WO2016200853A1 - Method of removing metallic deposits from glass - Google Patents
Method of removing metallic deposits from glass Download PDFInfo
- Publication number
- WO2016200853A1 WO2016200853A1 PCT/US2016/036291 US2016036291W WO2016200853A1 WO 2016200853 A1 WO2016200853 A1 WO 2016200853A1 US 2016036291 W US2016036291 W US 2016036291W WO 2016200853 A1 WO2016200853 A1 WO 2016200853A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- glass
- acid
- hypochlorous acid
- vessel
- glass substrate
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 176
- 238000000034 method Methods 0.000 title claims abstract description 37
- 239000002253 acid Substances 0.000 claims abstract description 34
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 32
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims description 31
- 229910052742 iron Inorganic materials 0.000 claims description 15
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 238000000227 grinding Methods 0.000 claims description 6
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 5
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 5
- 229910052788 barium Inorganic materials 0.000 claims description 5
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052791 calcium Inorganic materials 0.000 claims description 5
- 239000011575 calcium Substances 0.000 claims description 5
- 229910017052 cobalt Inorganic materials 0.000 claims description 5
- 239000010941 cobalt Substances 0.000 claims description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 5
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 5
- 229910052712 strontium Inorganic materials 0.000 claims description 5
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 5
- 229910052725 zinc Inorganic materials 0.000 claims description 5
- 239000011701 zinc Substances 0.000 claims description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 3
- 239000004327 boric acid Substances 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 238000010494 dissociation reaction Methods 0.000 claims description 3
- 230000005593 dissociations Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 71
- 238000002844 melting Methods 0.000 description 35
- 230000008018 melting Effects 0.000 description 35
- 238000004519 manufacturing process Methods 0.000 description 32
- 239000006060 molten glass Substances 0.000 description 23
- 238000002156 mixing Methods 0.000 description 16
- 230000008569 process Effects 0.000 description 12
- 239000000243 solution Substances 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 230000005484 gravity Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 6
- 238000011144 upstream manufacturing Methods 0.000 description 6
- 239000011324 bead Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000006025 fining agent Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 230000003750 conditioning effect Effects 0.000 description 4
- 230000004927 fusion Effects 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000010186 staining Methods 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical class Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 229910021577 Iron(II) chloride Inorganic materials 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000000156 glass melt Substances 0.000 description 3
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000037361 pathway Effects 0.000 description 3
- -1 platinum group metals Chemical class 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- 239000011214 refractory ceramic Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000001580 bacterial effect Effects 0.000 description 2
- 239000011449 brick Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003638 chemical reducing agent Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 235000011167 hydrochloric acid Nutrition 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910000629 Rh alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000011538 cleaning material Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000011143 downstream manufacturing Methods 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 238000003286 fusion draw glass process Methods 0.000 description 1
- 239000002920 hazardous waste Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 239000006132 parent glass Substances 0.000 description 1
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003283 slot draw process Methods 0.000 description 1
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 1
- 229960002218 sodium chlorite Drugs 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/02—Inorganic compounds
- C11D7/04—Water-soluble compounds
- C11D7/08—Acids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/395—Bleaching agents
- C11D3/3956—Liquid compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/18—Glass; Plastics
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
Definitions
- the present disclosure is generally directed to a method of processing glass articles, for example a glass substrate for example a glass sheet suitable for use in display applications, and in particular for processing the glass article to remove metallic deposits therefrom.
- Glass substrates suitable for use in display applications must be extraordinarily clean and defect free, as the visual acuity of the average viewer of such displays is capable of discerning even minute defects on a viewing screen.
- contamination of the glass sheets used in such applications can impede the deposition and/or functioning of materials deposited on the glass sheet that are required for the proper operation of the display device. For example, contamination may impede the deposition of thin film transistors deposited on one or more glass substrates used in the manufacture of a display device.
- Contamination of glass substrates can be, for example, organic or metallic.
- the process may need to be tailored to employ different cleaning agents to remove different contaminants. That said, the need to constrain costs associated with the manufacture of glass sheets dictates that effective methods of removing contaminants from glass sheets that do not significantly increase processing costs should be employed.
- hypochlorous acid from industrial water systems provides for a ready source of chlorinated water that advantageously 1) is plentiful and inexpensive, and 2) is not subject to the special handling required for more active acids such as sulfuric or hydrochloric acids.
- hypochlorous acid is widely used as a bleach and a deodorizer and to disinfect and prevent bacterial growth in water.
- hypochlorous acid may be used in industrial
- Hypochlorous acid may be easily formed, for example, by adding sodium chlorite to water.
- a method of removing a metallic deposit from a glass article with a weak acid comprising exposing the glass article to an aqueous solution of a weak acid in a concentration of from 0.5 to 1.0 ppm for a time effective to remove metallic deposits from a surface of the glass article.
- a dissociation constant K a of the weak acid can be in a range from about 2.95 x 10 "8 to about 7.5 x 10 "3 .
- the weak acid may be selected from the group consisting of hypochlorous acid, boric acid and phosphoric acid.
- the metallic deposit may comprise at least one of iron, calcium, barium, zinc, cobalt, manganese, strontium and combinations or alloys thereof. In various particular embodiments the metallic deposit comprises iron and the the weak acid comprises hypochlorous acid.
- a method of removing a metallic deposit from a glass sheet comprising exposing the entirety of at least one major surface of the glass sheet to an acqueous solution of hypochlorous acid in a concentration of from 0.5 to 1.0 ppm for a time effective to remove a metallic deposit from the at least one major surface.
- the metallic deposit may include at least one of iron, calcium, barium, zinc, cobalt, manganese, strontium and combinations or alloys thereof.
- FIG. 1 is a schematic diagram of an exemplary glass manufacturing apparatus
- FIG. 2 is a block diagram of a glass substrate finishing process that may be located downstream of the apparatus of FIG. 1;
- FIG. 3 is a microscopic view of a metallic deposit on a glass substrate manufactured by the apparatus of FIG. 1;
- FIG. 4 is an embodiment of a treatment apparatus for treating a glass substrate with hypochlorous acid
- FIG. 5 is another embodiment of a treatment apparatus for treating a glass substrate with hypochlorous acid.
- FIG. 6 is a graph illustrating the number of occurrences of iron deposits on glass substrates on a daily basis over a time period of approximately 6 months and showing a dramatic decrease in iron deposits upon commencement of hypochlorous acid washing.
- the glass manufacturing apparatus 10 can comprise a glass melting furnace 12 that can include a melting vessel 14.
- glass melting furnace 12 can optionally include one or more additional components such as heating elements (e.g., combustion burners or electrodes) configured to heat batch and convert the batch into molten glass.
- heating elements e.g., combustion burners or electrodes
- glass melting furnace 12 may include thermal management devices (e.g., insulation components) configured to reduce heat lost from a vicinity of the melting vessel.
- glass melting furnace 12 may include electronic devices and/or electromechanical devices configured to facilitate melting of the batch material into a glass melt.
- glass melting furnace 12 may include support structures (e.g., support chassis, support member, etc.) or other components.
- Glass melting vessel 14 is typically comprised of refractory material, such as a refractory ceramic material.
- glass melting vessel 14 may be constructed from refractory ceramic bricks, for example refractory ceramic bricks comprising alumina or zirconia.
- the glass melting furnace may be incorporated as a component of a glass manufacturing apparatus configured to fabricate a glass ribbon.
- the glass melting furnace of the disclosure may be incorporated as a component of a glass manufacturing apparatus comprising a slot draw apparatus, a float bath apparatus, a down-draw apparatus (e.g., a fusion apparatus), an up-draw apparatus, a press-rolling apparatus, a tube drawing apparatus or any other glass manufacturing apparatus.
- FIG. 1 schematically illustrates glass melting furnace 12 as a component of a fusion down-draw glass manufacturing apparatus 10 for fusion drawing a glass ribbon for subsequent processing into glass sheets.
- the glass manufacturing apparatus 10 can optionally include an upstream glass manufacturing apparatus 16 that is positioned upstream relative to glass melting vessel 14. In some examples, a portion of, or the entire upstream glass manufacturing apparatus 16, may be incorporated as part of the glass melting furnace 12.
- the upstream glass manufacturing apparatus 16 can include a storage bin 18, a batch delivery device 20 and a motor 22 connected to the batch delivery device.
- Storage bin 18 may be configured to store a quantity of batch material 24 that can be fed into melting vessel 14 of glass melting furnace 12, as indicated by arrow 26.
- batch delivery device 20 can be powered by motor 22 such that batch delivery device 20 is configured to deliver a predetermined amount of batch material 24 from storage bin 18 to melting vessel 14.
- motor 22 can power batch delivery device 20 to introduce batch material 24 at a controlled rate based on a level of molten glass sensed downstream from melting vessel 14. Batch material 24 within melting vessel 14 can thereafter be heated to form molten glass 28.
- Glass manufacturing apparatus 10 can also optionally include a downstream glass manufacturing apparatus 30 that is positioned downstream relative to the glass melting furnace 12.
- a portion of downstream glass manufacturing apparatus 30 may be incorporated as part of glass melting furnace 12.
- first connecting conduit 32 discussed below, or other portions of the downstream glass manufacturing apparatus 30, may be incorporated as part of the glass melting furnace 12.
- Elements of the downstream glass manufacturing apparatus, including first connecting conduit 32, may be formed from a precious metal. Suitable precious metals include platinum group metals selected from the group of metals consisting of platinum, iridium, rhodium, osmium, ruthenium and palladium, or alloys thereof.
- downstream components of the glass manufacturing apparatus may be formed from a platinum-rhodium alloy including 70 to 90% by weight platinum and 10 to 30% by weight rhodium.
- suitable metals can include molybdenum, palladium, rhenium, tantalum, titanium, tungsten and alloys thereof.
- Downstream glass manufacturing apparatus 30 can include a first conditioning (i.e. processing) vessel such as fining vessel 34, located downstream from melting vessel 14 and coupled to melting vessel 14 by way of the above-referenced first connecting conduit 32.
- molten glass 28 may be gravity fed from melting vessel 14 to fining vessel 34 by way of first connecting conduit 32.
- gravity may drive molten glass 28 through an interior pathway of first connecting conduit 32 from melting vessel 14 to fining vessel 34.
- other conditioning vessels may be positioned downstream of melting vessel 14, for example between melting vessel 14 and fining vessel 34.
- a cooling vessel (not shown) may be employed between the melting vessel and the fining vessel wherein molten glass from the melting vessel is cooled to a temperature lower than the temperature of the molten glass in the melting vessel before entering the fining vessel.
- fining vessel 34 bubbles may be removed from molten glass 28 by various techniques.
- batch material 24 may include multivalent compounds (i.e. fining agents) such as tin oxide that, when heated, undergo a chemical reduction reaction and release oxygen.
- fining agents include without limitation arsenic, antimony, iron and cerium.
- Fining vessel 34 is heated to a temperature greater than the melting vessel temperature, thereby heating the fining agent.
- Oxygen bubbles produced by the temperature-induced chemical reduction of the fining agent(s) rise through the molten glass within the fining vessel, wherein gases in the melt produced in the melting furnace can coalesce into the oxygen bubbles produced by the fining agent.
- the enlarged gas bubbles can then rise to a free surface of the molten glass in the fining vessel and thereafter be vented out.
- Downstream glass manufacturing apparatus 30 can further include a second conditioning vessel such as mixing vessel 36 for mixing the molten glass that may be located downstream from the fining vessel 34.
- the glass melt mixing vessel 36 can be used to provide a homogenous glass melt composition, thereby reducing or eliminating inhomogeneities that may otherwise exist within the fined molten glass exiting the fining vessel.
- fining vessel 34 may be coupled to molten glass mixing vessel 36 by way of a second connecting conduit 38.
- molten glass 28 may be gravity fed from the fining vessel 34 to mixing vessel 36 by way of second connecting conduit 38. For instance, gravity may drive molten glass 28 through an interior pathway of second connecting conduit 38 from fining vessel 34 to mixing vessel 36.
- mixing vessel 36 is shown downstream of fining vessel 34, mixing vessel 36 may be positioned upstream from fining vessel 34.
- downstream glass manufacturing apparatus 30 may include multiple mixing vessels, for example a mixing vessel upstream from fining vessel 34 and a mixing vessel downstream from fining vessel 34. These multiple mixing vessels may be of the same design, or they may be of a different design from one another.
- Downstream glass manufacturing apparatus 30 can further include another conditioning vessel such as delivery vessel 40 that may be located downstream from mixing vessel 36.
- Delivery vessel 40 may condition molten glass 28 to be fed into a downstream forming device.
- delivery vessel 40 can act as an accumulator and/or flow controller to adjust and provide a consistent flow of molten glass 28 to forming body 42 by way of exit conduit 44.
- mixing vessel 36 may be coupled to delivery vessel 40 by way of third connecting conduit 46.
- molten glass 28 may be gravity fed from mixing vessel 36 to delivery vessel 40 by way of third connecting conduit 46. For instance, gravity may drive molten glass 28 through an interior pathway of third connecting conduit 46 from mixing vessel 36 to delivery vessel 40.
- Downstream glass manufacturing apparatus 30 can further include forming apparatus 48 comprising the above-referenced forming body 42 including inlet conduit 50.
- Exit conduit 44 can be positioned to deliver molten glass 28 from delivery vessel 40 to inlet conduit 50 of forming apparatus 48.
- forming body 42 can comprise a trough 52 positioned in an upper surface of the forming body and converging forming surfaces 54 that converge along a bottom edge (root) 56 of the forming body.
- Molten glass delivered to the forming body trough via delivery vessel 40, exit conduit 44 and inlet conduit 50 overflows the walls of the trough and descends along the converging forming surfaces 54 as separate flows of molten glass.
- the glass ribbon may subsequently be separated into individual glass substrates 59 by a glass separation apparatus (not shown).
- FIG. 2 illustrates an exemplary finishing line 60 arranged downstream from glass manufacturing apparatus 10.
- Finishing line 60 may include a variety of different stations configured to process one or more glass substrates 59, including one or more of a cutting station 62, a beveling station 64, a washing station 66, an inspection station 68 and a packaging station 70.
- glass substrate 59 can be cut to a predetermined size.
- the glass substrate may be cut to a predetermined size from the much larger glass ribbon 58 produced from apparatus 10 described above.
- the glass ribbon may be a continuous glass ribbon that is cut in a direction substantially perpendicular to the length dimension of the glass ribbon, e.g., perpendicular to a draw direction.
- Glass substrate 59 may include a thickness in a range from about 0.05 to about 0.7 millimeters, for example in a range from about 0.1 millimeters to about 3 millimeters, in a range from about 0.3 millimeters to about 1 millimeter, in a range from about 0.5 millimeter to about 0.7 millimeters, and including all ranges and subranges therebetween.
- the glass ribbon acquires thickened edge portions, termed beads, due to a width-wise shrinkage of the glass ribbon as the glass ribbon cools from a viscous state to an elastic state.
- beads thickened edge portions
- typical applications such as the manufacture of display panels for incorporation into various display devices, require the removal of these beads.
- the parent glass substrate cut from the ribbon may be further cut into several smaller glass substrates. Accordingly, glass substrate 59 may be processed at cutting station 62 where cutting operations can be performed to remove any edge portion beads that exist on the glass substrate, and, optionally, to cut the glass substrate to a predetermined size.
- edges of the glass substrate may be beveled at a beveling station 64. Any one or more edges of the glass substrate may be beveled. In various embodiments, all four edges of a rectangular substrate are beveled, either singly (one at a time), or simultaneously.
- the cutting process may leave damaged edge faces on the glass substrate.
- mechanical score and break processes typically involve contacting a major surface of the glass substrate with a scoring tool. The contacting requires pressing the scoring tool into the glass substrate with sufficient force to create a vent crack that extends at least partially through a thickness of the glass substrate. At least a portion of the thickness of the glass substrate may therefore also be damaged by the forced contact with the scoring tool. This damage can provide the initial flaw required for a subsequent unwanted break to occur.
- processing the glass substrate to produce a bevel along the edges of the glass substrate may reduce the tendency for handling damage to the glass substrate.
- Beveling can be performed by grinding and/or polishing of the glass substrate edges.
- Water may be applied to the edge surfaces of the glass substrate, to the major surfaces of the glass substrate and/or to the grinding wheel used to bevel the edges to aid in rinsing particulate from the glass substrate, to prevent glass particulate from adhering to the glass substrate, and to cool the contact surfaces of the glass substrate and grinding wheel during the grinding process.
- glass particulate is produced by the removal of glass from the edges of the glass substrate, which glass particulate may become attached to the major surfaces of the glass substrate. If the particulate is not removed, the particulate can interfere with downstream processing, for example the deposition of thin films during the production of a display panel.
- the glass substrate may be further processed at a washing station 66 where particulate is washed from the major surfaces, and from edge surfaces if necessary.
- the glass substrate may be exposed to one or more detergent solutions and/or rinsing solutions. After rinsing, the glass substrate may be dried, inspected at an inspection station 68 and then packaged for shipping at a packaging station 70.
- one or both major surfaces of the glass substrate may become contaminated with metallic deposits (e.g., "staining"), wherein minute regions of the glass surface include a thin deposit of metal, such as but not limited to iron, calcium, barium, zinc, cobalt, manganese, strontium. While the mechanism for such depositing is not well understood, it is thought that such metallic deposits may occur during the drawing process when the glass is still at an appreciable temperature (for example in a range from about 100°C to about 600°C. For example, such metallic depositing may occur as a result of glass condensate dripping onto the glass substrate from the drawing machine structure.
- metallic deposits e.g., "staining”
- FIG. 3 is a photograph of an example iron deposit, shown at 20X.
- the particular iron deposit in FIG. 3 has an overall length of approximately 460 micrometers, with a ring-shaped center region of about 150 micrometers in length, and both vertical and horizontal streaking.
- metallic deposits can be removed by exposing the glass substrate to a relatively strong mineral acid, for example hydrofluoric acid (HF) and/or hydrochloric acid.
- HF hydrofluoric acid
- such strong acids are expensive to use, both in terms of the cost of the acid itself, special handling requirements and the need to process the waste liquid as a hazardous waste.
- such acid may cause unnecessary etching of the glass surface.
- a glass substrate 72 (where glass substrate 72 designates a glass substrate cut from the mother glass substrate 59, although in further embodiments, the glass substrate may be the mother glass substrate cut from glass ribbon 58, with or without beads removed) is exposed to a weak acid solution 74.
- the glass substrate may be exposed, for example by spraying the weak solution from one or more nozzles 76 arranged to wet one or both major surfaces 78, 80 of the glass substrate.
- the one or both major surfaces 78, 80 should be entirely wetted with the weak acid.
- treatment of a glass surface with hypochlorous acid can be used to remove iron deposits according to the following chemical reactions:
- the exposure to the weak acid may occur at any time after the glass substrate forming process, but in some embodiments, the acid exposure is performed during the beveling process at beveling station 64. However, in various other embodiments the exposure to the weak acid can occur after the beveling process but before the washing process at washing station 66.
- one or both major surfaces 78, 80 may be exposed to a weak acid by a drizzle 82 (i.e., low pressure stream) of the acid from one or more nozzles 76, as shown in FIG. 5.
- the glass substrate 72 may be positioned at an angle a equal to or greater than 0 degrees and equal to or less than 90 degrees relative to horizontal (wherein 0 degrees is horizontal and 90 degrees is vertical).
- the weak acid may be applied at a rate in a range from about 7 liters per minute to about 9 liters per minute, for example 8.3 +/- liters per minute. It has been found that at the foregoing concentration and delivery rate, an exposure time in a range from about 20 seconds to about 60 seconds is sufficient to remove metallic deposits, for example in a range from about 20 seconds to about 30 seconds, in a range from about 20 seconds to about 25 seconds, and including all ranges and subranges therebetween. [0042] It should be apparent with the benefit of the present disclosure that the weak acid employed in any of the various embodiments described above may be purposely produced specifically for removing metallic staining of glass substrates.
- hypochlorous acid may already be available from other sources in a manufacturing facility.
- hypochlorous acid because of its ability to suppress bacterial growth, may already be an additive in, for example, cooling water used in air conditioning cooling elements (e.g. heat exchangers).
- other systems within a manufacturing facility that may employ hypochlorous acid-treated water may be used as a hypochlorous acid supply.
- Hypochlorous acid may be recycled water that is reclaimed from other processes and, suitably filtered, may be used as a hypochlorous acid for treating glass substrates as described herein. Accordingly, a ready supply of a suitable hypochlorous acid solution may be available without significant added cost.
- FIG. 6 is a graph illustrating the approximately daily occurrence of iron deposited on glass substrates over a period of approximately 6 months in a glass manufacturing facility.
- the period from the left of the graph to vertical dashed line 84 represents a period in which only washing with an alkali detergent (e.g., Parker 225x) was performed.
- the vertical axis represents the number of defects (metallic staining) detected per day.
- a wash with hypochlorous acid was instituted at beveling station 64, represented by line 84. The data show a dramatic reduction in deposited iron once a hypochlorous acid wash was begun.
- treatment with a weak acid solution for example hypochlorous acid
- a weak acid solution for example hypochlorous acid
- any suitable glass article including glass substrates, glass articles made from glass substrates, for example display panels, and any other glass article that might benefit from the removal of metal staining.
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- Oil, Petroleum & Natural Gas (AREA)
- General Chemical & Material Sciences (AREA)
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Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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KR1020187000783A KR20180026727A (en) | 2015-06-10 | 2016-06-08 | Removal of metallic deposits from glass |
JP2017564008A JP2018518444A (en) | 2015-06-10 | 2016-06-08 | Method for removing metal deposits from glass |
CN201680034102.2A CN107873049A (en) | 2015-06-10 | 2016-06-08 | The method that metal deposit is removed from glass |
Applications Claiming Priority (2)
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US201562173480P | 2015-06-10 | 2015-06-10 | |
US62/173,480 | 2015-06-10 |
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PCT/US2016/036291 WO2016200853A1 (en) | 2015-06-10 | 2016-06-08 | Method of removing metallic deposits from glass |
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JP (1) | JP2018518444A (en) |
KR (1) | KR20180026727A (en) |
CN (1) | CN107873049A (en) |
TW (1) | TWI689475B (en) |
WO (1) | WO2016200853A1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018144527A1 (en) * | 2017-01-31 | 2018-08-09 | Corning Incorporated | Methods for reducing glass sheet edge particles |
WO2018144577A1 (en) * | 2017-01-31 | 2018-08-09 | Corning Incorporated | Methods for reducing glass sheet edge particles |
CN115090641A (en) * | 2022-06-21 | 2022-09-23 | 同创(丽水)特种材料有限公司 | Method for cleaning tantalum coating on glass and application thereof |
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US6174509B1 (en) * | 1997-02-11 | 2001-01-16 | Corning Incorporated | Pure fused silica, furnace and method |
US7191619B2 (en) * | 2000-08-17 | 2007-03-20 | Hoya Corporation | Process for producing glass and glass-melting apparatus thereof |
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US20130052414A1 (en) * | 2011-08-26 | 2013-02-28 | Michael Sean Dobbins | Glass substrates with strategically imprinted b-side features and methods for manufacturing the same |
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WO1997030933A1 (en) * | 1996-02-21 | 1997-08-28 | Corning Incorporated | Pure fused silica, furnace and method |
JPH09227170A (en) * | 1996-02-19 | 1997-09-02 | Fujitsu Ltd | Cleaning of glass base board |
JP2008135790A (en) * | 1996-07-05 | 2008-06-12 | Toshiba Corp | Cleaning method and cleaning method of electronic component |
JPH11130467A (en) * | 1997-10-28 | 1999-05-18 | Shinetsu Quartz Prod Co Ltd | Etching treating liquid for synthetic quartz glass jig and etching method using the liquid |
JP3567971B2 (en) * | 1998-11-10 | 2004-09-22 | 日立プラント建設株式会社 | Cleaning liquid and cleaning method for glass substrate |
US7250114B2 (en) * | 2003-05-30 | 2007-07-31 | Lam Research Corporation | Methods of finishing quartz glass surfaces and components made by the methods |
-
2016
- 2016-06-08 CN CN201680034102.2A patent/CN107873049A/en active Pending
- 2016-06-08 TW TW105118182A patent/TWI689475B/en not_active IP Right Cessation
- 2016-06-08 KR KR1020187000783A patent/KR20180026727A/en unknown
- 2016-06-08 WO PCT/US2016/036291 patent/WO2016200853A1/en active Application Filing
- 2016-06-08 JP JP2017564008A patent/JP2018518444A/en active Pending
Patent Citations (5)
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US6174509B1 (en) * | 1997-02-11 | 2001-01-16 | Corning Incorporated | Pure fused silica, furnace and method |
US7191619B2 (en) * | 2000-08-17 | 2007-03-20 | Hoya Corporation | Process for producing glass and glass-melting apparatus thereof |
US7562538B2 (en) * | 2005-05-27 | 2009-07-21 | Guardian Industries Corp. | Method of making clear glass composition |
US7908886B2 (en) * | 2008-02-22 | 2011-03-22 | Corning Incorporated | Oxyhalide glass fining |
US20130052414A1 (en) * | 2011-08-26 | 2013-02-28 | Michael Sean Dobbins | Glass substrates with strategically imprinted b-side features and methods for manufacturing the same |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2018144527A1 (en) * | 2017-01-31 | 2018-08-09 | Corning Incorporated | Methods for reducing glass sheet edge particles |
WO2018144577A1 (en) * | 2017-01-31 | 2018-08-09 | Corning Incorporated | Methods for reducing glass sheet edge particles |
CN115090641A (en) * | 2022-06-21 | 2022-09-23 | 同创(丽水)特种材料有限公司 | Method for cleaning tantalum coating on glass and application thereof |
Also Published As
Publication number | Publication date |
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TWI689475B (en) | 2020-04-01 |
JP2018518444A (en) | 2018-07-12 |
KR20180026727A (en) | 2018-03-13 |
CN107873049A (en) | 2018-04-03 |
TW201708150A (en) | 2017-03-01 |
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