WO2018139009A1 - Touch sensor and display device with embedded touch sensor - Google Patents

Touch sensor and display device with embedded touch sensor Download PDF

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Publication number
WO2018139009A1
WO2018139009A1 PCT/JP2017/040565 JP2017040565W WO2018139009A1 WO 2018139009 A1 WO2018139009 A1 WO 2018139009A1 JP 2017040565 W JP2017040565 W JP 2017040565W WO 2018139009 A1 WO2018139009 A1 WO 2018139009A1
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WO
WIPO (PCT)
Prior art keywords
electrode
connection line
touch sensor
electrodes
sensor according
Prior art date
Application number
PCT/JP2017/040565
Other languages
French (fr)
Japanese (ja)
Inventor
佐々木　亨
秋元　肇
Original Assignee
株式会社ジャパンディスプレイ
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Filing date
Publication date
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Publication of WO2018139009A1 publication Critical patent/WO2018139009A1/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces

Definitions

  • the present invention relates to a touch sensor and a display device with a built-in touch sensor.
  • Patent Document 1 a first electrode extending in the X direction in which adjacent main body portions are connected via a connecting portion, and a second electrode extending in the Y direction in which adjacent main body portions are connected via a connecting portion.
  • a display device incorporating a capacitive touch sensor arranged with a sealing film interposed therebetween.
  • the inventors of the present application are considering forming two types of electrodes of the capacitive touch sensor in the same layer.
  • one of the first connection line that connects the adjacent first electrodes and the second connection line that connects the adjacent second electrodes is formed in another layer separated from the electrode layer by an insulating film.
  • a large number of shapes having the same orientation are arranged, so that there is a possibility that the intersecting portion is easily visually recognized.
  • An object of the present invention is to provide a touch sensor and a display device with a built-in touch sensor in which an intersection is difficult to visually recognize.
  • the touch sensor of the present invention is a plurality of first electrodes arranged two-dimensionally, and the first electrodes adjacent in the first direction are the same layer or different layers from the first electrodes.
  • the first electrodes adjacent to each other in the second direction crossing the first direction are not connected, and are two-dimensionally in the same layer as the first electrode.
  • the plurality of second electrodes arranged and each surrounded by the first electrode, wherein the second electrodes adjacent in the second direction intersect the first connection line in plan view And a plurality of second electrodes, which are connected to the second electrode via a second connection line of the same layer or different layer, and are not connected to the second electrode adjacent in the first direction, and the first connection line and the An insulating film interposed between the first connecting line and the second connecting line, and the first layer and the second electrode in the same layer as the first connecting line.
  • the display device with a built-in touch sensor according to the present invention includes a display unit and the touch sensor according to the present invention formed on the display unit.
  • FIG. 5 is a cross-sectional view taken along line II-II shown in FIGS. 1 and 4.
  • FIG. 5 is a cross-sectional view taken along line III-III shown in FIGS. 1 and 4.
  • 1 is a plan view of a touch sensor according to a first embodiment of the present invention. It is a top view of the touch sensor which concerns on 2nd Embodiment of this invention. It is a top view of the touch sensor which concerns on 3rd Embodiment of this invention. It is a top view which shows the structural example of a connection line. It is a top view which shows the example of a connection of an electrode and a different layer connection line.
  • FIG. 8B is a sectional view taken along line 8B-8B shown in FIG. 8A.
  • FIG. 8B is a sectional view taken along line 8C-8C shown in FIG. 8A.
  • FIG. 9B is a sectional view taken along line 9B-9B shown in FIG. 9A.
  • FIG. 9B is a sectional view taken along line 9C-9C shown in FIG. 9A.
  • FIG. 18A It is a figure following FIG. 18B. It is a figure following FIG. 18C. It is a figure following FIG. 18D. It is a figure following FIG. 18E.
  • FIG. 1 is a plan view of a display device with a built-in touch sensor (hereinafter also simply referred to as a display device) according to an embodiment.
  • An organic EL display device is given as an example of the display device.
  • the display device 1 is configured to display a full-color image by forming a full-color pixel by combining a plurality of color unit pixels (sub-pixels) composed of, for example, red, green, and blue.
  • the display device 1 includes a display panel 10 and a touch sensor 20 formed on the display area of the display panel 10.
  • a peripheral region (frame region) 11 is formed outside the display region of the display panel 10, and an FPC 13 for electrical connection with the outside is connected to the peripheral region 11.
  • the direction along the peripheral region 11 to which the FPC 13 is connected is defined as the X direction
  • the direction orthogonal thereto is defined as the Y direction.
  • FIG. 2 is a cross-sectional view taken along the line II-II shown in FIG. 1 and FIG.
  • FIG. 3 is a cross-sectional view taken along the line III-III shown in FIGS.
  • hatching of some layers such as the substrate 30, the planarizing film 51, and the interlayer insulating film 53 is omitted in order to make the cross-sectional structure easy to see.
  • the stacking direction is the upward direction.
  • the substrate 30 is made of a flexible resin such as glass or polyimide.
  • the upper surface of the substrate 30 is covered with an undercoat layer 31.
  • a semiconductor layer 41 is formed on the undercoat layer 31, and the semiconductor layer 41 is covered with a gate insulating film 33.
  • a gate electrode 43 is formed on the gate insulating film 33, and the gate electrode 43 is covered with a passivation film 35.
  • the drain electrode 45 and the source electrode 47 are connected to the semiconductor layer 41 through the gate insulating film 33 and the passivation film 35.
  • the semiconductor layer 41, the gate electrode 43, the drain electrode 45, and the source electrode 47 constitute a thin film transistor 40.
  • the thin film transistor 40 is provided so as to correspond to each of the plurality of unit pixels.
  • the undercoat layer 31, the gate insulating film 33, and the passivation film 35 are made of an inorganic insulating material such as SiO 2 or SiN.
  • a lead wiring 49 is formed in the peripheral region 11.
  • the lead wiring 49 is a wiring for electrically connecting the touch sensor 20 and the FPC 13.
  • the drain electrode 45, the source electrode 47, and the lead wiring 49 are covered with a planarizing film 51, and the planarizing film 51 is covered with an interlayer insulating film 53.
  • the drain electrode 45, the source electrode 47, and the lead-out wiring 49 are made of a conductive material including, for example, Al, Ag, Cu, Ni, Ti, Mo, or the like.
  • the planarizing film 51 is formed of an organic insulating material such as acrylic resin and has a flat upper surface.
  • the interlayer insulating film 53 is formed of an inorganic insulating material such as SiO 2 or SiN.
  • a pixel electrode 61 (for example, an anode) is formed on the interlayer insulating film 53.
  • the pixel electrode 61 passes through the planarization film 51 and the interlayer insulating film 53 and is connected to the source electrode 47.
  • the pixel electrode 61 is provided so as to correspond to each of the plurality of unit pixels.
  • the pixel electrode 61 is formed as a reflective electrode.
  • terminals 67 and 68 are formed in the peripheral region 11 and are connected to both ends of the lead-out wiring 49 through the planarizing film 51 and the interlayer insulating film 53.
  • the pixel electrode 61 and the terminals 67 and 68 are formed to include a conductive material including, for example, Al, Ag, Cu, Ni, Ti, Mo, or the like, or a conductive oxide such as ITO or IZO.
  • the pixel electrode 61 is covered with a pixel separation film 55.
  • the pixel isolation film 55 is also called a rib or a bank.
  • the pixel separation film 55 is formed with an opening 55a through which the pixel electrode 61 is exposed to the bottom.
  • the inner edge portion of the pixel separation film 55 that forms the opening 55a is placed on the peripheral edge portion of the pixel electrode 61, and has a tapered shape that spreads outward as it goes upward. Note that the pixel isolation film 55 is not formed in the peripheral region 11.
  • the pixel separation film 55 is formed of an organic material such as acrylic resin or polyimide resin.
  • the light emitting layers 63 are formed separately from each other.
  • the light emitting layer 63 emits light in a plurality of colors including, for example, red, green, and blue corresponding to each of the plurality of unit pixels.
  • at least one layer of a hole transport layer, a hole injection layer, an electron transport layer, and an electron injection layer may be formed.
  • the light emitting layer 63 is formed by vapor deposition using a mask.
  • the light emitting layer 63 may be formed by vapor deposition as a uniform film (so-called solid film) extending over the entire display region across a plurality of unit pixels.
  • the light emitting layer 63 emits white light and is emitted by a color filter.
  • a color filter For example, each component of a plurality of colors including red, green, and blue is extracted.
  • the light emitting layer 63 is not limited to vapor deposition, and may be formed by coating.
  • the light emitting layer 63 and the pixel separation film 55 are covered with a counter electrode 65 (for example, a cathode).
  • the counter electrode 65 is formed as a uniform film (so-called solid film) that extends over the entire display region across a plurality of unit pixels.
  • a light emitting element 60 is configured by the light emitting layer 63 and the pixel electrode 61 and the counter electrode 65 sandwiching the light emitting layer 63, and the light emitting layer 63 emits light by a current flowing between the pixel electrode 61 and the counter electrode 65.
  • the counter electrode 65 is formed of a transparent conductive material such as ITO or a metal thin film such as MgAg.
  • the pixel separation film 55 and the counter electrode 65 are sealed by being covered with a sealing film (passivation film) 70 and shielded from moisture.
  • the sealing film 70 has, for example, a three-layer structure including an inorganic film 71, an organic film 73, and an inorganic film 75 in this order from the bottom.
  • the inorganic films 71 and 75 are made of an inorganic insulating material such as SiO 2 or SiN.
  • the organic film 73 is made of an organic insulating material such as an acrylic resin, and planarizes the upper surface of the sealing film 70. Note that the sealing film 70 may not be formed in the peripheral region 11. In particular, the sealing film 70 is not formed on the terminals 67 and 68.
  • the display device 1 has the touch sensor 20 on the sealing film 70.
  • a base insulating film 81 is formed on the sealing film 70.
  • the base insulating film 81 is made of, for example, an organic insulating material such as acrylic resin, and the upper surface of the base insulating film 81 is planarized.
  • On the base insulating film 81 a plurality of first electrodes 21 and a plurality of second electrodes 22 arranged in a two-dimensional manner are formed.
  • the first electrode 21 and the second electrode 22 constitute a drive electrode and a detection electrode of a capacitive touch sensor. Details of the touch sensor 20 will be described later.
  • the first electrode 21 and the second electrode 22 are covered with an interlayer insulating film 83.
  • the interlayer insulating film 83 is formed of, for example, an inorganic insulating material such as SiO 2 or SiN or an organic insulating material such as acrylic resin.
  • the lead-out wiring 25 is formed on the peripheral edge of the interlayer insulating film 83.
  • the lead-out wiring 25 is connected to the first electrode 21 or the second electrode 22 through an opening (through hole) 83 a formed in the interlayer insulating film 83.
  • the lead wiring 25 extends from the interlayer insulating film 83 to the peripheral region 11 beyond the edges of the interlayer insulating film 83, the base insulating film 81, and the sealing film 70.
  • the lead wiring 25 is connected to a terminal 67 close to the touch sensor 20 among the two terminals 67 and 68 connected to the lead wiring 49 embedded in the peripheral region 11.
  • the FPC 13 is connected to a terminal 68 away from the touch sensor 20 via an anisotropic conductive member 139.
  • FIG. 4 is a plan view of the touch sensor according to the first embodiment.
  • the touch sensor 20 according to the present embodiment includes a plurality of first electrodes 21 and a plurality of second electrodes 22 that are two-dimensionally arranged in a layer between the base insulating film 81 and the interlayer insulating film 83. Yes.
  • Each of the first electrode 21 and the second electrode 22 has a rectangular shape in which an X direction (first direction) and a Y direction (second direction) intersecting (for example, orthogonal to) the diagonal direction are diagonal, so-called rhombus ( Diamond shape). Further, each of the first electrode 21 and the second electrode 22 is formed by a mesh-like wiring (mesh wiring) made of a conductive material such as metal.
  • the first electrode 21 and the second electrode 22 are formed of a conductive material containing, for example, Al, Ag, Cu, Ni, Ti, Mo, or the like. Without being limited thereto, the first electrode 21 and the second electrode 22 may be formed of a transparent conductive film.
  • the plurality of first electrodes 21 are two-dimensionally arranged side by side in the X direction and the Y direction, respectively. Among these first electrodes 21, the first electrodes 21 adjacent in the X direction are connected via the first connection line 23, and the first electrodes 21 adjacent in the Y direction are not connected. That is, each of the plurality of first electrodes 21 forms a plurality of electrode rows extending in the X direction by connecting the first electrodes 21 adjacent to each other in the X direction via the first connection line 23. The electrode rows are electrically separated in the Y direction.
  • the plurality of second electrodes 22 are also two-dimensionally arranged in the X direction and the Y direction. Among these second electrodes 22, the second electrode 22 adjacent in the Y direction is connected via the second connection line 24 intersecting the first connection line 23 in plan view, and the second electrode 22 adjacent in the X direction. The electrode 22 is not connected. That is, the plurality of second electrodes 22 form a plurality of electrode rows extending in the Y direction by connecting the second electrodes 22 adjacent to each other in the Y direction via the second connection line 24. The columns are electrically separated in the X direction.
  • Each second electrode 22 is disposed so as to be surrounded by the first electrode 21.
  • each of the second electrodes 22 is disposed between the first electrodes 21 adjacent to each other in a direction intersecting both the X direction and the Y direction (for example, a direction of 45 degrees or ⁇ 45 degrees).
  • the first electrode 21 and the second electrode 22 are electrically separated by being spaced apart from each other so as not to contact each other. Since the first electrode 21 and the second electrode 22 are arranged in the same layer, a difference in light reflection or the like hardly occurs, so that the first electrode 21 and the second electrode 22 are hardly visually recognized.
  • the first connection line 23 and the second connection line 24 intersect in plan view.
  • An interlayer insulating film 83 is interposed between the first connection line 23 and the second connection line 24 that intersect in plan view, and the two are electrically separated.
  • a portion where the first connection line 23 and the second electrode 22 intersect in plan view is referred to as an “intersection 29”.
  • each first connection line 23 includes a first connection line in the same layer as the first electrode 21 and the second electrode 22 (hereinafter referred to as the same layer first connection line 231), the first electrode 21, It is formed by either the second electrode 22 or a first connection line of a different layer (hereinafter referred to as a different layer first connection line 235).
  • the same layer first connection line 231 is formed continuously with the first electrode 21 under the interlayer insulating film 83.
  • the different layer first connection line 235 is a so-called bridge wiring formed on the interlayer insulating film 83 and connected to the first electrode 21 through a through hole 83 a formed in the interlayer insulating film 83.
  • each of the second connection lines 24 includes a second connection line in the same layer as the first electrode 21 and the second electrode 22 (hereinafter referred to as the same layer second connection line 241), and the first electrode 21 and the second electrode 22. It is formed by either the electrode 22 or a second connection line of a different layer (hereinafter referred to as a different layer second connection line 245).
  • the same layer second connection line 241 is formed continuously with the second electrode 22 under the interlayer insulating film 83.
  • the different layer second connection line 245 is a so-called bridge wiring formed on the interlayer insulating film 83 and connected to the second electrode 22 through a through hole 83 a formed in the interlayer insulating film 83.
  • each of the intersecting portions 29 includes a “first intersecting portion 291” where the same-layer first connection line 231 and the different-layer second connection line 245 intersect, and a different-layer first connection line 235 and the same-layer second connection line 245. It is formed by any one of the “second intersecting portions 292” intersecting with the connection line 241.
  • the interlayer insulating film 83 is formed over the entire display region, but the present invention is not limited to this, and the interlayer insulating film 83 may be distributed at each intersection 29. That is, the interlayer insulating film 83 is interposed between the same-layer first connection line 231 and the different-layer second connection line 245 at the first intersection 291, and the different-layer first connection line 235 at the second intersection 292 and The first electrode 21 and the second electrode 22 may not be covered as long as they are interposed between the second connection lines 241 in the same layer.
  • the first intersection 291 and the second intersection 292 are arranged adjacent to each other.
  • the 1st crossing part 291 and the 2nd crossing part 292 do not need to be adjacent in all, and the place where the 1st crossing part 291 adjoins may be included, and the 2nd crossing part 292 Adjacent locations may be included.
  • At least one of the plurality of intersections 29 closest to the first intersection 291 is defined as the second intersection 292.
  • at least one of the plurality of intersections 29 closest to the second intersection 292 is defined as the first intersection 291.
  • the first intersection 291 and the second intersection 292 are alternately arranged in the X direction and the Y direction, and are arranged in a so-called checkered pattern.
  • the first intersection 291 and the second intersection 292 are not limited to every other one, and may be arranged every two or more.
  • the 1st crossing part 291 and the 2nd crossing part 292 should just appear periodically.
  • first intersection 291 and the second intersection 292 have the same number per fixed area.
  • the fixed area may be the entire display area, or may be a part of the center of the display area, for example. If the number per fixed area is the same, the first intersection 291 and the second intersection 292 may be randomly arranged.
  • FIG. 5 is a plan view of the touch sensor according to the second embodiment.
  • the first intersecting portions 291 and the second intersecting portions 292 are alternately arranged only in the X direction and are not arranged alternately in the Y direction, and the same ones are arranged. That is, two of the four intersections 29 closest to the first intersection 291 are adjacent to each other in the X direction as the second intersection 292. The same applies to the second intersection 292. Even in the second embodiment, even if not as much as in the first embodiment, there is an effect that the crossing portion 29 is less likely to be visually recognized.
  • FIG. 6 is a plan view of the touch sensor according to the third embodiment.
  • the first intersecting portions 291 and the second intersecting portions 292 are alternately arranged only in the Y direction, and are not arranged alternately in the X direction. That is, two of the four intersections 29 closest to the first intersection 291 are adjacent to each other in the Y direction as the second intersection 292. The same applies to the second intersection 292. Even in the third embodiment, the effect of making the crossing portion 29 less likely to be visually recognized is obtained, although not as much as in the first embodiment.
  • each electrode row of the second electrode 22 that is a detection electrode is the same layer second connection line 241 in the second embodiment.
  • both the same-layer second connection lines 241 and the different-layer second connection lines 245 are alternately included. For this reason, it is preferable to employ the third embodiment from the viewpoint of aligning the electric resistances of the electrode arrays of the second electrodes 22 that are detection electrodes.
  • FIG. 7 is a plan view showing a configuration example of connection lines.
  • the second intersection 292 is shown in an enlarged manner, but the first intersection 291 is similarly configured.
  • the different layer first connection line 235 and the same layer second connection line 241 are formed of a plurality of metal wires.
  • the different layer first connection line 235 includes two metal lines formed on the interlayer insulating film 83, and ends of the two metal lines are connected to the first electrode through the through holes 83a. 21 is connected to the end of the X direction.
  • Each end portion of the plurality of metal wires forming the different layer first connection line 235 may have an enlarged portion that extends in a pad shape so as to include the through hole 83a. In this case, it is desirable that the enlarged portion has a size that does not hinder the display of the pixel 100 (see FIG. 12). Further, the interval between the two metal lines forming the different layer first connection line 235 or the same layer second connection line 241 is the end of the first electrode 21 or the second electrode 22 formed as a mesh wiring (for example, It is desirable that the width is the same as the width of one eye constituting the end portion.
  • connection portion between the first electrode 21 and the different layer first connection line 235 is shown in an enlarged manner, but the connection portion between the second electrode 22 and the different layer second connection line 245 is similarly shown. Composed. The first electrode 21 is exposed at the bottom of the through hole 83a formed in the interlayer insulating film 83, and the different-layer first connection line 235 formed on the interlayer insulating film 83 is connected to the first electrode 21 through the through hole 83a. It is connected.
  • the line width of the different-layer first connection line 235 may be the same as the line width of the first electrode 21 formed as a mesh-like wiring. Further, the width of the through hole 83a may be smaller than the line width of the first electrode 21. In this case, the first electrode 21 is exposed at the entire bottom of the through hole 83a, and a different layer is formed at the entire bottom of the through hole 83a. A first connection line 235 is formed.
  • the line width of the different layer first connection line 235 may be larger than the line width of the first electrode 21.
  • the line width of the different-layer first connection line 235 is desirably a size that does not hinder the display of the pixel 100 (see FIG. 12).
  • the width of the through hole 83a may be larger than the line width of the first electrode 21 or the different layer first connection line 235.
  • the first electrode 21 is exposed at a part of the bottom of the through hole 83a
  • a different layer first connection line 235 is formed at a part of the bottom of the through hole 83a. This example is useful when the line width of the first electrode 21 is small and it is difficult to fit the through hole 83a inside the first electrode 21 in plan view.
  • FIG. 10 is a plan view showing a configuration example of connection lines.
  • the second intersection 292 is shown in an enlarged manner, but the first intersection 291 is similarly configured.
  • the different layer first connection line 235 is formed of a transparent conductive film
  • the same layer second connection line 241 is formed of a plurality of metal lines.
  • the different-layer first connection line 235 is made of a transparent conductive film such as ITO formed on the interlayer insulating film 83, and an end portion of the transparent conductive film in the X direction passes through a plurality of through holes 83a.
  • the first electrode 21 is connected to the end portion in the X direction.
  • the width of the transparent conductive film forming the different layer first connection line 235 is desirably wider than the line width of the first electrode 21 formed as a mesh-like wiring. Since the transparent conductive film is transparent, it may be formed so as to overlap with the pixel 100 (see FIG. 12) in plan view. This is effective when the length (X direction) of the transparent conductive film forming the different layer first connection line 235 is 1.5 times longer than the width (Y direction). From the viewpoint of reducing the electrical resistance, the length (X direction) of the transparent conductive film may be 1.5 times or more longer than the width (Y direction).
  • FIG. 11 is a plan view of the touch sensor according to the fourth embodiment.
  • the first electrode 21 and the second electrode 22 are disposed on the interlayer insulating film 83.
  • the different layer first connection line 235 and the different layer second connection line 245 are arranged under the interlayer insulating film 83.
  • the first electrode 21 and the second electrode 22 formed on the interlayer insulating film 83 include a different layer first connection line 235 and a different layer second connection line 245 formed under the interlayer insulating film 83 through the through hole 83a. Are connected to each.
  • FIG. 12 is a plan view showing an arrangement example of electrodes and pixels.
  • FIG. 13 is a plan view showing another arrangement example.
  • the display panel 10 includes a plurality of unit pixels 10R, 10G, and 10B made of red, green, and blue, for example, and a set of the unit pixels 10R, 10G, and 10B of a plurality of colors constitutes the pixel 100.
  • FIG. 12 shows an example of a so-called stripe arrangement in which unit pixels 10R, 10G, and 10B extending in the Y direction are arranged in the X direction.
  • FIG. 13 shows that the blue unit pixel 10B is replaced with the red and green unit pixels 10R, 10G. It shows an example that is larger.
  • Each of the unit pixels 10R, 10G, and 10B is partitioned by an opening 55a of the pixel separation film 55 that exposes the pixel electrode 61 (see FIG. 2).
  • each line of the mesh wiring constituting the first electrode 21 or the second electrode 22 is disposed above the pixel isolation film 55. That is, each line of the mesh wiring overlaps with the pixel separation film 55 in a plan view, and does not overlap with the opening 55a forming the unit pixels 10R, 10G, and 10B.
  • the width of each line of the mesh-like wiring is narrower than the interval between the openings 55a adjacent to each other in the X direction or the Y direction.
  • Each of the openings of the mesh wiring (that is, the mesh) includes one or a plurality of pixels 100 in plan view. That is, the mesh pitch of the mesh wiring is an integral multiple of the arrangement pitch of the unit pixels 10R, 10G, and 10B.
  • each line of the mesh-like wiring constituting the first electrode 21 or the second electrode 22 is arranged above the pixel isolation film 55, so that light traveling upward from the unit pixels 10R, 10G, and 10B is mesh-like. Not disturbed by wiring. Note that not only the first electrode 21 or the second electrode 22 but also the first connection line 23 or the second connection line 24 are similarly disposed above the pixel isolation film 55.
  • FIG. 14 is a plan view showing another arrangement example of electrodes and pixels.
  • the unit pixels 10R, 10G, and 10B are formed in a rectangular shape in which the X direction and the Y direction are diagonal directions, a so-called rhombus shape (diamond shape).
  • the unit pixels 10R, 10G, and 10B have the X direction and the Y direction as diagonal directions, that is, in a third or fourth direction (for example, a direction of 45 degrees or ⁇ 45 degrees) that intersects both the X direction and the Y direction. They are arranged two-dimensionally side by side.
  • a so-called pen tile arrangement in which a group of one red unit pixel 10R, one blue unit pixel 10B, and two green unit pixels 10G constitutes the pixel 100 is employed.
  • FIG. 14 shows the second electrode 22 in an enlarged manner, but the first electrode 21 is similarly configured.
  • Each line of the mesh-like wiring constituting the first electrode 21 or the second electrode 22 is disposed above the pixel isolation film 55, and is similar to the arrangement direction of the unit pixels 10R, 10G, and 10B in the X direction and the Y direction. It extends in a third or fourth direction intersecting both (for example, a direction of 45 degrees or -45 degrees).
  • the width of each line of the mesh-like wiring is narrower than the interval between the openings 55a adjacent in the third direction or the fourth direction.
  • Each of the openings of the mesh wiring includes one or a plurality of pixels 100 in plan view.
  • FIG. 15 is a plan view of the touch sensor according to the fifth embodiment.
  • the fifth embodiment is applied to the pixel array shown in FIG. Similar to the lines of the mesh wiring constituting the first electrode 21 or the second electrode 22, the first connection line 23 and the second connection line 24 are the third or fourth that intersects both the X direction and the Y direction. Each extends in a direction (eg, 45 degrees or -45 degrees). By being configured in this way, the light traveling upward from the pixel is not obstructed by the first connection line 23 and the second connection line 24.
  • first connection line 23 or the second connection line 24 has a central portion extending in one of the third and fourth directions, and end portions on both sides thereof extending in the other of the third and fourth directions. It is bent like a bowl. Further, the first connection line 23 and the second connection line 24 are configured such that the central portions are orthogonal to each other and overlap one another when one is rotated 90 degrees.
  • first intersection 291 and the second intersection 292 are alternately arranged in each of the X direction and the Y direction. That is, all of the four intersections 29 closest to the first intersection 291 are the second intersections 292. The same applies to the second intersection 292. According to this, also in the pixel array shown in FIG. 14, the effect that the intersection 29 is hardly visually recognized can be obtained as in the above embodiment.
  • FIG. 16 is a plan view of a touch sensor according to the sixth embodiment.
  • the sixth embodiment is applied to the pixel array shown in FIG. Similar to the lines of the mesh wiring constituting the first electrode 21 or the second electrode 22, the first connection line 23 and the second connection line 24 are the third or fourth that intersects both the X direction and the Y direction. Each extends in a direction (eg, 45 degrees or -45 degrees). By being configured in this way, the light traveling upward from the pixel is not obstructed by the first connection line 23 and the second connection line 24.
  • the first electrodes 21 adjacent to each other in the X direction are arranged offset in the Y direction, and the first connection line 23 extends linearly as a whole in the third or fourth direction.
  • the first electrodes 21 adjacent in the direction are connected.
  • the second electrodes 22 adjacent to each other in the Y direction are arranged so as to be offset in the X direction, and the second connection line 24 extends linearly in the third or fourth direction so that it is adjacent to the Y direction.
  • a matching second electrode 22 is connected.
  • first intersection 291 and the second intersection 292 are alternately arranged in each of the X direction and the Y direction. That is, all of the four intersections 29 closest to the first intersection 291 are the second intersections 292. The same applies to the second intersection 292. According to this, also in the pixel array shown in FIG. 14, the effect that the intersection 29 is hardly visually recognized can be obtained as in the above embodiment.
  • FIG. 17 is a plan view of the touch sensor according to the seventh embodiment.
  • a dummy wiring 27 (third electrode) that is not connected to any of the first electrode 21 and the second electrode 22 is formed between the first electrode 21 and the second electrode 22.
  • the dummy wiring 27 is disposed in the same layer as the first electrode 21 and the second electrode 22 so as to be sandwiched between the first electrode 21 and the second electrode 22. According to this, since the coupling between the first electrode 21 and the second electrode 22 can be reduced, the change in capacitance when touched is increased, and the detection sensitivity can be improved.
  • the dummy wiring 27 is also disposed above the pixel isolation film 55 and travels upward from the unit pixels 10R, 10G, and 10B in the same manner as each line of the mesh wiring configuring the first electrode 21 or the second electrode 22. It is desirable not to inhibit.
  • FIG. 18A to FIG. 18F are diagrams showing an example of the manufacturing process of the display device with a built-in touch sensor.
  • FIG. 18A shows a state where the light emitting element 60 is completed.
  • the pixel isolation film 55 is not formed in the peripheral region 11.
  • the range of the pixel isolation film 55 is referred to as a “display region”.
  • the interlayer insulating film 53 and the terminals 67 and 68 are exposed.
  • the lead-out wiring 49 and the terminals 67 and 68 connected to the touch sensor 20 are shown. Connected to.
  • FIG. 18B shows a process of forming the sealing film 70.
  • the organic film 73 formed of an organic material may be formed so as to cover the display region, and may not be formed in the peripheral region 11.
  • the outer edge of the organic film 72 is located on the inner side of the outer edge of the pixel separation film 55, and is sealed when two layers of inorganic films 71 and 73 formed of an inorganic material are in close contact with each other. For this reason, the peripheral region 11 is covered with two layers of inorganic films 71 and 73.
  • the two layers of inorganic films 71 and 73 covering the peripheral region 11 are referred to as “peripheral portions 76”.
  • FIG. 18C shows a step of forming the base insulating film 81.
  • the base insulating film 81 is formed only in the display region and not in the peripheral region 11. Specifically, the outer edge of the base insulating film 81 is located inside the outer edge of the pixel separation film 55 and located outside the outer edge of the organic film 72 of the sealing film 70.
  • the base insulating film 81 is made of an organic insulating material, and is used to planarize the upper surface of the base insulating film 81 and to remove the peripheral portion 76 in the next process.
  • FIG. 18D shows a process of removing the peripheral portion 76.
  • the removal of the peripheral portion 76 is performed using the base insulating film 81 as a mask.
  • the two inorganic films 71 and 75 are cut at the outer edge of the base insulating film 81, that is, at a position inside the outer edge of the pixel isolation film 55 and outside the outer edge of the organic film 73.
  • the interlayer insulating film 53 below the peripheral portion 76 is also formed of the same inorganic insulating material as the inorganic films 71 and 75, a part or all of the interlayer insulating film 53 is simultaneously removed by removing the peripheral portion 76. There is.
  • FIG. 18E shows a process of forming the touch sensor 20. Specifically, the first electrode 21, the second electrode 22, the same layer first connection line 231 and the same layer second connection line 241 are formed on the base insulating film 81, and the interlayer insulating film 83 and the opening 83a are formed thereon. Then, the different-layer first connection line 235 and the different-layer second connection line 245 are formed thereon (see FIGS. 3 and 4). Also, the lead-out wiring 25 connected to the terminal 67 from the interlayer insulating film 83 to the peripheral region 11 beyond the edges of the interlayer insulating film 83, the base insulating film 81, and the sealing film 70 is a different layer first connection line. 235 and the different layer second connection line 245 are formed at the same time.
  • FIG. 18F shows a process of forming a protective film 85 or the like that covers the touch sensor 20.
  • the protective film 85 is formed so as to cover the entire touch sensor 20 and further the lead-out wiring 25 and the terminal 67.
  • the protective film 85 is made of an organic insulating material such as acrylic resin.
  • a circularly polarizing film 87 is disposed on the protective film 85, and a cover film 89 is disposed on the circularly polarizing film 87.
  • the FPC 13 is connected to the terminal 68 not covered with the protective film 85 via the anisotropic conductive member 139.
  • the touch sensor 20 includes the first electrode 21 and the second electrode 22 that configure the drive electrode and the detection electrode of the capacitive touch sensor. 20 may further include an electrode for realizing a pressure-sensitive function in addition to these electrodes.
  • an organic EL display device has been exemplified as a disclosure example, but as other application examples, a liquid crystal display device, another self-luminous display device, or an electronic paper display device having an electrophoretic element or the like Any flat panel display device can be used. Moreover, it cannot be overemphasized that it can apply, without specifically limiting from a small size to a large size.

Abstract

Provided is a touch sensor, comprising: a plurality of first electrodes which have been arrayed two-dimensionally, wherein the first electrodes that are adjacent in a first direction are connected via first connection wires of either the same layer as or a different layer from the first electrodes; a plurality of second electrodes which have been arrayed two-dimensionally in the same layer as the first electrodes and which are respectively surrounded by the first electrodes, wherein the second electrodes that are adjacent in a second direction are connected via second connection wires of the same layer as or a different layer from the first electrodes and the second electrodes and which intersect the first connection wires in plan view; and an insulation film which is interposed between the first connection wires and the second connection wires. First intersection parts whereat the first connection wires of the same layer as the first electrodes and the second electrodes intersect with the second connection wires of the different layer from the first electrodes and the second electrodes are adjacent to second intersection parts whereat the first connection wires of the different layer from the first electrodes and the second electrodes intersect with the second connection wires of the same layer as the first electrodes and the second electrodes.

Description

タッチセンサ及びタッチセンサ内蔵表示装置Touch sensor and display device with built-in touch sensor
　本発明は、タッチセンサ及びタッチセンサ内蔵表示装置に関する。 The present invention relates to a touch sensor and a display device with a built-in touch sensor.
　特許文献１には、隣り合う本体部が接続部を介して接続されたＸ方向に延びる第１の電極と、隣り合う本体部が接続部を介して接続されたＹ方向に延びる第２の電極とが封止膜を挟んで配置された静電容量方式タッチセンサを内蔵する表示装置が開示されている。 In Patent Document 1, a first electrode extending in the X direction in which adjacent main body portions are connected via a connecting portion, and a second electrode extending in the Y direction in which adjacent main body portions are connected via a connecting portion. Discloses a display device incorporating a capacitive touch sensor arranged with a sealing film interposed therebetween.
特開２０１５－５０２４５号公報Japanese Patent Laying-Open No. 2015-50245
　ところで、本願の発明者らは、静電容量方式タッチセンサの２種類の電極を同層に形成することを検討している。この場合、第１電極の隣同士を接続する第１接続線と、第２電極の隣同士を接続する第２接続線との一方を、電極層とは絶縁膜を隔てた別の層に形成して他方と平面視で交差させる必要がある。しかし、例えば第１接続線のみを別の層に形成すると、向きが揃った多数の形状が配列することになるため、交差部が視認されやすくなるおそれがある。 By the way, the inventors of the present application are considering forming two types of electrodes of the capacitive touch sensor in the same layer. In this case, one of the first connection line that connects the adjacent first electrodes and the second connection line that connects the adjacent second electrodes is formed in another layer separated from the electrode layer by an insulating film. Thus, it is necessary to cross the other in plan view. However, for example, if only the first connection line is formed in another layer, a large number of shapes having the same orientation are arranged, so that there is a possibility that the intersecting portion is easily visually recognized.
　本発明の目的は、交差部が視認されにくいタッチセンサ及びタッチセンサ内蔵表示装置を提供することにある。 An object of the present invention is to provide a touch sensor and a display device with a built-in touch sensor in which an intersection is difficult to visually recognize.
　上記課題を解決するため、本発明のタッチセンサは、２次元的に配列された複数の第１電極であって、第１方向に隣り合う第１電極が前記第１電極と同層又は異層の第１接続線を介して接続され、前記第１方向と交差する第２方向に隣り合う第１電極は接続されない、複数の第１電極と、前記第１電極と同層で２次元的に配列され、それぞれが前記第１電極に囲まれた複数の第２電極であって、前記第２方向に隣り合う第２電極が、前記第１接続線と平面視で交差する、前記第１電極及び前記第２電極と同層又は異層の第２接続線を介して接続され、前記第１方向に隣り合う第２電極は接続されない、複数の第２電極と、前記第１接続線と前記第２接続線との間に介在する絶縁膜と、を備え、前記第１電極及び前記第２電極と同層の前記第１接続線と前記第１電極及び前記第２電極と異層の第２接続線とが交差する第１交差部と、前記第１電極及び前記第２電極と異層の前記第１接続線と前記第１電極及び前記第２電極と同層の第２接続線とが交差する第２交差部と、が隣り合う。 In order to solve the above problems, the touch sensor of the present invention is a plurality of first electrodes arranged two-dimensionally, and the first electrodes adjacent in the first direction are the same layer or different layers from the first electrodes. The first electrodes adjacent to each other in the second direction crossing the first direction are not connected, and are two-dimensionally in the same layer as the first electrode. The plurality of second electrodes arranged and each surrounded by the first electrode, wherein the second electrodes adjacent in the second direction intersect the first connection line in plan view And a plurality of second electrodes, which are connected to the second electrode via a second connection line of the same layer or different layer, and are not connected to the second electrode adjacent in the first direction, and the first connection line and the An insulating film interposed between the first connecting line and the second connecting line, and the first layer and the second electrode in the same layer as the first connecting line. A first intersecting portion where a connection line intersects the first electrode and the second electrode and a second connection line of a different layer; the first connection line of the first electrode and the second electrode different from the first connection line; A first intersecting portion where the first electrode and the second electrode intersect with the second connection line in the same layer is adjacent.
　また、本発明のタッチセンサ内蔵表示装置は、表示部と、前記表示部上に形成された上記本発明のタッチセンサと、を備える。 The display device with a built-in touch sensor according to the present invention includes a display unit and the touch sensor according to the present invention formed on the display unit.
本発明の実施形態に係るタッチセンサ内蔵表示装置の平面図である。It is a top view of the display apparatus with a built-in touch sensor which concerns on embodiment of this invention. 図１及び図４に示すＩＩ－ＩＩ線で切断したときの断面図である。FIG. 5 is a cross-sectional view taken along line II-II shown in FIGS. 1 and 4. 図１及び図４に示すＩＩＩ－ＩＩＩ線で切断したときの断面図である。FIG. 5 is a cross-sectional view taken along line III-III shown in FIGS. 1 and 4. 本発明の第１実施形態に係るタッチセンサの平面図である。1 is a plan view of a touch sensor according to a first embodiment of the present invention. 本発明の第２実施形態に係るタッチセンサの平面図である。It is a top view of the touch sensor which concerns on 2nd Embodiment of this invention. 本発明の第３実施形態に係るタッチセンサの平面図である。It is a top view of the touch sensor which concerns on 3rd Embodiment of this invention. 接続線の構成例を示す平面図である。It is a top view which shows the structural example of a connection line. 電極と異層接続線との接続例を示す平面図である。It is a top view which shows the example of a connection of an electrode and a different layer connection line. 図８Ａに示す８Ｂ－８Ｂ線で切断したときの断面図である。FIG. 8B is a sectional view taken along line 8B-8B shown in FIG. 8A. 図８Ａに示す８Ｃ－８Ｃ線で切断したときの断面図である。FIG. 8B is a sectional view taken along line 8C-8C shown in FIG. 8A. 電極と異層接続線との接続例を示す平面図である。It is a top view which shows the example of a connection of an electrode and a different layer connection line. 図９Ａに示す９Ｂ－９Ｂ線で切断したときの断面図である。FIG. 9B is a sectional view taken along line 9B-9B shown in FIG. 9A. 図９Ａに示す９Ｃ－９Ｃ線で切断したときの断面図である。FIG. 9B is a sectional view taken along line 9C-9C shown in FIG. 9A. 接続線の構成例を示す平面図である。It is a top view which shows the structural example of a connection line. 本発明の第４実施形態に係るタッチセンサの平面図である。It is a top view of the touch sensor which concerns on 4th Embodiment of this invention. 電極と画素との配置例を示す平面図である。It is a top view which shows the example of arrangement | positioning of an electrode and a pixel. 電極と画素との配置例を示す平面図である。It is a top view which shows the example of arrangement | positioning of an electrode and a pixel. 電極と画素との配置例を示す平面図である。It is a top view which shows the example of arrangement | positioning of an electrode and a pixel. 本発明の第５実施形態に係るタッチセンサの平面図である。It is a top view of the touch sensor which concerns on 5th Embodiment of this invention. 本発明の第６実施形態に係るタッチセンサの平面図である。It is a top view of the touch sensor which concerns on 6th Embodiment of this invention. 本発明の第７実施形態に係るタッチセンサの平面図である。It is a top view of the touch sensor which concerns on 7th Embodiment of this invention. タッチセンサ内蔵表示装置の製造工程例を示す図である。It is a figure which shows the example of a manufacturing process of the display apparatus with a built-in touch sensor. 図１８Ａに続く図である。It is a figure following FIG. 18A. 図１８Ｂに続く図である。It is a figure following FIG. 18B. 図１８Ｃに続く図である。It is a figure following FIG. 18C. 図１８Ｄに続く図である。It is a figure following FIG. 18D. 図１８Ｅに続く図である。It is a figure following FIG. 18E.
　以下に、本発明の各実施の形態について、図面を参照しつつ説明する。なお、開示はあくまで一例にすぎず、当業者において、発明の主旨を保っての適宜変更について容易に想到し得るものについては、当然に本発明の範囲に含有されるものである。また、図面は説明をより明確にするため、実施の形態に比べ、各部の幅、厚さ、形状等について模式的に表される場合があるが、あくまで一例であって、本発明の解釈を限定するものではない。また、本明細書と各図において、既出の図に関して前述したものと同様の要素には、同一の符号を付して、詳細な説明を適宜省略することがある。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. It should be noted that the disclosure is merely an example, and those skilled in the art can easily conceive of appropriate modifications while maintaining the gist of the invention are naturally included in the scope of the present invention. In addition, the drawings may be schematically represented with respect to the width, thickness, shape, and the like of each part as compared with the embodiment for clarity of explanation, but are merely examples, and the interpretation of the present invention may be It is not limited. In addition, in the present specification and each drawing, elements similar to those described above with reference to the previous drawings are denoted by the same reference numerals, and detailed description may be omitted as appropriate.
　さらに、本発明の実施形態の詳細な説明において、ある構成物と他の構成物の位置関係を規定する際、「上に」「下に」とは、ある構成物の直上あるいは直下に位置する場合のみでなく、特に断りの無い限りは、間にさらに他の構成物を介在する場合を含むものとする。 Furthermore, in the detailed description of the embodiment of the present invention, when defining the positional relationship between a certain component and another component, “above” and “below” are located immediately above or directly below a certain component. In addition to the case, unless otherwise specified, the case where other components are further interposed is included.
　図１は、実施形態に係るタッチセンサ内蔵表示装置（以下、単に表示装置ともいう）の平面図である。表示装置の例として、有機ＥＬ表示装置を挙げる。表示装置１は、例えば赤、緑及び青からなる複数色の単位画素（サブピクセル）を組み合わせてフルカラーの画素を形成し、フルカラーの画像を表示するようになっている。表示装置１は、表示パネル１０と、表示パネル１０の表示領域上に形成されたタッチセンサ２０とを有している。表示パネル１０の表示領域の外側には周辺領域（額縁領域）１１が形成されており、周辺領域１１には外部との電気的接続のためのＦＰＣ１３が接続されている。以下の説明においては、ＦＰＣ１３が接続される周辺領域１１に沿った方向をＸ方向とし、それと直交する方向をＹ方向とする。 FIG. 1 is a plan view of a display device with a built-in touch sensor (hereinafter also simply referred to as a display device) according to an embodiment. An organic EL display device is given as an example of the display device. The display device 1 is configured to display a full-color image by forming a full-color pixel by combining a plurality of color unit pixels (sub-pixels) composed of, for example, red, green, and blue. The display device 1 includes a display panel 10 and a touch sensor 20 formed on the display area of the display panel 10. A peripheral region (frame region) 11 is formed outside the display region of the display panel 10, and an FPC 13 for electrical connection with the outside is connected to the peripheral region 11. In the following description, the direction along the peripheral region 11 to which the FPC 13 is connected is defined as the X direction, and the direction orthogonal thereto is defined as the Y direction.
　図２は、図１及び図４に示すＩＩ－ＩＩ線で切断したときの断面図である。図３は、図１及び図４に示すＩＩＩ－ＩＩＩ線で切断したときの断面図である。これらの図では、断面構造を見易くするため、基板３０、平坦化膜５１及び層間絶縁膜５３などの一部の層のハッチングを省略している。以下の説明では、積層方向を上方向とする。 FIG. 2 is a cross-sectional view taken along the line II-II shown in FIG. 1 and FIG. FIG. 3 is a cross-sectional view taken along the line III-III shown in FIGS. In these drawings, hatching of some layers such as the substrate 30, the planarizing film 51, and the interlayer insulating film 53 is omitted in order to make the cross-sectional structure easy to see. In the following description, the stacking direction is the upward direction.
　基板３０は、例えばガラス、又はポリイミド等の可撓性がある樹脂からなる。基板３０の上面はアンダーコート層３１によって覆われている。アンダーコート層３１上には半導体層４１が形成されており、半導体層４１はゲート絶縁膜３３によって覆われている。ゲート絶縁膜３３上にはゲート電極４３が形成されており、ゲート電極４３はパシベーション膜３５によって覆われている。ドレイン電極４５及びソース電極４７は、ゲート絶縁膜３３とパシベーション膜３５とを貫通して半導体層４１に接続されている。半導体層４１、ゲート電極４３、ドレイン電極４５及びソース電極４７により薄膜トランジスタ４０が構成される。薄膜トランジスタ４０は、複数の単位画素のそれぞれに対応するように設けられている。アンダーコート層３１、ゲート絶縁膜３３及びパシベーション膜３５は、例えばＳｉＯ２又はＳｉＮ等の無機絶縁材料で形成されている。 The substrate 30 is made of a flexible resin such as glass or polyimide. The upper surface of the substrate 30 is covered with an undercoat layer 31. A semiconductor layer 41 is formed on the undercoat layer 31, and the semiconductor layer 41 is covered with a gate insulating film 33. A gate electrode 43 is formed on the gate insulating film 33, and the gate electrode 43 is covered with a passivation film 35. The drain electrode 45 and the source electrode 47 are connected to the semiconductor layer 41 through the gate insulating film 33 and the passivation film 35. The semiconductor layer 41, the gate electrode 43, the drain electrode 45, and the source electrode 47 constitute a thin film transistor 40. The thin film transistor 40 is provided so as to correspond to each of the plurality of unit pixels. The undercoat layer 31, the gate insulating film 33, and the passivation film 35 are made of an inorganic insulating material such as SiO 2 or SiN.
　パシベーション膜３５上には、ドレイン電極４５及びソース電極４７に加えて、周辺領域１１に引き出し配線４９が形成されている。引き出し配線４９は、タッチセンサ２０とＦＰＣ１３とを電気的に接続するための配線である。ドレイン電極４５、ソース電極４７及び引き出し配線４９は平坦化膜５１によって覆われており、平坦化膜５１は層間絶縁膜５３によって覆われている。ドレイン電極４５、ソース電極４７及び引き出し配線４９は、例えばＡｌ、Ａｇ、Ｃｕ、Ｎｉ、Ｔｉ、Ｍｏ等を含む導電性材料で形成されている。平坦化膜５１は、例えばアクリル樹脂等の有機絶縁材料で形成され、平坦な上面を有している。層間絶縁膜５３は、例えばＳｉＯ２又はＳｉＮ等の無機絶縁材料で形成されている。 On the passivation film 35, in addition to the drain electrode 45 and the source electrode 47, a lead wiring 49 is formed in the peripheral region 11. The lead wiring 49 is a wiring for electrically connecting the touch sensor 20 and the FPC 13. The drain electrode 45, the source electrode 47, and the lead wiring 49 are covered with a planarizing film 51, and the planarizing film 51 is covered with an interlayer insulating film 53. The drain electrode 45, the source electrode 47, and the lead-out wiring 49 are made of a conductive material including, for example, Al, Ag, Cu, Ni, Ti, Mo, or the like. The planarizing film 51 is formed of an organic insulating material such as acrylic resin and has a flat upper surface. The interlayer insulating film 53 is formed of an inorganic insulating material such as SiO 2 or SiN.
　層間絶縁膜５３上には画素電極６１（例えば陽極）が形成されている。画素電極６１は、平坦化膜５１と層間絶縁膜５３とを貫通してソース電極４７に接続されている。画素電極６１は、複数の単位画素のそれぞれに対応するように設けられている。画素電極６１は反射電極として形成されている。また、周辺領域１１には端子６７，６８が形成されており、平坦化膜５１と層間絶縁膜５３とを貫通して引き出し配線４９の両方の端部にそれぞれ接続されている。画素電極６１及び端子６７，６８は、例えばＡｌ、Ａｇ、Ｃｕ、Ｎｉ、Ｔｉ、Ｍｏ等を含む導電性材料や、ＩＴＯ、ＩＺＯ等の導電性酸化物を含んで形成されている。 A pixel electrode 61 (for example, an anode) is formed on the interlayer insulating film 53. The pixel electrode 61 passes through the planarization film 51 and the interlayer insulating film 53 and is connected to the source electrode 47. The pixel electrode 61 is provided so as to correspond to each of the plurality of unit pixels. The pixel electrode 61 is formed as a reflective electrode. Further, terminals 67 and 68 are formed in the peripheral region 11 and are connected to both ends of the lead-out wiring 49 through the planarizing film 51 and the interlayer insulating film 53. The pixel electrode 61 and the terminals 67 and 68 are formed to include a conductive material including, for example, Al, Ag, Cu, Ni, Ti, Mo, or the like, or a conductive oxide such as ITO or IZO.
　画素電極６１は画素分離膜５５によって覆われている。画素分離膜５５はリブ又はバンクとも呼ばれる。画素分離膜５５には、画素電極６１が底に露出する開口５５ａが形成されている。開口５５ａを形成する画素分離膜５５の内縁部分は画素電極６１の周縁部分に載っており、上方に向かうに従って外方に広がるテーパー形状を有している。なお、画素分離膜５５は、周辺領域１１には形成されない。画素分離膜５５は、例えばアクリル樹脂やポリイミド樹脂等の有機材料で形成されている。 The pixel electrode 61 is covered with a pixel separation film 55. The pixel isolation film 55 is also called a rib or a bank. The pixel separation film 55 is formed with an opening 55a through which the pixel electrode 61 is exposed to the bottom. The inner edge portion of the pixel separation film 55 that forms the opening 55a is placed on the peripheral edge portion of the pixel electrode 61, and has a tapered shape that spreads outward as it goes upward. Note that the pixel isolation film 55 is not formed in the peripheral region 11. The pixel separation film 55 is formed of an organic material such as acrylic resin or polyimide resin.
　画素分離膜５５の開口５５ａの底に露出した画素電極６１上には、発光層６３が互いに離れて個別に形成されている。発光層６３は、複数の単位画素のそれぞれに対応して例えば赤、緑及び青からなる複数色で発光する。発光層６３とともに、正孔輸送層、正孔注入層、電子輸送層及び電子注入層の少なくとも一層が形成されてもよい。発光層６３はマスクを用いて個別に蒸着形成される。発光層６３は、複数の単位画素に跨がり表示領域の全体に広がる一様な膜（いわゆるベタ膜）として蒸着形成されてもよく、その場合、発光層６３は白色で発光し、カラーフィルタによって例えば赤、緑及び青からなる複数色のそれぞれの成分が取り出される。なお、発光層６３は蒸着形成に限らず、塗布形成されてもよい。 On the pixel electrode 61 exposed at the bottom of the opening 55a of the pixel separation film 55, the light emitting layers 63 are formed separately from each other. The light emitting layer 63 emits light in a plurality of colors including, for example, red, green, and blue corresponding to each of the plurality of unit pixels. Along with the light emitting layer 63, at least one layer of a hole transport layer, a hole injection layer, an electron transport layer, and an electron injection layer may be formed. The light emitting layer 63 is formed by vapor deposition using a mask. The light emitting layer 63 may be formed by vapor deposition as a uniform film (so-called solid film) extending over the entire display region across a plurality of unit pixels. In that case, the light emitting layer 63 emits white light and is emitted by a color filter. For example, each component of a plurality of colors including red, green, and blue is extracted. The light emitting layer 63 is not limited to vapor deposition, and may be formed by coating.
　発光層６３及び画素分離膜５５は対向電極６５（例えば陰極）によって覆われている。対向電極６５は、複数の単位画素に跨がり表示領域の全体に広がる一様な膜（いわゆるベタ膜）として形成されている。発光層６３並びに発光層６３を挟む画素電極６１及び対向電極６５によって発光素子６０が構成され、発光層６３は画素電極６１と対向電極６５との間を流れる電流によって発光する。対向電極６５は、例えばＩＴＯ等の透明導電材料又はＭｇＡｇ等の金属薄膜で形成される。 The light emitting layer 63 and the pixel separation film 55 are covered with a counter electrode 65 (for example, a cathode). The counter electrode 65 is formed as a uniform film (so-called solid film) that extends over the entire display region across a plurality of unit pixels. A light emitting element 60 is configured by the light emitting layer 63 and the pixel electrode 61 and the counter electrode 65 sandwiching the light emitting layer 63, and the light emitting layer 63 emits light by a current flowing between the pixel electrode 61 and the counter electrode 65. The counter electrode 65 is formed of a transparent conductive material such as ITO or a metal thin film such as MgAg.
　画素分離膜５５及び対向電極６５は、封止膜（パシベーション膜）７０によって覆われることで封止され、水分から遮断される。封止膜７０は、例えば無機膜７１、有機膜７３及び無機膜７５を下からこの順に含む三層積層構造を有している。無機膜７１，７５は、例えばＳｉＯ２又はＳｉＮ等の無機絶縁材料で形成されている。有機膜７３は、例えばアクリル樹脂等の有機絶縁材料で形成されており、封止膜７０の上面の平坦化させる。なお、封止膜７０は周辺領域１１には形成されなくてもよい。特に、封止膜７０は、端子６７，６８上には形成されない。 The pixel separation film 55 and the counter electrode 65 are sealed by being covered with a sealing film (passivation film) 70 and shielded from moisture. The sealing film 70 has, for example, a three-layer structure including an inorganic film 71, an organic film 73, and an inorganic film 75 in this order from the bottom. The inorganic films 71 and 75 are made of an inorganic insulating material such as SiO 2 or SiN. The organic film 73 is made of an organic insulating material such as an acrylic resin, and planarizes the upper surface of the sealing film 70. Note that the sealing film 70 may not be formed in the peripheral region 11. In particular, the sealing film 70 is not formed on the terminals 67 and 68.
　本実施形態に係る表示装置１は、封止膜７０上にタッチセンサ２０を有している。封止膜７０上には下地絶縁膜８１が形成されている。下地絶縁膜８１は、例えばアクリル樹脂等の有機絶縁材料で形成されており、下地絶縁膜８１の上面の平坦化させる。下地絶縁膜８１上には、２次元的に配列された複数の第１電極２１と複数の第２電極２２とが形成されている。第１電極２１と第２電極２２とは、静電容量方式タッチセンサの駆動電極と検出電極とを構成する。タッチセンサ２０の詳細については後述する。第１電極２１及び第２電極２２は層間絶縁膜８３によって覆われている。層間絶縁膜８３は、例えばＳｉＯ２又はＳｉＮ等の無機絶縁材料又はアクリル樹脂等の有機絶縁材料で形成されている。 The display device 1 according to the present embodiment has the touch sensor 20 on the sealing film 70. A base insulating film 81 is formed on the sealing film 70. The base insulating film 81 is made of, for example, an organic insulating material such as acrylic resin, and the upper surface of the base insulating film 81 is planarized. On the base insulating film 81, a plurality of first electrodes 21 and a plurality of second electrodes 22 arranged in a two-dimensional manner are formed. The first electrode 21 and the second electrode 22 constitute a drive electrode and a detection electrode of a capacitive touch sensor. Details of the touch sensor 20 will be described later. The first electrode 21 and the second electrode 22 are covered with an interlayer insulating film 83. The interlayer insulating film 83 is formed of, for example, an inorganic insulating material such as SiO 2 or SiN or an organic insulating material such as acrylic resin.
　層間絶縁膜８３の周縁部には、引き出し配線２５が形成されている。引き出し配線２５は、層間絶縁膜８３に形成された開口（スルーホール）８３ａを通じて、第１電極２１又は第２電極２２に接続されている。引き出し配線２５は、層間絶縁膜８３上から層間絶縁膜８３、下地絶縁膜８１及び封止膜７０の縁を超えて周辺領域１１に至る。引き出し配線２５は、周辺領域１１に埋め込まれた引き出し配線４９に接続された２つの端子６７，６８のうち、タッチセンサ２０に近い端子６７に接続されている。一方、タッチセンサ２０から離れた端子６８には、異方導電部材１３９を介してＦＰＣ１３が接続されている。 The lead-out wiring 25 is formed on the peripheral edge of the interlayer insulating film 83. The lead-out wiring 25 is connected to the first electrode 21 or the second electrode 22 through an opening (through hole) 83 a formed in the interlayer insulating film 83. The lead wiring 25 extends from the interlayer insulating film 83 to the peripheral region 11 beyond the edges of the interlayer insulating film 83, the base insulating film 81, and the sealing film 70. The lead wiring 25 is connected to a terminal 67 close to the touch sensor 20 among the two terminals 67 and 68 connected to the lead wiring 49 embedded in the peripheral region 11. On the other hand, the FPC 13 is connected to a terminal 68 away from the touch sensor 20 via an anisotropic conductive member 139.
　図４は、第１実施形態に係るタッチセンサの平面図である。本実施形態に係るタッチセンサ２０は、下地絶縁膜８１と層間絶縁膜８３との間の層において２次元的に配列された複数の第１電極２１と複数の第２電極２２とを有している。 FIG. 4 is a plan view of the touch sensor according to the first embodiment. The touch sensor 20 according to the present embodiment includes a plurality of first electrodes 21 and a plurality of second electrodes 22 that are two-dimensionally arranged in a layer between the base insulating film 81 and the interlayer insulating film 83. Yes.
　第１電極２１と第２電極２２のそれぞれは、Ｘ方向（第１方向）とこれに交差（例えば直交）するＹ方向（第２方向）とを対角方向とする矩形状、いわゆる菱形状（ダイヤモンド形状）で形成されている。また、第１電極２１と第２電極２２のそれぞれは、金属等の導電性材料からなる網目状配線（メッシュ配線）で形成されている。第１電極２１と第２電極２２とは、例えばＡｌ、Ａｇ、Ｃｕ、Ｎｉ、Ｔｉ、Ｍｏ等を含む導電性材料で形成されている。これに限られず、第１電極２１と第２電極２２とは透明導電膜で形成されてもよい。 Each of the first electrode 21 and the second electrode 22 has a rectangular shape in which an X direction (first direction) and a Y direction (second direction) intersecting (for example, orthogonal to) the diagonal direction are diagonal, so-called rhombus ( Diamond shape). Further, each of the first electrode 21 and the second electrode 22 is formed by a mesh-like wiring (mesh wiring) made of a conductive material such as metal. The first electrode 21 and the second electrode 22 are formed of a conductive material containing, for example, Al, Ag, Cu, Ni, Ti, Mo, or the like. Without being limited thereto, the first electrode 21 and the second electrode 22 may be formed of a transparent conductive film.
　複数の第１電極２１はＸ方向とＹ方向とにそれぞれ並んで２次元的に配列されている。これらの第１電極２１のうち、Ｘ方向に隣り合う第１電極２１は第１接続線２３を介して接続されており、Ｙ方向に隣り合う第１電極２１は接続されていない。すなわち、複数の第１電極２１は、Ｘ方向に隣り合う第１電極２１が第１接続線２３を介して接続されることでＸ方向に延びる複数の電極列をそれぞれ形成しており、それぞれの電極列はＹ方向には電気的に分離されている。 The plurality of first electrodes 21 are two-dimensionally arranged side by side in the X direction and the Y direction, respectively. Among these first electrodes 21, the first electrodes 21 adjacent in the X direction are connected via the first connection line 23, and the first electrodes 21 adjacent in the Y direction are not connected. That is, each of the plurality of first electrodes 21 forms a plurality of electrode rows extending in the X direction by connecting the first electrodes 21 adjacent to each other in the X direction via the first connection line 23. The electrode rows are electrically separated in the Y direction.
　複数の第２電極２２もＸ方向とＹ方向とにそれぞれ並んで２次元的に配列されている。これらの第２電極２２のうち、Ｙ方向に隣り合う第２電極２２は第１接続線２３と平面視で交差する第２接続線２４を介して接続されており、Ｘ方向に隣り合う第２電極２２は接続されていない。すなわち、複数の第２電極２２は、Ｙ方向に隣り合う第２電極２２が第２接続線２４を介して接続されることでＹ方向に延びる複数の電極列を形成しており、それぞれの電極列はＸ方向には電気的に分離されている。 The plurality of second electrodes 22 are also two-dimensionally arranged in the X direction and the Y direction. Among these second electrodes 22, the second electrode 22 adjacent in the Y direction is connected via the second connection line 24 intersecting the first connection line 23 in plan view, and the second electrode 22 adjacent in the X direction. The electrode 22 is not connected. That is, the plurality of second electrodes 22 form a plurality of electrode rows extending in the Y direction by connecting the second electrodes 22 adjacent to each other in the Y direction via the second connection line 24. The columns are electrically separated in the X direction.
　それぞれの第２電極２２は、第１電極２１に囲まれるよう配置されている。例えば、それぞれの第２電極２２は、Ｘ方向とＹ方向の両方に交差する方向（例えば４５度又は－４５度の方向）に隣り合う第１電極２１の間に配置されており、４つの第１電極２１に囲まれている。第１電極２１と第２電極２２とは、互いに接触しないように間隔を空けることで電気的に分離されている。第１電極２１と第２電極２２とは、同層に配置されることで光の反射等に差が現れにくくなるため、視認されにくくなる。 Each second electrode 22 is disposed so as to be surrounded by the first electrode 21. For example, each of the second electrodes 22 is disposed between the first electrodes 21 adjacent to each other in a direction intersecting both the X direction and the Y direction (for example, a direction of 45 degrees or −45 degrees). Surrounded by one electrode 21. The first electrode 21 and the second electrode 22 are electrically separated by being spaced apart from each other so as not to contact each other. Since the first electrode 21 and the second electrode 22 are arranged in the same layer, a difference in light reflection or the like hardly occurs, so that the first electrode 21 and the second electrode 22 are hardly visually recognized.
　第１接続線２３と第２接続線２４とは平面視で交差している。平面視で交差する第１接続線２３と第２接続線２４との間には層間絶縁膜８３が介在しており、両者は電気的に分離されている。以下、第１接続線２３と第２電極２２とが平面視で交差する部分を「交差部２９」という。 The first connection line 23 and the second connection line 24 intersect in plan view. An interlayer insulating film 83 is interposed between the first connection line 23 and the second connection line 24 that intersect in plan view, and the two are electrically separated. Hereinafter, a portion where the first connection line 23 and the second electrode 22 intersect in plan view is referred to as an “intersection 29”.
　具体的には、それぞれの第１接続線２３は、第１電極２１及び第２電極２２と同層の第１接続線（以下、同層第１接続線２３１という）と、第１電極２１及び第２電極２２と異層の第１接続線（以下、異層第１接続線２３５という）との何れかで形成されている。同層第１接続線２３１は、層間絶縁膜８３下で第１電極２１と連続的に形成されている。一方、異層第１接続線２３５は、層間絶縁膜８３上に形成されており、層間絶縁膜８３に形成されたスルーホール８３ａを通じて第１電極２１に接続されている、いわゆるブリッジ配線である。 Specifically, each first connection line 23 includes a first connection line in the same layer as the first electrode 21 and the second electrode 22 (hereinafter referred to as the same layer first connection line 231), the first electrode 21, It is formed by either the second electrode 22 or a first connection line of a different layer (hereinafter referred to as a different layer first connection line 235). The same layer first connection line 231 is formed continuously with the first electrode 21 under the interlayer insulating film 83. On the other hand, the different layer first connection line 235 is a so-called bridge wiring formed on the interlayer insulating film 83 and connected to the first electrode 21 through a through hole 83 a formed in the interlayer insulating film 83.
　同様に、それぞれの第２接続線２４は、第１電極２１及び第２電極２２と同層の第２接続線（以下、同層第２接続線２４１という）と、第１電極２１及び第２電極２２と異層の第２接続線（以下、異層第２接続線２４５という）との何れかで形成されている。同層第２接続線２４１は、層間絶縁膜８３下で第２電極２２と連続的に形成されている。一方、異層第２接続線２４５は、層間絶縁膜８３上に形成されており、層間絶縁膜８３に形成されたスルーホール８３ａを通じて第２電極２２に接続されている、いわゆるブリッジ配線である。 Similarly, each of the second connection lines 24 includes a second connection line in the same layer as the first electrode 21 and the second electrode 22 (hereinafter referred to as the same layer second connection line 241), and the first electrode 21 and the second electrode 22. It is formed by either the electrode 22 or a second connection line of a different layer (hereinafter referred to as a different layer second connection line 245). The same layer second connection line 241 is formed continuously with the second electrode 22 under the interlayer insulating film 83. On the other hand, the different layer second connection line 245 is a so-called bridge wiring formed on the interlayer insulating film 83 and connected to the second electrode 22 through a through hole 83 a formed in the interlayer insulating film 83.
　このため、それぞれの交差部２９は、同層第１接続線２３１と異層第２接続線２４５とが交差する「第１交差部２９１」と、異層第１接続線２３５と同層第２接続線２４１とが交差する「第２交差部２９２」との何れかで形成されている。 Therefore, each of the intersecting portions 29 includes a “first intersecting portion 291” where the same-layer first connection line 231 and the different-layer second connection line 245 intersect, and a different-layer first connection line 235 and the same-layer second connection line 245. It is formed by any one of the “second intersecting portions 292” intersecting with the connection line 241.
　なお、本実施形態では、層間絶縁膜８３が表示領域全体に形成されているが、これに限られず、層間絶縁膜８３は、それぞれの交差部２９に分散して配置されてもよい。すなわち、層間絶縁膜８３は、第１交差部２９１における同層第１接続線２３１と異層第２接続線２４５との間に介在し、第２交差部２９２における異層第１接続線２３５と同層第２接続線２４１との間に介在すれば、第１電極２１と第２電極２２とを覆わなくてもよい。 In the present embodiment, the interlayer insulating film 83 is formed over the entire display region, but the present invention is not limited to this, and the interlayer insulating film 83 may be distributed at each intersection 29. That is, the interlayer insulating film 83 is interposed between the same-layer first connection line 231 and the different-layer second connection line 245 at the first intersection 291, and the different-layer first connection line 235 at the second intersection 292 and The first electrode 21 and the second electrode 22 may not be covered as long as they are interposed between the second connection lines 241 in the same layer.
　本実施形態のタッチセンサ２０において、第１交差部２９１と第２交差部２９２とは隣り合うように配置されている。なお、全てにおいて第１交差部２９１と第２交差部２９２とが隣り合っている必要はなく、第１交差部２９１同士が隣り合うところが含まれていてもよいし、第２交差部２９２同士が隣り合うところが含まれていてもよい。 In the touch sensor 20 of the present embodiment, the first intersection 291 and the second intersection 292 are arranged adjacent to each other. In addition, the 1st crossing part 291 and the 2nd crossing part 292 do not need to be adjacent in all, and the place where the 1st crossing part 291 adjoins may be included, and the 2nd crossing part 292 Adjacent locations may be included.
　第１交差部２９１に最も近い複数の交差部２９の少なくとも１つ（本実施形態では、最も近い４つの交差部２９の全て）が第２交差部２９２とされている。同様に、第２交差部２９２に最も近い複数の交差部２９の少なくとも１つ（本実施形態では、最も近い４つの交差部２９の全て）が第１交差部２９１とされている。 At least one of the plurality of intersections 29 closest to the first intersection 291 (all of the four intersections 29 closest in the present embodiment) is defined as the second intersection 292. Similarly, at least one of the plurality of intersections 29 closest to the second intersection 292 (all of the four intersections 29 closest in this embodiment) is defined as the first intersection 291.
　第１交差部２９１と第２交差部２９２とは、Ｘ方向とＹ方向とのそれぞれにおいて交互に配列しており、いわゆる市松模様的に配列している。第１交差部２９１と第２交差部２９２とは、１つ置きに限られず、２つ以上置きに配列してもよい。第１交差部２９１と第２交差部２９２とが周期的に出現すればよい。 The first intersection 291 and the second intersection 292 are alternately arranged in the X direction and the Y direction, and are arranged in a so-called checkered pattern. The first intersection 291 and the second intersection 292 are not limited to every other one, and may be arranged every two or more. The 1st crossing part 291 and the 2nd crossing part 292 should just appear periodically.
　第１交差部２９１と第２交差部２９２とは、一定面積当たりの数が同じであることが好ましい。一定面積は、表示領域の全体であってもよいし、例えば表示領域の中央部などの一部であってもよい。一定面積当たりの数が同じであれば、第１交差部２９１と第２交差部２９２とはランダムに配置されてもよい。 It is preferable that the first intersection 291 and the second intersection 292 have the same number per fixed area. The fixed area may be the entire display area, or may be a part of the center of the display area, for example. If the number per fixed area is the same, the first intersection 291 and the second intersection 292 may be randomly arranged.
　本実施形態のように、ブリッジ配線の向きが互いに異なる第１交差部２９１と第２交差部２９２とが隣り合って配置されることで、向きが揃ったブリッジ配線のみが配置される場合と比較して、交差部２９が視認されにくくなり、表示装置１の画質を良好に保つことが可能である。 Compared to the case where only the bridge wirings having the same orientation are arranged by arranging the first intersection part 291 and the second intersection part 292 adjacent to each other in different directions as in the present embodiment. As a result, the crossing portion 29 becomes difficult to be visually recognized, and the image quality of the display device 1 can be kept good.
　図５は、第２実施形態に係るタッチセンサの平面図である。第２実施形態では、第１交差部２９１と第２交差部２９２とは、Ｘ方向においてのみ交互に配列しており、Ｙ方向には交互に配列しておらず、同じものが並んでいる。すなわち、第１交差部２９１に最も近い４つの交差部２９のうちＸ方向に隣り合う２つが第２交差部２９２とされている。第２交差部２９２についても同様である。第２実施形態においても、第１実施形態ほどではないにしても、交差部２９が視認されにくくなる効果が得られる。 FIG. 5 is a plan view of the touch sensor according to the second embodiment. In the second embodiment, the first intersecting portions 291 and the second intersecting portions 292 are alternately arranged only in the X direction and are not arranged alternately in the Y direction, and the same ones are arranged. That is, two of the four intersections 29 closest to the first intersection 291 are adjacent to each other in the X direction as the second intersection 292. The same applies to the second intersection 292. Even in the second embodiment, even if not as much as in the first embodiment, there is an effect that the crossing portion 29 is less likely to be visually recognized.
　図６は、第３実施形態に係るタッチセンサの平面図である。第３実施形態では、第１交差部２９１と第２交差部２９２とは、Ｙ方向においてのみ交互に配列しており、Ｘ方向には交互に配列しておらず、同じものが並んでいる。すなわち、第１交差部２９１に最も近い４つの交差部２９のうちＹ方向に隣り合う２つが第２交差部２９２とされている。第２交差部２９２についても同様である。第３実施形態においても、第１実施形態ほどではないにしても、交差部２９が視認されにくくなる効果が得られる。 FIG. 6 is a plan view of the touch sensor according to the third embodiment. In the third embodiment, the first intersecting portions 291 and the second intersecting portions 292 are alternately arranged only in the Y direction, and are not arranged alternately in the X direction. That is, two of the four intersections 29 closest to the first intersection 291 are adjacent to each other in the Y direction as the second intersection 292. The same applies to the second intersection 292. Even in the third embodiment, the effect of making the crossing portion 29 less likely to be visually recognized is obtained, although not as much as in the first embodiment.
　なお、例えば第１電極２１を駆動電極とし、第２電極２２を検出電極とする場合、検出電極である第２電極２２のそれぞれの電極列は、第２実施形態では同層第２接続線２４１と異層第２接続線２４５との一方のみしか含まないのに対し、第３実施形態では同層第２接続線２４１と異層第２接続線２４５との両方を交互に含む。このため、検出電極である第２電極２２の電極列の電気抵抗を揃えるという観点では、第３実施形態の採用が好ましい。 For example, when the first electrode 21 is a drive electrode and the second electrode 22 is a detection electrode, each electrode row of the second electrode 22 that is a detection electrode is the same layer second connection line 241 in the second embodiment. In the third embodiment, both the same-layer second connection lines 241 and the different-layer second connection lines 245 are alternately included. For this reason, it is preferable to employ the third embodiment from the viewpoint of aligning the electric resistances of the electrode arrays of the second electrodes 22 that are detection electrodes.
　図７は、接続線の構成例を示す平面図である。同図では、第２交差部２９２を拡大して示しているが、第１交差部２９１についても同様に構成される。この例では、異層第１接続線２３５も同層第２接続線２４１も複数の金属線で形成されている。具体的には、異層第１接続線２３５は、層間絶縁膜８３上に形成された２本の金属線からなり、２本の金属線のそれぞれの端部は、スルーホール８３ａを通じて第１電極２１のＸ方向の端部に接続されている。 FIG. 7 is a plan view showing a configuration example of connection lines. In the figure, the second intersection 292 is shown in an enlarged manner, but the first intersection 291 is similarly configured. In this example, the different layer first connection line 235 and the same layer second connection line 241 are formed of a plurality of metal wires. Specifically, the different layer first connection line 235 includes two metal lines formed on the interlayer insulating film 83, and ends of the two metal lines are connected to the first electrode through the through holes 83a. 21 is connected to the end of the X direction.
　異層第１接続線２３５を形成する複数の金属線のそれぞれの端部は、スルーホール８３ａを含むようパッド状に広がる拡大部を有してもよい。この場合、拡大部は画素１００（図１２を参照）の表示を阻害しない大きさであることが望ましい。また、異層第１接続線２３５又は同層第２接続線２４１を形成する２本の金属線の間隔は、網目状配線として形成された第１電極２１又は第２電極２２の端部（例えば、端部を構成する１つの目）の幅と同じであることが望ましい。 Each end portion of the plurality of metal wires forming the different layer first connection line 235 may have an enlarged portion that extends in a pad shape so as to include the through hole 83a. In this case, it is desirable that the enlarged portion has a size that does not hinder the display of the pixel 100 (see FIG. 12). Further, the interval between the two metal lines forming the different layer first connection line 235 or the same layer second connection line 241 is the end of the first electrode 21 or the second electrode 22 formed as a mesh wiring (for example, It is desirable that the width is the same as the width of one eye constituting the end portion.
　図８Ａ～図８Ｃは、電極と異層接続線との接続例を示す図である。図９Ａ～図９Ｃは、他の接続例を示す図である。これらの図では、第１電極２１と異層第１接続線２３５との接続部分を拡大して示しているが、第２電極２２と異層第２接続線２４５との接続部分についても同様に構成される。層間絶縁膜８３に形成されたスルーホール８３ａの底には第１電極２１が露出し、層間絶縁膜８３上に形成された異層第１接続線２３５は、スルーホール８３ａを通じて第１電極２１に接続されている。 8A to 8C are diagrams showing examples of connection between electrodes and different layer connection lines. 9A to 9C are diagrams showing other connection examples. In these drawings, the connection portion between the first electrode 21 and the different layer first connection line 235 is shown in an enlarged manner, but the connection portion between the second electrode 22 and the different layer second connection line 245 is similarly shown. Composed. The first electrode 21 is exposed at the bottom of the through hole 83a formed in the interlayer insulating film 83, and the different-layer first connection line 235 formed on the interlayer insulating film 83 is connected to the first electrode 21 through the through hole 83a. It is connected.
　図８Ａ～図８Ｃに示すように、異層第１接続線２３５の線幅は、網目状配線として形成された第１電極２１の線幅と同じであってよい。また、スルーホール８３ａの幅は、第１電極２１の線幅より小さくてよく、この場合、スルーホール８３ａの底の全部に第１電極２１が露出し、スルーホール８３ａの底の全部に異層第１接続線２３５が形成される。 As shown in FIGS. 8A to 8C, the line width of the different-layer first connection line 235 may be the same as the line width of the first electrode 21 formed as a mesh-like wiring. Further, the width of the through hole 83a may be smaller than the line width of the first electrode 21. In this case, the first electrode 21 is exposed at the entire bottom of the through hole 83a, and a different layer is formed at the entire bottom of the through hole 83a. A first connection line 235 is formed.
　図９Ａ～図９Ｃに示すように、異層第１接続線２３５の線幅は、第１電極２１の線幅より大きくてもよい。但し、異層第１接続線２３５の線幅は、画素１００（図１２を参照）の表示を阻害しない大きさであることが望ましい。また、スルーホール８３ａの幅は、第１電極２１や異層第１接続線２３５の線幅より大きくてもよく、この場合、スルーホール８３ａの底の一部に第１電極２１が露出し、スルーホール８３ａの底の一部に異層第１接続線２３５が形成される。この例は、第１電極２１の線幅が小さく、平面視で第１電極２１の内側にスルーホール８３ａを収めることが困難である場合に有用である。 As shown in FIGS. 9A to 9C, the line width of the different layer first connection line 235 may be larger than the line width of the first electrode 21. However, the line width of the different-layer first connection line 235 is desirably a size that does not hinder the display of the pixel 100 (see FIG. 12). Further, the width of the through hole 83a may be larger than the line width of the first electrode 21 or the different layer first connection line 235. In this case, the first electrode 21 is exposed at a part of the bottom of the through hole 83a, A different layer first connection line 235 is formed at a part of the bottom of the through hole 83a. This example is useful when the line width of the first electrode 21 is small and it is difficult to fit the through hole 83a inside the first electrode 21 in plan view.
　図１０は、接続線の構成例を示す平面図である。同図では、第２交差部２９２を拡大して示しているが、第１交差部２９１についても同様に構成される。この例では、異層第１接続線２３５は透明導電膜で形成され、同層第２接続線２４１は複数の金属線で形成されている。具体的には、異層第１接続線２３５は、層間絶縁膜８３上に形成された例えばＩＴＯ等の透明導電膜からなり、透明導電膜のＸ方向の端部は、複数のスルーホール８３ａを通じて第１電極２１のＸ方向の端部に接続されている。 FIG. 10 is a plan view showing a configuration example of connection lines. In the figure, the second intersection 292 is shown in an enlarged manner, but the first intersection 291 is similarly configured. In this example, the different layer first connection line 235 is formed of a transparent conductive film, and the same layer second connection line 241 is formed of a plurality of metal lines. Specifically, the different-layer first connection line 235 is made of a transparent conductive film such as ITO formed on the interlayer insulating film 83, and an end portion of the transparent conductive film in the X direction passes through a plurality of through holes 83a. The first electrode 21 is connected to the end portion in the X direction.
　透明導電膜は金属よりも抵抗率が高いため、異層第１接続線２３５を形成する透明導電膜の幅は、網目状配線として形成された第１電極２１の線幅より広いことが望ましい。透明導電膜は透明であるため、画素１００（図１２を参照）と平面視で重なるように形成されてもよい。異層第１接続線２３５を形成する透明導電膜の長さ（Ｘ方向）が幅（Ｙ方向）より１．５倍以上長い場合に効果的である。なお、電気抵抗を低減する観点からは、透明導電膜の長さ（Ｘ方向）が幅（Ｙ方向）より１．５倍以上長くてもよい。 Since the transparent conductive film has a higher resistivity than the metal, the width of the transparent conductive film forming the different layer first connection line 235 is desirably wider than the line width of the first electrode 21 formed as a mesh-like wiring. Since the transparent conductive film is transparent, it may be formed so as to overlap with the pixel 100 (see FIG. 12) in plan view. This is effective when the length (X direction) of the transparent conductive film forming the different layer first connection line 235 is 1.5 times longer than the width (Y direction). From the viewpoint of reducing the electrical resistance, the length (X direction) of the transparent conductive film may be 1.5 times or more longer than the width (Y direction).
　図１１は、第４実施形態に係るタッチセンサの平面図である。第４実施形態では、第１電極２１と第２電極２２とは層間絶縁膜８３上に配置されている。異層第１接続線２３５と異層第２接続線２４５とは層間絶縁膜８３下に配置されている。層間絶縁膜８３上に形成された第１電極２１と第２電極２２とは、スルーホール８３ａを通じて層間絶縁膜８３下に形成された異層第１接続線２３５と異層第２接続線２４５とにそれぞれ接続されている。 FIG. 11 is a plan view of the touch sensor according to the fourth embodiment. In the fourth embodiment, the first electrode 21 and the second electrode 22 are disposed on the interlayer insulating film 83. The different layer first connection line 235 and the different layer second connection line 245 are arranged under the interlayer insulating film 83. The first electrode 21 and the second electrode 22 formed on the interlayer insulating film 83 include a different layer first connection line 235 and a different layer second connection line 245 formed under the interlayer insulating film 83 through the through hole 83a. Are connected to each.
　これによると、第４実施形態では、他の実施形態と比較して第１電極２１と第２電極２２とが最表面により近づくため、タッチされた際の静電容量の変化が大きくなり、検出感度を向上させることが可能である。 According to this, in 4th Embodiment, since the 1st electrode 21 and the 2nd electrode 22 approach the outermost surface compared with other embodiment, the change of the electrostatic capacitance when touched becomes large, and it detects Sensitivity can be improved.
　図１２は、電極と画素との配置例を示す平面図である。図１３は、別の配置例を示す平面図である。表示パネル１０は、例えば赤、緑及び青からなる複数色の単位画素１０Ｒ，１０Ｇ，１０Ｂを有しており、複数色の単位画素１０Ｒ，１０Ｇ，１０Ｂの集合が画素１００を構成している。図１２は、Ｙ方向に延びる単位画素１０Ｒ，１０Ｇ，１０ＢがＸ方向に配列したいわゆるストライプ配列の例を示しており、図１３は、青色の単位画素１０Ｂを赤色及び緑色の単位画素１０Ｒ，１０Ｇよりも大きくした例を示している。単位画素１０Ｒ，１０Ｇ，１０Ｂのそれぞれは、画素電極６１を露出させる画素分離膜５５の開口５５ａにより区画されている（図２を参照）。 FIG. 12 is a plan view showing an arrangement example of electrodes and pixels. FIG. 13 is a plan view showing another arrangement example. The display panel 10 includes a plurality of unit pixels 10R, 10G, and 10B made of red, green, and blue, for example, and a set of the unit pixels 10R, 10G, and 10B of a plurality of colors constitutes the pixel 100. FIG. 12 shows an example of a so-called stripe arrangement in which unit pixels 10R, 10G, and 10B extending in the Y direction are arranged in the X direction. FIG. 13 shows that the blue unit pixel 10B is replaced with the red and green unit pixels 10R, 10G. It shows an example that is larger. Each of the unit pixels 10R, 10G, and 10B is partitioned by an opening 55a of the pixel separation film 55 that exposes the pixel electrode 61 (see FIG. 2).
　図１２及び図１３では、第２電極２２を拡大して示しているが、第１電極２１についても同様に構成される。第１電極２１又は第２電極２２を構成する網目状配線の各線は、画素分離膜５５の上方に配置されている。すなわち、網目状配線の各線は、平面視で画素分離膜５５と重なっており、単位画素１０Ｒ，１０Ｇ，１０Ｂを形成する開口５５ａとは重なっていない。網目状配線の各線の幅は、Ｘ方向又はＹ方向に隣り合う開口５５ａの間隔よりも狭い。また、網目状配線の開口（すなわち網目）のそれぞれは、平面視で１又は複数の画素１００を含んでいる。すなわち、網目状配線の網目ピッチは、単位画素１０Ｒ，１０Ｇ，１０Ｂの配列ピッチの整数倍になっている。 12 and 13 show the second electrode 22 in an enlarged manner, but the first electrode 21 is configured similarly. Each line of the mesh wiring constituting the first electrode 21 or the second electrode 22 is disposed above the pixel isolation film 55. That is, each line of the mesh wiring overlaps with the pixel separation film 55 in a plan view, and does not overlap with the opening 55a forming the unit pixels 10R, 10G, and 10B. The width of each line of the mesh-like wiring is narrower than the interval between the openings 55a adjacent to each other in the X direction or the Y direction. Each of the openings of the mesh wiring (that is, the mesh) includes one or a plurality of pixels 100 in plan view. That is, the mesh pitch of the mesh wiring is an integral multiple of the arrangement pitch of the unit pixels 10R, 10G, and 10B.
　このように、第１電極２１又は第２電極２２を構成する網目状配線の各線が画素分離膜５５の上方に配置されることで、単位画素１０Ｒ，１０Ｇ，１０Ｂから上方に向かう光が網目状配線によって阻害されない。なお、第１電極２１又は第２電極２２だけでなく、第１接続線２３又は第２接続線２４も同様に画素分離膜５５の上方に配置される。 As described above, each line of the mesh-like wiring constituting the first electrode 21 or the second electrode 22 is arranged above the pixel isolation film 55, so that light traveling upward from the unit pixels 10R, 10G, and 10B is mesh-like. Not disturbed by wiring. Note that not only the first electrode 21 or the second electrode 22 but also the first connection line 23 or the second connection line 24 are similarly disposed above the pixel isolation film 55.
　図１４は、電極と画素の他の配置例を示す平面図である。この例では、単位画素１０Ｒ，１０Ｇ，１０Ｂは、Ｘ方向とＹ方向とを対角方向とする矩形状、いわゆる菱形状（ダイヤモンド形状）で形成されている。単位画素１０Ｒ，１０Ｇ，１０Ｂは、Ｘ方向とＹ方向とを対角方向として、すなわちＸ方向とＹ方向の両方に交差する第３又は第４方向（例えば４５度又は－４５度の方向）にそれぞれ並んで２次元的に配列している。ここでは、１つの赤色の単位画素１０Ｒ、１つの青色の単位画素１０Ｂ及び２つの緑色の単位画素１０Ｇの集合が画素１００を構成する、いわゆるペンタイル配列が採用されている。 FIG. 14 is a plan view showing another arrangement example of electrodes and pixels. In this example, the unit pixels 10R, 10G, and 10B are formed in a rectangular shape in which the X direction and the Y direction are diagonal directions, a so-called rhombus shape (diamond shape). The unit pixels 10R, 10G, and 10B have the X direction and the Y direction as diagonal directions, that is, in a third or fourth direction (for example, a direction of 45 degrees or −45 degrees) that intersects both the X direction and the Y direction. They are arranged two-dimensionally side by side. Here, a so-called pen tile arrangement in which a group of one red unit pixel 10R, one blue unit pixel 10B, and two green unit pixels 10G constitutes the pixel 100 is employed.
　図１４では、第２電極２２を拡大して示しているが、第１電極２１についても同様に構成される。第１電極２１又は第２電極２２を構成する網目状配線の各線は、画素分離膜５５の上方に配置されるとともに、単位画素１０Ｒ，１０Ｇ，１０Ｂの配列方向と同様、Ｘ方向とＹ方向の両方に交差する第３又は第４方向（例えば４５度又は－４５度の方向）にそれぞれ延びている。網目状配線の各線の幅は、第３方向又は第４方向に隣り合う開口５５ａの間隔よりも狭い。また、網目状配線の開口（すなわち網目）のそれぞれは、平面視で１又は複数の画素１００を含んでいる。 FIG. 14 shows the second electrode 22 in an enlarged manner, but the first electrode 21 is similarly configured. Each line of the mesh-like wiring constituting the first electrode 21 or the second electrode 22 is disposed above the pixel isolation film 55, and is similar to the arrangement direction of the unit pixels 10R, 10G, and 10B in the X direction and the Y direction. It extends in a third or fourth direction intersecting both (for example, a direction of 45 degrees or -45 degrees). The width of each line of the mesh-like wiring is narrower than the interval between the openings 55a adjacent in the third direction or the fourth direction. Each of the openings of the mesh wiring (that is, the mesh) includes one or a plurality of pixels 100 in plan view.
　図１５は、第５実施形態に係るタッチセンサの平面図である。第５実施形態は、上記図１４に示す画素配列に適用される。第１電極２１又は第２電極２２を構成する網目状配線の各線と同様に、第１接続線２３と第２接続線２４とは、Ｘ方向とＹ方向の両方に交差する第３又は第４方向（例えば４５度又は－４５度の方向）にそれぞれ延びている。このように構成されることで、画素から上方に向かう光が第１接続線２３と第２接続線２４とによって阻害されない。 FIG. 15 is a plan view of the touch sensor according to the fifth embodiment. The fifth embodiment is applied to the pixel array shown in FIG. Similar to the lines of the mesh wiring constituting the first electrode 21 or the second electrode 22, the first connection line 23 and the second connection line 24 are the third or fourth that intersects both the X direction and the Y direction. Each extends in a direction (eg, 45 degrees or -45 degrees). By being configured in this way, the light traveling upward from the pixel is not obstructed by the first connection line 23 and the second connection line 24.
　具体的には、第１接続線２３又は第２接続線２４は、中央部が第３及び第４方向の一方に延び、その両側の端部が第３及び第４方向の他方に延びるように鉤状に折れ曲がっている。また、第１接続線２３及び第２接続線２４は、中央部同士が直交し、一方を９０度回転させたときに他方に重なるように構成されている。 Specifically, the first connection line 23 or the second connection line 24 has a central portion extending in one of the third and fourth directions, and end portions on both sides thereof extending in the other of the third and fourth directions. It is bent like a bowl. Further, the first connection line 23 and the second connection line 24 are configured such that the central portions are orthogonal to each other and overlap one another when one is rotated 90 degrees.
　また、第１交差部２９１と第２交差部２９２とは、Ｘ方向とＹ方向とのそれぞれにおいて交互に配列している。すなわち、第１交差部２９１に最も近い４つの交差部２９の全てが第２交差部２９２とされている。第２交差部２９２についても同様である。これによると、上記図１４に示す画素配列においても、上記実施形態と同様に交差部２９が視認されにくくなる効果が得られる。 Further, the first intersection 291 and the second intersection 292 are alternately arranged in each of the X direction and the Y direction. That is, all of the four intersections 29 closest to the first intersection 291 are the second intersections 292. The same applies to the second intersection 292. According to this, also in the pixel array shown in FIG. 14, the effect that the intersection 29 is hardly visually recognized can be obtained as in the above embodiment.
　図１６は、第６実施形態に係るタッチセンサの平面図である。第６実施形態は、上記図１４に示す画素配列に適用される。第１電極２１又は第２電極２２を構成する網目状配線の各線と同様に、第１接続線２３と第２接続線２４とは、Ｘ方向とＹ方向の両方に交差する第３又は第４方向（例えば４５度又は－４５度の方向）にそれぞれ延びている。このように構成されることで、画素から上方に向かう光が第１接続線２３と第２接続線２４とによって阻害されない。 FIG. 16 is a plan view of a touch sensor according to the sixth embodiment. The sixth embodiment is applied to the pixel array shown in FIG. Similar to the lines of the mesh wiring constituting the first electrode 21 or the second electrode 22, the first connection line 23 and the second connection line 24 are the third or fourth that intersects both the X direction and the Y direction. Each extends in a direction (eg, 45 degrees or -45 degrees). By being configured in this way, the light traveling upward from the pixel is not obstructed by the first connection line 23 and the second connection line 24.
　具体的には、Ｘ方向に隣り合う第１電極２１はＹ方向にオフセットして配置されており、第１接続線２３は、第３又は第４方向に全体として直線的に延びることで、Ｘ方向に隣り合う第１電極２１を接続している。また、Ｙ方向に隣り合う第２電極２２はＸ方向にオフセットして配置されており、第２接続線２４は、第３又は第４方向に全体的に直線に延びることで、Ｙ方向に隣り合う第２電極２２を接続している。 Specifically, the first electrodes 21 adjacent to each other in the X direction are arranged offset in the Y direction, and the first connection line 23 extends linearly as a whole in the third or fourth direction. The first electrodes 21 adjacent in the direction are connected. The second electrodes 22 adjacent to each other in the Y direction are arranged so as to be offset in the X direction, and the second connection line 24 extends linearly in the third or fourth direction so that it is adjacent to the Y direction. A matching second electrode 22 is connected.
　また、第１交差部２９１と第２交差部２９２とは、Ｘ方向とＹ方向とのそれぞれにおいて交互に配列している。すなわち、第１交差部２９１に最も近い４つの交差部２９の全てが第２交差部２９２とされている。第２交差部２９２についても同様である。これによると、上記図１４に示す画素配列においても、上記実施形態と同様に交差部２９が視認されにくくなる効果が得られる。 Further, the first intersection 291 and the second intersection 292 are alternately arranged in each of the X direction and the Y direction. That is, all of the four intersections 29 closest to the first intersection 291 are the second intersections 292. The same applies to the second intersection 292. According to this, also in the pixel array shown in FIG. 14, the effect that the intersection 29 is hardly visually recognized can be obtained as in the above embodiment.
　図１７は、第７実施形態に係るタッチセンサの平面図である。第７実施形態では、第１電極２１と第２電極２２との間に、第１電極２１と第２電極２２との何れにも接続されないダミー配線２７（第３の電極）が形成されている。ダミー配線２７は、第１電極２１と第２電極２２と同層で、第１電極２１と第２電極２２とに挟まれるように配置されている。これによると、第１電極２１と第２電極２２とのカップリングを低減できるので、タッチされた際の静電容量の変化が大きくなり、検出感度を向上させることが可能である。 FIG. 17 is a plan view of the touch sensor according to the seventh embodiment. In the seventh embodiment, a dummy wiring 27 (third electrode) that is not connected to any of the first electrode 21 and the second electrode 22 is formed between the first electrode 21 and the second electrode 22. . The dummy wiring 27 is disposed in the same layer as the first electrode 21 and the second electrode 22 so as to be sandwiched between the first electrode 21 and the second electrode 22. According to this, since the coupling between the first electrode 21 and the second electrode 22 can be reduced, the change in capacitance when touched is increased, and the detection sensitivity can be improved.
　なお、ダミー配線２７も、第１電極２１又は第２電極２２を構成する網目状配線の各線と同様に、画素分離膜５５の上方に配置されて単位画素１０Ｒ，１０Ｇ，１０Ｂから上方に向かう光を阻害しないことが望ましい。 The dummy wiring 27 is also disposed above the pixel isolation film 55 and travels upward from the unit pixels 10R, 10G, and 10B in the same manner as each line of the mesh wiring configuring the first electrode 21 or the second electrode 22. It is desirable not to inhibit.
　図１８Ａ～図１８Ｆは、タッチセンサ内蔵表示装置の製造工程例を示す図である。 FIG. 18A to FIG. 18F are diagrams showing an example of the manufacturing process of the display device with a built-in touch sensor.
　図１８Ａは、発光素子６０が完成した状態を示している。ここで、画素分離膜５５は、周辺領域１１には形成されない。以下、例えば画素分離膜５５の範囲を「表示領域」という。周辺領域１１には、層間絶縁膜５３及び端子６７，６８が露出している。なお、同図の切断面では、タッチセンサ２０に接続される引き出し配線４９及び端子６７，６８を示しているが、異なる位置では、発光素子６０の対向電極６５が引き出し配線４９及び端子６７，６８に接続される。 FIG. 18A shows a state where the light emitting element 60 is completed. Here, the pixel isolation film 55 is not formed in the peripheral region 11. Hereinafter, for example, the range of the pixel isolation film 55 is referred to as a “display region”. In the peripheral region 11, the interlayer insulating film 53 and the terminals 67 and 68 are exposed. In addition, in the cut surface of the same figure, the lead-out wiring 49 and the terminals 67 and 68 connected to the touch sensor 20 are shown. Connected to.
　図１８Ｂは、封止膜７０を形成する工程を示している。ここで、有機材料で形成された有機膜７３は表示領域を覆うように形成されればよく、周辺領域１１には形成されなくてもよい。詳しくは、有機膜７２の外縁は、画素分離膜５５の外縁よりも内側に位置しており、無機材料で形成された２層の無機膜７１，７３が密着することによって封止されている。このため、周辺領域１１は２層の無機膜７１，７３によって覆われている。以下、周辺領域１１を覆う２層の無機膜７１，７３を「周辺部７６」という。 FIG. 18B shows a process of forming the sealing film 70. Here, the organic film 73 formed of an organic material may be formed so as to cover the display region, and may not be formed in the peripheral region 11. Specifically, the outer edge of the organic film 72 is located on the inner side of the outer edge of the pixel separation film 55, and is sealed when two layers of inorganic films 71 and 73 formed of an inorganic material are in close contact with each other. For this reason, the peripheral region 11 is covered with two layers of inorganic films 71 and 73. Hereinafter, the two layers of inorganic films 71 and 73 covering the peripheral region 11 are referred to as “peripheral portions 76”.
　図１８Ｃは、下地絶縁膜８１を形成する工程を示している。ここで、下地絶縁膜８１は表示領域にのみ形成され、周辺領域１１には形成されない。詳しくは、下地絶縁膜８１の外縁は、画素分離膜５５の外縁よりも内側に位置し、封止膜７０の有機膜７２の外縁よりも外側に位置している。下地絶縁膜８１は、有機絶縁材料で形成されており、下地絶縁膜８１の上面の平坦化させるとともに、次工程の周辺部７６の除去に利用される。 FIG. 18C shows a step of forming the base insulating film 81. Here, the base insulating film 81 is formed only in the display region and not in the peripheral region 11. Specifically, the outer edge of the base insulating film 81 is located inside the outer edge of the pixel separation film 55 and located outside the outer edge of the organic film 72 of the sealing film 70. The base insulating film 81 is made of an organic insulating material, and is used to planarize the upper surface of the base insulating film 81 and to remove the peripheral portion 76 in the next process.
　図１８Ｄは、周辺部７６を除去する工程を示している。周辺部７６の除去は、下地絶縁膜８１をマスクとして行われる。詳しくは、２層の無機膜７１，７５は、下地絶縁膜８１の外縁の位置で、すなわち画素分離膜５５の外縁よりも内側かつ有機膜７３の外縁よりも外側の位置で切断される。なお、周辺部７６下の層間絶縁膜５３も無機膜７１，７５と同じ無機絶縁材料で形成されているので、周辺部７６の除去によって層間絶縁膜５３の一部又は全部も同時に除去されることがある。 FIG. 18D shows a process of removing the peripheral portion 76. The removal of the peripheral portion 76 is performed using the base insulating film 81 as a mask. Specifically, the two inorganic films 71 and 75 are cut at the outer edge of the base insulating film 81, that is, at a position inside the outer edge of the pixel isolation film 55 and outside the outer edge of the organic film 73. Since the interlayer insulating film 53 below the peripheral portion 76 is also formed of the same inorganic insulating material as the inorganic films 71 and 75, a part or all of the interlayer insulating film 53 is simultaneously removed by removing the peripheral portion 76. There is.
　図１８Ｅは、タッチセンサ２０を形成する工程を示している。詳しくは、下地絶縁膜８１上に第１電極２１、第２電極２２、同層第１接続線２３１及び同層第２接続線２４１が形成され、その上に層間絶縁膜８３及び開口８３ａが形成され、その上に異層第１接続線２３５及び異層第２接続線２４５が形成される（図３及び図４等を参照）。また、層間絶縁膜８３上から層間絶縁膜８３、下地絶縁膜８１及び封止膜７０の縁を超えて周辺領域１１に至り、端子６７に接続される引き出し配線２５が、異層第１接続線２３５及び異層第２接続線２４５と同時に形成される。 FIG. 18E shows a process of forming the touch sensor 20. Specifically, the first electrode 21, the second electrode 22, the same layer first connection line 231 and the same layer second connection line 241 are formed on the base insulating film 81, and the interlayer insulating film 83 and the opening 83a are formed thereon. Then, the different-layer first connection line 235 and the different-layer second connection line 245 are formed thereon (see FIGS. 3 and 4). Also, the lead-out wiring 25 connected to the terminal 67 from the interlayer insulating film 83 to the peripheral region 11 beyond the edges of the interlayer insulating film 83, the base insulating film 81, and the sealing film 70 is a different layer first connection line. 235 and the different layer second connection line 245 are formed at the same time.
　図１８Ｆは、タッチセンサ２０を覆う保護膜８５等を形成する工程を示している。ここでは、タッチセンサ２０の全部、さらには引き出し配線２５及び端子６７を覆うように保護膜８５が形成される。保護膜８５は、例えばアクリル樹脂等の有機絶縁材料で形成されている。保護膜８５上には円偏光フィルム８７が配置され、円偏光フィルム８７上にはカバーフィルム８９が配置される。また、保護膜８５に覆われていない端子６８には、異方導電部材１３９を介してＦＰＣ１３が接続される。 FIG. 18F shows a process of forming a protective film 85 or the like that covers the touch sensor 20. Here, the protective film 85 is formed so as to cover the entire touch sensor 20 and further the lead-out wiring 25 and the terminal 67. The protective film 85 is made of an organic insulating material such as acrylic resin. A circularly polarizing film 87 is disposed on the protective film 85, and a cover film 89 is disposed on the circularly polarizing film 87. Further, the FPC 13 is connected to the terminal 68 not covered with the protective film 85 via the anisotropic conductive member 139.
　以上に説明した実施形態においては、タッチセンサ２０は、静電容量方式タッチセンサの駆動電極と検出電極とを構成する第１電極２１と第２電極２２とを備える場合を例示したが、タッチセンサ２０は、これらの電極に加えて、感圧機能を実現するための電極をさらに備えてもよい。 In the embodiment described above, the touch sensor 20 includes the first electrode 21 and the second electrode 22 that configure the drive electrode and the detection electrode of the capacitive touch sensor. 20 may further include an electrode for realizing a pressure-sensitive function in addition to these electrodes.
　本実施形態においては、開示例として有機ＥＬ表示装置の場合を例示したが、その他の適用例として、液晶表示装置、その他の自発光型表示装置、あるいは電気泳動素子等を有する電子ペーパー型表示装置等、あらゆるフラットパネル型の表示装置が挙げられる。また、中小型から大型まで、特に限定することなく適用が可能であることは言うまでもない。 In the present embodiment, the case of an organic EL display device has been exemplified as a disclosure example, but as other application examples, a liquid crystal display device, another self-luminous display device, or an electronic paper display device having an electrophoretic element or the like Any flat panel display device can be used. Moreover, it cannot be overemphasized that it can apply, without specifically limiting from a small size to a large size.
　本発明の思想の範疇において、当業者であれば、各種の変更例及び修正例に想到し得るものであり、それら変更例及び修正例についても本発明の範囲に属するものと了解される。例えば、前述の各実施形態に対して、当業者が適宜、構成要素の追加、削除若しくは設計変更を行ったもの、又は、工程の追加、省略若しくは条件変更を行ったものも、本発明の要旨を備えている限り、本発明の範囲に含まれる。

  In the scope of the idea of the present invention, those skilled in the art can conceive various changes and modifications, and it is understood that these changes and modifications also belong to the scope of the present invention. For example, those in which the person skilled in the art appropriately added, deleted, or changed the design of the above-described embodiments, or those in which the process was added, omitted, or changed the conditions are also included in the gist of the present invention. As long as it is included in the scope of the present invention.

Claims (16)

  1. 　２次元的に配列された複数の第１電極であって、第１方向に隣り合う第１電極が前記第１電極と同層又は異層の第１接続線を介して接続され、前記第１方向と交差する第２方向に隣り合う第１電極は接続されない、複数の第１電極と、
    　前記第１電極と同層で２次元的に配列され、それぞれが前記第１電極に囲まれた複数の第２電極であって、前記第２方向に隣り合う第２電極が、前記第１接続線と平面視で交差する、前記第１電極及び前記第２電極と同層又は異層の第２接続線を介して接続され、前記第１方向に隣り合う第２電極は接続されない、複数の第２電極と、
    　前記第１接続線と前記第２接続線との間に介在する絶縁膜と、
    　を備え、
    　前記第１電極及び前記第２電極と同層の前記第１接続線と前記第１電極及び前記第２電極と異層の第２接続線とが交差する第１交差部と、
    　前記第１電極及び前記第２電極と異層の前記第１接続線と前記第１電極及び前記第２電極と同層の第２接続線とが交差する第２交差部と、
    　が隣り合う
    　タッチセンサ。     A plurality of first electrodes arranged two-dimensionally, wherein the first electrodes adjacent in the first direction are connected to each other via a first connection line that is the same layer as or different from the first electrode. A plurality of first electrodes not connected to a first electrode adjacent to the second direction intersecting the direction;
    A plurality of second electrodes that are two-dimensionally arranged in the same layer as the first electrode, each surrounded by the first electrode, wherein the second electrode adjacent in the second direction is the first connection A plurality of second electrodes adjacent to each other in the first direction are connected to each other through a second connection line that is the same layer as or different from the first electrode and the second electrode. A second electrode;
    An insulating film interposed between the first connection line and the second connection line;
    With
    A first intersecting portion where the first connection line in the same layer as the first electrode and the second electrode intersects the first connection line and the second connection line in a different layer;
    A second intersecting portion where the first connection line in a different layer from the first electrode and the second electrode intersects the second connection line in the same layer as the first electrode and the second electrode;
    Touch sensor next to each other.
  2. 　前記第１交差部と前記第２交差部とは、前記第１の方向に交互に配列する、
    　請求項１に記載のタッチセンサ。     The first intersection and the second intersection are alternately arranged in the first direction.
    The touch sensor according to claim 1.
  3. 　前記第１交差部と前記第２交差部とは、前記第２の方向に交互に配列する、
    　請求項１に記載のタッチセンサ。     The first intersection and the second intersection are alternately arranged in the second direction.
    The touch sensor according to claim 1.
  4. 　前記第１電極と前記第２電極とは、前記絶縁膜下に配置される、
    　請求項１に記載のタッチセンサ。     The first electrode and the second electrode are disposed under the insulating film,
    The touch sensor according to claim 1.
  5. 　前記第１電極と前記第２電極とは、前記絶縁膜上に配置される、
    　請求項１に記載のタッチセンサ。     The first electrode and the second electrode are disposed on the insulating film,
    The touch sensor according to claim 1.
  6. 　前記第１電極と前記第２電極とは、網目状配線で形成される、
    　請求項１に記載のタッチセンサ。     The first electrode and the second electrode are formed by mesh-like wiring,
    The touch sensor according to claim 1.
  7. 　前記第１電極及び前記第２電極と異層の前記第１接続線又は前記第２接続線は、複数の金属線で形成される、
    　請求項１に記載のタッチセンサ。     The first connection line or the second connection line in a different layer from the first electrode and the second electrode is formed of a plurality of metal wires.
    The touch sensor according to claim 1.
  8. 　前記第１電極及び前記第２電極と異層の前記第１接続線又は前記第２接続線は、透明導電膜で形成される、
    　請求項１に記載のタッチセンサ。     The first connection line or the second connection line in a different layer from the first electrode and the second electrode is formed of a transparent conductive film.
    The touch sensor according to claim 1.
  9. 　前記第１電極及び前記第２電極と異層の前記第１接続線は、前記絶縁膜に形成されたスルーホールを通じて前記第１電極に接続され、
    　前記第１電極及び前記第２電極と異層の前記第２接続線は、前記絶縁膜に形成されたスルーホールを通じて前記第２電極に接続される、
    　請求項１に記載のタッチセンサ。     The first connection line different from the first electrode and the second electrode is connected to the first electrode through a through hole formed in the insulating film,
    The second connection line different from the first electrode and the second electrode is connected to the second electrode through a through hole formed in the insulating film.
    The touch sensor according to claim 1.
  10. 　前記第１電極と前記第２電極とは、静電容量方式タッチセンサの駆動電極と検出電極とである、
    　請求項１に記載のタッチセンサ。     The first electrode and the second electrode are a drive electrode and a detection electrode of a capacitive touch sensor,
    The touch sensor according to claim 1.
  11. 　前記第１電極と前記第２電極との間に、前記第１電極と前記第２電極との何れにも接続されない第３の電極をさらに備える、
    　請求項１に記載のタッチセンサ。     A third electrode that is not connected to any of the first electrode and the second electrode is further provided between the first electrode and the second electrode.
    The touch sensor according to claim 1.
  12. 　表示部と、
    　前記表示部上に形成された請求項１に記載のタッチセンサと、
    　を備えるタッチセンサ内蔵表示装置。     A display unit;
    The touch sensor according to claim 1 formed on the display unit,
    A display device with a built-in touch sensor.
  13. 　複数の画素電極と、
    　前記各々の画素電極が底に露出する複数の開口が形成された画素分離膜と、
    　前記画素分離膜の前記各々の開口の内側に形成された発光層と、
    　を備え、
    　前記第１電極と前記第２電極とは、網目状配線で形成され、
    　前記網目状配線の各線は、前記画素分離膜の上方に配置される、
    　請求項１２に記載のタッチセンサ内蔵表示装置。     A plurality of pixel electrodes;
    A pixel separation film having a plurality of openings in which the respective pixel electrodes are exposed to the bottom;
    A light emitting layer formed inside each opening of the pixel isolation film;
    With
    The first electrode and the second electrode are formed by mesh-like wiring,
    Each line of the mesh wiring is disposed above the pixel isolation film,
    The display device with a built-in touch sensor according to claim 12.
  14. 　前記網目状配線の各線の幅は、前記複数の開口の隣同士の間隔よりも狭い、
    　請求項１３に記載のタッチセンサ内蔵表示装置。     The width of each line of the mesh wiring is narrower than the interval between the plurality of openings,
    The display device with a built-in touch sensor according to claim 13.
  15. 　前記各々の画素電極が単位画素を構成し、
    　複数種類の前記単位画素の集合が画素を構成し、
    　前記網目状配線の開口が、平面視で１又は複数の前記画素を含む、
    　請求項１３に記載のタッチセンサ内蔵表示装置。     Each of the pixel electrodes constitutes a unit pixel,
    A set of unit pixels of a plurality of types constitutes a pixel,
    The opening of the mesh wiring includes one or a plurality of the pixels in a plan view.
    The display device with a built-in touch sensor according to claim 13.
  16. 　前記複数の画素電極は、前記第１の方向と前記第２の方向とを対角方向として２次元的に配列し、
    　前記第１接続線又は前記第２接続線は、前記第１の方向と前記第２の方向と交差する方向に延びる、
    　請求項１５に記載のタッチセンサ内蔵表示装置。

          The plurality of pixel electrodes are two-dimensionally arranged with the first direction and the second direction as diagonal directions,
    The first connection line or the second connection line extends in a direction intersecting the first direction and the second direction.
    The display device with a built-in touch sensor according to claim 15.

PCT/JP2017/040565 2017-01-25 2017-11-10 Touch sensor and display device with embedded touch sensor WO2018139009A1 (en)

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