WO2016172804A1 - Système de stéréolithographie amélioré - Google Patents

Système de stéréolithographie amélioré Download PDF

Info

Publication number
WO2016172804A1
WO2016172804A1 PCT/CA2016/050508 CA2016050508W WO2016172804A1 WO 2016172804 A1 WO2016172804 A1 WO 2016172804A1 CA 2016050508 W CA2016050508 W CA 2016050508W WO 2016172804 A1 WO2016172804 A1 WO 2016172804A1
Authority
WO
WIPO (PCT)
Prior art keywords
tank
stereolithography system
wettable material
bottom wall
optically transparent
Prior art date
Application number
PCT/CA2016/050508
Other languages
English (en)
Inventor
Diego CASTANON
Original Assignee
Fortier, Raymond
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/CA2015/050860 external-priority patent/WO2016172784A1/fr
Priority claimed from PCT/CA2016/050299 external-priority patent/WO2016172788A1/fr
Application filed by Fortier, Raymond filed Critical Fortier, Raymond
Publication of WO2016172804A1 publication Critical patent/WO2016172804A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/171—Processes of additive manufacturing specially adapted for manufacturing multiple 3D objects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images

Definitions

  • the present invention relates to a stereolithography system and, in particular, to a stereolithography system that is scaled to allow for the rapid formation of large objects or a plurality of large or small objects.
  • PCT Application Publication Number WO 2014/126837 to DiSimone et al discloses a method of forming a three-dimensional object.
  • the method comprises providing a carrier and an optically transparent member having a build surface.
  • the carrier and the build surface define a build region therebetween.
  • the build region is filled with a polymerizable liquid and the build region is irradiated through the optically transparent member to form a solid polymer from the polymerizable liquid while concurrently advancing the carrier away from the build surface to form the three-dimensional object from the solid polymer, while also concurrently: (i) continuously maintaining a dead zone of polymerizable liquid in contact with the build surface, and (ii) continuously maintaining a gradient of polymerization zone between the dead zone and the solid polymer and in contact with each thereof, the gradient of polymerization zone comprising the polymerizable liquid in partially cured form.
  • An apparatus for carrying out the method is also disclosed.
  • a stereolithography system comprising a carrier platform and a plurality of frame members which extend from the carrier platform.
  • a carriage is coupled to and able to reciprocate along the frame members.
  • There is a tank and an emitting device which are each mounted on the carriage such that the tank and the emitting device do not move relative to one another when the carriage reciprocates along the frame members.
  • the tank has an optically transparent bottom wall and the tank is disposed between the carrier platform and the emitting device.
  • the wettable material may be coated on the optically transparent bottom wall of the tank or the wettable material may overlay the optically transparent bottom wall of the tank.
  • the wettable material may include a hydrogel and, in certain examples, may include a hydrogel and hydrogen peroxide.
  • the wettable material may include a hydrogen donor and an oxygen scavenger.
  • the wettable material may include glycerin.
  • the wettable material may include a UV inhibitor.
  • the wettable material may have a superhydrophobic surface.
  • a nanostructure of the superhydrophobic surface of the wettable material may be a vertically aligned surface or a hierarchically structured surface, or a combination thereof.
  • a nanostructure of the superhydrophobic surface of the wettable material may include a plurality of projections which have a top diameter of between 5 microns and 15 microns and which are spaced less than 10 microns apart.
  • the wettable material may be adhered to the optically transparent bottom wall of the tank using adhesive applied in a pattern having intersecting lines.
  • the optically transparent bottom wall of the tank may have a thermal conductivity of greater than 20 W/(m x K) at 300K.
  • the optically transparent bottom wall of the tank may be sapphire glass.
  • the optically transparent bottom wall of the tank may be transparent ceramic spinel.
  • Figure 1 is a perspective view of an improved stereolithography system
  • Figure 2 is a perspective, fragmentary view of the stereolithography system of Figure 1 showing a resin tray and emitting device thereof;
  • Figure 3 is a perspective, fragmentary view of the stereolithography system of Figure 1 showing a drive mechanism thereof;
  • Figure 4A is a perspective, sectional view of a resin tray of the stereolithography system of Figure 1 ;
  • Figure 4B is an enlarged view of a surface area of a wettable material within the tank of the stereolithography system of Figure 1 ;
  • Figure 5 is a simplified schematic showing a gap between a wettable material on a bottom wall of the resin tray and a three-dimensional object being formed by the stereolithography system of Figure 1 ;
  • Figure 6 is a perspective, fragmentary view of the stereolithography system of Figure 1 showing a three-dimensional object starting to be formed by the stereolithography system
  • Figure 7 is a perspective, fragmentary view of the stereolithography system of Figure 1 showing a three-dimensional object being formed by the stereolithography system
  • Figure 8 is another perspective, fragmentary view of the stereolithography system of Figure 1 showing a three-dimensional object being formed by the stereolithography system;
  • Figure 9 is still another perspective, fragmentary view of the stereolithography system of Figure 1 showing a three-dimensional object being formed by the stereolithography system;
  • Figure 10 is a perspective view of the stereolithography system of Figure 1 showing a three-dimensional object formed by the stereolithography system;
  • Figure 11 is a perspective, fragmentary view of the stereolithography system of Figure 1 showing a plurality of three-dimensional objects being formed by the stereolithography system
  • Figure 12 is another perspective, fragmentary view of the stereolithography system of Figure 1 showing a plurality of three-dimensional objects being formed by the stereolithography system
  • Figure 13 is still another perspective, fragmentary view of the stereolithography system of Figure 1 showing a plurality of three-dimensional objects being formed by the stereolithography system;
  • Figure 14 is a perspective view of the stereolithography system of Figure 1 showing a plurality of three-dimensional objects being formed by the stereolithography system;
  • Figure 15 is a perspective view of the stereolithography system of Figure 1 showing a plurality of three-dimensional objects being formed by the stereolithography system with some of the three-dimensional objects harvested;
  • Figure 16 is a perspective view of the stereolithography system of Figure 1 showing a plurality of three-dimensional objects formed by the stereolithography system.
  • the stereolithography system 10 comprises a plurality of vertical frame members 12, 14, 16 and 18 which together support a top 20.
  • the top 20 is a planar quadrilateral member and the frame members 12, 14, 16 and 18 are each secured to a respective corner of the top 20.
  • the frame members 12, 14, 16 and 18 are also each provided with a respective foot 22, 24, 26 and 28 which provide stability to the stereolithography system 10.
  • the frame members 12, 14, 16 and 18 are each further provided with a respective one of tracks 42, 44, 46 and 48 which extends along a length thereof as best shown in Figure 2.
  • a carriage 50 which is mounted on the tracks 42, 44, 46 and 48 and is movable along the tracks.
  • Figure 3 shows one of the frame members 12 and a respective one of the tracks 42 in greater detail.
  • the tracks 42, 44, 46 and 48 are racks in this example.
  • Pinions, for example pinion 52 which are mounted on axles, for example axle 54, of the carriage 50 translate linearly along the racks, e.g. track 42. This allows the carriage 50 to reciprocate along a length of the frame members 12, 14, 16 and 18.
  • the carriage 50 is also coupled to each of the frame members by a respective linear guide, for example, Figure 3 shows the carriage 50 coupled to one of the frame members 12 by a respective linear guide 56. It will be understood by a person skilled in the art that the carriage is likewise coupled to the other frame members by linear guides.
  • the linear guides provide stability to the stereolithography system 10.
  • the carriage 50 supports an emitting device 60 and a tank 70.
  • the emitting device 60 and the tank 70 are each securely mounted to the carriage 50 such that the emitting device 60 and the tank 70 do not move relative to one another as the carriage 50 reciprocates along the length of the frame members 12, 14, 16 and 18.
  • the emitting device may be any suitable light-emitting device which may be used to cure a polymerizable resin.
  • the tank 70 as best shown in Figure 4A, has a bottom wall 72 which is optically transparent.
  • the tank 70 also has a plurality of side walls, for example, side walls 74, 76 and 78 which extend from the bottom wall 72 of the tank 70.
  • the tank 70 and, in particular, the bottom wall 72 of the tank 70 may be glass or another optically transparent material with a thermal conductivity of greater than 20 W/(m x K) at 300K.
  • a wettable material 80 at the bottom wall 72 of the tank 70 within the tank 70.
  • the wettable material 80 may overlay the bottom wall 72 of the tank 70, or the wettable material 80 may be coated on the bottom wall 72 of the tank 70, or the bottom wall 72 of the tank 70 may be formed from a wettable material.
  • the wettable material 80 may be any material that is capable of being wetted, i.e. retaining water.
  • the wettable material 80 may have a thickness of between 1 millimeter and 4 millimeters.
  • the wettable material 80 is a membrane that overlays the bottom wall 72 of the tank.
  • An optically transparent adhesive 82 such as an adhesive primer or a cyanoacrylate adhesive may be used to affix the wettable material 80 to the bottom wall 72 of the tank 70.
  • the wettable material 80 may be adhered to the bottom wall 72 of the tank 70 in a grid pattern as shown in Figure 4A. This allows the wettable material 80 to flex only within defined areas.
  • a similar result may be achieved by adhering the wettable material 80 in circular patterns or any other suitable pattern with intersecting lines.
  • the wettable material 80 may alternatively be affixed to the bottom wall 72 of the tank 70 by using a mould to cast the wettable material 80 in liquid form over the bottom wall 72 of the tank 70 then curing the wettable material 80 to affix the wettable material 80 to the bottom wall 72 of the tank 70. Still alternatively, in other examples, the wettable material 80 may be affixed to the bottom wall 72 of the tank 70 by applying a vacuum to a hollow interior of the bottom wall 72 of the tank 70 through a conduit.
  • Figure 4B shows the nanostructure of a surface of the wettable material 80.
  • the nanostructure of the surface of the wettable material 80 includes a plurality of projections in the form of truncated cones, for example projections 82a, 82b and 82c, which are spaced apart along the surface of the wettable material 80.
  • the projections 82a, 82b and 82c have a base diameter of between 10 microns and 20 microns and a top diameter of between 5 microns and 15 microns.
  • the projections 82a, 82b and 82c are spaced at less than 10 microns apart in this example.
  • the nanostructure of the surface of the wettable material 80 renders the surface of the wettable material 80 a superhydrophobic surface and may take alternative suitable forms in other examples.
  • the nanostructure of the surface of the wettable material 80 may be prepared by chemical treatment or laser sculpting or photolithography.
  • the nanostructure of the surface of the wettable material 80 may be a vertically aligned surface, or a hierarchically structured surface, or a combination thereof. It may still alternatively be possible to coat the nanostructure of the surface of the wettable material 80 with Teflon® or another hydrophobic material.
  • the wettable material 80 may be a hydrogel, e.g. silicone hydrogel, or any other suitable wettable material which results in a dead zone or a gap 84 at the interface between the wettable material 80 and resin 86 in the tank 70.
  • the gap 84 may be a result of intermolecular forces of repulsion between the wettable material 80 and the resin 86 in the tank 70 and/or the gap 84 may be the result of a layer of water which separates the wettable material 80 and the resin 86 because the resin and water are immiscible.
  • Figure 5 best shows the gap 84 between the wettable material 80 at the bottom wall 72 of the tank 70 and an object 110 being formed from the resin 86 in the tank 70.
  • the gap 84 allows the object 110 to be formed continuously because the object 110 is not formed directly on the bottom wall 72 of the tank 70, thereby doing away with the need for the object 110 to be peeled or pulled away from the bottom wall 72 of the tank 70.
  • the separation between the wettable material 80 and the resin 86 may be improved by adding glycerin to the wettable material 80 since glycerin is immiscible with the resin.
  • the separation between the wettable material 80 and the resin 86 may be further improved by adding a UV inhibitor and glycerin to the wettable material 80. Addition of the UV inhibitor and glycerin prevents the curing of a very thin layer of the resin 86 at the interface between the wettable material 80.
  • the wettable material 80 may further include a hydrogen donor and an oxygen scavenger which may be in the form of hydrogen peroxide or perfluorocarbons.
  • the concentrations of glycerin and UV inhibitor in the wettable material 80 depend on the type of resin being used.
  • the concentration of glycerin in the wettable material 80 may be as low as 1 % by volume for a hydrogel-based wettable material and as high as 95% by volume for a glycerin gel-based wettable material.
  • the concentration of UV inhibitor in the wettable material 80 may be between 0.5% by volume and 25% by volume. High reactive resins, which contain more photoinitiators, may require more glycerin and more UV inhibitor while low reactive resins, which contain less photoinitiators, may require less glyercine and less UV inhibitor.
  • the bottom wall 72 of the tank 70 from an optically transparent material with high thermal conductivity.
  • Sapphire glass which has a thermal conductivity of 25 W/ (m x K) at 300K, may be used to form the bottom wall 72 of the tank 70.
  • Transparent ceramic spinel which has a thermal conductivity of 25 W/ (m x K) at 300K, may also be used to form the bottom wall 72 of the tank 70.
  • FIG. 6 shows the object 110 starting to be formed using the stereolithography system 10.
  • the carriage 50 is disposed near the top 20 of the stereolithography system 10 which functions as a carrier platform.
  • the emitting device 60 emits a substantially continuous emission or blast of light 62 as the object 110 starts to be formed on the top 20 of the stereolithography system 10.
  • the object 110 is provided with a bore 112 which receives a support shaft 114 as best shown in Figure 7.
  • the support shaft 114 sits on the struts 32 and 36 to support the object 110 and prevent the object 110 from being peeled or pulled off the top 20 of the stereolithography system 10. This allows for large objects and/or heavy objects to be formed.
  • the object 110 may also be supported on the stereolithography system 10 by alternative means in other embodiments, for example, clamps or ties.
  • the tank may be filled with resin manually or by a pump system.
  • the carriage 50 then moves continuously and downwardly away from the top 20 of the stereolithography system 10 as the emitting device 60 emits the substantially continuous emission or blast of light 62 and the object 110 is formed continuously as shown in Figure 8 to 9. This process continues until the object 110 is fully formed as shown in Figure 10.
  • the gap 84, shown in Figure 5, between the bottom wall 72 of the tank 70 and the resin 86 in the tank 70 allows the object 110 to be formed continuously because the object 110 is not formed directly on the bottom wall 72 of the tank 70, thereby doing away with the need for the object 110 to be peeled or pulled away from the bottom wall 72 of the tank 70.
  • the stereolithography system 10 disclosed herein may also be scaled to allow for the rapid formation of large objects or a plurality of large objects.
  • the object 110 being formed is one of a plurality of blades for a wind turbine.
  • Figure 11 shows the stereolithography system 10 being used to form an object 120 that may later be broken up into a plurality of small objects, for example small objects 122a and 122b, which are individual soles for running shoes.
  • the object 120 is supported at various points along a length of the stereolithography system 10 by support means extending longitudinally along the frame members 12, 14, 16 and 18.
  • the object 120 is supported by a support shaft 124 which sits on the struts 32 and 36 to support the object 120 and prevent the object 120 from being peeled or pulled off the top 20 of the stereolithography system 10.
  • the support shaft 124 extends through a bore (not shown) in a support portion 126 of the object 120.
  • the carriage 50 then moves continuously and downwardly away from the top 20 of the stereolithography system 10 as the emitting device 60 emits the substantially continuous emission or blast of light 62 and the plurality of the small objects, for example smaller objects 120a and 120b, are formed in a linked arrangement until the tank 70 is aligned with the struts 30 and 34 as shown in Figure 12.
  • a support portion 128 of the object 120 is then formed. It will be understood by a person skilled in the art that the object 120 may be supported on the stereolithography system 10 by alternative means in other embodiments, for example, clamps or ties.
  • the support portion 128 of the object 120 has a bore 130, shown in Figure 12, which receives a support shaft 132 as best shown in Figure 13.
  • the support shaft 132 sits on the struts 30 and 34 to support the object 120.
  • the carriage 50 then moves continuously and downwardly away from the top 20 of the stereolithography system 10 as the emitting device 60 emits the substantially continuous emission or blast of light 62 and the plurality of the small objects, for example smaller objects 120c and 120d, are then formed in a linked arrangement as shown in Figure 14. This continues until earlier formed ones of the smaller objects 120a and 120b are harvested or removed from the stereolithography system 10 as shown in Figure 15. This is possible because the object 120 is supported at various points along a length of the stereolithography system 10 as described above. It is alternatively possible to not harvest or remove the smaller objects from the stereolithography system 10 until the process is completed as shown in Figure 16.
  • stereolithography systems as disclosed herein are used to continuously form an article that the stereolithography systems as disclosed herein may be used to form an article stepwise.

Abstract

La présente invention a trait à un système de stéréolithographie qui comprend une plateforme de support ainsi qu'une pluralité d'éléments cadres s'étendant depuis la plateforme de support. Un chariot est couplé aux éléments cadres, et il peut effectuer un mouvement de va-et-vient le long de ces éléments cadres. Un réservoir et un dispositif d'émission sont tous les deux montés sur le chariot, de telle sorte que le réservoir et le dispositif d'émission ne se déplacent pas l'un par rapport à l'autre lorsque le chariot effectue un mouvement de va-et-vient le long desdits éléments cadres. Le réservoir comporte une paroi inférieure optiquement transparente, et il est disposé entre la plateforme de support et le dispositif d'émission.
PCT/CA2016/050508 2015-04-30 2016-05-02 Système de stéréolithographie amélioré WO2016172804A1 (fr)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
US201562155246P 2015-04-30 2015-04-30
US62/155,246 2015-04-30
PCT/CA2015/050860 WO2016172784A1 (fr) 2015-04-30 2015-09-04 Système stéréolithographique amélioré
CAPCT/CA2015/050860 2015-09-04
US201562261471P 2015-12-01 2015-12-01
US62/261,471 2015-12-01
US201662275175P 2016-01-05 2016-01-05
US62/275,175 2016-01-05
CAPCT/CA2016/050299 2016-03-17
PCT/CA2016/050299 WO2016172788A1 (fr) 2015-04-30 2016-03-17 Système de stéréolithographie amélioré

Publications (1)

Publication Number Publication Date
WO2016172804A1 true WO2016172804A1 (fr) 2016-11-03

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CA2016/050508 WO2016172804A1 (fr) 2015-04-30 2016-05-02 Système de stéréolithographie amélioré

Country Status (1)

Country Link
WO (1) WO2016172804A1 (fr)

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WO2018064774A1 (fr) * 2016-10-05 2018-04-12 Forcast Research & Development Corp. Système stéréolithographique amélioré
WO2019083833A1 (fr) 2017-10-23 2019-05-02 Carbon, Inc. Correction de variabilité de fenêtre dans une fabrication additive
US10328634B2 (en) 2015-10-02 2019-06-25 NEXA3D Inc. Light engines for photo-curing of liquid polymers to form three-dimensional objects
WO2019222094A1 (fr) 2018-05-14 2019-11-21 Carbon, Inc. Appareil de stéréolithographie comportant des matrices individuellement adressables de sources de lumière
WO2020117490A1 (fr) 2018-12-03 2020-06-11 Carbon, Inc. Étalonnage de profil thermique de fenêtre dans la fabrication additive
WO2020146092A1 (fr) 2019-01-09 2020-07-16 Carbon, Inc. Systèmes et appareils de fabrication additive avec mise à jour et verrouillage de processus
US10967573B2 (en) 2019-04-02 2021-04-06 NEXA3D Inc. Tank assembly and components thereof for a 3D printing system
US11167473B2 (en) 2019-03-18 2021-11-09 NEXA3D Inc. System for additive manufacture
US11203156B2 (en) 2018-08-20 2021-12-21 NEXA3D Inc. Methods and systems for photo-curing photo-sensitive material for printing and other applications
US11220055B2 (en) 2018-11-09 2022-01-11 NEXA3D Inc. Three-dimensional printing system
US11413819B2 (en) 2020-09-03 2022-08-16 NEXA3D Inc. Multi-material membrane for vat polymerization printer
US11982991B2 (en) 2019-12-13 2024-05-14 Carbon, Inc. Systems and apparatuses for additive manufacturing with process update and lock down

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CA2898098A1 (fr) * 2013-02-12 2014-08-21 Carbon3D, Inc. Procede et appareil pour fabrication en trois dimensions
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CA2898103A1 (fr) * 2013-02-12 2014-08-21 Carbon3D, Inc. Procede et appareil pour fabrication tridimensionnelle avec support de traversee
CA2898098A1 (fr) * 2013-02-12 2014-08-21 Carbon3D, Inc. Procede et appareil pour fabrication en trois dimensions
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Publication number Priority date Publication date Assignee Title
US10328634B2 (en) 2015-10-02 2019-06-25 NEXA3D Inc. Light engines for photo-curing of liquid polymers to form three-dimensional objects
US10357919B2 (en) 2015-10-02 2019-07-23 NEXA3D Inc. Method and apparatus for photo-curing with self-lubricating substratum for the formation of three-dimensional objects
US11260579B2 (en) 2015-10-02 2022-03-01 NEXA3D Inc. Methods for photo-curing with displaceable self-lubricating substratum for the formation of three-dimensional objects
WO2018064774A1 (fr) * 2016-10-05 2018-04-12 Forcast Research & Development Corp. Système stéréolithographique amélioré
WO2019083833A1 (fr) 2017-10-23 2019-05-02 Carbon, Inc. Correction de variabilité de fenêtre dans une fabrication additive
WO2019222094A1 (fr) 2018-05-14 2019-11-21 Carbon, Inc. Appareil de stéréolithographie comportant des matrices individuellement adressables de sources de lumière
US11865768B2 (en) 2018-08-20 2024-01-09 NEXA3D Inc. Methods for photo-curing photo-sensitive material for printing and other applications
US11203156B2 (en) 2018-08-20 2021-12-21 NEXA3D Inc. Methods and systems for photo-curing photo-sensitive material for printing and other applications
US11220055B2 (en) 2018-11-09 2022-01-11 NEXA3D Inc. Three-dimensional printing system
US11498274B2 (en) 2018-12-03 2022-11-15 Carbon, Inc. Window thermal profile calibration in additive manufacturing
WO2020117490A1 (fr) 2018-12-03 2020-06-11 Carbon, Inc. Étalonnage de profil thermique de fenêtre dans la fabrication additive
WO2020146092A1 (fr) 2019-01-09 2020-07-16 Carbon, Inc. Systèmes et appareils de fabrication additive avec mise à jour et verrouillage de processus
US11167473B2 (en) 2019-03-18 2021-11-09 NEXA3D Inc. System for additive manufacture
US11559945B2 (en) 2019-04-02 2023-01-24 NEXA3D Inc. Membrane assembly for a 3D printing system
US10967573B2 (en) 2019-04-02 2021-04-06 NEXA3D Inc. Tank assembly and components thereof for a 3D printing system
US11982991B2 (en) 2019-12-13 2024-05-14 Carbon, Inc. Systems and apparatuses for additive manufacturing with process update and lock down
US11413819B2 (en) 2020-09-03 2022-08-16 NEXA3D Inc. Multi-material membrane for vat polymerization printer

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