the molar ratio of hydroxide ions to metal ions was 1.8:1. After the completion of the dropwise addition of the sodium hydroxide solution, the mixed solution was further stirred at 50 ° C for 1 h to obtain a uniform transparent solution. Subsequently, a n: hexane solvent in a volume ratio of 5:1 was added to the homogeneous clear solution to produce a large amount of white precipitate in the clear solution. The cloudy solution was centrifuged at 7000 rpm, and the resulting white precipitate was again dissolved in a methanol solvent. This cleaning process is repeated four times. The finally obtained white precipitate was dissolved in an appropriate amount of an ethanol solvent to obtain a divalent cobalt ion-doped zinc oxide colloid solution having a concentration of 30 mg/ml.
将所得30mg/ml二价钴离子掺杂的氧化锌胶体溶液以旋涂的方法沉积在ITO基板上。其中旋涂转速为3000rpm,旋涂时间为30s,以控制掺杂氧化锌电子传输材料的厚度在50nm左右。The obtained 30 mg/ml divalent cobalt ion doped zinc oxide colloid solution was deposited on the ITO substrate by spin coating. The spin coating speed is 3000 rpm, and the spin coating time is 30 s to control the thickness of the doped zinc oxide electron transport material to be about 50 nm.
最后,将沉积有二价钴离子掺杂氧化锌电子传输材料的基板放入马弗炉中。在纯度为99.5%的氧气气氛下,将掺杂氧化锌电子传输材料加热至400℃,并在此温度下保温8h,即制得了高低价态钴离子共掺杂的氧化锌电子传输材料。Finally, a substrate on which a divalent cobalt ion-doped zinc oxide electron transport material is deposited is placed in a muffle furnace. The zinc oxide electron transporting material was heated to 400 ° C in an oxygen atmosphere with a purity of 99.5%, and was kept at this temperature for 8 h to obtain a zinc oxide electron transporting material co-doped with high and low cobalt ions.
实施例5Example 5
本一种QLED器件的制备方法,包括如下步骤:The method for preparing the QLED device comprises the following steps:
A:首先旋涂掺杂氧化锌电子传输层于ITO基板上,并氧化处理;A: firstly spin-coating a doped zinc oxide electron transport layer on an ITO substrate and oxidizing;
B:然后在电子传输层上沉积量子点发光层;B: depositing a quantum dot luminescent layer on the electron transport layer;
C:最后沉积空穴传输层于量子点发光层上,并蒸镀阳极于电子传输层上,得到量子点发光二极管。C: Finally, a hole transport layer is deposited on the quantum dot light-emitting layer, and the anode is vapor-deposited on the electron transport layer to obtain a quantum dot light-emitting diode.
本实施例的QLED器件为反型构型,其中,图1为QLED器件的结构示意图,QLED器件从下而上依次包括衬底1、阴极2、电子传输层3、量子点发光层4、空穴传输层5、阳极6。其中,衬底1的材料为玻璃片,阴极2的材料为ITO基板,电子传输层3的材料为实施例1-4中任意一种高低价态同种金属离子共掺杂氧化锌,空穴传输层5的材料为TFB,阳极6的材料为Al。The QLED device of this embodiment is of an inverted configuration. FIG. 1 is a schematic structural diagram of a QLED device. The QLED device includes a substrate 1, a cathode 2, an electron transport layer 3, a quantum dot light-emitting layer 4, and an empty layer from bottom to top. Hole transport layer 5, anode 6. The material of the substrate 1 is a glass piece, the material of the cathode 2 is an ITO substrate, and the material of the electron transport layer 3 is any high-low-value metal ion co-doped zinc oxide of any of the embodiments 1-4. The material of the hole transport layer 5 is TFB, and the material of the anode 6 is Al.
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。The above is only the preferred embodiment of the present invention, and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection of the present invention. Within the scope.

Claims (15)

  1. 一种电子传输材料,其特征在于,所述电子传输材料为金属离子掺杂的氧化锌,所述金属离子为同一种金属元素的不同价态的两种或三种金属离子,且所述金属离子的最低价态为正二价。An electron transporting material, characterized in that the electron transporting material is metal ion doped zinc oxide, the metal ion is two or three metal ions of different valence states of the same metal element, and the metal The lowest valence state of ions is positive divalent.
  2. 如权利要求1所述的电子传输材料,其特征在于,所述电子传输材料为包括Fe 3+和Fe 2+共掺杂的氧化锌;或者, The electron transporting material according to claim 1, wherein said electron transporting material is zinc oxide co-doped including Fe 3+ and Fe 2+ ;
    所述电子传输材料为包括Mn 4+和Mn 2+共掺杂的氧化锌;或者, The electron transporting material is zinc oxide co-doped including Mn 4+ and Mn 2+ ; or
    所述电子传输材料为包括Co 4+和Co 2+共掺杂的氧化锌;或者, The electron transporting material is zinc oxide co-doped including Co 4+ and Co 2+ ; or
    所述电子传输材料为包括Cr 4+和Cr 2+共掺杂的氧化锌。 The electron transporting material is zinc oxide co-doped including Cr 4+ and Cr 2+ .
  3. 如权利要求2所述的电子传输材料,其特征在于,所述电子传输材料为包括Fe 3+和Fe 2+共掺杂的氧化锌,所述电子传输材料中Fe 3+与Fe 2+的摩尔比为20:1-1:1;或者, Said electron transport material as claimed in claim 2, wherein the electron transport material include Fe 2+ and Fe 3+ co-doped zinc oxide, the electron transport material, and Fe 3+ of Fe 2+ The molar ratio is 20:1-1:1; or,
    所述电子传输材料为包括Mn 4+和Mn 2+共掺杂的氧化锌,所述电子传输材料中Mn 4+和Mn 2+的摩尔比为10:1-2:3;或者, The electron transporting material is zinc oxide co-doped including Mn 4+ and Mn 2+ , and the molar ratio of Mn 4+ to Mn 2+ in the electron transporting material is 10:1 to 2:3;
    所述电子传输材料为包括Co 4+和Co 2+共掺杂的氧化锌,所述电子传输材料中Co 4+和Co 2+的摩尔比为10:1-2:3;或者, The electron transport material include Co 2+ and Co 4+ co-doped zinc oxide, the molar ratio of the electron transporting material in Co 2+ and Co 4+ is 10: 1-2: 3; or
    所述电子传输材料为包括Cr 4+和Cr 2+共掺杂的氧化锌,所述电子传输材料中Cr 4+和Cr 2+的摩尔比为20:1-1:2。 The electron transporting material is zinc oxide co-doped including Cr 4+ and Cr 2+ , and the molar ratio of Cr 4+ to Cr 2+ in the electron transporting material is 20:1 to 1:2.
  4. 如权利要求3所述的电子传输材料,其特征在于,所述电子传输材料为包括Fe 3+和Fe 2+共掺杂的氧化锌,所述电子传输材料中Fe 3+与Fe 2+的摩尔比为9:5-3:2;或者, Said electron transport material as claimed in claim 3, wherein the electron transport material include Fe 2+ and Fe 3+ co-doped zinc oxide, the electron transport material, and Fe 3+ of Fe 2+ The molar ratio is 9:5-3:2; or,
    所述电子传输材料为包括Mn 4+和Mn 2+共掺杂的氧化锌,所述电子传输材料中Mn 4+和Mn 2+的摩尔比为3:2-1:1;或者, The electron transporting material is zinc oxide co-doped including Mn 4+ and Mn 2+ , and the molar ratio of Mn 4+ to Mn 2+ in the electron transporting material is 3:2-1:1; or
    所述电子传输材料为包括Co 4+和Co 2+共掺杂的氧化锌,所述电子传输材料中Co 4+和Co 2+的摩尔比为3:2-1:1;或者, The electron transport material include Co 2+ and Co 4+ co-doped zinc oxide, the electron transport material, and Co 4+ molar ratio of Co 2+ to 3: 2-1: 1; or
    所述电子传输材料为包括Cr 4+和Cr 2+共掺杂的氧化锌,所述电子传输材料中Cr 4+和Cr 2+的摩尔比为3:2-2:3。 The electron transporting material is zinc oxide co-doped including Cr 4+ and Cr 2+ , and the molar ratio of Cr 4+ to Cr 2+ in the electron transporting material is 3:2 to 2:3.
  5. 如权利要求2所述的电子传输材料,其特征在于,所述电子传输材料为Mn 4+、Mn 2+和Mn 3+共掺杂的氧化锌;或者, The electron transporting material according to claim 2, wherein said electron transporting material is Mn 4+ , Mn 2+ and Mn 3+ co-doped zinc oxide; or
    所述电子传输材料为Co 4+、Co 2+和Co 3+共掺杂的氧化锌;或者, The electron transporting material is Co 4+ , Co 2+ and Co 3+ co-doped zinc oxide; or
    所述电子传输材料为Cr 4+、Cr 2+和Cr 3+共掺杂的氧化锌。 The electron transporting material is Cr 4+ , Cr 2+ and Cr 3+ co-doped zinc oxide.
  6. 一种电子传输材料的制备方法,其特征在于,包括如下步骤:A method for preparing an electron transporting material, comprising the steps of:
    提供锌盐和二价掺杂金属盐,将所述锌盐和所述二价掺杂金属盐溶于第一溶剂中,在碱性条件下得到二价金属离子掺杂的氧化锌纳米颗粒;Providing a zinc salt and a divalent doped metal salt, dissolving the zinc salt and the divalent doped metal salt in a first solvent, and obtaining divalent metal ion doped zinc oxide nanoparticles under alkaline conditions;
    将所述二价金属离子掺杂的氧化锌纳米颗粒分散于第二溶剂中得二价金属离子掺杂的氧化锌胶体溶液;Dispersing the divalent metal ion doped zinc oxide nanoparticles in a second solvent to obtain a divalent metal ion doped zinc oxide colloid solution;
    将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上,进行氧化处理,得金属离子掺杂的所述电子传输材料,所述金属离子为同一种金属元素的不同价态的两种或三种金属离子,且所述金属离子的最低价态为正二价。Depositing the divalent metal ion doped zinc oxide colloid solution on the substrate and performing an oxidation treatment to obtain the electron transporting material doped with metal ions, wherein the metal ions are two different valence states of the same metal element Or three metal ions, and the lowest valence state of the metal ions is positive divalent.
  7. 如权利要求6所述的电子传输材料的制备方法,其特征在于,所述锌盐选自醋酸锌及其水合物、硝酸锌及其水合物、硫酸锌及其水合物和氯化锌及其水合物中的至少一种;和/或,The method of preparing an electron transporting material according to claim 6, wherein the zinc salt is selected from the group consisting of zinc acetate and a hydrate thereof, zinc nitrate and a hydrate thereof, zinc sulfate and a hydrate thereof, and zinc chloride and At least one of hydrates; and/or,
    所述二价掺杂金属盐选自二价铁盐、二价锰盐、二价铬盐和二价钴盐中的至少一种;和/或,The divalent doped metal salt is selected from at least one of a divalent iron salt, a divalent manganese salt, a divalent chromium salt, and a divalent cobalt salt; and/or,
    所述第一溶剂和所述第二溶剂独立选自水、甲醇、乙醇、丙醇、丁醇、乙二醇、乙二醇单甲醚和二甲基亚砜中的至少一种。The first solvent and the second solvent are independently selected from at least one of water, methanol, ethanol, propanol, butanol, ethylene glycol, ethylene glycol monomethyl ether, and dimethyl sulfoxide.
  8. 如权利要求6所述的电子传输材料的制备方法,其特征在于,按二价掺杂金属盐中掺杂金属离子的物质的量占总金属离子的物质的量的摩尔百分数为2%-30%,将所述锌盐和所述二价掺杂金属盐溶于第一溶剂中;其中,所述总金属离子的物质的量是指所述掺杂金属离子的物质的量和锌离子物质的量之和。The method for preparing an electron transporting material according to claim 6, wherein the amount of the metal ion doping substance in the divalent doping metal salt is 2% by mole based on the total metal ion species. %, the zinc salt and the divalent doped metal salt are dissolved in the first solvent; wherein the amount of the total metal ion substance refers to the amount of the metal ion doping substance and the zinc ion substance The sum of the quantities.
  9. 如权利要求8所述的电子传输材料的制备方法,其特征在于,所述二价掺杂金属盐为二价铁盐,按二价铁盐中,Fe 2+的物质的量占总金属离子的物质的量的摩尔百分数为5%-30%,将所述锌盐和所述二价铁盐溶于第一溶剂中; The method for preparing an electron transporting material according to claim 8, wherein the divalent doped metal salt is a divalent iron salt, and in the divalent iron salt, the amount of Fe 2+ is in the total metal ion. a molar percentage of the amount of the substance is from 5% to 30%, and the zinc salt and the divalent iron salt are dissolved in the first solvent;
    或者,所述二价掺杂金属盐为二价锰盐,按二价锰盐中,Mn 2+的物质的量占总金属离子的物质的量的摩尔百分数为2%-25%,将所述锌盐和所述二价锰盐溶于第一溶剂中; Alternatively, the divalent doped metal salt is a divalent manganese salt, and in the divalent manganese salt, the molar percentage of the amount of the substance of the Mn 2+ to the total metal ion is 2% to 25%. Said zinc salt and said divalent manganese salt are dissolved in the first solvent;
    或者,所述二价掺杂金属盐为二价钴盐,按二价钴盐中,Co 2+的物质的量占总金属离子的物质的量的摩尔百分数为2%-25%,将所述锌盐和所述二价钴盐溶于第一溶剂中; Alternatively, the divalent doped metal salt is a divalent cobalt salt, and in the divalent cobalt salt, the molar percentage of the amount of the substance of Co 2+ to the total metal ion is 2% to 25%. Said zinc salt and said divalent cobalt salt are dissolved in the first solvent;
    或者,所述二价掺杂金属盐为二价铬盐,按二价铬盐中,Cr 2+的物质的量占总金属离子的物质的量的摩尔百分数为2%-20%,将所述锌盐和所述二价铬盐溶于第一溶剂中。 Alternatively, the divalent doped metal salt is a divalent chromium salt, and in the divalent chromium salt, the molar percentage of the amount of the substance of Cr 2+ to the total metal ion is 2% to 20%. The zinc salt and the divalent chromium salt are dissolved in the first solvent.
  10. 如权利要求9所述的电子传输材料的制备方法,其特征在于,所述二价掺杂金属盐为二价铁盐,按二价铁盐中,Fe 2+的物质的量占总金属离子的物质的量的摩尔百分数为14%-22%,将所述锌盐和所述二价铁盐溶于第一溶剂中; The method for preparing an electron transporting material according to claim 9, wherein the divalent doped metal salt is a divalent iron salt, and in the divalent iron salt, the amount of Fe 2+ is in the total metal ion. a molar percentage of the amount of the substance is from 14% to 22%, and the zinc salt and the divalent iron salt are dissolved in the first solvent;
    或者,所述二价掺杂金属盐为二价锰盐,按二价锰盐中,Mn 2+的物质的量占总金属离子的物质的量的摩尔百分数为12%-18%,将所述锌盐和所述二价锰盐溶于第一溶剂中; Alternatively, the divalent doped metal salt is a divalent manganese salt, and in the divalent manganese salt, the molar percentage of the amount of the substance of the Mn 2+ to the total metal ion is 12% to 18%. Said zinc salt and said divalent manganese salt are dissolved in the first solvent;
    或者,所述二价掺杂金属盐为二价钴盐,按二价钴盐中,Co 2+的物质的量占总金属离子的物质的量的摩尔百分数为12%-18%,将所述锌盐和所述二价钴盐溶于第一溶剂中; Alternatively, the divalent doped metal salt is a divalent cobalt salt, and in the divalent cobalt salt, the molar percentage of the amount of the substance of Co 2+ to the total metal ion is 12% to 18%. Said zinc salt and said divalent cobalt salt are dissolved in the first solvent;
    或者,所述二价掺杂金属盐为二价铬盐,按二价铬盐中,Cr 2+的物质的量占总金属离子的物质的量的摩尔百分数为10%-14%,将所述锌盐和所述二价铬盐溶于第一溶剂中。 Alternatively, the divalent doped metal salt is a divalent chromium salt, and in the divalent chromium salt, the molar percentage of the amount of the substance of Cr 2+ to the total metal ion is 10% to 14%. The zinc salt and the divalent chromium salt are dissolved in the first solvent.
  11. 如权利要求6所述的电子传输材料的制备方法,其特征在于,按锌离子的物质的量与掺杂的二价金属离子的物质的量之和与OH 的物质的量之比为1:(1.5-2.5),将所述锌盐和所述二价掺杂金属盐溶于第一溶剂中,在碱性条件下得到二价金属离子掺杂的氧化锌纳米颗粒溶液。 The method of producing an electron transporting material according to claim 6, wherein the ratio of the amount of the substance of the zinc ion to the amount of the substance of the doped divalent metal ion and the amount of the substance of the OH - is 1 : (1.5-2.5), the zinc salt and the divalent doped metal salt are dissolved in a first solvent to obtain a divalent metal ion doped zinc oxide nanoparticle solution under basic conditions.
  12. 如权利要求6所述的电子传输材料的制备方法,其特征在于,A method of producing an electron transporting material according to claim 6, wherein
    将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上,进行氧化处理的步骤包括:将所述二价金属离子掺杂的氧化锌胶体溶液沉积在基板上,在氧气环境中,对所述基板进行加热处理。Depositing the divalent metal ion doped zinc oxide colloid solution on the substrate, and performing the oxidizing treatment comprises: depositing the divalent metal ion doped zinc oxide colloid solution on the substrate, in an oxygen environment, The substrate is subjected to heat treatment.
  13. 如权利要求12所述的电子传输材料的制备方法,其特征在于,所述二价掺杂金属盐为二价铁盐,加热处理温度为100-300℃,加热处理时间为0.5-6h;The method for preparing an electron transporting material according to claim 12, wherein the divalent doped metal salt is a divalent iron salt, the heat treatment temperature is 100-300 ° C, and the heat treatment time is 0.5-6 h;
    或者,所述二价掺杂金属盐为二价锰盐,加热处理温度为200-400℃,加热处理时间为1-8h;Or the divalent doped metal salt is a divalent manganese salt, the heat treatment temperature is 200-400 ° C, and the heat treatment time is 1-8 h;
    或者,所述二价掺杂金属盐为二价钴盐,加热处理温度为300-400℃,加热处理时间为4-12h;Or the divalent doped metal salt is a divalent cobalt salt, the heat treatment temperature is 300-400 ° C, and the heat treatment time is 4-12 h;
    或者,所述二价掺杂金属盐为二价铬盐,加热处理温度为100-300℃,加热处理时间为0.5-6h。Alternatively, the divalent doped metal salt is a divalent chromium salt, the heat treatment temperature is 100-300 ° C, and the heat treatment time is 0.5-6 h.
  14. 一种量子点发光二极管,包括阳极、阴极以及位于所述阳极和所述阴极之间的量子点发光层,所述阴极和所述量子点发光层之间设置有电子传输层,所述电子传输层由权利要求1-5任一项所述的电子传输材料组成。A quantum dot light emitting diode comprising an anode, a cathode and a quantum dot luminescent layer between the anode and the cathode, an electron transport layer disposed between the cathode and the quantum dot luminescent layer, the electron transport The layer consists of the electron transporting material of any of claims 1-5.
  15. 一种量子点发光二极管的制备方法,所述量子点发光二极管为反置型量子点发光二极管,且所述量子点发光二极管包括电子传输层,其特征在于,所述制备方法包括如下步骤:A method for preparing a quantum dot light emitting diode, wherein the quantum dot light emitting diode is an inverted quantum dot light emitting diode, and the quantum dot light emitting diode comprises an electron transport layer, wherein the preparation method comprises the following steps:
    提供基板,所述基板上设置有阴极;Providing a substrate on which a cathode is disposed;
    利用权利要求6-13任一项所述的制备方法在所述阴极上制备电子传输材料,形成所述电子传输层。An electron transporting material is prepared on the cathode by the preparation method according to any one of claims 6 to 13 to form the electron transporting layer.
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