WO2015111239A1 - Anodized member, and sealing method therefor - Google Patents

Anodized member, and sealing method therefor Download PDF

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WO2015111239A1
WO2015111239A1 PCT/JP2014/066156 JP2014066156W WO2015111239A1 WO 2015111239 A1 WO2015111239 A1 WO 2015111239A1 JP 2014066156 W JP2014066156 W JP 2014066156W WO 2015111239 A1 WO2015111239 A1 WO 2015111239A1
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sealing
anodized
metal
film
concentration
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French (fr)
Japanese (ja)
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新村 仁
庸平 金谷
亮太 柿澤
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アイシン軽金属株式会社
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing
    • C25D11/24Chemical after-treatment
    • C25D11/246Chemical after-treatment for sealing layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/26Anodisation of refractory metals or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/30Anodisation of magnesium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/06Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/08Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/16Pretreatment, e.g. desmutting

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

[Problem] To provide: an anodized member exhibiting excellent alkali resistance and excellent water resistance; and a sealing method therefor. [Solution] An anodized member having an anodic oxide film formed thereon is characterized in that: the anodic oxide film is provided with a high-concentration layer which has a sealing metal content of at least 1.5 mmol/g, and which has a thickness from the surface of at least 0.15 µm; and the deposited amount of the sealing metal is at least 75 mg/m2 with respect to the average film thickness of the anodic oxide film.

Description

陽極酸化処理部材及びその封孔処理方法Anodizing member and sealing method thereof
 本発明は、耐水性のみならず耐アルカリ性に優れた陽極酸化処理部材及びその封孔処理方法に関する。 The present invention relates to an anodized member excellent in not only water resistance but also alkali resistance and a sealing treatment method thereof.
 アルミニウム,マグネシウム,チタン及びそれらの合金の分野においては、防錆,意匠性等を目的に陽極酸化処理が施されている。
 これらの金属表面には、陽極酸化処理により無孔性の薄い数十nm~数百nmの膜厚からなるバリア層と、その上に孔径100Å~600Åの無数の孔を有する多孔質層が形成される。
 多孔質層を有する陽極酸化皮膜のままでは耐食性が劣ることから、各種封孔処理が施されている。
 封孔処理には、水和封孔と、封孔金属を皮膜の孔中に析出される金属塩封孔とがある。
 水和封孔は、耐アルカリ性が不充分である場合が多く、金属塩封孔は表面の白化を抑える耐水性が不充分となる場合が多い。
 そこで本出願人は、先に封孔液を加圧することで耐アルカリ性を向上させる技術を提案している(特許文献1)。
 また、耐水性の向上を目的に封孔金属含有量が1.5mmol/g以上の高濃度層の厚みを0.15μm以上にする技術を提案している(特許文献2)。
 これに対して本発明は、さらに低コストで耐アルカリ性と耐水性を向上させることを目的に検討した結果、得られたものである。
In the fields of aluminum, magnesium, titanium, and alloys thereof, anodization is performed for the purpose of rust prevention, designability, and the like.
On these metal surfaces, a non-porous thin barrier layer having a film thickness of several tens to several hundreds of nanometers and a porous layer having innumerable pores having a diameter of 100 to 600 mm are formed on the metal surface. Is done.
Since the anodic oxide film having a porous layer is inferior in corrosion resistance, various sealing treatments are applied.
Sealing treatment includes hydration sealing and metal salt sealing in which the sealing metal is deposited in the pores of the film.
Hydration pores often have insufficient alkali resistance, and metal salt pores often have insufficient water resistance to suppress surface whitening.
Therefore, the present applicant has previously proposed a technique for improving alkali resistance by pressurizing the sealing liquid (Patent Document 1).
For the purpose of improving water resistance, a technique has been proposed in which the thickness of a high concentration layer having a sealed metal content of 1.5 mmol / g or more is 0.15 μm or more (Patent Document 2).
In contrast, the present invention has been obtained as a result of studies aimed at improving alkali resistance and water resistance at a lower cost.
日本国特許第4884813号公報Japanese Patent No. 4884813 日本国特開2012-144750号公報Japanese Unexamined Patent Publication No. 2012-144750
 本発明は、耐アルカリ性及び耐水性に優れた陽極酸化処理部材及びその封孔処理方法の提供を目的とする。 An object of the present invention is to provide an anodized member excellent in alkali resistance and water resistance and a sealing method thereof.
 本発明に係る陽極酸化処理部材は、陽極酸化皮膜が形成された陽極酸化処理部材であって、陽極酸化皮膜は封孔金属の含有量1.5mmol/g以上の高濃度層が表面から0.15μm以上有し、且つ、陽極酸化皮膜の平均膜厚に対する前記封孔金属の付着量が75mg/m以上であることを特徴とする。
 ここで、封孔金属は、Ni又は、NiとCoとの組み合せであるのが好ましい。
 本発明で陽極酸化皮膜の平均膜厚とは、金属表面に形成される3~30μm程度の皮膜の厚み平均をいい、封孔金属の付着量とは、この平均厚みの被膜表面積1m当たりの封孔金属の量をいう。
The anodized member according to the present invention is an anodized member on which an anodized film is formed. The anodized film has a high-concentration layer having a sealing metal content of 1.5 mmol / g or more from the surface. It has 15 μm or more, and the adhesion amount of the sealing metal with respect to the average film thickness of the anodized film is 75 mg / m 2 or more.
Here, the sealing metal is preferably Ni or a combination of Ni and Co.
In the present invention, the average film thickness of the anodized film refers to the average thickness of the film of about 3 to 30 μm formed on the metal surface, and the amount of sealing metal attached per 1 m 2 of the surface area of the film with the average thickness. The amount of sealing metal.
 このように処理された陽極酸化処理部材は、液温25℃,pH13のアルカリ水溶液による耐アルカリ性試験にて白化時間が10分以上であり、且つ、40℃の純水による耐水試験にて白化時間が240時間以上である特性を有する。
 上記特性を確保するためには、金属表面に多孔性陽極酸化皮膜を形成後にNiのイオン又は、NiとCoとの組み合せイオンの封孔金属イオン濃度4.0~10.0g/l,フッ素イオン濃度1.0~3.0g/lの封孔液に浸漬し、その後に水蒸気封孔処理するのが好ましい。
The anodized member thus treated has a whitening time of 10 minutes or more in an alkali resistance test with an alkaline aqueous solution at a liquid temperature of 25 ° C. and pH 13, and a whitening time in a water resistance test with 40 ° C. pure water. Has a characteristic of 240 hours or more.
In order to secure the above characteristics, the concentration of metal ions sealed with Ni ions or a combination ion of Ni and Co after forming a porous anodic oxide film on the metal surface is 4.0-10.0 g / l, fluorine ions It is preferable to immerse in a sealing liquid having a concentration of 1.0 to 3.0 g / l and then perform a water vapor sealing treatment.
 特許文献1の封孔液を加圧する方法では、加圧手段が必要となる。
 また、特許文献2の方法では、耐水性に優れるものの、高濃度層の表面部だけでは更なる耐アルカリ性の改善の余地があった。
 より具体的に説明すると、特許文献2における封孔液の封孔金属イオン濃度は、30~60mmol/lとなっているが、これはg/l濃度換算すると、Niイオンで3.521g/l、Coイオンで3.813g/lとが60mmol/lに対応する。
 また、特許文献2における封孔液のフッ素イオン濃度は、70~120mmol/lになっているが、これは1.3~2.3g/l相当になる。
 このような封孔液では、陽極酸化皮膜の表面部に封孔金属の高濃度層を0.15μm以上形成することは可能であるが、陽極酸化皮膜の厚みが3~30μmの場合に孔中の封孔金属の付着量が封孔液を加圧する特許文献1の技術よりも少ないことが明らかになった。
 そのために耐アルカリ性が特許文献1の技術レベルになく、耐アルカリ性よりも耐水性が重用視される部品,部材には特許文献2の技術で充分であるが、例えば自動車用部材にあっては耐水性のみならず、優れた耐アルカリ性が要求される場合もあった。
 そこで本発明者らは、封孔液の改善を検討した結果、従来はフッ素イオン濃度を高くすることで、封孔金属の含浸量を増加させるものの陽極酸化皮膜の硬さが低下するという技術的課題があったのに対して、フッ素イオン濃度を1.0~3.0g/lの範囲に抑えつつ、封孔金属イオン濃度を高くすることでの付着量は75mg/m以上にすることができた。
In the method of pressurizing the sealing liquid of Patent Document 1, a pressurizing means is required.
Further, although the method of Patent Document 2 is excellent in water resistance, there is room for further improvement in alkali resistance only at the surface portion of the high concentration layer.
More specifically, the sealing metal ion concentration of the sealing liquid in Patent Document 2 is 30 to 60 mmol / l, which is 3.521 g / l of Ni ions in terms of g / l concentration. , 3.813 g / l of Co ions corresponds to 60 mmol / l.
Further, the fluorine ion concentration of the sealing liquid in Patent Document 2 is 70 to 120 mmol / l, which corresponds to 1.3 to 2.3 g / l.
With such a sealing liquid, it is possible to form a high-concentration layer of a sealing metal on the surface portion of the anodized film in an amount of 0.15 μm or more. However, when the thickness of the anodized film is 3 to 30 μm, It became clear that the adhesion amount of the sealing metal was less than the technique of Patent Document 1 in which the sealing liquid was pressurized.
For this reason, the technology of Patent Document 2 is sufficient for parts and members where alkali resistance is not at the technical level of Patent Document 1 and water resistance is more important than alkali resistance. In addition to the properties, there are cases where excellent alkali resistance is required.
Therefore, the inventors of the present invention have studied the improvement of the sealing liquid, and as a result, it has been known that the hardness of the anodic oxide film is lowered although the amount of impregnation of the sealing metal is increased by increasing the fluorine ion concentration. While there was a problem, the amount of adhesion by increasing the sealing metal ion concentration should be 75 mg / m 2 or more while keeping the fluorine ion concentration in the range of 1.0 to 3.0 g / l. I was able to.
 本発明における陽極酸化処理や封孔液浸漬後の水蒸気処理方法は、特許文献2の内容を取り込むことができ、EDS分析による表面部の封孔金属高濃度層の計測も同様にできる。 The method of water vapor treatment after anodic oxidation treatment or sealing liquid immersion in the present invention can incorporate the contents of Patent Document 2 and can similarly measure the high-concentration sealed metal layer on the surface by EDS analysis.
 本発明に係る陽極酸化処理部材に用いる金属素材は、多孔質皮膜を形成できるものであればよく、例としてアルミニウム,マグネシウム,チタン及びそれらの合金が挙げられる。
 好ましくは、アルミニウム及びその合金である。
 また、陽極酸化処理用の電解液としては、硫酸水溶液,蓚酸水溶液,有機酸水溶液等が例として挙げられる。
 好ましくは、硫酸濃度100~300g/lの水溶液である。
 電解方法も直流,交流,それらの組み合せやパルス波形でもよい。
 さらには、陽極酸化後であって封孔処理前に電解着色や染色等の着色工程が含まれてもよい。
The metal material used for the anodized member according to the present invention may be any material that can form a porous film, and examples thereof include aluminum, magnesium, titanium, and alloys thereof.
Aluminum and its alloys are preferable.
Examples of the electrolytic solution for anodizing treatment include sulfuric acid aqueous solution, oxalic acid aqueous solution, and organic acid aqueous solution.
An aqueous solution having a sulfuric acid concentration of 100 to 300 g / l is preferable.
The electrolysis method may be DC, AC, a combination thereof, or a pulse waveform.
Furthermore, a coloring step such as electrolytic coloring or dyeing may be included after the anodization and before the sealing treatment.
 本発明に係る陽極酸化皮膜の封孔処理を施した陽極酸化処理部材は、40℃の純水に240時間浸漬しても目視で白化が認められず、pH13に調整した例えば25℃の水酸化ナトリウム水溶液に10分間浸漬しても目視で白化が認められない。 The anodized member subjected to the sealing treatment of the anodized film according to the present invention was not visually whitened even when immersed in pure water at 40 ° C. for 240 hours, and was adjusted to pH 13, for example, at 25 ° C. Even when immersed in an aqueous sodium solution for 10 minutes, no whitening is observed visually.
陽極酸化処理及び封孔液の条件及びその性能評価結果を示す。The conditions of anodizing treatment and sealing liquid and the performance evaluation results are shown.
 以下、陽極酸化皮膜の封孔液の相違による性能比較を実施したので説明する。
 金属素材として、JIS A6063Sのアルミニウム合金押出材を用いて常法による脱脂を行い、リン酸系の95~100℃の水溶液を用いて化学研磨処理し、表面を鏡面仕上げした。
 表面を化学研磨することで表面の白化変化が目視で評価しやすくなっている。
 次に硫酸濃度200g/lの電解液を用いて液温20℃,直流電流密度1.0A/dm,40分間電解処理し、平均膜厚12μmの陽極酸化皮膜を得た。
 次に水洗後、図1の表に示す封孔液にて約30℃,20分間浸漬処理し、水洗後に140℃の水蒸気を用いて20分の水和封孔を実施した。
 金属塩の封孔処理液の液温は20~35℃の範囲が好ましく、水和封孔は140℃以上で20分間以上行えば、その効果が概ね飽和する。
 具体的には、140~160℃の水蒸気にて20~30分間接触させる。
Hereinafter, the performance comparison by the difference in the sealing liquid of the anodized film will be described.
As a metal material, a JIS A6063S aluminum alloy extruded material was used for degreasing by a conventional method, and a phosphoric acid-based aqueous solution at 95 to 100 ° C. was used for chemical polishing, and the surface was mirror-finished.
By chemically polishing the surface, it is easy to visually evaluate the whitening change of the surface.
Next, electrolytic treatment was performed using an electrolytic solution having a sulfuric acid concentration of 200 g / l at a liquid temperature of 20 ° C. and a direct current density of 1.0 A / dm 2 for 40 minutes to obtain an anodized film having an average film thickness of 12 μm.
Next, after rinsing with water, it was immersed in a sealing solution shown in the table of FIG. 1 for about 30 ° C. for 20 minutes, and after rinsing with water, hydration sealing was carried out for 20 minutes using 140 ° C. steam.
The temperature of the metal salt sealing treatment liquid is preferably in the range of 20 to 35 ° C., and the effect of hydration sealing is generally saturated when the sealing temperature is 140 ° C. or higher for 20 minutes or longer.
Specifically, it is contacted with steam at 140 to 160 ° C. for 20 to 30 minutes.
<性能評価方法>
 (1)表面部の封孔金属の高濃度層の厚みは、SEM・EDS分析にて含有質量割合を分析し、各元素毎に算出した。
 なお、算出には、Ni:58.7,Co:58.9の原子量を用いた。
 (2)平均膜厚に対しての封孔金属の付着量は、既値の面積の皮膜を溶解し、溶出した金属イオン濃度を原子吸光分光光度計で測定し、得られた濃度から平均膜厚12μmに対する1m当たりの金属イオン付着量を算出した。
 (3)耐水試験
 純水40℃に240時間浸漬後に水洗及び乾燥させ、目視で白化が認められないものを評価「○」とした。
 (4)耐アルカリ性試験
 pH13に調整した25℃の水酸化ナトリウム水溶液に10分間浸漬し、その後水洗及び乾燥させ、目視で白化が認められないものを評価「○」とした。
<Performance evaluation method>
(1) The thickness of the high concentration layer of the sealing metal in the surface portion was calculated for each element by analyzing the content mass ratio by SEM / EDS analysis.
For the calculation, atomic weights of Ni: 58.7 and Co: 58.9 were used.
(2) The amount of the sealing metal with respect to the average film thickness is determined by dissolving the film of the predetermined area, measuring the eluted metal ion concentration with an atomic absorption spectrophotometer, and calculating the average film from the obtained concentration. The metal ion adhesion amount per 1 m 2 with respect to the thickness of 12 μm was calculated.
(3) Water resistance test After immersing in pure water at 40 ° C. for 240 hours, it was washed with water and dried.
(4) Alkali resistance test It was immersed in a 25 ° C. aqueous sodium hydroxide solution adjusted to pH 13 for 10 minutes, then washed with water and dried.
<評価結果>
 実施例1は、封孔金属としてはNiイオン,4.0g/lの封孔液を用いたものであるが、封孔処理後の表面部の高濃度層はNi:2.0mmol/g,厚み0.21μmであり、且つ、皮膜全体(平均膜厚)に対するNiの付着量が77.6mg/mと基準の75mg/lを超えていたので、耐水性も耐アルカリ性も目標をクリアーした。
 これに対して比較例1は、封孔液の封孔金属イオン濃度が1.7g/lと基準の4.0g/lよりも低く、さらにフッ素イオン濃度も0.7g/lと基準の1.0g/lよりも低くかったため、表面部の高濃度層の封孔金属濃度が低く、厚みも0.13μmと基準の0.15μmよりも薄い。
 また、皮膜全体の付着量もNi:42.0mg/mと少なく、耐水性,耐アルカリ性の両方とも基準を満足しなかった。
 比較例2は、高濃度層の基準はクリアーしているが、皮膜全体の付着量が基準以下であったために耐水性は目標をクリアーしているものの、耐アルカリ性が不充分であった。
 実施例2,3は、さらにNi濃度を濃くしたものであり、品質目標が全てクリアーしている。
 実施例4~実施例6は、いずれもNiイオンとCoイオンの混合封孔液であるが、この場合も封孔金属イオン濃度が4.0g/l~10.0g/lの範囲にあり、フッ素イオン濃度が1.0~3.0g/lの範囲にあるため、いずれも耐水性,耐アルカリ性に優れていた。
<Evaluation results>
In Example 1, as the sealing metal, Ni ion, 4.0 g / l sealing liquid was used, but the high concentration layer on the surface portion after the sealing treatment was Ni: 2.0 mmol / g, The thickness was 0.21 μm, and the amount of Ni adhered to the entire film (average film thickness) was 77.6 mg / m 2 , exceeding the standard 75 mg / l. Therefore, both water resistance and alkali resistance cleared the targets. .
On the other hand, in Comparative Example 1, the sealing metal ion concentration of the sealing liquid is 1.7 g / l, which is lower than the standard 4.0 g / l, and the fluorine ion concentration is 0.7 g / l, which is the standard 1 Since it was lower than 0.0 g / l, the concentration of the sealing metal in the high-concentration layer on the surface portion was low, and the thickness was also 0.13 μm, which was thinner than the standard 0.15 μm.
Moreover, the adhesion amount of the whole film was as small as Ni: 42.0 mg / m 2, and neither water resistance nor alkali resistance satisfied the standard.
In Comparative Example 2, although the standard of the high-concentration layer was clear, the amount of adhesion of the entire film was below the standard, so the water resistance was clear from the target, but the alkali resistance was insufficient.
In Examples 2 and 3, the Ni concentration was further increased, and all the quality targets were cleared.
Examples 4 to 6 are all mixed sealing liquids of Ni ions and Co ions. In this case, the concentration of the sealing metal ions is in the range of 4.0 g / l to 10.0 g / l, Since the fluorine ion concentration was in the range of 1.0 to 3.0 g / l, both were excellent in water resistance and alkali resistance.
 本発明に係る陽極酸化処理部材は、耐水性,耐アルカリ性に優れるので、雨水による白化を抑え、高耐食性が要求される自動車の外装部品、例えばドアフレーム,モールディング類,ルーフレール等の付属部品等、自動車用部材,部品として広く展開できる。 The anodizing member according to the present invention is excellent in water resistance and alkali resistance, so it suppresses whitening due to rain water and has high corrosion resistance required, such as exterior parts of automobiles such as door frames, moldings, roof rails, etc. Can be widely deployed as automotive parts and parts.
 高い耐水性及び耐アルカリ性が要求される陽極酸化処理部材に広く適用できる。 Can be widely applied to anodized members that require high water resistance and alkali resistance.

Claims (5)

  1.  陽極酸化皮膜が形成された陽極酸化処理部材であって、
    陽極酸化皮膜は封孔金属の含有量1.5mmol/g以上の高濃度層が表面から0.15μm以上有し、
    且つ、陽極酸化皮膜の平均膜厚に対する前記封孔金属の付着量が75mg/m以上であることを特徴とする陽極酸化処理部材。
    An anodized member formed with an anodized film,
    The anodized film has a high-concentration layer with a sealing metal content of 1.5 mmol / g or more from the surface of 0.15 μm or more,
    And the adhesion amount of the said sealing metal with respect to the average film thickness of an anodized film is 75 mg / m < 2 > or more, The anodized member characterized by the above-mentioned.
  2.  前記封孔金属は、Ni又は、NiとCoとの組み合せであることを特徴とする請求項1記載の陽極酸化処理部材。 The anodizing member according to claim 1, wherein the sealing metal is Ni or a combination of Ni and Co.
  3.  液温25℃,pH13のアルカリ水溶液による耐アルカリ性試験にて白化時間が10分以上であり、
    且つ、40℃の純水による耐水試験にて白化時間が240時間以上であることを特徴とする請求項1又は2に記載の陽極酸化処理部材。
    The whitening time is 10 minutes or more in an alkali resistance test with an aqueous alkali solution at a liquid temperature of 25 ° C. and pH 13,
    And the whitening time is 240 hours or more in the water resistance test by 40 degreeC pure water, The anodized member of Claim 1 or 2 characterized by the above-mentioned.
  4.  請求項1~3のいずれかの陽極酸化処理部材を用いたことを特徴とする自動車用部材。 An automobile member using the anodized member according to any one of claims 1 to 3.
  5.  金属表面に多孔性陽極酸化皮膜を形成後にNiのイオン又は、NiとCoとの組み合せイオンからなる封孔金属イオン濃度4.0~10.0g/l,フッ素イオン濃度1.0~3.0g/lの封孔液に浸漬し、その後に水蒸気封孔処理することを特徴とする陽極酸化皮膜の封孔処理方法。 After forming a porous anodic oxide film on the metal surface, the concentration of sealed metal ions consisting of Ni ions or a combination ion of Ni and Co is 4.0 to 10.0 g / l, and the fluorine ion concentration is 1.0 to 3.0 g. A method for sealing an anodic oxide film, which comprises dipping in a / l sealing solution, followed by water vapor sealing.
PCT/JP2014/066156 2014-01-27 2014-06-18 Anodized member, and sealing method therefor WO2015111239A1 (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03277797A (en) * 1990-03-27 1991-12-09 Okuno Seiyaku Kogyo Kk Sealing treatment of aluminum anodically oxidized film
JP2012144750A (en) * 2011-01-06 2012-08-02 Aisin Keikinzoku Co Ltd Anodized member and method for sealing anodized film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03277797A (en) * 1990-03-27 1991-12-09 Okuno Seiyaku Kogyo Kk Sealing treatment of aluminum anodically oxidized film
JP2012144750A (en) * 2011-01-06 2012-08-02 Aisin Keikinzoku Co Ltd Anodized member and method for sealing anodized film

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