WO2016183760A1 - 基于接触作用的电阻抗调控装置及方法 - Google Patents
基于接触作用的电阻抗调控装置及方法 Download PDFInfo
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- WO2016183760A1 WO2016183760A1 PCT/CN2015/079148 CN2015079148W WO2016183760A1 WO 2016183760 A1 WO2016183760 A1 WO 2016183760A1 CN 2015079148 W CN2015079148 W CN 2015079148W WO 2016183760 A1 WO2016183760 A1 WO 2016183760A1
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- WIPO (PCT)
- Prior art keywords
- unit
- contact
- electrical impedance
- impedance
- functional material
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 25
- 230000000694 effects Effects 0.000 title abstract description 4
- 239000000463 material Substances 0.000 claims abstract description 34
- 238000012544 monitoring process Methods 0.000 claims abstract description 20
- 230000033228 biological regulation Effects 0.000 claims description 17
- 230000001105 regulatory effect Effects 0.000 claims description 16
- 238000006073 displacement reaction Methods 0.000 claims description 13
- 239000002131 composite material Substances 0.000 claims description 11
- 239000000919 ceramic Substances 0.000 claims description 5
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims description 5
- 239000003990 capacitor Substances 0.000 claims description 4
- 230000001276 controlling effect Effects 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical group [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 229910002182 La0.7Sr0.3MnO3 Inorganic materials 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 239000000470 constituent Substances 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 239000008204 material by function Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- SKKNACBBJGLYJD-UHFFFAOYSA-N bismuth magnesium Chemical compound [Mg].[Bi] SKKNACBBJGLYJD-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 235000000396 iron Nutrition 0.000 description 1
- 230000005291 magnetic effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/38—Impedance-matching networks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
- H03H7/38—Impedance-matching networks
- H03H7/40—Automatic matching of load impedance to source impedance
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/802—Circuitry or processes for operating piezoelectric or electrostrictive devices not otherwise provided for, e.g. drive circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
- H10N30/8554—Lead-zirconium titanate [PZT] based
Definitions
- the invention relates to a device and a method for regulating the electrical impedance of a functional material by using local contact action, belonging to the field of impedance matching design and nanotechnology of an alternating current circuit.
- the circuit impedance is adjusted by parallel or series connection of standard resistors, capacitors or inductor components on the basis of the original circuit, but this method is mostly used in the product design phase; in the service process, it is adjusted by the access circuit.
- the volume or number of resistors, capacitors or inductors is realized. This method is feasible at the macro scale. It is difficult to operate at the micrometer scale, and it will face great challenges at the nanoscale. Therefore, it is severely constrained. Design and application of micro/nano electromechanical systems with adjustable electrical impedance.
- the method has the advantages of convenient operation, real-time regulation and advantages in the micro/nano electromechanical system without changing the constituent elements of the circuit.
- An electrical impedance regulation device based on contact action comprising a driving unit 1, a contact unit 2, a monitoring unit 3 and a control unit 4 (see FIG. 1), wherein: the contact unit 2 is used for contacting an electromagnetic functional material to be regulated; 3 for measuring the impedance signal of the electromagnetic functional material, and transmitting the impedance signal to the control unit 4; the driving unit 1 is fixedly connected with the contact unit 2; the control unit 4 controls the driving unit 1 according to the impedance signal measured by the monitoring unit 3, The driving unit 1 is mechanically loaded on the contact unit 2 to cause the contact unit 2 to contact the electromagnetic functional material and regulate the contact load magnitude, thereby regulating the electrical impedance of the electromagnetic functional material.
- the driving unit 1 may specifically be a piezoelectric actuator, such as a lead zirconate titanate ceramic piezoelectric actuator or bismuth magnesium. Lead acid-lead titanate single crystal piezoelectric actuator.
- the piezoelectric actuator is fixedly connected to the contact unit 2 and is electrically connected to the control unit 4, and the contact unit 2 is driven to be slightly displaced by the control unit 4.
- the contact unit 2 may specifically be a conductive voltage head.
- the material of the lead voltage tip may be boron doped diamond or cemented carbide, and the shape may be spherical or frustum shape, and the size may be on the nanometer or micrometer level, by gluing or A screw connection or the like is fixedly connected to the drive unit 1.
- the monitoring unit 3 may specifically be an impedance measuring instrument connected to the voltage guiding head and the bottom electrode of the electromagnetic functional material through two wires. Further, the monitoring unit 3 may further comprise a precision displacement sensor, such as a capacitive displacement sensor, wherein the upper and lower capacitor plates of the capacitive sensor head are respectively fixed on the main structure of the device and the end of the driving unit 1 The displacement of the contact unit 2 is measured.
- a precision displacement sensor such as a capacitive displacement sensor
- the control unit 4 is connected to the monitoring unit 3 and the driving unit 2 respectively, which may specifically be a data reading and controller.
- the present invention provides a contact-based electrical impedance regulation method, comprising the following steps (as shown in FIG. 2):
- the contact unit 2 is mechanically loaded by the driving unit 1, so that the contact unit 2 is in contact with the electromagnetic functional material to be regulated in the AC circuit;
- the mechanical loading of the driving unit 1 is adjusted by the control unit 4 according to the impedance signal measured by the monitoring unit 3, thereby adjusting the contact load of the contact unit 2 with respect to the electromagnetic functional material, and realizing the electrical impedance of the electromagnetic functional material. Adjust to achieve the purpose of real-time regulation of impedance matching of AC circuits.
- the layered electromagnetic composite material can be predicted at a certain contact depth by using the above formula (1).
- the electrical impedance amplitude therefore, in the step (3) of the above-mentioned electrical impedance regulation method, the electrical resistance of the corresponding magnitude can be obtained by controlling the contact load to reach a certain contact depth.
- the invention is based on the contact-resistance electrical impedance regulation method, and realizes the regulation of the impedance of the electromagnetic functional film and the like in the micro/nano electromechanical system circuit by applying the micro-nano-scale contact action, thereby realizing the load change or the service environment temperature change.
- the circuit impedance is matched in real time.
- the invention has the following advantages and outstanding effects: (1) a method for regulating the impedance of an electromagnetic functional material by using mechanical contact is first proposed; (2) the control process does not need to change the constituent elements of the circuit; (3) the load can be changed or the ambient temperature changes. Under the circumstances, the circuit impedance is controlled in real time to achieve impedance matching and easy operation. (4) Since the contact occurs at the micro-nano scale, it has unique advantages in micro/nano electromechanical systems.
- FIG. 1 is a block diagram of a technical unit of an electrical impedance regulating device provided by the present invention.
- FIG. 2 is a flow chart of an electrical impedance regulation method provided by the present invention.
- FIG. 3 is a diagram showing an experimental apparatus for electrical impedance regulation according to an embodiment of the present invention.
- FIG. 4 is a diagram showing the relationship between electrical impedance and alternating current frequency of layered electromagnetic composite La 0.7 Sr 0.3 MnO 3 /PMN-PT of different thicknesses in different thicknesses according to an embodiment of the present invention, wherein (a), (b), The ferromagnetic layer La 0.7 Sr 0.3 MnO 3 of c) has thicknesses of 200 nm, 400 nm and 600 nm, respectively.
- FIG. 5 is a diagram showing the relationship between electrical impedance and contact depth of a layered electromagnetic composite material La 0.7 Sr 0.3 MnO 3 /PMN-PT of different thicknesses according to an embodiment of the present invention, wherein the irons of (a), (b), and (c)
- the magnetic layer La 0.7 Sr 0.3 MnO 3 has thicknesses of 200 nm, 400 nm, and 600 nm, respectively.
- 1-drive unit 2-contact unit; 3-monitoring unit; 4-control unit; 5-piezoelectric driver; 6-conducting voltage head; 7-electromagnetic functional material; 8-impedance measuring instrument; Displacement sensor; 10-data read and controller.
- a contact-based electrical impedance control experimental device provided by the present embodiment is provided by a PZT ceramic piezoelectric actuator 5, a voltage guiding head 6, an electromagnetic functional material 7, an impedance measuring instrument 8, and a capacitive precision displacement sensor. And the data reading is composed with the controller 10.
- the tip of the voltage guiding head 6 is spherical, and the radius of curvature of the spherical portion is 500 ⁇ m; the data reading and controller 10 causes the PZT ceramic piezoelectric actuator 5 to vertically extend, causing the voltage guiding head 6 to contact the electromagnetic functional material 7, and Adjusting the contact load size to regulate the electrical impedance of the electromagnetic functional material 7; the capacitive precision displacement sensor 9 measures the displacement of the contact process
- the impedance measuring instrument 8 is respectively connected with the guiding voltage head 6 and the electromagnetic functional material 7, and measures the electrical impedance change law of the electromagnetic functional material 7 under different contact loads.
- La 0.7 Sr 0.3 MnO 3 /PMN-PT a layered electromagnetic composite material with three thicknesses, was selected as the experimental material for electromagnetic function.
- the thickness of the ferromagnetic layer La 0.7 Sr 0.3 MnO 3 was 200 nm, 400 nm and 600 nm, respectively.
- the ferroelectric layer PMN The thickness of the -PT is 500 ⁇ m.
- the PZT ceramic piezoelectric actuator 5 is controlled to perform contact addition and unloading processes. During the contact loading process, the load is carried out at loads of 4, 8, 12, 16, 24, 32, 40 mN (corresponding contact deformation in the range of 18 to 80 nm), and the electrical impedance of the sample is measured, in seven kinds.
- the present invention provides an electrical impedance regulation method based on contact action.
- the precision displacement sensor 9 and the impedance measuring instrument 8 are used for testing and demonstrating that the electrical contact performance of the material can be controlled by local contact, and the impedance and the nanometer are given.
- the relationship between the contact depths of the stages may not include the precision displacement sensor 9 in actual device applications, and the impedance measuring instrument 8 may be replaced by a device that monitors other physical quantities. This is readily understood by those skilled in the art.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measurement Of Resistance Or Impedance (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Abstract
Description
Claims (10)
- 一种基于接触作用的电阻抗调控装置,包括驱动单元、接触单元、监测单元和控制单元,其中:接触单元用于接触待调控的电磁功能材料;监测单元用于测量电磁功能材料的阻抗信号,同时将阻抗信号传递给控制单元;驱动单元与接触单元固定连接;由控制单元根据监测单元测量的阻抗信号对驱动单元进行控制,使驱动单元对接触单元进行力学加载,促使接触单元接触电磁功能材料,并调控接触载荷大小,从而调控电磁功能材料的电阻抗。
- 如权利要求1所述的电阻抗调控装置,其特征在于,所述驱动单元是压电驱动器,所述压电驱动器与接触单元固定连接,同时与控制单元电连接。
- 如权利要求2所述的电阻抗调控装置,其特征在于,所述驱动单元是锆钛酸铅陶瓷压电驱动器或铌镁酸铅-钛酸铅单晶压电驱动器。
- 如权利要求1所述的电阻抗调控装置,其特征在于,所述接触单元是一导电压头,具有纳米级或微米级尺寸的球形或锥台形尖端。
- 如权利要求1所述的电阻抗调控装置,其特征在于,所述监测单元包括一阻抗测量仪,其通过两根导线分别与导电压头和电磁功能材料的底面电极进行连接。
- 如权利要求5所述的电阻抗调控装置,其特征在于,所述监测单元还包括一用于测量接触单元位移的精密位移传感器。
- 如权利要求6所述的电阻抗调控装置,其特征在于,所述精密位移传感器为电容式位移传感器,其组成电容传感器头的上下两个电容器极板分别固定在电阻抗调控装置的主体结构上和驱动单元的末端。
- 一种基于接触作用的电阻抗调控方法,利用权利要求1~7任一所述的电阻抗调控装置对交流电路阻抗匹配进行实时调控,包括以下步骤:1)在控制单元的控制下,由驱动单元对接触单元进行力学加载,使接触单元与交流电路中待调控的电磁功能材料产生接触作用;2)由监测单元实时监测所述电磁功能材料的阻抗信号;3)由控制单元根据监测单元测得的阻抗信号调整驱动单元的力学加载,从而调节接触单元对所述电磁功能材料的接触载荷大小,实现对所述电磁功能材料电阻抗的调节。
- 如权利要求8所述的电阻抗调控方法,其特征在于,所述方法是对层状电磁复合材料的电阻抗进行调控。
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PCT/CN2015/079148 WO2016183760A1 (zh) | 2015-05-18 | 2015-05-18 | 基于接触作用的电阻抗调控装置及方法 |
US15/533,121 US10084424B2 (en) | 2015-05-18 | 2015-05-18 | Device and a method for adjusting electrical impedance based on contact action |
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PCT/CN2015/079148 WO2016183760A1 (zh) | 2015-05-18 | 2015-05-18 | 基于接触作用的电阻抗调控装置及方法 |
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US20210174777A1 (en) * | 2019-12-05 | 2021-06-10 | Cirrus Logic International Semiconductor Ltd. | Methods and systems for estimating coil impedance of an electromagnetic transducer |
CN113933398B (zh) * | 2021-10-26 | 2024-03-15 | 中国石油化工股份有限公司 | 一种基于阻抗分析法的电磁超声传感器驱动优化方法 |
Citations (6)
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US4336496A (en) * | 1979-10-02 | 1982-06-22 | W. C. Heraeus Gmbh | Electrical contact test apparatus to test contact resistance of a sample terminal |
US20070080696A1 (en) * | 2005-10-11 | 2007-04-12 | Intel Corporation | Integrated circuit package resistance measurement |
CN101236220A (zh) * | 2008-03-07 | 2008-08-06 | 北京邮电大学 | 一种测试微动接触电阻的系统和方法 |
CN101236221A (zh) * | 2008-03-07 | 2008-08-06 | 北京邮电大学 | 一种精密定位测试接触电阻的方法及装置 |
CN201364363Y (zh) * | 2009-05-26 | 2009-12-16 | 北京东宝亿通科技股份有限公司 | 一种在线层间电阻测量系统 |
CN202794338U (zh) * | 2012-09-04 | 2013-03-13 | 东莞市华兰海电子有限公司 | 一种电化学腐蚀式应变计自动调阻装置 |
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2015
- 2015-05-18 WO PCT/CN2015/079148 patent/WO2016183760A1/zh active Application Filing
- 2015-05-18 US US15/533,121 patent/US10084424B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US4336496A (en) * | 1979-10-02 | 1982-06-22 | W. C. Heraeus Gmbh | Electrical contact test apparatus to test contact resistance of a sample terminal |
US20070080696A1 (en) * | 2005-10-11 | 2007-04-12 | Intel Corporation | Integrated circuit package resistance measurement |
CN101236220A (zh) * | 2008-03-07 | 2008-08-06 | 北京邮电大学 | 一种测试微动接触电阻的系统和方法 |
CN101236221A (zh) * | 2008-03-07 | 2008-08-06 | 北京邮电大学 | 一种精密定位测试接触电阻的方法及装置 |
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US20180076787A1 (en) | 2018-03-15 |
US10084424B2 (en) | 2018-09-25 |
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