WO2019091133A1 - Self-cleaning assembly, camera and self-cleaning method - Google Patents

Self-cleaning assembly, camera and self-cleaning method Download PDF

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Publication number
WO2019091133A1
WO2019091133A1 PCT/CN2018/095538 CN2018095538W WO2019091133A1 WO 2019091133 A1 WO2019091133 A1 WO 2019091133A1 CN 2018095538 W CN2018095538 W CN 2018095538W WO 2019091133 A1 WO2019091133 A1 WO 2019091133A1
Authority
WO
WIPO (PCT)
Prior art keywords
lens
cleaning
self
cleaning brush
condensed water
Prior art date
Application number
PCT/CN2018/095538
Other languages
French (fr)
Chinese (zh)
Inventor
刘佳
杨传枫
曹金灿
Original Assignee
华为技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 华为技术有限公司 filed Critical 华为技术有限公司
Publication of WO2019091133A1 publication Critical patent/WO2019091133A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • B08B1/32
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25BREFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B21/00Machines, plants or systems, using electric or magnetic effects
    • F25B21/02Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
    • F25B21/04Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect reversible
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25BREFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B49/00Arrangement or mounting of control or safety devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00Details of cameras or camera bodies; Accessories therefor
    • G03B17/56Accessories
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof

Definitions

  • the present application relates to the field of security equipment, and in particular, to a self-cleaning component, a camera, and a self-cleaning method.
  • the video surveillance industry has entered a rapid development channel.
  • the lens in front of the lens is often dirty due to dust, rain, fog, oil, etc., resulting in poor image quality, so the image quality is not guaranteed.
  • mainstream camera manufacturers propose to add a wiper on the top of the lens, and use a wiper to remove the dirt of the lens.
  • the wiper has a large friction with the glass surface in a dry environment, and it is easy to scratch the lens, and the wiper can only clean the dust on the lens, and the cleaning effect on oil stains, bird droppings, etc. is poor.
  • the present application provides a self-cleaning assembly that does not wear the lens and has a good cleaning effect, a video camera, and a self-cleaning method.
  • a self-cleaning assembly is provided.
  • the self-cleaning assembly is applied to a camera.
  • the self-cleaning assembly includes an end cap, a cleaning brush, and a semiconductor refrigeration sheet.
  • the end cap is provided with a lens.
  • the cleaning brush is rotatably coupled to the end cap.
  • the cleaning brush is mounted on the end cap and the cleaning brush is rotatable relative to the end cap.
  • the semiconductor refrigeration sheet is used to produce condensed water. When the semiconductor refrigerating sheet is electrically cooled, the water vapor in the air is cooled to generate condensed water. During the rotation of the cleaning brush, the condensed water is carried through the lens to clean the lens. In other words, the range of rotation of the cleaning brush covers the lens such that the cleaning brush can pass the lens while rotating to clean the lens.
  • the self-cleaning assembly refrigerates through the semiconductor refrigerating sheet to condense water vapor in the air to form the condensed water, and carries the condensed water through the lens through the cleaning brush, thereby enabling cleaning of the lens with water.
  • the cleaning brush removes the lens with water, the lens is not worn, so that the camera applying the self-cleaning component has a long service life and has a good cleaning effect, and can effectively remove the lens.
  • the oil, bird droppings, etc. are dirty.
  • the self-cleaning assembly can self-produce the condensed water through the semiconductor refrigeration sheet when needed, and clean the lens by the cleaning brush, thereby achieving self-cleaning and good cleaning effect.
  • the camera can be operated normally for a long time and the daily maintenance cost is low.
  • the cleaning brush in conjunction with the first aspect, in a first possible implementation of the first aspect, includes a rotating shaft, a bracket, and a brush head.
  • the bracket is rotatably coupled to the end cap by the rotating shaft.
  • the bracket includes oppositely disposed rotating ends and movable ends.
  • the rotating shaft is coupled to the rotating end of the bracket to rotate the movable end about the rotating end.
  • the brush head is secured to a side of the bracket that faces the end cap.
  • the brush head is made of a water absorbing material. Water absorbing materials include, but are not limited to, absorbent cotton, silica gel, sponge, water absorbing resin, water absorbing rubber, and the like.
  • the brush head is made of a water absorbing material, the brush head can quickly absorb the condensed water generated by the semiconductor refrigerating sheet, thereby carrying the condensed water to clean the lens.
  • the brush head may also adopt a material that is less hygroscopic, but still has a certain hydrophilicity, such as plastic, so that the cleaning brush can still carry the condensed water during the rotation process. Clean the lens.
  • the self-cleaning assembly further includes a driving member for driving the rotating shaft to drive the bracket to rotate.
  • the drive member can be a motor.
  • the drive member is located on a side of the end cap that is remote from the cleaning brush.
  • the lens is secured to the end cap by assembly.
  • the end cover is provided with a through hole
  • the lens is a component independent of the end cover
  • the lens is embedded in the through hole or covers an opening at one end of the through hole to be fixed to the end cover.
  • the lens is embedded in the through hole, and the periphery of the lens and the hole wall of the through hole are bonded by an adhesive.
  • the hole wall of the through hole is provided with a limiting surface.
  • the lens is received in the through hole, and the lens abuts the limiting surface.
  • the limiting surface is bonded to the periphery of the lens by a double-sided tape or an adhesive.
  • the limiting surface may face the cleaning brush to facilitate fixing the lens, or the limiting surface may face away from the cleaning brush to prevent the lens from falling.
  • the lens is part of the end cap.
  • the end cap also includes a shaded area surrounding the perimeter of the lens.
  • the lens is made of a transparent material to allow light to pass through.
  • the shielding area is made of a light shielding material to achieve a shielding effect.
  • the end cap can be integrally formed by a buried molding process or a two-shot molding process.
  • the lens faces the mirror of the cleaning brush and the end cap faces the cleaning brush
  • the outer surface is flush.
  • the mirror surface of the lens is flush with the outer surface of the end cap, an area where dirt is easily collected is not formed on the periphery of the lens, so that the cleaning brush can smoothly clean the mirror surface of the lens. And the cleaning efficiency is high and the cleaning effect is good.
  • the mirror surface of the lens is covered with a hydrophobic coating, so that after the lens is covered with dust, the dust can be smoothly drained by water (including but not limited to the condensed water, rainwater generated by the semiconductor refrigeration sheet, Dew, etc.) is carried away to keep the mirror surface of the lens relatively clean.
  • water including but not limited to the condensed water, rainwater generated by the semiconductor refrigeration sheet, Dew, etc.
  • the outer casing is connected to a circumference of the end cover.
  • the outer casing and the end cover together define an accommodating space.
  • the camera body is received in the accommodating space.
  • the lens is disposed in the accommodating space adjacent to the end cap to face the lens.
  • the semiconductor refrigerating sheet may be fixed to the end cap, or fixed to the cleaning brush, or located on a side of the end cap away from the cleaning brush (for example, fixed to the outer casing).
  • the semiconductor refrigerating sheet When the semiconductor refrigerating sheet is fixed on the outer casing, it may be accommodated in the accommodating space or may be located outside the accommodating space.
  • the semiconductor refrigeration sheet When the semiconductor refrigeration sheet generates the condensed water at any of the above positions, the condensed water may directly or indirectly contact the cleaning brush or flow through the rotation range of the cleaning brush or flow through the lens, so that the A cleaning brush carries the condensed water to clean the lens.
  • the end cap is provided with a receiving slot.
  • the semiconductor refrigerating sheet is housed in the receiving groove.
  • the receiving groove is located within a rotation range of the cleaning brush.
  • the cold end of the semiconductor refrigerating sheet is disposed adjacent to an outer surface of the end cap, and a hot end of the semiconductor refrigerating sheet is disposed away from an outer surface of the end cap.
  • the condensed water is formed in the vicinity of the cold end of the semiconductor refrigerating sheet, that is, the condensed water is formed at a region of the end cap close to the semiconductor refrigerating sheet.
  • the condensed water can be formed in a rotation range of the cleaning brush, so that the condensed water is carried when the cleaning brush rotates.
  • the cleaning brush cleans the lens with water.
  • the self-cleaning component first cools the condensed water by the semiconductor refrigerating sheet, and after the condensed water flows through the rotating range of the cleaning brush, starts the cleaning brush to rotate, so that the cleaning brush carries when rotating The condensed water cleans the lens.
  • the end cap is provided with a receiving slot.
  • the semiconductor refrigerating sheet is housed in the receiving groove.
  • the receiving groove is located vertically above the lens such that the condensed water passes through the lens under the force of gravity.
  • the cold end of the semiconductor refrigerating sheet is disposed adjacent to an outer surface of the end cap, and a hot end of the semiconductor refrigerating sheet is disposed away from an outer surface of the end cap.
  • the chilled water is formed at a cold end of the semiconductor refrigerating sheet, and the condensed water is formed near a cold end of the semiconductor refrigerating sheet, that is, at a region of the end cap close to the semiconductor refrigerating sheet. Since the receiving groove is located vertically above the lens, the condensed water can be formed vertically above the lens, so that the condensed water passes through the lens under the action of gravity, and the cleaning brush rotates past In the case of the lens, the cleaning brush can carry the condensed water to achieve water cleaning.
  • the self-cleaning component first cools the condensed water through the semiconductor refrigeration sheet, and the condensed water passes through the lens, and after the mirror surface of the lens is wetted, the cleaning brush is started to rotate, so that the cleaning brush is The condensed water is carried while rotating to clean the lens.
  • the receiving slot is provided with a communication hole away from the bottom wall of the outer surface of the end cover, and the communication hole is configured to allow the power cable of the semiconductor refrigeration chip to pass.
  • the semiconductor refrigerating sheet housed in the receiving groove is electrically connected to the camera body through the power source line.
  • a waterproof gel is filled between the groove wall of the receiving groove and the semiconductor refrigeration sheet to achieve a waterproof seal.
  • the waterproof gel can completely wrap the semiconductor refrigeration sheet to protect the semiconductor refrigeration sheet.
  • the thickness of the portion of the waterproof gel covering the cold end of the semiconductor refrigerating sheet is thinner than the thickness of other portions of the waterproof gel to ensure the cooling effect of the cold end of the semiconductor refrigerating sheet.
  • the cold end of the semiconductor refrigerating sheet has a distance away from the semiconductor refrigeration a condensing surface of the hot end of the sheet, the condensing surface being flush with the outer surface of the end cap facing the cleaning brush. Since the condensation surface is flush with the outer surface of the end cap, condensed water generated on the condensation surface can smoothly flow from the condensation surface to the outer surface of the end cap and the lens The mirror surface is such that there is sufficient condensed water on the mirror surface of the lens to ensure the cleaning efficiency and cleaning effect of the self-cleaning assembly.
  • the semiconductor refrigerating sheet is fixed to the cleaning Brush it up.
  • the cold end of the semiconductor refrigerating sheet is disposed away from the cleaning brush with respect to the hot end of the semiconductor refrigerating sheet.
  • the condensed water is formed in the vicinity of the cold end of the semiconductor refrigerating sheet, that is, the condensed water is formed at a region of the cleaning brush close to the semiconductor refrigerating sheet.
  • the condensed water can be quickly absorbed by the brush head, so that the cleaning brush can carry the condensed water to clean the lens.
  • the condensed water can also penetrate into the brush head to enable the cleaning brush to be cleaned with water.
  • the self-cleaning component first cools the condensed water by the semiconductor refrigeration sheet, and after the condensed water is absorbed or penetrates into the brush head by the brush head, the cleaning brush is started to rotate, thereby making the cleaning brush
  • the lens is cleaned by carrying the condensed water while rotating, and the cleaning effect is better.
  • the cleaning brush has an initial position when it is not rotated.
  • the semiconductor refrigerating sheet is fixed at an upper position of the cleaning brush so that the condensed water is better absorbed by the brush head or infiltrated into the brush head by gravity.
  • the semiconductor refrigerating sheet is disposed on an upper portion of the cleaning brush, and the brush head of the cleaning brush is made of a water absorbing material.
  • the semiconductor refrigerating sheet is energized, the semiconductor refrigerating sheet condenses water vapor to generate the condensed water, the condensed water flows into the water absorbing material, and then the cleaning brush is activated to rotate the cleaning lens.
  • the hot end of the semiconductor refrigerating sheet may be fixed to the holder of the cleaning brush by bonding or the like.
  • the bracket has a connecting surface away from the brush head, and the connecting surface has a flat area with a large area to facilitate attachment of the hot end of the semiconductor cooling sheet.
  • the initial position of the cleaning brush is located vertically above the lens such that the condensed water is under gravity Pass the lens.
  • the chilled water is formed in the vicinity of the cold end of the semiconductor refrigerating sheet at the cold end of the semiconductor refrigerating sheet, that is, the condensed water is formed at a region of the cleaning brush adjacent to the semiconductor refrigerating sheet.
  • the semiconductor refrigerating sheet is cooled when the cleaning brush is in an initial position, so that the condensed water can be formed vertically above the lens, thereby
  • the condensed water passes through the lens under the action of gravity, and the cleaning brush can carry the condensed water when the cleaning brush rotates through the lens, thereby achieving water cleaning.
  • the brush head of the cleaning brush is made of a water absorbing material or a hydrophilic material, the condensed water can also be sucked into the brush head or penetrate into the brush head at the same time, so that the cleaning brush is cleaned with water. The effect of the lens is better.
  • the self-cleaning component first cools the condensed water through the semiconductor refrigeration sheet, and the condensed water passes through the lens, and after the mirror surface of the lens is wetted, the cleaning brush is started to rotate, so that the cleaning brush is The condensed water is carried while rotating to clean the lens, so that the cleaning effect is better.
  • the self-cleaning assembly further includes a water tank and a water pipe .
  • the semiconductor cooling sheet is housed in the water tank to form the condensed water in the water tank.
  • the water tank is located on a side of the end cap away from the cleaning brush.
  • An inlet end of the water pipe communicates with the water tank, and an outlet end of the water pipe is fixed to the end cover.
  • the outlet end of the water pipe is located within the range of rotation of the cleaning brush.
  • the condensed water is formed in the water tank during cooling of the cold junction of the semiconductor refrigerating sheet.
  • the water pipe can be turned on when the lens needs to be cleaned, so that the condensed water flows out. Since the outlet end of the water pipe is located within a rotation range of the cleaning brush, the condensed water can flow to a rotation range of the cleaning brush, thereby carrying the condensed water when the cleaning brush rotates, Achieve clean water.
  • the self-cleaning assembly further includes a water tank and a water pipe .
  • the semiconductor cooling sheet is housed in the water tank to form the condensed water in the water tank.
  • the water tank is located on a side of the end cap away from the cleaning brush.
  • the inlet end of the water pipe communicates with the water tank.
  • An outlet end of the water tube is secured to the end cap and vertically above the lens such that the condensed water passes the lens under the force of gravity.
  • the condensed water is formed in the water tank during cooling of the cold junction of the semiconductor refrigerating sheet.
  • the water pipe can be turned on when the lens needs to be cleaned, so that the condensed water flows out. Since the outlet end of the water pipe is vertically above the lens, the condensed water passes through the lens under the force of gravity, and the cleaning brush can carry the cleaning brush as the cleaning brush rotates through the lens Condensate water for clean water.
  • the semiconductor refrigerating sheet may refrigerate to generate the condensed water when the lens needs to be cleaned, or may be in a refrigerating state for a long time, so that the water tank collects enough condensed water to start cleaning at any time.
  • the lens the emergency response is fast.
  • the water pipe is turned on to allow the condensed water to flow out, and the cleaning brush achieves water cleaning.
  • the water tank can be received in the accommodating space to improve concealment, so that the camera has a relatively clean appearance.
  • the water tank may also be secured to the outer sidewall of the outer casing to collect a portion of the natural water (eg, rain, dew, etc.).
  • an on-off valve may be provided at the middle or at least one end of the water pipe to control the on and off states of the water pipe.
  • a camera in a second aspect, includes a camera body and a self-cleaning assembly in any one of the possible implementations of the first aspect.
  • the camera body is located on a side of the end cap away from the cleaning brush.
  • the lens of the camera body is disposed opposite the lens.
  • the lens is made of a light transmissive material such that external light can penetrate the lens into the lens. Since the self-cleaning assembly can achieve self-cleaning and good cleaning effect, the camera can operate normally for a long time and the daily maintenance cost is low.
  • a self-cleaning method cleans the lens using a self-cleaning assembly in any of the possible implementations of the first aspect to enable the camera to achieve long-term operation and better image quality.
  • the self-cleaning assembly includes an end cap, a cleaning brush, and a semiconductor refrigeration sheet.
  • the end cap is provided with a lens.
  • the cleaning brush is rotatably coupled to the end cap.
  • the self-cleaning method includes:
  • the semiconductor refrigeration sheet is cooled to form condensed water.
  • the cleaning brush is driven to rotate such that the cleaning brush carries the condensed water to clean the lens.
  • the self-cleaning method is capable of efficiently purifying the lens by cooling the semiconductor chilled water by the semiconductor refrigerating sheet and then driving the cleaning brush to clean the lens when the lens needs to be cleaned, and Cleaning with water is effective and avoids wearing the lens.
  • the triggering condition for the cooling of the semiconductor refrigerating sheet to form condensed water may be: automatic triggering when there is dirt on the lens, or timing triggering, or manual triggering. Specifically, it is determined whether there is dirt on the lens by image signal processing, and when there is dirt on the lens, the semiconductor refrigeration sheet is automatically triggered to form condensed water.
  • the timing triggering program can be set to automatically trigger the cooling of the semiconductor refrigerating sheet to form condensed water after a certain period of time.
  • the semiconductor refrigerating sheet may be temporarily manually triggered to form condensed water in other environments (e.g., heavy fog, etc.) where cleaning of the lens is required.
  • the above three triggering modes may be selected one, or a combination of a plurality of them may be selected.
  • the process of cooling the semiconductor refrigerating sheet to form condensed water comprises:
  • the dew point temperature is calculated based on air temperature and air humidity.
  • the dew point temperature is the temperature at which water vapor in the air is condensed into water.
  • the semiconductor refrigeration chip is provided with a temperature sensor and a humidity sensor for detecting the temperature and humidity of the air.
  • temperature sensors and humidity sensors can also be provided on other components of the self-cleaning assembly (eg, end caps, etc.).
  • the cold end of the semiconductor refrigeration sheet is at a first temperature for a first length of time to reduce the air temperature to the dew point temperature.
  • the air temperature is lowered to the dew point temperature, water vapor in the air begins to condense to form the condensed water.
  • the cold end of the semiconductor refrigerating sheet continues for a second time at a second temperature to form condensed water, the second temperature being higher than or equal to the first temperature.
  • the cold end of the semiconductor refrigeration sheet continues to be cooled, thereby forming a sufficient amount of the condensed water to ensure the cleaning effect of the self-cleaning method.
  • the second temperature may be equal to the first temperature to form sufficient condensed water as soon as possible, and the second temperature may also be higher than the first temperature, Thereby, the energy consumption of the semiconductor refrigerating sheet is lowered while the condensed water is continuously formed.
  • the length of time of the first duration and the length of time of the second duration are not limited, and the first duration and the second duration may be flexibly set according to the temperature and humidity of the air and the demand for cleaning water. set.
  • the process of cooling the semiconductor refrigerating sheet to form condensed water before calculating the dew point temperature further comprises:
  • the semiconductor cooling sheet When the air temperature is lower than the first threshold, the semiconductor cooling sheet continues to heat for a third time period to raise the air temperature to a second threshold, the second threshold being greater than the first threshold.
  • the ambient air temperature is very low, and it is difficult to obtain the condensed water directly by the semiconductor refrigeration sheet, so that the air temperature is raised first by heating. Up to the second threshold, the semiconductor refrigeration sheet can be smoothly condensed to obtain the condensed water.
  • the step of detecting the humidity of the air may be performed simultaneously with the step of detecting the temperature of the air to save detection time.
  • the dew point temperature may be calculated according to the detected air temperature and air humidity. If the semiconductor refrigerating sheet still needs to be heated to raise the air temperature to the second threshold, the air humidity needs to be detected again so that the dew point temperature can obtain an accurate value according to the current data.
  • FIG. 1 is a schematic structural diagram of a camera provided by an embodiment of the present application.
  • Figure 2 is another schematic structural view of the camera shown in Figure 1;
  • FIG. 3 is a schematic structural view of an embodiment of a self-cleaning assembly of the camera shown in FIG. 1;
  • FIG. 4 is a partial structural schematic view of the self-cleaning assembly of the camera shown in FIG. 1;
  • Figure 5 is a schematic structural view of an embodiment of the structure at A in Figure 2;
  • Figure 6 is a schematic structural view of an embodiment of the structure at A in Figure 2;
  • FIG. 7 is a schematic structural view of another embodiment of the self-cleaning assembly of the camera shown in FIG. 1;
  • Figure 8 is another schematic structural view of the self-cleaning assembly shown in Figure 7;
  • FIG. 9 is a schematic structural view of still another embodiment of the self-cleaning assembly of the camera shown in FIG. 1;
  • Figure 10 is another schematic structural view of the self-cleaning assembly shown in Figure 9;
  • FIG. 11 is a flow chart of a self-cleaning method provided by an embodiment of the present application.
  • Figure 12 is a detailed flow chart of step 01 of the self-cleaning method shown in Figure 11;
  • FIG. 13 is a schematic structural view of still another embodiment of the self-cleaning assembly of the camera shown in FIG. 1.
  • FIG. 13 is a schematic structural view of still another embodiment of the self-cleaning assembly of the camera shown in FIG. 1.
  • an embodiment of the present application provides a camera 100 .
  • the camera 100 can be a network camera (IP Camera).
  • IP Camera network camera
  • the camera 100 includes a camera body 200 and a self-cleaning assembly 300.
  • the camera body 200 is used to implement image capture.
  • the camera body 200 is further configured to compress and encrypt data (including but not limited to image data, sound data, etc.) and send it to an end user via a local area network, the Internet, or a wireless network.
  • the camera body 200 mainly includes a lens 201, an image sensor, a sound sensor, an analog-to-digital converter, an image encoder, a processor, a memory, and the like.
  • an embodiment of the present application provides a self-cleaning assembly 300 .
  • the self-cleaning assembly 300 is applied to the camera 100.
  • the self-cleaning assembly 300 includes an end cap 1, a cleaning brush 2, and a semiconductor refrigerating sheet 3.
  • the end cap 1 is provided with a lens 4.
  • the cleaning brush 2 is rotatably coupled to the end cap 1.
  • the cleaning brush 2 is mounted on the end cap 1 and the cleaning brush 2 is rotatable relative to the end cap 1.
  • the semiconductor refrigerating sheet 3 is used to generate condensed water.
  • the semiconductor refrigerating sheet 3 is electrically cooled, water vapor in the air is cooled to generate condensed water.
  • the condensed water is carried through the lens 4 to clean the lens 4.
  • the range of rotation 20 of the cleaning brush 2 covers the lens 4 such that the cleaning brush 2 can pass the lens 4 while rotating to clean the lens 4.
  • the camera body 200 is located on a side of the end cover 1 away from the cleaning brush 2.
  • the lens 201 of the camera body 200 is disposed opposite the lens 4.
  • the lens 4 is made of a light transmissive material such that external light can penetrate the lens 4 into the lens 201.
  • the lens 4 can prevent the external light from being significantly changed in the direction of propagation when passing through the lens 4, thereby causing image distortion, and can also protect the lens 201.
  • the self-cleaning assembly 300 is cooled by the semiconductor refrigerating sheet 3 to condense water vapor in the air to form the condensed water, and the condensed water is carried by the cleaning brush 2 through the lens 4, Thereby, the lens 4 can be cleaned with water.
  • the cleaning brush 2 is cleaned with the water, the lens 4 is not worn, so that the camera 100 applying the self-cleaning assembly 300 has a long service life and has a good cleaning effect and can be effective.
  • the oil stains, bird droppings, and the like on the lens 4 are removed.
  • the self-cleaning assembly 300 can self-produce the condensed water through the semiconductor refrigerating sheet 3 when needed, and clean the lens 4 with water through the cleaning brush 2, thereby realizing self-cleaning of the lens 4. Moreover, the cleaning effect is good, so that the camera 100 can operate normally for a long time and the daily maintenance cost is low.
  • the semiconductor refrigerating sheet 3 is made by utilizing the Peltier effect of the semiconductor material.
  • the so-called Peltier effect refers to a temperature difference between the two ends (31, 32) of the galvanic couple 33 when a direct current flows through the galvanic couple 33 composed of two kinds of semiconductor materials, one end absorbs heat and the other end radiates heat. The phenomenon.
  • the semiconductor refrigerating sheet 3 can realize high-precision temperature control through current control, and the thermal inertia is very small, and the cooling and heating time is fast. When the current direction is reversed, the cold and hot ends are also interchanged.
  • 31 is a cold end and 32 is a hot end. As shown in FIG.
  • the self-cleaning assembly 300 further includes a controller 301, a power source 302, and a changeover switch 303.
  • the power source 302 is used to supply a DC power source to the semiconductor refrigerating sheet 3.
  • the changeover switch 203 is connected between the power source 302 and the semiconductor refrigerating sheet 3.
  • the controller 301 controls the changeover switch 303 to switch the direction of current flowing through the semiconductor refrigerating sheet 3.
  • the cleaning brush 2 comprises a rotating shaft 21, a bracket 22 and a brush head 23.
  • the bracket 22 is rotatably coupled to the end cover 1 via the rotating shaft 21.
  • the bracket 22 includes oppositely disposed rotating ends and movable ends.
  • the rotating shaft 21 is coupled to the rotating end of the bracket 22 to rotate the movable end about the rotating end.
  • the movable end rotates around the rotating end to form a rotation range 20 of the cleaning brush 2.
  • the brush head 23 is fixed to a side of the bracket 22 facing the end cap 1.
  • the brush head 23 is made of a water absorbing material. Water absorbing materials include, but are not limited to, absorbent cotton, silica gel, sponge, water absorbing resin, water absorbing rubber, and the like.
  • the brush head 23 since the brush head 23 is made of a water absorbing material, the brush head 23 can quickly absorb the condensed water generated by the semiconductor refrigerating sheet 3, thereby carrying the condensed water to clean the lens 4. .
  • the brush head 23 can also adopt a material that is poor in water absorption, but still has certain hydrophilicity, such as plastic, and the condensed water can penetrate into the brush head 23, so that the cleaning is performed.
  • the brush 2 is still capable of carrying the condensed water to clean the lens 4 during rotation.
  • the rotating shaft 21 can be flexibly disposed, for example, can be located above the lens 4 . (as shown in Figure 3), or below the lens 4 (as shown in Figure 13).
  • the self-cleaning assembly 300 further includes a driving member 5 for driving the rotating shaft 21 to drive the bracket 22 to rotate.
  • the drive member 5 can be a motor.
  • the driving member 5 is located on a side of the end cover 1 remote from the cleaning brush 2.
  • the driving member 5 is electrically connected to the controller 301 and the power source 302.
  • the lens 4 is fixed on the end cover 1 by assembly or the lens 4 is a part of the end cover 1.
  • the end cap 1 is provided with a through hole 11
  • the lens 4 is a component independent of the end cap 1
  • the lens 4 is embedded in the
  • the through hole 11 is covered at an opening of one end of the through hole 11 to be fixed to the end cover 1.
  • the lens 4 is embedded in the through hole 11, and the periphery of the lens 4 and the hole wall of the through hole 11 are bonded by an adhesive.
  • the hole wall of the through hole 11 is provided with a limiting surface 111. The lens 4 is received in the through hole 11 , and the lens 4 abuts the limiting surface 111 .
  • the limiting surface 111 and the periphery of the lens 4 are bonded by a double-sided tape or an adhesive.
  • the limiting surface 111 may face the cleaning brush 2 to facilitate fixing the lens 4, or the limiting surface 111 may face away from the cleaning brush 2 to prevent the lens 4 from falling.
  • the lens 4 is part of the end cap 1.
  • the end cap 1 further includes a shielding area 12 surrounding the periphery of the lens 4.
  • the lens 4 is made of a transparent material to allow light to pass through.
  • the shielding area 12 is made of a light shielding material to achieve a shielding effect.
  • the end cap 1 can be integrally formed by a buried molding process or a two-shot molding process.
  • the lens 4 faces the mirror surface 41 of the cleaning brush 2 and the end cover 1 is flush with the outer surface 13 of the cleaning brush 2 .
  • the mirror surface 41 of the lens 4 is flush with the outer surface 13 of the end cap 1, a region where dirt is easily trapped is not formed at the periphery of the mirror surface 41, so that the cleaning brush 2 can The mirror surface 41 of the lens 4 is smoothly cleaned, and the cleaning efficiency is high and the cleaning effect is good.
  • the lens 4 has an acquisition area, and the lens 201 of the camera body 200 collects an image through the collection area.
  • the collection area may cover the entire lens 4 or a partial area of the lens 4.
  • the coverage ratio of the rotation range 20 of the cleaning brush 2 to the lens 4 is based on the collection area.
  • the rotation range 20 of the cleaning brush 2 at least completely covers the collection area to ensure the quality of the image captured by the camera body 200.
  • the mirror surface 41 of the lens 4 is covered with a hydrophobic coating, so that after the lens 4 is stained with dust, the dust can be smoothly drained by water (including but not limited to the condensation generated by the semiconductor refrigeration sheet 3). Water, rain, dew, etc. are carried away so that the mirror surface 41 of the lens 4 is kept relatively clean.
  • the camera 100 further includes a housing 6.
  • the outer casing 6 is connected to the periphery of the end cap 1.
  • the housing 6 and the end cover 1 together define an accommodating space 60.
  • the camera body 200 is received in the accommodating space 60.
  • the lens 201 is disposed in the accommodating space 60 adjacent to the end cap 1 to face the lens 4.
  • the semiconductor refrigerating sheet 3 may be fixed on the end cover 1 or fixed on the cleaning brush 2, or located at the end cover 1 away from the One side of the cleaning brush 2 (for example, fixed to the outer casing 6).
  • the semiconductor refrigerating sheet 3 When the semiconductor refrigerating sheet 3 is fixed to the outer casing 6, it may be received in the accommodating space 60 or outside the accommodating space 60.
  • the semiconductor refrigerating sheet 3 When the semiconductor refrigerating sheet 3 generates the condensed water at any of the above positions, the condensed water may directly or indirectly contact the cleaning brush 2 or flow through the rotating range 20 of the cleaning brush 2 or flow through the lens. 4.
  • the cleaning brush 2 is caused to carry the condensed water to clean the lens 4.
  • the end cover 1 is provided with a receiving groove 14.
  • the semiconductor refrigerating sheet 3 is housed in the receiving groove 14 .
  • the receiving groove 14 is located within the rotation range 20 of the cleaning brush 2 .
  • the cold end 31 of the semiconductor refrigerating sheet 3 is disposed adjacent to the outer surface 13 of the end cap 1, and the hot end 32 of the semiconductor refrigerating sheet 3 is disposed away from the outer surface 13 of the end cap 1.
  • the condensed water is formed in the vicinity of the cold end 31 of the semiconductor refrigerating sheet 3, that is, at a region of the end cap 1 close to the semiconductor refrigerating sheet 3.
  • the condensed water is formed. Since the receiving groove 14 is located within the rotation range 20 of the cleaning brush 2, the condensed water can be formed in the rotation range 20 of the cleaning brush 2, so that when the cleaning brush 2 is rotated, it is carried. The condensed water, the cleaning brush 2 cleans the lens 4 with water.
  • the condensed water is first cooled by the semiconductor refrigerating sheet 3, and after the condensed water flows through the rotation range 20 of the cleaning brush 2, the cleaning brush 2 is started to rotate, thereby making the cleaning
  • the brush 2 carries the condensed water to clean the lens 4 as it rotates.
  • the end cover 1 is provided with a receiving groove 14.
  • the semiconductor refrigerating sheet 3 is housed in the receiving groove 14 .
  • the receiving groove 14 is vertically above the lens 4 such that the condensed water passes through the lens 4 under the force of gravity.
  • the cold end 31 of the semiconductor refrigerating sheet 3 is disposed adjacent to the outer surface 13 of the end cap 1, and the hot end 32 of the semiconductor refrigerating sheet 3 is disposed away from the outer surface 13 of the end cap 1.
  • the condensed water is formed in the vicinity of the cold end 31 of the semiconductor refrigerating sheet 3, that is, at a region of the end cap 1 close to the semiconductor refrigerating sheet 3.
  • the condensed water is formed. Since the receiving groove 14 is located vertically above the lens 4, the condensed water can be formed vertically above the lens 4, so that the condensed water passes through the lens 4 under the force of gravity, When the cleaning brush 2 is rotated through the lens 4, the cleaning brush 2 can carry the condensed water to achieve water cleaning.
  • the condensed water is first cooled by the semiconductor refrigerating sheet 3, and the condensed water passes through the lens 4, and after the mirror surface 41 of the lens 4 is wetted, the cleaning brush 2 is started to rotate, thereby The cleaning brush 2 is caused to carry the condensed water to clean the lens 4 while rotating.
  • the receiving groove 14 can be disposed away from the vertical upper side of the lens 4. In the second embodiment described above, the receiving groove 14 can be disposed away from the rotation range 20 of the cleaning brush 2. In one embodiment, the receiving groove 14 is located both vertically above the lens 4 and within the range of rotation 20 of the cleaning brush 2.
  • the bottom wall of the receiving groove 14 away from the outer surface 13 of the end cover 1 is provided with a communication hole 15 for allowing The power supply line of the semiconductor refrigerating sheet 3 passes.
  • the semiconductor refrigerating sheet 3 housed in the housing groove 14 is electrically connected to the camera body 200 via the power source line.
  • the cold end 31 of the semiconductor refrigerating sheet 3 has a condensation surface 311 away from the hot end 32 of the semiconductor refrigerating sheet 3, the condensation surface 311 and The outer surface 13 of the end cap 1 facing the cleaning brush 2 is flush. Since the condensation surface 311 is flush with the outer surface 13 of the end cap 1, the condensed water generated on the condensation surface 311 can smoothly flow from the condensation surface 311 to the outer surface of the end cap 1. 13 is applied to the mirror surface 41 of the lens 4 such that the mirror surface 41 of the lens 4 has sufficient condensed water to ensure the cleaning efficiency and cleaning effect of the self-cleaning assembly 300.
  • the waterproof wall 16 is filled between the groove wall of the receiving groove 14 and the semiconductor refrigerating sheet 3 to achieve a waterproof seal.
  • the waterproof gel 16 can completely wrap the semiconductor refrigeration sheet 3 to protect the semiconductor refrigeration sheet 3.
  • the thickness of the portion of the waterproof gel 16 covering the cold end 31 of the semiconductor refrigerating sheet 3 is thinner than the thickness of other portions of the waterproof gel 16 to ensure the cooling effect of the cold end 31 of the semiconductor refrigerating sheet 3.
  • the cold end 31 of the semiconductor refrigerating sheet 3 may also not be covered by the waterproof gel 16 to enhance the condensation effect.
  • the semiconductor refrigerating sheet 3 is fixed to the cleaning brush 2.
  • the cold end 31 of the semiconductor refrigerating sheet 3 is disposed away from the cleaning brush 2 with respect to the hot end 32 of the semiconductor refrigerating sheet 3.
  • the condensed water is formed in the vicinity of the cold end 31 of the semiconductor refrigerating sheet 3, that is, at a region of the cleaning brush 2 close to the semiconductor refrigerating sheet 3. The condensed water is formed.
  • the condensed water can be quickly absorbed by the brush head 23, so that the cleaning brush 2 can carry the condensed water to clean the Lens 4.
  • the brush head 23 of the cleaning brush 2 is made of other hydrophilic materials, the condensed water can also penetrate into the brush head 23, so that the cleaning brush 2 can be cleaned with water.
  • the condensed water is first cooled by the semiconductor refrigerating sheet 3, and the condensed water is absorbed by the brush head 23 or penetrates into the brush head 23, and the cleaning brush 2 is activated to rotate.
  • the cleaning brush 2 is caused to carry the condensed water to clean the lens 4 while rotating.
  • the cleaning brush 2 has an initial position when it is not rotated. As shown in Fig. 7, the solid line shows the initial position, and the broken line shows the other position after the rotation.
  • the semiconductor refrigerating sheet 3 is fixed at an upper position of the cleaning brush 2 so that the condensed water is better absorbed by the brush head 23 or infiltrated into the brush head 23 by gravity. As shown in Figs. 7 and 8, the semiconductor refrigerating sheet 3 is disposed on the upper portion of the cleaning brush 2, and the brush head 23 of the cleaning brush 2 is made of a water absorbing material.
  • the semiconductor refrigerating sheet 3 When the lens 4 needs to be cleaned, the semiconductor refrigerating sheet 3 is energized, the semiconductor refrigerating sheet 3 condenses water vapor to generate the condensed water, the condensed water flows into the water absorbing material, and then the cleaning brush 2 is started to rotate and clean.
  • the condensed water generated by the semiconductor refrigerating sheet 3 is first absorbed or penetrated into the brush head 23 by the brush head 23, and then the brush head 23 directly carries the condensed water to clean the lens 4 Therefore, the rotating shaft 21 of the cleaning brush 2 may be located above the lens 4 (as shown in FIG. 7 ), below (as shown in FIG. 13 ) or other orientations, and the initial position of the cleaning brush 2 may also be Located above, below or in other orientations of the lens 4, the range of rotation 20 of the cleaning brush 2 covers the lens 4.
  • the hot end 32 of the semiconductor refrigerating sheet 3 may be fixed to the holder 22 of the cleaning brush 2 by a bonding method or the like.
  • the bracket 22 has a connecting surface away from the brush head 23, and the connecting surface has a flat area with a large area to facilitate attachment of the hot end 32 of the semiconductor refrigerating sheet 3.
  • the initial position of the cleaning brush 2 is located vertically above the lens 4 such that the condensed water passes the lens 4 under the force of gravity.
  • the condensed water is formed in the vicinity of the cold end 31 of the semiconductor refrigerating sheet 3, that is, at a region of the cleaning brush 2 close to the semiconductor refrigerating sheet 3. The condensed water is formed. Since the initial position of the cleaning brush 2 is vertically above the lens 4, the semiconductor refrigerating sheet 3 is cooled when the cleaning brush 2 is in the initial position, so that the condensation can be formed vertically above the lens 4.
  • the cleaning brush 2 can carry the condensed water, thereby achieving water cleaning .
  • the brush head 23 of the cleaning brush 2 is made of a water absorbing material or a hydrophilic material, the condensed water can also be sucked into the brush head 23 or penetrate the brush head 23 at the same time, so that the cleaning brush 2 The effect of cleaning the lens 4 with water is better.
  • the condensed water is first cooled by the semiconductor refrigerating sheet 3, and the condensed water passes through the lens 4. After the mirror surface 41 of the lens 4 is wetted, the cleaning brush 2 is started to rotate, thereby The cleaning brush 2 is caused to carry the condensed water to clean the lens 4 while rotating. It can be understood that since the condensed water generated by the semiconductor refrigerating sheet 3 flows through the lens 4 first, the mirror surface 41 of the lens 4 is wetted, and then the rotating cleaning brush 2 passes through the lens 4. Contacting the condensed water to achieve water cleaning, so the rotating shaft 21 of the cleaning brush 2 is located above the lens 4 so that the initial position of the cleaning brush 2 can be located vertically of the lens 4 Above, the condensed water is condensed above the lens 4.
  • the self-cleaning assembly 300 further includes a water tank 7 and a water pipe 8.
  • the semiconductor refrigeration sheet 3 is housed in the water tank 7 to form the condensed water in the water tank 7.
  • the water tank 7 is located on a side of the end cover 1 away from the cleaning brush 2.
  • the inlet end 81 of the water pipe 8 communicates with the water tank 7, and the outlet end 82 of the water pipe 8 is fixed to the end cover 1.
  • the outlet end 82 of the water tube 8 is located within the range of rotation 20 of the cleaning brush 2.
  • the water pipe 8 can be turned on when the lens 4 needs to be cleaned, so that the condensed water flows out. Since the outlet end 82 of the water pipe 8 is located within the rotation range 20 of the cleaning brush 2, the condensed water can flow to the rotation range 20 of the cleaning brush 2, so that when the cleaning brush 2 is rotated, Carrying the condensed water to achieve clean water.
  • the self-cleaning assembly 300 further includes a water tank 7 and a water pipe 8.
  • the semiconductor refrigeration sheet 3 is housed in the water tank 7 to form the condensed water in the water tank 7.
  • the water tank 7 is located on a side of the end cover 1 away from the cleaning brush 2.
  • the inlet end 81 of the water pipe 8 communicates with the water tank 7.
  • An outlet end 82 of the water tube 8 is secured to the end cap 1 and vertically above the lens 4 such that the condensed water passes through the lens 4 under the force of gravity.
  • the water pipe 8 can be turned on when the lens 4 needs to be cleaned, so that the condensed water flows out. Since the outlet end 82 of the water pipe 8 is vertically above the lens 4, the condensed water passes through the lens 4 under the force of gravity, and the cleaning is performed as the cleaning brush 2 rotates past the lens 4. The brush 2 can carry the condensed water to achieve water cleaning.
  • the outlet end 82 of the water tube 8 may be offset from the vertical upper side of the lens 4.
  • the outlet end 82 of the water pipe 8 can be disposed offset from the rotation range 20 of the cleaning brush 2.
  • the outlet end 82 of the water tube 8 is located both vertically above the lens 4 and within the range of rotation 20 of the cleaning brush 2.
  • the semiconductor refrigerating sheet 3 may be cooled to generate the condensed water when the lens 4 needs to be cleaned, or may be in a refrigerating state for a long time to make the water tank 7 Collect enough condensed water to start cleaning the lens 4 at any time, and the emergency response is fast.
  • the water pipe 8 is turned on to allow the condensed water to flow out, and the cleaning brush 2 is cleaned with water.
  • the water tank 7 can be housed in the accommodating space 60 to improve concealment, so that the camera 100 has a relatively clean and tidy manner. Appearance. At this time, the water tank 7 is fixed to the inner side of the outer casing 6. Of course, in other embodiments, the water tank 7 may also be fixed to the outer side wall of the outer casing 6 to collect a portion of natural water (eg, rain, dew, etc.).
  • a portion of natural water eg, rain, dew, etc.
  • an on-off valve 83 may be provided at the middle or at least one end of the water pipe 8 to control the conduction of the water pipe 8 and Disconnected state.
  • the embodiment of the present application further provides a self-cleaning method.
  • the self-cleaning method cleans the lens 4 using the self-cleaning assembly 300 of any of the above embodiments to enable the camera 100 to achieve long-term operation and better image quality.
  • the self-cleaning assembly 300 includes an end cap 1, a cleaning brush 2, and a semiconductor refrigerating sheet 3.
  • the end cap 1 is provided with a lens 4.
  • the cleaning brush 2 is rotatably coupled to the end cap 1.
  • the self-cleaning method includes:
  • Step 01 The semiconductor refrigerating sheet 3 is cooled to form condensed water.
  • Step 02 Driving the cleaning brush 2 to rotate, so that the cleaning brush 2 carries the condensed water to clean the lens 4.
  • the self-cleaning method is capable of cooling the semiconductor chilled sheet 3 from the production of the condensed water when the lens 4 needs to be cleaned, and then driving the cleaning brush 2 to clean the lens with water.
  • self-cleaning is achieved efficiently, and the cleaning effect with water cleaning is good, and the lens 4 can be prevented from being worn.
  • the triggering condition of the step 01 may be: automatic triggering when there is dirt on the lens 4, or timing triggering, or manual triggering. Specifically, it can be judged whether there is dirt on the lens 4 by image signal processing, and when there is dirt on the lens 4, step 01 is automatically triggered.
  • the timing trigger program can be set to automatically trigger step 01 after a certain period of interval.
  • Step 01 can be temporarily manually triggered in other environments where the lens 4 needs to be cleaned (e.g., fog, etc.).
  • the above three trigger conditions may be selected one, or a combination of a plurality of them may be selected. For example, it is cleaned once a week by default, and combined with image signal processing to determine in real time whether there is any stain on the lens that affects the image quality, and when it exists, the cleaning is triggered immediately.
  • the process of cooling the semiconductor refrigerating sheet 3 to form condensed water includes:
  • Step 011 Calculate the dew point temperature based on the air temperature and the air humidity.
  • the dew point temperature is the temperature at which water vapor in the air is condensed into water.
  • the semiconductor refrigerating sheet 3 is provided with a temperature sensor 304 and a humidity sensor 305 for temperature and humidity detection of air.
  • temperature sensor 304 and humidity sensor 305 can also be disposed on other components of self-cleaning assembly 300 (eg, end cap 1 etc.).
  • the temperature sensor 304 and the humidity sensor 305 are electrically connected to the controller 301.
  • the controller 301 performs an operation based on the data detected by the temperature sensor 304 and the humidity sensor 305.
  • Step 012 The cold end 31 of the semiconductor refrigerating sheet 3 continues for a first time at the first temperature to lower the air temperature to the dew point temperature.
  • the air temperature is lowered to the dew point temperature, water vapor in the air begins to condense to form the condensed water.
  • Step 013 The cold end 31 of the semiconductor refrigerating sheet 3 continues for a second time at a second temperature to form condensed water, and the second temperature is higher than or equal to the first temperature.
  • the cold end 31 of the semiconductor refrigerating sheet 3 is continuously cooled, thereby forming a sufficient amount of the condensed water to ensure the cleaning effect of the self-cleaning method.
  • the second duration is calculated according to the preset water consumption.
  • the preset water consumption amount is related to factors such as the use environment of the camera 100 (for example, air dust density, etc.) and the area of the lens 4.
  • the preset water consumption may be preset in the self-cleaning component 300, for example, preset in the controller 301, or the self-cleaning component 300 further includes a memory for storing the preset water consumption, etc. parameter.
  • the second temperature may be equal to the first temperature to form sufficient condensed water as soon as possible, and the second temperature may also be higher than The first temperature, thereby reducing the energy consumption of the semiconductor refrigerating sheet 3 while continuously forming the condensed water.
  • the first duration and the second duration are not limited, and the first duration and the second duration may be flexibly set according to the temperature and humidity of the air and the requirement of the cleaning water.
  • f is the relative humidity of air, in percent (%)
  • Es is the saturated vapor pressure of air in units of hectopascals (hpa).
  • Es E0 ⁇ 10 [a ⁇ t / (b + t)].
  • the dew point temperature of the current air can be calculated. For example, when the air temperature is 25 ° C and the relative humidity is 50%, the dew point temperature is calculated as follows:
  • the refrigeration coefficient of the semiconductor refrigerating sheet 3 is ⁇ , which represents the cooling energy generated per unit of power consumption, expressed in percentage (%), which is related to the physical properties, resistance, current, etc. of the cooling sheet, when a specific After the cooling chip and the supply voltage, the coefficient is a fixed value.
  • the power consumption of the semiconductor refrigerating sheet 3 is P
  • the temperature before cooling is T1
  • the temperature after cooling is the dew point temperature is Td
  • the cooling time is t.
  • the process of cooling the semiconductor refrigerating sheet 3 to form condensed water ie, step 011 further includes:
  • Step 001 Detect the air temperature.
  • Step 002 When the air temperature is lower than the first threshold, the semiconductor refrigerating sheet 3 continues to heat for a third time period to raise the air temperature to a second threshold, the second threshold being greater than the first threshold .
  • Step 003 Detecting air humidity.
  • step 002 when it is detected that the air temperature is lower than the first threshold, the ambient air temperature is very low, and it is difficult to directly obtain the condensed water through the semiconductor refrigeration sheet 3, so in step 002 First, by heating, the air temperature is raised to the second threshold (for example, 25 degrees Celsius), and at this time, the semiconductor refrigerating sheet 3 can be smoothly condensed to obtain the condensed water.
  • the second threshold for example, 25 degrees Celsius
  • step 003 can be performed simultaneously with step 001 to save detection time.
  • the dew point temperature may be calculated according to the detected air temperature and air humidity. If the semiconductor refrigerating sheet 3 still needs to be heated to raise the temperature of the air to the second threshold, the air humidity needs to be detected again, so that the dew point temperature can obtain an accurate value according to the updated and more accurate data. .

Abstract

Provided in an embodiment of the present application is a self-cleaning assembly applicable to a camera. The self-cleaning assembly comprises an end cover, a cleaning brush and a semiconductor refrigeration sheet, and the end cover is provided with a lens. The cleaning brush is connected with the end cover in a rotating manner, and the semiconductor refrigeration sheet is used to generate condensed water. During the rotation of the cleaning brush, the condensed water is carried to flow through the lens and to clean the lens. The above self-cleaning assembly does not wear the lens and has a good cleaning effect. Also provided in the embodiment of the present application are the camera and a self-cleaning method.

Description

自清洁组件、摄像机及自清洁方法Self-cleaning components, cameras and self-cleaning methods 技术领域Technical field
本申请涉及安防设备技术领域,尤其涉及一种自清洁组件、一种摄像机以及一种自清洁方法。The present application relates to the field of security equipment, and in particular, to a self-cleaning component, a camera, and a self-cleaning method.
背景技术Background technique
目前,随着全球化过程中对安全的需求增加,视频监控行业进入快速发展通道。摄像机在室外长期运行的过程中,经常由于灰尘、雨、雾、油污等导致镜头前方的镜片堆积脏污,进而导致图像效果变差,因此图像质量得不到保障。为实现镜片自清洁,主流摄像机厂家提出在镜片的上方增加雨刮器,使用雨刮器来清除镜片的脏污。然而,雨刮器在干燥环境中与玻璃表面的摩擦力较大,容易刮花镜片,并且雨刮器只能清扫镜片上的灰尘,对于油污、鸟粪等清洁效果较差。At present, with the increasing demand for security in the process of globalization, the video surveillance industry has entered a rapid development channel. During the long-term outdoor operation of the camera, the lens in front of the lens is often dirty due to dust, rain, fog, oil, etc., resulting in poor image quality, so the image quality is not guaranteed. In order to achieve self-cleaning of the lens, mainstream camera manufacturers propose to add a wiper on the top of the lens, and use a wiper to remove the dirt of the lens. However, the wiper has a large friction with the glass surface in a dry environment, and it is easy to scratch the lens, and the wiper can only clean the dust on the lens, and the cleaning effect on oil stains, bird droppings, etc. is poor.
发明内容Summary of the invention
本申请提供一种不会磨损镜片且清洁效果好的自清洁组件、一种摄像机以及一种自清洁方法。The present application provides a self-cleaning assembly that does not wear the lens and has a good cleaning effect, a video camera, and a self-cleaning method.
第一方面,提供了一种自清洁组件。所述自清洁组件应用于摄像机。所述自清洁组件包括端盖、清洁刷及半导体制冷片。所述端盖设有镜片。所述清洁刷转动连接所述端盖。换言之,所述清洁刷安装在所述端盖上,且所述清洁刷能够相对所述端盖转动。所述半导体制冷片用于产生冷凝水。所述半导体制冷片通电制冷时,空气中的水蒸气遇冷产生冷凝水。所述清洁刷转动的过程中,携带所述冷凝水经过所述镜片,以清洁所述镜片。换言之,所述清洁刷的转动范围覆盖所述镜片,使得所述清洁刷能够在转动时经过所述镜片,以清洁所述镜片。In a first aspect, a self-cleaning assembly is provided. The self-cleaning assembly is applied to a camera. The self-cleaning assembly includes an end cap, a cleaning brush, and a semiconductor refrigeration sheet. The end cap is provided with a lens. The cleaning brush is rotatably coupled to the end cap. In other words, the cleaning brush is mounted on the end cap and the cleaning brush is rotatable relative to the end cap. The semiconductor refrigeration sheet is used to produce condensed water. When the semiconductor refrigerating sheet is electrically cooled, the water vapor in the air is cooled to generate condensed water. During the rotation of the cleaning brush, the condensed water is carried through the lens to clean the lens. In other words, the range of rotation of the cleaning brush covers the lens such that the cleaning brush can pass the lens while rotating to clean the lens.
所述自清洁组件通过所述半导体制冷片制冷使空气中水蒸气冷凝形成所述冷凝水,并且通过所述清洁刷携带所述冷凝水经过所述镜片,从而能够实现带水清洁所述镜片。所述清洁刷带水清洁所述镜片时,既不会磨损所述镜片,使得应用所述自清洁组件的摄像机的使用寿命较长,还具有很好的清洁效果,能够有效去除所述镜片上的油污、鸟粪等脏污。简言之,所述自清洁组件能够在需要时,通过所述半导体制冷片自产生所述冷凝水,并通过所述清洁刷带水清洁所述镜片,从而实现镜片自清洁且清洁效果好,使得所述摄像机能够长时间正常运行且日常维护成本低。The self-cleaning assembly refrigerates through the semiconductor refrigerating sheet to condense water vapor in the air to form the condensed water, and carries the condensed water through the lens through the cleaning brush, thereby enabling cleaning of the lens with water. When the cleaning brush removes the lens with water, the lens is not worn, so that the camera applying the self-cleaning component has a long service life and has a good cleaning effect, and can effectively remove the lens. The oil, bird droppings, etc. are dirty. In short, the self-cleaning assembly can self-produce the condensed water through the semiconductor refrigeration sheet when needed, and clean the lens by the cleaning brush, thereby achieving self-cleaning and good cleaning effect. The camera can be operated normally for a long time and the daily maintenance cost is low.
结合第一方面,在第一方面的第一种可能的实现中,所述清洁刷包括转轴、支架以及刷头。所述支架通过所述转轴转动连接所述端盖。所述支架包括相对设置的转动端和活动端。所述转轴连接所述支架的转动端,以使所述活动端绕所述转动端转动。所述刷头固定在所述支架朝向所述端盖的一侧。所述刷头采用吸水材料制成。吸水材料包括但不限于脱脂棉、硅胶、海绵、吸水树脂、吸水橡胶等。In conjunction with the first aspect, in a first possible implementation of the first aspect, the cleaning brush includes a rotating shaft, a bracket, and a brush head. The bracket is rotatably coupled to the end cap by the rotating shaft. The bracket includes oppositely disposed rotating ends and movable ends. The rotating shaft is coupled to the rotating end of the bracket to rotate the movable end about the rotating end. The brush head is secured to a side of the bracket that faces the end cap. The brush head is made of a water absorbing material. Water absorbing materials include, but are not limited to, absorbent cotton, silica gel, sponge, water absorbing resin, water absorbing rubber, and the like.
由于所述刷头采用吸水材料制成,因此所述刷头能够快速吸收所述半导体制冷片所产生的冷凝水,从而携带所述冷凝水清洁所述镜片。当然,在其他可能的实现中,所述刷头也可采用吸水性较差、但仍具有一定亲水性的材料,例如塑料,使得所述清洁刷在转动过程中仍能够携带所述冷凝水清洁所述镜片。Since the brush head is made of a water absorbing material, the brush head can quickly absorb the condensed water generated by the semiconductor refrigerating sheet, thereby carrying the condensed water to clean the lens. Of course, in other possible implementations, the brush head may also adopt a material that is less hygroscopic, but still has a certain hydrophilicity, such as plastic, so that the cleaning brush can still carry the condensed water during the rotation process. Clean the lens.
可选地,所述自清洁组件还包括驱动件,所述驱动件用于驱动所述转轴带动所述支架转 动。所述驱动件可为电机。所述驱动件位于所述端盖的远离所述清洁刷的一侧。Optionally, the self-cleaning assembly further includes a driving member for driving the rotating shaft to drive the bracket to rotate. The drive member can be a motor. The drive member is located on a side of the end cap that is remote from the cleaning brush.
可选地,所述镜片通过组装方式固定在所述端盖上。所述端盖的设有通孔,所述镜片为独立于所述端盖的一个部件,所述镜片嵌入所述通孔或覆盖在所述通孔的一端开口处,以固定至所述端盖。例如,所述镜片嵌入所述通孔,所述镜片的周缘与所述通孔的孔壁之间通过粘接剂粘接。或者,所述通孔的孔壁设有限位面。所述镜片收容于所述通孔,所述镜片抵持所述限位面。所述限位面与所述镜片的周缘之间通过双面胶或粘接剂粘接。所述限位面可朝向所述清洁刷以方便固定所述镜片,或所述限位面可背离所述清洁刷以防止所述镜片掉落。Optionally, the lens is secured to the end cap by assembly. The end cover is provided with a through hole, the lens is a component independent of the end cover, and the lens is embedded in the through hole or covers an opening at one end of the through hole to be fixed to the end cover. For example, the lens is embedded in the through hole, and the periphery of the lens and the hole wall of the through hole are bonded by an adhesive. Alternatively, the hole wall of the through hole is provided with a limiting surface. The lens is received in the through hole, and the lens abuts the limiting surface. The limiting surface is bonded to the periphery of the lens by a double-sided tape or an adhesive. The limiting surface may face the cleaning brush to facilitate fixing the lens, or the limiting surface may face away from the cleaning brush to prevent the lens from falling.
或者,所述镜片为所述端盖的一部分。所述端盖还包括围设在所述镜片周边的遮蔽区。所述镜片采用透明材料,以允许光线透过。所述遮蔽区采用遮光材料以实现遮蔽作用。所述端盖可通过埋入成型工艺或双射成型工艺实现一体成型。Alternatively, the lens is part of the end cap. The end cap also includes a shaded area surrounding the perimeter of the lens. The lens is made of a transparent material to allow light to pass through. The shielding area is made of a light shielding material to achieve a shielding effect. The end cap can be integrally formed by a buried molding process or a two-shot molding process.
结合第一方面或第一方面的第一种可能的实现,在第一方面的第二种可能的实现中,所述镜片朝向所述清洁刷的镜面与所述端盖朝向所述清洁刷的外表面平齐。此时,由于所述镜片的镜面与所述端盖的外表面平齐,因此不会在所述镜片的周缘形成容易藏纳污垢的区域,使得所述清洁刷能够顺利清洁所述镜片的镜面,并且清洁效率高、清洁效果好。In conjunction with the first aspect or the first possible implementation of the first aspect, in a second possible implementation of the first aspect, the lens faces the mirror of the cleaning brush and the end cap faces the cleaning brush The outer surface is flush. At this time, since the mirror surface of the lens is flush with the outer surface of the end cap, an area where dirt is easily collected is not formed on the periphery of the lens, so that the cleaning brush can smoothly clean the mirror surface of the lens. And the cleaning efficiency is high and the cleaning effect is good.
可选的,所述镜片的镜面覆盖有疏水涂层,以使所述镜片沾满灰尘后,灰尘能够顺利被水(包括但不限于所述半导体制冷片所产生的所述冷凝水、雨水、露水等)带走,以使所述镜片的镜面保持较为干净的状态。Optionally, the mirror surface of the lens is covered with a hydrophobic coating, so that after the lens is covered with dust, the dust can be smoothly drained by water (including but not limited to the condensed water, rainwater generated by the semiconductor refrigeration sheet, Dew, etc.) is carried away to keep the mirror surface of the lens relatively clean.
可选的,所述外壳连接所述端盖的周缘。所述外壳与所述端盖共同围设出容置空间。所述摄像机主体收容于所述容置空间。所述镜头在所述容置空间中并邻近所述端盖设置,以正对所述镜片。Optionally, the outer casing is connected to a circumference of the end cover. The outer casing and the end cover together define an accommodating space. The camera body is received in the accommodating space. The lens is disposed in the accommodating space adjacent to the end cap to face the lens.
所述半导体制冷片可固定在所述端盖上,或固定在所述清洁刷上,或位于所述端盖远离所述清洁刷的一侧(例如固定在所述外壳上)。所述半导体制冷片固定在所述外壳上时,可收容在所述容置空间中,也可位于所述容置空间外。所述半导体制冷片在上述任意位置产生所述冷凝水时,所述冷凝水可直接或间接地接触所述清洁刷或流经所述清洁刷的转动范围或流经所述镜片,使得所述清洁刷携带所述冷凝水清洁所述镜片。The semiconductor refrigerating sheet may be fixed to the end cap, or fixed to the cleaning brush, or located on a side of the end cap away from the cleaning brush (for example, fixed to the outer casing). When the semiconductor refrigerating sheet is fixed on the outer casing, it may be accommodated in the accommodating space or may be located outside the accommodating space. When the semiconductor refrigeration sheet generates the condensed water at any of the above positions, the condensed water may directly or indirectly contact the cleaning brush or flow through the rotation range of the cleaning brush or flow through the lens, so that the A cleaning brush carries the condensed water to clean the lens.
具体而言:in particular:
结合第一方面或第一方面的第一种可能的实现或第一方面的第二种可能的实现,在第一方面的第三种可能的实现中,所述端盖设有收容槽。所述半导体制冷片收容于所述收容槽中。所述收容槽位于所述清洁刷的转动范围内。所述半导体制冷片的冷端靠近所述端盖的外表面设置,所述半导体制冷片的热端远离所述端盖的外表面设置。所述半导体制冷片的冷端制冷时,在所述半导体制冷片的冷端附近形成所述冷凝水,也即在所述端盖的靠近所述半导体制冷片的区域处形成所述冷凝水。由于所述收容槽位于所述清洁刷的转动范围内,因此能够在所述清洁刷的转动范围内形成所述冷凝水,从而在所述清洁刷转动经过时,携带上所述冷凝水,所述清洁刷带水清洁所述镜片。所述自清洁组件先通过所述半导体制冷片制冷产生所述冷凝水,所述冷凝水流经所述清洁刷的转动范围后,启动所述清洁刷转动,从而使所述清洁刷在转动时携带所述冷凝水清洁所述镜片。In conjunction with the first aspect or the first possible implementation of the first aspect or the second possible implementation of the first aspect, in a third possible implementation of the first aspect, the end cap is provided with a receiving slot. The semiconductor refrigerating sheet is housed in the receiving groove. The receiving groove is located within a rotation range of the cleaning brush. The cold end of the semiconductor refrigerating sheet is disposed adjacent to an outer surface of the end cap, and a hot end of the semiconductor refrigerating sheet is disposed away from an outer surface of the end cap. In the cold end cooling of the semiconductor refrigerating sheet, the condensed water is formed in the vicinity of the cold end of the semiconductor refrigerating sheet, that is, the condensed water is formed at a region of the end cap close to the semiconductor refrigerating sheet. Since the receiving groove is located within a rotation range of the cleaning brush, the condensed water can be formed in a rotation range of the cleaning brush, so that the condensed water is carried when the cleaning brush rotates. The cleaning brush cleans the lens with water. The self-cleaning component first cools the condensed water by the semiconductor refrigerating sheet, and after the condensed water flows through the rotating range of the cleaning brush, starts the cleaning brush to rotate, so that the cleaning brush carries when rotating The condensed water cleans the lens.
结合第一方面或第一方面的第一种可能的实现或第一方面的第二种可能的实现,在第一方面的第四种可能的实现中,所述端盖设有收容槽。所述半导体制冷片收容于所述收容槽中。所述收容槽位于所述镜片竖直上方,以使所述冷凝水在重力作用下经过所述镜片。所述半导体制冷片的冷端靠近所述端盖的外表面设置,所述半导体制冷片的热端远离所述端盖的外表面设置。所述半导体制冷片的冷端制冷时,在所述半导体制冷片的冷端附近形成所述冷凝水, 也即在所述端盖的靠近所述半导体制冷片的区域处形成所述冷凝水。由于所述收容槽位于所述镜片竖直上方,因此能够在所述镜片竖直上方形成所述冷凝水,从而使所述冷凝水在重力作用下经过所述镜片,在所述清洁刷转动经过所述镜片时,所述清洁刷能够携带上所述冷凝水,从而实现带水清洁。In conjunction with the first aspect or the first possible implementation of the first aspect or the second possible implementation of the first aspect, in a fourth possible implementation of the first aspect, the end cap is provided with a receiving slot. The semiconductor refrigerating sheet is housed in the receiving groove. The receiving groove is located vertically above the lens such that the condensed water passes through the lens under the force of gravity. The cold end of the semiconductor refrigerating sheet is disposed adjacent to an outer surface of the end cap, and a hot end of the semiconductor refrigerating sheet is disposed away from an outer surface of the end cap. The chilled water is formed at a cold end of the semiconductor refrigerating sheet, and the condensed water is formed near a cold end of the semiconductor refrigerating sheet, that is, at a region of the end cap close to the semiconductor refrigerating sheet. Since the receiving groove is located vertically above the lens, the condensed water can be formed vertically above the lens, so that the condensed water passes through the lens under the action of gravity, and the cleaning brush rotates past In the case of the lens, the cleaning brush can carry the condensed water to achieve water cleaning.
所述自清洁组件先通过所述半导体制冷片制冷产生所述冷凝水,所述冷凝水经过所述镜片,所述镜片的镜面湿润后,启动所述清洁刷转动,从而使所述清洁刷在转动时携带所述冷凝水清洁所述镜片。The self-cleaning component first cools the condensed water through the semiconductor refrigeration sheet, and the condensed water passes through the lens, and after the mirror surface of the lens is wetted, the cleaning brush is started to rotate, so that the cleaning brush is The condensed water is carried while rotating to clean the lens.
可选的,所述收容槽远离所述端盖的外表面的底壁上设有连通孔,所述连通孔用于允许所述半导体制冷片的电源线通过。收容在所述收容槽内的所述半导体制冷片通过所述电源线电连接所述摄像机主体。Optionally, the receiving slot is provided with a communication hole away from the bottom wall of the outer surface of the end cover, and the communication hole is configured to allow the power cable of the semiconductor refrigeration chip to pass. The semiconductor refrigerating sheet housed in the receiving groove is electrically connected to the camera body through the power source line.
可选的,所述收容槽的槽壁与所述半导体制冷片之间填充防水凝胶,以实现防水密封。其中,防水凝胶可完全包裹所述半导体制冷片,以对所述半导体制冷片起到保护作用。当然,防水凝胶覆盖所述半导体制冷片的冷端的部分的厚度比防水凝胶的其他部分的厚度薄,以保证所述半导体制冷片的冷端的制冷效果。Optionally, a waterproof gel is filled between the groove wall of the receiving groove and the semiconductor refrigeration sheet to achieve a waterproof seal. Wherein, the waterproof gel can completely wrap the semiconductor refrigeration sheet to protect the semiconductor refrigeration sheet. Of course, the thickness of the portion of the waterproof gel covering the cold end of the semiconductor refrigerating sheet is thinner than the thickness of other portions of the waterproof gel to ensure the cooling effect of the cold end of the semiconductor refrigerating sheet.
结合第一方面的第三种可能的实现或第一方面的第四种可能的实现,在第一方面的第五种可能的实现中,所述半导体制冷片的冷端具有远离所述半导体制冷片的热端的冷凝面,所述冷凝面与所述端盖的朝向所述清洁刷的外表面平齐。由于所述冷凝面与所述端盖的外表面平齐,因此在所述冷凝面上所产生的冷凝水能够顺利自所述冷凝面流到所述端盖的外表面上和所述镜片的镜面上,从而使所述镜片的镜面上具有足够的冷凝水,以保证所述自清洁组件的清洁效率和清洁效果。In conjunction with the third possible implementation of the first aspect or the fourth possible implementation of the first aspect, in a fifth possible implementation of the first aspect, the cold end of the semiconductor refrigerating sheet has a distance away from the semiconductor refrigeration a condensing surface of the hot end of the sheet, the condensing surface being flush with the outer surface of the end cap facing the cleaning brush. Since the condensation surface is flush with the outer surface of the end cap, condensed water generated on the condensation surface can smoothly flow from the condensation surface to the outer surface of the end cap and the lens The mirror surface is such that there is sufficient condensed water on the mirror surface of the lens to ensure the cleaning efficiency and cleaning effect of the self-cleaning assembly.
结合第一方面或第一方面的第一种可能的实现或第一方面的第二种可能的实现,在第一方面的第六种可能的实现中,所述半导体制冷片固定在所述清洁刷上。所述半导体制冷片的冷端相对所述半导体制冷片的热端远离所述清洁刷设置。所述半导体制冷片的冷端制冷时,在所述半导体制冷片的冷端附近形成所述冷凝水,也即在所述清洁刷的靠近所述半导体制冷片的区域处形成所述冷凝水。此时,当所述清洁刷的所述刷头采用吸水材料时,所述冷凝水能够快速被所述刷头吸收,从而使得所述清洁刷能够携带所述冷凝水清洁所述镜片。当所述清洁刷的所述刷头采用其他亲水性材料时,所述冷凝水也能够渗入所述刷头,使所述清洁刷实现带水清洁。In conjunction with the first aspect or the first possible implementation of the first aspect or the second possible implementation of the first aspect, in a sixth possible implementation of the first aspect, the semiconductor refrigerating sheet is fixed to the cleaning Brush it up. The cold end of the semiconductor refrigerating sheet is disposed away from the cleaning brush with respect to the hot end of the semiconductor refrigerating sheet. In the cold end cooling of the semiconductor refrigerating sheet, the condensed water is formed in the vicinity of the cold end of the semiconductor refrigerating sheet, that is, the condensed water is formed at a region of the cleaning brush close to the semiconductor refrigerating sheet. At this time, when the brush head of the cleaning brush is made of a water absorbing material, the condensed water can be quickly absorbed by the brush head, so that the cleaning brush can carry the condensed water to clean the lens. When the brush head of the cleaning brush uses other hydrophilic materials, the condensed water can also penetrate into the brush head to enable the cleaning brush to be cleaned with water.
所述自清洁组件先通过所述半导体制冷片制冷产生所述冷凝水,所述冷凝水被所述刷头吸收或渗入所述刷头后,启动所述清洁刷转动,从而使所述清洁刷在转动时携带所述冷凝水清洁所述镜片,清洁效果更佳。The self-cleaning component first cools the condensed water by the semiconductor refrigeration sheet, and after the condensed water is absorbed or penetrates into the brush head by the brush head, the cleaning brush is started to rotate, thereby making the cleaning brush The lens is cleaned by carrying the condensed water while rotating, and the cleaning effect is better.
可以理解的是,所述清洁刷不转动时具有初始位置。所述半导体制冷片固定在所述清洁刷的靠上的位置处,以使所述冷凝水在重力作用下更好地被所述刷头吸收或渗入所述刷头。在所述清洁刷的上部设置所述半导体制冷片,所述清洁刷的刷头采用吸水材料。当需要清洁所述镜片时,给所述半导体制冷片通电,所述半导体制冷片冷凝水汽产生所述冷凝水,所述冷凝水流到吸水材料内,而后启动所述清洁刷转动清洁所述镜片。It can be understood that the cleaning brush has an initial position when it is not rotated. The semiconductor refrigerating sheet is fixed at an upper position of the cleaning brush so that the condensed water is better absorbed by the brush head or infiltrated into the brush head by gravity. The semiconductor refrigerating sheet is disposed on an upper portion of the cleaning brush, and the brush head of the cleaning brush is made of a water absorbing material. When the lens needs to be cleaned, the semiconductor refrigerating sheet is energized, the semiconductor refrigerating sheet condenses water vapor to generate the condensed water, the condensed water flows into the water absorbing material, and then the cleaning brush is activated to rotate the cleaning lens.
其中,所述半导体制冷片的热端可通过粘接方式等固定在所述清洁刷的所述支架上。所述支架具有远离所述刷头的连接面,所述连接面具有面积较大的平整区域,以方便所述半导体制冷片的热端贴附。The hot end of the semiconductor refrigerating sheet may be fixed to the holder of the cleaning brush by bonding or the like. The bracket has a connecting surface away from the brush head, and the connecting surface has a flat area with a large area to facilitate attachment of the hot end of the semiconductor cooling sheet.
结合第一方面的第六种可能的实现,在第一方面的第七种可能的实现中,所述清洁刷的初始位置位于所述镜片竖直上方,以使所述冷凝水在重力作用下经过所述镜片。所述半导体 制冷片的冷端制冷时,在所述半导体制冷片的冷端附近形成所述冷凝水,也即在所述清洁刷的靠近所述半导体制冷片的区域处形成所述冷凝水。由于所述清洁刷的初始位置位于所述镜片竖直上方,所述半导体制冷片在所述清洁刷处于初始位置时制冷,因此能够在所述镜片竖直上方形成所述冷凝水,从而使所述冷凝水在重力作用下经过所述镜片,在所述清洁刷转动经过所述镜片时,所述清洁刷能够携带上所述冷凝水,从而实现带水清洁。并且,当所述清洁刷的所述刷头采用吸水材料或亲水材料时,所述冷凝水还能够同时被吸入所述刷头或渗入所述刷头,使得所述清洁刷带水清洁所述镜片的效果更佳。In conjunction with the sixth possible implementation of the first aspect, in a seventh possible implementation of the first aspect, the initial position of the cleaning brush is located vertically above the lens such that the condensed water is under gravity Pass the lens. The chilled water is formed in the vicinity of the cold end of the semiconductor refrigerating sheet at the cold end of the semiconductor refrigerating sheet, that is, the condensed water is formed at a region of the cleaning brush adjacent to the semiconductor refrigerating sheet. Since the initial position of the cleaning brush is vertically above the lens, the semiconductor refrigerating sheet is cooled when the cleaning brush is in an initial position, so that the condensed water can be formed vertically above the lens, thereby The condensed water passes through the lens under the action of gravity, and the cleaning brush can carry the condensed water when the cleaning brush rotates through the lens, thereby achieving water cleaning. Moreover, when the brush head of the cleaning brush is made of a water absorbing material or a hydrophilic material, the condensed water can also be sucked into the brush head or penetrate into the brush head at the same time, so that the cleaning brush is cleaned with water. The effect of the lens is better.
所述自清洁组件先通过所述半导体制冷片制冷产生所述冷凝水,所述冷凝水经过所述镜片,所述镜片的镜面湿润后,启动所述清洁刷转动,从而使所述清洁刷在转动时携带所述冷凝水清洁所述镜片,这样清洁效果更佳。The self-cleaning component first cools the condensed water through the semiconductor refrigeration sheet, and the condensed water passes through the lens, and after the mirror surface of the lens is wetted, the cleaning brush is started to rotate, so that the cleaning brush is The condensed water is carried while rotating to clean the lens, so that the cleaning effect is better.
结合第一方面或第一方面的第一种可能的实现或第一方面的第二种可能的实现,在第一方面的第八种可能的实现中,所述自清洁组件还包括水箱和水管。所述半导体制冷片收容于所述水箱,以在所述水箱内形成所述冷凝水。所述水箱位于所述端盖远离所述清洁刷的一侧。所述水管的入口端连通所述水箱,所述水管的出口端固定在所述端盖上。所述水管的出口端位于所述清洁刷的转动范围内。所述半导体制冷片的冷端制冷时,在所述水箱内形成所述冷凝水。所述水箱收集足够所述冷凝水后,能够在需要清洗所述镜片时,导通所述水管,使所述冷凝水流出。由于所述水管的出口端位于所述清洁刷的转动范围内,因此所述冷凝水能够流动到所述清洁刷的转动范围,从而在所述清洁刷转动经过时,携带上所述冷凝水,实现带水清洁。In combination with the first aspect or the first possible implementation of the first aspect or the second possible implementation of the first aspect, in an eighth possible implementation of the first aspect, the self-cleaning assembly further includes a water tank and a water pipe . The semiconductor cooling sheet is housed in the water tank to form the condensed water in the water tank. The water tank is located on a side of the end cap away from the cleaning brush. An inlet end of the water pipe communicates with the water tank, and an outlet end of the water pipe is fixed to the end cover. The outlet end of the water pipe is located within the range of rotation of the cleaning brush. The condensed water is formed in the water tank during cooling of the cold junction of the semiconductor refrigerating sheet. After the water tank collects enough of the condensed water, the water pipe can be turned on when the lens needs to be cleaned, so that the condensed water flows out. Since the outlet end of the water pipe is located within a rotation range of the cleaning brush, the condensed water can flow to a rotation range of the cleaning brush, thereby carrying the condensed water when the cleaning brush rotates, Achieve clean water.
结合第一方面或第一方面的第一种可能的实现或第一方面的第二种可能的实现,在第一方面的第九种可能的实现中,所述自清洁组件还包括水箱和水管。所述半导体制冷片收容于所述水箱,以在所述水箱内形成所述冷凝水。所述水箱位于所述端盖远离所述清洁刷的一侧。所述水管的入口端连通所述水箱。所述水管的出口端固定在所述端盖上且位于所述镜片竖直上方,以使所述冷凝水在重力作用下经过所述镜片。所述半导体制冷片的冷端制冷时,在所述水箱内形成所述冷凝水。所述水箱收集足够所述冷凝水后,能够在需要清洗所述镜片时,导通所述水管,使所述冷凝水流出。由于所述水管的出口端位于所述镜片竖直上方,因此所述冷凝水在重力作用下经过所述镜片,在所述清洁刷转动经过所述镜片时,所述清洁刷能够携带上所述冷凝水,从而实现带水清洁。In combination with the first aspect or the first possible implementation of the first aspect or the second possible implementation of the first aspect, in a ninth possible implementation of the first aspect, the self-cleaning assembly further includes a water tank and a water pipe . The semiconductor cooling sheet is housed in the water tank to form the condensed water in the water tank. The water tank is located on a side of the end cap away from the cleaning brush. The inlet end of the water pipe communicates with the water tank. An outlet end of the water tube is secured to the end cap and vertically above the lens such that the condensed water passes the lens under the force of gravity. The condensed water is formed in the water tank during cooling of the cold junction of the semiconductor refrigerating sheet. After the water tank collects enough of the condensed water, the water pipe can be turned on when the lens needs to be cleaned, so that the condensed water flows out. Since the outlet end of the water pipe is vertically above the lens, the condensed water passes through the lens under the force of gravity, and the cleaning brush can carry the cleaning brush as the cleaning brush rotates through the lens Condensate water for clean water.
可选的,所述半导体制冷片可以在需要清洁所述镜片时制冷产生所述冷凝水,也可以长期处于制冷状态,以使所述水箱收集有足够所述冷凝水,以备随时开始清洗所述镜片,应急反应快。当所述镜片需要清洁时,导通所述水管,使所述冷凝水流出,所述清洁刷实现带水清洁。Optionally, the semiconductor refrigerating sheet may refrigerate to generate the condensed water when the lens needs to be cleaned, or may be in a refrigerating state for a long time, so that the water tank collects enough condensed water to start cleaning at any time. The lens, the emergency response is fast. When the lens needs to be cleaned, the water pipe is turned on to allow the condensed water to flow out, and the cleaning brush achieves water cleaning.
可选的,所述水箱可收容在所述容置空间内,以提高隐蔽性,使得所述摄像机具有较为整洁的外观。当然,在其他可能的实现中,所述水箱也可固定在所述外壳的外侧壁上,以收集部分自然水(例如雨水、露水等)。Optionally, the water tank can be received in the accommodating space to improve concealment, so that the camera has a relatively clean appearance. Of course, in other possible implementations, the water tank may also be secured to the outer sidewall of the outer casing to collect a portion of the natural water (eg, rain, dew, etc.).
可选的,可在所述水管中部或至少一个端部处设置开关阀,以控制所述水管的导通和断开状态。Alternatively, an on-off valve may be provided at the middle or at least one end of the water pipe to control the on and off states of the water pipe.
第二方面,提供了一种摄像机。所述摄像机包括摄像机主体和第一方面任意一种可能的实现中的自清洁组件。所述摄像机主体位于所述端盖远离所述清洁刷的一侧。所述摄像机主体的镜头正对所述镜片设置。所述镜片采用透光材料,使得外界光线得以穿透所述镜片进入所述镜头。由于所述自清洁组件能够实现自清洁且清洁效果好,因此所述摄像机能够长时间 正常运行且日常维护成本低。In a second aspect, a camera is provided. The camera includes a camera body and a self-cleaning assembly in any one of the possible implementations of the first aspect. The camera body is located on a side of the end cap away from the cleaning brush. The lens of the camera body is disposed opposite the lens. The lens is made of a light transmissive material such that external light can penetrate the lens into the lens. Since the self-cleaning assembly can achieve self-cleaning and good cleaning effect, the camera can operate normally for a long time and the daily maintenance cost is low.
第三方面,提供一种自清洁方法。所述自清洁方法使用第一方面任意一种可能的实现中的自清洁组件清洁镜片,以使摄像机能够实现长时间运行且图像质量较佳。所述自清洁组件包括端盖、清洁刷及半导体制冷片。所述端盖设有镜片。所述清洁刷转动连接所述端盖。In a third aspect, a self-cleaning method is provided. The self-cleaning method cleans the lens using a self-cleaning assembly in any of the possible implementations of the first aspect to enable the camera to achieve long-term operation and better image quality. The self-cleaning assembly includes an end cap, a cleaning brush, and a semiconductor refrigeration sheet. The end cap is provided with a lens. The cleaning brush is rotatably coupled to the end cap.
所述自清洁方法包括:The self-cleaning method includes:
所述半导体制冷片制冷形成冷凝水。The semiconductor refrigeration sheet is cooled to form condensed water.
驱动所述清洁刷转动,使所述清洁刷携带所述冷凝水清洁所述镜片。The cleaning brush is driven to rotate such that the cleaning brush carries the condensed water to clean the lens.
所述自清洁方法能够在所述镜片需要清洁时,通过所述半导体制冷片制冷自生产所述冷凝水,然后驱动所述清洁刷带水清洁所述镜片,从而高效率地实现自清洁,并且带水清洁的清洁效果佳、能够避免磨损所述镜片。The self-cleaning method is capable of efficiently purifying the lens by cooling the semiconductor chilled water by the semiconductor refrigerating sheet and then driving the cleaning brush to clean the lens when the lens needs to be cleaned, and Cleaning with water is effective and avoids wearing the lens.
其中,所述半导体制冷片制冷形成冷凝水的触发条件可为:所述镜片上存在脏污时自动触发,或定时触发,或人工触发。具体而言,可通过图像信号处理判断所述镜片上是否存在脏污,当所述镜片上存在脏污时,则自动触发所述半导体制冷片制冷形成冷凝水。可设定定时触发程序,实现间隔一定周期后,自动触发所述半导体制冷片制冷形成冷凝水。可在其他需要清洁所述镜片的环境(例如大雾等)中,临时手动触发所述半导体制冷片制冷形成冷凝水。上述三种触发方式可选择其一,也可选择其中多种的组合。The triggering condition for the cooling of the semiconductor refrigerating sheet to form condensed water may be: automatic triggering when there is dirt on the lens, or timing triggering, or manual triggering. Specifically, it is determined whether there is dirt on the lens by image signal processing, and when there is dirt on the lens, the semiconductor refrigeration sheet is automatically triggered to form condensed water. The timing triggering program can be set to automatically trigger the cooling of the semiconductor refrigerating sheet to form condensed water after a certain period of time. The semiconductor refrigerating sheet may be temporarily manually triggered to form condensed water in other environments (e.g., heavy fog, etc.) where cleaning of the lens is required. The above three triggering modes may be selected one, or a combination of a plurality of them may be selected.
结合第三方面,在第三方面的第一种可能的实现中,所述半导体制冷片制冷形成冷凝水的过程包括:In conjunction with the third aspect, in a first possible implementation of the third aspect, the process of cooling the semiconductor refrigerating sheet to form condensed water comprises:
依据空气温度和空气湿度计算露点温度。露点温度为将空气中的水蒸气冷凝成水的温度。所述半导体制冷片上带有温度传感器和湿度传感器,用于空气的温湿度检测。当然,温度传感器和湿度传感器也可设置在所述自清洁组件的其他部件上(例如端盖等)。The dew point temperature is calculated based on air temperature and air humidity. The dew point temperature is the temperature at which water vapor in the air is condensed into water. The semiconductor refrigeration chip is provided with a temperature sensor and a humidity sensor for detecting the temperature and humidity of the air. Of course, temperature sensors and humidity sensors can also be provided on other components of the self-cleaning assembly (eg, end caps, etc.).
所述半导体制冷片的冷端在第一温度持续第一时长,以使空气温度降低至所述露点温度。当空气温度降低至所述露点温度时,空气中的水蒸气开始冷凝形成所述冷凝水。The cold end of the semiconductor refrigeration sheet is at a first temperature for a first length of time to reduce the air temperature to the dew point temperature. When the air temperature is lowered to the dew point temperature, water vapor in the air begins to condense to form the condensed water.
所述半导体制冷片的冷端在第二温度持续第二时长,以形成冷凝水,所述第二温度高于或等于所述第一温度。所述半导体制冷片的冷端持续制冷,从而形成较为充足的所述冷凝水,以保证所述自清洁方法的清洁效果。The cold end of the semiconductor refrigerating sheet continues for a second time at a second temperature to form condensed water, the second temperature being higher than or equal to the first temperature. The cold end of the semiconductor refrigeration sheet continues to be cooled, thereby forming a sufficient amount of the condensed water to ensure the cleaning effect of the self-cleaning method.
由于空气温度已经降低至所述露点温度,因此所述第二温度可等于所述第一温度,以尽快形成充足的所述冷凝水,所述第二温度也可高于所述第一温度,从而在持续形成所述冷凝水的时候,降低所述半导体制冷片的能耗。本申请中不对所述第一时长的时间长度和所述第二时长的时间长度进行限定,所述第一时长和所述第二时长可依据空气的温湿度和清洁用水的需求,进行灵活设定。Since the air temperature has decreased to the dew point temperature, the second temperature may be equal to the first temperature to form sufficient condensed water as soon as possible, and the second temperature may also be higher than the first temperature, Thereby, the energy consumption of the semiconductor refrigerating sheet is lowered while the condensed water is continuously formed. In the present application, the length of time of the first duration and the length of time of the second duration are not limited, and the first duration and the second duration may be flexibly set according to the temperature and humidity of the air and the demand for cleaning water. set.
结合第三方面的第一种可能的实现,在第三方面的第二种可能的实现中,在计算所述露点温度之前,所述半导体制冷片制冷形成冷凝水的过程还包括:In conjunction with the first possible implementation of the third aspect, in a second possible implementation of the third aspect, the process of cooling the semiconductor refrigerating sheet to form condensed water before calculating the dew point temperature further comprises:
检测空气温度。Detect the air temperature.
当所述空气温度低于第一阈值时,所述半导体制冷片持续制热第三时长,以使空气温度升高至第二阈值,所述第二阈值大于所述第一阈值。When the air temperature is lower than the first threshold, the semiconductor cooling sheet continues to heat for a third time period to raise the air temperature to a second threshold, the second threshold being greater than the first threshold.
检测空气湿度。Check the air humidity.
当在检测到空气温度低于所述第一阈值时,周围空气温度很低,直接通过所述半导体制冷片制冷获取所述冷凝水的难度较大,因此先通过制热,使得空气温度升高到所述第二阈值,此时所述半导体制冷片即可较为顺利地进行冷凝获取所述冷凝水。When it is detected that the air temperature is lower than the first threshold, the ambient air temperature is very low, and it is difficult to obtain the condensed water directly by the semiconductor refrigeration sheet, so that the air temperature is raised first by heating. Up to the second threshold, the semiconductor refrigeration sheet can be smoothly condensed to obtain the condensed water.
可以理解的是,检测空气湿度的步骤可与检测空气温度的步骤同时进行,以节约检测时 间。当所述空气温度大于等于所述第一阈值时,即可依据检测到空气温度和空气湿度计算所述露点温度。如所述半导体制冷片还需进行制热,使空气温度升高到所述第二阈值,则需要再次检测空气湿度,以使所述露点温度能够依据当前的数据获得准确数值。It will be appreciated that the step of detecting the humidity of the air may be performed simultaneously with the step of detecting the temperature of the air to save detection time. When the air temperature is greater than or equal to the first threshold, the dew point temperature may be calculated according to the detected air temperature and air humidity. If the semiconductor refrigerating sheet still needs to be heated to raise the air temperature to the second threshold, the air humidity needs to be detected again so that the dew point temperature can obtain an accurate value according to the current data.
附图说明DRAWINGS
为了更清楚地说明本申请实施例或背景技术中的技术方案,下面将对本申请实施例或背景技术中所需要使用的附图进行说明。In order to more clearly illustrate the technical solutions in the embodiments of the present application or the background art, the drawings to be used in the embodiments of the present application or the background art will be described below.
图1是本申请实施例提供的一种摄像机的结构示意图;1 is a schematic structural diagram of a camera provided by an embodiment of the present application;
图2是图1所示摄像机的另一结构示意图;Figure 2 is another schematic structural view of the camera shown in Figure 1;
图3是图1所示摄像机的自清洁组件的一种实施方式的结构示意图;3 is a schematic structural view of an embodiment of a self-cleaning assembly of the camera shown in FIG. 1;
图4是图1所示摄像机的自清洁组件的部分结构示意图;4 is a partial structural schematic view of the self-cleaning assembly of the camera shown in FIG. 1;
图5是图2中A处结构的一种实施方式的结构示意图;Figure 5 is a schematic structural view of an embodiment of the structure at A in Figure 2;
图6是图2中A处结构的一种实施方式的结构示意图;Figure 6 is a schematic structural view of an embodiment of the structure at A in Figure 2;
图7是图1所示摄像机的自清洁组件的另一种实施方式的结构示意图;7 is a schematic structural view of another embodiment of the self-cleaning assembly of the camera shown in FIG. 1;
图8是图7所示自清洁组件的另一结构示意图;Figure 8 is another schematic structural view of the self-cleaning assembly shown in Figure 7;
图9是图1所示摄像机的自清洁组件的再一种实施方式的结构示意图;9 is a schematic structural view of still another embodiment of the self-cleaning assembly of the camera shown in FIG. 1;
图10是图9所示自清洁组件的另一结构示意图;Figure 10 is another schematic structural view of the self-cleaning assembly shown in Figure 9;
图11是本申请实施例提供的一种自清洁方法的流程图;11 is a flow chart of a self-cleaning method provided by an embodiment of the present application;
图12是图11所示自清洁方法的步骤01的细化流程图;Figure 12 is a detailed flow chart of step 01 of the self-cleaning method shown in Figure 11;
图13是图1所示摄像机的自清洁组件的再一种实施方式的结构示意图。FIG. 13 is a schematic structural view of still another embodiment of the self-cleaning assembly of the camera shown in FIG. 1. FIG.
具体实施方式Detailed ways
下面结合本申请实施例中的附图对本申请实施例进行描述。The embodiments of the present application are described below in conjunction with the accompanying drawings in the embodiments of the present application.
请结合参阅图1至图3,本申请实施例提供一种摄像机100。所述摄像机100可为网络摄像机(IP Camera,IPC)。所述摄像机100包括摄像机主体200和自清洁组件300。所述摄像机主体200用于实现图像捕捉。所述摄像机主体200还用于将数据(包括但不限于图像数据、声音数据等)经压缩加密后,通过局域网、因特网(Internet)或无线网络送至终端用户。所述摄像机主体200主要包括镜头201、图像传感器、声音传感器、模数转换器、图像编码器、处理器、存储器等部分。Referring to FIG. 1 to FIG. 3 , an embodiment of the present application provides a camera 100 . The camera 100 can be a network camera (IP Camera). The camera 100 includes a camera body 200 and a self-cleaning assembly 300. The camera body 200 is used to implement image capture. The camera body 200 is further configured to compress and encrypt data (including but not limited to image data, sound data, etc.) and send it to an end user via a local area network, the Internet, or a wireless network. The camera body 200 mainly includes a lens 201, an image sensor, a sound sensor, an analog-to-digital converter, an image encoder, a processor, a memory, and the like.
请结合参阅图1至图3,本申请实施例提供一种自清洁组件300。所述自清洁组件300应用于所述摄像机100。所述自清洁组件300包括端盖1、清洁刷2及半导体制冷片3。所述端盖1设有镜片4。所述清洁刷2转动连接所述端盖1。换言之,所述清洁刷2安装在所述端盖1上,且所述清洁刷2能够相对所述端盖1转动。所述半导体制冷片3用于产生冷凝水。所述半导体制冷片3通电制冷时,空气中的水蒸气遇冷产生冷凝水。所述清洁刷2转动的过程中,携带所述冷凝水经过所述镜片4,以清洁所述镜片4。换言之,所述清洁刷2的转动范围20覆盖所述镜片4,使得所述清洁刷2能够在转动时经过所述镜片4,以清洁所述镜片4。Referring to FIG. 1 to FIG. 3 , an embodiment of the present application provides a self-cleaning assembly 300 . The self-cleaning assembly 300 is applied to the camera 100. The self-cleaning assembly 300 includes an end cap 1, a cleaning brush 2, and a semiconductor refrigerating sheet 3. The end cap 1 is provided with a lens 4. The cleaning brush 2 is rotatably coupled to the end cap 1. In other words, the cleaning brush 2 is mounted on the end cap 1 and the cleaning brush 2 is rotatable relative to the end cap 1. The semiconductor refrigerating sheet 3 is used to generate condensed water. When the semiconductor refrigerating sheet 3 is electrically cooled, water vapor in the air is cooled to generate condensed water. During the rotation of the cleaning brush 2, the condensed water is carried through the lens 4 to clean the lens 4. In other words, the range of rotation 20 of the cleaning brush 2 covers the lens 4 such that the cleaning brush 2 can pass the lens 4 while rotating to clean the lens 4.
所述摄像机主体200位于所述端盖1远离所述清洁刷2的一侧。所述摄像机主体200的镜头201正对所述镜片4设置。所述镜片4采用透光材料制成,使得外界光线得以穿透所述镜片4进入所述镜头201。其中,所述镜片4既能够避免外界光线在经过所述镜片4时传播方向发生明显变化而导致图像失真,还能够对所述镜头201起到保护作用。The camera body 200 is located on a side of the end cover 1 away from the cleaning brush 2. The lens 201 of the camera body 200 is disposed opposite the lens 4. The lens 4 is made of a light transmissive material such that external light can penetrate the lens 4 into the lens 201. The lens 4 can prevent the external light from being significantly changed in the direction of propagation when passing through the lens 4, thereby causing image distortion, and can also protect the lens 201.
在本实施例中,所述自清洁组件300通过所述半导体制冷片3制冷使空气中水蒸气冷凝 形成所述冷凝水,并且通过所述清洁刷2携带所述冷凝水经过所述镜片4,从而能够实现带水清洁所述镜片4。所述清洁刷2带水清洁所述镜片4时,既不会磨损所述镜片4,使得应用所述自清洁组件300的摄像机100的使用寿命较长,还具有很好的清洁效果,能够有效去除所述镜片4上的油污、鸟粪等脏污。简言之,所述自清洁组件300能够在需要时,通过所述半导体制冷片3自产生所述冷凝水,并通过所述清洁刷2带水清洁所述镜片4,从而实现镜片4自清洁且清洁效果好,使得所述摄像机100能够长时间正常运行且日常维护成本低。In the present embodiment, the self-cleaning assembly 300 is cooled by the semiconductor refrigerating sheet 3 to condense water vapor in the air to form the condensed water, and the condensed water is carried by the cleaning brush 2 through the lens 4, Thereby, the lens 4 can be cleaned with water. When the cleaning brush 2 is cleaned with the water, the lens 4 is not worn, so that the camera 100 applying the self-cleaning assembly 300 has a long service life and has a good cleaning effect and can be effective. The oil stains, bird droppings, and the like on the lens 4 are removed. In short, the self-cleaning assembly 300 can self-produce the condensed water through the semiconductor refrigerating sheet 3 when needed, and clean the lens 4 with water through the cleaning brush 2, thereby realizing self-cleaning of the lens 4. Moreover, the cleaning effect is good, so that the camera 100 can operate normally for a long time and the daily maintenance cost is low.
可以理解的,请结合参阅图4,所述半导体制冷片3是利用半导体材料的珀尔帖效应制成的。所谓珀尔帖效应,是指当直流电流通过两种半导体材料组成的电偶33时,所述电偶33的两端(31、32)之间产生温差,其一端吸热,另一端放热的现象。半导体制冷片3通过电流控制,可实现高精度的温度控制,且热惯性非常小,致冷致热时间很快。当电流方向反向后,冷端和热端也会互换。本申请以31为冷端、32为热端为例进行说明。如图4所示,所述自清洁组件300还包括控制器301、电源302以及切换开关303。所述电源302用于为所述半导体制冷片3提供直流电源。所述切换开关203连接在电源302与所述半导体制冷片3之间。所述控制器301控制所述切换开关303切换流经所述半导体制冷片3的电流的方向。It can be understood that, referring to FIG. 4 together, the semiconductor refrigerating sheet 3 is made by utilizing the Peltier effect of the semiconductor material. The so-called Peltier effect refers to a temperature difference between the two ends (31, 32) of the galvanic couple 33 when a direct current flows through the galvanic couple 33 composed of two kinds of semiconductor materials, one end absorbs heat and the other end radiates heat. The phenomenon. The semiconductor refrigerating sheet 3 can realize high-precision temperature control through current control, and the thermal inertia is very small, and the cooling and heating time is fast. When the current direction is reversed, the cold and hot ends are also interchanged. In the present application, 31 is a cold end and 32 is a hot end. As shown in FIG. 4, the self-cleaning assembly 300 further includes a controller 301, a power source 302, and a changeover switch 303. The power source 302 is used to supply a DC power source to the semiconductor refrigerating sheet 3. The changeover switch 203 is connected between the power source 302 and the semiconductor refrigerating sheet 3. The controller 301 controls the changeover switch 303 to switch the direction of current flowing through the semiconductor refrigerating sheet 3.
可选的,请结合参阅图2、图3以及图5,所述清洁刷2包括转轴21、支架22以及刷头23。所述支架22通过所述转轴21转动连接所述端盖1。所述支架22包括相对设置的转动端和活动端。所述转轴21连接所述支架22的转动端,以使所述活动端绕所述转动端转动。所述活动端绕所述转动端转动,形成所述清洁刷2的转动范围20。所述刷头23固定在所述支架22朝向所述端盖1的一侧。所述刷头23采用吸水材料制成。吸水材料包括但不限于脱脂棉、硅胶、海绵、吸水树脂、吸水橡胶等。Optionally, referring to FIG. 2, FIG. 3 and FIG. 5, the cleaning brush 2 comprises a rotating shaft 21, a bracket 22 and a brush head 23. The bracket 22 is rotatably coupled to the end cover 1 via the rotating shaft 21. The bracket 22 includes oppositely disposed rotating ends and movable ends. The rotating shaft 21 is coupled to the rotating end of the bracket 22 to rotate the movable end about the rotating end. The movable end rotates around the rotating end to form a rotation range 20 of the cleaning brush 2. The brush head 23 is fixed to a side of the bracket 22 facing the end cap 1. The brush head 23 is made of a water absorbing material. Water absorbing materials include, but are not limited to, absorbent cotton, silica gel, sponge, water absorbing resin, water absorbing rubber, and the like.
在本实施例中,由于所述刷头23采用吸水材料制成,因此所述刷头23能够快速吸收所述半导体制冷片3所产生的冷凝水,从而携带所述冷凝水清洁所述镜片4。当然,在其他实施方式中,所述刷头23也可采用吸水性较差、但仍具有一定亲水性的材料,例如塑料,所述冷凝水能够渗入所述刷头23,使得所述清洁刷2在转动过程中仍能够携带所述冷凝水清洁所述镜片4。In the present embodiment, since the brush head 23 is made of a water absorbing material, the brush head 23 can quickly absorb the condensed water generated by the semiconductor refrigerating sheet 3, thereby carrying the condensed water to clean the lens 4. . Of course, in other embodiments, the brush head 23 can also adopt a material that is poor in water absorption, but still has certain hydrophilicity, such as plastic, and the condensed water can penetrate into the brush head 23, so that the cleaning is performed. The brush 2 is still capable of carrying the condensed water to clean the lens 4 during rotation.
可以理解的是,如图3和图13所示,在所述清洁刷2的转动范围20覆盖所述镜片4的情况下,所述转轴21可以灵活设置,例如可位于所述镜片4的上方(如图3所示),或者位于所述镜片4的下方(如图13所示)。It can be understood that, as shown in FIG. 3 and FIG. 13 , in the case that the rotation range 20 of the cleaning brush 2 covers the lens 4 , the rotating shaft 21 can be flexibly disposed, for example, can be located above the lens 4 . (as shown in Figure 3), or below the lens 4 (as shown in Figure 13).
可选的,请再次参阅图2、图3以及图5,所述自清洁组件300还包括驱动件5,所述驱动件5用于驱动所述转轴21带动所述支架22转动。所述驱动件5可为电机。所述驱动件5位于所述端盖1的远离所述清洁刷2的一侧。所述驱动件5电连接所述控制器301和所述电源302。Optionally, referring to FIG. 2, FIG. 3 and FIG. 5 again, the self-cleaning assembly 300 further includes a driving member 5 for driving the rotating shaft 21 to drive the bracket 22 to rotate. The drive member 5 can be a motor. The driving member 5 is located on a side of the end cover 1 remote from the cleaning brush 2. The driving member 5 is electrically connected to the controller 301 and the power source 302.
可选的,请结合参阅图5和图6,所述镜片4通过组装方式固定在所述端盖1上或所述镜片4为所述端盖1的一部分。Optionally, referring to FIG. 5 and FIG. 6, the lens 4 is fixed on the end cover 1 by assembly or the lens 4 is a part of the end cover 1.
举例而言:For example:
在一种实施方式中,请再次参阅图3和图5,所述端盖1设有通孔11,所述镜片4为独立于所述端盖1的一个部件,所述镜片4嵌入所述通孔11或覆盖在所述通孔11的一端开口处,以固定至所述端盖1。例如,所述镜片4嵌入所述通孔11,所述镜片4的周缘与所述通孔11的孔壁之间通过粘接剂粘接。或者,所述通孔11的孔壁设有限位面111。所述镜片4收容于所述通孔11,所述镜片4抵持所述限位面111。所述限位面111与所述镜片4的周缘之间通过双面胶或粘接剂粘接。所述限位面111可朝向所述清洁刷2以方便固定所述镜片4, 或所述限位面111可背离所述清洁刷2以防止所述镜片4掉落。In an embodiment, referring again to FIG. 3 and FIG. 5, the end cap 1 is provided with a through hole 11 , the lens 4 is a component independent of the end cap 1 , and the lens 4 is embedded in the The through hole 11 is covered at an opening of one end of the through hole 11 to be fixed to the end cover 1. For example, the lens 4 is embedded in the through hole 11, and the periphery of the lens 4 and the hole wall of the through hole 11 are bonded by an adhesive. Alternatively, the hole wall of the through hole 11 is provided with a limiting surface 111. The lens 4 is received in the through hole 11 , and the lens 4 abuts the limiting surface 111 . The limiting surface 111 and the periphery of the lens 4 are bonded by a double-sided tape or an adhesive. The limiting surface 111 may face the cleaning brush 2 to facilitate fixing the lens 4, or the limiting surface 111 may face away from the cleaning brush 2 to prevent the lens 4 from falling.
在另一种实施方式中,请再次参阅图3和图6,所述镜片4为所述端盖1的一部分。所述端盖1还包括围设在所述镜片4周边的遮蔽区12。所述镜片4采用透明材料,以允许光线穿过。所述遮蔽区12采用遮光材料以实现遮蔽作用。所述端盖1可通过埋入成型工艺或双射成型工艺实现一体成型。In another embodiment, referring again to Figures 3 and 6, the lens 4 is part of the end cap 1. The end cap 1 further includes a shielding area 12 surrounding the periphery of the lens 4. The lens 4 is made of a transparent material to allow light to pass through. The shielding area 12 is made of a light shielding material to achieve a shielding effect. The end cap 1 can be integrally formed by a buried molding process or a two-shot molding process.
可选的,请再次参阅图3和图5,所述镜片4朝向所述清洁刷2的镜面41与所述端盖1朝向所述清洁刷2的外表面13平齐。此时,由于所述镜片4的镜面41与所述端盖1的外表面13平齐,因此不会在所述镜面41的周缘处形成容易藏纳污垢的区域,使得所述清洁刷2能够顺利清洁所述镜片4的镜面41,并且清洁效率高、清洁效果好。Optionally, referring again to FIG. 3 and FIG. 5 , the lens 4 faces the mirror surface 41 of the cleaning brush 2 and the end cover 1 is flush with the outer surface 13 of the cleaning brush 2 . At this time, since the mirror surface 41 of the lens 4 is flush with the outer surface 13 of the end cap 1, a region where dirt is easily trapped is not formed at the periphery of the mirror surface 41, so that the cleaning brush 2 can The mirror surface 41 of the lens 4 is smoothly cleaned, and the cleaning efficiency is high and the cleaning effect is good.
可以理解的是,所述镜片4具有采集区域,所述摄像机主体200的镜头201通过所述采集区域采集图像。所述采集区域可以覆盖整个所述镜片4,也可为所述镜片4的一部分区域。所述清洁刷2的转动范围20对所述镜片4的覆盖比例以所述采集区域为准。所述清洁刷2的转动范围20至少完全覆盖所述采集区域,以保证所述摄像机主体200采集图像的质量。It can be understood that the lens 4 has an acquisition area, and the lens 201 of the camera body 200 collects an image through the collection area. The collection area may cover the entire lens 4 or a partial area of the lens 4. The coverage ratio of the rotation range 20 of the cleaning brush 2 to the lens 4 is based on the collection area. The rotation range 20 of the cleaning brush 2 at least completely covers the collection area to ensure the quality of the image captured by the camera body 200.
可选的,所述镜片4的镜面41覆盖有疏水涂层,以使所述镜片4沾满灰尘后,灰尘能够顺利被水(包括但不限于所述半导体制冷片3所产生的所述冷凝水、雨水、露水等)带走,以使所述镜片4的镜面41保持较为干净的状态。Optionally, the mirror surface 41 of the lens 4 is covered with a hydrophobic coating, so that after the lens 4 is stained with dust, the dust can be smoothly drained by water (including but not limited to the condensation generated by the semiconductor refrigeration sheet 3). Water, rain, dew, etc. are carried away so that the mirror surface 41 of the lens 4 is kept relatively clean.
可选的,请再次参阅图2,所述摄像机100还包括外壳6。所述外壳6连接所述端盖1的周缘。所述外壳6与所述端盖1共同围设出容置空间60。所述摄像机主体200收容于所述容置空间60。所述镜头201在所述容置空间60中并邻近所述端盖1设置,以正对所述镜片4。Optionally, referring again to FIG. 2, the camera 100 further includes a housing 6. The outer casing 6 is connected to the periphery of the end cap 1. The housing 6 and the end cover 1 together define an accommodating space 60. The camera body 200 is received in the accommodating space 60. The lens 201 is disposed in the accommodating space 60 adjacent to the end cap 1 to face the lens 4.
可选的,请一并参阅图2至图10,所述半导体制冷片3可固定在所述端盖1上,或固定在所述清洁刷2上,或位于所述端盖1远离所述清洁刷2的一侧(例如固定在所述外壳6上)。所述半导体制冷片3固定在所述外壳6上时,可收容在所述容置空间60中,也可位于所述容置空间60外。所述半导体制冷片3在上述任意位置产生所述冷凝水时,所述冷凝水可直接或间接地接触所述清洁刷2或流经所述清洁刷2的转动范围20或流经所述镜片4,使得所述清洁刷2携带所述冷凝水清洁所述镜片4。Optionally, referring to FIG. 2 to FIG. 10, the semiconductor refrigerating sheet 3 may be fixed on the end cover 1 or fixed on the cleaning brush 2, or located at the end cover 1 away from the One side of the cleaning brush 2 (for example, fixed to the outer casing 6). When the semiconductor refrigerating sheet 3 is fixed to the outer casing 6, it may be received in the accommodating space 60 or outside the accommodating space 60. When the semiconductor refrigerating sheet 3 generates the condensed water at any of the above positions, the condensed water may directly or indirectly contact the cleaning brush 2 or flow through the rotating range 20 of the cleaning brush 2 or flow through the lens. 4. The cleaning brush 2 is caused to carry the condensed water to clean the lens 4.
具体而言:in particular:
在第一种实施方式中,请再次参阅图2、图3以及图5,所述端盖1设有收容槽14。所述半导体制冷片3收容于所述收容槽14中。所述收容槽14位于所述清洁刷2的转动范围20内。所述半导体制冷片3的冷端31靠近所述端盖1的外表面13设置,所述半导体制冷片3的热端32远离所述端盖1的外表面13设置。所述半导体制冷片3的冷端31制冷时,在所述半导体制冷片3的冷端31附近形成所述冷凝水,也即在所述端盖1的靠近所述半导体制冷片3的区域处形成所述冷凝水。由于所述收容槽14位于所述清洁刷2的转动范围20内,因此能够在所述清洁刷2的转动范围20内形成所述冷凝水,从而在所述清洁刷2转动经过时,携带上所述冷凝水,所述清洁刷2带水清洁所述镜片4。In the first embodiment, referring again to FIG. 2, FIG. 3 and FIG. 5, the end cover 1 is provided with a receiving groove 14. The semiconductor refrigerating sheet 3 is housed in the receiving groove 14 . The receiving groove 14 is located within the rotation range 20 of the cleaning brush 2 . The cold end 31 of the semiconductor refrigerating sheet 3 is disposed adjacent to the outer surface 13 of the end cap 1, and the hot end 32 of the semiconductor refrigerating sheet 3 is disposed away from the outer surface 13 of the end cap 1. When the cold end 31 of the semiconductor refrigerating sheet 3 is cooled, the condensed water is formed in the vicinity of the cold end 31 of the semiconductor refrigerating sheet 3, that is, at a region of the end cap 1 close to the semiconductor refrigerating sheet 3. The condensed water is formed. Since the receiving groove 14 is located within the rotation range 20 of the cleaning brush 2, the condensed water can be formed in the rotation range 20 of the cleaning brush 2, so that when the cleaning brush 2 is rotated, it is carried. The condensed water, the cleaning brush 2 cleans the lens 4 with water.
在本实施方式中,先通过所述半导体制冷片3制冷产生所述冷凝水,所述冷凝水流经所述清洁刷2的转动范围20后,启动所述清洁刷2转动,从而使所述清洁刷2在转动时携带所述冷凝水清洁所述镜片4。In the present embodiment, the condensed water is first cooled by the semiconductor refrigerating sheet 3, and after the condensed water flows through the rotation range 20 of the cleaning brush 2, the cleaning brush 2 is started to rotate, thereby making the cleaning The brush 2 carries the condensed water to clean the lens 4 as it rotates.
在第二种实施方式中,请再次参阅图2、图3以及图5,所述端盖1设有收容槽14。所述半导体制冷片3收容于所述收容槽14中。所述收容槽14位于所述镜片4竖直上方,以使所述冷凝水在重力作用下经过所述镜片4。所述半导体制冷片3的冷端31靠近所述端盖1的外表面13设置,所述半导体制冷片3的热端32远离所述端盖1的外表面13设置。所述半导 体制冷片3的冷端31制冷时,在所述半导体制冷片3的冷端31附近形成所述冷凝水,也即在所述端盖1的靠近所述半导体制冷片3的区域处形成所述冷凝水。由于所述收容槽14位于所述镜片4竖直上方,因此能够在所述镜片4竖直上方形成所述冷凝水,从而使所述冷凝水在重力作用下经过所述镜片4,在所述清洁刷2转动经过所述镜片4时,所述清洁刷2能够携带上所述冷凝水,从而实现带水清洁。In the second embodiment, referring again to FIG. 2, FIG. 3 and FIG. 5, the end cover 1 is provided with a receiving groove 14. The semiconductor refrigerating sheet 3 is housed in the receiving groove 14 . The receiving groove 14 is vertically above the lens 4 such that the condensed water passes through the lens 4 under the force of gravity. The cold end 31 of the semiconductor refrigerating sheet 3 is disposed adjacent to the outer surface 13 of the end cap 1, and the hot end 32 of the semiconductor refrigerating sheet 3 is disposed away from the outer surface 13 of the end cap 1. When the cold end 31 of the semiconductor refrigerating sheet 3 is cooled, the condensed water is formed in the vicinity of the cold end 31 of the semiconductor refrigerating sheet 3, that is, at a region of the end cap 1 close to the semiconductor refrigerating sheet 3. The condensed water is formed. Since the receiving groove 14 is located vertically above the lens 4, the condensed water can be formed vertically above the lens 4, so that the condensed water passes through the lens 4 under the force of gravity, When the cleaning brush 2 is rotated through the lens 4, the cleaning brush 2 can carry the condensed water to achieve water cleaning.
在本实施方式中,先通过所述半导体制冷片3制冷产生所述冷凝水,所述冷凝水经过所述镜片4,所述镜片4的镜面41湿润后,启动所述清洁刷2转动,从而使所述清洁刷2在转动时携带所述冷凝水清洁所述镜片4。In the present embodiment, the condensed water is first cooled by the semiconductor refrigerating sheet 3, and the condensed water passes through the lens 4, and after the mirror surface 41 of the lens 4 is wetted, the cleaning brush 2 is started to rotate, thereby The cleaning brush 2 is caused to carry the condensed water to clean the lens 4 while rotating.
可以理解的是,在上述第一种实施方式中,所述收容槽14可以偏离所述镜片4的竖直上方设置。在上述第二种实施方式中,所述收容槽14可偏离所述清洁刷2的转动范围20设置。在一种实施例中,所述收容槽14既位于所述镜片4的竖直上方,还位于所述清洁刷2的转动范围20内。It can be understood that, in the above first embodiment, the receiving groove 14 can be disposed away from the vertical upper side of the lens 4. In the second embodiment described above, the receiving groove 14 can be disposed away from the rotation range 20 of the cleaning brush 2. In one embodiment, the receiving groove 14 is located both vertically above the lens 4 and within the range of rotation 20 of the cleaning brush 2.
在上述第一种实施方式和/或第二种实施方式中,所述收容槽14远离所述端盖1的外表面13的底壁上设有连通孔15,所述连通孔15用于允许所述半导体制冷片3的电源线通过。收容在所述收容槽14内的所述半导体制冷片3通过所述电源线电连接所述摄像机主体200。In the first embodiment and/or the second embodiment, the bottom wall of the receiving groove 14 away from the outer surface 13 of the end cover 1 is provided with a communication hole 15 for allowing The power supply line of the semiconductor refrigerating sheet 3 passes. The semiconductor refrigerating sheet 3 housed in the housing groove 14 is electrically connected to the camera body 200 via the power source line.
在上述第一种实施方式和/或第二种实施方式中,所述半导体制冷片3的冷端31具有远离所述半导体制冷片3的热端32的冷凝面311,所述冷凝面311与所述端盖1的朝向所述清洁刷2的外表面13平齐。由于所述冷凝面311与所述端盖1的外表面13平齐,因此在所述冷凝面311上所产生的冷凝水能够顺利自所述冷凝面311流到所述端盖1的外表面13上和所述镜片4的镜面41上,从而使所述镜片4的镜面41上具有足够的冷凝水,以保证所述自清洁组件300的清洁效率和清洁效果。In the first embodiment and/or the second embodiment described above, the cold end 31 of the semiconductor refrigerating sheet 3 has a condensation surface 311 away from the hot end 32 of the semiconductor refrigerating sheet 3, the condensation surface 311 and The outer surface 13 of the end cap 1 facing the cleaning brush 2 is flush. Since the condensation surface 311 is flush with the outer surface 13 of the end cap 1, the condensed water generated on the condensation surface 311 can smoothly flow from the condensation surface 311 to the outer surface of the end cap 1. 13 is applied to the mirror surface 41 of the lens 4 such that the mirror surface 41 of the lens 4 has sufficient condensed water to ensure the cleaning efficiency and cleaning effect of the self-cleaning assembly 300.
在上述第一种实施方式和/或第二种实施方式中,所述收容槽14的槽壁与所述半导体制冷片3之间填充防水凝胶16,以实现防水密封。其中,防水凝胶16可完全包裹所述半导体制冷片3,以对所述半导体制冷片3起到保护作用。当然,防水凝胶16覆盖所述半导体制冷片3的冷端31的部分的厚度比防水凝胶16的其他部分的厚度薄,以保证所述半导体制冷片3的冷端31的制冷效果。所述半导体制冷片3的冷端31也可不被防水凝胶16覆盖,以提升冷凝效果。In the above first embodiment and/or the second embodiment, the waterproof wall 16 is filled between the groove wall of the receiving groove 14 and the semiconductor refrigerating sheet 3 to achieve a waterproof seal. Wherein, the waterproof gel 16 can completely wrap the semiconductor refrigeration sheet 3 to protect the semiconductor refrigeration sheet 3. Of course, the thickness of the portion of the waterproof gel 16 covering the cold end 31 of the semiconductor refrigerating sheet 3 is thinner than the thickness of other portions of the waterproof gel 16 to ensure the cooling effect of the cold end 31 of the semiconductor refrigerating sheet 3. The cold end 31 of the semiconductor refrigerating sheet 3 may also not be covered by the waterproof gel 16 to enhance the condensation effect.
在第三种实施方式中,请一并参阅图7和图8,所述半导体制冷片3固定在所述清洁刷2上。所述半导体制冷片3的冷端31相对所述半导体制冷片3的热端32远离所述清洁刷2设置。所述半导体制冷片3的冷端31制冷时,在所述半导体制冷片3的冷端31附近形成所述冷凝水,也即在所述清洁刷2的靠近所述半导体制冷片3的区域处形成所述冷凝水。此时,当所述清洁刷2的所述刷头23采用吸水材料时,所述冷凝水能够快速被所述刷头23吸收,从而使得所述清洁刷2能够携带所述冷凝水清洁所述镜片4。当所述清洁刷2的所述刷头23采用其他亲水性材料时,所述冷凝水也能够渗入所述刷头23,使所述清洁刷2实现带水清洁。In the third embodiment, referring to FIG. 7 and FIG. 8, the semiconductor refrigerating sheet 3 is fixed to the cleaning brush 2. The cold end 31 of the semiconductor refrigerating sheet 3 is disposed away from the cleaning brush 2 with respect to the hot end 32 of the semiconductor refrigerating sheet 3. When the cold end 31 of the semiconductor refrigerating sheet 3 is cooled, the condensed water is formed in the vicinity of the cold end 31 of the semiconductor refrigerating sheet 3, that is, at a region of the cleaning brush 2 close to the semiconductor refrigerating sheet 3. The condensed water is formed. At this time, when the brush head 23 of the cleaning brush 2 is made of a water absorbing material, the condensed water can be quickly absorbed by the brush head 23, so that the cleaning brush 2 can carry the condensed water to clean the Lens 4. When the brush head 23 of the cleaning brush 2 is made of other hydrophilic materials, the condensed water can also penetrate into the brush head 23, so that the cleaning brush 2 can be cleaned with water.
在本实施方式中,先通过所述半导体制冷片3制冷产生所述冷凝水,所述冷凝水被所述刷头23吸收或渗入所述刷头23后,启动所述清洁刷2转动,从而使所述清洁刷2在转动时携带所述冷凝水清洁所述镜片4。In the present embodiment, the condensed water is first cooled by the semiconductor refrigerating sheet 3, and the condensed water is absorbed by the brush head 23 or penetrates into the brush head 23, and the cleaning brush 2 is activated to rotate. The cleaning brush 2 is caused to carry the condensed water to clean the lens 4 while rotating.
可以理解的是,所述清洁刷2不转动时具有初始位置。如图7中,实线所示为所述初始位置,虚线所示为转动后的另一位置。所述半导体制冷片3固定在所述清洁刷2的靠上的位置处,以使所述冷凝水在重力作用下更好地被所述刷头23吸收或渗入所述刷头23。如图7和图8所示,在所述清洁刷2的上部设置所述半导体制冷片3,所述清洁刷2的刷头23采用 吸水材料。当需要清洁所述镜片4时,给所述半导体制冷片3通电,所述半导体制冷片3冷凝水汽产生所述冷凝水,所述冷凝水流到吸水材料内,而后启动所述清洁刷2转动清洁所述镜片4。其中,由于所述半导体制冷片3所产生的所述冷凝水是先被所述刷头23吸收或渗入所述刷头23,然后所述刷头23直接携带所述冷凝水清洗所述镜片4,因此所述清洁刷2的所述转轴21可以位于所述镜片4的上方(如图7所示)、下方(如图13所示)或其他方位,所述清洁刷2的初始位置也可位于所述镜片4的上方、下方或其他方位,所述清洁刷2的转动范围20覆盖所述镜片4即可。It can be understood that the cleaning brush 2 has an initial position when it is not rotated. As shown in Fig. 7, the solid line shows the initial position, and the broken line shows the other position after the rotation. The semiconductor refrigerating sheet 3 is fixed at an upper position of the cleaning brush 2 so that the condensed water is better absorbed by the brush head 23 or infiltrated into the brush head 23 by gravity. As shown in Figs. 7 and 8, the semiconductor refrigerating sheet 3 is disposed on the upper portion of the cleaning brush 2, and the brush head 23 of the cleaning brush 2 is made of a water absorbing material. When the lens 4 needs to be cleaned, the semiconductor refrigerating sheet 3 is energized, the semiconductor refrigerating sheet 3 condenses water vapor to generate the condensed water, the condensed water flows into the water absorbing material, and then the cleaning brush 2 is started to rotate and clean. The lens 4. Wherein, the condensed water generated by the semiconductor refrigerating sheet 3 is first absorbed or penetrated into the brush head 23 by the brush head 23, and then the brush head 23 directly carries the condensed water to clean the lens 4 Therefore, the rotating shaft 21 of the cleaning brush 2 may be located above the lens 4 (as shown in FIG. 7 ), below (as shown in FIG. 13 ) or other orientations, and the initial position of the cleaning brush 2 may also be Located above, below or in other orientations of the lens 4, the range of rotation 20 of the cleaning brush 2 covers the lens 4.
其中,所述半导体制冷片3的热端32可通过粘接方式等固定在所述清洁刷2的所述支架22上。所述支架22具有远离所述刷头23的连接面,所述连接面具有面积较大的平整区域,以方便所述半导体制冷片3的热端32贴附。The hot end 32 of the semiconductor refrigerating sheet 3 may be fixed to the holder 22 of the cleaning brush 2 by a bonding method or the like. The bracket 22 has a connecting surface away from the brush head 23, and the connecting surface has a flat area with a large area to facilitate attachment of the hot end 32 of the semiconductor refrigerating sheet 3.
在一种实施例中,所述清洁刷2的初始位置位于所述镜片4竖直上方,以使所述冷凝水在重力作用下经过所述镜片4。所述半导体制冷片3的冷端31制冷时,在所述半导体制冷片3的冷端31附近形成所述冷凝水,也即在所述清洁刷2的靠近所述半导体制冷片3的区域处形成所述冷凝水。由于所述清洁刷2的初始位置位于所述镜片4竖直上方,所述半导体制冷片3在所述清洁刷2处于初始位置时制冷,因此能够在所述镜片4竖直上方形成所述冷凝水,从而使所述冷凝水在重力作用下经过所述镜片4,在所述清洁刷2转动经过所述镜片4时,所述清洁刷2能够携带上所述冷凝水,从而实现带水清洁。并且,当所述清洁刷2的所述刷头23采用吸水材料或亲水材料时,所述冷凝水还能够同时被吸入所述刷头23或渗入所述刷头23,使得所述清洁刷2带水清洁所述镜片4的效果更佳。In one embodiment, the initial position of the cleaning brush 2 is located vertically above the lens 4 such that the condensed water passes the lens 4 under the force of gravity. When the cold end 31 of the semiconductor refrigerating sheet 3 is cooled, the condensed water is formed in the vicinity of the cold end 31 of the semiconductor refrigerating sheet 3, that is, at a region of the cleaning brush 2 close to the semiconductor refrigerating sheet 3. The condensed water is formed. Since the initial position of the cleaning brush 2 is vertically above the lens 4, the semiconductor refrigerating sheet 3 is cooled when the cleaning brush 2 is in the initial position, so that the condensation can be formed vertically above the lens 4. Water, so that the condensed water passes through the lens 4 under the force of gravity, and when the cleaning brush 2 rotates through the lens 4, the cleaning brush 2 can carry the condensed water, thereby achieving water cleaning . Moreover, when the brush head 23 of the cleaning brush 2 is made of a water absorbing material or a hydrophilic material, the condensed water can also be sucked into the brush head 23 or penetrate the brush head 23 at the same time, so that the cleaning brush 2 The effect of cleaning the lens 4 with water is better.
在本实施例中,先通过所述半导体制冷片3制冷产生所述冷凝水,所述冷凝水经过所述镜片4,所述镜片4的镜面41湿润后,启动所述清洁刷2转动,从而使所述清洁刷2在转动时携带所述冷凝水清洁所述镜片4。可以理解的是,由于所述半导体制冷片3所产生的所述冷凝水是先流经所述镜片4,使得镜片4的镜面41湿润,然后转动的清洁刷2经过所述镜片4时才会接触所述冷凝水,以实现带水清洁,因此所述清洁刷2的所述转轴21位于所述镜片4的上方,以使所述清洁刷2的初始位置能够位于所述镜片4的竖直上方,使得所述冷凝水在所述镜片4的上方凝聚。In the embodiment, the condensed water is first cooled by the semiconductor refrigerating sheet 3, and the condensed water passes through the lens 4. After the mirror surface 41 of the lens 4 is wetted, the cleaning brush 2 is started to rotate, thereby The cleaning brush 2 is caused to carry the condensed water to clean the lens 4 while rotating. It can be understood that since the condensed water generated by the semiconductor refrigerating sheet 3 flows through the lens 4 first, the mirror surface 41 of the lens 4 is wetted, and then the rotating cleaning brush 2 passes through the lens 4. Contacting the condensed water to achieve water cleaning, so the rotating shaft 21 of the cleaning brush 2 is located above the lens 4 so that the initial position of the cleaning brush 2 can be located vertically of the lens 4 Above, the condensed water is condensed above the lens 4.
在第四种实施方式中,请一并参阅图9和图10,所述自清洁组件300还包括水箱7和水管8。所述半导体制冷片3收容于所述水箱7,以在所述水箱7内形成所述冷凝水。所述水箱7位于所述端盖1远离所述清洁刷2的一侧。所述水管8的入口端81连通所述水箱7,所述水管8的出口端82固定在所述端盖1上。所述水管8的出口端82位于所述清洁刷2的转动范围20内。所述半导体制冷片3制冷时,在所述水箱7内形成所述冷凝水。所述水箱7收集足够所述冷凝水后,能够在需要清洗所述镜片4时,导通所述水管8,使所述冷凝水流出。由于所述水管8的出口端82位于所述清洁刷2的转动范围20内,因此所述冷凝水能够流动到所述清洁刷2的转动范围20,从而在所述清洁刷2转动经过时,携带上所述冷凝水,实现带水清洁。In the fourth embodiment, referring to FIG. 9 and FIG. 10 together, the self-cleaning assembly 300 further includes a water tank 7 and a water pipe 8. The semiconductor refrigeration sheet 3 is housed in the water tank 7 to form the condensed water in the water tank 7. The water tank 7 is located on a side of the end cover 1 away from the cleaning brush 2. The inlet end 81 of the water pipe 8 communicates with the water tank 7, and the outlet end 82 of the water pipe 8 is fixed to the end cover 1. The outlet end 82 of the water tube 8 is located within the range of rotation 20 of the cleaning brush 2. When the semiconductor refrigerating sheet 3 is cooled, the condensed water is formed in the water tank 7. After the water tank 7 collects enough of the condensed water, the water pipe 8 can be turned on when the lens 4 needs to be cleaned, so that the condensed water flows out. Since the outlet end 82 of the water pipe 8 is located within the rotation range 20 of the cleaning brush 2, the condensed water can flow to the rotation range 20 of the cleaning brush 2, so that when the cleaning brush 2 is rotated, Carrying the condensed water to achieve clean water.
在第五种实施方式中,请一并参阅图9和图10,所述自清洁组件300还包括水箱7和水管8。所述半导体制冷片3收容于所述水箱7,以在所述水箱7内形成所述冷凝水。所述水箱7位于所述端盖1远离所述清洁刷2的一侧。所述水管8的入口端81连通所述水箱7。所述水管8的出口端82固定在所述端盖1上且位于所述镜片4竖直上方,以使所述冷凝水在重力作用下经过所述镜片4。所述半导体制冷片3制冷时,在所述水箱7内形成所述冷凝水。所述水箱7收集足够所述冷凝水后,能够在需要清洗所述镜片4时,导通所述水管8,使所述 冷凝水流出。由于所述水管8的出口端82位于所述镜片4竖直上方,因此所述冷凝水在重力作用下经过所述镜片4,在所述清洁刷2转动经过所述镜片4时,所述清洁刷2能够携带上所述冷凝水,从而实现带水清洁。In the fifth embodiment, referring to FIG. 9 and FIG. 10 together, the self-cleaning assembly 300 further includes a water tank 7 and a water pipe 8. The semiconductor refrigeration sheet 3 is housed in the water tank 7 to form the condensed water in the water tank 7. The water tank 7 is located on a side of the end cover 1 away from the cleaning brush 2. The inlet end 81 of the water pipe 8 communicates with the water tank 7. An outlet end 82 of the water tube 8 is secured to the end cap 1 and vertically above the lens 4 such that the condensed water passes through the lens 4 under the force of gravity. When the semiconductor refrigerating sheet 3 is cooled, the condensed water is formed in the water tank 7. After the water tank 7 collects enough of the condensed water, the water pipe 8 can be turned on when the lens 4 needs to be cleaned, so that the condensed water flows out. Since the outlet end 82 of the water pipe 8 is vertically above the lens 4, the condensed water passes through the lens 4 under the force of gravity, and the cleaning is performed as the cleaning brush 2 rotates past the lens 4. The brush 2 can carry the condensed water to achieve water cleaning.
可以理解的是,在上述第四种实施方式中,所述水管8的出口端82可以偏离所述镜片4的竖直上方设置。在上述第五种实施方式中,所述水管8的出口端82可偏离所述清洁刷2的转动范围20设置。在一种实施例中,所述水管8的出口端82既位于所述镜片4的竖直上方,还位于所述清洁刷2的转动范围20内。It will be appreciated that in the fourth embodiment described above, the outlet end 82 of the water tube 8 may be offset from the vertical upper side of the lens 4. In the fifth embodiment described above, the outlet end 82 of the water pipe 8 can be disposed offset from the rotation range 20 of the cleaning brush 2. In one embodiment, the outlet end 82 of the water tube 8 is located both vertically above the lens 4 and within the range of rotation 20 of the cleaning brush 2.
在第四种实施方式和/或第五种实施方式中,所述半导体制冷片3可以在需要清洁所述镜片4时制冷产生所述冷凝水,也可以长期处于制冷状态,以使所述水箱7收集有足够所述冷凝水,以备随时开始清洗所述镜片4,应急反应快。当所述镜片4需要清洁时,导通所述水管8,使所述冷凝水流出,所述清洁刷2实现带水清洁。In the fourth embodiment and/or the fifth embodiment, the semiconductor refrigerating sheet 3 may be cooled to generate the condensed water when the lens 4 needs to be cleaned, or may be in a refrigerating state for a long time to make the water tank 7 Collect enough condensed water to start cleaning the lens 4 at any time, and the emergency response is fast. When the lens 4 needs to be cleaned, the water pipe 8 is turned on to allow the condensed water to flow out, and the cleaning brush 2 is cleaned with water.
在第四种实施方式和/或第五种实施方式中,请再次参阅图2,所述水箱7可收容在所述容置空间60内,以提高隐蔽性,使得所述摄像机100具有较为整洁的外观。此时,所述水箱7固定在所述外壳6的内侧。当然,在其他实施例中,所述水箱7也可固定在所述外壳6的外侧壁上,以收集部分自然水(例如雨水、露水等)。In the fourth embodiment and/or the fifth embodiment, referring to FIG. 2 again, the water tank 7 can be housed in the accommodating space 60 to improve concealment, so that the camera 100 has a relatively clean and tidy manner. Appearance. At this time, the water tank 7 is fixed to the inner side of the outer casing 6. Of course, in other embodiments, the water tank 7 may also be fixed to the outer side wall of the outer casing 6 to collect a portion of natural water (eg, rain, dew, etc.).
在第四种实施方式和/或第五种实施方式中,如图10所示,可在所述水管8中部或至少一个端部处设置开关阀83,以控制所述水管8的导通和断开状态。In the fourth embodiment and/or the fifth embodiment, as shown in FIG. 10, an on-off valve 83 may be provided at the middle or at least one end of the water pipe 8 to control the conduction of the water pipe 8 and Disconnected state.
请一并参阅图1至图12,本申请实施例还提供一种自清洁方法。所述自清洁方法使用上述任一实施例所述的自清洁组件300清洁镜片4,以使摄像机100能够实现长时间运行且图像质量较佳。所述自清洁组件300包括端盖1、清洁刷2及半导体制冷片3。所述端盖1设有镜片4。所述清洁刷2转动连接所述端盖1。Referring to FIG. 1 to FIG. 12 together, the embodiment of the present application further provides a self-cleaning method. The self-cleaning method cleans the lens 4 using the self-cleaning assembly 300 of any of the above embodiments to enable the camera 100 to achieve long-term operation and better image quality. The self-cleaning assembly 300 includes an end cap 1, a cleaning brush 2, and a semiconductor refrigerating sheet 3. The end cap 1 is provided with a lens 4. The cleaning brush 2 is rotatably coupled to the end cap 1.
所述自清洁方法包括:The self-cleaning method includes:
步骤01:所述半导体制冷片3制冷形成冷凝水。Step 01: The semiconductor refrigerating sheet 3 is cooled to form condensed water.
步骤02:驱动所述清洁刷2转动,使所述清洁刷2携带所述冷凝水清洁所述镜片4。Step 02: Driving the cleaning brush 2 to rotate, so that the cleaning brush 2 carries the condensed water to clean the lens 4.
在本实施例中,所述自清洁方法能够在所述镜片4需要清洁时,通过所述半导体制冷片3制冷自生产所述冷凝水,然后驱动所述清洁刷2带水清洁所述镜片4,从而高效率地实现自清洁,并且带水清洁的清洁效果佳、能够避免磨损所述镜片4。In this embodiment, the self-cleaning method is capable of cooling the semiconductor chilled sheet 3 from the production of the condensed water when the lens 4 needs to be cleaned, and then driving the cleaning brush 2 to clean the lens with water. Thus, self-cleaning is achieved efficiently, and the cleaning effect with water cleaning is good, and the lens 4 can be prevented from being worn.
可以理解的是,所述步骤01的触发条件可为:所述镜片4上存在脏污时自动触发,或定时触发,或人工触发。具体而言,可通过图像信号处理判断所述镜片4上是否存在脏污,当所述镜片4上存在脏污时,则自动触发步骤01。可设定定时触发程序,实现间隔一定周期后,自动触发步骤01。可在其他需要清洁所述镜片4的环境(例如大雾等)中,临时手动触发步骤01。上述三种触发条件可选择其一,也可选择其中多种的组合。例如,默认每周清洁一次,并结合图像信号处理实时判断镜片上是否存在影响图像画质的脏污,当存在时,即时触发清洁。It can be understood that the triggering condition of the step 01 may be: automatic triggering when there is dirt on the lens 4, or timing triggering, or manual triggering. Specifically, it can be judged whether there is dirt on the lens 4 by image signal processing, and when there is dirt on the lens 4, step 01 is automatically triggered. The timing trigger program can be set to automatically trigger step 01 after a certain period of interval. Step 01 can be temporarily manually triggered in other environments where the lens 4 needs to be cleaned (e.g., fog, etc.). The above three trigger conditions may be selected one, or a combination of a plurality of them may be selected. For example, it is cleaned once a week by default, and combined with image signal processing to determine in real time whether there is any stain on the lens that affects the image quality, and when it exists, the cleaning is triggered immediately.
可选的,所述半导体制冷片3制冷形成冷凝水(也即步骤01)的过程包括:Optionally, the process of cooling the semiconductor refrigerating sheet 3 to form condensed water (ie, step 01) includes:
步骤011:依据空气温度和空气湿度计算露点温度。露点温度为将空气中的水蒸气冷凝成水的温度。所述半导体制冷片3上带有温度传感器304和湿度传感器305,用于空气的温湿度检测。当然,温度传感器304和湿度传感器305也可设置在所述自清洁组件300的其他部件上(例如端盖1等)。如图4所示,温度传感器304和湿度传感器305电连接所述控制器301。所述控制器301依据所述温度传感器304和所述湿度传感器305所检测的数据进行运算。Step 011: Calculate the dew point temperature based on the air temperature and the air humidity. The dew point temperature is the temperature at which water vapor in the air is condensed into water. The semiconductor refrigerating sheet 3 is provided with a temperature sensor 304 and a humidity sensor 305 for temperature and humidity detection of air. Of course, temperature sensor 304 and humidity sensor 305 can also be disposed on other components of self-cleaning assembly 300 (eg, end cap 1 etc.). As shown in FIG. 4, the temperature sensor 304 and the humidity sensor 305 are electrically connected to the controller 301. The controller 301 performs an operation based on the data detected by the temperature sensor 304 and the humidity sensor 305.
步骤012:所述半导体制冷片3的冷端31在第一温度持续第一时长,以使空气温度降低 至所述露点温度。当空气温度降低至所述露点温度时,空气中的水蒸气开始冷凝形成所述冷凝水。Step 012: The cold end 31 of the semiconductor refrigerating sheet 3 continues for a first time at the first temperature to lower the air temperature to the dew point temperature. When the air temperature is lowered to the dew point temperature, water vapor in the air begins to condense to form the condensed water.
步骤013:所述半导体制冷片3的冷端31在第二温度持续第二时长,以形成冷凝水,所述第二温度高于或等于所述第一温度。所述半导体制冷片3的冷端31持续制冷,从而形成较为充足的所述冷凝水,以保证所述自清洁方法的清洁效果。可以理解的是,所述第二时长依据预设用水量进行计算。当所述冷凝水的水量大于或等于所述预设用水量时,所述半导体制冷片31停止制冷。所述预设用水量与所述摄像机100的使用环境(例如空气粉尘密度等)和所述镜片4的面积等因素相关。所述预设用水量可以预设在所述自清洁组件300中,例如预设在所述控制器301中,或者所述自清洁组件300还包括存储器,用于存储所述预设用水量等参数。Step 013: The cold end 31 of the semiconductor refrigerating sheet 3 continues for a second time at a second temperature to form condensed water, and the second temperature is higher than or equal to the first temperature. The cold end 31 of the semiconductor refrigerating sheet 3 is continuously cooled, thereby forming a sufficient amount of the condensed water to ensure the cleaning effect of the self-cleaning method. It can be understood that the second duration is calculated according to the preset water consumption. When the amount of water of the condensed water is greater than or equal to the predetermined amount of water, the semiconductor refrigerating sheet 31 stops cooling. The preset water consumption amount is related to factors such as the use environment of the camera 100 (for example, air dust density, etc.) and the area of the lens 4. The preset water consumption may be preset in the self-cleaning component 300, for example, preset in the controller 301, or the self-cleaning component 300 further includes a memory for storing the preset water consumption, etc. parameter.
在本实施例中,由于空气温度已经降低至所述露点温度,因此所述第二温度可等于所述第一温度,以尽快形成充足的所述冷凝水,所述第二温度也可高于所述第一温度,从而在持续形成所述冷凝水的时候,降低所述半导体制冷片3的能耗。本申请实施例中不对所述第一时长和所述第二时长进行限定,所述第一时长和所述第二时长可依据空气的温湿度和清洁用水的需求,进行灵活设定。In this embodiment, since the air temperature has decreased to the dew point temperature, the second temperature may be equal to the first temperature to form sufficient condensed water as soon as possible, and the second temperature may also be higher than The first temperature, thereby reducing the energy consumption of the semiconductor refrigerating sheet 3 while continuously forming the condensed water. In the embodiment of the present application, the first duration and the second duration are not limited, and the first duration and the second duration may be flexibly set according to the temperature and humidity of the air and the requirement of the cleaning water.
举例而言:For example:
空气的露点温度可以通过公式(1):Td=b/[a/log(e/6.11)-1]计算。The dew point temperature of the air can be calculated by the formula (1): Td = b / [a / log (e / 6.11) - 1].
在公式(1)中,Td为空气的露点温度,单位摄氏度(℃);e为空气的水蒸气压,单位百帕(hpa);a、b为固定参数,对于水面,a=7.5,b=237.3。In formula (1), Td is the dew point temperature of air, in degrees Celsius (°C); e is the water vapor pressure of air, in units of hectopascals (hpa); a, b are fixed parameters, for water surface, a=7.5, b =237.3.
其中,空气的水蒸气压公式(2)为e=f×Es。Among them, the formula (2) of the water vapor pressure of air is e = f × Es.
在公式(2)中,f为空气的相对湿度,单位百分比(%);Es为空气的饱和水蒸气压,单位百帕(hpa)。In formula (2), f is the relative humidity of air, in percent (%); Es is the saturated vapor pressure of air in units of hectopascals (hpa).
Es依据公式(3):Es=E0×10[a×t/(b+t)]计算。Es is calculated according to the formula (3): Es = E0 × 10 [a × t / (b + t)].
在公式(3)中,E0为空气温度为0度时的饱和水蒸气压,取E0=6.11百帕(hpa);t为空气温度,单位摄氏度(℃)。In formula (3), E0 is the saturated water vapor pressure at an air temperature of 0 degrees, taking E0 = 6.11 hectopascals (hpa); t is the air temperature in units of degrees Celsius (°C).
基于以上三个公式,在通过温湿度传感器305获取当前空气的温度和相对湿度后,便可计算出当前空气的露点温度。例如,当空气温度为25℃,相对湿度为50%时,计算露点温度如下:Based on the above three formulas, after the temperature and relative humidity of the current air are obtained by the temperature and humidity sensor 305, the dew point temperature of the current air can be calculated. For example, when the air temperature is 25 ° C and the relative humidity is 50%, the dew point temperature is calculated as follows:
Es=6.11×10[7.5×25/(237.3+25)]=31.7hpa;Es = 6.11 × 10 [7.5 × 25 / (237.3 + 25)] = 31.7hpa;
e=0.5×31.7=15.85hpa;e=0.5×31.7=15.85hpa;
Td=237.3/[7.5/log(15.85/6.11)-1]=13.86℃。Td = 237.3 / [7.5 / log (15.85 / 6.11) - 1] = 13.86 ° C.
即当所述半导体制冷片3附近的空气温度降低到13.86℃时,将出现凝露。That is, when the temperature of the air in the vicinity of the semiconductor refrigerating sheet 3 is lowered to 13.86 ° C, condensation will occur.
所述半导体制冷片3的制冷系数为ε,表示每单位功耗的电量产生的制冷能量,单位为百分比(%),该系数与制冷片的物理特性、电阻、电流等相关,当选定特定制冷片、供电电压后,该系数即为固定值。半导体制冷片3的功耗为P,水蒸气的比热为C=2.1×103焦每千克摄氏度(J/(kg·℃)),清洁一次镜头201所需的水的质量为m,水蒸气制冷前温度为T1,制冷后温度即露点温度为Td,制冷时间为t,根据能量守恒,依据公式(4):P×ε×t=C×m×(T1-Td)计算制冷时间t。假设制冷片功耗为5瓦(W),制冷系数为0.5,清洁一次镜头201所需水1g,空气温度为25度,相对湿度为50%时,按照公式(4),计算达到露点温度13.86℃并生产1g冷凝水所需的时间t为9.4秒。The refrigeration coefficient of the semiconductor refrigerating sheet 3 is ε, which represents the cooling energy generated per unit of power consumption, expressed in percentage (%), which is related to the physical properties, resistance, current, etc. of the cooling sheet, when a specific After the cooling chip and the supply voltage, the coefficient is a fixed value. The power consumption of the semiconductor refrigerating sheet 3 is P, and the specific heat of the water vapor is C = 2.1 × 103 joules per kilogram Celsius (J / (kg · ° C)), and the mass of water required to clean the lens 201 is m, water vapor. The temperature before cooling is T1, the temperature after cooling is the dew point temperature is Td, and the cooling time is t. According to the conservation of energy, the cooling time t is calculated according to formula (4): P × ε × t = C × m × (T1-Td). Assume that the cooling chip consumes 5 watts (W), the cooling coefficient is 0.5, the water required to clean the lens 201 is 1g, the air temperature is 25 degrees, and the relative humidity is 50%. According to formula (4), the dew point temperature is calculated to 13.86. The time t required to produce 1 g of condensed water at ° C was 9.4 seconds.
可选的,在计算所述露点温度(也即步骤011)之前,所述半导体制冷片3制冷形成冷 凝水(也即步骤01)的过程还包括:Optionally, before the calculating the dew point temperature (ie, step 011), the process of cooling the semiconductor refrigerating sheet 3 to form condensed water (ie, step 01) further includes:
步骤001:检测空气温度。Step 001: Detect the air temperature.
步骤002:当所述空气温度低于第一阈值时,所述半导体制冷片3持续制热第三时长,以使空气温度升高至第二阈值,所述第二阈值大于所述第一阈值。Step 002: When the air temperature is lower than the first threshold, the semiconductor refrigerating sheet 3 continues to heat for a third time period to raise the air temperature to a second threshold, the second threshold being greater than the first threshold .
步骤003:检测空气湿度。Step 003: Detecting air humidity.
在本实施例中,当在检测到空气温度低于所述第一阈值时,周围空气温度很低,直接通过所述半导体制冷片3制冷获取所述冷凝水的难度较大,因此在步骤002中先通过制热,使得空气温度升高到所述第二阈值(例如常温25摄氏度),此时所述半导体制冷片3即可较为顺利地进行冷凝获取所述冷凝水。In this embodiment, when it is detected that the air temperature is lower than the first threshold, the ambient air temperature is very low, and it is difficult to directly obtain the condensed water through the semiconductor refrigeration sheet 3, so in step 002 First, by heating, the air temperature is raised to the second threshold (for example, 25 degrees Celsius), and at this time, the semiconductor refrigerating sheet 3 can be smoothly condensed to obtain the condensed water.
可以理解的是,步骤003可与步骤001同时进行,以节约检测时间。当所述空气温度大于等于所述第一阈值时,即可依据检测到空气温度和空气湿度计算所述露点温度。如所述半导体制冷片3还需进行制热,使空气温度升高到所述第二阈值,则需要再次检测空气湿度,以使所述露点温度能够依据更新的、更准确的数据获得准确数值。It can be understood that step 003 can be performed simultaneously with step 001 to save detection time. When the air temperature is greater than or equal to the first threshold, the dew point temperature may be calculated according to the detected air temperature and air humidity. If the semiconductor refrigerating sheet 3 still needs to be heated to raise the temperature of the air to the second threshold, the air humidity needs to be detected again, so that the dew point temperature can obtain an accurate value according to the updated and more accurate data. .
以上所述,仅为本申请的具体实施方式,但本申请的保护范围并不局限于此,任何熟悉本技术领域的技术人员在本申请揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本申请的保护范围之内。因此,本申请的保护范围应以所述权利要求的保护范围为准。The foregoing is only a specific embodiment of the present application, but the scope of protection of the present application is not limited thereto, and any person skilled in the art can easily think of changes or substitutions within the technical scope disclosed in the present application. It should be covered by the scope of protection of this application. Therefore, the scope of protection of the present application should be determined by the scope of the claims.

Claims (14)

  1. 一种自清洁组件,应用于摄像机,其特征在于,所述自清洁组件包括端盖、清洁刷及半导体制冷片,所述端盖设有镜片,所述清洁刷转动连接所述端盖,所述半导体制冷片用于产生冷凝水,所述清洁刷转动的过程中,携带所述冷凝水经过所述镜片,以清洁所述镜片。A self-cleaning assembly is applied to a camera, wherein the self-cleaning assembly comprises an end cover, a cleaning brush and a semiconductor refrigeration sheet, the end cover is provided with a lens, and the cleaning brush is rotatably connected to the end cover. The semiconductor refrigerating sheet is used to generate condensed water, and the condensed water is carried through the lens to rotate the lens during the rotation of the cleaning brush.
  2. 根据权利要求1所述的自清洁组件,其特征在于,所述清洁刷包括转轴、支架以及刷头,所述支架通过所述转轴转动连接所述端盖,所述刷头固定在所述支架朝向所述端盖的一侧,所述刷头采用吸水材料制成。The self-cleaning assembly according to claim 1, wherein the cleaning brush comprises a rotating shaft, a bracket and a brush head, and the bracket is rotatably connected to the end cover by the rotating shaft, and the brush head is fixed to the bracket To the side of the end cap, the head is made of a water absorbing material.
  3. 根据权利要求1或2所述的自清洁组件,其特征在于,所述镜片朝向所述清洁刷的镜面与所述端盖朝向所述清洁刷的外表面平齐。A self-cleaning assembly according to claim 1 or 2, wherein the mirror facing the mirror and the end cap are flush with the outer surface of the cleaning brush.
  4. 根据权利要求1~3任一项所述的自清洁组件,其特征在于,所述端盖设有收容槽,所述半导体制冷片收容于所述收容槽中,所述收容槽位于所述清洁刷的转动范围内。The self-cleaning assembly according to any one of claims 1 to 3, wherein the end cover is provided with a receiving groove, the semiconductor cooling sheet is received in the receiving groove, and the receiving groove is located in the cleaning Within the range of rotation of the brush.
  5. 根据权利要求1~3任一项所述的自清洁组件,其特征在于,所述端盖设有收容槽,所述半导体制冷片收容于所述收容槽中,所述收容槽位于所述镜片竖直上方,以使所述冷凝水在重力作用下经过所述镜片。The self-cleaning assembly according to any one of claims 1 to 3, wherein the end cover is provided with a receiving groove, the semiconductor refrigeration sheet is received in the receiving groove, and the receiving groove is located in the lens Vertically above, the condensed water passes through the lens under the force of gravity.
  6. 根据权利要求4或5所述的自清洁组件,其特征在于,所述半导体制冷片的冷端具有远离所述半导体制冷片的热端的冷凝面,所述冷凝面与所述端盖的朝向所述清洁刷的外表面平齐。A self-cleaning assembly according to claim 4 or 5, wherein the cold end of the semiconductor refrigerating sheet has a condensing surface away from the hot end of the semiconductor refrigerating sheet, the condensing surface and the orientation of the end cap The outer surface of the cleaning brush is flush.
  7. 根据权利要求1~3任一项所述的自清洁组件,其特征在于,所述半导体制冷片固定在所述清洁刷上,所述半导体制冷片的冷端相对所述半导体制冷片的热端远离所述清洁刷设置。The self-cleaning assembly according to any one of claims 1 to 3, wherein said semiconductor refrigerating sheet is fixed to said cleaning brush, and said cold end of said semiconductor refrigerating sheet is opposite to said hot end of said semiconductor refrigerating sheet Keep away from the cleaning brush settings.
  8. 根据权利要求7所述的自清洁组件,其特征在于,所述清洁刷的初始位置位于所述镜片竖直上方,以使所述冷凝水在重力作用下经过所述镜片。The self-cleaning assembly of claim 7 wherein the initial position of the cleaning brush is vertically above the lens such that the condensed water passes the lens under the force of gravity.
  9. 根据权利要求1~3任一项所述的自清洁组件,其特征在于,所述自清洁组件还包括水箱和水管,所述半导体制冷片收容于所述水箱,以在所述水箱内形成所述冷凝水,所述水箱位于所述端盖远离所述清洁刷的一侧,所述水管的入口端连通所述水箱,所述水管的出口端固定在所述端盖上且位于所述清洁刷的转动范围内。The self-cleaning assembly according to any one of claims 1 to 3, further comprising a water tank and a water pipe, the semiconductor refrigeration sheet being housed in the water tank to form a space in the water tank Condensed water, the water tank is located on a side of the end cover away from the cleaning brush, an inlet end of the water pipe communicates with the water tank, an outlet end of the water pipe is fixed on the end cover and is located in the cleaning Within the range of rotation of the brush.
  10. 根据权利要求1~3任一项所述的自清洁组件,其特征在于,所述自清洁组件还包括水箱和水管,所述半导体制冷片收容于所述水箱,以在所述水箱内形成所述冷凝水,所述水箱位于所述端盖远离所述清洁刷的一侧,所述水管的入口端连通所述水箱,所述水管的出口端固定在所述端盖上且位于所述镜片竖直上方,以使所述冷凝水在重力作用下经过所述镜片。The self-cleaning assembly according to any one of claims 1 to 3, further comprising a water tank and a water pipe, the semiconductor refrigeration sheet being housed in the water tank to form a space in the water tank Condensed water, the water tank is located on a side of the end cover away from the cleaning brush, an inlet end of the water pipe is connected to the water tank, and an outlet end of the water pipe is fixed on the end cover and located in the lens Vertically above, the condensed water passes through the lens under the force of gravity.
  11. 一种摄像机,其特征在于,包括摄像机主体和如权利要求1~10任一项所述的自清洁组件,所述摄像机主体位于所述端盖远离所述清洁刷的一侧,所述摄像机主体的镜头正对所述镜片设置。A camera comprising: a camera body and the self-cleaning assembly according to any one of claims 1 to 10, wherein the camera body is located on a side of the end cover away from the cleaning brush, the camera body The lens is placed against the lens.
  12. 一种自清洁方法,其特征在于,使用自清洁组件清洁镜片,所述自清洁组件包括端盖、清洁刷及半导体制冷片,所述端盖设有镜片,所述清洁刷转动连接所述端盖,所述自清洁方法包括:A self-cleaning method, characterized in that a lens is cleaned using a self-cleaning assembly, the self-cleaning assembly comprising an end cap, a cleaning brush and a semiconductor refrigeration sheet, the end cap being provided with a lens, the cleaning brush being rotatably connected to the end The cover, the self-cleaning method includes:
    所述半导体制冷片制冷形成冷凝水;和Cooling the semiconductor refrigeration sheet to form condensed water; and
    驱动所述清洁刷转动,使所述清洁刷携带所述冷凝水清洁所述镜片。The cleaning brush is driven to rotate such that the cleaning brush carries the condensed water to clean the lens.
  13. 根据权利要求12所述的自清洁方法,其特征在于,所述半导体制冷片制冷形成冷凝水的过程包括:The self-cleaning method according to claim 12, wherein the process of cooling the semiconductor refrigerating sheet to form condensed water comprises:
    依据空气温度和空气湿度计算露点温度;Calculate the dew point temperature based on air temperature and air humidity;
    所述半导体制冷片的冷端在第一温度持续第一时长,以使空气温度降低至所述露点温度;以及The cold end of the semiconductor refrigerating sheet continues for a first time at a first temperature to reduce an air temperature to the dew point temperature;
    所述半导体制冷片的冷端在第二温度持续第二时长,以形成冷凝水,所述第二温度高于或等于所述第一温度。The cold end of the semiconductor refrigerating sheet continues for a second time at a second temperature to form condensed water, the second temperature being higher than or equal to the first temperature.
  14. 根据权利要求13所述的自清洁方法,其特征在于,在计算所述露点温度之前,所述半导体制冷片制冷形成冷凝水的过程还包括:The self-cleaning method according to claim 13, wherein the process of cooling the semiconductor refrigerating sheet to form condensed water before calculating the dew point temperature further comprises:
    检测空气温度;Detecting air temperature;
    当所述空气温度低于第一阈值时,所述半导体制冷片持续制热第三时长,以使空气温度升高至第二阈值,所述第二阈值大于所述第一阈值;以及When the air temperature is lower than the first threshold, the semiconductor cooling sheet continues to heat for a third time period to raise the air temperature to a second threshold, the second threshold being greater than the first threshold;
    检测空气湿度。Check the air humidity.
PCT/CN2018/095538 2017-11-09 2018-07-13 Self-cleaning assembly, camera and self-cleaning method WO2019091133A1 (en)

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