WO2018217038A1 - Resin composition for grinding tool and grinding tool manufactured from the resin composition - Google Patents

Resin composition for grinding tool and grinding tool manufactured from the resin composition Download PDF

Info

Publication number
WO2018217038A1
WO2018217038A1 PCT/KR2018/005914 KR2018005914W WO2018217038A1 WO 2018217038 A1 WO2018217038 A1 WO 2018217038A1 KR 2018005914 W KR2018005914 W KR 2018005914W WO 2018217038 A1 WO2018217038 A1 WO 2018217038A1
Authority
WO
WIPO (PCT)
Prior art keywords
compound
grinding tool
resin composition
group
formula
Prior art date
Application number
PCT/KR2018/005914
Other languages
French (fr)
Korean (ko)
Inventor
김상우
이승희
안기호
김율리아나
김영대
Original Assignee
주식회사 엘지화학
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020180058367A external-priority patent/KR102067688B1/en
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to JP2019535382A priority Critical patent/JP6821236B2/en
Priority to US16/473,211 priority patent/US20190351529A1/en
Priority to CN201880008266.7A priority patent/CN110234469B/en
Priority to EP18806393.7A priority patent/EP3527327B1/en
Publication of WO2018217038A1 publication Critical patent/WO2018217038A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule

Definitions

  • Resin composition for grinding tool and grinding tool made of said resin composition
  • the present invention relates to a resin composition for grinding tools and a grinding tool made of the resin composition.
  • Grinding tools are tools used to frictionally polish and / or cut articles of various materials such as metals, plastics and ceramics.
  • grinding tools are formed using a composition comprising abrasive particles, fillers and resin binders.
  • the temperature of the grinding zone rises rapidly due to the friction between the grinding tool and the article. If the article to be ground is a hard colorant which is difficult to grind, for example hard metal or hard ceramic, very high temperature frictional heat is generated.
  • the resin binder is thermally decomposed by friction in the grinding process and is bound by the resin binder.
  • Existing abrasive particles and layering agent may be eliminated from the grinding tool.
  • polyimide resins epoxy resins, phenol resins, amino resins and the like, which are known to be excellent in heat resistance, have been applied as the resin binder.
  • the polyimide resin exhibits high heat resistance, but has a disadvantage in that its production cost is high and its manufacturing process is very complicated, resulting in low productivity. And the above Epoxy resins, phenol resins, and the like have limitations that make it difficult to ensure sufficient heat resistance and durability.
  • the present invention is to provide a resin composition for a grinding tool that enables the provision of a grinding tool having excellent heat resistance and durability in an easy processing process.
  • the present invention is to provide a grinding tool made of the resin composition with improved heat resistance and durability.
  • the grinding tool manufactured from the said resin composition is provided.
  • a resin composition for a grinding tool and a grinding tool made of the resin composition according to embodiments of the present invention will be described in detail.
  • 1 to 1 embodies a particular characteristic, region, integer, step, operation, element, and / or component, and other specific characteristics, region, integer, step, operation, element, component, and / or group. It does not exclude the presence or addition of.
  • a resin composition for a grinding tool is provided.
  • a cured resin binder is applied from a composition containing a phthalonitrile compound to a resin composition for a grinding tool including abrasive particles and fillers, the grinding tool has excellent heat resistance and durability through an easy processing process. It was confirmed that it can provide.
  • the resin composition for the grinding tool provided through the present invention can minimize thermal decomposition or thermal breakage of the grinding tool due to frictional heat by including the resin binder, thereby improving durability and life of the grinding tool.
  • the components that may be included in the resin composition for the grinding tool will be described in more detail.
  • the resin composition for grinding tools contains abrasive particles.
  • the abrasive particles are particles that act to polish and / or cut the surface of the article by friction with the article to be ground.
  • the abrasive particles those well known in the art may be applied without particular limitation.
  • the abrasive particles may be metal particles, inorganic particles, metal coated inorganic particles, and the like.
  • the abrasive particles are one or more selected from the group consisting of natural diamond, synthetic diamond, boron nitride, cubic boron nitride (CBN), alumina, silica, silicon carbide, alumina-zirconia, titanium diboride, and boron carbide. It may be a particle, but is not limited thereto.
  • the type and particle diameter of the abrasive particles may be appropriately selected depending on the material or form of the object to be ground.
  • the average particle diameter of the abrasive particles is 0.1 fM Or at least 0.5 im, at least 1 mi at black, at least 10 IM, at least 50 rn at black; And 2000 ⁇ or less, or 1500 or less, or 1000 [M or less, black may be 750 or less.
  • the shape of the abrasive particles is not particularly limited, and may be applied in various forms such as granules, spheres, rods, polygons, pyramids, and the like.
  • the content of the abrasive particles may vary depending on the type of the object to be ground, and preferably 20 to 60% by weight of the total weight of the resin composition for the grinding tool.
  • the abrasive particles is 20 parts by weight 0/0 or more of the total weight of the resin for the grinding tool composition, or 25 wt. 0/0 or more, or 30 wt. 0/0 or more, or 35 weight 0/0 above, black is 40 weight 0/0 or more; And 60 parts by weight 0/0 or less, the black can be included more than 55 weight 0/0 or less, or 50 wt. 0/0.
  • the content of the abrasive grains is preferably not less than 20 wt. 0/0.
  • the abrasive particles to be added in excess so that the abrasive particles be the durability is easily detached from the grinding tool deteriorated
  • the said resin composition for grinding tools contains a layer agent. .
  • the layer agent is added to reinforce physical properties such as the stiffness, compressive strength, bending coefficient, abrasion resistance, thermal conductivity, malleability, grinding, adhesion, and lubrication characteristics of the grinding tool.
  • the layer filler may be a metal layer filler, an inorganic layer filler, an organic filler, a composite filler, or the like.
  • the layering agent is copper, tungsten, iron oxide, copper-tin alloy, silicon carbide, alumina, calcite, limestone, marble, limestone, creolite, silica, silicate, metal carbonate, metal sulfate, metal sulfite, metal oxide Sodium chloride, magnesium chloride, iron disulfide, molybdenum disulfide, antimony trisulfide, graphite, glass fiber, molybdenum disulfide, antimony trisulfide, tungsten sulfide, silane coupling agent, titanate coupling agent, zirconate coupling agent, One or more layering agents selected from the group consisting of zircoaluminate coupling agents and carbon fibers May be, but is not limited thereto.
  • the type and particle size of the filler may be determined in consideration of physical properties of the grinding tool to be reinforced, dispersibility of the filler, and the like.
  • the form of the layering agent is not particularly limited, and may be applied in various forms such as liquid, granules, spheres, rods, polygons, pyramids, fibers, and the like.
  • the content of the layer may be a premise may be determined in consideration of the type and physical properties to the reinforcement of the grinding target goods, preferably 10 to 60 parts by weight 0/0 of the total weight of the resin composition for the polishing tools.
  • the filler is 10 parts by weight 0/0 or more of the total weight of the resin composition for the polishing tools, or 15 parts by weight 0/0 or more, or 20 wt. 0/0 or more; And 60 parts by weight 0/0 or less, or 50 wt. 0/0 or less, the black is 40 wt% or less, and black may be included more than 30 parts by weight 0/0 or less, or 25 wt. 0/0.
  • the amount of the layer premise is preferably not less than 10 wt. 0/0.
  • the filler comprises less than 60 wt. 0/0.
  • the resin composition for grinding tools includes a resin binder cured from a composition containing a phthalonitrile compound.
  • the resin binder is added to impart molding processability to the resin composition for the grinding tool and to stably fix the abrasive particles and the layer filler to the grinding tool.
  • the resin composition for the grinding tool is processed in a state in which the abrasive particles and the filler are dispersed in a matrix of the resin binder.
  • the resin binder enables the provision of the grinding tool in an easy process equivalent to that of a conventional thermosetting or thermoplastic resin binder, without requiring a complicated processing process as compared with a conventional polyimide resin having high heat resistance.
  • the resin binder is a compound cured from a composition containing a phthalonitrile compound, and may be a mixture of a phthalonitrile compound and a curing agent or a prepolymer formed by reaction of the mixture.
  • the prepolymer refers to the resin composition for the grinding tool.
  • the reaction between the phthalonitrile compound and the curing agent occurs to some extent (for example, the so-called polymerization of the A or B stage stage) or the state of the polymerization completely, and exhibits proper fluidity, for example, It may mean a state that can be processed into a grinding tool material as described later.
  • the prepolymer corresponds to a state in which the polymerization of the phthalonitrile compound and the curing agent is somewhat advanced, and the melt viscosity measured at a temperature within a range of about 150 ° C. to 250 ° C. is 100 cP to 50,000 cP, 100 cP. It may mean a state in the range of 10,000 to 10,000 cP, or 100 cP to 5000 cP.
  • the prepolymer may also exhibit excellent curability, low melting temperature and wide process window, like the resin composition for the grinding tool.
  • the processing temperature of the prepolymer may be in the range of 150 ° C to 350 ° C.
  • the processing temperature means a temperature at which the prepolymer exists in a processable state.
  • a processing temperature may be, for example, a melting temperature (T m ) or a glass transition temperature (T g ).
  • T m melting temperature
  • T g glass transition temperature
  • the absolute value of the process window of the prepolymer, i.e. the difference (T c -T p ) between the processing temperature (T p ) and the curing temperature (T c ) of the prepolymer is 3 (rc or more, 5 (rc or more) or It may be greater than or equal to loo ° C.
  • the curing temperature (Tc) may be higher than the processing silver ( ⁇ ⁇ )
  • This range can be achieved by using a prepolymer, for example to prepare a grinding tool as described below.
  • the upper limit of the process window is not particularly limited, but for example, the difference between the processing temperature ( ⁇ ⁇ ) and the degree of hardening silver (T c ) (T c -T p ) may be advantageous. ) May be 400 ° C or less or 300 ° c or less.
  • the kind of phthalonitrile compound that can be applied to the resin binder is not particularly limited, but may be cured with the phthalonitrile compound, for example. 2 or more, or 2 to 20, 2 to 16, or 2 to 12, and 2 black phthalonitrile structure that can form a phthalonitrile resin through reaction with the agent Compounds containing from 8 to 8, or from 2 to 4 can be used.
  • the resin binder may be one in which the composition containing the phthalonitrile compound is cured by at least one curing agent selected from the group consisting of an amine compound, a hydroxy compound, and an imide compound.
  • the amine compound, hydroxy compound and imide compound mean a compound having at least one amino group, hydroxy group or imide group in each molecule.
  • the curing agent may be a compound represented by the following formula (1):
  • M is a tetravalent radical derived from an aliphatic, cycloaliphatic or aromatic compound
  • ⁇ and X 2 are each independently a divalent radical derived from an alkylene group, an alkylidene group or an aromatic compound,
  • eta is a number of 1 or more.
  • the imide-based compound represented by Chemical Formula 1 may include an imide structure in a molecule, so that the resin binder may have excellent heat resistance, but may adversely affect physical properties even when the resin composition for the grinding tool is processed or cured at a high temperature. Do not cause defects such as voids.
  • M is tetravalent from an aliphatic, alicyclic or aromatic compound. It may be a radical. Wherein, in the aliphatic, alicyclic or aromatic compound,
  • Radicals formed by leaving four hydrogen atoms may have a structure in which each carbon atom of the carbonyl group of Formula 1 is connected.
  • alkanes, alkenes, or alkynes straight or branched alkanes, alkenes, or alkynes can be exemplified.
  • alkanes, alkenes, or alkynes having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms may be used.
  • the alkanes, alkenes, or alkynes may be optionally substituted by one or more substituents.
  • Examples of the alicyclic compound include hydrocarbon compounds having a non-aromatic ring structure having 3 to 20 carbon atoms, 3 to 16 carbon atoms, 3 to 12 carbon atoms, 3 to 8 carbon atoms, or 3 to 4 carbon atoms. Such an alicyclic hydrocarbon compound may include at least one hetero atom such as oxygen or nitrogen as a ring constituent atom, and may be optionally substituted with one or more substituents if necessary.
  • Examples of the aromatic compound include benzene, a compound containing benzene, or a derivative of any one of the above.
  • the compound containing benzene may mean a compound having a structure in which two or more benzene rings are condensed while sharing one or two carbon atoms, or are directly connected or connected by an appropriate linker.
  • L i to L 8 in the above examples are each independently a single bond, -0-, an alkylene group, or an alkylidene group; Ari and Ar 2 may each independently be an arylene group.
  • the aromatic compound may include, for example, 6 to 30, 6 to 28, 6 to 27, 6 to 25, 6 to 20 or 6 to 12 carbon atoms. It may be substituted by one or more substituents if necessary.
  • the number of carbon atoms of the said aromatic compound is also the number containing the carbon atom which exists in the linker.
  • M is a tetravalent radical derived from alkanes, alkenes, or alkynes, or represented by any one of the following Formulas 2 to 7. It may be a tetravalent radical derived from a compound.
  • Ri to R 6 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group.
  • Ri to R 8 are each independently hydrogen, an alkyl group, an alkoxy group or an aryl group.
  • R i to R i o are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group
  • Ari and Ar 2 are each independently an arylene group.
  • 1 single bond 1 means a case where an atom is not present in the portion. Therefore, when X in Formula 4 is a single bond, it means a case where no atom is present in the moiety represented by X. In this case, the benzene rings on both sides of X may be directly connected to form a biphenyl structure.
  • the alkylene group or alkylidene group may be substituted or unsubstituted.
  • L 6 and L 8 may be -0-; 1 may be an alkylene group or an alkylidene group having 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms; The alkylene group or alkylidene group may be substituted or unsubstituted.
  • Ar i and Ar 2 may be a phenylene group, in which case L 6 and L 8 may be linked to the ortho, meta or para position of the phenylene, respectively.
  • R i to R 4 are each independently hydrogen, an alkyl group, or an alkoxy group, and two of R ] to R 4 may be linked to each other to form an alkylene group,
  • A is an alkylene group or alkenylene group, wherein the alkylene group or alkenylene group of A may contain one or more oxygen atoms as a hetero atom.
  • R 1 to R 4 are each independently hydrogen, an alkyl group, or It is an alkoxy group, A is an alkylene group.
  • the tetravalent radical derived from the compound represented by Formulas 2 to 7 is formed by directly leaving R 1 to R 10, which is a substituent of Formulas 2 to 7, or black is a substituent which may be present in R 1 to R i o.
  • the hydrogen atom belonging to the alkyl group, the alkoxy group, the aryl group, the alkylene group, or the alkenylene group may be separated and formed.
  • the tetravalent radical is derived from the compound of Formula 3
  • at least one, at least two, at least three or four of R i to R 6 of Formula 3 form a radical, or black is R 1
  • the radicals may be formed by leaving the hydrogen atoms of the alkyl group, alkoxy group, or aryl group present in R 6 to R 6 .
  • Forming a radical in the above may mean that the site is connected to the carbon atom of the carbonyl group of Formula 1 as described above.
  • R i to R i o in Formula 4 each independently represent a hydrogen, an alkyl group, an alkoxy group or an aryl group, at least one, at least two, at least three More than 4 or 4 may form a radical linked to the formula (1)
  • Each of which does not form the radical may be a hydrogen, an alkyl group or an alkoxy group, or may be a hydrogen or an alkyl group.
  • any two of R7 to R9 and any two of R2 to R4 may form the radical, and the other substituents are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group, or a hydrogen, alkyl group, or It may be an alkoxy group or hydrogen or an alkyl group.
  • the compound represented by Chemical Formula 2 may be banzen or 1,2,4,5-tetraalkylbenzene, and the like, but is not limited thereto.
  • the compound represented by Formula 4 may be a biphenyl, or a compound represented by any one of Formulas A to F, but is not limited thereto.
  • cycloalkanes substituted with one or more alkyl groups It may be a compound represented by a cycloalkene having 4 to 8 carbon atoms such as cyclonucleene, or the formula of any one of the following formulas G to I, but is not limited thereto.
  • the compound represented by Chemical Formula 6 may be represented by Chemical Formula J, or a compound _ in which at least one of hydrogen of the compound represented by Chemical Formula J is substituted with an alkyl group may be exemplified, but is not limited thereto.
  • X 1 and X 2 may each independently be a divalent radical derived from an aromatic compound.
  • ⁇ ⁇ and X 2 may each independently be a divalent radical derived from an aromatic compound having 6 to 40 carbon atoms.
  • the divalent radical derived from an aromatic compound may be a divalent radical derived from the aromatic compound mentioned above.
  • ⁇ and X 2 may each independently be a divalent radical derived from a compound represented by any one of Formulas 8 to 10 below.
  • R U to R 16 are each independently hydrogen, an alkyl group alkoxy group, an aryl group, a hydroxy group, or a carboxyl group.
  • R11 to 0 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group,
  • R 21 is hydrogen, an alkyl group, an alkoxy group, or an aryl group;
  • U to are each independently a single bond, -0-, an alkylene group, or an alkylidene group;
  • Ar 3 to Ar 5 are each independently an arylene group.
  • R U to R 2Q are each independently hydrogen, an alkyl group alkoxy group, an aryl group, a hydroxy group, or a carboxyl group.
  • the divalent radical derived from the compound represented by the formulas (8) to (10) is an alkyl group which is formed by directly leaving R 11 to R 20, which is a substituent of the formulas (8) to (10), or a substituent which may be present in R 11 to R 2 o.
  • the hydrogen atom belonging to the alkoxy group, the aryl group, the alkylene group or the alkenylene group may be formed by leaving.
  • the substitution position of the amine group based on the moiety linked to ⁇ in X I of formula (1) is represented by ortho ( ortho, meta or para position, and the substitution position of the amine group based on the site linked to N in X 2 of Formula 1 is also ortho, meta or para (para) location.
  • any one of R 7 to R 9 of Formula 9 and R 2 to R 4 of Formula 9 is connected to the nitrogen atom of Formula 1 To form radicals.
  • Other substituents other than the substituents forming the radicals may each independently be hydrogen, an alkyl group, an alkoxy group or an aryl group, a hydrogen, an alkyl group or an alkoxy group, or may be a hydrogen or an alkyl group.
  • the compound represented by Formula 8 may be exemplified by benzene which may be substituted with at least one hydroxy group or carboxyl group, but is not limited thereto.
  • the compound represented by Formula 9 may be biphenyl which may be substituted with at least one hydroxy group or carboxyl group, a compound which may be substituted with at least one hydroxy group or carboxyl group and represented by any one of Formulas A to F, or Compounds which may be substituted with at least one hydroxy group or carboxyl group and represented by K or M may be exemplified, but are not limited thereto.
  • the compound represented by Chemical Formula 10 may be represented by Chemical Formula N, or a compound in which at least one of hydrogen of the compound represented by Chemical Formula N is substituted with a hydroxy group or a carboxyl group may be exemplified, but is not limited thereto.
  • the alkyl group has 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 carbon unless otherwise specified. It may be an alkyl group of 4 to.
  • the alkyl group may be linear, branched, or cyclic and may be substituted by one or more substituents if necessary.
  • the alkoxy group may be an alkoxy group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms.
  • the alkoxy group may be linear, branched, or cyclic and may be substituted by one or more substituents if necessary.
  • an aryl group may mean a monovalent moiety derived from the aforementioned aromatic compound, unless otherwise specified.
  • an alkylene group or an alkylidene group is an alkylene group or an alkylidene group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms, unless otherwise specified. Can mean.
  • the alkylene group or alkylidene group may be linear, branched, or cyclic.
  • the alkylene group or alkylidene group may be optionally substituted with one or more substituents.
  • substituent which may be optionally substituted with an aliphatic compound, an alicyclic compound, an aromatic compound, an alkyl group, an alkoxy group, an aryl group, an alkylene group, or an alkylidene group, halogen, glyc, such as chlorine or fluorine Epoxy groups, such as a cylyl group, an epoxy alkyl group, a glycidoxy alkyl group, or an alicyclic epoxy group, an acryloyl group, a methacryloyl group, an isocyanate group, a thiol group, an alkyl group, an alkoxy group, an aryl group, etc. can be illustrated, but this is limited to this.
  • n means the number of imide repeating units and is one or more. Specifically, n is one or more, or two or more; And 200 or less, or 150 or less, black is 100 or less, black is 80 or less, or 70 or less, or 60 or less, black is 50 or less, black is 40 or less, or 30 or less, or 20 or less, black is 10 or less, or May be 5 or less.
  • the curing agent may be more preferably applied in that the compound in the formula (1) wherein n is a number of 2 or more, preferably in the range of 2 to 200 to enable the expression of high thermal stability and heat resistance.
  • the compound represented by Chemical Formula 1 may be synthesized according to a known method for synthesizing an organic compound, and the specific manner thereof is not particularly limited.
  • the compound represented by the formula (1) can be formed by dehydration condensation reaction of a dianhydride compound and a diamine compound.
  • the compound represented by the formula (1) has a high boiling point, does not volatilize or decompose at high temperatures, thereby maintaining a stable curability of the resin composition for the grinding tool, adversely affects the physical properties during high temperature processing or curing process It does not form a viable void.
  • the decomposition temperature may be 300 ° C or more, 350 ° C or more, 400 ° C or more or 500 ° C or more.
  • the decomposition silver may mean a temperature at which the decomposition rate of the compound represented by Chemical Formula 1 is maintained in a range of 10% or less, 5% or less, or 1% or less.
  • the upper limit of the decomposition temperature is not particularly limited, but may be, for example, about 1,000 ° C. or less.
  • the compound represented by the formula (1) is melted by the process window (ie, the resin composition for the grinding tool) of the resin composition for the grinding tool by the selection of X 1 or X 2 which is M or a linker of the core. It is possible to easily control the difference between the temperature and the curing temperature, it can act as a curing agent of various physical properties.
  • the resin binder is a composition containing the phthalonitrile compound is cured by the curing agent, the curing agent may be applied in a ratio of 0.02 mol to 1.5 mol relative to 1 mol of the phthalonitrile compound.
  • the curing agent is preferably applied at 0.02 moles or more relative to 1 mole of the phthalonitrile compound.
  • the curing agent is preferably applied in an amount of 1.5 mol or less with respect to 1 mol of the Sanghaphthalonitrile compound.
  • the content of the resin binder is the content of the abrasive particles and the layering agent, It may vary depending on the type of the object to be ground, preferably, may be 10 to 50% by weight of the total weight of the resin composition for the grinding tool ⁇ Specifically, the resin binder 10 weight of the total weight of the resin composition for the grinding tool 0.0 / or more, or 15 wt. 0/0 above, black is 20 parts by weight 0/0 or more; And 50 parts by weight 0/0 or less, or 45 weight 0/0 or less, the black can be included more than 40 parts by weight 0/0. ,
  • the amount of the resin binder is preferably not less than 10 wt. 0/0.
  • the binder resin is preferably included by 50 wt. 0/0.
  • a grinding tool made of the resin composition described above.
  • the grinding tool is a tool used for polishing and / or cutting articles of various materials such as metal, plastic, ceramic, etc. by friction, and is formed using the resin composition described above.
  • the thermal decomposition black of the grinding tool due to frictional heat in the grinding process may minimize thermal damage, thereby exhibiting improved durability and lifespan.
  • the grinding tool may be manufactured by a method well known in the art using the above-described resin composition for grinding tools.
  • the grinding tool may be manufactured by a compression molding process in which the resin composition is placed in an arbitrary mold, compressed at a constant pressure, and then heated.
  • the grinding tool can be made by injection molding (injection molding process), the transfer, a forming process (transfer molding process).
  • the resin composition for grinding tools according to the present invention has a high heat resistance and excellent workability, thereby enabling the provision of a grinding tool showing improved heat resistance and durability.
  • Compound (CA1) of Formula 17 was synthesized by dehydration of diamine and dianhydride.
  • 24 g of 4,4'-oxydianiline ⁇ -oxydianiline and 40 g of NMP (N-methyl-pyrrolidone) were added to a 3-neck RBF (3 neck round bottom flask), and stirred at room temperature to dissolve.
  • the water was cooled in a water bath, and 8.7 g of the compound of Formula 18 was slowly added in three portions and 40 g of NMP was added thereto. When all of the added compound was dissolved, 16 g of toluene was added to the reaction solution for azeotrope.
  • the Dean-Stark unit and the ripple force condenser were installed, and toluene was added to the Dean-Stark unit.
  • 42 mL of pyridine was added as a dehydration condensation catalyst, and the temperature was raised to 170 ° C. and stirred for 3 hours.
  • the water generated as the imide ring was formed was further stirred for 2 hours while being removed by the Dean-Stark apparatus: and the residual toluene and pyridine were removed.
  • the reaction product was cooled to room temperature and precipitated and recovered in methanol.
  • the recovered precipitate was extracted with methanol to remove residual banung water and dried in a vacuum oven to give the compound (CA1) of the formula 17 in a yield of about 85 wt. 0/0.
  • the X-NMR analysis result of the obtained compound of formula 17 (CA1) is shown in FIG. 3.
  • the compound of formula 19 was synthesized by dehydration condensation of diamine and dianhydride.
  • 24 g of 4,4'-oxydianiline (4,4'-oxydianiline) and 50 g of NMP (N-methyl pyrrolidone) were added to a 3-neck RBF (3 neck round bottom flask), and stirred at room temperature to dissolve. I was.
  • the above was cooled by a water bath, and 19.5 g of the compound of Formula 18 was slowly added in three portions and added with 100 g of NMP. When all the added compound was dissolved, 30 g of toluene was added to the reaction solution for azeotrope reaction.
  • is about 3.
  • the compound of formula 20 was synthesized by dehydration of diamine and dianhydride. 8.1 g of m-phenylene diamine and 50 g of N-methyl pyrrolidone (NMP) were added to a 3-neck RBF (3 neck round bottom flask), and stirred at room temperature to dissolve. The above was observed with a water bath, and 26 g of the compound represented by Chemical Formula 21 was gradually divided into three portions and added with 60 g of NMP. When all of the added compound was dissolved, 23 g of toluene was added to the reaction solution for azeotrope reaction. The Dean Stark unit and the reflux condenser were installed and filled with toluene in the Dean Stark unit.
  • NMP N-methyl pyrrolidone
  • is about 3.
  • a resin binder in which the curing agent (CA1) of Preparation Example 4 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN1) of Preparation Example 1 was prepared.
  • Diamond abrasive grain particles having an average particle size of 25 to 100 parts by weight 0/0, 50 parts by weight of copper 0 / a filler., And common summing the resin binder 25% by weight to prepare a resin composition for polishing tools.
  • Example 2 The molding was fired in an oven at 350 ° C. for 6 hours to prepare a grinding layer specimen for a grinding tool.
  • Example 2 The molding was fired in an oven at 350 ° C. for 6 hours to prepare a grinding layer specimen for a grinding tool.
  • a resin binder was prepared in which the curing agent (CA2) of Preparation Example 5 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN1) of Preparation Example 1.
  • the combined copper and 50% weight average particle size of the diamond particles 25 to 100 parts by weight 0/0, the filler in the abrasive grain, and 25% by weight of the binder resin to prepare a resin composition for a common grinding tool.
  • a resin binder was prepared in which the curing agent (CA3) of Preparation Example 6 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN1) of Preparation Example 1.
  • Example 4 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1.
  • Example 4 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1.
  • Example 4 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1.
  • Example 4 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1.
  • a resin binder was prepared in which the curing agent (CA1) of Preparation Example 4 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN2) of Preparation Example 2.
  • the average particle size of 100 / diamond particles as abrasive particles 25 parts by weight 0/0, 50 parts by weight of copper 0/0 to layer premise, and common summing the resin binder 25% by weight to prepare a resin composition for polishing tools.
  • Example 5 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1.
  • Example 5 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1.
  • Example 5 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1.
  • Example 5 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1.
  • a resin binder was prepared in which the curing agent (CA2) of Preparation Example 5 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN2) of Preparation Example 2.
  • a resin binder was prepared in which the curing agent (CA3) of Preparation Example 6 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitium compound (PN2) of Preparation Example 2.
  • Abrasive particles 100 of the diamond particles 25 parts by weight 0 / average particle diameter., 50 parts by weight of copper 0/0 to layer premise, and common summing the resin binder 25% by weight to prepare a resin composition for polishing tools.
  • the average particle diameter of the diamond particles as abrasive particles 100 ⁇ 25 weight 0/0, by adding the copper traces 50 weight 0/0, and a phenol resin 25 wt% of a filler, to prepare a resin composition for polishing tools.
  • the resin composition was put into a mold and cured at 150 ° C. for 30 minutes with a force of 30 MPa in a hot press to obtain a molding.
  • the resin composition is put into a thermoforming mold and the molding temperature is 250 ° C to
  • PN1 to PN2 and CA1 to CA3 compounds obtained in Preparation Examples 1 to 5 were subjected to H-NMR analysis according to the manufacturer's manual using Agilent's 500 MHz NMR equipment. Samples for NMR measurements were prepared by dissolving the compound of interest in dimethyl sulfoxide (dSO) -d6. H-NMR analysis results for each compound are shown in FIGS. 1 to 5. Test Example 2 Evaluation of Thermal Stability
  • thermogravimetric analysis evaluated the thermal stability (degree of pyrolysis) of the grinding layer specimens for the grinding tool, and the results are shown in Table 1 below. Specifically, TGA was performed using the TGA e850 instrument of Mettler-Toledo, and the analysis was performed in an atmosphere of N 2 flow while raising the temperature at a rate of 10 TV minutes from about 25 ° C to 800 ° C for the test specimens. It was. Test Example 3. Evaluation of Heat Resistance
  • Heat resistance of the resin binder for the grinding tool was evaluated by heat deflection temperature (HDT) measurement, and the results are shown in Table 1 below.
  • the resin composition according to Examples 1 to 6 was prepared by a method similar to the process of Comparative Example 1 to which phenol resin was applied, and was higher than that of Comparative Example 2 to which polyimide resin was applied. Productivity was shown.
  • the grinding layer specimens for the grinding tools according to Examples 1 to 6 had relatively high thermal stability as a result of TGA measurement and higher heat resistance as a result of HDT measurement than the specimen of Comparative Example 1.

Abstract

The present invention relates to a resin composition for a grinding tool and a grinding tool manufactured from the resin composition. The resin composition for the grinding tool, according to the present invention, has high heat resistance and excellent processability, thereby enabling the provision of the grinding tool having improved heat resistance and durability.

Description

【발명의 명칭】  [Name of invention]
연삭 공구용 수지 조성물 및 상기 수지 조성물로 제조된 연삭 공구  Resin composition for grinding tool and grinding tool made of said resin composition
【기술분야】 Technical Field
관련 출원과의 상호 인용  Cross Citation with Related Applications
본 출원은 2017년 5월 24 일자 한국 특허 출원 제 10-2017-0064326호 및 2018 년 5 월 23 일자 한국 특허 출원 제 10-2018-0058367 호에 기초한 우선권의 이익을 주장하며, 해당 한국 특허 출원들의 문헌들에 개시된 모든 내용은 본 명세서의 일부로서 포함된다. 본 발명은 연삭 공구용 수지 조성물 및 상기 수지 조성물로 제조된 연삭 공구에 관한 것이다.  This application claims the benefit of priority based on Korean Patent Application No. 10-2017-0064326 dated May 24, 2017 and Korean Patent Application No. 10-2018-0058367 dated May 23, 2018. All content disclosed in the documents is included as part of this specification. The present invention relates to a resin composition for grinding tools and a grinding tool made of the resin composition.
【발명의 배경이 되는 기술】 [Technique to become background of invention]
연삭 공구는 금속 , 플라스틱, 세라믹 등 다양한 소재의 물품을 마찰에 의해 연마 및 /또는 절삭하는데 이용되는 공구이다. 일반적으로 , 연삭 공구는 연마 입자, 충전제 및 수지 결합제를 포함한 조성물을 사용하여 형성된다.  Grinding tools are tools used to frictionally polish and / or cut articles of various materials such as metals, plastics and ceramics. Generally, grinding tools are formed using a composition comprising abrasive particles, fillers and resin binders.
한편, 임의의 연삭 물품에 대한 연삭 공정에서, 연삭 공구와 물품 사이의 마찰로 인해 연삭 영역의 온도가 급격히 상승한다. 연삭 대상 물품이 연삭이 어려운 난색제, 예를 들어 하드 메탈이나 고경도의 세라믹인 경우 매우 높은 온도의 마찰열이 발생한다.  On the other hand, in the grinding process for any abrasive article, the temperature of the grinding zone rises rapidly due to the friction between the grinding tool and the article. If the article to be ground is a hard colorant which is difficult to grind, for example hard metal or hard ceramic, very high temperature frictional heat is generated.
이러한 연삭 영역에서의 온도 상승은 연삭 공구의 열적 파손과 수명 단축을 야기하는 주 요인으로 작용한다ᅳ 예를 들어, 연삭 공정에서의 마찰에 의해 상기 수지 결합제가 열분해되고, 상기 수지 결합제에 의해 결합되어 있던 연마 입자와 층전제가 연삭 공구로부터 탈락될 수 있다.  This increase in temperature in the grinding zone acts as a major factor causing thermal breakage and shortening of the life of the grinding tool. For example, the resin binder is thermally decomposed by friction in the grinding process and is bound by the resin binder. Existing abrasive particles and layering agent may be eliminated from the grinding tool.
연삭 공구의 열적 파손을 최소화하기 위하여, 내열성이 우수한 것으로 알려진 폴리이머드 수지, 에폭시 수지, 페놀 수지, 아미노 수지 등이 상기 수지 결합제로 적용되어왔다.  In order to minimize thermal breakage of the grinding tool, polyimide resins, epoxy resins, phenol resins, amino resins and the like, which are known to be excellent in heat resistance, have been applied as the resin binder.
그런데, 상기 폴리이미드 수지는 고내열성을 나타내지만, 그 제조 비용이 높고 제조 공정이 매우 복잡하여 생산성이 떨어지는 단점이 있다. 그리고, 상기 에폭시 수지, 페놀 수지 등으로는 층분한 내열성과 내구성을 확보하기 어려운 한계가 있다. By the way, the polyimide resin exhibits high heat resistance, but has a disadvantage in that its production cost is high and its manufacturing process is very complicated, resulting in low productivity. And the above Epoxy resins, phenol resins, and the like have limitations that make it difficult to ensure sufficient heat resistance and durability.
【발명의 내용】 [Content of invention]
【해결하고자 하는 과제】  Problem to be solved
본 발명은 손쉬운 가공 공정으로 우수한 내열성과 내구성을 갖는 연삭 공구의 제공을 가능케 하는 연삭 공구용 수지 조성물을 제공하기 위한 것이다. 그리고, 본 발명은 상기 수지 조성물로 제조되어 향상된 내열성과 내구성을 갖는 연삭 공구를 제공하기 위한 것이다.  The present invention is to provide a resin composition for a grinding tool that enables the provision of a grinding tool having excellent heat resistance and durability in an easy processing process. In addition, the present invention is to provide a grinding tool made of the resin composition with improved heat resistance and durability.
【과제의 해결 수단】 [Measures of problem]
본 발명에 따르면,  According to the invention,
연마 입자,  Abrasive particles,
층전제 및  Layer agent and
프탈로니트릴 화합물을 함유한 조성물로부터 경화된 수지 결합제  Cured resin binder from a composition containing a phthalonitrile compound
를 포함한, 연삭 공구용 수지 조성물이 제공된다.  Including, a resin composition for a grinding tool is provided.
또한, 본 발명에 따르면, 상기 수지 조성물로 제조된 연삭 공구가 제공된다. 이하, 발명의 구현 예들에 따른 연삭 공구용 수지 조성물 및 상기 수지 조성물로 제조된 연삭 공구에 대해 상세히 설명하기로 한다.  Moreover, according to this invention, the grinding tool manufactured from the said resin composition is provided. Hereinafter, a resin composition for a grinding tool and a grinding tool made of the resin composition according to embodiments of the present invention will be described in detail.
그에 앞서, 본 명세서에서 명시적인 언급이 없는 한, 전문용어는 단지 특정 실시예를 언급하기 위한 것이며, 본 발명을 한정하는 것을 의도하지 않는다. 본 명세서에서 사용되는 단수 형태들은 문구들이 이와 명백히 반대의 의미를 나타내지 않는 한 복수 형태들도 포함한다.  Prior to this, the terminology is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention unless expressly stated otherwise. As used herein, the singular forms “a”, “an” and “the” include plural forms as well, unless the phrases clearly indicate the opposite.
본 명세서에서 사용되는 1포함1의 의미는 특정 특성 , 영역, 정수, 단계, 동작, 요소 및 /또는 성분을 구체화하며, 다른 특정 특성, 영역, 정수, 단계, 동작, 요소, 성분 및 /또는 군의 존재나 부가를 제외시키는 것은 아니다. I. 연삭 공구용 수지 조성물 As used herein, the meaning of 1 to 1 embodies a particular characteristic, region, integer, step, operation, element, and / or component, and other specific characteristics, region, integer, step, operation, element, component, and / or group. It does not exclude the presence or addition of. I. Resin Compositions for Grinding Tools
발명의 일 구현 예에 따르면,  According to one embodiment of the invention,
연마 입자,  Abrasive particles,
충전제 및  Fillers and
프탈로니트릴 화합물을 함유한 조성물로부터 경화된 수지 결합제  Cured resin binder from a composition containing a phthalonitrile compound
를 포함한, 연삭 공구용 수지 조성물이 제공된다. 본 발명자들의 계속적인 연구 결과, 연마 입자 및 충전제를 포함한 연삭 공구용 수지 조성물에 프탈로니트릴 화합물을 함유한 조성물로부터 경화된 수지 결합제를 적용할 경우 손쉬운 가공 공정을 통해 우수한 내열성과 내구성을 갖는 연삭 공구를 제공할 수 있음이 확인되었다.  Including, a resin composition for a grinding tool is provided. As a result of continuous research by the inventors, when a cured resin binder is applied from a composition containing a phthalonitrile compound to a resin composition for a grinding tool including abrasive particles and fillers, the grinding tool has excellent heat resistance and durability through an easy processing process. It was confirmed that it can provide.
특히, 본 발명을 통해 제공되는 상기 연삭 공구용 수지 조성물은 상기 수지 결합제를 포함함에 따라 마찰열에 의한 연삭 공구의 열분해 혹은 열적 파손을 최소화할 수 있어 연삭 공구가 갖는 내구도와수명의 향상을 가능케 한다. 이하, 상기 연삭 공구용 수지 조성물에 포함될 수 있는 성분들에 대하여 보다 구체적으로 설명한다. 상기 연삭 공구용 수지 조성물은 연마 입자를 포함한다.  In particular, the resin composition for the grinding tool provided through the present invention can minimize thermal decomposition or thermal breakage of the grinding tool due to frictional heat by including the resin binder, thereby improving durability and life of the grinding tool. Hereinafter, the components that may be included in the resin composition for the grinding tool will be described in more detail. The resin composition for grinding tools contains abrasive particles.
상기 연마 입자는 연삭 대상 물품과의 마찰에 의해 상기 물품의 표면을 연마 및 /또는 절삭하는 작용을 하는 입자이다.  The abrasive particles are particles that act to polish and / or cut the surface of the article by friction with the article to be ground.
상기 연마 입자로는 본 발명이 속하는 기술분야에 잘 알려진 것이 특별한 제한 없이 적용될 수 있다. 예를 들어, 상기 연마 입자는 금속 입자, 무기물 입자, 금속 코팅 무기물 입자 등일 수 있다.  As the abrasive particles, those well known in the art may be applied without particular limitation. For example, the abrasive particles may be metal particles, inorganic particles, metal coated inorganic particles, and the like.
구체적으로, 상기 연마 입자는 천연 다이아몬드, 합성 다이아몬드, 질화붕소, 입방정 질화붕소 (CBN), 알루미나, 실리카, 실리콘카바이드, 알루미나- 지르코니아, 티타늄 다이보라이드, 및 보론카바이드로 이루어진 군에서 선택된 1종 이상의 입자일 수 있으나, 이로 제한되는 것은 아니다.  Specifically, the abrasive particles are one or more selected from the group consisting of natural diamond, synthetic diamond, boron nitride, cubic boron nitride (CBN), alumina, silica, silicon carbide, alumina-zirconia, titanium diboride, and boron carbide. It may be a particle, but is not limited thereto.
상기 연마 입자의 종류와 입경은 연삭 대상 물품의 소재 또는 형태 등에 따라 적절히 선택될 수 있다. 예를 들어, 상기 연마 입자의 평균 입경은 0.1 fM 이상, 혹은 0.5 im 이상, 흑은 1 mi 이상, 흑은 10 IM 이상, 흑은 50 rn 이상; 그리고 2000 μιη 이하, 혹은 1500 이하, 혹은 1000 [M 이하, 흑은 750 이하 일 수 있다. The type and particle diameter of the abrasive particles may be appropriately selected depending on the material or form of the object to be ground. For example, the average particle diameter of the abrasive particles is 0.1 fM Or at least 0.5 im, at least 1 mi at black, at least 10 IM, at least 50 rn at black; And 2000 μιη or less, or 1500 or less, or 1000 [M or less, black may be 750 or less.
상기 연마 입자의 형태는 특별히 제한되지 않으며, 과립, 구, 봉, 다각면, 피라미드 등꾀 다양한 형태로 적용될 수 있다.  The shape of the abrasive particles is not particularly limited, and may be applied in various forms such as granules, spheres, rods, polygons, pyramids, and the like.
그리고, 상기 연마 입자의 함량은 연삭 대상 물품의 종류에 따라 달라질 수 있으며, 바람직하게는 상기 연삭 공구용 수지 조성물 전체 중량의 20 내지 60 중량 %일 수 있다. 구체적으로, 상기 연마 입자는 상기 연삭 공구용 수지 조성물 전체 중량의 20 중량0 /0 이상, 혹은 25 중량0 /0 이상, 혹은 30 중량0 /0 이상, 혹은 35 중량0 /0 이상, 흑은 40 중량0 /0 이상; 그리고 60 중량0 /0 이하, 흑은 55 중량0 /0 이하, 혹은 50중량0 /0 이하로 포함될 수 있다. The content of the abrasive particles may vary depending on the type of the object to be ground, and preferably 20 to 60% by weight of the total weight of the resin composition for the grinding tool. Specifically, the abrasive particles is 20 parts by weight 0/0 or more of the total weight of the resin for the grinding tool composition, or 25 wt. 0/0 or more, or 30 wt. 0/0 or more, or 35 weight 0/0 above, black is 40 weight 0/0 or more; And 60 parts by weight 0/0 or less, the black can be included more than 55 weight 0/0 or less, or 50 wt. 0/0.
연삭 작용이 층분히 발현될 수 있도록 하기 위하여, 상기 연마 입자의 함량은 20 중량0 /0 이상인 것이 바람직하다. 다만, 연마 입자가 과량으로 첨가될 경우 연마 입자가 연삭 공구로부터 쉽게 탈락되는 등 내구성이 저하될 수 있으므로, 상기 연마 입자는 60 중량0 /0 이하로 포함되는 것이 바람직하다. 한편, 상기 연삭 공구용 수지 조성물은 층전제를 포함한다. . In order that the grinding operation can not be expressed sufficiently layer, the content of the abrasive grains is preferably not less than 20 wt. 0/0. Where, however, the abrasive particles to be added in excess, so that the abrasive particles be the durability is easily detached from the grinding tool deteriorated, it is preferred that the abrasive particles comprise less than 60 wt. 0/0. In addition, the said resin composition for grinding tools contains a layer agent. .
상기 층전제는 연삭 공구가 나타내는 강성, 압축 강도, 굽힘 계수, 내마모도, 열전도율, 전성, 연삭, 접착, 윤활 특성 등의 물성을 보강하기 위해 첨가된다.  The layer agent is added to reinforce physical properties such as the stiffness, compressive strength, bending coefficient, abrasion resistance, thermal conductivity, malleability, grinding, adhesion, and lubrication characteristics of the grinding tool.
상기 충전제로는 본 발명이 속하는 기술분야에 잘 알려진 것이 특별한 제한 없이 적용될 수 있다. 예를 들어, 상기 층전제는 금속 층전제, 무기 층전제, 유기 충전제, 복합충전제 등일 수 있다. ' As the filler, those well known in the art may be applied without particular limitation. For example, the layer filler may be a metal layer filler, an inorganic layer filler, an organic filler, a composite filler, or the like. '
구체적으로, 상기 층전제는 구리, 텅스텐, 산화철, 구리 -주석 합금, 실리콘카바이드, 알루미나, 방해석, 이회암, 대리석, 석회석, 크리올라이트, 실리카, 실리케이트, 메탈 카보네이트, 메탈 설페이트, 메탈 설파이트, 메탈 옥사이드, 염화 나트륨, 염화 마그네슘, 이황화 철, 이황화 몰리브덴, 삼황화 안티몬, 흑연, 유리 섬유, 이황화 몰리브덴, 삼황화 안티몬, 텅스텐 설파이드, 실란 커플링 에이전트, 티타네이트 커플링 에이전트, 지르코네이트 커플링 에이전트, 지르코알루미네이트 커플링 에이전트, 및 탄소 섬유로 이루어진 군에서 선택된 1종 이상의 층전제일 수 있으나, 이로 제한되는 것은 아니다. Specifically, the layering agent is copper, tungsten, iron oxide, copper-tin alloy, silicon carbide, alumina, calcite, limestone, marble, limestone, creolite, silica, silicate, metal carbonate, metal sulfate, metal sulfite, metal oxide Sodium chloride, magnesium chloride, iron disulfide, molybdenum disulfide, antimony trisulfide, graphite, glass fiber, molybdenum disulfide, antimony trisulfide, tungsten sulfide, silane coupling agent, titanate coupling agent, zirconate coupling agent, One or more layering agents selected from the group consisting of zircoaluminate coupling agents and carbon fibers May be, but is not limited thereto.
상기 충전제의 종류와 입경은 보강하고자 하는 연삭 공구의 물성, 충전제의 분산성 등을 고려하여 결정될 수 있다.  The type and particle size of the filler may be determined in consideration of physical properties of the grinding tool to be reinforced, dispersibility of the filler, and the like.
상기 층전제의 형태는 특별히 제한되지 않으며, 액상, 과립, 구, 봉 , 다각면, 피라미드, 섬유 등의 다양한 형태로 적용될 수 있다.  The form of the layering agent is not particularly limited, and may be applied in various forms such as liquid, granules, spheres, rods, polygons, pyramids, fibers, and the like.
그리고, 상기 층전제의 함량은 연삭 대상 물품의 종류 및 보강하고자 하는 물성 등을 고려하여 결정될 수 있으며, 바람직하게는 상기 연삭 공구용 수지 조성물 전체 중량의 10 내지 60 중량0 /0일 수 있다. 구체적으로, 상기 충전제는 상기 연삭 공구용 수지 조성물 전체 중량의 10 중량0 /0 이상, 혹은 15 중량0 /0 이상, 혹은 20 중량0 /0 이상; 그리고 60 중량0 /0 이하, 혹은 50 중량0 /0 이하, 흑은 40 중량 % 이하, 흑은 30중량0 /0 이하, 혹은 25 중량0 /0 이하로 포함될 수 있다. Then, the content of the layer may be a premise may be determined in consideration of the type and physical properties to the reinforcement of the grinding target goods, preferably 10 to 60 parts by weight 0/0 of the total weight of the resin composition for the polishing tools. Specifically, the filler is 10 parts by weight 0/0 or more of the total weight of the resin composition for the polishing tools, or 15 parts by weight 0/0 or more, or 20 wt. 0/0 or more; And 60 parts by weight 0/0 or less, or 50 wt. 0/0 or less, the black is 40 wt% or less, and black may be included more than 30 parts by weight 0/0 or less, or 25 wt. 0/0.
층전제에 의한 보강 효과가 층분히 발현될 수 있도록 하기 위하여, 상기 층전제의 함량은 10 중량0 /0 이상인 것이 바람직하다. 다만, 충전제가 과량으로 첨가될 경우 연마 효율이 저하되거나 층전제가 연삭 공구로부터 쉽게 탈락되는 등 내구성이 저하될 수 있으므로, 상기 충전제는 60 중량0 /0 이하로 포함되는 것이 바람직히다. 한편, 상기 연삭 공구용 수지 조성물은 프탈로니트릴 화합물을 함유한 조성물로부터 경화된 수지 결합제를 포함한다. In order to ensure that the reinforcing effect by the layer assumptions can be expressed sufficiently layer, the amount of the layer premise is preferably not less than 10 wt. 0/0. However, Hida preferred that the filler, so that the durability may be lowered, etc. When added in excess polishing efficiency may be degraded, or the layer is easily detached from the premise grinding tool, wherein the filler comprises less than 60 wt. 0/0. On the other hand, the resin composition for grinding tools includes a resin binder cured from a composition containing a phthalonitrile compound.
상기 수지 결합제는 상기 연삭 공구용 수지 조성물에 성형 가공성을 부여하고 상기 연마 입자 및 상기 층전제를 연삭 공구에 안정적으로 고정하기 위해 첨가된다. 상기 연삭 공구용 수지 조성물은 상기 수지 결합제를 매트릭스로 상기 연마 입자와 상기 충전제가 분산된 상태로쩨공된다.  The resin binder is added to impart molding processability to the resin composition for the grinding tool and to stably fix the abrasive particles and the layer filler to the grinding tool. The resin composition for the grinding tool is processed in a state in which the abrasive particles and the filler are dispersed in a matrix of the resin binder.
상기 수지 결합제는 고내열성을 갖는 종래의 폴리이미드 수지에 비하여 복잡한 가공 공정이 요구되지 않으면서도, 종래의 열경화성 또는 열가소성 수지 결합제와동등한 정도의 손쉬운 공정으로 연삭 공구의 제공을 가능케 한다.  The resin binder enables the provision of the grinding tool in an easy process equivalent to that of a conventional thermosetting or thermoplastic resin binder, without requiring a complicated processing process as compared with a conventional polyimide resin having high heat resistance.
상기 수지 결합제는 프탈로니트릴 화합물을 함유한 조성물로부터 경화된 화합물로서, 프탈로니트릴 화합물과 경화제의 흔합물 또는 상기 흔합물의 반웅에 의해 형성된 프리폴리머일 수 있다.  The resin binder is a compound cured from a composition containing a phthalonitrile compound, and may be a mixture of a phthalonitrile compound and a curing agent or a prepolymer formed by reaction of the mixture.
여기서, 프리폴리머라 함은, 상기 연삭 공구용 수지 조성물 내에서 프탈로니트릴 화합물과 경화제의 반웅이 어느 정도의 일어난 상태 (예를 들어, 소위 A 또는 B 스테이지 단계의 중합이 일어난 상태)이나, 완전히 중합된 상태에는 이르지 않고, 적절한 유동성을 나타내어, 예를 들어,후술하는 바와 같은 연삭 공구용 소재로의 가공이 가능한 상태를 의미할 수 있다. Here, the prepolymer refers to the resin composition for the grinding tool. The reaction between the phthalonitrile compound and the curing agent occurs to some extent (for example, the so-called polymerization of the A or B stage stage) or the state of the polymerization completely, and exhibits proper fluidity, for example, It may mean a state that can be processed into a grinding tool material as described later.
또한, 상기 프리폴리머는 상기 프탈로니트릴 화합물과 경화제의 중합이 어느 정도 진행된 상태에 해당하는 것으로, 약 150°C 내지 250°C의 범위 내의 온도에서 측정된 용융 점도가 100 cP내지 50,000 cP, 100 cP 내지 10,000 cP, 또는 100 cP 내지 5000 cP의 범위 내에 있는 상태를 의미할 수 있다. 따라서, 상기 프리폴리머 역시 상기 연삭 공구용 수지 조성물과 마찬가지로 우수한 경화성, 낮은 용융 온도 및 넓은 프로세스 윈도우 (process window)를 나타낼 수 있다. 예를 들어, 상기 프리폴리머의 가공 온도는 150°C 내지 350°C의 범위 내일 수 있다. 이때, 가공 온도라 함은 상기 프리폴리머가 가공 가능한 상태로 존재하는 온도를 의미한다. 이러한 가공 온도는, 예를 들어, 용융 온도 (Tm) 또는 유리전이온도 (Tg)일 수 있다. 이러한 경우에 상기 프리폴리머의 프로세스 윈도우, 즉 상기 가공 온도 (Tp)와 상기 프리폴리머의 경화 온도 (Tc)의 차이 (Tc-Tp)의 절대값은 3(rc 이상, 5(rc 이상 또는 loo °c 이상일 수 있다. 하나의 예시에서 상기 경화 온도 (Tc)가 상기 가공 은도 (Τρ)에 비하여 높을 수 있다. 이러한 범위는 프리폴리머를 사용하여, 예를 들어 후술하는 연삭 공구를 제조하는 과정에서 적절한 가공성을 확보하는 것에 유리할 수 있다. 상기에서 프로세스 원도우의 상한은 특별히 제한되는 것은 아니나, 예를 들어, 상기 가공 온도 (Τρ)와 경화 은도 (Tc)의 차이 (Tc-Tp)의 절대값은 400°C 이하 또는 300 °c 이하일 수 있다ᅳ 한편, 상기 수지 결합제에 적용돨 수 있는 프탈로니트릴 화합물의 종류는 특별히 한정되지 않으나, 예를 들어, 상기 프탈로니트릴 화합물로 경화제와의 반웅을 통해 프탈로니트릴 수지를 형성할 수 있는프탈로니트릴 구조를 2개 이상, 혹은 2개 내지 20개, 흑은 2개 내지 16개, 혹은 2개 내지 12개, 흑은 2개 내지 8개, 혹은 2개 내지 4개를 포함하는 화합물이 사용될 수 있다. In addition, the prepolymer corresponds to a state in which the polymerization of the phthalonitrile compound and the curing agent is somewhat advanced, and the melt viscosity measured at a temperature within a range of about 150 ° C. to 250 ° C. is 100 cP to 50,000 cP, 100 cP. It may mean a state in the range of 10,000 to 10,000 cP, or 100 cP to 5000 cP. Thus, the prepolymer may also exhibit excellent curability, low melting temperature and wide process window, like the resin composition for the grinding tool. For example, the processing temperature of the prepolymer may be in the range of 150 ° C to 350 ° C. In this case, the processing temperature means a temperature at which the prepolymer exists in a processable state. Such a processing temperature may be, for example, a melting temperature (T m ) or a glass transition temperature (T g ). In this case the absolute value of the process window of the prepolymer, i.e. the difference (T c -T p ) between the processing temperature (T p ) and the curing temperature (T c ) of the prepolymer, is 3 (rc or more, 5 (rc or more) or It may be greater than or equal to loo ° C. In one example, the curing temperature (Tc) may be higher than the processing silver (Τ ρ ) This range can be achieved by using a prepolymer, for example to prepare a grinding tool as described below. The upper limit of the process window is not particularly limited, but for example, the difference between the processing temperature (Τ ρ ) and the degree of hardening silver (T c ) (T c -T p ) may be advantageous. ) May be 400 ° C or less or 300 ° c or less. Meanwhile, the kind of phthalonitrile compound that can be applied to the resin binder is not particularly limited, but may be cured with the phthalonitrile compound, for example. 2 or more, or 2 to 20, 2 to 16, or 2 to 12, and 2 black phthalonitrile structure that can form a phthalonitrile resin through reaction with the agent Compounds containing from 8 to 8, or from 2 to 4 can be used.
상기 프탈로니트릴 수지의 형성에 적합한 것으로 공지되어 있는 화합물은 다양하게 존재하며, 본 발명에서는 상기와 같은 공지의 화합물이 모두 사용될 수 있다. 하나의 예시에서 화합물의 예로는, 미국 특허 제 4,408,035호, 미국 특허 제 5,003,039호, 미국 특허 제 5,003,078호, 미국 특허 제 5,004,8이호, 미국 특허 제 5,132,396호, 미국 특허 제 5,139,054호, 미국 특허 제 5,208,318호, 미국 특허 제 5,237,045호, 미국 특허 제 5,292,854호 또는 미국 특허 게 5,350,828호 등에서 공지되어 있는 화합물이 예시될 수 있으며, 상기 문헌들에 의한 것 외에도 업계에서 공지되어 있는 다양한 화합물이 상기 예시에 포함될 수 있다. 그리고, 상기 수지 결합제는 상기 프탈로니트릴 화합물을 함유한 조성물이 아민계 화합물, 히드록시계 화합물 및 이미드계 화합물로 이루어진 군에서 선택된 1종 이상의 경화제에 의해 경화된 것일 수 있다. 상기 아민계 화합물, 히드록시계 화합물 및 이미드계 화합물은 각각 분자 내에 적어도 하나의 아미노기, 히드록시기 또는 이미드기를 갖는 화합물을 의미한다. There are various compounds known to be suitable for the formation of the phthalonitrile resin, and in the present invention, all such known compounds may be used. Examples of compounds in one example include US Pat. No. 4,408,035, US Pat. 5,003,039, U.S. Patent 5,003,078, U.S. Patent 5,004,8, U.S. Patent 5,132,396, U.S. Patent 5,139,054, U.S. Patent 5,208,318, U.S. Patent 5,237,045, U.S. Patent 5,292,854 or U.S. Patent Compounds known in US Pat. No. 5,350,828 and the like can be exemplified, and various compounds known in the art can be included in the examples in addition to those described above. The resin binder may be one in which the composition containing the phthalonitrile compound is cured by at least one curing agent selected from the group consisting of an amine compound, a hydroxy compound, and an imide compound. The amine compound, hydroxy compound and imide compound mean a compound having at least one amino group, hydroxy group or imide group in each molecule.
바람직하게는, 상기 경화제는 하기 화학식 1로 표시되는 화합물일 수 있다:  Preferably, the curing agent may be a compound represented by the following formula (1):
[화학식 1]  [Formula 1]
Figure imgf000009_0001
상기 화학식 1에서,
Figure imgf000009_0001
In Chemical Formula 1,
M은 지방족, 지환족 또는 방향족 화합물 유래의 4가 라디칼이고,  M is a tetravalent radical derived from an aliphatic, cycloaliphatic or aromatic compound,
Χΐ 및 X2는 각각 독립적으로 알킬렌기, 알킬리덴기 또는 방향족 화합물 유래의 2가 라디칼이고 , Χΐ and X 2 are each independently a divalent radical derived from an alkylene group, an alkylidene group or an aromatic compound,
η은 1 이상의 수이다.  eta is a number of 1 or more.
상기 화학식 1로 표시되는 이미드계 화합물은 분자 내에 이미드 구조를 포함함으로써, 상기 수지 결합제가 우수한 내열성을 갖도록 하면서도, 상기 연삭 공구용 수지 조성물이 높은 온도에서 가공 또는 경화되는 경우에도 물성에 악영향을 미칠 수 있는 보이드 (void) 등의 결함을 유발시키지 않도록 한다. 상기 화학식 1에서, M은 지방족, 지환족 또는 방향족 화합물 유래의 4가 라디칼일 수 있다. 여기서, 상기 지방족, 지환족 또는 방향족 화합물에서 분자 내The imide-based compound represented by Chemical Formula 1 may include an imide structure in a molecule, so that the resin binder may have excellent heat resistance, but may adversely affect physical properties even when the resin composition for the grinding tool is processed or cured at a high temperature. Do not cause defects such as voids. In Formula 1, M is tetravalent from an aliphatic, alicyclic or aromatic compound. It may be a radical. Wherein, in the aliphatic, alicyclic or aromatic compound,
4개의 수소 원자가 이탈되어 형성된 라디칼이 각각 상기 화학식 1의 카보닐기의 탄소 원자와 연결되는 구조를 가질 수 있다. Radicals formed by leaving four hydrogen atoms may have a structure in which each carbon atom of the carbonyl group of Formula 1 is connected.
구체적으로, 상기 지방족 화합물로는, 직쇄형 또는 분지쇄형인 알칸, 알켄, 또는 알킨이 예시될 수 있다. 상기 지방족 화합물로는, 탄소수 2 내지 20, 탄소수 2 내지 16, 탄소수 2 내지 12, 탄소수 2 내지 8 또는 탄소수 2 내지 4의 알칸, 알켄, 또는 알킨이 사용될 수 있다. 상기 알칸, 알켄, 또는 알킨은 임의로 하나 이상의 치환기에 의해 치환되어 있을 수 있다.  Specifically, as the aliphatic compound, straight or branched alkanes, alkenes, or alkynes can be exemplified. As the aliphatic compound, alkanes, alkenes, or alkynes having 2 to 20 carbon atoms, 2 to 16 carbon atoms, 2 to 12 carbon atoms, 2 to 8 carbon atoms, or 2 to 4 carbon atoms may be used. The alkanes, alkenes, or alkynes may be optionally substituted by one or more substituents.
상기 지환족 화합물로는, 탄소수 3 내지 20, 탄소수 3 내지 16, 탄소수 3 내지 12, 탄소수 3 내지 8 또는 탄소수 3 내지 4의 비방향족 고리 구조를 포함하는 탄화수소 화합물이 예시될 수 있다. 이러한 지환족 탄화수소 화합물은 고리 구성 원자로서, 산소 또는 질소와 같은 헤테로 원자를 적어도 하나 포함할 수도 있으며, 필요한 경우에 임의로 하나 이상의 치환기로 치환되어 있을 수 있다. 상기 방향족 화합물로는, 벤젠, 벤젠을 포함하는 화합물 또는 상기 중 어느 하나의 유도체가 예시될 수 있다. 상기 벤젠을 포함하는 화합물로는, 2개 이상의 벤젠 고리가 하나 또는 2개의 탄소 원자를 공유하면서 축합되어 있거나, 직접 연결된 구조 또는 적절한 링커 (linker)에 의해 연결되어 있는 구조의 화합물을 의미할 수 있다. 상기 2개의 벤젠 고리를 연결하는 것에 적용되는 링커로는, 알킬렌기, 알킬리덴기, -0-, -S-, -C(=0)-, -s(=o)-, -s(=o)2-, -C(=0)-0-U-0- C(O)-, -L2-C(=0)-0-L3-, -L4-0-C(=0)-L5-, 또는 -ΙΛΑ^-ΙΛΑ^-ΙΛ 등이 예시될 수 있다. 상기 예시에서 Li 내지 L8는 각각 독립적으로, 단일 결합, -0-, 알킬렌기, 또는 알킬리덴기이고; Ari 및 Ar2는 각각 독립적으로 아릴렌기일 수 있다. 상기 방향족 화합물은, 예를 들어, 6개 내지 30개, 6개 내지 28개, 6개 내지 27개, 6개 내지 25개, 6개 내지 20개 또는 6개 내자 12개의 탄소 원자를 포함할 수 있고, 필요한 경우에 하나 이상의 치환기에 의해 치환되어 있을 수 있다. 상기 방향족 화합물의 탄소 원자의 수는, 그 화합물이 전술한 링커를 포함하는 경우에, 그 링커에 존재하는 탄소 원자도 포함한수이다. 구체적으로 예를 들어, 상기 화학식 1에서 M은 알칸, 알켄, 또는 알킨 유래의 4가 라디칼이거나, 또는 하기 화학식 2 내지 7 중 어느 하나로 표시되는 화합물 유래의 4가 라디칼일 수 있다. Examples of the alicyclic compound include hydrocarbon compounds having a non-aromatic ring structure having 3 to 20 carbon atoms, 3 to 16 carbon atoms, 3 to 12 carbon atoms, 3 to 8 carbon atoms, or 3 to 4 carbon atoms. Such an alicyclic hydrocarbon compound may include at least one hetero atom such as oxygen or nitrogen as a ring constituent atom, and may be optionally substituted with one or more substituents if necessary. Examples of the aromatic compound include benzene, a compound containing benzene, or a derivative of any one of the above. The compound containing benzene may mean a compound having a structure in which two or more benzene rings are condensed while sharing one or two carbon atoms, or are directly connected or connected by an appropriate linker. . Examples of linkers applied to linking the two benzene rings include an alkylene group, an alkylidene group, -0-, -S-, -C (= 0)-, -s (= o)-, and -s (= o) 2- , -C (= 0) -0-U-0- C (O)-, -L 2 -C (= 0) -0-L 3- , -L 4 -0-C (= 0 ) -L 5- , or -ΙΛΑ ^ -ΙΛΑ ^ -ΙΛ and the like can be exemplified. L i to L 8 in the above examples are each independently a single bond, -0-, an alkylene group, or an alkylidene group; Ari and Ar 2 may each independently be an arylene group. The aromatic compound may include, for example, 6 to 30, 6 to 28, 6 to 27, 6 to 25, 6 to 20 or 6 to 12 carbon atoms. It may be substituted by one or more substituents if necessary. When the compound contains the above-mentioned linker, the number of carbon atoms of the said aromatic compound is also the number containing the carbon atom which exists in the linker. Specifically, for example, in Formula 1, M is a tetravalent radical derived from alkanes, alkenes, or alkynes, or represented by any one of the following Formulas 2 to 7. It may be a tetravalent radical derived from a compound.
[화학식 2]  [Formula 2]
Figure imgf000011_0001
상기 화학식 2에서, Ri 내지 R6은 각각 독립적으로, 수소 , 알킬기, 알콕시기, 또는 아릴기이다.
Figure imgf000011_0001
In Formula 2, Ri to R 6 are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group.
화학식 3]  [Formula 3]
Figure imgf000011_0002
상기 화학식 3에서, Ri 내지 R8은 각각 독립적으로, 수소, 알킬기, 알콕시기 또는 아릴기이다.
Figure imgf000011_0002
In Formula 3, Ri to R 8 are each independently hydrogen, an alkyl group, an alkoxy group or an aryl group.
[화학식 4]  [Formula 4]
Figure imgf000011_0003
Figure imgf000011_0003
상기 화학식 4에서,  In Chemical Formula 4,
Ri 내지 Rio은 각각 독립적으로, 수소, 알킬기, 알콕시기, 또는 아릴기이고, X는 단일 결합, 알킬렌기, 알킬리덴기, -0-, -S-, -c(=o)-, -s(=o)-, -s(=o)2-, - C(=0)-0-U-0-C{=0)-, -L2-C(=0)-0-L3-, -L4-0-C(=0)-L5-, 또는 -L^A^-I -A^-L8- 이며; 여기에서 Li 내지 L8은 각각 독립적으로, 단일 결합, -0-, 알킬렌기, 또는 알킬리덴기이고; Ari 및 Ar2는 각각 독립적으로 아릴렌기이다. 본 명세서에서 1단일 결합1은 그 부분에 원자가 존재하지 않은 경우를 의미한다. 따라서, 상기 화학식 4에서 X가 단일 결합인 경우, X로 표시되는 부분에 원자가 존재하지 않은 경우를 의미하고, 이 경우 X의 양측의 벤젠 고리는 직접 연결되어 비페닐 구조를 형성할 수 있다. R i to R i o are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group, and X is a single bond, an alkylene group, an alkylidene group, -0-, -S-, -c (= o)- , -s (= o)-, -s (= o) 2 -,-C (= 0) -0-U-0-C (= 0)-, -L 2 -C (= 0) -0- L 3- , -L 4 -0-C (= 0) -L 5- , or -L ^ A ^ -I -A ^ -L 8- ; Li to L 8 are each independently a single bond, -0-, an alkylene group, or an alkylidene group; Ari and Ar 2 are each independently an arylene group. In the present specification, 1 single bond 1 means a case where an atom is not present in the portion. Therefore, when X in Formula 4 is a single bond, it means a case where no atom is present in the moiety represented by X. In this case, the benzene rings on both sides of X may be directly connected to form a biphenyl structure.
상기 화학식 4에서,상기 X중에서 -C(=0)-0-U-0-C(=0)-, -L2-C(=0)-0-L3-, 또는 -L4-0-C(=0)-L5-에서 L1 내지 L5는 각각 독립적으로, 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알킬렌기 또는 알킬리펜기일 수 있고; 상기 알킬렌기 또는 알킬리덴기는 치환또는 비치환되어 있을 수 있다.. In Chemical Formula 4, -C (= 0) -0-U-0-C (= 0)-, -L 2 -C (= 0) -0-L 3- , or -L 4 -0 in X. L 1 to L 5 in —C (= 0) -L 5 -may each independently be an alkylene group or an alkylifene group having 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms; The alkylene group or alkylidene group may be substituted or unsubstituted.
또한, 화학식 4의 X 중에서 - ΙΛΑ^-ΙΛΑ^-ΙΛ에서, 상기에서 L6 및 L8은 - 0-일 수 있고; 1 은 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알킬렌기 또는 알킬리덴기일 수 있으며; 상기 알킬렌기 또는 알킬리덴기는 치환 또는 비치환되어 있을 수 있다. 상기 Ari 및 Ar2는 페닐렌기일 수 있고, 이러한 경우에 17을 기준으로 상기 L6 및 L8은 각각 상기 페닐렌의 오소, 메타 또는 파라 위치에 연결되어 있을 수 있다. In addition, in X in Formula 4,--ΙΛΑ ^ -ΙΛΑ ^ -ΙΛ, wherein L 6 and L 8 may be -0-; 1 may be an alkylene group or an alkylidene group having 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms; The alkylene group or alkylidene group may be substituted or unsubstituted. Ar i and Ar 2 may be a phenylene group, in which case L 6 and L 8 may be linked to the ortho, meta or para position of the phenylene, respectively.
5]
Figure imgf000012_0001
상기 화학식 5에서
5]
Figure imgf000012_0001
In Chemical Formula 5
Ri 내지 R4는 각각 독립적으로, 수소, 알킬기, 또는 알콕시기이되, R] 내지 R4 중 2개는 서로 연결되어 알킬렌기를 형성할 수 있고, R i to R 4 are each independently hydrogen, an alkyl group, or an alkoxy group, and two of R ] to R 4 may be linked to each other to form an alkylene group,
A는 알킬렌기 또는 알케닐렌기이되, A의 알킬렌기 또는 알케닐렌기는 헤테로 원자로서 하나 이상의 산소 원자를 포함할 수 있다.  A is an alkylene group or alkenylene group, wherein the alkylene group or alkenylene group of A may contain one or more oxygen atoms as a hetero atom.
Figure imgf000012_0002
Figure imgf000012_0002
화학식 6에서, R1 내지 R4는 각각 독립적으로, 수소, 알킬기, 또는 알콕시기이고 , A는 알킬렌기이다. In Formula 6, R 1 to R 4 are each independently hydrogen, an alkyl group, or It is an alkoxy group, A is an alkylene group.
[화학식 7]  [Formula 7]
Figure imgf000013_0001
Figure imgf000013_0001
알콕시기이다. 상기 화학식 2 내지 7로 표시되는 화합물 유래의 4가 라디칼은, 상기 화학식 2 내지 7의 치환기인 R1 내지 R10이 직접 이탈되어 형성되거나, 흑은 R1 내지 Rio에 존재할 수 있는 치환기인 알킬기, 알콕시기, 아릴기, 알킬렌기 또는 알케닐렌기에 속하는 수소 원자가 이탈되어 형성될 수도 있다. It is an alkoxy group. The tetravalent radical derived from the compound represented by Formulas 2 to 7 is formed by directly leaving R 1 to R 10, which is a substituent of Formulas 2 to 7, or black is a substituent which may be present in R 1 to R i o. The hydrogen atom belonging to the alkyl group, the alkoxy group, the aryl group, the alkylene group, or the alkenylene group may be separated and formed.
예를 들어, 상기 4가 라디칼이 화학식 3의 화합물로부터 유래하는 경우, 화학식 3의 Ri 내지 R6 중 1개 이상, 2개 이상, 3개 이상 또는 4개가 라디칼을 형성하거나, 흑은 상기 R1 내지 R6에 존재하는 알킬기, 알콕시기, 또는 아릴기의 수소 원자가 이탈되어 상기 라디칼이 형성될 수 있다. 상기에서 라디칼을 형성한다는 것은, 상술한 바와 같이 그 부위가 화학식 1의 카보닐기의 탄소 원자에 연결되는 것을 의미할 수 있다. For example, when the tetravalent radical is derived from the compound of Formula 3, at least one, at least two, at least three or four of R i to R 6 of Formula 3 form a radical, or black is R 1 The radicals may be formed by leaving the hydrogen atoms of the alkyl group, alkoxy group, or aryl group present in R 6 to R 6 . Forming a radical in the above may mean that the site is connected to the carbon atom of the carbonyl group of Formula 1 as described above.
또한, 상기 4가 라디칼이 화학식 4의 화합물로부터 유래하는 경우, 화학식 4의 Ri 내지 Rio은 각각 독립적으로,수소, 알킬기, 알콕시기 또는 아릴기이되, 1개 이상, 2개 이상, 3개 이상 또는 4개는 화학식 1에 연결되는 라디칼을 형성할 수 있다ᅳ 상기 라디칼을 형성하지 않는 각각은 수소, 알킬기 또는 알콕시기이거나, 수소 또는 알킬기일 수 있다. 하나의 예시에서 화학식 4에서는 R7 내지 R9 중 어느 2개와 R2 내지 R4 중 어느 2개가 상기 라디칼을 형성할 수 있고, 다른 치환기는 각각 독립적으로 수소, 알킬기, 알콕시기 또는 아릴기이거나, 수소, 알킬기 또는 알콕시기이거나, 또는 수소 또는 알킬기일 수 있다. 더욱 구체적으로 예를 들어, 상기 화학식 2로 표시되는 화합물은 밴젠 또는 1,2,4,5-테트라알킬벤젠 등일 수 있으나, 이로 제한되는 것은 아니다. In addition, when the tetravalent radical is derived from a compound of Formula 4, R i to R i o in Formula 4 each independently represent a hydrogen, an alkyl group, an alkoxy group or an aryl group, at least one, at least two, at least three More than 4 or 4 may form a radical linked to the formula (1) Each of which does not form the radical may be a hydrogen, an alkyl group or an alkoxy group, or may be a hydrogen or an alkyl group. In one example, in Formula 4, any two of R7 to R9 and any two of R2 to R4 may form the radical, and the other substituents are each independently hydrogen, an alkyl group, an alkoxy group, or an aryl group, or a hydrogen, alkyl group, or It may be an alkoxy group or hydrogen or an alkyl group. More specifically, for example, the compound represented by Chemical Formula 2 may be banzen or 1,2,4,5-tetraalkylbenzene, and the like, but is not limited thereto.
상기 화학식 4로 표시되는 화합물은 비페닐이나, 또는 하기 화학식 A 내지 F 중 어느 하나의 화학식으로 표시되는 화합물일 수 있으나, 이로 제한되는 것은 아니다:  The compound represented by Formula 4 may be a biphenyl, or a compound represented by any one of Formulas A to F, but is not limited thereto.
Figure imgf000014_0001
Figure imgf000014_0002
Figure imgf000014_0001
Figure imgf000014_0002
[화학식 F]
Figure imgf000014_0003
상기 화학식 5로 표시되는 화합물은 사이클로핵산 등과
Formula F]
Figure imgf000014_0003
Compound represented by the formula (5) is cyclonucleic acid and the like
8의 사이클로알칸, 하나 이상의 알킬기로 치환되어 사이클로핵센 등과 같은 탄소수 4 내지 8의 사이클로알켄, 또는 하기 화학식 G 내지 I 중 어느 하나의 화학식으로 표시되는 화합물일 수 있으나, 이로 제한되는 것은 아니다. 8 cycloalkanes substituted with one or more alkyl groups It may be a compound represented by a cycloalkene having 4 to 8 carbon atoms such as cyclonucleene, or the formula of any one of the following formulas G to I, but is not limited thereto.
Figure imgf000015_0001
Figure imgf000015_0002
Figure imgf000015_0001
Figure imgf000015_0002
I]
Figure imgf000015_0003
상기 화학식 6으로 표시되는 화합물은 하기 화학식 J로 표시되거나, 또는 하기 화학식 J로 표시되는 화합물의 수소 중 적어도 하나가 알킬기로 치환되어 있는 화합- _이 예시될 수 있으나, 이로 제한되는 것은 아니다.
I]
Figure imgf000015_0003
The compound represented by Chemical Formula 6 may be represented by Chemical Formula J, or a compound _ in which at least one of hydrogen of the compound represented by Chemical Formula J is substituted with an alkyl group may be exemplified, but is not limited thereto.
Figure imgf000015_0004
한편, 상기 화학식 1에서, X1 및 X2는 각각 독립적으로 , 방향족 화합물 유래의 2가 라디칼일 수 있다. 예를 들어, Χΐ 및 X2는 각각 독립적으로, 탄소수 6 내지 40의 방향족 화합물 유래의 2가 라디칼일 수 있다. 여기서, 방향족 화합물 유래의 2가 라디칼은 전술한 방향족 화합물 유래의 2가 라디칼일 수 있다.
Figure imgf000015_0004
Meanwhile, in Chemical Formula 1, X 1 and X 2 may each independently be a divalent radical derived from an aromatic compound. For example, Χ ΐ and X 2 may each independently be a divalent radical derived from an aromatic compound having 6 to 40 carbon atoms. Here, the divalent radical derived from an aromatic compound may be a divalent radical derived from the aromatic compound mentioned above.
구체적으로 예를 들어, χι 및 X2는 각각 독립적으로, 하기 화학식 8 내지 10 중 어느 하나로 표시되는 화합물 유래의 2가 라디칼일 수 있다.
Figure imgf000016_0001
상기 화학식 8에서, RU 내지 R16은 각각 독립적으로, 수소, 알킬기 알콕시기, 아릴기, 히드록시기, 또는 카르복실기이다.
Specifically, for example, χι and X 2 may each independently be a divalent radical derived from a compound represented by any one of Formulas 8 to 10 below.
Figure imgf000016_0001
In Formula 8, R U to R 16 are each independently hydrogen, an alkyl group alkoxy group, an aryl group, a hydroxy group, or a carboxyl group.
Figure imgf000016_0002
Figure imgf000016_0002
상기 화학식 9에서,  In Chemical Formula 9,
R11 내지 0은 각각 독립적으로, 수소, 알킬기, 알콕시기, 아릴기, 히드록시기, 또는 카르복실기이고,  R11 to 0 are each independently hydrogen, an alkyl group, an alkoxy group, an aryl group, a hydroxy group, or a carboxyl group,
X1은 단일 결합, 알킬렌기, 알킬리덴기, -0-, -S-, -C(=0)-, -NR21-, -S(=0)-, - S(=0)2-, -L9-Ar3-U0- 또는 LU-Ar ^-A -L13- 이며; 여기에서 R21은 수소, 알킬기, 알콕시기, 또는 아릴기이고; U 내지 은 각각 독립적으로, 단일 결합, -0-, 알킬렌기, 또는 알킬리덴기이고; Ar3 내지 Ar5는 각각 독립적으로 아릴렌기이다. X 1 is a single bond, an alkylene group, an alkylidene group, -0-, -S-, -C (= 0)-, -NR 21- , -S (= 0)-, -S (= 0) 2- , -L 9 -Ar 3 -U 0 -or L U -Ar ^ -A -L 13- ; R 21 is hydrogen, an alkyl group, an alkoxy group, or an aryl group; U to are each independently a single bond, -0-, an alkylene group, or an alkylidene group; Ar 3 to Ar 5 are each independently an arylene group.
[화학식 1이 . [Formula 1 is .
Figure imgf000016_0003
상기 화학식 10에서, RU 내지 R2Q은 각각 독립적으로, 수소, 알킬기 알콕시기, 아릴기, 히드록시기,또는 카르복실기이다. 상가 화학식 8 내지 10으로 표시되는 화합물 유래의 2가 라디칼은, 상기 화학식 8 내지 10의 치환기인 R11 내지 R20이 직접 이탈되어 형성되거나, 혹은 R11 내지 R2o에 존재할 수 있는 치환기인 알킬기, 알콕시기, 아릴기, 알킬렌기 또는 알케닐렌기에 속하는 수소 원자가 이탈되어 형성될 수도 있다.
Figure imgf000016_0003
In Formula 10, R U to R 2Q are each independently hydrogen, an alkyl group alkoxy group, an aryl group, a hydroxy group, or a carboxyl group. The divalent radical derived from the compound represented by the formulas (8) to (10) is an alkyl group which is formed by directly leaving R 11 to R 20, which is a substituent of the formulas (8) to (10), or a substituent which may be present in R 11 to R 2 o. The hydrogen atom belonging to the alkoxy group, the aryl group, the alkylene group or the alkenylene group may be formed by leaving.
예를 들어, 상기 2가 라디칼이 상기 화학식 8로 표시되는 화합물로부터 유래하고, 그 예로 페닐렌인 경우, 화학식 1의 XI에서 Ν에 연결되는 부위를 기준으로 한 아민기의 치환 위치는 오소 (ortho), 메타 (meta) 또는 파라 (para) 위치일 수 있고, 화학식 1의 X2에서 N에 연결되는 부위를 기준으로 한 아민기의 치환 위치는 역시 오소 (ortho), 메타 (meta) 또는 파라 (para) 위치일 수 있다. For example, when the divalent radical is derived from the compound represented by the formula (8), for example phenylene, the substitution position of the amine group based on the moiety linked to Ν in X I of formula (1) is represented by ortho ( ortho, meta or para position, and the substitution position of the amine group based on the site linked to N in X 2 of Formula 1 is also ortho, meta or para (para) location.
또한, 상기 2가 라디칼이 상기 화학식 9로 표시되는 화합물로부터 유래하는 경우, 화학식 9의 R7 내지 R9 중 어느 하나와 화학식 9의 R2 내지 R4중 어느 하나가 화학식 1의 질소 원자에 연결되는 라디칼을 형성할 수 있다. 상기 라디칼을 형성하는 치환기를 제외한 다른 치환기는 각각 독립적으로 수소, 알킬기, 알콕시기 또는 아릴기이거나, 수소, 알킬기 또는 알콕시기이거나, 또는 수소 또는 알킬기일 수 있다. 더욱 구체적으로 예를 들어, 상기 화학식 8로 표시되는 화합물은 적어도 하나의 히드록시기 또는 카복실기로 치환되어 있을 수 있는 벤젠이 예시될 수 있으나, 이로 제한되는 것은 아니다. In addition, when the divalent radical is derived from the compound represented by Formula 9 , any one of R 7 to R 9 of Formula 9 and R 2 to R 4 of Formula 9 is connected to the nitrogen atom of Formula 1 To form radicals. Other substituents other than the substituents forming the radicals may each independently be hydrogen, an alkyl group, an alkoxy group or an aryl group, a hydrogen, an alkyl group or an alkoxy group, or may be a hydrogen or an alkyl group. More specifically, for example, the compound represented by Formula 8 may be exemplified by benzene which may be substituted with at least one hydroxy group or carboxyl group, but is not limited thereto.
상기 화학식 9로 표시되는 화합물은 적어도 하나의 히드록시기 또는 카복실기로 치환되어 있을 수 있는 비페닐, 상기 화학식 A 내지 F 중 어느 하나로 표시되면서 적어도 하나의 히드록시기 또는 카복실기로 치환되어 있을 수 있는 화합물, 또는 하기 화학식 K 또는 M으로 표시되면서 적어도 하나의 히드록시기 또는 카복실기로 치환되어 있을 수 있는 화합물이 예시될 수 있으나, 이에 제한되는 것은 아니다.  The compound represented by Formula 9 may be biphenyl which may be substituted with at least one hydroxy group or carboxyl group, a compound which may be substituted with at least one hydroxy group or carboxyl group and represented by any one of Formulas A to F, or Compounds which may be substituted with at least one hydroxy group or carboxyl group and represented by K or M may be exemplified, but are not limited thereto.
[화학식 K] [Formula K]
Figure imgf000018_0001
Figure imgf000018_0002
Figure imgf000018_0001
Figure imgf000018_0002
Figure imgf000018_0003
상기 화학식 10으로 표시되는 화합물은 하기 화학식 N으로 표시되거나, 또는 하기 화학식 N으로 표시되는 화합물의 수소 중 적어도 하나가 히드록시기 또는 카복실기로 치환되어 있는 화합물이 예시될 수 있으나, 이에 제한되는 것은 아니다.
Figure imgf000018_0003
The compound represented by Chemical Formula 10 may be represented by Chemical Formula N, or a compound in which at least one of hydrogen of the compound represented by Chemical Formula N is substituted with a hydroxy group or a carboxyl group may be exemplified, but is not limited thereto.
Figure imgf000018_0004
본 명세서에 있어서, 알킬기는 특별히 달리 규정하지 않는 한, 탄소수 1 내지 20, 탄소수 1 내지 16, 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알킬기일 수 있다. 상기 알킬기는 직쇄형 , 분지쇄형, 또는 고리형일 수 있으며, 필요한 경우에 하나 이상의 치환기에 의해 치환되어 있을 수 있다.
Figure imgf000018_0004
In the present specification, the alkyl group has 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 carbon unless otherwise specified. It may be an alkyl group of 4 to. The alkyl group may be linear, branched, or cyclic and may be substituted by one or more substituents if necessary.
본 명세서에 있어서, 알콕시기는 특별히 달리 규정하지 않는 한, 탄소수 1 내지 20, 탄소수 1 내지 16, 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알콕시기일 수 있다. 상기 알콕시기는 직쇄형, 분지쇄형, 또는 고리형일 수 있으며, 필요한 경우에 하나 이상의 치환기에 의해 치환되어 있을 수 있다. 본 명세서에 있어서, 아릴기는 특별히 달리 규정하지 않는 한, 전술한 방향족 화합물로부터 유래된 1가 잔기를 의미할 수 있다.  In the present specification, unless otherwise specified, the alkoxy group may be an alkoxy group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms. The alkoxy group may be linear, branched, or cyclic and may be substituted by one or more substituents if necessary. In the present specification, an aryl group may mean a monovalent moiety derived from the aforementioned aromatic compound, unless otherwise specified.
본 명세서에 있어서, 알킬렌기 또는 알킬리덴기는 특별히 달리 규정하지 않는 한, 탄소수 1 내지 20, 탄소수 1 내지 16, 탄소수 1 내지 12, 탄소수 1 내지 8, 또는 탄소수 1 내지 4의 알킬렌기 또는 알킬리덴기를 의미할 수 있다. 상기 알킬렌기 또는 알킬리덴기는 직쇄형, 분지쇄형, 또는 고리형일 수 있다. 또한, 상기 알킬렌기 또는 알킬리덴기는 임의적으로 하나 이상의 치환기로 치환되어 있을 수 있다.  In the present specification, an alkylene group or an alkylidene group is an alkylene group or an alkylidene group having 1 to 20 carbon atoms, 1 to 16 carbon atoms, 1 to 12 carbon atoms, 1 to 8 carbon atoms, or 1 to 4 carbon atoms, unless otherwise specified. Can mean. The alkylene group or alkylidene group may be linear, branched, or cyclic. In addition, the alkylene group or alkylidene group may be optionally substituted with one or more substituents.
본 명세서에 있어서, 지방족 화합물, 지환족 화합물, 방향족 화합물, 알킬기, 알콕시기, 아릴기, 알킬렌기, 또는 알킬리덴기 등에 임의적으로 치환되어 있을 수 있는 치환기로는, 염소 또는 불소 등의 할로겐, 글리시딜기, 에폭시알킬기, 글리시독시알킬기 또는 지환식 에폭시기 등의 에폭시기, 아크릴로일기, 메타크릴로일기, 이소시아네이트기, 티을기, 알킬기, 알콕시기, 또는 아릴기 등이 예시될 수 있으나, 이로 제한되는 것은 아니다. 한편, 상기 화학식 1에서, n은 이미드 반복 단위의 개수를 의미하며, 1 이상의 수이다. 구체적으로, 상기 n은 1 이상, 혹은 2 이상; 그리고 200 이하, 혹은 150 이하, 흑은 100 이하, 흑은 80 이하, 혹은 70 이하, 혹은 60 이하, 흑은 50 이하, 흑은 40 이하,혹은 30 이하, 혹은 20 이하, 흑은 10 이하, 혹은 5 이하일 수 있다.  In the present specification, as the substituent which may be optionally substituted with an aliphatic compound, an alicyclic compound, an aromatic compound, an alkyl group, an alkoxy group, an aryl group, an alkylene group, or an alkylidene group, halogen, glyc, such as chlorine or fluorine Epoxy groups, such as a cylyl group, an epoxy alkyl group, a glycidoxy alkyl group, or an alicyclic epoxy group, an acryloyl group, a methacryloyl group, an isocyanate group, a thiol group, an alkyl group, an alkoxy group, an aryl group, etc. can be illustrated, but this is limited to this. It doesn't happen. Meanwhile, in Chemical Formula 1, n means the number of imide repeating units and is one or more. Specifically, n is one or more, or two or more; And 200 or less, or 150 or less, black is 100 or less, black is 80 or less, or 70 or less, or 60 or less, black is 50 or less, black is 40 or less, or 30 or less, or 20 or less, black is 10 or less, or May be 5 or less.
특히, 상기 경화제는 상기 화학식 1에서 상기 n이 2 이상, 바람직하게는 2 내지 200 범위 내의 수인 화합물인 것이 높은 열안정성과 내열성의 발현을 가능하게 한다는 점에서 보다 바람직하게 적용될 수 있다. 한편, 상기 화학식 1로 표시되는 화합물은 공지의 유기 화합물의 합성법에 따라 합성할 수 있으며, 그 구체적인 방식은 특별히 제한되지 않는다. 예를 들어, 화학식 1로 표시되는 화합물은, 디안하이드라이드 (dianhydride) 화합물과 디아민 화합물의 탈수 축합 반웅 등에 의해 형성할 수 있다. In particular, the curing agent may be more preferably applied in that the compound in the formula (1) wherein n is a number of 2 or more, preferably in the range of 2 to 200 to enable the expression of high thermal stability and heat resistance. Meanwhile, the compound represented by Chemical Formula 1 may be synthesized according to a known method for synthesizing an organic compound, and the specific manner thereof is not particularly limited. For example, the compound represented by the formula (1) can be formed by dehydration condensation reaction of a dianhydride compound and a diamine compound.
또한, 상기 화학식 1로 표시되는 화합물은 높은 비점을 가져서, 고온에서 휘발 내지는 분해되지 않으며, 이에 따라 상기 연삭 공구용 수지 조성물의 경화성이 안정적으로 유지되면서도, 고온의 가공 내지는 경화 과정에서 물성에 악영향을 줄 수 있는 보이드 (void)를 형성하지 않는다.  In addition, the compound represented by the formula (1) has a high boiling point, does not volatilize or decompose at high temperatures, thereby maintaining a stable curability of the resin composition for the grinding tool, adversely affects the physical properties during high temperature processing or curing process It does not form a viable void.
일 예에 따르면, 상기 화학식 1로 표시되는 화합물은, 분해 온도가 300°C 이상, 350 °C 이상, 400°C 이상 또는 500°C 이상일 수 있다. 이때 분해 은도는, 상기 화학식 1로 표시되는 화합물의 분해율이 10% 이하, 5% 이하 또는 1% 이하의 범위로 유지되는 온도를 의미할 수 있다. 상기 분해 온도의 상한은 특별히 제한되지 않으나, 예를 들어, 약 1,000°C 이하일 수 있다. According to one embodiment, the compound represented by Formula 1, the decomposition temperature may be 300 ° C or more, 350 ° C or more, 400 ° C or more or 500 ° C or more. In this case, the decomposition silver may mean a temperature at which the decomposition rate of the compound represented by Chemical Formula 1 is maintained in a range of 10% or less, 5% or less, or 1% or less. The upper limit of the decomposition temperature is not particularly limited, but may be, for example, about 1,000 ° C. or less.
또한, 상기 화학식 1로 표시되는 화합물은, 코어의 M이나 링커인 X1 또는 X2의 선택에 의하여 상기 연삭 공구용 수지 조성물 자체의 프로세스 윈도우 (process window), 즉 상기 연삭 공구용 수지 조성물의 용융 온도와 경화 온도의 차이를 용이하게 조절할 수 있어서, 다양한 물성의 경화제로서 작용할 수 있다. 상술한 바와 같이, 상기 수지 결합제는 상기 프탈로니트릴 화합물을 함유한 조성물이 상기 경화제에 의해 경화된 것으로서, 상기 경화제는 상기 프탈로니트릴 화합물 1 몰 대비 0.02몰 내지 1.5 몰의 비율로 적용될 수 있다. 상기 프탈로니트릴 화합물이 충분히 경화되어 수지 결합제를 형성할 수 있도록 하기 위하여, 상기 경화제는 상기 프탈로니트릴 화합물 1 몰 대비 0.02 몰 이상으로 적용되는 것이 바람직하다. 다만, 경화제가 과량으로 적용될 경우 상기 수지 결합제를 포함하는 연삭 공구용 수지 조성물의 프로세스 원도우가 좁아질 수 있으므로, 상기 경화제는 상가프탈로니트릴 화합물 1 몰 대비 1.5 몰 이하로 적용되는 것이 바람직하다. 그리고, 상기 수지 결합제의 함량은 상기 연마 입자 및 층전제의 함량, 연삭 대상 물품의 종류 등에 따라 달라질 수 있으며, 바람직하게는 상기 연삭 공구용 수지 조성물 전체 중량의 10 내지 50 중량 %일 수 있다ᅳ 구체적으로, 상기 수지 결합제는 상기 연삭 공구용 수지 조성물 전체 중량의 10 중량0 /。 이상, 혹은 15 중량0 /0 이상, 흑은 20 중량0 /0 이상; 그리고 50 중량0 /0 이하, 혹은 45 중량0 /0 이하, 흑은 40 중량0 /0 이하로 포함될 수 있다. , In addition, the compound represented by the formula (1) is melted by the process window (ie, the resin composition for the grinding tool) of the resin composition for the grinding tool by the selection of X 1 or X 2 which is M or a linker of the core. It is possible to easily control the difference between the temperature and the curing temperature, it can act as a curing agent of various physical properties. As described above, the resin binder is a composition containing the phthalonitrile compound is cured by the curing agent, the curing agent may be applied in a ratio of 0.02 mol to 1.5 mol relative to 1 mol of the phthalonitrile compound. In order for the phthalonitrile compound to be sufficiently cured to form a resin binder, the curing agent is preferably applied at 0.02 moles or more relative to 1 mole of the phthalonitrile compound. However, since the process window of the resin composition for the grinding tool including the resin binder may be narrowed when an excessive amount of the curing agent is applied, the curing agent is preferably applied in an amount of 1.5 mol or less with respect to 1 mol of the Sanghaphthalonitrile compound. And, the content of the resin binder is the content of the abrasive particles and the layering agent, It may vary depending on the type of the object to be ground, preferably, may be 10 to 50% by weight of the total weight of the resin composition for the grinding tool 공구 Specifically, the resin binder 10 weight of the total weight of the resin composition for the grinding tool 0.0 / or more, or 15 wt. 0/0 above, black is 20 parts by weight 0/0 or more; And 50 parts by weight 0/0 or less, or 45 weight 0/0 or less, the black can be included more than 40 parts by weight 0/0. ,
상기 연삭 공구가 목표로 하는 내열성을 나타낼 수 있도록 하면서도, 상기 연마 입자와 충전제가 연삭 공구에 층분히 결합되어 있을 수 있도록 하기 위하여, 상기 수지 결합제의 함량은 10 중량0 /0 이상인 것이 바람직하다. 다만, 수지 결합제가 과량으로 첨가될 경우 연마 효율이 저하될 수 있으므로, 상기 수지 결합제는 50 중량0 /0 이하로 포함되는 것이 바람직하다. In order to be able to be so while the grinding tool can exhibit a heat resistance aiming, wherein the abrasive particles and filler is sufficiently bonded to the floor grinding tools, the amount of the resin binder is preferably not less than 10 wt. 0/0. However, since the resin-bonded grinding efficiency it can be lowered if I is added in an excessive amount, the binder resin is preferably included by 50 wt. 0/0.
II. 연삭 공구 II. Grinding tools
발명의 다른 일 구현 예에 따르면, 상술한 수지 조성물로 제조된 연삭 공구가 제공된다.  According to another embodiment of the invention, there is provided a grinding tool made of the resin composition described above.
상기 연삭 공구는 금속, 플라스틱, 세라믹 등 다양한 소재의 물품을 마찰에 의해 연마 및 /또는 절삭하는데 이용되는 공구로서, 상술한 수지 조성물을 사용하여 형성된다.  The grinding tool is a tool used for polishing and / or cutting articles of various materials such as metal, plastic, ceramic, etc. by friction, and is formed using the resin composition described above.
특히, 상기 연삭 공구는 상술한 연삭 공구용 수지 조성물에 의해 제조됨에 따라 연삭 공정에서의 마찰열에 의한 연삭 공구의 열분해 흑은 열적 파손이 최소화될 수 있어 향상된 내구도와수명을 나타낼 수 있다.  In particular, as the grinding tool is manufactured by the resin composition for the grinding tool described above, the thermal decomposition black of the grinding tool due to frictional heat in the grinding process may minimize thermal damage, thereby exhibiting improved durability and lifespan.
상기 연삭 공구는 상술한 연삭 공구용 수지 조성물을 사용하여 본 발명이 속하는 기술분야에 잘 알려진 방법에 의해 제조될 수 있다.  The grinding tool may be manufactured by a method well known in the art using the above-described resin composition for grinding tools.
예를 들어, 상기 연삭 공구는 상기 수지 조성물을 임의의 몰드 (mold)에 넣고 일정 압력으로 압축한 후 열을 가하는 압축 성형 공정 (compression molding process)에 의해 제조될 수 있다. 또한, 상기 연삭 공구는 사출 성형 공정 (injection molding process), 트랜스퍼' 성형 공정 (transfer molding process) 등에 의해 제조될 수 있다. 【발명의 효과】 For example, the grinding tool may be manufactured by a compression molding process in which the resin composition is placed in an arbitrary mold, compressed at a constant pressure, and then heated. In addition, the grinding tool can be made by injection molding (injection molding process), the transfer, a forming process (transfer molding process). 【Effects of the Invention】
본 발명에 따른 연삭 공구용 수지 조성물은 높은 내열성과 우수한 가공성을 가져, 향상된 내열성과 내구성을 나타내는 연삭 공구의 제공을 가능케 한다.  The resin composition for grinding tools according to the present invention has a high heat resistance and excellent workability, thereby enabling the provision of a grinding tool showing improved heat resistance and durability.
【도면의 간단한 설명】 [Brief Description of Drawings]
도 1 은 본 발명의 제조예 1 에 따른 화합물 (PN1)에 대한 iH-NMR 스펙트럼이다 1 is i H-NMR spectrum of Compound (PN1) according to Preparation Example 1 of the present invention.
도 2 는 본 발명의 제조예 2 에 따른 화합물 (PN2)에 대한 iH-NMR 스펙트럼이다. 2 is i H-NMR spectrum of Compound (PN2) according to Preparation Example 2 of the present invention.
도 3 은 본 따른 화합물 (CA1)에 대한 1H-NMR 스펙트럼이다.  3 is a 1 H-NMR spectrum of the compound (CA1) according to the present invention.
도 4 는 본 따른 화합물 (CA2)에 대한 H-NMR 스펙트럼이다.  4 is an H-NMR spectrum of the compound (CA2) according to the present invention.
도 5 는 본 따른 화합물 (CA3)에 대한 H-NMR 스펙트럼이다.  5 is an H-NMR spectrum of the compound (CA3) according to the present invention.
【발명을 실시하기 위한 구체적인 내용】 [Specific contents to carry out invention]
이하, 발명의 이해를 돕기 위하여 바람직한 실시예들을 제시한다. 그러나 하기의 실시예들은 발명을 예시하기 위한 것알 뿐, 발명을 이들만으로 한정하는 것은 아니다. 제조예 1. 프탈로니트릴 화합물 (PN1ᅵ의 합성  Hereinafter, preferred embodiments will be presented to aid in understanding the invention. However, the following examples are only intended to illustrate the invention, not limited to the invention only. Preparation Example 1 Synthesis of Phtharonitrile Compound (PN1)
하기 화학식 11의 화합물 (PN1)을 다음의 방식으로 합성하였다.  Compound (PN1) of formula 11 was synthesized in the following manner.
하기 화학식 12의 화합물 32.7 g 및 120 g의 DMF(dimethyl formamide)를 32.7 g and 120 g of DMF (dimethyl formamide)
3-neck RBF(3 neck round bottom flask)에 투입하고,상온에서 교반하여 용해시켰다. 이어서 하기 화학식 13의 화합물 51.9 g을 추가하고, DMF 50 g을 추가한 후에 교반하여 용해시켰다. 이어서 탄산칼륨 62.2 g 및 DMF 50 g을 함께 투입하고, 교반하면서 온도를 85° C까지 승온시켰다. 상기 상태에서 약 5 시간 정도 반웅시킨 후에 상온까지 넁각시켰다. 넁각된 반웅 용액을 0.2N 농도의 염산 수용액에 부어 중화 침전시키고, 필터링 후에 물로 세척하였다. 그 후, 필터링된 반웅물을 100°C의 진공 오븐에서 1일 건조하고, 물과 잔류 용매를 제거한 후에 하기 화학식 11의 화합물 (PN1)을 약 80 중량 %의 수율로 수득하였다. 수득한 화학식 11의 화합물 (PN1)에 대한 H-NMR분석 결과를 도 1에 나타내었다. Into a 3-neck RBF (3 neck round bottom flask) was dissolved by stirring at room temperature. Subsequently, 51.9 g of the compound represented by the following Chemical Formula 13 was added, and 50 g of DMF was added, followed by stirring to dissolve. Subsequently, 62.2 g of potassium carbonate and 50 g of DMF were added together, and the temperature was raised to 85 ° C. while stirring. After reacting for about 5 hours in this state, it was cooled to room temperature. The reacted reaction solution was dissolved in 0.2 N hydrochloric acid. Pour into aqueous solution to neutralize precipitate and wash with water after filtration. Thereafter, the filtered reaction product was dried in a vacuum oven at 100 ° C. for 1 day, and after removing water and residual solvent, the compound of formula 11 (PN1) was obtained in a yield of about 80% by weight. The result of H-NMR analysis of the obtained compound of Formula 11 (PN1) is shown in FIG. 1.
[화학식 11]  [Formula 11]
Figure imgf000023_0001
Figure imgf000023_0001
[화학식 12]  [Formula 12]
Figure imgf000023_0002
Figure imgf000023_0002
[화학식 13]  [Formula 13]
Figure imgf000023_0003
Figure imgf000023_0003
제조예 2. 프탈로니트릴 화합물 (PN2ᅵ의 합성 Preparation Example 2 Synthesis of Phtharonitrile Compound (PN2)
하기 화학식 14의 화합물 (PN2)은 다음의 방식으로 합성하였다.  Compound (PN2) of Formula 14 was synthesized in the following manner.
4,4'-bis(hydroxyphenyl)methane 28.0 g 및 150 mL의 DMF(dimethyl formamide)를 500 mL 3-neck RBF(3 neck round bottom flask)에 투입하고, 상온에서 용해시켰다. 이어서 상기 흔합물에 4-nitrophthalonitrile 48.5 g을 추가하고, DMF 50 g을 추가한 후에 교반하여 용해시켰다. 이어서 탄산칼륨 58.1 g 및 DMF 50 g을 함께 투입하고, 교반하면서 온도를 85° C까지 승온시켰다. 약 5 시간 정도 반웅시킨 후에 상온까지 냉각시켰다. 넁각된 반웅 용액을 0.2N 농도의 염산 수용액에 부어 중화 침전시키고, 필터링 후에 물로 세척하였다. 그 후, 필터링된 반웅물을 100°C의 진공 오븐에서 1일 건조하고, 물과 잔류 용매를 제거한 후에 목적 화합물 (PN2)을 약 83중량 %의 수율로 수득하였다. 수득한 화학식 14의 화합물 (PN2)에 대한 iH-NMR분석 결과를 도 2에 나타내었다. 14] 28.0 g of 4,4'-bis (hydroxyphenyl) methane and 150 mL of dimethyl formamide (DMF) were added to a 500 mL 3-neck RBF (3 neck round bottom flask) and dissolved at room temperature. Then 48.5 g of 4-nitrophthalonitrile was added to the mixture, and 50 g of DMF was added, followed by stirring to dissolve. Subsequently, 58.1 g of potassium carbonate and 50 g of DMF were added together, and the temperature was raised to 85 ° C while stirring. After reacting for about 5 hours, the mixture was cooled to room temperature. The corner reaction solution was poured into a 0.2 N aqueous hydrochloric acid solution to neutralize precipitate, and washed with water after filtering. Thereafter, the filtered reaction product was dried in a vacuum oven at 100 ° C. for 1 day, and after removing water and residual solvent, the target compound (PN2) was obtained in a yield of about 83% by weight. I H-NMR analysis of the obtained compound of Formula 14 (PN2) is shown in FIG. 2. 14]
Figure imgf000024_0001
Figure imgf000024_0001
제조예 3. 경화제 (CAl)의 합성 Preparation Example 3 Synthesis of Curing Agent (CAl)
하기 화학식 17의 화합물 (CA1)은 디아민과 디안하이드라이드의 탈수축합에 의해 합성하였다. 4,4'-옥시디아닐린 ^-oxydianiline) 24 g 및 NMP(N-methyl-pyrrolidone) 40 g을 3-neck RBF(3 neck round bottom flask)에 투입하고, 상온에서 교반하여 용해시켰다. 워터 배스 (water bath)로 상기를 냉각시키고, 하기 화학식 18의 화합물 8.7 g을 서서히 3번에 나누어 40 g의 NMP와 함께 투입하였다. 투입된 화합물이 모두 용해되면, azeotrope를 위해 반웅물에 를루엔 16 g을 투입하였다. Dean-Stark 장치와 리플력스 콘덴서를 설치하고, Dean-Stark 장치에 를루엔을 투입하여 채웠다. 탈수 축합 촉매로 피리딘 42 mL를 투입하고, 온도를 170°C까지 승온시키고, 3 시간 동안 교반하였다. 이미드 고리가 형성되면서 발생되는 물을 Dean-Stark 장치로 제거해 주면서 2 시간 동안 추가 교반하고:, 잔류 를루엔과 피리딘을 제거하였다. 반웅 생성물을 상온까지 넁각하고, 메탄올에 침전시켜서 회수하였다. 회수된 침전물을 메탄올로 추출하여 잔류 반웅물을 제거하고, 진공 오븐에서 건조하여 화학식 17의 화합물 (CA1)을 약 85 중량0 /0의 수율로 수득하였다. 수득한 화학식 17의 화합물 (CA1)에 대한 Ή-NMR분석 결과를 도 3에 나타내었다. Compound (CA1) of Formula 17 was synthesized by dehydration of diamine and dianhydride. 24 g of 4,4'-oxydianiline ^ -oxydianiline and 40 g of NMP (N-methyl-pyrrolidone) were added to a 3-neck RBF (3 neck round bottom flask), and stirred at room temperature to dissolve. The water was cooled in a water bath, and 8.7 g of the compound of Formula 18 was slowly added in three portions and 40 g of NMP was added thereto. When all of the added compound was dissolved, 16 g of toluene was added to the reaction solution for azeotrope. The Dean-Stark unit and the ripple force condenser were installed, and toluene was added to the Dean-Stark unit. 42 mL of pyridine was added as a dehydration condensation catalyst, and the temperature was raised to 170 ° C. and stirred for 3 hours. The water generated as the imide ring was formed was further stirred for 2 hours while being removed by the Dean-Stark apparatus: and the residual toluene and pyridine were removed. The reaction product was cooled to room temperature and precipitated and recovered in methanol. The recovered precipitate was extracted with methanol to remove residual banung water and dried in a vacuum oven to give the compound (CA1) of the formula 17 in a yield of about 85 wt. 0/0. The X-NMR analysis result of the obtained compound of formula 17 (CA1) is shown in FIG. 3.
[화학식 17]  [Formula 17]
Figure imgf000024_0002
Figure imgf000024_0002
Figure imgf000025_0001
제조예 4. 경화제 (CA2ᅵ의 합성
Figure imgf000025_0001
Preparation Example 4 Synthesis of Curing Agent (CA2)
하기 화학식 19의 화합물 (CA2)은 디아민과 디안하이드라이드의 탈수 축합에 의해 합성하였다. 4,4'-옥시디아닐린 (4,4'-oxydianiline) 24 g 및 NMP(N- methyl pyrrolidone) 50 g을 3-neck RBF(3 neck round bottom flask)어 1 투입하고, 상온에서 교반하여 용해시켰다. 워터 배스 (water bath)로 상기를 냉각시키고, 하기 화학식 18의 화합물 19.5 g을 서서히 3번에 나누어 100 g의 NMP와 함께 투입하였다. 투입된 화합물이 모두 용해되면, azeotrope 반웅을 위해 반웅물에 를루엔 30 g을 투입하였다. Dean-Stark 장치와 리플럭스 콘덴서를 설치하고, Dean-Stark 장치에 를루엔을 투입하여 채웠다. 탈수 축합 촉매로 피리딘 6.3 mL를 투입하고,온도를 170 °C까지 승온시키고, 3 시간 동안 교반하였다. 이미드 고리가 형성되면서 발생되는 물을 Dean-Stark 장치로 제거해주면서, 2 시간 동안 추가 교반하고, 잔류 를루엔과 피리딘을 제거하였다. 반응 생성물을 상온까지 냉각하고, 메탄올에 침전시켜서 회수하였다. 회수된 침전물을 메탄올로 추출하여 잔류 반웅물을 제거하고, 진공 오븐에서 건조하여 화학식 19의 화합물 (CA2)을 약 85 중량 %의 수율로 수득하였다. 수득한 화학식 19의 화합물 (CA2)에 대한 1H- NMR 분석 결과를 도 4에 나타내었다. The compound of formula 19 (CA2) was synthesized by dehydration condensation of diamine and dianhydride. 24 g of 4,4'-oxydianiline (4,4'-oxydianiline) and 50 g of NMP (N-methyl pyrrolidone) were added to a 3-neck RBF (3 neck round bottom flask), and stirred at room temperature to dissolve. I was. The above was cooled by a water bath, and 19.5 g of the compound of Formula 18 was slowly added in three portions and added with 100 g of NMP. When all the added compound was dissolved, 30 g of toluene was added to the reaction solution for azeotrope reaction. The Dean-Stark unit and the reflux condenser were installed and filled with toluene in the Dean-Stark unit. 6.3 mL of pyridine was added as a dehydration condensation catalyst, and the temperature was raised to 170 ° C. and stirred for 3 hours. Water generated while forming the imide ring was further stirred for 2 hours while the Dean-Stark apparatus was removed, and residual toluene and pyridine were removed. The reaction product was cooled to room temperature and recovered by precipitation in methanol. The recovered precipitate was extracted with methanol to remove residual coagulum and dried in a vacuum oven to yield compound (CA2) of formula 19 in a yield of about 85% by weight. 1H-NMR analysis of the obtained compound of formula 19 (CA2) is shown in FIG. 4.
[화학식 19]  [Formula 19]
Figure imgf000025_0002
Figure imgf000025_0002
상기 화학식 19에서 η은 약 3이다. In Formula 19, η is about 3.
[화학식 18] [Formula 18]
Figure imgf000026_0001
Figure imgf000026_0001
제조예 5. 경화제 (CA3ᅵ의 합성 Preparation Example 5 Synthesis of Curing Agent (CA3)
하기 화학식 20의 화합물 (CA3)은 디아민과 디안하이드라이드의 탈수축합에 의해 합성하였다. m-phenylene diamine 8.1 g과 NMP(N-methyl pyrrolidone) 50 g을 3-neck RBF(3 neck round bottom flask)에 투입하고, 상온에서 교반하여 용해시켰다. 워터 배스 (water bath)로 상기를 넁각하고, 하기 화학식 21의 화합물 26 g을 서서히 3번에 나누어 60 g의 NMP와 함께 투입하였다. 투입된 화합물이 모두 용해되면, azeotrope 반웅을 위해 반웅물에 를루엔 23 g을 투입하였다. Dean Stark 장치와 리플럭스 콘덴서를 설치하고, Dean Stark 장치에 를루엔을 투입하여 채웠다. 탈수 축합 촉매로 피리딘 5.2 mL을 투입하고 , 은도를 17CTC까지 승온시키고, 3 시간 동안 교반하였다. 이미드 고리가 형성되면서 발생되는물을 Dean Stark 장치로 제거하면서, 2 시간 동안 추가 교반하고, 잔류 를루엔과 피리딘을 제거하였다. 반웅 생성물을 상온까지 냉각하고, 메탄올에 침전시켜서 회수하였다. 회수된 침전물을 메탄올로 Soxhlet 추출하여 잔류 반웅물을 제거하고, 진공 오븐에서 건조하여 화학식 21의 화합물 (CA3)을 약 93 중량 %의 수율로 수득하였다. 상기 화학식 21의 화합물 (CA3)에 대한 H-NMR 분석 결과를 도 5에 나타내었다.  The compound of formula 20 (CA3) was synthesized by dehydration of diamine and dianhydride. 8.1 g of m-phenylene diamine and 50 g of N-methyl pyrrolidone (NMP) were added to a 3-neck RBF (3 neck round bottom flask), and stirred at room temperature to dissolve. The above was observed with a water bath, and 26 g of the compound represented by Chemical Formula 21 was gradually divided into three portions and added with 60 g of NMP. When all of the added compound was dissolved, 23 g of toluene was added to the reaction solution for azeotrope reaction. The Dean Stark unit and the reflux condenser were installed and filled with toluene in the Dean Stark unit. 5.2 mL of pyridine was added as a dehydration condensation catalyst, and the temperature was raised to 17 CTC and stirred for 3 hours. The product generated while forming the imide ring was further stirred for 2 hours while the Dean Stark apparatus was removed, and the residual toluene and pyridine were removed. The reaction product was cooled to room temperature and recovered by precipitation in methanol. The recovered precipitate was extracted with Soxhlet with methanol to remove residual semicouns and dried in a vacuum oven to yield compound (CA3) of formula 21 in a yield of about 93% by weight. H-NMR analysis of the compound of Formula 21 (CA3) is shown in FIG. 5.
Figure imgf000026_0002
상기 화학식 20에서 η은 약 3이다.
Figure imgf000026_0002
In Formula 20, η is about 3.
[화학식 21] [Formula 21]
Figure imgf000027_0001
실시예 1
Figure imgf000027_0001
Example 1
상기 제조예 1의 프탈로니트릴 화합물 (PN1)의 1 몰 대비 0.2 몰의 비율로 상기 제조예 4의 경화제 (CA1)를 흔합한수지 결합제를 준비하였다.  A resin binder in which the curing agent (CA1) of Preparation Example 4 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN1) of Preparation Example 1 was prepared.
연마 입자로 평균 입경 100 의 다이아몬드 입자 25 중량0 /0, 충전제로 구리 50 중량0 /。, 및 상기 수지 결합제 25 중량 %를 흔합하여 연삭 공구용 수지 조성물을 제조하였다. Diamond abrasive grain particles having an average particle size of 25 to 100 parts by weight 0/0, 50 parts by weight of copper 0 / a filler., And common summing the resin binder 25% by weight to prepare a resin composition for polishing tools.
상기 수지 조성물을 금형에 투입하고 핫 프레스에서 30 MPa의 힘으로 250 °C 에서 10분, 300°C 에서 20분 동안 경화하여 성형물을 얻었다. In the resin composition into a mold and cured for 20 minutes at 10 minutes at 250 ° C with a force of 30 MPa in the hot press, 300 ° C to obtain a molded article.
상기 성형물을 350°C 의 오븐에서 6 시간 동안 소성하여 연삭 공구용 연삭층 시편을 제조하였다. 실시예 2 The molding was fired in an oven at 350 ° C. for 6 hours to prepare a grinding layer specimen for a grinding tool. Example 2
상기 제조예 1의 프탈로니트릴 화합물 (PN1)의 1 몰 대비 0.2 몰의 비율로 상기 제조예 5의 경화제 (CA2)를 흔합한 수지 결합제를 준비하였다.  A resin binder was prepared in which the curing agent (CA2) of Preparation Example 5 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN1) of Preparation Example 1.
연마 입자로 평균 입경 100 의 다이아몬드 입자 25 중량0 /0, 충전제로 구리 50 중량 %, 및 상기 수지 결합제 25 중량 %를 흔합하여 연삭 공구용 수지 조성물을 제조하였다. The combined copper and 50% weight average particle size of the diamond particles 25 to 100 parts by weight 0/0, the filler in the abrasive grain, and 25% by weight of the binder resin to prepare a resin composition for a common grinding tool.
상기 수지 조성물을 사용하여 상기 실시예 1과 동일한 '방법으로 연삭 공구용 연삭층 시편을 제조하였다. 실시예 3 A grinding tool for the grinding layer with the specimen of Example 1, the same "method by using the above resin composition was prepared. Example 3
상기 제조예 1의 프탈로니트릴 화합물 (PN1)의 1 몰 대비 0.2 몰의 비율로 상기 제조예 6의 경화제 (CA3)를 흔합한 수지 결합제를 준비하였다.  A resin binder was prepared in which the curing agent (CA3) of Preparation Example 6 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN1) of Preparation Example 1.
연마 입자로 평균 입경 100 의 다이아몬드 입자 25 중량0 /0, 층전제로 구리 50 중량0 /0, 및 상기 수지 결합제 25 중량 %를 흔합하여 연삭 공구용 수지 조성물을 제조하였다. Having an average particle size of 100 to 25 parts by weight abrasive particles of diamond particles 0/0, 50 parts by weight of copper 0/0 to layer premise, and common summing the resin binder 25% by weight of a resin for the grinding tool The composition was prepared.
상기 수지 조성물을 사용하여 상기 실시예 1과 동일한 방법으로 연삭 공구용 연삭층 시편을 제조하였다. 실시예 4  Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1. Example 4
상기 제조예 2의 프탈로니트릴 화합물 (PN2)의 1 몰 대비 0.2 몰의 비율로 상기 제조예 4의 경화제 (CA1)를 흔합한 수지 결합제를 준비하였다ᅳ  A resin binder was prepared in which the curing agent (CA1) of Preparation Example 4 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN2) of Preparation Example 2.
연마 입자로 평균 입경 100 / 의 다이아몬드 입자 25 중량0 /0, 층전제로 구리 50 중량0 /0, 및 상기 수지 결합제 25 중량 %를 흔합하여 연삭 공구용 수지 조성물을 제조하였다. ' The average particle size of 100 / diamond particles as abrasive particles 25 parts by weight 0/0, 50 parts by weight of copper 0/0 to layer premise, and common summing the resin binder 25% by weight to prepare a resin composition for polishing tools. '
상기 수지 조성물을 사용하여 상기 실시예 1과 동일한 방법으로 연삭 공구용 연삭층 시편을 제조하였다. 실시예 5  Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1. Example 5
상기 제조예 2의 프탈로니트릴 화합물 (PN2)의 1 몰 대비 0.2 몰의 비율로 상기 제조예 5의 경화제 (CA2)를 흔합한 수지 결합제를 준비하였다.  A resin binder was prepared in which the curing agent (CA2) of Preparation Example 5 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitrile compound (PN2) of Preparation Example 2.
연마 입자로 평균 입경 100 의 다이아몬드 입자 25 중량0 /0, 층전제로 구리 50 중량0 /0, 및 상기 수지 결합제 25 중량 %를 흔합하여 연삭 공구용 수지 조성물을 제조하였다. Having an average particle size of 100 to 25 parts by weight abrasive particles of diamond particles 0/0, 50 parts by weight of copper 0/0 to layer premise, and common summing the resin binder 25% by weight to prepare a resin composition for polishing tools.
상기 수지 조성물을 사용하여 상기 실시예 1과 동일한 방법으로 연삭 공구용 연삭층 시편을 제조하였다. 실시예 6  Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1. Example 6
상기 제조예 2의 프탈로니트뮐 화합물 (PN2)의 1 몰 대비 0.2 몰의 비율로 상기 제조예 6의 경화제 (CA3)를 흔합한수지 결합제를 준비하였다.  A resin binder was prepared in which the curing agent (CA3) of Preparation Example 6 was mixed at a ratio of 0.2 mol to 1 mol of the phthalonitium compound (PN2) of Preparation Example 2.
연마 입자로 평균 입경 100 의 다이아몬드 입자 25 중량0 /。, 층전제로 구리 50 중량0 /0, 및 상기 수지 결합제 25 중량 %를 흔합하여 연삭 공구용 수지 조성물을 제조하였다. Abrasive particles 100 of the diamond particles 25 parts by weight 0 / average particle diameter., 50 parts by weight of copper 0/0 to layer premise, and common summing the resin binder 25% by weight to prepare a resin composition for polishing tools.
상기 수지 조성물을 사용하여 상기 실시예 1과 동일한 방법으로 연삭 공구용 연삭층 시편을 제조하였다. 비교예 1 Using the resin composition, a grinding layer specimen for a grinding tool was manufactured in the same manner as in Example 1. Comparative Example 1
연마 입자로 평균 입경 100 皿의 다이아몬드 입자 25 중량0 /0, 충전제로 구리 50 중량0 /0, 및 페놀 레진 25 중량%를 흔합하여 연삭 공구용 수지 조성물을 제조하였다. The average particle diameter of the diamond particles as abrasive particles 100皿25 weight 0/0, by adding the copper traces 50 weight 0/0, and a phenol resin 25 wt% of a filler, to prepare a resin composition for polishing tools.
상기 수지 조성물을 금형에 투입하고 핫 프레스에서 30 MPa의 힘으로 150 °C 에서 30분 동안 경화하여 성형물을 얻었다. The resin composition was put into a mold and cured at 150 ° C. for 30 minutes with a force of 30 MPa in a hot press to obtain a molding.
상기 성형물을 210°C 의 오븐에서 6시간 동안 소성하여 연삭 공구용 연삭층 시편을 제조하였다. 비교예 2 The molded product was fired in an oven at 210 ° C. for 6 hours to prepare a grinding layer specimen for a grinding tool. Comparative Example 2
연마 입자로 평균 입경 100 의 다이아몬드 입자 25 중량 %, 충전제로 구리 50 중량0 /0, 및 폴리이미드 수지 25 중량 %를 흔합하여 연삭 공구용 수지 조성물을 제조하였다. The combined 25% by weight, average particle diameter of the diamond particles 100 with abrasive particles, 50 parts by weight of copper 0/0, and a polyimide resin of 25% by weight filler in common to prepare a resin composition for polishing tools.
상기 수지 조성물을 열 성형 금형에 투입하고 성형 온도 250 °C 내지The resin composition is put into a thermoforming mold and the molding temperature is 250 ° C to
350 °C까지 온도를 순차적으로 을리면서 성형 압력 30 MPa 의 조건 하에서 가압과 감압을 반복하며 3 시간동만 가열, 가압 성형하여 성형물을 얻었다. 상기 성형물을 350 °C에서 3 시간 동안 열처리하여 연삭공구용 연삭층 시편을 제조하였다. 시험예 1. NMR분석 Pressing and depressurizing were repeated under the conditions of molding pressure of 30 MPa while gradually decreasing the temperature to 350 ° C., and heating and pressure molding were performed for 3 hours to obtain a molded product. The molded material was heat-treated at 350 ° C. for 3 hours to prepare a grinding layer specimen for a grinding tool. Test Example 1 NMR Analysis
제조예 1 내지 5에서 얻은 PN1~PN2 및 CA1~CA3 화합물에 대하여 Agilent사의 500 MHz NMR 장비를 이용하여 제조사의 매뉴얼 대로 H-NMR 분석을 수행하였다. NMR 측정을 위한 샘플은 대상 화합물을 DMSO(dimethyl sulfoxide)-d6에 용해시켜 제조하였다. 각 화합물에 대한 H-NMR 분석 결과를 도 1 내지 5에 나타내었다. 시험예 2. 열안정성 평가  PN1 to PN2 and CA1 to CA3 compounds obtained in Preparation Examples 1 to 5 were subjected to H-NMR analysis according to the manufacturer's manual using Agilent's 500 MHz NMR equipment. Samples for NMR measurements were prepared by dissolving the compound of interest in dimethyl sulfoxide (dSO) -d6. H-NMR analysis results for each compound are shown in FIGS. 1 to 5. Test Example 2 Evaluation of Thermal Stability
TGA (thermogravimetric analysis)를 통해 연삭 공구용 연삭층 시편에 대한 열안정성 (열분해 정도)를 평가하였고, 그 결과를 아래 표 1에 나타내었다. 구체적으로, TGA는 Mettler-Toledo사의 TGA e850 장비를 이용하여 수행하였고, 측정의 시편에 대하여 약 25°C에서 800°C까지 10TV분의 속도로 온도를 승온시키면서 N2 flow의 분위기에서 분석을 수행하였다. 시험예 3. 내열성 평가 The thermogravimetric analysis (TGA) evaluated the thermal stability (degree of pyrolysis) of the grinding layer specimens for the grinding tool, and the results are shown in Table 1 below. Specifically, TGA was performed using the TGA e850 instrument of Mettler-Toledo, and the analysis was performed in an atmosphere of N 2 flow while raising the temperature at a rate of 10 TV minutes from about 25 ° C to 800 ° C for the test specimens. It was. Test Example 3. Evaluation of Heat Resistance
HDT(heat deflection temperature) 측정을 통해 연삭 공구용 수지 결합제에 대한 내열성을 평가하였고, 그 결과를 아래 표 1에 나타내었다.  Heat resistance of the resin binder for the grinding tool was evaluated by heat deflection temperature (HDT) measurement, and the results are shown in Table 1 below.
구체적으로, 상기 내열성은 ASTM D648-16 (Method B) 규격의 시험법에 따라 측정하였다. 시험예 4. 가공 공정 평가  Specifically, the heat resistance was measured according to the test method of ASTM D648-16 (Method B) standard. Test Example 4 Evaluation of Machining Process
상기 실시예 및 비교예에서 각 수지 조성물을 사용한 연삭 공구용 연삭층 시편의 제조시 가공 공정의 복잡성 여부를 평가하였다.  In the above examples and comparative examples, it was evaluated whether or not the complexity of the processing process in the production of the grinding layer specimen for the grinding tool using each resin composition.
【표 1】 Table 1
Figure imgf000030_0001
상기 시험예 1 내지 4에 따르면, 실시예 1 내지 6에 따른 수지 조성물은 페놀 레진을 적용한 비교예 1의 공정에 준하는 방법으로 준비가 가능하였고, 폴리이미드 수지를 적용한 비교예 2의 공정에 비해 높은 생산성을 나타내었다. 그리고, 실시예 1 내지 6에 따른 연삭 공구용 연삭층 시편은 비교예 1의 시편에 비하여 TGA 측정 결과 상대적으로 높은 열안정성을 갖고, HDT 측정 결과 더 높은 내열성을 나타내는 것으로 확인되었다.
Figure imgf000030_0001
According to Test Examples 1 to 4, the resin composition according to Examples 1 to 6 was prepared by a method similar to the process of Comparative Example 1 to which phenol resin was applied, and was higher than that of Comparative Example 2 to which polyimide resin was applied. Productivity was shown. In addition, the grinding layer specimens for the grinding tools according to Examples 1 to 6 had relatively high thermal stability as a result of TGA measurement and higher heat resistance as a result of HDT measurement than the specimen of Comparative Example 1.

Claims

【청구범위】 [Claim]
【청구항 1】  [Claim 1]
연마 입자,  Abrasive particles,
충전제 및  Fillers and
프탈로니트릴 화합물을 함유한 조성물로부터 경화된 수지 결합제 를 포함한, 연삭 공구용 수지 조성물.  A resin composition for a grinding tool comprising a resin binder cured from a composition containing a phthalonitrile compound.
【청구항 2】 [Claim 2]
제 1 항에 있어서,  The method of claim 1,
상기 수지 결합제는 상기 프탈로니트릴 화합물을 함유한 조성물이 아민계 화합물, 히드록시계 화합물 및 이미드계 화합물로 이루어진 군에서 선택된 1종 이상의 경화제에 의해 경화된 것인, 연삭 공구용 수지 조성물.  The resin binder is a resin composition for a grinding tool, wherein the composition containing the phthalonitrile compound is cured by at least one curing agent selected from the group consisting of an amine compound, a hydroxy compound and an imide compound.
【청구항 3] [Claim 3]
제 2 항에 있어서,  The method of claim 2,
상기 경화제는 하기 화학식 1로 표시되는 화합물인, 연삭 공구용 조성물:  The hardener is a compound represented by the following formula (1), the composition for grinding tools:
[화학식 1]  [Formula 1]
Figure imgf000031_0001
상기 화학식 1에서 ,
Figure imgf000031_0001
In Chemical Formula 1,
M은 지방족, 지환족 또는 방향족 화합물 유래의 4가 라디칼이고, χι 및 X2는 각각 독립적으로 알킬렌기, 알킬리덴기 또는 방향족 화합물 유래의 2가 라디칼이고, M is a tetravalent radical derived from an aliphatic, alicyclic or aromatic compound, χι and X 2 are each independently a divalent radical derived from an alkylene group, an alkylidene group or an aromatic compound,
η은 1 이상의 수이다. eta is a number of 1 or more.
【청구항 4] [Claim 4]
제 3 항에 있어서,  The method of claim 3, wherein
상기 경화제는 상기 화학식 1에서 상기 n이 2 내지 200 범위 내의 수인 화합물인, 연삭 공구용 수지 조성물..  The curing agent is a resin composition for a grinding tool, wherein n is a compound in the range of 2 to 200 in the formula (1).
【청구항 5】 [Claim 5]
제 1 항에 있어서,  The method of claim 1,
상기 연마 입자는 천연 다이아몬드, 합성 다이아몬드, 질화붕소, 입방정 질화붕소 (CBN), 알루미나, 실리카, 실리콘카바이드, 알루미나-지르코니아, 티타늄 다이보라이드, 및 보론카바이드로 이루어진 군에서 선택된 1종 이상의 입자인, 연삭 공구용 수지 조성물.  The abrasive particles are at least one particle selected from the group consisting of natural diamond, synthetic diamond, boron nitride, cubic boron nitride (CBN), alumina, silica, silicon carbide, alumina-zirconia, titanium diboride, and boron carbide, Resin composition for grinding tools.
【청구항 6】 [Claim 6]
제 1 항에 있어서, .  The method of claim 1 wherein.
상기 층전제는 구리, 텅스텐, 산화철, 구리 -주석 합금, 실리콘카바이드, 알루미나, 방해석, 이회암, 대리석, 석회석, 크리올라이트, 실리카, 실리케이트, 메탈 카보네이트, 메탈 설페이트, 메탈 설파이트, 메탈 옥사이드, 염화 나트륨, 염화 마그네슘, 이황화 철, 이황화 몰리브덴, 삼황화 안티몬, 혹연, 유리 섬유, 이황화 몰리브덴, 삼황화 안티몬, 텅스텐 설파이드, 실란 커플링 에이전트, 티타네이트 커플링 에이전트, 지르코네이트 커플링 에이전트, 지르코알루미네이트 커플링 에이전트, 및 탄소 섬유로 이루어진 군에서 선택된 1종 이상의 층전제인, 연삭 공구용 수지 조성물.  The layering agent is copper, tungsten, iron oxide, copper-tin alloy, silicon carbide, alumina, calcite, marl, marble, limestone, creolite, silica, silicate, metal carbonate, metal sulfate, metal sulfite, metal oxide, sodium chloride Magnesium Chloride, Iron Disulfide, Molybdenum Disulfide, Antimony Trisulfide, Absolutely, Glass Fiber, Molybdenum Disulfide, Antimony Trisulfide, Tungsten Sulphide, Silane Coupling Agent, Titanate Coupling Agent, Zirconate Coupling Agent, Zircoalumi A resin composition for a grinding tool, which is at least one layering agent selected from the group consisting of a nate coupling agent, and carbon fiber.
【청구항 7】 ■ [Claim 7] ■
제 1 항에 있어서,  The method of claim 1,
20 내지 60 중량 %의 상기 연마 입자,  20 to 60% by weight of the abrasive particles,
10 내지 60 중량0 /0의 상기 충전제 및 The filler of 10 to 60 parts by weight 0/0, and
10 내지 50 중량 %의 상기 수지 결합제  10 to 50% by weight of the resin binder
를 포함한, 연삭 공구용 수지 조성물. 【청구항 8】 Resin comprising a resin for a grinding tool. [Claim 8]
제 1 항의 수지 조성물로 제조된 연삭공구.  A grinding tool made of the resin composition of claim 1.
PCT/KR2018/005914 2017-05-24 2018-05-24 Resin composition for grinding tool and grinding tool manufactured from the resin composition WO2018217038A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019535382A JP6821236B2 (en) 2017-05-24 2018-05-24 A resin composition for a grinding tool and a grinding tool manufactured by the resin composition.
US16/473,211 US20190351529A1 (en) 2017-05-24 2018-05-24 Resin composition for abrasive tool and abrasive tool made of the resin composition
CN201880008266.7A CN110234469B (en) 2017-05-24 2018-05-24 Resin composition for abrasive tool and abrasive tool made of the same
EP18806393.7A EP3527327B1 (en) 2017-05-24 2018-05-24 Resin composition for abrasive tool and abrasive tool manufactured from the resin composition

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2017-0064326 2017-05-24
KR20170064326 2017-05-24
KR1020180058367A KR102067688B1 (en) 2017-05-24 2018-05-23 Resin composition for abrasive tool and abrasive tool made of the resin composition
KR10-2018-0058367 2018-05-23

Publications (1)

Publication Number Publication Date
WO2018217038A1 true WO2018217038A1 (en) 2018-11-29

Family

ID=64396853

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2018/005914 WO2018217038A1 (en) 2017-05-24 2018-05-24 Resin composition for grinding tool and grinding tool manufactured from the resin composition

Country Status (1)

Country Link
WO (1) WO2018217038A1 (en)

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4244857A (en) * 1979-08-30 1981-01-13 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Curing agent for polyepoxides and epoxy resins and composites cured therewith
US4408035A (en) 1981-08-24 1983-10-04 The United States Of America As Represented By The Secretary Of The Navy Phthalonitrile resin from diphthalonitrile monomer and amine
US5003039A (en) 1988-11-18 1991-03-26 The United States Of America As Represented By The Secretary Of The Navy Amino phenyl containing curing agent for high performance phthalonitrile resin
US5003078A (en) 1989-05-16 1991-03-26 The United States Of America As Represented By The Secretary Of The Navy Synthesis of phthalonitrile resins containing ether and imide linkages
US5004801A (en) 1988-11-21 1991-04-02 The United States Of America As Represented By The Secretary Of The Navy Polymer of dithioether-linked phthalonitrile
US5132396A (en) 1990-04-30 1992-07-21 The United States Of America As Represented By The Secretary Of The Navy Phthalonitrile monomers containing imide and/or phenoxy linkages, and polymers thereof
US5139054A (en) 1991-06-28 1992-08-18 Leggett & Platt, Incorporated Spring interior forming and assembling apparatus
US5208318A (en) 1991-03-15 1993-05-04 Keller Teddy M Phosphazene-containing amine as curing agent for phthalonitrile-base polymer
US5237045A (en) 1992-01-09 1993-08-17 The United States Of America As Represented By The Secretary Of The Navy Curing phthalonitrile resins with acid and amine
US5292854A (en) 1989-05-16 1994-03-08 The United States Of America As Represented By The Secretary Of The Navy Synthesis of phthalonitrile resins containing ether and imide linkages with aromatic diamine curing agent
US20090130849A1 (en) * 2007-10-29 2009-05-21 Wai Mun Lee Chemical mechanical polishing and wafer cleaning composition comprising amidoxime compounds and associated method for use
CN101733713A (en) * 2008-11-26 2010-06-16 绵阳中研磨具有限责任公司 Method for producing sand wheel by using phthalocyanine resin
KR20160059444A (en) * 2014-11-18 2016-05-26 주식회사 엘지화학 Phthalonitrile resin
KR20160115543A (en) * 2015-03-27 2016-10-06 주식회사 엘지화학 Polymerizable composition

Patent Citations (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4244857A (en) * 1979-08-30 1981-01-13 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Curing agent for polyepoxides and epoxy resins and composites cured therewith
US4408035A (en) 1981-08-24 1983-10-04 The United States Of America As Represented By The Secretary Of The Navy Phthalonitrile resin from diphthalonitrile monomer and amine
US5003039A (en) 1988-11-18 1991-03-26 The United States Of America As Represented By The Secretary Of The Navy Amino phenyl containing curing agent for high performance phthalonitrile resin
US5350828A (en) 1988-11-21 1994-09-27 The United States Of America As Represented By The Secretary Of The Navy Synthesis and polymerization of dithioether-linked phthalonitrile monomers
US5004801A (en) 1988-11-21 1991-04-02 The United States Of America As Represented By The Secretary Of The Navy Polymer of dithioether-linked phthalonitrile
US5292854A (en) 1989-05-16 1994-03-08 The United States Of America As Represented By The Secretary Of The Navy Synthesis of phthalonitrile resins containing ether and imide linkages with aromatic diamine curing agent
US5003078A (en) 1989-05-16 1991-03-26 The United States Of America As Represented By The Secretary Of The Navy Synthesis of phthalonitrile resins containing ether and imide linkages
US5132396A (en) 1990-04-30 1992-07-21 The United States Of America As Represented By The Secretary Of The Navy Phthalonitrile monomers containing imide and/or phenoxy linkages, and polymers thereof
US5208318A (en) 1991-03-15 1993-05-04 Keller Teddy M Phosphazene-containing amine as curing agent for phthalonitrile-base polymer
US5139054A (en) 1991-06-28 1992-08-18 Leggett & Platt, Incorporated Spring interior forming and assembling apparatus
US5237045A (en) 1992-01-09 1993-08-17 The United States Of America As Represented By The Secretary Of The Navy Curing phthalonitrile resins with acid and amine
US20090130849A1 (en) * 2007-10-29 2009-05-21 Wai Mun Lee Chemical mechanical polishing and wafer cleaning composition comprising amidoxime compounds and associated method for use
CN101733713A (en) * 2008-11-26 2010-06-16 绵阳中研磨具有限责任公司 Method for producing sand wheel by using phthalocyanine resin
KR20160059444A (en) * 2014-11-18 2016-05-26 주식회사 엘지화학 Phthalonitrile resin
KR20160115543A (en) * 2015-03-27 2016-10-06 주식회사 엘지화학 Polymerizable composition

Similar Documents

Publication Publication Date Title
JP6873242B2 (en) Brake pad friction material resin composition and brake pad friction material manufactured from the resin composition
CN107810177B (en) Phthalonitrile compound
US10683261B2 (en) Phthalonitrile compound
EP3533799B1 (en) Compound
JP2019533063A (en) Polymerizable composition
JP6818123B2 (en) Polymerizable composition
KR102067688B1 (en) Resin composition for abrasive tool and abrasive tool made of the resin composition
KR102046576B1 (en) Low friction polymerizable composition
WO2018216986A1 (en) Resin composition for brake pad friction material and brake pad friction material manufactured using the resin composition
KR20170060897A (en) Phthalonitrile compound
KR102053093B1 (en) Phthalonitrile compound
KR101901128B1 (en) Phthalonitrile compound
WO2018217038A1 (en) Resin composition for grinding tool and grinding tool manufactured from the resin composition
JP2019531391A (en) Compound
JP6935119B2 (en) Phthalonitrile resin with improved impact strength
JP6839271B2 (en) Polymerizable composition
KR101985800B1 (en) Phthalonitrile compound

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 18806393

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2018806393

Country of ref document: EP

Effective date: 20190515

ENP Entry into the national phase

Ref document number: 2019535382

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE