WO2018079659A1 - Block copolymer, dispersing agent, and pigment dispersion composition - Google Patents

Block copolymer, dispersing agent, and pigment dispersion composition Download PDF

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Publication number
WO2018079659A1
WO2018079659A1 PCT/JP2017/038717 JP2017038717W WO2018079659A1 WO 2018079659 A1 WO2018079659 A1 WO 2018079659A1 JP 2017038717 W JP2017038717 W JP 2017038717W WO 2018079659 A1 WO2018079659 A1 WO 2018079659A1
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group
block copolymer
block
mass
aromatic
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PCT/JP2017/038717
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French (fr)
Japanese (ja)
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清水達彦
梅本光
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大塚化学株式会社
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Priority to JP2018505485A priority Critical patent/JP6316531B1/en
Priority to CN201780004006.8A priority patent/CN108431064B/en
Priority to KR1020187012560A priority patent/KR102032076B1/en
Publication of WO2018079659A1 publication Critical patent/WO2018079659A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00Post-polymerisation treatments
    • C08F6/06Treatment of polymer solutions
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D17/00Pigment pastes, e.g. for mixing in paints

Definitions

  • the present invention relates to a block copolymer, a dispersant, and a pigment dispersion composition.
  • a pigment dispersion method for example, a coating film made of a pigment dispersion composition in which a pigment, a dispersant, and a dispersion medium (solvent) are mixed is formed on a substrate, exposed through a photomask having a desired pattern shape, and alkali developed. Is done.
  • a transparent electrode for driving the liquid crystal is formed thereon by vapor deposition or sputtering, and further an orientation for aligning the liquid crystal in a certain direction.
  • a film is formed.
  • these transparent electrodes and alignment films their formation is generally performed at a high temperature of 200 ° C. or higher.
  • heat resistance such as a decrease in contrast ratio of the color filter and a change in hue becomes a problem before and after the process involving high heat.
  • Patent Document 1 in order to obtain a color filter having excellent heat resistance, an AB block comprising an A block having a quaternary ammonium base in the side chain and a B block not having a quaternary ammonium base. It is disclosed that a copolymer is used as a pigment dispersant for a color filter (see Patent Document 1 (claim 1, paragraphs 0049 to 0058)).
  • Patent Document 2 an AB block copolymer comprising an A block having an acidic group in the side chain and a B block having an amino group or a quaternary ammonium base in the side chain is used as a pigment dispersant.
  • the coating characteristics, long-term storage stability, and alkali developability are improved (see Patent Document 2 (Claim 1, paragraphs 0031 to 0034, 0038 to 0040)).
  • the present invention has been made in view of the above circumstances, and an object thereof is to provide a block copolymer that can be used as, for example, a dispersant and has excellent heat resistance.
  • the block copolymer of the present invention that has been able to solve the above-mentioned problems includes an A block containing a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the general formula (1), and a general formula ( And a B block including the structural unit represented by 2).
  • R ⁇ 11> , R ⁇ 12 > and R ⁇ 13 > show the chain or cyclic hydrocarbon group which may have a substituent each independently. Two or more of R 11 , R 12 and R 13 may be bonded to each other to form a cyclic structure.
  • X 1 represents a divalent linking group.
  • R 14 represents a hydrogen atom or a methyl group.
  • Y ⁇ represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion, and an aromatic carboxylate anion.
  • R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure.
  • X 2 represents a divalent linking group.
  • R 23 represents a hydrogen atom or a methyl group.
  • a conventional polymer having a quaternary ammonium base generally uses a halogen anion as a counter ion of a quaternary ammonium cation.
  • a polymer containing a halogen anion is considered to be inferior in heat resistance because it causes a counterion elimination reaction in a high temperature atmosphere.
  • the counter ion of the quaternary ammonium cation in the B block is an aromatic dicarboxylic acid imide anion, an aromatic sulfonic acid anion, an aromatic phosphonic acid anion, or an aromatic carboxylic acid anion, Excellent in properties.
  • the block copolymer of this invention has A block which has an acidic group, and B block which has a specific structure, it can be used as a dispersing agent.
  • the block copolymer is preferably an AB type block copolymer.
  • the content of the structural unit derived from the vinyl monomer having an acidic group is preferably 2% by mass to 20% by mass in 100% by mass of the A block.
  • the content of the structural unit represented by the general formula (1) is preferably 30% by mass to 85% by mass in 100% by mass of the B block.
  • the content of the A block is preferably 35% by mass to 85% by mass in 100% by mass of the block copolymer.
  • the present invention includes a first composition containing the block copolymer and a second composition obtained by washing the first composition with water and drying.
  • the molecular weight distribution (PDI) of the block copolymer contained in the first composition is preferably 2.0 or less.
  • the dispersing agent containing the said block copolymer, a 1st composition, or a 2nd composition is contained in this invention.
  • the present invention includes a pigment dispersion composition containing the dispersant, a pigment, and a dispersion medium. Examples of such a composition include a pigment dispersion composition for a color filter.
  • the production method of the block copolymer of the present invention is represented by an A block containing a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the following formula (2), and the following formula (3).
  • R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure.
  • X 2 represents a divalent linking group.
  • R 23 represents a hydrogen atom or a methyl group.
  • R 31 , R 32 and R 33 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. Two or more of R 31 , R 32 and R 33 may be bonded to each other to form a cyclic structure.
  • X 3 represents a divalent linking group.
  • R 34 represents a hydrogen atom or a methyl group.
  • X ⁇ represents a halogen anion.
  • an aromatic dicarboxylic acid imide, aromatic sulfonic acid, aromatic phosphonic acid or an alkali metal salt of aromatic carboxylic acid is used to convert the counter ion of the quaternary ammonium cation from the halogen anion to the aromatic dicarboxylic acid. It becomes easy to exchange (anion exchange) with an acid imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion or an aromatic carboxylate anion.
  • each ion is classified based on the HASB rule.
  • halide ions eg, chloride ions
  • Alkali metal ions eg, potassium ions
  • Aromatic dicarboxylic imide anions, aromatic sulfonate anions, aromatic phosphonate anions and aromatic carboxylate anions having a ⁇ -electron system of aromatic rings are considered to be classified as soft bases.
  • Quaternary ammonium ions in the polymer are considered to be classified as soft acids.
  • a combination of an acid and a base having the same degree of hardness such as a soft base for a soft acid and a hard base for a hard acid, has a strong binding force. It is considered that the anion exchange is facilitated by generating an ion pair having a strong binding force in the anion exchange.
  • the production method preferably prepares the block copolymer precursor using living radical polymerization.
  • the production method preferably includes a step (C) of washing the block copolymer obtained in the step (B) with water.
  • a block copolymer that can be used as a dispersant and has excellent heat resistance can be provided.
  • the block copolymer of the present invention is represented by an A block containing a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the general formula (1) described later, and a general formula (2) described later. And a B block including a structural unit.
  • a block can be rephrased as “A segment”, and “B block” can be rephrased as “B segment”.
  • the “vinyl monomer” refers to a monomer having a carbon-carbon double bond capable of radical polymerization in the molecule.
  • the “structural unit derived from a vinyl monomer” refers to a structural unit in which a carbon-carbon double bond capable of radical polymerization of a vinyl monomer is polymerized into a carbon-carbon single bond.
  • (Meth) acryl means “at least one of acrylic and methacrylic”.
  • “(Meth) acrylate” means “at least one of acrylate and methacrylate”.
  • “(Meth) acryloyl” refers to “at least one of acryloyl and methacryloyl”.
  • the A block is a polymer block having a structural unit derived from a vinyl monomer having an acidic group. It is thought that alkali development becomes easy because A block has an acidic group. Therefore, the block copolymer can be suitably used in a pigment dispersion composition for a color filter used for producing a color filter employing alkali development.
  • a block may have only 1 type of structural unit derived from the vinyl monomer which has an acidic group, and may have 2 or more types.
  • the vinyl monomer having an acidic group is preferably at least one selected from a vinyl monomer having a carboxy group, a vinyl monomer having a sulfonic acid group, or a vinyl monomer having a phosphoric acid group.
  • at least one selected from a (meth) acrylic monomer having a carboxy group, a (meth) acrylic monomer having a sulfonic acid group, or a (meth) acrylic monomer having a phosphoric acid group is preferable.
  • vinyl monomers having a carboxy group examples include (meth) acrylic acid; hydroxy groups such as 2- (meth) acryloyloxyethyl succinate, 2- (meth) acryloyloxyethyl maleate, 2- (meth) acryloyloxyethyl phthalate A monomer obtained by reacting an acid anhydride such as maleic anhydride, succinic anhydride or phthalic anhydride with a vinyl monomer (preferably hydroxyalkyl (meth) acrylate) having a carboxylic acid; crotonic acid, maleic acid, itaconic acid and the like.
  • an acid anhydride such as maleic anhydride, succinic anhydride or phthalic anhydride
  • a vinyl monomer preferably hydroxyalkyl (meth) acrylate
  • vinyl monomer having a sulfonic acid group examples include vinyl sulfonic acid, styrene sulfonic acid, ethyl disulfonate (meth) acrylate, methylpropyl sulfonic acid (meth) acrylamide, and ethyl sulfonate (meth) acrylamide.
  • Examples of the vinyl monomer having a phosphate group include 2- (phosphonooxy) ethyl (meth) acrylate.
  • the content of the structural unit derived from the vinyl monomer having an acidic group is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and 20% by mass in 100% by mass of the A block. % Or less is preferable, more preferably 18% by mass or less, and still more preferably 16% by mass or less. If the content of the structural unit derived from the vinyl monomer having an acidic group is 2% by mass or more, the dissolution rate when neutralized with an alkali is increased in alkali development, and if it is 20% by mass or less, the hydrophilicity is high. However, it is possible to prevent the formed pixels from becoming messy.
  • the A block may have a structural unit other than the structural unit derived from the vinyl monomer having an acidic group.
  • the other structural unit that can be contained in the A block is not particularly limited as long as it is formed by a vinyl monomer that can be copolymerized with both a vinyl monomer having an acidic group and a vinyl monomer that forms the B block described later.
  • Vinyl monomers that can form other structural units of the A block may be used alone or in combination of two or more.
  • Examples of the ⁇ -olefin include 1-hexene, 1-octene, 1-decene and the like.
  • Examples of the aromatic vinyl monomer include styrene, ⁇ -methylstyrene, 4-methylstyrene, 2-methylstyrene, 3-methylstyrene, 4-methoxystyrene, 2-hydroxymethylstyrene, 1-vinylnaphthalene and the like.
  • Examples of the vinyl monomer containing a heterocycle include 2-vinylthiophene, N-methyl-2-vinylpyrrole, 1-vinyl-2-pyrrolidone, 2-vinylpyridine, 4-vinylpyridine and the like.
  • Examples of the vinylamide include N-vinylformamide, N-vinylacetamide, N-vinyl- ⁇ -captolactam and the like.
  • Examples of vinyl carboxylate include vinyl acetate, vinyl pivalate, vinyl benzoate and the like.
  • Examples of dienes include butadiene, isoprene, 4-methyl-1,4-hexadiene, 7-methyl-1,6-octadiene and the like.
  • (Meth) acrylic monomers include (meth) acrylates having a chain alkyl group (straight chain alkyl group or branched chain alkyl group); (meth) acrylates having a cyclic alkyl group (monocyclic structure); aromatic ring groups (Meth) acrylate having (meth) acrylamide; (meth) acrylate having a polyethylene glycol structural unit; (meth) acrylate having a hydroxy group; caprolactone adduct of (meth) acrylate having a hydroxy group; ) Acrylate; (meth) acrylate having a cyclic ether group.
  • Examples of the (meth) acrylate having a chain alkyl group include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, sec-butyl (Meth) acrylate, tert-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and the like.
  • Examples of the (meth) acrylate having a cyclic alkyl group include cyclohexyl (meth) acrylate, methylcyclohexyl (meth) acrylate, and cyclododecyl (meth) acrylate.
  • Examples of the (meth) acrylate having an aromatic ring group include benzyl (meth) acrylate, phenyl (meth) acrylate, and phenoxyethyl (meth) acrylate.
  • Examples of (meth) acrylamide include (meth) acrylamide, N-methyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide and the like.
  • Examples of the (meth) acrylate having a hydroxy group include 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate and the like. (Meth) acrylate etc. are mentioned.
  • the caprolactone adduct of (meth) acrylate having a hydroxy group includes a 1 mol adduct of caprolactone of 2-hydroxyethyl (meth) acrylate, a 2 mol adduct of caprolactone of 2-hydroxyethyl (meth) acrylate, and 2-hydroxyethyl (meth).
  • Examples include acrylate caprolactone 3 mol adduct, 2-hydroxyethyl (meth) acrylate caprolactone 4 mol adduct, 2-hydroxyethyl (meth) acrylate caprolactone 5 mol adduct, and the like.
  • Examples of the (meth) acrylate having an alkoxy group include methoxyethyl (meth) acrylate and ethoxyethyl (meth) acrylate.
  • Examples of the (meth) acrylate having a cyclic ether group include glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, (meth) acryloylmorpholine, 2- (4-morpholinyl) ethyl (meth) acrylate, (3- Ethyl oxetane-3-yl) methyl (meth) acrylate, (2-methyl-2-ethyl-1,3-dioxolan-4-yl) methyl (meth) acrylate, cyclic trimethylolpropane formal (meth) acrylate, 2- [(2-Tetrahydropyranyl) oxy] ethyl (meth) acrylate, 1,3-dioxane- (meth) acrylate and the like.
  • the vinyl monomer that can form another structural unit that can be included in the A block is preferably a (meth) acrylic monomer, (meth) acrylate having a chain alkyl group, (meth) acrylate having an aromatic ring group, polyethylene glycol structure At least one selected from the group consisting of (meth) acrylates having units, (meth) acrylates having hydroxy groups, caprolactone adducts of (meth) acrylates having hydroxy groups, and (meth) acrylates having cyclic ether groups More preferably.
  • the vinyl monomer that can be used in the A block can be used alone or in combination of two or more.
  • the total content of these structural units is preferably 30% by mass or more, more preferably 35% by mass or more, and further preferably 40% by mass or more in 100% by mass of the A block.
  • 98 mass% or less is preferable, More preferably, it is 95 mass% or less, More preferably, it is 90 mass% or less.
  • a block is (meth) acrylamide, (meth) acrylate having a polyethylene glycol structural unit, (meth) acrylate having a hydroxy group, caprolactone adduct of (meth) acrylate having a hydroxy group, (meth) acrylate having an alkoxy group And having a structural unit derived from at least one vinyl monomer selected from the group consisting of (meth) acrylates having a cyclic ether group, the total content of these structural units is 100% by mass in the A block. Is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 10% by mass or more, preferably 70% by mass or less, more preferably 65% by mass or less, and further preferably 60% by mass or less. .
  • the A block preferably has no amino group. That is, it is preferable that the vinyl monomer constituting the A block does not contain a vinyl monomer having an amino group.
  • the pigment when used as a pigment dispersant, the pigment is adsorbed by both the A block and the B block, and the dispersion performance of the pigment is lowered.
  • the content of the structural unit derived from the vinyl monomer having an amino group in the A block is preferably 2% by mass or less, more preferably 1% by mass or less, still more preferably 0.1% by mass or less, and most preferably 0% by mass. %.
  • the various structural units contained in the A block may be contained in any form such as random copolymerization and block copolymerization in the A block. From the viewpoint of uniformity, it is preferably contained in the form of random copolymerization.
  • the A block may be formed of a copolymer of a structural unit composed of an a1 block and a structural unit composed of an a2 block.
  • the B block is a polymer block having a structural unit represented by the general formula (1) and a structural unit represented by the general formula (2). Since the B block has a quaternary ammonium base in addition to a tertiary amino group, it is considered to have a high affinity with the pigment.
  • the structural unit represented by the general formula (1) has a quaternary ammonium salt in the structure, and as its anion component, an aromatic dicarboxylic acid imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion and an aromatic It has at least one selected from the group consisting of carboxylate anions.
  • the structural unit represented by the general formula (1) in the B block may be only one type or may have two or more types.
  • R ⁇ 11> , R ⁇ 12 > and R ⁇ 13 > show the chain or cyclic hydrocarbon group which may have a substituent each independently. Two or more of R 11 , R 12 and R 13 may be bonded to each other to form a cyclic structure.
  • X 1 represents a divalent linking group.
  • R 14 represents a hydrogen atom or a methyl group.
  • Y ⁇ represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion, and an aromatic carboxylate anion.
  • the chain hydrocarbon group represented by R 11 to R 13 includes both straight and branched chain groups.
  • Examples of the group represented by R 11 to R 13 include an alkyl group having 1 to 4 carbon atoms which may have a substituent, and an aralkyl group having 7 to 16 carbon atoms which may have a substituent.
  • a methyl group, an ethyl group, a propyl group, and a benzyl group (—CH 2 C 6 H 5 ) are more preferable.
  • Examples of the cyclic structure formed by bonding two or more of R 11 to R 13 to each other include a 5- to 7-membered nitrogen-containing heteromonocycle or a condensed ring formed by condensing two of these.
  • the nitrogen-containing heterocycle preferably has no aromaticity, and more preferably a saturated ring. Specific examples include structures represented by the following formulas (11-1), (11-2), and (11-3).
  • R 61 is any one of R 11 to R 13 .
  • R 62 represents an alkyl group having 1 to 6 carbon atoms.
  • l represents an integer of 0 to 5.
  • m represents an integer of 0 to 4.
  • n represents an integer of 0 to 4. When l is 2 to 5, m is 2 to 4, and n is 2 to 4, a plurality of R 62 may be the same or different.
  • examples of the divalent linking group X 1 include a methylene group, an alkylene group having 2 to 10 carbon atoms, an arylene group, a —CONH—R 15 — group, a —COO—R 16 — group
  • R 15 and R 16 are a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms.
  • the divalent linking group X 1 is preferably a —COO—R 16 — group, more preferably a —COO—R 17 — group (wherein R 17 is a methylene group, an alkylene group having 2 to 4 carbon atoms).
  • Y ⁇ as a counter ion represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion and an aromatic carboxylate anion.
  • Y ⁇ as the counter ion is preferably an aromatic dicarboxylic acid imide anion or an aromatic sulfonic acid anion.
  • An aromatic dicarboxylic acid imide anion is an anion of an aromatic dicarboxylic acid imide and is obtained by removing a proton from nitrogen constituting dicarbomide.
  • the aromatic dicarboxylic imide has an aromatic ring and an imide group (—C ( ⁇ O) NHC ( ⁇ O) —) directly bonded to the aromatic ring in the molecule. Both ends of the imide group may be bonded to one aromatic ring, or may be bonded to different aromatic rings.
  • the aromatic dicarboxylic acid imide anion those represented by the general formula (12) are preferable.
  • Ring A represents an aromatic ring which may have a substituent.
  • the aromatic ring constituting the ring A is a ring structure having aromaticity.
  • the aromatic ring includes both single rings and condensed rings.
  • As the monocycle a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable.
  • the condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring.
  • Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
  • the aromatic dicarboxylic acid imide anion includes 1,3-dioxo-1,3-dihydro-2H-isoindole-2-ide (formula (12-1)); 1,3-dioxo-1,3-dihydro- 2H-benzo [f] isoindole-2-id (formula (12-2)); 1,3-dioxo-1,3-dihydro-2H-benzo [g] isoindole-2-id (formula (12-) 3)); 5-phenyl-1,3-dioxo-1,3-dihydro-2H-isoindole-2-ide (formula (12-4)); 1,3-dioxo-1,3-dihydro-2H -Naphtho [2,3-f] isoindole-2-id (formula (12-5)); 1,3-dioxo-1,3-dihydro-2H-naphtho [2,
  • the aromatic sulfonic acid anion is an anion of aromatic sulfonic acid.
  • the aromatic sulfonic acid has an aromatic ring and a sulfonic acid group directly bonded to the aromatic ring in the molecule.
  • an aromatic sulfonate anion what is represented by following formula (13) is preferable.
  • Ar represents the aromatic ring which may have a substituent.
  • the aromatic ring constituting Ar is a ring structure having aromaticity.
  • the aromatic ring includes both single rings and condensed rings.
  • As the monocycle a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable.
  • the condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring.
  • Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
  • aromatic sulfonate anions examples include benzenesulfonate anion (formula (13-1)); 1-naphthalenesulfonate anion (formula (13-2)); 2-naphthalenesulfonate anion (formula (13-3)) 4-biphenylsulfonate anion (formula (13-4)); 2-anthracenesulfonate anion (formula (13-5)); 1-anthracenesulfonate anion (formula (13-6)); 3-phenanthrenesulfone Acid anion (formula (13-7)); p-styrene sulfonate anion (formula (13-8)); p-toluenesulfonate anion (formula (13-9)).
  • Aromatic phosphonic acids have an aromatic ring and a phosphonic acid group directly bonded to the aromatic ring in the molecule.
  • aromatic phosphonate anion what is represented by following formula (14) is preferable.
  • Ar represents the aromatic ring which may have a substituent.
  • the aromatic ring constituting Ar is a ring structure having aromaticity.
  • the aromatic ring includes both single rings and condensed rings.
  • As the monocycle a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable.
  • the condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring.
  • Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
  • benzenephosphonate anion (formula (14-1)); 1-naphthalenephosphonate anion (formula (14-2)); 2-naphthalenephosphonate anion (formula (14-3)) 4-biphenylphosphonate anion (formula (14-4)); 2-anthracenephosphonate anion (formula (14-5)); 1-anthracenephosphonate anion (formula (14-6)); 3-phenanthrenephosphone Acid anion (formula (14-7)); and the like.
  • the aromatic carboxylic acid anion is an anion of an aromatic carboxylic acid.
  • the aromatic carboxylic acid has an aromatic ring and a carboxy group directly bonded to the aromatic ring in the molecule.
  • an aromatic carboxylate anion what is represented by following formula (15) is preferable.
  • Ar represents the aromatic ring which may have a substituent.
  • the aromatic ring constituting Ar is a ring structure having aromaticity.
  • the aromatic ring includes both single rings and condensed rings.
  • As the monocycle a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable.
  • the condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring.
  • Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
  • aromatic carboxylate anion examples include benzoate anion (formula (15-1)); 1-naphthalenecarboxylate anion (formula (15-2)); 2-naphthalenecarboxylate anion (formula (15-3)); 4-biphenylcarboxylate anion (formula (15-4)); 2-anthracenecarboxylate anion (formula (15-5)); 1-anthracenecarboxylate anion (formula (15-6)); 3-phenanthrenecarboxylic acid An anion (formula (15-7)); p-styrene carboxylate anion (formula (15-8)); p-toluenecarboxylate anion (formula (15-9)).
  • the content of the structural unit represented by the general formula (1) is preferably 30% by mass or more, more preferably 35% by mass or more, still more preferably 40% by mass or more, and 85% by mass in 100% by mass of the B block. % Or less, more preferably 80% by mass or less, and still more preferably 75% by mass or less.
  • the structural unit represented by the general formula (2) has a tertiary amine structure.
  • the structural unit represented by the general formula (2) in the B block may be only one type, or may have two or more types.
  • R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure.
  • X 2 represents a divalent linking group.
  • R 23 represents a hydrogen atom or a methyl group.
  • the chain hydrocarbon group represented by R 21 or R 22 includes both linear and branched chains.
  • Examples of the group represented by R 21 or R 22 include an alkyl group having 1 to 4 carbon atoms which may have a substituent, and an aralkyl group having 7 to 16 carbon atoms which may have a substituent.
  • a methyl group, an ethyl group, a propyl group, and a benzyl group are more preferable.
  • Examples of the cyclic structure formed by bonding R 21 or R 22 to each other include a 5- to 7-membered nitrogen-containing heteromonocycle or a condensed ring formed by condensing two of these.
  • the nitrogen-containing heterocycle preferably has no aromaticity, and more preferably a saturated ring.
  • Specific examples include structures represented by the following formulas (21-1), (21-2), and (21-3).
  • R 71 represents an alkyl group having 1 to 6 carbon atoms.
  • l represents an integer of 0 to 5.
  • m represents an integer of 0 to 4.
  • n represents an integer of 0 to 4.
  • l is 2 to 5
  • m is 2 to 4
  • n is 2 to 4, a plurality of R 71 may be the same or different.
  • examples of the divalent linking group X 2 include a methylene group, an alkylene group having 2 to 10 carbon atoms, an arylene group, a —CONH—R 24 — group, and a —COO—R 25 — group.
  • R 24 and R 25 are a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms].
  • the content of the structural unit represented by the general formula (2) is preferably 15% by mass or more, more preferably 20% by mass or more, further preferably 25% by mass or more, and 70% by mass in 100% by mass of the B block. % Or less, more preferably 65% by mass or less, and still more preferably 60% by mass or less.
  • the B block may be only the structural unit represented by the general formula (1) and the structural unit represented by the general formula (2), or may include other structural units. From the viewpoint of maintaining affinity with the pigment, the total content of the structural unit represented by the general formula (1) and the structural unit represented by the general formula (2) in the B block is 80% by mass or more. More preferably, it is 90 mass% or more, More preferably, it is 95 mass% or more. Moreover, it is preferable that B block does not contain substantially the structural unit derived from the vinyl monomer which has the acidic group which A block has. That is, the content of the structural unit derived from the vinyl monomer having an acidic group in the A block is preferably 5% by mass or less, and more preferably 2% by mass or less in 100% by mass of the B block.
  • vinyl monomer that can form another structural unit of the B block include the same ones as exemplified as specific examples of the vinyl monomer that can form the other structural unit of the A block.
  • the various structural units contained in the B block may be contained in any form such as random copolymerization and block copolymerization in the B block. From the viewpoint of uniformity, it is preferably contained in the form of random copolymerization.
  • the B block may be formed of a copolymer of a structural unit composed of a b1 block and a structural unit composed of a b2 block.
  • the structure of the block copolymer of the present invention is preferably a linear block copolymer.
  • the linear block copolymer may have any structure (arrangement). From the viewpoint of the physical properties of the linear block copolymer or the physical properties of the composition, the A block is A and the B block is B.
  • a diblock copolymer represented by AB when expressed as, (a-B) m type, (a-B) m -A type, (B-a) m -B type (m is an integer of 1 or more, for example, an integer of 1 to 3) the group consisting of It is preferably a copolymer having at least one structure selected from Among these, a diblock copolymer represented by AB is preferable from the viewpoint of handleability during processing and physical properties of the composition.
  • the diblock copolymer represented by AB it is derived from a structural unit derived from a vinyl monomer having an acidic group in the A block and a vinyl monomer having a tertiary amino group in the B block. It is considered that the structural unit and the structural unit derived from the vinyl monomer having a quaternary ammonium base are localized, so that the pigment, the solvent, and the binder resin (alkali-soluble resin) can be efficiently operated suitably.
  • the content of the A block is preferably 35% by mass or more, more preferably 40% by mass or more, still more preferably 45% by mass or more, and preferably 85% by mass or less, in 100% by mass of the entire block copolymer. More preferably, it is 80 mass% or less, More preferably, it is 75 mass% or less.
  • the content of the B block is preferably 15% by mass or more, more preferably 20% by mass or more, still more preferably 25% by mass or more, and preferably 65% by mass or less, in 100% by mass of the entire block copolymer. More preferably, it is 60 mass% or less, More preferably, it is 55 mass% or less.
  • the first composition of the present invention contains the block copolymer.
  • the first composition contains components other than the block copolymer.
  • the impurity resulting from the manufacturing method of a block copolymer is mentioned.
  • at least one alkali selected from the group consisting of a quaternizing agent described later, aromatic dicarboxylic imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid is used.
  • a metal salt examples include a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as an aromatic dicarboxylic acid imide.
  • the first composition is prepared by filtering impurities such as precipitated salts (a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as aromatic dicarboxylic acid imide). It is preferable to remove.
  • impurities such as precipitated salts (a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as aromatic dicarboxylic acid imide). It is preferable to remove.
  • the molecular weight of the block copolymer contained in the first composition is measured by a gel permeation chromatography (hereinafter referred to as “GPC”) method.
  • the block copolymer preferably has a weight average molecular weight (Mw) of 5000 or more, more preferably 6000 or more, further preferably 7000 or more, preferably 15000 or less, more preferably 12000 or less, and still more preferably 10,000 or less. .
  • Mw weight average molecular weight
  • the molecular weight distribution (PDI) of the block copolymer contained in the first composition is preferably 2.0 or less, and more preferably 1.6 or less.
  • the molecular weight distribution (PDI) is determined by (weight average molecular weight (Mw) of block copolymer) / (number average molecular weight (Mn) of block copolymer). The smaller the PDI, the narrower the molecular weight distribution and the more uniform the copolymer. When the value is 1.0, the molecular weight distribution is the narrowest. When the molecular weight distribution (PDI) of the block copolymer exceeds 2.0, one having a low molecular weight or one having a high molecular weight is included.
  • the amine value of the first composition is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, still more preferably 30 mgKOH / g or more, and 200 mgKOH / g from the viewpoint of the adsorptivity to the pigment and the pigment dispersibility.
  • g or less is preferable, more preferably 150 mgKOH / g or less, and still more preferably 100 mgKOH / g or less.
  • the acid value of the first composition is preferably 5 mgKOH / g or more, more preferably 10 mgKOH / g or more, further preferably 15 mgKOH / g or more, preferably 50 mgKOH / g or less, more preferably 40 mgKOH / g or less, More preferably, it is 35 mgKOH / g or less.
  • the binder resin alkali-soluble resin
  • the second composition of the present invention is obtained by washing the first composition with water and drying.
  • the second composition after washing and drying has a reduced content of salt (a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as an aromatic dicarboxylic acid imide).
  • salt a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as an aromatic dicarboxylic acid imide.
  • the impurity resulting from the manufacturing method of a block copolymer is contained like the said 1st composition.
  • the said 1st composition is a composition containing the said block copolymer, and the reaction liquid at the time of synthesize
  • the block copolymer contained in the second composition may or may not have the structural unit represented by the general formula (1).
  • said 2nd composition contains other components other than a block copolymer.
  • the other components include aromatic dicarboxylic imides, aromatic sulfonic acids, aromatic phosphonic acids, and aromatic carboxylic acids. These aromatic dicarboxylic imides, aromatic sulfonic acids, aromatic phosphonic acids and aromatic carboxylic acids may be anions or alkali metal salts.
  • the molecular weight of the block copolymer contained in the second composition is measured by a GPC method.
  • the block copolymer preferably has a weight average molecular weight (Mw) of 5000 or more, more preferably 6000 or more, further preferably 7000 or more, preferably 15000 or less, more preferably 12000 or less, and still more preferably 10,000 or less. .
  • Mw weight average molecular weight
  • the weight average molecular weight is within the above range, the dispersion performance when used as a dispersant becomes better.
  • the molecular weight distribution (PDI) of the block copolymer contained in the second composition is preferably 2.0 or less, and more preferably 1.6 or less. When the molecular weight distribution (PDI) of the block copolymer exceeds 2.0, one having a low molecular weight or one having a high molecular weight is included.
  • the amine value of the second composition is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, still more preferably 30 mgKOH / g or more, and 200 mgKOH / g from the viewpoint of the adsorptivity to the pigment and the pigment dispersibility.
  • g or less is preferable, more preferably 150 mgKOH / g or less, and still more preferably 100 mgKOH / g or less.
  • the acid value of the second composition is preferably 5 mgKOH / g or more, more preferably 10 mgKOH / g or more, further preferably 15 mgKOH / g or more, preferably 50 mgKOH / g or less, more preferably 40 mgKOH / g or less, More preferably, it is 35 mgKOH / g or less.
  • the second composition preferably has a halogen anion content of 8000 ppm or less, more preferably 6000 ppm or less, and even more preferably 4000 ppm or less.
  • the method for producing a block copolymer of the present invention comprises an A block containing a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the general formula (2) described later, and a general formula (3) described later.
  • the “block copolymer precursor” refers to a block copolymer before anion exchange.
  • a block copolymer precursor is prepared.
  • the block copolymer precursor includes an A block including a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the general formula (2), and a structural unit represented by the general formula (3).
  • R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure.
  • X 2 represents a divalent linking group.
  • R 23 represents a hydrogen atom or a methyl group.
  • R 21 to R 23 and X 2 in the formula (2) are the same as those described in the description of the above (B block).
  • R 31 , R 32 and R 33 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. Two or more of R 31 , R 32 and R 33 may be bonded to each other to form a cyclic structure.
  • X 3 represents a divalent linking group.
  • R 34 represents a hydrogen atom or a methyl group.
  • X ⁇ represents a halogen anion.
  • the chain hydrocarbon group represented by R 31 to R 33 includes both linear and branched chains.
  • Examples of the group represented by R 31 to R 33 include an alkyl group having 1 to 4 carbon atoms which may have a substituent, and an aralkyl group having 7 to 16 carbon atoms which may have a substituent.
  • a methyl group, an ethyl group, a propyl group, and a benzyl group are more preferable.
  • Examples of the cyclic structure formed by bonding two or more of R 31 to R 33 to each other include a 5- to 7-membered nitrogen-containing heteromonocycle or a condensed ring formed by condensing two of these.
  • the nitrogen-containing heterocycle preferably has no aromaticity, and more preferably a saturated ring. Specific examples include structures represented by the following formulas (31-1), (31-2), and (31-3).
  • R 81 is any one of R 31 to R 33 .
  • R 82 represents an alkyl group having 1 to 6 carbon atoms.
  • l represents an integer of 0 to 5.
  • m represents an integer of 0 to 4.
  • n represents an integer of 0 to 4.
  • l is 2 to 5
  • m is 2 to 4
  • n is 2 to 4, a plurality of R 82 may be the same or different.
  • examples of the divalent linking group X 3 include a methylene group, an alkylene group having 2 to 10 carbon atoms, an arylene group, a —CONH—R 35 — group, a —COO—R 36 — group.
  • R 35 and R 36 are a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms].
  • Examples of X ⁇ include halogen anions such as chloride ion, bromide ion and iodide ion, and chloride ion is preferable.
  • the A block can be obtained, for example, by polymerizing a monomer composition containing a vinyl monomer having an acidic group.
  • the vinyl monomer having an acidic group used in the step (A) those described above can be used, and are selected from a vinyl monomer having a carboxy group, a vinyl monomer having a sulfonic acid group, or a vinyl monomer having a phosphate group. At least one of these is preferred. Moreover, in addition to the vinyl monomer which has an acidic group, you may mix
  • the B block is a monomer containing a vinyl monomer that can form the structural unit represented by the general formula (2) and a vinyl monomer that can form the structural unit represented by the general formula (3).
  • a method of polymerizing the composition after polymerizing a monomer composition containing a vinyl monomer capable of forming the structural unit represented by the general formula (2), the polymer is represented by the general formula (2) in the obtained polymer. And a method of quaternizing a tertiary amine structure of a part of the structural unit.
  • vinyl monomer which can form the structural unit represented by the said General formula (2) For example, dimethylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) acrylate, dimethylaminobutyl (meth) Examples include acrylate, diethylaminoethyl (meth) acrylate, diethylaminopropyl (meth) acrylate, diethylaminobutyl (meth) acrylate, and the like.
  • the vinyl monomer that can form the structural unit represented by the general formula (2) may be used alone or in combination of two or more.
  • the vinyl monomer that can form the structural unit represented by the general formula (3) is not particularly limited.
  • the quaternizing agent includes alkyl halides such as methyl chloride, ethyl chloride, methyl bromide, methyl iodide, etc.
  • alkyl halides such as methyl chloride, ethyl chloride, methyl bromide, methyl iodide, etc.
  • An aralkyl halide such as benzyl chloride, benzyl bromide or benzyl iodide; Among these, aralkyl halides such as benzyl chloride, benzyl bromide and benzyl iodide are preferable, and benzyl chloride is more preferable.
  • the amount of the structural unit represented by the general formula (3) can be estimated by measuring the amount of the alkyl group and aralkyl group introduced by quaternization.
  • step (A) a method of first producing an A block and polymerizing a monomer of a B block into the A block; a method of producing a B block first and polymerizing a monomer of the A block into the B block; A method in which the A block and the B block are coupled after the A block and the B block are manufactured separately; the vinyl that can form the structural unit represented by the general formula (2) in the A block by first manufacturing the A block A method of polymerizing a monomer composition containing a monomer and quaternizing a tertiary amine structure of a part of the structural unit represented by the general formula (2) in the obtained polymer; A monomer composition containing a vinyl monomer capable of forming the structural unit represented is polymerized, and a monomer of an A block is polymerized to this polymer, and the structure represented by the general formula (2) in the obtained polymer Part 3 of the unit A method for quaternizing a min structure; A block and a block having a structural unit represented by the general formula
  • the polymerization method is not particularly limited, but living radical polymerization is preferred. That is, the first block copolymer is preferably polymerized using living radical polymerization.
  • living radical polymerization not only the initiation reaction and the growth reaction, but also the termination of the growth end occurs due to the termination reaction and the chain transfer reaction, and the polymer tends to be a mixture of polymers having various molecular weights and heterogeneous compositions.
  • the living radical polymerization method maintains the simplicity and versatility of the conventional radical polymerization method, the termination reaction and chain transfer are unlikely to occur, and the growth end grows without being deactivated. This is preferable in that it is easy to produce a polymer having a uniform composition.
  • a method using a transition metal catalyst ATRP method
  • RAFT method a method using a sulfur-based reversible chain transfer agent
  • TERP method a method to be used since the ATRP method uses an amine-based complex, it may not be used unless the acidic group of the vinyl monomer having an acidic group is protected.
  • the RAFT method when various monomers are used, it is difficult to obtain a low molecular weight distribution, and there may be a problem such as sulfur odor or coloring.
  • the TERP method is preferably used from the viewpoints of diversity of usable monomers, molecular weight control in the polymer region, uniform composition, or coloring.
  • the TERP method is a method of polymerizing a radical polymerizable compound (vinyl monomer) using an organic tellurium compound as a polymerization initiator.
  • a radical polymerizable compound vinyl monomer
  • organic tellurium compound organic tellurium compound
  • Specific polymerization methods of the TERP method include the following (a) to (d).
  • (A) A method in which a vinyl monomer is polymerized using an organic tellurium compound represented by the general formula (4).
  • (B) A method in which a vinyl monomer is polymerized using a mixture of an organic tellurium compound represented by the general formula (4) and an azo polymerization initiator.
  • (C) A method of polymerizing a vinyl monomer using a mixture of an organic tellurium compound represented by the general formula (4) and an organic ditellurium compound represented by the general formula (5).
  • (D) A method of polymerizing a vinyl monomer using a mixture of an organic tellurium compound represented by the general formula (4), an azo polymerization initiator, and an organic ditellurium compound represented by the general formula (5).
  • R 41 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, or an aromatic heterocyclic group.
  • R 42 and R 43 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
  • R 44 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group or a propargyl group.
  • R 41 represents an alkyl group having 1 to 8 carbon atoms, an aryl group or an aromatic heterocyclic group.
  • the group represented by R 41 is an alkyl group having 1 to 8 carbon atoms, an aryl group, or an aromatic heterocyclic group, and is specifically as follows.
  • Examples of the alkyl group having 1 to 8 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, and heptyl.
  • a linear or branched alkyl group such as a octyl group and a cyclic alkyl group such as a cyclohexyl group.
  • a linear or branched alkyl group having 1 to 4 carbon atoms is preferable, and a methyl group or ethyl group is more preferable.
  • the aryl group include a phenyl group and a naphthyl group.
  • the aromatic heterocyclic group include a pyridyl group, a furyl group, and a thienyl group.
  • the groups represented by R 42 and R 43 are each independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and each group is specifically as follows.
  • Examples of the alkyl group having 1 to 8 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, and heptyl.
  • a linear or branched alkyl group such as a octyl group and a cyclic alkyl group such as a cyclohexyl group.
  • a linear or branched alkyl group having 1 to 4 carbon atoms is preferable, and a methyl group or ethyl group is more preferable.
  • the group represented by R 44 is a C 1-8 alkyl group, aryl group, substituted aryl group, aromatic heterocyclic group, alkoxy group, acyl group, amide group, oxycarbonyl group, cyano group, allyl group or A propargyl group, specifically as follows.
  • alkyl group having 1 to 8 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, and heptyl.
  • a linear or branched alkyl group such as an octyl group, a cyclic alkyl group such as a cyclohexyl group, and the like.
  • a linear or branched alkyl group having 1 to 4 carbon atoms is preferable, and a methyl group or ethyl group is more preferable.
  • the aryl group include a phenyl group and a naphthyl group.
  • a phenyl group is preferred.
  • the substituted aryl group include a phenyl group having a substituent and a naphthyl group having a substituent.
  • Examples of the substituent of the aryl group having a substituent include a halogen atom, a hydroxy group, an alkoxy group, an amino group, a nitro group, a cyano group, and a carbonyl-containing group represented by —COR 441 (R 441 is a carbon number) 1-8 alkyl groups, aryl groups, alkoxy groups having 1 to 8 carbon atoms or aryloxy groups), sulfonyl groups, trifluoromethyl groups, and the like. These substituents are preferably substituted by 1 or 2 substituents.
  • Examples of the aromatic heterocyclic group include a pyridyl group, a furyl group, and a thienyl group.
  • the alkoxy group is preferably a group in which an alkyl group having 1 to 8 carbon atoms is bonded to an oxygen atom.
  • a methoxy group, ethoxy group, propoxy group, isopropoxy group, n-butoxy group, sec-butoxy group, tet- A butoxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, and the like can be given.
  • the acyl group include an acetyl group, a propionyl group, and a benzoyl group.
  • Examples of the amide group include —CONR 4421 R 4422 (R 4421 and R 4422 are each independently a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or an aryl group).
  • R 4421 and R 4422 are each independently a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or an aryl group.
  • a group represented by —COOR 443 R 443 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group
  • examples thereof include a carboxyl group, a methoxycarbonyl group, an ethoxycarbonyl group, and a propoxycarbonyl group.
  • oxycarbonyl groups include methoxycarbonyl group and ethoxycarbonyl group.
  • R 4441 and R 4442 are each independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms
  • R 4443 , R 4444 and R 4445 are Each independently represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group, and each substituent may be linked by a cyclic structure.
  • R 4451 and R 4452 are a hydrogen atom or an alkyl group having 1 to 8 carbon atoms
  • R 4453 is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms
  • Aryl group or silyl group are a hydrogen atom or an alkyl group having 1 to 8 carbon atoms
  • organic tellurium compound represented by the general formula (4) examples include (methylterranylmethyl) benzene, (methylterranylmethyl) naphthalene, ethyl-2-methyl-2-methylterranyl-propionate, ethyl-2- Methyl-2-n-butylterranyl-propionate, (2-trimethylsiloxyethyl) -2-methyl-2-methylterranyl-propionate, (2-hydroxyethyl) -2-methyl-2-methylterranyl-propionate or (3-trimethylsilylpropargyl ) -2-methyl-2-methylterranyl-propinate, etc.
  • Organics described in WO 2004/14848, WO 2004/14962, WO 2004/072126, and WO 2004/096870 Illustrate all tellurium compounds Rukoto can.
  • organic ditellurium compound represented by the general formula (5) examples include dimethyl ditelluride, diethyl ditelluride, di-n-propyl ditelluride, diisopropyl ditelluride, dicyclopropyl ditelluride, Di-n-butylditelluride, di-s-butylditelluride, di-t-butylditelluride, dicyclobutylditelluride, diphenylditelluride, bis- (p-methoxyphenyl) ditelluride, bis- (p-aminophenyl) ditelluride, Examples thereof include bis- (p-nitrophenyl) ditelluride, bis- (p-cyanophenyl) ditelluride, bis- (p-sulfonylphenyl) ditelluride, dinaphthyl ditelluride or dipyridyl ditelluride.
  • the azo polymerization initiator can be used without particular limitation as long as it is an azo polymerization initiator used in normal radical polymerization.
  • 2,2′-azobis isobutyronitrile) (AIBN), 2,2′-azobis (2-methylbutyronitrile) (AMBN), 2,2′-azobis (2,4-dimethylvaleronitrile) (ADVN), 1,1′-azobis (1-cyclohexanecarbonitrile) (ACHN), dimethyl-2,2′-azobisisobutyrate (MAIB), 4,4′-azobis (4-cyanovaleric acid) (ACVA), 1,1′-azobis (1-acetoxy-1-phenylethane), 2,2′-azobis (2-methylbutyramide), 2,2′-azobis (4-methoxy-2,4- Dimethylvaleronitrile) (V-70), 2,2′-azobis (2-methylamidinopropane) dihydrochloride, 2,2′-azobis [2- (2-imida
  • the polymerization step is a container substituted with an inert gas.
  • an inert gas For the purpose of promoting reaction, controlling molecular weight and molecular weight distribution, etc., depending on the type of vinyl monomer, the vinyl monomer and the organic tellurium compound of the general formula (4).
  • An azo polymerization initiator and / or an organic ditellurium compound of the general formula (5) is mixed.
  • the inert gas include nitrogen, argon, helium and the like. Argon and nitrogen are preferable.
  • the amount of vinyl monomer used may be appropriately adjusted depending on the physical properties of the target copolymer.
  • the vinyl monomer is preferably 5 to 10,000 mol per mol of the organic tellurium compound.
  • the amount of the azo polymerization initiator used is usually an organic compound of the general formula (4).
  • the azo polymerization initiator is preferably 0.01 mol to 10 mol with respect to 1 mol of the tellurium compound.
  • the organic ditellurium compound of the general formula (5) is preferably 0.01 mol to 100 mol per 1 mol of the organic tellurium compound of the general formula (4).
  • the organic tellurium compound of the general formula (4) when the organic tellurium compound of the general formula (4), the organic ditellurium compound of the general formula (5) and the azo polymerization initiator are used in combination, Usually, the azo polymerization initiator is preferably used in an amount of 0.01 mol to 100 mol with respect to 1 mol in total of the organic tellurium compound of the general formula (4) and the organic ditellurium compound of the general formula (5).
  • the polymerization reaction can be carried out without a solvent, but it may be carried out using an aprotic solvent or a protic solvent generally used in radical polymerization and stirring the mixture.
  • aprotic solvents that can be used include benzene, toluene, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), acetone, 2-butanone (methyl ethyl ketone), dioxane, propylene glycol monomethyl ether acetate, chloroform
  • Examples include carbon chloride, tetrahydrofuran (THF), ethyl acetate, propylene glycol monomethyl ether acetate or trifluoromethylbenzene.
  • protic solvent examples include water, methanol, ethanol, isopropanol, n-butanol, ethyl cellosolve, butyl cellosolve, 1-methoxy-2-propanol, hexafluoroisopropanol, and diacetone alcohol.
  • the amount of the solvent used may be adjusted as appropriate. For example, it is preferably 0.01 ml or more, more preferably 0.05 ml or more, still more preferably 0.1 ml or more, and 50 ml or less with respect to 1 g of vinyl monomer. More preferably, it is 10 ml or less, More preferably, it is 1 ml or less.
  • the reaction temperature and reaction time may be appropriately adjusted depending on the molecular weight or molecular weight distribution of the copolymer to be obtained, but are usually stirred at 0 to 150 ° C. for 1 minute to 100 hours.
  • the TERP method can obtain a high yield and a precise molecular weight distribution even at a low polymerization temperature and a short polymerization time.
  • the pressure is usually normal pressure, but it may be increased or decreased.
  • the intended copolymer can be separated from the obtained reaction mixture by removing the solvent used, residual vinyl monomer and the like by a normal separation and purification means.
  • the growth terminal of the copolymer obtained by the polymerization reaction is in the form of -TeR 41 (wherein R 41 is the same as described above), and it is deactivated by the operation in the air after the completion of the polymerization reaction.
  • Tellurium atoms may remain. Since the copolymer in which the tellurium atom remains at the terminal is colored or inferior in thermal stability, it is preferable to remove the tellurium atom.
  • a radical reduction method using tributylstannane or a thiol compound As a method for removing tellurium atoms, a radical reduction method using tributylstannane or a thiol compound; a method of adsorbing with activated carbon, silica gel, activated alumina, activated clay, molecular sieves, polymer adsorbent, etc .; Method of adsorbing metal: Add peroxide such as hydrogen peroxide or benzoyl peroxide, or blow air or oxygen into the system to oxidatively decompose tellurium atoms at the end of the copolymer.
  • peroxide such as hydrogen peroxide or benzoyl peroxide
  • Liquid-liquid extraction method or solid-liquid extraction method that removes residual tellurium compounds by combining solvents; purification method in solution state such as ultrafiltration that extracts and removes only those having a specific molecular weight or less can be used. These methods can also be used in combination.
  • a method of quaternizing a tertiary amine structure of a part of the structural unit represented by the general formula (2) in the polymer a method of bringing the polymer into contact with a quaternizing agent can be mentioned. Specifically, after polymerizing a monomer composition containing a vinyl monomer that can form the structural unit represented by the general formula (2), a quaternizing agent is added to the reaction solution, followed by stirring. It is done.
  • the temperature of the reaction solution to which the quaternizing agent is added is preferably 55 ° C. to 65 ° C., and the stirring time is preferably 5 hours to 20 hours.
  • the solvent to be added for dilution include a solvent that can be used for the polymerization reaction, a protic solvent is preferable, and methanol is more preferable.
  • the molecular weight of the block copolymer precursor is measured by the GPC method.
  • the weight average molecular weight (Mw) of the block copolymer precursor is preferably 5000 or more, more preferably 6000 or more, further preferably 7000 or more, preferably 15000 or less, more preferably 12000 or less, and still more preferably 10,000. It is as follows.
  • the molecular weight distribution (PDI) of the block copolymer precursor is preferably 2.0 or less, and more preferably 1.6 or less.
  • the content of A block in the block copolymer precursor is preferably 35% by mass or more, more preferably 40% by mass or more, and still more preferably 45% by mass or more in 100% by mass of the entire block copolymer. Yes, 85 mass% or less is preferable, More preferably, it is 80 mass% or less, More preferably, it is 75 mass% or less.
  • the content of B block in the block copolymer precursor is preferably 15% by mass or more, more preferably 20% by mass or more, and further preferably 25% by mass or more, in 100% by mass of the entire block copolymer. Yes, 65 mass% or less is preferable, More preferably, it is 60 mass% or less, More preferably, it is 55 mass% or less.
  • the amine value of the block copolymer precursor is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, and still more preferably 30 mgKOH / g or more, from the viewpoints of adsorptivity to pigment and pigment dispersibility. 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, and still more preferably 100 mgKOH / g or less.
  • the amine value of the block copolymer precursor is derived from the structural unit represented by the general formula (2).
  • the acid value of the precursor of the block copolymer is preferably 5 mgKOH / g or more, more preferably 10 mgKOH / g or more, still more preferably 15 mgKOH / g or more, preferably 50 mgKOH / g or less, more preferably 40 mgKOH / g. g or less, more preferably 35 mgKOH / g or less.
  • Step (B) In the step (B), after completion of the step (A), the precursor of the obtained block copolymer is selected from the group consisting of aromatic dicarboxylic imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid. At least one alkali metal salt is allowed to act to obtain a block copolymer.
  • the halogen anion of the structural unit represented by the general formula (3) is exchanged for an aromatic dicarboxylic acid imide anion, an aromatic sulfonic acid anion, an aromatic phosphonium ion, or an aromatic carboxylate anion (anion). Exchange).
  • alkali metal in at least one alkali metal salt selected from the group consisting of aromatic dicarboxylic imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid include lithium, sodium, potassium, rubidium, cesium, There is francium, and among these, lithium, sodium, and potassium are preferable because of economical advantages.
  • alkali metal salt of aromatic dicarboxylic acid imide examples include those represented by the general formula (6).
  • ring A represents an aromatic ring which may have a substituent group
  • M 1 is an alkali metal
  • the aromatic ring constituting the ring A is a ring structure having aromaticity.
  • the aromatic ring includes both single rings and condensed rings.
  • a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable.
  • the condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring.
  • Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
  • Examples of the alkali metal represented by M 1 include lithium, sodium, potassium, rubidium, cesium, and francium.
  • alkali metal salt of the aromatic dicarboxylic acid imide examples include those represented by general formulas (6-1) to (6-7).
  • M 1 represents an alkali metal.
  • alkali metal salt of aromatic sulfonic acid examples include those represented by the general formula (7).
  • Ar represents an aromatic ring which may have a substituent
  • M 2 represents an alkali metal
  • the aromatic ring constituting Ar is a ring structure having aromaticity.
  • the aromatic ring includes both single rings and condensed rings.
  • As the monocycle a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable.
  • the condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring.
  • Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
  • Examples of the alkali metal represented by M 2 include lithium, sodium, potassium, rubidium, cesium, and francium.
  • alkali metal salt of aromatic sulfonic acid examples include those represented by general formulas (7-1) to (7-9).
  • M 2 represents an alkali metal.
  • alkali metal salt of aromatic phosphonic acid examples include those represented by the general formula (8).
  • Ar represents an aromatic ring which may have a substituent
  • M 3 represents an alkali metal.
  • the aromatic ring constituting Ar is a ring structure having aromaticity.
  • the aromatic ring includes both single rings and condensed rings.
  • a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable.
  • the condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring.
  • Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
  • Examples of the alkali metal represented by M 3 include lithium, sodium, potassium, rubidium, cesium, and francium.
  • alkali metal salt of aromatic phosphonic acid examples include those represented by general formulas (8-1) to (8-7).
  • M 3 represents an alkali metal.
  • alkali metal salt of aromatic carboxylic acid examples include those represented by the general formula (9).
  • Ar represents an aromatic ring which may have a substituent
  • M 4 represents an alkali metal
  • the aromatic ring constituting Ar is a ring structure having aromaticity.
  • the aromatic ring includes both single rings and condensed rings.
  • a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable.
  • the condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring.
  • Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
  • Examples of the alkali metal represented by M 4 include lithium, sodium, potassium, rubidium, cesium, and francium.
  • alkali metal salt of aromatic carboxylic acid examples include those represented by general formulas (9-1) to (9-9).
  • step (B) as a method of allowing the alkali metal salt to act on the block copolymer precursor, a method in which the alkali metal salt is added to a solution in which the block copolymer precursor is dissolved and stirred. Is mentioned.
  • the alkali metal salt may be added to the reaction solution after the polymerization in the step (A).
  • the precursor of the block copolymer is isolated from the polymerization solution after completion of the step (A), and the alkali metal salt is added to a solution obtained by dissolving the precursor in a new solvent. It is preferable.
  • an aprotic solvent or a protic solvent can be used as a solvent capable of dissolving the block copolymer precursor.
  • aprotic solvents that can be used include benzene, toluene, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), acetone, 2-butanone (methyl ethyl ketone), dioxane, propylene glycol monomethyl ether acetate, chloroform
  • Examples include carbon chloride, tetrahydrofuran (THF), ethyl acetate, propylene glycol monomethyl ether acetate or trifluoromethylbenzene.
  • protic solvent examples include water, methanol, ethanol, isopropanol, n-butanol, ethyl cellosolve, butyl cellosolve, 1-methoxy-2-propanol, hexafluoroisopropanol, and diacetone alcohol.
  • the amount of the solvent used for dissolving the block copolymer precursor may be appropriately adjusted.
  • it is usually 2 ml to 10 ml with respect to 1 g of the block copolymer precursor.
  • the range is preferably 2 ml to 5 ml.
  • the amount of the at least one alkali metal salt selected from the group consisting of aromatic dicarboxylic imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid in step (B) is a quaternary ammonium group. Is preferably 0.5 equivalents or more, more preferably 0.9 equivalents or more, preferably 1.1 equivalents or less, and more preferably 1.0 equivalents or less.
  • the solution temperature at the time of contacting the block copolymer precursor with the alkali metal salt is usually 55 ° C. to 70 ° C., preferably 55 ° C. to 65 ° C., and the stirring time is usually 18 hours to 24 hours, preferably 20 hours to 22 hours.
  • the first composition containing the block copolymer is obtained by removing the solvent from the reaction solution.
  • the obtained first composition is an impurity such as a precipitated salt (a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as aromatic dicarboxylic imide). Is preferably removed by filtration.
  • the method for producing the block copolymer preferably includes a step (C) of washing the block copolymer obtained in the step (B) with water.
  • a known washing method can be used, but liquid separation washing is preferable. Separation washing may be performed on the solution after completion of the step (B), or the first composition obtained by isolating the first composition of the block copolymer from the solution after completion of the step (B). You may perform with respect to the solution which melt
  • the liquid separation cleaning As a specific example of the liquid separation cleaning, a solvent in which a block copolymer is dissolved and water are mixed, and then the separated aqueous layer is extracted.
  • the content of the salt contained in the first composition a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as an aromatic dicarboxylic acid imide
  • the second composition of the target block copolymer can be obtained by removing the solvent of the phase in which the block copolymer is dissolved under reduced pressure.
  • the solvent for the above-described liquid separation operation may be any solvent that can dissolve the block copolymer and can be phase-separated from water. Examples thereof include ethyl acetate, butyl acetate, isopropyl acetate, and methyl isobutyl ketone. These may be used in combination. Moreover, the water used for washing may contain alcohol or the like.
  • the amount of water used is preferably 0.1 to 10 times, more preferably 0.5 times the volume of the solvent phase in which the block copolymer is dissolved. ⁇ 5 times the amount.
  • the liquid temperature at the time of liquid separation washing is preferably 10 ° C. to 60 ° C., more preferably 30 ° C. to 50 ° C., and particularly preferably 35 ° C. to 45 ° C.
  • the dispersant of the present invention contains the block copolymer, the first composition or the second composition as a main component.
  • the said dispersing agent consists only of the block copolymer of this invention, a 1st composition, or a 2nd composition.
  • the pigment dispersion composition of the present invention contains the dispersant, a pigment, and a dispersion medium. In this case, the type and particle size of the pigment used are different depending on the application and are not particularly limited.
  • the pigment dispersion composition can be used for a color filter.
  • the tertiary amino group and quaternary ammonium base in the structure (B block) are strongly bonded to the acidic group of the pigment treated with the acidic pigment or the acidic group-containing dye derivative.
  • the B block adsorbs to the pigment, or the aromatic part of the aromatic dicarboxylic acid imide anion which is a counter ion of the quaternary ammonium base adsorbs to the pigment skeleton part of the pigment, thereby improving the pigment dispersibility. It is thought to exert its effect. That is, since the dispersant of the present invention is a component that favorably disperses the pigment by this action, the type of pigment to be dispersed is not particularly limited.
  • the content of the dispersant is preferably 5 parts by mass to 200 parts by mass, more preferably 10 parts by mass to 100 parts by mass with respect to 100 parts by mass of the pigment. More preferably, it is ⁇ 50 parts by mass.
  • the pigment may be either an organic pigment or an inorganic pigment, but an organic pigment containing an organic compound as a main component is particularly preferable.
  • examples of the pigment include pigments of various colors such as a red pigment, a yellow pigment, an orange pigment, a blue pigment, a green pigment, and a purple pigment.
  • the structure of the pigment is azo pigments such as monoazo pigments, diazo pigments, condensed diazo pigments, diketopyrrolopyrrole pigments, phthalocyanine pigments, isoindolinone pigments, isoindoline pigments, quinacridone pigments, indigo Examples thereof include polycyclic pigments such as pigments, thioindigo pigments, quinophthalone pigments, dioxazine pigments, anthraquinone pigments, perylene pigments, and perinone pigments. Only one type of pigment may be contained in the pigment dispersion composition, or a plurality of types may be used.
  • pigments include C.I. I. Pigment® Red 7, 9, 14, 41, 48: 1, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 122, 123, 146, 149, 168, 177, Red pigments such as 178, 179, 187, 200, 202, 208, 210, 215, 224, 254, 255, 264; I.
  • Orange pigments such as Pigment Orange 36, 38, 43;
  • the upper limit of the pigment content in the pigment dispersion composition is usually 80% by mass, preferably 70% by mass, and more preferably 60% by mass in the total solid content of the pigment dispersion composition.
  • the lower limit of the pigment content in the pigment dispersion composition is usually 10% by mass, preferably 20% by mass, and preferably 30% by mass in the total solid content of the pigment dispersion composition. More preferred.
  • a conventionally known organic solvent can be used as the dispersion medium.
  • Glycol monoalkyl ethers such as ter, 3-methyl-3-methoxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, tripropylene glycol
  • Monohydric or polyhydric alcohols Monohydric or polyhydric alcohols; aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-hexane, hexene, isoprene, dipentene, dodecane; cyclohexane, methylcyclohexane, methylcyclohexene, bicyclohexyl, etc.
  • Alicyclic hydrocarbons such as benzene, toluene, xylene, cumene; amyl formate, ethyl formate, ethyl acetate, butyl acetate Propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl caprylate, butyl stearate, ethyl benzoate, 3-ethoxypropion Chain or cyclic esters such as methyl acid, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, ⁇ -butyrolactone; Alkoxycarboxylic acids such as 3-
  • the organic solvent is preferably glycol alkyl ether acetates, monovalent or polyhydric alcohols from the viewpoints of dispersibility of pigments, solubility of the dispersant, applicability of the pigment dispersion composition, and the like.
  • the solvent contained in the pigment dispersion composition may be only one type or a plurality of types.
  • the content of the dispersion medium in the pigment dispersion composition is not particularly limited and can be appropriately adjusted.
  • the upper limit of the content of the dispersion medium in the pigment dispersion composition is usually 99% by mass.
  • the lower limit of the content of the dispersion medium in the pigment dispersion composition is usually 70% by mass and preferably 80% by mass in consideration of the viscosity suitable for application of the pigment dispersion composition.
  • the dispersion medium can be used as a solvent for dissolving and removing precipitates formed from the pigment dispersion composition.
  • an acidic group further having an acidic group is used in order to adsorb and adsorb the tertiary amino group and quaternary ammonium base in the block copolymer characterizing the present invention used as a dispersant. It is preferable to contain a pigment derivative of This dye derivative has an acidic functional group introduced into the dye skeleton.
  • the dye skeleton the same or similar skeleton as the pigment constituting the pigment dispersion composition and the same or similar skeleton as the raw material of the pigment are preferable.
  • the dye skeleton include azo dye skeleton, phthalocyanine dye skeleton, anthraquinone dye skeleton, triazine dye skeleton, acridine dye skeleton, and perylene dye skeleton.
  • the acidic group introduced into the dye skeleton is preferably a carboxyl group, a phosphoric acid group, or a sulfonic acid group.
  • a sulfonic acid group is preferable from the viewpoint of synthesis and the strength of acidity.
  • the acidic group may be directly bonded to the dye skeleton, but may be bonded to the dye skeleton via a hydrocarbon group such as an alkyl group or an aryl group; an ester, ether, sulfonamide, or urethane bond.
  • a hydrocarbon group such as an alkyl group or an aryl group
  • an ester, ether, sulfonamide, or urethane bond may be directly bonded to the dye skeleton, but may be bonded to the dye skeleton via a hydrocarbon group such as an alkyl group or an aryl group; an ester, ether, sulfonamide, or urethane bond.
  • the pigment dispersion composition of the present invention may contain a binder resin.
  • the binder resin may be a polymer, for example.
  • specific examples of monomers constituting the polymer include, for example, carboxyl groups such as (meth) acrylic acid, maleic acid, fumaric acid, itaconic acid, citraconic acid, crotonic acid, and maleic anhydride Containing unsaturated monomer: methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, octyl (meth) acrylate, lauryl (meth) acrylate, (meth) (Meth) acrylic such as 2-hydroxyethyl acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, methyl cyclohexyl (meth) acrylate, isobornyl (meth) (Meth)
  • Acid ester styrene, ⁇ -methylstyrene, 4-methylstyrene ( -Methylstyrene), 2-methylstyrene (o-methylstyrene), 3-methylstyrene (m-methylstyrene), 4-methoxystyrene (p-methoxystyrene), p-tert-butylstyrene, pn-butyl And aromatic unsaturated monomers (styrene monomers) such as styrene and p-tert-butoxystyrene.
  • styrene monomers such as styrene and p-tert-butoxystyrene.
  • the binder resin is preferably a copolymer of a carboxyl group-containing unsaturated monomer and a (meth) acrylic acid ester.
  • a copolymer of (meth) acrylic acid and butyl (meth) acrylate a copolymer of (meth) acrylic acid and benzyl (meth) acrylate
  • a copolymer of acrylic acid, butyl (meth) acrylate, and benzyl (meth) acrylate a copolymer of acrylic acid, butyl (meth) acrylate, and benzyl (meth) acrylate.
  • the binder resin is particularly preferably a copolymer of (meth) acrylic acid and benzyl (meth) acrylate.
  • the content of (meth) acrylic acid is usually 5% by mass to 90% by mass in all monomer components, and 10% by mass to It is preferably 70% by mass, and more preferably 20% by mass to 70% by mass.
  • Mw is preferably from 3,000 to 100,000, more preferably from 5,000 to 50,000, and even more preferably from 5,000 to 20,000. When the Mw of the binder resin is 3,000 or more, the heat resistance, film strength, etc. of the coating film formed from the pigment dispersion composition are good, and when the Mw is 100,000 or less, the aqueous alkaline solution of this coating film Developability due to is further improved.
  • the acid value of the binder resin is preferably 20 mgKOH / g to 170 mgKOH / g, and more preferably 50 mgKOH / g to 150 mgKOH / g. 90 mg KOH / g to 150 mg KOH / g is more preferable.
  • the acid value of the binder resin is 20 mgKOH or more / g, the alkali developability when the pigment dispersion composition is used as a coating film is further improved, and when it is 170 mgKOH / g or less, the heat resistance is improved.
  • the binder resin contained in the pigment dispersion composition may be only one type or a plurality of types.
  • the content of the binder resin is preferably 5 parts by mass to 200 parts by mass, more preferably 10 parts by mass to 100 parts by mass with respect to 100 parts by mass of the pigment. More preferred is from 50 parts by weight to 50 parts by weight.
  • the pigment dispersion composition is obtained by mixing a pigment, a dispersant, a dispersion medium, a dye derivative, a binder resin, and the like using a mixing and dispersing machine such as a paint shaker, a bead mill, a ball mill, a dissolver, or a kneader.
  • the pigment dispersion composition is preferably filtered after mixing.
  • the pigment dispersion composition may contain other additives as necessary.
  • other additives include a photopolymerizable monomer, a photopolymerization initiator, a pH adjuster, an antioxidant, an ultraviolet absorber, a light stabilizer, an antiseptic, and an antifungal agent.
  • the photopolymerizable monomer is preferably a compound having at least two ethylenically unsaturated double bonds that are compatible with the binder resin. As such a compound, when the pigment dispersion composition is used as a colorant for a color filter, it has alkali solubility and has one or more acidic groups and two or more ethylenically unsaturated bonds in one molecule.
  • a compound is preferable, and a compound having one or more acidic groups and three or more ethylenically unsaturated bonds in one molecule is more preferable.
  • the compound having at least two ethylenically unsaturated double bonds include polyfunctional (meth) acrylates such as bifunctional (meth) acrylate and trifunctional or higher functional (meth) acrylate. Among these, trifunctional or higher functional (meth) acrylates are preferable.
  • an acidic group-containing polyfunctional (meth) acrylate is more preferable, and a trifunctional or higher acidic group-containing polyfunctionality is preferred.
  • the acidic group is not particularly limited as long as it can be alkali-developed.
  • the acidic group is preferably a carboxy group from the viewpoint of further improving the alkali developability and the handleability of the resin composition.
  • a coating film of the pigment dispersion composition can be formed on the substrate by applying the pigment dispersion composition onto the substrate by a spin coating method, a roll coating method, a slit coating method or the like. After applying the pigment dispersion composition on the substrate, drying (desolvation treatment) or the like may be performed as necessary.
  • the heat resistance of the block copolymer that characterizes the present invention used for the dispersant is excellent. It can be expected to suppress a decrease in contrast ratio and a change in hue.
  • the measurement conditions were a column temperature of 40 ° C., a sample concentration of 100 mg / mL, a sample injection amount of 10 ⁇ L, and a flow rate of 0.6 mL / min.
  • a calibration curve was prepared using polystyrene (manufactured by Tosoh Corporation, TSK Standard) as a standard substance, and a weight average molecular weight (Mw) and a number average molecular weight (Mn) were measured. Molecular weight distribution (PDI) was calculated from these measured values.
  • the amine value is expressed by the mass of potassium hydroxide (KOH) equivalent to the basic component per gram of the solid content.
  • KOH potassium hydroxide
  • the measurement sample was dissolved in tetrahydrofuran, and the obtained solution was neutralized with 0.1 mol / L hydrochloric acid / 2-propanol solution using a potentiometric titrator (trade name: 915 KF Ti-touch, manufactured by Metrohm). .
  • the amine value (B) was calculated by the following formula using the inflection point of the titration pH curve as the titration end point.
  • the acid value represents the mass of potassium hydroxide required to neutralize acidic components per gram of solid content.
  • the measurement sample was dissolved in tetrahydrofuron, and the resulting solution was subjected to neutralization titration with a 0.5 mol / L potassium hydroxide / ethanol solution.
  • the acid value (A) was calculated by the following formula.
  • A 56.11 ⁇ Vs ⁇ 0.5 ⁇ f / w
  • Vs Amount of 0.5 mol / L potassium hydroxide / ethanol solution required for titration (mL)
  • f Potency of 0.5 mol / L potassium hydroxide / ethanol solution
  • the measurement was performed using a thermogravimetric / differential thermal simultaneous measurement apparatus (TG-DTA) (TG-DTA6300, manufactured by SII Nanotechnology).
  • TG-DTA thermogravimetric / differential thermal simultaneous measurement apparatus
  • the measurement sample was dried under reduced pressure at 130 ° C. for 2 hours before measurement.
  • the measurement conditions were a sample mass of about 10 mg, an air inflow rate of 200 ml / min, a heating rate of 10 ° C./min, and a measurement temperature range of 40 ° C. to 600 ° C.
  • the temperature at which the sample mass decreased by 10% was read from the obtained TG curve, and this was taken as the heating weight decrease temperature.
  • Sample preparation was performed as follows. About 10 mg of the second composition substance was put into a combustion furnace (trade name: AQF-2100H, manufactured by Mitsubishi Chemical Analytech). The heater of the combustion furnace was 900 ° C. (inside), the gas flow rate was 200 mL / min of argon, 400 mL / min of oxygen, 100 mL / min of argon for humidification, and the residence time of the combustion furnace was 15 minutes. The exhaust gas was captured by a collector (trade name: AU-250, manufactured by Mitsubishi Chemical Analytech). The sample solution was prepared by using ultrapure water as the absorbing solution and diluting 35 mL of the obtained water absorbing solution to 50 mL using ultrapure water.
  • the content of the halogen anion was measured using ion chromatography (trade name: DIONEX ICS-1600, manufactured by Thermo Scientific).
  • the column used was Ion Pac AS-14A (manufactured by DIONEX), and the eluent used was an eluent for anion analysis (trade name: AS12A, manufactured by DIONEX).
  • the measurement conditions were a sample injection volume of 25 ⁇ L and a flow rate of 1.5 mL / min.
  • a calibration curve (calibration curve) was prepared using a standard solution having a chlorine anion concentration of 1 ppm and 2 ppm as a standard substance, and the chlorine anion concentration was calculated.
  • Precursor No. of the obtained block copolymer 1 had an Mw of 7618, a PDI of 1.30, an acid value of 32 mgKOH / g, an amine value of 64 mgKOH / g, and a heating weight loss temperature of 254 ° C.
  • Block copolymer precursor Nos. 2 to 12 Block copolymer precursor no.
  • the block copolymer precursor No. 1 was prepared in the same manner as in the preparation method of No. 1. 2 to 12 were produced.
  • Tables 1 and 2 show the raw material monomers, organic tellurium compounds, organic ditellurium compounds, azo polymerization initiators, solvents, quaternizing agents, reaction conditions, and polymerization rates used.
  • Tables 3 and 4 show the composition of precursors of each block copolymer, Mw, PDI, acid value, amine value, and heating weight reduction temperature.
  • Block copolymer second composition No. 51 The block copolymer precursor No. obtained above. 1 PMA 110g and MP 110g were added to 87.5g and dissolved. Anion exchange was performed by adding 11.2 g of PIK to the obtained solution and reacting at 60 ° C. for 20 hours. The obtained reaction solution was cooled, ethyl acetate and water were added, and the mixture was stirred at 40 ° C. for 1 hour. Liquid separation was performed to obtain an organic layer. The obtained organic layer was concentrated under reduced pressure and dried to obtain a second composition No. 2 of the block copolymer. 51 was obtained. The second composition No. of the obtained block copolymer.
  • Mw of the block copolymer contained was 7852, and PDI was 1.21.
  • the acid value of the second composition was 32 mg KOH / g, the amine value was 89 mg KOH / g, the heating weight reduction temperature was 291 ° C., and the chlorine anion content was 3501 ppm (solid content conversion).
  • a blended composition was prepared by preparing 3 parts by mass, 3 parts by mass of MP, and 81 parts by mass of PMA, and stirring for 2 hours with a planetary ball mill (0.3 mm zirconia beads). The viscosity of the obtained pigment dispersion composition was 4.0 mPa ⁇ s.
  • a blended composition was prepared by preparing 3 parts by mass, 3 parts by mass of MP, and 81 parts by mass of PMA, and stirring for 2 hours with a planetary ball mill (0.3 mm zirconia beads). The viscosity of the obtained pigment dispersion composition was 3.0 mPa ⁇ s.
  • the present invention includes the following embodiments.
  • (Embodiment 1) It has an A block containing a structural unit derived from a vinyl monomer having an acidic group, and a B block containing a structural unit represented by the following general formula (1) and a structural unit represented by the following general formula (2).
  • R ⁇ 11> , R ⁇ 12 > and R ⁇ 13 > show the chain or cyclic hydrocarbon group which may have a substituent each independently. Two or more of R 11 , R 12 and R 13 may be bonded to each other to form a cyclic structure.
  • X 1 represents a divalent linking group.
  • R 14 represents a hydrogen atom or a methyl group.
  • Y ⁇ represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion, and an aromatic carboxylate anion.
  • R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure.
  • X 2 represents a divalent linking group.
  • R 23 represents a hydrogen atom or a methyl group.
  • Embodiment 2 The block copolymer according to embodiment 1, which is an AB type block copolymer.
  • Embodiment 7 The 1st composition of Embodiment 6 whose molecular weight distribution (PDI) of the said block copolymer is 2.0 or less.
  • Embodiment 9 A dispersant comprising the block copolymer according to any one of Embodiments 1 to 6, the first composition according to Embodiment 7, or the second composition according to Embodiment 8.
  • a pigment dispersion composition comprising the dispersant according to embodiment 9, a pigment, and a dispersion medium.
  • the precursor of the block copolymer obtained in the step (A) is at least one alkali selected from the group consisting of aromatic dicarboxylic imides, aromatic sulfonic acids, aromatic phosphonic acids and aromatic carboxylic acids.
  • R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure.
  • X 2 represents a divalent linking group.
  • R 23 represents a hydrogen atom or a methyl group.
  • R 31 , R 32 and R 33 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. Two or more of R 31 , R 32 and R 33 may be bonded to each other to form a cyclic structure.
  • X 3 represents a divalent linking group.
  • R 34 represents a hydrogen atom or a methyl group.
  • X ⁇ represents a halogen anion.
  • Embodiment 14 The manufacturing method of the block copolymer of Embodiment 12 or 13 provided with the process (C) which wash
  • the block copolymer of the present invention alkali development is facilitated because the A block has an acidic group.
  • the counter ion of the quaternary ammonium cation of the B block is an aromatic dicarboxylic acid imide anion, an aromatic sulfonic acid anion, an aromatic phosphonic acid anion or an aromatic carboxylic acid anion, the heat resistance is excellent. Therefore, the block copolymer of this invention can be used conveniently for the pigment dispersion composition for color filters used for manufacture of the color filter which employ

Abstract

[Problem] To provide a block copolymer which can be used as a dispersing agent, and has superior resistance to heat. [Solution] This block copolymer is characterized by having block A including a structural unit derived from a vinyl monomer having an acidic group, and block B including a structural unit represented by general formula (1) and a structural unit represented by general formula (2). [In formulae (1) and (2), R11, R12, R13, R21, and R22 each independently represent an optionally substituted linear or cyclic hydrocarbon group. Two or more of R11, R12, and R13 may be bonded together to form a cyclic structure. R21 and R22 may be bonded together to form a cyclic structure. X1 and X2 represent a divalent linking group. R14 and R23 represent a hydrogen atom or a methyl group. Y- represents at least one selected from the group consisting of aromatic dicarboxylic acid imide anions, aromatic sulfonic acid anions, aromatic phosphonic acid anions, and aromatic carboxylic acid anions.]

Description

ブロック共重合体、分散剤および顔料分散組成物Block copolymer, dispersant and pigment dispersion composition
 本発明は、ブロック共重合体、分散剤および顔料分散組成物に関する。 The present invention relates to a block copolymer, a dispersant, and a pigment dispersion composition.
 従来、液晶ディスプレー等に用いられるカラーフィルタの製造において、基板への色材の付与方法としては、顔料分散法、染色法、電着法、印刷法等が知られている。これらの中でも、分光特性、耐久性、パターン形状および精度の観点から、顔料分散法が広く使用されている。顔料分散法では、例えば、顔料、分散剤、分散媒体(溶媒)を混合した顔料分散組成物からなる塗布膜を基板上に形成し、所望のパターン形状のフォトマスクを介して露光し、アルカリ現像が行われる。 Conventionally, in the production of a color filter used for a liquid crystal display or the like, a pigment dispersion method, a dyeing method, an electrodeposition method, a printing method, and the like are known as methods for applying a coloring material to a substrate. Among these, the pigment dispersion method is widely used from the viewpoint of spectral characteristics, durability, pattern shape, and accuracy. In the pigment dispersion method, for example, a coating film made of a pigment dispersion composition in which a pigment, a dispersant, and a dispersion medium (solvent) are mixed is formed on a substrate, exposed through a photomask having a desired pattern shape, and alkali developed. Is done.
 また、液晶ディスプレーの製造では、色材のパターン形状を形成後、その上に液晶を駆動させるための透明電極が蒸着またはスパッタリングにより形成され、さらにその上に液晶を一定方向に配向させるための配向膜が形成されている。これらの透明電極および配向膜の性能を十分に得るために、これらの形成は一般に200℃以上の高温で行われる。しかし、前記顔料分散組成物に樹脂型分散剤を多く用いると、高熱を伴う工程の前後でカラーフィルタのコントラスト比の低下、色相の変化等の耐熱性が問題となる。 In the production of a liquid crystal display, after forming a color material pattern shape, a transparent electrode for driving the liquid crystal is formed thereon by vapor deposition or sputtering, and further an orientation for aligning the liquid crystal in a certain direction. A film is formed. In order to obtain sufficient performance of these transparent electrodes and alignment films, their formation is generally performed at a high temperature of 200 ° C. or higher. However, when a large amount of resin-type dispersant is used in the pigment dispersion composition, heat resistance such as a decrease in contrast ratio of the color filter and a change in hue becomes a problem before and after the process involving high heat.
 そこで、耐熱性を向上させた樹脂型分散剤が提案されている。例えば、特許文献1では、耐熱性の優れたカラーフィルタを得るために、側鎖に4級アンモニウム塩基を有するAブロックと、4級アンモニウム塩基を有さないBブロックとからなる、A-Bブロック共重合体を、カラーフィルタ用顔料分散剤として用いることが開示されている(特許文献1(請求項1、段落0049~0058)参照)。 Therefore, resin-type dispersants with improved heat resistance have been proposed. For example, in Patent Document 1, in order to obtain a color filter having excellent heat resistance, an AB block comprising an A block having a quaternary ammonium base in the side chain and a B block not having a quaternary ammonium base. It is disclosed that a copolymer is used as a pigment dispersant for a color filter (see Patent Document 1 (claim 1, paragraphs 0049 to 0058)).
 また、特許文献2では、側鎖に酸性基を有するAブロックと、側鎖にアミノ基または4級アンモニウム塩基を有するBブロックとからなる、A-Bブロック共重合体を顔料分散剤として用いることで、塗布特性および長期保存安定性、アルカリ現像性が向上することが開示されている(特許文献2(請求項1、段落0031~0034、0038~0040)参照)。 In Patent Document 2, an AB block copolymer comprising an A block having an acidic group in the side chain and a B block having an amino group or a quaternary ammonium base in the side chain is used as a pigment dispersant. The coating characteristics, long-term storage stability, and alkali developability are improved (see Patent Document 2 (Claim 1, paragraphs 0031 to 0034, 0038 to 0040)).
特開2012-068559号公報JP 2012-068559 A 特開2013-203887号公報JP 2013-203887 A
 従来、耐熱性を向上させた樹脂型分散剤が提案されているが、樹脂型分散剤の耐熱性は十分ではないという問題があった。本発明は上記事情に鑑みてなされたものであり、例えば分散剤として用いることができ、優れた耐熱性を有するブロック共重合体を提供することを目的とする。 Conventionally, resin-type dispersants with improved heat resistance have been proposed, but there is a problem that the heat resistance of the resin-type dispersant is not sufficient. The present invention has been made in view of the above circumstances, and an object thereof is to provide a block copolymer that can be used as, for example, a dispersant and has excellent heat resistance.
 上記課題を解決することができた本発明のブロック共重合体は、酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、一般式(1)で表される構造単位および一般式(2)で表される構造単位を含むBブロックとを有することを特徴とする。 The block copolymer of the present invention that has been able to solve the above-mentioned problems includes an A block containing a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the general formula (1), and a general formula ( And a B block including the structural unit represented by 2).
Figure JPOXMLDOC01-appb-C000005
〔式(1)において、R11、R12およびR13は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R11、R12およびR13のうち2つ以上が互いに結合して環状構造を形成していてもよい。X1は2価の連結基を示す。R14は水素原子またはメチル基を示す。Y-は芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンおよび芳香族カルボン酸アニオンよりなる群から選択される少なくとも1種を示す。〕
Figure JPOXMLDOC01-appb-C000005
[In Formula (1), R <11> , R < 12 > and R < 13 > show the chain or cyclic hydrocarbon group which may have a substituent each independently. Two or more of R 11 , R 12 and R 13 may be bonded to each other to form a cyclic structure. X 1 represents a divalent linking group. R 14 represents a hydrogen atom or a methyl group. Y represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion, and an aromatic carboxylate anion. ]
Figure JPOXMLDOC01-appb-C000006
〔式(2)において、R21およびR22は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R21およびR22が互いに結合して環状構造を形成していてもよい。X2は2価の連結基を示す。R23は水素原子またはメチル基を示す。〕
Figure JPOXMLDOC01-appb-C000006
[In Formula (2), R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure. X 2 represents a divalent linking group. R 23 represents a hydrogen atom or a methyl group. ]
 従来の4級アンモニウム塩基を有するポリマーは、4級アンモニウムカチオンの対イオンとしてハロゲンアニオンが一般的に用いられている。このようなハロゲンアニオンを含有するポリマーは、高温雰囲気において、対イオンの脱離反応を生じるため、耐熱性が劣ると考えられる。本発明のブロック共重合体は、Bブロック中の4級アンモニウムカチオンの対イオンが芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンまたは芳香族カルボン酸アニオンであるため、耐熱性に優れる。また、本発明のブロック共重合体は、酸性基を有するAブロックと、特定の構造を有するBブロックとを有するため、分散剤として用いることができる。 A conventional polymer having a quaternary ammonium base generally uses a halogen anion as a counter ion of a quaternary ammonium cation. Such a polymer containing a halogen anion is considered to be inferior in heat resistance because it causes a counterion elimination reaction in a high temperature atmosphere. In the block copolymer of the present invention, since the counter ion of the quaternary ammonium cation in the B block is an aromatic dicarboxylic acid imide anion, an aromatic sulfonic acid anion, an aromatic phosphonic acid anion, or an aromatic carboxylic acid anion, Excellent in properties. Moreover, since the block copolymer of this invention has A block which has an acidic group, and B block which has a specific structure, it can be used as a dispersing agent.
 前記ブロック共重合体は、A-B型ブロック共重合体であることが好ましい。前記ブロック共重合体において、前記酸性基を有するビニルモノマーに由来する構造単位の含有率は、前記Aブロック100質量%中において2質量%~20質量%であることが好ましい。前記ブロック共重合体において、前記一般式(1)で表される構造単位の含有率は、前記Bブロック100質量%中において30質量%~85質量%であることが好ましい。前記Aブロックの含有量は、ブロック共重合体100質量%中において35質量%~85質量%であることが好ましい。 The block copolymer is preferably an AB type block copolymer. In the block copolymer, the content of the structural unit derived from the vinyl monomer having an acidic group is preferably 2% by mass to 20% by mass in 100% by mass of the A block. In the block copolymer, the content of the structural unit represented by the general formula (1) is preferably 30% by mass to 85% by mass in 100% by mass of the B block. The content of the A block is preferably 35% by mass to 85% by mass in 100% by mass of the block copolymer.
 本発明には、前記ブロック共重合体を含有する第一組成物、および、前記第一組成物を、水洗し、乾燥して得られる第二組成物も含まれる。前記第一組成物に含有されるブロック共重合体の分子量分布(PDI)は、2.0以下であることが好ましい。また、本発明には、前記ブロック共重合体、第一組成物または第二組成物を含有する分散剤が含まれる。さらに、本発明には、前記分散剤と顔料と分散媒体を含有する顔料分散組成物も含まれる。このような組成物としては、カラーフィルタ用顔料分散組成物が挙げられる。 The present invention includes a first composition containing the block copolymer and a second composition obtained by washing the first composition with water and drying. The molecular weight distribution (PDI) of the block copolymer contained in the first composition is preferably 2.0 or less. Moreover, the dispersing agent containing the said block copolymer, a 1st composition, or a 2nd composition is contained in this invention. Furthermore, the present invention includes a pigment dispersion composition containing the dispersant, a pigment, and a dispersion medium. Examples of such a composition include a pigment dispersion composition for a color filter.
 本発明のブロック共重合体の製造方法は、酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、下記式(2)で表される構造単位および下記式(3)で表される構造単位を含むBブロックとを有するブロック共重合体の前駆体を準備する工程(A)と、前記工程(A)で得られたブロック共重合体の前駆体に、芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸よりなる群から選択される少なくとも1種のアルカリ金属塩を作用させ、ブロック共重合体を得る工程(B)とを備えることを特徴とする。 The production method of the block copolymer of the present invention is represented by an A block containing a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the following formula (2), and the following formula (3). A step (A) of preparing a block copolymer precursor having a B block containing a structural unit, and a precursor of the block copolymer obtained in the step (A), an aromatic dicarboxylic imide, an aromatic And a step (B) of obtaining a block copolymer by reacting at least one alkali metal salt selected from the group consisting of aromatic sulfonic acids, aromatic phosphonic acids and aromatic carboxylic acids.
Figure JPOXMLDOC01-appb-C000007
〔式(2)において、R21およびR22は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R21およびR22が互いに結合して環状構造を形成していてもよい。X2は2価の連結基を示す。R23は水素原子またはメチル基を示す。〕
Figure JPOXMLDOC01-appb-C000007
[In Formula (2), R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure. X 2 represents a divalent linking group. R 23 represents a hydrogen atom or a methyl group. ]
Figure JPOXMLDOC01-appb-C000008
〔式(3)において、R31、R32およびR33は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R31、R32およびR33のうち2つ以上が互いに結合して環状構造を形成していてもよい。X3は2価の連結基を示す。R34は水素原子またはメチル基を示す。X-はハロゲンアニオンを示す。〕
Figure JPOXMLDOC01-appb-C000008
[In the formula (3), R 31 , R 32 and R 33 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. Two or more of R 31 , R 32 and R 33 may be bonded to each other to form a cyclic structure. X 3 represents a divalent linking group. R 34 represents a hydrogen atom or a methyl group. X represents a halogen anion. ]
 上記工程(B)において、芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸または芳香族カルボン酸のアルカリ金属塩を用いることで、4級アンモニウムカチオンの対イオンをハロゲンアニオンから芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンまたは芳香族カルボン酸アニオンに交換(アニオン交換)することが容易となる。 In the step (B), an aromatic dicarboxylic acid imide, aromatic sulfonic acid, aromatic phosphonic acid or an alkali metal salt of aromatic carboxylic acid is used to convert the counter ion of the quaternary ammonium cation from the halogen anion to the aromatic dicarboxylic acid. It becomes easy to exchange (anion exchange) with an acid imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion or an aromatic carboxylate anion.
 この工程(B)におけるアニオン交換に関して、HASB則に基づいて各イオンを分類する。例えば、ハロゲン化物イオン(例えば、塩化物イオン)は、電気陰性度が大きく、分極率が小さいため、硬い塩基に分類される。アルカリ金属イオン(例えば、カリウムイオン)は硬い酸に分類される。芳香環のπ電子系を有する芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンおよび芳香族カルボン酸アニオンは軟らかい塩基に分類すると考えられる。ポリマー中の4級アンモニウムイオンは軟らかい酸に分類すると考えられる。HSAB則によると、軟らかい酸には軟らかい塩基、硬い酸には硬い塩基のように同程度の硬さの酸と塩基を組み合わせは結合力が強いと言われている。上記アニオン交換において結合力の強いイオンペアが生成することでアニオン交換が容易になると考えられる。 Referring to the anion exchange in this step (B), each ion is classified based on the HASB rule. For example, halide ions (eg, chloride ions) are classified as hard bases because of their high electronegativity and low polarizability. Alkali metal ions (eg, potassium ions) are classified as hard acids. Aromatic dicarboxylic imide anions, aromatic sulfonate anions, aromatic phosphonate anions and aromatic carboxylate anions having a π-electron system of aromatic rings are considered to be classified as soft bases. Quaternary ammonium ions in the polymer are considered to be classified as soft acids. According to the HSAB rule, it is said that a combination of an acid and a base having the same degree of hardness, such as a soft base for a soft acid and a hard base for a hard acid, has a strong binding force. It is considered that the anion exchange is facilitated by generating an ion pair having a strong binding force in the anion exchange.
 前記製造方法は、前記工程(A)において、リビングラジカル重合を用いて前記ブロック共重合体の前駆体を準備することが好ましい。また、前記製造方法は、前記工程(B)で得られたブロック共重合体を、水洗する工程(C)を備えることが好ましい。 In the step (A), the production method preferably prepares the block copolymer precursor using living radical polymerization. The production method preferably includes a step (C) of washing the block copolymer obtained in the step (B) with water.
 本発明によれば、例えば分散剤として用いることができ、優れた耐熱性を有するブロック共重合体を提供することができる。 According to the present invention, for example, a block copolymer that can be used as a dispersant and has excellent heat resistance can be provided.
 以下、本発明を実施した好ましい形態の一例について説明する。但し、以下の実施形態は単なる例示である。本発明は、以下の実施形態に何ら限定されない。 Hereinafter, an example of a preferable embodiment in which the present invention is implemented will be described. However, the following embodiments are merely examples. The present invention is not limited to the following embodiments.
<1 ブロック共重合体>
 本発明のブロック共重合体は、酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、後述する一般式(1)で表される構造単位および後述する一般式(2)で表される構造単位を含むBブロックとを有することを特徴とする。
<1 block copolymer>
The block copolymer of the present invention is represented by an A block containing a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the general formula (1) described later, and a general formula (2) described later. And a B block including a structural unit.
 本発明において、「Aブロック」は「Aセグメント」と言い換えることができ、「Bブロック」は「Bセグメント」と言い換えることができる。本発明において、「ビニルモノマー」とは分子中にラジカル重合可能な炭素-炭素二重結合を有するモノマーのことをいう。「ビニルモノマーに由来する構造単位」とは、ビニルモノマーのラジカル重合可能な炭素-炭素二重結合が、重合して炭素-炭素単結合になった構造単位をいう。「(メタ)アクリル」は「アクリルおよびメタクリルの少なくとも一方」をいう。「(メタ)アクリレート」は「アクレートおよびメタクリレートの少なくとも一方」をいう。「(メタ)アクリロイル」は「アクリロイルおよびメタクロイル少なくとも一方」をいう。 In the present invention, “A block” can be rephrased as “A segment”, and “B block” can be rephrased as “B segment”. In the present invention, the “vinyl monomer” refers to a monomer having a carbon-carbon double bond capable of radical polymerization in the molecule. The “structural unit derived from a vinyl monomer” refers to a structural unit in which a carbon-carbon double bond capable of radical polymerization of a vinyl monomer is polymerized into a carbon-carbon single bond. “(Meth) acryl” means “at least one of acrylic and methacrylic”. “(Meth) acrylate” means “at least one of acrylate and methacrylate”. “(Meth) acryloyl” refers to “at least one of acryloyl and methacryloyl”.
 本発明のブロック共重合体の各種構成成分等について以下説明する。 The various components of the block copolymer of the present invention will be described below.
(1.1 Aブロック)
 Aブロックは、酸性基を有するビニルモノマーに由来する構造単位を有するポリマーブロックである。Aブロックは、酸性基を有することで、アルカリ現像が容易になると考えられる。そのため、前記ブロック共重合体は、アルカリ現像を採用したカラーフィルタの製造に使用されるカラーフィルタ用の顔料分散組成物に好適に使用できる。
(1.1 A block)
The A block is a polymer block having a structural unit derived from a vinyl monomer having an acidic group. It is thought that alkali development becomes easy because A block has an acidic group. Therefore, the block copolymer can be suitably used in a pigment dispersion composition for a color filter used for producing a color filter employing alkali development.
 前記酸性基としては、カルボキシ基(-COOH)、スルホン酸基(-SO3H)、リン酸基(-OPO32)、ホスホン酸基(-PO32)、ホスフィン酸基(-PO22)が挙げられる。Aブロックは、酸性基を有するビニルモノマーに由来する構造単位を1種のみ有してもよいし、2種以上有していてもよい。 Examples of the acidic group include a carboxy group (—COOH), a sulfonic acid group (—SO 3 H), a phosphoric acid group (—OPO 3 H 2 ), a phosphonic acid group (—PO 3 H 2 ), a phosphinic acid group (— PO 2 H 2 ). A block may have only 1 type of structural unit derived from the vinyl monomer which has an acidic group, and may have 2 or more types.
 前記酸性基を有するビニルモノマーとしては、カルボキシ基を有するビニルモノマー、スルホン酸基を有するビニルモノマー、またはリン酸基を有するビニルモノマーから選択される少なくとも1種が好ましい。これらの中でも好ましくは、カルボキシ基を有する(メタ)アクリルモノマー、スルホン酸基を有する(メタ)アクリルモノマー、またはリン酸基を有する(メタ)アクリルモノマーから選択される少なくとも1種である。 The vinyl monomer having an acidic group is preferably at least one selected from a vinyl monomer having a carboxy group, a vinyl monomer having a sulfonic acid group, or a vinyl monomer having a phosphoric acid group. Among these, at least one selected from a (meth) acrylic monomer having a carboxy group, a (meth) acrylic monomer having a sulfonic acid group, or a (meth) acrylic monomer having a phosphoric acid group is preferable.
 カルボキシ基を有するビニルモノマーとしては、(メタ)アクリル酸;2-(メタ)アクリロイルオキシエチルサクシネート、2-(メタ)アクリロイルオキシエチルマレアート、2-(メタ)アクリロイルオキシエチルフタレート等のヒドロキシ基を有するビニルモノマー(好ましくはヒドロキシアルキル(メタ)アクリレート)に無水マレイン酸、無水コハク酸、無水フタル酸等の酸無水物を反応させたモノマー;クロトン酸、マレイン酸、イタコン酸等が挙げられる。 Examples of vinyl monomers having a carboxy group include (meth) acrylic acid; hydroxy groups such as 2- (meth) acryloyloxyethyl succinate, 2- (meth) acryloyloxyethyl maleate, 2- (meth) acryloyloxyethyl phthalate A monomer obtained by reacting an acid anhydride such as maleic anhydride, succinic anhydride or phthalic anhydride with a vinyl monomer (preferably hydroxyalkyl (meth) acrylate) having a carboxylic acid; crotonic acid, maleic acid, itaconic acid and the like.
 スルホン酸基を有するビニルモノマーとしては、ビニルスルホン酸、スチレンスルホン酸、ジスルホン酸エチル(メタ)アクリレート、メチルプロピルスルホン酸(メタ)アクリルアミド、スルホン酸エチル(メタ)アクリルアミド等が挙げられる。 Examples of the vinyl monomer having a sulfonic acid group include vinyl sulfonic acid, styrene sulfonic acid, ethyl disulfonate (meth) acrylate, methylpropyl sulfonic acid (meth) acrylamide, and ethyl sulfonate (meth) acrylamide.
 リン酸基を有するビニルモノマーとしては、(メタ)アクリル酸2-(ホスホノオキシ)エチル等が挙げられる。 Examples of the vinyl monomer having a phosphate group include 2- (phosphonooxy) ethyl (meth) acrylate.
 酸性基を有するビニルモノマーに由来する構造単位の含有率は、Aブロック100質量%中において2質量%以上が好ましく、より好ましくは5質量%以上、さらに好ましくは7質量%以上であり、20質量%以下が好ましく、より好ましくは18質量%以下、さらに好ましくは16質量%以下である。酸性基を有するビニルモノマーに由来する構造単位の含有率が2質量%以上であればアルカリ現像において、アルカリで中和した際の溶解速度が速くなり、20質量%以下であれば親水性が高すぎず、形成される画素が乱雑になることを抑制できる。 The content of the structural unit derived from the vinyl monomer having an acidic group is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and 20% by mass in 100% by mass of the A block. % Or less is preferable, more preferably 18% by mass or less, and still more preferably 16% by mass or less. If the content of the structural unit derived from the vinyl monomer having an acidic group is 2% by mass or more, the dissolution rate when neutralized with an alkali is increased in alkali development, and if it is 20% by mass or less, the hydrophilicity is high. However, it is possible to prevent the formed pixels from becoming messy.
 前記Aブロックは、酸性基を有するビニルモノマーに由来する構造単位以外の他の構造単位を有していてもよい。Aブロックに含まれ得る他の構造単位は、酸性基を有するビニルモノマー、および後述のBブロックを形成するビニルモノマーの両方と共重合し得るビニルモノマーにより形成されるものであれば特に制限はない。Aブロックの他の構造単位を形成し得るビニルモノマーは単独で使用してもよいし、2種以上を併用してもよい。 The A block may have a structural unit other than the structural unit derived from the vinyl monomer having an acidic group. The other structural unit that can be contained in the A block is not particularly limited as long as it is formed by a vinyl monomer that can be copolymerized with both a vinyl monomer having an acidic group and a vinyl monomer that forms the B block described later. . Vinyl monomers that can form other structural units of the A block may be used alone or in combination of two or more.
 Aブロックの他の構造単位を形成し得るビニルモノマーの具体例としては、α-オレフィン、芳香族ビニルモノマー、ヘテロ環を含有するビニルモノマー、ビニルアミド、カルボン酸ビニル、ジエン類、(メタ)アクリルモノマー等が挙げられる。これらのビニルモノマーはヒドロキシ基、エポキシ基を有していてもよい。 Specific examples of vinyl monomers that can form other structural units of the A block include α-olefins, aromatic vinyl monomers, vinyl monomers containing heterocycles, vinyl amides, vinyl carboxylates, dienes, and (meth) acrylic monomers. Etc. These vinyl monomers may have a hydroxy group or an epoxy group.
 α-オレフィンとしては、1-ヘキセン、1-オクテン、1-デセン等が挙げられる。
 芳香族ビニルモノマーとしては、スチレン、α-メチルスチレン、4-メチルスチレン、2-メチルスチレン、3-メチルスチレン、4-メトキシスチレン、2-ヒドロキシメチルスチレン、1-ビニルナフタレン等が挙げられる。
 ヘテロ環を含有するビニルモノマーとしては、2-ビニルチオフェン、N-メチル-2-ビニルピロール、1-ビニル-2-ピロリドン、2-ビニルピリジン、4-ビニルピリジン等が挙げられる。
 ビニルアミドとしては、N-ビニルホルムアミド、N-ビニルアセトアミド、N-ビニル-ε-カプトラクタム等が挙げられる。
 カルボン酸ビニルとしては、酢酸ビニル、ピバル酸ビニル、安息香酸ビニル等が挙げられる。
 ジエン類としては、ブタジエン、イソプレン、4-メチル-1,4-ヘキサジエン、7-メチル-1,6-オクタジエン等が挙げられる。
Examples of the α-olefin include 1-hexene, 1-octene, 1-decene and the like.
Examples of the aromatic vinyl monomer include styrene, α-methylstyrene, 4-methylstyrene, 2-methylstyrene, 3-methylstyrene, 4-methoxystyrene, 2-hydroxymethylstyrene, 1-vinylnaphthalene and the like.
Examples of the vinyl monomer containing a heterocycle include 2-vinylthiophene, N-methyl-2-vinylpyrrole, 1-vinyl-2-pyrrolidone, 2-vinylpyridine, 4-vinylpyridine and the like.
Examples of the vinylamide include N-vinylformamide, N-vinylacetamide, N-vinyl-ε-captolactam and the like.
Examples of vinyl carboxylate include vinyl acetate, vinyl pivalate, vinyl benzoate and the like.
Examples of dienes include butadiene, isoprene, 4-methyl-1,4-hexadiene, 7-methyl-1,6-octadiene and the like.
 (メタ)アクリルモノマーとしては、鎖状アルキル基(直鎖アルキル基または分岐鎖状アルキル基)を有する(メタ)アクリレート;環状アルキル基(単環構造)を有する(メタ)アクリレート;芳香環基を有する(メタ)アクリレート;(メタ)アクリルアミド;ポリエチレングリコール構造単位を有する(メタ)アクリレート;ヒドロキシ基を有する(メタ)アクリレート;ヒドロキシ基を有する(メタ)アクリレートのカプロラクトン付加物;アルコキシ基を有する(メタ)アクリレート;環状エーテル基を有する(メタ)アクリレート等が挙げられる。 (Meth) acrylic monomers include (meth) acrylates having a chain alkyl group (straight chain alkyl group or branched chain alkyl group); (meth) acrylates having a cyclic alkyl group (monocyclic structure); aromatic ring groups (Meth) acrylate having (meth) acrylamide; (meth) acrylate having a polyethylene glycol structural unit; (meth) acrylate having a hydroxy group; caprolactone adduct of (meth) acrylate having a hydroxy group; ) Acrylate; (meth) acrylate having a cyclic ether group.
 鎖状アルキル基を有する(メタ)アクリレートとしては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、sec-ブチル(メタ)アクリレート、tert-ブチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート等が挙げられる。環状アルキル基を有する(メタ)アクリレートとしては、シクロヘキシル(メタ)アクリレート、メチルシクロヘキシル(メタ)アクリレート、シクロドデシル(メタ)アクリレート等が挙げられる。芳香環基を有する(メタ)アクリレートとしては、ベンジル(メタ)アクリレート、フェニル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート等が挙げられる。 Examples of the (meth) acrylate having a chain alkyl group include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, sec-butyl (Meth) acrylate, tert-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and the like. Examples of the (meth) acrylate having a cyclic alkyl group include cyclohexyl (meth) acrylate, methylcyclohexyl (meth) acrylate, and cyclododecyl (meth) acrylate. Examples of the (meth) acrylate having an aromatic ring group include benzyl (meth) acrylate, phenyl (meth) acrylate, and phenoxyethyl (meth) acrylate.
 (メタ)アクリルアミドとしては、(メタ)アクリルアミド、N-メチル(メタ)アクリルアミド、N-イソプロピル(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド等が挙げられる。ポリエチレングリコール構造単位を有する(メタ)アクリレートとしては、ポリエチレングリコール(n=1~5)メチルエーテル(メタ)アクリレート、ポリエチレングリコール(n=1~5)エチルエーテル(メタ)アクリレート、
ポリエチレングリコール(n=1~5)プロピルエーテル(メタ)アクリレート、ポリプロピレングリコール(n=1~5)メチルエーテル(メタ)アクリレート、ポリプロピレングリコール(n=1~5)エチルエーテル(メタ)アクリレート、ポリプロピレングリコール(n=1~5)プロピルエーテル(メタ)アクリレート等が挙げられる。
Examples of (meth) acrylamide include (meth) acrylamide, N-methyl (meth) acrylamide, N-isopropyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide and the like. Examples of the (meth) acrylate having a polyethylene glycol structural unit include polyethylene glycol (n = 1 to 5) methyl ether (meth) acrylate, polyethylene glycol (n = 1 to 5) ethyl ether (meth) acrylate,
Polyethylene glycol (n = 1-5) propyl ether (meth) acrylate, polypropylene glycol (n = 1-5) methyl ether (meth) acrylate, polypropylene glycol (n = 1-5) ethyl ether (meth) acrylate, polypropylene glycol (N = 1 to 5) propyl ether (meth) acrylate and the like.
 ヒドロキシ基を有する(メタ)アクリレートとしては、2-ヒドロキシエチル(メタ)アクリレート、3-ヒドロキシプロピル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート等のヒドロキシアルキル(メタ)アクリレート等が挙げられる。 Examples of the (meth) acrylate having a hydroxy group include 2-hydroxyethyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate and the like. (Meth) acrylate etc. are mentioned.
 ヒドロキシ基を有する(メタ)アクリレートのカプロラクトン付加物としては、2-ヒドロキシエチル(メタ)アクリレートのカプロラクトン1mol付加物、2-ヒドロキシエチル(メタ)アクリレートのカプロラクトン2mol付加物、2-ヒドロキシエチル(メタ)アクリレートのカプロラクトン3mol付加物、2-ヒドロキシエチル(メタ)アクリレートのカプロラクトン4mol付加物、2-ヒドロキシエチル(メタ)アクリレートのカプロラクトン5mol付加物等が挙げられる。 The caprolactone adduct of (meth) acrylate having a hydroxy group includes a 1 mol adduct of caprolactone of 2-hydroxyethyl (meth) acrylate, a 2 mol adduct of caprolactone of 2-hydroxyethyl (meth) acrylate, and 2-hydroxyethyl (meth). Examples include acrylate caprolactone 3 mol adduct, 2-hydroxyethyl (meth) acrylate caprolactone 4 mol adduct, 2-hydroxyethyl (meth) acrylate caprolactone 5 mol adduct, and the like.
 アルコキシ基を有する(メタ)アクリレートとしては、メトキシエチル(メタ)アクリレート、エトキシエチル(メタ)アクリレート等が挙げられる。 Examples of the (meth) acrylate having an alkoxy group include methoxyethyl (meth) acrylate and ethoxyethyl (meth) acrylate.
 環状エーテル基を有する(メタ)アクリレートとしては、グリシジル(メタ)アクリレート、(メタ)アクリル酸テトラヒドロフルフリル、(メタ)アクリロイルモルホリン、(メタ)アクリル酸2-(4-モルホリニル)エチル、(3-エチルオキセタン-3-イル)メチル(メタ)アクリレート、(2-メチル-2-エチル-1,3-ジオキソラン-4-イル)メチル(メタ)アクリレート、環状トリメチロールプロパンホルマール(メタ)アクリレート、2-〔(2-テトラヒドロピラニル)オキシ〕エチル(メタ)アクリレート、1,3-ジオキサン-(メタ)アクリレート等が挙げられる。 Examples of the (meth) acrylate having a cyclic ether group include glycidyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, (meth) acryloylmorpholine, 2- (4-morpholinyl) ethyl (meth) acrylate, (3- Ethyl oxetane-3-yl) methyl (meth) acrylate, (2-methyl-2-ethyl-1,3-dioxolan-4-yl) methyl (meth) acrylate, cyclic trimethylolpropane formal (meth) acrylate, 2- [(2-Tetrahydropyranyl) oxy] ethyl (meth) acrylate, 1,3-dioxane- (meth) acrylate and the like.
 Aブロックに含まれ得る他の構造単位を形成し得るビニルモノマーは、(メタ)アクリルモノマーが好ましく、鎖状アルキル基を有する(メタ)アクリレート、芳香環基を有する(メタ)アクリレート、ポリエチレングリコール構造単位を有する(メタ)アクリレート、ヒドロキシ基を有する(メタ)アクリレート、ヒドロキシ基を有する(メタ)アクリレートのカプロラクトン付加物、環状エーテル基を有する(メタ)アクリレートよりなる群から選択される少なくとも1種であることがより好ましい。Aブロックで使用し得る前記ビニルモノマーは、それぞれ1種または2種以上を使用することができる。 The vinyl monomer that can form another structural unit that can be included in the A block is preferably a (meth) acrylic monomer, (meth) acrylate having a chain alkyl group, (meth) acrylate having an aromatic ring group, polyethylene glycol structure At least one selected from the group consisting of (meth) acrylates having units, (meth) acrylates having hydroxy groups, caprolactone adducts of (meth) acrylates having hydroxy groups, and (meth) acrylates having cyclic ether groups More preferably. The vinyl monomer that can be used in the A block can be used alone or in combination of two or more.
 Aブロックが、鎖状アルキル基を有する(メタ)アクリレート、環状アルキル基を有する(メタ)アクリレート、および、芳香環基を有する(メタ)アクリレートよりなる群から選択される少なくとも1種のビニルモノマーに由来する構造単位を有する場合、これらの構造単位の合計含有率は、Aブロック100質量%中において30質量%以上が好ましく、より好ましくは35質量%以上、さらに好ましくは40質量%以上であり、98質量%以下が好ましく、より好ましくは95質量%以下、さらに好ましくは90質量%以下である。 At least one vinyl monomer selected from the group consisting of (meth) acrylate having a chain alkyl group, (meth) acrylate having a cyclic alkyl group, and (meth) acrylate having an aromatic ring group When the structural unit is derived, the total content of these structural units is preferably 30% by mass or more, more preferably 35% by mass or more, and further preferably 40% by mass or more in 100% by mass of the A block. 98 mass% or less is preferable, More preferably, it is 95 mass% or less, More preferably, it is 90 mass% or less.
 Aブロックが、(メタ)アクリルアミド、ポリエチレングリコール構造単位を有する(メタ)アクリレート、ヒドロキシ基を有する(メタ)アクリレート、ヒドロキシ基を有する(メタ)アクリレートのカプロラクトン付加物、アルコキシ基を有する(メタ)アクリレート、および、環状エーテル基を有する(メタ)アクリレートよりなる群から選択される少なくとも1種のビニルモノマーに由来する構造単位を有する場合、これらの構造単位の合計含有率は、Aブロック100質量%中において2質量%以上が好ましく、より好ましくは5質量%以上、さらに好ましくは10質量%以上であり、70質量%以下が好ましく、より好ましくは65質量%以下、さらに好ましくは60質量%以下である。 A block is (meth) acrylamide, (meth) acrylate having a polyethylene glycol structural unit, (meth) acrylate having a hydroxy group, caprolactone adduct of (meth) acrylate having a hydroxy group, (meth) acrylate having an alkoxy group And having a structural unit derived from at least one vinyl monomer selected from the group consisting of (meth) acrylates having a cyclic ether group, the total content of these structural units is 100% by mass in the A block. Is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 10% by mass or more, preferably 70% by mass or less, more preferably 65% by mass or less, and further preferably 60% by mass or less. .
 また、Aブロックは、アミノ基を有さないことが好ましい。つまり、Aブロックを構成するビニルモノマーには、アミノ基を有するビニルモノマーを含有しないことが好ましい。Aブロックにアミノ基が多量に存在すると、顔料分散剤として使用した際に、顔料がAブロックおよびBブロックの両方に吸着されてしまい、顔料の分散性能が低下する。Aブロック中のアミノ基を有するビニルモノマーに由来する構造単位の含有率は、2質量%以下が好ましく、より好ましくは1質量%以下、さらに好ましくは0.1質量%以下、最も好ましくは0質量%である。 The A block preferably has no amino group. That is, it is preferable that the vinyl monomer constituting the A block does not contain a vinyl monomer having an amino group. When a large amount of amino groups are present in the A block, when used as a pigment dispersant, the pigment is adsorbed by both the A block and the B block, and the dispersion performance of the pigment is lowered. The content of the structural unit derived from the vinyl monomer having an amino group in the A block is preferably 2% by mass or less, more preferably 1% by mass or less, still more preferably 0.1% by mass or less, and most preferably 0% by mass. %.
 Aブロックにおいて2種以上の構造単位が含有される場合は、Aブロックに含有される各種構造単位は、Aブロック中においてランダム共重合、ブロック共重合等の何れの態様で含有されていてもよく、均一性の観点からランダム共重合の態様で含有されていることが好ましい。例えば、Aブロックが、a1ブロックからなる構造単位とa2ブロックとからなる構造単位との共重合体により形成されていてもよい。 When two or more types of structural units are contained in the A block, the various structural units contained in the A block may be contained in any form such as random copolymerization and block copolymerization in the A block. From the viewpoint of uniformity, it is preferably contained in the form of random copolymerization. For example, the A block may be formed of a copolymer of a structural unit composed of an a1 block and a structural unit composed of an a2 block.
(1.2 Bブロック)
 Bブロックは、一般式(1)で表される構造単位および一般式(2)で表される構造単位を有するポリマーブロックである。Bブロックは、3級アミノ基に加え4級アンモニウム塩基を有することから、顔料との高い親和性を有すると考えられる。
(1.2 B block)
The B block is a polymer block having a structural unit represented by the general formula (1) and a structural unit represented by the general formula (2). Since the B block has a quaternary ammonium base in addition to a tertiary amino group, it is considered to have a high affinity with the pigment.
(1.2.1 一般式(1)で表される構造単位)
 一般式(1)で表される構造単位は、構造中に4級アンモニウム塩を有し、そのアニオン成分として、芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンおよび芳香族カルボン酸アニオンよりなる群から選択される少なくとも1種を有する。Bブロックにおける一般式(1)で表される構造単位は、1種のみであってもよいし2種以上を有していてもよい。
(1.2.1 Structural unit represented by general formula (1))
The structural unit represented by the general formula (1) has a quaternary ammonium salt in the structure, and as its anion component, an aromatic dicarboxylic acid imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion and an aromatic It has at least one selected from the group consisting of carboxylate anions. The structural unit represented by the general formula (1) in the B block may be only one type or may have two or more types.
Figure JPOXMLDOC01-appb-C000009
〔式(1)において、R11、R12およびR13は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R11、R12およびR13のうち2つ以上が互いに結合して環状構造を形成していてもよい。X1は2価の連結基を示す。R14は水素原子またはメチル基を示す。Y-は芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンおよび芳香族カルボン酸アニオンよりなる群から選択される少なくとも1種を示す。〕
Figure JPOXMLDOC01-appb-C000009
[In Formula (1), R <11> , R < 12 > and R < 13 > show the chain or cyclic hydrocarbon group which may have a substituent each independently. Two or more of R 11 , R 12 and R 13 may be bonded to each other to form a cyclic structure. X 1 represents a divalent linking group. R 14 represents a hydrogen atom or a methyl group. Y represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion, and an aromatic carboxylate anion. ]
 前記R11~R13で表される鎖状の炭化水素基には、直鎖状および分岐鎖状のいずれも含まれる。前記R11~R13で表される鎖状の炭化水素基が有する置換基としては、ハロゲン基、アルコキシ基、ベンゾイル基(-COC65)、ヒドロキシ基等が挙げられる。前記R11~R13で表される環状の炭化水素基が有する置換基としては、鎖状のアルキル基、ハロゲン原子、アルコキシ基、ヒドロキシ基等が挙げられる。 The chain hydrocarbon group represented by R 11 to R 13 includes both straight and branched chain groups. Examples of the substituent that the chain hydrocarbon group represented by R 11 to R 13 has include a halogen group, an alkoxy group, a benzoyl group (—COC 6 H 5 ), and a hydroxy group. Examples of the substituent that the cyclic hydrocarbon group represented by R 11 to R 13 has include a chain alkyl group, a halogen atom, an alkoxy group, and a hydroxy group.
 前記R11~R13で表される基としては、置換基を有していてもよい炭素数1~4のアルキル基、置換基を有していてもよい炭素数7~16のアラルキル基が好ましく、メチル基、エチル基、プロピル基、ベンジル基(-CH265)がより好ましい。 Examples of the group represented by R 11 to R 13 include an alkyl group having 1 to 4 carbon atoms which may have a substituent, and an aralkyl group having 7 to 16 carbon atoms which may have a substituent. A methyl group, an ethyl group, a propyl group, and a benzyl group (—CH 2 C 6 H 5 ) are more preferable.
 前記R11~R13のうち2つ以上が互いに結合して形成する環状構造としては、例えば、5~7員環の含窒素複素単環またはこれらが2個縮合してなる縮合環が挙げられる。該含窒素複素環は芳香族性を有しないものが好ましく、飽和環がより好ましい。具体的には下記式(11-1)、(11-2)、(11-3)で表される構造が挙げられる。 Examples of the cyclic structure formed by bonding two or more of R 11 to R 13 to each other include a 5- to 7-membered nitrogen-containing heteromonocycle or a condensed ring formed by condensing two of these. . The nitrogen-containing heterocycle preferably has no aromaticity, and more preferably a saturated ring. Specific examples include structures represented by the following formulas (11-1), (11-2), and (11-3).
Figure JPOXMLDOC01-appb-C000010
〔一般式(11-1)、(11-2)、(11-3)において、R61は、R11~R13のいずれかである。R62は、炭素数1~6のアルキル基を示す。lは0~5の整数を表す。mは0~4の整数を表す。nは0~4の整数を表す。lが2~5、mが2~4、nが2~4の場合、複数存在するR62は、それぞれ同一でも異なっていてもよい。〕
Figure JPOXMLDOC01-appb-C000010
[In the general formulas (11-1), (11-2), and (11-3), R 61 is any one of R 11 to R 13 . R 62 represents an alkyl group having 1 to 6 carbon atoms. l represents an integer of 0 to 5. m represents an integer of 0 to 4. n represents an integer of 0 to 4. When l is 2 to 5, m is 2 to 4, and n is 2 to 4, a plurality of R 62 may be the same or different. ]
 一般式(1)において、2価の連結基X1としては、例えば、メチレン基、炭素数2~10のアルキレン基、アリーレン基、-CONH-R15-基、-COO-R16-基〔ただし、R15およびR16は単結合、メチレン基、炭素数2~10のアルキレン基、または炭素数2~10のエーテル基(アルキルオキシアルキル基)である〕等が挙げられる。2価の連結基X1としては、好ましくは-COO-R16-基であり、-COO-R17-基〔ただし、R17はメチレン基、炭素数2~4のアルキレン基〕がより好ましい。 In the general formula (1), examples of the divalent linking group X 1 include a methylene group, an alkylene group having 2 to 10 carbon atoms, an arylene group, a —CONH—R 15 — group, a —COO—R 16 — group [ R 15 and R 16 are a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms. The divalent linking group X 1 is preferably a —COO—R 16 — group, more preferably a —COO—R 17 — group (wherein R 17 is a methylene group, an alkylene group having 2 to 4 carbon atoms). .
 上記一般式(1)において対イオンのYは芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンおよび芳香族カルボン酸アニオンよりなる群から選択される少なくとも1種を示す。これらの中でも対イオンのYは芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオンが好ましい。 In the general formula (1), Y as a counter ion represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion and an aromatic carboxylate anion. Among these, Y as the counter ion is preferably an aromatic dicarboxylic acid imide anion or an aromatic sulfonic acid anion.
 芳香族ジカルボン酸イミドアニオンは、芳香族ジカルボン酸イミドのアニオンであり、ジカルボイミドを構成する窒素からプロトンを取り去ったものである。芳香族ジカルボン酸イミドは、分子中に芳香環と芳香環に直接結合するイミド基(-C(=O)NHC(=O)-)を有する。前記イミド基は、両末端が1つの芳香環に結合していてもよいし、それぞれ異なる芳香環に結合していてもよい。芳香族ジカルボン酸イミドアニオンとしては、一般式(12)で表されるものが好ましい。 An aromatic dicarboxylic acid imide anion is an anion of an aromatic dicarboxylic acid imide and is obtained by removing a proton from nitrogen constituting dicarbomide. The aromatic dicarboxylic imide has an aromatic ring and an imide group (—C (═O) NHC (═O) —) directly bonded to the aromatic ring in the molecule. Both ends of the imide group may be bonded to one aromatic ring, or may be bonded to different aromatic rings. As the aromatic dicarboxylic acid imide anion, those represented by the general formula (12) are preferable.
Figure JPOXMLDOC01-appb-C000011
〔一般式(12)において、環Aは置換基を有していてもよい芳香環を表す。〕
Figure JPOXMLDOC01-appb-C000011
[In General Formula (12), Ring A represents an aromatic ring which may have a substituent. ]
 一般式(12)において、環Aを構成する芳香環とは、芳香族性を有する環構造である。前記芳香環としては、単環および縮合環のいずれも含まれる。前記単環としては、5または6員環が好ましく、ベンゼン環、フラン環、チオフェン環、ピロール環が好適である。前記縮合環としては、2~5縮合環が好ましく、ナフタレン環、アントラセン環、フェナントレン環、インドール環が好適である。前記芳香環が有していてもよい置換基としては、炭素数1~6のアルキル基、炭素数6~14のアリール基、ニトロ基、シアノ基、ハロゲン基等が挙げられる。 In the general formula (12), the aromatic ring constituting the ring A is a ring structure having aromaticity. The aromatic ring includes both single rings and condensed rings. As the monocycle, a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable. The condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring. Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
 芳香族ジカルボン酸イミドアニオンとしては、1,3-ジオキソ-1,3-ジヒドロ-2H-イソインドール-2-イド(式(12-1));1,3-ジオキソ-1,3-ジヒドロ-2H-ベンゾ[f]イソインドール-2-イド(式(12-2));1,3-ジオキソ-1,3-ジヒドロ-2H-ベンゾ[g]イソインドール-2-イド(式(12-3));5-フェニル-1,3-ジオキソ-1,3-ジヒドロ-2H-イソインドール-2-イド(式(12-4));1,3-ジオキソ-1,3-ジヒドロ-2H-ナフト[2,3-f]イソインドール-2-イド(式(12-5));1,3-ジオキソ-1,3-ジヒドロ-2H-ナフト[2,3-g]イソインドール-2-イド(式(12-6));1,3-ジオキソ-1,3-ジヒドロ-2H-ジベンゾ[e,g]イソインドール-2-イド(式(12-7));等が挙げられる。 The aromatic dicarboxylic acid imide anion includes 1,3-dioxo-1,3-dihydro-2H-isoindole-2-ide (formula (12-1)); 1,3-dioxo-1,3-dihydro- 2H-benzo [f] isoindole-2-id (formula (12-2)); 1,3-dioxo-1,3-dihydro-2H-benzo [g] isoindole-2-id (formula (12-) 3)); 5-phenyl-1,3-dioxo-1,3-dihydro-2H-isoindole-2-ide (formula (12-4)); 1,3-dioxo-1,3-dihydro-2H -Naphtho [2,3-f] isoindole-2-id (formula (12-5)); 1,3-dioxo-1,3-dihydro-2H-naphtho [2,3-g] isoindole-2 -Id (formula (12-6)); 1,3-dioxo-1,3-di Mud -2H- dibenzo [e, g] isoindol-2-Id (formula (12-7)); and the like.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 芳香族スルホン酸アニオンは、芳香族スルホン酸のアニオンである。芳香族スルホン酸は、分子中に、芳香族環とこの芳香族環に直接結合したスルホン酸基を有する。芳香族スルホン酸アニオンとしては、下記式(13)で表されるものが好ましい。 The aromatic sulfonic acid anion is an anion of aromatic sulfonic acid. The aromatic sulfonic acid has an aromatic ring and a sulfonic acid group directly bonded to the aromatic ring in the molecule. As an aromatic sulfonate anion, what is represented by following formula (13) is preferable.
Figure JPOXMLDOC01-appb-C000013
〔一般式(13)において、Arは置換基を有していてもよい芳香環を表す。〕
Figure JPOXMLDOC01-appb-C000013
[In General formula (13), Ar represents the aromatic ring which may have a substituent. ]
 一般式(13)において、Arを構成する芳香環とは、芳香族性を有する環構造である。前記芳香環としては、単環および縮合環のいずれも含まれる。前記単環としては、5または6員環が好ましく、ベンゼン環、フラン環、チオフェン環、ピロール環が好適である。前記縮合環としては、2~5縮合環が好ましく、ナフタレン環、アントラセン環、フェナントレン環、インドール環が好適である。前記芳香環が有していてもよい置換基としては、炭素数1~6のアルキル基、炭素数6~14のアリール基、ニトロ基、シアノ基、ハロゲン基等が挙げられる。 In the general formula (13), the aromatic ring constituting Ar is a ring structure having aromaticity. The aromatic ring includes both single rings and condensed rings. As the monocycle, a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable. The condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring. Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
 芳香族スルホン酸アニオンとしては、ベンゼンスルホン酸アニオン(式(13-1));1-ナフタレンスルホン酸アニオン(式(13-2));2-ナフタレンスルホン酸アニオン(式(13-3));4-ビフェニルスルホン酸アニオン(式(13-4));2-アントラセンスルホン酸アニオン(式(13-5));1-アントラセンスルホン酸アニオン(式(13-6));3-フェナントレンスルホン酸アニオン(式(13-7));p-スチレンスルホン酸アニオン(式(13-8));p-トルエンスルホン酸アニオン(式(13-9))等が挙げられる。 Examples of aromatic sulfonate anions include benzenesulfonate anion (formula (13-1)); 1-naphthalenesulfonate anion (formula (13-2)); 2-naphthalenesulfonate anion (formula (13-3)) 4-biphenylsulfonate anion (formula (13-4)); 2-anthracenesulfonate anion (formula (13-5)); 1-anthracenesulfonate anion (formula (13-6)); 3-phenanthrenesulfone Acid anion (formula (13-7)); p-styrene sulfonate anion (formula (13-8)); p-toluenesulfonate anion (formula (13-9)).
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 芳香族ホスホン酸アニオンは、芳香族ホスホン酸のアニオンである。芳香族ホスホン酸は、分子中に、芳香族環とこの芳香族環に直接結合したホスホン酸基を有する。芳香族ホスホン酸アニオンとしては、下記式(14)で表されるものが好ましい。 An aromatic phosphonic acid anion is an anion of an aromatic phosphonic acid. Aromatic phosphonic acids have an aromatic ring and a phosphonic acid group directly bonded to the aromatic ring in the molecule. As an aromatic phosphonate anion, what is represented by following formula (14) is preferable.
Figure JPOXMLDOC01-appb-C000015
〔一般式(14)において、Arは置換基を有していてもよい芳香環を表す。〕
Figure JPOXMLDOC01-appb-C000015
[In General formula (14), Ar represents the aromatic ring which may have a substituent. ]
 一般式(14)において、Arを構成する芳香環とは、芳香族性を有する環構造である。前記芳香環としては、単環および縮合環のいずれも含まれる。前記単環としては、5または6員環が好ましく、ベンゼン環、フラン環、チオフェン環、ピロール環が好適である。前記縮合環としては、2~5縮合環が好ましく、ナフタレン環、アントラセン環、フェナントレン環、インドール環が好適である。前記芳香環が有していてもよい置換基としては、炭素数1~6のアルキル基、炭素数6~14のアリール基、ニトロ基、シアノ基、ハロゲン基等が挙げられる。 In the general formula (14), the aromatic ring constituting Ar is a ring structure having aromaticity. The aromatic ring includes both single rings and condensed rings. As the monocycle, a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable. The condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring. Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
 芳香族ホスホン酸アニオンとしては、ベンゼンホスホン酸アニオン(式(14-1));1-ナフタレンホスホン酸アニオン(式(14-2));2-ナフタレンホスホン酸アニオン(式(14-3));4-ビフェニルホスホン酸アニオン(式(14-4));2-アントラセンホスホン酸アニオン(式(14-5));1-アントラセンホスホン酸アニオン(式(14-6));3-フェナントレンホスホン酸アニオン(式(14-7));等が挙げられる。 As aromatic phosphonate anions, benzenephosphonate anion (formula (14-1)); 1-naphthalenephosphonate anion (formula (14-2)); 2-naphthalenephosphonate anion (formula (14-3)) 4-biphenylphosphonate anion (formula (14-4)); 2-anthracenephosphonate anion (formula (14-5)); 1-anthracenephosphonate anion (formula (14-6)); 3-phenanthrenephosphone Acid anion (formula (14-7)); and the like.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 芳香族カルボン酸アニオンは、芳香族カルボン酸のアニオンである。芳香族カルボン酸は、分子中に、芳香族環とこの芳香族環に直接結合したカルボキシ基を有する。芳香族カルボン酸アニオンとしては、下記式(15)で表されるものが好ましい。 The aromatic carboxylic acid anion is an anion of an aromatic carboxylic acid. The aromatic carboxylic acid has an aromatic ring and a carboxy group directly bonded to the aromatic ring in the molecule. As an aromatic carboxylate anion, what is represented by following formula (15) is preferable.
Figure JPOXMLDOC01-appb-C000017
〔一般式(15)において、Arは置換基を有していてもよい芳香環を表す。〕
Figure JPOXMLDOC01-appb-C000017
[In General formula (15), Ar represents the aromatic ring which may have a substituent. ]
 一般式(15)において、Arを構成する芳香環とは、芳香族性を有する環構造である。前記芳香環としては、単環および縮合環のいずれも含まれる。前記単環としては、5または6員環が好ましく、ベンゼン環、フラン環、チオフェン環、ピロール環が好適である。前記縮合環としては、2~5縮合環が好ましく、ナフタレン環、アントラセン環、フェナントレン環、インドール環が好適である。前記芳香環が有していてもよい置換基としては、炭素数1~6のアルキル基、炭素数6~14のアリール基、ニトロ基、シアノ基、ハロゲン基等が挙げられる。 In the general formula (15), the aromatic ring constituting Ar is a ring structure having aromaticity. The aromatic ring includes both single rings and condensed rings. As the monocycle, a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable. The condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring. Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group.
 芳香族カルボン酸アニオンとしては、安息香酸アニオン(式(15-1));1-ナフタレンカルボン酸アニオン(式(15-2));2-ナフタレンカルボン酸アニオン(式(15-3));4-ビフェニルカルボン酸アニオン(式(15-4));2-アントラセンカルボン酸アニオン(式(15-5));1-アントラセンカルボン酸アニオン(式(15-6));3-フェナントレンカルボン酸アニオン(式(15-7));p-スチレンカルボン酸アニオン(式(15-8));p-トルエンカルボン酸アニオン(式(15-9))等が挙げられる。 Examples of the aromatic carboxylate anion include benzoate anion (formula (15-1)); 1-naphthalenecarboxylate anion (formula (15-2)); 2-naphthalenecarboxylate anion (formula (15-3)); 4-biphenylcarboxylate anion (formula (15-4)); 2-anthracenecarboxylate anion (formula (15-5)); 1-anthracenecarboxylate anion (formula (15-6)); 3-phenanthrenecarboxylic acid An anion (formula (15-7)); p-styrene carboxylate anion (formula (15-8)); p-toluenecarboxylate anion (formula (15-9)).
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 一般式(1)で表される構造単位の含有率は、Bブロック100質量%中において30質量%以上が好ましく、より好ましくは35質量%以上、さらに好ましくは40質量%以上であり、85質量%以下が好ましく、より好ましくは80質量%以下、さらに好ましくは75質量%以下である。一般式(1)で表される構造単位の含有率をこの範囲にすることで顔料と高い親和性を有すると考えられる。 The content of the structural unit represented by the general formula (1) is preferably 30% by mass or more, more preferably 35% by mass or more, still more preferably 40% by mass or more, and 85% by mass in 100% by mass of the B block. % Or less, more preferably 80% by mass or less, and still more preferably 75% by mass or less. By setting the content of the structural unit represented by the general formula (1) within this range, it is considered that the pigment has high affinity with the pigment.
(1.2.2 一般式(2)で表される構造単位)
 一般式(2)で表される構造単位は、3級アミン構造を有する。Bブロックにおける一般式(2)で表される構造単位は、1種のみであってもよいし2種以上を有していてもよい。
(1.2.2 Structural unit represented by general formula (2))
The structural unit represented by the general formula (2) has a tertiary amine structure. The structural unit represented by the general formula (2) in the B block may be only one type, or may have two or more types.
Figure JPOXMLDOC01-appb-C000019
〔式(2)において、R21およびR22は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R21およびR22が互いに結合して環状構造を形成していてもよい。X2は2価の連結基を示す。R23は水素原子またはメチル基を示す。〕
Figure JPOXMLDOC01-appb-C000019
[In Formula (2), R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure. X 2 represents a divalent linking group. R 23 represents a hydrogen atom or a methyl group. ]
 前記R21またはR22で表される鎖状の炭化水素基には、直鎖状および分岐鎖状のいずれも含まれる。前記R21またはR22で表される鎖状の炭化水素基が有する置換基としては、ハロゲン基、アルコキシ基、ベンゾイル基、ヒドロキシ基等が挙げられる。前記R21またはR22で表される環状の炭化水素基が有する置換基としては、鎖状のアルキル基、ハロゲン基、アルコキシ基、ヒドロキシ基等が挙げられる。 The chain hydrocarbon group represented by R 21 or R 22 includes both linear and branched chains. Examples of the substituent that the chain hydrocarbon group represented by R 21 or R 22 has include a halogen group, an alkoxy group, a benzoyl group, and a hydroxy group. Examples of the substituent that the cyclic hydrocarbon group represented by R 21 or R 22 has include a chain alkyl group, a halogen group, an alkoxy group, and a hydroxy group.
 前記R21またはR22で表される基としては、置換基を有していてもよい炭素数1~4のアルキル基、置換基を有していてもよい炭素数7~16のアラルキル基が好ましく、メチル基、エチル基、プロピル基、ベンジル基がより好ましい。 Examples of the group represented by R 21 or R 22 include an alkyl group having 1 to 4 carbon atoms which may have a substituent, and an aralkyl group having 7 to 16 carbon atoms which may have a substituent. A methyl group, an ethyl group, a propyl group, and a benzyl group are more preferable.
 前記R21またはR22が互いに結合して形成する環状構造としては、例えば、5~7員環の含窒素複素単環またはこれらが2個縮合してなる縮合環が挙げられる。該含窒素複素環は芳香族性を有しないものが好ましく、飽和環がより好ましい。具体的には下記式(21-1)、(21-2)、(21-3)で表される構造が挙げられる。 Examples of the cyclic structure formed by bonding R 21 or R 22 to each other include a 5- to 7-membered nitrogen-containing heteromonocycle or a condensed ring formed by condensing two of these. The nitrogen-containing heterocycle preferably has no aromaticity, and more preferably a saturated ring. Specific examples include structures represented by the following formulas (21-1), (21-2), and (21-3).
Figure JPOXMLDOC01-appb-C000020
〔一般式(21-1)、(21-2)、(21-3)において、R71は、炭素数1~6のアルキル基を示す。lは0~5の整数を表す。mは0~4の整数を表す。nは0~4の整数を表す。lが2~5、mが2~4、nが2~4の場合、複数存在するR71は、それぞれ同一でも異なっていてもよい。〕
Figure JPOXMLDOC01-appb-C000020
[In the general formulas (21-1), (21-2) and (21-3), R 71 represents an alkyl group having 1 to 6 carbon atoms. l represents an integer of 0 to 5. m represents an integer of 0 to 4. n represents an integer of 0 to 4. When l is 2 to 5, m is 2 to 4, and n is 2 to 4, a plurality of R 71 may be the same or different. ]
 上記一般式(2)において、2価の連結基X2としては、例えば、メチレン基、炭素数2~10のアルキレン基、アリーレン基、-CONH-R24-基、-COO-R25-基〔ただし、R24およびR25は単結合、メチレン基、炭素数2~10のアルキレン基、または炭素数2~10のエーテル基(アルキルオキシアルキル基)である〕等が挙げられ、好ましくは-COO-R25-基であり、-COO-R26-基〔ただし、R26はメチレン基、炭素数2~4のアルキレン基〕がより好ましい。 In the general formula (2), examples of the divalent linking group X 2 include a methylene group, an alkylene group having 2 to 10 carbon atoms, an arylene group, a —CONH—R 24 — group, and a —COO—R 25 — group. [Wherein R 24 and R 25 are a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms]. A COO—R 25 — group, more preferably a —COO—R 26 — group (wherein R 26 is a methylene group, an alkylene group having 2 to 4 carbon atoms).
 一般式(2)で表される構造単位の含有率は、Bブロック100質量%中において15質量%以上が好ましく、より好ましくは20質量%以上、さらに好ましくは25質量%以上であり、70質量%以下が好ましく、より好ましくは65質量%以下、さらに好ましくは60質量%以下である。一般式(2)で表される構造単位の含有率をこの範囲にすることで顔料と高い親和性を有すると考えられる。 The content of the structural unit represented by the general formula (2) is preferably 15% by mass or more, more preferably 20% by mass or more, further preferably 25% by mass or more, and 70% by mass in 100% by mass of the B block. % Or less, more preferably 65% by mass or less, and still more preferably 60% by mass or less. By setting the content of the structural unit represented by the general formula (2) within this range, it is considered that the pigment has high affinity with the pigment.
 Bブロックは、一般式(1)で表される構造単位および一般式(2)で表される構造単位のみであっても良いし、他の構造単位が含まれていてもよい。顔料との親和性を保持する観点から、Bブロック中の一般式(1)で表される構造単位と一般式(2)で表される構造単位との合計含有率は、80質量%以上が好ましく、より好ましくは90質量%以上、さらに好ましくは95質量%以上である。また、Bブロックは、Aブロックが有する酸性基を有するビニルモノマーに由来する構造単位を実質的に含有しないことが好ましい。すなわち、Aブロックが有する酸性基を有するビニルモノマーに由来する構造単位の含有率は、Bブロック100質量%中において、5質量%以下が好ましく、2質量%以下がより好ましい。 The B block may be only the structural unit represented by the general formula (1) and the structural unit represented by the general formula (2), or may include other structural units. From the viewpoint of maintaining affinity with the pigment, the total content of the structural unit represented by the general formula (1) and the structural unit represented by the general formula (2) in the B block is 80% by mass or more. More preferably, it is 90 mass% or more, More preferably, it is 95 mass% or more. Moreover, it is preferable that B block does not contain substantially the structural unit derived from the vinyl monomer which has the acidic group which A block has. That is, the content of the structural unit derived from the vinyl monomer having an acidic group in the A block is preferably 5% by mass or less, and more preferably 2% by mass or less in 100% by mass of the B block.
 Bブロックの他の構造単位を形成し得るビニルモノマーの具体例としては、Aブロックの他の構造単位を形成し得るビニルのモノマーの具体例として例示したものと同一のものを挙げることができる。 Specific examples of the vinyl monomer that can form another structural unit of the B block include the same ones as exemplified as specific examples of the vinyl monomer that can form the other structural unit of the A block.
 Bブロックにおいて2種以上の構造単位が含有される場合は、Bブロックに含有される各種構造単位は、Bブロック中においてランダム共重合、ブロック共重合等の何れの態様で含有されていてもよく、均一性の観点からランダム共重合の態様で含有されていることが好ましい。例えば、Bブロックが、b1ブロックからなる構造単位とb2ブロックとからなる構造単位との共重合体により形成されていてもよい。 When two or more types of structural units are contained in the B block, the various structural units contained in the B block may be contained in any form such as random copolymerization and block copolymerization in the B block. From the viewpoint of uniformity, it is preferably contained in the form of random copolymerization. For example, the B block may be formed of a copolymer of a structural unit composed of a b1 block and a structural unit composed of a b2 block.
(1.3 ブロック共重合体)
 本発明のブロック共重合体の構造は、線状ブロック共重合体であることが好ましい。また、線状ブロック共重合体は、いずれの構造(配列)であっても良いが、線状ブロック共重合体の物性、または組成物の物性の観点から、AブロックをA、BブロックをBと表現したとき、(A-B)型、(A-B)-A型、(B-A)-B型(mは1以上の整数、例えば1~3の整数)よりなる群から選択される少なくとも1種の構造を持つ共重合体であることが好ましい。これらの中でも、加工時の取扱い性、組成物の物性の観点から、A-Bで表されるジブロック共重合体であることが好ましい。A-Bで表されるジブロック共重合体を構成することで、Aブロックに有する酸性基を有するビニルモノマーに由来する構造単位と、Bブロックに有する3級アミノ基を有するビニルモノマーに由来する構造単位および4級アンモニウム塩基を有するビニルモノマーに由来する構造単位とが局在化し、効率的に顔料と、溶媒、バインダー樹脂(アルカリ可溶性樹脂)と好適に作用することができると考えられる。
(1.3 Block copolymer)
The structure of the block copolymer of the present invention is preferably a linear block copolymer. The linear block copolymer may have any structure (arrangement). From the viewpoint of the physical properties of the linear block copolymer or the physical properties of the composition, the A block is A and the B block is B. when expressed as, (a-B) m type, (a-B) m -A type, (B-a) m -B type (m is an integer of 1 or more, for example, an integer of 1 to 3) the group consisting of It is preferably a copolymer having at least one structure selected from Among these, a diblock copolymer represented by AB is preferable from the viewpoint of handleability during processing and physical properties of the composition. By constituting the diblock copolymer represented by AB, it is derived from a structural unit derived from a vinyl monomer having an acidic group in the A block and a vinyl monomer having a tertiary amino group in the B block. It is considered that the structural unit and the structural unit derived from the vinyl monomer having a quaternary ammonium base are localized, so that the pigment, the solvent, and the binder resin (alkali-soluble resin) can be efficiently operated suitably.
 Aブロックの含有率は、ブロック共重合体全体100質量%中において、35質量%以上が好ましく、より好ましくは40質量%以上、さらに好ましくは45質量%以上であり、85質量%以下が好ましく、より好ましくは80質量%以下、さらに好ましくは75質量%以下である。Bブロックの含有率は、ブロック共重合体全体100質量%中において、15質量%以上が好ましく、より好ましくは20質量%以上、さらに好ましくは25質量%以上であり、65質量%以下が好ましく、より好ましくは60質量%以下、さらに好ましくは55質量%以下である。AブロックおよびBブロックの含有率を、上記範囲内に調整することで、耐熱性、分散剤として使用した際の分散性能をバランスよく両立できる。 The content of the A block is preferably 35% by mass or more, more preferably 40% by mass or more, still more preferably 45% by mass or more, and preferably 85% by mass or less, in 100% by mass of the entire block copolymer. More preferably, it is 80 mass% or less, More preferably, it is 75 mass% or less. The content of the B block is preferably 15% by mass or more, more preferably 20% by mass or more, still more preferably 25% by mass or more, and preferably 65% by mass or less, in 100% by mass of the entire block copolymer. More preferably, it is 60 mass% or less, More preferably, it is 55 mass% or less. By adjusting the content ratios of the A block and the B block within the above ranges, the heat resistance and the dispersion performance when used as a dispersant can be balanced.
<2 ブロック共重合体の第一組成物>
 本発明の第一組成物は、前記ブロック共重合体を含有する。前記第一組成物は、前記ブロック共重合体以外の他の成分を含有する。前記他の成分としては、ブロック共重合体の製造方法に起因する不純物が挙げられる。例えば、ブロック共重合体の製造に、後述する4級化剤や、芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸よりなる群から選択される少なくとも1種のアルカリ金属塩を使用した場合、前記4級化剤に由来するハロゲン成分や、芳香族ジカルボン酸イミド等のアルカリ金属塩に由来するアルカリ金属成分が挙げられる。なお、第一組成物は、析出した塩(前記4級化剤に由来するハロゲン成分と、芳香族ジカルボン酸イミド等のアルカリ金属塩に由来するアルカリ金属成分との塩)などの不純物をろ過により除去することが好ましい。
<First composition of 2 block copolymer>
The first composition of the present invention contains the block copolymer. The first composition contains components other than the block copolymer. As said other component, the impurity resulting from the manufacturing method of a block copolymer is mentioned. For example, in the production of a block copolymer, at least one alkali selected from the group consisting of a quaternizing agent described later, aromatic dicarboxylic imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid is used. When a metal salt is used, examples include a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as an aromatic dicarboxylic acid imide. The first composition is prepared by filtering impurities such as precipitated salts (a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as aromatic dicarboxylic acid imide). It is preferable to remove.
 前記第一組成物に含まれるブロック共重合体の分子量は、ゲルパーミエーショングラフィー(以下「GPC」という)法により測定される。前記ブロック共重合体の重量平均分子量(Mw)は5000以上が好ましく、より好ましくは6000以上、さらに好ましくは7000以上であり、15000以下が好ましく、より好ましくは12000以下、さらに好ましくは10000以下である。重量平均分子量が上記範囲内にあれば、分散剤として使用した際の分散性能がより良好となる。 The molecular weight of the block copolymer contained in the first composition is measured by a gel permeation chromatography (hereinafter referred to as “GPC”) method. The block copolymer preferably has a weight average molecular weight (Mw) of 5000 or more, more preferably 6000 or more, further preferably 7000 or more, preferably 15000 or less, more preferably 12000 or less, and still more preferably 10,000 or less. . When the weight average molecular weight is within the above range, the dispersion performance when used as a dispersant becomes better.
 前記第一組成物に含まれるブロック共重合体の分子量分布(PDI)は、2.0以下であることが好ましく、1.6以下であることより好ましい。なお、本発明において、分子量分布(PDI)とは、(ブロック共重合体の重量平均分子量(Mw))/(ブロック共重合体の数平均分子量(Mn))によって求められるものである。PDIが小さいほど分子量分布の幅が狭い、分子量のそろった共重合体となり、その値が1.0のとき最も分子量分布の幅が狭い。ブロック共重合体の分子量分布(PDI)が、2.0を超えると、分子量の小さいものや、分子量の大きいものが含まれることになる。 The molecular weight distribution (PDI) of the block copolymer contained in the first composition is preferably 2.0 or less, and more preferably 1.6 or less. In the present invention, the molecular weight distribution (PDI) is determined by (weight average molecular weight (Mw) of block copolymer) / (number average molecular weight (Mn) of block copolymer). The smaller the PDI, the narrower the molecular weight distribution and the more uniform the copolymer. When the value is 1.0, the molecular weight distribution is the narrowest. When the molecular weight distribution (PDI) of the block copolymer exceeds 2.0, one having a low molecular weight or one having a high molecular weight is included.
 前記第一組成物のアミン価は、顔料への吸着性および顔料分散性の観点から、10mgKOH/g以上が好ましく、より好ましくは20mgKOH/g以上、さらに好ましくは30mgKOH/g以上であり、200mgKOH/g以下が好ましく、より好ましくは150mgKOH/g以下、さらに好ましくは100mgKOH/g以下である。 The amine value of the first composition is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, still more preferably 30 mgKOH / g or more, and 200 mgKOH / g from the viewpoint of the adsorptivity to the pigment and the pigment dispersibility. g or less is preferable, more preferably 150 mgKOH / g or less, and still more preferably 100 mgKOH / g or less.
 前記第一組成物の酸価は、5mgKOH/g以上が好ましく、より好ましくは10mgKOH/g以上、さらに好ましくは15mgKOH/g以上であり、50mgKOH/g以下が好ましく、より好ましくは40mgKOH/g以下、さらに好ましくは35mgKOH/g以下である。酸価をこの範囲にすることで、ブロック共重合体の顔料との親和性を損なうことなく、バインダー樹脂(アルカリ可溶性樹脂)と好適に作用することができる。 The acid value of the first composition is preferably 5 mgKOH / g or more, more preferably 10 mgKOH / g or more, further preferably 15 mgKOH / g or more, preferably 50 mgKOH / g or less, more preferably 40 mgKOH / g or less, More preferably, it is 35 mgKOH / g or less. By setting the acid value within this range, the binder resin (alkali-soluble resin) can be suitably acted on without impairing the affinity of the block copolymer with the pigment.
<3 ブロック共重合体の第二組成物>
 本発明の第二組成物は、前記第一組成物を水洗し、乾燥することで得られる。水洗、乾燥後の第二組成物は、塩(前記4級化剤に由来するハロゲン成分と、芳香族ジカルボン酸イミド等のアルカリ金属塩に由来するアルカリ金属成分との塩)の含有量が低減されている。なお、第二組成物についても、前記第一組成物と同様に、ブロック共重合体の製造方法に起因する不純物が含まれている。前記第一組成物とは、前記ブロック共重合体を含有する組成物であり、ブロック共重合体を合成した際の反応液も含まれる。
<Second composition of 3-block copolymer>
The second composition of the present invention is obtained by washing the first composition with water and drying. The second composition after washing and drying has a reduced content of salt (a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as an aromatic dicarboxylic acid imide). Has been. In addition, about the 2nd composition, the impurity resulting from the manufacturing method of a block copolymer is contained like the said 1st composition. The said 1st composition is a composition containing the said block copolymer, and the reaction liquid at the time of synthesize | combining a block copolymer is also contained.
 前記第二組成物に含まれるブロック共重合体は、一般式(1)で表される構造単位を有していてもよいし、有していなくてもよい。また、前記第二組成物は、ブロック共重合体以外の他の成分を含有する。前記他の成分としては、芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸、芳香族カルボン酸が挙げられる。これらの芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸は、アニオンであってもよいし、アルカリ金属塩であってもよい。 The block copolymer contained in the second composition may or may not have the structural unit represented by the general formula (1). Moreover, said 2nd composition contains other components other than a block copolymer. Examples of the other components include aromatic dicarboxylic imides, aromatic sulfonic acids, aromatic phosphonic acids, and aromatic carboxylic acids. These aromatic dicarboxylic imides, aromatic sulfonic acids, aromatic phosphonic acids and aromatic carboxylic acids may be anions or alkali metal salts.
 前記第二組成物に含まれるブロック共重合体の分子量は、GPC法により測定される。前記ブロック共重合体の重量平均分子量(Mw)は5000以上が好ましく、より好ましくは6000以上、さらに好ましくは7000以上であり、15000以下が好ましく、より好ましくは12000以下、さらに好ましくは10000以下である。重量平均分子量が上記範囲内にあれば、分散剤として使用した際の分散性能がより良好となる。 The molecular weight of the block copolymer contained in the second composition is measured by a GPC method. The block copolymer preferably has a weight average molecular weight (Mw) of 5000 or more, more preferably 6000 or more, further preferably 7000 or more, preferably 15000 or less, more preferably 12000 or less, and still more preferably 10,000 or less. . When the weight average molecular weight is within the above range, the dispersion performance when used as a dispersant becomes better.
 前記第二組成物に含まれるブロック共重合体の分子量分布(PDI)は、2.0以下であることが好ましく、1.6以下であることより好ましい。ブロック共重合体の分子量分布(PDI)が、2.0を超えると、分子量の小さいものや、分子量の大きいものが含まれることになる。 The molecular weight distribution (PDI) of the block copolymer contained in the second composition is preferably 2.0 or less, and more preferably 1.6 or less. When the molecular weight distribution (PDI) of the block copolymer exceeds 2.0, one having a low molecular weight or one having a high molecular weight is included.
 前記第二組成物のアミン価は、顔料への吸着性および顔料分散性の観点から、10mgKOH/g以上が好ましく、より好ましくは20mgKOH/g以上、さらに好ましくは30mgKOH/g以上であり、200mgKOH/g以下が好ましく、より好ましくは150mgKOH/g以下、さらに好ましくは100mgKOH/g以下である。 The amine value of the second composition is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, still more preferably 30 mgKOH / g or more, and 200 mgKOH / g from the viewpoint of the adsorptivity to the pigment and the pigment dispersibility. g or less is preferable, more preferably 150 mgKOH / g or less, and still more preferably 100 mgKOH / g or less.
 前記第二組成物の酸価は、5mgKOH/g以上が好ましく、より好ましくは10mgKOH/g以上、さらに好ましくは15mgKOH/g以上であり、50mgKOH/g以下が好ましく、より好ましくは40mgKOH/g以下、さらに好ましくは35mgKOH/g以下である。 The acid value of the second composition is preferably 5 mgKOH / g or more, more preferably 10 mgKOH / g or more, further preferably 15 mgKOH / g or more, preferably 50 mgKOH / g or less, more preferably 40 mgKOH / g or less, More preferably, it is 35 mgKOH / g or less.
 前記第二組成物は、ハロゲンアニオンの含有量が8000ppm以下であることが好ましく、より好ましくは6000ppm以下、さらに好ましくは4000ppm以下である。 The second composition preferably has a halogen anion content of 8000 ppm or less, more preferably 6000 ppm or less, and even more preferably 4000 ppm or less.
<4 ブロック共重合体の製造方法>
 本発明のブロック共重合体の製造方法は、酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、後述する一般式(2)で表される構造単位および後述する一般式(3)で表される構造単位を含むBブロックとを有するブロック共重合体の前駆体を準備する工程(A);前記工程(A)で得られたブロック共重合体の前駆体に、芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸よりなる群から選択される少なくとも1種のアルカリ金属塩を作用させ、ブロック共重合体を得る工程(B);を備えることを特徴とする。なお、本発明において「ブロック共重合体の前駆体」とは、アニオン交換前のブロック共重合体のことをいう。
<Method for producing 4 block copolymer>
The method for producing a block copolymer of the present invention comprises an A block containing a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the general formula (2) described later, and a general formula (3) described later. A step (A) of preparing a block copolymer precursor having a B block containing a structural unit represented by formula (1): an aromatic dicarboxylic acid as a precursor of the block copolymer obtained in the step (A); A step (B) of obtaining a block copolymer by reacting at least one alkali metal salt selected from the group consisting of imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid. And In the present invention, the “block copolymer precursor” refers to a block copolymer before anion exchange.
(4.1 工程(A))
 前記工程(A)では、ブロック共重合体の前駆体を準備する。前記ブロック共重合体の前駆体は、酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、一般式(2)で表される構造単位および一般式(3)で表される構造単位を含むBブロックとを有する。
(4.1 Step (A))
In the step (A), a block copolymer precursor is prepared. The block copolymer precursor includes an A block including a structural unit derived from a vinyl monomer having an acidic group, a structural unit represented by the general formula (2), and a structural unit represented by the general formula (3). B block including
Figure JPOXMLDOC01-appb-C000021
〔式(2)において、R21およびR22は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R21およびR22が互いに結合して環状構造を形成していてもよい。X2は2価の連結基を示す。R23は水素原子またはメチル基を示す。〕
Figure JPOXMLDOC01-appb-C000021
[In Formula (2), R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure. X 2 represents a divalent linking group. R 23 represents a hydrogen atom or a methyl group. ]
 式(2)中のR21~R23およびX2は、上記(Bブロック)の説明において記載したものと同様である。 R 21 to R 23 and X 2 in the formula (2) are the same as those described in the description of the above (B block).
Figure JPOXMLDOC01-appb-C000022
〔式(3)において、R31、R32およびR33は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R31、R32およびR33のうち2つ以上が互いに結合して環状構造を形成していてもよい。X3は2価の連結基を示す。R34は水素原子またはメチル基を示す。X-はハロゲンアニオンを示す。〕
Figure JPOXMLDOC01-appb-C000022
[In the formula (3), R 31 , R 32 and R 33 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. Two or more of R 31 , R 32 and R 33 may be bonded to each other to form a cyclic structure. X 3 represents a divalent linking group. R 34 represents a hydrogen atom or a methyl group. X represents a halogen anion. ]
 前記R31~R33で表される鎖状の炭化水素基には、直鎖状および分岐鎖状のいずれも含まれる。前記R31~R33で表される鎖状の炭化水素基が有する置換基としては、ハロゲン基、アルコキシ基、ベンゾイル基、ヒドロキシ基等が挙げられる。前記R31~R33で表される環状の炭化水素基が有する置換基としては、鎖状のアルキル基、ハロゲン基、アルコキシ基、ヒドロキシ基等が挙げられる。 The chain hydrocarbon group represented by R 31 to R 33 includes both linear and branched chains. Examples of the substituent that the chain hydrocarbon group represented by R 31 to R 33 has include a halogen group, an alkoxy group, a benzoyl group, and a hydroxy group. Examples of the substituent that the cyclic hydrocarbon group represented by R 31 to R 33 has include a chain alkyl group, a halogen group, an alkoxy group, and a hydroxy group.
 前記R31~R33で表される基としては、置換基を有していてもよい炭素数1~4のアルキル基、置換基を有していてもよい炭素数7~16のアラルキル基が好ましく、メチル基、エチル基、プロピル基、ベンジル基がより好ましい。 Examples of the group represented by R 31 to R 33 include an alkyl group having 1 to 4 carbon atoms which may have a substituent, and an aralkyl group having 7 to 16 carbon atoms which may have a substituent. A methyl group, an ethyl group, a propyl group, and a benzyl group are more preferable.
 前記R31~R33のうち2つ以上が互いに結合して形成する環状構造としては、例えば、5~7員環の含窒素複素単環またはこれらが2個縮合してなる縮合環が挙げられる。該含窒素複素環は芳香族性を有しないものが好ましく、飽和環がより好ましい。具体的には下記式(31-1)、(31-2)、(31-3)で表される構造が挙げられる。 Examples of the cyclic structure formed by bonding two or more of R 31 to R 33 to each other include a 5- to 7-membered nitrogen-containing heteromonocycle or a condensed ring formed by condensing two of these. . The nitrogen-containing heterocycle preferably has no aromaticity, and more preferably a saturated ring. Specific examples include structures represented by the following formulas (31-1), (31-2), and (31-3).
Figure JPOXMLDOC01-appb-C000023
〔一般式(31-1)、(31-2)、(31-3)において、R81は、R31~R33のいずれかである。R82は、炭素数1~6のアルキル基を示す。lは0~5の整数を表す。mは0~4の整数を表す。nは0~4の整数を表す。lが2~5、mが2~4、nが2~4の場合、複数存在するR82は、それぞれ同一でも異なっていてもよい。〕
Figure JPOXMLDOC01-appb-C000023
[In the general formulas (31-1), (31-2), and (31-3), R 81 is any one of R 31 to R 33 . R 82 represents an alkyl group having 1 to 6 carbon atoms. l represents an integer of 0 to 5. m represents an integer of 0 to 4. n represents an integer of 0 to 4. When l is 2 to 5, m is 2 to 4, and n is 2 to 4, a plurality of R 82 may be the same or different. ]
 上記一般式(3)において、2価の連結基X3としては、例えば、メチレン基、炭素数2~10のアルキレン基、アリーレン基、-CONH-R35-基、-COO-R36-基〔ただし、R35およびR36は単結合、メチレン基、炭素数2~10のアルキレン基、または炭素数2~10のエーテル基(アルキルオキシアルキル基)である〕等が挙げられ、好ましくは-COO-R36-基であり、-COO-R37-基〔ただし、R37はメチレン基、炭素数2~4のアルキレン基〕がより好ましい。 In the general formula (3), examples of the divalent linking group X 3 include a methylene group, an alkylene group having 2 to 10 carbon atoms, an arylene group, a —CONH—R 35 — group, a —COO—R 36 — group. [Wherein R 35 and R 36 are a single bond, a methylene group, an alkylene group having 2 to 10 carbon atoms, or an ether group (alkyloxyalkyl group) having 2 to 10 carbon atoms]. A COO—R 36 — group, more preferably a —COO—R 37 — group (wherein R 37 is a methylene group, an alkylene group having 2 to 4 carbon atoms).
 X-としては、塩化物イオン、臭化物イオン、ヨウ化物イオン等のハロゲンアニオンが挙げられ、好ましくは塩化物イオンである。 Examples of X include halogen anions such as chloride ion, bromide ion and iodide ion, and chloride ion is preferable.
(4.1.1 Aブロック)
 前記工程(A)において、Aブロックは、例えば、酸性基を有するビニルモノマーを含有するモノマー組成物を重合することで得られる。
(4.1.1 A block)
In the step (A), the A block can be obtained, for example, by polymerizing a monomer composition containing a vinyl monomer having an acidic group.
 前記工程(A)で使用する酸性基を有するビニルモノマーとしては、上述したものが使用でき、カルボキシ基を有するビニルモノマー、スルホン酸基を有するビニルモノマー、またはリン酸基を有するビニルモノマーから選択される少なくとも1種が好ましい。また、Aブロック用のモノマー組成物には、酸性基を有するビニルモノマーに加えて、上述したAブロックの他の構造単位を形成し得るビニルモノマーを配合してもよい。 As the vinyl monomer having an acidic group used in the step (A), those described above can be used, and are selected from a vinyl monomer having a carboxy group, a vinyl monomer having a sulfonic acid group, or a vinyl monomer having a phosphate group. At least one of these is preferred. Moreover, in addition to the vinyl monomer which has an acidic group, you may mix | blend the vinyl monomer which can form the other structural unit of A block mentioned above with the monomer composition for A block.
(4.1.2 Bブロック)
 前記工程(A)において、Bブロックは、一般式(2)で表される構造単位を形成し得るビニルモノマーおよび一般式(3)で表される構造単位を形成し得るビニルモノマーを含有するモノマー組成物を重合する方法;一般式(2)で表される構造単位を形成し得るビニルモノマーを含有するモノマー組成物を重合した後、得られた重合物中の一般式(2)で表される構造単位の一部の3級アミン構造を4級化する方法が挙げられる。
(4.1.2 B block)
In the step (A), the B block is a monomer containing a vinyl monomer that can form the structural unit represented by the general formula (2) and a vinyl monomer that can form the structural unit represented by the general formula (3). A method of polymerizing the composition; after polymerizing a monomer composition containing a vinyl monomer capable of forming the structural unit represented by the general formula (2), the polymer is represented by the general formula (2) in the obtained polymer. And a method of quaternizing a tertiary amine structure of a part of the structural unit.
 前記一般式(2)で表される構造単位を形成し得るビニルモノマーとしては、特に限定されないが、例えば、ジメチルアミノエチル(メタ)アクレート、ジメチルアミノプロピル(メタ)アクレート、ジメチルアミノブチル(メタ)アクリレート、ジエチルアミノエチル(メタ)アクレート、ジエチルアミノプロピル(メタ)アクリレート、ジエチルアミノブチル(メタ)アクレート等が挙げられる。前記一般式(2)で表される構造単位を形成し得るビニルモノマーは単独で使用してもよいし、2種以上を併用してもよい。 Although it does not specifically limit as a vinyl monomer which can form the structural unit represented by the said General formula (2), For example, dimethylaminoethyl (meth) acrylate, dimethylaminopropyl (meth) acrylate, dimethylaminobutyl (meth) Examples include acrylate, diethylaminoethyl (meth) acrylate, diethylaminopropyl (meth) acrylate, diethylaminobutyl (meth) acrylate, and the like. The vinyl monomer that can form the structural unit represented by the general formula (2) may be used alone or in combination of two or more.
 前記一般式(3)で表される構造単位を形成し得るビニルモノマーとしては、特に限定されないが、例えば、(メタ)アクリロイルオキシエチルトリメチルアンモニウムクロリド、(メタ)アクリロイルオキシプロピルトリメチルアンモニウムクロリド、(メタ)アクリロイルオキシブチルトリメチルアンモニウムクロリド、(メタ)アクリロイルオキシエチルベンジルジメチルアンモニウムクロリド、(メタ)アクリロイルオキシプロピルベンジルジメチルアンモニウムクロリド、(メタ)アクリロイルオキシブチルベンジルジメチルアンモニウムクロリド、(メタ)アクリロイルオキシエチルベンジルジエチルアンモニウムクロリド、(メタ)アクリロイルオキシプロピルベンジルジエチルアンモニウムクロリド、(メタ)アクリロイルオキシブチルベンジルジエチルアンモニウムクロリド;(メタ)アクリロイルオキシエチルトリメチルアンモニウムブロミド、(メタ)アクリロイルオキシプロピルトリメチルアンモニウムブロミド、(メタ)アクリロイルオキシブチルトリメチルアンモニウムブロミド、(メタ)アクリロイルオキシエチルベンジルジメチルアンモニウムブロミド、(メタ)アクリロイルオキシプロピルベンジルジメチルアンモニウムブロミド、(メタ)アクリロイルオキシブチルベンジルジメチルアンモニウムブロミド、(メタ)アクリロイルオキシエチルベンジルジエチルアンモニウムブロミド、(メタ)アクリロイルオキシプロピルベンジルジエチルアンモニウムブロミド、(メタ)アクリロイルオキシブチルベンジルジエチルアンモニウムブロミド;(メタ)アクリロイルオキシエチルトリメチルアンモニウムヨージド、(メタ)アクリロイルオキシプロピルトリメチルアンモニウムヨージド、(メタ)アクリロイルオキシブチルトリメチルアンモニウムヨージド、(メタ)アクリロイルオキシエチルベンジルジメチルアンモニウムヨージド、(メタ)アクリロイルオキシプロピルベンジルジメチルアンモニウムヨージド、(メタ)アクリロイルオキシブチルベンジルジメチルアンモニウムヨージド、(メタ)アクリロイルオキシエチルベンジルジエチルアンモニウムヨージド、(メタ)アクリロイルオキシプロピルベンジルジエチルアンモニウムヨージド、(メタ)アクリロイルオキシブチルベンジルジエチルアンモニウムヨージド;(メタ)アクリロイルオキシエチルトリメチルアンモニウムフロリド、(メタ)アクリロイルオキシプロピルトリメチルアンモニウムフロリド、(メタ)アクリロイルオキシブチルトリメチルアンモニウムフロリド、(メタ)アクリロイルオキシエチルベンジルジメチルアンモニウムフロリド、(メタ)アクリロイルオキシプロピルベンジルジメチルアンモニウムフロリド、(メタ)アクリロイルオキシブチルベンジルジメチルアンモニウムフロリド、(メタ)アクリロイルオキシエチルベンジルジエチルアンモニウムフロリド、(メタ)アクリロイルオキシプロピルベンジルジエチルアンモニウムフロリド、(メタ)アクリロイルオキシブチルベンジルジエチルアンモニウムフロリドが挙げられる。前記一般式(3)で表される構造単位を形成し得るビニルモノマーは単独で使用してもよいし、2種以上を併用してもよい。 The vinyl monomer that can form the structural unit represented by the general formula (3) is not particularly limited. For example, (meth) acryloyloxyethyltrimethylammonium chloride, (meth) acryloyloxypropyltrimethylammonium chloride, (meta ) Acryloyloxybutyltrimethylammonium chloride, (meth) acryloyloxyethylbenzyldimethylammonium chloride, (meth) acryloyloxypropylbenzyldimethylammonium chloride, (meth) acryloyloxybutylbenzyldimethylammonium chloride, (meth) acryloyloxyethylbenzyldiethylammonium chloride Chloride, (meth) acryloyloxypropylbenzyldiethylammonium chloride, (meth) acryloyl (Meth) acryloyloxyethyltrimethylammonium bromide, (meth) acryloyloxypropyltrimethylammonium bromide, (meth) acryloyloxybutyltrimethylammonium bromide, (meth) acryloyloxyethylbenzyldimethylammonium bromide, (meta) ) Acryloyloxypropylbenzyldimethylammonium bromide, (meth) acryloyloxybutylbenzyldimethylammonium bromide, (meth) acryloyloxyethylbenzyldiethylammonium bromide, (meth) acryloyloxypropylbenzyldiethylammonium bromide, (meth) acryloyloxybutylbenzyldiethyl Ammonium bromi ; (Meth) acryloyloxyethyltrimethylammonium iodide, (meth) acryloyloxypropyltrimethylammonium iodide, (meth) acryloyloxybutyltrimethylammonium iodide, (meth) acryloyloxyethylbenzyldimethylammonium iodide, (meth) acryloyl Oxypropylbenzyldimethylammonium iodide, (meth) acryloyloxybutylbenzyldimethylammonium iodide, (meth) acryloyloxyethylbenzyldiethylammonium iodide, (meth) acryloyloxypropylbenzyldiethylammonium iodide, (meth) acryloyloxybutyl Benzyldiethylammonium iodide; (meth) acryloyloxyethyltrimethylan Monium fluoride, (meth) acryloyloxypropyltrimethylammonium fluoride, (meth) acryloyloxybutyltrimethylammonium fluoride, (meth) acryloyloxyethylbenzyldimethylammonium fluoride, (meth) acryloyloxypropylbenzyldimethylammonium fluoride, (Meth) acryloyloxybutylbenzyldimethylammonium fluoride, (meth) acryloyloxyethylbenzyldiethylammonium fluoride, (meth) acryloyloxypropylbenzyldiethylammonium fluoride, (meth) acryloyloxybutylbenzyldiethylammonium fluoride . The vinyl monomer capable of forming the structural unit represented by the general formula (3) may be used alone or in combination of two or more.
 また、一般式(2)で表される構造単位の3級アミン構造を4級化する場合、4級化剤としては、塩化メチル、塩化エチル、臭化メチル、ヨウ化メチル等のハロゲン化アルキル;塩化ベンジル、臭化ベンジル、ヨウ化ベンジル等のハロゲン化アラルキルが挙げられる。これらの中でも、好ましくは塩化ベンジル、臭化ベンジル、ヨウ化ベンジル等のハロゲン化アラルキルであり、より好ましくは塩化ベンジルである。4級化後の構造には、4級化剤に由来するアルキル基、アラルキル基が導入される。よって、4級化により導入されたアルキル基、アラルキル基の量を測定することで、一般式(3)で表される構造単位の量を推定することができる。 In addition, when the tertiary amine structure of the structural unit represented by the general formula (2) is quaternized, the quaternizing agent includes alkyl halides such as methyl chloride, ethyl chloride, methyl bromide, methyl iodide, etc. An aralkyl halide such as benzyl chloride, benzyl bromide or benzyl iodide; Among these, aralkyl halides such as benzyl chloride, benzyl bromide and benzyl iodide are preferable, and benzyl chloride is more preferable. In the structure after quaternization, an alkyl group and an aralkyl group derived from a quaternizing agent are introduced. Therefore, the amount of the structural unit represented by the general formula (3) can be estimated by measuring the amount of the alkyl group and aralkyl group introduced by quaternization.
(4.1.3 方法)
 前記工程(A)としては、Aブロックを先に製造し、AブロックにBブロックのモノマーを重合する方法;Bブロックを先に製造し、BブロックにAブロックのモノマーを重合する方法;AブロックとBブロックとを別々に製造した後、AブロックとBブロックとをカップリングする方法;Aブロックを先に製造し、Aブロックに一般式(2)で表される構造単位を形成し得るビニルモノマーを含有するモノマー組成物を重合し、得られた重合物中の一般式(2)で表される構造単位の一部の3級アミン構造を4級化する方法;一般式(2)で表される構造単位を形成し得るビニルモノマーを含有するモノマー組成物を重合し、この重合物にAブロックのモノマーを重合し、得られた重合物中の一般式(2)で表される構造単位の一部の3級アミン構造を4級化する方法;Aブロックと一般式(2)で表される構造単位を有するブロックとを別々に製造し、これらのブロックをカップリングした後、得られた重合物中の一般式(2)で表される構造単位の一部の3級アミン構造を4級化する方法;が挙げられる。
(4.1.3 Method)
As the step (A), a method of first producing an A block and polymerizing a monomer of a B block into the A block; a method of producing a B block first and polymerizing a monomer of the A block into the B block; A method in which the A block and the B block are coupled after the A block and the B block are manufactured separately; the vinyl that can form the structural unit represented by the general formula (2) in the A block by first manufacturing the A block A method of polymerizing a monomer composition containing a monomer and quaternizing a tertiary amine structure of a part of the structural unit represented by the general formula (2) in the obtained polymer; A monomer composition containing a vinyl monomer capable of forming the structural unit represented is polymerized, and a monomer of an A block is polymerized to this polymer, and the structure represented by the general formula (2) in the obtained polymer Part 3 of the unit A method for quaternizing a min structure; A block and a block having a structural unit represented by the general formula (2) are separately produced, and after coupling these blocks, And a method of quaternizing part of the tertiary amine structure of the structural unit represented by the formula (2).
(4.1.4 リビングラジカル重合)
 重合法は特に限定されないが、リビングラジカル重合が好ましい。すなわち、前記第一ブロック共重合体としては、リビングラジカル重合を用いて重合されたものが好ましい。従来のラジカル重合法は、開始反応、成長反応だけでなく、停止反応、連鎖移動反応により成長末端の失活が起こり、様々な分子量、不均一な組成のポリマーの混合物となり易い傾向がある。前記リビングラジカル重合法は、従来のラジカル重合法の簡便性と汎用性を保ちながら、停止反応や、連鎖移動が起こりにくく、成長末端が失活することなく成長するため、分子量分布の精密制御、均一な組成のポリマーの製造が容易である点で好ましい。
(4.1.4 Living radical polymerization)
The polymerization method is not particularly limited, but living radical polymerization is preferred. That is, the first block copolymer is preferably polymerized using living radical polymerization. In the conventional radical polymerization method, not only the initiation reaction and the growth reaction, but also the termination of the growth end occurs due to the termination reaction and the chain transfer reaction, and the polymer tends to be a mixture of polymers having various molecular weights and heterogeneous compositions. While the living radical polymerization method maintains the simplicity and versatility of the conventional radical polymerization method, the termination reaction and chain transfer are unlikely to occur, and the growth end grows without being deactivated. This is preferable in that it is easy to produce a polymer having a uniform composition.
 リビングラジカル重合法には、重合成長末端を安定化させる手法の違いにより、遷移金属触媒を用いる方法(ATRP法);硫黄系の可逆的連鎖移動剤を用いる方法(RAFT法);有機テルル化合物を用いる方法(TERP法)等がある。ATRP法は、アミン系錯体を使用するため、酸性基を有するビニルモノマーの酸性基を保護しなければ、使用できない場合がある。RAFT法は、多種のモノマーを使用した場合、低分子量分布になりづらく、かつ硫黄臭や着色等の不具合がある場合がある。これらの方法の中でも、使用できるモノマーの多様性、高分子領域での分子量制御、均一な組成、あるいは着色の観点から、TERP法を用いることが好ましい。 In the living radical polymerization method, a method using a transition metal catalyst (ATRP method); a method using a sulfur-based reversible chain transfer agent (RAFT method); There is a method to be used (TERP method). Since the ATRP method uses an amine-based complex, it may not be used unless the acidic group of the vinyl monomer having an acidic group is protected. In the RAFT method, when various monomers are used, it is difficult to obtain a low molecular weight distribution, and there may be a problem such as sulfur odor or coloring. Among these methods, the TERP method is preferably used from the viewpoints of diversity of usable monomers, molecular weight control in the polymer region, uniform composition, or coloring.
 TERP法とは、有機テルル化合物を重合開始剤として用い、ラジカル重合性化合物(ビニルモノマー)を重合させる方法であり、例えば、国際公開第2004/14848号、国際公開第2004/14962号、国際公開第2004/072126号、および、国際公開第2004/096870号に記載された方法である。 The TERP method is a method of polymerizing a radical polymerizable compound (vinyl monomer) using an organic tellurium compound as a polymerization initiator. For example, International Publication No. 2004/14848, International Publication No. 2004/14962, International Publication No. 2004/072126, and WO 2004/096870.
 TERP法の具体的な重合法としては、下記(a)~(d)が挙げられる。
 (a)ビニルモノマーを、一般式(4)で表される有機テルル化合物を用いて重合する方法。
 (b)ビニルモノマーを、一般式(4)で表される有機テルル化合物とアゾ系重合開始剤との混合物を用いて重合する方法。
 (c)ビニルモノマーを、一般式(4)で表される有機テルル化合物と一般式(5)で表される有機ジテルル化合物との混合物を用いて重合する方法。
 (d)ビニルモノマーを、一般式(4)で表される有機テルル化合物とアゾ系重合開始剤と一般式(5)で表される有機ジテルル化合物との混合物を用いて重合する方法。
Specific polymerization methods of the TERP method include the following (a) to (d).
(A) A method in which a vinyl monomer is polymerized using an organic tellurium compound represented by the general formula (4).
(B) A method in which a vinyl monomer is polymerized using a mixture of an organic tellurium compound represented by the general formula (4) and an azo polymerization initiator.
(C) A method of polymerizing a vinyl monomer using a mixture of an organic tellurium compound represented by the general formula (4) and an organic ditellurium compound represented by the general formula (5).
(D) A method of polymerizing a vinyl monomer using a mixture of an organic tellurium compound represented by the general formula (4), an azo polymerization initiator, and an organic ditellurium compound represented by the general formula (5).
Figure JPOXMLDOC01-appb-C000024
〔一般式(4)において、R41は、炭素数1~8のアルキル基、アリール基または芳香族ヘテロ環基を示す。R42およびR43は、それぞれ独立に、水素原子または炭素数1~8のアルキル基を示す。R44は、炭素数1~8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基またはプロパルギル基を示す。〕
Figure JPOXMLDOC01-appb-C000024
[In the general formula (4), R 41 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, or an aromatic heterocyclic group. R 42 and R 43 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. R 44 represents an alkyl group having 1 to 8 carbon atoms, an aryl group, a substituted aryl group, an aromatic heterocyclic group, an alkoxy group, an acyl group, an amide group, an oxycarbonyl group, a cyano group, an allyl group or a propargyl group. ]
Figure JPOXMLDOC01-appb-C000025
〔一般式(5)において、R41は、炭素数1~8のアルキル基、アリール基または芳香族ヘテロ環基を示す。〕
Figure JPOXMLDOC01-appb-C000025
[In the general formula (5), R 41 represents an alkyl group having 1 to 8 carbon atoms, an aryl group or an aromatic heterocyclic group. ]
 R41で表される基は、炭素数1~8のアルキル基、アリール基または芳香族ヘテロ環基であり、具体的には次の通りである。
 炭素数1~8のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等の直鎖または分岐鎖アルキル基や、シクロヘキシル基等の環状アルキル基を挙げることができる。好ましくは炭素数1~4の直鎖または分岐鎖アルキル基であり、さらに好ましくはメチル基またはエチル基である。
 アリール基としては、フェニル基、ナフチル基等を挙げることができる。
 芳香族ヘテロ環基としては、ピリジル基、フリル基、チエニル基等を挙げることができ
る。
The group represented by R 41 is an alkyl group having 1 to 8 carbon atoms, an aryl group, or an aromatic heterocyclic group, and is specifically as follows.
Examples of the alkyl group having 1 to 8 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, and heptyl. And a linear or branched alkyl group such as a octyl group and a cyclic alkyl group such as a cyclohexyl group. A linear or branched alkyl group having 1 to 4 carbon atoms is preferable, and a methyl group or ethyl group is more preferable.
Examples of the aryl group include a phenyl group and a naphthyl group.
Examples of the aromatic heterocyclic group include a pyridyl group, a furyl group, and a thienyl group.
 R42およびR43で表される基は、それぞれ独立に水素原子または炭素数1~8のアルキル基であり、各基は、具体的には次の通りである。
 炭素数1~8のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等の直鎖または分岐鎖アルキル基や、シクロヘキシル基等の環状アルキル基等を挙げることができる。好ましくは炭素数1~4の直鎖または分岐鎖アルキル基であり、さらに好ましくはメチル基またはエチル基である。
The groups represented by R 42 and R 43 are each independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and each group is specifically as follows.
Examples of the alkyl group having 1 to 8 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, and heptyl. And a linear or branched alkyl group such as a octyl group and a cyclic alkyl group such as a cyclohexyl group. A linear or branched alkyl group having 1 to 4 carbon atoms is preferable, and a methyl group or ethyl group is more preferable.
 R44で表される基は、炭素数1~8のアルキル基、アリール基、置換アリール基、芳香族ヘテロ環基、アルコキシ基、アシル基、アミド基、オキシカルボニル基、シアノ基、アリル基またはプロパルギル基であり、具体的には次の通りである。
 炭素数1~8のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基等の直鎖または分岐鎖アルキル基、シクロヘキシル基等の環状アルキル基等を挙げることができる。好ましくは炭素数1~4の直鎖または分岐鎖アルキル基であり、さらに好ましくはメチル基またはエチル基である。
 アリール基としては、フェニル基、ナフチル基等を挙げることができる。好ましくはフェニル基である。
 置換アリール基としては、置換基を有しているフェニル基、置換基を有しているナフチル基等を挙げることができる。置換基を有しているアリール基の置換基としては、例えば、ハロゲン原子、ヒドロキシ基、アルコキシ基、アミノ基、ニトロ基、シアノ基、-COR441で示されるカルボニル含有基(R441は炭素数1~8のアルキル基、アリール基、炭素数1~8のアルコキシ基またはアリーロキシ基)、スルホニル基、トリフルオロメチル基等を挙げることができる。また、これらの置換基は、1個または2個置換しているのがよい。
 芳香族ヘテロ環基としては、ピリジル基、フリル基、チエニル基等を挙げることができる。
 アルコキシ基としては、炭素数1~8のアルキル基が酸素原子に結合した基が好ましく、例えば、メトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、n-ブトキシ基、sec-ブトキシ基、tet-ブトキシ基、ペンチロキシ基、ヘキシロキシ基、ヘプチロキシ基、オクチロキシ基等を挙げることができる。
 アシル基としては、アセチル基、プロピオニル基、ベンゾイル基等を挙げることができる。
 アミド基としては、-CONR44214422(R4421、R4422は、それぞれ独立に水素原子、炭素数1~8のアルキル基またはアリール基)を挙げることがきる。
 オキシカルボニル基としては、-COOR443(R443は水素原子、炭素数1~8のアルキル基またはアリール基)で表される基が好ましく、例えばカルボキシル基、メトキシカルボニル基、エトキシカルボニル基、プロポキシカルボニル基、n-ブトキシカルボニル基、sec-ブトキシカルボニル基、ter-ブトキシカルボニル基、n-ペントキシカルボニル基、フェノキシカルボニル基等を挙げることができる。好ましいオキシカルボニル基としては、メトキシカルボニル基、エトキシカルボニル基が挙げられる。
 アリル基としては、-CR44414442-CR4443=CR44444445(R4441、R4442は、それぞれ独立に水素原子または炭素数1~8のアルキル基、R4443、R4444、R4445は、それぞれ独立に水素原子、炭素数1~8のアルキル基またはアリール基であり、それぞれの置換基が環状構造で繋がっていてもよい)を挙げることができる。
 プロパルギル基としては、-CR44514452-C≡CR4453(R4451、R4452は、水素原子または炭素数1~8のアルキル基、R4453は、水素原子、炭素数1~8のアルキル基、アリール基またはシリル基)を挙げることができる。
The group represented by R 44 is a C 1-8 alkyl group, aryl group, substituted aryl group, aromatic heterocyclic group, alkoxy group, acyl group, amide group, oxycarbonyl group, cyano group, allyl group or A propargyl group, specifically as follows.
Examples of the alkyl group having 1 to 8 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, pentyl, hexyl, and heptyl. And a linear or branched alkyl group such as an octyl group, a cyclic alkyl group such as a cyclohexyl group, and the like. A linear or branched alkyl group having 1 to 4 carbon atoms is preferable, and a methyl group or ethyl group is more preferable.
Examples of the aryl group include a phenyl group and a naphthyl group. A phenyl group is preferred.
Examples of the substituted aryl group include a phenyl group having a substituent and a naphthyl group having a substituent. Examples of the substituent of the aryl group having a substituent include a halogen atom, a hydroxy group, an alkoxy group, an amino group, a nitro group, a cyano group, and a carbonyl-containing group represented by —COR 441 (R 441 is a carbon number) 1-8 alkyl groups, aryl groups, alkoxy groups having 1 to 8 carbon atoms or aryloxy groups), sulfonyl groups, trifluoromethyl groups, and the like. These substituents are preferably substituted by 1 or 2 substituents.
Examples of the aromatic heterocyclic group include a pyridyl group, a furyl group, and a thienyl group.
The alkoxy group is preferably a group in which an alkyl group having 1 to 8 carbon atoms is bonded to an oxygen atom. For example, a methoxy group, ethoxy group, propoxy group, isopropoxy group, n-butoxy group, sec-butoxy group, tet- A butoxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, and the like can be given.
Examples of the acyl group include an acetyl group, a propionyl group, and a benzoyl group.
Examples of the amide group include —CONR 4421 R 4422 (R 4421 and R 4422 are each independently a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, or an aryl group).
As the oxycarbonyl group, a group represented by —COOR 443 (R 443 is a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group) is preferable, and examples thereof include a carboxyl group, a methoxycarbonyl group, an ethoxycarbonyl group, and a propoxycarbonyl group. Group, n-butoxycarbonyl group, sec-butoxycarbonyl group, ter-butoxycarbonyl group, n-pentoxycarbonyl group, phenoxycarbonyl group and the like. Preferred oxycarbonyl groups include methoxycarbonyl group and ethoxycarbonyl group.
As the allyl group, —CR 4441 R 4442 —CR 4443 = CR 4444 R 4445 (R 4441 and R 4442 are each independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, R 4443 , R 4444 and R 4445 are Each independently represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms or an aryl group, and each substituent may be linked by a cyclic structure.
As the propargyl group, —CR 4451 R 4452 —C≡CR 4453 (R 4451 and R 4452 are a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, R 4453 is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms) , Aryl group or silyl group).
 一般式(4)で表される有機テルル化合物は、具体的には(メチルテラニルメチル)ベンゼン、(メチルテラニルメチル)ナフタレン、エチル-2-メチル-2-メチルテラニル-プロピオネート、エチル-2-メチル-2-n-ブチルテラニル-プロピオネート、(2-トリメチルシロキシエチル)-2-メチル-2-メチルテラニル-プロピネート、(2-ヒドロキシエチル)-2-メチル-2-メチルテラニル-プロピネートまたは(3-トリメチルシリルプロパルギル)-2-メチル-2-メチルテラニル-プロピネート等、国際公開第2004/14848号、国際公開第2004/14962号、国際公開第2004/072126号、および国際公開第2004/096870号に記載された有機テルル化合物の全てを例示することができる。 Specific examples of the organic tellurium compound represented by the general formula (4) include (methylterranylmethyl) benzene, (methylterranylmethyl) naphthalene, ethyl-2-methyl-2-methylterranyl-propionate, ethyl-2- Methyl-2-n-butylterranyl-propionate, (2-trimethylsiloxyethyl) -2-methyl-2-methylterranyl-propionate, (2-hydroxyethyl) -2-methyl-2-methylterranyl-propionate or (3-trimethylsilylpropargyl ) -2-methyl-2-methylterranyl-propinate, etc. Organics described in WO 2004/14848, WO 2004/14962, WO 2004/072126, and WO 2004/096870 Illustrate all tellurium compounds Rukoto can.
 一般式(5)で表される有機ジテルル化合物は、具体的には、ジメチルジテルリド、ジエチルジテルリド、ジ-n-プロピルジテルリド、ジイソプロピルジテルリド、ジシクロプロピルジテルリド、ジ-n-ブチルジテルリド、ジ-s-ブチルジテルリド、ジ-t-ブチルジテルリド、ジシクロブチルジテルリド、ジフェニルジテルリド、ビス-(p-メトキシフェニル)ジテルリド、ビス-(p-アミノフェニル)ジテルリド、ビス-(p-ニトロフェニル)ジテルリド、ビス-(p-シアノフェニル)ジテルリド、ビス-(p-スルホニルフェニル)ジテルリド、ジナフチルジテルリドまたはジピリジルジテルリド等を例示することができる。 Specific examples of the organic ditellurium compound represented by the general formula (5) include dimethyl ditelluride, diethyl ditelluride, di-n-propyl ditelluride, diisopropyl ditelluride, dicyclopropyl ditelluride, Di-n-butylditelluride, di-s-butylditelluride, di-t-butylditelluride, dicyclobutylditelluride, diphenylditelluride, bis- (p-methoxyphenyl) ditelluride, bis- (p-aminophenyl) ditelluride, Examples thereof include bis- (p-nitrophenyl) ditelluride, bis- (p-cyanophenyl) ditelluride, bis- (p-sulfonylphenyl) ditelluride, dinaphthyl ditelluride or dipyridyl ditelluride.
 アゾ系重合開始剤は、通常のラジカル重合で使用するアゾ系重合開始剤であれば特に制限なく使用することができる。例えば2,2’-アゾビス(イソブチロニトリル)(AIBN)、2,2’-アゾビス(2-メチルブチロニトリル)(AMBN)、2,2’-アゾビス(2,4-ジメチルバレロニトリル)(ADVN)、1,1’-アゾビス(1-シクロヘキサンカルボニトリル)(ACHN)、ジメチル-2,2’-アゾビスイソブチレート(MAIB)、4,4’-アゾビス(4-シアノバレリアン酸)(ACVA)、1,1’-アゾビス(1-アセトキシ-1-フェニルエタン)、2,2’-アゾビス(2-メチルブチルアミド)、2,2’-アゾビス(4-メトキシ-2,4-ジメチルバレロニトリル)(V-70)、2,2’-アゾビス(2-メチルアミジノプロパン)二塩酸塩、2,2’-アゾビス[2-(2-イミダゾリン-2-イル)プロパン]、2,2’-アゾビス[2-メチル-N-(2-ヒドロキシエチル)プロピオンアミド]、2,2’-アゾビス(2,4,4-トリメチルペンタン)、2-シアノ-2-プロピルアゾホルムアミド、2,2’-アゾビス(N-ブチル-2-メチルプロピオンアミド)、または2,2’-アゾビス(N-シクロヘキシル-2-メチルプロピオンアミド)等を例示することができる。 The azo polymerization initiator can be used without particular limitation as long as it is an azo polymerization initiator used in normal radical polymerization. For example, 2,2′-azobis (isobutyronitrile) (AIBN), 2,2′-azobis (2-methylbutyronitrile) (AMBN), 2,2′-azobis (2,4-dimethylvaleronitrile) (ADVN), 1,1′-azobis (1-cyclohexanecarbonitrile) (ACHN), dimethyl-2,2′-azobisisobutyrate (MAIB), 4,4′-azobis (4-cyanovaleric acid) (ACVA), 1,1′-azobis (1-acetoxy-1-phenylethane), 2,2′-azobis (2-methylbutyramide), 2,2′-azobis (4-methoxy-2,4- Dimethylvaleronitrile) (V-70), 2,2′-azobis (2-methylamidinopropane) dihydrochloride, 2,2′-azobis [2- (2-imidazolin-2-yl) propyl Pan], 2,2′-azobis [2-methyl-N- (2-hydroxyethyl) propionamide], 2,2′-azobis (2,4,4-trimethylpentane), 2-cyano-2-propyl Examples include azoformamide, 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide), and the like.
 重合工程は、不活性ガスで置換した容器で、ビニルモノマーと一般式(4)の有機テルル化合物とに、ビニルモノマーの種類に応じて反応促進、分子量および分子量分布の制御等の目的で、さらにアゾ系重合開始剤および/または一般式(5)の有機ジテルル化合物を混合する。このとき、不活性ガスとしては、窒素、アルゴン、ヘリウム等を挙げることができる。好ましくは、アルゴン、窒素が良い。 The polymerization step is a container substituted with an inert gas. For the purpose of promoting reaction, controlling molecular weight and molecular weight distribution, etc., depending on the type of vinyl monomer, the vinyl monomer and the organic tellurium compound of the general formula (4). An azo polymerization initiator and / or an organic ditellurium compound of the general formula (5) is mixed. At this time, examples of the inert gas include nitrogen, argon, helium and the like. Argon and nitrogen are preferable.
 前記(a)、(b)、(c)および(d)の重合法において、ビニルモノマーの使用量は、目的とする共重合体の物性により適宜調節すればよいが、通常、一般式(4)の有機テルル化合物1molに対しビニルモノマーを5~10000molとすることが好ましい。 In the polymerization methods (a), (b), (c) and (d), the amount of vinyl monomer used may be appropriately adjusted depending on the physical properties of the target copolymer. The vinyl monomer is preferably 5 to 10,000 mol per mol of the organic tellurium compound.
 前記(b)の重合法において、一般式(4)の有機テルル化合物とアゾ系重合開始剤とを併用する場合、アゾ系重合開始剤の使用量としては、通常、一般式(4)の有機テルル化合物1molに対してアゾ系重合開始剤を0.01mol~10molとすることが好ましい。 In the polymerization method (b), when the organic tellurium compound of the general formula (4) and the azo polymerization initiator are used in combination, the amount of the azo polymerization initiator used is usually an organic compound of the general formula (4). The azo polymerization initiator is preferably 0.01 mol to 10 mol with respect to 1 mol of the tellurium compound.
 前記(c)の重合法において、一般式(4)の有機テルル化合物と一般式(5)の有機ジテルル化合物とを併用する場合、一般式(5)の有機ジテルル化合物の使用量としては、通常、一般式(4)の有機テルル化合物1molに対して一般式(5)の有機ジテルル化合物を0.01mol~100molとすることが好ましい。 In the polymerization method (c), when the organic tellurium compound of the general formula (4) and the organic ditellurium compound of the general formula (5) are used in combination, The organic ditellurium compound of the general formula (5) is preferably 0.01 mol to 100 mol per 1 mol of the organic tellurium compound of the general formula (4).
 前記(d)の重合法において、一般式(4)の有機テルル化合物と一般式(5)の有機ジテルル化合物とアゾ系重合開始剤とを併用する場合、アゾ系重合開始剤の使用量としては、通常、一般式(4)の有機テルル化合物と一般式(5)の有機ジテルル化合物の合計1molに対してアゾ系重合開始剤を0.01mol~100molとするのがよい。 In the polymerization method (d), when the organic tellurium compound of the general formula (4), the organic ditellurium compound of the general formula (5) and the azo polymerization initiator are used in combination, Usually, the azo polymerization initiator is preferably used in an amount of 0.01 mol to 100 mol with respect to 1 mol in total of the organic tellurium compound of the general formula (4) and the organic ditellurium compound of the general formula (5).
 重合反応は、無溶媒でも行うことができるが、ラジカル重合で一般に使用される非プロトン性溶媒またはプロトン性溶媒を使用し、前記混合物を撹拌して行なってもよい。使用できる非プロトン性溶媒は、例えば、ベンゼン、トルエン、N,N-ジメチルホルムアミド(DMF)、ジメチルスルホキシド(DMSO)、アセトン、2-ブタノン(メチルエチルケトン)、ジオキサン、プロピレングリコールモノメチルエーテルアセテート、クロロホルム、四塩化炭素、テトラヒドロフラン(THF)、酢酸エチル、プロピレングリコールモノメチルエーテルアセテートまたはトリフルオロメチルベンゼン等を例示することができる。また、プロトン性溶媒としては、例えば、水、メタノール、エタノール、イソプロパノール、n-ブタノール、エチルセロソルブ、ブチルセロソルブ、1-メトキシ-2-プロパノール、ヘキサフルオロイソプロパノールまたはジアセトンアルコール等を例示することができる。 The polymerization reaction can be carried out without a solvent, but it may be carried out using an aprotic solvent or a protic solvent generally used in radical polymerization and stirring the mixture. Examples of aprotic solvents that can be used include benzene, toluene, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), acetone, 2-butanone (methyl ethyl ketone), dioxane, propylene glycol monomethyl ether acetate, chloroform, Examples include carbon chloride, tetrahydrofuran (THF), ethyl acetate, propylene glycol monomethyl ether acetate or trifluoromethylbenzene. Examples of the protic solvent include water, methanol, ethanol, isopropanol, n-butanol, ethyl cellosolve, butyl cellosolve, 1-methoxy-2-propanol, hexafluoroisopropanol, and diacetone alcohol.
 溶媒の使用量としては、適宜調節すればよく、例えば、ビニルモノマー1gに対して、0.01ml以上が好ましく、より好ましくは0.05ml以上、さらに好ましくは0.1ml以上であり、50ml以下が好ましく、より好ましくは10ml以下、さらに好ましくは1ml以下である。 The amount of the solvent used may be adjusted as appropriate. For example, it is preferably 0.01 ml or more, more preferably 0.05 ml or more, still more preferably 0.1 ml or more, and 50 ml or less with respect to 1 g of vinyl monomer. More preferably, it is 10 ml or less, More preferably, it is 1 ml or less.
 反応温度、反応時間は、得られる共重合体の分子量或いは分子量分布により適宜調節すればよいが、通常、0~150℃で、1分~100時間撹拌する。TERP法は、低い重合温度および短い重合時間であっても高い収率と精密な分子量分布を得ることができる。このとき、圧力は、通常、常圧で行われるが、加圧または減圧しても構わない。 The reaction temperature and reaction time may be appropriately adjusted depending on the molecular weight or molecular weight distribution of the copolymer to be obtained, but are usually stirred at 0 to 150 ° C. for 1 minute to 100 hours. The TERP method can obtain a high yield and a precise molecular weight distribution even at a low polymerization temperature and a short polymerization time. At this time, the pressure is usually normal pressure, but it may be increased or decreased.
 重合反応の終了後、得られた反応混合物から、通常の分離精製手段により、使用溶媒、残存ビニルモノマーの除去等を行い、目的とする共重合体を分離することができる。 After completion of the polymerization reaction, the intended copolymer can be separated from the obtained reaction mixture by removing the solvent used, residual vinyl monomer and the like by a normal separation and purification means.
 重合反応により得られる共重合体の成長末端は、-TeR41(式中、R41は前記と同じである)の形態であり、重合反応終了後の空気中の操作により失活していくが、テルル原子が残存する場合がある。テルル原子が末端に残存した共重合体は着色したり、熱安定性が劣ったりするため、テルル原子を除去することが好ましい。 The growth terminal of the copolymer obtained by the polymerization reaction is in the form of -TeR 41 (wherein R 41 is the same as described above), and it is deactivated by the operation in the air after the completion of the polymerization reaction. , Tellurium atoms may remain. Since the copolymer in which the tellurium atom remains at the terminal is colored or inferior in thermal stability, it is preferable to remove the tellurium atom.
 テルル原子を除去する方法としては、トリブチルスタンナンまたはチオール化合物等を用いるラジカル還元方法;活性炭、シリカゲル、活性アルミナ、活性白土、モレキュラーシーブスおよび高分子吸着剤等で吸着する方法;イオン交換樹脂等で金属を吸着する方法;過酸化水素水または過酸化ベンゾイル等の過酸化物を添加したり、空気または酸素を系中に吹き込むことで共重合体末端のテルル原子を酸化分解させ、水洗や適切な溶媒を組み合わせることにより残留テルル化合物を除去する液-液抽出法や固-液抽出法;特定の分子量以下のもののみを抽出除去する限界ろ過等の溶液状態での精製方法;を用いることができ、また、これらの方法を組み合わせて用いることもできる。 As a method for removing tellurium atoms, a radical reduction method using tributylstannane or a thiol compound; a method of adsorbing with activated carbon, silica gel, activated alumina, activated clay, molecular sieves, polymer adsorbent, etc .; Method of adsorbing metal: Add peroxide such as hydrogen peroxide or benzoyl peroxide, or blow air or oxygen into the system to oxidatively decompose tellurium atoms at the end of the copolymer. Liquid-liquid extraction method or solid-liquid extraction method that removes residual tellurium compounds by combining solvents; purification method in solution state such as ultrafiltration that extracts and removes only those having a specific molecular weight or less can be used. These methods can also be used in combination.
(4.1.5 4級化)
 重合物中の一般式(2)で表される構造単位の一部の3級アミン構造を4級化する方法としては、重合物と4級化剤とを接触させる方法が挙げられる。具体的には、一般式(2)で表される構造単位を形成し得るビニルモノマーを含有するモノマー組成物を重合した後、この反応液に4級化剤を添加し、撹拌する方法が挙げられる。
(4.1.5 Quaternization)
As a method of quaternizing a tertiary amine structure of a part of the structural unit represented by the general formula (2) in the polymer, a method of bringing the polymer into contact with a quaternizing agent can be mentioned. Specifically, after polymerizing a monomer composition containing a vinyl monomer that can form the structural unit represented by the general formula (2), a quaternizing agent is added to the reaction solution, followed by stirring. It is done.
 4級化剤を添加する反応液の温度は55℃~65℃が好ましく、撹拌時間は、5時間~20時間が好ましい。4級化剤を添加する際に、重合後の反応液を希釈することも好ましい。希釈のために添加する溶媒としては、重合反応に使用し得る溶媒が挙げられ、プロトン性溶媒が好ましく、メタノールがより好ましい。 The temperature of the reaction solution to which the quaternizing agent is added is preferably 55 ° C. to 65 ° C., and the stirring time is preferably 5 hours to 20 hours. When adding the quaternizing agent, it is also preferable to dilute the reaction solution after polymerization. Examples of the solvent to be added for dilution include a solvent that can be used for the polymerization reaction, a protic solvent is preferable, and methanol is more preferable.
(4.1.6 ブロック共重合体の前駆体)
 前記ブロック共重合体の前駆体の分子量は、GPC法により測定される。前記ブロック共重合体の前駆体の重量平均分子量(Mw)は5000以上が好ましく、より好ましくは6000以上、さらに好ましくは7000以上であり、15000以下が好ましく、より好ましくは12000以下、さらに好ましくは10000以下である。
(4.1.6 Block copolymer precursor)
The molecular weight of the block copolymer precursor is measured by the GPC method. The weight average molecular weight (Mw) of the block copolymer precursor is preferably 5000 or more, more preferably 6000 or more, further preferably 7000 or more, preferably 15000 or less, more preferably 12000 or less, and still more preferably 10,000. It is as follows.
 前記ブロック共重合体の前駆体の分子量分布(PDI)は、2.0以下であることが好ましく、1.6以下であることより好ましい。 The molecular weight distribution (PDI) of the block copolymer precursor is preferably 2.0 or less, and more preferably 1.6 or less.
 前記ブロック共重合体の前駆体のAブロックの含有率は、ブロック共重合体全体100質量%中において、35質量%以上が好ましく、より好ましくは40質量%以上、さらに好ましくは45質量%以上であり、85質量%以下が好ましく、より好ましくは80質量%以下、さらに好ましくは75質量%以下である。前記ブロック共重合体の前駆体のBブロックの含有率は、ブロック共重合体全体100質量%中において、15質量%以上が好ましく、より好ましくは20質量%以上、さらに好ましくは25質量%以上であり、65質量%以下が好ましく、より好ましくは60質量%以下、さらに好ましくは55質量%以下である。 The content of A block in the block copolymer precursor is preferably 35% by mass or more, more preferably 40% by mass or more, and still more preferably 45% by mass or more in 100% by mass of the entire block copolymer. Yes, 85 mass% or less is preferable, More preferably, it is 80 mass% or less, More preferably, it is 75 mass% or less. The content of B block in the block copolymer precursor is preferably 15% by mass or more, more preferably 20% by mass or more, and further preferably 25% by mass or more, in 100% by mass of the entire block copolymer. Yes, 65 mass% or less is preferable, More preferably, it is 60 mass% or less, More preferably, it is 55 mass% or less.
 前記ブロック共重合体の前駆体のアミン価は、顔料への吸着性および顔料分散性の観点から、10mgKOH/g以上が好ましく、より好ましくは20mgKOH/g以上、さらに好ましくは30mgKOH/g以上であり、200mgKOH/g以下が好ましく、より好ましくは150mgKOH/g以下、さらに好ましくは100mgKOH/g以下である。前記ブロック共重合体の前駆体のアミン価は一般式(2)で表される構造単位に由来するものである。 The amine value of the block copolymer precursor is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more, and still more preferably 30 mgKOH / g or more, from the viewpoints of adsorptivity to pigment and pigment dispersibility. 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, and still more preferably 100 mgKOH / g or less. The amine value of the block copolymer precursor is derived from the structural unit represented by the general formula (2).
 前記ブロック共重合体の前駆体の酸価は、5mgKOH/g以上が好ましく、より好ましくは10mgKOH/g以上、さらに好ましくは15mgKOH/g以上であり、50mgKOH/g以下が好ましく、より好ましくは40mgKOH/g以下、さらに好ましくは35mgKOH/g以下である。 The acid value of the precursor of the block copolymer is preferably 5 mgKOH / g or more, more preferably 10 mgKOH / g or more, still more preferably 15 mgKOH / g or more, preferably 50 mgKOH / g or less, more preferably 40 mgKOH / g. g or less, more preferably 35 mgKOH / g or less.
(4.2 工程(B))
 工程(B)では、前記工程(A)終了後、得られたブロック共重合体の前駆体に芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸よりなる群から選択される少なくとも1種のアルカリ金属塩を作用させ、ブロック共重合体を得る。工程(B)により、一般式(3)で表される構造単位が有するハロゲンアニオンを、芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホニウムイオンまたは芳香族カルボン酸アニオンに交換(アニオン交換)することができる。
(4.2 Step (B))
In the step (B), after completion of the step (A), the precursor of the obtained block copolymer is selected from the group consisting of aromatic dicarboxylic imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid. At least one alkali metal salt is allowed to act to obtain a block copolymer. By the step (B), the halogen anion of the structural unit represented by the general formula (3) is exchanged for an aromatic dicarboxylic acid imide anion, an aromatic sulfonic acid anion, an aromatic phosphonium ion, or an aromatic carboxylate anion (anion). Exchange).
 芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸よりなる群から選択される少なくとも1種のアルカリ金属塩におけるアルカリ金属としては、リチウム、ナトリウム、カリウム、ルビジウム、セシウム、フランシウムがあり、この中でも経済的に有利な点からリチウム、ナトリウム、カリウムが好ましい。 Examples of the alkali metal in at least one alkali metal salt selected from the group consisting of aromatic dicarboxylic imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid include lithium, sodium, potassium, rubidium, cesium, There is francium, and among these, lithium, sodium, and potassium are preferable because of economical advantages.
 芳香族ジカルボン酸イミドのアルカリ金属塩としては、例えば、一般式(6)で表されるものが挙げられる。 Examples of the alkali metal salt of aromatic dicarboxylic acid imide include those represented by the general formula (6).
Figure JPOXMLDOC01-appb-C000026
〔一般式(6)において、環Aは置換基を有していてもよい芳香環を表し、M1はアルカリ金属を表す。〕
Figure JPOXMLDOC01-appb-C000026
In [Formula (6), ring A represents an aromatic ring which may have a substituent group, M 1 is an alkali metal. ]
 一般式(6)において、環Aを構成する芳香環とは、芳香族性を有する環構造である。前記芳香環としては、単環および縮合環のいずれも含まれる。前記単環としては、5または6員環が好ましく、ベンゼン環、フラン環、チオフェン環、ピロール環が好適である。前記縮合環としては、2~5縮合環が好ましく、ナフタレン環、アントラセン環、フェナントレン環、インドール環が好適である。前記芳香環が有していてもよい置換基としては、炭素数1~6のアルキル基、炭素数6~14のアリール基、ニトロ基、シアノ基、ハロゲン基等が挙げられる。M1で表されるアルカリ金属としては、リチウム、ナトリウム、カリウム、ルビジウム、セシウム、フランシウムが挙げられる。 In the general formula (6), the aromatic ring constituting the ring A is a ring structure having aromaticity. The aromatic ring includes both single rings and condensed rings. As the monocycle, a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable. The condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring. Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group. Examples of the alkali metal represented by M 1 include lithium, sodium, potassium, rubidium, cesium, and francium.
 芳香族ジカルボン酸イミドのアルカリ金属塩としては、例えば、一般式(6-1)~(6-7)で表されるものが挙げられる。 Examples of the alkali metal salt of the aromatic dicarboxylic acid imide include those represented by general formulas (6-1) to (6-7).
Figure JPOXMLDOC01-appb-C000027
〔一般式(6-1)~(6-7)において、M1はアルカリ金属を表す。〕
Figure JPOXMLDOC01-appb-C000027
[In the general formulas (6-1) to (6-7), M 1 represents an alkali metal. ]
 芳香族スルホン酸のアルカリ金属塩としては、例えば、一般式(7)で表されるものが挙げられる。 Examples of the alkali metal salt of aromatic sulfonic acid include those represented by the general formula (7).
Figure JPOXMLDOC01-appb-C000028
〔一般式(7)において、Arは置換基を有していてもよい芳香環を表し、M2はアルカリ金属を表す。〕
Figure JPOXMLDOC01-appb-C000028
In [Formula (7), Ar represents an aromatic ring which may have a substituent, M 2 represents an alkali metal. ]
 一般式(7)において、Arを構成する芳香環とは、芳香族性を有する環構造である。前記芳香環としては、単環および縮合環のいずれも含まれる。前記単環としては、5または6員環が好ましく、ベンゼン環、フラン環、チオフェン環、ピロール環が好適である。前記縮合環としては、2~5縮合環が好ましく、ナフタレン環、アントラセン環、フェナントレン環、インドール環が好適である。前記芳香環が有していてもよい置換基としては、炭素数1~6のアルキル基、炭素数6~14のアリール基、ニトロ基、シアノ基、ハロゲン基等が挙げられる。M2で表されるアルカリ金属としては、リチウム、ナトリウム、カリウム、ルビジウム、セシウム、フランシウムが挙げられる。 In the general formula (7), the aromatic ring constituting Ar is a ring structure having aromaticity. The aromatic ring includes both single rings and condensed rings. As the monocycle, a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable. The condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring. Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group. Examples of the alkali metal represented by M 2 include lithium, sodium, potassium, rubidium, cesium, and francium.
 芳香族スルホン酸のアルカリ金属塩としては、例えば、一般式(7-1)~(7-9)で表されるものが挙げられる。 Examples of the alkali metal salt of aromatic sulfonic acid include those represented by general formulas (7-1) to (7-9).
Figure JPOXMLDOC01-appb-C000029
〔一般式(7-1)~(7-9)において、M2はアルカリ金属を表す。〕
Figure JPOXMLDOC01-appb-C000029
[In the general formulas (7-1) to (7-9), M 2 represents an alkali metal. ]
 芳香族ホスホン酸のアルカリ金属塩としては、例えば、一般式(8)で表されるものが挙げられる。 Examples of the alkali metal salt of aromatic phosphonic acid include those represented by the general formula (8).
Figure JPOXMLDOC01-appb-C000030
〔一般式(8)において、Arは置換基を有していてもよい芳香環を表し、M3はアルカリ金属を表す。〕
Figure JPOXMLDOC01-appb-C000030
In [Formula (8), Ar represents an aromatic ring which may have a substituent, M 3 represents an alkali metal. ]
 一般式(8)において、Arを構成する芳香環とは、芳香族性を有する環構造である。前記芳香環としては、単環および縮合環のいずれも含まれる。前記単環としては、5または6員環が好ましく、ベンゼン環、フラン環、チオフェン環、ピロール環が好適である。前記縮合環としては、2~5縮合環が好ましく、ナフタレン環、アントラセン環、フェナントレン環、インドール環が好適である。前記芳香環が有していてもよい置換基としては、炭素数1~6のアルキル基、炭素数6~14のアリール基、ニトロ基、シアノ基、ハロゲン基等が挙げられる。M3で表されるアルカリ金属としては、リチウム、ナトリウム、カリウム、ルビジウム、セシウム、フランシウムが挙げられる。 In the general formula (8), the aromatic ring constituting Ar is a ring structure having aromaticity. The aromatic ring includes both single rings and condensed rings. As the monocycle, a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable. The condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring. Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group. Examples of the alkali metal represented by M 3 include lithium, sodium, potassium, rubidium, cesium, and francium.
 芳香族ホスホン酸のアルカリ金属塩としては、例えば、一般式(8-1)~(8-7)で表されるものが挙げられる。 Examples of the alkali metal salt of aromatic phosphonic acid include those represented by general formulas (8-1) to (8-7).
Figure JPOXMLDOC01-appb-C000031
〔一般式(8-1)~(8-7)において、M3はアルカリ金属を表す。〕
Figure JPOXMLDOC01-appb-C000031
[In the general formulas (8-1) to (8-7), M 3 represents an alkali metal. ]
 芳香族カルボン酸のアルカリ金属塩としては、例えば、一般式(9)で表されるものが挙げられる。 Examples of the alkali metal salt of aromatic carboxylic acid include those represented by the general formula (9).
Figure JPOXMLDOC01-appb-C000032
〔一般式(9)において、Arは置換基を有していてもよい芳香環を表し、M4はアルカリ金属を表す。〕
Figure JPOXMLDOC01-appb-C000032
[In the general formula (9), Ar represents an aromatic ring which may have a substituent, and M 4 represents an alkali metal. ]
 一般式(9)において、Arを構成する芳香環とは、芳香族性を有する環構造である。前記芳香環としては、単環および縮合環のいずれも含まれる。前記単環としては、5または6員環が好ましく、ベンゼン環、フラン環、チオフェン環、ピロール環が好適である。前記縮合環としては、2~5縮合環が好ましく、ナフタレン環、アントラセン環、フェナントレン環、インドール環が好適である。前記芳香環が有していてもよい置換基としては、炭素数1~6のアルキル基、炭素数6~14のアリール基、ニトロ基、シアノ基、ハロゲン基等が挙げられる。M4で表されるアルカリ金属としては、リチウム、ナトリウム、カリウム、ルビジウム、セシウム、フランシウムが挙げられる。 In the general formula (9), the aromatic ring constituting Ar is a ring structure having aromaticity. The aromatic ring includes both single rings and condensed rings. As the monocycle, a 5- or 6-membered ring is preferable, and a benzene ring, a furan ring, a thiophene ring, and a pyrrole ring are preferable. The condensed ring is preferably a 2-5 condensed ring, and is preferably a naphthalene ring, an anthracene ring, a phenanthrene ring or an indole ring. Examples of the substituent that the aromatic ring may have include an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a cyano group, and a halogen group. Examples of the alkali metal represented by M 4 include lithium, sodium, potassium, rubidium, cesium, and francium.
 芳香族カルボン酸のアルカリ金属塩としては、例えば、一般式(9-1)~(9-9)で表されるものが挙げられる。 Examples of the alkali metal salt of aromatic carboxylic acid include those represented by general formulas (9-1) to (9-9).
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 前記工程(B)において、ブロック共重合体の前駆体に前記アルカリ金属塩を作用させる方法としては、前記ブロック共重合体の前駆体を溶解した溶液に前記アルカリ金属塩を添加して撹拌する方法が挙げられる。 In the step (B), as a method of allowing the alkali metal salt to act on the block copolymer precursor, a method in which the alkali metal salt is added to a solution in which the block copolymer precursor is dissolved and stirred. Is mentioned.
 前記工程(B)では、工程(A)の重合後の反応液に前記アルカリ金属塩を添加してもよい。なお、アニオン交換の効率の観点から、工程(A)終了後の重合溶液からブロック共重合体の前駆体を単離し、これを新たな溶媒に溶解させた溶液に、前記アルカリ金属塩を添加することが好ましい。 In the step (B), the alkali metal salt may be added to the reaction solution after the polymerization in the step (A). In addition, from the viewpoint of anion exchange efficiency, the precursor of the block copolymer is isolated from the polymerization solution after completion of the step (A), and the alkali metal salt is added to a solution obtained by dissolving the precursor in a new solvent. It is preferable.
 前記ブロック共重合体の前駆体を溶解することができる溶媒としては、非プロトン性溶媒またはプロトン性溶媒を使用することができる。使用できる非プロトン性溶媒は、例えば、ベンゼン、トルエン、N,N-ジメチルホルムアミド(DMF)、ジメチルスルホキシド(DMSO)、アセトン、2-ブタノン(メチルエチルケトン)、ジオキサン、プロピレングリコールモノメチルエーテルアセテート、クロロホルム、四塩化炭素、テトラヒドロフラン(THF)、酢酸エチル、プロピレングリコールモノメチルエーテルアセテートまたはトリフルオロメチルベンゼン等を例示することができる。また、プロトン性溶媒としては、例えば、水、メタノール、エタノール、イソプロパノール、n-ブタノール、エチルセロソルブ、ブチルセロソルブ、1-メトキシ-2-プロパノール、ヘキサフルオロイソプロパノールまたはジアセトンアルコール等を例示することができる。 As a solvent capable of dissolving the block copolymer precursor, an aprotic solvent or a protic solvent can be used. Examples of aprotic solvents that can be used include benzene, toluene, N, N-dimethylformamide (DMF), dimethyl sulfoxide (DMSO), acetone, 2-butanone (methyl ethyl ketone), dioxane, propylene glycol monomethyl ether acetate, chloroform, Examples include carbon chloride, tetrahydrofuran (THF), ethyl acetate, propylene glycol monomethyl ether acetate or trifluoromethylbenzene. Examples of the protic solvent include water, methanol, ethanol, isopropanol, n-butanol, ethyl cellosolve, butyl cellosolve, 1-methoxy-2-propanol, hexafluoroisopropanol, and diacetone alcohol.
 工程(B)において、ブロック共重合体の前駆体を溶解するための溶媒の使用量としては、適宜調節すればよく、例えば、ブロック共重合体の前駆体1gに対して、通常、2ml~10mlの範囲であり、好ましくは2ml~5mlがよい。 In the step (B), the amount of the solvent used for dissolving the block copolymer precursor may be appropriately adjusted. For example, it is usually 2 ml to 10 ml with respect to 1 g of the block copolymer precursor. The range is preferably 2 ml to 5 ml.
 工程(B)における、芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸よりなる群から選択される少なくとも1種のアルカリ金属塩の使用量としては、4級アンモニウム基に対して0.5当量以上が好ましく、より好ましくは0.9当量以上であり、1.1当量以下が好ましく、より好ましくは1.0当量以下である。 The amount of the at least one alkali metal salt selected from the group consisting of aromatic dicarboxylic imide, aromatic sulfonic acid, aromatic phosphonic acid and aromatic carboxylic acid in step (B) is a quaternary ammonium group. Is preferably 0.5 equivalents or more, more preferably 0.9 equivalents or more, preferably 1.1 equivalents or less, and more preferably 1.0 equivalents or less.
 工程(B)において、ブロック共重合体の前駆体と前記アルカリ金属塩とを接触させる際の溶液温度は、通常55℃~70℃、好ましくは55℃~65℃であり、撹拌時間は、通常18時間~24時間、好ましくは20時間~22時間がよい。 In the step (B), the solution temperature at the time of contacting the block copolymer precursor with the alkali metal salt is usually 55 ° C. to 70 ° C., preferably 55 ° C. to 65 ° C., and the stirring time is usually 18 hours to 24 hours, preferably 20 hours to 22 hours.
 反応終了後、反応液から溶媒を除去することでブロック共重合体を含有する第一組成物が得られる。なお、得られた第一組成物は、析出した塩(前記4級化剤に由来するハロゲン成分と、芳香族ジカルボン酸イミド等のアルカリ金属塩に由来するアルカリ金属成分との塩)などの不純物をろ過により除去することが好ましい。 After completion of the reaction, the first composition containing the block copolymer is obtained by removing the solvent from the reaction solution. The obtained first composition is an impurity such as a precipitated salt (a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as aromatic dicarboxylic imide). Is preferably removed by filtration.
(4.3 工程(C))
 前記ブロック共重合体の製造方法は、前記工程(B)で得られたブロック共重合体を、水洗する工程(C)を備えていることが好ましい。前記水洗方法としては、公知の洗浄方法を用いることができるが、分液洗浄が好ましい。分液洗浄は、工程(B)終了後の溶液に対して行ってもよいし、前記工程(B)終了後の溶液からブロック共重合体の第一組成物を単離し、得られた第一組成物を適当な溶媒に溶解させた溶液に対して行ってもよい。
(4.3 Step (C))
The method for producing the block copolymer preferably includes a step (C) of washing the block copolymer obtained in the step (B) with water. As the water washing method, a known washing method can be used, but liquid separation washing is preferable. Separation washing may be performed on the solution after completion of the step (B), or the first composition obtained by isolating the first composition of the block copolymer from the solution after completion of the step (B). You may perform with respect to the solution which melt | dissolved the composition in the appropriate solvent.
 上記分液洗浄の具体例としては、ブロック共重合体を溶解した溶媒と、水とを混合後、分離した水層を抜き取る。水洗することで、第一組成物に含まれる塩(前記4級化剤に由来するハロゲン成分と、芳香族ジカルボン酸イミド等のアルカリ金属塩に由来するアルカリ金属成分との塩)の含有量をより低減できる。また、さらに、分液洗浄を繰り返すことで一層の効果がある。分液洗浄後、ブロック共重合体が溶解した相の溶媒を減圧下除去することで、目的のブロック共重合体の第二組成物を得ることができる。 As a specific example of the liquid separation cleaning, a solvent in which a block copolymer is dissolved and water are mixed, and then the separated aqueous layer is extracted. By washing with water, the content of the salt contained in the first composition (a salt of a halogen component derived from the quaternizing agent and an alkali metal component derived from an alkali metal salt such as an aromatic dicarboxylic acid imide) is increased. It can be reduced more. Furthermore, repeated effects of separating and cleaning have a further effect. After the liquid separation washing, the second composition of the target block copolymer can be obtained by removing the solvent of the phase in which the block copolymer is dissolved under reduced pressure.
 上述の分液操作の溶媒は、ブロック共重合体を溶解することができ、水と相分離可能な溶媒であればよく、例えば、酢酸エチル、酢酸ブチル、酢酸イソプロピル、メチルイソブチルケトン等を挙げることができ、これらを混合して用いてもよい。また、水洗に使用する水は、アルコール等を含有してもよい。 The solvent for the above-described liquid separation operation may be any solvent that can dissolve the block copolymer and can be phase-separated from water. Examples thereof include ethyl acetate, butyl acetate, isopropyl acetate, and methyl isobutyl ketone. These may be used in combination. Moreover, the water used for washing may contain alcohol or the like.
 上記分液洗浄において、水の使用量は、ブロック共重合体を溶解している溶媒相に対して、体積比で0.1倍量~10倍量が好ましく、より好ましくは0.5倍量~5倍量である。分液洗浄を行う際の液温は、10℃~60℃が好ましく、より好ましくは30℃~50℃、特に好ましくは35℃~45℃である。 In the liquid separation washing, the amount of water used is preferably 0.1 to 10 times, more preferably 0.5 times the volume of the solvent phase in which the block copolymer is dissolved. ~ 5 times the amount. The liquid temperature at the time of liquid separation washing is preferably 10 ° C. to 60 ° C., more preferably 30 ° C. to 50 ° C., and particularly preferably 35 ° C. to 45 ° C.
<5 分散剤、顔料分散組成物>
 本発明の分散剤は、前記ブロック共重合体、第一組成物または第二組成物を主成分として含有するものである。なお前記分散剤は、実質的に本発明のブロック共重合体、第一組成物または第二組成物のみからなるものであることが好ましい。本発明の顔料分散組成物は、前記分散剤と、顔料と、分散媒体とを含有してなる。この場合に使用する顔料の種類および粒子径は、その用途によっても異なり、特に限定されない。前記顔料分散組成物は、カラーフィルタ用に使用できる。本発明を特徴づけるブロック共重合体は、その構造中(Bブロック)の3級アミノ基および4級アンモニウム塩基が、酸性顔料または酸性基含有色素誘導体で処理された顔料の酸性基と強固に結合し、このBブロックが顔料に吸着することで、または4級アンモニウム塩基の対イオンである芳香族ジカルボン酸イミドアニオンの芳香族部位が顔料の色素骨格部位と吸着することで、顔料分散性を高める作用を発揮すると考えられる。すなわち、本発明の分散剤は、この作用によって顔料の良好に分散させる成分であるので、分散させる顔料の種類については特に限定されない。
<5 Dispersant, pigment dispersion composition>
The dispersant of the present invention contains the block copolymer, the first composition or the second composition as a main component. In addition, it is preferable that the said dispersing agent consists only of the block copolymer of this invention, a 1st composition, or a 2nd composition. The pigment dispersion composition of the present invention contains the dispersant, a pigment, and a dispersion medium. In this case, the type and particle size of the pigment used are different depending on the application and are not particularly limited. The pigment dispersion composition can be used for a color filter. In the block copolymer characterizing the present invention, the tertiary amino group and quaternary ammonium base in the structure (B block) are strongly bonded to the acidic group of the pigment treated with the acidic pigment or the acidic group-containing dye derivative. The B block adsorbs to the pigment, or the aromatic part of the aromatic dicarboxylic acid imide anion which is a counter ion of the quaternary ammonium base adsorbs to the pigment skeleton part of the pigment, thereby improving the pigment dispersibility. It is thought to exert its effect. That is, since the dispersant of the present invention is a component that favorably disperses the pigment by this action, the type of pigment to be dispersed is not particularly limited.
 顔料分散組成物において、分散剤の含有量は、顔料100質量部に対して5質量部~200質量部であることが好ましく、10質量部~100質量部であることがより好ましく、10質量部~50質量部であることがさらに好ましい。 In the pigment dispersion composition, the content of the dispersant is preferably 5 parts by mass to 200 parts by mass, more preferably 10 parts by mass to 100 parts by mass with respect to 100 parts by mass of the pigment. More preferably, it is ˜50 parts by mass.
 顔料としては、有機顔料および無機顔料のいずれでもよいが、有機化合物を主成分とする有機顔料が特に好ましい。顔料としては、例えば、赤色顔料、黄色顔料、橙色顔料、青色顔料、緑色顔料、紫色顔料等の各色の顔料が挙げられる。顔料の構造は、モノアゾ系顔料、ジアゾ系顔料、縮合ジアゾ系顔料等のアゾ系顔料、ジケトピロロピロール系顔料、フタロシアニン系顔料、イソインドリノン系顔料、イソインドリン系顔料、キナクリドン系顔料、インディゴ系顔料、チオインディゴ系顔料、キノフタロン系顔料、ジオキサジン系顔料、アントラキノン系顔料、ペリレン系顔料、ペリノン系顔料等の多環系顔料等が挙げられる。顔料分散組成物に含まれる顔料は、1種類のみであってもよいし、複数種類であってもよい。 The pigment may be either an organic pigment or an inorganic pigment, but an organic pigment containing an organic compound as a main component is particularly preferable. Examples of the pigment include pigments of various colors such as a red pigment, a yellow pigment, an orange pigment, a blue pigment, a green pigment, and a purple pigment. The structure of the pigment is azo pigments such as monoazo pigments, diazo pigments, condensed diazo pigments, diketopyrrolopyrrole pigments, phthalocyanine pigments, isoindolinone pigments, isoindoline pigments, quinacridone pigments, indigo Examples thereof include polycyclic pigments such as pigments, thioindigo pigments, quinophthalone pigments, dioxazine pigments, anthraquinone pigments, perylene pigments, and perinone pigments. Only one type of pigment may be contained in the pigment dispersion composition, or a plurality of types may be used.
 顔料の具体例としては、C.I.Pigment  Red 7、9、14、41、48:1、48:2、48:3、48:4、81:1、81:2、81:3、122、123、146、149、168、177、178、179、187、200、202、208、210、215、224、254、255、264等の赤色顔料;C.I.Pigment Yellow 1、3、5、6、14、55、60、61、62、63、65、73、74、77、81、93、97、98、104、108、110、138、139、147、150、151、154、155、166、167、168、170、180、188、193、194、213等の黄色顔料;C.I.Pigment Orange 36、38、43等の橙色顔料;C.I.Pigment Blue 15、15:2、15:3、15:4、15:6、16、22、60等の青色顔料;C.I.Pigment Green 7、36、58等の緑色顔料;C.I.Pigment Violet 23、32、50等の紫色顔料等が挙げられる。顔料は、これらの中でも、C.I.Pigment Red 254、C.I.Pigment Red 255、C.I.Pigment Red 264、C.I.Pigment Blue 15、C.I.Pigment Blue 15:2、C.I.Pigment Blue 15:3、C.I.Pigment Blue 15:4、C.I.Pigment Blue 15:6、C.I.Pigment Blue 16、C.I.Pigment Green 7、C.I.Pigment Green 36、C.I.Pigment Green 58等が好ましい。 Specific examples of pigments include C.I. I. Pigment® Red 7, 9, 14, 41, 48: 1, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 122, 123, 146, 149, 168, 177, Red pigments such as 178, 179, 187, 200, 202, 208, 210, 215, 224, 254, 255, 264; I. Pigment Yellow 1, 3, 5, 6, 14, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 93, 97, 98, 104, 108, 110, 138, 139, 147, Yellow pigments such as 150, 151, 154, 155, 166, 167, 168, 170, 180, 188, 193, 194, 213; I. Orange pigments such as Pigment Orange 36, 38, 43; I. Pigment Blue 15, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, etc .; blue pigments; C.I. I. Pigment Green 7, 36, 58, etc. green pigments; C.I. I. And purple pigments such as Pigment Violet 23, 32, and 50. Among these pigments, C.I. I. Pigment Red 254, C.I. I. Pigment Red 255, C.I. I. Pigment Red 264, C.I. I. Pigment Blue 15, C.I. I. Pigment Blue 15: 2, C.I. I. Pigment Blue 15: 3, C.I. I. Pigment Blue 15: 4, C.I. I. Pigment Blue 15: 6, C.I. I. Pigment Blue 16, C.I. I. Pigment Green 7, C.I. I. Pigment Green 36, C.I. I. Pigment Green 58 or the like is preferable.
 顔料分散組成物における顔料の含有量の上限値は、顔料分散組成物の固形分全量中において、通常80質量%であり、70質量%であることが好ましく、60質量%であることがより好ましい。また、顔料分散組成物における顔料の含有量の下限値は、顔料分散組成物の固形分全量中において、通常10質量%であり、20質量%であることが好ましく、30質量%であることがより好ましい。 The upper limit of the pigment content in the pigment dispersion composition is usually 80% by mass, preferably 70% by mass, and more preferably 60% by mass in the total solid content of the pigment dispersion composition. . Further, the lower limit of the pigment content in the pigment dispersion composition is usually 10% by mass, preferably 20% by mass, and preferably 30% by mass in the total solid content of the pigment dispersion composition. More preferred.
 分散媒体としては、例えば従来公知の有機溶媒を使用することができ、例えば、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノ-n-ブチルエーテル、プロピレングリコール-t-ブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノ-n-ブチルエーテル、メトキシメチルペンタノール、プロピレングリコールモノエチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノメチルエーテル、3-メチル-3-メトキシブタノール、トリエチレングリコールモノメチルエーテル、トリエチレングリコールモノエチルエーテル、トリプロピレングリコールメチルエーテル等のグリコールモノアルキルエーテル類;エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールジプロピルエーテル、ジエチレングリコールジブチルエーテル、ジプロピレングリコールジメチルエーテル等のグリコールジアルキルエーテル類;エチレングリコールモノメチルエーテルアセテート、エチレングリコールモノエチルエーテルアセテート、エチレングリコールモノ-n-ブチルエーテルアセテート、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート、プロピレングリコールモノブチルエーテルアセテート、メトキシブチルアセテート、3-メトキシブチルアセテート、メトキシペンチルアセテート、ジエチレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノ-n-ブチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、トリエチレングリコールモノメチルエーテルアセテート、トリエチレングリコールモノエチルエーテルアセテート、3-メチル-3-メトキシブチルアセテート等のグリコールアルキルエーテルアセテート類;エチレングリコールジアセテート、1,3-ブチレングリコールジアセテート、1,6-ヘキサノールジアセテート等のグリコールジアセテート類;シクロヘキサノールアセテート等のアルキルアセテート類;アミルエーテル、プロピルエーテル、ジエチルエーテル、ジプロピルエーテル、ジイソプロピルエーテル、ブチルエーテル、ジアミルエーテル、エチルイソブチルエーテル、ジヘキシルエーテル等のエーテル類;アセトン、メチルエチルケトン、メチルアミルケトン、メチルイソプロピルケトン、メチルイソアミルケトン、ジイソプロピルケトン、ジイソブチルケトン、メチルイソブチルケトン、シクロヘキサノン、エチルアミルケトン、メチルブチルケトン、メチルヘキシルケトン、メチルノニルケトン、メトキシメチルペンタノン等のケトン類;エタノール、プロパノール、ブタノール、ヘキサノール、シクロヘキサノール、エチレングリコール、プロピレングリコール、ブタンジオール、ジエチレングリコール、ジプロピレングリコール、トリエチレングリコール、メトキシプロパノール、メトキシメチルペンタノール、グリセリン、ベンジルアルコール等の1価または多価アルコール類;n-ペンタン、n-オクタン、ジイソブチレン、n-ヘキサン、ヘキセン、イソプレン、ジペンテン、ドデカン等の脂肪族炭化水素類;シクロヘキサン、メチルシクロヘキサン、メチルシクロヘキセン、ビシクロヘキシル等の脂環式炭化水素類;ベンゼン、トルエン、キシレン、クメン等の芳香族炭化水素類;アミルホルメート、エチルホルメート、酢酸エチル、酢酸ブチル、酢酸プロピル、酢酸アミル、メチルイソブチレート、エチレングリコールアセテート、エチルプロピオネート、プロピルプロピオネート、酪酸ブチル、酪酸イソブチル、イソ酪酸メチル、エチルカプリレート、ブチルステアレート、エチルベンゾエート、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、γ-ブチロラクトン等の鎖状または環状エステル類;3-メトキシプロピオン酸、3-エトキシプロピオン酸等のアルコキシカルボン酸類;ブチルクロライド、アミルクロライド等のハロゲン化炭化水素類;メトキシメチルペンタノン等のエーテルケトン類;アセトニトリル、ベンゾニトリル等のニトリル類等が挙げられる。有機溶媒は、顔料等の分散性、分散剤の溶解性、顔料分散組成物の塗布性等の観点から、グリコールアルキルエーテルアセテート類、1価または多価アルコール類であることが好ましい。顔料分散組成物に含まれる溶媒は、1種類のみであってもよいし、複数種類であってもよい。 As the dispersion medium, for example, a conventionally known organic solvent can be used. For example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol mono Ethyl ether, propylene glycol mono-n-butyl ether, propylene glycol-t-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethylpentanol, propylene glycol monoethyl ether, dipropylene glycol monoethyl Ether, dipropylene glycol monomethyl ester Glycol monoalkyl ethers such as ter, 3-methyl-3-methoxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, tripropylene glycol methyl ether; ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol Glycol dialkyl ethers such as diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, dipropylene glycol dimethyl ether; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene group Cole monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, methoxybutyl acetate, 3-methoxybutyl acetate, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, Glycol alkyl ether acetates such as diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, 3-methyl-3-methoxybutyl acetate ; Glycol diacetates such as ethylene glycol diacetate, 1,3-butylene glycol diacetate, 1,6-hexanol diacetate; alkyl acetates such as cyclohexanol acetate; amyl ether, propyl ether, diethyl ether, dipropyl ether , Ethers such as diisopropyl ether, butyl ether, diamyl ether, ethyl isobutyl ether, dihexyl ether; acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl Amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone, methoxymethyl penta Ketones such as ethanol; ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butanediol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxypropanol, methoxymethylpentanol, glycerin, benzyl alcohol, etc. Monohydric or polyhydric alcohols; aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-hexane, hexene, isoprene, dipentene, dodecane; cyclohexane, methylcyclohexane, methylcyclohexene, bicyclohexyl, etc. Alicyclic hydrocarbons; aromatic hydrocarbons such as benzene, toluene, xylene, cumene; amyl formate, ethyl formate, ethyl acetate, butyl acetate Propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl caprylate, butyl stearate, ethyl benzoate, 3-ethoxypropion Chain or cyclic esters such as methyl acid, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, γ-butyrolactone; Alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid; Halogenated hydrocarbons such as butyl chloride and amyl chloride; Ether ketones such as methoxymethylpentanone; Acetonitrile , Nitriles such as benzonitrile and the like. The organic solvent is preferably glycol alkyl ether acetates, monovalent or polyhydric alcohols from the viewpoints of dispersibility of pigments, solubility of the dispersant, applicability of the pigment dispersion composition, and the like. The solvent contained in the pigment dispersion composition may be only one type or a plurality of types.
 顔料分散組成物中の分散媒体の含有量は、特に限定されず、適宜調整することができる。顔料分散組成物中の分散媒体の含有量の上限値は、通常99質量%である。また、顔料分散組成物中の分散媒体の含有量の下限値は、顔料分散組成物の塗布に適した粘度を考慮して、通常70質量%であり、80質量%であることが好ましい。上記分散媒体は、顔料分散組成物から形成される析出物を溶解、除去するための溶媒として使用できる。 The content of the dispersion medium in the pigment dispersion composition is not particularly limited and can be appropriately adjusted. The upper limit of the content of the dispersion medium in the pigment dispersion composition is usually 99% by mass. The lower limit of the content of the dispersion medium in the pigment dispersion composition is usually 70% by mass and preferably 80% by mass in consideration of the viscosity suitable for application of the pigment dispersion composition. The dispersion medium can be used as a solvent for dissolving and removing precipitates formed from the pigment dispersion composition.
 本発明の顔料分散組成物には、分散剤に用いる本発明を特徴づけるブロック共重合体中の3級アミノ基および4級アンモニウム塩基とイオン結合させて吸着させるために、さらに酸性基を有する酸性の色素誘導体を含有させることが好ましい。この色素誘導体は、色素骨格に酸性官能基が導入されたものである。色素骨格としては、顔料分散組成物を構成している顔料と同一または類似の骨格、該顔料の原料となる化合物と同一または類似の骨格が好ましい。色素骨格の具体例としては、アゾ系色素骨格、フタロシアニン系色素骨格、アントラキノン系色素骨格、トリアジン系色素骨格、アクリジン系色素骨格、ペリレン系色素骨格等を上げることができる。色素骨格に導入される酸性基としては、カルボキシル基、リン酸基、スルホン酸基が好ましい。なお、合成の都合上、および酸性度の強さからスルホン酸基が好ましい。また、酸性基は、色素骨格に直接結合してもよいが、アルキル基やアリール基等の炭化水素基;エステル、エーテル、スルホンアミド、ウレタン結合を介して色素骨格に結合してもよい。 In the pigment dispersion composition of the present invention, an acidic group further having an acidic group is used in order to adsorb and adsorb the tertiary amino group and quaternary ammonium base in the block copolymer characterizing the present invention used as a dispersant. It is preferable to contain a pigment derivative of This dye derivative has an acidic functional group introduced into the dye skeleton. As the dye skeleton, the same or similar skeleton as the pigment constituting the pigment dispersion composition and the same or similar skeleton as the raw material of the pigment are preferable. Specific examples of the dye skeleton include azo dye skeleton, phthalocyanine dye skeleton, anthraquinone dye skeleton, triazine dye skeleton, acridine dye skeleton, and perylene dye skeleton. The acidic group introduced into the dye skeleton is preferably a carboxyl group, a phosphoric acid group, or a sulfonic acid group. In addition, a sulfonic acid group is preferable from the viewpoint of synthesis and the strength of acidity. The acidic group may be directly bonded to the dye skeleton, but may be bonded to the dye skeleton via a hydrocarbon group such as an alkyl group or an aryl group; an ester, ether, sulfonamide, or urethane bond.
 本発明の顔料分散組成物には、バインダー樹脂を含んでいてもよい。バインダー樹脂は、例えば、重合体であってもよい。バインダー樹脂が重合体である場合、重合体を構成するモノマーの具体例としては、例えば(メタ)アクリル酸、マレイン酸、フマル酸、イタコン酸、シトラコン酸、クロトン酸、無水マレイン酸等のカルボキシル基含有不飽和モノマー;(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸プロピル、(メタ)アクリル酸ブチル、(メタ)アクリル酸オクチル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸-2-ヒドロキシエチル、(メタ)アクリル酸ベンジル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸メチルシクロヘキシル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸シクロドデシル等の(メタ)アクリル酸エステル;スチレン、α-メチルスチレン、4-メチルスチレン(p-メチルスチレン)、2-メチルスチレン(o-メチルスチレン)、3-メチルスチレン(m-メチルスチレン)、4-メトキシスチレン(p-メトキシスチレン)、p-tert-ブチルスチレン、p-n-ブチルスチレン、p-tert-ブトキシスチレン等の芳香族不飽和モノマー(スチレン系モノマー)等が挙げられる。 The pigment dispersion composition of the present invention may contain a binder resin. The binder resin may be a polymer, for example. When the binder resin is a polymer, specific examples of monomers constituting the polymer include, for example, carboxyl groups such as (meth) acrylic acid, maleic acid, fumaric acid, itaconic acid, citraconic acid, crotonic acid, and maleic anhydride Containing unsaturated monomer: methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, octyl (meth) acrylate, lauryl (meth) acrylate, (meth) (Meth) acrylic such as 2-hydroxyethyl acrylate, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, methyl cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, cyclododecyl (meth) acrylate, etc. Acid ester; styrene, α-methylstyrene, 4-methylstyrene ( -Methylstyrene), 2-methylstyrene (o-methylstyrene), 3-methylstyrene (m-methylstyrene), 4-methoxystyrene (p-methoxystyrene), p-tert-butylstyrene, pn-butyl And aromatic unsaturated monomers (styrene monomers) such as styrene and p-tert-butoxystyrene.
 顔料分散組成物をカラーフィルタ用の着色剤として用いる場合には、バインダー樹脂は、カルボキシル基含有不飽和モノマーと(メタ)アクリル酸エステルとの共重合体であることが好ましい。このような共重合体の具体例としては、(メタ)アクリル酸と(メタ)アクリル酸ブチルとの共重合体、(メタ)アクリル酸と(メタ)アクリル酸ベンジルとの共重合体、(メタ)アクリル酸と(メタ)アクリル酸ブチルと(メタ)アクリル酸ベンジルとの共重合体等が挙げられる。バインダー樹脂と顔料との親和性の観点からは、バインダー樹脂は、(メタ)アクリル酸と(メタ)アクリル酸ベンジルとの共重合体であることが特に好ましい。カルボキシル基含有不飽和モノマーと(メタ)アクリル酸エステルとの共重合体において、(メタ)アクリル酸の含有量は、全モノマー成分中、通常5質量%~90質量%であり、10質量%~70質量%であることが好ましく、20質量%~70質量%であることがより好ましい。Mwは、3,000~100,000であることが好ましく、5,000~50,000であることがより好ましく、5,000~20,000であることがさらに好ましい。バインダー樹脂のMwが3,000以上であると、顔料分散組成物から形成された塗布膜の耐熱性、膜強度等が良好となり、Mwが100,000以下であると、この塗布膜のアルカリ水溶液による現像性がより一層良好となる。 When the pigment dispersion composition is used as a colorant for a color filter, the binder resin is preferably a copolymer of a carboxyl group-containing unsaturated monomer and a (meth) acrylic acid ester. Specific examples of such a copolymer include a copolymer of (meth) acrylic acid and butyl (meth) acrylate, a copolymer of (meth) acrylic acid and benzyl (meth) acrylate, And a copolymer of acrylic acid, butyl (meth) acrylate, and benzyl (meth) acrylate. From the viewpoint of the affinity between the binder resin and the pigment, the binder resin is particularly preferably a copolymer of (meth) acrylic acid and benzyl (meth) acrylate. In the copolymer of a carboxyl group-containing unsaturated monomer and a (meth) acrylic acid ester, the content of (meth) acrylic acid is usually 5% by mass to 90% by mass in all monomer components, and 10% by mass to It is preferably 70% by mass, and more preferably 20% by mass to 70% by mass. Mw is preferably from 3,000 to 100,000, more preferably from 5,000 to 50,000, and even more preferably from 5,000 to 20,000. When the Mw of the binder resin is 3,000 or more, the heat resistance, film strength, etc. of the coating film formed from the pigment dispersion composition are good, and when the Mw is 100,000 or less, the aqueous alkaline solution of this coating film Developability due to is further improved.
 顔料分散組成物をカラーフィルタ用の着色剤として用いる場合には、バインダー樹脂の酸価は、20mgKOH/g~170mgKOH/gであることが好ましく、50mgKOH/g~150mgKOH/gであることがより好ましく、90mgKOH/g~150mgKOH/gであることがさらに好ましい。バインダー樹脂の酸価が20mgKOH以上/gであると、顔料分散組成物を塗布膜としたときのアルカリ現像性がより一層良好となり、170mgKOH/g以下であると耐熱性が良好となる。 When the pigment dispersion composition is used as a colorant for a color filter, the acid value of the binder resin is preferably 20 mgKOH / g to 170 mgKOH / g, and more preferably 50 mgKOH / g to 150 mgKOH / g. 90 mg KOH / g to 150 mg KOH / g is more preferable. When the acid value of the binder resin is 20 mgKOH or more / g, the alkali developability when the pigment dispersion composition is used as a coating film is further improved, and when it is 170 mgKOH / g or less, the heat resistance is improved.
 顔料分散組成物に含まれるバインダー樹脂は、1種類のみであってもよいし、複数種類であってもよい。顔料分散組成物において、バインダー樹脂の含有量は、顔料100質量部に対して、5質量部~200質量部であることが好ましく、10質量部~100質量部であることがより好ましく、10質量部~50質量部であることがさらに好ましい。 The binder resin contained in the pigment dispersion composition may be only one type or a plurality of types. In the pigment dispersion composition, the content of the binder resin is preferably 5 parts by mass to 200 parts by mass, more preferably 10 parts by mass to 100 parts by mass with respect to 100 parts by mass of the pigment. More preferred is from 50 parts by weight to 50 parts by weight.
 顔料分散組成物は、顔料、分散剤、分散媒体、色素誘導体、バインダー樹脂等を、例えば、ペイントシェーカー、ビーズミル、ボールミル、ディゾルバー、ニーダー等の混合分散機を用いて混合することによって得られる。顔料分散組成物は、混合後に濾過することが好ましい。 The pigment dispersion composition is obtained by mixing a pigment, a dispersant, a dispersion medium, a dye derivative, a binder resin, and the like using a mixing and dispersing machine such as a paint shaker, a bead mill, a ball mill, a dissolver, or a kneader. The pigment dispersion composition is preferably filtered after mixing.
 顔料分散組成物は、必要に応じて他の添加剤を含んでいてもよい。他の添加剤としては、例えば、光重合性モノマー、光重合開始剤、pH調整剤、酸化防止剤、紫外線吸収剤、光安定剤、防腐剤、防カビ剤等が挙げられる。光重合性モノマーとしては、バインダー樹脂と相溶性のあるエチレン性不飽和二重結合を少なくとも2つ有する化合物等が好ましい。このような化合物としては、顔料分散組成物をカラーフィルタ用の着色剤として用いる場合、アルカリ可溶性を有し、1分子内に1つ以上の酸性基と2つ以上のエチレン性不飽和結合を有する化合物が好ましく、1分子内に1つ以上の酸性基と3つ以上のエチレン性不飽和結合を有する化合物がさらに好ましい。エチレン性不飽和二重結合を少なくとも2つ有する化合物としては、2官能(メタ)アクリレート、3官能以上の(メタ)アクリレート等の多官能性(メタ)アクリレートが挙げられる。これらの中でも、3官能以上の(メタ)アクリレートが好ましい。1分子内に1つ以上の酸性基と2つ以上のエチレン性不飽和結合を有する化合物としては、酸性基含有多官能性(メタ)アクリレートがより好ましく、3官能以上の酸性基含有多官能性(メタ)アクリレートが特に好ましい。酸性基としては、アルカリ現像が可能なものであればよく、例えばカルボキシ基、スルホン酸基、リン酸基等が挙げられる。酸性基は、アルカリ現像性および樹脂組成物の取り扱い性をより一層向上させる観点からカルボキシ基が好ましい。 The pigment dispersion composition may contain other additives as necessary. Examples of other additives include a photopolymerizable monomer, a photopolymerization initiator, a pH adjuster, an antioxidant, an ultraviolet absorber, a light stabilizer, an antiseptic, and an antifungal agent. The photopolymerizable monomer is preferably a compound having at least two ethylenically unsaturated double bonds that are compatible with the binder resin. As such a compound, when the pigment dispersion composition is used as a colorant for a color filter, it has alkali solubility and has one or more acidic groups and two or more ethylenically unsaturated bonds in one molecule. A compound is preferable, and a compound having one or more acidic groups and three or more ethylenically unsaturated bonds in one molecule is more preferable. Examples of the compound having at least two ethylenically unsaturated double bonds include polyfunctional (meth) acrylates such as bifunctional (meth) acrylate and trifunctional or higher functional (meth) acrylate. Among these, trifunctional or higher functional (meth) acrylates are preferable. As a compound having one or more acidic groups and two or more ethylenically unsaturated bonds in one molecule, an acidic group-containing polyfunctional (meth) acrylate is more preferable, and a trifunctional or higher acidic group-containing polyfunctionality is preferred. (Meth) acrylate is particularly preferred. The acidic group is not particularly limited as long as it can be alkali-developed. The acidic group is preferably a carboxy group from the viewpoint of further improving the alkali developability and the handleability of the resin composition.
 顔料分散組成物をスピンコート法、ロールコート法、スリットコート法等の方法により基板上に塗布することにより、基板上に顔料分散組成物の塗布膜を形成することができる。顔料分散組成物を基板の上に塗布した後、必要に応じて乾燥(脱溶媒処理)等を施してもよい。 A coating film of the pigment dispersion composition can be formed on the substrate by applying the pigment dispersion composition onto the substrate by a spin coating method, a roll coating method, a slit coating method or the like. After applying the pigment dispersion composition on the substrate, drying (desolvation treatment) or the like may be performed as necessary.
 本発明の顔料分散組成物を、例えばカラーフィルタのパターニング材等として用いる場合、分散剤に用いる本発明を特徴づけるブロック共重合体の耐熱性が優れていることから、高温を伴う工程の前後でのコントラスト比の低下、色相の変化等を抑制することが期待できる。 When the pigment dispersion composition of the present invention is used as, for example, a patterning material for a color filter, the heat resistance of the block copolymer that characterizes the present invention used for the dispersant is excellent. It can be expected to suppress a decrease in contrast ratio and a change in hue.
 以下、本発明を実施例に基づいて具体的に説明するが、本発明は、これらの具体例に限定されるものではない。また、各種物性測定は以下の機器により測定を行った。なお、略語の意味は下記のとおりである。
BTEE:エチル-2-メチル-2-n-ブチルテラニル-プロピオネート
DBDT:ジブチルジテルリド
AIBN:2,2’-アゾビス(イソブチロニトリル)
MMA:メタクリル酸メチル
BMA:メタクリル酸ブチル
EHMA:メタクリル酸2-エチルヘキシル
BzMA:メタクリル酸ベンジル
M4EGM:メトキシポリエチレングリコールモノメタクリレート(商品名:ブレンマーPME-200、日油社製)
HEMA:メタクリル酸2-ヒドロキシエチル
THFMA:メタクリル酸テトラヒドロフルフリル
PCL5:2-ヒドロキシエチルメタクリレートの5molカプロラクトン付加物(ダイセル化学社製、プラクセル(登録商標)FM5)
MAA:メタクリル酸
DMAEMA:メタクリル酸ジメチルアミノエチル
BzCl:塩化ベンジル
PIK:フタルイミドカリウム
NaSS:p-スチレンスルホン酸ナトリウム
NaTS:p-トルエンスルホン酸ナトリウム
NaBA:安息香酸ナトリウム
NaHPPA:フェニルホスホン酸一ナトリウム
PMA:プロピレングリコールモノメチルエーテルアセテート
MP:1-メトキシ-2-プロパノール
AcOEt:酢酸エチル
EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to these specific examples. Various physical properties were measured with the following equipment. The abbreviations have the following meanings.
BTEE: ethyl-2-methyl-2-n-butylterranyl-propionate DBDT: dibutylditelluride AIBN: 2,2′-azobis (isobutyronitrile)
MMA: Methyl methacrylate BMA: Butyl methacrylate EHMA: 2-ethylhexyl methacrylate BzMA: Benzyl methacrylate M4EGM: Methoxypolyethylene glycol monomethacrylate (trade name: Blenmer PME-200, manufactured by NOF Corporation)
HEMA: 2-hydroxyethyl methacrylate THFMA: tetrahydrofurfuryl methacrylate methacrylate PCL5: 5 mol caprolactone adduct of 2-hydroxyethyl methacrylate (Daicel Chemical Industries, Plaxel (registered trademark) FM5)
MAA: DMAEMA methacrylate: dimethylaminoethyl methacrylate BzCl: benzyl PIK: potassium phthalimide NaSS: p-sodium styrenesulfonate NaTS: sodium p-toluenesulfonate NaBA: sodium benzoate NaHPPA: monosodium phenylphosphonate PMA: propylene Glycol monomethyl ether acetate MP: 1-methoxy-2-propanol AcOEt: ethyl acetate
(重合率)
 核磁気共鳴(NMR)測定装置(Bruker社製、型式:AVANCE500(周波数500MHz))を用いて、1H-NMRを測定(溶媒:重水素化クロロホルム、内部標準:テトラメチルシラン)した。得られたNMRスペクトルについて、モノマー由来のビニル基と、ポリマー由来のエステル側鎖のピークの積分比を求め、モノマーの重合率を算出した。
(Polymerization rate)
1 H-NMR was measured (solvent: deuterated chloroform, internal standard: tetramethylsilane) using a nuclear magnetic resonance (NMR) measuring apparatus (manufactured by Bruker, model: AVANCE500 (frequency: 500 MHz)). About the obtained NMR spectrum, the integration ratio of the monomer-derived vinyl group and the peak of the polymer-derived ester side chain was determined, and the polymerization rate of the monomer was calculated.
(重量平均分子量(Mw)および分子量分布(PDI))
 高速液体クロマトグラフ(東ソー製、型式:HLC8320)を用いて、ゲル浸透クロマトグラフィー(GPC)により求めた。カラムはSHODEX KF-603(Φ6.0mm×150mm)(SHODEX社製)を1本、移動相に30mmol/L臭化リチウム-30mmol/L酢酸-N-メチルピロリドン、検出器に示差屈折率検出器を使用した。測定条件は、カラム温度を40℃、試料濃度を100mg/mL、試料注入量を10μL、流速を0.6mL/minとした。標準物質としてポリスチレン(東ソー社製、TSK Standard)を使用して検量線(校正曲線)を作成し、重量平均分子量(Mw)、数平均分子量(Mn)を測定した。これらの測定値から分子量分布(PDI)を算出した。
(Weight average molecular weight (Mw) and molecular weight distribution (PDI))
It calculated | required by the gel permeation chromatography (GPC) using the high performance liquid chromatograph (The Tosoh make, model: HLC8320). One column is SHODEX KF-603 (Φ6.0 mm × 150 mm) (manufactured by SHODEX), 30 mmol / L lithium bromide-30 mmol / L acetic acid-N-methylpyrrolidone is used as a mobile phase, and a differential refractive index detector is used as a detector. It was used. The measurement conditions were a column temperature of 40 ° C., a sample concentration of 100 mg / mL, a sample injection amount of 10 μL, and a flow rate of 0.6 mL / min. A calibration curve (calibration curve) was prepared using polystyrene (manufactured by Tosoh Corporation, TSK Standard) as a standard substance, and a weight average molecular weight (Mw) and a number average molecular weight (Mn) were measured. Molecular weight distribution (PDI) was calculated from these measured values.
(アミン価)
 アミン価は、固形分1gあたりの塩基性成分と当量の水酸化カリウム(KOH)の質量で表したものである。測定試料をテトラヒドロフランに溶解し、電位差滴定装置(商品名:915 KF Ti-touch、Metrohm社製)を用いて、得られた溶液を0.1mol/L塩酸/2-プロパノール溶液で中和滴定した。滴定pH曲線の変曲点を滴定終点として次式によりアミン価(B)を算出した。
B=56.11×Vs×0.1×f/w
B:アミン価(mgKOH/g)
Vs:滴定に要した0.1mol/L塩酸/2-プロパノール溶液の使用量(mL)
f:0.1mol/L塩酸/2-プロパノール溶液の力価
w:測定試料の質量(g)(固形分換算)
(Amine number)
The amine value is expressed by the mass of potassium hydroxide (KOH) equivalent to the basic component per gram of the solid content. The measurement sample was dissolved in tetrahydrofuran, and the obtained solution was neutralized with 0.1 mol / L hydrochloric acid / 2-propanol solution using a potentiometric titrator (trade name: 915 KF Ti-touch, manufactured by Metrohm). . The amine value (B) was calculated by the following formula using the inflection point of the titration pH curve as the titration end point.
B = 56.11 × Vs × 0.1 × f / w
B: Amine value (mgKOH / g)
Vs: Amount of 0.1 mol / L hydrochloric acid / 2-propanol solution required for titration (mL)
f: Potency of 0.1 mol / L hydrochloric acid / 2-propanol solution w: Mass of measurement sample (g) (converted to solid content)
(酸価)
 酸価は、固形分1gあたりの酸性成分を中和するのに要する水酸化カリウムの質量を表したものである。測定試料をテトラヒドロフロンに溶解し、得られた溶液を0.5mol/L水酸化カリウム/エタノール溶液で中和滴定した。次式により酸価(A)を算出した。
A=56.11×Vs×0.5×f/w
A:酸価(mgKOH/g)
Vs:滴定に要した0.5mol/L水酸化カリウム/エタノール溶液の使用量 (mL)
f:0.5mol/L水酸化カリウム/エタノール溶液の力価
w:測定試料の質量(g)(固形分換算)
(Acid value)
The acid value represents the mass of potassium hydroxide required to neutralize acidic components per gram of solid content. The measurement sample was dissolved in tetrahydrofuron, and the resulting solution was subjected to neutralization titration with a 0.5 mol / L potassium hydroxide / ethanol solution. The acid value (A) was calculated by the following formula.
A = 56.11 × Vs × 0.5 × f / w
A: Acid value (mgKOH / g)
Vs: Amount of 0.5 mol / L potassium hydroxide / ethanol solution required for titration (mL)
f: Potency of 0.5 mol / L potassium hydroxide / ethanol solution w: Mass (g) of measurement sample (converted to solid content)
(粘度)
 E型粘度計(商品名:TVE-22L、東機産業社製)を用い、コーンローター(1°34’×R24)のを使用して、25℃下、ローター回転数100rpmで粘度を測定した。
(viscosity)
Using an E-type viscometer (trade name: TVE-22L, manufactured by Toki Sangyo Co., Ltd.), using a cone rotor (1 ° 34 ′ × R24), the viscosity was measured at 25 ° C. and a rotor rotation speed of 100 rpm. .
(加熱重量減少温度)
 熱重量・示差熱同時測定装置(TG-DTA)(SIIナノテクノロジー社製、TG-DTA6300)を用いて測定した。測定試料は、測定前に温度130℃で2時間減圧乾燥した。測定条件は、試料質量約10mg、空気流入量200ml/min、昇温速度10℃/min、測定温度範囲40℃~600℃とした。得られたTG曲線から試料質量が10%減少した温度を読み取り、これを加熱重量減少温度とした。
(Heating weight reduction temperature)
The measurement was performed using a thermogravimetric / differential thermal simultaneous measurement apparatus (TG-DTA) (TG-DTA6300, manufactured by SII Nanotechnology). The measurement sample was dried under reduced pressure at 130 ° C. for 2 hours before measurement. The measurement conditions were a sample mass of about 10 mg, an air inflow rate of 200 ml / min, a heating rate of 10 ° C./min, and a measurement temperature range of 40 ° C. to 600 ° C. The temperature at which the sample mass decreased by 10% was read from the obtained TG curve, and this was taken as the heating weight decrease temperature.
(ハロゲンアニオンの含有量)
 試料調整は、次のようにして行った。第二組成物質量約10mgを燃焼炉(商品名:AQF-2100H、三菱化学アナリテック製)に投入した。燃焼炉のヒーターは900℃(内側)、ガス流量をアルゴン200mL/min、酸素400mL/min、加湿用アルゴン100mL/min、燃焼炉滞在時間を15分とした。排気ガスを捕集器(商品名:AU-250、三菱化学アナリテック製)で捕捉した。吸収液に超純水を使用し、得られた吸水液35mLを、超純水を用いて50mLに希釈し試料溶液を調整した。
 ハロゲンアニオンの含有量は、イオンクロマトグラフィー(商品名:DIONEX ICS-1600、Thermo Scientific製)を用いて測定した。カラムはIon Pac AS-14A(DIONEX製)、溶離液は陰イオン分析用溶離液(商品名:AS12A,DIONEX製)を使用した。測定条件は、試料注入量を25μL、流速を1.5mL/minとした。標準物質として塩素アニオン濃度1ppm、2ppmの標準液を使用して検量線(校正曲線)を作成し、塩素アニオン濃度を算出した。
(Halogen anion content)
Sample preparation was performed as follows. About 10 mg of the second composition substance was put into a combustion furnace (trade name: AQF-2100H, manufactured by Mitsubishi Chemical Analytech). The heater of the combustion furnace was 900 ° C. (inside), the gas flow rate was 200 mL / min of argon, 400 mL / min of oxygen, 100 mL / min of argon for humidification, and the residence time of the combustion furnace was 15 minutes. The exhaust gas was captured by a collector (trade name: AU-250, manufactured by Mitsubishi Chemical Analytech). The sample solution was prepared by using ultrapure water as the absorbing solution and diluting 35 mL of the obtained water absorbing solution to 50 mL using ultrapure water.
The content of the halogen anion was measured using ion chromatography (trade name: DIONEX ICS-1600, manufactured by Thermo Scientific). The column used was Ion Pac AS-14A (manufactured by DIONEX), and the eluent used was an eluent for anion analysis (trade name: AS12A, manufactured by DIONEX). The measurement conditions were a sample injection volume of 25 μL and a flow rate of 1.5 mL / min. A calibration curve (calibration curve) was prepared using a standard solution having a chlorine anion concentration of 1 ppm and 2 ppm as a standard substance, and the chlorine anion concentration was calculated.
<共重合体の製造>
(ブロック共重合体の前駆体No.1)
 アルゴンガス導入管、撹拌機を備えたフラスコにMMA 46.1g、BMA 22.2g、EHMA 20.9g、BzMA 15.4g、M4EGM 8.1g、MAA 8.1g、AIBN 0.82g、PMA 80.5gを仕込み、アルゴン置換後、BTEE 7.49g、DBDT 4.61gを加え、60℃で15時間反応させAブロックを重合した。重合率は99%であった。
<Manufacture of copolymer>
(Precursor No. 1 of block copolymer)
In a flask equipped with an argon gas introduction tube and a stirrer, MMA 46.1 g, BMA 22.2 g, EHMA 20.9 g, BzMA 15.4 g, M4EGM 8.1 g, MAA 8.1 g, AIBN 0.82 g, PMA 80. After charging 5 g and substituting with argon, 7.49 g of BTEE and 4.61 g of DBDT were added and reacted at 60 ° C. for 15 hours to polymerize the A block. The polymerization rate was 99%.
 反応溶液に、予めアルゴン置換したDMAEMA 54.3g、AIBN 0.41g、PMA 36.2gの混合溶液を加え、60℃で10時間反応さ、Bブロックを重合した。重合率は98%であった。 To the reaction solution, a mixed solution of DMAEMA 54.3 g, AIBN 0.41 g, and PMA 36.2 g previously substituted with argon was added and reacted at 60 ° C. for 10 hours to polymerize the B block. The polymerization rate was 98%.
 反応終了後、反応液に予めアルゴン置換したメタノール(165g)を加え希釈し、塩化ベンジル(15.3g)を希釈溶液に加え、60℃で10時間反応させることで4級化した。 After completion of the reaction, methanol (165 g) previously substituted with argon was added to the reaction solution for dilution, and benzyl chloride (15.3 g) was added to the diluted solution, followed by reaction at 60 ° C. for 10 hours for quaternization.
 反応終了後、撹拌しているn-ヘプタン中に注いだ。析出したポリマーを吸引濾過、乾燥することによりブロック共重合体の前駆体No.1を得た。得られたブロック共重合体の前駆体No.1はMwが7618、PDIが1.30、酸価が32mgKOH/g、アミン価が64mgKOH/g、加熱重量減少温度が254℃であった。 After the reaction, the mixture was poured into n-heptane that was being stirred. The precipitated polymer was filtered by suction and dried to obtain a precursor No. of block copolymer. 1 was obtained. Precursor No. of the obtained block copolymer 1 had an Mw of 7618, a PDI of 1.30, an acid value of 32 mgKOH / g, an amine value of 64 mgKOH / g, and a heating weight loss temperature of 254 ° C.
(ブロック共重合体の前駆体No.2~12)
 ブロック共重合体の前駆体No.1の作製方法と同様にしてブロック共重合体の前駆体No.2~12を作製した。表1、2に、使用した原料モノマー、有機テルル化合物、有機ジテルル化合物、アゾ系重合開始剤、溶媒、4級化剤、反応条件、重合率を示した。また、表3、4に、各ブロック共重合体の前駆体の組成、Mw、PDI、酸価、アミン価、加熱重量減少温度を示した。
(Block copolymer precursor Nos. 2 to 12)
Block copolymer precursor no. The block copolymer precursor No. 1 was prepared in the same manner as in the preparation method of No. 1. 2 to 12 were produced. Tables 1 and 2 show the raw material monomers, organic tellurium compounds, organic ditellurium compounds, azo polymerization initiators, solvents, quaternizing agents, reaction conditions, and polymerization rates used. Tables 3 and 4 show the composition of precursors of each block copolymer, Mw, PDI, acid value, amine value, and heating weight reduction temperature.
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000034
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000035
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000036
Figure JPOXMLDOC01-appb-T000037
Figure JPOXMLDOC01-appb-T000037
(ブロック共重合体の第一組成物No.31)
 上記で得られたブロック共重合体の前駆体No.1 87.5gに、PMA 110g、MP 110gを加え溶解させた。得られた溶液にPIK 11.2gを加え、60℃で20時間反応させることでアニオン交換した。反応液を濾過した後、濾液から溶媒を除去し、ブロック共重合体の第一組成物No.31を得た。得られた第一組成物No.31は、含まれるブロック共重合体のMwが7479、PDIが1.23であり、第一組成物No.31の酸価が31mgKOH/g、アミン価が101mgKOH/g、加熱重量減少温度が273℃であった。
(First composition No. 31 of block copolymer)
The block copolymer precursor No. obtained above. 1 PMA 110g and MP 110g were added to 87.5g and dissolved. Anion exchange was performed by adding 11.2 g of PIK to the obtained solution and reacting at 60 ° C. for 20 hours. After the reaction solution was filtered, the solvent was removed from the filtrate, and the first composition No. 1 of the block copolymer was removed. 31 was obtained. The obtained first composition No. No. 31 has a block copolymer Mw of 7479 and PDI of 1.23. The acid value of 31 was 31 mgKOH / g, the amine value was 101 mgKOH / g, and the heating weight loss temperature was 273 ° C.
(ブロック共重合体の第一組成物No.32~46)
 ブロック共重合体の第一組成物No.31の作製方法と同様にして第一組成物No.32~46を作製した。表5、6に、使用した原料共重合体、アニオン交換剤、溶媒、反応条件を示した。また、表7、8に、第一組成物に含まれるブロック共重合体の組成、Mw、PDI、および、第一組成物の酸価、アミン価、加熱重量減少温度を示した。
(First composition No. 32-46 of block copolymer)
First composition No. of block copolymer In the same manner as the production method of No. 31, the first composition No. 32-46 were produced. Tables 5 and 6 show the raw material copolymers, anion exchangers, solvents and reaction conditions used. Tables 7 and 8 show the composition of the block copolymer contained in the first composition, Mw, PDI, and the acid value, amine value, and heating weight reduction temperature of the first composition.
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000038
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000039
Figure JPOXMLDOC01-appb-T000040
Figure JPOXMLDOC01-appb-T000040
Figure JPOXMLDOC01-appb-T000041
Figure JPOXMLDOC01-appb-T000041
(ブロック共重合体の第二組成物No.51)
 上記で得られたブロック共重合体の前駆体No.1 87.5gに、PMA 110g、MP 110gを加え溶解させた。得られた溶液にPIK 11.2gを加え、60℃で20時間反応させることでアニオン交換した。得られた反応液を冷却後、酢酸エチル、水を加え40℃で1時間撹拌した。分液を行い、有機層を獲得した。得られた有機層を減圧濃縮し、乾燥することでブロック共重合体の第二組成物No.51を得た。得られたブロック共重合体の第二組成物No.51は、含まれるブロック共重合体のMwが7852、PDIが1.21であった。また、第二組成物の酸価が32mgKOH/g、アミン価が89mgKOH/g、加熱重量減少温度が291℃、塩素アニオン含有量が3501ppm(固形分換算)であった。
(Block copolymer second composition No. 51)
The block copolymer precursor No. obtained above. 1 PMA 110g and MP 110g were added to 87.5g and dissolved. Anion exchange was performed by adding 11.2 g of PIK to the obtained solution and reacting at 60 ° C. for 20 hours. The obtained reaction solution was cooled, ethyl acetate and water were added, and the mixture was stirred at 40 ° C. for 1 hour. Liquid separation was performed to obtain an organic layer. The obtained organic layer was concentrated under reduced pressure and dried to obtain a second composition No. 2 of the block copolymer. 51 was obtained. The second composition No. of the obtained block copolymer. 51, Mw of the block copolymer contained was 7852, and PDI was 1.21. Further, the acid value of the second composition was 32 mg KOH / g, the amine value was 89 mg KOH / g, the heating weight reduction temperature was 291 ° C., and the chlorine anion content was 3501 ppm (solid content conversion).
(ブロック共重合体の第二組成物No.52~65)
 ブロック共重合体の第二組成物No.51の作製方法と同様にして第二組成物No.53~65を作製した。表9、10に、第二組成物に含まれるブロック共重合体の組成、Mw、PDI、および、第二組成物の酸価、アミン価、加熱重量減少温度を示した。得られた第二組成物No.59の塩素アニオン含有量は6615ppm(固形分換算)であった。
(Second composition No. 52 to 65 of block copolymer)
The second composition No. of the block copolymer. In the same manner as the production method of No. 51, the second composition No. 53 to 65 were produced. Tables 9 and 10 show the composition of the block copolymer contained in the second composition, Mw, PDI, and the acid value, amine value, and heating weight reduction temperature of the second composition. The obtained second composition No. The chlorine anion content of 59 was 6615 ppm (in terms of solid content).
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000043
<顔料分散組成物の製造>
(顔料分散組成物1)
 C.I.Pigment Red254(商品名:BKCF、チバ・スペシャリティ・ケミカルズ社製) 10質量部、ブロック共重合体の前駆体No.1 3質量部、バインダー樹脂(メタクリル酸ベンジル/メタクル酸=80/20の質量比で重合させたもの、Mw=12024、PDI=1.83、酸価130mgKOH/g、固形分39質量%のPMA溶液) 3質量部、MP 3質量部、PMA 81質量部となるように配合を調製し、遊星ボールミル(0.3mmジルコニアビーズ)で2時間攪拌することで顔料分散組成物を製造した。得られた顔料分散組成物の粘度は4.0mPa・sであった。
<Production of pigment dispersion composition>
(Pigment dispersion composition 1)
C. I. Pigment Red254 (trade name: BKCF, manufactured by Ciba Specialty Chemicals) 10 parts by mass, precursor No. of block copolymer. 13 parts by mass, binder resin (polymerized at a mass ratio of benzyl methacrylate / methacrylic acid = 80/20, Mw = 1024, PDI = 1.83, acid value 130 mgKOH / g, PMA having a solid content of 39% by mass Solution) A blended composition was prepared by preparing 3 parts by mass, 3 parts by mass of MP, and 81 parts by mass of PMA, and stirring for 2 hours with a planetary ball mill (0.3 mm zirconia beads). The viscosity of the obtained pigment dispersion composition was 4.0 mPa · s.
(顔料分散組成物2)
 C.I.Pigment Red254(商品名:BKCF、チバ・スペシャリティ・ケミカルズ社製) 10質量部、ブロック共重合体の第二組成物No.51 3質量部、バインダー樹脂(メタクリル酸ベンジル/メタクル酸=80/20の質量比で重合させたもの、Mw=12024、PDI=1.83、酸価130mgKOH/g、固形分39質量%のPMA溶液) 3質量部、MP 3質量部、PMA 81質量部となるように配合を調製し、遊星ボールミル(0.3mmジルコニアビーズ)で2時間攪拌することで顔料分散組成物を製造した。得られた顔料分散組成物の粘度は3.0mPa・sであった。
(Pigment dispersion composition 2)
C. I. Pigment Red254 (trade name: BKCF, manufactured by Ciba Specialty Chemicals) 10 parts by mass, the second composition No. of the block copolymer. 51 3 parts by mass, binder resin (polymerized at a mass ratio of benzyl methacrylate / methacrylic acid = 80/20, Mw = 1024, PDI = 1.83, acid value 130 mgKOH / g, PMA having a solid content of 39% by mass Solution) A blended composition was prepared by preparing 3 parts by mass, 3 parts by mass of MP, and 81 parts by mass of PMA, and stirring for 2 hours with a planetary ball mill (0.3 mm zirconia beads). The viscosity of the obtained pigment dispersion composition was 3.0 mPa · s.
 本発明には以下の実施態様が含まれる。
(実施態様1)
 酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、下記一般式(1)で表される構造単位および下記一般式(2)で表される構造単位を含むBブロックとを有することを特徴とするブロック共重合体。
The present invention includes the following embodiments.
(Embodiment 1)
It has an A block containing a structural unit derived from a vinyl monomer having an acidic group, and a B block containing a structural unit represented by the following general formula (1) and a structural unit represented by the following general formula (2). A block copolymer characterized by
Figure JPOXMLDOC01-appb-C000044
〔式(1)において、R11、R12およびR13は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R11、R12およびR13のうち2つ以上が互いに結合して環状構造を形成していてもよい。X1は2価の連結基を示す。R14は水素原子またはメチル基を示す。Y-は芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンおよび芳香族カルボン酸アニオンよりなる群から選択される少なくとも1種を示す。〕
Figure JPOXMLDOC01-appb-C000044
[In Formula (1), R <11> , R < 12 > and R < 13 > show the chain or cyclic hydrocarbon group which may have a substituent each independently. Two or more of R 11 , R 12 and R 13 may be bonded to each other to form a cyclic structure. X 1 represents a divalent linking group. R 14 represents a hydrogen atom or a methyl group. Y represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion, and an aromatic carboxylate anion. ]
Figure JPOXMLDOC01-appb-C000045
〔式(2)において、R21およびR22は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R21およびR22が互いに結合して環状構造を形成していてもよい。X2は2価の連結基を示す。R23は水素原子またはメチル基を示す。〕
Figure JPOXMLDOC01-appb-C000045
[In Formula (2), R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure. X 2 represents a divalent linking group. R 23 represents a hydrogen atom or a methyl group. ]
(実施態様2)
 A-B型ブロック共重合体である実施態様1に記載のブロック共重合体。
(Embodiment 2)
The block copolymer according to embodiment 1, which is an AB type block copolymer.
(実施態様3)
 前記酸性基を有するビニルモノマーに由来する構造単位の含有率が、前記Aブロック100質量%中において2質量%~20質量%である実施態様1または2に記載のブロック共重合体。
(Embodiment 3)
The block copolymer according to embodiment 1 or 2, wherein the content of the structural unit derived from the vinyl monomer having an acidic group is 2% by mass to 20% by mass in 100% by mass of the A block.
(実施態様4)
 前記一般式(1)で表される構造単位の含有率が、前記Bブロック100質量%中において30質量%~85質量%である実施態様1~3のいずれか一項に記載のブロック共重合体。
(Embodiment 4)
The block co-polymerization according to any one of embodiments 1 to 3, wherein the content of the structural unit represented by the general formula (1) is 30% by mass to 85% by mass in 100% by mass of the B block. Coalescence.
(実施態様5)
 前記Aブロックの含有率が、ブロック共重合体100質量%中において35質量%~85質量%である実施態様1~4のいずれか一項に記載のブロック共重合体。
(Embodiment 5)
The block copolymer according to any one of embodiments 1 to 4, wherein the content of the A block is 35% by mass to 85% by mass in 100% by mass of the block copolymer.
(実施態様6)
 実施態様1~5のいずれか一項に記載のブロック共重合体を含有する第一組成物。
(Embodiment 6)
A first composition comprising the block copolymer according to any one of embodiments 1 to 5.
(実施態様7)
 前記ブロック共重合体の分子量分布(PDI)が2.0以下である実施態様6に記載の第一組成物。
(Embodiment 7)
The 1st composition of Embodiment 6 whose molecular weight distribution (PDI) of the said block copolymer is 2.0 or less.
(実施態様8)
 実施態様7の第一組成物を、水洗し、乾燥して得られる第二組成物。
(Embodiment 8)
A second composition obtained by washing the first composition of Embodiment 7 with water and drying.
(実施態様9)
 実施態様1~6のいずれか一つに記載のブロック共重合体、実施態様7に記載の第一組成物または実施態様8に記載の第二組成物を含有する分散剤。
(Embodiment 9)
A dispersant comprising the block copolymer according to any one of Embodiments 1 to 6, the first composition according to Embodiment 7, or the second composition according to Embodiment 8.
(実施態様10)
 実施態様9に記載の分散剤と顔料と分散媒体を含有する顔料分散組成物。
(Embodiment 10)
A pigment dispersion composition comprising the dispersant according to embodiment 9, a pigment, and a dispersion medium.
(実施態様11)
 カラーフィルタ用である実施態様10に記載の顔料分散組成物。
(Embodiment 11)
The pigment dispersion composition according to embodiment 10, which is for a color filter.
(実施態様12)
 酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、下記一般式(2)で表される構造単位および下記一般式(3)で表される構造単位を含むBブロックとを有するブロック共重合体の前駆体を準備する工程(A)と、
 前記工程(A)で得られたブロック共重合体の前駆体に、芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸よりなる群から選択される少なくとも1種のアルカリ金属塩を作用させ、ブロック共重合体を得る工程(B)とを備えることを特徴とするブロック共重合体の製造方法。
(Embodiment 12)
A block having an A block containing a structural unit derived from a vinyl monomer having an acidic group, and a B block containing a structural unit represented by the following general formula (2) and a structural unit represented by the following general formula (3) Preparing a copolymer precursor (A);
The precursor of the block copolymer obtained in the step (A) is at least one alkali selected from the group consisting of aromatic dicarboxylic imides, aromatic sulfonic acids, aromatic phosphonic acids and aromatic carboxylic acids. And a step (B) of obtaining a block copolymer by allowing a metal salt to act, and a method for producing a block copolymer.
Figure JPOXMLDOC01-appb-C000046
〔式(2)において、R21およびR22は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R21およびR22が互いに結合して環状構造を形成していてもよい。X2は2価の連結基を示す。R23は水素原子またはメチル基を示す。〕
Figure JPOXMLDOC01-appb-C000046
[In Formula (2), R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure. X 2 represents a divalent linking group. R 23 represents a hydrogen atom or a methyl group. ]
Figure JPOXMLDOC01-appb-C000047
〔式(3)において、R31、R32およびR33は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R31、R32およびR33のうち2つ以上が互いに結合して環状構造を形成していてもよい。X3は2価の連結基を示す。R34は水素原子またはメチル基を示す。X-はハロゲンアニオンを示す。〕
Figure JPOXMLDOC01-appb-C000047
[In the formula (3), R 31 , R 32 and R 33 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. Two or more of R 31 , R 32 and R 33 may be bonded to each other to form a cyclic structure. X 3 represents a divalent linking group. R 34 represents a hydrogen atom or a methyl group. X represents a halogen anion. ]
(実施態様13)
 前記工程(A)において、リビングラジカル重合を用いて前記第一ブロック共重合体の前駆体を準備する実施態様12に記載のブロック共重合体の製造方法。
(Embodiment 13)
The method for producing a block copolymer according to embodiment 12, wherein in the step (A), a precursor of the first block copolymer is prepared using living radical polymerization.
(実施態様14)
 前記工程(B)で得られたブロック共重合体を、水洗する工程(C)を備える実施態様12または13に記載のブロック共重合体の製造方法。
(Embodiment 14)
The manufacturing method of the block copolymer of Embodiment 12 or 13 provided with the process (C) which wash | cleans the block copolymer obtained at the said process (B) with water.
 本発明のブロック共重合体は、Aブロックが酸性基を有することで、アルカリ現像が容易になる。また、Bブロックの4級アンモニウムカチオンの対イオンが、芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンまたは芳香族カルボン酸アニオンであるため、耐熱性に優れる。よって、本発明のブロック共重合体は、アルカリ現像を採用したカラーフィルタの製造に使用されるカラーフィルタ用の顔料分散組成物に好適に使用できる。 In the block copolymer of the present invention, alkali development is facilitated because the A block has an acidic group. In addition, since the counter ion of the quaternary ammonium cation of the B block is an aromatic dicarboxylic acid imide anion, an aromatic sulfonic acid anion, an aromatic phosphonic acid anion or an aromatic carboxylic acid anion, the heat resistance is excellent. Therefore, the block copolymer of this invention can be used conveniently for the pigment dispersion composition for color filters used for manufacture of the color filter which employ | adopted alkali image development.

Claims (14)

  1.  酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、下記一般式(1)で表される構造単位および下記一般式(2)で表される構造単位を含むBブロックとを有することを特徴とするブロック共重合体。
    Figure JPOXMLDOC01-appb-C000001
    〔式(1)において、R11、R12およびR13は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R11、R12およびR13のうち2つ以上が互いに結合して環状構造を形成していてもよい。X1は2価の連結基を示す。R14は水素原子またはメチル基を示す。Y-は芳香族ジカルボン酸イミドアニオン、芳香族スルホン酸アニオン、芳香族ホスホン酸アニオンおよび芳香族カルボン酸アニオンよりなる群から選択される少なくとも1種を示す。〕
    Figure JPOXMLDOC01-appb-C000002
    〔式(2)において、R21およびR22は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R21およびR22が互いに結合して環状構造を形成していてもよい。X2は2価の連結基を示す。R23は水素原子またはメチル基を示す。〕
    It has an A block containing a structural unit derived from a vinyl monomer having an acidic group, and a B block containing a structural unit represented by the following general formula (1) and a structural unit represented by the following general formula (2). A block copolymer characterized by
    Figure JPOXMLDOC01-appb-C000001
    [In Formula (1), R <11> , R < 12 > and R < 13 > show the chain or cyclic hydrocarbon group which may have a substituent each independently. Two or more of R 11 , R 12 and R 13 may be bonded to each other to form a cyclic structure. X 1 represents a divalent linking group. R 14 represents a hydrogen atom or a methyl group. Y represents at least one selected from the group consisting of an aromatic dicarboxylic imide anion, an aromatic sulfonate anion, an aromatic phosphonate anion, and an aromatic carboxylate anion. ]
    Figure JPOXMLDOC01-appb-C000002
    [In Formula (2), R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure. X 2 represents a divalent linking group. R 23 represents a hydrogen atom or a methyl group. ]
  2.  A-B型ブロック共重合体である請求項1に記載のブロック共重合体。 The block copolymer according to claim 1, which is an AB type block copolymer.
  3.  前記酸性基を有するビニルモノマーに由来する構造単位の含有率が、前記Aブロック100質量%中において2質量%~20質量%である請求項1または2に記載のブロック共重合体。 3. The block copolymer according to claim 1, wherein the content of the structural unit derived from the vinyl monomer having an acidic group is 2% by mass to 20% by mass in 100% by mass of the A block.
  4.  前記一般式(1)で表される構造単位の含有率が、前記Bブロック100質量%中において30質量%~85質量%である請求項1~3のいずれか一項に記載のブロック共重合体。 The block co-polymerization weight according to any one of claims 1 to 3, wherein the content of the structural unit represented by the general formula (1) is 30% by mass to 85% by mass in 100% by mass of the B block. Coalescence.
  5.  前記Aブロックの含有率が、ブロック共重合体100質量%中において35質量%~85質量%である請求項1~4のいずれか一項に記載のブロック共重合体。 The block copolymer according to any one of claims 1 to 4, wherein the content of the A block is 35% by mass to 85% by mass in 100% by mass of the block copolymer.
  6.  請求項1~5のいずれか一項に記載のブロック共重合体を含有する第一組成物。 A first composition comprising the block copolymer according to any one of claims 1 to 5.
  7.  前記ブロック共重合体の分子量分布(PDI)が2.0以下である請求項6に記載の第一組成物。 The first composition according to claim 6, wherein the block copolymer has a molecular weight distribution (PDI) of 2.0 or less.
  8.  請求項7に記載の第一組成物を、水洗し、乾燥して得られる第二組成物。 A second composition obtained by washing the first composition according to claim 7 with water and drying.
  9.  請求項1~6のいずれか一項に記載のブロック共重合体、請求項7に記載の第一組成物または請求項8に記載の第二組成物を含有する分散剤。 A dispersant containing the block copolymer according to any one of claims 1 to 6, the first composition according to claim 7, or the second composition according to claim 8.
  10.  請求項9に記載の分散剤と顔料と分散媒体を含有する顔料分散組成物。 A pigment dispersion composition comprising the dispersant according to claim 9, a pigment, and a dispersion medium.
  11.  カラーフィルタ用である請求項10に記載の顔料分散組成物。 The pigment dispersion composition according to claim 10, which is used for a color filter.
  12.  酸性基を有するビニルモノマーに由来する構造単位を含むAブロックと、下記一般式(2)で表される構造単位および下記一般式(3)で表される構造単位を含むBブロックとを有するブロック共重合体の前駆体を準備する工程(A)と、
     前記工程(A)で得られたブロック共重合体の前駆体に、芳香族ジカルボン酸イミド、芳香族スルホン酸、芳香族ホスホン酸および芳香族カルボン酸よりなる群から選択される少なくとも1種のアルカリ金属塩を作用させ、ブロック共重合体を得る工程(B)とを備えることを特徴とするブロック共重合体の製造方法。
    Figure JPOXMLDOC01-appb-C000003
    〔式(2)において、R21およびR22は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R21およびR22が互いに結合して環状構造を形成していてもよい。X2は2価の連結基を示す。R23は水素原子またはメチル基を示す。〕
    Figure JPOXMLDOC01-appb-C000004
    〔式(3)において、R31、R32およびR33は、それぞれ独立して、置換基を有していてもよい鎖状もしくは環状の炭化水素基を示す。R31、R32およびR33のうち2つ以上が互いに結合して環状構造を形成していてもよい。X3は2価の連結基を示す。R34は水素原子またはメチル基を示す。X-はハロゲンアニオンを示す。〕
    A block having an A block containing a structural unit derived from a vinyl monomer having an acidic group, and a B block containing a structural unit represented by the following general formula (2) and a structural unit represented by the following general formula (3) Preparing a copolymer precursor (A);
    The precursor of the block copolymer obtained in the step (A) is at least one alkali selected from the group consisting of aromatic dicarboxylic imides, aromatic sulfonic acids, aromatic phosphonic acids and aromatic carboxylic acids. And a step (B) of obtaining a block copolymer by allowing a metal salt to act, and a method for producing a block copolymer.
    Figure JPOXMLDOC01-appb-C000003
    [In Formula (2), R 21 and R 22 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. R 21 and R 22 may be bonded to each other to form a cyclic structure. X 2 represents a divalent linking group. R 23 represents a hydrogen atom or a methyl group. ]
    Figure JPOXMLDOC01-appb-C000004
    [In the formula (3), R 31 , R 32 and R 33 each independently represent a chain or cyclic hydrocarbon group which may have a substituent. Two or more of R 31 , R 32 and R 33 may be bonded to each other to form a cyclic structure. X 3 represents a divalent linking group. R 34 represents a hydrogen atom or a methyl group. X represents a halogen anion. ]
  13.  前記工程(A)において、リビングラジカル重合を用いて前記ブロック共重合体の前駆体を準備する請求項12に記載のブロック共重合体の製造方法。 The method for producing a block copolymer according to claim 12, wherein in the step (A), a precursor of the block copolymer is prepared using living radical polymerization.
  14.  前記工程(B)で得られたブロック共重合体を、水洗する工程(C)を備える請求項12または13に記載のブロック共重合体の製造方法。 The method for producing a block copolymer according to claim 12 or 13, comprising a step (C) of washing the block copolymer obtained in the step (B) with water.
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021039787A1 (en) * 2019-08-26 2021-03-04
KR20210043707A (en) 2019-09-06 2021-04-21 미쯔비시 케미컬 주식회사 Photosensitive coloring composition, cured product, image display device, and pigment dispersion for image display device
JP2021063180A (en) * 2019-10-15 2021-04-22 大塚化学株式会社 Dispersant composition, coloring composition, and color filter
JP2021075660A (en) * 2019-11-12 2021-05-20 大日精化工業株式会社 Pigment dispersion
JP2022003133A (en) * 2019-08-26 2022-01-11 国立大学法人富山大学 Fine particle adsorption prevention polymer

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7235474B2 (en) * 2018-10-25 2023-03-08 大塚化学株式会社 Coloring composition and color filter
JP7235475B2 (en) * 2018-10-25 2023-03-08 大塚化学株式会社 Coloring composition and color filter
CN117981107A (en) * 2022-07-08 2024-05-03 宁德时代新能源科技股份有限公司 Dispersing agent and preparation method thereof, slurry composition and preparation method thereof, electrode plate and device comprising electrode plate

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010079244A (en) * 2008-08-26 2010-04-08 Dainippon Printing Co Ltd Negative resist composition for color filter, color filter, and liquid crystal display
WO2012001945A1 (en) * 2010-06-30 2012-01-05 日本曹達株式会社 Novel copolymer
WO2015198422A1 (en) * 2014-06-25 2015-12-30 大日精化工業株式会社 A-b block co-polymer, a-b block co-polymer production method, resin treatment pigment composition, resin treatment pigment composition production method, pigment dispersion, and pigment dispersion solution
JP2017082198A (en) * 2015-09-23 2017-05-18 ベーイプシロンカー ヘミー ゲゼルシャフト ミット ベシュレンクター ハフトゥング Coloring agent composition containing wetting agent and/or dispersant with low amine value

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4133267B2 (en) * 2002-11-29 2008-08-13 三菱化学株式会社 Pigment dispersion composition and color filter using the same
WO2009138493A1 (en) * 2008-05-15 2009-11-19 Dsm Ip Assets B.V. Block copolymers obtained using raft
JP2012068559A (en) 2010-09-27 2012-04-05 Toyo Ink Sc Holdings Co Ltd Coloring composition for color filter and color filter
JP5892510B2 (en) 2012-03-28 2016-03-23 大日精化工業株式会社 Method for producing polymer dispersant

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010079244A (en) * 2008-08-26 2010-04-08 Dainippon Printing Co Ltd Negative resist composition for color filter, color filter, and liquid crystal display
WO2012001945A1 (en) * 2010-06-30 2012-01-05 日本曹達株式会社 Novel copolymer
WO2015198422A1 (en) * 2014-06-25 2015-12-30 大日精化工業株式会社 A-b block co-polymer, a-b block co-polymer production method, resin treatment pigment composition, resin treatment pigment composition production method, pigment dispersion, and pigment dispersion solution
JP2017082198A (en) * 2015-09-23 2017-05-18 ベーイプシロンカー ヘミー ゲゼルシャフト ミット ベシュレンクター ハフトゥング Coloring agent composition containing wetting agent and/or dispersant with low amine value

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7186409B2 (en) 2019-08-26 2022-12-09 国立大学法人富山大学 Fine particle adsorption prevention polymer
WO2021039787A1 (en) * 2019-08-26 2021-03-04 国立大学法人富山大学 Fine particle adsorption-preventing polymer
JPWO2021039787A1 (en) * 2019-08-26 2021-03-04
CN114402004B (en) * 2019-08-26 2023-10-24 国立大学法人富山大学 Anti-particulate adsorption polymers
JP2022003133A (en) * 2019-08-26 2022-01-11 国立大学法人富山大学 Fine particle adsorption prevention polymer
CN114402004A (en) * 2019-08-26 2022-04-26 国立大学法人富山大学 Particulate adsorption preventing polymer
JP7083467B2 (en) 2019-08-26 2022-06-13 国立大学法人富山大学 Fine particle adsorption prevention polymer
KR20210043707A (en) 2019-09-06 2021-04-21 미쯔비시 케미컬 주식회사 Photosensitive coloring composition, cured product, image display device, and pigment dispersion for image display device
KR20220027257A (en) 2019-09-06 2022-03-07 미쯔비시 케미컬 주식회사 Pigment dispersion liquid for image display devices
JP2021063180A (en) * 2019-10-15 2021-04-22 大塚化学株式会社 Dispersant composition, coloring composition, and color filter
JP7348804B2 (en) 2019-10-15 2023-09-21 大塚化学株式会社 Dispersant compositions, coloring compositions and color filters
JP7126169B2 (en) 2019-11-12 2022-08-26 大日精化工業株式会社 pigment dispersion
JP2021075660A (en) * 2019-11-12 2021-05-20 大日精化工業株式会社 Pigment dispersion

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