WO2015183007A1 - Procédé de revêtement à l'aide d'un alignement de particules - Google Patents
Procédé de revêtement à l'aide d'un alignement de particules Download PDFInfo
- Publication number
- WO2015183007A1 WO2015183007A1 PCT/KR2015/005349 KR2015005349W WO2015183007A1 WO 2015183007 A1 WO2015183007 A1 WO 2015183007A1 KR 2015005349 W KR2015005349 W KR 2015005349W WO 2015183007 A1 WO2015183007 A1 WO 2015183007A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- particles
- polymer substrate
- coating
- adhesive
- adhesive polymer
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C19/00—Apparatus specially adapted for applying particulate materials to surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/02—Coating starting from inorganic powder by application of pressure only
Abstract
La présente invention concerne un procédé de revêtement à l'aide d'un alignement de particules, capable de revêtir, à une densité élevée, une pluralité de particules fines en une couche unique en utilisant un alignement de particules. Le procédé de revêtement à l'aide d'un alignement de particules, selon la présente invention, comprend les étapes consistant à : (a) préparer un substrat polymère de type à forte adhésion ; (b) former un film de revêtement en revêtant tout en formant, sur la surface du substrat de type à forte adhésion, une pluralité de parties concaves qui correspondent respectivement à chacune parmi la pluralité de particules, en appliquant une pression à la pluralité de particules ; (c) préparer un film adhésif pourvu d'une couche adhésive sur une surface, et imprimer une couche d'impression sur le film adhésif de sorte que la couche adhésive est partiellement couverte par la couche d'impression ; et (d) former un motif sur le film de revêtement en faisant adhérer le film adhésif sur lequel la couche d'impression a été imprimée, puis en retirant le film adhésif, de manière à retirer une partie des particules de la pluralité de particules au moyen d'une adhérence à la partie de la couche adhésive qui n'est pas couverte avec la couche d'impression.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR1020140064339A KR102264385B1 (ko) | 2014-05-28 | 2014-05-28 | 입자 정렬을 이용한 코팅 방법 |
KR10-2014-0064339 | 2014-05-28 |
Publications (1)
Publication Number | Publication Date |
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WO2015183007A1 true WO2015183007A1 (fr) | 2015-12-03 |
Family
ID=54699271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2015/005349 WO2015183007A1 (fr) | 2014-05-28 | 2015-05-28 | Procédé de revêtement à l'aide d'un alignement de particules |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR102264385B1 (fr) |
WO (1) | WO2015183007A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114114755A (zh) * | 2021-12-03 | 2022-03-01 | 宁波长阳科技股份有限公司 | 反射膜的制备方法、反射膜及其应用 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101950703B1 (ko) * | 2017-04-03 | 2019-02-22 | 한양대학교 산학협력단 | 단층의 고분자 입자 코팅층을 갖는 전지용 분리막 및 이의 제조방법 |
KR102481993B1 (ko) * | 2017-04-07 | 2022-12-29 | 아주대학교산학협력단 | 도전입자의 미세 패터닝 방법 |
KR102660136B1 (ko) * | 2022-05-24 | 2024-04-23 | 박성우 | 내마모성을 갖는 자동차용 시트 원단의 날염 방법 |
Citations (5)
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KR20050001111A (ko) * | 2003-06-27 | 2005-01-06 | 한국과학기술원 | 나노미터 수준으로 패턴화된 고분자 박막의 제조 방법 |
KR20090076568A (ko) * | 2008-01-09 | 2009-07-13 | 고려대학교 산학협력단 | 나노스피어 형틀 형태의 나노임프린트용 템플릿 제조 방법,이를 이용한 단일층 나노스피어 고분자 패턴 형성 방법 및상기 단일층 나노스피어 패턴을 이용한 응용방법 |
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JP2013029739A (ja) * | 2011-07-29 | 2013-02-07 | Fujifilm Corp | フレキソ印刷版の製版方法 |
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JP4551625B2 (ja) | 2003-03-31 | 2010-09-29 | 大日本印刷株式会社 | パターン形成体の製造方法 |
JP4346017B2 (ja) | 2003-12-12 | 2009-10-14 | 大日本印刷株式会社 | マイクロアレイチップの製造方法 |
US7875313B2 (en) * | 2007-04-05 | 2011-01-25 | E. I. Du Pont De Nemours And Company | Method to form a pattern of functional material on a substrate using a mask material |
TW200937043A (en) | 2008-02-29 | 2009-09-01 | Eternal Chemical Co Ltd | Brightness enhancement reflective film |
KR101416625B1 (ko) * | 2012-06-11 | 2014-07-08 | 한국전기연구원 | 미세 패턴 형성용 고분자 몰드의 제조 방법, 이에 의해 제조되는 미세 패턴 형성용 고분자 몰드, 및 이를 이용한 미세 패턴 형성 방법 |
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2014
- 2014-05-28 KR KR1020140064339A patent/KR102264385B1/ko active IP Right Grant
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2015
- 2015-05-28 WO PCT/KR2015/005349 patent/WO2015183007A1/fr active Application Filing
Patent Citations (5)
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KR20050001111A (ko) * | 2003-06-27 | 2005-01-06 | 한국과학기술원 | 나노미터 수준으로 패턴화된 고분자 박막의 제조 방법 |
KR20090076568A (ko) * | 2008-01-09 | 2009-07-13 | 고려대학교 산학협력단 | 나노스피어 형틀 형태의 나노임프린트용 템플릿 제조 방법,이를 이용한 단일층 나노스피어 고분자 패턴 형성 방법 및상기 단일층 나노스피어 패턴을 이용한 응용방법 |
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JP2013029739A (ja) * | 2011-07-29 | 2013-02-07 | Fujifilm Corp | フレキソ印刷版の製版方法 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114114755A (zh) * | 2021-12-03 | 2022-03-01 | 宁波长阳科技股份有限公司 | 反射膜的制备方法、反射膜及其应用 |
CN114114755B (zh) * | 2021-12-03 | 2024-04-02 | 宁波长阳科技股份有限公司 | 反射膜的制备方法、反射膜及其应用 |
Also Published As
Publication number | Publication date |
---|---|
KR102264385B1 (ko) | 2021-06-16 |
KR20150137179A (ko) | 2015-12-09 |
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