WO2017127859A1

WO2017127859A1 - Method for depositing a layer on a sliding bearing element blank

Info

Publication number: WO2017127859A1
Application number: PCT/AT2017/060012
Authority: WO
Inventors: Johann Nagl
Original assignee: Miba Gleitlager Austria Gmbh
Priority date: 2016-01-28
Filing date: 2017-01-27
Publication date: 2017-08-03
Also published as: AT517717B1; AT517717A4

Abstract

The invention relates to a method for depositing a layer on a sliding bearing element blank (6) from the gas phase in a process gas, according to which the layer of at least one target (9), which comprises or consists of a metal combination with a metallic base element, is produced by at least partially atomizing the target (9) and subsequently depositing the atomized target components on the sliding bearing element blank (6). According to the invention, a target (9) is used, which has at least a fine-grain ingredient in the form of a gas and/or a chemical compound of said gas and/or wherein a process gas is used, to which the fine-grain gas is added.

Description

Method for depositing a layer on a plain bearing element blank

The invention relates to a method for depositing a layer on a Gleitlagerele- ment blank from the gas phase in a process gas, according to which the layer of one or more targets, which or comprises a metal combination with a metallic base member or consists thereof, by at least partial sputtering of the target and then depositing the atomized target components on the slide bearing blank.

Furthermore, the invention relates to the application of the method.

In addition, the invention relates to a target for depositing a layer on a slide bearing blank of the gas phase comprising a sintered composition of metallic see components or a target for depositing a layer on a Gleitlagerele- ment blank from the gas phase comprising a composition of metallic components.

Coarse grained sputtered layers tend to have increased layer wear, high diffusion and loss of hardness under the influence of heat, especially when they are tin-based. The rough

Structure also leads to the formation of cracks and fatigue fractures under load. Therefore, efforts have been made in the prior art to reduce the coarseness of the sputtered layers. In this case, the addition of grain-refining elements has proved to be an effective means, as is customary for alloys, if this property is desired. The grain refining elements are usually metals. Such a method is described, for example, in WO 2009/046476 Al, according to which on a support element a sliding layer by vapor deposition, optionally after the arrangement of at least one intermediate layer is produced, wherein the sliding layer comprises an aluminum matrix, in addition to aluminum bismuth as the main component and optionally copper are included. The grain-refining metal should have a melting point that is at least 950 ° C higher than that of bismuth. However, the grain refining can also be achieved by increasing the bismuth germ density by applying a bias voltage to the support element. The coarseness of the sputtering layer can also have positive properties. The concomitant lower hardness gives the sliding bearing element thus provided better adaptation properties in the running-in phase of the sliding bearing.

The present invention has for its object to improve the property profile of a sliding bearing element, which is provided with a layer produced by a vapor deposition method. This object of the invention is achieved with the method mentioned, in which at least one target is used which has at least one grain-refining constituent in the form of a gas and / or a chemical compound of this gas and / or in which a process gas is used, which is the grain-refining gas is added. Furthermore, the object of the invention is achieved in that the layer deposited from the gas phase is used for smoothing the surface of a sliding bearing blank or a sliding bearing element.

Finally, the object of the invention is achieved by a target which can be used in said process and in which gas-filled cavities are formed in the sintering composition or in which the composition of the target comprises at least one chemical compound of a metal and a gas.

The advantage here is that deposited by a relatively simple intervention in the process flow from the gas phase layers can be generated, which are coarser in the area of the tread, ie that surface which is in sliding contact with another component, and in the field the further layer underlying this layer is more fine-grained relative to the coarse-grained region of the layer. On the one hand, this improves or even maintains the improved ability to run in of the slide bearing element produced therewith. On the other hand, the layer also has a good mechanical strength, which is due to the fine grain. Thus, these finer-grained sublayers provide support for the overlying coarser sublayers. On the other hand can the method also carried out so that the sub-layers are formed in the area of the tread fine-grained, so the Komfeinung is also used in the tread area. It can thus the thermal stability of the excreted from the gas phase layer can be improved. The method can also be used to level a rough surface of the plain bearing element blank with the layer. It can be compensated defects of the rough surface. By contrast, conventional sputter layers form the roughness of the substrate, which results, for example, from the mechanical processing of the surface of the sliding bearing element blank, so that the running surface is accordingly correspondingly rough. Due to the reduced roughness of the tread, inter alia, a reduction of wear and the resulting friction losses in the engine during operation of the sliding bearing element can be achieved. By the specified targets and their use in the process, the advantages mentioned can be achieved. In addition, as a grain-refining substance at least one gas and / or a chemical compound of this gas is used, the process management can be simplified, since a separate / own Zuszusi- solution of the gas in the process gas is not required. It should be noted in this context that when using the chemical compound with the gas latter is released during the deposition process and therefore acts as the gas not bound in the target. Preferably, the chemical compound is formed from the gas with the base element of the target. An advantage is the in situ production of the chemical compound, so that the chemical compound is always freshly made available. In addition, by using the base element of the target, irregularities in the distribution of the chemical compound can be avoided.

In order to enhance the above-mentioned effect, according to a variant embodiment of the method, the proportion of the grain-refining substance and / or the atomized grain-refining portion of the target can be varied over the time of deposition of the layer, wherein according to a preferred embodiment, the proportion of the grain-refining substance and / or the atomized grain-refining portion of the target is reduced over the time of deposition of the layer. It can further be provided that the target is produced by sintering technology with cavities, wherein in the cavities the at least one gas is stored. Since the sintering technique usually leads to targets which have lower densities compared to solid materials, the cavities formed therein can be used for the provision of the gas in the coating process. The gas can thus be easily incorporated into the coating process without additional expenditure on equipment and is also simpler to regulate or control the process.

In the preferred embodiment of the method, tin is used as the base element of the target, since in the course of the evaluation of the invention it has been found that tin base layers show the above-mentioned effects more intensively. In addition, even more advantages can be achieved. For example, SnCh and SmCb, unlike, for example, CuO, are not harmful to health. For a better understanding of the invention, this will be explained in more detail with reference to the following figures.

In each case in a simplified, schemati shear representation: Figure 1 is a multi-layer plain bearing in side view. Fig. 2 is a sputtering chamber.

By way of introduction, it should be noted that in the differently described embodiments, the same parts are provided with the same reference numerals or the same component names, wherein the disclosures contained in the entire description can be mutatis mutandis to the same parts with the same reference numerals or component names. Also, the position information selected in the description, such as top, bottom, side, etc. related to the immediately described and illustrated figure and to transmit mutatis mutandis to the new situation in a change in position. Fig. 1 shows a multi-layer sliding bearing element 1 in the form of a plain bearing half shell. Shown is a two-layer variant of the multi-layer sliding bearing element 1, consisting of a support layer 2 and a sliding layer 3, which is on a front side 4 (radially inner side) of the multi-layer sliding bearing element 1, which is zuwendbar a component to be supported, arranged.

Optionally, a bearing metal layer 5 may be arranged between the sliding layer 3 and the support layer 2, as indicated by dashed lines in Fig. 1. The basic structure of such multilayer sliding bearing elements 1, as e.g. find use in internal combustion engines, is known from the prior art, so that further explanations on this unnecessary. It should be noted, however, that further layers can be arranged, that is, for example, between the sliding layer 4 and the bearing metal layer 5 an adhesion promoter layer and / or a diffusion barrier layer, as well as see between the bearing metal layer 3 and the support layer 2, an adhesive layer can be arranged.

In the context of the invention, the multi-layer sliding bearing element 1 can also be designed differently, for example as a bearing bush, as indicated by dashed lines in Fig. 1. Likewise, embodiments such as thrust rings, axially running sliding shoes, or the like are possible.

The multi-layer sliding bearing element 1 according to the invention is used in particular in medium to high-speed engines. The support layer 2 is preferably made of steel, but may also consist of a material which gives the multilayer sliding bearing element 1 the required structural strength. Such materials are known from the prior art.

For the bearing metal layer 5 and the intermediate layers, the alloys or materials known from the relevant prior art can be used, and reference is made in this respect. The sliding layer 3 consists of a tin-based alloy with tin as the main component or base element, ie tin forms the component with the largest proportion of the tin-based alloy. If alloy compositions are specified below, these are to be understood, unless stated otherwise, as tin in each case forms the remainder of the stated compositions.

Figures on the composition of tin-based alloy always refer to the entire alloy.

Furthermore, the information on the alloy compositions should be understood to include these conventional impurities, such as occur in commodities used on a large scale. However, within the scope of the invention it is possible to use pure or ultra-pure metals.

All amounts given to the alloy compositions and target compositions are, unless stated otherwise, in% by weight. In addition to tin, the tin-base alloy contains at least one element from a first element group comprising or consisting of copper and antimony. Optionally, the tin-based alloy may include at least one member of a second group of elements consisting of silicon, chromium, titanium, zinc, silver, iron, aluminum, bismuth and nickel. The proportion of antimony is between 1 wt .-% and 8 wt .-%, in particular between 1 wt .-% and 5 wt .-%. When it is less than 1% by weight, the tin-based alloy becomes too soft, thereby deteriorating fatigue strength. On the other hand, the slip layer containing more than 8% by weight becomes too hard, so that the conformability of the tin-base alloy in the break-in phase is too low.

The proportion of copper is between 8 wt .-% and 20 wt .-%, in particular between 9 wt .-% and 15 wt .-%. However, if the proportion of copper exceeds 20% by weight, coarse-grained precipitation of the copper-rich hard phase occurs. The proportion of each of the elements silicon, chromium, titanium, zinc, silver and iron can be between 0.1% by weight and 2% by weight, in particular between 0.25% by weight and 1.5% by weight ,

Silicon may be added to improve the fatigue strength and to slow down diffusion effects, which may result in layer softening.

By adding chromium, a slowdown of grain boundary diffusion can be achieved.

Titanium and iron in turn form hard phases with tin, whereby the fatigue strength of the tin-based alloy can be improved.

The addition of zinc or silver can improve the fatigue strength and load capacity of the tin-based alloy.

Proportions of these elements outside the stated limits result in a property profile of the tin-based alloy that renders it less suitable for use in the multi-layer sliding bearing element 1.

The proportion of each of the further elements aluminum, bismuth and nickel can be between 0.05% by weight and 5% by weight, in particular between 0.1% by weight and 3.1% by weight.

Aluminum can also improve the fatigue strength of the tin-based alloy.

The addition of nickel can improve the fatigue strength and the strength of the tin-based alloy.

The addition of bismuth hinders grain boundary diffusion under the influence of temperature.

The sum content of all alloying elements in addition to tin is preferably limited to a maximum of 30% by weight, in particular to a proportion of between 10% by weight and 25% by weight. It was found that Summengen above the specified amount ranges lead to brittleness, below too low hardness and fatigue strength of the tin-based alloy.

The remainder to 100 wt .-% forms tin with the usual, production-related impurities.

In addition to a tin-based alloy, however, the sliding layer 3 can also be replaced by an alloy with the base element aluminum, such as aluminum. AlSn20Cul, AlBil5CulNil, or by an alloy with copper as the base element, e.g. CuPb27, CuPb25Sn3, CuPb25Ni3, or by silver or an alloy with silver as the base element, e.g. AgCu5.

To prepare the multi-layer sliding bearing element 1, a blank is prepared. The blank consists at least of the support layer 2, but may also have at least one of the above-mentioned layers, in particular the bearing metal layer 5. The production of this Gleitlagerelementrohlings 6 (FIG. 2) can be carried out according to the prior art, for example, by a steel plate Applied bearing metal layer and thus connected by rollers. Other known methods are applicable. Optionally, a mechanical processing of this Gleitlagerelementrohlings 6.

The plain bearing element blank 6 can be brought into the corresponding shape, for example the shape of a half shell, by reshaping before the sliding layer 3 is deposited thereon.

The sliding layer 3 is deposited from the gas phase on the sliding bearing element blank 6. In particular, the vapor deposition is performed by a cathode sputtering method or an electron beam evaporation method. Since these methods are known in principle from the prior art, reference is made to avoid repetition. It should be noted at this point that it is possible within the scope of the invention to deposit other layers of the multilayer plain bearing 1 by vapor deposition, in particular by a cathode sputtering method or an electron beam evaporation method, on a plain bearing element blank 6.

For deposition, at least one slide bearing element blank 6 is placed in a deposition chamber 7, which is shown schematically in FIG. For example, the Gleitlagerele- ment blank 6 can be introduced into the deposition chamber 7 via a lock. The slide bearing element blank 6 can be arranged during the deposition of the sliding layer 3 on a support 8 and held by this.

It is also possible for a plurality of plain bearing element blanks 6 to be coated simultaneously, for which purpose a correspondingly shaped support 8 can be used. Although in Fig. 2, the Gleitlagerelementrohling 6 is shown planar, it can - as described above - already be formed, so for example, have the shape of a half-shell, so that therefore the slide bearing element blank 6 to be coated may have a curved surface to be coated. The sliding layer 3 may preferably with a layer thickness of at least 10 μπι, preferably at least 15 μπι, and at most 60 μπι, preferably at most 50 μπι, are generated, if a bearing metal layer 3 is arranged. In the absence of a bearing metal layer 3 preferably layer thicknesses of at least 150 μπι, preferably at least 200 μπι, and at most 1000 μπι, preferably generated at most 750 μπι.

In the deposition chamber 7, at least one target 9 is arranged. It is also possible to arrange a plurality of targets 9.

The target 9 preferably has the same metals from which the deposited sliding layer 3 is produced, for example, the above-mentioned elements of the tin-based alloy. In particular, the target 9 contains these metals in the same relative In this way, the target 9 can have at least approximately the same, in particular exactly the same, composition as the sliding layer 3 to be produced. If several targets 9 are used, they can all have the same composition. However, it is also possible to use differently composed targets 9, the sum of the targets 9 qualitatively giving the sum of the metals to be deposited.

The target (s) 9 and the sliding bearing element blank (s) 6 are correspondingly electrically contacted so that an electrical potential prevails therebetween.

The deposition of the sliding layer 3 takes place in a process gas, for example consisting of or comprising argon. For the introduction of the process gas, the separation chamber 7 has at least one inlet 10 and for its removal at least one outlet 11.

The following parameters can be used for deposition by means of a sputtering process: Stress on slide bearing element blank 6: -150 V to 0 V Process gas mixture: argon, oxygen

Process gas pressure: 7xl0 ^"4 to 6xl0 ^{" 3} mbar, temperature: 80 to 160 ° C

Voltage at the or the targets 9: -450 V to -800 V.

Coating rate: 0.1 μιη / minute to 5 μιη / minute As is known sputtering process gas atoms accelerated to the target 9 and beat out of this the metal atoms to be deposited, which are accelerated in the direction of the slide bearing element blank 6 and reflected on the surface so that the sliding layer 3 is built up. Deposition by means of a PVD (vapor deposition) process is preferred as these take place away from the thermodynamic equilibrium so that particle diffusion and coagulation of precipitates can be prevented.

With the method, in particular the sputtering method, therefore, a layer, in particular the sliding layer 3, can be deposited on a sliding bearing element blank 6 from the gas phase in a process gas. For this purpose, the layer of a target 9, which comprises or consists of a metal combination with a metallic base element, in particular tin (based on the metal combination), is produced by at least partial sputtering of the target 9 and subsequent deposition of the sputtered target components on the sliding bearing blank 6.

For the production of this layer, in particular the sliding layer 3, on the one hand at least one target 9 can be used which has at least one grain-refining constituent. The grain-refining constituent is a gas and / or a chemical compound of this gas. Alternatively or additionally, a process gas may be used to which the grain-refining gas is added. The grain-refining gas is preferably selected from a group comprising oxygen,

Nitrogen, carbon dioxide, gases on carbon dioxide based on hydrogen C _x H _y (eg acetylene), hydrogen.

The content of the grain-refining gas at the target 9 may be selected from a range of 20 ppm to 4,000 ppm, especially from a range of 50 ppm to 2,500 ppm.

Argon is preferably used as the process gas. But it can also be used other noble gases such as helium, neon or krypton. If the grain-refining gas is added to the process gas, its proportion of the total gas composition (ie, process gas plus grain-refining gas) may be selected from a range of 25 ppm to 20,000 ppm, more preferably from a range of 100 ppm to 10,000 ppm. In this case, the grain-refining gas can be directly added to the process gas, and this gas mixture can be fed into the deposition chamber 7. Therefore, according to a preferred embodiment, the at least one inlet 10 for the process gas into the separation chamber 7 has a branch 12 which can be connected to a corresponding gas container and via the grain-refining gas is added to the process gas. This has the advantage that the volumes of the process gas and the grain-refining gas which are fed in can be regulated separately via two gas flow control elements. It is thus also possible, if necessary, to stop the supply of the grain-refining gas wholly during the deposition of the layer.

However, it is also possible for the separation chamber 7 to have at least one separate inlet for the grain-refining gas, so that the mixing with the process gas takes place only in the separation chamber 7.

In general, the grain-refining gas can be added to the process gas continuously or in discrete steps discontinuously. It can thus influence the layer growth of the layer to be evaporated.

According to a preferred embodiment of the method or the target 9, a chemical compound with the base element of the target is used as the chemical compound of the grain-refining gas. In the case of tin as base elements, for example, a tin oxide (SnO or SnCh or mixed oxides) is used which is added to the metal combination of the target 9. The proportion of the chemical compound of the grain-refining gas to the base member at the target, i. on the metal combination, may be selected from a range of 0.02 wt .-% to 3 wt .-%, in particular from a range of 0, 1 wt .-% to 2 wt .-%. This proportion is based on the total composition, ie the sum of the proportions of the individual metals and the chemical compound.

In principle, it is possible that the proportion of the grain-refining gas and / or the atomized grain-refining portion of the target 9 over the time of the deposition substantially, in particular exactly, is constant or is maintained. On the other hand, it is also possible that the proportion of the grain-refining gas to the process gas and / or the atomized grain-refining portion of the target 9, ie the chemical compound of the grain-refining gas is varied over the time of deposition of the layer to influence the layer growth of the layer to be deposited. The proportion can be chosen over time or, in particular, decreasing. Embodiments are also possible in which this proportion increases at least once and decreases at least once, for example, this proportion of a sine curve can be chosen following.

In the preferred embodiment of the method, the proportion of the grain-refining gas and / or the atomized grain-refining portion of the target 9 over the time of deposition of the layer is reduced. It is thus achieved that the size of the grains of the layer increases in the direction of the radially inner sliding surface of the multi-layer sliding bearing element 1.

In order to vary the proportion of the grain-refining substance, either the proportion of grain-fining gas in the process gas can be adjusted accordingly via the at least one gas-flow control element, in particular automatically regulated. However, it is also possible to influence this fraction by means of the electrical deposition parameters, for example by varying the stress on the plain bearing element blank 6. The fraction of the grain-refining gas can be changed, for example, from an initial value of 10000 ppm to a final value of 1000 ppm. There are also other variations in shares within the above quantities for the grain fine gas possible.

It should be noted at this point that not only a grain-refining gas can be used, but also a mixture of various grain-refining gases selected from the aforementioned group of grain-refining gases or the corresponding chemical compounds thereof with at least one of Metals, in particular the base element. In addition, it is possible that the grain-refining gas or the chemical compound per se is changed over time, so that, for example, oxygen is used as grain-refining gas at the beginning of the deposition, and the oxygen is supplemented by CO 2 during the course of the deposition of the layer is replaced by it. The variation of the amounts of the refining gases can be continuous or stepwise, ie, for example, the first gas used with a continuously increasing amount is added to the other gas or replaced or that the first gas used in several (at least two) stages added to the other gas or replaced by this. The steps can be designed to be equidistant or variable in time.

In the method for depositing the layer, a target 9 can be used, which is produced by sintering, wherein the at least one grain-refining gas is incorporated or incorporated into the cavities (pores) produced by the sintering technique. The grain-refining gas is thus released continuously or discontinuously only during the atomization of the target 9.

But it is also possible that the at least one chemical compound of the at least one grain-refining gas with one of the metals from which the layer is produced, is already mixed as such in the target 9.

The target 9 per se may consist of the metallic components and optionally the at least one grain-refining gas. But it is also possible that the metallic components for the production of the layer and optionally the at least one grain-refining gas are arranged on a support of the target.

In addition to producing a grain size gradient of the grains of the layer to be deposited, in particular the sliding layer 3, wherein preferably the grain size of the grains of this layer increases in the direction of the radially inner sliding surface of the multilayer sliding bearing element 1, it is also possible that this layer with uniform grain sizes within a grain size ßenbandes produce. The grain size of the grains can be selected, for example, from a mean particle size at the beginning of the deposition from a range of 0.2 μm to 2 μm to a mean grain size at the end of the deposition from a range of 0.5 μm to 20 μm by appropriate variation of the particle size Part of the grain refining gas, as described above, to be changed. In general, the mean grain size can change by two to twenty times, in particular over the course of the deposition become larger. In the event that the grain size of the grains is generated at least approximately constant, the average grain size can be selected from a range of 0.5 μιη to 10 μιη. The mean grain size is determined in a two-dimensional evaluation on the metallographic cross-section (digital photo of the light microscope, magnification lOOOx) and corresponds to twice the geometric mean of the distance of the grain boundary curve from the centroid of the associated grain, wherein for the evaluation, a region of the cross section is used, whose width corresponds to at least 5 times the layer thickness. Sub-microscopic grains (<0.5μιη) are not detected due to the resolution of the measuring system. In addition, the method can also be used to smooth the surface of the plain bearing element blank 6, as stated above. The method may be carried out with the addition of a grain-refining process gas as described above and a coating temperature which is (to promote diffusion) not more than 60 Kelvin below the melting temperature of the lowest-melting alloy component.

The following sliding layers 3 were produced by means of a PVD process. In this case, 6 half-shells consisting of a support layer 2 made of steel and a leaded bronze as bearing metal layer 5 were introduced into a electromagnetically generated metal vapor as Gleitlagerelementrohlinge 6, wherein a sliding layer 3 was applied with a thickness of about 20 μιη. The generation of the sliding layer 3 can take place both from a single source (target 9) and at the same time from several sources (targets 9) of the same or different composition. The following tables give examples that were produced during the evaluation of the process.

Where: PG ... process gas

PG Var ... Variation of the process gas UB ... Tension on plain bearing element blank 6 p ... total process gas pressure

T ... coating temperature

R .... coating rate

SdT ... state of the art

Table 1 :

bound

7 AlSn21CuO, 9 Ar + none none 1.5 180 1.11

0, 1

%

C0 ₂

In the following Table 2 the respective results are summarized. In this mean: HV ... layer hardness according to Vickers HV (0,001) D ... average grain size Ra ... surface roughness value

BiZo ... area near binding zone (5μιη) area ... area near surface (5μιη)

Table 2:

Variant HV D HV D Ra Ra

BiZo grain OF1 grain Subst Ofl

BiZo Ofl

1 41 9.2 42 9.4 0.42 0.69

2 76 3.8 81 4.4 0.45 0.61

3 46 4.7 48 4.5 0.73 0.39

4 47 1.2 50 2.1 0.50 0.81

5 64 2.1 38 8.8 0.34 0.46

6 55 2.4 52 2.7 0.55 0.68

7 85 2.8 84 3.1 0.51 0.48 The exemplary embodiments show or describe possible design variants, it being noted at this point that various combinations of the individual design variants are also possible with one another.

For the sake of order, it should finally be pointed out that for a better understanding of the construction of the multilayer sliding bearing element 1 or the deposition chamber 7, these or their components have been shown partially unevenly and / or enlarged and / or reduced in size.

REFERENCE NUMBERS

More business aliment

backing

Overlay

front

Bearing metal layer

Glitter elec- trical blank

deposition

carrier

target

inlet

outlet

diversion

Claims

- 20 -Pententanspr che

Method for depositing a layer on a slide bearing blank (6) from the gaseous phase in a process gas, according to which the layer of at least one target (9) comprising or consisting of a metal combination with a metallic base element, by at least partial sputtering of the target (9) and then depositing the atomized target constituents on the plain bearing element blank (6), characterized in that a target (9) is used which has at least one grain-refining constituent in the form of a gas and / or a chemical compound of this gas and / or that a process gas is used to which the grain-refining gas is added.

2. The method according to claim 1, characterized in that the chemical compound of the gas and the base element of the target (9) is formed.

3. The method according to any one of claims 1 or 2, characterized in that the proportion of the grain-refining gas and / or the atomized grain-fine fraction of the target (9) over the time of deposition of the layer is varied.

4. The method according to claim 3, characterized in that the proportion of the grain-refining gas and / or the atomized grain-fine fraction of the target (9) over the time of deposition of the layer is reduced.

5. The method according to any one of claims 1 to 4, characterized in that the target (9) is sintered with cavities, wherein in the cavities, the at least one gas is stored.

6. The method according to any one of claims 1 to 5, characterized in that is used as the base element of the target (9) tin.

7. Use of the method according to one of claims 1 to 5 for smoothing the surface of a Gleitlagerelementrohlings (6) or a multi-layer sliding bearing element (1). - 21 -

A target (9) for depositing a layer on a slide bearing blank (6) from the gas phase comprising a sintered composition of metallic constituents, characterized in that gas-filled cavities are formed in the sintering composition.

9. target (9) for depositing a layer on a sliding bearing element blank (6) from the gas phase comprising a composition of metallic constituents, characterized in that the composition further contains at least one chemical compound of a metal and a gas.