WO2018012339A1 - Method for manufacturing optical member - Google Patents
Method for manufacturing optical member Download PDFInfo
- Publication number
- WO2018012339A1 WO2018012339A1 PCT/JP2017/024367 JP2017024367W WO2018012339A1 WO 2018012339 A1 WO2018012339 A1 WO 2018012339A1 JP 2017024367 W JP2017024367 W JP 2017024367W WO 2018012339 A1 WO2018012339 A1 WO 2018012339A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- resin
- optical member
- release agent
- less
- manufacturing
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 143
- 238000000034 method Methods 0.000 title claims abstract description 112
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 78
- 229920005989 resin Polymers 0.000 claims abstract description 305
- 239000011347 resin Substances 0.000 claims abstract description 305
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 95
- 229920000642 polymer Polymers 0.000 claims abstract description 69
- 239000000758 substrate Substances 0.000 claims abstract description 52
- 239000002904 solvent Substances 0.000 claims abstract description 37
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 238000003825 pressing Methods 0.000 claims abstract description 6
- 239000000463 material Substances 0.000 claims description 77
- 239000000178 monomer Substances 0.000 claims description 54
- 239000005995 Aluminium silicate Substances 0.000 claims description 33
- 235000012211 aluminium silicate Nutrition 0.000 claims description 33
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 claims description 33
- 239000004480 active ingredient Substances 0.000 claims description 30
- 238000000576 coating method Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 5
- 230000003373 anti-fouling effect Effects 0.000 abstract description 45
- 238000005299 abrasion Methods 0.000 abstract description 40
- 230000001965 increasing effect Effects 0.000 abstract description 20
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 135
- 239000000243 solution Substances 0.000 description 28
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 25
- 229910052731 fluorine Inorganic materials 0.000 description 25
- 239000011737 fluorine Substances 0.000 description 25
- -1 polyethylene terephthalate Polymers 0.000 description 19
- 239000006082 mold release agent Substances 0.000 description 16
- 239000000126 substance Substances 0.000 description 15
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 12
- 238000001723 curing Methods 0.000 description 11
- 238000005530 etching Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 8
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000003999 initiator Substances 0.000 description 8
- 238000002048 anodisation reaction Methods 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- 125000001153 fluoro group Chemical group F* 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229920002284 Cellulose triacetate Polymers 0.000 description 5
- 101000720524 Gordonia sp. (strain TY-5) Acetone monooxygenase (methyl acetate-forming) Proteins 0.000 description 5
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 5
- 125000003709 fluoroalkyl group Chemical group 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 4
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 4
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 125000004991 fluoroalkenyl group Chemical group 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- IBDVWXAVKPRHCU-UHFFFAOYSA-N 2-(2-methylprop-2-enoyloxy)ethyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCCOC(=O)C(C)=C IBDVWXAVKPRHCU-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- URLYGBGJPQYXBN-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methyl prop-2-enoate Chemical compound OCC1CCC(COC(=O)C=C)CC1 URLYGBGJPQYXBN-UHFFFAOYSA-N 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 3
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 3
- 239000003208 petroleum Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 239000011342 resin composition Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- GNWBLLYJQXKPIP-ZOGIJGBBSA-N (1s,3as,3bs,5ar,9ar,9bs,11as)-n,n-diethyl-6,9a,11a-trimethyl-7-oxo-2,3,3a,3b,4,5,5a,8,9,9b,10,11-dodecahydro-1h-indeno[5,4-f]quinoline-1-carboxamide Chemical compound CN([C@@H]1CC2)C(=O)CC[C@]1(C)[C@@H]1[C@@H]2[C@@H]2CC[C@H](C(=O)N(CC)CC)[C@@]2(C)CC1 GNWBLLYJQXKPIP-ZOGIJGBBSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- KNSXNCFKSZZHEA-UHFFFAOYSA-N [3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical class C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C KNSXNCFKSZZHEA-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000005370 alkoxysilyl group Chemical group 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 238000007611 bar coating method Methods 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 150000002148 esters Chemical group 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
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- 238000000016 photochemical curing Methods 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
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- 239000003505 polymerization initiator Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
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- 125000005372 silanol group Chemical group 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
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- 230000003595 spectral effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000002335 surface treatment layer Substances 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- DAEIFBGPFDVHNR-UHFFFAOYSA-N (4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,11-heptadecafluoro-2-hydroxyundecyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F DAEIFBGPFDVHNR-UHFFFAOYSA-N 0.000 description 1
- GEEMGMOJBUUPBY-UHFFFAOYSA-N (4,4,5,5,6,6,7,7,8,8,9,9,9-tridecafluoro-2-hydroxynonyl) prop-2-enoate Chemical compound C=CC(=O)OCC(O)CC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F GEEMGMOJBUUPBY-UHFFFAOYSA-N 0.000 description 1
- OESXRFMJTKDBDN-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,9,9,9-hexadecafluorononyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)CC(F)(F)F OESXRFMJTKDBDN-UHFFFAOYSA-N 0.000 description 1
- LRZUNFJBJNYJJN-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,9,9,9-hexadecafluorononyl prop-2-enoate Chemical compound FC(F)(F)CC(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)OC(=O)C=C LRZUNFJBJNYJJN-UHFFFAOYSA-N 0.000 description 1
- GWYSWOQRJGLJPA-UHFFFAOYSA-N 1,1,2,2-tetrafluoropropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)C(C)(F)F GWYSWOQRJGLJPA-UHFFFAOYSA-N 0.000 description 1
- DEQJNIVTRAWAMD-UHFFFAOYSA-N 1,1,2,4,4,4-hexafluorobutyl prop-2-enoate Chemical compound FC(F)(F)CC(F)C(F)(F)OC(=O)C=C DEQJNIVTRAWAMD-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- IMDHDEPPVWETOI-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2,2-trichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)(Cl)Cl)C=C1 IMDHDEPPVWETOI-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- QTKPMCIBUROOGY-UHFFFAOYSA-N 2,2,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)F QTKPMCIBUROOGY-UHFFFAOYSA-N 0.000 description 1
- VBHXIMACZBQHPX-UHFFFAOYSA-N 2,2,2-trifluoroethyl prop-2-enoate Chemical compound FC(F)(F)COC(=O)C=C VBHXIMACZBQHPX-UHFFFAOYSA-N 0.000 description 1
- CLISWDZSTWQFNX-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)C(F)(F)F CLISWDZSTWQFNX-UHFFFAOYSA-N 0.000 description 1
- JDVGNKIUXZQTFD-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropyl prop-2-enoate Chemical compound FC(F)(F)C(F)(F)COC(=O)C=C JDVGNKIUXZQTFD-UHFFFAOYSA-N 0.000 description 1
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- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- MRDMGGOYEBRLPD-UHFFFAOYSA-N 2-ethoxy-1-(2-ethoxyphenyl)ethanone Chemical compound CCOCC(=O)C1=CC=CC=C1OCC MRDMGGOYEBRLPD-UHFFFAOYSA-N 0.000 description 1
- YJQMXVDKXSQCDI-UHFFFAOYSA-N 2-ethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3SC2=C1 YJQMXVDKXSQCDI-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- PNSZGRYLJCJKRB-UHFFFAOYSA-N 2-methyloctan-2-yl prop-2-enoate Chemical compound CCCCCCC(C)(C)OC(=O)C=C PNSZGRYLJCJKRB-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- KTALPKYXQZGAEG-UHFFFAOYSA-N 2-propan-2-ylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC=C3SC2=C1 KTALPKYXQZGAEG-UHFFFAOYSA-N 0.000 description 1
- VXRAAUKUZQYZRW-UHFFFAOYSA-N 3'-N'-Acetylfusarochromanone Chemical compound O1C(C)(C)CC(=O)C2=C(N)C(C(=O)CC(CO)NC(=O)C)=CC=C21 VXRAAUKUZQYZRW-UHFFFAOYSA-N 0.000 description 1
- VPKQPPJQTZJZDB-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl prop-2-enoate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCOC(=O)C=C VPKQPPJQTZJZDB-UHFFFAOYSA-N 0.000 description 1
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
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- XVZXOLOFWKSDSR-UHFFFAOYSA-N Cc1cc(C)c([C]=O)c(C)c1 Chemical group Cc1cc(C)c([C]=O)c(C)c1 XVZXOLOFWKSDSR-UHFFFAOYSA-N 0.000 description 1
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 1
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- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- JAWMENYCRQKKJY-UHFFFAOYSA-N [3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-ylmethyl)-1-oxa-2,8-diazaspiro[4.5]dec-2-en-8-yl]-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]methanone Chemical compound N1N=NC=2CN(CCC=21)CC1=NOC2(C1)CCN(CC2)C(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F JAWMENYCRQKKJY-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- ZNAAXKXXDQLJIX-UHFFFAOYSA-N bis(2-cyclohexyl-3-hydroxyphenyl)methanone Chemical compound C1CCCCC1C=1C(O)=CC=CC=1C(=O)C1=CC=CC(O)=C1C1CCCCC1 ZNAAXKXXDQLJIX-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 238000010538 cationic polymerization reaction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
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- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 229940105570 ornex Drugs 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 229910000487 osmium oxide Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- JRWNODXPDGNUPO-UHFFFAOYSA-N oxolane;prop-2-enoic acid Chemical compound C1CCOC1.OC(=O)C=C JRWNODXPDGNUPO-UHFFFAOYSA-N 0.000 description 1
- JIWAALDUIFCBLV-UHFFFAOYSA-N oxoosmium Chemical compound [Os]=O JIWAALDUIFCBLV-UHFFFAOYSA-N 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- RLUCXJBHKHIDSP-UHFFFAOYSA-N propane-1,2-diol;propanoic acid Chemical compound CCC(O)=O.CC(O)CO RLUCXJBHKHIDSP-UHFFFAOYSA-N 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000012086 standard solution Substances 0.000 description 1
- FIQMHBFVRAXMOP-UHFFFAOYSA-N triphenylphosphane oxide Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=O)C1=CC=CC=C1 FIQMHBFVRAXMOP-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/26—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
- B32B3/30—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/06—Embossing
Definitions
- the present invention relates to a method for manufacturing an optical member. More specifically, the present invention relates to a method for manufacturing an optical member having a nanometer-size uneven structure.
- Optical members are being studied for application in various fields (see, for example, Patent Documents 1 to 5).
- an optical member having a nanometer-size uneven structure has excellent antireflection properties.
- the refractive index continuously changes from the air layer to the substrate, the reflected light can be dramatically reduced.
- positioned on the surface of a base material is mentioned, for example.
- the conventional optical member has a concavo-convex structure on the surface, there is a problem that fingerprints are difficult to wipe off, that is, the antifouling property is low.
- the present inventors tried to improve the antifouling property (fingerprint wiping property) by forming a polymer layer using a photocurable resin and a release agent and by the effect of the release agent.
- the effective component of the release agent is difficult to orient on the surface of the concavo-convex structure simply by blending the photocurable resin and the release agent.
- slipperiness it was found that not only antifouling property but also slipperiness could not be obtained sufficiently. Insufficient slipperiness increases the load (friction resistance) when rubbing the surface of the polymer layer, resulting in a decrease in abrasion resistance.
- the orientation of the active ingredient of the mold release agent changes, so that the antifouling property and abrasion resistance are remarkably reduced.
- the present inventors tried to increase the content (concentration) of the active ingredient of the release agent to increase the amount of orientation on the surface of the concavo-convex structure.
- concentration concentration
- the present inventors tried to increase the content (concentration) of the active ingredient of the release agent to increase the amount of orientation on the surface of the concavo-convex structure.
- simply increasing the content of the active ingredient in the release agent lowers the compatibility with the photocurable resin, so that the release agent becomes insoluble.
- the haze of the optical member increases, that is, the transparency decreases.
- the conventional optical member has room for improvement in terms of enhancing the antifouling property and the abrasion resistance without impairing the transparency.
- Patent Document 1 describes a method of forming a concavo-convex structure using a photocurable resin composition containing a fluorine compound.
- a fluorine compound simply blending a fluorine compound is insufficient in antifouling properties and abrasion resistance, and there is room for improvement.
- Patent Document 2 describes an optical article in which a concavo-convex structure is formed using a fluorine-containing resin composition containing a fluorine-containing compound.
- the fluorine-containing compound is dissolved in the polyfunctional curing agent used in the examples, the antifouling property and abrasion resistance are insufficient, and there is room for improvement.
- Patent Document 3 describes a hard coat film formed using a polymerizable composition (fluororesin).
- fluororesin a polymerizable composition
- Patent Document 4 describes a laminate in which a surface treatment layer containing fluorine atoms is formed on the surface of an uneven structure. However, since the surface treatment layer is easily peeled off, the abrasion resistance is insufficient and there is room for improvement.
- Patent Document 5 discloses a nano unevenness formed by using an active energy ray-curable resin composition containing a polyfunctional monomer having a high surface free energy and a fluorine-based (meth) acrylate compatible with the polyfunctional monomer. A structure is described. However, the effect of orienting fluorine atoms on the surface is insufficient only by utilizing the difference in surface free energy between the two components. Moreover, there is a limit to the amount of the fluorine-based (meth) acrylate that is compatible, and the effect of orienting fluorine atoms on the surface is insufficient. As described above, the antifouling property and abrasion resistance are insufficient, and there is room for improvement.
- the present invention has been made in view of the above situation, and an object of the present invention is to provide a method for producing an optical member that improves antifouling properties and abrasion resistance without impairing transparency.
- the inventors of the present invention have studied various methods for producing an optical member that enhances antifouling properties and abrasion resistance without impairing transparency.
- polymers using a photocurable resin and a release agent that are incompatible with each other are used.
- the inventors have conceived that the above problems can be solved brilliantly and have reached the present invention.
- a base material and a polymer layer that is provided on the surface of the base material and has a concavo-convex structure provided on the surface with a plurality of convex portions provided at a pitch equal to or less than the wavelength of visible light.
- a process for producing an optical member comprising: a process (1) for preparing a resin solution by dissolving a photocurable resin and a release agent in a solvent; and a process for applying the resin solution on the surface of the substrate ( 2), a heat treatment for removing the solvent from the coated resin solution, and a resin layer is formed (3), and the substrate is pressed against the mold with the resin layer sandwiched therebetween.
- the mold release agent when mixed with each other, 5 degrees ( Olin) is a combination showing turbidity of 25 degrees (kaolin) or less, and the haze of the optical member is less than 1.0% (hereinafter referred to as the first optical member of the present invention). It may also be called a manufacturing method.
- Another embodiment of the present invention includes a base material and a polymer layer that is disposed on the surface of the base material and has a concavo-convex structure provided on the surface with a plurality of convex portions provided at a pitch equal to or less than the wavelength of visible light.
- the haze of the optical member, the method of manufacturing the optical member is less than 1.0% may be (hereinafter, also the manufacturing method of the second optical member of the present invention refers.).
- the manufacturing method of the optical member which improves antifouling property and abrasion resistance can be provided, without impairing transparency.
- FIG. 5 is a schematic cross-sectional view for explaining the method for manufacturing the optical member according to the first embodiment.
- 6 is a schematic cross-sectional view for explaining a method for manufacturing an optical member according to Embodiment 2.
- FIG. FIG. 10 is a schematic cross-sectional view for explaining the method for manufacturing the optical member according to the third embodiment.
- FIG. 1 is a schematic cross-sectional view for explaining the method of manufacturing the optical member of the first embodiment.
- the resin solution 3 is prepared, for example, by the following procedure.
- Various monomers, a photopolymerization initiator, and the like are appropriately mixed to prepare a photocurable resin (transparent state).
- a mixture (white turbid state) of a photocurable resin and a release agent is prepared.
- a mixture of a photocurable resin and a release agent is dissolved in a solvent to prepare a resin solution 3 (transparent state or slightly cloudy state).
- the solvent was added after mixing the photocurable resin and the mold release agent.
- the mold release agent was mixed after mixing the photocurable resin and the solvent. May be added.
- Examples of the coating method of the resin solution 3 include a coating method using a spray method, a gravure method, a slot die method, a bar coating method, and the like. From the viewpoint of easily adjusting the film thickness and reducing the cost of the apparatus, a method of applying by a spray method is preferable. Among these, application using a swirl nozzle, electrostatic nozzle, or ultrasonic nozzle is particularly preferable.
- a heat treatment method for example, a method in which a coated product of the resin solution 3 is disposed on the surface of the substrate 2 (the state shown in FIG. 1A) is heated in an oven.
- the heat treatment is preferably performed at a temperature equal to or higher than the boiling point of the solvent. A part of the solvent may be removed by heat treatment or may be completely removed.
- hardening of the resin layer 4 is performed by light irradiation, it is preferable to be performed by irradiation of active energy rays.
- Active energy rays refer to ultraviolet rays, visible rays, infrared rays, plasma, and the like. It is preferable that the resin layer 4 is hardened
- the light irradiation on the resin layer 4 may be performed from the substrate 2 side of the resin layer 4 or from the mold 5 side of the resin layer 4. Moreover, the light irradiation number with respect to the resin layer 4 may be only once, and may be multiple times.
- the curing of the resin layer 4 (the above process (5)) may be performed at the same timing as the formation of the concavo-convex structure on the resin layer 4 (the above process (4)).
- the concavo-convex structure formed on the surface of the polymer layer 6 (surface opposite to the substrate 2) has a plurality of convex portions (protrusions) 7 having a pitch less than the wavelength of visible light (between the apexes of adjacent convex portions 7). This corresponds to a structure provided at a distance P), that is, a moth-eye structure (an eye-like structure). Therefore, the optical member 1 can exhibit excellent antireflection properties (low reflectivity) due to the moth-eye structure.
- the above processes (2) to (6) can be performed continuously and efficiently.
- the manufacturing method of the optical member of Embodiment 1 after the photocurable resin and release agent which are mutually incompatible are dissolved in the solvent (the above process (1)), the solvent is removed (the above Since the release agent is insolubilized by the process (3)), the active component of the release agent is easily oriented on the surface of the resin layer 4 (surface opposite to the base material 2). Therefore, the effective component of the release agent can be efficiently oriented on the surface of the polymer layer 6 (the surface opposite to the substrate 2) without greatly increasing the content of the active component of the release agent. . That is, according to the manufacturing method of the optical member of Embodiment 1, antifouling property and abrasion resistance can be improved without impairing transparency (without increasing haze). Furthermore, according to the manufacturing method of the optical member of Embodiment 1, since the antifouling property and the abrasion resistance can be improved even with a small amount of the release agent, the material cost can be reduced.
- the material of the substrate 2 examples include resins such as triacetyl cellulose (TAC), polyethylene terephthalate (PET), and methyl methacrylate (MMA).
- the base material 2 may appropriately contain additives such as a plasticizer in addition to the above materials.
- the surface of the base material 2 (the surface on the polymer layer 6 side) may be subjected to easy adhesion treatment, and for example, a triacetyl cellulose film subjected to easy adhesion treatment can be used. Further, the surface of the substrate 2 (the surface on the polymer layer 6 side) may be subjected to saponification treatment, and for example, a triacetyl cellulose film subjected to saponification treatment can be used.
- the shape of the substrate 2 examples include a film shape and a sheet shape.
- the film-like substrate 2 may be used.
- the form in which the base material 2 comprises a part of polarizing plate is preferable.
- the thickness of the substrate 2 is preferably 50 ⁇ m or more and 100 ⁇ m or less from the viewpoint of ensuring transparency and workability.
- the haze of the substrate 2 is preferably less than 1% from the viewpoint of ensuring transparency.
- the photocurable resin and the release agent are a combination that exhibits a turbidity of 5 degrees (kaolin) or more and 25 degrees (kaolin) or less when mixed with each other. This indicates that the photocurable resin and the release agent are not compatible.
- the phrase “compatible” means that the turbidity when these materials are mixed is less than 5 degrees (kaolin) (transparent state).
- “not compatible” with a plurality of materials means that the turbidity when these materials are mixed is 5 degrees (kaolin) or more (white turbid state).
- the active ingredient of the release agent is heavy when the solvent is removed (the above process (3)).
- the photocurable resin and the release agent are preferably a combination that exhibits a turbidity of 7 degrees (kaolin) or more and 15 degrees (kaolin) or less when mixed with each other.
- turbidity is determined based on a kaolin standard solution. For example, in an integrating sphere turbidimeter “PT-200” manufactured by Mitsubishi Chemical Analytech, turbidity can be measured by placing a sample in a 10 mm cell and using a preset kaolin calibration curve. .
- the release agent is preferably a fluororesin having a photoreactive group (hereinafter also simply referred to as a fluororesin), that is, a fluorine-based release agent. According to such a configuration, bleed out in a high temperature / high humidity environment is reduced, and the reliability of the optical member 1 is increased. Further, since the fluororesin has a low surface free energy, it is preferably used for improving the antifouling property (for example, fingerprint wiping property).
- the fluororesin contains a fluorine-containing monomer having a photoreactive group (hereinafter also simply referred to as a fluorine-containing monomer) as an active ingredient.
- a fluorine-containing monomer having a photoreactive group
- the surface free energy of the polymer layer 6 becomes low, and antifouling property increases.
- the fluorine atoms are oriented on the surface of the polymer layer 6 (the surface on the side opposite to the base material 2), the slipperiness is enhanced. As a result, the abrasion resistance is increased.
- the photoreactive group refers to a functional group that reacts with other components by light.
- photoreactive groups examples include alkoxysilyl groups, silyl ether groups, hydrolyzed silanol groups, carboxyl groups, hydroxyl groups, epoxy groups, vinyl groups, allyl groups, acryloyl groups, methacryloyl groups. Etc.
- an alkoxysilyl group, a silyl ether group, a silanol group, an epoxy group, a vinyl group, an allyl group, an acryloyl group, or a methacryloyl group are preferable, a vinyl group, An allyl group, an acryloyl group, or a methacryloyl group is more preferable, and an acryloyl group or a methacryloyl group is still more preferable.
- the fluorine-containing monomer includes at least one selected from the group consisting of a fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group in addition to the photoreactive group. It is preferable to have a site.
- a fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group are respectively an alkyl group, an oxyalkyl group, an alkenyl group, an alkanediyl group, and an oxyalkanediyl group. It is a substituent in which at least part of the hydrogen atoms it has are substituted with fluorine atoms.
- a fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group are all substituents mainly composed of fluorine atoms and carbon atoms, and are branched in the structure. Part may be present, and a plurality of these substituents may be linked.
- R f1 is a moiety containing at least one selected from the group consisting of a fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group.
- R 2 represents an alkanediyl group, an alkanetriyl group, or an ester structure, urethane structure, ether structure, or triazine structure derived therefrom.
- D 1 represents a photoreactive group.
- fluorine-containing monomer represented by the general formula (A) examples include 2,2,2-trifluoroethyl acrylate, 2,2,3,3,3-pentafluoropropyl acrylate, and 2-perfluorobutyl.
- the fluoropolyether moiety is a moiety composed of a fluoroalkyl group, an oxyfluoroalkyl group, an oxyfluoroalkyldiyl group, etc., and has a structure represented by the following general formula (B) or (C).
- n1 is an integer of 1 to 3
- n2 to n5 are 1 or 2
- k, m, p, and s are integers of 0 or more.
- a preferable combination of n1 to n5 is a combination in which n1 is 2 or 3, and n2 to n5 is 1 or 2, and a more preferable combination is n1 is 3, n2 and n4 are 2, and n3 and n5 are 1 or 2. 2 is a combination.
- the number of carbon atoms contained in the fluoropolyether moiety is preferably 4 or more and 12 or less, more preferably 4 or more and 10 or less, and still more preferably 6 or more and 8 or less.
- the number of carbon atoms is less than 4, there is a concern that the surface free energy decreases.
- the number of carbon atoms is more than 12, there is a concern that the solubility in a solvent is lowered.
- the fluorine-containing monomer may have a plurality of fluoropolyether sites per molecule.
- fluorine-containing monomers include “OPTOOL (registered trademark) DAC-HP” manufactured by Daikin Industries, Ltd., “CHEMINOX (registered trademark) FAAC-6” manufactured by Unimatec, “Afluid” manufactured by Asahi Glass Co., Ltd., DIC's "MegaFac (registered trademark) RS-76-NS”, DIC's “MegaFac RS-75", Yushi Fats Company's "C10GACRY”, Yushi Yushi Products'"C8HGOL”, etc. It is done.
- the fluorine-containing monomer is preferably one that is cured (polymerized) by ultraviolet rays.
- the fluorine-containing monomer preferably contains at least one of a —OCF 2 — chain and a ⁇ NCO— chain.
- the mold release agent may contain one type of fluorine-containing monomer or may contain a plurality of types.
- the fluororesin may appropriately contain a fluorine-based surfactant, a reactive monomer, and the like.
- fluorine-based surfactants include, for example, “Surflon (registered trademark)” manufactured by AGC Seimi Chemical Co., “Futgent (registered trademark) 650A” manufactured by Neos, and “FC-” manufactured by 3M. 4430 ",” FC-4432 “manufactured by 3M Corporation,” F Top “manufactured by Mitsubishi Materials Electronics Chemical Co., Ltd., and the like.
- the fluorine-based surfactant is preferably one that is cured (polymerized) by ultraviolet rays.
- the fluorosurfactant preferably contains at least one of a —OCF 2 — chain and a ⁇ NCO— chain.
- the mold release agent may contain one type of fluorosurfactant or a plurality of types.
- Examples of the reactive monomer include amide group-containing monomers such as N-acryloylmorpholine, N- (2-hydroxyethyl) acrylamide, N, N-diethylacrylamide; 1,4-cyclohexanedimethanol monoacrylate, 4-hydroxybutyl Examples thereof include hydroxyl group-containing monomers such as acrylate; acetoacetoxy group-containing monomers such as 2-acetoacetoxyethyl methacrylate.
- Known examples of N-acryloylmorpholine include “ACMO (registered trademark)” manufactured by KJ Chemicals.
- HEAA registered trademark
- N, N-diethylacrylamide examples include “DEAA (registered trademark)” manufactured by KJ Chemicals.
- Known examples of 1,4-cyclohexanedimethanol monoacrylate include “CHDMMA” manufactured by Nippon Kasei Co., Ltd.
- Known examples of 4-hydroxybutyl acrylate include “4HBA” manufactured by Nippon Kasei Co., Ltd.
- Known examples of 2-acetoacetoxyethyl methacrylate include “AAEM” manufactured by Nippon Synthetic Chemical Co., Ltd.
- the mold release agent may contain one kind of these reactive monomers or may contain a plurality of kinds. These reactive monomers preferably contain an acid amide bond in the molecule.
- a mold release agent As a mold release agent, a silicon type mold release agent, a phosphate ester type mold release agent, etc. other than the fluorine-type mold release agent (fluororesin) mentioned above are mentioned, for example.
- silicon-based mold release agent examples include silicon diacrylate and the like, among which known examples include “EBECRYL (registered trademark) 350” manufactured by Daicel Ornex Co., Ltd.
- Examples of the phosphoric acid ester release agent include (poly) oxyethylene alkyl phosphate esters.
- known ones include, for example, “NIKKOL (registered trademark) TDP-2” manufactured by Nikko Chemicals. Etc.
- the content of the active ingredient of the release agent in the resin layer 4 is preferably 0.1 wt% or more and 10 wt% or less, more preferably 0.5 wt% or more and 9 wt% or less. More preferably, it is 1 to 5% by weight.
- the content of the active ingredient of the release agent in the resin layer 4 is less than 0.1% by weight, the active ingredient of the release agent on the surface of the polymer layer 6 (the surface opposite to the substrate 2) There is a concern that the amount becomes too small and the antifouling property and abrasion resistance are lowered.
- the content rate of the active ingredient of the release agent in the resin layer 4 is higher than 10% by weight, the amount of the active ingredient of the release agent on the surface of the polymer layer 6 (surface opposite to the substrate 2) is Since the polymer layer 6 (convex part 7) is insufficiently elastic because it increases too much, when the surface of the polymer layer 6 (surface opposite to the substrate 2) is rubbed, the collapsed convex part 7 rises. There is no concern (does not restore). As a result, there is a concern that the abrasion resistance is lowered.
- the photocurable resin may contain various monomers, photopolymerization initiators and the like as long as the turbidity when mixed with a release agent is 5 degrees (kaolin) or more and 25 degrees (kaolin) or less. Good.
- Examples of the various monomers include urethane acrylate, ethoxylated polyglycerin polyacrylate, ethoxylated pentaerythritol tetraacrylate, and the like.
- urethane acrylate include “U-10HA” manufactured by Shin-Nakamura Chemical Co., Ltd.
- Examples of known ethoxylated polyglycerin polyacrylates include “NK ECONOMER (registered trademark) A-PG5027E” manufactured by Shin-Nakamura Chemical Co., Ltd.
- Known examples of ethoxylated pentaerythritol tetraacrylate include “ATM-35E” manufactured by Shin-Nakamura Chemical Co., Ltd.
- the photocurable resin may contain one kind of these various monomers or may contain a plurality of kinds.
- the photopolymerization initiator is active with respect to light (active energy rays) and is added to start a polymerization reaction for polymerizing the monomer.
- a radical polymerization initiator for example, a radical polymerization initiator, an anionic polymerization initiator, a cationic polymerization initiator and the like can be used.
- photopolymerization initiators examples include acetophenones such as p-tert-butyltrichloroacetophenone, 2,2′-diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one; Ketones such as benzophenone, 4,4′-bisdimethylaminobenzophenone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone; benzoin, benzoin methyl ether, benzoin isopropyl ether, benzoin isobutyl ether, etc.
- acetophenones such as p-tert-butyltrichloroacetophenone, 2,2′-diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one
- Ketones such as benzophenone, 4,4′-bisdimethylaminobenzophenone, 2-
- Benzoin ethers benzyl ketals such as benzyl dimethyl ketal and hydroxycyclohexyl phenyl ketone; 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide; Scan (2,4,6-trimethylbenzoyl) - acylphosphine oxides such as triphenylphosphine oxide; 1-hydroxy - cyclohexyl - phenyl - phenones such as ketones, and the like.
- 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide include, for example, “IRGACURE (registered trademark) TPO” manufactured by BASF.
- the photocurable resin may contain one type of photopolymerization initiator or a plurality of types.
- the photocurable resin preferably contains a compatible monomer that is compatible with the release agent.
- a compatible monomer that is compatible with the release agent.
- the active ingredient of a mold release agent is uniformly distributed on the surface of the polymer layer 6 (the surface opposite to the substrate 2), the antifouling property is improved.
- the compatible monomer the adhesiveness between the photocurable resin and the release agent is increased, so that the abrasion resistance is increased.
- the photocurable resin contains a compatible monomer, the compatible monomer alone is compatible with the release agent, but the photocurable resin as a whole is not compatible with the release agent.
- the compatible monomer examples include N-acryloylmorpholine (for example, “ACMO” manufactured by KJ Chemicals), N, N-diethylacrylamide (for example, “DEAA (registered trademark)” manufactured by KJ Chemicals), N, N-dimethylacrylamide (for example, “DMAA (registered trademark)” manufactured by KJ Chemicals), tetrahydrofuran acrylate (for example, “Biscoat # 150” manufactured by Osaka Organic Chemical Industries, Ltd.), cyclic trimethylolpropane formal acrylate (for example, Osaka “Biscoat # 200” manufactured by Organic Chemical Industries, Ltd.), 4-hydroxybutyl acrylate (for example, “4HBA” manufactured by Nippon Kasei Co., Ltd.), and the like.
- the compatible monomer is preferably a monofunctional monomer having a polar group such as an amide group, an ether group or a hydroxyl group.
- the photocurable resin may contain one type of compatible monomer or
- the content of the compatible monomer in the photocurable resin is preferably 5% by weight or more and 30% by weight or less, more preferably 10% by weight or more and 25% by weight or less, 15% by weight or more, More preferably, it is 25% by weight or less.
- the content of the compatible monomer in the photocurable resin is less than 5% by weight, there is a concern that the antifouling property and the abrasion resistance are deteriorated particularly in a high temperature / high humidity environment.
- the content of the compatible monomer in the photocurable resin is higher than 30% by weight, the crosslink density of the polymer layer 6 is decreased and the cohesive force between the bonds is increased. Therefore, the hardness of the polymer layer 6 is increased. In particular, there is a concern that the rubbing resistance in a high temperature / high humidity environment is lowered.
- any solvent may be used as long as it dissolves the photocurable resin and the release agent.
- alcohol carbon number: 1 to 10: for example, methanol, ethanol, n- or i-propanol, n-, sec-, Or t-butanol, benzyl alcohol, octanol, etc.
- ketone 3 to 8 carbon atoms: for example, acetone, methyl ethyl ketone (MEK), methyl isobutyl ketone, diisobutyl ketone, dibutyl ketone, cyclohexanone, etc.
- ester or ether ester carbon
- Number 4 to 10 For example, ethyl acetate, butyl acetate, ethyl lactate, etc., ⁇ -butyrolactone, ethylene glycol monomethyl acetate, propylene glycol monomethyl acetate, ether (carbon number 4 to 10: for example, EG monomethyl ether (methyl
- the thickness T of the polymer layer 6 is preferably thin from the viewpoint of orienting the active ingredient of the release agent at a high concentration on the surface of the polymer layer 6 (the surface opposite to the substrate 2). Specifically, the thickness T of the polymer layer 6 is preferably 5.0 ⁇ m or more and 20.0 ⁇ m or less. The thickness T of the polymer layer 6 indicates the distance from the surface on the base 2 side to the apex of the convex portion 7 as shown in FIG.
- the convex part 7 for example, a shape (bell shape) constituted by a columnar lower portion and a hemispherical upper portion, a cone shape (cone shape, conical shape), or the like that narrows toward the tip ( Taper shape).
- the convex portion 7 may have a shape having a branch protrusion.
- the branch protrusion indicates a convex portion corresponding to a portion having irregular intervals, which has been formed in the process of anodizing and etching for producing a mold.
- the bottom of the gap between adjacent convex portions 7 has an inclined shape, but it may have a horizontal shape without being inclined.
- the pitch P between the adjacent convex portions 7 is not particularly limited as long as it is less than or equal to the wavelength of visible light (780 nm). However, from the viewpoint of sufficiently preventing the occurrence of optical phenomena such as moire and rainbow unevenness, it is 100 nm or more and 400 nm. Or less, more preferably 100 nm or more and 200 nm or less.
- the height of the convex portion 7 is preferably 50 nm or more and 600 nm or less, and more preferably 100 nm or more and 300 nm or less, from the viewpoint of making it compatible with a preferable aspect ratio of the convex portion 7 described later.
- the aspect ratio of the convex portion 7 is preferably 0.8 or more and 1.5 or less.
- the aspect ratio of the convex portion 7 is less than 0.8, the occurrence of optical phenomena such as moire and rainbow unevenness cannot be sufficiently prevented, and there is a concern that good reflection characteristics cannot be obtained.
- the aspect ratio of the convex portion 7 is larger than 1.5, the processability of the moth-eye structure is reduced, sticking occurs, or the transfer condition when forming the moth-eye structure is deteriorated (the mold 5 is clogged). There are concerns.
- the aspect ratio of a convex part refers to the ratio (height / pitch) between the pitch between adjacent convex parts and the height of the convex part.
- the convex portions 7 may be arranged randomly or regularly. From the viewpoint of sufficiently preventing the occurrence of moiré, it is preferable that the convex portions 7 are randomly arranged.
- the haze of the optical member 1 is less than 1.0%.
- the haze of the optical member 1 is preferably less than 0.8%, and more preferably less than 0.5%.
- the haze of the optical member 1 increases (for example, 1.0% or more), transparency is impaired.
- the mold 5 for example, one produced by the following method can be used. First, aluminum used as the material of the mold 5 is formed on the surface of the support base by sputtering. Next, a female mold (mold 5) having a moth-eye structure can be produced by alternately repeating anodic oxidation and etching on the formed aluminum layer. At this time, the concavo-convex structure of the mold 5 can be changed by adjusting the time for performing anodic oxidation and the time for performing etching.
- the material for the supporting substrate examples include glass; metal materials such as stainless steel and nickel; polypropylene, polymethylpentene, and cyclic olefin polymers (typically, norbornene resins, etc., manufactured by Nippon Zeon Co., Ltd.). Polyolefin resins such as “ZEONOR (registered trademark)” and “ARTON (registered trademark)” manufactured by JSR); polycarbonate resins; resin materials such as polyethylene terephthalate, polyethylene naphthalate, and triacetyl cellulose. Moreover, you may use the base material made from aluminum instead of what formed the aluminum film on the surface of a support base material.
- Examples of the shape of the mold 5 include a flat plate shape and a roll shape.
- the surface of the mold 5 is preferably subjected to a mold release treatment. Thereby, the metal mold
- FIG. since the surface free energy of the mold 5 becomes low, when the base material 2 is pressed against the mold 5 in the process (4), the active ingredient of the release agent is added to the surface of the resin layer 4 (base material 2). Can be efficiently oriented on the opposite surface). Furthermore, before the resin layer 4 is cured, it is possible to prevent the active ingredient of the release agent from separating from the surface of the resin layer 4 (the surface opposite to the substrate 2). As a result, in the optical member 1, the active component of the release agent can be efficiently oriented on the surface of the polymer layer 6 (the surface opposite to the substrate 2).
- Examples of the coating material used for the mold release treatment of the mold 5 include a fluorine-based material, a silicon-based material, and a phosphate ester-based material.
- Examples of known fluorine-based materials include “OPTOOL DSX” manufactured by Daikin Industries, Ltd., “OPTOOL AES4” manufactured by Daikin Industries, Ltd., and the like.
- FIG. 2 is a schematic cross-sectional view for explaining the method of manufacturing the optical member according to the second embodiment.
- the manufacturing method of the optical member of Embodiment 2 is the same as the manufacturing method of the optical member of Embodiment 1 except that the photocurable resin and the release agent are applied in two layers and then both layers are integrated. Therefore, description of overlapping points will be omitted as appropriate.
- Examples of the coating method of the first resin 8 and the second resin 9 include a method of coating by a spray method, a gravure method, a slot die method, a bar coating method, or the like. From the viewpoint of easily adjusting the film thickness and reducing the cost of the apparatus, a method of applying by a spray method is preferable. Among these, application using a swirl nozzle, electrostatic nozzle, or ultrasonic nozzle is particularly preferable.
- the application of the first resin 8 and the application of the second resin 9 may be performed at different timings or may be performed at the same timing.
- a method of applying the first resin 8 and the second resin 9 at the same timing for example, a method of applying by a coextrusion method can be mentioned.
- Process (2) Formation of resin layer
- the substrate 2 is pressed against the mold 5 from the first resin 8 side with the first resin 8 and the second resin 9 sandwiched therebetween.
- the resin layer 4 having a concavo-convex structure on the surface (the surface opposite to the substrate 2) is formed.
- the first resin 8 and the second resin 9 are integrated, and there is no interface between the two resins.
- the release agent in the second resin 9 is insolubilized, so that the active ingredient of the release agent is the surface of the resin layer 4 (opposite of the base material 2). It becomes easy to orient to the surface on the side.
- the release agent is contained in the second resin 9 that mainly constitutes the surface of the resin layer 4 (surface opposite to the substrate 2), the active ingredient of the release agent is the resin layer 4. It becomes easy to orient on the surface (surface opposite to the base material 2).
- the effective component of the release agent can be efficiently oriented on the surface of the polymer layer 6 (the surface opposite to the substrate 2) without greatly increasing the content of the active component of the release agent. . That is, according to the manufacturing method of the optical member of Embodiment 2, antifouling property and abrasion resistance can be improved without impairing transparency (without increasing haze). Furthermore, according to the manufacturing method of the optical member of Embodiment 2, since the antifouling property and the abrasion resistance can be improved even with a small amount of the release agent, the material cost can be reduced.
- the first resin 8 and the second resin 9 are combinations that exhibit turbidity of 15 degrees (kaolin) or more and 35 degrees (kaolin) or less when mixed with each other. This indicates that the first resin 8 and the second resin 9 are not compatible.
- the second resin is integrated (the above process (2)). Since the active ingredient of the release agent in the resin 9 is difficult to be oriented on the surface of the polymer layer 6 (the surface opposite to the base material 2), the antifouling property and the abrasion resistance are lowered.
- the first resin 8 and the second resin 9 are preferably a combination that exhibits a turbidity of 20 degrees (kaolin) or more and 30 degrees (kaolin) or less when mixed with each other.
- the second resin 9 contains a release agent.
- the release agent in the second resin 9 is preferably a fluororesin having a photoreactive group, that is, a fluorine-based release agent. According to such a configuration, bleed out in a high temperature / high humidity environment is reduced, and the reliability of the optical member 1 is increased. Further, since the fluororesin has a low surface free energy, it is preferably used for improving the antifouling property (for example, fingerprint wiping property).
- the second resin 9 may appropriately contain various monomers in addition to the release agent.
- the content of the active ingredient of the release agent in the resin layer 4 is preferably 0.1 wt% or more and 10 wt% or less, more preferably 0.5 wt% or more and 9 wt% or less. More preferably, it is 1 to 5% by weight.
- the content of the active ingredient of the release agent in the resin layer 4 is less than 0.1% by weight, the surface of the polymer layer 6 (second resin 9) (the surface opposite to the base material 2) There is a concern that the amount of the active ingredient of the release agent becomes too small, and the antifouling property and abrasion resistance are lowered.
- the first resin 8 contains a photocurable resin.
- the photo-curing resin in the first resin 8 has a turbidity of 15 degrees (kaolin) or more and 35 degrees (kaolin) or less when the first resin 8 and the second resin 9 are mixed.
- various monomers, photopolymerization initiators, and the like may be appropriately contained.
- the photocurable resin in the first resin 8 preferably contains a compatible monomer that is compatible with the release agent in the second resin 9 as in the first embodiment.
- the active ingredient of the release agent is uniformly distributed on the surface of the polymer layer 6 (second resin 9) (the surface opposite to the substrate 2), so that the antifouling property is achieved. Will increase.
- the compatible monomer the adhesiveness between the photocurable resin and the release agent is increased, so that the abrasion resistance is increased.
- the photocurable resin contains a compatible monomer, the compatible monomer alone is compatible with the release agent, but the first resin 8 as a whole is not compatible with the second resin 9.
- the content of the compatible monomer in the photocurable resin is preferably 5% by weight or more and 30% by weight or less, more preferably 10% by weight or more and 25% by weight or less, 15% by weight or more, More preferably, it is 25% by weight or less.
- the content of the compatible monomer in the photocurable resin is less than 5% by weight, there is a concern that the antifouling property and the abrasion resistance are deteriorated particularly in a high temperature / high humidity environment.
- the content of the compatible monomer in the photocurable resin is higher than 30% by weight, the crosslink density of the polymer layer 6 is decreased and the cohesive force between the bonds is increased. Therefore, the hardness of the polymer layer 6 is increased. In particular, there is a concern that the rubbing resistance in a high temperature / high humidity environment is lowered.
- the first resin 8 and the second resin 9 do not contain a solvent. That is, the first resin 8 and the second resin 9 are preferably solventless. According to such a configuration, it is possible to reduce the cost related to the use of the solvent and the environmental load (odor or the like during use). Furthermore, an apparatus for removing the solvent is unnecessary, and the apparatus cost can be reduced.
- the thickness T1 of the first resin 8 is preferably 3 ⁇ m or more and 30 ⁇ m or less, and preferably 5 ⁇ m or more and 7 ⁇ m or less.
- the thickness T2 of the second resin 9 is preferably 0.1 ⁇ m or more and 15 ⁇ m or less, more preferably 1 ⁇ m or more and 10 ⁇ m or less, further preferably 2 ⁇ m or more and 8 ⁇ m or less, more preferably 5 ⁇ m or more, Particularly preferably, it is 8 ⁇ m or less.
- the haze of the optical member 1 is less than 1.0%.
- the haze of the optical member 1 is preferably less than 0.8%, and more preferably less than 0.5%.
- the haze of the optical member 1 is high. It becomes high (for example, 1.0% or more), and transparency is impaired.
- FIG. 3 is a schematic cross-sectional view for explaining the method for manufacturing the optical member of the third embodiment.
- the manufacturing method of the optical member of Embodiment 3 is the same as the manufacturing method of the optical member of Embodiment 2 except that the second resin is applied on the surface of the mold. Omitted.
- the application of the first resin 8 and the application of the second resin 9 may be performed at different timings or may be performed at the same timing.
- the first resin 8 is applied on the surface of the substrate 2, and the second resin 9 is applied to the surface of the first resin 8 or the mold 5.
- the second resin 9 may be applied on both the surfaces of the first resin 8 and the mold 5. That is, in the process (1), the first resin 8 is applied on the surface of the base 2, and the second resin 9 is applied to the surface of at least one of the first resin 8 and the mold 5. It may be done by applying on top.
- the second resin 9 is applied onto the surface (uneven surface) of the mold 5, and the first resin 8 is applied to the surface of the second resin 9 (the side opposite to the mold 5). It may be carried out by applying on the surface).
- Photocurable resins A1 to A4 having the compositions shown in Table 1 were used. Abbreviations for each material name are as follows. The numerical value in Table 1 shows the content rate of each material in each photocurable resin.
- DM Compact monomer
- U "U-10HA” manufactured by Shin-Nakamura Chemical Co., Ltd.
- DPH "A-DPH” manufactured by Shin-Nakamura Chemical Co., Ltd.
- TMM "A-TMM-3LM-N” manufactured by Shin-Nakamura Chemical Co., Ltd.
- Methyl ethyl ketone (MEK, boiling point: 79.6 ° C.) was used.
- a large number of minute holes (concave portions) having a shape (tapered shape) narrowing toward the surface were formed, and as a result, a mold having an uneven structure was obtained.
- Anodization was performed using oxalic acid (concentration: 0.03% by weight) under conditions of a liquid temperature of 5 ° C. and an applied voltage of 80V. The time for one anodic oxidation was 25 seconds.
- Etching was performed using phosphoric acid (concentration: 1 mol / l) at a liquid temperature of 30 ° C. The time for performing one etching was set to 25 minutes. When the mold was observed with a scanning electron microscope, the depth of the recess was 290 nm.
- the mold surface was subjected to a mold release treatment in advance by “OPTOOL AES4” manufactured by Daikin Industries, Ltd.
- Example 1-1 The optical member of Example 1-1 was produced by the optical member manufacturing method of Embodiment 1.
- the surface specification of the optical member 1 was as follows. Shape of convex portion 7: Pitch 200 between bell-shaped adjacent convex portions 7: 200 nm Height of convex part 7: 200 nm Aspect ratio of convex part 1: 1
- the surface specification of the optical member 1 was evaluated using a scanning electron microscope “S-4700” manufactured by Hitachi High-Technologies Corporation. At the time of evaluation, an osmium coater “Neoc-ST” manufactured by Meiwa Forsys was used on the surface of the optical member 1 (the surface opposite to the base material 2 of the polymer layer 6) manufactured by Wako Pure Chemical Industries, Ltd. Of osmium oxide VIII (thickness: 5 nm) was applied. Specifically, the pitch P between the adjacent convex portions 7 is the average of the distances between all the adjacent convex portions excluding the branch projections in the 1 ⁇ m square region of the planar photograph taken with the scanning electron microscope. Value.
- the height of the convex portion 7 was defined as the average value of the heights of ten convex portions arranged in a row, excluding branch protrusions, in the cross-sectional photograph taken with the scanning electron microscope. However, when 10 convex portions were selected, the convex portions having a defect or a deformed portion (a portion that was deformed when preparing a measurement sample, etc.) were excluded.
- Examples 1-2 to 1-9 and Comparative Examples 1-1 to 1-8) Optical members of respective examples were produced in the same manner as in Example 1-1 except that the compositions were changed as shown in Tables 3 to 6.
- Tables 3 to 6 also show the turbidity (simply referred to as “turbidity”) when the photocurable resin and the release agent are mixed in a ratio in the resin solution of each example.
- the turbidity was measured by placing a sample in a 10 mm cell in an integrating sphere turbidimeter “PT-200” manufactured by Mitsubishi Chemical Analytech Co., Ltd. and using a preset kaolin calibration curve.
- ⁇ Transparency> As transparency, the haze of the optical member of each example was evaluated. Specifically, the haze of the optical member in each example was measured using a haze meter “NDH7000” manufactured by Nippon Denshoku Industries Co., Ltd. Judgment criteria were as follows. A: Haze was 0.5% or less. ⁇ : Haze was higher than 0.5% and 0.8% or lower. ⁇ : Haze was higher than 0.8% and lower than 1.0%. X: Haze was 1.0% or more. Here, the case where the determination was ⁇ , ⁇ , or ⁇ was determined to be an acceptable level (excellent transparency).
- the fingerprint wiping property of the optical member of each example was evaluated. Specifically, first, a black acrylic plate was attached to the surface of the optical member of each example on the surface opposite to the polymer layer of the base material via the optical adhesive layer. Next, the optical member of each example was left for 101 days in an environment of a temperature of 60 ° C. and a humidity of 95%, and further left for 1 day in an environment of a temperature of 23 ° C. and a humidity of 50%.
- abrasion resistance As the abrasion resistance, the change rate of the reflectance before and after rubbing the surface with a nonwoven fabric was evaluated for the optical members of each example. Specifically, first, a black acrylic plate was attached to the surface of the optical member of each example opposite to the polymer layer of the base material. Then, in an environment of a temperature of 23 ° C. and a humidity of 50%, a light source is irradiated from an orientation with a polar angle of 5 ° with respect to the surface of the optical member of each example (the surface opposite to the base material of the polymer layer), The specular reflection spectral reflectance at an incident angle of 5 ° was measured.
- the reflectance was measured using “UV-3100PC” manufactured by Shimadzu Corporation in the wavelength region of 380 to 780 nm. Then, the average reflectance in the wavelength region of 450 to 650 nm was calculated from the measurement result, and the value was defined as reflectance A (unit:%).
- the optical member of each example was left for 101 days in an environment of a temperature of 60 ° C. and a humidity of 95%, and further returned to an environment of a temperature of 23 ° C. and a humidity of 50% and left for one day. Then, using “Bencot Lab (registered trademark)” manufactured by Asahi Kasei Fibers Corporation, the surface of the optical member of each example (the surface opposite to the base material of the polymer layer) was rubbed 10 times. Thereafter, the specular reflection spectral reflectance at 5 ° incident light was measured for the optical members of the respective examples in the same manner as described above. Then, the average reflectance in the wavelength region of 450 to 650 nm was calculated from the measurement result, and the value was defined as reflectance B (unit:%).
- “change rate of reflectance before and after rubbing (unit:%) 100 ⁇ (reflectance B ⁇ reflectance A) / reflectance A” is used, and the criterion is as follows: It was. A: The change rate of the reflectance was 15% or less. A: The rate of change in reflectance was higher than 15% and lower than 25%. (Triangle
- a case where the determination was ⁇ , ⁇ , or ⁇ was determined to be an acceptable level (excellent rub resistance).
- Example 1-1 to 1-9 were excellent in transparency, antifouling property, and abrasion resistance.
- Example 1-1, Example 1-4, Example 1-6, and Example 1-8 were particularly excellent in overall transparency, antifouling property, and abrasion resistance.
- Table 5 and Table 6 in Comparative Examples 1-1 to 1-8, at least one of transparency, antifouling property, and abrasion resistance was low.
- Second resins D1 to D4 having a composition as shown in Table 8 were used. Abbreviations for each material name are the same as in Evaluation 1. The numerical value in Table 8 shows the content rate of each material in each 2nd resin.
- the second resin D1 was prepared by the following method. First, for “OPTOOL DAC-HP” manufactured by Daikin Industries, Ltd., to N-acryloylmorpholine (“ACMO” manufactured by KJ Chemicals) using a rotary evaporator “N-1110 type” manufactured by Tokyo Rika Kikai Co., Ltd. The solvent was replaced. Thereafter, heat treatment was performed at a temperature of 180 ° C. for 5 hours using a mini jet oven “MD-92” manufactured by Toyama Sangyo Co., Ltd. After the heat treatment, the content of the active ingredient was adjusted to 10% by weight by adding “ACMO”.
- Example 2-1 The optical member of Example 2-1 was produced by the optical member manufacturing method of Embodiment 2.
- Example 2-2 (Example 2-2 and Comparative Examples 2-1 to 2-5) Optical members of the respective examples were produced in the same manner as in Example 2-1, except that the compositions were changed as shown in Table 9 and Table 10.
- Tables 9 and 10 also show the turbidity (simply referred to as “turbidity”) when the first resin and the second resin are mixed at a ratio in the resin layer of each example. .
- Example 2-1 The optical members of Example 2-1, Example 2-2, and Comparative Examples 2-1 to 2-5 were evaluated for transparency, antifouling properties, and abrasion resistance in the same manner as in Evaluation 1. .
- the results are shown in Table 9 and Table 10.
- Example 2-1 and Example 2-2 were excellent in transparency, antifouling property, and abrasion resistance.
- all of Comparative Examples 2-1 to 2-5 had low at least one of transparency, antifouling property, and abrasion resistance.
- One embodiment of the present invention is an optical device including a base material and a polymer layer that is provided on the surface of the base material and has a concavo-convex structure on the surface, in which a plurality of convex portions are provided at a pitch equal to or less than the wavelength of visible light.
- a method for producing a member which is a process (1) for preparing a resin solution by dissolving a photocurable resin and a release agent in a solvent, and a process (2) for applying the resin solution on the surface of the substrate.
- release agent is 5 degrees (kaolin) when mixed with each other
- the optical member is a combination showing turbidity of 25 degrees (kaolin) or less, and the haze of the optical member is less than 1.0% (the first optical member manufacturing method of the present invention). There may be. According to this aspect, it is possible to realize an optical member manufacturing method that improves antifouling property and abrasion resistance without impairing transparency.
- Another embodiment of the present invention includes a base material and a polymer layer that is disposed on the surface of the base material and has a concavo-convex structure provided on the surface with a plurality of convex portions provided at a pitch equal to or less than the wavelength of visible light.
- the haze of the optical member may be a method of producing an optical member is less than 1.0% (production method of the second optical member of the present invention). According to this aspect, it is possible to realize an optical member manufacturing method that improves antifouling property and abrasion resistance without impairing transparency.
- the first resin and the second resin may not contain a solvent. According to such a configuration, it is possible to reduce costs related to the use of the solvent and environmental loads (such as odor during use). Furthermore, an apparatus for removing the solvent is unnecessary, and the apparatus cost can be reduced.
- the content of the active ingredient of the release agent in the resin layer is 0.1% by weight or more. It may be 10% by weight or less. According to such a structure, antifouling property and abrasion resistance can be preferably increased.
- the releasing agent may be a fluororesin having a photoreactive group. According to such a configuration, bleed out in a high temperature / high humidity environment is reduced, and the reliability of the optical member is increased. Moreover, since the said fluororesin has low surface free energy, it is preferably used in order to improve antifouling property (for example, fingerprint wiping property).
- the photocurable resin contains a compatible monomer compatible with the release agent, and
- the content of the compatible monomer in the photocurable resin may be 5% by weight or more and 30% by weight or less. According to such a structure, antifouling property and abrasion resistance can be preferably increased.
- the thickness of the polymer layer may be 5.0 ⁇ m or more and 20.0 ⁇ m or less. According to such a configuration, the active ingredient of the release agent can be oriented at a high concentration on the surface of the polymer layer (the surface opposite to the substrate).
- the pitch may be not less than 100 nm and not more than 400 nm. According to such a configuration, it is possible to sufficiently prevent the occurrence of optical phenomena such as moire and rainbow unevenness.
- the heights of the plurality of convex portions may be 50 nm or more and 600 nm or less, respectively. According to such a configuration, it is possible to achieve a favorable aspect ratio of the plurality of convex portions.
- the aspect ratios of the plurality of convex portions are 0.8 or more and 1.5 or less, respectively. May be. According to such a configuration, it is possible to sufficiently prevent the occurrence of optical phenomena such as moire and rainbow unevenness, and to realize good reflection characteristics. Furthermore, it is possible to prevent deterioration in processability of the moth-eye structure, occurrence of sticking, and deterioration of the transfer condition when forming the moth-eye structure.
- Optical member 2 Base material 3: Resin solution 4: Resin layer 5: Mold 6: Polymer layer 7: Convex part 8: First resin 9: Second resin P: Pitch T: Polymer layer Thickness T1: First resin thickness T2: Second resin thickness
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Abstract
The present invention provides a method for manufacturing an optical member, whereby antifouling properties and abrasion resistance are increased without compromising transparency. This method for manufacturing an optical member is a method for manufacturing an optical member provided with a substrate and a polymer layer having an uneven structure on a surface thereof in which a plurality of projections are provided at a pitch equal to or less than the wavelength of visible light, wherein the method includes a process (1) for dissolving a photocurable resin and a release agent in a solvent and preparing a resin solution, a process (2) for applying the resin solution to the surface of the substrate, a process (3) for performing a heat treatment for removing the solvent from the applied resin solution and forming a resin layer, a process (4) for pressing the substrate against a die in a state in which the resin layer is sandwiched between the die and the substrate and forming the uneven structure on the surface of the resin layer, and a process (5) for curing the resin layer by photoirradiation and forming the polymer layer, the photocurable resin and the release agent being a combination exhibiting a predetermined turbidity when mixed with each other, and the optical member having a haze of less than 1.0%.
Description
本発明は、光学部材の製造方法に関する。より詳しくは、ナノメートルサイズの凹凸構造を有する光学部材の製造方法に関するものである。
The present invention relates to a method for manufacturing an optical member. More specifically, the present invention relates to a method for manufacturing an optical member having a nanometer-size uneven structure.
光学部材は、様々な分野での適用が検討されている(例えば、特許文献1~5参照)。特に、ナノメートルサイズの凹凸構造(ナノ構造)を有する光学部材は、優れた反射防止性を有することが知られている。このような凹凸構造によれば、空気層から基材にかけて屈折率が連続的に変化するために、反射光を劇的に減少させることができる。
Optical members are being studied for application in various fields (see, for example, Patent Documents 1 to 5). In particular, it is known that an optical member having a nanometer-size uneven structure (nanostructure) has excellent antireflection properties. According to such a concavo-convex structure, since the refractive index continuously changes from the air layer to the substrate, the reflected light can be dramatically reduced.
このような光学部材としては、例えば、凹凸構造を表面に有する重合体層が基材の表面上に配置される構成が挙げられる。しかしながら、従来の光学部材では、凹凸構造を表面に有するため、指紋が拭き取りにくい、すなわち、防汚性が低いという問題があった。
As such an optical member, the structure by which the polymer layer which has an uneven structure on the surface is arrange | positioned on the surface of a base material is mentioned, for example. However, since the conventional optical member has a concavo-convex structure on the surface, there is a problem that fingerprints are difficult to wipe off, that is, the antifouling property is low.
これに対して、本発明者らは、光硬化性樹脂及び離型剤を用いて重合体層を形成し、離型剤の効果によって防汚性(指紋拭き取り性)を高めようと試みた。しかしながら、凹凸構造の表面積が大きいため、光硬化性樹脂と離型剤とを単に配合しただけでは、離型剤の有効成分が凹凸構造の表面に配向しにくいことが分かった。その結果、防汚性だけではなく、滑り性も充分に得られないことが分かった。滑り性が不充分である場合、重合体層の表面を擦る際の負荷(摩擦抵抗)が大きくなるため、耐擦性が低下してしまう。また、光学部材を高温/高湿の環境下に放置すると、離型剤の有効成分の配向性が変化するため、防汚性及び耐擦性が顕著に低下することが分かった。
On the other hand, the present inventors tried to improve the antifouling property (fingerprint wiping property) by forming a polymer layer using a photocurable resin and a release agent and by the effect of the release agent. However, since the surface area of the concavo-convex structure is large, it has been found that the effective component of the release agent is difficult to orient on the surface of the concavo-convex structure simply by blending the photocurable resin and the release agent. As a result, it was found that not only antifouling property but also slipperiness could not be obtained sufficiently. Insufficient slipperiness increases the load (friction resistance) when rubbing the surface of the polymer layer, resulting in a decrease in abrasion resistance. Further, it was found that when the optical member is left in a high temperature / high humidity environment, the orientation of the active ingredient of the mold release agent changes, so that the antifouling property and abrasion resistance are remarkably reduced.
これに対して、本発明者らは、離型剤の有効成分の含有率(濃度)を高めて、凹凸構造の表面に配向する量を多くしようと試みた。しかしながら、離型剤の有効成分の含有率を単に高めただけでは、光硬化性樹脂との相溶性が低下するため、離型剤が不溶化することが分かった。その結果、光学部材のヘイズが高くなる、すなわち、透明性が低下してしまうことが分かった。
On the other hand, the present inventors tried to increase the content (concentration) of the active ingredient of the release agent to increase the amount of orientation on the surface of the concavo-convex structure. However, it has been found that simply increasing the content of the active ingredient in the release agent lowers the compatibility with the photocurable resin, so that the release agent becomes insoluble. As a result, it was found that the haze of the optical member increases, that is, the transparency decreases.
以上のように、従来の光学部材については、透明性を損なうことなく、防汚性及び耐擦性を高める点で改善の余地があった。
As described above, the conventional optical member has room for improvement in terms of enhancing the antifouling property and the abrasion resistance without impairing the transparency.
上記特許文献1には、フッ素化合物を含む光硬化性樹脂組成物を用いて凹凸構造を形成する方法が記載されている。しかしながら、フッ素化合物を単に配合しただけでは防汚性及び耐擦性が不充分であり、改善の余地があった。
Patent Document 1 describes a method of forming a concavo-convex structure using a photocurable resin composition containing a fluorine compound. However, simply blending a fluorine compound is insufficient in antifouling properties and abrasion resistance, and there is room for improvement.
上記特許文献2には、フッ素含有化合物を含むフッ素含有樹脂組成物を用いて凹凸構造が形成された光学物品が記載されている。しかしながら、フッ素含有化合物が、実施例で用いられた多官能硬化剤に溶解するため、防汚性及び耐擦性が不充分であり、改善の余地があった。
Patent Document 2 describes an optical article in which a concavo-convex structure is formed using a fluorine-containing resin composition containing a fluorine-containing compound. However, since the fluorine-containing compound is dissolved in the polyfunctional curing agent used in the examples, the antifouling property and abrasion resistance are insufficient, and there is room for improvement.
上記特許文献3には、重合性組成物(フッ素樹脂)を用いて形成されたハードコートフィルムが記載されている。しかしながら、フッ素原子の配向性を利用しただけでは防汚性及び耐擦性が不充分であり、改善の余地があった。
Patent Document 3 describes a hard coat film formed using a polymerizable composition (fluororesin). However, simply utilizing the orientation of fluorine atoms is insufficient in antifouling properties and abrasion resistance, and there is room for improvement.
上記特許文献4には、凹凸構造の表面上に、フッ素原子を含む表面処理層が形成された積層体が記載されている。しかしながら、表面処理層が剥離しやすいため、耐擦性が不充分であり、改善の余地があった。
Patent Document 4 describes a laminate in which a surface treatment layer containing fluorine atoms is formed on the surface of an uneven structure. However, since the surface treatment layer is easily peeled off, the abrasion resistance is insufficient and there is room for improvement.
上記特許文献5には、表面自由エネルギーが高い多官能モノマーと、その多官能モノマーと相溶するフッ素系(メタ)アクリレートとを含む活性エネルギー線硬化性樹脂組成物を用いて形成されたナノ凹凸構造体が記載されている。しかしながら、両成分の表面自由エネルギーの差を利用しただけでは、フッ素原子を表面に配向させる効果が不充分であった。また、フッ素系(メタ)アクリレートが相溶する量には限界があり、フッ素原子を表面に配向させる効果が不充分であった。以上より、防汚性及び耐擦性が不充分であり、改善の余地があった。
Patent Document 5 discloses a nano unevenness formed by using an active energy ray-curable resin composition containing a polyfunctional monomer having a high surface free energy and a fluorine-based (meth) acrylate compatible with the polyfunctional monomer. A structure is described. However, the effect of orienting fluorine atoms on the surface is insufficient only by utilizing the difference in surface free energy between the two components. Moreover, there is a limit to the amount of the fluorine-based (meth) acrylate that is compatible, and the effect of orienting fluorine atoms on the surface is insufficient. As described above, the antifouling property and abrasion resistance are insufficient, and there is room for improvement.
本発明は、上記現状に鑑みてなされたものであり、透明性を損なうことなく、防汚性及び耐擦性を高める光学部材の製造方法を提供することを目的とするものである。
The present invention has been made in view of the above situation, and an object of the present invention is to provide a method for producing an optical member that improves antifouling properties and abrasion resistance without impairing transparency.
本発明者らは、透明性を損なうことなく、防汚性及び耐擦性を高める光学部材の製造方法について種々検討したところ、互いに相溶しない光硬化性樹脂及び離型剤を用いて重合体層を形成する方法に着目した。そして、(1)光硬化性樹脂及び離型剤を溶剤に溶解させた後、その溶剤を除去する方法、及び、(2)光硬化性樹脂及び離型剤を2層に分けて塗布した後、両層を一体化させる方法を見出した。以上により、上記課題をみごとに解決することができることに想到し、本発明に到達したものである。
The inventors of the present invention have studied various methods for producing an optical member that enhances antifouling properties and abrasion resistance without impairing transparency. As a result, polymers using a photocurable resin and a release agent that are incompatible with each other are used. We focused on the method of forming the layer. And after (1) dissolving a photocurable resin and a release agent in a solvent, and then removing the solvent, and (2) after applying the photocurable resin and the release agent in two layers And found a method of integrating both layers. As a result, the inventors have conceived that the above problems can be solved brilliantly and have reached the present invention.
すなわち、本発明の一態様は、基材と、上記基材の表面上に配置される、複数の凸部が可視光の波長以下のピッチで設けられる凹凸構造を表面に有する重合体層とを備える光学部材の製造方法であって、光硬化性樹脂及び離型剤を溶剤に溶解させ、樹脂溶液を調製するプロセス(1)と、上記樹脂溶液を上記基材の表面上に塗布するプロセス(2)と、上記樹脂溶液の塗布物から上記溶剤を除去する加熱処理を行い、樹脂層を形成するプロセス(3)と、上記樹脂層を間に挟んだ状態で上記基材を金型に押し当て、上記凹凸構造を上記樹脂層の表面に形成するプロセス(4)と、上記樹脂層を光照射によって硬化させ、上記重合体層を形成するプロセス(5)とを含み、上記光硬化性樹脂及び上記離型剤は、互いに混合させた場合に、5度(カオリン)以上、25度(カオリン)以下の濁度を示す組み合わせであり、上記光学部材のヘイズは、1.0%未満である光学部材の製造方法(以下、本発明の第一の光学部材の製造方法とも言う。)であってもよい。
That is, according to one embodiment of the present invention, there is provided a base material, and a polymer layer that is provided on the surface of the base material and has a concavo-convex structure provided on the surface with a plurality of convex portions provided at a pitch equal to or less than the wavelength of visible light. A process for producing an optical member comprising: a process (1) for preparing a resin solution by dissolving a photocurable resin and a release agent in a solvent; and a process for applying the resin solution on the surface of the substrate ( 2), a heat treatment for removing the solvent from the coated resin solution, and a resin layer is formed (3), and the substrate is pressed against the mold with the resin layer sandwiched therebetween. A process (4) for forming the concavo-convex structure on the surface of the resin layer, and a process (5) for curing the resin layer by light irradiation to form the polymer layer. And the mold release agent, when mixed with each other, 5 degrees ( Olin) is a combination showing turbidity of 25 degrees (kaolin) or less, and the haze of the optical member is less than 1.0% (hereinafter referred to as the first optical member of the present invention). It may also be called a manufacturing method.
本発明の別の一態様は、基材と、上記基材の表面上に配置される、複数の凸部が可視光の波長以下のピッチで設けられる凹凸構造を表面に有する重合体層とを備える光学部材の製造方法であって、第一の樹脂及び第二の樹脂を塗布するプロセス(1)と、上記第一の樹脂及び上記第二の樹脂を間に挟んだ状態で、基材を金型に上記第一の樹脂側から押し当て、上記凹凸構造を表面に有する樹脂層を形成するプロセス(2)と、上記樹脂層を光照射によって硬化させ、上記重合体層を形成するプロセス(3)とを含み、上記第一の樹脂は、光硬化性樹脂を含有し、上記第二の樹脂は、離型剤を含有し、上記第一の樹脂及び上記第二の樹脂は、互いに混合させた場合に、15度(カオリン)以上、35度(カオリン)以下の濁度を示す組み合わせであり、上記光学部材のヘイズは、1.0%未満である光学部材の製造方法(以下、本発明の第二の光学部材の製造方法とも言う。)であってもよい。
Another embodiment of the present invention includes a base material and a polymer layer that is disposed on the surface of the base material and has a concavo-convex structure provided on the surface with a plurality of convex portions provided at a pitch equal to or less than the wavelength of visible light. A process (1) for applying a first resin and a second resin, and a substrate in a state where the first resin and the second resin are sandwiched therebetween, A process (2) of pressing the mold from the first resin side to form a resin layer having the concavo-convex structure on the surface, and a process of curing the resin layer by light irradiation to form the polymer layer ( 3), the first resin contains a photocurable resin, the second resin contains a release agent, and the first resin and the second resin are mixed with each other. Combination of turbidity of 15 degrees (kaolin) or more and 35 degrees (kaolin) or less There, the haze of the optical member, the method of manufacturing the optical member is less than 1.0% may be (hereinafter, also the manufacturing method of the second optical member of the present invention refers.).
本発明によれば、透明性を損なうことなく、防汚性及び耐擦性を高める光学部材の製造方法を提供することができる。
ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method of the optical member which improves antifouling property and abrasion resistance can be provided, without impairing transparency.
以下に実施形態を掲げ、本発明について図面を参照して更に詳細に説明するが、本発明はこれらの実施形態のみに限定されるものではない。また、各実施形態の構成は、本発明の要旨を逸脱しない範囲において適宜組み合わされてもよいし、変更されてもよい。
Embodiments will be described below, and the present invention will be described in more detail with reference to the drawings. However, the present invention is not limited only to these embodiments. In addition, the configurations of the respective embodiments may be appropriately combined or changed within a range not departing from the gist of the present invention.
[実施形態1]
実施形態1の光学部材の製造方法は、本発明の第一の光学部材の製造方法に関する。実施形態1の光学部材の製造方法について、図1を参照して以下に説明する。図1は、実施形態1の光学部材の製造方法を説明するための断面模式図である。 [Embodiment 1]
The manufacturing method of the optical member of Embodiment 1 is related with the manufacturing method of the 1st optical member of this invention. The manufacturing method of the optical member of Embodiment 1 is demonstrated below with reference to FIG. FIG. 1 is a schematic cross-sectional view for explaining the method of manufacturing the optical member of the first embodiment.
実施形態1の光学部材の製造方法は、本発明の第一の光学部材の製造方法に関する。実施形態1の光学部材の製造方法について、図1を参照して以下に説明する。図1は、実施形態1の光学部材の製造方法を説明するための断面模式図である。 [Embodiment 1]
The manufacturing method of the optical member of Embodiment 1 is related with the manufacturing method of the 1st optical member of this invention. The manufacturing method of the optical member of Embodiment 1 is demonstrated below with reference to FIG. FIG. 1 is a schematic cross-sectional view for explaining the method of manufacturing the optical member of the first embodiment.
(プロセス(1):樹脂溶液の調製)
光硬化性樹脂及び離型剤を溶剤に溶解させ、樹脂溶液3を調製する。 (Process (1): Preparation of resin solution)
A photocurable resin and a release agent are dissolved in a solvent to prepare aresin solution 3.
光硬化性樹脂及び離型剤を溶剤に溶解させ、樹脂溶液3を調製する。 (Process (1): Preparation of resin solution)
A photocurable resin and a release agent are dissolved in a solvent to prepare a
樹脂溶液3の調製は、例えば、下記の手順で行われる。
(i)各種モノマー、光重合開始剤等を適宜混合させ、光硬化性樹脂(透明状態)を調製する。
(ii)光硬化性樹脂及び離型剤の混合物(白濁状態)を調製する。
(iii)光硬化性樹脂及び離型剤の混合物を溶剤に溶解させ、樹脂溶液3(透明状態又は若干の白濁状態)を調製する。 Theresin solution 3 is prepared, for example, by the following procedure.
(I) Various monomers, a photopolymerization initiator, and the like are appropriately mixed to prepare a photocurable resin (transparent state).
(Ii) A mixture (white turbid state) of a photocurable resin and a release agent is prepared.
(Iii) A mixture of a photocurable resin and a release agent is dissolved in a solvent to prepare a resin solution 3 (transparent state or slightly cloudy state).
(i)各種モノマー、光重合開始剤等を適宜混合させ、光硬化性樹脂(透明状態)を調製する。
(ii)光硬化性樹脂及び離型剤の混合物(白濁状態)を調製する。
(iii)光硬化性樹脂及び離型剤の混合物を溶剤に溶解させ、樹脂溶液3(透明状態又は若干の白濁状態)を調製する。 The
(I) Various monomers, a photopolymerization initiator, and the like are appropriately mixed to prepare a photocurable resin (transparent state).
(Ii) A mixture (white turbid state) of a photocurable resin and a release agent is prepared.
(Iii) A mixture of a photocurable resin and a release agent is dissolved in a solvent to prepare a resin solution 3 (transparent state or slightly cloudy state).
樹脂溶液3の調製方法として、上記の手順では、光硬化性樹脂及び離型剤を混合させた後に溶剤を添加していたが、例えば、光硬化性樹脂及び溶剤を混合させた後に離型剤を添加してもよい。
As a method for preparing the resin solution 3, in the above procedure, the solvent was added after mixing the photocurable resin and the mold release agent. For example, the mold release agent was mixed after mixing the photocurable resin and the solvent. May be added.
(プロセス(2):樹脂溶液の塗布)
図1(a)に示すように、樹脂溶液3を基材2の表面上に塗布する。 (Process (2): Application of resin solution)
As shown in FIG. 1A, theresin solution 3 is applied on the surface of the substrate 2.
図1(a)に示すように、樹脂溶液3を基材2の表面上に塗布する。 (Process (2): Application of resin solution)
As shown in FIG. 1A, the
樹脂溶液3の塗布方法としては、例えば、スプレー方式、グラビア方式、スロットダイ方式、バーコート方式等で塗布する方法が挙げられる。膜厚が容易に調製可能であり、かつ、装置コストを低減する観点からは、スプレー方式で塗布する方法が好ましい。中でも、スワールノズル、静電ノズル、又は、超音波ノズルを用いて塗布することが特に好ましい。
Examples of the coating method of the resin solution 3 include a coating method using a spray method, a gravure method, a slot die method, a bar coating method, and the like. From the viewpoint of easily adjusting the film thickness and reducing the cost of the apparatus, a method of applying by a spray method is preferable. Among these, application using a swirl nozzle, electrostatic nozzle, or ultrasonic nozzle is particularly preferable.
(プロセス(3):樹脂層の形成)
樹脂溶液3の塗布物から溶剤を除去する加熱処理を行う。その結果、図1(b)に示すように、樹脂層4が形成される。 (Process (3): Formation of resin layer)
A heat treatment for removing the solvent from the coated material of theresin solution 3 is performed. As a result, the resin layer 4 is formed as shown in FIG.
樹脂溶液3の塗布物から溶剤を除去する加熱処理を行う。その結果、図1(b)に示すように、樹脂層4が形成される。 (Process (3): Formation of resin layer)
A heat treatment for removing the solvent from the coated material of the
加熱処理の方法としては、例えば、基材2の表面上に樹脂溶液3の塗布物が配置された状態(図1(a)の状態)のものをオーブンに入れて加熱する方法が挙げられる。加熱処理は、溶剤の沸点以上の温度で行われることが好ましい。溶剤は、加熱処理によって、一部が除去されてもよいし、完全に除去されてもよい。
As a heat treatment method, for example, a method in which a coated product of the resin solution 3 is disposed on the surface of the substrate 2 (the state shown in FIG. 1A) is heated in an oven. The heat treatment is preferably performed at a temperature equal to or higher than the boiling point of the solvent. A part of the solvent may be removed by heat treatment or may be completely removed.
(プロセス(4):凹凸構造の形成)
図1(c)に示すように、樹脂層4を間に挟んだ状態で、基材2を金型5に押し当てる。その結果、凹凸構造が樹脂層4の表面(基材2とは反対側の表面)に形成される。 (Process (4): Formation of uneven structure)
As shown in FIG. 1C, thesubstrate 2 is pressed against the mold 5 with the resin layer 4 sandwiched therebetween. As a result, a concavo-convex structure is formed on the surface of the resin layer 4 (surface opposite to the base material 2).
図1(c)に示すように、樹脂層4を間に挟んだ状態で、基材2を金型5に押し当てる。その結果、凹凸構造が樹脂層4の表面(基材2とは反対側の表面)に形成される。 (Process (4): Formation of uneven structure)
As shown in FIG. 1C, the
(プロセス(5):樹脂層の硬化)
樹脂層4を光照射によって硬化させる。その結果、図1(d)に示すように、重合体層6が形成される。 (Process (5): Curing of resin layer)
Theresin layer 4 is cured by light irradiation. As a result, a polymer layer 6 is formed as shown in FIG.
樹脂層4を光照射によって硬化させる。その結果、図1(d)に示すように、重合体層6が形成される。 (Process (5): Curing of resin layer)
The
樹脂層4の硬化は光照射によって行われるが、活性エネルギー線の照射によって行われることが好ましい。活性エネルギー線は、紫外線、可視光線、赤外線、プラズマ等を指す。樹脂層4は、紫外線によって硬化するものであることが好ましい。樹脂層4に対する光照射は、樹脂層4の基材2側から行ってもよく、樹脂層4の金型5側から行ってもよい。また、樹脂層4に対する光照射回数は、1回のみであってもよいし、複数回であってもよい。樹脂層4の硬化(上記プロセス(5))は、上述した樹脂層4への凹凸構造の形成(上記プロセス(4))と同じタイミングで行ってもよい。
Although hardening of the resin layer 4 is performed by light irradiation, it is preferable to be performed by irradiation of active energy rays. Active energy rays refer to ultraviolet rays, visible rays, infrared rays, plasma, and the like. It is preferable that the resin layer 4 is hardened | cured with an ultraviolet-ray. The light irradiation on the resin layer 4 may be performed from the substrate 2 side of the resin layer 4 or from the mold 5 side of the resin layer 4. Moreover, the light irradiation number with respect to the resin layer 4 may be only once, and may be multiple times. The curing of the resin layer 4 (the above process (5)) may be performed at the same timing as the formation of the concavo-convex structure on the resin layer 4 (the above process (4)).
(プロセス(6):金型の剥離)
図1(e)に示すように、金型5を重合体層6から剥離する。その結果、光学部材1が完成する。重合体層6の表面(基材2とは反対側の表面)に形成された凹凸構造は、複数の凸部(突起)7が可視光の波長以下のピッチ(隣接する凸部7の頂点間の距離)Pで設けられる構造、すなわち、モスアイ構造(蛾の目状の構造)に相当する。よって、光学部材1は、モスアイ構造による優れた反射防止性(低反射性)を示すことができる。 (Process (6): Mold peeling)
As shown in FIG. 1 (e), themold 5 is peeled from the polymer layer 6. As a result, the optical member 1 is completed. The concavo-convex structure formed on the surface of the polymer layer 6 (surface opposite to the substrate 2) has a plurality of convex portions (protrusions) 7 having a pitch less than the wavelength of visible light (between the apexes of adjacent convex portions 7). This corresponds to a structure provided at a distance P), that is, a moth-eye structure (an eye-like structure). Therefore, the optical member 1 can exhibit excellent antireflection properties (low reflectivity) due to the moth-eye structure.
図1(e)に示すように、金型5を重合体層6から剥離する。その結果、光学部材1が完成する。重合体層6の表面(基材2とは反対側の表面)に形成された凹凸構造は、複数の凸部(突起)7が可視光の波長以下のピッチ(隣接する凸部7の頂点間の距離)Pで設けられる構造、すなわち、モスアイ構造(蛾の目状の構造)に相当する。よって、光学部材1は、モスアイ構造による優れた反射防止性(低反射性)を示すことができる。 (Process (6): Mold peeling)
As shown in FIG. 1 (e), the
上述した製造プロセスにおいて、例えば、基材2をロール状にすれば、上記プロセス(2)~(6)を連続的かつ効率的に行うことができる。
In the manufacturing process described above, for example, if the substrate 2 is formed into a roll, the above processes (2) to (6) can be performed continuously and efficiently.
以上より、実施形態1の光学部材の製造方法によれば、互いに相溶しない光硬化性樹脂及び離型剤を溶剤に溶解させた(上記プロセス(1))後、その溶剤を除去する(上記プロセス(3))ことによって、離型剤が不溶化するため、離型剤の有効成分が樹脂層4の表面(基材2とは反対側の表面)に配向しやすくなる。よって、離型剤の有効成分の含有率を大きく高めなくても、離型剤の有効成分を重合体層6の表面(基材2とは反対側の表面)に効率良く配向させることができる。すなわち、実施形態1の光学部材の製造方法によれば、透明性を損なうことなく(ヘイズが高くなることなく)、防汚性及び耐擦性を高めることができる。更に、実施形態1の光学部材の製造方法によれば、離型剤が少量であっても防汚性及び耐擦性を高めることができるため、材料コストを低減することができる。
As mentioned above, according to the manufacturing method of the optical member of Embodiment 1, after the photocurable resin and release agent which are mutually incompatible are dissolved in the solvent (the above process (1)), the solvent is removed (the above Since the release agent is insolubilized by the process (3)), the active component of the release agent is easily oriented on the surface of the resin layer 4 (surface opposite to the base material 2). Therefore, the effective component of the release agent can be efficiently oriented on the surface of the polymer layer 6 (the surface opposite to the substrate 2) without greatly increasing the content of the active component of the release agent. . That is, according to the manufacturing method of the optical member of Embodiment 1, antifouling property and abrasion resistance can be improved without impairing transparency (without increasing haze). Furthermore, according to the manufacturing method of the optical member of Embodiment 1, since the antifouling property and the abrasion resistance can be improved even with a small amount of the release agent, the material cost can be reduced.
続いて、光学部材1を製造する際に用いられる各部材について、以下に説明する。
Then, each member used when manufacturing the optical member 1 is demonstrated below.
基材2の材料としては、例えば、トリアセチルセルロース(TAC)、ポリエチレンテレフタレート(PET)、メチルメタクリレート(MMA)等の樹脂が挙げられる。基材2は、上記材料に加えて、可塑剤等の添加剤を適宜含んでいてもよい。基材2の表面(重合体層6側の表面)には易接着処理が施されていてもよく、例えば、易接着処理が施されたトリアセチルセルロースフィルムを用いることができる。また、基材2の表面(重合体層6側の表面)にはケン化処理が施されていてもよく、例えば、ケン化処理が施されたトリアセチルセルロースフィルムを用いることができる。
Examples of the material of the substrate 2 include resins such as triacetyl cellulose (TAC), polyethylene terephthalate (PET), and methyl methacrylate (MMA). The base material 2 may appropriately contain additives such as a plasticizer in addition to the above materials. The surface of the base material 2 (the surface on the polymer layer 6 side) may be subjected to easy adhesion treatment, and for example, a triacetyl cellulose film subjected to easy adhesion treatment can be used. Further, the surface of the substrate 2 (the surface on the polymer layer 6 side) may be subjected to saponification treatment, and for example, a triacetyl cellulose film subjected to saponification treatment can be used.
基材2の形状としては、例えば、フィルム状、シート状等が挙げられる。フィルム状の光学部材1を製造する場合は、フィルム状の基材2を用いればよい。また、基材2が偏光板の一部を構成する形態が好ましい。
Examples of the shape of the substrate 2 include a film shape and a sheet shape. When the film-like optical member 1 is manufactured, the film-like substrate 2 may be used. Moreover, the form in which the base material 2 comprises a part of polarizing plate is preferable.
基材2の厚みは、透明性及び加工性を確保する観点から、50μm以上、100μm以下であることが好ましい。
The thickness of the substrate 2 is preferably 50 μm or more and 100 μm or less from the viewpoint of ensuring transparency and workability.
基材2のヘイズは、透明性を確保する観点から、1%未満であることが好ましい。
The haze of the substrate 2 is preferably less than 1% from the viewpoint of ensuring transparency.
光硬化性樹脂及び離型剤は、互いに混合させた場合に、5度(カオリン)以上、25度(カオリン)以下の濁度を示す組み合わせである。これは、光硬化性樹脂と離型剤とが相溶しないことを示している。本明細書中、複数の材料が「相溶する」とは、これらの材料を混合させた場合の濁度が5度(カオリン)未満(透明状態)となることを指す。一方、複数の材料が「相溶しない」とは、これらの材料を混合させた場合の濁度が5度(カオリン)以上(白濁状態)となることを指す。光硬化性樹脂と離型剤とを混合させた場合の濁度が5度(カオリン)未満である場合、溶剤を除去する(上記プロセス(3))際に、離型剤の有効成分が重合体層6の表面(基材2とは反対側の表面)に配向しにくくなるため、防汚性及び耐擦性が低下してしまう。光硬化性樹脂と離型剤とを混合させた場合の濁度が25度(カオリン)よりも高い場合、光硬化性樹脂と離型剤とが分離しやすくなるため、特に、高温/高湿の環境下における防汚性(例えば、指紋拭き取り性)が低下してしまう。光硬化性樹脂及び離型剤は、互いに混合させた場合に、7度(カオリン)以上、15度(カオリン)以下の濁度を示す組み合わせであることが好ましい。本明細書中、濁度は、カオリン標準液に基づいて決定される。例えば、三菱化学アナリテック社製の積分球式濁度計「PT-200」において、10mmセルに試料を入れ、予め設定されているカオリン検量線を用いることによって、濁度を測定することができる。
The photocurable resin and the release agent are a combination that exhibits a turbidity of 5 degrees (kaolin) or more and 25 degrees (kaolin) or less when mixed with each other. This indicates that the photocurable resin and the release agent are not compatible. In the present specification, the phrase “compatible” means that the turbidity when these materials are mixed is less than 5 degrees (kaolin) (transparent state). On the other hand, “not compatible” with a plurality of materials means that the turbidity when these materials are mixed is 5 degrees (kaolin) or more (white turbid state). When the turbidity when the photocurable resin and the release agent are mixed is less than 5 degrees (kaolin), the active ingredient of the release agent is heavy when the solvent is removed (the above process (3)). Since it becomes difficult to orient on the surface of the combined layer 6 (surface opposite to the base material 2), the antifouling property and the abrasion resistance are lowered. When the turbidity when the photocurable resin and the release agent are mixed is higher than 25 degrees (kaolin), the photocurable resin and the release agent are easily separated. The antifouling property (for example, fingerprint wiping property) in the environment of the above will decrease. The photocurable resin and the release agent are preferably a combination that exhibits a turbidity of 7 degrees (kaolin) or more and 15 degrees (kaolin) or less when mixed with each other. In this specification, turbidity is determined based on a kaolin standard solution. For example, in an integrating sphere turbidimeter “PT-200” manufactured by Mitsubishi Chemical Analytech, turbidity can be measured by placing a sample in a 10 mm cell and using a preset kaolin calibration curve. .
離型剤は、光反応性基を有するフッ素樹脂(以下、単に、フッ素樹脂とも言う。)、すなわち、フッ素系離型剤であることが好ましい。このような構成によれば、高温/高湿の環境下におけるブリードアウトが低減し、光学部材1の信頼性が高まる。また、フッ素樹脂は表面自由エネルギーが低いため、防汚性(例えば、指紋拭き取り性)を高めるために好ましく用いられる。
The release agent is preferably a fluororesin having a photoreactive group (hereinafter also simply referred to as a fluororesin), that is, a fluorine-based release agent. According to such a configuration, bleed out in a high temperature / high humidity environment is reduced, and the reliability of the optical member 1 is increased. Further, since the fluororesin has a low surface free energy, it is preferably used for improving the antifouling property (for example, fingerprint wiping property).
フッ素樹脂は、光反応性基を有するフッ素含有モノマー(以下、単に、フッ素含有モノマーとも言う。)を有効成分として含有している。このような構成によれば、重合体層6の表面自由エネルギーが低くなり、防汚性が高まる。更に、フッ素原子が重合体層6の表面(基材2とは反対側の表面)に配向するため、滑り性が高まる。その結果、耐擦性が高まる。本明細書中、光反応性基は、光によって他の成分と反応する官能基を指す。このような光反応性基としては、例えば、アルコキシシリル基、シリルエーテル基、アルコキシシリル基が加水分解されたシラノール基、カルボキシル基、水酸基、エポキシ基、ビニル基、アリル基、アクリロイル基、メタクリロイル基等が挙げられる。光反応性基としては、光反応性及び取り扱い性の観点から、アルコキシシリル基、シリルエーテル基、シラノール基、エポキシ基、ビニル基、アリル基、アクリロイル基、又は、メタクリロイル基が好ましく、ビニル基、アリル基、アクリロイル基、又は、メタクリロイル基がより好ましく、アクリロイル基、又は、メタクリロイル基が更に好ましい。
The fluororesin contains a fluorine-containing monomer having a photoreactive group (hereinafter also simply referred to as a fluorine-containing monomer) as an active ingredient. According to such a structure, the surface free energy of the polymer layer 6 becomes low, and antifouling property increases. Furthermore, since the fluorine atoms are oriented on the surface of the polymer layer 6 (the surface on the side opposite to the base material 2), the slipperiness is enhanced. As a result, the abrasion resistance is increased. In the present specification, the photoreactive group refers to a functional group that reacts with other components by light. Examples of such photoreactive groups include alkoxysilyl groups, silyl ether groups, hydrolyzed silanol groups, carboxyl groups, hydroxyl groups, epoxy groups, vinyl groups, allyl groups, acryloyl groups, methacryloyl groups. Etc. As the photoreactive group, from the viewpoint of photoreactivity and handling, an alkoxysilyl group, a silyl ether group, a silanol group, an epoxy group, a vinyl group, an allyl group, an acryloyl group, or a methacryloyl group are preferable, a vinyl group, An allyl group, an acryloyl group, or a methacryloyl group is more preferable, and an acryloyl group or a methacryloyl group is still more preferable.
フッ素含有モノマーは、光反応性基に加えて、フルオロアルキル基、フルオロオキシアルキル基、フルオロアルケニル基、フルオロアルカンジイル基、及び、フルオロオキシアルカンジイル基からなる群より選択される少なくとも1つを含む部位を有することが好ましい。フルオロアルキル基、フルオロオキシアルキル基、フルオロアルケニル基、フルオロアルカンジイル基、及び、フルオロオキシアルカンジイル基は、各々、アルキル基、オキシアルキル基、アルケニル基、アルカンジイル基、及び、オキシアルカンジイル基が有する水素原子の少なくとも一部がフッ素原子で置換された置換基である。フルオロアルキル基、フルオロオキシアルキル基、フルオロアルケニル基、フルオロアルカンジイル基、及び、フルオロオキシアルカンジイル基は、いずれも主にフッ素原子及び炭素原子から構成される置換基であり、その構造中に分岐部が存在していてもよく、これらの置換基は複数連結していてもよい。
The fluorine-containing monomer includes at least one selected from the group consisting of a fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group in addition to the photoreactive group. It is preferable to have a site. A fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group are respectively an alkyl group, an oxyalkyl group, an alkenyl group, an alkanediyl group, and an oxyalkanediyl group. It is a substituent in which at least part of the hydrogen atoms it has are substituted with fluorine atoms. A fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group are all substituents mainly composed of fluorine atoms and carbon atoms, and are branched in the structure. Part may be present, and a plurality of these substituents may be linked.
フッ素含有モノマーの一例は、下記一般式(A)で表される。
Rf1-R2-D1 (A)
上記一般式(A)中、Rf1は、フルオロアルキル基、フルオロオキシアルキル基、フルオロアルケニル基、フルオロアルカンジイル基、及び、フルオロオキシアルカンジイル基からなる群より選択される少なくとも1つを含む部位を表す。R2は、アルカンジイル基、アルカントリイル基、又は、それらから導出されるエステル構造、ウレタン構造、エーテル構造、トリアジン構造を表す。D1は、光反応性基を表す。 An example of the fluorine-containing monomer is represented by the following general formula (A).
R f1 -R 2 -D 1 (A)
In the general formula (A), R f1 is a moiety containing at least one selected from the group consisting of a fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group. Represents. R 2 represents an alkanediyl group, an alkanetriyl group, or an ester structure, urethane structure, ether structure, or triazine structure derived therefrom. D 1 represents a photoreactive group.
Rf1-R2-D1 (A)
上記一般式(A)中、Rf1は、フルオロアルキル基、フルオロオキシアルキル基、フルオロアルケニル基、フルオロアルカンジイル基、及び、フルオロオキシアルカンジイル基からなる群より選択される少なくとも1つを含む部位を表す。R2は、アルカンジイル基、アルカントリイル基、又は、それらから導出されるエステル構造、ウレタン構造、エーテル構造、トリアジン構造を表す。D1は、光反応性基を表す。 An example of the fluorine-containing monomer is represented by the following general formula (A).
R f1 -R 2 -D 1 (A)
In the general formula (A), R f1 is a moiety containing at least one selected from the group consisting of a fluoroalkyl group, a fluorooxyalkyl group, a fluoroalkenyl group, a fluoroalkanediyl group, and a fluorooxyalkanediyl group. Represents. R 2 represents an alkanediyl group, an alkanetriyl group, or an ester structure, urethane structure, ether structure, or triazine structure derived therefrom. D 1 represents a photoreactive group.
上記一般式(A)で表されるフッ素含有モノマーとしては、例えば、2,2,2-トリフルオロエチルアクリレート、2,2,3,3,3-ペンタフロオロプロピルアクリレート、2-パーフルオロブチルエチルアクリレート、3-パーフルオロブチル-2-ヒドロキシプロピルアクリレート、2-パーフルオロヘキシルエチルアクリレート、3-パーフルオロヘキシル-2-ヒドロキシプロピルアクリレート、2-パーフルオロオクチルエチルアクリレート、3-パーフルオロオクチル-2-ヒドロキシプロピルアクリレート、2-パーフルオロデシルエチルアクリレート、2-パーフルオロ-3-メチルブチルエチルアクリレート、3-パーフルオロ-3-メトキシブチル-2-ヒドロキシプロピルアクリレート、2-パーフルオロ-5-メチルヘキシルエチルアクリレート、3-パーフルオロ-5-メチルヘキシル-2-ヒドロキシプロピルアクリレート、2-パーフルオロ-7-メチルオクチル-2-ヒドロキシプロピルアクリレート、テトラフルオロプロピルアクリレート、オクタフルオロペンチルアクリレート、ドデカフルオロヘプチルアクリレート、ヘキサデカフルオロノニルアクリレート、ヘキサフルオロブチルアクリレート、2,2,2-トリフルオロエチルメタクリレート、2,2,3,3,3-ペンタフルオロプロピルメタクリレート、2-パーフルオロブチルエチルメタクリレート、3-パーフルオロブチル-2-ヒドロキシプロピルメタクリレート、2-パーフルオロオクチルエチルメタクリレート、3-パーフルオロオクチル-2-ヒドロキシプロピルメタクリレート、2-パーフルオロデシルエチルメタクリレート、2-パーフルオロ-3-メチルブチルエチルメタクリレート、3-パーフルオロ-3-メチルブチル-2-ヒドロキシプロピルメタクリレート、2-パーフルオロ-5-メチルヘキシルエチルメタクリレート、3-パーフルオロ-5-メチルヘキシル-2-ヒドロキシプロピルメタクリレート、2-パーフルオロ-7-メチルオクチルエチルメタクリレート、3-パーフルオロ-7-メチルオクチルエチルメタクリレート、テトラフルオロプロピルメタクリレート、オクタフルオロペンチルメタクリレート、ドデカフルオロヘプチルメタクリレート、ヘキサデカフルオロノニルメタクリレート、1-トリフルオロメチルトリフルオロエチルメタクリレート、ヘキサフルオロブチルメタクリレート、トリアクリロイル-ヘプタデカフルオロノネニル-ペンタエリスリトール等が挙げられる。
Examples of the fluorine-containing monomer represented by the general formula (A) include 2,2,2-trifluoroethyl acrylate, 2,2,3,3,3-pentafluoropropyl acrylate, and 2-perfluorobutyl. Ethyl acrylate, 3-perfluorobutyl-2-hydroxypropyl acrylate, 2-perfluorohexylethyl acrylate, 3-perfluorohexyl-2-hydroxypropyl acrylate, 2-perfluorooctylethyl acrylate, 3-perfluorooctyl-2 -Hydroxypropyl acrylate, 2-perfluorodecylethyl acrylate, 2-perfluoro-3-methylbutylethyl acrylate, 3-perfluoro-3-methoxybutyl-2-hydroxypropyl acrylate, 2-perfluoro-5 Methylhexylethyl acrylate, 3-perfluoro-5-methylhexyl-2-hydroxypropyl acrylate, 2-perfluoro-7-methyloctyl-2-hydroxypropyl acrylate, tetrafluoropropyl acrylate, octafluoropentyl acrylate, dodecafluoroheptyl Acrylate, hexadecafluorononyl acrylate, hexafluorobutyl acrylate, 2,2,2-trifluoroethyl methacrylate, 2,2,3,3,3-pentafluoropropyl methacrylate, 2-perfluorobutylethyl methacrylate, 3-par Fluorobutyl-2-hydroxypropyl methacrylate, 2-perfluorooctylethyl methacrylate, 3-perfluorooctyl-2-hydroxypropy Methacrylate, 2-perfluorodecylethyl methacrylate, 2-perfluoro-3-methylbutylethyl methacrylate, 3-perfluoro-3-methylbutyl-2-hydroxypropyl methacrylate, 2-perfluoro-5-methylhexylethyl methacrylate, 3 -Perfluoro-5-methylhexyl-2-hydroxypropyl methacrylate, 2-perfluoro-7-methyloctylethyl methacrylate, 3-perfluoro-7-methyloctylethyl methacrylate, tetrafluoropropyl methacrylate, octafluoropentyl methacrylate, dodeca Fluoroheptyl methacrylate, hexadecafluorononyl methacrylate, 1-trifluoromethyl trifluoroethyl methacrylate, hexafluorobut Examples include til methacrylate, triacryloyl-heptadecafluorononenyl-pentaerythritol, and the like.
フッ素含有モノマーの好ましい材料としては、例えば、フルオロポリエーテル部位を有する材料が挙げられる。フルオロポリエーテル部位は、フルオロアルキル基、オキシフルオロアルキル基、オキシフルオロアルキルジイル基等からなる部位であり、下記一般式(B)又は(C)に代表される構造である。
CFn1H(3-n1)-(CFn2H(2-n2))kO-(CFn3H(2-n3))mO- (B)
-(CFn4H(2-n4))pO-(CFn5H(2-n5))sO- (C)
上記一般式(B)及び(C)中、n1は1~3の整数であり、n2~n5は1又は2であり、k、m、p、及び、sは0以上の整数である。n1~n5の好ましい組み合わせとしては、n1が2又は3、n2~n5が1又は2である組み合わせであり、より好ましい組み合わせとしては、n1が3、n2及びn4が2、n3及びn5が1又は2である組み合わせである。 As a preferable material of the fluorine-containing monomer, for example, a material having a fluoropolyether moiety can be mentioned. The fluoropolyether moiety is a moiety composed of a fluoroalkyl group, an oxyfluoroalkyl group, an oxyfluoroalkyldiyl group, etc., and has a structure represented by the following general formula (B) or (C).
CF n1 H (3-n1) -(CF n2 H (2-n2) ) k O- (CF n3 H (2-n3) ) m O- (B)
-(CF n4 H (2-n4) ) p O- (CF n5 H (2-n5) ) s O- (C)
In the above general formulas (B) and (C), n1 is an integer of 1 to 3, n2 to n5 are 1 or 2, and k, m, p, and s are integers of 0 or more. A preferable combination of n1 to n5 is a combination in which n1 is 2 or 3, and n2 to n5 is 1 or 2, and a more preferable combination is n1 is 3, n2 and n4 are 2, and n3 and n5 are 1 or 2. 2 is a combination.
CFn1H(3-n1)-(CFn2H(2-n2))kO-(CFn3H(2-n3))mO- (B)
-(CFn4H(2-n4))pO-(CFn5H(2-n5))sO- (C)
上記一般式(B)及び(C)中、n1は1~3の整数であり、n2~n5は1又は2であり、k、m、p、及び、sは0以上の整数である。n1~n5の好ましい組み合わせとしては、n1が2又は3、n2~n5が1又は2である組み合わせであり、より好ましい組み合わせとしては、n1が3、n2及びn4が2、n3及びn5が1又は2である組み合わせである。 As a preferable material of the fluorine-containing monomer, for example, a material having a fluoropolyether moiety can be mentioned. The fluoropolyether moiety is a moiety composed of a fluoroalkyl group, an oxyfluoroalkyl group, an oxyfluoroalkyldiyl group, etc., and has a structure represented by the following general formula (B) or (C).
CF n1 H (3-n1) -(CF n2 H (2-n2) ) k O- (CF n3 H (2-n3) ) m O- (B)
-(CF n4 H (2-n4) ) p O- (CF n5 H (2-n5) ) s O- (C)
In the above general formulas (B) and (C), n1 is an integer of 1 to 3, n2 to n5 are 1 or 2, and k, m, p, and s are integers of 0 or more. A preferable combination of n1 to n5 is a combination in which n1 is 2 or 3, and n2 to n5 is 1 or 2, and a more preferable combination is n1 is 3, n2 and n4 are 2, and n3 and n5 are 1 or 2. 2 is a combination.
フルオロポリエーテル部位に含まれる炭素数は、4以上、12以下であることが好ましく、4以上、10以下であることがより好ましく、6以上、8以下であることが更に好ましい。炭素数が4未満である場合、表面自由エネルギーが低下する懸念がある。炭素数が12よりも多い場合、溶剤への溶解性が低下する懸念がある。なお、フッ素含有モノマーは、1分子当たりに複数のフルオロポリエーテル部位を有していてもよい。
The number of carbon atoms contained in the fluoropolyether moiety is preferably 4 or more and 12 or less, more preferably 4 or more and 10 or less, and still more preferably 6 or more and 8 or less. When the number of carbon atoms is less than 4, there is a concern that the surface free energy decreases. When the number of carbon atoms is more than 12, there is a concern that the solubility in a solvent is lowered. In addition, the fluorine-containing monomer may have a plurality of fluoropolyether sites per molecule.
フッ素含有モノマーのうち公知のものとしては、ダイキン工業社製の「オプツール(登録商標)DAC-HP」、ユニマテック社製の「CHEMINOX(登録商標) FAAC-6」、旭硝子社製の「Afluid」、DIC社製の「メガファック(登録商標)RS-76-NS」、DIC社製の「メガファックRS-75」、油脂製品社製の「C10GACRY」、油脂製品社製の「C8HGOL」等が挙げられる。フッ素含有モノマーは、紫外線によって硬化(重合)するものであることが好ましい。フッ素含有モノマーは、-OCF2-鎖及び=NCO-鎖のうちの少なくとも一方を含有することが好ましい。離型剤は、フッ素含有モノマーを1種類含有していてもよく、複数種類含有していてもよい。
Known fluorine-containing monomers include “OPTOOL (registered trademark) DAC-HP” manufactured by Daikin Industries, Ltd., “CHEMINOX (registered trademark) FAAC-6” manufactured by Unimatec, “Afluid” manufactured by Asahi Glass Co., Ltd., DIC's "MegaFac (registered trademark) RS-76-NS", DIC's "MegaFac RS-75", Yushi Fats Company's "C10GACRY", Yushi Yushi Products'"C8HGOL", etc. It is done. The fluorine-containing monomer is preferably one that is cured (polymerized) by ultraviolet rays. The fluorine-containing monomer preferably contains at least one of a —OCF 2 — chain and a ═NCO— chain. The mold release agent may contain one type of fluorine-containing monomer or may contain a plurality of types.
フッ素樹脂は、フッ素含有モノマーに加えて、フッ素系界面活性剤、反応性モノマー等を適宜含有していてもよい。
In addition to the fluorine-containing monomer, the fluororesin may appropriately contain a fluorine-based surfactant, a reactive monomer, and the like.
フッ素系界面活性剤のうち公知のものとしては、例えば、AGCセイミケミカル社製の「サーフロン(登録商標)」、ネオス社製の「フタージェント(登録商標)650A」、スリーエム社製の「FC-4430」、スリーエム社製の「FC-4432」、三菱マテリアル電子化成社製の「エフトップ」等が挙げられる。フッ素系界面活性剤は、紫外線によって硬化(重合)するものであることが好ましい。フッ素系界面活性剤は、-OCF2-鎖及び=NCO-鎖のうちの少なくとも一方を含有することが好ましい。離型剤は、フッ素系界面活性剤を1種類含有していてもよく、複数種類含有していてもよい。
Known fluorine-based surfactants include, for example, “Surflon (registered trademark)” manufactured by AGC Seimi Chemical Co., “Futgent (registered trademark) 650A” manufactured by Neos, and “FC-” manufactured by 3M. 4430 "," FC-4432 "manufactured by 3M Corporation," F Top "manufactured by Mitsubishi Materials Electronics Chemical Co., Ltd., and the like. The fluorine-based surfactant is preferably one that is cured (polymerized) by ultraviolet rays. The fluorosurfactant preferably contains at least one of a —OCF 2 — chain and a ═NCO— chain. The mold release agent may contain one type of fluorosurfactant or a plurality of types.
反応性モノマーとしては、例えば、N-アクリロイルモルホリン、N-(2-ヒドロキシエチル)アクリルアミド、N,N-ジエチルアクリルアミド等のアミド基含有モノマー;1,4-シクロヘキサンジメタノールモノアクリレート、4-ヒドロキシブチルアクリレート等の水酸基含有モノマー;2-アセトアセトキシエチルメタクリレート等のアセトアセトキシ基含有モノマー、等が挙げられる。N-アクリロイルモルホリンのうち公知のものとしては、例えば、KJケミカルズ社製の「ACMO(登録商標)」等が挙げられる。N-(2-ヒドロキシエチル)アクリルアミドのうち公知のものとしては、例えば、KJケミカルズ社製の「HEAA(登録商標)」等が挙げられる。N,N-ジエチルアクリルアミドのうち公知のものとしては、例えば、KJケミカルズ社製の「DEAA(登録商標)」等が挙げられる。1,4-シクロヘキサンジメタノールモノアクリレートのうち公知のものとしては、例えば、日本化成社製の「CHDMMA」等が挙げられる。4-ヒドロキシブチルアクリレートのうち公知のものとしては、例えば、日本化成社製の「4HBA」等が挙げられる。2-アセトアセトキシエチルメタクリレートのうち公知のものとしては、例えば、日本合成化学社製の「AAEM」等が挙げられる。離型剤は、これらの反応性モノマーを1種類含有していてもよく、複数種類含有していてもよい。これらの反応性モノマーは、酸アミド結合を分子内に含有することが好ましい。
Examples of the reactive monomer include amide group-containing monomers such as N-acryloylmorpholine, N- (2-hydroxyethyl) acrylamide, N, N-diethylacrylamide; 1,4-cyclohexanedimethanol monoacrylate, 4-hydroxybutyl Examples thereof include hydroxyl group-containing monomers such as acrylate; acetoacetoxy group-containing monomers such as 2-acetoacetoxyethyl methacrylate. Known examples of N-acryloylmorpholine include “ACMO (registered trademark)” manufactured by KJ Chemicals. Known examples of N- (2-hydroxyethyl) acrylamide include “HEAA (registered trademark)” manufactured by KJ Chemicals. Known examples of N, N-diethylacrylamide include “DEAA (registered trademark)” manufactured by KJ Chemicals. Known examples of 1,4-cyclohexanedimethanol monoacrylate include “CHDMMA” manufactured by Nippon Kasei Co., Ltd. Known examples of 4-hydroxybutyl acrylate include “4HBA” manufactured by Nippon Kasei Co., Ltd. Known examples of 2-acetoacetoxyethyl methacrylate include “AAEM” manufactured by Nippon Synthetic Chemical Co., Ltd. The mold release agent may contain one kind of these reactive monomers or may contain a plurality of kinds. These reactive monomers preferably contain an acid amide bond in the molecule.
離型剤としては、上述したフッ素系離型剤(フッ素樹脂)以外に、例えば、シリコン系離型剤、リン酸エステル系離型剤等が挙げられる。
As a mold release agent, a silicon type mold release agent, a phosphate ester type mold release agent, etc. other than the fluorine-type mold release agent (fluororesin) mentioned above are mentioned, for example.
シリコン系離型剤としては、例えば、シリコンジアクリレート等が挙げられ、そのうち公知のものとしては、例えば、ダイセル・オルネクス社製の「EBECRYL(登録商標)350」等が挙げられる。
Examples of the silicon-based mold release agent include silicon diacrylate and the like, among which known examples include “EBECRYL (registered trademark) 350” manufactured by Daicel Ornex Co., Ltd.
リン酸エステル系離型剤としては、例えば、(ポリ)オキシエチレンアルキルリン酸エステル等が挙げられ、そのうち公知のものとしては、例えば、日光ケミカルズ社製の「NIKKOL(登録商標) TDP-2」等が挙げられる。
Examples of the phosphoric acid ester release agent include (poly) oxyethylene alkyl phosphate esters. Among them, known ones include, for example, “NIKKOL (registered trademark) TDP-2” manufactured by Nikko Chemicals. Etc.
樹脂層4中の離型剤の有効成分の含有率は、0.1重量%以上、10重量%以下であることが好ましく、0.5重量%以上、9重量%以下であることがより好ましく、1重量%以上、5重量%以下であることが更に好ましい。樹脂層4中の離型剤の有効成分の含有率が0.1重量%未満である場合、重合体層6の表面(基材2とは反対側の表面)における離型剤の有効成分の量が少なくなり過ぎてしまい、防汚性及び耐擦性が低下する懸念がある。樹脂層4中の離型剤の有効成分の含有率が10重量%よりも高い場合、重合体層6の表面(基材2とは反対側の表面)における離型剤の有効成分の量が多くなり過ぎてしまうため、重合体層6(凸部7)の弾性が不足し、重合体層6の表面(基材2とは反対側の表面)を擦ると、倒れた凸部7が起き上がらない(復元しない)懸念がある。その結果、耐擦性が低下する懸念がある。
The content of the active ingredient of the release agent in the resin layer 4 is preferably 0.1 wt% or more and 10 wt% or less, more preferably 0.5 wt% or more and 9 wt% or less. More preferably, it is 1 to 5% by weight. When the content of the active ingredient of the release agent in the resin layer 4 is less than 0.1% by weight, the active ingredient of the release agent on the surface of the polymer layer 6 (the surface opposite to the substrate 2) There is a concern that the amount becomes too small and the antifouling property and abrasion resistance are lowered. When the content rate of the active ingredient of the release agent in the resin layer 4 is higher than 10% by weight, the amount of the active ingredient of the release agent on the surface of the polymer layer 6 (surface opposite to the substrate 2) is Since the polymer layer 6 (convex part 7) is insufficiently elastic because it increases too much, when the surface of the polymer layer 6 (surface opposite to the substrate 2) is rubbed, the collapsed convex part 7 rises. There is no concern (does not restore). As a result, there is a concern that the abrasion resistance is lowered.
光硬化性樹脂は、離型剤と混合させた場合の濁度が5度(カオリン)以上、25度(カオリン)以下であれば、各種モノマー、光重合開始剤等を適宜含有していてもよい。
The photocurable resin may contain various monomers, photopolymerization initiators and the like as long as the turbidity when mixed with a release agent is 5 degrees (kaolin) or more and 25 degrees (kaolin) or less. Good.
各種モノマーとしては、例えば、ウレタンアクリレート、エトキシ化ポリグリセリンポリアクリレート、エトキシ化ペンタエリスリトールテトラアクリレート等が挙げられる。ウレタンアクリレートのうち公知のものとしては、例えば、新中村化学工業社製の「U-10HA」等が挙げられる。エトキシ化ポリグリセリンポリアクリレートのうち公知のものとしては、例えば、新中村化学工業社製の「NK ECONOMER(登録商標) A-PG5027E」等が挙げられる。エトキシ化ペンタエリスリトールテトラアクリレートのうち公知のものとしては、例えば、新中村化学工業社製の「ATM-35E」等が挙げられる。光硬化性樹脂は、これらの各種モノマーを1種類含有していてもよく、複数種類含有していてもよい。
Examples of the various monomers include urethane acrylate, ethoxylated polyglycerin polyacrylate, ethoxylated pentaerythritol tetraacrylate, and the like. Known examples of urethane acrylate include “U-10HA” manufactured by Shin-Nakamura Chemical Co., Ltd. Examples of known ethoxylated polyglycerin polyacrylates include “NK ECONOMER (registered trademark) A-PG5027E” manufactured by Shin-Nakamura Chemical Co., Ltd. Known examples of ethoxylated pentaerythritol tetraacrylate include “ATM-35E” manufactured by Shin-Nakamura Chemical Co., Ltd. The photocurable resin may contain one kind of these various monomers or may contain a plurality of kinds.
光重合開始剤は、光(活性エネルギー線)に対して活性であり、モノマーを重合する重合反応を開始させるために添加されるものである。光重合開始剤としては、例えば、ラジカル重合開始剤、アニオン重合開始剤、カチオン重合開始剤等を用いることができる。このような光重合開始剤としては、例えば、p-tert-ブチルトリクロロアセトフェノン、2,2’-ジエトキシアセトフェノン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン等のアセトフェノン類;ベンゾフェノン、4,4’-ビスジメチルアミノベンゾフェノン、2-クロロチオキサントン、2-メチルチオキサントン、2-エチルチオキサントン、2-イソプロピルチオキサントン等のケトン類;ベンゾイン、ベンゾインメチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル等のベンゾインエーテル類;ベンジルジメチルケタール、ヒドロキシシクロヘキシルフェニルケトン等のベンジルケタール類;2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド、ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド等のアシルフォスフィンオキサイド類;1-ヒドロキシ-シクロヘキシル-フェニル-ケトン等のアルキルフェノン類、等が挙げられる。2,4,6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイドのうち公知のものとしては、例えば、BASF社製の「IRGACURE(登録商標) TPO」等が挙げられる。ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイドのうち公知のものとしては、例えば、BASF社製の「IRGACURE 819」等が挙げられる。1-ヒドロキシ-シクロヘキシル-フェニル-ケトンのうち公知のものとしては、例えば、BASF社製の「IRGACURE 184」等が挙げられる。光硬化性樹脂は、光重合開始剤を1種類含有していてもよく、複数種類含有していてもよい。
The photopolymerization initiator is active with respect to light (active energy rays) and is added to start a polymerization reaction for polymerizing the monomer. As the photopolymerization initiator, for example, a radical polymerization initiator, an anionic polymerization initiator, a cationic polymerization initiator and the like can be used. Examples of such photopolymerization initiators include acetophenones such as p-tert-butyltrichloroacetophenone, 2,2′-diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one; Ketones such as benzophenone, 4,4′-bisdimethylaminobenzophenone, 2-chlorothioxanthone, 2-methylthioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone; benzoin, benzoin methyl ether, benzoin isopropyl ether, benzoin isobutyl ether, etc. Benzoin ethers; benzyl ketals such as benzyl dimethyl ketal and hydroxycyclohexyl phenyl ketone; 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide; Scan (2,4,6-trimethylbenzoyl) - acylphosphine oxides such as triphenylphosphine oxide; 1-hydroxy - cyclohexyl - phenyl - phenones such as ketones, and the like. Known examples of 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide include, for example, “IRGACURE (registered trademark) TPO” manufactured by BASF. Known examples of bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide include “IRGACURE 819” manufactured by BASF. Known examples of 1-hydroxy-cyclohexyl-phenyl-ketone include “IRGACURE 184” manufactured by BASF. The photocurable resin may contain one type of photopolymerization initiator or a plurality of types.
光硬化性樹脂は、離型剤と相溶する相溶性モノマーを含有することが好ましい。このような構成によれば、重合体層6の表面(基材2とは反対側の表面)において、離型剤の有効成分が均一に分布するため、防汚性が高まる。更に、相溶性モノマーによれば、光硬化性樹脂と離型剤との密着性が高まるため、耐擦性が高まる。光硬化性樹脂が相溶性モノマーを含有する場合、相溶性モノマー単体は離型剤と相溶するが、光硬化性樹脂全体としては、離型剤と相溶しない。
The photocurable resin preferably contains a compatible monomer that is compatible with the release agent. According to such a structure, since the active ingredient of a mold release agent is uniformly distributed on the surface of the polymer layer 6 (the surface opposite to the substrate 2), the antifouling property is improved. Furthermore, according to the compatible monomer, the adhesiveness between the photocurable resin and the release agent is increased, so that the abrasion resistance is increased. When the photocurable resin contains a compatible monomer, the compatible monomer alone is compatible with the release agent, but the photocurable resin as a whole is not compatible with the release agent.
相溶性モノマーとしては、例えば、N-アクリロイルモルホリン(例えば、KJケミカルズ社製の「ACMO」)、N,N-ジエチルアクリルアミド(例えば、KJケミカルズ社製の「DEAA(登録商標)」)、N,N-ジメチルアクリルアミド(例えば、KJケミカルズ社製の「DMAA(登録商標)」)、テトラヒドロフランアクリレート(例えば、大阪有機化学工業社製の「ビスコート#150」)、環状トリメチロールプロパンホルマールアクリレート(例えば、大阪有機化学工業社製の「ビスコート#200」)、4-ヒドロキシブチルアクリレート(例えば、日本化成社製の「4HBA」)等が挙げられる。相溶性モノマーとしては、アミド基、エーテル基、水酸基等の極性基を有する単官能モノマーが好ましい。光硬化性樹脂は、相溶性モノマーを1種類含有していてもよく、複数種類含有していてもよい。
Examples of the compatible monomer include N-acryloylmorpholine (for example, “ACMO” manufactured by KJ Chemicals), N, N-diethylacrylamide (for example, “DEAA (registered trademark)” manufactured by KJ Chemicals), N, N-dimethylacrylamide (for example, “DMAA (registered trademark)” manufactured by KJ Chemicals), tetrahydrofuran acrylate (for example, “Biscoat # 150” manufactured by Osaka Organic Chemical Industries, Ltd.), cyclic trimethylolpropane formal acrylate (for example, Osaka “Biscoat # 200” manufactured by Organic Chemical Industries, Ltd.), 4-hydroxybutyl acrylate (for example, “4HBA” manufactured by Nippon Kasei Co., Ltd.), and the like. The compatible monomer is preferably a monofunctional monomer having a polar group such as an amide group, an ether group or a hydroxyl group. The photocurable resin may contain one type of compatible monomer or a plurality of types.
光硬化性樹脂中の相溶性モノマーの含有率は、5重量%以上、30重量%以下であることが好ましく、10重量%以上、25重量%以下であることがより好ましく、15重量%以上、25重量%以下であることが更に好ましい。光硬化性樹脂中の相溶性モノマーの含有率が5重量%未満である場合、特に、高温/高湿の環境下における防汚性及び耐擦性が低下する懸念がある。光硬化性樹脂中の相溶性モノマーの含有率が30重量%よりも高い場合、重合体層6の架橋密度が低下するとともに、結合間の凝集力が強くなるため、重合体層6の硬度が高くなり、特に、高温/高湿の環境下における耐擦性が低下する懸念がある。
The content of the compatible monomer in the photocurable resin is preferably 5% by weight or more and 30% by weight or less, more preferably 10% by weight or more and 25% by weight or less, 15% by weight or more, More preferably, it is 25% by weight or less. When the content of the compatible monomer in the photocurable resin is less than 5% by weight, there is a concern that the antifouling property and the abrasion resistance are deteriorated particularly in a high temperature / high humidity environment. When the content of the compatible monomer in the photocurable resin is higher than 30% by weight, the crosslink density of the polymer layer 6 is decreased and the cohesive force between the bonds is increased. Therefore, the hardness of the polymer layer 6 is increased. In particular, there is a concern that the rubbing resistance in a high temperature / high humidity environment is lowered.
溶剤としては、光硬化性樹脂及び離型剤を溶解させるものであればよく、例えば、アルコール(炭素数1~10:例えば、メタノール、エタノール、n-又はi-プロパノール、n-、sec-、又は、t-ブタノール、ベンジルアルコール、オクタノール等)、ケトン(炭素数3~8:例えば、アセトン、メチルエチルケトン(MEK)、メチルイソブチルケトン、ジイソブチルケトン、ジブチルケトン、シクロヘキサノン等)、エステル又はエーテルエステル(炭素数4~10:例えば、酢酸エチル、酢酸ブチル、乳酸エチル等)、γ-ブチロラクトン、エチレングリコールモノメチルアセテート、プロピレングリコールモノメチルアセテート、エーテル(炭素数4~10:例えば、EGモノメチルエーテル(メチルセロソロブ)、EGモノエチルエーテル(エチルセロソロブ)、ジエチレングリコールモノブチルエーテル(ブチルセロソロブ)、プロピレングリコールモノメチルエーテル等)、芳香族炭化水素(炭素数6~10:例えば、ベンゼン、トルエン、キシレン等)、アミド(炭素数3~10:例えば、ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等)、ハロゲン化炭化水素(炭素数1~2:例えば、メチレンジクロライド、エチレンジクロライド等)、石油系溶剤(例えば、石油エーテル、石油ナフサ等)等が挙げられる。樹脂溶液は、溶剤を1種類含有していてもよく、複数種類含有していてもよい。
Any solvent may be used as long as it dissolves the photocurable resin and the release agent. For example, alcohol (carbon number: 1 to 10: for example, methanol, ethanol, n- or i-propanol, n-, sec-, Or t-butanol, benzyl alcohol, octanol, etc.), ketone (3 to 8 carbon atoms: for example, acetone, methyl ethyl ketone (MEK), methyl isobutyl ketone, diisobutyl ketone, dibutyl ketone, cyclohexanone, etc.), ester or ether ester (carbon) Number 4 to 10: For example, ethyl acetate, butyl acetate, ethyl lactate, etc., γ-butyrolactone, ethylene glycol monomethyl acetate, propylene glycol monomethyl acetate, ether (carbon number 4 to 10: for example, EG monomethyl ether (methyl cellosorb), EG Noethyl ether (ethyl cellosorb), diethylene glycol monobutyl ether (butyl cellosorb), propylene glycol monomethyl ether, etc.), aromatic hydrocarbons (carbon number 6-10: for example, benzene, toluene, xylene, etc.), amides (carbon number 3-10: For example, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, etc.), halogenated hydrocarbon (C1-2: for example, methylene dichloride, ethylene dichloride, etc.), petroleum solvent (for example, petroleum ether, petroleum naphtha, etc.), etc. Is mentioned. The resin solution may contain one type of solvent or a plurality of types.
重合体層6の厚みTは、離型剤の有効成分を重合体層6の表面(基材2とは反対側の表面)に高濃度で配向させる観点から、薄いことが好ましい。具体的には、重合体層6の厚みTは、5.0μm以上、20.0μm以下であることが好ましい。重合体層6の厚みTは、図1(e)に示すように、基材2側の表面から凸部7の頂点までの距離を指す。
The thickness T of the polymer layer 6 is preferably thin from the viewpoint of orienting the active ingredient of the release agent at a high concentration on the surface of the polymer layer 6 (the surface opposite to the substrate 2). Specifically, the thickness T of the polymer layer 6 is preferably 5.0 μm or more and 20.0 μm or less. The thickness T of the polymer layer 6 indicates the distance from the surface on the base 2 side to the apex of the convex portion 7 as shown in FIG.
凸部7の形状としては、例えば、柱状の下部と半球状の上部とによって構成される形状(釣鐘状)、錐体状(コーン状、円錐状)等の、先端に向かって細くなる形状(テーパー形状)が挙げられる。また、凸部7は、枝突起を有する形状であってもよい。枝突起とは、金型を作製するための陽極酸化及びエッチングを行う過程で形成されてしまった、間隔が不規則な部分に対応する凸部を示す。図1(e)中、隣接する凸部7の間隙の底辺は傾斜した形状となっているが、傾斜せずに水平な形状であってもよい。
As a shape of the convex part 7, for example, a shape (bell shape) constituted by a columnar lower portion and a hemispherical upper portion, a cone shape (cone shape, conical shape), or the like that narrows toward the tip ( Taper shape). Further, the convex portion 7 may have a shape having a branch protrusion. The branch protrusion indicates a convex portion corresponding to a portion having irregular intervals, which has been formed in the process of anodizing and etching for producing a mold. In FIG. 1 (e), the bottom of the gap between adjacent convex portions 7 has an inclined shape, but it may have a horizontal shape without being inclined.
隣接する凸部7間のピッチPは、可視光の波長(780nm)以下であれば特に限定されないが、モアレ、虹ムラ等の光学現象の発生を充分に防止する観点からは、100nm以上、400nm以下であることが好ましく、100nm以上、200nm以下であることがより好ましい。
The pitch P between the adjacent convex portions 7 is not particularly limited as long as it is less than or equal to the wavelength of visible light (780 nm). However, from the viewpoint of sufficiently preventing the occurrence of optical phenomena such as moire and rainbow unevenness, it is 100 nm or more and 400 nm. Or less, more preferably 100 nm or more and 200 nm or less.
凸部7の高さは、後述する凸部7の好ましいアスペクト比と両立させる観点から、50nm以上、600nm以下であることが好ましく、100nm以上、300nm以下であることがより好ましい。
The height of the convex portion 7 is preferably 50 nm or more and 600 nm or less, and more preferably 100 nm or more and 300 nm or less, from the viewpoint of making it compatible with a preferable aspect ratio of the convex portion 7 described later.
凸部7のアスペクト比は、0.8以上、1.5以下であることが好ましい。凸部7のアスペクト比が0.8未満である場合、モアレ、虹ムラ等の光学現象の発生を充分に防止することができず、良好な反射特性が得られない懸念がある。凸部7のアスペクト比が1.5よりも大きい場合、モスアイ構造の加工性が低下し、スティッキングが発生したり、モスアイ構造を形成する際の転写具合が悪化したりする(金型5が詰まったり、巻き付いてしまう、等)懸念がある。本明細書中、凸部のアスペクト比は、隣接する凸部間のピッチと凸部の高さとの比(高さ/ピッチ)を指す。
The aspect ratio of the convex portion 7 is preferably 0.8 or more and 1.5 or less. When the aspect ratio of the convex portion 7 is less than 0.8, the occurrence of optical phenomena such as moire and rainbow unevenness cannot be sufficiently prevented, and there is a concern that good reflection characteristics cannot be obtained. When the aspect ratio of the convex portion 7 is larger than 1.5, the processability of the moth-eye structure is reduced, sticking occurs, or the transfer condition when forming the moth-eye structure is deteriorated (the mold 5 is clogged). There are concerns. In this specification, the aspect ratio of a convex part refers to the ratio (height / pitch) between the pitch between adjacent convex parts and the height of the convex part.
凸部7は、ランダムに配置されていても、規則的に配置されていてもよい。モアレの発生を充分に防止する観点からは、凸部7がランダムに配置されていることが好ましい。
The convex portions 7 may be arranged randomly or regularly. From the viewpoint of sufficiently preventing the occurrence of moiré, it is preferable that the convex portions 7 are randomly arranged.
光学部材1のヘイズは、1.0%未満である。光学部材1のヘイズが1.0%以上である場合、透明性が低下し、その結果、モスアイ構造による反射防止性(低反射性)が低下する。光学部材1のヘイズは、0.8%未満であることが好ましく、0.5%未満であることがより好ましい。実施形態1の光学部材の製造方法とは異なり、互いに相溶しない光硬化性樹脂及び離型剤を溶剤に溶解させず、白濁状態のまま硬化させると、光学部材1のヘイズが高くなり(例えば、1.0%以上)、透明性が損なわれてしまう。
The haze of the optical member 1 is less than 1.0%. When the haze of the optical member 1 is 1.0% or more, the transparency is lowered, and as a result, the antireflection property (low reflectivity) by the moth-eye structure is lowered. The haze of the optical member 1 is preferably less than 0.8%, and more preferably less than 0.5%. Unlike the method for producing the optical member of Embodiment 1, when the photocurable resin and the release agent that are incompatible with each other are not dissolved in a solvent and cured in a cloudy state, the haze of the optical member 1 increases (for example, 1.0% or more), transparency is impaired.
金型5としては、例えば、下記の方法で作製されるものを用いることができる。まず、金型5の材料となるアルミニウムを、支持基材の表面上にスパッタリング法によって成膜する。次に、成膜されたアルミニウムの層に対して、陽極酸化及びエッチングを交互に繰り返すことによって、モスアイ構造の雌型(金型5)を作製することができる。この際、陽極酸化を行う時間、及び、エッチングを行う時間を調整することによって、金型5の凹凸構造を変化させることができる。
As the mold 5, for example, one produced by the following method can be used. First, aluminum used as the material of the mold 5 is formed on the surface of the support base by sputtering. Next, a female mold (mold 5) having a moth-eye structure can be produced by alternately repeating anodic oxidation and etching on the formed aluminum layer. At this time, the concavo-convex structure of the mold 5 can be changed by adjusting the time for performing anodic oxidation and the time for performing etching.
支持基材の材料としては、例えば、ガラス;ステンレス、ニッケル等の金属材料;ポリプロピレン、ポリメチルペンテン、環状オレフィン系高分子(代表的には、ノルボルネン系樹脂等である、日本ゼオン社製の「ゼオノア(登録商標)」、JSR社製の「アートン(登録商標)」)等のポリオレフィン系樹脂;ポリカーボネート樹脂;ポリエチレンテレフタレート、ポリエチレンナフタレート、トリアセチルセルロース等の樹脂材料、等が挙げられる。また、支持基材の表面上にアルミニウムを成膜したものの代わりに、アルミニウム製の基材を用いてもよい。
Examples of the material for the supporting substrate include glass; metal materials such as stainless steel and nickel; polypropylene, polymethylpentene, and cyclic olefin polymers (typically, norbornene resins, etc., manufactured by Nippon Zeon Co., Ltd.). Polyolefin resins such as “ZEONOR (registered trademark)” and “ARTON (registered trademark)” manufactured by JSR); polycarbonate resins; resin materials such as polyethylene terephthalate, polyethylene naphthalate, and triacetyl cellulose. Moreover, you may use the base material made from aluminum instead of what formed the aluminum film on the surface of a support base material.
金型5の形状としては、例えば、平板状、ロール状等が挙げられる。
Examples of the shape of the mold 5 include a flat plate shape and a roll shape.
金型5の表面は、離型処理が施されていることが好ましい。これにより、金型5を重合体層6から容易に剥離することができる。また、金型5の表面自由エネルギーが低くなるため、上記プロセス(4)において、基材2を金型5に押し当てる際に、離型剤の有効成分を樹脂層4の表面(基材2とは反対側の表面)に効率良く配向させることができる。更に、樹脂層4を硬化させる前に、離型剤の有効成分が樹脂層4の表面(基材2とは反対側の表面)から離れてしまうことを防止することができる。その結果、光学部材1において、離型剤の有効成分を重合体層6の表面(基材2とは反対側の表面)に効率良く配向させることができる。
The surface of the mold 5 is preferably subjected to a mold release treatment. Thereby, the metal mold | die 5 can be easily peeled from the polymer layer 6. FIG. Further, since the surface free energy of the mold 5 becomes low, when the base material 2 is pressed against the mold 5 in the process (4), the active ingredient of the release agent is added to the surface of the resin layer 4 (base material 2). Can be efficiently oriented on the opposite surface). Furthermore, before the resin layer 4 is cured, it is possible to prevent the active ingredient of the release agent from separating from the surface of the resin layer 4 (the surface opposite to the substrate 2). As a result, in the optical member 1, the active component of the release agent can be efficiently oriented on the surface of the polymer layer 6 (the surface opposite to the substrate 2).
金型5の離型処理に用いられる塗布材料としては、例えば、フッ素系材料、シリコン系材料、リン酸エステル系材料等が挙げられる。フッ素系材料のうち公知のものとしては、例えば、ダイキン工業社製の「オプツールDSX」、ダイキン工業社製の「オプツールAES4」等が挙げられる。
Examples of the coating material used for the mold release treatment of the mold 5 include a fluorine-based material, a silicon-based material, and a phosphate ester-based material. Examples of known fluorine-based materials include “OPTOOL DSX” manufactured by Daikin Industries, Ltd., “OPTOOL AES4” manufactured by Daikin Industries, Ltd., and the like.
[実施形態2]
実施形態2の光学部材の製造方法は、本発明の第二の光学部材の製造方法に関する。実施形態2の光学部材の製造方法について、図2を参照して以下に説明する。図2は、実施形態2の光学部材の製造方法を説明するための断面模式図である。実施形態2の光学部材の製造方法は、光硬化性樹脂及び離型剤を2層に分けて塗布した後、両層を一体化させること以外、実施形態1の光学部材の製造方法と同様であるため、重複する点については説明を適宜省略する。 [Embodiment 2]
The manufacturing method of the optical member ofEmbodiment 2 is related with the manufacturing method of the 2nd optical member of this invention. The manufacturing method of the optical member of Embodiment 2 is demonstrated below with reference to FIG. FIG. 2 is a schematic cross-sectional view for explaining the method of manufacturing the optical member according to the second embodiment. The manufacturing method of the optical member of Embodiment 2 is the same as the manufacturing method of the optical member of Embodiment 1 except that the photocurable resin and the release agent are applied in two layers and then both layers are integrated. Therefore, description of overlapping points will be omitted as appropriate.
実施形態2の光学部材の製造方法は、本発明の第二の光学部材の製造方法に関する。実施形態2の光学部材の製造方法について、図2を参照して以下に説明する。図2は、実施形態2の光学部材の製造方法を説明するための断面模式図である。実施形態2の光学部材の製造方法は、光硬化性樹脂及び離型剤を2層に分けて塗布した後、両層を一体化させること以外、実施形態1の光学部材の製造方法と同様であるため、重複する点については説明を適宜省略する。 [Embodiment 2]
The manufacturing method of the optical member of
(プロセス(1):第一の樹脂及び第二の樹脂の塗布)
図2(a)に示すように、光硬化性樹脂を含有する第一の樹脂8を、基材2の表面上に塗布する。次に、離型剤を含有する第二の樹脂9を、塗布された第一の樹脂8の表面(基材2とは反対側の表面)上に塗布する。 (Process (1): Application of first resin and second resin)
As shown in FIG. 2A, afirst resin 8 containing a photocurable resin is applied on the surface of the substrate 2. Next, the 2nd resin 9 containing a mold release agent is apply | coated on the surface (surface on the opposite side to the base material 2) of the apply | coated 1st resin 8. FIG.
図2(a)に示すように、光硬化性樹脂を含有する第一の樹脂8を、基材2の表面上に塗布する。次に、離型剤を含有する第二の樹脂9を、塗布された第一の樹脂8の表面(基材2とは反対側の表面)上に塗布する。 (Process (1): Application of first resin and second resin)
As shown in FIG. 2A, a
第一の樹脂8、及び、第二の樹脂9の塗布方法としては、例えば、スプレー方式、グラビア方式、スロットダイ方式、バーコート方式等で塗布する方法が挙げられる。膜厚が容易に調製可能であり、かつ、装置コストを低減する観点からは、スプレー方式で塗布する方法が好ましい。中でも、スワールノズル、静電ノズル、又は、超音波ノズルを用いて塗布することが特に好ましい。
Examples of the coating method of the first resin 8 and the second resin 9 include a method of coating by a spray method, a gravure method, a slot die method, a bar coating method, or the like. From the viewpoint of easily adjusting the film thickness and reducing the cost of the apparatus, a method of applying by a spray method is preferable. Among these, application using a swirl nozzle, electrostatic nozzle, or ultrasonic nozzle is particularly preferable.
第一の樹脂8の塗布と第二の樹脂9の塗布とは、異なるタイミングで行われてもよく、同じタイミングで行われてもよい。第一の樹脂8、及び、第二の樹脂9を同じタイミングで塗布する方法としては、例えば、共押し出し方式で塗布する方法が挙げられる。
The application of the first resin 8 and the application of the second resin 9 may be performed at different timings or may be performed at the same timing. As a method of applying the first resin 8 and the second resin 9 at the same timing, for example, a method of applying by a coextrusion method can be mentioned.
(プロセス(2):樹脂層の形成)
図2(b)に示すように、第一の樹脂8、及び、第二の樹脂9を間に挟んだ状態で、基材2を金型5に第一の樹脂8側から押し当てる。その結果、凹凸構造を表面(基材2とは反対側の表面)に有する樹脂層4が形成される。樹脂層4は、第一の樹脂8、及び、第二の樹脂9が一体化し、両樹脂の界面が存在しないものである。 (Process (2): Formation of resin layer)
As shown in FIG. 2B, thesubstrate 2 is pressed against the mold 5 from the first resin 8 side with the first resin 8 and the second resin 9 sandwiched therebetween. As a result, the resin layer 4 having a concavo-convex structure on the surface (the surface opposite to the substrate 2) is formed. In the resin layer 4, the first resin 8 and the second resin 9 are integrated, and there is no interface between the two resins.
図2(b)に示すように、第一の樹脂8、及び、第二の樹脂9を間に挟んだ状態で、基材2を金型5に第一の樹脂8側から押し当てる。その結果、凹凸構造を表面(基材2とは反対側の表面)に有する樹脂層4が形成される。樹脂層4は、第一の樹脂8、及び、第二の樹脂9が一体化し、両樹脂の界面が存在しないものである。 (Process (2): Formation of resin layer)
As shown in FIG. 2B, the
(プロセス(3):樹脂層の硬化)
次に、樹脂層4を光照射によって硬化させる。その結果、図2(c)に示すように、重合体層6が形成される。 (Process (3): Curing of resin layer)
Next, theresin layer 4 is cured by light irradiation. As a result, a polymer layer 6 is formed as shown in FIG.
次に、樹脂層4を光照射によって硬化させる。その結果、図2(c)に示すように、重合体層6が形成される。 (Process (3): Curing of resin layer)
Next, the
(プロセス(4):金型の剥離)
図2(d)に示すように、金型5を重合体層6から剥離する。その結果、光学部材1が完成する。 (Process (4): Mold peeling)
As shown in FIG. 2 (d), themold 5 is peeled from the polymer layer 6. As a result, the optical member 1 is completed.
図2(d)に示すように、金型5を重合体層6から剥離する。その結果、光学部材1が完成する。 (Process (4): Mold peeling)
As shown in FIG. 2 (d), the
以上より、実施形態2の光学部材の製造方法によれば、互いに相溶しない第一の樹脂8、及び、第二の樹脂9を2層に分けて塗布した(上記プロセス(1))後、両層を一体化させる(上記プロセス(2))ことによって、第二の樹脂9中の離型剤が不溶化するため、離型剤の有効成分が樹脂層4の表面(基材2とは反対側の表面)に配向しやすくなる。また、樹脂層4の表面(基材2とは反対側の表面)を主に構成する第二の樹脂9に離型剤が含有されているため、離型剤の有効成分が樹脂層4の表面(基材2とは反対側の表面)に配向しやすくなる。よって、離型剤の有効成分の含有率を大きく高めなくても、離型剤の有効成分を重合体層6の表面(基材2とは反対側の表面)に効率良く配向させることができる。すなわち、実施形態2の光学部材の製造方法によれば、透明性を損なうことなく(ヘイズが高くなることなく)、防汚性及び耐擦性を高めることができる。更に、実施形態2の光学部材の製造方法によれば、離型剤が少量であっても防汚性及び耐擦性を高めることができるため、材料コストを低減することができる。
As mentioned above, according to the manufacturing method of the optical member of Embodiment 2, after applying the 1st resin 8 and the 2nd resin 9 which are mutually incompatible in 2 layers (the above-mentioned process (1)), By integrating both layers (the above process (2)), the release agent in the second resin 9 is insolubilized, so that the active ingredient of the release agent is the surface of the resin layer 4 (opposite of the base material 2). It becomes easy to orient to the surface on the side. Moreover, since the release agent is contained in the second resin 9 that mainly constitutes the surface of the resin layer 4 (surface opposite to the substrate 2), the active ingredient of the release agent is the resin layer 4. It becomes easy to orient on the surface (surface opposite to the base material 2). Therefore, the effective component of the release agent can be efficiently oriented on the surface of the polymer layer 6 (the surface opposite to the substrate 2) without greatly increasing the content of the active component of the release agent. . That is, according to the manufacturing method of the optical member of Embodiment 2, antifouling property and abrasion resistance can be improved without impairing transparency (without increasing haze). Furthermore, according to the manufacturing method of the optical member of Embodiment 2, since the antifouling property and the abrasion resistance can be improved even with a small amount of the release agent, the material cost can be reduced.
第一の樹脂8、及び、第二の樹脂9は、互いに混合させた場合に、15度(カオリン)以上、35度(カオリン)以下の濁度を示す組み合わせである。これは、第一の樹脂8と第二の樹脂9とが相溶しないことを示している。第一の樹脂8と第二の樹脂9とを混合させた場合の濁度が15度(カオリン)未満である場合、両樹脂を一体化させる(上記プロセス(2))際に、第二の樹脂9中の離型剤の有効成分が重合体層6の表面(基材2とは反対側の表面)に配向しにくくなるため、防汚性及び耐擦性が低下してしまう。第一の樹脂8と第二の樹脂9とを混合させた場合の濁度が35度(カオリン)よりも高い場合、第一の樹脂8中の光硬化性樹脂と第二の樹脂9中の離型剤とが分離しやすくなるため、特に、高温/高湿の環境下における防汚性(例えば、指紋拭き取り性)が低下してしまう。第一の樹脂8、及び、第二の樹脂9は、互いに混合させた場合に、20度(カオリン)以上、30度(カオリン)以下の濁度を示す組み合わせであることが好ましい。
The first resin 8 and the second resin 9 are combinations that exhibit turbidity of 15 degrees (kaolin) or more and 35 degrees (kaolin) or less when mixed with each other. This indicates that the first resin 8 and the second resin 9 are not compatible. When the turbidity when the first resin 8 and the second resin 9 are mixed is less than 15 degrees (kaolin), the second resin is integrated (the above process (2)). Since the active ingredient of the release agent in the resin 9 is difficult to be oriented on the surface of the polymer layer 6 (the surface opposite to the base material 2), the antifouling property and the abrasion resistance are lowered. When the turbidity when the first resin 8 and the second resin 9 are mixed is higher than 35 degrees (kaolin), the photocurable resin in the first resin 8 and the second resin 9 Since the release agent is easily separated, the antifouling property (for example, fingerprint wiping property) particularly in a high temperature / high humidity environment is deteriorated. The first resin 8 and the second resin 9 are preferably a combination that exhibits a turbidity of 20 degrees (kaolin) or more and 30 degrees (kaolin) or less when mixed with each other.
第二の樹脂9は、離型剤を含有する。第二の樹脂9中の離型剤は、実施形態1と同様に、光反応性基を有するフッ素樹脂、すなわち、フッ素系離型剤であることが好ましい。このような構成によれば、高温/高湿の環境下におけるブリードアウトが低減し、光学部材1の信頼性が高まる。また、フッ素樹脂は表面自由エネルギーが低いため、防汚性(例えば、指紋拭き取り性)を高めるために好ましく用いられる。第二の樹脂9は、離型剤に加えて、各種モノマーを適宜含有していてもよい。
The second resin 9 contains a release agent. As in Embodiment 1, the release agent in the second resin 9 is preferably a fluororesin having a photoreactive group, that is, a fluorine-based release agent. According to such a configuration, bleed out in a high temperature / high humidity environment is reduced, and the reliability of the optical member 1 is increased. Further, since the fluororesin has a low surface free energy, it is preferably used for improving the antifouling property (for example, fingerprint wiping property). The second resin 9 may appropriately contain various monomers in addition to the release agent.
樹脂層4中の離型剤の有効成分の含有率は、0.1重量%以上、10重量%以下であることが好ましく、0.5重量%以上、9重量%以下であることがより好ましく、1重量%以上、5重量%以下であることが更に好ましい。樹脂層4中の離型剤の有効成分の含有率が0.1重量%未満である場合、重合体層6(第二の樹脂9)の表面(基材2とは反対側の表面)における離型剤の有効成分の量が少なくなり過ぎてしまい、防汚性及び耐擦性が低下する懸念がある。樹脂層4中の離型剤の有効成分の含有率が10重量%よりも高い場合、重合体層6(第二の樹脂9)の表面(基材2とは反対側の表面)における離型剤の有効成分の量が多くなり過ぎてしまうため、重合体層6(凸部7)の弾性が不足し、重合体層6の表面(基材2とは反対側の表面)を擦ると、倒れた凸部7が起き上がらない(復元しない)懸念がある。その結果、耐擦性が低下する懸念がある。
The content of the active ingredient of the release agent in the resin layer 4 is preferably 0.1 wt% or more and 10 wt% or less, more preferably 0.5 wt% or more and 9 wt% or less. More preferably, it is 1 to 5% by weight. When the content of the active ingredient of the release agent in the resin layer 4 is less than 0.1% by weight, the surface of the polymer layer 6 (second resin 9) (the surface opposite to the base material 2) There is a concern that the amount of the active ingredient of the release agent becomes too small, and the antifouling property and abrasion resistance are lowered. When the content of the active ingredient of the release agent in the resin layer 4 is higher than 10% by weight, the release on the surface of the polymer layer 6 (second resin 9) (surface opposite to the substrate 2) Since the amount of the active ingredient of the agent becomes excessive, the elasticity of the polymer layer 6 (convex portion 7) is insufficient, and when the surface of the polymer layer 6 (the surface opposite to the substrate 2) is rubbed, There is a concern that the collapsed convex portion 7 will not rise (do not restore). As a result, there is a concern that the abrasion resistance is lowered.
第一の樹脂8は、光硬化性樹脂を含有する。第一の樹脂8中の光硬化性樹脂は、第一の樹脂8と第二の樹脂9とを混合させた場合の濁度が15度(カオリン)以上、35度(カオリン)以下であれば、実施形態1と同様に、各種モノマー、光重合開始剤等を適宜含有していてもよい。
The first resin 8 contains a photocurable resin. The photo-curing resin in the first resin 8 has a turbidity of 15 degrees (kaolin) or more and 35 degrees (kaolin) or less when the first resin 8 and the second resin 9 are mixed. Similarly to Embodiment 1, various monomers, photopolymerization initiators, and the like may be appropriately contained.
第一の樹脂8中の光硬化性樹脂は、実施形態1と同様に、第二の樹脂9中の離型剤と相溶する相溶性モノマーを含有することが好ましい。このような構成によれば、重合体層6(第二の樹脂9)の表面(基材2とは反対側の表面)において、離型剤の有効成分が均一に分布するため、防汚性が高まる。更に、相溶性モノマーによれば、光硬化性樹脂と離型剤との密着性が高まるため、耐擦性が高まる。光硬化性樹脂が相溶性モノマーを含有する場合、相溶性モノマー単体は離型剤と相溶するが、第一の樹脂8全体としては、第二の樹脂9と相溶しない。
The photocurable resin in the first resin 8 preferably contains a compatible monomer that is compatible with the release agent in the second resin 9 as in the first embodiment. According to such a configuration, the active ingredient of the release agent is uniformly distributed on the surface of the polymer layer 6 (second resin 9) (the surface opposite to the substrate 2), so that the antifouling property is achieved. Will increase. Furthermore, according to the compatible monomer, the adhesiveness between the photocurable resin and the release agent is increased, so that the abrasion resistance is increased. When the photocurable resin contains a compatible monomer, the compatible monomer alone is compatible with the release agent, but the first resin 8 as a whole is not compatible with the second resin 9.
光硬化性樹脂中の相溶性モノマーの含有率は、5重量%以上、30重量%以下であることが好ましく、10重量%以上、25重量%以下であることがより好ましく、15重量%以上、25重量%以下であることが更に好ましい。光硬化性樹脂中の相溶性モノマーの含有率が5重量%未満である場合、特に、高温/高湿の環境下における防汚性及び耐擦性が低下する懸念がある。光硬化性樹脂中の相溶性モノマーの含有率が30重量%よりも高い場合、重合体層6の架橋密度が低下するとともに、結合間の凝集力が強くなるため、重合体層6の硬度が高くなり、特に、高温/高湿の環境下における耐擦性が低下する懸念がある。
The content of the compatible monomer in the photocurable resin is preferably 5% by weight or more and 30% by weight or less, more preferably 10% by weight or more and 25% by weight or less, 15% by weight or more, More preferably, it is 25% by weight or less. When the content of the compatible monomer in the photocurable resin is less than 5% by weight, there is a concern that the antifouling property and the abrasion resistance are deteriorated particularly in a high temperature / high humidity environment. When the content of the compatible monomer in the photocurable resin is higher than 30% by weight, the crosslink density of the polymer layer 6 is decreased and the cohesive force between the bonds is increased. Therefore, the hardness of the polymer layer 6 is increased. In particular, there is a concern that the rubbing resistance in a high temperature / high humidity environment is lowered.
第一の樹脂8、及び、第二の樹脂9は、溶剤を含有していないことが好ましい。すなわち、第一の樹脂8、及び、第二の樹脂9は、無溶剤系であることが好ましい。このような構成によれば、溶剤の使用に係るコスト、及び、環境面での負荷(使用時の臭気等)を低減することができる。更に、溶剤を除去するための装置が不要であり、装置コストを低減することができる。
It is preferable that the first resin 8 and the second resin 9 do not contain a solvent. That is, the first resin 8 and the second resin 9 are preferably solventless. According to such a configuration, it is possible to reduce the cost related to the use of the solvent and the environmental load (odor or the like during use). Furthermore, an apparatus for removing the solvent is unnecessary, and the apparatus cost can be reduced.
第一の樹脂8の厚みT1は、3μm以上、30μm以下であることが好ましく、5μm以上、7μm以下であることが好ましい。
The thickness T1 of the first resin 8 is preferably 3 μm or more and 30 μm or less, and preferably 5 μm or more and 7 μm or less.
第二の樹脂9の厚みT2は、0.1μm以上、15μm以下であることが好ましく、1μm以上、10μm以下であることがより好ましく、2μm以上、8μm以下であることが更に好ましく、5μm以上、8μm以下であることが特に好ましい。
The thickness T2 of the second resin 9 is preferably 0.1 μm or more and 15 μm or less, more preferably 1 μm or more and 10 μm or less, further preferably 2 μm or more and 8 μm or less, more preferably 5 μm or more, Particularly preferably, it is 8 μm or less.
光学部材1のヘイズは、1.0%未満である。光学部材1のヘイズが1.0%以上である場合、透明性が低下し、その結果、モスアイ構造による反射防止性(低反射性)が低下する。光学部材1のヘイズは、0.8%未満であることが好ましく、0.5%未満であることがより好ましい。実施形態2の光学部材の製造方法とは異なり、第一の樹脂8と第二の樹脂9とを混合させた場合の濁度が35度(カオリン)よりも高い場合、光学部材1のヘイズが高くなり(例えば、1.0%以上)、透明性が損なわれてしまう。
The haze of the optical member 1 is less than 1.0%. When the haze of the optical member 1 is 1.0% or more, the transparency is lowered, and as a result, the antireflection property (low reflectivity) by the moth-eye structure is lowered. The haze of the optical member 1 is preferably less than 0.8%, and more preferably less than 0.5%. Unlike the optical member manufacturing method of Embodiment 2, when the turbidity when the first resin 8 and the second resin 9 are mixed is higher than 35 degrees (kaolin), the haze of the optical member 1 is high. It becomes high (for example, 1.0% or more), and transparency is impaired.
[実施形態3]
実施形態3の光学部材の製造方法は、本発明の第二の光学部材の製造方法に関する。実施形態3の光学部材の製造方法について、図3を参照して以下に説明する。図3は、実施形態3の光学部材の製造方法を説明するための断面模式図である。実施形態3の光学部材の製造方法は、第二の樹脂を金型の表面上に塗布すること以外、実施形態2の光学部材の製造方法と同様であるため、重複する点については説明を適宜省略する。 [Embodiment 3]
The manufacturing method of the optical member ofEmbodiment 3 is related with the manufacturing method of the 2nd optical member of this invention. The manufacturing method of the optical member of Embodiment 3 is demonstrated below with reference to FIG. FIG. 3 is a schematic cross-sectional view for explaining the method for manufacturing the optical member of the third embodiment. The manufacturing method of the optical member of Embodiment 3 is the same as the manufacturing method of the optical member of Embodiment 2 except that the second resin is applied on the surface of the mold. Omitted.
実施形態3の光学部材の製造方法は、本発明の第二の光学部材の製造方法に関する。実施形態3の光学部材の製造方法について、図3を参照して以下に説明する。図3は、実施形態3の光学部材の製造方法を説明するための断面模式図である。実施形態3の光学部材の製造方法は、第二の樹脂を金型の表面上に塗布すること以外、実施形態2の光学部材の製造方法と同様であるため、重複する点については説明を適宜省略する。 [Embodiment 3]
The manufacturing method of the optical member of
(プロセス(1):第一の樹脂及び第二の樹脂の塗布)
図3(a)に示すように、光硬化性樹脂を含有する第一の樹脂8を、基材2の表面上に塗布する。次に、離型剤を含有する第二の樹脂9を、金型5の表面(凹凸面)上に塗布する。 (Process (1): Application of first resin and second resin)
As shown in FIG. 3A, afirst resin 8 containing a photocurable resin is applied on the surface of the substrate 2. Next, the second resin 9 containing a release agent is applied on the surface (uneven surface) of the mold 5.
図3(a)に示すように、光硬化性樹脂を含有する第一の樹脂8を、基材2の表面上に塗布する。次に、離型剤を含有する第二の樹脂9を、金型5の表面(凹凸面)上に塗布する。 (Process (1): Application of first resin and second resin)
As shown in FIG. 3A, a
第一の樹脂8の塗布と第二の樹脂9の塗布とは、異なるタイミングで行われてもよく、同じタイミングで行われてもよい。
The application of the first resin 8 and the application of the second resin 9 may be performed at different timings or may be performed at the same timing.
(プロセス(2):樹脂層の形成)
図3(b)に示すように、第一の樹脂8、及び、第二の樹脂9を間に挟んだ状態で、基材2を金型5に第一の樹脂8側から押し当てる。その結果、凹凸構造を表面(基材2とは反対側の表面)に有する樹脂層4が形成される。 (Process (2): Formation of resin layer)
As shown in FIG. 3B, thebase material 2 is pressed against the mold 5 from the first resin 8 side with the first resin 8 and the second resin 9 sandwiched therebetween. As a result, the resin layer 4 having a concavo-convex structure on the surface (the surface opposite to the substrate 2) is formed.
図3(b)に示すように、第一の樹脂8、及び、第二の樹脂9を間に挟んだ状態で、基材2を金型5に第一の樹脂8側から押し当てる。その結果、凹凸構造を表面(基材2とは反対側の表面)に有する樹脂層4が形成される。 (Process (2): Formation of resin layer)
As shown in FIG. 3B, the
(プロセス(3):樹脂層の硬化)
次に、樹脂層4を光照射によって硬化させる。その結果、図3(c)に示すように、重合体層6が形成される。 (Process (3): Curing of resin layer)
Next, theresin layer 4 is cured by light irradiation. As a result, a polymer layer 6 is formed as shown in FIG.
次に、樹脂層4を光照射によって硬化させる。その結果、図3(c)に示すように、重合体層6が形成される。 (Process (3): Curing of resin layer)
Next, the
(プロセス(4):金型の剥離)
図3(d)に示すように、金型5を重合体層6から剥離する。その結果、光学部材1が完成する。 (Process (4): Mold peeling)
As shown in FIG. 3 (d), themold 5 is peeled from the polymer layer 6. As a result, the optical member 1 is completed.
図3(d)に示すように、金型5を重合体層6から剥離する。その結果、光学部材1が完成する。 (Process (4): Mold peeling)
As shown in FIG. 3 (d), the
上記プロセス(1)について、実施形態2、3では、第一の樹脂8を基材2の表面上に塗布し、第二の樹脂9を、第一の樹脂8、又は、金型5の表面上に塗布するプロセスを示したが、第二の樹脂9を、第一の樹脂8、及び、金型5の両方の表面上に塗布してもよい。すなわち、上記プロセス(1)は、第一の樹脂8を基材2の表面上に塗布し、第二の樹脂9を、第一の樹脂8、及び、金型5のうちの少なくとも一方の表面上に塗布することによって行われてもよい。また、上記プロセス(1)は、第二の樹脂9を金型5の表面(凹凸面)上に塗布し、第一の樹脂8を第二の樹脂9の表面(金型5とは反対側の表面)上に塗布することによって行われてもよい。
Regarding the process (1), in the second and third embodiments, the first resin 8 is applied on the surface of the substrate 2, and the second resin 9 is applied to the surface of the first resin 8 or the mold 5. Although the process of applying above is shown, the second resin 9 may be applied on both the surfaces of the first resin 8 and the mold 5. That is, in the process (1), the first resin 8 is applied on the surface of the base 2, and the second resin 9 is applied to the surface of at least one of the first resin 8 and the mold 5. It may be done by applying on top. In the process (1), the second resin 9 is applied onto the surface (uneven surface) of the mold 5, and the first resin 8 is applied to the surface of the second resin 9 (the side opposite to the mold 5). It may be carried out by applying on the surface).
以下に、実施例及び比較例を挙げて本発明をより詳細に説明するが、本発明はこれらの例によって限定されるものではない。
Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples, but the present invention is not limited to these examples.
[評価1:本発明の第一の光学部材の製造方法]
実施例及び比較例において、光学部材を製造するために用いた材料は以下の通りである。 [Evaluation 1: Production Method of First Optical Member of the Present Invention]
In the examples and comparative examples, the materials used for manufacturing the optical member are as follows.
実施例及び比較例において、光学部材を製造するために用いた材料は以下の通りである。 [Evaluation 1: Production Method of First Optical Member of the Present Invention]
In the examples and comparative examples, the materials used for manufacturing the optical member are as follows.
(基材)
富士フイルム社製の「TAC-TD80U」を用い、その厚みは80μm、ヘイズは0.1%であった。 (Base material)
“TAC-TD80U” manufactured by FUJIFILM Corporation was used, and its thickness was 80 μm and haze was 0.1%.
富士フイルム社製の「TAC-TD80U」を用い、その厚みは80μm、ヘイズは0.1%であった。 (Base material)
“TAC-TD80U” manufactured by FUJIFILM Corporation was used, and its thickness was 80 μm and haze was 0.1%.
(光硬化性樹脂)
表1に示すような組成の光硬化性樹脂A1~A4を用いた。各材料名の略記は、下記の通りである。表1中の数値は、各光硬化性樹脂中の各材料の含有率を示す。
<相溶性モノマー>
・「DM」:KJケミカルズ社製の「DMAA」
<各種モノマー>
・「U」:新中村化学工業社製の「U-10HA」
・「DPH」:新中村化学工業社製の「A-DPH」
・「TMM」:新中村化学工業社製の「A-TMM-3LM-N」
・「ATM」:新中村化学工業社製の「ATM-35E」
・「PG」:新中村化学工業社製の「NK ECONOMER A-PG5027E」
<光重合開始剤>
・「TPO」:BASF社製の「IRGACURE TPO」 (Photo-curing resin)
Photocurable resins A1 to A4 having the compositions shown in Table 1 were used. Abbreviations for each material name are as follows. The numerical value in Table 1 shows the content rate of each material in each photocurable resin.
<Compatible monomer>
"DM": "DMAA" manufactured by KJ Chemicals
<Various monomers>
・ "U": "U-10HA" manufactured by Shin-Nakamura Chemical Co., Ltd.
・ "DPH": "A-DPH" manufactured by Shin-Nakamura Chemical Co., Ltd.
・ "TMM": "A-TMM-3LM-N" manufactured by Shin-Nakamura Chemical Co., Ltd.
"ATM": "ATM-35E" manufactured by Shin-Nakamura Chemical Co., Ltd.
"PG": "NK ECONOMER A-PG5027E" manufactured by Shin-Nakamura Chemical Co., Ltd.
<Photopolymerization initiator>
・ "TPO": "IRGACURE TPO" manufactured by BASF
表1に示すような組成の光硬化性樹脂A1~A4を用いた。各材料名の略記は、下記の通りである。表1中の数値は、各光硬化性樹脂中の各材料の含有率を示す。
<相溶性モノマー>
・「DM」:KJケミカルズ社製の「DMAA」
<各種モノマー>
・「U」:新中村化学工業社製の「U-10HA」
・「DPH」:新中村化学工業社製の「A-DPH」
・「TMM」:新中村化学工業社製の「A-TMM-3LM-N」
・「ATM」:新中村化学工業社製の「ATM-35E」
・「PG」:新中村化学工業社製の「NK ECONOMER A-PG5027E」
<光重合開始剤>
・「TPO」:BASF社製の「IRGACURE TPO」 (Photo-curing resin)
Photocurable resins A1 to A4 having the compositions shown in Table 1 were used. Abbreviations for each material name are as follows. The numerical value in Table 1 shows the content rate of each material in each photocurable resin.
<Compatible monomer>
"DM": "DMAA" manufactured by KJ Chemicals
<Various monomers>
・ "U": "U-10HA" manufactured by Shin-Nakamura Chemical Co., Ltd.
・ "DPH": "A-DPH" manufactured by Shin-Nakamura Chemical Co., Ltd.
・ "TMM": "A-TMM-3LM-N" manufactured by Shin-Nakamura Chemical Co., Ltd.
"ATM": "ATM-35E" manufactured by Shin-Nakamura Chemical Co., Ltd.
"PG": "NK ECONOMER A-PG5027E" manufactured by Shin-Nakamura Chemical Co., Ltd.
<Photopolymerization initiator>
・ "TPO": "IRGACURE TPO" manufactured by BASF
(離型剤)
表2に示すような組成の離型剤B1~B3を用いた。各材料名の略記は、下記の通りである。表2中の数値は、各離型剤中の各材料の含有率を示す。離型剤B1中の有効成分の含有率は、20重量%であった。離型剤B2中の有効成分の含有率は、40重量%であった。
<フッ素含有モノマー>
・「DAC」:ダイキン工業社製の「オプツールDAC-HP」
・「FAAC」:ユニマテック社製の「CHEMINOX FAAC-6」
<反応性モノマー>
・「AC」:KJケミカルズ社製の「ACMO」 (Release agent)
Release agents B1 to B3 having the compositions shown in Table 2 were used. Abbreviations for each material name are as follows. The numerical value in Table 2 shows the content rate of each material in each mold release agent. The content of the active ingredient in the release agent B1 was 20% by weight. The content of the active ingredient in the release agent B2 was 40% by weight.
<Fluorine-containing monomer>
"DAC": "OPTOOL DAC-HP" manufactured by Daikin Industries
・ "FAAC": "CHEMINOX FAAC-6" manufactured by Unimatec
<Reactive monomer>
・ "AC": "ACMO" manufactured by KJ Chemicals
表2に示すような組成の離型剤B1~B3を用いた。各材料名の略記は、下記の通りである。表2中の数値は、各離型剤中の各材料の含有率を示す。離型剤B1中の有効成分の含有率は、20重量%であった。離型剤B2中の有効成分の含有率は、40重量%であった。
<フッ素含有モノマー>
・「DAC」:ダイキン工業社製の「オプツールDAC-HP」
・「FAAC」:ユニマテック社製の「CHEMINOX FAAC-6」
<反応性モノマー>
・「AC」:KJケミカルズ社製の「ACMO」 (Release agent)
Release agents B1 to B3 having the compositions shown in Table 2 were used. Abbreviations for each material name are as follows. The numerical value in Table 2 shows the content rate of each material in each mold release agent. The content of the active ingredient in the release agent B1 was 20% by weight. The content of the active ingredient in the release agent B2 was 40% by weight.
<Fluorine-containing monomer>
"DAC": "OPTOOL DAC-HP" manufactured by Daikin Industries
・ "FAAC": "CHEMINOX FAAC-6" manufactured by Unimatec
<Reactive monomer>
・ "AC": "ACMO" manufactured by KJ Chemicals
(溶剤)
メチルエチルケトン(MEK、沸点:79.6℃)を用いた。 (solvent)
Methyl ethyl ketone (MEK, boiling point: 79.6 ° C.) was used.
メチルエチルケトン(MEK、沸点:79.6℃)を用いた。 (solvent)
Methyl ethyl ketone (MEK, boiling point: 79.6 ° C.) was used.
(金型)
下記の方法で作製したものを用いた。まず、金型の材料となるアルミニウムを、10cm角のガラス基板上にスパッタリング法によって成膜した。成膜されたアルミニウムの層の厚みは、1.0μmであった。次に、成膜されたアルミニウムの層に対して、陽極酸化及びエッチングを交互に繰り返すことによって、多数の微小な穴(隣り合う穴の底点間の距離が可視光の波長以下)が設けられた陽極酸化層を形成した。具体的には、陽極酸化、エッチング、陽極酸化、エッチング、陽極酸化、エッチング、陽極酸化、エッチング、及び、陽極酸化を順に行う(陽極酸化:5回、エッチング:4回)ことによって、アルミニウムの内部に向かって細くなる形状(テーパー形状)を有する微小な穴(凹部)を多数形成し、その結果、凹凸構造を有する金型が得られた。陽極酸化は、シュウ酸(濃度:0.03重量%)を用いて、液温5℃、印加電圧80Vの条件下で行った。1回の陽極酸化を行う時間は、25秒とした。エッチングは、リン酸(濃度:1mol/l)を用いて、液温30℃の条件下で行った。1回のエッチングを行う時間は、25分とした。金型を走査型電子顕微鏡で観察したところ、凹部の深さは290nmであった。なお、金型の表面には、ダイキン工業社製の「オプツールAES4」によって事前に離型処理を施した。 (Mold)
What was produced by the following method was used. First, aluminum as a mold material was formed on a 10 cm square glass substrate by a sputtering method. The thickness of the formed aluminum layer was 1.0 μm. Next, by repeating the anodic oxidation and etching alternately on the formed aluminum layer, a large number of minute holes (the distance between the bottom points of adjacent holes is less than the wavelength of visible light) are provided. An anodized layer was formed. Specifically, anodization, etching, anodization, etching, anodization, etching, anodization, etching, and anodization are sequentially performed (anodization: 5 times, etching: 4 times), thereby forming the inside of aluminum. A large number of minute holes (concave portions) having a shape (tapered shape) narrowing toward the surface were formed, and as a result, a mold having an uneven structure was obtained. Anodization was performed using oxalic acid (concentration: 0.03% by weight) under conditions of a liquid temperature of 5 ° C. and an applied voltage of 80V. The time for one anodic oxidation was 25 seconds. Etching was performed using phosphoric acid (concentration: 1 mol / l) at a liquid temperature of 30 ° C. The time for performing one etching was set to 25 minutes. When the mold was observed with a scanning electron microscope, the depth of the recess was 290 nm. In addition, the mold surface was subjected to a mold release treatment in advance by “OPTOOL AES4” manufactured by Daikin Industries, Ltd.
下記の方法で作製したものを用いた。まず、金型の材料となるアルミニウムを、10cm角のガラス基板上にスパッタリング法によって成膜した。成膜されたアルミニウムの層の厚みは、1.0μmであった。次に、成膜されたアルミニウムの層に対して、陽極酸化及びエッチングを交互に繰り返すことによって、多数の微小な穴(隣り合う穴の底点間の距離が可視光の波長以下)が設けられた陽極酸化層を形成した。具体的には、陽極酸化、エッチング、陽極酸化、エッチング、陽極酸化、エッチング、陽極酸化、エッチング、及び、陽極酸化を順に行う(陽極酸化:5回、エッチング:4回)ことによって、アルミニウムの内部に向かって細くなる形状(テーパー形状)を有する微小な穴(凹部)を多数形成し、その結果、凹凸構造を有する金型が得られた。陽極酸化は、シュウ酸(濃度:0.03重量%)を用いて、液温5℃、印加電圧80Vの条件下で行った。1回の陽極酸化を行う時間は、25秒とした。エッチングは、リン酸(濃度:1mol/l)を用いて、液温30℃の条件下で行った。1回のエッチングを行う時間は、25分とした。金型を走査型電子顕微鏡で観察したところ、凹部の深さは290nmであった。なお、金型の表面には、ダイキン工業社製の「オプツールAES4」によって事前に離型処理を施した。 (Mold)
What was produced by the following method was used. First, aluminum as a mold material was formed on a 10 cm square glass substrate by a sputtering method. The thickness of the formed aluminum layer was 1.0 μm. Next, by repeating the anodic oxidation and etching alternately on the formed aluminum layer, a large number of minute holes (the distance between the bottom points of adjacent holes is less than the wavelength of visible light) are provided. An anodized layer was formed. Specifically, anodization, etching, anodization, etching, anodization, etching, anodization, etching, and anodization are sequentially performed (anodization: 5 times, etching: 4 times), thereby forming the inside of aluminum. A large number of minute holes (concave portions) having a shape (tapered shape) narrowing toward the surface were formed, and as a result, a mold having an uneven structure was obtained. Anodization was performed using oxalic acid (concentration: 0.03% by weight) under conditions of a liquid temperature of 5 ° C. and an applied voltage of 80V. The time for one anodic oxidation was 25 seconds. Etching was performed using phosphoric acid (concentration: 1 mol / l) at a liquid temperature of 30 ° C. The time for performing one etching was set to 25 minutes. When the mold was observed with a scanning electron microscope, the depth of the recess was 290 nm. In addition, the mold surface was subjected to a mold release treatment in advance by “OPTOOL AES4” manufactured by Daikin Industries, Ltd.
(実施例1-1)
実施例1-1の光学部材を、実施形態1の光学部材の製造方法によって作製した。 Example 1-1
The optical member of Example 1-1 was produced by the optical member manufacturing method of Embodiment 1.
実施例1-1の光学部材を、実施形態1の光学部材の製造方法によって作製した。 Example 1-1
The optical member of Example 1-1 was produced by the optical member manufacturing method of Embodiment 1.
(プロセス(1):樹脂溶液の調製)
光硬化性樹脂A1及び離型剤B1を混合させた後、その混合物を溶剤に溶解させ、樹脂溶液3を調製した。樹脂溶液3において、光硬化性樹脂A1の含有率は80重量%、離型剤B1の含有率は10重量%、溶剤の含有率は10重量%であった。すなわち、樹脂溶液3中の離型剤B1の有効成分の含有率は、2重量%であった。 (Process (1): Preparation of resin solution)
After mixing photocurable resin A1 and mold release agent B1, the mixture was dissolved in the solvent and theresin solution 3 was prepared. In the resin solution 3, the content of the photocurable resin A1 was 80% by weight, the content of the release agent B1 was 10% by weight, and the content of the solvent was 10% by weight. That is, the content of the active ingredient of the release agent B1 in the resin solution 3 was 2% by weight.
光硬化性樹脂A1及び離型剤B1を混合させた後、その混合物を溶剤に溶解させ、樹脂溶液3を調製した。樹脂溶液3において、光硬化性樹脂A1の含有率は80重量%、離型剤B1の含有率は10重量%、溶剤の含有率は10重量%であった。すなわち、樹脂溶液3中の離型剤B1の有効成分の含有率は、2重量%であった。 (Process (1): Preparation of resin solution)
After mixing photocurable resin A1 and mold release agent B1, the mixture was dissolved in the solvent and the
(プロセス(2):樹脂溶液の塗布)
樹脂溶液3を基材2の表面上に、帯状に滴下(塗布)した。その後、バーコーターを用いて、樹脂溶液3を基材2の表面全体に広げた。 (Process (2): Application of resin solution)
Theresin solution 3 was dropped (applied) on the surface of the substrate 2 in a band shape. Thereafter, the resin solution 3 was spread over the entire surface of the substrate 2 using a bar coater.
樹脂溶液3を基材2の表面上に、帯状に滴下(塗布)した。その後、バーコーターを用いて、樹脂溶液3を基材2の表面全体に広げた。 (Process (2): Application of resin solution)
The
(プロセス(3):樹脂層の形成)
基材2の表面上に樹脂溶液3の塗布物が配置された状態のものをオーブンに入れて、温度80℃で1分間加熱処理し、樹脂溶液3の塗布物から溶剤を揮発させた。その結果、樹脂層4が形成された。 (Process (3): Formation of resin layer)
The thing in which the coating material of theresin solution 3 was arrange | positioned on the surface of the base material 2 was put into oven, and it heat-processed for 1 minute at the temperature of 80 degreeC, and volatilized the solvent from the coating material of the resin solution 3. As a result, the resin layer 4 was formed.
基材2の表面上に樹脂溶液3の塗布物が配置された状態のものをオーブンに入れて、温度80℃で1分間加熱処理し、樹脂溶液3の塗布物から溶剤を揮発させた。その結果、樹脂層4が形成された。 (Process (3): Formation of resin layer)
The thing in which the coating material of the
(プロセス(4):凹凸構造の形成)
樹脂層4を間に挟んだ状態で、基材2を金型5にハンドローラーで押し当てた。その結果、凹凸構造が樹脂層4の表面(基材2とは反対側の表面)に形成された。 (Process (4): Formation of uneven structure)
Thebase material 2 was pressed against the mold 5 with a hand roller with the resin layer 4 sandwiched therebetween. As a result, a concavo-convex structure was formed on the surface of the resin layer 4 (surface opposite to the base material 2).
樹脂層4を間に挟んだ状態で、基材2を金型5にハンドローラーで押し当てた。その結果、凹凸構造が樹脂層4の表面(基材2とは反対側の表面)に形成された。 (Process (4): Formation of uneven structure)
The
(プロセス(5):樹脂層の硬化)
凹凸構造を表面に有する樹脂層4に、基材2側から紫外線(照射量:200mJ/cm2)を照射して硬化させた。その結果、重合体層6が形成された。 (Process (5): Curing of resin layer)
Theresin layer 4 having a concavo-convex structure on the surface was cured by irradiation with ultraviolet rays (irradiation amount: 200 mJ / cm 2 ) from the base material 2 side. As a result, the polymer layer 6 was formed.
凹凸構造を表面に有する樹脂層4に、基材2側から紫外線(照射量:200mJ/cm2)を照射して硬化させた。その結果、重合体層6が形成された。 (Process (5): Curing of resin layer)
The
(プロセス(6):金型の剥離)
金型5を重合体層6から剥離した。その結果、光学部材1が完成した。重合体層6の厚みTは、9.8μmであった。 (Process (6): Mold peeling)
Themold 5 was peeled from the polymer layer 6. As a result, the optical member 1 was completed. The thickness T of the polymer layer 6 was 9.8 μm.
金型5を重合体層6から剥離した。その結果、光学部材1が完成した。重合体層6の厚みTは、9.8μmであった。 (Process (6): Mold peeling)
The
光学部材1の表面仕様は、下記の通りであった。
凸部7の形状:釣鐘状
隣接する凸部7間のピッチP:200nm
凸部7の高さ:200nm
凸部7のアスペクト比:1 The surface specification of the optical member 1 was as follows.
Shape of convex portion 7: Pitch 200 between bell-shaped adjacent convex portions 7: 200 nm
Height of convex part 7: 200 nm
Aspect ratio of convex part 1: 1
凸部7の形状:釣鐘状
隣接する凸部7間のピッチP:200nm
凸部7の高さ:200nm
凸部7のアスペクト比:1 The surface specification of the optical member 1 was as follows.
Shape of convex portion 7: Pitch 200 between bell-shaped adjacent convex portions 7: 200 nm
Height of convex part 7: 200 nm
Aspect ratio of convex part 1: 1
光学部材1の表面仕様の評価は、日立ハイテクノロジーズ社製の走査型電子顕微鏡「S-4700」を用いて行われた。なお、評価時には、メイワフォーシス社製のオスミウムコーター「Neoc-ST」を用いて、光学部材1の表面(重合体層6の基材2とは反対側の表面)上に和光純薬工業社製の酸化オスミウムVIII(厚み:5nm)が塗布されていた。具体的には、隣接する凸部7間のピッチPは、上記走査型電子顕微鏡で撮影された平面写真の1μm角の領域内における、枝突起を除くすべての隣接する凸部間の距離の平均値とした。凸部7の高さは、上記走査型電子顕微鏡で撮影された断面写真における、枝突起を除く連続して並んだ10個の凸部の高さの平均値とした。ただし、10個の凸部を選択する際は、欠損や変形した部分(測定用試料を準備する際に変形させてしまった部分等)がある凸部を除いた。
The surface specification of the optical member 1 was evaluated using a scanning electron microscope “S-4700” manufactured by Hitachi High-Technologies Corporation. At the time of evaluation, an osmium coater “Neoc-ST” manufactured by Meiwa Forsys was used on the surface of the optical member 1 (the surface opposite to the base material 2 of the polymer layer 6) manufactured by Wako Pure Chemical Industries, Ltd. Of osmium oxide VIII (thickness: 5 nm) was applied. Specifically, the pitch P between the adjacent convex portions 7 is the average of the distances between all the adjacent convex portions excluding the branch projections in the 1 μm square region of the planar photograph taken with the scanning electron microscope. Value. The height of the convex portion 7 was defined as the average value of the heights of ten convex portions arranged in a row, excluding branch protrusions, in the cross-sectional photograph taken with the scanning electron microscope. However, when 10 convex portions were selected, the convex portions having a defect or a deformed portion (a portion that was deformed when preparing a measurement sample, etc.) were excluded.
(実施例1-2~1-9、及び、比較例1-1~1-8)
表3~6に示すような組成に変更したこと以外、実施例1-1と同様にして、各例の光学部材を作製した。 (Examples 1-2 to 1-9 and Comparative Examples 1-1 to 1-8)
Optical members of respective examples were produced in the same manner as in Example 1-1 except that the compositions were changed as shown in Tables 3 to 6.
表3~6に示すような組成に変更したこと以外、実施例1-1と同様にして、各例の光学部材を作製した。 (Examples 1-2 to 1-9 and Comparative Examples 1-1 to 1-8)
Optical members of respective examples were produced in the same manner as in Example 1-1 except that the compositions were changed as shown in Tables 3 to 6.
表3~6には、光硬化性樹脂と離型剤とを、各例の樹脂溶液中の比率で混合させた場合の濁度(単に、「濁度」と表記する)も示した。濁度の測定は、三菱化学アナリテック社製の積分球式濁度計「PT-200」において、10mmセルに試料を入れ、予め設定されているカオリン検量線を用いることによって行われた。
Tables 3 to 6 also show the turbidity (simply referred to as “turbidity”) when the photocurable resin and the release agent are mixed in a ratio in the resin solution of each example. The turbidity was measured by placing a sample in a 10 mm cell in an integrating sphere turbidimeter “PT-200” manufactured by Mitsubishi Chemical Analytech Co., Ltd. and using a preset kaolin calibration curve.
(評価内容及び評価結果)
実施例1-1~1-9、及び、比較例1-1~1-8の光学部材について、透明性、防汚性、及び、耐擦性を評価した。結果を表3~6に示す。 (Evaluation contents and evaluation results)
The optical members of Examples 1-1 to 1-9 and Comparative Examples 1-1 to 1-8 were evaluated for transparency, antifouling property, and abrasion resistance. The results are shown in Tables 3-6.
実施例1-1~1-9、及び、比較例1-1~1-8の光学部材について、透明性、防汚性、及び、耐擦性を評価した。結果を表3~6に示す。 (Evaluation contents and evaluation results)
The optical members of Examples 1-1 to 1-9 and Comparative Examples 1-1 to 1-8 were evaluated for transparency, antifouling property, and abrasion resistance. The results are shown in Tables 3-6.
<透明性>
透明性としては、各例の光学部材のヘイズを評価した。具体的には、日本電色工業社製のヘイズメーター「NDH7000」を用いて、各例の光学部材のヘイズを測定した。判定基準は、下記の通りとした。
◎:ヘイズが0.5%以下であった。
○:ヘイズが0.5%よりも高く、0.8%以下であった。
△:ヘイズが0.8%よりも高く、1.0%未満であった。
×:ヘイズが1.0%以上であった。
ここで、判定が◎、○、又は、△である場合を、許容可能なレベル(透明性が優れている)と判断した。 <Transparency>
As transparency, the haze of the optical member of each example was evaluated. Specifically, the haze of the optical member in each example was measured using a haze meter “NDH7000” manufactured by Nippon Denshoku Industries Co., Ltd. Judgment criteria were as follows.
A: Haze was 0.5% or less.
○: Haze was higher than 0.5% and 0.8% or lower.
Δ: Haze was higher than 0.8% and lower than 1.0%.
X: Haze was 1.0% or more.
Here, the case where the determination was ◎, ○, or Δ was determined to be an acceptable level (excellent transparency).
透明性としては、各例の光学部材のヘイズを評価した。具体的には、日本電色工業社製のヘイズメーター「NDH7000」を用いて、各例の光学部材のヘイズを測定した。判定基準は、下記の通りとした。
◎:ヘイズが0.5%以下であった。
○:ヘイズが0.5%よりも高く、0.8%以下であった。
△:ヘイズが0.8%よりも高く、1.0%未満であった。
×:ヘイズが1.0%以上であった。
ここで、判定が◎、○、又は、△である場合を、許容可能なレベル(透明性が優れている)と判断した。 <Transparency>
As transparency, the haze of the optical member of each example was evaluated. Specifically, the haze of the optical member in each example was measured using a haze meter “NDH7000” manufactured by Nippon Denshoku Industries Co., Ltd. Judgment criteria were as follows.
A: Haze was 0.5% or less.
○: Haze was higher than 0.5% and 0.8% or lower.
Δ: Haze was higher than 0.8% and lower than 1.0%.
X: Haze was 1.0% or more.
Here, the case where the determination was ◎, ○, or Δ was determined to be an acceptable level (excellent transparency).
<防汚性>
防汚性としては、各例の光学部材の指紋拭き取り性を評価した。具体的には、まず、各例の光学部材に対して、基材の重合体層とは反対側の表面に、光学粘着層を介して、黒アクリル板を貼り付けた。次に、各例の光学部材を、温度60℃、湿度95%の環境下で101日間放置し、更に、温度23℃、湿度50%の環境下で1日間放置した。そして、各例の光学部材の表面(重合体層の基材とは反対側の表面)に指紋を付着させた後、旭化成せんい社製の「ベンコット(登録商標)S-2」で10往復擦り、指紋が拭き取れるかどうかを、照度100lxの環境下で目視観察した。判定基準は、下記の通りとした。
○:指紋が完全に拭き取れ、拭き残りが見えなかった。
△:指紋は目立たないが、蛍光灯を映り込ませると拭き残りがわずかに見えた。
×:指紋が全く拭き取れなかった。
ここで、判定が○又は△である場合を、許容可能なレベル(防汚性が優れている)と判断した。 <Anti-fouling property>
As antifouling property, the fingerprint wiping property of the optical member of each example was evaluated. Specifically, first, a black acrylic plate was attached to the surface of the optical member of each example on the surface opposite to the polymer layer of the base material via the optical adhesive layer. Next, the optical member of each example was left for 101 days in an environment of a temperature of 60 ° C. and a humidity of 95%, and further left for 1 day in an environment of a temperature of 23 ° C. and a humidity of 50%. Then, after attaching a fingerprint to the surface of the optical member of each example (the surface opposite to the base material of the polymer layer), it was rubbed 10 times with “Bencot (registered trademark) S-2” manufactured by Asahi Kasei Corporation. Whether or not the fingerprint was wiped off was visually observed in an environment with an illuminance of 100 lx. Judgment criteria were as follows.
○: The fingerprint was completely wiped off, and the remaining wipe was not visible.
Δ: Fingerprints are inconspicuous, but a slight amount of wiping residue was visible when a fluorescent lamp was reflected.
X: The fingerprint was not wiped off at all.
Here, the case where the determination was ○ or Δ was determined to be an acceptable level (excellent antifouling property).
防汚性としては、各例の光学部材の指紋拭き取り性を評価した。具体的には、まず、各例の光学部材に対して、基材の重合体層とは反対側の表面に、光学粘着層を介して、黒アクリル板を貼り付けた。次に、各例の光学部材を、温度60℃、湿度95%の環境下で101日間放置し、更に、温度23℃、湿度50%の環境下で1日間放置した。そして、各例の光学部材の表面(重合体層の基材とは反対側の表面)に指紋を付着させた後、旭化成せんい社製の「ベンコット(登録商標)S-2」で10往復擦り、指紋が拭き取れるかどうかを、照度100lxの環境下で目視観察した。判定基準は、下記の通りとした。
○:指紋が完全に拭き取れ、拭き残りが見えなかった。
△:指紋は目立たないが、蛍光灯を映り込ませると拭き残りがわずかに見えた。
×:指紋が全く拭き取れなかった。
ここで、判定が○又は△である場合を、許容可能なレベル(防汚性が優れている)と判断した。 <Anti-fouling property>
As antifouling property, the fingerprint wiping property of the optical member of each example was evaluated. Specifically, first, a black acrylic plate was attached to the surface of the optical member of each example on the surface opposite to the polymer layer of the base material via the optical adhesive layer. Next, the optical member of each example was left for 101 days in an environment of a temperature of 60 ° C. and a humidity of 95%, and further left for 1 day in an environment of a temperature of 23 ° C. and a humidity of 50%. Then, after attaching a fingerprint to the surface of the optical member of each example (the surface opposite to the base material of the polymer layer), it was rubbed 10 times with “Bencot (registered trademark) S-2” manufactured by Asahi Kasei Corporation. Whether or not the fingerprint was wiped off was visually observed in an environment with an illuminance of 100 lx. Judgment criteria were as follows.
○: The fingerprint was completely wiped off, and the remaining wipe was not visible.
Δ: Fingerprints are inconspicuous, but a slight amount of wiping residue was visible when a fluorescent lamp was reflected.
X: The fingerprint was not wiped off at all.
Here, the case where the determination was ○ or Δ was determined to be an acceptable level (excellent antifouling property).
<耐擦性>
耐擦性としては、各例の光学部材について、不織布で表面を擦る前後での反射率の変化率を評価した。具体的には、まず、各例の光学部材に対して、基材の重合体層とは反対側の表面に黒アクリル板を貼り付けた。その後、温度23℃、湿度50%の環境下で、各例の光学部材の表面(重合体層の基材とは反対側の表面)に対して極角5°の方位から光源を照射し、入射角5°における正反射分光反射率を測定した。反射率の測定は、島津製作所社製の「UV-3100PC」を用い、380~780nmの波長領域で行った。そして、測定結果から、450~650nmの波長領域における平均反射率を算出し、その値を反射率A(単位:%)とした。 <Abrasion resistance>
As the abrasion resistance, the change rate of the reflectance before and after rubbing the surface with a nonwoven fabric was evaluated for the optical members of each example. Specifically, first, a black acrylic plate was attached to the surface of the optical member of each example opposite to the polymer layer of the base material. Then, in an environment of a temperature of 23 ° C. and a humidity of 50%, a light source is irradiated from an orientation with a polar angle of 5 ° with respect to the surface of the optical member of each example (the surface opposite to the base material of the polymer layer), The specular reflection spectral reflectance at an incident angle of 5 ° was measured. The reflectance was measured using “UV-3100PC” manufactured by Shimadzu Corporation in the wavelength region of 380 to 780 nm. Then, the average reflectance in the wavelength region of 450 to 650 nm was calculated from the measurement result, and the value was defined as reflectance A (unit:%).
耐擦性としては、各例の光学部材について、不織布で表面を擦る前後での反射率の変化率を評価した。具体的には、まず、各例の光学部材に対して、基材の重合体層とは反対側の表面に黒アクリル板を貼り付けた。その後、温度23℃、湿度50%の環境下で、各例の光学部材の表面(重合体層の基材とは反対側の表面)に対して極角5°の方位から光源を照射し、入射角5°における正反射分光反射率を測定した。反射率の測定は、島津製作所社製の「UV-3100PC」を用い、380~780nmの波長領域で行った。そして、測定結果から、450~650nmの波長領域における平均反射率を算出し、その値を反射率A(単位:%)とした。 <Abrasion resistance>
As the abrasion resistance, the change rate of the reflectance before and after rubbing the surface with a nonwoven fabric was evaluated for the optical members of each example. Specifically, first, a black acrylic plate was attached to the surface of the optical member of each example opposite to the polymer layer of the base material. Then, in an environment of a temperature of 23 ° C. and a humidity of 50%, a light source is irradiated from an orientation with a polar angle of 5 ° with respect to the surface of the optical member of each example (the surface opposite to the base material of the polymer layer), The specular reflection spectral reflectance at an incident angle of 5 ° was measured. The reflectance was measured using “UV-3100PC” manufactured by Shimadzu Corporation in the wavelength region of 380 to 780 nm. Then, the average reflectance in the wavelength region of 450 to 650 nm was calculated from the measurement result, and the value was defined as reflectance A (unit:%).
次に、各例の光学部材を、温度60℃、湿度95%の環境下で101日間放置し、更に、温度23℃、湿度50%の環境下に戻して1日間放置した。そして、旭化成せんい社製の「ベンコットラボ(登録商標)」を用いて、各例の光学部材の表面(重合体層の基材とは反対側の表面)を10往復擦った。その後、各例の光学部材について、上述した方法と同様にして入射光5°における正反射分光反射率を測定した。そして、測定結果から、450~650nmの波長領域における平均反射率を算出し、その値を反射率B(単位:%)とした。
Next, the optical member of each example was left for 101 days in an environment of a temperature of 60 ° C. and a humidity of 95%, and further returned to an environment of a temperature of 23 ° C. and a humidity of 50% and left for one day. Then, using “Bencot Lab (registered trademark)” manufactured by Asahi Kasei Fibers Corporation, the surface of the optical member of each example (the surface opposite to the base material of the polymer layer) was rubbed 10 times. Thereafter, the specular reflection spectral reflectance at 5 ° incident light was measured for the optical members of the respective examples in the same manner as described above. Then, the average reflectance in the wavelength region of 450 to 650 nm was calculated from the measurement result, and the value was defined as reflectance B (unit:%).
耐擦性の評価指標としては、「擦る前後での反射率の変化率(単位:%)=100×(反射率B-反射率A)/反射率A」を用い、判定基準を下記の通りとした。
◎:反射率の変化率が、15%以下であった。
○:反射率の変化率が、15%よりも高く、25%未満であった。
△:反射率の変化率が、25%以上、30%以下であった。
×:反射率の変化率が、30%よりも高く、50%未満であった。
××:反射率の変化率が、50%以上であった。
ここで、判定が◎、○、又は、△である場合を、許容可能なレベル(耐擦性が優れている)と判断した。 As an evaluation index of rubbing resistance, “change rate of reflectance before and after rubbing (unit:%) = 100 × (reflectance B−reflectance A) / reflectance A” is used, and the criterion is as follows: It was.
A: The change rate of the reflectance was 15% or less.
A: The rate of change in reflectance was higher than 15% and lower than 25%.
(Triangle | delta): The change rate of the reflectance was 25% or more and 30% or less.
X: The rate of change in reflectance was higher than 30% and lower than 50%.
XX: Change rate of reflectance was 50% or more.
Here, a case where the determination was ◎, ○, or Δ was determined to be an acceptable level (excellent rub resistance).
◎:反射率の変化率が、15%以下であった。
○:反射率の変化率が、15%よりも高く、25%未満であった。
△:反射率の変化率が、25%以上、30%以下であった。
×:反射率の変化率が、30%よりも高く、50%未満であった。
××:反射率の変化率が、50%以上であった。
ここで、判定が◎、○、又は、△である場合を、許容可能なレベル(耐擦性が優れている)と判断した。 As an evaluation index of rubbing resistance, “change rate of reflectance before and after rubbing (unit:%) = 100 × (reflectance B−reflectance A) / reflectance A” is used, and the criterion is as follows: It was.
A: The change rate of the reflectance was 15% or less.
A: The rate of change in reflectance was higher than 15% and lower than 25%.
(Triangle | delta): The change rate of the reflectance was 25% or more and 30% or less.
X: The rate of change in reflectance was higher than 30% and lower than 50%.
XX: Change rate of reflectance was 50% or more.
Here, a case where the determination was ◎, ○, or Δ was determined to be an acceptable level (excellent rub resistance).
表3及び表4に示すように、実施例1-1~1-9はいずれも、透明性、防汚性、及び、耐擦性が優れていた。中でも、実施例1-1、実施例1-4、実施例1-6、及び、実施例1-8は、透明性、防汚性、及び、耐擦性が総合的に特に優れていた。一方、表5及び表6に示すように、比較例1-1~1-8はいずれも、透明性、防汚性、及び、耐擦性のうちの少なくとも1つが低かった。
As shown in Tables 3 and 4, all of Examples 1-1 to 1-9 were excellent in transparency, antifouling property, and abrasion resistance. Among them, Example 1-1, Example 1-4, Example 1-6, and Example 1-8 were particularly excellent in overall transparency, antifouling property, and abrasion resistance. On the other hand, as shown in Table 5 and Table 6, in Comparative Examples 1-1 to 1-8, at least one of transparency, antifouling property, and abrasion resistance was low.
[評価2:本発明の第二の光学部材の製造方法]
実施例及び比較例において、光学部材を製造するために用いた材料は以下の通りである。なお、基材及び金型は、評価1で用いたものと同様であった。 [Evaluation 2: Manufacturing Method of Second Optical Member of the Present Invention]
In the examples and comparative examples, the materials used for manufacturing the optical member are as follows. The base material and the mold were the same as those used in Evaluation 1.
実施例及び比較例において、光学部材を製造するために用いた材料は以下の通りである。なお、基材及び金型は、評価1で用いたものと同様であった。 [Evaluation 2: Manufacturing Method of Second Optical Member of the Present Invention]
In the examples and comparative examples, the materials used for manufacturing the optical member are as follows. The base material and the mold were the same as those used in Evaluation 1.
(第一の樹脂)
表7に示すような組成の第一の樹脂C1~C3を用いた。各材料名の略記は、評価1と同様である。表7中の数値は、各第一の樹脂中の各材料の含有率を示す。 (First resin)
The first resins C1 to C3 having the composition shown in Table 7 were used. Abbreviations for each material name are the same as in Evaluation 1. The numerical value in Table 7 shows the content rate of each material in each 1st resin.
表7に示すような組成の第一の樹脂C1~C3を用いた。各材料名の略記は、評価1と同様である。表7中の数値は、各第一の樹脂中の各材料の含有率を示す。 (First resin)
The first resins C1 to C3 having the composition shown in Table 7 were used. Abbreviations for each material name are the same as in Evaluation 1. The numerical value in Table 7 shows the content rate of each material in each 1st resin.
(第二の樹脂)
表8に示すような組成の第二の樹脂D1~D4を用いた。各材料名の略記は、評価1と同様である。表8中の数値は、各第二の樹脂中の各材料の含有率を示す。例えば、第二の樹脂D1は、下記の方法で調製された。まず、ダイキン工業社製の「オプツールDAC-HP」に対して、東京理化器械社製のロータリーエバポレーター「N-1110型」を用いて、N-アクリロイルモルホリン(KJケミカルズ社製の「ACMO」)への溶媒置換を行った。その後、富山産業社製のミニジェットオーブン「MD-92」を用いて、温度180℃で5時間加熱処理した。加熱処理後、「ACMO」を添加することによって、有効成分の含有率を10重量%に調整した。 (Second resin)
Second resins D1 to D4 having a composition as shown in Table 8 were used. Abbreviations for each material name are the same as in Evaluation 1. The numerical value in Table 8 shows the content rate of each material in each 2nd resin. For example, the second resin D1 was prepared by the following method. First, for “OPTOOL DAC-HP” manufactured by Daikin Industries, Ltd., to N-acryloylmorpholine (“ACMO” manufactured by KJ Chemicals) using a rotary evaporator “N-1110 type” manufactured by Tokyo Rika Kikai Co., Ltd. The solvent was replaced. Thereafter, heat treatment was performed at a temperature of 180 ° C. for 5 hours using a mini jet oven “MD-92” manufactured by Toyama Sangyo Co., Ltd. After the heat treatment, the content of the active ingredient was adjusted to 10% by weight by adding “ACMO”.
表8に示すような組成の第二の樹脂D1~D4を用いた。各材料名の略記は、評価1と同様である。表8中の数値は、各第二の樹脂中の各材料の含有率を示す。例えば、第二の樹脂D1は、下記の方法で調製された。まず、ダイキン工業社製の「オプツールDAC-HP」に対して、東京理化器械社製のロータリーエバポレーター「N-1110型」を用いて、N-アクリロイルモルホリン(KJケミカルズ社製の「ACMO」)への溶媒置換を行った。その後、富山産業社製のミニジェットオーブン「MD-92」を用いて、温度180℃で5時間加熱処理した。加熱処理後、「ACMO」を添加することによって、有効成分の含有率を10重量%に調整した。 (Second resin)
Second resins D1 to D4 having a composition as shown in Table 8 were used. Abbreviations for each material name are the same as in Evaluation 1. The numerical value in Table 8 shows the content rate of each material in each 2nd resin. For example, the second resin D1 was prepared by the following method. First, for “OPTOOL DAC-HP” manufactured by Daikin Industries, Ltd., to N-acryloylmorpholine (“ACMO” manufactured by KJ Chemicals) using a rotary evaporator “N-1110 type” manufactured by Tokyo Rika Kikai Co., Ltd. The solvent was replaced. Thereafter, heat treatment was performed at a temperature of 180 ° C. for 5 hours using a mini jet oven “MD-92” manufactured by Toyama Sangyo Co., Ltd. After the heat treatment, the content of the active ingredient was adjusted to 10% by weight by adding “ACMO”.
(実施例2-1)
実施例2-1の光学部材を、実施形態2の光学部材の製造方法によって作製した。 Example 2-1
The optical member of Example 2-1 was produced by the optical member manufacturing method ofEmbodiment 2.
実施例2-1の光学部材を、実施形態2の光学部材の製造方法によって作製した。 Example 2-1
The optical member of Example 2-1 was produced by the optical member manufacturing method of
(プロセス(1):第一の樹脂及び第二の樹脂の塗布)
第一の樹脂C1を基材2の表面上に、バーコーターで塗布した。次に、第二の樹脂D1を、塗布された第一の樹脂C1の表面(基材2とは反対側の表面)上に、バーコーターで塗布した。 (Process (1): Application of first resin and second resin)
The first resin C1 was applied on the surface of thesubstrate 2 with a bar coater. Next, the 2nd resin D1 was apply | coated with the bar coater on the surface (surface on the opposite side to the base material 2) of the apply | coated 1st resin C1.
第一の樹脂C1を基材2の表面上に、バーコーターで塗布した。次に、第二の樹脂D1を、塗布された第一の樹脂C1の表面(基材2とは反対側の表面)上に、バーコーターで塗布した。 (Process (1): Application of first resin and second resin)
The first resin C1 was applied on the surface of the
(プロセス(2):樹脂層の形成)
第一の樹脂C1、及び、第二の樹脂D1を間に挟んだ状態で、基材2を金型5に第一の樹脂C1側からハンドローラーで押し当てた。その結果、凹凸構造を表面(基材2とは反対側の表面)に有する樹脂層4が形成された。 (Process (2): Formation of resin layer)
With the first resin C1 and the second resin D1 sandwiched therebetween, thesubstrate 2 was pressed against the mold 5 from the first resin C1 side with a hand roller. As a result, a resin layer 4 having a concavo-convex structure on the surface (the surface opposite to the substrate 2) was formed.
第一の樹脂C1、及び、第二の樹脂D1を間に挟んだ状態で、基材2を金型5に第一の樹脂C1側からハンドローラーで押し当てた。その結果、凹凸構造を表面(基材2とは反対側の表面)に有する樹脂層4が形成された。 (Process (2): Formation of resin layer)
With the first resin C1 and the second resin D1 sandwiched therebetween, the
(プロセス(3):樹脂層の硬化)
凹凸構造を表面に有する樹脂層4に、基材2側から紫外線(照射量:200mJ/cm2)を照射して硬化させた。その結果、重合体層6が形成された。 (Process (3): Curing of resin layer)
Theresin layer 4 having a concavo-convex structure on the surface was cured by irradiation with ultraviolet rays (irradiation amount: 200 mJ / cm 2 ) from the base material 2 side. As a result, the polymer layer 6 was formed.
凹凸構造を表面に有する樹脂層4に、基材2側から紫外線(照射量:200mJ/cm2)を照射して硬化させた。その結果、重合体層6が形成された。 (Process (3): Curing of resin layer)
The
(プロセス(4):金型の剥離)
金型5を重合体層6から剥離した。その結果、光学部材1が完成した。重合体層6の厚みTは、10.5μmであった。光学部材1の表面仕様は、下記の通りであった。
凸部7の形状:釣鐘状
隣接する凸部7間のピッチP:220nm
凸部7の高さ:200nm
凸部7のアスペクト比:約0.9 (Process (4): Mold peeling)
Themold 5 was peeled from the polymer layer 6. As a result, the optical member 1 was completed. The thickness T of the polymer layer 6 was 10.5 μm. The surface specification of the optical member 1 was as follows.
Shape of convex portion 7: pitch P between adjacentconvex portions 7 in a bell shape: 220 nm
Height of convex part 7: 200 nm
Aspect ratio of convex portion 7: about 0.9
金型5を重合体層6から剥離した。その結果、光学部材1が完成した。重合体層6の厚みTは、10.5μmであった。光学部材1の表面仕様は、下記の通りであった。
凸部7の形状:釣鐘状
隣接する凸部7間のピッチP:220nm
凸部7の高さ:200nm
凸部7のアスペクト比:約0.9 (Process (4): Mold peeling)
The
Shape of convex portion 7: pitch P between adjacent
Height of convex part 7: 200 nm
Aspect ratio of convex portion 7: about 0.9
(実施例2-2、及び、比較例2-1~2-5)
表9及び表10に示すような組成に変更したこと以外、実施例2-1と同様にして、各例の光学部材を作製した。表9及び表10には、第一の樹脂と第二の樹脂とを、各例の樹脂層中の比率で混合させた場合の濁度(単に、「濁度」と表記する)も示した。 (Example 2-2 and Comparative Examples 2-1 to 2-5)
Optical members of the respective examples were produced in the same manner as in Example 2-1, except that the compositions were changed as shown in Table 9 and Table 10. Tables 9 and 10 also show the turbidity (simply referred to as “turbidity”) when the first resin and the second resin are mixed at a ratio in the resin layer of each example. .
表9及び表10に示すような組成に変更したこと以外、実施例2-1と同様にして、各例の光学部材を作製した。表9及び表10には、第一の樹脂と第二の樹脂とを、各例の樹脂層中の比率で混合させた場合の濁度(単に、「濁度」と表記する)も示した。 (Example 2-2 and Comparative Examples 2-1 to 2-5)
Optical members of the respective examples were produced in the same manner as in Example 2-1, except that the compositions were changed as shown in Table 9 and Table 10. Tables 9 and 10 also show the turbidity (simply referred to as “turbidity”) when the first resin and the second resin are mixed at a ratio in the resin layer of each example. .
(評価内容及び評価結果)
実施例2-1、実施例2-2、及び、比較例2-1~2-5の光学部材について、評価1と同様にして、透明性、防汚性、及び、耐擦性を評価した。結果を表9及び表10に示す。 (Evaluation contents and evaluation results)
The optical members of Example 2-1, Example 2-2, and Comparative Examples 2-1 to 2-5 were evaluated for transparency, antifouling properties, and abrasion resistance in the same manner as in Evaluation 1. . The results are shown in Table 9 and Table 10.
実施例2-1、実施例2-2、及び、比較例2-1~2-5の光学部材について、評価1と同様にして、透明性、防汚性、及び、耐擦性を評価した。結果を表9及び表10に示す。 (Evaluation contents and evaluation results)
The optical members of Example 2-1, Example 2-2, and Comparative Examples 2-1 to 2-5 were evaluated for transparency, antifouling properties, and abrasion resistance in the same manner as in Evaluation 1. . The results are shown in Table 9 and Table 10.
表9に示すように、実施例2-1、及び、実施例2-2は、透明性、防汚性、及び、耐擦性が優れていた。一方、表10に示すように、比較例2-1~2-5はいずれも、透明性、防汚性、及び、耐擦性のうちの少なくとも1つが低かった。
As shown in Table 9, Example 2-1 and Example 2-2 were excellent in transparency, antifouling property, and abrasion resistance. On the other hand, as shown in Table 10, all of Comparative Examples 2-1 to 2-5 had low at least one of transparency, antifouling property, and abrasion resistance.
[付記]
本発明の一態様は、基材と、上記基材の表面上に配置される、複数の凸部が可視光の波長以下のピッチで設けられる凹凸構造を表面に有する重合体層とを備える光学部材の製造方法であって、光硬化性樹脂及び離型剤を溶剤に溶解させ、樹脂溶液を調製するプロセス(1)と、上記樹脂溶液を上記基材の表面上に塗布するプロセス(2)と、上記樹脂溶液の塗布物から上記溶剤を除去する加熱処理を行い、樹脂層を形成するプロセス(3)と、上記樹脂層を間に挟んだ状態で上記基材を金型に押し当て、上記凹凸構造を上記樹脂層の表面に形成するプロセス(4)と、上記樹脂層を光照射によって硬化させ、上記重合体層を形成するプロセス(5)とを含み、上記光硬化性樹脂及び上記離型剤は、互いに混合させた場合に、5度(カオリン)以上、25度(カオリン)以下の濁度を示す組み合わせであり、上記光学部材のヘイズは、1.0%未満である光学部材の製造方法(本発明の第一の光学部材の製造方法)であってもよい。この態様によれば、透明性を損なうことなく、防汚性及び耐擦性を高める光学部材の製造方法を実現することができる。 [Appendix]
One embodiment of the present invention is an optical device including a base material and a polymer layer that is provided on the surface of the base material and has a concavo-convex structure on the surface, in which a plurality of convex portions are provided at a pitch equal to or less than the wavelength of visible light. A method for producing a member, which is a process (1) for preparing a resin solution by dissolving a photocurable resin and a release agent in a solvent, and a process (2) for applying the resin solution on the surface of the substrate. And a heat treatment for removing the solvent from the coated resin solution, a process (3) for forming a resin layer, and pressing the substrate against the mold with the resin layer sandwiched between them, A process (4) for forming the concavo-convex structure on the surface of the resin layer; and a process (5) for curing the resin layer by light irradiation to form the polymer layer. Release agent is 5 degrees (kaolin) when mixed with each other In addition, the optical member is a combination showing turbidity of 25 degrees (kaolin) or less, and the haze of the optical member is less than 1.0% (the first optical member manufacturing method of the present invention). There may be. According to this aspect, it is possible to realize an optical member manufacturing method that improves antifouling property and abrasion resistance without impairing transparency.
本発明の一態様は、基材と、上記基材の表面上に配置される、複数の凸部が可視光の波長以下のピッチで設けられる凹凸構造を表面に有する重合体層とを備える光学部材の製造方法であって、光硬化性樹脂及び離型剤を溶剤に溶解させ、樹脂溶液を調製するプロセス(1)と、上記樹脂溶液を上記基材の表面上に塗布するプロセス(2)と、上記樹脂溶液の塗布物から上記溶剤を除去する加熱処理を行い、樹脂層を形成するプロセス(3)と、上記樹脂層を間に挟んだ状態で上記基材を金型に押し当て、上記凹凸構造を上記樹脂層の表面に形成するプロセス(4)と、上記樹脂層を光照射によって硬化させ、上記重合体層を形成するプロセス(5)とを含み、上記光硬化性樹脂及び上記離型剤は、互いに混合させた場合に、5度(カオリン)以上、25度(カオリン)以下の濁度を示す組み合わせであり、上記光学部材のヘイズは、1.0%未満である光学部材の製造方法(本発明の第一の光学部材の製造方法)であってもよい。この態様によれば、透明性を損なうことなく、防汚性及び耐擦性を高める光学部材の製造方法を実現することができる。 [Appendix]
One embodiment of the present invention is an optical device including a base material and a polymer layer that is provided on the surface of the base material and has a concavo-convex structure on the surface, in which a plurality of convex portions are provided at a pitch equal to or less than the wavelength of visible light. A method for producing a member, which is a process (1) for preparing a resin solution by dissolving a photocurable resin and a release agent in a solvent, and a process (2) for applying the resin solution on the surface of the substrate. And a heat treatment for removing the solvent from the coated resin solution, a process (3) for forming a resin layer, and pressing the substrate against the mold with the resin layer sandwiched between them, A process (4) for forming the concavo-convex structure on the surface of the resin layer; and a process (5) for curing the resin layer by light irradiation to form the polymer layer. Release agent is 5 degrees (kaolin) when mixed with each other In addition, the optical member is a combination showing turbidity of 25 degrees (kaolin) or less, and the haze of the optical member is less than 1.0% (the first optical member manufacturing method of the present invention). There may be. According to this aspect, it is possible to realize an optical member manufacturing method that improves antifouling property and abrasion resistance without impairing transparency.
本発明の別の一態様は、基材と、上記基材の表面上に配置される、複数の凸部が可視光の波長以下のピッチで設けられる凹凸構造を表面に有する重合体層とを備える光学部材の製造方法であって、第一の樹脂及び第二の樹脂を塗布するプロセス(1)と、上記第一の樹脂及び上記第二の樹脂を間に挟んだ状態で、基材を金型に上記第一の樹脂側から押し当て、上記凹凸構造を表面に有する樹脂層を形成するプロセス(2)と、上記樹脂層を光照射によって硬化させ、上記重合体層を形成するプロセス(3)とを含み、上記第一の樹脂は、光硬化性樹脂を含有し、上記第二の樹脂は、離型剤を含有し、上記第一の樹脂及び上記第二の樹脂は、互いに混合させた場合に、15度(カオリン)以上、35度(カオリン)以下の濁度を示す組み合わせであり、上記光学部材のヘイズは、1.0%未満である光学部材の製造方法(本発明の第二の光学部材の製造方法)であってもよい。この態様によれば、透明性を損なうことなく、防汚性及び耐擦性を高める光学部材の製造方法を実現することができる。
Another embodiment of the present invention includes a base material and a polymer layer that is disposed on the surface of the base material and has a concavo-convex structure provided on the surface with a plurality of convex portions provided at a pitch equal to or less than the wavelength of visible light. A process (1) for applying a first resin and a second resin, and a substrate in a state where the first resin and the second resin are sandwiched therebetween, A process (2) of pressing the mold from the first resin side to form a resin layer having the concavo-convex structure on the surface, and a process of curing the resin layer by light irradiation to form the polymer layer ( 3), the first resin contains a photocurable resin, the second resin contains a release agent, and the first resin and the second resin are mixed with each other. Combination of turbidity of 15 degrees (kaolin) or more and 35 degrees (kaolin) or less There, the haze of the optical member may be a method of producing an optical member is less than 1.0% (production method of the second optical member of the present invention). According to this aspect, it is possible to realize an optical member manufacturing method that improves antifouling property and abrasion resistance without impairing transparency.
本発明の第二の光学部材の製造方法において、上記第一の樹脂及び上記第二の樹脂は、溶剤を含有していなくてもよい。このような構成によれば、上記溶剤の使用に係るコスト、及び、環境面での負荷(使用時の臭気等)を低減することができる。更に、上記溶剤を除去するための装置が不要であり、装置コストを低減することができる。
In the second method for producing an optical member of the present invention, the first resin and the second resin may not contain a solvent. According to such a configuration, it is possible to reduce costs related to the use of the solvent and environmental loads (such as odor during use). Furthermore, an apparatus for removing the solvent is unnecessary, and the apparatus cost can be reduced.
本発明の第一の光学部材の製造方法、及び、本発明の第二の光学部材の製造方法において、上記樹脂層中の上記離型剤の有効成分の含有率は、0.1重量%以上、10重量%以下であってもよい。このような構成によれば、防汚性及び耐擦性を好ましく高めることができる。
In the method for producing the first optical member of the present invention and the method for producing the second optical member of the present invention, the content of the active ingredient of the release agent in the resin layer is 0.1% by weight or more. It may be 10% by weight or less. According to such a structure, antifouling property and abrasion resistance can be preferably increased.
本発明の第一の光学部材の製造方法、及び、本発明の第二の光学部材の製造方法において、上記離型剤は、光反応性基を有するフッ素樹脂であってもよい。このような構成によれば、高温/高湿の環境下におけるブリードアウトが低減し、上記光学部材の信頼性が高まる。また、上記フッ素樹脂は表面自由エネルギーが低いため、防汚性(例えば、指紋拭き取り性)を高めるために好ましく用いられる。
In the method for producing the first optical member of the present invention and the method for producing the second optical member of the present invention, the releasing agent may be a fluororesin having a photoreactive group. According to such a configuration, bleed out in a high temperature / high humidity environment is reduced, and the reliability of the optical member is increased. Moreover, since the said fluororesin has low surface free energy, it is preferably used in order to improve antifouling property (for example, fingerprint wiping property).
本発明の第一の光学部材の製造方法、及び、本発明の第二の光学部材の製造方法において、上記光硬化性樹脂は、上記離型剤と相溶する相溶性モノマーを含有し、上記光硬化性樹脂中の上記相溶性モノマーの含有率は、5重量%以上、30重量%以下であってもよい。このような構成によれば、防汚性及び耐擦性を好ましく高めることができる。
In the method for producing the first optical member of the present invention and the method for producing the second optical member of the present invention, the photocurable resin contains a compatible monomer compatible with the release agent, and The content of the compatible monomer in the photocurable resin may be 5% by weight or more and 30% by weight or less. According to such a structure, antifouling property and abrasion resistance can be preferably increased.
本発明の第一の光学部材の製造方法、及び、本発明の第二の光学部材の製造方法において、上記重合体層の厚みは、5.0μm以上、20.0μm以下であってもよい。このような構成によれば、上記離型剤の有効成分を上記重合体層の表面(上記基材とは反対側の表面)に高濃度で配向させることができる。
In the manufacturing method of the first optical member of the present invention and the manufacturing method of the second optical member of the present invention, the thickness of the polymer layer may be 5.0 μm or more and 20.0 μm or less. According to such a configuration, the active ingredient of the release agent can be oriented at a high concentration on the surface of the polymer layer (the surface opposite to the substrate).
本発明の第一の光学部材の製造方法、及び、本発明の第二の光学部材の製造方法において、上記ピッチは、100nm以上、400nm以下であってもよい。このような構成によれば、モアレ、虹ムラ等の光学現象の発生を充分に防止することができる。
In the method for manufacturing the first optical member of the present invention and the method for manufacturing the second optical member of the present invention, the pitch may be not less than 100 nm and not more than 400 nm. According to such a configuration, it is possible to sufficiently prevent the occurrence of optical phenomena such as moire and rainbow unevenness.
本発明の第一の光学部材の製造方法、及び、本発明の第二の光学部材の製造方法において、上記複数の凸部の高さは、各々、50nm以上、600nm以下であってもよい。このような構成によれば、上記複数の凸部の好ましいアスペクト比と両立させることができる。
In the method for manufacturing the first optical member of the present invention and the method for manufacturing the second optical member of the present invention, the heights of the plurality of convex portions may be 50 nm or more and 600 nm or less, respectively. According to such a configuration, it is possible to achieve a favorable aspect ratio of the plurality of convex portions.
本発明の第一の光学部材の製造方法、及び、本発明の第二の光学部材の製造方法において、上記複数の凸部のアスペクト比は、各々、0.8以上、1.5以下であってもよい。このような構成によれば、モアレ、虹ムラ等の光学現象の発生を充分に防止し、良好な反射特性を実現することができる。更に、モスアイ構造の加工性の低下、スティッキングの発生、及び、モスアイ構造を形成する際の転写具合の悪化を防止することができる。
In the first optical member manufacturing method and the second optical member manufacturing method of the present invention, the aspect ratios of the plurality of convex portions are 0.8 or more and 1.5 or less, respectively. May be. According to such a configuration, it is possible to sufficiently prevent the occurrence of optical phenomena such as moire and rainbow unevenness, and to realize good reflection characteristics. Furthermore, it is possible to prevent deterioration in processability of the moth-eye structure, occurrence of sticking, and deterioration of the transfer condition when forming the moth-eye structure.
1:光学部材
2:基材
3:樹脂溶液
4:樹脂層
5:金型
6:重合体層
7:凸部
8:第一の樹脂
9:第二の樹脂
P:ピッチ
T:重合体層の厚み
T1:第一の樹脂の厚み
T2:第二の樹脂の厚み 1: Optical member 2: Base material 3: Resin solution 4: Resin layer 5: Mold 6: Polymer layer 7: Convex part 8: First resin 9: Second resin P: Pitch T: Polymer layer Thickness T1: First resin thickness T2: Second resin thickness
2:基材
3:樹脂溶液
4:樹脂層
5:金型
6:重合体層
7:凸部
8:第一の樹脂
9:第二の樹脂
P:ピッチ
T:重合体層の厚み
T1:第一の樹脂の厚み
T2:第二の樹脂の厚み 1: Optical member 2: Base material 3: Resin solution 4: Resin layer 5: Mold 6: Polymer layer 7: Convex part 8: First resin 9: Second resin P: Pitch T: Polymer layer Thickness T1: First resin thickness T2: Second resin thickness
Claims (10)
- 基材と、前記基材の表面上に配置される、複数の凸部が可視光の波長以下のピッチで設けられる凹凸構造を表面に有する重合体層とを備える光学部材の製造方法であって、
光硬化性樹脂及び離型剤を溶剤に溶解させ、樹脂溶液を調製するプロセス(1)と、
前記樹脂溶液を前記基材の表面上に塗布するプロセス(2)と、
前記樹脂溶液の塗布物から前記溶剤を除去する加熱処理を行い、樹脂層を形成するプロセス(3)と、
前記樹脂層を間に挟んだ状態で前記基材を金型に押し当て、前記凹凸構造を前記樹脂層の表面に形成するプロセス(4)と、
前記樹脂層を光照射によって硬化させ、前記重合体層を形成するプロセス(5)とを含み、
前記光硬化性樹脂及び前記離型剤は、互いに混合させた場合に、5度(カオリン)以上、25度(カオリン)以下の濁度を示す組み合わせであり、
前記光学部材のヘイズは、1.0%未満であることを特徴とする光学部材の製造方法。 A method for producing an optical member, comprising: a base material; and a polymer layer having a concavo-convex structure on the surface, wherein the convex portions are provided on the surface of the base material at a pitch equal to or less than a wavelength of visible light. ,
A process (1) for preparing a resin solution by dissolving a photocurable resin and a release agent in a solvent;
A process (2) of applying the resin solution on the surface of the substrate;
A process (3) for performing a heat treatment to remove the solvent from the resin solution coating and forming a resin layer;
A process (4) of pressing the substrate against a mold with the resin layer sandwiched therebetween, and forming the uneven structure on the surface of the resin layer;
The resin layer is cured by light irradiation, and the polymer layer is formed (5),
When the photocurable resin and the release agent are mixed with each other, the photocurable resin and the release agent have a turbidity of 5 degrees (kaolin) or more and 25 degrees (kaolin) or less,
The haze of the said optical member is less than 1.0%, The manufacturing method of the optical member characterized by the above-mentioned. - 基材と、前記基材の表面上に配置される、複数の凸部が可視光の波長以下のピッチで設けられる凹凸構造を表面に有する重合体層とを備える光学部材の製造方法であって、
第一の樹脂及び第二の樹脂を塗布するプロセス(1)と、
前記第一の樹脂及び前記第二の樹脂を間に挟んだ状態で、基材を金型に前記第一の樹脂側から押し当て、前記凹凸構造を表面に有する樹脂層を形成するプロセス(2)と、
前記樹脂層を光照射によって硬化させ、前記重合体層を形成するプロセス(3)とを含み、
前記第一の樹脂は、光硬化性樹脂を含有し、
前記第二の樹脂は、離型剤を含有し、
前記第一の樹脂及び前記第二の樹脂は、互いに混合させた場合に、15度(カオリン)以上、35度(カオリン)以下の濁度を示す組み合わせであり、
前記光学部材のヘイズは、1.0%未満であることを特徴とする光学部材の製造方法。 A method for producing an optical member, comprising: a base material; and a polymer layer having a concavo-convex structure on the surface, wherein the convex portions are provided on the surface of the base material at a pitch equal to or less than a wavelength of visible light. ,
A process (1) for applying a first resin and a second resin;
Process of forming a resin layer having the concavo-convex structure on the surface by pressing the base material against the mold from the first resin side with the first resin and the second resin sandwiched therebetween (2 )When,
The resin layer is cured by light irradiation, and the polymer layer is formed (3),
The first resin contains a photocurable resin,
The second resin contains a release agent,
When the first resin and the second resin are mixed with each other, the first resin and the second resin have a turbidity of 15 degrees (kaolin) or more and 35 degrees (kaolin) or less,
The haze of the said optical member is less than 1.0%, The manufacturing method of the optical member characterized by the above-mentioned. - 前記第一の樹脂及び前記第二の樹脂は、溶剤を含有していないことを特徴とする請求項2に記載の光学部材の製造方法。 The method for producing an optical member according to claim 2, wherein the first resin and the second resin do not contain a solvent.
- 前記樹脂層中の前記離型剤の有効成分の含有率は、0.1重量%以上、10重量%以下であることを特徴とする請求項1~3のいずれかに記載の光学部材の製造方法。 The production of the optical member according to any one of claims 1 to 3, wherein the content of the active ingredient of the release agent in the resin layer is 0.1 wt% or more and 10 wt% or less. Method.
- 前記離型剤は、光反応性基を有するフッ素樹脂であることを特徴とする請求項1~4のいずれかに記載の光学部材の製造方法。 The method for producing an optical member according to any one of claims 1 to 4, wherein the release agent is a fluororesin having a photoreactive group.
- 前記光硬化性樹脂は、前記離型剤と相溶する相溶性モノマーを含有し、
前記光硬化性樹脂中の前記相溶性モノマーの含有率は、5重量%以上、30重量%以下であることを特徴とする請求項1~5のいずれかに記載の光学部材の製造方法。 The photocurable resin contains a compatible monomer that is compatible with the release agent,
6. The method for producing an optical member according to claim 1, wherein the content of the compatible monomer in the photocurable resin is 5% by weight or more and 30% by weight or less. - 前記重合体層の厚みは、5.0μm以上、20.0μm以下であることを特徴とする請求項1~6のいずれかに記載の光学部材の製造方法。 7. The method for producing an optical member according to claim 1, wherein the polymer layer has a thickness of 5.0 μm or more and 20.0 μm or less.
- 前記ピッチは、100nm以上、400nm以下であることを特徴とする請求項1~7のいずれかに記載の光学部材の製造方法。 The method for manufacturing an optical member according to any one of claims 1 to 7, wherein the pitch is 100 nm or more and 400 nm or less.
- 前記複数の凸部の高さは、各々、50nm以上、600nm以下であることを特徴とする請求項1~8のいずれかに記載の光学部材の製造方法。 The method for manufacturing an optical member according to any one of claims 1 to 8, wherein the heights of the plurality of convex portions are 50 nm or more and 600 nm or less, respectively.
- 前記複数の凸部のアスペクト比は、各々、0.8以上、1.5以下であることを特徴とする請求項1~9のいずれかに記載の光学部材の製造方法。 10. The method for manufacturing an optical member according to claim 1, wherein the aspect ratio of the plurality of convex portions is 0.8 or more and 1.5 or less, respectively.
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WO2008132903A1 (en) * | 2007-04-12 | 2008-11-06 | Kyowa Hakko Chemical Co., Ltd. | Pattern formation method and pattern formation apparatus |
WO2011111669A1 (en) * | 2010-03-08 | 2011-09-15 | シャープ株式会社 | Mold release treatment method, mold, method for producing anti-reflective film, mold release treatment device, and washing/drying device for mold |
WO2014163198A1 (en) * | 2013-04-05 | 2014-10-09 | 三菱レイヨン株式会社 | Multilayer structure, method for producing same, and article |
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