WO2019126330A1 - Revêtement conducteur transparent pour panneau à effleurement capacitif contenant de l'argent ayant une résistivité accrue - Google Patents

Revêtement conducteur transparent pour panneau à effleurement capacitif contenant de l'argent ayant une résistivité accrue Download PDF

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Publication number
WO2019126330A1
WO2019126330A1 PCT/US2018/066513 US2018066513W WO2019126330A1 WO 2019126330 A1 WO2019126330 A1 WO 2019126330A1 US 2018066513 W US2018066513 W US 2018066513W WO 2019126330 A1 WO2019126330 A1 WO 2019126330A1
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WO
WIPO (PCT)
Prior art keywords
layer
touch panel
silver
capacitive touch
coating
Prior art date
Application number
PCT/US2018/066513
Other languages
English (en)
Inventor
Alexey Krasnov
Willem Den Boer
Jason Blush
Eric W. AKKASHIAN
Original Assignee
Guardian Glass, LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US15/850,002 external-priority patent/US10222921B2/en
Application filed by Guardian Glass, LLC filed Critical Guardian Glass, LLC
Publication of WO2019126330A1 publication Critical patent/WO2019126330A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3655—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating containing at least one conducting layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
    • C03C17/3671—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use as electrodes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3681—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating being used in glazing, e.g. windows or windscreens
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47K—SANITARY EQUIPMENT NOT OTHERWISE PROVIDED FOR; TOILET ACCESSORIES
    • A47K3/00—Baths; Douches; Appurtenances therefor
    • A47K3/28—Showers or bathing douches
    • A47K3/30—Screens or collapsible cabinets for showers or baths

Definitions

  • Example embodiments of this invention relate to a multi-layer conductive coating that is substantially transparent to visible light, contains at least one conductive layer comprising silver that is sandwiched between at least a pair of dielectric layers, and may be used as an electrode and/or conductive trace in a capacitive touch panel.
  • the multi-layer conductive coating may contain a layer of or including zirconium oxide (e.g., Zri/h) and/or silicon nitride in certain embodiments, and may be used in applications such as capacitive touch panels for controlling showers, appliances, vending machines, electronics, electronic devices, and/or the like.
  • the layer of or including zirconium oxide may be provided for improving durability in touch panel applications.
  • the coating includes a silver layer(s) and may be used as an electrode(s) in a capacitive touch panel so as to provide for an electrode(s) transparent to visible light but without much visibility due to the more closely matching visible reflection of the coating on the substrate to that of an underlying substrate in areas where the coating is not present.
  • the coating also has improved conductivity (e.g., smaller sheet resistance R s or smaller emissivity, given a similar thickness and/or cost of deposition) compared to typical ITO coatings used in touch panels.
  • the coating may have increased resistivity, and thus reduced conductivity, compared to pure silver layers of certain coatings, in order to allow the silver-based coating to be more suitable for use as touch panel electrodes.
  • a capacitive touch panel often includes an insulator such as glass, coated with a conductive coating.
  • a conductive coating As the human body is also an electrical conductor, touching the surface of the panel results in a distortion of the panel’s electrostatic field, measurable as a change in capacitance for example.
  • a transparent touch panel may be combined with a display such as a liquid crystal display (LCD) or LED panel to form a touchscreen.
  • a projected capacitive (PROCAP) touch panel which may optionally include an LCD or other display, allows finger or other touches to be sensed through a protective layer(s) in front of the conductive coating.
  • FIGS. 1(a) to 1(g) illustrate an example of a related art projected capacitive touch panel, e.g., see U.S. Patent No. 8,138,425 the disclosure of which is hereby incorporated herein by reference.
  • substrate 11 x-axis conductor 12 for rows, insulator 13, y-axis conductor 14 for columns, and conductive traces 15 are provided.
  • Substrate 11 may be a transparent material such as glass.
  • X-axis conductors 12 and y-axis conductors 14 are typically indium tin oxide (ITO) which is a transparent conductor.
  • ITO indium tin oxide
  • Insulator 13 may be an insulating material (for example, silicon nitride) which inhibits conductivity between x-axis conductors 12 and y-axis conductors 14. Traces 15 provide electrical conductivity between the plurality of conductors and a signal processor (not shown).
  • ITO used for electrodes/traces in small PROCAP touch panels typically has a sheet resistance of at least about 100 ohms/square, which has been found to be too high for certain applications.
  • conventional ITO coatings for touch panels are typically highly crystalline and relatively thick and brittle, and thus in applications involving bending such ITO coatings are subject to failure.
  • x-axis conductor 12 (e.g., ITO) is formed on substrate 11.
  • the ITO is coated in a continuous layer on substrate 11 and then is subjected to a first photolithography process in order to pattern the ITO into x-axis conductors 12.
  • FIG. 1(c) illustrates cross section A-A' of FIG. 1(b), including x-axis conductor 12 formed on substrate 11.
  • insulator 13 is then formed on the substrate 11 over x-axis channel(s) of x-axis conductor 12.
  • FIG. 1(e) illustrates cross section B-B' of FIG.
  • insulator 13 which is formed on substrate 11 and x-axis conductor 12.
  • the insulator islands 13 shown in Figs. l(d)-(e) are formed by depositing a continuous layer of insulating material (e.g., silicon nitride) on the substrate 11 over the conductors 12, and then subjecting the insulating material to a second photolithography, etching, or other patterning process in order to pattern the insulating material into islands 13.
  • y-axis conductors 14 are then formed on the substrate over the insulator islands 13 and x-axis conductors 12.
  • the ITO for y-axis conductors 14 is coated on substrate 11 over 12, 13, and then is subjected to a third photolithography or other patterning process in order to pattern the ITO into y-axis conductors 14. While much of y-axis conductor material 14 is formed directly on substrate 11, the y-axis channel is formed on insulator 13 to inhibit conductivity between x-axis conductors 12 and y-axis conductors 14.
  • FIG. 1(g) illustrates cross section C-C' of FIG. 1(f), including part of an ITO y-axis conductor 14, which is formed on the substrate 11 over insulative island 13 and over an example ITO x-axis conductor 12. It will be appreciated that the process of manufacturing the structure shown in Figs. l(a)-(g) requires three separate and distinct deposition steps and three photolithography type processes, which renders the process of manufacture burdensome, inefficient, and costly.
  • FIG. 1(h) illustrates another example of an intersection of ITO x-axis conductor 12 and ITO y-axis conductor 14 according to a related art projected capacitive touch panel.
  • an ITO layer is formed on the substrate 11 and can then be patterned into x-axis conductors 12 and y-axis conductors 14 in a first photolithography process.
  • an insulating layer is formed on the substrate and is patterned into insulator islands 13 in a second photolithography or etching process.
  • Bridge 16 provides electrical conductivity for a y-axis conductor 14 over an x-axis conductor 12. Again, this process of manufacture requires at least three deposition steps and at least three different photolithography processes.
  • 1(h) may be mutual capacitive devices or self-capacitive devices.
  • a mutual capacitive device there is a capacitor at every intersection between an x-axis conductor 12 and a y- axis conductor 14 (or metal bridge 16).
  • a voltage is applied to x-axis conductors 12 while the voltage of y-axis conductors 14 is measured (and/or vice versa).
  • changes in the local electrostatic field reduce the mutual capacitance.
  • the capacitance change at every individual point on the grid can be measured to accurately determine the touch location.
  • the x-axis conductors 12 and y-axis conductors 14 operate essentially independently.
  • the capacitive load of a finger or the like is measured on each x-axis conductor 12 and y-axis conductor 14 by a current meter.
  • ITO indium tin oxide
  • R s typically at least about 100 ohms/square
  • the conductivity of ITO is not particularly good and its resistivity is high.
  • the ITO layer must be extremely thick (for example, greater than 300 or 400 nm).
  • such a thick layer of ITO is both prohibitively expensive and less transparent.
  • the high sheet resistance of thin layers of ITO limits their use in layouts requiring long narrow traces on touch panels, with an emphasis on large panels. Accordingly, it will be appreciated that there exists a need in the art for touch panel electrodes that are of material which does not suffer from the ITO disadvantage combination of high cost and low conductivity at small thicknesses.
  • Example embodiments of this invention relate to a multi-layer conductive coating that is substantially transparent to visible light, contains at least one conductive layer comprising silver that is sandwiched between at least a pair of dielectric layers, and may be used as an electrode and/or conductive trace in a capacitive touch panel.
  • the multi-layer conductive coating may contain a layer of or including zirconium oxide (e.g., Zr02) and/or silicon nitride in certain embodiments, and may be used in applications such as capacitive touch panels for controlling showers, appliances, vending machines, electronics, electronic devices, and/or the like.
  • the coating has improved conductivity (e.g., smaller sheet resistance R s or smaller emissivity, given a similar thickness and/or cost of deposition) compared to typical ITO coatings used in touch panels.
  • the coating may be used as electrode layers and/or traces in capacitive touch panels such as PROCAP touch panel or any other type of touch panel.
  • the coating may have increased resistivity, and thus reduced conductivity, compared to pure silver layers of certain coatings, in order to allow the silver-based coating to be more suitable for touch panel electrode applications.
  • the increased resistivity, and reduced conductivity, of the silver layer(s) in the coating may be achieved by any of several techniques.
  • the increased resistivity, and reduced conductivity, of the silver layer(s) in the coating may be achieved by doping with silver with an impurity such as one or more of Zn, Pt, Pd, Ti, Al or the like, and/or by replacing crystalline zinc oxide directly under and contacting the silver with another material such as a suitable non-crystalline dielectric, amorphous semiconductor, or metal alloy (e.g., NiCr) in order to increase the silver’s resistivity.
  • an impurity such as one or more of Zn, Pt, Pd, Ti, Al or the like
  • another material such as a suitable non-crystalline dielectric, amorphous semiconductor, or metal alloy (e.g., NiCr) in order to increase the silver’s resistivity.
  • a capacitive touch panel comprising: a glass substrate; a multi-layer transparent conductive coating supported by the glass substrate, the multi-layer transparent conductive coating including at least one conductive layer comprising silver, a dielectric layer located between at least the glass substrate and the conductive layer comprising silver, and a dielectric layer comprising one or more of: zirconium oxide, silicon nitride, and tin oxide located over the conductive layer comprising silver; a plurality of electrodes and a plurality of conductive traces, wherein the electrodes and/or the conductive traces include the multi- layer transparent conductive coating; and processor configured for determining touch position on the touch panel; wherein the plurality of electrodes may or may not be formed substantially in a common plane, and are supported by the glass substrate.
  • the conductive layer comprising silver may be doped.
  • the conductive layer comprising silver may be doped with from about 0.05 to 3.0% (wt.%) [more preferably from 0.1 to 2.0%, and most preferably from 0.1 to 0.5%] of one or more of Zn, Pt, Pd, Ti, and Al.
  • the multi-layer transparent conductive coating may further include: (a) a layer comprising Ni and Cr (or Ni, Cr and Mo) that contacts the layer comprising silver, wherein the layer comprising Ni and Cr (or Ni, Cr and Mo) may be located between at least the glass substrate and the conductive layer comprising silver, (b) a semiconductor layer that contacts the layer comprising silver, wherein the semiconductor layer is located between at least the glass substrate and the conductive layer comprising silver, or (c) a substantially amorphous dielectric layer comprising one or more of silicon oxide, silicon nitride, silicon oxynitride, and titanium oxide that contacts the layer comprising silver, wherein the substantially amorphous dielectric layer is located between at least the glass substrate and the conductive layer comprising silver.
  • FIGS. 1(a) to 1(h) illustrate examples of prior art projected capacitive touch panels.
  • FIG. 2(a) illustrates a top or bottom plan layout of a projected capacitive touch panel according to an exemplary embodiment, that may contain the coating(s) of Figs. 4, 6, 7, and/or 8 as conductive electrode(s) and/or conductive trace(s).
  • FIG. 2(b) illustrates a schematic representation of circuitry for the projected capacitive touch panel of Fig. 2(a), 3, 9, and/or 10.
  • FIG. 3(a) illustrates a top or bottom plan layout of a projected capacitive touch panel according to another example embodiment, that may contain the coating(s) of Figs. 4, 6, 7, and/or 8 as conductive electrode(s) and/or conductive trace(s).
  • FIG. 3(b) illustrates a top or bottom plan layout of a projected capacitive touch panel electrode arrangement according to another example embodiment, that may contain the coating(s) of Figs. 4, 6, 7, and/or 8 as conductive electrode(s) and/or conductive trace(s).
  • FIG. 3(c) illustrates a top or bottom plan layout of a projected capacitive touch panel electrode arrangement according to another example embodiment, that may contain the coating(s) of Figs. 4, 6, 7, and/or 8 as conductive electrode(s) and/or conductive trace(s).
  • FIGS. 4(a)-4(g) are cross-sectional views of various silver-inclusive transparent conductive coatings for use in a touch panel of Figs. 2, 3, 7, 8, 9, 10, 11, 12,
  • FIG. 5 is a percent visible transmission/reflectance vs. wavelength (nm) graph illustrating the visible transmission (TR) percentage and glass side visible reflection (BRA) percentage of a Comparative Example (CE) coating on a glass substrate, compared to those values for the glass substrate alone (Glass-TR, Glass-BRA).
  • FIG. 6 is a percent visible transmission/reflectance vs. wavelength (nm) graph illustrating the visible transmission (TR) and glass side visible reflection (BRA) of an example coating of Fig. 4(a) according to an example embodiment of this invention on a glass substrate, demonstrating that it is transparent to visible light and has glass side visible reflectance more closely matched to that of the glass substrate compared to the CE in Fig. 5.
  • FIG. 7 is a cross sectional view of a touch panel assembly according to an example embodiment of this invention, including a touch panel according to any of Figs. 2-4, 6, 8-10 coupled to a liquid crystal panel, for use in electronic devices such as portable phones, portable pads, computers, and/or so forth.
  • FIG. 8(a) is a percent visible transmission/reflectance vs. wavelength (nm) graph illustrating the visible transmission (CGN-TR or TR) and glass side visible reflection (CGN-BRA or BRA) of an example coating of Fig. 4(b) according to another example embodiment of this invention, demonstrating that it is transparent to visible light and has a glass side visible reflectance more closely matched to the reflectance of the glass substrate alone compared to the CE.
  • Fig. 8(a) also illustrates the visible
  • Glass-TR glass-TR
  • visible reflectance Glass-BRA
  • FIG. 8(b) is a percent visible transmission/reflectance vs. wavelength (nm) graph illustrating the visible transmission (CGN-TR or TR) and glass side visible reflection (CGN-BRA or BRA) of an example coating of Fig. 4(c) according to another example embodiment of this invention, demonstrating that it is transparent to visible light and has a glass side visible reflectance more closely matched to the reflectance of the substrate compared to the CE.
  • FIG. 9 illustrates a top or bottom plan layout of a low resolution capacitive touch panel according to another example embodiment, that may contain the coating(s) of Figs. 4, 6, 7, 8 as conductive electrode(s) and/or conductive trace(s).
  • FIG. 10 is a cross sectional view of a low resolution capacitive touch panel according to another example embodiment where the substrate supporting the coating of this invention of Fig. 9 may be laminated to another substrate (e.g., glass) via a polymer inclusive interlayer such as PVB or EVA.
  • a polymer inclusive interlayer such as PVB or EVA.
  • FIG. 11 is a flow chart of a process for making the transparent conductive coating pattern according to any of Figs. 2, 3, 4, 7, 8, 9, or 10 according to an example embodiment of this invention.
  • FIG. 12 is a flow chart of a process for making the transparent conductive coating pattern according to any of Figs. 2, 3, 4, 7, 8, 9, or 10 according to another example embodiment of this invention.
  • FIG. 13 is a flow chart of a process for making the transparent conductive coating pattern according to any of Figs. 2, 3, 4, 7, 8, 9, or 10 according to another example embodiment of this invention.
  • FIG. 14 is a flow chart of a process for making the transparent conductive coating pattern according to any of Figs. 2, 3, 4, 7, 8, 9, or 10 according to another example embodiment of this invention.
  • FIG. 15 is a cross sectional view of a capacitive touch panel according to an example embodiment of this invention, including the transparent conductive coating pattern according to any of Figs. 2, 3, 4, 7, 8, 9, or 10 on surface #2, and an additional functional film provided on the surface adapted to be touched by a user.
  • FIG. 16 is a cross sectional view of a capacitive touch panel according to another example embodiment of this invention, including the transparent conductive coating pattern according to any of Figs. 2, 3, 4, 7, 8, 9, or 10 on surface #3, and an additional functional film provided on the surface adapted to be touched by a user.
  • FIG. 17 is a cross sectional view of a monolithic capacitive touch panel according to another example embodiment of this invention, including the transparent conductive coating pattern according to any of Figs. 2, 3, 4, 7, 8, 9, or 10 on surface #2, and an additional functional film provided on the surface adapted to be touched by a user.
  • Example embodiments of this invention relate to a multi-layer conductive coating 41 that is substantially transparent to visible light, contains at least one conductive layer comprising silver 46 that is sandwiched between at least a pair of layers such as dielectric layers, and may be used as an electrode and/or conductive trace in a capacitive touch panel.
  • Example multi-layer transparent conductive coatings 41 are shown in Figs. 4(a)-(g).
  • the multi-layer conductive coating 41 may contain a layer of or including zirconium oxide (e.g., ZrCh) 75 in certain embodiments, and may be used in applications such as capacitive touch panels for controlling showers (e.g., water on/off control, water temperature control, and/or steam control), appliances, vending machines, music control, thermostat control, electronics, electronic devices, and/or the like.
  • the layer of or including zirconium oxide 75 may be provided for improving durability in touch panel applications.
  • the zirconium oxide and/or DLC layers discussed herein provide for scratch resistance, and resistance to stains and cleaning chemicals in applications such as shower door/wall touch panel applications.
  • the coating includes a silver layer(s) 46 and may be used as an electrode(s) and/or conductive trace(s) in a capacitive touch panel so as to provide for an electrode(s) transparent to visible light but without much visibility due to closely matching visible reflection of the coating on the substrate to that of an underlying substrate in areas where the coating is not present.
  • the coating 41 has improved conductivity (e.g., smaller sheet resistance R s or smaller emissivity, given a similar thickness and/or cost of deposition) compared to typical ITO coatings used in touch panels.
  • the coating may be used as electrode layers and/or traces in capacitive touch panels such as PROCAP touch panels or any other type of touch panel.
  • the touch panels discussed herein, including the electrodes and traces of the multi-layer coating 41, preferably have a visible transmission (Ill. A, 2 deg. Obs.) of at least 50%, more preferably of at least 60%, and most preferably of at least 70%.
  • a visible transmission Ill. A, 2 deg. Obs.
  • coating 41 may have increased resistivity, and thus reduced conductivity, compared to pure silver layers of certain coatings, in order to allow the silver-based coating to be more suitable for touch panel electrode applications.
  • the increased resistivity, and reduced conductivity, of the silver layer(s) 46 in the coating 41 may be achieved by any of several techniques.
  • the increased resistivity, and reduced conductivity, of the silver layer(s) 46 in the coating may be achieved by doping with silver with an impurity such as one or more of Zn, Pt,
  • the silver layer 46 of any of Figs. 4(a)-4(g) may be doped with from about 0.05 to 3.0%, more preferably from about 0.1 to 2.0%, and most preferably from about 0.1 to 0.5% (wt. %), of one or more of Zn, Pt, Pd, Ti, Al, or a combination thereof.
  • the increased resistivity, and reduced conductivity, of the silver layer(s) 46 may also or instead be achieved by replacing crystalline zinc oxide 44 directly under and contacting the silver with another material such as a suitable non-crystalline dielectric, amorphous semiconductor, or metal alloy (e.g., NiCr, NiCrMo, etc.) in order to increase the silver’s resistivity (e.g., see the NiCr based layer under the silver in Fig.
  • a suitable non-crystalline dielectric, amorphous semiconductor, or metal alloy e.g., NiCr, NiCrMo, etc.
  • a capacitive touch panel that includes a glass substrate 40; a multi-layer transparent conductive coating 41 supported by the glass substrate 40.
  • the multi-layer transparent conductive coating 41 may include at least one conductive layer comprising silver 46, a dielectric layer under the conductive layer comprising silver 46, and a dielectric layer comprising one or more of silicon nitride 50, tin oxide 49, titanium oxide 48, NiCrOx 47 and/or zirconium oxide 75 over the conductive layer comprising silver 46, a plurality of electrodes and a plurality of conductive traces, wherein the electrodes and/or the conductive traces of the touch panel are made of the multi-layer transparent conductive coating 41.
  • a processor may be provided for detecting touch position on the touch panel; wherein the electrodes, and the conductive traces may be formed substantially in a common plane substantially parallel to the glass substrate 40, and a plurality of the electrodes are electrically connected to the processor by conductive traces.
  • the glass substrate may be heat treated (e.g., thermally tempered).
  • Increased resistivity, and reduced conductivity, of the silver in coating 41 compared to pure silver in certain coatings may be achieved by, for example, one or both of: (a) doping the conductive silver layer 46 with an impurity such as one or more of Zn, Pt, Pd, Ti, Al, or a combination thereof, and/or (b) replacing crystalline zinc oxide directly under the conductive silver 46 with a suitable non-crystalline dielectric [e.g., silicon oxide (e.g., S1O2), silicon oxynitride, silicon nitride (e.g., S13N4), titanium oxide (e.g., T1O2), or zinc stannate], amorphous semiconductor (e.g., a-Si), or metal alloy (e.g., NiCr, NiCrMo, or the like).
  • a suitable non-crystalline dielectric e.g., silicon oxide (e.g., S1O2), silicon oxynitride, silicon nitride (
  • the multi-layer transparent conductive coating 41 (and thus silver based layer 46 in certain example embodiments) may have a sheet resistance (R s ) of less than or equal to about 40 ohms/square, more preferably less than or equal to about 20
  • the multi-layer transparent conductive coating 41, and thus silver based layer 46, may have a resistivity of from 30 x 10 7 to 90 x 10 7 W-crn, more preferably from 40 x 10 7 to 80 x 10 7 W-crn (ohm cm).
  • FIG. 2(a) illustrates a top or bottom plan layout of a projected capacitive touch panel according to an exemplary embodiment, that may contain the multi-layer conductive transparent coating 41 of Figs. 4, 6, 7, and/or 8 as conductive electrode(s) x, y and/or conductive trace(s) 22.
  • touch panel 20 is provided.
  • Touch panel 20 includes a matrix of electrodes x, y including n columns and m rows, provided on a substrate 40 such as a glass substrate.
  • the glass substrates may also include an antireflective (AR) layer in certain example embodiments.
  • AR antireflective
  • the matrix of row/column electrodes x, y may be provided on the side of the substrate (e.g., glass substrate 40) that is opposite the side touched by person(s) using the touch panel, in order to prevent corrosion of the silver-based coating 41 by human finger touches.
  • the glass substrate 40 is typically located between (a) the finger and (b) the matrix of row/column electrodes x, y and conductive traces 22.
  • the matrix of row/column electrodes x, y and traces may be provided on the side of the substrate (e.g., glass substrate 40) that is touched by person(s) using the touch panel, such as in shower door application, glass wall applications, and/or the like, for example in situations where only one glass substrate is provided.
  • Change in capacitance between adjacent row and column electrodes in the matrix as a result of the proximity of a finger or the like is sensed by the electronic circuitry, and the connected circuitry can thus detect where the panel is being touched by a finger or the like.
  • the electronic circuitry can thus detect where the panel is being touched by a finger or the like.
  • row 0 includes row electrodes xo,o, xi,o, X2,o, etc., through x n, o and columns 0, 1 and 2 respectively include column electrodes yo, yi, y2, etc., through y n.
  • the x electrodes in a column direction may also be grouped for column sensing. The number of row and column electrodes is determined by the size and resolution of the touch panel. In this example, the top-right row electrode is xn,m. Each row electrode xo,o-xn,m of touch panel 20 is electrically connected to interconnect area 21 and corresponding processing
  • Each column electrode yo-yn is also electrically connected to interconnect area 21 and corresponding processing
  • the conductive traces 22 are preferably formed of the same transparent conductive material (multilayer conductive transparent coating 41) as the row and column electrodes (e.g., same material as at least row electrodes xo,o, xi,o, X2,o, etc.).
  • the matrix of row and column electrodes x, y and corresponding traces 22 can be formed on the substrate (e.g., glass substrate) 40 by forming the coating 41 (e.g., by sputter-depositing the coating 41) on the substrate 40 and by performing only one (or maximum two) photolithography and/or other patterning process in order to pattern the coating 41 into the conductive electrodes x, y and/or conductive traces 22.
  • the silver-inclusive coating e.g., see example coating 41 in Figs.
  • the row electrodes xo,o-xn,m, column electrodes yo-yn , and traces 22 do not overlap as viewed from above/below, the row electrodes xo,o-xn,m, column electrodes yo- yn, and traces 22 may be formed on the same plane parallel (or substantially parallel) to glass substrate 40 on which the electrodes and traces are formed. And no insulating layer between electrodes x and y is needed in certain example embodiments. Significant portions of traces 22 may also be parallel (or substantially parallel) to the column electrodes in the plane parallel (or substantially parallel) to the substrate 40.
  • touch panel 20 may be made via a smaller number of photolithography or laser patterning steps while achieving traces that achieve sufficient transparency and conductivity, thereby reducing production costs and resulting in a more efficient touch panel for use in a display assembly or the like.
  • FIG. 2(b) illustrates a schematic representation of circuitry for the touch panel 20 illustrated in FIG. 2(a), according to exemplary embodiments.
  • touch panel 20 there is a capacitance between each row electrode and the adjacent column electrode (for example, between row electrode xo,o and column electrode yo).
  • This capacitance can be measured by applying a voltage to a column electrode (for example, column electrode yo) and measuring the voltage of an adjacent row electrode (for example, row electrode xo,o).
  • a column electrode for example, column electrode yo
  • an adjacent row electrode for example, row electrode xo,o
  • changes in the local electrostatic field reduce the mutual capacitance.
  • the capacitance change at individual points on the surface can be measured by measuring each pair of row electrodes and column electrodes in sequence.
  • each row electrode in the same row may be electrically connected together (as shown in F/ig. 2(b)).
  • interconnection of the first row segments to each other, second row segments to each other, etc. may be made on a flexible circuit(s) attached at the periphery of the touch panel in the interconnection area, so that no cross-overs are needed on the glass substrate 40.
  • a voltage is applied to a column electrode and the voltage of each row is measured in sequence before the process is repeated with a voltage applied to another column.
  • each trace 22 may be connected to signal processor 25 and the voltage of each trace 22 may be measured individually. The same capacitance may be measured by applying a voltage to a row electrode and measuring the voltage on an adjacent column electrode rather than applying a voltage to a column electrode and measuring the voltage of an adjacent row electrode.
  • Signal processing may be performed by signal processor 25.
  • Signal processor 25 may be one or more hardware processors, may include volatile or non-volatile memory, and may include computer-readable instructions for executing the signal processing.
  • Signal processor 25 is electrically connected to the column electrodes yo-yn and electrically connected to the row electrodes xo,o-xn,m through the traces 22.
  • Signal processor 25 may or may not be located on the same plane as row electrodes xo,o-xn,m, column electrodes yo-yn, and traces 22 (for example, in interconnect area 21 of FIG. 2(a)).
  • FIG. 3(a) illustrates a top or bottom plan layout of a projected capacitive touch panel according to another example embodiment, that includes the coating 41 of any of Figs. 4(a)-(g), 6, 7, and/or 8 patterned to form the conductive electrode(s) x, y and/or conductive trace(s) 22.
  • touch panel 30 is similar to touch panel 20 of FIG. 2(a), except that touch panel 30 is divided into upper section 31 and lower section 32, each of which includes a matrix of electrodes x, y including n columns and m rows.
  • row 0 of upper section 31 includes row electrodes co,o, xi,o, x2,o, etc., through c ,o.
  • Upper section 31 also includes column electrodes yo, yi, y2, etc., through y n.
  • lower section 32 would also include row electrodes, and column electrodes yo-yn that may be electrically separate from the column electrodes yo-yn of the upper section 31.
  • lower section 32 also includes a matrix of row electrodes including n columns and m rows, and n column electrodes. Lower section 32 may have more or less rows than upper section 31 in different example embodiments.
  • the number of row and column electrodes of touch panel 30 is determined by the size and resolution of the touch panel.
  • Each column electrode of upper section 31 is electrically connected to interconnect area 21, and each row electrode of upper section 31 is electrically connected to interconnect area 21 by a trace 22.
  • traces may or may not be used for connecting the column electrodes of upper section 31 to the interconnect area.
  • Each column electrode of lower section 32 is electrically connected to interconnect area 21' and each row electrode of lower section 32 is electrically connected to interconnect area 21 ' by a trace 22.
  • traces may or may not be used for connecting the column electrodes of the lower section 32 to the interconnect area 21’ .
  • touch panel 30 is similar to touch panel 20 in that there is a capacitance between each row electrode and the adjacent column electrode which may be measured by applying a voltage to a column electrode and measuring the voltage of an adjacent row electrode (or, alternatively, by applying a voltage to a row electrode and measuring the voltage of an adjacent column electrode).
  • FIGS. 3(b) and 3(c) illustrate top or bottom plan layouts of a portion of a projected capacitive touch panel according to further example embodiments, that includes the coating 41 of any of Figs. 4(a)-(g), 6, 7, and/or 8 patterned to form the conductive electrode(s) x, y and/or conductive trace(s) 22.
  • An example electrode configuration of a pro-cap sensor may utilize a single transparent conductive coating 41 patterned into the form of parallel electrode stripes as shown in either Fig. 3(b) of Fig. 3(c). In Fig. 3(b), the electrodes stripes are fairly straight, while in Fig. 3(c) one or more of the electrode stripes may have a zig-zag shape.
  • These electrode stripes correspond to the alternating receiving (R) and transmitting (T) electrodes connected to a driver.
  • the driver charges the transmitting electrodes (T) with alternating current.
  • the position of a receiving electrode (R) allows the detection of the X coordinate upon touch from a finger, while the output voltage from the transmitting electrode allows the detection of the Y coordinate, thus enabling the positional identification of a single touch or multiple touches.
  • the transmitting electrodes (T) have a higher sheet resistance (reduced conductivity), compared to pure silver in certain coatings so there is a substantial voltage gradient along each transmit electrode to increase the noise-to-signal ratio.
  • resistivity of the two sets of electrodes namely R and T.
  • the silver layer 46 may be sandwiched between at least two dielectric layers, and may use an underlayer (e.g., crystalline zinc oxide 44, which may be doped with Al for example) to attain a higher silver conductivity due to a better crystalline orientation.
  • one of the transmitting electrode(s) architectures may use a zigzag pattern as shown in Fig. 3(c) to reduce the width of each electrode, while increasing its effective length and, thus increasing its sheet resistance. Such a reduction in width, however, makes the
  • embodiments are provided reducing the conductivity of the silver layer 46 to make it conductive enough for the receiving electrodes and, at the same time, resistive enough for an effective use of the transmitting electrodes.
  • the increase in sheet resistance of the silver layer 46 may be done by one of the following methods or by their combination: (a) doping the conductive silver layer 46 with an impurity such as one or more of Zn, Pt, Pd, Ti, Al, or a combination thereof, and/or (b) replacing crystalline zinc oxide directly under the conductive silver 46 with a suitable non-crystalline dielectric [e.g., silicon oxide (e.g., S1O2), silicon oxynitride, silicon nitride (e.g., S13N4), titanium oxide (e.g., T1O2), or zinc stannate], amorphous semiconductor (e.g., a-Si), or metal alloy (e.g., NiCr, NiCrMo, or the like). Doping with some impurities may help make the silver layer 46 more resistive to oxidation and/or environmental degradation.
  • an impurity such as one or more of Zn, Pt, Pd, Ti, Al, or a combination thereof
  • the row electrodes and column electrodes may be formed on the same plane by patterned transparent conductive coating 41, in the manner explained above in connection with Fig. 2. Accordingly, electrode structure x, y for the touch panel 30 of any of Figs. 3(a)-3(c) may be thin in nature and may be patterned with one process (for example, one photolithography process or one laser patterning process) which reduces the production cost of the projected capacitive touch panel.
  • touch panels 20 and 30 described are not limited to the orientations described above and shown in FIGS. 2-3.
  • the terms“row,”“column”“x-axis,” and y-axis” as used in this application are not meant to imply a specific direction.
  • Touch panel 20 of FIG. 2(a) may be modified or rotated such that interconnect area 21 is located in any part of touch panel 20.
  • a transparent conductive coating 41 with lower sheet resistance is used.
  • the silver inclusive coating 41 shown in Fig. 4 any of Figs. 4(a)-(g)) for use in forming the electrodes and traces of Figs. 2-3 is advantageous in this respect because it has a much lower sheet resistance (and thus more conductivity) than typical conventional ITO traces/electrodes.
  • TCC 41 with low sheet resistance, for forming any and/or all of the conductive electrodes and/or conductive traces of Figs. 2-3 are illustrated in Fig. 4 (Figs. 4(a)-4(g)) according to exemplary embodiments of this invention.
  • the low sheet resistance and high transparency of the TCC 41 allow the TCC to form the long narrow traces 22 as well as the row and column electrodes x, y and/or transmit/receive electrodes for example.
  • multilayer transparent conductive coating 41 in an example embodiment is provided, either directly or indirectly, on substrate 40.
  • Substrate 40 may be, for example, glass.
  • an anti- reflective (AR) coating may be provided between the substrate 40 and the coating 41.
  • Coating 41 may include, for example, a dielectric high index layer 43 of or including a material such as titanium oxide or niobium oxide, which may include titanium oxide (e.g., T1O2 or other suitable stoichiometry); a dielectric layer of or including zinc oxide 44, optionally doped with aluminum, to be in contact with the silver-based layer; a silver- based conductive layer 46 on and directly contacting the zinc oxide based layer 44; an upper contact layer 47 including nickel and/or chromium or other suitable material which may be oxided and/or nitrided, that is over and contacting the silver-based conductive layer 46; a dielectric high index layer 48 of or including a material such as titanium oxide or niobium oxide, which may include titanium oxide (e.g., T1O2 or other suitable stoichiometry); a dielectric layer 49 of or including tin oxide (e.g., SnC ); and a dielectric layer 50 of or including silicon nitride
  • Each of the layers in the coating 41 is designed to be substantially transparent (e.g., at least 70% or at least 80% transparent) to visible light.
  • the dielectric high index layer 43 may be fully oxidized or sub-stoichiometric in different example embodiments.
  • the silver layer 46 may or may not be doped with other materials (e.g., Pd, Pt, Zn, Ti and/or Al) in certain example embodiments, as discussed herein.
  • layer 44 may be of or include
  • Upper contact layer 47 may be of or include materials such as NiCr, NiCrOx, NiCrNx, NiCrONx, NiCrMo,
  • the zinc oxide of layer 44 directly under the conductive silver 46 may be replaced with an amorphous or substantially amorphous dielectric [e.g., silicon oxide (e.g., S1O2), silicon oxynitride, silicon nitride (e.g., S13N4), titanium oxide (e.g., T1O2), or zinc stannate], an amorphous semiconductor (e.g., a-Si), or a metal alloy (e.g., NiCr, NiCrMo, or the like) as layer 44, in order to adjust the conductivity of the silver based layer 46 as discussed herein.
  • an amorphous or substantially amorphous dielectric e.g., silicon oxide (e.g., S1O2), silicon oxynitride, silicon nitride (e.g., S13N4), titanium oxide (e.g., T1O2), or zinc stannate
  • an amorphous semiconductor e.g., a
  • the coating 41 is designed to achieve good conductivity via conductive silver based layer 46, while optionally at the same time to reduce visibility by more closely matching is visible reflectance (glass side and/or film side visible reflectance) to the visible reflectance of the supporting substrate 40.
  • the glass side visible reflectance is measured from the side of the coated glass substrate opposite the coating
  • the film side visible reflectance is measured from the side of the coated glass substrate having the coating.
  • Substantial matching of the visible reflectance of the coating 41 and the visible reflectance of the supporting glass substrate 40 reduces visibility of the electrodes and traces formed of the coating material 41.
  • adjusting certain dielectric thicknesses of the Fig. 4(a) coating can surprising improve (reduce) the visibility of the coating 41 and thus make the patterned electrodes and traces of the touch panel less visible to users and therefore more aesthetically pleasing.
  • example thicknesses and materials for the respective sputter-deposited layers of coating 41 on the glass substrate 40 in the Fig. 4(a) embodiment are as follows, from the glass substrate outwardly:
  • glass substrate 40 with coating 41 thereon may be heat treated (e.g., thermally tempered), e.g., after coating, or chemically strengthened before coating.
  • silver-inclusive coating 41 is inexpensive, has a low sheet resistance (preferably less than 40 ohms/square, more preferably less than 20 ohms/square, even more preferably less than about 15 or 10 ohms/square) and maintains high visible transmittance (preferably at least 60%, more preferably at least 70%, more preferably at least 80%, and most preferably at least 84%).
  • the coating 41 is preferably deposited on substantially the entirety of the major surface of the glass substrate 40, and then patterned to form the electrodes and/or traces.
  • the example display assembly shown in Fig. 7 includes a touch panel (20 or 30 or 50) mounted on a liquid crystal display panel (100-300).
  • one or more of the row electrodes, column electrodes, and traces may be formed from coating 41 on the surface of the glass substrate 40 opposite the finger, and the touch panel (20, 30 or 50) may be adhered to the LCD panel via an index-matching adhesive layer 85.
  • the LCD panel includes first and second substrates (e.g., glass substrates) 100, 200 with a liquid crystal layer 300 provided therebetween.
  • the touch panel 20, 30 may optionally be mounted on the LCD panel with a small air gap or bonded to the display with an index-matching adhesive 85.
  • reference numeral 85 in Fig. 7 represents either an air gap or an index matching adhesive between the display and the touch panel. It is noted that for the measurements taken for Figs.
  • an air gap 85 was assumed so that the coating 41 was adjacent an air gap 85.
  • the periphery of the substrate 40 supporting the coating 41 may be bonded to the liquid crystal panel via adhesive or any other suitable type of edge seal material.
  • the pixel pitch for projected capacitive touch panels may, for example, be in the range of from about 6 to 7 mm. Touch location can be determined more accurately for example, to about 1 mm, by signal processing and interpolation. If the line width/spacing for the traces 22 is approximately 10 pm to 20 pm, it can be calculated that a projected capacitive touch panel of at least 20 inches (measured diagonally) is possible for a TCC sheet resistance of about 4 ohms/square. Further optimization of the routing, signal processing and/or noise suppression allows for production of even larger touch panels (for example, up to 40 or 50 inches diagonally). This invention is also applicable to smaller touch panels in certain example embodiments.
  • Example 1 according to this invention and the Comparative Example (CE) are the thicknesses of the dielectric layers 43 and 50.
  • the coating can surprising reduce the visibility of the coating 41 areas on the supporting glass substrate 40 by more closely matching the visible reflectance (e.g., glass side visible reflectance) of the coating 41 on the glass substrate to the visible reflection of the glass substrate 40 alone, and thus make the electrodes and traces of the touch panel less visible to users and therefore more aesthetically pleasing. This is shown in Figs. 5-6 and also in the tables below.
  • FIG. 5 is a percent transmission/reflectance vs. wavelength (nm) graph illustrating the visible transmission (TR) percentage and glass side visible reflection (BRA) percentage of the Comparative Example (CE) coating on a glass substrate, compared to those values for the glass substrate alone (Glass-TR, Glass-BRA).
  • Fig. 5 includes the visible spectrum, as well as some wavelength outside the visible spectrum.
  • the line plot with the“x” through it in Fig. 5 is the glass side visible reflection of the CE coating on the glass substrate 40 (i.e., reflection taken from the side of the finger in Fig. 7), and the line plot in Fig. 5 with the triangle marking through it is the visible reflection of the glass substrate 40 alone in areas where the coating 41 is not present.
  • the difference between these two lines is relevant, because it shows the difference in glass side visible reflection between: (a) areas of the glass substrate 40 where the CE coating is not present (i.e., in non-electrode and non-trace areas), and (b) areas of the glass substrate 40 where the CE coating is present (i.e., in electrode and trace areas).
  • areas of the glass substrate 40 where the CE coating is present i.e., in electrode and trace areas.
  • Fig. 6 is a percent visible transmission/reflectance vs.
  • nm wavelength (nm) graph illustrating the visible transmission (CGN-TR or TR) and glass side visible reflection (CGN-BRA or BRA) of the Example 1 coating of Fig. 4(a) according to an example embodiment of this invention on a glass substrate,
  • Fig. 6 like Fig. 5, also illustrates the visible transmission (Glass-TR) and visible reflectance (Glass-BRA) for the glass substrate alone in areas without the coating on it.
  • the line plot with the“x” through it in Fig. 6 is the glass side visible reflection of the Example 1 coating 41 on the glass substrate 40, and the line plot in Fig. 6 with the triangular marking through it is the visible reflection of the glass substrate 40 alone without the coating 41 on it.
  • the difference between these two lines is relevant, because it shows the difference in visible reflection (from the point of view of the finger in Fig.
  • Example 1 more closely matches the glass side visible reflectance of the coating 41 on the glass substrate 40 to the visible reflection of the glass substrate 40 in areas where the coating is not present, and thus make the electrodes and traces of the touch panel less visible to users and therefore more aesthetically pleasing.
  • Example (CE) and Example 1 where at 550 nm TR is visible transmission, RA is film side visible reflectance which is measured viewing the glass/coating combination from the coating side, and BRA is glass side visible reflectance which is measured viewing the glass/coating combination from the glass side.
  • a* and b* are color values measured with respect to transmissive color [a*(TR) and b*(TR)], and glass side reflective color [a*(BRA and b*(BRA)].
  • the glass side visible reflection (BRA) of the coating 41 on the glass substrate 40 for Example 1 more closely matches the visible reflection of the glass substrate 40 alone (8.20% vs. 8.11%), compared to the CE (5.8% vs. 8.11%).
  • the patterned coating 41 on the glass substrate 40 is much less visible for Example 1 compared to the CE.
  • the coating 41 (unlike the CE) on a glass substrate 40 has a film side visible reflectance (RA) from 550-600 nm of from 7-10%, more preferably from 7.5 to 8.5%. And in certain example embodiments of this invention, the coating 41 (unlike the CE) on a glass substrate 40 has a glass side visible reflectance (BRA) from 550-600 nm of from 7-13%, more preferably from 7-9%, and still more preferably from 7.25 to 8.75% (the BRA for the CE was only 5.8% as seen above).
  • RA film side visible reflectance
  • BRA glass side visible reflectance
  • a 2.0 difference (more preferably no more than a 1.5 or 1.0 difference) at 550 nm and/or 600 nm, or in the range from 550-600 nm, between:
  • Comparative Example is discussed above in connection with comparison to Example 1, it is noted that the coatings of both the CE and Example 1 may be used as the electrodes and/or traces in a touch panel according to example embodiments of this invention.
  • an antireflective (AR) coating may be provided between the glass substrate 40 and the coating 41 of any of Figs. 4(a)-(g) to still more closely match the visible reflectance (glass side and/or film side) of the coating to that of the supporting substrate (glass plus AR coating).
  • the AR coating may be applied across the entire or substantially the entire major surface of the glass substrate 40, and unlike the transparent conductive coating 41, the AR coating need not be patterned in certain example embodiments.
  • an AR coating may in effect be provided as a bottom portion of the coating 41 in order to add AR effect to the coating 41.
  • Fig. 4(b) illustrates a multilayer transparent conductive coating 41 according to another example embodiment which may be provided, either directly or indirectly, substrate 40 in any of the devices or products discussed herein (e.g., see Figs. 2-3, 7 and 9-17).
  • Substrate 40 may be, for example, glass or glass coated with an AR coating.
  • Coating 41 of the Fig. 4(b) embodiment may include, for example, base dielectric layer 61 or of including silicon nitride (e.g., S13N4 or other suitable
  • low index dielectric layer 62 of or including silicon oxide (e.g., S1O2 or other suitable
  • Fig. 4(b) coating 41 are exemplary, so that other material(s) may instead be used and certain layers may be omitted in certain example embodiments.
  • This coating has both low sheet resistance, and has layers designed to reduce visibility of the coating 41 on the supporting glass substrate 40.
  • glass substrate 40 with coating 41 thereon may be heat treated (e.g., thermally tempered), e.g., after coating, or chemically strengthened before coating.
  • 4(b) embodiment is inexpensive, has a low sheet resistance (preferably less than 15 ohms/square, more preferably less than about 10 or 5 ohms/square, with an example being approximately 4 ohms per square) and maintains high visible transmittance (preferably at least 60%, more preferably at least 70%, more preferably at least 80%, and most preferably at least 84%).
  • the coating 41 is preferably deposited on substantially the entirety of the major surface of the glass substrate 40, and then patterned to form the electrodes and/or traces discussed herein.
  • Example 2 utilizes a coating according to the Fig. 4(b) embodiment.
  • the Fig. 4(b) coating can surprisingly reduce the visibility of the coating 41 on the supporting substrate 40, and thus make the electrodes and traces of the touch panel less visible to users and therefore the overall panel more aesthetically pleasing compared to the CE discussed above. This is evidenced, for example, by the comparison below between a Comparative Example (CE) and Example 2 of this invention, where the coatings include from the glass substrate outwardly:
  • Fig. 5 is discussed above, and illustrates properties of the CE.
  • Fig. 8(a) is a percent visible transmission/reflectance vs.
  • Fig. 8(a) also illustrates the visible transmission (Glass-TR) and visible reflectance (Glass-BRA) for just the glass substrate absent the coating.
  • the line plot with the“x” through it in Fig. 8(a) is the glass side visible reflection of the Example 2 coating 41 on the glass substrate 40, and the line plot in Fig. 8(a) with the triangular marking through it is the visible reflection of the glass substrate 40 alone without the coating 41 on it.
  • the difference between these two lines is significant, because it shows the difference in visible reflection (from the point of view of the finger in Fig.
  • Example 2 more closely matches the glass side visible reflectance of the coating 41 on the glass substrate 40 to the visible reflection of the glass substrate 40 in areas where the coating is not present, and thus make the electrodes and traces of the touch panel less visible to users and therefore more aesthetically pleasing.
  • Example (CE) and Example 2 where at 550 nm TR is visible transmission, RA is film side visible reflectance which is measured viewing the glass/coating combination from the coating side, and BRA is glass side visible reflectance which is measured viewing the glass/coating combination from the glass side.
  • a* and b* are color values measured with respect to transmissive color [a*(TR) and b*(TR)], and glass side reflective color [a*(BRA and b*(BRA)].
  • the glass side visible reflection (BRA) of the coating 41 on the glass substrate 40 for Example 2 more closely matches the visible reflection of the glass substrate 40 alone (7.86% vs. 8.11%), compared to the CE (5.8% vs. 8.11%).
  • the patterned coating 41 on the glass substrate 40 is much less visible for Example 2 compared to the CE.
  • the coating 41 (unlike the CE) on a glass substrate 40 has a film side visible reflectance (RA) from 550-600 nm of from 7-10%, more preferably from 7.5 to 8.5%. And in certain example embodiments of this invention, the coating 41 (unlike the CE) on a glass substrate 40 has a glass side visible reflectance (BRA) from 550-600 nm of from 7-13%, more preferably from 7-9%, and still more preferably from 7.25 to 8.75% (the BRA for the CE was only 5.8% as seen above).
  • RA film side visible reflectance
  • BRA glass side visible reflectance
  • a 2.0 difference (more preferably no more than a 1.5 or 1.0 difference) at 550 nm and/or 600 nm, or in the range from 550-600 nm, between: (a) the film side and/or glass side visible reflectance percentage of a coated article including the coating 41 on a glass substrate 40 (in the area where the coating 41 is present), and (b) the visible reflectance percentage of the glass substrate alone in areas where coating 41 is not present.
  • Fig. 8(a) for example (see also Figs. 6 and 8(b)).
  • Example embodiments of this invention have reduced this difference to no more than 2.0, more preferably no more than 1.5, and most preferably no more than 1.0.
  • Fig. 4(c) illustrates a multilayer transparent conductive coating (4E or
  • substrate 40 in any of the devices or products discussed herein (e.g., see Figs. 2-3, 7 and 9-17).
  • substrate 40 may be, for example, glass.
  • AR antireflective
  • The“substrate” in the Fig. 4(c) embodiment may be considered the glass 40 plus the AR section 70 of the coating, as the AR section 70 of the coating 4G need not be patterned along with the rest of the coating 4G, and in such a case the transparent conductive coating of the Fig. 4(c) embodiment may be considered to be made up of just the layers 61, 44, 46, 47 and 50.
  • the multi-layer transparent conductive coating may be considered as 41” which is made up of layers 61, 44, 46, 47 and 50, and the “substrate” may be considered to be the combination of the glass 40 and the AR coating 70.
  • the coating 41 of the Fig. 4(c) embodiment may further include, as section 41”, dielectric layer 61 or of including silicon nitride (e.g., S13N4 or other suitable stoichiometry), which may or may not be doped with Al and/or oxygen; a dielectric layer 44 of or including zinc oxide (optionally doped with Al) or any of the other materials discussed herein in connection with layer 44, to be in contact with the silver-based layer; a silver-based conductive layer 46 on and directly contacting the zinc oxide based layer 44; an upper contact layer 47 including nickel and/or chromium which may be oxided and/or nitrided, that is over and contacting the silver-based conductive layer 46;
  • dielectric layer 61 or of including silicon nitride e.g., S13N4 or other suitable stoichiometry
  • a material such as titanium oxide or niobium oxide, which may include titanium oxide (e.g., TiCk or other suitable stoichiometry); and an outer-most protective dielectric layer 50 of or including silicon nitride and/or silicon oxynitride.
  • Each of the layers in the coating 41 of the Fig. 4(a)-(c) embodiments is designed to be substantially transparent (e.g., at least 70% or at least 80% transparent) to visible light.
  • Silver layer 46 may or may not be doped as discussed herein.
  • the coating 41 of Fig. 4(c) is designed to achieve good conductivity while at the same time to reduce visibility by more closely matching is visible reflectance (glass side and/or film side visible reflectance) to the visible reflectance of the supporting substrate. Substantial matching of the visible reflectance of the coating 41 and the visible reflectance of the supporting substrate reduces visibility of the electrodes and traces formed of the coating material 41. While various thicknesses and materials may be used in layers in different embodiments of this invention, example thicknesses and materials for the respective sputter-deposited layers of coating 41 on the glass 40 in the Fig. 4(c) embodiment are as follows, from the glass outwardly:
  • Fig. 4(c) coating 41 are exemplary, so that other material(s) may instead be used and certain layers may be omitted in certain example embodiments.
  • the coating has both low sheet resistance, and has layers designed to reduce visibility of the coating 41 on the supporting substrate.
  • glass substrate 40 with coating 41 thereon may be heat treated (e.g., thermally tempered), e.g., after coating, or chemically strengthened before coating.
  • 4(c) embodiment is inexpensive, has a low sheet resistance (preferably less than 15 ohms/square, more preferably less than about 10 or 5 ohms/square, with an example being approximately 4 ohms per square) and maintains high visible transmittance (preferably at least 60%, more preferably at least 70%, more preferably at least 80%, and most preferably at least 84%).
  • the coating 41 is preferably deposited on substantially the entirety of the major surface of the glass substrate 40 and then patterned to form the electrodes and traces discussed herein.
  • Example 3 utilizes a coating according to the Fig. 4(c) embodiment.
  • the Fig. 4(c) coating can surprisingly reduce the visibility of the coating 41 on the supporting substrate, and thus make the electrodes and traces of the touch panel less visible to users and therefore the overall panel more aesthetically pleasing compared to the CE discussed above. This is evidenced, for example, by the comparison below between a Comparative Example (CE) and Example 3 of this invention, where the coatings include from the glass outwardly:
  • Fig. 5 is discussed above, and illustrates properties of the CE.
  • Fig. 8(b) is a percent visible transmission/reflectance vs. wavelength (nm) graph illustrating the visible transmission (CGN-TR or TR) and glass side visible reflection (CGN-BRA or BRA) of Example 3 according to another example embodiment of this invention, demonstrating that it is transparent to visible light and has a glass side visible reflectance more closely matched to the reflectance of the substrate compared to the CE.
  • Fig. 8(b) also illustrates the visible transmission (Glass-TR) and visible reflectance (Glass-BRA) for just the glass substrate and AR section 71-75 absent the other layers (61, 44, 46, 47 and 50) of the coating. The line plot with the“x” through it in Fig.
  • the line plot in Fig. 8(b) with the triangular marking through it is the visible reflection of the glass substrate 40 with only the AR section 70-75 thereon.
  • the difference between these two lines is relevant, because it shows the difference in visible reflection (from the point of view of the finger in Fig. 7) between (a) areas of the glass substrate and touch panel where just the AR section of the coating is present (i.e., in non electrode and non-trace areas), and (b) areas of the glass substrate and touch panel where the entire coating 41 is present (i.e., in electrode and trace areas).
  • the larger the difference between these two lines the bottom two lines in the Fig.
  • Example 3 more closely matches the glass side visible reflectance of the coating 41 on the glass substrate 40 to the visible reflection of the supporting substrate (glass plus AR layers), and thus make the electrodes and traces of the touch panel less visible to users and therefore more aesthetically pleasing.
  • Example 3 shows optical characteristics of Example 3, where at 550 nm TR is visible transmission, RA is film side visible reflectance which is measured viewing the glass/coating combination from the coating side, and BRA is glass side visible reflectance which is measured viewing the glass/coating combination from the glass side.
  • a* and b* are color values measured with respect to transmissive color [a*(TR) and b*(TR)], and glass side reflective color [a*(BRA and b*(BRA)].
  • the glass substrate parameters are for the glass substrate with only AR layers 71-75 thereon across the entire substrate 40, and the Example 3 parameters are for the entire coating 41 on the glass substrate 40 (i.e., the AR layers 71-75 may be provided across substantially the entire substrate whereas the layers 61, 44, 46, 47 and 50 may be patterned to form the electrodes and traces).
  • the glass side visible reflection (BRA) of the entire coating 41 on the glass substrate 40 for Example 3 closely matches the visible reflection of the glass substrate 40 with only the AR layers 71-75 thereon (4.99% vs. 4.51%).
  • the patterned coating portion (61, 44, 46, 47 and 50) on the substrate is much less visible for Example 3 compared to the CE.
  • the coating 41 (unlike the CE) of this embodiment on a glass substrate 40 has a glass side visible reflectance (BRA) from 550-600 nm of from 4-13%, more preferably from 4.5- 9%, and still more preferably from 4.5 to 8.75%.
  • BRA glass side visible reflectance
  • a 2.0 difference (more preferably no more than a 1.5 or 1.0 difference) at 550 nm and/or 600 nm, or in the range from 550-600 nm, between: (a) the film side and/or glass side visible reflectance percentage of a coated article including the entire coating 41 on a glass substrate 40 (in the area where the coating 41 is entirely present), and (b) the visible reflectance percentage of the glass substrate areas where only the glass 40 and AR layers 71-75 are present. This can be seen in Fig. 8(b) for example.
  • Fig. 4(d) illustrates a multilayer transparent conductive coating 41 according to another example embodiment which may be provided, either directly or indirectly, on substrate 40 in any of the devices or products discussed herein (e.g., see Figs. 2-3, 7 and 9-17).
  • Substrate 40 may be, for example, glass or glass coated with an AR coating.
  • Coating 41 of the Fig. 4(d) embodiment may include, for example, base dielectric layer 61 or of including silicon nitride (e.g., S13N4 or other suitable
  • DLC diamond-like carbon
  • the DLC of layer 120 may, for example, be any of the DLC materials discussed in any of U.S. Patent Nos. 6,261,693, 6,303,225, 6,447,891, 7,622,161, and/or 8,277,946, which are incorporated herein by reference.
  • Each of the layers in the coating 41 is designed to be substantially transparent (e.g., at least 70% or at least 80% transparent) to visible light.
  • the silver layer 46 may or may not be doped with other materials as discussed herein.
  • Upper contact layer 47 may be of or include materials such as NiCr, NiCrOx, NiCrNx, NiCrONx, NiCrMo, MiCrMoOx, TiOx, or the like.
  • example thicknesses and materials for the respective sputter-deposited layers of coating 41 on the glass 40 in the Fig. 4(d) embodiment are as follows, from the glass outwardly:
  • Fig. 4(e) illustrates a multilayer transparent conductive coating 41 according to another example embodiment which may be provided, either directly or indirectly, on substrate 40 in any of the devices or products discussed herein (e.g., see Figs. 2-3, 7 and 9-17).
  • the Fig. 4(e) coating is the same as the Fig. 4(d) coating, except that layer 120 is not present in the Fig. 4(e) coating.
  • Fig. 4(f) illustrates a multilayer transparent conductive coating 41 according to another example embodiment which may be provided, either directly or indirectly, on substrate 40 in any of the devices or products discussed herein (e.g., see Figs. 2-3, 7 and 9-17).
  • Substrate 40 may be, for example, glass or glass coated with an AR coating.
  • Coating 41 of the Fig. 4(f) embodiment may include, for example, base dielectric layer 61 or of including silicon nitride (e.g., S13N4 or other suitable
  • each of the layers in the coating 41 is designed to be substantially transparent (e.g., at least 70% or at least 80% transparent) to visible light.
  • the silver layer 46 may or may not be doped as discussed herein.
  • Upper and lower contact layers 47 and 101 may be of or include materials such as NiCr, NiCrOx, NiCrNx, NiCrONx, NiCrMo, MiCrMoOx, TiOx, or the like.
  • a layer of or including diamond-like carbon (DLC) or zirconium oxide (e.g,. ZrOi) may be provided as a protective overcoat in the coating 41 over the layer 50 in the Fig. 4(f) embodiment.
  • the zirconium oxide and/or DLC layers discussed herein provide for scratch resistance, and resistance to stains and cleaning chemicals in applications such as shower door/wall touch panel applications.
  • NiCr, NiCrOx, NiCrNx, NiCrONx, NiCrMo, and/or MiCrMoO allows the conductivity of the silver layer 46 to be reduced in a manner that is sometimes desirable, as discussed herein.
  • example thicknesses and materials for the respective sputter-deposited layers of coating 41 on the glass 40 in the Fig. 4(f) embodiment are as follows, from the glass outwardly:
  • Fig. 4(g) illustrates a multilayer transparent conductive coating 41 according to another example embodiment which may be provided, either directly or indirectly, on substrate 40 in any of the devices or products discussed herein (e.g., see Figs. 2-3, 7 and 9-17).
  • Substrate 40 may be, for example, glass or glass coated with an AR coating.
  • Coating 41 of the Fig. 4(g) embodiment may include, for example, base dielectric layer 61 or of including silicon nitride (e.g., S13N4 or other suitable
  • Each of the layers in the coating 41 is designed to be substantially transparent (e.g., at least 70% or at least 80% transparent) to visible light.
  • the silver layer 46 may or may not be doped with other materials as discussed herein.
  • Upper contact layer 47 may be of or include materials such as NiCr, NiCrOx, NiCrNx, NiCrONx, NiCrMo, MiCrMoOx, TiOx, or the like.
  • a layer of or including diamond-like carbon (DLC) may be provided as a protective overcoat in the coating 41 over the layer 75 in the Fig. 4(g) embodiment. Note that layer 47 may optionally be omitted from the Fig. 4(g) embodiment in certain example embodiments of this invention.
  • example thicknesses and materials for the respective sputter-deposited layers of coating 41 on the glass 40 in the Fig. 4(g) embodiment are as follows, from the glass outwardly:
  • the patterned low sheet resistance coatings 41 herein e.g., any of the Fig.
  • Example applications for touch panels discussed herein are interactive storefronts, preferably standalone, but possibly also in combination with a projected image on the glass assembly or with direct view displays, shower controls on glass based shower doors or glass based shower walls, light controls on glass walls in office buildings, controls for appliances such as ovens, stovetops, refrigerators, and the like.
  • the glass substrate 40 may be flat or curved (e.g., heat bent) in different embodiments of this invention.
  • the silver based coatings 41 discussed herein are advantageous with respect to bent substrates, because conventional ITO coatings for touch panels are typically highly crystalline and relatively thick and brittle when bent, which can readily lead to failure of the ITO.
  • the glass or plastic substrate 40 may be bent for example via heat bending, cold lamination, or any other suitable technique, and may end up with a curvature radius after bending of from about 0.05 to 100 nm.
  • Low resolution touch panels on glass allow the user to select information or otherwise interact with the glass surface while simultaneously viewing what’s behind the glass. In a standalone configuration, for example, the touch panel may be operated from both sides of the glass panel.
  • Low resolution capacitive touch panels may be for example an array of 5 x 5 touch buttons, each about a square inch and separated by about half an inch, as shown in Fig. 9.
  • the touch principle of operation may be self-capacitance which can detect gloved fingers as well as bare fingers.
  • the lower resolution touch interface is easier to make than a multi-touch panel on top of a high resolution LCD, because the minimum feature size for the patterning coating 41 by laser, photolithography or other method can be much larger.
  • the minimum feature size for the traces could be about 1 mm, so that the requirements for pinholes, scratches and other defects in the glass and in the coating are greatly relaxed. In other words, it allows the use of standard soda lime glass 40 and coatings 41 produced in a horizontal architectural coater.
  • the wider traces (e.g ⁇ 1 mm) also reduce the resistance and signal delay from the touch electrodes.
  • Figs. 2-8 may be used in the Fig. 10 embodiment, as well as in the Fig. 7 lamination embodiment), to further protect the patterned silver based coating 41 from corrosion in a standalone application
  • the touch panel substrate 40 (with or without an AR coating thereon between 40 and 41) is laminated to another glass substrate 45 with PVB, EVA, or other polymer inclusive lamination material 52.
  • the PVB 52 based laminating layer for example will encapsulate the patterned coating 41, so that corrosion is further inhibited.
  • the touch panel need not include the second substrates or the laminating layer in certain instances and may be made up of the glass substrate 40 and the electrodes/traces/circuitry discussed herein.
  • Figs. 15-17 are cross sectional views of capacitive touch panels according to various embodiments of this invention that include additional functional film 300.
  • Fig. 15 is a cross sectional view of a capacitive touch panel according to an example embodiment of this invention, including the transparent conductive coating pattern 41 according to any of Figs. 2, 3, 4 (any of 4(a)-(g)), 7, 8, 9, or 10 on surface #2, and an additional functional film 300 provided on the surface adapted to be touched by a user. Note the user’s finger shown in Fig. 15.
  • Fig. 16 is a cross sectional view of a capacitive touch panel according to another example embodiment of this invention, including the transparent conductive coating pattern 41 according to any of Figs. 2, 3, 4,
  • Fig. 17 is a cross sectional view of a monolithic capacitive touch panel according to another example embodiment of this invention, including the transparent conductive coating pattern 41 according to any of Figs.
  • the Fig. 17 monolithic embodiment may be designed for the user to touch either major surface of the touch panel.
  • An interconnect 400 such as a flexible circuit, is provided for allowing the electrodes 41 of the touch panel to communicate with processing circuitry such as the processor discussed above.
  • Functional film 300 and/or 301 in Figs. 15-17 may be made up of one or more layers, and may be one or more of: an index-matching film, an antiglare film, an anti-fingerprint film, and anti-microbial film, a scratch resistant film, and/or an antireflective (AR) film. Unlike the electrode/trace coating 41, functional films 300 and 301 need not be patterned and may be applied across substantially the entirety of the substrate 40 (or 45).
  • index matching film 85 when functional film 300 and/or 301 is an index matching (see also index matching film 85 in Fig. 7), this is provided to reduce the refractive index different between the areas/surfaces adjacent the two sides of the index matching film, in order to reduce visible reflections and render the touch panel more aesthetically pleasing.
  • Laminating layers 52 in Figs. 15-16 may also be index matching films. Index matching films may or may not be adhesive types in different embodiments of this invention.
  • the index matching film has a refractive index value that is valued between the respective refractive index values of the areas/surfaces on both sides of the index matching film.
  • the index matching film 85 has a refractive index value between the refractive index values of coating 41 and substrate 200.
  • the index matching film 300 would have a refractive index value between the refractive index values of substrate 40 and air.
  • Fig. 7 the index matching film 85 has a refractive index value between the refractive index values of coating 41 and substrate 200.
  • the index matching film 300 would have a refractive index value between the refractive index values of substrate 40 and air.
  • Example index matching films include optically clear adhesives and index matching laminating material.
  • Figs. 15-17 When functional film 300 in Figs. 15-17 is an anti-fingerprint film, this is provided to reduce visibility of fingerprints on the touch panel to render the touch panel more aesthetically pleasing.
  • Example anti-fingerprint films that may be used are described in LT.S. Patent No. 8,968,831, which is incorporated herein by reference.
  • Anti- fingerprint or anti-smudge films may be obtained for example with an oleo-phobic coating and/or roughened surface.
  • Spray-on anti-fingerprint coatings such as fluorocarbon compounds, with limited durability, may also be used.
  • Such film may increase the initial contact angle of surface #1 (for sessile drop of water) of the touch panel to a value of at least 90 degrees, more preferably at least 100 degrees, and most preferably at least 110 degrees.
  • Example anti-microbial films that may be used include silver colloids, rough titanium oxide, porous titanium oxide, doped titanium oxide, and may be described in U.S. Patent Document Nos. 8,647,652, 8,545,899, 7,846,866, 8,802,589, 2010/0062032, 7,892,662, 8,092,912, and 8,221,833, which are all incorporated herein by reference.
  • Example scratch resistant films may be made of ZrCh or DLC.
  • the DLC may for example be any of the DLC materials discussed in any of U.S. Patent Nos. 6,261,693, 6,303,225, 6,447,891, 7,622,161, and/or 8,277,946, which are incorporated herein by reference.
  • AR film 300 in Figs. 15-17 is an antireflective (AR) film
  • this is provided to reduce visible reflections off the front of the touch panel to render the panel more aesthetically pleasing.
  • Example AR films that may be used are described in U.S. Patent Nos. 9,556,066, 9,109,121, 8,693,097, 7,767,253, 6,337,124, and 5,891,556, the disclosures of which are hereby incorporated herein by reference.
  • the AR film may be part of the multi-layer transparent conductive coating (e.g., see AR film 70 which is part of coating 4G in Fig. 4(c)).
  • electrode patterns other than a rectangular array of buttons can be envisioned including patterns allowing swiping, circular patterns for dials, and so forth.
  • Potential applications include storefronts, commercial refrigerators, appliances, glass walls in office or other environments, transportation, dynamic glazing, vending machines, and so forth, where a see-through low resolution touch panel is beneficial as a user interface.
  • the sputter-deposited coating 41 discussed above in connection with Figs. 2-10 may be formed and patterned in any of a variety of manners.
  • the sputter-deposited coating 41 may be formed by inkjet printing and lift-off (see Fig. 11), metal shadow mask patterning (see Fig. 12), photolithograph (see Fig. 13), or laser patterning (see Fig. 14).
  • a capacitive touch panel comprising: a glass substrate; a multi-layer transparent conductive coating supported by the glass substrate, the multi-layer transparent conductive coating including at least one conductive layer comprising silver, a dielectric layer located between at least the glass substrate and the conductive layer comprising silver, and a dielectric layer comprising one or more of: zirconium oxide, silicon nitride, and tin oxide located over the conductive layer comprising silver; a plurality of electrodes and a plurality of conductive traces, wherein the electrodes and/or the conductive traces include the multi layer transparent conductive coating; and processor configured for determining touch position on the touch panel; wherein the plurality of electrodes are formed substantially in a common plane and are supported by the glass substrate.
  • the conductive layer comprising silver may be doped.
  • the conductive layer comprising silver may be doped with from about 0.05 to 3.0% (wt.%) [more preferably from 0.1 to 2.0%, and most preferably from 0.1 to 0.5%] of one or more of Zn, Pt, Pd, Ti, and Al.
  • the layer over and contacting the conductive layer comprising silver may comprise Ni and/or Cr.
  • the transparent conductive coating may have a sheet resistance of less than or equal to about 40 ohms/square, more preferably less than or equal to about 20 ohms/square.
  • the dielectric layer comprising one or more of zirconium oxide, silicon nitride, and tin oxide may comprise ZrCh.
  • the dielectric layer comprising one or more of zirconium oxide, silicon nitride, and tin oxide, may comprise silicon nitride, optionally further including oxygen and/or aluminum.
  • the dielectric layer located between at least the glass substrate and the conductive layer comprising silver may comprise an oxide of titanium.
  • the dielectric layer located between at least the glass substrate and the conductive layer comprising silver may comprise silicon nitride, optionally including oxygen and/or aluminum.
  • the multi-layer transparent conductive coating may further comprise (a) a layer comprising Ni and Cr (or Ni, Cr and Mo) that contacts the layer comprising silver, wherein the layer comprising Ni and Cr (or Ni, Cr and Mo) may be located between at least the glass substrate and the conductive layer comprising silver, (b) a semiconductor layer that contacts the layer comprising silver, wherein the semiconductor layer is located between at least the glass substrate and the conductive layer comprising silver, or (c) a substantially amorphous dielectric layer comprising one or more of silicon oxide, silicon nitride, silicon oxynitride, and titanium oxide that contacts the layer comprising silver, wherein the substantially amorphous dielectric layer is located between at least the glass substrate and the conductive layer comprising silver.
  • the capacitive touch panel of any of the preceding ten paragraphs may be provided on a glass door, such as a shower door or any other suitable door.
  • the capacitive touch panel of any of the preceding eleven paragraphs may be configured to control a shower functionality.
  • the glass substrate may be thermally tempered.
  • the glass substrate may further support a functional film, such as an antiglare film, an anti-microbial film, and/or an anti-fingerprint film.
  • a functional film such as an antiglare film, an anti-microbial film, and/or an anti-fingerprint film.
  • the functional film unlike the transparent conductive coating, need not be patterned.
  • the functional film may be located on an opposite side of the glass substrate than the transparent conductive coating.
  • the capacitive touch panel of any of the preceding fourteen paragraphs may be coupled to a liquid crystal panel.
  • the capacitive touch panel of any of the preceding fifteen paragraphs may further comprise a laminating layer (e.g., PVB) and another glass substrate, wherein the laminating layer and the multi-layer transparent conductive coating may be provided between the glass substrates.
  • a laminating layer e.g., PVB
  • another glass substrate wherein the laminating layer and the multi-layer transparent conductive coating may be provided between the glass substrates.
  • the touch panel including the electrodes and traces, may have a visible transmission of at least 70%.

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Abstract

L'invention concerne un revêtement conducteur multicouche qui est sensiblement transparent à la lumière visible, contient au moins une couche conductrice contenant de l'argent qui est prise en sandwich entre au moins une paire de couches diélectriques, et peut être utilisé à titre d'électrode et/ou de piste conductrice dans un panneau à effleurement capacitif. Le revêtement conducteur multicouche selon l'invention peut contenir une couche diélectrique constituée par, ou contenant de l'oxyde de zirconium (p. ex., ZrO2) et/ou du nitrure de silicium et peut être utilisé dans des applications telles que les panneaux à effleurement capacitifs pour commander des douches, des appareils électroménagers, des distributeurs automatiques, l'électronique, les dispositifs électroniques et/ou autres. Le revêtement peut avoir une résistivité accrue, et une conductivité par conséquent réduite, comparativement aux couches d'argent pur de certains revêtements, afin de permettre audit revêtement à base d'argent de mieux se prêter à une utilisation à titre d'électrode(s) de panneau à effleurement.
PCT/US2018/066513 2017-12-21 2018-12-19 Revêtement conducteur transparent pour panneau à effleurement capacitif contenant de l'argent ayant une résistivité accrue WO2019126330A1 (fr)

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