WO2019124167A1 - Method for manufacturing marker unit - Google Patents

Method for manufacturing marker unit Download PDF

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Publication number
WO2019124167A1
WO2019124167A1 PCT/JP2018/045542 JP2018045542W WO2019124167A1 WO 2019124167 A1 WO2019124167 A1 WO 2019124167A1 JP 2018045542 W JP2018045542 W JP 2018045542W WO 2019124167 A1 WO2019124167 A1 WO 2019124167A1
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WO
WIPO (PCT)
Prior art keywords
lower substrate
resin
wall
region
substrate
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Application number
PCT/JP2018/045542
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French (fr)
Japanese (ja)
Inventor
康幸 福田
稔典 大田
Original Assignee
株式会社エンプラス
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Publication of WO2019124167A1 publication Critical patent/WO2019124167A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/42—Moulds or cores; Details thereof or accessories therefor characterised by the shape of the moulding surface, e.g. ribs or grooves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/16—Making multilayered or multicoloured articles
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C15/00—Surveying instruments or accessories not provided for in groups G01C1/00 - G01C13/00
    • G01C15/02—Means for marking measuring points
    • G01C15/06—Surveyors' staffs; Movable markers

Definitions

  • the present invention relates to a method of manufacturing a marker unit.
  • AR Augmented Reality
  • visual recognition markers are used to recognize the position, posture, and the like of an object.
  • an AR marker which is a two-dimensional code is generally used as the marker.
  • the AR marker is generally represented graphically on the substrate.
  • VMP variable moire pattern
  • the high precision marker generally has circles serving as measurement reference at the four corners of a square substrate, and the VMP is disposed in the area surrounded by the four circles.
  • a circle that is a measurement reference at the four corners is detected, whereby the measurement area is grasped, and subsequently, the VMP in the measurement area is detected.
  • the detection accuracy of the angle is improved by the measurement standard, the rotation angle may be missed.
  • Patent Document 1 a marker on which the AR, the VMP, and the measurement reference are mounted is also reported (Patent Document 1).
  • Patent Document 1 a marker on which the AR, the VMP, and the measurement reference are mounted.
  • the posture determination unit is, for example, for determining the posture of the object on which the marker unit is disposed.
  • a plurality of convex portions are formed in parallel, and each convex portion has a ridge line and two inclined surfaces whose apexes are the ridge line.
  • the central reference convex portion is formed of black resin
  • the other convex portions are formed of white resin from the ridge line to the reference convex portion, and the ridge line to the reference convex portion
  • the other side is made of black resin.
  • the respective convex portions are formed of a white resin on the half near the center and a black resin on the other half, and a vertex is formed by superimposing both of them.
  • the orientation of the marker unit can be determined from the appearance of the inclined surface formed of white resin and the inclined surface formed of black resin in the posture determination unit.
  • the posture determination unit is molded by two-color molding
  • the first color resin for example, black resin
  • the second color resin for example, white
  • the convex portion is formed.
  • a structure like a joint of the resin occurs in the other half of the convex portion formed of the second color resin.
  • a structure such as a joint of the resin occurs in the posture determination unit, between the molded body of the first color resin and the molded body of the second color resin at the apex of the convex portion. In this case, a gap partially occurs, and as a result, in the determination of the orientation of the marker unit, the accuracy is reduced.
  • an object of this invention is to provide the manufacturing method of a marker unit which prevents generation
  • a method of manufacturing a marker unit of the present invention is: A method of manufacturing a marker unit including a lower substrate and an upper substrate by two-color molding,
  • the marker unit is The upper substrate is disposed on the lower substrate,
  • the upper substrate has an exposed portion to which the lower substrate is exposed,
  • the posture determination unit It has a plurality of continuous projections,
  • Each said convex part is It has a ridgeline parallel to each other, a first region including one first inclined surface having the ridgeline as a vertex, and a second region including the other second inclined surface having the ridgeline as a vertex,
  • a first molding step of introducing a first resin into a first mold to form the lower substrate and a plurality of the first regions on the lower substrate;
  • FIG. 1A is a plan view seen from above the marker unit, and FIG. 1B is a cross-sectional view of the marker unit.
  • FIG. 2A is a plan view of the posture determination unit in the marker unit as viewed from above, and FIGS. 2B and 2C are cross-sectional views of the posture determination unit.
  • FIG. 3A is a plan view showing a reference example of a lower substrate, and FIG. 3B is a cross-sectional view of the lower substrate.
  • FIG. 4 (A) is a plan view showing an example of the lower substrate in the present invention, and FIGS. 4 (B) and 4 (C) are cross-sectional views of the lower substrate.
  • FIG. 5 (A) is a plan view showing an example of the lower substrate in the present invention, and FIGS.
  • FIG. 5 (B) and 5 (C) are cross-sectional views of the lower substrate.
  • FIG. 6 is a plan view showing an example of the lower substrate in the present invention.
  • FIG. 7A is a plan view showing an example of a lower substrate in the present invention, and
  • FIG. 7B is a cross-sectional view of the lower substrate.
  • the lower substrate has two of the first wall portions positioned in parallel.
  • the lower substrate further includes two second wall portions projecting upward, and the two second wall portions respectively correspond to the two first wall portions. It is formed between the ends of the wall.
  • the marker unit is referred to as “upward” on the viewing side and “downward” to the opposite side. Therefore, in the marker unit, the “upper substrate” is a substrate on the viewing side, and the “lower substrate” is a substrate positioned downward with respect to the upper substrate. Also, “edges parallel” includes the meaning of being substantially parallel, and means that, for example, the angle of the other edge with respect to one edge is within ⁇ 5 °, preferably 0 °.
  • FIG. 1A is a plan view of the marker unit 1 viewed from the top side
  • FIG. 1B is a cross-sectional view of the marker unit 1 viewed from the II direction.
  • the marker unit 1 is a laminate including a lower substrate 10 formed of a first resin and an upper substrate 20 formed of a second resin, and the upper substrate 20 is disposed on the lower substrate 10 by integral molding. .
  • the marker unit 1 has four detection reference parts 12 at four corner parts as detected parts that can be detected from the upper surface side.
  • the upper substrate 20 has a through hole 22 to which the lower substrate 10 is exposed.
  • the detection reference portion 12 is a region on the upper surface side of the lower substrate 10, and is exposed to the upper surface side of the marker unit 1 in the through hole 22 of the upper substrate 20.
  • the lower substrate 10 has a circular convex portion protruding upward at a position to be the detection reference portion 12, and the convex portion is in the through hole 22 of the upper substrate 20. It may be located, and the upper surface of the convex part may be the detection reference part 12.
  • the marker unit 1 has an exposed portion 21 (also referred to as a through hole) to which the lower substrate 10 is exposed, and has a posture determination portion 30 in the exposed portion 21 as a detected portion that can be detected from the upper surface side.
  • the posture determination unit 30 is located between the detection reference units 12.
  • the posture determination unit 30 has a plurality of continuous convex portions 31.
  • FIG. 2 shows an enlarged view of the posture determination unit 30 in the marker unit 1.
  • FIG. 2A is a plan view seen from the upper surface side of the posture determination unit 30 in the marker unit 1
  • FIG. 2B is a cross-sectional view seen from the II-II direction of FIG.
  • FIG. 2 (C) is a cross-sectional view showing a part of the posture determination unit 30 in FIG. 2 (B).
  • the posture determination unit 30 is formed on the upper surface side of the lower substrate 10 and has a plurality of continuous convex portions 31.
  • Each convex portion 31 has a ridge line 313 parallel to each other, and a first region 311 including one inclined surface (first inclined surface) 3111 having the ridge line 313 as a vertex, and the other inclined surface having the ridge line 313 as a vertex And a second region 312 including a (second inclined surface) 3121.
  • the plurality of convex portions 31 have convex portions 31A spreading in the A direction and convex portions 31B spreading in the B direction with reference to the central convex portion 31C.
  • the convex portion 31C side serving as a reference is the second region 312 including the second inclined surface 3121 and the opposite inclined surface is the first inclined surface 3111.
  • the first region 311 includes the The convex portion 31A and the convex portion 31B have the same configuration except that the directions of the first region 311 and the second region 312 are opposite.
  • the convex portion 31C as a reference is not particularly limited, and for example, is formed integrally with the lower substrate 10 by the first resin.
  • the convex portion 31 has a first region 311 including a first inclined surface 3111 having a ridge line 313 as a vertex, and a second region including a second inclined surface 3121 having a ridge line 313 as a vertex. And 312.
  • the convex portion 31 may be formed directly on the lower substrate 10, or may be formed on the lower substrate 10 via the connecting portion 32, as shown in FIG. 2 (C).
  • the lower substrate 10, the portion 321 of the connecting portion 32, and the first region 311 of the convex portion 31 are integrally formed of the first resin.
  • the second region 312 of the convex portion 31 and the part 322 of the connecting portion 32 are integrally formed of the second resin.
  • the marker unit 1 is installed, for example, on a mounted body such as a robot, a construction device, an article of clothing, and a mount attached to them.
  • the present invention uses the first mold and the first resin in the first molding step to form the lower substrate having the plurality of first regions and the first wall portion. And forming the plurality of second regions between the upper substrate and the plurality of first regions on the lower substrate using the second mold and the second resin in the second molding step. Do.
  • the manufacturing method of the present invention it is a point that the lower substrate having the first wall portion is formed in the first forming step, and the lower substrate is used in the second forming step.
  • FIG. 3 schematically shows a lower substrate not having the first wall as a reference example
  • FIG. 4 schematically shows a lower substrate having the first wall as an example of the lower substrate in the present invention.
  • FIG. 3A is a plan view of the lower substrate 200 as viewed from above
  • FIG. 3B is a cross-sectional view of the lower substrate 200 in III-III direction in FIG.
  • the same parts as those in FIGS. 1 and 2 are denoted by the same reference numerals.
  • the plurality of first regions 311 are formed, the plurality of convex portions are continuously formed through the second forming step, and hence for convenience, it is also referred to as a convex portion forming region hereinafter.
  • the second resin when the second resin is introduced into the second mold in which the lower substrate 200 is disposed, the second resin flows from the gate position 70, and the second resin flows into the space of the second mold. Is filled.
  • the second resin diffuses from the gate position 70 as shown by the arrow A, and further advances toward the gate position 70 side of the convex portion forming region as shown by the arrow a, The gaps in the first region 311 in the formation region are filled.
  • the filling speed of the second resin is stalled, and it becomes difficult to advance in the direction of the arrow a.
  • the second resin goes around the periphery of the convex portion forming region (the plurality of first regions 311), and is on the opposite side to the gate position 70 of the convex portion forming region. Then, it proceeds in the direction opposite to the arrow a (in the direction of the arrow b) in the gap of the first region 311 in the convex portion forming region. For this reason, in the vicinity of the center in the gap of the first region 311, the second resin advancing in the arrow a direction contacts the second resin advancing in the arrow b direction, and a joint is generated.
  • FIG. 4 is a plan view from above of the lower substrate 10
  • (B) is a cross-sectional view of the lower substrate 10 seen from the III-III direction in (A).
  • 6A is a cross-sectional view of the lower substrate 10 in (IV) from the IV-IV direction.
  • the lower substrate 10 further includes a first wall 80 in addition to the plurality of first regions 311.
  • the first wall portion 80 is between the gate position 70 of the second resin forming the upper substrate and the plurality of first regions 311, and extends along the arrangement direction of the first regions 311 (the left and right direction in FIG. 4). It is formed.
  • the plurality of convex portions are continuously formed through the second forming step, and hence for convenience, it is also referred to as a convex portion forming region hereinafter.
  • the lower substrate 10 having the first wall portion 80 can avoid the problems as described in the reference example. That is, when the second resin is introduced into the second mold in which the lower substrate 10 is disposed in the second molding step, the second resin introduced from the gate position 70 is a first wall of the lower substrate 10. The portion 80 suppresses going straight from the gate position 70 side to the gap of the first region 311 in the convex portion forming region. Then, as shown by the arrow B, the second resin goes around the periphery of the convex portion forming region (the plurality of first regions 311) and proceeds to the opposite side to the gate position 70 side in the convex portion forming region .
  • the second resin that has progressed to the opposite side in the convex portion forming area travels the gap between the plurality of first areas 311 from the opposite side to the gate position 70 side. , Is filled in the void.
  • the progress of the second resin from the opposite side of the opposite direction to the gap of the first region 311 from the side opposite to the gate position 70 is not performed by the first wall 80. As described above, it is possible to suppress the occurrence of the joint of the second resin in the vicinity of the center of the gaps of the plurality of first regions 311 as described above.
  • the size, the number, and the like of the first wall 80 are not particularly limited.
  • the length of the first wall 80 (the length in the left-right direction in FIG. 4A) is not particularly limited, and, for example, the convex portion forming region (a first region of one end 311 to a first region of the other end) Preferably it is equal to or longer than the length of the region up to 311).
  • the length of the first wall portion 80 is, for example, 0.6 to 1.0 times and 1.0 to 1.4 times the length of the convex portion forming region, for example.
  • the height of the first wall 80 (the length in the vertical direction in FIG. 4C) is not particularly limited. When the position of the first wall 80 is relatively close to the convex portion forming area, for example, when the marker unit is used, the influence of the first wall 80 on the detection of the posture determination unit is reduced. From the point of view, it is preferable that the height be lower than the height of the first region 311. If the first wall 80 is set to a height lower than that of the first region 311, for example, the first wall 80 can be formed by forming the upper substrate and the second region by introducing the second resin. It can be buried in the second resin.
  • the marker unit 1 shown in FIG. 1 has, for example, a form in which the first wall 80 is buried in the second resin.
  • the height of the first wall 80 may be lower than, for example, the height of the first area 311. It may be high.
  • the thickness of the first wall 80 (the length in the vertical direction in FIG. 4A) is not particularly limited. For example, with respect to the distance from the gate position 70 to the gate position 70 side of the first region 80, It is 0.01 to 0.2 times, 0.2 to 0.4 times, 0.4 times to 0.8 times.
  • the lower substrate having the plurality of first regions and the first wall portion may be molded using the first mold and the first resin, and the other conditions are particularly the same. It is not restricted.
  • the configuration of the first mold is not particularly limited, and can be appropriately set from the structure of the lower substrate having the plurality of first regions and the first wall portion.
  • the plurality of second regions may be formed between the upper substrate and the plurality of first regions on the lower substrate using the second mold and the second resin, Other conditions are not particularly limited.
  • the configuration of the second mold is not particularly limited, and is appropriately set from the structure of the lower substrate having the plurality of first regions and the first wall portion, and the structure of the upper substrate and the plurality of second regions. it can.
  • the combination of the first resin and the second resin is not particularly limited, and in order to function as the posture determination unit, it is preferable that the combination be a member that can distinguish both. It is preferable that, for example, the two colors are different, that is, the color in which the contrast difference occurs is preferable.
  • the first resin forming the lower substrate is, for example, black
  • the second resin forming the upper substrate is, for example, white.
  • the first resin and the second resin may be, for example, a colored resin containing a coloring agent (for example, a master batch, a dry color, etc.) in a base resin.
  • the base resin is, for example, polycarbonate, acrylic resin such as polymethyl methacrylate (PMMA), cycloolefin polymer (COP), cycloolefin copolymer (COC), acrylonitrile-butadiene-styrene copolymer resin (ABS), Polyethylene terephthalate (PET) and the like can be mentioned.
  • acrylic resin such as polymethyl methacrylate (PMMA), cycloolefin polymer (COP), cycloolefin copolymer (COC), acrylonitrile-butadiene-styrene copolymer resin (ABS), Polyethylene terephthalate (PET) and the like can be mentioned.
  • FIG. 5A is a plan view of the lower substrate 10 as viewed from above
  • FIGS. 5B and 5C are views of the lower substrate 10 in the VV direction and the VI-VI direction in FIG. FIG.
  • FIG. 5 the same parts as in FIG. 4 are given the same reference numerals.
  • the lower substrate 10 of FIG. 5 has two first wall portions 80 and 81.
  • the two first wall portions 80, 81 are located in parallel.
  • the two first wall portions 80, 81 may, for example, be the same or different in size.
  • having the two first wall portions 80 and 81 positioned in parallel allows the second resin introduced through the gate position 70 to wrap around the first region 311 more efficiently. it can.
  • the distance between the first wall 80 and the first wall 81 is not particularly limited, and is, for example, 0 to 1 mm or 1 to 3 mm.
  • the lengths of the two first wall portions 80 and 81 may be, for example, the same or different. It is preferable that the length is equal to or longer than the length (the area from the first area 311 at one end to the first area 311 at the other end).
  • the length of the first wall portion 80, 81 is, for example, 0.5 to 1 times, 1 to 1.5 times the length of the convex portion forming area, for example.
  • the heights of the two first wall portions 80, 81 may be the same or different, for example.
  • the heights of the two first wall portions 80 and 81 are not particularly limited, and can be set as appropriate according to, for example, the height of the first region 311 and the flow of the second resin.
  • the first wall 80 on the first region 311 side is closer to the marker unit than the first wall 81 on the gate position 70 side. It is a position near the convex part of. For this reason, when the marker unit is used, the first wall 80 near the convex portion constituting the posture determination portion has a high height in the first region 311 in order to reduce the influence on the detection of the convex portion. Preferably less than If the first wall 80 on the side of the first region 311 is set to a height lower than that of the first region 311, for example, the first substrate and the second region may be molded by introducing the second resin. The first wall 80 on the region 311 side can be buried in the second resin. For this reason, it is possible to prevent the detection of the posture determination unit from being affected by the detection of the first wall 80 on the side of the first region 311 in the two-color molded marker unit.
  • the thickness of the two first wall portions 80 and 81 may be the same or different, for example. In the latter case, for example, the thickness of the first wall 81 on the gate position 70 side is preferably thicker than the first wall 80 on the first region 311 side.
  • FIG. 6 shows still another example of the lower substrate 10.
  • FIG. 6 is a plan view of the lower substrate 10 as viewed from above.
  • the same parts as in FIG. 5 are assigned the same reference numerals.
  • the lower substrate 10 of FIG. 6 further includes two second wall portions 90 and 91 as a pair in addition to the two first wall portions 80 and 81.
  • the two second wall portions 90, 91 are respectively formed between the ends of the two first wall portions 80, 81 and are, for example, parallel.
  • the two second wall portions 90, 91 may, for example, be the same or different in size.
  • the lengths of the two second wall portions 90 and 91 may be the same or different, for example.
  • the first wall portion 80 and the first wall portion It can be set appropriately according to the distance to 81.
  • the thickness and height of the second wall 90 and 91 are not particularly limited, and may be the same as, for example, the first wall 80 or the same as the first wall 81.
  • the first wall 80 and the first wall 81 may have, for example, a shape connected to the pair of second walls 90 and 91 or a separated shape.
  • FIG. 7A is a plan view of the lower substrate 10 as viewed from above
  • FIG. 7B is a cross-sectional view of the lower substrate 10 as viewed in the direction of VII-VII in FIG.
  • the same parts as those in FIGS. 5 and 6 are denoted by the same reference numerals.
  • the lower substrate 10 of FIG. 7 has a first wall 100.
  • the wall portion 100 is formed in the area surrounded by the pair of first wall portions 80 and 81 and the pair of second wall portions 90 and 91 in the second modification.
  • the length of the first wall 100 (the length in the left-right direction in FIG. 7A) is, for example, the convex portion forming region (a region from the first region 311 at one end to the first region 311 at the other end) Preferably it is equal to or longer than the length of.
  • the length of the first wall portion 100 is, for example, 0.5 to 1 times, 1 to 1.5 times the length of the convex portion forming area, for example.
  • the thickness of the first wall portion 100 (the length in the vertical direction in FIG. 7A) is, for example, 0.02 to 0 with respect to the distance from the gate position 70 to the gate position 70 side of the first region 311. .4 times, 0.4 to 1 times.
  • the height (the length in the vertical direction in FIG. 7B) of the first wall 100 may be the same or different, for example, in the width direction. In the latter case, for example, for the same reason as the pair of first wall portions 80 and 81 in the first modification, in the first wall portion 100, for example, the height on the first region 311 side is the gate position 70 side. Lower than height is preferred.
  • the formation of the first wall portion on the lower substrate can prevent the occurrence of the joint of the resin as described above.
  • Reference Signs List 1 marker unit 10 200 lower substrate 12 detection reference unit 20 upper substrate 22 through hole 30 posture determination unit 31 convex portion 311 first region 3111 first inclined surface 312 second region 3121 second inclined surface 313 ridge line 32 connecting portion 70 gate 70 gate Position 80, 81, 100 first wall 90, 91 second wall

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)

Abstract

Provided is a method for manufacturing a marker unit which prevents the generation of a seam of a resin in a concave section of a posture determining part. A manufacturing method according to the present invention comprises: a first forming step for forming a lower substrate (10) and a plurality of first areas (311) on the lower substrate (10) by injecting a first resin into a first mold; and a second forming step for forming an upper substrate (20) on the lower substrate (10) and a plurality of second areas (312) between the plurality of first areas (311) by injecting a second resin into a second mold, wherein the lower substrate (10) has a first wall part (80) that protrudes upwards along a direction in which the plurality of first areas (311) are continuous and between a gate location (70) of the second resin forming the upper substrate (20) and the plurality of first areas (311).

Description

マーカユニットの製造方法Method of manufacturing marker unit
　本発明は、マーカユニットの製造方法に関する。 The present invention relates to a method of manufacturing a marker unit.
　拡張現実感（Augmented　Reality、以下、「ＡＲ」ともいう）およびロボティクス等の分野において、物体の位置および姿勢等を認識するために、いわゆる視認マーカが使用されている。前記マーカとしては、例えば、二次元コードであるＡＲマーカが一般的である。前記ＡＲマーカは、一般的に、基板上に図形で表わされている。カメラ等の検出機器によって、前記ＡＲマーカを検出すると、前記検出機器に対する前記ＡＲマーカの傾きに依存して、前記検出機器により検知される前記図形の画像が変化する。この変化した画像に基づいて、前記検出機器に対する前記ＡＲマーカの傾き角度（回転角度）が検出される。しかしながら、前記ＡＲマーカのみでは、傾き角度の検出精度が十分ではないという問題があった。 In the fields of Augmented Reality (hereinafter, also referred to as “AR”) and robotics, so-called visual recognition markers are used to recognize the position, posture, and the like of an object. For example, an AR marker which is a two-dimensional code is generally used as the marker. The AR marker is generally represented graphically on the substrate. When the AR marker is detected by a detection device such as a camera, the image of the figure detected by the detection device changes depending on the inclination of the AR marker with respect to the detection device. Based on this changed image, the inclination angle (rotation angle) of the AR marker with respect to the detection device is detected. However, only the AR marker has a problem that the detection accuracy of the tilt angle is not sufficient.
　他方、検出精度に優れるＶＭＰ（可変モアレパターン）を搭載した高精度マーカが報告されている。前記ＶＭＰは、前記検出機器から見る角度に応じて、現れる像の形や場所が変位する。前記高精度マーカは、一般的に、四角の基板の四隅に、計測基準となる丸印を有し、前記４つの丸印で囲まれる領域内に、前記ＶＭＰが配置されている。前記高精度マーカでは、まず、四隅の計測基準である丸印が検出されることで、計測領域が把握され、続いて、前記計測領域内の前記ＶＭＰが検知される。しかしながら、前記計測基準によって角度の検知精度は向上するが、回転角度を見失う場合がある。 On the other hand, high accuracy markers equipped with VMP (variable moire pattern) excellent in detection accuracy have been reported. In the VMP, the shape and the position of the image that appears are displaced according to the angle viewed from the detection device. The high precision marker generally has circles serving as measurement reference at the four corners of a square substrate, and the VMP is disposed in the area surrounded by the four circles. In the high accuracy marker, first, a circle that is a measurement reference at the four corners is detected, whereby the measurement area is grasped, and subsequently, the VMP in the measurement area is detected. However, although the detection accuracy of the angle is improved by the measurement standard, the rotation angle may be missed.
　そこで、前記ＡＲと前記ＶＭＰと前記計測基準とが搭載されたマーカも報告されている（特許文献１）。しかし、このマーカによっては、前記検出機器によりマーカを検出した際、その画像のみからでは前記マーカの向きが判断できないという問題がある。 Therefore, a marker on which the AR, the VMP, and the measurement reference are mounted is also reported (Patent Document 1). However, depending on this marker, when the marker is detected by the detection device, there is a problem that the direction of the marker can not be determined only from the image.
特開２０１２－１４５５５９号公報JP, 2012-145559, A
　そこで、上記のようなマーカを搭載するマーカユニットにおいて、姿勢判断部を設ける形態が検討されている。姿勢判断部とは、例えば、前記マーカユニットが配置された物体の姿勢を判断するためのものである。前記姿勢判断部は、複数の凸部が平行に形成されており、前記各凸部は、稜線と、前記稜線を頂点とする２つの傾斜面を有している。そして、複数の凸部のうち、中央の基準凸部は、黒樹脂で形成され、その他の凸部は、前記稜線から前記基準凸部側が白樹脂で形成され、前記稜線から前記基準凸部とは反対側が黒樹脂で形成されている。つまり、前記各凸部が、中央寄りの半分が白樹脂、残り半分が黒樹脂で形成され、両者の重ね合わせにより頂点が形成されている。前記マーカユニットによれば、前記姿勢判断部における白樹脂で形成された傾斜面と黒樹脂で形成された傾斜面の見え方から、前記マーカユニットの向きを判断することができる。 Then, in the marker unit which mounts the above markers, the form which provides an attitude | position determination part is examined. The posture determination unit is, for example, for determining the posture of the object on which the marker unit is disposed. In the posture determination unit, a plurality of convex portions are formed in parallel, and each convex portion has a ridge line and two inclined surfaces whose apexes are the ridge line. Then, among the plurality of convex portions, the central reference convex portion is formed of black resin, and the other convex portions are formed of white resin from the ridge line to the reference convex portion, and the ridge line to the reference convex portion The other side is made of black resin. That is, the respective convex portions are formed of a white resin on the half near the center and a black resin on the other half, and a vertex is formed by superimposing both of them. According to the marker unit, the orientation of the marker unit can be determined from the appearance of the inclined surface formed of white resin and the inclined surface formed of black resin in the posture determination unit.
　前記姿勢判断部を二色成形で成形する場合、前記凸部の半分を一色目の樹脂（例えば、黒樹脂）で形成した後、その間隙に、二色目の樹脂（例えば、白色）を導入させることによって、前記凸部が形成される。しかしながら、前記凸部において、前記二色目の樹脂で形成された残り半分には、前記樹脂のつなぎ目のような構造が発生するという問題がある。このように、前記樹脂のつなぎ目のような構造が前記姿勢判断部に発生すると、前記凸部の頂角部において、前記一色目の樹脂の成形体と前記二色目の樹脂の成形体との間で、部分的に隙間が生じ、結果として、前記マーカユニットの向きの判断において、精度が低下する。 When the posture determination unit is molded by two-color molding, after forming the half of the convex portion with the first color resin (for example, black resin), the second color resin (for example, white) is introduced into the gap. Thus, the convex portion is formed. However, there is a problem that a structure like a joint of the resin occurs in the other half of the convex portion formed of the second color resin. Thus, when a structure such as a joint of the resin occurs in the posture determination unit, between the molded body of the first color resin and the molded body of the second color resin at the apex of the convex portion. In this case, a gap partially occurs, and as a result, in the determination of the orientation of the marker unit, the accuracy is reduced.
　そこで、本発明は、例えば、前記姿勢判断部の複数の凸部における、前述のような樹脂のつなぎ目の発生を防止する、マーカユニットの製造方法を提供することを目的とする。 Then, an object of this invention is to provide the manufacturing method of a marker unit which prevents generation | occurence | production of the joint of resin as mentioned above in the several convex part of the said attitude | position determination part, for example.
　前記目的を達成するために、本発明のマーカユニットの製造方法は、
二色成形により、下基板と上基板とを含むマーカユニットを製造する方法であって、
前記マーカユニットは、
　　前記下基板上に、前記上基板が配置され、
　　前記上基板が、前記下基板が露出する露出部を有し、
　　前記露出部内に、姿勢判断部を有し、
前記姿勢判断部は、
　　連続する複数の凸部を有し、
前記各凸部は、
　　互いに平行な稜線と、前記稜線を頂点とする一方の第１傾斜面を含む第１領域と、前記稜線を頂点とする他方の第２傾斜面を含む第２領域と、を有し、
第１金型内に第１樹脂を導入して、前記下基板、および、前記下基板上に複数の前記第１領域を形成する第１成形工程、および、
第２金型内に第２樹脂を導入して、前記下基板上に前記上基板、および、前記複数の第１領域間に複数の前記第２領域を形成する第２成形工程を含み、
前記第１成形工程で形成される前記下基板は、
　　前記上基板を形成する第２樹脂のゲート位置と前記複数の第１領域との間において、前記複数の第１領域が連続する方向に沿って、上方向に突出する第１壁部を有することを特徴とする。 In order to achieve the above object, a method of manufacturing a marker unit of the present invention is:
A method of manufacturing a marker unit including a lower substrate and an upper substrate by two-color molding,
The marker unit is
The upper substrate is disposed on the lower substrate,
The upper substrate has an exposed portion to which the lower substrate is exposed,
A posture determination unit in the exposed portion;
The posture determination unit
It has a plurality of continuous projections,
Each said convex part is
It has a ridgeline parallel to each other, a first region including one first inclined surface having the ridgeline as a vertex, and a second region including the other second inclined surface having the ridgeline as a vertex,
A first molding step of introducing a first resin into a first mold to form the lower substrate and a plurality of the first regions on the lower substrate;
Including a second forming step of introducing a second resin into a second mold to form the upper substrate and the plurality of second regions between the plurality of first regions on the lower substrate;
The lower substrate formed in the first forming step is
Between the gate position of the second resin forming the upper substrate and the plurality of first regions, there is provided a first wall projecting upward along the direction in which the plurality of first regions are continuous. It is characterized by
　本発明のマーカユニットの製造方法によれば、前記下基板に前記第１壁部を形成することによって、前述のような、樹脂のつなぎ目の発生を防止できる。 According to the method of manufacturing a marker unit of the present invention, by forming the first wall portion on the lower substrate, it is possible to prevent the occurrence of the joint of resin as described above.
図１（Ａ）は、マーカユニットの上方向から見た平面図であり、図１（Ｂ）は、前記マーカユニットの断面図である。FIG. 1A is a plan view seen from above the marker unit, and FIG. 1B is a cross-sectional view of the marker unit. 図２（Ａ）は、マーカユニットにおける姿勢判断部を上方向から見た平面図であり、図２（Ｂ）および（Ｃ）は、前記姿勢判断部の断面図である。FIG. 2A is a plan view of the posture determination unit in the marker unit as viewed from above, and FIGS. 2B and 2C are cross-sectional views of the posture determination unit. 図３（Ａ）は、下基板の参照例を示す平面図であり、図３（Ｂ）は、前記下基板の断面図である。FIG. 3A is a plan view showing a reference example of a lower substrate, and FIG. 3B is a cross-sectional view of the lower substrate. 図４（Ａ）は、本発明における下基板の一例を示す平面図であり、図４（Ｂ）および（Ｃ）は、前記下基板の断面図である。FIG. 4 (A) is a plan view showing an example of the lower substrate in the present invention, and FIGS. 4 (B) and 4 (C) are cross-sectional views of the lower substrate. 図５（Ａ）は、本発明における下基板の一例を示す平面図であり、図５（Ｂ）および（Ｃ）は、前記下基板の断面図である。FIG. 5 (A) is a plan view showing an example of the lower substrate in the present invention, and FIGS. 5 (B) and 5 (C) are cross-sectional views of the lower substrate. 図６は、本発明における下基板の一例を示す平面図である。FIG. 6 is a plan view showing an example of the lower substrate in the present invention. 図７（Ａ）は、本発明における下基板の一例を示す平面図であり、図７（Ｂ）は、前記下基板の断面図である。FIG. 7A is a plan view showing an example of a lower substrate in the present invention, and FIG. 7B is a cross-sectional view of the lower substrate.
　本発明のマーカユニットの製造方法において、例えば、前記下基板は、平行に位置する２つの前記第１壁部を有する。 In the method of manufacturing a marker unit according to the present invention, for example, the lower substrate has two of the first wall portions positioned in parallel.
　本発明のマーカユニットの製造方法において、例えば、前記下基板は、さらに、上方向に突出する２つの第２壁部を有し、前記２つの第２壁部は、それぞれ、前記２つの第１壁部の端部間に形成されている。 In the method of manufacturing a marker unit according to the present invention, for example, the lower substrate further includes two second wall portions projecting upward, and the two second wall portions respectively correspond to the two first wall portions. It is formed between the ends of the wall.
　本発明において、前記マーカユニットは、便宜上、視認側を「上方向」といい、その反対側を「下方向」という。このため、前記マーカユニットにおいて、「上基板」とは、視認側の基板であり、「下基板」とは、上基板に対して下方向に位置する基板である。また、「稜線が平行」とは、略平行の意味を含み、例えば、一方の稜線に対する他方の稜線の角度が±５°以内、好ましくは０°の状態を意味する。 In the present invention, for convenience, the marker unit is referred to as “upward” on the viewing side and “downward” to the opposite side. Therefore, in the marker unit, the "upper substrate" is a substrate on the viewing side, and the "lower substrate" is a substrate positioned downward with respect to the upper substrate. Also, “edges parallel” includes the meaning of being substantially parallel, and means that, for example, the angle of the other edge with respect to one edge is within ± 5 °, preferably 0 °.
　つぎに、本発明の実施形態について、図を用いて説明する。本発明は、下記の実施形態によって何ら限定および制限されない。各図において、同一箇所には同一符号を付している。なお、図においては、説明の便宜上、各部の構造は、適宜、簡略化して示す場合があり、各部の寸法比等は、図の条件には制限されない。なお、以下、前記下基板と上基板とを含む積層体において、下基板側を下方向、上基板側を上方向という。 Next, an embodiment of the present invention will be described using the drawings. The present invention is not limited or limited at all by the following embodiments. In each figure, the same reference numerals are given to the same parts. In the drawings, for convenience of explanation, the structure of each part may be appropriately simplified and shown, and the dimensional ratio etc. of each part is not limited to the conditions of the drawing. Hereinafter, in the laminate including the lower substrate and the upper substrate, the lower substrate side is referred to as the downward direction, and the upper substrate side is referred to as the upward direction.
（実施形態１）
　まず、本発明のマーカユニットの製造方法により製造されるマーカユニットの基本構成の一例を、図１に示す。図１（Ａ）は、上面側から見たマーカユニット１の平面図であり、図１（Ｂ）は、マーカユニット１のI－I方向から見た断面図である。マーカユニット１は、第１樹脂で形成された下基板１０および第２樹脂で形成された上基板２０を有し、下基板１０の上に上基板２０が一体成形で配置された積層体である。 (Embodiment 1)
First, an example of the basic configuration of a marker unit manufactured by the method of manufacturing a marker unit of the present invention is shown in FIG. FIG. 1A is a plan view of the marker unit 1 viewed from the top side, and FIG. 1B is a cross-sectional view of the marker unit 1 viewed from the II direction. The marker unit 1 is a laminate including a lower substrate 10 formed of a first resin and an upper substrate 20 formed of a second resin, and the upper substrate 20 is disposed on the lower substrate 10 by integral molding. .
　マーカユニット１は、上面側から検出可能な被検出部として、４つの角部に、４つの検出基準部１２を有する。上基板２０は、下基板１０が露出する貫通孔２２を有する。検出基準部１２は、下基板１０の上表面側の領域であり、上基板２０の貫通孔２２において、マーカユニット１の上面側に露出している。下基板１０は、例えば、図１に示すように、検出基準部１２となる箇所に、上方向に突出する円形の凸部を有し、前記凸部は、上基板２０の貫通孔２２内に位置し、前記凸部の上面が、検出基準部１２となってもよい。 The marker unit 1 has four detection reference parts 12 at four corner parts as detected parts that can be detected from the upper surface side. The upper substrate 20 has a through hole 22 to which the lower substrate 10 is exposed. The detection reference portion 12 is a region on the upper surface side of the lower substrate 10, and is exposed to the upper surface side of the marker unit 1 in the through hole 22 of the upper substrate 20. For example, as shown in FIG. 1, the lower substrate 10 has a circular convex portion protruding upward at a position to be the detection reference portion 12, and the convex portion is in the through hole 22 of the upper substrate 20. It may be located, and the upper surface of the convex part may be the detection reference part 12.
　マーカユニット１は、下基板１０が露出する露出部２１（貫通孔ともいう）を有し、露出部２１内に、上面側から検出可能な被検出部として、姿勢判断部３０を有する。姿勢判断部３０は、検出基準部１２の間に位置している。姿勢判断部３０は、連続する複数の凸部３１を有する。 The marker unit 1 has an exposed portion 21 (also referred to as a through hole) to which the lower substrate 10 is exposed, and has a posture determination portion 30 in the exposed portion 21 as a detected portion that can be detected from the upper surface side. The posture determination unit 30 is located between the detection reference units 12. The posture determination unit 30 has a plurality of continuous convex portions 31.
　図２に、マーカユニット１における姿勢判断部３０の拡大図を示す。図２（Ａ）は、マーカユニット１における姿勢判断部３０の上面側から見た平面図であり、図２（Ｂ）は、図２（Ａ）のII－II方向から見た断面図であり、図２（Ｃ）は、図２（Ｂ）における姿勢判断部３０の一部を示す断面図である。姿勢判断部３０は、下基板１０の上面側に形成されており、連続する複数の凸部３１を有する。各凸部３１は、互いに平行する稜線３１３を有し、稜線３１３を頂点とする一方の傾斜面（第１傾斜面）３１１１を含む第１領域３１１と、稜線３１３を頂点とする他方の傾斜面（第２傾斜面）３１２１を含む第２領域３１２とからなる。複数の凸部３１は、中央の凸部３１Ｃを基準として、Ａ方向に向かって広がる凸部３１Ａと、Ｂ方向に向かって広がる凸部３１Ｂとを有する。凸部３１Ａと凸部３１Ｂとにおいて、稜線３１１を頂点として、基準となる凸部３１Ｃ側が、第２傾斜面３１２１を含む第２領域３１２であり、反対側の傾斜面が、第１傾斜面３１１１を含む第１領域３１１である。凸部３１Ａと凸部３１Ｂとは、第１領域３１１と第２領域３１２の方向が逆である以外は、同じ構成である。基準となる凸部３１Ｃは、特に制限されず、例えば、前記第１樹脂により、下基板１０と一体化して形成されている。 FIG. 2 shows an enlarged view of the posture determination unit 30 in the marker unit 1. FIG. 2A is a plan view seen from the upper surface side of the posture determination unit 30 in the marker unit 1, and FIG. 2B is a cross-sectional view seen from the II-II direction of FIG. FIG. 2 (C) is a cross-sectional view showing a part of the posture determination unit 30 in FIG. 2 (B). The posture determination unit 30 is formed on the upper surface side of the lower substrate 10 and has a plurality of continuous convex portions 31. Each convex portion 31 has a ridge line 313 parallel to each other, and a first region 311 including one inclined surface (first inclined surface) 3111 having the ridge line 313 as a vertex, and the other inclined surface having the ridge line 313 as a vertex And a second region 312 including a (second inclined surface) 3121. The plurality of convex portions 31 have convex portions 31A spreading in the A direction and convex portions 31B spreading in the B direction with reference to the central convex portion 31C. In the convex portion 31A and the convex portion 31B, with the ridge line 311 as the vertex, the convex portion 31C side serving as a reference is the second region 312 including the second inclined surface 3121 and the opposite inclined surface is the first inclined surface 3111. The first region 311 includes the The convex portion 31A and the convex portion 31B have the same configuration except that the directions of the first region 311 and the second region 312 are opposite. The convex portion 31C as a reference is not particularly limited, and for example, is formed integrally with the lower substrate 10 by the first resin.
　図２（Ｃ）に示すように、凸部３１は、稜線３１３を頂点とする第１傾斜面３１１１を含む第１領域３１１と、稜線３１３を頂点とする第２傾斜面３１２１を含む第２領域３１２とを含む。凸部３１は、下基板１０上に直接成形されてもよいし、図２（Ｃ）に示すように、下基板１０上に連結部３２を介して成形されてもよい。具体的には、図２（Ｃ）に示すように、前記第１樹脂により、下基板１０と、連結部３２の一部３２１と、凸部３１における第１領域３１１とが、一体化して成形されており、前記第２樹脂により、凸部３１における第２領域３１２と、連結部３２の一部３２２とが、一体化して成形されている。 As shown in FIG. 2C, the convex portion 31 has a first region 311 including a first inclined surface 3111 having a ridge line 313 as a vertex, and a second region including a second inclined surface 3121 having a ridge line 313 as a vertex. And 312. The convex portion 31 may be formed directly on the lower substrate 10, or may be formed on the lower substrate 10 via the connecting portion 32, as shown in FIG. 2 (C). Specifically, as shown in FIG. 2C, the lower substrate 10, the portion 321 of the connecting portion 32, and the first region 311 of the convex portion 31 are integrally formed of the first resin. The second region 312 of the convex portion 31 and the part 322 of the connecting portion 32 are integrally formed of the second resin.
　マーカユニット１は、例えば、例えば、ロボット、建設機器、衣料品、およびそれらに付されたマウント等の被設置体に設置される。 The marker unit 1 is installed, for example, on a mounted body such as a robot, a construction device, an article of clothing, and a mount attached to them.
　つぎに、本発明のマーカユニットの製造方法について、一例として、図１に示すマーカユニット１を製造する方法を、図を用いて説明する。 Next, as a method of manufacturing the marker unit of the present invention, a method of manufacturing the marker unit 1 shown in FIG. 1 will be described with reference to the drawings.
　本発明は、前述のように、前記第１成形工程において、前記第１金型と前記第１樹脂とを用いて、前記複数の第１領域と前記第１壁部とを有する前記下基板を成形し、前記第２成形工程において、前記第２金型と前記第２樹脂とを用いて、前記下基板上に前記上基板、前記複数の第１領域間に前記複数の第２領域を形成する。本発明の製造方法は、このように、前記第１成形工程で、前記第１壁部を有する下基板を成形し、前記下基板を、前記第２成形工程に使用することがポイントである。 As described above, the present invention uses the first mold and the first resin in the first molding step to form the lower substrate having the plurality of first regions and the first wall portion. And forming the plurality of second regions between the upper substrate and the plurality of first regions on the lower substrate using the second mold and the second resin in the second molding step. Do. Thus, according to the manufacturing method of the present invention, it is a point that the lower substrate having the first wall portion is formed in the first forming step, and the lower substrate is used in the second forming step.
　このように、前記第１壁部を有する下基板を形成することによる効果について、以下に説明する。図３に、参照例として、前記第１壁部を有さない下基板の概略、図４に、本発明における下基板の一例として、前記第１壁部を有する下基板の概略を、それぞれ示す。 As described above, the effect of forming the lower substrate having the first wall portion will be described below. FIG. 3 schematically shows a lower substrate not having the first wall as a reference example, and FIG. 4 schematically shows a lower substrate having the first wall as an example of the lower substrate in the present invention. .
　まず、図３の参照例について説明する。図３において、（Ａ）は、下基板２００を上方向からみた平面図であり、（Ｂ）は、前記（Ａ）において下基板２００をIII－III方向からみた断面図である。図３において、図１および図２と同一箇所には同一符号を付している。複数の第１領域３１１が形成されている領域には、前記第２成形工程を経て、前記複数の凸部が連続して形成されるため、便宜上、以下、凸部形成領域ともいう。 First, a reference example of FIG. 3 will be described. 3A is a plan view of the lower substrate 200 as viewed from above, and FIG. 3B is a cross-sectional view of the lower substrate 200 in III-III direction in FIG. In FIG. 3, the same parts as those in FIGS. 1 and 2 are denoted by the same reference numerals. In the region where the plurality of first regions 311 are formed, the plurality of convex portions are continuously formed through the second forming step, and hence for convenience, it is also referred to as a convex portion forming region hereinafter.
　参照例の下基板２００を、前記第２成形工程に使用した場合について、説明する。前記第２工程において、下基板２００が配置された前記第２金型に前記第２樹脂を導入すると、ゲート位置７０から第２樹脂が流入し、前記第２金型の空隙に前記第２樹脂が充填される。この際、前記第２樹脂は、矢印Ａに示すように、ゲート位置７０から拡散し、さらに、矢印ａに示すように、前記凸部形成領域のゲート位置７０側に向かって進み、前記凸部形成領域における第１領域３１１の間隙に充填されていく。しかし、第１領域３１１の間隙を通過するにあたって、前記第２樹脂の充填速度が失速し、矢印ａ方向に進みにくくなる。このため、前記第２樹脂は、矢印Ｂに示すように、前記凸部形成領域（複数の第１領域３１１）の周囲を回り込んで、前記凸部形成領域のゲート位置７０とは反対側に進み、前記凸部形成領域における第１領域３１１の間隙を、矢印ａとは反対方向（矢印ｂ方向）にも進んでいく。このため、第１領域３１１の間隙内の中央付近において、矢印ａ方向に進む前記第２樹脂と、矢印ｂ方向に進む前記第２樹脂とが接触し、つなぎ目が発生する。 The case where the lower substrate 200 of the reference example is used in the second molding step will be described. In the second step, when the second resin is introduced into the second mold in which the lower substrate 200 is disposed, the second resin flows from the gate position 70, and the second resin flows into the space of the second mold. Is filled. At this time, the second resin diffuses from the gate position 70 as shown by the arrow A, and further advances toward the gate position 70 side of the convex portion forming region as shown by the arrow a, The gaps in the first region 311 in the formation region are filled. However, when passing through the gap of the first region 311, the filling speed of the second resin is stalled, and it becomes difficult to advance in the direction of the arrow a. Therefore, as shown by the arrow B, the second resin goes around the periphery of the convex portion forming region (the plurality of first regions 311), and is on the opposite side to the gate position 70 of the convex portion forming region. Then, it proceeds in the direction opposite to the arrow a (in the direction of the arrow b) in the gap of the first region 311 in the convex portion forming region. For this reason, in the vicinity of the center in the gap of the first region 311, the second resin advancing in the arrow a direction contacts the second resin advancing in the arrow b direction, and a joint is generated.
　つぎに、図４の本発明における下基板の一例について説明する。図４において、（Ａ）は、下基板１０の上方向からの平面図であり、（Ｂ）は、前記（Ａ）において下基板１０をIII－III方向から見た断面図であり、（Ｃ）は、前記（Ａ）において下基板１０をIV－IV方向からみた断面図である。図４において、図１および図２と同一箇所には同一符号を付している。下基板１０は、複数の第１領域３１１の他に、さらに、第１壁部８０を有している。第１壁部８０は、前記上基板を形成する第２樹脂のゲート位置７０と複数の第１領域３１１との間であり、第１領域３１１の配置方向（図４において、左右方向）に沿って形成されている。複数の第１領域３１１が形成されている領域には、前記第２成形工程を経て、前記複数の凸部が連続して形成されるため、便宜上、以下、凸部形成領域ともいう。 Next, an example of the lower substrate in the present invention of FIG. 4 will be described. In FIG. 4, (A) is a plan view from above of the lower substrate 10, (B) is a cross-sectional view of the lower substrate 10 seen from the III-III direction in (A). 6A is a cross-sectional view of the lower substrate 10 in (IV) from the IV-IV direction. In FIG. 4, the same parts as those in FIGS. 1 and 2 are denoted by the same reference numerals. The lower substrate 10 further includes a first wall 80 in addition to the plurality of first regions 311. The first wall portion 80 is between the gate position 70 of the second resin forming the upper substrate and the plurality of first regions 311, and extends along the arrangement direction of the first regions 311 (the left and right direction in FIG. 4). It is formed. In the region where the plurality of first regions 311 are formed, the plurality of convex portions are continuously formed through the second forming step, and hence for convenience, it is also referred to as a convex portion forming region hereinafter.
　このように、下基板１０を、第１壁部８０を有する形態とすることで、前記参照例のような問題を回避できる。すなわち、前記第２成形工程において、下基板１０が配置された前記第２金型に前記第２樹脂を導入すると、ゲート位置７０から導入された前記第２樹脂は、下基板１０における第１壁部８０によって、ゲート位置７０側から前記凸部形成領域内の第１領域３１１の間隙へ直進することが抑制される。そして、矢印Ｂに示すように、前記第２樹脂は、前記凸部形成領域（複数の第１領域３１１）の周囲を回り込み、前記凸部形成領域におけるゲート位置７０側とは反対側に進行する。さらに、前記凸部形成領域における前記反対側に進行した前記第２樹脂は、矢印ｂに示すように、複数の第１領域３１１の間隙を、前記反対側からゲート位置７０側に向かって進行し、その空隙に充填される。このように、本発明によれば、第１壁部８０によって、前記第２樹脂の対向する両方向からの進行ではなく、ゲート位置７０側とは反対側からの第１領域３１１の間隙への進行を主とするように変更できるため、前述のような、複数の第１領域３１１の間隙の中央付近における前記第２樹脂のつなぎ目の発生を抑制できる。 As described above, the lower substrate 10 having the first wall portion 80 can avoid the problems as described in the reference example. That is, when the second resin is introduced into the second mold in which the lower substrate 10 is disposed in the second molding step, the second resin introduced from the gate position 70 is a first wall of the lower substrate 10. The portion 80 suppresses going straight from the gate position 70 side to the gap of the first region 311 in the convex portion forming region. Then, as shown by the arrow B, the second resin goes around the periphery of the convex portion forming region (the plurality of first regions 311) and proceeds to the opposite side to the gate position 70 side in the convex portion forming region . Furthermore, as shown by the arrow b, the second resin that has progressed to the opposite side in the convex portion forming area travels the gap between the plurality of first areas 311 from the opposite side to the gate position 70 side. , Is filled in the void. As described above, according to the present invention, the progress of the second resin from the opposite side of the opposite direction to the gap of the first region 311 from the side opposite to the gate position 70 is not performed by the first wall 80. As described above, it is possible to suppress the occurrence of the joint of the second resin in the vicinity of the center of the gaps of the plurality of first regions 311 as described above.
　下基板１０において、例えば、第１壁部８０の大きさ、数等は、特に制限されない。 In the lower substrate 10, for example, the size, the number, and the like of the first wall 80 are not particularly limited.
　第１壁部８０の長さ（図４（Ａ）において、左右方向の長さ）は、特に制限されず、例えば、前記凸部形成領域（一端の第１領域３１１から他端の第１領域３１１までの領域）の長さと同等またはそれよりも長いことが好ましい。第１壁部８０の長さは、例えば、前記凸部形成領域の長さに対して、例えば、０．６～１．０倍、１．０～１．４倍である。 The length of the first wall 80 (the length in the left-right direction in FIG. 4A) is not particularly limited, and, for example, the convex portion forming region (a first region of one end 311 to a first region of the other end) Preferably it is equal to or longer than the length of the region up to 311). The length of the first wall portion 80 is, for example, 0.6 to 1.0 times and 1.0 to 1.4 times the length of the convex portion forming region, for example.
　第１壁部８０の高さ（図４（Ｃ）において、上下方向の長さ）は、特に制限されない。第１壁部８０の位置が、前記凸部形成領域に相対的に近い場合は、例えば、前記マーカユニットの使用時において、第１壁部８０による前記姿勢判断部の検出への影響を低減する点から、第１領域３１１の高さよりも低いことが好ましい。第１壁部８０を第１領域３１１よりも低い高さに設定すれば、例えば、前記第２樹脂の導入により前記上基板と前記第２領域との成形により、第１壁部８０は、前記第２樹脂に埋没させることができる。このため、二色成形された前記マーカユニットにおいて、第１壁部８０が検出されることによる、前記姿勢判断部の検出への影響を防止できる。図１に示すマーカユニット１は、例えば、第１壁部８０が、前記第２樹脂に埋没した形態である。他方、第１壁部８０の位置が、前記凸部形成領域に相対的に遠い場合、第１壁部８０の高さは、例えば、第１領域３１１の高さよりも、低くてもよいし、高くてもよい。 The height of the first wall 80 (the length in the vertical direction in FIG. 4C) is not particularly limited. When the position of the first wall 80 is relatively close to the convex portion forming area, for example, when the marker unit is used, the influence of the first wall 80 on the detection of the posture determination unit is reduced. From the point of view, it is preferable that the height be lower than the height of the first region 311. If the first wall 80 is set to a height lower than that of the first region 311, for example, the first wall 80 can be formed by forming the upper substrate and the second region by introducing the second resin. It can be buried in the second resin. For this reason, it is possible to prevent the influence on the detection of the posture determination unit due to the detection of the first wall portion 80 in the two-color molded marker unit. The marker unit 1 shown in FIG. 1 has, for example, a form in which the first wall 80 is buried in the second resin. On the other hand, when the position of the first wall 80 is relatively far from the convex portion forming area, the height of the first wall 80 may be lower than, for example, the height of the first area 311. It may be high.
　第１壁部８０の厚み（図４（Ａ）において、上下方向の長さ）は、特に制限されず、例えば、ゲート位置７０から第１領域８０のゲート位置７０側までの距離に対して、０．０１～０．２倍、０．２～０．４倍、０．４倍～０．８倍である。 The thickness of the first wall 80 (the length in the vertical direction in FIG. 4A) is not particularly limited. For example, with respect to the distance from the gate position 70 to the gate position 70 side of the first region 80, It is 0.01 to 0.2 times, 0.2 to 0.4 times, 0.4 times to 0.8 times.
　前記第１成形工程は、前記第１金型と前記第１樹脂とを用いて、前記複数の第１領域と前記第１壁部とを有する下基板を成形できればよく、その他の条件は、特に制限されない。前記第１金型の構成は、特に制限されず、前記複数の第１領域と前記第１壁部とを有する下基板の構造から、適宜設定できる。 In the first molding step, the lower substrate having the plurality of first regions and the first wall portion may be molded using the first mold and the first resin, and the other conditions are particularly the same. It is not restricted. The configuration of the first mold is not particularly limited, and can be appropriately set from the structure of the lower substrate having the plurality of first regions and the first wall portion.
　前記第２成形工程は、前記第２金型と前記第２樹脂とを用いて、前記下基板上に前記上基板、前記複数の第１領域間に前記複数の第２領域を形成できればよく、その他の条件は、特に制限されない。前記第２金型の構成は、特に制限されず、前記複数の第１領域と前記第１壁部とを有する下基板、ならびに、前記上基板および前記複数の第２領域の構造から、適宜設定できる。 In the second molding step, the plurality of second regions may be formed between the upper substrate and the plurality of first regions on the lower substrate using the second mold and the second resin, Other conditions are not particularly limited. The configuration of the second mold is not particularly limited, and is appropriately set from the structure of the lower substrate having the plurality of first regions and the first wall portion, and the structure of the upper substrate and the plurality of second regions. it can.
　前記第１樹脂と前記第２樹脂との組み合わせは、特に制限されず、前記姿勢判断部として機能させるため、両者を判別可能な部材であることが好ましい。判別可能とは、例えば、両者が異なる色であることが好ましく、具体的には、コントラスト差が生じる色であることが好ましい。具体例としては、前記下基板を形成する第１樹脂は、例えば、黒色であり、前記上基板を形成する第２樹脂は、例えば、白色である。前記第１樹脂と前記第２樹脂は、例えば、ベースとなる樹脂に着色剤（例えば、マスターバッチ、ドライカラー等）を含有した着色樹脂でもよい。前記ベースとなる樹脂は、例えば、ポリカーボネート、ポリメタクリル酸メチル（ＰＭＭＡ）等のアクリル系樹脂、シクロオレフィンポリマー（ＣＯＰ）、シクロオレフィンコポリマー（ＣＯＣ）、アクリロニトリル－ブタジエン－スチレン共重合樹脂（ＡＢＳ）、ポリエチレンテレフタレート（ＰＥＴ）等があげられる。 The combination of the first resin and the second resin is not particularly limited, and in order to function as the posture determination unit, it is preferable that the combination be a member that can distinguish both. It is preferable that, for example, the two colors are different, that is, the color in which the contrast difference occurs is preferable. As a specific example, the first resin forming the lower substrate is, for example, black, and the second resin forming the upper substrate is, for example, white. The first resin and the second resin may be, for example, a colored resin containing a coloring agent (for example, a master batch, a dry color, etc.) in a base resin. The base resin is, for example, polycarbonate, acrylic resin such as polymethyl methacrylate (PMMA), cycloolefin polymer (COP), cycloolefin copolymer (COC), acrylonitrile-butadiene-styrene copolymer resin (ABS), Polyethylene terephthalate (PET) and the like can be mentioned.
（変形例１）
　図５に、下基板１０のその他の例を示す。図５（Ａ）は、下基板１０の上方向からみた平面図であり、図５（Ｂ）および（Ｃ）は、（Ａ）において下基板１０をＶ－Ｖ方向およびVI－VI方向から見た断面図である。図５において、図４と同一箇所には同一符号を付している。 (Modification 1)
Another example of the lower substrate 10 is shown in FIG. FIG. 5A is a plan view of the lower substrate 10 as viewed from above, and FIGS. 5B and 5C are views of the lower substrate 10 in the VV direction and the VI-VI direction in FIG. FIG. In FIG. 5, the same parts as in FIG. 4 are given the same reference numerals.
　図５の下基板１０は、２つの第１壁部８０、８１を有する。２つの第１壁部８０、８１は、平行に位置している。２つの第１壁部８０、８１は、例えば、大きさが同じでもよいし、異なってもよい。このように、平行に位置する２つの第１壁部８０、８１を有することによって、ゲート位置７０を通じて導入された前記第２樹脂を、より効率よく、第１領域３１１の周囲を回り込ませることができる。 The lower substrate 10 of FIG. 5 has two first wall portions 80 and 81. The two first wall portions 80, 81 are located in parallel. The two first wall portions 80, 81 may, for example, be the same or different in size. Thus, having the two first wall portions 80 and 81 positioned in parallel allows the second resin introduced through the gate position 70 to wrap around the first region 311 more efficiently. it can.
　第１壁部８０と第１壁部８１との距離は、特に制限されず、例えば、０～１ｍｍ、１～３ｍｍである。 The distance between the first wall 80 and the first wall 81 is not particularly limited, and is, for example, 0 to 1 mm or 1 to 3 mm.
　２つの第１壁部８０、８１の長さ（図５（Ａ）において、左右方向の長さ）は、例えば、同じでも、異なってもよく、具体例として、いずれも、前記凸部形成領域（一端の第１領域３１１から他端の第１領域３１１までの領域）の長さと同等またはそれよりも長いことが好ましい。第１壁部８０、８１の長さは、例えば、前記凸部形成領域の長さに対して、例えば、０．５～１倍、１～１．５倍である。 The lengths of the two first wall portions 80 and 81 (the length in the left-right direction in FIG. 5A) may be, for example, the same or different. It is preferable that the length is equal to or longer than the length (the area from the first area 311 at one end to the first area 311 at the other end). The length of the first wall portion 80, 81 is, for example, 0.5 to 1 times, 1 to 1.5 times the length of the convex portion forming area, for example.
　２つの第１壁部８０、８１の高さ（図５（Ｂ）において、上下方向の長さ）は、例えば、同じでも、異なってもよい。この２つの第１壁部８０、８１の高さは、特に制限されず、例えば、第１領域３１１の高さおよび第２樹脂の流れ方に応じて、適宜設定できる。 The heights of the two first wall portions 80, 81 (the lengths in the vertical direction in FIG. 5B) may be the same or different, for example. The heights of the two first wall portions 80 and 81 are not particularly limited, and can be set as appropriate according to, for example, the height of the first region 311 and the flow of the second resin.
　前記第２樹脂の導入により、下基板１０上に前記上基板を形成した際、第１領域３１１側の第１壁部８０は、ゲート位置７０側の第１壁部８１よりも、前記マーカユニットの凸部に近い位置である。このため、前記マーカユニットの使用時において、前記姿勢判断部を構成する前記凸部に近い第１壁部８０は、前記凸部の検出への影響を低減する点から、第１領域３１１の高さよりも低いことが好ましい。第１領域３１１側の第１壁部８０を第１領域３１１よりも低い高さに設定すれば、例えば、前記第２樹脂の導入による前記上基板と前記第２領域との成形により、第１領域３１１側の第１壁部８０を、前記第２樹脂に埋没させることができる。このため、二色成形された前記マーカユニットにおいて、第１領域３１１側の第１壁部８０が検出されることによる、前記姿勢判断部の検出への影響を防止できる。 When the upper substrate is formed on the lower substrate 10 by the introduction of the second resin, the first wall 80 on the first region 311 side is closer to the marker unit than the first wall 81 on the gate position 70 side. It is a position near the convex part of. For this reason, when the marker unit is used, the first wall 80 near the convex portion constituting the posture determination portion has a high height in the first region 311 in order to reduce the influence on the detection of the convex portion. Preferably less than If the first wall 80 on the side of the first region 311 is set to a height lower than that of the first region 311, for example, the first substrate and the second region may be molded by introducing the second resin. The first wall 80 on the region 311 side can be buried in the second resin. For this reason, it is possible to prevent the detection of the posture determination unit from being affected by the detection of the first wall 80 on the side of the first region 311 in the two-color molded marker unit.
　２つの第１壁部８０、８１の厚み（図５（Ａ）において、上下方向の長さ）は、例えば、同じでも、異なってもよい。後者の場合、例えば、ゲート位置７０側の第１壁部８１の厚みは、第１領域３１１側の第１壁部８０よりも厚いことが好ましい。 The thickness of the two first wall portions 80 and 81 (the length in the vertical direction in FIG. 5A) may be the same or different, for example. In the latter case, for example, the thickness of the first wall 81 on the gate position 70 side is preferably thicker than the first wall 80 on the first region 311 side.
（変形例２）
　つぎに、図６に、下基板１０のさらにその他の例を示す。図６は、下基板１０の上方向からみた平面図である。図６において、図５と同一箇所には同一符号を付している。 (Modification 2)
Next, FIG. 6 shows still another example of the lower substrate 10. FIG. 6 is a plan view of the lower substrate 10 as viewed from above. In FIG. 6, the same parts as in FIG. 5 are assigned the same reference numerals.
　図６の下基板１０は、２つの第１壁部８０、８１の他に、さらに、一対となる２つの第２壁部９０、９１を有する。２つの第２壁部９０、９１は、それぞれ、２つの第１壁部８０、８１の端部間に形成されており、例えば、平行に位置している。２つの第２壁部９０、９１は、例えば、大きさが同じでもよいし、異なってもよい。このように、２つの第２壁部９０、９１を有することによって、２つの第１壁部８０、８１によって、複数の第１領域３１１の周囲に回り込もうとする前記第２樹脂が、第１壁部８０と第１壁部８１との間に入り込むことを防止し、より効率よく、第１領域３１１の周囲を回り込ませることができる。 The lower substrate 10 of FIG. 6 further includes two second wall portions 90 and 91 as a pair in addition to the two first wall portions 80 and 81. The two second wall portions 90, 91 are respectively formed between the ends of the two first wall portions 80, 81 and are, for example, parallel. The two second wall portions 90, 91 may, for example, be the same or different in size. Thus, by having the two second wall portions 90 and 91, the second resin which is going to wrap around the plurality of first regions 311 by the two first wall portions 80 and 81 is It is possible to prevent the space between the first wall portion 80 and the first wall portion 81 from entering, and it is possible to efficiently get around the first region 311.
　２つの第２壁部９０、９１の長さ（図６において、左右方向の長さ）は、例えば、同じでも、異なってもよく、具体的には、第１壁部８０と第１壁部８１との距離に応じて適宜設定できる。 The lengths of the two second wall portions 90 and 91 (the length in the left-right direction in FIG. 6) may be the same or different, for example. Specifically, the first wall portion 80 and the first wall portion It can be set appropriately according to the distance to 81.
　第２壁部９０、９１の厚みおよび高さは、特に制限されず、例えば、第１壁部８０と同じでもよいし、第１壁部８１と同じでもよい。 The thickness and height of the second wall 90 and 91 are not particularly limited, and may be the same as, for example, the first wall 80 or the same as the first wall 81.
　第１壁部８０と第１壁部８１とは、例えば、一対の第２壁部９０、９１と接続した形状でもよいし、分離した形状でもよい。 The first wall 80 and the first wall 81 may have, for example, a shape connected to the pair of second walls 90 and 91 or a separated shape.
（変形例３）
　つぎに、図７に、下基板１０のさらにその他の例を示す。図７（Ａ）は、下基板１０の上方向からみた平面図であり、図７（Ｂ）は、（Ａ）において下基板１０をVII－VII方向から見た断面図である。図７において、図５および図６と同一箇所には同一符号を付している。 (Modification 3)
Next, still another example of the lower substrate 10 is shown in FIG. FIG. 7A is a plan view of the lower substrate 10 as viewed from above, and FIG. 7B is a cross-sectional view of the lower substrate 10 as viewed in the direction of VII-VII in FIG. In FIG. 7, the same parts as those in FIGS. 5 and 6 are denoted by the same reference numerals.
　図７の下基板１０は、第１壁部１００を有する。壁部１００は、前記変形例２における一対の第１壁部８０、８１および一対の第２壁部９０、９１と、それらで囲まれる領域に、形成されている。 The lower substrate 10 of FIG. 7 has a first wall 100. The wall portion 100 is formed in the area surrounded by the pair of first wall portions 80 and 81 and the pair of second wall portions 90 and 91 in the second modification.
　第１壁部１００の長さ（図７（Ａ）において、左右方向の長さ）は、例えば、前記凸部形成領域（一端の第１領域３１１から他端の第１領域３１１までの領域）の長さと同等またはそれよりも長いことが好ましい。第１壁部１００の長さは、例えば、前記凸部形成領域の長さに対して、例えば、０．５～１倍、１～１．５倍である。 The length of the first wall 100 (the length in the left-right direction in FIG. 7A) is, for example, the convex portion forming region (a region from the first region 311 at one end to the first region 311 at the other end) Preferably it is equal to or longer than the length of. The length of the first wall portion 100 is, for example, 0.5 to 1 times, 1 to 1.5 times the length of the convex portion forming area, for example.
　第１壁部１００の厚み（図７（Ａ）において、上下方向の長さ）は、例えば、ゲート位置７０から第１領域３１１のゲート位置７０側までの距離に対して、０．０２～０．４倍、０．４～１倍である。 The thickness of the first wall portion 100 (the length in the vertical direction in FIG. 7A) is, for example, 0.02 to 0 with respect to the distance from the gate position 70 to the gate position 70 side of the first region 311. .4 times, 0.4 to 1 times.
　第１壁部１００の高さ（図７（Ｂ）において、上下方向の長さ）は、例えば、前記幅方向に向かって同じでも、異なってもよい。後者の場合、例えば、前記変形例１における一対の第１壁部８０、８１と同様の理由から、第１壁部１００において、例えば、第１領域３１１側の高さは、ゲート位置７０側の高さよりも、低いことが好ましい。 The height (the length in the vertical direction in FIG. 7B) of the first wall 100 may be the same or different, for example, in the width direction. In the latter case, for example, for the same reason as the pair of first wall portions 80 and 81 in the first modification, in the first wall portion 100, for example, the height on the first region 311 side is the gate position 70 side. Lower than height is preferred.
　以上、実施形態を参照して本願発明を説明したが、本願発明は、上記実施形態に限定されるものではない。本願発明の構成や詳細には、本願発明のスコープ内で当業者が理解し得る様々な変更をすることができる。 Although the present invention has been described above with reference to the embodiments, the present invention is not limited to the above embodiments. The configurations and details of the present invention can be modified in various ways that can be understood by those skilled in the art within the scope of the present invention.
　この出願は、２０１７年１２月２１日に出願された日本出願特願２０１７－２４５５８１を基礎とする優先権を主張し、その開示のすべてをここに取り込む。 This application claims priority based on Japanese Patent Application No. 2017-245581 filed on Dec. 21, 2017, the entire disclosure of which is incorporated herein.
　以上のように、本発明のマーカユニットの製造方法によれば、前記下基板に前記第１壁部を形成することによって、前述のような、樹脂のつなぎ目の発生を防止できる。 As described above, according to the method of manufacturing a marker unit of the present invention, the formation of the first wall portion on the lower substrate can prevent the occurrence of the joint of the resin as described above.
１　　　マーカユニット
１０、２００　　　下基板
１２　　　検出基準部
２０　　　上基板
２２　　　貫通孔
３０　　　姿勢判断部
３１　　　凸部
３１１　　第１領域
３１１１　第１傾斜面
３１２　　第２領域
３１２１　第２傾斜面
３１３　　稜線
３２　　　連結部
７０　　　ゲート位置
８０、８１、１００　第１壁部
９０、９１　第２壁部

  Reference Signs List 1 marker unit 10 200 lower substrate 12 detection reference unit 20 upper substrate 22 through hole 30 posture determination unit 31 convex portion 311 first region 3111 first inclined surface 312 second region 3121 second inclined surface 313 ridge line 32 connecting portion 70 gate 70 gate Position 80, 81, 100 first wall 90, 91 second wall

Claims (3)

  1. 二色成形により、下基板と上基板とを含むマーカユニットを製造する方法であって、
    前記マーカユニットは、
    　　前記下基板上に、前記上基板が配置され、
    　　前記上基板が、前記下基板が露出する露出部を有し、
    　　前記露出部内に、姿勢判断部を有し、
    前記姿勢判断部は、
    　　連続する複数の凸部を有し、
    前記各凸部は、
    　　互いに平行な稜線と、前記稜線を頂点とする一方の第１傾斜面を含む第１領域と、前記稜線を頂点とする他方の第２傾斜面を含む第２領域と、を有し、
    第１金型内に第１樹脂を導入して、前記下基板、および、前記下基板上に複数の前記第１領域を形成する第１成形工程、および、
    第２金型内に第２樹脂を導入して、前記下基板上に前記上基板、および、前記複数の第１領域間に複数の前記第２領域を形成する第２成形工程を含み、
    前記第１成形工程で形成される前記下基板は、
    　　前記上基板を形成する第２樹脂のゲート位置と前記複数の第１領域との間において、前記複数の第１領域が連続する方向に沿って、上方向に突出する第１壁部を有することを特徴とするマーカユニットの製造方法。     A method of manufacturing a marker unit including a lower substrate and an upper substrate by two-color molding,
    The marker unit is
    The upper substrate is disposed on the lower substrate,
    The upper substrate has an exposed portion to which the lower substrate is exposed,
    A posture determination unit in the exposed portion;
    The posture determination unit
    It has a plurality of continuous projections,
    Each said convex part is
    It has a ridgeline parallel to each other, a first region including one first inclined surface having the ridgeline as a vertex, and a second region including the other second inclined surface having the ridgeline as a vertex,
    A first molding step of introducing a first resin into a first mold to form the lower substrate and a plurality of the first regions on the lower substrate;
    Including a second forming step of introducing a second resin into a second mold to form the upper substrate and the plurality of second regions between the plurality of first regions on the lower substrate;
    The lower substrate formed in the first forming step is
    Between the gate position of the second resin forming the upper substrate and the plurality of first regions, there is provided a first wall projecting upward along the direction in which the plurality of first regions are continuous. A method of manufacturing a marker unit characterized by
  2. 前記下基板は、平行に位置する２つの前記第１壁部を有する、請求項１記載の製造方法。 The method according to claim 1, wherein the lower substrate has two of the first wall portions positioned in parallel.
  3. 前記下基板は、
    　さらに、上方向に突出する２つの第２壁部を有し、
    前記２つの第２壁部は、それぞれ、
    　前記２つの第１壁部の端部間に形成されている、請求項２記載の製造方法。

          The lower substrate is
    Furthermore, it has two second wall parts which project upwards,
    The two second walls are each
    The method according to claim 2, wherein the method is formed between the ends of the two first walls.

PCT/JP2018/045542 2017-12-21 2018-12-11 Method for manufacturing marker unit WO2019124167A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000112151A (en) * 1998-08-06 2000-04-21 Sanee Giken Kk Mark for positioning, positioning method and aligning method
JP2015194732A (en) * 2014-03-18 2015-11-05 株式会社エンプラス Image display body
WO2016024555A1 (en) * 2014-08-12 2016-02-18 国立研究開発法人産業技術総合研究所 Marker and attitude estimation method using marker
WO2017110779A1 (en) * 2015-12-22 2017-06-29 株式会社エンプラス Marker

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0584970A (en) * 1991-09-25 1993-04-06 Matsushita Electric Ind Co Ltd Feed container, discrimination control method therefor and code forming method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000112151A (en) * 1998-08-06 2000-04-21 Sanee Giken Kk Mark for positioning, positioning method and aligning method
JP2015194732A (en) * 2014-03-18 2015-11-05 株式会社エンプラス Image display body
WO2016024555A1 (en) * 2014-08-12 2016-02-18 国立研究開発法人産業技術総合研究所 Marker and attitude estimation method using marker
WO2017110779A1 (en) * 2015-12-22 2017-06-29 株式会社エンプラス Marker

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