WO2016148608A1 - Source de rayonnement optique à bande large à luminosité élevée - Google Patents

Source de rayonnement optique à bande large à luminosité élevée Download PDF

Info

Publication number
WO2016148608A1
WO2016148608A1 PCT/RU2016/000135 RU2016000135W WO2016148608A1 WO 2016148608 A1 WO2016148608 A1 WO 2016148608A1 RU 2016000135 W RU2016000135 W RU 2016000135W WO 2016148608 A1 WO2016148608 A1 WO 2016148608A1
Authority
WO
WIPO (PCT)
Prior art keywords
laser
radiation
plasma
source
brightness
Prior art date
Application number
PCT/RU2016/000135
Other languages
English (en)
Russian (ru)
Inventor
Игорь Георгиевич РУДОЙ
Николай Германович СОЛОВЬЕВ
Аркадий Матвеевич СОРОКА
Михаил Юрьевич ЯКИМОВ
Original Assignee
Игорь Георгиевич РУДОЙ
Николай Германович СОЛОВЬЕВ
Аркадий Матвеевич СОРОКА
Михаил Юрьевич ЯКИМОВ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Игорь Георгиевич РУДОЙ, Николай Германович СОЛОВЬЕВ, Аркадий Матвеевич СОРОКА, Михаил Юрьевич ЯКИМОВ filed Critical Игорь Георгиевич РУДОЙ
Publication of WO2016148608A1 publication Critical patent/WO2016148608A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/24—Ion sources; Ion guns using photo-ionisation, e.g. using laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the claimed technical solution relates to sources of broadband optical radiation with high spectral brightness and is of interest for applications in microelectronics, spectroscopy, photochemistry, medicine and other fields.
  • a source of high-brightness broadband optical radiation is known, which is a sealed chamber excited by an arc discharge, filled with high-pressure gas.
  • the chamber is a transparent flask (lamp) made of quartz glass; xenon (a mixture of xenon with mercury) at a pressure of ⁇ 1 MPa is used as a filling gas.
  • Arc discharge electrodes are placed in a lamp, the interelectrode gap is several millimeters, for special-purpose lamps even 0.5-1.5 m ([1]: G. N. Rokhlin “Discharge light sources.” 2nd ed., Revised. and add. — M.: Energoatom Publishing House, 1991–720 s; section 19.3).
  • Such lamps are serially produced by many manufacturers, in particular, K.K. Hamamatsu Photonics. (Japan), a description of the respective lamps is presented on the company's website (see .. for example [2]: http://www.hamamatsu.com/resources/pdf/etd/Xe-HgXe TLSX 1044E.pdf).
  • Known sources generate radiation with a continuous spectrum in the range from -180-220 nm to> 1 000 nm (the lower boundary of the spectrum is determined by the transparency boundary of the material used for the lamp bulb) at sufficiently high stability (better than 1%) and integrated radiation brightness.
  • the continuous operation resource of such sources is limited and is determined by the degradation of the electrodes themselves in a high-current arc discharge, as well as by the deposition of erosion products of the electrodes on the inner surface of the lamp, which reduces its transparency.
  • the guaranteed source life is typically up to -3000 hours, which is not enough for many applications.
  • the spectral brightness of a known source ⁇ in units of W / (nm * sr * mm2) ⁇ is insufficient, in particular for applications in microelectronics, since the illumination of an object is determined namely, the brightness of a unit surface of a radiation source.
  • a well-known source of broadband optical radiation with high spectral brightness including filled with a high pressure gas medium
  • SUBSTITUTE SHEET (RULE 26) a camera irradiating the camera with a laser; a system for focusing laser radiation into a camera ([3]: US Pat. No. 7,435,982, "Laser-driven light source”).
  • the well-known source is one of the options for realizing the phenomenon of continuous optical discharge, discovered in 1970 in the USSR ([4]: Generalov N.A., Zimakov V.P. et al. “Continuously burning optical discharge.” Letters in JETP 1970, v. 11, pp. 447-449). Sources based on such an optical discharge are produced, in particular, by Energetiq Technology, Inc.
  • Well-known sources include a camera in the form of a flask transparent to ultraviolet radiation, filled, as a rule, with xenon with a pressure of up to ⁇ 3 MPa (pressure is indicated at room temperature), a laser with a power of ⁇ 20 W to -300 W ( as a rule, a diode laser with a wavelength of ⁇ 1 ⁇ m), a system for focusing laser radiation into a chamber with a gas with a sufficiently large numerical aperture NA up to 0.45-0.50.
  • electrodes are additionally placed for preliminary ionization of the gas by an arc discharge or pulsed electrical breakdown, after which the plasma is supported by focused laser radiation even in the absence of electric current and voltage on the electrodes.
  • Electrodesless method of supplying energy to the plasma with the exception of the moment of its initiation), as well as the compactness and rather stable position of the broadband radiation source.
  • the absence of any noticeable erosion of the electrodes can significantly increase the life of the radiation source — up to> 9 thousand hours or more, as indicated in the product specifications of Energetiq Technology, Inc., when the life is apparently determined by the degradation of the transparent walls of the flask under the influence of a short-wavelength laser plasma radiation.
  • a known source has a significantly higher spectral brightness than arc lamps: a gain in brightness compared to a xenon lamp with a comparable power consumption of to 10 times in the far ultraviolet range of 190-250 nm and up to 2-3 times in the spectral range 300-700 nm.
  • the spectral brightness of a known source is not maximum, and it is important to note that its brightness increases very slowly as the power of the laser used increases, since together with an increase in the laser power, the volume of the emitting plasma also increases. For example, if the laser power is increased from 20 W (source EQ-99) to 60 W (source EQ-1500), the size of the emitting plasma
  • SUBSTITUTE SHEET (RULE 26) the level of 50% of the maximum brightness increases from 060 microns x 140 microns to 0125 microns x 300 microns, that is, the plasma volume increases by 9 times. This means that the power of energy release per unit volume of the plasma decreases with increasing laser power, as does the maximum plasma temperature. That is, an increase in the spectral brightness of the source is achieved in an inefficient way — by increasing the optical thickness of the plasma, which is mainly transparent to intrinsic thermal radiation, and the spectral distribution of the radiation corresponds to a lower plasma temperature.
  • an increase in the plasma size (in particular, due to thermal conductivity) with an increase in the power of the laser supporting the plasma leads to an increase in the absorption of laser radiation at a greater distance from the focal region - this is especially important when using diode lasers, when the absorption of the laser radiation occurs from excited levels of xenon (or another inert gas). Accordingly, an increase in temperature at the periphery of the focal region leads to an increase in the population of the corresponding atomic states and absorption coefficients - as a result, the laser radiation intensity directly in the focal region can even decrease rather than increase with increasing laser power.
  • Changes in the power of laser radiation in a known source lead to variations not only in the brightness of the plasma radiation per se, but also in the position of the region of the laser plasma with maximum brightness, which further increases the instability of the radiation — both the integral and spectral brightness of the known source, especially for significant time intervals.
  • the minimum increase in plasma brightness (and even a decrease in its maximum temperature) with increasing laser radiation power is manifested in broadband radiation sources based on a laser-supported (laser wavelength ⁇ 1 ⁇ m) power up to 1 kW of compact plasma in lamps produced by high-pressure xenon KLA-Tencor Corporation ([6]: https: // w ⁇ ⁇ v.research: ate.net/publication/277130938 High Power Laser-Sustained Plasma Light Sources for KLA-Tencor Broadband Inspection Tools).
  • This source also uses a complex focusing system ([6]) and, as one of its simplification options, in the patent ([7]: US 7,705,331: “METHODS AND SYSTEMS FOR PROVIDING ILLUMINATION OF A SPECIMEN FOR A PROCESS PERFORMED ON THE SPECIMEN) ))
  • each individually focusing system can be made much simpler (see also below).
  • a well-known source [6, 7] uses an electrodeless lamp with a high-pressure gas, and plasma is initiated from the outside with respect to the lamp.
  • the technical result of the claimed invention is to increase the spectral brightness, reduce fluctuations in the position of the plasma and stabilize the brightness of its radiation, as well as increase the resource of the source of broadband optical radiation.
  • the high-brightness broadband radiation source is a chamber filled with a high-pressure gas medium, two irradiating laser cameras with two radiation focusing systems with a substantially coincident focal region and an angle between the laser radiation direction of at least 60 °, and at least at least one laser is a repetitively pulsed laser.
  • SUBSTITUTE SHEET (RULE 26)
  • the laser is a cw laser
  • the second is a pulsed-periodic laser.
  • the authors of this technical solution unexpectedly found that the combination of a cw laser with a power of P i and a pulsed-periodic laser with a power (in pulse) of P2 makes it possible to generate a significantly brighter plasma than when using two continuous lasers with a power of Pi and 2 2 or ( moreover ) a single cw laser with a power of (Pj + P2), and the increase in pulsed brightness can be multiple.
  • the region of high brightness of such an optical discharge (for example, at a level of 50% of the maximum brightness) is concentrated near the intersection of the focal regions of each of the rays and can be significantly smaller than the region occupied by the plasma for each of the laser beams individually.
  • the angle between the direction of laser radiation ⁇ is the smaller of the angles between the corresponding optical axes, as
  • the angle ⁇ is about 90 ° —in this case, at a fixed laser power, the brightness of the plasma radiation is maximum, and its position is the most stable.
  • a continuous laser maintains an optical discharge at a level near the threshold (in the generally accepted sense of the term — near the threshold for maintaining an optical discharge, the fraction of laser radiation energy absorbed by a plasma is small, see for example [8]: Yu. P. Raiser “Gas Physics” discharge. ”M, Nauka, 1987–592 pp.) with a minimum heat release in a gas, a minimum plasma size and a small power emitted by a plasma, respectively, minimal refractive distortions and minimal n by absorption at the periphery of the plasma bunch and a repetitively pulsed laser generates a repetitively pulsed laser plasma, which at the same time exhibits maximum brightness with a minimum size.
  • the plasma brightness is determined by the pulsed power of the Pim laser, and the defocusing of the radiation due to refraction and absorption at the plasma periphery are determined by the average power of the repetitively pulsed laser Pav.
  • the use of a repetitively pulsed laser according to the claimed technical solution in some cases allows to further increase the pulsed power when using lasers with moderate average power.
  • the limiting power of a cw diode laser is determined by the maximum permissible temperature in the generation region, and in the pulse-periodic mode for sufficiently short laser pulses, the temperature in the radiation generation region is determined to a large extent by the average radiation power (heating of the transition during a single laser pulse relatively small), the pulse power in this case can be much higher than average.
  • the irradiation of the surface can be turned off for the duration of the movement of the irradiating surface and the recording systems.
  • the surface analysis performance will be ⁇ 12 cm 2 / s and, thus, a plate with a diameter of 300 mm can be examined in ⁇ 1 minute, while the surface scanning speed is 3.5 m / s.
  • the absorption coefficient of the laser radiation is sufficient to heat the plasma core, supported by a continuous near-threshold laser power, to
  • SUBSTITUTE SHEET (RULE 26) the maximum brightness is produced by the laser pulse rather quickly, during this time the plasma size does not noticeably increase, and the stability of the position of the bright core and the reproducibility of its brightness from pulse to pulse remains high up to a pulse repetition rate of 10 kHz and higher.
  • the duration of an individual laser pulse of the second (pulse-periodic) laser is preferable to choose slightly more (for a scale time of 0.3-10 ⁇ s) of the duration at which the plasma is heated to the maximum brightness of its radiation, since, as mentioned above, the duration " a bright plasma flash of ⁇ 1 ⁇ s (or even less) is sufficient for extremely high sensitivity of optoelectronic registration systems, and further heating of the plasma with a laser pulse only leads to an increase in the average energy on and the plasma and, as a consequence, to increase the absorption and refractive distortions at the periphery of a bright plasma kernel.
  • the duration of an individual laser pulse does not exceed the time of formation of a stationary plasma, including its geometry, corresponding to the simultaneous irradiation of a plasma with two continuous lasers with a total power of (P] + P2).
  • the time of formation of a stationary plasma depends on the laser power, gas pressure, and conditions for focusing radiation, usually amounting to 10-200 ⁇ s.
  • the claimed technical solution allows you to vary the repetition rate of ultra-bright pulses of broadband radiation over a wide range from tens of kilohertz to 1 Hz or less without additional initiation of plasma before each individual radiation pulse. Changing the pulse repetition rate allows you to widely vary the average power of the claimed source without changing its spectral brightness (since it is determined by the pulse power), which is impossible in known sources and is useful for a number of applications.
  • the minimum allowable pulse repetition rate is determined both by the duration of an individual laser pulse and by the time during which the plasma cooled in the absence of laser radiation maintains a sufficiently high absorption coefficient so that the plasma is rapidly heated
  • SUBSTITUTE SHEET (RULE 26) the next impulse (impulses) could be realized without external initiation.
  • this time is determined by the rate of formation and radiative decay of excimer molecules R2 * (R is an inert gas) at a temperature of the cooling plasma (for xenon 7-10 kK) and in xenon with a pressure of ⁇ 15 atm at room temperature 100- 200 ⁇ s.
  • R2 * is an inert gas
  • the minimum pulse repetition rate when both lasers operate in a periodic periodic mode, is xenon with a “cold” pressure of -15 atm 3-5 kHz.
  • the rate of formation of excimer molecules increases and the pulse repetition rate of the laser pulses must be increased.
  • a bright laser plasma is located at the intersection of the focal regions of each of the lasers used, and it is in this (in the optimal case, small) region that a significant part of the laser power is absorbed, allows the use of simple focusing systems with a small numerical aperture, for example, with NA ⁇ 0 , 2.
  • a telephoto lens with a ratio of the focal length F to the light diameter D F / D> 3 with flat and spherical optical surfaces can be used.
  • This type of lens with NA ⁇ 0.2 is significantly simpler than short-focus aspherical systems.
  • the laser plasma when using two simple long-focusing focusing systems that provide a characteristic size of each prefocal region of ⁇ 0200 ⁇ m x 400 ⁇ m (when using one laser and significantly exceeding the plasma maintenance threshold, the laser plasma is usually located precisely in the prefocal region to the “point” of focus), for the angle between the direction of the laser beams ⁇ 90 ° with the appropriate settings, the size of the bright plasma is realized - 0150 microns x 150 microns or less.
  • the use of long-focusing focusing systems makes it possible not only to simplify and reduce the cost of the optical system of the source, but also to increase the solid angle at which laser radiation can be collected and used in applications (the laser focusing system obviously does not allow the use of plasma radiation in
  • the source in order to increase the stability of the radiation of the broadband radiation source, according to the claimed technical solution, includes a feedback element of at least one of the lasers in terms of power or spectral power of the broadband radiation source.
  • the feedback element controls the radiation power of the plasma at one or more wavelengths and, when the signal changes, accordingly adjusts the power of one of the lasers generating a laser plasma, preferably a continuous laser.
  • the source further includes a broadband radiation blocker synchronized with a repetitively pulsed laser.
  • the blocker passes the plasma radiation during the laser pulse or, excluding the initial stage of plasma heating in each pulse, even a slightly shorter time, while the plasma radiation in the rest of the time - in particular, between laser pulses - is blocked.
  • the studied object irradiated by a broadband radiation source is exposed only to radiation with maximum brightness, which minimizes the possible harmful effects of the source, for example, excessive heating of a biological object or the occurrence of photochemical reactions under the influence of a constant background of plasma radiation.
  • the ratio of the plasma brightness during the operation of a pulsed laser and during a pause can be 100-500 or more even without using a blocker.
  • the claimed light source is actually a pulse-periodic source of broadband optical radiation with high brightness, the pulse repetition rate of which is determined by the frequency of the pulse-periodic laser (s), and in the intervals between pulses the power of broadband radiation at orders less than maximum using
  • Such lamps is limited and amounts to 109 pulses at a frequency of 500 Hz (108 pulses for more powerful flash lamps with a frequency of 50- 70 Hz), which corresponds to a lamp operating time of not more than a month, we also indicate less stability compared to continuous short-arc lamps and, especially, with respect to the claimed technical solution, the position of the brightest discharge region, which moves from pulse to pulse.
  • the radiation blocker can be made in various ways, including both electro-optical light choppers and mechanical, for example, a rotating disk with slots.
  • the possibility of using this variant of periodic interruption of radiation is associated with the fact that the radiation of a broadband light source is usually transmitted using small diameter optical fibers, for a small plasma, the diameter of the optical fiber can be 100-200 microns.
  • the duration of a single light pulse transmitted by the slot will be ⁇ 10 ⁇ s (for a fiber diameter of 100 ⁇ m); at a peripheral rotation speed of 30 m / s, the duration of a single light pulse transmitted by the slot will be ⁇ 6-7 ⁇ s.
  • Laser plasma can be generated in a high-pressure inert gas (helium, neon, argon, krypton, xenon) or a high-pressure inert gas mixture; at least one component from the group may also be included in the gas mixture: mercury, hydrogen, nitrogen.
  • the chamber irradiated by focused laser radiation is filled with a heavy inert gas (argon, krypton, xenon) or a mixture of high inert heavy gases of up to several MPa (at
  • plasma initiation can be carried out using electrodes placed in the chamber or using a source external to the chamber.
  • FIG. 1 determination of the angle ⁇ between the radiation directions of the lasers used in the utility model; 1 — optical axis of the radiation of the first laser, 2 — second laser.
  • FIG. 2 optical diagram of an embodiment of the invention
  • 3.4 lasers
  • 5.6 focusing systems
  • 7 a chamber filled with high-pressure gas
  • 8 a plasma radiation collection system.
  • an OSRAM XBO 75W lamp filled with high-pressure xenon with quartz glass walls was used; the outer diameter of the lamp was ⁇ 10 mm.
  • the DLM-30 and PLD-70 diode modules of the NTE IRE-Polyus / 1PC Photonics company were used, the angle between the direction of laser radiation was -90 °.
  • the influence of the lamp shell is reduced mainly to a shift in focus, and not to an increase in the size of the focal region; focus shift can be almost completely compensated for when focusing systems are tuned together.
  • Preliminary ionization in a gas is created by an arc discharge; after plasma ignition in laser beams, the arc discharge is switched off.
  • the relative position of the focal regions of the two lasers used was preliminarily coincident and then fine-tuned to obtain maximum plasma brightness, while the focal regions of the lasers remained essentially the same.
  • SUBSTITUTE SHEET (RULE 26) “Sharp” focusing with NA ⁇ 0.5.
  • the summation of the intensities of the plasma radiation generated separately by each of the cw lasers (when the second laser is turned off) with the above power gives a value of ⁇ 3 times less in the wavelength region 400-600 nm, ⁇ 5 times less for ⁇ ⁇ 300 nm and even greater difference for ⁇ ⁇ 250 nm.
  • the brightness when using two lasers with a similar total power is ⁇ 2 times higher in the length range 300-600 nm waves, ⁇ 3 times more for ⁇ ⁇ 250 nm.
  • the pulsed brightness of the plasma is 2.5 times higher than the brightness of the source of the prototype (EQ-1500) in the wavelength range of 350-600 nm and ⁇ 3 times in the region of ⁇ ⁇ 300 nm.
  • the average total power of the two lasers used was -40 W — 1.5 times less than that of the prototype EQ-1500 with a much simpler laser focusing system.
  • the plasma radiation brightness increased by a further 1-7-4 times depending on the spectral range and exceeded the prototype brightness by 3-5 times at close total laser power.
  • a cw laser along with a pulsed-periodic laser with a power supporting an optical discharge near the threshold of such a discharge makes it possible, on the one hand, to minimize the heat release in the plasma upon absorption of continuous radiation and, on the other hand, as established by the authors, to ensure a sufficient level of pulse-periodic absorption radiation already at the leading edge of the laser pulse.
  • the laser pulse quickly (within 3-5 ⁇ s in the described example) heats the plasma to the maximum possible temperature, ensuring the maximum brightness of the optical discharge radiation.
  • the claimed technical solution allows the efficient use of a pulsed-periodic laser generating sufficiently short pulses with a sufficiently high duty cycle — for example, as indicated above, with a duration of ⁇ 20 ⁇ s and a duty cycle of ⁇ 5
  • SUBSTITUTE SHEET (RULE 26) (Rapid heating of the plasma also makes it possible to reduce the duration of the laser pulse to ⁇ 10 ⁇ s, while increasing the duty cycle of the pulses to -10, etc.). It is this range of combination of parameters that allows a diode laser to obtain a multiple pulse power of laser radiation than the maximum allowable power in continuous operation, and, accordingly, the maximum spectral brightness of a broadband radiation source.
  • the use of a cw laser supporting an optical discharge allows one to independently and widely vary the pulse duration and repetition rate of a repetitively pulsed laser, that is, to realize the frequency and duration of high-spectral brightness broadband radiation pulses necessary for a particular application. In the absence of cw laser radiation, as established by the authors, it is necessary to use laser pulses of significantly longer duration or frequency (i.e., less duty cycle), which significantly limits the characteristics of the source of broadband optical radiation.
  • the variation of the cw laser radiation power allows with a response time of not more than 250-300 ⁇ s (this corresponds to the thermal relaxation time of the bright region of the plasma) to widely control the pulsed plasma power (if a pulse-periodic laser is used), which makes it possible to realize feedback, controlling the pulsed plasma power, including according to a given program, and also provide active stabilization of the parameters of the pulsed laser plasma radiation, controlling the intensity s plasma radiation in one or more spectral bands and appropriately varying the power of one of the lasers is preferably continuous when ispoldzuetsya combination of continuous and pulsed-periodic laser.
  • the claimed technical solution does not exceed (and can be significantly less) the radiation power of the plasma in known sources, and, accordingly, the degradation rate of transmission of the walls of the lamp with compressed gas in the claimed technical solution is not greater than that of analogues.
  • the resource of the claimed source is not less than the resource of the prototype (in many cases, more), while the pulsed brightness of the claimed source is several times greater than the brightness of the prototype.
  • the technical result provided by the combination of features provided in the claimed invention is an increase in spectral brightness, a decrease in plasma position fluctuations and stabilization of the brightness of its radiation, as well as an increase in the source resource and the possibility of changing its average power and pulse repetition rate over a wide range.
  • a pulse-periodic high-bandwidth high-brightness optical pulse source and also its alteration without deviating from the provisions protected by the claims can be made obvious to qualified specialists in this field.
  • another material not silica glass
  • the chamber in which the high-pressure gas mixture is located for example, to operate at a higher pressure of tens of atmospheres
  • the chamber may have a window made of a material that is transparent in the far UV and VUV (MgF2, etc.) for better output of short-wave radiation
  • the composition and pressure of the gas mixture can vary widely.
  • Laser radiation can be focused not only by lens systems, but also by more complex optical elements (for example, off-axis paraboloidal or ellipsoidal
  • SUBSTITUTE SHEET (RULE 26) mirror) or optical systems with different numerical apertures located at different angles to each other and to the direction of gravity (vertical), the preferred, but not the only possible way, is to illuminate the chamber with the gas medium with a continuous laser from the bottom up.
  • blockers absorbers
  • Preliminary ionization of the gas can be carried out as a source located inside the chamber (similar to the example of the implementation of the proposed method), and an external source - for example, a powerful pulsed laser.
  • Fiber lasers, diode lasers, gas lasers (e.g. CO2 lasers), etc., including two lasers with different radiation wavelengths, can be used to irradiate the gas.
  • Systems based on an oscillating or rotating mirror can be used as a broadband source radiation blocker, the blocker can be implemented on electro-or magneto-optical effects, due to additional spectral devices, a spectrum section of a broadband source important for a particular application can be highlighted, various feedback algorithms can be used and etc.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Lasers (AREA)

Abstract

L'invention concerne des sources de rayonnement optique à bande large possédant une luminosité spectrale élevée et présente un intérêt pour des applications en micro-électronique, en spectroscopie, en photochimie et dans d'autres domaines. Le résultat technique de la solution technique proposée consiste à augmenter sensiblement la luminosité spectrale, à réduire l'oscillation de la position du plasma et à stabiliser l'intensité de son rayonnement, ainsi qu'à augmenter la durée de vie de la source. Le résultat technique est obtenu en ce que la source de rayonnement optique à bande large à luminosité élevée comprend une chambre haute pression remplie d'un milieu gazeux haute pression, deux laser irradiant la chambre dotés de deux systèmes de mise au point du rayonnement , avec une région focale qui est, de fait, identique, et un angle entre les rayonnements des lasers d'au moins 60°, au moins un des laser étant un laser à impulsions périodiques.
PCT/RU2016/000135 2015-03-16 2016-03-11 Source de rayonnement optique à bande large à luminosité élevée WO2016148608A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
RU2015109061 2015-03-16
RU2015109061 2015-03-16

Publications (1)

Publication Number Publication Date
WO2016148608A1 true WO2016148608A1 (fr) 2016-09-22

Family

ID=56919498

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/RU2016/000135 WO2016148608A1 (fr) 2015-03-16 2016-03-11 Source de rayonnement optique à bande large à luminosité élevée

Country Status (1)

Country Link
WO (1) WO2016148608A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050199829A1 (en) * 2004-03-10 2005-09-15 Partlo William N. EUV light source
US20060039435A1 (en) * 2004-06-14 2006-02-23 Guy Cheymol Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography
US7705331B1 (en) * 2006-06-29 2010-04-27 Kla-Tencor Technologies Corp. Methods and systems for providing illumination of a specimen for a process performed on the specimen
US20140239795A1 (en) * 2013-02-26 2014-08-28 Samsung Electronics Co., Ltd. Light source device and semiconductor manufacturing apparatus including the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050199829A1 (en) * 2004-03-10 2005-09-15 Partlo William N. EUV light source
US20060039435A1 (en) * 2004-06-14 2006-02-23 Guy Cheymol Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography
US7705331B1 (en) * 2006-06-29 2010-04-27 Kla-Tencor Technologies Corp. Methods and systems for providing illumination of a specimen for a process performed on the specimen
US20140239795A1 (en) * 2013-02-26 2014-08-28 Samsung Electronics Co., Ltd. Light source device and semiconductor manufacturing apparatus including the same

Similar Documents

Publication Publication Date Title
US9941655B2 (en) High power broadband light source
EP2534672B1 (fr) Source lumineuse commandée par laser
US10887974B2 (en) High efficiency laser-sustained plasma light source
US9723703B2 (en) System and method for transverse pumping of laser-sustained plasma
RU2571433C1 (ru) Способ генерации широкополосного оптического излучения с высокой яркостью
TW201515058A (zh) 用來使用雷射支持之電漿照明輸出對樣本成像之系統與方法
CN202008060U (zh) 模拟太阳光照射装置
KR101172622B1 (ko) 플라즈마를 이용한 안정화된 극자외선 발생장치
KR102228496B1 (ko) 레이저-지속 플라즈마 소스의 vuv 방사선 방출을 저해하는 시스템 및 방법
CN108369891B (zh) 具有渐变吸收特征的激光维持等离子体光源
CN108353490B (zh) 用于激光维持的等离子体照明的系统及方法
RU2680143C2 (ru) Способ генерации широкополосного оптического излучения с высокой яркостью
RU157892U1 (ru) Источник широкополосного оптического излучения с высокой яркостью
WO2016148608A1 (fr) Source de rayonnement optique à bande large à luminosité élevée
CN113366610B (zh) 用于使用交错脉冲照明源泵浦激光维持等离子体的系统及方法
RU2732999C1 (ru) Источник света с лазерной накачкой и способ зажигания плазмы
JP7203125B2 (ja) 周波数変換照明源で以てレーザ維持プラズマをポンピングするシステム及び方法

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 16765339

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 16765339

Country of ref document: EP

Kind code of ref document: A1