WO2016207042A1 - Dispositif amplificateur - Google Patents

Dispositif amplificateur Download PDF

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Publication number
WO2016207042A1
WO2016207042A1 PCT/EP2016/063724 EP2016063724W WO2016207042A1 WO 2016207042 A1 WO2016207042 A1 WO 2016207042A1 EP 2016063724 W EP2016063724 W EP 2016063724W WO 2016207042 A1 WO2016207042 A1 WO 2016207042A1
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WO
WIPO (PCT)
Prior art keywords
laser radiation
beam splitter
polarization
amplifier
optical modulator
Prior art date
Application number
PCT/EP2016/063724
Other languages
German (de)
English (en)
Inventor
Rainer Flaig
Sven-Silvius SCHAD
Alexander Killi
Christian Stolzenburg
Dominik Bauer
Aleksander BUDNICKI
Florian Jansen
Original Assignee
Trumpf Laser Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trumpf Laser Gmbh filed Critical Trumpf Laser Gmbh
Publication of WO2016207042A1 publication Critical patent/WO2016207042A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0064—Anti-reflection devices, e.g. optical isolaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/20—Bonding
    • B23K26/21—Bonding by welding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/38—Removing material by boring or cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • B23K26/702—Auxiliary equipment
    • B23K26/704—Beam dispersers, e.g. beam wells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2333—Double-pass amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/2341—Four pass amplifiers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma

Definitions

  • the present invention relates to an amplifier arrangement, an EUV radiation generating device having such an amplifier arrangement, a laser processing machine with such an amplifier arrangement and a method for operating the amplifier arrangement.
  • a hybrid fiber MOPA Master Oscillator Power Amplifier
  • the multi-pass amplifier is an amplifier with a thin, disc-shaped amplifier medium, which amplifies the power of the laser radiation pre-amplified by the fiber amplifier stages.
  • Amplifier has an optical arrangement which generates a multiple incidence of the pulsed laser radiation on the disc-shaped amplifier medium.
  • No. 8,995,052 B1 describes a multi-stage solid-state MOPA which has a mode-locked laser for generating a pulse train. The pulses are fed to a fast electro-optical shutter, the
  • the electro-optical shutter has polarization-rotating elements, polarization beam splitter and a Pockels cell that can be operated either with high-frequency pulses with fixed short or long pulse durations.
  • the electro-optical shutter is followed by a multipass amplifier.
  • the electro-optical shutter selects every N th pulse of the pulse train and supplies the selected pulses to the multipass amplifier.
  • the multipass amplifier sends amplified seed pulses back to the electro-optical shutter and the shutter rejects or transmits the amplified pulses depending on whether the duration of the RF pulses is short or long.
  • the transmitted amplified pulses are fed to a further optical amplifier.
  • Multipass disk laser amplifiers are supplied to the seed pulse of a Yb-doped fiber oscillator.
  • the fiber oscillator is protected from feedback by means of three Faraday solenoids.
  • a driver laser arrangement for an EUV radiation generating device has become known, for example, from US 2009/0095925 A1.
  • the driver laser arrangement described has a beam source for generating pulsed laser radiation and one or more optical amplifiers
  • the beam source of the pulsed laser radiation Amplification of the pulsed laser radiation.
  • Driver laser arrangement is used to generate so-called seed pulses, which are amplified in the or in the optical amplifiers to high laser powers of several kW, possibly of 10 kW or more.
  • the laser radiation amplified by the driver laser arrangement is transmitted via a beam guiding device
  • Focusing device supplied, which focuses the laser radiation and the laser beam in a target area. In the target area becomes a target material
  • an amplifier arrangement which can be used, for example, for such a driver laser arrangement and which has an optical amplifier for amplifying pulsed laser radiation and a reflective element to which a portion of the laser radiation emerging from the optical amplifier optical amplifier is reflected back.
  • the amplifier arrangement has an optical isolator arranged in the beam path of the laser radiation, which has a polarizer device for the
  • Phase shift device has. At least the polarizer means of the optical isolator is positioned at a location where the laser radiation has a laser power of more than 500W.
  • the object of the invention is to provide amplifier arrangements which enable increased signal amplification and / or improved isolation against back reflections, for example for laser material processing or for the generation of EUV radiation.
  • the invention is also based on the object to provide an EUV radiation generating device with such an amplifier arrangement and a laser processing machine with such an amplifier arrangement.
  • an amplifier arrangement comprising: an optical amplifier for amplifying pulsed laser radiation, a first retroreflector and a second
  • Retroreflector wherein the amplifier is arranged in a beam away the laser radiation between the first retroreflector and the second retroreflector, wherein in the beam path between the first retroreflector and the amplifier, a polarization beam splitter is arranged, the laser radiation having a first polarization state along the beam path between the passing both retroreflectors and couples the laser radiation with a second polarization state of the beam path between the two retroreflectors, and wherein in the beam path between the polarization beam splitter and the second retroreflector, preferably between the amplifier and the second retroreflector, a phase shifting device for generating a fixed phase shift is arranged to laser radiation having the first polarization state in laser radiation with the second
  • the laser media in the form of
  • Amplifier arrangement is the optical amplifier between two retroreflectors (typically in the form of two end mirrors). Due to the predetermined phase shift of the phase shift device, which generates a rotation of the (linear) polarization state of the coupled via the polarization beam splitter in the beam path between the two retroreflectors laser radiation in a double pass, the beam away between the polarization beam splitter and the second retroreflector in which the optical amplifier is arranged to be traversed four times before the amplified laser radiation leaves the beam path between the two retroreflectors via the polarization beam splitter. In this way, the number of passes of the laser radiation through the optical amplifier with respect to those described above
  • Amplifier arrangements are increased. This results in an increased
  • the phase shifting device is typically for generating a
  • Phase shift of A / 4 formed in the propagation of the laser radiation from the polarization beam splitter to the second retroreflector taking into account any polarization rotation of the amplifier or the amplifier medium and possibly further in the beam path between the polarization beam splitter and the second retroreflector are.
  • the laser radiation is converted into circularly polarized laser radiation.
  • Laser radiation which has passed through the phase shift device is reflected back at the second retroreflector and passes through the phase shift device a second time, the circularly polarized laser radiation in linearly polarized laser radiation with a second, perpendicular to the first
  • Phase shift device for example in the form of a ⁇ / 4 plate is oriented correctly. If the optical amplifier to be operated with linearly polarized laser radiation, it is convenient to arrange the phase-shifting device between the optical amplifier and the second retroreflector. It goes without saying that the phase shifting device is not necessarily designed as a single optical component must, but if necessary, the phase shift of ⁇ / 4 or of a total of h / 2 (in a double pass) can be divided into two or more optical components. This is the case in particular if, in addition to the phase shifting device, further optical elements are present in the beam path between the two
  • Retroreflektoren are arranged, which also cause a (fixed) phase shift of the laser radiation, such as disc-shaped laser-active media for amplifying the laser radiation, etc.
  • a phase shift of the laser radiation such as disc-shaped laser-active media for amplifying the laser radiation, etc.
  • Retroreflector are arranged so that the polarization beam splitter can be realized as a single device that produces a fixed phase shift of ⁇ / 4 and a total of K / 2 (at double pass).
  • the polarization beam splitter is typically a
  • Polarization beam splitter comprising a beam splitter surface e.g. in the form of a coating, is reflected at the laser radiation with a first (linear) polarization state and at the laser radiation with a second (linear)
  • Polarization state which is aligned perpendicular to the first (linear) polarization state, is transmitted, or vice versa.
  • the described first polarization state may be a
  • Polarization state act in which the field strength vector of the laser radiation is perpendicular to an incident plane, which contains the beam incidence direction and the surface normal of the surface of the polarization beam splitter (s-polarization).
  • the second polarization state described above is in this case a polarization state in which the field strength vector of the laser radiation is parallel to the plane of incidence (p polarization).
  • the first polarization state may be p-polarization and the second polarization state may be s-polarization.
  • the polarization beam splitter can match the laser radiation with the first
  • Amplifier let pass by the laser radiation is deflected or reflected at the beam splitter surface, while laser radiation with the second
  • the amplifier arrangement additionally comprises a seed laser device for generating the pulsed laser radiation and an optical modulator for generating an adjustable phase shift or an adjustable deflection angle of the laser radiation, which is arranged between the seed laser device and the polarization beam splitter.
  • the optical modulator can be operated in at least two operating states, which differ from one another in the phase shift or in the deflection angle.
  • the optical modulator together with further optical components, eg polarization beam splitters, serves to separate the beam away from the laser radiation generated by the seed laser device from the beam path of the laser radiation amplified by the optical amplifier or to decouple the amplified laser radiation from the amplifier arrangement ,
  • the optical modulator can be designed for this purpose to set a polarization state of the laser radiation and be formed for example as an electro-optical modulator.
  • modulator can also be designed to generate an adjustable deflection angle of the laser radiation, as is the case for example in an acousto-optic modulator.
  • Optical modulators which influence the laser radiation in other ways and which make it possible to generate a separation of the beam paths between the amplified and the laser radiation to be amplified of the seed laser device, can be used in the case of the invention
  • Amplifier arrangement are used.
  • the optical modulator for example in the form of an electro-optical modulator
  • the state of polarization of the pulsed laser radiation generated by the seed laser device can be altered in order to selectively couple laser radiation into the beam path between the two retroreflectors or to guide it to the beam trap.
  • the optical modulator can be operated for this purpose as a switch and be switched between two operating states: In a first operating state of the optical modulator typically generates a
  • Phase shift of h / 2 in a second operating state, the optical modulator does not produce a phase shift.
  • the operating state of the optical modulator can be determined whether linearly polarized laser radiation is coupled into the beam path between the two retroreflectors or directed to the beam trap.
  • Polarization beam splitter is arranged.
  • An arrangement with two or more beam splitter surfaces arranged one behind the other in the beam in order to produce an optical function that can be generated with a single beam splitter surface is referred to as a polarization beam splitter in the context of this application.
  • the polarization beam splitter is typically formed, laser radiation of the seed laser device, the second after passing through the optical modulator
  • Polarization state to couple into the beam path between the retroreflectors.
  • a beam trap can be dispensed with.
  • the amplifier arrangement additionally comprises a further polarization beam splitter, wherein the optical modulator, typically in the form of an electro-optical modulator, is arranged in a beam path between the polarisatton beam splitter and the further polarization beam splitter, wherein the further polarization Beam splitter transmits laser radiation having the first polarization state of the seed laser device to the optical modulator and wherein the further polarization beam splitter laser radiation with the second
  • Polarization state out of the beam path between the polarization beam splitter and the other polarization beam splitter decouples.
  • the laser radiation of the seed laser source is coupled in this case via the further polarization beam splitter, with a lateral coupling is advantageous.
  • the coupling-in direction of the laser radiation of the seed laser source typically does not coincide with the outcoupling direction, along which the laser radiation from the beam away between the polarization beam splitter and the other
  • Polarization beam splitter is coupled out.
  • the coupling-in direction of the seed laser radiation and the outcoupling direction or the propagation direction of the amplified laser radiation can in particular run perpendicular to one another. If the optical modulator does not produce any phase shift of the laser radiation, the laser radiation coupled to the polarization beam splitter, which has the second polarization state, arrives at the further polarization beam splitter and is decoupled therefrom in the outcoupling direction.
  • the further polarization beam splitter which has the second polarization state
  • Laser radiation propagates to a (further) beam trap.
  • the laser radiation propagating in opposition to the coupled-out laser radiation is typically laser radiation amplified in the amplifier arrangement, which is reflected on an object, for example on a diaphragm or on a workpiece, if the amplifier arrangement in a beam source
  • the amplifier arrangement is used in an EUV radiation generating device, it may be in the Object to act a target material of the EUV radiation generating device.
  • the further polarization beam splitter typically has a beam splitter surface which reflects s-polarized back-reflected laser radiation, which runs counter to the propagation direction of the decoupled amplified laser radiation, to the further beam trap and transmits p-polarized back-reflected laser radiation, or vice versa.
  • Modulator can be used as an optical isolator to prevent the entry of amplified, back-reflected laser radiation into the beam path between the two
  • the back-reflected laser radiation is typically polarized, but may also be unpolarized and therefore have radiation components in two mutually perpendicular polarization states.
  • Back-reflected unpolarized laser radiation having the first polarization state is passed from the further polarization beam splitter to the further beam trap.
  • the laser radiation having the second polarization state transmitted by the further polarization beam splitter is converted by the optical modulator into laser radiation having the first polarization state if the optical modulator is operated in a (first) operating state which produces a phase shift of K / 2.
  • the back-reflected laser radiation having the first polarization state that has passed through the optical modulator is passed to the beam trap at the polarization beam splitter. In this way, the entire is reflected back
  • the optical isolator described here is advantageous since it also withstands high laser powers in the kW range or possibly in the multi-kW range. It is understood that the optical isolator described here also in a
  • Amplifier arrangement can be used, which has no phase shift direction and no first retroreflector, so that the beam path between the polarization beam splitter and the (second) retroreflector is traversed only twice.
  • Such an amplifier arrangement is described below.
  • the phase shifting device is a ⁇ / 4 Plate.
  • a phase shifting device typically consists of a plate-shaped, birefringent material which has a thickness which causes a phase shift of the laser radiation by ⁇ / 4, where ⁇ denotes the wavelength of the laser radiation.
  • ⁇ denotes the wavelength of the laser radiation.
  • the phase shift device for generating a ⁇ / 4 phase shift can also be realized in other ways than by a plate of a birefringent material, for example by the use of a refiective phase-shifting optics.
  • the optical modulator is between a first operating state for feeding the laser radiation from the seed laser device to the polarization beam splitter and a second
  • the switching between the first and the second operating state can be carried out in the manner described above.
  • the deflection angle of the laser radiation differs in the two operating states, so that a coupling-in direction of the laser radiation deviates from a coupling-out direction. Since with an acousto-optical modulator, a deflection takes place at an angle other than 0 ° due to diffraction effects, which as a rule only occurs with
  • the acousto-optic modulator in an operating condition has a deflection angle of 0 °, i. E. is inactive.
  • the acousto-optical modulator generates a deflection angle of 0 °, by the absolute value generated during the deflection
  • Modulators may typically be based on the provision of additional optical signals
  • Components for separating the injected from the seed laser device and the decoupled from the amplifier arrangement amplified laser radiation are dispensed with.
  • a further aspect of the invention relates to an amplifier arrangement, comprising: a seed laser device for generating pulsed laser radiation, an optical amplifier for amplifying the pulsed laser radiation in the beam path is arranged between a retroreflector and a polarization beam splitter, and an optical modulator for generating an adjustable
  • Polarization beam splitter is arranged, wherein the polarization beam splitter
  • Laser radiation having the first polarization state which is opposite to that at the further polarization beam splitter from the beam path between the
  • Polarization beam splitter and the further polarization beam splitter propagated laser radiation propagated to supply a further beam trap.
  • the advantage of the invention according to the second aspect of the invention differs from the further described embodiment of the amplifier arrangement according to the first aspect, in which an optical isolator is realized, only in that there is only one retroreflector and that no phase shift device is present, so that the optical amplifier is only passed through twice.
  • Such an amplifier arrangement can be used, for example, if the overall amplification is already sufficiently large, so that the optical amplifier does not have to be traversed more than twice.
  • the optical isolation is possible, as in the case of the amplifier arrangement described above, inter alia by the fact that the seed laser device couples the pulsed laser radiation in a coupling-in direction into the further polarizer device, which differs from the outcoupling direction or the propagation direction of the amplified laser radiation.
  • the optical amplifier comprises at least one multipass amplifier.
  • a multipass amplifier is understood to mean an amplifier in which the laser-active medium is more typical As a solid medium, it is run through several times.
  • the multipass amplifier typically has at least one, typically a plurality of deflection mirrors to reflect the laser radiation back to the laser active medium.
  • Such a multipass amplifier may optionally also have an end mirror to realize a double pass through the multipass amplifier.
  • optical amplifier with at least one multipass amplifier typically leads to a comparatively long beam path of the laser radiation within the optical amplifier and thus to a
  • Coupling of the pulsed laser radiation must be switched from a first operating state to a second operating state and for the switching of the optical modulator a non-negligible switching time is needed.
  • the duration of the laser radiation in the optical amplifier should be longer than the sum of the pulse duration of a pulse of the pulsed laser radiation and twice the switching time of the optical modulator.
  • the M u lti p ss strength at least one
  • a laser disk disk-shaped laser-active medium
  • the path of the laser radiation through a laser disk as the amplifier medium is short, so that a laser disk is typically run through several times in order to generate sufficient amplification of the laser radiation.
  • the multiple passage leads to a comparatively long duration of the laser radiation through the multipass amplifier, which, for example, in the
  • the laser radiation can, for example, cover more than approximately 60 m of beam path in the case of a 32-fold passage through the laser disks, which corresponds to a running time of approximately 200 ns, so that a sufficient period of time is available for the double switching of the optical modulator.
  • the optical modulator is an electro-optical Modulator, in particular a Pockels cell, or an acousto-optical modulator,
  • an electro-optical modulator preferably a Pockels cell
  • the Pockels cell may optionally itself comprise a further phase shift device which produces a constant phase shift of, for example, ⁇ / 2 or ⁇ / 4 and which is e.g. may be formed in the form of a plane plate made of a birefringent material.
  • a further phase shift device which produces a constant phase shift of, for example, ⁇ / 2 or ⁇ / 4 and which is e.g. may be formed in the form of a plane plate made of a birefringent material.
  • Phase shift of ⁇ / 2 generated without for this purpose a control signal or a (high) voltage must be applied to the Pockels cell.
  • the electro-optical modulator can be operated with a smaller (high) voltage, since only one adjustable
  • Phase shift of - ⁇ / 4 or + ⁇ / 4 must be generated. It is understood that a different division between the constant and the adjustable phase shift of the electro-optical modulator are possible, which have a phase shift of K / 2 between the two operating states result.
  • the use of a ⁇ / 2 plate in the electro-optic modulator is particularly favorable in the case where the first operating state of the optical modulator represents the ground state, i. when the optical modulator is operated significantly longer in the first operating state than in the second operating state.
  • the optical modulator can compensate for the effect of the further phase shifter, i. generate a fixed phase shift opposite, same phase shift, so that when passing through the laser beam through the optical modulator no
  • the amplifier arrangement additionally comprises at least one further optical amplifier for amplifying the latter
  • the further amplifier may likewise be a multipass amplifier, for example a disk laser amplifier, whose Disk-shaped laser medium is repeated several times. But it is also possible that the further optical amplifier is formed in another way and, for example, has a rod-shaped laser medium.
  • the amplifier arrangement additionally comprises a further optical modulator for selecting pulses of the pulsed laser radiation of the seed laser device to be amplified.
  • Modulator which may be formed, for example, as an electro-optical or as an acousto-optical modulator, makes it possible to selectively select individual pulses in a seed laser device which generates pulses with a high repetition rate and supply them to the optical amplifier for amplification.
  • the non-selected pulses can be supplied to a beam trap, for example. If the seed laser device generates polarized laser radiation, it is advantageous to connect the pulses via a further electro-optical modulator in combination with another
  • Polarization beam splitter to select or redirect to the beam trap.
  • a further optical modulator in the form of an acousto-optic modulator, a selection of pulses can be made.
  • the amplifier arrangement in this case serves as a so-called driver laser arrangement for the EUV radiation generating device, which in addition to the amplifier arrangement typically has a beam guiding device for guiding the amplified laser radiation to a focusing device.
  • the focusing device focuses the amplified laser radiation on a target area at which a target material is introduced. The target material goes to the
  • Amplifier arrangement not common in the first amplifier of an amplifier chain of eg two or three linear amplifiers, as in driver laser arrangements for EUV light sources, but in the beam path between two of the amplifiers, wherein the coupling takes place in the reverse direction, ie counter to the propagation direction of the laser radiation emerging from the amplifier arrangement.
  • the amplifier or amplifiers arranged in the beam path before coupling in this case, due to the retroreflectors or at least twice, if necessary
  • the / the other amplifier (s) in the beam away from the laser radiation after the coupling of the seed laser radiation is / are arranged, however, are only once pass through, along the propagation direction emerging from the amplifier arrangement or
  • a further aspect of the invention relates to a laser processing machine which has a power consumption as described above.
  • Laser processing machine uses the amplifier arrangement as a beam source and typically has a beam guiding device to guide the laser radiation from the amplifier arrangement to the workpiece.
  • Laser processing machine also typically includes a
  • Control device for controlling actuators for generating a
  • Work piece at a desired location for example, cutting or welding to edit.
  • Another aspect of the invention relates to a method for operating a
  • Laser radiation is coupled out of the beam path between the retroreflectors or from the beam path between the retroreflector and the polarization beam splitter, in a first operating state in which laser radiation is converted with the first polarization state into laser radiation having the second polarization state, and operating the optical modulator during a second period, in which pulsed laser radiation from the beam path between the retroreflectors or between the polarization beam splitter and the
  • Retroreflector is coupled, in a second operating state, in the beam path between the polarization beam splitter and the other
  • Polarization beam splitter a polarization state of the laser radiation is maintained, or vice versa.
  • the optical modulator which is typically an electro-optic modulator in this case, is operated in the first mode when no laser radiation is emitted from the beam path between the two
  • Retroreflektoren or between the polarization beam splitter and the retroreflector is coupled out.
  • an optical isolator is formed by the polarization beam splitter, the further polarization beam splitter and the optical modulator, which prevents the entry of back-reflected laser radiation into the optical amplifier (see above).
  • the second operating state of the optical modulator is only used to remove the laser radiation from the other
  • Disconnect polarization beam splitter so that the second period typically not significantly greater than the pulse duration of a decoupled pulse
  • Laser radiation is. If a respective pulse of the pulsed laser radiation
  • Fig. 1 a, b are schematic representations of an embodiment of a
  • Laser processing machine with an amplifier arrangement with a electro-optical modulator in a first and in a second
  • Fig. 3a, b are schematic representations of an embodiment of a
  • Amplifier arrangement with an acousto-optic modulator in a first and in a second operating state
  • Fig. 4a, b are schematic representations of another embodiment of a
  • FIG. 1 a, b show an exemplary structure of an amplifier arrangement 1, which is integrated in a laser processing machine 30 and which has an optical
  • the seed laser device 4 can be used, for example, to generate pulsed laser radiation with powers in the range of approximately 50 W to 100
  • the seed laser device 4 can optionally superimpose the laser radiation of several beam sources spatially, in polarization and / or in the wavelength ) optical amplifier one
  • Focusing device for the amplified laser radiation 3 and on the representation of drives for generating a relative movement between the workpiece W and the laser radiation 3 and of other components of the
  • the optical amplifier 2 is arranged in the beam path 6 between a first retroreflector 7a and a second retroreflector 7b, each of which is illustrated by way of example as a plane mirror.
  • a polarization beam splitter 8 is arranged in the example shown and in the beam path 6 between the optical amplifier 2 and the second retroreflector 7b is a phase shifting device, for example in the form of a ⁇ / 4- Plate 9 arranged.
  • Amplifier 2 are arranged, provided that the optical amplifier 2 for the
  • Amplification of circularly polarized laser radiation 3 is designed.
  • the polarization beam splitter 8 has a beam splitter surface 8a, which may be formed, for example, in the form of a (thin) polarization-selective coating.
  • the beam splitter surface 8a reflects laser radiation 3, which has a first (linear) polarization state s, which is referred to below as s-polarization and in which the field strength vector of the laser radiation 3 is aligned perpendicular to the plane of the drawing.
  • the beam division surface 8a of the polarization beam splitter 8 transmits laser radiation 3, which has a second (linear) polarization state p, which is referred to below as p-polarization and in which the field strength vector of the laser radiation 3 lies in the plane of the drawing.
  • a Strahlteiier Chemistry 10a of another polarization beam splitter 10 is formed, which is arranged between the seed laser device 4 and an optical modulator 11, which is formed in the example shown as a Pockels cell.
  • the amplifier arrangement 1 additionally has a beam trap 12, which is arranged with respect to the polarization beam splitter 8, more precisely with respect to its beam dividing surface 8a, so that it absorbs s-polarized laser radiation 3 having the first polarization state s and passing through the optical modulator 11 has, so that it is reflected at the Strahlteiier arrangements 8a of the polarization beam splitter 8.
  • the amplifier arrangement 1 also has a further beam trap 13, which with respect to the Strahlteiier Chemistry 10 a of the further polarization beam splitter 10 such is arranged, that this laser radiation 3 intercepts, which emanates from the seed laser device 4 and the second polarization direction p, so that it is transmitted from the beam splitter surface 10a of the weathered polarization Strahlteiiers 10.
  • Beam splitter surface 10a is at an angle of, for example, 45 ° to
  • Propagation direction of the laser radiation 3 (in the example shown from right to left) aligned, which is transmitted to the beam guiding device 31 and the amplifier assembly 1 leaves (see Fig. 1 b).
  • Back-reflected laser radiation 3 ' which has the first state of polarization s and which opposes the
  • Propagation direction of the laser radiation 3 (in the example shown from left to right) runs, is reflected by the beam splitter surface 10a of the further polarization Strahlteiiers 10 and directed to the other beam trap 13.
  • the beam splitter surface 10a may be favorable to use at an angle deviating from 45.degree
  • Fig. 1a shows the amplifier arrangement 1 in a first operating state B1 of the optical modulator 1 1, in which this one Phase shift of A / 2 generated, while in Fig. 1 b, the optical modulator 11 is shown in a second operating state B2, in which this generates no phase shift.
  • the pulsed laser radiation 3 emitted by the seed laser device 4 is unpolarized and impinges on the beam splitter surface 10a of the further polarization beam divider 10, at which laser radiation 3 with the second polarization state p is transmitted to the further beam trap 13.
  • Polarization state s is reflected at the beam splitter surface 10a of the other polarization Strahlteiiers 10 and passes through the optical modulator 1 first
  • the optical modulator 11 in FIG. 1 a is in the first operating state B 1, in which it has a phase shift of
  • the laser radiation 3 with the second polarization state p is transmitted by the polarization beam splitter 8 and enters the beam path 6 between the two retroreflectors 7a, 7b.
  • the beam path 6 between the retroreflectors 7a, 7b, in which the optical amplifier 2 is arranged, is traversed a total of four times in the example shown, before the
  • Laser radiation 3 is coupled via the polarization beam splitter 8, as will be described in detail below.
  • the p-polarized laser radiation 3 transmitted by the polarization beam splitter 8 passes through the optical amplifier 2 for the first time and strikes the suitably oriented ⁇ / 4 plate 9, at which the p-polarized laser radiation 3 is converted into circularly polarized laser radiation 3 which is incident on the second retroreflector 7b and reflected therein, thus completing the first pass through the optical amplifier 2.
  • the laser radiation 3 reflected at the second retroreflector 7b which is also shown by a solid line in FIGS. 1a, b, passes through the beam path 6 through the optical amplifier 2 in the opposite direction a second time.
  • the laser radiation 3 first passes through the suitably oriented ⁇ / 4 plate 9 a second time, whereby the circular polarization state of the laser radiation 3 is converted into the first (linear) polarization state s.
  • the laser radiation 3 strikes the optical amplifier 2 on the polarization beam splitter 8, at the
  • Beam splitter surface 8a is deflected to the first retroreflector 7a.
  • the laser radiation 3 is reflected back into itself and passes through the optical amplifier 2 or the beam away 6 between the two retroreflectors 7a, 7b for a third time.
  • the laser radiation 3 reflected by the first retroreflector 7a is first deflected at the polarization beam splitter 8 and then passes through the optical amplifier 2 before it again encounters the ⁇ / 4 plate 9 at which the first polarization state s of the Laser radiation 3 is converted into a circular polarization state.
  • Retroreflector 7b reflected laser radiation 3 again passes through the ⁇ / 4 plate 9, so that it is p-polarized and passes through the optical amplifier 2 a fourth time.
  • the incident on the polarization beam splitter 8 laser radiation 3 with the second polarization state P is transmitted from the beam splitter surface 8a and from the beam path 6 between the two retroreflectors 7a, 7b
  • the laser beam 3 for the duration which the laser radiation 3 requires for passing through the optical modulator 11 is shifted from the first operating state B1 shown in FIG in Fig. 1 b shown second
  • Polarization state p is transmitted from the beam splitter surface 10 a of the further polarization beam splitter 10 in the direction of the beam guiding device 31.
  • the beam guiding device 31 is traversed only once.
  • the amplifier arrangement 1 can have one or, if appropriate, a plurality of further optical amplifiers, which are arranged in the beam path after the further polarization beam splitter 10 and are passed through by the laser radiation 3 only once.
  • Amplifier 2 which is arranged between the two retroreflectors 7a, 7b, despite the use of a low seed power of the seed laser device 4, a high total gain of the amplifier arrangement 1 can be achieved.
  • laser radiation 3 ' (see Fig. 1 a), which undesirably on an object, for example on the workpiece W, a diaphragm or on a target Materiaf an EUV Radiation generating device (see below) is reflected back into the optical amplifier 2 are reflected back and there possibly a significant, unwanted power extraction in
  • Modulator 1 1 used as an optical isolator.
  • the optical modulator 1 1 is for the suppression of the back-reflected laser radiation 3 ', which is shown in Fig. 1a by a dotted line, operated in the first operating state B1, in which the optical modulator 1 1 generates a phase shift of K / 2.
  • the optical modulator 1 1 is for the suppression of the back-reflected laser radiation 3 ', which is shown in Fig. 1a by a dotted line, operated in the first operating state B1, in which the optical modulator 1 1 generates a phase shift of K / 2.
  • back-reflected laser radiation 3 ' is typically wholly or partially polarized, but may also be unpolarized and first encounters the other polarization beam splitter 10, on which that portion of the back-reflected laser radiation 3', which has the first polarization state s, to the further beam trap thirteenth is diverted.
  • the proportion of the back-reflected laser radiation 3 'with the second polarization state p passes through the optical modulator 1 1 and is in
  • optical modulator 1 1 is in the first operating state B1
  • this or the arrangement shown in Fig. 1 a, b allows optical isolation, which protects the optical amplifier 2 against back-reflected laser radiation 3 '.
  • the optical modulator 11 is typically operated for a comparatively long period T1 in the first operating state B1 shown in FIG. 1a and only during the coupling out of the pulsed laser radiation 3 from the beam path 6 between the retroreflectors 7a, 7b in the second operating state B2
  • the period of time T2 in which the electro-optical modulator 11 is operated in the second operating state B2 is typically only slightly greater than the pulse duration of an amplified laser pulse of the laser radiation.
  • the pulses of the pulsed laser radiation 3 generated by the seed laser device 4 are generated in a time-coordinated manner
  • Amplifier assembly 1 is designed in total such that during the second period T2 no back-reflected laser radiation 3 'arrives at the optical modulator 1 1.
  • the temporal synchronization of the generation of the pulsed laser radiation 3 of the seed laser source 4 with the circuit of the optical modulator 1 between the two operating states B1, B2 can be performed by means of a (not shown) Control device done. Since the optical modulator 1 1 is operated significantly longer in the first operating state B1 than in the second operating state B2, it is favorable if the optical modulator 1 1, in the example shown, the Pockels cell, a
  • Phase shift device which generates a constant phase shift of K / 2. In this way, it is only necessary during the time period T2 to apply a high voltage signal to the Pockels cell in order to connect to it
  • the positions of the seed laser device 4 and the beam guiding device 31 in the beam path 6a can be reversed.
  • the operating conditions B1, B2 of the electro-optical modulator 1 are suitably adapted.
  • Fig. 2 shows very schematically an EUV radiation generating device 20, which has an amplifier arrangement 1, which differs from the amplifier arrangement 1 shown in connection with Fig. 1 a, b in that they instead of two retroreflectors 7a, 7b, only a retroreflector 7, which at the location of the second retroreflector 7b of Fig. 1 a. b shown
  • Amplifier arrangement 1 is arranged.
  • the power amplifier 1 shown in FIG. 2 furthermore differs from the amplifier arrangement of FIG. 1 a, b in that it does not have a ⁇ / 4 plate, so that the beam path 6 between the
  • Polarization beam splitter 8 and the retroreflector 7 of the laser radiation 3 is traversed only twice.
  • the operation of the amplifier arrangement 1 of Fig. 3 is carried out in the manner described in connection with Fig. 1 a, b.
  • the optical amplifier 2 has a first and second multipass amplifier 2a, 2b, each having a laser disk 14 as a gain medium or as a laser-active medium, which is pumped by means of pump radiation, not shown.
  • the laser radiation 3 is reflected by means of deflecting mirrors 15 several times to the respective laser disk 14, so that it is repeatedly traversed by the laser radiation 3, before this respective multipass disk laser amplifiers 2a, 2b leaves.
  • 2 has an (optional) further optical amplifier 5, which is traversed only once by the laser radiation 3 amplified in the optical amplifier 2.
  • the further optical amplifier 5 can also be designed as a multipass amplifier, for example as a multipass disk laser amplifier. It is understood that, as an alternative to the example shown in FIG. 2, the optical amplifier 2 may have more or less than two amplifier stages, which may be in the form of a multipass amplifier 2a, 2b, for example.
  • the further amplifier 5 may also have one, two or more amplifier stages.
  • the laser radiation 3 generated and amplified by the amplifier arrangement 1 is guided via a beam guiding device 21, not shown, to a focusing device 22, which can be transmissive and / or reflective.
  • Focusing device 22 serves to the laser beam 3 generated by the seed laser device 4 and amplified by the optical amplifiers 2, 5 at a
  • Focus target area on which a target material 23 is introduced Upon irradiation with the pulsed laser radiation 3, the target material 23 changes into a plasma state and emits EUV radiation, which is focused by means of a collector mirror 24.
  • the collector mirror 24 has an opening for the passage of the laser radiation 3.
  • a portion of the amplified laser radiation 3 is reflected back to the amplifier assembly 1 on the target material 23, similar to those discussed above
  • the amplifier arrangement 1 shown in FIG. 2 has a further (optional) optical modulator 16 which is arranged between the seed laser device 4 and the second polarization beam splitter 10.
  • the further optical modulator 16 can be used to select individual pulses 17 from the pulsed laser radiation 3 generated by the seed laser device 4 or the pulse sequence generated by the seed laser device 4 in order to amplify them in the amplifier arrangement 1.
  • the further optical modulator 16 may be, for example, an electronic optical modulator or to act an acousto-optic modulator.
  • the pulses not selected for amplification by the further optical modulator 16 are fed to a further beam trap (not shown) or (in the case of a polarized seed laser device 4) to the further beam trap 13.
  • the power unit north ng 1 shown in FIG. 2 may alternatively be designed in the manner described in connection with FIGS. 1a, b and passed through four times.
  • the optical amplifier 2 may be formed in the amplifier device 1 shown in Figs. 1a, b, such as the optical amplifier 2 shown in Fig. 2, and may have one, two or more multipass amplifiers 2a, 2b, for example can be designed as a multipass disk laser amplifier.
  • the amplifier arrangement 1 shown in Fig. 1a, b may comprise one or more further optical amplifiers, which are only passed through once.
  • the power amplifier 1 shown in FIGS. 1 a, b can likewise have a further optical modulator 16 for selecting pulses 17 of the seed laser device 4.
  • Fig. 3a, b and in Fig. 4a, b two further examples of amplifier arrangements 1 are described, which differ substantially from the amplifier arrangement 1 shown in Fig. 1a, b substantially in that these instead of the electro-optical modulator 1 1 have an acousto-optic modulator 1 1 a.
  • the acousto-optical modulator 11a is between a first operating state B1 for feeding the laser radiation 3 from the seed laser device 4 to the polarization beam splitter 8 and a second operating state B2 for coupling the amplified laser radiation 3 away from the beam 6a between the seed - Switched laser device 4 and the polarization beam splitter 8, wherein the decoupled laser radiation 3 in the example shown, a further optical amplifier 5 is supplied. It is understood that the decoupled laser radiation 5 does not necessarily have to be further strengthened.
  • the acousto-optic modulator 1 1 a which may for example be in the form of a Bragg cell, generates a first deflection angle ⁇ 1 of the laser radiation 3 of 0 °, ie the acousto-optic modulator 1 1 a is inactive in the first operating state B1 and does not deflect the laser radiation 3.
  • the laser radiation 3 is supplied to the polarization beam splitter 8, enters the beam path 6 between the two retroreflectors 7a, 7b and is amplified. Since the further optical amplifier 5 at a second deflection angle ⁇ 2 to the line of sight between the seed laser device 4 and the
  • Polarization beam splitter 8 is arranged, is reflected on a component back-reflected laser radiation 3 'of the acousto-optic modulator 11a in the first
  • Operating state B1 is not guided to the polarization beam splitter 8, but leaves it without deflection and is absorbed by a beam trap 12.
  • the acousto-optic modulator 11 a thus serves in the first operating state B1 as an optical isolator, i. to avoid the coupling of back-reflected
  • the generated by the seed laser device 4 laser radiation 3 is generated in the example shown with the second polarization state p, so that the provision of a beam trap for absorbing laser radiation 3 with the first
  • Polarization state s on a first retroreflector 7a opposite side of the polarization beam splitter 8 can be omitted.
  • a seed laser device 4 can be provided which generates, for example, unpolarized laser radiation 3.
  • a (further) beam trap can be provided in order to receive the laser radiation 3 with the first polarization direction s
  • FIG. 3b shows the acousto-optic modulator 1a in the second operating state B2, in which the latter deflects the amplified laser radiation 3 at a second deflection angle ⁇ 2 of, for example, 1 ° to the further optical amplifier 5.
  • the second operating state B2 is assumed only during a comparatively short period of time T2 in order to decouple a pulse of the amplified laser radiation 3 from the amplifier arrangement 1, while the acousto-optical modulator 11a is comparatively long in the first operating state B1, ie inactive, is operated.
  • the amplifier arrangement 1 shown in FIG. 4 a, b differs from the amplifier arrangement 1 shown in FIGS. 3 a, 3 essentially in that the
  • the acousto-optic modulator 11a is active in the first operating state B1 shown in FIG. 4a and deflects the laser radiation 3 of the seed laser device 4 below a first one
  • Deflection angle ⁇ 1 for example, from about 1 °, so that the laser radiation 3 is guided to the polarization beam splitter 8. At the same time it is reflected back
  • the amplified laser radiation 3 passes through the acousto-optical modulator 11 without deflection and is coupled out of the amplifier arrangement 1 via the further optical amplifier 5.
  • the absolute power loss in the acousto-optic modulator 1 1 a is smaller than in the amplifier structure shown in FIGS. 3 a, b.
  • the isolation from the back-reflected laser radiation 3 ' is typically lower than in the amplifier arrangement 1 shown in Fig.
  • stator arrangement 1 shown in FIGS. 4 a, b is therefore particularly advantageous in the case where laser radiation 3 'with little back-reflection is to be expected.
  • Amplifier arrangements 1 do not necessarily need two retroreflectors 7a, 7b, but optionally, as in Fig. 2, only a single retroreflector 7 may have.
  • the amplifier arrangements 1 shown in Figs. 3a, b and 4a, b can also be used in laser processing machines 30, in EUV radiation generating devices 20, or in other applications requiring high laser power.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Electromagnetism (AREA)
  • Lasers (AREA)

Abstract

L'invention concerne un dispositif amplificateur (1), comprenant : un amplificateur optique (2) pour l'amplification d'un faisceau laser (3) ; un premier rétroréflecteur (7a) et un deuxième rétroréflecteur (7b), l'amplificateur (2) étant disposé dans une trajectoire (6) du faisceau laser (3) entre le premier rétroréflecteur (7a) et le deuxième rétroréflecteur (7b), dans la trajectoire (6) entre le premier rétroréflecteur (7a) et l'amplificateur (3) étant disposé un répartiteur de faisceau selon la polarisation (8), qui laisse passer le faisceau laser (3) ayant un premier état de polarisation (s) le long de la trajectoire (6) entre les deux rétroréflecteurs (7a, 7b) et découplant le faisceau laser (3) ayant un deuxième état de polarisation (p) de la trajectoire (6) entre les deux rétroréflecteurs (7a, 7b), et, dans la trajectoire (6) entre le répartiteur de faisceau selon la polarisation (8) et le deuxième rétroréflecteur (7b) étant disposé un dispositif de déphasage (9), qui produit un déphasage fixe (λ/4) pour la conversion du faisceau laser (3) ayant le premier état de polarisation (s) en un faisceau laser (3) ayant le deuxième état de polarisation (p) et vice versa ; un dispositif laser germe (4) pour la génération du faisceau laser (3) ; et un modulateur optique (11) qui est réalisé pour la génération d'un déphasage réglable (λ/2, 0) du faisceau laser (3) ou d'un angle de déviation réglable du faisceau laser (3) et qui est disposé entre le dispositif laser germe (4) et le répartiteur de faisceau selon la polarisation (8). Le répartiteur de faisceau selon la polarisation (8) est réalisé pour coupler le faisceau laser (3) du dispositif laser germe (4), qui présente, après la traversée du modulateur optique (11), le deuxième état de polarisation (p), dans la trajectoire (6) entre les rétroréflecteurs (7a, 7b). Pour la protection de l'amplificateur optique (2) contre un faisceau laser (3') amplifié, réfléchi en retour par un objet (W), le modulateur optique (11, 11a) est réalisé, soit dans un premier état de fonctionnement (B1), dans lequel aucun faisceau laser pulsé (3) n'est découplé de la trajectoire (6) entre les rétroréflecteurs (7a, 7b), pour convertir le faisceau laser (3) ayant le deuxième état de polarisation (p) en un faisceau laser (3) ayant le premier état de polarisation (s) et pour le mener par l'intermédiaire du répartiteur de faisceau selon la polarisation (8) à un piège à faisceau (12), soit dans le premier état de fonctionnement (B1), pour dévier le faisceau laser réfléchi en retour (3') vers un piège à faisceau (12, 13).
PCT/EP2016/063724 2015-06-22 2016-06-15 Dispositif amplificateur WO2016207042A1 (fr)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115007999A (zh) * 2022-05-24 2022-09-06 九江中科神光科技有限公司 一种多程放大激光光束质量控制装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190151993A1 (en) * 2017-11-22 2019-05-23 Asm Technology Singapore Pte Ltd Laser-cutting using selective polarization
CN115244799A (zh) 2020-03-03 2022-10-25 通快激光系统半导体制造有限公司 用于抑制辐射反馈的装置和具有这种装置的激光设备

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3668536A (en) * 1969-04-24 1972-06-06 Comp Generale Electricite Light amplifier stages
US20090095925A1 (en) 2005-06-29 2009-04-16 Cymer, Inc. LPP EUV light source drive laser system
US20130032735A1 (en) * 2010-12-20 2013-02-07 Gigaphoton Inc Laser apparatus and extreme ultraviolet light generation system including the laser apparatus
US8508844B2 (en) 2010-06-22 2013-08-13 Coherent, Inc. Hybrid fiber-MOPA
US20140346376A1 (en) * 2012-03-30 2014-11-27 Gigaphoton Inc. Laser apparatus and extreme ultraviolet light generation apparatus
US8995052B1 (en) 2013-09-09 2015-03-31 Coherent Kaiserslautern GmbH Multi-stage MOPA with first-pulse suppression
WO2015082004A1 (fr) 2013-12-05 2015-06-11 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Système d'amplificateur et système de laser excitateur pour source de lumière uve équipé de ce système

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005059501A1 (de) * 2005-12-06 2007-06-14 Deutsches Zentrum für Luft- und Raumfahrt e.V. Mehrfachpuls-Lichtemissionsvorrichtung und Verfahren zur Erzeugung einer Pulsfolge von Laserlicht-Mehrfachpulsen

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3668536A (en) * 1969-04-24 1972-06-06 Comp Generale Electricite Light amplifier stages
US20090095925A1 (en) 2005-06-29 2009-04-16 Cymer, Inc. LPP EUV light source drive laser system
US8508844B2 (en) 2010-06-22 2013-08-13 Coherent, Inc. Hybrid fiber-MOPA
US20130032735A1 (en) * 2010-12-20 2013-02-07 Gigaphoton Inc Laser apparatus and extreme ultraviolet light generation system including the laser apparatus
US20140346376A1 (en) * 2012-03-30 2014-11-27 Gigaphoton Inc. Laser apparatus and extreme ultraviolet light generation apparatus
US8995052B1 (en) 2013-09-09 2015-03-31 Coherent Kaiserslautern GmbH Multi-stage MOPA with first-pulse suppression
WO2015082004A1 (fr) 2013-12-05 2015-06-11 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Système d'amplificateur et système de laser excitateur pour source de lumière uve équipé de ce système

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JAN-PHILIPP NEGEL ET AL.: "1.1 kW average Output power from a thin-disk multipass amplifier for ultrashort laser pulses", OPTICS LETTERS, vol. 38, no. 24, 2013, pages 5442 - 5445, XP001587458, DOI: doi:10.1364/OL.38.005442
U. BUENTING ET AL.: "Regenerative thin disk amplifier with combined gain spectra producing 500 pJ sub 200 fs pulses", OPTICS EXPRESS, vol. 17, no. 10, 2009, pages 8046 - 8050

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115007999A (zh) * 2022-05-24 2022-09-06 九江中科神光科技有限公司 一种多程放大激光光束质量控制装置

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