WO2016032890A1 - Pompe équipée d'un système de dégazage et de récupération de fluide automatisé, et procédé utilisant un réservoir de dégazage comportant une cloison interne - Google Patents

Pompe équipée d'un système de dégazage et de récupération de fluide automatisé, et procédé utilisant un réservoir de dégazage comportant une cloison interne Download PDF

Info

Publication number
WO2016032890A1
WO2016032890A1 PCT/US2015/046285 US2015046285W WO2016032890A1 WO 2016032890 A1 WO2016032890 A1 WO 2016032890A1 US 2015046285 W US2015046285 W US 2015046285W WO 2016032890 A1 WO2016032890 A1 WO 2016032890A1
Authority
WO
WIPO (PCT)
Prior art keywords
fluid
gas
gas removal
reservoir
piston
Prior art date
Application number
PCT/US2015/046285
Other languages
English (en)
Inventor
John C. Vines
John Laessle
Original Assignee
Integrated Designs, L.P.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/473,086 external-priority patent/US10092862B2/en
Application filed by Integrated Designs, L.P. filed Critical Integrated Designs, L.P.
Priority to JP2017511920A priority Critical patent/JP6427664B2/ja
Publication of WO2016032890A1 publication Critical patent/WO2016032890A1/fr

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B13/00—Pumps specially modified to deliver fixed or variable measured quantities
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B51/00—Testing machines, pumps, or pumping installations
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
    • F04B53/06—Venting
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
    • F04B53/20—Filtering

Definitions

  • the present invention relates generally to apparatus used in metering fluids with high precision, particularly in fields such as semiconductor manufacturing.
  • a pump pressurizes process fluid in a line to a dispense point.
  • the fluid is drawn from a source that stores the fluid, such as a bottle or other container.
  • the dispense point can be a small nozzle or other opening.
  • the line from the pump to a dispense point on a manufacturing line is opened and closed with a valve.
  • the valve can be placed at the dispense point. Opening the valve allows process fluid to flow at the point of dispense.
  • a programmable controller operates the pumps and valves. All surfaces within the pumping mechanism, lines and valves that touch the process fluid must not react with or contaminate the process fluid.
  • the pumps, containers of process fluid, and associated valving are sometimes stored in a cabinet that also house a controller.
  • Pumps for these types of systems are typically some form of a positive displacement type of pump, in which the size of a pumping chamber is enlarged to draw in fluid into the chamber, and then reduced to push it out.
  • Types of positive displacement pumps that have been used include hydraulically actuated diaphragm pumps, bellows type pumps, piston actuated, rolling diaphragm pumps, and pressurized reservoir type pumping systems.
  • U.S. Patent No. 4,950,134 (Bailey et al.) is an example of a typical pump. It has an inlet, an outlet, a stepper motor and a fluid displacement diaphragm.
  • the outlet valve opens and the motor turns to force flow of a displacement or actuating fluid into the actuating fluid chamber, resulting in the diaphragm moving to reduce the size the pumping chamber. Movement of the diaphragm forces process fluid out the pumping chamber and through the outlet valve.
  • a dispensing apparatus that supplies process chemicals from different sources is shown in U.S. Patent No. 6,797,063 (Mekias).
  • the dispensing apparatus has two or more process chambers inside of a control chamber.
  • the volume of the process chambers increases or decreases by adding control fluid to or removing control fluid from the control chamber.
  • the use of valving at the inlets and outlets of the process chambers, in combination with a pressurized fluid reservoir that controls fluid into and out of the control chamber controls the flow of dispensed fluid through the process chambers.
  • a gas removal reservoir adapted for use in an automated pump system of a fluid (e.g., a process fluid such as photo chemicals, etc.) having a gas therein comprises: an enclosure having an inlet, an outlet and at least one vent, wherein the inlet and the outlet are positioned at respective locations at a bottom portion of the enclosure, wherein the at least one vent is positioned at an upper portion of the enclosure; and wherein the fluid passes from the inlet to the outlet during the automated pump system operation and wherein any gas in the fluid collects at the at least one vent.
  • a method of removing gas in a fluid (e.g., a process fluid such as photo chemicals, etc.) in an automated pumping system is disclosed.
  • the method comprises: providing an enclosure having an inlet, an outlet and at least one vent; positioning the inlet and the outlet at respective locations at a bottom portion of the enclosure and positioning the at least one vent at an upper portion of the enclosure; causing a fluid having gas therein to flow from the inlet to the outlet, the gas in the fluid collecting at the at least one vent.
  • a method for expelling a gas above a fluid e.g., a process fluid such as photo chemicals, etc.
  • the method comprises: (a) closing a vent in the enclosure; (b) increasing the pressure within the enclosure containing the fluid and gas therein to a predetermined pressure; (c) opening a vent once the predetermined pressure is achieved to permit the gas to be expelled from the enclosure; (d) repeating steps (a) - (c) until all the gas above the fluid is expelled from the enclosure.
  • a filter vent recirculation path adapted for use in an automated fluid (e.g., a process fluid such as photo chemicals, etc.) pump system having a filter which is positioned adjacent the output of the automated pump system is disclosed; and wherein the filter has an output that is capable of being fed back to an upstream location in the automated pump system via a feedback path
  • the filter vent recirculation path comprises: a conduit that is coupled between a filter vent and the upstream location, and wherein the conduit carries a fluid/gas mixture from the filter toward the upstream location; and a conduit vent that is positioned at a maximum elevation location along the conduit for removing the gas from the fluid/gas mixture when the vent is opened and for sending the fluid only back to the upstream location.
  • a filter vent recirculation path adapted for use in an automated fluid (e.g., a process fluid such as photo chemicals, etc.) pump system having a filter which is positioned adjacent the output of the automated pump system is disclosed; and wherein the filter has an output that is capable of being fed back to an upstream location in the automated pump system via a feedback path and wherein the filter further includes a drain path coupled between a vent of the filter and a drain of the automated pump system, wherein the filter vent recirculation path comprises: a conduit that is coupled between a filter vent and the upstream location, wherein the conduit carries a fluid/gas mixture from the filter toward the upstream location; a bubble sensor coupled to the conduit for detecting the presence of bubbles in the fluid/gas mixture and positioned at a maximum elevation location along the conduit; and a bubble sensor drain path coupled between the bubble sensor and the drain via a valve, and wherein the valve is opened to pass the gas from the conduit to the bubble sensor drain path whenever bubbles are detected in the fluid/gas mixture, thereby convey
  • the pump system comprises: a gas removal reservoir having a process fluid therein: at least one vertical partition that separates the reservoir into at least two sub-reservoirs having a fluid channel positioned at a free end portion of the at least one vertical partition for permitting process fluid to pass between the at least two sub -reservoirs; a first inlet coupled to a remote process fluid source; an outlet; a second inlet coupled to a process fluid recirculation path coupled to a drain; and at least one vent coupled to the drain; a driving means (e.g., a piston cylinder arrangement, pumping chamber, etc.) indirectly coupled to the outlet for driving the process fluid into or out of the gas removal reservoir; valves coupled to the inlet and to the outlet for permitting process fluid flow into and out of the gas removal reservoir, and coupled to the at least one vent to remove gas out of the gas removal reservoir and into the drain, and coupled to the second
  • a driving means e.g., a piston cylinder arrangement, pumping chamber, etc.
  • the pump system comprises: a gas removal reservoir having a process fluid therein: at least one vertical partition that separates the reservoir into at least two sub-reservoirs having a fluid channel positioned at a free end portion of the at least one vertical partition for permitting process fluid to pass between the at least two sub-reservoirs; a first inlet; an outlet; a second inlet coupled to a process fluid recirculation path coupled to a drain; and at least one vent coupled to the drain; a driving means (e.g., a piston cylinder arrangement, pumping chamber, etc.) coupled to the first inlet for driving the process fluid into and out of the gas removal reservoir, the outlet being coupled to a filter; valves coupled to the first inlet and to the outlet for permitting process fluid flow into and out of the gas removal reservoir, and coupled to the at least one vent to remove gas out of the gas removal reservoir and into the drain, and coupled to
  • a driving means e.g., a piston cylinder arrangement, pumping chamber, etc.
  • a method for automatically removing gas from a process fluid (e.g., photo chemicals, etc.) to be dispensed comprising: (a) providing a gas removal reservoir having a first inlet coupled to a remote process fluid source, an outlet and at least one vent coupled to a drain, and wherein the gas removal reservoir has at least one vertical partition therein to form at least two sub -reservoirs that are in fluid communication via a fluid channel positioned at a free end of the at least one vertical partition; (b) indirectly coupling a driving means (e.g., a piston cylinder arrangement, pumping, chamber, etc.) to the outlet for driving the process fluid between the at least two sub-reservoirs and around the free end of the at least one vertical partition and out of the gas removal reservoir, and wherein the driving means is coupled to a remote process fluid source; (c) coupling valves to the first inlet and to the outlet for permitting the process fluid to flow into and out of the gas removal reservoir and coupling a valve to the at least one
  • a method for automatically removing gas from a process fluid (e.g., photo chemicals, etc.) to be dispensed comprises: (a) providing a gas removal reservoir having a first inlet coupled to a remote process fluid source, an outlet and at least one vent coupled to a drain, said gas removal reservoir having at least one vertical partition therein to form at least two sub-reservoirs that are in fluid communication via a fluid channel positioned at a free end of said at least one vertical partition, said outlet being coupled to a filter input; (b) coupling a driving means (e.g., a piston cylinder arrangement, pumping chamber, etc.) to an inlet of said gas removal reservoir for driving the process fluid between said at least two sub -reservoirs and around said free end of said at least one vertical partition and out of said gas removal reservoir; (c) coupling valves to said inlet and to said outlet for permitting the process fluid to flow into and out of said gas removal reservoir and coupling a valve to said at least one vent to remove gas out of said
  • a method for automatically evacuating gas from a process fluid (e.g., photo chemicals, etc.) to be dispensed comprises: (a) providing a gas removal reservoir having a first inlet coupled to a remote process fluid source, an outlet and at least one vent coupled to a drain; (b) indirectly coupling a piston and cylinder arrangement to the outlet for driving the process fluid into and out of the gas removal reservoir, wherein the step of indirectly coupling a piston and cylinder arrangement further comprises providing a pumping chamber that dispenses a process f uid and wherein the pumping chamber comprises a diaphragm that separates the pumping chamber into first and second chambers and wherein the first chamber is in fluid communication with the piston and cylinder arrangement through a first valve for receiving a pumping fluid therein and wherein the second chamber is in fluid communication with the gas removal reservoir and wherein the second chamber dispenses the precise amount of the process fluid to a pump outlet in accordance with a volume displacement applied from the pumping fluid in the
  • a method for automatically evacuating gas from a process fluid (e.g., photo chemicals, etc.) to be dispensed as part of a recirculation process comprises: (a) providing a gas removal reservoir having a first inlet coupled to a remote process fluid source, an outlet and at least one vent coupled to a drain; (b) indirectly coupling a piston and cylinder arrangement to the outlet for driving the process fluid into and out of the gas removal reservoir, and wherein the step of indirectly coupling a piston and cylinder arrangement further comprises providing a pumping chamber that dispenses a process fluid and wherein the pumping chamber comprises a diaphragm that separates the pumping chamber into first and second chambers and wherein the first chamber is in fluid communication with the piston and cylinder arrangement through a first valve for receiving a pumping fluid therein and wherein the second chamber is in fluid communication with the gas removal reservoir and wherein the second chamber dispenses the precise amount of the process fluid to a pump outlet in accordance with a volume displacement applied from
  • step (f)(2) repeating step (f)(2) until a predetermined gas evacuation pressure (e.g., 15 psi, etc.) is reached and a predetermined volume displacement (e.g., 1.2mL) of process fluid has occurred;
  • a predetermined gas evacuation pressure e.g., 15 psi, etc.
  • a predetermined volume displacement e.g., 1.2mL
  • Fig. 1 is a block diagram of the present invention coupled to an exemplary integrated circuit wafer fabrication process
  • Fig. 2 are isometric views of the precision pump assembly of the present invention
  • Fig. 3 is an exploded view of the precision pump assembly of the present invention
  • Fig. 4 is an exploded view of the pump body
  • Fig. 4A is an isometric view of the pump body showing the side that forms the pumping fluid reservoir
  • Fig. 4B is an isometric view of the pump body showing the side that forms the pumping fluid chamber;
  • Fig. 5 are isometric views of the pump head and showing how it couples to the pump body;
  • Fig. 6 is an exploded view of the pump head
  • Fig. 6A is an isometric view of the pump head block showing the process fluid chamber side of the pump head block;
  • Fig. 6B is an isometric view of the pump head block showing the gas removal reservoir (also referred to as the "gas removal reservoir") and the side of the pump head block that mates with the valve plate;
  • Fig. 6C diagrammatically shows the gas removal reservoir inlet
  • Fig. 7 is an exploded view of the filter distribution block
  • Fig. 7A are front and back views of the assembled filter distribution block
  • Fig. 8 is an exploded view of the motor drive system
  • Fig. 8A is a plan view of the piston
  • Fig. 8B is a cross-sectional view of the piston assembly taken along line 8B-8B of Fig. 8 A
  • Fig. 9 are exploded and assembled views of the piston
  • Fig. 10 is a cross-sectional view of the piston cylinder
  • Fig. 11 are exploded and isometric views of the overall pump assembly
  • Fig. 11 A is an isometric view of the pump assembly showing internals of the pump in phantom and with the outer cover removed showing the connections of the various flare fittings;
  • Fig. 12 is an exemplary electrical wire harness (also referred to as pigtail) for use in the electronics of the present invention
  • Fig. 13 is an exemplary syringe device for coupling to the present invention for adding air into the pumping fluid reservoir during the motor drive system change;
  • Fig. 13A is a block diagram of the remote monitoring, viewing and controlling (RMVC) subsystem pump interface using a web server;
  • RMVC remote monitoring, viewing and controlling
  • Fig. 13B is a block diagram of the RMVC subsystem pump interface of Fig. 13 A but using power-over-Ethernet (POE);
  • POE power-over-Ethernet
  • Fig. 13C is an exemplary web cam that can be used to view the pump and its vicinity over the RMVC using the web server in the system of Fig. 13B;
  • Fig. 13D is a block diagram of the RMVC subsystem pump interface of Fig. 13B but using POE and WiFi;
  • Fig. 13E is a block diagram of the network management module (NMM) interface
  • Fig. 13F is a block diagram of the pump controller motherboard interfaces
  • Fig. 13G is a block diagram of the Assignee's (Integrated Designs, L.P.) standard graphical user interface (GUI) for the pump;
  • GUI graphical user interface
  • Fig. 13H is a block diagram of the Assignee's standard GUI modified for Ethernet input/ output;
  • Fig. 131 is a block diagram of the Assignee's standard GUI and pump over the Ethernet;
  • Fig. 13 J is a block diagram of the Assignee's preferred cross-platform GUI, served JAVA applet;
  • Fig. 13K is a block diagram of the RMVC (also referred to as "Lynx”) which is a web-served cross platform GUI;
  • Fig. 13L is a table showing the JAVA supported platforms for use with the preferred GUI
  • Fig. 14 is a circuit schematic of a conventional stepper motor H-bridge
  • FIG. 15 block diagram of another embodiment of the present invention coupled to an exemplary integrated circuit wafer fabrication process that provides valving for filter recirculation of trapped process fluid and for a gas removal reservoir nitrogen supply;
  • Fig. 15A depicts a venturi circuit for use in the alternative embodiment of Fig. 15 to support filter recirculation of trapped process fluid
  • Fig. 15B depicts a flow diagram for the filter vent recirculation process
  • Fig. 16A is a flow diagram for the Recirculation mode using the embodiment according Figs. 1-1 A
  • Fig. 16B is a flow diagram for the Recirculation mode using the embodiment according Fig. 15;
  • Fig. 17 is a flow diagram for the Auto Balance mode
  • Fig. 18 is a flow diagram for the Dispense and Recharge modes
  • Fig. 19 is a flow diagram for the Precharge mode
  • Fig. 20 is a flow diagram for the Purge to Vent mode
  • Fig. 21 is a flow diagram for the Purge to Output mode
  • Fig. 22 is a flow diagram for the Prime Filter Housing mode
  • Figs. 23A-23B form a flow diagram for the Prime Filter Substrate mode
  • Figs. 24A-24B are flow diagrams for the System Drain mode using a two-filter block design
  • Figs. 24C-24D are flow diagrams for the System Drain mode using a four- valve filter block design
  • Fig. 25 A is a flow diagram for the Out of the Box mode using a two-filter block design
  • Fig. 25B is a flow diagram for the Out of the Box mode using a four- filter block design
  • Fig. 26 is the flow diagram for the Changing Drive Assembly mode
  • Figs. 27A-27B form a flow diagram for the Gas in Filter Detection Algorithm
  • Figs. 28A-28B form the flow diagram for the Gas in Piston Chamber Detection Algorithm
  • Figs. 29A-29B form the flow diagram for the Gas Volume in Gas removal reservoir Detection Algorithm
  • Fig. 30 is a block diagram of the major features of the present invention.
  • Fig. 31 depicts an alternative configuration of the pump of the present invention wherein the filter is located before the gas removal reservoir and the recirculation is located upstream of the filter;
  • Fig. 32 depicts another alternative configuration of the pump of the present invention wherein the filter is located after the gas removal reservoir and the recirculation is located either upstream of the gas removal reservoir or downstream of the gas removal reservoir;
  • Fig. 33 depicts another alternative configuration of the pump of the present invention wherein the filter is located before the gas removal reservoir and where the recirculation is located downstream of the filter;
  • Fig. 34A depicts a first gas evacuation process (also referred to as "GASE5") whereby pressure is built up within the pump system and then a quick vent is performed to evacuate any air in the system as used during a portion of the Recharge routine;
  • GASE5 first gas evacuation process
  • Fig. 34B depicts a second gas evacuation process (also referred to as "GASE6") whereby pressure is again built up within the pump system and then a quick vent is performed to evacuate any air in the system as used during a portion of the recirculation routine;
  • GASE6 gas evacuation process
  • Fig. 35 depicts a further alternative configuration of the pump of the present invention wherein the gas removal reservoir (i.e., gas removal reservoir or gas removal reservoir) comprises at least one internal partition and wherein the filter block has been replaced with an integrated configuration;
  • the gas removal reservoir i.e., gas removal reservoir or gas removal reservoir
  • Fig. 35 A depicts a functional diagram of the gas removal reservoir having an internal partition to facilitate the separation and removal of gas from the process fluid;
  • Fig. 35B depicts a functional diagram of an alternative embodiment of the gas removal reservoir that uses a plurality of internal partitions to facilitate the separation and removal of gas from the process fluid;
  • Fig. 35C depicts a venturi circuit for use in the alternative system configuration of Fig. 34 to support filter recirculation of trapped process fluid;
  • Figs. 36A-36D depict different views of the alternative system embodiment that uses a gas removal reservoir with at least one internal partition and showing the precision pump and its corresponding electrical control box;
  • Fig. 37 is an exploded view depicting the internals of the pump of Figs. 36A-
  • Figs. 38A-38B depict opposite side perspective views of the pump head of the pump of Figs. 36A-36D;
  • Fig. 38C depicts the alignment for coupling the pump head with the pump assembly of Figs. 36A-36D;
  • Figs. 38D-38F depict the coupling of the pump assembly and pump head of Figs. 36A-36D in more detail.
  • Fig. 39 is an exploded view of the pump head of the pump of Figs. 36A-36D depicting the internal components;
  • Fig. 40A is an isometric view of the pump head block of the pump of Figs. 36A- 36D showing the process fluid chamber side of the block;
  • Fig. 40B is an isometric view of the pump head block showing the valve side of the pump head block of the pump of Figs. 36A-36D that mates with the valve plate;
  • Fig. 40C is an enlarged perspective view of the pump head block of the pump of Figs. 36A-36D diagrammatically showing the gas removal reservoir inlet;
  • Fig. 41 is a functional diagram showing how the pump head of the pump of Figs. 36A-36D interfaces with the filter 42;
  • Fig. 42 depicts another embodiment of the pump system which utilizes a filter vent-to-source line flow path having an apex and vent positioned thereat for venting air bubbles;
  • Fig. 43 depicts a further embodiment of the pump system which utilizes a filter vent-to-source line flow path having an apex with a bubble sensor and valve positioned thereat and also includes a vent path back to the filter drain; and
  • Fig. 44 depicts a further pump system wherein the input to the gas removal reservoir is fed from the pumping chamber.
  • FIG. 1 a block diagram of an exemplary embodiment of the present invention 20 that uses a precision pump system.
  • the present invention 20 may form a portion of an integrated circuit wafer fabrication process, by way of example only, for dispensing a precise amount of process fluid to the wafer fabrication.
  • the present invention 20 is coupled to fabrication equipment, e.g., a fabrication reservoir FR which in turn is connected to a BIB ("bag in bottle" which supplies process fluid to the fabrication reservoir); a vent/drain is connected to the fabrication reservoir FR via a valve, V FAB -
  • the present invention 20 comprises a precision pump system 22 which includes a motor drive system 24 (e.g., Allegro A3977SED stepper motor driver and Portescape PK264-E2.0A stepper motor) that drives a piston 26 within a piston cylinder or chamber 28.
  • the precision pump 22 drives a pumping fluid (e.g., ethylene glycol or any other similar liquid that comprises similar characteristics, such as vapor pressure, boiling point, etc. that remains in its liquid state during all aspects of present invention's operation).
  • the pumping fluid is also referred to as the "working" fluid because of how it interacts with the piston 26 and the operation of the pump 20 as a whole.
  • the pumping fluid is provided from a pumping fluid reservoir 32 (e.g., 33 mL capacity) associated with the precision pump system 22.
  • the pumping fluid is used to drive and deliver a process fluid (e.g., photoresist) to the exemplary wafer fabrication process.
  • the process fluid is provided from a gas removal reservoir 30 (e.g., having an exemplary capacity of 33-34 mL).
  • the process fluid is a premium fluid and minimizing its waste is one of the key features of the present invention 20 which is to deliver precise amounts (e.g., maximum of 1 lmL) of this process fluid without wasting it.
  • both the pumping fluid and the process fluid are delivered to a working chamber 34 that comprises a pumping chamber 34A (e.g., 1 l-13mL capacity) and a dispense chamber 34B (e.g., 11-13 mL capacity, and also referred to as "process fluid chamber") which are formed by the presence of a diaphragm 36 that divides the working chamber 34 into the two variable sized chambers 34A/34B.
  • a pumping chamber 34A e.g., 1 l-13mL capacity
  • a dispense chamber 34B e.g., 11-13 mL capacity, and also referred to as "process fluid chamber”
  • a pump controller 38 controls a motor drive assembly 24E for displacing the piston 26; the motor drives the piston 26 based on pressure readings of the piston chamber 28 using a pressure sensor PS. Since the pump controller 38 knows the rate at which the piston 26 moves, as well as the time required to displace a desired volume of fluid, the precise amount of fluid dispensed is known.
  • the presence of the associated pumping fluid reservoir 32 and the gas removal reservoir 30 form two key elements of the present invention 20.
  • the present invention 20 is able to accomplish a quick replacement of the motor drive system while the pump remains online during the switch out.
  • the gas removal reservoir 30 associated with the precision pump 22 dispensed process fluid contains no gas bubbles and hence the phrase "gas removal reservoir” 30.
  • These reservoirs also permit the quick priming of the precision pump 22 and the filter distribution block 40 for the newly-inserted motor drive 24.
  • the location of either of these two associated reservoirs 30/32 may be integrated within the pump assembly 22A/pump head 22B (see Fig. 3), or may be external to either of those components.
  • the important feature is the presence of each of these reservoirs 30/32 in close proximity to the present invention 20 permits the present invention 20 to perform advanced operations in a closed internal fluid loop with only a single piston and a single pumping stage.
  • Fig. 1 depicts the gas removal reservoir 30 and filter 42 using orientation notation to show one alternative where fluid couplings to the top of those devices are being used.
  • a pump controller e.g., a microprocessor, microcontroller, etc.; e.g., a Freescale MC9S 12DG128CPVE microcontroller
  • the valves 1-8 and 10-12 may comprise diaphragmatic type valves (which are also referred to as diaphragmatic integrated valves, DIVs); valve 9 is a digital valve rather than a diaphragmatic valve.
  • a bleed port valve BP1 is provided with the pumping fluid reservoir 32 and a bleed port valve BP2 is provided with the pumping chamber 34A; the importance of those valves will be discussed later.
  • a pressure sensor PS is provided for detecting the pressure within the piston cylinder 28 as will also be discussed later. Operation of these diaphragmatic valves are discussed below under Diaphragmatic Integrated Valves. It should be further noted that control of the valves pertaining to the gas removal reservoir 30 and the pumping fluid reservoir 32 by the microcontroller 38 is not limited to an integrated controller within the pump system 20. It is within the broadest scope of the invention to include a remote controller of the valves associated with those two reservoirs. Another key aspect of the present invention 20 is the ability to monitor, view and control the present invention 20 over a local area network (LAN), via wired (e.g., via an Ethernet connection, etc.) or wireless connection (e.g., Bluetooth, IEEE 802.11 , etc.).
  • LAN local area network
  • wired e.g., via an Ethernet connection, etc.
  • wireless connection e.g., Bluetooth, IEEE 802.11 , etc.
  • NMM 50 network management module 50, which includes, among other things, a web server microcontroller (e.g., Freescale MCF52235CAL60 microcontroller).
  • a web server microcontroller e.g., Freescale MCF52235CAL60 microcontroller.
  • GUI graphical user interface
  • RMVC remote monitoring, viewing and controlling
  • Fig. 2 is an isometric view of the present invention 20 showing the precision pump system 22 and an electrical control box 23 which houses the electronics that control the pump 22, including the microcontroller 38 and the NMM 50 discussed previously.
  • Fig. 3 depicts the internals of the pump system 22.
  • the filter distribution block 40 is mountable behind a front plate 25.
  • a maintenance button 25 A that is activated to initiate the motor drive 24 removal; in particular, activation of the maintenance button 25 A opens isolation valve 8.
  • the motor drive 24 sits atop a main pump assembly 22A and the motor drive 24 can be released from the main pump assembly via the removal of four screws 24A-24D which can most easily be seen in Fig. 4.
  • Fig. 3 depicts the pump body assembly 22 A, pump head 22B, a pneumatic valve manifold 44, a cover plate 46 (see Fig. 4) to the pumping fluid reservoir 34A (Fig.
  • a pressure sensor board 48 (Fig. 11), which includes the pressure sensor PS (e.g., Honeywell ASDXRRXl 00PD2A5 digital pressure sensor) and a pressure sensor board microcontroller (e.g., Microchip PIC 12F675-E/SN).
  • PS e.g., Honeywell ASDXRRXl 00PD2A5 digital pressure sensor
  • a pressure sensor board microcontroller e.g., Microchip PIC 12F675-E/SN.
  • the precision pump system 20 incorporates a unique design of a single stage pump with the use of two associated reservoirs, namely, the gas removal reservoir 30 (also referred to as the "pre reservoir") and the pumping fluid reservoir 32, allowing the pumping fluid and the process fluid to be stored and accessed on an as needed basis.
  • This allows the pump system 20 to perform operations in a closed internal fluid loop with only a single piston.
  • a prior art closed loop system filled with and facilitating the movement of incompressible working fluid requires the increase and decrease using two or more pump stages to create an imbalance of pressure to induce flow. The decrease in the volume of one chamber must be equaled by the increase in volume of another connected chamber.
  • the passively variable volume of the chambers (i.e., 28, 34A and 34B) in the present pump system 20 allows for a partially closed system, the volume of the total sealed space is constant but the shape of the fluid filled portions of the pump can change with the amount of fluid contained in the particular chamber.
  • the pump body 22A comprises aluminum (by way of example only, machined to 6.15"x2.20"x2.20").
  • the front face 52A features a machined slot 54 for an anti -rotation guide 56 on the piston 26 to travel in.
  • Around this slot 54 are four threaded holes for mounting the pressure sensor PS and associated printed circuit board 48, which also contains an infrared (IR) sensor that interfaces with the anti- rotation guide 56 on the piston 26.
  • This front face 52A also features a tubing connection 58A/58B that taps into the piston chamber 28 inside the pump body 22A.
  • the other end of this tubing 60 (Fig. 11) connects with the pressure sensor PS on the pressure sensor PCB 48.
  • This pressure sensor PS is used for calibration and balancing of the pumping fluid levels in the pump body 22A.
  • the pumping fluid reservoir 32 On a left face 52B of the pump body is the pumping fluid reservoir 32 (see Figs.
  • the back face 52C of the pump body 22A includes the pumping fluid chamber 34A (see Figs. 4 and 4B) machined with an O-ring groove 63 (Fig. 4B), to seat an O- ring 65 (Fig. 4), around the perimeter to properly seal the diaphragm 36 (e.g., a PTFE diaphragm, see Fig. 4) against it with the use of a diaphragm hold down plate 64.
  • This aluminum diaphragm hold-down plate 64 has a cut-out in the center that mimics the shape of the process fluid chamber 34B. This allows the diaphragm 36 to expand and contract through it while still having material over the O-rings to seal the diaphragm 36 to the pump body face 52C.
  • This back face 52C of the pump body 22A features eight threaded holes for the counter-sunk screws 66 that secure the diaphragm hold-down plate 64 to it. It also features six larger diameter screw holes for mounting the pump head 22B (see Fig. 5) into position on the face 52C. There are through holes in both the hold-down plate 64 and the diaphragm 36 to accommodate the fourteen mounting screws required for the hold-down plate 64 and the pump head 22B. At the top right of this back face 52C, there is a threaded hole for a flow path that leads into the top of the pumping fluid reservoir 32. This pathway acts as the bleed port, i.e., BP1, used in the motor change procedure and in balancing the pumping fluid levels in the pump 20. Under normal operation (when the pumping fluid reservoir 32 is not in use), a screw BP1 (Fig. 4) is secured in this hole to seal the reservoir 32 from atmospheric pressure.
  • BP1 a screw BP1 (Fig. 4) is secured in this hole to seal the
  • the right face 52D (Fig. 4) of the pump body 22A only has one feature. This is an angled cutout 53 (Figs. 4 and 4B) that features a threaded hole that feeds into a flow path to the top of the pumping fluid chamber 34A. This acts as the bleed port BP2 for the pumping fluid chamber 34A. This threaded hole is sealed off by a screw 109. This screw 109 does not be need to be removed for any user-performed maintenance.
  • the top face 52E of the pump body 22A features four threaded holes for the stepper motor 24 to be mounted with four bolts 24A-24D.
  • the first and largest diameter e.g., 1.505
  • the next diameter e.g., 1.125
  • the next diameter is to provide clearance for the lead screw clamp and the anti-rotation guide 56 as they spin and travel within this hole, and is machined to a depth of 2.938".
  • the next diameter (0.75") is the actual piston bore of the pump body 22A, machined to a depth of, e.g., 5.188".
  • the bottom of this piston bore has a 60 degree chamfered edge to fit perfectly with the conical shape of the piston at its maximum stroke. The last diameter is 0.5" and goes to a depth of approximately 5.875".
  • the bottom face 52F of the pump 22A has two integrated valves (5 and 8) machined into it. These are designed similarly to the other diaphragmatic valves throughout the pump 22A.
  • Valve 8 controls flow between the piston chamber 28 and the pumping fluid reservoir 32 and valve 5 controls flow between the piston chamber 28 and the pumping fluid chamber 34A.
  • This aluminum valve plate 68 is secured to the pump body with 4 screws 72 (Fig. 4).
  • There are also four rubber mounting pads 74 (Fig. 4) secured around the valve plate 68 to keep the pump body 22A stable.
  • Isolation valves 5 and 8 are used in the pump system 20 to control the flow of the pumping fluid between the three pump fluid chambers 28, 32 and 34A.
  • the valves allow the pump 22 to store and access additional pumping fluid on an as needed basis. Since only one isolation valve is open at any given time, this arrangement insures that only one flow path from the piston chamber 28 is active at that same time. Flow from the piston chamber 28 to the pumping fluid reservoir 32 does not affect the pumping chamber 34A and vice versa.
  • Fluid movement in a closed system filled entirely of incompressible fluid from one chamber to another requires the individual chamber volumes to be varied in conjunction with the fluid flow. It is impossible to adjust the normal holding volume of one chamber without directly and proportionally changing the normal holding volume of another. When this is desired, the only option is to incorporate an open system to allow the fluid volume to be altered. When a repeatable and reversible change in system volume is desired, the use of a reservoir allowing the fluid to be stored can be used to allow the fluid movement to and from the system while preventing any compressible fluids into the original system.
  • a reservoir 32 for the incompressible fluid used in motion transfer i.e., the pumping fluid
  • This reservoir 32 is capable of storing volumes of temporarily unused pumping fluid.
  • the reservoir 32 is used to both temporarily store pumping fluid from the piston chamber 28 and to create a fluid barrier to prevent air bubble entrapment in the pumping fluid channels inside the pump body 22A.
  • the pumping fluid reservoir 32 is connected to the piston chamber 28 through an integrated diaphragmatic valve, 8. This valve 8 remains closed during the normal pumping process to prevent fluid movement into and out of the reservoir 32 to maintain a constant volume of pumping fluid used in the piston chamber 28 and pumping fluid chamber 34A. During normal pumping processes the reservoir 32 simply stores pumping fluid that will be needed during the maintenance functions.
  • the reservoir 32 is sealed from atmosphere by the pumping fluid reservoir bleed port screw BP1 and is filled to roughly half capacity during normal pumping operations.
  • the fluid in the reservoir 32 is exposed to the air sealed inside the reservoir 32, but is unaffected by this gas due to the fluid's resistance to absorbing gas.
  • the reservoir bleed port screw BP 1 is removed to allow the ingress and egress of air from the reservoir 32. This allows the pumping fluid levels to be altered while maintaining pressure equalization with atmospheric pressure. This ensures that no residual pressure differentials in the reservoir 32 will cause unwanted fluid flow to or from the rest of the pump 20. After the completion of the maintenance function the pumping fluid reservoir bleed port screw BP 1 is re-installed to seal the reservoir 32.
  • the pumping fluid normally in the piston chamber 28 is dispensed into the pumping fluid reservoir 32 and the valve 8 isolating the pumping fluid reservoir fluid from the piston chamber 28 is then closed. This frees room in the piston chamber 28 to allow the piston 26 to move pumping fluid from the pumping fluid chamber 34A as needed.
  • the valve 8 isolating the reservoir 32 opens, allowing the flow of pumping fluid from the reservoir 32 to the piston chamber 28. As the piston 26 returns to the home position, the fluid flows from the reservoir 32 into the piston chamber 28, completely refilling it.
  • the valve V8 isolating the reservoir 32 is opened allowing the pumping fluid normally held in the reservoir 32 to flow into the piston chamber 28. This flow is caused by the suction created by the O-ring seal as the piston 26 is removed.
  • the fact the fluid path from the pumping fluid reservoir 32 to the piston chamber 28 is attached to the bottom of the reservoir 32 means that only the pumping fluid flows in the fluid paths inside the pump unless the reservoir 32 is completely empty. This prevents any gaseous bubbles from entering the internal fluid paths and other pumping fluid chambers.
  • the motor drive assembly 24 (Fig. 8) comprises a stepper motor 24E, a bearing 24F, a lead screw 24G clamped onto the motor shaft by a clamp 24H, and the piston 26 (Fig. 9).
  • the bearing 24F is pressed onto the stepper motor 24E (e.g., using 80-90 PSI).
  • the stainless steel lead screw 24G is then installed onto the motor drive shaft and clamped into place.
  • Grease is applied to the threads on the lead screw 24G and the piston 26 is screwed on.
  • the stepper motor 24E is plugged into the pressure sensor PS PCB 48 that is mounted on the side of the pump body 22A.
  • the piston features two O-rings 74 (Fig. 9) to keep the piston 26 properly aligned in the piston cylinder 28 of the pump body 22A and to better retain grease along with a proper seal.
  • the bottom face 76 (Fig. 8) of the piston 26 is machined to be a conical shape. This shape aids in preventing air from being trapped in the piston cylinder 28 during initial assembly and during a drive change maintenance procedure.
  • An anti-rotation guide 56 is installed at the top of the piston 26 to serve as a restraint that keeps the piston 26 from turning as the motor 24E turns the lead screw 24G.
  • the guide 56 travels in a machined slot 54 (Figs. 4 and 4A) on the front face 52A of the pump body 22A. It is this anti- rotation guide 56 that converts the rotation motion of the piston 26 into reciprocating motion.
  • This guide 56 also acts as a flag for the IR sensor mounted on the PCB 48 on the front face of the pump body 22A. When this flag is in between the prongs of the IR sensor, the pump software in the microcontroller 38 knows the piston 26 is at the home position (HRP).
  • the pump system 20 relies of the absence of air in the pumping fluid chamber 34A to achieve highly repeatable and controllable dispenses. Air in the pumping fluid chamber 34A expands and contracts to an unacceptable degree due to the pressure changes that occur during the dispense cycle. To ensure no air remains in the piston bore 28 after the drive assembly changing process, the use of a piston 26 with conically shaped end 76 is incorporated into the pump 20. The addition of an inverted conical shape 76 to the piston 26 assures that any air is evacuated prior to the first O-ring sealing 74 with the piston bore.
  • the pumping fluid level inside the piston bore 28 is just below a horizontal plane formed by the uppermost circumference of the piston bore 28.
  • the conical shape 76 of the piston end displaces a volume of the pumping fluid in the piston bore 28.
  • the volume of displaced pumping fluid increases and causes the fluid level to rise in relation to the pump body 22A.
  • the volume of the conical shape of the piston end is greater than the volume of the air initially located above the pumping fluid and below the plane formed by the upper section of the piston bore 28. Since the volume of displaced liquid is larger than the volume of air, the fluid rises to the point it fills the entire volume located below the O- ring sealing surface of the piston bore 28.
  • the volume of the conical shape is sufficient to displace the air below the sealing surface, while not causing an undue amount of spillage from any excess pumping fluid being forced out of the piston bore 28.
  • the conical shape 76 is important to the evacuation of air since the angled face directs any bubbles already floating in the piston chamber 28 up and out of the piston bore 28.
  • the outward angle face of the conical piston works in conjunction with the buoyant nature of gas bubbles to evacuate all gasses from the volume sealed by the O-rings 74 against the piston bore 28.
  • the pump head is depicted in detail in Figs. 6-6C.
  • the pump head (Fig. 6) consists of a PTFE block 78 and an aluminum valve plate 80.
  • the PTFE block 78 contains the process fluid chamber 34B on one face along with four diaphragmatic integrated valves (1, 2, 3, and 7) and the gas removal reservoir 30 (also referred to as the "Gas removal reservoir") on the opposite face.
  • the process fluid chamber 34B is cut into the face of the PTFE block 78 that interfaces with the pump body 22A.
  • This chamber 34A is in the shape of an elongated rectangle with circular ends. There is a raised edge around this chamber to support an O-ring.
  • the diaphragmatic valve cutouts on the opposite face of the PTFE block 78 are designed as those described in the Diaphragmatic Integrated Valves section below.
  • the gas removal reservoir 30 is cut into the same face as the valves 1 , 2, 3 and 7. It is shaped as a square but with one vertical edge longer than the other to create a high point in the chamber 30 that aids in bubble collection and venting.
  • the process fluid source inlet is positioned on the roof of the gas removal reservoir where the side wall meets the roof on the shorter vertical side.
  • the purpose of the source inlet' s position is to allow for the process fluid to enter into the gas removal reservoir at an angle near the side edge which allows for the process fluid to smoothly run down the wall of the gas removal reservoir instead of dripping from the top of the reservoir, which can cause the capturing of air as the fluid falls.
  • Four flow paths exit the PTFE block 78 through 1 ⁇ 4" male flare fittings on the top face. Two of these lines are connected to the filter valve block 40 and the other two go to the process fluid chamber 34B and the process fluid source 10.
  • Four set screws 82 hold the male flare fittings securely in place in the block 78.
  • Fig. 11 depicts how the pump head 22B and the pump body 22A are mated together.
  • the aluminum valve plate 80 (Fig. 6) features four valve cutouts, mirrored to the valve cutouts on the corresponding surface 80A (Fig. 6B) of the PTFE block 78, and an O-ring cutout 30A that lines up with the raised edge around the reservoir 30 on the PTFE block 78.
  • the valve cutouts on the aluminum plate 78 are designed similarly to those described in the diaphragmatic integrated valves section below.
  • the aluminum valve plate 80 holds the O-rings for valves 1, 2, 3 and 7 as well as for the gas removal reservoir 30.
  • a PTFE diaphragm 84 (Fig.6) similar to that described in the diaphragmatic integrated valves section below.
  • the pieces are assembled and secured to the pump head using six screws 86 (Fig. 6) that travel through the whole assembly and fasten to the pump body 22A.
  • the present invention 20 is designed to take up minimal space to allow the customer to optimize the space available in the coater/developer where the pump 20 is installed.
  • the valves used throughout the pump system play a major role in reducing its footprint. Off-the-shelf valves tend to take up too much space.
  • the valves in the pump system of the present invention 20 are low profile diaphragm valves that are designed right into the pump head 22B. The following discussion pertains to the diaphragmatic valves uses in the pump head 22B, it being understood that diaphragmatic valves used elsewhere in the present invention have a similar construction.
  • valves and associated flow paths are machined into the virgin PTFE block 78, allowing the pump 20 to perform a variety of complex operations in a very small amount of space.
  • the basic diaphragmatic integrated valve design consists of three parts : a PTFE block, a PTFE diaphragm, and an aluminum plate.
  • the PTFE block contains the flow paths and the circular valve chambers for the process fluid to flow through.
  • the aluminum plate serves as a manifold to distribute the air required for the pneumatic actuation of the valves, having flow paths and circular chambers that mirror the valve chambers on the PTFE block.
  • the PTFE diaphragm is the interface between the PTFE block and the aluminum plate and is forced into either the PTFE block's chambers or the aluminum plate's chambers by positive or negative pressure from the pneumatic lines, respectively.
  • the valve design on the PTFE block side involves a shallow circular cutout on the face of the block, and has both an inlet and outlet flow path that connect with this circular chamber.
  • On the block face surrounding the circular cutout there is a raised lip to provide a better sealing surface with the diaphragm against the aluminum plate.
  • One of the two flow paths that intersect with the valve cutout is usually located near the center of the circle to allow the diaphragm to effectively seal the path when it is pushed into the valve cutout by pneumatic pressure from the other side.
  • the diaphragm is made of 0.01" thick PTFE sheets and is cut to the size of the sealing face of the valve block. Any holes needed for mounting valve blocks are cut in the diaphragm sheet to allow bolts and screws to pass through.
  • the thickness of the PTFE diaphragm allows it to be deformed by the pneumatic pressure and vacuum to fill the cutout chambers in the PTFE block and aluminum plate, respectively.
  • the aluminum plate is designed with circular cutouts on the face that mates with the valve face of the PTFE block. These cutouts are placed to mirror the cutouts on the PTFE block, creating a valve chamber that is bisected by the diaphragm when the parts are assembled. O-ring grooves are machined around the valve cutouts on the aluminum plate for the raised lips around each valve cutout on the PTFE block to seal against. Each valve cutout on the aluminum block interfaces with one flow path in which pressurized air travels through. The flow paths containing the pressurized air travel through the aluminum plate and are finished with a fitting that allows the connection of nylon tubing. This tubing is connected to a separate valve manifold with a bank of 3- way valves that control the application of either pressure or vacuum to each of the valves in the pump system individually.
  • Figs 6-6A depict the construction of DIV valves 1, 2, 3 and 7, it being understood that all of the DIV valves operate in a similar manner.
  • the control side of the DIV e.g., valve 7
  • plate 80 which comprises a control port CP (e.g., an air port) surrounded by a channel CH into which an O-ring 81 is disposed.
  • a diaphragm 84 is disposed in between plate 80 and surface 80A of the block 78.
  • surface 80A of the block 78 comprises the "output" portion of the DIV 7 which comprises two outlet ports 83A/83B.
  • Operation of the diaphragmatic valve involves connecting the control port to a pneumatic source where either a pressure or vacuum is applied.
  • a pneumatic source where either a pressure or vacuum is applied.
  • the diaphragm closes the two outlet ports and conversely when vacuum is applied the diaphragm opens the two outlet ports.
  • the gas removal reservoir 30 is sealed by a PTFE diaphragm cover and a metal plate with an integrated O-ring groove on it.
  • the gas removal reservoir 30 has a raised ridge providing support to the PTFE diaphragm cover around the edge for better sealing.
  • the back metal plate provides uniform support to the gas removal reservoir PTFE diaphragm cover and ensures no leakage around the O-ring sealing.
  • Table 1 is a definition of the various DIVs:
  • the pump system 20 utilizes valves and valve controls to direct fluid flow during the various maintenance, startup, and operating processes. This must be achieved while maintaining the compact size of the pump required by the spaces in which they are mounted.
  • some of the diaphragmatic valves are included in a small external block (Fig. 7). This block directs fluid flow to and from six connections 175 (Fig. 7).
  • the valve block includes connections from filter vent connection, from the filter fluid output line, to the external dispense digital valve, to the pump system drain line, from the gas removal reservoir vent line, and to the gas removal reservoir recirculation line.
  • the fluid flow is controlled by four pneumatically- actuated integrated diaphragmatic valves 177 (Fig. 7).
  • One valve (DIV 6) controls the fluid flow from the filter vent connection to the system drain/vent line.
  • One valve (DIV 10) controls the fluid flow from the gas removal reservoir recirculation line to the system drain/vent.
  • One valve (DIV 4) controls the fluid flow from the filter output to the gas removal reservoir.
  • One valve (DIV 11) controls the fluid flow from filter output line to the point of the external dispense digital valve. Those valves direct fluid flow during each operation with filter involved.
  • Fig. 7A shows the assembled filter block.
  • a bank of three-way pneumatic valves 44 (Figs. 3 and 11) is used to control the application of pressure or vacuum to the integrated valves used throughout the pump 20.
  • the preferred embodiment uses 8 SMC VI 00 valves mounted on an SMC 8 -position manifold. This manifold has 2 main flow paths that run the length of it. One path is for pressure and the other is for vacuum. These flow paths are capped at one end by 2 M5 cap screws, and have 2 1/8" tubing barb fittings screwed into the other end.
  • the SMC valves are mounted on the front face of the manifold, which has the proper ports necessary to interface with these valves.
  • Fig. 11 A depicts the connections of the various flare fittings.
  • the electronics are made to be easily replaced simply by loosening the enclosure attachments & unplugging the connectors on the pump controller pigtails. (Fig. 12). Electronics Enclosure 23
  • the electronics enclosure 23 (Fig. 2) is designed to house the main controller
  • PCB 530 (Fig. 13C), network management PCB 50 (Fig. 13C), RDS translator PCB 539 (Fig. 13C), and optional digital valve controller PCB 538 (Fig. 13C).
  • These boards are encapsulated by a two-piece sheet metal casing.
  • the enclosure is designed to be mounted next to the pump enclosure and is easily removable from the mounting plate in the track without disturbing the pumping hardware.
  • the enclosure allows for the connection of network cables, power cables, track communication cables, and an N 2 line. Cable connectors are external to the enclosure to allow easy removal of the electronics enclosure from the track.
  • the enclosure is accented by stickers that display connection labels, model numbers, and brand logos.
  • the pump enclosure 22 comprises five stainless steel sheet metal pieces: a base plate 165, a bottom enclosure 167, a cover 173, an access panel 169, and a filter manifold bracket 248.
  • the purpose of the pump enclosure 22 is to house and protect the pump parts.
  • the enclosure 22 features fluid connections for the source input, dispense output, and drain lines.
  • the enclosure 22 also allows for the connection of the pump power and control wires as well as connections for N 2 , pressure, and vacuum lines.
  • the pump enclosure is secured to a track mounting plate 243, next to the electronics enclosure 23.
  • the filter manifold bracket 248 features mounting holes in a variety of different configurations to allow the user to mount multiple types of filter brackets (see Filter Manifold Bracket section below).
  • the pump enclosure includes indicia (e.g., stickers) to identify the model number and to label the incoming and outgoing
  • the stainless steel sheet metal track mounting plate 243 (Fig. 3) allows the electronics enclosure 23 and the pump enclosure 22 to be installed side-by-side in the track.
  • the track mounting plate 243 comprises a mounting-hole pattern for other pumps (e.g., Entegris RDS pump).
  • the pattern of the mounting holes on the plate is symmetric so that the plate 243 can be installed upside down without changing the mounting orientation of the pump enclosure 22 and electronics enclosure 23.
  • the plate 243 allows the electronics enclosure 23 to be removed from the track without removing the pump 22 or vice versa.
  • the symmetry of the enclosure mounting holes also allows the electronics enclosure 23 to be installed to either the right or the left of the pump enclosure, depending on the user's preference.
  • the stainless steel sheet metal filter manifold bracket 248 (Fig. 3) has predrilled mounting holes for attaching three different OEM filter manifolds. These preconfigured hole patterns allow for the attachment of either other components, such as, but not limited to, Entegris Impact 2, Entegris ST, or Pall EZD-3 filter manifold.
  • the provided syringe apparatus comprises, by way of example only, a 15cc luer lock tip syringe, a luer lock to 1/16" tubing coupling, and a tubing with 6" in length and 1/16" in ID. These pieces come assembled with the replacement pumping chamber diaphragm parts. As shown in Fig.
  • the syringe 222 comprises a 20cc (by way of example only) Luer Lock tip, a tube coupling 263, Luer Lock to 1/16 inch tube (by way of example only) and a tube 264 that is 1/16 inch by 4 inches long (again, only by way of example).
  • RMVC Remote Monitoring, Viewing and Controlling
  • the pump system 20 is software controlled in all aspects of the pump operation, including the dispense parameter monitoring, maintenance prediction and control, as well as the setup and control of normal pumping operations.
  • the pump controller 38 (Fig. 1) performs these functions through various interfaces not shown.
  • the network management module 50 (Fig.1) allows Ethernet or wireless network control of the pump through the microcontroller 38.
  • the pump controller 38 is directly connected to a specifically programmed graphical user interface (GUI) via a serial interface.
  • GUI graphical user interface
  • the RMVC subsystem is also referred to by its tradename "Lynx".
  • Fig. 13 A shows an embodiment of the pump of the present invention 20 having a graphical user interface (GUI) connected over a network, e.g., Ethernet, local area network (LAN), wide area network (WAN), a virtual private network (VPN), the "cloud," the Internet or an Intranet.
  • GUI graphical user interface
  • a network e.g., Ethernet, local area network (LAN), wide area network (WAN), a virtual private network (VPN), the "cloud,” the Internet or an Intranet.
  • a web server WS that is connected to the pump controller 38 via the network management module NMM 50 to form a "web-served GUI.”
  • the web-served GUI incorporates an Ethernet communication via an RJ45 connection.
  • the web server WS is a small surface mount component on the NMM 50 housed in the pump 20 and is used for pump configuration, operation and monitoring using a standard web browser. All pump configuration parameters are entered and read using this interface.
  • the web server WS communicates with the pump 20 on serial portO.
  • the web server WS may comprise megabytes of flash memory suitable for web page storage.
  • the web-served GUI is also referred to as the "remote monitoring, viewing and controlling (RMVC) subsystem.
  • the web server WS may be enhanced with an additional
  • Ethernet port for use with an optional networked device.
  • Power-Over-Ethernet may be used to supply power to an optional networked device, e.g., a web cam.
  • This Ethernet port is not used by the web server WS .
  • the optional web cam may be used to observe the pump 20 operation remotely. It should be noted that the web cam is controlled by software supplied therewith.
  • Fig. 13C depicts an exemplary web cam, such as the Wireless IP Network Camera Pan Tilt WIFI Webcam CCTV IR Night USA Plug 80413 by Yaloocharm.
  • Fig. 13D depicts a block diagram of the web server interface that is enhanced with an additional, built-in, Wireless Ethernet port for use when the network cable would be inconvenient.
  • Fig. 13E shows a block diagram of the NMM 50.
  • the NMM 50 includes the web server WS having a web server microcontroller 501 with embedded Ethernet engine, a CanBus driver (Controller Area Network bus) 502 , a 2 port Ethernet switch 503 , flash memory 504 and a Power over Ethernet (POE) power supply and controller 505.
  • An exemplary device for the web server microcontroller is the Freescale MCF52235CAL60 microcontroller.
  • the motherboard 530 of the pump controller 38 includes a central microcontroller, which is responsible for all of the system control functions.
  • the microcontroller is connected to the pump stepper motor through the stepper motor drive 532.
  • the microcontroller is connected to the valve drivers 533 and pressure sensor/PCB electronics 48 via a serial connection.
  • the pressure sensor electronics include a separate microcontroller which monitors pressure and sends this data to the central pump controller 38.
  • the central microcontroller is also connected to the NMM 50, which allows GUI control of the pump process through the Internet either via Ethernet or WiFi wireless connection.
  • the pump controller 38 is also optionally connected to a digital valve controller 536 for control of up to three valves .
  • the pump controller 38 is also optionally connected to the RDS translator module 539, an external RS232/485 converter 537 and a track I/O daughter card 538.
  • a first GUI option is a standard singe platform installed GUI, block diagrams of which are shown in Figs. 13G-131.
  • the standard GUI may be modified for use with the tiny web server WS. This GUI is still a single platform and the GUI requires installation on the client machine.
  • a second more preferred GUI is the cross platform JAVA virtual machine GUI, block diagrams of which are shown in Figs. 13J-13L.
  • the second GUI option is a more flexible GUI when written as a JAVA applet.
  • This applet may be served from the tiny web server WS and utilizes the JVM (JAVA virtual machine) runtime libraries. These runtime libraries are part of the JVM.
  • JVM Java virtual machine
  • GUIs 13L that can serve as potential GUIs are: Windows® (x86-64, IA-64 processors), Solaris® (x86-64, SPARC processors), Linux ® (x86, x86-64, IA-64, PowerPC, System z (formerly Z-Series) processors), HP-UX (PA-RISC, IA-64 processors); i5/OS and ⁇ (both PowerPC® processors).
  • IP Internet Protocol
  • UDP user datagram protocol
  • this may be updated in four ways: 1 ) via a flash update plug : this method requires physical access to the pump electronics in addition to a laptop with a BDM (background debug mode) flasher;
  • this process may be used when there is a network connectivity to the Assignee's update servers. This option does not require physical access to the pump electronics;
  • an internal network update is also available.
  • this option may be used when there is no network connectivity to the Assignee update servers. This option does not require physical access to the pump electronics.
  • This option is similar to "Full Web update" described above except an update folder is specified on the internal network instead of the Assignee's update server.
  • the RMVC subsystem adds additional value by being able to provide a direct camera and audio connection between a technician working with our pump and our field service workers.
  • an exemplary camera and audio device is the Wireless IP Network Camera Pan Tilt WIFI Webcam CCTV IR Night USA Plug 80413 by Yaloocharm (as shown in Fig. 13C).
  • Yellow camera light for use with a video camera in a yellow light (semi FAB) environment.
  • the FAB tech clicks "Request Service” Button in NMM GUI. This sends a Service request to the IDI remote service center.
  • IDI Field service personnel acknowledge the request & initiate a remote connection with "service" credentials.
  • the IDI remote service center personnel have full, remote control, of all of the video camera, & pump controls. Audio maybe enabled to discuss the issue with the FAB tech.
  • FAB safe video camera lights may be activated & the camera's pan, tilt, and zoom can be manipulated to observe any pump malfunction.
  • the IDI service personnel may operate the pump while observing its operation. With the proper credentials, anyone can join the audio/video feed & manipulate the pump or just observe & listen while the diagnosis & repairs are being made.
  • RMVC subsystem can be used an unlimited number of pump devices and that its integration with the pump system of the present invention 20 is by way of example only.
  • the RMVC subsystem can be used, by way of example only, for any process equipment used in a wafer fabrication facility, or in medical facilities, or in oil and gas facilities, or in food processing facilities and even in cosmetic facilities.
  • the two reservoirs associated with the pump system 20 are the gas removal reservoir 30 and the pumping fluid reservoir 32 (Fig. 1). These are referred to as reservoirs since they have a set volume capacity.
  • the three chambers on the pump system 20 are the process fluid chamber 34B, the pumping fluid chamber 34A, and the piston chamber 28 (Fig. 1). These are referred to as chambers because their volume can change.
  • the pumping fluid chamber and process fluid chamber volumes can change as the diaphragm 36 moves around inside the pumping chamber 34.
  • the pumping chamber 34 is the chamber where the pumping chamber diaphragm 36 is mounted.
  • the overall combined volume of the two chambers, the pumping fluid chamber 34A and the process fluid chamber 34B, remains constant, but because of the flexible PTFE diaphragm component 36, the individual chamber volumes may change.
  • the piston chamber 28 has a dynamic volume since the piston moves around and affects a change of volume.
  • the pumping fluid in the single head pump system 20 is primarily contained in two chambers (i.e., piston chamber 28 and pumping chamber 34A) and one reservoir 32 associated with the pump body 22.
  • the first of the three pumping fluid chambers houses the piston 26 and the piston bore 28.
  • the second chamber is the primary pumping fluid chamber 34A that is responsible for transferring the work done by the piston 26 through the pumping fluid to the diaphragm 36, which expands or contracts with the motion of the piston 26.
  • the pumping fluid reservoir 32 stores the pumping fluid that is unused during normal dispense actions, as well as assists in the prevention of air bubbles from entering into the other pumping fluid chambers.
  • the remainder of the pumping fluid resides in the fluid paths connecting the two chambers/one reservoir as well as the valves located along these fluid paths.
  • the integrated pneumatically operated diaphragmatic valves 5 and 8 control the fluid flow from the piston chamber to the other two chambers (see isolation valves 5 and 8).
  • the present invention pump system 20 uses the incompressible pumping fluid as a medium to transmit the motion of the piston 26 to a rigid chamber 34 (Figs. 1 and 1 A) split with an internal Polytetrafluoroethylene (PTFE) diaphragm 36.
  • PTFE Polytetrafluoroethylene
  • the rigid nature of this chamber coupled with the flexibility of the diaphragm 36 causes the portion of the chamber in the pump head (see pump head section) to increase and decrease in process fluid volume proportionally with the pumping fluid volume.
  • the pump head portion of the chamber 34B is filled with process fluid that the user intends to dispense. Since the process fluid is incompressible, fluid flow is affected as the available chamber volume changes.
  • the pump 22 can dispense a variety of chemical fluids.
  • the fluid being dispensed is referred to as the process fluid and the flow of this process fluid is controlled by the pneumatically operated diaphragmatic integrated valves (1 , 2, 3 and 7). These DIVs are located on both process fluid paths connected to the process fluid chamber 34B.
  • Process fluid dispenses are caused by closing DIV 1 and DIV 2 and opening DIV 3 in the line while the pumping fluid flows into the pumping fluid chamber 34A.
  • the pump 22 finishes its dispense procedure by "recharging" the gas removal reservoir 30 from which it made the dispense by closing DIV 3 and opening DIV 1 and DIV 2 while the pumping fluid flows out of the pumping fluid chamber 34A.
  • the head portion 34B of the process fluid chamber has a total of two fluid paths connecting it with an external valve block 40 and the associated gas removal reservoir 30. All fluid paths from the head portion of the process fluid chamber are controlled through the DIV valves.
  • the pump system 20 includes the gas removal reservoir 30.
  • This reservoir 30 is used to prevent air from entering the process fluid chamber 34B of the pump head 22B.
  • the addition of air in the process fluid chamber 34B would induce a delay in fluid flow. Since air is a compressible gas, the air expands and compresses absorbing some of the volumetric changes in the pump head process fluid chamber 34B and prevents the fluid flow from equaling the volumetric change.
  • the fluid path between the associated gas removal reservoir 30 and the process fluid chamber 34B connects the bottom sections of both chambers.
  • the process fluid pools at the bottom of the gas removal reservoir 30 (also referred to as the "pre reservoir") while any air will float to the upper section of the reservoir 30, preventing the inclusion of air in the process fluid chamber.
  • the upper section of the gas removal reservoir 30 is shaped so as to concentrate the rising bubbles to a single point (see Figs. 1 A and 6-6B).
  • the removal of the air bubbles is aided by a process that expels, or purges, a small amount of liquid into the fluid path connected with the uppermost portion of the gas removal reservoir. This fluid path leads to a drain line and is closed during all normal operations of the pump system.
  • the gas removal reservoir 30 has a total of four fluid paths (Fig. 1) connecting it with the process fluid chamber 34B, the drain line, the fluid source FR connection of the pump system 20, and an external valve block 40.
  • the connections to the process fluid chamber drain line and fluid source are routed through the pneumatically operated diaphragmatic valves to control flow. Fluid flow through the fluid inlet from the external valve block is controlled by a valve located in the external block. This means that a separate valve inside to the pump head is not needed.
  • the reservoir's cross sectional area is shaped as a quadrilateral (see Figs. 6-6B) with the bottom face oriented along a horizontal plane, the two parallel sides oriented along a vertical plane and an angled upper face.
  • the intersections of all the faces of the reservoir incorporate a radius to prevent atmospheric bubbles from collecting in the corners.
  • the intersection points of the three fluid paths on the upper face are intended to aid the evacuation of atmospheric bubbles.
  • the source inlet is the lowest to ensure bubbles cannot travel into this connection while the fluid in this path is not moving.
  • the fluid inlet from the external valve block is the next lowest connection. During the startup procedure the fluid traveling through this path will fill the line and carry any atmospheric bubbles out of the path.
  • the highest connection is the drain line.
  • the angled face of the reservoir ensures any air displaced during the startup and purging procedure will collect directly beneath the drain connection.
  • the dispense starts from the pre-charge position and begins when the pump 22 receives a trigger signal.
  • the DIVs 3, 5, 11 and the external dispense valve 9 e.g., the IDI Digital Valve
  • EOD End of Dispense
  • the recharge starts by opening the valve 1 separating process fluid from the source inlet and gas removal reservoir inlet, the valve 2 separating process fluid the chamber and the gas removal reservoir, and the valve 5 separating pumping fluid from the piston chamber 26 and the pumping fluid chamber 34A.
  • the piston 26 moves back to the home reference position (HRP) which creates a negative pressure in the process fluid chamber 34B and "recharges" or fills process fluid from the gas removal reservoir 30.
  • HRP home reference position
  • the gas removal reservoir 30 is fed process fluid through valve 1 that is supplied by the fabrication reservoir FR. All other valves remain closed when the recharge takes place. When the recharge operation is complete all valves are closed.
  • the pre-charge begins after any operation that lets the pump 22 return to a "ready", PS0 status such as after a Recharge or after exiting "Maintenance Mode”.
  • the pre-charge opens valves 2 and 7 and moves the piston forward 26 (down) to push a predetermined amount (e.g., 3 mL) of pumping fluid through the vent line. This action allows the high pressure developed due to valve closures to be pushed out through the source line to lower the pressure and then closes valves 2 and 7.
  • the piston 26 moves forward to begin building up pressure to a user defined pressure (e.g., +1.0 psi). This is done by moving the stepper motor 24E in proportion to the pressure error from actual pressure to desired pressure.
  • a user defined pressure e.g., +1.0 psi
  • the pump 22 returns a ready status and is in a loop checking for pressure fluctuations. If the pump 22 raises or lowers to +/- 15% of the desired pressure, the pump 22 corrects the pressure by moving the piston 26 forwards or backwards to achieve the specified pressure. This action allows the pump to always start the dispense from the same pressure point providing extremely consistent dispense performance.
  • Purge to Vent is an operation that pulls fluid from the source reservoir into the pump 22 and purges the air out of the gas removal reservoir 30 and the source line tube. This operation must be completed while the pump is in "Maintenance Mode", and is accomplished by activating the "Purge to Vent” command from the "Maintenance” window, in the Purge tab of the GUI (of the remote monitoring/control subsystem) or by clicking on the "purge to vent” button in the "Purge” operation drop down list under the "Maintenance” tab of the RMVC subsystem.
  • This command is a manual input that can be specified to run infinitely or to run a specified number of cycles.
  • a cycle includes one purge to the vent line and one recharge.
  • the pump 22 begins this procedure by checking if the piston is at HRP. If the piston 26 is at HRP, then it begins the purge to vent process. If the piston 26 is not at HRP, then the pump 22 recharges until the piston 26 reaches the HRP. This recharge is identical to the standard Recharge procedure discussed previously. Once the piston 26 is at the HRP, the pump 22, with valve 5 open, opens valves 2 and 7 and moves the piston 26 down to the 11 mL mark. The pump 22 then closes valves 2 and 7 and performs a Recharge by opening valves 1 and 2 and moving the piston 26 back to HRP. The pump 22 repeats this process until the designated number of cycles has been completed or until the user stops the operation. Once this operation is done, when complete the pump is ready for the user to exit "Maintenance Mode" which begins the Pre-charge operation.
  • Purge to Output is an operation that pulls fluid from the source reservoir into the pump 22 and purges the air out of the source line tube and the process fluid chamber 34B. This operation must be completed while the pump 22 is in "Maintenance Mode” and is achieved by activating the "Purge to Output” command from the "Maintenance” window, in the Purge tab of the GUI of the RMVC subsystem or by clicking on the "purge to output” button in the "Purge” operation drop down list under the "Maintenance” tab in the RMVC subsystem.
  • This command is a manual input that can be specified to run infinitely or to run a specified number of cycles.
  • a cycle includes one purge to the output or dispenses line and one recharge.
  • the pump 22 begins this procedure by checking if the piston 26 is at HRP. If the piston is at HRP, then it begins the purge to output process. If the piston 26 is not at HRP, then the pump 20 recharges until the piston 26 reaches the home position. This recharge is identical to the standard Recharge procedure from above. Once the piston 26 is at HRP, the pump 26, with valve 5 open, opens valve 3 and moves the piston 26 down to the 11 mL mark. The pump then closes valve 3 and performs a Recharge by opening valves 1 and 2 and moving the piston 26 back to HRP. The pump 22 repeats this process until the designated number of cycles has been completed or until the user stops the operation. When complete, the pump 22 is ready for the user to exit "Maintenance Mode" which begins the Pre-charge operation.
  • the present invention pump system 20 incorporates a filter attachment which helps to reduce trapped air bubbles in the process fluid line.
  • the filter housing is primed by the following procedures. Step 1 : A maximum dispense volume proceeds with piston 26 moving from home position to the furthest position in piston chamber 28; the valve 3 controlling process fluid flow from pumping fluid chamber 34A to filter inlet, the valve 6 controlling the process fluid flow from the filter vent to the external drain line, and the valve 5 separating pumping fluid between the piston chamber 28 and process fluid chamber 34B are open; all other valves including the external digital valve 9 at the dispense line remain closed. This allows process fluid only to pass through the filter housing and exit from the filter vent line.
  • Step 2 The following recharge from the source line takes place with valves 1, 2, and 5 open and valves 3, 4, 6, 7 and 8 remain closed.
  • the external digital valve 9 can be at any state, open or closed.
  • the recharge is at maximum recharge volume with a full stroke motion of the piston chamber 28.
  • the action of step 1 and 2 are repeated until process fluid comes out of the filter vent line without air bubbles.
  • PPRM3 (Prime filter substrate; Figs. 23A-23B):
  • the filter substrate 42 has to be wetted for proper operation of the filter and to remove all of the air from the filter can be primed via the following "prime filter substrate” function.
  • the filter substrate 42 can be primed by the following steps. Step 1 : Valves 3, 4, 5, and 7 are open; valves 1, 2, 6, and the external digital valve 9 remain closed. That allows process fluid to enter into the filter 42 from the process fluid chamber 34B and to emerge from the filter 42 via the filter output port and into the pump filter recirculation line. The process fluid in the recirculation line then enters into the gas removal reservoir 30 and continues through the gas removal reservoir vent/ drain line.
  • Step 1 is repeated one more time, for a total of two times.
  • the next operation of the PPRM3 functions executes is step 2.
  • Step 2 starts by opening DIV 3, 4, 5, and 7 (Fig. 11 A) and closing DIV 1, 2, 6,8 and valve 9 and pushes 1 lmL of process fluid into the filter 42 from the process fluid chamber 34B.
  • the process fluid then exits the filter out of the filter output port and continues into the recirculation line, which leads back to the gas removal reservoir 30 while air is pushed out of the process fluid vent/drain.
  • the pump then "recharges from gas removal reservoir 30" by opening DIV 2, 5 and 7 and closing valves 1, 3, 4, 6, 8 and 9 and retracting the piston from EOD to HRP.
  • Step 2 is repeated three times, which recirculates the fluid and helps accumulated air from the filter in the gas removal reservoir 30.
  • the gas removal reservoir 30 expels the air out of the gas removal reservoir vent/drain in all three steps.
  • Step 3 repeats step 1 four times. This step is programmed to be repeated at least four times to ensure process fluid comes out the filter output line without the presence of air bubbles. If the filter has air bubbles present, the user can input the command until no air is seen exiting the filter output line.
  • the pump system 22 arrives on location containing only the pumping fluid housed in the pump body 22A.
  • the initial filling and priming process helps to fill the flow path of user's desired processing fluid.
  • This process requires a pre-existing fluid source with a pressurized BIB at the inlet of the pump 22, a Fab reservoir FR with a Fab reservoir vent/drain valve 14, and an optional external dispense valve (external digital valve 9) to provide more customizable dispense control at the outlet of the pump.
  • the user connects the fluid lines to the pump system 20. This includes the line from the process fluid source FR to the pump inlet, the fluid outlet lines to the point of external dispense valve, and the external track drain line from the pump system filter vent and gas removal reservoir drain.
  • the pressurized nitrogen (or dry air) line and the vacuum line need to be connected to pump system 20 for valve controlling.
  • the initial filling and priming is followed by completion of pump auto-balance.
  • the initial filling and priming process begins with the user starting the software process for this operation. There are two scenarios in the customers' location:
  • Scenario 1 The first scenario is that the BIB is pressurized.
  • a track reservoir i.e. , Fab reservoir FR
  • the pump controller 38 first closes the Fab reservoir vent/drain valve 14 and valve 1 located in the flow path between the initial source and the pump inlet; fluid is then pushed into the Fab reservoir FR by the pressurized BIB.
  • the pump controller 38 opens the following valves: the valve 1 isolating the internal gas removal reservoir from the source inlet, the valve 2 isolating the gas removal reservoir 30 to the process fluid chamber 34B, the valve 3 isolating the process fluid chamber 34B from the external valve block flow path connected with the filter fluid inlet, the valve 5 separating pumping fluid from the piston chamber 28 and process fluid chamber 34A, and the external point of the dispense valve.
  • valves are closed to direct the fluid through the desired path: the Fab reservoir drain/vent valve V FAB , the valve 7 isolating the gas removal reservoir 30 from the drain line, the valve 6 controlling the flow from the filter vent to the external drain line, and the valves 4, 6 and 10 controlling fluid flow from the filter outlet back to the gas removal reservoir 30.
  • the user controls the closing of the open valves to accommodate the varying time required to fill the pump system 20 and attached tubing.
  • the varying time required to complete this process is a result of the varying internal total volume of the tubing connecting the pump system 20 with the initial fluid source FR and point of dispense as well as the varying flow rates. These rates are functions of such fluid characteristics such as density, viscosity, and temperature. Other factors with limited effect would be the density of the surrounding air and the flow rate of the external point of the dispense valve.
  • valves 3, 4, and 5 are opened to dispense into the gas removal reservoir 30 while all other valves stay closed.
  • the maximum recharge from the source line is the following action by opening valves 1 , 2 and 5. This serial action ends when the automated pressure feedback in the pumping fluid reservoir 32 meets the pressure criteria in the gas removal reservoir 30. Then the filter change routine and recirculation operation are required.
  • the pump system housing can be directly filled by the same procedures without filling the Fab reservoir FR first.
  • Scenario 2 The second scenario is that the BIB is not pressurized and a Fab reservoir FR is in place between the initial source and the present invention pump system 20.
  • the pump system 20 and Fab reservoir FR need to be filled by pump system 20 itself. It starts from a maximum dispense to the point of the external digital valve by only opening valves 3 and 5, and the external digital valve 9. Then it is followed by a maximum recharge from the source line by only opening valves 1 , 2 and 5.
  • This serial action ends when the Fab reservoir FR is filled and process fluid comes out of the dispense tip. Afterwards, valves 3, 4 and 5 are opened to dispense into the gas removal reservoir 30 while all other valves stay closed.
  • the recharge from the source line will be the following action by opening valves 1, 2 and 5. This serial action ends when the automated pressure feedback in the pumping fluid reservoir 32 meets pressure criteria in the gas removal reservoir 30. Then the filter change routine and recirculation operation are required.
  • the pump system housing can be directly filled by the same procedures without filling the Fab reservoir FR first.
  • a description of the maintenance operations of the pump system 20 is as follows:
  • the pump system 20 incorporates a fluid recirculation function to reduce the process fluid waste during the process of purging any air from the interior of the pump 22.
  • This function allows the user to reduce the total cost of ownership for the pump system 20 through reducing the fluid consumption during purging as well as allowing the pump system 20 to periodically internally recirculate the fluid.
  • the ability to periodically recirculate the process fluid reduces the possibility fluid could become static in the tubing, preventing the fluid from congealing or drying and thus causing stoppages.
  • the internal fluid recirculation in the pump system 20 begins with the piston 26 at the HRP.
  • the pump controller 38 opens the valve 3 controlling flow from the process fluid chamber 34B to the filter inlet, the valve 4 controlling the flow from the filter return outlet to the gas removal reservoir, and the valve 7 controlling flow from the gas removal reservoir to the drain line.
  • This valve must be open to allow the recirculated fluid to fill the reservoir 30 and displace any air or other gases out of the drain line. All other valves must remain closed.
  • the pump controller 38 performs a maximum volume dispense, closes the open valves, and opens the valve 2 controlling flow from the gas removal reservoir 30 to the process fluid chamber 34B and the valve 7 controlling flow from the gas removal reservoir 30 to the drain line. During the entire recirculation process the point of dispense valve must remain closed.
  • the internal fluid flow traps any atmospheric bubbles in the gas removal reservoir 30 or the filter 42 near the drain connections.
  • the pump 22 displaces process fluid into the gas removal reservoir 30, and the collected bubbles of air or other gases along with a small amount of process fluid will be forced into the drain line. This process will occur twice, once to purge the filter vent and again to purge the gas removal reservoir 30.
  • the valve 3 controlling flow from the process fluid chamber 34B to the filter inlet, and the valve 6 controlling flow from the filter to the drain line open while all other valves remain closed.
  • the two open valves will close, and the valve 1 from the process fluid source FR to the gas removal reservoir 30 and the valve 2 between this reservoir 20 and the process fluid chamber 34B will open to allow the piston 26 to recharge from source.
  • the valve 2 controlling flow from the process fluid chamber 34B to the gas removal reservoir 30 and the valve 7 controlling the flow from the gas removal reservoir 30 to the drain line will open. All other valves will remain closed.
  • the two open valves will close and the piston 26 will recharge from the source.
  • the pump 22 also allows for electronics replacement with ease.
  • the electronics enclosure is completely self-contained and can be easily removed by simply disconnecting the cables and pulling the box out.
  • the user needs to disconnect five external connections. Two RJ45 connectors, one serial connector, one power connector and then, once these operations have been completed, the user can then disconnect the DB44 connector to disconnect the electronics enclosure 23 from the pump body 22A itself.
  • the enclosure 23 can now be slid upward and out to disconnect the box from the mount and can be taken out of the cabinet.
  • a new electronics enclosure 23 can now be installed by reversing the removal procedure.
  • the pump head housings including the process fluid chamber 34B and gas removal reservoir 30, need to be emptied by running the "System Drain" function. This operation allows the user to nearly empty the process fluid in the process fluid chamber and gas removal reservoir. Hence, the pump head22A can then be removed by unscrewing six screws on the back plate.
  • the user needs to be careful to keep the PTFE head (white) and the back plate (stainless steel) pressed together and removed as one unit. The screws are also to be kept together as one with the pump head 22B.
  • the pump head 22B with six screws can be slowly taken off from the pump body 22A, and the pump head block 78 should be held tightly while it is taken off with a backwards tilted angle; the user needs to be prepared for a small amount of process fluid residuals in the process fluid chamber 34B and gas removal reservoir 30 to leak out.
  • Fig. 6 Users can change all the components on the pump head 22B (Fig. 6), including the pump head block 78, pump head O-ring 207, flare fitting 47, flare fitting cap 350, set screws 111, head diaphragm 84, pump head pneumatic plate 80, pneumatic quick disconnect 95, screws 99, gas removal reservoir O-ring 281, valve O-rings 117, mounting foot 261, and elbow fitting 93. All the tubing connected to the gas removal reservoir 30 can also to be replaced/changed. The user can change one item or multiple items when the pump head 22B is taken off, or the complete pump head 22B can be replaced. An auto-balance cycle must be run after the pump head 22B is reinstalled since the pressure in the pump system 20 will be affected by the change.
  • the pump head 22B needs to be emptied using the "System Drain” function.
  • the pump head 22B needs to be removed as described in the "pump head in track removal/repair/replacement” section.
  • the pump 22 needs to be put in the special maintenance mode as described in the "in track drive assembly change” section that allows pumping fluid only to be able to transfer between the piston chamber and pumping fluid reservoir 32 to isolate the pumping fluid chamber 34A.
  • the user needs to take off the bleed screw from the bleed screw port BP2 to the pumping fluid chamber 32. Then using the provided syringe (Fig.
  • the pumping fluid chamber diaphragm hold down plate 64 (Fig. 4) can be removed by unscrewing all the screws 66.
  • the user needs to tilt the pump body 22A in order to keep residual pumping fluid at the bottom of pumping fluid chamber 34A and reduce leaking.
  • the user needs to be aware of the residual pumping fluid around the diaphragm and be prepared for a small amount of leaking.
  • bleed screw 52E on the pumping fluid chamber 34A bleed screw 52E on the pumping fluid chamber 34A, pumping fluid chamber O-ring 211, pumping fluid chamber diaphragm 36, pumping fluid chamber diaphragm hold down plate 64, and screws 66.
  • the user needs to fill up the process fluid chamber 34B with the provided syringe (Fig. 13) and reuse the pumping fluid from the pumping fluid chamber 34A. Slowly inject pumping fluid to the pumping fluid chamber 34A through bleed port BP2 (Fig. 4) until the pumping fluid appears to overflow from bleed port BP2.
  • the bleed screw 52E needs to be installed back on the process fluid chamber 34B. After the pump head back is reinstalled onto the pump body 22A, the special maintenance function needs to be disabled as described in "in track drive assembly change" with closing valve 8 and opening valve 5 . That allows the pump system 20 back to regular maintenance mode.
  • the pump system 20 is required to run an autobalance after a pumping fluid chamber diaphragm 36 replacement and after a process fluid chamber diaphragm 84 replacement.
  • pressure sensor PS calibration is to set a default "zero" pressure when the pump internal pressure is equalized to atmospheric pressure.
  • the pressure sensor PS needs to be calibrated when pumping fluid reservoir bleed port BP1 is uncapped and all valves in fluid path are open. Place the unit in maintenance mode. All valves can be opened by typing "VON 1 , 0" in command input line in the GUI. Then the pressure sensor default can be set through the GUI recipe page. Thus, the user can set default “zero” pressure through “set pressure to zero” feature in the GUI. This operation is essential since many operating locations will have different atmospheric pressures than the manufacturing location and this allows for the pump 20 to be calibrated for that particular locations ambient atmospheric pressure.
  • the Recirculation feature (see Figs. 16A-16B) of this pump 20 is a feature that helps reduce the air in the tubes that forms from various places (such as in the filter) and allows for a small circulation system to permit fluid movement while the dispense portion of the pump is idle. This feature may be turned on or off as designated by the user.
  • the Recirculation feature is activated or deactivated while the pump is in "Maintenance Mode” and is completed by selecting the "enable” or “disable” command from the "Maintenance" window, Recirculation tab of the GUI or by the RMVC subsystem.
  • valve 4 for the recirculation line is closed (on the Filter Block 40) and process fluid moving out of the process fluid chamber 34B and into the filter 42 simply continues on its path in the dispense tube.
  • the pump 20 opens valve 4 during a dispense and keeps the external valve closed. This operation opens valves 3, 4, 5, and 7 to allow for dispensed process fluid to move into the gas removal reservoir 30. With valve 4 open, there is a back pressure due to the incompressibility of the fluid which does not allow the fluid to continue in the dispense tip path and the fluid is then forced into the recirculation line.
  • the fluid dispensed during recirculation is "dispensed" into the gas removal reservoir and displaces the air pocket that is kept in the gas removal reservoir.
  • Valve 7 is opened as well to allow for the displacement of air as the process fluid is forced into the gas removal reservoir 30.
  • the pump 22 "recharges” from the gas removal reservoir 30 by opening valves 2, 5, and 7 filling the process fluid chamber 34B with the same volume of liquid that was pushed into the gas removal reservoir.
  • the system 20 has a drain feature (Figs. 24A and 24B) that is used in the draining of the pump of process fluid to allow for certain maintenance functions to occur.
  • a drain feature Figs. 24A and 24B
  • the filter must be discarded. This operation removes most of the fluid that is stored in the gas removal reservoir 30, the process fluid chamber 34B and the recirculation line, but there will be some residual fluid in the pump 22.
  • the filter 42 will still hold some of its volume amount of fluid.
  • the System Drain function is activated or deactivated while the pump is in "Maintenance Mode" and is completed by entering the command SDRN1 to enable or SDRN1 to disable.
  • the user Before the SYSTEM DRAIN can be completed, the user must disconnect and cap off the source line from the pump to allow for the introduction of air into the pump system.
  • This function begins the pump is a user-operated loop that drains the pump of process fluid. This operation begins with a purge to output operation to the full 11 mL by opening valves 3 and 5, external dispense valve such as the LP Digital Valve 9. Once the pump 22 has completed this dispense it closes valves 3 and 5 and the external valve. The pump then "recharges" from the gas removal reservoir 30 by opening valves 1 , 2 and 5 and pulling in 11 mL of air.
  • the pump continues with the system drain operation by closing valves 1 , 2 and 5 and opening valves 3, 4, 5 and 7 to push fluid out of the recirculation line into the gas removal reservoir.
  • the pump then closes valves 3, 4, 5 and 7 and opens valves 2, 5 and 7 and pushes fluid out of the gas removal reservoir drain line and then closes valves 2, 5 and 7.
  • This series of operations is repeated until the user disables the System Drain function. This function removes process fluid from the pump 22 allowing for the removal of the pump head 22B.
  • This ship function is a feature programmed into the pump 20 which is used to remove all air from all of the pumping fluid chambers and reservoirs. This function is to be used during assembly and operates by pushing all of the pumping fluid from the piston chamber 28 to the pumping fluid reservoir 32. This operation is completed by the user removing the bleed screw BP 1 on the pumping fluid reservoir 32 and inputting the command "SHIP 1 ". This command opens valve 8 and advances the piston downward to the 11 mL end of dispense (EOD) mark. This moves the piston 26 to the bottom of the piston chamber 28 while pushing the pumping fluid to the pumping fluid reservoir 32 and pushing the air in the pumping fluid reservoir 32 out of the pump. The user will see a little bit of pumping fluid emerge from the pumping fluid reservoir 32. The user then caps the bleed port BPl on the pumping fluid reservoir with the bleed screw and the pump body now is void of air and is ready for shipping.
  • EOD 11 mL end of dispense
  • the pump 22 arrives on location to the user with the pump body completely filled with pumping fluid and void of any air. The user then installs the pump 22 into the track system and remove the pumping fluid reservoir bleed port screw.
  • the pump inlet needs to be connected with users' fab reservoir outlet or the in track reservoir outlet if it is provided.
  • the pump outlet needs to be connected to the lab dispense outlet and an external digital valve 9 if it is provided.
  • the external drain line needs to be connected from filter drain line to an outlet in the fab.
  • This process pulls 11 mL of air into the pumping fluid reservoir 32 and then continues with its auto balance processes.
  • the pump 22 has completed the auto balance, (bearing in mind that this is where the user may need to perform a pressure sensor calibration since arm pressure is different at different altitudes) the user can now cap the pumping fluid reservoir bleed port BPl . At this point, the pump 22 is ready to complete the priming procedures and is close to being operational.
  • the pump system 20 also allows users to customize the overpressure setting for the pressure alarm according to operation pressure at the users' location. Users can also set the duration for the over pressure alarm. Users can input the command " OVRPd,x" into the command line in the IDI or LYNX GUI for this purpose, “d” is the overpressure duration in ms. Users can set the value between 0 and 999 ms. “x” is the pressure limit to trigger the pressure alarm. There are two pressure values users can use; one is 28psi, which can be represented by "1"; the other is 50psi, which can be represented by "0". For example, "OVRP125,l” sets overpressure duration to 125 ms @ 28psi.” Changing the motor/piston assembly (Drive Assembly Change)-Fig. 26
  • the pump system 20 includes the ability to remove and replace the mechanical drive assembly 24 with inside without breaking the flow path.
  • this drive assembly 24 (Figs. 8-9) comprises the electrical DC motor 24E, lead screw 24G, piston 26, Polytetrafluoroethylene (PTFE) wiper ring 191 and accompanying hardware.
  • the accompanying hardware includes the guide bearing 24F, anti-rotation flag 56, bolts 24A-24D for holding down the motor 24E and piston O-rings 74,.
  • the drive assembly 24 replacement is designed to take place with minimal disturbance to the pump system 20.
  • Drive assembly replacement requires the removal of the enclosure, the four motor mount bolts, motor power plug, and the pumping fluid reservoir bleed port BP 1 screw.
  • the drive assembly replacement process allows the drive assembly to be removed, repaired, and replaced without disturbing the process fluid flow path. This eliminates the risk of exposing the process fluid chemicals to air and other contaminants, and reduces the amount of process fluid and amount of requalification time needed to release the tool back into production.
  • the drive assembly replacement process begins when the user enters the drive assembly change procedure in the connected software of microcontroller 38.
  • drive assembly replacement can be accomplished depending on the pump operation program interface: using the GUI or by using the RMVC subsystem operational interface
  • the pump 22 needs to be put in maintenance mode, which allows valve 5 to separate pumping fluid from the piston chamber 26 and process fluid chamber 34B to be open.
  • This allows the pump 22 to enter into a special maintenance mode while closing valve V5, separating pumping fluid from the piston chamber 28 and pumping fluid chamber 34A.
  • the user needs to activate the push button switch 25A (Fig. 3), which is attached onto the PCB pressure board 48, to the "ON" position to open valve 8. That allows an open flow path for pumping fluid between the piston chamber 28 and pumping fluid reservoir 32.
  • the pumping fluid reservoir bleed port screw for port BP 1 needs to be removed. User needs to install the provided syringe (Fig.
  • the new or repaired drive assembly with the piston located at the home position can be slowly inserted into the piston chamber 26.
  • the assembly should be oriented with the conical portion 76 of the piston 26 facing downward into the piston bore 28.
  • the motor 24E should be oriented so that the wires that connect the motor to the pressure PCB 48 are located just above the pressure PCB 48.
  • the piston 26 should be oriented so that the anti-rotation flag 56 easily fits into the clearance channel and the conical section of the piston is centered in relation to the piston bore when the drive assembly is held vertically (electrical drive motor 24E on top and piston 26 facing straight downward).
  • the drive assembly 24 should be lowered until the conical section of the piston 26 is inside the piston bore 28 and the drive assembly 24 is resting on the lower (furthest from the electrical drive motor) O-ring 74.
  • the conical shape 76 of the piston 26 causes the pumping fluid and air to be displaced and the fluid level rises to completely fill the volume below the lower O-ring 74.
  • RMVC Remote Monitoring, Viewing & Controlling
  • the user can click on the "Disable Motor Change” tab. This closes valve 8 and opens valve 5. The user then clicks on the "Autobalance” tab to assist the piston 26 back to the home reference position HRP. Upon completion of the auto-balance procedure, the user needs to reinstall the pumping reservoir bleed screw back onto the pumping reservoir bleed port BP 1.
  • the procedure indicates if air is in the piston chamber 28 after the drive assembly change.
  • This gas detection sequence simply indicates to the user that if the system was void of air prior to the drive assembly change and if air is detected in the system after the drive assembly change, then the air was introduced during the drive assembly change itself. If the Gas in Piston Chamber Detection procedure detects air in the system after a motor assembly change, the user must re -run the drive assembly steps to ensure that there is no air in the piston chamber 28.
  • a filter 42 is replaced by the user simply lifting up the release lever of the filter bracket and sliding out the old filter. The user slides in a new filter 42 and pushes down on the release lever which fixes and seals the filter 42 in place. The user then runs the PPRM2 and PPRM3 operations to fill and prime the filter housing and substrate and purge the filter of air.
  • the pump system 20 incorporates an auto-balancing (see flow chart in Fig. 17) to equalize the pressure in the pump head(s) as well as to correct any inconsistency in the amount of fluid contained in the process fluid chamber(s) when the pump is in an "at-rest" position.
  • This function allows the user to perform many maintenance functions without requiring the removal of the pump from the enclosure or the removal of the lower enclosure from its mounted position.
  • This function also allows the pump to maintain a repeatable volume of fluid into the process fluid chambers, allowing for better control of the dispense characteristics of the pump and to prevent the possibility of damaging operations from occurring.
  • the auto-balancing process every time power is applied to the pump or with the user starting the software process for this operation.
  • the Auto-Balance begins its operation by checking if the piston is in the HRP. If the piston is not at HRP, the pump then opens valve 8 and pulls the piston 26 back to HRP while pulling pumping fluid out of the pumping fluid reservoir 32. Once the piston is at HRP or if the piston 26 was originally at HRP, then the auto balancing procedure continues.
  • the pump 20 then begins the next step by opening valve 8 and moving the piston 26 forward to push 4 mL of pumping fluid into the pumping fluid reservoir 32.
  • the pump 20 then closes valve 8 and opens valve 5 (the two isolation valves) and begins to retract the piston 26 to HRP while monitoring the pressure on the pressure sensor PS.
  • the pump 20 stops if a pressure reading of negative 4.0 psi is detected or when reaching the HRP.
  • the pump 20 If the pump 20 reaches a pressure of negative 4 psi, then the pump 20 continues with the auto balance, but if the pump reaches the HRP without reaching the desired pressure, then the pump 20 repeats the process of pushing fluid into the pumping fluid reservoir 32 via valve 8 and then closing valve 8 and opening valve 5 and recharging from the pumping fluid chamber 34A until the desired negative pressure is reached. Once the desired pressure is reached, it closes valve 5 and opens valve 8 and returns the piston 28 to HRP pulling pumping fluid from the pumping fluid reservoir 32 and then closes valve 8. The pump then opens valve 5 and moves the piston 26 forward to push 1.5 mL into the process fluid chamber 34B and stops. The pump 20 then closes valve 5 and opens valve 8 and returns to HRP. At this time, the pump 20 is finished with the "Auto Balance" and has done all of the procedures needed to keep a consistent amount of pumping fluid into the pumping fluid chamber 34A.
  • the head auto-balancing process begins with the user starting the software process of the microcontroller 38 for this operation.
  • the pump controller 38 prompts the user to remove the pumping fluid reservoir bleed port screw from the universal elbow fitting located on the upper front face of the pump 22 (side of the pump body located farthest from the enclosure mounting bracket) at the port BP1.
  • the pump controller 38 then opens the isolation valve 8 separating the piston chamber 28 from the pumping fluid reservoir 32.
  • the pump controller 38 via the motor drive assembly 24, then drives the piston 26 to the end of the dispense position (the farthest position from the at-rest home position, equal to the position stopped at during an 11ml dispense) effectively emptying the piston chamber 28 of fluid.
  • the pump controller 38 then closes the isolation valve 8 separating the pumping fluid reservoir 32 and the piston chamber 26 and opens the isolation valve 5 separating the piston chamber 26 and the process fluid chamber 34A.
  • the pump controller 38 drives the piston 26 to enter a slow recharge movement towards the home position while the pump controller 38 continually monitors the pressure.
  • the pressure transducer PS detects that the pressure in the chamber 28 is at atmospheric pressure (0 psig) the pump controller 38 continues to recharge, but at a reduced velocity.
  • the piston 26 continues to return to the home position at the reduced rate until the pressure transducer PS detects a sufficiently negative pressure (negative pressure refers to the pressure differential between the internal pump body pressure and local atmospheric pressure; this is not a user variable).
  • negative pressure refers to the pressure differential between the internal pump body pressure and local atmospheric pressure; this is not a user variable.
  • the piston 26 begins to dispense at the same reduced velocity it recharged by.
  • the pressure transducer PS again continually monitors the internal pump body pressure as the piston 26 dispenses. Once the pressure transducer PS indicates the internal pump body pressure equals atmospheric pressure, the piston 26 then stops.
  • the isolation valve 8 separating the piston chamber 28 and the pumping fluid chamber 32 closes and the isolation valve 8 separating the piston chamber and the pumping fluid reservoir 32 opens.
  • the piston 26 then returns to the home position, pulling fluid from the pumping fluid reservoir 32. Once the piston 26 has returned to the home position, all valves close and the pump controller 38 prompts the user to replace the pumping fluid reservoir bleed port screw at the port BPl to seal the pumping fluid reservoir 32.
  • the dispense detection feature is intended to detect many of the common causes of wafer coating problems, including:
  • Dispense detection works by comparing the pressure profile for each dispense to a reference pressure profile. If the two profiles do not match within a user selectable sensitivity, the pump generates an alarm.
  • the event log records each time a new reference profile is saved.
  • the user begins running dispenses; the dispense detection is set and runs to record the Golden Sample after any change to a recipe. Once a Golden Sample is stored, any dispense that deviates by more than a user programmed percentage and number of counts out of the limits will stop the pump 20 and trigger an alarm.
  • Dispense Detection may be used with pressure sensor PS (or, e.g., Isense that models pump pressure based on motor current) providing the pressure profile data.
  • stepper motor driver sense resistors Fig. 14
  • Each phase is half-wave rectified with an active rectifier.
  • the rectified signals are then summed and integrated.
  • Stepper noise is removed with an envelope detector.
  • the resulting signal is dc amplified and voltage translated such that the voltage window of interest is translated to the maximum limits of the A/D converter. This allows utilization of the maximum resolution of the A/D.
  • Initial calibration is done by running the motor at each operating rate & storing the unloaded "baseline" A/D value.
  • Motor load is obtained by subtracting the baseline from the present sample. This yields a value proportional to the motor load. This value is gain corrected for any nonlinear & rate related artifacts.
  • a dispense alarm occurs when any dispense deviates, from the reference dispense, by more than a user programmed percentage and number of counts out of the limits.
  • Figs. 15 and 15A depict an alternative embodiment of the precision pump system 20 that includes additional DIV valves (10-13) and venturi that permit the recovery of process fluid entrained within the filter 42 during a filter recirculation process.
  • additional DIV valves (10-13) and venturi that permit the recovery of process fluid entrained within the filter 42 during a filter recirculation process.
  • process fluid entrained within the filter 42 is also discarded too.
  • valves 10 and 11 it is possible to remove the trapped gas from the filter but to recirculate the trapped process fluid from the filter 42 back to the gas removal reservoir 30.
  • Fig. 15B is provided which depicts the sequence of valves utilized to effect the FVR process.
  • the first step is to determine whether the piston is at HRP and if it is, valves 1, 3, 5 and 10 are opened to advance the piston to displace l lmL of process fluid; if the piston is not at HRP, a recharge operation (Fig. 18) is performed first to establish HRP and then valves 1, 3, 5 and 10 are opened to displace the predetermined l lmL of process fluid. Once that amount is displaced, those four valves are then closed and a recharge operation is performed.
  • a nitrogen N 2 source is coupled to the top of the gas removal reservoir 30 via a DIV valve 12.
  • the pump controller 38 can permit a predetermined amount of nitrogen to form a gas head within the gas removal reservoir 30. This N 2 is pre-filtered before being delivered to the valve 12 and then to the gas removal reservoir 30 at a regulated 20 psi.
  • the gas detection algorithm is required to automatically prime the filter 42, and the gas volume detection algorithm is important for operation with the gas removal reservoir 30. See Figs. 27A-27B for Gas in Filter Detection Algorithm; Figs. 28A-28B for Gas in Piston Chamber Detection Algorithm; and Figs. 29A-29B for Gas Volume in Gas removal reservoir Detection Algorithm.
  • Gas detection algorithm typically used to determine the presence of gas in the filter system, but can also be used to test for the presence of gas after the motor change feature
  • dp/dx rate of change of pressure
  • dp/dx > 5 typically indicates no presence of gas in the system
  • dp/dx > 5 typically indicates no presence of gas in the system
  • the system is determined to not have any gas present. 6.
  • a pressure alarm within a 1 Oth of a milliliter of equivalent distance traveled would also indicate there is no gas trapped in the system.
  • the optimal value can be empirically determined based on the physical makeup of the system.
  • Gas volume detection algorithm (typically used to determine the volume of gas in the gas removal reservoir 30)
  • a pressure alarm within a 1 Oth of a milliliter of equivalent distance traveled would also indicate there is no gas trapped in the system.
  • the optimal value can be empirically determined based on the physical makeup of the system.
  • the one milliliter displacement test determines that there is 20 mL or greater of gas in the system then another test can be run with a larger displacement to get a more accurate determination of the exact volume of gas trapped in the system.
  • the pump will take some amount of time to equalize back to the appropriate precharge pressure.
  • -gas removal reservoir having an inlet for a nitrogen blanket (low pressure supply of nitrogen that is process filtered); see also Fig. 15 A.
  • -there is a check valve on the gas removal reservoir drain line biased to only allow flow out of the gas removal reservoir.
  • This check valve can be located upstream or downstream of a typically located drain valve; -there is a venturi supply vacuum to pull fluid out of the drain line, or it may be needed to overcome any pressure differential that would tend to push fluid back from the drain line into the gas removal reservoir.
  • the venturi has a nitrogen supply that also has a valve to turn off or turn on the nitrogen supply so that the venturi is not running all of the time.
  • Fig. 30 provides an overview of the major features of the present invention 20, which are also discussed below.
  • a reservoir associated with the pump wherein the valves and any associated fluid control components for the reservoir are controlled by a microcontroller or other device that is in communication with or whose activities are coordinated with any controlling system associated with the pump.
  • This pump has a distinct advantage to others in the field when it comes to maintenance downtime.
  • the use of a diaphragm pump with a pumping fluid and the ability to access a reservoir of this pumping fluid allows the pump 20 to move the fluid between chambers, if needed for repairs.
  • the user can change the filter, process fluid chamber diaphragm, or isolation valve on one output without affecting the others.
  • the drive system can be easily replaced without the user needing to take the pump out of the coater/developer. This is made possible by the use of the pumping fluid reservoir and the conical piston head shape.
  • the electronics enclosure is another item that can easily be replaced in the coater/developer.
  • the wiring harness simply unplugs from the pump enclosure allowing it to remain in the coater/developer undisturbed while the electronics enclosure is replaced. It is also possible to change a pump head in the coater/developer as it can be drained of all process fluid and removed. Once the new head is attached to the pump body the system can be auto balanced and returned to production without breaking the flow path.
  • the pump system 20 has the ability to detect and alert the user to a wearing system part. Different wear parts will cause different recognizable patterns in the dispense profile. The system will recognize these and alert the user of the need to replace the identified troublesome part. These parts include the drive system, the integrated diaphragmatic valves, and the filter.
  • the pump system has the ability to detect a good dispense by studying the profiles of the dispenses made. It alerts the user if a dispense is outside of the tolerance set by the user.
  • the system also displays a graphical view of the data collected and how it compares to the baseline data set during the first dispense under the current dispense configuration.
  • the present invention is directed to achieving zero loss of process fluid by recirculating unused or undispensed process fluid to the gas removal reservoir 30.
  • the gas removal reservoir 30 removes any gases (viz., air) that passes through the filter.
  • the process fluid source inlet is positioned on the roof of the gas removal reservoir where the side wall meets the roof on the shorter vertical side.
  • the purpose of the source inlet's position is to allow for the process fluid to enter into the gas removal reservoir at an angle near the side edge which allows for the process fluid to smoothly run down the wall of the gas removal reservoir instead of dripping from the top of the reservoir, which can cause the capturing of air as the fluid falls.
  • any gas that is generated i.e., if the vapor pressure barrier is exceeded
  • any gas that was generated by the filter will be removed before exiting the reservoir.
  • a gas/liquid interface inside the gas removal reservoir must be maintained.
  • the amount of N2 and/or fluid can be managed within the reservoir with a program that measures the pressure exerted by the pump when pushing back to the gas removal reservoir, or by using a fluid level sensor (LLS), optical sensor, float sensor, flow meter, pressure sensor/meter, weight measurement device, visual, camera system, or any other means of determining the amount of fluid in the gas removal reservoir.
  • LLS fluid level sensor
  • optical sensor optical sensor
  • float sensor float sensor
  • flow meter pressure sensor/meter
  • weight measurement device visual, camera system, or any other means of determining the amount of fluid in the gas removal reservoir.
  • the filter and plumbing needs to be wetted with fluid.
  • One of the concerns was over the loss of liquids during this process.
  • the system was designed around a (PRNTP) that will recirculate the liquid and remove any air that was in the system to start with or being generated by recirculation of normal filter venting.
  • PRNTP a small vacuum (negative pressure) could be applied to further aid or speed up the air/liquid separation.
  • the key to reducing liquid waste in the dispensing system is the ability to keep a prescribed amount of air/N2 in the (PRNTP) to allow for fluid to reenter the closed system, which is accomplished by allowing air/N2 to enter the (PRNTP) and/or making sure that there is sufficient air/N2 in the (PRNTP) .
  • the (PRNTP) also allows for any fluid released during normal venting of the filter to be sent back to it, thus keeping with a near zero loss of liquid objective.
  • Air/N2 can be added to the system by adding a pressurized line, a pressurized regulated line, open air, vent or drain line.
  • Some of the ways that the amount of air/N2 and/or liquid can be managed are with a program that measures the pressure exerted by the pump when pushing back to the (PRNTP), using a liquid level sensor (LLS), optical sensor, weight measurement device, float sensor, flow meter, pressure sensor/meter, visual, camera system, or any other means of determining the amount of fluid in the (PRNTP).
  • LLS liquid level sensor
  • OLS optical sensor
  • weight measurement device float sensor
  • flow meter pressure sensor/meter
  • visual, camera system or any other means of determining the amount of fluid in the (PRNTP).
  • Steps 1) through 4) are repeated until the filter is completely wetted.
  • steps 1) through 3) are performed.
  • Step 5) opens valves 3 and 10 are opened and the pump head moves in a direction that will generate a positive pressure pushing air out of the filter (to the filter drain).
  • Step 6) runs a program to determine if there is any air left in the filter, and then all valves are closed. Steps 1) through 3) and steps 5) through 6) are repeated until all air has been removed from the filter. To fill the (PRNTP) to the prescribed level, Steps 1) through 3) and steps 5) through 6) are repeated until completed.
  • Step 7) closes all valves and then valves 1 and 2 are opened.
  • the pump head moves in a direction that will generate a vacuum drawing fluid into the pump head. All valves are closed and then valves 3, 11 and 9 are opened.
  • the pump head moves in a direction that will generate a positive pressure pushing fluid out the dispense tip.
  • step 7) until all air is removed from the dispense line. This procedure allows for minimal if any loss of liquid during the startup phase, filter change, and/or normal dispense (where air is removed/vented from the filter on a predefined, automated, or manual schedule).
  • post filtration can be obtained as shown in the Gas removal reservoir Near The Pump (PRNTP) description where the filter is between the pump and the dispense tip.
  • PRNTP Gas removal reservoir Near The Pump
  • Fig. 31 depicts an alternative configuration wherein the filter is located before the gas removal reservoir 30 as well as the recirculation upstream of the filter 42.
  • the recirculation returns to a point upstream of the filter and downstream of an isolation valve.
  • process fluid is pulled from the pumping chamber 34 through the filter 42 and into the gas removal reservoir 30.
  • a venturi on the gas removal reservoir drain can be used in combination with the gas volume detection system to fill the gas removal reservoir from the filter 42.
  • the gas removal reservoir 30 provides an extra degassing benefit from liquid being pulled through the filter 42.
  • precise control of the recharge rate can also mitigate any gas introduction.
  • Fig. 32 depicts another configuration wherein the filter 42 is located after the gas removal reservoir 30 and the recirculation is located either upstream of the gas removal reservoir 30, or downstream of the gas removal reservoir (the latter alternative indicated by the valved path shown in phantom).
  • the recirculation line is coupled to a point upstream of the gas removal reservoir 30 and downstream of a closely-associated valve.
  • Process fluid is pulled through the filter 42 directly during a recharge of the pump.
  • the valved path shown in phantom in Fig. 32 is implemented, the recirculation line is coupled to a point upstream of the filter 42 and downstream of the gas removal reservoir 30 and a closely-associated valve.
  • Process fluid is pulled through the filter 42 directly during a recharge of the pump.
  • This valved path shown in phantom allows for isolation of the gas removal reservoir 30 and the filter 42 so that the filter 42 can be automatically tested for problems, e.g., unable to prime because of broken valve, leaking fitting (loss of seal).
  • Fig. 33 depicts another configuration wherein the filter 42 is also located before the gas removal reservoir but where the recirculation is downstream of the filter 42.
  • the recirculation returns to a point downstream of an isolation valve and upstream of the gas removal reservoir 30, or directly into the top of the gas removal reservoir 30.
  • Process fluid is pulled from the pumping chamber 34 through the filter 42 and into the gas removal reservoir 30.
  • the venturi on the gas removal reservoir drain is used in combination with the gas volume detection system to fill the gas removal reservoir from the filter.
  • the gas removal reservoir 30 provides an extra degassing benefit for the process fluid being pulled through the filter 42; again, precise control of the recharge rate can also mitigate any gas introduction.
  • the gas removal reservoir 30 may include optional apparatus including:
  • gas removal reservoir 30 includes an inlet for a nitrogen blanket (e.g., a low pressure supply of nitrogen that is process-filtered);
  • a nitrogen blanket e.g., a low pressure supply of nitrogen that is process-filtered
  • check valve on the gas removal reservoir 30 drain line biased only to allow flow out of the gas removal reservoir.
  • This check valve can be located upstream or downstream of a typically-located drain valve;
  • venturi to supply vacuum to pull fluid out of the drain line, or it may be needed to overcome any pressure differential that would tend to push fluid back from the drain line into the gas removal reservoir 30.
  • the venturi has a nitrogen supply that also has a valve to turn off or turn on the nitrogen supply so that the venturi is not running all of the time.
  • the unit has a problem it may have to be addressed during unscheduled maintenance time.
  • a pump that has the ability to either self-repair/correct or to continue running until the scheduled maintenance time is available. This allows the pump to continue with production with the official downtime occurring during non-production or maintenance time.
  • the pump has the ability to measure the current applied to the pump motor. If the current increases over time with no change in the process setup or chemical, this could be the result of a problem with the output valve, electronics, motor, chemical, or filter. The pump could signal the operator that it needs to be looked at soon.
  • a flow meter is placed after the filter and before the dispense output/suckback valve, it can determine if the valve has opened or closed correctly. If the flow has changed, it could signal the pump to adjust the flow rate to the correct amount. If a flow meter is placed after the filter and after the dispense output/suckback valve, it can determine if the valve has opened or closed correctly, as well as, if suckback occurred correctly. If there is an issue with suckback, the pump could open the dispense valve slightly and then push or pull the fluid to bring the fluid back to the correct level. If the flow has changed for the dispense, it could signal the pump to adjust the flow rate to the correct amount.
  • the system and method of the present invention 20 also implements a gas evacuation process whereby pressure is built up within the pump system (since air is compressible) and a quick vent process is performed to evacuate any air in the system 20.
  • Figs. 34A and 34B two gas evacuation processes, titled "GASE5" and GASE6", respectively.
  • the GASE5 process (Fig. 34A) is used as part of the fill routine (also referred to as the Recharge routine, Fig. 18 discussed previously).
  • the GASE6 (Fig. 34B) process is used as part of the recirculation routine.
  • the two gas evacuation processes are very similar.
  • the gas evacuation threshold pressure is approximately 15psi.
  • the step of advancing the piston at a slow rate to build up pressure is approximately O.lmL/sec.
  • Fig. 35 an alternative system configuration 1020 wherein the gas removal reservoir, hereinafter, the gas removal reservoir 1030, comprises an internal vertical partition 1032 to further reduce the formation of air bubbles and improve the removal of air from the system while reducing the waste (i.e., discarding) of process fluid.
  • this improved pump system utilizes a redesigned gas removal reservoir 1030 that eliminates the raised top edge, or angled upper face of the gas removal reservoir 30.
  • the internal partition 1032 splits the gas removal reservoir 1030 into two smaller reservoirs, or sub-reservoirs, RS 1 and RS2 with an open fluid channel 1036 connecting the two smaller reservoirs RS1/RS2 at the top of the reservoir 1030, where the free end of the internal partition 1032 is located.
  • the fluid inlet 1031 and a separate fluid outlet 1033 are both located at the bottom side of the reservoir 1030; when a pressure differential is created between the inlet 1031 and outlet 1033, process fluid flow through the GRR 1030 is shown by the hatched line 1034.
  • a vent/drain line (via valve 7) and a recirculation line (via valve 10) are each located on the top side of the gas removal reservoir 1030, hereinafter referred to as the GRR 1030.
  • the GRR 1030 maintains the advantage of collecting air bubbles 1035 at the top of the GRR 1030, as the process fluid flow 1034 moves from the bottom side/inlet 1031 up and over the partition 1032 and then down towards the bottom side/outlet 1033.
  • the air bubbles 1035 are removed from the flowing process fluid 1034 in the open fluid channel 1036, where they can be evacuated via the vent/drain lines (i.e., via valve 7).
  • the alternative pump system 20 A has replaced the external filter block 40 (Fig. 7) with an integrated valve configuration.
  • FIG. 35B An even further alternative to the GRR 1030, is the gas removal reservoir 1030A, a functional diagram of which, is shown in Fig. 35B.
  • the internal vertical partition 1032 is replaced with a plurality of interdigitated partitions 1032A that force the process fluid flow 1034A into a sinusoidal flow around the ends of these partitions.
  • the partitions 1032A are located between the inlet 1031 A and the outlet 1033 A. As the process fluid flow 1034A moves around the ends of these partitions 1032A, as with the GRR 1030, any air bubbles 1035A will be separated above the upper open fluid channels 1036 A and vented via corresponding vent valves 7 A.
  • any particulates P in the process fluid flow 1034A will be deposited on the bottom surface of the GRR 1030A underneath the lower ends of the partitions 1032A connected to the top side of the GRR 1030A.
  • the five walls shown in Fig. 35B is by way of example only and that any number of plural partitions are within the broadest scope of this invention.
  • Fig. 35C depicts a venturi circuit that can be implemented with the improved system 1020.
  • This venturi circuit along with the DIV valves 10-13 permits the recovery of process fluid entrained within the filter 42 during a recirculation process.
  • a nitrogen N 2 source is coupled to the top of the GRR 1030 via a DIV valve 12.
  • the pump controller 38 can permit a predetermined amount of nitrogen to form a gas head within the GRR 1030 or 103 OA.
  • This N2 is pre-filtered before being delivered to the valve 12 and then to the GRR 1030 or 1030A at a regulated 20 psi.
  • Figs. 36A-36D depict different views of the system 1020 showing the precision pump 1022 and its corresponding electrical control box 1023 that houses the electronics that control the pump 1022, including the microcontroller 38 and the NMM 50 discussed previously. It should be understood that other than the presence of the GRR 1030 or 103 OA, the operation of the pump 1022 is similar to the operation of the pump 22 described previously. Furthermore, use of the prefix "10-" in the reference number in Figs. 36A-41 is meant to convey the corresponding function and operation of the items having reference numbers without that prefix, all of which were discussed earlier.
  • Fig. 37 is an exploded view depicting the internals of the pump 1022.
  • the motor drive 24 sits atop a main pump assembly 1022A and the motor drive 24 can be released from the main pump assembly 1022A in a similar fashion described earlier with regard to system 20.
  • This figure shows the pump assembly 1022A connected with the pump head 1022B.
  • the pressure sensor board 48 also described earlier, is shown in Fig. 37, along with the maintenance button 25A for initiating motor drive 24 removal.
  • the filter distribution block 40 of the first system 20 has been replaced with an integrated configuration.
  • the flare fittings 47 are shown on the pump 1022 and the pneumatic valve manifold 1044 operates similarly to the pneumatic valve manifold 44 described earlier.
  • the pump 1022 is positioned within a housing H which receives a side cover SC and a top cover TC and bracket B and all of which can be releasably mounted using a mounting bracket MB.
  • Figs. 38A-38B depict opposite side perspective views of the pump head 1022B and showing the dispense chamber 34B.
  • Fig. 38C depicts the alignment for coupling the pump head 1022B with the pump assembly 1022 A.
  • Figs. 38D-38F depict the coupling of the pump assembly 1022A and pump head 1022B in more detail.
  • Fig. 39 is an exploded view of the pump head 1022 and shows the components, including the DIVs discussed earlier for controlling flows, as well as the relative location of the gas removal reservoir 1030 having the at least one internal vertical partition 1032.
  • the control side of the DIVs is on the plate 1080 which comprises the control port CP surrounded by the channel CH into which an O-ring 1081 is disposed.
  • a diaphragm 1084 is disposed in between plate 1080 and surface 1080A of the block 1078.
  • the output portion of the DIVs comprise the two outlet ports 1083 A and 1083B , all in accordance with the DIV operation explained earlier.
  • Fig. 40A is an isometric view of the pump head block showing the process fluid chamber side of the block
  • Fig. 40B is an isometric view of the pump head block showing the gas removal reservoir and the side of the pump head block that mates with the valve plate
  • Fig. 40C is an enlarged perspective view diagrammatically showing the gas removal reservoir inlet.
  • Fig. 41 is a functional diagram showing how the pump head 1022B interfaces with the filter 42.
  • Fig. 42 provides an alternative pump system configuration 2020 that also achieves a minimum loss of process fluid.
  • the system 2020 is similar to system 20A except that a flow path 80 is provided from the vent of the filter 42 to the source line SL that feeds valve 1.
  • a separate vent 82 is provided at a high point or apex along the flow path 80. The opening/closing of the vent 82 is controlled by the microcontroller 38 and can be opened/closed at a predetermined interval of time. This configuration 2020 avoids pushing process fluid out of the filter vent and into the filter drain.
  • the fluid in the flow path 80 is a gas and liquid mixture that flows from the filter vent back towards the source line SL; during this flow, bubbles collect at the high point or apex of the fluid path 80 and are thus vented via the vent 82 via microcontroller 38 command.
  • the airless process fluid is recirculated back to a "T"- type connection in the source line SL. This forces process fluid to flow back into the source line SL into the fab reservoir FB
  • Fig. 43 provides another alternative pump system configuration 3020 that also achieves a minimum loss of process fluid.
  • the system 3020 is similar to system 1020 except that the vent 82 is replaced with a valve 90 and a separate filter vent-to-drain flow path 92; in addition, a bubble sensor 94 is inserted into the flow path 80.
  • the valve 90 and bubble sensor 94 are also positioned at a high point in the flow path 80. Valve 90 is also controlled by the microcontroller 38.
  • the fluid in the flow path 80 is a gas and liquid mixture that flows from the filter vent back towards the source line SL; during this flow, bubbles collect at the high point or apex of the fluid path 80 and when the bubbles are detected by the bubble sensor 94, the valve 90 is opened by the microcontroller 38 to vent the trapped air.
  • the airless process fluid is recirculated back to a "T"-type connection in the source line SL. This forces process fluid to flow back into the source line SL into the fab reservoir FB.
  • Fig. 44 depicts a further pump system configuration 4020 wherein the pumping chamber 34 is coupled to the inlet of the GR 1030.
  • the inlet 1031 of the GRR 1030 is coupled to valve 3 which is connected to the output of the process fluid chamber 34B.
  • the pump system configuration 4020 operates similarly to the system 1020, but the difference is that the GRR 1030 is positioned downstream from the pump chamber and upstream of the filter 42.
  • the process fluid source e.g., FAB reservoir FR
  • the pump chamber 34B is also coupled to the input of the GRR 1030 via valve 2.
  • the output of the GRR 1030 is coupled to the inlet of the filter.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Pipeline Systems (AREA)

Abstract

La présente invention concerne un système de pompe de précision comportant un dispositif d'entraînement à moteur pour refouler d'une manière précise et répétée un fluide de processus, à l'aide d'un fluide de pompage, les pertes de fluide de processus étant minimales et ne contenant pas de gaz indésirable, à un processus de fabrication, et moyennant lequel le dispositif d'entraînement à moteur peut être facilement et rapidement remplacé sans interrompre le chemin d'écoulement de fluide. Ceci est réalisé par un réservoir de dégazage (GRR), comportant un orifice d'entrée/de sortie au fond du réservoir et amenant le gaz indésirable à migrer vers le haut, et un réservoir de fluide de pompage, tous les deux associés à la pompe, soit intégrés à la pompe soit étroitement adjacents. De plus, ce système de pompe de précision peut être surveillé, visualisé et commandé à distance par Internet. Du fluide de processus piégé dans un filtre en aval peut être recyclé vers le GRR lorsque du gaz piégé dans le filtre est retiré. Des variantes de réalisation du système comprennent un recyclage du fluide de processus de nouveau en amont. Dans un système d'une autre variante, la chambre de pompage est couplée à l'entrée du GRR.
PCT/US2015/046285 2013-03-15 2015-08-21 Pompe équipée d'un système de dégazage et de récupération de fluide automatisé, et procédé utilisant un réservoir de dégazage comportant une cloison interne WO2016032890A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2017511920A JP6427664B2 (ja) 2013-03-15 2015-08-21 内部隔壁を有するガス除去リザーバを使用した、自動ガス除去及び流体回収システム並びにその方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/473,086 US10092862B2 (en) 2013-03-15 2014-08-29 Pump having an automated gas removal and fluid recovery system and method using a gas removal reservoir having an internal partition
US14/473,086 2014-08-29

Publications (1)

Publication Number Publication Date
WO2016032890A1 true WO2016032890A1 (fr) 2016-03-03

Family

ID=55400382

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2015/046285 WO2016032890A1 (fr) 2013-03-15 2015-08-21 Pompe équipée d'un système de dégazage et de récupération de fluide automatisé, et procédé utilisant un réservoir de dégazage comportant une cloison interne

Country Status (1)

Country Link
WO (1) WO2016032890A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU203710U1 (ru) * 2020-10-26 2021-04-16 Общество с ограниченной ответственностью "Каматрон" Компрессорная установка для отбора газа из затрубного пространства куста нефтяных скважин
CN112879653A (zh) * 2019-12-01 2021-06-01 王元知 防止天然气爆炸智能装置
RU2784588C1 (ru) * 2022-02-09 2022-11-28 федеральное государственное автономное образовательное учреждение высшего образования "Российский университет дружбы народов" (РУДН) Стенд для исследования характеристик насосно-эжекторных систем с использованием выхлопных газов
CN116861593A (zh) * 2023-07-12 2023-10-10 安徽新沪屏蔽泵有限责任公司 一种泵的吸入室外形建模方法和吸入室

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4850972A (en) * 1987-01-16 1989-07-25 Pacesetter Infusion, Ltd. Progammable multiple pump medication infusion system with printer
US6056518A (en) * 1997-06-16 2000-05-02 Engineered Machined Products Fluid pump
US20020064454A1 (en) * 2000-11-27 2002-05-30 Akihiro Suzuki Fluid pump device having filter
JP2006233867A (ja) * 2005-02-24 2006-09-07 Aisin Seiki Co Ltd 電動ポンプ及び流体供給装置
US20140080205A1 (en) * 2008-11-26 2014-03-20 The Arizona Board Of Regents For And On Behalf Of Arizona State University System or device for biochemical analysis having at least one electroosmotic pump

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4850972A (en) * 1987-01-16 1989-07-25 Pacesetter Infusion, Ltd. Progammable multiple pump medication infusion system with printer
US6056518A (en) * 1997-06-16 2000-05-02 Engineered Machined Products Fluid pump
US20020064454A1 (en) * 2000-11-27 2002-05-30 Akihiro Suzuki Fluid pump device having filter
JP2006233867A (ja) * 2005-02-24 2006-09-07 Aisin Seiki Co Ltd 電動ポンプ及び流体供給装置
US20140080205A1 (en) * 2008-11-26 2014-03-20 The Arizona Board Of Regents For And On Behalf Of Arizona State University System or device for biochemical analysis having at least one electroosmotic pump

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112879653A (zh) * 2019-12-01 2021-06-01 王元知 防止天然气爆炸智能装置
RU203710U1 (ru) * 2020-10-26 2021-04-16 Общество с ограниченной ответственностью "Каматрон" Компрессорная установка для отбора газа из затрубного пространства куста нефтяных скважин
RU2784588C1 (ru) * 2022-02-09 2022-11-28 федеральное государственное автономное образовательное учреждение высшего образования "Российский университет дружбы народов" (РУДН) Стенд для исследования характеристик насосно-эжекторных систем с использованием выхлопных газов
CN116861593A (zh) * 2023-07-12 2023-10-10 安徽新沪屏蔽泵有限责任公司 一种泵的吸入室外形建模方法和吸入室
CN116861593B (zh) * 2023-07-12 2023-12-19 安徽新沪屏蔽泵有限责任公司 一种泵的吸入室外形建模方法和吸入室

Similar Documents

Publication Publication Date Title
US10786759B2 (en) Pump having an automated gas removal and fluid recovery system and method using a gas removal reservoir having an internal partition
EP3149328B1 (fr) Système et procédé pour opérer une pompe avec senseurs d'alimentation et de sortie, confirmation de filtration et de pompage, et pression d'amorçage de filtration réduit
JP5586958B2 (ja) ポンプ操作のためのシステムおよび方法
US8727744B2 (en) Method and system for optimizing operation of a pump
KR101829078B1 (ko) 필터 정보 태그의 필터 정보를 기초로 펌프의 작동을 제어하기 위한 장치 및 방법
KR101308175B1 (ko) 분배 체적의 오차 보상 방법, 다단계 펌프, 및 시스템 컴플라이언스 보상 방법
WO2016032890A1 (fr) Pompe équipée d'un système de dégazage et de récupération de fluide automatisé, et procédé utilisant un réservoir de dégazage comportant une cloison interne
EP2745310B1 (fr) Système et procédé pour détecter la présence d'air dans un fluide
JP2004273830A (ja) 薬液供給装置

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15834840

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2017511920

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 15834840

Country of ref document: EP

Kind code of ref document: A1