WO2018050514A1

WO2018050514A1 - Method for producing a siloxane, method for producing a polysiloxane, method for casting optoelectronic components

Info

Publication number: WO2018050514A1
Application number: PCT/EP2017/072358
Authority: WO
Inventors: Patrick WENDEROTH; Ulf BETKE; Guido KICKELBICK
Original assignee: Osram Opto Semiconductors Gmbh
Priority date: 2016-09-16
Filing date: 2017-09-06
Publication date: 2018-03-22
Also published as: DE102016117519A1

Abstract

The invention relates to a method for producing a siloxane by an acid- or base-catalysed reaction of a silanol of formula 1 and a compound of formula 2, (formula 1 formula 2), wherein R⁴, R⁵ and R⁶ independently of one another are selected from a group comprising OH, alkyl and aryl radicals; R¹ is an H or alkyl radical; R² and R³ independently of one another are selected from a group comprising alkoxy, alkyl, and aryl radicals; Y is selected from a group comprising H, alkenyl, alkoxy, alkyl, and aryl radicals, and wherein the catalyst is used in a gaseous state of matter.

Description

description

Process for the preparation of a siloxane, process for the preparation of a polysiloxane, process for the casting of optoelectronic devices

This patent application claims the priority of German Patent Application 10 2016 117 519.6, the disclosure of which is hereby incorporated by reference.

The invention relates to a method for producing a siloxane, a method for producing a polysiloxane and a method for casting optoelectronic

Building elements.

Encapsulation or potting materials of

optoelectronic components, in particular

Light emitting diodes (LEDs), must have a high

Have temperature resistance and a high refractive index with constant transparency and color fidelity. The commercial (poly) siloxanes used hitherto meet the high temperature requirements in particular

light emitting diodes in the high power range (from an electrical power of one watt) only partially. New materials with adjustable properties are therefore essential for higher LED power densities. It is known that such systems of alkoxysilanes or

Silanols by means of a sol-gel reaction to oligo- and

Polymers can be condensed. These reactions are catalysed acidic or basic, using as catalysts solid phase catalysts or liquid catalysts

be used. These are elaborate Purification process necessary to remove the catalysts again from the reaction product.

An object of the present invention is to provide a process for producing siloxanes which can be carried out efficiently and quickly. Further

Tasks are to provide a process for producing a polysiloxane and a method for casting

specify optoelectronic devices.

These tasks are performed by the procedures according to the

solved independent claims. Subordinate claims

advantageous embodiments of the method.

It is a process for producing a siloxane

specified. The process comprises an acid or

base-catalyzed reaction of a silanol of the formula

a compound of formula 2:

Y

R ⁵ -Si-OH R ³ -Si-O

R ⁴ R ²

Formula 1 formula

The catalyst in the form of an acid or base is used in a gaseous state.

R ⁴ , R ⁵ and R ⁶ are independently selected from a group comprising OH, alkyl and aryl radicals. R ¹ is an H or alkyl radical. R ² and R ³ are independent

selected from the group consisting of alkoxy, alkyl and aryl groups. Y is selected from a group comprising H, alkenyl, alkoxy, alkyl and aryl groups. If appropriate, the gaseous catalysts used can simply be removed from the reaction product with the aid of reduced pressure. Compared to

known processes for the preparation of siloxanes, in which solids or liquids are used as catalysts, here advantageously eliminates the costly separation of the solids or liquids from the part

high viscosity products. In the reaction of the silanol of the formula 1 and a

Compound of formula 2 is in particular a condensation reaction. The at least one OH radical of the silanol of the formula 1 reacts with an OR ¹ radical of the formula

Compound of formula 2 to a Si-O-Si bond under

Cleavage of HR ¹ 0. This produces siloxanes, the

in particular may be present polymer or oligomer. Oligomers are to be understood as molecules which are composed of a plurality of structurally identical or similar units, in particular from two to eight identical or similar units

Units. A larger number of repeating structurally identical or similar units are here and below a polymer.

In acidic and basic catalysis new Si-O-Si bonds are formed. In this case, for example, the following reaction can take place between two silanols:

+

R H or OH

\

R-Si-OH + HO-Si-R R-Si-O-Si-R + H ₂ O

/

RR The other compounds of formula 2 react with the silanols of formula 1 used to form new Si-O-Si bonds. In at least one embodiment, the gaseous catalyst is employed in the form of an acid selected from the group comprising HCl, HBr, HI, H ₂ S, carboxylic acids, and combinations thereof. Suitable carboxylic acids are, for example, formic acid, acetic acid, propionic acid or butyric acid or vapors of these acids.

According to at least one embodiment, the gaseous catalyst is used in the form of a base selected from a group consisting of NH ₃ , N (CH ₃ ) ₃ , N (CH ₂ -CH ₃ ) ₃ and

Combinations thereof.

In accordance with at least one embodiment, the catalyst used is a gaseous NH ₃ or gaseous HCl. These catalysts are available at particularly low cost.

In accordance with at least one embodiment, the method comprises the following method steps:

A) providing the silanol of formula 1 and the compound of formula 2 to form a reaction mixture,

B) introducing the catalyst into the reaction mixture from process step A).

The procedure can be carried out without solvents. In one embodiment, method step A) comprises

Dissolving and / or dispersing the silanol of formula 1 and the compound of formula 2 in a solvent to form a reaction mixture. The solvent serves one better miscibility of the educts, so the silanol of

Formula 1 and the compound of formula 2. In particular, the solvent is chosen so that it is well in a subsequent process step of the product

can be separated.

In accordance with at least one embodiment, the catalyst is introduced into the reaction mixture in process step B) in a stream of argon or nitrogen.

According to at least one embodiment, the

Reaction mixture from process step A) before carrying out process step B) heated under reflux. In accordance with at least one embodiment, the reaction mixture is also heated to reflux during process step B). Thus, the reaction of the silanol of formula 1 and the compound of formula 2 can be accelerated. According to at least one embodiment follows

Process step B) a process step C):

C) heating the reaction mixture from step B) and passing a stream of argon or nitrogen.

As a result, the solvent, the catalyst and / or by-products formed evaporate and / or from the

Reaction mixture are removed. It is particularly possible that the reaction mixture during the

Process steps A) to C) is kept constant at a temperature elevated from room temperature, for example at about the boiling point of the solvent or the by-product. In particular, in process step C) there is no reflux cooling, ie heating without reflux, so that the solvent, the catalyst and / or any By-products can be vaporized and / or removed from the product. In particular, the solvent, the catalyst and / or any byproducts can be removed by a stream of argon or nitrogen from the product, the siloxane. With this method, no elaborate workup of the product is necessary. Since the resulting products are sometimes very viscous, a separation of solid catalysts or the separation of liquid catalysts is very tedious and associated with increased effort. The inventive method is therefore very efficient and fast to carry out and therefore economical. In particular, the method is also suitable for large-scale production of siloxanes. According to at least one embodiment is in

Process step C) applied a negative pressure. Thereby, the removal of the solvent, the catalyst and / or the by-products can be accelerated. In accordance with at least one embodiment, the solvent is selected from the group consisting of methanol, ethanol and

Isopropanol includes. The choice of these solvents is advantageous because in the reaction of corresponding alkoxysilanes of formula 2, methanol, ethanol and isopropanol as

By-products can arise and thus the solvent and the by-product can be removed by their identity under the same conditions simultaneously from the product. These alcohols have a boiling point below 100 ° C and can thus be easily removed in step C) with heating from the product.

Alternatively, as the solvent, n-propanol or linear or cyclic ethers, for example diethyl ether or tetrahydrofuran. These solvents can also be easily separated from the product.

In accordance with at least one embodiment of the process, the radicals R ⁴ , R ⁵ and R ^{6 of} the formula 1 are independently selected from a group comprising OH, methyl, ethyl, i-propyl and phenyl radicals.

In accordance with at least one embodiment, the silanol of the formula 1 has one of the following formulas:

R ⁶ R ⁶ OH

HO-Si-OH HO-Si-OH HO-Si-OH

R ⁴ OH OH

Formula la Formula lb Formula lc. The radicals R ⁴ and R ⁶ of formula Ia are independently selected from a group comprising methyl, ethyl, i-propyl and phenyl radicals. R ^{6 of} the formula Ib is from a

Group selected, the methyl, ethyl, i-propyl and

Phenyl radicals includes.

The silanol of the formula Ia may be, for example, one of the following compounds:

HO-Si-OH HO-Si-OH HO-Si-OH

If the silanols have two OH radicals, a reaction with the compounds of the formula 2 can take place via both OH radicals. In particular, this produces linear siloxanes, more preferably linear polymeric and / or oligomeric siloxanes. For example, the following reaction can take place:

This indicates the further connection of monomer units.

In a preferred embodiment, the silanol of the formula 1 is a silanol of the formula Ia and particularly preferably diphenylsilanol:

, As a result, the resulting siloxane has a high proportion of phenyl groups. Due to a high proportion of phenyl groups, the siloxane has a higher refractive index.

The silanol of the formula Ib can be, for example, one of the following compounds:

HO-Si-OH

H OH HO-Si-OH HO-Si-OH

OH OH OH

If the silanols have three or four OH radicals, a reaction with the compounds of the formula 2 can take place via the three or four OH radicals. In particular, arise branched siloxanes, more preferably branched polymeric and / or oligomeric siloxanes.

In accordance with at least one embodiment, R ^{1 of} the compound of formula 2 is selected from a group comprising H, methyl, ethyl and i-propyl radicals. R ² and R ³ are independently selected from a group comprising methoxy,

Ethoxy, i-propoxy, methyl, ethyl, i-propyl, naphthyl, phenanthryl and phenyl radicals, and Y is selected from the group consisting of H, vinyl, allyl, methoxy, ethoxy, i-propoxy, methyl, ethyl, i-propyl and phenyl radicals.

In accordance with at least one embodiment, the compound of the formula 2 has one of the following formulas:

Y ¹ Y ²

R ^{3 '} -Si-O-R ^r R ^{3 "} -Si-O-R ^1"

R ^{2 '} R ^{2 "}

Formula 2a Formula 2b, wherein R ¹ 'or R ¹ ''are selected from a group comprising H, methyl, ethyl and i-propyl. R ² 'and R ³ ' or R ² '' and R ³ '' are independently selected from the group consisting of methoxy, ethoxy, i-propoxy, methyl, ethyl, i-propyl, naphthyl, , Phenantryl and phenyl radicals. Y ¹ is H and Y ² is one group

selected which includes vinyl and allyl radicals.

In accordance with at least one embodiment, the compound of the formula 2 or the compound of the formula 2a has one of the following formulas: Y ¹

γ ¹ R ^r -O-Si-O-R ^r

R ^r -O-Si-O-R ^r O

R ^{2 '} R ^1'

Formula 2aa Formula 2ab,

In this case, R ¹ 'is selected from a group comprising H, methyl, ethyl and i-propyl radicals. R ² 'is selected from a group including methyl, ethyl, i-propyl, naphthyl,

Phenantryl and phenyl radicals. Preferably, R ² 'is selected from a group comprising methyl, ethyl and i-propyl radicals. Y ¹ is H and Y ² is selected from a group comprising vinyl and allyl radicals.

Preferably, the reaction to produce the siloxane using a compound of formula 2a under acidic catalysis, that is, using an acid as

gaseous catalyst, instead, since silanes partially

are base labile.

For example, the compound of formula 2aa has one of the following formulas:

R ² 'is selected from a group comprising methyl, ethyl, i-propyl, naphthyl, phenantryl and phenyl radicals.

In a preferred embodiment, the compound of the formula 2a has the formula 2aa and very particularly preferably the compound of the formula 2aa is methyldiethoxysilane:

Methyldiethoxysilane is particularly inexpensive commercially available.

In at least one embodiment, the compound of formula 2ab has one of the following formulas:

In accordance with at least one embodiment, the compound of the formula 2 or the compound of the formula 2b has one of the following formulas:

Formula 2ba Formula 2bb

Here, R ¹ "is selected from a group comprising H, methyl, ethyl and i-propyl radicals. R ² '' is selected from a group consisting of methyl, ethyl, i-propyl, naphthyl,

Phenantryl and phenyl radicals, and Y ² is selected from a group comprising vinyl and allyl radicals.

Preferably, R ² "is selected from a group comprising methyl, ethyl and i-propyl radicals.

For example, the compound of formula 2ba has one of the following formulas:

R ² '' is selected from a group consisting of methyl,

Includes ethyl and i-propyl radicals.

For example, the compound of formula 2bb has one of the following formulas:

In a preferred embodiment, the compound of the formula 2b has the formula 2bb with Y ² = vinyl radical, and very particularly preferably the compound of the formula 2bb

ethoxysilane:

, Vinyltrimethoxysilane has compared to

Vinyltriethoxysilane to a higher reactivity. In a preferred embodiment, the process comprises an acid- or base-catalyzed reaction of a silanol of formula Ia and a compound of formula 2aa or 2bb. The resulting siloxanes are characterized by their

Transparency, especially for visible light from. In addition, they are stable to electromagnetic radiation, that is, they do not yellow or even at a high radiation exposure, they, for example, in a

Optoelectronic device are shipped. Therefore, the siloxanes are particularly suitable for their use in an optoelectronic component, in particular as

Casting material. Especially they are suitable as

Potting material in an optoelectronic device with a power over one watt.

In accordance with at least one embodiment, the acid- or base-catalyzed reaction is supplemented with a further educt which is a metal alkoxide of the formula 3

M (OR ⁷ ) _n

Formula 3 wherein M is a metal with the charge m, R ^{7 is} an alkyl radical and n = m. In other words, it is according to this embodiment, an acid or

base-catalyzed reaction of a silanol of formula 1, a compound of formula 2 and a metal alkoxide of formula 3.

In accordance with at least one embodiment, R ^{7 is} selected from a group comprising methyl, ethyl, i-propyl and n-propyl radicals. In accordance with at least one embodiment, M is selected from a group comprising Al, Ti, Zr, Hf, Sn and Zn. Depending on the metal and its value influences on the degree of crosslinking, the refractive index and the thermal

Stability of the resulting siloxane. Preferably, M is selected from a group comprising Ti, Zr, Hf and Sn.

For example, the metal alkoxide is a compound having one of the following formulas:

Zr (OPr) ₄ , Ti (OPr) ₄ , Hf (OPr) ₄ , Sn (OPr) ₄ where the abbreviation Pr is an n-propyl radical.

A process for the preparation of a polysiloxane is given. The process for producing a polysiloxane comprises the process steps:

I) preparing a first siloxane,

II) preparing a second siloxane,

III) Hydrosilylation of the first siloxane with the second siloxane. All the features of the process for the preparation of the siloxane are also for the process for the preparation of the polysiloxane, in particular for the preparation of the first siloxane and the second siloxane, in the process steps I and II

revealed and vice versa.

Hydrosilylation refers to addition of a silane to a double bond, especially the syn-selective anti-Markovnikov addition of a silane to a double bond. According to at least one embodiment

Process step I) the process steps:

A) providing a silanol of the formula 1 and a

A compound of formula 2a for forming a reaction mixture or dissolving and / or dispersing a silanol of formula 1 and a compound of formula 2a

R ⁵ -Si-OH R ^{3 '} -Si-O-R ^r

R ⁴ R ^{2 '}

Formula 1 Formula 2a in a solvent to form a reaction mixture. Preference is given to using a silanol of the formula Ia and of a compound of the formula 2aa. R ⁴ , R ⁵ and R ⁶ are independently selected from a group comprising OH, alkyl and aryl radicals. R ¹ 'is selected from a group comprising H, methyl, ethyl, and i-propyl radicals. R ² 'and R ³ ' are independently selected from the group consisting of methoxy, ethoxy, i-propoxy, methyl, ethyl, i-propyl, naphthyl, phenanthryl and phenyl radicals.

B) introducing an acid gaseous catalyst,

in particular gaseous HCl in the reaction mixture from process step A) to form the first siloxane. According to at least one embodiment

Process step II) the process steps:

A) providing a silanol of the formula 1 and a

A compound of formula 2b for forming a reaction mixture or dissolving and / or dispersing a silanol of formula 1 and a compound of formula 2b R ⁵ -Si-OH R ^{3 "} -τS ² i-0-R ^1"

R ⁴ R ^{2 "}

Formula 1 Formula 2b in a solvent to form a reaction mixture. Preference is given to using a silanol of the formula Ia and of a compound of the formula 2aa. In this case, R ⁴ , R ⁵ and R ⁶ are independently selected from a group comprising OH, alkyl and aryl radicals. R ¹ '' is selected from a group comprising H, methyl, ethyl, and i-propyl radicals. R ² "and R ³ " are independently selected from the group consisting of methoxy, ethoxy, i-propoxy, methyl, ethyl, i-propyl, naphthyl, phenanthryl, and phenyl radicals. Y ² is selected from a group comprising vinyl and allyl radicals.

B) introducing an acidic or basic gaseous catalyst, in particular gaseous H ₃ or HCl into the reaction mixture from process step A) to form the second siloxane. According to at least one embodiment, the

Hydrosilylation in process step III) with addition of a platinum catalyst. The platinum catalyst can by irradiation with UV radiation or by

Temperature effects are activated. It can the

Platinum catalyst are converted from a non-reactive form into a reactive form, so that a reaction between the first and the second siloxane, in particular a crosslinking of the first siloxane takes place with the second siloxane.

The platinum catalyst can be, for example, a platinum-carbonylcyclovinylmethylsiloxane complex, a platinum-1,3- divinyl-1, 1, 3, 3-tetramethyldisiloxane complex, a platinum tetravinyltetramethyltetracyclosiloxane complex or a PIctinoctanaloctanol complex. The resulting polysiloxanes are characterized by their

Transparency and resistance to electromagnetic radiation, especially in the visible range of

electromagnetic spectrum, from. For example, during exposure to radiation in a light-emitting diode, they do not tarnish or barely cloud over their service life, so that a constant light emission can be ensured over the life of the diode.

A method for potting optoelectronic components is specified. All features of the procedure for

Preparation of the siloxane and for the preparation of the polysiloxane are also for the method of casting of

optoelectronic devices disclosed and vice versa. The method for casting optoelectronic

Components comprises the following method steps:

AI) providing at least one optoelectronic

Component,

A2) producing a siloxane or a polysiloxane,

A3) applying the siloxane or the polysiloxane to the optoelectronic component.

According to the application, the term "on" is understood as meaning both the direct and immediate arrangement of elements with a common interface, as well as an indirect arrangement in which further elements can be present between the elements arranged on top of each other. In analogous form, an element "between" a first and a arranged second element when the element is disposed on the first element and the second element on the side facing away from the first element of the element, wherein "on" as described above is understood.

In process step A3), the siloxane or the

Polysiloxane applied to the device. The siloxane or the polysiloxane can in this case be applied in particular directly to the component, so that the siloxane or polysiloxane is also directly on the component. The siloxane or the polysiloxane can also be applied to or directly on a chip, for example a

Semiconductor chip, are applied and wrap this at least partially. In particular, the siloxane or polysiloxane forms a potting. The potting can be generated in particular in the beam path of the device.

The optoelectronic component can thereby

Be formed radiation receiving or radiation emitting.

According to at least one embodiment, the first and the second siloxane in method step A3) is applied to the

applied optoelectronic component. In particular, the first siloxane is prepared from a silanol of the formula I and a compound of the formula 2aa and the second siloxane is prepared from a silanol of the formula I and a compound of the formula 2bb. Subsequently, a hydrosilylation according to process step III) can take place.

According to at least one further embodiment

inorganic fillers are dispersed in the siloxane or polysiloxane in process step A3). The fillers can For example, from a group, the S1O ₂ particles, scattering particles, converter materials and a

Combination thereof. Si0 ₂ ~ particles can

for example, used to thermal

Increase conductivity of the encapsulation. As scattering particles, for example, T1O ₂ , ZrÜ ₂ and / or Al ₂ O ₃ can be used. The choice of possible converter materials is

not limited according to application. suitable

Converter materials are described, for example, in WO 98/12757 A1, the disclosure content of which is hereby incorporated by reference.

According to at least one embodiment, the

optoelectronic component a housing with a recess in which the siloxane or the polysiloxane in

Process step A3) is applied. In the recess is usually an optoelectronic component, for example, a radiation emitting or radiation detecting

Semiconductor chip arranged.

In accordance with at least one embodiment, this is

optoelectronic component a light emitting diode.

The component may include a semiconductor material-containing chip (semiconductor chip). Such a chip may, for example, be a thin-film light-emitting diode chip. Examples of thin film LED chips are known to those skilled in the art. Furthermore, the component has conventional components and elements, for example electrically conductive connections, which are necessary for operating the component. According to at least one embodiment, in

Method step A) a plurality of optoelectronic components are provided. Hereinafter, the invention with reference to the

Drawing in particular explained in more detail with reference to an embodiment. The same and similar or equivalent elements are provided with the same reference numerals. The figures and the proportions of the elements shown in the figures with each other are not to be considered to scale. Rather, individual elements for better presentation and / or for better

Comprehensibility exaggerated or simplified

be shown.

Show it:

Figure 1 is a schematic side view of a

optoelectronic component.

Figure 2 and 3 ¹ H-NMR spectra of embodiments.

The optoelectronic component 1, designed as

1 shows a housing 8 with a lead frame 6. The housing 8 has in the middle a recess in which a semiconductor chip 2 is arranged, which is electrically conductively connected to the lead frame 6. The recess is filled with a potting 4. Potting 4 contains a polysiloxane prepared by a platinum catalyzed hydrosilylation of a first siloxane and a second siloxane. The first siloxane is, for example, a hydrogenphenyloligosiloxane prepared as follows: In a 100 mL Schlenk flask, 6 g (44.7 mmol)

Methyldiethoxysilane and 9, 6 g (44.38 mmol) of diphenylsilanediol together with about 5 mL of ethanol mixed as a dispersion aid and heated to 100 ° C to reflux. In a second

Schlenk flasks are charged with about 15 g of NaCl and about 25 ml of H ₂ SO ₄ (98%) are slowly added dropwise. The resulting gaseous HCl is in the argon stream via a hose and a

Glass pipette passed into the reaction mixture. After 30

Minutes, the reflux condenser is removed and the reaction heated for another 1.5 - 2 hours under argon flow to remove the resulting by-product ethanol. A clear, highly viscous resin is obtained. Figure 2 shows the 1H NMR spectrum of the resulting siloxane

(Hydrogenphenyloligosiloxane) in CDCl ₃ at 300 MHz. The signal shift is given in ppm on the x axis and the normalized intensity on the y axis. The signals of the phenyl groups are at 7.75-7.0 ppm, the signals of the Si-H groups at 5.0-4.75 ppm, the signals of the Si-methyl groups are 0.25-0.25 ppm.

Impurities by water can be seen in the signal at 1.5 ppm and unreacted ethoxy groups or ethanol as a signal at 4.0 - 3.5 and 1.25 - 1.0 ppm.

The second siloxane is for example a

Vinylphenyloligosiloxane, prepared as follows: ... In a 100 mL Schlenk flask, add 9 g (41.60 mmol)

Diphenylsilanediol and 4.17 g (28.13 mmol)

Vinyltrimethoxysilane and about 5 mL of methanol as

Dispersion aid mixed and to 80 ° C to reflux heated. In a second Schlenk flask about 15 g of KOH are introduced and about 25 mL NH ₄ OH (32%) dropwise

added. The resulting H ₃ gas is introduced in the argon stream via a hose with glass pipette into the reaction mixture. After 30 minutes, the reflux condenser is removed and the mixture is refluxed for a further 1.5 hours

Heated argon flow to the by-product methanol too

remove. A clear to milky, highly viscous resin is obtained.

Figure 3 shows the 1H-NMR spectrum of the resulting siloxane (vinylphenyloligosiloxane) in CDCl ₃ at 300 MHz. The signal shift is given in ppm on the x axis and the normalized intensity on the y axis.

The signals of the phenyl groups are 7.6-6.75 ppm and the signals of the vinyl groups are 6.0-5.3 ppm.

Impurities by water can be seen in the signal at 1.45 ppm and unreacted methoxy groups

or methanol as a signal at 3.5 - 2.8 and 1.25 - 1, 0 ppm.

The invention is not limited by the description with reference to the embodiments. Rather, the includes

Invention every new feature as well as every combination of

Features, which includes in particular any combination of features in the claims, even if this feature or the combination itself is not explicitly in the

Claims or embodiments is given. Reference sign list

1 optoelectronic component

2 semiconductor chip

4 potting

6 lead frame

8 housing

mL milliliter

mmol millimoles

ppm parts per million

Claims

claims

A process for preparing a siloxane by an acid or base catalyzed reaction of a silanol of formula 1 and a compound of formula 2,

Y

1

-Si-OH -Si- R ⁴ R ²

Formula 1 Formula 2, where

R ⁴ , R ⁵ and R ^{6 are} independently selected from a group comprising OH, alkyl and aryl radicals,

R ^{1 is} an H or alkyl radical,

- R ² and R ^{3 are} independently from a group

are selected which comprises alkoxy, alkyl and aryl radicals,

Y is selected from a group which includes H, alkenyl,

Alkoxy, alkyl and aryl radicals and

wherein the catalyst is used in a gaseous state.

2. The method according to claim 1,

using as the catalyst an acid selected from the group consisting of HCl, HBr, HI, H2 S,

Includes carboxylic acids and combinations thereof or wherein a base is used as a catalyst, which is selected from the group consisting of NH3, (CH3) 3, N (CH2 ^~ CH3) 3, and combinations thereof.

3. The method according to any one of the preceding claims, wherein the method comprises the following method steps:

A) providing the silanol of formula 1 and the compound of formula 2 to form a reaction mixture, B) introducing the catalyst into the reaction mixture from process step A).

4. Method according to the preceding claim,

wherein in process step A) the silanol of formula 1 and the compound of formula 2 are dissolved and / or dispersed in a solvent to form a reaction mixture.

5. The method according to claim 3 or 4,

wherein in step B) the catalyst in a stream of argon or nitrogen in the reaction mixture

is initiated.

6. The method according to any one of claims 3 to 5,

wherein the reaction mixture from process step A) is heated under reflux and also during the

Process step B) is heated under reflux.

7. The method according to claim 6,

wherein after method step B) a method step C) follows:

C) heating the reaction mixture from step B) and passing a stream of argon to evaporate and remove the solvent.

8. The method according to any one of the preceding claims, wherein R ⁴ , R ⁵ and R ^{6 are} independently selected from a group comprising OH, methyl, ethyl, i-propyl and phenyl radicals.

A process according to any one of the preceding claims, wherein the silanol has one of the following formulas R ⁶ R ⁶ OH

-Si-OH HO-Si-OH HO-Si

R ⁴ OH OH

Formula la Formula lb Formula lc.

10. The method according to any one of the preceding claims, wherein

R ¹ is selected from a group comprising H, methyl, ethyl and i-propyl radicals,

- R ² and R ^{3 are} independently from a group

which comprises methoxy, ethoxy, i-propoxy, methyl, ethyl, i-propyl, naphthyl, phenantryl and phenyl radicals,

- Y is selected from a group comprising H, vinyl, allyl, methoxy, ethoxy, i-propoxy, methyl, ethyl, i-propyl and phenyl radicals.

11. The method according to any one of the preceding claims, wherein the compound of formula 2 has one of the following formulas

Formula 2a Formula 2b, wherein

R ¹ 'or R ¹ ''is selected from a group comprising H,

Comprising methyl, ethyl, and i-propyl radicals,

R ² 'and R ³ ' or R ² '' and R ³ '' are independently selected from the group consisting of methoxy, ethoxy,

i-propoxy, methyl, ethyl, i-propyl, naphthyl, phenantryl and phenyl radicals, - Y ¹ = H

and

- Y ² is selected from a group, the vinyl and

Allyl residues.

12. The method according to any one of the preceding claims, wherein the compound of formula 2 has one of the following formulas

Y ¹

i

γ ¹ R ^r -O-Si-O-R ^r

R ^r -O-Si-O-R ^r O

R ^{2 '} R ^1'

Formula 2aa formula 2ab, wherein

R ¹ 'is selected from a group comprising H, methyl, ethyl and i-propyl radicals,

- Y ¹ = H and

R ² 'is selected from a group comprising methoxy, ethoxy, i-propoxy, methyl, ethyl, i-propyl, naphthyl, phenantryl and phenyl radicals.

13. The method according to any one of the preceding claims 1 to 11,

wherein the compound of the formula 2 has one of the following formulas

Y ²

Y ² R ^{1 "} -O-Si-O-R ^1"

R ^{1 "} -O-Si-O-R ^1" O

R ^{2 "} R ^1"

Formula 2ba Formula 2bb, where R ¹ '' is selected from a group comprising H, methyl,

Comprises ethyl and i-propyl radicals,

R ² '' is selected from the group consisting of methoxy, ethoxy, i-propoxy, methyl, ethyl, i-propyl, naphthyl,

Phenantryl and phenyl radicals, and

- Y ² is selected from a group, the vinyl and

Allyl residues.

14. The method according to any one of the preceding claims, which is an acid- or base-catalyzed reaction of a silanol of the formula 1, a compound of formula 2 and a metal alkoxide of formula 3 is

M (OR ⁷ ), n

Formula 3

in which

- M stands for a metal with the charge m,

R ^{7 is} an alkyl radical and

- n = m.

15. A process for preparing a polysiloxane comprising the process steps

I) Preparation of a first siloxane with the

Process steps:

A) providing a silanol of the formula 1 and a

A compound of formula 2a for forming a reaction mixture or dissolving and / or dispersing a silanol of formula 1 and a compound of formula 2a in a solvent to form a reaction mixture,

Y ¹

-Si-OH R ^{3 '} -Si-O-R ^r

R ⁴ R ^{2 '}

Formula 1 Formula 2a in which

R ¹ 'is selected from a group comprising H, methyl, ethyl, and i-propyl radicals,

- R ² 'and R ³ ' independently of a group

- Y ¹ = H,

B) introducing an acid gaseous catalyst into the reaction mixture from process step A) to form the first siloxane,

II) Preparation of a second siloxane with the

Steps:

A) providing a silanol of the formula 1 and a

A compound of formula 2b for forming a reaction mixture or dissolving and / or dispersing a silanol of formula 1 and a compound of formula 2b in a solvent to form a reaction mixture

Formula 1 formula where

R ¹ '' is selected from a group comprising H, methyl,

Comprises ethyl and i-propyl radicals,

- R ² '' and R ³ '' independently of a group

are selected, the methoxy, ethoxy, i-propoxy, methyl, Comprises ethyl, i-propyl, naphthyl, phenantryl and phenyl radicals,

- Y ² is selected from a group, the vinyl and

Allyl residues

B) introducing a gaseous acidic or basic

Catalyst in the reaction mixture from process step A) to form the second siloxane,

III) hydrosilylation of the first siloxane and the second siloxane.

16. Method for casting optoelectronic

Components comprising the steps:

AI) providing at least one optoelectronic

Component (1),

A2) Producing a siloxane according to any one of claims 1 to 14 or a polysiloxane according to claim 15,

A3) applying the siloxane or the polysiloxane to the optoelectronic component (1).