WO2018003867A1 - Method for producing n-(3,5-dichloropyrid-4-yl)-n-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide - Google Patents

Method for producing n-(3,5-dichloropyrid-4-yl)-n-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide Download PDF

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WO2018003867A1
WO2018003867A1 PCT/JP2017/023772 JP2017023772W WO2018003867A1 WO 2018003867 A1 WO2018003867 A1 WO 2018003867A1 JP 2017023772 W JP2017023772 W JP 2017023772W WO 2018003867 A1 WO2018003867 A1 WO 2018003867A1
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alkali metal
compound
cyclopropylmethoxy
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高田 恭憲
智史 天野
健治 新
崇 安河内
睦 園部
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久光製薬株式会社
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D213/00Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/72Nitrogen atoms
    • C07D213/75Amino or imino radicals, acylated by carboxylic or carbonic acids, or by sulfur or nitrogen analogues thereof, e.g. carbamates
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/435Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
    • A61K31/44Non condensed pyridines; Hydrogenated derivatives thereof
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P11/00Drugs for disorders of the respiratory system
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P11/00Drugs for disorders of the respiratory system
    • A61P11/02Nasal agents, e.g. decongestants
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P17/00Drugs for dermatological disorders
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P27/00Drugs for disorders of the senses
    • A61P27/02Ophthalmic agents
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P29/00Non-central analgesic, antipyretic or antiinflammatory agents, e.g. antirheumatic agents; Non-steroidal antiinflammatory drugs [NSAID]
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P37/00Drugs for immunological or allergic disorders
    • A61P37/02Immunomodulators
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61PSPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P37/00Drugs for immunological or allergic disorders
    • A61P37/08Antiallergic agents

Definitions

  • the present invention relates to a process for producing N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide.
  • Phosphodiesterase (PDE) inhibitors are known to be effective for treating inflammatory diseases.
  • PDE4 inhibitors include N- (3,5-dichloropyrid-4-yl) -3-cyclopropylmethoxy-4-difluoromethoxybenzamide (also called roflumilast).
  • Patent Documents 1 to 3 are known as methods for producing roflumilast.
  • Non-Patent Document 1 discloses that N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide was produced, but Roflumilast Only Patent Document 3 and Non-Patent Document 2 that disclose the production method are cited, and specific methods, yields, and the like are not described (see Patent Document 3, Non-Patent Documents 1 and 2).
  • an object of the present invention is to provide a compound represented by formula (I) (N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide, “compound (I) is also provided in a high yield and high purity.
  • the present inventors have found a method for producing compound (I), which includes a step of obtaining compound (I) by reacting compound (II) with alkali metal salt (III).
  • X represents a halogen atom or a C 1-4 alkylcarbonyloxy group
  • M represents an alkali metal ion.
  • the method preferably includes reacting compound (IV) with an alkali metal hydride or alkali metal alkoxide to obtain an alkali metal salt (III).
  • a preferred alkali metal is sodium.
  • a new method for producing compound (I) can be provided. Moreover, according to the method of the present invention, compound (I) can be obtained in high yield and high purity.
  • One embodiment of the present invention is a method for producing compound (I), comprising the step of obtaining compound (I) by reacting compound (II) with alkali metal salt (III).
  • X represents a halogen atom or a C 1-4 alkylcarbonyloxy group
  • M represents an alkali metal ion.
  • This embodiment includes a step (step A) of reacting compound (II) with alkali metal salt (III) to obtain compound (I).
  • step A represents a halogen atom or a C 1-4 alkylcarbonyloxy group
  • M represents an alkali metal ion.
  • Compound (II) is a compound in which the carboxyl group of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid is more activated, and X in formula (II) represents a halogen atom or a C 1-6 alkylcarbonyloxy group. Show.
  • halogen atom examples include a fluorine atom, a chlorine atom and a bromine atom, and a preferred halogen atom is a chlorine atom.
  • the C 1-6 alkylcarbonyloxy group is a group in which a carbonyloxy group is bonded to an alkyl group having 1 to 6 carbon atoms.
  • Examples of the C 1-6 alkylcarbonyloxy group include acetyl group, propionyl group, butyryl group, 2-methylpropionyl group, pentanoyl group, 2-methylbutyryl group, 3-methylbutyryl group, pivaloyl group, hexanoyl group, 2-methyl Examples include a pentanoyl group, a 3-methylpentanoyl group, and a 4-methylpentanoyl group.
  • the alkali metal salt (III) is a salt composed of an anion obtained by deprotonation of the amine nitrogen of the compound (IV) and an alkali metal ion.
  • alkali metal examples include lithium, sodium and potassium.
  • the preferred alkali metal is sodium.
  • the number of moles of the alkali metal salt (III) used is preferably 1 to 10 times, and more preferably 1 to 3 times, based on the number of moles of the compound (II).
  • Process A is usually performed in a solvent.
  • the solvent should just be what does not inhibit reaction of the process A.
  • Examples of the solvent include dichloromethane, toluene, xylene, tetrahydrofuran, dimethylformamide, and N-methylpyrrolidone.
  • a preferred solvent is toluene or tetrahydrofuran.
  • alkali metal salt (III) or a solution thereof may be added to compound (II) or a solution thereof, and compound (II) or a solution thereof is added to alkali metal salt (III) or a solution thereof. May be.
  • Compound (II) or a solution thereof is preferably added to alkali metal salt (III) or a solution thereof.
  • the reaction temperature in step A is usually between 0 ° C. and the boiling point of the solvent used.
  • a preferable reaction temperature is 0 to 100 ° C., and a more preferable reaction temperature is 5 to 35 ° C.
  • the obtained compound (I) can be purified by a method that can be used by those skilled in the art in the field of organic chemistry.
  • This embodiment may further comprise preparing compound (II) from 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid (step B).
  • X represents a halogen atom or a C 1-4 alkylcarbonyloxy group.
  • Step B is a step for preparing compound (II) by adding an activator to a solution containing, for example, 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid and an organic solvent.
  • the activator is a reagent that activates the carboxyl group of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid.
  • Examples of the activator include thionyl chloride, oxalyl chloride, and pivaloyl chloride.
  • X in formula (II) is a chlorine atom
  • X in formula (II) is a pivaloyloxy group.
  • the amount of the activator is preferably 1 to 10 times, and more preferably 1 to 3 times, based on the number of moles of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid.
  • N, N-dimethylformamide is used to promote the reaction between 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid and the activator. It may be added.
  • the amount of DMF used may be 1 to 5% by weight or 1 to 3% by weight based on the weight of thionyl chloride.
  • the organic solvent may be any one that does not inhibit the reaction in the step B.
  • examples of the organic solvent include tetrahydrofuran, toluene, and xylene.
  • a preferred organic solvent is toluene.
  • the reaction temperature in Step B is usually 0 to 100 ° C., preferably 30 to 60 ° C.
  • the following method is used.
  • a catalytic amount of DMF is added, heated to 40-50 ° C., and then thionyl chloride is slowly added.
  • the resulting reaction mixture was stirred at 40-50 ° C., and after a specified time, the reaction mixture was concentrated under reduced pressure to give 3-cyclopropylmethoxy-4-difluoromethoxybenzoyl. Get the chloride.
  • the resulting 3-cyclopropylmethoxy-4-difluoromethoxybenzoyl chloride can be subjected to the next reaction without further purification.
  • the present embodiment may further include a step (step C) of preparing the alkali metal salt (III) by reacting the compound (IV) with an alkali metal hydride or an alkali metal alkoxide.
  • step C of preparing the alkali metal salt (III) by reacting the compound (IV) with an alkali metal hydride or an alkali metal alkoxide.
  • M represents an alkali metal ion.
  • alkali metal hydride examples include sodium hydride and potassium hydride.
  • the number of moles of alkali metal hydride is preferably 1 to 10 times greater, more preferably 1 to 3 times greater, based on the number of moles of compound (IV).
  • alkali metal alkoxide examples include sodium methoxide, sodium ethoxide, sodium propoxide, sodium n-butoxide, sodium t-butoxide, potassium methoxide, potassium ethoxide, potassium propoxide, potassium n-butoxide and potassium t- Butoxide is mentioned.
  • a preferred alkali metal alkoxide is sodium t-butoxide.
  • the number of moles of alkali metal alkoxide is preferably 1 to 10 times greater, more preferably 1 to 3 times greater, based on the number of moles of compound (IV).
  • Step C is preferably performed in a solvent.
  • Any solvent may be used as long as it does not inhibit the reaction in Step C, and examples thereof include tetrahydrofuran.
  • the reaction temperature in step C is preferably 0 to 45 ° C.
  • Step C for example, sodium hydride is added little by little at a temperature of 10 to 25 ° C. with stirring to a tetrahydrofuran solution of Compound (IV).
  • deprotonation of compound (IV) can proceed under mild conditions, and a salt of compound (IV) and sodium ion can be prepared.
  • Compound (IV) can be prepared from 4-cyano-3,5-dichloropyridine by the method described in Non-Patent Document 3, for example.
  • This embodiment may further comprise preparing compound (IV) by reacting readily available 4-amino-3,5-dichloropyridine with a methylating agent in the presence of a base (step D). Good.
  • Examples of the base include alkali metal hydrides and alkali metal alkoxides. Specific examples of the base include sodium hydride, potassium hydride, sodium methoxide, sodium ethoxide, sodium propoxide, sodium n-butoxide, sodium t-butoxide, potassium methoxide, potassium ethoxide, potassium propoxide, potassium n-butoxide, potassium t-butoxide and the like.
  • a preferred base is sodium hydride or potassium t-butoxide.
  • the number of moles of the base is preferably 1 to 10 times greater, more preferably 1 to 3 times greater, based on the number of moles of 4-amino-3,5-dichloropyridine.
  • methylating agent examples include halogenated methane such as iodomethane and bromomethane, and dimethyl sulfate. Preferred methylating agents are iodomethane or dimethyl sulfate.
  • the number of moles of the methylating agent is preferably 1 to 10 times, and more preferably 1 to 3 times, based on the number of moles of 4-amino-3,5-dichloropyridine.
  • Step D is preferably performed in an organic solvent.
  • the organic solvent should just be what does not inhibit a monomethylation reaction.
  • examples of the organic solvent include tetrahydrofuran, dimethylformamide, dimethyl sulfoxide, and N-methylpyrrolidone.
  • a preferred organic solvent is tetrahydrofuran.
  • step D is, for example, the following methods. 4-Amino-3,5-dichloropyridine is dissolved in tetrahydrofuran, potassium t-butoxide is slowly added with stirring, further iodomethane is added, and the resulting reaction mixture is stirred at 5-15 ° C. for 2 hours. Water and isopropyl acetate are added to the reaction mixture and stirred, and then the organic layer is separated. The organic layer is washed successively with water and saturated brine, and the organic layer is concentrated.
  • Compound (I) is excellent in water solubility and transdermal absorbability, and is rapidly converted into roflumilast in vivo.
  • Compound (I) can exert effects that can be expected by administration of roflumilast. That is, by administering the compound or a pharmaceutical composition containing the compound, acute and chronic (especially performance and allergen-induced) airway diseases (eg, bronchitis, allergic bronchitis, bronchial asthma, Emphysema, chronic obstructive pulmonary disease (COPD), proliferative, inflammatory or allergic skin diseases (eg psoriasis (eg psoriasis vulgaris), toxic and allergic contact dermatitis, atopic dermatitis, Seborrheic dermatitis, lichen planus, sunburn, pruritus in the genital area, alopecia, hypertrophic scar, discoid lupus erythematosus, follicular and pervasive pyoderma, intrinsic and extrinsic acne, Tadpole So and other proliferative, inflammatory and allergic skin diseases), diseases based on excessive release of TNF
  • the obtained solid was suspended in 22.4 g of an aqueous sodium hydroxide solution having a pH of 10 and stirred for 30 minutes.
  • the obtained solid was collected by filtration, washed with water, and dried under reduced pressure to give 3.54 g (yield 62%, purity 99.4%) of crude crystals of the title compound.
  • the obtained crude crystals (3.00 g) were recrystallized from hydrous isopropyl alcohol to obtain 2.14 g (recovery: 71%, purity: 99.8%) of the title compound.

Abstract

The present invention provides a method for producing a compound represented by formula (I), which comprises a step for obtaining a compound represented by formula (I) by reacting a compound represented by formula (II) and an alkali metal salt represented by formula (III) with each other. (In the formulae, X represents a halogen atom or a C1-4 alkyl carbonyloxy group; and M represents an alkali metal ion.)

Description

N-(3,5-ジクロロピリド-4-イル)-N-メチル-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミドの製造方法Process for producing N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide
 本発明は、N-(3,5-ジクロロピリド-4-イル)-N-メチル-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミドの製造方法に関する。 The present invention relates to a process for producing N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide.
 ホスホジエステラーゼ(PDE)阻害剤は、炎症性疾患を治療するために有効であることが知られている。特に、PDE4阻害剤は、喘息又は気道閉塞(例えば、COPD=慢性閉塞性肺疾患)等の気道の炎症性疾患の治療に有効である。PDE4阻害剤としては、N-(3,5-ジクロロピリド-4-イル)-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミド(ロフルミラストとも呼ばれる。)が挙げられる。ロフルミラストの製造方法としては、特許文献1~3が知られている。 Phosphodiesterase (PDE) inhibitors are known to be effective for treating inflammatory diseases. In particular, PDE4 inhibitors are effective in the treatment of inflammatory diseases of the respiratory tract such as asthma or airway obstruction (eg, COPD = chronic obstructive pulmonary disease). PDE4 inhibitors include N- (3,5-dichloropyrid-4-yl) -3-cyclopropylmethoxy-4-difluoromethoxybenzamide (also called roflumilast). Patent Documents 1 to 3 are known as methods for producing roflumilast.
国際公開第95/01338号International Publication No. 95/01338 国際公開第1994/002465International Publication No. 1994/002465 国際公開第2004/080967号International Publication No. 2004/080967 国際公開第2016/063906号International Publication No. 2016/063906
 本発明者らは、N-(3,5-ジクロロピリド-4-イル)-N-メチル-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミド等の化合物がロフルミラストのプロドラッグとして有用であり、優れた皮膚透過性を有することを見出した(特許文献4参照)。 The present inventors have found that compounds such as N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide are useful as prodrugs for roflumilast, It was found to have skin permeability (see Patent Document 4).
 しかしながら、ロフルミラストを原料としてN-(3,5-ジクロロピリド-4-イル)-N-メチル-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミドを製造するためには、高価なロフルミラストを購入する必要がある。また、未反応のロフルミラストを除去することが困難であるという問題もある。 However, in order to produce N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide using roflumilast as a raw material, it is necessary to purchase expensive roflumilast. is there. There is also a problem that it is difficult to remove unreacted roflumilast.
 一方、非特許文献1では、N-(3,5-ジクロロピリド-4-イル)-N-メチル-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミドを製造したことを開示しているものの、ロフルミラストの製造方法を開示する特許文献3及び非特許文献2を引用しているのみであり、具体的な方法及び収率等は記載されていない(特許文献3、非特許文献1~2参照)。 On the other hand, Non-Patent Document 1 discloses that N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide was produced, but Roflumilast Only Patent Document 3 and Non-Patent Document 2 that disclose the production method are cited, and specific methods, yields, and the like are not described (see Patent Document 3, Non-Patent Documents 1 and 2).
 そこで、本発明の目的は、式(I)で表される化合物(N-(3,5-ジクロロピリド-4-イル)-N-メチル-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミド、「化合物(I)」ともいう。)を高収率かつ高純度で製造する方法を提供することである。 Accordingly, an object of the present invention is to provide a compound represented by formula (I) (N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide, “compound (I) is also provided in a high yield and high purity.
 本発明者らは、化合物(II)とアルカリ金属塩(III)とを反応させて化合物(I)を得る工程を含む、化合物(I)の製造方法を見出した。
Figure JPOXMLDOC01-appb-C000003
[式中、Xがハロゲン原子又はC1-4アルキルカルボニルオキシ基を示し、Mがアルカリ金属イオンを示す。]
The present inventors have found a method for producing compound (I), which includes a step of obtaining compound (I) by reacting compound (II) with alkali metal salt (III).
Figure JPOXMLDOC01-appb-C000003
[Wherein, X represents a halogen atom or a C 1-4 alkylcarbonyloxy group, and M represents an alkali metal ion. ]
 上記方法は、化合物(IV)と、アルカリ金属水素化物又はアルカリ金属アルコキシドとを反応させてアルカリ金属塩(III)を得ることを含むことが好ましい。好ましいアルカリ金属は、ナトリウムである。
Figure JPOXMLDOC01-appb-C000004
The method preferably includes reacting compound (IV) with an alkali metal hydride or alkali metal alkoxide to obtain an alkali metal salt (III). A preferred alkali metal is sodium.
Figure JPOXMLDOC01-appb-C000004
 本発明によれば、新たな化合物(I)の製造方法を提供することができる。また、本発明の方法によれば、化合物(I)を高収率かつ高純度で得ることができる。 According to the present invention, a new method for producing compound (I) can be provided. Moreover, according to the method of the present invention, compound (I) can be obtained in high yield and high purity.
 本発明の一実施形態は、化合物(II)とアルカリ金属塩(III)とを反応させて化合物(I)を得る工程を含む、化合物(I)の製造方法である。式中、Xがハロゲン原子又はC1-4アルキルカルボニルオキシ基を示し、Mがアルカリ金属イオンを示す。
Figure JPOXMLDOC01-appb-C000005
One embodiment of the present invention is a method for producing compound (I), comprising the step of obtaining compound (I) by reacting compound (II) with alkali metal salt (III). In the formula, X represents a halogen atom or a C 1-4 alkylcarbonyloxy group, and M represents an alkali metal ion.
Figure JPOXMLDOC01-appb-C000005
 本実施形態は、化合物(II)とアルカリ金属塩(III)とを反応させて化合物(I)を得る工程(工程A)を含む。式中、Xがハロゲン原子又はC1-4アルキルカルボニルオキシ基を示し、Mがアルカリ金属イオンを示す。
Figure JPOXMLDOC01-appb-C000006
This embodiment includes a step (step A) of reacting compound (II) with alkali metal salt (III) to obtain compound (I). In the formula, X represents a halogen atom or a C 1-4 alkylcarbonyloxy group, and M represents an alkali metal ion.
Figure JPOXMLDOC01-appb-C000006
 化合物(II)は、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸のカルボキシル基がより活性化された化合物であり、式(II)におけるXはハロゲン原子又はC1-6アルキルカルボニルオキシ基を示す。 Compound (II) is a compound in which the carboxyl group of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid is more activated, and X in formula (II) represents a halogen atom or a C 1-6 alkylcarbonyloxy group. Show.
 ハロゲン原子としては、例えば、フッ素原子、塩素原子及び臭素原子が挙げられ、好ましいハロゲン原子は塩素原子である。 Examples of the halogen atom include a fluorine atom, a chlorine atom and a bromine atom, and a preferred halogen atom is a chlorine atom.
 C1-6アルキルカルボニルオキシ基は、炭素数1~6のアルキル基にカルボニルオキシ基が結合した基である。C1-6アルキルカルボニルオキシ基としては、例えば、アセチル基、プロピオニル基、ブチリル基、2-メチルプロピオニル基、ペンタノイル基、2-メチルブチリル基、3-メチルブチリル基、ピバロイル基、ヘキサノイル基、2-メチルペンタノイル基、3-メチルペンタノイル基及び4-メチルペンタノイル基が挙げられる。 The C 1-6 alkylcarbonyloxy group is a group in which a carbonyloxy group is bonded to an alkyl group having 1 to 6 carbon atoms. Examples of the C 1-6 alkylcarbonyloxy group include acetyl group, propionyl group, butyryl group, 2-methylpropionyl group, pentanoyl group, 2-methylbutyryl group, 3-methylbutyryl group, pivaloyl group, hexanoyl group, 2-methyl Examples include a pentanoyl group, a 3-methylpentanoyl group, and a 4-methylpentanoyl group.
 アルカリ金属塩(III)は、化合物(IV)のアミン窒素が脱プロトン化して得られるアニオンと、アルカリ金属イオンとからなる塩である。 The alkali metal salt (III) is a salt composed of an anion obtained by deprotonation of the amine nitrogen of the compound (IV) and an alkali metal ion.
 アルカリ金属としては、例えば、リチウム、ナトリウム及びカリウムが挙げられる。好ましいアルカリ金属はナトリウムである。 Examples of the alkali metal include lithium, sodium and potassium. The preferred alkali metal is sodium.
 使用されるアルカリ金属塩(III)のモル数は、化合物(II)のモル数を基準として、1~10倍多いことが好ましく、1~3倍多いことがより好ましい。 The number of moles of the alkali metal salt (III) used is preferably 1 to 10 times, and more preferably 1 to 3 times, based on the number of moles of the compound (II).
 工程Aは通常、溶剤中で行う。溶剤は、工程Aの反応を阻害しないものであればよい。溶剤としては、例えば、ジクロロメタン、トルエン、キシレン、テトラヒドロフラン、ジメチルホルムアミド及びN-メチルピロリドンが挙げられる。好ましい溶剤は、トルエン又はテトラヒドロフランである。 Process A is usually performed in a solvent. The solvent should just be what does not inhibit reaction of the process A. Examples of the solvent include dichloromethane, toluene, xylene, tetrahydrofuran, dimethylformamide, and N-methylpyrrolidone. A preferred solvent is toluene or tetrahydrofuran.
 工程Aは、化合物(II)又はその溶液に、アルカリ金属塩(III)又はその溶液を添加してもよく、アルカリ金属塩(III)又はその溶液に、化合物(II)又はその溶液を添加してもよい。アルカリ金属塩(III)又はその溶液に、化合物(II)又はその溶液を添加することが好ましい。 In step A, alkali metal salt (III) or a solution thereof may be added to compound (II) or a solution thereof, and compound (II) or a solution thereof is added to alkali metal salt (III) or a solution thereof. May be. Compound (II) or a solution thereof is preferably added to alkali metal salt (III) or a solution thereof.
 工程Aの反応温度は通常、0℃から、使用される溶剤の沸点の間の温度である。好ましい反応温度は0~100℃であり、より好ましい反応温度は5~35℃である。 The reaction temperature in step A is usually between 0 ° C. and the boiling point of the solvent used. A preferable reaction temperature is 0 to 100 ° C., and a more preferable reaction temperature is 5 to 35 ° C.
 得られた化合物(I)は、有機化学の分野で当業者に使用され得る方法により精製することができる。 The obtained compound (I) can be purified by a method that can be used by those skilled in the art in the field of organic chemistry.
 本実施形態は、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸から化合物(II)を調製すること(工程B)をさらに含んでもよい。式中、Xはハロゲン原子又はC1-4アルキルカルボニルオキシ基を示す。
Figure JPOXMLDOC01-appb-C000007
This embodiment may further comprise preparing compound (II) from 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid (step B). In the formula, X represents a halogen atom or a C 1-4 alkylcarbonyloxy group.
Figure JPOXMLDOC01-appb-C000007
 工程Bは、例えば、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸及び有機溶剤を含有する溶液に、活性化剤を添加して化合物(II)を調製する工程である。 Step B is a step for preparing compound (II) by adding an activator to a solution containing, for example, 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid and an organic solvent.
 活性化剤は、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸のカルボキシル基を活性化する試薬である。活性化剤としては、例えば、塩化チオニル、塩化オキサリル、塩化ピバロイルが挙げられる。活性化剤が塩化チオニル又は塩化オキサリルである場合、式(II)におけるXは、塩素原子であり、活性化剤が塩化ピバロイルである場合、式(II)におけるXは、ピバロイルオキシ基である。 The activator is a reagent that activates the carboxyl group of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid. Examples of the activator include thionyl chloride, oxalyl chloride, and pivaloyl chloride. When the activator is thionyl chloride or oxalyl chloride, X in formula (II) is a chlorine atom, and when the activator is pivaloyl chloride, X in formula (II) is a pivaloyloxy group.
 活性化剤の量は、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸のモル数を基準として、1~10倍多いことが好ましく、1~3倍多いことがより好ましい。 The amount of the activator is preferably 1 to 10 times, and more preferably 1 to 3 times, based on the number of moles of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid.
 活性化剤が塩化チオニル又は塩化オキサリルである場合には、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸と活性化剤との反応を促進するために、N,N-ジメチルホルムアミド(DMF)を添加してもよい。使用されるDMFの量は、塩化チオニルの質量を基準として、1~5質量%であってもよく、1~3質量%であってもよい。DMFを添加することにより、塩素原子又はシクロプロピルメチル基が脱離した化合物等の副生成物の生成を抑制できる傾向がある。 When the activator is thionyl chloride or oxalyl chloride, N, N-dimethylformamide (DMF) is used to promote the reaction between 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid and the activator. It may be added. The amount of DMF used may be 1 to 5% by weight or 1 to 3% by weight based on the weight of thionyl chloride. By adding DMF, the production of by-products such as compounds from which chlorine atoms or cyclopropylmethyl groups are eliminated tends to be suppressed.
 有機溶剤は、工程Bの反応を阻害しないものであればよい。有機溶剤としては、例えば、テトラヒドロフラン、トルエン及びキシレンが挙げられる。好ましい有機溶剤は、トルエンである。 The organic solvent may be any one that does not inhibit the reaction in the step B. Examples of the organic solvent include tetrahydrofuran, toluene, and xylene. A preferred organic solvent is toluene.
 工程Bの反応温度は通常、0~100℃であり、30~60℃であることが好ましい。 The reaction temperature in Step B is usually 0 to 100 ° C., preferably 30 to 60 ° C.
 工程Bの具体例としては、以下の方法である。3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸のトルエン溶液に、触媒量のDMFを添加し、40~50℃に加熱した後、塩化チオニルをゆっくりと添加する。塩化チオニルを添加した後、得られた反応混合物を40~50℃にて撹拌し、特定の時間が経過した後、反応混合物を減圧下、濃縮して3-シクロプロピルメトキシ-4-ジフルオロメトキシベンゾイルクロリドを得る。得られた3-シクロプロピルメトキシ-4-ジフルオロメトキシベンゾイルクロリドは、更なる精製を行わずに次の反応に供することができる。 As a specific example of the process B, the following method is used. To a toluene solution of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid, a catalytic amount of DMF is added, heated to 40-50 ° C., and then thionyl chloride is slowly added. After the thionyl chloride was added, the resulting reaction mixture was stirred at 40-50 ° C., and after a specified time, the reaction mixture was concentrated under reduced pressure to give 3-cyclopropylmethoxy-4-difluoromethoxybenzoyl. Get the chloride. The resulting 3-cyclopropylmethoxy-4-difluoromethoxybenzoyl chloride can be subjected to the next reaction without further purification.
 本実施形態は、化合物(IV)とアルカリ金属水素化物又はアルカリ金属アルコキシドとを反応させてアルカリ金属塩(III)を調製する工程(工程C)をさらに含んでもよい。式中、Mはアルカリ金属イオンを示す。
Figure JPOXMLDOC01-appb-C000008
The present embodiment may further include a step (step C) of preparing the alkali metal salt (III) by reacting the compound (IV) with an alkali metal hydride or an alkali metal alkoxide. In the formula, M represents an alkali metal ion.
Figure JPOXMLDOC01-appb-C000008
 アルカリ金属水素化物としては、例えば、水素化ナトリウム、水素化カリウムが挙げられる。アルカリ金属水素化物のモル数は、化合物(IV)のモル数を基準として、1~10倍多いことが好ましく、1~3倍多いことがより好ましい。 Examples of the alkali metal hydride include sodium hydride and potassium hydride. The number of moles of alkali metal hydride is preferably 1 to 10 times greater, more preferably 1 to 3 times greater, based on the number of moles of compound (IV).
 アルカリ金属アルコキシドとしては、例えば、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムプロポキシド、ナトリウムn-ブトキシド、ナトリウムt-ブトキシド、カリウムメトキシド、カリウムエトキシド、カリウムプロポキシド、カリウムn-ブトキシド及びカリウムt-ブトキシドが挙げられる。好ましいアルカリ金属アルコキシドは、ナトリウムt-ブトキシドである。アルカリ金属アルコキシドのモル数は、化合物(IV)のモル数を基準として、1~10倍多いことが好ましく、1~3倍多いことがより好ましい。 Examples of the alkali metal alkoxide include sodium methoxide, sodium ethoxide, sodium propoxide, sodium n-butoxide, sodium t-butoxide, potassium methoxide, potassium ethoxide, potassium propoxide, potassium n-butoxide and potassium t- Butoxide is mentioned. A preferred alkali metal alkoxide is sodium t-butoxide. The number of moles of alkali metal alkoxide is preferably 1 to 10 times greater, more preferably 1 to 3 times greater, based on the number of moles of compound (IV).
 工程Cは、溶剤中で行うことが好ましい。溶剤としては、工程Cの反応を阻害しないものであればよく、例えば、テトラヒドロフランが挙げられる。 Step C is preferably performed in a solvent. Any solvent may be used as long as it does not inhibit the reaction in Step C, and examples thereof include tetrahydrofuran.
 工程Cの反応温度は、0~45℃であることが好ましい。 The reaction temperature in step C is preferably 0 to 45 ° C.
 工程Cの具体例としては、例えば、化合物(IV)のテトラヒドロフラン溶液に、撹拌しながら、水素化ナトリウムを10~25℃の温度で少量ずつ添加する方法である。この方法によれば、穏やかな条件で化合物(IV)の脱プロトン化を進行させることができ、化合物(IV)とナトリウムイオンとの塩を調製することができる。 As a specific example of Step C, for example, sodium hydride is added little by little at a temperature of 10 to 25 ° C. with stirring to a tetrahydrofuran solution of Compound (IV). According to this method, deprotonation of compound (IV) can proceed under mild conditions, and a salt of compound (IV) and sodium ion can be prepared.
 化合物(IV)は、例えば、非特許文献3に記載の方法により4-シアノ-3,5-ジクロロピリジンから調製することができる。 Compound (IV) can be prepared from 4-cyano-3,5-dichloropyridine by the method described in Non-Patent Document 3, for example.
 本実施形態は、塩基の存在下、容易に入手可能な4-アミノ-3,5-ジクロロピリジンとメチル化剤とを反応させて化合物(IV)を調製すること(工程D)をさらに含んでもよい。
Figure JPOXMLDOC01-appb-C000009
This embodiment may further comprise preparing compound (IV) by reacting readily available 4-amino-3,5-dichloropyridine with a methylating agent in the presence of a base (step D). Good.
Figure JPOXMLDOC01-appb-C000009
 塩基としては、例えば、アルカリ金属水素化物、アルカリ金属アルコキシドが挙げられる。塩基の具体例としては、水素化ナトリウム、水素化カリウム、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムプロポキシド、ナトリウムn-ブトキシド、ナトリウムt-ブトキシド、カリウムメトキシド、カリウムエトキシド、カリウムプロポキシド、カリウムn-ブトキシド、カリウムt-ブトキシド等である。好ましい塩基は、水素化ナトリウムまたはカリウムt-ブトキシドである。塩基のモル数は、4-アミノ-3,5-ジクロロピリジンのモル数を基準として、1~10倍多いことが好ましく、1~3倍多いことがより好ましい。 Examples of the base include alkali metal hydrides and alkali metal alkoxides. Specific examples of the base include sodium hydride, potassium hydride, sodium methoxide, sodium ethoxide, sodium propoxide, sodium n-butoxide, sodium t-butoxide, potassium methoxide, potassium ethoxide, potassium propoxide, potassium n-butoxide, potassium t-butoxide and the like. A preferred base is sodium hydride or potassium t-butoxide. The number of moles of the base is preferably 1 to 10 times greater, more preferably 1 to 3 times greater, based on the number of moles of 4-amino-3,5-dichloropyridine.
 メチル化剤としては、例えば、ヨードメタン、ブロモメタン等のハロゲン化メタン、硫酸ジメチルが挙げられる。好ましいメチル化剤は、ヨードメタンまたは硫酸ジメチルである。メチル化剤のモル数は、4-アミノ-3,5-ジクロロピリジンのモル数を基準として、1~10倍多いことが好ましく、1~3倍多いことがより好ましい。 Examples of the methylating agent include halogenated methane such as iodomethane and bromomethane, and dimethyl sulfate. Preferred methylating agents are iodomethane or dimethyl sulfate. The number of moles of the methylating agent is preferably 1 to 10 times, and more preferably 1 to 3 times, based on the number of moles of 4-amino-3,5-dichloropyridine.
 工程Dは、有機溶剤中で行うことが好ましい。有機溶剤は、モノメチル化反応を阻害しないものであればよい。有機溶剤としては、例えば、テトラヒドロフラン、ジメチルホルムアミド、ジメチルスルホキシド、N-メチルピロリドンが挙げられる。好ましい有機溶剤は、テトラヒドロフランである。 Step D is preferably performed in an organic solvent. The organic solvent should just be what does not inhibit a monomethylation reaction. Examples of the organic solvent include tetrahydrofuran, dimethylformamide, dimethyl sulfoxide, and N-methylpyrrolidone. A preferred organic solvent is tetrahydrofuran.
 工程Dの好ましい条件としては、例えば、以下の方法である。4-アミノ-3,5-ジクロロピリジンをテトラヒドロフランに溶解し、撹拌しながらカリウムt-ブトキシドをゆっくりと加え、さらにヨードメタンを加え、得られた反応混合物を5~15℃で2時間撹拌する。反応混合物に水と酢酸イソプロピルを加えて、撹拌した後、有機層を分取する。有機層を水と飽和食塩水で順次洗浄し、有機層を濃縮する。この条件によれば、3,5-ジクロロ-4-(ジメチルアミノ)ピリジン、3,5-ジクロロ-1-メチル-4-(メチルアミノ)ピリジニウム等の副生成物の生成をより抑制することができ、より簡便な操作で高純度の化合物(IV)を得ることができる。化合物(IV)と類似の物性を有する上記副生成物の生成を抑制することにより、後の工程においてもより簡便な操作で高純度の化合物(I)を得ることができる。 Favorable conditions for step D are, for example, the following methods. 4-Amino-3,5-dichloropyridine is dissolved in tetrahydrofuran, potassium t-butoxide is slowly added with stirring, further iodomethane is added, and the resulting reaction mixture is stirred at 5-15 ° C. for 2 hours. Water and isopropyl acetate are added to the reaction mixture and stirred, and then the organic layer is separated. The organic layer is washed successively with water and saturated brine, and the organic layer is concentrated. According to this condition, the generation of by-products such as 3,5-dichloro-4- (dimethylamino) pyridine and 3,5-dichloro-1-methyl-4- (methylamino) pyridinium can be further suppressed. The compound (IV) with high purity can be obtained by a simpler operation. By suppressing the production of the by-product having physical properties similar to those of compound (IV), high-purity compound (I) can be obtained by a simpler operation in the subsequent steps.
 化合物(I)は、水溶性、経皮吸収性に優れ、生体内で速やかにロフルミラストに変換される。 Compound (I) is excellent in water solubility and transdermal absorbability, and is rapidly converted into roflumilast in vivo.
 化合物(I)は、ロフルミラストの投与によって期待されうる効果を発揮することができる。すなわち、当該化合物または当該化合物を含有する医薬組成物を投与することにより、急性及び慢性の(特に演奏性及びアレルゲンにより誘発された)気道疾患(例えば、気管支炎、アレルギー性気管支炎、気管支喘息、肺気腫、慢性閉塞性肺疾患(COPD))、増殖性、炎症性又はアレルギー性の皮膚疾患(例えば、乾癬(例えば、尋常性乾癬)、毒性及びアレルギー性の接触性皮膚炎、アトピー性皮膚炎、脂漏性皮膚炎、単純苔癬、日焼け、生殖肛門領域における掻痒、脱毛症、肥厚性瘢痕、円板状エリテマトーデス、濾胞性及び広汎性膿皮症、内因性及び外因性アクネ、酒土性座そう及びその他の増殖性、炎症性及びアレルギー性皮膚疾患)、ロイコトリエンによるTNFの過剰放出に基づく疾患(例えば、リウマチ性関節炎、リウマチ性脊椎炎、変形性関節炎及びその他の関節性症状)、免疫系疾患(例えば、AIDS、多発性硬化症)、ショック(例えば、敗血症性ショック、内毒素性ショック、グラム陰性セプシス、毒素ショック症候群及びARDS(成人呼吸障害症候群))、胃腸領域における広汎性炎症(例えば、クローン病、潰瘍性大腸炎)、上気道領域(咽頭腔、鼻)及びその隣接領域(副鼻腔、眼)におけるアレルギー性及び/又は慢性異常免疫反応に基づく疾患(例えば、アレルギー性鼻炎、アレルギー性副鼻腔炎、慢性鼻炎、慢性副鼻腔炎、アレルギー性結膜炎、鼻ポリープ)、並びにPDE阻害剤により治療しうる疾患(例えば、心不全等の心臓疾患、勃起障害、腎結石に関連した腎臓及び尿管の疝痛、うつ、動脈硬化性痴呆など)の疾患を治療又は予防することができる。 Compound (I) can exert effects that can be expected by administration of roflumilast. That is, by administering the compound or a pharmaceutical composition containing the compound, acute and chronic (especially performance and allergen-induced) airway diseases (eg, bronchitis, allergic bronchitis, bronchial asthma, Emphysema, chronic obstructive pulmonary disease (COPD), proliferative, inflammatory or allergic skin diseases (eg psoriasis (eg psoriasis vulgaris), toxic and allergic contact dermatitis, atopic dermatitis, Seborrheic dermatitis, lichen planus, sunburn, pruritus in the genital area, alopecia, hypertrophic scar, discoid lupus erythematosus, follicular and pervasive pyoderma, intrinsic and extrinsic acne, Tadpole So and other proliferative, inflammatory and allergic skin diseases), diseases based on excessive release of TNF by leukotrienes (eg rheumatoid arthritis, rheumatoid arthritis) Spondylitis, osteoarthritis and other arthritic conditions), immune system diseases (eg AIDS, multiple sclerosis), shocks (eg septic shock, endotoxic shock, gram-negative sepsis, toxic shock syndrome) And ARDS (Adult Respiratory Disorder Syndrome)), diffuse inflammation in the gastrointestinal region (eg, Crohn's disease, ulcerative colitis), allergic properties in the upper respiratory tract region (pharyngeal cavity, nose) and its adjacent regions (sinus sinus, eye) And / or diseases based on chronic abnormal immune responses (eg allergic rhinitis, allergic sinusitis, chronic rhinitis, chronic sinusitis, allergic conjunctivitis, nasal polyps) and diseases that can be treated with PDE inhibitors (eg Treatment of heart diseases such as heart failure, erectile dysfunction, kidney and ureteral colic associated with kidney stones, depression, arteriosclerotic dementia, etc. It can be preventing.
合成例1:3,5-ジクロロ-4-(メチルアミノ)ピリジンの調製
 アルゴン気流下、4-アミノ-3,5-ジクロロピリジン100g(613.5mmol)のテトラヒドロフラン862g(10.0v/w)溶液を8℃に冷却した後、カリウムt-ブトキシド103.54g(922.7mmol)を加え、30分撹拌した。反応混合物を4℃に冷却した後、ヨードメタン113.24g(797.8mmol)を滴下し、2時間撹拌した。ヨードメタン8.79g(61.9mmol)を滴下し、さらに2時間撹拌した。得られた反応混合物に、水501g(5.00v/w)及び酢酸イソプロピル430g(5.00v/w)を加え、6分撹拌した後、有機層を分取した。水層を酢酸イソプロピル255g(3.00v/w)で抽出した。合わせた有機層を水、20質量%食塩水で順次洗浄し、減圧下濃縮した。得られた残渣にn-ヘプタン50mLを加えた後、氷冷下、1時間撹拌した。析出した固体を濾過し、冷n-ヘプタン75mLで洗浄した。得られた固体を40℃にて通風乾燥し、3,5-ジクロロ-4-(メチルアミノ)ピリジンの粗精製物56.45g(収率52%)を黄褐色針状結晶として得た。
 アルゴン気流下、3,5-ジクロロ-4-(メチルアミノ)ピリジンの粗精製物43.3gのメタノール172g溶液を54℃に加熱し、水217gを加えて、40分かけて72℃まで加熱し、2時間かけて25℃まで撹拌しながら冷却した。溶液を25℃で更に2時間撹拌した。析出した固体を濾過し、含水メタノール(メタノール:水=1:2、容積比)で2回洗浄し、通風乾燥して、標題化合物37.15g(純度99.6%)を黄白色針状結晶として得た。
H-NMR(400MHz,CDCl) δ 3.32(d,J=7Hz,3H)、4.84(brs,1H)、8.15(s,2H).
Synthesis Example 1: Preparation of 3,5-dichloro-4- (methylamino) pyridine A solution of 862 g (10.0 v / w) of tetrahydrofuran in 100 g (613.5 mmol) of 4-amino-3,5-dichloropyridine under an argon stream After cooling to 8 ° C., 103.54 g (922.7 mmol) of potassium t-butoxide was added and stirred for 30 minutes. After the reaction mixture was cooled to 4 ° C., 113.24 g (797.8 mmol) of iodomethane was added dropwise and stirred for 2 hours. 8.79 g (61.9 mmol) of iodomethane was added dropwise, and the mixture was further stirred for 2 hours. To the obtained reaction mixture, 501 g (5.00 v / w) of water and 430 g (5.00 v / w) of isopropyl acetate were added and stirred for 6 minutes, and then the organic layer was separated. The aqueous layer was extracted with 255 g (3.00 v / w) of isopropyl acetate. The combined organic layers were washed successively with water and 20% by mass brine and concentrated under reduced pressure. After adding 50 mL of n-heptane to the obtained residue, the mixture was stirred for 1 hour under ice cooling. The precipitated solid was filtered and washed with 75 mL of cold n-heptane. The obtained solid was dried by ventilation at 40 ° C. to obtain 56.45 g (yield 52%) of a crude product of 3,5-dichloro-4- (methylamino) pyridine as tan needles.
A solution of 43.3 g of a crude product of 3,5-dichloro-4- (methylamino) pyridine in methanol and 172 g of methanol was heated to 54 ° C. under an argon stream, 217 g of water was added, and the mixture was heated to 72 ° C. over 40 minutes. Cooled with stirring to 25 ° C. over 2 hours. The solution was stirred at 25 ° C. for a further 2 hours. The precipitated solid was filtered, washed twice with water-containing methanol (methanol: water = 1: 2, volume ratio) and dried by ventilation to give 37.15 g (purity 99.6%) of the title compound as yellowish white needle-like crystals. Got as.
1 H-NMR (400 MHz, CDCl 3 ) δ 3.32 (d, J = 7 Hz, 3H), 4.84 (brs, 1H), 8.15 (s, 2H).
合成例2:3-シクロプロピルメトキシ-4-ジフルオロメトキシベンゾイルクロリドの調製
 アルゴン気流下、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸45.0g(174.3mmol)のトルエン238g(6.00v/w)溶液に、DMF0.43gを加え、塩化チオニル41.42g(348.6mmol)を滴下した。反応混合物を40℃に加熱し、2.5時間撹拌した。反応混合物を室温まで冷却し、減圧下濃縮した。得られた残渣は、テトラヒドロフラン200g(5.00v/w)を加えて、次の反応に供した。
Synthesis Example 2: Preparation of 3-cyclopropylmethoxy-4-difluoromethoxybenzoyl chloride Under an argon stream, 4-cyclopropylmethoxy-4-difluoromethoxybenzoic acid 45.0 g (174.3 mmol) of toluene 238 g (6.00 v / w) 0.43 g of DMF was added to the solution, and 41.42 g (348.6 mmol) of thionyl chloride was added dropwise. The reaction mixture was heated to 40 ° C. and stirred for 2.5 hours. The reaction mixture was cooled to room temperature and concentrated under reduced pressure. To the resulting residue, 200 g (5.00 v / w) of tetrahydrofuran was added and subjected to the next reaction.
合成例3:N-(3,5-ジクロロピリド-4-イル)-N-メチル-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミドの調製
 アルゴン気流下、3,5-ジクロロ-4-(メチルアミノ)ピリジン35.3g(199.4mmol)のテトラヒドロフラン355g(10.00v/w)溶液を、4℃に冷却し、水素化ナトリウム(含量63%、16.46g、433.7mmol)をゆっくりと加えて、約15℃を維持しながら1時間撹拌した。得られた反応混合物を9℃に冷却し、合成例2で調製した3-シクロプロピルメトキシ-4-ジフルオロメトキシベンゾイルクロリドのテトラヒドロフラン溶液(228g、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸40g(155mmol)相当)を80分かけて滴下した。滴下後、9℃から室温に昇温させながら、一晩撹拌した。
 得られた反応混合物に、35%塩酸40.2g、水401g(10.00v/w)及び酢酸エチル180g(5.00v/w)を加え、10℃にて50分間撹拌した。10w/w%炭酸カリウム水溶液200gを加え、18℃にて更に5分撹拌し、有機層を分取した。得られた有機層を10%食塩水200gで洗浄し、不溶物を濾過して酢酸エチル20mLで洗浄した後、減圧下濃縮した。得られた残渣を常法で精製し、標題化合物52.65g(収率82%、純度99.8%)を得た。
H-NMR(400MHz,CDCl) δ 0.32(m,2H)、0.63(m,2H)、1.20(m,1H)、3.31(s,3H)、3.76(d,2H)、6.57(t,1H)、6.90(dd,1H)、6.94(d,1H)、7.08(d,1H)、8.48(s,2H).
Synthesis Example 3: Preparation of N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide 3,5-dichloro-4- (methylamino) under an argon stream ) A solution of 35.3 g (199.4 mmol) of pyridine in 355 g (10.00 v / w) of tetrahydrofuran was cooled to 4 ° C., and sodium hydride (content 63%, 16.46 g, 433.7 mmol) was slowly added. The mixture was stirred for 1 hour while maintaining about 15 ° C. The obtained reaction mixture was cooled to 9 ° C. and a solution of 3-cyclopropylmethoxy-4-difluoromethoxybenzoyl chloride in tetrahydrofuran prepared in Synthesis Example 2 (228 g, 40 g of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid ( 155 mmol)) was added dropwise over 80 minutes. After dropping, the mixture was stirred overnight while the temperature was raised from 9 ° C to room temperature.
To the obtained reaction mixture, 40.2 g of 35% hydrochloric acid, 401 g (10.00 v / w) of water and 180 g (5.00 v / w) of ethyl acetate were added and stirred at 10 ° C. for 50 minutes. 200 g of 10 w / w% potassium carbonate aqueous solution was added, and the mixture was further stirred at 18 ° C. for 5 minutes to separate the organic layer. The obtained organic layer was washed with 200 g of 10% brine, the insoluble matter was filtered, washed with 20 mL of ethyl acetate, and then concentrated under reduced pressure. The obtained residue was purified by a conventional method to obtain 52.65 g (yield 82%, purity 99.8%) of the title compound.
1 H-NMR (400 MHz, CDCl 3 ) δ 0.32 (m, 2H), 0.63 (m, 2H), 1.20 (m, 1H), 3.31 (s, 3H), 3.76 (D, 2H), 6.57 (t, 1H), 6.90 (dd, 1H), 6.94 (d, 1H), 7.08 (d, 1H), 8.48 (s, 2H) .
 特許文献3に記載のロフルミラストの合成方法を参考にして、化合物(I)を製造した。具体的な方法を比較合成例1及び2として示す。 Compound (I) was produced with reference to the synthesis method of roflumilast described in Patent Document 3. Specific methods are shown as Comparative Synthesis Examples 1 and 2.
比較合成例1:3-シクロプロピルメトキシ-4-ジフルオロメトキシベンゾイルクロリドの調製
 窒素気流下、3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸3.5g(13.6mmol)のトルエン20mL溶液に、DMF36.8μLを加えた後、塩化チオニル2.42g(20.3mmol)を滴下した。滴下後、反応混合物を75℃に加熱し、2.5時間撹拌した。反応混合物を室温まで冷却し、減圧下濃縮した。得られた残渣にDMF8mLを加えて、次の反応に供した。
Comparative Synthesis Example 1: Preparation of 3-cyclopropylmethoxy-4-difluoromethoxybenzoyl chloride Under a nitrogen stream, DMF36 was added to a 20 mL toluene solution of 3.5 g (13.6 mmol) 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid. After adding .8 μL, 2.42 g (20.3 mmol) of thionyl chloride was added dropwise. After the addition, the reaction mixture was heated to 75 ° C. and stirred for 2.5 hours. The reaction mixture was cooled to room temperature and concentrated under reduced pressure. To the obtained residue, 8 mL of DMF was added and subjected to the next reaction.
比較合成例2:N-(3,5-ジクロロピリド-4-イル)-N-メチル-3-シクロプロピルメトキシ-4-ジフルオロメトキシベンズアミドの調製
 窒素気流下、4-メチルアミノ-3,5-ジクロロピリジン5.27g(29.8mmol)をDMF(32.4mL)に溶解し、18~30℃で、カリウムtert-ブトキシド3.33g(29.8mmol)を徐々に加えた。得られた反応混合物に、23~30℃で、3-シクロプロピルメトキシ-4-ジフルオロメトキシベンゾイルクロリドのDMF溶液12.1g(3-シクロプロピルメトキシ-4-ジフルオロメトキシ安息香酸3.5g、13.6mmolに相当)を75分間かけて滴下した。滴下後、反応混合物を室温で2時間撹拌した。反応混合物に、水17.5mLを滴下し、濃塩酸を加えてpH2になるように調整した。室温で2日間放置後、析出した固体を濾取し、水で洗浄した。得られた固体をpH10の水酸化ナトリウム水溶液22.4gに懸濁させ30分間撹拌した。得られた固体を濾取し、水で洗浄後、減圧下乾燥して3.54g(収率62%、純度99.4%)の標題化合物の粗結晶を得た。得られた粗結晶3.00gを含水イソプロピルアルコールより再結晶して2.14g(回収率71%、純度99.8%)の標題化合物を得た。
Comparative Synthesis Example 2: Preparation of N- (3,5-dichloropyrid-4-yl) -N-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide Under a nitrogen stream, 4-methylamino-3,5-dichloro Pyridine 5.27 g (29.8 mmol) was dissolved in DMF (32.4 mL), and potassium tert-butoxide 3.33 g (29.8 mmol) was gradually added at 18-30 ° C. To the obtained reaction mixture, at 23 to 30 ° C., 12.1 g of a DMF solution of 3-cyclopropylmethoxy-4-difluoromethoxybenzoyl chloride (3.5 g of 3-cyclopropylmethoxy-4-difluoromethoxybenzoic acid, 13. 6 equivalents) was added dropwise over 75 minutes. After the addition, the reaction mixture was stirred at room temperature for 2 hours. To the reaction mixture, 17.5 mL of water was added dropwise, and concentrated hydrochloric acid was added to adjust to pH 2. After standing at room temperature for 2 days, the precipitated solid was collected by filtration and washed with water. The obtained solid was suspended in 22.4 g of an aqueous sodium hydroxide solution having a pH of 10 and stirred for 30 minutes. The obtained solid was collected by filtration, washed with water, and dried under reduced pressure to give 3.54 g (yield 62%, purity 99.4%) of crude crystals of the title compound. The obtained crude crystals (3.00 g) were recrystallized from hydrous isopropyl alcohol to obtain 2.14 g (recovery: 71%, purity: 99.8%) of the title compound.
 本実施形態に係る化合物(I)の製造方法によれば、特許文献3に記載のロフルミラストの製造方法に準じて化合物(I)を製造した場合と比較して、高収率(収率82%)かつ高純度(純度99.8%)で化合物(I)を得ることができるため、産業上有用である。 According to the method for producing compound (I) according to this embodiment, compared to the case of producing compound (I) according to the method for producing roflumilast described in Patent Document 3, a high yield (82% yield). ) And high purity (purity 99.8%), the compound (I) can be obtained, which is industrially useful.

Claims (4)

  1.  式(II)で表される化合物と式(III)で表されるアルカリ金属塩とを反応させて式(I)で表される化合物を得る工程を含む、式(I)で表される化合物の製造方法。
    Figure JPOXMLDOC01-appb-C000001
    [式中、Xがハロゲン原子又はC1-4アルキルカルボニルオキシ基を示し、Mがアルカリ金属イオンを示す。]
    A compound represented by formula (I), comprising a step of obtaining a compound represented by formula (I) by reacting a compound represented by formula (II) with an alkali metal salt represented by formula (III) Manufacturing method.
    Figure JPOXMLDOC01-appb-C000001
    [Wherein, X represents a halogen atom or a C 1-4 alkylcarbonyloxy group, and M represents an alkali metal ion. ]
  2.  式(IV)で表される化合物と、アルカリ金属水素化物又はアルカリ金属アルコキシドとを反応させて式(III)で表されるアルカリ金属塩を得ることを含む、請求項1に記載の方法。
    Figure JPOXMLDOC01-appb-C000002
    The method according to claim 1, comprising reacting a compound represented by the formula (IV) with an alkali metal hydride or an alkali metal alkoxide to obtain an alkali metal salt represented by the formula (III).
    Figure JPOXMLDOC01-appb-C000002
  3.  アルカリ金属がナトリウムである、請求項1又は2に記載の方法。 The method according to claim 1 or 2, wherein the alkali metal is sodium.
  4.  Xがハロゲン原子である、請求項1~3のいずれか一項に記載の方法。 The method according to any one of claims 1 to 3, wherein X is a halogen atom.
PCT/JP2017/023772 2016-07-01 2017-06-28 Method for producing n-(3,5-dichloropyrid-4-yl)-n-methyl-3-cyclopropylmethoxy-4-difluoromethoxybenzamide WO2018003867A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006519818A (en) * 2003-03-10 2006-08-31 アルタナ ファルマ アクチエンゲゼルシャフト New method for manufacturing roflumilast
CN103497150A (en) * 2013-10-12 2014-01-08 国药集团致君(苏州)制药有限公司 Refining method for high-purity roflumilast
WO2016063906A1 (en) * 2014-10-24 2016-04-28 久光製薬株式会社 Prodrug

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006519818A (en) * 2003-03-10 2006-08-31 アルタナ ファルマ アクチエンゲゼルシャフト New method for manufacturing roflumilast
CN103497150A (en) * 2013-10-12 2014-01-08 国药集团致君(苏州)制药有限公司 Refining method for high-purity roflumilast
WO2016063906A1 (en) * 2014-10-24 2016-04-28 久光製薬株式会社 Prodrug

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
XIANG, Z-J. ET AL.: "Synthesis and polymorphic study of roflumilast N-oxide", JOURNAL OF CHINA PHARMACEUTICAL UNIVERSITY, vol. 43, no. 6, 2012, pages 492 - 496 *

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