WO2015139353A1 - 一种基于激光直写的微纳区域液晶定向方法及其系统 - Google Patents

一种基于激光直写的微纳区域液晶定向方法及其系统 Download PDF

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Publication number
WO2015139353A1
WO2015139353A1 PCT/CN2014/075876 CN2014075876W WO2015139353A1 WO 2015139353 A1 WO2015139353 A1 WO 2015139353A1 CN 2014075876 W CN2014075876 W CN 2014075876W WO 2015139353 A1 WO2015139353 A1 WO 2015139353A1
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Prior art keywords
micro
liquid crystal
nano
direct writing
laser direct
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PCT/CN2014/075876
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English (en)
French (fr)
Inventor
张心正
许京军
李威
伊瑞娜
崔伟
石彬
王振华
吴强
孔勇发
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南开大学
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Priority to US15/035,392 priority Critical patent/US10459294B2/en
Priority to SI201431001T priority patent/SI2977815T1/sl
Priority to EP14886165.1A priority patent/EP2977815B1/en
Publication of WO2015139353A1 publication Critical patent/WO2015139353A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/355—Texturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B23K26/359—Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133377—Cells with plural compartments or having plurality of liquid crystal microcells partitioned by walls, e.g. one microcell per pixel
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1341—Filling or closing of cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/30—Organic material
    • B23K2103/42—Plastics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133776—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers having structures locally influencing the alignment, e.g. unevenness
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/02—Materials and properties organic material
    • G02F2202/022—Materials and properties organic material polymeric
    • G02F2202/023—Materials and properties organic material polymeric curable

Definitions

  • Micro-nano area liquid crystal orientation method based on laser direct writing and system thereof
  • the invention belongs to the technical field of light modulation, and particularly relates to the field of micro-nano processing based on laser direct writing and the light modulation based on liquid crystal, in particular to a micro-nano area liquid crystal orientation method based on laser direct writing and a system thereof. Background technique
  • LCD Liquid crystal display
  • orientation layer liquid crystal molecules
  • orientation surface the surface of the substrate
  • the liquid crystal molecules are placed on the oriented surface before the liquid crystal display cell is formed.
  • a common method of producing this oriented surface is to cover a film, such as a polyimide film, and then rub the surface of the film with a goose down cloth. This rubbing process redirects the polyimide surface to form an oriented surface.
  • the oriented surface provides a directional cushion for the orientation of the liquid crystal molecules in contact with the surface.
  • the rubbing method has become one of the main processes for providing the directional surface required for LCDs.
  • the rubbing process requires dust from the fleece, and the rubbing process can accumulate electrostatic charges, destroying the crystal tubes under the polyimide surface, thereby affecting the performance of modern liquid crystal displays. Therefore, it would be particularly important to provide a method of forming an oriented surface without compromising the normal operation of these transistors.
  • the industry acknowledges that for future manufacturing projects, a non-contact or non-friction surface orientation method is highly sought.
  • Patent No. 01116589.8 Metal and Apparatus for Forming Liquid Crystal Alignment Layer
  • Formation Method and Forming Device for Orientation Layer of Liquid Crystal Display both of which have been studied in China, have made some progress in liquid crystal orientation. . However, they are suitable for small-area liquid crystal orientation, but not for large-area liquids. Crystal orientation.
  • the present invention is directed to the deficiencies of the prior art. After multiple design and research, a micro-nano-region liquid crystal orientation method and a laser direct writing system based on laser direct writing are provided.
  • a micro-nano-region liquid crystal orientation method based on laser direct writing which constructs a micro-nano structure by a laser direct writing system; liquid crystal molecules in a micro-nano structure region realize self-orientation; The fine structure on the sidewalls of the polymer strips constituting the micro/nano structure; the size of the micro/nano regions is from the order of micrometers up to the nanometer scale of the super-diffraction limit.
  • micro-nano area liquid crystal orientation method based on laser direct writing specifically includes the following steps:
  • Step 1 Prepare the base material required for micro-nano structure processing
  • Step 2 construct a micro-nano structure by means of laser direct writing
  • Step 3 Perform post-processing on the processed micro-nano structure
  • Step 4 Inject liquid crystal into the constructed micro/nano structure to form a spontaneous orientation.
  • the micro-nano structure processing is based on single photon laser direct writing technology, or based on multiphoton laser direct writing technology.
  • the fine structure on the sidewalls of the polymeric strip is formed as a single beam of incident light; the substrate material is a polymerizable organic.
  • the liquid crystal is an orientable nematic liquid crystal, a cholesteric liquid crystal or a chiral liquid crystal.
  • micro/nano structure is a one-dimensional structure, a two-dimensional structure, or a three-dimensional structure.
  • a laser direct writing system using a micro-nano-region liquid crystal orientation method based on laser direct writing which comprises a light source generating system, a beam parameter adjusting system, a mechanical moving system; a light beam emitted by a light source generating system
  • the beam-parameter adjustment system adjusts the desired beam to the micro-nano structure processing, and the mechanical movement system causes a relative displacement between the processing beam and the processed sample to process the micro-nano structure.
  • the light source generating system is a beam generating system that illuminates the photopolymerizable material.
  • the optical parameter adjustment system is an optical device system that adjusts the propagation direction, intensity, polarization, and the like of the light beam to ensure efficient photopolymerization.
  • the micro-nano-region liquid crystal orientation method based on laser direct writing provided by the invention constructs the micro-nano region by single photon or multi-photon polymerization laser direct writing technology, and realizes self-orientation of liquid crystal by virtue of the fine structure on the sidewall of the micro-nano polymer strip.
  • the method is simple in operation, and the fine structure for inducing the orientation of the liquid crystal is generated by the direct action of the single-beam direct writing laser for processing the micro-nano structure, and is formed simultaneously with the processing of the micro-nano structure.
  • FIG. 1 is a micro-nano-grid structure composed of polymer strips prepared by the method and system of the present invention
  • FIG. 2 is an enlarged side view of a polymer strip prepared by the method and system of the present invention
  • Figure 3 is a schematic illustration of the fine structure on the polymer strip causing the orientation of the liquid crystal.
  • Figure 4 is an optical path diagram of a micro-nano area preparation system based on laser direct writing. detailed description
  • the invention achieves the stable orientation of the liquid crystal molecules in the micro region, which is the premise for realizing the regulation of the liquid crystal molecules, and is also the key technology for realizing the liquid crystal-based micro/nano photonics device.
  • a laser-based direct writing technique based on photopolymerization can construct an arbitrary three-dimensional or even micro-nano structure exceeding the optical diffraction limit, and a photonic liquid crystal device formed by injecting liquid crystal into the micro-nano structure can realize the pole. Photon regulation in small areas.
  • the invention provides a micro-nano-region liquid crystal orientation method based on laser direct writing, the method of the invention constructs a micro-nano structure by a laser direct writing system; the liquid crystal molecules in the micro-nano structure region realize self-orientation; the orientation of the liquid crystal is derived from the composition a fine structure on the sidewall of the polymer strip of the micro-nano structure; the size of the micro-nano region is from micron to hyper-derivative The nanometer magnitude of the emission limit.
  • the essence of the method of the present invention is to use a bundle of ultrafast pulsed lasers to write a micro/nano structure in a photopolymerizable material, the basic structural element being a polymer strip, as shown in FIG. Since there is a threshold for photopolymerization of the material, a micro/nano structure exceeding the diffraction limit is processed; and an arbitrary three-dimensional structure can be formed by adjusting the processing method.
  • the present invention is based on the difference in refractive index between the polymerized region and the non-polymerized region and the substrate, so that the reflected light generated by the optical surface at the periphery of the polymerization region interferes with the incident light to form a stable surface of the standing wave remodeling polymerization region.
  • Structure as shown in Figure 2.
  • This fine structure can induce orientation of the liquid crystal molecules in the implanted structure, so that no additional orientation technique is required; the orientation of the molecules after orientation is perpendicular to the wave vector direction and parallel to the direction of the polymer strip, as shown in FIG.
  • the laser direct writing-based micro-nano-region liquid crystal orientation method specifically includes the following steps: Step 1. Prepare a substrate material required for micro-nano structure processing, generally a polymerizable organic substance, but is not limited to a polymerizable organic substance;
  • Step 2 construct a micro-nano structure by means of laser direct writing
  • Step 3 Perform post-processing on the processed micro-nano structure
  • Step 4 Inject liquid crystal into the constructed micro/nano structure to form a spontaneous orientation.
  • the present invention provides a laser direct writing system using a micro-nano-region liquid crystal orientation method based on laser direct writing, which comprises a light source generating system, a beam parameter adjusting system, a mechanical moving system; a beam passing through a beam parameter emitted by the light source generating system
  • the adjustment system adjusts the required beam to the micro-nano structure processing, and the mechanical movement system causes a relative displacement between the processing beam and the processed sample to process the micro-nano structure.
  • the light source generating system is a light beam generating system for exciting photopolymerization of the material;
  • the optical parameter adjusting system is an optical device system for adjusting parameters such as propagation direction, intensity, and polarization of the beam to ensure efficient photopolymerization.
  • a light source generating system of a laser direct writing system such as a pulsed laser, a beam parameter adjustment system composed of optical components such as a mirror, a prism, a polarizing plate, a wave plate, a lens or a microscope objective, which combines the intensity and polarization of the beam.
  • the parameters such as direction and scale are adjusted to the requirements of micro-nano structure processing; the sample is placed at the processing position, and a mechanical movement system such as an electronically controlled precision translation stage or galvanometer is used to make a relative displacement between the processing beam and the processed sample. Processing micro-nano structure.
  • the processed samples are processed according to different properties, and can be pre-polymerized, solidified, etc., and then processed in a processing system for micro-nano structure; after processing, re-developing, solidifying, rinsing, encapsulating, etc.;
  • the liquid crystal is poured to form an applicable device.
  • the invention is further illustrated by the following examples.
  • Embodiment 1 is a diagrammatic representation of Embodiment 1:
  • a blue titanium gemstone femtosecond laser system having a wavelength of 800 nm, a repetition frequency of 1000 Hz, and a pulse width of 130 femtoseconds; a microscope objective focusing with a magnification of 40, a numerical aperture of 0.6; On-stage; one-dimensional gate structure processing of SU8 photoresist; the specific optical path diagram is shown in Figure 4.
  • the processed structure was characterized by scanning electron microscopy. As shown in Fig. 1, a regular one-dimensional structure was obtained.
  • the finely characterized polymer strips are then characterized as shown in Fig. 2, showing a fine stripe structure along the machine direction and perpendicular to the direction of the processed light wave.
  • An isotropic E7 liquid crystal is injected into the gate structure and slowly cooled to the liquid crystal state. The orientation effect is excellent with a polarizing microscope, and the schematic diagram is shown in Fig. 3.
  • the laser direct writing-based micro-nano-region liquid crystal orientation method and system thereof can realize the self-orientation of liquid crystal molecules in the micro-nano region without preparing an induction film; and the micro-nano-region liquid crystal orientation method based on laser direct writing is simple to operate It is versatile and suitable for making non-inducing film self-orientation based on liquid crystal micro/nano devices under laboratory conditions.
  • the laser direct writing-based micro-nano-region liquid crystal self-orientation method and system thereof can realize arbitrary orientation of liquid crystals in a micro-nano or even a super-optical diffraction limit region based on a photopolymerization processing mode.
  • the laser direct writing-based micro-nano-region liquid crystal orientation method and system thereof can realize the orientation of the liquid crystal in the micro-nano region, realize the micro-nanocrystallization of the liquid crystal orientation domain, and is beneficial to the micro-nano photonics regulation.
  • Implementation. Processing of large-area micro/nano structures can be achieved by applying methods such as array lens groups.
  • the processing technique of the micro/nano structure is a laser direct writing technique based on single photon or multiphoton polymerization.
  • the characteristic dimensions of the micro/nanostructure range from the order of micrometers to the order of nanometers exceeding the optical diffraction limit.
  • the liquid crystal molecules are orientable liquid crystal materials such as nematic, cholesteric, and chiral liquid crystals.
  • the source of the material for the micro/nano structure is any material such as a photopolymerizable resin.
  • the system light source generating system is preferably a Ti:Sapphire femtosecond laser, but is not limited to this laser.
  • the mechanical movement system is preferably a computer controlled three-dimensional precision mobile platform, but is not limited to this platform.
  • the present invention provides a micro-nano region liquid crystal orientation method based on laser direct writing and a system thereof.
  • the operation is simple, and the orientation film is not required to be prepared on the substrate in advance, and the orientation direction of the liquid crystal is determined by the fine structure, and the complex orientation in any direction in the plane can be performed, which is beneficial to the miniaturization and wide popularization of the liquid crystal-based photonic device. application.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)
  • Laser Beam Processing (AREA)

Abstract

一种基于激光直写的微纳区域液晶定向方法及其系统。该方法利用通过激光直写系统构建微纳结构；微纳结构区域内的液晶分子实现自定向；液晶的定向源于构成微纳结构的聚合物条带侧壁上的精细结构；该微纳区域的尺寸从微米量级一直到超衍射极限的纳米量级。还包括使用上述方法的激光直写系统。该方法及系统操作简单，不需要使用机械或光诱导的方式在基板上形成定向诱导膜，能在微纳区域内实现液晶的自定向，定向方向可微区域调控，有利于基于液晶器件的小型化和复杂三维液晶结构的定向，可广泛的推广应用。

Description

说 明 书 一种基于激光直写的微纳区域液晶定向方法及其系统 技术领域
本发明属于光调制技术领域， 具体涉及基于激光直写的微纳加工领域和基于液晶的 光调制， 特别是涉及一种基于激光直写的微纳区域液晶定向方法及其系统。 背景技术
液晶显示器 (LCD)技术在世界范围内被用于各种产品， 其范围从手表到蜂窝式电话， 再到计算机。 据估计， 与该工业相关的产值为每年数十亿美元。
在基于液晶的显示以及其它器件应用中， 液晶的定向一直是一门关键的技术。 制造 液晶显示器的一个基本要求是在基板表面（以下称之为 "定向表面"）上液晶分子的定向 (以下称之为 "定向层"）。 在形成液晶显示盒以前， 要将液晶分子置于定向表面。 产生 这一定向表面的普遍方法是在其上覆盖一层膜， 如聚酰亚胺膜， 然后对覆膜的表面用天 鹅绒布进行摩擦。 该摩擦工艺使聚酰亚胺表面重新定向以形成定向表面。 该定向表面为 与该表面相接触的液晶分子的定向提供了一个定向性的垫层。
近三十年来， 摩擦法已成为提供 LCD所需定向表面的主要工艺之一。 然而， 摩擦工 艺需要来自绒布的粉尘， 而且摩擦工艺能积聚静电电荷， 破坏聚酰亚胺表面下方的晶体 管， 从而影响现代液晶显示器的工作性能。 因此， 提供一种在不致危及这些晶体管正常 工作的情况下形成定向表面的方法显得尤为重要。 工业界承认， 对于未来的制造工程而 言， 人们十分企求一种非接触或一种非摩擦的表面定向方法。
授予 Chaudhari等人的美国专利 No. 5， 770， 826给出了一种非接触技术， 即用一种低 能离子束更改一大类材料的表面以培育对形成定向层有用的定向性。 这种定向性， 或者 说是取向顺序， 可使液晶分子定向排列。 业已表明， 应用这些发明能制造出液晶显示屏。
液晶显示技术中的一个强大推动力量就是改善整个液晶显示屏的视觉质量。 然而， 人们不知道有什么办法来控制液晶的平行性。 平行性是取得均匀液晶显示屏均匀性的一 个关键因素。在中国提交的第 01116589. 8号专利 "形成液晶定向层的方法和器具"及第 200510130415号专利 "液晶显示器定向层的形成方法和形成装置"均对液晶定向进行了 研究， 并取得了一些进展。 但是他们适用于小面积液晶定向采用， 而不适用于大面积液 晶定向。
针对于大面积的液晶定向， 在已有液晶工业技术及研究中， 一直采用机械方法在基 底表面形成定向层来诱导液晶定向。 但机械定向方法中的本征缺陷和外来物污染一直是 影响液晶定向强度和均匀性的关键因素。 获得良好品质的大面积液晶定向， 一直是尚待 攻克的技术难题。 发明内容
为了解决上述问题， 本发明针对现有技术的不足， 经过多次设计和研究， 提供了一 种基于激光直写的微纳区域液晶定向方法及激光直写系统。
依据本发明的第一方面， 提供一种基于激光直写的微纳区域液晶定向方法， 其通过 激光直写系统构建微纳结构； 微纳结构区域内的液晶分子实现自定向； 液晶的定向源于 构成微纳结构的聚合物条带侧壁上的精细结构； 所述微纳区域的尺寸从微米量级一直到 超衍射极限的纳米量级。
基于激光直写的微纳区域液晶定向方法具体包括以下步骤：
步骤 1、 准备微纳结构加工需要的基底材料；
步骤 2、 通过激光直写的方式构建微纳结构；
步骤 3、 对加工得到的微纳结构进行后处理；
步骤 4、 向构建的微纳结构中注入液晶， 形成自发定向。
其中， 微纳结构加工基于单光子激光直写技术， 或基于多光子激光直写技术。
优选地， 述聚合物条带侧壁上的精细结构为单束入射光形成； 所述基底材料为可聚 合有机物。
优选地， 液晶为可定向的向列型液晶、 胆 型液晶或手性液晶。
进一步地， 微纳结构是一维结构、 二维结构或三维结构。
依据本发明的第二方面， 提供一种使用基于激光直写的微纳区域液晶定向方法的激 光直写系统， 其包括光源发生系统， 光束参数调整系统， 机械移动系统； 光源发生系统 发出的光束经光束参数调整系统调整至微纳结构加工的所需的光束， 机械移动系统使加 工光束与加工样品间发生相对位移， 以加工微纳结构。
优选地， 光源发生系统为可激发材料光聚合的光束产生系统。
进一步地， 光学参数调整系统为保证光聚合有效发生， 而对光束的传播方向、 强度、 偏振等参数进行调整的光学器件系统。 本发明提供的基于激光直写的微纳区域液晶定向方法通过单光子或多光子聚合激光 直写技术构建微纳区域， 依靠微纳聚合物条带侧壁上的精细结构实现液晶的自定向。 此 方法操作简单， 诱导液晶定向的精细结构由加工微纳结构的单束直写激光直接作用而生 成， 与微纳结构的加工同时形成。基于此技术加工形成的微纳结构，不需要引入用于液晶 定向的诱导膜， 也不需要使用机械加工或其它诸如光诱导的方向对诱导膜进行后处理， 可以让液晶分子直接接触基板以实现灵敏的光或电的调控； 同时也可以通过结构构建的 方式控制液晶分子取向以达到复杂甚至任意定向的目的。 有利于各种微调控光子学器件 的开发和广泛的推广应用。 附图说明
图 1 为利用本发明的方法及其系统制备的由聚合物条带构成的微纳栅形结构； 图 2 为利用本发明的方法及其系统制备的聚合物条带侧面放大图；
图 3为聚合物条带上的精细结构引起液晶定向的示意图。
图 4为基于激光直写的微纳区域制备系统光路图。 具体实施方式
下面将结合本发明实施例中的附图， 对本发明实施例中的技术方案进行清楚、 完整 地描述， 显然， 所描述的实施例仅仅是本发明的一部分实施例， 而不是全部的实施例。 基于本发明中的实施例， 本领域普通技术人员在没有做出创造性劳动前提下所获得的所 有其他实施例， 都属于本发明保护的范围。 另外地， 不应当将本发明的保护范围仅仅限 制至下述具体模块或具体参数。
本发明取得了在微小区域内液晶分子的稳定定向， 此是实现液晶分子调控的前提， 也是实现基于液晶的微纳光子学器件的关键技术。 使用本发明的技术， 即基于光聚合的 激光直写技术能构建任意三维的甚至是超过光学衍射极限的微纳结构， 在此微纳结构内 注入液晶所形成的光子学液晶器件将能实现极小区域的光子调控。
为了使本技术领域的人员更好地理解本发明方案， 下面结合附图和实施方式对本发 明作进一步的详细说明。
本发明提供了一种基于激光直写的微纳区域液晶定向方法， 本发明的方法通过激光 直写系统构建微纳结构； 微纳结构区域内的液晶分子实现自定向； 液晶的定向源于构成 微纳结构的聚合物条带侧壁上的精细结构； 所述微纳区域的尺寸从微米量级一直到超衍 射极限的纳米量级。 本发明方法的实质是利用一束超快脉冲激光在可发生光聚合的材料 中写入微纳结构， 其基本结构元素为聚合物条带， 如图 1所示。 由于材料发生光聚合存 在一个阈值， 因此加工出超过衍射极限的微纳结构； 同时还能通过调整加工方式形成任 意的三维结构。
本发明基于聚合区域与非聚合区域及基底的折射率存在差别， 因此在聚合区域外围 的光学表面所产生的反射光能和入射光干涉形成稳定的驻波重塑聚合区域外侧的形貌产 生精细结构， 如图 2所示。 此精细结构能对注入结构中的液晶分子产生诱导定向， 从而 不再需要额外的定向技术；定向后分子方向垂直于波矢方向而平行于聚合物条带的方向， 如图 3所示。
本发明提供的基于激光直写的微纳区域液晶定向方法具体包括以下步骤： 步骤 1、准备微纳结构加工需要的基底材料， 一般为可聚合有机物， 但不限于可聚合 有机物；
步骤 2、 通过激光直写的方式构建微纳结构；
步骤 3、 对加工得到的微纳结构进行后处理；
步骤 4、 向构建的微纳结构中注入液晶， 形成自发定向。
同 ί ,本发明提供一种使用基于激光直写的微纳区域液晶定向方法的激光直写系统， 其包括光源发生系统， 光束参数调整系统， 机械移动系统； 光源发生系统发出的光束经 光束参数调整系统调整至微纳结构加工的所需的光束， 机械移动系统使加工光束与加工 样品间发生相对位移， 以加工微纳结构。 其中光源发生系统为可激发材料光聚合的光束 产生系统； 光学参数调整系统为保证光聚合有效发生， 而对光束的传播方向、 强度、 偏 振等参数进行调整的光学器件系统。
激光直写系统的光源发生系统， 如脉冲激光器， 发出的光束经反射镜、 棱镜、 偏振 片、 波片、 透镜或者显微镜物镜等光学元器件构成的光束参数调整系统， 将光束的强度、 偏振、 方向、 尺度等参数调整至微纳结构加工的要求； 将样品置于加工位置， 用诸如电 控精密平移台或振镜等器件组成的机械移动系统使加工光束与加工样品间发生相对位 移， 以加工微纳结构。
经过多次试验得到， 加工样品依性质不同， 可进行预聚合、 固化等处理后， 放在加 工系统中进行微纳结构的加工； 加工后再进行再显影、 固化、 漂洗、 封装等后处理； 灌 注液晶， 形成可应用器件。 下面通过实施例对本发明作进一步说明。
实施例一：
对于本发明， 采用波长 800nm， 重复频率 1000赫兹， 脉冲宽度 130飞秒的蓝钛宝石 飞秒激光系统； 采用放大倍率为 40， 数值孔径 0. 6的显微物镜聚焦； 在机控精密三维平 移台上； 对 SU8光刻胶进行一维栅型结构加工； 具体光路图如图 4所示。 加工后经过显 影和清洗， 用扫描电子显微镜对所加工的结构进行表征如图 1所示， 可见得到了规则的 一维结构。 再对倒伏的聚合物条带进行精细表征如图 2所示， 可见沿加工方向且垂直于 加工光波矢方向的精细条纹结构。在此栅型结构内注入各向同性态的 E7液晶并缓慢降温 到液晶态。 用偏光显微镜可见定向效果极佳， 其示意图如图 3所示。
本发明的基于激光直写的微纳区域液晶定向方法及其系统， 不需要制备诱导膜即可 实现微纳区域内液晶分子的自定向； 并且基于激光直写的微纳区域液晶定向方法操作简 单， 具有通用性， 适合在实验室的条件下， 制作基于液晶微纳器件的无诱导膜自定向。 此外， 本发明提供的基于激光直写的微纳区域液晶自定向方法及其系统， 基于光聚合的 加工方式可实现微纳甚至是超光学衍射极限区域的液晶的任意定向。
更进一步地， 本发明提供的基于激光直写的微纳区域液晶定向方法及其系统， 可实 现微纳区域的液晶的定向， 实现了液晶定向畴的微纳化， 有利于微纳光子学调控的实施。 并可通过应用诸如阵列透镜组的方式实现大面积微纳结构的加工。
优选地， 所述微纳结构的加工技术为基于单光子或多光子聚合的激光直写技术。 微 纳结构的特征尺寸在于微米量级至超过光学衍射极限的纳米量级。 液晶分子为向列型、 胆甾型及手性液晶等可定向液晶材料。 微纳结构的加工材料来源为可发生光聚合的树脂 等任意材料。 在本发明中， 系统光源发生系统优选为钛宝石飞秒激光器， 但不限于此激 光器。 机械移动系统优选为电脑控制三维精密移动平台， 但不限于此平台。
由以上本发明提供的技术方案可见， 本发明提供了一种基于激光直写的微纳区域液 晶定向方法及其系统。 其操作简单， 不需要提前在基底上制备诱导定向膜， 同时液晶的 定向方向由精细结构决定， 可以进行面内任意方向的复杂定向， 有利于基于液晶的光子 学器件的微型化和广泛的推广应用。
以上所述， 仅为本发明较佳的具体实施方式， 但本发明的保护范围并不局限于此， 任何熟悉本技术领域的技术人员在本发明揭露的技术范围内，可轻易想到的变化或替换， 都应涵盖在本发明的保护范围之内。 本领域普通的技术人员可以理解， 在不背离所附权 利要求定义的本发明的精神和范围的情况下，可以在形式和细节中做出各种各样的修改。

Claims

权 利 要 求 书
1、 一种基于激光直写的微纳区域液晶定向方法， 其特征在于， 通过激光直写系统构 建微纳结构； 微纳结构区域内的液晶分子实现自定向； 液晶的定向源于构成微纳结构的 聚合物条带侧壁上的精细结构； 所述微纳区域的尺寸从微米量级一直到超衍射极限的纳 米量级。
2、 如权利要求 1所述的基于激光直写的微纳区域液晶定向方法， 其包括以下步骤： 步骤 1、 准备微纳结构加工需要的基底材料；
步骤 2、 通过激光直写的方式构建微纳结构；
步骤 3、 对加工得到的微纳结构进行后处理；
步骤 4、 向构建的微纳结构中注入液晶， 形成自发定向。
3、 如权利要求 2所述的基于激光直写的微纳区域液晶定向方法， 其特征在于， 所述 微纳结构加工基于单光子激光直写技术。
4、 如权利要求 2所述的基于激光直写的微纳区域液晶定向方法， 其特征在于， 所述 微纳结构加工基于多光子激光直写技术。
5、 如权利要求 3所述的基于激光直写的微纳区域液晶定向方法， 其特征在于， 所述 聚合物条带侧壁上的精细结构为单束入射光形成； 所述基底材料为可聚合有机物。
6、 如权利要求 2所述的基于激光直写的微纳区域液晶定向方法， 其特征在于， 所述 液晶为可定向的向列型液晶、 胆 型液晶或手性液晶。
7、 如权利要求 1所述的基于激光直写的微纳区域液晶定向方法， 其特征在于， 所述 微纳结构是一维结构、 二维结构或三维结构。
8、 使用上述权利要求所述方法的激光直写系统， 所述系统为实现微纳结构加工所建 立的光学和机械系统， 其包括光源发生系统， 光束参数调整系统， 机械移动系统； 光源 发生系统发出的光束经光束参数调整系统调整至微纳结构加工的所需的光束， 机械移动 系统使加工光束与加工样品间发生相对位移， 以加工微纳结构。
9、 如权利要求 8所述激光直写系统， 其特征在于， 所述光源发生系统为可激发材料 光聚合的光束产生系统。
10、 如权利要求 8或 9所述激光直写系统， 其特征在于， 所述光学参数调整系统为 保证光聚合有效发生， 而对光束的传播方向、 强度、 偏振等参数进行调整的光学器件系 统。
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CN110449743A (zh) * 2019-07-24 2019-11-15 广东工业大学 一种多光子聚合面成型三维纳米直写加工系统及方法
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