WO2018124390A1 - Perovskite solar cell using graphene electrode, and manufacturing method therefor - Google Patents

Perovskite solar cell using graphene electrode, and manufacturing method therefor Download PDF

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WO2018124390A1
WO2018124390A1 PCT/KR2017/002415 KR2017002415W WO2018124390A1 WO 2018124390 A1 WO2018124390 A1 WO 2018124390A1 KR 2017002415 W KR2017002415 W KR 2017002415W WO 2018124390 A1 WO2018124390 A1 WO 2018124390A1
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graphene
electrode
solar cell
graphene electrode
transport layer
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PCT/KR2017/002415
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French (fr)
Korean (ko)
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최석호
임상혁
허진혁
신동희
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경희대학교산학협력단
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/184Preparation
    • C01B32/186Preparation by chemical vapour deposition [CVD]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • H01L31/02161Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022466Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1884Manufacture of transparent electrodes, e.g. TCO, ITO
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to a perovskite solar cell using a graphene electrode and a method for manufacturing the same, and more particularly to a graphene-based perovskite solar cell that can control the work function while maintaining high electrical conductivity of graphene It is about.
  • the perovskite material is an AMX 3 structure (A, M is a cation, X is an anion) and is an organic / inorganic composite material having an ionic crystal and a direct band gap.
  • This material has high absorption coefficient, thin film, long charge diffusion distance, and high efficiency of solar cell.
  • the perovskite material has a great potential in terms of practical use because it can be manufactured in a low-cost, high-efficiency optoelectronic device can be a solution process.
  • the developed perovskite materials have low moisture and heat resistance and therefore require a passivation layer. It can be used as an ultra-thin solar cell and can be used as a next-generation flexible and mobile independent power source. However, in order to realize perovskite-based flexible solar cells, development of flexible electrodes that are flexible is essential. .
  • the present invention is expected to be able to manufacture high-efficiency graphene-based perovskite solar cells using a chemical doping method capable of adjusting the work function while maintaining high electrical conductivity of graphene. do.
  • the present invention is to provide a perovskite solar cell using a graphene transparent electrode whose characteristics are controlled by doping.
  • the present invention by using a p-type graphene electrode in the perovskite solar cell structure by adjusting the doping concentration, the perovskite using a graphene electrode that can increase the energy conversion efficiency of the perovskite solar cell To provide a skylight solar cell and a method of manufacturing the same.
  • the perovskite solar cell using a graphene electrode is a graphene electrode formed by applying an impurity solution on the surface of the graphene transferred on the substrate, holes deposited on the doped graphene electrode A transfer layer, a barrier layer formed of a metal oxide of a thin film having a predetermined thickness by coating a perovskite structure material on the hole transfer layer, an electron transfer layer formed on the barrier layer and the electron transfer layer An upper electrode formed on the layer.
  • the graphene electrode is formed by spin coating a p-type impurity solution on the graphene to dope the graphene transferred on the substrate, and the electrode characteristics are improved in proportion to the doping concentration of the p-type impurity solution. It features.
  • the graphene electrode is formed by the p-type impurity solution of gold chloride (Gold chloride, AuCl 3 ), the doping concentration may be controlled by the amount of powder of the gold chloride.
  • the p-type impurity solution may be formed of at least one of nitric acid (HNO 3 ), rhodium chloride (RhCl 3 ), and trifluoromethanesulfonic acid (TFSA) in addition to the gold chloride.
  • HNO 3 nitric acid
  • RhCl 3 rhodium chloride
  • TFSA trifluoromethanesulfonic acid
  • the graphene is manufactured by chemical vapor deposition (CVD), transferred onto the substrate, and then formed by removing poly (methyl methacrylate) (PMMA).
  • CVD chemical vapor deposition
  • PMMA poly (methyl methacrylate)
  • the hole transport layer may be formed by spin coating a methanol and a PEDOT: PSS solution on the doped graphene electrode and then evaporating the methanol.
  • the blocking layer may be formed by spin coating the perovskite structure material and dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer.
  • the electron transport layer may be formed by spin coating a PCBM (Phenyl-C61-butyric acid methyl ester) and toluene solution, which are electron transport layers, on the blocking layer.
  • PCBM Phhenyl-C61-butyric acid methyl ester
  • toluene solution which are electron transport layers
  • the upper electrode may include at least one of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), and an alloy thereof using a thermal evaporator on the electron transport layer. It can be formed of one material.
  • the forming of the graphene electrode may include spin coating a p-type impurity solution on the graphene to form the graphene electrode to dope the graphene transferred on the substrate, and a doping concentration of the p-type impurity solution. It may be characterized in that to improve the electrode characteristics of the graphene electrode in proportion to.
  • the graphene electrode is formed by the p-type impurity solution, which is gold chloride (AuCl 3 ), and the doping concentration may be controlled by the amount of powder of the gold chloride.
  • the hole transport layer after spin-coating methanol and PEDOT: PSS solution on the doped graphene electrode, the hole transport layer may be deposited by evaporating the methanol.
  • the forming of the blocking layer may include spin-coating the perovskite structure material and dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer to form the blocking layer of perovskite structure material. Can be formed.
  • the electron transport layer which is an electron transfer layer, may be formed by spin coating a PCBM (Phenyl-C61-butyric acid methyl ester) and toluene solution on the blocking layer.
  • PCBM Phhenyl-C61-butyric acid methyl ester
  • the forming of the upper electrode may include silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), and these using a thermal evaporator on the electron transport layer.
  • the upper electrode may be formed of at least one material of an alloy.
  • the embodiment of the present invention by controlling the doping concentration by using a p-type graphene electrode in the perovskite solar cell structure, it is possible to increase the energy conversion efficiency of the perovskite solar cell.
  • FIG. 1 illustrates a structure example of a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
  • FIG. 2 illustrates an example of transferring graphene onto a substrate according to an embodiment of the present invention.
  • 3A and 3B illustrate an example of manufacturing doped graphene according to an embodiment of the present invention.
  • Figure 4 shows the experimental results for the doping degree of gold chloride according to an embodiment of the present invention.
  • 5a to 5g show the results of experiments on the surface roughness and the formation of nanoparticles at different doping concentrations according to an embodiment of the present invention.
  • Figure 6 shows the experimental results for the graphene sheet resistance at different doping concentrations according to an embodiment of the present invention.
  • Figure 7 shows the experimental results for the permeability of graphene at different doping concentrations according to an embodiment of the present invention.
  • Figure 9 shows the experimental results for the work function at different doping concentrations according to an embodiment of the present invention.
  • 10A and 10B illustrate experimental results of graphene field effect transistors at different doping concentrations according to an exemplary embodiment of the present invention.
  • FIG. 11 illustrates a scanning electron microscope image of a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
  • 12A and 12B illustrate evaluation results of characteristics of a perovskite solar cell using a graphene electrode according to an exemplary embodiment of the present invention.
  • Figure 13 shows the experimental results for the external quantum efficiency of the perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
  • FIG. 14A and 14B illustrate graphs of measurement results of diffusion coefficients and carrier decay times at different doping concentrations and calculation examples of diffusion distances according to embodiments of the present invention.
  • 15A to 15F illustrate evaluation results of characteristics of a perovskite solar cell using graphene electrodes at different doping concentrations according to an embodiment of the present invention.
  • FIG. 16 shows the results of measuring the stability of the current for the perovskite solar cell using a gold chloride-doped graphene electrode according to an embodiment of the present invention.
  • FIG. 17 is a flowchart illustrating a method of manufacturing a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
  • an embodiment As used herein, “an embodiment”, “an example”, “side”, “an example”, etc., should be construed that any aspect or design described is better or advantageous than other aspects or designs. It is not.
  • the term 'or' means inclusive or 'inclusive or' rather than 'exclusive or'.
  • the expression 'x uses a or b' means any one of natural inclusive permutations.
  • FIG. 1 illustrates a structure example of a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
  • the perovskite solar cell 100 using the graphene electrode according to the embodiment of the present invention is formed including a graphene transparent electrode whose characteristics are controlled by doping.
  • the perovskite solar cell 100 using a graphene electrode is a graphene electrode 110, a hole transport layer 120, a blocking layer 130, an electron transport layer 140 ), And an upper electrode 150.
  • the graphene electrode 110 is formed by applying an impurity solution to the graphene surface transferred on the substrate.
  • the substrate may be at least one of a glass substrate, a plastic substrate, and a flexible substrate
  • the flexible substrate may be polyethylene glycol (polyethylenterephthalate, PET), polyethylene naphtalate (PEN), and polydimethylsiloxane (PDMS). It may be at least one of).
  • the graphene electrode 110 is formed by spin coating a p-type impurity solution on the graphene to dope the graphene transferred on the substrate, and the electrode characteristics may be improved in proportion to the doping concentration of the p-type impurity solution. .
  • the graphene electrode 110 is formed by a p-type impurity solution of gold chloride (Gold chloride, AuCl 3 ), the doping concentration may be controlled by the amount of powder of gold chloride.
  • gold chloride Gold chloride, AuCl 3
  • the p-type impurity solution may be formed of at least one of nitric acid (HNO 3 ), rhodium chloride (RhCl 3 ), and trifluoromethanesulfonic acid (TFSA) in addition to gold chloride.
  • HNO 3 nitric acid
  • RhCl 3 rhodium chloride
  • TFSA trifluoromethanesulfonic acid
  • the graphene is manufactured by chemical vapor deposition (CVD), transferred onto the substrate, and then formed by removing poly (methyl methacrylate) (PMMA).
  • CVD chemical vapor deposition
  • PMMA poly (methyl methacrylate)
  • the graphene electrode 110 may be formed by growing graphene directly on the substrate or transferring the grown graphene onto the substrate. At this time, the method for growing graphene is not particularly limited.
  • the graphene electrode 110 formed by the chemical vapor deposition (CVD) method may have a hydrophobic surface.
  • the hole transport layer 120 is deposited on the doped graphene electrode.
  • the hole transport layer 120 may be formed by spin-coating methanol and a PEDOT: PSS solution on the doped graphene electrode 110 and then evaporating methanol.
  • the hole transport layer 120 may be formed to have a uniform thickness and composition through a solution process by applying a template material on the graphene electrode 110 surface.
  • the hole transport layer 120 may be a hole transport layer, and may include an inorganic oxide thin film.
  • the inorganic oxide thin film is a p-type inorganic oxide such as tungsten oxide (WO 3 ), molybdenum trioxide (MoO 3 ), vanadium oxide (Vanadium (V) oxide, V 2 O 5 ), nickel oxide (Nio), or the like. It may be formed.
  • the hole transport layer 120 may include a PEDOT: PSS thin film formed on the inorganic oxide thin film, and the inorganic oxide thin film and the PEDOT: PSS thin film may function together as a hole transport layer.
  • the blocking layer 130 is formed of a thin metal oxide having a predetermined thickness by applying a perovskite structure material on the hole transport layer.
  • the blocking layer 130 may be formed by spin-coating a perovskite structure material and a dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer 120.
  • the blocking layer 130 is a metal oxide, in addition to titanium dioxide (TiO 2 ), zirconium, titanium, tin, zinc, zinc oxide, zirconium dioxide (ZrO 2 ), tantalum oxide (Ta 2 O 3 ) It may be formed of a metal oxide in the form of a thin film, such as magnesium oxide (Magnesium oxide, MgO), hafnium (IV) oxide, HfO 2 .
  • the electron transport layer 140 is formed on the blocking layer 130.
  • the electron transport layer 140 may be formed by spin coating a PCBM (Phenyl-C61-butyric acid methyl ester) and toluene solution on the blocking layer 130.
  • PCBM Phhenyl-C61-butyric acid methyl ester
  • the electron transport layer 140 may be an electron transport layer, and may include an inorganic oxide thin film.
  • the inorganic oxide thin film may be formed of an n-type inorganic oxide such as titanium dioxide (TiO 2 ), zinc oxide (ZnO), or the like.
  • the inorganic oxide precursor may be titanium bisammonium lactatodihydroxide (TiBALDH, [CH 3 CH (O) CO 2 NH 4 ] 2 Ti (OH). 2 ) and the like can be used.
  • the upper electrode 150 is formed on the electron transport layer 140.
  • the upper electrode 150 may be formed of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), and the like by using a thermal evaporator on the electron transport layer 140. It may be formed of at least one material of the alloy.
  • the method of forming the upper electrode 150 is not particularly limited.
  • the upper electrode 150 when the graphene electrode 110 is an anode, the upper electrode 150 may function as a cathode, and in this case, the upper electrode 150 may be a metal having a low work function. It may be formed of aluminum (Al).
  • the upper electrode 150 when the graphene electrode 110 is a cathode, the upper electrode 150 may function as an anode, in which case the upper electrode 150 is a metal having a high work function. Phosphorus silver (Ag) may be formed.
  • graphene electrode doped with gold chloride (AuCl 3 ) has a large work function, so the perovskite structure is manufactured based on the pin structure.
  • PEDOT PSS was deposited to fabricate a hole transport layer on undoped or doped graphene electrodes.
  • a spin coating method which is a coating method in which the prepared solution is dropped on the graphene electrode and rotated at high speed to spread thinly, was used.
  • PCBM Phenyl-C61-butyric acid methyl ester
  • an aluminum (Al) electrode was formed on an electron transport layer (PCBM / MAPbI 3 / PEDOT: PSS / Graphene / Glass) using a thermal evaporator to form an upper electrode.
  • FIG. 2 illustrates an example of transferring graphene onto a substrate according to an embodiment of the present invention.
  • the substrate may be a glass substrate, but may be any one of a flexible substrate and a plastic substrate.
  • graphene is manufactured by chemical vapor deposition (CVD), and a sheet of graphene is supported by poly (methyl methacrylate) (PMMA), floated in deionized water, and then transferred onto a substrate.
  • CVD chemical vapor deposition
  • PMMA poly (methyl methacrylate)
  • the transferred graphene may be dried in air, and then formed on a hot plate and further dried at about 180 ° C. for 2 hours. Thereafter, after removing PMMA using acetone, it may be naturally dried.
  • 3A and 3B illustrate an example of manufacturing doped graphene according to an embodiment of the present invention.
  • Figure 3a shows an example of the doping concentration according to the mixing of nitromethane (Nitro methane) and gold chloride (Gold chloride, AuCl 3 ),
  • Figure 3b to form a graphene electrode on the graphene / substrate An example is shown.
  • the graphene electrode of the perovskite solar cell using the graphene electrode according to the embodiment of the present invention is formed by a doping solution doped on the graphene surface transferred on the substrate.
  • the doping solution may be used gold chloride for the production of p-type graphene.
  • the doping solution according to the mixing of nitromethane and gold chloride may exhibit different doping concentrations depending on the amount of powder of gold chloride.
  • the doping concentration of the doping solution was adjusted to 1mM to 10mM by the amount of gold chloride powder, and after doping to uniformly coat the gold chloride, heat treatment was performed at 100 ° C. for 10 minutes using rapid heat treatment.
  • a doping solution 310 which is a p-type impurity solution is coated on a graphene / substrate, and spin-coated to form a doped graphene electrode.
  • Robesky solar cells can be fabricated.
  • the doping solution 310 may be any one of solutions showing different doping concentrations according to the amount of gold chloride powder prepared in FIG. 3A.
  • the doping solution 310 is applied onto the graphene / substrate, followed by spin coating for 1 minute at about 2500 rpm. Thereafter, annealing of the p-type impurity solution / graphene / substrate 330 to which the P-type impurity solution is applied is performed to form a graphene electrode 350 using the doped graphene as an electrode. Can be.
  • Figure 4 shows the experimental results for the doping degree of gold chloride according to an embodiment of the present invention.
  • FIG. 4 shows a graph of experimental results obtained by applying X-ray photoelectron spectroscopy to a gold chloride-doped graphene electrode.
  • XPS intensity (XPS Intensity) according to binding energy (eV) in gold chloride-doped graphene electrode (AuCl 3 doped graphene) and undoped graphene electrode (Pristine graphene) You can check.
  • the gold (Au) and chlorine (Cl) elements are observed only on the graphene electrode doped with gold chloride.
  • the p-type impurity solution of gold chloride (AuCl 3 ) is graphene. It can be seen that it is well doped on the electrode.
  • 5a to 5g show the results of experiments on the surface roughness and the formation of nanoparticles at different doping concentrations according to an embodiment of the present invention.
  • FIGS. 5A to 5F show graphs of experimental results of atomic force microscope (AFM) images and nanoparticle height profiles according to the doping concentration of gold chloride (AuCl 3 ), and FIG. 5g shows an experimental result graph of surface roughness values according to the doping concentration of gold chloride (AuCl 3 ).
  • AFM atomic force microscope
  • FIG. 5A shows experimental results of AFM images and nanoparticle height for graphene / substrate including undoped graphene electrodes (Pristine graphene).
  • FIG. 5B shows experimental results of AFM images and nanoparticle height for graphene / substrate comprising 1 mM gold chloride doped graphene electrode
  • FIG. 5C includes graphene electrode doped with 2.5 mM gold chloride. The experimental results of the AFM image and nanoparticle height for the graphene / substrate.
  • FIG. 5D shows experimental results of AFM images and nanoparticle height for graphene / substrate comprising 5 mM gold chloride doped graphene electrode
  • FIG. 5E includes 7.5 mM gold chloride doped graphene electrode.
  • AFM images of the graphene / substrate and the experimental results of the nanoparticle height is shown
  • Figure 5f is an experiment of the AFM image and nanoparticle height for the graphene / substrate containing a graphene electrode doped with 10 mM gold chloride The results are shown.
  • gold (Au) nanoparticles are formed by doping with gold chloride. This may be understood that the reduction potential of graphene (0.22eV) is higher than that of gold chloride ions (1.0eV).
  • the roughness value Rq of the graphene / substrate surface increases as the doping concentration n D of the doping solution increases depending on the amount of powder of gold chloride.
  • Figure 6 shows the experimental results for the graphene sheet resistance at different doping concentrations according to an embodiment of the present invention.
  • FIG. 6 shows graphene on a graphene / substrate according to undoped graphene electrodes (Pristine) and graphene electrodes doped with gold chloride doped with 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. A graph of the sheet resistance measurement results is shown.
  • the sheet resistance of the graphene electrode gradually decreases as the doping concentration n D of the doping solution increases depending on the amount of powder of gold chloride.
  • the sheet resistance of the single layer graphene transferred onto the substrate was observed to be about 890 ohm / sq on average, and as the doping concentration of gold chloride (AuCl 3 ) increased from 1 mM to 10 mM, the sheet resistance of the graphene electrode. It can be seen that gradually decreases from ⁇ 890ohm / sq to ⁇ 70ohm / sq. This means that as the doping concentration increases, the characteristics of the graphene electrode are improved.
  • Figure 7 shows the experimental results for the permeability of graphene at different doping concentrations according to an embodiment of the present invention.
  • FIG. 7 shows the transmission spectrum of graphene according to the undoped graphene electrode (0 mM) and the graphene electrode doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. .
  • the transmittance at 550 nm is reduced from about 9% to 89.2% by about 8%. You can see that it is very insignificant.
  • FIG. 8 shows DC conductivity and optical conductivity characteristics through the following [Formula 1] to confirm whether the transparent conductive electrode including the graphene electrode doped with gold chloride (AuCl 3 ) can be used industrially. The graph of the experimental result confirmed is shown.
  • T means transmittance
  • Rs means sheet resistance
  • Z0 means free space impedance
  • Means optical conductivity Means DC conductivity.
  • the value of DC conductivity / optical conductivity must be at least 35 (the straight line in FIG. 8 graph means minimum value).
  • Figure 9 shows the experimental results for the work function at different doping concentrations according to an embodiment of the present invention.
  • FIG. 9 illustrates a work function measured by applying a Kelvin probe to each of the undoped graphene electrodes (Pristine) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM, and 10 mM, respectively.
  • the graph shows the measurement result of (Work function).
  • 10A and 10B illustrate experimental results of graphene field effect transistors at different doping concentrations according to an exemplary embodiment of the present invention.
  • FIG. 10A shows the current-voltage of a graphene field effect transistor according to an undoped graphene electrode (0 mM) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively.
  • the resultant graphs of the curves and diplock points and mobility are shown
  • FIG. 10B shows the resultant graphs of the mobility of electrons and holes of the graphene electrodes calculated from the I SD -V G curves.
  • drain-source current (I SD ) and gate voltage (A BG ) curves of all samples show the conduction characteristics of electrons and holes around the dilock point as is generally observed.
  • the I SD ⁇ V G curve is symmetrical in the field effect transistor (FET) of the initial state graphene (0mM). However, it can be seen that the asymmetry changes as the doping concentration (n D ) gradually increases.
  • the dirac point moves as the doping concentration n D of the doping solution increases depending on the amount of powder of gold chloride.
  • the position of the diplock point shifts toward the positive gate voltage in the I SD -V G curve.
  • the dilock point may be found to be about 60V when the doping concentration is at most 10 mM.
  • FIG. 10B illustrates a graph of mobility of electrons and holes of graphene calculated by Equation 2 below from the I SD -V G curve of FIG. 10A.
  • the electron mobility is reduced from approximately 3,000 to 550 cm 2 / Vs as the doping concentration (n D ) of the doping solution increases depending on the amount of powder of gold chloride You can see that.
  • the hole mobility (Hole) can be seen that the decrease is small from 2200 to 1600cm 2 / Vs as the doping concentration increases.
  • FIG. 11 illustrates a scanning electron microscope image of a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
  • FIG. 11 is a graphene electrode (Graphene) is formed on the substrate (Glass), a hole transport layer (PEDOT: PSS) is formed on the graphene electrode (Graphene), the blocking on the hole transport layer
  • a layer MAbI 3 , a perovskite structure material
  • PCBM electron transport layer
  • Al electrode upper electrode
  • a ⁇ 60-nm upper electrode Al electrode
  • a ⁇ 50-nm electron transport layer PCBM
  • a ⁇ 380nm blocking layer MAbI 3
  • a ⁇ 40nm hole transport layer PEDOT
  • 12A and 12B illustrate evaluation results of characteristics of a perovskite solar cell using a graphene electrode according to an exemplary embodiment of the present invention.
  • FIG. 12A illustrates a graph of evaluation of characteristics of a perovskite solar cell using an undoped graphene electrode (Pristine), and FIG. 12B illustrates a perovskite using a graphene electrode doped with 7.5 mM gold chloride. It shows the characteristic evaluation graph of the sky solar cell.
  • Primary undoped graphene electrode
  • FIG. 12B illustrates a perovskite using a graphene electrode doped with 7.5 mM gold chloride. It shows the characteristic evaluation graph of the sky solar cell.
  • the reason for this is, firstly, the result of the conductivity improvement of the graphene electrode, and secondly, the work function increases as the doping concentration of the doping solution increases depending on the amount of gold chloride powder.
  • the Fermi level of graphene can be placed further down the diplock point, and thus the holes can be moved more easily in the hole transport layer PEDOT: PSS. It can be seen that.
  • Figure 13 shows the experimental results for the external quantum efficiency of the perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
  • FIG. 13 shows measurement results of external quantum efficiency (EQE) according to undoped graphene electrodes (Pristine) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. The graph is shown.
  • EQE external quantum efficiency
  • FIG. 14A and 14B illustrate graphs of measurement results of diffusion coefficients and carrier decay times at different doping concentrations and calculation examples of diffusion distances according to embodiments of the present invention.
  • FIG. 14A shows a graph of measurement results of diffusion coefficients between undoped graphene electrodes (0 mM) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively.
  • FIG. 14B shows a graph of measurement results of carrier decay time according to undoped graphene electrodes (0 mM) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively.
  • 15A to 15F illustrate evaluation results of characteristics of a perovskite solar cell using graphene electrodes at different doping concentrations according to an embodiment of the present invention.
  • FIGS. 15A to 15F illustrate graphene electrodes according to doping concentrations of undoped graphene electrodes (Pristine, 0 mM) and doping concentrations of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM gold chloride (AuCl3).
  • the graph shows the results of measuring 24 perovskite solar cells, respectively.
  • the measurement result of 24 perovskite solar cells according to the undoped graphene electrode (0 mM) shows 10.24 ⁇ 1.29%.
  • FIG. 16 shows the results of measuring the stability of the current for the perovskite solar cell using a gold chloride-doped graphene electrode according to an embodiment of the present invention.
  • FIG. 16 illustrates a graph showing the results of measuring the stability of the current for a perovskite solar cell using a graphene electrode doped with 7.5 mM gold chloride (AuCl 3 ).
  • FIG. 16 is a graph of a measurement result of a perovskite solar cell using a graphene electrode doped with 7.5 mM gold chloride while the encapsulation environment is maintained at 50% humidity without applying encapsulation technology. It is shown.
  • the perovskite solar cell using a graphene electrode doped with 7.5mM gold chloride can be seen that the current density hardly changes even after 100 hours of light irradiation.
  • the perovskite solar cell using the graphene electrode according to the embodiment of the present invention exhibits excellent stability characteristics, and the graphene electrode can be applied to the flexible device based on these results. It can be applied to various optoelectronic devices.
  • FIG. 17 is a flowchart illustrating a method of manufacturing a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
  • a graphene electrode is formed by spin coating a p-type impurity solution on the graphene to dope the transferred graphene on the substrate, and the electrode characteristics of the graphene electrode are proportional to the doping concentration of the p-type impurity solution. It may be a step of improving.
  • the graphene electrode is formed by a p-type impurity solution of gold chloride (AuCl 3 ), and the doping concentration may be controlled by the amount of powder of gold chloride.
  • step 1730 a hole transport layer is deposited on the doped graphene electrode.
  • Step 1730 may be a step of spin-coating methanol and a PEDOT: PSS solution on the doped graphene electrode, and then evaporating methanol to deposit a hole transport layer.
  • a perovskite structure material is coated on the hole transport layer to form a barrier layer of a thin metal oxide layer.
  • Step 1740 may be a step of forming the blocking layer of the perovskite structure material by spin coating a perovskite structure material and dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer.
  • dimethylformamide N, N, dimethylformamide
  • an electron transport layer is formed on the blocking layer.
  • Step 1750 may be a step of forming a electron transfer layer, which is an electron transfer layer, by spin-coating a phenyl-C61-butyric acid methyl ester (PCBM) and toluene solution on a single layer.
  • PCBM phenyl-C61-butyric acid methyl ester
  • an upper electrode is formed on the electron transport layer.
  • Step 1760 is performed on at least one of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt) and alloys thereof using a thermal evaporator on the electron transport layer. It may be a step of forming an upper electrode from a material.

Abstract

The present invention relates to: a perovskite solar cell using a graphene electrode, capable of work function control while maintaining high electrical conductivity of graphene; and a manufacturing method therefor. A p-type graphene electrode is used in a perovskite solar cell structure and the doping concentration thereof is controlled, and thus energy conversion efficiency of the perovskite solar cell can be increased.

Description

그래핀 전극을 이용한 페로브스카이트 태양전지 및 그 제조 방법Perovskite Solar Cell Using Graphene Electrode and Manufacturing Method Thereof
본 발명은 그래핀 전극을 이용한 페로브스카이트 태양전지 및 그 제조 방법에 관한 것으로, 보다 상세하게는 그래핀의 전기전도도를 높게 유지하면서 일함수 조절이 가능한 그래핀 기반 페로브스카이트 태양전지에 관한 것이다. The present invention relates to a perovskite solar cell using a graphene electrode and a method for manufacturing the same, and more particularly to a graphene-based perovskite solar cell that can control the work function while maintaining high electrical conductivity of graphene It is about.
페로브스카이트 물질은 AMX3 구조체(A, M은 양이온, X는 음이온)로서 이온결정이면서 직접형 띠간격(direct band gap)을 갖는 유/무기 복합물질이다. 이 물질은 높은 흡수계수를 나타내며, 박막화가 가능하고, 전하 확산거리가 길어 태양전지의 고효율화가 가능하다. 또한, 높은 유전상수로 인해 낮은 엑시톤 결합에너지를 나타내어 높은 개방전압을 나타내는 특징을 가진다.The perovskite material is an AMX 3 structure (A, M is a cation, X is an anion) and is an organic / inorganic composite material having an ionic crystal and a direct band gap. This material has high absorption coefficient, thin film, long charge diffusion distance, and high efficiency of solar cell. In addition, due to the high dielectric constant it exhibits a low exciton binding energy and has a high open voltage characteristic.
이러한 페로브스카이트 물질은 용액공정이 가능하므로 저가격 고효율 광전자소자의 제작이 가능하기 때문에 실용화 면에 있어서도 상당한 잠재력을 지니고 있다.The perovskite material has a great potential in terms of practical use because it can be manufactured in a low-cost, high-efficiency optoelectronic device can be a solution process.
코지마(Kojima) 등에 의해 액체 감응형 태양전지가 처음 제작된 이래로 현재 22.1% 효율의 고체감응형 페로브스카이트 태양전지까지 개발된 상태이다. Since liquid-sensitized solar cells were first manufactured by Kojima et al., Solid-sensitized perovskite solar cells with 22.1% efficiency have been developed.
개발된 페로브스카이트 물질은 낮은 내습성 및 내열성을 가지므로 보호층(passivation layer)을 필요로 한다. 초박막 태양전지로 사용이 가능하여 차세대 플렉서블 및 모바일(mobile) 독립전원으로 사용이 가능하다는 특징을 가지고 있으나, 페로브스카이트 기반의 플렉서블 태양전지의 실현을 위해서는 플렉서블화가 가능한 투명전극의 개발이 필수적이다.The developed perovskite materials have low moisture and heat resistance and therefore require a passivation layer. It can be used as an ultra-thin solar cell and can be used as a next-generation flexible and mobile independent power source. However, in order to realize perovskite-based flexible solar cells, development of flexible electrodes that are flexible is essential. .
이를 위해서는 내화학성 및 배리어 특성을 가지는 전극의 개발이 매우 중요한데, 이에 대해서는 그래핀 전극이 매우 유망한 후보 전극이 될 수 있다.For this purpose, development of electrodes having chemical resistance and barrier properties is very important, and graphene electrodes may be very promising candidate electrodes.
최근 그래핀 전극을 이용한 태양전지에 관한 연구가 보고된 바 있으나 종래 기술의 경우, 그래핀의 일함수 조절이 어려웠으며, 전기전도도 또한 높지 않아 태양전지의 특성을 극대화할 수 없다는 한계가 존재하였다.Recently, studies on solar cells using graphene electrodes have been reported. However, in the prior art, it was difficult to control the work function of graphene, and the electrical conductivity was also not high, so there was a limit that the characteristics of the solar cells could not be maximized.
이러한 종래 기술의 한계를 극복하기 위해, 본 발명은 그래핀의 전기전도도를 높게 유지하면서 일함수 조절이 가능한 화학적 도핑 방법을 이용하여 고효율의 그래핀 기반 페로브스카이트 태양전지를 제작할 수 있을 것으로 기대된다.In order to overcome these limitations of the prior art, the present invention is expected to be able to manufacture high-efficiency graphene-based perovskite solar cells using a chemical doping method capable of adjusting the work function while maintaining high electrical conductivity of graphene. do.
본 발명은 도핑에 의해서 특성이 조절되는 그래핀 투명전극을 이용한 페로브스카이트 태양전지를 제공하고자 한다.The present invention is to provide a perovskite solar cell using a graphene transparent electrode whose characteristics are controlled by doping.
또한, 본 발명은 페로브스카이트 태양전지 구조에 p형 그래핀 전극을 사용하여 그 도핑농도를 조절함으로써, 페로브스카이트 태양전지의 에너지 변환 효율을 증대시킬 수 있는 그래핀 전극을 이용한 페로브스카이트 태양전지 및 그 제조 방법을 제공하고자 한다. In addition, the present invention by using a p-type graphene electrode in the perovskite solar cell structure by adjusting the doping concentration, the perovskite using a graphene electrode that can increase the energy conversion efficiency of the perovskite solar cell To provide a skylight solar cell and a method of manufacturing the same.
본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지는 기판 상에 전사된 그래핀 표면에 불순물 용액을 도포하여 형성되는 그래핀 전극, 상기 도핑된 그래핀 전극 상에 증착되는 정공전달층, 상기 정공전달층 상에 페로브스카이트(Perovskite) 구조의 물질을 도포하여 기설정된 두께의 박막의 금속 산화물로 형성되는 차단층, 상기 차단층 상에 형성되는 전자전달층 및 상기 전자전달층 상에 형성되는 상부 전극을 포함한다. In the perovskite solar cell using a graphene electrode according to an embodiment of the present invention is a graphene electrode formed by applying an impurity solution on the surface of the graphene transferred on the substrate, holes deposited on the doped graphene electrode A transfer layer, a barrier layer formed of a metal oxide of a thin film having a predetermined thickness by coating a perovskite structure material on the hole transfer layer, an electron transfer layer formed on the barrier layer and the electron transfer layer An upper electrode formed on the layer.
상기 그래핀 전극은 상기 기판 상에 전사된 그래핀을 도핑하기 위해 p형 불순물 용액을 상기 그래핀 상에 스핀코팅하여 형성되며, 상기 p형 불순물 용액의 도핑농도에 비례하여 전극 특성이 향상되는 것을 특징으로 한다.The graphene electrode is formed by spin coating a p-type impurity solution on the graphene to dope the graphene transferred on the substrate, and the electrode characteristics are improved in proportion to the doping concentration of the p-type impurity solution. It features.
또한, 상기 그래핀 전극은 염화금(Gold chloride, AuCl3)인 상기 p형 불순물 용액에 의해 형성되며, 상기 도핑농도는 상기 염화금의 분말 양에 의해 조절될 수 있다.In addition, the graphene electrode is formed by the p-type impurity solution of gold chloride (Gold chloride, AuCl 3 ), the doping concentration may be controlled by the amount of powder of the gold chloride.
상기 p형 불순물 용액은 상기 염화금 이외에, 질산(HNO3), 염화로듐(RhCl3) 및 TFSA(trifluoromethanesulfonic acid) 중 적어도 어느 하나로 형성될 수 있다.The p-type impurity solution may be formed of at least one of nitric acid (HNO 3 ), rhodium chloride (RhCl 3 ), and trifluoromethanesulfonic acid (TFSA) in addition to the gold chloride.
상기 그래핀은 화학기상증착기(chemical vapor deposition, CVD)로 제작되어 상기 기판 상에 전사되며, 이후 PMMA(Poly(methyl methacrylate))를 제거하여 형성될 수 있다.The graphene is manufactured by chemical vapor deposition (CVD), transferred onto the substrate, and then formed by removing poly (methyl methacrylate) (PMMA).
상기 정공전달층은 상기 도핑된 그래핀 전극 상에 메탄올(methanol) 및 PEDOT:PSS 용액을 스핀코팅한 후, 상기 메탄올을 증발시켜 형성될 수 있다.The hole transport layer may be formed by spin coating a methanol and a PEDOT: PSS solution on the doped graphene electrode and then evaporating the methanol.
상기 차단층은 상기 정공전달층 상에 상기 페로브스카이트 구조의 물질 및 다이메틸폼아마이드(N, N, dimethylformamide) 용액을 스핀코팅하여 형성될 수 있다.The blocking layer may be formed by spin coating the perovskite structure material and dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer.
상기 전자전달층은 상기 차단층 상에 전자 이동층인 PCBM(Phenyl-C61-butyric acid methyl ester) 및 톨루엔(toluene) 용액을 스핀코팅하여 형성될 수 있다.The electron transport layer may be formed by spin coating a PCBM (Phenyl-C61-butyric acid methyl ester) and toluene solution, which are electron transport layers, on the blocking layer.
상기 상부 전극은 상기 전자전달층 상에 열증착기(thermal evaporator)를 이용하여 은(Ag), 금(Au), 구리(Cu), 알루미늄(Al), 백금(Pt) 및 이들의 합금 중 적어도 어느 하나의 물질로 형성될 수 있다.The upper electrode may include at least one of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), and an alloy thereof using a thermal evaporator on the electron transport layer. It can be formed of one material.
본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조 방법은 기판 상에 그래핀을 전사하는 단계, 상기 전사된 그래핀 표면에 불순물 용액을 도포하여 그래핀 전극을 형성하는 단계, 상기 도핑된 그래핀 전극 상에 정공전달층을 증착하는 단계, 상기 정공전달층 상에 페로브스카이트(Perovskite) 구조의 물질을 도포하여 일정 두께의 박막의 금속 산화물의 차단층을 형성하는 단계, 상기 차단층 상에 전자전달층을 형성하는 단계 및 상기 전자전달층 상에 상부 전극을 형성하는 단계를 포함한다.In the method of manufacturing a perovskite solar cell using a graphene electrode according to an embodiment of the present invention to transfer the graphene on a substrate, to form a graphene electrode by applying an impurity solution on the surface of the transferred graphene Step, depositing a hole transport layer on the doped graphene electrode, by applying a material of the perovskite structure on the hole transport layer to form a barrier layer of a metal oxide of a thin film of a predetermined thickness Forming an electron transport layer on the blocking layer and forming an upper electrode on the electron transport layer.
상기 그래핀 전극을 형성하는 단계는 상기 기판 상에 전사된 그래핀을 도핑하기 위해 p형 불순물 용액을 상기 그래핀 상에 스핀코팅하여 상기 그래핀 전극을 형성하며, 상기 p형 불순물 용액의 도핑농도에 비례하여 상기 그래핀 전극의 전극 특성을 향상시키는 것을 특징으로 할 수 있다.The forming of the graphene electrode may include spin coating a p-type impurity solution on the graphene to form the graphene electrode to dope the graphene transferred on the substrate, and a doping concentration of the p-type impurity solution. It may be characterized in that to improve the electrode characteristics of the graphene electrode in proportion to.
상기 그래핀 전극은 염화금(Gold chloride, AuCl3)인 상기 p형 불순물 용액에 의해 형성되며, 상기 도핑농도는 상기 염화금의 분말 양에 의해 조절될 수 있다. The graphene electrode is formed by the p-type impurity solution, which is gold chloride (AuCl 3 ), and the doping concentration may be controlled by the amount of powder of the gold chloride.
상기 정공전달층을 증착하는 단계는 상기 도핑된 그래핀 전극 상에 메탄올(methanol) 및 PEDOT:PSS 용액을 스핀코팅한 후, 상기 메탄올을 증발시켜 상기 정공전달층을 증착할 수 있다.In the depositing of the hole transport layer, after spin-coating methanol and PEDOT: PSS solution on the doped graphene electrode, the hole transport layer may be deposited by evaporating the methanol.
상기 차단층을 형성하는 단계는 상기 정공전달층 상에 상기 페로브스카이트 구조의 물질 및 다이메틸폼아마이드(N, N, dimethylformamide) 용액을 스핀코팅하여 페로브스카이트 구조 물질의 상기 차단층을 형성할 수 있다.The forming of the blocking layer may include spin-coating the perovskite structure material and dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer to form the blocking layer of perovskite structure material. Can be formed.
상기 전자전달층을 형성하는 단계는 상기 차단층 상에 PCBM(Phenyl-C61-butyric acid methyl ester) 및 톨루엔(toluene) 용액을 스핀코팅하여 전자 이동층인 상기 전자전달층을 형성할 수 있다.In the forming of the electron transport layer, the electron transport layer, which is an electron transfer layer, may be formed by spin coating a PCBM (Phenyl-C61-butyric acid methyl ester) and toluene solution on the blocking layer.
상기 상부 전극을 형성하는 단계는 상기 전자전달층 상에 열증착기(thermal evaporator)를 이용하여 은(Ag), 금(Au), 구리(Cu), 알루미늄(Al), 백금(Pt) 및 이들의 합금 중 적어도 어느 하나의 물질로 상기 상부 전극을 형성할 수 있다.The forming of the upper electrode may include silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), and these using a thermal evaporator on the electron transport layer. The upper electrode may be formed of at least one material of an alloy.
본 발명의 실시예에 따르면, 도핑에 의해서 특성이 조절되는 그래핀 투명전극을 이용한 페로브스카이트 태양전지를 제공할 수 있다. According to an embodiment of the present invention, it is possible to provide a perovskite solar cell using a graphene transparent electrode whose characteristics are controlled by doping.
또한, 본 발명의 실시예에 따르면, 페로브스카이트 태양전지 구조에 p형 그래핀 전극을 사용하여 그 도핑농도를 조절함으로써, 페로브스카이트 태양전지의 에너지 변환 효율을 증대시킬 수 있다.In addition, according to the embodiment of the present invention, by controlling the doping concentration by using a p-type graphene electrode in the perovskite solar cell structure, it is possible to increase the energy conversion efficiency of the perovskite solar cell.
도 1은 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 구조 예를 도시한 것이다.1 illustrates a structure example of a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
도 2는 본 발명의 실시예에 따른 기판 상에 그래핀을 전사하는 예를 도시한 것이다.2 illustrates an example of transferring graphene onto a substrate according to an embodiment of the present invention.
도 3a 및 도 3b는 본 발명의 실시예에 따른 도핑된 그래핀의 제작 예를 도시한 것이다. 3A and 3B illustrate an example of manufacturing doped graphene according to an embodiment of the present invention.
도 4는 본 발명의 실시예에 따른 염화금의 도핑 정도에 대한 실험 결과를 도시한 것이다. Figure 4 shows the experimental results for the doping degree of gold chloride according to an embodiment of the present invention.
도 5a 내지 도 5g는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 나노입자의 형성 및 표면 거칠기에 대한 실험 결과를 도시한 것이다.5a to 5g show the results of experiments on the surface roughness and the formation of nanoparticles at different doping concentrations according to an embodiment of the present invention.
도 6은 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 그래핀 면저항에 대한 실험 결과를 도시한 것이다.Figure 6 shows the experimental results for the graphene sheet resistance at different doping concentrations according to an embodiment of the present invention.
도 7은 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 그래핀의 투과도에 대한 실험 결과를 도시한 것이다.Figure 7 shows the experimental results for the permeability of graphene at different doping concentrations according to an embodiment of the present invention.
도 8은 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 DC 전도도 및 광학적 전도도의 특성에 대한 실험 결과를 도시한 것이다.8 shows experimental results of the characteristics of the DC conductivity and the optical conductivity at different doping concentrations according to the embodiment of the present invention.
도 9는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 일함수에 대한 실험 결과를 도시한 것이다.Figure 9 shows the experimental results for the work function at different doping concentrations according to an embodiment of the present invention.
도 10a 및 도 10b는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 그래핀 전계효과 트랜지스터에 대한 실험 결과를 도시한 것이다.10A and 10B illustrate experimental results of graphene field effect transistors at different doping concentrations according to an exemplary embodiment of the present invention.
도 11은 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 주사전자현미경 이미지를 도시한 것이다.FIG. 11 illustrates a scanning electron microscope image of a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
도 12a 및 도 12b는 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 특성에 대한 평가 결과를 도시한 것이다.12A and 12B illustrate evaluation results of characteristics of a perovskite solar cell using a graphene electrode according to an exemplary embodiment of the present invention.
도 13은 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 외부양자 효율에 대한 실험 결과를 도시한 것이다.Figure 13 shows the experimental results for the external quantum efficiency of the perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
도 14a 및 도 14b는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 확산계수 및 캐리어 감쇠시간에 대한 측정 결과 그래프, 및 그에 따른 확산거리의 산출 예를 도시한 것이다.14A and 14B illustrate graphs of measurement results of diffusion coefficients and carrier decay times at different doping concentrations and calculation examples of diffusion distances according to embodiments of the present invention.
도 15a 내지 도 15f는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 그래핀 전극을 이용한 페로브스카이트 태양전지의 특성에 대한 평가 결과를 도시한 것이다. 15A to 15F illustrate evaluation results of characteristics of a perovskite solar cell using graphene electrodes at different doping concentrations according to an embodiment of the present invention.
도 16은 본 발명의 실시예에 따른 염화금이 도핑된 그래핀 전극을 이용한 페로브스카이트 태양전지에 대한 전류의 안정성을 측정한 결과를 도시한 것이다.16 shows the results of measuring the stability of the current for the perovskite solar cell using a gold chloride-doped graphene electrode according to an embodiment of the present invention.
도 17은 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조 방법의 흐름도를 도시한 것이다.17 is a flowchart illustrating a method of manufacturing a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
이하 첨부 도면들 및 첨부 도면들에 기재된 내용들을 참조하여 본 발명의 실시예를 상세하게 설명하지만, 본 발명이 실시예에 의해 제한되거나 한정되는 것은 아니다.Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings and the contents described in the accompanying drawings, but the present invention is not limited or limited to the embodiments.
본 명세서에서 사용된 용어는 실시예들을 설명하기 위한 것이며 본 발명을 제한하고자 하는 것은 아니다. 본 명세서에서, 단수형은 문구에서 특별히 언급하지 않는 한 복수형도 포함한다. 명세서에서 사용되는 "포함한다(comprises)" 및/또는 "포함하는(comprising)"은 언급된 구성요소, 단계, 동작 및/또는 소자는 하나 이상의 다른 구성요소, 단계, 동작 및/또는 소자의 존재 또는 추가를 배제하지 않는다.The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. In this specification, the singular also includes the plural unless specifically stated otherwise in the phrase. As used herein, “comprises” and / or “comprising” refers to the presence of one or more other components, steps, operations and / or elements. Or does not exclude additions.
본 명세서에서 사용되는 “실시예”, “예”, “측면”, “예시” 등은 기술된 임의의 양상(aspect) 또는 설계가 다른 양상 또는 설계들보다 양호하다거나, 이점이 있는 것으로 해석되어야 하는 것은 아니다.As used herein, “an embodiment”, “an example”, “side”, “an example”, etc., should be construed that any aspect or design described is better or advantageous than other aspects or designs. It is not.
또한, '또는' 이라는 용어는 배타적 논리합 'exclusive or' 이기보다는 포함적인 논리합 'inclusive or' 를 의미한다. 즉, 달리 언급되지 않는 한 또는 문맥으로부터 명확하지 않는 한, 'x가 a 또는 b를 이용한다' 라는 표현은 포함적인 자연 순열들(natural inclusive permutations) 중 어느 하나를 의미한다. In addition, the term 'or' means inclusive or 'inclusive or' rather than 'exclusive or'. In other words, unless stated otherwise or unclear from the context, the expression 'x uses a or b' means any one of natural inclusive permutations.
또한, 본 명세서 및 청구항들에서 사용되는 단수 표현("a" 또는 "an")은, 달리 언급하지 않는 한 또는 단수 형태에 관한 것이라고 문맥으로부터 명확하지 않는 한, 일반적으로 "하나 이상"을 의미하는 것으로 해석되어야 한다.Also, the singular forms “a” or “an”, as used in this specification and in the claims, generally refer to “one or more” unless the context clearly dictates otherwise or in reference to a singular form. Should be interpreted as
또한, 본 명세서 및 청구항들에서 사용되는 제1, 제2 등의 용어는 다양한 구성요소들을 설명하는데 사용될 수 있지만, 상기 구성요소들은 상기 용어들에 의해 한정되어서는 안 된다. 상기 용어들은 하나의 구성요소를 다른 구성요소로부터 구별하는 목적으로만 사용된다.In addition, terms such as first and second used in the present specification and claims may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another.
다른 정의가 없다면, 본 명세서에서 사용되는 모든 용어(기술 및 과학적 용어를 포함)는 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자에게 공통적으로 이해될 수 있는 의미로 사용될 수 있을 것이다. 또 일반적으로 사용되는 사전에 정의되어 있는 용어들은 명백하게 특별히 정의되어 있지 않는 한 이상적으로 또는 과도하게 해석되지 않는다.Unless otherwise defined, all terms (including technical and scientific terms) used in the present specification may be used in a sense that can be commonly understood by those skilled in the art. In addition, the terms defined in the commonly used dictionaries are not ideally or excessively interpreted unless they are specifically defined clearly.
한편, 본 발명을 설명함에 있어서, 관련된 공지 기능 또는 구성에 대한 구체적인 설명이 본 발명의 요지를 불필요하게 흐릴 수 있다고 판단되는 경우에는, 그 상세한 설명을 생략할 것이다. 그리고, 본 명세서에서 사용되는 용어(terminology)들은 본 발명의 실시예를 적절히 표현하기 위해 사용된 용어들로서, 이는 사용자, 운용자의 의도 또는 본 발명이 속하는 분야의 관례 등에 따라 달라질 수 있다. 따라서, 본 용어들에 대한 정의는 본 명세서 전반에 걸친 내용을 토대로 내려져야 할 것이다.On the other hand, in describing the present invention, when it is determined that the detailed description of the related known function or configuration may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted. Terminology used herein is a term used to properly express an embodiment of the present invention, which may vary according to a user, an operator's intention, or a custom in the field to which the present invention belongs. Therefore, the definitions of the terms should be made based on the contents throughout the specification.
도 1은 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 구조 예를 도시한 것이다.1 illustrates a structure example of a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지(100)는 도핑에 의해서 특성이 조절되는 그래핀 투명전극을 포함하여 형성된다. The perovskite solar cell 100 using the graphene electrode according to the embodiment of the present invention is formed including a graphene transparent electrode whose characteristics are controlled by doping.
이를 위해, 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지(100)는 그래핀 전극(110), 정공전달층(120), 차단층(130), 전자전달층(140), 및 상부 전극(150)을 포함한다.To this end, the perovskite solar cell 100 using a graphene electrode according to an embodiment of the present invention is a graphene electrode 110, a hole transport layer 120, a blocking layer 130, an electron transport layer 140 ), And an upper electrode 150.
그래핀 전극(110)은 기판 상에 전사된 그래핀 표면에 불순물 용액을 도포하여 형성된다.The graphene electrode 110 is formed by applying an impurity solution to the graphene surface transferred on the substrate.
상기 기판은 유리기판, 플라스틱 기판 및 플렉서블 기판 중 적어도 어느 하나일 수 있으며, 상기 플렉서블 기판은 폴리에틸렌 글리콜(polyethylenterephthalate, PET), 폴리에틸렌 나프탈레이트(polyethylene naphtalate, PEN), 및 폴리디메치실록산(polydimethylsiloxane, PDMS) 중 적어도 어느 하나일 수 있다. The substrate may be at least one of a glass substrate, a plastic substrate, and a flexible substrate, and the flexible substrate may be polyethylene glycol (polyethylenterephthalate, PET), polyethylene naphtalate (PEN), and polydimethylsiloxane (PDMS). It may be at least one of).
그래핀 전극(110)은 기판 상에 전사된 그래핀을 도핑하기 위해 p형 불순물 용액을 그래핀 상에 스핀코팅하여 형성되며, p형 불순물 용액의 도핑농도에 비례하여 전극 특성이 향상될 수 있다.The graphene electrode 110 is formed by spin coating a p-type impurity solution on the graphene to dope the graphene transferred on the substrate, and the electrode characteristics may be improved in proportion to the doping concentration of the p-type impurity solution. .
또한, 그래핀 전극(110)은 염화금(Gold chloride, AuCl3)인 p형 불순물 용액에 의해 형성되며, 도핑농도는 염화금의 분말 양에 의해 조절될 수 있다.In addition, the graphene electrode 110 is formed by a p-type impurity solution of gold chloride (Gold chloride, AuCl 3 ), the doping concentration may be controlled by the amount of powder of gold chloride.
상기 p형 불순물 용액은 염화금 이외에 질산(HNO3), 염화로듐(RhCl3) 및 TFSA(trifluoromethanesulfonic acid) 중 적어도 어느 하나로 형성될 수 있다. The p-type impurity solution may be formed of at least one of nitric acid (HNO 3 ), rhodium chloride (RhCl 3 ), and trifluoromethanesulfonic acid (TFSA) in addition to gold chloride.
상기 그래핀은 화학기상증착기(chemical vapor deposition, CVD)로 제작되어 상기 기판 상에 전사되며, 이후 PMMA(Poly(methyl methacrylate))를 제거하여 형성될 수 있다. The graphene is manufactured by chemical vapor deposition (CVD), transferred onto the substrate, and then formed by removing poly (methyl methacrylate) (PMMA).
실시예에 따라서, 그래핀 전극(110)은 기판 상에 직접 그래핀을 성장시키거나, 성장된 그래핀을 상기 기판 상에 전사함으로써 형성될 수도 있다. 이때, 그래핀을 성장시키는 방법은 특별히 제한되지 않는다.According to an embodiment, the graphene electrode 110 may be formed by growing graphene directly on the substrate or transferring the grown graphene onto the substrate. At this time, the method for growing graphene is not particularly limited.
실시예에 따라서, 상기 화학기상증착기(CVD) 방법으로 형성된 그래핀 전극(110)은 소수성(hydrophobic) 표면을 가질 수 있다. According to an embodiment, the graphene electrode 110 formed by the chemical vapor deposition (CVD) method may have a hydrophobic surface.
정공전달층(120)은 도핑된 그래핀 전극 상에 증착된다.The hole transport layer 120 is deposited on the doped graphene electrode.
정공전달층(120)은 도핑된 그래핀 전극(110) 상에 메탄올(methanol) 및 PEDOT:PSS 용액을 스핀코팅(spin-coating)한 후, 메탄올을 증발시켜 형성될 수 있다.The hole transport layer 120 may be formed by spin-coating methanol and a PEDOT: PSS solution on the doped graphene electrode 110 and then evaporating methanol.
예를 들면, 정공전달층(120)은 그래핀 전극(110) 표면에 템플레이트팅 물질을 도포함으로써, 이후 용액공정을 통해 균일한 두께와 조성을 갖도록 형성될 수 있다.For example, the hole transport layer 120 may be formed to have a uniform thickness and composition through a solution process by applying a template material on the graphene electrode 110 surface.
실시예에 따라서, 정공전달층(120)은 정공수송층일 수 있고, 무기 산화물 박막을 포함할 수 있다. 상기 무기 산화물 박막은 산화텅스텐(WO3), 삼산화몰리브덴(Molybdenum trioxide, MoO3), 산화바나듐(Vanadium(V) oxide, V2O5), 산화니켈(Nio) 등의 p-형 무기산화물로 형성될 수도 있다.According to an embodiment, the hole transport layer 120 may be a hole transport layer, and may include an inorganic oxide thin film. The inorganic oxide thin film is a p-type inorganic oxide such as tungsten oxide (WO 3 ), molybdenum trioxide (MoO 3 ), vanadium oxide (Vanadium (V) oxide, V 2 O 5 ), nickel oxide (Nio), or the like. It may be formed.
이후, 정공전달층(120)은 무기 산화물 박막 상부에 형성된 PEDOT:PSS 박막을 포함할 수 있으며, 무기 산화물 박막 및 PEDOT:PSS 박막이 함께 정공수송층으로 기능할 수 있다. Thereafter, the hole transport layer 120 may include a PEDOT: PSS thin film formed on the inorganic oxide thin film, and the inorganic oxide thin film and the PEDOT: PSS thin film may function together as a hole transport layer.
차단층(130)은 정공전달층 상에 페로브스카이트(Perovskite) 구조의 물질을 도포하여 기설정된 두께의 박막의 금속 산화물로 형성된다.The blocking layer 130 is formed of a thin metal oxide having a predetermined thickness by applying a perovskite structure material on the hole transport layer.
차단층(130)은 정공전달층(120) 상에 페로브스카이트 구조의 물질 및 다이메틸폼아마이드(N, N, dimethylformamide) 용액을 스핀코팅하여 형성될 수 있다.The blocking layer 130 may be formed by spin-coating a perovskite structure material and a dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer 120.
예를 들면, 차단층(130)은 금속 산화물로서, 이산화 타이타늄(TiO2) 이외에 지르코늄, 티탄, 주석, 아연, 산화아연, 지르코늄디옥사이드(Zirconium dioxide, ZrO2), 산화탄탈(Ta2O3), 산화마그네슘(Magnesium oxide, MgO), 산화하프늄(Hafnium(IV) oxide, HfO2) 등의 박막 형태의 금속 산화물로 형성될 수 있다. For example, the blocking layer 130 is a metal oxide, in addition to titanium dioxide (TiO 2 ), zirconium, titanium, tin, zinc, zinc oxide, zirconium dioxide (ZrO 2 ), tantalum oxide (Ta 2 O 3 ) It may be formed of a metal oxide in the form of a thin film, such as magnesium oxide (Magnesium oxide, MgO), hafnium (IV) oxide, HfO 2 .
전자전달층(140)은 차단층(130) 상에 형성된다.The electron transport layer 140 is formed on the blocking layer 130.
전자전달층(140)은 차단층(130) 상에 전자 이동층인 PCBM(Phenyl-C61-butyric acid methyl ester) 및 톨루엔(toluene) 용액을 스핀코팅하여 형성될 수 있다.The electron transport layer 140 may be formed by spin coating a PCBM (Phenyl-C61-butyric acid methyl ester) and toluene solution on the blocking layer 130.
실시예에 따라서, 전자전달층(140)은 전자수송층일 수 있고, 무기 산화물 박막을 포함할 수 있다. 상기 무기 산화물 박막은 이산화 타이타늄(titanium dioxide, TiO2), 산화아연(Zinc oxide, ZnO) 등의 n-형 무기산화물로 형성될 수도 있다. According to an embodiment, the electron transport layer 140 may be an electron transport layer, and may include an inorganic oxide thin film. The inorganic oxide thin film may be formed of an n-type inorganic oxide such as titanium dioxide (TiO 2 ), zinc oxide (ZnO), or the like.
예를 들면, 상기 무기 산화물 박막이 이산화 타이타늄으로 이루어진 전자 수송층인 경우, 무기산화물 전구체로는 티타늄 비스암모늄 락타토디하이드록사이드(TiBALDH, [CH3CH(O)CO2NH4]2Ti(OH)2) 등이 사용될 수 있다.For example, when the inorganic oxide thin film is an electron transporting layer made of titanium dioxide, the inorganic oxide precursor may be titanium bisammonium lactatodihydroxide (TiBALDH, [CH 3 CH (O) CO 2 NH 4 ] 2 Ti (OH). 2 ) and the like can be used.
상부 전극(150)은 전자전달층(140) 상에 형성된다. The upper electrode 150 is formed on the electron transport layer 140.
상부 전극(150)은 전자전달층(140) 상에 열증착기(thermal evaporator)를 이용하여 은(Ag), 금(Au), 구리(Cu), 알루미늄(Al), 백금(Pt) 및 이들의 합금 중 적어도 어느 하나의 물질로 형성될 수 있다. The upper electrode 150 may be formed of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), and the like by using a thermal evaporator on the electron transport layer 140. It may be formed of at least one material of the alloy.
예를 들면, 상부 전극(150)이 형성되는 방법은 특별히 제한되지 않는다. For example, the method of forming the upper electrode 150 is not particularly limited.
실시예에 따라서, 그래핀 전극(110)이 양극(anode)인 경우, 상부 전극(150)은 음극(cathode)으로 기능할 수 있으며, 이러한 경우 상부 전극(150)은 낮은 일함수를 갖는 금속인 알루미늄(Al)으로 형성될 수 있다.According to the exemplary embodiment, when the graphene electrode 110 is an anode, the upper electrode 150 may function as a cathode, and in this case, the upper electrode 150 may be a metal having a low work function. It may be formed of aluminum (Al).
다른 실시예에 따라서, 그래핀 전극(110)이 음극(cathode)인 경우, 상부 전극(150)은 양극(anode)으로 기능할 수 있으며, 이러한 경우 상부 전극(150)은 높은 일함수를 갖는 금속인 은(Ag)으로 형성될 수 있다. According to another embodiment, when the graphene electrode 110 is a cathode, the upper electrode 150 may function as an anode, in which case the upper electrode 150 is a metal having a high work function. Phosphorus silver (Ag) may be formed.
본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지를 제작하는 구체적 실시예는 다음과 같다. Specific examples of manufacturing a perovskite solar cell using a graphene electrode according to an embodiment of the present invention are as follows.
<그래핀 전극을 이용한 페로브스카이트 태양전지의 제작 과정><Production process of perovskite solar cell using graphene electrode>
기본적으로 염화금(Gold chloride, AuCl3)이 도핑된 그래핀 전극은 일함수가 크기 때문에 페로브스카이트 구조를 p-i-n 구조에 기반하여 제작하였다.Basically, graphene electrode doped with gold chloride (AuCl 3 ) has a large work function, so the perovskite structure is manufactured based on the pin structure.
1) 도핑되지 않거나 도핑된 그래핀 전극 상에 정공전달층을 제작하기 위해 PEDOT:PSS를 증착하였다.1) PEDOT: PSS was deposited to fabricate a hole transport layer on undoped or doped graphene electrodes.
PEDOT:PSS 용액은 메탄올(methanol) : PEDOT:PSS = 2:1 부피 비율로 제작되었으며, 제작된 용액은 그래핀 전극 상에 드롭(drop) 후, 2000rpm에서 약 1분간 스핀코팅하였다.PEDOT: PSS solution was prepared in a methanol: PEDOT: PSS = 2: 1 volume ratio, the prepared solution was spin-coated at 2000rpm for about 1 minute after drop on the graphene electrode.
예를 들면, 상기 제작된 용액을 그래핀 전극 상에 떨어뜨리고 고속으로 회전시켜 얇게 퍼지게 하는 코팅 방법인 스핀코팅(spin coating) 방법을 이용하였다.For example, a spin coating method, which is a coating method in which the prepared solution is dropped on the graphene electrode and rotated at high speed to spread thinly, was used.
이후, 솔벤트(methanol)를 증발시키고, 양질의 막(정공전달층)을 형성하기 위해 150℃에서 20분간 열처리하였다.Thereafter, the solvent (methanol) was evaporated and heat-treated at 150 ° C. for 20 minutes to form a good film (hole transport layer).
2) 40wt% MAPbI3/DMF(N,N, dimethyl formamide) 용액을 그래핀 전극 상에 형성된 정공전달층(PEDOT:PSS/Graphene/Glass) 상에 드롭(drop) 후, 3000rpm에서 200초 간 스핀코팅하고, 이후 100℃에서 2분간 열처리하여 차단층을 형성하였다.2) Drop 40 wt% MAPbI 3 / DMF (N, N, dimethyl formamide) solution onto the hole transport layer (PEDOT: PSS / Graphene / Glass) formed on the graphene electrode and spin for 200 seconds at 3000 rpm After coating, the mixture was heat treated at 100 ° C. for 2 minutes to form a barrier layer.
3) 이후, PCBM(Phenyl-C61-butyric acid methyl ester) 용액을 PCBM/톨루엔(toluene(20mg/1mL))으로 제작한 후, 차단층(MAPbI3(페로브스카이트 구조 물질)/PEDOT:PSS/Graphene/Glass) 상에 드롭(drop)하여 2000rpm에서 60초간 스핀코팅하고, 이후 자연 건조시켜 전자전달층을 형성하였다.3) Subsequently, a Phenyl-C61-butyric acid methyl ester (PCBM) solution was made of PCBM / toluene (20 mg / 1 mL), and then a blocking layer (MAPbI 3 (perovskite structural material) / PEDOT: PSS / Graphene / Glass) was spin-coated at 2000 rpm for 60 seconds, and then naturally dried to form an electron transport layer.
4) 마지막으로 열증착기(thermal evaporator)를 이용하여 알루미늄(Al) 전극을 전자전달층(PCBM/MAPbI3/PEDOT:PSS/Graphene/Glass) 상에 형성하여 상부 전극을 형성하였다. 4) Finally, an aluminum (Al) electrode was formed on an electron transport layer (PCBM / MAPbI 3 / PEDOT: PSS / Graphene / Glass) using a thermal evaporator to form an upper electrode.
도 2는 본 발명의 실시예에 따른 기판 상에 그래핀을 전사하는 예를 도시한 것이다.2 illustrates an example of transferring graphene onto a substrate according to an embodiment of the present invention.
도 2를 참조하면, 그래핀 한 장을 기판(Glass) 상에 전사한다. 상기 기판은 유리기판일 수 있으나, 플렉서블 기판 및 플라스틱 기판 중 어느 하나일 수도 있다.Referring to FIG. 2, a sheet of graphene is transferred onto a glass. The substrate may be a glass substrate, but may be any one of a flexible substrate and a plastic substrate.
예를 들면, 그래핀은 화학기상증착기(chemical vapor deposition, CVD)로 제작되며, 그래핀 한 장을 PMMA(Poly(methyl methacrylate))로 지지하여 탈이온수에 띄운 후, 기판 상에 전사할 수 있다.For example, graphene is manufactured by chemical vapor deposition (CVD), and a sheet of graphene is supported by poly (methyl methacrylate) (PMMA), floated in deionized water, and then transferred onto a substrate. .
실시예에 따라서, 상기 전사된 그래핀은 공기 중에서 건조되며, 이어서 열판 상에 형성된 후 약 180℃에서 2시간 동안 더 건조되어 형성될 수 있다. 이후, 아세톤을 이용하여 PMMA를 제거시킨 후, 자연 건조되어 형성될 수 있다. According to an embodiment, the transferred graphene may be dried in air, and then formed on a hot plate and further dried at about 180 ° C. for 2 hours. Thereafter, after removing PMMA using acetone, it may be naturally dried.
도 3a 및 도 3b는 본 발명의 실시예에 따른 도핑된 그래핀의 제작 예를 도시한 것이다. 3A and 3B illustrate an example of manufacturing doped graphene according to an embodiment of the present invention.
보다 상세하게는, 도 3a는 니트로메탄(Nitro methane) 및 염화금(Gold chloride, AuCl3)의 혼합에 따른 도핑농도의 예를 도시한 것이고, 도 3b는 그래핀/기판 상에 그래핀 전극을 형성하는 예를 도시한 것이다.More specifically, Figure 3a shows an example of the doping concentration according to the mixing of nitromethane (Nitro methane) and gold chloride (Gold chloride, AuCl 3 ), Figure 3b to form a graphene electrode on the graphene / substrate An example is shown.
본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 그래핀 전극은 기판 상에 전사된 그래핀 표면에 도핑되는 도핑 용액에 의해 형성된다.The graphene electrode of the perovskite solar cell using the graphene electrode according to the embodiment of the present invention is formed by a doping solution doped on the graphene surface transferred on the substrate.
실시예에 따라서, 도핑 용액은 p형 그래핀 제작을 위한 염화금이 사용될 수 있다.According to the embodiment, the doping solution may be used gold chloride for the production of p-type graphene.
도 3a를 참조하면, 니트로메탄 및 염화금의 혼합에 따른 도핑 용액은 염화금의 분말 양에 따라 서로 다른 도핑농도를 나타낼 수 있다.Referring to FIG. 3A, the doping solution according to the mixing of nitromethane and gold chloride may exhibit different doping concentrations depending on the amount of powder of gold chloride.
실시예에 따라서, 도핑 용액의 도핑농도를 염화금의 분말 양에 의해 1mM 내지 10mM까지 조절하였으며, 염화금을 균일하게 코팅하기 위하여 도핑 후, 급속 열처리를 사용하여 100℃에서 10분간 열처리하였다.According to the embodiment, the doping concentration of the doping solution was adjusted to 1mM to 10mM by the amount of gold chloride powder, and after doping to uniformly coat the gold chloride, heat treatment was performed at 100 ° C. for 10 minutes using rapid heat treatment.
도 3b를 참조하면, 본 발명의 실시예에 따르면, 그래핀/기판 상에 p형 불순물 용액인 도핑 용액(310)을 도포하고, 스핀코팅(320)함으로써, 도핑된 그래핀을 전극으로 하는 페로브스카이트 태양전지를 제작할 수 있다.Referring to FIG. 3B, according to an exemplary embodiment of the present invention, a doping solution 310 which is a p-type impurity solution is coated on a graphene / substrate, and spin-coated to form a doped graphene electrode. Robesky solar cells can be fabricated.
도핑 용액(310)은 도 3a에서 제작된 염화금의 분말 양에 따라 서로 다른 도핑농도를 나타내는 용액 중 어느 하나일 수 있다.The doping solution 310 may be any one of solutions showing different doping concentrations according to the amount of gold chloride powder prepared in FIG. 3A.
실시예에 따라서, 그래핀/기판 상에 도핑 용액(310)을 도포한 뒤, 약 2500rpm에서 1분 간 스핀코팅하는 과정(320)을 거친다. 이후, P형 불순물 용액이 도포된 p형 불순물 용액/그래핀/기판(330)을 어닐링(Annealing)하는 과정(340)을 거쳐 도핑된 그래핀을 전극으로 하는 그래핀 전극(350)을 형성할 수 있다. According to an embodiment, the doping solution 310 is applied onto the graphene / substrate, followed by spin coating for 1 minute at about 2500 rpm. Thereafter, annealing of the p-type impurity solution / graphene / substrate 330 to which the P-type impurity solution is applied is performed to form a graphene electrode 350 using the doped graphene as an electrode. Can be.
도 4는 본 발명의 실시예에 따른 염화금의 도핑 정도에 대한 실험 결과를 도시한 것이다. Figure 4 shows the experimental results for the doping degree of gold chloride according to an embodiment of the present invention.
보다 상세하게는, 도 4는 염화금이 도핑된 그래핀 전극에 X선 광전자 분광법을 적용하여 획득되는 실험 결과 그래프를 도시한 것이다. More specifically, FIG. 4 shows a graph of experimental results obtained by applying X-ray photoelectron spectroscopy to a gold chloride-doped graphene electrode.
도 4를 참조하면, 염화금이 도핑된 그래핀 전극(AuCl3 doped graphene) 및 도핑되지 않은 그래핀 전극(Pristine graphene)에서의 결합 에너지(Binding energy, eV)에 따른 XPS 강도(XPS Intensity)의 결과를 확인할 수 있다.Referring to FIG. 4, XPS intensity (XPS Intensity) according to binding energy (eV) in gold chloride-doped graphene electrode (AuCl 3 doped graphene) and undoped graphene electrode (Pristine graphene) You can check.
도 4의 실험 결과를 확인해 보면, 염화금이 도핑된 그래핀 전극에서만 금(Au) 및 염소(Cl) 원소가 관찰되는 것을 확인할 수 있으며, 이를 통해 염화금(AuCl3)인 p형 불순물 용액이 그래핀 전극 상에 우수하게 도핑되었음을 확인할 수 있다. 4, the gold (Au) and chlorine (Cl) elements are observed only on the graphene electrode doped with gold chloride. Through this, the p-type impurity solution of gold chloride (AuCl 3 ) is graphene. It can be seen that it is well doped on the electrode.
도 5a 내지 도 5g는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 나노입자의 형성 및 표면 거칠기에 대한 실험 결과를 도시한 것이다.5a to 5g show the results of experiments on the surface roughness and the formation of nanoparticles at different doping concentrations according to an embodiment of the present invention.
보다 상세하게는, 도 5a 내지 도 5f는 염화금(AuCl3)의 도핑농도에 따른 AFM(Atomic Force Microscope, 원자력간현미경) 이미지 및 나노입자 높이(height profile)의 실험 결과 그래프를 도시한 것이고, 도 5g는 염화금(AuCl3)의 도핑농도에 따른 표면 거칠기 값의 실험 결과 그래프를 도시한 것이다.More specifically, FIGS. 5A to 5F show graphs of experimental results of atomic force microscope (AFM) images and nanoparticle height profiles according to the doping concentration of gold chloride (AuCl 3 ), and FIG. 5g shows an experimental result graph of surface roughness values according to the doping concentration of gold chloride (AuCl 3 ).
도 5a는 도핑되지 않은 그래핀 전극(Pristine graphene)을 포함하는 그래핀/기판에 대한 AFM 이미지 및 나노입자 높이의 실험 결과를 나타낸다.FIG. 5A shows experimental results of AFM images and nanoparticle height for graphene / substrate including undoped graphene electrodes (Pristine graphene).
도 5a에서의 AFM 이미지를 살펴보면, 그래핀/기판 상에 p형 불순물이 도핑되지 않은 것을 확인할 수 있고, 나노입자 높이(height profile)의 실험 결과를 살펴보면, 높이 프로파일이 형성되지 않은 것을 확인할 수 있다.Looking at the AFM image in FIG. 5A, it can be seen that the p-type impurity is not doped on the graphene / substrate, and the results of experiments on the nanoparticle height profile show that no height profile is formed. .
도 5b는 1mM의 염화금이 도핑된 그래핀 전극을 포함하는 그래핀/기판에 대한 AFM 이미지 및 나노입자 높이의 실험 결과를 도시한 것이고, 도 5c는 2.5mM의 염화금이 도핑된 그래핀 전극을 포함하는 그래핀/기판에 대한 AFM 이미지 및 나노입자 높이의 실험 결과를 도시한 것이다.FIG. 5B shows experimental results of AFM images and nanoparticle height for graphene / substrate comprising 1 mM gold chloride doped graphene electrode, and FIG. 5C includes graphene electrode doped with 2.5 mM gold chloride. The experimental results of the AFM image and nanoparticle height for the graphene / substrate.
도 5d는 5mM의 염화금이 도핑된 그래핀 전극을 포함하는 그래핀/기판에 대한 AFM 이미지 및 나노입자 높이의 실험 결과를 도시한 것이고, 도 5e는 7.5mM의 염화금이 도핑된 그래핀 전극을 포함하는 그래핀/기판에 대한 AFM 이미지 및 나노입자 높이의 실험 결과를 도시한 것이며, 도 5f는 10mM의 염화금이 도핑된 그래핀 전극을 포함하는 그래핀/기판에 대한 AFM 이미지 및 나노입자 높이의 실험 결과를 도시한 것이다.FIG. 5D shows experimental results of AFM images and nanoparticle height for graphene / substrate comprising 5 mM gold chloride doped graphene electrode, and FIG. 5E includes 7.5 mM gold chloride doped graphene electrode. AFM images of the graphene / substrate and the experimental results of the nanoparticle height is shown, Figure 5f is an experiment of the AFM image and nanoparticle height for the graphene / substrate containing a graphene electrode doped with 10 mM gold chloride The results are shown.
도 5a 내지 도 5f를 참조하면, 염화금(AuCl3)의 분말 양의 증가에 비례하여 그래핀/기판 표면에 불순물들이 형성되는 것을 확인할 수 있고, 그에 따른 높이 프로파일 또한 증가하는 것을 확인할 수 있다. 5A to 5F, it can be seen that impurities are formed on the graphene / substrate surface in proportion to the increase in the amount of powder of gold chloride (AuCl 3 ), and the height profile is also increased accordingly.
이러한 실험 결과들로부터 염화금의 도핑에 의해 금(Au) 나노입자들이 형성되는 것을 알 수 있다. 이는 염화금 이온(1.0eV)에 비해 그래핀(0.22eV)의 환원전위가 높기 때문인 것으로 이해될 수 있다. From these experimental results, it can be seen that gold (Au) nanoparticles are formed by doping with gold chloride. This may be understood that the reduction potential of graphene (0.22eV) is higher than that of gold chloride ions (1.0eV).
도 5g를 참조하면, 도핑되지 않은 그래핀 전극(Pristine)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM 각각의 염화금이 도핑된 그래핀 전극에 따른 그래핀/기판에서의 표면 거칠기 값(Rq)을 확인할 수 있다.Referring to FIG. 5G, surface roughness values (Rq) in graphene / substrate according to undoped graphene electrodes (Pristine) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. )can confirm.
도 5g에 도시된 바와 같이, 염화금의 분말 양에 따른 도핑 용액의 도핑농도(nD)가 증가함에 따라 그래핀/기판 표면의 거칠기 값(Rq)이 증가하는 것을 확인할 수 있다. As shown in FIG. 5g, it can be seen that the roughness value Rq of the graphene / substrate surface increases as the doping concentration n D of the doping solution increases depending on the amount of powder of gold chloride.
도 6은 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 그래핀 면저항에 대한 실험 결과를 도시한 것이다.Figure 6 shows the experimental results for the graphene sheet resistance at different doping concentrations according to an embodiment of the present invention.
보다 상세하게는, 도 6은 도핑되지 않은 그래핀 전극(Pristine)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM 각각의 염화금이 도핑된 그래핀 전극에 따른 그래핀/기판에서의 그래핀의 면저항 측정 결과 그래프를 도시한 것이다. More specifically, FIG. 6 shows graphene on a graphene / substrate according to undoped graphene electrodes (Pristine) and graphene electrodes doped with gold chloride doped with 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. A graph of the sheet resistance measurement results is shown.
도 6을 참조하면, 염화금의 분말 양에 따른 도핑 용액의 도핑농도(nD)가 증가함에 따라 그래핀 전극의 면저항(Sheet resistance)은 점점 감소하는 것을 확인할 수 있다.Referring to FIG. 6, it can be seen that the sheet resistance of the graphene electrode gradually decreases as the doping concentration n D of the doping solution increases depending on the amount of powder of gold chloride.
도 6에 도시된 바와 같이, 기판 상에 전사된 단층 그래핀의 면저항은 평균 ~890ohm/sq로 관찰되었으며, 염화금(AuCl3)의 도핑농도가 1mM 에서 10mM까지 증가함에 따라서, 그래핀 전극의 면저항은 ~890ohm/sq에서 ~70ohm/sq까지 점점 감소하는 것을 확인할 수 있다. 이는 도핑농도가 증가함에 따라 그래핀 전극의 특성이 향상되고 있음을 의미한다. As shown in FIG. 6, the sheet resistance of the single layer graphene transferred onto the substrate was observed to be about 890 ohm / sq on average, and as the doping concentration of gold chloride (AuCl 3 ) increased from 1 mM to 10 mM, the sheet resistance of the graphene electrode. It can be seen that gradually decreases from ~ 890ohm / sq to ~ 70ohm / sq. This means that as the doping concentration increases, the characteristics of the graphene electrode are improved.
도 7은 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 그래핀의 투과도에 대한 실험 결과를 도시한 것이다.Figure 7 shows the experimental results for the permeability of graphene at different doping concentrations according to an embodiment of the present invention.
보다 상세하게는, 도 7은 도핑되지 않은 그래핀 전극(0mM)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM 각각의 염화금이 도핑된 그래핀 전극에 따른 그래핀의 투과도 스펙트럼을 도시한 것이다.More specifically, FIG. 7 shows the transmission spectrum of graphene according to the undoped graphene electrode (0 mM) and the graphene electrode doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. .
도 7을 참조하면, 염화금(AuCl3)의 분말 양에 따른 도핑 용액의 도핑농도가 0에서 10mM로 증가함에 따라서, 550nm에서의 투과도(Transmittance)는 97.6%에서 89.2%로 약 ~8% 감소로 매우 미미한 것을 확인할 수 있다. Referring to FIG. 7, as the doping concentration of the doping solution according to the powder amount of gold chloride (AuCl 3 ) increases from 0 to 10 mM, the transmittance at 550 nm is reduced from about 9% to 89.2% by about 8%. You can see that it is very insignificant.
도 8은 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 DC 전도도 및 광학적 전도도의 특성에 대한 실험 결과를 도시한 것이다.8 shows experimental results of the characteristics of the DC conductivity and the optical conductivity at different doping concentrations according to the embodiment of the present invention.
보다 상세하게는, 도 8은 염화금(AuCl3)이 도핑된 그래핀 전극을 포함하는 투명 전도성 전극이 산업적으로 사용할 수 있는지를 확인하기 위해 하기의 [수식 1]을 통해 DC 전도도 및 광학적 전도도 특성을 확인한 실험 결과 그래프를 도시한 것이다. In more detail, FIG. 8 shows DC conductivity and optical conductivity characteristics through the following [Formula 1] to confirm whether the transparent conductive electrode including the graphene electrode doped with gold chloride (AuCl 3 ) can be used industrially. The graph of the experimental result confirmed is shown.
[수식 1] [Equation 1]
Figure PCTKR2017002415-appb-I000001
Figure PCTKR2017002415-appb-I000001
여기서, T는 투과도를 의미하고, Rs는 면저항을 의미하며, Z0는 자유 공간 임피던스를 의미한다. 또한,
Figure PCTKR2017002415-appb-I000002
는 광학적 전도도를 의미하고,
Figure PCTKR2017002415-appb-I000003
는 DC 전도도를 의미한다.
Here, T means transmittance, Rs means sheet resistance, and Z0 means free space impedance. Also,
Figure PCTKR2017002415-appb-I000002
Means optical conductivity,
Figure PCTKR2017002415-appb-I000003
Means DC conductivity.
도 8을 참조하면, 염화금의 분말 양에 따른 도핑 용액의 도핑농도(nD)가 증가함에 따라 DC전도도/광학적 전도도의 수치 또한 증가하는 것을 확인할 수 있다.Referring to FIG. 8, it can be seen that as the doping concentration n D of the doping solution increases depending on the amount of powder of gold chloride, the value of DC conductivity / optical conductivity also increases.
투명전극을 산업적으로 사용하기 위해서는 DC전도도/광학적 전도도의 수치가 최소 35를 넘어야한다(도 8 그래프 내의 직선이 최소값을 의미한다.). In order to use the transparent electrode industrially, the value of DC conductivity / optical conductivity must be at least 35 (the straight line in FIG. 8 graph means minimum value).
도 8에 도시된 바와 같이, 도핑되지 않은 그래핀 전극(Pristine)을 제외하고는 1mM, 2.5mM, 5mM, 7.5mM 및 10mM의 염화금의 모든 도핑농도에서는 산업적으로 사용되는 최소값보다 크게 나타나는 것을 확인할 수 있으며, 도핑농도가 7.5mM일 때, DC전도도/광학적 전도도는 38.7로 최고값을 나타내는 것을 확인할 수 있다. 이는 ITO(Indium Tin Oxide)의 값(45이상)에 거의 근접한 수치이다. As shown in FIG. 8, except for the undoped graphene electrode (Pristine), all doping concentrations of gold chloride of 1mM, 2.5mM, 5mM, 7.5mM and 10mM appear to be larger than the minimum values used in industry. And, when the doping concentration is 7.5mM, DC conductivity / optical conductivity can be seen that the highest value of 38.7. This value is close to the value of indium tin oxide (ITO) (above 45).
도 9는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 일함수에 대한 실험 결과를 도시한 것이다.Figure 9 shows the experimental results for the work function at different doping concentrations according to an embodiment of the present invention.
보다 상세하게는 도 9는 도핑되지 않은 그래핀 전극(Pristine)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM 각각의 염화금이 도핑된 그래핀 전극 각각에 켈빈 탐침법을 적용하여 측정한 일함수(Work function)의 측정 결과 그래프를 도시한 것이다. More specifically, FIG. 9 illustrates a work function measured by applying a Kelvin probe to each of the undoped graphene electrodes (Pristine) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM, and 10 mM, respectively. The graph shows the measurement result of (Work function).
도 9를 참조하면, 염화금의 분말 양에 따른 도핑 용액의 도핑농도(nD)가 증가함에 따라 일함수 또한 4.52eV에서 4.86eV로, 0.34eV 증가한 것을 확인할 수 있다.Referring to FIG. 9, it can be seen that as the doping concentration (n D ) of the doping solution according to the amount of powder of gold chloride increases, the work function also increases by 0.34 eV from 4.52 eV to 4.86 eV.
이러한 결과를 통해 염화금(AuCl3) 도핑에 의해서 그래핀은 p형이 된 것을 알 수 있으며, 도핑농도가 증가함에 따라 일함수가 증가하는 것을 확인할 수 있다. These results show that the graphene is p-type by gold chloride (AuCl 3 ) doping, it can be seen that the work function increases with increasing doping concentration.
도 10a 및 도 10b는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 그래핀 전계효과 트랜지스터에 대한 실험 결과를 도시한 것이다.10A and 10B illustrate experimental results of graphene field effect transistors at different doping concentrations according to an exemplary embodiment of the present invention.
보다 상세하게는, 도 10a는 도핑되지 않은 그래핀 전극(0mM)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM 각각의 염화금이 도핑된 그래핀 전극에 따른 그래핀 전계효과 트랜지스터의 전류-전압 곡선과 디락점 및 이동도의 결과 그래프를 도시한 것이고, 도 10b는 ISD-VG 곡선으로부터 산출되는 그래핀 전극의 전자 및 정공의 이동도의 결과 그래프를 도시한 것이다. More specifically, FIG. 10A shows the current-voltage of a graphene field effect transistor according to an undoped graphene electrode (0 mM) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. The resultant graphs of the curves and diplock points and mobility are shown, and FIG. 10B shows the resultant graphs of the mobility of electrons and holes of the graphene electrodes calculated from the I SD -V G curves.
모든 시료의 드레인-소스 전류(ISD) 및 게이트 전압(ABG) 곡선은 일반적으로 관찰되는 것처럼 디락점을 중심으로 전자 및 정공의 전도특성을 나타낸다.The drain-source current (I SD ) and gate voltage (A BG ) curves of all samples show the conduction characteristics of electrons and holes around the dilock point as is generally observed.
도 10a를 참조하면, 초기상태 그래핀(0mM)의 트랜지스터(field effect transistor, FET)에서는 ISD-VG 곡선이 대칭적인 것을 확인할 수 있다. 다만, 도핑농도(nD)가 점점 증가함에 따라 비대칭적으로 변화하는 것을 확인할 수 있다.Referring to FIG. 10A, it can be seen that the I SD −V G curve is symmetrical in the field effect transistor (FET) of the initial state graphene (0mM). However, it can be seen that the asymmetry changes as the doping concentration (n D ) gradually increases.
이러한 결과는, 일반적으로 그래핀 FET에서 불순물 도핑에 의해 ISD-VG 곡선이 비대칭적으로 나타나는 결과에 부합하는 것으로서, 염화금(AuCl3)을 도핑하여 제작한 p형 그래핀의 도핑농도에 따른 구조적, 광학적 및 전기적 특성의 변화에 의한 것이다. These results generally correspond to the results of asymmetric I SD -V G curves due to impurity doping in the graphene FET, and according to the doping concentration of p-type graphene prepared by doping with gold chloride (AuCl 3 ). Due to changes in structural, optical and electrical properties.
또한, 도핑농도가 증가함에 따라 음의 게이트 전압 쪽에서의 드레인 전류가 증가하는데, 이것은 그래핀이 점점 금속 특성에 근접하기 때문인 것으로 해석된다. In addition, as the doping concentration increases, the drain current toward the negative gate voltage increases, which is interpreted to be due to the fact that graphene gradually approaches metal properties.
또한, 도 10a를 참조하면, 염화금의 분말 양에 따른 도핑 용액의 도핑농도(nD)가 증가함에 따라 디락점이 이동하는 것을 확인할 수 있다. 또한, 염화금 노출에 의한 그래핀의 화학적 도핑에 따라, ISD-VG 곡선에서 양의 게이트 전압 쪽으로 디락점의 위치가 이동하는 것을 알 수 있다. In addition, referring to FIG. 10A, it can be seen that the dirac point moves as the doping concentration n D of the doping solution increases depending on the amount of powder of gold chloride. In addition, it can be seen that, depending on the chemical doping of graphene due to the exposure of gold chloride, the position of the diplock point shifts toward the positive gate voltage in the I SD -V G curve.
이러한 현상은 그래핀에 흡착된 금(Au)에 따른 전하 전달에 의한 것으로 해석되며, 도핑하지 않은 순수한 그래핀(0mM)의 디락점도 양의 전압 쪽으로 이동된 것을 확인할 수 있는데 이는 p형을 의미하는 것으로서, 대기 분자들의 흡수 때문인 것으로 해석된다.This phenomenon is interpreted as a charge transfer according to the gold (Au) adsorbed on the graphene, it can be seen that the di-lock viscosity of the undoped pure graphene (0mM) shifted toward the positive voltage, which means p-type As interpreted due to absorption of atmospheric molecules.
도 10a에 도시된 바와 같이, 디락점은 도핑농도가 최대 10mM일 때 약 60V가 되는 것을 확인할 수 있다. As shown in FIG. 10A, the dilock point may be found to be about 60V when the doping concentration is at most 10 mM.
도 10b는 도 10a의 ISD-VG 곡선으로부터 하기의 [수식 2]에 의해 산출된 그래핀의 전자 및 정공의 이동도 그래프를 도시한 것이다.FIG. 10B illustrates a graph of mobility of electrons and holes of graphene calculated by Equation 2 below from the I SD -V G curve of FIG. 10A.
[수식 2][Formula 2]
Figure PCTKR2017002415-appb-I000004
Figure PCTKR2017002415-appb-I000004
도 10b에서의 산출된 그래핀 전극의 이동도를 살펴보면, 염화금의 분말 양에 따른 도핑 용액의 도핑농도(nD)가 증가함에 따라 전자(Electron) 이동도는 대략 3,000에서 550cm2/Vs로 감소하는 것을 확인할 수 있다. 반면, 정공(Hole) 이동도는 도핑농도가 증가함에 따라 2200에서 1600cm2/Vs로 감소가 미미한 것을 확인할 수 있다. Referring to the calculated mobility of the graphene electrode in Figure 10b, the electron mobility is reduced from approximately 3,000 to 550 cm 2 / Vs as the doping concentration (n D ) of the doping solution increases depending on the amount of powder of gold chloride You can see that. On the other hand, the hole mobility (Hole) can be seen that the decrease is small from 2200 to 1600cm 2 / Vs as the doping concentration increases.
이러한 결과를 통해 염화금에 따른 p형 불순물이 도핑된 그래핀 전극은 정공 이동층의 전극으로 활용하는 것이 바람직함을 알 수 있다. These results indicate that the graphene electrode doped with p-type impurities due to gold chloride is preferably used as an electrode of the hole transport layer.
도 11은 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 주사전자현미경 이미지를 도시한 것이다.FIG. 11 illustrates a scanning electron microscope image of a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
보다 상세하게는, 도 11은 기판(Glass) 상에 그래핀 전극(Graphene)이 형성되고, 그래핀 전극(Graphene) 상에 정공전달층(PEDOT:PSS)이 형성되며, 정공전달층 상에 차단층(MAPbI3, 페로브스카이트 구조 물질)이 형성되고, 차단층 상에 전자전달층(PCBM)이 형성되며, 전자전달층 상에 상부 전극(Al 전극)이 형성된 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지를 도시한 것이다. More specifically, FIG. 11 is a graphene electrode (Graphene) is formed on the substrate (Glass), a hole transport layer (PEDOT: PSS) is formed on the graphene electrode (Graphene), the blocking on the hole transport layer According to an embodiment of the present invention, a layer (MAPbI 3 , a perovskite structure material) is formed, an electron transport layer (PCBM) is formed on the blocking layer, and an upper electrode (Al electrode) is formed on the electron transport layer. It shows a perovskite solar cell using a graphene electrode.
도 11을 참조하면, 주사현미경 이미지를 통해 ~60-nm 상부 전극(Al 전극), ~50-nm 전자전달층(PCBM), ~380nm 차단층(MAPbI3), ~40nm 정공전달층(PEDOT:PSS) 및 7.5mM 염화금(AuCl3)이 도핑된 그래핀 전극이 기판(Glass) 상에 우수하게 형성되어 있음을 확인할 수 있다. Referring to FIG. 11, through a scanning microscope image, a ~ 60-nm upper electrode (Al electrode), a ~ 50-nm electron transport layer (PCBM), a ~ 380nm blocking layer (MAPbI 3 ), and a ~ 40nm hole transport layer (PEDOT): It can be seen that the graphene electrode doped with PSS) and 7.5 mM gold chloride (AuCl 3 ) is excellently formed on the glass.
도 12a 및 도 12b는 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 특성에 대한 평가 결과를 도시한 것이다.12A and 12B illustrate evaluation results of characteristics of a perovskite solar cell using a graphene electrode according to an exemplary embodiment of the present invention.
보다 상세하게는, 도 12a는 도핑되지 않은 그래핀 전극(Pristine)을 이용한 페로브스카이트 태양전지의 특성 평가 그래프를 도시한 것이고, 도 12b는 7.5mM 염화금이 도핑된 그래핀 전극을 이용한 페로브스카이트 태양전지의 특성 평가 그래프를 도시한 것이다.  More specifically, FIG. 12A illustrates a graph of evaluation of characteristics of a perovskite solar cell using an undoped graphene electrode (Pristine), and FIG. 12B illustrates a perovskite using a graphene electrode doped with 7.5 mM gold chloride. It shows the characteristic evaluation graph of the sky solar cell.
도 12a 및 도 12b를 참조하면, 도핑하지 않은 그래핀 전극(Pristine)보다 7.5mM 염화금이 도핑된 그래핀 전극에서 효율이 더 높게 나타나는 것을 확인할 수 있다.12A and 12B, it can be seen that the graphene electrode doped with 7.5 mM gold chloride is higher in efficiency than the undoped graphene electrode (Pristine).
이러한 이유는 첫 번째로, 그래핀 전극의 전도도 향상에 따른 결과이며, 두 번째로는 염화금의 분말 양에 따른 도핑 용액의 도핑농도가 증가함에 따라 일함수가 커지는 결과에 따른 것으로 해석될 수 있다.The reason for this is, firstly, the result of the conductivity improvement of the graphene electrode, and secondly, the work function increases as the doping concentration of the doping solution increases depending on the amount of gold chloride powder.
도핑농도 증가에 따른 일함수가 커지므로, 그래핀의 페르미 준위를 디락점 더 아래쪽에 위치시킬 수 있고, 그에 따라서 정공전달층인 PEDOT:PSS에서 정공들이 보다 쉽게 이동할 수 있으므로 태양전지의 특성이 향상된 것을 알 수 있다. As the work function increases with increasing doping concentration, the Fermi level of graphene can be placed further down the diplock point, and thus the holes can be moved more easily in the hole transport layer PEDOT: PSS. It can be seen that.
다만, 그 이상의 도핑농도(약 0.9mM)에서는 전도도는 더 향상되지만, 투과도의 감소로 인하여 효율이 감소되는 것을 하기의 [표 1]을 통해 확인할 수 있다. 따라서, 도핑농도가 7.5mM인 그래핀 전극에서 효율이 가장 우수한 것을 확인할 수 있다. However, although the conductivity is further improved at a higher doping concentration (about 0.9mM), it can be confirmed through Table 1 below that the efficiency is reduced due to the decrease in the transmittance. Therefore, it can be seen that the graphene electrode having the doping concentration of 7.5mM has the best efficiency.
[표 1]TABLE 1
Figure PCTKR2017002415-appb-I000005
Figure PCTKR2017002415-appb-I000005
도 13은 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 외부양자 효율에 대한 실험 결과를 도시한 것이다.Figure 13 shows the experimental results for the external quantum efficiency of the perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
보다 상세하게는 도 13은 도핑되지 않은 그래핀 전극(Pristine)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM 각각의 염화금이 도핑된 그래핀 전극 각각에 따른 외부양자 효율(EQE)의 측정 결과 그래프를 도시한 것이다.More specifically, FIG. 13 shows measurement results of external quantum efficiency (EQE) according to undoped graphene electrodes (Pristine) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. The graph is shown.
도 13은 참조하면, 도핑하지 않은 그래핀 전극(0mM)을 사용한 페로브스카이트 태양전지에 비해 1mM 염화금(AuCl3)이 도핑된 그래핀 전극을 사용한 페로브스카이트 태양전지에서 외부 양자효율이 더 높은 값을 나타내는 것을 확인할 수 있다. 다만, 염화금의 분말 양에 따른 도핑 용액의 도핑농도(nD)가 증가함에 따라 외부 양자효율은 감소하는 양상을 나타낸다.Referring to FIG. 13, external quantum efficiency is increased in a perovskite solar cell using a graphene electrode doped with 1 mM gold chloride (AuCl 3 ), compared to a perovskite solar cell using an undoped graphene electrode (0 mM). You can see that it shows a higher value. However, the external quantum efficiency decreases as the doping concentration (n D ) of the doping solution increases depending on the amount of powder of gold chloride.
이러한 결과는 도핑농도가 증가함에 따라 그래핀의 투과율이 감소하는 것과 관련이 있는 것으로 해석된다. 또한, 외부 양자효율을 적분한 값은 이론적으로 단락전류밀도(JSC)와 비례한다는 것은 이미 공지된 특징으로, 전술한 [표 1]을 참조하면, 외부 양자효율을 적분한 값이 단락전류밀도 값과 같은 도핑농도의 의존성 경향을 나타내는 것을 확인할 수 있다. This result is interpreted to be related to the decrease in graphene transmittance with increasing doping concentration. In addition, it is already known that the value integrating the external quantum efficiency is theoretically proportional to the short-circuit current density (J SC ). Referring to the above [Table 1], the value integrating the external quantum efficiency is the short-circuit current density. It can be seen that it shows a dependency tendency of the doping concentration as the value.
도 14a 및 도 14b는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 확산계수 및 캐리어 감쇠시간에 대한 측정 결과 그래프, 및 그에 따른 확산거리의 산출 예를 도시한 것이다.14A and 14B illustrate graphs of measurement results of diffusion coefficients and carrier decay times at different doping concentrations and calculation examples of diffusion distances according to embodiments of the present invention.
보다 상세하게는, 도 14a는 도핑되지 않은 그래핀 전극(0mM)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM 각각의 염화금이 도핑된 그래핀 전극에 따른 확산계수의 측정 결과 그래프를 도시한 것이고, 도 14b는 도핑되지 않은 그래핀 전극(0mM)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM 각각의 염화금이 도핑된 그래핀 전극에 따른 캐리어 감쇠시간의 측정 결과 그래프를 도시한 것이다. More specifically, FIG. 14A shows a graph of measurement results of diffusion coefficients between undoped graphene electrodes (0 mM) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively. FIG. 14B shows a graph of measurement results of carrier decay time according to undoped graphene electrodes (0 mM) and graphene electrodes doped with gold chloride of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM, respectively.
도 14a 및 도 14b를 참조하면, 염화금의 분말 양에 따른 도핑 용액의 도핑농도(nD)에서의 전류 밀도(Current density)에서의 확산계수(Dn) 및 캐리어 감솨시간 (
Figure PCTKR2017002415-appb-I000006
)의 측정 결과 그래프를 확인할 수 있다.
14A and 14B, the diffusion coefficient Dn and the carrier decay time at the current density at the doping concentration n D of the doping solution according to the powder amount of gold chloride (
Figure PCTKR2017002415-appb-I000006
), You can check the graph of the measurement result.
측정된 확산계수(Dn) 및 캐리어 감쇠시간(
Figure PCTKR2017002415-appb-I000007
)의 두 결과로부터 하기의 [수식 3]을 통해 확산거리를 산출할 수 있다.
Measured diffusion coefficient (Dn) and carrier decay time (
Figure PCTKR2017002415-appb-I000007
The diffusion distance can be calculated from the following [Equation 3] from the two results.
[수식 3] [Equation 3]
Figure PCTKR2017002415-appb-I000008
Figure PCTKR2017002415-appb-I000008
전술한 [표 1]을 참조하면, 확산거리는 도핑농도가 7.5mM일 때에 370nm로 가장 우수한 것을 확인할 수 있다. Referring to the above [Table 1], it can be seen that the diffusion distance is best at 370nm when the doping concentration is 7.5mM.
도 15a 내지 도 15f는 본 발명의 실시예에 따른 서로 다른 도핑농도에서의 그래핀 전극을 이용한 페로브스카이트 태양전지의 특성에 대한 평가 결과를 도시한 것이다. 15A to 15F illustrate evaluation results of characteristics of a perovskite solar cell using graphene electrodes at different doping concentrations according to an embodiment of the present invention.
보다 상세하게는, 도 15a 내지 도 15f는 도핑되지 않은 그래핀 전극(Pristine, 0mM)과, 1mM, 2.5mM, 5mM, 7.5mM 및 10mM의 염화금(AuCl3)의 도핑농도에 따른 그래핀 전극을 이용하여 각각 24개의 페로브스카이트 태양전지를 측정한 결과 그래프를 도시한 것이다.More specifically, FIGS. 15A to 15F illustrate graphene electrodes according to doping concentrations of undoped graphene electrodes (Pristine, 0 mM) and doping concentrations of 1 mM, 2.5 mM, 5 mM, 7.5 mM and 10 mM gold chloride (AuCl3). The graph shows the results of measuring 24 perovskite solar cells, respectively.
도 15a를 참조하면, 도핑되지 않은 그래핀 전극(0mM)에 따른 24개의 페로브스카이트 태양전지의 측정 결과는 10.24±1.29%를 나타낸다.Referring to FIG. 15A, the measurement result of 24 perovskite solar cells according to the undoped graphene electrode (0 mM) shows 10.24 ± 1.29%.
또한 도 15b를 참조하면, 1mM의 염화금의 도핑농도에 따른 그래핀 전극을 이용하여 24개의 페로브스카이트 태양전지를 측정한 결과는 13.8±1.32%를 나타내고, 도 15c를 참조하면, 2.5mM의 염화금의 도핑농도에 따른 그래핀 전극을 이용하여 24개의 페로브스카이트 태양전지를 측정한 결과는 14.58±1.28%를 나타낸다.In addition, referring to Figure 15b, the results of measuring 24 perovskite solar cells using a graphene electrode according to the doping concentration of gold chloride of 1mM shows 13.8 ± 1.32%, referring to Figure 15c, 2.5mM Twenty-four perovskite solar cells were measured using graphene electrodes according to the doping concentration of gold chloride, showing 14.58 ± 1.28%.
또한, 도 15d를 참조하면, 5mM의 염화금의 도핑농도에 따른 그래핀 전극을 이용하여 24개의 페로브스카이트 태양전지를 측정한 결과는 15.89±1.17%를 나타내고, 도 15e를 참조하면, 7.5mM의 염화금의 도핑농도에 따른 그래핀 전극을 이용하여 24개의 페로브스카이트 태양전지를 측정한 결과는 15.94±1.26%를 나타낸다.In addition, referring to Figure 15d, the results of measuring 24 perovskite solar cells using a graphene electrode according to the doping concentration of 5mM gold chloride shows 15.89 ± 1.17%, referring to Figure 15e, 7.5mM 24 perovskite solar cells were measured using graphene electrodes according to the doping concentration of gold chloride of 15.94 ± 1.26%.
도 15f를 참조하면, 10mM의 염화금의 도핑농도에 따른 그래핀 전극을 이용하여 24개의 페로브스카이트 태양전지를 측정한 결과는 14.88±1.39%를 나타낸다.Referring to FIG. 15F, the measurement results of 24 perovskite solar cells using graphene electrodes according to the doping concentration of 10 mM gold chloride showed 14.88 ± 1.39%.
도 15a 내지 도 15f를 참조하면, 도핑농도가 7.5mM에서 15.94%로 평균적으로 가장 우수한 것을 확인할 수 있다. Referring to Figure 15a to 15f, it can be seen that the average doping concentration in the average of 15.94% at 7.5mM.
도 16은 본 발명의 실시예에 따른 염화금이 도핑된 그래핀 전극을 이용한 페로브스카이트 태양전지에 대한 전류의 안정성을 측정한 결과를 도시한 것이다.16 shows the results of measuring the stability of the current for the perovskite solar cell using a gold chloride-doped graphene electrode according to an embodiment of the present invention.
보다 상세하게는 도 16은 7.5mM 염화금(AuCl3)이 도핑된 그래핀 전극을 이용한 페로브스카이트 태양전지에 대하여 전류의 안정성을 측정한 결과 그래프를 도시한 것이다. In more detail, FIG. 16 illustrates a graph showing the results of measuring the stability of the current for a perovskite solar cell using a graphene electrode doped with 7.5 mM gold chloride (AuCl 3 ).
예를 들면, 도 16은 7.5mM 염화금이 도핑된 그래핀 전극을 이용한 페로브스카이트 태양전지는 보호(Encapsulation) 기술이 적용되지 않은 상태에서, 회부환경은 50% 습도를 유지하면서 측정한 결과 그래프를 도시한 것이다. For example, FIG. 16 is a graph of a measurement result of a perovskite solar cell using a graphene electrode doped with 7.5 mM gold chloride while the encapsulation environment is maintained at 50% humidity without applying encapsulation technology. It is shown.
도 16을 참조하면, 7.5mM 염화금이 도핑된 그래핀 전극을 이용한 페로브스카이트 태양전지는 100시간 이상의 빛 조사에서도 전류 밀도가 거의 변하지 않는 것을 확인할 수 있다.Referring to Figure 16, the perovskite solar cell using a graphene electrode doped with 7.5mM gold chloride can be seen that the current density hardly changes even after 100 hours of light irradiation.
이에 따라서, 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지는 우수한 안정성 특성을 나타내는 것을 확인할 수 있고, 이러한 결과를 바탕으로 플렉서블 소자에서도 그래핀 전극의 적용이 가능하며, 향후 다양한 광전자소자에 응용될 수 있다. Accordingly, it can be seen that the perovskite solar cell using the graphene electrode according to the embodiment of the present invention exhibits excellent stability characteristics, and the graphene electrode can be applied to the flexible device based on these results. It can be applied to various optoelectronic devices.
도 17은 본 발명의 실시예에 따른 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조 방법의 흐름도를 도시한 것이다.17 is a flowchart illustrating a method of manufacturing a perovskite solar cell using a graphene electrode according to an embodiment of the present invention.
도 17을 참조하면, 단계 1710에서 기판 상에 그래핀을 전사한다.Referring to FIG. 17, in operation 1710, graphene is transferred onto a substrate.
이후 단계 1720에서 전사된 그래핀 표면에 불순물 용액을 도포하여 그래핀 전극을 형성한다.Thereafter, an impurity solution is applied to the graphene surface transferred in step 1720 to form a graphene electrode.
단계 1720은 기판 상에 전사된 그래핀을 도핑하기 위해 p형 불순물 용액을 그래핀 상에 스핀코팅하여 그래핀 전극을 형성하며, p형 불순물 용액의 도핑 농도에 비례하여 그래핀 전극의 전극 특성을 향상시키는 단계일 수 있다.In operation 1720, a graphene electrode is formed by spin coating a p-type impurity solution on the graphene to dope the transferred graphene on the substrate, and the electrode characteristics of the graphene electrode are proportional to the doping concentration of the p-type impurity solution. It may be a step of improving.
상기 그래핀 전극은 염화금(Gold chloride, AuCl3)인 p형 불순물 용액에 의해 형성되며, 도핑농도는 염화금의 분말 양에 의해 조절될 수 있다. The graphene electrode is formed by a p-type impurity solution of gold chloride (AuCl 3 ), and the doping concentration may be controlled by the amount of powder of gold chloride.
단계 1730에서 도핑된 그래핀 전극 상에 정공전달층을 증착한다.In step 1730, a hole transport layer is deposited on the doped graphene electrode.
단계 1730은 도핑된 그래핀 전극 상에 메탄올(methanol) 및 PEDOT:PSS 용액을 스핀코팅한 후, 메탄올을 증발시켜 정공전달층을 증착하는 단계일 수 있다. Step 1730 may be a step of spin-coating methanol and a PEDOT: PSS solution on the doped graphene electrode, and then evaporating methanol to deposit a hole transport layer.
단계 1740에서 정공전달층 상에 페로브스카이트(Perovskite) 구조의 물질을 도포하여 일정 두게의 박막의 금속 산화물의 차단층을 형성한다.In operation 1740, a perovskite structure material is coated on the hole transport layer to form a barrier layer of a thin metal oxide layer.
단계 1740은 정공전달층 상에 페로브스카이트 구조의 물질 및 다이메틸폼아마이드(N, N, dimethylformamide) 용액을 스핀코팅하여 페로브스카이트 구조 물질의 상기 차단층을 형성하는 단계일 수 있다. Step 1740 may be a step of forming the blocking layer of the perovskite structure material by spin coating a perovskite structure material and dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer.
단계 1750에서 차단층 상에 전자전달층을 형성한다.In operation 1750, an electron transport layer is formed on the blocking layer.
단계 1750은 단층 상에 PCBM(Phenyl-C61-butyric acid methyl ester) 및 톨루엔(toluene) 용액을 스핀코팅하여 전자 이동층인 전자전달층을 형성하는 단계일 수 있다. Step 1750 may be a step of forming a electron transfer layer, which is an electron transfer layer, by spin-coating a phenyl-C61-butyric acid methyl ester (PCBM) and toluene solution on a single layer.
단계 1760에서 전자전달층 상에 상부 전극을 형성한다.In operation 1760, an upper electrode is formed on the electron transport layer.
단계 1760은 전자전달층 상에 열증착기(thermal evaporator)를 이용하여 은(Ag), 금(Au), 구리(Cu), 알루미늄(Al), 백금(Pt) 및 이들의 합금 중 적어도 어느 하나의 물질로 상부 전극을 형성하는 단계일 수 있다. Step 1760 is performed on at least one of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt) and alloys thereof using a thermal evaporator on the electron transport layer. It may be a step of forming an upper electrode from a material.
이상과 같이 실시예들이 비록 한정된 실시예와 도면에 의해 설명되었으나, 해당 기술분야에서 통상의 지식을 가진 자라면 상기의 기재로부터 다양한 수정 및 변형이 가능하다. 예를 들어, 설명된 기술들이 설명된 방법과 다른 순서로 수행되거나, 및/또는 설명된 시스템, 구조, 장치, 회로 등의 구성요소들이 설명된 방법과 다른 형태로 결합 또는 조합되거나, 다른 구성요소 또는 균등물에 의하여 대치되거나 치환되더라도 적절한 결과가 달성될 수 있다.Although the embodiments have been described by the limited embodiments and the drawings as described above, various modifications and variations are possible to those skilled in the art from the above description. For example, the described techniques may be performed in a different order than the described method, and / or components of the described systems, structures, devices, circuits, etc. may be combined or combined in a different form than the described method, or other components. Or even if replaced or substituted by equivalents, an appropriate result can be achieved.
그러므로, 다른 구현들, 다른 실시예들 및 특허청구범위와 균등한 것들도 후술하는 특허청구범위의 범위에 속한다.Therefore, other implementations, other embodiments, and equivalents to the claims are within the scope of the claims that follow.

Claims (16)

  1. 기판 상에 전사된 그래핀 표면에 불순물 용액을 도포하여 형성되는 그래핀 전극;A graphene electrode formed by applying an impurity solution to a graphene surface transferred on a substrate;
    상기 도핑된 그래핀 전극 상에 증착되는 정공전달층;A hole transport layer deposited on the doped graphene electrode;
    상기 정공전달층 상에 페로브스카이트(Perovskite) 구조의 물질을 도포하여 기설정된 두께의 박막의 금속 산화물로 형성되는 차단층;A barrier layer formed of a metal oxide of a thin film having a predetermined thickness by applying a material having a perovskite structure on the hole transport layer;
    상기 차단층 상에 형성되는 전자전달층; 및An electron transport layer formed on the blocking layer; And
    상기 전자전달층 상에 형성되는 상부 전극An upper electrode formed on the electron transport layer
    을 포함하는 그래핀 전극을 이용한 페로브스카이트 태양전지. Perovskite solar cell using a graphene electrode comprising a.
  2. 제1항에 있어서,The method of claim 1,
    상기 그래핀 전극은The graphene electrode is
    상기 기판 상에 전사된 그래핀을 도핑하기 위해 p형 불순물 용액을 상기 그래핀 상에 스핀코팅하여 형성되며, 상기 p형 불순물 용액의 도핑농도에 비례하여 전극 특성이 향상되는 것을 특징으로 하는 그래핀 전극을 이용한 페로브스카이트 태양전지.In order to dope the graphene transferred on the substrate is formed by spin coating a p-type impurity solution on the graphene, the graphene characterized in that the electrode characteristics are improved in proportion to the doping concentration of the p-type impurity solution Perovskite solar cell using an electrode.
  3. 제2항에 있어서,The method of claim 2,
    상기 그래핀 전극은The graphene electrode is
    염화금(Gold chloride, AuCl3)인 상기 p형 불순물 용액에 의해 형성되며, 상기 도핑농도는 상기 염화금의 분말 양에 의해 조절되는 것을 특징으로 하는 그래핀 전극을 이용한 페로브스카이트 태양전지. The perovskite solar cell using a graphene electrode is formed by the p-type impurity solution (Gold chloride, AuCl 3 ), the doping concentration is controlled by the amount of powder of the gold chloride.
  4. 제3항에 있어서,The method of claim 3,
    상기 p형 불순물 용액은The p-type impurity solution
    상기 염화금 이외에, 질산(HNO3), 염화로듐(RhCl3) 및 TFSA(trifluoromethanesulfonic acid) 중 적어도 어느 하나로 형성되는 그래핀 전극을 이용한 페로브스카이트 태양전지.In addition to the gold chloride, perovskite solar cell using a graphene electrode formed of at least one of nitric acid (HNO 3 ), rhodium chloride (RhCl 3 ) and trifluoromethanesulfonic acid (TFSA).
  5. 제2항에 있어서,The method of claim 2,
    상기 그래핀은The graphene is
    화학기상증착기(chemical vapor deposition, CVD)로 제작되어 상기 기판 상에 전사되며, 이후 PMMA(Poly(methyl methacrylate))를 제거하여 형성되는 그래핀 전극을 이용한 페로브스카이트 태양전지. A perovskite solar cell using a graphene electrode which is manufactured by chemical vapor deposition (CVD) and transferred onto the substrate, and then formed by removing poly (methyl methacrylate) (PMMA).
  6. 제1항에 있어서,The method of claim 1,
    상기 정공전달층은The hole transport layer is
    상기 도핑된 그래핀 전극 상에 메탄올(methanol) 및 PEDOT:PSS 용액을 스핀코팅한 후, 상기 메탄올을 증발시켜 형성되는 그래핀 전극을 이용한 페로브스카이트 태양전지. A perovskite solar cell using a graphene electrode formed by evaporating the methanol after spin coating a methanol (methanol) and a PEDOT: PSS solution on the doped graphene electrode.
  7. 제1항에 있어서,The method of claim 1,
    상기 차단층은The blocking layer
    상기 정공전달층 상에 상기 페로브스카이트 구조의 물질 및 다이메틸폼아마이드(N, N, dimethylformamide) 용액을 스핀코팅하여 형성되는 그래핀 전극을 이용한 페로브스카이트 태양전지.A perovskite solar cell using a graphene electrode formed by spin coating the perovskite structure material and dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer.
  8. 제1항에 있어서,The method of claim 1,
    상기 전자전달층은The electron transport layer
    상기 차단층 상에 전자 이동층인 PCBM(Phenyl-C61-butyric acid methyl ester) 및 톨루엔(toluene) 용액을 스핀코팅하여 형성되는 그래핀 전극을 이용한 페로브스카이트 태양전지.A perovskite solar cell using a graphene electrode formed by spin coating a PCBM (Phenyl-C61-butyric acid methyl ester) and a toluene solution on the blocking layer.
  9. 제1항에 있어서,The method of claim 1,
    상기 상부 전극은The upper electrode is
    상기 전자전달층 상에 열증착기(thermal evaporator)를 이용하여 은(Ag), 금(Au), 구리(Cu), 알루미늄(Al), 백금(Pt) 및 이들의 합금 중 적어도 어느 하나의 물질로 형성되는 그래핀 전극을 이용한 페로브스카이트 태양전지. Using a thermal evaporator on the electron transport layer to at least one material of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt) and alloys thereof Perovskite solar cell using a graphene electrode formed.
  10. 기판 상에 그래핀을 전사하는 단계;Transferring graphene onto the substrate;
    상기 전사된 그래핀 표면에 불순물 용액을 도포하여 그래핀 전극을 형성하는 단계;Forming a graphene electrode by applying an impurity solution to the transferred graphene surface;
    상기 도핑된 그래핀 전극 상에 정공전달층을 증착하는 단계;Depositing a hole transport layer on the doped graphene electrode;
    상기 정공전달층 상에 페로브스카이트(Perovskite) 구조의 물질을 도포하여 일정 두께의 박막의 금속 산화물의 차단층을 형성하는 단계;Applying a material having a perovskite structure on the hole transport layer to form a barrier layer of a metal oxide having a predetermined thickness;
    상기 차단층 상에 전자전달층을 형성하는 단계; 및Forming an electron transport layer on the blocking layer; And
    상기 전자전달층 상에 상부 전극을 형성하는 단계Forming an upper electrode on the electron transport layer
    를 포함하는 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조방법.Method for producing a perovskite solar cell using a graphene electrode comprising a.
  11. 제10항에 있어서,The method of claim 10,
    상기 그래핀 전극을 형성하는 단계는Forming the graphene electrode
    상기 기판 상에 전사된 그래핀을 도핑하기 위해 p형 불순물 용액을 상기 그래핀 상에 스핀코팅하여 상기 그래핀 전극을 형성하며, 상기 p형 불순물 용액의 도핑농도에 비례하여 상기 그래핀 전극의 전극 특성을 향상시키는 것을 특징으로 하는 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조방법. In order to dope the graphene transferred on the substrate to form a graphene electrode by spin coating a p-type impurity solution on the graphene, the electrode of the graphene electrode in proportion to the doping concentration of the p-type impurity solution Method for producing a perovskite solar cell using a graphene electrode, characterized in that to improve the characteristics.
  12. 제11항에 있어서,The method of claim 11,
    상기 그래핀 전극은The graphene electrode is
    염화금(Gold chloride, AuCl3)인 상기 p형 불순물 용액에 의해 형성되며, 상기 도핑농도는 상기 염화금의 분말 양에 의해 조절되는 것을 특징으로 하는 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조방법.Formed by the p-type impurity solution (Gold chloride, AuCl 3 ), the doping concentration is a method of manufacturing a perovskite solar cell using a graphene electrode, characterized in that controlled by the amount of powder of the gold chloride. .
  13. 제10항에 있어서,The method of claim 10,
    상기 정공전달층을 증착하는 단계는Depositing the hole transport layer is
    상기 도핑된 그래핀 전극 상에 메탄올(methanol) 및 PEDOT:PSS 용액을 스핀코팅한 후, 상기 메탄올을 증발시켜 상기 정공전달층을 증착하는 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조방법. After the spin coating the methanol (methanol) and PEDOT: PSS solution on the doped graphene electrode, a method of manufacturing a perovskite solar cell using a graphene electrode to evaporate the methanol to deposit the hole transport layer.
  14. 제10항에 있어서, The method of claim 10,
    상기 차단층을 형성하는 단계는Forming the blocking layer
    상기 정공전달층 상에 상기 페로브스카이트 구조의 물질 및 다이메틸폼아마이드(N, N, dimethylformamide) 용액을 스핀코팅하여 페로브스카이트 구조 물질의 상기 차단층을 형성하는 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조방법.Peptide using a graphene electrode to form the blocking layer of the perovskite structure material by spin coating the perovskite structure material and dimethylformamide (N, N, dimethylformamide) solution on the hole transport layer Method for manufacturing a robe sky solar cell.
  15. 제10항에 있어서,The method of claim 10,
    상기 전자전달층을 형성하는 단계는Forming the electron transport layer
    상기 차단층 상에 PCBM(Phenyl-C61-butyric acid methyl ester) 및 톨루엔(toluene) 용액을 스핀코팅하여 전자 이동층인 상기 전자전달층을 형성하는 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조방법.Preparation of a perovskite solar cell using a graphene electrode to form the electron transfer layer as an electron transfer layer by spin coating a PCBM (Phenyl-C61-butyric acid methyl ester) and toluene solution on the blocking layer Way.
  16. 제10항에 있어서,The method of claim 10,
    상기 상부 전극을 형성하는 단계는Forming the upper electrode
    상기 전자전달층 상에 열증착기(thermal evaporator)를 이용하여 은(Ag), 금(Au), 구리(Cu), 알루미늄(Al), 백금(Pt) 및 이들의 합금 중 적어도 어느 하나의 물질로 상기 상부 전극을 형성하는 그래핀 전극을 이용한 페로브스카이트 태양전지의 제조방법. Using a thermal evaporator on the electron transport layer to at least one material of silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt) and alloys thereof Method of manufacturing a perovskite solar cell using a graphene electrode to form the upper electrode.
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