WO2018200303A1

WO2018200303A1 - Scatter reduction in additive manufacturing

Info

Publication number: WO2018200303A1
Application number: PCT/US2018/028332
Authority: WO
Inventors: Eahab Nagi El Naga; John Russell BUCKNELL
Original assignee: Divergent Technologies, Inc.
Priority date: 2017-04-28
Filing date: 2018-04-19
Publication date: 2018-11-01
Also published as: CN108788144B; US10898968B2; CN208644069U; KR102497102B1; US20210170517A1; EP3615308A4; JP2020518723A; KR20190136088A; JP7088960B2; CN108788144A; EP3615308A1; US20180311758A1

Abstract

Systems and methods for reducing charged powder particle scattering in powder-bed fusion (PBF) systems are provided. A PBF apparatus can include a structure that supports a layer of powder material having a plurality of particles of powder. For example, the structure can be a build plate, a build floor, a build piece, etc. The apparatus can also include an energy beam source that generates an energy beam and a deflector that applies the energy beam to fuse an area of the powder material in the layer. The energy beam can electrically charge the particles of powder. The apparatus can also include an electrical system that generates an electrical force between the structure and the charged particles of powder. For example, the electrical system can include a voltage source that applies a first voltage to the structure.

Description

SCATTER REDUCTION IN ADDITIVE MANUFACTURING

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the benefit of U.S. Patent Application No. 15/582,493, entitled "SCATTER REDUCTION IN ADDITIVE MANUFACTURING" and filed on April 28, 2017, which is expressly incorporated by reference herein in its entirety.

BACKGROUND

Field

The present disclosure relates generally to additive manufacturing (AM), and more particularly, to reducing charged powder scattering in AM applications, such as powder-bed fusion (PBF).

Background

[0003] PBF systems can produce structures (referred to as build pieces) with geometrically complex shapes, including some shapes that are difficult or impossible to create with conventional manufacturing processes. PBF systems create build pieces layer- by-layer. Each layer or 'slice' is formed by depositing a layer of powder and exposing portions of the powder to an energy beam. The energy beam is applied to melt areas of the powder layer that coincide with the cross-section of the build piece in the layer. The melted powder cools and fuses to form a slice of the build piece. The process can be repeated to form the next slice of the build piece, and so on. Each layer is deposited on top of the previous layer. The resulting structure is a build piece assembled slice-by-slice from the ground up.

[0004] Some energy beams that are used to fuse the powder layer can also cause some of the particles of powder to scatter or fly away from the layer. For example, applying an electron beam to a powder layer can electrically charge some of the particles of powder. The electrical charges on the powder particles repel each other and cause some of the particles to fly off the powder layer, a phenomenon also known as 'smoking. ' In some cases, the scattered powder interferes with the AM operation and can result in poor quality build pieces.

SUMMARY Several aspects of apparatuses and methods for reducing powder scatter in PBF systems will be described more fully hereinafter.

In various aspects, an apparatus for powder-bed fusion can include a structure that supports a layer of powder material having a plurality of particles of powder, an energy beam source that generates an energy beam, and a deflector that applies the energy beam to fuse an area of the powder material in the layer. The energy beam can electrically charge the particles of powder. The apparatus can also include an electrical system that generates an electrical force between the structure and the charged particles of powder.

In various aspects, an apparatus for PBF can include one or more structures including a powder material support structure, an energy beam source directed to the powder material support surface, a deflector operationally coupled with the energy beam source, and a voltage source connected to at least one of the structures.

Other aspects will become readily apparent to those skilled in the art from the following detailed description, wherein is shown and described only several exemplary embodiments by way of illustration. As will be realized by those skilled in the art, concepts described herein are capable of other and different embodiments, and several details are capable of modification in various other respects, all without departing from the present disclosure. Accordingly, the drawings and detailed description are to be regarded as illustrative in nature and not as restrictive.

BRIEF DESCRIPTION OF THE DRAWINGS

[0009] Various aspects will now be presented in the detailed description by way of example, and not by way of limitation, in the accompanying drawings, wherein:

[0010] FIG. 1A-D illustrate an example PBF system during different stages of operation.

[0011] FIG. 2 shows a close-up view illustrating an example of particle scattering in PBF.

[0012] FIG. 3 illustrates another exemplary embodiment of an electrical system implementation for reducing powder scattering.

[0013] FIG. 4 shows a close-up view illustrating an exemplary embodiment of reducing particle scattering.

[0014] FIG. 5 illustrates another exemplary embodiment of an electrical system implementation for reducing powder scattering. [0015] FIG. 6 illustrates another exemplary embodiment of an electrical system implementation for reducing powder scattering.

[0016] FIG. 7 illustrates an example beam error caused by an electric field.

[0017] FIG. 8 illustrates an exemplary embodiment of an electrical system including a beam compensation system.

[0018] FIG. 9 is a flow chart of an exemplary embodiment of a method of reducing powder scatter in a PBF system.

DETAILED DESCRIPTION

[0019] The detailed description set forth below in connection with the appended drawings is intended to provide a description of various exemplary embodiments of the concepts disclosed herein and is not intended to represent the only embodiments in which the disclosure may be practiced. The term "exemplary" used in this disclosure means "serving as an example, instance, or illustration," and should not necessarily be construed as preferred or advantageous over other exemplary embodiments presented in this disclosure. The detailed description includes specific details for the purpose of providing a thorough and complete disclosure that fully conveys the scope of the concepts to those skilled in the art. However, the disclosure may be practiced without these specific details. In some instances, well- known structures and components may be shown in block diagram form, or omitted entirely, in order to avoid obscuring the various concepts presented throughout this disclosure.

[0020] This disclosure is directed to reducing charged powder scattering, i.e., smoking, in

PBF systems. The PBF system can be built, for example, such that one or more structures in the system can be charged to create an electrical force between the charged particles of powder and the powder layer. The electrical force can keep the charged particles of powder from flying off of the powder layer. For example, the build piece can be electrically charged such that the build piece is an anode, or pseudo-anode, to cause charge-accumulated powder particles to be attracted to the bed instead of repelled. Further, charged static shields can be placed with negative potential, with a near uniform field to reduce beam deflection, to prevent charge- accumulated particles from being attracted to the build chamber. Any deflections created by these mechanisms can be characterized by control systems of the PBF system, and compensations can be provided in the original beam deflection commands.

FIGS. 1A-D illustrate an example PBF system 100 during different stages of operation. PBF system 100 can include a depositor 101 that can deposit each layer of metal powder, an energy beam source 103 that can generate an energy beam, a deflector 105 that can apply the energy beam to fuse the powder material, and a build plate 107 that can support one or more build pieces, such as a build piece 109. PBF system 100 can also include a build floor 11 1 positioned within a powder bed receptacle. The walls of the powder bed receptacle are shown as powder bed receptacle walls 112. Build floor 11 1 can lower build plate 107 so that depositor 101 can deposit a next layer and a chamber 113 that can enclose the other components. Depositor 101 can include a hopper 1 15 that contains a powder 1 17, such as a metal powder, and a leveler 119 that can level the top of each layer of powder.

Referring specifically to FIG. 1A, this figure shows PBF system 100 after a slice of build piece 109 has been fused, but before the next layer of powder has been deposited. In fact, FIG. 1A illustrates a time at which PBF system 100 has already deposited and fused slices in multiple layers, e.g., 50 layers, to form the current state of build piece 109, e.g., formed of 50 slices. The multiple layers already deposited have created a powder bed 121 , which includes powder that was deposited but not fused.

FIG. IB shows PBF system 100 at stage in which build floor 1 11 can lower by a powder layer thickness 123. The lowering of build floor 1 11 causes build piece 109 and powder bed 121 to drop by powder layer thickness 123, so that the top of the build piece and powder bed are lower than the top of powder bed receptacle wall 1 12 by the powder layer thickness. In this way, for example, a space of with a consistent thickness equal to powder layer thickness 123 can be created over the top of build piece 109 and powder bed 121.

FIG. 1 C shows PBF system 100 at a stage in which depositor 101 can deposit powder 117 in the space created over the top of build piece 109 and powder bed 121. In this example, depositor 101 can cross over the space while releasing powder 1 17 from hopper 1 15. Leveler 119 can level the released powder to form a powder layer 125 that has a thickness of powder layer thickness 123. Thus, the powder in a PBF system can be supported by a powder material support structure, which can include, for example, a build plate, a build floor, a build piece, etc. It should be noted, that elements of FIGS. 1A-D and the other figures in this disclosure are not necessarily drawn to scale, but may be drawn larger or smaller for the purpose of better illustration of concepts described herein. For example, the illustrated thickness of powder layer 125 (i.e., powder layer thickness 123) is greater than an actual thickness used for the example 50 previously-deposited layers.

[0025] FIG. ID shows PBF system 100 at a stage in which energy beam source 103 can generate an energy beam 127 and deflector 105 can apply the energy beam to fuse the next slice in build piece 109. In various embodiments, energy beam source 103 can be an electron beam source, energy beam 127 can be an electron beam, and deflector 105 can include deflection plates that can generate an electric field or a magnetic field that deflects the electron beam to scan across areas to be fused. In various embodiments, energy beam source 103 can be a laser, energy beam 127 can be a laser beam, and deflector 105 can include an optical system that can reflect and/or refract the laser beam to scan across areas to be fused. In various embodiments, the deflector can include one or more gimbals and actuators that can rotate and/or translate the energy beam source to position the energy beam. In various embodiments, energy beam source 103 and/or deflector 105 can modulate the energy beam, e.g., turn the energy beam on and off as the deflector scans so that the energy beam is applied only in the appropriate areas of the powder layer. For example, in various embodiments, the energy beam can be modulated by a digital signal processor (DSP).

[0026] The application of energy beam 127 can cause particles of powder to fly away from the powder layer, shown in FIG. ID as scattered powder particles 129. As noted above, scattered powder particles 129 can interfere with the printing operation and can result in poorer quality build pieces.

[0027] FIG. 2 shows a close-up view illustrating an example of particle scattering in PBF.

In particular, FIG. 2 shows an energy beam 201 scanning across a powder layer 203 in the direction of the bold arrow (i.e., scanning to the right). As energy beam 201 is applied, powder is fused into fused powder 205 to form build piece 207. In the view shown in FIG. 2, a top portion of the previous slice 209 can be seen, as well as the portion of the current slice 211 that has been fused so far. As energy beam 201 is applied to an area of powder layer 203 to heat and fuse the area, some of the powder particles can become charged. In this example, some of the powder particles can become negatively charged, and these charged powder particles are represented by a "-" symbol. For example, energy beam 201 can be an electron beam, which is a beam of electrons, i.e., negatively-charged particles. The electrons in the electron beam can be captured by powder particles, such that the powder particles become negatively charged.

Negatively-charged obj ects repel each other due to the electrostatic force. As illustrated in FIG. 2, if enough negatively-charged powder particles are in close proximity, the repulsive electrostatic force between them can overcome the force of gravity, causing some of the charged powder particles to fly upward from powder layer 203. These powder particles are shown as scattered powder particles 213. FIG. 3 illustrates another exemplary embodiment of an electrical system implementation for reducing powder scattering. An electrical system 300 can include a voltage source 301 and a voltage source 303. In this example, the positive terminal of voltage source 301 can be connected to a build plate 305 through an opening in a build floor 307. Build plate 305 and build floor 307 can support a powder bed 309 and a conductive build piece 311. For example, conductive build piece 311 can be formed of a metal or other conductive material.

In this example, build plate 305 can be electrically conductive and can be electrically connected to conductive build piece 31 1. For example, conductive build piece 31 1 can be fused to build plate 305. The connection of build plate 305 to voltage source 301 can cause positive charge to collect on the build plate and on the conductive build piece. The positive charge can create an electric field, shown by electric field lines 312. In this example, because positive charge can collect at the top of conductive build piece 31 1, the electric field through the powder layer on top of the build piece may be stronger compared to the electric field in the example of FIG. 3, particularly if the top of the build piece is far away from the build plate. This may allow electrical system 300 to more efficiently reduce powder scatter. Voltage source 303 can be applied to an electron beam source 313 as the acceleration voltage used to create the electron beam, which can be scanned by a deflector 315 to fuse powder. In this case, the positive terminal of voltage source 303 is the anode of electron beam source 313. Voltage source 301 is also connected to the anode of electron beam source 313, such that voltage source 301 is applied between the anode and build plate 305. In this way, for example, the voltage applied by voltage source 301 can help reduce powder scatter and increase beam modulation gain by further accelerating the beam for greater beam energy.

[0032] FIG. 4 shows a close-up view illustrating an exemplary embodiment of reducing particle scattering. In particular, FIG. 4 illustrates the top of a conductive build piece 400, such as conductive build piece 31 1 above. An energy beam 401 scanning across a powder layer 403 in the direction of the bold arrow (i.e., scanning to the right). As energy beam 401 is applied, powder is fused into fused powder 405 to form build piece 400. In the view shown in FIG. 4, a top portion of the previous slice 409 can be seen, as well as the portion of the current slice 41 1 that has been fused so far. As energy beam 401 is applied to an area of powder layer 403 to heat and fuse the area, some of the powder particles can become charged. In this example, some of the powder particles can become negatively charged, as represented by the "-" symbol. For example, energy beam 201 can be an electron beam, and the electrons in the electron beam can be captured by powder particles, such that the powder particles become negatively charged.

[0033] In this example, conductive build piece 400 can be connected to an electrical system such as electrical system 300 in FIG. 3 above, such that positive charge collects at the top of the conductive build piece. The positive charge can create an electric field, shown as electric field lines 413, that can attract the negatively charge powder particles. The attraction is shown in FIG. 4 by electric field lines 413 between the positive and negative charges. The attractive force exerted by the electric field on the negatively-charged powder particles can be greater than the repulsive force between the powder particles, and the negatively-charged powder particles can be prevented from flying upward, as illustrated by immobilized powder particle 415. In this way, for example, powder scattering may be reduced or eliminated.

[0034] FIG. 5 illustrates another exemplary embodiment of an electrical system implementation for reducing powder scattering. An electrical system 500 can include a voltage source 501 and a voltage source 503. In this example, the positive terminal of voltage source 501 can be connected to a build floor 505, which supports a build plate 507, a powder bed 509, and a build piece 511. In this implementation, build floor 505 can be electrically conductive. In other implementations, build plate 507 can also be electrically conductive. In other implementations, build plate 507 and build piece 51 1 can also be electrically conductive. Different electric fields can be generated in the different implementations to reduce or eliminate powder scatter. Voltage source 503 can be applied to an electron beam source 513 as the acceleration voltage used to create the electron beam, which can be scanned by a deflector 515 to fuse powder. In this case, the positive terminal of voltage source 503 is the anode of electron beam source 513. Voltage source 501 is also connected to the anode of electron beam source 513, such that voltage source 501 is applied between the anode and build floor 505. In this way, for example, the voltage applied by voltage source 501 can help reduce powder scatter and increase beam modulation gain by further accelerating the beam for greater beam energy.

FIG. 6 illustrates another exemplary embodiment of an electrical system implementation for reducing powder scattering. An electrical system 600 can include a voltage source 601 and a voltage source 603. In this example, the positive terminal of voltage source 601 can be connected to a conductive plug 604 in a non- conductive build plate 605 through an opening in a build floor 607. Non-conductive build plate 605 and build floor 607 can support a powder bed 609 and a conductive build piece 61 1. For example, conductive build piece 61 1 can be formed of a metal or other conductive material.

In this example, when printing the first few layers of conductive build piece 61 1, the PBF system also prints a conductive extension 612 that can connect the conductive build piece to conductive plug 604. In this way, for example, voltage source 601 can be connected to conductive build piece 611 to cause positive charge to collect on the conductive build piece. The electric field (not shown) generated by the positive charge collected on conductive build piece 61 1 can help reduce or eliminate powder scatter from powder layers on top of the build piece. Because the positive charge is collected on conductive build piece 61 1, but not on non-conductive build plate 605, the electric field may be concentrated in the build piece without requiring the build plate to be charged. In this way, for example, the voltage generated by voltage source 601 may be reduced.

Voltage source 603 can be applied to an electron beam source 613 as the acceleration voltage used to create the electron beam, which can be scanned by a deflector 615 to fuse powder. In this case, the positive terminal of voltage source 603 is the anode of electron beam source 613. Voltage source 601 is also connected to the anode of electron beam source 613, such that voltage source 601 is applied between the anode and build plate 605. In this way, for example, the voltage applied by voltage source 601 can help reduce powder scatter and increase beam modulation gain by further accelerating the beam for greater beam energy.

In various embodiments, one or more conductive extensions could be formed in various shapes and configurations to connect one or more build pieces to a voltage source. For example, multiple build pieces could be connected by a lattice of conductive extensions. In various embodiments, a conductive extension need not be directly connected between each build piece and the voltage source. For example, a first conductive extension could connect a first build piece to the voltage source (e.g., directly connect to a conductive plug, such as in FIG. 6), and a second conductive extension could connect the first build piece directly to a second build piece. In this way, for example, the second build piece can be connected to the voltage source through the first build piece (i.e., not directly connected).

FIG. 7 illustrates an example beam error caused by an electric field. An electrical system 700, including a voltage source 701 and a voltage source 703. The positive terminal of voltage source 701 can be connected to a conductive build plate 705 through an opening in a build floor 707. Conductive build plate 705 and build floor 707 can support a powder bed 709 and a conductive build piece 71 1. Conductive build plate 705 can be electrically connected to conductive build piece 711 , such as being fused to the build piece, and accordingly, positive charge can collect on the build plate and on the conductive build piece to create an electric field similar to the example of FIG. 3. For the purpose of clarity, the electric field lines are not shown in FIG. 7.

Voltage source 703 can be applied to an electron beam source 713 as the acceleration voltage used to create an electron beam 715, which can be scanned by a deflector 717 to fuse powder. In this case, the positive terminal of voltage source 703 is the anode of electron beam source 713. Voltage source 701 is also connected to the anode of electron beam source 713, such that voltage source 701 is applied between the anode and build plate 705. In this way, for example, the voltage applied by voltage source 701 can help reduce powder scatter and increase beam modulation gain by further accelerating the beam for greater beam energy.

In some cases, the electric field generated by various embodiments can cause an energy beam to bend. In this example, the electrons in electron beam 715 can be attracted to the positively-charged conductive build piece 711 and can bend. FIG. 7 shows a zero field beam 719, which represents the path the electron beam would take in a zero electric field to hit a target spot 721. The amount of bending of energy beam 715 can be determined from the strength of the electric field. Therefore, deflector 717 can compensate for the predicted amount of beam bending and can hit target spot 721 by aiming energy beam in a different direction than zero field beam 719, as shown in FIG. 7.

[0043] FIG. 8 illustrates an exemplary embodiment of an electrical system including a beam compensation system. Like the example of FIG. 7, an electrical system 800 can include a voltage source 801 and a voltage source 803. Voltage source 803 can be applied to an electron beam source 813 as the acceleration voltage used to create an electron beam 815, which can be applied by a deflector 817 to fuse powder. Voltage source 801 can apply a voltage between an anode of electron beam source 813 and a conductive build plate 805 through an opening in a build floor 807. Conductive build plate 805 and build floor 807 can support a powder bed 809 and a conductive build piece 81 1. Conductive build plate 805 can be electrically connected to conductive build piece 81 1, such as being fused to the build piece, and accordingly, positive charge can collect on the build plate and on the conductive build piece to create an electric field similar to the example of FIG. 3. For the purpose of clarity, the electric field lines are not shown in FIG. 8.

[0044] Electrical system 800 can include a system with additional structures that can be charged to provide further scatter reduction. In this example, the additional structures can include shields 819 and 820, which can be connected to the negative terminal of voltage source 801. A negative voltage can cause negative charge to collect on shields 819 and 820, which can repulse the negatively charged powder particles in the powder layer of powder bed 809. In other words, the additional charged structures can create an electric field that causes a force between the charged powder particles and the powder layer that pushes the charged powder particles toward the powder layer. In this way, for example, charged powder particle scatter may be further reduced. In various embodiments, the additional structures can be arranged symmetrically around a normal axis extending between the deflector and the powder material support structure. In this way, for example, a deflection of electron beam 815 may be minimized. In various embodiments, for example, a single shield can include a ring of conductive material symmetrically surrounding a normal axis extending between the deflector and the build plate. A constant voltage source can be applied to the ring. The shape of the ring can be, for example, circular, rectangular, a torus, etc. In various embodiments, the shape of the ring can mimic the shape of the surface of the powder bed.

[0045] FIG. 9 is a flow chart of an exemplary embodiment of a method of reducing powder scatter in a PBF system. The PBF system can support (901) a layer of powder material on a structure. For example, a powder layer can be deposited on the top surfaces of a powder bed and one or more build pieces, and the powder bed and the one or more build pieces can be supported by a build plate. The PBF system can generate (902) an energy beam. For example, the PBF system can include an electron beam source that generated an electron beam. The PBF system can scan (903) the energy beam to fuse an area of the powder material in the layer. For example, the PBF system can include a deflector that deflects the electron beam to scan the beam across the powder layer. The energy beam can electrically charge the particles of powder. The PBF system can generate an electrical force between the structure and the charged particles of powder. For example, the PBF system can include an electrical system that applies a voltage between an electron beam source and a structure, such as the build floor, the build plate, the build piece, etc., that creates an electric field resulting in an electrostatic force that attracts the charged particles of powder to the powder layer. In this way, for example, charged powder scatter may be reduced or eliminated.

[0046] The previous description is provided to enable any person skilled in the art to practice the various aspects described herein. Various modifications to these exemplary embodiments presented throughout this disclosure will be readily apparent to those skilled in the art. Thus, the claims are not intended to be limited to the exemplary embodiments presented throughout the disclosure, but are to be accorded the full scope consistent with the language claims. All structural and functional equivalents to the elements of the exemplary embodiments described throughout this disclosure that are known or later come to be known to those of ordinary skill in the art are intended to be encompassed by the claims. Moreover, nothing disclosed herein is intended to be dedicated to the public regardless of whether such disclosure is explicitly recited in the claims. No claim element is to be construed under the provisions of 35 U. S.C. § 112(f), or analogous law in applicable jurisdictions, unless the element is expressly recited using the phrase "means for" or, in the case of a method claim, the element is recited using the phrase "step for."

Claims

WHAT IS CLAIMED IS:

1. An apparatus for powder-bed fusion, comprising:

a structure that supports a layer of powder material having a plurality of particles of powder;

an energy beam source that generates an energy beam;

a deflector that applies the energy beam to fuse an area of the powder material in the layer, wherein the energy beam electrically charges the particles of powder; and an electrical system that generates an electrical force between the structure and the charged particles of powder.

2. The apparatus of claim 1, wherein the electrical system includes a voltage source that applies a first voltage to the structure.

3. The apparatus of claim 2, further comprising one or more additional structures arranged with the deflector, and wherein the voltage source is configured to apply a second voltage to the one or more additional structures.

4. The apparatus of claim 1, further comprising one or more additional structures arranged with the deflector, and wherein the electrical system further comprises a voltage source that applies a voltage to the one or more additional structures.

5. The apparatus of claim 4, wherein the one or more additional structures are arranged with the deflector to reduce an effect on the energy beam.

6. The apparatus of claim 4, further comprising a control system that operates with the deflector to compensate for the effect on the energy beam by the one or more additional structures.

7. The apparatus of claim 1, wherein the deflector includes shields that are configured to be charged to deflect the energy beam.

8. The apparatus of claim 1, wherein the deflector is configured to positionally control the energy beam source to apply the energy beam to fuse the area of powder material.

9. An apparatus for powder-bed fusion, comprising:

one or more structures including a powder material support structure;

an energy beam source directed to the powder material support surface;

a deflector operationally coupled with the energy beam source; and

a voltage source connected to at least one of the one or more structures.

10. The apparatus of claim 9, wherein the voltage source is connected to the powder material support structure.

11. The apparatus of claim 10, wherein the one or more structures further includes at least one shield, and wherein the voltage source is further connected to each of said at least one shield.

12. The apparatus of claim 9, wherein the one or more structures further includes a plurality of shields, and wherein the voltage source is connected to each of the shields.

13. The apparatus of claim 12, wherein the shields are arranged symmetrically around a normal axis extending between the deflector and the powder material support structure.

14. The apparatus of claim 12, further comprising a control system operationally coupled to the deflector to compensate for an effect on the energy beam by the plurality of shields.

15. The apparatus of claim 9, wherein the deflector includes a shield.

16. The apparatus of claim 9, wherein the deflector is configured to positionally control the energy beam source.

17. A method of powder-bed fusion, comprising:

supporting a layer of powder material on a structure, the powder material having a plurality of particles of powder;

generating an energy beam;

scanning the energy beam to fuse an area of the powder material in the layer, wherein the energy beam electrically charges the particles of powder; and

generating an electrical force between the structure and the charged particles of powder.

18. The method of claim 17, wherein the generating an electrical force comprises applying a first voltage to the structure.

19. The method of claim 18, further comprising applying a second voltage to one or more additional structures arranged with the layer.

20. The method of claim 17, further comprising applying a voltage to one or more additional structures arranged with the layer.

21. The method of claim 20, wherein the one or more additional structures are arranged with the layer to reduce an effect on the energy beam.

22. The method of claim 20, further comprising compensating the energy beam to compensate for an effect on the energy beam by the one or more additional structures.

23. The method of claim 17, wherein the scanning of the energy beam includes deflecting the energy beam.

24. The method of claim 17, wherein the scanning of the energy beam includes positionally controlling an energy beam source.