WO2017033830A1 - Liquid crystal display element - Google Patents

Liquid crystal display element Download PDF

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Publication number
WO2017033830A1
WO2017033830A1 PCT/JP2016/074097 JP2016074097W WO2017033830A1 WO 2017033830 A1 WO2017033830 A1 WO 2017033830A1 JP 2016074097 W JP2016074097 W JP 2016074097W WO 2017033830 A1 WO2017033830 A1 WO 2017033830A1
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group
liquid crystal
formula
present
compound represented
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PCT/JP2016/074097
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French (fr)
Japanese (ja)
Inventor
小川 真治
芳典 岩下
長谷部 浩史
士朗 谷口
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Dic株式会社
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Priority to JP2017536386A priority Critical patent/JPWO2017033830A1/en
Priority to CN201680046785.3A priority patent/CN107924090A/en
Priority to KR1020187007733A priority patent/KR20180042337A/en
Publication of WO2017033830A1 publication Critical patent/WO2017033830A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/42Mixtures of liquid crystal compounds covered by two or more of the preceding groups C09K19/06 - C09K19/40
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/52Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C09K19/54Additives having no specific mesophase characterised by their chemical composition
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device

Definitions

  • the present invention relates to a liquid crystal display element using a nematic liquid crystal composition that exhibits a positive dielectric anisotropy ( ⁇ ) useful as a liquid crystal display material.
  • an IPS mode liquid crystal display device or an FFS mode liquid crystal display device (Fringe Field Switching mode Liquid Display; FFS mode liquid crystal display device) ) Is widely used (see Patent Document 1 and Patent Document 2).
  • the FFS mode is a method introduced to improve the low aperture ratio and transmittance of the IPS mode.
  • materials using p-type liquid crystal compositions having a positive dielectric anisotropy are widely used as liquid crystal compositions used in lateral alignment type liquid crystal display devices because they can easily reduce the voltage. Yes.
  • liquid crystal element manufacturers are actively developing such as adopting an array using IGZO.
  • a method called a rubbing method is often used as a liquid crystal molecule alignment method.
  • the surface of the alignment film is rubbed (rubbed) in a certain direction by rotating a roller wrapped with a cloth such as nylon while pressing it with a certain pressure on a thin film coated and baked with an alignment film material such as polyimide.
  • an alignment film material such as polyimide.
  • a photo-alignment film that imparts anisotropy to the alignment film using linearly polarized ultraviolet rays can be imparted in a non-contact manner, and therefore has been developed as a method for solving the problems of the rubbing method described above.
  • the use of a photo-alignment film has also been sought for electric field type display elements (see Patent Document 3).
  • the driving method of the liquid crystal display element for example, TN type, STN type, VA type, IPS type, In addition to FFS type and the like, as the size of super-large size display elements of 50 type or more is put into practical use, the liquid crystal composition is injected from the conventional vacuum injection method to the liquid crystal composition liquid.
  • a dropping injection method ODF: One Drop Fill
  • a droplet is dropped on one substrate surface and bonded to the other substrate is the mainstream of the injection method.
  • a laterally oriented electrode such as an IPS mode or an FFS mode has a plurality of strip-shaped electrodes formed on the substrate surface on one side arranged in parallel, and the substrate Since it has a structure in which the entire surface is covered with an alignment film, the surface of the substrate on one side has innumerable irregularities, so when the liquid crystal composition is dropped on the substrate surface, a drop mark is formed on the substrate. As a result, the problem that the drop marks cause deterioration in display quality has been brought to the surface. In addition to such problems, compatibility with the alignment film that is in direct contact with the liquid crystal composition also becomes a problem.
  • liquid crystal composition used for the active matrix drive liquid crystal display element driven by a TFT element or the like while maintaining the characteristics and performance required for a liquid crystal display element such as high-speed response performance, in addition to the characteristics of having a high specific resistance value or high voltage holding ratio, which are emphasized, and being stable against external stimuli such as light and heat, development in consideration of the manufacturing method of liquid crystal display elements has been required. ing.
  • the problem of the present invention is to solve the above problems, dielectric anisotropy ( ⁇ ), viscosity ( ⁇ ), nematic phase-isotropic liquid transition temperature (TNI), nematic phase stability at low temperature, A p-type liquid crystal composition that is excellent in various characteristics as a liquid crystal display element such as rotational viscosity ( ⁇ 1) and that can realize excellent display characteristics when used in a horizontal alignment type liquid crystal display element provided with a photo-alignment film was used.
  • the object is to provide a liquid crystal display element.
  • Another object of the present invention is to use a p-type liquid crystal composition capable of realizing excellent display characteristics (contrast, etc.) when used in a horizontal alignment type liquid crystal display device having an alignment film with improved alignment control power.
  • the object is to provide a liquid crystal display element.
  • the inventors of the present application have made extensive studies to solve the above-mentioned problems, and as a result of studying the configuration of the horizontal alignment type liquid crystal display element and the various configurations of various liquid crystal compositions and alignment films, the present invention has been completed. It came.
  • liquid crystal display element according to the present invention undergoes very small changes in specific resistance and voltage holding ratio due to heat and light, the practicality of the product is high and high-speed response can be achieved.
  • the liquid crystal composition according to the present invention is very useful because it can stably exhibit performance in the manufacturing process of the liquid crystal display element used, and can be manufactured with high yield by suppressing display defects caused by the process.
  • the liquid crystal display element according to the present invention can use a liquid crystal composition excellent in low-temperature stability and high-speed response.
  • the present invention can provide a liquid crystal display element provided with a photo-alignment film in which the alignment regulating force of liquid crystal molecules is improved.
  • the liquid crystal display element according to the present invention can realize a high contrast excellent in alignment regulating force.
  • liquid crystal display element according to the present invention uses a liquid crystal composition containing a polymerizable monomer, a very excellent high contrast can be realized.
  • FIG. 3 is a cross-sectional view of the liquid crystal display element shown in FIG. 1 cut along the line III-III in FIG.
  • FIG. 3 is a modification of FIG. 2, and is an enlarged plan view of a region surrounded by II line of an electrode layer 3 formed on a substrate 2 in FIG. 1.
  • FIG. 5 is a cross-sectional view of the liquid crystal display element shown in FIG. 1 taken along the line III-III in FIG. It is a top view which shows typically the electrode structure in the liquid crystal display element of this invention.
  • FIG. 7 is a plan view schematically showing a driving state of a suitable liquid crystal layer used in the liquid crystal display element of the present invention in a region of a broken line part VII in FIG. 6.
  • the first of the present invention the first substrate and the second substrate disposed opposite to each other, A liquid crystal layer containing a liquid crystal composition filled between the first substrate and the second substrate; Driven by the common electrode, a plurality of gate bus lines and data bus lines arranged in a matrix, a thin film transistor provided at an intersection of the gate bus line and the data bus line, and the thin film transistor on the first substrate.
  • the liquid crystal composition has a positive dielectric anisotropy, a nematic phase-isotropic liquid transition temperature of 60 ° C. or higher, and represented by the general formula (i):
  • R i1 and R i2 are each independently an alkyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or Represents an alkenyloxy group having 2 to 8 carbon atoms, and one or more hydrogen atoms in the alkyl group, alkenyl group, alkoxy group or alkenyloxy group may be substituted with a fluorine atom.
  • the methylene group in the group, alkoxy group or alkenyloxy group may be substituted with an oxygen atom unless the oxygen atom is continuously bonded, and may be substituted with a carbonyl group unless the carbonyl group is bonded continuously.
  • a i1 is (a) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O- .) (B) a 1,4-phenylene group (one —CH ⁇ present in the group or two or more non-adjacent —CH ⁇ may be replaced by —N ⁇ ) and (c) (C) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6-diyl group or One —CH ⁇ present in the 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH ⁇ may be replaced by —N ⁇ .
  • the group (a), the group (b) and the group (c) are each independently selected from the group consisting of cyano group, fluorine atom, chlorine atom, methyl group, trifluoromethyl group or trifluoro May be substituted with a methoxy group, n i1 represents 1, 2, 3 or 4, and when n i1 is 2, 3 or 4, and there are a plurality of A i1 , they may be the same or different, and n i1 is When it is 2, 3 or 4 and a plurality of Z i1 are present, they may be the same or different. ) And at least one compound selected from the group of compounds represented by formula (J):
  • R J1 represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently —CH ⁇ CH—, — Optionally substituted by C ⁇ C—, —O—, —CO—, —COO— or —OCO—, n J1 represents 0, 1, 2, 3 or 4;
  • a J1 , A J2 and A J3 are each independently (A) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O-.)
  • the group (a), the group (b) and the group (c) are each independently selected from the group consisting of cyano group, fluorine atom, chlorine atom, methyl group, trifluoromethyl group or trifluoro May be substituted with a methoxy group
  • Z J1 and Z J2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C ⁇ C—
  • n J1 is 2, 3 or 4 and a plurality of A J2 are present, they may be the same or different, and n J1 is 2, 3 or 4 and a plurality of Z J1 is present.
  • X J1 represents a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a fluoromethoxy group, a difluoromethoxy group, a trifluoromethoxy group, or a 2,2,2-trifluoroethyl group. It is a horizontal alignment type liquid crystal display element characterized by containing one or more of the compounds represented by formula (1).
  • liquid crystal display element according to the present invention and the substrate and electrode layers which are constituent elements of the liquid crystal display element will be described with reference to FIGS. Next, the liquid crystal layer and the photo-alignment film layer will be described in detail with respect to the components of the liquid crystal display element.
  • FIG. 1 is a diagram schematically showing a configuration of a liquid crystal display element.
  • the configuration of the liquid crystal display element 10 according to the present invention is sandwiched between a first (transparent insulating) substrate 2 and a second (transparent insulating) substrate 7 that are arranged to face each other.
  • the first (transparent insulating) substrate 2 has an electrode layer 3 formed on the surface on the liquid crystal layer 5 side.
  • the liquid crystal composition constituting the liquid crystal layer 5 is directly brought into contact to induce homogeneous alignment.
  • the liquid crystal molecules in the liquid crystal composition are aligned so as to be substantially parallel to the substrates 2 and 7 when no voltage is applied.
  • the second substrate 7 and the first substrate 2 may be sandwiched between a pair of polarizing plates 1 and 8.
  • a color filter 6 is provided between the second substrate 7 and the alignment film 4.
  • the liquid crystal display element according to the present invention may be a so-called color filter on array (COA), or may be provided with a color filter between an electrode layer including a thin film transistor and a liquid crystal layer, or the thin film transistor.
  • COA color filter on array
  • a color filter may be provided between the electrode layer containing and the second substrate.
  • the liquid crystal display element of the present invention between the liquid crystal layer 5 and the first substrate 2 and between the liquid crystal layer 5 and the second substrate 7.
  • the photo-alignment film 4 is formed on each of the first substrate and the second substrate.
  • the liquid crystal display element of the present invention is on the first substrate 2 or the second substrate 7.
  • the photo-alignment film 4 should just be formed in at least one.
  • the photo-alignment film 4 is formed between the liquid crystal layer 5 and the first substrate 2 so as to contact the liquid crystal layer 5 on the first substrate 2, the other liquid crystal layer 5 and the second substrate 2 It is preferable to form a photo-alignment film or a rubbing alignment film without providing an alignment film between the substrate 7 and more preferably to form a photo-alignment film.
  • the liquid crystal display element 10 includes a first polarizing plate 1, a first substrate 2, an electrode layer 3 including a thin film transistor, a (first) alignment film 4, and a liquid crystal composition. It is preferable that the liquid crystal layer 5, the (second) alignment film 4, the color filter 6, the second substrate 7, and the second polarizing plate 8 are sequentially stacked.
  • the first substrate 2 and the second substrate 7 can be made of a transparent material having flexibility such as glass or plastic, and one of them can be an opaque material such as silicon.
  • the two substrates 2 and 7 are bonded together by a sealing material and a sealing material such as an epoxy thermosetting composition disposed in the peripheral region, and in order to maintain the distance between the substrates, for example, Spacer columns made of resin formed by granular spacers such as glass particles, plastic particles, alumina particles, or the photolithography method may be arranged.
  • the substrate according to the present invention preferably contains a transparent conductive material.
  • FIG. 2 is an enlarged plan view of a region surrounded by the II line of the electrode layer 3 formed on the substrate 2 in FIG.
  • FIG. 3 is a cross-sectional view of the liquid crystal display element shown in FIG. 1 cut along the line III-III in FIG. 2 and 3 describe an example of the FFS mode as an example of a horizontal alignment type liquid crystal display element according to the present invention.
  • FIG. 4 and FIG. 5 described later describe an example of the IPS mode as an example of the horizontal alignment type liquid crystal display element according to the present invention.
  • the electrode layer 3 including thin film transistors formed on the surface of the first substrate 2 includes a plurality of gate bus lines 26 for supplying scanning signals and a plurality of gate bus lines 26 for supplying display signals.
  • Data bus lines 25 are arranged in a matrix so as to cross each other. In FIG. 2, only a pair of gate bus lines 26 and a pair of data bus lines 25 are shown.
  • a unit pixel of the liquid crystal display device is formed by a region surrounded by the plurality of gate bus lines 26 and the plurality of data bus lines 25, and a pixel electrode 21 and a common electrode 22 are formed in the unit pixel. .
  • a thin film transistor including a source electrode 27, a drain electrode 24, and a gate electrode 28 is provided in the vicinity of an intersection where the gate bus line 26 and the data bus line 25 intersect each other.
  • the thin film transistor is connected to the pixel electrode 21 as a switch element that supplies a display signal to the pixel electrode 21.
  • a common line 29 is provided in parallel with the gate bus line 26.
  • the common line 29 is connected to the common electrode 22 in order to supply a common signal to the common electrode 22.
  • a preferred embodiment of the structure of the thin film transistor is provided, for example, as shown in FIG. 3 so as to cover the gate electrode 11 formed on the surface of the substrate 2 and the gate electrode 11 and cover the substantially entire surface of the substrate 2.
  • a source electrode 17 which covers the other side edge of the layer 14 and the semiconductor layer 13 and is in contact with the gate insulating layer 12 formed on the surface of the substrate 2; and the drain Has an insulating protective layer 18 provided to cover the electrode 16 and the source electrode 17, a.
  • An anodic oxide film may be formed on the surface of the gate electrode 11 for reasons such as eliminating a step with the gate electrode.
  • Amorphous silicon, polycrystalline polysilicon, or the like can be used for the semiconductor layer 13, but when a transparent semiconductor film such as ZnO, IGZO (In—Ga—Zn—O), ITO, or the like is used, it results from light absorption. It is also preferable from the viewpoint of suppressing the adverse effect of optical carriers and increasing the aperture ratio of the element.
  • ohmic contact layers 15 may be provided between the semiconductor layer 13 and the drain electrode 16 or the source electrode 17 for the purpose of reducing the width and height of the Schottky barrier.
  • a material in which an impurity such as phosphorus such as n-type amorphous silicon or n-type polycrystalline polysilicon is added at a high concentration can be used.
  • the gate bus line 26, the data bus line 25, and the common line 29 are preferably metal films, more preferably Al, Cu, Au, Ag, Cr, Ta, Ti, Mo, W, Ni, or an alloy thereof, Al or Cu
  • the case of using the alloy wiring is particularly preferable.
  • the insulating protective layer 18 is a layer having an insulating function, and is formed of silicon nitride, silicon dioxide, silicon oxynitride film, or the like.
  • the common electrode 22 is a flat electrode formed on almost the entire surface of the gate insulating layer 12, while the pixel electrode 21 is an insulating protective layer 18 covering the common electrode 22. It is a comb-shaped electrode formed on the top. That is, the common electrode 22 is disposed at a position closer to the first substrate 2 than the pixel electrode 21, and these electrodes are disposed so as to overlap each other via the insulating protective layer 18.
  • the pixel electrode 21 and the common electrode 22 are formed of a transparent conductive material such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), IZTO (Indium Zinc Tin Oxide), and the like. Since the pixel electrode 21 and the common electrode 22 are formed of a transparent conductive material, the area opened by the unit pixel area increases, and the aperture ratio and transmittance increase.
  • the pixel electrode 21 and the common electrode 22 have an interelectrode distance (also referred to as a minimum separation distance): R between the pixel electrode 21 and the common electrode 22 in order to form a fringe electric field between the electrodes.
  • the distance between the first substrate 2 and the second substrate 7 is smaller than G.
  • the distance between electrodes: R represents the distance in the horizontal direction on the substrate between the electrodes.
  • the FFS type liquid crystal display element can use a horizontal electric field formed in a direction perpendicular to a line forming the comb shape of the pixel electrode 21 and a parabolic electric field.
  • the electrode width of the comb-shaped portion of the pixel electrode 21: l and the width of the gap of the comb-shaped portion of the pixel electrode 21: m are such that all the liquid crystal molecules in the liquid crystal layer 5 can be driven by the generated electric field. It is preferable to form.
  • the liquid crystal display element according to the present invention is preferably an FFS liquid crystal display element using a fringe electric field, and an interelectrode distance R (common electrode 22) between the common electrode 22 and the pixel electrode 21 adjacent to the common electrode 22 is used.
  • the pixel electrode 21 adjacent to the common electrode 22 is preferably shorter than the shortest separation distance G between the alignment layers 4 (inter-substrate distance).
  • the FFS mode liquid crystal display element when a voltage is applied to the liquid crystal molecules arranged so that the long axis direction is parallel to the alignment direction of the alignment layer, it is common with the pixel electrode 21.
  • An equipotential line of a parabolic electric field is formed between the electrode 22 and the upper part of the pixel electrode 21 and the common electrode 22 and is arranged along the electric field in which the major axis of the liquid crystal molecules in the liquid crystal layer 5 is formed.
  • the liquid crystal composition according to the present invention uses liquid crystal molecules having positive dielectric anisotropy, the major axis direction of the liquid crystal molecules is aligned along the generated electric field direction.
  • the common electrode and the pixel electrode are preferably formed on the same substrate.
  • the common electrode and the pixel electrode are formed on the first substrate as shown in FIGS.
  • the color filter 6 preferably forms a black matrix (not shown) in a portion corresponding to the thin film transistor and the storage capacitor 23 from the viewpoint of preventing light leakage.
  • a pair of photo-alignment films 4 that are in direct contact with the liquid crystal composition constituting the liquid crystal layer 5 and induce homogeneous alignment are provided.
  • an alignment film as a photo-alignment film, we can reduce the problem of the alignment restriction on liquid crystal molecules due to uneven rubbing and dust generated during rubbing, and provide an FFS liquid crystal display element with excellent transmittance characteristics. can do.
  • the polarizing plate 1 and the polarizing plate 8 can be adjusted so that the viewing angle and the contrast are good by adjusting the polarizing axis of each polarizing plate, and the transmission axes thereof operate in the normally black mode.
  • any one of the polarizing plate 1 and the polarizing plate 8 is preferably arranged so as to have a transmission axis parallel to the alignment direction of the liquid crystal molecules.
  • a retardation film for widening the viewing angle can also be used.
  • the common electrode is formed on substantially the entire surface of the first substrate and arranged on the first substrate side from the pixel electrode. That is, a preferred embodiment of the liquid crystal display element according to the present invention is filled between the first substrate and the second substrate that are disposed opposite to each other, and between the first substrate and the second substrate.
  • a photo-alignment film layer for inducing homogeneous alignment formed between the liquid crystal layer and the first substrate and the second substrate, respectively, and the pixel electrode and the common electrode
  • the horizontal component R of the inter-electrode distance is smaller than the distance G between the first substrate and the second substrate, the common electrode is formed almost on the entire surface of the first substrate, and the first component is higher than the pixel electrode. Arranged on the substrate side. Note that FIGS. 2 to 3 which are one mode of the present invention show a mode in which the common electrode is formed on almost the entire surface of the first substrate and
  • the FFS type liquid crystal display element described with reference to FIGS. 2 to 3 is an example, and can be implemented in various other forms without departing from the technical idea of the present invention.
  • FIGS. 4 and 5 are IPS liquid crystal display elements.
  • FIG. 4 is another embodiment of the plan view in which the region surrounded by the II line of the electrode layer 3 formed on the substrate 2 in FIG. 1 is enlarged.
  • the pixel electrode 21 may have a slit.
  • the slit pattern may be formed to have an inclination angle with respect to the gate bus line 26 or the data bus line 25.
  • the pixel electrode 21 shown in FIG. 4 has a shape in which a substantially rectangular flat plate electrode is cut out by a notch portion having a substantially rectangular frame shape.
  • a comb-like common electrode 22 is formed on one surface of the back surface of the pixel electrode 21 via an insulating layer 18 (not shown).
  • the (shortest) separation distance R between the adjacent common electrode and the pixel electrode is longer than the shortest separation distance G between the alignment layers (or substrates).
  • the surface of the pixel electrode is preferably covered with a protective insulating film and an alignment film layer.
  • a storage capacitor (not shown) for storing a display signal supplied through the data wiring 24 may be provided in an area surrounded by the plurality of gate bus lines 25 and the plurality of data bus lines 26. .
  • the shape of the notch is not particularly limited, and is not limited to the substantially rectangular shape shown in FIG. 4, and a notch having a known shape such as an ellipse, a circle, a rectangle, a rhombus, a triangle, or a parallelogram. Can be used.
  • a notch having a known shape such as an ellipse, a circle, a rectangle, a rhombus, a triangle, or a parallelogram.
  • FIG. 5 is a cross-sectional view of a liquid crystal display element according to an embodiment different from that of FIG. 3.
  • FIG. 5 is another cross-sectional view of the liquid crystal display element shown in FIG. 1 taken along the line III-III in FIG. It is an example.
  • the first substrate 2 on which the alignment layer 4 and the electrode layer 3 including the thin film transistor are formed on the surface, and the second substrate 8 on which the alignment layer 4 is formed on the surface are separated so that the alignment layers face each other at a predetermined interval G.
  • This space is filled with a liquid crystal layer 5 containing a liquid crystal composition.
  • the gate insulating film 12, the common electrode 22, the insulating film 18, the pixel electrode 21, and the alignment layer 4 are stacked in this order on part of the surface of the first substrate 2.
  • FIG. 5 shows an example in which the common electrode 22 is formed on the gate insulating film 12.
  • the common electrode 22 is formed on the first substrate 2.
  • the pixel electrode 21 may be provided via the gate insulating film 12.
  • the electrode width of the pixel electrode 21: l, the electrode width of the common electrode 22: n, and the interelectrode distance: R are appropriately adjusted to such a width that all liquid crystal molecules in the liquid crystal layer 5 can be driven by the generated electric field. It is preferable.
  • the interelectrode distance R is preferably longer than the shortest separation distance G between the substrates (that is, G ⁇ ).
  • the pixel electrode 21 is provided on the liquid crystal layer side with respect to the common electrode 22, but the pixel electrode 21 and the common electrode 22 may be provided at the same height in the thickness direction, or the common electrode 22 is the pixel electrode. 21 may be provided on the liquid crystal layer side.
  • the pixel electrode 21 and the common electrode 22 are provided at the same height in the thickness direction, as shown in FIG. 6A, the pixel electrode 21 and the common electrode 22 are loosely fitted on the same substrate. The structure to provide is mentioned.
  • the common electrode and the pixel electrode are formed on the first substrate as shown in FIGS.
  • an electric field substantially parallel to the substrate is generated between the electrodes.
  • the liquid crystal display element according to the present invention preferably has an IPS-type liquid crystal display composition using a horizontal electric field with respect to the substrate, and the substrate having a separation distance between the common electrode 22 and the pixel electrode 21 adjacent to the common electrode 22. If the horizontal component R is longer than the shortest separation distance D between the substrates (distance between the substrates), a horizontal electric field is formed between the common electrode and the pixel electrode, and the liquid crystal molecules are moved in the in-plane direction depending on the presence or absence of voltage. Switching is possible.
  • the IPS mode liquid crystal display element when a voltage is applied to the liquid crystal molecules arranged so that the long axis direction is parallel to the alignment direction of the alignment layer, the pixel electrode 21 is shared.
  • An equipotential line of a horizontal electric field is formed between the electrode 22 and the substrate, and is arranged along the electric field in which the major axis of the liquid crystal molecules in the liquid crystal layer 5 is formed.
  • the liquid crystal composition according to the present invention uses liquid crystal molecules having positive dielectric anisotropy, the major axis direction of the liquid crystal molecules is aligned along the generated electric field direction.
  • the IPS mode liquid crystal display element according to the present invention uses a specific liquid crystal composition and a specific photo-alignment film, it is possible to achieve both high-speed response and suppression of display defects.
  • a liquid crystal layer 5 is injected between the first substrate 2 and the second substrate 7 in a horizontal alignment type liquid crystal display element such as an IPS mode or an FFS mode
  • a vacuum injection method or a drop injection A method such as an ODF (One Drop Fill) method is performed, but in the present invention, in the ODF method, it is possible to suppress the occurrence of a drop mark when the liquid crystal composition is dropped onto a substrate.
  • a dripping mark is defined as a phenomenon in which a mark on which a liquid crystal composition has been dropped floats white.
  • the occurrence of dripping marks is greatly affected by the liquid crystal material to be injected, but the influence is unavoidable depending on the configuration of the display element.
  • the thin film transistor formed in the display element, the pixel electrode 21 having a comb shape or a slit, and the like are only the thin alignment film 4 or the thin alignment film 4 and the thin insulating protective layer 18. Since there is no member that separates the liquid crystal composition, there is a high possibility that the ionic substance cannot be completely blocked, and it was impossible to avoid the formation of dripping marks due to the interaction between the metal material constituting the electrode and the liquid crystal composition.
  • generation of dripping marks can be effectively suppressed.
  • the liquid crystal display element in the manufacturing process of the liquid crystal display element by the ODF method, it is necessary to drop an optimal liquid crystal injection amount according to the size of the liquid crystal display element.
  • the liquid crystal display element can be kept at a high yield because liquid crystal can be stably dropped over a long period of time with little influence on abrupt pressure change or impact in the apparatus.
  • small liquid crystal display elements that are frequently used in smartphones that have been popular recently are difficult to control the deviation from the optimal value within a certain range because the optimal liquid crystal injection amount is small.
  • a stable discharge amount of a liquid crystal material can be realized even in a small liquid crystal display element.
  • liquid crystal layer and the photo-alignment film layer which are other components of the liquid crystal display element according to the present invention, will be described in detail below.
  • the liquid crystal layer according to the present invention is a layer containing a liquid crystal composition, and is preferably composed of a liquid crystal composition.
  • the liquid crystal composition is preferably applied to a liquid crystal display element of a horizontal alignment method, for example, an FFS mode and / or an IPS mode.
  • a polymerizable monomer may be added to the liquid crystal composition according to the present invention. Therefore, the liquid crystal layer according to the present invention is preferably in a state in which the polymerizable monomer contained in the liquid crystal composition is polymerized. As will be described later, this can increase the alignment regulating force.
  • the liquid crystal composition in the present invention is one or more selected from the group consisting of a compound represented by the general formula (i) as the first component and a compound represented by the general formula (J) as the second component.
  • a liquid crystal composition having a positive dielectric anisotropy value containing a compound of formula (i) and represented by formula (J) as a second component of one or more compounds represented by formula (i) It is preferable that 1 type or 2 types or more are included.
  • the lower limit of the preferable content of the compound represented by the general formula (i) and the compound represented by the general formula (J) with respect to the total amount of the composition of the present invention is 10% and 15%. 20%, 25%, 30%, 35%, 40%, 50%, 55%, 60%, 65%, 70% 75% and 80%.
  • the upper limit of the preferable content is 97%, 95%, 85%, 75%, 65%, 55%, 45%, 35%, 30% 25% and 20%.
  • Preferred physical property values of the liquid crystal composition according to the present invention are preferably that ⁇ is 1.5 to 12, and ⁇ n is 0.08 to 0.20.
  • rings A i1 may be the same or different.
  • Ring A i1 is preferably aromatic when it is required to increase ⁇ n, and is preferably aliphatic for improving the response speed.
  • Each ring A i1 is independently Trans-1,4-cyclohexylene group, 1,3-dioxane-2,5-diyl group, tetrahydropyran-2,5-diyl group, 1,4-phenylene group, 2-fluoro-1,4-phenylene Group, 3-fluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, Represents a piperidine-1,4-diyl group, a naphthalene-2,6-diyl group, a decahydronaphthalene-2,6-diyl group or a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group
  • octylene group Represents a piperidine-1,4-diyl group, a naphthalen
  • it represents a trans-1,4-cyclohexylene group or a 1,4-phenylene group.
  • Z i1 is more preferably a single bond.
  • N i1 is preferably 2, 3 or 4. In the case of preferable conditions, since there are a plurality of Z Mi1 , they may be the same or different.
  • both R i1 and R i2 are preferably alkyl groups, and when importance is placed on reducing the volatility of the compound, it is preferably an alkoxy group, and importance is placed on lowering viscosity. In this case, at least one is preferably an alkenyl group.
  • R i1 and R i2 are each a straight-chain alkyl group having 1 to 5 carbon atoms or a straight-chain carbon atom having 1 to 4 carbon atoms when the ring structure to which R i1 is bonded is a phenyl group (aromatic).
  • the ring structure to which the alkoxy group is bonded is a saturated ring structure such as cyclohexane
  • a straight-chain alkyl group having 1 to 5 carbon atoms A linear alkoxy group having 1 to 4 carbon atoms and a straight chain alkenyl group having 2 to 5 carbon atoms are preferred.
  • the total of carbon atoms and oxygen atoms, if present, is preferably 5 or less, and is preferably linear.
  • alkyl group, alkenyl group and alkoxy group according to the present invention are all preferably linear or branched.
  • a more preferable alkenyl group according to the present invention is preferably selected from groups represented by any one of the formulas (R1) to (R5). (The black dots in each formula represent carbon atoms in the ring structure.)
  • the content of the compound represented by the general formula (i) includes solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, and drop marks. Therefore, it is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (i) with respect to the total amount of the composition of the present invention is 1%, 10%, 15%, and 20%. , 25%, 30%, 35%, 40%, 50%, 55%, 60%, 65%, 70%, 75% 80%.
  • the upper limit of the preferred content is 95%, 85%, 75%, 65%, 55%, 45%, 35%, 30%, 25% It is.
  • the above lower limit value is preferably high and the upper limit value is preferably high. Furthermore, when the composition of the present invention maintains a high Tni and requires a composition having good temperature stability, the above lower limit value is preferably high and the upper limit value is preferably high. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the above lower limit value is lowered and the upper limit value is low.
  • one or more compounds represented by the general formula (i) are contained and contained in an amount 5 to 20 times the compound represented by the general formula (M) of the second component.
  • the compound represented by the general formula (i) as the first component has effects such as high-speed response.
  • the liquid crystal composition according to the present invention can also contain one or more compounds represented by the general formula (i).
  • the compound represented by the general formula (i) includes a compound having a viscosity reducing action.
  • the kind of compound used as a compound represented with general formula (i) which is a 1st component is one kind as one embodiment of this invention, for example. Or in another embodiment of the present invention, there are two types. In another embodiment of the present invention, there are three types.
  • they are four types. Furthermore, in another embodiment of this invention, they are five types. Furthermore, in another embodiment of the present invention, there are six types. Furthermore, in another embodiment of the present invention, there are seven types. Furthermore, in another embodiment of this invention, they are eight types. Furthermore, in another embodiment of the present invention, there are nine types. Furthermore, in another embodiment of this invention, it is ten or more types.
  • the compound represented by the general formula (i) according to the present invention preferably has no chlorine atom in the molecule when chemical stability of the liquid crystal composition is required.
  • the compound represented by the general formula (i) is preferably a compound selected from the group of compounds represented by the general formulas (i-1) to (i-7).
  • the compound represented by the general formula (i-1) is the following compound.
  • R i11 and R i12 each independently represent the same meaning as R i1 and R i2 in the general formula (i).
  • R i11 and R i12 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
  • the compound represented by the general formula (i-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content is 1%, 2%, 3%, 5%, 7%, 10%, and 15% with respect to the total amount of the composition of the present invention. %, 20%, 25%, 30%, 35%, 40%, 45%, 50%, and 55%.
  • the upper limit of the preferable content is 95%, 93%, 90%, 87%, 85%, 82%, and 80% with respect to the total amount of the composition of the present invention. %, 77%, 75%, 73%, 70%, 67%, 65%, 63%, 60%, 57%, 55% %, 52%, 50%, 47%, 45%, 43%, 40%, 35%, 30%, 25%.
  • the above lower limit value is preferably high and the upper limit value is preferably high. Furthermore, when the composition of the present invention requires a high Tni and a composition having good temperature stability, it is preferable that the lower limit value is moderate and the upper limit value is moderate. When it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the lower limit value is low and the upper limit value is low.
  • the compound represented by the general formula (i-1) is preferably a compound selected from the group of compounds represented by the general formula (i-1-1).
  • the compound represented by the general formula (i-1-1) is a compound selected from the group of compounds represented by the formula (i-1-1.1) to the formula (i-1-1.3). And is preferably a compound represented by formula (i-1-1.2) or formula (i-1-1.3), and particularly represented by formula (i-1-1.3). It is preferable that it is a compound.
  • the lower limit of the preferable content of the compound represented by the formula (i-1-1.3) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, and 10%.
  • the upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
  • the compound represented by the general formula (i-1) is preferably a compound selected from the group of compounds represented by the general formula (i-1-2).
  • R i12 represents the same meaning as in general formula (i-1).
  • the lower limit of the preferable content of the compound represented by the formula (i-1-2) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 15% 17%, 20%, 23%, 25%, 27%, 30%, 35%.
  • the upper limit of the preferable content is 60%, 55%, 50%, 45%, 42%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 33%, and 30%.
  • the compound represented by the general formula (i-1-2) is a compound selected from the group of compounds represented by the formula (i-1-2.1) to the formula (i-1-2.4).
  • it is a compound represented by the formula (i-1-2.2) to the formula (i-1-2.4).
  • the compound represented by the formula (i-1-2.2) is preferable because the response speed of the composition of the present invention is particularly improved.
  • it is preferable to use a compound represented by the formula (i-1-2.3) or the formula (i-1-2.4).
  • the content of the compounds represented by the formulas (i-1-2.3) and (i-1-2.4) is preferably not more than 30% in order to improve the solubility at low temperatures.
  • the lower limit of the preferable content of the compound represented by the formula (i-1-2.2) with respect to the total amount of the composition of the present invention is 10%, 15%, 18%, 20%, 23%, 25%, 27%, 30%, 33%, 35%, 38%, and 40%.
  • the upper limit of the preferable content is 60%, 55%, 50%, 45%, 43%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 32%, 30%, 27%, 25%, and 22%.
  • the lower limit of the preferable total content of the compound represented by formula (i-1-1.3) and the compound represented by formula (i-1-2.2) relative to the total amount of the composition of the present invention The values are 10%, 15%, 20%, 25%, 27%, 30%, 35% and 40%.
  • the upper limit of the preferable content is 60%, 55%, 50%, 45%, 43%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 32%, 30%, 27%, 25%, and 22%.
  • the compound represented by the general formula (i-1) is preferably a compound selected from the group of compounds represented by the general formula (i-1-3).
  • R i13 and R i14 each independently represent an alkyl group having 1 to 8 carbon atoms or an alkoxy group having 1 to 8 carbon atoms.
  • R i13 and R i14 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
  • the lower limit of the preferable content of the compound represented by the formula (i-1-3) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%, 23%, 25%, 30%.
  • the upper limit of the preferable content is 60%, 55%, 50%, 45%, 40%, 37%, and 35% with respect to the total amount of the composition of the present invention. %, 33%, 30%, 27%, 25%, 23%, 23%, 20%, 17%, 15%, 13%, 10% %.
  • the compound represented by the general formula (i-1-3) is a compound selected from the group of compounds represented by the formula (i-1-3.1) to the formula (i-1-3.12).
  • the compound represented by the formula (i-1-3.1) is preferable because the response speed of the composition of the present invention is particularly improved. Further, when obtaining Tni higher than the response speed, the equation (i-1-3.3), the equation (i-1-3.4), the equation (i-1-3.11), and the equation (i- It is preferable to use a compound represented by 1-3.12). Sum of compounds represented by formula (i-1-3.3), formula (i-1-3.4), formula (i-1-3.11) and formula (i-1-3.12) The content of is not preferably 20% or more in order to improve the solubility at low temperatures.
  • the lower limit of the preferred content of the compound represented by formula (i-1-3.1) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferable content is 20%, 17%, 15%, 13%, 10%, 8%, and 7% with respect to the total amount of the composition of the present invention. % And 6%.
  • the compound represented by the general formula (i-1) is preferably a compound selected from the group of compounds represented by the general formula (i-1-4) and / or (i-1-5).
  • R i15 and R i16 each independently represents an alkyl group having 1 to 8 carbon atoms or an alkoxy group having 1 to 8 carbon atoms.
  • R i15 and R i16 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
  • the lower limit of the preferred content of the compound represented by formula (i-1-4) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%.
  • the upper limit of the preferable content is 25%, 23%, 20%, 17%, 15%, 13%, and 10% with respect to the total amount of the composition of the present invention. %.
  • the lower limit of the preferable content of the compound represented by the formula (i-1-5) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%.
  • the upper limit of the preferable content is 25%, 23%, 20%, 17%, 15%, 13%, and 10% with respect to the total amount of the composition of the present invention. %.
  • the compounds represented by the general formulas (i-1-4) and (i-1-5) are represented by the formulas (i-1-4.1) to (i-1-5.3). Are preferably selected from the group of compounds represented by formula (i-1-4.2) or (i-1-5.2).
  • the lower limit of the preferable content of the compound represented by the formula (i-1-4.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferable content is 20%, 17%, 15%, 13%, 10%, 8%, and 7% with respect to the total amount of the composition of the present invention. % And 6%.
  • the compound represented by the general formula (i-2) is the following compound.
  • R i21 and R i22 each independently represent the same meaning as R i1 and R i2 in formula (i)).
  • R i21 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms
  • R i22 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom.
  • An alkoxy group of 1 to 4 is preferable.
  • the compound represented by the general formula (i-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (i-2) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7% and 10%.
  • the upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
  • the compound represented by the general formula (i-2) is preferably a compound selected from the group of compounds represented by the formulas (i-2.1) to (i-2.6)
  • a compound represented by formula (i-2.1), formula (i-2.3), formula (i-2.4) and formula (i-2.6) is preferable.
  • the compound represented by the general formula (i-3) is the following compound.
  • R i31 and R i32 each independently represent the same meaning as R i1 and R i2 in the general formula (i).
  • R i31 and R i32 are each independently preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms.
  • the compound represented by the general formula (i-3) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferred content of the compound represented by formula (i-3) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7% and 10%.
  • the upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
  • the effect is high when the content is set to be large, and conversely, when high Tni is emphasized, the effect is high when the content is set low. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
  • the compound represented by the general formula (i-3) is preferably a compound selected from the group of compounds represented by the formulas (i-3.1) to (i-3.4)
  • a compound represented by formula (i-3.2) to formula (i-3.7) is preferable.
  • the compound represented by the general formula (i-4) is the following compound.
  • R i41 and R i42 each independently represent the same meaning as R i1 and R i2 in formula (i)).
  • R i41 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms
  • R i42 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom.
  • An alkoxy group of 1 to 4 is preferable.
  • the compound represented by the general formula (i-4) can be used alone, or two or more compounds can be used in combination.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the content of the compound represented by the general formula (i-4) is the solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dropping. It is necessary to adjust appropriately according to the required performance such as marks, image sticking, and dielectric anisotropy.
  • the lower limit of the preferred content of the compound represented by formula (i-4) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% .
  • the upper limit of the preferable content of the compound represented by the formula (i-4) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, 30%. 20%, 15%, 10%, 5%.
  • the compound represented by the general formula (i-4) is preferably, for example, a compound represented by the formula (i-4.1) to the formula (i-4.3).
  • the lower limit of the preferable content of the compound represented by formula (i-4.1) or formula (i-4.2) with respect to the total amount of the composition of the present invention is 3%, Yes, 7%, 9%, 11%, 12%, 13%, 18%, 21%, and the preferred upper limit is 45, 40% , 35%, 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% .
  • the amount of both compounds relative to the total amount of the composition of the present invention is The lower limit of the preferred content is 15%, 19%, 24%, and 30%, and the preferred upper limit is 45, 40%, 35%, and 30%. Yes, 25%, 23%, 20%, 18%, 15%, 13%.
  • the compound represented by the general formula (i-4) is preferably, for example, a compound represented by the formula (i-4.4) to the formula (i-4.6). It is preferable that it is a compound represented by this.
  • the lower limit of the preferable content of the compound represented by formula (i-4.4) or formula (i-4.5) with respect to the total amount of the composition of the present invention is 3%, Yes, 7%, 9%, 11%, 12%, 13%, 18%, 21%.
  • Preferred upper limit values are 45, 40%, 35%, 30%, 25%, 23%, 20%, 18%, 15%, 13% %, 10%, and 8%.
  • the amount of both compounds relative to the total amount of the composition of the present invention is 15%, 19%, 24%, and 30%, and the preferred upper limit is 45, 40%, 35%, and 30%. Yes, 25%, 23%, 20%, 18%, 15%, 13%.
  • the compound represented by the general formula (i-4) is preferably a compound represented by the formula (i-4.7) to the formula (i-4.10), and particularly the formula (i-4.
  • the compound represented by 9) is preferred.
  • the compound represented by the general formula (i-5) is the following compound.
  • R i51 and R i52 each independently represent the same meaning as R i1 and R i2 in formula (i)).
  • R i51 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms
  • R i52 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom.
  • An alkoxy group of 1 to 4 is preferable.
  • the compound represented by the general formula (i-5) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the content of the compound represented by the general formula (i-5) is such that solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dropping It is necessary to adjust appropriately according to the required performance such as marks, image sticking, and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (i-5) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% .
  • the upper limit of the preferable content of the compound represented by the formula (i-5) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, 30%. , 20%, 15%, 10%, 5%
  • the compound represented by the general formula (i-5) is represented by the formula (i-5.1) or the formula (i-5.2).
  • the compound represented by formula (i-5.1) is particularly desirable.
  • the lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%.
  • the upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
  • the compound represented by the general formula (i-5) is preferably a compound represented by the formula (i-5.3) or the formula (i-5.4).
  • the lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%.
  • the upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
  • the compound represented by the general formula (i-5) is preferably a compound selected from the group of compounds represented by the formulas (i-5.5) to (i-5.7).
  • the compound represented by i-5.7) is preferable.
  • the lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%.
  • the upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
  • the compound represented by the general formula (i-6) is the following compound.
  • R i61 and R i62 each independently represent the same meaning as R i1 and R i2 in formula (i), and X i61 and X i62 each independently represent a hydrogen atom or a fluorine atom).
  • R i61 and R i62 are each independently preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and one of X i61 and X i62 is a fluorine atom and the other is a hydrogen atom. Is preferred.
  • the compound represented by the general formula (i-6) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy.
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
  • the lower limit of the preferable content of the compound represented by the formula (i-6) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% .
  • the upper limit of the preferable content of the compound represented by the formula (i-6) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, 30%. 20%, 15%, 10%, 5%.
  • the compound represented by the general formula (i-6) is preferably a compound represented by the formula (i-6.1) to the formula (i-6.9).
  • the compound represented by the general formula (i-6) is preferably, for example, a compound represented by the formula (i-6.10) to the formula (i-6.17).
  • the compound represented by i-6.11) is preferable.
  • the lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%.
  • the upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
  • the compound represented by the general formula (i-7) is the following compound.
  • R i71 and R i72 each independently represent the same meaning as R i1 and R i2 in formula (i), and A i71 and A i72 each independently represent A i2 and in formula (i)).
  • a 1 represents the same meaning as A i3 , but the hydrogen atoms on A i71 and A i72 may each independently be substituted with a fluorine atom
  • Z i71 represents the same meaning as Z i2 in formula (i)
  • X i71 and X i72 each independently represent a fluorine atom or a hydrogen atom.
  • R i71 and R i72 are each independently preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • a i71 and A i72 Are each independently preferably a 1,4-cyclohexylene group or a 1,4-phenylene group, the hydrogen atomss
  • the kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, and four kinds.
  • the content of the compound represented by the general formula (i-7) includes solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dropping. It is necessary to adjust appropriately according to the required performance such as marks, image sticking, and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (i-7) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%.
  • the upper limit of the preferable content of the compound represented by the formula (i-7) with respect to the total amount of the composition of the present invention is 30%, 25%, 23%, and 20%. 18%, 15%, 10%, 5%.
  • the content of the compound represented by formula (i-7) is preferably increased, and when an embodiment with low viscosity is desired, the content is It is preferable to reduce the amount.
  • the compound represented by the general formula (i-7) is preferably a compound represented by the formula (i-7.1) to the formula (i-7.4), and the formula (i-7. It is preferable that it is a compound represented by 2).
  • the compound represented by the general formula (i-7) is preferably a compound represented by the formula (i-7.11) to the formula (i-7.13), and the formula (i-7. It is preferable that it is a compound represented by 11).
  • the compound represented by the general formula (i-7) is a compound represented by the formula (i-7.21) to the formula (i-7.23).
  • a compound represented by the formula (i-7.21) is preferable.
  • the compound represented by the general formula (i-7) is preferably a compound represented by the formula (i-7.31) to the formula (i-7.34), and the formula (i-7. 31) or / and a compound represented by formula (i-7.32).
  • the compound represented by the general formula (i-7) is preferably a compound represented by the formula (i-7.41) to the formula (i-7.44), and the formula (i-7. 41) or / and a compound represented by formula (i-7.42).
  • the compound represented by the general formula (i) is preferably selected from the group represented by the following general formula (i-8).
  • R i81 and R i82 each independently represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms.
  • the lower limit of the preferable content of the compound represented by formula (i-8) with respect to the total amount of the liquid crystal composition of the present invention is 1%, 2%, 4%, 5% 7%, 9%, 10%, 12%, 15%, and 17%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the liquid crystal compound having an allyl ether group at the terminal has good characteristics as a component of the liquid crystal composition, but has a problem in reliability.
  • the compound represented by the general formula (i-8) is remarkably improved in reliability by difluorinating a specific position of the benzene ring having an allyl ether group without impairing the original excellent characteristics of the skeleton. Improve, further improve compatibility, reduce viscosity.
  • the dielectric anisotropy may have a slight positive dielectric anisotropy (5 or less) depending on the type of the side chain group. It is classified as.
  • R i82 in the general formula (i-8) when an alkyl group or alkenyl group substituted with a fluorine atom is selected, a positive dielectric anisotropy can be imparted. It is.
  • the compound represented by formula (i-8) alone exhibits a liquid crystal phase in the range of 40 to 110 ° C., ⁇ n is about 0.26, flow viscosity is as low as about 25 mPa ⁇ s, and dielectric constant Anisotropy is about +4 to 5, and it has very good compatibility when used as a component of a liquid crystal composition.
  • the compounds represented by the general formula (i-8) used in the liquid crystal composition of the present invention are specifically represented by the formulas (i-8.1) to (i-8.24).
  • the compounds represented by formula (i-8.5), formula (i-8.6), formula (i-8.13) and formula (i-8.14) are particularly preferable. It is preferable to contain.
  • the lower limit of the preferable content of these compounds with respect to the total amount of the liquid crystal composition of the present invention is 1%, 2%, 4%, 5%, 6%, 7% 8%, 9%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (i-9) as the first component preferably contains at least one kind or two or more kinds of compounds represented by the following general formula (i-9.1). .
  • R L72 each independently represents an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an alkoxy having 1 to 10 carbon atoms.
  • One group selected from the group consisting of groups. From the viewpoint of improving the light resistance, heat resistance or image sticking of the liquid crystal composition, it is preferable to include a compound represented by the general formula (i-9).
  • the compound represented by the general formula (i-9) is particularly preferably a compound represented by the formula (i-9.1) to the formula (i-9.5).
  • the liquid crystal composition according to the present invention preferably contains one or more compounds represented by formula (J) as the second component (these compounds are dielectrically positive compounds ( ⁇ is greater than 2).
  • the general formula (J) as the second component is represented by the following chemical structure.
  • R J1 represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently —CH ⁇ CH—, — Optionally substituted by C ⁇ C—, —O—, —CO—, —COO— or —OCO—, n J1 represents 0, 1, 2, 3 or 4;
  • a J1 , A J2 and A J3 are each independently (A) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O-.)
  • the group (a), the group (b) and the group (c) are each independently selected from the group consisting of cyano group, fluorine atom, chlorine atom, methyl group, trifluoromethyl group or trifluoro May be substituted with a methoxy group
  • Z J1 and Z J2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C ⁇ C—
  • n J1 is 2, 3 or 4 and a plurality of A J2 are present, they may be the same or different, and n J1 is 2, 3 or 4 and a plurality of Z J1 is present.
  • X J1 represents a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a fluoromethoxy group, a difluoromethoxy group, a trifluoromethoxy group, or a 2,2,2-trifluoroethyl group.
  • R J1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or alkenyloxy having 2 to 8 carbon atoms.
  • a group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms or an alkenyloxy group having 2 to 5 carbon atoms is preferable.
  • An alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is more preferable, an alkyl group having 2 to 5 carbon atoms or an alkenyl group having 2 to 3 carbon atoms is more preferable, and an alkenyl group having 3 carbon atoms. (Propenyl group) is particularly preferred.
  • R J1 is preferably an alkyl group when emphasizing reliability, and is preferably an alkenyl group when emphasizing a decrease in viscosity.
  • the ring structure to which it is bonded is a phenyl group (aromatic)
  • An alkenyl group having 4 to 5 atoms is preferable
  • the ring structure to which the alkenyl group is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane
  • a straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred.
  • the total of carbon atoms and oxygen atoms, if present is preferably 5 or less, and is preferably linear.
  • the alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dot in each formula represents the carbon atom in the ring structure to which the alkenyl group is bonded.)
  • a J1 , A J2 and A J3 are preferably aromatic when it is required to independently increase ⁇ n, and are preferably aliphatic to improve the response speed.
  • Z J1 and Z J2 each independently preferably represent —CH 2 O—, —OCH 2 —, —CF 2 O—, —CH 2 CH 2 —, —CF 2 CF 2 — or a single bond, OCH 2 —, —CF 2 O—, —CH 2 CH 2 — or a single bond is more preferred, and —OCH 2 —, —CF 2 O— or a single bond is particularly preferred.
  • X J1 is preferably a fluorine atom or a trifluoromethoxy group, and more preferably a fluorine atom.
  • n J1 is preferably 0, 1, 2 or 3, preferably 0, 1 or 2, preferably 0 or 1 when emphasizing the improvement of ⁇ , and preferably 1 or 2 when emphasizing Tni .
  • the types of compounds that can be combined are used in combination according to desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy.
  • desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy.
  • the content of the compound represented by the general formula (J) includes solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the general formula (J) with respect to the total amount of the composition of the present invention is 1%, 10%, 20%, 30%, 40%, 50%, 55%, 60%, 65%, 70%, 75%, 80%.
  • the upper limit of the preferable content is, for example, 95%, 85%, 75%, 65%, and 55% with respect to the total amount of the composition of the present invention. Yes, 45%, 35%, 25%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • R J1 is preferably an alkyl group when emphasizing reliability, and is preferably an alkenyl group when emphasizing a decrease in viscosity.
  • the compound represented by the general formula (J) is preferably one or more selected from the group consisting of the compound represented by the general formula (M) and the compound represented by the general formula (K).
  • R M1 represents an alkyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or an alkenyl group having 2 to 8 carbon atoms.
  • C M1 and C M2 are each independently (D) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O- or -S- And (e) a 1,4-phenylene group (one —CH ⁇ present in the group or two or more non-adjacent —CH ⁇ may be replaced by —N ⁇ ).
  • K M1 and K M2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C ⁇ C—,
  • X M1 and X M3 each independently represent a hydrogen atom, a chlorine atom or a fluorine atom
  • X M2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a
  • R M1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or an alkenyloxy having 2 to 8 carbon atoms.
  • a group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms or an alkenyloxy group having 2 to 5 carbon atoms is preferable.
  • An alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is more preferable, an alkyl group having 2 to 5 carbon atoms or an alkenyl group having 2 to 3 carbon atoms is more preferable, and an alkenyl group having 3 carbon atoms. (Propenyl group) is particularly preferred.
  • R M1 is preferably an alkyl group when emphasizing reliability, and is preferably an alkenyl group when emphasizing a decrease in viscosity.
  • the ring structure to which it is bonded is a phenyl group (aromatic)
  • An alkenyl group having 4 to 5 atoms is preferable
  • the ring structure to which the alkenyl group is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane
  • a straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred.
  • the total of carbon atoms and oxygen atoms, if present is preferably 5 or less, and is preferably linear.
  • the alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dots in each formula represent carbon atoms in the ring structure.)
  • a M1 and A M2 are preferably aromatic when it is required to independently increase ⁇ n, and are preferably aliphatic for improving the response speed, and trans-1,4 -Cyclohexylene group, 1,3-dioxane-2,5-diyl group, tetrahydropyran-2,5-diyl group, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro -1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 2,3-difluoro-1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2 2.2] Octylene group, piperidine-1,4-diyl group, naphthalene-2,6-diyl group, decahydronaphthalene-2,6-diyl group or 1,2,3,4-tetrahydronaphthalene-2 , 6-diyl
  • Z M1 and Z M2 -CH 2 each independently O -, - CF 2 O - , - CH 2 CH 2 -, - CF 2 CF 2 - or may represent a single bond
  • —CF 2 O—, —CH 2 CH 2 — or a single bond is more preferable, and —CF 2 O— or a single bond is particularly preferable.
  • X M1 is preferably a fluorine atom.
  • R M1 represents a linear alkyl group having 1 to 5 carbon atoms or a linear alkoxy group having 1 to 4 carbon atoms when the ring structure to which R M1 is bonded is a phenyl group (aromatic). And an alkenyl group having 4 to 5 carbon atoms, and when the ring structure to which it is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane, a linear alkyl group having 1 to 5 carbon atoms, A straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred.
  • R M1 is preferably an alkyl group when emphasizing reliability, and is preferably an alkenyl group when emphasizing a decrease in viscosity.
  • the compound represented by the general formula (M) according to the present invention preferably does not have a chlorine atom in the molecule when chemical stability of the liquid crystal composition is required.
  • the compound having a chlorine atom in the liquid crystal composition is preferably 5% or less, preferably 3% or less, preferably 1% or less, preferably 0.5% or less, It is preferable not to contain substantially. “Substantially not contained” means that the compound produced as an impurity during the production of the compound is not intended and only a compound containing a chlorine atom is mixed in the liquid crystal composition.
  • the types of compounds that can be combined are used in combination according to desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy.
  • desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy.
  • the content of the compound represented by the general formula (M) includes solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (M) with respect to the total amount of the composition of the present invention is 1%, 10%, 15%, 20%, 25 %, 30%, 35%, 40%, 50%, 55%, 60%, 65%, 70%, 75%, 80% %.
  • the upper limit of the preferable content is, for example, 95%, 85%, 75%, 65%, and 55% with respect to the total amount of the composition of the present invention. Yes, 45%, 35%, 30%, 25%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M) according to the present invention is preferably, for example, a compound selected from the group of compounds represented by the general formula (M-1).
  • R M11 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X M11 to X M15 each independently represents hydrogen. represents an atom or a fluorine atom
  • Y M11 represents a fluorine atom or OCF 3.
  • the type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
  • the lower limit of the preferable content of the compound represented by the formula (M-1) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-1) is specifically preferably a compound represented by the formula (M-1.1) to the formula (M-1.4).
  • a compound represented by M-1.1) or formula (M-1.2) is preferred, and a compound represented by formula (M-1.2) is more preferred. It is also preferred to use the compounds represented by formula (M-1.1) or formula (M-1.2) at the same time.
  • the lower limit of the preferable content of the compound represented by the formula (M-1.1) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is.
  • the upper limit of the preferable content is 15%, 13%, 10%, 8%, and 5%.
  • the lower limit of the preferable content of the compound represented by the formula (M-1.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is.
  • the upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
  • the lower limit of the preferable total content of the compounds represented by the formulas (M-1.1) and (M-1.2) with respect to the total amount of the composition of the present invention is 1%, %, 5% and 6%.
  • the upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
  • the compound represented by the general formula (M) is preferably a compound selected from the group of compounds represented by the general formula (M-2), for example.
  • R M21 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X M21 and X M22 each independently represent hydrogen represents an atom or a fluorine atom
  • Y M21 represents a fluorine atom, a chlorine atom or OCF 3.
  • the lower limit of the preferable content of the compound represented by the formula (M-1) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention is required to maintain a high Tni and hardly burn-in, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-2) is preferably a compound represented by the formula (M-2.1) to the formula (M-2.5). 3) or / and a compound represented by the formula (M-2.5) is preferable.
  • the lower limit of the preferable content of the compound represented by the formula (M-2.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is.
  • the upper limit of the preferable content is 15%, 13%, 10%, 8%, and 5%.
  • the lower limit of the preferable content of the compound represented by the formula (M-2.3) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is.
  • the upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
  • the lower limit of the preferable content of the compound represented by the formula (M-2.5) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is.
  • the upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
  • Lower limit value of the preferable total content of the compounds represented by formulas (M-2.2), (M-2.3) and formula (M-2.5) with respect to the total amount of the composition of the present invention Is 1%, 2%, 5%, 6%.
  • the upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
  • the content is preferably 1% or more with respect to the total amount of the composition of the present invention, more preferably 5% or more, further preferably 8% or more, further preferably 10% or more, and more preferably 14% or more. 16% or more is particularly preferable.
  • the maximum ratio is preferably limited to 30% or less, more preferably 25% or less, more preferably 22% or less, and more preferably 20%. Less than is particularly preferred.
  • the compound represented by the general formula (M) used in the composition of the present invention is preferably a compound represented by the general formula (M-3).
  • R M31 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X M31 to X M36 are each independently hydrogen. represents an atom or a fluorine atom
  • Y M31 represents a fluorine atom, a chlorine atom or OCF 3.
  • the content of the compound represented by the general formula (M-3) is an upper limit for each embodiment in consideration of properties such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. There is a lower limit.
  • the lower limit of the preferable content of the compound represented by the formula (M-3) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, and 20%.
  • the upper limit of the preferable content is 20%, 18%, 15%, 13%, 10%, 8%, and 5%.
  • the compound represented by the general formula (M-3) used in the composition of the present invention is specifically represented by the formula (M-3.1) to the formula (M-3.4).
  • a compound is preferable, and among them, a compound represented by Formula (M-3.1) and / or Formula (M-3.2) is preferably contained.
  • the lower limit of the preferable content of the compound represented by the formula (M-3.1) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferable content is 20%, 18%, 15%, 13%, 10%, 8%, and 5%.
  • the lower limit of the preferable content of the compound represented by the formula (M-3.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferable content is 20%, 18%, 15%, 13%, 10%, 8%, and 5%.
  • the lower limit of the preferable total content of the compounds represented by the formulas (M-3.1) and (M-3.2) with respect to the total amount of the composition of the present invention is 1%, %, 4%, 5%, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferable content is 20%, 18%, 15%, 13%, 10%, 8%, and 5%.
  • the compound represented by the general formula (M) is preferably a compound selected from the group represented by the general formula (M-4).
  • R M41 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X M41 to X M48 are each independently fluorine.
  • Y M41 represents a fluorine atom, a chlorine atom or OCF 3.
  • the content of the compound represented by the general formula (M-4) is an upper limit for each embodiment in consideration of properties such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. There is a lower limit.
  • the lower limit of the preferable content of the compound represented by the formula (M-4) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, and 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • composition of the present invention When used for a liquid crystal display device having a small cell gap, it is suitable to increase the content of the compound represented by the general formula (M-4).
  • a liquid crystal display element having a low driving voltage When used for a liquid crystal display element having a low driving voltage, it is suitable to increase the content of the compound represented by the general formula (M-4).
  • a liquid crystal display element used in a low temperature environment it is suitable to reduce the content of the compound represented by the general formula (M-4).
  • a composition used for a liquid crystal display device having a high response speed it is suitable to reduce the content of the compound represented by the general formula (M-4).
  • the compound represented by the general formula (M-4) used in the composition of the present invention is specifically represented by the formula (M-4.1) to the formula (M-4.4).
  • it is a compound, and among them, it is preferable to contain a compound represented by the formula (M-4.2) to the formula (M-4.4), and a compound represented by the formula (M-4.2) It is more preferable to contain.
  • the compound represented by the general formula (M) is preferably a compound represented by the general formula (M-5).
  • R M51 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X M51 and X M52 are each independently hydrogen. represents an atom or a fluorine atom
  • Y M51 represents a fluorine atom, a chlorine atom or OCF 3.
  • the lower limit of the preferable content of the compound represented by the formula (M-5) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferable content is 50%, 45%, 40%, 35%, 33%, 30%, 28%, 25%, 23% 20%, 18%, 15%, 13%, 10%, 8%, 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention is required to maintain a high Tni and hardly burn-in, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-5) is preferably a compound represented by the formula (M-5.1) to the formula (M-5.4), and the formula (M-5.
  • a compound represented by formula (M-5.4) is preferable.
  • the lower limit of the preferred content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8%, 10%, 13% Yes, 15%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-5) is preferably a compound represented by the formula (M-5.11) to the formula (M-5.17), and the formula (M-5. 11), a compound represented by formula (M-5.13) and formula (M-5.17) is preferable.
  • the lower limit of the preferred content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8%, 10%, 13% Yes, 15%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-5) is preferably a compound represented by the formula (M-5.21) to the formula (M-5.28), and the formula (M-5. 21), a compound represented by formula (M-5.22), formula (M-5.23) and formula (M-5.25).
  • the lower limit of the preferred content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8%, 10%, 13% Yes, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferable content is 40%, 35%, 33%, 30%, 28%, 25%, 23%, 20%, 18% 15% 13% 10% 8% 5%
  • the compound represented by the general formula (M) is preferably a compound represented by the general formula (M-6).
  • R M61 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X M61 to X M64 are each independently fluorine.
  • Y M61 represents a fluorine atom, a chlorine atom or OCF 3
  • the lower limit of the preferable content of the compound represented by the formula (M-6) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, and 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • composition of the present invention When the composition of the present invention is used for a liquid crystal display device having a low driving voltage, it is suitable to increase the content of the compound represented by the general formula (M-6). In the case of a composition used for a liquid crystal display device having a high response speed, it is suitable to reduce the content of the compound represented by the general formula (M-6).
  • the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.1) to the formula (M-6.4). It is preferable to contain a compound represented by M-6.2) and formula (M-6.4).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.11) to the formula (M-6.14). It is preferable to contain a compound represented by M-6.12) and formula (M-6.14).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.21) to the formula (M-6.24). It is preferable to contain a compound represented by formula (M-6.21), formula (M-6.22) and formula (M-6.24).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.31) to the formula (M-6.34). Among them, it is preferable to contain a compound represented by the formula (M-6.31) and the formula (M-6.32).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.41) to the formula (M-6.44). It is preferable to contain a compound represented by M-6.42).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M) is preferably a compound selected from the group of compounds represented by the general formula (M-7).
  • X M71 to X M76 each independently represents a fluorine atom or a hydrogen atom
  • R M71 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or 1 to 4 represents an alkoxy group
  • Y M71 represents a fluorine atom or OCF 3.
  • the content of the compound represented by the general formula (M-7) is an upper limit for each embodiment in consideration of properties such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. There is a lower limit.
  • the lower limit of the preferable content of the compound represented by the formula (M-7) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • composition of the present invention When used for a liquid crystal display device having a small cell gap, it is suitable to increase the content of the compound represented by the general formula (M-7).
  • the composition of the present invention When used for a liquid crystal display element with a low driving voltage, it is suitable to increase the content of the compound represented by the general formula (M-7).
  • it when used for a liquid crystal display element used in a low temperature environment, it is suitable to reduce the content of the compound represented by the general formula (M-7).
  • a composition used for a liquid crystal display device having a high response speed it is suitable to reduce the content of the compound represented by the general formula (M-7).
  • the compound represented by the general formula (M-7) is preferably a compound represented by the formula (M-7.1) to the formula (M-7.4), and the formula (M-7. It is preferable that it is a compound represented by 2).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-7) is preferably a compound represented by the formula (M-7.11) to the formula (M-7.14), and the formula (M-7. 11) and a compound represented by the formula (M-7.12) are preferable.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-7) is preferably a compound represented by the formula (M-7.21) to the formula (M-7.24). 21) and a compound represented by the formula (M-7.22) are preferable.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M) is preferably a compound represented by the general formula (M-8).
  • X M81 to X M84 each independently represents a fluorine atom or a hydrogen atom
  • Y M81 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M81 represents an alkyl group having 1 to 5 carbon atoms
  • a M81 and A M82 are each independently 1,4-cyclohexylene group, 1,4-phenylene group or
  • the hydrogen atom on the 1,4-phenylene group may be substituted with a fluorine atom.
  • the lower limit of the preferable content of the compound represented by formula (M-8) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.1) to the formula (M-8.4).
  • it is a compound, and among them, it is preferable to contain a compound represented by formula (M-8.1) or formula (M-8.2).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.11) to the formula (M-8.14).
  • a compound is preferable, and among them, a compound represented by the formula (M-8.12) is preferably included.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.21) to the formula (M-8.24).
  • a compound is preferable, and among them, a compound represented by the formula (M-8.22) is preferably contained.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.31) to the formula (M-8.34).
  • a compound is preferable, and among them, a compound represented by the formula (M-8.32) is preferably contained.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by formula (M-8) used in the composition of the present invention is specifically represented by formula (M-8.41) to formula (M-8.44).
  • a compound is preferable, and among them, a compound represented by the formula (M-8.42) is preferably included.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.51) to the formula (M-8.54).
  • a compound is preferable, and among them, a compound represented by the formula (M-8.52) is preferably included.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M) may have the following partial structure in its structure.
  • the black spot in the formula represents a carbon atom in the ring structure to which the partial structure is bonded.
  • the compound having the partial structure is preferably a compound represented by general formulas (M-10) to (M-18).
  • the compound represented by the general formula (M-10) is as follows.
  • X M101 and X M102 each independently represent a fluorine atom or a hydrogen atom
  • Y M101 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M101 represents an alkyl group having 1 to 5 carbon atoms
  • W M101 and W M102 each independently represent —CH 2 — or —O—.
  • the lower limit of the preferable content of the compound represented by the general formula (M-10) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by formula (M-10) used in the composition of the present invention is specifically represented by formula (M-10.1) to formula (M-10.12).
  • a compound is preferable, and among them, a compound represented by formula (M-10. 5) to formula (M-10.12) is preferably contained.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-11) is as follows.
  • X M111 to X M114 each independently represents a fluorine atom or a hydrogen atom
  • Y M111 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M111 represents an alkyl group having 1 to 5 carbon atoms
  • the lower limit of the preferable content of the compound represented by the general formula (M-11) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-11) used in the composition of the present invention is specifically represented by the formula (M-11.1) to the formula (M-11.8).
  • a compound is preferable, and among them, a compound represented by formula (M-11.1) to formula (M-11.4) is preferably contained.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-12) is as follows.
  • X M121 and X M122 each independently represent a fluorine atom or a hydrogen atom
  • Y M121 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M121 represents an alkyl group having 1 to 5 carbon atoms
  • W M121 and W M122 each independently represent —CH 2 — or —O—.
  • the lower limit of the preferable content of the compound represented by formula (M-12) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-12) used in the composition of the present invention is specifically represented by the formula (M-12.1) to the formula (M-12.12).
  • a compound is preferable, and among them, a compound represented by formula (M-12.5) to formula (M-12.8) is preferably contained.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-13) is as follows.
  • X M131 to X M134 each independently represents a fluorine atom or a hydrogen atom
  • Y M131 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M131 represents an alkyl group having 1 to 5 carbon atoms
  • W M131 and W M132 each independently represent —CH 2 — or —O—.
  • the lower limit of the preferable content of the compound represented by formula (M-13) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-13) used in the composition of the present invention is specifically represented by the formula (M-13.1) to the formula (M-13.28). It is preferable that the compound is a compound, and among them, from the formulas (M-13.1) to (M-13.4), (M-13.11) to (M-13.14), (M-13.25) to ( It is preferable to contain a compound represented by M-13.28).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-14) is as follows.
  • X M141 to X M144 each independently represents a fluorine atom or a hydrogen atom
  • Y M141 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M141 represents an alkyl group having 1 to 5 carbon atoms
  • W M141 and W M142 each independently represent —CH 2 — or —O—.
  • the lower limit of the preferable content of the compound represented by the general formula (M-14) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-14) used in the composition of the present invention is specifically represented by the formula (M-14.1) to the formula (M-14.8).
  • a compound is preferable, and among them, a compound represented by formula (M-14.5) and formula (M-14.8) is preferably contained.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-15) is as follows.
  • X M151 and X M152 each independently represent a fluorine atom or a hydrogen atom
  • Y M151 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M151 represents an alkyl group having 1 to 5 carbon atoms
  • W M151 and W M152 each independently represent —CH 2 — or —O—.
  • the lower limit of the preferred content of the compound represented by formula (M-15) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-15) used in the composition of the present invention is specifically represented by the formulas (M-15.1) to (M-15.14).
  • the compound contains a compound represented by formula (M-15.5) to formula (M-15.8) or formula (M-15.11) to formula (M-15.14). It is preferable to do.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-16) is as follows.
  • X M161 to X M164 each independently represents a fluorine atom or a hydrogen atom
  • Y M161 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M161 represents an alkyl group having 1 to 5 carbon atoms
  • the lower limit of the preferable content of the compound represented by formula (M-16) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-16) used in the composition of the present invention is specifically represented by the formula (M-16.1) to the formula (M-16.8).
  • a compound is preferable, and among them, it is preferable to include a compound represented by Formula (M-16.1) to Formula (M-16.4).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-17) is as follows.
  • X M171 ⁇ X M174 are each independently a fluorine atom or a hydrogen atom, Y M171 fluorine atom, a chlorine atom or -OCF 3,
  • R M171 is an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and
  • W M171 and W M172 each independently represent —CH 2 — or —O—.
  • the lower limit of the preferable content of the compound represented by formula (M-17) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-17) used in the composition of the present invention is specifically represented by the formula (M-17.1) to the formula (M-17.52).
  • the compound is a compound (M-17.9) to (M-17.12), (M-17.21) to (M-17.28), (M-17. 45) to a compound represented by the formula (M-17.48) is preferably contained.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (M-18) is as follows.
  • X M181 to X M186 each independently represents a fluorine atom or a hydrogen atom
  • Y M181 represents a fluorine atom, a chlorine atom or —OCF 3
  • R M181 represents an alkyl group having 1 to 5 carbon atoms
  • the lower limit of the preferred content of the compound represented by formula (M-18) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (M-18) used in the composition of the present invention is specifically represented by the formula (M-18.1) to the formula (M-18.12).
  • a compound is preferable, and among them, it is preferable to include a compound represented by Formula (M-18.5) to Formula (M-18.8).
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • composition of the present invention preferably contains one or more compounds represented by the general formula (K). These compounds correspond to dielectrically positive compounds ( ⁇ is greater than 2).
  • R K1 represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently —CH ⁇ CH—, — Optionally substituted by C ⁇ C—, —O—, —CO—, —COO— or —OCO—, n K1 represents 0, 1, 2, 3 or 4;
  • a K1 and A K2 are each independently (A) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O- or -S- And (b) a 1,4-phenylene group (one —CH ⁇ present in this group or two or more non-adjacent —CH ⁇ may be replaced by —N ⁇ ).
  • a hydrogen atom on the group (a) and the group (b) may be independently substituted with a cyano group, a fluorine atom or a chlorine atom
  • Z K1 and Z K2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C ⁇ C—
  • n K1 is 2, 3 or 4 and a plurality of A K2 are present, they may be the same or different, and n K1 is 2, 3 or 4 and a plurality of Z K1 is present
  • X K1 and X K3 each independently represent a hydrogen atom, a chlorine atom or a fluorine atom
  • X K2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a
  • R K1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or alkenyloxy having 2 to 8 carbon atoms.
  • a group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms or an alkenyloxy group having 2 to 5 carbon atoms is preferable.
  • An alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is more preferable, an alkyl group having 2 to 5 carbon atoms or an alkenyl group having 2 to 3 carbon atoms is more preferable, and an alkenyl group having 3 carbon atoms. (Propenyl group) is particularly preferred.
  • RK1 is preferably an alkyl group when importance is placed on reliability, and an alkenyl group is preferred when importance is placed on lowering viscosity.
  • the ring structure to which it is bonded is a phenyl group (aromatic)
  • An alkenyl group having 4 to 5 atoms is preferable
  • the ring structure to which the alkenyl group is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane
  • a straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred.
  • the total of carbon atoms and oxygen atoms, if present is preferably 5 or less, and is preferably linear.
  • the alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dot in each formula represents the carbon atom in the ring structure to which the alkenyl group is bonded.)
  • a K1 and A K2 are preferably aromatic when it is required to independently increase ⁇ n, and are preferably aliphatic for improving the response speed, and trans-1,4 -Cyclohexylene group, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 2, 3-difluoro-1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, piperidine-1,4-diyl group, naphthalene-2,6- It preferably represents a diyl group, decahydronaphthalene-2,6-diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, and more preferably represents the following structure:
  • Z K1 and Z K2 are each independently -CH 2 O -, - CF 2 O -, - CH 2 CH 2 -, - CF 2 CF 2 - or preferably a single bond, -CF 2 O-, —CH 2 CH 2 — or a single bond is more preferable, and —CF 2 O— or a single bond is particularly preferable.
  • n K1 is preferably 0, 1, 2 or 3, preferably 0, 1 or 2, preferably 0 or 1 when emphasizing the improvement of ⁇ , and preferably 1 or 2 when emphasizing Tni. .
  • the types of compounds that can be combined are used in combination according to desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy.
  • desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy.
  • the content of the compound represented by the general formula (K) is low-temperature solubility, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
  • the lower limit of the preferable content of the compound represented by the formula (K) with respect to the total amount of the composition of the present invention is 1%, 10%, 20%, 30%, 40% %, 50%, 55%, 60%, 65%, 70%, 75%, 80%.
  • the upper limit of the preferable content is, for example, 95%, 85%, 75%, 65%, and 55% with respect to the total amount of the composition of the present invention. Yes, 45%, 35%, 25%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (K) is preferably a compound selected from the group of compounds represented by the general formula (K-1), for example.
  • R K11 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X K11 to X K14 are each independently hydrogen. represents an atom or a fluorine atom
  • Y K11 represents a fluorine atom or OCF 3.
  • the type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
  • the lower limit of the preferable content of the compound represented by the formula (K-1) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (K-1) is specifically preferably a compound represented by the formula (K-1.1) to the formula (K-1.4).
  • a compound represented by formula (K-1.2) is preferred, and a compound represented by formula (K-1.2) is more preferred. It is also preferred to use the compounds represented by formula (K-1.1) or formula (K-1.2) at the same time.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by General Formula (K) is preferably a compound selected from the group of compounds represented by General Formula (K-2), for example.
  • R K21 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X K21 to X K24 are each independently hydrogen. represents an atom or a fluorine atom
  • Y K21 represents a fluorine atom or OCF 3.
  • the type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
  • the lower limit of the preferable content of the compound represented by the formula (K-2) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (K-2) is specifically preferably a compound represented by the formula (K-2.1) to the formula (K-2.6).
  • a compound represented by formula (K-2.5) or formula (K-2.6) is preferred, and a compound represented by formula (K-2.6) is more preferred. It is also preferred to use the compounds represented by formula (K-2.5) or formula (K-2.6) at the same time.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by General Formula (K) is preferably a compound selected from the group of compounds represented by General Formula (K-3), for example.
  • R K31 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X K31 to X K36 are each independently hydrogen.
  • Y K31 represents a fluorine atom or OCF 3.
  • the type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
  • the lower limit of the preferable content of the compound represented by the formula (K-3) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (K-3) is preferably a compound represented by the formula (K-3.1) to the formula (K-3.4).
  • a compound represented by K-3.1) or formula (K-3.2) is more preferable. It is also preferred to use the compounds represented by formula (K-3.1) and formula (K-3.2) at the same time.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (K) is preferably, for example, a compound selected from the group of compounds represented by the general formula (K-4).
  • R K41 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X K41 to X K46 are each independently hydrogen.
  • An atom or a fluorine atom Y K41 represents a fluorine atom or OCF 3
  • Z K41 represents —OCH 2 —, —CH 2 O—, —OCF 2 —, or —CF 2 O—.
  • the lower limit of the preferable content of the compound represented by the formula (K-4) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (K-4) is preferably a compound represented by the formula (K-4.1) to the formula (K-4.18). More preferred are compounds represented by (K-4.1), formula (K-4.2), formula (K-4.11), and (K-4.12). It is also preferred to use compounds represented by formula (K-4.1), formula (K-4.2), formula (K-4.11), and (K-4.12) at the same time.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by the general formula (K) is preferably a compound selected from, for example, a compound group represented by the general formula (K-5).
  • R K51 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X K51 to X K56 are each independently hydrogen.
  • An atom or a fluorine atom Y K51 represents a fluorine atom or OCF 3
  • Z K51 represents —OCH 2 —, —CH 2 O—, —OCF 2 —, or —CF 2 O—.
  • the lower limit of the preferable content of the compound represented by the formula (K-5) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (K-5) is preferably a compound represented by the formula (K-5.1) to the formula (K-5.18).
  • a compound represented by the formula (K-5.14) to the compound represented by the formula (K-5.14) is preferable, and a compound represented by the formula (K-5.12) is more preferable.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the compound represented by General Formula (K) is preferably a compound selected from the group of compounds represented by General Formula (K-6), for example.
  • R K61 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms
  • X K61 to X K68 are each independently hydrogen. represents an atom or a fluorine atom
  • Y K61 represents a fluorine atom or OCF 3
  • Z K61 is -OCH 2 -, - CH 2 O -, - OCF 2 - or an -CF 2 O-).
  • the lower limit of the preferable content of the compound represented by the formula (K-6) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
  • the compound represented by the general formula (K-6) is preferably a compound represented by the formula (K-6.1) to the formula (K-6.18).
  • Compounds represented by formula (K-6.18) to formula (K-6.18) are preferred, and compounds represented by formula (K-6.16) and formula (K-6.17) are more preferred. It is also preferred to use the compounds represented by formula (K-6.16) and formula (K-6.17) at the same time.
  • the lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%.
  • the upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
  • R 1a and R 2a represent the same meaning as R i1 in the general formula (i), respectively
  • R 1b and R 2b represent the general formula (i), respectively.
  • n 1b represents 1 or 2
  • a 1b are each independently trans-1,4-cyclohexylene group, 1,3-dioxane-2,5-diyl group
  • one hydrogen atom in the group is substituted with a fluorine atom
  • at least one or two types are selected from the group of compounds represented by :), more preferably three types are selected.
  • At least two compounds selected from the compound group represented by the general formula (Ia) and the general formula (Ib) are contained in an amount of 25 to 99% by mass in the entire liquid crystal composition.
  • the content is preferably 30 to 80% by mass, more preferably 35 to 60% by mass, and still more preferably 40 to 55% by mass.
  • More preferred embodiments of the liquid crystal composition according to the present invention include the general formula (II-a) and the general formula (II-b) as the second component.
  • R 3a and R 3b represent the same meaning as R i1 in the general formula (i), respectively, X 1a and X 1b represent a fluorine atom, —OCF 3 or —CF 3 , wherein A 2a and A 2b are each independently a trans-1,4-cyclohexylene group, 1,3-dioxane-2,5-diyl group, tetrahydropyran-2,5- Represents a diyl group, a 1,4-phenylene group, a 1,4-cyclohexenylene group or a naphthalene-2,6-diyl group, and one hydrogen atom in the group may be substituted with a fluorine atom.
  • m 2a and Z 2b each independently represents a single bond, —CF 2 O—, OCF 2 —, CH 2 O— or —OCH 2 —, and m 2a and m 2b represent 1 or 2.
  • m 2a and m 2b When the 2, may be identical or different each A 2a and A 2b, at least from the Z 2a and Z 2b may each be the same or different.)
  • a compound represented by 1 It is preferred that a species or two types of compounds are selected.
  • the combination of the general formula (II-a) and the general formula (II-b) occupies 5 to 35% of the entire liquid crystal composition, an effect of ensuring an improvement of ⁇ n and a driveable ⁇ is obtained. Furthermore, when it is used in combination with a suitable combination of the first component and the total amount of the first component is greater than the amount of the second component, high-speed response can be maintained. Further, the combination of the general formula (II-a) or the general formula (II-b) and the general formula (Ia) or the general formula (Ib) is a phase between the compounds of the components of the liquid crystal composition. In order to improve the solubility, the storage stability of the liquid crystal composition is improved, whereby the problem of precipitation of the liquid crystal compound can be suppressed / prevented.
  • the liquid crystal composition according to the present invention as the first component, at least one compound or two or more compounds are selected from the compound group represented by the general formula (Ia) and the general formula (Ia).
  • at least two kinds are selected as the second component from the compound group represented by the general formula (IIa) and the general formula (IIb)
  • the problem regarding the low temperature stability that the liquid crystal compound is precipitated but also the dropwise addition All of the problems of scars and the effect of maintaining high-speed response can be achieved.
  • the lower limit value of the total content of the compounds represented by the general formula (i) and the general formula (J) with respect to the total amount of the composition of the present invention is 80%, 85%, 88% 90%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99%, 100% It is.
  • the upper limit of the preferable content is 100%, 99%, 98%, and 95%.
  • the lower limit of the preferable total content of the compounds represented by the general formula (i), general formula (M) and (K) with respect to the total amount of the composition of the present invention is 80% and 85%. Yes, 88%, 90%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99% Yes, 100%.
  • the upper limit of the preferable content is 100%, 99%, 98%, and 95%.
  • the lower limit of the preferable total content of the compounds to be obtained is 80%, 85%, 88%, 90%, 92%, 93%, 94%, 95% %, 96%, 97%, 98%, 99%, 100%.
  • the upper limit of the preferable content is 100%, 99%, 98%, and 95%.
  • composition of the present invention preferably does not contain a compound having a structure in which oxygen atoms such as a peracid (—CO—OO—) structure are bonded in the molecule.
  • the content of the compound having a carbonyl group is preferably 5% or less, more preferably 3% or less with respect to the total mass of the composition. Preferably, it is more preferably 1% or less, and most preferably not substantially contained.
  • the content of the compound substituted with chlorine atoms is preferably 15% or less, preferably 10% or less, based on the total mass of the composition. % Or less, preferably 5% or less, more preferably 3% or less, and still more preferably substantially not contained.
  • the content of a compound in which all the ring structures in the molecule are 6-membered rings is 80% relative to the total mass of the composition. % Or more, more preferably 90% or more, still more preferably 95% or more, and the composition is composed only of a compound in which all of the ring structures in the molecule are all 6-membered rings. Most preferably.
  • the content of the compound having a cyclohexenylene group as a ring structure, and the content of the compound having a cyclohexenylene group as the total mass of the composition is preferably 10% or less, preferably 8% or less, more preferably 5% or less, preferably 3% or less, and still more preferably not contained.
  • the content of a compound having a 2-methylbenzene-1,4-diyl group in the molecule, in which a hydrogen atom may be substituted with a halogen may be reduced.
  • the content of the compound having a 2-methylbenzene-1,4-diyl group in the molecule is preferably 10% or less, more preferably 8% or less, based on the total mass of the composition. It is more preferably 5% or less, further preferably 3% or less, and still more preferably substantially not contained.
  • substantially not contained in the present application means that it is not contained except for an unintentionally contained product.
  • the alkenyl group when the compound contained in the composition of the first embodiment of the present invention has an alkenyl group as a side chain, when the alkenyl group is bonded to cyclohexane, the alkenyl group has 2 to 5 carbon atoms.
  • the alkenyl group is bonded to benzene, the number of carbon atoms of the alkenyl group is preferably 4 to 5, and the unsaturated bond of the alkenyl group and benzene are directly bonded. Preferably not.
  • the liquid crystal layer and / or liquid crystal composition according to the present invention may contain a polymerizable monomer and / or a cured product of the polymerizable monomer (that is, a polymer derived from the polymerizable monomer). Preferably exhibits liquid crystallinity. That is, the liquid crystal layer according to the present invention is preferably a polymerized polymerizable monomer contained in the liquid crystal composition.
  • the specific content of the polymerizable monomer in the polymerizable monomer-containing liquid crystal composition according to the present invention is preferably 5% or less, more preferably 2% or less, still more preferably 1.5% or less, and further preferably 1% or less. Is particularly preferable, and 0.5% or less is most preferable.
  • the lower limit of the content of the polymerizable monomer in the liquid crystal composition is preferably 1000 ppm, more preferably 3000 ppm, and more preferably 5000 ppm.
  • the alignment regulation amount is improved by curing the polymerizable monomer. Moreover, since the polymer derived from the polymerizable monomer traps an ionic component in the liquid crystal composition, there is an effect that the voltage holding ratio does not decrease.
  • the polymerizable monomer according to the present invention includes the general formula (P-1) and the general formula (P-2):
  • R p11 , R p12 , R p21 and R p22 are each independently represented by the following formulas ( RI ) to (R-IX): ):
  • R 2 to R 6 are independently of each other a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the number of carbon atoms. 1 to 5 halogenated alkyl groups, W is a single bond, —O— or a methylene group, T is a single bond or —COO—, and p, t and q are each independently 0, Represents 1 or 2, A p11 , A p12 and A p22 are each independently 1,4-phenylene group, 1,4-cyclohexylene group, anthracene-2,6-diyl group, phenanthrene-2,7-diyl group, pyridine- 2,5-diyl group, pyrimidine-2,5-diyl group, naphthalene-2,6-diyl group, indan-2,5-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6
  • a p21 and A p23 each independently represent a divalent to tetravalent aromatic group or a divalent to tetravalent alicyclic group
  • Sp p11 , Sp p12 , Sp p21 and Sp p22 are each independently a single bond, an alkylene group having 1 to 8 carbon atoms, or —O—.
  • (CH 2 ) s — (wherein s represents an integer of 2 to 7 and the oxygen atom is bonded to the aromatic ring) is preferable.
  • a p11 , A p12 , and A p22 each independently represent 1,4-phenylene group, anthracene-2,6-diyl group, phenanthrene- More preferably, it represents a 2,7-diyl group or a naphthalene-2,6-diyl group, which is unsubstituted or an alkyl group having 1 to 5 carbon atoms, a halogen having 1 to 5 carbon atoms.
  • An alkyl group an alkoxy group having 1 to 5 carbon atoms, an alkyl ester group having 1 to 5 carbon atoms, a halogenated alkoxy group having 1 to 5 carbon atoms, fluorine, and a cyano group.
  • m p11 and m p12 each independently represent 0, 1 or 2. Further, m p11 + m p12 is more preferably 2 to 5, and m p11 + m p12 is further preferably 2 to 4.
  • the divalent to tetravalent aromatic group is a divalent to tetravalent organic group including an aromatic ring, and all of the 2 to 4 bonding sites are derived from the aromatic ring.
  • a phenyl skeleton, a tetrahydronaphthalene skeleton, a phenanthrene skeleton, an anthracene skeleton, a naphthalene skeleton, and the like can be given.
  • the divalent to tetravalent alicyclic group is a divalent to tetravalent organic group including an alicyclic structure, and all of the 2 to 4 bonding sites are from the ring.
  • a cyclohexylene skeleton, a cyclohexenylene skeleton, and the like can be given.
  • the divalent aromatic group includes 1,4-phenylene group, anthracene-2,6-diyl group, phenanthrene-2,7-diyl group, pyridine-2,5-diyl.
  • the divalent to tetravalent aromatic group is any of the following formulas (bi) to (b-ix), and the aromatic group is unsubstituted or substituted with carbon.
  • the specific content of the polymerizable monomer represented by the general formula (P-1) or (P-2) in the entire liquid crystal composition is preferably 5% or less, more preferably 3% or less, It is more preferably 2% or less, particularly preferably 1% or less, and most preferably 0.8% or less.
  • the lower limit of the content of the polymerizable monomer in the liquid crystal composition is preferably 1000 ppm, more preferably 3000 ppm, and even more preferably 5000 ppm.
  • L p11 or L p12 is —COO—, —OCO—, —COOC 2 H 4 —, —OCOC Selected from the group consisting of 2 H 4 —, —C 2 H 4 OCO—, —C 2 H 4 COO—, —CH ⁇ CHCOO—, —CH ⁇ CHOCO—, —COOCH ⁇ CH— and —OCOCH ⁇ CH—.
  • a polymerizable monomer representing one of them is preferred.
  • the polymerizable monomer having such a structure has the same linearity as that of the liquid crystal molecules and has a certain degree of freedom, and therefore has excellent compatibility with the liquid crystal compound.
  • Preferred examples of the compound represented by the general formula (P-1) according to the present invention include polymerizable compounds represented by the following formulas (Pa-1) to (Pa-33).
  • m p11 + m p12 2; A p11 and A p12 are 1,4-phenylene groups; and L p11 and L p12 are single bonds Is preferred.
  • a polymerizable monomer having such a structure has a biphenyl structure, and a polymerizable compound containing these skeletons is optimal in alignment regulation after polymerization for a PSA type liquid crystal display element, and a good alignment state can be obtained. , Display unevenness is suppressed or does not occur at all.
  • Preferred examples of the compound represented by the general formula (P-1) according to the present invention include polymerizable compounds represented by the following formulas (Pb-1) to (Pb-34).
  • the polymerizable monomer having such a structure is considered to have a large photosensitive effect on the entire composition.
  • Preferable examples of the compound represented by the general formula (P-1) according to the present invention include polymerizable compounds represented by the following formulas (Pc-1) to (Pc-52).
  • mp22 represents an integer of 1 to 3
  • at least one of L p21 and L p22 is a single bond
  • a p21 and A p23 are each independently an unsubstituted or carbon
  • An alkyl group having 1 to 5 atoms one or two or more non-adjacent —CH 2 — in the alkyl group each independently represents —C ⁇ C—, —O—, —CO—, —COO; -Or -OCO-, and one or two or more non-adjacent hydrogen atoms in the alkyl group may be each independently substituted with a fluorine atom), a fluorine atom, It is preferable to represent the following formulas (bi) to (b-ix) substituted with a cyano group or a nitro group.
  • Preferable examples of the compound represented by the general formula (P-2) according to the present invention include polymerizable compounds represented by the following formulas (Pd-1) to (Pd-57).
  • the liquid crystal layer and / or liquid crystal composition in the liquid crystal display device according to the present invention preferably contains a polymerizable monomer in the liquid crystal layer and / or liquid crystal composition, and the polymerizable monomer is polymerized. Thereby, the alignment control force of the liquid crystal molecules of the photo-alignment film is improved.
  • FIG. 6A is a plan view of an IPS mode liquid crystal display element, in which the pixel electrode and the common electrode are formed in a comb shape, and they are separated from each other by a certain distance so as to be loosely fitted to each other on the same substrate. Is formed.
  • FIG. 7 are enlarged views of the region of VII in the broken line portion.
  • 7B and 7C and FIG. 8 are plan views in which the pixel electrode is on the upper side and the common electrode is on the lower side for the sake of convenience, the present invention is not limited to this.
  • FIG. 7B shows that the liquid crystal composition of the present invention containing the liquid crystal compound 1a and the polymerizable monomer 1b is in a specific direction (along the alignment direction of the photo-alignment film) on the photo-alignment film. The arrangement is shown.
  • FIG. 7B shows that the liquid crystal composition of the present invention containing the liquid crystal compound 1a and the polymerizable monomer 1b is in a specific direction (along the alignment direction of the photo-alignment film) on the photo-alignment film. The arrangement is shown.
  • FIG. 1B shows that the liquid crystal composition of the present invention containing the liquid crystal compound 1a and the polymerizable monomer 1b is in a specific direction (along the alignment direction of the photo
  • FIG. 7C shows a state in which the liquid crystal compound 1a and the polymerizable monomer 1b are arranged in a specific direction (along the alignment direction of the photo-alignment film) on the photo-alignment film (that is, (B) In a state where a polymerizable monomer is polymerized. Due to the presence of the polymerized polymer 1c, an alignment regulating force in a specific direction is generated for the liquid crystal molecules. That is, when the polymerizable monomer is polymerized in the (B) state (no voltage applied), the polymerizable monomers are connected in a state of being oriented in the specific orientation direction ((C) state).
  • FIG. 8 schematically shows the state of alignment of liquid crystal molecules when the voltage is turned on or off with respect to the state of FIG. 7C.
  • the liquid crystal molecules 1a are aligned along the direction of the electric field, and when the voltage is turned off, the liquid crystal molecules 1a have a polymer 1c in which polymerizable monomers are connected to each other in the liquid crystal layer, so that the initial alignment direction is maintained. It becomes easy to return to a specific orientation direction.
  • the liquid crystal display element when the liquid crystal composition includes a polymerizable monomer and a liquid crystal compound and is provided with a liquid crystal layer obtained by polymerizing the polymerizable monomer, the polymerizable monomer can be used even when the voltage ON-OFF state is repeated.
  • the interaction between the polymer 1c and the liquid crystal molecules 1b linked to each other is considered to improve the alignment regulating force on the liquid crystal molecules, which has been a problem in the past, and which decreases with time.
  • a liquid crystal molecule can maintain the specific alignment direction given to the photo-alignment film, it is considered that the substantial alignment regulating force is improved.
  • alignment regulating force with respect to the alignment direction in each alignment divided region can be improved.
  • the polymerization proceeds even in the absence of a polymerization initiator, but may contain a polymerization initiator in order to accelerate the polymerization.
  • the polymerization initiator include benzoin ethers, benzophenones, acetophenones, benzyl ketals, acylphosphine oxides, and the like.
  • the liquid crystal composition according to the present invention can further contain a compound represented by the general formula (Q) as an antioxidant.
  • RQ is preferably an alkyl group having 1 to 22 carbon atoms or an alkoxy group, and the alkyl group (including the alkyl group in the alkoxy group) is linear or branched It may be a chain.
  • the RQ represents a linear or branched alkyl group having 1 to 22 carbon atoms or a linear or branched alkoxy group, and one or more of the alkyl groups (including the alkyl group in the alkoxy group).
  • the CH 2 group is —O—, —CH ⁇ CH—, —CO—, —OCO—, —COO—, —C ⁇ C—, —CF 2 O—, —OCF so that the oxygen atom is not directly adjacent.
  • R Q in the general formula (Q) is a number of 1 to 20 carbon atoms, a straight-chain alkyl groups, linear alkoxy groups, one CH 2 group has been replaced -OCO- or -COO- in
  • the alkyl group is at least one selected from the group consisting of a linear alkyl group, a branched alkyl group, a branched alkoxy group and a branched alkyl group in which one CH 2 group is substituted with —OCO— or —COO—.
  • a linear alkyl group having 1 to 10 carbon atoms a linear alkyl group in which one CH 2 group is substituted by —OCO— or —COO—, a branched alkyl group, a branched alkoxy group, and one CH 2 group More preferred is at least one selected from the group consisting of a branched alkyl group substituted with —OCO— or —COO—.
  • MQ represents a trans-1,4-cyclohexylene group, a 1,4-phenylene group or a single bond, and a trans-1,4-cyclohexylene group or a 1,4-phenylene group is preferred.
  • the compound represented by the general formula (Q) is preferably at least one compound selected from the group of compounds represented by the following general formulas (Qa) to (Qd):
  • the compound represented by the general formula (Qa) and / or (Qc) is more preferable.
  • R Q1 is preferably a linear alkyl group having 1 to 10 carbon atoms or a branched alkyl group
  • R Q2 is a straight chain having 1 to 20 carbon atoms.
  • a chain alkyl group or a branched chain alkyl group is preferable
  • R Q3 is preferably a linear alkyl group having 1 to 8 carbon atoms, a branched chain alkyl group, a linear alkoxy group or a branched chain alkoxy group, and L Q is 1 carbon atom.
  • a linear alkylene group or a branched alkylene group of 8 to 8 is preferred.
  • the compound represented by the general formula (Q) is more preferably a compound represented by the following formula (Qa-1) and / or (Qc-1).
  • the compound represented by the general formula (Q) preferably contains one or two compounds, more preferably contains one to five compounds, and the content is It is preferably 0.001 to 1% by mass, preferably 0.001 to 0.1% by mass, and 0.001 to 0.05% by mass with respect to the total mass of the liquid crystal composition of the present invention. It is preferable that
  • the photo-alignment layer according to the present invention is provided on at least one of the first substrate and the second substrate, and is preferably provided on both sides of the first substrate and the second substrate.
  • the alignment layer according to the present invention is preferably a photo-alignment film containing a photoresponsive polymer whose chemical structure changes in response to light.
  • the high-contrast advantage of the photo-alignment film is exhibited by using a liquid crystal composition containing a polymerizable monomer.
  • the orientation regulating force can be improved.
  • photo-alignment films for example, photoisomerization by light irradiation of an azo group (for example, azobenzene compound), a Schiff base, and a compound having an unsaturated bond site such as a carbon-carbon double bond.
  • an azo group for example, azobenzene compound
  • a Schiff base for example, a compound having an unsaturated bond site
  • Those utilizing photodimerization such as cinnamic acid derivatives, those utilizing photo-cleavage (photolysis) of ⁇ bond of coumarin, chalcone, or the polymer itself (for example, photodegradable polyimide) It is done.
  • the photoresponsive polymer is at least one selected from the group consisting of a photoresponsive decomposition polymer, a photoresponsive dimerization polymer, and a photoresponsive isomerization polymer.
  • the photoresponsive decomposition polymer is particularly preferable.
  • photoresponsive decomposable polymer those utilizing photocleavage (photolysis) of ⁇ bond of the polymer itself are preferable. More specifically, in any case, those having polysiloxane, polyimide, and polyamic acid derivative structures as the main chain are preferred, and polyimide and polyamic acid derivative structures are more preferred.
  • the polyamic acid derivative is preferably an alkyl ester having 1 to 5 carbon atoms or an alkyl ammonium salt having 1 to 18 carbon atoms.
  • the photoresponsive decomposition type polymer according to the present invention contains at least one polymer selected from the group consisting of polyamic acid and polyimide obtained by reacting tetracarboxylic dianhydride with a diamine compound. Is preferred.
  • Examples of the tetracarboxylic dianhydride used as a raw material for polyimide and polyamic acid derivatives include the following.
  • Z 1 , Z 2 , Z 3 , and Z 4 are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a chlorine atom, a fluorine atom, —NR 2 , —SR, —OH.
  • T represents a single bond, —CH 2 —, —O—, —S—, —C (CH 3 ) 2 —, —C (CF 3 ) 2 —, —CO—, —SO—).
  • formula (TCA-1), formula (TCA-2), formula (TCA-3), formula (TCA-4), formula (TCA-5), formula (TCA-8) and Formula (TCA-10) is preferred, and formula (TCA-1) and formula (TCA-8) are particularly preferred.
  • diamine compound used as a raw material for polyimide and polyamic acid derivatives include the following.
  • the formula (DA-1), the formula (DA-25), the formula (DA-31), the formula (DA-32), and the formula (DA-49) are preferable, and the formula (DA-1) Formula (DA-25) and Formula (DA-49) are particularly preferable.
  • At least one of a tetracarboxylic acid anhydride or a diamine compound includes the following formula (TCA-38) and formula (DA-50): It preferably contains at least one selected from the group consisting of formula (DA-56).
  • the diamine compounds may be represented by the following formulas (DA-50) to (DA-56):
  • the photo-alignment film according to the present invention when a type utilizing photodimerization is adopted, at least one of hydrogen atoms in the diamine compound represented by the formulas (DA-1) to (DA-49) is used. It preferably has the following formula (V), and more preferably contains at least one selected from the group consisting of formula (DA-50) to formula (DA-53).
  • broken lines represent bonds to the atoms to which the hydrogen atoms of (DA-1) to (DA-49) were bonded, and G 1 , G 2 , G 3 , G 4 , and G 5 are independent of each other.
  • a single bond, an alkylene group having 2 to 12 carbon atoms are —O—, —CO—, —COO—, —OCO— , —NR—, —NRCO—, —CONR—, —NRCOO—, —OCONR—, —NRCONR—, —CH ⁇ CH—, —CC—, —OCOO——, where R is a hydrogen atom.
  • n 5 , n 6 , n 7 , n 8 each represents 0 or 1
  • E 1 , E 2 , E 3 , E 4 , E 5 are each independently trans-1,4-cyclohexylene, trans-1 , 4-dioxane-2,5-diyl, 1,4-naphthylene, 2,6-naphthylene, pyridine-2,5-diyl group, pyrimidine-2,5-diyl group, 2,5-thiophenylene group, 2 , 5-furanylene group or 1,4-phenylene group, which are unsubstituted or one or more hydrogen atoms may be substituted by fluorine atom, chlorine atom, methyl group or methoxy group
  • Z is A hydrogen atom, a fluorine atom, an alkyl group having 1 to 12 carbon atoms (one —CH 2 — group or two or more non-adjacent —CH 2 — groups are —O
  • diamine compound examples include, for example, the following formulas (DA-57) to (DA-60).
  • tetracarboxylic acid anhydride is represented by the formula (TCA-1), formula (TCA-2), formula (TCA- 3), formula (TCA-4), formula (TCA-5), formula (TCA-33) (in the formula (TCA-33), T is particularly preferably —CO—) and TCA-34 (formula ( In TCA-34), T is preferably —CO—, and is more preferably formula (TCA-1), formula (TCA-2), formula (TCA-3), formula (TCA-4) and formula (TCA- 5) is particularly preferred.
  • the diamine compound is represented by the formula (DA-1), the formula (DA-25), the formula (DA-49) from the viewpoint that a good liquid crystal orientation can be expressed. Is particularly preferred.
  • tetracarboxylic anhydrides and diamine compounds listed above can be used singly or in combination of two or more depending on the required properties.
  • the mixing ratio of the above-mentioned tetracarboxylic dianhydride and the above-mentioned diamine compound is as follows.
  • the proportion of the anhydride acid anhydride group is preferably 0.2 to 2 equivalents, more preferably 0.3 to 1.2 equivalents.
  • the polyamic acid synthesis reaction by the condensation of the tetracarboxylic acid anhydride and the diamine compound is performed in an organic solvent.
  • the reaction temperature is preferably ⁇ 20 ° C. to 150 ° C., more preferably 0 to 100 ° C.
  • the reaction time is preferably 0.1 to 24 hours, more preferably 0.5 to 12 hours.
  • organic solvent examples include alcohols, ketones, esters, ethers, aprotic polar solvents, phenols and derivatives thereof, halogenated hydrocarbon solvents, hydrocarbon solvents, and the like.
  • the alcohol for example, methyl alcohol, ethyl alcohol, isopropyl alcohol, cyclohexanol, ethylene glycol, propylene glycol, 1,4-butanediol, triethylene glycol, ethylene glycol monomethyl ether and the like are preferable.
  • ketone examples include acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone.
  • ester examples include ethyl lactate, butyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl methoxypropionate, ethyl ethoxypropionate, diethyl oxalate, and diethyl malonate.
  • ether examples include diethyl ether, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol-n-propyl ether, ethylene glycol-i-propyl ether, ethylene glycol-n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol ethyl ether acetate.
  • aprotic polar solvent examples include, for example, N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide, dimethyl sulfoxide, ⁇ -butyrolactone, tetramethylurea and hexamethylphosphoryl Amides and the like are preferred.
  • phenol and derivatives thereof for example, m-cresol, xylenol, halogenated phenol and the like are preferable.
  • halogenated hydrocarbon solvent examples include dichloromethane, 1,2-dichloroethane, 1,4-dichlorobutane, trichloroethane, chlorobenzene, o-dichlorobenzene, and the like.
  • hydrocarbon solvent examples include hexane, heptane, octane, benzene, toluene, xylene, isoamyl propionate, isoamyl isobutyrate, and diisopentyl ether.
  • the total amount of tetracarboxylic dianhydride and diamine compound with respect to the organic solvent is preferably 0.1 to 50% by weight based on the total amount of the reaction solution.
  • reaction solution containing a polyamic acid is obtained.
  • the obtained reaction solution may be used for the preparation of the alignment film as it is, or may be used for the preparation of the alignment film after isolating the polyamic acid contained in the reaction solution. May be used for the preparation of the alignment film.
  • the reaction solution may be subjected to a dehydration ring closure reaction as it is, and the polyamic acid contained in the reaction solution is isolated and then subjected to dehydration ring closure. It may be subjected to a reaction, or may be subjected to a dehydration ring closure reaction after purifying the isolated polyamic acid. Isolation and purification of the polyamic acid can be performed according to known methods.
  • a method of imidizing the polyamic acid obtained by the above reaction to obtain a polyimide it can be obtained by dehydrating and ring-closing the polyamic acid to imidize. Specifically, it is carried out by a method of heating a polyamic acid or a method of dissolving a polyamic acid in an organic solvent, adding a dehydrating agent and a dehydrating ring-closing catalyst to the solution, and heating as necessary.
  • Examples of the organic solvent used in the dehydration ring closure reaction include the organic solvents exemplified as those used for the synthesis of polyamic acid, and are omitted here.
  • the polyimide as the alignment film according to the present invention may be a completely imidized product obtained by dehydrating and cyclizing all of the amic acid structure of the precursor polyamic acid, and only a part of the amic acid structure may be dehydrated. It may be a partially imidized product that is ring-closed and has an amic acid structure and an imide ring structure.
  • the imidation ratio of the polyimide according to the present invention is preferably 30% or more, more preferably 40 to 99%, and still more preferably 45 to 98%.
  • the said imidation rate represents the ratio which the number of the imide ring structure accounts with respect to the sum total of the number of the amic acid structures of polyimide, and the number of imide ring structures in percentage.
  • a part of the imide ring may be an isoimide ring.
  • the method for measuring the imidization ratio of polyimide is determined by determining a proton derived from a structure that does not change before and after imidation as a reference proton, and the peak integrated value of this proton is around 9.5 to 10.0 ppm. It is calculated using the proton peak integrated value derived from the NH group of the amic acid that appears.
  • the temperature when polyamic acid is thermally imidized in a solution is preferably 100 ° C. to 400 ° C., more preferably 120 ° C. to 250 ° C.
  • a method is preferably performed while removing water generated by the imidization reaction from the system.
  • a basic catalyst and an acid anhydride are added to the polyamic acid solution obtained above, preferably ⁇ 20 to 250 ° C., more preferably 0 to It is obtained by stirring at 180 ° C.
  • the amount of the basic catalyst is 0.5 to 30 mol times, preferably 2 to 20 mol times of the amic acid group
  • the amount of the acid anhydride is 1 to 50 mol times of the amic acid group, preferably Is 3 to 30 mole times.
  • Examples of the basic catalyst include pyridine, collidine, lutidine, triethylamine, trimethylamine, tributylamine, and trioctylamine.
  • Examples of the acid anhydride include acetic anhydride, trimellitic anhydride, pyromellitic anhydride, and the like.
  • the imidation rate by catalytic imidation can be controlled by adjusting the amount of catalyst, reaction temperature, and reaction time.
  • the reaction solution when recovering the produced polyamic acid or polyimide from the reaction solution of polyamic acid or polyimide, the reaction solution may be poured into a poor solvent and precipitated.
  • the poor solvent used for precipitation include methanol, acetone, hexane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, and water.
  • the polymer precipitated in a poor solvent and collected by filtration can be dried by normal temperature or reduced pressure at room temperature or by heating.
  • the solution preferably has a solution viscosity of 10 to 800 mPa ⁇ s, and preferably has a solution viscosity of 15 to 500 mPa ⁇ s. More preferably.
  • the solution viscosity (mPa ⁇ s) of these polymers is 10% by weight of a polymer solution prepared using a good solvent for the polymer (eg, ⁇ -butyrolactone, N-methyl-2-pyrrolidone, etc.). Is a value measured at 25 ° C. using an E-type viscometer.
  • Sp is a single bond, — (CH 2 ) u — (wherein u represents 1 to 20), —OCH 2 —, —CH 2 O—, —COO— , —OCO—, —CH ⁇ CH—, —CF ⁇ CF—, —CF 2 O—, —OCF 2 —, —CF 2 CF 2 —, and —C ⁇ C—.
  • At least one of the non-adjacent CH 2 groups independently represents —O—, —CO—, —CO—O—, —O—CO—, — Si (CH 3 ) 2 —O—Si (CH 3 ) 2 —, —NR—, —NR—CO—, —CO—NR—, —NR—CO—O—, —O—CO—NR—, — NR—CO—NR—, —CH ⁇ CH—, —C ⁇ C— or —O—CO—O— (wherein R represents hydrogen or an alkyl group having 1 to 5 carbon atoms).
  • a 1 and A 2 are each independently (A) trans-1,4-cyclohexylene group (in this group, one methylene group or two or more methylene groups not adjacent to each other are replaced by —O—, —NH— or —S—) May be) (B) a 1,4-phenylene group (one or more of —CH ⁇ present in this group may be replaced by —N ⁇ ), and (c) a 1,4-cyclohexenylene group 2,5-thiophenylene group, 2,5-furylene group, 1,4-bicyclo (2.2.2) octylene group, naphthalene-1,4-diyl group, naphthalene-2,6-diyl group, deca Represents a group selected from the group consisting of a hydronaphthalene-2,6-diyl group and a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, the group (a), group (b
  • R a is independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a phenyl group, a halogen atom.
  • any hydrogen atom in each structure may be substituted by a fluorine atom, a chlorine atom, a methyl group, a phenyl group, a methoxy group,
  • the broken line represents a bond to Sp
  • R 1 is a tetravalent ring structure
  • R 2 is a trivalent organic group
  • R 3 is a hydrogen atom
  • a hydroxyl group Represents an alkyl group having 1 to 15 carbon atoms and an alkoxy group having 1 to 15 carbon atoms.
  • y and w represent the molar fraction of the copolymer, 0 ⁇ y ⁇ 1 and 0 ⁇ w ⁇ 1, n represents 4 to 100,000, and the monomer units of M b and M d are each independently One type or two or more types of different units may be used. ) It is preferable that it is a photoresponsive dimerization type
  • a photoresponsive dimerization polymer in which Z 2 is a single bond is preferable.
  • M 1 and M 2 are each independently of each other acrylate, methacrylate, 2-chloroacrylate, 2-phenyl acrylate, acrylamide, methacryl which may be N-substituted with a lower alkyl group.
  • M 3 is acrylate, methacrylate, 2-chloroacrylate, 2-phenylacrylate, acrylamide, methacrylamide, 2-chloroacrylamide, 2-phenylacrylamide, vinyl ether, vinyl ester, acrylic which may be N-substituted with lower alkyl.
  • C- n 1 , n 2 and n 3 are mole fractions of comonomer where 0 ⁇ n 1 ⁇ 1, 0 ⁇ n 2 ⁇ 1 and 0 ⁇ n 3 ⁇ 0.5) It is preferable that it is a photoresponsive dimerization type
  • the liquid crystal display element of the present invention is preferably produced, for example, by the following steps (1) to (3).
  • the photo-alignment film precursor solution according to the present invention it is preferable to form a coating film on the substrate by applying the photo-alignment film precursor solution according to the present invention on the substrate and then heating the coated surface ( Step (1)). More specifically, for example, the photo-alignment film precursor of the present invention is formed on the conductive film forming surface of the substrate provided with the transparent conductive film patterned in a comb-teeth shape and on one surface of the counter substrate provided with no conductive film. Each of the body solutions is applied, and each coated surface is heated to form a coating film.
  • the photo-alignment film precursor solution according to the present invention is preferably a solution containing the above-described photo-responsive decomposition type polymer.
  • the photoresponsive decomposition type polymer includes at least one polymer selected from the group consisting of polyamic acid and polyimide obtained by reacting tetracarboxylic dianhydride and a diamine compound, and the organic solvent. It is preferable to contain.
  • the photo-alignment film precursor solution of the present invention is preferably applied by an offset printing method, a spin coating method, a roll coater method, or an inkjet printing method.
  • the substrate for example, a glass such as float glass or soda glass; a transparent substrate made of a plastic such as polyethylene terephthalate, polybutylene terephthalate, polyethersulfone, polycarbonate, or poly (alicyclic olefin) can be used.
  • a NESA film made of tin oxide (SnO 2 ), an ITO film made of indium oxide-tin oxide (In 2 O 3 —SnO 2 ), or the like is used. Also good.
  • a method of forming a pattern by photo-etching after forming a transparent conductive film without a pattern, or a mask having a desired pattern when forming a transparent conductive film is used. It can be employed in methods.
  • the substrate surface is a known method such as a functional silane compound or a functional titanium compound. The surface treatment may be performed in advance.
  • pre-baking may be performed as necessary.
  • the pre-baking temperature is preferably 30 to 200 ° C.
  • the prebake time is preferably 0.25 to 10 minutes.
  • the firing temperature at this time is preferably 80 to 300 ° C.
  • the firing time is preferably 5 to 200 minutes.
  • the film thickness thus formed is preferably 0.001 to 1 ⁇ m.
  • the film contained in the photo-alignment film precursor solution of the present invention is a polyamic acid or an imidized polymer having an imide ring structure and an amic acid structure
  • the film is further heated after the coating is formed. It is good also as a more imidized coating film by making a dehydration ring-closing reaction proceed.
  • step (2) it is preferable to irradiate a coating film containing polyamic acid or polyimide formed on the substrate (step (2)). Moreover, you may perform the said process (2) after the below-mentioned process (3).
  • the light applied to the coating film ultraviolet rays or visible rays containing light having a wavelength of 150 to 800 nm can be used, and ultraviolet rays containing light having a wavelength of 300 to 400 nm are preferable.
  • a light source for the irradiation light a low-pressure mercury lamp, a high-pressure mercury lamp, a deuterium lamp, a metal halide lamp, an argon resonance lamp, a xenon lamp, an excimer laser, or the like can be used.
  • the ultraviolet rays in the preferable wavelength region can be obtained by means of using a light source in combination with, for example, a filter or a diffraction grating.
  • the amount of light irradiation is preferably 1,000 J / m 2 or more and 100,000 J / m 2 or less.
  • a pair of substrates on which a photo-alignment film or a coating film is formed face each other with a gap (cell gap) therebetween, and the liquid crystal composition according to the present invention is placed in the gap. It is preferable to fill (step (3)).
  • the method may further include a step (4) of polymerizing the polymerizable monomer by a predetermined method without applying a voltage after filling the liquid crystal composition.
  • a method for filling the liquid crystal composition (1) vacuum injection method (for a pair of substrates on which a photo-alignment film or a coating film is formed, a gap is formed so that the alignment directions of the two substrates are orthogonal to each other. (Cell gap) are placed facing each other, the periphery of the two substrates are bonded together using a sealant, liquid crystal is injected and filled into the cell gap defined by the substrate surface and the sealant, and the injection hole is sealed. And a method of forming a liquid crystal cell by stopping) or (2) ODF method.
  • the method of introducing the liquid crystal composition by the vacuum injection method although no drop mark is generated, there is a problem in manufacturing time, cost, etc. as the substrate size increases. However, in this invention, it can be used conveniently by the display element manufactured using the ODF method from the combination of a photo-alignment film and a liquid-crystal composition.
  • an electrode layer 3 such as a TFT (a surface covered with a photo-alignment film) is formed on the surface of the same substrate (for example, the first substrate in FIGS. 3 and 5). Therefore, there are many irregularities on the surface, and it is easy to promote the generation of dripping marks, but this problem is thought to be mitigated by the combination of the photo-alignment film and the liquid crystal composition. It is done.
  • the liquid crystal composition containing the polymerizable monomer according to the present invention is provided with liquid crystal alignment ability by polymerization of the polymerizable monomer contained therein by irradiation with ultraviolet rays, and light utilizing the birefringence of the liquid crystal composition.
  • the liquid crystal display element is preferably used for controlling the amount of transmitted light.
  • a liquid crystal display element it is useful for VA-IPS-LCD, FFS-LCD, AM-LCD (active matrix liquid crystal display element) and IPS-LCD (in-plane switching liquid crystal display element), but particularly useful for AM-LCD. Yes, it can be used for a transmissive or reflective liquid crystal display element.
  • the two substrates of the liquid crystal cell used in the liquid crystal display element can be made of a transparent material having flexibility such as glass or plastic, and one of them can be an opaque material such as silicon.
  • a transparent substrate having a transparent electrode layer can be obtained, for example, by sputtering indium tin oxide (ITO) on a transparent substrate such as a glass plate.
  • the color filter can be produced by, for example, a pigment dispersion method, a printing method, an electrodeposition method, or a dyeing method.
  • a method for producing a color filter by a pigment dispersion method will be described as an example.
  • a curable coloring composition for a color filter is applied on the transparent substrate, subjected to patterning treatment, and cured by heating or light irradiation. By performing this process for each of the three colors red, green, and blue, a pixel portion for a color filter can be manufactured.
  • a pixel electrode provided with an active element such as a TFT or a thin film diode may be provided on the substrate.
  • the substrate is opposed so that the transparent electrode layer is on the inside.
  • the thickness of the light control layer (liquid crystal layer) to be obtained is 1 to 100 ⁇ m. More preferably, the thickness is 1.5 to 10 ⁇ m.
  • the polarizing plate it is preferable to adjust the product of the refractive index anisotropy ⁇ n of the liquid crystal and the cell thickness G so that the contrast is maximized.
  • the polarizing axis of each polarizing plate can be adjusted so that the viewing angle and contrast are good.
  • a retardation film for widening the viewing angle can also be used.
  • the spacer include columnar spacers made of glass particles, plastic particles, alumina particles, a photoresist material, and the like.
  • a sealant such as an epoxy thermosetting composition is screen-printed on the substrates with a liquid crystal inlet provided, the substrates are bonded together, and heated to thermally cure the sealant.
  • a normal vacuum injection method or an ODF method can be used as a method of sandwiching the liquid crystal composition (containing a polymerizable monomer as necessary) between the two substrates.
  • a vacuum injection method there is a problem that an injection mark remains instead of a drop mark.
  • it can use more suitably for the display element manufactured using ODF method.
  • a sealant such as epoxy photothermal curing is drawn on a backplane or frontplane substrate using a dispenser in a closed-loop bank shape, and then removed.
  • a liquid crystal display element can be manufactured by bonding a front plane and a back plane after dropping a predetermined amount of the liquid crystal composition in the air.
  • the liquid crystal composition of the present invention can be preferably used because the liquid crystal composition can be stably dropped in the ODF process.
  • an appropriate polymerization rate is desirable in order to obtain good alignment performance of the liquid crystal. Therefore, active energy rays such as ultraviolet rays or electron beams are irradiated singly or in combination or sequentially.
  • the method of polymerizing by is preferred.
  • ultraviolet rays When ultraviolet rays are used, a polarized light source or a non-polarized light source may be used.
  • the polymerization is performed in a state where the polymerizable monomer-containing liquid crystal composition is sandwiched between two substrates, at least the substrate on the irradiation surface side must be given appropriate transparency to the active energy rays. I must.
  • the orientation state of the unpolymerized part is changed by changing conditions such as an electric field, a magnetic field, or temperature, and further irradiation with active energy rays is performed. Then, it is possible to use a means for polymerization.
  • a means for polymerization In particular, when ultraviolet exposure is performed, it is preferable that the polymerizable monomer-containing liquid crystal composition is exposed to ultraviolet light without applying a voltage.
  • the pretilt angle angle formed between the major axis of the liquid crystal molecules and the substrate surface
  • the temperature during irradiation is preferably within a temperature range in which the liquid crystal state of the liquid crystal composition of the present invention is maintained. Polymerization is preferably performed at a temperature close to room temperature, that is, typically at a temperature of 15 to 35 ° C.
  • a lamp for generating ultraviolet rays a metal halide lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, or the like can be used.
  • a wavelength of the ultraviolet-rays to irradiate it is preferable to irradiate the ultraviolet-ray of the wavelength range which is not the absorption wavelength range of a liquid crystal composition, and it is preferable to cut and use an ultraviolet-ray as needed.
  • Intensity of ultraviolet irradiation is preferably from 0.1mW / cm 2 ⁇ 100W / cm 2, 2mW / cm 2 ⁇ 50W / cm 2 is more preferable.
  • the amount of energy of ultraviolet rays to be irradiated can be adjusted as appropriate, but is preferably 10 mJ / cm 2 to 500 J / cm 2, and more preferably 100 mJ / cm 2 to 200 J / cm 2 .
  • the time for irradiating with ultraviolet rays is appropriately selected depending on the intensity of the irradiating ultraviolet rays, but when using a metal halide lamp, high pressure mercury lamp or ultra high pressure mercury lamp, it is preferably 10 seconds to 3600 seconds, more preferably 10 seconds to 600 seconds, and fluorescence. In the case of using a lamp, 60 seconds to 18000 seconds are preferable, and 600 seconds to 10800 seconds are preferable.
  • the first substrate or the second substrate is not particularly limited as long as it is substantially transparent, and glass, ceramics, plastics, or the like can be used.
  • Plastic substrates include cellulose derivatives such as cellulose, triacetyl cellulose, diacetyl cellulose, polycycloolefin derivatives, polyesters such as polyethylene terephthalate and polyethylene naphthalate, polypropylene, polyethylene, etc.
  • Inorganic-organic composite materials such as glass fiber-acrylic resin can be used.
  • the function of the barrier film is to reduce the moisture permeability of the plastic substrate and to improve the reliability of the electrical characteristics of the liquid crystal display element.
  • the barrier film is not particularly limited as long as it has high transparency and low water vapor permeability. Generally, vapor deposition, sputtering, chemical vapor deposition method (CVD method) using an inorganic material such as silicon oxide is used. ) Is used.
  • the same material or different materials may be used as the first substrate or the second substrate, and there is no particular limitation.
  • Use of a glass substrate is preferable because a liquid crystal display element having excellent heat resistance and dimensional stability can be manufactured.
  • a plastic substrate is preferable because it is suitable for a manufacturing method using a roll-to-roll method and is suitable for weight reduction or flexibility. For the purpose of imparting flatness and heat resistance, good results can be obtained by combining a plastic substrate and a glass substrate.
  • the measured characteristics are as follows.
  • Tni Nematic phase-isotropic liquid phase transition temperature (° C) ⁇ n: Refractive index anisotropy at 295K (also known as birefringence) ⁇ : Dielectric anisotropy at 295K ⁇ : Viscosity at 295K (mPa ⁇ s) ⁇ 1: rotational viscosity at 295 K (mPa ⁇ s) VHR: Voltage holding ratio (%) at 313K under conditions of frequency 60Hz and applied voltage 5V Burn-in: The burn-in evaluation of the liquid crystal display element is based on the following four-step evaluation of the afterimage level of the fixed pattern when the predetermined fixed pattern is displayed in the display area for 1440 hours and then the entire screen is displayed uniformly. went.
  • the process suitability is that the liquid crystal is dropped 40 pL at a time by using a constant volume metering pump 100000 times in the ODF process, and the following “0 to 200 times, 201 to 400 times, 401 to 600 times, ..., 99801 to 100,000 times ”, the change in the amount of liquid crystal dropped 200 times was evaluated in the following four stages.
  • Liquid crystal compositions 1 to 16 Liquid crystal compositions having the following compositions were prepared, and their physical properties were measured. The results are shown in Tables 1 and 2 below.
  • the polymerizable monomer-containing liquid crystal composition 1, the polymerizable monomer-containing liquid crystal composition 2, the polymerizable monomer-containing liquid crystal composition 6, and the polymerizable property Monomer-containing liquid crystal composition 13 was prepared.
  • a polymerizable monomer-containing liquid crystal composition 9, a polymerizable monomer-containing liquid crystal composition 12, and a polymerizable monomer-containing liquid crystal composition 16 were prepared by adding 0.3% of each of the polymerizable monomers represented by formula (1) and uniformly dissolving them. .
  • the physical properties of the polymerizable monomer-containing liquid crystal compositions 9, 12, and 16 were almost the same as those of the respective nematic liquid crystal compositions shown in Preparation Examples 9, 12, and 16.
  • an FFS mode / IPS mode liquid crystal display element having a cell thickness of 3.0 ⁇ m, which is commonly used for TV was prepared. It produced by the method like this.
  • Photo-alignment film 1 After dissolving 1.0 mol% of p-phenylenediamine in N-methyl-2-pyrrolidone, 1 mol% of cyclobutanetetracarboxylic dianhydride was added thereto and reacted at 20 ° C. for 12 hours to obtain standard polystyrene. A polyamic acid varnish having a converted weight average molecular weight of about 100,000 and a weight average molecular weight / number average molecular weight (Mv / Mn) of about 1.6 was obtained.
  • the first thin film laminate and the second thin film laminate It was printed on and heated at 210 ° C. for 30 minutes to form a photolytic insulating film (polyimide film).
  • the photodecomposition type polyimide film was subjected to an alignment treatment for irradiating light (ultraviolet rays) from a polarized UV lamp having a bright line in a wavelength range of 240 nm to 400 nm, for example.
  • This alignment treatment is performed, for example, by irradiating ultraviolet light from a high-pressure mercury lamp with linear irradiation with a polarization ratio of about 20: 1 using a pile polarizer laminated with a quartz substrate and with an irradiation energy of about 4 J / cm 2. It was.
  • Photo-alignment film 2 Synthesis of polyamic acid A
  • 4′-diaminodiphenyl ether 1.0 mol%, dissolved in N-methyl-2-pyrrolidone, 1 mol% of cyclobutanetetracarboxylic dianhydride was added thereto and reacted at 20 ° C. for 12 hours.
  • the polyamic acid A solution and the polyamic acid B solution are mixed so that the mass ratio of the solid content is 1: 1, and further diluted with a mixed solvent having a mass ratio of N-methyl-2-pyrrolidone and 2-butoxyethanol of 1: 1. As a result, a polyamic acid solution was obtained.
  • Photo-alignment film 3 (Preparation of solution for photo-alignment film) 32.40 g of N-methyl-2-pyrrolidone was added to 3.24 g of 1,4-phenylenediamine, and dissolved by stirring while feeding nitrogen. While stirring this diamine solution, 7.81 g of cyclobutanetetracarboxylic dianhydride was added, and 78.03 g of N-methyl-2-pyrrolidone was added, and the mixture was allowed to react by stirring at 30 ° C. for 18 hours in a nitrogen atmosphere. It was.
  • Orientation treatment A 256 nm ultraviolet ray is extracted from the high-pressure mercury lamp using a bandpass filter, and is converted into linearly polarized light having an extinction ratio of about 100: 1 using a wire grid polarizer, and 1.0 J / cm 2 is applied to the photodecomposable resin film. Photo-alignment treatment was performed by irradiation with irradiation energy. Thereafter, in order to remove the impurities generated by decomposition, after baking at 230 ° C. for 30 minutes, the polyimide film was washed with pure water and dried to obtain a glass substrate on which a photolytic alignment film was formed.
  • Photo-alignment film 4" Synthesis of polymer (PA-1)
  • PA-1-1-1 monomer synthesized via an intermediate of compounds 1 to 6
  • THF tetrahydrofuran
  • AIBN azobisisobutyronitrile
  • the obtained polymer (PA-1) had a weight average molecular weight (Mw) of 383,000 and a molecular weight distribution (Mw / Mn) of 2.75.
  • the molecular weight of the polymer was adjusted by adjusting the heating and reflux time in the nitrogen atmosphere and measuring the weight average molecular weight (Mw).
  • Mw and Mn were measured by GPC (gel permeation chromatography) under the following measurement conditions.
  • Tosoh GPC equipment HLC-8220GPC is used as the measuring device, TSKgel ⁇ ⁇ GMHXL ⁇ 2, TSKgel G2000XL ⁇ 1 and TSKgel G1000XL ⁇ 1 in series for the analytical column, and differential refractive index for the detector.
  • polystyrene standard sample STANDARDARSM-105 molecular weight range 1,300 to 3,800,000 manufactured by Showa Denko was used.
  • the obtained polymer was dissolved in THF so as to have a concentration of 1 ⁇ g / mL, and the mobile phase was measured with THF, the liquid feed rate was 1 mL / min, the column temperature was 40 ° C., and the sample injection amount was 300 ⁇ L.
  • the glass transition temperature was measured with a differential scanning calorimeter (DSC).
  • DSC differential scanning calorimeter
  • a DSC apparatus DSC6220 manufactured by Seiko Instruments Inc. was used as a measuring apparatus.
  • a polymer sample of about 4 mg was sealed in an aluminum pan and heated from ⁇ 20 ° C. to 180 ° C. at a rate of 10 ° C./min, a baseline shift accompanying a glass transition was observed.
  • the transition start point was read from the intersection of the tangent lines, and used as the glass transition temperature (Tg).
  • composition for photo-alignment film (1) 2 parts of the compound represented by the formula (a) were dissolved in 98 parts of N-methyl-2-pyrrolidone (NMP) (solution A).
  • NMP N-methyl-2-pyrrolidone
  • ⁇ Rubbing type alignment film> (Rubbing type alignment film) (Formation of rubbing type polyimide liquid crystal alignment film) (Preparation of alignment film solution) 59.72 g of N-methyl-2-pyrrolidone was added to 5.98 g of 4,4′-diaminodiphenylamine, and dissolved by stirring while feeding nitrogen. While stirring this diamine solution, 6.54 g of pyromellitic dianhydride was added, and 65.30 g of N-methyl-2-pyrrolidone was further added, and the mixture was stirred and reacted at 30 ° C. for 18 hours in a nitrogen atmosphere. Further, 71.06 g of a mixed solvent having a mass ratio of N-methyl-2-pyrrolidone and 2-butoxyethanol of 1: 1 was added at room temperature, and the mixture was diluted and stirred to obtain a polyamic acid solution.
  • a mixed solvent having a mass ratio of N-methyl-2-pyrrolidone and 2-butoxyethanol of 1: 1
  • An alignment treatment was performed by rotating a roller wrapped with a buff cloth in a direction opposite to the substrate transport direction and rubbing the surface of the alignment film formed on the substrate in one direction.
  • the number of rotations of the roller was 600 rpm
  • the conveyance speed of the substrate was 5 mm / second
  • the indentation depth of the buff cloth with respect to the substrate surface was 0.3 mm.
  • the polyimide film was washed with pure water and dried in order to remove the alignment film debris scraped by rubbing and the fiber pieces of the buff cloth.
  • the alignment film As a photo-alignment film, it is possible to provide an FFS liquid crystal display element having excellent transmittance characteristics and capable of reducing a decrease in alignment with liquid crystal molecules due to rubbing unevenness. Since the liquid crystal alignment was evaluated by various photo-alignment films, the evaluation method will be described below.
  • a thin film transistor and a transparent electrode layer are formed on the first substrate, and an alignment film is formed thereon.
  • a rubbing method which is a contact method
  • random scratches are formed on the alignment film surface by rubbing.
  • deeper scratches due to the steps due to the thin film transistor and the transparent electrode layer pattern and the diameter (tens of ⁇ m) of the fiber of the buffing cloth of the rubbing roller Easy to be formed along the step. Since the liquid crystal molecules cannot be aligned in a certain direction when the electric field is turned off at the portion where the scratch is formed, light leakage occurs in the liquid crystal panel during black display. As a result, it becomes difficult to obtain a contrast of a certain value or more.
  • a one-pixel size is 0.23 mm in a calculation example in a 40-inch panel.
  • a resolution mode called 8K which will be put to practical use later, in a calculation example in a 40-inch panel, the size of one pixel becomes as fine as 0.11 mm. That is, since the size of one pixel approaches the diameter of the buff cloth fiber of the rubbing roller, when the electric field is turned off in units of pixels or in units of intermittent pixel rows due to scratches formed when the alignment treatment is performed by the rubbing method. There are places where the liquid crystal molecules cannot be aligned in a certain direction, which may cause a significant decrease in contrast and a large number of display defects due to a large amount of light leakage during black display.
  • An alignment film solution was formed on the comb-shaped transparent electrode formed on the first substrate by a spin coating method to form an alignment film having a dry thickness of 0.1 ⁇ m.
  • An alignment film was similarly formed on the second substrate.
  • a liquid crystal cell was produced using the glass substrate provided with the liquid crystal alignment film. More specifically, the first substrate and the second substrate on which the alignment films are respectively formed, the liquid crystal alignment films face each other, and the direction in which the linearly polarized light is irradiated or rubbed is the antiparallel direction (180 °).
  • the peripheral part was pasted with a sealing agent in a state where a constant gap (4 ⁇ m) was maintained between the two substrates.
  • the liquid crystal composition Preparation Examples 1 to 12
  • the polymerizable monomer-containing liquid crystal compositions 1, 2, 6, 9 and 12 in the above table are placed in the cell gap defined by the surface of the liquid crystal alignment film and the sealant.
  • Each liquid crystal cell was produced by filling at a temperature just above the clearing point by a dropping method and then cooling to room temperature.
  • the frequency was 1 kHz. While applying a 1.8 V rectangular wave, the liquid crystal cell was irradiated with ultraviolet rays by a high pressure mercury lamp (FL15UV34A (NP805) manufactured by Toshiba Lighting & Technology Corp.) through a filter that cuts ultraviolet rays of 320 nm or less.
  • the cell surface was adjusted to have an irradiation intensity of 10 mW / cm 2 and irradiated for 700 seconds to obtain a horizontal alignment liquid crystal display element in which the polymerizable monomer in the polymerizable monomer-containing liquid crystal composition was polymerized.
  • Tables 3 to 8 below show examples of combinations of the alignment films used in the produced liquid crystal cells (liquid crystal display elements) and the liquid crystal compositions or polymerizable monomer-containing liquid crystal compositions used (Examples 1 to 24 and Comparative Examples). 1-2), the static contrast (CRS) evaluation results of the prepared liquid crystal cell, and the results of VHR measurement are shown in Tables 3 to 8 below.
  • Polarizer-analyzer of optical measuring device (RETS-100, manufactured by Otsuka Electronics Co., Ltd.) equipped with white light source, spectroscope, polarizer (incident side polarizing plate), analyzer (exit side polarizing plate), detector
  • the optical film to be measured was placed.
  • the rotation angle between the polarizer and the analyzer is 0 degree (the polarization direction of the polarizer and the analyzer is the parallel position [parallel Nicol]
  • the transmitted light is transmitted by the detector while rotating the optical film.
  • the amount of transmitted light (on-time light amount) at the rotational position of the optical film (the polarization direction of the polarizer and the molecular long axis direction of the polymerizable liquid crystal are parallel) where the detected light amount becomes the largest is Yon. It was. In addition, with the position of the polarizer and the optical film fixed, the rotation angle of the analyzer with respect to the polarizer is 90 degrees (the polarization direction of the polarizer and the analyzer is the orthogonal position [cross Nicol]). The amount of light (light amount when off) was set to Yoff. Contrast CRS was calculated
  • the FFSI / IPS mode display elements (Examples 1 to 24) manufactured by forming the photo-alignment film are the FFS mode display elements (Comparative Examples 1 and 2) manufactured by forming the rubbing alignment film. ),
  • the contrast was excellent. More specifically, when Examples 1 to 24 are compared with Comparative Examples 1 and 2, it is confirmed that the contrast ratio and VHR are improved when the photo-alignment film is used.
  • VHR is unlikely to decrease, so it is considered that the polymer obtained by polymerizing the monomer traps ions in the liquid crystal composition.
  • the rubbing alignment film it is considered that there are more ionic components, impurities, and the like derived from the rubbing process than in the photo-alignment film.
  • liquid crystal display elements of Examples 1 to 24 were subjected to the following alignment regulating force (anchoring) measurement.
  • the azimuth anchoring energy at the interface between the liquid crystal alignment film surface and the liquid crystal layer is expressed by the following method called the torque balance method (Proc. The method reported on pages 251 to 252).
  • the liquid crystal display elements of Examples 1 to 24 had an alignment regulating force necessary for aligning the liquid crystal compounds.
  • the liquid crystal display elements of Examples 17 to 24 were As a result of polymerization of the polymerizable monomer, it was confirmed that the alignment regulating power of the photo-alignment film with respect to the liquid crystal compound was very good. It was confirmed that the horizontal alignment liquid crystal display device has excellent optical characteristics and high-speed response.

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Abstract

[Problem] The present invention addresses the problem of providing a liquid crystal display element that does not adversely affect the burn-in characteristics of a display element or liquid crystal display element characteristics such as dielectric anisotropy, viscosity, nematic phase upper limit temperature, nematic phase stability at low temperatures, and γ1. [Solution] A liquid crystal display element that is obtained by using a photoalignment film and a liquid crystal composition containing a compound represented by formula (i) and a compound represented by formula (J). The liquid crystal display element maintains the high-speed response properties of the liquid crystal composition and has excellent low-temperature stability.

Description

液晶表示素子Liquid crystal display element
 本発明は液晶表示材料として有用な誘電率異方性(Δε)が正の値を示すネマチック液晶組成物を用いた液晶表示素子に関する。 The present invention relates to a liquid crystal display element using a nematic liquid crystal composition that exhibits a positive dielectric anisotropy (Δε) useful as a liquid crystal display material.
 現在スマートフォン用の液晶ディスプレイとしては、高品位であり、視覚特性に優れる横配向方式、例えばIPSモードの液晶表示装置やFFSモードの液晶表示装置(Fringe Field Switching mode Liquid Crystal Display;FFSモード液晶表示装置)が広く用いられている(特許文献1、特許文献2参照)。FFSモードは、IPSモードの低い開口率及び透過率を改善するため導入された方式である。現在、横配向方式の液晶表示装置に用いられている液晶組成物としては、低電圧化がし易いことから誘電率異方性が正のp型液晶組成物を用いた材料が広く用いられている。また、FFSモードの用途の大部分が携帯端末であるため、さらなる省電力化の要求は強く液晶素子メーカはIGZOを用いたアレイの採用等盛んな開発が続いている。 Currently, as a liquid crystal display for smartphones, it has a high-quality and excellent visual characteristics, for example, an IPS mode liquid crystal display device or an FFS mode liquid crystal display device (Fringe Field Switching mode Liquid Display; FFS mode liquid crystal display device) ) Is widely used (see Patent Document 1 and Patent Document 2). The FFS mode is a method introduced to improve the low aperture ratio and transmittance of the IPS mode. At present, materials using p-type liquid crystal compositions having a positive dielectric anisotropy are widely used as liquid crystal compositions used in lateral alignment type liquid crystal display devices because they can easily reduce the voltage. Yes. In addition, since most of the applications of the FFS mode are portable terminals, there is a strong demand for further power saving, and liquid crystal element manufacturers are actively developing such as adopting an array using IGZO.
 また、液晶分子の配向方法としては、ラビング法と呼ばれる方法が多く用いられている。この方法は、ポリイミド等の配向膜材料を塗布、焼成した薄膜に対して、ナイロンなどの布を巻いたローラーを一定圧力で押し込みながら回転させることによって、配向膜表面を一定方向に擦る(ラビングする)ことにより液晶分子に配向規制力を付与するものである。この方法の厳密な配向機構は現在でも明確では無く、配向膜の表面を擦ることにより、筋状の表示ムラが発生する点、配向膜材料の一部が脱落して液晶層に混入する点およびアレイ基板においては発生した静電気によりTFTが破壊する点等の課題があり、ラビングによらない配向付与方法が検討されてきた。特に、直線偏光の紫外線を用いて配向膜に異方性を持たせる光配向膜は、非接触で配向を付与できることから前述のラビング法の問題を解決する方法として開発が進められており、横電界型の表示素子においても光配向膜の使用が模索されてきた(特許文献3参照)。 Also, as a liquid crystal molecule alignment method, a method called a rubbing method is often used. In this method, the surface of the alignment film is rubbed (rubbed) in a certain direction by rotating a roller wrapped with a cloth such as nylon while pressing it with a certain pressure on a thin film coated and baked with an alignment film material such as polyimide. ) To impart alignment regulating force to the liquid crystal molecules. The exact alignment mechanism of this method is not clear even now, rubbing the surface of the alignment film, causing streaky display unevenness, a part of the alignment film material falling off and mixing into the liquid crystal layer, and In the array substrate, there are problems such as a point that the TFT is broken by the generated static electricity, and a method of imparting orientation without rubbing has been studied. In particular, a photo-alignment film that imparts anisotropy to the alignment film using linearly polarized ultraviolet rays can be imparted in a non-contact manner, and therefore has been developed as a method for solving the problems of the rubbing method described above. The use of a photo-alignment film has also been sought for electric field type display elements (see Patent Document 3).
特開平11-202356号公報JP-A-11-202356 特開2003-233083号公報JP 2003-233083 A 特開2013-109366号公報JP 2013-109366 A
 しかしながら、近年の液晶表示素子の用途や市場の拡大により、その使用方法、製造方法にも大きな変化が見られ、液晶表示素子の駆動方式(例えば、TN型、STN型、VA型、IPS型、FFS型等)だけでなく、その大きさも50型以上の超大型サイズの表示素子が実用化されるに伴い、液晶組成物の基板への注入方法も従来の真空注入法から液晶組成物の液滴を一方の基板面に滴下し、他方の基板と貼りあわせるという滴下注入法(ODF:One Drop Fill)法が注入方法の主流となっている。そのため、上記特許文献1~3に記載するように、IPSやFFSモードなどの横配向方式の電極は、片側の基板表面に形成された複数の短冊状の電極が平行に配列し、かつ前記基板表面の全面に配向膜が被覆した構造を備えていることから、当該片側の基板表面には無数の凹凸が存在する構造のため、液晶組成物を基板表面に滴下した際に基板上に滴下痕が形成し、この滴下痕が表示品位の低下を招く問題が表面化するに至った。このような問題に加えて、さらに液晶組成物と直接接触する配向膜との適合性も問題になる。 However, due to the recent application of the liquid crystal display element and the expansion of the market, the use method and the manufacturing method have changed greatly, and the driving method of the liquid crystal display element (for example, TN type, STN type, VA type, IPS type, In addition to FFS type and the like, as the size of super-large size display elements of 50 type or more is put into practical use, the liquid crystal composition is injected from the conventional vacuum injection method to the liquid crystal composition liquid. A dropping injection method (ODF: One Drop Fill) method in which a droplet is dropped on one substrate surface and bonded to the other substrate is the mainstream of the injection method. Therefore, as described in Patent Documents 1 to 3, a laterally oriented electrode such as an IPS mode or an FFS mode has a plurality of strip-shaped electrodes formed on the substrate surface on one side arranged in parallel, and the substrate Since it has a structure in which the entire surface is covered with an alignment film, the surface of the substrate on one side has innumerable irregularities, so when the liquid crystal composition is dropped on the substrate surface, a drop mark is formed on the substrate. As a result, the problem that the drop marks cause deterioration in display quality has been brought to the surface. In addition to such problems, compatibility with the alignment film that is in direct contact with the liquid crystal composition also becomes a problem.
 さらに、ODF法による液晶表示素子製造工程においては、液晶表示素子のサイズに応じて最適な液晶注入量を滴下する必要がある。注入量のずれが最適値から大きくなると、あらかじめ設計された液晶表示素子の屈折率や駆動電界のバランスが崩れ、斑発生やコントラスト不良などの表示不良が生じる。特に、最近流行しているスマートフォンに多用される小型液晶表示素子は、最適な液晶注入量が少ないために最適値からのずれを一定範囲内に制御すること自体が難しい。従って、液晶表示素子の歩留まり高く保持するために、例えば、液晶滴下時に生じる滴下装置内の急激な圧力変化や衝撃に対する影響が少なく、長時間にわたって安定的に液晶を滴下し続けることが可能な性能も必要である。 Furthermore, in the liquid crystal display element manufacturing process by the ODF method, it is necessary to drop an optimal liquid crystal injection amount according to the size of the liquid crystal display element. When the deviation of the injection amount increases from the optimum value, the balance between the refractive index and the driving electric field of the liquid crystal display element designed in advance is lost, and display defects such as spots and contrast defects occur. In particular, small liquid crystal display elements that are frequently used in smartphones that have become popular recently are difficult to control the deviation from the optimum value within a certain range because the optimum liquid crystal injection amount is small. Therefore, in order to keep the yield of the liquid crystal display element high, for example, there is little influence on the sudden pressure change and impact in the dropping device that occurs when dropping the liquid crystal, and the ability to keep dropping the liquid crystal stably for a long time Is also necessary.
 また、液晶分子に対する光配向膜の配向規制力を高める場合、照射エネルギーの増大や長時間の照射が必要となるという問題がある。 In addition, when increasing the alignment regulating force of the photo-alignment film with respect to the liquid crystal molecules, there is a problem that it is necessary to increase irradiation energy or to irradiate for a long time.
 このように、TFT素子等で駆動するアクティブマトリックス駆動液晶表示素子に使用される液晶組成物おいては、高速応答性能等の液晶表示素子として求められている特性や性能を維持しつつ、従来から重視されてきた高い比抵抗値あるいは高い電圧保持率を有することや光や熱等の外部刺激に対して安定であるという特性に加えて、液晶表示素子の製造方法を考慮した開発が求められてきている。 Thus, in the liquid crystal composition used for the active matrix drive liquid crystal display element driven by a TFT element or the like, while maintaining the characteristics and performance required for a liquid crystal display element such as high-speed response performance, In addition to the characteristics of having a high specific resistance value or high voltage holding ratio, which are emphasized, and being stable against external stimuli such as light and heat, development in consideration of the manufacturing method of liquid crystal display elements has been required. ing.
 そこで本発明の課題は、上記問題点を解決し、誘電率異方性(Δε)、粘度(η)、ネマチック相-等方性液体の転移温度(TNI)、低温でのネマチック相安定性、回転粘度(γ1)等の液晶表示素子としての諸特性に優れ、光配向膜を備えた水平配向方式の液晶表示素子に用いることにより優れた表示特性を実現可能なp型液晶組成物を用いた液晶表示素子を提供することにある。 Therefore, the problem of the present invention is to solve the above problems, dielectric anisotropy (Δε), viscosity (η), nematic phase-isotropic liquid transition temperature (TNI), nematic phase stability at low temperature, A p-type liquid crystal composition that is excellent in various characteristics as a liquid crystal display element such as rotational viscosity (γ1) and that can realize excellent display characteristics when used in a horizontal alignment type liquid crystal display element provided with a photo-alignment film was used. The object is to provide a liquid crystal display element.
 本発明の他の課題は、配向規制力が向上した配向膜を備えた水平配向方式の液晶表示素子に用いることにより優れた表示特性(コントラストなど)を実現可能なp型液晶組成物を用いた液晶表示素子を提供することにある。 Another object of the present invention is to use a p-type liquid crystal composition capable of realizing excellent display characteristics (contrast, etc.) when used in a horizontal alignment type liquid crystal display device having an alignment film with improved alignment control power. The object is to provide a liquid crystal display element.
 本願発明者らは、上記課題を解決するために鋭意検討し、水平配向方式の液晶表示素子の構成およびそれに最適な種々の液晶組成物や配向膜の構成を検討した結果、本願発明の完成に至った。 The inventors of the present application have made extensive studies to solve the above-mentioned problems, and as a result of studying the configuration of the horizontal alignment type liquid crystal display element and the various configurations of various liquid crystal compositions and alignment films, the present invention has been completed. It came.
 本発明に係る液晶表示素子は、比抵抗や電圧保持率が熱や光によって受ける変化が極めて小さいため、製品の実用性が高く、高速応答を達成できる。 Since the liquid crystal display element according to the present invention undergoes very small changes in specific resistance and voltage holding ratio due to heat and light, the practicality of the product is high and high-speed response can be achieved.
 本発明に係る液晶組成物は用いた液晶表示素子の製造工程では、安定的に性能を発揮できるため、工程起因の表示不良が抑制されて歩留まり高く製造できるので、非常に有用である。 The liquid crystal composition according to the present invention is very useful because it can stably exhibit performance in the manufacturing process of the liquid crystal display element used, and can be manufactured with high yield by suppressing display defects caused by the process.
 本発明に係る液晶表示素子は、低温安定性および高速応答性に優れた液晶組成物を使用することができる。 The liquid crystal display element according to the present invention can use a liquid crystal composition excellent in low-temperature stability and high-speed response.
 本発明は、液晶分子の配向規制力が向上した光配向膜を備えた液晶表示素子を提供することができる。 The present invention can provide a liquid crystal display element provided with a photo-alignment film in which the alignment regulating force of liquid crystal molecules is improved.
 本発明に係る液晶表示素子は、配向規制力に優れた高コントラスを実現することができる。 The liquid crystal display element according to the present invention can realize a high contrast excellent in alignment regulating force.
 本発明に係る液晶表示素子は、重合性モノマーを含む液晶組成物を使用するため非常に優れた高コントラスを実現することができる。 Since the liquid crystal display element according to the present invention uses a liquid crystal composition containing a polymerizable monomer, a very excellent high contrast can be realized.
本発明の液晶表示素子の構成の一例を模式的に示す図である。It is a figure which shows typically an example of a structure of the liquid crystal display element of this invention. 図1における基板2上に形成された電極層3のII線で囲まれた領域を拡大した平面図である。It is the top view to which the area | region enclosed by the II line | wire of the electrode layer 3 formed on the board | substrate 2 in FIG. 1 was expanded. 図2におけるIII-III線方向に図1に示す液晶表示素子を切断した断面図である。FIG. 3 is a cross-sectional view of the liquid crystal display element shown in FIG. 1 cut along the line III-III in FIG. 図2の変形例であり、図1における基板2上に形成された電極層3のII線で囲まれた領域を拡大した平面図である。FIG. 3 is a modification of FIG. 2, and is an enlarged plan view of a region surrounded by II line of an electrode layer 3 formed on a substrate 2 in FIG. 1. 図4におけるIII-III線方向に図1に示す液晶表示素子を切断した断面図である。FIG. 5 is a cross-sectional view of the liquid crystal display element shown in FIG. 1 taken along the line III-III in FIG. 本発明の液晶表示素子における電極構造を模式的に示す平面図である。It is a top view which shows typically the electrode structure in the liquid crystal display element of this invention. 図6の破線部VIIの領域における液晶層の重合前後の状態を模式的に示す平面図である。It is a top view which shows typically the state before and behind superposition | polymerization of the liquid crystal layer in the area | region of the broken line part VII of FIG. 図6の破線部VIIの領域において、本発明の液晶表示素子に使用する好適な液晶層の駆動状態を模式的に示す平面図である。FIG. 7 is a plan view schematically showing a driving state of a suitable liquid crystal layer used in the liquid crystal display element of the present invention in a region of a broken line part VII in FIG. 6.
 本発明の第一は、対向に配置された第一の基板および第二の基板と、
 前記第一の基板と前記第二の基板との間に充填された液晶組成物を含有する液晶層と、
 前記第一の基板上に、共通電極、マトリクス状に配置される複数個のゲートバスライン及びデータバスライン、前記ゲートバスラインとデータバスラインとの交差部に設けられる薄膜トランジスタならびに前記薄膜トランジスタにより駆動され前記共通電極との間で基板に対して略平行な電界を形成する画素電極を画素毎に有する電極層と、
 前記液晶層と前記第一の基板および前記液晶層と前記第二の基板との間に、少なくとも一方の基板に形成された光配向層と、を有し、
 前記液晶組成物が、正の誘電率異方性を有し、ネマチック相-等方性液体の転移温度が60℃以上であり、一般式(i)
The first of the present invention, the first substrate and the second substrate disposed opposite to each other,
A liquid crystal layer containing a liquid crystal composition filled between the first substrate and the second substrate;
Driven by the common electrode, a plurality of gate bus lines and data bus lines arranged in a matrix, a thin film transistor provided at an intersection of the gate bus line and the data bus line, and the thin film transistor on the first substrate. An electrode layer having a pixel electrode for each pixel that forms an electric field substantially parallel to the substrate with the common electrode;
A photo-alignment layer formed on at least one substrate between the liquid crystal layer and the first substrate and the liquid crystal layer and the second substrate;
The liquid crystal composition has a positive dielectric anisotropy, a nematic phase-isotropic liquid transition temperature of 60 ° C. or higher, and represented by the general formula (i):
Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003
(上記一般式(i)中、Ri1及びRi2はそれぞれ独立して、炭素原子数1~8のアルキル基、炭素原子数2~8のアルケニル基、炭素原子数1~8のアルコキシ基又は炭素原子数2~8のアルケニルオキシ基を表し、該アルキル基、アルケニル基、アルコキシ基又はアルケニルオキシ基中の1つ以上の水素原子はフッ素原子で置換されていてもよく、該アルキル基、アルケニル基、アルコキシ基又はアルケニルオキシ基中のメチレン基は酸素原子が連続して結合しない限り酸素原子で置換されていてもよく、カルボニル基が連続して結合しない限りカルボニル基で置換されていてもよく、
i1
(a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)
(b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)及び
(c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又はトリフルオロメトキシ基で置換されていても良く、
i1は、1、2、3又は4を表し、ni1が2、3または4であってAi1が複数存在する場合は、それらは同一であっても異なっていても良く、ni1が2、3又は4であってZi1が複数存在する場合は、それらは同一であっても異なっていても良い。)で表される化合物群から選ばれる少なくとも1種類の化合物、及び、下記の一般式(J)
(In the general formula (i), R i1 and R i2 are each independently an alkyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or Represents an alkenyloxy group having 2 to 8 carbon atoms, and one or more hydrogen atoms in the alkyl group, alkenyl group, alkoxy group or alkenyloxy group may be substituted with a fluorine atom. The methylene group in the group, alkoxy group or alkenyloxy group may be substituted with an oxygen atom unless the oxygen atom is continuously bonded, and may be substituted with a carbonyl group unless the carbonyl group is bonded continuously. ,
A i1 is (a) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O- .)
(B) a 1,4-phenylene group (one —CH═ present in the group or two or more non-adjacent —CH═ may be replaced by —N═) and (c) (C) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6-diyl group or One —CH═ present in the 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ may be replaced by —N═. )
The group (a), the group (b) and the group (c) are each independently selected from the group consisting of cyano group, fluorine atom, chlorine atom, methyl group, trifluoromethyl group or trifluoro May be substituted with a methoxy group,
n i1 represents 1, 2, 3 or 4, and when n i1 is 2, 3 or 4, and there are a plurality of A i1 , they may be the same or different, and n i1 is When it is 2, 3 or 4 and a plurality of Z i1 are present, they may be the same or different. ) And at least one compound selected from the group of compounds represented by formula (J):
Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004
(式中、RJ1は炭素原子数1~8のアルキル基を表し、該アルキル基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
 nJ1は、0、1、2、3又は4を表し、
 AJ1、AJ2及びAJ3はそれぞれ独立して、
(a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)
(b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)及び
(c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又はトリフルオロメトキシ基で置換されていても良く、
 ZJ1及びZJ2はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-OCF-、-CFO-、-COO-、-OCO-又は-C≡C-を表し、
 nJ1が2、3又は4であってAJ2が複数存在する場合は、それらは同一であっても異なっていても良く、nJ1が2、3又は4であってZJ1が複数存在する場合は、それらは同一であっても異なっていても良く、
 XJ1は、水素原子、フッ素原子、塩素原子、シアノ基、トリフルオロメチル基、フルオロメトキシ基、ジフルオロメトキシ基、トリフルオロメトキシ基又は2,2,2-トリフルオロエチル基を表す。)で表される化合物の中から1種または2種以上含有することを特徴とする水平配向型の液晶表示素子である。
(Wherein R J1 represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently —CH═CH—, — Optionally substituted by C≡C—, —O—, —CO—, —COO— or —OCO—,
n J1 represents 0, 1, 2, 3 or 4;
A J1 , A J2 and A J3 are each independently
(A) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O-.)
(B) a 1,4-phenylene group (one —CH═ present in the group or two or more non-adjacent —CH═ may be replaced by —N═) and (c) (C) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6-diyl group or One —CH═ present in the 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ may be replaced by —N═. )
The group (a), the group (b) and the group (c) are each independently selected from the group consisting of cyano group, fluorine atom, chlorine atom, methyl group, trifluoromethyl group or trifluoro May be substituted with a methoxy group,
Z J1 and Z J2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C≡C—,
When n J1 is 2, 3 or 4 and a plurality of A J2 are present, they may be the same or different, and n J1 is 2, 3 or 4 and a plurality of Z J1 is present. If they are the same or different,
X J1 represents a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a fluoromethoxy group, a difluoromethoxy group, a trifluoromethoxy group, or a 2,2,2-trifluoroethyl group. It is a horizontal alignment type liquid crystal display element characterized by containing one or more of the compounds represented by formula (1).
 本発明に係る液晶表示素子の構造および当該液晶表示素子の構成要素である、基板および電極層について図1~8を用いて説明する。次いで、液晶表示素子の構成要素について液晶層および光配向膜層について詳説する。 The structure of the liquid crystal display element according to the present invention and the substrate and electrode layers which are constituent elements of the liquid crystal display element will be described with reference to FIGS. Next, the liquid crystal layer and the photo-alignment film layer will be described in detail with respect to the components of the liquid crystal display element.
 以下、図面に基づいて、本発明に係る液晶表示素子の一実施形態を説明する。 Hereinafter, an embodiment of a liquid crystal display device according to the present invention will be described with reference to the drawings.
 図1は、液晶表示素子の構成を模式的に示す図である。図1では、説明のために便宜上各構成要素を離間して記載している。本発明に係る液晶表示素子10の構成は、図1に記載するように、対向に配置された第一の(透明絶縁)基板2と、第二の(透明絶縁)基板7との間に挟持された液晶組成物(または液晶層5)を有する水平配向モードの液晶表示素子であって、該液晶組成物として前記本発明の液晶組成物を用いたことに特徴を有するものである。第一の(透明絶縁)基板2は、液晶層5側の面に電極層3が形成されている。また、液晶層5と、第一の(透明絶縁)基板2及び第二の(透明絶縁)基板7のそれぞれの間に、液晶層5を構成する液晶組成物と直接当接してホモジニアス配向を誘起する一対の光配向膜4を有し、該液晶組成物中の液晶分子は、電圧無印加時に前記基板2,7に対して略平行になるように配向されている。図1および図3に示すように、前記第二の基板7および前記第一の基板2は、一対の偏光板1,8により挟持されてもよい。さらに、図1では、前記第二の基板7と配向膜4との間にカラーフィルタ6が設けられている。なお、本発明に係る液晶表示素子の形態としては、いわゆるカラーフィルタオンアレイ(COA)であってもよく、薄膜トランジスタを含む電極層と液晶層との間にカラーフィルタを設けても、または当該薄膜トランジスタを含む電極層と第二の基板との間にカラーフィルタを設けてもよい。 FIG. 1 is a diagram schematically showing a configuration of a liquid crystal display element. In FIG. 1, for convenience of explanation, each component is illustrated separately. As shown in FIG. 1, the configuration of the liquid crystal display element 10 according to the present invention is sandwiched between a first (transparent insulating) substrate 2 and a second (transparent insulating) substrate 7 that are arranged to face each other. A liquid crystal display element of a horizontal alignment mode having the liquid crystal composition (or liquid crystal layer 5), wherein the liquid crystal composition of the present invention is used as the liquid crystal composition. The first (transparent insulating) substrate 2 has an electrode layer 3 formed on the surface on the liquid crystal layer 5 side. Further, between the liquid crystal layer 5 and each of the first (transparent insulation) substrate 2 and the second (transparent insulation) substrate 7, the liquid crystal composition constituting the liquid crystal layer 5 is directly brought into contact to induce homogeneous alignment. The liquid crystal molecules in the liquid crystal composition are aligned so as to be substantially parallel to the substrates 2 and 7 when no voltage is applied. As shown in FIGS. 1 and 3, the second substrate 7 and the first substrate 2 may be sandwiched between a pair of polarizing plates 1 and 8. Further, in FIG. 1, a color filter 6 is provided between the second substrate 7 and the alignment film 4. The liquid crystal display element according to the present invention may be a so-called color filter on array (COA), or may be provided with a color filter between an electrode layer including a thin film transistor and a liquid crystal layer, or the thin film transistor. A color filter may be provided between the electrode layer containing and the second substrate.
 また、図1~8では説明上、本発明の液晶表示素子の好適な実施形態として、液晶層5と第一の基板2との間および液晶層5と前記第二の基板7との間にそれぞれの第一の基板および第二の基板上に光配向膜4が形成された例を記載しているが、本発明の液晶表示素子は、第一の基板2または第二の基板7上の少なくとも一方に光配向膜4が形成されていればよい。 1 to 8, for the sake of explanation, as a preferred embodiment of the liquid crystal display element of the present invention, between the liquid crystal layer 5 and the first substrate 2 and between the liquid crystal layer 5 and the second substrate 7. Although the example in which the photo-alignment film 4 is formed on each of the first substrate and the second substrate is described, the liquid crystal display element of the present invention is on the first substrate 2 or the second substrate 7. The photo-alignment film 4 should just be formed in at least one.
 例えば、液晶層5と第一の基板2との間に光配向膜4が前記第一の基板2上に液晶層5と当接するように形成されている場合、他方の液晶層5と第二の基板7との間には、配向膜を設けない、光配向膜またはラビング配向膜を形成することが好ましく、光配向膜を形成することがより好ましい。 For example, when the photo-alignment film 4 is formed between the liquid crystal layer 5 and the first substrate 2 so as to contact the liquid crystal layer 5 on the first substrate 2, the other liquid crystal layer 5 and the second substrate 2 It is preferable to form a photo-alignment film or a rubbing alignment film without providing an alignment film between the substrate 7 and more preferably to form a photo-alignment film.
 すなわち、本発明に係る液晶表示素子10は、第一の偏光板1と、第一の基板2と、薄膜トランジスタを含む電極層3と、(第一の)配向膜4と、液晶組成物を含む液晶層5と、(第二の)配向膜4と、カラーフィルタ6と、第二の基板7と、第二の偏光板8と、が順次積層された構成であることが好ましい。 That is, the liquid crystal display element 10 according to the present invention includes a first polarizing plate 1, a first substrate 2, an electrode layer 3 including a thin film transistor, a (first) alignment film 4, and a liquid crystal composition. It is preferable that the liquid crystal layer 5, the (second) alignment film 4, the color filter 6, the second substrate 7, and the second polarizing plate 8 are sequentially stacked.
 第一の基板2と第二の基板7はガラス又はプラスチックの如き柔軟性をもつ透明な材料を用いることができ、一方はシリコン等の不透明な材料でも良い。2枚の基板2、7は、周辺領域に配置されたエポキシ系熱硬化性組成物等のシール材及び封止材によって貼り合わされていて、その間には基板間距離を保持するために、例えば、ガラス粒子、プラスチック粒子、アルミナ粒子等の粒状スペーサーまたはフォトリソグラフィ法により形成された樹脂からなるスペーサー柱が配置されていてもよい。本発明に係る基板は、透明導電性材料を含むことが好ましい。 The first substrate 2 and the second substrate 7 can be made of a transparent material having flexibility such as glass or plastic, and one of them can be an opaque material such as silicon. The two substrates 2 and 7 are bonded together by a sealing material and a sealing material such as an epoxy thermosetting composition disposed in the peripheral region, and in order to maintain the distance between the substrates, for example, Spacer columns made of resin formed by granular spacers such as glass particles, plastic particles, alumina particles, or the photolithography method may be arranged. The substrate according to the present invention preferably contains a transparent conductive material.
 図2は、図1における基板2上に形成された電極層3のII線で囲まれた領域を拡大した平面図である。図3は、図2におけるIII-III線方向に図1に示す液晶表示素子を切断した断面図である。また、図2および図3は、本発明に係る水平配向方式の液晶表示素子の一例として、FFSモードの例を記載している。一方、後述する図4および図5は、本発明に係る水平配向方式の液晶表示素子の一例として、IPSモードの例を記載している。図2に示すように、第一の基板2の表面に形成されている薄膜トランジスタを含む電極層3は、走査信号を供給するための複数のゲートバスライン26と表示信号を供給するための複数のデータバスライン25とが、互いに交差してマトリクス状に配置されている。なお、図2には、一対のゲートバスライン26及び一対のデータバスライン25のみが示されている。 FIG. 2 is an enlarged plan view of a region surrounded by the II line of the electrode layer 3 formed on the substrate 2 in FIG. FIG. 3 is a cross-sectional view of the liquid crystal display element shown in FIG. 1 cut along the line III-III in FIG. 2 and 3 describe an example of the FFS mode as an example of a horizontal alignment type liquid crystal display element according to the present invention. On the other hand, FIG. 4 and FIG. 5 described later describe an example of the IPS mode as an example of the horizontal alignment type liquid crystal display element according to the present invention. As shown in FIG. 2, the electrode layer 3 including thin film transistors formed on the surface of the first substrate 2 includes a plurality of gate bus lines 26 for supplying scanning signals and a plurality of gate bus lines 26 for supplying display signals. Data bus lines 25 are arranged in a matrix so as to cross each other. In FIG. 2, only a pair of gate bus lines 26 and a pair of data bus lines 25 are shown.
 複数のゲートバスライン26と複数のデータバスライン25とにより囲まれた領域により、液晶表示装置の単位画素が形成され、該単位画素内には、画素電極21及び共通電極22が形成されている。ゲートバスライン26とデータバスライン25が互いに交差している交差部近傍には、ソース電極27、ドレイン電極24およびゲート電極28を含む薄膜トランジスタが設けられている。この薄膜トランジスタは、画素電極21に表示信号を供給するスイッチ素子として、画素電極21と連結している。また、ゲートバスライン26と並行して、共通ライン29が設けられる。この共通ライン29は、共通電極22に共通信号を供給するために、共通電極22と連結している。 A unit pixel of the liquid crystal display device is formed by a region surrounded by the plurality of gate bus lines 26 and the plurality of data bus lines 25, and a pixel electrode 21 and a common electrode 22 are formed in the unit pixel. . A thin film transistor including a source electrode 27, a drain electrode 24, and a gate electrode 28 is provided in the vicinity of an intersection where the gate bus line 26 and the data bus line 25 intersect each other. The thin film transistor is connected to the pixel electrode 21 as a switch element that supplies a display signal to the pixel electrode 21. A common line 29 is provided in parallel with the gate bus line 26. The common line 29 is connected to the common electrode 22 in order to supply a common signal to the common electrode 22.
 薄膜トランジスタの構造の好適な一態様は、例えば、図3で示すように、基板2表面に形成されたゲート電極11と、当該ゲート電極11を覆い、且つ前記基板2の略全面を覆うように設けられたゲート絶縁層12と、前記ゲート電極11と対向するよう前記ゲート絶縁層12の表面に形成された半導体層13と、前記半導体層13の表面の一部を覆うように設けられた保護層14と、前記保護層14および前記半導体層13の一方の側端部を覆い、かつ前記基板2表面に形成された前記ゲート絶縁層12と接触するように設けられたドレイン電極16と、前記保護層14および前記半導体層13の他方の側端部を覆い、かつ前記基板2表面に形成された前記ゲート絶縁層12と接触するように設けられたソース電極17と、前記ドレイン電極16および前記ソース電極17を覆うように設けられた絶縁保護層18と、を有している。ゲート電極11の表面にゲート電極との段差を無くす等の理由により陽極酸化被膜(図示せず)を形成してもよい。 A preferred embodiment of the structure of the thin film transistor is provided, for example, as shown in FIG. 3 so as to cover the gate electrode 11 formed on the surface of the substrate 2 and the gate electrode 11 and cover the substantially entire surface of the substrate 2. A gate insulating layer 12, a semiconductor layer 13 formed on the surface of the gate insulating layer 12 so as to face the gate electrode 11, and a protective layer provided to cover a part of the surface of the semiconductor layer 13 14, a drain electrode 16 provided so as to cover one side end of the protective layer 14 and the semiconductor layer 13 and to be in contact with the gate insulating layer 12 formed on the surface of the substrate 2, and the protection A source electrode 17 which covers the other side edge of the layer 14 and the semiconductor layer 13 and is in contact with the gate insulating layer 12 formed on the surface of the substrate 2; and the drain Has an insulating protective layer 18 provided to cover the electrode 16 and the source electrode 17, a. An anodic oxide film (not shown) may be formed on the surface of the gate electrode 11 for reasons such as eliminating a step with the gate electrode.
 前記半導体層13には、アモルファスシリコン、多結晶ポリシリコンなどを用いることができるが、ZnO、IGZO(In-Ga-Zn-O)、ITO等の透明半導体膜を用いると、光吸収に起因する光キャリアの弊害を抑制でき、素子の開口率を増大する観点からも好ましい。 Amorphous silicon, polycrystalline polysilicon, or the like can be used for the semiconductor layer 13, but when a transparent semiconductor film such as ZnO, IGZO (In—Ga—Zn—O), ITO, or the like is used, it results from light absorption. It is also preferable from the viewpoint of suppressing the adverse effect of optical carriers and increasing the aperture ratio of the element.
 さらに、ショットキー障壁の幅や高さを低減する目的で半導体層13とドレイン電極16またはソース電極17との間にそれぞれオーミック接触層15を設けても良い。オーミック接触層には、n型アモルファスシリコンやn型多結晶ポリシリコン等のリン等の不純物を高濃度に添加した材料を用いることができる。 Furthermore, ohmic contact layers 15 may be provided between the semiconductor layer 13 and the drain electrode 16 or the source electrode 17 for the purpose of reducing the width and height of the Schottky barrier. For the ohmic contact layer, a material in which an impurity such as phosphorus such as n-type amorphous silicon or n-type polycrystalline polysilicon is added at a high concentration can be used.
 ゲートバスライン26やデータバスライン25、共通ライン29は金属膜であることが好ましく、Al、Cu、Au、Ag、Cr、Ta、Ti、Mo、W、Ni又はその合金がより好ましく、Al又はその合金の配線を用いる場合が特に好ましい。また、絶縁保護層18は、絶縁機能を有する層であり、窒化ケイ素、二酸化ケイ素、ケイ素酸窒化膜等で形成される。 The gate bus line 26, the data bus line 25, and the common line 29 are preferably metal films, more preferably Al, Cu, Au, Ag, Cr, Ta, Ti, Mo, W, Ni, or an alloy thereof, Al or Cu The case of using the alloy wiring is particularly preferable. The insulating protective layer 18 is a layer having an insulating function, and is formed of silicon nitride, silicon dioxide, silicon oxynitride film, or the like.
 図2及び図3に示す実施の形態では、共通電極22はゲート絶縁層12上のほぼ全面に形成された平板状の電極であり、一方、画素電極21は共通電極22を覆う絶縁保護層18上に形成された櫛形の電極である。すなわち、共通電極22は画素電極21よりも第一の基板2に近い位置に配置され、これらの電極は絶縁保護層18を介して互いに重なりあって配置される。画素電極21と共通電極22は、例えば、ITO(Indium Tin Oxide)、IZO(Indium Zinc Oxide)、IZTO(Indium Zinc Tin Oxide)等の透明導電性材料により形成される。画素電極21と共通電極22が透明導電性材料により形成されるため、単位画素面積で開口される面積が大きくなり、開口率及び透過率が増加する。 In the embodiment shown in FIGS. 2 and 3, the common electrode 22 is a flat electrode formed on almost the entire surface of the gate insulating layer 12, while the pixel electrode 21 is an insulating protective layer 18 covering the common electrode 22. It is a comb-shaped electrode formed on the top. That is, the common electrode 22 is disposed at a position closer to the first substrate 2 than the pixel electrode 21, and these electrodes are disposed so as to overlap each other via the insulating protective layer 18. The pixel electrode 21 and the common electrode 22 are formed of a transparent conductive material such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), IZTO (Indium Zinc Tin Oxide), and the like. Since the pixel electrode 21 and the common electrode 22 are formed of a transparent conductive material, the area opened by the unit pixel area increases, and the aperture ratio and transmittance increase.
 また、画素電極21と共通電極22とは、これらの電極間にフリンジ電界を形成するために、画素電極21と共通電極22との間の電極間距離(最小離間距離とも称する):Rが、第一の基板2と第二の基板7との距離:Gより小さくなるように形成される。ここで、電極間距離:Rは電極間の基板に水平方向の距離を表す。図3では、平板状の共通電極22と櫛形の画素電極21とが重なり合っているため、電極間距離:R=0となる例が示されており、前記最小離間距離:Rが第一の基板2と第二の基板7との距離(すなわち、セルギャップ)Gよりも小さくなるため、フリンジの電界Eが形成される。したがって、FFS型の液晶表示素子は、画素電極21の櫛形を形成するラインに対して垂直な方向に形成される水平方向の電界と、放物線状の電界を利用することができる。画素電極21の櫛状部分の電極幅:l、及び、画素電極21の櫛状部分の間隙の幅:mは、発生する電界により液晶層5内の液晶分子が全て駆動され得る程度の幅に形成することが好ましい。 In addition, the pixel electrode 21 and the common electrode 22 have an interelectrode distance (also referred to as a minimum separation distance): R between the pixel electrode 21 and the common electrode 22 in order to form a fringe electric field between the electrodes. The distance between the first substrate 2 and the second substrate 7 is smaller than G. Here, the distance between electrodes: R represents the distance in the horizontal direction on the substrate between the electrodes. FIG. 3 shows an example in which the plate-shaped common electrode 22 and the comb-shaped pixel electrode 21 overlap with each other, and therefore, an interelectrode distance: R = 0 is shown, and the minimum separation distance: R is the first substrate. Since the distance between the substrate 2 and the second substrate 7 (that is, the cell gap) G becomes smaller, a fringe electric field E is formed. Therefore, the FFS type liquid crystal display element can use a horizontal electric field formed in a direction perpendicular to a line forming the comb shape of the pixel electrode 21 and a parabolic electric field. The electrode width of the comb-shaped portion of the pixel electrode 21: l and the width of the gap of the comb-shaped portion of the pixel electrode 21: m are such that all the liquid crystal molecules in the liquid crystal layer 5 can be driven by the generated electric field. It is preferable to form.
 本発明に係る液晶表示素子は、フリンジ電界を利用するFFS方式の液晶表示素子であることが好ましく、共通電極22と当該共通電極22に隣接する画素電極21との電極間距離R(共通電極22と当該共通電極22に隣接する画素電極21との離間距離の基板に対して水平方向の成分)が、配向層4同士(基板間距離)の最短離間距離Gより短いことが好ましい。本発明の好ましい形態のようなFFS方式の液晶表示素子の場合、長軸方向が、配向層の配向方向と平行になるように配置している液晶分子に電圧を印加すると、画素電極21と共通電極22との間に放物線形の電界の等電位線が画素電極21と共通電極22の上部にまで形成され、液晶層5内の液晶分子の長軸が形成された電界に沿って配列する。特に、本発明に係る液晶組成物は正の誘電率異方性を有する液晶分子を用いるため、液晶分子の長軸方向が、発生した電界方向に沿って配列する。 The liquid crystal display element according to the present invention is preferably an FFS liquid crystal display element using a fringe electric field, and an interelectrode distance R (common electrode 22) between the common electrode 22 and the pixel electrode 21 adjacent to the common electrode 22 is used. And the pixel electrode 21 adjacent to the common electrode 22 is preferably shorter than the shortest separation distance G between the alignment layers 4 (inter-substrate distance). In the case of the FFS mode liquid crystal display element as in the preferred embodiment of the present invention, when a voltage is applied to the liquid crystal molecules arranged so that the long axis direction is parallel to the alignment direction of the alignment layer, it is common with the pixel electrode 21. An equipotential line of a parabolic electric field is formed between the electrode 22 and the upper part of the pixel electrode 21 and the common electrode 22 and is arranged along the electric field in which the major axis of the liquid crystal molecules in the liquid crystal layer 5 is formed. In particular, since the liquid crystal composition according to the present invention uses liquid crystal molecules having positive dielectric anisotropy, the major axis direction of the liquid crystal molecules is aligned along the generated electric field direction.
 本発明に係る液晶表示素子において、共通電極および画素電極は同一基板上に形成されていることが好ましい。例えば、図1~3に示すように共通電極および画素電極が第一の基板上に形成されていることが好ましい。 In the liquid crystal display element according to the present invention, the common electrode and the pixel electrode are preferably formed on the same substrate. For example, it is preferable that the common electrode and the pixel electrode are formed on the first substrate as shown in FIGS.
 カラーフィルタ6は、光の漏れを防止する観点で、薄膜トランジスタおよびストレイジキャパシタ23に対応する部分にブラックマトリックス(図示せず)を形成することが好ましい。 The color filter 6 preferably forms a black matrix (not shown) in a portion corresponding to the thin film transistor and the storage capacitor 23 from the viewpoint of preventing light leakage.
 電極層3、及び、カラーフィルタ6上には、液晶層5を構成する液晶組成物と直接当接してホモジニアス配向を誘起する一対の光配向膜4が設けられている。 On the electrode layer 3 and the color filter 6, a pair of photo-alignment films 4 that are in direct contact with the liquid crystal composition constituting the liquid crystal layer 5 and induce homogeneous alignment are provided.
 配向膜を光配向膜にすることにより、ラビングムラによる液晶分子に対する配向規制力の低下やラビングの際に生じる粉塵などの課題を軽減でき、かつ優れた透過率特性のFFS方式の液晶表示素子を提供することができる。 By using an alignment film as a photo-alignment film, we can reduce the problem of the alignment restriction on liquid crystal molecules due to uneven rubbing and dust generated during rubbing, and provide an FFS liquid crystal display element with excellent transmittance characteristics. can do.
 また、偏光板1及び偏光板8は、各偏光板の偏光軸を調整して視野角やコントラストが良好になるように調整することができ、それらの透過軸がノーマリブラックモードで作動するように、互いに直行する透過軸を有することが好ましい。特に、偏光板1及び偏光板8のうちいずれかは、液晶分子の配向方向と平行な透過軸を有するように配置することが好ましい。また、コントラストが最大になるように液晶の屈折率異方性Δnとセル厚dとの積を調整することが好ましい。更に、視野角を広げるための位相差フィルムも使用することもできる。 In addition, the polarizing plate 1 and the polarizing plate 8 can be adjusted so that the viewing angle and the contrast are good by adjusting the polarizing axis of each polarizing plate, and the transmission axes thereof operate in the normally black mode. In addition, it is preferable to have transmission axes perpendicular to each other. In particular, any one of the polarizing plate 1 and the polarizing plate 8 is preferably arranged so as to have a transmission axis parallel to the alignment direction of the liquid crystal molecules. Further, it is preferable to adjust the product of the refractive index anisotropy Δn of the liquid crystal and the cell thickness d so that the contrast is maximized. Furthermore, a retardation film for widening the viewing angle can also be used.
 さらに、本発明に係る液晶表示素子の一態様は、共通電極が第一の基板のほぼ全面に形成され、かつ画素電極より第一の基板側に配置されていることが好ましい。すなわち、本発明に係る液晶表示素子の好適な実施形態は、対向に配置された第一の基板および第二の基板と、前記第一の基板と前記第二の基板との間に充填された液晶組成物を含有する液晶層と、前記第一の基板上に、透明導電性材料を含む共通電極、マトリクス状に配置される複数個のゲートバスライン及びデータバスライン、前記ゲートバスラインとデータバスラインとの交差部に設けられる薄膜トランジスタおよび透明導電性材料を含み、かつ前記薄膜トランジスタにより駆動され前記共通電極との間でフリンジ電界を形成する画素電極と、を画素毎に有する電極層と、前記液晶層と前記第一の基板および前記第二の基板との間にそれぞれ形成されたホモジニアス配向を誘起する光配向膜層と、を有し、前記画素電極と共通電極との間の電極間距離の水平成分Rが、前記第一の基板と第二の基板との距離Gより小さく、前記共通電極が前記第一の基板のほぼ全面に形成され、かつ画素電極より第一の基板側に配置されている。なお、本発明の一形態である図2~3では、共通電極が第一の基板のほぼ全面に形成され、かつ画素電極より第一の基板側に配置されている形態を示している。 Furthermore, in one embodiment of the liquid crystal display element according to the present invention, it is preferable that the common electrode is formed on substantially the entire surface of the first substrate and arranged on the first substrate side from the pixel electrode. That is, a preferred embodiment of the liquid crystal display element according to the present invention is filled between the first substrate and the second substrate that are disposed opposite to each other, and between the first substrate and the second substrate. A liquid crystal layer containing a liquid crystal composition, a common electrode including a transparent conductive material on the first substrate, a plurality of gate bus lines and data bus lines arranged in a matrix, and the gate bus lines and data A pixel electrode including a thin film transistor and a transparent conductive material provided at an intersection with a bus line, and a pixel electrode that is driven by the thin film transistor to form a fringe electric field with the common electrode; A photo-alignment film layer for inducing homogeneous alignment formed between the liquid crystal layer and the first substrate and the second substrate, respectively, and the pixel electrode and the common electrode The horizontal component R of the inter-electrode distance is smaller than the distance G between the first substrate and the second substrate, the common electrode is formed almost on the entire surface of the first substrate, and the first component is higher than the pixel electrode. Arranged on the substrate side. Note that FIGS. 2 to 3 which are one mode of the present invention show a mode in which the common electrode is formed on almost the entire surface of the first substrate and is arranged closer to the first substrate than the pixel electrode.
 図2~図3を用いて説明したFFS型の液晶表示素子は一例であって、本発明の技術的思想から逸脱しない限りにおいて、他の様々な形態で実施することが可能である。 The FFS type liquid crystal display element described with reference to FIGS. 2 to 3 is an example, and can be implemented in various other forms without departing from the technical idea of the present invention.
 本発明に係る液晶表示素子の他の実施形態を図4および図5を用いて以下説明する。図4および図5に示す液晶表示素子はIPS型の液晶表示素子である。例えば、図4は、図1における基板2上に形成された電極層3のII線で囲まれた領域を拡大した平面図の他の実施形態である。図4に示すように、画素電極21がスリットを有する構成としてもよい。また、スリットのパターンを、ゲートバスライン26又はデータバスライン25に対して傾斜角を持つようにして形成してもよい。 Other embodiments of the liquid crystal display element according to the present invention will be described below with reference to FIGS. The liquid crystal display elements shown in FIGS. 4 and 5 are IPS liquid crystal display elements. For example, FIG. 4 is another embodiment of the plan view in which the region surrounded by the II line of the electrode layer 3 formed on the substrate 2 in FIG. 1 is enlarged. As shown in FIG. 4, the pixel electrode 21 may have a slit. Further, the slit pattern may be formed to have an inclination angle with respect to the gate bus line 26 or the data bus line 25.
 当該図4に示す画素電極21は、略長方形の平板体の電極を略矩形枠状の切欠き部でくり抜かれた形状である。また、当該画素電極21の背面には絶縁層18(図示せず)を介して櫛歯状の共通電極22が一面に形成されている。そして、隣接する共通電極と画素電極との(最短)離間距離Rは配向層(または基板)同士の最短離間距離Gより長い。また、前記画素電極の表面には保護絶縁膜及び配向膜層によって被覆されていることが好ましい。なお、前記複数のゲートバスライン25と複数のデータバスライン26とに囲まれた領域にはデータ配線24を介して供給される表示信号を保存するストレイジキャパシタ(図示せず)を設けてもよい。なお、切欠き部の形状は特に制限されるものではなく、図4で示す略矩形だけでなく、楕円、円形、長方形状、菱形、三角形、または平行四辺形など公知の形状の切欠き部を使用できる。図4のような切欠き部の配置であれば、線対称に切欠き部の方向が設けられているためマルチドメイン化された配向制御を行うことができる。 The pixel electrode 21 shown in FIG. 4 has a shape in which a substantially rectangular flat plate electrode is cut out by a notch portion having a substantially rectangular frame shape. In addition, a comb-like common electrode 22 is formed on one surface of the back surface of the pixel electrode 21 via an insulating layer 18 (not shown). The (shortest) separation distance R between the adjacent common electrode and the pixel electrode is longer than the shortest separation distance G between the alignment layers (or substrates). The surface of the pixel electrode is preferably covered with a protective insulating film and an alignment film layer. A storage capacitor (not shown) for storing a display signal supplied through the data wiring 24 may be provided in an area surrounded by the plurality of gate bus lines 25 and the plurality of data bus lines 26. . The shape of the notch is not particularly limited, and is not limited to the substantially rectangular shape shown in FIG. 4, and a notch having a known shape such as an ellipse, a circle, a rectangle, a rhombus, a triangle, or a parallelogram. Can be used. With the arrangement of the notches as shown in FIG. 4, since the directions of the notches are provided line-symmetrically, multi-domain orientation control can be performed.
 図5は、図3とは別の実施形態の液晶表示素子の断面図であり、図2におけるIII-III線方向と同一の位置で図1に示す液晶表示素子を切断した断面図の他の例である。配向層4および薄膜トランジスタを含む電極層3が表面に形成された第一の基板2と、配向層4が表面に形成された第二の基板8とが所定の間隔Gで配向層同士向かい合うよう離間しており、この空間に液晶組成物を含む液晶層5が充填されている。第一の基板2の表面の一部にゲート絶縁膜12、共通電極22、絶縁膜18、画素電極21および配向層4の順で積層されている。 5 is a cross-sectional view of a liquid crystal display element according to an embodiment different from that of FIG. 3. FIG. 5 is another cross-sectional view of the liquid crystal display element shown in FIG. 1 taken along the line III-III in FIG. It is an example. The first substrate 2 on which the alignment layer 4 and the electrode layer 3 including the thin film transistor are formed on the surface, and the second substrate 8 on which the alignment layer 4 is formed on the surface are separated so that the alignment layers face each other at a predetermined interval G. This space is filled with a liquid crystal layer 5 containing a liquid crystal composition. The gate insulating film 12, the common electrode 22, the insulating film 18, the pixel electrode 21, and the alignment layer 4 are stacked in this order on part of the surface of the first substrate 2.
 また、図5に示す例では、櫛形あるいはスリットを有する共通電極22を用いており、画素電極21と共通電極22との電極間距離Rが0でない条件である。さらに、図3では共通電極22がゲート絶縁膜12上に形成されている例が示されていたが、図5に示されるように、共通電極22を第一の基板2上に形成して、ゲート絶縁膜12を介して画素電極21を設けるようにしてもよい。画素電極21の電極幅:l、共通電極22の電極幅:n、及び、電極間距離:Rは、発生する電界により液晶層5内の液晶分子が全て駆動され得る程度の幅に適宜調整することが好ましい。また、本発明に係る液晶表示素子好ましい一形態は、電極間距離:Rが、基板同士の最短離間距離Gより長いことが好ましい(すなわち、G<α)。図5では、画素電極21が共通電極22より液晶層側に設けているが、画素電極21と共通電極22とを同一の厚み方向の高さに設けてもよく、または共通電極22が画素電極21より液晶層側に設ける構造であってもよい。画素電極21と共通電極22とを同一の厚み方向の高さに設けた実施形態としては図6の(A)のように、画素電極21と共通電極22とを同一基板上に遊嵌して設ける構造が挙げられる。本明細書では、画素電極21と共通電極22との電極間距離の水平成分Rが基板間距離Gよりも長いと、IPS方式の液晶表示素子とし、前記Rが前記Gよりも短いとFFS方式の液晶表示素子と称ししている。 Further, in the example shown in FIG. 5, the common electrode 22 having a comb shape or a slit is used, and the inter-electrode distance R between the pixel electrode 21 and the common electrode 22 is not zero. Further, FIG. 3 shows an example in which the common electrode 22 is formed on the gate insulating film 12. However, as shown in FIG. 5, the common electrode 22 is formed on the first substrate 2. The pixel electrode 21 may be provided via the gate insulating film 12. The electrode width of the pixel electrode 21: l, the electrode width of the common electrode 22: n, and the interelectrode distance: R are appropriately adjusted to such a width that all liquid crystal molecules in the liquid crystal layer 5 can be driven by the generated electric field. It is preferable. In a preferred embodiment of the liquid crystal display element according to the present invention, the interelectrode distance R is preferably longer than the shortest separation distance G between the substrates (that is, G <α). In FIG. 5, the pixel electrode 21 is provided on the liquid crystal layer side with respect to the common electrode 22, but the pixel electrode 21 and the common electrode 22 may be provided at the same height in the thickness direction, or the common electrode 22 is the pixel electrode. 21 may be provided on the liquid crystal layer side. As an embodiment in which the pixel electrode 21 and the common electrode 22 are provided at the same height in the thickness direction, as shown in FIG. 6A, the pixel electrode 21 and the common electrode 22 are loosely fitted on the same substrate. The structure to provide is mentioned. In this specification, when the horizontal component R of the interelectrode distance between the pixel electrode 21 and the common electrode 22 is longer than the inter-substrate distance G, an IPS mode liquid crystal display element is obtained, and when the R is shorter than the G, the FFS mode. It is called a liquid crystal display element.
 例えば、図1、4および5に示すように共通電極および画素電極が第一の基板上に形成されていることが好ましい。共通電極および画素電極が同一基板上に形成されていると、両者の電極間に基板に対して略平行な電界が生じる。 For example, it is preferable that the common electrode and the pixel electrode are formed on the first substrate as shown in FIGS. When the common electrode and the pixel electrode are formed on the same substrate, an electric field substantially parallel to the substrate is generated between the electrodes.
 本発明に係る液晶表示素子は、基板に対して水平電界を利用するIPS方式の液晶表示組成であることが好ましく、共通電極22と前記共通電極22に隣接する画素電極21との離間距離の基板に対して水平成分Rが、基板同士(基板間距離)の最短離間距離Dより長いと、共通電極と画素電極との間に水平電界が形成され、電圧の有無により液晶分子を面内方向にスイッチングできる。本発明の好ましい形態のようなIPS方式の液晶表示素子の場合、長軸方向が、配向層の配向方向と平行になるように配置している液晶分子に電圧を印加すると、画素電極21と共通電極22との間に基板に対して水平電界の等電位線が形成され、液晶層5内の液晶分子の長軸が形成された電界に沿って配列する。特に、本発明に係る液晶組成物は正の誘電率異方性を有する液晶分子を用いるため、液晶分子の長軸方向が、発生した電界方向に沿って配列する。 The liquid crystal display element according to the present invention preferably has an IPS-type liquid crystal display composition using a horizontal electric field with respect to the substrate, and the substrate having a separation distance between the common electrode 22 and the pixel electrode 21 adjacent to the common electrode 22. If the horizontal component R is longer than the shortest separation distance D between the substrates (distance between the substrates), a horizontal electric field is formed between the common electrode and the pixel electrode, and the liquid crystal molecules are moved in the in-plane direction depending on the presence or absence of voltage. Switching is possible. In the case of the IPS mode liquid crystal display element as in the preferred embodiment of the present invention, when a voltage is applied to the liquid crystal molecules arranged so that the long axis direction is parallel to the alignment direction of the alignment layer, the pixel electrode 21 is shared. An equipotential line of a horizontal electric field is formed between the electrode 22 and the substrate, and is arranged along the electric field in which the major axis of the liquid crystal molecules in the liquid crystal layer 5 is formed. In particular, since the liquid crystal composition according to the present invention uses liquid crystal molecules having positive dielectric anisotropy, the major axis direction of the liquid crystal molecules is aligned along the generated electric field direction.
 本発明に係るIPSモードの液晶表示素子は、特定の液晶組成物と特定の光配向膜とを用いているため、高速応答と表示不良の抑制を両立させることができる。 Since the IPS mode liquid crystal display element according to the present invention uses a specific liquid crystal composition and a specific photo-alignment film, it is possible to achieve both high-speed response and suppression of display defects.
 また、IPSモードやFFSモード等の水平配向方式の液晶表示素子は、第一の基板2と第二の基板7との間に液晶層5を注入する際、例えば、真空注入法又は滴下注入(ODF:One Drop Fill)法等の方法が行われるが、本願発明においては、ODF法において、液晶組成物を基板に滴下した際の滴下痕の発生を抑えることができる。なお、滴下痕とは、液晶組成物を滴下した痕が白く浮かび上がる現象と定義する。 In addition, when a liquid crystal layer 5 is injected between the first substrate 2 and the second substrate 7 in a horizontal alignment type liquid crystal display element such as an IPS mode or an FFS mode, for example, a vacuum injection method or a drop injection ( A method such as an ODF (One Drop Fill) method is performed, but in the present invention, in the ODF method, it is possible to suppress the occurrence of a drop mark when the liquid crystal composition is dropped onto a substrate. In addition, a dripping mark is defined as a phenomenon in which a mark on which a liquid crystal composition has been dropped floats white.
 滴下痕の発生は、注入される液晶材料に大きな影響を受けるものであるが、さらに、表示素子の構成によってもその影響は避けられない。水平配向方式の液晶表示素子においては、表示素子中に形成される薄膜トランジスタ、及び、櫛形やスリットを有する画素電極21等は、薄い配向膜4、あるいは薄い配向膜4と薄い絶縁保護層18等しか液晶組成物を隔てる部材が無いことから、イオン性物質を遮断しきれない可能性が高く、電極を構成する金属材料と液晶組成物の相互作用による滴下痕の発生を避けることができなかったが、水平配向方式の液晶表示素子において本願発明の液晶組成物および光配向膜を組み合わせて用いることにより、効果的に滴下痕の発生が抑えられる。 The occurrence of dripping marks is greatly affected by the liquid crystal material to be injected, but the influence is unavoidable depending on the configuration of the display element. In the horizontal alignment type liquid crystal display element, the thin film transistor formed in the display element, the pixel electrode 21 having a comb shape or a slit, and the like are only the thin alignment film 4 or the thin alignment film 4 and the thin insulating protective layer 18. Since there is no member that separates the liquid crystal composition, there is a high possibility that the ionic substance cannot be completely blocked, and it was impossible to avoid the formation of dripping marks due to the interaction between the metal material constituting the electrode and the liquid crystal composition. By using a combination of the liquid crystal composition of the present invention and the photo-alignment film in a horizontal alignment type liquid crystal display element, generation of dripping marks can be effectively suppressed.
 また、ODF法による液晶表示素子の製造工程においては、液晶表示素子のサイズに応じて最適な液晶注入量を滴下する必要があるが、本願発明の液晶組成物は、例えば、液晶滴下時に生じる滴下装置内の急激な圧力変化や衝撃に対する影響が少なく、長時間にわたって安定的に液晶を滴下し続けることが可能であるため、液晶表示素子の歩留まりを高く保持することもできる。特に、最近流行しているスマートフォンに多用される小型液晶表示素子は、最適な液晶注入量が少ないために最適値からのずれを一定範囲内に制御すること自体が難しいが、本願発明の液晶組成物を用いることにより、小型液晶表示素子においても安定した液晶材料の吐出量を実現できる。 Moreover, in the manufacturing process of the liquid crystal display element by the ODF method, it is necessary to drop an optimal liquid crystal injection amount according to the size of the liquid crystal display element. The liquid crystal display element can be kept at a high yield because liquid crystal can be stably dropped over a long period of time with little influence on abrupt pressure change or impact in the apparatus. In particular, small liquid crystal display elements that are frequently used in smartphones that have been popular recently are difficult to control the deviation from the optimal value within a certain range because the optimal liquid crystal injection amount is small. By using an object, a stable discharge amount of a liquid crystal material can be realized even in a small liquid crystal display element.
 本発明に係る液晶表示素子の他の構成要素である液晶層および光配向膜層について以下詳説する。 The liquid crystal layer and the photo-alignment film layer, which are other components of the liquid crystal display element according to the present invention, will be described in detail below.
 (液晶層)
 本発明に係る液晶層は、液晶組成物を含む層であり、液晶組成物から構成されていることが好ましい。当該液晶組成物は、水平配向方式、例えばFFSモードおよび/またはIPSモードの液晶表示素子に適用されることが好ましい。本発明に係る液晶組成物には重合性モノマーを添加してもよい。そのため、本発明に係る液晶層は、液晶組成物中に含まれる重合性モノマーがポリマー化した状態であることが好ましい。後述するが、これにより配向規制力を高めることができる。
(Liquid crystal layer)
The liquid crystal layer according to the present invention is a layer containing a liquid crystal composition, and is preferably composed of a liquid crystal composition. The liquid crystal composition is preferably applied to a liquid crystal display element of a horizontal alignment method, for example, an FFS mode and / or an IPS mode. A polymerizable monomer may be added to the liquid crystal composition according to the present invention. Therefore, the liquid crystal layer according to the present invention is preferably in a state in which the polymerizable monomer contained in the liquid crystal composition is polymerized. As will be described later, this can increase the alignment regulating force.
 本発明における液晶組成物は、第一成分として一般式(i)で表される化合物および第二成分として一般式(J)で表される化合物からなる群から選択される1種または2種以上の化合物を含有する誘電率異方性の値が正の液晶組成物であり、一般式(i)で表される化合物を1種または2種以上と第二成分として一般式(J)で表される化合物を1種または2種以上とを含むことが好ましい。 The liquid crystal composition in the present invention is one or more selected from the group consisting of a compound represented by the general formula (i) as the first component and a compound represented by the general formula (J) as the second component. A liquid crystal composition having a positive dielectric anisotropy value containing a compound of formula (i) and represented by formula (J) as a second component of one or more compounds represented by formula (i) It is preferable that 1 type or 2 types or more are included.
 本発明の組成物の総量に対しての一般式(i)で表される化合物および一般式(J)で表される化合物の好ましい含有量の下限値は、10%であり、15%であり、20%であり、25%であり、30%であり、35%であり、40%であり、50%であり、55%であり、60%であり、65%であり、70%であり、75%であり、80%である。好ましい含有量の上限値は、97%であり、95%であり、85%であり、75%であり、65%であり、55%であり、45%であり、35%であり、30%であり、25%であり、20%である。 The lower limit of the preferable content of the compound represented by the general formula (i) and the compound represented by the general formula (J) with respect to the total amount of the composition of the present invention is 10% and 15%. 20%, 25%, 30%, 35%, 40%, 50%, 55%, 60%, 65%, 70% 75% and 80%. The upper limit of the preferable content is 97%, 95%, 85%, 75%, 65%, 55%, 45%, 35%, 30% 25% and 20%.
 本発明に係る液晶組成物の好ましい物性値は、Δεは1.5~12、Δnは0.08~0.20であることが好ましい。 Preferred physical property values of the liquid crystal composition according to the present invention are preferably that Δε is 1.5 to 12, and Δn is 0.08 to 0.20.
 以下本発明に係る液晶組成物に含まれる成分(第一成分、第二成分、その他任意成分)毎について説明する。 Hereinafter, each component (first component, second component, and other optional components) contained in the liquid crystal composition according to the present invention will be described.
 上記一般式(i)において、ni1が、2~4の整数の場合、環Ai1はそれぞれ同一であっても異なってもよい。また、環Ai1はΔnを大きくすることが求められる場合には芳香族であることが好ましく、応答速度を改善するためには脂肪族であることが好ましく、環Ai1はそれぞれ独立して、トランス-1,4-シクロへキシレン基、1,3-ジオキサン-2,5-ジイル基、テトラヒドロピラン-2,5-ジイル基、1,4-フェニレン基、2-フルオロ-1,4-フェニレン基、3-フルオロ-1,4-フェニレン基、3,5-ジフルオロ-1,4-フェニレン基、1,4-シクロヘキセニレン基、1,4-ビシクロ[2.2.2]オクチレン基、ピペリジン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基を表すことが好ましく、下記の構造を表すことがより好ましく、 In the general formula (i), when n i1 is an integer of 2 to 4, the rings A i1 may be the same or different. Ring A i1 is preferably aromatic when it is required to increase Δn, and is preferably aliphatic for improving the response speed. Each ring A i1 is independently Trans-1,4-cyclohexylene group, 1,3-dioxane-2,5-diyl group, tetrahydropyran-2,5-diyl group, 1,4-phenylene group, 2-fluoro-1,4-phenylene Group, 3-fluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, Represents a piperidine-1,4-diyl group, a naphthalene-2,6-diyl group, a decahydronaphthalene-2,6-diyl group or a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group Like More preferably represents the following structure:
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
トランス-1,4-シクロへキシレン基又は1,4-フェニレン基を表すことがさらに好ましい。 More preferably, it represents a trans-1,4-cyclohexylene group or a 1,4-phenylene group.
 上記一般式(i)において、Zi1は単結合がより好ましい。また、ni1は、2、3又は4であることが好ましい。好ましい条件の場合は、ZMi1が複数存在するため、それらは同一であっても異なっていても良い。 In the general formula (i), Z i1 is more preferably a single bond. N i1 is preferably 2, 3 or 4. In the case of preferable conditions, since there are a plurality of Z Mi1 , they may be the same or different.
 信頼性を重視する場合にはRi1及びRi2はともにアルキル基であることが好ましく、化合物の揮発性を低減させることを重視する場合にはアルコキシ基であることが好ましく、粘性の低下を重視する場合には少なくとも一方はアルケニル基であることが好ましい。 When importance is attached to reliability, both R i1 and R i2 are preferably alkyl groups, and when importance is placed on reducing the volatility of the compound, it is preferably an alkoxy group, and importance is placed on lowering viscosity. In this case, at least one is preferably an alkenyl group.
 Ri1及びRi2は、それが結合する環構造がフェニル基(芳香族)である場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基または炭素原子数4~5のアルケニル基が好ましく、それが結合する環構造がシクロヘキサンなどの飽和した環構造の場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。ネマチック相を安定化させるためには炭素原子及び存在する場合酸素原子の合計が5以下であることが好ましく、直鎖状であることが好ましい。 R i1 and R i2 are each a straight-chain alkyl group having 1 to 5 carbon atoms or a straight-chain carbon atom having 1 to 4 carbon atoms when the ring structure to which R i1 is bonded is a phenyl group (aromatic). When the ring structure to which the alkoxy group is bonded is a saturated ring structure such as cyclohexane, a straight-chain alkyl group having 1 to 5 carbon atoms, A linear alkoxy group having 1 to 4 carbon atoms and a straight chain alkenyl group having 2 to 5 carbon atoms are preferred. In order to stabilize the nematic phase, the total of carbon atoms and oxygen atoms, if present, is preferably 5 or less, and is preferably linear.
 また、本発明に係るアルキル基、アルケニル基およびアルコキシ基はいずれも直鎖状または分岐状が好ましい。本発明に係るより好ましいアルケニル基としては、式(R1)から式(R5)のいずれかで表される基から選ばれることが好ましい。(各式中の黒点は環構造中の炭素原子を表す。) In addition, the alkyl group, alkenyl group and alkoxy group according to the present invention are all preferably linear or branched. A more preferable alkenyl group according to the present invention is preferably selected from groups represented by any one of the formulas (R1) to (R5). (The black dots in each formula represent carbon atoms in the ring structure.)
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
で表される。 It is represented by
 本発明の液晶組成物において、一般式(i)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the liquid crystal composition of the present invention, the content of the compound represented by the general formula (i) includes solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, and drop marks. Therefore, it is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
 本発明に係る液晶組成物における第一成分の一般式(i)で表される化合物の総量が多く含んでいると、極性の低い、すなわち減粘効果の高い成分を十分に含むという理由で高速応答性を確保することができる。また、本発明の組成物の総量に対しての式(i)で表される化合物の好ましい含有量の下限値は、1%であり、10%であり、15%であり、20%であり、25%であり、30%であり、35%であり、40%であり、50%であり、55%であり、60%であり、65%であり、70%であり、75%であり、80%である。好ましい含有量の上限値は、95%であり、85%であり、75%であり、65%であり、55%であり、45%であり、35%であり、30%であり、25%である。 When the total amount of the compound represented by the general formula (i) of the first component in the liquid crystal composition according to the present invention is large, it is high speed because it sufficiently includes a component having low polarity, that is, a high viscosity reducing effect. Responsiveness can be ensured. Moreover, the lower limit of the preferable content of the compound represented by the formula (i) with respect to the total amount of the composition of the present invention is 1%, 10%, 15%, and 20%. , 25%, 30%, 35%, 40%, 50%, 55%, 60%, 65%, 70%, 75% 80%. The upper limit of the preferred content is 95%, 85%, 75%, 65%, 55%, 45%, 35%, 30%, 25% It is.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値が高く上限値が高いことが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値が高く上限値が高いことが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を低く上限値が低いことが好ましい。 When the viscosity of the composition of the present invention is kept low and a composition having a high response speed is required, the above lower limit value is preferably high and the upper limit value is preferably high. Furthermore, when the composition of the present invention maintains a high Tni and requires a composition having good temperature stability, the above lower limit value is preferably high and the upper limit value is preferably high. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the above lower limit value is lowered and the upper limit value is low.
 前記一般式(i)で表される化合物を1種以上含有し、第二成分の一般式(M)で表される化合物に対して5~20倍含まれていることが好ましい。第一成分として一般式(i)で表される化合物により高速応答性などの効果を奏する。 It is preferable that one or more compounds represented by the general formula (i) are contained and contained in an amount 5 to 20 times the compound represented by the general formula (M) of the second component. The compound represented by the general formula (i) as the first component has effects such as high-speed response.
 本発明に係る液晶組成物は、一般式(i)で表される化合物を1種類以上含有することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、粘性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて適宜組み合わせて使用する。ただし、当該一般式(i)で表される化合物は減粘作用を奏する化合物を含むことが好ましい。また、第一成分である一般式(i)で表される化合物として使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類である。あるいは本発明の別の実施形態では2種類である。また、本発明の別の実施形態では3種類である。さらに、本発明の別の実施形態では4種類である。さらに、本発明の別の実施形態では5種類である。さらに、本発明の別の実施形態では6種類である。さらに、本発明の別の実施形態では7種類である。さらに、本発明の別の実施形態では8種類である。さらに、本発明の別の実施形態では9種類である。さらに、本発明の別の実施形態では10種類以上である。 The liquid crystal composition according to the present invention can also contain one or more compounds represented by the general formula (i). There are no particular limitations on the types of compounds that can be combined, but they are used in appropriate combinations according to desired performance such as solubility at low temperatures, viscosity, transition temperature, electrical reliability, and refractive index anisotropy. However, it is preferable that the compound represented by the general formula (i) includes a compound having a viscosity reducing action. Moreover, the kind of compound used as a compound represented with general formula (i) which is a 1st component is one kind as one embodiment of this invention, for example. Or in another embodiment of the present invention, there are two types. In another embodiment of the present invention, there are three types. Furthermore, in another embodiment of this invention, they are four types. Furthermore, in another embodiment of this invention, they are five types. Furthermore, in another embodiment of the present invention, there are six types. Furthermore, in another embodiment of the present invention, there are seven types. Furthermore, in another embodiment of this invention, they are eight types. Furthermore, in another embodiment of the present invention, there are nine types. Furthermore, in another embodiment of this invention, it is ten or more types.
 本発明に係る一般式(i)で表される化合物は、液晶組成物の化学的な安定性が求められる場合には塩素原子をその分子内に有さないことが好ましい。 The compound represented by the general formula (i) according to the present invention preferably has no chlorine atom in the molecule when chemical stability of the liquid crystal composition is required.
 一般式(i)で表される化合物は一般式(i-1)~(i-7)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (i) is preferably a compound selected from the group of compounds represented by the general formulas (i-1) to (i-7).
 一般式(i-1)で表される化合物は下記の化合物である。 The compound represented by the general formula (i-1) is the following compound.
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
(式中、Ri11及びRi12はそれぞれ独立して、一般式(i)におけるRi1及びRi2と同じ意味を表す。)
 Ri11及びRi12は、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。
(In the formula, R i11 and R i12 each independently represent the same meaning as R i1 and R i2 in the general formula (i).)
R i11 and R i12 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
 一般式(i-1)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (i-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 好ましい含有量の下限値は、本発明の組成物の総量に対して、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、15%であり、20%であり、25%であり、30%であり、35%であり、40%であり、45%であり、50%であり、55%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、95%であり、93%であり、90%であり、87%であり、85%であり、82%であり、80%であり、77%であり、75%であり、73%であり、70%であり、67%であり、65%であり、63%であり、60%であり、57%であり、55%であり、52%であり、50%であり、47%であり、45%であり、43%であり、40%であり、35%であり、30%であり、25%である。 The lower limit of the preferable content is 1%, 2%, 3%, 5%, 7%, 10%, and 15% with respect to the total amount of the composition of the present invention. %, 20%, 25%, 30%, 35%, 40%, 45%, 50%, and 55%. The upper limit of the preferable content is 95%, 93%, 90%, 87%, 85%, 82%, and 80% with respect to the total amount of the composition of the present invention. %, 77%, 75%, 73%, 70%, 67%, 65%, 63%, 60%, 57%, 55% %, 52%, 50%, 47%, 45%, 43%, 40%, 35%, 30%, 25%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値が高く上限値が高いことが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値が中庸で上限値が中庸であることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値が低く上限値が低いことが好ましい。 When the viscosity of the composition of the present invention is kept low and a composition having a high response speed is required, the above lower limit value is preferably high and the upper limit value is preferably high. Furthermore, when the composition of the present invention requires a high Tni and a composition having good temperature stability, it is preferable that the lower limit value is moderate and the upper limit value is moderate. When it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable that the lower limit value is low and the upper limit value is low.
 一般式(i-1)で表される化合物は一般式(i-1-1)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (i-1) is preferably a compound selected from the group of compounds represented by the general formula (i-1-1).
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
(式中Ri12は一般式(i-1)における意味と同じ意味を表す。)
 一般式(i-1-1)で表される化合物は、式(i-1-1.1)から式(i-1-1.3)で表される化合物群から選ばれる化合物であることが好ましく、式(i-1-1.2)又は式(i-1-1.3)で表される化合物であることが好ましく、特に、式(i-1-1.3)で表される化合物であることが好ましい。
( Wherein R i12 represents the same meaning as in general formula (i-1).)
The compound represented by the general formula (i-1-1) is a compound selected from the group of compounds represented by the formula (i-1-1.1) to the formula (i-1-1.3). And is preferably a compound represented by formula (i-1-1.2) or formula (i-1-1.3), and particularly represented by formula (i-1-1.3). It is preferable that it is a compound.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
 本発明の組成物の総量に対しての式(i-1-1.3)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The lower limit of the preferable content of the compound represented by the formula (i-1-1.3) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, and 10%. The upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
 一般式(i-1)で表される化合物は一般式(i-1-2)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (i-1) is preferably a compound selected from the group of compounds represented by the general formula (i-1-2).
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
(式中Ri12は一般式(i-1)における意味と同じ意味を表す。)
 本発明の組成物の総量に対しての式(i-1-2)で表される化合物の好ましい含有量の下限値は、1%であり、5%であり、10%であり、15%であり、17%であり、20%であり、23%であり、25%であり、27%であり、30%であり、35%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、60%であり、55%であり、50%であり、45%であり、42%であり、40%であり、38%であり、35%であり、33%であり、30%である。
( Wherein R i12 represents the same meaning as in general formula (i-1).)
The lower limit of the preferable content of the compound represented by the formula (i-1-2) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 15% 17%, 20%, 23%, 25%, 27%, 30%, 35%. The upper limit of the preferable content is 60%, 55%, 50%, 45%, 42%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 33%, and 30%.
 さらに、一般式(i-1-2)で表される化合物は、式(i-1-2.1)から式(i-1-2.4)で表される化合物群から選ばれる化合物であることが好ましく、式(i-1-2.2)から式(i-1-2.4)で表される化合物であることが好ましい。特に、式(i-1-2.2)で表される化合物は本発明の組成物の応答速度を特に改善するため好ましい。また、応答速度よりも高いTniを求めるときは、式(i-1-2.3)又は式(i-1-2.4)で表される化合物を用いることが好ましい。式(i-1-2.3)及び式(i-1-2.4)で表される化合物の含有量は、低温での溶解度を良くするために30%以上にすることは好ましくない。 Further, the compound represented by the general formula (i-1-2) is a compound selected from the group of compounds represented by the formula (i-1-2.1) to the formula (i-1-2.4). Preferably, it is a compound represented by the formula (i-1-2.2) to the formula (i-1-2.4). In particular, the compound represented by the formula (i-1-2.2) is preferable because the response speed of the composition of the present invention is particularly improved. When obtaining Tni higher than the response speed, it is preferable to use a compound represented by the formula (i-1-2.3) or the formula (i-1-2.4). The content of the compounds represented by the formulas (i-1-2.3) and (i-1-2.4) is preferably not more than 30% in order to improve the solubility at low temperatures.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 本発明の組成物の総量に対しての式(i-1-2.2)で表される化合物の好ましい含有量の下限値は、10%であり、15%であり、18%であり、20%であり、23%であり、25%であり、27%であり、30%であり、33%であり、35%であり、38%であり、40%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、60%であり、55%であり、50%であり、45%であり、43%であり、40%であり、38%であり、35%であり、32%であり、30%であり、27%であり、25%であり、22%である。 The lower limit of the preferable content of the compound represented by the formula (i-1-2.2) with respect to the total amount of the composition of the present invention is 10%, 15%, 18%, 20%, 23%, 25%, 27%, 30%, 33%, 35%, 38%, and 40%. The upper limit of the preferable content is 60%, 55%, 50%, 45%, 43%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 32%, 30%, 27%, 25%, and 22%.
 本発明の組成物の総量に対しての式(i-1-1.3)で表される化合物及び式(i-1-2.2)で表される化合物の合計の好ましい含有量の下限値は、10%であり、15%であり、20%であり、25%であり、27%であり、30%であり、35%であり、40%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、60%であり、55%であり、50%であり、45%であり、43%であり、40%であり、38%であり、35%であり、32%であり、30%であり、27%であり、25%であり、22%である。 The lower limit of the preferable total content of the compound represented by formula (i-1-1.3) and the compound represented by formula (i-1-2.2) relative to the total amount of the composition of the present invention The values are 10%, 15%, 20%, 25%, 27%, 30%, 35% and 40%. The upper limit of the preferable content is 60%, 55%, 50%, 45%, 43%, 40%, and 38% with respect to the total amount of the composition of the present invention. %, 35%, 32%, 30%, 27%, 25%, and 22%.
 一般式(i-1)で表される化合物は一般式(i-1-3)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (i-1) is preferably a compound selected from the group of compounds represented by the general formula (i-1-3).
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
(式中Ri13及びRi14はそれぞれ独立して炭素原子数1~8のアルキル基又は炭素原子数1~8のアルコキシ基を表す。)
 Ri13及びRi14は、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。
(In the formula, R i13 and R i14 each independently represent an alkyl group having 1 to 8 carbon atoms or an alkoxy group having 1 to 8 carbon atoms.)
R i13 and R i14 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
 本発明の組成物の総量に対しての式(i-1-3)で表される化合物の好ましい含有量の下限値は、1%であり、5%であり、10%であり、13%であり、15%であり、17%であり、20%であり、23%であり、25%であり、30%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、60%であり、55%であり、50%であり、45%であり、40%であり、37%であり、35%であり、33%であり、30%であり、27%であり、25%であり、23%であり、20%であり、17%であり、15%であり、13%であり、10%である。
さらに、一般式(i-1-3)で表される化合物は、式(i-1-3.1)から式(i-1-3.12)で表される化合物群から選ばれる化合物であることが好ましく、式(i-1-3.1)、式(i-1-3.3)又は式(i-1-3.4)で表される化合物であることが好ましい。特に、式(i-1-3.1)で表される化合物は本発明の組成物の応答速度を特に改善するため好ましい。また、応答速度よりも高いTniを求めるときは、式(i-1-3.3)、式(i-1-3.4)、式(i-1-3.11)及び式(i-1-3.12)で表される化合物を用いることが好ましい。式(i-1-3.3)、式(i-1-3.4)、式(i-1-3.11)及び式(i-1-3.12)で表される化合物の合計の含有量は、低温での溶解度を良くするために20%以上にすることは好ましくない。
The lower limit of the preferable content of the compound represented by the formula (i-1-3) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%, 23%, 25%, 30%. The upper limit of the preferable content is 60%, 55%, 50%, 45%, 40%, 37%, and 35% with respect to the total amount of the composition of the present invention. %, 33%, 30%, 27%, 25%, 23%, 23%, 20%, 17%, 15%, 13%, 10% %.
Further, the compound represented by the general formula (i-1-3) is a compound selected from the group of compounds represented by the formula (i-1-3.1) to the formula (i-1-3.12). Preferably, it is a compound represented by formula (i-1-3.1), formula (i-1-3.3) or formula (i-1-3.4). In particular, the compound represented by the formula (i-1-3.1) is preferable because the response speed of the composition of the present invention is particularly improved. Further, when obtaining Tni higher than the response speed, the equation (i-1-3.3), the equation (i-1-3.4), the equation (i-1-3.11), and the equation (i- It is preferable to use a compound represented by 1-3.12). Sum of compounds represented by formula (i-1-3.3), formula (i-1-3.4), formula (i-1-3.11) and formula (i-1-3.12) The content of is not preferably 20% or more in order to improve the solubility at low temperatures.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 本発明の組成物の総量に対しての式(i-1-3.1)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、17%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%である。 The lower limit of the preferred content of the compound represented by formula (i-1-3.1) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferable content is 20%, 17%, 15%, 13%, 10%, 8%, and 7% with respect to the total amount of the composition of the present invention. % And 6%.
 一般式(i-1)で表される化合物は一般式(i-1-4)及び/又は(i-1-5)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (i-1) is preferably a compound selected from the group of compounds represented by the general formula (i-1-4) and / or (i-1-5).
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
(式中Ri15及びRi16はそれぞれ独立して炭素原子数1~8のアルキル基又は炭素原子数1~8のアルコキシ基を表す。)
 Ri15及びRi16は、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。
(In the formula, R i15 and R i16 each independently represents an alkyl group having 1 to 8 carbon atoms or an alkoxy group having 1 to 8 carbon atoms.)
R i15 and R i16 are preferably a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms, and a linear alkenyl group having 2 to 5 carbon atoms. .
 本発明の組成物の総量に対しての式(i-1-4)で表される化合物の好ましい含有量の下限値は、1%であり、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、25%であり、23%であり、20%であり、17%であり、15%であり、13%であり、10%である。 The lower limit of the preferred content of the compound represented by formula (i-1-4) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%. The upper limit of the preferable content is 25%, 23%, 20%, 17%, 15%, 13%, and 10% with respect to the total amount of the composition of the present invention. %.
 本発明の組成物の総量に対しての式(i-1-5)で表される化合物の好ましい含有量の下限値は、1%であり、5%であり、10%であり、13%であり、15%であり、17%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、25%であり、23%であり、20%であり、17%であり、15%であり、13%であり、10%である。 The lower limit of the preferable content of the compound represented by the formula (i-1-5) with respect to the total amount of the composition of the present invention is 1%, 5%, 10%, 13% 15%, 17%, 20%. The upper limit of the preferable content is 25%, 23%, 20%, 17%, 15%, 13%, and 10% with respect to the total amount of the composition of the present invention. %.
 さらに、一般式(i-1-4)及び(i-1-5)で表される化合物は、式(i-1-4.1)から式(i-1-5.3)で表される化合物群から選ばれる化合物であることが好ましく、式(i-1-4.2)又は式(i-1-5.2)で表される化合物であることが好ましい。 Furthermore, the compounds represented by the general formulas (i-1-4) and (i-1-5) are represented by the formulas (i-1-4.1) to (i-1-5.3). Are preferably selected from the group of compounds represented by formula (i-1-4.2) or (i-1-5.2).
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 本発明の組成物の総量に対しての式(i-1-4.2)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、17%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%である。 The lower limit of the preferable content of the compound represented by the formula (i-1-4.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferable content is 20%, 17%, 15%, 13%, 10%, 8%, and 7% with respect to the total amount of the composition of the present invention. % And 6%.
 式(i-1-1.3)、式(i-1-2.2)、式(i-1-3.1)、式(i-1-3.3)、式(i-1-3.4)、式(i-1-3.11)及び式(i-1-3.12)で表される化合物から選ばれる2種以上の化合物を組み合わせることが好ましく、式(i-1-1.3)、式(i-1-2.2)、式(i-1-3.1)、式(i-1-3.3)、式(i-1-3.4)及び式(i-1-4.2)で表される化合物から選ばれる2種以上の化合物を組み合わせることが好ましく、これら化合物の合計の含有量の好ましい含有量の下限値は、本発明の組成物の総量に対して、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、13%であり、15%であり、18%であり、20%であり、23%であり、25%であり、27%であり、30%であり、33%であり、35%であり、上限値は、本発明の組成物の総量に対して、80%であり、70%であり、60%であり、50%であり、45%であり、40%であり、37%であり、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%である。組成物の信頼性を重視する場合には、式(i-1-3.1)、式(i-1-3.3)及び式(i-1-3.4))で表される化合物から選ばれる2種以上の化合物を組み合わせることが好ましく、組成物の応答速度を重視する場合には、式(i-1-1.3)、式(i-1-2.2)で表される化合物から選ばれる2種以上の化合物を組み合わせることが好ましい。 Formula (i-1-1.3), Formula (i-1-2.2), Formula (i-1-3.1), Formula (i-1-3.3), Formula (i-1- 3.4), it is preferable to combine two or more compounds selected from the compounds represented by formula (i-1-3.11) and formula (i-1-3.12). -1.3), formula (i-1-2.2), formula (i-1-3.1), formula (i-1-3.3), formula (i-1-3.4) and It is preferable to combine two or more compounds selected from the compounds represented by formula (i-1-4.2), and the lower limit of the preferable content of the total content of these compounds is the composition of the present invention. 1%, 2%, 3%, 5%, 7%, 10%, 13%, 15%, 18% of the total amount 20% and 23% 25%, 27%, 30%, 33%, 35%, and the upper limit is 80% and 70% with respect to the total amount of the composition of the present invention, 60%, 50%, 45%, 40%, 37%, 35%, 33%, 30%, 28%, 25%, 23% and 20%. When emphasizing the reliability of the composition, compounds represented by formula (i-1-3.1), formula (i-1-3.3) and formula (i-1-3.4)) It is preferable to combine two or more compounds selected from the group consisting of formulas (i-1-1.3) and (i-1-2.2) when the response speed of the composition is important. It is preferable to combine two or more compounds selected from the following compounds.
 一般式(i-2)で表される化合物は下記の化合物である。 The compound represented by the general formula (i-2) is the following compound.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
(式中、Ri21及びRi22はそれぞれ独立して、一般式(i)におけるRi1及びRi2と同じ意味を表す。)
 Ri21は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、Ri22は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましい。
(In the formula, R i21 and R i22 each independently represent the same meaning as R i1 and R i2 in formula (i)).
R i21 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and R i22 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom. An alkoxy group of 1 to 4 is preferable.
 一般式(i-1)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (i-1) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 低温での溶解性を重視する場合は含有量を多めに設定すると効果が高く、反対に、応答速度を重視する場合は含有量を少なめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 When emphasizing solubility at low temperatures, it is highly effective to set a large amount of content. Conversely, when emphasizing response speed, setting a small amount of content is highly effective. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 本発明の組成物の総量に対しての式(i-2)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The lower limit of the preferable content of the compound represented by the formula (i-2) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7% and 10%. The upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
 さらに、一般式(i-2)で表される化合物は、式(i-2.1)から式(i-2.6)で表される化合物群から選ばれる化合物であることが好ましく、式(i-2.1)、式(i-2.3)、式(i-2.4)及び式(i-2.6)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (i-2) is preferably a compound selected from the group of compounds represented by the formulas (i-2.1) to (i-2.6) A compound represented by formula (i-2.1), formula (i-2.3), formula (i-2.4) and formula (i-2.6) is preferable.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 一般式(i-3)で表される化合物は下記の化合物である。 The compound represented by the general formula (i-3) is the following compound.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
(式中、Ri31及びRi32はそれぞれ独立して、一般式(i)におけるRi1及びRi2と同じ意味を表す。)
 Ri31及びRi32はそれぞれ独立して炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましい。
(In the formula, R i31 and R i32 each independently represent the same meaning as R i1 and R i2 in the general formula (i).)
R i31 and R i32 are each independently preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms.
 一般式(i-3)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (i-3) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 本発明の組成物の総量に対しての式(i-3)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、20%であり、15%であり、13%であり、10%であり、8%であり、7%であり、6%であり、5%であり、3%である。 The lower limit of the preferred content of the compound represented by formula (i-3) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7% and 10%. The upper limit of the preferable content is 20%, 15%, 13%, 10%, 8%, 7%, and 6% with respect to the total amount of the composition of the present invention. %, 5%, 3%.
 高い屈折率異方性を得る場合は含有量を多めに設定すると効果が高く、反対に、高いTniを重視する場合は含有量を少なめに設定すると効果が高い。さらに、滴下痕や焼き付き特性を改良する場合は、含有量の範囲を中間に設定することが好ましい。 When obtaining a high refractive index anisotropy, the effect is high when the content is set to be large, and conversely, when high Tni is emphasized, the effect is high when the content is set low. Furthermore, when improving dripping marks and image sticking characteristics, it is preferable to set the content range in the middle.
 さらに、一般式(i-3)で表される化合物は、式(i-3.1)から式(i-3.4)で表される化合物群から選ばれる化合物であることが好ましく、式(i-3.2)から式(i-3.7)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (i-3) is preferably a compound selected from the group of compounds represented by the formulas (i-3.1) to (i-3.4) A compound represented by formula (i-3.2) to formula (i-3.7) is preferable.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 一般式(i-4)で表される化合物は下記の化合物である。 The compound represented by the general formula (i-4) is the following compound.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
(式中、Ri41及びRi42はそれぞれ独立して、一般式(i)におけるRi1及びRi2と同じ意味を表す。)
 Ri41は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、Ri42は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましい。)
 一般式(i-4)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。
(In the formula, R i41 and R i42 each independently represent the same meaning as R i1 and R i2 in formula (i)).
R i41 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and R i42 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom. An alkoxy group of 1 to 4 is preferable. )
The compound represented by the general formula (i-4) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 本発明の組成物において、一般式(i-4)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (i-4) is the solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dropping. It is necessary to adjust appropriately according to the required performance such as marks, image sticking, and dielectric anisotropy.
 本発明の組成物の総量に対しての式(i-4)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、14%であり、16%であり、20%であり、23%であり、26%であり、30%であり、35%であり、40%である。本発明の組成物の総量に対しての式(i-4)で表される化合物の好ましい含有量の上限値は、50%であり、40%であり、35%であり、30%であり、20%であり、15%であり、10%であり、5%である。 The lower limit of the preferred content of the compound represented by formula (i-4) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% . The upper limit of the preferable content of the compound represented by the formula (i-4) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, 30%. 20%, 15%, 10%, 5%.
 一般式(i-4)で表される化合物は、例えば式(i-4.1)から式(i-4.3)で表される化合物であることが好ましい。 The compound represented by the general formula (i-4) is preferably, for example, a compound represented by the formula (i-4.1) to the formula (i-4.3).
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
 低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて、式(i-4.1)で表される化合物を含有していても、式(i-4.2)で表される化合物を含有していても、式(i-4.1)で表される化合物と式(i-4.2)で表される化合物との両方を含有していても良いし、式(i-4.1)から式(i-4.3)で表される化合物を全て含んでいても良い。本発明の組成物の総量に対しての式(i-4.1)又は式(i-4.2)で表される化合物の好ましい含有量の下限値は、3%であり、5%であり、7%であり、9%であり、11%であり、12%であり、13%であり、18%であり、21%であり、好ましい上限値は、45であり、40%であり、35%であり、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 Depending on required performance such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, etc., even if it contains a compound represented by formula (i-4.1), Even if the compound represented by (i-4.2) is contained, both the compound represented by formula (i-4.1) and the compound represented by formula (i-4.2) It may be contained, or all the compounds represented by formulas (i-4.1) to (i-4.3) may be contained. The lower limit of the preferable content of the compound represented by formula (i-4.1) or formula (i-4.2) with respect to the total amount of the composition of the present invention is 3%, Yes, 7%, 9%, 11%, 12%, 13%, 18%, 21%, and the preferred upper limit is 45, 40% , 35%, 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% .
 式(i-4.1)で表される化合物と式(i-4.2)で表される化合物との両方を含有する場合は、本発明の組成物の総量に対しての両化合物の好ましい含有量の下限値は、15%であり、19%であり、24%であり、30%であり、好ましい上限値は、45であり、40%であり、35%であり、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 When both the compound represented by formula (i-4.1) and the compound represented by formula (i-4.2) are contained, the amount of both compounds relative to the total amount of the composition of the present invention is The lower limit of the preferred content is 15%, 19%, 24%, and 30%, and the preferred upper limit is 45, 40%, 35%, and 30%. Yes, 25%, 23%, 20%, 18%, 15%, 13%.
 一般式(i-4)で表される化合物は、例えば式(i-4.4)から式(i-4.6)で表される化合物であることが好ましく、式(i-4.4)で表される化合物であることが好ましい。 The compound represented by the general formula (i-4) is preferably, for example, a compound represented by the formula (i-4.4) to the formula (i-4.6). It is preferable that it is a compound represented by this.
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
 低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて、式(i-4.4)で表される化合物を含有していても、式(i-4.5)で表される化合物を含有していても、式(i-4.4)で表される化合物と式(i-4.5)で表される化合物との両方を含有していても良い。 Depending on required performance such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, etc., even if it contains a compound represented by formula (i-4.4), Even if the compound represented by (i-4.5) is contained, both the compound represented by formula (i-4.4) and the compound represented by formula (i-4.5) You may contain.
 本発明の組成物の総量に対しての式(i-4.4)又は式(i-4.5)で表される化合物の好ましい含有量の下限値は、3%であり、5%であり、7%であり、9%であり、11%であり、12%であり、13%であり、18%であり、21%である。好ましい上限値は、45であり、40%であり、35%であり、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 The lower limit of the preferable content of the compound represented by formula (i-4.4) or formula (i-4.5) with respect to the total amount of the composition of the present invention is 3%, Yes, 7%, 9%, 11%, 12%, 13%, 18%, 21%. Preferred upper limit values are 45, 40%, 35%, 30%, 25%, 23%, 20%, 18%, 15%, 13% %, 10%, and 8%.
 式(i-4.4)で表される化合物と式(i-4.5)で表される化合物との両方を含有する場合は、本発明の組成物の総量に対しての両化合物の好ましい含有量の下限値は、15%であり、19%であり、24%であり、30%であり、好ましい上限値は、45であり、40%であり、35%であり、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%である。 When both the compound represented by formula (i-4.4) and the compound represented by formula (i-4.5) are contained, the amount of both compounds relative to the total amount of the composition of the present invention The lower limit of the preferred content is 15%, 19%, 24%, and 30%, and the preferred upper limit is 45, 40%, 35%, and 30%. Yes, 25%, 23%, 20%, 18%, 15%, 13%.
 一般式(i-4)で表される化合物は、式(i-4.7)から式(i-4.10)で表される化合物であることが好ましく、特に、式(i-4.9)で表される化合物が好ましい。 The compound represented by the general formula (i-4) is preferably a compound represented by the formula (i-4.7) to the formula (i-4.10), and particularly the formula (i-4. The compound represented by 9) is preferred.
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 一般式(i-5)で表される化合物は下記の化合物である。 The compound represented by the general formula (i-5) is the following compound.
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
(式中、Ri51及びRi52はそれぞれ独立して、一般式(i)におけるRi1及びRi2と同じ意味を表す。)
 Ri51は炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、Ri52は炭素原子数1~5のアルキル基、炭素原子数4~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましい。
(In the formula, R i51 and R i52 each independently represent the same meaning as R i1 and R i2 in formula (i)).
R i51 is preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and R i52 is an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 4 to 5 carbon atoms, or a carbon atom. An alkoxy group of 1 to 4 is preferable.
 一般式(i-5)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (i-5) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 本発明の組成物において、一般式(i-5)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (i-5) is such that solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dropping It is necessary to adjust appropriately according to the required performance such as marks, image sticking, and dielectric anisotropy.
 本発明の組成物の総量に対しての式(i-5)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、14%であり、16%であり、20%であり、23%であり、26%であり、30%であり、35%であり、40%である。本発明の組成物の総量に対しての式(i-5)で表される化合物の好ましい含有量の上限値は、50%であり、40%であり、35%であり、30%であり、20%であり、15%であり、10%であり、5%である
 一般式(i-5)で表される化合物は、式(i-5.1)又は式(i-5.2)で表される化合物であることが好ましく、特に、式(i-5.1)で表される化合物であることが好ましい。
The lower limit of the preferable content of the compound represented by the formula (i-5) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% . The upper limit of the preferable content of the compound represented by the formula (i-5) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, 30%. , 20%, 15%, 10%, 5% The compound represented by the general formula (i-5) is represented by the formula (i-5.1) or the formula (i-5.2). The compound represented by formula (i-5.1) is particularly desirable.
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%である。これら化合物の好ましい含有量の上限値は、20%であり、15%であり、13%であり、10%であり、9%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%. The upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 一般式(i-5)で表される化合物は、式(i-5.3)又は式(i-5.4)で表される化合物であることが好ましい。 The compound represented by the general formula (i-5) is preferably a compound represented by the formula (i-5.3) or the formula (i-5.4).
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%である。これら化合物の好ましい含有量の上限値は、20%であり、15%であり、13%であり、10%であり、9%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%. The upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 一般式(i-5)で表される化合物は、式(i-5.5)から式(i-5.7)で表される化合物群から選ばれる化合物であることが好ましく、特に式(i-5.7)で表される化合物であることが好ましい。 The compound represented by the general formula (i-5) is preferably a compound selected from the group of compounds represented by the formulas (i-5.5) to (i-5.7). The compound represented by i-5.7) is preferable.
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%である。これら化合物の好ましい含有量の上限値は、20%であり、15%であり、13%であり、10%であり、9%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%. The upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 一般式(i-6)で表される化合物は下記の化合物である。 The compound represented by the general formula (i-6) is the following compound.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
(式中、Ri61及びRi62はそれぞれ独立して、一般式(i)におけるRi1及びRi2と同じ意味を表し、Xi61及びXi62はそれぞれ独立して水素原子又はフッ素原子を表す。)
 Ri61及びRi62はそれぞれ独立して炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が好ましく、Xi61及びXi62のうち一方がフッ素原子他方が水素原子であることが好ましい。
( Wherein , R i61 and R i62 each independently represent the same meaning as R i1 and R i2 in formula (i), and X i61 and X i62 each independently represent a hydrogen atom or a fluorine atom). )
R i61 and R i62 are each independently preferably an alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms, and one of X i61 and X i62 is a fluorine atom and the other is a hydrogen atom. Is preferred.
 一般式(i-6)で表される化合物は単独で使用することもできるが、2以上の化合物を組み合わせて使用することもできる。組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて適宜組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類であり、5種類以上である。 The compound represented by the general formula (i-6) can be used alone, or two or more compounds can be used in combination. There are no particular restrictions on the types of compounds that can be combined, but they are used in appropriate combinations according to the required performance such as low-temperature solubility, transition temperature, electrical reliability, and refractive index anisotropy. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, four kinds, and five kinds or more.
 本発明の組成物の総量に対しての式(i-6)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、14%であり、16%であり、20%であり、23%であり、26%であり、30%であり、35%であり、40%である。本発明の組成物の総量に対しての式(i-6)で表される化合物の好ましい含有量の上限値は、50%であり、40%であり、35%であり、30%であり、20%であり、15%であり、10%であり、5%である。Δnを大きくすることに重点を置く場合には含有量を多くした方が好ましく、低温での析出に重点を置いた場合には含有量は少ない方が好ましい。 The lower limit of the preferable content of the compound represented by the formula (i-6) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%, 23%, 26%, 30%, 35%, 40% . The upper limit of the preferable content of the compound represented by the formula (i-6) with respect to the total amount of the composition of the present invention is 50%, 40%, 35%, 30%. 20%, 15%, 10%, 5%. When emphasizing to increase Δn, it is preferable to increase the content, and when emphasizing the precipitation at low temperature, it is preferable to decrease the content.
 一般式(i-6)で表される化合物は、式(i-6.1)から式(i-6.9)で表される化合物であることが好ましい。 The compound represented by the general formula (i-6) is preferably a compound represented by the formula (i-6.1) to the formula (i-6.9).
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 組み合わせることができる化合物の種類に特に制限は無いが、これらの化合物の中から1種~3種類含有することが好ましく、1種~4種類含有することがさらに好ましい。また、選ぶ化合物の分子量分布が広いことも溶解性に有効であるため、例えば、式(i-6.1)又は(i-6.2)で表される化合物から1種類、式(i-6.4)又は(i-6.5)で表される化合物から1種類、式(i-6.6)又は式(i-6.7)で表される化合物から1種類、式(i-6.8)又は(i-6.9)で表される化合物から1種類の化合物を選び、これらを適宜組み合わせることが好ましい。その中でも、式(i-6.1)、式(i-6.3)式(i-6.4)、式(i-6.6)及び式(i-6.9)で表される化合物を含むことが好ましい。 There are no particular restrictions on the types of compounds that can be combined, but 1 to 3 types of these compounds are preferably contained, more preferably 1 to 4 types. Further, since the wide molecular weight distribution of the selected compound is also effective for the solubility, for example, one type of the compound represented by the formula (i-6.1) or (i-6.2), the formula (i- 6.4) or one type from the compound represented by (i-6.5), one type from the compound represented by formula (i-6.6) or formula (i-6.7), formula (i It is preferable to select one compound from the compounds represented by -6.8) or (i-6.9) and combine them appropriately. Among them, represented by formula (i-6.1), formula (i-6.3), formula (i-6.4), formula (i-6.6) and formula (i-6.9). It is preferable to include a compound.
 さらに、一般式(i-6)で表される化合物は、例えば式(i-6.10)から式(i-6.17)で表される化合物であることが好ましく、その中でも、式(i-6.11)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (i-6) is preferably, for example, a compound represented by the formula (i-6.10) to the formula (i-6.17). The compound represented by i-6.11) is preferable.
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%である。これら化合物の好ましい含有量の上限値は、20%であり、15%であり、13%であり、10%であり、9%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5%, and 7%. The upper limit of the preferable content of these compounds is 20%, 15%, 13%, 10%, and 9%.
 一般式(i-7)で表される化合物は下記の化合物である。 The compound represented by the general formula (i-7) is the following compound.
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
(式中、Ri71及びRi72はそれぞれ独立して一般式(i)におけるRi1及びRi2と同じ意味を表し、Ai71及びAi72はそれぞれ独立して一般式(i)におけるAi2及びAi3と同じ意味を表すが、Ai71及びAi72上の水素原子はそれぞれ独立してフッ素原子によって置換されていてもよく、Zi71は一般式(i)におけるZi2と同じ意味を表し、Xi71及びXi72はそれぞれ独立してフッ素原子又は水素原子を表す。)
 式中、Ri71及びRi72はそれぞれ独立して炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基が好ましく、Ai71及びAi72はそれぞれ独立して1,4-シクロヘキシレン基又は1,4-フェニレン基が好ましく、Ai71及びAi72上の水素原子はそれぞれ独立してフッ素原子によって置換されていてもよく、Qi71は単結合又はCOO-が好ましく、単結合が好ましく、Xi71及びXi72は水素原子が好ましい。
(In the formula, R i71 and R i72 each independently represent the same meaning as R i1 and R i2 in formula (i), and A i71 and A i72 each independently represent A i2 and in formula (i)). A 1 represents the same meaning as A i3 , but the hydrogen atoms on A i71 and A i72 may each independently be substituted with a fluorine atom, Z i71 represents the same meaning as Z i2 in formula (i), X i71 and X i72 each independently represent a fluorine atom or a hydrogen atom.)
In the formula, R i71 and R i72 are each independently preferably an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and A i71 and A i72 Are each independently preferably a 1,4-cyclohexylene group or a 1,4-phenylene group, the hydrogen atoms on A i71 and A i72 may be each independently substituted with a fluorine atom, and Q i71 is a single group. A bond or COO- is preferable, a single bond is preferable, and X i71 and X i72 are preferably a hydrogen atom.
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの求められる性能に応じて組み合わせる。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類であり、4種類である。 There are no particular restrictions on the types of compounds that can be combined, but they are combined according to the required performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. The kind of the compound used is, for example, one kind as one embodiment of the present invention, two kinds, three kinds, and four kinds.
 本発明の組成物において、一般式(i-7)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (i-7) includes solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dropping. It is necessary to adjust appropriately according to the required performance such as marks, image sticking, and dielectric anisotropy.
 本発明の組成物の総量に対しての式(i-7)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、3%であり、5%であり、7%であり、10%であり、14%であり、16%であり、20%である。本発明の組成物の総量に対しての式(i-7)で表される化合物の好ましい含有量の上限値は、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、10%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (i-7) with respect to the total amount of the composition of the present invention is 1%, 2%, 3%, 5% 7%, 10%, 14%, 16%, 20%. The upper limit of the preferable content of the compound represented by the formula (i-7) with respect to the total amount of the composition of the present invention is 30%, 25%, 23%, and 20%. 18%, 15%, 10%, 5%.
 本発明の組成物が高いTniの実施形態が望まれる場合は式(i-7)で表される化合物の含有量を多めにすることが好ましく、低粘度の実施形態が望まれる場合は含有量を少なめにすることが好ましい。 When an embodiment with high Tni is desired for the composition of the present invention, the content of the compound represented by formula (i-7) is preferably increased, and when an embodiment with low viscosity is desired, the content is It is preferable to reduce the amount.
 さらに、一般式(i-7)で表される化合物は、式(i-7.1)から式(i-7.4)で表される化合物であることが好ましく、式(i-7.2)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (i-7) is preferably a compound represented by the formula (i-7.1) to the formula (i-7.4), and the formula (i-7. It is preferable that it is a compound represented by 2).
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
 さらに、一般式(i-7)で表される化合物は、式(i-7.11)から式(i-7.13)で表される化合物であることが好ましく、式(i-7.11)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (i-7) is preferably a compound represented by the formula (i-7.11) to the formula (i-7.13), and the formula (i-7. It is preferable that it is a compound represented by 11).
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 さらに、一般式(i-7)で表される化合物は、式(i-7.21)から式(i-7.23)で表される化合物である。式(i-7.21)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (i-7) is a compound represented by the formula (i-7.21) to the formula (i-7.23). A compound represented by the formula (i-7.21) is preferable.
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
 さらに、一般式(i-7)で表される化合物は、式(i-7.31)から式(i-7.34)で表される化合物であることが好ましく、式(i-7.31)又は/及び式(i-7.32)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (i-7) is preferably a compound represented by the formula (i-7.31) to the formula (i-7.34), and the formula (i-7. 31) or / and a compound represented by formula (i-7.32).
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
 さらに、一般式(i-7)で表される化合物は、式(i-7.41)から式(i-7.44)で表される化合物であることが好ましく、式(i-7.41)又は/及び式(i-7.42)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (i-7) is preferably a compound represented by the formula (i-7.41) to the formula (i-7.44), and the formula (i-7. 41) or / and a compound represented by formula (i-7.42).
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
 一般式(i)で表される化合物は、下記の一般式(i-8)で表される群より選ばれることが好ましい。 The compound represented by the general formula (i) is preferably selected from the group represented by the following general formula (i-8).
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
(式中、Ri81およびRi82は、それぞれ独立して、炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基または炭素原子数1~4のアルコキシ基を表す。)
 本発明の液晶組成物の総量に対しての一般式(i-8)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、7%であり、9%であり、10%であり、12%であり、15%であり、17%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein R i81 and R i82 each independently represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms.)
The lower limit of the preferable content of the compound represented by formula (i-8) with respect to the total amount of the liquid crystal composition of the present invention is 1%, 2%, 4%, 5% 7%, 9%, 10%, 12%, 15%, and 17%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 末端にアリルエーテル基を有する液晶化合物は、液晶組成物の構成成分として良好な特性を有するが、信頼性に問題があった。しかしながら、一般式(i-8)で表される化合物は、アリルエーテル基を有するベンゼン環の特定の位置をジフッ素化することにより、骨格本来の優れた特性を損なわずに、信頼性を著しく向上させ、さらに相溶性を改善し、粘性を低下させる。さらに、誘電率異方性としては、側鎖の基の種類により、若干の正の誘電率異方性(5以下)を帯びる場合があるが、本明細書では中性の液晶化合物の構成成分として分類している。 The liquid crystal compound having an allyl ether group at the terminal has good characteristics as a component of the liquid crystal composition, but has a problem in reliability. However, the compound represented by the general formula (i-8) is remarkably improved in reliability by difluorinating a specific position of the benzene ring having an allyl ether group without impairing the original excellent characteristics of the skeleton. Improve, further improve compatibility, reduce viscosity. Furthermore, the dielectric anisotropy may have a slight positive dielectric anisotropy (5 or less) depending on the type of the side chain group. It is classified as.
 また、一般式(i-8)中のRi82において、フッ素原子に置換したアルキル基やアルケニル基(例えばビニル基)を選択する場合等は、正の誘電率異方性を付与することが可能である。例えば一般式(i-8)で表される化合物は、単独で40~110℃の範囲で液晶相を示し、Δnが0.26程度であり、フロー粘度が25mPa・s程度と低く、誘電率異方性が+4~5程度であり、さらに液晶組成物の成分として用いた場合に極めて良好な相溶性を有する。 In addition, in R i82 in the general formula (i-8), when an alkyl group or alkenyl group substituted with a fluorine atom is selected, a positive dielectric anisotropy can be imparted. It is. For example, the compound represented by formula (i-8) alone exhibits a liquid crystal phase in the range of 40 to 110 ° C., Δn is about 0.26, flow viscosity is as low as about 25 mPa · s, and dielectric constant Anisotropy is about +4 to 5, and it has very good compatibility when used as a component of a liquid crystal composition.
 さらに、本発明の液晶組成物に使用される一般式(i-8)で表される化合物は、具体的には式(i-8.1)から式(i-8.24)で表される化合物であることが好ましく、中でも式(i-8.5)、式(i-8.6)、式(i-8.13)及び式(i-8.14)で表される化合物を含有することが好ましい。 Furthermore, the compounds represented by the general formula (i-8) used in the liquid crystal composition of the present invention are specifically represented by the formulas (i-8.1) to (i-8.24). The compounds represented by formula (i-8.5), formula (i-8.6), formula (i-8.13) and formula (i-8.14) are particularly preferable. It is preferable to contain.
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
 本発明の液晶組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、6%であり、7%であり、8%であり、9%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of these compounds with respect to the total amount of the liquid crystal composition of the present invention is 1%, 2%, 4%, 5%, 6%, 7% 8%, 9%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 また、当該第一成分としての一般式(i-9)で表される化合物は、以下の一般式(i-9.1)で表される化合物を少なくとも1種類または2種以上含むことが好ましい。 In addition, the compound represented by the general formula (i-9) as the first component preferably contains at least one kind or two or more kinds of compounds represented by the following general formula (i-9.1). .
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
(上記一般式(i-9)中、RL72はそれぞれ独立して、炭素原子数1~10個のアルキル基、炭素原子数2~10個のアルケニル基および炭素原子数1~10個のアルコキシ基からなる群から選択される一つの基である。)
 液晶組成物の耐光性、耐熱性または焼き付きといった信頼性の向上の観点から一般式(i-9)で表される化合物を含むことが好ましい。
(In the above general formula (i-9), R L72 each independently represents an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an alkoxy having 1 to 10 carbon atoms. One group selected from the group consisting of groups.)
From the viewpoint of improving the light resistance, heat resistance or image sticking of the liquid crystal composition, it is preferable to include a compound represented by the general formula (i-9).
 さらに、前記一般式(i-9)で表される化合物は、式(i-9.1)~式(i-9.5)で表される化合物であることが特に好ましい。 Further, the compound represented by the general formula (i-9) is particularly preferably a compound represented by the formula (i-9.1) to the formula (i-9.5).
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
 本発明に係る液晶組成物は、第二成分として一般式(J)で表される化合物を1種または2種以上含むことが好ましい(これら化合物は誘電的に正の化合物(Δεが2より大きい。)に該当する。)当該第二成分としての一般式(J)は、以下の化学構造で表される。 The liquid crystal composition according to the present invention preferably contains one or more compounds represented by formula (J) as the second component (these compounds are dielectrically positive compounds (Δε is greater than 2). The general formula (J) as the second component is represented by the following chemical structure.
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
(式中、RJ1は炭素原子数1~8のアルキル基を表し、該アルキル基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
 nJ1は、0、1、2、3又は4を表し、
 AJ1、AJ2及びAJ3はそれぞれ独立して、
(a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)
(b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)及び
(c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又はトリフルオロメトキシ基で置換されていても良く、
 ZJ1及びZJ2はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-OCF-、-CFO-、-COO-、-OCO-又は-C≡C-を表し、
 nJ1が2、3又は4であってAJ2が複数存在する場合は、それらは同一であっても異なっていても良く、nJ1が2、3又は4であってZJ1が複数存在する場合は、それらは同一であっても異なっていても良く、
 XJ1は、水素原子、フッ素原子、塩素原子、シアノ基、トリフルオロメチル基、フルオロメトキシ基、ジフルオロメトキシ基、トリフルオロメトキシ基又は2,2,2-トリフルオロエチル基を表す。)
 一般式(J)中、RJ1は、炭素原子数1~8のアルキル基、炭素原子数1~8のアルコキシ基、炭素原子数2~8のアルケニル基又は炭素原子数2~8のアルケニルオキシ基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基又は炭素原子数2~5のアルケニルオキシ基が好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が更に好ましく、炭素原子数2~5のアルキル基又は炭素原子数2~3のアルケニル基が更に好ましく、炭素原子数3のアルケニル基(プロペニル基)が特に好ましい。
(Wherein R J1 represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently —CH═CH—, — Optionally substituted by C≡C—, —O—, —CO—, —COO— or —OCO—,
n J1 represents 0, 1, 2, 3 or 4;
A J1 , A J2 and A J3 are each independently
(A) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O-.)
(B) a 1,4-phenylene group (one —CH═ present in the group or two or more non-adjacent —CH═ may be replaced by —N═) and (c) (C) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6-diyl group or One —CH═ present in the 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ may be replaced by —N═. )
The group (a), the group (b) and the group (c) are each independently selected from the group consisting of cyano group, fluorine atom, chlorine atom, methyl group, trifluoromethyl group or trifluoro May be substituted with a methoxy group,
Z J1 and Z J2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C≡C—,
When n J1 is 2, 3 or 4 and a plurality of A J2 are present, they may be the same or different, and n J1 is 2, 3 or 4 and a plurality of Z J1 is present. If they are the same or different,
X J1 represents a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a fluoromethoxy group, a difluoromethoxy group, a trifluoromethoxy group, or a 2,2,2-trifluoroethyl group. )
In general formula (J), R J1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or alkenyloxy having 2 to 8 carbon atoms. A group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms or an alkenyloxy group having 2 to 5 carbon atoms is preferable. An alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is more preferable, an alkyl group having 2 to 5 carbon atoms or an alkenyl group having 2 to 3 carbon atoms is more preferable, and an alkenyl group having 3 carbon atoms. (Propenyl group) is particularly preferred.
 信頼性を重視する場合にはRJ1はアルキル基であることが好ましく、粘性の低下を重視する場合にはアルケニル基であることが好ましい。 R J1 is preferably an alkyl group when emphasizing reliability, and is preferably an alkenyl group when emphasizing a decrease in viscosity.
 また、それが結合する環構造がフェニル基(芳香族)である場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び炭素原子数4~5のアルケニル基が好ましく、それが結合する環構造がシクロヘキサン、ピラン及びジオキサンなどの飽和した環構造の場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。ネマチック相を安定化させるためには炭素原子及び存在する場合酸素原子の合計が5以下であることが好ましく、直鎖状であることが好ましい。 Further, when the ring structure to which it is bonded is a phenyl group (aromatic), a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms and carbon An alkenyl group having 4 to 5 atoms is preferable, and when the ring structure to which the alkenyl group is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane, a linear alkyl group having 1 to 5 carbon atoms, a straight chain A straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred. In order to stabilize the nematic phase, the total of carbon atoms and oxygen atoms, if present, is preferably 5 or less, and is preferably linear.
 アルケニル基としては、式(R1)から式(R5)のいずれかで表される基から選ばれることが好ましい。(各式中の黒点はアルケニル基が結合している環構造中の炭素原子を表す。) The alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dot in each formula represents the carbon atom in the ring structure to which the alkenyl group is bonded.)
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044
 AJ1、AJ2及びAJ3はそれぞれ独立してΔnを大きくすることが求められる場合には芳香族であることが好ましく、応答速度を改善するためには脂肪族であることが好ましく、トランス-1,4-シクロへキシレン基、1,4-フェニレン基、1,4-シクロヘキセニレン基、1,4-ビシクロ[2.2.2]オクチレン基、ピペリジン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基を表すことが好ましく、それらはフッ素原子により置換されていてもよく、下記の構造を表すことがより好ましく、 A J1 , A J2 and A J3 are preferably aromatic when it is required to independently increase Δn, and are preferably aliphatic to improve the response speed. 1,4-cyclohexylene group, 1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, piperidine-1,4-diyl group, naphthalene -2,6-diyl group, decahydronaphthalene-2,6-diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, preferably substituted by a fluorine atom It is more preferable to represent the following structure,
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
下記の構造を表すことがより好ましい。 It is more preferable to represent the following structure.
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
 ZJ1及びZJ2はそれぞれ独立して-CHO-、-OCH-、-CFO-、-CHCH-、-CFCF-又は単結合を表すことが好ましく、-OCH-、-CFO-、-CHCH-又は単結合が更に好ましく、-OCH-、-CFO-又は単結合が特に好ましい。 Z J1 and Z J2 each independently preferably represent —CH 2 O—, —OCH 2 —, —CF 2 O—, —CH 2 CH 2 —, —CF 2 CF 2 — or a single bond, OCH 2 —, —CF 2 O—, —CH 2 CH 2 — or a single bond is more preferred, and —OCH 2 —, —CF 2 O— or a single bond is particularly preferred.
 XJ1はフッ素原子又はトリフルオロメトキシ基が好ましく、フッ素原子が好ましい。 X J1 is preferably a fluorine atom or a trifluoromethoxy group, and more preferably a fluorine atom.
 nJ1は、0、1、2又は3が好ましく、0、1又は2が好ましく、Δεの改善に重点を置く場合には0又は1が好ましく、Tniを重視する場合には1又は2が好ましい。 n J1 is preferably 0, 1, 2 or 3, preferably 0, 1 or 2, preferably 0 or 1 when emphasizing the improvement of Δε, and preferably 1 or 2 when emphasizing Tni .
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類である。またさらに、本発明の別の実施形態では4種類であり、5種類であり、6種類であり、7種類以上である。 There are no particular restrictions on the types of compounds that can be combined, but they are used in combination according to desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. For example, in one embodiment of the present invention, there are one kind, two kinds, and three kinds of compounds to be used. Furthermore, in another embodiment of the present invention, there are four types, five types, six types, and seven or more types.
 本発明の組成物において、一般式(J)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (J) includes solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
 本発明の組成物の総量に対しての一般式(J)で表される化合物の好ましい含有量の下限値は、1%であり、10%であり、20%であり、30%であり、40%であり、50%であり、55%であり、60%であり、65%であり、70%であり、75%であり、80%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、例えば本発明の一つの形態では95%であり、85%であり、75%であり、65%であり、55%であり、45%であり、35%であり、25%である。 The lower limit of the preferable content of the compound represented by the general formula (J) with respect to the total amount of the composition of the present invention is 1%, 10%, 20%, 30%, 40%, 50%, 55%, 60%, 65%, 70%, 75%, 80%. The upper limit of the preferable content is, for example, 95%, 85%, 75%, 65%, and 55% with respect to the total amount of the composition of the present invention. Yes, 45%, 35%, 25%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 信頼性を重視する場合にはRJ1はアルキル基であることが好ましく、粘性の低下を重視する場合にはアルケニル基であることが好ましい。 R J1 is preferably an alkyl group when emphasizing reliability, and is preferably an alkenyl group when emphasizing a decrease in viscosity.
 一般式(J)で表される化合物は、一般式(M)で表される化合物及び一般式(K)で表される化合物からなる群から選択される1種または2種以上が好ましい。 The compound represented by the general formula (J) is preferably one or more selected from the group consisting of the compound represented by the general formula (M) and the compound represented by the general formula (K).
 本発明に係る一般式(M)は、 General formula (M) according to the present invention is
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
(上記一般式(M)中、RM1は炭素原子数1~8のアルキル基、炭素原子数2~8のアルケニル基、炭素原子数1~8のアルコキシ基又は炭素原子数2~8のアルケニルオキシ基を表し、該アルキル基、アルケニル基、アルコキシ基又はアルケニルオキシ基中の1つ以上の水素原子はフッ素原子で置換されていてもよく、該アルキル基、アルケニル基、アルコキシ基又はアルケニルオキシ基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
 PMは、0、1、2、3又は4を表し、
 CM1及びCM2はそれぞれ独立して、
(d) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-又は-S-に置き換えられてもよい。)及び
(e) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)
からなる群より選ばれる基を表し、上記の基(d)、基(e)はそれぞれ独立してシアノ基、フッ素原子又は塩素原子で置換されていても良く、
 KM1及びKM2はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-OCF-、-CFO-、-COO-、-OCO-又は-C≡C-を表し、
 PMが2、3又は4であってKM1が複数存在する場合は、それらは同一であっても異なっていても良く、PMが2、3又は4であってCM2が複数存在する場合は、それらは同一であっても異なっていても良く、
 XM1及びXM3はそれぞれ独立して水素原子、塩素原子又はフッ素原子を表し、
 XM2は、水素原子、フッ素原子、塩素原子、シアノ基、トリフルオロメチル基、フルオロメトキシ基、ジフルオロメトキシ基、トリフルオロメトキシ基又は2,2,2-トリフルオロエチル基を表す。ただし、一般式(i)で表される化合物を除く。)である。
(In the general formula (M), R M1 represents an alkyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or an alkenyl group having 2 to 8 carbon atoms. Represents an oxy group, and one or more hydrogen atoms in the alkyl group, alkenyl group, alkoxy group or alkenyloxy group may be substituted with a fluorine atom, the alkyl group, alkenyl group, alkoxy group or alkenyloxy group And one or more non-adjacent two or more —CH 2 — are each independently replaced by —CH═CH—, —C≡C—, —O—, —CO—, —COO— or —OCO—. May have been
PM represents 0, 1, 2, 3 or 4;
C M1 and C M2 are each independently
(D) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O- or -S- And (e) a 1,4-phenylene group (one —CH═ present in the group or two or more non-adjacent —CH═ may be replaced by —N═).
Represents a group selected from the group consisting of the above-mentioned groups (d) and (e) each independently substituted with a cyano group, a fluorine atom or a chlorine atom,
K M1 and K M2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C≡C—,
When PM is 2, 3 or 4 and there are a plurality of K M1 , they may be the same or different, and when PM is 2, 3 or 4 and there are a plurality of C M2 They may be the same or different,
X M1 and X M3 each independently represent a hydrogen atom, a chlorine atom or a fluorine atom,
X M2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a fluoromethoxy group, a difluoromethoxy group, a trifluoromethoxy group, or a 2,2,2-trifluoroethyl group. However, the compound represented by general formula (i) is excluded. ).
 一般式(M)中、RM1は、炭素原子数1~8のアルキル基、炭素原子数1~8のアルコキシ基、炭素原子数2~8のアルケニル基又は炭素原子数2~8のアルケニルオキシ基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基又は炭素原子数2~5のアルケニルオキシ基が好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が更に好ましく、炭素原子数2~5のアルキル基又は炭素原子数2~3のアルケニル基が更に好ましく、炭素原子数3のアルケニル基(プロペニル基)が特に好ましい。 In the general formula (M), R M1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or an alkenyloxy having 2 to 8 carbon atoms. A group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms or an alkenyloxy group having 2 to 5 carbon atoms is preferable. An alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is more preferable, an alkyl group having 2 to 5 carbon atoms or an alkenyl group having 2 to 3 carbon atoms is more preferable, and an alkenyl group having 3 carbon atoms. (Propenyl group) is particularly preferred.
 信頼性を重視する場合にはRM1はアルキル基であることが好ましく、粘性の低下を重視する場合にはアルケニル基であることが好ましい。 R M1 is preferably an alkyl group when emphasizing reliability, and is preferably an alkenyl group when emphasizing a decrease in viscosity.
 また、それが結合する環構造がフェニル基(芳香族)である場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び炭素原子数4~5のアルケニル基が好ましく、それが結合する環構造がシクロヘキサン、ピラン及びジオキサンなどの飽和した環構造の場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。ネマチック相を安定化させるためには炭素原子及び存在する場合酸素原子の合計が5以下であることが好ましく、直鎖状であることが好ましい。 Further, when the ring structure to which it is bonded is a phenyl group (aromatic), a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms and carbon An alkenyl group having 4 to 5 atoms is preferable, and when the ring structure to which the alkenyl group is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane, a linear alkyl group having 1 to 5 carbon atoms, a straight chain A straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred. In order to stabilize the nematic phase, the total of carbon atoms and oxygen atoms, if present, is preferably 5 or less, and is preferably linear.
 アルケニル基としては、式(R1)から式(R5)のいずれかで表される基から選ばれることが好ましい。(各式中の黒点は環構造中の炭素原子を表す。) The alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dots in each formula represent carbon atoms in the ring structure.)
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
 AM1及びAM2はそれぞれ独立してΔnを大きくすることが求められる場合には芳香族であることが好ましく、応答速度を改善するためには脂肪族であることが好ましく、トランス-1,4-シクロへキシレン基、1,3-ジオキサン-2,5-ジイル基、テトラヒドロピラン-2,5-ジイル基、1,4-フェニレン基、2-フルオロ-1,4-フェニレン基、3-フルオロ-1,4-フェニレン基、3,5-ジフルオロ-1,4-フェニレン基、2,3-ジフルオロ-1,4-フェニレン基、1,4-シクロヘキセニレン基、1,4-ビシクロ[2.2.2]オクチレン基、ピペリジン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基を表すことが好ましく、下記の構造を表すことがより好ましく、 A M1 and A M2 are preferably aromatic when it is required to independently increase Δn, and are preferably aliphatic for improving the response speed, and trans-1,4 -Cyclohexylene group, 1,3-dioxane-2,5-diyl group, tetrahydropyran-2,5-diyl group, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro -1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 2,3-difluoro-1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2 2.2] Octylene group, piperidine-1,4-diyl group, naphthalene-2,6-diyl group, decahydronaphthalene-2,6-diyl group or 1,2,3,4-tetrahydronaphthalene-2 , 6-diyl group, preferably the following structure:
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
下記の構造を表すことがより好ましい。 It is more preferable to represent the following structure.
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
 上記一般式(M)において、ZM1及びZM2はそれぞれ独立して-CHO-、-CFO-、-CHCH-、-CFCF-又は単結合を表すことが好ましく、-CFO-、-CHCH-又は単結合が更に好ましく、-CFO-又は単結合が特に好ましい。XM1はフッ素原子が好ましい。 In formula (M), Z M1 and Z M2 -CH 2 each independently O -, - CF 2 O - , - CH 2 CH 2 -, - CF 2 CF 2 - or may represent a single bond Preferably, —CF 2 O—, —CH 2 CH 2 — or a single bond is more preferable, and —CF 2 O— or a single bond is particularly preferable. X M1 is preferably a fluorine atom.
 RM1は、それが結合する環構造がフェニル基(芳香族)である場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び炭素原子数4~5のアルケニル基が好ましく、それが結合する環構造がシクロヘキサン、ピラン及びジオキサンなどの飽和した環構造の場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。信頼性を重視する場合にはRM1はアルキル基であることが好ましく、粘性の低下を重視する場合にはアルケニル基であることが好ましい。 R M1 represents a linear alkyl group having 1 to 5 carbon atoms or a linear alkoxy group having 1 to 4 carbon atoms when the ring structure to which R M1 is bonded is a phenyl group (aromatic). And an alkenyl group having 4 to 5 carbon atoms, and when the ring structure to which it is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane, a linear alkyl group having 1 to 5 carbon atoms, A straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred. R M1 is preferably an alkyl group when emphasizing reliability, and is preferably an alkenyl group when emphasizing a decrease in viscosity.
 本発明に係る一般式(M)で表される化合物は、液晶組成物の化学的な安定性が求められる場合には塩素原子をその分子内に有さないことが好ましい。更に液晶組成物内に塩素原子を有する化合物が5%以下であることが好ましく、3%以下であることが好ましく、1%以下であることが好ましく、0.5%以下であることが好ましく、実質的に含有しないことが好ましい。実質的に含有しないとは、化合物製造時の不純物として生成した化合物等が意図せず塩素原子を含む化合物のみが液晶組成物に混入することを意味する。 The compound represented by the general formula (M) according to the present invention preferably does not have a chlorine atom in the molecule when chemical stability of the liquid crystal composition is required. Further, the compound having a chlorine atom in the liquid crystal composition is preferably 5% or less, preferably 3% or less, preferably 1% or less, preferably 0.5% or less, It is preferable not to contain substantially. “Substantially not contained” means that the compound produced as an impurity during the production of the compound is not intended and only a compound containing a chlorine atom is mixed in the liquid crystal composition.
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類である。またさらに、本発明の別の実施形態では4種類であり、5種類であり、6種類であり、7種類以上である。 There are no particular restrictions on the types of compounds that can be combined, but they are used in combination according to desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. For example, in one embodiment of the present invention, there are one kind, two kinds, and three kinds of compounds to be used. Furthermore, in another embodiment of the present invention, there are four types, five types, six types, and seven or more types.
 本発明の組成物において、一般式(M)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (M) includes solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
 本発明の組成物の総量に対しての式(M)で表される化合物の好ましい含有量の下限値は、1%であり、10%であり、15%であり、20%であり、25%であり、30%であり、35%であり、40%であり、50%であり、55%であり、60%であり、65%であり、70%であり、75%であり、80%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、例えば本発明の一つの形態では95%であり、85%であり、75%であり、65%であり、55%であり、45%であり、35%であり、30%であり、25%である。 The lower limit of the preferable content of the compound represented by the formula (M) with respect to the total amount of the composition of the present invention is 1%, 10%, 15%, 20%, 25 %, 30%, 35%, 40%, 50%, 55%, 60%, 65%, 70%, 75%, 80% %. The upper limit of the preferable content is, for example, 95%, 85%, 75%, 65%, and 55% with respect to the total amount of the composition of the present invention. Yes, 45%, 35%, 30%, 25%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 本発明に係る一般式(M)で表される化合物は、例えば一般式(M-1)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (M) according to the present invention is preferably, for example, a compound selected from the group of compounds represented by the general formula (M-1).
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051
(式中、RM11は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XM11からXM15はそれぞれ独立して水素原子又はフッ素原子を表し、YM11はフッ素原子又はOCFを表す。)
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類以上である。
(Wherein R M11 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X M11 to X M15 each independently represents hydrogen. represents an atom or a fluorine atom, Y M11 represents a fluorine atom or OCF 3.)
Although there is no restriction | limiting in particular in the kind of compound which can be combined, It uses combining according to desired performances, such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy. The type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
 本発明の組成物の総量に対しての式(M-1)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-1) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(M-1)で表される化合物は、具体的には式(M-1.1)から式(M-1.4)で表される化合物であることが好ましく、式(M-1.1)又は式(M-1.2)で表される化合物が好ましく、式(M-1.2)で表される化合物がさらに好ましい。また、式(M-1.1)又は式(M-1.2)で表される化合物を同時に使用することも好ましい。 Further, the compound represented by the general formula (M-1) is specifically preferably a compound represented by the formula (M-1.1) to the formula (M-1.4). A compound represented by M-1.1) or formula (M-1.2) is preferred, and a compound represented by formula (M-1.2) is more preferred. It is also preferred to use the compounds represented by formula (M-1.1) or formula (M-1.2) at the same time.
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052
 本発明の組成物の総量に対しての式(M-1.1)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、6%である。好ましい含有量の上限値は、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-1.1) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is. The upper limit of the preferable content is 15%, 13%, 10%, 8%, and 5%.
 本発明の組成物の総量に対しての式(M-1.2)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、6%である。好ましい含有量の上限値は、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 The lower limit of the preferable content of the compound represented by the formula (M-1.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is. The upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
 本発明の組成物の総量に対しての式(M-1.1)及び式(M-1.2)で表される化合物の合計の好ましい含有量の下限値は、1%であり、2%であり、5%であり、6%である。好ましい含有量の上限値は、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 The lower limit of the preferable total content of the compounds represented by the formulas (M-1.1) and (M-1.2) with respect to the total amount of the composition of the present invention is 1%, %, 5% and 6%. The upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
 さらに、一般式(M)で表される化合物は、例えば一般式(M-2)で表される化合物群から選ばれる化合物であることが好ましい。 Furthermore, the compound represented by the general formula (M) is preferably a compound selected from the group of compounds represented by the general formula (M-2), for example.
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000053
(式中、RM21は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XM21及びXM22はそれぞれ独立して水素原子又はフッ素原子を表し、YM21はフッ素原子、塩素原子又はOCFを表す。)
 本発明の組成物の総量に対しての式(M-1)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
(Wherein R M21 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X M21 and X M22 each independently represent hydrogen represents an atom or a fluorine atom, Y M21 represents a fluorine atom, a chlorine atom or OCF 3.)
The lower limit of the preferable content of the compound represented by the formula (M-1) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、焼きつきの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention is required to maintain a high Tni and hardly burn-in, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(M-2)で表される化合物は、式(M-2.1)から式(M-2.5)で表される化合物であることが好ましく、式(M-2.3)又は/及び式(M-2.5)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (M-2) is preferably a compound represented by the formula (M-2.1) to the formula (M-2.5). 3) or / and a compound represented by the formula (M-2.5) is preferable.
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054
 本発明の組成物の総量に対しての式(M-2.2)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、6%である。好ましい含有量の上限値は、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-2.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is. The upper limit of the preferable content is 15%, 13%, 10%, 8%, and 5%.
 本発明の組成物の総量に対しての式(M-2.3)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、6%である。好ましい含有量の上限値は、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 The lower limit of the preferable content of the compound represented by the formula (M-2.3) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is. The upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
 本発明の組成物の総量に対しての式(M-2.5)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、6%である。好ましい含有量の上限値は、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 The lower limit of the preferable content of the compound represented by the formula (M-2.5) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 6% It is. The upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
 本発明の組成物の総量に対しての式(M-2.2)、(M-2.3)及び式(M-2.5)で表される化合物の合計の好ましい含有量の下限値は、1%であり、2%であり、5%であり、6%である。好ましい含有量の上限値は、30%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%である。 Lower limit value of the preferable total content of the compounds represented by formulas (M-2.2), (M-2.3) and formula (M-2.5) with respect to the total amount of the composition of the present invention Is 1%, 2%, 5%, 6%. The upper limit of the preferable content is 30%, 25%, 23%, 20%, 18%, 15%, 13%, 10%, 8% It is.
 含有量は、本発明の組成物の総量に対して1%以上であることが好ましく、5%以上がより好ましく、8%以上がさらに好ましく、10%以上がさらに好ましく、14%以上がさらに好ましく、16%以上が特に好ましい。また、低温での溶解性、転移温度、電気的な信頼性などを考慮して、最大比率を30%以下にとどめることが好ましく、25%以下がさらに好ましく、22%以下がより好ましく、20%未満が特に好ましい。 The content is preferably 1% or more with respect to the total amount of the composition of the present invention, more preferably 5% or more, further preferably 8% or more, further preferably 10% or more, and more preferably 14% or more. 16% or more is particularly preferable. In consideration of solubility at low temperature, transition temperature, electrical reliability, etc., the maximum ratio is preferably limited to 30% or less, more preferably 25% or less, more preferably 22% or less, and more preferably 20%. Less than is particularly preferred.
 本発明の組成物に使用される一般式(M)で表される化合物は、一般式(M-3)で表される化合物であることが好ましい。 The compound represented by the general formula (M) used in the composition of the present invention is preferably a compound represented by the general formula (M-3).
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000055
(式中、RM31は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XM31からXM36はそれぞれ独立して水素原子又はフッ素原子を表し、YM31はフッ素原子、塩素原子又はOCFを表す。)
 組み合わせることのできる化合物に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などを考慮して1種から2種類以上組み合わせることが好ましい。
(Wherein R M31 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X M31 to X M36 are each independently hydrogen. represents an atom or a fluorine atom, Y M31 represents a fluorine atom, a chlorine atom or OCF 3.)
There are no particular limitations on the compounds that can be combined, but it is preferable to combine one or more compounds in consideration of solubility at low temperatures, transition temperature, electrical reliability, refractive index anisotropy, and the like.
 一般式(M-3)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの特性を考慮して実施形態ごとに上限値と下限値がある。 The content of the compound represented by the general formula (M-3) is an upper limit for each embodiment in consideration of properties such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. There is a lower limit.
 本発明の組成物の総量に対しての式(M-3)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-3) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, and 20%. The upper limit of the preferable content is 20%, 18%, 15%, 13%, 10%, 8%, and 5%.
 さらに、本発明の組成物に使用される一般式(M-3)で表される化合物は、具体的には式(M-3.1)から式(M-3.4)で表される化合物であることが好ましく、中でも式(M-3.1)及び/又は式(M-3.2)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-3) used in the composition of the present invention is specifically represented by the formula (M-3.1) to the formula (M-3.4). A compound is preferable, and among them, a compound represented by Formula (M-3.1) and / or Formula (M-3.2) is preferably contained.
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000056
 本発明の組成物の総量に対しての式(M-3.1)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-3.1) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferable content is 20%, 18%, 15%, 13%, 10%, 8%, and 5%.
 本発明の組成物の総量に対しての式(M-3.2)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-3.2) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferable content is 20%, 18%, 15%, 13%, 10%, 8%, and 5%.
 本発明の組成物の総量に対しての式(M-3.1)及び式(M-3.2)で表される化合物の合計の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable total content of the compounds represented by the formulas (M-3.1) and (M-3.2) with respect to the total amount of the composition of the present invention is 1%, %, 4%, 5%, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferable content is 20%, 18%, 15%, 13%, 10%, 8%, and 5%.
 さらに、一般式(M)で表される化合物は、一般式(M-4)で表される群より選ばれる化合物であることが好ましい。 Furthermore, the compound represented by the general formula (M) is preferably a compound selected from the group represented by the general formula (M-4).
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057
(式中、RM41は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XM41からXM48はそれぞれ独立してフッ素原子又は水素原子を表し、YM41はフッ素原子、塩素原子又はOCFを表す。)
 組み合わせることのできる化合物に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などを考慮して1種、2種又は3種類以上組み合わせることが好ましい。
(Wherein R M41 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X M41 to X M48 are each independently fluorine. Represents an atom or a hydrogen atom, and Y M41 represents a fluorine atom, a chlorine atom or OCF 3. )
There are no particular restrictions on the compounds that can be combined, but it is preferable to combine one, two, or three or more in consideration of solubility at low temperatures, transition temperature, electrical reliability, refractive index anisotropy, and the like. .
 一般式(M-4)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの特性を考慮して実施形態ごとに上限値と下限値がある。 The content of the compound represented by the general formula (M-4) is an upper limit for each embodiment in consideration of properties such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. There is a lower limit.
 本発明の組成物の総量に対しての式(M-4)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-4) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, and 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物が、セルギャップの小さい液晶表示素子用に用いられる場合は、一般式(M-4)で表される化合物の含有量を多めにすることが適している。駆動電圧の小さい液晶表示素子用に用いられる場合は、一般式(M-4)で表される化合物の含有量を多めにすることが適している。また、低温の環境で用いられる液晶表示素子用に用いられる場合は一般式(M-4)で表される化合物の含有量を少なめにすることが適している。応答速度の速い液晶表示素子に用いられる組成物である場合は、一般式(M-4)で表される化合物の含有量を少なめにすることが適している。 When the composition of the present invention is used for a liquid crystal display device having a small cell gap, it is suitable to increase the content of the compound represented by the general formula (M-4). When used for a liquid crystal display element having a low driving voltage, it is suitable to increase the content of the compound represented by the general formula (M-4). Further, when used for a liquid crystal display element used in a low temperature environment, it is suitable to reduce the content of the compound represented by the general formula (M-4). In the case of a composition used for a liquid crystal display device having a high response speed, it is suitable to reduce the content of the compound represented by the general formula (M-4).
 さらに、本発明の組成物に使用される一般式(M-4)で表される化合物は、具体的には式(M-4.1)から式(M-4.4)で表される化合物であることが好ましく、中でも式(M-4.2)から式(M-4.4)で表される化合物を含有することが好ましく、式(M-4.2)で表される化合物を含有することがより好ましい。 Furthermore, the compound represented by the general formula (M-4) used in the composition of the present invention is specifically represented by the formula (M-4.1) to the formula (M-4.4). Preferably, it is a compound, and among them, it is preferable to contain a compound represented by the formula (M-4.2) to the formula (M-4.4), and a compound represented by the formula (M-4.2) It is more preferable to contain.
Figure JPOXMLDOC01-appb-C000058
Figure JPOXMLDOC01-appb-C000058
 さらに、一般式(M)で表される化合物は、一般式(M-5)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (M) is preferably a compound represented by the general formula (M-5).
Figure JPOXMLDOC01-appb-C000059
Figure JPOXMLDOC01-appb-C000059
(式中、RM51は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XM51及びXM52はそれぞれ独立して水素原子又はフッ素原子を表し、YM51はフッ素原子、塩素原子又はOCFを表す。)
 組み合わせることのできる化合物の種類に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などを考慮して、実施形態ごとに適宜組み合わせて使用する。例えば、本発明の一つの実施形態では1種類、別の実施形態では2種類、さらに別の実施形態では3種類、またさらに別の実施形態では4種類、またさらに別の実施形態では5種類、またさらに別の実施形態では6種類以上組み合わせる。
(Wherein R M51 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X M51 and X M52 are each independently hydrogen. represents an atom or a fluorine atom, Y M51 represents a fluorine atom, a chlorine atom or OCF 3.)
Although there is no restriction | limiting in the kind of compound which can be combined, Considering solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, etc., it uses combining suitably for every embodiment. For example, one embodiment of the present invention has one type, another embodiment has two types, yet another embodiment has three types, yet another embodiment has four types, and yet another embodiment has five types, In still another embodiment, six or more types are combined.
 本発明の組成物の総量に対しての式(M-5)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、50%であり、45%であり、40%であり、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-5) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferable content is 50%, 45%, 40%, 35%, 33%, 30%, 28%, 25%, 23% 20%, 18%, 15%, 13%, 10%, 8%, 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、焼きつきの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention is required to maintain a high Tni and hardly burn-in, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(M-5)で表される化合物は、式(M-5.1)から式(M-5.4)で表される化合物であることが好ましく、式(M-5.1)から式(M-5.4)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (M-5) is preferably a compound represented by the formula (M-5.1) to the formula (M-5.4), and the formula (M-5. A compound represented by formula (M-5.4) is preferable.
Figure JPOXMLDOC01-appb-C000060
Figure JPOXMLDOC01-appb-C000060
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8%, 10%, 13% Yes, 15%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M-5)で表される化合物は、式(M-5.11)から式(M-5.17)で表される化合物であることが好ましく、式(M-5.11)、式(M-5.13)及び式(M-5.17)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (M-5) is preferably a compound represented by the formula (M-5.11) to the formula (M-5.17), and the formula (M-5. 11), a compound represented by formula (M-5.13) and formula (M-5.17) is preferable.
Figure JPOXMLDOC01-appb-C000061
Figure JPOXMLDOC01-appb-C000061
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8%, 10%, 13% Yes, 15%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M-5)で表される化合物は、式(M-5.21)から式(M-5.28)で表される化合物であることが好ましく、式(M-5.21)、式(M-5.22)、式(M-5.23)及び式(M-5.25)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (M-5) is preferably a compound represented by the formula (M-5.21) to the formula (M-5.28), and the formula (M-5. 21), a compound represented by formula (M-5.22), formula (M-5.23) and formula (M-5.25).
Figure JPOXMLDOC01-appb-C000062
Figure JPOXMLDOC01-appb-C000062
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、40%であり、35%であり、33%であり、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8%, 10%, 13% Yes, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferable content is 40%, 35%, 33%, 30%, 28%, 25%, 23%, 20%, 18% 15% 13% 10% 8% 5%
 さらに、一般式(M)で表される化合物は、一般式(M-6)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (M) is preferably a compound represented by the general formula (M-6).
Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000063
(式中、RM61は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XM61からXM64はそれぞれ独立してフッ素原子又は水素原子を表し、YM61はフッ素原子、塩素原子又はOCFを表す。)
 組み合わせることのできる化合物の種類に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などを考慮して実施形態ごとに適宜組み合わせる。
(Wherein R M61 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X M61 to X M64 are each independently fluorine. Represents an atom or a hydrogen atom, and Y M61 represents a fluorine atom, a chlorine atom or OCF 3 )
Although there is no restriction | limiting in the kind of compound which can be combined, It combines suitably for every embodiment in consideration of solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy, etc.
 本発明の組成物の総量に対しての式(M-6)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-6) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, and 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物が、駆動電圧の小さい液晶表示素子用に用いられる場合は、一般式(M-6)で表される化合物の含有量を多めにすることが適している。また応答速度の速い液晶表示素子に用いられる組成物である場合は、一般式(M-6)で表される化合物の含有量を少なめにすることが適している。 When the composition of the present invention is used for a liquid crystal display device having a low driving voltage, it is suitable to increase the content of the compound represented by the general formula (M-6). In the case of a composition used for a liquid crystal display device having a high response speed, it is suitable to reduce the content of the compound represented by the general formula (M-6).
 さらに、一般式(M-6)で表される化合物は具体的には式(M-6.1)から式(M-6.4)で表される化合物であることが好ましく、中でも式(M-6.2)及び式(M-6.4)で表される化合物を含有することが好ましい。 Further, the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.1) to the formula (M-6.4). It is preferable to contain a compound represented by M-6.2) and formula (M-6.4).
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000064
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M-6)で表される化合物は具体的には式(M-6.11)から式(M-6.14)で表される化合物であることが好ましく、中でも式(M-6.12)及び式(M-6.14)で表される化合物を含有することが好ましい。 Further, the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.11) to the formula (M-6.14). It is preferable to contain a compound represented by M-6.12) and formula (M-6.14).
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000065
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M-6)で表される化合物は具体的には式(M-6.21)から式(M-6.24)で表される化合物であることが好ましく、中でも式(M-6.21)、式(M-6.22)及び式(M-6.24)で表される化合物を含有することが好ましい。 Further, the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.21) to the formula (M-6.24). It is preferable to contain a compound represented by formula (M-6.21), formula (M-6.22) and formula (M-6.24).
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000066
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M-6)で表される化合物は具体的には式(M-6.31)から式(M-6.34)で表される化合物が好ましい。中でも式(M-6.31)及び式(M-6.32)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.31) to the formula (M-6.34). Among them, it is preferable to contain a compound represented by the formula (M-6.31) and the formula (M-6.32).
Figure JPOXMLDOC01-appb-C000067
Figure JPOXMLDOC01-appb-C000067
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M-6)で表される化合物は具体的には式(M-6.41)から式(M-6.44)で表される化合物であることが好ましく、中でも式(M-6.42)で表される化合物を含有することが好ましい。 Further, the compound represented by the general formula (M-6) is specifically preferably a compound represented by the formula (M-6.41) to the formula (M-6.44). It is preferable to contain a compound represented by M-6.42).
Figure JPOXMLDOC01-appb-C000068
Figure JPOXMLDOC01-appb-C000068
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 更に、一般式(M)で表される化合物は、一般式(M-7)で表される化合物群から選ばれる化合物であることが好ましい。 Furthermore, the compound represented by the general formula (M) is preferably a compound selected from the group of compounds represented by the general formula (M-7).
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000069
(式中、XM71からXM76はそれぞれ独立してフッ素原子又は水素原子を表し、RM71は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、YM71はフッ素原子又はOCFを表す。)
 組み合わせることができる化合物の種類に特に制限は無いが、これらの化合物の中から1種~2種類含有することが好ましく、1種~3種類含有することがより好ましく、1種~4種類含有することが更に好ましい。
(Wherein, X M71 to X M76 each independently represents a fluorine atom or a hydrogen atom, and R M71 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or 1 to 4 represents an alkoxy group, and Y M71 represents a fluorine atom or OCF 3. )
There are no particular restrictions on the types of compounds that can be combined, but one to two of these compounds are preferably contained, more preferably one to three, and more preferably one to four. More preferably.
 一般式(M-7)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの特性を考慮して実施形態ごとに上限値と下限値がある。 The content of the compound represented by the general formula (M-7) is an upper limit for each embodiment in consideration of properties such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. There is a lower limit.
 本発明の組成物の総量に対しての式(M-7)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (M-7) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物が、セルギャップの小さい液晶表示素子用に用いられる場合は、一般式(M-7)で表される化合物の含有量を多めにすることが適している。駆動電圧の小さい液晶表示素子用に用いられる場合は、一般式(M-7)で表される化合物の含有量を多めにすることが適している。また、低温の環境で用いられる液晶表示素子用に用いられる場合は一般式(M-7)で表される化合物の含有量を少なめにすることが適している。応答速度の速い液晶表示素子に用いられる組成物である場合は、一般式(M-7)で表される化合物の含有量を少なめにすることが適している。 When the composition of the present invention is used for a liquid crystal display device having a small cell gap, it is suitable to increase the content of the compound represented by the general formula (M-7). When used for a liquid crystal display element with a low driving voltage, it is suitable to increase the content of the compound represented by the general formula (M-7). In addition, when used for a liquid crystal display element used in a low temperature environment, it is suitable to reduce the content of the compound represented by the general formula (M-7). In the case of a composition used for a liquid crystal display device having a high response speed, it is suitable to reduce the content of the compound represented by the general formula (M-7).
 さらに、一般式(M-7)で表される化合物は、式(M-7.1)から式(M-7.4)で表される化合物であることが好ましく、式(M-7.2)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (M-7) is preferably a compound represented by the formula (M-7.1) to the formula (M-7.4), and the formula (M-7. It is preferable that it is a compound represented by 2).
Figure JPOXMLDOC01-appb-C000070
Figure JPOXMLDOC01-appb-C000070
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M-7)で表される化合物は、式(M-7.11)から式(M-7.14)で表される化合物であることが好ましく、式(M-7.11)及び式(M-7.12)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (M-7) is preferably a compound represented by the formula (M-7.11) to the formula (M-7.14), and the formula (M-7. 11) and a compound represented by the formula (M-7.12) are preferable.
Figure JPOXMLDOC01-appb-C000071
Figure JPOXMLDOC01-appb-C000071
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M-7)で表される化合物は、式(M-7.21)から式(M-7.24)で表される化合物であることが好ましく、式(M-7.21)及び式(M-7.22)で表される化合物であることが好ましい。 Further, the compound represented by the general formula (M-7) is preferably a compound represented by the formula (M-7.21) to the formula (M-7.24). 21) and a compound represented by the formula (M-7.22) are preferable.
Figure JPOXMLDOC01-appb-C000072
Figure JPOXMLDOC01-appb-C000072
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M)で表される化合物は、一般式(M-8)で表される化合物であることが好ましい。 Furthermore, the compound represented by the general formula (M) is preferably a compound represented by the general formula (M-8).
Figure JPOXMLDOC01-appb-C000073
Figure JPOXMLDOC01-appb-C000073
(式中、XM81からXM84はそれぞれ独立してフッ素原子又は水素原子を表し、YM81はフッ素原子、塩素原子又は-OCFを表し、RM81は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、AM81及びAM82はそれぞれ独立して、1,4-シクロヘキシレン基、1,4-フェニレン基又は ( Wherein , X M81 to X M84 each independently represents a fluorine atom or a hydrogen atom, Y M81 represents a fluorine atom, a chlorine atom or —OCF 3 , R M81 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and A M81 and A M82 are each independently 1,4-cyclohexylene group, 1,4-phenylene group or
Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000076
Figure JPOXMLDOC01-appb-C000076
を表すが、1,4-フェニレン基上の水素原子はフッ素原子によって置換されていてもよい。)
 本発明の組成物の総量に対しての一般式(M-8)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
However, the hydrogen atom on the 1,4-phenylene group may be substituted with a fluorine atom. )
The lower limit of the preferable content of the compound represented by formula (M-8) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-8)で表される化合物は、具体的には式(M-8.1)から式(M-8.4)で表される化合物であることが好ましく、中でも式(M-8.1)及び式(M-8.2)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.1) to the formula (M-8.4). Preferably, it is a compound, and among them, it is preferable to contain a compound represented by formula (M-8.1) or formula (M-8.2).
Figure JPOXMLDOC01-appb-C000077
Figure JPOXMLDOC01-appb-C000077
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、本発明の組成物に使用される一般式(M-8)で表される化合物は、具体的には式(M-8.11)から式(M-8.14)で表される化合物であることが好ましく、中でも式(M-8.12)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.11) to the formula (M-8.14). A compound is preferable, and among them, a compound represented by the formula (M-8.12) is preferably included.
Figure JPOXMLDOC01-appb-C000078
Figure JPOXMLDOC01-appb-C000078
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、本発明の組成物に使用される一般式(M-8)で表される化合物は、具体的には式(M-8.21)から式(M-8.24)で表される化合物であることが好ましく、中でも式(M-8.22)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.21) to the formula (M-8.24). A compound is preferable, and among them, a compound represented by the formula (M-8.22) is preferably contained.
Figure JPOXMLDOC01-appb-C000079
Figure JPOXMLDOC01-appb-C000079
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、本発明の組成物に使用される一般式(M-8)で表される化合物は、具体的には式(M-8.31)から式(M-8.34)で表される化合物であることが好ましく、中でも式(M-8.32)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.31) to the formula (M-8.34). A compound is preferable, and among them, a compound represented by the formula (M-8.32) is preferably contained.
Figure JPOXMLDOC01-appb-C000080
Figure JPOXMLDOC01-appb-C000080
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、本発明の組成物に使用される一般式(M-8)で表される化合物は、具体的には式(M-8.41)から式(M-8.44)で表される化合物であることが好ましく、中でも式(M-8.42)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by formula (M-8) used in the composition of the present invention is specifically represented by formula (M-8.41) to formula (M-8.44). A compound is preferable, and among them, a compound represented by the formula (M-8.42) is preferably included.
Figure JPOXMLDOC01-appb-C000081
Figure JPOXMLDOC01-appb-C000081
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、本発明の組成物に使用される一般式(M-8)で表される化合物は、具体的には式(M-8.51)から式(M-8.54)で表される化合物であることが好ましく、中でも式(M-8.52)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-8) used in the composition of the present invention is specifically represented by the formula (M-8.51) to the formula (M-8.54). A compound is preferable, and among them, a compound represented by the formula (M-8.52) is preferably included.
Figure JPOXMLDOC01-appb-C000082
Figure JPOXMLDOC01-appb-C000082
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 さらに、一般式(M)で表される化合物は、その構造中に下記の部分構造を有していてもよい。 Furthermore, the compound represented by the general formula (M) may have the following partial structure in its structure.
Figure JPOXMLDOC01-appb-C000083
Figure JPOXMLDOC01-appb-C000083
(式中の黒点は上記部分構造が結合している環構造中の炭素原子を表す。)
 上記部分構造を有する化合物として、一般式(M-10)~(M-18)で表される化合物であることが好ましい。
(The black spot in the formula represents a carbon atom in the ring structure to which the partial structure is bonded.)
The compound having the partial structure is preferably a compound represented by general formulas (M-10) to (M-18).
 一般式(M-10)で表される化合物は下記のものである。 The compound represented by the general formula (M-10) is as follows.
Figure JPOXMLDOC01-appb-C000084
Figure JPOXMLDOC01-appb-C000084
(式中、XM101及びXM102はそれぞれ独立してフッ素原子又は水素原子を表し、YM101はフッ素原子、塩素原子又は-OCFを表し、RM101は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、WM101及びWM102はそれぞれ独立して、-CH-又は-O-を表す。)
 本発明の組成物の総量に対しての一般式(M-10)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein , X M101 and X M102 each independently represent a fluorine atom or a hydrogen atom, Y M101 represents a fluorine atom, a chlorine atom or —OCF 3 , R M101 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and W M101 and W M102 each independently represent —CH 2 — or —O—.
The lower limit of the preferable content of the compound represented by the general formula (M-10) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-10)で表される化合物は、具体的には式(M-10.1)から式(M-10.12)で表される化合物であることが好ましく、中でも式(M-10.5)から式(M-10.12)で表される化合物を含有することが好ましい。 Further, the compound represented by formula (M-10) used in the composition of the present invention is specifically represented by formula (M-10.1) to formula (M-10.12). A compound is preferable, and among them, a compound represented by formula (M-10. 5) to formula (M-10.12) is preferably contained.
Figure JPOXMLDOC01-appb-C000085
Figure JPOXMLDOC01-appb-C000085
Figure JPOXMLDOC01-appb-C000086
Figure JPOXMLDOC01-appb-C000086
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(M-11)で表される化合物は下記のものである。 The compound represented by the general formula (M-11) is as follows.
Figure JPOXMLDOC01-appb-C000087
Figure JPOXMLDOC01-appb-C000087
(式中、XM111~XM114はそれぞれ独立してフッ素原子又は水素原子を表し、YM111はフッ素原子、塩素原子又は-OCFを表し、RM111は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表す。)
 本発明の組成物の総量に対しての一般式(M-11)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein , X M111 to X M114 each independently represents a fluorine atom or a hydrogen atom, Y M111 represents a fluorine atom, a chlorine atom or —OCF 3 , R M111 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms.)
The lower limit of the preferable content of the compound represented by the general formula (M-11) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-11)で表される化合物は、具体的には式(M-11.1)から式(M-11.8)で表される化合物であることが好ましく、中でも式(M-11.1)から式(M-11.4)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-11) used in the composition of the present invention is specifically represented by the formula (M-11.1) to the formula (M-11.8). A compound is preferable, and among them, a compound represented by formula (M-11.1) to formula (M-11.4) is preferably contained.
Figure JPOXMLDOC01-appb-C000088
Figure JPOXMLDOC01-appb-C000088
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(M-12)で表される化合物は下記のものである。 The compound represented by the general formula (M-12) is as follows.
Figure JPOXMLDOC01-appb-C000089
Figure JPOXMLDOC01-appb-C000089
(式中、XM121及びXM122はそれぞれ独立してフッ素原子又は水素原子を表し、YM121はフッ素原子、塩素原子又は-OCFを表し、RM121は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、WM121及びWM122はそれぞれ独立して、-CH-又は-O-を表す。)
 本発明の組成物の総量に対しての一般式(M-12)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein , X M121 and X M122 each independently represent a fluorine atom or a hydrogen atom, Y M121 represents a fluorine atom, a chlorine atom or —OCF 3 , R M121 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and W M121 and W M122 each independently represent —CH 2 — or —O—.
The lower limit of the preferable content of the compound represented by formula (M-12) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-12)で表される化合物は、具体的には式(M-12.1)から式(M-12.12)で表される化合物であることが好ましく、中でも式(M-12.5)から式(M-12.8)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-12) used in the composition of the present invention is specifically represented by the formula (M-12.1) to the formula (M-12.12). A compound is preferable, and among them, a compound represented by formula (M-12.5) to formula (M-12.8) is preferably contained.
Figure JPOXMLDOC01-appb-C000090
Figure JPOXMLDOC01-appb-C000090
Figure JPOXMLDOC01-appb-C000091
Figure JPOXMLDOC01-appb-C000091
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(M-13)で表される化合物は下記のものである。 The compound represented by the general formula (M-13) is as follows.
Figure JPOXMLDOC01-appb-C000092
Figure JPOXMLDOC01-appb-C000092
(式中、XM131~XM134はそれぞれ独立してフッ素原子又は水素原子を表し、YM131はフッ素原子、塩素原子又は-OCFを表し、RM131は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、WM131及びWM132はそれぞれ独立して、-CH-又は-O-を表す。)
 本発明の組成物の総量に対しての一般式(M-13)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein , X M131 to X M134 each independently represents a fluorine atom or a hydrogen atom, Y M131 represents a fluorine atom, a chlorine atom or —OCF 3 , R M131 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and W M131 and W M132 each independently represent —CH 2 — or —O—.
The lower limit of the preferable content of the compound represented by formula (M-13) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-13)で表される化合物は、具体的には式(M-13.1)から式(M-13.28)で表される化合物であることが好ましく、中でも式(M-13.1)から(M-13.4)、(M-13.11)から(M-13.14)、(M-13.25)から(M-13.28)で表される化合物を含有することが好ましい。
Furthermore, the compound represented by the general formula (M-13) used in the composition of the present invention is specifically represented by the formula (M-13.1) to the formula (M-13.28). It is preferable that the compound is a compound, and among them, from the formulas (M-13.1) to (M-13.4), (M-13.11) to (M-13.14), (M-13.25) to ( It is preferable to contain a compound represented by M-13.28).
Figure JPOXMLDOC01-appb-C000093
Figure JPOXMLDOC01-appb-C000093
Figure JPOXMLDOC01-appb-C000094
Figure JPOXMLDOC01-appb-C000094
Figure JPOXMLDOC01-appb-C000095
Figure JPOXMLDOC01-appb-C000095
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(M-14)で表される化合物は下記のものである。 The compound represented by the general formula (M-14) is as follows.
Figure JPOXMLDOC01-appb-C000096
Figure JPOXMLDOC01-appb-C000096
(式中、XM141~XM144はそれぞれ独立してフッ素原子又は水素原子を表し、YM141はフッ素原子、塩素原子又は-OCFを表し、RM141は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、WM141及びWM142はそれぞれ独立して、-CH-又は-O-を表す。)
 本発明の組成物の総量に対しての一般式(M-14)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein X M141 to X M144 each independently represents a fluorine atom or a hydrogen atom, Y M141 represents a fluorine atom, a chlorine atom or —OCF 3 , R M141 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and W M141 and W M142 each independently represent —CH 2 — or —O—.
The lower limit of the preferable content of the compound represented by the general formula (M-14) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-14)で表される化合物は、具体的には式(M-14.1)から式(M-14.8)で表される化合物であることが好ましく、中でも式(M-14.5)及び式(M-14.8)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-14) used in the composition of the present invention is specifically represented by the formula (M-14.1) to the formula (M-14.8). A compound is preferable, and among them, a compound represented by formula (M-14.5) and formula (M-14.8) is preferably contained.
Figure JPOXMLDOC01-appb-C000097
Figure JPOXMLDOC01-appb-C000097
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(M-15)で表される化合物は下記のものである。 The compound represented by the general formula (M-15) is as follows.
Figure JPOXMLDOC01-appb-C000098
Figure JPOXMLDOC01-appb-C000098
(式中、XM151及びXM152はそれぞれ独立してフッ素原子又は水素原子を表し、YM151はフッ素原子、塩素原子又は-OCFを表し、RM151は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、WM151及びWM152はそれぞれ独立して、-CH-又は-O-を表す。)
 本発明の組成物の総量に対しての一般式(M-15)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein X M151 and X M152 each independently represent a fluorine atom or a hydrogen atom, Y M151 represents a fluorine atom, a chlorine atom or —OCF 3 , R M151 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and W M151 and W M152 each independently represent —CH 2 — or —O—.
The lower limit of the preferred content of the compound represented by formula (M-15) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-15)で表される化合物は、具体的には式(M-15.1)から式(M-15.14)で表される化合物であることが好ましく、中でも式(M-15.5)から式(M-15.8)、式(M-15.11)から式(M-15.14)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-15) used in the composition of the present invention is specifically represented by the formulas (M-15.1) to (M-15.14). Preferably, the compound contains a compound represented by formula (M-15.5) to formula (M-15.8) or formula (M-15.11) to formula (M-15.14). It is preferable to do.
Figure JPOXMLDOC01-appb-C000099
Figure JPOXMLDOC01-appb-C000099
Figure JPOXMLDOC01-appb-C000100
Figure JPOXMLDOC01-appb-C000100
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(M-16)で表される化合物は下記のものである。 The compound represented by the general formula (M-16) is as follows.
Figure JPOXMLDOC01-appb-C000101
Figure JPOXMLDOC01-appb-C000101
(式中、XM161~XM164はそれぞれ独立してフッ素原子又は水素原子を表し、YM161はフッ素原子、塩素原子又は-OCFを表し、RM161は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表す。)
 本発明の組成物の総量に対しての一般式(M-16)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein X M161 to X M164 each independently represents a fluorine atom or a hydrogen atom, Y M161 represents a fluorine atom, a chlorine atom or —OCF 3 , R M161 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms.)
The lower limit of the preferable content of the compound represented by formula (M-16) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-16)で表される化合物は、具体的には式(M-16.1)から式(M-16.8)で表される化合物であることが好ましく、中でも式(M-16.1)から式(M-16.4)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-16) used in the composition of the present invention is specifically represented by the formula (M-16.1) to the formula (M-16.8). A compound is preferable, and among them, it is preferable to include a compound represented by Formula (M-16.1) to Formula (M-16.4).
Figure JPOXMLDOC01-appb-C000102
Figure JPOXMLDOC01-appb-C000102
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(M-17)で表される化合物は下記のものである。 The compound represented by the general formula (M-17) is as follows.
Figure JPOXMLDOC01-appb-C000103
Figure JPOXMLDOC01-appb-C000103
(式中、XM171~XM174はそれぞれ独立してフッ素原子又は水素原子を表し、YM171はフッ素原子、塩素原子又は-OCFを表し、RM171は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、WM171及びWM172はそれぞれ独立して、-CH-又は-O-を表す。)
 本発明の組成物の総量に対しての一般式(M-17)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
(Wherein, X M171 ~ X M174 are each independently a fluorine atom or a hydrogen atom, Y M171 fluorine atom, a chlorine atom or -OCF 3, R M171 is an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and W M171 and W M172 each independently represent —CH 2 — or —O—.
The lower limit of the preferable content of the compound represented by formula (M-17) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-17)で表される化合物は、具体的には式(M-17.1)から式(M-17.52)で表される化合物であることが好ましく、中でも式(M-17.9)から式(M-17.12)、式(M-17.21)から式(M-17.28)、式(M-17.45)から式(M-17.48)で表される化合物を含有することが好ましい。 Further, the compound represented by the general formula (M-17) used in the composition of the present invention is specifically represented by the formula (M-17.1) to the formula (M-17.52). Preferably, the compound is a compound (M-17.9) to (M-17.12), (M-17.21) to (M-17.28), (M-17. 45) to a compound represented by the formula (M-17.48) is preferably contained.
Figure JPOXMLDOC01-appb-C000104
Figure JPOXMLDOC01-appb-C000104
Figure JPOXMLDOC01-appb-C000105
Figure JPOXMLDOC01-appb-C000105
Figure JPOXMLDOC01-appb-C000106
Figure JPOXMLDOC01-appb-C000106
Figure JPOXMLDOC01-appb-C000107
Figure JPOXMLDOC01-appb-C000107
Figure JPOXMLDOC01-appb-C000108
Figure JPOXMLDOC01-appb-C000108
Figure JPOXMLDOC01-appb-C000109
Figure JPOXMLDOC01-appb-C000109
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(M-18)で表される化合物は下記のものである。 The compound represented by the general formula (M-18) is as follows.
Figure JPOXMLDOC01-appb-C000110
Figure JPOXMLDOC01-appb-C000110
(式中、XM181~XM186はそれぞれ独立してフッ素原子又は水素原子を表し、YM181はフッ素原子、塩素原子又は-OCFを表し、RM181は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表す。)
 本発明の組成物の総量に対しての一般式(M-18)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。
( Wherein X M181 to X M186 each independently represents a fluorine atom or a hydrogen atom, Y M181 represents a fluorine atom, a chlorine atom or —OCF 3 , R M181 represents an alkyl group having 1 to 5 carbon atoms, Represents an alkenyl group having 2 to 5 carbon atoms or an alkoxy group having 1 to 4 carbon atoms.)
The lower limit of the preferred content of the compound represented by formula (M-18) with respect to the total amount of the composition of the present invention is 1%, 2%, 4%, 5% Yes, 8%, 10%, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、焼き付きの発生しにくい組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when a composition that does not easily cause seizure is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、本発明の組成物に使用される一般式(M-18)で表される化合物は、具体的には式(M-18.1)から式(M-18.12)で表される化合物であることが好ましく、中でも式(M-18.5)から式(M-18.8)で表される化合物を含有することが好ましい。 Furthermore, the compound represented by the general formula (M-18) used in the composition of the present invention is specifically represented by the formula (M-18.1) to the formula (M-18.12). A compound is preferable, and among them, it is preferable to include a compound represented by Formula (M-18.5) to Formula (M-18.8).
Figure JPOXMLDOC01-appb-C000111
Figure JPOXMLDOC01-appb-C000111
Figure JPOXMLDOC01-appb-C000112
Figure JPOXMLDOC01-appb-C000112
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物は、一般式(K)で表される化合物を1種類又は2種類以上含有することが好ましい。これら化合物は誘電的に正の化合物(Δεが2より大きい。)に該当する。 The composition of the present invention preferably contains one or more compounds represented by the general formula (K). These compounds correspond to dielectrically positive compounds (Δε is greater than 2).
Figure JPOXMLDOC01-appb-C000113
Figure JPOXMLDOC01-appb-C000113
(式中、RK1は炭素原子数1~8のアルキル基を表し、該アルキル基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
 nK1は、0、1、2、3又は4を表し、
 AK1及びAK2はそれぞれ独立して、
(a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-又は-S-に置き換えられてもよい。)及び
(b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)
からなる群より選ばれる基を表し、上記の基(a)及び基(b)上の水素原子はそれぞれ独立してシアノ基、フッ素原子又は塩素原子で置換されていても良く、
 ZK1及びZK2はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-OCF-、-CFO-、-COO-、-OCO-又は-C≡C-を表し、
 nK1が2、3又は4であってAK2が複数存在する場合は、それらは同一であっても異なっていても良く、nK1が2、3又は4であってZK1が複数存在する場合は、それらは同一であっても異なっていても良く、
 XK1及びXK3はそれぞれ独立して水素原子、塩素原子又はフッ素原子を表し、
 XK2は、水素原子、フッ素原子、塩素原子、シアノ基、トリフルオロメチル基、フルオロメトキシ基、ジフルオロメトキシ基、トリフルオロメトキシ基又は2,2,2-トリフルオロエチル基を表す。)
 一般式(K)中、RK1は、炭素原子数1~8のアルキル基、炭素原子数1~8のアルコキシ基、炭素原子数2~8のアルケニル基又は炭素原子数2~8のアルケニルオキシ基が好ましく、炭素原子数1~5のアルキル基、炭素原子数1~5のアルコキシ基、炭素原子数2~5のアルケニル基又は炭素原子数2~5のアルケニルオキシ基が好ましく、炭素原子数1~5のアルキル基又は炭素原子数2~5のアルケニル基が更に好ましく、炭素原子数2~5のアルキル基又は炭素原子数2~3のアルケニル基が更に好ましく、炭素原子数3のアルケニル基(プロペニル基)が特に好ましい。
(Wherein R K1 represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently —CH═CH—, — Optionally substituted by C≡C—, —O—, —CO—, —COO— or —OCO—,
n K1 represents 0, 1, 2, 3 or 4;
A K1 and A K2 are each independently
(A) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O- or -S- And (b) a 1,4-phenylene group (one —CH═ present in this group or two or more non-adjacent —CH═ may be replaced by —N═).
A hydrogen atom on the group (a) and the group (b) may be independently substituted with a cyano group, a fluorine atom or a chlorine atom,
Z K1 and Z K2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C≡C—,
When n K1 is 2, 3 or 4 and a plurality of A K2 are present, they may be the same or different, and n K1 is 2, 3 or 4 and a plurality of Z K1 is present If they are the same or different,
X K1 and X K3 each independently represent a hydrogen atom, a chlorine atom or a fluorine atom,
X K2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a fluoromethoxy group, a difluoromethoxy group, a trifluoromethoxy group, or a 2,2,2-trifluoroethyl group. )
In general formula (K), R K1 represents an alkyl group having 1 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, or alkenyloxy having 2 to 8 carbon atoms. A group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms or an alkenyloxy group having 2 to 5 carbon atoms is preferable. An alkyl group having 1 to 5 carbon atoms or an alkenyl group having 2 to 5 carbon atoms is more preferable, an alkyl group having 2 to 5 carbon atoms or an alkenyl group having 2 to 3 carbon atoms is more preferable, and an alkenyl group having 3 carbon atoms. (Propenyl group) is particularly preferred.
 信頼性を重視する場合にはRK1はアルキル基であることが好ましく、粘性の低下を重視する場合にはアルケニル基であることが好ましい。 RK1 is preferably an alkyl group when importance is placed on reliability, and an alkenyl group is preferred when importance is placed on lowering viscosity.
 また、それが結合する環構造がフェニル基(芳香族)である場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び炭素原子数4~5のアルケニル基が好ましく、それが結合する環構造がシクロヘキサン、ピラン及びジオキサンなどの飽和した環構造の場合には、直鎖状の炭素原子数1~5のアルキル基、直鎖状の炭素原子数1~4のアルコキシ基及び直鎖状の炭素原子数2~5のアルケニル基が好ましい。ネマチック相を安定化させるためには炭素原子及び存在する場合酸素原子の合計が5以下であることが好ましく、直鎖状であることが好ましい。 Further, when the ring structure to which it is bonded is a phenyl group (aromatic), a linear alkyl group having 1 to 5 carbon atoms, a linear alkoxy group having 1 to 4 carbon atoms and carbon An alkenyl group having 4 to 5 atoms is preferable, and when the ring structure to which the alkenyl group is bonded is a saturated ring structure such as cyclohexane, pyran and dioxane, a linear alkyl group having 1 to 5 carbon atoms, a straight chain A straight-chain alkoxy group having 1 to 4 carbon atoms and a straight-chain alkenyl group having 2 to 5 carbon atoms are preferred. In order to stabilize the nematic phase, the total of carbon atoms and oxygen atoms, if present, is preferably 5 or less, and is preferably linear.
 アルケニル基としては、式(R1)から式(R5)のいずれかで表される基から選ばれることが好ましい。(各式中の黒点はアルケニル基が結合している環構造中の炭素原子を表す。) The alkenyl group is preferably selected from groups represented by any of the formulas (R1) to (R5). (The black dot in each formula represents the carbon atom in the ring structure to which the alkenyl group is bonded.)
Figure JPOXMLDOC01-appb-C000114
Figure JPOXMLDOC01-appb-C000114
 AK1及びAK2はそれぞれ独立してΔnを大きくすることが求められる場合には芳香族であることが好ましく、応答速度を改善するためには脂肪族であることが好ましく、トランス-1,4-シクロへキシレン基、1,4-フェニレン基、2-フルオロ-1,4-フェニレン基、3-フルオロ-1,4-フェニレン基、3,5-ジフルオロ-1,4-フェニレン基、2,3-ジフルオロ-1,4-フェニレン基、1,4-シクロヘキセニレン基、1,4-ビシクロ[2.2.2]オクチレン基、ピペリジン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基を表すことが好ましく、下記の構造を表すことがより好ましく、 A K1 and A K2 are preferably aromatic when it is required to independently increase Δn, and are preferably aliphatic for improving the response speed, and trans-1,4 -Cyclohexylene group, 1,4-phenylene group, 2-fluoro-1,4-phenylene group, 3-fluoro-1,4-phenylene group, 3,5-difluoro-1,4-phenylene group, 2, 3-difluoro-1,4-phenylene group, 1,4-cyclohexenylene group, 1,4-bicyclo [2.2.2] octylene group, piperidine-1,4-diyl group, naphthalene-2,6- It preferably represents a diyl group, decahydronaphthalene-2,6-diyl group or 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, and more preferably represents the following structure:
Figure JPOXMLDOC01-appb-C000115
Figure JPOXMLDOC01-appb-C000115
下記の構造を表すことがより好ましい。 It is more preferable to represent the following structure.
Figure JPOXMLDOC01-appb-C000116
Figure JPOXMLDOC01-appb-C000116
 ZK1及びZK2はそれぞれ独立して-CHO-、-CFO-、-CHCH-、-CFCF-又は単結合を表すことが好ましく、-CFO-、-CHCH-又は単結合が更に好ましく、-CFO-又は単結合が特に好ましい。 Z K1 and Z K2 are each independently -CH 2 O -, - CF 2 O -, - CH 2 CH 2 -, - CF 2 CF 2 - or preferably a single bond, -CF 2 O-, —CH 2 CH 2 — or a single bond is more preferable, and —CF 2 O— or a single bond is particularly preferable.
 nK1は、0、1、2又は3が好ましく、0、1又は2が好ましく、Δεの改善に重点を置く場合には0又は1が好ましく、Tniを重視する場合には1又は2が好ましい。 n K1 is preferably 0, 1, 2 or 3, preferably 0, 1 or 2, preferably 0 or 1 when emphasizing the improvement of Δε, and preferably 1 or 2 when emphasizing Tni. .
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類である。またさらに、本発明の別の実施形態では4種類であり、5種類であり、6種類であり、7種類以上である。 There are no particular restrictions on the types of compounds that can be combined, but they are used in combination according to desired performance such as solubility at low temperatures, transition temperature, electrical reliability, and refractive index anisotropy. For example, in one embodiment of the present invention, there are one kind, two kinds, and three kinds of compounds to be used. Furthermore, in another embodiment of the present invention, there are four types, five types, six types, and seven or more types.
 本発明の組成物において、一般式(K)で表される化合物の含有量は、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性、プロセス適合性、滴下痕、焼き付き、誘電率異方性などの求められる性能に応じて適宜調整する必要がある。 In the composition of the present invention, the content of the compound represented by the general formula (K) is low-temperature solubility, transition temperature, electrical reliability, refractive index anisotropy, process suitability, dripping marks, It is necessary to adjust appropriately according to required performance such as image sticking and dielectric anisotropy.
 本発明の組成物の総量に対しての式(K)で表される化合物の好ましい含有量の下限値は、1%であり、10%であり、20%であり、30%であり、40%であり、50%であり、55%であり、60%であり、65%であり、70%であり、75%であり、80%である。好ましい含有量の上限値は、本発明の組成物の総量に対して、例えば本発明の一つの形態では95%であり、85%であり、75%であり、65%であり、55%であり、45%であり、35%であり、25%である。 The lower limit of the preferable content of the compound represented by the formula (K) with respect to the total amount of the composition of the present invention is 1%, 10%, 20%, 30%, 40% %, 50%, 55%, 60%, 65%, 70%, 75%, 80%. The upper limit of the preferable content is, for example, 95%, 85%, 75%, 65%, and 55% with respect to the total amount of the composition of the present invention. Yes, 45%, 35%, 25%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 一般式(K)で表される化合物は、例えば一般式(K-1)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (K) is preferably a compound selected from the group of compounds represented by the general formula (K-1), for example.
Figure JPOXMLDOC01-appb-C000117
Figure JPOXMLDOC01-appb-C000117
(式中、RK11は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XK11~XK14はそれぞれ独立して水素原子又はフッ素原子を表し、YK11はフッ素原子又はOCFを表す。)
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類以上である。
(Wherein R K11 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X K11 to X K14 are each independently hydrogen. represents an atom or a fluorine atom, Y K11 represents a fluorine atom or OCF 3.)
Although there is no restriction | limiting in particular in the kind of compound which can be combined, It uses combining according to desired performances, such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy. The type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
 本発明の組成物の総量に対しての式(K-1)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (K-1) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(K-1)で表される化合物は、具体的には式(K-1.1)から式(K-1.4)で表される化合物であることが好ましく、式(K-1.1)又は式(K-1.2)で表される化合物が好ましく、式(K-1.2)で表される化合物がさらに好ましい。また、式(K-1.1)又は式(K-1.2)で表される化合物を同時に使用することも好ましい。 Further, the compound represented by the general formula (K-1) is specifically preferably a compound represented by the formula (K-1.1) to the formula (K-1.4). A compound represented by formula (K-1.2) is preferred, and a compound represented by formula (K-1.2) is more preferred. It is also preferred to use the compounds represented by formula (K-1.1) or formula (K-1.2) at the same time.
Figure JPOXMLDOC01-appb-C000118
Figure JPOXMLDOC01-appb-C000118
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(K)で表される化合物は、例えば一般式(K-2)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by General Formula (K) is preferably a compound selected from the group of compounds represented by General Formula (K-2), for example.
Figure JPOXMLDOC01-appb-C000119
Figure JPOXMLDOC01-appb-C000119
(式中、RK21は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XK21~XK24はそれぞれ独立して水素原子又はフッ素原子を表し、YK21はフッ素原子又はOCFを表す。)
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類以上である。
(Wherein R K21 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X K21 to X K24 are each independently hydrogen. represents an atom or a fluorine atom, Y K21 represents a fluorine atom or OCF 3.)
Although there is no restriction | limiting in particular in the kind of compound which can be combined, It uses combining according to desired performances, such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy. The type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
 本発明の組成物の総量に対しての式(K-2)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (K-2) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(K-2)で表される化合物は、具体的には式(K-2.1)から式(K-2.6)で表される化合物であることが好ましく、式(K-2.5)又は式(K-2.6)で表される化合物が好ましく、式(K-2.6)で表される化合物がさらに好ましい。また、式(K-2.5)又は式(K-2.6)で表される化合物を同時に使用することも好ましい。 Further, the compound represented by the general formula (K-2) is specifically preferably a compound represented by the formula (K-2.1) to the formula (K-2.6). A compound represented by formula (K-2.5) or formula (K-2.6) is preferred, and a compound represented by formula (K-2.6) is more preferred. It is also preferred to use the compounds represented by formula (K-2.5) or formula (K-2.6) at the same time.
Figure JPOXMLDOC01-appb-C000120
Figure JPOXMLDOC01-appb-C000120
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(K)で表される化合物は、例えば一般式(K-3)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by General Formula (K) is preferably a compound selected from the group of compounds represented by General Formula (K-3), for example.
Figure JPOXMLDOC01-appb-C000121
Figure JPOXMLDOC01-appb-C000121
(式中、RK31は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XK31~XK36はそれぞれ独立して水素原子又はフッ素原子を表し、YK31はフッ素原子又はOCFを表す。)
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類以上である。
(Wherein R K31 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X K31 to X K36 are each independently hydrogen. Represents an atom or a fluorine atom, and Y K31 represents a fluorine atom or OCF 3. )
Although there is no restriction | limiting in particular in the kind of compound which can be combined, It uses combining according to desired performances, such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy. The type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
 本発明の組成物の総量に対しての式(K-3)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (K-3) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(K-3)で表される化合物は、具体的には式(K-3.1)から式(K-3.4)で表される化合物であることが好ましく、式(K-3.1)又は式(K-3.2)で表される化合物であることがより好ましい。また、式(K-3.1)および式(K-3.2)で表される化合物を同時に使用することも好ましい。 Further, the compound represented by the general formula (K-3) is preferably a compound represented by the formula (K-3.1) to the formula (K-3.4). A compound represented by K-3.1) or formula (K-3.2) is more preferable. It is also preferred to use the compounds represented by formula (K-3.1) and formula (K-3.2) at the same time.
Figure JPOXMLDOC01-appb-C000122
Figure JPOXMLDOC01-appb-C000122
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(K)で表される化合物は、例えば一般式(K-4)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (K) is preferably, for example, a compound selected from the group of compounds represented by the general formula (K-4).
Figure JPOXMLDOC01-appb-C000123
Figure JPOXMLDOC01-appb-C000123
(式中、RK41は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XK41~XK46はそれぞれ独立して水素原子又はフッ素原子を表し、YK41はフッ素原子又はOCFを表し、ZK41は-OCH-、-CHO-、-OCF-又は-CFO-を表す。)
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類以上である。
(Wherein R K41 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X K41 to X K46 are each independently hydrogen. An atom or a fluorine atom, Y K41 represents a fluorine atom or OCF 3 , and Z K41 represents —OCH 2 —, —CH 2 O—, —OCF 2 —, or —CF 2 O—.
Although there is no restriction | limiting in particular in the kind of compound which can be combined, It uses combining according to desired performances, such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy. The type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
 本発明の組成物の総量に対しての式(K-4)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (K-4) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(K-4)で表される化合物は、具体的には式(K-4.1)から式(K-4.18)で表される化合物であることが好ましく、式(K-4.1)、式(K-4.2)、式(K-4.11)、(K-4.12)で表される化合物がより好ましい。また、式(K-4.1)、式(K-4.2)、式(K-4.11)、(K-4.12)で表される化合物を同時に使用することも好ましい。 Further, the compound represented by the general formula (K-4) is preferably a compound represented by the formula (K-4.1) to the formula (K-4.18). More preferred are compounds represented by (K-4.1), formula (K-4.2), formula (K-4.11), and (K-4.12). It is also preferred to use compounds represented by formula (K-4.1), formula (K-4.2), formula (K-4.11), and (K-4.12) at the same time.
Figure JPOXMLDOC01-appb-C000124
Figure JPOXMLDOC01-appb-C000124
Figure JPOXMLDOC01-appb-C000125
Figure JPOXMLDOC01-appb-C000125
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(K)で表される化合物は、例えば一般式(K-5)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by the general formula (K) is preferably a compound selected from, for example, a compound group represented by the general formula (K-5).
Figure JPOXMLDOC01-appb-C000126
Figure JPOXMLDOC01-appb-C000126
(式中、RK51は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XK51~XK56はそれぞれ独立して水素原子又はフッ素原子を表し、YK51はフッ素原子又はOCFを表し、ZK51は-OCH-、-CHO-、-OCF-又は-CFO-を表す。)
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類以上である。
(Wherein R K51 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X K51 to X K56 are each independently hydrogen. An atom or a fluorine atom, Y K51 represents a fluorine atom or OCF 3 , and Z K51 represents —OCH 2 —, —CH 2 O—, —OCF 2 —, or —CF 2 O—.
Although there is no restriction | limiting in particular in the kind of compound which can be combined, It uses combining according to desired performances, such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy. The type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
 本発明の組成物の総量に対しての式(K-5)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (K-5) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(K-5)で表される化合物は、具体的には式(K-5.1)から式(K-5.18)で表される化合物であることが好ましく、式(K-5.11)から式(K-5.14)で表される化合物が好ましく、式(K-5.12)で表される化合物がさらに好ましい。 Further, the compound represented by the general formula (K-5) is preferably a compound represented by the formula (K-5.1) to the formula (K-5.18). A compound represented by the formula (K-5.14) to the compound represented by the formula (K-5.14) is preferable, and a compound represented by the formula (K-5.12) is more preferable.
Figure JPOXMLDOC01-appb-C000127
Figure JPOXMLDOC01-appb-C000127
Figure JPOXMLDOC01-appb-C000128
Figure JPOXMLDOC01-appb-C000128
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 一般式(K)で表される化合物は、例えば一般式(K-6)で表される化合物群から選ばれる化合物であることが好ましい。 The compound represented by General Formula (K) is preferably a compound selected from the group of compounds represented by General Formula (K-6), for example.
Figure JPOXMLDOC01-appb-C000129
Figure JPOXMLDOC01-appb-C000129
(式中、RK61は炭素原子数1~5のアルキル基、炭素原子数2~5のアルケニル基又は炭素原子数1~4のアルコキシ基を表し、XK61~XK68はそれぞれ独立して水素原子又はフッ素原子を表し、YK61はフッ素原子又はOCFを表し、ZK61は-OCH-、-CHO-、-OCF-又は-CFO-を表す。)
 組み合わせることができる化合物の種類に特に制限は無いが、低温での溶解性、転移温度、電気的な信頼性、屈折率異方性などの所望の性能に応じて組み合わせて使用する。使用する化合物の種類は、例えば本発明の一つの実施形態としては1種類であり、2種類であり、3種類以上である。
( Wherein R K61 represents an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkoxy group having 1 to 4 carbon atoms, and X K61 to X K68 are each independently hydrogen. represents an atom or a fluorine atom, Y K61 represents a fluorine atom or OCF 3, Z K61 is -OCH 2 -, - CH 2 O -, - OCF 2 - or an -CF 2 O-).
Although there is no restriction | limiting in particular in the kind of compound which can be combined, It uses combining according to desired performances, such as solubility at low temperature, transition temperature, electrical reliability, refractive index anisotropy. The type of the compound used is, for example, one type as one embodiment of the present invention, two types, and three or more types.
 本発明の組成物の総量に対しての式(K-6)で表される化合物の好ましい含有量の下限値は、1%であり、2%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%であり、22%であり、25%であり、30%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferable content of the compound represented by the formula (K-6) with respect to the total amount of the composition of the present invention is 1%, 2%, 5%, 8% 10%, 13%, 15%, 18%, 20%, 22%, 25%, 30%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明の組成物の粘度を低く保ち、応答速度が速い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。さらに、本発明の組成物のTniを高く保ち、温度安定性の良い組成物が必要な場合は上記の下限値を低めに、上限値を低めにすることが好ましい。また、駆動電圧を低く保つために誘電率異方性を大きくしたいときは、上記の下限値を高めに、上限値を高めにすることが好ましい。 When the composition of the present invention keeps the viscosity low and a composition having a high response speed is required, it is preferable to lower the lower limit and lower the upper limit. Furthermore, when the composition of the present invention keeps Tni high and a composition having good temperature stability is required, it is preferable to lower the lower limit and lower the upper limit. Further, when it is desired to increase the dielectric anisotropy in order to keep the driving voltage low, it is preferable to increase the upper limit value while increasing the lower limit value.
 さらに、一般式(K-6)で表される化合物は、具体的には式(K-6.1)から式(K-6.18)で表される化合物であることが好ましく、式(K-6.15)から式(K-6.18)で表される化合物が好ましく、式(K-6.16)及び式(K-6.17)で表される化合物がさらに好ましい。また、式(K-6.16)と式(K-6.17)で表される化合物を同時に使用することも好ましい。 Further, the compound represented by the general formula (K-6) is preferably a compound represented by the formula (K-6.1) to the formula (K-6.18). Compounds represented by formula (K-6.18) to formula (K-6.18) are preferred, and compounds represented by formula (K-6.16) and formula (K-6.17) are more preferred. It is also preferred to use the compounds represented by formula (K-6.16) and formula (K-6.17) at the same time.
Figure JPOXMLDOC01-appb-C000130
Figure JPOXMLDOC01-appb-C000130
Figure JPOXMLDOC01-appb-C000131
Figure JPOXMLDOC01-appb-C000131
 本発明の組成物の総量に対してのこれら化合物の好ましい含有量の下限値は、1%であり、2%であり、4%であり、5%であり、8%であり、10%であり、13%であり、15%であり、18%であり、20%である。好ましい含有量の上限値は、30%であり、28%であり、25%であり、23%であり、20%であり、18%であり、15%であり、13%であり、10%であり、8%であり、5%である。 The lower limit of the preferred content of these compounds relative to the total amount of the composition of the present invention is 1%, 2%, 4%, 5%, 8%, 10% Yes, 13%, 15%, 18%, 20%. The upper limit of the preferred content is 30%, 28%, 25%, 23%, 20%, 18%, 15%, 13%, 10% 8% and 5%.
 本発明に係る液晶組成物の好ましい実施形態は、第一成分としては、下記の一般式(I-a)及び一般式(I-b): In a preferred embodiment of the liquid crystal composition according to the present invention, as a first component, the following general formula (Ia) and general formula (Ib):
Figure JPOXMLDOC01-appb-C000132
Figure JPOXMLDOC01-appb-C000132
(上記一般式(I-a)および(I-b)中、R1a及びR2aはそれぞれ一般式(i)におけるRi1と同じ意味を表し、R1b及びR2bはそれぞれ一般式(i)におけるRi2と同じ意味を表し、n1bは1又は2を表し、A1bはそれぞれ独立して、トランス-1,4-シクロへキシレン基、1,3-ジオキサン-2,5-ジイル基、テトラヒドロピラン-2,5-ジイル基、1,4-フェニレン基、1,4-シクロヘキセニレン基またはナフタレン-2,6-ジイル基を表し、該基中の1つの水素原子はフッ素原子に置換されていてもよい。)で表される化合物群の中から少なくとも1種または2種類が選択されることが好ましく、より好ましくは3種類選択されることが好ましい。 (In the above general formulas (Ia) and (Ib), R 1a and R 2a represent the same meaning as R i1 in the general formula (i), respectively, and R 1b and R 2b represent the general formula (i), respectively. represents the same meaning as R i2 in, n 1b represents 1 or 2, a 1b are each independently trans-1,4-cyclohexylene group, 1,3-dioxane-2,5-diyl group, Represents a tetrahydropyran-2,5-diyl group, a 1,4-phenylene group, a 1,4-cyclohexenylene group or a naphthalene-2,6-diyl group, and one hydrogen atom in the group is substituted with a fluorine atom It is preferable that at least one or two types are selected from the group of compounds represented by :), more preferably three types are selected.
 また、一般式(I-a)及び一般式(I-b)で表される化合物群の中から少なくとも2種類が選択される化合物は、液晶組成物全体のうち25~99質量%含有していることが好ましく、30~80質量%含有していることがより好ましく、35~60質量%含有していることがさらに好ましく、40~55質量%含有していることがよりさらに好ましい。 Further, at least two compounds selected from the compound group represented by the general formula (Ia) and the general formula (Ib) are contained in an amount of 25 to 99% by mass in the entire liquid crystal composition. The content is preferably 30 to 80% by mass, more preferably 35 to 60% by mass, and still more preferably 40 to 55% by mass.
 当該一般式(I-a)及び一般式(I-b)との組み合わせが液晶組成物全体の20~70%占めていると高速応答性の効果を奏し、さらに後述の第二成分の組み合わせと併用すると化学構造上または特異性の観点で相溶性が向上し、保存安定性が向上するため液晶化合物の析出の問題を抑制・防止することができる。 When the combination of the general formula (Ia) and the general formula (Ib) occupies 20 to 70% of the entire liquid crystal composition, an effect of high-speed response is obtained. When used in combination, compatibility is improved from the viewpoint of chemical structure or specificity, and storage stability is improved, so that the problem of precipitation of the liquid crystal compound can be suppressed / prevented.
 本発明に係る液晶組成物のより好ましい実施形態は、第二成分としての一般式(II-a)及び一般式(II-b) More preferred embodiments of the liquid crystal composition according to the present invention include the general formula (II-a) and the general formula (II-b) as the second component.
Figure JPOXMLDOC01-appb-C000133
Figure JPOXMLDOC01-appb-C000133
(上記一般式(II-a)および(II-b)中、R3a及びR3bはそれぞれ一般式(i)におけるRi1と同じ意味を表し、X1a及びX1bは、フッ素原子、-OCFまたは-CFを表し、A2aおよびA2bはそれぞれ独立して、トランス-1,4-シクロへキシレン基、1,3-ジオキサン-2,5-ジイル基、テトラヒドロピラン-2,5-ジイル基、1,4-フェニレン基、1,4-シクロヘキセニレン基またはナフタレン-2,6-ジイル基を表し、該基中の1つの水素原子はフッ素原子に置換されていてもよい。Z2aおよびZ2bはそれぞれ独立して、単結合、-CFO-、OCF-、CHO-または-OCH-を表し、m2aおよびm2bは1又は2を表す。また、m2aおよびm2bが2のときは、A2aおよびA2bはそれぞれ同一であっても異なっても良く、Z2aおよびZ2bはそれぞれ同一であっても異なっても良い。)で表される化合物の中から少なくとも1種または2種類の化合物が選択されることが好ましい。 (In the above general formulas (II-a) and (II-b), R 3a and R 3b represent the same meaning as R i1 in the general formula (i), respectively, X 1a and X 1b represent a fluorine atom, —OCF 3 or —CF 3 , wherein A 2a and A 2b are each independently a trans-1,4-cyclohexylene group, 1,3-dioxane-2,5-diyl group, tetrahydropyran-2,5- Represents a diyl group, a 1,4-phenylene group, a 1,4-cyclohexenylene group or a naphthalene-2,6-diyl group, and one hydrogen atom in the group may be substituted with a fluorine atom. 2a and Z 2b each independently represents a single bond, —CF 2 O—, OCF 2 —, CH 2 O— or —OCH 2 —, and m 2a and m 2b represent 1 or 2. m 2a and m 2b When the 2, may be identical or different each A 2a and A 2b, at least from the Z 2a and Z 2b may each be the same or different.) And a compound represented by 1 It is preferred that a species or two types of compounds are selected.
 当該一般式(II-a)と一般式(II-b)との組み合わせが液晶組成物全体の5~35%占めていると、Δnの向上と駆動可能なΔεとを確保する効果を奏し、さらに第一成分の好適な組み合わせと併用させ、当該第一成分の総量が第二成分の量より多く含まれると高速応答性を維持できる。さらに一般式(II-a)または一般式(II-b)と、一般式(I-a)または一般式(I-b)との組み合わせが特異的に液晶組成物の成分の化合物同士の相溶性を向上させるため、液晶組成物の保存安定性が向上することにより液晶化合物の析出の問題を抑制・防止することができる。 When the combination of the general formula (II-a) and the general formula (II-b) occupies 5 to 35% of the entire liquid crystal composition, an effect of ensuring an improvement of Δn and a driveable Δε is obtained. Furthermore, when it is used in combination with a suitable combination of the first component and the total amount of the first component is greater than the amount of the second component, high-speed response can be maintained. Further, the combination of the general formula (II-a) or the general formula (II-b) and the general formula (Ia) or the general formula (Ib) is a phase between the compounds of the components of the liquid crystal composition. In order to improve the solubility, the storage stability of the liquid crystal composition is improved, whereby the problem of precipitation of the liquid crystal compound can be suppressed / prevented.
 すなわち、本発明に係る液晶組成物において、第一成分として一般式(I-a)及び一般式(I-a)で表される化合物群の中から少なくとも1種または2種類以上の化合物を選択し、かつ第二成分として、一般式(IIa)及び一般式(IIb)で表される化合物群の中から少なくとも2種類選択すると、液晶化合物が析出するという低温安定性に関する問題だけでなく、滴下痕の問題点、高速応答性を維持するという効果を全て達成することができる。 That is, in the liquid crystal composition according to the present invention, as the first component, at least one compound or two or more compounds are selected from the compound group represented by the general formula (Ia) and the general formula (Ia). In addition, when at least two kinds are selected as the second component from the compound group represented by the general formula (IIa) and the general formula (IIb), not only the problem regarding the low temperature stability that the liquid crystal compound is precipitated, but also the dropwise addition All of the problems of scars and the effect of maintaining high-speed response can be achieved.
 本発明の組成物の総量に対しての一般式(i)および一般式(J)で表される化合物の合計の好ましい含有量の下限値は、80%であり、85%であり、88%であり、90%であり、92%であり、93%であり、94%であり、95%であり、96%であり、97%であり、98%であり、99%であり、100%である。好ましい含有量の上限値は、100%であり、99%であり、98%であり、95%である。 The lower limit value of the total content of the compounds represented by the general formula (i) and the general formula (J) with respect to the total amount of the composition of the present invention is 80%, 85%, 88% 90%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99%, 100% It is. The upper limit of the preferable content is 100%, 99%, 98%, and 95%.
 本発明の組成物の総量に対しての一般式(i)、一般式(M)及び(K)で表される化合物の合計の好ましい含有量の下限値は、80%であり、85%であり、88%であり、90%であり、92%であり、93%であり、94%であり、95%であり、96%であり、97%であり、98%であり、99%であり、100%である。好ましい含有量の上限値は、100%であり、99%であり、98%であり、95%である。 The lower limit of the preferable total content of the compounds represented by the general formula (i), general formula (M) and (K) with respect to the total amount of the composition of the present invention is 80% and 85%. Yes, 88%, 90%, 92%, 93%, 94%, 95%, 96%, 97%, 98%, 99% Yes, 100%. The upper limit of the preferable content is 100%, 99%, 98%, and 95%.
 本発明の組成物の総量に対しての一般式(i)、一般式(M-1)から一般式(M-18)及び一般式(K-1)から一般式(K-6)で表される化合物の合計の好ましい含有量の下限値は、80%であり、85%であり、88%であり、90%であり、92%であり、93%であり、94%であり、95%であり、96%であり、97%であり、98%であり、99%であり、100%である。好ましい含有量の上限値は、100%であり、99%であり、98%であり、95%である。 The formula (i), the general formula (M-1) to the general formula (M-18), and the general formula (K-1) to the general formula (K-6) with respect to the total amount of the composition of the present invention. The lower limit of the preferable total content of the compounds to be obtained is 80%, 85%, 88%, 90%, 92%, 93%, 94%, 95% %, 96%, 97%, 98%, 99%, 100%. The upper limit of the preferable content is 100%, 99%, 98%, and 95%.
 本願発明の組成物は、分子内に過酸(-CO-OO-)構造等の酸素原子同士が結合した構造を持つ化合物を含有しないことが好ましい。 The composition of the present invention preferably does not contain a compound having a structure in which oxygen atoms such as a peracid (—CO—OO—) structure are bonded in the molecule.
 組成物の信頼性及び長期安定性を重視する場合にはカルボニル基を有する化合物の含有量を前記組成物の総質量に対して5%以下とすることが好ましく、3%以下とすることがより好ましく、1%以下とすることが更に好ましく、実質的に含有しないことが最も好ましい。 When emphasizing the reliability and long-term stability of the composition, the content of the compound having a carbonyl group is preferably 5% or less, more preferably 3% or less with respect to the total mass of the composition. Preferably, it is more preferably 1% or less, and most preferably not substantially contained.
 UV照射による安定性を重視する場合、塩素原子が置換している化合物の含有量を前記組成物の総質量に対して15%以下とすることが好ましく、10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。 When importance is attached to the stability by UV irradiation, the content of the compound substituted with chlorine atoms is preferably 15% or less, preferably 10% or less, based on the total mass of the composition. % Or less, preferably 5% or less, more preferably 3% or less, and still more preferably substantially not contained.
 分子内の環構造がすべて6員環である化合物の含有量を多くすることが好ましく、分子内の環構造がすべて6員環である化合物の含有量を前記組成物の総質量に対して80%以上とすることが好ましく、90%以上とすることがより好ましく、95%以上とすることが更に好ましく、実質的に分子内の環構造がすべて6員環である化合物のみで組成物を構成することが最も好ましい。 It is preferable to increase the content of a compound in which all the ring structures in the molecule are 6-membered rings, and the content of the compound in which all the ring structures in the molecule are 6-membered rings is 80% relative to the total mass of the composition. % Or more, more preferably 90% or more, still more preferably 95% or more, and the composition is composed only of a compound in which all of the ring structures in the molecule are all 6-membered rings. Most preferably.
 組成物の酸化による劣化を抑えるためには、環構造としてシクロヘキセニレン基を有する化合物の含有量を少なくすることが好ましく、シクロヘキセニレン基を有する化合物の含有量を前記組成物の総質量に対して10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。 In order to suppress deterioration due to oxidation of the composition, it is preferable to reduce the content of the compound having a cyclohexenylene group as a ring structure, and the content of the compound having a cyclohexenylene group as the total mass of the composition. On the other hand, it is preferably 10% or less, preferably 8% or less, more preferably 5% or less, preferably 3% or less, and still more preferably not contained.
 粘度の改善及びTniの改善を重視する場合には、水素原子がハロゲンに置換されていてもよい2-メチルベンゼン-1,4-ジイル基を分子内に持つ化合物の含有量を少なくすることが好ましく、前記2-メチルベンゼン-1,4-ジイル基を分子内に持つ化合物の含有量を前記組成物の総質量に対して10%以下とすることが好ましく、8%以下とすることが好ましく、5%以下とすることがより好ましく、3%以下とすることが好ましく、実質的に含有しないことが更に好ましい。 When importance is attached to improvement of viscosity and improvement of Tni, the content of a compound having a 2-methylbenzene-1,4-diyl group in the molecule, in which a hydrogen atom may be substituted with a halogen, may be reduced. Preferably, the content of the compound having a 2-methylbenzene-1,4-diyl group in the molecule is preferably 10% or less, more preferably 8% or less, based on the total mass of the composition. It is more preferably 5% or less, further preferably 3% or less, and still more preferably substantially not contained.
 本願において実質的に含有しないとは、意図せずに含有する物を除いて含有しないという意味である。 “Substantially not contained” in the present application means that it is not contained except for an unintentionally contained product.
 本発明の第一実施形態の組成物に含有される化合物が、側鎖としてアルケニル基を有する場合、前記アルケニル基がシクロヘキサンに結合している場合には当該アルケニル基の炭素原子数は2~5であることが好ましく、前記アルケニル基がベンゼンに結合している場合には当該アルケニル基の炭素原子数は4~5であることが好ましく、前記アルケニル基の不飽和結合とベンゼンは直接結合していないことが好ましい。 When the compound contained in the composition of the first embodiment of the present invention has an alkenyl group as a side chain, when the alkenyl group is bonded to cyclohexane, the alkenyl group has 2 to 5 carbon atoms. When the alkenyl group is bonded to benzene, the number of carbon atoms of the alkenyl group is preferably 4 to 5, and the unsaturated bond of the alkenyl group and benzene are directly bonded. Preferably not.
 本発明に係る液晶層および/または液晶組成物には、重合性モノマーおよび/または当該重合性モノマーの硬化物(すなわち、当該重合性モノマー由来のポリマー)を含有してもよく、当該重合性モノマーは液晶性を示すことが好ましい。すなわち、本発明に係る液晶層は、液晶組成物に含まれる重合性モノマーをポリマー化していることが好ましい。本発明に係る重合性モノマー含有液晶組成物中の重合性モノマーの具体的な含有量としては、5%以下が好ましく、2%以下がより好ましく、1.5%以下が更に好ましく、1%以下が特に好ましく、0.5%以下が最も好ましい。5%以下であると、滴下痕の発生を低減することができる。また、液晶組成物における重合性モノマーの含有量の下限値は1000ppmであることが好ましく、3000ppmであることが好ましく、5000ppmであることがより好ましい。 The liquid crystal layer and / or liquid crystal composition according to the present invention may contain a polymerizable monomer and / or a cured product of the polymerizable monomer (that is, a polymer derived from the polymerizable monomer). Preferably exhibits liquid crystallinity. That is, the liquid crystal layer according to the present invention is preferably a polymerized polymerizable monomer contained in the liquid crystal composition. The specific content of the polymerizable monomer in the polymerizable monomer-containing liquid crystal composition according to the present invention is preferably 5% or less, more preferably 2% or less, still more preferably 1.5% or less, and further preferably 1% or less. Is particularly preferable, and 0.5% or less is most preferable. Generation | occurrence | production of dripping marks can be reduced as it is 5% or less. Further, the lower limit of the content of the polymerizable monomer in the liquid crystal composition is preferably 1000 ppm, more preferably 3000 ppm, and more preferably 5000 ppm.
 液晶組成物に重合性モノマーおよび/または当該重合性モノマーの硬化物を含むと、当該重合性モノマーを硬化させることで配向規制量が向上する。また重合性モノマー由来のポリマーが液晶組成物中のイオン成分をトラップするため電圧保持率が低下しないという効果を奏する。 When the liquid crystal composition contains a polymerizable monomer and / or a cured product of the polymerizable monomer, the alignment regulation amount is improved by curing the polymerizable monomer. Moreover, since the polymer derived from the polymerizable monomer traps an ionic component in the liquid crystal composition, there is an effect that the voltage holding ratio does not decrease.
 本発明に係る重合性モノマーは、一般式(P-1)および一般式(P-2): The polymerizable monomer according to the present invention includes the general formula (P-1) and the general formula (P-2):
Figure JPOXMLDOC01-appb-C000134
Figure JPOXMLDOC01-appb-C000134
 (上記一般式(P-1)~一般式(P-2)中、Rp11、Rp12、Rp21およびRp22はそれぞれ独立して、以下の式(R-I)から式(R-IX): (In the above general formulas (P-1) to (P-2), R p11 , R p12 , R p21 and R p22 are each independently represented by the following formulas ( RI ) to (R-IX): ):
Figure JPOXMLDOC01-appb-C000135
Figure JPOXMLDOC01-appb-C000135
のいずれかを表し、前記式(R-I)~(R-IX)中、R~Rはお互いに独立して、水素原子、炭素原子数1~5個のアルキル基または炭素原子数1~5個のハロゲン化アルキル基であり、Wは単結合、-O-またはメチレン基であり、Tは単結合または-COO-であり、p、tおよびqはそれぞれ独立して、0、1または2を表し、
 Ap11、Ap12、およびAp22はそれぞれ独立して、1,4-フェニレン基、1,4-シクロヘキシレン基、アントラセン-2,6-ジイル基、フェナントレン-2,7-ジイル基、ピリジン-2,5-ジイル基、ピリミジン-2,5-ジイル基、ナフタレン-2,6-ジイル基、インダン-2,5-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基または1,3-ジオキサン-2,5-ジイル基を表すが、無置換であるかまたはハロゲン原子、シアノ基、ニトロ基、Rp11、炭素素原子数1~12のアルキル基(前記アルキル基中の1個または非隣接の2個以上の-CH-はそれぞれ独立して、-C≡C-、-O-、-CO-、-COO-または-OCO-によって置換されていても良く、基中の1個または非隣接の2個以上の水素原子はそれぞれ独立して、フッ素原子で置換されていても良い)を表し、
 Ap21およびAp23はそれぞれ独立して、2価~4価の芳香族基または2価~4価の脂環式基を表し、
 Lp11、Lp12、Lp21およびLp22はそれぞれ独立して、単結合、-OCH-、-CHO-、-CO-、-C-、-COO-、-OCO-、-COOC-、-OCOC-、-COCO-、-CCOO-、-CH=CH-、-CF-、-CFO-、-(CH-C(=O)-O-、-(CH-O-(C=O)-、-O-(C=O)-(CH-、-(C=O)-O-(CH-、-O-(CH-O-、-OCF-、-CH=CHCOO-、-CH=CHOCO-、-COOCH=CH-、-OCOCH=CH-またはC≡C-を表し、前記式中のzは、1~4の整数を表し、
 mp11、mp12およびmp22はそれぞれ独立して、0から3の整数を表し、かつmp11+mp12が2以上の整数を表し、
 mp21およびmp23はそれぞれ独立して、1から4の整数を表し、かつmp21+mp23≧3を表し、
 mp11が2以上の場合、複数存在するAp11およびLp11は、それらはそれぞれ同一であっても異なっていてもよく、mp12が2以上の場合、複数存在するAp12およびLp12は、それらはそれぞれ同一であっても異なっていてもよく、
 mp22が2以上の場合、複数存在するAp22およびLp21は、それらはそれぞれ同一であっても異なっていてもよく、
 mp21が2以上の場合、複数存在するRp21およびSpp21は、それらはそれぞれ同一であっても異なっていてもよく、mp23が2以上の場合、複数存在するRp22およびSpp22は、それらはそれぞれ同一であっても異なっていてもよい。)で表される化合物からなる群から選択される1種または2種以上であることが好ましい。
In the formulas (RI) to (R-IX), R 2 to R 6 are independently of each other a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or the number of carbon atoms. 1 to 5 halogenated alkyl groups, W is a single bond, —O— or a methylene group, T is a single bond or —COO—, and p, t and q are each independently 0, Represents 1 or 2,
A p11 , A p12 and A p22 are each independently 1,4-phenylene group, 1,4-cyclohexylene group, anthracene-2,6-diyl group, phenanthrene-2,7-diyl group, pyridine- 2,5-diyl group, pyrimidine-2,5-diyl group, naphthalene-2,6-diyl group, indan-2,5-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl Or a 1,3-dioxane-2,5-diyl group, which is unsubstituted or is a halogen atom, a cyano group, a nitro group, R p11 , an alkyl group having 1 to 12 carbon atoms (the alkyl group) One or two or more non-adjacent —CH 2 — therein may be each independently substituted by —C≡C—, —O—, —CO—, —COO— or —OCO—. In the group Pieces or two or more hydrogen atoms of the non-adjacent each independently represents a fluorine may be substituted with atoms),
A p21 and A p23 each independently represent a divalent to tetravalent aromatic group or a divalent to tetravalent alicyclic group,
L p11 , L p12 , L p21 and L p22 are each independently a single bond, —OCH 2 —, —CH 2 O—, —CO—, —C 2 H 4 —, —COO—, —OCO—, -COOC 2 H 4 -, - OCOC 2 H 4 -, - C 2 H 4 OCO -, - C 2 H 4 COO -, - CH = CH -, - CF 2 -, - CF 2 O -, - (CH 2 ) z— C (═O) —O—, — (CH 2 ) z —O— (C═O) —, —O— (C═O) — (CH 2 ) z —, — (C═O ) —O— (CH 2 ) z —, —O— (CH 2 ) z —O—, —OCF 2 —, —CH═CHCOO—, —CH═CHOCO—, —COOCH═CH—, —OCOCH═CH -Represents C≡C-, z in the above formula represents an integer of 1 to 4,
m p11 , m p12 and m p22 each independently represent an integer of 0 to 3, and m p11 + m p12 represents an integer of 2 or more,
m p21 and m p23 each independently represents an integer of 1 to 4, and m p21 + m p23 ≧ 3;
When m p11 is 2 or more, a plurality of A p11 and L p11 may be the same or different, and when m p12 is 2 or more, a plurality of A p12 and L p12 are They may be the same or different,
when m p22 is 2 or more, a plurality of A p22 and L p21 may be the same or different from each other;
When m p21 is 2 or more, a plurality of R p21 and Sp p21 may be the same or different, and when m p23 is 2 or more, a plurality of R p22 and Sp p22 are They may be the same or different. It is preferable that it is 1 type, or 2 or more types selected from the group which consists of a compound represented by this.
 一般式(P-1)および一般式(P-2)において、Spp11、Spp12、Spp21およびSpp22はそれぞれ独立して、単結合、炭素原子数1~8のアルキレン基または-O-(CH-(式中、sは2から7の整数を表し、酸素原子は芳香環に結合するものとする。)が好ましい。 In the general formula (P-1) and the general formula (P-2), Sp p11 , Sp p12 , Sp p21 and Sp p22 are each independently a single bond, an alkylene group having 1 to 8 carbon atoms, or —O—. (CH 2 ) s — (wherein s represents an integer of 2 to 7 and the oxygen atom is bonded to the aromatic ring) is preferable.
 一般式(P-1)および一般式(P-2)において、Ap11、Ap12、およびAp22はそれぞれ独立して、1,4-フェニレン基、アントラセン-2,6-ジイル基、フェナントレン-2,7-ジイル基またはナフタレン-2,6-ジイル基を表すことがより好ましく、当該基は、無置換であるかまたは炭素原子数1~5のアルキル基、炭素原子数1~5のハロゲン化アルキル基、炭素原子数1~5のアルコキシ基、炭素原子数1~5のアルキルエステル基、炭素原子数1~5のハロゲン化アルコキシ基、フッ素、シアノ基で置換されていてもよい。 In general formula (P-1) and general formula (P-2), A p11 , A p12 , and A p22 each independently represent 1,4-phenylene group, anthracene-2,6-diyl group, phenanthrene- More preferably, it represents a 2,7-diyl group or a naphthalene-2,6-diyl group, which is unsubstituted or an alkyl group having 1 to 5 carbon atoms, a halogen having 1 to 5 carbon atoms. An alkyl group, an alkoxy group having 1 to 5 carbon atoms, an alkyl ester group having 1 to 5 carbon atoms, a halogenated alkoxy group having 1 to 5 carbon atoms, fluorine, and a cyano group.
 一般式(P-1)および一般式(P-2)において、Lp11、Lp12、Lp21およびLp22はそれぞれ独立して、単結合、-OCH-、-CHO-、-C-、-COO-、-OCO-、-COOC-、-OCOC-、-COCO-、-CCOO-、-CH=CH-、-CFO-、-(CH-C(=O)-O-、-(CH-O-(C=O)-、-O-(C=O)-(CH-、-(C=O)-O-(CH-、-O-(CH-O-、-OCF-、-CH=CHCOO-、-CH=CHOCO-、-COOCH=CH-、-OCOCH=CH-または-C≡C-であることが好ましく、前記式中のzは4を表すことが好ましい。連結基が上記の基であると、重合性モノマーが直線性の構造を取ることができる。 In general formula (P-1) and general formula (P-2), L p11 , L p12 , L p21 and L p22 are each independently a single bond, —OCH 2 —, —CH 2 O—, —C 2 H 4 -, - COO - , - OCO -, - COOC 2 H 4 -, - OCOC 2 H 4 -, - C 2 H 4 OCO -, - C 2 H 4 COO -, - CH = CH -, - CF 2 O—, — (CH 2 ) z —C (═O) —O—, — (CH 2 ) z —O— (C═O) —, —O— (C═O) — (CH 2 ) z— , — (C═O) —O— (CH 2 ) z —, —O— (CH 2 ) z —O—, —OCF 2 —, —CH═CHCOO—, —CH═CHOCO—, —COOCH ═CH—, —OCOCH═CH— or —C≡C— is preferred, and z in the above formula preferably represents 4. When the linking group is the above group, the polymerizable monomer can take a linear structure.
 一般式(P-1)で表される化合物において、mp11およびmp12は、それぞれ独立して、0、1または2を表すことがより好ましい。また、mp11+mp12が2~5であることがより好ましく、mp11+mp12が2~4であることがさらに好ましい。 In the compound represented by the general formula (P-1), it is more preferable that m p11 and m p12 each independently represent 0, 1 or 2. Further, m p11 + m p12 is more preferably 2 to 5, and m p11 + m p12 is further preferably 2 to 4.
 一般式(P-2)で表される化合物において、mp21及びmp23はそれぞれ独立して、1、2または3を表し、mp22は、1または2を表すことが好ましい。また、mp21+mp23=3~6であることがより好ましい。 In the compound represented by the general formula (P-2), it is preferable that mp21 and mp23 each independently represent 1, 2 or 3, and mp22 preferably represents 1 or 2. Further, it is more preferable that m p21 + m p23 = 3 to 6.
 一般式(P-2)において、2~4価の芳香族基とは、芳香環を含む2~4価の有機基であり、2~4個の結合部位はいずれも芳香環からでているものであることが好ましく、具体的にフェニル骨格、テトラヒドロナフタレン骨格、フェナントレン骨格、アントラセン骨格及びナフタレン骨格などが挙げられる。 In the general formula (P-2), the divalent to tetravalent aromatic group is a divalent to tetravalent organic group including an aromatic ring, and all of the 2 to 4 bonding sites are derived from the aromatic ring. Specifically, a phenyl skeleton, a tetrahydronaphthalene skeleton, a phenanthrene skeleton, an anthracene skeleton, a naphthalene skeleton, and the like can be given.
 一般式(P-2)において、2~4価の脂環式基としては、脂環式構造を含む2~4価の有機基であり、2~4個の結合部位はいずれも環からでているものであることが好ましく、具体的にシクロヘキシレン骨格、シクロヘキセニレン骨格などが挙げられる。 In the general formula (P-2), the divalent to tetravalent alicyclic group is a divalent to tetravalent organic group including an alicyclic structure, and all of the 2 to 4 bonding sites are from the ring. In particular, a cyclohexylene skeleton, a cyclohexenylene skeleton, and the like can be given.
 一般式(P-2)において、2価の芳香族基としては、1,4-フェニレン基、アントラセン-2,6-ジイル基、フェナントレン-2,7-ジイル基、ピリジン-2,5-ジイル基、ピリミジン-2,5-ジイル基、ナフタレン-2,6-ジイル基、インダン-2,5-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基または1,3-ジオキサン-2,5-ジイル基を表すが、無置換であるかまたは炭素原子数1~12のアルキル基、炭素原子数1~12のハロゲン化アルキル基、炭素原子数1~12のアルコキシ基、炭素原子数1~12のハロゲン化アルコキシ基、ハロゲン原子、シアノ基、ニトロ基またはRp11で置換されていていることが好ましい。 In the general formula (P-2), the divalent aromatic group includes 1,4-phenylene group, anthracene-2,6-diyl group, phenanthrene-2,7-diyl group, pyridine-2,5-diyl. Group, pyrimidine-2,5-diyl group, naphthalene-2,6-diyl group, indan-2,5-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or 1,3 -Represents a dioxane-2,5-diyl group but is unsubstituted or an alkyl group having 1 to 12 carbon atoms, a halogenated alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms It is preferably substituted with a halogenated alkoxy group having 1 to 12 carbon atoms, a halogen atom, a cyano group, a nitro group or R p11 .
 一般式(P-2)において、2~4価の芳香族基としては、以下の式(b-i)~(b-ix)のいずれかであり、当該芳香族基は、無置換または炭素原子数1~12のアルキル基、炭素原子数1~12のハロゲン化アルキル基、炭素原子数1~12のアルコキシ基、炭素原子数1~12のハロゲン化アルコキシ基、ハロゲン原子、シアノ基、ニトロ基またはRp11で置換されていてもよい。 In the general formula (P-2), the divalent to tetravalent aromatic group is any of the following formulas (bi) to (b-ix), and the aromatic group is unsubstituted or substituted with carbon. Alkyl group having 1 to 12 atoms, halogenated alkyl group having 1 to 12 carbon atoms, alkoxy group having 1 to 12 carbon atoms, halogenated alkoxy group having 1 to 12 carbon atoms, halogen atom, cyano group, nitro Optionally substituted with a group or R p11 .
Figure JPOXMLDOC01-appb-C000136
Figure JPOXMLDOC01-appb-C000136
(式中、*でSpp21またはSpp22結合し、**でLp21若しくはLp22と結合する。)
 また、上記一般式(P-1)または(P-2)で表される重合性モノマーの液晶組成物全体における具体的な含有量としては、5%以下が好ましく、3%以下がより好ましく、2%以下が更に好ましく、1%以下が特に好ましく、0.8%以下が最も好ましい。また、液晶組成物における当該重合性モノマーの含有量の下限値は1000ppmであることが好ましく、3000ppmであることが好ましく、5000ppmであることがより好ましい。
(In the formula, Sp p21 or Sp p22 binds with *, and L p21 or L p22 binds with **.)
Further, the specific content of the polymerizable monomer represented by the general formula (P-1) or (P-2) in the entire liquid crystal composition is preferably 5% or less, more preferably 3% or less, It is more preferably 2% or less, particularly preferably 1% or less, and most preferably 0.8% or less. Further, the lower limit of the content of the polymerizable monomer in the liquid crystal composition is preferably 1000 ppm, more preferably 3000 ppm, and even more preferably 5000 ppm.
 以下に本発明に係る一般式(P-1)~一般式(P-2)で表される化合物の好ましい構造を例示する。 Hereinafter, preferred structures of the compounds represented by the general formula (P-1) to the general formula (P-2) according to the present invention will be exemplified.
 上記一般式(P-1)で表される化合物において、4≧mp11+mp12≧2であり、Lp11またはLp12が、-COO-、-OCO-、-COOC-、-OCOC-、-COCO-、-CCOO-、-CH=CHCOO-、-CH=CHOCO-、-COOCH=CH-および-OCOCH=CH-からなる群から選択される1つを表す重合性モノマーが好ましい。かかる構造の重合性モノマーは、液晶分子と同様の直線性を備え、かつある程度の自由度を有しているため、液晶化合物との相溶性が優れている。 In the compound represented by the general formula (P-1), 4 ≧ m p11 + m p12 ≧ 2, and L p11 or L p12 is —COO—, —OCO—, —COOC 2 H 4 —, —OCOC Selected from the group consisting of 2 H 4 —, —C 2 H 4 OCO—, —C 2 H 4 COO—, —CH═CHCOO—, —CH═CHOCO—, —COOCH═CH— and —OCOCH═CH—. A polymerizable monomer representing one of them is preferred. The polymerizable monomer having such a structure has the same linearity as that of the liquid crystal molecules and has a certain degree of freedom, and therefore has excellent compatibility with the liquid crystal compound.
 本発明に係る一般式(P-1)で表される化合物の好ましい例として、下記式(P-a-1)~式(P-a-33)で表される重合性化合物が挙げられる。 Preferred examples of the compound represented by the general formula (P-1) according to the present invention include polymerizable compounds represented by the following formulas (Pa-1) to (Pa-33).
Figure JPOXMLDOC01-appb-C000137
Figure JPOXMLDOC01-appb-C000137
Figure JPOXMLDOC01-appb-C000138
Figure JPOXMLDOC01-appb-C000138
Figure JPOXMLDOC01-appb-C000139
Figure JPOXMLDOC01-appb-C000139
Figure JPOXMLDOC01-appb-C000140
Figure JPOXMLDOC01-appb-C000140
Figure JPOXMLDOC01-appb-C000141
Figure JPOXMLDOC01-appb-C000141
 上記一般式(P-1)で表される化合物において、mp11+mp12=2、Ap11およびAp12が1,4-フェニレン基であり、Lp11およびLp12が単結合である重合性モノマーが好ましい。かかる構造の重合性モノマーは、ビフェニル構造を備えており、これらの骨格を含む重合性化合物は重合後の配向規制力がPSA型液晶表示素子に最適であり、良好な配向状態が得られることから、表示ムラが抑制されるか、または、全く発生しない。 In the compound represented by the general formula (P-1), m p11 + m p12 = 2; A p11 and A p12 are 1,4-phenylene groups; and L p11 and L p12 are single bonds Is preferred. A polymerizable monomer having such a structure has a biphenyl structure, and a polymerizable compound containing these skeletons is optimal in alignment regulation after polymerization for a PSA type liquid crystal display element, and a good alignment state can be obtained. , Display unevenness is suppressed or does not occur at all.
 本発明に係る一般式(P-1)で表される化合物の好ましい例として、下記式(P-b-1)~式(P-b-34)で表される重合性化合物が挙げられる。 Preferred examples of the compound represented by the general formula (P-1) according to the present invention include polymerizable compounds represented by the following formulas (Pb-1) to (Pb-34).
Figure JPOXMLDOC01-appb-C000142
Figure JPOXMLDOC01-appb-C000142
Figure JPOXMLDOC01-appb-C000143
Figure JPOXMLDOC01-appb-C000143
Figure JPOXMLDOC01-appb-C000144
Figure JPOXMLDOC01-appb-C000144
 上記一般式(P-1)で表される化合物において、mp11+mp12=1であり、Ap11またはAp12がフェナントレン-2,7-ジイル基である重合性モノマーが好ましい。かかる構造の重合性モノマーは、組成物全体の感光作用が大きいと考えられる。
本発明に係る一般式(P-1)で表される化合物の好ましい例として、下記式(P-c-1)~式(P-c-52)で表される重合性化合物が挙げられる。
In the compound represented by the general formula (P-1), a polymerizable monomer in which m p11 + m p12 = 1 and A p11 or A p12 is a phenanthrene-2,7-diyl group is preferable. The polymerizable monomer having such a structure is considered to have a large photosensitive effect on the entire composition.
Preferable examples of the compound represented by the general formula (P-1) according to the present invention include polymerizable compounds represented by the following formulas (Pc-1) to (Pc-52).
Figure JPOXMLDOC01-appb-C000145
Figure JPOXMLDOC01-appb-C000145
Figure JPOXMLDOC01-appb-C000146
Figure JPOXMLDOC01-appb-C000146
Figure JPOXMLDOC01-appb-C000147
Figure JPOXMLDOC01-appb-C000147
 一般式(P-2)において、mp22が1以上3以下の整数を表し、Lp21またはLp22の少なくとも一つが単結合であり、Ap21およびAp23はそれぞれ独立して、無置換または炭素原子数1~5のアルキル基(前記アルキル基中の1個または非隣接の2個以上の-CH-はそれぞれ独立して、-C≡C-、-O-、-CO-、-COO-または-OCO-によって置換されていても良く、前記アルキル基中の1個または非隣接の2個以上の水素原子はそれぞれ独立して、フッ素原子で置換されていても良い)、フッ素原子、シアノ基、ニトロ基で置換されている以下の式(b-i)~(b-ix)を表すことが好ましい。 In the general formula (P-2), mp22 represents an integer of 1 to 3, at least one of L p21 and L p22 is a single bond, and A p21 and A p23 are each independently an unsubstituted or carbon An alkyl group having 1 to 5 atoms (one or two or more non-adjacent —CH 2 — in the alkyl group each independently represents —C≡C—, —O—, —CO—, —COO; -Or -OCO-, and one or two or more non-adjacent hydrogen atoms in the alkyl group may be each independently substituted with a fluorine atom), a fluorine atom, It is preferable to represent the following formulas (bi) to (b-ix) substituted with a cyano group or a nitro group.
Figure JPOXMLDOC01-appb-C000148
Figure JPOXMLDOC01-appb-C000148
(式中、*でSpp21またはSpp22結合し、**でLp21若しくはLp22と結合する。)
 本発明に係る一般式(P-2)で表される化合物の好ましい例として、下記式(P-d-1)~式(P-d-57)で表される重合性化合物が挙げられる。
(In the formula, Sp p21 or Sp p22 binds with *, and L p21 or L p22 binds with **.)
Preferable examples of the compound represented by the general formula (P-2) according to the present invention include polymerizable compounds represented by the following formulas (Pd-1) to (Pd-57).
Figure JPOXMLDOC01-appb-C000149
Figure JPOXMLDOC01-appb-C000149
Figure JPOXMLDOC01-appb-C000150
Figure JPOXMLDOC01-appb-C000150
Figure JPOXMLDOC01-appb-C000151
Figure JPOXMLDOC01-appb-C000151
Figure JPOXMLDOC01-appb-C000152
Figure JPOXMLDOC01-appb-C000152
Figure JPOXMLDOC01-appb-C000153
Figure JPOXMLDOC01-appb-C000153
Figure JPOXMLDOC01-appb-C000154
Figure JPOXMLDOC01-appb-C000154
Figure JPOXMLDOC01-appb-C000155
Figure JPOXMLDOC01-appb-C000155
Figure JPOXMLDOC01-appb-C000156
Figure JPOXMLDOC01-appb-C000156
Figure JPOXMLDOC01-appb-C000157
Figure JPOXMLDOC01-appb-C000157
Figure JPOXMLDOC01-appb-C000158
Figure JPOXMLDOC01-appb-C000158
Figure JPOXMLDOC01-appb-C000159
Figure JPOXMLDOC01-appb-C000159
 本発明に係る液晶表示素子における液晶層および/または液晶組成物は、当該液晶層および/または液晶組成物に重合性モノマーを含有し、当該重合性モノマーをポリマー化していることが好ましい。これにより、光配向膜の液晶分子の配向規制力が向上する。より詳細には図6および図7を用いて説明する。図6の(A)は、IPSモードの液晶表示素子の平面図であり、画素電極と共通電極とが櫛型に形成され、かつ互いに遊嵌するよう両者が一定距離離間して同一基板上に形成されている。当該図6において、破線部分のVIIの領域を拡大したものが図7の(B)および(C)である。また、図7の(B)および(C)ならびに図8では便宜上、画素電極が上側、共通電極が下側になる平面図であるがこれに限定されるわけではない。図7の(B)は、液晶化合物1aと、重合性モノマー1bとを含んでいる本発明の液晶組成物が、光配向膜上に特定の方向(光配向膜の配向方向に沿って)に配列している状態を示している。図7の(C)は、液晶化合物1aおよび重合性モノマー1bが光配向膜上において特定の方向(光配向膜の配向方向に沿って)に配列している状態において(すなわち、前記(B)の状態)、重合性モノマーをポリマー化した状態である。このポリマー化した重合体1cの存在により、液晶分子に対して特定方向への配向規制力が生じる。すなわち、(B)状態(電圧無印加)で重合性モノマーをポリマー化させると、配向特定方向に配向した状態で重合性モノマー同士が連結する((C)状態)。そのため、重合性モノマー同士が連結したポリマー1cと、液晶分子1bとの間に相互作用が働くため、プレチルト角の安定化や、配向膜の液晶分子に対する配向規制力が向上すると考えられる。また、図7および図8では、視野角依存などの課題を解決するためにマルチドメインを設けている。 The liquid crystal layer and / or liquid crystal composition in the liquid crystal display device according to the present invention preferably contains a polymerizable monomer in the liquid crystal layer and / or liquid crystal composition, and the polymerizable monomer is polymerized. Thereby, the alignment control force of the liquid crystal molecules of the photo-alignment film is improved. This will be described in more detail with reference to FIGS. FIG. 6A is a plan view of an IPS mode liquid crystal display element, in which the pixel electrode and the common electrode are formed in a comb shape, and they are separated from each other by a certain distance so as to be loosely fitted to each other on the same substrate. Is formed. In FIG. 6, (B) and (C) in FIG. 7 are enlarged views of the region of VII in the broken line portion. 7B and 7C and FIG. 8 are plan views in which the pixel electrode is on the upper side and the common electrode is on the lower side for the sake of convenience, the present invention is not limited to this. FIG. 7B shows that the liquid crystal composition of the present invention containing the liquid crystal compound 1a and the polymerizable monomer 1b is in a specific direction (along the alignment direction of the photo-alignment film) on the photo-alignment film. The arrangement is shown. FIG. 7C shows a state in which the liquid crystal compound 1a and the polymerizable monomer 1b are arranged in a specific direction (along the alignment direction of the photo-alignment film) on the photo-alignment film (that is, (B) In a state where a polymerizable monomer is polymerized. Due to the presence of the polymerized polymer 1c, an alignment regulating force in a specific direction is generated for the liquid crystal molecules. That is, when the polymerizable monomer is polymerized in the (B) state (no voltage applied), the polymerizable monomers are connected in a state of being oriented in the specific orientation direction ((C) state). For this reason, an interaction acts between the polymer 1c in which polymerizable monomers are linked to each other and the liquid crystal molecules 1b, so that it is considered that the pretilt angle is stabilized and the alignment regulating force of the alignment film on the liquid crystal molecules is improved. 7 and 8, a multi-domain is provided to solve problems such as viewing angle dependency.
 図8は、前記図7(C)の状態に対して、電圧のONまたはOFFにおける液晶分子の配向の様子を模式的に示す。電圧を印加すると電界方向に沿って液晶分子1aは配向し、電圧をOFFにすると液晶分子1aは液晶層に重合性モノマー同士が連結したポリマー1cが存在するため、初期の配向方向を維持したまま特定の配向方向に戻りやすくなる。 FIG. 8 schematically shows the state of alignment of liquid crystal molecules when the voltage is turned on or off with respect to the state of FIG. 7C. When a voltage is applied, the liquid crystal molecules 1a are aligned along the direction of the electric field, and when the voltage is turned off, the liquid crystal molecules 1a have a polymer 1c in which polymerizable monomers are connected to each other in the liquid crystal layer, so that the initial alignment direction is maintained. It becomes easy to return to a specific orientation direction.
 そのため、液晶表示素子において、液晶組成物に重合性モノマーおよび液晶化合物を含み、かつ当該重合性モノマーをポリマー化した液晶層を備えていると、電圧ON-OFF状態を繰り返しても、重合性モノマー同士が連結したポリマー1cと液晶分子1bとの間に相互作用が働くことから、従来から問題であった経時的に低下する液晶分子に対する配向規制力を改善することができると考えられる。これにより、光配向膜に施した特定の配向方向を液晶分子が維持することができるため、実質的な配向規制力が向上すると考えられる。特に、配向分割を行っている場合は、画素内の分割された領域における配向方向がそれぞれ異なるため、各配向分割された領域における配向方向に対する配向規制力を向上することができる。 Therefore, in the liquid crystal display element, when the liquid crystal composition includes a polymerizable monomer and a liquid crystal compound and is provided with a liquid crystal layer obtained by polymerizing the polymerizable monomer, the polymerizable monomer can be used even when the voltage ON-OFF state is repeated. The interaction between the polymer 1c and the liquid crystal molecules 1b linked to each other is considered to improve the alignment regulating force on the liquid crystal molecules, which has been a problem in the past, and which decreases with time. Thereby, since a liquid crystal molecule can maintain the specific alignment direction given to the photo-alignment film, it is considered that the substantial alignment regulating force is improved. In particular, when alignment division is performed, since the alignment directions in the divided regions in the pixel are different from each other, the alignment regulating force with respect to the alignment direction in each alignment divided region can be improved.
 本発明に係る液晶組成物に重合性モノマーを添加する場合において、重合開始剤が存在しない場合でも重合は進行するが、重合を促進するために重合開始剤を含有していてもよい。重合開始剤としては、ベンゾインエーテル類、ベンゾフェノン類、アセトフェノン類、ベンジルケタール類、アシルフォスフィンオキサイド類等が挙げられる。 In the case of adding a polymerizable monomer to the liquid crystal composition according to the present invention, the polymerization proceeds even in the absence of a polymerization initiator, but may contain a polymerization initiator in order to accelerate the polymerization. Examples of the polymerization initiator include benzoin ethers, benzophenones, acetophenones, benzyl ketals, acylphosphine oxides, and the like.
 本発明に係る液晶組成物は、更に、一般式(Q)で表される化合物を酸化防止剤として含有することができる。 The liquid crystal composition according to the present invention can further contain a compound represented by the general formula (Q) as an antioxidant.
Figure JPOXMLDOC01-appb-C000160
Figure JPOXMLDOC01-appb-C000160
 前記一般式(Q)中、Rは炭素原子数1~22のアルキル基又はアルコキシ基を表し、該アルキル基中の1つ以上のCH基は、酸素原子が直接隣接しないように、-O-、-CH=CH-、-CO-、-OCO-、-COO-、-C≡C-、-CFO-、-OCF-で置換されてよく、Mはトランス-1,4-シクロへキシレン基、1,4-フェニレン基、又は、単結合を表す。 In the general formula (Q), R Q represents an alkyl group or an alkoxy group having 1 to 22 carbon atoms, one or more CH 2 groups in the alkyl groups, so that oxygen atoms are not directly adjacent, - O -, - CH = CH - , - CO -, - OCO -, - COO -, - C≡C -, - CF 2 O -, - OCF 2 - may be replaced by, M Q is trans-1, It represents a 4-cyclohexylene group, a 1,4-phenylene group, or a single bond.
 前記一般式(Q)中において、Rは炭素原子数1~22のアルキル基又はアルコキシ基であることが好ましく、当該アルキル基(前記アルコキシ基におけるアルキル基を含む)は、直鎖状または分岐鎖状であってもよい。また、前記Rは炭素原子数1~22の直鎖もしくは分岐鎖アルキル基又は直鎖もしくは分岐鎖アルコキシ基を表し、該アルキル基(前記アルコキシ基におけるアルキル基を含む)中の1つ以上のCH基は、酸素原子が直接隣接しないように、-O-、-CH=CH-、-CO-、-OCO-、-COO-、-C≡C-、-CFO-、-OCF-で置換されてもよい。前記一般式(Q)中においてRは、炭素原子数1~20個であって、直鎖アルキル基、直鎖アルコキシ基、1つのCH基が-OCO-又は-COO-に置換された直鎖アルキル基、分岐鎖アルキル基、分岐アルコキシ基および1つのCH基が-OCO-又は-COO-に置換された分岐鎖アルキル基からなる群から選択される少なくとも1つであることが好ましく、炭素原子数1~10の直鎖アルキル基、1つのCH基が-OCO-又は-COO-に置換された直鎖アルキル基、分岐鎖アルキル基、分岐アルコキシ基および1つのCH基が-OCO-又は-COO-に置換された分岐鎖アルキル基からなる群から選択される少なくとも1つが更に好ましい。 In the general formula (Q), RQ is preferably an alkyl group having 1 to 22 carbon atoms or an alkoxy group, and the alkyl group (including the alkyl group in the alkoxy group) is linear or branched It may be a chain. The RQ represents a linear or branched alkyl group having 1 to 22 carbon atoms or a linear or branched alkoxy group, and one or more of the alkyl groups (including the alkyl group in the alkoxy group). The CH 2 group is —O—, —CH═CH—, —CO—, —OCO—, —COO—, —C≡C—, —CF 2 O—, —OCF so that the oxygen atom is not directly adjacent. It may be substituted with 2-. R Q in the general formula (Q) is a number of 1 to 20 carbon atoms, a straight-chain alkyl groups, linear alkoxy groups, one CH 2 group has been replaced -OCO- or -COO- in Preferably, the alkyl group is at least one selected from the group consisting of a linear alkyl group, a branched alkyl group, a branched alkoxy group and a branched alkyl group in which one CH 2 group is substituted with —OCO— or —COO—. A linear alkyl group having 1 to 10 carbon atoms, a linear alkyl group in which one CH 2 group is substituted by —OCO— or —COO—, a branched alkyl group, a branched alkoxy group, and one CH 2 group More preferred is at least one selected from the group consisting of a branched alkyl group substituted with —OCO— or —COO—.
 Mはトランス-1,4-シクロへキシレン基、1,4-フェニレン基又は単結合を表すが、トランス-1,4-シクロへキシレン基又は1,4-フェニレン基が好ましい。 MQ represents a trans-1,4-cyclohexylene group, a 1,4-phenylene group or a single bond, and a trans-1,4-cyclohexylene group or a 1,4-phenylene group is preferred.
 前記一般式(Q)で表される化合物は、下記の一般式(Q-a)~一般式(Q-d)で表される化合物群から選択される少なくとも1種の化合物であることが好ましく、一般式(Q-a)及び/又は(Q-c)で表される化合物であることがより好ましい。 The compound represented by the general formula (Q) is preferably at least one compound selected from the group of compounds represented by the following general formulas (Qa) to (Qd): The compound represented by the general formula (Qa) and / or (Qc) is more preferable.
Figure JPOXMLDOC01-appb-C000161
Figure JPOXMLDOC01-appb-C000161
 前記一般式(Q-a)~式(Q-d)中、RQ1は炭素原子数1~10の直鎖アルキル基又は分岐鎖アルキル基が好ましく、RQ2は炭素原子数1~20の直鎖アルキル基又は分岐鎖アルキル基が好ましく、RQ3は炭素原子数1~8の直鎖アルキル基、分岐鎖アルキル基、直鎖アルコキシ基又は分岐鎖アルコキシ基が好ましく、Lは炭素原子数1~8の直鎖アルキレン基又は分岐鎖アルキレン基が好ましい。これらの中でも、一般式(Q)で表される化合物は、下記式(Q-a-1)及び/又は(Q-c-1)で表される化合物であることがさらに好ましい。 In the general formulas (Qa) to (Qd), R Q1 is preferably a linear alkyl group having 1 to 10 carbon atoms or a branched alkyl group, and R Q2 is a straight chain having 1 to 20 carbon atoms. A chain alkyl group or a branched chain alkyl group is preferable, and R Q3 is preferably a linear alkyl group having 1 to 8 carbon atoms, a branched chain alkyl group, a linear alkoxy group or a branched chain alkoxy group, and L Q is 1 carbon atom. A linear alkylene group or a branched alkylene group of 8 to 8 is preferred. Among these, the compound represented by the general formula (Q) is more preferably a compound represented by the following formula (Qa-1) and / or (Qc-1).
Figure JPOXMLDOC01-appb-C000162
Figure JPOXMLDOC01-appb-C000162
Figure JPOXMLDOC01-appb-C000163
Figure JPOXMLDOC01-appb-C000163
 本願発明の液晶組成物において、前記一般式(Q)で表される化合物を1種又は2種を含有することが好ましく、1種~5種を含有することが更に好ましく、その含有量は、本発明の液晶組成物の総質量に対して、0.001~1質量%であることが好ましく、0.001~0.1質量%であることが好ましく、0.001~0.05質量%であることが好ましい。 In the liquid crystal composition of the present invention, the compound represented by the general formula (Q) preferably contains one or two compounds, more preferably contains one to five compounds, and the content is It is preferably 0.001 to 1% by mass, preferably 0.001 to 0.1% by mass, and 0.001 to 0.05% by mass with respect to the total mass of the liquid crystal composition of the present invention. It is preferable that
 (配向層)
 本発明に係る光配向層は、第一の基板および第二の基板の少なくとも一方に設けられるものであり、好ましくは第一の基板および第二の基板の両側に設けられる。
(Orientation layer)
The photo-alignment layer according to the present invention is provided on at least one of the first substrate and the second substrate, and is preferably provided on both sides of the first substrate and the second substrate.
 本発明に係る配向層は、光に応答してその化学構造が変化する光応答性高分子を含む光配向膜であることが好ましい。 The alignment layer according to the present invention is preferably a photo-alignment film containing a photoresponsive polymer whose chemical structure changes in response to light.
 これにより、p型材料を用いた水平配向方向方式(IPSまたはFFS)の液晶表示素子では、短冊状の電極などにより表面の凹凸に起因するラビングムラや液晶組成物の滴下痕を低減することができる。 Thereby, in the liquid crystal display element of the horizontal alignment direction method (IPS or FFS) using the p-type material, rubbing unevenness due to surface irregularities and dripping marks of the liquid crystal composition can be reduced by strip-shaped electrodes or the like. .
 光配向膜とp型材料とを用いた水平配向方向方式(IPSまたはFFS)の液晶表示素子では、重合性モノマーを含む液晶組成物を利用することで光配向膜の高コントラストの長所を発揮し、かつ配向規制力を向上させることができる。 In the liquid crystal display device of the horizontal alignment direction method (IPS or FFS) using the photo-alignment film and the p-type material, the high-contrast advantage of the photo-alignment film is exhibited by using a liquid crystal composition containing a polymerizable monomer. In addition, the orientation regulating force can be improved.
 一般に光配向膜には種々の方式があり、例えば、アゾ基(例えば、アゾベンゼン化合物)、シッフ塩基、及び炭素-炭素2重結合などの不飽和結合部位を有する化合物等の光照射により光異性化を利用するもの、桂皮酸誘導体等の光二量化を利用するもの、クマリン、カルコン、またはポリマー自体のσ結合の光開裂(光分解)を利用する(例えば、光分解性ポリイミド等)もの等が挙げられる。 In general, there are various types of photo-alignment films, for example, photoisomerization by light irradiation of an azo group (for example, azobenzene compound), a Schiff base, and a compound having an unsaturated bond site such as a carbon-carbon double bond. Those utilizing photodimerization such as cinnamic acid derivatives, those utilizing photo-cleavage (photolysis) of σ bond of coumarin, chalcone, or the polymer itself (for example, photodegradable polyimide) It is done.
 より詳細には、当該光応答性高分子は、光応答性分解型高分子、光応答性二量化型高分子および光応答性異性化型高分子からなる群から選択される少なくとも一つであることが好ましく、光応答性分解型高分子であることが特に好ましい。 More specifically, the photoresponsive polymer is at least one selected from the group consisting of a photoresponsive decomposition polymer, a photoresponsive dimerization polymer, and a photoresponsive isomerization polymer. The photoresponsive decomposition polymer is particularly preferable.
 本発明に係る光応答性分解型高分子としては、ポリマー自体のσ結合の光開裂(光分解)を利用するもの等が好ましい。より詳細には、いずれにしても、主鎖としてポリシロキサン、ポリイミド、及びポリアミック酸誘導体構造を有するものが好ましく、ポリイミド、ポリアミック酸誘導体構造がより好ましい。ポリアミック酸誘導体としては、炭素原子数1から5のアルキルエステルや、炭素原子数1から18のアルキルアンモニウム塩とするのが好ましい。 As the photoresponsive decomposable polymer according to the present invention, those utilizing photocleavage (photolysis) of σ bond of the polymer itself are preferable. More specifically, in any case, those having polysiloxane, polyimide, and polyamic acid derivative structures as the main chain are preferred, and polyimide and polyamic acid derivative structures are more preferred. The polyamic acid derivative is preferably an alkyl ester having 1 to 5 carbon atoms or an alkyl ammonium salt having 1 to 18 carbon atoms.
 本発明に係る光応答性分解型高分子は、テトラカルボン酸二無水物と、ジアミン化合物とを反応させて得られるポリアミック酸及びポリイミドよりなる群から選択される少なくとも一種の重合体を含有することが好ましい。 The photoresponsive decomposition type polymer according to the present invention contains at least one polymer selected from the group consisting of polyamic acid and polyimide obtained by reacting tetracarboxylic dianhydride with a diamine compound. Is preferred.
 ポリイミド、ポリアミック酸誘導体の原料となる前記テトラカルボン酸二無水物としては、以下のものが挙げられる。 Examples of the tetracarboxylic dianhydride used as a raw material for polyimide and polyamic acid derivatives include the following.
Figure JPOXMLDOC01-appb-C000164
Figure JPOXMLDOC01-appb-C000164
(上記式中、Z、Z、Z、Zはそれぞれ独立して、水素原子、炭素原子数1~5のアルキル基、塩素原子、フッ素原子、-NR、-SR、-OH、-CHCOOR、-CHCHCOOR、-COR、-NO、-CNを表すが、Z、Z、Z、Zのうち少なくとも一つは、水素原子もしくはメチル基でなく、Rは炭素原子数1~5のアルキル基を表し、Tは単結合、-CH-、-O-、-S-、-C(CH-、-C(CF-、-CO-、-SO-を表す) (In the above formula, Z 1 , Z 2 , Z 3 , and Z 4 are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a chlorine atom, a fluorine atom, —NR 2 , —SR, —OH. , —CH 2 COOR, —CH 2 CH 2 COOR, —COR, —NO 2 , —CN, wherein at least one of Z 1 , Z 2 , Z 3 , and Z 4 is a hydrogen atom or a methyl group R represents an alkyl group having 1 to 5 carbon atoms, and T represents a single bond, —CH 2 —, —O—, —S—, —C (CH 3 ) 2 —, —C (CF 3 ) 2. Represents-, -CO-, or -SO-)
Figure JPOXMLDOC01-appb-C000165
Figure JPOXMLDOC01-appb-C000165
(上記式中Tは単結合、-CH-、-O-、-S-、-C(CH-、-C(CF-、-CO-、-SO-を表す)
 以上のような化合物の中でも、式(TCA-1)、式(TCA-2)、式(TCA-3)、式(TCA-4)、式(TCA-5)、式(TCA-8)および式(TCA-10)が好ましく、式(TCA-1)、式(TCA-8)が特に好ましい。
(In the above formula, T represents a single bond, —CH 2 —, —O—, —S—, —C (CH 3 ) 2 —, —C (CF 3 ) 2 —, —CO—, —SO—).
Among the compounds as described above, the formula (TCA-1), formula (TCA-2), formula (TCA-3), formula (TCA-4), formula (TCA-5), formula (TCA-8) and Formula (TCA-10) is preferred, and formula (TCA-1) and formula (TCA-8) are particularly preferred.
 ポリイミド、ポリアミック酸誘導体の原料となる前記ジアミン化合物としては、以下のものが挙げられる。 Examples of the diamine compound used as a raw material for polyimide and polyamic acid derivatives include the following.
Figure JPOXMLDOC01-appb-C000166
Figure JPOXMLDOC01-appb-C000166
Figure JPOXMLDOC01-appb-C000167
Figure JPOXMLDOC01-appb-C000167
Figure JPOXMLDOC01-appb-C000168
Figure JPOXMLDOC01-appb-C000168
このような化合物の中でも、式(DA-1)、式(DA-25)、式(DA-31)、式(DA-32)、式(DA-49)が好ましく、式(DA-1)、式(DA-25)、式(DA-49)が特に好ましい。 Among such compounds, the formula (DA-1), the formula (DA-25), the formula (DA-31), the formula (DA-32), and the formula (DA-49) are preferable, and the formula (DA-1) Formula (DA-25) and Formula (DA-49) are particularly preferable.
 また、本発明に係る光配向膜において光異性化を利用するタイプを採用する場合、テトラカルボン酸無水物またはジアミン化合物の少なくとも一方に、以下の式(TCA-38)および式(DA-50)~式(DA-56)からなる群から選択される少なくとも一つを含むことが好ましい。 In the case where a type utilizing photoisomerization is employed in the photo-alignment film according to the present invention, at least one of a tetracarboxylic acid anhydride or a diamine compound includes the following formula (TCA-38) and formula (DA-50): It preferably contains at least one selected from the group consisting of formula (DA-56).
 例えば、前記テトラカルボン酸無水物としての例示である前記式(TCA-1)~前記式(TCA-37)の化合物に加えて(もしくは代えて)、以下の式(TCA-38): For example, in addition to (or instead of) the compounds of the formula (TCA-1) to the formula (TCA-37) exemplified as the tetracarboxylic acid anhydride, the following formula (TCA-38):
Figure JPOXMLDOC01-appb-C000169
Figure JPOXMLDOC01-appb-C000169
で表される化合物を用いることが好ましい。または、式(DA-1)~式(DA-49)の化合物に加えて(もしくは代えて)ジアミン化合物としては、以下の式(DA-50)~式(DA-56): It is preferable to use the compound represented by these. Alternatively, in addition to (or instead of) the compounds of the formulas (DA-1) to (DA-49), the diamine compounds may be represented by the following formulas (DA-50) to (DA-56):
Figure JPOXMLDOC01-appb-C000170
Figure JPOXMLDOC01-appb-C000170
で表される化合物を用いることが好ましい。 It is preferable to use the compound represented by these.
 また、本発明に係る光配向膜において、光二量化を利用するタイプを採用する場合、前記式(DA-1)~(DA-49)で表されるジアミン化合物中の水素原子の少なくとも一つに、以下の式(V)を有することが好ましく、式(DA-50)~式(DA-53)からなる群から選択される少なくとも一つを含むことがより好ましい。 In addition, in the photo-alignment film according to the present invention, when a type utilizing photodimerization is adopted, at least one of hydrogen atoms in the diamine compound represented by the formulas (DA-1) to (DA-49) is used. It preferably has the following formula (V), and more preferably contains at least one selected from the group consisting of formula (DA-50) to formula (DA-53).
 すなわち、前記式(DA-1)~(DA-49)の化合物に加えて(もしくは代えて)ジアミン化合物として、(DA-1)~(DA-49)の化合物中の水素原子を、一般式(V): That is, in addition to (or instead of) the compounds of the formulas (DA-1) to (DA-49), as a diamine compound, the hydrogen atom in the compounds of (DA-1) to (DA-49) (V):
Figure JPOXMLDOC01-appb-C000171
Figure JPOXMLDOC01-appb-C000171
(式中、破線は(DA-1)~(DA-49)の水素原子が結合していた原子への結合を表し、G、G、G、G、Gはそれぞれ独立して、単結合、炭素原子数2~12のアルキレン基(1つの-CH-基又は2つ以上の非隣接の-CH2-基は-O-、-CO-、-COO-、-OCO-、-NR-、-NRCO-、-CONR-、-NRCOO-、-OCONR-、-NRCONR-、-CH=CH-、-CC-、-OCOO-で置換されていても良い。Rは水素原子又は炭素原子数1~20のアルキル基を表す)、-OCH-、-CHO-、-COO-、-OCO-、-CH=CH-、-CF=CF-、-CFO-、-OCF-、-CFCF-、-CC-、-CH=CHCOO-、-OCOCH=CH-を表す。ただし、G、G、G、G、Gのいずれか一つ以上は-CH=CHCOO-、-OCOCH=CH-を表す。
、n、n、nは0または1を表し、E、E、E、E、Eはそれぞれ独立して、トランス-1,4-シクロヘキシレン、トランス-1,4-ジオキサン-2,5-ジイル、1,4-ナフチレン、2,6-ナフチレン、ピリジン-2,5-ジイル基、ピリミジン-2,5-ジイル基、2,5-チオフェニレン基、2,5-フラニレン基又は1,4-フェニレン基を表し、これらは無置換であるか又は一個以上の水素原子がフッ素原子、塩素原子、メチル基又はメトキシ基によって置換されていても良く、Zは水素原子、フッ素原子、炭素原子数1~12のアルキル基(1つの-CH-基又は2つ以上の非隣接の-CH-基は-O-、-CO-、-COO-、-OCO-、-NR-、-NRCO-、-CONR-、-NRCOO-、-OCONR-、-NRCONR-、-CH=CH-、-CC-または-OCOO-で置換されていても良い。Rは水素原子又は炭素原子数1~20のアルキル基)、シアノ基、ニトロ基、水酸基またはカルボキシル基を表す)で置換されているものを使用することが好ましい。
(In the formula, broken lines represent bonds to the atoms to which the hydrogen atoms of (DA-1) to (DA-49) were bonded, and G 1 , G 2 , G 3 , G 4 , and G 5 are independent of each other. A single bond, an alkylene group having 2 to 12 carbon atoms (one —CH 2 — group or two or more non-adjacent —CH 2 groups are —O—, —CO—, —COO—, —OCO— , —NR—, —NRCO—, —CONR—, —NRCOO—, —OCONR—, —NRCONR—, —CH═CH—, —CC—, —OCOO——, where R is a hydrogen atom. Or an alkyl group having 1 to 20 carbon atoms), —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —CH═CH—, —CF═CF—, —CF 2 O— , —OCF 2 —, —CF 2 CF 2 —, —CC—, —CH═CHCOO—, —OCOCH═ CH—, wherein any one or more of G 1 , G 2 , G 3 , G 4 , G 5 represents —CH═CHCOO—, —OCOCH═CH—.
n 5 , n 6 , n 7 , n 8 each represents 0 or 1, and E 1 , E 2 , E 3 , E 4 , E 5 are each independently trans-1,4-cyclohexylene, trans-1 , 4-dioxane-2,5-diyl, 1,4-naphthylene, 2,6-naphthylene, pyridine-2,5-diyl group, pyrimidine-2,5-diyl group, 2,5-thiophenylene group, 2 , 5-furanylene group or 1,4-phenylene group, which are unsubstituted or one or more hydrogen atoms may be substituted by fluorine atom, chlorine atom, methyl group or methoxy group, Z is A hydrogen atom, a fluorine atom, an alkyl group having 1 to 12 carbon atoms (one —CH 2 — group or two or more non-adjacent —CH 2 — groups are —O—, —CO—, —COO—, — OCO-, -NR-, -NRCO-, -CO R—, —NRCOO—, —OCONR—, —NRCONR—, —CH═CH—, —CC— or —OCOO— may be substituted, and R is a hydrogen atom or an alkyl group having 1 to 20 carbon atoms. ), Which represents a cyano group, a nitro group, a hydroxyl group or a carboxyl group) is preferably used.
 このようなジアミン化合物の具体例としては、例えば以下の式(DA-57)~(DA-60)が挙げられる。 Specific examples of such a diamine compound include, for example, the following formulas (DA-57) to (DA-60).
Figure JPOXMLDOC01-appb-C000172
Figure JPOXMLDOC01-appb-C000172
 本発明に係る光分解型の光配向膜としては、良好な液晶配向性を発現できる観点から、テトラカルボン酸無水物は、式(TCA-1)、式(TCA-2)、式(TCA-3)、式(TCA-4)、式(TCA-5)、式(TCA-33)(前記式(TCA-33)中、Tは-CO-が特に好ましい)およびTCA-34(前記式(TCA-34)中、Tは-CO-が好ましい)がより好ましく、式(TCA-1)、式(TCA-2)、式(TCA-3)、式(TCA-4)および式(TCA-5)が特に好ましい。また、本発明に係る光分解型の光配向膜としては、良好な液晶配向性を発現できる観点から、ジアミン化合物は、式(DA-1)、式(DA-25)、式(DA-49)が特に好ましい。 As the photodecomposition type photo-alignment film according to the present invention, tetracarboxylic acid anhydride is represented by the formula (TCA-1), formula (TCA-2), formula (TCA- 3), formula (TCA-4), formula (TCA-5), formula (TCA-33) (in the formula (TCA-33), T is particularly preferably —CO—) and TCA-34 (formula ( In TCA-34), T is preferably —CO—, and is more preferably formula (TCA-1), formula (TCA-2), formula (TCA-3), formula (TCA-4) and formula (TCA- 5) is particularly preferred. In addition, as the photodecomposition type photo-alignment film according to the present invention, the diamine compound is represented by the formula (DA-1), the formula (DA-25), the formula (DA-49) from the viewpoint that a good liquid crystal orientation can be expressed. Is particularly preferred.
 以上列挙したテトラカルボン酸無水物やジアミン化合物は、求められる特性に応じて、それぞれ1種単独で又は2種以上を組み合わせて使用することができる。 The tetracarboxylic anhydrides and diamine compounds listed above can be used singly or in combination of two or more depending on the required properties.
 本発明に係る光応答性分解型高分子の好ましいポリアミック酸において、上述したテトラカルボン酸二無水物と上述したジアミン化合物との混合割合は、ジアミンのアミノ基1当量に対して、テトラカルボン酸二無水物の酸無水物基が0.2~2当量となる割合が好ましく、0.3~1.2当量となる割合がより好ましい。 In the preferred polyamic acid of the photoresponsive decomposition type polymer according to the present invention, the mixing ratio of the above-mentioned tetracarboxylic dianhydride and the above-mentioned diamine compound is as follows. The proportion of the anhydride acid anhydride group is preferably 0.2 to 2 equivalents, more preferably 0.3 to 1.2 equivalents.
 また、本発明に係る光配向膜において、テトラカルボン酸無水物とジアミン化合物の縮合によるポリアミック酸の合成反応は、有機溶媒中において行われることが好ましい。当該反応温度は-20℃~150℃が好ましく、0~100℃がより好ましい。また、当該反応時間は、0.1~24時間が好ましく、0.5~12時間がより好ましい。 Further, in the photo-alignment film according to the present invention, it is preferable that the polyamic acid synthesis reaction by the condensation of the tetracarboxylic acid anhydride and the diamine compound is performed in an organic solvent. The reaction temperature is preferably −20 ° C. to 150 ° C., more preferably 0 to 100 ° C. The reaction time is preferably 0.1 to 24 hours, more preferably 0.5 to 12 hours.
 前記有機溶媒としては、例えば、アルコール、ケトン、エステル、エーテル、非プロトン性極性溶媒、フェノールおよびその誘導体系溶媒、ハロゲン化炭化水素系溶媒、炭化水素系溶媒などを挙げることができる。 Examples of the organic solvent include alcohols, ketones, esters, ethers, aprotic polar solvents, phenols and derivatives thereof, halogenated hydrocarbon solvents, hydrocarbon solvents, and the like.
 前記アルコールとしては、例えばメチルアルコール、エチルアルコール、イソプロピルアルコール、シクロヘキサノール、エチレングリコール、プロピレングリコール、1,4-ブタンジオール、トリエチレングリコール、エチレングリコールモノメチルエーテルなどが好ましい。 As the alcohol, for example, methyl alcohol, ethyl alcohol, isopropyl alcohol, cyclohexanol, ethylene glycol, propylene glycol, 1,4-butanediol, triethylene glycol, ethylene glycol monomethyl ether and the like are preferable.
 前記ケトンとして、例えばアセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノンなどが好ましい。 Preferred examples of the ketone include acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone.
 前記エステルとして、例えば乳酸エチル、乳酸ブチル、酢酸メチル、酢酸エチル、酢酸ブチル、メチルメトキシプロピオネ-ト、エチルエトキシプロピオネ-ト、シュウ酸ジエチル、マロン酸ジエチルなどが挙げられる。 Examples of the ester include ethyl lactate, butyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl methoxypropionate, ethyl ethoxypropionate, diethyl oxalate, and diethyl malonate.
 前記エーテルとして、例えばジエチルエーテル、エチレングリコールメチルエーテル、エチレングリコールエチルエーテル、エチレングリコール-n-プロピルエーテル、エチレングリコール-i-プロピルエーテル、エチレングリコール-n-ブチルエーテル、エチレングリコールジメチルエーテル、エチレングリコールエチルエーテルアセテート、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノメチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、テトラヒドロフランなどが挙げられる。 Examples of the ether include diethyl ether, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol-n-propyl ether, ethylene glycol-i-propyl ether, ethylene glycol-n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol ethyl ether acetate. , Diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, tetrahydrofuran and the like.
 前記非プロトン性極性溶媒の具体例としては、例えばN-メチル-2-ピロリドン、N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド、ジメチルスルホキシド、γ-ブチロラクトン、テトラメチル尿素およびヘキサメチルホスホルトリアミドなどが好ましい。 Specific examples of the aprotic polar solvent include, for example, N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide, dimethyl sulfoxide, γ-butyrolactone, tetramethylurea and hexamethylphosphoryl Amides and the like are preferred.
 前記フェノールおよびその誘導体としては、例えばm-クレゾール、キシレノール、ハロゲン化フェノールなどが好ましい。 As the phenol and derivatives thereof, for example, m-cresol, xylenol, halogenated phenol and the like are preferable.
 前記ハロゲン化炭化水素系溶媒として、例えばジクロロメタン、1,2-ジクロロエタン、1,4-ジクロロブタン、トリクロロエタン、クロルベンゼン、o-ジクロルベンゼンなどが挙げられる。 Examples of the halogenated hydrocarbon solvent include dichloromethane, 1,2-dichloroethane, 1,4-dichlorobutane, trichloroethane, chlorobenzene, o-dichlorobenzene, and the like.
 前記炭化水素系溶媒として、例えばヘキサン、ヘプタン、オクタン、ベンゼン、トルエン、キシレン、イソアミルプロピオネート、イソアミルイソブチレート、ジイソペンチルエーテルなどが挙げられる。 Examples of the hydrocarbon solvent include hexane, heptane, octane, benzene, toluene, xylene, isoamyl propionate, isoamyl isobutyrate, and diisopentyl ether.
 テトラカルボン酸二無水物及びジアミン化合物の有機溶媒に対する合計量は、反応溶液の全量に対して0.1~50重量%になることが好ましい。 The total amount of tetracarboxylic dianhydride and diamine compound with respect to the organic solvent is preferably 0.1 to 50% by weight based on the total amount of the reaction solution.
 上記の条件でテトラカルボン酸二無水物及びジアミン化合物を反応すると、ポリアミック酸を含む反応溶液が得られる。当該得られた反応溶液はそのまま配向膜の調製に供しても、または当該反応溶液中に含まれるポリアミック酸を単離したうえで配向膜の調製に供してもよく、さらには単離したポリアミック酸を精製したうえで配向膜の調製に供してもよい。 When the tetracarboxylic dianhydride and the diamine compound are reacted under the above conditions, a reaction solution containing a polyamic acid is obtained. The obtained reaction solution may be used for the preparation of the alignment film as it is, or may be used for the preparation of the alignment film after isolating the polyamic acid contained in the reaction solution. May be used for the preparation of the alignment film.
 また、前記得られたポリアミック酸を脱水閉環してポリイミドとする場合には、上記反応溶液をそのまま脱水閉環反応に供してもよく、反応溶液中に含まれるポリアミック酸を単離したうえで脱水閉環反応に供してもよく、または単離したポリアミック酸を精製したうえで脱水閉環反応に供してもよい。ポリアミック酸の単離及び精製は公知の方法に従って行うことができる。 Further, when the obtained polyamic acid is subjected to dehydration ring closure to obtain a polyimide, the reaction solution may be subjected to a dehydration ring closure reaction as it is, and the polyamic acid contained in the reaction solution is isolated and then subjected to dehydration ring closure. It may be subjected to a reaction, or may be subjected to a dehydration ring closure reaction after purifying the isolated polyamic acid. Isolation and purification of the polyamic acid can be performed according to known methods.
 前記反応により得られたポリアミック酸をイミド化させてポリイミドとする方法としては、ポリアミック酸を脱水閉環してイミド化することにより得ることができる。具体的には、ポリアミック酸を加熱する方法またはポリアミック酸を有機溶媒に溶解し、当該溶液中に脱水剤及び脱水閉環触媒を添加し必要に応じて加熱する方法により行われる。 As a method of imidizing the polyamic acid obtained by the above reaction to obtain a polyimide, it can be obtained by dehydrating and ring-closing the polyamic acid to imidize. Specifically, it is carried out by a method of heating a polyamic acid or a method of dissolving a polyamic acid in an organic solvent, adding a dehydrating agent and a dehydrating ring-closing catalyst to the solution, and heating as necessary.
 脱水閉環反応に用いられる有機溶媒としては、ポリアミック酸の合成に用いられるものとして例示した有機溶媒を挙げることができるためここでは省略する。 Examples of the organic solvent used in the dehydration ring closure reaction include the organic solvents exemplified as those used for the synthesis of polyamic acid, and are omitted here.
 本発明に係る配向膜としてのポリイミドは、その前駆体であるポリアミック酸が有していたアミック酸構造のすべてを脱水閉環した完全イミド化物であってもよく、アミック酸構造の一部のみを脱水閉環し、アミック酸構造とイミド環構造が併存する部分イミド化物であってもよい。本発明に係るポリイミドは、そのイミド化率が30%以上であることが好ましく、40~99%であることがより好ましく、45~98%であることが更に好ましい。当該イミド化率は、ポリイミドのアミック酸構造の数とイミド環構造の数との合計に対するイミド環構造の数の占める割合を百分率で表したものである。ここで、イミド環の一部がイソイミド環であってもよい。 The polyimide as the alignment film according to the present invention may be a completely imidized product obtained by dehydrating and cyclizing all of the amic acid structure of the precursor polyamic acid, and only a part of the amic acid structure may be dehydrated. It may be a partially imidized product that is ring-closed and has an amic acid structure and an imide ring structure. The imidation ratio of the polyimide according to the present invention is preferably 30% or more, more preferably 40 to 99%, and still more preferably 45 to 98%. The said imidation rate represents the ratio which the number of the imide ring structure accounts with respect to the sum total of the number of the amic acid structures of polyimide, and the number of imide ring structures in percentage. Here, a part of the imide ring may be an isoimide ring.
 なお、本発明において、ポリイミドのイミド化率の測定方法は、イミド化前後で変化しない構造に由来するプロトンを基準プロトンとして決め、このプロトンのピーク積算値と、9.5~10.0ppm付近に現れるアミック酸のNH基に由来するプロトンピーク積算値とを用いて計算している。 In the present invention, the method for measuring the imidization ratio of polyimide is determined by determining a proton derived from a structure that does not change before and after imidation as a reference proton, and the peak integrated value of this proton is around 9.5 to 10.0 ppm. It is calculated using the proton peak integrated value derived from the NH group of the amic acid that appears.
 本発明においてポリアミック酸を溶液中で熱イミド化させる場合の温度は、100℃~400℃であることが好ましく、120℃~250℃であることがより好ましい。この場合、イミド化反応により生成する水を系外に除きながら行う方法が好ましい。 In the present invention, the temperature when polyamic acid is thermally imidized in a solution is preferably 100 ° C. to 400 ° C., more preferably 120 ° C. to 250 ° C. In this case, a method is preferably performed while removing water generated by the imidization reaction from the system.
 本発明においてポリアミック酸を触媒によりイミド化する場合は、上記で得られたポリアミック酸の溶液に、塩基性触媒と酸無水物とを添加し、好ましくは-20~250℃、より好ましくは0~180℃で攪拌することにより得られる。また、この場合、塩基性触媒の量はアミド酸基の0.5~30モル倍、好ましくは2~20モル倍であり、酸無水物の量はアミド酸基の1~50モル倍、好ましくは3~30モル倍である。 In the present invention, when the polyamic acid is imidized with a catalyst, a basic catalyst and an acid anhydride are added to the polyamic acid solution obtained above, preferably −20 to 250 ° C., more preferably 0 to It is obtained by stirring at 180 ° C. In this case, the amount of the basic catalyst is 0.5 to 30 mol times, preferably 2 to 20 mol times of the amic acid group, and the amount of the acid anhydride is 1 to 50 mol times of the amic acid group, preferably Is 3 to 30 mole times.
 前記塩基性触媒としては、ピリジン、コリジン、ルチジン、トリエチルアミン、トリメチルアミン、トリブチルアミンおよびトリオクチルアミンなどを挙げることができる。また、前記酸無水物としては、無水酢酸、無水トリメリット酸、無水ピロメリット酸などを挙げることができる。 Examples of the basic catalyst include pyridine, collidine, lutidine, triethylamine, trimethylamine, tributylamine, and trioctylamine. Examples of the acid anhydride include acetic anhydride, trimellitic anhydride, pyromellitic anhydride, and the like.
 なお、触媒イミド化によるイミド化率は、触媒量と反応温度、反応時間を調節することにより制御することができる。 In addition, the imidation rate by catalytic imidation can be controlled by adjusting the amount of catalyst, reaction temperature, and reaction time.
 本発明において、ポリアミック酸又はポリイミドの反応溶液から、生成したポリアミック酸又はポリイミドを回収する場合には、反応溶液を貧溶媒に投入して沈殿させればよい。沈殿に用いる貧溶媒としてはメタノール、アセトン、ヘキサン、ブチルセルソルブ、ヘプタン、メチルエチルケトン、メチルイソブチルケトン、エタノール、トルエン、ベンゼン、水などを挙げることができる。貧溶媒に投入して沈殿させたポリマーは濾過して回収した後、常圧あるいは減圧下で、常温あるいは加熱して乾燥することができる。 In the present invention, when recovering the produced polyamic acid or polyimide from the reaction solution of polyamic acid or polyimide, the reaction solution may be poured into a poor solvent and precipitated. Examples of the poor solvent used for precipitation include methanol, acetone, hexane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, and water. The polymer precipitated in a poor solvent and collected by filtration can be dried by normal temperature or reduced pressure at room temperature or by heating.
 本発明に係るポリアミック酸及びポリイミドの濃度を10重量%の溶液としたときに、10~800mPa・sの溶液粘度を持つものであることが好ましく、15~500mPa・sの溶液粘度を持つものであることがより好ましい。なお、これらの重合体の溶液粘度(mPa・s)は、当該重合体の良溶媒(例えばγ-ブチロラクトン、N-メチル-2-ピロリドンなど)を用いて調製した濃度10重量%の重合体溶液につき、E型回転粘度計を用いて25℃において測定した値である。 When the concentration of the polyamic acid and polyimide according to the present invention is 10% by weight, the solution preferably has a solution viscosity of 10 to 800 mPa · s, and preferably has a solution viscosity of 15 to 500 mPa · s. More preferably. The solution viscosity (mPa · s) of these polymers is 10% by weight of a polymer solution prepared using a good solvent for the polymer (eg, γ-butyrolactone, N-methyl-2-pyrrolidone, etc.). Is a value measured at 25 ° C. using an E-type viscometer.
 本発明に係る光応答性二量化型高分子としては、上記以外に下記の一般式(1A)または一般式(1B): As the photoresponsive dimerization polymer according to the present invention, the following general formula (1A) or general formula (1B):
Figure JPOXMLDOC01-appb-C000173
Figure JPOXMLDOC01-appb-C000173
(上記一般式(1)中、Spは、単結合、-(CH-(式中、uは1~20を表す。)、-OCH-、-CHO-、―COO-、-OCO-、-CH=CH-、-CF=CF-、-CFO-、-OCF-、-CFCF-および-C≡C-からなる群から選択される少なくとも1種の二価の連結基であり、これらの置換基において非隣接のCH基の一つ以上は独立して、-O-、-CO-、-CO-O-、-O-CO-、-Si(CH-O-Si(CH―、-NR-、-NR-CO-、-CO-NR-、-NR-CO-O-、-O-CO-NR-、-NR-CO-NR-、-CH=CH-、-C≡C-又は-O-CO-O-(式中、Rは、水素又は炭素原子数1から5のアルキル基を表す。)で置換することができ、
 A、Aはそれぞれ独立して、
(a) トランス-1,4-シクロへキシレン基(この基中に存在する1個のメチレン基又は隣接していない2個以上のメチレン基は-O-、-NH-又は-S-に置き換えられてもよい)、
(b) 1,4-フェニレン基(この基中に存在する1個又は2個以上の-CH=は-N=に置き換えられてもよい)、及び
(c) 1,4-シクロヘキセニレン基、2,5-チオフェニレン基、2,5-フラニレン基、1,4-ビシクロ(2.2.2)オクチレン基、ナフタレン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基及び1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基
からなる群より選ばれる基を表し、上記の基(a)、基(b)又は基(c)はそれぞれ無置換であるか又は一個以上の水素原子がフッ素原子、塩素原子、シアノ基、メチル基又はメトキシ基によって置換されていても良く、
 Z、ZおよびZは、それぞれ独立して、単結合、-(CH-(式中、uは1~20を表す。)、-OCH-、-CHO-、―COO-、-OCO-、-CH=CH-、-CF=CF-、-CFO-、-OCF-、-CFCF-又は-C≡C-を表すが、これらの置換基において非隣接のCH基の一つ以上は独立して、-O-、-CO-、-CO-O-、-O-CO-、-Si(CH-O-Si(CH―、-NR-、-NR-CO-、-CO-NR-、-NR-CO-O-、-O-CO-NR-、-NR-CO-NR-、-CH=CH-、-C≡C-又は-O-CO-O-(式中、Rは独立して水素又は炭素原子数1から5のアルキル基を表す。)で置換することができ、
 Xは、-O-、単結合、-NR-またはフェニレン基であり、
 Rは、重合性基、アルコキシ基、シアノ基または炭素原子数1~12個のフッ化アルキル基であり、
 mは、0、1、または2であり、
 M及びMはそれぞれ独立して同一であっても異なっていても良く、以下の一般式(U-1)~(U-13)のいずれか1種のモノマー単位を表し、
(In the general formula (1), Sp is a single bond, — (CH 2 ) u — (wherein u represents 1 to 20), —OCH 2 —, —CH 2 O—, —COO— , —OCO—, —CH═CH—, —CF═CF—, —CF 2 O—, —OCF 2 —, —CF 2 CF 2 —, and —C≡C—. In these substituents, at least one of the non-adjacent CH 2 groups independently represents —O—, —CO—, —CO—O—, —O—CO—, — Si (CH 3 ) 2 —O—Si (CH 3 ) 2 —, —NR—, —NR—CO—, —CO—NR—, —NR—CO—O—, —O—CO—NR—, — NR—CO—NR—, —CH═CH—, —C≡C— or —O—CO—O— (wherein R represents hydrogen or an alkyl group having 1 to 5 carbon atoms). )
A 1 and A 2 are each independently
(A) trans-1,4-cyclohexylene group (in this group, one methylene group or two or more methylene groups not adjacent to each other are replaced by —O—, —NH— or —S—) May be)
(B) a 1,4-phenylene group (one or more of —CH═ present in this group may be replaced by —N═), and (c) a 1,4-cyclohexenylene group 2,5-thiophenylene group, 2,5-furylene group, 1,4-bicyclo (2.2.2) octylene group, naphthalene-1,4-diyl group, naphthalene-2,6-diyl group, deca Represents a group selected from the group consisting of a hydronaphthalene-2,6-diyl group and a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, the group (a), group (b) or group (C) is each unsubstituted or one or more hydrogen atoms may be substituted by fluorine atom, chlorine atom, cyano group, methyl group or methoxy group,
Z 1 , Z 2 and Z 3 are each independently a single bond, — (CH 2 ) u — (wherein u represents 1 to 20), —OCH 2 —, —CH 2 O—, —COO—, —OCO—, —CH═CH—, —CF═CF—, —CF 2 O—, —OCF 2 —, —CF 2 CF 2 —, or —C≡C—, but these substitutions One or more of the non-adjacent CH 2 groups in the group are independently —O—, —CO—, —CO—O—, —O—CO—, —Si (CH 3 ) 2 —O—Si (CH 3 ) 2 —, —NR—, —NR—CO—, —CO—NR—, —NR—CO—O—, —O—CO—NR—, —NR—CO—NR—, —CH═CH— , —C≡C— or —O—CO—O— (wherein R independently represents hydrogen or an alkyl group having 1 to 5 carbon atoms),
X is —O—, a single bond, —NR— or a phenylene group,
R b is a polymerizable group, an alkoxy group, a cyano group, or a fluorinated alkyl group having 1 to 12 carbon atoms,
m is 0, 1, or 2;
M b and M d may be the same or different from each other and each represents a monomer unit of the following general formulas (U-1) to (U-13);
Figure JPOXMLDOC01-appb-C000174
Figure JPOXMLDOC01-appb-C000174
(上記一般式(U-1)~(U-10)中、破線はSpへの結合を表し、Rは独立して水素原子、炭素原子数1から5のアルキル基、フェニル基、ハロゲン原子を表し、それぞれの構造中の任意の水素原子はフッ素原子、塩素原子、メチル基、フェニル基、メトキシ基によって置換されていてもよく、
 上記一般式(U-11)~(U-13)中、破線はSpへの結合を表し、Rは4価の環構造、Rは3価の有機基、Rは水素原子、水酸基、炭素原子数1~15個のアルキル基、炭素原子数1~15個のアルコキシ基を表す。)
 y及びwは、コポリマーのモル分率を表し、0<y≦1かつ、0≦w<1であり、nは4~100,000を表し、M及びMのモノマー単位は各々独立して1種類でも2種類以上の異なる単位からなっていても良い。)
で表される光応答性二量化型高分子、その加水分解物または加水分解物の縮合物であることが好ましい。
(In the above general formulas (U-1) to (U-10), the broken line represents a bond to Sp, and R a is independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a phenyl group, a halogen atom. Any hydrogen atom in each structure may be substituted by a fluorine atom, a chlorine atom, a methyl group, a phenyl group, a methoxy group,
In the above general formulas (U-11) to (U-13), the broken line represents a bond to Sp, R 1 is a tetravalent ring structure, R 2 is a trivalent organic group, R 3 is a hydrogen atom, a hydroxyl group Represents an alkyl group having 1 to 15 carbon atoms and an alkoxy group having 1 to 15 carbon atoms. )
y and w represent the molar fraction of the copolymer, 0 <y ≦ 1 and 0 ≦ w <1, n represents 4 to 100,000, and the monomer units of M b and M d are each independently One type or two or more types of different units may be used. )
It is preferable that it is a photoresponsive dimerization type | mold polymer | macromolecule represented by these, its hydrolyzate, or the condensate of a hydrolyzate.
 また、上記本発明に係る一般式(1)で表される光応答性高分子の好ましい形態として、Zが単結合である光応答性二量化型高分子が好ましい。 Moreover, as a preferable form of the photoresponsive polymer represented by the general formula (1) according to the present invention, a photoresponsive dimerization polymer in which Z 2 is a single bond is preferable.
 他の本発明に係る光応答性二量化型高分子は、下記の一般式(2): Other photoresponsive dimerization polymer according to the present invention is represented by the following general formula (2):
Figure JPOXMLDOC01-appb-C000175
Figure JPOXMLDOC01-appb-C000175
(上記一般式(2)中、MおよびMはそれぞれ互いに独立して、アクリレート、メタクリレート、2-クロロアクリレート、2-フェニルアクリレート、低級アルキル基でN-置換されていてもよいアクリルアミド、メタクリルアミド、2-クロロアクリルアミド、2-フェニルアクリルアミド、ビニルエーテル、ビニルエステル、スチレン誘導体およびシロキサン類からなる群から選択される少なくとも1種の繰り返し単位であり、
 Mは、アクリレート、メタクリレート、2-クロロアクリレート、2-フェニルアクリレート、低級アルキルでN-置換されていてもよいアクリルアミド、メタクリルアミド、2-クロロアクリルアミド、2-フェニルアクリルアミド、ビニルエーテル、ビニルエステル、アクリル酸またはメタクリル酸の直鎖状-もしくは分岐状アルキルエステル、アクリル酸もしくはメタクリル酸のアリルエステル、アルキルビニルエーテルもしくは-エステル、フェノキシニアルキルアクリレートもしくはフェノキシアルキルメタクリレートもしくはヒドロキシアルキルアクリレートもしくはヒドロキシアルキルメタクリレート、フェニルアルキルアクリレートもしくはフェニルアルキルメタクリレート、アクリロニトリル、メタクリロニトリル、スチレン、4-メチルスチレンおよびシロキサン類からなる群から選択される少なくとも1種の繰り返し単位であり、
 A、B、C、A、BおよびCはそれぞれ互いに独立して、
(a) トランス-1,4-シクロへキシレン基(この基中に存在する1個のメチレン基又は隣接していない2個以上のメチレン基は-O-、-NH-又は-S-に置き換えられてもよい)、
(b) 1,4-フェニレン基(この基中に存在する1個又は2個以上の-CH=は-N=に置き換えられてもよい)、及び
(c) 1,4-シクロヘキセニレン基、2,5-チオフェニレン基、2,5-フラニレン基、1,4-ビシクロ(2.2.2)オクチレン基、ナフタレン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基及び1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基
からなる群より選ばれる基を表し、上記の基(a)、基(b)又は基(c)はそれぞれ無置換であるか又は一個以上の水素原子がフッ素原子、塩素原子、シアノ基、メチル基又はメトキシ基によって置換されていても良く、
 SおよびSはそれぞれ互いに独立して、フッ素原子、塩素原子もしくはシアノ基で1以上置換された直鎖状もしくは分岐状アルキレン基(-(CH-)または-(CH-L-(CH-(式中、Lは、単結合または-O-、-COO-、-OOC-、-NR-、-NR-CO-、-CO-NR-、-NR-COO-、-OCO-NR-、-NR-CO-NR-、-CH=CH-または-C≡C-を意味し、その際にRは水素原子または低級アルキル基を意味し、rおよびsは、r+s≦24という条件のもとで1~20の整数であり、)であり、
 D、Dはそれぞれ互いに独立して、-O-、-NR-、または下記の式(d)~(f):
(d) トランス-1,4-シクロへキシレン基(この基中に存在する1個のメチレン基又は隣接していない2個以上のメチレン基は-O-、-NH-又は-S-に置き換えられてもよい)、
(e) 1,4-フェニレン基(この基中に存在する1個又は2個以上の-CH=は-N=に置き換えられてもよい)、及び
(f) 1,4-シクロヘキセニレン基、2,5-チオフェニレン基、2,5-フラニレン基、1,4-ビシクロ(2.2.2)オクチレン基、ナフタレン-1,4-ジイル基、ナフタレン-2,6-ジイル基、デカヒドロナフタレン-2,6-ジイル基及び1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基
からなる群より選ばれる基を含み、上記の基(d)、基(e)又は基(f)はそれぞれ無置換であるか又は一個以上の水素原子がフッ素原子、塩素原子、シアノ基、メチル基又はメトキシ基によって置換されていても良い、を意味し、その際にRは水素原子または低級アルキル基であり、
 X、X、YおよびYはそれぞれ互いに独立して、水素原子、フッ素原子、塩素原子、シアノ基、場合によってはフッ素原子で置換されそしてCH基または複数の非隣接CH基が場合によっては-O-、-COO-、-OOC-および/または-CH=CH-で交換されていてもよい炭素原子数1~12のアルキル基を意味し、
 Z1a、Z1b、Z2aおよびZ2bはそれぞれ互いに独立して、単結合、-(CH)t-、-O-、-CO-、-CO-O-、-O-OC-、-NR-、-CO-NR-、-NR-CO-、-(CH-O-、-O-(CH-、-(CH-NR-または-NR-(CH-であり、その際にRは水素原子または低級アルキル基を意味し;tは1~4の整数を意味し;uは1~3の整数であり、
 p、p、qおよびqはそれぞれ互いに独立して、0または1であり、
 R1aおよびR2aはそれぞれ互いに独立して、水素原子、フッ素原子、塩素原子、シアノ基、ニトロ基、または炭素原子数1~20の直鎖状もしくは分岐状のアルキル基、アルコキシ基、アルキル-COO-、アルキル-CO-NRまたはアルキル-OCO基を意味し、その際にRは水素原子または低級アルキル基を意味し、前記アルキル基または前記アルコキシ基の1以上の水素原子は、フッ素原子、塩素原子、シアノ基またはニトロ基で置換されてもよく、前記アルキル基または前記アルコキシ基のCH基または複数の非隣接CH基が-O-、-CH=CH-または-C≡C-に置換されてもよく、
 n、nおよびnは0<n≦1、0≦n<1および0≦n≦0.5のコモノマーのモル分率である)
で表される光応答性二量化型高分子であることが好ましい。
(In the above general formula (2), M 1 and M 2 are each independently of each other acrylate, methacrylate, 2-chloroacrylate, 2-phenyl acrylate, acrylamide, methacryl which may be N-substituted with a lower alkyl group. At least one repeating unit selected from the group consisting of amide, 2-chloroacrylamide, 2-phenylacrylamide, vinyl ether, vinyl ester, styrene derivative and siloxanes;
M 3 is acrylate, methacrylate, 2-chloroacrylate, 2-phenylacrylate, acrylamide, methacrylamide, 2-chloroacrylamide, 2-phenylacrylamide, vinyl ether, vinyl ester, acrylic which may be N-substituted with lower alkyl. Linear or branched alkyl ester of acid or methacrylic acid, allyl ester of acrylic acid or methacrylic acid, alkyl vinyl ether or ester, phenoxynialkyl acrylate or phenoxyalkyl methacrylate or hydroxyalkyl acrylate or hydroxyalkyl methacrylate, phenylalkyl acrylate Or phenylalkyl methacrylate, acrylonitrile, methacrylonitrile, At least one repeating unit selected from the group consisting of tylene, 4-methylstyrene and siloxanes,
A 1 , B 1 , C 1 , A 2 , B 2 and C 2 are each independently of each other,
(A) trans-1,4-cyclohexylene group (in this group, one methylene group or two or more methylene groups not adjacent to each other are replaced by —O—, —NH— or —S—) May be)
(B) a 1,4-phenylene group (one or more of —CH═ present in this group may be replaced by —N═), and (c) a 1,4-cyclohexenylene group 2,5-thiophenylene group, 2,5-furylene group, 1,4-bicyclo (2.2.2) octylene group, naphthalene-1,4-diyl group, naphthalene-2,6-diyl group, deca Represents a group selected from the group consisting of a hydronaphthalene-2,6-diyl group and a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, the group (a), group (b) or group (C) is each unsubstituted or one or more hydrogen atoms may be substituted by fluorine atom, chlorine atom, cyano group, methyl group or methoxy group,
S 1 and S 2 are each independently a linear or branched alkylene group (— (CH 2 ) r —) or — (CH 2 ) r substituted with one or more fluorine atom, chlorine atom or cyano group —L— (CH 2 ) s — (wherein L is a single bond or —O—, —COO—, —OOC—, —NR 1 —, —NR 1 —CO—, —CO—NR 1 —, —NR 1 —COO—, —OCO—NR 1 —, —NR 1 —CO—NR 1 —, —CH═CH— or —C≡C—, wherein R 1 is a hydrogen atom or lower alkyl And r and s are integers from 1 to 20 under the condition r + s ≦ 24, and
D 1 and D 2 each independently represent —O—, —NR 2 —, or the following formulas (d) to (f):
(D) trans-1,4-cyclohexylene group (in this group, one methylene group or two or more methylene groups not adjacent to each other are replaced with —O—, —NH— or —S—) May be)
(E) a 1,4-phenylene group (one or more of —CH═ present in this group may be replaced by —N═), and (f) a 1,4-cyclohexenylene group 2,5-thiophenylene group, 2,5-furylene group, 1,4-bicyclo (2.2.2) octylene group, naphthalene-1,4-diyl group, naphthalene-2,6-diyl group, deca A group selected from the group consisting of a hydronaphthalene-2,6-diyl group and a 1,2,3,4-tetrahydronaphthalene-2,6-diyl group, and the group (d), group (e) or group (F) means that each is unsubstituted or one or more hydrogen atoms may be substituted by a fluorine atom, a chlorine atom, a cyano group, a methyl group or a methoxy group, wherein R 2 is hydrogen An atom or a lower alkyl group,
X 1 , X 2 , Y 1 and Y 2 are each independently of one another substituted with a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, or optionally a fluorine atom, and a CH 2 group or a plurality of non-adjacent CH 2 groups Means an alkyl group having 1 to 12 carbon atoms which may be optionally replaced by —O—, —COO—, —OOC— and / or —CH═CH—,
Z 1a , Z 1b , Z 2a and Z 2b are each independently a single bond, — (CH 2 ) t—, —O—, —CO—, —CO—O—, —O—OC—, — NR 4 —, —CO—NR 4 —, —NR 4 —CO—, — (CH 2 ) u —O—, —O— (CH 2 ) u —, — (CH 2 ) u —NR 4 — or — NR 4 — (CH 2 ) u —, wherein R 4 represents a hydrogen atom or a lower alkyl group; t represents an integer of 1 to 4; u represents an integer of 1 to 3;
p 1 , p 2 , q 1 and q 2 are each independently 0 or 1,
R 1a and R 2a are each independently a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a nitro group, a linear or branched alkyl group having 1 to 20 carbon atoms, an alkoxy group, an alkyl- COO—, alkyl-CO—NR 3 or alkyl-OCO group, wherein R 3 represents a hydrogen atom or a lower alkyl group, and one or more hydrogen atoms of the alkyl group or the alkoxy group are fluorine May be substituted with an atom, a chlorine atom, a cyano group or a nitro group, and the CH 2 group or a plurality of non-adjacent CH 2 groups of the alkyl group or the alkoxy group may be —O—, —CH═CH— or —C≡. May be substituted with C-
n 1 , n 2 and n 3 are mole fractions of comonomer where 0 <n 1 ≦ 1, 0 ≦ n 2 <1 and 0 ≦ n 3 ≦ 0.5)
It is preferable that it is a photoresponsive dimerization type | mold polymer represented by these.
 以下に、本発明の液晶表示素子の製造方法を説明する。本発明の液晶表示素子は、例えば以下の工程(1)~(3)により製造することが好ましい。 Hereinafter, a method for producing the liquid crystal display element of the present invention will be described. The liquid crystal display element of the present invention is preferably produced, for example, by the following steps (1) to (3).
 本発明に係る液晶表示素子の製造方法は、基板上に本発明に係る光配向膜前駆体溶液を塗布した後、当該塗布面を加熱することにより基板上に塗膜を形成することが好ましい(工程(1))。より詳細には、例えば櫛歯型にパターニングされた透明導電膜が設けられている基板の導電膜形成面と、導電膜が設けられていない対向基板の一面とに、本発明の光配向膜前駆体溶液をそれぞれ塗布し、次いで各塗布面を加熱することにより塗膜を形成する。 In the method for producing a liquid crystal display element according to the present invention, it is preferable to form a coating film on the substrate by applying the photo-alignment film precursor solution according to the present invention on the substrate and then heating the coated surface ( Step (1)). More specifically, for example, the photo-alignment film precursor of the present invention is formed on the conductive film forming surface of the substrate provided with the transparent conductive film patterned in a comb-teeth shape and on one surface of the counter substrate provided with no conductive film. Each of the body solutions is applied, and each coated surface is heated to form a coating film.
 本発明に係る光配向膜前駆体溶液は、上述した光応答性分解型高分子を含む溶液であることが好ましい。また、当該光応答性分解型高分子は、テトラカルボン酸二無水物と、ジアミン化合物とを反応させて得られるポリアミック酸及びポリイミドよりなる群から選択される少なくとも一種の重合体および前記有機溶媒とを含有することが好ましい。 The photo-alignment film precursor solution according to the present invention is preferably a solution containing the above-described photo-responsive decomposition type polymer. Further, the photoresponsive decomposition type polymer includes at least one polymer selected from the group consisting of polyamic acid and polyimide obtained by reacting tetracarboxylic dianhydride and a diamine compound, and the organic solvent. It is preferable to contain.
 本発明の光配向膜前駆体溶液を、好ましくはオフセット印刷法、スピンコート法、ロールコーター法又はインクジェット印刷法によりそれぞれ塗布する。ここに、基板としては、例えばフロートガラス、ソーダガラスなどのガラス;ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリエーテルスルホン、ポリカーボネート、ポリ(脂環式オレフィン)などのプラスチックからなる透明基板を用いることができる。(第一の)基板の一面に設けられる透明導電膜としては、酸化スズ(SnO)からなるNESA膜、酸化インジウム-酸化スズ(In-SnO)からなるITO膜などを用いてもよい。さらに、パターニングされた透明導電膜を得るには、例えばパターンなし透明導電膜を形成した後フォト・エッチングによりパターンを形成する方法や、透明導電膜を形成する際に所望のパターンを有するマスクを用いる方法などに採用することができる。前記光配向膜前駆体溶液の塗布に際しては、基板表面及び透明導電膜と塗膜との接着性をさらに良好にするために、基板表面を官能性シラン化合物、官能性チタン化合物などの公知の方法で予め表面処理をしてもよい。 The photo-alignment film precursor solution of the present invention is preferably applied by an offset printing method, a spin coating method, a roll coater method, or an inkjet printing method. Here, as the substrate, for example, a glass such as float glass or soda glass; a transparent substrate made of a plastic such as polyethylene terephthalate, polybutylene terephthalate, polyethersulfone, polycarbonate, or poly (alicyclic olefin) can be used. As the transparent conductive film provided on one surface of the (first) substrate, a NESA film made of tin oxide (SnO 2 ), an ITO film made of indium oxide-tin oxide (In 2 O 3 —SnO 2 ), or the like is used. Also good. Furthermore, in order to obtain a patterned transparent conductive film, for example, a method of forming a pattern by photo-etching after forming a transparent conductive film without a pattern, or a mask having a desired pattern when forming a transparent conductive film is used. It can be employed in methods. In applying the photo-alignment film precursor solution, in order to further improve the adhesion between the substrate surface and the transparent conductive film and the coating film, the substrate surface is a known method such as a functional silane compound or a functional titanium compound. The surface treatment may be performed in advance.
 前記光配向膜前駆体溶液を塗布した後、必要によりプレベークを行ってもよく、その場合のプレベーク温度は、好ましくは30~200℃である。また、当該プレベーク時間は、好ましくは0.25~10分である。その後、溶剤を完全に除去し、必要に応じて重合体に存在するアミック酸構造を熱イミド化することを目的として焼成工程を行うことが好ましい。このときの焼成温度は、好ましくは80~300℃である。焼成時間は、好ましくは5~200分である。このようにして、形成される膜の膜厚は、好ましくは0.001~1μmである。 After applying the photo-alignment film precursor solution, pre-baking may be performed as necessary. In this case, the pre-baking temperature is preferably 30 to 200 ° C. The prebake time is preferably 0.25 to 10 minutes. Then, it is preferable to perform a baking process for the purpose of removing a solvent completely and heat imidizing the amic acid structure which exists in a polymer as needed. The firing temperature at this time is preferably 80 to 300 ° C. The firing time is preferably 5 to 200 minutes. The film thickness thus formed is preferably 0.001 to 1 μm.
 また、本発明の光配向膜前駆体溶液に含有される重合体が、ポリアミック酸又はイミド環構造とアミック酸構造とを有するイミド化重合体である場合には、塗膜形成後に更に加熱することによって脱水閉環反応を進行させ、よりイミド化された塗膜としてもよい。 Moreover, when the polymer contained in the photo-alignment film precursor solution of the present invention is a polyamic acid or an imidized polymer having an imide ring structure and an amic acid structure, the film is further heated after the coating is formed. It is good also as a more imidized coating film by making a dehydration ring-closing reaction proceed.
 本発明に係る液晶表示素子の製造方法は、前記基板上に形成されたポリアミック酸またはポリイミドを含む塗膜に光照射することが好ましい(工程(2))。また、当該工程(2)は、後述の工程(3)の後行ってもよい。当該塗膜に対して照射する光としては、150~800nmの波長の光を含む紫外線または可視光線を用いることができ、300~400nmの波長の光を含む紫外線が好ましい。 In the method for producing a liquid crystal display element according to the present invention, it is preferable to irradiate a coating film containing polyamic acid or polyimide formed on the substrate (step (2)). Moreover, you may perform the said process (2) after the below-mentioned process (3). As the light applied to the coating film, ultraviolet rays or visible rays containing light having a wavelength of 150 to 800 nm can be used, and ultraviolet rays containing light having a wavelength of 300 to 400 nm are preferable.
 前記照射光の光源としては、低圧水銀ランプ、高圧水銀ランプ、重水素ランプ、メタルハライドランプ、アルゴン共鳴ランプ、キセノンランプ、エキシマーレーザーなどを使用することができる。なお、上記好ましい波長領域の紫外線は、光源を、例えばフィルター、回折格子などと併用する手段などにより得ることができる。光の照射量としては、好ましくは1,000J/m以上100,000J/m以下である。 As a light source for the irradiation light, a low-pressure mercury lamp, a high-pressure mercury lamp, a deuterium lamp, a metal halide lamp, an argon resonance lamp, a xenon lamp, an excimer laser, or the like can be used. The ultraviolet rays in the preferable wavelength region can be obtained by means of using a light source in combination with, for example, a filter or a diffraction grating. The amount of light irradiation is preferably 1,000 J / m 2 or more and 100,000 J / m 2 or less.
 本発明に係る液晶表示素子の製造方法は、光配向膜または塗膜が形成された一対の基板を間隙(セルギャップ)を介して対向配置し、かつ当該間隙に本発明に係る液晶組成物を充填することが好ましい(工程(3))。 In the method for producing a liquid crystal display device according to the present invention, a pair of substrates on which a photo-alignment film or a coating film is formed face each other with a gap (cell gap) therebetween, and the liquid crystal composition according to the present invention is placed in the gap. It is preferable to fill (step (3)).
 また、液晶組成物に重合性モノマーを混合している場合は、液晶組成物を充填後、電圧を無印加状態で所定の方法で重合性モノマーを重合する工程(4)をさらに備えてもよい。 In addition, when a polymerizable monomer is mixed in the liquid crystal composition, the method may further include a step (4) of polymerizing the polymerizable monomer by a predetermined method without applying a voltage after filling the liquid crystal composition. .
 前記液晶組成物を充填する方法としては、(1)真空注入法(光配向膜または塗膜が形成された一対の基板につき、二枚の基板の当該膜の配向方向が直交となるように間隙(セルギャップ)を介して対向配置し、二枚の基板の周辺部をシール剤を用いて貼り合わせ、基板表面及びシール剤により区画されたセルギャップ内に液晶を注入充填し、注入孔を封止して液晶セルを構成する方法)または(2)ODF法が挙げられる。真空注入法による液晶組成物を導入する方法では滴下痕は発生しないものの基板サイズの大型化に伴い、製造時間やコストなどに問題がある。しかし、本願発明においては、光配向膜と液晶組成物との組み合わせからODF法を用いて製造する表示素子により好適に使用することができる。 As a method for filling the liquid crystal composition, (1) vacuum injection method (for a pair of substrates on which a photo-alignment film or a coating film is formed, a gap is formed so that the alignment directions of the two substrates are orthogonal to each other. (Cell gap) are placed facing each other, the periphery of the two substrates are bonded together using a sealant, liquid crystal is injected and filled into the cell gap defined by the substrate surface and the sealant, and the injection hole is sealed. And a method of forming a liquid crystal cell by stopping) or (2) ODF method. In the method of introducing the liquid crystal composition by the vacuum injection method, although no drop mark is generated, there is a problem in manufacturing time, cost, etc. as the substrate size increases. However, in this invention, it can be used conveniently by the display element manufactured using the ODF method from the combination of a photo-alignment film and a liquid-crystal composition.
 また、本願発明のように水平配向方式では同一基板(例えば、図3および図5では第一の基板)の表面にTFTなど電極層3(光配向膜が被覆している面)が形成されているため、当該表面には多数の凹凸が存在し、滴下痕の発生を促進しやすい環境になっているが、光配向膜と液晶組成物との組み合わせによりこの問題点が軽減されていると考えられる。 Further, in the horizontal alignment method as in the present invention, an electrode layer 3 such as a TFT (a surface covered with a photo-alignment film) is formed on the surface of the same substrate (for example, the first substrate in FIGS. 3 and 5). Therefore, there are many irregularities on the surface, and it is easy to promote the generation of dripping marks, but this problem is thought to be mitigated by the combination of the photo-alignment film and the liquid crystal composition. It is done.
 また、本発明に係る重合性モノマーを含有した液晶組成物は、これに含まれる重合性モノマーが紫外線照射により重合することで液晶配向能が付与され、液晶組成物の複屈折を利用して光の透過光量を制御する液晶表示素子に使用されることが好ましい。液晶表示素子として、VA-IPS-LCD、FFS-LCD、AM-LCD(アクティブマトリックス液晶表示素子)及びIPS-LCD(インプレーンスイッチング液晶表示素子)に有用であるが、AM-LCDに特に有用であり、透過型あるいは反射型の液晶表示素子に用いることができる。 Further, the liquid crystal composition containing the polymerizable monomer according to the present invention is provided with liquid crystal alignment ability by polymerization of the polymerizable monomer contained therein by irradiation with ultraviolet rays, and light utilizing the birefringence of the liquid crystal composition. The liquid crystal display element is preferably used for controlling the amount of transmitted light. As a liquid crystal display element, it is useful for VA-IPS-LCD, FFS-LCD, AM-LCD (active matrix liquid crystal display element) and IPS-LCD (in-plane switching liquid crystal display element), but particularly useful for AM-LCD. Yes, it can be used for a transmissive or reflective liquid crystal display element.
 前記液晶表示素子に使用される液晶セルの2枚の基板はガラス又はプラスチックの如き柔軟性をもつ透明な材料を用いることができ、一方はシリコン等の不透明な材料でも良い。透明電極層を有する透明基板は、例えば、ガラス板等の透明基板上にインジウムスズオキシド(ITO)をスパッタリングすることにより得ることができる。 The two substrates of the liquid crystal cell used in the liquid crystal display element can be made of a transparent material having flexibility such as glass or plastic, and one of them can be an opaque material such as silicon. A transparent substrate having a transparent electrode layer can be obtained, for example, by sputtering indium tin oxide (ITO) on a transparent substrate such as a glass plate.
 前記カラーフィルタは、例えば、顔料分散法、印刷法、電着法又は、染色法等によって作製することができる。顔料分散法によるカラーフィルタの作成方法を一例に説明すると、カラーフィルタ用の硬化性着色組成物を、該透明基板上に塗布し、パターニング処理を施し、そして加熱又は光照射により硬化させる。この工程を、赤、緑、青の3色についてそれぞれ行うことで、カラーフィルタ用の画素部を作製することができる。その他、該基板上に、TFT、薄膜ダイオード等の能動素子を設けた画素電極を設置してもよい。 The color filter can be produced by, for example, a pigment dispersion method, a printing method, an electrodeposition method, or a dyeing method. A method for producing a color filter by a pigment dispersion method will be described as an example. A curable coloring composition for a color filter is applied on the transparent substrate, subjected to patterning treatment, and cured by heating or light irradiation. By performing this process for each of the three colors red, green, and blue, a pixel portion for a color filter can be manufactured. In addition, a pixel electrode provided with an active element such as a TFT or a thin film diode may be provided on the substrate.
 前記基板を、透明電極層が内側となるように対向させる。その際、スペーサーを介して、基板の間隔を調整してもよい。このときは、得られる調光層(液晶層)の厚さが1~100μmとなるように調整するのが好ましい。1.5から10μmが更に好ましく、偏光板を使用する場合は、コントラストが最大になるように液晶の屈折率異方性Δnとセル厚Gとの積を調整することが好ましい。又、二枚の偏光板がある場合は、各偏光板の偏光軸を調整して視野角やコントラトが良好になるように調整することもできる。更に、視野角を広げるための位相差フィルムも使用することもできる。スペーサーとしては、例えば、ガラス粒子、プラスチック粒子、アルミナ粒子、フォトレジスト材料などからなる柱状スペーサー等が挙げられる。その後、エポキシ系熱硬化性組成物等のシール剤を、液晶注入口を設けた形で該基板にスクリーン印刷し、該基板同士を貼り合わせ、加熱しシール剤を熱硬化させる。 The substrate is opposed so that the transparent electrode layer is on the inside. In that case, you may adjust the space | interval of a board | substrate through a spacer. In this case, it is preferable to adjust so that the thickness of the light control layer (liquid crystal layer) to be obtained is 1 to 100 μm. More preferably, the thickness is 1.5 to 10 μm. When a polarizing plate is used, it is preferable to adjust the product of the refractive index anisotropy Δn of the liquid crystal and the cell thickness G so that the contrast is maximized. In addition, when there are two polarizing plates, the polarizing axis of each polarizing plate can be adjusted so that the viewing angle and contrast are good. Furthermore, a retardation film for widening the viewing angle can also be used. Examples of the spacer include columnar spacers made of glass particles, plastic particles, alumina particles, a photoresist material, and the like. Thereafter, a sealant such as an epoxy thermosetting composition is screen-printed on the substrates with a liquid crystal inlet provided, the substrates are bonded together, and heated to thermally cure the sealant.
 2枚の基板間に液晶組成物(必要により重合性モノマーを含有する)を狭持させる方法は、通常の真空注入法又はODF法などを用いることができる。しかし真空注入法においては滴下痕が発生しない代わりに、注入の跡が残るという課題がある。本願発明においては、ODF法を用いて製造する表示素子に、より好適に使用することができる。ODF法の液晶表示素子製造工程においては、バックプレーンまたはフロントプレーンのどちらか一方の基板にエポキシ系光熱併用硬化性などのシール剤を、ディスペンサーを用いて閉ループ土手状に描画し、その中に脱気下で所定量の液晶組成物を滴下後、フロントプレーンとバックプレーンを接合することによって液晶表示素子を製造することができる。本発明の液晶組成物は、ODF工程における液晶組成物の滴下が安定的に行えるため、好適に使用することができる。 As a method of sandwiching the liquid crystal composition (containing a polymerizable monomer as necessary) between the two substrates, a normal vacuum injection method or an ODF method can be used. However, in the vacuum injection method, there is a problem that an injection mark remains instead of a drop mark. In this invention, it can use more suitably for the display element manufactured using ODF method. In the ODF liquid crystal display device manufacturing process, a sealant such as epoxy photothermal curing is drawn on a backplane or frontplane substrate using a dispenser in a closed-loop bank shape, and then removed. A liquid crystal display element can be manufactured by bonding a front plane and a back plane after dropping a predetermined amount of the liquid crystal composition in the air. The liquid crystal composition of the present invention can be preferably used because the liquid crystal composition can be stably dropped in the ODF process.
 重合性モノマーを重合させる方法としては、液晶の良好な配向性能を得るためには、適度な重合速度が望ましいので、紫外線又は電子線等の活性エネルギー線を単一又は併用又は順番に照射することによって重合させる方法が好ましい。紫外線を使用する場合、偏光光源を用いても良いし、非偏光光源を用いても良い。また、重合性モノマー含有液晶組成物を2枚の基板間に挟持させて状態で重合を行う場合には、少なくとも照射面側の基板は活性エネルギー線に対して適当な透明性が与えられていなければならない。また、光照射時にマスクを用いて特定の部分のみを重合させた後、電場や磁場又は温度等の条件を変化させることにより、未重合部分の配向状態を変化させて、更に活性エネルギー線を照射して重合させるという手段を用いても良い。特に紫外線露光する際には、重合性モノマー含有液晶組成物に電圧を無印加の状態で紫外線露光することが好ましい。横電界型MVAモードの液晶表示素子においては、配向安定性及びコントラストの観点からプレチルト角(液晶分子の長軸と基板表面とのなす角)を0°程度に制御することが好ましい。 As a method for polymerizing the polymerizable monomer, an appropriate polymerization rate is desirable in order to obtain good alignment performance of the liquid crystal. Therefore, active energy rays such as ultraviolet rays or electron beams are irradiated singly or in combination or sequentially. The method of polymerizing by is preferred. When ultraviolet rays are used, a polarized light source or a non-polarized light source may be used. In addition, when the polymerization is performed in a state where the polymerizable monomer-containing liquid crystal composition is sandwiched between two substrates, at least the substrate on the irradiation surface side must be given appropriate transparency to the active energy rays. I must. Moreover, after polymerizing only a specific part using a mask during light irradiation, the orientation state of the unpolymerized part is changed by changing conditions such as an electric field, a magnetic field, or temperature, and further irradiation with active energy rays is performed. Then, it is possible to use a means for polymerization. In particular, when ultraviolet exposure is performed, it is preferable that the polymerizable monomer-containing liquid crystal composition is exposed to ultraviolet light without applying a voltage. In a horizontal electric field type MVA mode liquid crystal display element, it is preferable to control the pretilt angle (angle formed between the major axis of the liquid crystal molecules and the substrate surface) to about 0 ° from the viewpoint of alignment stability and contrast.
 照射時の温度は、本発明の液晶組成物の液晶状態が保持される温度範囲内であることが好ましい。室温に近い温度、即ち、典型的には15~35℃での温度で重合させることが好ましい。紫外線を発生させるランプとしては、メタルハライドランプ、高圧水銀ランプ、超高圧水銀ランプ等を用いることができる。また、照射する紫外線の波長としては、液晶組成物の吸収波長域でない波長領域の紫外線を照射することが好ましく、必要に応じて、紫外線をカットして使用することが好ましい。照射する紫外線の強度は、0.1mW/cm~100W/cmが好ましく、2mW/cm~50W/cmがより好ましい。照射する紫外線のエネルギー量は、適宜調整することができるが、10mJ/cmから500J/cmが好ましく、100mJ/cmから200J/cmがより好ましい。紫外線を照射する時間は照射する紫外線強度により適宜選択されるが、メタルハライドランプ、高圧水銀ランプ又は超高圧水銀ランプを用いる場合は10秒から3600秒が好ましく、10秒から600秒がより好ましく、蛍光ランプを用いる場合は60秒から18000秒が好ましく、600秒から10800秒が好ましい。 The temperature during irradiation is preferably within a temperature range in which the liquid crystal state of the liquid crystal composition of the present invention is maintained. Polymerization is preferably performed at a temperature close to room temperature, that is, typically at a temperature of 15 to 35 ° C. As a lamp for generating ultraviolet rays, a metal halide lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, or the like can be used. Moreover, as a wavelength of the ultraviolet-rays to irradiate, it is preferable to irradiate the ultraviolet-ray of the wavelength range which is not the absorption wavelength range of a liquid crystal composition, and it is preferable to cut and use an ultraviolet-ray as needed. Intensity of ultraviolet irradiation is preferably from 0.1mW / cm 2 ~ 100W / cm 2, 2mW / cm 2 ~ 50W / cm 2 is more preferable. The amount of energy of ultraviolet rays to be irradiated can be adjusted as appropriate, but is preferably 10 mJ / cm 2 to 500 J / cm 2, and more preferably 100 mJ / cm 2 to 200 J / cm 2 . The time for irradiating with ultraviolet rays is appropriately selected depending on the intensity of the irradiating ultraviolet rays, but when using a metal halide lamp, high pressure mercury lamp or ultra high pressure mercury lamp, it is preferably 10 seconds to 3600 seconds, more preferably 10 seconds to 600 seconds, and fluorescence. In the case of using a lamp, 60 seconds to 18000 seconds are preferable, and 600 seconds to 10800 seconds are preferable.
 前記第1基板又は前記第2基板は、実質的に透明であれば材質に特に限定はなく、ガラス、セラミックス、プラスチック等を使用することができる。プラスチック基板としてはセルロ-ス、トリアセチルセルロ-ス、ジアセチルセルロ-ス等のセルロ-ス誘導体、ポリシクロオレフィン誘導体、ポリエチレンテレフタレ-ト、ポリエチレンナフタレ-ト等のポリエステル、ポリプロピレン、ポリエチレン等のポリオレフィン、ポリカーボネート、ポリビニルアルコ-ル、ポリ塩化ビニル、ポリ塩化ビニリデン、ポリアミド、ポリイミド、ポリイミドアミド、ポリスチレン、ポリアクリレート、ポリメチルメタクリレ-ト、ポリエーテルサルホン、ポリアリレート、さらにガラス繊維-エポキシ樹脂、ガラス繊維-アクリル樹脂などの無機-有機複合材料などを用いることができる。 The first substrate or the second substrate is not particularly limited as long as it is substantially transparent, and glass, ceramics, plastics, or the like can be used. Plastic substrates include cellulose derivatives such as cellulose, triacetyl cellulose, diacetyl cellulose, polycycloolefin derivatives, polyesters such as polyethylene terephthalate and polyethylene naphthalate, polypropylene, polyethylene, etc. Polyolefin, polycarbonate, polyvinyl alcohol, polyvinyl chloride, polyvinylidene chloride, polyamide, polyimide, polyimide amide, polystyrene, polyacrylate, polymethyl methacrylate, polyethersulfone, polyarylate, and glass fiber-epoxy resin Inorganic-organic composite materials such as glass fiber-acrylic resin can be used.
 なおプラスチック基板を使用する際には、バリア膜を設けることが好ましい。バリア膜の機能は、プラスチック基板が有する透湿性を低下させ、液晶表示素子の電気特性の信頼性を向上することにある。バリア膜としては、それぞれ、透明性が高く水蒸気透過性が小さいものであれば特に限定されず、一般的には酸化ケイ素などの無機材料を用いて蒸着やスパッタリング、ケミカルベーパーデポジション法(CVD法)によって形成した薄膜を使用する。 When using a plastic substrate, it is preferable to provide a barrier film. The function of the barrier film is to reduce the moisture permeability of the plastic substrate and to improve the reliability of the electrical characteristics of the liquid crystal display element. The barrier film is not particularly limited as long as it has high transparency and low water vapor permeability. Generally, vapor deposition, sputtering, chemical vapor deposition method (CVD method) using an inorganic material such as silicon oxide is used. ) Is used.
 本発明においては、前記第1基板又は前記第2基板として同素材を使用しても異素材を使用してもよく、特に限定はない。ガラス基板を用いれば耐熱性や寸法安定性の優れた液晶表示素子を作製することができるので好ましい。またプラスチック基板であれば、ロールツウロール法による製造方法に適し且つ軽量化あるいはフレキシブル化に適しており好ましい。また、平坦性及び耐熱性付与を目的とするならば、プラスチック基板とガラス基板とを組み合わせると良い結果を得ることができる。 In the present invention, the same material or different materials may be used as the first substrate or the second substrate, and there is no particular limitation. Use of a glass substrate is preferable because a liquid crystal display element having excellent heat resistance and dimensional stability can be manufactured. In addition, a plastic substrate is preferable because it is suitable for a manufacturing method using a roll-to-roll method and is suitable for weight reduction or flexibility. For the purpose of imparting flatness and heat resistance, good results can be obtained by combining a plastic substrate and a glass substrate.
 以下に実施例を挙げて本発明を更に詳述するが、本発明はこれらの実施例に限定されるものではない。また、以下の実施例及び比較例の組成物における「%」は「質量%」を意味する。 Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. Further, “%” in the compositions of the following Examples and Comparative Examples means “mass%”.
 実施例中、測定した特性は以下の通りである。 In the examples, the measured characteristics are as follows.
 Tni :ネマチック相-等方性液体相転移温度(℃)
 Δn :295Kにおける屈折率異方性(別名:複屈折)
 Δε :295Kおける誘電率異方性
 η  :295Kにおける粘度(mPa・s)
 γ1 :295Kにおける回転粘性(mPa・s)
 VHR:周波数60Hz,印加電圧5Vの条件下で313Kにおける電圧保持率(%)
 焼き付き:
 液晶表示素子の焼き付き評価は、表示エリア内に所定の固定パターンを1440時間表示させた後に、全画面均一な表示を行ったときの固定パターンの残像のレベルを目視にて以下の4段階評価で行った。
Tni: Nematic phase-isotropic liquid phase transition temperature (° C)
Δn: Refractive index anisotropy at 295K (also known as birefringence)
Δε: Dielectric anisotropy at 295K η: Viscosity at 295K (mPa · s)
γ1: rotational viscosity at 295 K (mPa · s)
VHR: Voltage holding ratio (%) at 313K under conditions of frequency 60Hz and applied voltage 5V
Burn-in:
The burn-in evaluation of the liquid crystal display element is based on the following four-step evaluation of the afterimage level of the fixed pattern when the predetermined fixed pattern is displayed in the display area for 1440 hours and then the entire screen is displayed uniformly. went.
 ◎残像無し
 ○残像ごく僅かに有るも許容できるレベル
 △残像有り許容できないレベル
 ×残像有りかなり劣悪
 揮発性/製造装置汚染性 :
 液晶材料の揮発性評価は、真空攪拌脱泡ミキサーの運転状態をストロボスコープで照らしながら観察し、液晶材料の発泡を目視により観察することによって行った。具体的には、容量2.0Lの真空攪拌脱泡ミキサーの専用容器に液晶組成物を0.8kg入れ、4kPaの脱気下、公転速度15S-1、自転速度7.5S-1で真空攪拌脱泡ミキサーを運転し、発泡が始まるまでの時間によって、以下の4段階評価で行った。
◎ No afterimages ○ Although there are only afterimages, acceptable level △ Without afterimages, unacceptable level × Without afterimages, quite poor Volatile / contamination of manufacturing equipment:
Evaluation of the volatility of the liquid crystal material was performed by observing the operating state of the vacuum stirring and defoaming mixer with a stroboscope and visually observing foaming of the liquid crystal material. Specifically, put 0.8kg of the liquid crystal composition in a dedicated container vacuum agitation defoaming mixer having a volume 2.0L, under degassing of 4 kPa, the revolution speed 15S -1, vacuum stirring at rotation speed 7.5S -1 The defoaming mixer was operated, and the following four-step evaluation was performed according to the time until foaming started.
 ◎発泡まで3分以上。揮発による装置汚染の可能性が低い。 ◎ More than 3 minutes to foam. The possibility of equipment contamination due to volatilization is low.
 ○発泡まで1分以上かつ3分未満。揮発による軽微な装置汚染の懸念あり。 ○ 1 minute or more and less than 3 minutes until foaming. There is concern about minor equipment contamination due to volatilization.
 △発泡まで30秒以上かつ1分未満。揮発による装置汚染が起きる。 △ 30 seconds or more and less than 1 minute until foaming. Equipment contamination due to volatilization occurs.
 ×発泡まで30秒以内。揮発による重大な装置汚染の懸念がある。 X Within 30 seconds until foaming. There is concern about serious equipment contamination due to volatilization.
 プロセス適合性 :
 プロセス適合性は、ODFプロセスにおいて、定積計量ポンプを用いて1回に40pLずつ液晶を滴下することを100000回行い、次の「0~200回、201~400回、401~600回、・・・・99801~100000回」の各200回ずつ滴下された液晶量の変化を以下の4段階で評価した。
Process suitability:
The process suitability is that the liquid crystal is dropped 40 pL at a time by using a constant volume metering pump 100000 times in the ODF process, and the following “0 to 200 times, 201 to 400 times, 401 to 600 times, ..., 99801 to 100,000 times ”, the change in the amount of liquid crystal dropped 200 times was evaluated in the following four stages.
 ◎変化が極めて小さい(安定的に液晶表示素子を製造できる)
 ○変化が僅かに有るも許容できるレベル
 △変化が有り許容できないレベル(斑発生により歩留まりが悪化)
 ×変化が有りかなり劣悪(液晶漏れや真空気泡が発生)
 低温での溶解性:
 低温での溶解性評価は、液晶組成物を調製後、1mLのサンプル瓶に液晶組成物を0.5g秤量し、これに温度制御式試験槽の中で、次を1サイクル「-20℃(1時間保持)→昇温(0.2℃/毎分)→0℃(1時間保持)→昇温(0.2℃/毎分)→20℃(1時間保持)→降温(-0.2℃/毎分)→0℃(1時間保持)→降温(-0.2℃/毎分)→-20℃」として温度変化を与え続け、目視にて液晶組成物からの析出物の発生を観察し、以下の4段階評価を行った。
◎ Extremely small change (Stable liquid crystal display device can be manufactured)
○ Allowable level with slight change △ Level with change and unacceptable level (Yield deteriorated due to spots)
× There is a change and it is quite inferior (liquid crystal leakage and vacuum bubbles are generated)
Solubility at low temperature:
In order to evaluate the solubility at a low temperature, after preparing the liquid crystal composition, 0.5 g of the liquid crystal composition was weighed in a 1 mL sample bottle, and the next was “−20 ° C. (−20 ° C.)” in a temperature-controlled test tank. 1 hour hold) → temperature rise (0.2 ° C./min)→0° C. (1 hour hold) → temperature rise (0.2 ° C./min)→20° C. (1 hour hold) → temperature drop (−0. 2 ° C / min) → 0 ° C (hold for 1 hour) → temperature drop (−0.2 ° C / min) → −20 ° C. The following four-level evaluation was performed.
 ◎600時間以上析出物が観察されなかった。 ◎ No precipitate was observed for 600 hours or more.
 ○300時間以上析出物が観察されなかった。 ○ No precipitate was observed for 300 hours or more.
 △150時間以内に析出物が観察された。 △ Precipitates were observed within 150 hours.
 ×75時間以内に析出物が観察された。 X Precipitates were observed within 75 hours.
 実施例において液晶組成物に使用される化合物の記載について以下の略号を用いる。
(側鎖)
 -F    -F   フッ素原子
 F-    -F   フッ素原子
 -n    -C2n+1 炭素原子数nの直鎖状のアルキル基
 n-    C2n+1- 炭素原子数nの直鎖状のアルキル基
 -On   -OC2n+1 炭素原子数nの直鎖状のアルコキシル基
 nO-   C2n+1O- 炭素原子数nの直鎖状のアルコキシル基
 -V   -CH=CH
 V-   CH=CH-
 -V1   -CH=CH-CH
 1V-   CH-CH=CH-
 -2V   -CH-CH-CH=CH
 V2-   CH=CH-CH-CH
 -2V1  -CH-CH-CH=CH-CH
 1V2-  CH-CH=CH-CH-CH
 OCF3  -O-CF
(連結基)
 -CF2O-(または-CFFO-)    -CF-O-
 -OCF2-(または-OCFF-)    -O-CF
 -1O-     -CH-O-
 -O1-     -O-CH
 -COO-    -COO-
(環構造)
 (環構造)
In the examples, the following abbreviations are used for the description of the compounds used in the liquid crystal composition.
(Side chain)
-F -F fluorine atom F- -F fluorine atom -n -C n H 2n + 1 linear alkyl group with n carbon atoms n- C n H 2n + 1 -linear alkyl group with n carbon atoms -On —OC n H 2n + 1 linear alkoxyl group having n carbon atoms nO—C n H 2n + 1 O— linear alkoxyl group having n carbon atoms —V 2 —CH═CH 2
V- CH 2 = CH-
-V1 -CH = CH-CH 3
1V- CH 3 —CH═CH—
-2V -CH 2 -CH 2 -CH = CH 3
V2- CH 3 = CH-CH 2 -CH 2-
-2V1 -CH 2 -CH 2 -CH = CH-CH 3
1V2- CH 3 —CH═CH—CH 2 —CH 2
OCF3 -O-CF 3
(Linking group)
—CF 2 O— (or —CFFO—) —CF 2 —O—
-OCF2- (or -OCFF-) -O-CF 2-
-1O- -CH 2 -O-
-O1- -O-CH 2-
-COO- -COO-
(Ring structure)
(Ring structure)
Figure JPOXMLDOC01-appb-C000176
Figure JPOXMLDOC01-appb-C000176
 (調製例1~16(液晶組成物1~16))
 次に示す組成を有する液晶組成物(調製例1~16)をそれぞれ調製し、その物性値を測定した。この結果を次の表1および表2に示す。
(Preparation Examples 1 to 16 (Liquid Crystal Compositions 1 to 16))
Liquid crystal compositions (Preparation Examples 1 to 16) having the following compositions were prepared, and their physical properties were measured. The results are shown in Tables 1 and 2 below.
Figure JPOXMLDOC01-appb-T000177
Figure JPOXMLDOC01-appb-T000177
Figure JPOXMLDOC01-appb-T000178
Figure JPOXMLDOC01-appb-T000178
Figure JPOXMLDOC01-appb-T000179
Figure JPOXMLDOC01-appb-T000179
 また、調製例1、2、6および13に示すネマチック液晶組成物99.7質量部に対して、式(P.1): Further, with respect to 99.7 parts by mass of the nematic liquid crystal composition shown in Preparation Examples 1, 2, 6, and 13, the formula (P.1):
Figure JPOXMLDOC01-appb-C000180
Figure JPOXMLDOC01-appb-C000180
で表される重合性モノマーをそれぞれ0.3%添加し均一に溶解することにより重合性モノマー含有液晶組成物1、重合性モノマー含有液晶組成物2、重合性モノマー含有液晶組成物6および重合性モノマー含有液晶組成物13を調製した。 The polymerizable monomer-containing liquid crystal composition 1, the polymerizable monomer-containing liquid crystal composition 2, the polymerizable monomer-containing liquid crystal composition 6, and the polymerizable property Monomer-containing liquid crystal composition 13 was prepared.
 当該重合性モノマー含有液晶組成物1、2、6、13の物性は調整例1、2、6、13に示すそれぞれのネマチック液晶組成物の物性とほとんど違いはなかった。 The physical properties of the polymerizable monomer-containing liquid crystal compositions 1, 2, 6, and 13 were almost the same as the physical properties of the respective nematic liquid crystal compositions shown in Preparation Examples 1, 2, 6, and 13.
 また、調製例9、12および16に示すネマチック液晶組成物99.7%に対して、式(P.2): Further, for the nematic liquid crystal composition 99.7% shown in Preparation Examples 9, 12, and 16, the formula (P.2):
Figure JPOXMLDOC01-appb-C000181
Figure JPOXMLDOC01-appb-C000181
で表される重合性モノマーをそれぞれ0.3%添加し均一に溶解することにより重合性モノマー含有液晶組成物9、重合性モノマー含有液晶組成物12、重合性モノマー含有液晶組成物16を調製した。当該重合性モノマー含有液晶組成物9、12、16の物性も調整例9、12、16に示すそれぞれのネマチック液晶組成物の物性とほとんど違いはなかった。 A polymerizable monomer-containing liquid crystal composition 9, a polymerizable monomer-containing liquid crystal composition 12, and a polymerizable monomer-containing liquid crystal composition 16 were prepared by adding 0.3% of each of the polymerizable monomers represented by formula (1) and uniformly dissolving them. . The physical properties of the polymerizable monomer-containing liquid crystal compositions 9, 12, and 16 were almost the same as those of the respective nematic liquid crystal compositions shown in Preparation Examples 9, 12, and 16.
 本発明の液晶組成物および重合性モノマー含有液晶組成物を用いて、TV用として一般的であるセル厚3.0μmのFFSモード・IPSモードの液晶表示素子を作製し、配向膜については、以下のような方法で作製した。 Using the liquid crystal composition of the present invention and the polymerizable monomer-containing liquid crystal composition, an FFS mode / IPS mode liquid crystal display element having a cell thickness of 3.0 μm, which is commonly used for TV, was prepared. It produced by the method like this.
 <光分解型光配向膜>
 「光配向膜1」
 p-フェニレンジアミン1.0モル%を、N-メチル-2-ピロリドン中に溶解させた後、これにシクロブタンテトラカルボン酸二無水物1モル%を加えて20℃で12時間反応させ、標準ポリスチレン換算重量平均分子量が約100,000、重量平均分子量/数平均分子量(Mv/Mn)が約1.6のポリアミック酸ワニスを得た。次に、このポリアミック酸ワニスを6%濃度に希釈してγ-アミノプロピルトリエトキシシランを固形分で0.3重量%添加した後、第1の薄膜積層体上および第2の薄膜積層体の上に印刷し、210℃で30分加熱して光分解型の絶縁膜(ポリイミド膜)を形成した。
<Photolytic photo-alignment film>
"Photo-alignment film 1"
After dissolving 1.0 mol% of p-phenylenediamine in N-methyl-2-pyrrolidone, 1 mol% of cyclobutanetetracarboxylic dianhydride was added thereto and reacted at 20 ° C. for 12 hours to obtain standard polystyrene. A polyamic acid varnish having a converted weight average molecular weight of about 100,000 and a weight average molecular weight / number average molecular weight (Mv / Mn) of about 1.6 was obtained. Next, after diluting the polyamic acid varnish to a concentration of 6% and adding γ-aminopropyltriethoxysilane in a solid content of 0.3% by weight, the first thin film laminate and the second thin film laminate It was printed on and heated at 210 ° C. for 30 minutes to form a photolytic insulating film (polyimide film).
 その後、当該光分解型のポリイミド膜に、たとえば、240nmから400nmの波長域に輝線をもつ偏光UVランプからの光(紫外線)を照射する配向処理を施した。この配向処理は、たとえば、高圧水銀ランプからの紫外線を、石英基板を積層したパイル偏光子を用いて偏光比約20:1の直線偏光とし、約4J/cmの照射エネルギーで照射して行った。 Thereafter, the photodecomposition type polyimide film was subjected to an alignment treatment for irradiating light (ultraviolet rays) from a polarized UV lamp having a bright line in a wavelength range of 240 nm to 400 nm, for example. This alignment treatment is performed, for example, by irradiating ultraviolet light from a high-pressure mercury lamp with linear irradiation with a polarization ratio of about 20: 1 using a pile polarizer laminated with a quartz substrate and with an irradiation energy of about 4 J / cm 2. It was.
 「光配向膜2」
 (ポリアミック酸Aの合成)
 4、4’-ジアミノジフェニルエーテル1.0モル%、N-メチル-2-ピロリドン中に溶解させた後、これにシクロブタンテトラカルボン酸二無水物1モル%を加えて20℃で12時間反応させ、標準ポリスチレン換算重量平均分子量が約50,000、重量平均分子量/数平均分子量(Mv/Mn)が約1.6のポリアミック酸A溶液を得た。
(ポリアミック酸Bの合成)
 4、4’-ジアミノジフェニルアミン1.0モル%、N-メチル-2-ピロリドン中に溶解させた後、これにシクロブタンテトラカルボン酸二無水物1モル%を加えて20℃で6時間反応させ、標準ポリスチレン換算重量平均分子量が約55,000、重量平均分子量/数平均分子量(Mv/Mn)が約1.9のポリアミック酸B溶液を得た。
"Photo-alignment film 2"
(Synthesis of polyamic acid A)
4, 4′-diaminodiphenyl ether 1.0 mol%, dissolved in N-methyl-2-pyrrolidone, 1 mol% of cyclobutanetetracarboxylic dianhydride was added thereto and reacted at 20 ° C. for 12 hours. A polyamic acid A solution having a weight average molecular weight of about 50,000 in terms of standard polystyrene and a weight average molecular weight / number average molecular weight (Mv / Mn) of about 1.6 was obtained.
(Synthesis of polyamic acid B)
4, 4′-diaminodiphenylamine 1.0 mol%, dissolved in N-methyl-2-pyrrolidone, 1 mol% of cyclobutanetetracarboxylic dianhydride was added thereto and reacted at 20 ° C. for 6 hours. A polyamic acid B solution having a standard polystyrene equivalent weight average molecular weight of about 55,000 and a weight average molecular weight / number average molecular weight (Mv / Mn) of about 1.9 was obtained.
 (混合物の調整)
 ポリアミック酸A溶液、ポリアミック酸B溶液を固形分質量比が1:1となるように混合し、更にN-メチル-2-ピロリドンと2-ブトキシエタノールの質量比が1:1の混合溶媒で希釈することによってポリアミック酸溶液を得た。
(Adjusting the mixture)
The polyamic acid A solution and the polyamic acid B solution are mixed so that the mass ratio of the solid content is 1: 1, and further diluted with a mixed solvent having a mass ratio of N-methyl-2-pyrrolidone and 2-butoxyethanol of 1: 1. As a result, a polyamic acid solution was obtained.
 これを第1の薄膜積層体上および第2の薄膜積層体の上に印刷し、230℃で30分加熱して光分解型の絶縁膜(ポリイミド膜)を形成した。その後、当該光分解型のポリイミド膜に、高圧紫外線ランプからの光(紫外線)をワイヤーグリッド偏光子を用いて消光比約100:1の直線偏光とし、0.5J/cmの照射エネルギーで照射して行った。 This was printed on the first thin film laminate and the second thin film laminate, and heated at 230 ° C. for 30 minutes to form a photolytic insulating film (polyimide film). Thereafter, light (ultraviolet rays) from the high-pressure ultraviolet lamp is converted into linearly polarized light having an extinction ratio of about 100: 1 using a wire grid polarizer and irradiated with an irradiation energy of 0.5 J / cm 2 on the photolytic polyimide film. I went there.
 「光配向膜3」
 (光配向膜用溶液の調製)
 1,4-フェニレンジアミン3.24gにN-メチル-2-ピロリドン 32.40g を加え、窒素を送りながら撹拌して溶解させた。このジアミン溶液を撹拌しながら、シクロブタンテトラカルボン酸二無水物7.81gを添加し、さらにN-メチル-2-ピロリドン 78.03g を加え、窒素雰囲気下、30℃で18時間撹拌して反応させた。さらに常温で、N-メチル-2-ピロリドンと2-ブトキシエタノールの質量比が1:1の混合溶媒62.68gを添加して希釈攪拌し、光配向膜用溶液を得た。
"Photo-alignment film 3"
(Preparation of solution for photo-alignment film)
32.40 g of N-methyl-2-pyrrolidone was added to 3.24 g of 1,4-phenylenediamine, and dissolved by stirring while feeding nitrogen. While stirring this diamine solution, 7.81 g of cyclobutanetetracarboxylic dianhydride was added, and 78.03 g of N-methyl-2-pyrrolidone was added, and the mixture was allowed to react by stirring at 30 ° C. for 18 hours in a nitrogen atmosphere. It was. Further, 62.68 g of a mixed solvent having a mass ratio of N-methyl-2-pyrrolidone and 2-butoxyethanol of 1: 1 was added at room temperature, and the mixture was diluted and stirred to obtain a solution for a photoalignment film.
 (液晶配向膜の形成)
 (光分解型樹脂膜の形成)
 第1基板に形成された櫛形透明電極の上に、前記光配向膜溶液をスピンコート法により形成し、乾燥厚さ0.1μmの樹脂膜を形成した。第2基板にも同様にして配向膜を形成した。樹脂膜を形成した基板を、230℃で30分加熱して反応させることにより、光分解型の樹脂膜(ポリイミド膜)を形成した。
(Formation of liquid crystal alignment film)
(Formation of photodegradable resin film)
On the comb-shaped transparent electrode formed on the first substrate, the photo-alignment film solution was formed by spin coating to form a resin film having a dry thickness of 0.1 μm. An alignment film was similarly formed on the second substrate. The substrate on which the resin film was formed was reacted at 230 ° C. for 30 minutes to form a photolytic resin film (polyimide film).
 (配向処理)
 高圧水銀ランプからバンドパスフィルターを用いて256nmの紫外線を取り出し、ワイヤーグリッド偏光子を用いて消光比約100:1の直線偏光とし、当該光分解型の樹脂膜に、1.0J/cmの照射エネルギーで照射して光配向処理を行った。その後、分解生成した不純物を除去するため、230℃で30分焼成した後、ポリイミド膜を純水で洗浄して乾燥させることにより、光分解型の配向膜が形成されたガラス基板を得た。
(Orientation treatment)
A 256 nm ultraviolet ray is extracted from the high-pressure mercury lamp using a bandpass filter, and is converted into linearly polarized light having an extinction ratio of about 100: 1 using a wire grid polarizer, and 1.0 J / cm 2 is applied to the photodecomposable resin film. Photo-alignment treatment was performed by irradiation with irradiation energy. Thereafter, in order to remove the impurities generated by decomposition, after baking at 230 ° C. for 30 minutes, the polyimide film was washed with pure water and dried to obtain a glass substrate on which a photolytic alignment film was formed.
 <光二量化型光配向膜>
 「光配向膜4」
 (合成例1)
 (ポリマー(PA-1)の合成)
 以下の反応経路において化合物1~6の中間体を経て合成したモノマー(I-1-1)10部をテトラヒドロフラン(THF)45部に溶解し、アゾビスイソブチロニトリル(AIBN)0.03部を加えた溶液を、窒素雰囲気下8時間加熱還流して反応させた。
<Photodimerization type photo-alignment film>
"Photo-alignment film 4"
(Synthesis Example 1)
(Synthesis of polymer (PA-1))
In the following reaction route, 10 parts of monomer (I-1-1) synthesized via an intermediate of compounds 1 to 6 is dissolved in 45 parts of tetrahydrofuran (THF), and 0.03 part of azobisisobutyronitrile (AIBN) is dissolved. The solution to which was added was heated to reflux for 8 hours under a nitrogen atmosphere.
Figure JPOXMLDOC01-appb-C000182
Figure JPOXMLDOC01-appb-C000182
 次に、反応後の溶液をメタノール600部に滴下攪拌し、析出物を回収してTHF50部に溶解した後、氷冷したヘキサン1200部に滴下攪拌し、析出した固体を回収した。得られた固体をTHF50部に溶解させ、氷冷したメタノール1200部に滴下攪拌し、析出した固体を回収し、THFに溶解させた後、真空乾燥することで、ポリマー(PA-1)を得た。得られたポリマー(PA-1)の重量平均分子量(Mw)は383,000、分子量分布(Mw/Mn)は2.75であった。 Next, the solution after the reaction was dropped and stirred in 600 parts of methanol, and the precipitate was collected and dissolved in 50 parts of THF, and then dropped and stirred in 1200 parts of ice-cooled hexane, and the precipitated solid was collected. The obtained solid was dissolved in 50 parts of THF and stirred dropwise into 1200 parts of ice-cooled methanol. The precipitated solid was collected, dissolved in THF, and then vacuum dried to obtain polymer (PA-1). It was. The obtained polymer (PA-1) had a weight average molecular weight (Mw) of 383,000 and a molecular weight distribution (Mw / Mn) of 2.75.
Figure JPOXMLDOC01-appb-C000183
Figure JPOXMLDOC01-appb-C000183
 なお、ポリマーの分子量の調整は、上記窒素雰囲気下の加熱還流時間を調節し、重量平均分子量(Mw)を測定することにより行った。 The molecular weight of the polymer was adjusted by adjusting the heating and reflux time in the nitrogen atmosphere and measuring the weight average molecular weight (Mw).
 (分子量の測定)
 Mw及びMnは以下測定条件のもと、GPC(ゲル浸透クロマトグラフィー、Gel Permeation Chromatography)により測定した。
(Measurement of molecular weight)
Mw and Mn were measured by GPC (gel permeation chromatography) under the following measurement conditions.
 測定装置には、東ソー社製GPC装置HLC-8220GPCを用い、分析カラムにはTSKgel GMHXL×2本、TSKgel G2000XL×1本、TSKgel G1000XL×1本の計4本直列、検出器には示差屈折率(RI)検出器、較正曲線作成のための標準試料には、昭和電工製ポリスチレン標準試料STANDARD SM-105(分子量範囲1,300~3,800,000)を用いた。得られたポリマーをTHFに1μg/mLの濃度となるよう溶解し、移動相をTHF、送液速度を1mL/分、カラム温度を40℃、試料注入量を300μLとして測定した。 Tosoh GPC equipment HLC-8220GPC is used as the measuring device, TSKgel に は GMHXL × 2, TSKgel G2000XL × 1 and TSKgel G1000XL × 1 in series for the analytical column, and differential refractive index for the detector. As a standard sample for preparing (RI) detector and calibration curve, polystyrene standard sample STANDARDARSM-105 (molecular weight range 1,300 to 3,800,000) manufactured by Showa Denko was used. The obtained polymer was dissolved in THF so as to have a concentration of 1 μg / mL, and the mobile phase was measured with THF, the liquid feed rate was 1 mL / min, the column temperature was 40 ° C., and the sample injection amount was 300 μL.
 (ガラス転移温度の測定)
 ガラス転移温度は、示差走査熱量計(DSC)により測定した。測定装置は、セイコーインスツル社製のDSC装置DSC6220を用いた。ポリマー試料約4mgをアルミニウム製パンに封入し、-20℃から180℃まで、10℃/分の割合で昇温したとき、ガラス転移に伴うベースラインシフトが観測された。転移開始点を接線の交点から読み取り、ガラス転移温度(Tg)とした。
(Measurement of glass transition temperature)
The glass transition temperature was measured with a differential scanning calorimeter (DSC). As a measuring apparatus, a DSC apparatus DSC6220 manufactured by Seiko Instruments Inc. was used. When a polymer sample of about 4 mg was sealed in an aluminum pan and heated from −20 ° C. to 180 ° C. at a rate of 10 ° C./min, a baseline shift accompanying a glass transition was observed. The transition start point was read from the intersection of the tangent lines, and used as the glass transition temperature (Tg).
 (液晶配向膜の形成)
 (光二量化型樹脂膜の作製)
 ポリマー(PA-1)5部と、N-メチルピロリドン47.5部と、2-ブトキシエタノール47.5部との混合物を室温で10分間攪拌して、均一に溶解させた。次に、該溶液を、スピンコーターを用いてガラス基板上に塗布し、100℃で3分間乾燥することで、上記ガラス基板上に膜を形成した。形成された膜を目視で観察したところ、平滑な膜が形成されていることが確認された。
(Formation of liquid crystal alignment film)
(Preparation of photo-dimerization type resin film)
A mixture of 5 parts of the polymer (PA-1), 47.5 parts of N-methylpyrrolidone, and 47.5 parts of 2-butoxyethanol was stirred at room temperature for 10 minutes to be uniformly dissolved. Next, the solution was applied onto a glass substrate using a spin coater, and dried at 100 ° C. for 3 minutes to form a film on the glass substrate. When the formed film was visually observed, it was confirmed that a smooth film was formed.
 (光配向処理)
 次に、超高圧水銀ランプ、波長カットフィルター、バンドパスフィルター及び偏光フィルターを備えた偏光照射装置を用いて、紫外光(波長313nm)の直線偏光(照度:10mW/cm2)を、形成された膜に対して、鉛直方向から10秒照射(照射光量100mJ/cm2)することにより、光配向膜を得た。焼成処理および洗浄処理は不要であった。樹脂膜の乾燥厚さは、0.1μmであった。
(Photo-alignment treatment)
Next, a film in which linearly polarized light (illuminance: 10 mW / cm 2) of ultraviolet light (wavelength: 313 nm) is formed using a polarized light irradiation device including an ultra-high pressure mercury lamp, a wavelength cut filter, a band pass filter, and a polarizing filter On the other hand, the photo-alignment film was obtained by performing irradiation for 10 seconds from the vertical direction (irradiation light quantity: 100 mJ / cm 2). A baking process and a washing process were unnecessary. The dry thickness of the resin film was 0.1 μm.
 <光異性化型光配向膜>
 「光配向膜5」
 (合成例1)二色性化合物(a)の合成
 2,2’-ベンジジンジスルホン酸8.6g(25mmol)に2%塩酸230mlを加え、0~5℃に保ちながら亜硝酸ナトリウム3.5g(51mmol)の水溶液を少しずつ滴下し、2時間反応させてジアゾニウム塩を調製した。次にサリチル酸6.9g(50mmol)を300mlの5%炭酸ナトリウム水溶液に溶かし、これに前記ジアゾニウム塩混合物を徐々に滴下した。1時間反応後、20%食塩水を加えて沈殿物を得た。この沈殿物を、エタノールと水の混合溶媒で再結晶させて、4.8gの式(a)で表されるアゾ化合物を得た。
<Photoisomerization type photo-alignment film>
"Photo-alignment film 5"
(Synthesis Example 1) Synthesis of Dichroic Compound (a) To 8.6 g (25 mmol) of 2,2′-benzidine disulfonic acid was added 230 ml of 2% hydrochloric acid, and while maintaining the temperature at 0 to 5 ° C., 3.5 g of sodium nitrite ( 51 mmol) was added dropwise little by little and reacted for 2 hours to prepare a diazonium salt. Next, 6.9 g (50 mmol) of salicylic acid was dissolved in 300 ml of 5% aqueous sodium carbonate solution, and the diazonium salt mixture was gradually added dropwise thereto. After reacting for 1 hour, 20% saline was added to obtain a precipitate. This precipitate was recrystallized with a mixed solvent of ethanol and water to obtain 4.8 g of an azo compound represented by the formula (a).
Figure JPOXMLDOC01-appb-C000184
Figure JPOXMLDOC01-appb-C000184
 (実施例用組成物 光配向膜用組成物(1)の調製)
 式(a)で示される化合物2部をN-メチル-2-ピロリドン(NMP)98部に溶解させた(溶液A)。メチル化メラミン スミマールM-100C(以下M-100C)(長春人造樹脂製。ヘキサメトキシメチル化メラミン単量体として、分子量=390。平均重合度は1.3~1.7である。)2部に2-ブトキシエタノール(BC)98部を加えて均一溶液とした(溶液B)。溶液A100部、溶液B23部及びBC77部を混合し、固形分比1.0%の溶液を調製した。得られた溶液を0.45μmのメンブランフィルターでろ過し、光配向膜用組成物(1)を得た。
(Preparation of composition for photo-alignment film (1) for example)
2 parts of the compound represented by the formula (a) were dissolved in 98 parts of N-methyl-2-pyrrolidone (NMP) (solution A). Methylated melamine Sumimar M-100C (hereinafter referred to as M-100C) (manufactured by Changchun Artificial Resin. Hexamethoxymethylated melamine monomer, molecular weight = 390, average polymerization degree is 1.3 to 1.7) 2 parts 98 parts of 2-butoxyethanol (BC) was added to obtain a homogeneous solution (Solution B). 100 parts of solution A, 23 parts of solution B and 77 parts of BC were mixed to prepare a solution having a solid content ratio of 1.0%. The obtained solution was filtered with a 0.45 μm membrane filter to obtain a composition (1) for a photo-alignment film.
 (液晶配向膜の形成)
 (光異性化型樹脂膜の作製)
 光配向膜用組成物(1)をスピンコーターでガラス基板上に塗布し、100℃で1分間乾燥した。
(Formation of liquid crystal alignment film)
(Preparation of photoisomerization type resin film)
The composition for photo-alignment film (1) was applied onto a glass substrate with a spin coater and dried at 100 ° C. for 1 minute.
 (光配向処理)
 得られた塗膜表面に、超高圧水銀ランプに波長カットフィルター、及び、偏光フィルターを介して、波長365nm付近の紫外光(照射強度:10mW/cm)の直線偏光でかつ平行光を、ガラス基板に対して垂直方向から照射エネルギー100mJ/cmで光照射を行い、光配向膜を得た。焼成処理および洗浄処理は不要であった。樹脂膜の乾燥厚さは、0.1μmであった。
(Photo-alignment treatment)
On the surface of the obtained coating film, ultraviolet light having a wavelength of around 365 nm (irradiation intensity: 10 mW / cm 2 ) and parallel light are converted into glass through an ultrahigh pressure mercury lamp through a wavelength cut filter and a polarizing filter. Light irradiation was performed at an irradiation energy of 100 mJ / cm 2 from the direction perpendicular to the substrate to obtain a photoalignment film. A baking process and a washing process were unnecessary. The dry thickness of the resin film was 0.1 μm.
 <ラビング型配向膜>
 (ラビング型配向膜)
 (ラビング型ポリイミド液晶配向膜の形成)
 (配向膜溶液の調製)
 4,4’-ジアミノジフェニルアミン5.98gに N-メチル-2-ピロリドン 59.72gを加え、窒素を送りながら撹拌して溶解させた。このジアミン溶液を撹拌しながら、ピロメリット酸二無水物 6.54g添加し、さらに N-メチル-2-ピロリドン 65.30g を加え、窒素雰囲気下、30℃で18時間撹拌して反応させた。さらに常温で、N-メチル-2-ピロリドンと2-ブトキシエタノールの質量比が1:1の混合溶媒71.06gを添加して希釈攪拌し、ポリアミック酸溶液を得た。
<Rubbing type alignment film>
(Rubbing type alignment film)
(Formation of rubbing type polyimide liquid crystal alignment film)
(Preparation of alignment film solution)
59.72 g of N-methyl-2-pyrrolidone was added to 5.98 g of 4,4′-diaminodiphenylamine, and dissolved by stirring while feeding nitrogen. While stirring this diamine solution, 6.54 g of pyromellitic dianhydride was added, and 65.30 g of N-methyl-2-pyrrolidone was further added, and the mixture was stirred and reacted at 30 ° C. for 18 hours in a nitrogen atmosphere. Further, 71.06 g of a mixed solvent having a mass ratio of N-methyl-2-pyrrolidone and 2-butoxyethanol of 1: 1 was added at room temperature, and the mixture was diluted and stirred to obtain a polyamic acid solution.
 (液晶配向膜の形成)
 (樹脂膜の作製)
 配向膜溶液をスピンコーターで第1の基板および第2の基板の上に塗布し、230℃で30分加熱して反応させポリイミドの絶縁膜を形成した。
(Formation of liquid crystal alignment film)
(Production of resin film)
The alignment film solution was applied onto the first substrate and the second substrate with a spin coater and reacted by heating at 230 ° C. for 30 minutes to form a polyimide insulating film.
 (配向処理)
 バフ布を巻いたローラーを基板搬送方向とは反対方向に回転させ、基板上に形成された配向膜表面を一方向に擦ることにより、配向処理を行った。ローラーの回転数は600rpm,基板の搬送速度は5mm/秒,バフ布の基板表面に対する押し込み深さは0.3mmであった。その後、ラビングで削れた配向膜の屑やバフ布の繊維片を除去するためポリイミド膜を純水で洗浄して乾燥させた。
(Orientation treatment)
An alignment treatment was performed by rotating a roller wrapped with a buff cloth in a direction opposite to the substrate transport direction and rubbing the surface of the alignment film formed on the substrate in one direction. The number of rotations of the roller was 600 rpm, the conveyance speed of the substrate was 5 mm / second, and the indentation depth of the buff cloth with respect to the substrate surface was 0.3 mm. Thereafter, the polyimide film was washed with pure water and dried in order to remove the alignment film debris scraped by rubbing and the fiber pieces of the buff cloth.
 (表示品位の評価)
 配向膜を光配向膜にすることにより、ラビングムラによる液晶分子に対する配向性の低下を軽減でき、かつ優れた透過率特性のFFS方式の液晶表示素子を提供することができる。各種の光配向膜による液晶配向性の評価を行ったので、その評価方法を以下に説明する。
(Evaluation of display quality)
By using the alignment film as a photo-alignment film, it is possible to provide an FFS liquid crystal display element having excellent transmittance characteristics and capable of reducing a decrease in alignment with liquid crystal molecules due to rubbing unevenness. Since the liquid crystal alignment was evaluated by various photo-alignment films, the evaluation method will be described below.
 第1の基板上には薄膜トランジスタと透明電極層が形成され、その上に配向膜が形成される。接触方式であるラビング法を用いて配向処理を行うと、ラビングによって配向膜表面にランダムな擦り傷が形成される。特に薄膜トランジスタや透明電極層パターンが形成された第1基板においては、薄膜トランジスタや透明電極層パターンによる段差と、ラビングローラーのバフ布の繊維の直径(数十μm)とに起因した、より深い擦り傷が、段差に沿って形成されやすい。この擦り傷が形成された箇所には、電界オフ時に液晶分子が一定方向に並ぶことができないために、黒表示時に液晶パネルに光ヌケが生じる。その結果、一定の値以上のコントラストが得られ難くなる。 A thin film transistor and a transparent electrode layer are formed on the first substrate, and an alignment film is formed thereon. When an alignment treatment is performed using a rubbing method which is a contact method, random scratches are formed on the alignment film surface by rubbing. In particular, in the first substrate on which the thin film transistor and the transparent electrode layer pattern are formed, deeper scratches due to the steps due to the thin film transistor and the transparent electrode layer pattern and the diameter (tens of μm) of the fiber of the buffing cloth of the rubbing roller , Easy to be formed along the step. Since the liquid crystal molecules cannot be aligned in a certain direction when the electric field is turned off at the portion where the scratch is formed, light leakage occurs in the liquid crystal panel during black display. As a result, it becomes difficult to obtain a contrast of a certain value or more.
 さらに、近年実用化された4Kと呼ばれる解像度モードでは、40インチパネルにおける計算例で、1ピクセル寸法が 0.23mmとなる。また、追って実用化される8Kと呼ばれる解像度モードでは、40インチパネルにおける計算例で、1ピクセル寸法が 0.11mmにも微細になる。すなわち、1ピクセル寸法が、ラビングローラーのバフ布の繊維の直径に近づくことから、ラビング法によって配向処理された時に形成される擦り傷により、ピクセル単位、または断続的なピクセル列単位で、電界オフ時に液晶分子が一定方向に並ぶことができない箇所が発生し、黒表示時の多量の光ヌケによる大幅なコントラストの低下や、多数の表示欠損を引き起こすおそれがある。 Furthermore, in a resolution mode called 4K, which has been put into practical use in recent years, a one-pixel size is 0.23 mm in a calculation example in a 40-inch panel. In a resolution mode called 8K, which will be put to practical use later, in a calculation example in a 40-inch panel, the size of one pixel becomes as fine as 0.11 mm. That is, since the size of one pixel approaches the diameter of the buff cloth fiber of the rubbing roller, when the electric field is turned off in units of pixels or in units of intermittent pixel rows due to scratches formed when the alignment treatment is performed by the rubbing method. There are places where the liquid crystal molecules cannot be aligned in a certain direction, which may cause a significant decrease in contrast and a large number of display defects due to a large amount of light leakage during black display.
 そこで光配向法によって非接触で配向処理を行うことにより、配向膜表面に擦り傷が発生しないことから、光ヌケのない、高いコントラストと、くっきりとした黒表示を実現することができる。 Therefore, by performing non-contact alignment processing by the photo-alignment method, scratches are not generated on the surface of the alignment film, so that high contrast and clear black display without light leakage can be realized.
 第1基板に形成された櫛形透明電極の上に、配向膜溶液をスピンコート法により形成し、乾燥厚さ0.1μmの配向膜を形成した。第2基板にも同様にして配向膜を形成した。 An alignment film solution was formed on the comb-shaped transparent electrode formed on the first substrate by a spin coating method to form an alignment film having a dry thickness of 0.1 μm. An alignment film was similarly formed on the second substrate.
 (液晶セルの作製)
 上記液晶配向膜を備えたガラス基板を用いて、液晶セルを作製した。より具体的には、配向膜がそれぞれ形成された第1基板と第2基板を、それぞれの液晶配向膜が対向し、かつ直線偏光を照射した、またはラビングした方向がアンチパラレル方向(180°)となるように配置し、2枚の基板間に一定の間隙(4μm)を保った状態で、周辺部をシール剤により張り合わせた。次に、液晶配向膜表面及びシール剤により区画されたセルギャップ内に、上記表の液晶組成物(調製例1~12)および重合性モノマー含有液晶組成物1、2、6、9および12を、滴下法により、透明点をちょうど超える温度で充填し、その後、室温まで冷却することでそれぞれ液晶セルを作製した。
(Production of liquid crystal cell)
A liquid crystal cell was produced using the glass substrate provided with the liquid crystal alignment film. More specifically, the first substrate and the second substrate on which the alignment films are respectively formed, the liquid crystal alignment films face each other, and the direction in which the linearly polarized light is irradiated or rubbed is the antiparallel direction (180 °). The peripheral part was pasted with a sealing agent in a state where a constant gap (4 μm) was maintained between the two substrates. Next, the liquid crystal composition (Preparation Examples 1 to 12) and the polymerizable monomer-containing liquid crystal compositions 1, 2, 6, 9 and 12 in the above table are placed in the cell gap defined by the surface of the liquid crystal alignment film and the sealant. Each liquid crystal cell was produced by filling at a temperature just above the clearing point by a dropping method and then cooling to room temperature.
 重合性モノマー含有液晶組成物1、2、6、9および12の場合は、上記と同様に液晶セルを作製した後、この液晶セルのプレチルト角(クリスタルローテーション法)を測定した後、周波数1kHzで1.8Vの矩形波を印加しながら、320nm以下の紫外線をカットするフィルターを介して、高圧水銀灯(東芝ライテック社製FL15UV34A(NP805))により液晶セルに紫外線を照射した。セル表面の照射強度が10mW/cmとなるように調整して700秒間照射して、重合性モノマー含有液晶組成物中の重合性モノマーを重合させた水平配向性液晶表示素子を得た。 In the case of polymerizable monomer-containing liquid crystal compositions 1, 2, 6, 9 and 12, after preparing a liquid crystal cell in the same manner as described above, after measuring the pretilt angle (crystal rotation method) of this liquid crystal cell, the frequency was 1 kHz. While applying a 1.8 V rectangular wave, the liquid crystal cell was irradiated with ultraviolet rays by a high pressure mercury lamp (FL15UV34A (NP805) manufactured by Toshiba Lighting & Technology Corp.) through a filter that cuts ultraviolet rays of 320 nm or less. The cell surface was adjusted to have an irradiation intensity of 10 mW / cm 2 and irradiated for 700 seconds to obtain a horizontal alignment liquid crystal display element in which the polymerizable monomer in the polymerizable monomer-containing liquid crystal composition was polymerized.
 以下の表3~8に、作製した液晶セル(液晶表示素子)で用いた配向膜と、用いた液晶組成物または重合性モノマー含有液晶組成物との組み合わせ例(実施例1~24および比較例1~2)と、作成した液晶セルの静的コントラスト(CRS)評価結果およびVHR測定の結果を以下の表3~8に記載する。 Tables 3 to 8 below show examples of combinations of the alignment films used in the produced liquid crystal cells (liquid crystal display elements) and the liquid crystal compositions or polymerizable monomer-containing liquid crystal compositions used (Examples 1 to 24 and Comparative Examples). 1-2), the static contrast (CRS) evaluation results of the prepared liquid crystal cell, and the results of VHR measurement are shown in Tables 3 to 8 below.
Figure JPOXMLDOC01-appb-T000185
Figure JPOXMLDOC01-appb-T000185
Figure JPOXMLDOC01-appb-T000186
Figure JPOXMLDOC01-appb-T000186
Figure JPOXMLDOC01-appb-T000187
Figure JPOXMLDOC01-appb-T000187
Figure JPOXMLDOC01-appb-T000188
Figure JPOXMLDOC01-appb-T000188
Figure JPOXMLDOC01-appb-T000189
Figure JPOXMLDOC01-appb-T000189
Figure JPOXMLDOC01-appb-T000190
Figure JPOXMLDOC01-appb-T000190
Figure JPOXMLDOC01-appb-T000191
Figure JPOXMLDOC01-appb-T000191
 静的コントラスト(CRS)の測定方法を以下に示す。 The measurement method of static contrast (CRS) is shown below.
 白色光源、分光器、偏光子(入射側偏光板)、検光子(出射側偏光板)、検出器を備えた光学測定装置(RETS-100、大塚電子株式会社製)の、偏光子-検光子間に、測定対象である前記光学フィルムを配置した。ここで、偏光子と検光子との回転角が0度(偏光子と検光子の偏光方向が平行位置[パラレルニコル])である状態において、光学フィルムを回転させながら、検出器にて透過光の光量を検出し、検出した光量が最も大きくなる、光学フィルムの回転位置(偏光子の偏光方向と重合性液晶の分子長軸方向が平行)における、透過光の光量(オン時光量)をYonとした。また、偏光子と光学フィルムの位置を固定したまま、偏光子に対する検光子の回転角を90度(偏光子と検光子の偏光方向が直交位置[クロスニコル])としたときにおける、透過光の光量(オフ時光量)をYoffとした。コントラストCRSは、次式(式1)により求めた。 Polarizer-analyzer of optical measuring device (RETS-100, manufactured by Otsuka Electronics Co., Ltd.) equipped with white light source, spectroscope, polarizer (incident side polarizing plate), analyzer (exit side polarizing plate), detector In the meantime, the optical film to be measured was placed. Here, in a state where the rotation angle between the polarizer and the analyzer is 0 degree (the polarization direction of the polarizer and the analyzer is the parallel position [parallel Nicol]), the transmitted light is transmitted by the detector while rotating the optical film. The amount of transmitted light (on-time light amount) at the rotational position of the optical film (the polarization direction of the polarizer and the molecular long axis direction of the polymerizable liquid crystal are parallel) where the detected light amount becomes the largest is Yon. It was. In addition, with the position of the polarizer and the optical film fixed, the rotation angle of the analyzer with respect to the polarizer is 90 degrees (the polarization direction of the polarizer and the analyzer is the orthogonal position [cross Nicol]). The amount of light (light amount when off) was set to Yoff. Contrast CRS was calculated | required by following Formula (Formula 1).
   CRS =Yon/Yoff ・・・・・・・・・ (式1)
(式1)の静的コントラストCRSの数値が大きいほど、オフ時光量Yoffが小さいこと、すなわち、光ヌケが少ないため、優れた黒表示であることを示す。
CRS = Yon / Yoff ... (Formula 1)
The larger the numerical value of the static contrast CRS in (Expression 1), the smaller the off-time light amount Yoff, that is, the smaller the amount of light leakage, and the better the black display.
 その結果、光配向膜を形成して作製されたFFSI・IPSモードの表示素子(実施例1~24)は、ラビング配向膜を形成して作製されたFFSモードの表示素子(比較例1、2)と比べて、コントラストにおいて優れた特性を示した。より詳細には、実施例1~24と比較例1、2と比較すると、光配向膜を使用するとコントラスト比およびVHRが向上することが確認される。また、モノマーを液晶組成物に添加すると、VHRが低下しにくいことから、前記モノマーが重合したポリマーが液晶組成物中のイオンをトラップしていると考えられる。特に、ラビング配向膜では、ラビング工程由来のイオン成分や不純物などが光配向膜より多いと考えられるため、比較例2のVHRが上昇していると推測される。 As a result, the FFSI / IPS mode display elements (Examples 1 to 24) manufactured by forming the photo-alignment film are the FFS mode display elements (Comparative Examples 1 and 2) manufactured by forming the rubbing alignment film. ), The contrast was excellent. More specifically, when Examples 1 to 24 are compared with Comparative Examples 1 and 2, it is confirmed that the contrast ratio and VHR are improved when the photo-alignment film is used. In addition, when a monomer is added to the liquid crystal composition, VHR is unlikely to decrease, so it is considered that the polymer obtained by polymerizing the monomer traps ions in the liquid crystal composition. In particular, in the rubbing alignment film, it is considered that there are more ionic components, impurities, and the like derived from the rubbing process than in the photo-alignment film.
 また、実施例1~24の液晶表示素子は、以下の配向規制力(アンカリング)測定をおこなった。 Further, the liquid crystal display elements of Examples 1 to 24 were subjected to the following alignment regulating force (anchoring) measurement.
 上記液晶表示素子を用いて、液晶配向膜表面と液晶層との間の界面における方位角アンカリングエネルギーを、以下のトルクバランス法と呼ばれる方法(日本液晶学会討論会講演予稿集(2001年)の251~252頁に報告された方法)により測定した。 Using the above-mentioned liquid crystal display element, the azimuth anchoring energy at the interface between the liquid crystal alignment film surface and the liquid crystal layer is expressed by the following method called the torque balance method (Proc. The method reported on pages 251 to 252).
 その結果、実施例1~24の液晶表示素子は、液晶化合物を配向させるのに必要な配向規制力が生じていることが確認され、なかでも、実施例17~実施例24の液晶表示素子は、重合性モノマーが重合することにより、光配向膜の液晶化合物に対する配向規制力が非常に良好であることが確認できた。水平配向性液晶表示素子は優れた光学特性及び高速応答性を有していることを確認した。 As a result, it was confirmed that the liquid crystal display elements of Examples 1 to 24 had an alignment regulating force necessary for aligning the liquid crystal compounds. In particular, the liquid crystal display elements of Examples 17 to 24 were As a result of polymerization of the polymerizable monomer, it was confirmed that the alignment regulating power of the photo-alignment film with respect to the liquid crystal compound was very good. It was confirmed that the horizontal alignment liquid crystal display device has excellent optical characteristics and high-speed response.
 1a   液晶分子
 1b   重合性モノマー
 1c   重合性モノマーが重合したポリマー
 100  第1基板
 102  TFT層
 103  画素電極
 104  パッシベーション膜
 105  第1配向膜
 200  第2基板
 201  平坦化膜(オーバーコート層)
 202  ブラックマトリックス
 203  カラーフィルタ
 204  透明電極
 205  第2配向膜
 301  シール材
 302  突起(柱状スペーサー)
 303  液晶層
 304  突起(柱状スペーサー)
 401  マスクパターン
 402  レジン層
 L   光
 1,8  偏光板
 2  第一の基板
 3  電極層
 4  配向膜
 5  液晶層
 6  カラーフィルタ
 6G  カラーフィルタ緑
 6R  カラーフィルタ赤
 6B  カラーフィルタ青
 7  第二の基板
 11  ゲート電極
 12  ゲート絶縁膜
 13  半導体層
 14  絶縁層
 15  オーミック接触層
 16  ドレイン電極
 17  ソース電極
 18  絶縁保護層
 21  画素電極
 22  共通電極
 23  ストレイジキャパシタ
 24  ドレイン電極
 25  データ配線
 27  ソース配線
 29  共通ライン
 30  バッファー層
DESCRIPTION OF SYMBOLS 1a Liquid crystal molecule 1b Polymerizable monomer 1c Polymer which polymerized polymerizable monomer 100 1st board | substrate 102 TFT layer 103 Pixel electrode 104 Passivation film 105 1st alignment film 200 2nd board | substrate 201 Planarization film (overcoat layer)
202 Black matrix 203 Color filter 204 Transparent electrode 205 Second alignment film 301 Seal material 302 Projection (columnar spacer)
303 Liquid crystal layer 304 Protrusion (columnar spacer)
401 mask pattern 402 resin layer L light 1,8 polarizing plate 2 first substrate 3 electrode layer 4 alignment film 5 liquid crystal layer 6 color filter 6G color filter green 6R color filter red 6B color filter blue 7 second substrate 11 gate electrode DESCRIPTION OF SYMBOLS 12 Gate insulating film 13 Semiconductor layer 14 Insulating layer 15 Ohmic contact layer 16 Drain electrode 17 Source electrode 18 Insulating protective layer 21 Pixel electrode 22 Common electrode 23 Storage capacitor 24 Drain electrode 25 Data wiring 27 Source wiring 29 Common line 30 Buffer layer

Claims (7)

  1.  対向に配置された第一の基板および第二の基板と、
     前記第一の基板と前記第二の基板との間に充填された液晶組成物を含有する液晶層と、
     前記第一の基板上に、共通電極、マトリクス状に配置される複数個のゲートバスライン及びデータバスライン、前記ゲートバスラインとデータバスラインとの交差部に設けられる薄膜トランジスタならびに前記薄膜トランジスタにより駆動され前記共通電極との間で基板に対して略平行な電界を形成する画素電極を画素毎に有する電極層と、
     前記液晶層と前記第一の基板および前記液晶層と前記第二の基板との間に、少なくとも一方の基板に形成された光配向層と、を有し、
     前記液晶組成物が、正の誘電率異方性を有し、ネマチック相-等方性液体の転移温度が60℃以上であり、一般式(i)
    Figure JPOXMLDOC01-appb-C000001
    (上記一般式(i)中、Ri1及びRi2はそれぞれ独立して、炭素原子数1~8のアルキル基、炭素原子数2~8のアルケニル基、炭素原子数1~8のアルコキシ基または炭素原子数2~8のアルケニルオキシ基を表し、該アルキル基、アルケニル基、アルコキシ基またはアルケニルオキシ基中の1つ以上の水素原子はフッ素原子で置換されていてもよく、該アルキル基、アルケニル基、アルコキシ基またはアルケニルオキシ基中のメチレン基は酸素原子が連続して結合しない限り酸素原子で置換されていてもよく、カルボニル基が連続して結合しない限りカルボニル基で置換されていてもよく、
    i1は、(a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)
    (b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)及び
    (c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
    からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又はトリフルオロメトキシ基で置換されていても良く、
    i1は、1、2、3または4を表し、ni1が2、3または4であってAi1が複数存在する場合は、それらは同一であっても異なっていても良く、ni1が2、3または4であってZi1が複数存在する場合は、それらは同一であっても異なっていても良い。)で表される化合物から選ばれる1種または2種以上の化合物、及び、下記の一般式(J)
    Figure JPOXMLDOC01-appb-C000002
    (式中、RJ1は炭素原子数1~8のアルキル基を表し、該アルキル基中の1個又は非隣接の2個以上の-CH-はそれぞれ独立して-CH=CH-、-C≡C-、-O-、-CO-、-COO-又は-OCO-によって置換されていてもよく、
     nJ1は、0、1、2、3又は4を表し、
     AJ1、AJ2及びAJ3はそれぞれ独立して、
    (a) 1,4-シクロヘキシレン基(この基中に存在する1個の-CH-又は隣接していない2個以上の-CH-は-O-に置き換えられてもよい。)
    (b) 1,4-フェニレン基(この基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられてもよい。)及び
    (c) (c)ナフタレン-2,6-ジイル基、1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基又はデカヒドロナフタレン-2,6-ジイル基(ナフタレン-2,6-ジイル基又は1,2,3,4-テトラヒドロナフタレン-2,6-ジイル基中に存在する1個の-CH=又は隣接していない2個以上の-CH=は-N=に置き換えられても良い。)
    からなる群より選ばれる基を表し、上記の基(a)、基(b)及び基(c)はそれぞれ独立してシアノ基、フッ素原子、塩素原子、メチル基、トリフルオロメチル基又はトリフルオロメトキシ基で置換されていても良く、
     ZJ1及びZJ2はそれぞれ独立して単結合、-CHCH-、-(CH-、-OCH-、-CHO-、-OCF-、-CFO-、-COO-、-OCO-又は-C≡C-を表し、
     nJ1が2、3又は4であってAJ2が複数存在する場合は、それらは同一であっても異なっていても良く、nJ1が2、3又は4であってZJ1が複数存在する場合は、それらは同一であっても異なっていても良く、
     XJ1は、水素原子、フッ素原子、塩素原子、シアノ基、トリフルオロメチル基、フルオロメトキシ基、ジフルオロメトキシ基、トリフルオロメトキシ基又は2,2,2-トリフルオロエチル基を表す。)で表される化合物から選ばれる1種または2種以上含有することを特徴とする水平配向型の液晶表示素子。
    A first substrate and a second substrate disposed opposite to each other;
    A liquid crystal layer containing a liquid crystal composition filled between the first substrate and the second substrate;
    Driven by the common electrode, a plurality of gate bus lines and data bus lines arranged in a matrix, a thin film transistor provided at an intersection of the gate bus line and the data bus line, and the thin film transistor on the first substrate. An electrode layer having a pixel electrode for each pixel that forms an electric field substantially parallel to the substrate with the common electrode;
    A photo-alignment layer formed on at least one substrate between the liquid crystal layer and the first substrate and the liquid crystal layer and the second substrate;
    The liquid crystal composition has a positive dielectric anisotropy, a nematic phase-isotropic liquid transition temperature of 60 ° C. or higher, and represented by the general formula (i):
    Figure JPOXMLDOC01-appb-C000001
    (In the general formula (i), R i1 and R i2 are each independently an alkyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, an alkoxy group having 1 to 8 carbon atoms, or Represents an alkenyloxy group having 2 to 8 carbon atoms, and one or more hydrogen atoms in the alkyl group, alkenyl group, alkoxy group or alkenyloxy group may be substituted with a fluorine atom. The methylene group in the group, alkoxy group or alkenyloxy group may be substituted with an oxygen atom unless the oxygen atom is continuously bonded, and may be substituted with a carbonyl group unless the carbonyl group is continuously bonded. ,
    A i1 is, (a) 1,4-cyclohexylene group (the one present in the group -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O- Good.)
    (B) a 1,4-phenylene group (one —CH═ present in the group or two or more non-adjacent —CH═ may be replaced by —N═) and (c) (C) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6-diyl group or One —CH═ present in the 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ may be replaced by —N═. )
    The group (a), the group (b) and the group (c) are each independently selected from the group consisting of cyano group, fluorine atom, chlorine atom, methyl group, trifluoromethyl group or trifluoro May be substituted with a methoxy group,
    n i1 represents 1, 2, 3 or 4, and when n i1 is 2, 3 or 4, and there are a plurality of A i1 , they may be the same or different, and n i1 is When it is 2, 3 or 4 and a plurality of Z i1 are present, they may be the same or different. ) Or one or more compounds selected from the compounds represented by the formula (J)
    Figure JPOXMLDOC01-appb-C000002
    (Wherein R J1 represents an alkyl group having 1 to 8 carbon atoms, and one or two or more non-adjacent —CH 2 — in the alkyl group are each independently —CH═CH—, — Optionally substituted by C≡C—, —O—, —CO—, —COO— or —OCO—,
    n J1 represents 0, 1, 2, 3 or 4;
    A J1 , A J2 and A J3 are each independently
    (A) 1,4-cyclohexylene group (this is present in the group one -CH 2 - or nonadjacent two or more -CH 2 - may be replaced by -O-.)
    (B) a 1,4-phenylene group (one —CH═ present in the group or two or more non-adjacent —CH═ may be replaced by —N═) and (c) (C) Naphthalene-2,6-diyl group, 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or decahydronaphthalene-2,6-diyl group (naphthalene-2,6-diyl group or One —CH═ present in the 1,2,3,4-tetrahydronaphthalene-2,6-diyl group or two or more non-adjacent —CH═ may be replaced by —N═. )
    The group (a), the group (b) and the group (c) are each independently selected from the group consisting of cyano group, fluorine atom, chlorine atom, methyl group, trifluoromethyl group or trifluoro May be substituted with a methoxy group,
    Z J1 and Z J2 are each independently a single bond, —CH 2 CH 2 —, — (CH 2 ) 4 —, —OCH 2 —, —CH 2 O—, —OCF 2 —, —CF 2 O—, Represents —COO—, —OCO— or —C≡C—,
    When n J1 is 2, 3 or 4 and a plurality of A J2 are present, they may be the same or different, and n J1 is 2, 3 or 4 and a plurality of Z J1 is present. If they are the same or different,
    X J1 represents a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, a trifluoromethyl group, a fluoromethoxy group, a difluoromethoxy group, a trifluoromethoxy group, or a 2,2,2-trifluoroethyl group. A horizontal alignment type liquid crystal display element comprising one or more selected from compounds represented by the formula:
  2. 前記画素電極は、櫛形であるか又はスリットを有する請求項1記載の液晶表示素子。 The liquid crystal display element according to claim 1, wherein the pixel electrode has a comb shape or a slit.
  3. 前記画素電極と共通電極との間の電極間距離Rが、前記第一の基板と第二の基板との距離Gより小さい、請求項1または2に記載の液晶表示素子。 The liquid crystal display element according to claim 1, wherein an interelectrode distance R between the pixel electrode and the common electrode is smaller than a distance G between the first substrate and the second substrate.
  4. 前記画素電極と共通電極との間の電極間距離Rが、前記第一の基板と第二の基板との距離Gより長い、請求項1または2に記載の液晶表示素子。 The liquid crystal display element according to claim 1, wherein an interelectrode distance R between the pixel electrode and the common electrode is longer than a distance G between the first substrate and the second substrate.
  5. 該光配向層が光分解型である請求項1~4のいずれか1項に記載の液晶表示素子。 The liquid crystal display element according to claim 1, wherein the photo-alignment layer is of a photolytic type.
  6. 前記液晶層は前記液晶組成物に重合性モノマーの硬化物を含有する、請求項1~5のいずれか1項に記載の液晶表示素子。 6. The liquid crystal display device according to claim 1, wherein the liquid crystal layer contains a cured product of a polymerizable monomer in the liquid crystal composition.
  7. 前記電極間距離(R)が0であり、前記共通電極は、前記第一の基板のほぼ全面に、前記画素電極より第一の基板に近い位置に配置される、請求項3記載の液晶表示素子。 4. The liquid crystal display according to claim 3, wherein the inter-electrode distance (R) is 0, and the common electrode is disposed on a substantially entire surface of the first substrate at a position closer to the first substrate than the pixel electrode. element.
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