WO2016117082A1 - Water purification system - Google Patents

Water purification system Download PDF

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Publication number
WO2016117082A1
WO2016117082A1 PCT/JP2015/051678 JP2015051678W WO2016117082A1 WO 2016117082 A1 WO2016117082 A1 WO 2016117082A1 JP 2015051678 W JP2015051678 W JP 2015051678W WO 2016117082 A1 WO2016117082 A1 WO 2016117082A1
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WIPO (PCT)
Prior art keywords
water
operation mode
filtration
treated
path
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PCT/JP2015/051678
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French (fr)
Japanese (ja)
Inventor
聡 江崎
祐樹 佐藤
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株式会社クボタ
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Priority to PCT/JP2015/051678 priority Critical patent/WO2016117082A1/en
Publication of WO2016117082A1 publication Critical patent/WO2016117082A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
    • B01D61/04—Feed pretreatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
    • B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis

Definitions

  • the present invention includes a pretreatment device for removing insoluble components contained in raw water, a pressure pump for pressurizing water to be treated from which insoluble components have been removed by the pretreatment device, and a pressure pump for pressurization.
  • the present invention relates to a water purification system comprising a reverse osmosis membrane device for obtaining treated water from which soluble components have been removed from the treated water.
  • a pretreatment device that removes insoluble components such as dust contained in raw water is placed upstream of the reverse osmosis membrane device in order to reduce the processing load of the reverse osmosis membrane device. is set up.
  • Patent Document 1 and Patent Document 2 disclose examples employing a hollow fiber membrane.
  • the membrane when a hollow fiber membrane is used, the membrane may be damaged or deteriorated by backwashing treatment or chemical washing treatment performed regularly or irregularly. There was a problem that maintenance costs such as labor costs increased.
  • a non-woven fabric membrane having a pore diameter of about 5 ⁇ m may be used instead of the hollow fiber membrane.
  • the non-woven fabric membrane has a problem in that the pore size varies and the particles that are insoluble components cannot be sufficiently captured, and therefore the load applied to the reverse osmosis membrane device in the subsequent stage cannot be sufficiently reduced.
  • the non-woven fabric membrane is blocked, there is a problem that maintenance cost is increased as in the case of the hollow fiber membrane because the membrane cannot be washed and backwashed and the membrane must be replaced.
  • An object of the present invention is to provide a water purification system capable of reducing the processing load of the reverse osmosis membrane device and reducing the maintenance cost.
  • the first characteristic configuration of the water purification system cleaning method removes insoluble components contained in raw water as described in claim 1 of the claims.
  • a pretreatment device, a pressure pump that pressurizes the water to be treated from which insoluble components have been removed by the pretreatment device, and a treatment that has removed soluble components from the water to be treated that has been pressurized by the pressure pump A reverse osmosis membrane device for obtaining water, wherein the pretreatment device uses a ceramic membrane and pressurizes the water to be treated from which insoluble components have been removed by the pretreatment device
  • the water to be treated from which the insoluble component has been removed by the ceramic membrane is increased in pressure by the pressure pump disposed along the first path and supplied to the reverse osmosis membrane device.
  • the soluble component is removed.
  • the water to be treated obtained by the reverse osmosis membrane device is disposed along the second path. The pressure is increased and the backwash water is supplied to the pretreatment device, so that the ceramic film is removed.
  • a pressure increasing pump for supplying the water to be treated to the reverse osmosis membrane device and a pressure increasing pump for supplying the water to be treated treated by the reverse osmosis membrane device to the ceramic membrane as reverse cleaning water is also used, and the increase in equipment cost can be suppressed.
  • the ceramic membrane used as the pretreatment device has a sharper pore size compared to the non-woven fabric membrane, so it has excellent particle capture performance, and not only the water quality flowing into the reverse osmosis membrane is sufficiently improved. Since it is not easily damaged, it can be used without replacement for a long period of time, and the maintenance cost can be reduced.
  • the second characteristic configuration is the same as the first characteristic configuration described above, and the operation mode of the water purification system is changed to the filtration operation mode and the reverse cleaning mode based on the pressure loss of the pretreatment device.
  • the operation mode switching unit supplies the water to be treated to the pressure pump along the first path when switching from the back washing mode to the filtration operation mode. And when switching from the said filtration operation mode to the said back washing
  • the operation mode switching unit switches the operation mode to the cleaning mode and pressurizes the water to be treated along the second path when the pressure loss of the pretreatment device increases.
  • the operation mode is switched to the filtration operation mode and the water to be treated is added along the first path.
  • the supply path of the water to be treated is switched so as to be supplied to the pressure pump. Therefore, by switching the flow path, a single pressurizing pump can be rationally used for both filtration and backwashing.
  • an air compressor and the air compressed by the air compressor are back-washed into the pretreatment device.
  • the cleaning water and the compressed air repeatedly flow not only on the surface of the ceramic membrane but also inside the pores. Molecules and colloidal particles that are accumulated in the pores are dissolved in the supplied washing water, floated and partially discharged from the surface of the pores. As the gas-liquid interface formed by the supplied compressed air moves, it is discharged together with the washing water from the pores. Molecules and colloidal particles dissolved or suspended in the cleaning water are efficiently removed by the surface tension at the gas-liquid interface.
  • the molecules and fine particles gathered in the pores of the ceramic membrane are likely to associate with each other, and if they associate and grow to particles larger than the inlet diameter of the pores, they cannot be easily discharged with washing water.
  • water is taken away from the temporarily grown particles, and the particle size is reduced compared to the case where the particles existed in water. For this reason, the particles whose diameter is reduced by the washing water flowing next to the compressed air are easily discharged from the inside of the membrane.
  • the fourth feature configuration further includes a chemical solution supply path for supplying a cleaning chemical solution in the raw water filtration direction, as described in claim 4,
  • the mode switching unit is configured to switch to the chemical cleaning mode for supplying the chemical liquid from the chemical liquid supply path to the pretreatment device before switching from the filtration operation mode to the reverse cleaning mode.
  • the ceramic membrane clogged with dirt can be effectively purified, but radicals such as hydroxyl groups that are activating components adhere to the surface inside the pores. After switching to the filtration operation mode, dirt is likely to adhere, and there is a risk of increasing pressure loss in a short period of time. However, since the radicals are effectively removed from the inside of the pores by the liquid cleaning process and the gas cleaning process repeated after the chemical liquid cleaning mode, it is possible to suppress an increase in pressure loss due to adhesion of dirt over a long period of time even after the chemical liquid cleaning. It becomes like this.
  • FIG. 1 is an explanatory diagram of a water purification system.
  • 2A is an explanatory diagram of the pretreatment device in the filtration operation mode
  • FIG. 2B is an explanatory diagram of the pretreatment device in the chemical solution cleaning mode
  • FIG. 2C is a liquid cleaning mode using washing water.
  • FIG. 2D is an explanatory diagram of a gas cleaning mode using cleaning air.
  • Fig.3 (a) is a top view of the filtration module used for a pre-processing apparatus
  • FIG.3 (b) is the same front view.
  • 4 (a) is a plan view of a filtration element used in the filtration module
  • FIGS. 4 (b) and 4 (c) are perspective views of the filtration element
  • FIG. 4 (d) is a support part of the filtration element. It is a perspective view.
  • FIG. 5 (a) is a perspective view of a filtration element showing another embodiment, FIG. 5 (b) is the same plan view, FIG. 5 (c) is the same front view, and FIG. 5 (d) is the filtration module.
  • FIG. 7 is a flowchart of the filtration operation mode of the water purification system.
  • FIG. 8 is a flowchart of the liquid cleaning mode of the water purification system.
  • FIG. 9 is a flowchart of the gas cleaning mode of the water purification system.
  • FIG. 10 is a flowchart of a chemical cleaning mode of the water purification system.
  • FIG. 11 is a characteristic explanatory diagram of the cleaning effect when the liquid cleaning mode and the gas cleaning mode are repeated.
  • FIG. 1 shows a water purification system 300 that functions as a pure water production apparatus.
  • symbol PSn (n is a natural number) is a pressure gauge
  • symbol LPSn (n is a natural number) is a low pressure sensor
  • symbol WSL is a water level meter
  • symbol Vn (n is a natural number) is a gate valve
  • symbol SVn (n is a natural number) is The motorized valve
  • the symbol Pn (n is a natural number) is a pump
  • the symbol T is an RO water tank
  • the symbol MT is a chemical solution tank
  • the symbol CMP is an air compressor.
  • Various sensor outputs such as a pressure gauge are input to a control device CNT that controls the system, and based on a control program incorporated in the control device CNT, a predetermined calculation corresponding to the input sensor value is performed.
  • the electric valve SVn and the pump Pn are driven and controlled based on the above.
  • An inverter circuit is provided so that the pressure of the treated water by the pressurizing pump P1 can be variably adjusted, and the switching frequency of the inverter circuit is variably adjusted by the control device CNT.
  • the control device CNT includes, for example, a microcomputer, a memory storing a control program, and various input / output interface circuits.
  • the water purification system 300 is a system that purifies groundwater or lake water as raw water to produce pure water, and includes a pretreatment device FL2 that removes insoluble components contained in the raw water, and an insoluble component in the pretreatment device FL2.
  • a pressure pump P1 that pressurizes the water to be treated from which water has been removed, and a reverse osmosis membrane device FLR that obtains water to be treated from which the soluble components have been removed from the water to be treated that has been pressurized by the pressure pump P1. .
  • valves, pumps, pretreatment device FL2, reverse osmosis membrane device FLR and the like are connected to each other in a rectangular parallelepiped unit partitioned by a bar frame via a pipe.
  • a filtration component 100 containing a ceramic membrane is used as the pretreatment device FL2.
  • a fiber filter that precipitates and removes impurities such as sand and dust may be provided in the previous stage of the pretreatment device FL2.
  • the reverse osmosis membrane device FLR separates a dilute solution containing a solute and a concentrated solution with a semipermeable membrane that allows only the solvent to pass through and does not allow the solute to pass, and applies a pressure greater than the osmotic pressure difference to the concentrated solution side. Is a device that allows the solvent to permeate from the solution side to the dilute solution side.
  • the treated water that has passed through the pretreatment device FL2 is pressurized to a predetermined pressure by the pressure pump P1 and then supplied to the reverse osmosis membrane device FLR.
  • the purified water from which the soluble components have been removed by the reverse osmosis membrane device FLR is RO It is stored in the water tank T.
  • the purified water stored in the RO water tank T is sent from the pump P2 to the customer.
  • Raw water is pumped by a pump (not shown), for example, at a pressure of about 0.2 MPa or more, about 30 L / min. Water enters the system through the gate valve V1 at the above flow rate.
  • the clogging of the pretreatment device FL2 is monitored by the low pressure sensor LPS1, and when the pressure loss value reaches a predetermined pressure loss value, it is backwashed, and when the pressure loss value does not recover by reverse washing, the chemical solution is washed.
  • the indentation pressure is measured by the pressure gauge PS5, the pressure is increased to a predetermined indentation pressure by the pressurizing pump P1, and the water to be treated is pumped to the reverse osmosis membrane device FLR.
  • the control device CNT controls the opening and closing of the motorized valves SV2, SV3, SV6, SV9 so that the system operates in the filtration operation mode when generating purified water, and reverse osmosis the raw water via the pretreatment device FL2. Supply to membrane device FLR.
  • control device CNT controls the opening of the motor-operated valve SV2 and closes the motor-operated valves SV3, SV6, SV9 so that the system operates in the cleaning operation mode, and further controls the motor-operated valve SV4.
  • the purified water stored in the RO water tank T is supplied to the pretreatment device FL2 via the pressure pump P1.
  • the filtration component 100 which is the pretreatment apparatus FL2 is composed of a casing 101 and a filtration module 10 accommodated in the casing 101.
  • a raw water supply unit 102 is formed at the lower end side of the casing 101
  • a raw water discharge unit 103 is formed at the upper end side
  • a filtrate outflow unit 104 is formed above the side wall of the casing 101
  • a wash water supply unit 105 is formed below the side wall.
  • a support portion is fixed in the casing 101 via a seal ring 106.
  • the relative positions of the raw water supply unit 102, the raw water discharge unit 103, the filtered water outflow unit 104, and the washing water supply unit 105 of the pretreatment device FL2 shown in FIG. 2A correspond to the pretreatment device FL2 shown in FIG. Yes.
  • FIGS. 3A and 3B illustrate the filtration module 10.
  • the filtration module 10 is composed of a pair of upper and lower support parts 11 and 12 in the form of a disk, and six block-like filtration elements 1A to 1F fixed at both ends by the support parts 11 and 12.
  • Each of the elements 1A to 1F is configured such that six filtration elements 1 are juxtaposed and the cross section becomes a substantially equilateral triangle.
  • the filtration elements 1A to 1F are formed with a fluid flow hole 2 penetrating between a pair of opposed surfaces 1a and 1b.
  • the fluid to be treated is separated or concentrated between the peripheral surface 1c sandwiched between the opposing surfaces 1a and 1b and the inner surface 2a of the fluid flow hole 2.
  • a plurality of porous bodies are arranged adjacent to each other via a spacer member 3 made of resin or ceramics so that a gap G is formed between the peripheral surfaces 1c of the porous bodies.
  • the porous body is made of, for example, ceramics that are formed by extrusion and becomes a porous body by firing, and the spacer members 3 are provided at least at both ends in the longitudinal direction along the fluid flow hole 2. In the case of a long length, the spacer member 3 may be appropriately provided also in the intermediate portion.
  • the raw water When the raw water flows into the fluid flow hole 2, the raw water is filtered through pores existing between the inner surface 2 a and the peripheral surface 1 c of the fluid flow hole 2 and oozes out from the peripheral surface to the outside. If the pore size distribution of the porous body is adjusted in advance, the raw water can be filtered and the filtered water can be leached from the peripheral surface, or the raw water can be leached from the peripheral surface and the raw water can be concentrated. That is, the said filtration element 1 functions as a tubular filtration membrane of the symmetrical structure by which the pore for filtration was formed in the surrounding part.
  • the ceramic material other alumina (Al 2 O 3) or cordierite, etc., can be porous body used capable of forming ceramics.
  • the bonding material can also be obtained by mixing a binder with similar ceramics.
  • the porous body is formed so that the inner diameter is 3 mm, the outer diameter is 5 mm, the length is 250 to 500 mm, and the pore diameter is set in the range of 0.05 ⁇ m to 1.8 ⁇ m.
  • the length of the porous body can be appropriately set based on the required membrane area, and may be set in the range of 100 to 1000 mm, and more preferably in the range of 250 to 500 mm.
  • the pore diameter of the porous body can be appropriately set depending on the object of filtration or concentration, and may be set in the range of 0.05 ⁇ m to 5.0 ⁇ m, preferably in the range of 0.1 ⁇ m to 2.0 ⁇ m. A range of 5 ⁇ m to 2.0 ⁇ m is more preferable.
  • the porous body preferably has an inner diameter of 1 to 5 mm and an outer diameter of 2 to 10 mm, and a gap formed by the spacer member 3 is preferably set to a range of 0.5 to 2.0 mm.
  • the support portions 11 and 12 are provided with partition walls that are partitioned into shapes corresponding to the cross-sections of the block-shaped filtration elements 1A to 1F, and as shown in FIG. 3 (a), Both ends are inserted into the respective sections in such a posture that one vertex of the block-shaped filtration elements 1A to 1F faces the center, and the cross section is formed into a regular hexagon as a whole.
  • the sections of the support portions 11 and 12 are configured to be slightly larger than the cross section of the block-shaped filtration elements 1A to 1F. Therefore, as shown in FIG. 4 (c), the block-shaped filtration elements 1A to 1F are formed so that gaps are evenly formed between the sections of the support portions 11 and 12 and the peripheral surfaces of the filtration elements 1A to 1F.
  • a tape 4 such as a plastic paraffin film is wound around both ends of 1F.
  • Resin 5 for end sealing for example, epoxy resin, in the space formed by the thickness of the tape 4 with the end portions of the filtration elements 1A to 1F inserted into the sections of the support portions 11 and 12 and the gaps between the filtration elements 1 Or filled with silicone resin.
  • FIGS. 5A and 5B show another example of the filtration element 1.
  • FIG. The filtration element 1 is configured so that a partial region of each inner surface 2a of the fluid flow hole 2, that is, a band-shaped region along the longitudinal direction of the fluid flow hole 2 of the inner peripheral surface 2a is opposed to the peripheral surface 1c.
  • a plurality of, specifically six, fluid flow holes 2 are formed between the pair of opposed surfaces 1a and 1b.
  • the raw water is uniformly filtered or concentrated from the band-like region facing the peripheral surface 1c of the porous body toward the peripheral surface 1c. Very high processing efficiency can be obtained and sufficient strength can be secured.
  • FIG. 5 (a) shows a state in which the cross section is disposed oppositely on one surface of the circumferential surface 1c of the substantially triangular filtration element 1 and joined via the spacer member 3.
  • FIG.5 (b) it arrange
  • the state of being joined via is shown.
  • FIGS. 6A and 6B show the filtration module 10 configured as described above.
  • the treated water filtered by the filtration module 10 is filtered out. This is a dead-end filtration unit that flows out from 104. Further, when the raw water discharge unit 103 is circulated and supplied to the raw water supply unit 102 without being blocked, a cross-flow type filtration processing unit is obtained.
  • a cleaning chemical solution is press-fitted from the raw water discharge portion 103 to discharge the chemical solution from the raw water supply portion 102 and the cleaning water supply portion 105.
  • chemical cleaning is performed along the flow in the same direction as the filtration direction.
  • the cleaning water is injected from the cleaning water supply unit 105 and drained from the raw water discharge unit 103.
  • the reverse cleaning is performed along the flow in the direction opposite to the filtration direction.
  • the compressed water for cleaning is supplied from the cleaning water supply unit 105 and exhausted from the raw water discharge unit 103 and the filtered water outflow unit 104. Gas cleaning is performed.
  • FIG. 7 shows the flow of raw water and treated water during the filtration operation mode with double arrows.
  • the opening degree of the electric valves SV6 and SV9 is mainly adjusted by the control device CNT, and the electric valves SV2 and SV3 are closed. As a result, dead-end filtration is performed in the pretreatment device FL2.
  • the raw water is supplied to the reverse osmosis membrane device FLR via the pretreatment device FL2 by the pressurization pump P1 to a pressure higher than the reverse osmosis pressure of the reverse osmosis membrane, and the purified water from which soluble components are removed from the treated water. It is stored in the RO water tank T.
  • a path for supplying the water to be treated from which insoluble components have been removed by the pretreatment apparatus FL2 to the reverse osmosis membrane apparatus FLR via the pressure pump P1 is a first path.
  • FIG. 8 shows the flow of cleaning water in the liquid cleaning mode among the backwashing mode composed of two modes of the liquid cleaning mode and the gas cleaning mode by a double arrow line.
  • the opening degree of the motorized valves SV4 and SV7 is mainly adjusted by the control device CNT, and the motorized valves SV1 and SV6 are closed.
  • the purified water stored in the RO water tank T is increased by the pressurizing pump P1 via the electric valve SV7 as washing water, and further press-fitted into the pretreatment device FL2 via the electric valve SV4. Then, the cleaning waste water is drained through the electric valve SV2.
  • a path for supplying the water to be treated obtained by the reverse osmosis membrane apparatus FLR to the pretreatment apparatus FL2 as the backwash water via the pressure pump P2 is the second path.
  • FIG. 9 shows the flow of cleaning water during the gas cleaning mode in the backwash mode by a double arrow line.
  • the control devices CNT mainly adjust the opening degrees of the motor operated valves SV2 and SV5, respectively, and close the motor operated valves SV1 and SV6.
  • the compressed air from the air compressor CMP is press-fitted into the pretreatment device FL2 through the electromagnetic valve SV5 as a cleaning gas.
  • the compressed air flows in the direction opposite to the filtration direction and is exhausted through the gate valve V3 and the electromagnetic valve SV3.
  • water accompanying the compressed air is drained through the electromagnetic valve SV3.
  • a path for supplying air compressed by the air compressor CMP to the pretreatment apparatus FL2 as backwash air is a third path.
  • the flow of the chemical during the chemical cleaning mode is indicated by a double arrow line.
  • the chemical liquid pump P3 and the gate valves V2, V3, V4 are mainly opened by the control device CNT, and the electric valves SV1, SV2, SV4, SV6 are closed.
  • the chemical in the chemical tank MT is press-fitted into the pretreatment apparatus FL2 by the chemical pump P3.
  • the chemical liquid press-fitted into the pretreatment apparatus FL2 is collected in the chemical liquid tank MT via the gate valves V2 and V3 and the gate valves V7 and V8 of the chemical liquid tank MT.
  • a route for supplying the cleaning chemical solution in the raw water filtration direction via the gate valve V3 is a chemical solution supply route.
  • the filtration operation mode is returned to the filtration operation mode, and when the pressure loss is not reduced so much after the cleaning mode is executed, the chemical solution cleaning mode is executed.
  • the cleaning liquid is pressurized and supplied in the direction opposite to the filtration direction of the stock solution to wash the filtration membrane
  • the cleaning gas is pressurized and supplied in the direction opposite to the filtration direction of the stock solution to wash the filtration membrane.
  • the gas cleaning mode is repeatedly executed. It is preferable that the liquid cleaning mode and the gas cleaning mode are repeatedly executed at a predetermined cycle, but it is not necessary to be repeated at a constant cycle.
  • the cleaning water and the cleaning gas flow through not only the surface of the filtration membrane but also the pores. Molecules and colloidal particles that are accumulated in the pores are dissolved in the supplied washing water, floated and partially discharged from the surface of the pores. As the gas-liquid interface formed by the supplied cleaning gas moves, it is discharged together with the cleaning water from the pores. Molecules and colloidal particles dissolved or suspended in the cleaning water are efficiently removed by the surface tension at the gas-liquid interface.
  • the molecules and fine particles gathered in the pores of the filtration membrane are likely to associate with each other, and if they associate and grow to particles larger than the inlet diameter of the pores, they cannot be easily discharged with washing water.
  • water is taken away from the temporarily grown particles, and the particle diameter becomes smaller than that in the case where the particles existed in the water. For this reason, the particles whose diameter is reduced by the cleaning water flowing next to the cleaning gas are easily discharged from the inside of the membrane.
  • the time required for one operation of the liquid cleaning mode and the gas cleaning mode may be set as appropriate based on the size of the filtration membrane and the pore diameter, and the pore size distribution is set in the range of 1.0 ⁇ m to 2.0 ⁇ m. In the case of the symmetric type ceramic filtration membranes, it may take several tens of seconds. At this time, both the pressure of the cleaning water and the cleaning air may be set to about several MPa.
  • the repetition time of the liquid cleaning mode and the gas cleaning mode may be about 3 to 5 times. When it is repeated three times, it takes several minutes in total. Either the liquid cleaning mode or the gas cleaning mode may be executed first.
  • control device CNT functions as an operation mode switching unit that switches the operation mode of the water purification system to either the filtration operation mode or the backwash mode based on the pressure loss of the pretreatment device FL2.
  • the operation mode switching unit supplies the treated water to the pressure pump P1 along the first path when switching from the back washing mode to the filtration operation mode, and when switching from the filtration operation mode to the back washing mode, The supply path of the water to be treated is switched so that the water to be treated is supplied to the pressure pump P1 along the path. And the feed water pressure of a pressurization pump is switched according to an operation mode. In the filtration operation mode, the pressure is increased to a high pressure equal to or higher than the reverse osmosis pressure, and in the reverse cleaning mode, the pressure is increased to about several MPa lower than that.
  • the operation mode switching unit switches the operation mode to the cleaning mode and adds the treated water along the second path.
  • the pretreatment device cleaning is completed after switching to the cleaning mode after switching the supply path of the water to be supplied to the pressure pump, the operation mode is switched to the filtration operation mode, and the water to be processed is supplied along the first path.
  • the supply path of the water to be treated is switched so as to be supplied to the pressure pump. Therefore, by switching the flow path, a single pressurizing pump can be rationally used for both filtration and backwashing.
  • the operation mode switching unit When switching to the filtration operation mode, the operation mode switching unit supplies the pretreatment device FL2 with the water to be treated along the second path, and the compressed air is supplied to the pretreatment apparatus FL2 along the third path. It is preferable that the gas cleaning mode to be supplied is configured to be repeated at a predetermined period.
  • the operation mode switching unit is configured to switch from the chemical solution supply path to the chemical solution cleaning mode for supplying the chemical solution to the pretreatment device FL2 before switching from the filtration operation mode to the reverse cleaning mode.
  • FIG. 11 shows the cumulative filtration operation time and pressure loss fluctuation characteristics of the filtration element 1 used in the pretreatment apparatus FL2.
  • a new filtration membrane reaches a pressure loss of 50 kPa that requires cleaning in an operating time of about 280 minutes.
  • the filtration membrane after chemical cleaning reaches a pressure loss of 50 kPa in about 60 minutes after cleaning.
  • the time required for the pressure loss to rise significantly in the filtration membrane in the case where the liquid cleaning and the gas cleaning are repeated without performing the chemical cleaning compared to the case of simply performing the chemical cleaning.
  • the pressures of the cleaning water and the cleaning air are both 0.2 MPa, 20 minutes each, and 3 repetitions. From these characteristics, it can be understood that the cleaning effect is higher than that of the chemical cleaning, and the increase in pressure loss can be suppressed for a long time.
  • a water purification system can be provided.
  • the embodiment described above is one aspect of the present invention, and the scope of the present invention is not limited by the description, and the specific configuration of the water purification system is appropriately set within the range in which the effects of the present invention are exhibited.
  • the specific material, structure, size and the like of the ceramic film to which the present invention is applied are not particularly limited.
  • Filtration element 1a Filtration element 1a, 1b: Opposing surface 1c: Circumferential surface 2: Fluid flow hole 2a: Inner surface 3: Spacer member 100: Filtration component 300: Water purification system

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  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
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  • Life Sciences & Earth Sciences (AREA)
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Abstract

Provided is a water purification system with which it is possible to reduce maintenance costs and reduce the processing load of a reverse osmosis membrane device. The water purification system is provided with: a pretreatment device that removes insoluble components included in raw water; a pressurizing pump that pressurizes treated water from which the insoluble components were removed by the pretreatment device; and a reverse osmosis membrane device that produces treated water resulting from removing the soluble components from the treated water pressurized by the pressurizing pump, wherein a ceramic membrane is used in the pretreatment device. The water purification system is further provided with: a first route, by which the treated water from which the insoluble components were removed by the pretreatment device is supplied to the reverse osmosis membrane device via the pressurizing pump; and a second route, by which the treated water produced by the reverse osmosis membrane device is supplied as backwash water to the pretreatment device via the pressurizing pump.

Description

浄水システムWater purification system
　本発明は、原水に含まれる不溶解性成分を除去する前処理装置と、前処理装置で不溶解性成分が除去された被処理水を加圧する加圧ポンプと、加圧ポンプで加圧された被処理水から溶解性成分を除去した被処理水を得る逆浸透膜装置と、を備えている浄水システムに関する。 The present invention includes a pretreatment device for removing insoluble components contained in raw water, a pressure pump for pressurizing water to be treated from which insoluble components have been removed by the pretreatment device, and a pressure pump for pressurization. The present invention relates to a water purification system comprising a reverse osmosis membrane device for obtaining treated water from which soluble components have been removed from the treated water.
　逆浸透膜装置が組み込まれた浄水システムでは、逆浸透膜装置の処理負荷を軽減するために、原水に含まれる塵埃等の不溶解性成分を除去する前処理装置が逆浸透膜装置の前段に設置されている。 In a water purification system incorporating a reverse osmosis membrane device, a pretreatment device that removes insoluble components such as dust contained in raw water is placed upstream of the reverse osmosis membrane device in order to reduce the processing load of the reverse osmosis membrane device. is set up.
　このような前処理装置として、特許文献１や特許文献２には中空糸膜を採用する例が開示されている。 As such a pretreatment device, Patent Document 1 and Patent Document 2 disclose examples employing a hollow fiber membrane.
ＷＯ２０１３／０６５３５８号公報WO2013 / 065358 特開２００１－２１９１６４号公報JP 2001-219164 A
　しかし、中空糸膜を用いる場合には、定期的または不定期に行なわれる逆洗浄処理や薬液洗浄処理で膜が破損し或いは劣化する虞があり、新たな中空糸膜の費用や交換作業のための人件費等のメンテナンスコストが嵩むという問題があった。 However, when a hollow fiber membrane is used, the membrane may be damaged or deteriorated by backwashing treatment or chemical washing treatment performed regularly or irregularly. There was a problem that maintenance costs such as labor costs increased.
　そこで、中空糸膜に代えて孔径が５μｍ程度の不繊布膜が用いられる場合もあった。しかし、不繊布膜は孔径にバラつきがあり、不溶解性成分である粒子を十分に捕捉できないため、後段の逆浸透膜装置に掛かる負荷を十分に低減できないという問題があった。また不繊布膜が閉塞した場合には、薬液洗浄や逆洗浄ができないために膜を交換せざるを得ず、中空糸膜と同様にメンテナンスコストが嵩むという問題があった。 Therefore, a non-woven fabric membrane having a pore diameter of about 5 μm may be used instead of the hollow fiber membrane. However, the non-woven fabric membrane has a problem in that the pore size varies and the particles that are insoluble components cannot be sufficiently captured, and therefore the load applied to the reverse osmosis membrane device in the subsequent stage cannot be sufficiently reduced. In addition, when the non-woven fabric membrane is blocked, there is a problem that maintenance cost is increased as in the case of the hollow fiber membrane because the membrane cannot be washed and backwashed and the membrane must be replaced.
　本発明の目的は、逆浸透膜装置の処理負荷を低減するとともに、メンテナンスコストを低減可能な浄水システムを提供する点にある。 An object of the present invention is to provide a water purification system capable of reducing the processing load of the reverse osmosis membrane device and reducing the maintenance cost.
　上述の目的を達成するため、本発明による浄水システムの洗浄方法の第一の特徴構成は、特許請求の範囲の書類の請求項１に記載した通り、原水に含まれる不溶解性成分を除去する前処理装置と、前記前処理装置で不溶解性成分が除去された被処理水を加圧する加圧ポンプと、前記加圧ポンプで加圧された被処理水から溶解性成分を除去した被処理水を得る逆浸透膜装置と、を備えている浄水システムであって、前記前処理装置にセラミック膜を用いるとともに、前記前処理装置で不溶解性成分が除去された被処理水を前記加圧ポンプを介して前記逆浸透膜装置に供給する第１経路と、前記逆浸透膜装置で得られた被処理水を前記加圧ポンプを介して前記前処理装置に逆洗浄水として供給する第２経路とを備えている点にある。 In order to achieve the above-mentioned object, the first characteristic configuration of the water purification system cleaning method according to the present invention removes insoluble components contained in raw water as described in claim 1 of the claims. A pretreatment device, a pressure pump that pressurizes the water to be treated from which insoluble components have been removed by the pretreatment device, and a treatment that has removed soluble components from the water to be treated that has been pressurized by the pressure pump A reverse osmosis membrane device for obtaining water, wherein the pretreatment device uses a ceramic membrane and pressurizes the water to be treated from which insoluble components have been removed by the pretreatment device A first path for supplying the reverse osmosis membrane device via a pump, and a second path for supplying the water to be treated obtained by the reverse osmosis membrane device to the pretreatment device as reverse wash water via the pressure pump. And a route.
　上述の構成によれば、セラミック膜で不溶解性成分が除去された被処理水が第１経路に沿って配置された加圧ポンプで増圧されて逆浸透膜装置に供給され、被処理水の溶解性成分が除去されるようになる。そして、補足した微粒子がセラミック膜の細孔に詰まり、セラミック膜の圧損が大きくなった場合には、逆浸透膜装置で得られた被処理水が第２経路に沿って配置された加圧ポンプで増圧されて逆洗浄水として前処理装置に供給されることで、セラミック膜の汚れが除去される。つまり、被処理水を逆浸透膜装置に供給する際の増圧用の加圧ポンプと、逆浸透膜装置で処理された被処理水を逆洗浄水としてセラミック膜に供給する際の増圧用の加圧ポンプが兼用され、設備コストの上昇も抑制できるようになる。さらに、前処理装置として用いるセラミック膜は、不繊布膜と比較して膜の孔径がシャープであるため、粒子の捕捉性能に優れ、逆浸透膜に流入する水質が十分に改善されるばかりでなく、容易に破損することがないので長期間にわたって交換することなく使用でき、メンテナンスコストも低減できるようになる。 According to the above-described configuration, the water to be treated from which the insoluble component has been removed by the ceramic membrane is increased in pressure by the pressure pump disposed along the first path and supplied to the reverse osmosis membrane device. The soluble component is removed. When the captured fine particles are clogged in the pores of the ceramic membrane and the pressure loss of the ceramic membrane increases, the water to be treated obtained by the reverse osmosis membrane device is disposed along the second path. The pressure is increased and the backwash water is supplied to the pretreatment device, so that the ceramic film is removed. That is, a pressure increasing pump for supplying the water to be treated to the reverse osmosis membrane device and a pressure increasing pump for supplying the water to be treated treated by the reverse osmosis membrane device to the ceramic membrane as reverse cleaning water. The pressure pump is also used, and the increase in equipment cost can be suppressed. Furthermore, the ceramic membrane used as the pretreatment device has a sharper pore size compared to the non-woven fabric membrane, so it has excellent particle capture performance, and not only the water quality flowing into the reverse osmosis membrane is sufficiently improved. Since it is not easily damaged, it can be used without replacement for a long period of time, and the maintenance cost can be reduced.
　同第二の特徴構成は、同請求項２に記載した通り、上述の第一の特徴構成に加えて、前記前処理装置の圧損に基づいて浄水システムの動作モードをろ過運転モードと逆洗浄モードの何れかに切り替える動作モード切替部を備え、前記動作モード切替部は、前記逆洗浄モードから前記ろ過運転モードに切り替える場合に、前記第１経路に沿って被処理水を前記加圧ポンプに供給し、前記ろ過運転モードから前記逆洗浄モードに切り替える場合に、前記第２経路に沿って被処理水を前記加圧ポンプに供給するように、被処理水の供給経路を切り替えるように構成されている点にある。 As described in claim 2, the second characteristic configuration is the same as the first characteristic configuration described above, and the operation mode of the water purification system is changed to the filtration operation mode and the reverse cleaning mode based on the pressure loss of the pretreatment device. The operation mode switching unit supplies the water to be treated to the pressure pump along the first path when switching from the back washing mode to the filtration operation mode. And when switching from the said filtration operation mode to the said back washing | cleaning mode, it is comprised so that the supply path | route of to-be-processed water may be switched so that to-be-processed water may be supplied to the said pressurization pump along the said 2nd path | route. There is in point.
　動作モード切替部は、浄水システムがろ過運転モードで動作している場合に、前処理装置の圧損が大きくなると、動作モードを洗浄モードに切り替えて、第２経路に沿って被処理水を加圧ポンプに供給するように被処理水の供給経路を切り替え、洗浄モードに切り替え後に前処理装置の洗浄が終了すると、動作モードをろ過運転モードに切り替えて、第１経路に沿って被処理水を加圧ポンプに供給するように被処理水の供給経路を切り替える。従って、流路を切り替えることで単一の加圧ポンプをろ過用と逆洗用に合理的に兼用できるようになる。 When the water purification system is operating in the filtration operation mode, the operation mode switching unit switches the operation mode to the cleaning mode and pressurizes the water to be treated along the second path when the pressure loss of the pretreatment device increases. When the pretreatment device cleaning is completed after switching to the cleaning mode so that the water to be treated is supplied to the pump, the operation mode is switched to the filtration operation mode and the water to be treated is added along the first path. The supply path of the water to be treated is switched so as to be supplied to the pressure pump. Therefore, by switching the flow path, a single pressurizing pump can be rationally used for both filtration and backwashing.
　同第三の特徴構成は、同請求項３に記載した通り、上述の第二の特徴構成に加えて、空気圧縮機と、前記空気圧縮機で圧縮された空気を前記前処理装置に逆洗浄空気として供給する第３経路とを、さらに備え、前記動作モード切替部は、前記ろ過運転モードに切り替える場合に、前記第２経路に沿って被処理水を前記前処理装置に供給する液体洗浄モードと、前記第３経路に沿って圧縮空気を前記前処理装置に供給する気体洗浄モードとを、繰り返すように構成されている点にある。 In the third feature configuration, as described in claim 3, in addition to the second feature configuration described above, an air compressor and the air compressed by the air compressor are back-washed into the pretreatment device. A liquid cleaning mode for further supplying water to be treated along the second path to the pretreatment apparatus when the operation mode switching unit switches to the filtration operation mode. And a gas cleaning mode in which compressed air is supplied to the pretreatment device along the third path.
　液体洗浄モードと気体洗浄モードが繰り返されることにより、セラミック膜の表面だけでなく細孔の内部に洗浄水及び圧縮空気が繰り返し通流するようになる。細孔内部に蓄積された汚れの成分である分子やコロイド粒子は、供給された洗浄水に溶解、浮遊して一部が細孔表面から排出され、細孔内部に残った一部はその後に供給された圧縮空気により形成される気液界面の移動に連れて細孔から洗浄水と共に排出される。気液界面での表面張力により洗浄水に溶解または浮遊した分子やコロイド粒子が効率的に除去されるようになる。 洗浄 By repeating the liquid cleaning mode and the gas cleaning mode, the cleaning water and the compressed air repeatedly flow not only on the surface of the ceramic membrane but also inside the pores. Molecules and colloidal particles that are accumulated in the pores are dissolved in the supplied washing water, floated and partially discharged from the surface of the pores. As the gas-liquid interface formed by the supplied compressed air moves, it is discharged together with the washing water from the pores. Molecules and colloidal particles dissolved or suspended in the cleaning water are efficiently removed by the surface tension at the gas-liquid interface.
　また、セラミック膜の細孔に集まった分子や微粒子は互いに会合し易く、会合して細孔の入口径より大きな粒子に成長すると、洗浄水では容易に排出できなくなる。しかし、圧縮空気を通流させることにより、一時的に成長した粒子から水が奪われて、水中に存在していた場合と比べて粒子径が小さくなる。そのため圧縮空気の次に通流する洗浄水によって径が小さくなった粒子が膜の内部から容易に排出されるようになる。 Also, the molecules and fine particles gathered in the pores of the ceramic membrane are likely to associate with each other, and if they associate and grow to particles larger than the inlet diameter of the pores, they cannot be easily discharged with washing water. However, by allowing compressed air to flow, water is taken away from the temporarily grown particles, and the particle size is reduced compared to the case where the particles existed in water. For this reason, the particles whose diameter is reduced by the washing water flowing next to the compressed air are easily discharged from the inside of the membrane.
　同第四の特徴構成は、同請求項４に記載した通り、上述の第二または第三の特徴構成に加えて、原水のろ過方向に洗浄薬液を供給する薬液供給経路をさらに備え、前記動作モード切替部は、前記ろ過運転モードから前記逆洗浄モードに切り替える前に、前記薬液供給経路から前記前処理装置に薬液を供給する薬液洗浄モードに切り替えるように構成されている点にある。 In addition to the second or third feature configuration described above, the fourth feature configuration further includes a chemical solution supply path for supplying a cleaning chemical solution in the raw water filtration direction, as described in claim 4, The mode switching unit is configured to switch to the chemical cleaning mode for supplying the chemical liquid from the chemical liquid supply path to the pretreatment device before switching from the filtration operation mode to the reverse cleaning mode.
　薬液洗浄モードで薬液洗浄が行なわれることによって、汚れで詰まったセラミック膜が効果的に浄化されるようになるが、活性化成分である水酸基等のラジカル等が細孔内部の表面に付着するため、ろ過運転モードに切り替わった後に汚れが付着し易くなり、短期間で圧損の上昇を招く虞がある。しかし、薬液洗浄モードの後に繰り返される液体洗浄工程及び気体洗浄工程によって細孔内部からラジカルが効果的に除去されるので、薬液洗浄後も長期にわたり汚れの付着による圧損の増大を抑制することができるようになる。 By performing chemical cleaning in the chemical cleaning mode, the ceramic membrane clogged with dirt can be effectively purified, but radicals such as hydroxyl groups that are activating components adhere to the surface inside the pores. After switching to the filtration operation mode, dirt is likely to adhere, and there is a risk of increasing pressure loss in a short period of time. However, since the radicals are effectively removed from the inside of the pores by the liquid cleaning process and the gas cleaning process repeated after the chemical liquid cleaning mode, it is possible to suppress an increase in pressure loss due to adhesion of dirt over a long period of time even after the chemical liquid cleaning. It becomes like this.
　以上説明した通り、本発明によれば、逆浸透膜装置の処理負荷を低減するとともに、メンテナンスコストを低減可能な浄水システムを提供することができるようになった。 As described above, according to the present invention, it is possible to provide a water purification system capable of reducing the processing load of the reverse osmosis membrane device and reducing the maintenance cost.
図１は、浄水システムの説明図である。FIG. 1 is an explanatory diagram of a water purification system. 図２（ａ）は、ろ過運転モードの前処理装置の説明図、図２（ｂ）は、薬液洗浄モードの前処理装置の説明図、図２（ｃ）は、洗浄水による液体洗浄モードの説明図、図２（ｄ）は洗浄空気による気体洗浄モードの説明図である。2A is an explanatory diagram of the pretreatment device in the filtration operation mode, FIG. 2B is an explanatory diagram of the pretreatment device in the chemical solution cleaning mode, and FIG. 2C is a liquid cleaning mode using washing water. FIG. 2D is an explanatory diagram of a gas cleaning mode using cleaning air. 図３（ａ）は、前処理装置に用いられるろ過モジュールの平面図、図３（ｂ）は、同正面図である。Fig.3 (a) is a top view of the filtration module used for a pre-processing apparatus, FIG.3 (b) is the same front view. 図４（ａ）は、ろ過モジュールに用いられるろ過エレメントの平面図、図４（ｂ）及び図４（ｃ）は、ろ過エレメントの斜視図、図４（ｄ）は、ろ過エレメントの支持部の斜視図である。4 (a) is a plan view of a filtration element used in the filtration module, FIGS. 4 (b) and 4 (c) are perspective views of the filtration element, and FIG. 4 (d) is a support part of the filtration element. It is a perspective view. 図５（ａ）は、別実施形態を示すろ過エレメントの斜視図、図５（ｂ）は、同平面図、図５（ｃ）は、同正面図、図５（ｄ）は、ろ過モジュールの平面図である。FIG. 5 (a) is a perspective view of a filtration element showing another embodiment, FIG. 5 (b) is the same plan view, FIG. 5 (c) is the same front view, and FIG. 5 (d) is the filtration module. It is a top view. 図６（ａ）は、別実施形態を示すろ過モジュールの平面図、図６（ｂ）は同正面図である。Fig.6 (a) is a top view of the filtration module which shows another embodiment, FIG.6 (b) is the same front view. 図７は、浄水システムのろ過運転モードのフロー図である。FIG. 7 is a flowchart of the filtration operation mode of the water purification system. 図８は、浄水システムの液体洗浄モードのフロー図である。FIG. 8 is a flowchart of the liquid cleaning mode of the water purification system. 図９は、浄水システムの気体洗浄モードのフロー図である。FIG. 9 is a flowchart of the gas cleaning mode of the water purification system. 図１０は、浄水システムの薬液洗浄モードのフロー図である。FIG. 10 is a flowchart of a chemical cleaning mode of the water purification system. 図１１は、液体洗浄モードと気体洗浄モードを繰り返す場合の洗浄効果の特性説明図である。FIG. 11 is a characteristic explanatory diagram of the cleaning effect when the liquid cleaning mode and the gas cleaning mode are repeated.
　以下に本発明による浄水システムを説明する。
　図１には、純水製造装置として機能する浄水システム３００が示されている。図中、符号ＰＳｎ（ｎは自然数）は圧力計、符号ＬＰＳｎ（ｎは自然数）は低圧センサ、符号ＷＳＬは水位計、符号Ｖｎ（ｎは自然数）は仕切弁、符号ＳＶｎ（ｎは自然数）は電動弁、符号Ｐｎ（ｎは自然数）はポンプ、符号ＴはＲＯ水タンク、符号ＭＴは薬液タンク、符号ＣＭＰは空気圧縮機を示している。 The water purification system according to the present invention will be described below.
FIG. 1 shows a water purification system 300 that functions as a pure water production apparatus. In the figure, symbol PSn (n is a natural number) is a pressure gauge, symbol LPSn (n is a natural number) is a low pressure sensor, symbol WSL is a water level meter, symbol Vn (n is a natural number) is a gate valve, and symbol SVn (n is a natural number) is The motorized valve, the symbol Pn (n is a natural number) is a pump, the symbol T is an RO water tank, the symbol MT is a chemical solution tank, and the symbol CMP is an air compressor.
　圧力計等の各種のセンサ出力はシステムを制御する制御装置ＣＮＴに入力され、制御装置ＣＮＴに組み込まれた制御プログラムに基づいて、入力されたセンサ値に対応する所定の演算が行なわれ、演算結果に基づいて電動弁ＳＶｎやポンプＰｎが駆動制御される。加圧ポンプＰ１による処理水の加圧力を可変に調整可能なようにインバータ回路が設けられ、制御装置ＣＮＴによってインバータ回路のスイッチング周波数が可変に調整される。 Various sensor outputs such as a pressure gauge are input to a control device CNT that controls the system, and based on a control program incorporated in the control device CNT, a predetermined calculation corresponding to the input sensor value is performed. The electric valve SVn and the pump Pn are driven and controlled based on the above. An inverter circuit is provided so that the pressure of the treated water by the pressurizing pump P1 can be variably adjusted, and the switching frequency of the inverter circuit is variably adjusted by the control device CNT.
　制御装置ＣＮＴは、例えばマイクロコンピュータと制御プログラムが格納されたメモリと、各種の入出力インタフェース回路を備えて構成されている。 The control device CNT includes, for example, a microcomputer, a memory storing a control program, and various input / output interface circuits.
　浄水システム３００は、原水となる地下水や湖水を浄化して純水を生成するシステムであり、原水に含まれる不溶解性成分を除去する前処理装置ＦＬ２と、前処理装置ＦＬ２で不溶解性成分が除去された被処理水を加圧する加圧ポンプＰ１と、加圧ポンプＰ１で加圧された被処理水から溶解性成分を除去した被処理水を得る逆浸透膜装置ＦＬＲ等を備えている。 The water purification system 300 is a system that purifies groundwater or lake water as raw water to produce pure water, and includes a pretreatment device FL2 that removes insoluble components contained in the raw water, and an insoluble component in the pretreatment device FL2. A pressure pump P1 that pressurizes the water to be treated from which water has been removed, and a reverse osmosis membrane device FLR that obtains water to be treated from which the soluble components have been removed from the water to be treated that has been pressurized by the pressure pump P1. .
　各種の弁、ポンプ、前処理装置ＦＬ２、逆浸透膜装置ＦＬＲ等は、バーフレームで仕切られる直方体形状のユニット内に配管を介して接続されている。 Various valves, pumps, pretreatment device FL2, reverse osmosis membrane device FLR and the like are connected to each other in a rectangular parallelepiped unit partitioned by a bar frame via a pipe.
　前処理装置ＦＬ２としてセラミック膜が収容されたろ過コンポーネント１００が用いられている。尚、前処理装置ＦＬ２の前段に砂や塵等の不純物を沈殿除去する繊維フィルタを備えていてもよい。 A filtration component 100 containing a ceramic membrane is used as the pretreatment device FL2. A fiber filter that precipitates and removes impurities such as sand and dust may be provided in the previous stage of the pretreatment device FL2.
　逆浸透膜装置ＦＬＲは、溶質を含む希薄溶液と濃厚溶液とを、溶媒のみを透過させ溶質を透過させない半透膜で仕切り、濃厚溶液側に浸透圧差以上の圧力を加えることにより、濃厚溶液側から希薄溶液側へ溶媒を透過させる装置である。 The reverse osmosis membrane device FLR separates a dilute solution containing a solute and a concentrated solution with a semipermeable membrane that allows only the solvent to pass through and does not allow the solute to pass, and applies a pressure greater than the osmotic pressure difference to the concentrated solution side. Is a device that allows the solvent to permeate from the solution side to the dilute solution side.
　前処理装置ＦＬ２を通過した被処理水が、加圧ポンプＰ１によって所定圧力に加圧された後に逆浸透膜装置ＦＬＲに供給され、逆浸透膜装置ＦＬＲで溶解性成分が除去された浄水はＲＯ水タンクＴに貯留される。ＲＯ水タンクＴに貯留された浄水はポンプＰ２から需要先に送水される。 The treated water that has passed through the pretreatment device FL2 is pressurized to a predetermined pressure by the pressure pump P1 and then supplied to the reverse osmosis membrane device FLR. The purified water from which the soluble components have been removed by the reverse osmosis membrane device FLR is RO It is stored in the water tank T. The purified water stored in the RO water tank T is sent from the pump P2 to the customer.
　原水は図外のポンプにより例えば約０．２ＭＰａ以上の圧力、約３０Ｌ／ｍｉｎ．以上の流量で仕切弁Ｖ１を経由してシステムに入水される。 Raw water is pumped by a pump (not shown), for example, at a pressure of about 0.2 MPa or more, about 30 L / min. Water enters the system through the gate valve V1 at the above flow rate.
　低圧センサＬＰＳ１で前処理装置ＦＬ２の目詰まりが監視され、所定の圧損値になると逆洗浄され、逆洗浄で圧損値が回復しない場合には薬液洗浄される。 The clogging of the pretreatment device FL2 is monitored by the low pressure sensor LPS1, and when the pressure loss value reaches a predetermined pressure loss value, it is backwashed, and when the pressure loss value does not recover by reverse washing, the chemical solution is washed.
　圧力計ＰＳ５で押込み圧力が計測され、加圧ポンプＰ１により所定の押込み圧力に増圧されて被処理水が逆浸透膜装置ＦＬＲへ圧送される。 The indentation pressure is measured by the pressure gauge PS5, the pressure is increased to a predetermined indentation pressure by the pressurizing pump P1, and the water to be treated is pumped to the reverse osmosis membrane device FLR.
　制御装置ＣＮＴは、浄水を生成する場合にはろ過運転モードでシステムが作動するように、電動弁ＳＶ２，ＳＶ３，ＳＶ６，ＳＶ９を開閉制御して、前処理装置ＦＬ２を経由して原水を逆浸透膜装置ＦＬＲに供給する。 The control device CNT controls the opening and closing of the motorized valves SV2, SV3, SV6, SV9 so that the system operates in the filtration operation mode when generating purified water, and reverse osmosis the raw water via the pretreatment device FL2. Supply to membrane device FLR.
　制御装置ＣＮＴは、前処理装置ＦＬ２を洗浄する場合には洗浄運転モードでシステムが作動するように、電動弁ＳＶ２を開放制御するとともに電動弁ＳＶ３，ＳＶ６，ＳＶ９を閉塞制御し、さらに電動弁ＳＶ４の開度を調整することで、ＲＯ水タンクＴに貯留された浄水を、加圧ポンプＰ１を経由して前処理装置ＦＬ２に供給する。 When cleaning the pretreatment device FL2, the control device CNT controls the opening of the motor-operated valve SV2 and closes the motor-operated valves SV3, SV6, SV9 so that the system operates in the cleaning operation mode, and further controls the motor-operated valve SV4. The purified water stored in the RO water tank T is supplied to the pretreatment device FL2 via the pressure pump P1.
　図２（ａ）に示すように、前処理装置ＦＬ２となるろ過コンポーネント１００は、ケーシング１０１と、ケーシング１０１に収容されたろ過モジュール１０で構成されている。ケーシング１０１の下端側に原水供給部１０２、上端側に原水排出部１０３、ケーシング１０１の側壁上方にろ過水流出部１０４、側壁下方に洗浄水供給部１０５が形成され、ろ過モジュール１０の上下の各支持部がシールリング１０６を介してケーシング１０１内に固定されている。図２（ａ）で示す前処理装置ＦＬ２の原水供給部１０２、原水排出部１０３、ろ過水流出部１０４、洗浄水供給部１０５の相対位置が、図１に示す前処理装置ＦＬ２と対応している。 As shown in FIG. 2 (a), the filtration component 100, which is the pretreatment apparatus FL2, is composed of a casing 101 and a filtration module 10 accommodated in the casing 101. A raw water supply unit 102 is formed at the lower end side of the casing 101, a raw water discharge unit 103 is formed at the upper end side, a filtrate outflow unit 104 is formed above the side wall of the casing 101, and a wash water supply unit 105 is formed below the side wall. A support portion is fixed in the casing 101 via a seal ring 106. The relative positions of the raw water supply unit 102, the raw water discharge unit 103, the filtered water outflow unit 104, and the washing water supply unit 105 of the pretreatment device FL2 shown in FIG. 2A correspond to the pretreatment device FL2 shown in FIG. Yes.
　図３（ａ），（ｂ）にはろ過モジュール１０が例示されている。ろ過モジュール１０は、円盤状の上下一対の支持部１１，１２と、支持部１１，１２で両端部が固定支持されたブロック状の６個のろ過エレメント１Ａ～１Ｆで構成され、ブロック状のろ過エレメント１Ａ～１Ｆは、それぞれ６本のろ過エレメント１が並設されて、横断面が略正三角形になるように構成されている。 FIGS. 3A and 3B illustrate the filtration module 10. The filtration module 10 is composed of a pair of upper and lower support parts 11 and 12 in the form of a disk, and six block-like filtration elements 1A to 1F fixed at both ends by the support parts 11 and 12. Each of the elements 1A to 1F is configured such that six filtration elements 1 are juxtaposed and the cross section becomes a substantially equilateral triangle.
　図４（ａ），（ｂ）に示すように、ろ過エレメント１Ａ～１Ｆ（図３（ａ）参照）は、一対の対向面１ａ，１ｂの間に流体通流孔２が貫通形成され、一対の対向面１ａ，１ｂの間に挟まれた周面１ｃと流体通流孔２の内面２ａとの間で被処理流体が分離または濃縮される多孔質体で構成されている。 As shown in FIGS. 4 (a) and 4 (b), the filtration elements 1A to 1F (see FIG. 3 (a)) are formed with a fluid flow hole 2 penetrating between a pair of opposed surfaces 1a and 1b. The fluid to be treated is separated or concentrated between the peripheral surface 1c sandwiched between the opposing surfaces 1a and 1b and the inner surface 2a of the fluid flow hole 2.
　多孔質体の周面１ｃの間に間隙Ｇが形成されるように、樹脂またはセラミックスで構成されるスペーサ部材３を介して複数の多孔質体が隣接配置されている。当該多孔質体は、例えば押出成形され、焼成によって多孔質体となるセラミックスで構成され、スペーサ部材３は流体通流孔２に沿う長手方向の少なくとも両端部側に設けられている。長尺の場合には、中間部にも適宜スペーサ部材３を設けてもよい。 A plurality of porous bodies are arranged adjacent to each other via a spacer member 3 made of resin or ceramics so that a gap G is formed between the peripheral surfaces 1c of the porous bodies. The porous body is made of, for example, ceramics that are formed by extrusion and becomes a porous body by firing, and the spacer members 3 are provided at least at both ends in the longitudinal direction along the fluid flow hole 2. In the case of a long length, the spacer member 3 may be appropriately provided also in the intermediate portion.
　原水が流体通流孔２に流入すると、流体通流孔２の内面２ａと周面１ｃとの間に存在する細孔で原水がろ過されて、周面から外部に滲出する。多孔質体の細孔径分布を予め調整しておけば、原水をろ過してろ過水を周面から滲出させたり、水分を周面から滲出させて原水を濃縮したりすることができる。つまり、当該ろ過エレメント１が、周部にろ過用の細孔が形成された対称構造の管状ろ過膜として機能する。 When the raw water flows into the fluid flow hole 2, the raw water is filtered through pores existing between the inner surface 2 a and the peripheral surface 1 c of the fluid flow hole 2 and oozes out from the peripheral surface to the outside. If the pore size distribution of the porous body is adjusted in advance, the raw water can be filtered and the filtered water can be leached from the peripheral surface, or the raw water can be leached from the peripheral surface and the raw water can be concentrated. That is, the said filtration element 1 functions as a tubular filtration membrane of the symmetrical structure by which the pore for filtration was formed in the surrounding part.
　各ろ過エレメント１は、ムライト（3Al2O3・2SiO2）系セラミックスに水と有機バインダ等を添加して得られる流動状のセラミックスを、押出成形機を用いて押出成形することにより長尺部材を得、乾燥工程を経た後に長尺部材の両端部側にスペーサ部材３となる接合材を所定量塗布した状態で焼成することによって得られる。セラミック材料として、これ以外にアルミナ（Al2O3）やコージュライト等、多孔質体が形成可能なセラミックスを用いることができる。接合材も同様のセラミックスにバインダを混入することにより得られる。 Each filter element 1, mullite (3Al 2 O 3 · 2SiO 2 ) type ceramics in a fluidized ceramic obtained by adding water and an organic binder or the like, the elongated member by extruding using an extruder And after the drying process, it is obtained by baking in a state where a predetermined amount of the bonding material to be the spacer member 3 is applied to both end portions of the long member. As the ceramic material, other alumina (Al 2 O 3) or cordierite, etc., can be porous body used capable of forming ceramics. The bonding material can also be obtained by mixing a binder with similar ceramics.
　本実施形態では、多孔質体の内径が３ｍｍ、外径が５ｍｍ、長さが２５０～５００ｍｍに形成され、細孔径は０．０５μｍ～１．８μｍの範囲に設定されている。多孔質体の長さは必要な膜面積に基づいて適宜設定可能で、１００～１０００ｍｍの範囲に設定されていればよく、２５０～５００ｍｍの範囲に設定されていればより好ましい。多孔質体の細孔径はろ過または濃縮対象によって適宜設定可能で、０．０５μｍ～５．０μｍの範囲に設定されていればよく、０．１μｍ～２．０μｍの範囲であれば好ましく、０．５μｍ～２．０μｍの範囲であればさらに好ましい。多孔質体の内径は１～５ｍｍ、外径は２～１０ｍｍの範囲に設定され、スペーサ部材３によって形成される間隙は０．５～２．０ｍｍの範囲に設定されることが好ましい。 In this embodiment, the porous body is formed so that the inner diameter is 3 mm, the outer diameter is 5 mm, the length is 250 to 500 mm, and the pore diameter is set in the range of 0.05 μm to 1.8 μm. The length of the porous body can be appropriately set based on the required membrane area, and may be set in the range of 100 to 1000 mm, and more preferably in the range of 250 to 500 mm. The pore diameter of the porous body can be appropriately set depending on the object of filtration or concentration, and may be set in the range of 0.05 μm to 5.0 μm, preferably in the range of 0.1 μm to 2.0 μm. A range of 5 μm to 2.0 μm is more preferable. The porous body preferably has an inner diameter of 1 to 5 mm and an outer diameter of 2 to 10 mm, and a gap formed by the spacer member 3 is preferably set to a range of 0.5 to 2.0 mm.
　図４（ｄ）に示すように、支持部１１，１２は、ブロック状のろ過エレメント１Ａ～１Ｆの横断面と対応した形状で区画する隔壁が設けられ、図３（ａ）に示すように、ブロック状のろ過エレメント１Ａ～１Ｆの一頂点が中心を向く姿勢で両端部が各区画に挿入され、全体として横断面が正六角形に構成されている。 As shown in FIG. 4 (d), the support portions 11 and 12 are provided with partition walls that are partitioned into shapes corresponding to the cross-sections of the block-shaped filtration elements 1A to 1F, and as shown in FIG. 3 (a), Both ends are inserted into the respective sections in such a posture that one vertex of the block-shaped filtration elements 1A to 1F faces the center, and the cross section is formed into a regular hexagon as a whole.
　製造ばらつき等を考慮して、ブロック状のろ過エレメント１Ａ～１Ｆの横断面よりも支持部１１，１２の区画がやや大きなサイズで構成されている。そこで、図４（ｃ）に示すように、支持部１１，１２の区画とのろ過エレメント１Ａ～１Ｆの周面との間に均等に間隙が形成されるように、ブロック状のろ過エレメント１Ａ～１Ｆの両端部側には、例えばプラスチックパラフィンフィルムのようなテープ４が巻回されている。ろ過エレメント１Ａ～１Ｆの端部を支持部１１，１２の区画に挿入した状態でテープ４の厚みによって形成される空間及び各ろ過エレメント１同士の間隙に端部シール用の樹脂５、例えばエポキシ樹脂やシリコーン樹脂が充填されている。 In consideration of manufacturing variations and the like, the sections of the support portions 11 and 12 are configured to be slightly larger than the cross section of the block-shaped filtration elements 1A to 1F. Therefore, as shown in FIG. 4 (c), the block-shaped filtration elements 1A to 1F are formed so that gaps are evenly formed between the sections of the support portions 11 and 12 and the peripheral surfaces of the filtration elements 1A to 1F. A tape 4 such as a plastic paraffin film is wound around both ends of 1F. Resin 5 for end sealing, for example, epoxy resin, in the space formed by the thickness of the tape 4 with the end portions of the filtration elements 1A to 1F inserted into the sections of the support portions 11 and 12 and the gaps between the filtration elements 1 Or filled with silicone resin.
　図５（ａ），（ｂ）には、ろ過エレメント１の他の例が示されている。当該ろ過エレメント１は、流体通流孔２の各内面２ａの一部領域、ここでは内周面２ａのうち流体通流孔２の長手方向に沿う帯状の領域が周面１ｃと対向するように、流体通流孔２が一対の対向面１ａ，１ｂの間に複数、具体的には６本形成されている。 FIGS. 5A and 5B show another example of the filtration element 1. FIG. The filtration element 1 is configured so that a partial region of each inner surface 2a of the fluid flow hole 2, that is, a band-shaped region along the longitudinal direction of the fluid flow hole 2 of the inner peripheral surface 2a is opposed to the peripheral surface 1c. A plurality of, specifically six, fluid flow holes 2 are formed between the pair of opposed surfaces 1a and 1b.
　複数の流体通流孔２の各内面２ａのうち、多孔質体の周面１ｃと対向する帯状の領域からその周面１ｃに向けて一様に原水がろ過または濃縮処理されるので、全体として非常に高い処理効率が得られ、十分な強度も確保できる。 Of the inner surfaces 2a of the plurality of fluid flow holes 2, the raw water is uniformly filtered or concentrated from the band-like region facing the peripheral surface 1c of the porous body toward the peripheral surface 1c. Very high processing efficiency can be obtained and sufficient strength can be secured.
　図５（ａ）では、横断面が略三角形のろ過エレメント１の周面１ｃの一面で対向配置され、スペーサ部材３を介して接合された様子が示されている。図５（ｂ）には、このような接合部が隣接するように、６本のろ過エレメント１の一頂部が中心軸周りに位置するように並設され、互いの対向面がスペーサ部材３を介して接合された状態が示されている。 FIG. 5 (a) shows a state in which the cross section is disposed oppositely on one surface of the circumferential surface 1c of the substantially triangular filtration element 1 and joined via the spacer member 3. In FIG.5 (b), it arrange | positions so that the top part of six filtration elements 1 may be located in the surroundings of a central axis so that such a junction part may adjoin, and a mutually opposing surface makes the spacer member 3 correspond. The state of being joined via is shown.
　図５（ｃ）に示すように、両端部側にテープ４が巻回された後に、図５（ｄ）に示すように、各ろ過エレメント１の端部が支持部１１，１２の区画に挿入され、テープ４の厚みによって形成される空間及び各ろ過エレメント１同士の間隙に端部シール用の樹脂５、上述と同様例えばエポキシ樹脂やシリコーン樹脂が充填される。
　図６（ａ），（ｂ）には、このようにして構成されたろ過モジュール１０が示されている。 As shown in FIG. 5 (c), after the tape 4 is wound around both ends, the ends of the filtration elements 1 are inserted into the sections of the support portions 11 and 12, as shown in FIG. 5 (d). Then, the space formed by the thickness of the tape 4 and the gaps between the filtration elements 1 are filled with the end seal resin 5 and, for example, an epoxy resin or a silicone resin as described above.
FIGS. 6A and 6B show the filtration module 10 configured as described above.
　図２（ａ）に戻り、原水排出部１０３及び洗浄水供給部１０５を閉塞した状態で、原水供給部１０２から原水を加圧供給すると、ろ過モジュール１０でろ過された処理水がろ過水流出部１０４から流出するデッドエンド型のろ過処理ユニットとなる。また、原水排出部１０３を閉塞することなく原水供給部１０２に循環供給するとクロスフロー型のろ過処理ユニットとなる。 Returning to FIG. 2A, when raw water is pressurized and supplied from the raw water supply unit 102 with the raw water discharge unit 103 and the washing water supply unit 105 closed, the treated water filtered by the filtration module 10 is filtered out. This is a dead-end filtration unit that flows out from 104. Further, when the raw water discharge unit 103 is circulated and supplied to the raw water supply unit 102 without being blocked, a cross-flow type filtration processing unit is obtained.
　図２（ｂ）に示すように、ろ過水流出部１０４を閉塞した状態で、原水排出部１０３から洗浄用の薬液を圧入して原水供給部１０２及び洗浄水供給部１０５から薬液を排出することで、ろ過方向と同方向への流れに沿った薬液洗浄が行なわれる。 As shown in FIG. 2 (b), with the filtered water outflow portion 104 blocked, a cleaning chemical solution is press-fitted from the raw water discharge portion 103 to discharge the chemical solution from the raw water supply portion 102 and the cleaning water supply portion 105. Thus, chemical cleaning is performed along the flow in the same direction as the filtration direction.
　図２（ｃ）に示すように、原水供給部１０２及びろ過水流出部１０４を閉塞した状態で、洗浄水供給部１０５から洗浄水を圧入して原水排出部１０３から洗浄水を排水することにより、ろ過方向と逆方向への流れに沿った逆洗浄が行なわれる。 As shown in FIG. 2 (c), with the raw water supply unit 102 and the filtered water outflow unit 104 closed, the cleaning water is injected from the cleaning water supply unit 105 and drained from the raw water discharge unit 103. The reverse cleaning is performed along the flow in the direction opposite to the filtration direction.
　図２（ｄ）に示すように、原水供給部１０２を閉塞した状態で、洗浄水供給部１０５から洗浄用の圧縮空気を供給して原水排出部１０３及びろ過水流出部１０４から排気することにより、気体洗浄が行なわれる。 As shown in FIG. 2 (d), with the raw water supply unit 102 closed, the compressed water for cleaning is supplied from the cleaning water supply unit 105 and exhausted from the raw water discharge unit 103 and the filtered water outflow unit 104. Gas cleaning is performed.
　図７には、ろ過運転モード中の原水及び被処理水の流れが二重矢示線で示されている。ろ過運転モードでは制御装置ＣＮＴによって主に電動弁ＳＶ６，ＳＶ９の開度がそれぞれ調整されるとともに電動弁ＳＶ２，ＳＶ３が閉塞される。その結果、前処理装置ＦＬ２ではデッドエンドろ過が行なわれる。 FIG. 7 shows the flow of raw water and treated water during the filtration operation mode with double arrows. In the filtration operation mode, the opening degree of the electric valves SV6 and SV9 is mainly adjusted by the control device CNT, and the electric valves SV2 and SV3 are closed. As a result, dead-end filtration is performed in the pretreatment device FL2.
　原水は前処理装置ＦＬ２を経由して加圧ポンプＰ１で逆浸透膜の逆浸透圧以上に増圧されて逆浸透膜装置ＦＬＲに供給され、被処理水から溶解性成分が除去された浄水がＲＯ水タンクＴに貯留される。前処理装置ＦＬ２で不溶解性成分が除去された被処理水を加圧ポンプＰ１を介して逆浸透膜装置ＦＬＲに供給する経路が第１経路となる。 The raw water is supplied to the reverse osmosis membrane device FLR via the pretreatment device FL2 by the pressurization pump P1 to a pressure higher than the reverse osmosis pressure of the reverse osmosis membrane, and the purified water from which soluble components are removed from the treated water. It is stored in the RO water tank T. A path for supplying the water to be treated from which insoluble components have been removed by the pretreatment apparatus FL2 to the reverse osmosis membrane apparatus FLR via the pressure pump P1 is a first path.
　図８には、液体洗浄モードと気体洗浄モードの２モードで構成される逆洗状モードのうち液体洗浄モード中の洗浄水の流れが二重矢示線で示されている。液体洗浄モードでは制御装置ＣＮＴによって主に電動弁ＳＶ４，ＳＶ７の開度がそれぞれ調整されるとともに電動弁ＳＶ１，ＳＶ６が閉塞される。 FIG. 8 shows the flow of cleaning water in the liquid cleaning mode among the backwashing mode composed of two modes of the liquid cleaning mode and the gas cleaning mode by a double arrow line. In the liquid cleaning mode, the opening degree of the motorized valves SV4 and SV7 is mainly adjusted by the control device CNT, and the motorized valves SV1 and SV6 are closed.
　その結果、ＲＯ水タンクＴに貯留された浄水が洗浄水として電動弁ＳＶ７を経由して加圧ポンプＰ１で増圧され、さらに電動弁ＳＶ４を経由して前処理装置ＦＬ２に圧入される。そして、洗浄排水が電動弁ＳＶ２を経由して排水される。逆浸透膜装置ＦＬＲで得られた被処理水を加圧ポンプＰ２を介して前処理装置ＦＬ２に逆洗浄水として供給する経路が第２経路となる。 As a result, the purified water stored in the RO water tank T is increased by the pressurizing pump P1 via the electric valve SV7 as washing water, and further press-fitted into the pretreatment device FL2 via the electric valve SV4. Then, the cleaning waste water is drained through the electric valve SV2. A path for supplying the water to be treated obtained by the reverse osmosis membrane apparatus FLR to the pretreatment apparatus FL2 as the backwash water via the pressure pump P2 is the second path.
　図９には、逆洗状モードのうち気体洗浄モード中の洗浄水の流れが二重矢示線で示されている。気体洗浄モードでは制御装置ＣＮＴによって主に電動弁ＳＶ２，ＳＶ５の開度がそれぞれ調整されるとともに電動弁ＳＶ１，ＳＶ６が閉塞される。 FIG. 9 shows the flow of cleaning water during the gas cleaning mode in the backwash mode by a double arrow line. In the gas cleaning mode, the control devices CNT mainly adjust the opening degrees of the motor operated valves SV2 and SV5, respectively, and close the motor operated valves SV1 and SV6.
　その結果、空気圧縮機ＣＭＰからの圧縮空気が洗浄ガスとして電磁弁ＳＶ５を経由して前処理装置ＦＬ２に圧入される。圧縮空気はろ過方向と逆方向に流れ、仕切弁Ｖ３、電磁弁ＳＶ３を介して排気される。この時圧縮空気に同伴する水分が電磁弁ＳＶ３を介して排水される。空気圧縮機ＣＭＰで圧縮された空気を前処理装置ＦＬ２に逆洗浄空気として供給する経路が第３経路となる。 As a result, the compressed air from the air compressor CMP is press-fitted into the pretreatment device FL2 through the electromagnetic valve SV5 as a cleaning gas. The compressed air flows in the direction opposite to the filtration direction and is exhausted through the gate valve V3 and the electromagnetic valve SV3. At this time, water accompanying the compressed air is drained through the electromagnetic valve SV3. A path for supplying air compressed by the air compressor CMP to the pretreatment apparatus FL2 as backwash air is a third path.
　図１０には、薬液洗浄モード中の薬液の流れが二重矢示線で示されている。薬液洗浄モードでは制御装置ＣＮＴによって主に薬液ポンプＰ３、仕切弁Ｖ２，Ｖ３，Ｖ４それぞれ開放されるとともに電動弁ＳＶ１，ＳＶ２，ＳＶ４，ＳＶ６が閉塞される。 In FIG. 10, the flow of the chemical during the chemical cleaning mode is indicated by a double arrow line. In the chemical liquid washing mode, the chemical liquid pump P3 and the gate valves V2, V3, V4 are mainly opened by the control device CNT, and the electric valves SV1, SV2, SV4, SV6 are closed.
　その結果、薬液タンクＭＴ内の薬液が薬液ポンプＰ３によって前処理装置ＦＬ２に圧入される。前処理装置ＦＬ２に圧入された薬液は、仕切弁Ｖ２，Ｖ３及び薬液タンクＭＴの仕切り弁Ｖ７，Ｖ８を介して薬液タンクＭＴに回収される。仕切弁Ｖ３を経由して原水のろ過方向に洗浄薬液を供給する経路が薬液供給経路となる。 As a result, the chemical in the chemical tank MT is press-fitted into the pretreatment apparatus FL2 by the chemical pump P3. The chemical liquid press-fitted into the pretreatment apparatus FL2 is collected in the chemical liquid tank MT via the gate valves V2 and V3 and the gate valves V7 and V8 of the chemical liquid tank MT. A route for supplying the cleaning chemical solution in the raw water filtration direction via the gate valve V3 is a chemical solution supply route.
　ろ過運転モードで長期間ろ過運転すると、前処理装置ＦＬ２に組み込まれたろ過エレメント１（図２（ａ）参照）の細孔に汚れ成分が蓄積されてやがて閉塞を招く。そこで、ろ過コンポーネント１００の入口側及び出口側に配置した圧力計の値に基づいて圧損を検知し、圧損が所定の値になると、洗浄モードに移行する。 When the filtration operation mode is performed for a long period of time in the filtration operation mode, dirt components are accumulated in the pores of the filtration element 1 (see FIG. 2A) incorporated in the pretreatment device FL2, which eventually causes clogging. Therefore, the pressure loss is detected based on the values of the pressure gauges arranged on the inlet side and the outlet side of the filtration component 100, and when the pressure loss reaches a predetermined value, the mode is shifted to the cleaning mode.
　洗浄モードの実行後に圧損が低減すると、その後ろ過運転モードに戻ってろ過運転され、洗浄モードの実行後に圧損がそれほど低減しない場合には、薬液洗浄モードが実行される。 When the pressure loss is reduced after the cleaning mode is executed, the filtration operation mode is returned to the filtration operation mode, and when the pressure loss is not reduced so much after the cleaning mode is executed, the chemical solution cleaning mode is executed.
　洗浄モードでは、原液のろ過方向と逆方向に洗浄液を加圧供給してろ過膜を洗浄する液体洗浄モードと、原液のろ過方向と逆方向に洗浄ガスを加圧供給してろ過膜を洗浄する気体洗浄モードとが、繰り返して実行される。液体洗浄モードと気体洗浄モードとが所定周期で繰り返して実行されることが好ましいが、一定の周期で繰り返される必要はない。 In the cleaning mode, the cleaning liquid is pressurized and supplied in the direction opposite to the filtration direction of the stock solution to wash the filtration membrane, and the cleaning gas is pressurized and supplied in the direction opposite to the filtration direction of the stock solution to wash the filtration membrane. The gas cleaning mode is repeatedly executed. It is preferable that the liquid cleaning mode and the gas cleaning mode are repeatedly executed at a predetermined cycle, but it is not necessary to be repeated at a constant cycle.
　このような液体洗浄モードと気体洗浄モードが繰り返されることにより、ろ過膜の表面だけでなく細孔の内部に洗浄水及び洗浄ガスが繰り返し通流するようになる。細孔内部に蓄積された汚れの成分である分子やコロイド粒子は、供給された洗浄水に溶解、浮遊して一部が細孔表面から排出され、細孔内部に残った一部はその後に供給された洗浄ガスにより形成される気液界面の移動に連れて細孔から洗浄水と共に排出される。気液界面での表面張力により洗浄水に溶解または浮遊した分子やコロイド粒子が効率的に除去されるようになる。 繰 り 返 By repeating such a liquid cleaning mode and a gas cleaning mode, the cleaning water and the cleaning gas flow through not only the surface of the filtration membrane but also the pores. Molecules and colloidal particles that are accumulated in the pores are dissolved in the supplied washing water, floated and partially discharged from the surface of the pores. As the gas-liquid interface formed by the supplied cleaning gas moves, it is discharged together with the cleaning water from the pores. Molecules and colloidal particles dissolved or suspended in the cleaning water are efficiently removed by the surface tension at the gas-liquid interface.
　また、ろ過膜の細孔に集まった分子や微粒子は互いに会合し易く、会合して細孔の入口径より大きな粒子に成長すると、洗浄水では容易に排出できなくなる。しかし、洗浄空気を通流させることにより、一時的に成長した粒子から水が奪われて、水中に存在していた場合と比べて粒子径が小さくなる。そのため洗浄ガスの次に通流する洗浄水によって径が小さくなった粒子が膜の内部から容易に排出されるようになる。 Also, the molecules and fine particles gathered in the pores of the filtration membrane are likely to associate with each other, and if they associate and grow to particles larger than the inlet diameter of the pores, they cannot be easily discharged with washing water. However, by allowing the cleaning air to flow, water is taken away from the temporarily grown particles, and the particle diameter becomes smaller than that in the case where the particles existed in the water. For this reason, the particles whose diameter is reduced by the cleaning water flowing next to the cleaning gas are easily discharged from the inside of the membrane.
　薬液洗浄モードの後に上述した液体洗浄モード及び気体洗浄モードを繰り返すことが好ましい。薬液洗浄モードが実行されることによって、活性化成分である水酸基等のラジカル等が細孔内部の表面に付着する場合であっても、その後に繰り返される液体洗浄モード及び気体洗浄モードの各運転によって細孔内部からラジカルが効果的に除去されるので、薬液洗浄後も長期にわたり汚れの付着による圧損の増大を抑制することができるようになり、特段のリンス工程を実行することなく薬液を濯ぐことができるようになる。 It is preferable to repeat the above-described liquid cleaning mode and gas cleaning mode after the chemical cleaning mode. Even when radicals such as hydroxyl groups that are activating components adhere to the surface inside the pores by executing the chemical cleaning mode, the liquid cleaning mode and the gas cleaning mode are repeatedly performed thereafter. Since radicals are effectively removed from the inside of the pores, it is possible to suppress an increase in pressure loss due to adhesion of dirt over a long period of time even after chemical cleaning, and the chemical is rinsed without performing a special rinsing process. Will be able to.
　１回の液体洗浄モード及び気体洗浄モードの運転に要する時間は、ろ過膜のサイズ及び細孔径等に基づいて適宜設定すればよく、細孔径分布が１．０μｍ～２．０μｍの範囲に設定されている対称型のセラミックろ過膜であれば、それぞれ数十秒程度でよい。このとき、洗浄水及び洗浄空気の圧力は共に数ＭＰａ程度に設定しておけばよい。 The time required for one operation of the liquid cleaning mode and the gas cleaning mode may be set as appropriate based on the size of the filtration membrane and the pore diameter, and the pore size distribution is set in the range of 1.0 μm to 2.0 μm. In the case of the symmetric type ceramic filtration membranes, it may take several tens of seconds. At this time, both the pressure of the cleaning water and the cleaning air may be set to about several MPa.
　また、液体洗浄モード及び気体洗浄モードの繰返し時間は、３回から５回程度でよい。３回繰り返す場合には全体で数分の時間を要することになる。液体洗浄モードと気体洗浄モードの何れを先に実行してもよい。 Also, the repetition time of the liquid cleaning mode and the gas cleaning mode may be about 3 to 5 times. When it is repeated three times, it takes several minutes in total. Either the liquid cleaning mode or the gas cleaning mode may be executed first.
　つまり、制御装置ＣＮＴが、前処理装置ＦＬ２の圧損に基づいて浄水システムの動作モードをろ過運転モードと逆洗浄モードの何れかに切り替える動作モード切替部として機能する。 That is, the control device CNT functions as an operation mode switching unit that switches the operation mode of the water purification system to either the filtration operation mode or the backwash mode based on the pressure loss of the pretreatment device FL2.
　動作モード切替部は、逆洗浄モードからろ過運転モードに切り替える場合に、第１経路に沿って被処理水を加圧ポンプＰ１に供給し、ろ過運転モードから逆洗浄モードに切り替える場合に、第２経路に沿って被処理水を加圧ポンプＰ１に供給するように、被処理水の供給経路を切り替える。そして、動作モードに応じて加圧ポンプの給水圧が切り替えられる。ろ過運転モードでは逆浸透圧以上の高圧に増圧され、逆洗浄モードではそれよりも低い数ＭＰａ前後に増圧される。 The operation mode switching unit supplies the treated water to the pressure pump P1 along the first path when switching from the back washing mode to the filtration operation mode, and when switching from the filtration operation mode to the back washing mode, The supply path of the water to be treated is switched so that the water to be treated is supplied to the pressure pump P1 along the path. And the feed water pressure of a pressurization pump is switched according to an operation mode. In the filtration operation mode, the pressure is increased to a high pressure equal to or higher than the reverse osmosis pressure, and in the reverse cleaning mode, the pressure is increased to about several MPa lower than that.
　動作モード切替部は、浄水システムがろ過運転モードで動作している場合に、前処理装置ＦＬ２の圧損が大きくなると、動作モードを洗浄モードに切り替えて、第２経路に沿って被処理水を加圧ポンプに供給するように被処理水の供給経路を切り替え、洗浄モードに切り替え後に前処理装置の洗浄が終了すると、動作モードをろ過運転モードに切り替えて、第１経路に沿って被処理水を加圧ポンプに供給するように被処理水の供給経路を切り替える。従って、流路を切り替えることで単一の加圧ポンプをろ過用と逆洗用に合理的に兼用できるようになる。 When the water purification system is operating in the filtration operation mode and the pressure loss of the pretreatment device FL2 increases, the operation mode switching unit switches the operation mode to the cleaning mode and adds the treated water along the second path. When the pretreatment device cleaning is completed after switching to the cleaning mode after switching the supply path of the water to be supplied to the pressure pump, the operation mode is switched to the filtration operation mode, and the water to be processed is supplied along the first path. The supply path of the water to be treated is switched so as to be supplied to the pressure pump. Therefore, by switching the flow path, a single pressurizing pump can be rationally used for both filtration and backwashing.
　動作モード切替部は、ろ過運転モードに切り替える場合に、第２経路に沿って被処理水を前処理装置ＦＬ２に供給する液体洗浄モードと、第３経路に沿って圧縮空気を前処理装置ＦＬ２に供給する気体洗浄モードとを、所定周期で繰り返すように構成されていることが好ましい。 When switching to the filtration operation mode, the operation mode switching unit supplies the pretreatment device FL2 with the water to be treated along the second path, and the compressed air is supplied to the pretreatment apparatus FL2 along the third path. It is preferable that the gas cleaning mode to be supplied is configured to be repeated at a predetermined period.
　動作モード切替部は、ろ過運転モードから逆洗浄モードに切り替える前に、薬液供給経路から前処理装置ＦＬ２に薬液を供給する薬液洗浄モードに切り替えるように構成されていることが好ましい。 It is preferable that the operation mode switching unit is configured to switch from the chemical solution supply path to the chemical solution cleaning mode for supplying the chemical solution to the pretreatment device FL2 before switching from the filtration operation mode to the reverse cleaning mode.
　図１１には、前処理装置ＦＬ２に用いられるろ過エレメント１の累積ろ過運転時間と圧損の変動特性が示されている。新品のろ過膜は、約２８０分の運転時間で洗浄が必要な５０ｋＰａの圧損に達する。薬液洗浄後のろ過膜は、洗浄後６０分程度で５０ｋＰａの圧損に達している。これに対して、薬液洗浄を行わずに液体洗浄と気体洗浄を繰り返した場合のろ過膜は、単に薬液洗浄する場合に比べて圧損が上昇するまでの時間が大幅に長くなることが判る。但し、洗浄水及び洗浄空気の圧力は共に０．２ＭＰａ、それぞれ２０分、繰返し回数３回である。このような特性から、単に薬液洗浄するよりも洗浄効果が高く、長期間圧損の上昇を抑制可能になることが理解できる。 FIG. 11 shows the cumulative filtration operation time and pressure loss fluctuation characteristics of the filtration element 1 used in the pretreatment apparatus FL2. A new filtration membrane reaches a pressure loss of 50 kPa that requires cleaning in an operating time of about 280 minutes. The filtration membrane after chemical cleaning reaches a pressure loss of 50 kPa in about 60 minutes after cleaning. On the other hand, it can be seen that the time required for the pressure loss to rise significantly in the filtration membrane in the case where the liquid cleaning and the gas cleaning are repeated without performing the chemical cleaning, compared to the case of simply performing the chemical cleaning. However, the pressures of the cleaning water and the cleaning air are both 0.2 MPa, 20 minutes each, and 3 repetitions. From these characteristics, it can be understood that the cleaning effect is higher than that of the chemical cleaning, and the increase in pressure loss can be suppressed for a long time.
　以上説明した通り、原水に含まれる不溶解性成分を除去する前処理装置に長期にわたり交換不要なセラミック膜を用いることにより、逆浸透膜装置の処理負荷を低減するとともに、メンテナンスコストを低減可能な浄水システムを提供することができるようになる。 As explained above, by using a ceramic membrane that does not require replacement over a long period of time for the pretreatment device that removes insoluble components contained in raw water, the processing load of the reverse osmosis membrane device can be reduced and the maintenance cost can be reduced. A water purification system can be provided.
　以上説明した実施形態は本発明の一態様であり、該記載により本発明の範囲が限定されるものではなく、浄水システムの具体的な構成は本発明の作用効果が奏される範囲で適宜設定可能であり、また本発明の適用対象となるセラミック膜の具体的な材料、構造、大きさ等も特に制限されることは無い。 The embodiment described above is one aspect of the present invention, and the scope of the present invention is not limited by the description, and the specific configuration of the water purification system is appropriately set within the range in which the effects of the present invention are exhibited. The specific material, structure, size and the like of the ceramic film to which the present invention is applied are not particularly limited.
１：ろ過エレメント
１ａ，１ｂ：対向面
１ｃ：周面
２：流体通流孔
２ａ：内面
３：スペーサ部材
１００：ろ過コンポーネント
３００：浄水システム 1: Filtration element 1a, 1b: Opposing surface 1c: Circumferential surface 2: Fluid flow hole 2a: Inner surface 3: Spacer member 100: Filtration component 300: Water purification system

Claims (4)

  1. 　原水に含まれる不溶解性成分を除去する前処理装置と、前記前処理装置で不溶解性成分が除去された被処理水を加圧する加圧ポンプと、前記加圧ポンプで加圧された被処理水から溶解性成分を除去した被処理水を得る逆浸透膜装置と、を備えている浄水システムであって、
    　前記前処理装置にセラミック膜を用いるとともに、前記前処理装置で不溶解性成分が除去された被処理水を前記加圧ポンプを介して前記逆浸透膜装置に供給する第１経路と、前記逆浸透膜装置で得られた被処理水を前記加圧ポンプを介して前記前処理装置に逆洗浄水として供給する第２経路とを備えている浄水システム。     A pretreatment device for removing insoluble components contained in the raw water, a pressure pump for pressurizing the water to be treated from which the insoluble components have been removed by the pretreatment device, and a target to be pressurized by the pressure pump. A reverse osmosis membrane device for obtaining treated water from which soluble components have been removed from treated water, and a water purification system comprising:
    A first path that uses a ceramic membrane for the pretreatment device and supplies treated water from which insoluble components have been removed by the pretreatment device to the reverse osmosis membrane device via the pressure pump; The water purification system provided with the 2nd path | route which supplies the to-be-processed water obtained with the osmosis membrane apparatus to the said pre-processing apparatus as backwashing water via the said pressurization pump.
  2. 　前記前処理装置の圧損に基づいて浄水システムの動作モードをろ過運転モードと逆洗浄モードの何れかに切り替える動作モード切替部を備え、
    　前記動作モード切替部は、前記逆洗浄モードから前記ろ過運転モードに切り替える場合に、前記第１経路に沿って被処理水を前記加圧ポンプに供給し、前記ろ過運転モードから前記逆洗浄モードに切り替える場合に、前記第２経路に沿って被処理水を前記加圧ポンプに供給するように、被処理水の供給経路を切り替えるように構成されている請求項１記載の浄水システム。     An operation mode switching unit that switches the operation mode of the water purification system to either the filtration operation mode or the backwash mode based on the pressure loss of the pretreatment device,
    When the operation mode switching unit switches from the back washing mode to the filtration operation mode, the operation mode switching unit supplies the water to be treated to the pressurizing pump along the first path, and switches from the filtration operation mode to the back washing mode. The water purification system according to claim 1, wherein, when switching, the supply path of the water to be treated is switched so as to supply the water to be treated to the pressure pump along the second path.
  3. 　空気圧縮機と、前記空気圧縮機で圧縮された空気を前記前処理装置に逆洗浄空気として供給する第３経路とを、さらに備え、
    　前記動作モード切替部は、前記ろ過運転モードに切り替える場合に、前記第２経路に沿って被処理水を前記前処理装置に供給する液体洗浄モードと、前記第３経路に沿って圧縮空気を前記前処理装置に供給する気体洗浄モードとを、繰り返すように構成されている請求項２記載の浄水システム。     An air compressor, and a third path for supplying the air compressed by the air compressor to the pretreatment device as backwash air,
    The operation mode switching unit, when switching to the filtration operation mode, a liquid cleaning mode for supplying treated water to the pretreatment apparatus along the second path, and compressed air along the third path. The water purification system of Claim 2 comprised so that the gas washing mode supplied to a pre-processing apparatus may be repeated.
  4. 　原水のろ過方向に洗浄薬液を供給する薬液供給経路をさらに備え、
    　前記動作モード切替部は、前記ろ過運転モードから前記逆洗浄モードに切り替える前に、前記薬液供給経路から前記前処理装置に薬液を供給する薬液洗浄モードに切り替えるように構成されている請求項２または３記載の浄水システム。     Further equipped with a chemical solution supply path for supplying a cleaning chemical solution in the raw water filtration direction,
    The said operation mode switching part is comprised so that it may switch to the chemical | medical solution washing | cleaning mode which supplies a chemical | medical solution to the said pre-processing apparatus from the said chemical | medical solution supply path | route before switching to the said reverse cleaning mode from the said filtration operation mode. 3. The water purification system according to 3.
PCT/JP2015/051678 2015-01-22 2015-01-22 Water purification system WO2016117082A1 (en)

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