WO2016152449A1 - Brush for cleaning sunlight reflecting mirror, and cleaning system, cleaning method and cleaning apparatus for sunlight reflecting mirror - Google Patents

Brush for cleaning sunlight reflecting mirror, and cleaning system, cleaning method and cleaning apparatus for sunlight reflecting mirror Download PDF

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Publication number
WO2016152449A1
WO2016152449A1 PCT/JP2016/056700 JP2016056700W WO2016152449A1 WO 2016152449 A1 WO2016152449 A1 WO 2016152449A1 JP 2016056700 W JP2016056700 W JP 2016056700W WO 2016152449 A1 WO2016152449 A1 WO 2016152449A1
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WO
WIPO (PCT)
Prior art keywords
brush
cleaning
mirror
solar reflective
reflective mirror
Prior art date
Application number
PCT/JP2016/056700
Other languages
French (fr)
Japanese (ja)
Inventor
工藤 一良
篤志 齋藤
Original Assignee
コニカミノルタ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by コニカミノルタ株式会社 filed Critical コニカミノルタ株式会社
Publication of WO2016152449A1 publication Critical patent/WO2016152449A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/30Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24SSOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S23/00Arrangements for concentrating solar-rays for solar heat collectors
    • F24S23/70Arrangements for concentrating solar-rays for solar heat collectors with reflectors
    • F24S23/74Arrangements for concentrating solar-rays for solar heat collectors with reflectors with trough-shaped or cylindro-parabolic reflective surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/30Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/36Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis orthogonal to the surface
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24SSOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S23/00Arrangements for concentrating solar-rays for solar heat collectors
    • F24S23/70Arrangements for concentrating solar-rays for solar heat collectors with reflectors
    • F24S23/82Arrangements for concentrating solar-rays for solar heat collectors with reflectors characterised by the material or the construction of the reflector
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24SSOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S40/00Safety or protection arrangements of solar heat collectors; Preventing malfunction of solar heat collectors
    • F24S40/20Cleaning; Removing snow
    • AHUMAN NECESSITIES
    • A46BRUSHWARE
    • A46BBRUSHES
    • A46B13/00Brushes with driven brush bodies or carriers
    • A46B13/02Brushes with driven brush bodies or carriers power-driven carriers
    • AHUMAN NECESSITIES
    • A46BRUSHWARE
    • A46BBRUSHES
    • A46B5/00Brush bodies; Handles integral with brushware
    • AHUMAN NECESSITIES
    • A46BRUSHWARE
    • A46BBRUSHES
    • A46B7/00Bristle carriers arranged in the brush body
    • A46B7/06Bristle carriers arranged in the brush body movably during use, i.e. the normal brushing action causing movement
    • A46B7/08Bristle carriers arranged in the brush body movably during use, i.e. the normal brushing action causing movement as a rotating disc
    • AHUMAN NECESSITIES
    • A46BRUSHWARE
    • A46DMANUFACTURE OF BRUSHES
    • A46D1/00Bristles; Selection of materials for bristles
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47LDOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L11/00Machines for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L11/38Machines, specially adapted for cleaning walls, ceilings, roofs, or the like
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24HEATING; RANGES; VENTILATING
    • F24SSOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S80/00Details, accessories or component parts of solar heat collectors not provided for in groups F24S10/00-F24S70/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/40Solar thermal energy, e.g. solar towers

Definitions

  • the present invention relates to a solar reflective mirror cleaning brush, a solar reflective mirror cleaning system, a cleaning method, and a cleaning device. More specifically, the present invention relates to a solar reflective mirror cleaning brush and the like that can be uniformly cleaned with high cleaning power without damaging the solar reflective mirror.
  • Known solar power generation devices include solar cells that directly convert sunlight into electric power, solar thermal power generation devices that use sunlight reflecting mirrors to collect sunlight and generate the resulting heat as a medium. It has been. Since the solar thermal power generation device can store heat, it can generate power regardless of day or night. From a long-term viewpoint, the power generation efficiency of the solar thermal power generation device is higher than that of the solar cell, and sunlight can be used effectively.
  • Solar thermal power generation devices are often used in desert areas, and dirt such as dust tends to adhere to the sunlight reflecting mirrors installed outdoors.
  • dirt derived from dust in a desert area is different from ordinary dirt, and forms a strong sand film and is easily fixed to the mirror surface of the sunlight reflecting mirror.
  • This is thought to be one of the causes of condensation on the surface in a desert area where the temperature difference between day and night is large.
  • dust-derived substances accumulated on the surface for example, NaCl, CaCO 3 , SiO 2, etc.
  • pollutants in the atmosphere for example, SiO x, etc.
  • a solar reflection mirror having an excellent surface antifouling property has been proposed.
  • a solar reflective mirror that includes a layer containing a photocatalyst on the outermost surface of the solar reflective mirror and decomposes the attached organic matter has been proposed (see, for example, Patent Document 1).
  • a solar reflective mirror is also proposed in which a hydrophilic layer containing a hydrophilic polymer, a metal alkoxide compound, and colloidal silica is provided on the surface of the solar reflective mirror and can be easily cleaned (see, for example, Patent Document 2). ).
  • the present invention has been made in view of the above-described problems and situations, and the problem to be solved is a solar reflective mirror cleaning brush that can be cleaned uniformly with high cleaning power without damaging the solar reflective mirror, the sun To provide a cleaning system, a cleaning method, and a cleaning apparatus for a light reflecting mirror.
  • the present inventor has a distance adjustment mechanism and an angle adjustment mechanism in the process of examining the cause of the above problem, etc., so that the distance and angle between the mirror surface and the brush hair can be adjusted, It has been found that the angle between the brush hair and the mirror surface, the deterioration state of the brush hair, and the unevenness of the road surface are not affected, and the solar reflective mirror can be washed uniformly without damaging it.
  • the present invention has been reached. That is, the said subject which concerns on this invention is solved by the following means.
  • a brush for cleaning a sunlight reflecting mirror that cleans the mirror surface by rotating in contact with the mirror surface of the sunlight reflecting mirror, A rotatable brush substrate; A plurality of brush bristles provided on the brush substrate and rotating with the rotation of the brush substrate; and A brush for cleaning a sunlight reflecting mirror, comprising a distance adjusting mechanism and an angle adjusting mechanism for adjusting a distance and an angle between the mirror surface and the brush bristles.
  • the urging mechanism is at least one selected from a spring, rubber, a balloon, and a damper.
  • the distance adjusting mechanism or the angle adjusting mechanism is located between the brush substrate and the brush bristles, for cleaning a solar reflective mirror according to any one of claims 1 to 3. brush.
  • the distance adjustment mechanism or the angle adjustment mechanism is provided on a surface of the brush substrate opposite to the brush bristles, according to any one of the first to fourth items. Brush for cleaning sunlight reflecting mirrors.
  • the solar reflective mirror cleaning brush according to any one of items 1 to 7, And a means for rotating the solar reflective mirror cleaning brush in contact with the mirror surface of the solar reflective mirror.
  • a method for cleaning a solar reflective mirror wherein the mirror surface of the solar reflective mirror is cleaned with a brush, The plurality of brush hairs and sunlight reflection while rotating the solar reflective mirror cleaning brush according to any one of items 1 to 7 in contact with a mirror surface of the solar reflective mirror
  • a method for cleaning a solar reflective mirror wherein the mirror surface is cleaned by adjusting a distance and an angle with the mirror.
  • a solar reflective mirror cleaning apparatus comprising the solar reflective mirror cleaning brush according to any one of items 1 to 7.
  • the solar reflection mirror cleaning brush, the solar reflection mirror cleaning system, the cleaning method, and the cleaning device that can be uniformly cleaned with high cleaning power without damaging the solar reflection mirror by the above-described means of the present invention. Can be provided.
  • the expression mechanism or action mechanism of the effect of the present invention is not clear, but is presumed as follows.
  • a bristle having a wire diameter of about 0.7 to 1.3 mm ⁇ is implanted in a brush substrate with a length of about 300 to 500 mm.
  • a conventional solar reflective mirror cleaning apparatus such a brush is mounted on a cleaning vehicle via a robot arm, and the entire brush arm is pushed to remove the brush hair from the surface of the solar reflective mirror (hereinafter referred to as “mirror”). Cleaning is performed by applying a shearing force to the mirror surface by the brush bristles by rotating the brush substrate in contact with the surface.
  • the conventional cleaning method using a brush cannot individually adjust the contact state (that is, distance, angle, etc.) between the brush hair and the mirror surface for each brush. For this reason, when using brushes with different deterioration states at the same time, such as when using a new brush and an old brush, there is a problem in that defective cleaning tends to occur partially and the mirror surface cannot be cleaned uniformly.
  • the conventional brush may cause scratches on the mirror surface when it is cleaned while moving the position of the brush in contact with the mirror surface at a speed greater than 1.0 km / h in the lateral direction of the sunlight reflecting mirror. It was.
  • the angle and distance between the brush bristles and the mirror surface against which the bristles come into contact depends on the position of the brush because of the parabolic shape (parabolic concave surface). Different. For this reason, it was difficult to press the bristles uniformly against the mirror surface for cleaning, and it was further found that the solar reflective mirror might be damaged.
  • the present inventors introduce a mechanism for adjusting the distance and angle between the brush bristles and the mirror surface against which the bristles come into contact with the solar reflective mirror cleaning brush (hereinafter also simply referred to as “brush”).
  • the distance and the contact angle can be adjusted for each brush.
  • the change in the distance between the brush bristles and the mirror surface can be reduced, so even if the distance between the mirror surface and the robot arm changes due to the unevenness of the road surface, it is not affected by it, and the entire mirror surface is highly clean. It has been found that a brush that can be cleaned uniformly can be provided.
  • Such a brush of the present invention has the following effects.
  • the contact state can be adjusted for each brush. Therefore, it is possible to use a new brush and an old brush in combination, and it is not affected by the difference in the deterioration state of the brush hair. As a result, the life of the bristles (the usable period) can be extended. Furthermore, even when cleaning parabolic trough solar reflective mirrors, the angle can be adjusted for each brush, so it is not affected by changes in the angle between the brush bristles and the mirror surface as the brush rotates, and is uniform with high cleaning power. Can be cleaned.
  • the brush bristles can be uniformly pressed against the mirror surface for cleaning regardless of the position of the brush mounted on the robot arm. It is possible to clean evenly with cleaning power.
  • the brush bristles are suitably spread, the contact area with the mirror surface is increased, so that it is possible to suppress a large force from being applied to a part, and as a result, it is possible to suppress damage to the mirror. For this reason, since the position of the brush contacting the mirror surface can be cleaned while moving in the horizontal direction at a speed greater than 1.0 km / h, it is efficient.
  • the reflectance of a solar reflective mirror can be kept favorable by using the brush for washing
  • the solar thermal power generation apparatus having the solar reflective mirror that is cleaned by the brush of the present invention maintains good reflectivity, so that the amount of power generation increases and, consequently, the power generation cost decreases.
  • cleaning liquids, such as water, reduces, and it can reduce the maintenance cost of a solar thermal power generation apparatus, and is preferable.
  • the solar reflective mirror cleaning brush of the present invention is a solar reflective mirror cleaning brush for cleaning the mirror surface by rotating in contact with the mirror surface of the solar reflective mirror, and a rotatable brush substrate And a plurality of brush bristles provided on the brush substrate and rotating as the brush substrate rotates, and a distance for adjusting a distance and an angle between the mirror surface and the brush bristles An adjustment mechanism and an angle adjustment mechanism are provided. This feature is a technical feature common to the inventions according to claims 1 to 13.
  • the distance adjusting mechanism or the angle adjusting mechanism is an urging mechanism because the effect can be suitably expressed.
  • at least one selected from a spring, rubber, balloon and damper is preferable.
  • the distance adjustment mechanism or the angle adjustment mechanism can be more precisely adjusted in distance and angle so that the distance and angle are between the brush substrate and the brush bristles. It is preferable because it can be expressed.
  • the distance adjusting mechanism or the angle adjusting mechanism is provided on the surface of the brush substrate on the side opposite to the brush bristles because the effect can be suitably exhibited.
  • the average diameter of the plurality of brush bristles is in the range of 1 ⁇ m to 1 mm because high detergency can be obtained without damaging the mirror surface.
  • the plurality of brush hairs are made of hydrophilic fiber hairs because they can be highly washed without damaging the mirror surface.
  • the solar reflective mirror cleaning brush of the present invention can be suitably used in a solar reflective mirror cleaning system having means for rotating the solar reflective mirror in contact with the mirror surface of the solar reflective mirror.
  • the brush for cleaning the solar reflective mirror of the present invention adjusts the distance and angle between the plurality of brush hairs and the solar reflective mirror while rotating the brush in contact with the mirror surface of the solar reflective mirror.
  • it can be suitably employed in a method for cleaning a sunlight reflecting mirror that cleans the mirror surface.
  • the solar reflective mirror cleaning brush of the present invention can be suitably used in a solar reflective mirror cleaning device.
  • the solar reflective mirror cleaning system, the solar reflective mirror cleaning method, and the solar reflective mirror cleaning apparatus employing the solar reflective mirror cleaning brush of the present invention are suitable for a film mirror type solar reflective mirror. Applicable to.
  • is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
  • FIG. 1 is a bottom view of the solar reflective mirror cleaning brush 10 of the present embodiment.
  • FIG. 2 is a partial sectional view taken along line XX of FIG.
  • the solar reflective mirror cleaning brush 10 includes a rotatable brush substrate 1 and an attachment device 4 provided on the brush substrate 1.
  • the attachment device 4 may be integrally formed of the same material as the brush substrate 1 as in the example of FIG. 5 described later, but the distance adjustment mechanism and the angle adjustment mechanism 41 as in the example of FIG. It may be provided on the brush substrate 1 via other members.
  • the attachment device 4 includes a plurality of brush bristles 2 that rotate as the brush substrate 1 rotates.
  • the solar reflective mirror cleaning brush of the present invention can clean the mirror surface by rotating in contact with the mirror surface of the solar reflective mirror.
  • the brush substrate 1 is formed in a circular shape as shown in FIG. 1, and a circular hole 11 for attaching a shaft is provided at the rotation center C of the brush substrate 1 as shown in FIG.
  • a compression coil spring or a damper which will be described later, is attached to the circular hole 11, and the compression coil spring or A shaft may be attached to the damper.
  • the material of the brush substrate 1 is not particularly limited, and can be formed of wood, metal, hard synthetic resin, or the like. If it is lightweight and sufficient strength can be obtained, it can be used without particular limitation.
  • synthetic resins that can be used include vinyl chloride resin, polypropylene resin, ABS resin (acrylonitrile butadiene styrene resin) and the like.
  • the plurality of brush bristles 2 may be provided not only on the entire surface of the brush substrate 1 but also on the entire surface via the attachment device 4.
  • the brush hair 2 is improved from the viewpoint of improving rotational stability, cleaning uniformity, and the like.
  • the plurality of aggregates G are preferably arranged at regular intervals in the rotation direction of the bristles 2 as in the arrangement pattern shown in FIG.
  • the plurality of brush bristles 2 may be individually planted on the attachment device 4 or may be planted as a bunch of hair bundled with a plurality of brush bristles 2.
  • bristles it is preferable because the bristle 2 having high elasticity and hardly falls down can be obtained, and stress necessary for cleaning can be easily transmitted to the mirror surface.
  • FIG. 3 shows a planting portion of the attachment device 4 in which a plurality of brush bristles 2 are planted as a hair bundle 21.
  • the bristle bundle 21 has a plurality of brush bristles 2 bent at the center in the length direction, and a stopper 22 is wound around the bent portion and bundled.
  • the hair bundle 21 is planted by pushing the bent portion into the planting hole 13 provided in the attachment device 4.
  • the stopper 22 of the hair bundle 21 bites into the attachment device 4, and the hair bundle 21 is fixed to the attachment device 4.
  • the stopper 22 is preferably made of a metal such as stainless steel from the viewpoint of firmly fixing the hair bundle 21 and preventing deterioration due to rust or the like.
  • the vicinity of the base of the brush hair 2 can be bundled with a band.
  • the bristle 2 which has high elasticity and is hard to fall down can be obtained, and the cleaning power can be increased.
  • the bristle bundle 21 is provided on the brush substrate 1 by the attachment device 4, as shown in FIG. 2, by providing a distance adjustment mechanism and an angle adjustment mechanism 41 between the attachment device 4 and the brush substrate 1, the mirror surface It is good also as adjusting the distance and angle of the brush hair 2.
  • the plurality of brush bristles 2 preferably have a wire diameter in the range of 1 ⁇ m to 1 mm in both monofilament and multifilament. Within this range, high cleaning power can be obtained without damaging the mirror surface.
  • the average diameter of the brush bristles 2 can be measured by observing with a digital microscope VH-5500 (manufactured by KEYENCE). Generally, since the thickness of the fiber varies depending on the location, the average value of the measured values obtained by measuring the measurement position arbitrarily, for example, at 500 locations, may be used as the average diameter of the brush bristles 2.
  • the plurality of brush bristles 2 preferably exhibit hydrophilicity when using water or a cleaning liquid containing water as a main component (hereinafter also simply referred to as “cleaning liquid”).
  • cleaning liquid water or a cleaning liquid containing water as a main component
  • the brush bristles 2 exhibiting hydrophilicity can wet and spread the supplied water or a cleaning liquid containing water as a main component on the surface of the brush bristles 2.
  • dirt on the mirror surface can be effectively removed by the cleaning liquid wet on the surface of the brush bristles 2, and the cleaning power is increased.
  • the hydrophilicity of the brush bristles 2 can be evaluated by an official moisture content measured in accordance with JIS L0105 4.1.
  • the official moisture content measured in the standard state temperature 20 ⁇ 2 ° C., relative humidity 65 ⁇ 4%) in accordance with JIS L0105 is 1% or more. High detergency can be obtained.
  • the hydrophilicity of the brush bristles 2 can also be evaluated by measuring the contact angle of a film or sheet-like sample produced using the material of the bristles 2 with respect to water. Specifically, in accordance with JIS-R3257, 3 ⁇ L of water was dropped on a film or sheet sample in an environment of a temperature of 23 ° C. and a relative humidity of 55% RH, and a contact angle meter DM- after 30 seconds. 300 (manufactured by Kyowa Interface Science Co., Ltd.) can be used for measurement. It shows that hydrophilic property is so high that the measured contact angle is small. When the hydrophilicity of the brush bristles 2 is evaluated based on the contact angle with water, a high detergency can be obtained when the contact angle measured by the measurement method is 70 ° or less.
  • hydrophilic fiber hair can be used.
  • the fiber hair which has a hydrophilic group may be used, and the fiber hair which has a hydrophilic surface layer by hydrophilic treatment can also be used.
  • the hydrophilic group include a hydroxy group, an amino group, an amide group, a carboxy group, and an ether group that can form a hydrogen bond with a water molecule, and two or more of these groups can be combined.
  • the bristle 2 has a water absorptivity
  • the fiber hair which has a water absorptivity can be used.
  • the fiber bristles having water absorption can once absorb the supplied cleaning liquid and supply the cleaning liquid absorbed during the cleaning onto the mirror surface. Having water absorption means that the water absorption obtained by the following formula is 0.25% or more in accordance with (Method A) of JIS K 7209.
  • W1 represents the mass (mg) of the dried fiber hair sample before being immersed in water
  • W2 is the mass of the fiber hair sample after being immersed in water at a temperature of 23 ⁇ 1 ° C. for 23 to 24 hours. (Mg).
  • Examples of the fiber hair having hydrophilicity and water absorption include animal fiber hair, plant fiber hair, chemical fiber hair, and the like, and a plurality of types of fiber hair can be used in combination.
  • Animal fibers or chemical fibers are preferable from the viewpoint of durability, and chemical fibers are preferable from the viewpoint of quality stability.
  • the animal fiber hair is not particularly limited, and examples thereof include horse hair and pig hair. Although there is no restriction
  • synthetic fiber hair synthetic fiber hair made of, for example, polyvinylon, polyvinyl chloride (PVC), polypropylene (PP), etc., polyester (polyethylene (PE), polyethylene terephthalate, etc.), nylon (polyamide), acrylic, etc. And semi-synthetic fiber hairs made from cellulose, cellulose ester and the like.
  • nylon such as nylon 6 and nylon 66 (manufactured by Toray Industries, Inc.) is preferable.
  • Nylon has moderate hygroscopicity derived from amide bonds, easy to orient molecular chains consisting of long-chain fatty acids of moderate length on the fiber axis, relatively good stretchability, high heat of fusion and high heat capacity.
  • properties of nylon such as repetitive bending and elongation, such as the property of being difficult to fibrillate and forming a king band due to the formation of hydrogen bonds between amide bonds, can be used as the brush bristles 2.
  • the distance adjustment mechanism and the angle adjustment mechanism are mechanisms for adjusting the distance and angle between the mirror surface and the brush bristles.
  • the distance adjustment mechanism and the angle adjustment mechanism 41 of the present invention urges the plurality of brush bristles 2 that rotate with the rotation of the brush substrate to press the mirror surface when cleaning the mirror surface. And the distance and angle between the brush bristles 2 are adjusted. Thereby, the bristle 2 can be urged
  • the bristles 2 can be urged and pressed to the mirror surface in finer units. Specifically, for example, by providing a distance adjustment mechanism or an angle adjustment mechanism between the brush substrate 1 and the attachment device 4, the brush bristles 2 can be urged and pressed against the mirror surface for each attachment device 4. .
  • the brush bristles 2 can be pushed more strongly against the mirror surface and expanded in units of brushes or less.
  • the cleaning area of the brush is not affected by the presence or absence of unevenness on the road surface or the position where it is mounted on the robot arm, and it can be cleaned uniformly with high cleaning power.
  • the position of the distance adjusting mechanism or the angle adjusting mechanism provided in the brush of the present invention is not particularly limited as long as the effect expression is not hindered.
  • the position opposite to the brush bristles 2 is used. Although it may be provided on the surface, it is preferably between the brush substrate 1 and the brush bristles 2.
  • the distance adjusting mechanism and the angle adjusting mechanism 41 are not particularly limited as long as the adjustment can be performed, but it is preferable to be an urging mechanism that urges the brush.
  • Such an urging mechanism is not particularly limited, but is a mechanism that uses at least one urging member selected from a spring, rubber, a balloon, and a damper, and urges the bristles 2 during cleaning. May be.
  • Known springs can be used, and examples thereof include a compression coil spring, a leaf spring, and a torsion spring.
  • a known device such as a device having an elastic body that reduces impact and vibration can be used.
  • a pneumatic spring, a hydraulic spring, a gas spring having nitrogen gas, or the like can be suitably employed.
  • the rubber a known rubber can be used, and the shape is not particularly limited as long as it can bias the plurality of brush bristles 2 against the mirror surface. It may be.
  • the distance adjusting mechanism and the angle adjusting mechanism 41 according to the present invention may be used by using one type of the urging member, or the distance adjusting mechanism and the angle adjusting mechanism 41 may be combined with two or more types.
  • FIG. 4 to 6 are examples of brushes in which the brush bristles 2 are provided on the entire surface of the brush substrate 1.
  • FIG. 1 is a diagrammatic representation of brushes in which the brush bristles 2 are provided on the entire surface of the brush substrate 1.
  • a plurality of compression coil springs that can expand and contract in the direction of the rotation axis of the brush substrate 1 are provided between the attachment device 4 and the brush substrate 1 (that is, between the brush substrate 1 and the brush bristles 2).
  • the attachment device 4 is attached to the brush substrate 1 through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
  • the compression coil spring is the distance adjustment mechanism and the angle adjustment mechanism 41. Specifically, when the compression coil spring expands and contracts in the direction of the rotation axis of the brush substrate 1, the brush bristles 2 are urged and pressed against the mirror surface via the attachment device 4, and the mirror surface and the bristles 2 are pressed. And adjust the distance and angle.
  • reference numerals 101 and 1015 denote a rotation driving unit 101 and an arm substrate 1015, which will be described later.
  • FIG. 5 is an example of a brush in which one compression coil spring used in FIG. 4 is provided on the surface of the brush substrate 1 opposite to the brush bristles 2.
  • the brush substrate 1 is attached to a cleaning device (a substrate included in a cleaning device described later in the illustrated example) through the compression coil spring so as to reciprocate in the direction of the rotation axis of the brush substrate 1.
  • the compression coil spring is the distance adjustment mechanism and the angle adjustment mechanism 41. Specifically, when the compression coil spring expands and contracts in the direction of the rotation axis, the brush bristles 2 are urged and pressed against the mirror surface via the brush substrate 1, and the distance between the mirror surface and the brush bristles 2 is Adjust the angle.
  • FIG. 6 shows that the compression coil spring used in FIG. 4 can be expanded and contracted in the direction of the rotation axis of the brush substrate 1, and a plurality of attachment devices 4 and the brush substrate 1 are opposite to the brush bristles 2 in the brush substrate 1. It is an example of the brush provided one by the side surface.
  • the attachment device 4 is attached to the brush substrate 1 through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
  • the brush substrate 1 is attached to a cleaning device (a substrate included in a cleaning device described later in the illustrated example) through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
  • 7 to 9 are examples of a brush having four aggregates G of brush bristles 2 as shown in FIG.
  • FIG. 7 is an example of a brush in which a plurality of compression coil springs similar to those in FIG. 4 are provided between each attachment device 4 and the brush substrate 1.
  • Each attachment device 4 is attached to the brush substrate 1 through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
  • the compression coil spring is the distance adjustment mechanism and the angle adjustment mechanism 41.
  • a compression coil spring provided in each attachment device 4 expands and contracts in the direction of the rotation axis of the brush substrate 1. Thereby, the brush hair 2 can be urged
  • FIG. 8 is the same as FIG. 5 except that the brush bristles 2 are partially provided, not the entire surface of the brush substrate 1, via the attachment device 4.
  • FIG. 9 shows that two compression coil springs used in FIG. 4 are provided between each attachment device 4 and the brush substrate 1, one on the surface of the brush substrate 1 opposite to the brush bristles 2.
  • This is an example of a brush.
  • the attachment device 4 is attached to the brush substrate 1 through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
  • the brush substrate 1 is attached to a cleaning device (a substrate included in a cleaning device described later in the illustrated example) through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
  • a plate spring may be used instead of the compression coil spring.
  • the attachment device 4 and the brush substrate in FIGS. 1 is changed to a leaf spring which can be elastically deformed in the direction of the arrow with the brush substrate 1 side as a fixed end. It is good also as what adjusts the distance and angle of a mirror surface and the bristle 2 by energizing and pressing.
  • a hinge with a torsion spring as shown in FIGS. 12 and 13 is provided between the leaf spring and the mounting device 4, and the elasticity of the leaf spring and the elasticity of the torsion spring are provided.
  • the brush bristles 2 may be urged against the mirror surface and pressed to adjust the distance and angle between the mirror surface and the brush bristles 2.
  • the hinge with a torsion spring fixes the attachment device 4 at an arbitrary angle by a hinge when not washed, and urges the brush bristles 2 against the mirror surface by the elastic force of the torsion spring at the time of washing. It is preferable to press.
  • the hinge with the torsion spring is changed to only the hinge, and at the time of cleaning, the angle between the mirror surface and the brush bristles 2 is adjusted by the hinge, and the leaf spring
  • the brush bristles 2 may be urged against the mirror surface and pressed to adjust the distance and angle between the mirror surface and the bristles 2.
  • the distance adjustment mechanism and the angle adjustment mechanism 41 provided on the surface of the brush substrate 1 opposite to the brush bristles 2 use compression coil springs.
  • a damper that can bend and stretch in the direction of the rotation axis of the brush substrate 1 may be used.
  • FIG. 15 shows an example in which a damper is used instead of the compression coil spring in the example shown in FIG.
  • FIG. 16 is an example in which a hinge as shown in FIG. 14 is further provided in the example shown in FIG.
  • the distance adjusting mechanism and the angle adjusting mechanism 41 urge the brush bristles 2 according to the reaction force from the mirror surface received through the bristles 2 during cleaning.
  • the distance and angle between the mirror surface and the brush bristles 2 are adjusted, which is a passive adjustment mechanism, so that the distance adjustment mechanism or the angle adjustment mechanism according to the present invention includes the mirror surface and the brush bristles.
  • the distance and angle with 2 can be adjusted, and the present invention is not limited to the example shown above.
  • information on the distance and angle with the mirror surface is acquired by a sensor, and the distance and angle are actively adjusted based on the information by energizing the brush bristles 2 and the attachment device 4 with a motor or the like. An aspect may be sufficient.
  • the distance adjustment mechanism and the angle adjustment mechanism 41 are not limited to the installation position as long as the adjustment can be performed, but as shown in the illustrated example, the distance between the brush substrate and the bristles 2 may be less than a brush unit, For example, it is preferable because the distance and angle can be adjusted more precisely with 4 units of fixtures.
  • the distance adjusting mechanism and the angle adjusting mechanism 41 may be provided on the surface of the brush substrate 1 opposite to the brush bristles 2 as shown in the illustrated example.
  • a plurality of the distance adjustment mechanism and the angle adjustment mechanism 41 may be provided for one brush, and further, between the brush substrate 1 and the brush bristles 2 and the brush bristles 2. It may be provided on both of the opposite surface.
  • the means for adjusting the distance and adjusting the angle may be configured to perform the distance adjustment and the angle adjustment by one means.
  • the distance and the angle are adjusted by a leaf spring.
  • the form which performs distance adjustment and angle adjustment separately may be sufficient.
  • the distance is adjusted with a coil spring, and the angle is adjusted with a torsion spring or a hinge.
  • a sunlight reflecting mirror to be cleaned is configured to include at least a reflective layer on a mirror substrate.
  • a hydrophilic layer can also be formed on the surface of the sunlight reflecting mirror in order to increase the cleaning power of the cleaning liquid.
  • a water-repellent layer can be formed in order to suppress the adhesion of dirt.
  • the sunlight reflecting mirror cleaned with the brush of the present invention may be either a glass mirror type or a film mirror type.
  • the film mirror type is flexible and easily deformed, so the stress from the brush in contact with the mirror surface is dispersed and not easily damaged, and the brush is evenly contacted with the mirror surface for uniform cleaning. This is preferable because the cleaning power of the brush is improved.
  • energy savings can be expected because mirror substrates can be produced at low temperatures. Since it can be treated at low temperature during disposal and may be recyclable, energy consumption can be reduced throughout the life cycle, and is expected as a next-generation solar reflective mirror.
  • FIG. 19 is a cross-sectional view showing a schematic configuration of a sunlight reflecting mirror 30 which is an example of a film mirror type.
  • the sunlight reflecting mirror 30 includes an anchor layer 32, a reflecting layer 33, a corrosion preventing layer 34, an adhesive layer 35, an ultraviolet absorbing layer 36, a hard coat layer 37, and a hydrophilic layer 38 on a resin film 31. It has.
  • the sunlight reflecting mirror 30 is arranged so that sunlight A enters from the hydrophilic layer 38 side.
  • the thickness of the resin film 31 can be set according to the type of resin, and is generally preferably in the range of 10 to 400 ⁇ m, more preferably in the range of 20 to 300 ⁇ m.
  • the anchor layer 32 is provided between the resin film 31 and the reflective layer 33 in order to improve the adhesiveness between the resin film 31 and the reflective layer 33.
  • the anchor layer 32 can improve heat resistance and prevent the resin film 31 from being deteriorated due to heat generated when the reflective layer 33 is formed.
  • the surface of the resin film 31 can be smoothed, and it is also possible to prevent the reflectance of the reflective layer 33 from decreasing.
  • the anchor layer 32 can be formed by applying the resin layer 31 on the resin film 31 by a gravure coating method, a reverse coating method, or the like using, for example, a polyester resin, an acrylic resin, a melamine resin, or the like.
  • the thickness of the anchor layer 32 is preferably in the range of 0.01 to 3.00 ⁇ m, and preferably in the range of 0.1 to 1.0 ⁇ m, from the viewpoint of improving adhesion, smoothness, and reflectance. Is more preferable.
  • the reflection layer 33 is provided to reflect sunlight incident on the sunlight reflecting mirror 30.
  • the reflectance of the reflective layer 33 is preferably 80% or more and more preferably 90% or more from the viewpoint of efficiently collecting sunlight.
  • the reflectance of the reflective layer 33 refers to regular reflectance.
  • the reflective layer 33 can be formed by a wet method or a dry method using the above materials.
  • the wet method is a general term for a plating method, which is a method of forming a metal film by depositing a metal from a solution, and a method of forming silver plating using a silver mirror reaction is one of them.
  • the dry method is a general term for vacuum film forming methods, and examples thereof include resistance heating type, ion beam assist type vacuum deposition methods, ion plating methods, sputtering methods, and the like.
  • the corrosion prevention layer 34 contains a corrosion inhibitor to prevent the reflection layer 33 from being corroded.
  • the corrosion inhibitor is a compound having amines and derivatives thereof, pyrrole ring, triazole ring, pyrazole ring, thiazole ring, indazole ring, etc., copper chelate compound, thiourea, etc. It is preferable that it is a compound which has the adsorptivity with respect to silver.
  • the adhesive layer 35 is provided between the corrosion prevention layer 34 and the ultraviolet absorbing layer 36 in order to improve the adhesion between them.
  • the adhesive layer 35 can be formed in the same manner as the anchor layer 32.
  • the ultraviolet absorption layer 36 is provided in order to prevent deterioration of each layer due to the ultraviolet rays of the incident sunlight A.
  • the ultraviolet absorbing layer 36 is preferably an acrylic resin layer having an ultraviolet absorbing group or containing an ultraviolet absorber from the viewpoint of increasing the flexibility and weather resistance of the sunlight reflecting mirror 30 and reducing the weight.
  • the ultraviolet absorber include inorganic compounds such as titanium oxide, zinc oxide, cerium oxide, and iron oxide in addition to organic compounds such as benzophenone, benzotriazole, phenyl salicylate, triazine, and benzoate.
  • the hard coat layer 37 is provided to prevent damage to each layer.
  • the hard coat layer 37 can be formed by applying an acrylic resin, a urethane resin, a melamine resin, an epoxy resin, an organic silicate compound, a silicone resin, or the like.
  • the hard coat layer 37 can contain additives such as a surfactant, a leveling agent, and an antistatic agent.
  • the surfactant is effective for smoothing the surface of the hard coat layer 37.
  • Specific examples of the surfactant that can be used include the same examples as the surfactant that can be contained in the above-described water or a cleaning liquid containing water as a main component.
  • Leveling agents are effective in reducing small irregularities on the surface.
  • a dimethylpolysiloxane-polyoxyalkylene copolymer for example, SH190 manufactured by Toray Dow Corning Co., Ltd.
  • the antistatic agent is effective in improving the cleaning power of the mirror surface by the cleaning liquid when the cleaning liquid is used.
  • the hard coat layer 37 has conductivity due to the antistatic agent, the electric resistance value on the surface of the film mirror unit can be reduced.
  • an antistatic layer as a layer adjacent to the hard coat layer 37 or through an extremely thin layer between the hard coat layer 37, the electrical resistance value of the mirror surface of the solar reflective mirror 30 is reduced, It is possible to improve the cleaning power by the cleaning liquid.
  • the hydrophilic layer 38 can be provided on the outermost surface from the viewpoint of increasing the cleaning power by the cleaning liquid.
  • the hydrophilic layer 38 may be provided on the hard coat layer 37 as shown in FIG. 19 or may be provided in place of the hard coat layer 37.
  • the hydrophilicity exhibited by the hydrophilic layer 38 is preferably 30 ° or less, more preferably 20 ° or less, from the viewpoint of obtaining a high detergency with the cleaning liquid, with respect to the surface of the hydrophilic layer 38 with water. More preferred.
  • the contact angle with water (°) was 30 seconds after 3 ⁇ L of water was dropped on the hydrophilic layer 38 in an environment of a temperature of 23 ° C.
  • the hydrophilic layer 38 can contain a hydrophilizing agent in order to make the contact angle with water on the surface 30 ° or less.
  • a hydrophilizing agent examples include compounds containing metal elements, such as metal oxides, metal nitrides, metal carbides containing metal elements such as Si, Ti, Al, Sn, Fe, Zn, Sb, and Zn. Is mentioned.
  • the hydrophilic layer 38 can also contain metal particles such as silica particles, alumina particles, titania particles, zirconia particles, in addition to the compound containing the metal element.
  • metal particles such as silica particles, alumina particles, titania particles, zirconia particles, in addition to the compound containing the metal element.
  • the surface roughness is increased, the hydrophilicity is improved, and the hydrophilic layer 38 having a contact angle of 30 ° or less can be formed. Further, if the surface roughness is large, it becomes difficult for dirt to adhere to the surface of the hydrophilic layer 38, and the cleaning liquid enters between the hydrophilic layer 38 and the dirt, so that the dirt is easily removed.
  • the hydrophilic layer 38 may contain a silicate compound, polysilazane having a Si—N bond as a basic skeleton, or the like.
  • silicate compound examples include tetrahydroxysilane, tetramethoxysilane, tetraethoxysilane, and tetraethoxyoxysilane.
  • the hydrophilic layer 38 can also be a layer containing a photocatalyst that is rendered hydrophilic by sunlight as a hydrophilizing agent.
  • a photocatalyst is a substance that, when irradiated with light having energy larger than the band gap between the conduction band and the valence band, the electrons in the valence band are excited to generate conduction electrons and holes.
  • Examples of the photocatalyst that can be included in the hydrophilic layer 38 include anatase type titanium oxide (band gap; 3.2 eV), rutile type titanium oxide (band gap; 3.0 eV), and zinc oxide (band gap; 3.2 eV). , Tin oxide (band gap; 3.5 eV), tungsten oxide (band gap; 2.5 eV), potassium tantalate (band gap; 3.4 eV), strontium titanate (band gap; 3.2 eV), zirconium oxide ( Band gap; 5.0 eV), niobium oxide (band gap; 3.4 eV), and the like.
  • anatase type titanium oxide band gap; 3.2 eV
  • rutile type titanium oxide band gap; 3.0 eV
  • zinc oxide band gap; 3.2 eV
  • Tin oxide band gap; 3.5 eV
  • tungsten oxide band gap; 2.5 eV
  • potassium tantalate band gap; 3.4 eV
  • strontium titanate band gap;
  • the actually measured bad gap may have a difference of about ⁇ 0.2 eV from the band gap described above.
  • the hydrophilic layer 38 can contain a small amount of a platinum group metal such as Pt, Pd, Ru, Rh, Ir, Os, etc. in order to enhance the photocatalytic activity.
  • the hydrophilic layer 38 can be used in combination with the photocatalyst and metal particles such as silica particles, alumina particles, titania particles, zirconia particles, silicate compound, polysilazane having a Si—N bond as a basic skeleton, and the like. it can.
  • the hydrophilic layer 38 containing a photocatalyst can be formed by applying a dispersion of photocatalyst particles by a conventionally known coating method.
  • the hydrophilic layer 38 containing a photocatalyst can be formed by a sol coating baking method, an organic titanate method, a vacuum film forming method, or the like.
  • the sol coating and baking method is a method in which anatase-type titanium oxide sol is applied by a coating method such as a gravure coating method, a reverse coating method, or a die coating method, followed by baking.
  • the organic titanate method is a method in which a coating solution obtained by partially or completely hydrolyzing an organic titanate is applied by a conventionally known coating method such as a gravure coating method and dried. By drying, hydrolysis of the organic titanate is completed to produce titanium hydroxide, and an amorphous titanium oxide layer is formed by dehydration condensation polymerization of titanium hydroxide. Thereafter, firing is performed at a temperature equal to or higher than the crystallization temperature of anatase, and amorphous titanium oxide is phase-transformed into anatase-type titanium oxide.
  • the vacuum film formation method is a method of forming an amorphous titanium oxide layer by a vacuum deposition method, a sputtering method, or the like. Thereafter, phase transition is made to anatase-type titanium oxide by firing.
  • the hydrophilic layer 38 may be a layer in which a surface treatment such as a plasma treatment or an etching treatment is performed on the surface of the substrate as long as the hydrophilic layer 38 exhibits hydrophilicity such that the contact angle with water is 30 ° or less.
  • an inorganic coat layer may be provided between the hydrophilic layer 38 and the ultraviolet absorbing layer 36.
  • the inorganic coat layer can prevent the organic compound such as an acrylic resin contained in the ultraviolet absorption layer 36 from being decomposed by the photocatalyst.
  • the material for the inorganic coating layer include a silicate compound such as tetraethoxysilane and a layer containing an alcohol such as methanol.
  • the inorganic coat layer can contain a constituent component of the hydrophilic layer 38 or a constituent component of the ultraviolet absorbing layer in order to improve the adhesiveness between the hydrophilic layer 38 and the ultraviolet absorbing layer 36.
  • the inorganic coat layer may be a single layer or a plurality of layers.
  • the thickness of the hydrophilic layer 38 is a suitable layer thickness depending on the refractive index of the hydrophilic layer 38, the contained components, the wavelength range of the light used for power generation among the sunlight incident on the sunlight reflecting mirror 30, and the like. Should be selected. Since use of a wavelength range as wide as possible leads to an improvement in power generation efficiency, it is preferable that the thickness is thin in consideration of light absorption by the hydrophilic layer 38. Since it is the extreme surface layer that expresses hydrophilicity, if it has a thickness of about several nanometers, hydrophilicity necessary for forming a liquid film can be expressed.
  • a layer thickness of at least about 1 ⁇ 2 of the particle diameter of the photocatalyst particles is necessary from the viewpoint of retention of the photocatalyst particles and prevention of falling off. If the thickness is 10 nm, a layer thickness of 5 nm or more is necessary.
  • a layer thickness for expressing the photocatalyst function that is, a layer thickness that establishes a crystal structure is required, and the photocatalyst particles are contained.
  • a layer thickness of 5 nm or more is necessary. From the above viewpoint, in general, the thickness of the hydrophilic layer 38 can be selected within a range of 5 to 300 nm.
  • the hydrophilic layer 38 can also contain additives such as a surfactant, a leveling agent, and an antistatic agent, like the hard coat layer 37.
  • FIG. 20 is a cross-sectional view illustrating a schematic configuration of a sunlight reflecting mirror 30B which is an example of a glass mirror.
  • a glass plate is used as a glass layer 39, and a reflective layer 33 and a corrosion prevention layer 34 are formed on the glass layer 39.
  • the reflection layer 33 and the corrosion prevention layer 34 are the same layers as the reflection layer 33 and the corrosion prevention layer 34 of the solar light reflecting mirror 30 described above.
  • the sunlight A is arranged so as to enter from the glass layer 39 side.
  • the thickness of the glass layer 39 is not particularly limited, but can be, for example, in the range of 1 to 5 mm.
  • the solar reflective mirror cleaning device is a solar reflective mirror cleaning device for cleaning the mirror surface of the solar reflective mirror with a brush, and the solar reflective mirror cleaning brush of the present invention is applied to the mirror surface of the solar reflective mirror.
  • Drive means for rotating in contact is provided.
  • FIG. 21 shows a solar reflective mirror cleaning apparatus 100 for cleaning the mirror surface of the solar reflective mirror 30 used in the solar thermal power generation apparatus as one embodiment.
  • the solar thermal power generation apparatus condenses sunlight on a heat collecting tube 80 by a plurality of sunlight reflecting mirrors 30 arranged in a curved surface, heats the heat medium transferred by the heat collecting tube 80, and electrically converts the heat energy of the heat medium. It is a power generation device that converts energy.
  • the plurality of sunlight reflecting mirrors 30 are fixed to a support body such as a curved metal plate, and are supported by the support member 51 so as to form one large mirror surface.
  • a heat collecting tube 80 is disposed at a position where sunlight is collected by the plurality of sunlight reflecting mirrors 30.
  • a mirror angle adjusting unit 53 that rotationally drives the support member 51 is provided so that the plurality of sunlight reflecting mirrors 30 can be rotated according to the incident angle of sunlight.
  • a solar reflective mirror cleaning device 100 (hereinafter also simply referred to as “cleaning device 100”) includes eight solar reflective mirror cleaning brushes 10 (hereinafter also simply referred to as “brushes 10”). .)
  • the cleaning apparatus 100 includes a robot arm 103 that brings each brush 10 into contact with the mirror surface of the sunlight reflecting mirror 30 and a rotation drive unit 101 that drives each brush 10 to rotate.
  • the robot arm 103 is capable of turning and bending, and the solar reflective mirror cleaning brush 10 is attached on the arm substrate 1015 at the tip.
  • substrate 1 is via the said distance adjustment mechanism or an angle adjustment mechanism.
  • the brush substrate 1 is attached to a shaft (not shown) of the rotation drive unit 101 so as to be freely reciprocated.
  • the solar reflective mirror cleaning device 100 preferably includes a cleaning liquid tank 1021, a supply pipe 1022, an injection nozzle 1023, and the like as cleaning liquid supply means.
  • the supply pipe 1022 is piped on the arm substrate 1015 and in the robot arm 103 so as to connect the spray nozzle 1023 and the tank 1021.
  • the cleaning apparatus 100 supplies the cleaning liquid by sending the cleaning liquid from the tank 1021 to the spray nozzle 1023 via the supply pipe 1022 and spraying it onto the mirror surface by the spray nozzle 1023.
  • the cleaning device 100 arranges eight brushes 10 in a row in the vertical direction of the sunlight reflecting mirror 30 and performs vertical cleaning at once. However, the number of the brushes 10 is reduced, and each brush 10 is mirrored by the robot arm 103. You may make it wash
  • Water can be used, and an additive may be contained as long as water is a main component.
  • Water as a main component means that the content of water in the liquid component excluding the solid component is in the range of 30 to 100% by mass.
  • a water component that contaminates the mirror surface of the sunlight reflecting mirror 30 and has little adverse effect of reducing the reflectance or power generation efficiency is suitable as a cleaning liquid for the sunlight reflecting mirror.
  • steam generated during power generation can also be used as a cleaning liquid. Since solar thermal power generation devices are often installed in areas with little water, such as desert areas, precious resources can be reused and cleaning costs can be reduced.
  • Additives that can be used in the cleaning liquid include organic solvents, surfactants, salts, acids / bases, resins, fibers, particulate matter, etc., from the viewpoint of enhancing the cleaning power of the cleaning liquid and facilitating the removal of dirt. It is done.
  • the additive is preferably highly compatible with water.
  • Examples of the organic solvent include alcohols such as methanol, ethanol, propanol, butanol, isopropyl alcohol, ethylene glycol, and propylene glycol, and hydrocarbons such as acetone and methylene chloride.
  • examples of the surfactant include anionic, cationic, amphoteric, and nonionic, specifically, anionic surfactants such as polyoxyethylene alkyl ether acetate, dodecylbenzene sulfonate, and laurate, Nonionic surfactants such as polyoxyethylene alkyl ethers are listed.
  • Examples of the salts include sodium chloride and sodium hydrogen carbonate, and examples of the acids include acetic acid and phthalic acid. With these additives, it is possible to easily remove the dirt with the cleaning liquid and to improve the cleaning power at the time of cleaning.
  • the method for cleaning a solar reflective mirror of the present invention is a method of cleaning the mirror surface of the solar reflective mirror with a brush, and the brush for cleaning the solar reflective mirror of the present invention is brought into contact with the mirror surface of the solar reflective mirror.
  • the mirror surface is cleaned by adjusting the distance and angle between the plurality of brush bristles and the sunlight reflecting mirror while rotating them.
  • the solar reflective mirror cleaning method of the present invention an example in which the mirror surface of the solar reflective mirror 30 is cleaned by the solar reflective mirror cleaning apparatus 100 will be described.
  • the solar reflective mirror cleaning apparatus 100 presses the solar reflective mirror cleaning brush 10 against the mirror surface of the solar reflective mirror 30 with the robot arm 103 to bring it into contact therewith.
  • the pressure on the mirror surface of the brush 10 is preferably in the range of 200 to 3500 Pa from the viewpoint of smoothing the rotation of the brush 10 to increase the cleaning power and preventing damage to the mirror surface.
  • the robot arm 103 may detect the pressure on the mirror surface, and automatically control the pressure for pressing the brush 10 against the mirror surface so that the detected pressure is within the above range.
  • the plurality of brush hairs and the solar reflective mirror are further rotated. Adjust the distance and angle.
  • the method for adjusting the distance and the angle is not particularly limited. However, in the method for cleaning the solar reflective mirror according to the present invention, when the bristles contact the mirror surface, the distance adjusting mechanism and the angle adjusting mechanism according to the present invention.
  • the aspect which adjusts the distance and angle of a mirror surface and brush hair by energizing brush hair according to reaction force from a mirror surface which 41 receives via brush hair is preferable.
  • the position of the brush 10 that contacts the mirror surface is moved by the robot arm 103 or the vehicle 104. Clean the mirror surface thoroughly.
  • the solar reflective mirror cleaning system of the present invention comprises a solar reflective mirror cleaning brush of the present invention and means for rotating the solar reflective mirror cleaning brush in contact with the mirror surface of the solar reflective mirror. And having. Specifically, it is a cleaning system for cleaning the solar reflective mirror by the solar reflective mirror cleaning device 100.
  • the driving unit corresponds to a unit that rotates the solar reflective mirror cleaning brush in contact with the mirror surface of the solar reflective mirror.
  • the planting holes are formed in the attachment device 4 and the plurality of brush hairs 2 are implanted in the attachment device 4 to fix the plurality of brush hairs 2.
  • the plurality of bristles 2 may be fixed by holding the plurality of bristles 21 formed from the plurality of bristles 2 by the attachment device 4.
  • the brush substrate does not have a distance adjustment mechanism and an angle adjustment mechanism, and the arrangement pattern of the distance adjustment mechanism and the angle adjustment mechanism (hereinafter also simply referred to as “arrangement pattern”) is 0, and the solar reflective mirror cleaning brush (hereinafter, (Simply referred to as “brush”.) [0] was manufactured.
  • the brush [0] of the arrangement pattern 0 is a general brush that does not have the distance adjustment mechanism and the angle adjustment mechanism shown in FIG.
  • the brush substrate used was a circular brush substrate having a diameter of 600 mm. Further, in the brush [0], a plurality of brush hairs were formed into a hair bundle having an average length of 80 mm and provided on the entire surface of the brush substrate via the attachment device 4.
  • PP fiber bristles having an average monofilament diameter of 1 mm were used.
  • JIS L0105 JIS L0105
  • An anchor layer having a thickness of 0.1 ⁇ m was formed on one side of a 100 ⁇ m-thick polyethylene terephthalate film (hereinafter referred to as PET film) obtained by biaxial stretching.
  • the anchor layer is made of polyester resin Esper 9940A (Hitachi Chemical Co., Ltd.), melamine resin, isocyanate cross-linking agent tolylene diisocyanate and hexamethylene diisocyanate (Mitsui Chemical Fine Co., Ltd.) 20: 1: 1, respectively.
  • a resin mixed at a mass ratio of 2 was applied by gravure coating.
  • a reflective layer having a thickness of 80 nm was formed by vacuum evaporation using silver.
  • a corrosion prevention layer coating solution was applied by a gravure coating method to form a corrosion prevention layer having a thickness of 0.1 ⁇ m.
  • the coating solution is 10% by weight of Tinuvin 234 (made by BASF Japan) based on the resin solid content in a resin in which Esper 9940A and tolylene diisocyanate are mixed at a resin solid content ratio (mass ratio) of 10: 2, respectively. It was prepared by adding as a corrosion inhibitor.
  • vinylol 92T (acrylic resin adhesive, manufactured by Showa Denko) was applied to a thickness of 0.1 ⁇ m to form an anchor layer.
  • An acrylic resin film formed by a solution casting method was laminated on the anchor layer to form an ultraviolet absorbing layer.
  • the arithmetic average roughness Ra of the surface of the ultraviolet absorbing layer was 0.1 ⁇ m, and the layer thickness was 50 ⁇ m.
  • a silicone hard coat Perma-New 6000 (California Hardcoating Company) was applied onto the UV absorbing layer with a wire bar to form a hard coat layer having a thickness of 3 ⁇ m.
  • a light reflecting mirror was manufactured.
  • Glass mirror type sunlight reflecting mirror On the glass plate with a thickness of 4 mm, in the same manner as the film mirror type, a reflective layer with a thickness of 80 nm is formed by vacuum deposition using silver, and further a corrosion prevention layer with a thickness of 0.1 ⁇ m is formed. A glass mirror type solar reflective mirror was manufactured.
  • the reflectance Ta (%) of the solar reflective mirror was measured.
  • the solar reflective mirror was installed outdoors, and after three months, the solar reflective mirror was washed again by the above-described cleaning method, and then the reflectance Tb (%) of the solar reflective mirror was measured.
  • the reflectances Ta and Tb are adjusted so that the incident angle of incident light is 20 ° with respect to the normal line of the reflecting surface, and the regular reflectance (%) at the reflection angle of 20 ° is set to a gloss meter GM-268 (Konica Minolta). ).
  • the recovery rate of the reflectivity of the solar reflective mirror was obtained by the following formula, and evaluated as the cleaning power of the solar reflective mirror cleaning brushes [0] to [15].
  • Reflectivity recovery rate (%) Tb (%) / Ta (%) ⁇ 100
  • the recovery rate of the reflectance is 90% or more, a reflectance that can be used as a sunlight reflecting mirror can be obtained.
  • the evaluation criteria for the cleaning power are as follows. ⁇ ... 95% or more ⁇ ... 90% or more and less than 95% ⁇ ... less than 90%
  • the Tb was measured at 8 vertical points ⁇ 10 horizontal points (a total of 80 points), and the uniformity was evaluated using the worst reflectance among the 80 points as an evaluation target.
  • the evaluation criteria for uniformity are as follows. ⁇ ... 90% or more ⁇ ... 85% or more and less than 90% ⁇ ... less than 85%
  • the washed sunlight reflecting mirror is washed 20 times using a brush, the area of the generated scratch is observed, and the ratio of the area and the area of the entire sunlight reflecting mirror is calculated, thereby being damaged. Evaluated.
  • the present invention is suitable for providing a solar reflective mirror cleaning brush that can be uniformly cleaned with high cleaning power without damaging the solar reflective mirror.

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Abstract

The objective of the present invention is to provide a brush for cleaning a sunlight reflecting mirror, which is capable of uniformly cleaning a sunlight reflecting mirror with high cleaning power without damaging the sunlight reflecting mirror. This brush for cleaning a sunlight reflecting mirror cleans a mirror surface of a sunlight reflecting mirror by coming into contact with the mirror surface and rotating thereon. This brush for cleaning a sunlight reflecting mirror is characterized by comprising a rotatable brush substrate and a plurality of brush bristles that are provided on the brush substrate and rotate as the brush substrate rotates. This brush for cleaning a sunlight reflecting mirror is also characterized by comprising a distance adjustment mechanism and an angle adjustment mechanism for respectively adjusting the distance and the angle between the mirror surface and the brush bristles.

Description

太陽光反射ミラー洗浄用ブラシ、太陽光反射ミラーの洗浄システム、洗浄方法及び洗浄装置Solar reflective mirror cleaning brush, solar reflective mirror cleaning system, cleaning method and cleaning device
 本発明は、太陽光反射ミラー洗浄用ブラシ、太陽光反射ミラーの洗浄システム、洗浄方法及び洗浄装置に関する。より詳しくは、本発明は、太陽光反射ミラーに傷をつけずに、高い洗浄力で均一に洗浄することができる太陽光反射ミラー洗浄用ブラシ等に関する。 The present invention relates to a solar reflective mirror cleaning brush, a solar reflective mirror cleaning system, a cleaning method, and a cleaning device. More specifically, the present invention relates to a solar reflective mirror cleaning brush and the like that can be uniformly cleaned with high cleaning power without damaging the solar reflective mirror.
 太陽光を用いた発電装置としては、太陽光を電力に直接変換する太陽電池、太陽光反射ミラーを用いて太陽光を集光し、得られた熱を媒体として発電する太陽熱発電装置等が知られている。
 太陽熱発電装置は蓄熱が可能であるため、昼夜を問わず発電することができる。長期的な観点からは、太陽熱発電装置の発電効率は太陽電池よりも高く、太陽光を有効に利用できる。
Known solar power generation devices include solar cells that directly convert sunlight into electric power, solar thermal power generation devices that use sunlight reflecting mirrors to collect sunlight and generate the resulting heat as a medium. It has been.
Since the solar thermal power generation device can store heat, it can generate power regardless of day or night. From a long-term viewpoint, the power generation efficiency of the solar thermal power generation device is higher than that of the solar cell, and sunlight can be used effectively.
 太陽熱発電装置は砂漠地帯で利用されることが多く、屋外に設置される太陽光反射ミラーには砂塵等の汚れが付着しやすい。
 特に、砂漠地帯における砂塵由来の汚れは通常の汚れとは異なり、強固な砂の膜を形成して太陽光反射ミラーのミラー面に固着しやすい。これは、昼夜の温度差が大きい砂漠地帯において表面に結露が生じることが原因の一つと考えられている。表面に結露が生じると、表面上に堆積した砂塵由来の物質(例えば、NaCl、CaCO、SiO等)、大気中の汚染物質(例えば、SiO等)等が結露に溶け込んで反応し、不溶性の塩を形成する。その後、水分が蒸発し、不溶性の塩及び砂塵粒子が凝集して、強固な砂の膜を形成する。
Solar thermal power generation devices are often used in desert areas, and dirt such as dust tends to adhere to the sunlight reflecting mirrors installed outdoors.
In particular, dirt derived from dust in a desert area is different from ordinary dirt, and forms a strong sand film and is easily fixed to the mirror surface of the sunlight reflecting mirror. This is thought to be one of the causes of condensation on the surface in a desert area where the temperature difference between day and night is large. When condensation occurs on the surface, dust-derived substances accumulated on the surface (for example, NaCl, CaCO 3 , SiO 2, etc.), pollutants in the atmosphere (for example, SiO x, etc.) dissolve in the condensation and react. Insoluble salts are formed. Thereafter, the water evaporates and insoluble salts and dust particles aggregate to form a strong sand film.
 このような汚れは反射率、ひいては発電効率を低下させるため、表面の防汚性に優れた太陽光反射ミラーが提案されている。例えば、太陽光反射ミラーの最表面に光触媒を含有する層を備えて、付着した有機物を分解する太陽光反射ミラーが提案されている(例えば、特許文献1参照。)。また、太陽光反射ミラーの表面に、親水性ポリマー、金属アルコキシド化合物、コロイダルシリカを含有する親水性層を設け、洗浄も容易な太陽光反射ミラーも提案されている(例えば、特許文献2参照。)。 Since such dirt lowers the reflectivity and thus the power generation efficiency, a solar reflection mirror having an excellent surface antifouling property has been proposed. For example, a solar reflective mirror that includes a layer containing a photocatalyst on the outermost surface of the solar reflective mirror and decomposes the attached organic matter has been proposed (see, for example, Patent Document 1). In addition, a solar reflective mirror is also proposed in which a hydrophilic layer containing a hydrophilic polymer, a metal alkoxide compound, and colloidal silica is provided on the surface of the solar reflective mirror and can be easily cleaned (see, for example, Patent Document 2). ).
 表面の防汚性だけでなく、表面の清浄度を高める洗浄方法についても検討されている。
 例えば、ナノバブルを用いて、表面を傷付けずに固着した汚れを容易に洗浄する方法が提案されている(例えば、特許文献3参照。)。
In addition to the antifouling property of the surface, a cleaning method for increasing the cleanliness of the surface has been studied.
For example, there has been proposed a method of easily cleaning dirt adhered using a nanobubble without damaging the surface (see, for example, Patent Document 3).
 しかしながら、前記光触媒による汚れの分解速度は、砂の膜が形成される速度に比べて遅いため、屋外のような過酷な環境下ではやはり表面に汚れが堆積してしまう。
 また、親水性層によれば、降雨があると水が濡れ広がって表面から汚れが洗い流されるが、降雨の少ない砂漠地帯ではこのような自浄作用は期待できず、やはり定期的な洗浄作業が必要である。
However, since the degradation rate of dirt by the photocatalyst is slower than the speed at which a sand film is formed, dirt is still deposited on the surface in a harsh environment such as outdoors.
In addition, according to the hydrophilic layer, when there is rain, the water gets wet and the dirt is washed away from the surface, but in the desert area where there is little rain, such self-cleaning action cannot be expected, and regular cleaning work is still necessary It is.
 このように、砂漠のような過酷な屋外環境下では、単に防汚性を備えるだけでは汚れの堆積を十分に防ぐことができなかった。ナノバブルのような洗浄効果の高い洗浄方法を用いても、高い反射率を維持するためには、頻繁に洗浄作業を行う必要があり、洗浄負荷は余り変わらなかった。 Thus, in a harsh outdoor environment such as a desert, it was not possible to sufficiently prevent the accumulation of dirt simply by providing antifouling properties. Even when a cleaning method having a high cleaning effect such as nanobubbles is used, in order to maintain a high reflectance, it is necessary to frequently perform a cleaning operation, and the cleaning load has not changed much.
 そこで、汚れを除去するために、ブラシなどで拭き取ることが考えられる。 Therefore, in order to remove the dirt, it is conceivable to wipe off with a brush or the like.
国際公開第2011/078024号International Publication No. 2011/0778024 特開2012-8166号公報JP 2012-8166 A 特開2013-139958号公報JP 2013-139958 A
 本発明は、上記問題・状況に鑑みてなされたものであり、その解決課題は、太陽光反射ミラーに傷をつけずに、高い洗浄力で均一に洗浄できる太陽光反射ミラー洗浄用ブラシ、太陽光反射ミラーの洗浄システム、洗浄方法及び洗浄装置を提供することである。 The present invention has been made in view of the above-described problems and situations, and the problem to be solved is a solar reflective mirror cleaning brush that can be cleaned uniformly with high cleaning power without damaging the solar reflective mirror, the sun To provide a cleaning system, a cleaning method, and a cleaning apparatus for a light reflecting mirror.
 本発明者は、上記課題を解決すべく、上記問題の原因等について検討する過程において距離調整機構及び角度調整機構を有することにより、ミラー面とブラシ毛との距離及び角度を調整させれば、ブラシ毛とミラー面との角度、ブラシ毛の劣化状態の異なり、路面の凹凸等に影響されず、太陽光反射ミラーに傷をつけずに、高い洗浄力で均一に洗浄することができることを見いだし本発明に至った。
 すなわち、本発明に係る上記課題は、以下の手段により解決される。
In order to solve the above problems, the present inventor has a distance adjustment mechanism and an angle adjustment mechanism in the process of examining the cause of the above problem, etc., so that the distance and angle between the mirror surface and the brush hair can be adjusted, It has been found that the angle between the brush hair and the mirror surface, the deterioration state of the brush hair, and the unevenness of the road surface are not affected, and the solar reflective mirror can be washed uniformly without damaging it. The present invention has been reached.
That is, the said subject which concerns on this invention is solved by the following means.
 1.太陽光反射ミラーのミラー面に当接して回転することにより、当該ミラー面を洗浄する太陽光反射ミラー洗浄用ブラシであって、
 回転可能なブラシ基板と、
 前記ブラシ基板上に設けられ、前記ブラシ基板の回転に伴って回転する複数のブラシ毛と、を備え、かつ、
 前記ミラー面と前記ブラシ毛との距離及び角度を調整するための、距離調整機構及び角度調整機構を有することを特徴とする太陽光反射ミラー洗浄用ブラシ。
1. A brush for cleaning a sunlight reflecting mirror that cleans the mirror surface by rotating in contact with the mirror surface of the sunlight reflecting mirror,
A rotatable brush substrate;
A plurality of brush bristles provided on the brush substrate and rotating with the rotation of the brush substrate; and
A brush for cleaning a sunlight reflecting mirror, comprising a distance adjusting mechanism and an angle adjusting mechanism for adjusting a distance and an angle between the mirror surface and the brush bristles.
 2.前記距離調整機構又は前記角度調整機構が、付勢機構であることを特徴とする第1項に記載の太陽光反射ミラー洗浄用ブラシ。 2. 2. The solar reflective mirror cleaning brush according to claim 1, wherein the distance adjusting mechanism or the angle adjusting mechanism is an urging mechanism.
 3.前記付勢機構が、ばね、ゴム、風船及びダンパーから選ばれる少なくとも1種であることを特徴とする第2項に記載の太陽光反射ミラー洗浄用ブラシ。 3. 3. The solar reflective mirror cleaning brush according to claim 2, wherein the urging mechanism is at least one selected from a spring, rubber, a balloon, and a damper.
 4.前記距離調整機構又は前記角度調整機構が、前記ブラシ基板と前記ブラシ毛との間にあることを特徴とする第1項から第3項までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシ。 4. The distance adjusting mechanism or the angle adjusting mechanism is located between the brush substrate and the brush bristles, for cleaning a solar reflective mirror according to any one of claims 1 to 3. brush.
 5.前記距離調整機構又は前記角度調整機構が、前記ブラシ基板において、前記ブラシ毛とは反対側の面に設けられていることを特徴とする第1項から第4項までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシ。 5. The distance adjustment mechanism or the angle adjustment mechanism is provided on a surface of the brush substrate opposite to the brush bristles, according to any one of the first to fourth items. Brush for cleaning sunlight reflecting mirrors.
 6.前記複数のブラシ毛の平均径が、1μm~1mmの範囲内であることを特徴とする第1項から第5項までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシ。 6. 6. The solar reflective mirror cleaning brush according to any one of items 1 to 5, wherein an average diameter of the plurality of brush bristles is in a range of 1 μm to 1 mm.
 7.前記複数のブラシ毛が、親水性の繊維毛からなることを特徴とする第1項から第6項までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシ。 7. The brush for solar reflective mirror cleaning according to any one of claims 1 to 6, wherein the plurality of brush bristles are hydrophilic fiber bristles.
 8.第1項から第7項までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシと、
 前記太陽光反射ミラー洗浄用ブラシを、前記太陽光反射ミラーのミラー面に当接させて回転させる手段と、を有することを特徴とする太陽光反射ミラーの洗浄システム。
8). The solar reflective mirror cleaning brush according to any one of items 1 to 7,
And a means for rotating the solar reflective mirror cleaning brush in contact with the mirror surface of the solar reflective mirror.
 9.前記太陽光反射ミラーが、フィルムミラータイプであることを特徴とする第8項に記載の太陽光反射ミラーの洗浄システム。 9. 9. The solar reflective mirror cleaning system according to item 8, wherein the solar reflective mirror is a film mirror type.
 10.ブラシにより太陽光反射ミラーのミラー面を洗浄する太陽光反射ミラーの洗浄方法であって、
 第1項から第7項までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシを前記太陽光反射ミラーのミラー面に当接させて回転させつつ、前記複数のブラシ毛と太陽光反射ミラーとの距離及び角度を調整することにより、当該ミラー面を洗浄することを特徴とする太陽光反射ミラーの洗浄方法。
10. A method for cleaning a solar reflective mirror, wherein the mirror surface of the solar reflective mirror is cleaned with a brush,
The plurality of brush hairs and sunlight reflection while rotating the solar reflective mirror cleaning brush according to any one of items 1 to 7 in contact with a mirror surface of the solar reflective mirror A method for cleaning a solar reflective mirror, wherein the mirror surface is cleaned by adjusting a distance and an angle with the mirror.
 11.前記太陽光反射ミラーが、フィルムミラータイプであることを特徴とする第10項に記載の太陽光反射ミラーの洗浄方法。 11. The method for cleaning a sunlight reflecting mirror according to item 10, wherein the sunlight reflecting mirror is a film mirror type.
 12.第1項から第7項までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシを有することを特徴とする太陽光反射ミラーの洗浄装置。 12. A solar reflective mirror cleaning apparatus comprising the solar reflective mirror cleaning brush according to any one of items 1 to 7.
 13.前記太陽光反射ミラーが、フィルムミラータイプであることを特徴とする第12項に記載の太陽光反射ミラーの洗浄装置。 13. 13. The solar reflective mirror cleaning apparatus according to item 12, wherein the solar reflective mirror is a film mirror type.
 本発明の上記手段により、太陽光反射ミラーに傷をつけずに、高い洗浄力で均一に洗浄することができる太陽光反射ミラー洗浄用ブラシ、太陽光反射ミラーの洗浄システム、洗浄方法及び洗浄装置を提供することができる。
 本発明の効果の発現機構ないし作用機構については、明確にはなっていないが、以下のように推察している。
The solar reflection mirror cleaning brush, the solar reflection mirror cleaning system, the cleaning method, and the cleaning device that can be uniformly cleaned with high cleaning power without damaging the solar reflection mirror by the above-described means of the present invention. Can be provided.
The expression mechanism or action mechanism of the effect of the present invention is not clear, but is presumed as follows.
 一般的な洗浄用のブラシは、線径0.7~1.3mmφ程度のブラシ毛が、長さ300~500mm程度でブラシ基板に植え込まれている。
 従来の太陽光反射ミラーの洗浄装置においては、このような、ブラシが洗浄車両にロボットアームを介して搭載され、ロボットアーム全体を押し込むことでブラシ毛を太陽光反射ミラーの表面(以下、「ミラー面」ともいう。)に当接し、ブラシ基板を回転させることで、ブラシ毛によりミラー面へせん断力を与えることによって洗浄している。
In a general cleaning brush, a bristle having a wire diameter of about 0.7 to 1.3 mmφ is implanted in a brush substrate with a length of about 300 to 500 mm.
In a conventional solar reflective mirror cleaning apparatus, such a brush is mounted on a cleaning vehicle via a robot arm, and the entire brush arm is pushed to remove the brush hair from the surface of the solar reflective mirror (hereinafter referred to as “mirror”). Cleaning is performed by applying a shearing force to the mirror surface by the brush bristles by rotating the brush substrate in contact with the surface.
 しかしながら、このような洗浄方法では、路面の凹凸によって、ロボットアームとミラー面との距離が変化する。
 従来のブラシでは、当該距離が小さい場合、ブラシ毛は、ミラー面に対し、より強く押し込まれるため、拡がる。
 反対に、当該距離が大きい場合、ブラシ毛は、ミラー面に対し強く押し込まれないため、ブラシ毛の拡がりが小さくなる。この結果、洗浄面積が減少するため、洗浄力が低下し、ひいては反射率が低下するという不具合がある。
However, in such a cleaning method, the distance between the robot arm and the mirror surface changes due to the unevenness of the road surface.
In the conventional brush, when the distance is small, the brush bristles are pushed more strongly against the mirror surface and thus spread.
On the other hand, when the distance is large, the bristle is not pushed strongly against the mirror surface, and therefore the spread of the bristle becomes small. As a result, since the cleaning area is reduced, there is a problem that the cleaning power is reduced and the reflectance is reduced.
 また、ロボットアーム全体を押し込むため、従来のブラシを用いた洗浄方法では、個々のブラシについて、ブラシ毛とミラー面との接触状態(すなわち、距離、角度など)を個別に調整することができない。このため、新しいブラシと古いブラシとを使用する場合など、劣化状態が異なるブラシを同時に使用すると、部分的に洗浄不良が発生しやすく、ミラー面を均一に洗浄できないという不具合がある。 In addition, since the entire robot arm is pushed in, the conventional cleaning method using a brush cannot individually adjust the contact state (that is, distance, angle, etc.) between the brush hair and the mirror surface for each brush. For this reason, when using brushes with different deterioration states at the same time, such as when using a new brush and an old brush, there is a problem in that defective cleaning tends to occur partially and the mirror surface cannot be cleaned uniformly.
 また、従来のブラシは、ミラー面に当接するブラシの位置を1.0km/hより大きい速度で太陽光反射ミラーの横方向に移動させながら洗浄した場合にミラー面に傷が発生するおそれがあった。 Further, the conventional brush may cause scratches on the mirror surface when it is cleaned while moving the position of the brush in contact with the mirror surface at a speed greater than 1.0 km / h in the lateral direction of the sunlight reflecting mirror. It was.
 さらに、パラボリックトラフ式の太陽光反射ミラーを洗浄する場合は、パラボリックな形状(放物線状の凹面)のため、ブラシの位置によって、ブラシ毛と当該ブラシ毛が当接するミラー面との角度及び距離が異なる。このため、ブラシ毛をミラー面へ均一に押し当てて洗浄することは困難であり、さらには、太陽光反射ミラーが傷付くおそれがあることを発見した。 Furthermore, when cleaning a parabolic trough solar reflecting mirror, the angle and distance between the brush bristles and the mirror surface against which the bristles come into contact depends on the position of the brush because of the parabolic shape (parabolic concave surface). Different. For this reason, it was difficult to press the bristles uniformly against the mirror surface for cleaning, and it was further found that the solar reflective mirror might be damaged.
 そこで、本発明者は、太陽光反射ミラー洗浄用ブラシ(以下、単に「ブラシ」ともいう。)に、ブラシ毛と当該ブラシ毛が当接するミラー面との距離及び角度を調整する機構を導入することで、当該距離及び接触角度をブラシごとに調整可能とした。
 これにより、ブラシ毛とミラー面との距離の変化を小さくすることができるため、路面の凹凸によりミラー面とロボットアームとの距離が変化しても、それに影響されず、ミラー全面を高い清浄力で均一に洗浄することができるブラシ等を提供できることを見いだした。
Therefore, the present inventors introduce a mechanism for adjusting the distance and angle between the brush bristles and the mirror surface against which the bristles come into contact with the solar reflective mirror cleaning brush (hereinafter also simply referred to as “brush”). Thus, the distance and the contact angle can be adjusted for each brush.
As a result, the change in the distance between the brush bristles and the mirror surface can be reduced, so even if the distance between the mirror surface and the robot arm changes due to the unevenness of the road surface, it is not affected by it, and the entire mirror surface is highly clean. It has been found that a brush that can be cleaned uniformly can be provided.
 このような本発明のブラシは、下記のような効果を奏する。 Such a brush of the present invention has the following effects.
 洗浄ブラシの劣化状態が異なっても、ブラシごとに接触状態を調整可能なため、新しいブラシと古いブラシとを組み合わせて使用することも可能となり、ブラシ毛の劣化状態の差に影響されなくなる。この結果、ブラシ毛の寿命(使用可能な期間)も伸ばすことができる。
 更に、パラボリックトラフ式の太陽光反射ミラーを洗浄する場合も、ブラシごとに角度を調整できるため、ブラシの回転に伴うブラシ毛とミラー面との角度の変化に影響されず、高い洗浄力で均一に洗浄ができる。
Even if the deterioration state of the cleaning brush is different, the contact state can be adjusted for each brush. Therefore, it is possible to use a new brush and an old brush in combination, and it is not affected by the difference in the deterioration state of the brush hair. As a result, the life of the bristles (the usable period) can be extended.
Furthermore, even when cleaning parabolic trough solar reflective mirrors, the angle can be adjusted for each brush, so it is not affected by changes in the angle between the brush bristles and the mirror surface as the brush rotates, and is uniform with high cleaning power. Can be cleaned.
 また、パラボリックトラフ式の太陽光反射ミラーを洗浄する場合であっても、ロボットアームに搭載されるブラシの位置によらず、ブラシ毛をミラー面へ均一に押し当てて洗浄することができ、高い洗浄力で均一に洗浄することができる。 In addition, even when cleaning parabolic trough sunlight reflecting mirrors, the brush bristles can be uniformly pressed against the mirror surface for cleaning regardless of the position of the brush mounted on the robot arm. It is possible to clean evenly with cleaning power.
 また、ブラシ毛が好適に広がるため、ミラー面に対する接触面積が大きくなるため、一部に大きな力が加わることを抑え、この結果、ミラーの傷付を抑えることができる。
 また、このため、ミラー面に当接するブラシの位置を1.0km/hより大きい速度で水平方向に移動させながら洗浄できるため、効率的である。
Further, since the brush bristles are suitably spread, the contact area with the mirror surface is increased, so that it is possible to suppress a large force from being applied to a part, and as a result, it is possible to suppress damage to the mirror.
For this reason, since the position of the brush contacting the mirror surface can be cleaned while moving in the horizontal direction at a speed greater than 1.0 km / h, it is efficient.
 また、このような本発明の太陽光ミラー洗浄用のブラシを用いることで、太陽光反射ミラーの反射率を良好に保つことができる。この結果、本発明のブラシによって洗浄される太陽光反射ミラーを有する太陽熱発電装置は、反射率が良好に保たれるため、発電量が増え、ひいては、発電コストが低くなる。
 また、ブラシの寿命が向上し、また、高い洗浄力で均一に洗浄できるため、水などの洗浄液の使用量が減り、太陽熱発電装置のメンテナンスコストを低くできるため好ましい。
Moreover, the reflectance of a solar reflective mirror can be kept favorable by using the brush for washing | cleaning such a solar mirror of this invention. As a result, the solar thermal power generation apparatus having the solar reflective mirror that is cleaned by the brush of the present invention maintains good reflectivity, so that the amount of power generation increases and, consequently, the power generation cost decreases.
Moreover, since the lifetime of a brush improves and it can wash | clean uniformly with high detergency, the usage-amount of washing | cleaning liquids, such as water, reduces, and it can reduce the maintenance cost of a solar thermal power generation apparatus, and is preferable.
本実施の形態に係る太陽光反射ミラー洗浄用ブラシをブラシ毛の毛先側から示す底面図The bottom view which shows the brush for sunlight reflection mirror washing | cleaning which concerns on this Embodiment from the hair-tip side of a brush hair 図1のX-X線における部分断面図Partial sectional view taken along line XX in FIG. ブラシ基板のブラシ毛の植設部分を示す部分断面図Partial cross-sectional view showing the brush hair planting part 距離調整機構及び角度調整機構を有するブラシの一例を示す側面概略図Side schematic diagram showing an example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism 距離調整機構及び角度調整機構を有するブラシの他例を示す側面概略図Side schematic diagram showing another example of a brush having a distance adjustment mechanism and an angle adjustment mechanism フィルムミラータイプの太陽光反射ミラーの概略構成を示す断面図Sectional drawing which shows schematic structure of a sunlight reflecting mirror of a film mirror type ガラスミラータイプの太陽光反射ミラーの概略構成を示す断面図Sectional drawing which shows schematic structure of a glass mirror type sunlight reflective mirror 本実施の形態に係る太陽光反射ミラーの洗浄装置を示す斜視図The perspective view which shows the cleaning apparatus of the sunlight reflection mirror which concerns on this Embodiment 距離調整機構及び角度調整機構を有さない一般的なブラシの一例を示す側面概略図Side schematic diagram showing an example of a general brush that does not have a distance adjustment mechanism and an angle adjustment mechanism
 本発明の太陽光反射ミラー洗浄用ブラシは、太陽光反射ミラーのミラー面に当接して回転することにより、当該ミラー面を洗浄する太陽光反射ミラー洗浄用ブラシであって、回転可能なブラシ基板と、前記ブラシ基板上に設けられ、前記ブラシ基板の回転に伴って回転する複数のブラシ毛と、を備え、かつ、前記ミラー面と前記ブラシ毛との距離及び角度を調整するための、距離調整機構及び角度調整機構を有することを特徴とする。この特徴は請求項1から請求項13までの請求項に係る発明に共通する技術的特徴である。 The solar reflective mirror cleaning brush of the present invention is a solar reflective mirror cleaning brush for cleaning the mirror surface by rotating in contact with the mirror surface of the solar reflective mirror, and a rotatable brush substrate And a plurality of brush bristles provided on the brush substrate and rotating as the brush substrate rotates, and a distance for adjusting a distance and an angle between the mirror surface and the brush bristles An adjustment mechanism and an angle adjustment mechanism are provided. This feature is a technical feature common to the inventions according to claims 1 to 13.
 本発明においては、前記距離調整機構又は前記角度調整機構が、付勢機構であることが好適に効果を発現できることから好ましい。具体的には、ばね、ゴム、風船及びダンパーから選ばれる少なくとも1種であることが好ましい。 In the present invention, it is preferable that the distance adjusting mechanism or the angle adjusting mechanism is an urging mechanism because the effect can be suitably expressed. Specifically, at least one selected from a spring, rubber, balloon and damper is preferable.
 本発明においては、前記距離調整機構又は前記角度調整機構が、前記ブラシ基板と前記ブラシ毛との間にあることがより緻密に距離及び角度を調整でき、ひいては、本発明の効果をより適切に発現できるため好ましい。 In the present invention, the distance adjustment mechanism or the angle adjustment mechanism can be more precisely adjusted in distance and angle so that the distance and angle are between the brush substrate and the brush bristles. It is preferable because it can be expressed.
 本発明においては、前記距離調整機構又は前記角度調整機構が、前記ブラシ基板において、前記ブラシ毛とは反対側の面に設けられていることが好適に効果を発現できるため好ましい。 In the present invention, it is preferable that the distance adjusting mechanism or the angle adjusting mechanism is provided on the surface of the brush substrate on the side opposite to the brush bristles because the effect can be suitably exhibited.
 複数のブラシ毛の平均径が、1μm~1mmの範囲内であることがミラー面を傷付けることなく、高い洗浄力が得られるため好ましい。 It is preferable that the average diameter of the plurality of brush bristles is in the range of 1 μm to 1 mm because high detergency can be obtained without damaging the mirror surface.
 本発明においては、複数のブラシ毛が、親水性の繊維毛からなることがミラー面を傷付けることなく高度に洗浄できるため好ましい。 In the present invention, it is preferable that the plurality of brush hairs are made of hydrophilic fiber hairs because they can be highly washed without damaging the mirror surface.
 本発明の太陽光反射ミラー洗浄用ブラシは、前記太陽光反射ミラーのミラー面に当接させて回転させる手段を有する太陽光反射ミラーの洗浄システムに好適に採用できる。 The solar reflective mirror cleaning brush of the present invention can be suitably used in a solar reflective mirror cleaning system having means for rotating the solar reflective mirror in contact with the mirror surface of the solar reflective mirror.
 本発明の太陽光反射ミラー洗浄用ブラシは、当該ブラシを前記太陽光反射ミラーのミラー面に当接させて回転させつつ、前記複数のブラシ毛と太陽光反射ミラーとの距離及び角度を調整することにより、当該ミラー面を洗浄する太陽光反射ミラーの洗浄方法に好適に採用できる。 The brush for cleaning the solar reflective mirror of the present invention adjusts the distance and angle between the plurality of brush hairs and the solar reflective mirror while rotating the brush in contact with the mirror surface of the solar reflective mirror. Thus, it can be suitably employed in a method for cleaning a sunlight reflecting mirror that cleans the mirror surface.
 本発明の太陽光反射ミラー洗浄用ブラシは、太陽光反射ミラーの洗浄装置に好適に具備できる。 The solar reflective mirror cleaning brush of the present invention can be suitably used in a solar reflective mirror cleaning device.
 なお、本発明の太陽光反射ミラー洗浄用ブラシを採用した太陽光反射ミラーの洗浄システム、太陽光反射ミラーの洗浄方法及び太陽光反射ミラーの洗浄装置は、フィルムミラータイプの太陽光反射ミラーに好適に適用できる。 In addition, the solar reflective mirror cleaning system, the solar reflective mirror cleaning method, and the solar reflective mirror cleaning apparatus employing the solar reflective mirror cleaning brush of the present invention are suitable for a film mirror type solar reflective mirror. Applicable to.
 以下、本発明とその構成要素及び本発明を実施するための形態について詳細な説明をする。
 なお、本願において、「~」は、その前後に記載される数値を下限値及び上限値として含む意味で使用する。
Hereinafter, the present invention, its components, and modes for carrying out the present invention will be described in detail.
In the present application, “˜” is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
 ≪太陽光反射ミラー洗浄用ブラシ≫
 図1は、本実施の形態の太陽光反射ミラー洗浄用ブラシ10の底面図である。
 図2は、図1のX-X線における部分断面図である。
 太陽光反射ミラー洗浄用ブラシ10は、図1及び図2に示すように、回転可能なブラシ基板1と、ブラシ基板1上に設けられた取付け器具4を備えている。
 取付け器具4は、後述の図5の例のように、ブラシ基板1と同一の材料により一体的に形成されていてもよいが、図2の例のように、距離調整機構及び角度調整機構41など他の部材を介してブラシ基板1に設けられていてもよい。
 取付け器具4は、ブラシ基板1の回転に伴って回転する複数のブラシ毛2を備えている。
 本発明の太陽光反射ミラー洗浄用ブラシは、太陽光反射ミラーのミラー面に当接して回転することにより、当該ミラー面を洗浄することができる。
≪Sunlight reflection mirror cleaning brush≫
FIG. 1 is a bottom view of the solar reflective mirror cleaning brush 10 of the present embodiment.
FIG. 2 is a partial sectional view taken along line XX of FIG.
As shown in FIGS. 1 and 2, the solar reflective mirror cleaning brush 10 includes a rotatable brush substrate 1 and an attachment device 4 provided on the brush substrate 1.
The attachment device 4 may be integrally formed of the same material as the brush substrate 1 as in the example of FIG. 5 described later, but the distance adjustment mechanism and the angle adjustment mechanism 41 as in the example of FIG. It may be provided on the brush substrate 1 via other members.
The attachment device 4 includes a plurality of brush bristles 2 that rotate as the brush substrate 1 rotates.
The solar reflective mirror cleaning brush of the present invention can clean the mirror surface by rotating in contact with the mirror surface of the solar reflective mirror.
 [ブラシ基板]
 ブラシ基板1は、図1に示すように円形状に形成され、図2に示すようにブラシ基板1の回転中心Cにはシャフトを取り付けるための円孔11が設けられている。
 なお、ブラシ基板において、ブラシ毛とは反対側の面に距離調整機構及び角度調整機構が設けられる場合、当該円孔11には、後述の圧縮コイルばねやダンパーが取り付けられ、当該圧縮コイルばねやダンパーにシャフトが取り付けられるものとしてもよい。
[Brush substrate]
The brush substrate 1 is formed in a circular shape as shown in FIG. 1, and a circular hole 11 for attaching a shaft is provided at the rotation center C of the brush substrate 1 as shown in FIG.
In the brush substrate, when a distance adjustment mechanism and an angle adjustment mechanism are provided on the surface opposite to the brush bristles, a compression coil spring or a damper, which will be described later, is attached to the circular hole 11, and the compression coil spring or A shaft may be attached to the damper.
 ブラシ基板1の材料は特に限定されず、木材、金属、硬質の合成樹脂等により形成することができる。軽量で十分な強度が得られれば特に制限なく使用でき、使用できる合成樹脂例としては、塩化ビニル樹脂、ポリプロピレン樹脂、ABS樹脂(アクリロニトリルブタジエンスチレン樹脂)等が挙げられる。 The material of the brush substrate 1 is not particularly limited, and can be formed of wood, metal, hard synthetic resin, or the like. If it is lightweight and sufficient strength can be obtained, it can be used without particular limitation. Examples of synthetic resins that can be used include vinyl chloride resin, polypropylene resin, ABS resin (acrylonitrile butadiene styrene resin) and the like.
 [ブラシ毛]
 複数のブラシ毛2は、図1に示すように、取付け器具4を介して、ブラシ基板1の全面ではなく部分的に設けられてもよいし、全面に設けられていてもよい。
[Brush hair]
As shown in FIG. 1, the plurality of brush bristles 2 may be provided not only on the entire surface of the brush substrate 1 but also on the entire surface via the attachment device 4.
 複数のブラシ毛2を集合体Gとして、複数の集合体Gを取付け器具を介してブラシ基板1上に配置する場合、回転の安定性、洗浄の均一性等を向上させる観点から、ブラシ毛2の複数の集合体Gは、図1に示す配置パターンのようにブラシ毛2の回転方向に一定間隔で配置されていることが好ましい。 In the case where the plurality of brush hairs 2 are set as the aggregate G, and the plurality of aggregates G are arranged on the brush substrate 1 via an attachment device, the brush hair 2 is improved from the viewpoint of improving rotational stability, cleaning uniformity, and the like. The plurality of aggregates G are preferably arranged at regular intervals in the rotation direction of the bristles 2 as in the arrangement pattern shown in FIG.
 複数のブラシ毛2は取付け器具4上に個々に植設されていてもよいし、複数のブラシ毛2を束ねた毛束として植設されていてもよい。毛束とする場合は弾力性が高く倒れにくいブラシ毛2が得られ、洗浄に必要な応力をミラー面に伝達しやすく、好ましい。 The plurality of brush bristles 2 may be individually planted on the attachment device 4 or may be planted as a bunch of hair bundled with a plurality of brush bristles 2. When bristles are used, it is preferable because the bristle 2 having high elasticity and hardly falls down can be obtained, and stress necessary for cleaning can be easily transmitted to the mirror surface.
 図3は、複数のブラシ毛2が毛束21として植設された取付け器具4の植設部分を示している。
 図3に示すように、毛束21は、複数のブラシ毛2が長さ方向中央で折り曲げられ、折り曲げ部分に止め具22が巻き架けられて束ねられている。毛束21は、取付け器具4に設けられた植設孔13に、折り曲げ部分が押し込まれて植設されている。押し込まれる際、毛束21の止め具22が取付け器具4に食い込み、毛束21は取付け器具4に固定される。止め具22は、毛束21をしっかりと固定し、錆等による劣化を防ぐ観点から、ステンレス等の金属よりなることが好ましい。
 このような取付け器具4を介してブラシ基板1にブラシ毛2を設ける場合、取付け器具4単位で摩耗したブラシ毛2を交換することができる。
FIG. 3 shows a planting portion of the attachment device 4 in which a plurality of brush bristles 2 are planted as a hair bundle 21.
As shown in FIG. 3, the bristle bundle 21 has a plurality of brush bristles 2 bent at the center in the length direction, and a stopper 22 is wound around the bent portion and bundled. The hair bundle 21 is planted by pushing the bent portion into the planting hole 13 provided in the attachment device 4. When pushed, the stopper 22 of the hair bundle 21 bites into the attachment device 4, and the hair bundle 21 is fixed to the attachment device 4. The stopper 22 is preferably made of a metal such as stainless steel from the viewpoint of firmly fixing the hair bundle 21 and preventing deterioration due to rust or the like.
When the bristle 2 is provided on the brush substrate 1 through the mounting tool 4 as described above, the worn bristle 2 in units of the mounting tool 4 can be replaced.
 また、ブラシ毛2の根本付近をバンドにより束ねることもできる。これにより、弾力性が高く倒れにくいブラシ毛2が得られ、洗浄力を高めることもできる。 Also, the vicinity of the base of the brush hair 2 can be bundled with a band. Thereby, the bristle 2 which has high elasticity and is hard to fall down can be obtained, and the cleaning power can be increased.
 取付け器具4によってブラシ基板1上に毛束21が設けられる場合、図2に示すように、取付け器具4とブラシ基板1との間に距離調整機構及び角度調整機構41を設けることにより、ミラー面とブラシ毛2との距離及び角度を調整することとしてもよい。 When the bristle bundle 21 is provided on the brush substrate 1 by the attachment device 4, as shown in FIG. 2, by providing a distance adjustment mechanism and an angle adjustment mechanism 41 between the attachment device 4 and the brush substrate 1, the mirror surface It is good also as adjusting the distance and angle of the brush hair 2.
 (ブラシ毛の平均径)
 複数のブラシ毛2は、モノフィラメント及びマルチフィラメントのいずれの場合も線径が1μm~1mmの範囲内にあることが好ましい。この範囲内であれば、ミラー面を傷付けることなく、高い洗浄力が得られる。
 ブラシ毛2の平均径は、デジタルマイクロスコープVH-5500(KEYENCE社製)により観察することによりその線径を計測することができる。一般的に繊維の太さは場所により異なるため、計測位置を任意に変えて例えば500か所で計測して得られた測定値の平均値をブラシ毛2の平均径とすればよい。
(Average brush hair diameter)
The plurality of brush bristles 2 preferably have a wire diameter in the range of 1 μm to 1 mm in both monofilament and multifilament. Within this range, high cleaning power can be obtained without damaging the mirror surface.
The average diameter of the brush bristles 2 can be measured by observing with a digital microscope VH-5500 (manufactured by KEYENCE). Generally, since the thickness of the fiber varies depending on the location, the average value of the measured values obtained by measuring the measurement position arbitrarily, for example, at 500 locations, may be used as the average diameter of the brush bristles 2.
 複数のブラシ毛2は、水又は水を主成分とする洗浄液(以下、単に「洗浄液」ともいう。)を使用する場合、親水性を示すことが好ましい。親水性を示すブラシ毛2は、供給された水又は水を主成分とする洗浄液をブラシ毛2の表面に濡れ広がらせることができる。太陽光反射ミラーのミラー面にブラシ毛2が接触した際に、ブラシ毛2の表面に濡れ広がった洗浄液によりミラー面上の汚れを効果的に除去することができ、洗浄力が高まる。 The plurality of brush bristles 2 preferably exhibit hydrophilicity when using water or a cleaning liquid containing water as a main component (hereinafter also simply referred to as “cleaning liquid”). The brush bristles 2 exhibiting hydrophilicity can wet and spread the supplied water or a cleaning liquid containing water as a main component on the surface of the brush bristles 2. When the brush bristles 2 come into contact with the mirror surface of the sunlight reflecting mirror, dirt on the mirror surface can be effectively removed by the cleaning liquid wet on the surface of the brush bristles 2, and the cleaning power is increased.
 ブラシ毛2の親水性は、JIS L0105 4.1に準拠して測定される公定水分率により評価することができる。
 公定水分率によりブラシ毛2の親水性を評価する場合、JIS L0105に準拠して標準状態(温度20±2℃、相対湿度65±4%)において測定した公定水分率が1%以上であると、高い洗浄力が得られる。
The hydrophilicity of the brush bristles 2 can be evaluated by an official moisture content measured in accordance with JIS L0105 4.1.
When the hydrophilicity of the bristle 2 is evaluated by the official moisture content, the official moisture content measured in the standard state (temperature 20 ± 2 ° C., relative humidity 65 ± 4%) in accordance with JIS L0105 is 1% or more. High detergency can be obtained.
 ブラシ毛2の親水性を、ブラシ毛2の材料を用いて作製したフィルム又はシート状の試料の水に対する接触角を測定することによっても、評価することができる。具体的には、JIS-R3257に準拠して、温度23℃、相対湿度55%RHの環境下において、フィルム又はシート状の試料上に3μLの水を滴下して30秒後に接触角計DM-300(協和界面科学社製)を用いて測定することができる。測定された接触角が小さいほど、親水性が高いことを示す。
 水に対する接触角によりブラシ毛2の親水性を評価する場合、上記測定方法により測定された接触角が70°以下であると、高い洗浄力が得られる。
The hydrophilicity of the brush bristles 2 can also be evaluated by measuring the contact angle of a film or sheet-like sample produced using the material of the bristles 2 with respect to water. Specifically, in accordance with JIS-R3257, 3 μL of water was dropped on a film or sheet sample in an environment of a temperature of 23 ° C. and a relative humidity of 55% RH, and a contact angle meter DM- after 30 seconds. 300 (manufactured by Kyowa Interface Science Co., Ltd.) can be used for measurement. It shows that hydrophilic property is so high that the measured contact angle is small.
When the hydrophilicity of the brush bristles 2 is evaluated based on the contact angle with water, a high detergency can be obtained when the contact angle measured by the measurement method is 70 ° or less.
 親水性を示すブラシ毛2としては、親水性の繊維毛を用いることができる。
 親水性を有するのであれば、親水性基を有する繊維毛を用いてもよいし、親水化処理により親水性の表層を有する繊維毛を用いることもできる。親水性基としては、例えば水分子と水素結合を形成し得るヒドロキシ基、アミノ基、アミド基、カルボキシ基、エーテル基等が挙げられ、これらの中の2基以上を組み合わせることもできる。
As the bristle 2 exhibiting hydrophilicity, hydrophilic fiber hair can be used.
As long as it has hydrophilicity, the fiber hair which has a hydrophilic group may be used, and the fiber hair which has a hydrophilic surface layer by hydrophilic treatment can also be used. Examples of the hydrophilic group include a hydroxy group, an amino group, an amide group, a carboxy group, and an ether group that can form a hydrogen bond with a water molecule, and two or more of these groups can be combined.
 また、ブラシ毛2は吸水性を有することが好ましく、吸水性を示すブラシ毛2としては吸水性を有する繊維毛を用いることができる。吸水性を有する繊維毛は供給された洗浄液を一旦吸収し、洗浄時に吸収した洗浄液をミラー面上に供給することができる。
 吸水性を有するとは、JIS K 7209の(A法)に準拠して、下記式により求められる吸水率が0.25%以上であることをいう。
 吸水率(%)=(W2-W1)/W1×100
 上記式において、W1は水に浸漬する前の乾燥した繊維毛の試料の質量(mg)を表し、W2は温度23±1℃の水に23~24時間浸漬した後の繊維毛の試料の質量(mg)を表す。
Moreover, it is preferable that the bristle 2 has a water absorptivity, and as the bristle 2 which shows water absorptivity, the fiber hair which has a water absorptivity can be used. The fiber bristles having water absorption can once absorb the supplied cleaning liquid and supply the cleaning liquid absorbed during the cleaning onto the mirror surface.
Having water absorption means that the water absorption obtained by the following formula is 0.25% or more in accordance with (Method A) of JIS K 7209.
Water absorption (%) = (W2−W1) / W1 × 100
In the above formula, W1 represents the mass (mg) of the dried fiber hair sample before being immersed in water, and W2 is the mass of the fiber hair sample after being immersed in water at a temperature of 23 ± 1 ° C. for 23 to 24 hours. (Mg).
 上記親水性及び吸水性を有する繊維毛としては、動物性繊維毛、植物性繊維毛、化学繊維毛等が挙げられ、複数種の繊維毛を組み合わせて使用することもできる。耐久性の観点からは動物性繊維又は化学繊維が好ましく、品質安定性の観点からは化学繊維が好ましい。
 動物性繊維毛としては、特に制限はないが、馬毛、豚毛等が挙げられる。
 植物性繊維毛としては、特に制限はないが、綿、麻、パーム等の繊維毛が挙げられる。
Examples of the fiber hair having hydrophilicity and water absorption include animal fiber hair, plant fiber hair, chemical fiber hair, and the like, and a plurality of types of fiber hair can be used in combination. Animal fibers or chemical fibers are preferable from the viewpoint of durability, and chemical fibers are preferable from the viewpoint of quality stability.
The animal fiber hair is not particularly limited, and examples thereof include horse hair and pig hair.
Although there is no restriction | limiting in particular as vegetable fiber hair, Fiber hairs, such as cotton, hemp, and palm, are mentioned.
 化学繊維毛としては、例えばビニロン、ポリ塩化ビニル(PVC)、ポリプロピレン(PP)等のポリビニル、ポリエチレン(PE)、ポリエチレンテレフタラート等のポリエステル、ナイロン等のポリアミド、アクリル等を原料とする合成繊維毛、セルロース、セルロースエステル等を原料とする半合成繊維毛等が挙げられる。これらの中でも、ナイロン6、ナイロン66(東レ社製)等のナイロンが好ましい。ナイロンは、アミド結合に由来する適度な吸湿性、適度な長さの長鎖脂肪酸からなる分子鎖を繊維軸に配向させやすく、比較的良好な延伸性、融解熱が高く熱容量が大きいことから動力学的にも速度論的にも溶融しにくい耐溶融性、長鎖脂肪酸からなる分子鎖の可撓性等のブラシ毛2の材料として好ましい性質を有している。他にも、アミド結合間の水素結合の形成のためにフィブリル化しにくくキングバンドが生じにくい性質、すなわち繰り返し屈伸性等のナイロンが有する性質もブラシ毛2として利用できる。 As synthetic fiber hair, synthetic fiber hair made of, for example, polyvinylon, polyvinyl chloride (PVC), polypropylene (PP), etc., polyester (polyethylene (PE), polyethylene terephthalate, etc.), nylon (polyamide), acrylic, etc. And semi-synthetic fiber hairs made from cellulose, cellulose ester and the like. Among these, nylon such as nylon 6 and nylon 66 (manufactured by Toray Industries, Inc.) is preferable. Nylon has moderate hygroscopicity derived from amide bonds, easy to orient molecular chains consisting of long-chain fatty acids of moderate length on the fiber axis, relatively good stretchability, high heat of fusion and high heat capacity. It has preferable properties as a material for the brush hair 2 such as melting resistance that is difficult to melt both kinetically and kinetically and flexibility of a molecular chain composed of a long chain fatty acid. In addition, the properties of nylon such as repetitive bending and elongation, such as the property of being difficult to fibrillate and forming a king band due to the formation of hydrogen bonds between amide bonds, can be used as the brush bristles 2.
 [距離調整機構及び角度調整機構]
 距離調整機構及び角度調整機構は、ミラー面とブラシ毛との距離及び角度を調整するための機構である。
 本発明の距離調整機構及び角度調整機構41は、ミラー面を洗浄する際に、ブラシ基板の回転に伴って回転する複数のブラシ毛2を、ミラー面に押圧するように付勢し、ミラー面とブラシ毛2との距離及び角度を調整する。
 これにより、少なくともブラシ単位で、ブラシ毛2を、ミラー面に付勢、押し付けることができる。
 さらに、距離調整機構又は角度調整機構を、ブラシ基板とブラシ毛2との間に設けることで更に細かい単位でブラシ毛2をミラー面に付勢し、押し付けることができる。
 具体的には、例えば、ブラシ基板1と取付け器具4との間に距離調整機構又は角度調整機構を設けることで、取付け器具4ごとに、ブラシ毛2をミラー面に付勢、押し付けることができる。
[Distance adjustment mechanism and angle adjustment mechanism]
The distance adjustment mechanism and the angle adjustment mechanism are mechanisms for adjusting the distance and angle between the mirror surface and the brush bristles.
The distance adjustment mechanism and the angle adjustment mechanism 41 of the present invention urges the plurality of brush bristles 2 that rotate with the rotation of the brush substrate to press the mirror surface when cleaning the mirror surface. And the distance and angle between the brush bristles 2 are adjusted.
Thereby, the bristle 2 can be urged | biased and pressed on a mirror surface at least per brush.
Furthermore, by providing a distance adjusting mechanism or an angle adjusting mechanism between the brush substrate and the brush bristles 2, the bristles 2 can be urged and pressed to the mirror surface in finer units.
Specifically, for example, by providing a distance adjustment mechanism or an angle adjustment mechanism between the brush substrate 1 and the attachment device 4, the brush bristles 2 can be urged and pressed against the mirror surface for each attachment device 4. .
 このような、本発明に係る距離調整機構及び角度調整機構41を有することで、ブラシ単位以下で、ブラシ毛2を、ミラー面に対し、より強く押し込み、拡げることができる。この結果、路面の凹凸の有無や、ロボットアームに搭載される位置に、ブラシの洗浄面積が影響されず、高い洗浄力で均一に洗浄できる。 By having the distance adjusting mechanism and the angle adjusting mechanism 41 according to the present invention as described above, the brush bristles 2 can be pushed more strongly against the mirror surface and expanded in units of brushes or less. As a result, the cleaning area of the brush is not affected by the presence or absence of unevenness on the road surface or the position where it is mounted on the robot arm, and it can be cleaned uniformly with high cleaning power.
 上述のように、本発明のブラシに設けられる距離調整機構又は角度調整機構の位置は、効果発現を阻害しない限り、特に限定されず、例えば、ブラシ基板1において、ブラシ毛2とは反対側の面に設けられてもよいが、ブラシ基板1とブラシ毛2との間にあることが好ましい。 As described above, the position of the distance adjusting mechanism or the angle adjusting mechanism provided in the brush of the present invention is not particularly limited as long as the effect expression is not hindered. For example, in the brush substrate 1, the position opposite to the brush bristles 2 is used. Although it may be provided on the surface, it is preferably between the brush substrate 1 and the brush bristles 2.
 なお、距離調整機構及び角度調整機構41は、上記調整ができるものであれば特に限定されないが、ブラシを付勢する付勢機構であることが好ましい。 The distance adjusting mechanism and the angle adjusting mechanism 41 are not particularly limited as long as the adjustment can be performed, but it is preferable to be an urging mechanism that urges the brush.
 <付勢機構>
 このような付勢機構としては、特に限定されないが、ばね、ゴム、風船及びダンパーから選ばれる少なくとも1種の付勢部材を使用し、洗浄時に、ブラシ毛2を付勢するような機構であってもよい。
<Burning mechanism>
Such an urging mechanism is not particularly limited, but is a mechanism that uses at least one urging member selected from a spring, rubber, a balloon, and a damper, and urges the bristles 2 during cleaning. May be.
 ばねとしては、公知のものを使用できるが、例えば、圧縮コイルばね、板ばね、トーションばねなどが挙げられる。 Known springs can be used, and examples thereof include a compression coil spring, a leaf spring, and a torsion spring.
 ダンパーとしては、衝撃や振動を低減する弾性体を備えた装置など、公知のものを使用できるが、例えば、空気式、油圧式や、窒素ガスなどを有するガススプリングなどを好適に採用できる。 As the damper, a known device such as a device having an elastic body that reduces impact and vibration can be used. For example, a pneumatic spring, a hydraulic spring, a gas spring having nitrogen gas, or the like can be suitably employed.
 ゴムとしては、公知のものを使用でき、形状も、複数のブラシ毛2をミラー面に押圧するように付勢できるものであれば、特に限定されず、中実のものであっても、中空のものであってもよい。 As the rubber, a known rubber can be used, and the shape is not particularly limited as long as it can bias the plurality of brush bristles 2 against the mirror surface. It may be.
 上記付勢部材を1種使用し、本発明に係る距離調整機構及び角度調整機構41としてもよいし、2種以上を組み合わせて距離調整機構及び角度調整機構41としてもよい。 The distance adjusting mechanism and the angle adjusting mechanism 41 according to the present invention may be used by using one type of the urging member, or the distance adjusting mechanism and the angle adjusting mechanism 41 may be combined with two or more types.
 以下、距離調整機構及び角度調整機構41について、具体的な例を図4~図18を用いて説明する。 Hereinafter, specific examples of the distance adjustment mechanism and the angle adjustment mechanism 41 will be described with reference to FIGS.
 図4~図6は、ブラシ毛2がブラシ基板1の全面に設けられたブラシの例である。 4 to 6 are examples of brushes in which the brush bristles 2 are provided on the entire surface of the brush substrate 1. FIG.
 図4は、ブラシ基板1の回転軸方向に伸縮可能な圧縮コイルばねが、取付け器具4とブラシ基板1との間(すなわち、ブラシ基板1とブラシ毛2との間)に複数設けられているブラシの例である。取付け器具4は、当該圧縮コイルばねを介し、ブラシ基板1の回転軸方向に往復自在にブラシ基板1に取り付けられている。
 この例においては、圧縮コイルばねが、距離調整機構及び角度調整機構41である。具体的には、圧縮コイルばねが、ブラシ基板1の回転軸方向に伸縮することで、取付け器具4を介して、ブラシ毛2をミラー面に付勢し、押し付けて、ミラー面とブラシ毛2との距離及び角度を調整する。
 なお、図中の101及び1015は、それぞれ後述する回転駆動部101及びアーム基板1015である。
In FIG. 4, a plurality of compression coil springs that can expand and contract in the direction of the rotation axis of the brush substrate 1 are provided between the attachment device 4 and the brush substrate 1 (that is, between the brush substrate 1 and the brush bristles 2). It is an example of a brush. The attachment device 4 is attached to the brush substrate 1 through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
In this example, the compression coil spring is the distance adjustment mechanism and the angle adjustment mechanism 41. Specifically, when the compression coil spring expands and contracts in the direction of the rotation axis of the brush substrate 1, the brush bristles 2 are urged and pressed against the mirror surface via the attachment device 4, and the mirror surface and the bristles 2 are pressed. And adjust the distance and angle.
In the figure, reference numerals 101 and 1015 denote a rotation driving unit 101 and an arm substrate 1015, which will be described later.
 図5は、図4で使用された圧縮コイルばねが、ブラシ基板1においてブラシ毛2とは反対側の面に一つ設けられているブラシの例である。
 ブラシ基板1は、上記圧縮コイルばねを介し、ブラシ基板1の回転軸方向に往復自在に洗浄装置(図示例では後述の洗浄装置が有する基板)に取り付けられている。
 図5の例においては、圧縮コイルばねが、距離調整機構及び角度調整機構41である。具体的には、圧縮コイルばねが、回転軸方向に伸縮することで、ブラシ基板1を介して、ブラシ毛2をミラー面に付勢し、押し付けて、ミラー面とブラシ毛2との距離及び角度を調整する。
FIG. 5 is an example of a brush in which one compression coil spring used in FIG. 4 is provided on the surface of the brush substrate 1 opposite to the brush bristles 2.
The brush substrate 1 is attached to a cleaning device (a substrate included in a cleaning device described later in the illustrated example) through the compression coil spring so as to reciprocate in the direction of the rotation axis of the brush substrate 1.
In the example of FIG. 5, the compression coil spring is the distance adjustment mechanism and the angle adjustment mechanism 41. Specifically, when the compression coil spring expands and contracts in the direction of the rotation axis, the brush bristles 2 are urged and pressed against the mirror surface via the brush substrate 1, and the distance between the mirror surface and the brush bristles 2 is Adjust the angle.
 図6は、図4で使用された圧縮コイルばねが、ブラシ基板1の回転軸方向に伸縮可能に、取付け器具4とブラシ基板1との間に複数及びブラシ基板1においてブラシ毛2とは反対側の面に一つ、設けられているブラシの例である。
 図6に示す例では、取付け器具4は、上記圧縮コイルばねを介し、ブラシ基板1の回転軸方向に往復自在にブラシ基板1に取り付けられている。
 また、ブラシ基板1は、上記圧縮コイルばねを介し、ブラシ基板1の回転軸方向に往復自在に洗浄装置(図示例では後述の洗浄装置が有する基板)に取り付けられている。
FIG. 6 shows that the compression coil spring used in FIG. 4 can be expanded and contracted in the direction of the rotation axis of the brush substrate 1, and a plurality of attachment devices 4 and the brush substrate 1 are opposite to the brush bristles 2 in the brush substrate 1. It is an example of the brush provided one by the side surface.
In the example shown in FIG. 6, the attachment device 4 is attached to the brush substrate 1 through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
The brush substrate 1 is attached to a cleaning device (a substrate included in a cleaning device described later in the illustrated example) through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
 図7~図9は、図1に示すような、ブラシ毛2の集合体Gを四つ有するブラシの例である。 7 to 9 are examples of a brush having four aggregates G of brush bristles 2 as shown in FIG.
 図7は、図4と同様の圧縮コイルばねが、各取付け器具4とブラシ基板1との間に複数ずつ設けられているブラシの例である。各取付け器具4は、当該圧縮コイルばねを介し、ブラシ基板1の回転軸方向に往復自在にブラシ基板1に取り付けられている。
 この例においては、圧縮コイルばねが、距離調整機構及び角度調整機構41である。具体的には、各取付け器具4に設けられた圧縮コイルばねが、ブラシ基板1の回転軸方向に伸縮する。これにより、取付け器具4ごとに、ブラシ毛2をミラー面に付勢し、押し付けて、ミラー面とブラシ毛2との距離及び角度を調整することができる。
FIG. 7 is an example of a brush in which a plurality of compression coil springs similar to those in FIG. 4 are provided between each attachment device 4 and the brush substrate 1. Each attachment device 4 is attached to the brush substrate 1 through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
In this example, the compression coil spring is the distance adjustment mechanism and the angle adjustment mechanism 41. Specifically, a compression coil spring provided in each attachment device 4 expands and contracts in the direction of the rotation axis of the brush substrate 1. Thereby, the brush hair 2 can be urged | biased and pressed against a mirror surface for every attachment instrument 4, and the distance and angle of a mirror surface and the brush hair 2 can be adjusted.
 図8は、図5において、ブラシ毛2が、取付け器具4を介して、ブラシ基板1の全面ではなく部分的に設けられている他は同様である。 FIG. 8 is the same as FIG. 5 except that the brush bristles 2 are partially provided, not the entire surface of the brush substrate 1, via the attachment device 4.
 図9は、図4で使用された圧縮コイルばねが、各取付け器具4とブラシ基板1との間にそれぞれ二つずつ、ブラシ基板1においてブラシ毛2とは反対側の面に一つ設けられているブラシの例である。
 図9に示す例では、取付け器具4は、上記圧縮コイルばねを介し、ブラシ基板1の回転軸方向に往復自在にブラシ基板1に取り付けられている。
 また、ブラシ基板1は、上記圧縮コイルばねを介し、ブラシ基板1の回転軸方向に往復自在に洗浄装置(図示例では後述の洗浄装置が有する基板)に取り付けられている。
FIG. 9 shows that two compression coil springs used in FIG. 4 are provided between each attachment device 4 and the brush substrate 1, one on the surface of the brush substrate 1 opposite to the brush bristles 2. This is an example of a brush.
In the example shown in FIG. 9, the attachment device 4 is attached to the brush substrate 1 through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
The brush substrate 1 is attached to a cleaning device (a substrate included in a cleaning device described later in the illustrated example) through the compression coil spring so as to reciprocate in the rotation axis direction of the brush substrate 1.
 また、距離調整機構及び角度調整機構41として、上記圧縮コイルばねではなく、板ばねを用いてもよく、例えば、図10及び図11のように、図7及び図9において取付け器具4とブラシ基板1との間に設けられた圧縮コイルばねを、ブラシ基板1側を固定端として矢印方向に弾性変形可能な板ばねに変更し、これにより、取付け器具4を介して、ブラシ毛2をミラー面に付勢し、押し付けて、ミラー面とブラシ毛2との距離及び角度を調整するものとしてもよい。 Further, as the distance adjustment mechanism and the angle adjustment mechanism 41, a plate spring may be used instead of the compression coil spring. For example, as shown in FIGS. 10 and 11, the attachment device 4 and the brush substrate in FIGS. 1 is changed to a leaf spring which can be elastically deformed in the direction of the arrow with the brush substrate 1 side as a fixed end. It is good also as what adjusts the distance and angle of a mirror surface and the bristle 2 by energizing and pressing.
 また、図10及び図11の例において、板ばねと取付け器具4の間に、図12及び図13に示すような、トーションばね付きの蝶番を設け、板ばねの弾力とトーションばねの弾力とによって、ブラシ毛2をミラー面に付勢し、押し付けて、ミラー面とブラシ毛2との距離及び角度を調整することとしてもよい。
 なお、このトーションばね付きの蝶番は、非洗浄時においては、蝶番により任意の角度に取付け器具4を固定し、洗浄時には、トーションばねの弾性力により、ブラシ毛2をミラー面に付勢し、押し付けるものであることが好ましい。
10 and 11, a hinge with a torsion spring as shown in FIGS. 12 and 13 is provided between the leaf spring and the mounting device 4, and the elasticity of the leaf spring and the elasticity of the torsion spring are provided. The brush bristles 2 may be urged against the mirror surface and pressed to adjust the distance and angle between the mirror surface and the brush bristles 2.
The hinge with a torsion spring fixes the attachment device 4 at an arbitrary angle by a hinge when not washed, and urges the brush bristles 2 against the mirror surface by the elastic force of the torsion spring at the time of washing. It is preferable to press.
 また、図14に示すように、図12において、トーションばね付きの蝶番から、蝶番のみに変更し、洗浄時において、当該蝶番によりミラー面とブラシ毛2との角度を調整し、板ばねにより、ブラシ毛2をミラー面に付勢し、押し付けて、ミラー面とブラシ毛2との距離及び角度を調整することとしてもよい。 Further, as shown in FIG. 14, in FIG. 12, the hinge with the torsion spring is changed to only the hinge, and at the time of cleaning, the angle between the mirror surface and the brush bristles 2 is adjusted by the hinge, and the leaf spring The brush bristles 2 may be urged against the mirror surface and pressed to adjust the distance and angle between the mirror surface and the bristles 2.
 また、上述の図5等の例では、ブラシ基板1においてブラシ毛2とは反対側の面に設けられる、距離調整機構及び角度調整機構41は、圧縮コイルばねを使用しているが、これに限定されず、例えば、ブラシ基板1の回転軸方向に屈伸自在なダンパーを使用してもよい。
 図15は、図11に示す例において、圧縮コイルばねの代わりに、ダンパーを使用した例である。
 図16は、図15に示す例において、図14に示すような蝶番をさらに設けた例である。
In the example of FIG. 5 and the like described above, the distance adjustment mechanism and the angle adjustment mechanism 41 provided on the surface of the brush substrate 1 opposite to the brush bristles 2 use compression coil springs. For example, a damper that can bend and stretch in the direction of the rotation axis of the brush substrate 1 may be used.
FIG. 15 shows an example in which a damper is used instead of the compression coil spring in the example shown in FIG.
FIG. 16 is an example in which a hinge as shown in FIG. 14 is further provided in the example shown in FIG.
 また、図12及び図13の例において、蝶番を使用せず、トーションばねのみを使用し、図17及び図18のようにしてもよい。 Also, in the examples of FIGS. 12 and 13, it is possible to use only a torsion spring without using a hinge, as shown in FIGS.
 上述の図4~図18で示した例では、洗浄時に、距離調整機構及び角度調整機構41が、ブラシ毛2を介して受ける、ミラー面からの反作用力に応じて、ブラシ毛2を付勢することで、ミラー面とブラシ毛2との距離及び角度を調整する態様であり、いわば受動的な調整機構であるが、本発明に係る距離調整機構又は角度調整機構は、ミラー面とブラシ毛2との距離及び角度を調整できるものであればよく、上述の図示例に限定されない。例えば、センサーによりミラー面との距離や角度の情報を取得し、当該情報に基づいて、モーターなどにより、ブラシ毛2や取付け器具4を付勢するような、能動的に距離や角度を調整する態様であってもよい。 In the example shown in FIGS. 4 to 18, the distance adjusting mechanism and the angle adjusting mechanism 41 urge the brush bristles 2 according to the reaction force from the mirror surface received through the bristles 2 during cleaning. In this manner, the distance and angle between the mirror surface and the brush bristles 2 are adjusted, which is a passive adjustment mechanism, so that the distance adjustment mechanism or the angle adjustment mechanism according to the present invention includes the mirror surface and the brush bristles. It is only necessary that the distance and angle with 2 can be adjusted, and the present invention is not limited to the example shown above. For example, information on the distance and angle with the mirror surface is acquired by a sensor, and the distance and angle are actively adjusted based on the information by energizing the brush bristles 2 and the attachment device 4 with a motor or the like. An aspect may be sufficient.
 また、距離調整機構及び角度調整機構41は、上記調整ができれば、その設置位置は限定されないが、上記図示例のように、ブラシ基板とブラシ毛2との間にあることが、ブラシ単位以下、例えば、取付け器具4単位などで、より緻密に上記距離及び角度の調整をできるため好ましい。
 そのほか、距離調整機構及び角度調整機構41は、上記図示例のように、ブラシ基板1において、ブラシ毛2とは反対側の面に設けられていてもよい。
Moreover, the distance adjustment mechanism and the angle adjustment mechanism 41 are not limited to the installation position as long as the adjustment can be performed, but as shown in the illustrated example, the distance between the brush substrate and the bristles 2 may be less than a brush unit, For example, it is preferable because the distance and angle can be adjusted more precisely with 4 units of fixtures.
In addition, the distance adjusting mechanism and the angle adjusting mechanism 41 may be provided on the surface of the brush substrate 1 opposite to the brush bristles 2 as shown in the illustrated example.
 また、図示例のように、距離調整機構及び角度調整機構41は、一つのブラシに対し、複数設けられていてもよく、さらには、ブラシ基板1とブラシ毛2との間と、ブラシ毛2とは反対側の面と、の両方に設けられていてもよい。 Further, as shown in the illustrated example, a plurality of the distance adjustment mechanism and the angle adjustment mechanism 41 may be provided for one brush, and further, between the brush substrate 1 and the brush bristles 2 and the brush bristles 2. It may be provided on both of the opposite surface.
 また、距離調整機構及び角度調整機構41が複数設けられる場合、距離調整及び角度調整をする手段は、一つの手段により距離調整及び角度調整を行う形態であってもよい。このような形態としては、例えば、板ばねによって距離及び角度を調整することが挙げられる。
 また、距離調整と角度調整を別々に行う形態であってもよい。このような形態としては、具体的には、例えば、コイルばねで距離を調整し、トーションばねや蝶番で角度を調整させることが挙げられる。
When a plurality of distance adjustment mechanisms and angle adjustment mechanisms 41 are provided, the means for adjusting the distance and adjusting the angle may be configured to perform the distance adjustment and the angle adjustment by one means. As such a form, for example, the distance and the angle are adjusted by a leaf spring.
Moreover, the form which performs distance adjustment and angle adjustment separately may be sufficient. Specifically, for example, the distance is adjusted with a coil spring, and the angle is adjusted with a torsion spring or a hinge.
 〔太陽光反射ミラー〕
 洗浄の対象である太陽光反射ミラーは、ミラー基板上に少なくとも反射層を備えて構成されている。太陽光反射ミラーの表面には、洗浄液による洗浄力を高めるために、親水性層を形成することもできる。一方、汚れの付着を抑えるため、撥水性層を形成することもできる。
[Sunlight reflection mirror]
A sunlight reflecting mirror to be cleaned is configured to include at least a reflective layer on a mirror substrate. A hydrophilic layer can also be formed on the surface of the sunlight reflecting mirror in order to increase the cleaning power of the cleaning liquid. On the other hand, a water-repellent layer can be formed in order to suppress the adhesion of dirt.
 本発明のブラシにより洗浄する太陽光反射ミラーは、ガラスミラータイプ及びフィルムミラータイプのいずれであってもよい。中でも、フィルムミラータイプは、可撓性があり変形しやすいため、ミラー面に当接したブラシからの応力が分散され、傷付きにくい上、ブラシをミラー面に均等に当接させて均一な洗浄が可能であり、ブラシの洗浄力が向上することから、好ましい。
 また、フィルムミラータイプの場合、太陽光反射ミラーを軽量化することができる他、フィルムを搬送して反射層を含む機能層を連続的に形成できることから、高い生産性、性能安定性及びコストダウンが期待できる。さらに、ミラー基板を低温で生産できることから省エネルギー化も期待できる。廃棄時も低温処理が可能であり、リサイクルも可能な場合があることから、ライフサイクル全体としてエネルギー使用量を低減できる可能性があり、次世代太陽光反射ミラーとして期待されている。
The sunlight reflecting mirror cleaned with the brush of the present invention may be either a glass mirror type or a film mirror type. Above all, the film mirror type is flexible and easily deformed, so the stress from the brush in contact with the mirror surface is dispersed and not easily damaged, and the brush is evenly contacted with the mirror surface for uniform cleaning. This is preferable because the cleaning power of the brush is improved.
In addition, in the case of the film mirror type, it is possible to reduce the weight of the solar reflective mirror and to continuously form a functional layer including a reflective layer by transporting the film, resulting in high productivity, performance stability and cost reduction. Can be expected. In addition, energy savings can be expected because mirror substrates can be produced at low temperatures. Since it can be treated at low temperature during disposal and may be recyclable, energy consumption can be reduced throughout the life cycle, and is expected as a next-generation solar reflective mirror.
 図19は、フィルムミラータイプの一例である太陽光反射ミラー30の概略構成を示す断面図である。
 図19に示すように、太陽光反射ミラー30は、樹脂フィルム31上にアンカー層32、反射層33、腐食防止層34、接着層35、紫外線吸収層36、ハードコート層37及び親水性層38を備えている。太陽光反射ミラー30の使用時、太陽光Aが親水性層38側から入射するように太陽光反射ミラー30が配置される。
FIG. 19 is a cross-sectional view showing a schematic configuration of a sunlight reflecting mirror 30 which is an example of a film mirror type.
As shown in FIG. 19, the sunlight reflecting mirror 30 includes an anchor layer 32, a reflecting layer 33, a corrosion preventing layer 34, an adhesive layer 35, an ultraviolet absorbing layer 36, a hard coat layer 37, and a hydrophilic layer 38 on a resin film 31. It has. When the sunlight reflecting mirror 30 is used, the sunlight reflecting mirror 30 is arranged so that sunlight A enters from the hydrophilic layer 38 side.
 (樹脂フィルム)
 樹脂フィルム31は、太陽光反射ミラー30をフィルム状にすることができるのであれば、従来公知の樹脂フィルムを用いることができる。
 樹脂フィルム31の厚さは、樹脂の種類に応じた厚さとすることができ、一般的には10~400μmの範囲内が好ましく、20~300μmの範囲内がより好ましい。
(Resin film)
As the resin film 31, a conventionally known resin film can be used as long as the sunlight reflecting mirror 30 can be formed into a film shape.
The thickness of the resin film 31 can be set according to the type of resin, and is generally preferably in the range of 10 to 400 μm, more preferably in the range of 20 to 300 μm.
 (アンカー層)
 アンカー層32は、樹脂フィルム31と反射層33の接着性を高めるため、樹脂フィルム31と反射層33間に設けられている。アンカー層32により、耐熱性を高めて、反射層33の形成時の発熱による樹脂フィルム31の劣化を防ぐこともできる。また、樹脂フィルム31の表面を平滑化することができ、反射層33の反射率の低下を防ぐことも可能である。
(Anchor layer)
The anchor layer 32 is provided between the resin film 31 and the reflective layer 33 in order to improve the adhesiveness between the resin film 31 and the reflective layer 33. The anchor layer 32 can improve heat resistance and prevent the resin film 31 from being deteriorated due to heat generated when the reflective layer 33 is formed. Moreover, the surface of the resin film 31 can be smoothed, and it is also possible to prevent the reflectance of the reflective layer 33 from decreasing.
 アンカー層32は、例えばポリエステル系樹脂、アクリル系樹脂、メラミン系樹脂等を用いて、グラビアコート法、リバースコート法等により樹脂フィルム31上に塗布することによって形成することができる。
 アンカー層32の厚さは、密着性、平滑性及び反射率を高める観点から、0.01~3.00μmの範囲内にあることが好ましく、0.1~1.0μmの範囲内にあることがより好ましい。
The anchor layer 32 can be formed by applying the resin layer 31 on the resin film 31 by a gravure coating method, a reverse coating method, or the like using, for example, a polyester resin, an acrylic resin, a melamine resin, or the like.
The thickness of the anchor layer 32 is preferably in the range of 0.01 to 3.00 μm, and preferably in the range of 0.1 to 1.0 μm, from the viewpoint of improving adhesion, smoothness, and reflectance. Is more preferable.
 (反射層)
 反射層33は、太陽光反射ミラー30に入射した太陽光を反射するために設けられている。
 反射層33の反射率は、太陽光を効率的に集光する観点から、80%以上であることが好ましく、90%以上であることがより好ましい。反射層33の反射率とは正反射率をいう。
(Reflective layer)
The reflection layer 33 is provided to reflect sunlight incident on the sunlight reflecting mirror 30.
The reflectance of the reflective layer 33 is preferably 80% or more and more preferably 90% or more from the viewpoint of efficiently collecting sunlight. The reflectance of the reflective layer 33 refers to regular reflectance.
 反射層33の材料としては、アルミニウム、銀、クロム、ニッケル、チタン、マグネシウム等の金属を用いることができる。中でも、高い反射率及び耐食性を得る観点から、アルミニウム又は銀が好ましく、銀がより好ましい。
 反射層33は、上記材料を用いて、湿式法又は乾式法により形成することができる。湿式法とはめっき法の総称であり、溶液から金属を析出させて金属膜を形成する方法であり、銀鏡反応を利用した銀めっきの形成方法もその一つである。乾式法とは真空成膜法の総称であり、抵抗加熱型、イオンビームアシスト型等の真空蒸着法、イオンプレーティング法、スパッター法等が挙げられる。
As a material of the reflective layer 33, metals such as aluminum, silver, chromium, nickel, titanium, and magnesium can be used. Among these, from the viewpoint of obtaining high reflectance and corrosion resistance, aluminum or silver is preferable, and silver is more preferable.
The reflective layer 33 can be formed by a wet method or a dry method using the above materials. The wet method is a general term for a plating method, which is a method of forming a metal film by depositing a metal from a solution, and a method of forming silver plating using a silver mirror reaction is one of them. The dry method is a general term for vacuum film forming methods, and examples thereof include resistance heating type, ion beam assist type vacuum deposition methods, ion plating methods, sputtering methods, and the like.
 (腐食防止層)
 腐食防止層34は、反射層33の腐食を防止するため、腐食防止剤を含有している。
 腐食防止剤は、反射層33に銀が用いられている場合、アミン類及びその誘導体、ピロール環、トリアゾール環、ピラゾール環、チアゾール環、インダゾール環等を有する化合物、銅キレート化合物、チオ尿素類等の銀に対する吸着性を有する化合物であることが好ましい。
(Corrosion prevention layer)
The corrosion prevention layer 34 contains a corrosion inhibitor to prevent the reflection layer 33 from being corroded.
When silver is used for the reflective layer 33, the corrosion inhibitor is a compound having amines and derivatives thereof, pyrrole ring, triazole ring, pyrazole ring, thiazole ring, indazole ring, etc., copper chelate compound, thiourea, etc. It is preferable that it is a compound which has the adsorptivity with respect to silver.
 (接着層)
 接着層35は、腐食防止層34と紫外線吸収層36間において両者の接着性を高めるために設けられている。
 接着層35は、アンカー層32と同様に形成することができる。
(Adhesive layer)
The adhesive layer 35 is provided between the corrosion prevention layer 34 and the ultraviolet absorbing layer 36 in order to improve the adhesion between them.
The adhesive layer 35 can be formed in the same manner as the anchor layer 32.
 (紫外線吸収層)
 紫外線吸収層36は、入射する太陽光Aの紫外線による各層の劣化を防止するために設けられている。
 紫外線吸収層36は、太陽光反射ミラー30の可撓性及び耐候性を高め、軽量化を図る観点から、紫外線吸収基を有するか、紫外線吸収剤を含有するアクリル樹脂層であることが好ましい。紫外線吸収剤としては、例えばベンゾフェノン系、ベンゾトリアゾール系、サリチル酸フェニル系、トリアジン系、ベンゾエート系等の有機化合物の他、酸化チタン、酸化亜鉛、酸化セリウム、酸化鉄等の無機化合物が挙げられる。
(UV absorbing layer)
The ultraviolet absorption layer 36 is provided in order to prevent deterioration of each layer due to the ultraviolet rays of the incident sunlight A.
The ultraviolet absorbing layer 36 is preferably an acrylic resin layer having an ultraviolet absorbing group or containing an ultraviolet absorber from the viewpoint of increasing the flexibility and weather resistance of the sunlight reflecting mirror 30 and reducing the weight. Examples of the ultraviolet absorber include inorganic compounds such as titanium oxide, zinc oxide, cerium oxide, and iron oxide in addition to organic compounds such as benzophenone, benzotriazole, phenyl salicylate, triazine, and benzoate.
 (ハードコート層)
 ハードコート層37は、各層の損傷を防止するために設けられている。
 ハードコート層37は、アクリル系樹脂、ウレタン系樹脂、メラミン系樹脂、エポキシ系樹脂、有機シリケート化合物、シリコーン系樹脂等を塗布することにより、形成することができる。
(Hard coat layer)
The hard coat layer 37 is provided to prevent damage to each layer.
The hard coat layer 37 can be formed by applying an acrylic resin, a urethane resin, a melamine resin, an epoxy resin, an organic silicate compound, a silicone resin, or the like.
 ハードコート層37は、界面活性剤、レベリング剤、帯電防止剤等の添加剤を含有することができる。
 界面活性剤は、ハードコート層37の表面の平滑化に有効である。使用できる界面活性剤の具体例としては、上述した水又は水を主成分とする洗浄液が含有できる界面活性剤と同様の例が挙げられる。
 レベリング剤は、表面の小さな凹凸低減に効果的である。レベリング剤としては、例えば、シリコーン系レベリング剤として、ジメチルポリシロキサン-ポリオキシアルキレン共重合体(例えば、東レ・ダウコーニング(株)製のSH190)が好適である。
 帯電防止剤は、洗浄液を使用する場合、当該洗浄液によるミラー面の洗浄力を向上させることに有効である。帯電防止剤により、ハードコート層37が導電性を持つことにより、フィルムミラーユニット表面の電気抵抗値を小さくすることが可能となる。ハードコート層37に隣接する層として又はハードコート層37との間に極薄い層を介して、帯電防止層を形成することによっても太陽光反射ミラー30のミラー面の電気抵抗値を小さくし、洗浄液による洗浄力を向上させることが可能である。
The hard coat layer 37 can contain additives such as a surfactant, a leveling agent, and an antistatic agent.
The surfactant is effective for smoothing the surface of the hard coat layer 37. Specific examples of the surfactant that can be used include the same examples as the surfactant that can be contained in the above-described water or a cleaning liquid containing water as a main component.
Leveling agents are effective in reducing small irregularities on the surface. As the leveling agent, for example, a dimethylpolysiloxane-polyoxyalkylene copolymer (for example, SH190 manufactured by Toray Dow Corning Co., Ltd.) is suitable as the silicone leveling agent.
The antistatic agent is effective in improving the cleaning power of the mirror surface by the cleaning liquid when the cleaning liquid is used. When the hard coat layer 37 has conductivity due to the antistatic agent, the electric resistance value on the surface of the film mirror unit can be reduced. By forming an antistatic layer as a layer adjacent to the hard coat layer 37 or through an extremely thin layer between the hard coat layer 37, the electrical resistance value of the mirror surface of the solar reflective mirror 30 is reduced, It is possible to improve the cleaning power by the cleaning liquid.
 (親水性層)
 親水性層38は、洗浄液による洗浄力を高める観点から、最表面に設けられ得る。親水性層38は、図19に示すようにハードコート層37上に設けられていてもよいし、ハードコート層37に代えて設けられていてもよい。
 親水性層38が示す親水性としては、洗浄液による高い洗浄力を得る観点から、親水性層38の表面の水との接触角が30°以下であることが好ましく、20°以下であることがより好ましい。
 水との接触角(°)は、JIS-R3257に準拠して、温度23℃、相対湿度55%RHの環境下において、親水性層38上に3μLの水を滴下して30秒後に接触角計DM-300(協和界面化学社製)を用いて測定することができる。測定された接触角が小さいほど、親水性が高いことを示す。
(Hydrophilic layer)
The hydrophilic layer 38 can be provided on the outermost surface from the viewpoint of increasing the cleaning power by the cleaning liquid. The hydrophilic layer 38 may be provided on the hard coat layer 37 as shown in FIG. 19 or may be provided in place of the hard coat layer 37.
The hydrophilicity exhibited by the hydrophilic layer 38 is preferably 30 ° or less, more preferably 20 ° or less, from the viewpoint of obtaining a high detergency with the cleaning liquid, with respect to the surface of the hydrophilic layer 38 with water. More preferred.
The contact angle with water (°) was 30 seconds after 3 μL of water was dropped on the hydrophilic layer 38 in an environment of a temperature of 23 ° C. and a relative humidity of 55% RH in accordance with JIS-R3257. It can be measured using a total of DM-300 (manufactured by Kyowa Interface Chemical Co., Ltd.). It shows that hydrophilic property is so high that the measured contact angle is small.
 親水性層38は、表面の水との接触角を30°以下とするため、親水化剤を含有することができる。
 使用できる親水化剤としては、金属元素を含む化合物が挙げられ、例えばSi、Ti、Al、Sn、Fe、Zn、Sb、Zn等の金属元素を含む金属酸化物、金属窒化物、金属炭化物等が挙げられる。
The hydrophilic layer 38 can contain a hydrophilizing agent in order to make the contact angle with water on the surface 30 ° or less.
Examples of the hydrophilizing agent that can be used include compounds containing metal elements, such as metal oxides, metal nitrides, metal carbides containing metal elements such as Si, Ti, Al, Sn, Fe, Zn, Sb, and Zn. Is mentioned.
 より親水性を高めるため、親水性層38は、上記金属元素を含む化合物に加えて、シリカ粒子、アルミナ粒子、チタニア粒子、ジルコニア粒子等の金属粒子を含有することもできる。金属粒子を用いることにより、表面粗さが大きくなり親水性を向上させて、接触角が30°以下の親水性層38を形成することができる。また、表面粗さが大きいと、親水性層38の表面に汚れが付着しづらくなり、洗浄液が親水性層38と汚れの間に浸入して汚れを除去しやすくなる。
 また、親水性層38は、シリケート化合物、Si-N結合を基本骨格とするポリシラザン等を含有してもよい。併用できるシリケート化合物としては、例えばテトラヒドロキシシラン、テトラメトキシシラン、テトラエトキシシラン、テトラエトキシオキシシラン等が挙げられる。
In order to further increase the hydrophilicity, the hydrophilic layer 38 can also contain metal particles such as silica particles, alumina particles, titania particles, zirconia particles, in addition to the compound containing the metal element. By using metal particles, the surface roughness is increased, the hydrophilicity is improved, and the hydrophilic layer 38 having a contact angle of 30 ° or less can be formed. Further, if the surface roughness is large, it becomes difficult for dirt to adhere to the surface of the hydrophilic layer 38, and the cleaning liquid enters between the hydrophilic layer 38 and the dirt, so that the dirt is easily removed.
Further, the hydrophilic layer 38 may contain a silicate compound, polysilazane having a Si—N bond as a basic skeleton, or the like. Examples of the silicate compound that can be used in combination include tetrahydroxysilane, tetramethoxysilane, tetraethoxysilane, and tetraethoxyoxysilane.
 親水性層38は、親水化剤として、太陽光によって親水性化する光触媒を含有する層であることもできる。光触媒は、伝導帯と価電子帯間のバンドギャップよりも大きいエネルギーの光が照射されると、価電子帯中の電子が励起し、伝導電子と正孔を生成する物質である。
 光触媒を含有することにより、太陽光反射ミラー30のミラー面に付着した汚れの分解作用を得ることができ、さらに高い親水性も得ることができる。
The hydrophilic layer 38 can also be a layer containing a photocatalyst that is rendered hydrophilic by sunlight as a hydrophilizing agent. A photocatalyst is a substance that, when irradiated with light having energy larger than the band gap between the conduction band and the valence band, the electrons in the valence band are excited to generate conduction electrons and holes.
By containing the photocatalyst, it is possible to obtain a decomposition action of dirt adhered to the mirror surface of the sunlight reflecting mirror 30, and it is possible to obtain higher hydrophilicity.
 親水性層38が含有できる光触媒としては、例えばアナターゼ型の酸化チタン(バンドギャップ;3.2eV)、ルチル型の酸化チタン(バンドギャップ;3.0eV)、酸化亜鉛(バンドギャップ;3.2eV)、酸化スズ(バンドギャップ;3.5eV)、酸化タングステン(バンドギャップ;2.5eV)、タンタル酸カリウム(バンドギャップ;3.4eV)、チタン酸ストロンチウム(バンドギャップ;3.2eV)、酸化ジルコニウム(バンドギャップ;5.0eV)、酸化ニオブ(バンドギャップ;3.4eV)等が挙げられる。なお、光触媒のバンドギャップは、光触媒の結晶構造、精製度等によって分布を有するため、実際に測定されるバッドギャップは前述したバンドギャップと±0.2eV程度の差がある場合がある。 Examples of the photocatalyst that can be included in the hydrophilic layer 38 include anatase type titanium oxide (band gap; 3.2 eV), rutile type titanium oxide (band gap; 3.0 eV), and zinc oxide (band gap; 3.2 eV). , Tin oxide (band gap; 3.5 eV), tungsten oxide (band gap; 2.5 eV), potassium tantalate (band gap; 3.4 eV), strontium titanate (band gap; 3.2 eV), zirconium oxide ( Band gap; 5.0 eV), niobium oxide (band gap; 3.4 eV), and the like. Note that since the band gap of the photocatalyst has a distribution depending on the crystal structure of the photocatalyst, the degree of purification, and the like, the actually measured bad gap may have a difference of about ± 0.2 eV from the band gap described above.
 親水性層38は、光触媒活性を高めるため、Pt、Pd、Ru、Rh、Ir、Os等の白金族金属を少量含有することができる。
 また、親水性層38は、光触媒とともに、前述したシリカ粒子、アルミナ粒子、チタニア粒子、ジルコニア粒子等の金属粒子の他、シリケート化合物、Si-N結合を基本骨格とするポリシラザン等を併用することができる。
The hydrophilic layer 38 can contain a small amount of a platinum group metal such as Pt, Pd, Ru, Rh, Ir, Os, etc. in order to enhance the photocatalytic activity.
In addition, the hydrophilic layer 38 can be used in combination with the photocatalyst and metal particles such as silica particles, alumina particles, titania particles, zirconia particles, silicate compound, polysilazane having a Si—N bond as a basic skeleton, and the like. it can.
 光触媒を含有する親水性層38は、光触媒粒子の分散液を従来公知のコート法により塗布することにより形成することができる。
 樹脂フィルム31の耐熱性が高い場合、光触媒を含有する親水性層38は、ゾル塗布焼成法、有機チタネート法、真空成膜法等によって形成することもできる。
 ゾル塗布焼成法は、アナターゼ型酸化チタンゾルを、グラビアコート法、リバースコート法、ダイコート法等のコート法により塗布した後、焼成する方法である。
 有機チタネート法は、有機チタネートを部分的又は完全に加水分解を進行させて得られた塗布液を、グラビアコート法等の従来公知のコート法により塗布し、乾燥させる方法である。乾燥により、有機チタネートの加水分解が完結して水酸化チタンが生成し、水酸化チタンの脱水縮重合により無定型酸化チタンの層が形成される。その後、アナターゼの結晶化温度以上の温度で焼成し、無定型酸化チタンをアナターゼ型酸化チタンに相転移させる。
 真空成膜法は、真空蒸着法、スパッター法等により無定型酸化チタン層を形成する方法である。その後、焼成によりアナターゼ型酸化チタンに相転移させる。
The hydrophilic layer 38 containing a photocatalyst can be formed by applying a dispersion of photocatalyst particles by a conventionally known coating method.
When the heat resistance of the resin film 31 is high, the hydrophilic layer 38 containing a photocatalyst can be formed by a sol coating baking method, an organic titanate method, a vacuum film forming method, or the like.
The sol coating and baking method is a method in which anatase-type titanium oxide sol is applied by a coating method such as a gravure coating method, a reverse coating method, or a die coating method, followed by baking.
The organic titanate method is a method in which a coating solution obtained by partially or completely hydrolyzing an organic titanate is applied by a conventionally known coating method such as a gravure coating method and dried. By drying, hydrolysis of the organic titanate is completed to produce titanium hydroxide, and an amorphous titanium oxide layer is formed by dehydration condensation polymerization of titanium hydroxide. Thereafter, firing is performed at a temperature equal to or higher than the crystallization temperature of anatase, and amorphous titanium oxide is phase-transformed into anatase-type titanium oxide.
The vacuum film formation method is a method of forming an amorphous titanium oxide layer by a vacuum deposition method, a sputtering method, or the like. Thereafter, phase transition is made to anatase-type titanium oxide by firing.
 親水性層38は、水との接触角が30°以下となる親水性を示すのであれば、基材表面にプラズマ処理、エッチング処理等の表面処理が施された層であってもよい。 The hydrophilic layer 38 may be a layer in which a surface treatment such as a plasma treatment or an etching treatment is performed on the surface of the substrate as long as the hydrophilic layer 38 exhibits hydrophilicity such that the contact angle with water is 30 ° or less.
 なお、親水性層38の下層が紫外線吸収層36である場合、親水性層38と紫外線吸収層36の間に無機コート層が設けられていてもよい。親水性層38が光触媒を含有する場合、無機コート層によって、紫外線吸収層36が含有するアクリル樹脂等の有機化合物が光触媒によって分解されることを防ぐことができる。
 この無機コート層の材料としては、例えばテトラエトキシシラン等のシリケート化合物、メタノール等のアルコールを含有する層等が挙げられる。また、無機コート層は、親水性層38と紫外線吸収層36の接着性を高めるため、親水性層38の構成成分又は紫外線吸収層の構成成分を含有することができる。無機コート層は単層であっても複数層であってもよい。
When the lower layer of the hydrophilic layer 38 is the ultraviolet absorbing layer 36, an inorganic coat layer may be provided between the hydrophilic layer 38 and the ultraviolet absorbing layer 36. When the hydrophilic layer 38 contains a photocatalyst, the inorganic coat layer can prevent the organic compound such as an acrylic resin contained in the ultraviolet absorption layer 36 from being decomposed by the photocatalyst.
Examples of the material for the inorganic coating layer include a silicate compound such as tetraethoxysilane and a layer containing an alcohol such as methanol. Further, the inorganic coat layer can contain a constituent component of the hydrophilic layer 38 or a constituent component of the ultraviolet absorbing layer in order to improve the adhesiveness between the hydrophilic layer 38 and the ultraviolet absorbing layer 36. The inorganic coat layer may be a single layer or a plurality of layers.
 親水性層38の厚さは、親水性層38の屈折率、含有成分、太陽光反射ミラー30に入射する太陽光のうち、発電に利用する光の波長範囲等に応じて、好適な層厚を選択すればよい。できるだけ広い波長範囲を利用することが発電効率の向上につながるため、親水性層38による光吸収を考慮すると、厚さは薄いことが好ましい。親水性を発現するのは極表層であるため、数nm程度の厚さがあれば、液膜の形成に必要な親水性を発現することができる。
 光触媒粒子を用いて親水性層38を形成する場合は、光触媒粒子の保持及び脱落防止の観点から、少なくとも光触媒粒子の粒子径の1/2程度以上の層厚が必要であり、例えば平均粒子径が10nmであれば5nm以上の層厚が必要である。光触媒を含有する親水性層38を蒸着法、スパッター法等により形成する場合は、光触媒の機能を発現するための層厚、すなわち結晶構造が成立する層厚が必要であり、光触媒粒子を含有する場合と同様に5nm以上の層厚が必要である。
 上記の観点から、一般的には、親水性層38の厚さを、5~300nmの範囲内で選択することができる。
The thickness of the hydrophilic layer 38 is a suitable layer thickness depending on the refractive index of the hydrophilic layer 38, the contained components, the wavelength range of the light used for power generation among the sunlight incident on the sunlight reflecting mirror 30, and the like. Should be selected. Since use of a wavelength range as wide as possible leads to an improvement in power generation efficiency, it is preferable that the thickness is thin in consideration of light absorption by the hydrophilic layer 38. Since it is the extreme surface layer that expresses hydrophilicity, if it has a thickness of about several nanometers, hydrophilicity necessary for forming a liquid film can be expressed.
In the case of forming the hydrophilic layer 38 using photocatalyst particles, a layer thickness of at least about ½ of the particle diameter of the photocatalyst particles is necessary from the viewpoint of retention of the photocatalyst particles and prevention of falling off. If the thickness is 10 nm, a layer thickness of 5 nm or more is necessary. When the hydrophilic layer 38 containing a photocatalyst is formed by vapor deposition, sputtering, or the like, a layer thickness for expressing the photocatalyst function, that is, a layer thickness that establishes a crystal structure is required, and the photocatalyst particles are contained. As in the case, a layer thickness of 5 nm or more is necessary.
From the above viewpoint, in general, the thickness of the hydrophilic layer 38 can be selected within a range of 5 to 300 nm.
 親水性層38は、ハードコート層37と同様に、界面活性剤、レベリング剤、帯電防止剤等の添加剤を含有することもできる。 The hydrophilic layer 38 can also contain additives such as a surfactant, a leveling agent, and an antistatic agent, like the hard coat layer 37.
 図20は、ガラスミラーの一例である太陽光反射ミラー30Bの概略構成を示す断面図である。
 図20に示すように、太陽光反射ミラー30Bは、ガラス板をガラス層39として、ガラス層39上に反射層33及び腐食防止層34が形成されている。反射層33及び腐食防止層34は、上述した太陽光反射ミラー30の反射層33及び腐食防止層34と同じ層である。太陽光反射ミラー30Bの使用時には、太陽光Aがガラス層39側から入射するように配置される。ガラス層39の厚さは特に限定されないが、例えば1~5mmの範囲内とすることができる。
FIG. 20 is a cross-sectional view illustrating a schematic configuration of a sunlight reflecting mirror 30B which is an example of a glass mirror.
As shown in FIG. 20, in the sunlight reflecting mirror 30 </ b> B, a glass plate is used as a glass layer 39, and a reflective layer 33 and a corrosion prevention layer 34 are formed on the glass layer 39. The reflection layer 33 and the corrosion prevention layer 34 are the same layers as the reflection layer 33 and the corrosion prevention layer 34 of the solar light reflecting mirror 30 described above. When the sunlight reflecting mirror 30B is used, the sunlight A is arranged so as to enter from the glass layer 39 side. The thickness of the glass layer 39 is not particularly limited, but can be, for example, in the range of 1 to 5 mm.
 ≪太陽光反射ミラーの洗浄装置≫
 太陽光反射ミラーの洗浄装置は、ブラシにより太陽光反射ミラーのミラー面を洗浄する太陽光反射ミラーの洗浄装置であり、本発明の太陽光反射ミラー洗浄用ブラシを太陽光反射ミラーのミラー面に当接させて回転させる駆動手段を備えている。
≪Sunlight reflection mirror cleaning device≫
The solar reflective mirror cleaning device is a solar reflective mirror cleaning device for cleaning the mirror surface of the solar reflective mirror with a brush, and the solar reflective mirror cleaning brush of the present invention is applied to the mirror surface of the solar reflective mirror. Drive means for rotating in contact is provided.
 図21は、一実施の形態として、太陽熱発電装置に用いられた太陽光反射ミラー30のミラー面を洗浄する太陽光反射ミラーの洗浄装置100を示している。
 太陽熱発電装置は、曲面状に配置された複数の太陽光反射ミラー30により太陽光を集熱管80に集光し、集熱管80により移送する熱媒体を加熱して当該熱媒体の熱エネルギーを電気エネルギーに変換する発電装置である。
 太陽熱発電装置において、複数の太陽光反射ミラー30は曲面状の金属板等の支持体に固定され、1枚の大きなミラー面を形成するように支持部材51によって支持されている。複数の太陽光反射ミラー30により太陽光を集光する位置には集熱管80が配置されている。太陽光の入射角度に合わせて複数の太陽光反射ミラー30を回転できるように、支持部材51を回転駆動するミラー角度調整部53が設けられている。
FIG. 21 shows a solar reflective mirror cleaning apparatus 100 for cleaning the mirror surface of the solar reflective mirror 30 used in the solar thermal power generation apparatus as one embodiment.
The solar thermal power generation apparatus condenses sunlight on a heat collecting tube 80 by a plurality of sunlight reflecting mirrors 30 arranged in a curved surface, heats the heat medium transferred by the heat collecting tube 80, and electrically converts the heat energy of the heat medium. It is a power generation device that converts energy.
In the solar thermal power generation apparatus, the plurality of sunlight reflecting mirrors 30 are fixed to a support body such as a curved metal plate, and are supported by the support member 51 so as to form one large mirror surface. A heat collecting tube 80 is disposed at a position where sunlight is collected by the plurality of sunlight reflecting mirrors 30. A mirror angle adjusting unit 53 that rotationally drives the support member 51 is provided so that the plurality of sunlight reflecting mirrors 30 can be rotated according to the incident angle of sunlight.
 図21に示すように、太陽光反射ミラーの洗浄装置100(以下、単に「洗浄装置100」ともいう。)は、八つの太陽光反射ミラー洗浄用ブラシ10(以下、単に「ブラシ10」ともいう。)を備えている。また、洗浄装置100は、ブラシ10の駆動手段として、各ブラシ10を太陽光反射ミラー30のミラー面に当接させるロボットアーム103、各ブラシ10を回転駆動させる回転駆動部101を備えている。
 ロボットアーム103は旋回及び屈伸が可能であり、先端のアーム基板1015上に太陽光反射ミラー洗浄用ブラシ10が取り付けられている。
 なお、ブラシが、ブラシ基板1においてブラシ毛2とは反対側の面に、距離調整機構又は角度調整機構を有する場合、当該距離調整機構又は角度調整機構を介して、ブラシ基板1の回転軸方向に往復自在となるよう、ブラシ基板1は回転駆動部101のシャフト(図示しない)に取り付けられる。
As shown in FIG. 21, a solar reflective mirror cleaning device 100 (hereinafter also simply referred to as “cleaning device 100”) includes eight solar reflective mirror cleaning brushes 10 (hereinafter also simply referred to as “brushes 10”). .) In addition, the cleaning apparatus 100 includes a robot arm 103 that brings each brush 10 into contact with the mirror surface of the sunlight reflecting mirror 30 and a rotation drive unit 101 that drives each brush 10 to rotate.
The robot arm 103 is capable of turning and bending, and the solar reflective mirror cleaning brush 10 is attached on the arm substrate 1015 at the tip.
In addition, when a brush has a distance adjustment mechanism or an angle adjustment mechanism in the surface on the opposite side to the brush bristles 2 in the brush board | substrate 1, the rotating shaft direction of the brush board | substrate 1 is via the said distance adjustment mechanism or an angle adjustment mechanism. The brush substrate 1 is attached to a shaft (not shown) of the rotation drive unit 101 so as to be freely reciprocated.
 また、太陽光反射ミラーの洗浄装置100は、図21に示すように、洗浄液の供給手段として、洗浄液のタンク1021、供給管1022、噴射ノズル1023等を備えていることが好ましい。供給管1022は、噴射ノズル1023とタンク1021を接続するように、アーム基板1015上及びロボットアーム103内に配管されている。洗浄装置100は、タンク1021から供給管1022経由で噴射ノズル1023に洗浄液を送液し、噴射ノズル1023によりミラー面上に噴射することにより、洗浄液を供給する。 Further, as shown in FIG. 21, the solar reflective mirror cleaning device 100 preferably includes a cleaning liquid tank 1021, a supply pipe 1022, an injection nozzle 1023, and the like as cleaning liquid supply means. The supply pipe 1022 is piped on the arm substrate 1015 and in the robot arm 103 so as to connect the spray nozzle 1023 and the tank 1021. The cleaning apparatus 100 supplies the cleaning liquid by sending the cleaning liquid from the tank 1021 to the spray nozzle 1023 via the supply pipe 1022 and spraying it onto the mirror surface by the spray nozzle 1023.
 洗浄装置100は、太陽光反射ミラー30の縦方向に八つのブラシ10を一列に並べて縦方向の洗浄を一度に行うが、ブラシ10の数を減らして、ロボットアーム103により各ブラシ10がミラー面に当接する位置を縦方向に移動させて洗浄するようにしてもよい。
 また、洗浄装置100は、各ブラシ10がミラー面に当接する位置を太陽光反射ミラー30の横方向に移動させる移動手段として、図21に示すように走行する車両104を備え、太陽光反射ミラー30の横方向にブラシ10を当接させる位置を移動しながら太陽光反射ミラー30を連続的に洗浄することができる。
The cleaning device 100 arranges eight brushes 10 in a row in the vertical direction of the sunlight reflecting mirror 30 and performs vertical cleaning at once. However, the number of the brushes 10 is reduced, and each brush 10 is mirrored by the robot arm 103. You may make it wash | clean by moving the position which contact | abuts to a vertical direction.
Further, the cleaning apparatus 100 includes a vehicle 104 that travels as shown in FIG. 21 as a moving unit that moves the position where each brush 10 abuts against the mirror surface in the lateral direction of the sunlight reflecting mirror 30, and includes a sunlight reflecting mirror. The sunlight reflecting mirror 30 can be continuously washed while moving the position where the brush 10 abuts in the horizontal direction 30.
 (洗浄液)
 洗浄液としては、水を用いることができ、水を主成分とするのであれば添加剤を含有してもよい。水を主成分とするとは、固体成分を除く液体成分のうち、水の含有量が30~100質量%の範囲内にあることをいう。
 太陽光反射ミラー30のミラー面を汚染し、反射率又は発電効率を低下させる弊害がほとんどない水成分は、太陽光反射ミラーの洗浄液として適している。
 特に、太陽光により加熱した熱媒体により水を2次加熱して水蒸気を発生させてタービンを回転させて発電する太陽熱発電装置では、発電時に生じる水蒸気を洗浄液として利用することもできる。太陽熱発電装置は砂漠地帯等の水が少ない地域に設置されることが多いため、貴重な資源の再利用が可能であるとともに洗浄コストの低下も図ることができる。
(Cleaning solution)
As the cleaning liquid, water can be used, and an additive may be contained as long as water is a main component. “Water as a main component” means that the content of water in the liquid component excluding the solid component is in the range of 30 to 100% by mass.
A water component that contaminates the mirror surface of the sunlight reflecting mirror 30 and has little adverse effect of reducing the reflectance or power generation efficiency is suitable as a cleaning liquid for the sunlight reflecting mirror.
In particular, in a solar thermal power generation apparatus that generates power by secondary heating of water using a heat medium heated by sunlight to generate steam to rotate a turbine, steam generated during power generation can also be used as a cleaning liquid. Since solar thermal power generation devices are often installed in areas with little water, such as desert areas, precious resources can be reused and cleaning costs can be reduced.
 洗浄液に使用できる添加剤としては、洗浄液による洗浄力を高め、汚れの除去を容易にする観点から、有機溶剤、界面活性剤、塩類、酸・塩基類、樹脂、繊維、粒子状物質等が挙げられる。添加剤は、水との相溶性が高いものが好ましい。 Additives that can be used in the cleaning liquid include organic solvents, surfactants, salts, acids / bases, resins, fibers, particulate matter, etc., from the viewpoint of enhancing the cleaning power of the cleaning liquid and facilitating the removal of dirt. It is done. The additive is preferably highly compatible with water.
 有機溶剤としては、メタノール、エタノール、プロパノール、ブタノール、イソプロピルアルコール、エチレングリコール、プロピレングリコール等のアルコール類、アセトン、塩化メチレン等の炭化水素等が挙げられる。
 界面活性剤としては、アニオン性、カチオン性、両性、非イオン性が挙げられ、具体的にはポリオキシエチレンアルキルエーテル酢酸塩、ドデシルベンゼンスルホン酸塩、ラウリル酸塩等のアニオン性界面活性剤、ポリオキシエチレンアルキルエーテル等の非イオン性界面活性剤等が挙げられる。
 塩類としては、塩化ナトリウム、炭酸水素ナトリウム等が挙げられ、酸類としては、酢酸、フタル酸等が挙げられる。
 これら添加剤により、洗浄液による汚れの除去を容易とし、洗浄時の洗浄力を向上させることもできる。
Examples of the organic solvent include alcohols such as methanol, ethanol, propanol, butanol, isopropyl alcohol, ethylene glycol, and propylene glycol, and hydrocarbons such as acetone and methylene chloride.
Examples of the surfactant include anionic, cationic, amphoteric, and nonionic, specifically, anionic surfactants such as polyoxyethylene alkyl ether acetate, dodecylbenzene sulfonate, and laurate, Nonionic surfactants such as polyoxyethylene alkyl ethers are listed.
Examples of the salts include sodium chloride and sodium hydrogen carbonate, and examples of the acids include acetic acid and phthalic acid.
With these additives, it is possible to easily remove the dirt with the cleaning liquid and to improve the cleaning power at the time of cleaning.
 ≪太陽光反射ミラーの洗浄方法≫
 本発明の太陽光反射ミラーの洗浄方法は、ブラシにより太陽光反射ミラーのミラー面を洗浄する方法であって、本発明の太陽光反射ミラー洗浄用ブラシを太陽光反射ミラーのミラー面に当接させて回転させつつ、前記複数のブラシ毛と太陽光反射ミラーとの距離及び角度を調整することにより、当該ミラー面を洗浄する。
 以下、本発明の太陽光反射ミラーの洗浄方法の好ましい実施形態として、上記太陽光反射ミラーの洗浄装置100により太陽光反射ミラー30のミラー面を洗浄する例を説明する。
≪How to clean the sunlight reflecting mirror≫
The method for cleaning a solar reflective mirror of the present invention is a method of cleaning the mirror surface of the solar reflective mirror with a brush, and the brush for cleaning the solar reflective mirror of the present invention is brought into contact with the mirror surface of the solar reflective mirror. The mirror surface is cleaned by adjusting the distance and angle between the plurality of brush bristles and the sunlight reflecting mirror while rotating them.
Hereinafter, as a preferred embodiment of the solar reflective mirror cleaning method of the present invention, an example in which the mirror surface of the solar reflective mirror 30 is cleaned by the solar reflective mirror cleaning apparatus 100 will be described.
 最初に、太陽光反射ミラーの洗浄装置100は、ロボットアーム103により太陽光反射ミラー洗浄用ブラシ10を太陽光反射ミラー30のミラー面に押し当てて当接させる。ブラシ10のミラー面への圧力は、ブラシ10の回転を円滑化して洗浄力を高め、ミラー面の損傷を防ぐ観点から、200~3500Paの範囲内であることが好ましい。ロボットアーム103がミラー面への圧力を検出して、検出した圧力が上記範囲内にあるようにブラシ10をミラー面へ押し当てる圧力を自動的に制御するようにしてもよい。 First, the solar reflective mirror cleaning apparatus 100 presses the solar reflective mirror cleaning brush 10 against the mirror surface of the solar reflective mirror 30 with the robot arm 103 to bring it into contact therewith. The pressure on the mirror surface of the brush 10 is preferably in the range of 200 to 3500 Pa from the viewpoint of smoothing the rotation of the brush 10 to increase the cleaning power and preventing damage to the mirror surface. The robot arm 103 may detect the pressure on the mirror surface, and automatically control the pressure for pressing the brush 10 against the mirror surface so that the detected pressure is within the above range.
 本発明に係る太陽光反射ミラーの洗浄方法では、上述のように、本発明の太陽光反射ミラーのミラー面に当接させて回転させつつ、さらに、複数のブラシ毛と太陽光反射ミラーとの距離及び角度を調整する。 In the solar reflective mirror cleaning method according to the present invention, as described above, while rotating in contact with the mirror surface of the solar reflective mirror of the present invention, the plurality of brush hairs and the solar reflective mirror are further rotated. Adjust the distance and angle.
 距離及び角度を調整の方法は、特に限定されないが、本発明に係る太陽光反射ミラーの洗浄方法では、ブラシ毛がミラー面に当接した際に、本発明に係る距離調整機構及び角度調整機構41が、ブラシ毛を介して受ける、ミラー面からの反作用力に応じて、ブラシ毛を付勢することで、ミラー面とブラシ毛との距離及び角度を調整する態様が好ましい。 The method for adjusting the distance and the angle is not particularly limited. However, in the method for cleaning the solar reflective mirror according to the present invention, when the bristles contact the mirror surface, the distance adjusting mechanism and the angle adjusting mechanism according to the present invention. The aspect which adjusts the distance and angle of a mirror surface and brush hair by energizing brush hair according to reaction force from a mirror surface which 41 receives via brush hair is preferable.
 図21に示すように、複数の太陽光反射ミラー30が使用され、洗浄するミラー面が大面積である場合は、ロボットアーム103又は車両104によりミラー面に当接するブラシ10の位置を移動させてミラー面を全面的に洗浄する。 As shown in FIG. 21, when a plurality of sunlight reflecting mirrors 30 are used and the mirror surface to be cleaned has a large area, the position of the brush 10 that contacts the mirror surface is moved by the robot arm 103 or the vehicle 104. Clean the mirror surface thoroughly.
 ≪太陽光反射ミラーの洗浄システム≫
 本発明の太陽光反射ミラーの洗浄システムは、本発明の太陽光反射ミラー洗浄用ブラシと、前記太陽光反射ミラー洗浄用ブラシを、前記太陽光反射ミラーのミラー面に当接させて回転させる手段と、を有する。
 具体的には、上記太陽光反射ミラーの洗浄装置100により、太陽光反射ミラーを洗浄する洗浄システムである。なお、洗浄装置100では、駆動手段が、太陽光反射ミラー洗浄用ブラシを、前記太陽光反射ミラーのミラー面に当接させて回転させる手段に対応する。
≪Cleaning system for sunlight reflecting mirror≫
The solar reflective mirror cleaning system of the present invention comprises a solar reflective mirror cleaning brush of the present invention and means for rotating the solar reflective mirror cleaning brush in contact with the mirror surface of the solar reflective mirror. And having.
Specifically, it is a cleaning system for cleaning the solar reflective mirror by the solar reflective mirror cleaning device 100. In the cleaning apparatus 100, the driving unit corresponds to a unit that rotates the solar reflective mirror cleaning brush in contact with the mirror surface of the solar reflective mirror.
 なお、本発明を適用可能な実施形態は、上述した実施形態に限定されることなく、本発明の趣旨を逸脱しない範囲で適宜変更可能である。 Note that embodiments to which the present invention can be applied are not limited to the above-described embodiments, and can be appropriately changed without departing from the spirit of the present invention.
 例えば、上記では、植設孔を取付け器具4に形成して、複数のブラシ毛2を取付け器具4に植設することにより複数のブラシ毛2を固定する例を説明したが、本願はこれに限定されず、複数のブラシ毛2から形成した複数の毛束21を取付け器具4が把持することにより、複数のブラシ毛2を固定してもよい。 For example, in the above description, an example has been described in which the planting holes are formed in the attachment device 4 and the plurality of brush hairs 2 are implanted in the attachment device 4 to fix the plurality of brush hairs 2. Without being limited thereto, the plurality of bristles 2 may be fixed by holding the plurality of bristles 21 formed from the plurality of bristles 2 by the attachment device 4.
 以下、実施例をあげて本発明を具体的に説明するが、本発明はこれらに限定されるものではない。なお、実施例において「部」又は「%」の表示が用いられるが、特に断りがない限り「質量部」又は「質量%」を表す。 Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. In addition, although the display of "part" or "%" is used in an Example, unless otherwise indicated, it represents "mass part" or "mass%".
 〔太陽光反射ミラー洗浄用ブラシ[0]〕
 ブラシ基板に、距離調整機構及び角度調整機構を有さない、距離調整機構及び角度調整機構の配置パターン(以下、単に「配置パターン」ともいう。)0で太陽光反射ミラー洗浄用ブラシ(以下、単に「ブラシ」ともいう。)[0]を製造した。
 配置パターン0のブラシ[0]は、図22に示す、距離調整機構及び角度調整機構を有さない一般的なブラシである。
 なお、使用したブラシ基板は、直径600mmの円形状のブラシ基板とした。
 また、ブラシ[0]では、複数のブラシ毛を長さの平均が80mmの毛束にして、取付け器具4を介してブラシ基板の全面に設けた。また、ブラシ毛として、モノフィラメントの平均径が1mmのポリプロピレン(PP)製の繊維毛を用いた。ブラシ[0]に用いたブラシ毛の公定水分率をJIS L0105に準拠して測定したところ、1%未満の疎水性を示した。
[Sunlight reflecting mirror cleaning brush [0]]
The brush substrate does not have a distance adjustment mechanism and an angle adjustment mechanism, and the arrangement pattern of the distance adjustment mechanism and the angle adjustment mechanism (hereinafter also simply referred to as “arrangement pattern”) is 0, and the solar reflective mirror cleaning brush (hereinafter, (Simply referred to as “brush”.) [0] was manufactured.
The brush [0] of the arrangement pattern 0 is a general brush that does not have the distance adjustment mechanism and the angle adjustment mechanism shown in FIG.
The brush substrate used was a circular brush substrate having a diameter of 600 mm.
Further, in the brush [0], a plurality of brush hairs were formed into a hair bundle having an average length of 80 mm and provided on the entire surface of the brush substrate via the attachment device 4. Further, as the bristles, polypropylene (PP) fiber bristles having an average monofilament diameter of 1 mm were used. When the official moisture content of the brush hair used for the brush [0] was measured according to JIS L0105, it showed a hydrophobicity of less than 1%.
 なお、ブラシ毛のモノフィラメントの平均径については、デジタルマイクロスコープVH-5500(KEYENCE社製)により観察し、ブラシ毛のモノフィラメントの径を計測した。具体的には、計測か所を無作為に選び、N=500で測定を行い統計的に処理して得た繊維径分布の平均値をブラシ毛のモノフィラメントの平均径とした。 The average diameter of the brush hair monofilament was observed with a digital microscope VH-5500 (manufactured by KEYENCE), and the diameter of the brush hair monofilament was measured. Specifically, the average value of the fiber diameter distribution obtained by randomly selecting the measurement locations, measuring at N = 500, and statistically processing was used as the average diameter of the monofilaments of the brush hair.
 〔太陽光反射ミラー洗浄用ブラシ[1]~[3]〕
 太陽光反射ミラー洗浄用ブラシ[0]の製造において、距離調整機構及び角度調整機構の配置パターンを配置パターン[1]~[3]で配置したこと以外は、ブラシ[0]と同様にして太陽光反射ミラー洗浄用ブラシ[1]~[3]を製造した。
 なお、配置パターン[1]は、図4に示す配置パターンであり、配置パターン[2]は、図5に示す配置パターンであり、配置パターン[3]は、図6に示す配置パターンである。
[Sunlight reflecting mirror cleaning brush [1]-[3]]
In the production of the solar reflective mirror cleaning brush [0], the sun is made in the same manner as the brush [0] except that the arrangement patterns of the distance adjustment mechanism and the angle adjustment mechanism are arranged in the arrangement patterns [1] to [3]. Light reflecting mirror cleaning brushes [1] to [3] were produced.
The arrangement pattern [1] is the arrangement pattern shown in FIG. 4, the arrangement pattern [2] is the arrangement pattern shown in FIG. 5, and the arrangement pattern [3] is the arrangement pattern shown in FIG.
 〔太陽光反射ミラー洗浄用ブラシ[4]〕
 太陽光反射ミラー洗浄用ブラシ[0]の製造において、ブラシ毛を、図1に示すように、取付け器具4を介して、ブラシ基板の全面ではなく部分的に設け、距離調整機構及び角度調整機構の配置パターンを配置パターン[4]に変更した。なお、配置パターン[4]は、図7に示す配置パターンである。
 さらに、ブラシ毛として、ナイロン66を使用し、そのモノフィラメントの平均径は、0.1mmとした。
 それ以外は太陽光反射ミラー洗浄用ブラシ[0]の製造と同様にして、太陽光反射ミラー洗浄用ブラシ[4]を製造した。
 なお、ブラシ[4]で使用したブラシ毛について、公定水分率をJIS L0105に準拠して測定したところ、1%以上の親水性を示した。
[Brush for cleaning sunlight reflecting mirror [4]]
In manufacturing the solar reflective mirror cleaning brush [0], as shown in FIG. 1, the brush bristles are partially provided instead of the entire surface of the brush substrate via the attachment device 4, and the distance adjustment mechanism and the angle adjustment mechanism The arrangement pattern was changed to arrangement pattern [4]. The arrangement pattern [4] is the arrangement pattern shown in FIG.
Further, nylon 66 was used as the brush hair, and the average diameter of the monofilament was 0.1 mm.
Otherwise, the solar reflective mirror cleaning brush [4] was manufactured in the same manner as the solar reflective mirror cleaning brush [0].
In addition, about the bristle used with brush [4], when the official moisture content was measured based on JISL0105, 1% or more of hydrophilic property was shown.
 〔太陽光反射ミラー洗浄用ブラシ[5]~[15]〕
 太陽光反射ミラー洗浄用ブラシ[4]の製造において、距離調整機構及び角度調整機構の配置パターンを配置パターン[5]~[15]に変更したこと以外は、ブラシ[4]と同様にして太陽光反射ミラー洗浄用ブラシ[5]~[15]を製造した。
 なお、配置パターン[5]~[15]は、図8~図18に示す配置パターンである。
[Sunlight reflecting mirror cleaning brush [5]-[15]]
In the manufacture of the solar reflective mirror cleaning brush [4], the sun and solar brushes are operated in the same manner as the brush [4] except that the arrangement pattern of the distance adjustment mechanism and the angle adjustment mechanism is changed to the arrangement patterns [5] to [15]. Light reflecting mirror cleaning brushes [5] to [15] were produced.
The arrangement patterns [5] to [15] are the arrangement patterns shown in FIGS.
 〔フィルムミラータイプの太陽光反射ミラー〕
 二軸延伸により得られた厚さ100μmのポリエチレンテレフタレートフィルム(以下、PETフィルムという。)の片面に、厚さ0.1μmのアンカー層を形成した。アンカー層は、ポリエステル系樹脂であるエスペル9940A(日立化成株式会社製)、メラミン樹脂、イソシアネート架橋剤であるトリレンジイソシアネート及びヘキサメチレンジイソシアネート(三井化学ファイン株式会社製)を、それぞれ20:1:1:2の質量比で混合した樹脂を、グラビアコート法により塗布して形成した。
 次に、銀を用いて真空蒸着法により厚さ80nmの反射層を形成した。
[Film mirror type solar reflective mirror]
An anchor layer having a thickness of 0.1 μm was formed on one side of a 100 μm-thick polyethylene terephthalate film (hereinafter referred to as PET film) obtained by biaxial stretching. The anchor layer is made of polyester resin Esper 9940A (Hitachi Chemical Co., Ltd.), melamine resin, isocyanate cross-linking agent tolylene diisocyanate and hexamethylene diisocyanate (Mitsui Chemical Fine Co., Ltd.) 20: 1: 1, respectively. A resin mixed at a mass ratio of 2 was applied by gravure coating.
Next, a reflective layer having a thickness of 80 nm was formed by vacuum evaporation using silver.
 形成した反射層上に、腐食防止層の塗布液をグラビアコート法により塗布して、厚さ0.1μmの腐食防止層を形成した。塗布液は、エスペル9940A及びトリレンジイソシアネートをそれぞれ10:2の樹脂固形分比率(質量比)で混合した樹脂中に、樹脂固形分に対して10質量%のTinuvin234(BASFジャパン社製)を、腐食防止剤として添加して調製した。 On the formed reflective layer, a corrosion prevention layer coating solution was applied by a gravure coating method to form a corrosion prevention layer having a thickness of 0.1 μm. The coating solution is 10% by weight of Tinuvin 234 (made by BASF Japan) based on the resin solid content in a resin in which Esper 9940A and tolylene diisocyanate are mixed at a resin solid content ratio (mass ratio) of 10: 2, respectively. It was prepared by adding as a corrosion inhibitor.
 次に、腐食防止層上に、ビニロール92T(アクリル樹脂接着剤、昭和電工社製)を厚さ0.1μmの厚さで塗布して、アンカー層を形成した。当該アンカー層上に溶液流延法により成膜したアクリル樹脂フィルムを積層し、紫外線吸収層とした。紫外線吸収層の表面の算術平均粗さRaは0.1μmであり、層厚は50μmであった。 Next, on the corrosion prevention layer, vinylol 92T (acrylic resin adhesive, manufactured by Showa Denko) was applied to a thickness of 0.1 μm to form an anchor layer. An acrylic resin film formed by a solution casting method was laminated on the anchor layer to form an ultraviolet absorbing layer. The arithmetic average roughness Ra of the surface of the ultraviolet absorbing layer was 0.1 μm, and the layer thickness was 50 μm.
 次に、シリコーン系ハードコートPerma-New 6000(California Hardcoating Company製)をワイヤーバーにより、前記紫外線吸収層上に塗布し、厚さ3μmになるようにハードコート層を形成し、フィルムミラータイプの太陽光反射ミラーを製造した。 Next, a silicone hard coat Perma-New 6000 (California Hardcoating Company) was applied onto the UV absorbing layer with a wire bar to form a hard coat layer having a thickness of 3 μm. A light reflecting mirror was manufactured.
 〔ガラスミラータイプの太陽光反射ミラー〕
 厚さ4mmのガラス板上に、フィルムミラータイプと同様にして、銀を用いて真空蒸着法により厚さ80nmの反射層を形成し、さらに厚さ0.1μmの腐食防止層を形成して、ガラスミラータイプの太陽光反射ミラーを製造した。
[Glass mirror type sunlight reflecting mirror]
On the glass plate with a thickness of 4 mm, in the same manner as the film mirror type, a reflective layer with a thickness of 80 nm is formed by vacuum deposition using silver, and further a corrosion prevention layer with a thickness of 0.1 μm is formed. A glass mirror type solar reflective mirror was manufactured.
 ≪評価≫
 下記のようにして、太陽光反射ミラー洗浄用ブラシ[0]~[15]を使用し、太陽光反射ミラーを洗浄し、各ブラシについて、評価を行った。
 結果は表1に示すとおりである。
≪Evaluation≫
Using the solar reflective mirror cleaning brushes [0] to [15] as described below, the solar reflective mirror was cleaned, and each brush was evaluated.
The results are as shown in Table 1.
 [ガラスミラータイプについて]
 <洗浄方法>
 複数の上記フィルムミラータイプの太陽光反射ミラーを図21に示すように配置し、八つの太陽光反射ミラー洗浄用ブラシ10を、図21に示す太陽光反射ミラーの洗浄装置100に搭載して、上記太陽光反射ミラーのミラー面を洗浄した。洗浄は、太陽光反射ミラーを屋外に設置する直前と、設置してから3か月後に1回行った。
 洗浄時、各ブラシ10がミラー面に当接する位置を1.0km/hの速度で太陽光反射ミラーの横方向に移動させて、各ブラシ10を95rpmの回転速度で回転させた。また、各ブラシ10の回転と並行して、水を洗浄液として噴射した。
 このようにして、ガラスミラータイプの太陽光反射ミラーを洗浄した。
[About glass mirror type]
<Washing method>
A plurality of film mirror type solar reflective mirrors are arranged as shown in FIG. 21, and eight solar reflective mirror cleaning brushes 10 are mounted on the solar reflective mirror cleaning apparatus 100 shown in FIG. The mirror surface of the sunlight reflecting mirror was washed. The cleaning was performed once immediately before installing the sunlight reflecting mirror outdoors and once three months after installation.
At the time of cleaning, the position where each brush 10 abuts on the mirror surface was moved in the lateral direction of the sunlight reflecting mirror at a speed of 1.0 km / h, and each brush 10 was rotated at a rotational speed of 95 rpm. In parallel with the rotation of each brush 10, water was sprayed as a cleaning liquid.
In this way, a glass mirror type sunlight reflecting mirror was washed.
 (洗浄力)
 上述した洗浄方法により、洗浄する太陽光反射ミラーを屋外に設置する直前に洗浄した後、太陽光反射ミラーの反射率Ta(%)を測定した。次いで、太陽光反射ミラーを屋外に設置して3か月後に、上述した洗浄方法により再度洗浄した後、太陽光反射ミラーの反射率Tb(%)を測定した。反射率Ta及びTbは、反射面の法線に対して入射光の入射角が20°となるように調整し、反射角20°の正反射率(%)を光沢計GM-268(コニカミノルタ製)を用いて測定した。測定した反射率Ta及びTbから、太陽光反射ミラーの反射率の回復率を下記式により求め、太陽光反射ミラー洗浄用ブラシ[0]~[15]の洗浄力として評価した。
 反射率の回復率(%)=Tb(%)/Ta(%)×100
 反射率の回復率が90%以上であると、太陽光反射ミラーとして実用可能な反射率が得られる。
(Detergency)
After cleaning the solar reflective mirror to be cleaned immediately before being placed outdoors by the above-described cleaning method, the reflectance Ta (%) of the solar reflective mirror was measured. Next, the solar reflective mirror was installed outdoors, and after three months, the solar reflective mirror was washed again by the above-described cleaning method, and then the reflectance Tb (%) of the solar reflective mirror was measured. The reflectances Ta and Tb are adjusted so that the incident angle of incident light is 20 ° with respect to the normal line of the reflecting surface, and the regular reflectance (%) at the reflection angle of 20 ° is set to a gloss meter GM-268 (Konica Minolta). ). From the measured reflectivity Ta and Tb, the recovery rate of the reflectivity of the solar reflective mirror was obtained by the following formula, and evaluated as the cleaning power of the solar reflective mirror cleaning brushes [0] to [15].
Reflectivity recovery rate (%) = Tb (%) / Ta (%) × 100
When the recovery rate of the reflectance is 90% or more, a reflectance that can be used as a sunlight reflecting mirror can be obtained.
 洗浄力の評価基準は下記のとおりである。
 ◎…95%以上
 ○…90%以上95%未満
 △…90%未満
The evaluation criteria for the cleaning power are as follows.
◎… 95% or more ○… 90% or more and less than 95% △… less than 90%
 (均一性)
 太陽光反射ミラーにおいて、縦8×横10点(合計80か所)について、上記Tbを測定し、上記80点のうち、最も悪い反射率を評価対象として、均一性を評価した。
(Uniformity)
In the sunlight reflecting mirror, the Tb was measured at 8 vertical points × 10 horizontal points (a total of 80 points), and the uniformity was evaluated using the worst reflectance among the 80 points as an evaluation target.
 均一性の評価基準は下記のとおりである。
 ◎…90%以上
 ○…85%以上90%未満
 ×…85%未満
The evaluation criteria for uniformity are as follows.
◎… 90% or more ○… 85% or more and less than 90% ×… less than 85%
 [フィルムミラータイプについて]
 <洗浄方法>
 太陽光反射ミラーとして、フィルムミラータイプのものを使用した他は、ガラスミラータイプの洗浄と同様にして洗浄した。
[About film mirror type]
<Washing method>
Cleaning was performed in the same manner as the glass mirror type cleaning, except that a film mirror type was used as the sunlight reflecting mirror.
 (傷付きの評価)
 洗浄された太陽光反射ミラーにブラシを用いて20回洗浄を実施し、発生した傷の面積を観察し、当該面積と、太陽光反射ミラー全体の面積との比率を計算することで、傷付きを評価した。
(Evaluation with scratches)
The washed sunlight reflecting mirror is washed 20 times using a brush, the area of the generated scratch is observed, and the ratio of the area and the area of the entire sunlight reflecting mirror is calculated, thereby being damaged. Evaluated.
 傷付きの評価基準は、下記のとおりである。結果は表1及び表2に示す。
 ○…0%
 △…0%より大きく、10%以下
 ×…10%より大きく、50%以下
 ××…50%より大きく、100%以下
The evaluation criteria with scratches are as follows. The results are shown in Tables 1 and 2.
○ ... 0%
Δ: Greater than 0%, 10% or less ×: Greater than 10%, 50% or less XX: Greater than 50%, 100% or less
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 以上のように、本発明は、太陽光反射ミラーに傷をつけずに、高い洗浄力で均一に洗浄することができる太陽光反射ミラー洗浄用ブラシを提供することに適している。 As described above, the present invention is suitable for providing a solar reflective mirror cleaning brush that can be uniformly cleaned with high cleaning power without damaging the solar reflective mirror.
 10  太陽光反射ミラー洗浄用ブラシ、ブラシ
 1   ブラシ基板
 13  植設孔
 2   ブラシ毛
 21  毛束
 22  止め具
 4   取付け器具
 41  距離調整機構及び/又は角度調整機構
 100 太陽光反射ミラーの洗浄装置、洗浄装置
 101 回転駆動部
 103 ロボットアーム
DESCRIPTION OF SYMBOLS 10 Sunlight reflecting mirror cleaning brush, brush 1 Brush substrate 13 Planting hole 2 Brush hair 21 Hair bundle 22 Stopper 4 Mounting tool 41 Distance adjusting mechanism and / or angle adjusting mechanism 100 Cleaning device and cleaning device for solar reflecting mirror 101 Rotation drive unit 103 Robot arm

Claims (13)

  1.  太陽光反射ミラーのミラー面に当接して回転することにより、当該ミラー面を洗浄する太陽光反射ミラー洗浄用ブラシであって、
     回転可能なブラシ基板と、
     前記ブラシ基板上に設けられ、前記ブラシ基板の回転に伴って回転する複数のブラシ毛と、を備え、かつ、
     前記ミラー面と前記ブラシ毛との距離及び角度を調整するための、距離調整機構及び角度調整機構を有することを特徴とする太陽光反射ミラー洗浄用ブラシ。
    A brush for cleaning a sunlight reflecting mirror that cleans the mirror surface by rotating in contact with the mirror surface of the sunlight reflecting mirror,
    A rotatable brush substrate;
    A plurality of brush bristles provided on the brush substrate and rotating with the rotation of the brush substrate; and
    A brush for cleaning a sunlight reflecting mirror, comprising a distance adjusting mechanism and an angle adjusting mechanism for adjusting a distance and an angle between the mirror surface and the brush bristles.
  2.  前記距離調整機構又は前記角度調整機構が、付勢機構であることを特徴とする請求項1に記載の太陽光反射ミラー洗浄用ブラシ。 The solar reflective mirror cleaning brush according to claim 1, wherein the distance adjusting mechanism or the angle adjusting mechanism is an urging mechanism.
  3.  前記付勢機構が、ばね、ゴム、風船及びダンパーから選ばれる少なくとも1種であることを特徴とする請求項2に記載の太陽光反射ミラー洗浄用ブラシ。 3. The solar reflective mirror cleaning brush according to claim 2, wherein the biasing mechanism is at least one selected from a spring, rubber, a balloon, and a damper.
  4.  前記距離調整機構又は前記角度調整機構が、前記ブラシ基板と前記ブラシ毛との間にあることを特徴とする請求項1から請求項3までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシ。 The said distance adjustment mechanism or the said angle adjustment mechanism exists between the said brush board | substrate and the said brush bristles, The solar reflective mirror washing | cleaning as described in any one of Claim 1 to 3 characterized by the above-mentioned. brush.
  5.  前記距離調整機構又は前記角度調整機構が、前記ブラシ基板において、前記ブラシ毛とは反対側の面に設けられていることを特徴とする請求項1から請求項4までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシ。 The distance adjusting mechanism or the angle adjusting mechanism is provided on a surface of the brush substrate opposite to the brush bristles, according to any one of claims 1 to 4. Brush for cleaning sunlight reflecting mirrors.
  6.  前記複数のブラシ毛の平均径が、1μm~1mmの範囲内であることを特徴とする請求項1から請求項5までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシ。 The solar reflective mirror cleaning brush according to any one of claims 1 to 5, wherein an average diameter of the plurality of brush hairs is in a range of 1 µm to 1 mm.
  7.  前記複数のブラシ毛が、親水性の繊維毛からなることを特徴とする請求項1から請求項6までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシ。 The solar reflective mirror cleaning brush according to any one of claims 1 to 6, wherein the plurality of brush hairs are made of hydrophilic fiber hairs.
  8.  請求項1から請求項7までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシと、
     前記太陽光反射ミラー洗浄用ブラシを、前記太陽光反射ミラーのミラー面に当接させて回転させる手段と、を有することを特徴とする太陽光反射ミラーの洗浄システム。
    The solar reflective mirror cleaning brush according to any one of claims 1 to 7,
    And a means for rotating the solar reflective mirror cleaning brush in contact with the mirror surface of the solar reflective mirror.
  9.  前記太陽光反射ミラーが、フィルムミラータイプであることを特徴とする請求項8に記載の太陽光反射ミラーの洗浄システム。 The solar reflective mirror cleaning system according to claim 8, wherein the solar reflective mirror is a film mirror type.
  10.  ブラシにより太陽光反射ミラーのミラー面を洗浄する太陽光反射ミラーの洗浄方法であって、
     請求項1から請求項7までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシを前記太陽光反射ミラーのミラー面に当接させて回転させつつ、前記複数のブラシ毛と太陽光反射ミラーとの距離及び角度を調整することにより、当該ミラー面を洗浄することを特徴とする太陽光反射ミラーの洗浄方法。
    A method for cleaning a solar reflective mirror, wherein the mirror surface of the solar reflective mirror is cleaned with a brush,
    The plurality of brush hairs and sunlight reflection while rotating the solar reflective mirror cleaning brush according to any one of claims 1 to 7 in contact with a mirror surface of the solar reflective mirror. A method for cleaning a solar reflective mirror, wherein the mirror surface is cleaned by adjusting a distance and an angle with the mirror.
  11.  前記太陽光反射ミラーが、フィルムミラータイプであることを特徴とする請求項10に記載の太陽光反射ミラーの洗浄方法。 The method for cleaning a solar reflective mirror according to claim 10, wherein the solar reflective mirror is a film mirror type.
  12.  請求項1から請求項7までのいずれか一項に記載の太陽光反射ミラー洗浄用ブラシを有することを特徴とする太陽光反射ミラーの洗浄装置。 A solar reflective mirror cleaning apparatus comprising the solar reflective mirror cleaning brush according to any one of claims 1 to 7.
  13.  前記太陽光反射ミラーが、フィルムミラータイプであることを特徴とする請求項12に記載の太陽光反射ミラーの洗浄装置。 The solar reflective mirror cleaning device according to claim 12, wherein the solar reflective mirror is a film mirror type.
PCT/JP2016/056700 2015-03-20 2016-03-04 Brush for cleaning sunlight reflecting mirror, and cleaning system, cleaning method and cleaning apparatus for sunlight reflecting mirror WO2016152449A1 (en)

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