WO2017117993A1 - 大尺寸基板的镀膜厚度的测量工具及测量方法 - Google Patents

大尺寸基板的镀膜厚度的测量工具及测量方法 Download PDF

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Publication number
WO2017117993A1
WO2017117993A1 PCT/CN2016/092835 CN2016092835W WO2017117993A1 WO 2017117993 A1 WO2017117993 A1 WO 2017117993A1 CN 2016092835 W CN2016092835 W CN 2016092835W WO 2017117993 A1 WO2017117993 A1 WO 2017117993A1
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WO
WIPO (PCT)
Prior art keywords
measuring
substrate
sampling
sampling substrate
mask
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Ceased
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PCT/CN2016/092835
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English (en)
French (fr)
Inventor
张峰杰
郭书鹏
刘晓云
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
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Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US15/520,406 priority Critical patent/US20180080756A1/en
Publication of WO2017117993A1 publication Critical patent/WO2017117993A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/02—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness
    • G01B21/08—Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring length, width, or thickness for measuring thickness
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material

Definitions

  • the present invention relates to the field of measuring tools, and more particularly to a tool for measuring the thickness of a coating of a large-sized substrate and a method for measuring the thickness of a coating of a large-sized substrate.
  • Vacuum evaporation is a common coating technique in which a substance to be film-formed is subjected to evaporation or sublimation in a vacuum to form a film on a substrate.
  • the evaporation apparatus Prior to batch coating production, the evaporation apparatus requires adjustment of the evaporation source to form a desired film on the substrate.
  • the coating equipment may have some problems when it is adjusted. For example, due to the large size of the substrate, the operator is very inconvenient in performing the adjustment operation. When performing the adjustment, it is necessary to use the entire substrate as a sample.
  • the thickness measurement of each layer of film requires that each layer requires a substrate as a conditioning sample, and the substrate is generally large in size and expensive to manufacture, which makes the adjustment cost high.
  • the large-sized substrate requires uniform coating thickness over the entire substrate, so that many measurement points that need to be measured during debugging, resulting in a long measurement time.
  • a coating thickness measuring tool for a large-sized substrate comprising: a measuring member having at least one measuring surface, the at least one sampling substrate being positionable and fixed on the measuring surface; A support member coupled to the measuring member, and the support member is supported on a bezel of the mask to place the measuring member inside the bezel of the mask by the support member.
  • the at least one measurement surface has a scale to indicate a position of the at least one sampling substrate on the at least one measurement surface, the at least one sampling substrate on the at least one measurement surface The position corresponds to the position of the measurement point on the large-sized substrate.
  • the measuring component of the measuring tool is a rectangular sheet-shaped body, the upper surface of the sheet-shaped body and/or The lower surface constitutes the at least one measuring surface, and the scale is distributed on the upper surface and/or the lower surface of the sheet body along the length direction of the measuring member, and the sampling substrate can be distributed along the scale.
  • the measuring component of the measuring tool has a triangular prism shape, and side surfaces of the triangular prism constitute the at least one measuring surface, and the scales are respectively distributed on each side of the triangular prism along the axial direction of the triangular prism Surfaces, the sampling substrates are arranged along the scale distribution.
  • the measuring component of the measuring tool has a groove along the scale for receiving the sampling substrate.
  • the measuring component is made of aluminum.
  • the support member is elongated and fixed on an upper surface or a lower surface of the measuring member, the length of the support member being greater than the length of the measuring member and the large-sized substrate.
  • the support member comprises two elongated supports joined to the upper or lower surface of the measuring member by gluing or screwing.
  • the support member is fixed at both ends of the measuring member, and the support member is configured to be rotatably coupled to the frame of the mask so that the measuring tool can be rotated without leaving the mask
  • the components are such that the sampling substrates positioned on different surfaces of the measuring component can be coated.
  • the measuring tool has a plurality of measuring components.
  • a method for measuring a coating thickness of a large-sized substrate by using the above measuring tool comprising the steps of: fixing at least one sampling substrate to a predetermined position of a measuring surface of the measuring member according to a scale of the measuring member, The specified position corresponds to the position of the measuring point of the large-sized substrate; the measuring member carrying the sampling substrate is connected to the inside of the frame of the mask by the supporting member, and then the mask carrying the measuring member is placed in the evaporation source of the coating device In the film forming region, wherein the sampling substrate on the at least one measuring surface of the measuring member faces the evaporation source so as to be coated by the evaporation source, after the coating is completed, the measuring tool is removed, and the sampling substrate is removed from the measuring member The coating thickness of the sampling substrate is measured to obtain a coating thickness of the large-sized substrate at the measuring point.
  • the step of coating the sampling substrate comprises: after coating the sampling substrate on one measuring surface of the measuring component, rotating the measuring component such that the other measuring surfaces face the evaporation source, thereby on the other measuring surfaces The sampled substrate was coated.
  • FIG. 1 is a partial perspective view of a measuring tool in accordance with an embodiment of the present invention.
  • FIG. 2 is a partial perspective view of a measurement tool attached to a mask in accordance with an embodiment of the present invention.
  • FIG. 3 is a partial perspective view of a measuring tool in accordance with another embodiment of the present invention.
  • FIG. 4 is a partial perspective view of a measurement tool attached to a mask in accordance with another embodiment of the present invention.
  • Figure 5 is a perspective view of a plurality of measuring tools attached to a mask in accordance with another embodiment of the present invention.
  • Figure 6 is a schematic illustration of a vapor deposition coating of an evaporation tool after attachment to a mask, in accordance with one embodiment of the present invention.
  • a coating thickness measuring tool for a large-sized substrate comprising: a measuring member having at least one measuring surface on which at least one sampling substrate can be positioned And a support member coupled to the measuring member, and the support member is supported on a frame of the mask to place the measuring member inside the frame of the mask by the support member .
  • the measuring tool of the present invention can obtain measurement on a large-sized substrate by measuring the film thickness on the sampling substrate (the position of the sampling substrate on the measuring surface corresponds to the position of the measuring point on the large-sized substrate). The film thickness at the point of the point can greatly reduce the measurement cost and shorten the measurement time.
  • the measuring member 110 is for fixing at least one sampling substrate 400 of the substrate to a specific position of the measuring member 110 by means of a fixing means such as an adhesive 113.
  • the adhesive 113 may be a high temperature resistant tape or glue.
  • the measuring member 110 is an elongated (i.e., rectangular) sheet-like body having a scale 112 distributed along the longitudinal direction of the measuring member 110 on the upper surface 111 of the measuring member 110, and the sampling substrate 400 may be arranged along the scale distribution. At a specific location.
  • a recess 114 may be provided along the scale 112 to accommodate the sampling substrate 400, the depth of the recess 114 being designed such that when the sampling substrate 400 is placed in the recess 114, the upper surface of the sampling substrate 400 and the measuring component The upper surface 111 of 110 is flush.
  • the length of the measuring member 110 is equal to the length of the large-sized substrate, so that the measuring member 110 can just fit into the frame of the mask 300.
  • a support member is disposed on a lower surface of the measuring member 110 120 (for example, including two supports).
  • the support member 120 is fixed to the lower surface of the measuring member 110 by screws or an adhesive or the like, and correspondingly, the support member 120 is provided with a groove to accommodate the screw head, thereby preventing the head of the screw from protruding from the support surface. external.
  • the support member 120 can also be made of a high temperature resistant material, such as a high temperature resistant metal.
  • the support member 120 is in the form of an elongated rod, and the length of the support member 120 is slightly longer than the length of the measuring member 110. The end of the support member 120 can be extended beyond the measuring member 110 such that the extended end can be attached to the bezel of the mask 300.
  • the specific position of the groove on the measuring member 110 which corresponds to the position of the measuring point on the large-sized substrate, is placed, and the sampling substrate 400 is placed, and then the high-temperature resistant tape is used.
  • the sampling substrates 400 are respectively fixed in specific positions in the recesses 114 such that the sampling substrate 400 does not fall out of the recesses 114 when the measuring tool is turned over, even at high temperatures.
  • the measuring tool 100 is turned over and placed on the frame of the mask 300, specifically such that the end of the supporting member 120 is attached to the frame of the mask 300, and the measuring member
  • the upper surface of the 210 is suspended downward in the frame of the mask 300.
  • the support member 220 of the measuring tool 200 is not disposed on the lower surface of the measuring member 220, but is fixed at the center of both ends of the measuring member while supporting
  • the component 220 is in the form of a shaft 220 such that the measuring component 200 of the measuring tool 200 can be rotated about the axis 220 when attached to the frame of the mask 300. Accordingly, a groove may be provided at a position on the frame of the mask 300 where the support member 220 is to be placed to accommodate the support member 220.
  • the support member 220 of the measuring tool 200 is disposed at both ends of the measuring member 210 instead of the lower surface of the measuring member 210, it is conceivable that a scale is also provided on the lower surface of the measuring member 210, so that the sampling substrate can be along the scale of the upper and lower surfaces.
  • a scale is also provided on the lower surface of the measuring member 210, so that the sampling substrate can be along the scale of the upper and lower surfaces.
  • the sampling substrates of the upper and lower surfaces of the measuring member 210 can be respectively subjected to coating without mutual interference, in other words, measuring members
  • the 210 can accept the same or different coating processes twice, so that the sampling substrates of the upper and lower surfaces each obtain a coating without replacing the measuring member 200.
  • the measuring member of the measuring tool may be formed in the shape of a triangular prism, and the scales may be respectively distributed on the side surfaces of the triangular prisms along the axial direction of the triangular prisms, and the sampling substrates are arranged along the scale, which may further Increase the number of times the measurement tool accepts the coating.
  • the shape design of the measuring member needs to take into account that each time the sampling substrate on one measuring surface is coated, the sampling substrate on the other measuring surface does not form an undesired coating, thereby affecting the sampling base on the other measuring surfaces. Film coating measurement.
  • a plurality of such measuring tools 200 may be used at one time, and as shown in FIG. 5, a plurality of measuring tools 200 carrying the sampling substrates are juxtaposed on the frame of the mask 300, so that the large-sized substrates can be measured.
  • a method of measuring a coating thickness of a large-sized substrate using the above-described measuring tool comprising the steps of: fixing at least one sampling substrate to a measuring member according to a scale of the measuring member
  • the predetermined position of the measuring surface corresponds to the position of the measuring point of the large-sized substrate; the measuring member carrying the sampling substrate is disposed inside the frame of the mask through the supporting member, and then the measuring member is loaded
  • the mask is placed in a film forming region of the evaporation source of the coating device, wherein the sampling substrate on the at least one measuring surface of the measuring member faces the evaporation source so as to be coated by the evaporation source, and after the coating is completed, the measuring tool is removed.
  • the sampling substrate is removed from the measuring member, and the plating thickness of the sampling substrate is measured to obtain a coating thickness of the large-sized substrate at the measuring point.
  • FIG. 6 shows an embodiment of a measuring method according to the present invention, in which a measuring tool 100 carrying a sampling substrate 400 is first attached to a frame of a mask 300, and then a mask 300 to which the measuring tool 100 is attached is placed.
  • a measuring tool 100 carrying a sampling substrate 400 is first attached to a frame of a mask 300, and then a mask 300 to which the measuring tool 100 is attached is placed.
  • the film forming region 510 above the evaporation source 500 of the coating device wherein the sampling substrate 400 on the measuring member 110 faces the evaporation source 500 so as to be coated by the evaporation source, after the coating is completed, the measuring tool 100 is removed, and the high temperature is removed.
  • the tape is used to remove the sampling substrate 400 from the measuring member, and the coating thickness of the sampling substrate 400 is measured, and the obtained measurement value is the coating thickness at the corresponding measuring point of the large-sized substrate.
  • the measuring tool 200 has been placed, at least one sampling substrate being provided at a position on the measuring tool corresponding to the measuring point of the large-sized substrate.
  • the mask is placed in the evaporation source film formation region 510 above the evaporation source for coating, as shown in FIG. In the case of multi-layer coating of large-sized substrates, it is necessary to measure the coating of each layer at the measuring point.
  • the measuring surface of the measuring tool on the mask is rotated so that the different measuring surfaces face the same or different evaporation sources, thereby continuing the coating.
  • the measuring tool and measuring method of the present invention greatly reduce the size of all the tools involved in the measurement, which is convenient for personnel operation, reduces sample rejection rate and improves measurement efficiency.
  • the measuring tool and the measuring method according to the present invention it is not necessary to use an expensive and fragile large-sized substrate as a sample, thereby greatly saving the measurement cost, and measuring the thickness of each layer in the multi-layer coating. This is especially true.
  • the sampling substrate is very flexible for single-row or column sampling measurements, thus saving measurement time.
  • the measuring tools of the present invention can be used in groups, and since they have a plurality of measuring surfaces, it is also possible to fix a plurality of sampling substrates at one time, and perform multiple coatings using a plurality of evaporation sources without replacing between coatings. Work with measuring tools or sampling substrates.

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Abstract

一种测量工具（100）及利用上述测量工具（100）测量大尺寸基板的镀膜厚度的方法，所述测量工具（100）包括：测量部件（110），所述测量部件（110）具有至少一个测量表面，至少一个取样基片（400）可定位且固定在所述至少一个测量表面上；和支撑部件（120），所述支撑部件（120）与所述测量部件（110）连接，并且所述支撑部件（120）能够支撑在掩膜（300）的边框上，以通过所述支撑部件（120）将所述测量部件（110）置于所述掩膜（300）的边框内。

Description

大尺寸基板的镀膜厚度的测量工具及测量方法
本申请要求于2016年1月5日递交的、申请号为201610005253.7、发明名称为“大尺寸基板的镀膜厚度的测量工具及测量方法”的中国专利申请的优先权，其全部内容通过引用并入本申请中。
技术领域
本发明涉及测量工具技术领域，尤其涉及一种用于测量大尺寸基板的镀膜厚度的工具以及测量大尺寸基板的镀膜厚度的方法。
背景技术
真空蒸镀是一种常见的镀膜技术，其将待成膜的物质置于真空中进行蒸发或升华，从而在基板上形成薄膜。在进行批量镀膜生产之前，蒸镀设备需要对蒸发源进行调节，以使得在基板上形成符合要求的薄膜。对于大尺寸的基板，镀膜设备在进行调节时会存在一些问题，例如，由于基板的尺寸很大，使得操作人员在进行调节操作时非常不方便，在进行调节时，需要使用整个基板作为样品进行镀膜，在基板需要多层镀膜的情况下，各层薄膜的厚度测量要求每一层都需要一个基板作为调节样品，而基板一般尺寸较大，并且是造价昂贵的，这样使得调节的成本很高，另外，大尺寸基板要求在整个基板上都达到均匀的镀膜厚度，因此在调试时，需要进行测量的测量点很多，由此导致测量的时间很长。
发明内容
本发明的目的是至少解决或减轻上述现有技术中的问题和缺陷的至少一个方面。
根据本发明，提出一种大尺寸基板的镀膜厚度测量工具，包括：测量部件，所述测量部件具有至少一个测量表面，所述至少一个取样基片可定位且固定在所述测量表面上；和支撑部件，所述支撑部件与所述测量部件连接，并且所述支撑部件能够支撑在掩膜的边框上，以通过所述支撑部件将所述测量部件置于所述掩膜的边框内侧。
在一实施例中，所述至少一个测量表面具有刻度以标示所述至少一个取样基片在所述至少一个测量表面上的位置，所述至少一个取样基片在所述至少一个测量表面上的位置对应于大尺寸基板上的测量点的位置。
可选地，所述测量工具的测量部件为矩形的片状体，所述片状体的上表面和/或 下表面构成所述至少一个测量表面，所述刻度沿测量部件的长度方向分布于片状体的上表面和/或下表面上，所述取样基片能够沿所述刻度分布排列。
可选地，所述测量工具的测量部件呈三棱柱形，所述三棱柱的侧表面构成所述至少一个测量表面，所述刻度沿三棱柱的轴向方向分别分布于三棱柱的每个侧表面上，所述取样基片沿所述刻度分布排列。
可选地，所述测量工具的测量部件具有沿着刻度的凹槽，所述凹槽用于容纳取样基片。
可选地，所述测量部件由铝制成。
可选地，所述支撑部件成细长形，固定于所述测量部件的上表面或下表面上，所述支撑部件的长度大于所述测量部件和所述大尺寸基板的长度。
在一实施例中，支撑部件包括两个细长支撑体，通过粘接或螺钉连接的方式连接至测量部件的上表面或下表面。
可选地，所述支撑部件固定在测量部件的两端，所述支撑部件构造成能够可转动地连接于掩膜的框架上，使得在所述测量工具不脱离掩膜的情况下能够转动测量部件，从而能够使得定位在测量部件的不同表面上的取样基片都可以被镀膜。
可选地，所述测量工具具有多个测量部件。
根据本发明，还提出一种利用上述测量工具测量大尺寸基板的镀膜厚度的方法，包括如下步骤：根据测量部件的刻度将至少一个取样基片固定在测量部件的测量表面的规定位置上，所述规定位置对应于大尺寸基板的测量点的位置；通过支撑部件将载有取样基片的测量部件连接在掩膜的框架内侧，然后将载有测量部件的掩膜置于镀膜设备的蒸发源的成膜区域中，其中，使得测量部件的至少一个测量表面上的取样基片面向蒸发源以便能够被蒸发源镀膜，在完成镀膜之后，取下测量工具，将取样基片从测量部件移除，测量取样基片的镀膜厚度，从而获得大尺寸基板在所述测量点处的镀膜厚度。
可选地，给取样基片镀膜的步骤包括对所述测量部件的一个测量表面上的取样基片进行镀膜之后，转动测量部件，使得其他测量表面面对蒸发源，从而对其它测量表面上的取样基片进行镀膜。
附图说明
图1是根据本发明的一个实施例的测量工具的局部立体图。
图2是根据本发明的一个实施例的测量工具连接在掩膜上的局部立体图。
图3是根据本发明的另一个实施例的测量工具的局部立体图。
图4是根据本发明的另一个实施例的测量工具连接在掩膜上的局部立体图。
图5是多个根据本发明的另一个实施例的测量工具连接在掩膜上的立体图。
图6是根据本发明的一个实施例的测量工具在连接在掩膜上后被蒸发源蒸镀镀膜的示意图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
根据本发明总体上的发明构思，提供了一种大尺寸基板的镀膜厚度测量工具，包括：测量部件，所述测量部件具有至少一个测量表面，至少一个取样基片可定位在所述测量表面上；和支撑部件，所述支撑部件与所述测量部件连接，并且所述支撑部件能够支撑在掩膜的边框上，以通过所述支撑部件将所述测量部件置于所述掩膜的边框内侧。在相同的镀膜条件下，本发明测量工具可通过取样基片上的膜厚的测量(取样基片在测量表面上位置与大尺寸基板上的测量点的位置相对应)获得大尺寸基板上的测量点的位置的膜厚，从可极大地节省测量成本，缩短测量时间。
在下面的详细描述中，为便于解释，阐述了许多具体的细节以提供对本披露实施例的全面理解。然而明显地，一个或多个实施例在没有这些具体细节的情况下也可以被实施。在其他情况下，公知的结构和装置以图示的方式体现以简化附图。
图1示出根据本发明的一个实施例的测量工具100，包括测量部件110，所述测量部件110可以由耐高温的材料制成，所述耐高温材料例如可以是铝。所述测量部件110用于将基板的至少一个取样基片400利用粘合剂113之类的固定装置固定在测量部件110的特定位置上。可选地，粘合剂113可以是耐高温的胶带或胶水。测量部件110为长条形(即，矩形)的片状体，在测量部件110的上表面111上沿测量部件110的长度方向分布有刻度112，取样基片400可以沿所述刻度分布排列在特定位置上。可选地，沿着刻度112可设置凹槽114以容纳取样基片400，凹槽114的深度设计成使得取样基片400放入凹槽114中时，取样基片400的上表面与测量部件110的上表面111平齐。所述测量部件110的长度与大尺寸基板的长度相等，从而使得测量部件110刚好能够放入掩膜300的框内。在测量部件110的下表面上设置有支撑部件 120(例如，包括两个支撑体)。可选地，支撑部件120通过螺钉或粘合剂等固定在测量部件110的下表面上，相应地，支撑部件120上设置凹槽以容纳螺钉头部，从而避免螺钉的头部突出于支撑表面外部。支撑部件120也可由耐高温材料，例如耐高温金属制成。支撑部件120为细长的棒状，支撑部件120的长度比测量部件110的长度稍微更长一些。使得支撑部件120的端部可延伸超过测量部件110，从而该延伸出的端部能够连接在掩膜300的边框上。
准备对取样基片进行镀膜时，在测量部件110上的凹槽的特定位置——该特定位置与大尺寸基板上的测量点的位置对应——放置取样基片400，然后利用耐高温胶带将取样基片400分别固定在凹槽114中的特定位置中，使得在将测量工具翻转时取样基片400不会从凹槽114中掉出，即使在高温的情况下亦是如此。如图2所示，将取样基片400固定后，将测量工具100翻转，放置在掩膜300的框架上，具体为使得支撑部件120的端部连接在掩膜300的框架上，而测量部件210的上表面朝下悬挂于掩膜300的框中。通过这样可以测量在大尺寸基板上的一条直线上的多个取样基片的镀膜厚度。
在根据本发明的另一个实施例中，如图3所示，测量工具200的支撑部件220，不是设置在测量部件220的下表面，而是固定在测量部件的两个端部中央，同时支撑部件220为轴220的形式，使得测量工具200的测量部件200在连接于掩膜300的框架上时可以绕轴220旋转。相应地，在掩膜300的框架上的待被放置支撑部件220的位置处也可设置凹槽以容纳支撑部件220。
由于测量工具200的支撑部件220设置在测量部件210的两端而不是在测量部件210的下表面，可以设想在测量部件210的下表面也设置刻度，从而取样基片可沿上下表面的刻度而分别设置在上、下表面上，由于测量部件210可以绕轴形支撑部件220转动，因此可以使得测量部件210的上、下表面的取样基片分别接受镀膜而不会相互干扰，换言之，测量部件210可以接受两次相同或不同的镀膜过程，使得其上、下表面的取样基片各获得一层镀膜，而无需更换测量部件200。这对于测量多层镀膜的大尺寸基板而言是非常有利的，因为可以省去重复更换和排列测量工具的费力的工作。类似地，测量工具的测量部件可以形成为三棱柱的形状，可将刻度沿三棱柱的轴向方向分别分布于三棱柱的侧表面上，将取样基片沿所述刻度分布排列，这样可以进一步增加测量工具接受镀膜的次数。但是测量部件的形状设计需要考虑到每次对一个测量表面上的取样基片进行镀膜时，不会在其他测量表面上的取样基片形成不期望的镀膜，从而影响其他测量表面上的取样基片的镀膜测量。
可选地，可以一次性使用多个这样的测量工具200，如图5所示，将载有取样基片的多个测量工具200并列排放在掩膜300的框架上，这样可以测量大尺寸基板上的不同位置的多条直线上的不同测量点处的镀膜厚度。
根据本发明总体上的发明构思，还提供了一种利用上述测量工具测量大尺寸基板的镀膜厚度的方法，所述方法包括如下步骤：根据测量部件的刻度将至少一个取样基片固定在测量部件的测量表面的规定位置上，所述规定位置对应于大尺寸基板的测量点的位置；通过支撑部件将载有取样基片的测量部件设置在掩膜的框架内侧，然后将载有测量部件的掩膜置于镀膜设备的蒸发源的成膜区域中，其中，使得测量部件的至少一个测量表面上的取样基片面向蒸发源以便能够被蒸发源镀膜，在完成镀膜之后，取下测量工具，将取样基片从测量部件移除，测量取样基片的镀膜厚度，从而获得大尺寸基板在所述测量点处的镀膜厚度。
图6示出了根据本发明的测量方法一种实施方式，首先将载有取样基片400的测量工具100连接在掩膜300的框架上，然后将连接有测量工具100的掩膜300置于镀膜设备的蒸发源500上方的成膜区域510中，其中，测量部件110上的取样基片400面向蒸发源500以便能够被蒸发源镀膜，在完成镀膜之后，取下测量工具100，拆除耐高温胶带，将取样基片400从测量部件移除，进行取样基片400的镀膜厚度的测量，获得的测量值即为大尺寸基板的相应的测量点处的镀膜厚度。
根据本发明的测量方法的另一种实施方式，将已经摆放好测量工具200——在所述测量工具上的与大尺寸基板的测量点对应的位置处设置有至少一个取样基片——的掩膜置于蒸发源上方的蒸发源成膜区510进行镀膜，如图6所示。在对大尺寸基板进行多层镀膜时，需要对测量点处的各层镀膜都进行测量，在这种情况下，无需更换掩膜上的测量工具，只需在进行下一次镀膜——在下一次镀膜时可以根据镀膜的种类相同或不同而更换蒸发源——时，转动掩膜上的测量工具的测量表面，使得不同的测量表面面对相同或不同的蒸发源，从而继续镀膜。
本发明的测量工具和测量方法使得涉及测量的所有用具的尺寸都大幅减小，这便于人员操作，降低样品报废率并提高测量效率。
此外，通过使用根据本发明的测量工具和测量方法，无需使用昂贵的且易碎的大尺寸的基板作为样品，从而极大地节省了测量成本，在多层镀膜中，测量各层镀膜厚度的情况下尤其是这样。
如果使用大尺寸的基板作为样品进行镀膜，由于需达到膜厚分布的均匀性，因此测量是很耗时的，而本发明的测量工具和测量方法仅采用排列成行或列的一系列的 取样基片非常灵活地进行单行或列的取样测量，因此节省了测量时间。
本发明的测量工具可以成组使用，并且由于其具有多个测量表面，还可以一次性地固定多个取样基片，利用多个蒸发源进行多次镀膜而无需在各次镀膜之间进行更换测量工具或取样基片的工作。
以上所述的具体实施例，对本发明的目的、技术方案和有益效果进行了进一步详细说明，应理解的是，以上所述仅为本发明的具体实施例而已，并不用于限制本发明，凡在本发明的精神和原则之内，所做的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。
应注意，措词“包括”不排除其它组件或步骤，措词“一”或“一个”不排除多个。另外，权利要求的任何组件标号不应理解为限制本发明的范围。

Claims (11)

  1. 一种大尺寸基板的镀膜厚度测量工具，包括：
    测量部件，所述测量部件具有至少一个测量表面，至少一个取样基片能够定位且固定在所述至少一个测量表面上；和
    支撑部件，所述支撑部件与所述测量部件连接，并且所述支撑部件能够支撑在掩膜的边框上，以通过所述支撑部件将所述测量部件置于所述掩膜的边框内侧。
  2. 根据权利要求1所述的测量工具，其中，所述至少一个测量表面具有刻度以标示所述至少一个取样基片在所述至少一个测量表面上的位置，所述至少一个取样基片在所述至少一个测量表面上的位置对应于大尺寸基板上的测量点的位置。
  3. 根据权利要求2所述的测量工具，其中，所述测量部件为矩形的片状体，所述片状体的上表面和/或下表面构成所述至少一个测量表面，所述刻度沿所述测量部件的长度方向分布于所述至少一个测量表面上，所述至少一个取样基片能够沿所述刻度分布排列。
  4. 根据权利要求2所述的测量工具，其中，所述测量部件呈三棱柱形，所述三棱柱的侧表面构成所述至少一个测量表面，所述刻度沿三棱柱的轴向方向分布于所述至少一个测量表面，所述至少一个取样基片能够沿所述刻度分布排列。
  5. 根据权利要求1-4中任一项所述的测量工具，其中，所述测量部件具有沿着所述刻度的凹槽，所述凹槽用于容纳所述至少一个取样基片。
  6. 根据权利要求1-4中任一项所述的测量工具，其中，所述测量部件由铝制成。
  7. 根据权利要求3或5所述的测量工具，其中，所述支撑部件呈细长形，固定于所述测量部件的上表面或下表面上，所述支撑部件的长度大于所述测量部件和所述大尺寸基板的长度。
  8. 根据权利要求7所述的测量工具，其中，所述支撑部件包括两个细长支撑体，通过粘接或螺钉连接的方式连接至所述测量部件的上表面或下表面。
  9. 根据权利要求3至5中任一项所述的测量工具，其中，所述支撑部件固定在所述测量部件的两端且被构造成能够可转动地连接在掩膜的框架上。
  10. 一种利用权利要求1-9中任一项的测量工具测量大尺寸基板的镀膜厚度的测量方法，包括如下步骤：
    根据测量部件的刻度将至少一个取样基片固定在测量部件的测量表面的规定位置上，所述规定位置对应于大尺寸基板的测量点的位置，
    通过支撑部件将载有取样基片的测量部件设置在掩膜的框架内侧，然后将载有测量部件的掩膜置于镀膜设备的蒸发源的成膜区域中，其中，使得测量部件的至少一个测量表面上的取样基片面向蒸发源以便能够被蒸发源镀膜，
    在完成镀膜之后，取下测量工具，将取样基片从测量部件移除，测量取样基片的镀膜厚度，从而获得大尺寸基板在所述测量点处的镀膜厚度。
  11. 根据权利要求10所述的测量方法，其中，给取样基片镀膜的步骤包括对所述测量部件的一个测量表面上的取样基片进行镀膜之后，转动测量部件，使得其他测量表面面对蒸发源，对其它测量表面上的取样基片进行镀膜。
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