WO2016148706A1 - Method for designing a high sensitivity integrated computational element - Google Patents
Method for designing a high sensitivity integrated computational element Download PDFInfo
- Publication number
- WO2016148706A1 WO2016148706A1 PCT/US2015/021054 US2015021054W WO2016148706A1 WO 2016148706 A1 WO2016148706 A1 WO 2016148706A1 US 2015021054 W US2015021054 W US 2015021054W WO 2016148706 A1 WO2016148706 A1 WO 2016148706A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- optical response
- response function
- line shape
- design
- ice
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 90
- 230000035945 sensitivity Effects 0.000 title claims abstract description 50
- 230000003287 optical effect Effects 0.000 claims abstract description 110
- 238000013461 design Methods 0.000 claims abstract description 102
- 238000005316 response function Methods 0.000 claims abstract description 87
- 230000006870 function Effects 0.000 claims description 39
- 238000012512 characterization method Methods 0.000 claims description 8
- 238000012545 processing Methods 0.000 claims description 6
- 238000010183 spectrum analysis Methods 0.000 claims description 5
- 238000004590 computer program Methods 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 69
- 238000012938 design process Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 10
- 239000010409 thin film Substances 0.000 description 10
- 238000013459 approach Methods 0.000 description 9
- 230000003595 spectral effect Effects 0.000 description 9
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- 238000005457 optimization Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 239000012491 analyte Substances 0.000 description 6
- 238000004891 communication Methods 0.000 description 6
- 238000001228 spectrum Methods 0.000 description 6
- 238000004422 calculation algorithm Methods 0.000 description 5
- 230000005670 electromagnetic radiation Effects 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 230000004044 response Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 238000000255 optical extinction spectrum Methods 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 238000000411 transmission spectrum Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012569 chemometric method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000012804 iterative process Methods 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 230000005055 memory storage Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000010200 validation analysis Methods 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
- 229910001868 water Inorganic materials 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F30/00—Computer-aided design [CAD]
- G06F30/30—Circuit design
Definitions
- ICEs have been designed using alternating layers of high index (e.g. Silicon) and low index (e.g. Silicon-di-oxide) materials on a transparent (e.g. BK7) substrate.
- the target ICE design is achieved by first generating a random design (random number of layers and layer thicknesses) and then running a minimization algorithm on the individual layer thicknesses using performance figure of merits such as the Standard Error in Calibration (SEC) or calibration sensitivity of the measurement as the error argument.
- SEC Standard Error in Calibration
- the layer thicknesses, total number of layers, and the respective optical constants, of the high and low index materials and substrate define the ICE design and thus its transmission profile.
- the transmission spectrum of ICE consists of transmission peaks and valleys across the range of wavelengths of interest.
- FIG. 5A is a screen shot showing spectral data for a generic seventeen layer design forming the basis for a design process in accordance to an illustrative method of the present disclosure
- the layers 102, 104 may be made of, but are not limited to, silicon, quartz, germanium, water, combinations thereof, or other materials of interest.
- the physical thicknesses of the layers 102 are illustrative in nature and, thus, may be altered as desired.
- the harmonic line shape is plotted as a simulated optical response function on a graph showing the amplitude, A, which respect to the center wavelength, coo-
- the broadening, ⁇ corresponds to the width of the line shape with respect to amplitude, A.
- FIG. 4 plots an illustrative calculated ideal optical response function for gas-oil ratio.
- the examples given below are comparative studies contrasting a first design approach and the illustrative methods of the present disclosure. Design studies were run for three analytes: gas-oil ratio ("GOR"), Aromatics and Methane. For GOR, the highest conventional sensitivity design had a calibration sensitivity of 36.06% of full scale and a SEC of 16.36% of full scale.
- ICEs for use in wellbores such as, for example, optical fluid identification tools for downhole and surface applications.
- design of the ICE is then fabricated and positioned downhole or as part of an optical computing device of a downhole assembly to perform monitoring or sensing operations.
- a method to design an integrated computation element comprising defining at least one harmonic line shape that simulates an optical response function; varying parameters of the harmonic line shape to thereby generate one or more varied optical response functions; evaluating the varied optical response functions for a characterization of a sample property using a merit function; based upon a merit function performance of the varied optical response functions, selecting an ideal optical response function; and selecting an ICE design having an optical response function that matches the ideal optical response function.
- ICE integrated computation element
- varying the parameters of the harmonic line shape further comprises utilizing multivariate spectral analysis to define an optimal wavelength range; and varying the parameters of the harmonic line shape within the optimal wavelength range.
- a method as defined in any of paragraphs 1-6, wherein using the merit function comprises at least one of determining a standard error of calibration ("SEC") of the varied optical response function for the characterization of the sample property; or determining an output sensitivity of the varied optical response function for the characterization of the sample property.
- SEC standard error of calibration
- defining the harmonic line shape comprises defining at least two harmonic line shapes; and computationally combining the at least two harmonic line shapes to generate a combined harmonic line shape.
- a method as defined in paragraph 14, wherein defining the harmonic line shape comprises defining a Lorentzian, Gaussian or anharmonic derivative line shape.
- varying the optical response function comprises varying an amplitude, broadening or central wavelength parameter of the optical response function.
- the illustrative methodologies described herein may be implemented by a system comprising processing circuitry or a computer program product comprising instructions which, when executed by at least one processor, causes the processor to perform any of the methodology described herein.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Optics & Photonics (AREA)
- Computer Hardware Design (AREA)
- Evolutionary Computation (AREA)
- Geometry (AREA)
- General Engineering & Computer Science (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Integrated Circuits (AREA)
Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/906,359 US10018994B2 (en) | 2014-06-19 | 2015-03-17 | Method for designing a high sensitivity integrated computational element |
PCT/US2015/021054 WO2016148706A1 (en) | 2015-03-17 | 2015-03-17 | Method for designing a high sensitivity integrated computational element |
BR112017016274-1A BR112017016274B1 (en) | 2015-03-17 | 2015-03-17 | METHOD AND SYSTEM FOR DESIGNING A MULTIVARIATE OPTICAL ELEMENT, MULTIVARIATE OPTICAL ELEMENT, AND COMPUTER READABLE STORAGE MEDIA |
EP15885729.2A EP3271794A4 (en) | 2015-03-17 | 2015-03-17 | Method for designing a high sensitivity integrated computational element |
SA517381961A SA517381961B1 (en) | 2015-03-17 | 2017-07-20 | Method for designing a high sensitivity integrated computational element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2015/021054 WO2016148706A1 (en) | 2015-03-17 | 2015-03-17 | Method for designing a high sensitivity integrated computational element |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2016148706A1 true WO2016148706A1 (en) | 2016-09-22 |
Family
ID=56920307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2015/021054 WO2016148706A1 (en) | 2014-06-19 | 2015-03-17 | Method for designing a high sensitivity integrated computational element |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP3271794A4 (en) |
BR (1) | BR112017016274B1 (en) |
SA (1) | SA517381961B1 (en) |
WO (1) | WO2016148706A1 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060044542A1 (en) * | 2004-08-26 | 2006-03-02 | Sangbong Park | Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems |
US20090324101A1 (en) * | 2008-06-25 | 2009-12-31 | Industrial Technology Research Institute | Method for designing computational optical imaging system |
US20130035262A1 (en) * | 2011-08-05 | 2013-02-07 | Freese Robert P | Integrated Computational Element Analytical Methods for Microorganisms Treated with a Pulsed Light Source |
WO2014074108A1 (en) * | 2012-11-09 | 2014-05-15 | Halliburton Energy Services, Inc. | Integrated computational element design optimization and performance evaluation |
WO2014137322A1 (en) * | 2013-03-05 | 2014-09-12 | Halliburton Energy Services Inc. | System, method and computer program product for photometric system design and environmental ruggedization |
-
2015
- 2015-03-17 EP EP15885729.2A patent/EP3271794A4/en active Pending
- 2015-03-17 BR BR112017016274-1A patent/BR112017016274B1/en active IP Right Grant
- 2015-03-17 WO PCT/US2015/021054 patent/WO2016148706A1/en active Application Filing
-
2017
- 2017-07-20 SA SA517381961A patent/SA517381961B1/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060044542A1 (en) * | 2004-08-26 | 2006-03-02 | Sangbong Park | Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems |
US20090324101A1 (en) * | 2008-06-25 | 2009-12-31 | Industrial Technology Research Institute | Method for designing computational optical imaging system |
US20130035262A1 (en) * | 2011-08-05 | 2013-02-07 | Freese Robert P | Integrated Computational Element Analytical Methods for Microorganisms Treated with a Pulsed Light Source |
WO2014074108A1 (en) * | 2012-11-09 | 2014-05-15 | Halliburton Energy Services, Inc. | Integrated computational element design optimization and performance evaluation |
WO2014137322A1 (en) * | 2013-03-05 | 2014-09-12 | Halliburton Energy Services Inc. | System, method and computer program product for photometric system design and environmental ruggedization |
Non-Patent Citations (1)
Title |
---|
See also references of EP3271794A4 * |
Also Published As
Publication number | Publication date |
---|---|
BR112017016274A2 (en) | 2018-03-27 |
BR112017016274B1 (en) | 2022-11-08 |
SA517381961B1 (en) | 2020-12-24 |
EP3271794A4 (en) | 2018-11-14 |
EP3271794A1 (en) | 2018-01-24 |
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