WO2017122804A1

WO2017122804A1 - Gasification furnace, and operation method for gasification furnace

Info

Publication number: WO2017122804A1
Application number: PCT/JP2017/001090
Authority: WO
Inventors: 裕昭脇坂; 松本　健
Original assignee: ヤンマー株式会社
Priority date: 2016-01-15
Filing date: 2017-01-13
Publication date: 2017-07-20
Also published as: CN108463540A; CN108463540B; PH12018501371A1

Abstract

This gasification furnace, which oxidizes a starter material to generate producer gas, is provided with a means for maintaining an oxidation zone, which oxidizes the starter material, at a predetermined prescribed temperature or within a predetermined prescribed temperature range, and is provided with a means that passes the starter material in the oxidation zone within a predetermined prescribed time range. This gasification furnace operation method, which oxidizes a starter material to generate producer gas, maintains the oxidation zone, which oxidizes the starter material, at a predetermined prescribed temperature or within a predetermined prescribed temperature range, and passes the starter material in the oxidation zone within a predetermined prescribed time range.

Description

Gasification furnace and operation method of gasification furnace

The present invention relates to a gasification furnace that oxidizes a raw material such as biomass to generate a product gas and a method for operating the gasification furnace.

In a gasifier that oxidizes a raw material such as biomass to generate a product gas, the raw material is pyrolyzed to generate a product gas (for example, carbon monoxide or hydrogen). In the process of generating the product gas, generally, the raw material is carbonized, char char (carbide) is combusted, and the burned ash is discharged to the outside. At this time, the raw material is introduced together with an oxidizing agent such as air, or the furnace is heated from the outside.

Also, in such a gasification furnace, tar is generated in the process of generating product gas. That is, the generated product gas contains tar. For example, when the generated gas is burned by a gas engine, the malfunction of the movable member that touches the generated gas such as a valve due to the generated tar (specifically, the malfunction that the movable member does not move smoothly due to adhesion of tar), etc. Inconvenience may occur.

In order to eliminate such inconvenience, in the conventional gasification furnace, the thermal decomposition temperature is higher than the tar thermal decomposition temperature (specifically, about 800 ° C. or higher, preferably about 1000 ° C.), which is the temperature necessary for thermal decomposition of the oxidizing atmosphere. Thus, the generation of tar is suppressed.

On the other hand, when burning a raw material containing silica (silicon dioxide) at a tar pyrolysis temperature (eg, about 800 ° C. to 1000 ° C.), if the raw material further contains potassium (eg, a raw material such as rice husk), potassium Is known to promote crystallization from amorphous silica to crystalline silica, which is not preferred.

Therefore, in the conventional gasification furnace, it is necessary to suppress the oxidizing atmosphere to a relatively low temperature (for example, a temperature lower than about 800 ° C.) from the viewpoint of suppressing the generation of crystalline silica. It is contrary to what you do.

That is, in order to suppress the generation of tar, when the temperature is higher than the temperature necessary for thermal decomposition of tar (specifically, about 800 ° C. or higher), crystalline silica is generated, while the generation of crystalline silica is suppressed. Therefore, if the oxidizing atmosphere is set at a relatively low temperature (for example, a temperature lower than about 800 ° C.), the generation of tar cannot be suppressed.

Therefore, the conventional gasifier has the following configuration. That is, the acid cleaning is performed in the pretreatment to remove potassium that promotes the formation of crystalline silica from the raw material, or the raw material is gasified at a temperature (for example, 700 ° C. to 800 ° C.) at which the crystalline silica is not generated in the previous stage. In the latter stage, after the gas is separated into a solid component, only the gas component is oxidized at a tar pyrolysis temperature (for example, 1000 ° C.) or higher to suppress the generation of tar. A structure in which the tar content in the product gas generated in the post-treatment of the gasification furnace is removed after oxidation at a temperature at which silica is not generated (eg, 700 ° C. to 800 ° C.), or oxidation is performed at a tar pyrolysis temperature (eg, 1000 ° C.) or higher. Then, after suppressing the generation of tar, the crystalline silica is removed by post-treatment.

Thus, in a conventional gasification furnace, when generating a product gas by oxidizing a raw material containing silica and potassium (for example, rice husk), in order to suppress both generation of tar and generation of crystalline silica. , Pretreatment or dividing the oxidation into a plurality of stages (for example, primary oxidation at 700 ° C. to 800 ° C. followed by secondary oxidation of only the gasified gas at 1000 ° C. or more) or tar (for example, the raw material is 700 ° C. to 800 ° C. Requires a multi-step process such as removing tars generated by oxidation at 0 ° C.) or crystalline silica (for example, crystalline silica produced by oxidizing raw materials at 1000 ° C. or higher) by post-treatment. Further, it is not configured to simultaneously suppress both the generation of tar and the generation of crystalline silica.

In this regard, Patent Document 1 discloses a configuration in which an oxidizing agent (air or oxygen) is blown into an oxide layer above a reducing layer on which char is deposited in a downdraft gasification furnace (see FIG. 1). 1). Patent Document 2 discloses a configuration in which an oxidizing agent is blown above a char deposition layer in a fluidized bed gasification furnace (see FIG. 1 of Patent Document 2). Patent Document 3 discloses a configuration in which an oxidizing agent is blown toward a carbide deposition layer of a biomass raw material in an updraft gasification furnace (see FIG. 1 of Patent Document 3).

JP 2005-146188 A JP 2010-223564 A JP 2013-213647 A

However, none of Patent Documents 1 to 3 discloses a configuration for simultaneously suppressing both the generation of tar and the generation of crystalline silica.

Therefore, the present invention is a gasification furnace that oxidizes a raw material to generate a product gas and a method for operating the gasification furnace. In generating the product gas, both the generation of tar and the generation of crystalline silica are performed. It is an object of the present invention to provide a gasification furnace and a gasification furnace operation method capable of simultaneously achieving suppression.

The present inventors have intensively studied in order to solve the above problems, and as a result, have found the following and completed the present invention.

That is, the present inventors, regarding a raw material containing silica and potassium (for example, rice husk), when the temperature of the raw material itself reaches a crystalline silica formation temperature (for example, 750 ° C.), which is a temperature for forming crystalline silica. In the gasification furnace that generates the product gas by oxidizing the raw material by obtaining the knowledge that the crystalline silica is produced, it is predetermined in the same process (at the same time and in the same space) to produce the product gas. If the time during which the raw material is exposed to an oxidizing atmosphere of a predetermined temperature or a predetermined temperature range is within a predetermined time range, tar decomposition proceeds to suppress tar generation, while the temperature of the raw material itself is It is possible to suppress the formation of crystalline silica by not fully rising, in other words, oxidation above the thermal decomposition temperature of tar, which is the temperature necessary for thermal decomposition of tar. It found that the raw material it is possible to suppress generation of tar to acceptable levels in the up from the time of heating reaches the crystalline silica product temperature or temperature of the crystalline silica product temperature near under 囲気.

More specifically, in the gasification furnace that oxidizes the raw material to generate the product gas, the present inventors generate tar gas decomposition temperature (at the same time and in the same space) in generating the product gas. Crystalline silica formation temperature attainment time (time until the temperature of the raw material itself reaches crystalline silica formation temperature (for example, 750 ° C.) from the time when the raw material is exposed to an oxidizing atmosphere having a temperature of 1000 ° C. or higher) As a result of experiments under the hypothesis that, for example, a time exceeding 2 minutes) is equal to or longer than the allowable tar generation time, which is a time necessary for suppressing the generation of tar below the allowable level, the time for reaching the crystalline silica formation temperature is determined. It was found that the tar generation allowable time is exceeded. Thereby, in the same process (in the same time and in the same space), a predetermined temperature (for example, 1050 ° C.) or a predetermined temperature range (for example, a temperature range in which 1050 ° C. is the central temperature) above the tar pyrolysis temperature (for example, 1000 ° C.) The exposure time of the raw material in an oxidizing atmosphere is within a predetermined time range that is equal to or longer than the allowable tar generation time and equal to or shorter than the allowable crystalline silica generation time, which is a time for suppressing the generation of crystalline silica to an allowable level or lower (for example, 2 minutes), tar generation can be suppressed and generation of crystalline silica can be suppressed.

The crystalline silica formation temperature varies depending on the potassium concentration. For example, when there is no potassium, the crystalline silica formation temperature is 1350 ° C., whereas the potassium content increases. The crystalline silica formation temperature gradually decreases (for example, decreases to a temperature of 750 ° C.).

The present invention is based on such knowledge, and provides the following gasification furnace and operation method of the gasification furnace.

(1) Gasification furnace The gasification furnace according to the present invention is a gasification furnace that oxidizes a raw material to generate a product gas, and an oxidation region for oxidizing the raw material is set to a predetermined temperature or a predetermined temperature range. Means for maintaining is provided, and means for passing the raw material through the oxidation zone within a predetermined time range is provided.

(2) Gasification furnace operation method The gasification furnace operation method according to the present invention is a gasification furnace operation method in which a raw material is oxidized to generate a product gas, and an oxidation region for oxidizing the raw material is previously set. A predetermined temperature or a predetermined temperature range is maintained, and the raw material is allowed to pass through the oxidation zone within a predetermined time range.

In the present invention, the predetermined temperature or the predetermined temperature range is a temperature equal to or higher than a tar pyrolysis temperature, which is a temperature necessary for thermal decomposition of tar, or a temperature range having the temperature as a central temperature, and the predetermined time range. Is longer than the allowable tar generation time, which is the time required to suppress the generation of tar below the allowable level, and below the allowable time of crystalline silica generation, which is the time required to suppress the generation of crystalline silica below the allowable level. A certain aspect can be illustrated.

In the gasification furnace according to the present invention, the oxidizing atmosphere temperature in the oxidation zone and the crystalline silica production temperature, which is the temperature at which the raw material itself produces crystalline silica from the time when the raw material enters the oxidation zone. The time required for the raw material to pass through the oxidation region within the predetermined temperature or the central temperature of the predetermined temperature range and the predetermined time range based on the correlation with the time until the crystalline silica formation temperature is reached An embodiment in which means for determining the oxidation zone passage time is provided can be exemplified. In the operation method of the gasification furnace according to the present invention, the crystalline silica in which the oxidizing atmosphere temperature in the oxidation zone and the temperature of the raw material itself is a temperature at which crystalline silica is produced from the time when the raw material enters the oxidation zone The raw material passes through the oxidation zone within the predetermined temperature or the central temperature of the predetermined temperature range and the predetermined time range based on the correlation with the crystalline silica generation temperature arrival time, which is the time until the formation temperature is reached. The aspect which determines the oxidation zone passage time which is time can be illustrated.

In the present invention, the correlation can be exemplified by a mode corresponding to a correlation function expression represented by the following expression [1].

However, in the formula [1], T is the oxidizing atmosphere temperature, t is a crystalline silica production allowable time which is a time for suppressing the generation of crystalline silica to an allowable level or less, and tmin is The tar generation allowable time is a time required to suppress the generation of tar below the allowable level, and a, b, and c are constants that change depending on the amount of the raw material components (particularly, the concentration of potassium contained).

In the present invention, the correlation can be exemplified by a mode corresponding to a correlation table shown in the following [Table 1] based on the raw material having a predetermined concentration of potassium.

However, in the above [Table 1], T is the oxidizing atmosphere temperature, t is a crystalline silica production allowable time which is a time for suppressing the generation of crystalline silica to an allowable level or less, and t (K (Small) represents the permissible time for crystalline silica generation with a raw material that is less than the standard potassium content of the raw material, and t (large K) is greater than the standard potassium content of the raw material. The crystalline silica production permissible time with a large amount of raw material is represented, and A, B, C, D, E are set values of the crystalline silica production permissible time t with respect to the oxidizing atmosphere temperature T, and the raw material Is a set value that varies depending on the amount of the component (particularly the potassium concentration), and is a set value that is equal to or greater than the allowable tar generation time tmin, which is the time required to suppress the generation of tar below the allowable level.

In the gasification furnace according to the present invention, a mode in which means for preheating the inside of the furnace to the predetermined temperature or the predetermined temperature range before introducing the raw material can be exemplified.

In the present invention, as a means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction portion for introducing the raw material is provided above the uppermost portion of the predetermined assumed char layer, An oxidant introduction part for introducing an oxidant is provided above the uppermost part of the assumed char layer and below an opening in the raw material introduction part, and the introduction direction of the oxidant is horizontal in the opening in the oxidant introduction part. A product gas outflow part for allowing the product gas to flow out is provided above the opening in the oxidant introduction part, and an endothermic reaction is performed at a position facing the assumed char layer. An embodiment in which at least one of an endothermic reactant introduction part for introducing the agent and a heat capacity agent introduction part for introducing the heat capacity agent is provided can be exemplified.

In the present invention, as a means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction portion for introducing the raw material is provided above the uppermost portion of the predetermined assumed char layer, An oxidant introduction part for introducing an oxidant is provided above the uppermost part of the assumed char layer and below an opening in the raw material introduction part, and the introduction direction of the oxidant is horizontal in the opening in the oxidant introduction part. A generated gas outflow portion for flowing out the generated gas is provided above the opening in the oxidant introduction portion, and is formed on the outer surface of the region corresponding to the assumed char layer. An embodiment in which a char layer temperature control unit for controlling the temperature of the char layer is provided can be exemplified.

In the present invention, as a means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction portion for introducing the raw material is provided above the uppermost portion of the predetermined assumed char layer, An oxidant introduction part for introducing an oxidant is provided below the uppermost part of the assumed char layer, an oxidant contact time control part for controlling an oxidant contact time for contacting the oxidant with the char is provided, and the generated gas A product gas outflow part for allowing the gas to flow out is provided above the oxidant introduction part, and an endothermic reactant introduction part for introducing an endothermic reactant at a position facing the assumed char layer, and a heat capacity agent introduction for introducing a heat capacity agent The aspect which provided at least one among the parts can be illustrated.

In the present invention, as a means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction portion for introducing the raw material is provided above the uppermost portion of the predetermined assumed char layer, An oxidant introduction part for introducing an oxidant is provided below the uppermost part of the assumed char layer, an oxidant contact time control part for controlling an oxidant contact time for contacting the oxidant with the char is provided, and the generated gas An example is provided in which a product gas outflow portion for allowing the char to flow out is provided at a position facing the lowermost portion of the assumed char layer, and a char deposition time control unit for controlling the char deposition time for depositing char is provided.

In the present invention, as a means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction portion for introducing the raw material is provided above the uppermost portion of the predetermined assumed char layer, An oxidant introduction part for introducing an oxidant is provided below the uppermost part of the assumed char layer, and an oxidant contact time control unit for controlling an oxidant contact time for contacting the oxidant with the char is provided. The oxidant introduction part further provided with a oxidant introduction part to be introduced at a position facing the lowermost part of the assumed char layer, and a product gas outflow part through which the produced gas flows out is provided below the uppermost part of the assumed char layer. And an oxidant introduction part further provided at a position facing the lowermost part of the assumed char layer.

In the present invention, as a means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction portion for introducing the raw material is provided above the uppermost portion of the predetermined assumed char layer, An oxidant introduction part for introducing an oxidant is provided at a position facing the lowermost part of the assumed char layer and above the uppermost part of the assumed char layer and below an opening in the raw material introduction part, An opening in the oxidant introduction portion provided at a position facing the bottom of the layer is formed so that the introduction direction of the oxidant is directed upward or substantially upward, and the raw material introduction is performed above the uppermost portion of the assumed char layer. An opening in the oxidant introduction part provided below the opening in the part is formed so that the introduction direction of the oxidant is along the horizontal direction or upward from the horizontal direction, and the generated gas is allowed to flow out. The formed gas outlet portion may be exemplified embodiments provided above the all of the oxidant introduction.

In the present invention, as a means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction portion for introducing the raw material is provided above the uppermost portion of the predetermined assumed char layer, An oxidant introduction part for introducing an oxidant is provided at a position facing the lowest part of the assumed char layer, an oxidant introduction amount control part for controlling the introduction amount of the oxidant is provided, and an oxidant introduction for introducing the oxidant is provided. An embodiment in which the opening in the portion is formed so that the introduction direction of the oxidant is directed upward or substantially upward, and the generated gas outflow portion for flowing out the generated gas is provided above the uppermost portion of the assumed char layer can be exemplified. .

In the present invention, as a means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction portion for introducing the raw material is provided above the uppermost portion of the predetermined assumed char layer, An oxidant introduction part for introducing an oxidant is provided at a position facing the lowermost part of the assumed char layer, an adjustment control part for adjusting the oxidant and at least one of an endothermic reaction agent and a heat capacity agent is provided, and the oxidant introduction An embodiment in which the opening in the portion is formed so that the introduction direction of the oxidant is directed upward or substantially upward, and the generated gas outflow portion for flowing out the generated gas is provided above the uppermost portion of the assumed char layer can be exemplified. .

In the present invention, as means for allowing the raw material to pass through the oxidation region within a predetermined time range, a raw material introduction part for introducing the raw material and an oxidant introduction part for introducing an oxidant are provided in parallel, An opening in the raw material introduction part is formed such that the introduction direction of the raw material is along the flow direction of the product gas or substantially the flow direction, and the opening in the oxidant introduction part is the flow direction of the product gas. A generated gas outflow portion for flowing out the generated gas is provided on the downstream side of the raw material introducing portion and the oxidant introducing portion in the flowing direction of the generated gas. An example in which an oxidant introduction amount control unit for controlling the introduction amount of the agent is provided.

In the present invention, as means for passing the raw material through the oxidation zone within a predetermined time range, a raw material introduction part for introducing the raw material and an oxidant introduction part for introducing an oxidant are flowed in the product gas. Oxidant introduction amount control for controlling the introduction amount of the oxidant by providing a product gas outflow portion for allowing the product gas to flow out on the downstream end surface opposite to the upstream end surface. The aspect which provided the part can be illustrated.

In the present invention, as a means for allowing the raw material to pass through the oxidation zone within a predetermined time range, a raw material introduction portion for introducing the raw material is provided on an upstream end face in the flow direction of the generated gas, and the generated gas is A product gas outflow portion to be flowed out is provided on the downstream end surface opposite to the upstream end surface, and a plurality of oxidant introduction portions for introducing an oxidant are provided between the upstream end surface and the downstream end surface. Provided in order from the upstream side to the downstream side in the flow direction of the gas, and provided with an oxidant introduction amount control unit for controlling the introduction amount of the oxidant of the plurality of oxidant introduction units, and from the upstream side to the downstream side in the flow direction of the product gas An embodiment in which an oxidant temperature control unit is provided which is placed on the side to gradually lower the temperature of the oxidant can be exemplified.

In the present invention, as a means for allowing the raw material to pass through the oxidation zone within a predetermined time range, a raw material introduction portion for introducing the raw material is provided on an upstream end face in the flow direction of the generated gas, and the generated gas is A product gas outflow portion to be flowed out is provided on the downstream end surface opposite to the upstream end surface, and a plurality of oxidant introduction portions for introducing an oxidant are provided between the upstream end surface and the downstream end surface. Provided in order from the upstream side to the downstream side in the flow direction of the gas, and provided with an oxidant introduction amount control unit for controlling the introduction amount of the oxidant of the plurality of oxidant introduction units, and from the upstream side to the downstream side in the flow direction of the product gas An example in which an oxidant concentration control unit is provided to gradually reduce the concentration of the oxidant over the side.

In the present invention, as a means for allowing the raw material to pass through the oxidation zone within a predetermined time range, a raw material introduction portion for introducing the raw material is provided on an upstream end face in the flow direction of the generated gas, and the generated gas is A flow of the product gas is provided between the upstream end surface and the downstream end surface, and a product gas outflow portion to be flowed is provided on the downstream end surface that is a surface opposite to the upstream end surface. An endothermic reactant that is provided on the upstream side in the direction and includes an oxidant introduction amount control unit that controls an introduction amount of the oxidant in the oxidant introduction unit, and introduces an endothermic reactant downstream from the oxidant introduction unit The aspect which provided at least one among the introduction part and the heat capacity agent introduction part which introduces a heat capacity agent can be illustrated.

In the present invention, as a means for allowing the raw material to pass through the oxidation zone within a predetermined time range, a raw material introduction portion for introducing the raw material is provided on an upstream end face in the flow direction of the generated gas, and the generated gas is A product gas outflow portion to be flowed out is provided on the downstream end surface opposite to the upstream end surface, and an oxidant introduction portion for introducing an oxidant is provided between the upstream end surface and the downstream end surface. An embodiment in which an introduction amount control unit that controls the introduction amount is provided and an oxidant temperature switching control unit that switches the oxidants at a plurality of different temperatures can be exemplified.

In the present invention, as a means for allowing the raw material to pass through the oxidation zone within a predetermined time range, a raw material introduction portion for introducing the raw material is provided on an upstream end face in the flow direction of the generated gas, and the generated gas is A product gas outflow portion to be flowed out is provided on the downstream end surface opposite to the upstream end surface, and an oxidant introduction portion for introducing an oxidant is provided between the upstream end surface and the downstream end surface. An example is provided in which an introduction amount control unit for controlling the introduction amount is provided, and an oxidant concentration switching control unit that switches the oxidants having a plurality of different concentrations is provided.

In the operation method of the gasifier according to the present invention, a mode in which the correlation is set or updated at the time of installation of the gasifier or at the time of determining or changing the source of the raw material can be exemplified.

According to the present invention, it is possible to simultaneously suppress both the generation of tar and the generation of crystalline silica.

FIG. 1 is a schematic configuration diagram illustrating an overall configuration of a gasification apparatus including a gasification furnace according to an embodiment of the present invention. FIG. 2 is a schematic side view showing a part of the gasification furnace shown in FIG. 1 in a broken state, and shows a state in which the raw material is oxidized and gasified. FIG. 3 is an explanatory diagram for explaining the oxidation region, and is an enlarged view showing the vicinity of the boundary between the combustion gas layer and the char layer in the furnace shown in FIG. 2, and (a) shows the char layer. It is a figure which shows the example which set the top part of the char layer so that it may be located in the position which does not contact with an oxidizing agent, or is in contact with the surface, (b) is the inside of a char layer contacting an oxidizing agent It is a figure which shows the example which set the top part of the char layer so that it may be located in the position to be beaten. FIG. 4 is a graph showing a diffraction pattern by X-ray diffraction of silica in ash obtained from the gasification furnace according to the present embodiment using rice husk as a raw material, compared with the case of crystalline silica, ) Is a diagram showing the result of the top of the char layer performed at the position shown in FIG. 3A, and (b) is the result of the top of the char layer performed at the position shown in FIG. 3B. FIG. FIG. 5 is a graph showing the relationship between crystalline silica formation temperature and potassium content. FIG. 6 is a graph showing the correlation between the oxidizing atmosphere temperature and the crystalline silica formation temperature arrival time obtained as a result of an experiment conducted when the crystalline silica formation temperature is 750 ° C. FIG. 7 is a schematic diagram schematically showing the gasification furnace according to the first embodiment of Example 1. As shown in FIG. FIG. 8 is a schematic view schematically showing a gasification furnace according to the second embodiment of Example 1. As shown in FIG. FIG. 9 is a schematic view schematically showing a gasification furnace according to the third embodiment of Example 1. As shown in FIG. FIG. 10 is a schematic view schematically showing a gasification furnace according to the fourth embodiment of Example 1. As shown in FIG. FIG. 11 is a schematic diagram schematically showing a gasification furnace according to the fifth embodiment of Example 1. As shown in FIG. FIG. 12 is a schematic view schematically showing a gasification furnace according to the sixth embodiment of Example 1. As shown in FIG. FIG. 13 is a schematic view schematically showing a gasification furnace according to a seventh embodiment of Example 1. As shown in FIG. FIG. 14 is a schematic diagram schematically showing the gasification furnace according to the first embodiment of Example 2. As shown in FIG. FIG. 15 is a schematic view schematically showing a gasification furnace according to a second embodiment of Example 2. As shown in FIG. FIG. 16 is a schematic diagram schematically illustrating a gasification furnace according to a third embodiment of Example 2. FIG. 17 is a schematic diagram schematically illustrating a gasification furnace according to a fourth embodiment of Example 2. FIG. 18 is a schematic diagram schematically illustrating the gasification furnace according to the first embodiment of Example 3. As illustrated in FIG. FIG. 19 is a schematic view schematically showing a gasification furnace according to the second embodiment of Example 3. As shown in FIG. FIG. 20 is a schematic diagram schematically illustrating a gasification furnace according to a third embodiment of Example 3. FIG. 21 is a schematic diagram schematically illustrating a gasification furnace according to a fourth embodiment of Example 3. FIG. 22 is a schematic diagram schematically illustrating a gasification furnace according to a fifth embodiment of Example 3. FIG. 23 is a schematic diagram schematically illustrating a gasification furnace according to a sixth embodiment of Example 3. FIG. 24 is a schematic diagram schematically illustrating a gasification furnace according to a seventh embodiment of Example 3. FIG. 25 is a schematic diagram schematically illustrating a gasification furnace according to an eighth embodiment of Example 3. FIG. 26 is a schematic diagram schematically illustrating the gasification furnace according to the ninth embodiment of Example 3. As illustrated in FIG. FIG. 27 is a schematic diagram schematically showing the gasification furnace according to the tenth embodiment of Example 3. As shown in FIG. FIG. 28 is a schematic diagram schematically illustrating a gasification furnace according to an eleventh embodiment of Example 3. FIG. 29 is a schematic diagram schematically showing a gasification furnace according to a twelfth embodiment of Example 3. As shown in FIG. FIG. 30 is a schematic diagram schematically illustrating a gasification furnace according to a thirteenth embodiment of Example 3.

Embodiments according to the present invention will be described below with reference to the drawings.

[Gasification equipment]
First, the whole structure of the gasifier 100 (gasification system) provided with the gasification furnace 102 which concerns on embodiment of this invention is demonstrated.

FIG. 1 is a schematic configuration diagram showing an overall configuration of a gasification apparatus 100 including a gasification furnace 102 according to an embodiment of the present invention.

As shown in FIG. 1, a gasifier 100 includes a storage hopper 101, a gasifier 102, a bag filter 103, a gas cooler 104, a scrubber 105, a circulating water tank 106 (water tank), and a cooling tower. 107, a gas filter 108, an induction blower 109, a pretreatment unit 110, a next process apparatus (in this example, a gas engine 111, more specifically, a gas engine power generation apparatus), a water seal, The tank 112 and the surplus gas combustion apparatus 113 (flare stack) are provided.

The storage hopper 101 stores the raw material F of the generated gas (in this example, fuel gas G). Here, as a raw material, the raw material containing a silica and potassium can be illustrated, For example, non-food crops, such as rice husks and rice straw, such as rice and wheat, can be mentioned. In this example, the raw material is rice husk biomass containing silica and potassium, and the fuel gas G is biogas. Therefore, the gasifier 100 is a biogasifier.

The gasification furnace 102 includes a raw material introduction unit 102a that introduces the raw material F stored in the storage hopper 101, and a single furnace 102b that generates fuel gas G from the raw material F introduced by the raw material introduction unit 102a. ing.

The raw material introduction unit 102a includes a raw material introduction conveyor 102a1 and a raw material introduction feeder 102a2 in this example. The raw material introduction conveyor 102a1 conveys the raw material F stored in the storage hopper 101 to the raw material introduction feeder 102a2. The raw material introduction feeder 102a2 introduces the raw material F that has been conveyed by the raw material introduction conveyor 102a1 into the furnace 102b. The gasification furnace 102 will be described in detail later.

The bag filter 103 removes unnecessary materials such as soot contained in the fuel gas G generated in the gasification furnace 102.

The gas cooler 104 is provided in the fuel gas supply path from the gasifier 102 to the gas engine 111. The gas cooler 104 cleans the fuel gas G from which unnecessary substances have been removed by the bag filter 103 with the cleaning water WW, and further cools it with the cooling water CW. The scrubber 105 is further cleaned by letting the fuel gas G cleaned and cooled by the gas cooler 104 submerge in the cleaning water WW.

The circulating water tank 106 stores the cleaning water WW supplied to the gas cooler 104 and the scrubber 105. The cooling tower 107 stores the cooling water CW supplied to the gas cooler 104.

The gas filter 108 removes unnecessary substances such as tar contained in the fuel gas G cleaned by the scrubber 105 by filtration. The induction blower 109 sucks the fuel gas G in the fuel gas supply path on the gasification furnace 102 side and discharges it to the fuel gas supply path on the gas engine 111 side and the fuel gas supply path on the surplus gas combustion device 113 side.

The pretreatment unit 110 removes impurities in the fuel gas G discharged to the fuel gas supply path on the gas engine 111 side by the induction blower 109. The gas engine 111 burns the fuel gas G from which impurities have been removed by the pretreatment unit 110.

The water seal tank 112 controls the pressure of the fuel gas G discharged to the fuel gas supply path on the gas engine 111 side by the induction blower 109. The surplus gas combustion device 113 burns the surplus fuel gas SG that has not been supplied to the gas engine 111 and flows when the pressure of the fuel gas G exceeds the pressure of the water sealing tank 112.

In the gasification apparatus 100 described above, the raw material F containing silica and potassium (in this example, rice husk) is introduced into the gasification furnace 102 by the raw material introduction unit 102a, and the combustible fuel gas G is generated in the gasification furnace 102. Is done. The fuel gas G generated in the gasification furnace 102 flows in the order of the bag filter 103, the gas cooler 104, the scrubber 105, the gas filter 108, and the induction blower 109, and the gas engine 111 side and surplus gas downstream of the induction blower 109. The fuel flows in a branched manner to the combustion device 113 side, the surplus gas combustion device 113 burns surplus fuel gas SG, and the gas engine 111 burns fuel gas G.

Specifically, the raw material F is stored in the storage hopper 101, and the raw material F in the storage hopper 101 is introduced into the gasifier 102 by the raw material introduction conveyor 102a1 and the raw material introduction feeder 102a2 in the raw material introduction portion 102a.

In the gasification furnace 102, the raw material F is incompletely burned to generate fuel gas G. The fuel gas G generated in the gasification furnace 102 is introduced into the bag filter 103 through the gas pipe 201. Here, the fuel gas G is a fuel gas containing carbon monoxide as a main component. The fuel gas G includes unnecessary substances such as soot, tar (tar below the allowable level generated in the gasifier 102), dust, and the like. It is included.

In the bag filter 103, unnecessary substances such as soot contained in the fuel gas G are removed by a filter called a filter cloth. The fuel gas G from which unnecessary substances such as soot have been removed by the bag filter 103 is introduced into the gas cooler 104 through the gas pipe 202.

A gas pipe (not shown) through which the fuel gas G flows is provided in the gas cooler 104. The fuel gas G in the gas pipe is cleaned with the cleaning water WW and the cooling water that flows around the gas pipe. Cooled with CW. The fuel gas G cleaned and cooled by the gas cooler 104 is introduced into the scrubber 105 through the gas pipe 203.

The cooling water CW supplied to the gas cooler 104 is stored in the cooling tower 107, and the cooling water CW in the cooling tower 107 is introduced into the gas cooler 104 through the water distribution pipe 204. The cooling water CW in the distribution pipe 204 is pumped to the gas cooler 104 side by the pump 205, and the fuel gas G is cooled by the gas cooler 104. The cooling water CW that has cooled the fuel gas G is led to the cooling tower 107 through the water distribution pipe 206.

The cleaning water WW is stored in the scrubber 105, and the fuel gas G is cleaned by diving in the cleaning water WW in the scrubber 105. The fuel gas G cleaned by the scrubber 105 is introduced into the gas filter 108 through the gas pipe 207.

Wash water WW supplied to the gas cooler 104 and the scrubber 105 is stored in the circulating water tank 106. The cleaning water WW in the circulating water tank 106 is introduced into the gas cooler 104 through the water distribution pipe 209 and is introduced into the scrubber 105 through the water distribution pipe 210 branched from the water distribution pipe 209. The cleaning water WW in the

distribution pipes

209 and 210 is pumped to the gas cooler 104 side and the scrubber 105 side by the pump 211, and the fuel gas G is cleaned by the gas cooler 104 and the scrubber 105. The cleaning water WW cleaned with the fuel gas G by the gas cooler 104 is led to the circulating water tank 106 through the water distribution pipe 212, while the cleaning water WW cleaned with the fuel gas G by the scrubber 105 circulates through the water distribution pipe 213. It is led out to the water tank 106.

In the gas filter 108, unnecessary substances such as tar contained in the fuel gas G are removed by filtration. The fuel gas G from which unnecessary substances such as tar are removed by the gas filter 108 is introduced into the induction blower 109 via the gas pipe 214.

In the attraction blower 109, the fuel gas G sucked from the fuel gas supply path on the upstream side of the attraction blower 109 is discharged to the fuel gas supply path on the downstream side of the attraction blower 109. In other words, the fuel gas supply path upstream of the induction blower 109 has a negative pressure, while the fuel gas supply path downstream of the induction blower 109 has a positive pressure. The fuel gas G is attracted to the downstream fuel gas supply path by the attracting blower 109.

The fuel gas G attracted by the attraction blower 109 is introduced into the gas engine 111 via the gas supply pipe 215 and the pretreatment unit 110 provided in the gas supply pipe 215. The fuel gas G from which impurities have been removed by the pretreatment unit 110 is supplied to the gas engine 111. In this example, the gas engine 111 includes a power generation device (not shown) driven by a gas engine unit (not shown), generates power with the power generation device, and uses exhaust heat of the gas engine unit to supply hot water, air conditioning, or the like. It is a cogeneration system used for

On the other hand, surplus fuel gas SG that has not been supplied to the gas engine 111 among the fuel gas G generated in the gasification furnace 102 is supplied from the gas supply pipe 215 that supplies the fuel gas G from the induction blower 109 to the gas engine 111 side. The surplus gas is supplied to the surplus gas combustion device 113 via the branching surplus gas supply pipe 216 and the water sealing tank 112 provided in the surplus gas supply pipe 216.

The surplus gas supply pipe 216 is provided on the upstream side of the water sealing tank 112 and is provided on the downstream side of the water sealing tank 112 and the upstream gas supply pipe 216 a that connects the induction blower 109 and the water sealing tank 112. A downstream gas supply pipe 216b that connects the sealing tank 112 and the surplus gas combustion device 113 is provided.

In the water sealing tank 112, water is sealed up to a predetermined water level. The water sealing tank 112 acts on the surplus fuel gas SG discharged from the upstream gas supply pipe 216a by applying water pressure to the surplus fuel gas in the downstream gas supply pipe 216b from the water sealing tank 112 to the surplus gas combustion device 113. The supply amount of SG is controlled. Thereby, the water sealing tank 112 can control the pressure of the fuel gas G in the gas supply pipe 215.

In the surplus gas combustion device 113, surplus fuel gas SG sent through the upstream gas supply pipe 216a, the water sealing tank 112, and the downstream gas supply pipe 216b is burned in the surplus gas combustion section 113a.

Next, the gasification furnace 102 will be described below with reference to FIGS. 2 and 3.

[Gasification furnace]
The gasification furnace 102 according to the present embodiment is a gasification furnace that generates a fuel gas G by oxidizing the raw material F.

FIG. 2 is a schematic side view showing a part of the gasification furnace 102 shown in FIG. 1 in a broken state, and shows a state in which the raw material F is oxidized and gasified.

In the gasification furnace 102, the raw material F is pyrolyzed to generate a fuel gas G (for example, carbon monoxide or hydrogen). In the process of generating the fuel gas G, the raw material F is carbonized, the char R (carbide) that is carbonized is burned, and the burned ash S is discharged to the outside. In this example, the raw material F is introduced together with an oxidizing agent H such as air.

The gasification furnace 102 includes a raw material introduction part 102a for introducing the raw material F, an oxidant introduction part 102d for introducing the oxidant H, and a fuel gas outflow part 102e for letting out the fuel gas G.

The raw material introduction part 102a is provided above the uppermost part δxa of a predetermined predetermined char layer δx (in this example, an assumed char deposition layer). The oxidant introduction portion 102d is provided below the opening 102ah (the raw material dropping portion in this example) in the raw material introduction portion 102a. The fuel gas outflow portion 102e is provided above the opening 102dh in the oxidant introduction portion 102d.

Specifically, the raw material introduction part 102a is provided on the top surface 102b1 (upper surface) of the furnace 102b. In addition, the raw material introducing | transducing part 102a may be provided in side 102b2 upper part of the furnace 102b.

The gasification furnace 102 further includes a preheating part 102c (in this example, a temperature rising burner) for preheating the inside of the furnace 102b, and a discharge part 102f for discharging the ash S and moving the char R downward.

The preheating unit 102c is a temperature rising burner that preheats using combustion of fossil fuel such as propane gas. The preheating unit 102c includes a gas supply unit 102c1 provided on the side surface 102b2 of the furnace 102b, a gas cylinder 102c2 connected to the gas supply unit 102c1 and configured to supply the combustible gas g (propane gas in this example) to the gas supply unit 102c1. It has. Thereby, the preheating part 102c can preheat the inside of the furnace 102b by combustion of the combustible gas g supplied from the gas cylinder 102c2 via the gas supply part 102c1.

The oxidizing agent introduction part 102d is provided on the side surface 102b2 of the furnace 102b. The opening 102dh in the oxidant introduction portion 102d is formed so that the introduction direction of the oxidant H is along the horizontal direction, the substantially horizontal direction, or upward (for example, obliquely upward).

The fuel gas outflow portion 102e is provided on the top surface 102b1 of the furnace 102b. The fuel gas outflow portion 102e may be provided on the upper side surface 102b2 of the furnace 102b.

The discharge unit 102f is provided on the bottom surface 102b3 (lower surface) of the furnace 102b. The discharge unit 102f includes an ash discharge conveyor 102f1 that discharges the ash S flowing out of the furnace 102b to the outside.

By the way, in the conventional gasification furnace, as described above, when the temperature is higher than the temperature necessary for thermal decomposition of tar (specifically, about 800 ° C. or higher) in order to suppress the generation of tar, crystalline silica On the other hand, if the oxidizing atmosphere is set to a relatively low temperature (for example, a temperature lower than about 800 ° C.) in order to suppress the generation of crystalline silica, the generation of tar cannot be suppressed.

In this regard, in the operation method of the gasification furnace 102 according to the present embodiment, the oxidation region α for oxidizing the raw material F is set to a predetermined temperature (for example, 1050 ° C.) or a predetermined temperature range (for example, 1050 ° C. as the central temperature). The raw material F is allowed to pass through the oxidation zone α within a predetermined time range (for example, about 2 minutes) while being maintained within a predetermined temperature range of 1000 ° C. to 1100 ° C. The gasification furnace 102 according to the present embodiment has a predetermined temperature (for example, 1050 ° C.) or a predetermined temperature range (for example, 1000 ° C. to 1100 ° C. with a central temperature of 1050 ° C.) as the oxidation region α for oxidizing the raw material F. A first means for maintaining the temperature within a predetermined temperature range; and a second means for allowing the raw material F to pass through the oxidation zone α within a predetermined time range (for example, about 2 minutes). In other words, in the present embodiment, since the raw material F is heated in an oxidizing atmosphere equal to or higher than the tar pyrolysis temperature, which is a temperature necessary for thermal decomposition of tar, the temperature of the raw material F itself is higher than that of crystalline silica. The generation of tar is suppressed to an allowable level or less until the temperature at which the crystalline silica is formed or the temperature near the crystalline silica forming temperature is reached.

Here, “maintaining at a predetermined temperature” is a concept including not only maintaining at a constant temperature but also maintaining at a substantially constant temperature. Moreover, as the oxidizing agent H, a gas containing oxygen (typically air) can be exemplified. The oxidant H may be pure or substantially pure oxygen, but in this example, it is air. Further, “passing the raw material F through the oxidation zone α” is a concept including passing the char R through the oxidation zone α. In addition, the “temperature in the vicinity of the crystalline silica formation temperature” is a temperature at which the generation of crystalline silica can be made to an allowable level or lower even if the crystalline silica formation temperature is exceeded.

In this example, the gasification furnace 102 allows the raw material F to pass through the oxidation zone α within a predetermined time (for example, about 2 minutes), and then is adjacent to the oxidation zone α at a predetermined temperature or a predetermined temperature range in the oxidation zone α. It reaches the low temperature range β at a temperature lower than the central temperature or the lower limit temperature (specifically, a temperature lower than the crystalline silica formation temperature). The gasification furnace 102 may be configured to allow the raw material F to pass through the low temperature region β and then reach the oxidation region α.

Specifically, the first means includes an oxidant introduction part 102d. The second means includes a raw material introduction part 102a and a discharge part 102f.

The introduction amount of the oxidant H from the oxidant introduction unit 102d per unit time is determined based on the predetermined introduction amount of the raw material F and the preset discharge amount of the ash S in the furnace 102b at a predetermined temperature (for example, 1050 ° C.) or It is set to a predetermined value by a predetermined experiment or the like so as to be maintained within a predetermined temperature range (for example, a predetermined temperature range of 1000 ° C. to 1100 ° C. with 1050 ° C. being the central temperature).

The introduction amount per unit time of the raw material F from the raw material introduction unit 102a and the discharge amount per unit time of the ash S from the discharge unit 102f, that is, the char layer δ (in this example, the char deposition layer on which the char R is deposited) The movement distance per unit time of the char R at the time is determined in advance so that the oxidation zone passage time tp, which is the time for the raw material F to pass through the oxidation zone α, is within a predetermined time range (about 2 minutes in this example). It is set to a predetermined value.

Here, the oxidation zone passage time tp is the time from when the raw material F is introduced and enters the oxidation zone α until it exits the oxidation zone α. In this example, the oxidation zone passage time tp is introduced from the oxidant introduction part 102d into the furnace 102b. It also includes the time during which the raw material F falls freely until it reaches the char layer δ. The falling distance of the raw material F from the raw material introducing portion 102a may be set so that the oxidation zone passage time tp is within a predetermined time range.

Further, the oxidation region α is not limited to this, but includes, for example, a region from the opening 102dh through which the oxidant H is introduced to the outlet 102eh of the fuel gas G.

In FIG. 2, the control device 102g and the thermocouple 102h which are not described will be described later.

FIG. 3 is an explanatory diagram for explaining the oxidation region α, and is an enlarged view showing the vicinity of the boundary between the combustion gas layer γ and the char layer δ in the furnace 102b shown in FIG. FIG. 3A shows an example in which the top portion δa of the char layer δ is set so that the char layer δ is not in contact with the oxidant H or is in contact with the surface. FIG. 3B shows an example in which the top portion δa of the char layer δ is set so that the inner side of the char layer δ is located at a position where the char layer δ comes into contact with the oxidizing agent H.

Here, the position where the char layer δ is brought into contact with the surface of the oxidant H and the top δa (see FIG. 3A) is a position where the oxidant H is introduced toward the surface of the char layer δ. The position where the inner side of the char layer δ is in contact with the oxidant H (see FIG. 3B) is a position where the oxidant H is introduced toward the side of the char layer δ.

It should be noted that the position of the top portion δa of the char layer δ is the introduction amount of the raw material F from the raw material introduction portion 102a and the discharge amount of the ash S from the discharge portion 102f, that is, the movement distance per unit time of the char R in the char layer δ. It can be adjusted by adjusting. For example, a predetermined introduction amount of the raw material F and a predetermined discharge amount of the ash S that maintain the position of the top portion δa of the char layer δ constant or substantially constant are adjusted in advance to raise the position of the top portion δa of the char layer δ. In some cases, the raw material F is set to a predetermined introduction amount after the predetermined amount of introduction of the raw material F is made larger than the predetermined discharge amount of the ash S or the predetermined discharge amount of the ash S is made smaller than the predetermined introduction amount by the distance to be raised. Alternatively, when the ash S is returned to the predetermined discharge amount, and the position of the top portion δa of the char layer δ is lowered, the predetermined introduction amount of the raw material F is made smaller than the predetermined discharge amount of the ash S or the predetermined amount of the ash S is decreased. For example, after the operation is performed with the discharge amount larger than the predetermined introduction amount, the raw material F is returned to the predetermined introduction amount or the ash S is returned to the predetermined discharge amount.

As shown in FIG. 3, the oxidation region α is not only the region of the combustion gas layer γ (see FIGS. 3 (a) and 3 (b)), but also the char layer δ (a char deposition layer or a char fluidized layer, in this example). In the case where the char deposit layer is present and exposed to the oxidant H, the region of the char layer δ is also exposed to the oxidant H (see FIG. 3B).

In the gasification furnace 102 described above, first, the inside of the furnace 102b is preheated to a predetermined temperature or a predetermined temperature range by the preheating unit 102c, and the oxidation zone α is formed in advance. Here, the predetermined temperature (for example, 1050 ° C.) or the predetermined temperature range (for example, 1000 ° C. to 1100 ° C. with 1050 ° C. as the central temperature) is the thermal decomposition temperature of the raw material F (for example, about 400 ° C. when the raw material F is rice husk). ) Above temperature or temperature range. Next, when the raw material introduction part 102a is operated and the raw material F is introduced from the raw material introduction part 102a, the raw material F is thermally decomposed. Further, the oxidant introduction unit 102d is operated to introduce the oxidant H from the oxidant introduction unit 102d. Then, the oxidation region α is maintained within a predetermined temperature (for example, 1050 ° C.) or a predetermined temperature range (for example, 1000 ° C. to 1100 ° C. with 1050 ° C. being the central temperature), and the raw material F is within the oxidation region α within a predetermined time range (in this example) Then let it pass in about 2 minutes). At this time, the raw material F is carbonized, the carbonized char R (carbide) is burned, and the burned ash S is discharged to the outside by the discharge unit 102f, while the generated fuel gas G is discharged from the fuel gas outflow unit 102e.

According to the present embodiment, the oxidation region α for oxidizing the raw material F is maintained at a predetermined temperature (for example, 1050 ° C.) or a predetermined temperature range (for example, 1000 ° C. to 1100 ° C. with 1050 ° C. being the central temperature). Since it passes through the oxidation zone α within a predetermined time range (in this example, about 2 minutes), in other words, the temperature of the raw material F itself is crystallized from the time when the raw material F is heated in an oxidizing atmosphere higher than the tar pyrolysis temperature. Generation of tar is suppressed to an allowable level or less before reaching a temperature near the crystalline silica formation temperature or a temperature near the crystalline silica formation temperature, so that a fuel gas G is produced using a raw material containing silica and potassium (for example, rice husk) as the raw material F In doing so, in the same process (at the same time and in the same space), a predetermined temperature (for example, 1050 ° C.) or a predetermined temperature range (for example, 1000 ° C. with a central temperature of 1050 ° C.) Even if the raw material F is oxidized in an oxidizing atmosphere of 1100 ° C., if the oxidation zone passage time tp is within a predetermined time range (in this example, about 2 minutes), tar generation is suppressed and crystalline silica is suppressed. Therefore, it is possible to realize a gasification furnace based on the new knowledge of the present inventors that the production of methane can be suppressed. Thereby, in producing | generating fuel gas G, it becomes possible to make compatible both suppression of generation | occurrence | production of a tar and the production | generation of crystalline silica simultaneously.

Next, since it was confirmed whether or not both the generation of tar and the generation of crystalline silica could be suppressed, this will be described below.

FIG. 4 is a graph showing a diffraction pattern by X-ray diffraction of silica in the ash S obtained from the gasification furnace 102 according to the present embodiment using rice husk as a raw material F, compared with the case of crystalline silica. FIG. 4A shows the result of the top portion δa of the char layer δ performed at the position shown in FIG. 3A, and FIG. 4B shows the top portion δa of the char layer δ as shown in FIG. The result performed at the position shown in FIG. In FIG. 4, a solid line represents a diffraction pattern by X-ray diffraction of silica generated in the gasification furnace 102 according to the present embodiment, and a broken line represents a diffraction pattern by X-ray diffraction of crystalline silica. .

The X-ray diffractometer analyzes diffraction that occurs when X-rays are scattered and interfered by electrons around the atoms of the sample when the sample is irradiated with X-rays. Therefore, if the silica is amorphous, X-rays are scattered and interfered to make the diffraction pattern gentle, and if the silica is crystalline, the X-ray is reflected at a certain diffraction angle and has a steep peak. It becomes a diffraction pattern.

As shown in FIG. 4, the silica in the ash S obtained by the gasification furnace 102 according to the present embodiment is such that the top δa of the char layer δ is positioned at the position shown in FIG. 3A (see FIG. 4A). ) And at any of the positions shown in FIG. 3B (see FIG. 4B), it is amorphous, and crystalline silica is confirmed by the diffraction pattern by X-ray diffraction. I couldn't.

In addition, as a result of quantitative analysis of crystalline silica, it was found that it was below an acceptable level.

On the other hand, it was found that the tar in the fuel gas G obtained from the gasification furnace 102 according to the present embodiment using rice husks as the raw material F is also below the allowable level. In addition, the fuel gas generated in the gasification furnace 102 according to the present embodiment using rice husks as the raw material F can be used without problems in the next process (for example, the gas engine 111), and the amount of heat necessary for the next process ( For example, it has been found that the heat quantity necessary for operating the gas engine 111).

As described above, the crystalline silica formation temperature varies depending on the potassium concentration.

FIG. 5 is a graph showing the relationship between the crystalline silica formation temperature Tc and the potassium concentration Kc.

As shown in FIG. 5, for example, when potassium is not present, the crystalline silica formation temperature Tc is 1350 ° C., whereas as the potassium concentration Kc increases, the crystalline silica formation temperature Tc gradually increases. It decreases (for example, the temperature decreases to 750 ° C.).

Specifically, in the gasification furnace 102 and the operation method of the gasification furnace 102 according to the present embodiment, the predetermined temperature or the predetermined temperature range is a temperature equal to or higher than the tar pyrolysis temperature or a temperature range having the temperature as a central temperature. . Further, the predetermined time range is the crystalline silica which is the time required to suppress the generation of crystalline silica to the allowable level or more, and the time required to suppress the generation of crystalline silica to the allowable level or less. It is less than the generation allowable time.

According to the present embodiment, when generating the fuel gas G using the raw material F (for example, rice husk) containing silica and potassium as the raw material, the tar pyrolysis temperature (for example, the same time and the same space) 1000 ° C.) or higher at a predetermined temperature (for example, 1050 ° C.) or a predetermined temperature range (for example, a temperature range in which 1050 ° C. is the central temperature). If it is within the predetermined time range (for example, 2 minutes) below crystalline silica production allowable time, while generating | generating tar is reliably suppressed, the production | generation of crystalline silica can be suppressed reliably.

Here, the tar generation allowable time is a time when tar is not generated or is an allowable generation amount even if tar is generated. The allowable level of tar can be a level at which the tar level does not impede practically. When tar is removed in a subsequent process (for example, an apparatus such as a scrubber 105), the tar level after removal in the subsequent process is reduced. The level can be a level that does not impede practical use. Further, the crystalline silica production allowable time is a time when the crystalline silica is not produced, or the production amount is acceptable even if crystalline silica is produced. The acceptable level of crystalline silica can be a level defined in view of the effect of crystalline silica.

As the predetermined temperature or the predetermined temperature range, for example, although not limited thereto, any temperature in the range of 900 ° C. to 1100 ° C. or a temperature range in which the temperature is the central temperature can be exemplified. If the central temperature of the predetermined temperature or the predetermined temperature range is below 900 ° C., tar generation tends to exceed an allowable level. On the other hand, if the central temperature of the predetermined temperature or the predetermined temperature range exceeds 1100 ° C., the oxidation zone passage time tp becomes too short. Further, the oxidation region passage time tp within the predetermined time range depends on, for example, the potassium concentration Kc in the raw material F containing silica and potassium. For example, the potassium concentration at which the crystalline silica formation temperature Tc is 750 ° C. In the case of Kc, about 5 minutes can be mentioned when the central temperature of the predetermined temperature or the predetermined temperature range is 900 ° C., and about 1 minute 30 seconds when the central temperature of the predetermined temperature or the predetermined temperature range is 1100 ° C. .

Note that when the raw material F passes through the oxidation zone α (during the passage), the gasification furnace 102 has a predetermined predetermined amount of heat necessary for the next process (in this example, necessary for operating the gas engine 111). Or a fuel gas having a predetermined heat amount or more in the low temperature region β before and / or after the raw material F passes through the oxidation region α. It may be.

[Correlation between oxidizing atmosphere temperature and crystalline silica formation temperature arrival time]
In the operation method of the gasification furnace 102 according to the present embodiment, the oxidizing atmosphere temperature T in the oxidation region α and the temperature of the raw material F itself reaches the crystalline silica generation temperature Tc from the time when the raw material F enters the oxidation region α. Based on the correlation ρ (see FIG. 6 and [Table 1] described later) with the crystalline silica formation temperature arrival time tc, which is the time until the oxidation, the oxidation within the predetermined temperature or the central temperature of the predetermined temperature range and the predetermined time range The band transit time tp is determined. The gasification furnace 102 according to the present embodiment has a predetermined temperature or a central temperature within a predetermined temperature range and an oxidation region within a predetermined time range based on the correlation ρ between the oxidizing atmosphere temperature T and the crystalline silica formation temperature arrival time tc. Third means for determining the passage time tp is further provided.

The third means controls the operation of the first means (specifically, the oxidant introduction part 102d) and the second means (specifically, the raw material introduction part 102a and the discharge part 102f).

Specifically, the gasification furnace 102 includes a control device 102g (see FIG. 2) that controls the entire gasification furnace 102, and temperature detection means (in this example, a thermocouple 102h) that detects the temperature of the oxidation zone α in the furnace 102b. ). The third means constitutes part of the control means of the control device 102g. The thermocouple 102h is provided in the oxidation region α.

The control device 102g includes a processing unit 102g1 (see FIG. 2) including a microcomputer such as a CPU (Central Processing Unit), a nonvolatile memory such as a ROM (Read Only Memory), and a volatile memory such as a RAM (Random Access Memory). And a storage unit 102g2 (see FIG. 2) including a timer function.

In the control device 102g, the processing unit 102g1 loads and executes a control program stored in advance in the ROM of the storage unit 102g2 on the RAM of the storage unit 102g2, thereby performing operation control of various components. .

The control device 102g controls the operation of the raw material introduction unit 102a to adjust the introduction amount of the raw material F from the raw material introduction unit 102a per unit time (specifically, the conveyance speed of the raw material introduction conveyor 102a1). The control device 102g controls the operation of the oxidant introduction unit 102d to adjust the amount of oxidant H introduced from the oxidant introduction unit 102d per unit time. The control device 102g controls the discharge unit 102f to discharge the ash S from the discharge unit 102f per unit time (specifically, the conveyance speed of the ash discharge conveyor 102f1), that is, the char R in the char layer δ. Adjust the downward movement distance per unit time. The thermocouple 102h transmits an electrical signal related to the detected temperature of the oxidation zone α to the control device 102g. The control device 102g detects (recognizes) the temperature of the oxidation zone α based on an electrical signal related to the temperature of the oxidation zone α.

Then, the control device 102g uses the amount of introduction of the raw material F from the raw material introduction unit 102a per unit time and the amount of discharge of the ash S from the discharge unit 102f per unit time within the predetermined time range. tp can be set.

According to this embodiment, even if the predetermined temperature or the predetermined temperature range or / or the oxidation zone passage time tp within the predetermined time range may be changed, the oxidizing atmosphere temperature T and the crystalline silica formation temperature arrival time tc Is used for a predetermined temperature or a predetermined temperature range corresponding to the oxidation atmosphere temperature T in the oxidation region α, and / or an oxidation region passage time tp within a predetermined time range corresponding to the crystalline silica formation temperature arrival time tc. Can be easily changed (for example, automatically or manually, in this example, automatically by a control operation by the control device 102g).

(Correlation function formula)
According to the knowledge of the present inventors, when the oxidizing atmosphere temperature T is lower than the crystalline silica generation temperature Tc (750 ° C. in this example), no crystalline silica is generated, and the crystalline silica generation temperature arrival time tc is It becomes infinite in theory. On the other hand, the crystalline silica formation temperature arrival time tc is not practically 0 minutes. From the graph of the experimental results (see FIG. 6), the correlation ρ between the oxidizing atmosphere temperature T and the crystalline silica formation temperature arrival time tc can be regarded as an inversely proportional relationship.

FIG. 6 is a graph showing the correlation ρ between the oxidizing atmosphere temperature T and the crystalline silica formation temperature arrival time tc obtained as a result of the experiment when the crystalline silica formation temperature is 750 ° C.

As shown in FIG. 6, the correlation ρ between the oxidizing atmosphere temperature T and the crystalline silica formation temperature arrival time tc can be made to correspond to the correlation function equation κ shown by the following equation [1].

However, in Formula [1], T is an oxidizing atmosphere temperature, t is a crystalline silica production allowable time, tmin is a tar generation allowable time, and a, b, and c are components of the raw material F. It is a constant that varies depending on the amount (particularly the potassium concentration).

Here, the constants a, b, c, and d are values that can be calculated by experiments and / or simulations performed in advance, and depend on the component amount of the raw material F (for example, rice husk), in particular, the concentration of potassium.

The constants a, b, c, and d are four simultaneous equations obtained by substituting the values of (T, t) at four points obtained by experiments or the like into the equation [1], for example, the raw material F is crystalline. In the case of a raw material having a potassium content concentration at which the silica formation temperature is 750 ° C., the first equation obtained from Equation [1] when T = 900 ° C. and t = 5 minutes, T = 950 ° C., t = 4 The second equation obtained from the equation [1] when minutes are taken, the third equation obtained from the equation [1] when T = 1050 ° C. and t = 2 minutes, and T = 1100 ° C., t = 1 It can be obtained by solving four simultaneous equations with the fourth equation obtained from the equation [1] when the time is 30 minutes.

The expression κ of the correlation function indicating the correlation ρ between the oxidizing atmosphere temperature T and the crystalline silica formation temperature arrival time tc is stored in advance in the storage unit 102g2.

The control device 102g can detect (recognize) the crystalline silica formation temperature arrival time tc from the oxidizing atmosphere temperature T. Thereby, the control apparatus 102g can make the predetermined time range (oxidation zone passage time tp) according to the oxidation atmosphere temperature T into the range enclosed by the oblique line shown in FIG. On the other hand, the control device 102g can detect (recognize) the oxidizing atmosphere temperature T from the crystalline silica generation temperature arrival time tc. Thereby, the control apparatus 102g can make the center temperature (oxidation atmosphere temperature T) of the predetermined temperature or predetermined temperature range according to the crystalline silica production temperature arrival time tc into the range enclosed by the oblique line shown in FIG.

The control device 102g can control the predetermined time range or / or the predetermined temperature or the predetermined temperature range so as to satisfy the relationship of the expression [1]. Further, the operator can set a predetermined time range or / or a predetermined temperature or a predetermined temperature range so as to satisfy the relationship of Expression [1].

According to such a configuration, the control configuration for setting the predetermined time range or / or the predetermined temperature or the predetermined temperature range can be easily and easily realized by using the correlation function expression κ.

(Correlation table)
The correlation ρ between the oxidizing atmosphere temperature T and the crystalline silica formation temperature arrival time tc should correspond to the correlation table shown in [Table 1] below based on the raw material F having a predetermined content concentration of potassium. Can do.

However, in [Table 1], T is the oxidizing atmosphere temperature, t is the allowable time for crystalline silica formation, and t (small K) is a raw material less than the concentration of potassium contained in the reference raw material F F represents the allowable time for crystalline silica production in F, and t (large K) represents the allowable time t for crystalline silica production in raw material F that is higher than the content concentration of potassium in reference raw material F. A, B, C, D, and E are set values for the allowable time t of crystalline silica generation with respect to the oxidizing atmosphere temperature T, and are set values that vary depending on the amount of the component of the raw material F (particularly, the potassium concentration). The set value is equal to or longer than the allowable generation time tmin. A, B, C, D, and E satisfy the relationship of A> B> C> D> E.

Here, the set values A, B, C, D, and E are values that can be set by experiments and / or simulations performed in advance, and the component amount of the raw material F (for example, rice husk) (particularly, the potassium concentration) Depends on.

For example, when the reference raw material is a raw material having a potassium concentration at which the crystalline silica formation temperature is 750 ° C., A in [Table 1] is 5 minutes or approximately 5 minutes, and B is 4 minutes or approximately 4 minutes. , C can be 2 minutes 50 seconds or approximately 2 minutes 50 seconds, D can be 2 minutes or approximately 2 minutes, and E can be 1 minute 30 seconds or approximately 1 minute 30 seconds.

The correlation table showing the correlation ρ between the oxidizing atmosphere temperature T and the crystalline silica formation temperature arrival time tc is stored in advance in the storage unit 102g2.

The control device 102g can control the predetermined time range or / or the predetermined temperature or the predetermined temperature range so as to satisfy the relationship of [Table 1]. Further, the operator can set a predetermined time range or / or a predetermined temperature or a predetermined temperature range so as to satisfy the relationship of [Table 1].

According to such a configuration, by using the correlation table, a control configuration for setting a predetermined time range or / or a predetermined temperature or a predetermined temperature range can be realized easily and easily.

(Correlation setting)
In the present embodiment, the correlation ρ is set or updated when the gasification furnace 102 is installed or when the source of the raw material F is determined or changed.

In the present embodiment, the correlation ρ is measured for the raw material F at the place where the gasification furnace 102 is installed or the raw material F is procured, or with respect to the raw material F having various component amounts (particularly, the potassium concentration). The correlation ρ with respect to the raw material F of various component amounts is obtained by conducting experiments in advance, and the component amount of the raw material F at the place where the gasification furnace 102 is installed or where the raw material F is procured (particularly the potassium concentration) ), And the location of the gasification furnace 102 or the procurement of the raw material F from various correlations ρ to ρ obtained in advance through experiments or the like based on the amount of the raw material F component (particularly the potassium concentration) The correlation ρ to be applied to the raw material F at the ground is selected, and the generation of tar according to the amount of the component of the raw material F (particularly the potassium concentration) at the place where the gasifier 102 is installed or the raw material F is procured Suppression of both crystalline silica formation and It is possible to adjust the oxidizing atmosphere temperature T of the oxidation zone α and the oxidation zone passage time tp of the raw material F that simultaneously balance the control. The various correlations ρ to ρ can be set (stored) in the storage unit 102g2 in advance.

[About preheating]
In the operation method of the gasification furnace 102 according to the sixth embodiment, before the raw material F is introduced, the inside of the furnace 102b is preheated to a predetermined temperature or a predetermined temperature range. The gasification furnace 102 according to the present embodiment further includes a fourth means for preheating the inside of the furnace 102b to a predetermined temperature or a predetermined temperature range before introducing the raw material F. Specifically, the fourth means includes a preheating portion 102c.

According to such a configuration, the gasification process can be performed quickly by preheating (heating in advance) the inside of the furnace 102b to a predetermined temperature or a predetermined temperature range before introducing the raw material F.

In the gasification furnace 102 according to the present embodiment, the control device 102g allows the temperature of the oxidation zone α to be maintained at a predetermined temperature by the detected temperature from the thermocouple 102h or enters a predetermined temperature range. The amount of raw material F introduced from the raw material introduction unit 102a per unit time, the amount of oxidant H introduced from the oxidant introduction unit 102d per unit time, the amount of ash S discharged from the discharge unit 102f per unit time, That is, at least one of the downward moving distances per unit time of the char R in the char layer δ may be adjusted.

[Example 1]
Next, another embodiment (Example 1) of the gasification furnace 102 according to the present embodiment will be described below with reference to FIGS.

7 to 13 are schematic views schematically showing other embodiments of the gasification furnace 102 according to the present embodiment. 7 to 13 show gasification furnaces 1021A to 1021G according to the first to seventh embodiments of Example 1, respectively. 7 to 13, the control device 102g and the like are not shown.

In the gasification furnaces 1021A to 1021G shown in FIG. 7 to FIG. 13, the same reference numerals are given to substantially the same configurations as those of the gasification furnace 102 shown in FIG.

(First embodiment)
A gasification furnace 1021A according to the first embodiment shown in FIG. 7 is a gasification furnace for depositing char R to form a char layer δ (specifically, a char deposition layer). This is a gasification furnace (so-called fixed bed type updraft gasification furnace) that flows upward.

In the gasification furnace 1021A, in the gasification furnace 102 shown in FIG. 2, the material introduction part 102a is provided above the uppermost part δxa of the assumed char layer δx, and the oxidant introduction part 102d is provided from the uppermost part δxa of the assumed char layer δx. Is provided above and below the opening 102ah in the raw material introduction portion 102a.

In addition, the opening 102dh in the oxidant introduction portion 102d is formed such that the introduction direction of the oxidant H is along the horizontal direction or upward (for example, obliquely upward) from the horizontal direction. The fuel gas outflow portion 102e is provided above the opening 102dh in the oxidant introduction portion 102d.

Specifically, the fuel gas outflow portion 102e is provided below the opening 102ah in the raw material introduction portion 102a. The oxidant introduction portion 102d is provided at one place or a plurality of places (two places in this example).

In this example, the raw material introduction portion 102a is provided on the top surface 102b1 of the furnace 102b, and the oxidant introduction portion 102d and the fuel gas outflow portion 102e are provided on the side surface 102b2 of the furnace 102b.

According to the first embodiment, it can be configured that the raw material F surely falls in the oxidation zone α, and thus the raw material F can be reliably passed through the oxidation zone α within a predetermined time range. Furthermore, the raw material introduction portion 102a is provided above the uppermost portion δxa of the assumed char layer δx, and the fuel gas outflow portion 102e is provided above the opening 102dh in the oxidant introduction portion 102d, so that the char layer δ Thus, the introduction of the oxidant H and the outflow of the fuel gas G can be avoided, and the oxidation zone α can be reliably controlled within a predetermined temperature or a predetermined temperature range.

In addition, in the gasification furnace 1021A according to the first embodiment, the arrangement position of the raw material introduction part 102a and the arrangement position of the fuel gas outflow part 102e may be switched.

(Second Embodiment)
The gasification furnace 1021B according to the second embodiment shown in FIG. 8 is provided with at least one (both in this example) of the endothermic reactant introduction part 102i and the heat capacity agent introduction part 102j in the gasification furnace 1021A shown in FIG. It is a thing.

The gasification furnace 1021B further includes an endothermic reactant introduction unit 102i that introduces the endothermic reactant M and a heat capacity agent introduction unit 102j that introduces the heat capacity agent N. The gasification furnace 1021B may include either one of the endothermic reactant introduction unit 102i and the heat capacity agent introduction unit 102j.

At least one of the endothermic reactant introduction part 102i and the heat capacity agent introduction part 102j (both in this example) is provided at a position facing the assumed char layer δx of the furnace 102b. In this example, both the endothermic reactant introduction part 102i and the heat capacity agent introduction part 102j are provided on the bottom face 102b3 of the furnace 102b.

Here, as the endothermic reactant M, any one that causes an endothermic reaction may be used, and examples thereof include water vapor and carbon dioxide. As the heat capacity agent N, any material can be used as long as it increases the heat capacity of the char layer δ, and examples thereof include nitrogen.

According to the second embodiment, an endothermic reaction of an endothermic reactant M (for example, water vapor or carbon dioxide) or a cooling effect by adding an endothermic reactant M (for example, a low-temperature substance) and / or a char layer by a heat capacity agent N (for example, nitrogen). With the effect of improving the heat capacity of δ, it is possible to effectively prevent the low temperature region β of the char layer δ from reaching the predetermined temperature or the lower limit temperature of the predetermined temperature range.

(Third embodiment)
A gasification furnace 1021C according to the third embodiment shown in FIG. 9 is obtained by providing a char layer temperature control unit 102k in the gasification furnace 1021A shown in FIG.

The gasification furnace 1021C further includes a char layer temperature control unit 102k that controls the temperature of the char layer δ. The char layer temperature control unit 102k includes a part of the control device 102g.

The char layer temperature control section 102k is provided on the outer surface of the region corresponding to the assumed char layer δx of the furnace 102b (in this example, a part of the side surface 102b2 and the bottom surface 102b3 of the furnace 102b).

Specifically, the char layer temperature control unit 102k includes a heat exchange unit 102k1 for flowing a heat exchange medium W such as water, a supply unit 102k2 for supplying the heat exchange medium W to the heat exchange unit 102k1, and a heat exchange from the heat exchange unit 102k1. And a discharge unit 102k3 for discharging the medium W. The supply unit 102k2 and the discharge unit 102k3 are connected to a circulation pump and a temperature control unit that are not shown. The char layer temperature control unit 102k is configured to circulate the heat exchange medium W, the temperature of which has been adjusted by the temperature adjustment unit, of the supply unit 102k2, the heat exchange unit 102k1, and the supply unit 102k2 using a circulation pump.

Further, the char layer temperature control unit 102k includes temperature detection means (in this example, a thermocouple 102k4) that detects the temperature of the low temperature region β in the furnace 102b. The thermocouple 102k4 is provided in a portion where the temperature of the low temperature region β is expected to be highest, in this example, in the adjacent portion of the oxidation region α and the low temperature region β (near the boundary of the low temperature region β).

The char layer temperature control unit 102k controls the operation of the circulation pump to adjust the circulation amount per unit time of the heat exchange medium W by the circulation pump. The char layer temperature control unit 102k controls the temperature adjustment unit to adjust the temperature of the heat exchange medium W by the temperature adjustment unit. The thermocouple 102k4 transmits an electrical signal related to the detected temperature in the low temperature region β to the char layer temperature control unit 102k. The char layer temperature control unit 102k detects (recognizes) the temperature of the low temperature region β by an electrical signal related to the temperature of the low temperature region β.

When the temperature of the low temperature region β is equal to or higher than the predetermined temperature or the lower limit temperature of the predetermined temperature range due to the detected temperature from the thermocouple 102k4, the char layer temperature control unit 102k is configured to fall below the predetermined temperature or the lower limit temperature of the predetermined temperature range. The low-temperature region β is cooled by adjusting the circulation amount per unit time of the heat exchange medium W by the circulation pump and the temperature of the heat exchange medium W by the temperature adjusting unit. On the other hand, the char layer temperature control unit 102k exceeds the predetermined low temperature when the temperature in the low temperature region β is equal to or lower than a predetermined temperature or a predetermined low temperature lower than the predetermined temperature range due to the detected temperature from the thermocouple 102k4. As described above, the low-temperature region β is heated by adjusting the circulation amount per unit time of the heat exchange medium W by the circulation pump and the temperature of the heat exchange medium W by the temperature adjusting unit.

According to the third embodiment, it is possible to effectively prevent the low temperature region β including the char layer δ from reaching the predetermined temperature or the lower limit temperature of the predetermined temperature range due to the cooling effect of the char layer temperature control unit 102k. Further, for example, when the temperature of the low temperature region β including the char layer δ at the start of operation is equal to or lower than a predetermined low temperature, the char layer δ is heated to a temperature equal to or higher than the temperature that promotes volatilization of the gas remaining in the char R. The volatilization of the gas remaining in the char R can be promoted by maintaining the temperature.

(Fourth embodiment)
A gasification furnace 1021D according to the fourth embodiment shown in FIG. 10 is a gasification furnace for depositing char R to form a char layer δ (specifically, a char deposition layer). It is a gasification furnace (so-called fixed bed type downdraft type gasification furnace) that flows downward.

In the gasification furnace 1021D, a fuel gas outflow portion 102e is provided below the opening 102dh in the oxidant introduction portion 102d in the gasification furnace 1021A shown in FIG.

Specifically, the fuel gas outflow portion 102e is provided at a position facing the assumed char layer δx of the furnace 102b (specifically, the lowermost δxb of the assumed char layer δx). In this example, the fuel gas outflow part 102e is provided in the center part of the bottom face 102b3 of the furnace 102b. The assumed char layer δx is lower than the assumed char layer δx of the gasification furnace 1021A shown in FIG. 7, and the char layer δ is lower than the char layer δ of the gasification furnace 1021A shown in FIG. Kept low.

According to the fourth embodiment, it can be configured that the raw material F surely falls in the oxidation zone α, and thus the raw material F can be reliably passed through the oxidation zone α within a predetermined time range. Furthermore, the fuel gas G can flow out from the bottom surface 102b3 of the furnace 102b. Further, by maintaining the char layer δ low, the oxidation zone passage time tp in the char layer δ can be shortened.

(Fifth embodiment)
A gasification furnace 1021E according to the fifth embodiment shown in FIG. 11 is the same as the gasification furnace 1021D shown in FIG. 10 except that a char layer temperature control unit 102k is provided on the outer surface of the region corresponding to the assumed char layer δx of the furnace 102b. It is.

According to the fifth embodiment, it is possible to effectively prevent the oxidation region α in the char layer δ from deviating from the predetermined temperature or the predetermined temperature range by the temperature control of the char layer δ by the char layer temperature control unit 102k.

(Sixth embodiment)
A gasification furnace 1021F according to the sixth embodiment shown in FIG. 12 is provided with a partition device 102l for temporarily storing char R and ash S in the gasification furnace 1021D shown in FIG.

The partition device 102l temporarily stores the char R and the ash S, and drops them downward after a predetermined time.

Specifically, the partition device 102l is detachable with respect to the furnace 102b (in this example, slidable along the horizontal direction), and an operation unit 102l2 (specifically, an actuator) that operates the partition unit 102l1. And. The partition part 102l1 is provided in the middle of the furnace 102b in the up-down direction. In the furnace 102b, the part below the partition part 10211 constitutes a tray part 102b4 that receives the char R and the ash S.

When the partition portion 10211 is attached to the furnace 102b, the char R is deposited and the char layer δ is stored. When the partition portion 102l1 is detached from the furnace 102b, the stored char R and ash S are transferred to the lower tray portion 102b4. It is designed to be dropped. The partition portion 102l1 is provided with a large number of passage holes 102la to 102la through which the fuel gas G passes. Note that the ash S burned in the tray part 102b4 is discharged to the outside by the discharge part 102f.

Under the instruction command from the control device 102g, the operating unit 102l2 attaches the partition unit 102l1 to the furnace 102b and periodically removes it from the furnace 102b to receive the char R and ash S on the dish unit 102b4. It is like that.

According to the sixth embodiment, the char R and the ash S can be periodically dropped onto the tray part 102b4.

(Seventh embodiment)
A gasification furnace 1021G according to the seventh embodiment shown in FIG. 13 is a gasification furnace for depositing char R to form a char layer δ (specifically, a char deposition layer). This is a gasification furnace (a so-called fixed-bed double-fired gasification furnace) introduced from below.

In the gasification furnace 1021G, in the gasification furnace 1021A shown in FIG. 7, the fuel gas outflow portion 102e is provided below the opening 102dh in the oxidant introduction portion 102d, and the oxidant introduction portion 102d is disposed at the top of the assumed char layer δx. It is provided at a position facing the lower part δxb.

The oxidant introduction part 102d is further provided at a position facing the lowermost part δxb of the assumed char layer δx.

The fuel gas outflow portion 102e is between the oxidant introduction portion 102d provided above the uppermost portion δxa of the assumed char layer δx and the oxidant introduction portion 102d further provided at a position facing the lowermost portion δxb of the assumed char layer δx. (Preferably at an intermediate position). In this example, the fuel gas outflow portion 102e is provided between the uppermost portion δxa and the lowermost portion δxb of the assumed char layer δx.

Specifically, the fuel gas outflow portion 102e is provided at a position facing the assumed char layer δx of the furnace 102b. In this example, the fuel gas outflow portion 102e is provided on the side surface 102b2 of the furnace 102b.

The oxidant introduction part 102d further provided at the position facing the lowermost part δxb of the assumed char layer δx is provided at the center of the bottom surface 102b3 of the furnace 102b.

According to the seventh embodiment, it can be configured that the raw material F surely falls in the oxidation zone α, and thus the raw material F can be reliably passed through the oxidation zone α within a predetermined time range. Furthermore, the oxidant H can be introduced from above and below, and the fuel gas G can flow out from the side surface 102b2 of the furnace 102b.

In the gasification furnaces 1021D to 1021G according to the fourth to seventh embodiments shown in FIGS. 10 to 13, the fuel gas outflow portion 102e exists below the opening 102dh in the oxidant introduction portion 102d. Therefore, when the raw material F (more precisely, char R and ash S) exits the oxidation zone α, it is discharged from the furnace 102b.

[Example 2]
Next, still another embodiment (Example 2) of the gasification furnace 102 according to the present embodiment will be described below with reference to FIGS. 14 to 17.

14 to 17 are schematic views schematically showing still another embodiment of the gasification furnace 102 according to the present embodiment. FIGS. 14 to 17 show gasification furnaces 1022A to 1022D according to the first to fourth embodiments of Example 2, respectively. 14 to 17, the control device 102g and the like are not shown.

In the gasification furnaces 1022A to 1022D shown in FIG. 14 to FIG. 17, the same reference numerals are given to substantially the same configurations as those of the gasification furnace 102 shown in FIG.

(First embodiment)
A gasification furnace 1022A according to the first embodiment shown in FIG. 14 is a gasification furnace in which char R is deposited to form a char layer δ (specifically, a char deposition layer). This is a gasification furnace (so-called fixed bed type updraft gasification furnace) that flows upward.

In the gasification furnace 1022A, in the gasification furnace 102 shown in FIG. 2, the material introduction part 102a is provided above the uppermost part δxa of the assumed char layer δx, and the oxidant introduction part 102d is provided from the uppermost part δxa of the assumed char layer δx. Is provided below, and further, an oxidant contact time control unit 102m is provided.

Further, the fuel gas outflow portion 102e is provided above the opening 102dh in the oxidant introduction portion 102d.

Specifically, the fuel gas outflow portion 102e is provided below the opening 102ah in the raw material introduction portion 102a.

The oxidant introduction portion 102d is provided at a position facing the assumed char layer δx of the furnace 102b. The oxidant introduction portion 102d is provided at one place or a plurality of places (two places in this example).

The gasification furnace 1022A further includes an oxidant contact time control unit 102m that controls an oxidant contact time that is a time during which the oxidant H is brought into contact with the char R. The oxidant contact time control unit 102m includes a part of the control device 102g.

The oxidant contact time control unit 102m is configured to introduce the raw material F from the raw material introducing unit 102a per unit time and the amount of ash S discharged from the discharging unit 102f per unit time, that is, the char R in the char layer δ. At least one of the downward movement distances per unit time is adjusted. Thereby, the oxidant contact time control unit 102m can control the oxidant contact time.

According to the first embodiment, it can be configured that the raw material F surely falls in the oxidation zone α, and thus the raw material F can be reliably passed through the oxidation zone α within a predetermined time range. In addition, the oxidant contact time can be controlled in introducing the oxidant H into the char layer δ, whereby the oxidation region α in the char layer δ can be reliably controlled within a predetermined temperature or a predetermined temperature range. it can.

(Second Embodiment)
The gasification furnace 1022B according to the second embodiment shown in FIG. 15 is provided with at least one (both in this example) of the endothermic reactant introduction part 102i and the heat capacity agent introduction part 102j in the gasification furnace 1022A shown in FIG. It is a thing.

The gasification furnace 1022B further includes an endothermic reactant introduction part 102i for introducing the endothermic reactant M and a heat capacity agent introduction part 102j for introducing the heat capacity agent N. The gasification furnace 1022B may include either one of the endothermic reactant introduction unit 102i and the heat capacity agent introduction unit 102j.

According to the second embodiment, an endothermic reaction of an endothermic reactant M (for example, water vapor or carbon dioxide) or a cooling effect by adding an endothermic reactant M (for example, a low-temperature substance) and / or a char layer by a heat capacity agent N (for example, nitrogen). With the effect of improving the heat capacity of δ, it is possible to easily and effectively prevent the low temperature region β of the char layer δ from reaching the predetermined temperature or the lower limit temperature of the predetermined temperature range.
(Third embodiment)
A gasification furnace 1022C according to the third embodiment shown in FIG. 16 is a gasification furnace for depositing char R to form a char layer δ (specifically, a char deposition layer). It is a gasification furnace (so-called fixed bed type downdraft type gasification furnace) that flows downward.

In the gasification furnace 1022C, in the gasification furnace 1022A shown in FIG. 14, a fuel gas outflow part 102e is provided below the opening 102dh in the oxidant introduction part 102d, and further a char deposition time control part 102n is provided.

Specifically, the fuel gas outflow portion 102e is provided at a position facing the assumed char layer δx of the furnace 102b (specifically, the lowermost δxb of the assumed char layer δx). In this example, the fuel gas outflow part 102e is provided in the center part of the bottom face 102b3 of the furnace 102b. The assumed char layer δx is lower than the assumed char layer δx of the gasification furnace 1022A shown in FIG. 14, and the char layer δ is lower than the char layer δ of the gasification furnace 1022A shown in FIG. Kept low.

The gasification furnace 1022C includes a char deposition time control unit 102n that controls the char deposition time for depositing the char R. The char deposition time control unit 102n includes a part of the control device 102g.

The char deposition time control unit 102n is configured to introduce the raw material F from the raw material introducing unit 102a per unit time, and discharge the ash S from the discharging unit 102f per unit time, that is, the unit of char R in the char layer δ. At least one of the downward movement distances per hour is adjusted. Thereby, the char deposition time control unit 102n can control the char deposition time.

According to the third embodiment, the oxidation zone passage time tp of the raw material F including the char deposition time can be within a predetermined time range. Further, it is possible to easily and effectively prevent the oxidation region α in the char layer δ from deviating from the predetermined temperature or the predetermined temperature range. Furthermore, the fuel gas G can flow out from the bottom surface 102b3 of the furnace 102b. Further, by maintaining the char layer δ low, the oxidation zone passage time tp in the char layer δ can be shortened.

(Fourth embodiment)
A gasification furnace 1022D according to the fourth embodiment shown in FIG. 17 is a gasification furnace in which the char R is deposited to form a char layer δ (specifically, a char deposition layer). This is a gasification furnace (a so-called fixed-bed double-fired gasification furnace) introduced from below.

In the gasification furnace 1022D, in the gasification furnace 1022A shown in FIG. 14, the fuel gas outflow part 102e is provided below the opening 102dh in the oxidant introduction part 102d, and the oxidant introduction part 102d is provided at the uppermost portion of the assumed char layer δx. It is provided at a position facing the lower part δxb.

The fuel gas outflow portion 102e is between the oxidant introduction portion 102d provided below the uppermost portion δxa of the assumed char layer δx and the oxidant introduction portion 102d further provided at a position facing the lowermost portion δxb of the assumed char layer δx. (Preferably at an intermediate position).

According to the fourth embodiment, the oxidant H can be introduced from above and below, and the fuel gas G can flow out from the side surface 102b2 of the furnace 102b.

In the

gasification furnaces

1022C and 1022D according to the third and fourth embodiments shown in FIGS. 16 and 17, the fuel gas outflow portion 102e exists below the opening 102dh in the oxidant introduction portion 102d. Therefore, when the raw material F (more precisely, char R and ash S) exits the oxidation zone α, it is discharged from the furnace 102b.

[Example 3]
Next, still another embodiment (Example 3) of the gasification furnace 102 according to the present embodiment will be described below with reference to FIGS.

18 to 30 are schematic views schematically showing still another embodiment of the gasification furnace 102 according to the present embodiment. FIGS. 18 to 30 show gasification furnaces 1023A to 1023M according to the first to thirteenth embodiments of Example 3, respectively. Note that the control device 102g and the like are not shown in FIGS.

In the gasification furnaces 1023A to 1023M shown in FIG. 18 to FIG. 30, the same reference numerals are given to substantially the same configurations as those of the gasification furnace 102 shown in FIG.

(First embodiment)
A gasification furnace 1023A according to the first embodiment shown in FIG. 18 is a gasification furnace (so-called fluidized bed type gasification furnace) that forms a char layer δ (specifically, a char fluidized bed) by causing the char R to flow. is there. In the gasification furnace 1023A according to the first embodiment, the gasification apparatus 100 shown in FIG. 1 is provided with a fluidized bed circulation line (not shown). The same applies to the

gasification furnaces

1023B and 1023C according to the second and third embodiments described later.

In the gasification furnace 1023A, in the gasification furnace 102 shown in FIG. 2, the raw material introduction part 102a is provided above the uppermost part δxa of the assumed char layer δx (assumed char fluidized bed in this example), and the oxidant introduction part 102d is provided. The fuel gas is provided at a position (lower side) facing the lowermost part δxb of the assumed char layer δx and above the uppermost part δxa of the assumed char layer δx and below (upper side) the opening 102ah in the raw material introduction part 102a. The outflow part 102e is provided above all the oxidant introduction parts 102d to 102d.

The opening 102dh in the oxidant introduction portion 102d provided on the lower side is formed such that the introduction direction of the oxidant H is directed upward (specifically, the deposition direction of char on which the char R is deposited) or substantially upward. Yes. The opening 102dh in the oxidant introduction portion 102d provided on the upper side is formed so that the introduction direction of the oxidant H is along the horizontal direction or upward (for example, obliquely upward) from the horizontal direction.

Specifically, in this example, the fuel gas outflow portion 102e is provided below the opening 102ah in the raw material introduction portion 102a. However, the present invention is not limited to this, and the arrangement position of the raw material introduction portion 102a and the fuel gas are not limited thereto. You may replace the arrangement | positioning position of the outflow part 102e. The oxidant introduction portion 102d provided on the upper side is provided at one place or a plurality of places (two places in this example).

In this example, the raw material introduction portion 102a is provided on the top surface 102b1 of the furnace 102b, and the oxidant introduction portion 102d provided on the lower side is provided on the bottom surface 102b3 of the furnace 102b, and the oxidant introduction portion 102d provided on the upper side. The fuel gas outflow portion 102e is provided on the side surface 102b2 of the furnace 102b.

According to the first embodiment, it can be configured that the raw material F surely falls in the oxidation zone α, and thus the raw material F can be reliably passed through the oxidation zone α within a predetermined time range. Furthermore, the oxidant H can be introduced from the lowermost δxb of the assumed char layer δx, thereby shortening the oxidation zone passage time tp of the raw material F so that the char layer δ deviates from a predetermined temperature or a predetermined temperature range. It can be effectively prevented.

In the case of a fluidized bed gasifier, various methods such as an upper discharge method and a hollow discharge method may be used as the discharge method of Char R, in addition to the lower discharge method described here. it can. In any case, the raw material F can be reliably passed through the oxidation zone α within a predetermined time range. The same applies to the

gasification furnaces

1023B and 1023C according to the second and third embodiments described later.

(Second Embodiment)
A gasification furnace 1023B according to the second embodiment shown in FIG. 19 is a gasification furnace (so-called fluidized bed type gasification furnace) that forms a char layer δ (specifically, a char fluidized bed) by causing the char R to flow. is there.

In the gasification furnace 1023B, in the gasification furnace 102 shown in FIG. 2, the material introduction part 102a is provided above the uppermost part δxa of the assumed char layer δx, and the oxidant introduction part 102d is provided at the lowermost part δxb of the assumed char layer δx. The fuel gas outflow part 102e is provided above the uppermost part δxa of the assumed char layer δx, and the oxidant introduction amount control part 102o is further provided.

In addition, in the gasification furnace 1023B according to the second embodiment, the arrangement position of the raw material introduction part 102a and the arrangement position of the fuel gas outflow part 102e may be switched.

The gasification furnace 1023B further includes an oxidant introduction amount control unit 102o that controls the introduction amount of the oxidant H. In this example, the oxidant introduction unit 102d includes an oxidant introduction amount control unit 102o. The oxidant introduction amount control unit 102o includes a part of the control device 102g.

The opening 102dh in the oxidant introduction part 102d is formed so that the introduction direction of the oxidant H is directed upward (specifically, the deposition direction of the char R is deposited) or substantially upward.

In this example, the furnace 102b is not limited thereto, but the width (size in the horizontal direction) is larger than the furnace 102b in the gasification furnace 1023A shown in FIG. Specifically, the gasification furnace 1023A shown in FIG. 18 has a separate inlet for the oxidant H, and the amount of the oxidant H from the lower part of the furnace 102b for fluidizing the raw material F is reduced. In order to increase the internal flow rate, it is necessary to reduce the width (specifically, the diameter) of the furnace 102b. On the other hand, the gasification furnace 1023B shown in FIG. 19 can be fluidized even if the width of the furnace 102b is large, since the entire amount enters from the lower part of the furnace 102b. The raw material introduction portion 102a is provided on the top surface 102b1 of the furnace 102b, the fuel gas outflow portion 102e is provided on the side surface 102b2 of the furnace 102b, and the oxidant introduction portion 102d is provided on the bottom surface 102b3 of the furnace 102b.

According to the second embodiment, it can be configured that the raw material F surely falls in the oxidation zone α, and thus the raw material F can be reliably passed through the oxidation zone α within a predetermined time range. Furthermore, the amount of the oxidant H introduced can be controlled (for example, controlled so as to increase the air volume), thereby shortening the oxidation zone passage time tp of the raw material F so that the char layer has a predetermined temperature or a predetermined temperature range. Can be effectively prevented from coming off.

(Third embodiment)
A gasification furnace 1023C according to the third embodiment shown in FIG. 20 is a gasification furnace (so-called fluidized bed type gasification furnace) that forms a char bed δ (specifically a char fluidized bed) by flowing the char R. is there.

In the gasification furnace 1023C, in the gasification furnace 102 shown in FIG. 2, the material introduction part 102a is provided above the uppermost part δxa of the assumed char layer δx, and the oxidant introduction part 102d is provided at the lowermost part δxb of the assumed char layer δx. The fuel gas outflow part 102e is provided above the uppermost part δxa of the assumed char layer δx, and the adjustment control part 102p is further provided.

In addition, in the gasification furnace 1023C according to the third embodiment, the arrangement position of the raw material introduction part 102a and the arrangement position of the fuel gas outflow part 102e may be switched.

The gasification furnace 1023C further includes an adjustment control unit 102p that adjusts the oxidizing agent H and at least one of the endothermic reactant M and the heat capacity agent N. The adjustment control unit 102p includes a part of the control device 102g.

Here, as the endothermic reactant M, any one that causes an endothermic reaction may be used, and examples thereof include water vapor and carbon dioxide. Any heat capacity agent N may be used as long as it increases the heat capacity of the char layer δ. For example, nitrogen can be mentioned.

In this example, the furnace 102b is not limited thereto, but the width (size in the horizontal direction) is larger than the furnace 102b in the gasification furnace 1023A shown in FIG. Specifically, the gasification furnace 1023A shown in FIG. 18 has a separate inlet for the oxidant H, and the amount of the oxidant H from the lower part of the furnace 102b for fluidizing the raw material F is reduced. In order to increase the internal flow rate, it is necessary to reduce the width (specifically, the diameter) of the furnace 102b. On the other hand, even if the width of the furnace 102b is large, the gasification furnace 1023C shown in FIG. 20 can be fluidized because the entire amount enters from the lower part of the furnace 102b and the endothermic reactant M and the heat capacity agent N are added. The raw material introduction portion 102a is provided on the top surface 102b1 of the furnace 102b, the fuel gas outflow portion 102e is provided on the side surface 102b2 of the furnace 102b, and the oxidant introduction portion 102d is provided on the bottom surface 102b3 of the furnace 102b.

The adjustment control unit 102p includes a first adjustment unit 102p1 for adjusting the oxidant H and the endothermic reactant M, and a second adjustment unit 102p2 for adjusting the oxidant H and the heat capacity agent N. . The endothermic reactant introduction unit 102i is connected to the oxidant introduction unit 102d via the first adjustment unit 102p1. The heat capacity agent introduction unit 102j is connected to the oxidant introduction unit 102d via the second adjustment unit 102p2 on the downstream side of the first adjustment unit 102p1.

The adjustment control unit 102p controls the operation of the first adjustment unit 102p1 and adjusts the oxidant H and the endothermic reactant M in the first adjustment unit 102p1 to properly balance both and / or the second adjustment unit. 102p2 is controlled and the second adjusting unit 102p2 adjusts the oxidizing agent H and the heat capacity agent N so that they are properly balanced.

In addition, you may make it switch at least one of the oxidizing agent H, the endothermic reactant M, and the heat capacity agent N.

According to the third embodiment, it can be configured that the raw material F surely falls in the oxidation zone α, and thus the raw material F can be reliably passed through the oxidation zone α within a predetermined time range. Furthermore, the oxidizing agent H and the endothermic reactant M (for example, water vapor or carbon dioxide) and / or the heat capacity agent N (for example, nitrogen) can be adjusted, thereby reducing the oxidation zone passage time tp of the raw material F. Thus, it is possible to effectively prevent the char layer δ from deviating from the predetermined temperature or the predetermined temperature range.

(Fourth embodiment)
A gasification furnace 1023D according to the fourth embodiment shown in FIG. 21 is a gasification furnace (so-called spouted bed type gasification furnace) in which the char R is jetted to move the fuel gas G in a predetermined flow direction V. is there.

A gasification furnace 1023D includes a raw material introduction part 102a and an oxidant introduction part 102d provided in parallel in the gasification furnace 102 shown in FIG. 2, and a fuel gas outflow part 102e in the flow direction V of the fuel gas G. This is provided downstream of the oxidant introduction part 102d and further provided with an oxidant introduction amount control part 102o.

The opening 102ah in the raw material introduction portion 102a is formed so that the introduction direction of the raw material F is along the flow direction V or substantially the flow direction V of the fuel gas G. The opening 102dh in the oxidant introduction portion 102d is formed so that the introduction direction of the oxidant H is along the flow direction V or substantially the flow direction V of the fuel gas G.

Specifically, the fuel gas outflow portion 102e is provided above the raw material introduction portion 102a and the oxidant introduction portion 102d.

In this example, the raw material introduction part 102a and the oxidant introduction part 102d are provided in the lower part (specifically, the bottom face 102b3) of the furnace 102b, and the fuel gas outflow part 102e is provided in the top face 102b1 of the furnace 102b. . The fuel gas outflow portion 102e may be provided on the side surface 102b2 of the furnace 102b.

The gasifier 1023D further includes an oxidant introduction amount control unit 102o that controls the introduction amount of the oxidant H. In this example, the oxidant introduction unit 102d includes an oxidant introduction amount control unit 102o. The oxidant introduction amount control unit 102o includes a part of the control device 102g.

In the gasification furnace 1023D, since the fuel gas G discharged from the furnace 102b contains char R and / or ash S, the char R and / or by a removal device (for example, a cyclone) (not shown) in the next process. Ash S is removed.

According to the fourth embodiment, the raw material F can be flowed in parallel with the oxidant H, and the introduction amount of the oxidant H can be set to a predetermined amount (for example, the air volume). α can be reliably passed within a predetermined time range. In addition, the oxidation zone α can be reliably controlled within a predetermined temperature or a predetermined temperature range.

(Fifth embodiment)
A gasification furnace 1023E according to the fifth embodiment shown in FIG. 22 is provided with a furnace temperature control unit 102q in the gasification furnace 1023D shown in FIG.

The gasification furnace 1023E further includes a furnace temperature control unit 102q. The furnace temperature control unit 102q includes a part of the control device 102g.

Specifically, the furnace temperature control unit 102q includes a heat source 102q1 such as a heating element and a drive unit 102q2 for driving the heat source 102q1.

The heat source 102q1 is provided on the entire side surface 102b2 of the furnace 102b. The thermocouple 102h transmits an electrical signal related to the detected temperature of the oxidation zone α to the furnace temperature control unit 102q. The furnace temperature control unit 102q controls the driving unit 102q2 so that the temperature of the oxidation region α becomes a predetermined temperature by an electrical signal related to the temperature of the oxidation region α, and the temperature in the furnace 102b is set to a predetermined temperature or a predetermined temperature range by the heat source 102q1. Adjust in.

According to the fifth embodiment, the oxidation zone α can be stably and reliably controlled within a predetermined temperature or a predetermined temperature range.

(Sixth embodiment)
A gasification furnace 1023F according to the sixth embodiment shown in FIG. 23 is a gasification furnace (so-called rotary kill type gasification furnace) that moves the fuel gas G in a predetermined flow direction V while rotating the furnace 102b around the axis. ).

The gasification furnace 1023F in the gasification furnace 102 shown in FIG. 2 is configured such that the furnace 102b is inclined so as to be rotatable about the axis, and the raw material introduction part 102a and the oxidant introduction part 102d are upstream in the flow direction V of the fuel gas G. The fuel gas outflow portion 102e is provided on the downstream end surface 102b6, which is the opposite surface of the upstream end surface 102b5, and the oxidant introduction amount control unit 102o is further provided in parallel with the end surface 102b5.

Further, the opening 102ah in the raw material introduction portion 102a is formed so that the introduction direction of the raw material F is along the flow direction V or substantially the flow direction V of the fuel gas G. The opening 102dh in the oxidant introduction portion 102d is formed so that the introduction direction of the oxidant H is along the flow direction V or substantially the flow direction V of the fuel gas G.

The gasification furnace 1023F further includes an oxidant introduction amount control unit 102o that controls the introduction amount of the oxidant H. In this example, the oxidant introduction unit 102d includes an oxidant introduction amount control unit 102o. The oxidant introduction amount control unit 102o includes a part of the control device 102g.

In addition, the oxidation zone passage time tp of the raw material F can be adjusted by the length of the furnace 102b and the rotational speed of the furnace 102b. The same applies to gasifiers 1023G to 1023M according to seventh to thirteenth embodiments which will be described later.

According to the sixth embodiment, the raw material F can be flowed in parallel with the oxidant H, and the introduction amount of the oxidant H can be set to a predetermined amount (for example, the air volume). α can be reliably passed within a predetermined time range. Furthermore, the oxidation zone α can be reliably controlled within a predetermined temperature or a predetermined temperature range.

(Seventh embodiment)
A gasification furnace 1023G according to the seventh embodiment shown in FIG. 24 is a gasification furnace (so-called rotary kill gasification) that moves the fuel gas G in a predetermined flow direction V while rotating the furnace 102b about the axis X. Furnace).

In the gasification furnace 1023G, in the gasification furnace 102 shown in FIG. 2, the furnace 102b is tilted so as to be rotatable about the axis, and the raw material introduction part 102a is provided on the upstream end face 102b5 in the flow direction V of the fuel gas G. A gas outflow portion 102e is provided on the downstream end surface 102b6, which is the surface facing the upstream end surface 102b5, and a plurality (n, n is an integer of 2 or more) of oxidant introduction portions 102d (1) to 102d (n) are disposed upstream. Between the end surface 102b5 and the downstream end surface 102b6, the fuel gas G is provided in order from the upstream side to the downstream side in the flow direction V, and further includes a plurality of oxidant introduction amount control units 102o (1) to 102o (n) and a plurality of oxidations. Agent temperature controllers 102r (1) to 102r (n) are provided.

The gasification furnace 1023G controls the temperature of the oxidant H and the plurality of oxidant introduction units 102d (1) to 102d (n), the plurality of oxidant introduction amount control units 102o (1) to 102o (n). A plurality of oxidant temperature controllers 102r (1) to 102r (n) are further provided. In this example, the plurality of oxidant introduction units 102d (1) to 102d (n) includes a plurality of oxidant introduction amount control units 102o (1) to 102o (n) and a plurality of oxidant temperature control units 102r (1). To 102r (n), respectively. The plurality of oxidant introduction amount controllers 102o (1) to 102o (n) and the plurality of oxidant temperature controllers 102r (1) to 102r (n) include a part of the controller 102g.

The plurality of oxidant introduction amount control units 102o (1) to 102o (n) respectively control the introduction amount of the oxidant H of the oxidant introduction units 102d (1) to 102d (n).

The plurality of oxidant temperature control units 102r (1) to 102r (n) controls the oxidant introduction amount so that the oxidant temperature gradually decreases from the upstream side to the downstream side in the flow direction V of the fuel gas G. The units 102o (1) to 102o (n) are controlled to operate.

In this example, the plurality of oxidant introduction portions 102d (1) to 102d (n) are arranged in parallel along the axis X direction at the lower portion of the side surface 102b2 of the furnace 102b.

According to the seventh embodiment, the temperature of the oxidant H is gradually lowered from the upstream side to the downstream side in the flow direction V of the fuel gas G, so that the oxidation atmosphere of the oxidation zone α is increased according to the promotion of the oxidation of the raw material F. The temperature can be lowered, so that the oxidation zone α can be reliably controlled within a predetermined temperature or a predetermined temperature range. Moreover, the introduction amount of the oxidizing agent H can be set to a predetermined control amount (for example, control air amount), whereby the raw material F can be reliably passed through the oxidation region α within a predetermined time range. In the furnace 102b, a low temperature region β may be provided on the downstream side in the flow direction V of the fuel gas G adjacent to the oxidation region α.

(Eighth embodiment)
A gasification furnace 1023H according to the eighth embodiment shown in FIG. 25 is different from the gasification furnace 1023G shown in FIG. 24 in that a plurality of oxidant concentrations are used instead of the plurality of oxidant temperature control units 102r (1) to 102r (n). Control units 102s (1) to 102s (n) are provided.

The gasifier 1023G includes a plurality of oxidant introduction units 102d (1) to 102d (n), a plurality of oxidant introduction amount control units 102o (1) to 102o (n), and a concentration of oxidant H (for example, oxygen It further includes a plurality of oxidant concentration control units 102s (1) to 102s (n) for controlling the concentration and the air concentration. In this example, the plurality of oxidant introduction units 102d (1) to 102d (n) includes a plurality of oxidant introduction amount control units 102o (1) to 102o (n) and a plurality of oxidant concentration control units 102s (1). To 102 s (n), respectively. The plurality of oxidant introduction amount controllers 102o (1) to 102o (n) and the plurality of oxidant concentration controllers 102s (1) to 102s (n) include a part of the controller 102g.

The plurality of oxidant introduction amount control units 102o (1) to 102o (n) respectively control the introduction amount (for example, oxygen amount and air amount) of the oxidant H of the oxidant introduction units 102d (1) to 102d (n). To do.

The plurality of oxidant concentration control units 102s (1) to 102s (n) include oxidant cylinders provided in the plurality of oxidant introduction amount control units 102o (1) to 102o (n), respectively, and the stored oxidation. The concentration of the agent H (for example, oxygen concentration or air concentration) gradually decreases from the upstream side to the downstream side in the flow direction V of the fuel gas G.

According to the eighth embodiment, the oxidation of the raw material F is promoted by gradually reducing the concentration of the oxidant H (for example, oxygen concentration or air concentration) from the upstream side to the downstream side in the flow direction V of the fuel gas G. Accordingly, the oxidation atmosphere temperature in the oxidation region α can be lowered, and thus the oxidation region α can be reliably controlled within a predetermined temperature or a predetermined temperature range. Moreover, the introduction amount of the oxidizing agent H can be set to a predetermined control amount (for example, control air amount), whereby the raw material F can be reliably passed through the oxidation region α within a predetermined time range. In the furnace 102b, a low temperature region β may be provided on the downstream side in the flow direction V of the fuel gas G adjacent to the oxidation region α.

(Ninth embodiment)
A gasification furnace 1023I according to the ninth embodiment shown in FIG. 26 is a gasification furnace (so-called rotary kill type gasification furnace) that moves the fuel gas G in a predetermined flow direction V while rotating the furnace 102b around the axis. ).

In the gasification furnace 1023I, in the gasification furnace 102 shown in FIG. 2, the raw material introduction part 102a is provided on the upstream end face 102b5 in the flow direction V of the fuel gas G by tilting the furnace 102b so as to be rotatable about the axis. The gas outflow portion 102e is provided on the downstream end surface 102b6, which is the surface facing the upstream end surface 102b5, and the oxidant introduction portion 102d is located upstream in the fuel gas G flow direction V between the upstream end surface 102b5 and the downstream end surface 102b6. The oxidant introduction part 102d is provided with at least one of the endothermic reactant introduction part 102i and the heat capacity agent introduction part 102j (both in this example) on the downstream side, and further provided with the oxidant introduction amount control part 102o. is there.

The gasification furnace 1023I introduces an oxidant introduction amount control unit 102o that controls the introduction amount of the oxidant H in the oxidant introduction unit 102d, an endothermic reactant introduction unit 102i that introduces the endothermic reactant M, and a heat capacity agent N. And a heat capacity agent introducing portion 102j. The endothermic reactant introduction part 102i and the heat capacity agent introduction part 102j are provided downstream of the oxidant introduction part 102d in the flow direction V of the fuel gas G. Either one of the endothermic reactant introduction part 102i and the heat capacity agent introduction part 102j may be downstream or upstream in the flow direction V, or may be aligned or substantially aligned. . When introducing either one of the endothermic reactant M and the heat capacity agent N, the gasification furnace 1023I may include either one of the endothermic reactant introduction section 102i and the heat capacity agent introduction section 102j. The oxidant introduction amount control unit 102o includes a part of the control device 102g.

In this example, the oxidant introduction unit 102d includes an oxidant introduction amount control unit 102o. The oxidant introduction amount control unit 102o, the endothermic reactant introduction unit 102i, and the heat capacity agent introduction unit 102j are juxtaposed along the axis X direction below the side surface 102b2 of the furnace 102b.

According to the ninth embodiment, an endothermic reaction of an endothermic reactant M (for example, water vapor or carbon dioxide) or a cooling effect by adding an endothermic reactant M (for example, a low temperature substance) and / or a char layer by a heat capacity agent N (for example, nitrogen). With the effect of improving the heat capacity of δ, the oxidation atmosphere temperature in the oxidation region can be lowered in accordance with the promotion of the oxidation of the raw material F, whereby the oxidation region α can be reliably controlled within a predetermined temperature or a predetermined temperature range. . Moreover, the introduction amount of the oxidizing agent H can be set to a predetermined control amount (for example, control air amount), whereby the raw material F can be reliably passed through the oxidation region α within a predetermined time range. In the furnace 102b, a low temperature region β may be provided on the downstream side in the flow direction V of the fuel gas G adjacent to the oxidation region α.

(10th Embodiment)
A gasification furnace 1023J according to the tenth embodiment shown in FIG. 27 is a gasification furnace (so-called rotary kill gasification) that moves the fuel gas G in a predetermined flow direction V while rotating the furnace 102b about the axis X. Furnace).

In the gasification furnace 1023J, in the gasification furnace 102 shown in FIG. 2, the raw material introduction part 102a is provided on the upstream end face 102b5 in the flow direction V of the fuel gas G by tilting the furnace 102b so as to be rotatable about the axis. The gas outflow portion 102e is provided on the downstream end surface 102b6, which is the surface facing the upstream end surface 102b5, the oxidant introduction portion 102d is provided between the upstream end surface 102b5 and the downstream end surface 102b6, and a plurality of oxidant introduction amount controls. Units 102o (1) to 102o (m) (m is an integer equal to or greater than 2, m = 2 in this example), a plurality of oxidant temperature control units 102r (1) to 102r (m), and an oxidant temperature switching control unit 102t Is provided.

The gasifier 1023J includes a plurality of oxidant introduction amount control units 102o (1) to 102o (m) that respectively control the introduction amount of the oxidant H in the oxidant introduction unit 102d, and oxidant H (Ha (1) to A plurality of oxidant temperature controllers 102r (1) to 102r (m) for controlling the temperature of Ha (m)) and oxidants H (Ha (1) to Ha (m)) having a plurality of different temperatures from each other. An oxidant temperature switching control unit 102t for switching is further provided. In this example, the oxidant introduction unit 102d includes a plurality of oxidant introduction amount control units 102o (1) to 102o (m), a plurality of oxidant temperature control units 102r (1) to 102r (m), and an oxidant temperature switching. A control unit 102t is included.

The plurality of oxidant introduction amount control units 102o (1) to 102o (m), the plurality of oxidant temperature control units 102r (1) to 102r (m), and the oxidant temperature switching control unit 102t are part of the control device 102g. Is included.

The plurality of oxidant temperature control units 102r (1) to 102r (m) has the oxidant introduction amount control units 102o (1) to 102o (1) 102o (m) is controlled to operate.

The oxidant temperature switching control unit 102t is any one of the oxidants Ha (1) to Ha (m) that are set to different temperatures by the plurality of oxidant temperature control units 102r (1) to 102r (m). To switch selectively.

According to the tenth embodiment, the oxidation zone α can be reliably controlled within a predetermined temperature or a predetermined temperature range by switching the oxidants Ha (1) to Ha (m) having a plurality of different temperatures. Moreover, the introduction amount of the oxidizing agent H can be set to a predetermined control amount (for example, control air amount), whereby the raw material F can be reliably passed through the oxidation region α within a predetermined time range.

(Eleventh embodiment)
A gasification furnace 1023K according to the eleventh embodiment shown in FIG. 28 is similar to the gasification furnace 1023J shown in FIG. 27, but includes a plurality of oxidant temperature control units 102r (1) to 102r (m) and an oxidant temperature switching control unit 102t. Instead, a plurality of oxidant concentration control units 102s (1) to 102s (m) and an oxidant concentration switching control unit 102u are provided.

The gasifier 1023K includes a plurality of oxidant introduction amount control units 102o (1) to 102o (m) that respectively control the introduction amount of the oxidant H in the oxidant introduction unit 102d, and the oxidant H (Hb (1) to Hb (m)) concentration (for example, oxygen concentration and air concentration), a plurality of oxidant concentration control units 102s (1) to 102s (m), and a plurality of different concentrations (for example, oxygen concentration and air concentration). And an oxidant concentration switching control unit 102u for switching the oxidant H (Hb (1) to Hb (m)). In this example, the oxidant introduction unit 102d includes a plurality of oxidant introduction amount control units 102o (1) to 102o (m), a plurality of oxidant concentration control units 102s (1) to 102s (m), and an oxidant concentration switching. A control unit 102u is included.

The plurality of oxidant introduction amount control units 102o (1) to 102o (m), the plurality of oxidant concentration control units 102s (1) to 102s (m), and the oxidant temperature switching control unit 102t are part of the control device 102g. Is included.

The plurality of oxidant introduction amount control units 102o (1) to 102o (m) respectively control the introduction amount (for example, oxygen amount and air amount) of the oxidant H (Hb (1) to Hb (m)).

The plurality of oxidant concentration control units 102s (1) to 102s (m) include oxidant cylinders provided in the plurality of oxidant introduction amount control units 102o (1) to 102o (m), respectively, and stored oxidation. The concentrations of the agent H (for example, oxygen concentration and air concentration) are different from each other.

The oxidant concentration switching control unit 102u includes oxidants Hb (1) to Hb () having different concentrations (for example, oxygen concentration and air concentration) in the plurality of oxidant concentration control units 102s (1) to 102s (m). m) is selectively switched.

According to the eleventh embodiment, the oxidation region α can be reliably controlled within a predetermined temperature or a predetermined temperature range by switching the oxidant H having a plurality of different concentrations (for example, oxygen concentration and air concentration). Moreover, the introduction amount of the oxidizing agent H can be set to a predetermined control amount (for example, control air amount), whereby the raw material F can be reliably passed through the oxidation region α within a predetermined time range.

(Twelfth embodiment)
A gasification furnace 1023L according to the twelfth embodiment shown in FIG. 29 is obtained by providing a furnace temperature control unit 102q in the gasification furnace 1023F shown in FIG.

The gasification furnace 1023L further includes a furnace temperature control unit 102q. The furnace temperature control unit 102q includes a part of the control device 102g.

According to the twelfth embodiment, the oxidation zone α can be stably and reliably controlled within a predetermined temperature or a predetermined temperature range.

(13th Embodiment)
A gasification furnace 1023M according to the thirteenth embodiment shown in FIG. 30 is obtained by reducing the area in which the furnace temperature control unit 102q is provided in the gasification furnace 1023L shown in FIG.

The heat source 102q1 is provided in a part of the upstream side of the side surface 102b2 of the furnace 102b (only half in this example) in the flow direction V of the fuel gas G. The thermocouple 102h detects the temperature of the region corresponding to the heat source 102q1 in the furnace 102b.

According to the thirteenth embodiment, the oxidation atmosphere temperature of the oxidation region α can be lowered in accordance with the promotion of the oxidation of the raw material F, whereby the oxidation region α can be reliably controlled within a predetermined temperature or a predetermined temperature range. it can. In the furnace 102b, a low temperature region β may be provided on the downstream side in the flow direction V of the fuel gas G adjacent to the oxidation region α.

The present invention is not limited to the embodiment described above, and can be implemented in various other forms. Therefore, such an embodiment is merely an example in all respects and should not be interpreted in a limited manner. The scope of the present invention is shown by the scope of claims, and is not restricted by the text of the specification. Further, all modifications and changes belonging to the equivalent scope of the claims are within the scope of the present invention.

This application includes Japanese Patent Application Nos. 2016-006511, 2016-006512, 2016-006513, 2016-006514, and 2016-006515 filed in Japan on January 15, 2016. Claim priority based on. By referring to these, the entire contents thereof are incorporated into the present application.

The present invention relates to a gasification furnace that oxidizes a raw material to generate a product gas, and an operation method of the gasification furnace, and in particular, in generating the product gas, generation of tar and generation of crystalline silica The present invention can be applied to a use for making both suppressions compatible simultaneously.

DESCRIPTION OF SYMBOLS 100 Gasifier 101 Storage hopper 102 Gasifier 1022A-G Gasifier 1022A-D Gasifier 1022A-M Gasifier 102a Raw material introduction part 102a1 Raw material introduction conveyor 102a2 Raw material introduction feeder 102ah Opening 102b Furnace 102b1 Top surface 102b2 Side surface 102b3 bottom surface 102b4 tray part 102b5 upstream end face 102b6 downstream end face 102c preheating part 102c1 gas supply part 102c2 gas cylinder 102d oxidant introduction part 102dh opening 102e fuel gas outflow part 102eh outlet 102f discharge part 102f1 ash discharge conveyor 102g control unit 102g1 processing part 102g2 storage unit 102h thermocouple 102i endothermic reactant introduction unit 102j heat capacity agent introduction unit 102k Layer temperature control unit 102k1 Heat exchange unit 102k2 Supply unit 102k3 Discharge unit 102k4 Thermocouple 102l Partition device 102l1 Partition unit 102l2 Actuator 102la Passing hole 102m Oxidant contact time control unit 102n Char deposition time control unit 102o Oxidant introduction amount control unit 102p Adjustment control unit 102p1 First adjustment unit 102p2 Second adjustment unit 102q Furnace temperature control unit 102q1 Heat source 102q2 Drive unit 102r Oxidant temperature control unit 102s Oxidant concentration control unit 102t Oxidant temperature switching control unit 102u Oxidant temperature switching control unit 103 Bag filter 104 Gas cooler 105 Scrubber 106 Circulating water tank 107 Cooling tower 108 Gas filter 109 Induction blower 110 Pretreatment unit 111 Gas engine 112 Water seal tank 113 Surplus gas combustion device 113a Surplus gas combustion section A to E Set value F Raw material G Fuel gas H Oxidant Ha Oxidant Hb Oxidant Kc Concentration M Endothermic reactant N Heat capacity agent R Char S Ash T Oxidation Atmospheric temperature Tc Crystalline silica generation temperature V Flow direction W Heat exchange medium X Axis ad constant g Flammable gas t Crystalline silica generation allowable time tc Crystalline silica generation temperature arrival time tmin Tar generation allowable time tp Oxidation zone passage time α Oxidation region β Low temperature region γ Combustion gas layer δ Char layer δa Top portion δx Expected char layer δxa Uppermost portion δxb Lowermost portion κ Expression of correlation function ρ Correlation

Claims

A gasification furnace that generates a product gas by oxidizing a raw material,
Means is provided for maintaining an oxidation zone for oxidizing the raw material at a predetermined temperature or a predetermined temperature range, and means for passing the raw material through the oxidation zone within a predetermined time range is provided. Gasification furnace.
The gasification furnace according to claim 1, wherein
The predetermined temperature or the predetermined temperature range is a temperature equal to or higher than the tar thermal decomposition temperature, which is a temperature necessary for thermal decomposition of tar, or a temperature range having the temperature as a central temperature.
The predetermined time range is longer than the allowable tar generation time, which is a time necessary for suppressing the generation of tar below the allowable level, and is a time required to suppress the generation of crystalline silica below the allowable level. A gasification furnace characterized by having an allowable time or less.
The gasification furnace according to claim 1 or 2, wherein
Crystalline silica, which is the oxidizing atmosphere temperature in the oxidation region and the time from when the raw material enters the oxidation region until the temperature of the raw material itself reaches the crystalline silica formation temperature, which is the temperature at which crystalline silica is generated Means for determining an oxidation zone passage time, which is a time during which the raw material passes through the oxidation zone within the predetermined time range and a central temperature of the predetermined temperature or the predetermined temperature range based on a correlation with a generation temperature arrival time; A gasification furnace characterized by being provided.
The gasification furnace according to claim 3, wherein
The gasification furnace, wherein the correlation corresponds to an expression of a correlation function represented by the following expression [1].

However, in the formula [1], T is the oxidizing atmosphere temperature, t is a crystalline silica production allowable time which is a time for suppressing the generation of crystalline silica to an allowable level or less, and tmin is The tar generation allowable time is a time necessary for suppressing the generation of tar below the allowable level, and a, b, and c are constants that vary depending on the amount of the components of the raw material.
The gasification furnace according to claim 3, wherein
The gasification furnace according to claim 1, wherein the correlation corresponds to a correlation table shown in Table 1 below based on the raw material having a predetermined concentration of potassium.

However, in the above [Table 1], T is the oxidizing atmosphere temperature, t is a crystalline silica production allowable time which is a time for suppressing the generation of crystalline silica to an allowable level or less, and t (K (Small) represents the permissible time for crystalline silica generation with a raw material that is less than the standard potassium content of the raw material, and t (large K) is greater than the standard potassium content of the raw material. The crystalline silica production permissible time with a large amount of raw material is represented, and A, B, C, D, E are set values of the crystalline silica production permissible time t with respect to the oxidizing atmosphere temperature T, and the raw material Is a set value that varies depending on the amount of the component, and is a set value that is equal to or greater than the allowable tar generation time tmin, which is the time required to suppress the generation of tar below the allowable level.
A gasification furnace according to any one of claims 1 to 5, wherein
Prior to the introduction of the raw material, a gasification furnace is provided that has means for preheating the inside of the furnace to the predetermined temperature or the predetermined temperature range.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided above the uppermost part of a predetermined assumed char layer, and an oxidant introduction part for introducing an oxidant is provided above the uppermost part of the assumed char layer and the raw material. A product gas outflow part that is provided below the opening in the introduction part, forms the opening in the oxidant introduction part so that the introduction direction of the oxidant is along the horizontal direction or upward from the horizontal direction, and causes the product gas to flow out. Is provided above the opening in the oxidant introduction part,
A gasification furnace characterized in that at least one of an endothermic reactant introduction part for introducing an endothermic reactant and a heat capacity agent introduction part for introducing a heat capacity agent is provided at a position facing the assumed char layer.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided above the uppermost part of a predetermined assumed char layer, and an oxidant introduction part for introducing an oxidant is provided above the uppermost part of the assumed char layer and the raw material. A product gas outflow part that is provided below the opening in the introduction part, forms the opening in the oxidant introduction part so that the introduction direction of the oxidant is along the horizontal direction or upward from the horizontal direction, and causes the product gas to flow out. Is provided above the opening in the oxidant introduction part,
A gasification furnace characterized in that a char layer temperature control unit for controlling the temperature of the char layer is provided on an outer surface of a region corresponding to the assumed char layer.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
The raw material introduction part for introducing the raw material is provided above the uppermost part of the predetermined assumed char layer, and the oxidant introduction part for introducing an oxidant is provided below the uppermost part of the assumed char layer, An oxidant contact time control unit for controlling the oxidant contact time for contacting the oxidant with the char is provided.
A product gas outflow part for letting out the product gas is provided above the oxidant introduction part, and an endothermic reactant introduction part for introducing an endothermic reactant and a heat capacity agent are introduced at a position facing the assumed char layer. A gasification furnace provided with at least one of heat capacity agent introduction sections.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
The raw material introduction part for introducing the raw material is provided above the uppermost part of the predetermined assumed char layer, and the oxidant introduction part for introducing an oxidant is provided below the uppermost part of the assumed char layer, An oxidant contact time control unit for controlling the oxidant contact time for contacting the oxidant with char is provided,
A gas characterized in that a product gas outflow part for allowing the product gas to flow out is provided at a position facing the lowermost part of the assumed char layer, and a char deposition time control unit for controlling a char deposition time for depositing char is provided. Chemical reactor.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
The raw material introduction part for introducing the raw material is provided above the uppermost part of the predetermined assumed char layer, and the oxidant introduction part for introducing an oxidant is provided below the uppermost part of the assumed char layer, An oxidant contact time control unit for controlling the oxidant contact time for contacting the oxidant with the char is provided.
An oxidant introduction part for introducing an oxidant is further provided at a position facing the lowermost part of the assumed char layer,
The oxidant introduction part provided below the uppermost part of the assumed char layer and the oxidant introduction part further provided at a position facing the lowermost part of the assumed char layer; A gasification furnace provided between the two.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
The raw material introduction part for introducing the raw material is provided above the uppermost part of a predetermined assumed char layer, and the oxidant introduction part for introducing an oxidant is located at the position facing the lowermost part of the assumed char layer. An opening in the oxidant introduction part provided above the uppermost part of the char layer and below the opening in the raw material introduction part, and provided at a position facing the lowermost part of the assumed char layer. Is formed so as to face upward or substantially upward, and an opening in the oxidant introduction part provided above the uppermost part of the assumed char layer and below the opening in the raw material introduction part has an introduction direction of the oxidant. A gasification furnace characterized in that it is formed so as to extend in a horizontal direction or upward from the horizontal direction, and a product gas outflow part for allowing the product gas to flow out is provided above all the oxidant introduction parts.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided above a predetermined uppermost portion of a predetermined assumed char layer, an oxidant introduction portion for introducing an oxidant is provided at a position facing the lowermost portion of the assumed char layer, An oxidant introduction amount control unit for controlling the introduction amount of the oxidant is provided, and an opening in the oxidant introduction unit for introducing the oxidant is formed so that the introduction direction of the oxidant is upward or substantially upward, and the generation A gasification furnace characterized in that a product gas outflow portion for allowing gas to flow out is provided above the uppermost portion of the assumed char layer.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided above a predetermined uppermost portion of a predetermined assumed char layer, an oxidant introduction portion for introducing an oxidant is provided at a position facing the lowermost portion of the assumed char layer, An adjustment control unit that adjusts the oxidant and at least one of the endothermic reactant and the heat capacity agent is provided, and an opening in the oxidant introduction unit is formed so that an introduction direction of the oxidant is upward or substantially upward, and the generation A gasification furnace characterized in that a product gas outflow portion for allowing gas to flow out is provided above the uppermost portion of the assumed char layer.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material and an oxidant introduction part for introducing an oxidant are provided in parallel, and an opening in the raw material introduction part is arranged so that the introduction direction of the raw material is in the flow direction of the product gas or substantially the flow direction. And forming an opening in the oxidant introduction part so that the introduction direction of the oxidant is along the flow direction of the product gas or substantially the flow direction, and a product gas outflow part for letting out the product gas. A gasification furnace provided with an oxidant introduction amount control unit for controlling an introduction amount of the oxidant provided downstream of the raw material introduction unit and the oxidant introduction unit in the flow direction of the product gas .
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material, and an oxidant introduction part for introducing an oxidant are provided in parallel on the upstream end face in the flow direction of the product gas, and a product gas outflow part for causing the product gas to flow out is provided on the upstream side A gasification furnace provided with an oxidant introduction amount control unit that is provided on a downstream end surface that is an opposite surface of the end surface and controls the introduction amount of the oxidant.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided on the upstream end face in the flow direction of the product gas, and a product gas outflow part for letting out the product gas is provided on a downstream end face that is a face opposite to the upstream end face, A plurality of oxidant introduction portions for introducing gas from the upstream end surface to the downstream end surface in order from the upstream side to the downstream side in the flow direction of the generated gas, and the oxidant of the plurality of oxidant introduction portions An oxidant introduction amount control unit for controlling the introduction amount of the oxidant is provided, and an oxidant temperature control unit for gradually lowering the temperature of the oxidant from the upstream side to the downstream side in the flow direction of the product gas is provided. Gasification furnace.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided on the upstream end face in the flow direction of the product gas, and a product gas outflow part for letting out the product gas is provided on a downstream end face that is a face opposite to the upstream end face, A plurality of oxidant introduction portions for introducing gas from the upstream end surface to the downstream end surface in order from the upstream side to the downstream side in the flow direction of the generated gas, and the oxidant of the plurality of oxidant introduction portions An oxidant introduction amount control unit that controls the introduction amount of the oxidant is provided, and an oxidant concentration control unit that gradually decreases the concentration of the oxidant from the upstream side to the downstream side in the flow direction of the product gas is provided. Gasification furnace.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided on the upstream end face in the flow direction of the product gas, and a product gas outflow part for letting out the product gas is provided on a downstream end face that is a face opposite to the upstream end face, An oxidant for introducing the oxidant is provided on the upstream side in the flow direction of the product gas between the upstream end face and the downstream end face, and an oxidant for controlling the amount of the oxidant introduced into the oxidant introduction part An introduction amount control unit is provided, and at least one of an endothermic reactant introduction unit that introduces an endothermic reactant downstream from the oxidant introduction unit and a heat capacity agent introduction unit that introduces a heat capacity agent is provided. Gasification furnace.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided on the upstream end face in the flow direction of the product gas, and a product gas outflow part for letting out the product gas is provided on a downstream end face that is a face opposite to the upstream end face, An oxidant introduction part for introducing the oxidant is provided between the upstream end face and the downstream end face, and an introduction amount control part for controlling the introduction amount of the oxidant is provided to switch the oxidants at a plurality of different temperatures. A gasification furnace provided with an oxidant temperature switching control unit.
A gasification furnace according to any one of claims 1 to 6, wherein
As means for passing the raw material through the oxidation zone within a predetermined time range,
A raw material introduction part for introducing the raw material is provided on the upstream end face in the flow direction of the product gas, and a product gas outflow part for letting out the product gas is provided on a downstream end face that is a face opposite to the upstream end face, An oxidant introduction part for introducing oxidant is provided between the upstream end face and the downstream end face, an introduction amount control part for controlling the introduction amount of the oxidant is provided, and the oxidants having a plurality of different concentrations are switched. A gasification furnace provided with an oxidant concentration switching control unit.
A method of operating a gasifier that oxidizes a raw material to generate a product gas,
An operating method of a gasification furnace, wherein an oxidation zone for oxidizing the raw material is maintained at a predetermined temperature or a predetermined temperature range, and the raw material is passed through the oxidation zone within a predetermined time range.
The operation method of the gasifier according to claim 22,
The predetermined temperature or the predetermined temperature range is a temperature equal to or higher than the tar thermal decomposition temperature, which is a temperature necessary for thermal decomposition of tar, or a temperature range having the temperature as a central temperature.
The predetermined time range is longer than the allowable tar generation time, which is a time necessary for suppressing the generation of tar below the allowable level, and is a time required to suppress the generation of crystalline silica below the allowable level. An operation method of a gasification furnace characterized by being within an allowable time.
The operation method of the gasifier according to claim 22 or claim 23,
Crystalline silica, which is the oxidizing atmosphere temperature in the oxidation region and the time from when the raw material enters the oxidation region until the temperature of the raw material itself reaches the crystalline silica formation temperature, which is the temperature at which crystalline silica is generated Determining a central temperature of the predetermined temperature or the predetermined temperature range and an oxidation zone passage time which is a time for the raw material to pass through the oxidation zone within the predetermined time range based on the correlation with the generation temperature arrival time. The operation method of the gasifier characterized by the above.
A gasification furnace operation method according to claim 24,
The gasification furnace operating method, wherein the correlation corresponds to an expression of a correlation function represented by the following expression [1].

However, in the formula [1], T is the oxidizing atmosphere temperature, t is a crystalline silica production allowable time which is a time for suppressing the generation of crystalline silica to an allowable level or less, and tmin is The tar generation allowable time is a time necessary for suppressing the generation of tar below the allowable level, and a, b, and c are constants that vary depending on the amount of the components of the raw material.
A gasification furnace operation method according to claim 24,
The method of operating a gasifier, wherein the correlation corresponds to a correlation table shown in Table 1 below based on the raw material having a predetermined concentration of potassium.

However, in the above [Table 1], T is the oxidizing atmosphere temperature, t is a crystalline silica production allowable time which is a time for suppressing the generation of crystalline silica to an allowable level or less, and t (K (Small) represents the permissible time for crystalline silica generation with a raw material that is less than the standard potassium content of the raw material, and t (large K) is greater than the standard potassium content of the raw material. The crystalline silica production permissible time with a large amount of raw material is represented, and A, B, C, D, E are set values of the crystalline silica production permissible time t with respect to the oxidizing atmosphere temperature T, and the raw material Is a set value that varies depending on the amount of the component, and is a set value that is equal to or greater than the allowable tar generation time tmin, which is the time required to suppress the generation of tar below the allowable level.
A method for operating a gasifier according to any one of claims 24 to 26, comprising:
The gasification furnace operating method, wherein the correlation is set or updated when the gasification furnace is installed or when the raw material procurement site is determined or changed.