WO2018183460A1 - Triggering exothermic reactions under high hydrogen loading rates - Google Patents

Triggering exothermic reactions under high hydrogen loading rates Download PDF

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Publication number
WO2018183460A1
WO2018183460A1 PCT/US2018/024790 US2018024790W WO2018183460A1 WO 2018183460 A1 WO2018183460 A1 WO 2018183460A1 US 2018024790 W US2018024790 W US 2018024790W WO 2018183460 A1 WO2018183460 A1 WO 2018183460A1
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WIPO (PCT)
Prior art keywords
hydrogen
condition
loading ratio
absorbing material
loading
Prior art date
Application number
PCT/US2018/024790
Other languages
French (fr)
Inventor
Julie A. Morris
Original Assignee
Industrial Heat, Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industrial Heat, Llc filed Critical Industrial Heat, Llc
Priority to RU2019130440A priority Critical patent/RU2019130440A/en
Priority to CN201880026972.4A priority patent/CN110831895A/en
Priority to EP18777648.9A priority patent/EP3601156A4/en
Priority to CA3058446A priority patent/CA3058446A1/en
Priority to US16/497,503 priority patent/US20210280326A1/en
Priority to AU2018246253A priority patent/AU2018246253A1/en
Priority to JP2020502513A priority patent/JP2020515872A/en
Publication of WO2018183460A1 publication Critical patent/WO2018183460A1/en
Priority to US18/320,275 priority patent/US20230290526A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
    • C01B3/0005—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes
    • C01B3/001—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes characterised by the uptaking medium; Treatment thereof
    • C01B3/0026—Reversible uptake of hydrogen by an appropriate medium, i.e. based on physical or chemical sorption phenomena or on reversible chemical reactions, e.g. for hydrogen storage purposes ; Reversible gettering of hydrogen; Reversible uptake of hydrogen by electrodes characterised by the uptaking medium; Treatment thereof of one single metal or a rare earth metal; Treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B4/00—Hydrogen isotopes; Inorganic compounds thereof prepared by isotope exchange, e.g. NH3 + D2 → NH2D + HD
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B3/00—Low temperature nuclear fusion reactors, e.g. alleged cold fusion reactors
    • G21B3/002—Fusion by absorption in a matrix
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02—Apparatus characterised by their chemically-resistant properties
    • B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
    • B01J2219/0236—Metal based
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0837—Details relating to the material of the electrodes
    • B01J2219/0841—Metal
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/32—Hydrogen storage

Definitions

  • the present invention relates generally to heat generation in an exothermic reaction, and more specifically, to controlling a hydrogen or deuterium loading rate to trigger an exothermic reaction.
  • the present application discloses novel and advantageous methods and apparatus for triggering an exothermic reaction consistently.
  • the present disclosure relates to triggering conditions for an exothermic reaction.
  • hydrogen is used to refer to a hydrogen gas comprising pure deuterium, trillium, or any combination of the three isotopes.
  • a device configured for hosting an exothermic reaction comprises a hydrogen absorbing material and one or more input ports.
  • the one or more input ports are configured for receiving a gas inlet and one or more controlling devices.
  • the one or more controlling devices are configured to apply a condition to achieve a high hydrogen loading rate, under which an exothermic reaction is initiated.
  • a method for triggering an exothermic reaction in a reaction chamber comprises the following steps. First, a hydrogen gas is introduced into the reaction chamber. The reaction chamber contains a hydrogen absorbing material. While the hydrogen gas is loaded into the hydrogen absorbing material, a condition is applied to achieve a high hydrogen loading rate, under which an exothermic reaction is initiated. [0009] In some embodiments, a method of triggering an exothermic reaction in a reaction chamber is disclosed. A hydrogen gas is first introduced into the metal container before a first condition is applied. Under a first condition, the hydrogen gas is loaded into the hydrogen absorbing material to achieve a first hydrogen loading ratio within a first time period.
  • a second condition is applied.
  • the hydrogen gas is loaded into the hydrogen absorbing material to achieve a second hydrogen loading ratio within a second time period.
  • the second loading ratio is higher than the first loading ratio and the second time period is shorter than the first time period.
  • An exothermic reaction may be initiated under the second condition.
  • applying the first condition is optional.
  • a device configured for triggering and sustaining an exothermic reaction.
  • the device comprises a container, one or more electrodes, and one or more input ports.
  • the device is configured to host a type of exothermic reaction that involves a transition metal loaded with hydrogen.
  • the metal container is plated with a hydrogen absorbing material and receives the one or more electrodes through a port at the end of the metal container.
  • the one or more input ports are configured to receive one or more controlling devices.
  • the one or more controlling devices are configured to apply different conditions under which a hydrogen gas can be loaded into the hydrogen absorbing material. Under a first condition, the hydrogen gas is loaded into the hydrogen absorbing material at a first hydrogen loading ratio within a first time period. Under a second condition, the hydrogen gas is loaded into the hydrogen absorbing material at a second hydrogen loading ratio within a second time period. The second hydrogen loading ratio is higher than the first hydrogen loading ratio.
  • An exothermic reaction is triggered under the second condition.
  • a device configured for an exothermic reaction comprises an electrolytic cell.
  • the device comprises a container filled with an electrolyte.
  • the device further comprises one or more input ports for receiving a cathode and an anode.
  • the cathode is plated with a hydrogen absorbing material and can absorb or adsorb a hydrogen gas. When the hydrogen gas is loaded into the hydrogen absorbing material at a high hydrogen loading rate that exceeds a threshold, an exothermic reaction may be triggered.
  • FIG. 1 illustrates an exemplary reactor configured for heat generation.
  • FIG. 2 illustrates an exemplary curve showing a hydrogen loading process in a metal lattice.
  • FIG. 3 illustrates an exemplary curve showing another hydrogen loading process in a metal lattice.
  • FIG. 4 is a flow chart illustrating an exemplary triggering method of an exothermic reaction under a high hydrogen loading rate.
  • FIG. 1 illustrates an exemplary reactor 100 configured for exothermic reactions.
  • the reactor 100 comprises a container 102, one or more electrodes 104, and a lid 106.
  • the lid 106 is placed at one end of the reactor 100 and is used to accommodate the one or more electrodes 104, input/output ports 114, and a removable electrical pass-through 116.
  • the one or more electrodes 104 may be made of tungsten, molybdenum, cobalt, or nickel, or other rugged metal that can withstand high voltage and high temperature environment.
  • the positive electrode is made of or plated with palladium.
  • the negative electrode is platinum.
  • One of the input/output ports 114 can be used to introduce reaction gases into the reactor 100 or extract resultant gases from the reactor 100.
  • the input/output ports 114 can also be used to accommodate pressure controlling devices, which can be used to apply a vacuum, extract gases or input gases.
  • the reactor 100 shown in FIG. 1 can be configured as follows.
  • the container 102 is made of metal.
  • the interior wall of the container 102 is first plated with gold 108 or another material (e.g., silver).
  • the plated gold or silver functions as a seal to prevent reaction gasses in the chamber from escaping through the wall of the reaction chamber 100.
  • a layer of hydrogen absorbing material is plated.
  • a magnet may be optionally placed outside the reactor 100.
  • the exemplary reactor 100 is configured as an electrolytic cell.
  • the container 102 may be filled with an electrolyte.
  • the container 102 further comprises two electrodes, a cathode and an anode, which are accommodated through the input/output ports 114.
  • Power lines may be accommodated through the electrical pass-through 116.
  • the reactor 100 needs to be preconditioned for an exothermic reaction to happen.
  • One of the prerequisite conditions is that the hydrogen absorbing material 110 is loaded with hydrogen/deuterium.
  • an exothermic reaction can be triggered when the hydrogen loading ratio exceeds a threshold.
  • a hydrogen loading ratio describes how much hydrogen or deuterium has been absorbed or adsorbed into the hydrogen absorbing material, e.g., palladium.
  • the reaction chamber 100 is an electrolytic cell
  • the cathode of the electrolytic cell is plated with palladium.
  • an exothermic reaction may be triggered when the loading ratio exceeds a certain threshold.
  • the loading ratio of hydrogen is important in triggering an exothermic reaction. While a general correlation between high hydrogen loading ratios and excess heat generation has been observed, no triggering mechanism that can be used to consistently initiate an exothermic reaction has been identified. One postulation is that a high hydrogen loading ratio is a necessary but insufficient condition for triggering an exothermic reaction. On the other hand, a high loading rate may provide a consistent triggering mechanism for excess heat generation. In some embodiments, an exothermic reaction may be triggered under a fast hydrogen loading rate. A hydrogen loading rate describes how fast the hydrogen is being absorbed or adsorbed into the hydrogen absorbing material. [0021] In some embodiments, a high hydrogen/deuterium loading rate triggers an exothermic reaction.
  • a hydrogen gas when pressurized into the reaction chamber 100, a large flow of hydrogen/deuterium gas is introduced into the reaction chamber 100 in a short period of time.
  • an exothermic reaction can be induced.
  • the exothermic reaction may be between the hydrogen/deuterium atoms/ions that are "jammed" into the metal lattice, which plays a catalytic role in the exothermic reaction.
  • a high hydrogen/deuterium loading rate can be achieved by applying a magnetic field or imposing a voltage. Hydrogen ions are accelerated to a high speed when under the influence of a strong magnetic field or a high voltage (electric field). When high speed hydrogen/deuterium ions enter a metal lattice, an exothermic reaction may be induced, due to the high kinetic energy of the hydrogen/deuterium ions loaded into the metal lattice.
  • the distribution of hydrogen atoms/ions inside the metal lattice may be uneven. Within certain areas, the hydrogen/deuterium loading ratio may be higher than the average loading ratio. Within certain pockets, the hydrogen/deuterium loading ratio can exceed the threshold required for triggering an exothermic reaction.
  • FIG. 2 illustrates an exemplary hydrogen absorbing process 200 in a hydrogen absorbing material such as palladium.
  • the x-axis shows the elapsed time and the y-axis shows the hydrogen loading ratio measured as the ratio between the hydrogen atoms/ions loaded into the metal lattice and the palladium atoms of the hydrogen absorbing material.
  • the hydrogen or deuterium gas is being adsorbed and absorbed quickly.
  • the hydrogen loading process slows down, until the hydrogen absorbing material is "saturated" with
  • the hydrogen loading ratio remains substantially stable after t'.
  • FIG. 3 illustrates an exemplary hydrogen loading process 300.
  • the first loading condition may include a pressure Pi and a temperature Ti. Additionally, the first loading condition may include a voltage Vi, a magnetic field Bi, etc.
  • the hydrogen loading ratio steadily increases from 3 ⁇ 4 to ri during the time period between to and ti. The loading rate during this time period is:
  • a second condition is applied inside the reaction chamber 100.
  • the second condition may include one or more of the following: a pressure P 2 , a temperature T 2 , a voltage V 2 , a magnetic field B 2 , etc.
  • the hydrogen is being loaded into the hydrogen absorbing material faster than under the first condition.
  • the loading ratio increases from ri to r 2 during the second time period between ti and t 2 .
  • the loading rate under the second condition during the second time period is: [0027]
  • the device 100 comprises a metal container 102 that is plated with palladium or nickel.
  • An electrode 104 made of a metal, such as
  • Molybdenum is present in the middle of the container.
  • Hydrogen or deuterium is present in the closed container under normal pressure conditions (e.g., ⁇ 2 PSI).
  • a negative voltage or ground is applied to the hydrogen absorbing lattice while a positive voltage is applied to the electrode 104.
  • the voltage is about 5000V.
  • the voltage ranges between 3000V to 6000V. This voltage change creates a strong electric field that causes the hydrogen or deuterium to "slam" into the palladium/nickel wall, yielding a loading rate higher than normal. Under this fast loading rate, loaded hydrogen atoms/ions are distributed in the metal lattice unevenly and small areas with high hydrogen loading ratio may be formed.
  • the metal container 102 in the reaction chamber 100 holds palladium or nickel nanoparticles.
  • the container 102 is initially set at a vacuum, e.g., 10 A 7 Torr or higher.
  • Deuterium or hydrogen is introduced into the container quickly, causing pressure to increase from a vacuum to at least 100 PSI within a short period of time.
  • the pressure increases from a high vacuum to 100 PSI in 15 seconds. This sudden increase of pressure creates areas of high concentration hydrogen/deuterium. Within those areas,
  • FIG. 4 illustrates an exemplary triggering process 400 of an exothermic reaction under a high hydrogen loading rate.
  • a hydrogen gas is first introduced into the metal container (step 402).
  • a first condition is applied.
  • the hydrogen gas is loaded into the hydrogen absorbing material to reach a first hydrogen loading ratio within a first time period (step 404).
  • a second condition is applied.
  • the hydrogen gas is loaded into the hydrogen absorbing material to achieve a second hydrogen loading ratio (step 406).
  • the second hydrogen loading ratio is higher than the first hydrogen loading ratio.
  • an exothermic reaction is triggered in the reaction chamber 100 (step 408).

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Abstract

Methods and apparatus are disclosed for triggering an exothermic reaction under a high hydrogen loading rate. It is generally understood that a high hydrogen loading ratio is an important factor. The present application teaches that a high hydrogen loading rate, that is, achieving a high hydrogen loading ratio in a short period of time, is another important factor in determining whether excess heat can be observed in an exothermic reaction. The present application discloses methods and apparatus for achieving a high hydrogen loading rate in order to trigger an exothermic reaction.

Description

Triggering Exothermic Reactions under High Hydrogen Loading Rates
Cross-Reference to Related Applications
[0001] This application claims priority to US Provisional Patent Application No. 62/478,080 filed on March 29, 2017, the entire contents of which are incorporated by reference herein.
Technical field
[0002] The present invention relates generally to heat generation in an exothermic reaction, and more specifically, to controlling a hydrogen or deuterium loading rate to trigger an exothermic reaction.
Background
[0003] Heat generation in an exothermic reaction involving hydrogen or deuterium atoms loaded in a metal lattice has been observed and confirmed by independent teams around the world. Examples of metal lattices include palladium, nickel, alloys etc. However, attempts to reproduce those exothermic reactions in a consistent manner have failed.
[0004] Many factors are deemed important in determining whether excess power will be observed in an exothermic reaction. For example, when a hydrogen or deuterium gas is loaded into a metal lattice, a loading ratio higher than 0.8 is considered a necessary but insufficient condition in triggering an exothermic reaction. A "rough" surface on the metal lattice is also considered important because a metal lattice with a rough surface can achieve a higher hydrogen loading ratio than a smooth surface.
[0005] The present application discloses novel and advantageous methods and apparatus for triggering an exothermic reaction consistently.
Summary
[0006] The present disclosure relates to triggering conditions for an exothermic reaction. In the present disclosure, the term "hydrogen" is used to refer to a hydrogen gas comprising pure deuterium, trillium, or any combination of the three isotopes.
[0007] In some embodiments, a device configured for hosting an exothermic reaction comprises a hydrogen absorbing material and one or more input ports. The one or more input ports are configured for receiving a gas inlet and one or more controlling devices. The one or more controlling devices are configured to apply a condition to achieve a high hydrogen loading rate, under which an exothermic reaction is initiated.
[0008] In some embodiments, a method for triggering an exothermic reaction in a reaction chamber comprises the following steps. First, a hydrogen gas is introduced into the reaction chamber. The reaction chamber contains a hydrogen absorbing material. While the hydrogen gas is loaded into the hydrogen absorbing material, a condition is applied to achieve a high hydrogen loading rate, under which an exothermic reaction is initiated. [0009] In some embodiments, a method of triggering an exothermic reaction in a reaction chamber is disclosed. A hydrogen gas is first introduced into the metal container before a first condition is applied. Under a first condition, the hydrogen gas is loaded into the hydrogen absorbing material to achieve a first hydrogen loading ratio within a first time period.
Afterwards, a second condition is applied. Under the second condition, the hydrogen gas is loaded into the hydrogen absorbing material to achieve a second hydrogen loading ratio within a second time period. The second loading ratio is higher than the first loading ratio and the second time period is shorter than the first time period. An exothermic reaction may be initiated under the second condition. In some embodiments, applying the first condition is optional.
[0010] In some embodiments, a device configured for triggering and sustaining an exothermic reaction is disclosed. The device comprises a container, one or more electrodes, and one or more input ports. In one embodiment, the device is configured to host a type of exothermic reaction that involves a transition metal loaded with hydrogen. In one embodiment, the metal container is plated with a hydrogen absorbing material and receives the one or more electrodes through a port at the end of the metal container. The one or more input ports are configured to receive one or more controlling devices. The one or more controlling devices are configured to apply different conditions under which a hydrogen gas can be loaded into the hydrogen absorbing material. Under a first condition, the hydrogen gas is loaded into the hydrogen absorbing material at a first hydrogen loading ratio within a first time period. Under a second condition, the hydrogen gas is loaded into the hydrogen absorbing material at a second hydrogen loading ratio within a second time period. The second hydrogen loading ratio is higher than the first hydrogen loading ratio. An exothermic reaction is triggered under the second condition.
[0011] In yet another embodiment, a device configured for an exothermic reaction comprises an electrolytic cell. The device comprises a container filled with an electrolyte. The device further comprises one or more input ports for receiving a cathode and an anode. The cathode is plated with a hydrogen absorbing material and can absorb or adsorb a hydrogen gas. When the hydrogen gas is loaded into the hydrogen absorbing material at a high hydrogen loading rate that exceeds a threshold, an exothermic reaction may be triggered.
Brief Description of Figures
[0012] FIG. 1 illustrates an exemplary reactor configured for heat generation.
[0013] FIG. 2 illustrates an exemplary curve showing a hydrogen loading process in a metal lattice.
[0014] FIG. 3 illustrates an exemplary curve showing another hydrogen loading process in a metal lattice.
[0015] FIG. 4 is a flow chart illustrating an exemplary triggering method of an exothermic reaction under a high hydrogen loading rate.
Detailed Description
[0016] FIG. 1 illustrates an exemplary reactor 100 configured for exothermic reactions. The reactor 100 comprises a container 102, one or more electrodes 104, and a lid 106. In FIG. 1, the lid 106 is placed at one end of the reactor 100 and is used to accommodate the one or more electrodes 104, input/output ports 114, and a removable electrical pass-through 116. The one or more electrodes 104 may be made of tungsten, molybdenum, cobalt, or nickel, or other rugged metal that can withstand high voltage and high temperature environment. In some embodiments, the positive electrode is made of or plated with palladium. In some embodiments, the negative electrode is platinum. One of the input/output ports 114 can be used to introduce reaction gases into the reactor 100 or extract resultant gases from the reactor 100. The input/output ports 114 can also be used to accommodate pressure controlling devices, which can be used to apply a vacuum, extract gases or input gases.
[0017] In one type of exothermic reactions, two deuterium atoms or ions fuse to form helium and release energy in the process. The reactor 100 shown in FIG. 1 can be configured as follows. In one exemplary reactor 100, the container 102 is made of metal. The interior wall of the container 102 is first plated with gold 108 or another material (e.g., silver). The plated gold or silver functions as a seal to prevent reaction gasses in the chamber from escaping through the wall of the reaction chamber 100. On top of the gold 108, a layer of hydrogen absorbing material is plated. Outside the reactor 100, a magnet may be optionally placed.
[0018] In some embodiments, the exemplary reactor 100 is configured as an electrolytic cell. The container 102 may be filled with an electrolyte. The container 102 further comprises two electrodes, a cathode and an anode, which are accommodated through the input/output ports 114. Power lines may be accommodated through the electrical pass-through 116.
[0019] In certain types of exothermic reactions, the reactor 100 needs to be preconditioned for an exothermic reaction to happen. One of the prerequisite conditions is that the hydrogen absorbing material 110 is loaded with hydrogen/deuterium. In some embodiments, an exothermic reaction can be triggered when the hydrogen loading ratio exceeds a threshold. A hydrogen loading ratio describes how much hydrogen or deuterium has been absorbed or adsorbed into the hydrogen absorbing material, e.g., palladium. For example, in one exemplary embodiment in which the reaction chamber 100 is an electrolytic cell, the cathode of the electrolytic cell is plated with palladium. As a hydrogen/deuterium gas is loaded into the palladium, an exothermic reaction may be triggered when the loading ratio exceeds a certain threshold.
[0020] It is generally understood that the loading ratio of hydrogen is important in triggering an exothermic reaction. While a general correlation between high hydrogen loading ratios and excess heat generation has been observed, no triggering mechanism that can be used to consistently initiate an exothermic reaction has been identified. One postulation is that a high hydrogen loading ratio is a necessary but insufficient condition for triggering an exothermic reaction. On the other hand, a high loading rate may provide a consistent triggering mechanism for excess heat generation. In some embodiments, an exothermic reaction may be triggered under a fast hydrogen loading rate. A hydrogen loading rate describes how fast the hydrogen is being absorbed or adsorbed into the hydrogen absorbing material. [0021] In some embodiments, a high hydrogen/deuterium loading rate triggers an exothermic reaction. For example, when a hydrogen gas is pressurized into the reaction chamber 100, a large flow of hydrogen/deuterium gas is introduced into the reaction chamber 100 in a short period of time. When hydrogen/deuterium ions/atoms are loaded into the lattice quickly, an exothermic reaction can be induced. The exothermic reaction may be between the hydrogen/deuterium atoms/ions that are "jammed" into the metal lattice, which plays a catalytic role in the exothermic reaction.
[0022] In some embodiments, a high hydrogen/deuterium loading rate can be achieved by applying a magnetic field or imposing a voltage. Hydrogen ions are accelerated to a high speed when under the influence of a strong magnetic field or a high voltage (electric field). When high speed hydrogen/deuterium ions enter a metal lattice, an exothermic reaction may be induced, due to the high kinetic energy of the hydrogen/deuterium ions loaded into the metal lattice.
[0023] In some embodiments, when a hydrogen/deuterium gas is loaded quickly into a metal lattice, e.g., palladium, the distribution of hydrogen atoms/ions inside the metal lattice may be uneven. Within certain areas, the hydrogen/deuterium loading ratio may be higher than the average loading ratio. Within certain pockets, the hydrogen/deuterium loading ratio can exceed the threshold required for triggering an exothermic reaction.
[0024] FIG. 2 illustrates an exemplary hydrogen absorbing process 200 in a hydrogen absorbing material such as palladium. In FIG. 2, the x-axis shows the elapsed time and the y-axis shows the hydrogen loading ratio measured as the ratio between the hydrogen atoms/ions loaded into the metal lattice and the palladium atoms of the hydrogen absorbing material. Initially, when a hydrogen absorbing material is placed in a hydrogen/deuterium gas, the hydrogen or deuterium gas is being adsorbed and absorbed quickly. After a period of time, t, the hydrogen loading process slows down, until the hydrogen absorbing material is "saturated" with
hydrogen/deuterium. The hydrogen loading ratio remains substantially stable after t'.
[0025] FIG. 3 illustrates an exemplary hydrogen loading process 300. During the first stage of the hydrogen loading process 300, between to and ti, an optional first loading condition is applied in the reaction chamber 100. The first loading condition may include a pressure Pi and a temperature Ti. Additionally, the first loading condition may include a voltage Vi, a magnetic field Bi, etc. As the hydrogen is loaded into the hydrogen absorbing material, e.g., a palladium lattice, the hydrogen loading ratio steadily increases from ¾ to ri during the time period between to and ti. The loading rate during this time period is:
Figure imgf000009_0001
[0026] During the time period between ti and t2, a second condition is applied inside the reaction chamber 100. The second condition may include one or more of the following: a pressure P2, a temperature T2, a voltage V2, a magnetic field B2, etc. Under the second condition, the hydrogen is being loaded into the hydrogen absorbing material faster than under the first condition. The loading ratio increases from ri to r2 during the second time period between ti and t2. The loading rate under the second condition during the second time period is:
Figure imgf000009_0002
[0027] When under the second condition, because of the rapid loading of hydrogen, an exothermic reaction is triggered. In one embodiment, the device 100 comprises a metal container 102 that is plated with palladium or nickel. An electrode 104 made of a metal, such as
Molybdenum, is present in the middle of the container. Hydrogen or deuterium is present in the closed container under normal pressure conditions (e.g., < 2 PSI). A negative voltage or ground is applied to the hydrogen absorbing lattice while a positive voltage is applied to the electrode 104. In one embodiment, the voltage is about 5000V. In another embodiment, the voltage ranges between 3000V to 6000V. This voltage change creates a strong electric field that causes the hydrogen or deuterium to "slam" into the palladium/nickel wall, yielding a loading rate higher than normal. Under this fast loading rate, loaded hydrogen atoms/ions are distributed in the metal lattice unevenly and small areas with high hydrogen loading ratio may be formed.
[0028] In another embodiment, the metal container 102 in the reaction chamber 100 holds palladium or nickel nanoparticles. The container 102 is initially set at a vacuum, e.g., 10A7 Torr or higher. Deuterium or hydrogen is introduced into the container quickly, causing pressure to increase from a vacuum to at least 100 PSI within a short period of time. In one embodiment, the pressure increases from a high vacuum to 100 PSI in 15 seconds. This sudden increase of pressure creates areas of high concentration hydrogen/deuterium. Within those areas,
hydrogen/deuterium loading ratios are high, and an abnormal heat generation event can be triggered to promote excess heat generation.
[0029] FIG. 4 illustrates an exemplary triggering process 400 of an exothermic reaction under a high hydrogen loading rate. In the process 400, a hydrogen gas is first introduced into the metal container (step 402). During a first time period, a first condition is applied. Under the first condition, the hydrogen gas is loaded into the hydrogen absorbing material to reach a first hydrogen loading ratio within a first time period (step 404). During a second time period, a second condition is applied. Under the second condition, the hydrogen gas is loaded into the hydrogen absorbing material to achieve a second hydrogen loading ratio (step 406). The second hydrogen loading ratio is higher than the first hydrogen loading ratio. Under the second condition, an exothermic reaction is triggered in the reaction chamber 100 (step 408).
[0030] The present invention may be carried out in other specific ways than those herein set forth without departing from the scope and essential characteristics of the invention. The present embodiments are, therefore, to be considered in all respects as illustrative and not restrictive, and all changes coming within the meaning and equivalency range of the appended claims are intended to be embraced therein.

Claims

Claims
1. A method of triggering an exothermic reaction in a reaction chamber, the reaction
chamber comprising a hydrogen absorbing material, the method comprising:
introducing a hydrogen gas into the chamber;
applying a first condition, under which the hydrogen gas is loaded into the hydrogen absorbing material at a first hydrogen loading rate during a first time period;
applying a second condition, under which the hydrogen gas is loaded into the hydrogen absorbing material at a second hydrogen loading rate during a second time period; and
initiating the exothermic reaction in the reaction chamber under the second condition; wherein the second hydrogen loading rate is higher than the first hydrogen loading rate.
2. The method of claim 1, wherein applying the first condition comprises applying a
temperature Tl and a pressure PI.
3. The method of claim 1, wherein the reaction chamber further comprises an electrode and the electrode is plated with the hydrogen absorbing material, and wherein applying the second condition comprises applying a high voltage differential between the reaction chamber and the electrode.
4. The method of claim 3, wherein the high voltage differential ranges from 3000V to 6000V.
5. The method of claim 2, wherein applying the second condition comprises increasing the pressure PI within the reaction chamber from a vacuum to 100 PS I.
6. The method of claim 1, wherein the step of applying the first condition is optional.
7. The method of claim 1, wherein the first loading ratio or the second loading ratio is a localized loading ratio.
8. The method of claim 1, wherein the first loading ratio or the second loading ratio is an average loading ratio.
9. A device configured for triggering and sustaining an exothermic reaction, comprising:
a reaction chamber;
a hydrogen absorbing material; and one or more input ports for receiving a gas inlet and one or more controlling devices, wherein a hydrogen gas is introduced into the device via the gas inlet, and wherein the one or more controlling devices are configured to apply a first condition under which the hydrogen gas is loaded into the hydrogen absorbing material at a first hydrogen loading ratio within a first time period, and to apply a second condition under which the hydrogen gas is loaded into the hydrogen absorbing material at a second hydrogen loading ratio within a second time period, the second hydrogen loading ratio being higher than the first hydrogen loading ratio; wherein the exothermic reaction is initiated under the second condition.
10. The device of claim 9, wherein the first condition comprises a temperature Tl and a pressure PI.
11. The device of claim 9, wherein the device further comprises an electrode and the
electrode is plated with a hydrogen absorbing material, wherein the second condition comprises a high voltage differential between the device and the electrode.
12. The device of claim 11, wherein the high voltage differential ranges from 3000V to 6000V.
13. The device of claim 9, wherein the second condition comprises increasing the pressure PI within the reaction chamber from a vacuum to 100 PSI.
14. The device of claim 9, wherein the step of applying the first condition is optional.
15. The device of claim 9, wherein the first loading ratio or the second loading ratio is a localized loading ratio.
16. The device of claim 9, wherein the first loading ratio or the second loading ratio is an average loading ratio.
17. A method of triggering an exothermic reaction in a reaction chamber, the reaction
chamber comprising a hydrogen absorbing material, the method comprising:
introducing a hydrogen gas into the reaction chamber;
applying a condition, under which the hydrogen gas is loaded into the hydrogen absorbing material to achieve a high hydrogen loading rate; and
initiating the exothermic reaction in the reaction chamber.
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