WO2015050040A1 - Plant disease control composition and use thereof - Google Patents

Plant disease control composition and use thereof Download PDF

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Publication number
WO2015050040A1
WO2015050040A1 PCT/JP2014/075544 JP2014075544W WO2015050040A1 WO 2015050040 A1 WO2015050040 A1 WO 2015050040A1 JP 2014075544 W JP2014075544 W JP 2014075544W WO 2015050040 A1 WO2015050040 A1 WO 2015050040A1
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compound
methyl
alkyl group
reaction
tetrazolinone compound
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PCT/JP2014/075544
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French (fr)
Japanese (ja)
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雄一 松崎
真 倉橋
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住友化学株式会社
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Publication of WO2015050040A1 publication Critical patent/WO2015050040A1/en

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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N43/00Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds
    • A01N43/713Biocides, pest repellants or attractants, or plant growth regulators containing heterocyclic compounds having rings with four or more nitrogen atoms as the only ring hetero atoms

Definitions

  • the present invention relates to a plant disease control composition and its use.
  • Patent Documents 1 and 2 Conventionally, many compounds have been developed and put into practical use for controlling plant diseases (see, for example, Patent Documents 1 and 2).
  • An object of the present invention is to provide a composition having an excellent control effect against plant diseases.
  • R 1 represents a C1-C3 alkyl group which may have one or more halogen atoms or a halogen atom
  • R 2 represents a hydrogen atom, a halogen atom or a C1-C3 alkyl group
  • R 3 represents a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a cyclopropyl group, or a C1-C3 alkoxy group optionally having one or more halogen atoms
  • Z 1 represents a C1-C3 alkyl group
  • Z 2 represents a hydrogen atom, a C1-C2 alkoxy group, a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a C1-C2 alkylthio group, or a cyano group
  • Z 3 represents a hydrogen atom, a C1-C3 alkyl group which may have one or
  • ipconazole simeconazole, hymexazole, etridiazole, flutriafol, bixafen, benzobindiflufirfulx Xapyroxad), penthiopyrad (penthiopyrad), N- (1,1,3- trimethyl indane-4-yl) -1-methyl-3-difluoromethyl-4-carboxylic acid amide,
  • R 1 represents a C1-C3 alkyl group which may have one or more halogen atoms or a halogen atom
  • R 2 represents a hydrogen atom, a halogen atom or a C1-C3 alkyl group
  • R 3 represents a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a cyclopropyl group, or a C1-C3 alkoxy group optionally having one or more halogen atoms
  • Z 1 represents a C1-C3 alkyl group
  • Z 2 represents a hydrogen atom, a C1-C2 alkoxy group, a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a C1-C2 alkylthio group, or a cyano group
  • Z 3 represents a hydrogen atom, a C1-C3 alkyl group or a
  • the plant disease control method including the process of processing the effective amount of the tetrazolinone compound shown by 1 and the 1 or more types of fungicidal active compound chosen from a group (A) to the soil which grows a plant or a plant.
  • ipconazole simeconazole, hymexazole, etridiazole, flutriafol, bixafen, benzobindiflufirfulx Xapyroxad), penthiopyrad (penthiopyrad), N- (1,1,3- trimethyl indane-4-yl) -1-methyl-3-difluoromethyl-4-carboxylic acid amide,
  • the plant disease control composition of the present invention (hereinafter referred to as the present composition) is represented by the formula (1). [Wherein R 1 , R 2 , R 3 , Z 1 , Z 2 and Z 3 represent the same meaning as described above. ] And a one or more bactericidal active compounds (hereinafter referred to as the present bactericidal active compound) selected from the group (A).
  • halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • the C1-C3 alkyl group represents a linear or branched alkyl group having 1-3 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, and an isopropyl group.
  • the C1-C3 alkyl group optionally having one or more halogen atoms represents a C1-C3 alkyl group in which one or more hydrogen atoms may be substituted with a halogen atom, such as a methyl group or an ethyl group , Propyl, isopropyl, monofluoromethyl, difluoromethyl, trifluoromethyl, monochloromethyl, dichloromethyl, trichloromethyl, dibromomethyl, chlorofluoromethyl, dichlorofluoromethyl, chlorodifluoromethyl Group, 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, 3-fluoropropyl group, 2,2-difluoropropyl group, 3,3, 3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl
  • the C1-C3 alkoxy group represents a linear or branched alkoxy group having 1 to 3 carbon atoms, and examples thereof include a methoxy group, an ethoxy group, a propoxy group, and an isopropoxy group.
  • the C1-C3 alkoxy group which may have one or more halogen atoms represents a C1-C3 alkoxy group in which one or more hydrogen atoms may be substituted with a halogen atom, such as a methoxy group, an ethoxy group, Propoxy group, isopropoxy group, fluoromethoxy group, difluoromethoxy group, trifluoromethoxy group, chloromethoxy group, dichloromethoxy group, trichloromethoxy group, dibromomethoxy group, chlorofluoromethoxy group, dichlorofluoromethoxy group, chlorodifluoromethoxy group 2-fluoroethoxy group, 2,2-difluoroethoxy group, 2,2,2-tri
  • Examples of the C1-C2 alkoxy group include a methoxy group and an ethoxy group.
  • Examples of the C1-C2 alkylthio group include a methylthio group and an ethylthio group.
  • the tetrazolinone compound can be synthesized, for example, by the following synthesis method.
  • the tetrazolinone compound comprises a compound represented by formula (A1) (hereinafter referred to as compound (A1)) and a compound represented by formula (A2) (hereinafter referred to as compound (A2)) in the presence of a base. It can manufacture by making it react.
  • A1 compound represented by formula (A1)
  • A2 compound represented by formula (A2)
  • R 1 , R 2 , R 3 , Z 1 , Z 2 and Z 3 represent the same meaning as described above, and Z 11 represents a leaving group such as a chlorine atom, a bromine atom or an iodine atom.
  • the reaction is usually performed in a solvent.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichlor
  • Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like.
  • Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide
  • Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide
  • alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride
  • alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
  • the compound (A2) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • sodium iodide, tetrabutylammonium iodide or the like may be added as necessary, and these compounds are usually in a ratio of 0.001 to 1.2 mol with respect to 1 mol of the compound (A1).
  • the tetrazolinone compound Used in After completion of the reaction, the tetrazolinone compound can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Alternatively, the tetrazolinone compound can be isolated by performing post-treatment operations such as filtration and concentration of the reaction mixture. The isolated tetrazolinone compound can be further purified by chromatography, recrystallization or the like.
  • the present tetrazolinone compound represented by the formula (1-B) in which Z 3 is R 100 (hereinafter referred to as the compound (1-B)) is represented by the formula (1-2). It can be produced by reacting a tetrazolinone compound (hereinafter referred to as compound (1-2)) with a halogenating agent.
  • a tetrazolinone compound hereinafter referred to as compound (1-2)
  • R 1 , R 2 , R 3 , Z 1 and Z 2 represent the same meaning as described above, and R 100 represents a halogen atom.
  • the reaction is usually performed in a solvent.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile, And mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1
  • halogenating agent used in the reaction examples include N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, chlorine, bromine, iodine, and sulfuryl chloride.
  • the halogenating agent is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (1-2).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (1-B) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated tetrazolinone compound can be further purified by chromatography, recrystallization or the like.
  • solvent used in the reaction examples include ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether, n-heptane, n -Hydrocarbons such as hexane, cyclohexane, n-pentane, toluene, xylene, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, acetonitrile, propionitrile, etc.
  • ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diiso
  • acid amides such as N-methylpyrrolidone
  • sulfoxides such as dimethyl sulfoxide
  • methanol, ethanol, propano Le alcohols and mixtures thereof, such as butanol.
  • cyanating agent used in the reaction include phosphorus oxychloride, phosphorus pentachloride, and phosphorus oxybromide.
  • a base may be used.
  • the base used examples include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicyclone. And organic bases such as decene and diazabicyclononene. These bases can also be used as a solvent.
  • the cyanating agent is usually used at a ratio of 1 to 20 moles and the base is usually used at a ratio of 1 to a large excess mole.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 72 hours.
  • the compound (1-C) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the compound (1-C) can be isolated by filtering the precipitate. Further, it may be purified by operations such as chromatography and recrystallization.
  • a compound represented by formula (11) (hereinafter referred to as compound (11)) is obtained by reacting a compound represented by formula (10) (hereinafter referred to as compound (10)) with an azidating agent. Can be synthesized. [Wherein R 3 represents the same meaning as described above. ]
  • the reaction is usually performed in a solvent.
  • the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, acetonitrile, nitriles and mixtures thereof, such as propionitrile and the like.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-d
  • the azidating agent used in the reaction examples include inorganic azides such as sodium azide, barium azide and lithium azide, and organic azides such as trimethylsilyl azide and diphenylphosphoryl azide.
  • the azidating agent is usually used at a ratio of 1 to 10 moles relative to 1 mole of the compound (10).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • a Lewis acid such as aluminum chloride or zinc chloride may be added as necessary, and these compounds are usually used at a ratio of 0.05 to 5 mol with respect to 1 mol of compound (10). It is done.
  • the compound (11) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (11) can be further purified by chromatography, recrystallization and the like.
  • the compound represented by the formula (13) (hereinafter referred to as the compound (13)) is obtained by mixing the compound (11) and the compound represented by the formula (12) (hereinafter referred to as the compound (12)) with the presence of a base. It can synthesize
  • R 3 represents the same meaning as described above, and Z 5 represents a leaving group such as a bromine atom, an iodine atom, a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group, and a p-toluenesulfonyloxy group.
  • the reaction is usually performed in a solvent.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichlor
  • alkyl halides such as methyl bromide and methyl iodide
  • dialkyl sulfates such as dimethyl sulfate
  • alkyl sulfates such as methyl p-toluenesulfonate and methyl methanesulfonate
  • aryl sulfates Can be mentioned.
  • Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like.
  • Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide
  • Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide
  • alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride
  • alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Lithium hydride, sodium hydride, an alkali metal hydride such as potassium hydride, sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
  • the compound (12) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 0.5 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (13) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (13) can be further purified by chromatography, recrystallization and the like.
  • Compound (A1) can be synthesized by reacting compound (13) with a halogenating agent. [Wherein R 3 and Z 11 represent the same meaning as described above. ] The reaction is usually performed in a solvent.
  • the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • ethers such as methyl tert-butyl ether, diisopropyl ether, carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, fluorobenzene, difluorobenzene, trifluorobenzene, chlorobenzene, dichlorobenzene, trichlorobenzene , ⁇ , ⁇ , ⁇ -trifluorotoluene, halogenated hydrocarbons such as ⁇ , ⁇ , ⁇ -trichlorotoluene, esters such as ethyl acetate and methyl acetate, acetone, methyl ethyl ketone, methyl Ketones such as isobutyl ketone, acetonitrile, nitriles and mixtures thereof, such as propionitrile and the like.
  • ethers such as methyl tert-butyl ether
  • halogenating agent examples include a chlorinating agent, a brominating agent, or an iodinating agent such as chlorine, bromine, iodine, sulfuryl chloride, N-chlorosuccinimide, N-bromosuccinimide, 1,3-dibromo. -5,5-dimethylhydantoin, iodosuccinimide, tert-butyl hypochlorite, N-chloroglutarimide, N-bromoglutarimide, N-chloro-N-cyclohexyl-benzenesulfonimide, N-bromophthalimide .
  • a radical initiator can also be used for this reaction.
  • the radical initiator used in the reaction examples include benzoyl peroxide, azobisisobutyronitrile (AIBN), azobiscyclohexanecarbonitrile and the like.
  • the halogenating agent is usually used in a proportion of 1 to 10 mol and the radical initiator is usually used in a proportion of 0.01 to 1 mol with respect to 1 mol of the compound (13).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (A1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (A1C) can be further purified by chromatography, recrystallization, and the like.
  • a compound represented by formula (15) is a compound represented by formula (A1-D) in which R 6 is Z 6 (hereinafter referred to as compound (15)).
  • A1-D)) and a compound represented by formula (14) (hereinafter referred to as compound (14)) can be produced.
  • Z 11 and Z 6 represent the same meaning as described above, R 4 represents a C1-C12 alkyl group or a phenyl group, and M represents sodium, potassium, or lithium.
  • the reaction is usually performed in a solvent.
  • solvent used in the reaction examples include ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether, n-heptane, n -Hydrocarbons such as hexane, cyclohexane, n-pentane, toluene, xylene, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, acetonitrile, propionitrile, etc.
  • ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diiso
  • Nitriles N, N-dimethylformamide, 1,3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, Ketones such as Louis Seo ketone, methanol, ethanol, propanol, and mixtures thereof, such as butanol.
  • compound (14) sodium methoxide, sodium ethoxide, sodium propoxide, sodium butoxide, sodium isopropoxide, sodium sec-butoxide, sodium tert-butoxide, potassium methoxide, potassium ethoxide, potassium propoxide, potassium Examples include butoxide, potassium isopropoxide, potassium sec-butoxide, potassium tert-butoxide, sodium phenoxide and the like.
  • compound (14) is usually used at a ratio of 1 to 10 mol with respect to 1 mol of compound (A1-D).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (15) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, purification may be performed by operations such as distillation, chromatography, recrystallization and the like.
  • the compound represented by formula (16) (hereinafter referred to as compound (16)) can be synthesized by coupling reaction of compound (15) and compound (7) in the presence of a base and a catalyst.
  • R 4 and Z 6 represent the same meaning as described above, R 3A represents a C1-C3 alkyl group or a cyclopropyl group, and Z 7 represents B (OH) 2 , an alkoxyboryl group, or a trifluoroborate salt. It represents a - (BF 3 K +).
  • the reaction is usually performed in a solvent.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, methanol, ethanol, propanol, alcohols such as butanol, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon t
  • organic boron compound (7) used in the reaction a commercially available one is usually used, or N.I. Miyaura and A.M. Suzuki, Chem. Rev. , 1995, 95, 2457, etc., and those synthesized by known methods can also be used.
  • Organoboron compounds used in the reaction (7) for example, after the reaction of alkyllithium and butyl Do lithium iodide compound of R 3A (R 3A -I) or bromo compound (R 3A -Br), Boronic ester derivatives can be synthesized by reacting with borate esters. Further, a boronic acid derivative can be synthesized by hydrolyzing the boronic acid ester derivative obtained by the above-described reaction as necessary.
  • Catalysts used in the reaction include palladium (II) acetate, dichlorobis (triphenylphosphine) palladium, tetrakistriphenylphosphinepalladium (0), palladium (II) acetate / triscyclohexylphosphine, bis (diphenylphosphaneferrocenyl) ) Palladium (II) dichloride, 1,3-bis (2,6-diisopropylphenyl) imidazol-2-ylidene (1,4-naphthoquinone) palladium dimer, allyl (chloro) (1,3-dimesityl-1,3- Dihydro-2H-imidazol-2-ylidene) palladium or palladium (II) acetate / dicyclohexyl (2 ′, 4 ′, 6′-triisopropylbiphenyl-2-yl) phos
  • Examples of the base used in the reaction include organic bases such as triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene and diazabicyclononene.
  • organic bases such as triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene and diazabicyclononene.
  • Alkali metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, etc., lithium hydroxide, sodium hydroxide, Alkali metal hydroxides such as potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metal hydrides such as lithium hydride, sodium hydride and potassium hydride ,Rin Alkali metal phosphates such as tripotassium, sodium methoxide, sodium ethoxide, sodium tert- butoxide, alkali metal alkoxides such as potassium tert- butoxide.
  • the compound (7) is usually used in a proportion of 1 to 10 mol
  • the base is usually in a proportion of 1 to 10 mol
  • the catalyst is usually used in a proportion of 0.0001 to 1 mol. It is done.
  • the reaction temperature is usually in the range of 0 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (16) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (16) can be further purified by chromatography, recrystallization and the like.
  • a compound represented by the formula (A1-F) (hereinafter referred to as compound (A1-F)) can be produced by reacting compound (16) with a halogenating agent.
  • a halogenating agent e.g., a halogenating agent for reacting compound (16) with a halogenating agent.
  • R 3A , R 4 and Z 6 represent the same meaning as described above.
  • the reaction is usually performed in a solvent.
  • the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane.
  • Halogenated hydrocarbons such as chlorobenzene, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, nitriles such as acetonitrile and propionitrile, organic acids such as formic acid, acetic acid and trifluoroacetic acid, water and mixtures thereof.
  • Examples of the halogenating agent used in the reaction include hydrochloric acid, hydrobromic acid, and hydriodic acid.
  • the halogenating agent is usually used at a ratio of 1 mol or more per 1 mol of the compound (16).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (A1-F) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, purification may be performed by operations such as distillation, chromatography, recrystallization and the like.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichlor
  • Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like.
  • Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide
  • Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide
  • alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride
  • alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
  • the compound (XG1) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • sodium iodide or tetrabutylammonium iodide may be added as necessary. These compounds are usually added in an amount of 0.001 to 1.2 mol per 1 mol of the compound (A1). Used in proportions.
  • the compound (XG2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • compound (XG2) can be isolated by performing post-treatment operations such as filtration and concentration of the reaction mixture. Further, it can be purified by chromatography, recrystallization or the like.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichlor
  • Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like.
  • Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide
  • Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide
  • alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride
  • alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium methoxide, sodium ethoxide, sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
  • the compound (XH1) is usually used at a ratio of 1 to 10 moles, and the base is usually used at a ratio of 1 to 10 moles.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • additives may be added as necessary, and examples of the additive include 18-crown-6 and dibenzo-18-crown-6. These additives are usually used in a proportion of 0.001 to 1.2 mol with respect to 1 mol of compound (XG2).
  • the compound (XH2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
  • a compound represented by the formula (XI1) (hereinafter referred to as compound (XI1)) can be produced by reacting compound (XH2) with hydrazines. [Wherein R 1 , R 2 , R 3 , R 92 and Z 3 represent the same meaning as described above. ] The reaction is usually performed in a solvent.
  • solvent used in the reaction examples include ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether, n-heptane, n -Hydrocarbons such as hexane, cyclohexane, n-pentane, toluene, xylene, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, acetonitrile, propionitrile, etc.
  • ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diiso
  • hydrazines used in the reaction include hydrazine monohydrate, hydrazine hydrochloride, hydrazine sulfate, and anhydrous hydrazine. In the reaction, hydrazines are usually used at a ratio of 1 to 100 mol with respect to 1 mol of compound (XH2).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (XI1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it may be purified by operations such as chromatography and recrystallization.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichlor
  • a commercially available product can be used as the compound (XJ1) used in the reaction.
  • a commercially available product can be used.
  • a base may be used. Examples of the base used include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicyclone.
  • Organic bases such as decene and diazabicyclononene, alkali metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate and cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate and cesium hydrogen carbonate Salts, alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride, cesium fluoride, lithium hydride, sodium hydride , Potassium hydride Alkali metal hydrides, lithium hydride, sodium hydride, an alkali metal hydride such as potassium hydride, sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
  • alkali metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate and cesium carbonate
  • alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium
  • compound (XJ1) is usually used in a proportion of 1 to 10 mol
  • base is usually used in a proportion of 1 to 10 mol
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (XJ2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
  • a compound represented by the formula (XK1) (hereinafter referred to as compound (XK1)) can be produced by reacting compound (XJ2) with a hydrolyzing agent.
  • a hydrolyzing agent e.g., water, alcohols such as methanol, ethanol, propanol, and butanol, hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, and diethyl ether.
  • the hydrolyzing agent used in the reaction examples include bases such as potassium hydroxide aqueous solution and sodium hydroxide aqueous solution, and acids such as hydrochloric acid and sulfuric acid.
  • the hydrolyzing agent is usually used at a ratio of 0.5 to 20 mol with respect to 1 mol of the compound (XJ2).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 72 hours.
  • the compound (XK1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (XK1) can be further purified by operations such as chromatography and recrystallization.
  • a compound represented by the formula (XL1) (hereinafter referred to as compound (XL1)) can be produced by reacting compound (XK1) with a halogenating agent.
  • a halogenating agent e.g., a halogenating agent for reacting compound (XK1) with a halogenating agent.
  • R 1 , R 2 , R 3 , R 100 , Z 1 and Z 3 represent the same meaning as described above.
  • the reaction is usually performed in a solvent.
  • the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether and diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane and chlorobenzene, esters such as ethyl acetate and methyl acetate , Ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, nitriles such as acetonitrile and propionitrile, and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane and chlorobenzene
  • esters such as ethyl acetate and methyl acetate
  • Ketones such as acetone, methyl eth
  • halogenating agent used in the reaction examples include phosphorus oxychloride, phosphorus trichloride, phosphorus pentachloride, thionyl chloride, phosphorus oxybromide, phosphorus tribromide, phosphorus pentabromide, phosphorus triiodide, and dichloride.
  • the halogenating agent is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (XK1).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • a catalyst may be added, and N, N-dimethylformamide, triethylamine, diisopropylethylamine or the like is used, and the catalyst is used in a ratio of 0.001 to 1 mol with respect to 1 mol of compound (XK1).
  • the compound (XL1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (XL1) may be further purified by operations such as chromatography and recrystallization.
  • Compound (C1) can be produced by reacting compound (XL1) with an amidating agent.
  • R 1 , R 2 , R 3 , R 100 , Z 1 and Z 3 represent the same meaning as described above.
  • the solvent used in the reaction include diethyl ether, tetrahydrofuran, 1,4-dioxane, ethers such as ethylene glycol-lucmethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether, n-heptane, n -Hydrocarbons such as hexane, cyclohexane, n-pentane, toluene, xylene, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, acetonitrile,
  • the amidating agent used in the reaction include an aqueous ammonia solution, ammonia hydrochloride, ammonia sulfate, and ammonia gas.
  • An amidating agent can also be used as a solvent.
  • an amidating agent is usually used in a proportion of 1 mol to large excess with respect to 1 mol of compound (XL1).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 72 hours.
  • the compound (C1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the compound (C1) can be isolated by filtering the precipitate. Further, it may be purified by operations such as chromatography and recrystallization.
  • Compound (A2) can be produced by reacting a compound represented by the formula (YA1) (hereinafter referred to as compound (YA1)) with an acid.
  • YA1 a compound represented by the formula (YA1)
  • R 1 , R 2 , R 92 , Z 1 , Z 2 and Z 3 represent the same meaning as described above.
  • the reaction is usually performed in a solvent.
  • the solvent used in the reaction include alcohols such as methanol, ethanol, propanol, and butanol, water, acetic acid, and mixtures thereof.
  • the acid used in the reaction include acetic acid, hydrochloric acid, and hydrobromic acid, and these aqueous solutions can also be used as a solvent.
  • the reaction an acid is usually used in a large excess amount relative to 1 mol of the compound (YA1).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 100 hours.
  • the compound (A2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the compound (A2) can be isolated by performing post-treatment operations such as concentration of the reaction mixture. Further, it can be purified by chromatography, recrystallization or the like.
  • Compound (YA1) can be produced by reacting a compound represented by formula (YB1) (hereinafter referred to as compound (YB1)) with compound (XJ1) in the presence of a base. [Wherein R 1 , R 2 , R 92 , Z 1 , Z 2 , Z 3 and Z 5 represent the same meaning as described above. ] This reaction can be carried out according to Reference Synthesis Method J.
  • a compound represented by formula (YC3) (hereinafter referred to as compound (YC3)) is a compound represented by formula (YC1) (hereinafter referred to as compound (YC1)) and a compound represented by formula (YC2) ( Hereinafter, it can be produced by reacting compound (YC2)) in the presence of a base.
  • YC3 a compound represented by formula (YC1)
  • YC2 a compound represented by formula (YC2)
  • R 1 , R 2 and Z 3 represent the same meaning as described above.
  • the reaction is usually performed in a solvent.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 Acid amides such as 1,3-dimethyl-2-imidazolidinone and N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile Beauty mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 Acid
  • Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like.
  • Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide
  • Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide
  • alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride
  • alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
  • the compound (YC2) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 78 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 72 hours.
  • the compound (YC3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
  • Compound (XG1) can be produced by reacting compound (YC3) in the presence of an acid.
  • R 1 , R 2 and Z 3 represent the same meaning as described above.
  • the reaction is usually performed in a solvent.
  • the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, nitromethane, acetonitrile, propionitrile, etc. Nitriles, and mixtures thereof.
  • the acid used in the reaction include aluminum trichloride, titanium tetrachloride, iron trichloride, hydrogen fluoride, hypochlorous acid, polyphosphoric acid, and the like.
  • an acid is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (YC3).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 72 hours.
  • the compound (XG1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
  • a compound represented by formula (YE3) (hereinafter referred to as compound (YE3)) is a compound represented by formula (YE1) (hereinafter referred to as compound (YE1)) and a compound represented by formula (YE2). (Hereinafter referred to as compound (YE2)) in the presence of a base.
  • YE3 a compound represented by formula (YE1)
  • YE2 a compound represented by formula (YE2)
  • R 1 , R 2 , R 92 and Z 3 represent the same meaning as described above.
  • the reaction is usually performed in a solvent.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichlor
  • Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like.
  • Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide
  • Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide
  • alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride
  • alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
  • the compound (YE2) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • an additive may be added as necessary, and examples of the additive include 18-crown-6-ether and dibenzo-18-crown-6-ether. These additives are usually used in a proportion of 0.001 to 1.2 mol with respect to 1 mol of the compound (YE1).
  • the compound (YE3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
  • Compound (YB1) can be produced by reacting compound (YF2) with hydrazines. [Wherein R 1 , R 2 , R 92 , Z 2 and Z 3 represent the same meaning as described above. ] This reaction can be carried out according to Reference Synthesis Method I.
  • a compound represented by formula (YH3) (hereinafter referred to as compound (YH3)) is a compound represented by formula (YH1) (hereinafter referred to as compound (YH1)) and a compound represented by formula (YH2) ( Hereinafter, it can be produced by reacting with compound (YH2).
  • R 1 , R 2 , R 3 , R 92 , R 100 and Z 3 represent the same meaning as described above, Rf represents a C1-C3 perfluoroalkyl group, and n represents 0 or 1.
  • the reaction is usually carried out in a solvent.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile, Methanol, ethanol, alcohols such as isopropanol, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane
  • compound (YH2) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (YH1).
  • the reaction temperature of the reaction is usually in the range of ⁇ 78 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 72 hours.
  • the compound (YH3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
  • a compound represented by the formula (YI1) (hereinafter referred to as compound (YI1)) can be produced by reacting compound (YH3) in the presence of an acid.
  • R 1 , R 2 , R 92 , Z 3 and Rf represent the same meaning as described above.
  • the reaction is usually performed in a solvent.
  • the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile, Methanol, ethanol, alcohols such as isopropanol, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane
  • Examples of the acid used in the reaction include acetic acid, hydrochloric acid, hydrobromic acid and the like, and these aqueous solutions can also be used as a solvent.
  • an acid is usually used at a ratio of 1 to 10 mol with respect to 1 mol of the compound (YH3).
  • the reaction temperature of the reaction is usually in the range of ⁇ 78 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 72 hours.
  • the compound (YI1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
  • the compound represented by the formula (YJ1) (hereinafter referred to as the compound (YJ1)) can be produced by reacting the compound (YE3) with the compound (YH2). [Wherein, n, R 1 , R 2 , R 92 , R 100 and Z 3 represent the same meaning as described above. ] The reaction is performed in a solvent or without a solvent.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile, And mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1
  • An acid may be added to the reaction if necessary.
  • the acid used in the reaction include hydrochloric acid, sulfuric acid, acetic acid, hydrobromic acid, p-toluenesulfonic acid and the like.
  • the compound (YE3) is usually used in a proportion of 1 to 100 mol
  • the acid is usually used in a proportion of 1 to 100 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the reaction mixture is concentrated under reduced pressure, extracted with an organic solvent, and the organic layer is dried, concentrated, filtered and post-treatment operations such as filtration can be performed to isolate the compound (YJ1).
  • the isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
  • the compound represented by the formula (YK1) (hereinafter referred to as the compound (YK1)) is the same as the compound represented by the formula (YJ1K) (hereinafter referred to as the compound (YJ1K)) and N, N-dimethylformamide and oxy. It can be produced by reacting with a formylating agent prepared from phosphorus chloride and then reacting with water. [Wherein, R 1 , R 2 and R 92 represent the same meaning as described above. ] The reaction is usually performed in a solvent.
  • solvent used in the reaction examples include hydrocarbons such as n-heptane, n-hexane, cyclohexane and n-pentane, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, methyl tert.
  • -Ethers such as butyl ether and diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1,3-dimethyl-2 Acid amides such as imidazolidinone and N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, acetonitrile Nitriles such as propionitrile and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenz
  • the formylating agent in the reaction is a mixture of 1 to 10 mol of N, N-dimethylformamide and 1 to 10 mol of phosphorus oxychloride with respect to 1 mol of compound (YJ1K), and water is compound (YJ1K). ) It is used at a ratio of 1 to 10 moles per mole.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (YK1) may be isolated by performing post-treatment operations such as adding usually 1 mol or more of water, extracting the reaction mixture with an organic solvent, and drying and concentrating the organic layer. it can.
  • the isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichlor
  • Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like.
  • Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide
  • Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide
  • alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride
  • alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
  • the compound (YL1) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the reaction is carried out by reacting the compound (YL1) with an alkali metal carbonate, alkali metal hydrogencarbonate, alkali metal hydroxide, alkali metal halide, alkali metal hydride or alkali metal alkoxide.
  • a salt can be prepared in advance and used in the reaction.
  • the metal salt of the compound (YL1) examples include sodium methoxide, sodium ethoxide, sodium propoxide, sodium isopropoxide, potassium methoxide, potassium ethoxide, sodium thiomethoxide, sodium thioethoxide. Is mentioned.
  • the metal salt of compound (YL1) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (YK1).
  • the compound (YL2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the compound (YL2) can be isolated by performing post-treatment operations such as filtration and concentration of the reaction mixture. Further, it can be purified by chromatography, recrystallization or the like.
  • Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether.
  • Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
  • halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichlor
  • Examples of the reducing agent used in the reaction include metal boronate compounds such as lithium borohydride, sodium borohydride and potassium borohydride, and trialkylsilane compounds such as triethylsilane.
  • Examples of the acid used in the reaction include boron trifluoride and trifluoroacetic acid.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (YI2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • compound (YI2) can be isolated by performing post-treatment operations such as filtration and concentration of the reaction mixture. Further, it can be purified by chromatography, recrystallization or the like.
  • Each of the present bactericidal active compounds has an action mechanism different from that of the present tetrazolinone compound, and is classified into the following groups (A1) and (A2).
  • Group (A1) azole compound propiconazole, prothioconazole, triazimenol, prochloraz, penconazole, tebuconazole, flusilazole, diniconazole, bromconazole, epoxiconazole, difenoconazole, cyproconazole, metconazole, triflumizole, tetra
  • Group (A2) carboxamide compounds bixafen, benzobindiflupyr, floxapyroxide, penthiopyrad, N- (1,1,3-trimethylindan-4-yl) -1-methyl-3-difluoromethylpyrazole-4- Carboxylic acid amide, A compound represented by the following formula (b): The group consisting of isofetamide, isopyrazam, boscalid, fluopyram, sedaxane, penflufen, flutolanil, mepronil, carboxin, tifluzamide and flametopyr.
  • bactericidal active compounds are all known compounds, and are described in, for example, “THE PESTICIDE MANUAL-14th EDITION (BCPC) ISBN 190139396142”, International Publication No. 2011/162397, or International Publication No. 2007/072999. ing. These compounds can be obtained from commercial preparations or synthesized by known methods.
  • N- (1,1,3-trimethylindan-4-yl) -1-methyl-3-difluoromethylpyrazole-4-carboxylic acid amide in the present invention a compound represented by the formula (a1) And / or formula (a2) The compound represented by these is mention
  • the bactericidal active compounds are shown in [Table 1] and [Table 2].
  • the composition of the present invention may be a mixture of the tetrazolinone compound and the bactericidal active compound itself, but the composition of the present invention is usually mixed with the tetrazolinone compound, the bactericidal active compound and an inert carrier, if necessary. A surfactant and other formulation adjuvants are added.
  • the composition of the present invention may be formulated into oils, emulsions, flowables, wettable powders, granular wettable powders, powders, granules and the like. Such a preparation can be used as a plant disease control agent as it is or with addition of other inactive ingredients.
  • the composition of the present invention contains the present tetrazolinone compound and the present bactericidal active compound in a total amount of usually 0.1 to 99% by weight, preferably 0.2 to 90% by weight, more preferably 1 to 80% by weight.
  • Examples of the solid carrier used in the formulation include clays (for example, kaolin, diatomaceous earth, synthetic hydrous silicon oxide, fubasamic clay, bentonite, acidic clay), talc, and other inorganic minerals (for example, sericite, Examples thereof include fine powders or granular materials such as quartz powder, sulfur powder, activated carbon, calcium carbonate, and hydrated silica).
  • Examples of the liquid carrier include water and alcohols (eg, methanol, ethanol).
  • Ketones for example, acetone, methyl ethyl ketone
  • aromatic hydrocarbons for example, benzene, toluene, xylene, ethylbenzene, methylnaphthalene
  • aliphatic hydrocarbons for example, n-hexane, cyclohexanone, kerosene
  • esters for example, ethyl acetate, butyl acetate
  • nitriles for example, acetonitrile, isobutyronitrate
  • ethers e.g., dioxane, diisopropyl d - ether
  • acid amides e.g., DMF, dimethylacetamide
  • halogenated hydrocarbons e.g., dichloroethane, trichlorethylene, carbon tetrachloride
  • surfactant examples include alkyl sulfates, alkyl sulfonates, alkyl aryl sulfonates, alkyl aryl ethers and polyoxyethylene compounds thereof, polyoxyethylene glycol ethers, polyvalent Examples include alcohol esters and sugar alcohol derivatives.
  • formulation adjuvants include, for example, fixing agents, dispersants, and stabilizers.
  • casein gelatin, polysaccharides (for example, starch, arabic gum, cellulose derivatives, alginic acid), lignin derivatives, Bentonite, sugars, synthetic water-soluble polymers (for example, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylic acids), PAP (isopropyl acid phosphate), BHT (2,6-di-tert-butyl-4-methylphenol) ), BHA (mixture of 2-tert-butyl-4-methoxyphenol and 3-tert-butyl-4-methoxyphenol), vegetable oil, mineral oil, fatty acid or ester thereof, and the like.
  • polysaccharides for example, starch, arabic gum, cellulose derivatives, alginic acid
  • lignin derivatives Bentonite
  • sugars synthetic water-soluble polymers (for example, polyvinyl alcohol, polyvinyl pyrrol
  • composition of the present invention is also prepared by formulating the tetrazolinone compound and the bactericidal active compound by the above-described methods, and then diluting with water as necessary to prepare the tetrazolinone compound and the bactericidal active compound.
  • composition of the present invention can be used to protect plants from plant diseases.
  • the control method of the present invention comprises treating a plant or soil for cultivating the plant with the present composition, or treating the tetrazolinone compound and the bactericidal active compound separately on the soil for cultivating the plant or plant, Can control disease
  • the method of applying the composition of the present invention is not particularly limited as long as the composition of the present invention can be applied substantially, but for example, treatment of plants such as foliage spraying, plants such as soil treatment, etc. To seeds such as seed sterilization and so on.
  • the application amount of the composition of the present invention varies depending on weather conditions, formulation form, application time, application method, application location, target disease, target crop, etc., but is usually 1 to 500 g, preferably 2 to 200 g per 1000 m 2. is there.
  • Emulsions, wettable powders, suspensions and the like are usually diluted with water and applied.
  • the concentration of the composition of the present invention after dilution is usually 0.0005 to 2% by weight, preferably 0.005 to It is 1% by weight, and powders, granules and the like are usually applied as they are without dilution.
  • the amount of the composition of the present invention per 1 kg seed is usually applied in the range of 0.001 to 100 g, preferably 0.01 to 50 g.
  • habitats for plant diseases in the present invention include paddy fields, fields, tea gardens, orchards, non-agricultural lands, houses, seedling trays and seedling boxes, seedling culture soils and seedling mats.
  • composition of the present invention can be used as a plant disease control agent in agricultural land such as fields, paddy fields, lawns, orchards.
  • the composition of the present invention can control diseases of the cultivated land in cultivated lands where the following “plants” and the like are cultivated.
  • Agricultural crops corn, rice, wheat, barley, rye, oats, sorghum, cotton, soybeans, peanuts, buckwheat, sugar beet, rapeseed, sunflower, sugarcane, tobacco, etc., vegetables; solanaceous vegetables (eggplants, tomatoes, peppers) , Pepper, potato, etc.), cucurbitaceae vegetables (cucumber, pumpkin, zucchini, watermelon, melon, etc.), cruciferous vegetables (radish, turnip, horseradish, cold rabi, Chinese cabbage, cabbage, mustard, broccoli, cauliflower -), Asteraceae vegetables (burdock, garlic, artichoke, lettuce, etc.), Liliaceae vegetables (leek, onion, garlic, asparagus), Aceraceae vegetables (carrots, parsley, celery, American redfish, etc.) , Red vegetables (spinach, chard, etc.), perilla vegetables (perilla, mint, basil) ), Strawberry, sweet potato, yam, taro, etc
  • Trees other than fruit trees tea, mulberry, flowering trees, street trees (ash, birch, dogwood, eucalyptus, ginkgo, lilac, maple, oak, poplar, redwood, fu, sycamore, zelkova, black bean, peach tree, tsuga, rat, Pine, spruce, yew).
  • plants include genetically modified crops.
  • phytopathogenic fungi such as filamentous fungi, and the following can be mentioned in more detail, but are not limited thereto.
  • Rice diseases blast (Magnaporthe grisea), sesame leaf blight (Cochliobolus miyabeanus), blight (Rhizoctonia solani), idiotic seedling (Gibberella fujikuruoi).
  • Wheat diseases powdery mildew (Erysiphe graminis), red mold disease (Fusarium gramaminerum, F. avenacerum, F. culmorum, Microdochium nitrid, red rust (Puccinia isp.
  • Ustilago nuda Ustilago nuda
  • cloud disease Rhynchosporium secalis
  • reticular disease Pyrenophora teres
  • spot disease Cochliobolus sativus
  • leafy leaf disease Pyrenophora graminea
  • Rhizonia a Diseases of corn: smut (Ustilago maydis), sesame leaf blight (Cochliobolus heterostrohus), leprosy (Gloeocercospora sorgi), southern rust (Puccinia polysoria), gray leaf spot disease Rhizoctonia solani due to seedling.
  • pirina Black spot (Alternaria alternata Japan pearpathotype), Gimnosporangium haraeumto, disease Peach diseases: Monilinia fracticola, black scab (Cladosporium carpophilum), Phomopsis spoilage (Phomopsis sp.). Grape diseases: black scab (Elsinoe ampelina), late rot (Glomerella gingulata), powdery mildew (Uncinula adipelodia), black rot (Gikonivaladi) .
  • Oyster diseases Anthracnose (Gloeosporium kaki), deciduous leaf disease (Cercospora kaki, Mycosphaerella nawae). Diseases of cucurbits: Anthracnose (Colletotrichum lagenarium), powdery mildew (Sphaerotheca furiginea), vine blight (Mycosphaerella meloniis), vine scab (Fusarium oxysporum), por disease (fusarium oxysporum) ), Seedling blight (Pythium sp.); Diseases of tomato: Alternaria solani, leaf mold (Cladosporium fulvum), plague (Phytophthora infestans).
  • Potato diseases Alternaria solani, Phytophthora infestans, Sputum rot septica, Spongosporia subteranean f.
  • Strawberry disease powdery mildew (Sphaerotheca humuli), anthracnose (Glomerella singulata).
  • Tea diseases net blast (Exobasidium reticulatum), white scab (Elsinoe leucospila), ring spot disease (Pestalotiosis sp.), Anthracnose (Colletotrichum theae-sinensis).
  • Tobacco disease Alternaria longipes, powdery mildew (Erysiphe cichoracearum), anthracnose (Colletotrichum tabacum), downy mildew (Peronospora tabacina), epidemic (Phytophyti. Rapeseed diseases: Sclerotinia sclerotiorum, Rhizoctonia solani, and Rhizoctonia solani. Cotton disease; Rhizoctonia solani caused by Rhizoctonia spp. Diseases of sugar beet: brown spot disease (Cercospora beticola), leaf rot (Thanatephorus cucumeris), root rot (Thanatephorus cucumeris), black root disease (Aphanomyces cochlioides).
  • Rose diseases black spot (Diplocarpon rosae), powdery mildew (Sphaerotheca pannosa), downy mildew (Peronospora sparsa).
  • Diseases of chrysanthemum and asteraceae vegetables downy mildew (Bremia lactucae), brown spot disease (Septoria chrysanthemi-indici), white rust (Puccinia horiana).
  • Diseases of various crops Diseases caused by Pythium spp.
  • Aspergillus genus Penicillium genus, Fusarium genus, Gibberella genus, Tricoderder genus, Thielaviopsis genus, Rhizopus genus, Mucor genus, Corticium genus, Phoma genus, Rhizoctonia genus Disease. Viral diseases of various crops mediated by Polymixa genus or Olpidium genus.
  • Synthesis example 2 In Synthesis Example 1, 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 3 was used instead of 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
  • Synthesis example 3 In Synthesis Example 1, 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 10 was used instead of 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
  • Synthesis example 5 In Synthesis Example 1, 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 43 was used instead of 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
  • Synthesis example 7 In Synthesis Example 1, instead of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, 4- (1,4- The same reaction was carried out using dimethyl-5-methoxy-1H-pyrazol-3-yl) -2-methyl-phenol, and 1- ⁇ 3-methyl-2- [2-methyl-4- (1,4- Dimethyl-5-methoxy-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl ⁇ -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 7) was obtained. .
  • Synthesis example 8 1- ⁇ 3-methyl-2- [2-methyl-4- (5-aminocarbonyl-1,4-dimethyl-1H-pyrazol-3-yl) -phenoxy described in Reference Synthesis Example 40 at 0 ° C. 0.26 g of phosphorus oxychloride was added to a mixture of 0.5 g of methyl] -phenyl ⁇ -4-methyl-1,4-dihydrotetrazol-5-one and 10 ml of pyridine. After stirring at room temperature for 3 hours, 30 ml of water was added.
  • the precipitate was collected by filtration, washed with 10 ml of water and 10 ml of hexane, dried under reduced pressure, and 1- ⁇ 3-methyl-2- [2-methyl-4- (5-cyano-1,4-dimethyl-1H-pyrazole). -3-yl) -phenoxymethyl] -phenyl ⁇ -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 8) (0.38 g) was obtained.
  • Synthesis Example 9 In Synthesis Example 1, instead of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, 4- (1,4,4) described in Reference Synthesis Example 46 was used. The same reaction was carried out using 5-trimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, and 1- ⁇ 3-methyl-2- [2-methyl-4- (1,4,5- Trimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl ⁇ -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 9) was obtained.
  • Synthesis Example 10 In Synthesis Example 6, instead of 2-methyl-4- (1-methyl-5-trifluoromethyl-1H-pyrazol-3-yl) -phenol, 4- (1,4,4) described in Reference Synthesis Example 46 was used. The same reaction was carried out using 5-trimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, and 1- ⁇ 3-ethyl-2- [2-methyl-4- (1,4,5- Trimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl ⁇ -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 10) was obtained.
  • Synthesis Example 11 In Synthesis Example 5, instead of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, 4- (1,4,4) described in Reference Synthesis Example 46 was used. A similar reaction is carried out using 5-trimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, and 1- ⁇ 3-methoxy-2- [2-methyl-4- (1,4,5- Trimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl ⁇ -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 10) was obtained.
  • Reference synthesis example 1 21.9 g of anhydrous aluminum chloride was added to 250 mL of N, N-dimethylformamide under ice cooling, and the mixture was stirred for 15 minutes. To this was added 10.7 g of sodium azide and stirred for 15 minutes. Then, 25.0 g of 1-chloro-3-isocyanato-2-methylbenzene was added and heated at 80 ° C. for 5 hours. After cooling, the reaction solution was added to a mixture of 35 g of sodium nitrite, 2 L of water and 500 g of ice with stirring. The mixture was acidified with 10% hydrochloric acid and extracted with ethyl acetate.
  • Reference synthesis example 4 19.7 g of anhydrous aluminum chloride was added to 220 mL of N, N-dimethylformamide under ice cooling and stirred for 15 minutes. After adding 9.6 g of sodium azide and stirring for 15 minutes, 30.3 g of 1-bromo-3-isocyanato-2-methylbenzene described in Reference Synthesis Example 42 was added and heated at 80 ° C. for 5 hours. After cooling, the reaction solution was added to a mixture of 33 g of sodium nitrite, 2 L of water and 500 g of ice with stirring. The mixture was acidified with 10% hydrochloric acid and extracted with ethyl acetate.
  • Reference synthesis example 6 8.47 g of 1- (2-methyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 5, 1,1′-azobis (cyclohexane-1-carbohydrate (Nitrile) 1.54 g, N-bromosuccinimide 6.44 g and chlorobenzene 125 mL were stirred with heating under reflux for 5 hours. After cooling, water was poured into the reaction solution and extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
  • Reference synthesis example 7 A mixture of 45.0 g of 1- (2-bromomethyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 6, 37.4 g of sodium methoxide and 600 mL of tetrahydrofuran was obtained. Stir at room temperature for 3 hours. Saturated aqueous sodium hydrogen carbonate was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous sodium hydrogen carbonate and dried over anhydrous sodium sulfate.
  • Reference synthesis example 9 25.6 g of 1- (2-methoxymethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 8, 50 mL of acetic acid and 25% hydrogen bromide-acetic acid solution 50 mL of the mixture was stirred at 65 ° C. for 1 hour. Saturated brine was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous sodium hydrogen carbonate and dried over anhydrous sodium sulfate.
  • a mixture of 11.6 g of palladium and 500 mL of toluene was stirred with heating under reflux for 14 hours. After cooling, a saturated aqueous ammonium chloride solution was poured into the reaction solution, and the mixture was extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
  • Reference Synthesis Example 12 A mixture of 11.2 g of 1- (4-methoxy-3-methyl-phenyl) -ethanone described in Reference Synthesis Example 11 and 200 ml of tetrahydrofuran was added to 16.1 g of diethyl carbonate and 6.2 g of 55% sodium hydride at room temperature. Then, 0.05 g of dibenzo-18-crown-6 and 3 ml of ethanol were added, and the mixture was stirred with heating under reflux for 8 hours. Water was poured into the reaction mixture, the mixture was acidified with 10% aqueous hydrochloric acid, extracted with ethyl acetate, the organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
  • Reference synthesis example 14 At 0 ° C., 4.0 g of N, N-dimethylformamide was added to 56 g of phosphorus oxychloride, and the mixture was stirred for 0.5 hour. Then, 5-hydroxy-3- (4-methoxy-3-methyl- described in Reference Synthesis Example 13 was used. 9.3 g of phenyl) -1-methyl-1H-pyrazole was added. After stirring at 100 ° C. for 7 hours, the reaction solvent was distilled off under reduced pressure. 100 ml of ice water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
  • Reference synthesis example 15 At 0 ° C., 0.3 g of 5-chloro-4-formyl-3- (4-methoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Synthesis Example 14 and 10 ml of trifluoroacetic acid To the mixture was added 0.27 g of triethylsilane. After stirring at room temperature for 3 hours, 5 ml of water was added and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
  • Reference Synthesis Example 20 In Reference Synthesis Example 16, 3- (4-methoxy) described in Reference Synthesis Example 21 was used instead of 5-chloro-3- (4-methoxy-3-methyl-phenyl) -1,4-dimethyl-1H-pyrazole. Similar reaction was performed using -3-methyl-phenyl) -1,5-dimethyl-1H-pyrazole, and 2-methyl-4- (1,5-dimethyl-1H-pyrazol-3-yl) -phenol Got.
  • the precipitate was collected by filtration, washed with 30 ml of water and 30 ml of hexane, dried under reduced pressure, and 1- ⁇ 3-methyl-2- [2-methyl-4- (5-aminocarbonyl-1,4-dimethyl-1H- 2 g of pyrazol-3-yl) -phenoxymethyl] -phenyl ⁇ -4-methyl-1,4-dihydrotetrazol-5-one were obtained.
  • Reference synthesis example 43 1- (2-Bromomethyl-3-methoxyphenyl) -4-methyl-1,4-dihydrotetrazol-5-one was prepared by the following steps (1) to (4).
  • ⁇ Step (1)> A mixture of 15.0 g of 3-amino-1-methoxy-2-methylbenzene, 48.7 g of triphosgene and 350 ml of toluene was stirred with heating under reflux for 3 hours. The reaction mixture allowed to cool was concentrated under reduced pressure to obtain 17.0 g of 1-methoxy-3-isocyanato-2-methylbenzene.
  • Step (3)> To a mixture of 10.00 g of 1- (2-methyl-3-methoxyphenyl) -1,4-dihydrotetrazol-3-one and 100 ml of N, N-dimethylformamide was added 2.47 g of 55% sodium hydride under ice cooling. Was added. The mixture was warmed to room temperature and stirred for 1 hour. To the reaction mixture, 3.5 ml of methyl iodide was added under ice cooling. The mixture was warmed to room temperature and stirred for 14 hours. Water was poured into the reaction mixture, and the mixture was extracted with ethyl acetate.
  • Reference Synthesis Example 44 A mixture of 5.9 g of 3- (4-methoxy-3-methyl-phenyl) -1,5-dimethyl-1H-pyrazole described in Reference Synthesis Example 19 at room temperature, 5.8 g of N-bromosuccinimide, and 100 ml of chloroform. After stirring for 17 hours, water was added and the mixture was extracted with chloroform. The organic layer was washed with water, dried over anhydrous magnesium, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 4.0 g of 3- (4-methoxy-3-methyl-phenyl) -4-bromo-1,5-dimethyl-1H-pyrazole.
  • Reference Synthesis Example 45 3- (4-Methoxy-3-methyl-phenyl) -4-bromo-1,5-dimethyl-1H-pyrazole 1.3 g described in Reference Synthesis Example 44, 1,4-dioxane 30 ml, water 5 ml, methylboronic acid A mixture of 1.0 g, [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride dichloromethane adduct 0.4 g and potassium (III) phosphate 3.7 g was stirred with heating under reflux for 9 hours. . The reaction mixture was extracted with ethyl acetate, and the organic layer was washed with water, dried over anhydrous magnesium, and concentrated under reduced pressure.
  • Reference Synthesis Example 46 A mixture of 0.6 g of 3- (4-methoxy-3-methyl-phenyl) -1,4,5-trimethyl-1H-pyrazole described in Reference Synthesis Example 45, 5 ml of 47% hydrobromic acid, and 5 ml of acetic acid was used. The mixture was stirred for 13 hours under reflux. The solvent was distilled off, 30 ml of ethyl acetate was added to the residue, and the mixture was stirred at room temperature for 1 hour. The precipitate was filtered, washed with hexane, and then dried under reduced pressure to obtain 0.5 g of 4- (1,4,5-trimethyl-1H-pyrazol-3-yl) -2-methyl-phenol.
  • Reference production example 50 A mixture of 5.76 g of 1- (4-methoxy-3-methyl-phenyl) -ethanone described in Reference Synthesis Example 11 and 7.46 ml of N, N-dimethylformamide diethyl acetal was stirred with heating under reflux for 24 hours. Concentration under reduced pressure gave 4.78 g of 3-dimethylamino-1- (4-methoxy-3-methyl-phenyl) -propenone.
  • Reference Production Example 51 In Reference Production Example 50, the same reaction was performed using 1- (3-chloro-4-methoxy-phenyl) -ethanone instead of 1- (4-methoxy-3-methyl-phenyl) -ethanone. 3-Dimethylamino-1- (3-chloro-4-methoxy-phenyl) -propenone was obtained.
  • Reference production example 54 In Reference Preparation Example 44, instead of 3- (4-methoxy-3-methyl-phenyl) -1,5-dimethyl-1H-pyrazole, 3- (3-chloro-4-methoxy described in Reference Preparation Example 53 was used. -Phenyl) -1-methyl-1H-pyrazole was used for the same reaction to obtain 3- (4-methoxy-3-chloro-phenyl) -4-bromo-1-methyl-1H-pyrazole.
  • Reference production example 56 A mixture of 9.5 g of 5-hydroxy-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Production Example 27 and 70 ml of N, N-dimethylformamide at room temperature To the mixture, 2.5 g of 55% sodium hydride was added and stirred for 1 hour. To the reaction mixture, 9.7 g of dimethyl sulfate was added and stirred at 100 ° C. for 12 hours. 100 ml of water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
  • Reference Production Example 58 A mixture of 5.6 g of 4-chloro-5-methoxy-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Production Example 57 and 120 ml of 30% aqueous sulfuric acid was heated. The mixture was stirred for 20 hours under reflux. 100 ml of water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 1.2 g of 2-methyl-4- (4-chloro-5-methoxy-1-methyl-1H-pyrazol-3-yl) -phenol.
  • the tetrazolinone compound 65 to the present tetrazolinone compound 12 that can be produced according to the synthesis method C from the synthesis method A are shown below.
  • Me represents a methyl group
  • Et represents an ethyl group
  • OMe represents a methoxy group
  • OEt represents an ethoxy group
  • Br represents a bromine atom
  • Cl represents a chlorine atom
  • F represents a fluorine atom.
  • CF3 represents a trifluoromethyl group
  • CN represents a cyano group
  • SMe represents a methylthio group
  • Cy represents a cyclopropyl group.
  • R 1 is a C1-C3 alkyl group or a halogen atom
  • R 2 is a hydrogen atom or a C1-C3 alkyl group
  • R 3 is a C1-C3 alkyl group, a C1-C3 alkoxy group, a halogen atom
  • Z 1 is a C1-C3 alkyl group
  • Z 2 is a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom or a cyano group
  • Z 3 A tetrazolinone compound in which is a hydrogen atom, a C1-C3 alkyl group or a halogen atom.
  • R 1 is a C1-C3 alkyl group or a halogen atom
  • R 2 is a hydrogen atom or a C1-C3 alkyl group
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group.
  • Z 1 is a C1-C3 alkyl group
  • Z 2 is a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom, C1- A tetrazolinone compound which is a C3 alkyl group or a halogen atom
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom or a C1-C3 alkyl group
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group
  • Z 2 is 1 or more halogen atoms optionally C1-C3 may be alkyl groups having a halogen atom or a cyano group
  • Z 3 is a hydrogen atom, C1-C3 alkyl group Or a te
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group
  • Z 3 is a C1-C3 alkyl group or a halogen atom.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group
  • Z 1 is a C1-C3 alkyl group
  • Z 2 is one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a C1-C3 alkyl group or a halogen atom.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a halogen atom
  • Z 1 is a C1-C3 alkyl group
  • Z 2 is 1 or more.
  • halogen atom optionally may C1-C3 alkyl group optionally having a halogen atom or a cyano group
  • tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group
  • Z 2 is 1 or more.
  • halogen atoms optionally may C1-C3 alkyl group optionally having a halogen atom or a cyano group
  • tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 may have one or more halogen atoms, a C1-C3 alkyl group, a halogen atom, C1 -C3 alkoxy group or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl, halogen atom, a C1-C2 alkylthio group or a cyano group
  • Z 3 is a hydrogen atom
  • tetrazolinone compound is C1-C3 alkyl group or a halogen atom.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom, C1- A tetrazolinone compound which is a C3 alkyl group or a halogen atom;
  • composition of the present invention examples include the following.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group a group
  • Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom
  • a plant disease control composition comprising any one of compounds I to VI.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group a group
  • Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group a group
  • Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group a group
  • Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group a group
  • Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom
  • a plant disease control composition containing any one of compounds IV is a plant disease control composition containing any one of compounds IV.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group a group
  • Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group
  • Z 1 is a C1-C3 alkyl group a group
  • Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds I to VI.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom, and any one of compounds I.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom, and any one of compounds II.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds III.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds IV.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom, and any one of compounds V.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds VI.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds XXVIII to XXXIII.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom, and a compound XXVIII.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXIX.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXX.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXXI.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXXII.
  • R 1 is a C1-C3 alkyl group
  • R 2 is a hydrogen atom
  • R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group
  • Z 1 is C1 an -C3 alkyl group
  • Z 2 is C1-C2 alkoxy group
  • one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group
  • Z 3 is a hydrogen atom
  • C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXXIII.
  • a part represents a weight part.
  • Formulation Example 1 A composition is obtained by thoroughly pulverizing and mixing 50 parts of any one of the compositions of the present invention, 3 parts of calcium lignin sulfonate, 2 parts of magnesium lauryl sulfate and 45 parts of synthetic silicon hydroxide.
  • Formulation Example 2 20 parts of any one of the compositions of the present invention and 1.5 parts of sorbitan trioleate were mixed with 28.5 parts of an aqueous solution containing 2 parts of polyvinyl alcohol, and pulverized by a wet pulverization method. Thereafter, 40 parts of an aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added thereto, and further 10 parts of propylene glycol is added and stirred to obtain a preparation.
  • Formulation Example 3 A preparation is obtained by thoroughly pulverizing and mixing 2 parts of any one of the compositions of the present invention, 88 parts of kaolin clay and 10 parts of talc.
  • Formulation Example 4 A formulation is obtained by thoroughly mixing 5 parts of any one of the compositions of the present invention, 14 parts of polyoxyethylene styrylphenyl ether, 6 parts of calcium dodecylbenzenesulfonate and 75 parts of xylene.
  • Formulation Example 5 Any one of the compositions of the present invention, 2 parts of composition, 1 part of synthetic hydrous silicon oxide, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65 parts of kaolin clay are mixed and mixed well with water. The formulation is obtained by granulating and drying.
  • Formulation Example 6 10 parts of any one of the compositions of the present invention; 35 parts of white carbon containing 50 parts of polyoxyethylene alkyl ether sulfate ammonium salt; and 55 parts of water are mixed and finely pulverized by a wet pulverization method. By doing so, a formulation is obtained.
  • Test Example 1 Control Trial against Wheat Leaf Blight Fungus (Septoria tritici) Each test compound diluted in DMSO (dimethyl sulfoxide) at a predetermined concentration was dispensed into a titer plate (96 well), and then the wheat leaf blight fungus was separated in advance. 150 ⁇ l of potato broth liquid medium (PDB medium) inoculated with live spores was dispensed. The plate was cultured at 18 ° C. for 4 days to grow wheat leaf blight fungi, and then the growth degree of wheat leaf blight fungi was measured by absorbance at 550 nm in each well of the titer plate. Based on the degree of growth, the efficacy was calculated using “Formula 1” and ranked according to [Table 5]. The results are shown in [Table 6] to [Table 27].
  • Test example 2 A plastic pot is filled with soil, seeded with wheat (variety: Shirogane), and grown in a greenhouse for 14 days.
  • the test compound is made into a preparation according to the preparation example, then diluted with water to a predetermined concentration, and the diluted solution is sprayed so as to adhere sufficiently to the leaf surface of the wheat.
  • the plants are air-dried, and after 2 days, spray-inoculated with an aqueous suspension (about 1,000,000 cells / ml) of conidia of wheat leaf blight fungus (Mycosphaerella graminicola).
  • an aqueous suspension about 1,000,000 cells / ml
  • conidia of wheat leaf blight fungus Mycosphaerella graminicola
  • the lesion area of wheat leaf blight is investigated.
  • wheat is cultivated in the same manner as the treated area except that the diluted solution of the test compound is not sprayed on the foliage (this is referred to as an untreated area).
  • the lesion area of wheat leaf blight is investigated as in the treatment area.
  • a marked decrease in the lesion area of wheat treated with the disease control composition containing the present tetrazolinone compound and the present bactericidal active compound is recognized as compared with the lesion area in the untreated area.
  • Test example 3 The plastic pot is filled with soil, soybean (variety: Kurosengoku) is sown and grown in a greenhouse for 14 days.
  • the test compound is made into a preparation according to the preparation example, then diluted with water to a predetermined concentration, and the diluted solution is sprayed so as to sufficiently adhere to the leaf surface of the die.
  • the plants are air-dried, and after 2 days, spray-inoculated with an aqueous suspension (about 10,000 / ml) of a summer spore of soybean rust fungus (Phakopsora pachyrhizi).
  • an aqueous suspension about 10,000 / ml
  • aqueous suspension about 10,000 / ml
  • a summer spore of soybean rust fungus Puhakopsora pachyrhizi
  • soybeans are cultivated in the same manner as the treated group except that the diluted solution of the test compound is not sprayed on the foliage (this is referred to as the untreated group). Then, the lesion area of soybean rust is investigated as in the treatment area. As a result, the lesion area of soybean treated with the disease control composition containing the present tetrazolinone compound and the present bactericidal active compound is remarkably reduced as compared with the lesion area in the untreated area. According to the present invention, plant diseases can be controlled.
  • composition of the present invention exhibits an excellent control effect against plant diseases, it can be used as a plant disease control agent. .

Abstract

This plant disease control composition is effective in controlling plant diseases, and contains a tetrazolinone compound represented in formula (1) (in the formula, R1 represents a C1-C3 alkyl group, etc., R2 represents a hydrogen atom, etc., R3 represents a C1-C3 alkyl group, etc., Z1 represents a C1-C3 alkyl group, Z2 represents a C1-C2 alkoxy group, etc., and Z3 represents a C1-C3 alkyl group, etc.) and a bactericidally active compound, and ideally, the weight ratio between the tetrazolinone compound and the bactericidally active compound is tetrazolinone compound / bactericidally active compound = 0.1/1 to 10/1.

Description

植物病害防除組成物およびその用途Plant disease control composition and use thereof
 本発明は植物病害防除組成物およびその用途に関するものである。 The present invention relates to a plant disease control composition and its use.
 従来、植物病害を防除するために多くの化合物が開発され、実用に供されている(例えば、特許文献1及び2参照。)。 Conventionally, many compounds have been developed and put into practical use for controlling plant diseases (see, for example, Patent Documents 1 and 2).
国際公開第99/05139号International Publication No. 99/05139 国際公開第2013/092224号International Publication No. 2013/092224
 本発明は、植物病害に対して優れた防除効力を有する組成物を提供することを課題とする。 An object of the present invention is to provide a composition having an excellent control effect against plant diseases.
 本発明者は、植物病害に対して優れた防除効力を有する組成物を見出すべく検討した結果、下記式(1)で示されるテトラゾリノン化合物と下記群Aより選ばれる1種以上の殺菌活性化合物とを含有する植物病害防除組成物が、植物病害に対して優れた防除効力を有することを見出した。
 すなわち、本発明は以下の通りである
〔1〕 式(1)
Figure JPOXMLDOC01-appb-I000005
〔式中、
は、1以上のハロゲン原子を有していてもよいC1−C3アルキル基またはハロゲン原子を表し、
は、水素原子、ハロゲン原子またはC1−C3アルキル基を表し、
は、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、シクロプロピル基、または1以上のハロゲン原子を有していてもよいC1−C3アルコキシ基を表し、
は、C1−C3アルキル基を表し、
は、水素原子、C1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、C1−C2アルキルチオ基またはシアノ基を表し、
は、水素原子、C1−C3アルキル基またはハロゲン原子を表す。〕
で示されるテトラゾリノン化合物と、
群(A)より選ばれる1種以上の殺菌活性化合物とを含有する植物病害防除組成物。
 群(A):
 プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、トリアジメノール(triadimenol)、プロクロラズ(prochloraz)、ペンコナゾール(penconazole)、テブコナゾール(tebuconazole)、フルシラゾール(flusilazole)、ジニコナゾール(diniconazole)、ブロムコナゾール(bromuconazole)、エポキシコナゾール(epoxiconazole)、ジフェノコナゾール(difenoconazole)、シプロコナゾール(cyproconazole)、メトコナゾール(metconazole)、トリフルミゾール(triflumizole)、テトラコナゾール(tetraconazole)、マイクロブタニル(myclobutanil)、フェンブコナゾール(fenbuconazole)、ヘキサコナゾール(hexaconazole)、フルキンコナゾール(fluquinconazole)、トリティコナゾール(triticonazole)、ビテルタノール(bitertanol)、イマザリル(imazalil)、イプコナゾール(ipconazole)、シメコナゾール(simeconazole)、ヒメキサゾール(hymexazol)、エトリディアゾール(etridiazole)、フルトリアホール(flutriafol)、ビキサフェン(bixafen)、ベンゾビンジフルピル(benzovindiflupyr)、フルキサピロキサド(fluxapyroxad)、ペンチオピラド(penthiopyrad)、N−(1,1,3−トリメチルインダン−4−イル)−1−メチル−3−ジフルオロメチルピラゾール−4−カルボン酸アミド、
下記式(b)で表される化合物、
Figure JPOXMLDOC01-appb-I000006
イソフェタミド(isofetamid)、イソピラザム(isopyrazam)、ボスカリド(boscalid)、フルオピラム(fluopyram)、セダキサン(sedaxane)、ペンフルフェン(penflufen)、フルトラニル(flutolanil)、メプロニル(mepronil)、カルボキシン(carboxin)、チフルザミド(thifluxamide)及びフラメトピル(furametpyr)からなる群。
〔2〕 テトラゾリノン化合物と殺菌活性化合物との重量比が、テトラゾリノン化合物/殺菌活性化合物=0.1/1~10/1である[1]記載の植物病害防除組成物。
As a result of studying to find a composition having an excellent control effect against plant diseases, the present inventor has found that a tetrazolinone compound represented by the following formula (1) and one or more bactericidal active compounds selected from the following group A: It has been found that a plant disease control composition containing an excellent control effect against plant diseases.
That is, the present invention is as follows: [1] Formula (1)
Figure JPOXMLDOC01-appb-I000005
[Where,
R 1 represents a C1-C3 alkyl group which may have one or more halogen atoms or a halogen atom,
R 2 represents a hydrogen atom, a halogen atom or a C1-C3 alkyl group,
R 3 represents a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a cyclopropyl group, or a C1-C3 alkoxy group optionally having one or more halogen atoms;
Z 1 represents a C1-C3 alkyl group,
Z 2 represents a hydrogen atom, a C1-C2 alkoxy group, a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a C1-C2 alkylthio group, or a cyano group,
Z 3 represents a hydrogen atom, a C1-C3 alkyl group or a halogen atom. ]
A tetrazolinone compound represented by:
A plant disease control composition comprising one or more fungicidal active compounds selected from the group (A).
Group (A):
Propiconazole, Prothioconazole, Triadimenol, Prochloraz, Penconazole, Dibuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole bromconazole, epoxiconazole, difenoconazole, cyproconazole, metconazole, triflumizole, triflumizole aconazole, microbutanil, fenbuconazole, hexaconazole, fluquinconazole, triticonazole, tertanol, tertanol. ipconazole), simeconazole, hymexazole, etridiazole, flutriafol, bixafen, benzobindiflufirfulx Xapyroxad), penthiopyrad (penthiopyrad), N- (1,1,3- trimethyl indane-4-yl) -1-methyl-3-difluoromethyl-4-carboxylic acid amide,
A compound represented by the following formula (b):
Figure JPOXMLDOC01-appb-I000006
Isofetamid, isopyrazam, boscalid, fluopyram, sedaxane, penflufen, fluthranil, flutronil, mepronil And furametopyr.
[2] The plant disease control composition according to [1], wherein the weight ratio of the tetrazolinone compound to the bactericidal active compound is tetrazolinone compound / bactericidal active compound = 0.1 / 1 to 10/1.
〔3〕 式(1)
Figure JPOXMLDOC01-appb-I000007
〔式中、
は、1以上のハロゲン原子を有していてもよいC1−C3アルキル基またはハロゲン原子を表し、
は、水素原子、ハロゲン原子またはC1−C3アルキル基を表し、
は、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、シクロプロピル基、または1以上のハロゲン原子を有していてもよいC1−C3アルコキシ基を表し、
は、C1−C3アルキル基を表し、
は、水素原子、C1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、C1−C2アルキルチオ基またはシアノ基を表し、
は、水素原子、C1−C3アルキル基またはハロゲン原子を表す。〕
で示されるテトラゾリノン化合物と、群(A)より選ばれる1種以上の殺菌活性化合物との有効量を、植物又は植物を栽培する土壌に処理する工程を含む植物病害防除方法。
 群(A):
 プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、トリアジメノール(triadimenol)、プロクロラズ(prochloraz)、ペンコナゾール(penconazole)、テブコナゾール(tebuconazole)、フルシラゾール(flusilazole)、ジニコナゾール(diniconazole)、ブロムコナゾール(bromuconazole)、エポキシコナゾール(epoxiconazole)、ジフェノコナゾール(difenoconazole)、シプロコナゾール(cyproconazole)、メトコナゾール(metconazole)、トリフルミゾール(triflumizole)、テトラコナゾール(tetraconazole)、マイクロブタニル(myclobutanil)、フェンブコナゾール(fenbuconazole)、ヘキサコナゾール(hexaconazole)、フルキンコナゾール(fluquinconazole)、トリティコナゾール(triticonazole)、ビテルタノール(bitertanol)、イマザリル(imazalil)、イプコナゾール(ipconazole)、シメコナゾール(simeconazole)、ヒメキサゾール(hymexazol)、エトリディアゾール(etridiazole)、フルトリアホール(flutriafol)、ビキサフェン(bixafen)、ベンゾビンジフルピル(benzovindiflupyr)、フルキサピロキサド(fluxapyroxad)、ペンチオピラド(penthiopyrad)、N−(1,1,3−トリメチルインダン−4−イル)−1−メチル−3−ジフルオロメチルピラゾール−4−カルボン酸アミド、
下記式(b)で表される化合物、
Figure JPOXMLDOC01-appb-I000008
イソフェタミド(isofetamid)、イソピラザム(isopyrazam)、ボスカリド(boscalid)、フルオピラム(fluopyram)、セダキサン(sedaxane)、ペンフルフェン(penflufen)、フルトラニル(flutolanil)、メプロニル(mepronil)、カルボキシン(carboxin)、チフルザミド(thifluxamide)及びフラメトピル(furametpyr)からなる群。
[4] テトラゾリノン化合物と殺菌活性化合物との重量比が、テトラゾリノン化合物/殺菌活性化合物=0.1/1~10/1である[3]記載の植物病害防除方法。
[5] 植物又は植物を栽培する土壌が、コムギ又はコムギを栽培する土壌である[3]又は[4]記載の植物病害防除方法。
[3] Formula (1)
Figure JPOXMLDOC01-appb-I000007
[Where,
R 1 represents a C1-C3 alkyl group which may have one or more halogen atoms or a halogen atom,
R 2 represents a hydrogen atom, a halogen atom or a C1-C3 alkyl group,
R 3 represents a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a cyclopropyl group, or a C1-C3 alkoxy group optionally having one or more halogen atoms;
Z 1 represents a C1-C3 alkyl group,
Z 2 represents a hydrogen atom, a C1-C2 alkoxy group, a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a C1-C2 alkylthio group, or a cyano group,
Z 3 represents a hydrogen atom, a C1-C3 alkyl group or a halogen atom. ]
The plant disease control method including the process of processing the effective amount of the tetrazolinone compound shown by 1 and the 1 or more types of fungicidal active compound chosen from a group (A) to the soil which grows a plant or a plant.
Group (A):
Propiconazole, Prothioconazole, Triadimenol, Prochloraz, Penconazole, Dibuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole bromconazole, epoxiconazole, difenoconazole, cyproconazole, metconazole, triflumizole, triflumizole aconazole, microbutanil, fenbuconazole, hexaconazole, fluquinconazole, triticonazole, tertanol, tertanol. ipconazole), simeconazole, hymexazole, etridiazole, flutriafol, bixafen, benzobindiflufirfulx Xapyroxad), penthiopyrad (penthiopyrad), N- (1,1,3- trimethyl indane-4-yl) -1-methyl-3-difluoromethyl-4-carboxylic acid amide,
A compound represented by the following formula (b):
Figure JPOXMLDOC01-appb-I000008
Isofetamid, isopyrazam, boscalid, fluopyram, sedaxane, penflufen, fluthranil, flutronil, mepronil And furametopyr.
[4] The plant disease control method according to [3], wherein the weight ratio of the tetrazolinone compound to the bactericidal active compound is tetrazolinone compound / bactericidal active compound = 0.1 / 1 to 10/1.
[5] The plant disease control method according to [3] or [4], wherein the plant or the soil in which the plant is cultivated is wheat or soil in which the wheat is cultivated.
 本発明の植物病害防除組成物(以下、本発明組成物と記す。)は、式(1)
Figure JPOXMLDOC01-appb-I000009
〔式中、R、R、R、Z、ZおよびZは前記と同じ意味を表す。〕
で示されるテトラゾリノン化合物(以下、本テトラゾリノン化合物と記す。)と群(A)より選ばれる1種以上の殺菌活性化合物(以下、本殺菌活性化合物と記す。)とを含有する。
The plant disease control composition of the present invention (hereinafter referred to as the present composition) is represented by the formula (1).
Figure JPOXMLDOC01-appb-I000009
[Wherein R 1 , R 2 , R 3 , Z 1 , Z 2 and Z 3 represent the same meaning as described above. ]
And a one or more bactericidal active compounds (hereinafter referred to as the present bactericidal active compound) selected from the group (A).
まず、本テトラゾリノン化合物について説明する。 First, the tetrazolinone compound will be described.
本明細書における置換基について、下記に詳細に記す。
ハロゲン原子としては、フッ素原子、塩素原子、臭素原子およびヨウ素原子があげられる。
The substituents in the present specification are described in detail below.
Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
 C1−C3アルキル基とは、直鎖状もしくは分枝上の炭素数1−3のアルキル基を表し、メチル基、エチル基、プロピル基、及びイソプロピル基があげられる。
 1以上のハロゲン原子を有していてもよいC1−C3アルキル基とは、1以上の水素原子がハロゲン原子で置換されていてもよいC1−C3アルキル基を表し、例えば、メチル基、エチル基、プロピル基、イソプロピル基、モノフルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、モノクロロメチル基、ジクロロメチル基、トリクロロメチル基、ジブロモメチル基、クロロフルオロメチル基、ジクロロフルオロメチル基、クロロジフルオロメチル基、2−フルオロエチル基、2,2−ジフルオロエチル基、2,2,2−トリフルオロエチル基、ペンタフルオロエチル基、3−フルオロプロピル基、2,2−ジフルオロプロピル基、3,3,3−トリフルオロプロピル基、ヘプタフルオロプロピル基、ヘプタフルオロイソプロピル基、1−(トリフルオロメチル)−2,2,2−トリフルオロエチル基および3−フルオロプロピル基があげられる。
The C1-C3 alkyl group represents a linear or branched alkyl group having 1-3 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, and an isopropyl group.
The C1-C3 alkyl group optionally having one or more halogen atoms represents a C1-C3 alkyl group in which one or more hydrogen atoms may be substituted with a halogen atom, such as a methyl group or an ethyl group , Propyl, isopropyl, monofluoromethyl, difluoromethyl, trifluoromethyl, monochloromethyl, dichloromethyl, trichloromethyl, dibromomethyl, chlorofluoromethyl, dichlorofluoromethyl, chlorodifluoromethyl Group, 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, 3-fluoropropyl group, 2,2-difluoropropyl group, 3,3, 3-trifluoropropyl group, heptafluoropropyl group, heptafluoroisopropyl 1- (trifluoromethyl) -2,2,2-trifluoroethyl group and a 3-fluoropropyl group.
 C1−C3アルコキシ基とは、直鎖状もしくは分枝上の炭素数1−3のアルコキシ基を表し、メトキシ基、エトキシ基、プロポキシ基、及びイソプロポキシ基があげられる。
 1以上のハロゲン原子を有していてもよいC1−C3アルコキシ基とは、1以上の水素原子がハロゲン原子で置換されていてもよいC1−C3アルコキシ基を表し、例えばメトキシ基、エトキシ基、プロポキシ基、イソプロポキシ基、フルオロメトキシ基、ジフルオロメトキシ基、トリフルオロメトキシ基、クロロメトキシ基、ジクロロメトキシ基、トリクロロメトキシ基、ジブロモメトキシ基、クロロフルオロメトキシ基、ジクロロフルオロメトキシ基、クロロジフルオロメトキシ基、2−フルオロエトキシ基、2,2−ジフルオロエトキシ基、2,2,2−トリフルオロエトキシ基、2−クロロエトキシ基、2,2−ジクロロエトキシ基、2,2,2−トリクロロエトキシ基、ペンタフルオロエトキシ基、3−フルオロプロポキシ基、3,3,3−トリフルオロプロポキシ基、ヘプタフルオロプロポキシ基、ヘプタフルオロイソプポキシ基、1−(トリフルオロメチル)−2,2,2−トリフルオロエトキシ基および3−フルオロプロポキシ基があげられる。
The C1-C3 alkoxy group represents a linear or branched alkoxy group having 1 to 3 carbon atoms, and examples thereof include a methoxy group, an ethoxy group, a propoxy group, and an isopropoxy group.
The C1-C3 alkoxy group which may have one or more halogen atoms represents a C1-C3 alkoxy group in which one or more hydrogen atoms may be substituted with a halogen atom, such as a methoxy group, an ethoxy group, Propoxy group, isopropoxy group, fluoromethoxy group, difluoromethoxy group, trifluoromethoxy group, chloromethoxy group, dichloromethoxy group, trichloromethoxy group, dibromomethoxy group, chlorofluoromethoxy group, dichlorofluoromethoxy group, chlorodifluoromethoxy group 2-fluoroethoxy group, 2,2-difluoroethoxy group, 2,2,2-trifluoroethoxy group, 2-chloroethoxy group, 2,2-dichloroethoxy group, 2,2,2-trichloroethoxy group, Pentafluoroethoxy group, 3-fluoropropoxy group, 3 3,3-trifluoro-propoxy group, heptafluoropropoxy group, heptafluoro isopropoxy Po carboxymethyl group, 1- (trifluoromethyl) -2,2,2-trifluoroethoxy group and a 3-fluoropropoxy group.
 C1−C2アルコキシ基としては、メトキシ基、及びエトキシ基があげられる。 Examples of the C1-C2 alkoxy group include a methoxy group and an ethoxy group.
 C1−C2アルキルチオ基としては、メチルチオ基、及びエチルチオ基があげられる。 Examples of the C1-C2 alkylthio group include a methylthio group and an ethylthio group.
 まず、本テトラゾリノン化合物の合成法について説明する。 First, a method for synthesizing the tetrazolinone compound will be described.
 本テトラゾリノン化合物は、例えば以下の合成法により合成することができる。 The tetrazolinone compound can be synthesized, for example, by the following synthesis method.
(合成法A)
 本テトラゾリノン化合物は、式(A1)で示される化合物(以下、化合物(A1)と記す。)と式(A2)で示される化合物(以下、化合物(A2)と記す。)とを塩基の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000010
〔式中、R、R、R、Z、ZおよびZは前記と同じ意味を表し、Z11は塩素原子、臭素原子、ヨウ素原子等の脱離基を表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物等が挙げられる。
 該反応に用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドが挙げられる。
 該反応には化合物(A1)1モルに対して、化合物(A2)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 該反応は、必要に応じてヨウ化ナトリウム、ヨウ化テトラブチルアンモニウムなどを加えてもよく、これらの化合物は通常、化合物(A1)1モルに対して、0.001~1.2モルの割合で用いられる。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、本テトラゾリノン化合物を単離することができる。または反応混合物を濾過、濃縮する等の後処理操作を行うことにより、本テトラゾリノン化合物を単離することができる。単離された本テトラゾリノン化合物は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Synthesis method A)
The tetrazolinone compound comprises a compound represented by formula (A1) (hereinafter referred to as compound (A1)) and a compound represented by formula (A2) (hereinafter referred to as compound (A2)) in the presence of a base. It can manufacture by making it react.
Figure JPOXMLDOC01-appb-I000010
[Wherein R 1 , R 2 , R 3 , Z 1 , Z 2 and Z 3 represent the same meaning as described above, and Z 11 represents a leaving group such as a chlorine atom, a bromine atom or an iodine atom. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like. Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mol of the compound (A1), the compound (A2) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
In the reaction, sodium iodide, tetrabutylammonium iodide or the like may be added as necessary, and these compounds are usually in a ratio of 0.001 to 1.2 mol with respect to 1 mol of the compound (A1). Used in
After completion of the reaction, the tetrazolinone compound can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Alternatively, the tetrazolinone compound can be isolated by performing post-treatment operations such as filtration and concentration of the reaction mixture. The isolated tetrazolinone compound can be further purified by chromatography, recrystallization or the like.
(合成法B)
本テトラゾリノン化合物のうち、ZがR100である式(1−B)で示される本テトラゾリノン化合物(以下、化合物(1−B)と記す。)は、式(1−2)で示される本テトラゾリノン化合物(以下、化合物(1−2)と記す。)とハロゲン化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000011
〔式中、R、R、R、ZおよびZは前記と同じ意味を表し、R100はハロゲン原子を表す。〕
該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物が挙げられる。
 該反応に用いられるハロゲン化剤としては、N−クロロスクシンイミド、N−ブロモスクシンイミド、N−ヨードスクシンイミド、塩素、臭素、ヨウ素、塩化スルフリルなどが挙げられる。
 該反応には化合物(1−2)1モルに対して、ハロゲン化剤が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(1−B)を単離することができる。単離された本テトラゾリノン化合物は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Synthesis method B)
Among the tetrazolinone compounds, the present tetrazolinone compound represented by the formula (1-B) in which Z 3 is R 100 (hereinafter referred to as the compound (1-B)) is represented by the formula (1-2). It can be produced by reacting a tetrazolinone compound (hereinafter referred to as compound (1-2)) with a halogenating agent.
Figure JPOXMLDOC01-appb-I000011
[Wherein, R 1 , R 2 , R 3 , Z 1 and Z 2 represent the same meaning as described above, and R 100 represents a halogen atom. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile, And mixtures thereof.
Examples of the halogenating agent used in the reaction include N-chlorosuccinimide, N-bromosuccinimide, N-iodosuccinimide, chlorine, bromine, iodine, and sulfuryl chloride.
In the reaction, the halogenating agent is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (1-2).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (1-B) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated tetrazolinone compound can be further purified by chromatography, recrystallization or the like.
(合成法C)
本テトラゾリノン化合物のうち、Zがシアノ基である式(1−C)で示される化合物(以下、化合物(1−C)と記す。)は、式(C1)で示される化合物(以下、化合物(C1)と記す。)とシアノ化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000012
〔式中、R、R、R、ZおよびZは前記と同じ意味を表す。〕
該反応は、通常、溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtertert−ブチルエーテル、ジイソプロピルエーテル等のエ−テル類、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、アセトニトリル、プロピオニトリル等のニトリル類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類、メタノール、エタノール、プロパノール、ブタノール等のアルコール類およびこれらの混合物が挙げられる。
 該反応に用いられるシアノ化剤としては、オキシ塩化リン、5塩化リン、オキシ臭化リン等が挙げられる。
 該反応には塩基を用いてもよく、用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基が挙げられる。これらの塩基は溶媒として用いることもできる。
該反応には化合物(C1)1モルに対して、シアノ化剤が通常1~20モル、塩基が通常1~大過剰量モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~72時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(1−C)を単離することができる。また、沈殿物が生じた際には、沈殿物を濾取することにより、化合物(1−C)を単離することができる。さらにクロマトグラフィー、再結晶等の操作で精製してもよい。
(Synthesis Method C)
Among the tetrazolinone compounds, a compound represented by the formula (1-C) in which Z 2 is a cyano group (hereinafter referred to as compound (1-C)) is a compound represented by the formula (C1) (hereinafter referred to as compound). (C1).) And a cyanating agent can be reacted.
Figure JPOXMLDOC01-appb-I000012
[Wherein, R 1 , R 2 , R 3 , Z 1 and Z 3 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether, n-heptane, n -Hydrocarbons such as hexane, cyclohexane, n-pentane, toluene, xylene, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, acetonitrile, propionitrile, etc. Nitriles, N, N-dimethylformamide, 1,3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, sulfoxides such as dimethyl sulfoxide, methanol, ethanol, propano Le, alcohols and mixtures thereof, such as butanol.
Examples of the cyanating agent used in the reaction include phosphorus oxychloride, phosphorus pentachloride, and phosphorus oxybromide.
In the reaction, a base may be used. Examples of the base used include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicyclone. And organic bases such as decene and diazabicyclononene. These bases can also be used as a solvent.
In the reaction, with respect to 1 mole of the compound (C1), the cyanating agent is usually used at a ratio of 1 to 20 moles and the base is usually used at a ratio of 1 to a large excess mole.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 72 hours.
After completion of the reaction, the compound (1-C) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. In addition, when a precipitate is generated, the compound (1-C) can be isolated by filtering the precipitate. Further, it may be purified by operations such as chromatography and recrystallization.
(参考合成法A)
式(11)で示される化合物(以下、化合物(11)と記す。)は、式(10)で示される化合物(以下、化合物(10)と記す。)とアジド化剤とを反応させることにより合成することができる。
Figure JPOXMLDOC01-appb-I000013
〔式中、Rは前記と同じ意味を表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類およびこれらの混合物が挙げられる。
 該反応に用いられるアジド化剤としては例えばアジ化ナトリウム、アジ化バリウム及びアジ化リチウム等の無機アジド類、並びに、アジ化トリメチルシリル、及びアジ化ジフェニルホスホリル等の有機アジド類が挙げられる。
 該反応には化合物(10)1モルに対して、アジド化剤が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 該反応は、必要に応じて、塩化アルミニウムもしくは塩化亜鉛等のルイス酸を加えてもよく、これらの化合物は通常、化合物(10)1モルに対して、0.05~5モルの割合で用いられる。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(11)を単離することができる。単離された化合物(11)は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Reference Synthesis Method A)
A compound represented by formula (11) (hereinafter referred to as compound (11)) is obtained by reacting a compound represented by formula (10) (hereinafter referred to as compound (10)) with an azidating agent. Can be synthesized.
Figure JPOXMLDOC01-appb-I000013
[Wherein R 3 represents the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, acetonitrile, nitriles and mixtures thereof, such as propionitrile and the like.
Examples of the azidating agent used in the reaction include inorganic azides such as sodium azide, barium azide and lithium azide, and organic azides such as trimethylsilyl azide and diphenylphosphoryl azide.
In the reaction, the azidating agent is usually used at a ratio of 1 to 10 moles relative to 1 mole of the compound (10).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
In this reaction, a Lewis acid such as aluminum chloride or zinc chloride may be added as necessary, and these compounds are usually used at a ratio of 0.05 to 5 mol with respect to 1 mol of compound (10). It is done.
After completion of the reaction, the compound (11) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (11) can be further purified by chromatography, recrystallization and the like.
(参考合成法B)
式(13)で示される化合物(以下、化合物(13)と記す。)は、化合物(11)と式(12)で示される化合物(以下、化合物(12)と記す。)とを塩基の存在下反応させることにより合成することができる。
Figure JPOXMLDOC01-appb-I000014
〔式中、Rは前記と同じ意味を表し、Zは臭素原子、ヨウ素原子、メタンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基およびp−トルエンスルホニルオキシ基等の脱離基を表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物が挙げられる。
 該反応に用いられる化合物(12)は、通常市販のものを用いることができる。具体的には、臭化メチル、ヨウ化メチル等のハロゲン化アルキル類、硫酸ジメチル等の硫酸ジアルキル類、p−トルエンスルホン酸メチル、メタンスルホン酸メチル等のアルキル硫酸エステル類もしくはアリール硫酸エステル類等を挙げることができる。
 該反応に用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドが挙げられる。
 該反応には化合物(11)1モルに対して、化合物(12)が通常1~10モルの割合、塩基が通常0.5~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(13)を単離することができる。単離された化合物(13)は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Reference Synthesis Method B)
The compound represented by the formula (13) (hereinafter referred to as the compound (13)) is obtained by mixing the compound (11) and the compound represented by the formula (12) (hereinafter referred to as the compound (12)) with the presence of a base. It can synthesize | combine by making it react.
Figure JPOXMLDOC01-appb-I000014
[Wherein R 3 represents the same meaning as described above, and Z 5 represents a leaving group such as a bromine atom, an iodine atom, a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group, and a p-toluenesulfonyloxy group. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
As the compound (12) used in the reaction, a commercially available product can be used. Specifically, alkyl halides such as methyl bromide and methyl iodide, dialkyl sulfates such as dimethyl sulfate, alkyl sulfates such as methyl p-toluenesulfonate and methyl methanesulfonate, or aryl sulfates Can be mentioned.
Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like. Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Lithium hydride, sodium hydride, an alkali metal hydride such as potassium hydride, sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mol of the compound (11), the compound (12) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 0.5 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (13) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (13) can be further purified by chromatography, recrystallization and the like.
(参考合成法C)
化合物(A1)は、化合物(13)をハロゲン化剤とを反応させることにより合成することができる。
Figure JPOXMLDOC01-appb-I000015
〔式中、R、Z11は前記と同じ意味を表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、フルオロベンゼン、ジフルオロベンゼン、トリフルオロベンゼン、クロロベンゼン、ジクロロベンゼン、トリクロロベンゼン、α,α,α−トリフルオロトルエン、α,α,α−トリクロロトルエン等のハロゲン化炭化水素類、酢酸エチル、酢酸メチル等のエステル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類およびこれらの混合物が挙げられる。
 該反応に用いることができるハロゲン化剤としては、塩素化剤、臭素化剤もしくはヨウ素化剤、例えば塩素、臭素、ヨウ素、塩化スルフリル、N−クロロスクシンイミド、N−ブロモスクシンイミド、1,3−ジブロモ−5,5−ジメチルヒダントイン、ヨードスクシンイミド、次亜塩素酸tert−ブチル、N−クロログルタルイミド、N−ブロモグルタルイミド、N−クロロ−N−シクロヘキシル−ベンゼンスルホンイミド、N−ブロモフタルイミドがあげられる。
 該反応にはラジカル開始剤を用いることも出来る。
 該反応に用いられるラジカル開始剤としては、過酸化ベンゾイル、アゾビスイソブチロニトリル(AIBN)、アゾビスシクロヘキサンカルボニトリル等を挙げることができる。
 該反応には化合物(13)1モルに対して、ハロゲン化剤が通常1~10モルの割合、ラジカル開始剤が通常0.01~1モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(A1)を単離することができる。単離された化合物(A1C)は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Reference Synthesis Method C)
Compound (A1) can be synthesized by reacting compound (13) with a halogenating agent.
Figure JPOXMLDOC01-appb-I000015
[Wherein R 3 and Z 11 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ters, anisole, ethers such as methyl tert-butyl ether, diisopropyl ether, carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, fluorobenzene, difluorobenzene, trifluorobenzene, chlorobenzene, dichlorobenzene, trichlorobenzene , Α, α, α-trifluorotoluene, halogenated hydrocarbons such as α, α, α-trichlorotoluene, esters such as ethyl acetate and methyl acetate, acetone, methyl ethyl ketone, methyl Ketones such as isobutyl ketone, acetonitrile, nitriles and mixtures thereof, such as propionitrile and the like.
Examples of the halogenating agent that can be used in the reaction include a chlorinating agent, a brominating agent, or an iodinating agent such as chlorine, bromine, iodine, sulfuryl chloride, N-chlorosuccinimide, N-bromosuccinimide, 1,3-dibromo. -5,5-dimethylhydantoin, iodosuccinimide, tert-butyl hypochlorite, N-chloroglutarimide, N-bromoglutarimide, N-chloro-N-cyclohexyl-benzenesulfonimide, N-bromophthalimide .
A radical initiator can also be used for this reaction.
Examples of the radical initiator used in the reaction include benzoyl peroxide, azobisisobutyronitrile (AIBN), azobiscyclohexanecarbonitrile and the like.
In the reaction, the halogenating agent is usually used in a proportion of 1 to 10 mol and the radical initiator is usually used in a proportion of 0.01 to 1 mol with respect to 1 mol of the compound (13).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (A1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (A1C) can be further purified by chromatography, recrystallization, and the like.
(参考合成法D)
 式(15)で示される化合物(以下、化合物(15)と記す。)は、化合物(A1)のうち、RがZである式(A1−D)で示される化合物(以下、化合物(A1−D)と記す。)と、式(14)で示される化合物(以下、化合物(14)と記す。)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000016
〔式中、Z11およびZは前記と同じ意味を表し、RはC1−C12アルキル基またはフェニル基を表し、Mはナトリウム、カリウム、またはリチウムを表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtertert−ブチルエーテル、ジイソプロピルエーテル等のエ−テル類、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、アセトニトリル、プロピオニトリル等のニトリル類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、メタノール、エタノール、プロパノール、ブタノール等のアルコール類およびこれらの混合物が挙げられる。
 化合物(14)としては、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムプロポキシド、ナトリウムブトキシド、ナトリウムイソプロポキシド、ナトリウムsec−ブトキシド、ナトリウムtert−ブトキシド、カリウムメトキシド、カリウムエトキシド、カリウムプロポキシド、カリウムブトキシド、カリウムイソプロポキシド、カリウムsec−ブトキシド、カリウムtert−ブトキシド、ナトリウムフェノキシド等が挙げられる。
 該反応には化合物(A1−D)1モルに対して、化合物(14)が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(15)を単離することができる。さらに蒸留、クロマトグラフィー、再結晶等の操作で精製してもよい。
(Reference Synthesis Method D)
A compound represented by formula (15) (hereinafter referred to as compound (15)) is a compound represented by formula (A1-D) in which R 6 is Z 6 (hereinafter referred to as compound (15)). A1-D)) and a compound represented by formula (14) (hereinafter referred to as compound (14)) can be produced.
Figure JPOXMLDOC01-appb-I000016
[Wherein, Z 11 and Z 6 represent the same meaning as described above, R 4 represents a C1-C12 alkyl group or a phenyl group, and M represents sodium, potassium, or lithium. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether, n-heptane, n -Hydrocarbons such as hexane, cyclohexane, n-pentane, toluene, xylene, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, acetonitrile, propionitrile, etc. Nitriles, N, N-dimethylformamide, 1,3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, Ketones such as Louis Seo ketone, methanol, ethanol, propanol, and mixtures thereof, such as butanol.
As the compound (14), sodium methoxide, sodium ethoxide, sodium propoxide, sodium butoxide, sodium isopropoxide, sodium sec-butoxide, sodium tert-butoxide, potassium methoxide, potassium ethoxide, potassium propoxide, potassium Examples include butoxide, potassium isopropoxide, potassium sec-butoxide, potassium tert-butoxide, sodium phenoxide and the like.
In the reaction, compound (14) is usually used at a ratio of 1 to 10 mol with respect to 1 mol of compound (A1-D).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (15) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, purification may be performed by operations such as distillation, chromatography, recrystallization and the like.
(参考合成法E)
 式(16)で示される化合物(以下、化合物(16)と記す。)は、化合物(15)と化合物(7)とを塩基及び触媒存在下でカップリング反応することにより合成することができる。
Figure JPOXMLDOC01-appb-I000017
〔式中、R、Zは前記と同じ意味を表し、R3AはC1−C3アルキル基またはシクロプロピル基を表し、ZはB(OH)、アルコキシボリル基、またはトリフルオロボレート塩(BF )を表す。〕
 該反応は、通常溶媒中で行われる。
該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、メタノール、エタノール、プロパノール、ブタノール等のアルコール類、水およびこれらの混合物が挙げられる。
 該反応に用いられる有機ホウ素化合物(7)は、通常市販のものを用いるか、N. Miyaura and A. Suzuki, Chem. Rev.,1995,95,2457等の総説に記載された公知の方法により合成したものを用いることもできる。該反応に用いられる有機ホウ素化合物(7)は、例えば、R3Aのヨウ素化合物(R3A−I)またはブロモ化合物(R3A−Br)とブチルリチウムなとのアルキルリチウムとを反応させた後、ホウ酸エステルと反応させることによりボロン酸エステル誘導体を合成することができる。また、前述の反応で得られたボロン酸エステル誘導体を、必要に応じて加水分解することによりボロン酸誘導体を合成することができる。さらに、Molander et al.Acc.Chem.Res.,2007,40,275などの総説に記載された公知の方法に従い、前記ボロン酸エステルをフッ化水素カリウム等でフッ素化することにより、トリフルオロボレート塩BF を得ることもできる。
 該反応に用いられる触媒としては、酢酸パラジウム(II)、ジクロロビス(トリフェニルホスフィン)パラジウム、テトラキストリフェニルホスフィンパラジウム(0)、パラジウム(II)アセテート/トリスシクロヘキシルホスフィン、ビス(ジフェニルホスファンフェロセニル)パラジウム(II)ジクロリド、1,3−ビス(2,6−ジイソプロピルフェニル)イミダゾール−2−イリデン(1,4−ナフトキノン)パラジウムダイマー、アリル(クロロ)(1,3−ジメシチル−1,3−ジヒドロ−2H−イミダゾール−2−イリデン)パラジウムまたはパラジウム(II)アセテート/ジシクロヘキシル(2’,4’,6’−トリイソプロピルビフェニル−2−イル)ホスフィン、トリス(ジベンジリデンアセトン)ジパラジウム等が挙げられる。
 該反応に用いられる塩基としては、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、リン酸三カリウム等のアルカリ金属リン酸塩、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムtert−ブトキシド、カリウムtert−ブトキシドのアルカリ金属アルコキシド等が挙げられる。
 該反応には化合物(15)1モルに対して、化合物(7)が通常1~10モルの割合、塩基が通常1~10モルの割合、触媒が通常0.0001~1モルの割合で用いられる。
 該反応の反応温度は通常0~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(16)を単離することができる。単離された化合物(16)は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Reference Synthesis Method E)
The compound represented by formula (16) (hereinafter referred to as compound (16)) can be synthesized by coupling reaction of compound (15) and compound (7) in the presence of a base and a catalyst.
Figure JPOXMLDOC01-appb-I000017
[Wherein R 4 and Z 6 represent the same meaning as described above, R 3A represents a C1-C3 alkyl group or a cyclopropyl group, and Z 7 represents B (OH) 2 , an alkoxyboryl group, or a trifluoroborate salt. It represents a - (BF 3 K +). ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, methanol, ethanol, propanol, alcohols such as butanol, water and mixtures thereof.
As the organic boron compound (7) used in the reaction, a commercially available one is usually used, or N.I. Miyaura and A.M. Suzuki, Chem. Rev. , 1995, 95, 2457, etc., and those synthesized by known methods can also be used. Organoboron compounds used in the reaction (7), for example, after the reaction of alkyllithium and butyl Do lithium iodide compound of R 3A (R 3A -I) or bromo compound (R 3A -Br), Boronic ester derivatives can be synthesized by reacting with borate esters. Further, a boronic acid derivative can be synthesized by hydrolyzing the boronic acid ester derivative obtained by the above-described reaction as necessary. In addition, Molander et al. Acc. Chem. Res. , According to known methods described in the review of such 2007,40,275, by fluorinating with hydrogen fluoride potassium the boronic acid ester, trifluoroborate salt BF 3 - it can be obtained K +.
Catalysts used in the reaction include palladium (II) acetate, dichlorobis (triphenylphosphine) palladium, tetrakistriphenylphosphinepalladium (0), palladium (II) acetate / triscyclohexylphosphine, bis (diphenylphosphaneferrocenyl) ) Palladium (II) dichloride, 1,3-bis (2,6-diisopropylphenyl) imidazol-2-ylidene (1,4-naphthoquinone) palladium dimer, allyl (chloro) (1,3-dimesityl-1,3- Dihydro-2H-imidazol-2-ylidene) palladium or palladium (II) acetate / dicyclohexyl (2 ′, 4 ′, 6′-triisopropylbiphenyl-2-yl) phosphine, tris (dibenzylideneacetone) dipalladium And the like.
Examples of the base used in the reaction include organic bases such as triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene and diazabicyclononene. Alkali metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, etc., lithium hydroxide, sodium hydroxide, Alkali metal hydroxides such as potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metal hydrides such as lithium hydride, sodium hydride and potassium hydride ,Rin Alkali metal phosphates such as tripotassium, sodium methoxide, sodium ethoxide, sodium tert- butoxide, alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mol of the compound (15), the compound (7) is usually used in a proportion of 1 to 10 mol, the base is usually in a proportion of 1 to 10 mol, and the catalyst is usually used in a proportion of 0.0001 to 1 mol. It is done.
The reaction temperature is usually in the range of 0 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (16) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (16) can be further purified by chromatography, recrystallization and the like.
(参考合成法F)
式(A1−F)で示される化合物(以下、化合物(A1−F)と記す。)は、化合物(16)とハロゲン化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000018
〔式中、R3A、RおよびZは前記と同じ意味を表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、ギ酸、酢酸、トリフルオロ酢酸等の有機酸類、水およびこれらの混合物が挙げられる。
 該反応に用いられるハロゲン化剤としては、例えば、塩化水素酸、臭化水素酸、及びヨウ化水素酸が挙げられる。
 該反応には化合物(16)1モルに対して、ハロゲン化剤が通常1モル以上の割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(A1−F)を単離することができる。さらに蒸留、クロマトグラフィー、再結晶等の操作で精製してもよい。
(Reference Synthesis Method F)
A compound represented by the formula (A1-F) (hereinafter referred to as compound (A1-F)) can be produced by reacting compound (16) with a halogenating agent.
Figure JPOXMLDOC01-appb-I000018
[Wherein, R 3A , R 4 and Z 6 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane. Halogenated hydrocarbons such as chlorobenzene, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, nitriles such as acetonitrile and propionitrile, organic acids such as formic acid, acetic acid and trifluoroacetic acid, water and mixtures thereof. Can be mentioned.
Examples of the halogenating agent used in the reaction include hydrochloric acid, hydrobromic acid, and hydriodic acid.
In the reaction, the halogenating agent is usually used at a ratio of 1 mol or more per 1 mol of the compound (16).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (A1-F) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, purification may be performed by operations such as distillation, chromatography, recrystallization and the like.
(参考合成法G)
 式(XG2)で示される化合物(以下、化合物(XG2)と記す。)は、化合物(A1)と式(XG1)で示される化合物(以下、化合物(XG1)と記す。)とを塩基の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000019
〔式中、R、R、R、ZおよびZ11は前記と同じ意味を表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物等が挙げられる。
 該反応に用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドが挙げられる。
 該反応には化合物(A1)1モルに対して、化合物(XG1)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 該反応は、必要に応じてヨウ化ナトリウム、ヨウ化テトラブチルアンモニウムなとを加えてもよく、これらの化合物は通常、化合物(A1)1モルに対して、0.001~1.2モルの割合で用いられる。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(XG2)を単離することができる。または、反応混合物を濾過、濃縮する等の後処理操作を行うことにより、化合物(XG2)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference Synthesis Method G)
In the compound represented by the formula (XG2) (hereinafter referred to as the compound (XG2)), the compound (A1) and the compound represented by the formula (XG1) (hereinafter referred to as the compound (XG1)) are present in the presence of a base. It can manufacture by making it react under.
Figure JPOXMLDOC01-appb-I000019
[Wherein R 1 , R 2 , R 3 , Z 3 and Z 11 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like. Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mol of the compound (A1), the compound (XG1) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
In the reaction, sodium iodide or tetrabutylammonium iodide may be added as necessary. These compounds are usually added in an amount of 0.001 to 1.2 mol per 1 mol of the compound (A1). Used in proportions.
After completion of the reaction, the compound (XG2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Alternatively, compound (XG2) can be isolated by performing post-treatment operations such as filtration and concentration of the reaction mixture. Further, it can be purified by chromatography, recrystallization or the like.
(参考合成法H)
式(XH2)で示される化合物(以下、化合物(XH2)と記す。)は、化合物(XG2)と式(XH1)で示される化合物(以下、化合物(XH1)とを塩基の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000020
〔式中、R、R、RおよびZは前記と同じ意味を表し、R92はC1−C3アルキル基、Z120はC1−C3アルコキシ基またはハロゲン原子を表す。〕
該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物等が挙げられる。
 該反応に用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドが挙げられる。
 該反応には化合物(XG2)1モルに対して、化合物(XH1)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 該反応は、必要に応じて添加剤を加えてもよく、添加剤としては、例えば、18−クラウン−6、ジベンゾ−18−クラウン−6があげられる。これらの添加剤は通常、化合物(XG2)1モルに対して、0.001~1.2モルの割合で用いられる。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(XH2)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference Synthesis Method H)
A compound represented by formula (XH2) (hereinafter referred to as compound (XH2)) is obtained by reacting compound (XG2) with a compound represented by formula (XH1) (hereinafter referred to as compound (XH1)) in the presence of a base. Can be manufactured.
Figure JPOXMLDOC01-appb-I000020
[Wherein, R 1 , R 2 , R 3 and Z 3 represent the same meaning as described above, R 92 represents a C1-C3 alkyl group, and Z 120 represents a C1-C3 alkoxy group or a halogen atom. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like. Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium methoxide, sodium ethoxide, sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mole of the compound (XG2), the compound (XH1) is usually used at a ratio of 1 to 10 moles, and the base is usually used at a ratio of 1 to 10 moles.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
In the reaction, additives may be added as necessary, and examples of the additive include 18-crown-6 and dibenzo-18-crown-6. These additives are usually used in a proportion of 0.001 to 1.2 mol with respect to 1 mol of compound (XG2).
After completion of the reaction, the compound (XH2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
(参考合成法I)
式(XI1)で示される化合物(以下、化合物(XI1)と記す。)は、化合物(XH2)とヒドラジン類とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000021
〔式中、R、R、R、R92およびZは前記と同じ意味を表す。〕
該反応は、通常、溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtertert−ブチルエーテル、ジイソプロピルエーテル等のエ−テル類、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、アセトニトリル、プロピオニトリル等のニトリル類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類、メタノール、エタノール、プロパノール、ブタノール等のアルコール類、水およびこれらの混合物が挙げられる。
該反応に用いられるヒドラジン類としては、例えば、ヒドラジン1水和物、ヒドラジン塩酸塩、ヒドラジン硫酸塩、無水ヒドラジン等が挙げられる。
 該反応には化合物(XH2)1モルに対して、ヒドラジン類が通常1~100モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(XI1)を単離することができる。さらにクロマトグラフィー、再結晶等の操作で精製してもよい。
(Reference Synthesis Method I)
A compound represented by the formula (XI1) (hereinafter referred to as compound (XI1)) can be produced by reacting compound (XH2) with hydrazines.
Figure JPOXMLDOC01-appb-I000021
[Wherein R 1 , R 2 , R 3 , R 92 and Z 3 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include ethers such as diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether, n-heptane, n -Hydrocarbons such as hexane, cyclohexane, n-pentane, toluene, xylene, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, acetonitrile, propionitrile, etc. Nitriles, N, N-dimethylformamide, 1,3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, sulfoxides such as dimethyl sulfoxide, methanol, ethanol, propano Le, alcohols such as butanol, water and mixtures thereof.
Examples of hydrazines used in the reaction include hydrazine monohydrate, hydrazine hydrochloride, hydrazine sulfate, and anhydrous hydrazine.
In the reaction, hydrazines are usually used at a ratio of 1 to 100 mol with respect to 1 mol of compound (XH2).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (XI1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it may be purified by operations such as chromatography and recrystallization.
(参考合成法J)
式(XJ2)で示される化合物(以下、化合物(XJ2)と記す。)は、化合物(XI1)と式(XJ1)で示される化合物(以下、化合物(XJ1)と記す。)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000022
〔式中、R、R、R、R92、ZおよびZは前記と同じ意味を表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物が挙げられる。
 該反応に用いられる化合物(XJ1)は、通常市販のものを用いることができる。例えば、クロロジフルオロメタン、臭化メチル、臭化エチル、臭化n—プロピル、臭化n—ブチル、臭化n—ペンチル、臭化n—ヘキシル、ヨウ化メチル、ヨウ化エチル、ヨウ化プロピル、ヨウ化イソプロピル、ヨウ化イソブチル、ヨウ化イソアミル、ヨウ化2−プロピニル、ヨウ化2−ブチニル、臭化アリル、臭化シクロプロピル、臭化2−プロピニル、臭化2−ブチニル、シクロプロピルメチルブロミド、1,1−ジフルオロ−2−ヨードエタン、1,1,1−トリフルオロ−2−ヨードエタン等のハロゲン化アルキル類、硫酸ジメチル、p−トルエンスルホン酸メチル、p−トルエンスルホン酸エチル、p−トルエンスルホン酸プロピル、メタンスルホン酸メチル、メタンスルホン酸エチル、メタンスルホン酸プロピル等のアルキルまたはアリール硫酸エステル類等、塩化アセチル等のカルボン酸ハロゲン化物、メタンスルホニルクロリド、エタンスルホニルクロリド、イソプロピルスルホニルクロリド、シクロプロピルスルホニルクロリド、N,N−ジメチルスルホニルクロリド等のスルホン酸ハロゲン化物が挙げられる。
該反応には塩基を用いてもよく、用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドが挙げられる。
 該反応には化合物(XI1)1モルに対して、化合物(XJ1)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(XJ2)を単離することができる。単離された本発明化合物は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Reference Synthesis Method J)
A compound represented by formula (XJ2) (hereinafter referred to as compound (XJ2)) is reacted with compound (XI1) and a compound represented by formula (XJ1) (hereinafter referred to as compound (XJ1)). Can be manufactured.
Figure JPOXMLDOC01-appb-I000022
[Wherein R 1 , R 2 , R 3 , R 92 , Z 3 and Z 5 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
As the compound (XJ1) used in the reaction, a commercially available product can be used. For example, chlorodifluoromethane, methyl bromide, ethyl bromide, n-propyl bromide, n-butyl bromide, n-pentyl bromide, n-hexyl bromide, methyl iodide, ethyl iodide, propyl iodide, Isopropyl iodide, isobutyl iodide, isoamyl iodide, 2-propynyl iodide, 2-butynyl iodide, allyl bromide, cyclopropyl bromide, 2-propynyl bromide, 2-butynyl bromide, cyclopropylmethyl bromide, Alkyl halides such as 1,1-difluoro-2-iodoethane and 1,1,1-trifluoro-2-iodoethane, dimethyl sulfate, methyl p-toluenesulfonate, ethyl p-toluenesulfonate, p-toluenesulfone Alkyl such as propyl acid, methyl methanesulfonate, ethyl methanesulfonate, propyl methanesulfonate, etc. Is an aryl sulfates, acyl halide of acetyl chloride, methanesulfonyl chloride, ethanesulfonyl chloride, isopropylsulfonyl chloride, cyclopropyl chloride, N, a sulfonic acid halide such as N- dimethyl chloride.
In the reaction, a base may be used. Examples of the base used include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicyclone. Organic bases such as decene and diazabicyclononene, alkali metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate and cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate and cesium hydrogen carbonate Salts, alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride, cesium fluoride, lithium hydride, sodium hydride , Potassium hydride Alkali metal hydrides, lithium hydride, sodium hydride, an alkali metal hydride such as potassium hydride, sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mol of compound (XI1), compound (XJ1) is usually used in a proportion of 1 to 10 mol, and base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (XJ2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
(参考合成法K)
式(XK1)で示される化合物(以下、化合物(XK1)と記す。)は、化合物(XJ2)と加水分解剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000023
〔式中、R、R、R、R92、ZおよびZは前記と同じ意味を表す。〕
該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、水、メタノール、エタノール、プロパノール、ブタノール等のアルコール類、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類およびこれらの混合物が挙げられる。
該反応に用いられる加水分解剤としては、例えば、水酸化カリウム水溶液、水酸化ナトリウム水溶液等の塩基、塩酸、硫酸などの酸が挙げられる。
該反応には化合物(XJ2)1モルに対して、加水分解剤が通常0.5~20モルの割合で用いられる。
該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~72時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(XK1)を単離することができる。単離された化合物(XK1)は、さらに、クロマトグラフィー、再結晶等の操作で精製することもできる。
(Reference Synthesis Method K)
A compound represented by the formula (XK1) (hereinafter referred to as compound (XK1)) can be produced by reacting compound (XJ2) with a hydrolyzing agent.
Figure JPOXMLDOC01-appb-I000023
[Wherein, R 1 , R 2 , R 3 , R 92 , Z 1 and Z 3 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include water, alcohols such as methanol, ethanol, propanol, and butanol, hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, and diethyl ether. , Tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether and other ethers, carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, etc. Mention may be made of halogenated hydrocarbons, ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and mixtures thereof.
Examples of the hydrolyzing agent used in the reaction include bases such as potassium hydroxide aqueous solution and sodium hydroxide aqueous solution, and acids such as hydrochloric acid and sulfuric acid.
In the reaction, the hydrolyzing agent is usually used at a ratio of 0.5 to 20 mol with respect to 1 mol of the compound (XJ2).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 72 hours.
After completion of the reaction, the compound (XK1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (XK1) can be further purified by operations such as chromatography and recrystallization.
(参考合成法L)
式(XL1)で示される化合物(以下、化合物(XL1)と記す。)は、化合物(XK1)とハロゲン化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000024
〔式中、R、R、R、R100、ZおよびZは前記と同じ意味を表す。〕
該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸メチル等のエステル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類およびこれらの混合物が挙げられる。
 該反応に用いられるハロゲン化剤としては、例えば、オキシ塩化リン、三塩化リン、五塩化リン、塩化チオニル、オキシ臭化リン、三臭化リン、五臭化リン、三ヨウ化リン、二塩化オキサリル、二臭化オキサリル、トリホスゲン、ジホスゲン、ホスゲンおよび塩化スルフリルが挙げられる。
 該反応には化合物(XK1)1モルに対して、ハロゲン化剤が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 該反応は触媒を加えてもよく、N,N−ジメチルホルムアミド、トリエチルアミン、ジイソプロピルエチルアミン等が用いられ、化合物(XK1)1モルに対して、触媒が0.001~1モルの割合で用いられる。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(XL1)を単離することができる。単離された化合物(XL1)は、さらに、クロマトグラフィー、再結晶等の操作で精製してもよい。
(Reference Synthesis Method L)
A compound represented by the formula (XL1) (hereinafter referred to as compound (XL1)) can be produced by reacting compound (XK1) with a halogenating agent.
Figure JPOXMLDOC01-appb-I000024
[Wherein, R 1 , R 2 , R 3 , R 100 , Z 1 and Z 3 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether and diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane and chlorobenzene, esters such as ethyl acetate and methyl acetate , Ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, nitriles such as acetonitrile and propionitrile, and mixtures thereof.
Examples of the halogenating agent used in the reaction include phosphorus oxychloride, phosphorus trichloride, phosphorus pentachloride, thionyl chloride, phosphorus oxybromide, phosphorus tribromide, phosphorus pentabromide, phosphorus triiodide, and dichloride. Oxalyl, oxalyl dibromide, triphosgene, diphosgene, phosgene and sulfuryl chloride.
In the reaction, the halogenating agent is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (XK1).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
In the reaction, a catalyst may be added, and N, N-dimethylformamide, triethylamine, diisopropylethylamine or the like is used, and the catalyst is used in a ratio of 0.001 to 1 mol with respect to 1 mol of compound (XK1).
After completion of the reaction, the compound (XL1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (XL1) may be further purified by operations such as chromatography and recrystallization.
(参考合成法M)
化合物(C1)は、化合物(XL1)とアミド化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000025
〔式中、R、R、R、R100、ZおよびZは前記と同じ意味を表す。〕
 該反応に用いられる溶媒としては、例えば、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルシメチルエ−テル、アニソール、メチルtertert−ブチルエーテル、ジイソプロピルエーテル等のエ−テル類、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、アセトニトリル、プロピオニトリル等のニトリル類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、ジメチルスルホキシド等のスルホキシド類、メタノール、エタノール、プロパノール、ブタノール等のアルコール類、水およびこれらの混合物が挙げられる。
該反応に用いられるアミド化剤としては、例えば、アンモニア水溶液、アンモニア塩酸塩、アンモニア硫酸塩、アンモニアガス等が挙げられる。また、アミド化剤は溶媒として用いることもできる
 該反応には化合物(XL1)1モルに対して、アミド化剤が通常1モル~大過剰量の割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~72時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(C1)を単離することができる。また、沈殿物が生じた際には、沈殿物を濾取することにより、化合物(C1)を単離することができる。さらにクロマトグラフィー、再結晶等の操作で精製してもよい。
(Reference Synthesis Method M)
Compound (C1) can be produced by reacting compound (XL1) with an amidating agent.
Figure JPOXMLDOC01-appb-I000025
[Wherein, R 1 , R 2 , R 3 , R 100 , Z 1 and Z 3 represent the same meaning as described above. ]
Examples of the solvent used in the reaction include diethyl ether, tetrahydrofuran, 1,4-dioxane, ethers such as ethylene glycol-lucmethyl ether, anisole, methyl tert-butyl ether, diisopropyl ether, n-heptane, n -Hydrocarbons such as hexane, cyclohexane, n-pentane, toluene, xylene, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, acetonitrile, propionitrile, etc. Nitriles, N, N-dimethylformamide, 1,3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, sulfoxides such as dimethyl sulfoxide, methanol, ethanol, propano Le, alcohols such as butanol, water and mixtures thereof.
Examples of the amidating agent used in the reaction include an aqueous ammonia solution, ammonia hydrochloride, ammonia sulfate, and ammonia gas. An amidating agent can also be used as a solvent. In the reaction, an amidating agent is usually used in a proportion of 1 mol to large excess with respect to 1 mol of compound (XL1).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 72 hours.
After completion of the reaction, the compound (C1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. In addition, when a precipitate is generated, the compound (C1) can be isolated by filtering the precipitate. Further, it may be purified by operations such as chromatography and recrystallization.
(参考合成法AA)
化合物(A2)は、式(YA1)で示される化合物(以下、化合物(YA1)と記す。)と酸とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000026
〔式中、R、R、R92、Z、ZおよびZは前記と同じ意味を表す。〕
該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、メタノール、エタノール、プロパノール、ブタノール等のアルコール類、水、酢酸およびこれらの混合物等が挙げられる。
 該反応に用いられる酸としては、例えば、酢酸、塩酸、臭化水素酸が挙げられ、またこれらの水溶液は溶媒として用いることもできる。
 該反応には通常、化合物(YA1)1モルに対して、酸が大過剰量の割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~100時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(A2)を単離することができる。または、反応混合物を濃縮等の後処理操作を行うことにより化合物(A2)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference Synthesis Method AA)
Compound (A2) can be produced by reacting a compound represented by the formula (YA1) (hereinafter referred to as compound (YA1)) with an acid.
Figure JPOXMLDOC01-appb-I000026
[Wherein R 1 , R 2 , R 92 , Z 1 , Z 2 and Z 3 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include alcohols such as methanol, ethanol, propanol, and butanol, water, acetic acid, and mixtures thereof.
Examples of the acid used in the reaction include acetic acid, hydrochloric acid, and hydrobromic acid, and these aqueous solutions can also be used as a solvent.
In the reaction, an acid is usually used in a large excess amount relative to 1 mol of the compound (YA1).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 100 hours.
After completion of the reaction, the compound (A2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Alternatively, the compound (A2) can be isolated by performing post-treatment operations such as concentration of the reaction mixture. Further, it can be purified by chromatography, recrystallization or the like.
(参考合成法AB)
化合物(YA1)は、式(YB1)で示される化合物(以下、化合物(YB1)と記す。)と化合物(XJ1)とを塩基の存在下反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000027
〔式中、R、R、R92、Z、Z、ZおよびZは前記と同じ意味を表す。〕
 該反応は、参考合成法Jに準じて実施することができる。
(Reference Synthesis Method AB)
Compound (YA1) can be produced by reacting a compound represented by formula (YB1) (hereinafter referred to as compound (YB1)) with compound (XJ1) in the presence of a base.
Figure JPOXMLDOC01-appb-I000027
[Wherein R 1 , R 2 , R 92 , Z 1 , Z 2 , Z 3 and Z 5 represent the same meaning as described above. ]
This reaction can be carried out according to Reference Synthesis Method J.
(参考合成法AC)
 式(YC3)で示される化合物(以下、化合物(YC3)を記す。)は、式(YC1)で示される化合物(以下、化合物(YC1)と記す。)と式(YC2)で示される化合物(以下、化合物(YC2)と記す。)とを塩基の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000028
〔式中、R、R、およびZは前記と同じ意味を表す。〕
該反応は、通常溶媒中で行われる。
該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド煩、アセトニトリル、プロピオニトリル等のニトリル類およびこれらの混合物が挙げられる。
 該反応に用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドが挙げられる。
 該反応には化合物(YC1)1モルに対して、化合物(YC2)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−78~150℃の範囲である。該反応の反応時間は通常0.1~72時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(YC3)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference synthesis method AC)
A compound represented by formula (YC3) (hereinafter referred to as compound (YC3)) is a compound represented by formula (YC1) (hereinafter referred to as compound (YC1)) and a compound represented by formula (YC2) ( Hereinafter, it can be produced by reacting compound (YC2)) in the presence of a base.
Figure JPOXMLDOC01-appb-I000028
[Wherein, R 1 , R 2 and Z 3 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 Acid amides such as 1,3-dimethyl-2-imidazolidinone and N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile Beauty mixtures thereof.
Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like. Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mol of the compound (YC1), the compound (YC2) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −78 to 150 ° C. The reaction time is usually in the range of 0.1 to 72 hours.
After completion of the reaction, the compound (YC3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
(参考合成法AD)
 化合物(XG1)は、化合物(YC3)を酸の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000029
〔式中、R、R、およびZは前記と同じ意味を表す。〕
該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、ニトロメタン、アセトニトリル、プロピオニトリル等のニトリル類、およびこれらの混合物等が挙げられる。
 該反応に用いられる酸としては、例えば、三塩化アルミニウム、四塩化チタン、三塩化鉄、フッ化水素、次亜塩素酸、ポリりん酸等が挙げられる。
 該反応には化合物(YC3)1モルに対して、酸が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~72時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(XG1)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference synthesis method AD)
Compound (XG1) can be produced by reacting compound (YC3) in the presence of an acid.
Figure JPOXMLDOC01-appb-I000029
[Wherein, R 1 , R 2 and Z 3 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, nitromethane, acetonitrile, propionitrile, etc. Nitriles, and mixtures thereof.
Examples of the acid used in the reaction include aluminum trichloride, titanium tetrachloride, iron trichloride, hydrogen fluoride, hypochlorous acid, polyphosphoric acid, and the like.
In the reaction, an acid is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (YC3).
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 72 hours.
After completion of the reaction, the compound (XG1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
(参考製造法AE)
 式(YE3)で示される化合物(以下、化合物(YE3)と記す。)は、式(YE1)で示される化合物(以下、化合物(YE1)と記す。)と、式(YE2)で示される化合物(以下、化合物(YE2)と記す。)とを塩基の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000030
〔式中、R、R、R92およびZは前記と同じ意味を表す。〕
該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物等が挙げられる。
 該反応に用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドが挙げられる。
 該反応には化合物(YE1)1モルに対して、化合物(YE2)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 該反応は、必要に応じて添加剤を加えてもよく、添加剤としては、例えば、18−クラウン−6−エーテル、ジベンゾ−18−クラウン−6−エーテル等があげられる。これらの添加剤は通常、化合物(YE1)1モルに対して、0.001~1.2モルの割合で用いられる。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(YE3)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference production method AE)
A compound represented by formula (YE3) (hereinafter referred to as compound (YE3)) is a compound represented by formula (YE1) (hereinafter referred to as compound (YE1)) and a compound represented by formula (YE2). (Hereinafter referred to as compound (YE2)) in the presence of a base.
Figure JPOXMLDOC01-appb-I000030
[Wherein R 1 , R 2 , R 92 and Z 3 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like. Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mol of the compound (YE1), the compound (YE2) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
In the reaction, an additive may be added as necessary, and examples of the additive include 18-crown-6-ether and dibenzo-18-crown-6-ether. These additives are usually used in a proportion of 0.001 to 1.2 mol with respect to 1 mol of the compound (YE1).
After completion of the reaction, the compound (YE3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
(参考製造法AF)
式(YF2)で示される化合物(以下、化合物(YF2)と記す。)は、化合物(YE1)と式(YF1)で示される化合物(以下、化合物(YF1)と記す。)とを塩基の存在下反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000031
〔式中、R、R、Z、Z、R92、およびZ120は前記と同じ意味を表す。〕
該反応は、参考合成法Hに準じて実施することができる。
(Reference production method AF)
In the compound represented by the formula (YF2) (hereinafter referred to as the compound (YF2)), the compound (YE1) and the compound represented by the formula (YF1) (hereinafter referred to as the compound (YF1)) are present in the presence of a base. It can manufacture by making it react.
Figure JPOXMLDOC01-appb-I000031
[Wherein, R 1 , R 2 , Z 2 , Z 3 , R 92 , and Z 120 represent the same meaning as described above. ]
This reaction can be carried out according to Reference Synthesis Method H.
(参考製造法AG)
化合物(YB1)は化合物(YF2)とヒドラジン類と反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000032
〔式中、R、R、R92、ZおよびZは前記と同じ意味を表す。〕
該反応は、参考合成法Iに準じて実施することができる。
(Reference production method AG)
Compound (YB1) can be produced by reacting compound (YF2) with hydrazines.
Figure JPOXMLDOC01-appb-I000032
[Wherein R 1 , R 2 , R 92 , Z 2 and Z 3 represent the same meaning as described above. ]
This reaction can be carried out according to Reference Synthesis Method I.
(参考合成法AH)
 式(YH3)で示される化合物(以下、化合物(YH3)と記す。)は、式(YH1)で示される化合物(以下、化合物(YH1)と記す。)と式(YH2)で示される化合物(以下、化合物(YH2)と記す。)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000033
〔式中、R、R、R、R92、R100およびZは前記と同じ意味を表し、RfはC1−C3パーフルオロアルキル基を表し、nは0または1を表す。〕
該反応は、通常溶媒中まで行われる。
該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトニトリル、プロピオニトリル等のニトリル類、メタノール、エタノール、イソプロパノール等のアルコール類、水およびこれらの混合物が挙げられる。
 該反応には化合物(YH1)1モルに対して、化合物(YH2)が通常1~10モルの割合で用いられる。
該反応の反応温度は通常−78~150℃の範囲である。該反応の反応時間は通常0.1~72時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(YH3)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference synthesis method AH)
A compound represented by formula (YH3) (hereinafter referred to as compound (YH3)) is a compound represented by formula (YH1) (hereinafter referred to as compound (YH1)) and a compound represented by formula (YH2) ( Hereinafter, it can be produced by reacting with compound (YH2).
Figure JPOXMLDOC01-appb-I000033
[Wherein R 1 , R 2 , R 3 , R 92 , R 100 and Z 3 represent the same meaning as described above, Rf represents a C1-C3 perfluoroalkyl group, and n represents 0 or 1. ]
The reaction is usually carried out in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile, Methanol, ethanol, alcohols such as isopropanol, water and mixtures thereof.
In the reaction, compound (YH2) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (YH1).
The reaction temperature of the reaction is usually in the range of −78 to 150 ° C. The reaction time is usually in the range of 0.1 to 72 hours.
After completion of the reaction, the compound (YH3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
(参考合成法AI)
式(YI1)で示される化合物(以下、化合物(YI1)と記す。)は、化合物(YH3)を酸の存在下反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000034
〔式中、R、R、R92、ZおよびRfは前記と同じ意味を表す。〕
該反応は、通常溶媒中で行われる。
該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトニトリル、プロピオニトリル等のニトリル類、メタノール、エタノール、イソプロパノール等のアルコール類、水およびこれらの混合物が挙げられる。
 該反応に用いられる酸としては、例えば、酢酸、塩酸、臭化水素酸等が挙げられ、またこれらの水溶液は溶媒として用いることもできる。
 該反応には化合物(YH3)1モルに対して、酸が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−78~150℃の範囲である。該反応の反応時間は通常0.1~72時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより化合物(YI1)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference Synthesis Method AI)
A compound represented by the formula (YI1) (hereinafter referred to as compound (YI1)) can be produced by reacting compound (YH3) in the presence of an acid.
Figure JPOXMLDOC01-appb-I000034
[Wherein R 1 , R 2 , R 92 , Z 3 and Rf represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile, Methanol, ethanol, alcohols such as isopropanol, water and mixtures thereof.
Examples of the acid used in the reaction include acetic acid, hydrochloric acid, hydrobromic acid and the like, and these aqueous solutions can also be used as a solvent.
In the reaction, an acid is usually used at a ratio of 1 to 10 mol with respect to 1 mol of the compound (YH3).
The reaction temperature of the reaction is usually in the range of −78 to 150 ° C. The reaction time is usually in the range of 0.1 to 72 hours.
After completion of the reaction, the compound (YI1) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Further, it can be purified by chromatography, recrystallization or the like.
(参考製造法AJ)
式(YJ1)で示される化合物(以下、化合物(YJ1)と記す。)は、化合物(YE3)と化合物(YH2)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000035
〔式中、n、R、R、R92、R100およびZは前記と同じ意味を表す。〕
該反応は、溶媒中または無溶媒で行われる。
該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物が挙げられる。該反応には、必要ならば酸を加えてもよく、該反応に用いられる酸としては、塩酸、硫酸、酢酸、臭化水素酸、p−トルエンスルホン酸等が挙げられる。該反応には化合物(YE3)1モルに対して、化合物(YH2)が通常1~100モルの割合、酸が通常1~100モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を減圧濃縮し、有機溶媒で抽出し、有機層を乾燥、濃縮、ろ過等の後処理操作を行うことにより、化合物(YJ1)を単離することができる。単離された本発明化合物は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Reference production method AJ)
The compound represented by the formula (YJ1) (hereinafter referred to as the compound (YJ1)) can be produced by reacting the compound (YE3) with the compound (YH2).
Figure JPOXMLDOC01-appb-I000035
[Wherein, n, R 1 , R 2 , R 92 , R 100 and Z 3 represent the same meaning as described above. ]
The reaction is performed in a solvent or without a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, nitriles such as acetonitrile and propionitrile, And mixtures thereof. An acid may be added to the reaction if necessary. Examples of the acid used in the reaction include hydrochloric acid, sulfuric acid, acetic acid, hydrobromic acid, p-toluenesulfonic acid and the like. In the reaction, with respect to 1 mol of the compound (YE3), the compound (YH2) is usually used in a proportion of 1 to 100 mol, and the acid is usually used in a proportion of 1 to 100 mol.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the reaction mixture is concentrated under reduced pressure, extracted with an organic solvent, and the organic layer is dried, concentrated, filtered and post-treatment operations such as filtration can be performed to isolate the compound (YJ1). The isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
(参考合成法AK)
式(YK1)で示される化合物(以下、化合物(YK1)と記す。)は、式(YJ1K)で示される化合物(以下、化合物(YJ1K)と記す。)を、N,N−ジメチルホルムアミドとオキシ塩化リンとから調整されるホルミル化剤と反応させたのち、水と反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000036
〔式中、R、RおよびR92は前記と同じ意味を表す。〕
該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類およびこれらの混合物が挙げられる。
 該反応におけるホルミル化剤は、化合物(YJ1K)1モルに対して、N,N−ジメチルホルムアミド1~10モルとオキシ塩化リン1~10モルとを混合させたものであり、水は化合物(YJ1K)1モルに対して1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、通常1モル以上の水を加え、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(YK1)を単離することができる。単離された本発明化合物は、クロマトグラフィ−、再結晶等によりさらに精製することもできる。
(Reference synthesis method AK)
The compound represented by the formula (YK1) (hereinafter referred to as the compound (YK1)) is the same as the compound represented by the formula (YJ1K) (hereinafter referred to as the compound (YJ1K)) and N, N-dimethylformamide and oxy. It can be produced by reacting with a formylating agent prepared from phosphorus chloride and then reacting with water.
Figure JPOXMLDOC01-appb-I000036
[Wherein, R 1 , R 2 and R 92 represent the same meaning as described above. ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane and n-pentane, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether, methyl tert. -Ethers such as butyl ether and diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1,3-dimethyl-2 Acid amides such as imidazolidinone and N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, ketones such as acetone, methyl ethyl ketone and methyl isobutyl ketone, acetonitrile Nitriles such as propionitrile and mixtures thereof.
The formylating agent in the reaction is a mixture of 1 to 10 mol of N, N-dimethylformamide and 1 to 10 mol of phosphorus oxychloride with respect to 1 mol of compound (YJ1K), and water is compound (YJ1K). ) It is used at a ratio of 1 to 10 moles per mole.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (YK1) may be isolated by performing post-treatment operations such as adding usually 1 mol or more of water, extracting the reaction mixture with an organic solvent, and drying and concentrating the organic layer. it can. The isolated compound of the present invention can be further purified by chromatography, recrystallization and the like.
(参考合成法AL)
式(YL2)で示される化合物(以下、化合物(YL2)と記す。)は、化合物(YK1)と式(YL1)で示される化合物(以下、化合物(YL1)と記す。)とを塩基の存在下で反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000037
〔式中、R、RおよびR92は前記と同じ意味を表し、R52はC1−C2アルキル基を表し、Z2HはOR52またはSR52を表す。〕
 該反応は、通常溶媒中で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素類、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物等が挙げられる。
 該反応に用いられる塩基としては、例えば、トリエチルアミン、ピリジン、N−メチルモルホリン、N−メチルピペリジン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン、ルチジン、コリジン、ジアザビシクロウンデセン、ジアザビシクロノネン等の有機塩基、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等のアルカリ金属炭酸塩、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム等のアルカリ金属炭酸水素塩、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化セシウム等のアルカリ金属水酸化物、フッ化ナトリウム、フッ化カリウム、フッ化セシウム等のアルカリ金属ハロゲン化物、水素化リチウム、水素化ナトリウム、水素化カリウム等のアルカリ金属水素化物、ナトリウムtert−ブトキシド、カリウムtert−ブトキシド等のアルカリ金属アルコキシドが挙げられる。
 該反応には化合物(YK1)1モルに対して、化合物(YL1)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 該反応は、化合物(YL1)とアルカリ金属炭酸塩、アルカリ金属炭酸水素塩、アルカリ金属水酸化物、アルカリ金属ハロゲン化物、アルカリ金属水素化物またはアルカリ金属アルコキシドとから調整される化合物(YL1)の金属塩をあらかじめ調整して反応に用いることもできる。用いることができる化合物(YL1)の金属塩としては、例えば、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムプロポキシド、ナトリウムイソプロポキシド、カリウムメトキシド、カリウムエトキシド、ナトリウムチオメトキシド、ナトリウムチオエトキシドが挙げられる。
 該反応には化合物(YK1)1モルに対して、化合物(YL1)の金属塩が通常1~10モルの割合で用いられる。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(YL2)を単離することができる。または、反応混合物を濾過、濃縮する等の後処理操作を行うことにより、化合物(YL2)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference synthesis method AL)
In the compound represented by the formula (YL2) (hereinafter referred to as the compound (YL2)), the compound (YK1) and the compound represented by the formula (YL1) (hereinafter referred to as the compound (YL1)) are present in the base. It can manufacture by making it react under.
Figure JPOXMLDOC01-appb-I000037
[Wherein R 1 , R 2 and R 92 represent the same meaning as described above, R 52 represents a C1-C2 alkyl group, and Z 2H represents OR 52 or SR 52 . ]
The reaction is usually performed in a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
Examples of the base used in the reaction include triethylamine, pyridine, N-methylmorpholine, N-methylpiperidine, 4-dimethylaminopyridine, diisopropylethylamine, lutidine, collidine, diazabicycloundecene, diazabicyclononene and the like. Alkali metal carbonates such as organic bases, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, alkali metal hydrogen carbonates such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium hydroxide, hydroxide Alkali metal hydroxides such as sodium, potassium hydroxide and cesium hydroxide, alkali metal halides such as sodium fluoride, potassium fluoride and cesium fluoride, alkali metals such as lithium hydride, sodium hydride and potassium hydride Hydrogenation , Sodium tert- butoxide, and alkali metal alkoxides such as potassium tert- butoxide.
In the reaction, with respect to 1 mol of the compound (YK1), the compound (YL1) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
The reaction is carried out by reacting the compound (YL1) with an alkali metal carbonate, alkali metal hydrogencarbonate, alkali metal hydroxide, alkali metal halide, alkali metal hydride or alkali metal alkoxide. A salt can be prepared in advance and used in the reaction. Examples of the metal salt of the compound (YL1) that can be used include sodium methoxide, sodium ethoxide, sodium propoxide, sodium isopropoxide, potassium methoxide, potassium ethoxide, sodium thiomethoxide, sodium thioethoxide. Is mentioned.
In the reaction, the metal salt of compound (YL1) is usually used at a ratio of 1 to 10 mol per 1 mol of compound (YK1).
After completion of the reaction, the compound (YL2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Alternatively, the compound (YL2) can be isolated by performing post-treatment operations such as filtration and concentration of the reaction mixture. Further, it can be purified by chromatography, recrystallization or the like.
(参考合成法AM)
式(YI2)で示される化合物(以下、化合物(YI2)と記す。)は、式(YM1)で示される化合物(以下、化合物(YM1)と記す。)を酸の存在下、還元剤と反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000038
〔式中、R、RおよびR92は前記と同じ意味を表し、Z2AはZ2Hおよび塩素原子を表す。〕
 該反応は、溶媒中または無溶媒で行われる。
 該反応に用いられる溶媒としては、例えば、n−ヘプタン、n−ヘキサン、シクロヘキサン、n−ペンタン、トルエン、キシレン等の炭化水素煩、ジエチルエーテル、テトラヒドロフラン、1,4−ジオキサン、エチレングリコ−ルジメチルエ−テル、アニソール、メチルtert−ブチルエーテル、ジイソプロピルエーテル等のエーテル類、四塩化炭素、クロロホルム、ジクロロメタン、1,2−ジクロロエタン、テトラクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、N,N−ジメチルホルムアミド、1,3−ジメチル−2−イミダゾリジノン、N−メチルピロリドン等の酸アミド類、酢酸エチル、酢酸メチル等のエステル類、ジメチルスルホキシド等のスルホキシド類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類、アセトニトリル、プロピオニトリル等のニトリル類、水およびこれらの混合物等が挙げられる。
 該反応に用いられる還元剤としては、リチウムボロハイドライド、ナトリウムボロハイドライド、カリウムボロハイドライド等の金属ボロン酸塩化合物、トリエチルシラン等のトリアルキルシラン化合物などが挙げられる。
 該反応に用いられる酸としては、三フッ化ホウ素、トリフルオロ酢酸等が挙げられる。
該反応には、化合物(YM1)1モルに対して、還元剤が通常1~10モルの割合、酸が通常1~10モルの割合もしくは大過剰量で用いられる。
 該反応の反応温度は通常−20~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(YI2)を単離することができる。または、反応混合物を濾過、濃縮する等の後処理操作を行うことにより化合物(YI2)を単離することができる。さらにクロマトグラフィ−、再結晶等により精製することもできる。
(Reference synthesis method AM)
The compound represented by the formula (YI2) (hereinafter referred to as the compound (YI2)) is reacted with the compound represented by the formula (YM1) (hereinafter referred to as the compound (YM1)) with a reducing agent in the presence of an acid. Can be manufactured.
Figure JPOXMLDOC01-appb-I000038
[Wherein R 1 , R 2 and R 92 represent the same meaning as described above, and Z 2A represents Z 2H and a chlorine atom. ]
The reaction is performed in a solvent or without a solvent.
Examples of the solvent used in the reaction include hydrocarbons such as n-heptane, n-hexane, cyclohexane, n-pentane, toluene, xylene, diethyl ether, tetrahydrofuran, 1,4-dioxane, ethylene glycol dimethyl ether. Ethers such as ter, anisole, methyl tert-butyl ether, diisopropyl ether, halogenated hydrocarbons such as carbon tetrachloride, chloroform, dichloromethane, 1,2-dichloroethane, tetrachloroethane, chlorobenzene, N, N-dimethylformamide, 1 , 3-dimethyl-2-imidazolidinone, acid amides such as N-methylpyrrolidone, esters such as ethyl acetate and methyl acetate, sulfoxides such as dimethyl sulfoxide, acetone, methyl ethyl ketone, methyl isobutyl ketone Ketones such as down, nitriles such as acetonitrile and propionitrile, water and mixtures thereof.
Examples of the reducing agent used in the reaction include metal boronate compounds such as lithium borohydride, sodium borohydride and potassium borohydride, and trialkylsilane compounds such as triethylsilane.
Examples of the acid used in the reaction include boron trifluoride and trifluoroacetic acid.
In the reaction, with respect to 1 mol of the compound (YM1), the reducing agent is usually used in a proportion of 1 to 10 mol, and the acid is usually used in a proportion of 1 to 10 mol or a large excess.
The reaction temperature of the reaction is usually in the range of −20 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (YI2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. Alternatively, compound (YI2) can be isolated by performing post-treatment operations such as filtration and concentration of the reaction mixture. Further, it can be purified by chromatography, recrystallization or the like.
 本殺菌活性化合物は、いずれも本テトラゾリノン化合物とは異なる作用機作を有しており、以下の群(A1)および群(A2)に分類される。
 群(A1):アゾール化合物
 プロピコナゾール、プロチオコナゾール、トリアジメノール、プロクロラズ、ペンコナゾール、テブコナゾール、フルシラゾール、ジニコナゾール、ブロムコナゾール、エポキシコナゾール、ジフェノコナゾール、シプロコナゾール、メトコナゾール、トリフルミゾール、テトラコナゾール、マイクロブタニル、フェンブコナゾール、ヘキサコナゾール、フルキンコナゾール、トリティコナゾール、ビテルタノール、イマザリル、イプコナゾール、シメコナゾール、ヒメキサゾール、エトリディアゾール及びフルトリアホールからなる群。
 群(A2):カルボキサミド化合物
ビキサフェン、ベンゾビンジフルピル、フルキサピロキサド、ペンチオピラド、N−(1,1,3−トリメチルインダン−4−イル)−1−メチル−3−ジフルオロメチルピラゾール−4−カルボン酸アミド、
下記式(b)で表される化合物、
Figure JPOXMLDOC01-appb-I000039
イソフェタミド、イソピラザム、ボスカリド、フルオピラム、セダキサン、ペンフルフェン、フルトラニル、メプロニル、カルボキシン、チフルザミド及びフラメトピルからなる群。
これらの本殺菌活性化合物はいずれも公知の化合物であり、例えば「THE PESTICIDE MANUAL − 14th EDITION(BCPC刊)ISBN 1901396142」、国際公開第2011/162397号、または国際公開第2007/072999号に記載されている。これらの化合物は市販の製剤から得るか、公知の方法により合成することができる。本発明におけるN−(1,1,3−トリメチルインダン−4−イル)−1−メチル−3−ジフルオロメチルピラゾール−4−カルボン酸アミドの態様として、式(a1)
Figure JPOXMLDOC01-appb-I000040
で表される化合物および/または式(a2)
Figure JPOXMLDOC01-appb-I000041
で表される化合物があげられる。
以下、本殺菌活性化合物を[表1]および[表2]に示す。
Each of the present bactericidal active compounds has an action mechanism different from that of the present tetrazolinone compound, and is classified into the following groups (A1) and (A2).
Group (A1): azole compound propiconazole, prothioconazole, triazimenol, prochloraz, penconazole, tebuconazole, flusilazole, diniconazole, bromconazole, epoxiconazole, difenoconazole, cyproconazole, metconazole, triflumizole, tetra A group consisting of conazole, microbutanyl, fenbuconazole, hexaconazole, fluquinconazole, triticonazole, viteltanol, imazalyl, ipconazole, cimeconazole, himexazole, etridazole and flutriahol.
Group (A2): carboxamide compounds bixafen, benzobindiflupyr, floxapyroxide, penthiopyrad, N- (1,1,3-trimethylindan-4-yl) -1-methyl-3-difluoromethylpyrazole-4- Carboxylic acid amide,
A compound represented by the following formula (b):
Figure JPOXMLDOC01-appb-I000039
The group consisting of isofetamide, isopyrazam, boscalid, fluopyram, sedaxane, penflufen, flutolanil, mepronil, carboxin, tifluzamide and flametopyr.
These bactericidal active compounds are all known compounds, and are described in, for example, “THE PESTICIDE MANUAL-14th EDITION (BCPC) ISBN 190139396142”, International Publication No. 2011/162397, or International Publication No. 2007/072999. ing. These compounds can be obtained from commercial preparations or synthesized by known methods. As an aspect of N- (1,1,3-trimethylindan-4-yl) -1-methyl-3-difluoromethylpyrazole-4-carboxylic acid amide in the present invention, a compound represented by the formula (a1)
Figure JPOXMLDOC01-appb-I000040
And / or formula (a2)
Figure JPOXMLDOC01-appb-I000041
The compound represented by these is mention | raise | lifted.
The bactericidal active compounds are shown in [Table 1] and [Table 2].
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000042
Figure JPOXMLDOC01-appb-T000043
Figure JPOXMLDOC01-appb-T000043
 本発明組成物における、本テトラゾリノン化合物と本殺菌活性化合物との重量比は、例えば、本テトラゾリノン化合物/本殺菌活性化合物=0.01/1~500/1、0.1/1~10/1及び0.1/1~3/1が挙げられ、中でも0.3/1~3/1が好ましい。 The weight ratio of the present tetrazolinone compound and the present bactericidal active compound in the composition of the present invention is, for example, the present tetrazolinone compound / the present bactericidal active compound = 0.01 / 1 to 500/1, 0.1 / 1 to 10/1. And 0.1 / 1 to 3/1, and 0.3 / 1 to 3/1 is particularly preferable.
 本発明組成物は、本テトラゾリノン化合物と本殺菌活性化合物との混合物そのものでもよいが、本発明組成物は、通常、本テトラゾリノン化合物、本殺菌活性化合物及び不活性担体を混合し、必要に応じて界面活性剤やその他の製剤用補助剤を添加したものである。
本発明組成物は、油剤、乳剤、フロアブル剤、水和剤、顆粒水和剤、粉剤、粒剤等に製剤化されていてもよい。かかる製剤は、そのまま又はその他の不活性成分を添加して植物病害防除剤として使用することができる。
 本発明組成物には、本テトラゾリノン化合物及び本殺菌活性化合物が合計で、通常0.1~99重量%、好ましくは0.2~90重量%、より好ましくは1~80重量%含有される。
The composition of the present invention may be a mixture of the tetrazolinone compound and the bactericidal active compound itself, but the composition of the present invention is usually mixed with the tetrazolinone compound, the bactericidal active compound and an inert carrier, if necessary. A surfactant and other formulation adjuvants are added.
The composition of the present invention may be formulated into oils, emulsions, flowables, wettable powders, granular wettable powders, powders, granules and the like. Such a preparation can be used as a plant disease control agent as it is or with addition of other inactive ingredients.
The composition of the present invention contains the present tetrazolinone compound and the present bactericidal active compound in a total amount of usually 0.1 to 99% by weight, preferably 0.2 to 90% by weight, more preferably 1 to 80% by weight.
 製剤化の際に用いられる固体担体としては、例えば、粘土類(例えば、カオリン、珪藻土、合成含水酸化珪素、フバサミクレ−、ベントナイト、酸性白土)、タルク類、その他の無機鉱物(例えば、セリサイト、石英粉末、硫黄粉末、活性炭、炭酸カルシウム、水和シリカ)等の微粉末あるいは粒状物が挙げられ、液体担体としては、例えば、水、アルコ−ル類(例えば、メタノ−ル、エタノ−ル)、ケトン類(例えば、アセトン、メチルエチルケトン)、芳香族炭化水素類(例えば、ベンゼン、トルエン、キシレン、エチルベンゼン、メチルナフタレン)、脂肪族炭化水素類(例えば、n−ヘキサン、シクロヘキサノン、灯油)、エステル類(例えば、酢酸エチル、酢酸ブチル)、ニトリル類(例えば、アセトニトリル、イソブチロニトリル)、エーテル類(例えば、ジオキサン、ジイソプロピルエ−テル)、酸アミド類(例えば、DMF、ジメチルアセトアミド)、ハロゲン化炭化水素類(例えば、ジクロロエタン、トリクロロエチレン、四塩化炭素)が挙げられる。 Examples of the solid carrier used in the formulation include clays (for example, kaolin, diatomaceous earth, synthetic hydrous silicon oxide, fubasamic clay, bentonite, acidic clay), talc, and other inorganic minerals (for example, sericite, Examples thereof include fine powders or granular materials such as quartz powder, sulfur powder, activated carbon, calcium carbonate, and hydrated silica). Examples of the liquid carrier include water and alcohols (eg, methanol, ethanol). , Ketones (for example, acetone, methyl ethyl ketone), aromatic hydrocarbons (for example, benzene, toluene, xylene, ethylbenzene, methylnaphthalene), aliphatic hydrocarbons (for example, n-hexane, cyclohexanone, kerosene), esters (For example, ethyl acetate, butyl acetate), nitriles (for example, acetonitrile, isobutyronitrate) Le), ethers (e.g., dioxane, diisopropyl d - ether), acid amides (e.g., DMF, dimethylacetamide), halogenated hydrocarbons (e.g., dichloroethane, trichlorethylene, carbon tetrachloride) and the like.
 界面活性剤としては、例えばアルキル硫酸エステル類、アルキルスルホン酸塩、アルキルアリ−ルスルホン酸塩、アルキルアリ−ルエ−テル類及びそのポリオキシエチレン化物、ポリオキシエチレングリコ−ルエ−テル類、多価アルコ−ルエステル類、糖アルコ−ル誘導体が挙げられる。 Examples of the surfactant include alkyl sulfates, alkyl sulfonates, alkyl aryl sulfonates, alkyl aryl ethers and polyoxyethylene compounds thereof, polyoxyethylene glycol ethers, polyvalent Examples include alcohol esters and sugar alcohol derivatives.
 その他の製剤用補助剤としては、例えば固着剤、分散剤、安定剤があげられ、具体的にはカゼイン、ゼラチン、多糖類(例えば、デンプン、アラビヤガム、セルロ−ス誘導体、アルギン酸)、リグニン誘導体、ベントナイト、糖類、合成水溶性高分子(例えば、ポリビニルアルコ−ル、ポリビニルピロリドン、ポリアクリル酸類)、PAP(酸性りん酸イソプロピル)、BHT(2,6−ジ−tert−ブチル−4−メチルフェノ−ル)、BHA(2−tert−ブチル−4−メトキシフェノ−ルと3−tert−ブチル−4−メトキシフェノ−ルとの混合物)、植物油、鉱物油、脂肪酸またはそのエステル等が挙げられる。 Examples of other formulation adjuvants include, for example, fixing agents, dispersants, and stabilizers. Specifically, casein, gelatin, polysaccharides (for example, starch, arabic gum, cellulose derivatives, alginic acid), lignin derivatives, Bentonite, sugars, synthetic water-soluble polymers (for example, polyvinyl alcohol, polyvinyl pyrrolidone, polyacrylic acids), PAP (isopropyl acid phosphate), BHT (2,6-di-tert-butyl-4-methylphenol) ), BHA (mixture of 2-tert-butyl-4-methoxyphenol and 3-tert-butyl-4-methoxyphenol), vegetable oil, mineral oil, fatty acid or ester thereof, and the like.
 本発明組成物はまた、本テトラゾリノン化合物と本殺菌活性化合物とを各々前記した方法により製剤化した上で、必要に応じて水で希釈して、本テトラゾリノン化合物を含有する製剤及び本殺菌活性化合物を含有する製剤、あるいはそれらの希釈液を混合することにより調製することもできる。 The composition of the present invention is also prepared by formulating the tetrazolinone compound and the bactericidal active compound by the above-described methods, and then diluting with water as necessary to prepare the tetrazolinone compound and the bactericidal active compound. Can also be prepared by mixing the preparations containing these or their dilutions.
 本発明組成物は、植物病害から植物を保護するために用いることができる。 The composition of the present invention can be used to protect plants from plant diseases.
 本発明の防除方法は、本発明組成物を植物又は植物を栽培する土壌に処理するか、本テトラゾリノン化合物と本殺菌活性化合物とを別々に植物又は植物を栽培する土壌に処理することにより、植物病害を防除することができる The control method of the present invention comprises treating a plant or soil for cultivating the plant with the present composition, or treating the tetrazolinone compound and the bactericidal active compound separately on the soil for cultivating the plant or plant, Can control disease
 本発明組成物を施用する方法としては、実質的に本発明組成物が施用され得る形態であればその方法は特に限定されないが、例えば茎葉散布等の植物体への処理、土壌処理等の植物の栽培地への処理、種子消毒等の種子への処理が挙げられる。 The method of applying the composition of the present invention is not particularly limited as long as the composition of the present invention can be applied substantially, but for example, treatment of plants such as foliage spraying, plants such as soil treatment, etc. To seeds such as seed sterilization and so on.
 本発明組成物の施用量は、気象条件、製剤形態、施用時期、施用方法、施用場所、対象病害、対象作物等によっても異なるが、1000mあたり、通常1~500g、好ましくは2~200gである。乳剤、水和剤、懸濁剤等は通常水で希釈して施用されるが、その場合の希釈後の本発明組成物濃度は、通常0.0005~2重量%、好ましくは0.005~1重量%であり、粉剤、粒剤等は通常希釈することなくそのまま施用される。種子への処理においては、種子1Kgに対しての本発明組成物量は、通常0.001~100g、好ましくは0.01~50gの範囲で施用される。 The application amount of the composition of the present invention varies depending on weather conditions, formulation form, application time, application method, application location, target disease, target crop, etc., but is usually 1 to 500 g, preferably 2 to 200 g per 1000 m 2. is there. Emulsions, wettable powders, suspensions and the like are usually diluted with water and applied. In this case, the concentration of the composition of the present invention after dilution is usually 0.0005 to 2% by weight, preferably 0.005 to It is 1% by weight, and powders, granules and the like are usually applied as they are without dilution. In the treatment for seeds, the amount of the composition of the present invention per 1 kg seed is usually applied in the range of 0.001 to 100 g, preferably 0.01 to 50 g.
 本発明における植物病害の生息場所としては、水田、畑、茶園、果樹園、非農耕地、家屋、育苗トレイや育苗箱、育苗培土及び育苗マット等が挙げられる。 Examples of habitats for plant diseases in the present invention include paddy fields, fields, tea gardens, orchards, non-agricultural lands, houses, seedling trays and seedling boxes, seedling culture soils and seedling mats.
 本発明組成物は、畑、水田、芝生、果樹園等の農耕地における植物病害の防除剤として使用することができる。本発明組成物は、以下に挙げられる「植物」等を栽培する農耕地等において、当該農耕地の病害を防除することができる。 The composition of the present invention can be used as a plant disease control agent in agricultural land such as fields, paddy fields, lawns, orchards. The composition of the present invention can control diseases of the cultivated land in cultivated lands where the following “plants” and the like are cultivated.
 農作物;トウモロコシ、イネ、コムギ、オオムギ、ライムギ、エンバク、ソルガム、ワタ、ダイズ、ピ−ナッツ、ソバ、テンサイ、ナタネ、ヒマワリ、サトウキビ、タバコ等、野菜;ナス科野菜(ナス、トマト、ピ−マン、トウガラシ、ジャガイモ等)、ウリ科野菜(キュウリ、カボチャ、ズッキ−ニ、スイカ、メロン等)、アブラナ科野菜(ダイコン、カブ、セイヨウワサビ、コ−ルラビ、ハクサイ、キャベツ、カラシナ、ブロッコリ−、カリフラワ−等)、キク科野菜(ゴボウ、シュンギク、ア−ティチョ−ク、レタス等)、ユリ科野菜(ネギ、タマネギ、ニンニク、アスパラガス)、セリ科野菜(ニンジン、パセリ、セロリ、アメリカボウフウ等)、アカザ科野菜(ホウレンソウ、フダンソウ等)、シソ科野菜(シソ、ミント、バジル等)、イチゴ、サツマイモ、ヤマノイモ、サトイモ等、
 花卉、
 観葉植物、
 果樹;仁果類(リンゴ、セイヨウナシ、ニホンナシ、カリン、マルメロ等)、核果類(モモ、スモモ、ネクタリン、ウメ、オウトウ、アンズ、プル−ン等)、カンキツ類(ウンシュウミカン、オレンジ、レモン、ライム、グレ−プフル−ツ等)、堅果類(クリ、クルミ、ハシバミ、ア−モンド、ピスタチオ、カシュ−ナッツ、マカダミアナッツ等)、液果類(ブル−ベリ−、クランベリ−、ブラックベリ−、ラズベリ−等)、ブドウ、カキ、オリ−ブ、ビワ、バナナ、コ−ヒ−、ナツメヤシ、ココヤシ等、
 果樹以外の樹;チャ、クワ、花木、街路樹(トネリコ、カバノキ、ハナミズキ、ユ−カリ、イチョウ、ライラック、カエデ、カシ、ポプラ、ハナズオウ、フウ、プラタナス、ケヤキ、クロベ、モミノキ、ツガ、ネズ、マツ、トウヒ、イチイ)等。
Agricultural crops: corn, rice, wheat, barley, rye, oats, sorghum, cotton, soybeans, peanuts, buckwheat, sugar beet, rapeseed, sunflower, sugarcane, tobacco, etc., vegetables; solanaceous vegetables (eggplants, tomatoes, peppers) , Pepper, potato, etc.), cucurbitaceae vegetables (cucumber, pumpkin, zucchini, watermelon, melon, etc.), cruciferous vegetables (radish, turnip, horseradish, cold rabi, Chinese cabbage, cabbage, mustard, broccoli, cauliflower -), Asteraceae vegetables (burdock, garlic, artichoke, lettuce, etc.), Liliaceae vegetables (leek, onion, garlic, asparagus), Aceraceae vegetables (carrots, parsley, celery, American redfish, etc.) , Red vegetables (spinach, chard, etc.), perilla vegetables (perilla, mint, basil) ), Strawberry, sweet potato, yam, taro, etc.,
Bridegroom,
Foliage plant,
Fruit trees; pears (apples, pears, Japanese pears, quince, quince, etc.), nuclear fruits (peaches, plums, nectarines, ume, sweet cherry, apricots, prune, etc.), citrus fruits (Satsuma mandarin, orange, lemon, lime) , Grapefruit, etc.), nuts (chestnut, walnut, hazel, almond, pistachio, cashew nut, macadamia nut, etc.), berries (blueberry, cranberry, blackberry, raspberry) -Grapes, oysters, olives, loquat, bananas, coffee, dates, coconuts, etc.
Trees other than fruit trees; tea, mulberry, flowering trees, street trees (ash, birch, dogwood, eucalyptus, ginkgo, lilac, maple, oak, poplar, redwood, fu, sycamore, zelkova, black bean, peach tree, tsuga, rat, Pine, spruce, yew).
 上記「植物」には遺伝子組換え作物も含まれる。 The above “plants” include genetically modified crops.
 本発明組成物により防除することができる植物病害としては、例えば糸状菌等の植物病原菌が挙げられ、より詳しくは以下のものを挙げることができるが、これらに限定されるものではない。 Examples of plant diseases that can be controlled by the composition of the present invention include phytopathogenic fungi such as filamentous fungi, and the following can be mentioned in more detail, but are not limited thereto.
 イネの病害:いもち病(Magnaporthe grisea)、ごま葉枯病(Cochliobolus miyabeanus)、紋枯病(Rhizoctonia solani)、馬鹿苗病(Gibberella fujikuroi)。
 コムギの病害:うどんこ病(Erysiphe graminis)、赤かび病(Fusarium graminearum、F. avenacerum、F. culmorum、Microdochium nivale)、さび病(Puccinia striiformis、P. graminis、P. recondita)、紅色雪腐病(Micronectriella nivale)、雪腐小粒菌核病(Typhula sp.)、裸黒穂病(Ustilago tritici)、なまぐさ黒穂病(Tilletia caries)、眼紋病(Pseudocercosporella herpotrichoides)、葉枯病(Mycosphaerella graminicola)、ふ枯病(Stagonospora nodorum)、黄斑病(Pyrenophora tritici−repentis)。
 オオムギの病害:うどんこ病(Erysiphe graminis)、赤かび病(Fusarium graminearum、F. avenacerum、F. culmorum、Microdochium nivale)、さび病(Puccinia striiformis、P.graminis、P.hordei)、裸黒穂病(Ustilago nuda)、雲形病(Rhynchosporium secalis)、網斑病(Pyrenophora teres)、斑点病(Cochliobolus sativus)、斑葉病(Pyrenophora graminea)、リゾクトニア属菌による苗立枯れ病(Rhizoctonia solani)。
 トウモロコシの病害:黒穂病(Ustilago maydis)、ごま葉枯病(Cochliobolus heterostrophus)、ひょう紋病(Gloeocercospora sorghi)、南方さび病(Puccinia polysora)、グレイリーフスポット病(Cercospora zeae−maydis) 、リゾクトニア属菌による苗立枯れ病(Rhizoctonia solani)。
Rice diseases: blast (Magnaporthe grisea), sesame leaf blight (Cochliobolus miyabeanus), blight (Rhizoctonia solani), idiotic seedling (Gibberella fujikuruoi).
Wheat diseases: powdery mildew (Erysiphe graminis), red mold disease (Fusarium gramaminerum, F. avenacerum, F. culmorum, Microdochium nitrid, red rust (Puccinia isp. (Microlectriella nivale), Snow rot microspora nuclear disease (Typhula sp.), Bare smut (Ustylago tritici), Tuna scab (Tilleletia carripe), Pseucercosporella morposis (Pseudocercosporella herposis) Blight (Stagonospo) a nodorum), Kimadarabyo (Pyrenophora tritici-repentis).
Diseases of barley: powdery mildew (Erysiphe graminis), red mold disease (Fusarium gramaminerum, F. avenacerum, F. culmorum, Microdochium nitrifle, black punishment) Ustilago nuda), cloud disease (Rhynchosporium secalis), reticular disease (Pyrenophora teres), spot disease (Cochliobolus sativus), leafy leaf disease (Pyrenophora graminea), and Rhizonia a.
Diseases of corn: smut (Ustilago maydis), sesame leaf blight (Cochliobolus heterostrohus), leprosy (Gloeocercospora sorgi), southern rust (Puccinia polysoria), gray leaf spot disease Rhizoctonia solani due to seedling.
 カンキツ類の病害:黒点病(Diaporthe citri)、そうか病(Elsinoe fawcetti)、果実腐敗病(Penicillium digitatum, P. italicum)、フィトフトラ病(Phytophthora parasitica、Phytophthora citrophthora)。
 リンゴの病害:モニリア病(Monilinia mali)、腐らん病(Valsa ceratosperma)、うどんこ病(Podosphaera leucotricha)、斑点落葉病(Alternaria alternata apple pathotype)、黒星病(Venturia inaequalis)、炭そ病(Colletotrichum acutatum)、疫病(Phytophtora cactorum)。
 ナシの病害:黒星病(Venturia nashicola, V. pirina)、黒斑病(Alternaria alternata Japanese pear pathotype)、赤星病(Gymnosporangium haraeanum)、疫病(Phytophtora cactorum);
 モモの病害:灰星病(Monilinia fructicola)、黒星病(Cladosporium carpophilum)、フォモプシス腐敗病(Phomopsis sp.)。
 ブドウの病害:黒とう病(Elsinoe ampelina)、晩腐病(Glomerella cingulata)、うどんこ病(Uncinula necator)、さび病(Phakopsora ampelopsidis)、ブラックロット病(Guignardia bidwellii)、べと病(Plasmopara viticola)。
 カキの病害:炭そ病(Gloeosporium kaki)、落葉病(Cercospora kaki, Mycosphaerella nawae)。
 ウリ類の病害:炭そ病(Colletotrichum lagenarium)、うどんこ病(Sphaerotheca fuliginea)、つる枯病(Mycosphaerella melonis)、つる割病(Fusarium oxysporum)、べと病(Pseudoperonospora cubensis)、疫病(Phytophthora sp.)、苗立枯病(Pythium sp.);
 トマトの病害:輪紋病(Alternaria solani)、葉かび病(Cladosporium fulvum)、疫病(Phytophthora infestans)。
 ナスの病害:褐紋病(Phomopsis vexans)、うどんこ病(Erysiphe cichoracearum)。
 アブラナ科野菜の病害:黒斑病(Alternaria japonica)、白斑病(Cercosporella brassicae)、根こぶ病(Plasmodiophora brassicae)、べと病(Peronospora parasitica)。
 ネギの病害:さび病(Puccinia allii)、べと病(Peronospora destructor)。
Diseases of citrus: Black spot disease (Diaporthe citri), common scab (Elsinoe fawceti), fruit rot (Penicillium digitatum, P. italicum), Phytophthora paraphysitic or Phytophthora or Phytophthora parathitosis.
Diseases of apples: Monilia mary, rot (Valsa ceratosperma), powdery mildew (Podospataera leucotrica), spotted leaf disease (Alternaria altertaenta black) , Phytophactora catorum.
Pear diseases: Venturia nashicola, V. pirina, Black spot (Alternaria alternata Japan pearpathotype), Gimnosporangium haraeumto, disease
Peach diseases: Monilinia fracticola, black scab (Cladosporium carpophilum), Phomopsis spoilage (Phomopsis sp.).
Grape diseases: black scab (Elsinoe ampelina), late rot (Glomerella gingulata), powdery mildew (Uncinula adipelodia), black rot (Gikonivaladi) .
Oyster diseases: Anthracnose (Gloeosporium kaki), deciduous leaf disease (Cercospora kaki, Mycosphaerella nawae).
Diseases of cucurbits: Anthracnose (Colletotrichum lagenarium), powdery mildew (Sphaerotheca furiginea), vine blight (Mycosphaerella meloniis), vine scab (Fusarium oxysporum), por disease (fusarium oxysporum) ), Seedling blight (Pythium sp.);
Diseases of tomato: Alternaria solani, leaf mold (Cladosporium fulvum), plague (Phytophthora infestans).
Diseases of eggplant: brown spot disease (Phomopsis vexans), powdery mildew (Erysiphe cichoacearum).
Diseases of cruciferous vegetables: black spot disease (Alternaria japonica), white spot disease (Cercosporella brassicae), clubroot (Plasmodiophora brassicae), downy mildew (Peronospora parasitica).
Diseases of leek: rust (Puccinia allii), downy mildew (Peronospora destructor).
 ダイズの病害:紫斑病(Cercospora kikuchii)、黒とう病(Elsinoe glycines)、黒点病(Diaporthe phaseolorum var. sojae)、褐紋病(Septoria glycines)、斑点病(Cercospora sojina)、さび病(Phakopsora pachyrhizi)、茎疫病(Phytophthora sojae)、リゾクトニア属菌による苗立枯れ病(Rhizoctonia solani)褐色輪紋病(Corynespora casiicola)、菌核病(Sclerotinia sclerotiorum)。
 インゲンの病害:炭そ病(Colletotrichum lindemthianum)。
 ラッカセイの病害:黒渋病(Cercospora personata)、褐斑病(Cercospora arachidicola)、白絹病(Sclerotium rolfsii)。
 エンドウの病害:うどんこ病(Erysiphe pisi)。
 ジャガイモの病害:夏疫病(Alternaria solani)、疫病(Phytophthora infestans)、緋色腐敗病(Phytophthora erythroseptica)、粉状そうか病(Spongospora subterranean f. sp. subterranea)。
 イチゴの病害:うどんこ病(Sphaerotheca humuli)、炭そ病(Glomerella cingulata)。
 チャの病害:網もち病(Exobasidium reticulatum)、白星病(Elsinoe leucospila)、輪斑病(Pestalotiopsis sp.)、炭そ病(Colletotrichum theae−sinensis)。
 タバコの病害:赤星病(Alternaria longipes)、うどんこ病(Erysiphe cichoracearum)、炭そ病(Colletotrichum tabacum)、べと病(Peronospora tabacina)、疫病(Phytophthora nicotianae)。
 ナタネの病害:菌核病(Sclerotinia sclerotiorum)、リゾクトニア属菌による苗立枯れ病(Rhizoctonia solani)。
 ワタの病害;リゾクトニア属菌による苗立枯れ病(Rhizoctonia solani)。
テンサイの病害:褐斑病(Cercospora beticola)、葉腐病(Thanatephorus cucumeris)、根腐病(Thanatephorus cucumeris)、黒根病(Aphanomyces cochlioides)。
 バラの病害:黒星病(Diplocarpon rosae)、うどんこ病(Sphaerotheca pannosa)、べと病(Peronospora sparsa)。
 キクおよびキク科野菜の病害:べと病(Bremia lactucae)、褐斑病(Septoria chrysanthemi−indici)、白さび病(Puccinia horiana)。
 種々の作物の病害:ピシウム属菌によって引き起こされる病害(Pythium aphanidermatum, Pythium debarianum, Pythium graminicola, Pythium irregulare, Pythium ultimum)、灰色かび病(Botrytis cinerea)、菌核病(Sclerotinia sclerotiorum)。
 ダイコンの病害:黒斑病(Alternaria brassicicola)。
 シバの病害:ダラースポット病(Sclerotinia homeocarpa)、ブラウンパッチ病およびラージパッチ病(Rhizoctonia solani)。
 バナナの病害:シガトカ病(Mycosphaerella fijiensis、Mycosphaerella musicola)。
 ヒマワリの病害:べと病(Plasmopara halstedii)。
 Aspergillus属、Penicillium属、Fusarium属、Gibberella属、Tricoderma属、Thielaviopsis属、Rhizopus属、Mucor属、Corticium属、Phoma属、Rhizoctonia属、およびDiplodia属菌等によって引き起こされる、各種作物の種子病害または生育初期の病害。
 Polymixa属またはOlpidium属等によって媒介される各種作物のウイルス病。
Diseases of soybean: Purcosis (Cercospora kikuchii), black scab (Elsinoe glycines), black spot (Diaporthe phaseolum var. Phytophthora sojae, Rhizoctonia solani, Corynespora casiicola, Sclerotinia sclerotiorum.
Kidney disease: Anthracnose (Colletotrichum lindemthianum).
Peanut disease: black astringency (Cercospora personata), brown spot (Cercospora arachidicola), white silkworm (Sclerotium rolfsii).
Pea disease: powdery mildew (Erysiphe pisi).
Potato diseases: Alternaria solani, Phytophthora infestans, Sputum rot septica, Spongosporia subteranean f.
Strawberry disease: powdery mildew (Sphaerotheca humuli), anthracnose (Glomerella singulata).
Tea diseases: net blast (Exobasidium reticulatum), white scab (Elsinoe leucospila), ring spot disease (Pestalotiosis sp.), Anthracnose (Colletotrichum theae-sinensis).
Tobacco disease: Alternaria longipes, powdery mildew (Erysiphe cichoracearum), anthracnose (Colletotrichum tabacum), downy mildew (Peronospora tabacina), epidemic (Phytophyti.
Rapeseed diseases: Sclerotinia sclerotiorum, Rhizoctonia solani, and Rhizoctonia solani.
Cotton disease; Rhizoctonia solani caused by Rhizoctonia spp.
Diseases of sugar beet: brown spot disease (Cercospora beticola), leaf rot (Thanatephorus cucumeris), root rot (Thanatephorus cucumeris), black root disease (Aphanomyces cochlioides).
Rose diseases: black spot (Diplocarpon rosae), powdery mildew (Sphaerotheca pannosa), downy mildew (Peronospora sparsa).
Diseases of chrysanthemum and asteraceae vegetables: downy mildew (Bremia lactucae), brown spot disease (Septoria chrysanthemi-indici), white rust (Puccinia horiana).
Diseases of various crops: Diseases caused by Pythium spp. (Phythium aphanidermatum, Pythium debarianum, Pythium graminicola, Pythium irregulare, Pythium ultimatum), Gray mold disease (Botritris rot)
Radish disease: Alternaria brassicicola.
Diseases of buckwheat: Dollar spot disease (Sclerotinia homeocarpa), Brown patch disease and Large patch disease (Rhizotonia solani).
Banana disease: Sigatoka disease (Mycosphaerella fijiensis, Mycosphaerella musicola).
Sunflower disease: downy mildew (Plasmopara halstedii).
Aspergillus genus, Penicillium genus, Fusarium genus, Gibberella genus, Tricoderder genus, Thielaviopsis genus, Rhizopus genus, Mucor genus, Corticium genus, Phoma genus, Rhizoctonia genus Disease.
Viral diseases of various crops mediated by Polymixa genus or Olpidium genus.
 次に、本テトラゾリノン化合物の合成法と、本発明組成物の製剤例、試験例等の実施例によりさらに具体的に説明するが、本発明はこれらの例のみに限定されるものではない。
 まず、本テトラゾリノン化合物の合成例を示す。
Next, the method for synthesizing the present tetrazolinone compound and the formulation examples and test examples of the composition of the present invention will be described more specifically, but the present invention is not limited to these examples.
First, a synthesis example of the tetrazolinone compound is shown.
合成例1
参考合成例9に記載の1−(2−ブロモメチル−3−メチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン3.1g、参考合成例16に記載の4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−2−メチル−フェノール2.7g、炭酸カリウム1.95gおよびアセトニトリル70mLの混合物を加熱還流下4時間攪拌した。室温まで冷却し、反応混合物を濾過し、濾液を濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−{3−メチル−2−[2−メチル−4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物1と記す。)3.0gを得た。
Figure JPOXMLDOC01-appb-I000044
H−NMR(CDCl)δ:7.45−7.39(3H,m),7.37(1H,dd,J=8.5,2.1Hz),7.28(1H,dd,J=7.0,2.4Hz),6.88(1H,d,J=8.5Hz),5.06(2H,s),3.85(3H,s),3.62(3H,s),2.51(3H,s),2.15(3H,s),2.13(3H,s).
Synthesis example 1
3.1 g of 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 9 and 4- (5- A mixture of chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol 2.7 g, potassium carbonate 1.95 g and acetonitrile 70 mL was stirred with heating under reflux for 4 hours. Cool to room temperature, filter the reaction mixture and concentrate the filtrate. The obtained residue was subjected to silica gel column chromatography to give 1- {3-methyl-2- [2-methyl-4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -phenoxy. 3.0 g of methyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 1) was obtained.
Figure JPOXMLDOC01-appb-I000044
1 H-NMR (CDCl 3 ) δ: 7.45-7.39 (3H, m), 7.37 (1H, dd, J = 8.5, 2.1 Hz), 7.28 (1H, dd, J = 7.0, 2.4 Hz), 6.88 (1H, d, J = 8.5 Hz), 5.06 (2H, s), 3.85 (3H, s), 3.62 (3H, s), 2.51 (3H, s), 2.15 (3H, s), 2.13 (3H, s).
合成例2
合成例1において、1−(2−ブロモメチル−3−メチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンの代わりに、参考合成例3に記載の1−(2−ブロモメチル−3−クロロフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンを用いて同様の反応を行い、1−{3−クロロ−2−[2−メチル−4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物2と記す。)を得た。
Figure JPOXMLDOC01-appb-I000045
H−NMR(CDCl)δ:7.62(1H,dd,J=8.0,1.4Hz),7.47(1H,t,J=8.0Hz),7.41−7.39(2H,m),7.36(1H,dd,J=8.4,2.2Hz),6.89(1H,d,J=8.5Hz),5.35(2H,s),3.85(3H,s),3.60(3H,s),2.14(3H,s),2.06(3H,s).
Synthesis example 2
In Synthesis Example 1, 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 3 was used instead of 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one. The same reaction was carried out using 3-chlorophenyl) -4-methyl-1,4-dihydrotetrazol-5-one, and 1- {3-chloro-2- [2-methyl-4- (5-chloro-1) , 4-Dimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 2).
Figure JPOXMLDOC01-appb-I000045
1 H-NMR (CDCl 3 ) δ: 7.62 (1H, dd, J = 8.0, 1.4 Hz), 7.47 (1H, t, J = 8.0 Hz), 7.41-7. 39 (2H, m), 7.36 (1H, dd, J = 8.4, 2.2 Hz), 6.89 (1H, d, J = 8.5 Hz), 5.35 (2H, s), 3.85 (3H, s), 3.60 (3H, s), 2.14 (3H, s), 2.06 (3H, s).
合成例3
合成例1において、1−(2−ブロモメチル−3−メチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンの代わりに、参考合成例10に記載の1−(2−ブロモメチル−3−エチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンを用いて同様の反応を行い、1−{3−エチル−2−[2−メチル−4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物3と記す。)を得た。
Figure JPOXMLDOC01-appb-I000046
H−NMR(CDCl)δ:7.50−7.44(2H,m),7.40(1H,d,J=1.6Hz),7.39−7.36(1H,m),7.28(1H,dd,J=7.1,2.1Hz),6.89(1H,d,J=8.2Hz),5.08(2H,s),3.85(3H,s),3.59(3H,s),2.85(2H,q,J=7.6Hz),2.15(3H,s),2.11(3H,s),1.28(3H,t,J=7.7Hz).
Synthesis example 3
In Synthesis Example 1, 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 10 was used instead of 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one. The same reaction was carried out using 3-ethylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one, and 1- {3-ethyl-2- [2-methyl-4- (5-chloro- 1,4-Dimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 3) was obtained. .
Figure JPOXMLDOC01-appb-I000046
1 H-NMR (CDCl 3 ) δ: 7.50-7.44 (2H, m), 7.40 (1H, d, J = 1.6 Hz), 7.39-7.36 (1H, m) , 7.28 (1H, dd, J = 7.1, 2.1 Hz), 6.89 (1H, d, J = 8.2 Hz), 5.08 (2H, s), 3.85 (3H, s), 3.59 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.15 (3H, s), 2.11 (3H, s), 1.28 (3H) , T, J = 7.7 Hz).
合成例4
室温下、参考合成例41に記載の1−{3−メチル−2−[2−メチル−4−(1,5−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン0.47g、N−クロロスクシンイミド0.17g、及びクロロホルム10mlの混合物を12時間攪拌した。クロロホルムで抽出し、飽和塩化ナトリウム水溶液で洗浄し、有機層を硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルクロマトグラフィーに付し、1−{3−メチル−2−[2−メチル−4−(4−クロロ−1,5−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物4と記す。)0.34gを得た。
Figure JPOXMLDOC01-appb-I000047
H−NMR(CDCl)δ:7.66(1H,dd,J=8.4,2.2Hz),7.61−7.60(1H,m),7.44−7.39(2H,m),7.29−7.27(1H,m),6.89(1H,d,J=8.5Hz),5.06(2H,s),3.82(3H,s),3.62(3H,s),2.51(3H,s),2.28(3H,s),2.13(3H,s).
Synthesis example 4
1- {3-Methyl-2- [2-methyl-4- (1,5-dimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl} -4 described in Reference Synthesis Example 41 at room temperature A mixture of 0.47 g of methyl-1,4-dihydrotetrazol-5-one, 0.17 g of N-chlorosuccinimide and 10 ml of chloroform was stirred for 12 hours. The mixture was extracted with chloroform, washed with a saturated aqueous sodium chloride solution, the organic layer was dried over magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel chromatography to give 1- {3-methyl-2- [2-methyl-4- (4-chloro-1,5-dimethyl-1H-pyrazol-3-yl) -phenoxymethyl. ] 0.34 g of -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 4) was obtained.
Figure JPOXMLDOC01-appb-I000047
1 H-NMR (CDCl 3 ) δ: 7.66 (1H, dd, J = 8.4, 2.2 Hz), 7.61-7.60 (1H, m), 7.44-7.39 ( 2H, m), 7.29-7.27 (1H, m), 6.89 (1H, d, J = 8.5 Hz), 5.06 (2H, s), 3.82 (3H, s) 3.62 (3H, s), 2.51 (3H, s), 2.28 (3H, s), 2.13 (3H, s).
合成例5
合成例1において、1−(2−ブロモメチル−3−メチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンの代わりに、参考合成例43に記載の1−(2−ブロモメチル−3−メトキシフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンを用いて同様の反応を行い、1−{3−メトキシ−2−[2−メチル−4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物5と記す。)を得た。
Figure JPOXMLDOC01-appb-I000048
H−NMR(CDCl)δ:7.49(1H,t,J=8.2Hz),7.40−7.39(1H,m),7.37(1H,dd,J=8.5,2.3Hz),7.13−7.09(2H,m),6.94(1H,d,J=8.5Hz),5.32(2H,s),3.96(3H,s),3.87(3H,s),3.62(3H,s),2.17(3H,s),2.06(3H,s).
Synthesis example 5
In Synthesis Example 1, 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 43 was used instead of 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one. The same reaction is carried out using 3-methoxyphenyl) -4-methyl-1,4-dihydrotetrazol-5-one to give 1- {3-methoxy-2- [2-methyl-4- (5-chloro- 1,4-Dimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 5) was obtained. .
Figure JPOXMLDOC01-appb-I000048
1 H-NMR (CDCl 3 ) δ: 7.49 (1H, t, J = 8.2 Hz), 7.40-7.39 (1H, m), 7.37 (1H, dd, J = 8. 5, 2.3 Hz), 7.13-7.09 (2H, m), 6.94 (1H, d, J = 8.5 Hz), 5.32 (2H, s), 3.96 (3H, s), 3.87 (3H, s), 3.62 (3H, s), 2.17 (3H, s), 2.06 (3H, s).
合成例6
参考合成例10に記載の1−(2−ブロモメチル−3−エチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン0.3g、参考合成例24に記載の2−メチル−4−(1−メチル−5−トリフルオロメチル−1H−ピラゾール−3−イル)−フェノール0.27g、炭酸カリウム0.15gおよびアセトニトリル10mLの混合物を加熱還流下4時間攪拌した。室温まで冷却し、反応混合物を濾過し、濾液を濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−{3−エチル−2−[2−メチル−4−(1−メチル−5−トリフルオロメチル−1H−ピラゾール−3−イル)−フェノキシメチル]フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物6と記す。)0.3gを得た。
Figure JPOXMLDOC01-appb-I000049
H−NMR(CDCl)δ:7.53−7.50(2H,m),7.48−7.43(2H,m),7.28(1H,dd,J=7.1,2.1Hz),6.88(1H,d,J=8.2Hz),6.80(1H,s),5.09(2H,s),4.01(3H,s),3.58(3H,s),2.85(2H,q,J=7.6Hz),2.11(3H,s),1.28(3H,t,J=7.6Hz).
Synthesis Example 6
1- (2-Bromomethyl-3-ethylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one 0.3 g described in Reference Synthesis Example 10 and 2-methyl-4 described in Reference Synthesis Example 24 A mixture of 0.27 g of (1-methyl-5-trifluoromethyl-1H-pyrazol-3-yl) -phenol, 0.15 g of potassium carbonate and 10 mL of acetonitrile was stirred with heating under reflux for 4 hours. Cool to room temperature, filter the reaction mixture and concentrate the filtrate. The obtained residue was subjected to silica gel column chromatography to give 1- {3-ethyl-2- [2-methyl-4- (1-methyl-5-trifluoromethyl-1H-pyrazol-3-yl) -phenoxy. 0.3 g of methyl] phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 6) was obtained.
Figure JPOXMLDOC01-appb-I000049
1 H-NMR (CDCl 3 ) δ: 7.53-7.50 (2H, m), 7.48-7.43 (2H, m), 7.28 (1H, dd, J = 7.1) 2.1 Hz), 6.88 (1H, d, J = 8.2 Hz), 6.80 (1H, s), 5.09 (2H, s), 4.01 (3H, s), 3.58 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.11 (3H, s), 1.28 (3H, t, J = 7.6 Hz).
合成例7
合成例1において、4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−2−メチル−フェノールの代わりに、参考合成例31に記載の4−(1,4−ジメチル−5−メトキシ−1H−ピラゾール−3−イル)−2−メチル−フェノールを用いて同様の反応を行い、1−{3−メチル−2−[2−メチル−4−(1,4−ジメチル−5−メトキシ−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物7と記す。)を得た。
Figure JPOXMLDOC01-appb-I000050
H−NMR(CDCl)δ:7.44−7.39(3H,m),7.36(1H,dd,J=8.5,2.2Hz),7.29−7.26(1H,m),6.87(1H,d,J=8.5Hz),5.06(2H,s),3.94(3H,s),3.71(3H,s),3.62(3H,s),2.51(3H,s),2.13(3H,s),2.12(3H,s).
Synthesis example 7
In Synthesis Example 1, instead of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, 4- (1,4- The same reaction was carried out using dimethyl-5-methoxy-1H-pyrazol-3-yl) -2-methyl-phenol, and 1- {3-methyl-2- [2-methyl-4- (1,4- Dimethyl-5-methoxy-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 7) was obtained. .
Figure JPOXMLDOC01-appb-I000050
1 H-NMR (CDCl 3 ) δ: 7.44-7.39 (3H, m), 7.36 (1H, dd, J = 8.5, 2.2 Hz), 7.29-7.26 ( 1H, m), 6.87 (1H, d, J = 8.5 Hz), 5.06 (2H, s), 3.94 (3H, s), 3.71 (3H, s), 3.62 (3H, s), 2.51 (3H, s), 2.13 (3H, s), 2.12 (3H, s).
合成例8
0℃下、参考合成例40に記載の、1−{3−メチル−2−[2−メチル−4−(5−アミノカルボニル−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン0.5g、ピリジン10mlの混合物にオキシ塩化リン0.26gを加えた。室温下、3時間攪拌した後、水30mlを加えた。沈殿物を濾取し、水10ml、ヘキサン10mlで洗浄し、減圧乾燥し、1−{3−メチル−2−[2−メチル−4−(5−シアノ−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物8と記す。)0.38gを得た。
Figure JPOXMLDOC01-appb-I000051
H−NMR(CDCl)δ:7.46−7.40(3H,m),7.37(1H,dd,J=8.4,1.8Hz),7.28(1H,dd,J=6.9,2.2Hz),6.90(1H,d,J=8.4Hz),5.07(2H,s),4.03(3H,s),3.64(3H,s),2.51(3H,s),2.33(3H,s),2.13(3H,s).
Synthesis example 8
1- {3-methyl-2- [2-methyl-4- (5-aminocarbonyl-1,4-dimethyl-1H-pyrazol-3-yl) -phenoxy described in Reference Synthesis Example 40 at 0 ° C. 0.26 g of phosphorus oxychloride was added to a mixture of 0.5 g of methyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one and 10 ml of pyridine. After stirring at room temperature for 3 hours, 30 ml of water was added. The precipitate was collected by filtration, washed with 10 ml of water and 10 ml of hexane, dried under reduced pressure, and 1- {3-methyl-2- [2-methyl-4- (5-cyano-1,4-dimethyl-1H-pyrazole). -3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 8) (0.38 g) was obtained.
Figure JPOXMLDOC01-appb-I000051
1 H-NMR (CDCl 3 ) δ: 7.46-7.40 (3H, m), 7.37 (1H, dd, J = 8.4, 1.8 Hz), 7.28 (1H, dd, J = 6.9, 2.2 Hz), 6.90 (1H, d, J = 8.4 Hz), 5.07 (2H, s), 4.03 (3H, s), 3.64 (3H, s), 2.51 (3H, s), 2.33 (3H, s), 2.13 (3H, s).
合成例9
合成例1において、4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−2−メチル−フェノールの代わりに、参考合成例46に記載の4−(1,4,5−トリメチル−1H−ピラゾール−3−イル)−2−メチル−フェノールを用いて同様の反応を行い、1−{3−メチル−2−[2−メチル−4−(1,4,5−トリメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物9と記す。)を得た。
Figure JPOXMLDOC01-appb-I000052
H−NMR(CDCl)δ:8.48−8.44(3H,m),8.41(1H,dd,J=8.2,2.3Hz),8.31(1H,dd,J=7.0,2.9Hz),7.91(1H,d,J=8.5Hz),6.10(2H,s),4.83(3H,s),4.66(3H,s),3.55(3H,s),3.24(3H,s),3.16(3H,s),3.14(3H,s).
Synthesis Example 9
In Synthesis Example 1, instead of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, 4- (1,4,4) described in Reference Synthesis Example 46 was used. The same reaction was carried out using 5-trimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, and 1- {3-methyl-2- [2-methyl-4- (1,4,5- Trimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 9) was obtained.
Figure JPOXMLDOC01-appb-I000052
1 H-NMR (CDCl 3 ) δ: 8.48-8.44 (3H, m), 8.41 (1H, dd, J = 8.2, 2.3 Hz), 8.31 (1H, dd, J = 7.0, 2.9 Hz), 7.91 (1H, d, J = 8.5 Hz), 6.10 (2H, s), 4.83 (3H, s), 4.66 (3H, s), 3.55 (3H, s), 3.24 (3H, s), 3.16 (3H, s), 3.14 (3H, s).
合成例10
合成例6において、2−メチル−4−(1−メチル−5−トリフルオロメチル−1H−ピラゾール−3−イル)−フェノールの代わりに、参考合成例46に記載の4−(1,4,5−トリメチル−1H−ピラゾール−3−イル)−2−メチル−フェノールを用いて同様の反応を行い、1−{3−エチル−2−[2−メチル−4−(1,4,5−トリメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物10と記す。)を得た。
Figure JPOXMLDOC01-appb-I000053
H−NMR(CDCl)δ:7.49−7.43(2H,m),7.41−7.40(1H,m),7.37(1H,dd,J=8.4,2.2Hz),7.28(1H,dd,J=7.0,2.2Hz),6.88(1H,d,J=8.5Hz),5.08(2H,s),3.80(3H,s),3.58(3H,s),2.85(2H,q,J=7.6Hz),2.21(3H,s),2.11(6H,s),1.27(3H,q,J=7.7Hz).
Synthesis Example 10
In Synthesis Example 6, instead of 2-methyl-4- (1-methyl-5-trifluoromethyl-1H-pyrazol-3-yl) -phenol, 4- (1,4,4) described in Reference Synthesis Example 46 was used. The same reaction was carried out using 5-trimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, and 1- {3-ethyl-2- [2-methyl-4- (1,4,5- Trimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 10) was obtained.
Figure JPOXMLDOC01-appb-I000053
1 H-NMR (CDCl 3 ) δ: 7.49-7.43 (2H, m), 7.41-7.40 (1H, m), 7.37 (1H, dd, J = 8.4, 2.2 Hz), 7.28 (1 H, dd, J = 7.0, 2.2 Hz), 6.88 (1 H, d, J = 8.5 Hz), 5.08 (2 H, s), 3. 80 (3H, s), 3.58 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.21 (3H, s), 2.11 (6H, s), 1 .27 (3H, q, J = 7.7 Hz).
合成例11
合成例5において、4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−2−メチル−フェノールの代わりに、参考合成例46に記載の4−(1,4,5−トリメチル−1H−ピラゾール−3−イル)−2−メチル−フェノールを用いて同様の反応を行い、1−{3−メトキシ−2−[2−メチル−4−(1,4,5−トリメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン(以下、本テトラゾリノン化合物10と記す。)を得た。
Figure JPOXMLDOC01-appb-I000054
H−NMR(CDCl)δ:7.46(1H,t,J=8.2Hz),7.37(1H,d,J=1.6Hz),7.33(1H,dd,J=8.2,2.3Hz),7.09(1H,d,J=3.2Hz),7.07(1H,d,J=2.5Hz),6.90(1H,d,J=8.2Hz),5.28(2H,s),3.92(3H,s),3.79(3H,s),3.58(3H,s),2.20(3H,s),2.09(3H,s),2.03(3H,s).
Synthesis Example 11
In Synthesis Example 5, instead of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, 4- (1,4,4) described in Reference Synthesis Example 46 was used. A similar reaction is carried out using 5-trimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, and 1- {3-methoxy-2- [2-methyl-4- (1,4,5- Trimethyl-1H-pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (hereinafter referred to as the present tetrazolinone compound 10) was obtained.
Figure JPOXMLDOC01-appb-I000054
1 H-NMR (CDCl 3 ) δ: 7.46 (1H, t, J = 8.2 Hz), 7.37 (1H, d, J = 1.6 Hz), 7.33 (1H, dd, J = 8.2, 2.3 Hz), 7.09 (1H, d, J = 3.2 Hz), 7.07 (1H, d, J = 2.5 Hz), 6.90 (1H, d, J = 8) .2 Hz), 5.28 (2H, s), 3.92 (3H, s), 3.79 (3H, s), 3.58 (3H, s), 2.20 (3H, s), 2 .09 (3H, s), 2.03 (3H, s).
次に、上記の本テトラゾリノン化合物の合成中間体の合成について参考合成例を示す。 Next, a reference synthesis example is shown for the synthesis of the synthesis intermediate of the tetrazolinone compound.
参考合成例1
無水塩化アルミニウム21.9gを氷冷下N,N−ジメチルホルムアミド250mLに加え、15分攪拌した。ここにアジ化ナトリウム10.7gを加え、15分攪拌した後、1−クロロ−3−イソシアナト−2−メチルベンゼン25.0gを加え、80℃で5時間加熱した。冷却後、反応液を亜硝酸ナトリウム35g、水2Lおよび氷500gの混合物中に攪拌しながら加えた。混合物を10%塩酸で酸性とした後、酢酸エチルで抽出した。有機層を水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮し、1−(2−メチル−3−クロロフェニル)−1,4−ジヒドロテトラゾール−5−オン17.0gを得た。
Figure JPOXMLDOC01-appb-I000055
H−NMR(CDCl)δ(ppm):2.32(3H,s),7.28−7.36(2H,m),7.57(1H,dd,J=6.8,2.2Hz),13.08(1H,s).
Reference synthesis example 1
21.9 g of anhydrous aluminum chloride was added to 250 mL of N, N-dimethylformamide under ice cooling, and the mixture was stirred for 15 minutes. To this was added 10.7 g of sodium azide and stirred for 15 minutes. Then, 25.0 g of 1-chloro-3-isocyanato-2-methylbenzene was added and heated at 80 ° C. for 5 hours. After cooling, the reaction solution was added to a mixture of 35 g of sodium nitrite, 2 L of water and 500 g of ice with stirring. The mixture was acidified with 10% hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, concentrated under reduced pressure, and 1- (2-methyl-3-chlorophenyl) -1,4-dihydrotetrazol-5-one. 0 g was obtained.
Figure JPOXMLDOC01-appb-I000055
1 H-NMR (CDCl 3 ) δ (ppm): 2.32 (3H, s), 7.28-7.36 (2H, m), 7.57 (1H, dd, J = 6.8, 2 .2 Hz), 13.08 (1 H, s).
参考合成例2
参考合成例1に記載の1−(2−メチル−3−クロロフェニル)−1,4−ジヒドロテトラゾール−5−オン10.00gおよびN,N−ジメチルホルムアミド100mLの混合物に、氷冷下、60%水素化ナトリウム2.30gを加えた。混合物を室温に昇温し、1時間攪拌した。反応混合物に氷冷下、ヨウ化メチル3.2mLを加えた。混合物を室温に昇温し、14時間攪拌した。反応混合物に水を注加し、酢酸エチルで抽出した。有機層を10%塩酸、水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−メチル−3−クロロフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン1.56gを得た。
Figure JPOXMLDOC01-appb-I000056
H−NMR(CDCl)δ(ppm):2.30(3H,s),3.73(3H,s),7.27(1H,d,J=2.7Hz),7.28(1H,d,J=7.1Hz),7.52(1H,dd,J=2.7,6.8Hz).
Reference synthesis example 2
To a mixture of 10.00 g of 1- (2-methyl-3-chlorophenyl) -1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 1 and 100 mL of N, N-dimethylformamide was added 60% under ice cooling. 2.30 g of sodium hydride was added. The mixture was warmed to room temperature and stirred for 1 hour. To the reaction mixture, 3.2 mL of methyl iodide was added under ice cooling. The mixture was warmed to room temperature and stirred for 14 hours. Water was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with 10% hydrochloric acid, water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 1.56 g of 1- (2-methyl-3-chlorophenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000056
1 H-NMR (CDCl 3 ) δ (ppm): 2.30 (3H, s), 3.73 (3H, s), 7.27 (1H, d, J = 2.7 Hz), 7.28 ( 1H, d, J = 7.1 Hz), 7.52 (1H, dd, J = 2.7, 6.8 Hz).
参考合成例3
参考合成例2に記載の1−(2−メチル−3−クロロフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン1.56g、1,1’−アゾビス(シクロヘキサン−1−カルボニトリル)0.34g、N−ブロモスクシンイミド1.42gおよびクロロベンゼン30mLの混合物を加熱還流下5時間攪拌した。冷却後、反応液に水を注加し、酢酸エチルで抽出した。有機層を水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−ブロモメチル−3−クロロフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン1.94gを得た。
Figure JPOXMLDOC01-appb-I000057
H−NMR(CDCl)δ(ppm):3.76(3H,s),4.69(2H,s),7.35(1H,dd,J=1.2,8.1Hz),7.43(1H,t,J=8.1Hz),7.58(1H,dd,J=1.2,8.1Hz).
Reference synthesis example 3
1- (2-Methyl-3-chlorophenyl) -4-methyl-1,4-dihydrotetrazol-5-one 1.56 g, 1,1′-azobis (cyclohexane-1-carbonitrile described in Reference Synthesis Example 2 ) A mixture of 0.34 g, 1.42 g of N-bromosuccinimide and 30 mL of chlorobenzene was stirred with heating under reflux for 5 hours. After cooling, water was poured into the reaction solution and extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 1.94 g of 1- (2-bromomethyl-3-chlorophenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000057
1 H-NMR (CDCl 3 ) δ (ppm): 3.76 (3H, s), 4.69 (2H, s), 7.35 (1H, dd, J = 1.2, 8.1 Hz), 7.43 (1H, t, J = 8.1 Hz), 7.58 (1H, dd, J = 1.2, 8.1 Hz).
参考合成例4
無水塩化アルミニウム19.7gを氷冷下、N,N−ジメチルホルムアミド220mLに加え、15分攪拌した。ここにアジ化ナトリウム9.6gを加え、15分攪拌した後、参考合成例42に記載の1−ブロモ−3−イソシアナト−2−メチルベンゼン30.3gを加え、80℃で5時間加熱した。冷却後、反応液を亜硝酸ナトリウム33g、水2Lおよび氷500gの混合物中に攪拌しながら加えた。混合物を10%塩酸で酸性とした後、酢酸エチルで抽出した。有機層を水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮し、1−(2−メチル−3−ブロモフェニル)−1,4−ジヒドロテトラゾール−5−オン31.4gを得た。
Figure JPOXMLDOC01-appb-I000058
H−NMR(DMSO−D)δ(ppm):2.22(3H,s),7.34(1H,t,J=7.2Hz),7.49(1H,dd,J=8.2,1.1Hz),7.82(1H,dd,J=8.0,1.0Hz),14.72(1H,s).
Reference synthesis example 4
19.7 g of anhydrous aluminum chloride was added to 220 mL of N, N-dimethylformamide under ice cooling and stirred for 15 minutes. After adding 9.6 g of sodium azide and stirring for 15 minutes, 30.3 g of 1-bromo-3-isocyanato-2-methylbenzene described in Reference Synthesis Example 42 was added and heated at 80 ° C. for 5 hours. After cooling, the reaction solution was added to a mixture of 33 g of sodium nitrite, 2 L of water and 500 g of ice with stirring. The mixture was acidified with 10% hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, concentrated under reduced pressure, and 1- (2-methyl-3-bromophenyl) -1,4-dihydrotetrazol-5-one 31. .4 g was obtained.
Figure JPOXMLDOC01-appb-I000058
1 H-NMR (DMSO-D 6 ) δ (ppm): 2.22 (3H, s), 7.34 (1H, t, J = 7.2 Hz), 7.49 (1H, dd, J = 8) .2, 1.1 Hz), 7.82 (1H, dd, J = 8.0, 1.0 Hz), 14.72 (1H, s).
参考合成例5
参考合成例4に記載の1−(2−メチル−3−ブロモフェニル)−1,4−ジヒドロテトラゾール−5−オン31.40gおよびN,N−ジメチルホルムアミド250mLの混合物に、氷冷下、60%水素化ナトリウム5.90gを加えた。混合物を室温に昇温し、1時間攪拌した。反応混合物に水冷下、ヨウ化メチル8.4mLを加えた。混合物を室温に昇温し、14時間攪拌した。反応混合物に水を注加し、酢酸エチルで抽出した。有機層を10%塩酸、水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−メチル−3−ブロモフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン8.47gを得た。
Figure JPOXMLDOC01-appb-I000059
H−NMR(CDCl)δ(ppm):2.33(3H,s),3.73(3H,s),7.21(1H,dt,J=0.5,7.8Hz),7.30(1H,dd,J=1.0,8.0Hz),7.71(1H,dd,J=1.2,8.3Hz).
Reference synthesis example 5
To a mixture of 31.40 g of 1- (2-methyl-3-bromophenyl) -1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 4 and 250 mL of N, N-dimethylformamide was added 60 mL under ice-cooling. 5.90 g of% sodium hydride was added. The mixture was warmed to room temperature and stirred for 1 hour. To the reaction mixture, 8.4 mL of methyl iodide was added under water cooling. The mixture was warmed to room temperature and stirred for 14 hours. Water was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with 10% hydrochloric acid, water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 8.47 g of 1- (2-methyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000059
1 H-NMR (CDCl 3 ) δ (ppm): 2.33 (3H, s), 3.73 (3H, s), 7.21 (1H, dt, J = 0.5, 7.8 Hz), 7.30 (1H, dd, J = 1.0, 8.0 Hz), 7.71 (1H, dd, J = 1.2, 8.3 Hz).
参考合成例6
参考合成例5に記載の1−(2−メチル−3−ブロモフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン8.47g、1,1’−アゾビス(シクロヘキサン−1−カルボニトリル)1.54g、N−ブロモスクシンイミド6.44gおよびクロロベンゼン125mLの混合物を加熱還流下5時間攪拌した。冷却後、反応液に水を注加し、酢酸エチルで抽出した。有機層を水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−ブロモメチル−3−ブロモフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン7.52gを得た。
Figure JPOXMLDOC01-appb-I000060
H−NMR(CDCl)δ(ppm):3.76(3H,s),4.71(2H,s),7.34(1H,t,J=7.8Hz),7.38(1H,dd,J=8.0,1.7Hz),7.77(1H,dd,J=7.8,1.7Hz).
Reference synthesis example 6
8.47 g of 1- (2-methyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 5, 1,1′-azobis (cyclohexane-1-carbohydrate (Nitrile) 1.54 g, N-bromosuccinimide 6.44 g and chlorobenzene 125 mL were stirred with heating under reflux for 5 hours. After cooling, water was poured into the reaction solution and extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 7.52 g of 1- (2-bromomethyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000060
1 H-NMR (CDCl 3 ) δ (ppm): 3.76 (3H, s), 4.71 (2H, s), 7.34 (1H, t, J = 7.8 Hz), 7.38 ( 1H, dd, J = 8.0, 1.7 Hz), 7.77 (1H, dd, J = 7.8, 1.7 Hz).
参考合成例7
参考合成例6に記載の1−(2−ブロモメチル−3−ブロモフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン45.0g、ナトリウムメトキシド37.4gおよびテトラヒドロフラン600mLの混合物を室温で3時間攪拌した。反応混合物に飽和重曹水を注加し、酢酸エチルで抽出した。有機層を飽和重曹水で洗浄し、無水硫酸ナトリウムで乾燥した。減圧下に濃縮後、1−(2−メトキシメチル−3−ブロモフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン36.2gを得た。
Figure JPOXMLDOC01-appb-I000061
H−NMR(CDCl)δ(ppm):3.23(3H,s),3.72(3H,s),4.67(2H,s),7.33(1H,t,J=7.8Hz),7.38(1H,dd,J=1.2,8.1Hz),7.76(1H,dd,J=1.5,7.8Hz).
Reference synthesis example 7
A mixture of 45.0 g of 1- (2-bromomethyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 6, 37.4 g of sodium methoxide and 600 mL of tetrahydrofuran was obtained. Stir at room temperature for 3 hours. Saturated aqueous sodium hydrogen carbonate was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous sodium hydrogen carbonate and dried over anhydrous sodium sulfate. After concentration under reduced pressure, 36.2 g of 1- (2-methoxymethyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one was obtained.
Figure JPOXMLDOC01-appb-I000061
1 H-NMR (CDCl 3 ) δ (ppm): 3.23 (3H, s), 3.72 (3H, s), 4.67 (2H, s), 7.33 (1H, t, J = 7.8 Hz), 7.38 (1H, dd, J = 1.2, 8.1 Hz), 7.76 (1H, dd, J = 1.5, 7.8 Hz).
参考合成例8
参考合成例7に記載の1−(2−メトキシメチル−3−ブロモフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン36.2g、メチルボロン酸23.2g、フッ化セシウム66.7g、[1,1’−ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)ジクロリド ジクロロメタン付加物10.6gおよびジオキサン500mlの混合物を90℃で5.5時間攪拌した。冷却後、反応混合物をろ過し、ろ液を減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−メトキシメチル−3−メチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン25.6gを得た。
Figure JPOXMLDOC01-appb-I000062
H−NMR(CDCl)δ(ppm):2.48(3H,s),3.23(3H,s),3.72(3H,s),4.42(2H,s),7.21(1H,t,J=5.1Hz),7.35(2H,d,J=4.8Hz).
Reference synthesis example 8
1- (2-methoxymethyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one 36.2 g described in Reference Synthesis Example 7, 23.2 g of methyl boronic acid, cesium fluoride 66. A mixture of 7 g, [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride dichloromethane adduct 10.6 g and dioxane 500 ml was stirred at 90 ° C. for 5.5 hours. After cooling, the reaction mixture was filtered, and the filtrate was concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 25.6 g of 1- (2-methoxymethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000062
1 H-NMR (CDCl 3 ) δ (ppm): 2.48 (3H, s), 3.23 (3H, s), 3.72 (3H, s), 4.42 (2H, s), 7 .21 (1H, t, J = 5.1 Hz), 7.35 (2H, d, J = 4.8 Hz).
参考合成例9
参考合成例8に記載の1−(2−メトキシメチル−3−メチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン25.6g、酢酸50mL及び25%臭化水素−酢酸溶液50mLの混合物を65℃で1時間攪拌した。反応混合物に飽和食塩水を注加し、酢酸エチルで抽出した。有機層を飽和重曹水で洗浄し、無水硫酸ナトリウムで乾燥した。減圧下に濃縮後、1−(2−ブロモメチル−3−メチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンを27.9g得た。
Figure JPOXMLDOC01-appb-I000063
H−NMR(CDCl)δ(ppm):2.51(3H,s),3.75(3H,s),4.51(2H,s),7.22−7.24(1H,m),7.36−7.39(2H,m).
Reference synthesis example 9
25.6 g of 1- (2-methoxymethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one described in Reference Synthesis Example 8, 50 mL of acetic acid and 25% hydrogen bromide-acetic acid solution 50 mL of the mixture was stirred at 65 ° C. for 1 hour. Saturated brine was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous sodium hydrogen carbonate and dried over anhydrous sodium sulfate. After concentration under reduced pressure, 27.9 g of 1- (2-bromomethyl-3-methylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one was obtained.
Figure JPOXMLDOC01-appb-I000063
1 H-NMR (CDCl 3 ) δ (ppm): 2.51 (3H, s), 3.75 (3H, s), 4.51 (2H, s), 7.22-7.24 (1H, m), 7.36-7.39 (2H, m).
参考合成例10
 参考合成例7に記載の1−(2−メトキシメチル−3−ブロモフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン29.8g、トリブチルビニルスズ35.2g、テトラキストリフェニルホスフィンパラジウム11.6gおよびトルエン500mLの混合物を加熱還流下14時間攪拌した。冷却後、反応液に飽和塩化アンモニウム水溶液を注加し、酢酸エチルで抽出した。有機層を水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−メトキシメチル−3−エテニルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンを19.7g得た。
Figure JPOXMLDOC01-appb-I000064
H−NMR(CDCl)δ(ppm):7.67(1H,dd,J=7.8,1.3Hz),7.44(1H,t,J=7.8Hz),7.29(1H,dd,J=7.8,1.3Hz),7.11(1H,dd,J=17.4,11.1Hz),5.72(1H,dd,J=17.4,1.3Hz),5.44(1H,dd,J=11.1,1.3Hz),4.45(2H,s),3.72(3H,s),3.23(3H,s).
 得られた1−(2−メトキシメチル−3−エテニルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン19.7g、パラジウム−フィブロイン複合体3.02gおよびメタノール1Lの混合物を水素雰囲気下、室温で11時間攪拌した。反応混合物をろ過し、ろ液を減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−メトキシメチル−3−エチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンを19.3g得た。
Figure JPOXMLDOC01-appb-I000065
H−NMR(CDCl)δ(ppm):7.42−7.38(2H,m),7.23−7.20(1H,m),4.44(2H,s),3.72(3H,s),3.22(3H,s),2.82(2H,q,J=7.6Hz),1.27(3H,t,J=7.6Hz).
 得られた1−(2−メトキシメチル−3−エチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン19.3g、酢酸40mL及び25%臭化水素−酢酸溶液40mLの混合物を65℃で1.5時間攪拌した。反応混合物に飽和食塩水を注加し、酢酸エチルで抽出した。有機層を飽和重曹水で洗浄し、無水硫酸ナトリウムで乾燥した。減圧下で濃縮後、1−(2−ブロモメチル−3−エチルフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンを23.3g得た。
Figure JPOXMLDOC01-appb-I000066
H−NMR(CDCl)δ(ppm):7.44−7.37(2H,m),7.23(1H,dd,J=7.1,2.0Hz),4.56(2H,s),3.75(3H,s),2.85(2H,q,J=7.6Hz),1.33(3H,t,J=7.6Hz).
Reference synthesis example 10
1- (2-methoxymethyl-3-bromophenyl) -4-methyl-1,4-dihydrotetrazol-5-one 29.8 g described in Reference Synthesis Example 7, 35.2 g tributylvinyltin, tetrakistriphenylphosphine A mixture of 11.6 g of palladium and 500 mL of toluene was stirred with heating under reflux for 14 hours. After cooling, a saturated aqueous ammonium chloride solution was poured into the reaction solution, and the mixture was extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 19.7 g of 1- (2-methoxymethyl-3-ethenylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000064
1 H-NMR (CDCl 3 ) δ (ppm): 7.67 (1H, dd, J = 7.8, 1.3 Hz), 7.44 (1H, t, J = 7.8 Hz), 7.29 (1H, dd, J = 7.8, 1.3 Hz), 7.11 (1H, dd, J = 17.4, 11.1 Hz), 5.72 (1H, dd, J = 17.4, 1 .3 Hz), 5.44 (1H, dd, J = 11.1, 1.3 Hz), 4.45 (2H, s), 3.72 (3H, s), 3.23 (3H, s).
A mixture of 19.7 g of the obtained 1- (2-methoxymethyl-3-ethenylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one, 3.02 g of palladium-fibroin complex and 1 L of methanol was obtained. The mixture was stirred at room temperature for 11 hours under a hydrogen atmosphere. The reaction mixture was filtered and the filtrate was concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 19.3 g of 1- (2-methoxymethyl-3-ethylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000065
1 H-NMR (CDCl 3 ) δ (ppm): 7.42-7.38 (2H, m), 7.23-7.20 (1H, m), 4.44 (2H, s), 3. 72 (3H, s), 3.22 (3H, s), 2.82 (2H, q, J = 7.6 Hz), 1.27 (3H, t, J = 7.6 Hz).
A mixture of 19.3 g of the obtained 1- (2-methoxymethyl-3-ethylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one, 40 mL of acetic acid and 40 mL of 25% hydrogen bromide-acetic acid solution was added. The mixture was stirred at 65 ° C. for 1.5 hours. Saturated brine was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous sodium hydrogen carbonate and dried over anhydrous sodium sulfate. After concentration under reduced pressure, 23.3 g of 1- (2-bromomethyl-3-ethylphenyl) -4-methyl-1,4-dihydrotetrazol-5-one was obtained.
Figure JPOXMLDOC01-appb-I000066
1 H-NMR (CDCl 3 ) δ (ppm): 7.44-7.37 (2H, m), 7.23 (1H, dd, J = 7.1, 2.0 Hz), 4.56 (2H , S), 3.75 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 1.33 (3H, t, J = 7.6 Hz).
参考合成例11
1−(4−ヒドロキシ−3−メチル)−エタノン5.0g、ヨウ化メチル5.70g、炭酸カリウム20.0g、アセトン200mlの混合物を加熱還流下、6時間攪拌した。反応混合物を濾過し、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮し、1−(4−メトキシ−3−メチル−フェニル)−エタノン5.3gを得た。
Figure JPOXMLDOC01-appb-I000067
H−NMR(CDCl)δ:7.82(1H,dd,J=8.5,1.7Hz),7.79−7.76(1H,m),6.85(1H,d,J=8.5Hz),3.90(3H,s),2.55(3H,s),2.25(3H,s).
Reference Synthesis Example 11
A mixture of 1- (4-hydroxy-3-methyl) -ethanone (5.0 g), methyl iodide (5.70 g), potassium carbonate (20.0 g) and acetone (200 ml) was stirred with heating under reflux for 6 hours. The reaction mixture was filtered, extracted with ethyl acetate, the organic layer was washed with water, dried over anhydrous magnesium sulfate, concentrated under reduced pressure, and 1- (4-methoxy-3-methyl-phenyl) -ethanone. 3 g was obtained.
Figure JPOXMLDOC01-appb-I000067
1 H-NMR (CDCl 3 ) δ: 7.82 (1H, dd, J = 8.5, 1.7 Hz), 7.79-7.76 (1H, m), 6.85 (1H, d, J = 8.5 Hz), 3.90 (3H, s), 2.55 (3H, s), 2.25 (3H, s).
参考合成例12
室温下、参考合成例11に記載の1−(4−メトキシ−3−メチル−フェニル)−エタノン11.2g、およびテトラヒドロフラン200mlの混合物に、炭酸ジエチル16.1g、55%水素化ナトリウム6.2g、ジベンゾ−18−クラウン−6を0.05g、およびエタノール3mlを加え、加熱還流下8時間攪拌した。反応混合物に水を注加し、10%塩酸水溶液を加え酸性にし、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、3−(4−メトキシ−3−メチル−フェニル)−3−オキソ−プロピオン酸エチルエステル14.8gを得た。
Figure JPOXMLDOC01-appb-I000068
H−NMR(CDCl)δ:7.81(1H,dd,J=8.5,2.4Hz),7.76−7.76(1H,m),6.86(1H,d,J=8.5Hz),4.21(2H,q,J=7.1Hz),3.93(2H,s),3.90(3H,s),2.24(3H,s),1.26(3H,t,J=7.1Hz).
Reference Synthesis Example 12
A mixture of 11.2 g of 1- (4-methoxy-3-methyl-phenyl) -ethanone described in Reference Synthesis Example 11 and 200 ml of tetrahydrofuran was added to 16.1 g of diethyl carbonate and 6.2 g of 55% sodium hydride at room temperature. Then, 0.05 g of dibenzo-18-crown-6 and 3 ml of ethanol were added, and the mixture was stirred with heating under reflux for 8 hours. Water was poured into the reaction mixture, the mixture was acidified with 10% aqueous hydrochloric acid, extracted with ethyl acetate, the organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 14.8 g of 3- (4-methoxy-3-methyl-phenyl) -3-oxo-propionic acid ethyl ester.
Figure JPOXMLDOC01-appb-I000068
1 H-NMR (CDCl 3 ) δ: 7.81 (1H, dd, J = 8.5, 2.4 Hz), 7.76-7.76 (1H, m), 6.86 (1H, d, J = 8.5 Hz), 4.21 (2H, q, J = 7.1 Hz), 3.93 (2H, s), 3.90 (3H, s), 2.24 (3H, s), 1 .26 (3H, t, J = 7.1 Hz).
参考合成例13
室温下、参考合成例12に記載の3−(4−メトキシ−3−メチル−フェニル)−3−オキソ−プロピオン酸エチルエステル14.8g、およびトルエン100mlの混合物に、N−メチルヒドラジン29gを加え12時間攪拌した。トルエンを減圧留去した。室温下、反応混合物に水100mlを注加し、10%塩酸水溶液を加え酸性にし、3時間攪拌した。沈殿物をろ過し、水400ml、酢酸エチル500mlで洗浄した後、減圧乾燥し、5−ヒドロキシ−3−(4−メトキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール9.3gを得た。
Figure JPOXMLDOC01-appb-I000069
H−NMR(DMSO−D)δ:7.58−7.56(2H,m),6.97(1H,d,J=8.9Hz),5.90(1H,s),3.81(3H,s),3.60(3H,s),2.18(3H,s).
Reference Synthesis Example 13
At room temperature, 29 g of N-methylhydrazine was added to a mixture of 14.8 g of 3- (4-methoxy-3-methyl-phenyl) -3-oxo-propionic acid ethyl ester described in Reference Synthesis Example 12 and 100 ml of toluene. Stir for 12 hours. Toluene was distilled off under reduced pressure. At room temperature, 100 ml of water was poured into the reaction mixture, and the mixture was acidified with 10% aqueous hydrochloric acid and stirred for 3 hours. The precipitate was filtered, washed with 400 ml of water and 500 ml of ethyl acetate, and then dried under reduced pressure to obtain 9.3 g of 5-hydroxy-3- (4-methoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole. Obtained.
Figure JPOXMLDOC01-appb-I000069
1 H-NMR (DMSO-D 6 ) δ: 7.58-7.56 (2H, m), 6.97 (1H, d, J = 8.9 Hz), 5.90 (1H, s), 3 .81 (3H, s), 3.60 (3H, s), 2.18 (3H, s).
参考合成例14
0℃下、オキシ塩化リン56gにN,N−ジメチルホルムアミド4.0gを加え0.5時間攪拌した後、参考合成例13に記載の5−ヒドロキシ−3−(4−メトキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール9.3gを加えた。100℃下で7時間攪拌した後、反応溶媒を減圧留去した。反応混合物に氷水を100ml加えた後、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、5−クロロ−4−ホルミル−3−(4−メトキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール6.3gを得た。
Figure JPOXMLDOC01-appb-I000070
H−NMR(CDCl)δ:9.93(1H,s),7.55(1H,dd,J=8.5,2.2Hz),7.51(1H,s),6.90(1H,d,J=8.5Hz),3.92(3H,s),3.88(3H,s),2.27(3H,s).
Reference synthesis example 14
At 0 ° C., 4.0 g of N, N-dimethylformamide was added to 56 g of phosphorus oxychloride, and the mixture was stirred for 0.5 hour. Then, 5-hydroxy-3- (4-methoxy-3-methyl- described in Reference Synthesis Example 13 was used. 9.3 g of phenyl) -1-methyl-1H-pyrazole was added. After stirring at 100 ° C. for 7 hours, the reaction solvent was distilled off under reduced pressure. 100 ml of ice water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 6.3 g of 5-chloro-4-formyl-3- (4-methoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000070
1 H-NMR (CDCl 3 ) δ: 9.93 (1H, s), 7.55 (1H, dd, J = 8.5, 2.2 Hz), 7.51 (1H, s), 6.90 (1H, d, J = 8.5 Hz), 3.92 (3H, s), 3.88 (3H, s), 2.27 (3H, s).
参考合成例15
0℃下、参考合成例14に記載の5−クロロ−4−ホルミル−3−(4−メトキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール0.3g、およびトリフルオロ酢酸10mlの混合物に、トリエチルシラン0.27gを加えた。室温下、3時間攪拌した後、水5mlを加え、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、5−クロロ−3−(4−メトキシ−3−メチル−フェニル)−1,4−ジメチル−1H−ピラゾール0.28gを得た。
Figure JPOXMLDOC01-appb-I000071
H−NMR(DMSO−D)δ:7.42−7.40(2H,m),6.98(1H,d,J=9.2Hz),3.81(3H,s),3.80(3H,s),2.19(3H,s),2.11(3H,s).
Reference synthesis example 15
At 0 ° C., 0.3 g of 5-chloro-4-formyl-3- (4-methoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Synthesis Example 14 and 10 ml of trifluoroacetic acid To the mixture was added 0.27 g of triethylsilane. After stirring at room temperature for 3 hours, 5 ml of water was added and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 0.28 g of 5-chloro-3- (4-methoxy-3-methyl-phenyl) -1,4-dimethyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000071
1 H-NMR (DMSO-D 6 ) δ: 7.42-7.40 (2H, m), 6.98 (1H, d, J = 9.2 Hz), 3.81 (3H, s), 3 .80 (3H, s), 2.19 (3H, s), 2.11 (3H, s).
参考合成例16
参考合成例15に記載の5−クロロ−3−(4−メトキシ−3−メチル−フェニル)−1,4−ジメチル−1H−ピラゾール0.4g、47%臭化水素酸3ml、及び酢酸3mlの混合物を加熱還流下で15時間攪拌した。溶媒を留去し、残査に酢酸エチル20mlを加え、室温下1時間攪拌した。沈殿物を濾過し、ヘキサンで洗浄後、減圧下乾燥し、4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−2−メチル−フェノール0.3gを得た。
Figure JPOXMLDOC01-appb-I000072
H−NMR(DMSO−D)δ:7.33(1H,s),7.24(1H,d,J=8.2Hz),6.83(1H,d,J=8.2Hz),3.78(3H,s),2.15(3H,s),2.09(3H,s).
Reference Synthesis Example 16
0.4 g of 5-chloro-3- (4-methoxy-3-methyl-phenyl) -1,4-dimethyl-1H-pyrazole described in Reference Synthesis Example 15, 3 ml of 47% hydrobromic acid, and 3 ml of acetic acid The mixture was stirred for 15 hours under heating to reflux. The solvent was distilled off, 20 ml of ethyl acetate was added to the residue, and the mixture was stirred at room temperature for 1 hour. The precipitate was filtered, washed with hexane, and then dried under reduced pressure to obtain 0.3 g of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol.
Figure JPOXMLDOC01-appb-I000072
1 H-NMR (DMSO-D 6 ) δ: 7.33 (1H, s), 7.24 (1H, d, J = 8.2 Hz), 6.83 (1H, d, J = 8.2 Hz) , 3.78 (3H, s), 2.15 (3H, s), 2.09 (3H, s).
参考合成例17
室温下、テトラヒドロフラン50mlに、55%水素化ナトリウム3.07g、および酢酸エチル5.90gを加え、0.5時間攪拌した。次に、1−(4−メトキシ−3−メチル−フェニル)−エタノン5.50g、ジベンゾ−18−クラウン−6を0.024g、およびエタノール1mlを加え、加熱還流下6時間攪拌した。反応混合物に水を注加し、10%塩酸水溶液で酸性にし、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(4−メトキシ−3−メチル−フェニル)−ブタン−1,3−ジオン6.50gを得た。
Figure JPOXMLDOC01-appb-I000073
H−NMR(CDCl:23℃)δ:7.76(1H,dd,J=8.6,2.3Hz),7.69(1H,d,J=1.4Hz),6.85(1H,d,J=8.5Hz),6.12(1H,s),3.89(3H,s),2.25(3H,s),2.17(3H,s).
Reference Synthesis Example 17
At room temperature, 3.07 g of 55% sodium hydride and 5.90 g of ethyl acetate were added to 50 ml of tetrahydrofuran, and the mixture was stirred for 0.5 hours. Next, 5.50 g of 1- (4-methoxy-3-methyl-phenyl) -ethanone, 0.024 g of dibenzo-18-crown-6, and 1 ml of ethanol were added, and the mixture was stirred with heating under reflux for 6 hours. Water was poured into the reaction mixture, acidified with a 10% aqueous hydrochloric acid solution, and extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 6.50 g of 1- (4-methoxy-3-methyl-phenyl) -butane-1,3-dione.
Figure JPOXMLDOC01-appb-I000073
1 H-NMR (CDCl 3 : 23 ° C.) δ: 7.76 (1H, dd, J = 8.6, 2.3 Hz), 7.69 (1H, d, J = 1.4 Hz), 6.85 (1H, d, J = 8.5 Hz), 6.12 (1H, s), 3.89 (3H, s), 2.25 (3H, s), 2.17 (3H, s).
参考合成例18
室温下、参考合成例17に記載の1−(4−メトキシ−3−メチル−フェニル)−ブタン−1,3−ジオン8.7g、およびエタノール100mlの混合物に、ヒドラジン1水和物を6.3g加え、12時間攪拌した。反応混合物中のエタノールが10ml程度になるまで減圧下濃縮し、得られた残渣をシリカゲルカラムクロマトグラフィーに付し、3−(4−メトキシ−3−メチル−フェニル)−5−メチル−1H−ピラゾール8.6gを得た。
Figure JPOXMLDOC01-appb-I000074
H−NMR(CDCl)δ:7.49−7.46(2H,m),6.83−6.80(1H,m),6.26(1H,s),3.84(3H,s),2.31(3H,s),2.23(3H,s).
Reference Synthesis Example 18
At room temperature, hydrazine monohydrate was added to a mixture of 8.7 g of 1- (4-methoxy-3-methyl-phenyl) -butane-1,3-dione described in Reference Synthesis Example 17 and 100 ml of ethanol. 3 g was added and stirred for 12 hours. The reaction mixture was concentrated under reduced pressure until the amount of ethanol reached about 10 ml, and the resulting residue was subjected to silica gel column chromatography to give 3- (4-methoxy-3-methyl-phenyl) -5-methyl-1H-pyrazole. 8.6 g was obtained.
Figure JPOXMLDOC01-appb-I000074
1 H-NMR (CDCl 3 ) δ: 7.49-7.46 (2H, m), 6.83-6.80 (1H, m), 6.26 (1H, s), 3.84 (3H , S), 2.31 (3H, s), 2.23 (3H, s).
参考合成例19
0℃下、参考合成例18に記載の3−(4−メトキシ−3−メチル−フェニル)−5−メチル−1H−ピラゾール8.6g、およびN,N−ジメチルホルムアミド200mlの混合物に、55%水素化ナトリウムを2.2g加え、0.5時間攪拌し、ヨウ化メチル59.0gを加えた。12時間攪拌した後、反応混合物に水を注加し、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、3−(4−メトキシ−3−メチル−フェニル)−1,5−ジメチル−1H−ピラゾール5.9gを得た。
Figure JPOXMLDOC01-appb-I000075
H−NMR(CDCl)δ:7.56−7.55(1H,m),7.53−7.50(1H,m),6.82(1H,d,J=8.5Hz),6.24(1H,d,J=0.7Hz),3.84(3H,s),3.80(3H,s),2.29(3H,s),2.25(3H,s).
Reference Synthesis Example 19
At 0 ° C., 55% of a mixture of 8.6 g of 3- (4-methoxy-3-methyl-phenyl) -5-methyl-1H-pyrazole described in Reference Synthesis Example 18 and 200 ml of N, N-dimethylformamide was added. 2.2 g of sodium hydride was added and stirred for 0.5 hour, and 59.0 g of methyl iodide was added. After stirring for 12 hours, water was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 5.9 g of 3- (4-methoxy-3-methyl-phenyl) -1,5-dimethyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000075
1 H-NMR (CDCl 3 ) δ: 7.56-7.55 (1H, m), 7.53-7.50 (1H, m), 6.82 (1H, d, J = 8.5 Hz) 6.24 (1H, d, J = 0.7 Hz), 3.84 (3H, s), 3.80 (3H, s), 2.29 (3H, s), 2.25 (3H, s) ).
参考合成例20
参考合成例16において、5−クロロ−3−(4−メトキシ−3−メチル−フェニル)−1,4−ジメチル−1H−ピラゾールの代わりに、参考合成例21に記載の3−(4−メトキシ−3−メチル−フェニル)−1,5−ジメチル−1H−ピラゾールを用いて、同様の反応を行い、2−メチル−4−(1,5−ジメチル−1H−ピラゾール−3−イル)−フェノールを得た。
Figure JPOXMLDOC01-appb-I000076
H−NMR(DMSO−D)δ:9.31(1H,br s),7.43(1H,d,J=1.7Hz),7.33(1H,dd,J=8.2,2.2Hz),6.75(1H,d,J=8.2Hz),6.29(1H,s),3.71(3H,s),2.24(3H,s),2.13(3H,s).
Reference Synthesis Example 20
In Reference Synthesis Example 16, 3- (4-methoxy) described in Reference Synthesis Example 21 was used instead of 5-chloro-3- (4-methoxy-3-methyl-phenyl) -1,4-dimethyl-1H-pyrazole. Similar reaction was performed using -3-methyl-phenyl) -1,5-dimethyl-1H-pyrazole, and 2-methyl-4- (1,5-dimethyl-1H-pyrazol-3-yl) -phenol Got.
Figure JPOXMLDOC01-appb-I000076
1 H-NMR (DMSO-D 6 ) δ: 9.31 (1H, br s), 7.43 (1H, d, J = 1.7 Hz), 7.33 (1H, dd, J = 8.2) 2.2 Hz), 6.75 (1 H, d, J = 8.2 Hz), 6.29 (1 H, s), 3.71 (3 H, s), 2.24 (3 H, s), 2. 13 (3H, s).
参考合成例21
室温下、参考合成例11に記載の1−(4−メトキシ−3−メチル−フェニル)−エタノン6.9g、およびテトラヒドロフラン200mlの混合物に、トリフルオロ酢酸エチルエステル11.9g、および20%−ナトリウムエトキシドエタノール溶液28.5gを加えた。加熱還流下6時間攪拌した後、反応混合物に、水100ml、および6N−塩酸水溶液を加え酸性にした。酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、4,4,4−トリフルオロ−1−(4−メトキシ−3−メチル−フェニル)−ブタン−1,3−ジオン10gを得た。
Figure JPOXMLDOC01-appb-I000077
H−NMR(CDCl:23℃)δ:7.84(1H,dd,J=8.7,2.4Hz),7.75(1H,dd,J=1.7,0.7Hz),6.90(1H,d,J=8.7Hz),6.51(1H,s),3.93(3H,s),2.27(3H,s).
Reference Synthesis Example 21
At room temperature, 1.9 g of 1- (4-methoxy-3-methyl-phenyl) -ethanone described in Reference Synthesis Example 11 and 200 ml of tetrahydrofuran were mixed with 11.9 g of trifluoroacetic acid ethyl ester and 20% -sodium. 28.5 g of ethoxide ethanol solution was added. After stirring for 6 hours under heating and refluxing, the reaction mixture was acidified by adding 100 ml of water and an aqueous 6N-hydrochloric acid solution. The mixture was extracted with ethyl acetate, and the organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 10 g of 4,4,4-trifluoro-1- (4-methoxy-3-methyl-phenyl) -butane-1,3-dione.
Figure JPOXMLDOC01-appb-I000077
1 H-NMR (CDCl 3 : 23 ° C.) δ: 7.84 (1H, dd, J = 8.7, 2.4 Hz), 7.75 (1H, dd, J = 1.7, 0.7 Hz) 6.90 (1H, d, J = 8.7 Hz), 6.51 (1H, s), 3.93 (3H, s), 2.27 (3H, s).
参考合成例22
0℃下、参考合成例21に記載の4,4,4−トリフルオロ−1−(4−メトキシ−3−メチル−フェニル)−ブタン−1,3−ジオン6.8g、およびエタノール100mlの混合物に、メチルヒドラジン1.7gを加え、室温まで昇温し、1時間攪拌した。混合物を減圧濃縮し、得られた残渣をシリカゲルカラムクロマトグラフィーに付し、5−(4−メトキシ−3−メチル−フェニル)−2−メチル−3−トリフルオロメチル−3,4−ジヒドロ−2H−ピラゾール−3−オール3.2gを得た。
Figure JPOXMLDOC01-appb-I000078
H−NMR(CDCl)δ:7.44−7.44(1H,m),7.33(1H,dd,J=8.5,2.4Hz),6.79(1H,d,J=8.5Hz),3.85(3H,s),3.50(1H,d,J=17.6Hz),3.24(1H,d,J=17.6Hz),3.06(3H,s),2.87(1H,s),2.22(3H,s).
Reference Synthesis Example 22
A mixture of 6.8 g of 4,4,4-trifluoro-1- (4-methoxy-3-methyl-phenyl) -butane-1,3-dione described in Reference Synthesis Example 21 and 100 ml of ethanol at 0 ° C. To the solution, 1.7 g of methyl hydrazine was added, and the mixture was warmed to room temperature and stirred for 1 hour. The mixture was concentrated under reduced pressure, and the resulting residue was subjected to silica gel column chromatography to give 5- (4-methoxy-3-methyl-phenyl) -2-methyl-3-trifluoromethyl-3,4-dihydro-2H. -3.2 g of pyrazol-3-ol was obtained.
Figure JPOXMLDOC01-appb-I000078
1 H-NMR (CDCl 3 ) δ: 7.44-7.44 (1H, m), 7.33 (1H, dd, J = 8.5, 2.4 Hz), 6.79 (1H, d, J = 8.5 Hz), 3.85 (3H, s), 3.50 (1 H, d, J = 17.6 Hz), 3.24 (1 H, d, J = 17.6 Hz), 3.06 ( 3H, s), 2.87 (1H, s), 2.22 (3H, s).
参考合成例23
参考合成例22に記載の5−(4−メトキシ−3−メチル−フェニル)−2−メチル−3−トリフルオロメチル−3,4−ジヒドロ−2H−ピラゾール−3−オール2.3g、6N−塩酸水溶液4ml、およびテトラヒドロフラン30mlの混合物を加熱還流下2時間攪拌した。酢酸エチルで抽出し、有機層を飽和炭酸ナトリウム水溶液、飽和塩化ナトリウム水溶液で洗浄し、有機層を無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、3−(4−メトキシ−3−メチル−フェニル)−1−メチル−5−トリフルオロメチル−1H−ピラゾール2.2gを得た。
Figure JPOXMLDOC01-appb-I000079
H−NMR(CDCl)δ:7.56−7.53(2H,m),6.85(1H,d,J=8.2Hz),6.81(1H,s),4.01(3H,s),3.86(3H,s),2.26(3H,s).
Reference Synthesis Example 23
5- (4-Methoxy-3-methyl-phenyl) -2-methyl-3-trifluoromethyl-3,4-dihydro-2H-pyrazol-3-ol 2.3 g described in Reference Synthesis Example 22, 6N- A mixture of 4 ml of hydrochloric acid aqueous solution and 30 ml of tetrahydrofuran was stirred for 2 hours while heating under reflux. The mixture was extracted with ethyl acetate, the organic layer was washed with a saturated aqueous sodium carbonate solution and a saturated aqueous sodium chloride solution, and the organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 2.2 g of 3- (4-methoxy-3-methyl-phenyl) -1-methyl-5-trifluoromethyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000079
1 H-NMR (CDCl 3 ) δ: 7.56-7.53 (2H, m), 6.85 (1H, d, J = 8.2 Hz), 6.81 (1H, s), 4.01 (3H, s), 3.86 (3H, s), 2.26 (3H, s).
参考合成例24
参考合成例23に記載の3−(4−メトキシ−3−メチル−フェニル)−1−メチル−5−トリフルオロメチル−1H−ピラゾール2.2g、47%臭化水素酸24ml、および酢酸24mlの混合物を加熱還流下、12時間攪拌した。溶媒を留去し、氷水70mlを加え、沈殿物をろ過し、氷水70mlで洗浄し、減圧乾燥し、2−メチル−4−(1−メチル−5−トリフルオロメチル−1H−ピラゾール−3−イル)−フェノール2gを得た。
Figure JPOXMLDOC01-appb-I000080
H−NMR(DMSO−D)δ:9.52(1H,s),7.57(1H,s),7.47(1H,d,J=8.2Hz),7.22(1H,s),6.80(1H,d,J=8.5Hz),3.96(3H,s),2.15(3H,s).
Reference Synthesis Example 24
Of 2.2 g of 3- (4-methoxy-3-methyl-phenyl) -1-methyl-5-trifluoromethyl-1H-pyrazole described in Reference Synthesis Example 23, 24 ml of 47% hydrobromic acid, and 24 ml of acetic acid The mixture was stirred for 12 hours under heating to reflux. The solvent was distilled off, 70 ml of ice water was added, the precipitate was filtered, washed with 70 ml of ice water, dried under reduced pressure, and 2-methyl-4- (1-methyl-5-trifluoromethyl-1H-pyrazole-3- Yl) -phenol 2 g was obtained.
Figure JPOXMLDOC01-appb-I000080
1 H-NMR (DMSO-D 6 ) δ: 9.52 (1H, s), 7.57 (1H, s), 7.47 (1H, d, J = 8.2 Hz), 7.22 (1H , S), 6.80 (1H, d, J = 8.5 Hz), 3.96 (3H, s), 2.15 (3H, s).
参考合成例25
 1−(4−ヒドロキシ−3−メチル−フェニル)−エタノン10g、イゾプロピルヨージド13.6g、炭酸カリウム18.4g、およびアセトン250mlの混合物を加熱還流下12時間攪拌した。反応混合物をろ過した後、ろ液を減圧濃縮し、得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(4−イソプロポキシ−3−メチル−フェニル)−エタノン9.5gを得た。
Figure JPOXMLDOC01-appb-I000081
H−NMR(CDCl)δ:7.80−7.78(2H,m),6.84(1H,d,J=8.2Hz),4.69−4.60(1H,m),2.54(3H,s),2.23(3H,s),1.37(6H,d,J=6.0Hz).
Reference Synthesis Example 25
A mixture of 10 g of 1- (4-hydroxy-3-methyl-phenyl) -ethanone, 13.6 g of izopropyl iodide, 18.4 g of potassium carbonate, and 250 ml of acetone was stirred with heating under reflux for 12 hours. After filtering the reaction mixture, the filtrate was concentrated under reduced pressure, and the resulting residue was subjected to silica gel column chromatography to obtain 9.5 g of 1- (4-isopropoxy-3-methyl-phenyl) -ethanone.
Figure JPOXMLDOC01-appb-I000081
1 H-NMR (CDCl 3 ) δ: 7.80-7.78 (2H, m), 6.84 (1H, d, J = 8.2 Hz), 4.69-4.60 (1H, m) , 2.54 (3H, s), 2.23 (3H, s), 1.37 (6H, d, J = 6.0 Hz).
参考合成例26
室温下、参考合成例25に記載の1−(4−イソプロポキシ−3−メチル−フェニル)−エタノン9.4g、およびテトラヒドロフラン150mlの混合物に、炭酸ジエチル11.6g、55%水素化ナトリウム4.5g、ジベンゾ−18−クラウン−6を0.04g、およびエタノール3mlを加え、加熱還流下9時間攪拌した。反応混合物に水を注加し、10%塩酸水溶液を加え酸性にし、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、3−(4−イソプロポキシ−3−メチル−フェニル)−3−オキソ−プロピオン酸エチルエステル12.1gを得た。
Figure JPOXMLDOC01-appb-I000082
H−NMR(CDCl)δ:7.79−7.76(2H,m),6.85−6.83(1H,m),4.68−4.62(1H,m),4.21(2H,q,J=7.2Hz),3.93(2H,s),2.22(3H,s),1.37(6H,d,J=6.0Hz),1.26(3H,t,J=7.1Hz).
Reference Synthesis Example 26
At room temperature, 11.6 g of diethyl carbonate and 55% sodium hydride were added to a mixture of 9.4 g of 1- (4-isopropoxy-3-methyl-phenyl) -ethanone described in Reference Synthesis Example 25 and 150 ml of tetrahydrofuran. 5 g, 0.04 g of dibenzo-18-crown-6, and 3 ml of ethanol were added, and the mixture was stirred for 9 hours with heating under reflux. Water was poured into the reaction mixture, acidified with 10% aqueous hydrochloric acid, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 12.1 g of 3- (4-isopropoxy-3-methyl-phenyl) -3-oxo-propionic acid ethyl ester.
Figure JPOXMLDOC01-appb-I000082
1 H-NMR (CDCl 3 ) δ: 7.79-7.76 (2H, m), 6.85-6.83 (1H, m), 4.68-4.62 (1H, m), 4 .21 (2H, q, J = 7.2 Hz), 3.93 (2H, s), 2.22 (3H, s), 1.37 (6H, d, J = 6.0 Hz), 1.26 (3H, t, J = 7.1 Hz).
参考合成例27
室温下、参考合成例26に記載の3−(4−イソプロポキシ−3−メチル−フェニル)−3−オキソ−プロピオン酸エチルエステル12.1g、およびトルエン100mlの混合物に、N−メチルヒドラジン21gを加え12時間攪拌した。トルエンを減圧留去した後、室温下、反応混合物に水100mlを注加し、10%塩酸水溶液を加え酸性にし、3時間攪拌した。沈殿物をろ過し、水400ml、酢酸エチル500mlで洗浄した後、減圧乾燥し、5−ヒドロキシ−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール9.5gを得た。
Figure JPOXMLDOC01-appb-I000083
H−NMR(DMSO−D)δ:7.58−7.54(2H,m),7.01−6.98(1H,m),5.95(1H,s),4.66−4.60(1H,m),3.62(3H,s),2.16(3H,s),1.28(6H,d,J=5.1Hz).
Reference Synthesis Example 27
At room temperature, 21 g of N-methylhydrazine was added to a mixture of 12.1 g of 3- (4-isopropoxy-3-methyl-phenyl) -3-oxo-propionic acid ethyl ester described in Reference Synthesis Example 26 and 100 ml of toluene. The mixture was stirred for 12 hours. After toluene was distilled off under reduced pressure, 100 ml of water was poured into the reaction mixture at room temperature, and the mixture was acidified with 10% aqueous hydrochloric acid and stirred for 3 hours. The precipitate was filtered, washed with 400 ml of water and 500 ml of ethyl acetate, dried under reduced pressure, and 9.5 g of 5-hydroxy-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole. Got.
Figure JPOXMLDOC01-appb-I000083
1 H-NMR (DMSO-D 6 ) δ: 7.58-7.54 (2H, m), 7.01-6.98 (1H, m), 5.95 (1H, s), 4.66 -4.60 (1H, m), 3.62 (3H, s), 2.16 (3H, s), 1.28 (6H, d, J = 5.1 Hz).
参考合成例28
0℃下、オキシ塩化リン150gに、N,N−ジメチルホルムアミド10.9gを加え0.5時間攪拌した後、参考合成例27に記載の5−ヒドロキシ−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール28gを加えた。100℃下で10時間攪拌した後、反応溶媒を減圧留去した。反応混合物に氷水を100ml加えて酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、5−クロロ−4−ホルミル−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール21gを得た。
Figure JPOXMLDOC01-appb-I000084
H−NMR(CDCl)δ:9.93(1H,s),7.52−7.50(2H,m),6.91−6.89(1H,m),4.63−4.54(1H,m),3.92(3H,s),2.25(3H,s),1.36(6H,d,J=6.0Hz).
Reference Synthesis Example 28
After adding 10.9 g of N, N-dimethylformamide to 150 g of phosphorus oxychloride at 0 ° C. and stirring for 0.5 hour, 5-hydroxy-3- (4-isopropoxy-3- 28 g of methyl-phenyl) -1-methyl-1H-pyrazole were added. After stirring at 100 ° C. for 10 hours, the reaction solvent was distilled off under reduced pressure. 100 ml of ice water was added to the reaction mixture and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 21 g of 5-chloro-4-formyl-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000084
1 H-NMR (CDCl 3 ) δ: 9.93 (1H, s), 7.52-7.50 (2H, m), 6.91-6.89 (1H, m), 4.63-4 .54 (1H, m), 3.92 (3H, s), 2.25 (3H, s), 1.36 (6H, d, J = 6.0 Hz).
参考合成例29
室温下、参考合成例28に記載の5−クロロ−4−ホルミル−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール4.8g、およびテトラヒドロフラン100mlの混合物に、メタノール0.6g、および55%水素化ナトリウム0.8gを加え、3時間攪拌した。反応混合物に、水を50ml加えた後、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、4−ホルミル−3−(4−イソプロポキシ−3−メチル−フェニル)−5−メトキシ−1−メチル−1H−ピラゾール4.5gを得た。
Figure JPOXMLDOC01-appb-I000085
H−NMR(CDCl)δ:9.75(1H,s),7.39(1H,d,J=1.9Hz),7.35(1H,dd,J=8.3,2.3Hz),6.90(1H,d,J=8.5Hz),4.63−4.54(1H,m),4.30(3H,s),3.71(3H,s),2.24(3H,s),1.36(6H,d,J=6.0Hz).
Reference Synthesis Example 29
At room temperature, to a mixture of 4.8 g of 5-chloro-4-formyl-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Synthesis Example 28 and 100 ml of tetrahydrofuran , 0.6 g of methanol, and 0.8 g of 55% sodium hydride were added and stirred for 3 hours. 50 ml of water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 4.5 g of 4-formyl-3- (4-isopropoxy-3-methyl-phenyl) -5-methoxy-1-methyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000085
1 H-NMR (CDCl 3 ) δ: 9.75 (1H, s), 7.39 (1H, d, J = 1.9 Hz), 7.35 (1H, dd, J = 8.3, 2. 3 Hz), 6.90 (1 H, d, J = 8.5 Hz), 4.63-4.54 (1 H, m), 4.30 (3 H, s), 3.71 (3 H, s), 2 .24 (3H, s), 1.36 (6H, d, J = 6.0 Hz).
参考合成例30
0℃下、参考合成例29に記載の4−ホルミル−3−(4−イソプロポキシ−3−メチル−フェニル)−5−メトキシ−1−メチル−1H−ピラゾール4.2g、およびトリフルオロ酢酸20mlの混合物に、トリエチルシラン4.2gを加えた。室温下、6時間攪拌した後、溶媒を減圧留去し、水10mlを加え、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1,4−ジメチル−3−(4−イソプロポキシ−3−メチル−フェニル)−5−メトキシ−1H−ピラゾール3.8gを得た。
Figure JPOXMLDOC01-appb-I000086
H−NMR(CDCl)δ:7.43(1H,dd,J=2.1,0.7Hz),7.37−7.34(1H,m),6.86(1H,d,J=8.5Hz),4.57−4.51(1H,m),3.93(3H,s),3.71(3H,s),2.24(3H,s),2.14(3H,s),1.35(6H,d,J=6.0Hz).
Reference Synthesis Example 30
At 0 ° C., 4.2 g of 4-formyl-3- (4-isopropoxy-3-methyl-phenyl) -5-methoxy-1-methyl-1H-pyrazole described in Reference Synthesis Example 29, and 20 ml of trifluoroacetic acid To this mixture, 4.2 g of triethylsilane was added. After stirring at room temperature for 6 hours, the solvent was distilled off under reduced pressure, 10 ml of water was added, the mixture was extracted with ethyl acetate, the organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 3.8 g of 1,4-dimethyl-3- (4-isopropoxy-3-methyl-phenyl) -5-methoxy-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000086
1 H-NMR (CDCl 3 ) δ: 7.43 (1H, dd, J = 2.1, 0.7 Hz), 7.37-7.34 (1H, m), 6.86 (1H, d, J = 8.5 Hz), 4.57-4.51 (1H, m), 3.93 (3H, s), 3.71 (3H, s), 2.24 (3H, s), 2.14 (3H, s), 1.35 (6H, d, J = 6.0 Hz).
参考合成例31
参考合成例30に記載の1,4−ジメチル−3−(4−イソプロポキシ−3−メチル−フェニル)−5−メトキシ−1H−ピラゾール7.4g、および30%硫酸水溶液100mlの混合物を加熱還流下15時間攪拌した。次に示した後処理を行った。
 0℃に冷却し、発生した沈殿物をろ過し、冷水で洗浄し固体を得た。
 再度ろ液を半分程度まで減圧濃縮し、0℃に冷却し、発生した沈殿物をろ過し、冷水で洗浄し固体を得た。
この後処理操作を4回行い、得られた全ての固体を減圧乾燥し、4−(1,4−ジメチル−5−メトキシ−1H−ピラゾール−3−イル)−2−メチル−フェノール6.4gを得た。
Figure JPOXMLDOC01-appb-I000087
H−NMR(DMSO−D)δ:9.33(1H,s),7.29(1H,s),7.20(1H,d,J=8.2Hz),6.79(1H,d,J=8.2Hz),3.87(3H,s),3.60(3H,s),2.14(3H,s),2.04(3H,s).
Reference Synthesis Example 31
A mixture of 7.4 g of 1,4-dimethyl-3- (4-isopropoxy-3-methyl-phenyl) -5-methoxy-1H-pyrazole described in Reference Synthesis Example 30 and 100 ml of 30% aqueous sulfuric acid solution was heated to reflux. Stir for 15 hours. The following post-processing was performed.
The resulting precipitate was filtered and washed with cold water to obtain a solid.
The filtrate was again concentrated under reduced pressure to about half, cooled to 0 ° C., and the generated precipitate was filtered and washed with cold water to obtain a solid.
This post-treatment operation was performed 4 times, and all the obtained solids were dried under reduced pressure to give 6.4 g of 4- (1,4-dimethyl-5-methoxy-1H-pyrazol-3-yl) -2-methyl-phenol. Got.
Figure JPOXMLDOC01-appb-I000087
1 H-NMR (DMSO-D 6 ) δ: 9.33 (1H, s), 7.29 (1H, s), 7.20 (1H, d, J = 8.2 Hz), 6.79 (1H , D, J = 8.2 Hz), 3.87 (3H, s), 3.60 (3H, s), 2.14 (3H, s), 2.04 (3H, s).
参考合成例32
0℃下、o−クレゾール10g、およびクロロホルム100mlの混合物に、プロピオニルクロリド10g、およびトリエチルアミン28gを加えた後、室温まで昇温し、2時間攪拌した。その後、クロロホルムで抽出し、有機層を水で洗浄し、無水マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、プロピオン酸−o−トルイルエステルを14g得た。
Figure JPOXMLDOC01-appb-I000088
H−NMR(CDCl)δ:7.24−7.18(2H,m),7.15−7.11(1H,m),7.01−6.99(1H,m),2.61(2H,q,J=7.6Hz),2.17(3H,s),1.29(3H,t,J=7.6Hz).
Reference Synthesis Example 32
At 0 ° C., 10 g of propionyl chloride and 28 g of triethylamine were added to a mixture of 10 g of o-cresol and 100 ml of chloroform, and then the mixture was warmed to room temperature and stirred for 2 hours. Thereafter, the mixture was extracted with chloroform, and the organic layer was washed with water, dried over anhydrous magnesium, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 14 g of propionic acid-o-toluyl ester.
Figure JPOXMLDOC01-appb-I000088
1 H-NMR (CDCl 3 ) δ: 7.24-7.18 (2H, m), 7.15-7.11 (1H, m), 7.01-6.99 (1H, m), 2 .61 (2H, q, J = 7.6 Hz), 2.17 (3H, s), 1.29 (3H, t, J = 7.6 Hz).
参考合成例33
0℃下、ニトロメタン150ml、および参考合成例32に記載のプロピオン酸−o−トルイルエステル14gの混合物に、三塩化アルミニウム30gを加え、その後、50℃まで昇温し、12時間攪拌した。混合物に、氷水200mlを注加し、酢酸エチルで抽出し、有機層を水で洗浄し、無水マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(4−ヒドロキシ−3−メチル−フェニル)−プロパン−1−オンを8.8g得た。
Figure JPOXMLDOC01-appb-I000089
H−NMR(CDCl)δ:7.80(1H,d,J=1.9Hz),7.75(1H,dd,J=8.5,2.2Hz),6.86(1H,d,J=8.5Hz),6.65(1H,s),2.96(2H,q,J=7.2Hz),2.30(3H,s),1.22(3H,td,J=7.3,1.3Hz).
Reference Synthesis Example 33
Under 0 ° C., 30 g of aluminum trichloride was added to a mixture of 150 ml of nitromethane and 14 g of propionic acid-o-toluyl ester described in Reference Synthesis Example 32, and then the temperature was raised to 50 ° C. and stirred for 12 hours. To the mixture, 200 ml of ice water was poured and extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 8.8 g of 1- (4-hydroxy-3-methyl-phenyl) -propan-1-one.
Figure JPOXMLDOC01-appb-I000089
1 H-NMR (CDCl 3 ) δ: 7.80 (1H, d, J = 1.9 Hz), 7.75 (1H, dd, J = 8.5, 2.2 Hz), 6.86 (1H, d, J = 8.5 Hz), 6.65 (1H, s), 2.96 (2H, q, J = 7.2 Hz), 2.30 (3H, s), 1.22 (3H, td, J = 7.3, 1.3 Hz).
参考合成例34
合成例1において、4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−2−メチル−フェノールの代わりに、参考合成例33に記載の1−(4−ヒドロキシ−3−メチル−フェニル)−プロパン−1−オンを用いて、同様の反応を行い、1−[2−(2−メチル−4−プロピオニル−フェノキシメチル)−3−メチル−フェニル]−4−メチル−1,4−ジヒドロ−テトラゾール−5−オンを得た。
Figure JPOXMLDOC01-appb-I000090
H−NMR(CDCl)δ:7.80(1H,d,J=8.47Hz),7.77−7.74(1H,m),7.47−7.39(2H,m),7.29(1H,d J=7.33Hz),6.86(1H,d,J=8.47Hz),5.11(2H,s),3.62(3H,s),2.94(2H,q,J=7.33Hz),2.50(3H,s),2.12(3H,s),1.20(3H,t,J=7.33Hz).
Reference Synthesis Example 34
In Synthesis Example 1, instead of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, 1- (4-hydroxy-) described in Reference Synthesis Example 33 was used. The same reaction is carried out using 3-methyl-phenyl) -propan-1-one and 1- [2- (2-methyl-4-propionyl-phenoxymethyl) -3-methyl-phenyl] -4-methyl. -1,4-Dihydro-tetrazol-5-one was obtained.
Figure JPOXMLDOC01-appb-I000090
1 H-NMR (CDCl 3 ) δ: 7.80 (1H, d, J = 8.47 Hz), 7.77-7.74 (1H, m), 7.47-7.39 (2H, m) 7.29 (1H, dJ = 7.33 Hz), 6.86 (1H, d, J = 8.47 Hz), 5.11 (2H, s), 3.62 (3H, s), 2. 94 (2H, q, J = 7.33 Hz), 2.50 (3H, s), 2.12 (3H, s), 1.20 (3H, t, J = 7.33 Hz).
参考合成例35
室温下、合成例34に記載の1−[2−(2−メチル−4−プロピオニル−フェノキシメチル)−3−メチル−フェニル]−4−メチル−1,4−ジヒドロ−テトラゾール−5−オン6.1g、しゅう酸ジエチル4.8g、およびN,N−ジメチルホルムアミド100mlの混合物に、カリウムtert−ブトキシド3.7gを加え、12時間攪拌した。水70mlを加えた後、10%塩酸水溶液を加え酸性にし、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下濃縮し、得られた残渣をシリカゲルクロマトグラフィーに付し、3−メチル−4−{3−メチル−4−[2−メチル−6−(4−メチル−5−オキソ−4,5−ジヒドロ−テトラゾール−1−イル)−ベンジロキシ]−フェニル}−2,4−ジオキソ−ブチル酸エチルエステル3.8gを得た。
Figure JPOXMLDOC01-appb-I000091
H−NMR(CDCl)δ:7.84(1H,dd,J=8.4,2.3Hz),7.77(1H,d,J=1.6Hz),7.48−7.41(2H,m),7.30(1H,dd,J=7.2,1.8Hz),6.92(1H,d,J=8.6Hz),5.13(2H,s),5.01(1H,q,J=7.1Hz),4.27(2H,q,J=7.2Hz),3.65(3H,s),2.51(3H,s),2.14(3H,s),1.44(3H,d,J=7.2Hz),1.30(3H,t,J=7.1Hz).
Reference Synthesis Example 35
1- [2- (2-Methyl-4-propionyl-phenoxymethyl) -3-methyl-phenyl] -4-methyl-1,4-dihydro-tetrazol-5-one 6 described in Synthesis Example 34 at room temperature To a mixture of 0.1 g, diethyl oxalate 4.8 g, and N, N-dimethylformamide 100 ml, potassium tert-butoxide 3.7 g was added and stirred for 12 hours. After adding 70 ml of water, the mixture was acidified with 10% aqueous hydrochloric acid, extracted with ethyl acetate, the organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. 3-methyl-4- {3-methyl-4- [2-methyl-6- (4-methyl-5-oxo-4,5-dihydro-tetrazol-1-yl) -benzyloxy]- Obtained 3.8 g of phenyl} -2,4-dioxo-butyric acid ethyl ester.
Figure JPOXMLDOC01-appb-I000091
1 H-NMR (CDCl 3 ) δ: 7.84 (1H, dd, J = 8.4, 2.3 Hz), 7.77 (1H, d, J = 1.6 Hz), 7.48-7. 41 (2H, m), 7.30 (1H, dd, J = 7.2, 1.8 Hz), 6.92 (1H, d, J = 8.6 Hz), 5.13 (2H, s), 5.01 (1H, q, J = 7.1 Hz), 4.27 (2H, q, J = 7.2 Hz), 3.65 (3H, s), 2.51 (3H, s), 2. 14 (3H, s), 1.44 (3H, d, J = 7.2 Hz), 1.30 (3H, t, J = 7.1 Hz).
参考合成例36
室温下、参考合成例35に記載の3−メチル−4−{3−メチル−4−[2−メチル−6−(4−メチル−5−オキソ−4,5−ジヒドロ−テトラゾール−1−イル)−ベンジロキシ]−フェニル}−2,4−ジオキソ−ブチル酸エチルエステル3.8g、およびテトラヒドロフラン70mlの混合物に、ヒドラジン−1水和物0.39gを加えた後、9時間攪拌した。溶媒を減圧留去し、水100mlを加え、0.5時間攪拌した。沈殿物をろ取し、水50ml、およびヘキサン50mlで洗浄し、減圧乾燥して1−{3−メチル−2−[2−メチル−4−(5−エトキシカルボニル−4−メチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン3.7gを得た。
Figure JPOXMLDOC01-appb-I000092
H−NMR(CDCl)δ:7.46−7.40(2H,m),7.33−7.31(2H,m),7.28(1H,dd,J=6.9,2.4Hz),6.93−6.90(1H,m),5.08(2H,s),4.41(2H,q,J=7.2Hz),3.64(3H,s),2.52(3H,s),2.41(3H,s),2.14(3H,s),1.42(3H,t,J=7.2Hz).
Reference Synthesis Example 36
3-Methyl-4- {3-methyl-4- [2-methyl-6- (4-methyl-5-oxo-4,5-dihydro-tetrazol-1-yl) described in Reference Synthesis Example 35 at room temperature ) -Benzyloxy] -phenyl} -2,4-dioxo-butyric acid ethyl ester (3.8 g) and tetrahydrofuran (70 ml) were added with hydrazine monohydrate (0.39 g), and the mixture was stirred for 9 hours. The solvent was distilled off under reduced pressure, 100 ml of water was added, and the mixture was stirred for 0.5 hour. The precipitate was collected by filtration, washed with 50 ml of water and 50 ml of hexane, and dried under reduced pressure to give 1- {3-methyl-2- [2-methyl-4- (5-ethoxycarbonyl-4-methyl-1H-pyrazole). There was obtained 3.7 g of -3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000092
1 H-NMR (CDCl 3 ) δ: 7.46-7.40 (2H, m), 7.33-7.31 (2H, m), 7.28 (1H, dd, J = 6.9, 2.4 Hz), 6.93-6.90 (1 H, m), 5.08 (2 H, s), 4.41 (2 H, q, J = 7.2 Hz), 3.64 (3 H, s) , 2.52 (3H, s), 2.41 (3H, s), 2.14 (3H, s), 1.42 (3H, t, J = 7.2 Hz).
合成例37
0℃下、参考合成例36に記載の1−{3−メチル−2−[2−メチル−4−(5−エトキシカルボニル−4−メチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン0.5g、およびN,N−ジメチルホルムアミド10mlの混合物に、55%−水素化ナトリウム0.056gを加え、1時間攪拌した後、ヨウ化メチル50.13mlを加えた。室温下、12時間攪拌下した後、水5mlを加えて、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−{3−メチル−2−[2−メチル−4−(5−エトキシカルボニル−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン0.19gを得た。
Figure JPOXMLDOC01-appb-I000093
H−NMR(CDCl)δ:7.45−7.40(2H,m),7.36−7.35(1H,m),7.32(1H,dd,J=8.3,1.9Hz),7.28(1H,dd,J=6.9,2.4Hz),6.90(1H,d,J=8.4Hz),5.07(2H,s),4.40(2H,q,J=7.1Hz),4.17(3H,s),3.64(3H,s),2.52(3H,s),2.36(3H,s),2.13(3H,s),1.42(3H,t,J=7.1Hz).
Synthesis Example 37
1- {3-Methyl-2- [2-methyl-4- (5-ethoxycarbonyl-4-methyl-1H-pyrazol-3-yl) -phenoxymethyl]-described in Reference Synthesis Example 36 at 0 ° C. Phenyl} -4-methyl-1,4-dihydrotetrazol-5-one (0.5 g) and N, N-dimethylformamide (10 ml) were added with 55% sodium hydride (0.056 g) and stirred for 1 hour. 50.13 ml of methyl iodide were added. After stirring at room temperature for 12 hours, 5 ml of water was added and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 1- {3-methyl-2- [2-methyl-4- (5-ethoxycarbonyl-1,4-dimethyl-1H-pyrazol-3-yl)- 0.19 g of phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one was obtained.
Figure JPOXMLDOC01-appb-I000093
1 H-NMR (CDCl 3 ) δ: 7.45-7.40 (2H, m), 7.36-7.35 (1H, m), 7.32 (1H, dd, J = 8.3) 1.9 Hz), 7.28 (1 H, dd, J = 6.9, 2.4 Hz), 6.90 (1 H, d, J = 8.4 Hz), 5.07 (2 H, s), 4. 40 (2H, q, J = 7.1 Hz), 4.17 (3H, s), 3.64 (3H, s), 2.52 (3H, s), 2.36 (3H, s), 2 .13 (3H, s), 1.42 (3H, t, J = 7.1 Hz).
参考合成例38
室温下、合成例37に記載の、1−{3−メチル−2−[2−メチル−4−(5−エトキシカルボニル−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン2.1g、テトラヒドロフラン30ml、メタノール10ml、および水5mlの混合物に、水酸化リチウム0.3gを加え、12時間攪拌した後、溶媒を減圧流去した。10%塩酸水溶液30mlを加え、沈殿物を濾取し、水、ヘキサンで洗浄した後、減圧乾燥し、2,4−ジメチル−5−{3−メチル−4−[2−メチル−6−(4−メチル−5−オキソ−4,5−ジヒドロ−テトラゾール−1−イル)−ベンジロキシ]−フェニル}−2H−ピラゾール−3−カルボン酸1.6gを得た。
Figure JPOXMLDOC01-appb-I000094
H−NMR(DMSO−D)δ:7.54−7.51(2H,m),7.39−7.36(1H,m),7.34−7.32(2H,m),7.03(1H,d,J=9.2Hz),5.05(2H,s),4.05(3H,s),3.55(3H,s),2.50(3H,s),2.31(3H,s),2.05(3H,s).
Reference synthesis example 38
1- {3-Methyl-2- [2-methyl-4- (5-ethoxycarbonyl-1,4-dimethyl-1H-pyrazol-3-yl) -phenoxymethyl] described in Synthesis Example 37 at room temperature To a mixture of -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one 2.1 g, tetrahydrofuran 30 ml, methanol 10 ml, and water 5 ml was added 0.3 g of lithium hydroxide and stirred for 12 hours. The solvent was removed under reduced pressure. 30 ml of 10% hydrochloric acid aqueous solution was added, the precipitate was collected by filtration, washed with water and hexane, dried under reduced pressure, and 2,4-dimethyl-5- {3-methyl-4- [2-methyl-6- ( 1.6 g of 4-methyl-5-oxo-4,5-dihydro-tetrazol-1-yl) -benzyloxy] -phenyl} -2H-pyrazole-3-carboxylic acid was obtained.
Figure JPOXMLDOC01-appb-I000094
1 H-NMR (DMSO-D 6 ) δ: 7.54-7.51 (2H, m), 7.39-7.36 (1H, m), 7.34-7.32 (2H, m) 7.03 (1H, d, J = 9.2 Hz), 5.05 (2H, s), 4.05 (3H, s), 3.55 (3H, s), 2.50 (3H, s) ), 2.31 (3H, s), 2.05 (3H, s).
参考合成例39
室温下、参考合成例38に記載の、2,4−ジメチル−5−{3−メチル−4−[2−メチル−6−(4−メチル−5−オキソ−4,5−ジヒドロ−テトラゾール−1−イル)−ベンジロキシ]−フェニル}−2H−ピラゾール−3−カルボン酸2.1g、およびテトラヒドロフラン25mlの混合物に、二塩化オキサリル0.89g、およびN,N−ジメチルホルムアミド0.1mlを加えた。3時間攪拌した後、溶媒を減圧留去し、2,4−ジメチル−5−{3−メチル−4−[2−メチル−6−(4−メチル−5−オキソ−4,5−ジヒドロ−テトラゾール−1−イル)−ベンジロキシ]−フェニル}−2H−ピラゾール−3−カルボニルクロライド2.1gを得た。
Figure JPOXMLDOC01-appb-I000095
H−NMR(CDCl)δ:7.46−7.41(2H,m),7.31−7.28(3H,m),6.92(1H,d,J=9.1Hz),5.08(2H,s),4.16(3H,s),3.64(3H,s),2.52(3H,s),2.48(3H,s),2.14(3H,s).
Reference Synthesis Example 39
2,4-Dimethyl-5- {3-methyl-4- [2-methyl-6- (4-methyl-5-oxo-4,5-dihydro-tetrazole-) described in Reference Synthesis Example 38 at room temperature To a mixture of 2.1 g of 1-yl) -benzyloxy] -phenyl} -2H-pyrazole-3-carboxylic acid and 25 ml of tetrahydrofuran was added 0.89 g of oxalyl dichloride and 0.1 ml of N, N-dimethylformamide. . After stirring for 3 hours, the solvent was distilled off under reduced pressure, and 2,4-dimethyl-5- {3-methyl-4- [2-methyl-6- (4-methyl-5-oxo-4,5-dihydro-) was obtained. 2.1 g of tetrazol-1-yl) -benzyloxy] -phenyl} -2H-pyrazole-3-carbonyl chloride were obtained.
Figure JPOXMLDOC01-appb-I000095
1 H-NMR (CDCl 3 ) δ: 7.46-7.41 (2H, m), 7.31-7.28 (3H, m), 6.92 (1H, d, J = 9.1 Hz) , 5.08 (2H, s), 4.16 (3H, s), 3.64 (3H, s), 2.52 (3H, s), 2.48 (3H, s), 2.14 ( 3H, s).
参考合成例40
参考合成例39に記載の2,4−ジメチル−5−{3−メチル−4−[2−メチル−6−(4−メチル−5−オキソ−4,5−ジヒドロ−テトラゾール−1−イル)−ベンジロキシ]−フェニル}−2H−ピラゾール−3−カルボニルクロライド2.1gをテトラヒドロフラン30mlに溶解した。室温下、上記テトラヒドロフラン溶液30mlを、28−30%アンモニア水溶液70mlに攪拌しながら滴下し、さらに2時間攪拌した。沈殿物を濾取し、水30mlおよびヘキサン30mlで洗浄し、減圧乾燥し、1−{3−メチル−2−[2−メチル−4−(5−アミノカルボニル−1,4−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オン2gを得た。
Figure JPOXMLDOC01-appb-I000096
H−NMR(CDCl)δ:7.45−7.40(2H,m),7.34−7.31(2H,m),7.30−7.27(1H,m),6.90(1H,d,J=8.4Hz),5.75(2H,br s),5.07(2H,s),4.13(3H,s),3.64(3H,s),2.52(3H,s),2.36(3H,s),2.13(3H,s).
Reference Synthesis Example 40
2,4-Dimethyl-5- {3-methyl-4- [2-methyl-6- (4-methyl-5-oxo-4,5-dihydro-tetrazol-1-yl) described in Reference Synthesis Example 39 -Benzyloxy] -phenyl} -2H-pyrazole-3-carbonyl chloride 2.1 g was dissolved in 30 ml of tetrahydrofuran. At room temperature, 30 ml of the above tetrahydrofuran solution was added dropwise to 70 ml of 28-30% aqueous ammonia solution with stirring, and the mixture was further stirred for 2 hours. The precipitate was collected by filtration, washed with 30 ml of water and 30 ml of hexane, dried under reduced pressure, and 1- {3-methyl-2- [2-methyl-4- (5-aminocarbonyl-1,4-dimethyl-1H- 2 g of pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one were obtained.
Figure JPOXMLDOC01-appb-I000096
1 H-NMR (CDCl 3 ) δ: 7.45-7.40 (2H, m), 7.34-7.31 (2H, m), 7.30-7.27 (1H, m), 6 .90 (1H, d, J = 8.4 Hz), 5.75 (2H, br s), 5.07 (2H, s), 4.13 (3H, s), 3.64 (3H, s) , 2.52 (3H, s), 2.36 (3H, s), 2.13 (3H, s).
参考合成例41
合成例1において、4−(5−クロロ−1,4−ジメチル−1H−ピラゾール−3−イル)−2−メチル−フェノールの代わりに、参考合成例20に記載の2−メチル−4−(1,5−ジメチル−1H−ピラゾール−3−イル)−フェノールを用いて、同様の反応を行い、1−{3−メチル−2−[2−メチル−4−(1,5−ジメチル−1H−ピラゾール−3−イル)−フェノキシメチル]−フェニル}−4−メチル−1,4−ジヒドロテトラゾール−5−オンを得た。
Figure JPOXMLDOC01-appb-I000097
H−NMR(CDCl)δ:7.54−7.52(1H,m),7.48(1H,dd,J=8.3,2.3Hz),7.44−7.38(2H,m),7.30−7.26(1H,m),6.84(1H,d,J=8.5Hz),6.23(1H,s),5.05(2H,s),3.80(3H,s),3.61(3H,s),2.51(3H,s),2.29(3H,s),2.11(3H,s).
Reference Synthesis Example 41
In Synthesis Example 1, instead of 4- (5-chloro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol, 2-methyl-4- ( 1,5-Dimethyl-1H-pyrazol-3-yl) -phenol is used to carry out a similar reaction to give 1- {3-methyl-2- [2-methyl-4- (1,5-dimethyl-1H) -Pyrazol-3-yl) -phenoxymethyl] -phenyl} -4-methyl-1,4-dihydrotetrazol-5-one was obtained.
Figure JPOXMLDOC01-appb-I000097
1 H-NMR (CDCl 3 ) δ: 7.54-7.52 (1H, m), 7.48 (1H, dd, J = 8.3, 2.3 Hz), 7.44-7.38 ( 2H, m), 7.30-7.26 (1H, m), 6.84 (1H, d, J = 8.5 Hz), 6.23 (1H, s), 5.05 (2H, s) , 3.80 (3H, s), 3.61 (3H, s), 2.51 (3H, s), 2.29 (3H, s), 2.11 (3H, s).
参考合成例42
1−ブロモ−2−メチル−3−アミノベンゼン25.0g、トリホスゲン60.0gおよびトルエン400mlの混合物を加熱還流下3時間攪拌した。放冷した反応混合物を減圧下濃縮し、1−ブロモ−3−イソシアナート−2−メチルベンゼン30.3gを得た。
Figure JPOXMLDOC01-appb-I000098
H−NMR(CDCl)δ:2.42(3H,s),7.00(1H,dt,J=0.5,8.0Hz),7.05(1H,dd,J=1.7,8.0Hz),7.39(1H,dd,1.5,7.7Hz).
Reference synthesis example 42
A mixture of 25.0 g of 1-bromo-2-methyl-3-aminobenzene, 60.0 g of triphosgene and 400 ml of toluene was stirred with heating under reflux for 3 hours. The reaction mixture allowed to cool was concentrated under reduced pressure to obtain 30.3 g of 1-bromo-3-isocyanato-2-methylbenzene.
Figure JPOXMLDOC01-appb-I000098
1 H-NMR (CDCl 3 ) δ: 2.42 (3H, s), 7.00 (1H, dt, J = 0.5, 8.0 Hz), 7.05 (1H, dd, J = 1. 7, 8.0 Hz), 7.39 (1H, dd, 1.5, 7.7 Hz).
参考合成例43
1−(2−ブロモメチル−3−メトキシフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オンを以下工程(1)~(4)により製造した。
<工程(1)>
3−アミノ−1−メトキシ−2−メチルベンゼン15.0g、トリホスゲン48.7gおよびトルエン350mlの混合物を加熱還流下3時間攪拌した。放冷した反応混合物を減圧下濃縮し、1−メトキシ−3−イソシアナート−2−メチルベンゼン17.0gを得た。
Figure JPOXMLDOC01-appb-I000099
H−NMR(CDCl)δ:2.19(3H,s),3.82(3H,s),6.69(1H,d,J=8.2Hz),6.72(1H,dd,J=0.5,8.0Hz),7.09(1H,t,J=8.2Hz).
Reference synthesis example 43
1- (2-Bromomethyl-3-methoxyphenyl) -4-methyl-1,4-dihydrotetrazol-5-one was prepared by the following steps (1) to (4).
<Step (1)>
A mixture of 15.0 g of 3-amino-1-methoxy-2-methylbenzene, 48.7 g of triphosgene and 350 ml of toluene was stirred with heating under reflux for 3 hours. The reaction mixture allowed to cool was concentrated under reduced pressure to obtain 17.0 g of 1-methoxy-3-isocyanato-2-methylbenzene.
Figure JPOXMLDOC01-appb-I000099
1 H-NMR (CDCl 3 ) δ: 2.19 (3H, s), 3.82 (3H, s), 6.69 (1H, d, J = 8.2 Hz), 6.72 (1H, dd , J = 0.5, 8.0 Hz), 7.09 (1H, t, J = 8.2 Hz).
<工程(2)>
無水三塩化アルミニウム16.0gを、氷冷下、N,N−ジメチルホルムアミド180mLに加え、15分攪拌した。ここにアジ化ナトリウム7.8gを加え、15分攪拌した後、1−メトキシ−3−イソシアナート−2−メチルベンゼン17.0gを加え、80℃で4.5時間加熱した。冷却後、反応液を亜硝酸ナトリウム25g、水2Lおよび氷500gの混合物中に攪拌しながら加えた。混合物を10%塩酸で酸性とした後、酢酸エチルで抽出した。有機層を水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮し、1−(2−メチル−3−メトキシフェニル)−1,4−ジヒドロテトラゾール−5−オン16.2gを得た。
Figure JPOXMLDOC01-appb-I000100
H−NMR(DMSO−D)δ:1.99(3H,s),3.87(3H,s),7.01(1H,d,J=8.1Hz),7.17(1H,d,J=8.1Hz).7.36(1H,t,J=8.3Hz),14.63(1H,s).
<Step (2)>
16.0 g of anhydrous aluminum trichloride was added to 180 mL of N, N-dimethylformamide under ice cooling, and the mixture was stirred for 15 minutes. Sodium azide 7.8g was added here, and after stirring for 15 minutes, 17.0 g of 1-methoxy-3-isocyanato-2-methylbenzene was added, and it heated at 80 degreeC for 4.5 hours. After cooling, the reaction solution was added to a mixture of 25 g of sodium nitrite, 2 L of water and 500 g of ice with stirring. The mixture was acidified with 10% hydrochloric acid and extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, concentrated under reduced pressure, and 1- (2-methyl-3-methoxyphenyl) -1,4-dihydrotetrazol-5-one 16 0.2 g was obtained.
Figure JPOXMLDOC01-appb-I000100
1 H-NMR (DMSO-D 6 ) δ: 1.99 (3H, s), 3.87 (3H, s), 7.01 (1H, d, J = 8.1 Hz), 7.17 (1H , D, J = 8.1 Hz). 7.36 (1H, t, J = 8.3 Hz), 14.63 (1H, s).
<工程(3)>
1−(2−メチル−3−メトキシフェニル)−1,4−ジヒドロテトラゾール−3−オン10.00gおよびN,N−ジメチルホルムアミド100mlの混合物に、氷冷下、55%水素化ナトリウム2.47gを加えた。混合物を室温に昇温し、1時間攪拌した。反応混合物に氷冷下、ヨウ化メチル3.5mlを加えた。混合物を室温に昇温し、14時間攪拌した。反応混合物に水を注加し、酢酸エチルで抽出した。有機層を10%塩酸、水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−メチル−3−メトキシフェニル)−4−メチル−1,4−ジヒドロテトラゾール−3−オン2.19gを得た。
Figure JPOXMLDOC01-appb-I000101
H−NMR(CDCl)δ:2.11(3H,s),3,72(3H,s),3.88(3H,s),6.95(1H,d,J=8.2Hz),6.98(1H,d,J=8.5Hz),7.29(1H,t,J=8.2Hz)
<Step (3)>
To a mixture of 10.00 g of 1- (2-methyl-3-methoxyphenyl) -1,4-dihydrotetrazol-3-one and 100 ml of N, N-dimethylformamide was added 2.47 g of 55% sodium hydride under ice cooling. Was added. The mixture was warmed to room temperature and stirred for 1 hour. To the reaction mixture, 3.5 ml of methyl iodide was added under ice cooling. The mixture was warmed to room temperature and stirred for 14 hours. Water was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with 10% hydrochloric acid, water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 2.19 g of 1- (2-methyl-3-methoxyphenyl) -4-methyl-1,4-dihydrotetrazol-3-one.
Figure JPOXMLDOC01-appb-I000101
1 H-NMR (CDCl 3 ) δ: 2.11 (3H, s), 3, 72 (3H, s), 3.88 (3H, s), 6.95 (1H, d, J = 8.2 Hz) ), 6.98 (1H, d, J = 8.5 Hz), 7.29 (1H, t, J = 8.2 Hz)
<工程(4)>
1−(2−メチル−3−メトキシフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン2.19g、1,1’−アゾビス(シクロヘキサン−1−カルボニトリル)0.52g、N−ブロモスクシンイミド2.16gおよびクロロベンゼン40mLの混合物を加熱還流下5時間攪拌した。冷却後、反応液に水を注加し、酢酸エチルで抽出した。有機層を水および飽和食塩水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧下に濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、1−(2−ブロモメチル−3−メトキシフェニル)−4−メチル−1,4−ジヒドロテトラゾール−5−オン2.36gを得た。
Figure JPOXMLDOC01-appb-I000102
H−NMR(CDCl)δ:3.74(3H,s),3.96(3H,s),4.93(2H,s),7.02(1H,dd,J=1.0,8.5Hz),7.04(1H,d,J=9.0Hz),7.43(1H,t,J=8.1Hz).
<Process (4)>
1- (2-Methyl-3-methoxyphenyl) -4-methyl-1,4-dihydrotetrazol-5-one 2.19 g, 1,1′-azobis (cyclohexane-1-carbonitrile) 0.52 g, N -A mixture of 2.16 g of bromosuccinimide and 40 mL of chlorobenzene was stirred with heating under reflux for 5 hours. After cooling, water was poured into the reaction solution and extracted with ethyl acetate. The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 2.36 g of 1- (2-bromomethyl-3-methoxyphenyl) -4-methyl-1,4-dihydrotetrazol-5-one.
Figure JPOXMLDOC01-appb-I000102
1 H-NMR (CDCl 3 ) δ: 3.74 (3H, s), 3.96 (3H, s), 4.93 (2H, s), 7.02 (1H, dd, J = 1.0) , 8.5 Hz), 7.04 (1H, d, J = 9.0 Hz), 7.43 (1H, t, J = 8.1 Hz).
参考合成例44
室温下、参考合成例19に記載の3−(4−メトキシ−3−メチル−フェニル)−1,5−ジメチル−1H−ピラゾール5.9g、N−ブロモスクシンイミド5.8g、およびクロロホルム100mlの混合物を17時間攪拌した後、水を注加し、クロロホルムで抽出した。有機層を水で洗浄し、無水マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、3−(4−メトキシ−3−メチル−フェニル)−4−ブロモ−1,5−ジメチル−1H−ピラゾール4.0gを得た。
Figure JPOXMLDOC01-appb-I000103
H−NMR(CDCl)δ:7.67(1H,dd,J=8.5,2.2Hz),7.62(1H,d,J=1.9Hz),6.87(1H,d,J=8.5Hz),3.86(3H,s),3.84(3H,s),2.31(3H,s),2.26(3H,s).
Reference Synthesis Example 44
A mixture of 5.9 g of 3- (4-methoxy-3-methyl-phenyl) -1,5-dimethyl-1H-pyrazole described in Reference Synthesis Example 19 at room temperature, 5.8 g of N-bromosuccinimide, and 100 ml of chloroform. After stirring for 17 hours, water was added and the mixture was extracted with chloroform. The organic layer was washed with water, dried over anhydrous magnesium, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 4.0 g of 3- (4-methoxy-3-methyl-phenyl) -4-bromo-1,5-dimethyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000103
1 H-NMR (CDCl 3 ) δ: 7.67 (1H, dd, J = 8.5, 2.2 Hz), 7.62 (1H, d, J = 1.9 Hz), 6.87 (1H, d, J = 8.5 Hz), 3.86 (3H, s), 3.84 (3H, s), 2.31 (3H, s), 2.26 (3H, s).
参考合成例45
参考合成例44に記載の3−(4−メトキシ−3−メチル−フェニル)−4−ブロモ−1,5−ジメチル−1H−ピラゾール1.3g、1,4−ジオキサン30ml、水5ml、メチルボロン酸1.0g、[1,1’−ビス(ジフェニルホスフィノ)フェロセン]パラジウム(II)ジクロリド ジクロロメタン付加物0.4g、およびりん酸カリウム(III)3.7gの混合物を加熱還流下9時間攪拌した。反応混合物を酢酸エチルで抽出し、有機層を水で洗浄し、無水マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、3−(4−メトキシ−3−メチル−フェニル)−1,4,5−トリメチル−1H−ピラゾール0.6gを得た。
Figure JPOXMLDOC01-appb-I000104
H−NMR(CDCl)δ:7.43(1H,s),7.40(1H,dd,J=8.2,2.2Hz),6.86(1H,d,J=8.5Hz),3.85(3H,s),3.80(3H,s),2.25(3H,s),2.21(3H,s),2.11(3H,s).
Reference Synthesis Example 45
3- (4-Methoxy-3-methyl-phenyl) -4-bromo-1,5-dimethyl-1H-pyrazole 1.3 g described in Reference Synthesis Example 44, 1,4-dioxane 30 ml, water 5 ml, methylboronic acid A mixture of 1.0 g, [1,1′-bis (diphenylphosphino) ferrocene] palladium (II) dichloride dichloromethane adduct 0.4 g and potassium (III) phosphate 3.7 g was stirred with heating under reflux for 9 hours. . The reaction mixture was extracted with ethyl acetate, and the organic layer was washed with water, dried over anhydrous magnesium, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 0.6 g of 3- (4-methoxy-3-methyl-phenyl) -1,4,5-trimethyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000104
1 H-NMR (CDCl 3 ) δ: 7.43 (1H, s), 7.40 (1H, dd, J = 8.2, 2.2 Hz), 6.86 (1H, d, J = 8. 5 Hz), 3.85 (3H, s), 3.80 (3H, s), 2.25 (3H, s), 2.21 (3H, s), 2.11 (3H, s).
参考合成例46
参考合成例45に記載の3−(4−メトキシ−3−メチル−フェニル)−1,4,5−トリメチル−1H−ピラゾール0.6g、47%臭化水素酸5ml、および酢酸5mlの混合物を加熱還流下、13時間攪拌した。溶媒を留去し、残査に酢酸エチルを30ml加え、室温下1時間攪拌した。沈殿物を濾過し、ヘキサンで洗浄後、減圧下乾燥し、4−(1,4,5−トリメチル−1H−ピラゾール−3−イル)−2−メチル−フェノール0.5gを得た。
Figure JPOXMLDOC01-appb-I000105
H−NMR(DMSO−D)δ:7.33(1H,d,J=2.2Hz),7.26(1H,dd,J=8.2,2.2Hz),6.88(1H,d,J=8.2Hz),3.82(3H,s),2.26(3H,s),2.17(3H,s),2.08(3H,s).
Reference Synthesis Example 46
A mixture of 0.6 g of 3- (4-methoxy-3-methyl-phenyl) -1,4,5-trimethyl-1H-pyrazole described in Reference Synthesis Example 45, 5 ml of 47% hydrobromic acid, and 5 ml of acetic acid was used. The mixture was stirred for 13 hours under reflux. The solvent was distilled off, 30 ml of ethyl acetate was added to the residue, and the mixture was stirred at room temperature for 1 hour. The precipitate was filtered, washed with hexane, and then dried under reduced pressure to obtain 0.5 g of 4- (1,4,5-trimethyl-1H-pyrazol-3-yl) -2-methyl-phenol.
Figure JPOXMLDOC01-appb-I000105
1 H-NMR (DMSO-D 6 ) δ: 7.33 (1H, d, J = 2.2 Hz), 7.26 (1H, dd, J = 8.2, 2.2 Hz), 6.88 ( 1H, d, J = 8.2 Hz), 3.82 (3H, s), 2.26 (3H, s), 2.17 (3H, s), 2.08 (3H, s).
参考合成例47
参考合成例28に記載の5−クロロ−4−ホルミル−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール2.0g、フッ化カリウム2.0g、スルホラン11ml、およびトルエン30mlの混合物を170℃に加熱し、トルエンを留去後、220℃で4時間攪拌した。反応混合物に水を注加し、酢酸エチルで抽出後、有機層を無水硫酸マグネシウムで乾燥し、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、5−フルオロ−4−ホルミル−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール1.0gを得た。
Figure JPOXMLDOC01-appb-I000106
H−NMR(CDCl)δ:9.85(1H,s),7.52−7.50(2H,m),6.91−6.89(1H,m),4.60−4.58(1H,m),3.81(3H,s),2.25(3H,s),1.37(6H,d,J=6.0Hz).
Reference Synthesis Example 47
5-chloro-4-formyl-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole 2.0 g described in Reference Synthesis Example 28, potassium fluoride 2.0 g, sulfolane 11 ml , And 30 ml of toluene were heated to 170 ° C., and toluene was distilled off, followed by stirring at 220 ° C. for 4 hours. Water was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over anhydrous magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 1.0 g of 5-fluoro-4-formyl-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000106
1 H-NMR (CDCl 3 ) δ: 9.85 (1H, s), 7.52-7.50 (2H, m), 6.91-6.89 (1H, m), 4.60-4 .58 (1H, m), 3.81 (3H, s), 2.25 (3H, s), 1.37 (6H, d, J = 6.0 Hz).
参考合成例48
0℃下、参考合成例47に記載の5−フルオロ−4−ホルミル−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール1.0g、およびトリフルオロ酢酸18mlの混合物に、トリエチルシラン1.4mlを加えた。室温下、15時間攪拌した後、水5mlを加え、酢酸エチルで抽出し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、5−フルオロ−3−(4−イソプロポキシ−3−メチル−フェニル)−1,4−ジメチル−1H−ピラゾール0.75gを得た。
Figure JPOXMLDOC01-appb-I000107
H−NMR(CDCl)δ:7.43(1H,s),7.37(1H,dd,J=8.4,1.8Hz),6.87(1H,d,J=8.6Hz),4.58−4.52(1H,m),3.74(3H,s),2.24(3H,s),2.09(3H,s),1.35(6H,d,J=6.1Hz).
Reference synthesis example 48
Under 0 ° C., 1.0 g of 5-fluoro-4-formyl-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Synthesis Example 47 and 18 ml of trifluoroacetic acid To the mixture, 1.4 ml of triethylsilane was added. After stirring at room temperature for 15 hours, 5 ml of water was added, extracted with ethyl acetate, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 0.75 g of 5-fluoro-3- (4-isopropoxy-3-methyl-phenyl) -1,4-dimethyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000107
1 H-NMR (CDCl 3 ) δ: 7.43 (1H, s), 7.37 (1H, dd, J = 8.4, 1.8 Hz), 6.87 (1H, d, J = 8. 6Hz), 4.58-4.52 (1H, m), 3.74 (3H, s), 2.24 (3H, s), 2.09 (3H, s), 1.35 (6H, d) , J = 6.1 Hz).
参考合成例49
参考合成例48に記載の5−フルオロ−3−(4−イソプロポキシ−3−メチル−フェニル)−1,4−ジメチル−1H−ピラゾール0.75g、および20%硫酸水溶液6mlの混合物を加熱還流下で5時間攪拌した後、室温下12時間攪拌した。反応混合物に水を加えた後、炭酸ナトリウム水溶液で中和し、溶媒を留去した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、4−(5−フルオロ−1,4−ジメチル−1H−ピラゾール−3−イル)−2−メチル−フェノール0.54gを得た。
Figure JPOXMLDOC01-appb-I000108
H−NMR(CDCl)δ:7.42(1H,s),7.32(1H,dd,J=8.2,2.3Hz),6.80(1H,d,J=8.2Hz),4.99(1H,s),3.75(3H,s),2.28(3H,s),2.09(3H,s).
Reference Synthesis Example 49
A mixture of 0.75 g of 5-fluoro-3- (4-isopropoxy-3-methyl-phenyl) -1,4-dimethyl-1H-pyrazole described in Reference Synthesis Example 48 and 6 ml of 20% aqueous sulfuric acid was heated to reflux. The mixture was stirred at room temperature for 5 hours and then at room temperature for 12 hours. Water was added to the reaction mixture, neutralized with an aqueous sodium carbonate solution, and the solvent was distilled off. The obtained residue was subjected to silica gel column chromatography to obtain 0.54 g of 4- (5-fluoro-1,4-dimethyl-1H-pyrazol-3-yl) -2-methyl-phenol.
Figure JPOXMLDOC01-appb-I000108
1 H-NMR (CDCl 3 ) δ: 7.42 (1H, s), 7.32 (1H, dd, J = 8.2, 2.3 Hz), 6.80 (1H, d, J = 8. 2 Hz), 4.99 (1H, s), 3.75 (3H, s), 2.28 (3H, s), 2.09 (3H, s).
参考製造例50
参考合成例11に記載の1−(4−メトキシ−3−メチル−フェニル)−エタノン5.76g、及びN,N−ジメチルホルムアミドジエチルアセタール7.46mlの混合物を加熱還流下、24時間攪拌した。減圧下濃縮し、3−ジメチルアミノ−1−(4−メトキシ−3−メチル−フェニル)−プロペノン4.78gを得た。
Figure JPOXMLDOC01-appb-I000109
H−NMR(DMSO−D)δ:7.76(1H,dd,J=8.5,2.2Hz),7.72(1H,s),7.64(1H,d,J=12.4Hz),6.95(1H,d,J=8.5Hz),5.80(1H,d,J=12.4Hz),3.83(3H,s),3.11(3H,br s),2.90(3H,br s),2.18(3H,s).
Reference production example 50
A mixture of 5.76 g of 1- (4-methoxy-3-methyl-phenyl) -ethanone described in Reference Synthesis Example 11 and 7.46 ml of N, N-dimethylformamide diethyl acetal was stirred with heating under reflux for 24 hours. Concentration under reduced pressure gave 4.78 g of 3-dimethylamino-1- (4-methoxy-3-methyl-phenyl) -propenone.
Figure JPOXMLDOC01-appb-I000109
1 H-NMR (DMSO-D 6 ) δ: 7.76 (1H, dd, J = 8.5, 2.2 Hz), 7.72 (1H, s), 7.64 (1H, d, J = 12.4 Hz), 6.95 (1H, d, J = 8.5 Hz), 5.80 (1H, d, J = 12.4 Hz), 3.83 (3H, s), 3.11 (3H, br s), 2.90 (3H, br s), 2.18 (3H, s).
参考製造例51
参考製造例50において、1−(4−メトキシ−3−メチル−フェニル)−エタノンの代わりに、1−(3−クロロ−4−メトキシ−フェニル)−エタノンを用いて、同様の反応を行い、3−ジメチルアミノ−1−(3−クロロ−4−メトキシ−フェニル)−プロペノンを得た。
Figure JPOXMLDOC01-appb-I000110
H−NMR(CDCl)δ:7.95(1H,d,J=2.2Hz),7.84(1H,dd,J=8.7,2.2Hz),7.80(1H,d,J=12.3Hz),6.94(1H,d,J=8.7Hz),5.65(1H,d,J=12.3Hz),3.95(3H,s),3.14(3H,s),2.95(3H,s).
Reference Production Example 51
In Reference Production Example 50, the same reaction was performed using 1- (3-chloro-4-methoxy-phenyl) -ethanone instead of 1- (4-methoxy-3-methyl-phenyl) -ethanone. 3-Dimethylamino-1- (3-chloro-4-methoxy-phenyl) -propenone was obtained.
Figure JPOXMLDOC01-appb-I000110
1 H-NMR (CDCl 3 ) δ: 7.95 (1H, d, J = 2.2 Hz), 7.84 (1H, dd, J = 8.7, 2.2 Hz), 7.80 (1H, d, J = 12.3 Hz), 6.94 (1H, d, J = 8.7 Hz), 5.65 (1H, d, J = 12.3 Hz), 3.95 (3H, s), 3. 14 (3H, s), 2.95 (3H, s).
参考製造例52
参考製造例18において、1−(4−メトキシ−3−メチル−フェニル)−ブタン−1,3−ジオンの代わりに、参考製造例51に記載の3−ジメチルアミノ−1−(3−クロロ−4−メトキシ−フェニル)−プロペノンを用いて、同様の反応を行い、3−(3−クロロ−4−メトキシ−フェニル)−1H−ピラゾールを得た。
Figure JPOXMLDOC01-appb-I000111
H−NMR(CDCl)δ:7.78(1H,d,J=1.9Hz),7.61−7.59(2H,m),6.92(1H,d,J=8.7Hz),6.54(1H,dd,J=2.2,0.7Hz),3.92(3H,s).
Reference Production Example 52
In Reference Production Example 18, instead of 1- (4-methoxy-3-methyl-phenyl) -butane-1,3-dione, 3-dimethylamino-1- (3-chloro- The same reaction was performed using 4-methoxy-phenyl) -propenone to give 3- (3-chloro-4-methoxy-phenyl) -1H-pyrazole.
Figure JPOXMLDOC01-appb-I000111
1 H-NMR (CDCl 3 ) δ: 7.78 (1H, d, J = 1.9 Hz), 7.61-7.59 (2H, m), 6.92 (1H, d, J = 8. 7 Hz), 6.54 (1 H, dd, J = 2.2, 0.7 Hz), 3.92 (3 H, s).
参考製造例53
参考製造例19において、3−(4−メトキシ−3−メチル−フェニル)−5−メチル−1H−ピラゾールの代わりに、参考製造例52に記載の3−(3−クロロ−4−メトキシ−フェニル)−1H−ピラゾールを用い、同様の反応を行い、3−(3−クロロ−4−メトキシ−フェニル)−1−メチル−1H−ピラゾールを得た。
Figure JPOXMLDOC01-appb-I000112
H−NMR(CDCl)δ:7.81(1H,d,J=2.2Hz),7.64(1H,dd,J=8.6,2.1Hz),7.36(1H,d,J=2.2Hz),6.95(1H,d,J=8.5Hz),6.45(1H,d,J=2.2Hz),3.94(3H,s),3.93(3H,s)
Reference Production Example 53
In Reference Production Example 19, instead of 3- (4-methoxy-3-methyl-phenyl) -5-methyl-1H-pyrazole, 3- (3-chloro-4-methoxy-phenyl described in Reference Production Example 52 was used. ) -1H-pyrazole was used to carry out the same reaction to obtain 3- (3-chloro-4-methoxy-phenyl) -1-methyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000112
1 H-NMR (CDCl 3 ) δ: 7.81 (1H, d, J = 2.2 Hz), 7.64 (1H, dd, J = 8.6, 2.1 Hz), 7.36 (1H, d, J = 2.2 Hz), 6.95 (1H, d, J = 8.5 Hz), 6.45 (1H, d, J = 2.2 Hz), 3.94 (3H, s), 3. 93 (3H, s)
参考製造例54
参考製造例44において、3−(4−メトキシ−3−メチル−フェニル)−1,5−ジメチル−1H−ピラゾールの代わりに、参考製造例53に記載の3−(3−クロロ−4−メトキシ−フェニル)−1−メチル−1H−ピラゾールを用いて、同様の反応を行い、3−(4−メトキシ−3−クロロ−フェニル)−4−ブロモ−1−メチル−1H−ピラゾールを得た。
Figure JPOXMLDOC01-appb-I000113
H−NMR(CDCl)δ:7.92−7.91(1H,m),7.79−7.76(1H,m),7.44(1H,s),6.98(1H,d,J=8.5Hz),3.94(3H,s),3.92(3H,s).
Reference production example 54
In Reference Preparation Example 44, instead of 3- (4-methoxy-3-methyl-phenyl) -1,5-dimethyl-1H-pyrazole, 3- (3-chloro-4-methoxy described in Reference Preparation Example 53 was used. -Phenyl) -1-methyl-1H-pyrazole was used for the same reaction to obtain 3- (4-methoxy-3-chloro-phenyl) -4-bromo-1-methyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000113
1 H-NMR (CDCl 3 ) δ: 7.92-7.91 (1H, m), 7.79-7.76 (1H, m), 7.44 (1H, s), 6.98 (1H , D, J = 8.5 Hz), 3.94 (3H, s), 3.92 (3H, s).
参考製造例55
参考製造例45において、3−(4−メトキシ−3−メチル−フェニル)−4−ブロモ−1,5−ジメチル−1H−ピラゾールの代わりに、参考製造例54に記載の3−(4−メトキシ−3−クロロ−フェニル)−4−ブロモ−1−メチル−1H−ピラゾールを用いて同様の反応を行い、3−(4−メトキシ−3−クロロ−フェニル)−1,4−ジメチル−1H−ピラゾールを得た。
Figure JPOXMLDOC01-appb-I000114
H−NMR(CDCl)δ:7.70(1H,d,J=2.2Hz),7.53(1H,dd,J=8.5,2.2Hz),7.18(1H,s),6.97(1H,d,J=8.5Hz),3.93(3H,s),3.88(3H,s),2.20(3H,s).
Reference Production Example 55
In Reference Production Example 45, 3- (4-methoxy) described in Reference Production Example 54 was used instead of 3- (4-methoxy-3-methyl-phenyl) -4-bromo-1,5-dimethyl-1H-pyrazole. Similar reaction was performed using -3-chloro-phenyl) -4-bromo-1-methyl-1H-pyrazole, and 3- (4-methoxy-3-chloro-phenyl) -1,4-dimethyl-1H- Pyrazole was obtained.
Figure JPOXMLDOC01-appb-I000114
1 H-NMR (CDCl 3 ) δ: 7.70 (1H, d, J = 2.2 Hz), 7.53 (1H, dd, J = 8.5, 2.2 Hz), 7.18 (1H, s), 6.97 (1H, d, J = 8.5 Hz), 3.93 (3H, s), 3.88 (3H, s), 2.20 (3H, s).
参考製造例56
室温下、参考製造例27に記載の5−ヒドロキシ−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール9.5g、及びN,N−ジメチルホルムアミド70mlの混合物に55%水素化ナトリウム2.5gを加え1時間攪拌した。該反応混合物に硫酸ジメチル9.7gを加え、100℃下で12時間攪拌した。該反応混合物に、水を100ml加えた後、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、5−メトキシ−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール5.8gを得た。
Figure JPOXMLDOC01-appb-I000115
H−NMR(CDCl)δ:7.55(1H,dd,J=2.3,0.7Hz),7.49−7.47(1H,m),6.84(1H,d,J=8.5Hz),5.75(1H,s),4.56−4.50(1H,m),3.92(3H,s),3.66(3H,s),2.23(3H,s),1.35(3H,s),1.33(3H,s).
Reference production example 56
A mixture of 9.5 g of 5-hydroxy-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Production Example 27 and 70 ml of N, N-dimethylformamide at room temperature To the mixture, 2.5 g of 55% sodium hydride was added and stirred for 1 hour. To the reaction mixture, 9.7 g of dimethyl sulfate was added and stirred at 100 ° C. for 12 hours. 100 ml of water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 5.8 g of 5-methoxy-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000115
1 H-NMR (CDCl 3 ) δ: 7.55 (1H, dd, J = 2.3, 0.7 Hz), 7.49-7.47 (1H, m), 6.84 (1H, d, J = 8.5 Hz), 5.75 (1H, s), 4.56-4.50 (1H, m), 3.92 (3H, s), 3.66 (3H, s), 2.23 (3H, s), 1.35 (3H, s), 1.33 (3H, s).
参考製造例37
室温下、参考製造例56に記載の5−メトキシ−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール5.8g、クロロホルム70ml、及びN−クロロスクシンイミド3.3gの反応混合物を11時間攪拌した。該反応混合物に、水を100ml加えた後、クロロホルムで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、4−クロロ−5−メトキシ−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール5.6gを得た。
Figure JPOXMLDOC01-appb-I000116
H−NMR(CDCl)δ:7.62−7.59(2H,m),6.87(1H,d,J=9.1Hz),4.59−4.53(1H,m),4.11(3H,s),3.70(3H,s),2.24(3H,s),1.36(3H,s),1.34(3H,s).
Reference Production Example 37
At room temperature, 5.8 g of 5-methoxy-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Production Example 56, 70 ml of chloroform, and N-chlorosuccinimide 3 g of the reaction mixture was stirred for 11 hours. 100 ml of water was added to the reaction mixture, followed by extraction with chloroform. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 5.6 g of 4-chloro-5-methoxy-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole.
Figure JPOXMLDOC01-appb-I000116
1 H-NMR (CDCl 3 ) δ: 7.62-7.59 (2H, m), 6.87 (1H, d, J = 9.1 Hz), 4.59-4.53 (1H, m) , 4.11 (3H, s), 3.70 (3H, s), 2.24 (3H, s), 1.36 (3H, s), 1.34 (3H, s).
参考製造例58
参考製造例57に記載の4−クロロ−5−メトキシ−3−(4−イソプロポキシ−3−メチル−フェニル)−1−メチル−1H−ピラゾール5.6gおよび30%硫酸水溶液120mlの混合物を加熱還流下20時間攪拌した。該反応混合物に、水を100ml加えた後、酢酸エチルで抽出し、有機層を水で洗浄し、無水硫酸マグネシウムで乾燥した後、減圧濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−メチル−4−(4−クロロ−5−メトキシ−1−メチル−1H−ピラゾール−3−イル)−フェノール1.2gを得た。
Figure JPOXMLDOC01-appb-I000117
H−NMR(CDCl)δ:7.59(1H,d,J=2.0Hz),7.55(1H,dd,J=8.4,2.0Hz),6.80(1H,d,J=8.5Hz),5.06(1H,s),4.11(3H,s),3.70(3H,s),2.28(3H,s).
Reference Production Example 58
A mixture of 5.6 g of 4-chloro-5-methoxy-3- (4-isopropoxy-3-methyl-phenyl) -1-methyl-1H-pyrazole described in Reference Production Example 57 and 120 ml of 30% aqueous sulfuric acid was heated. The mixture was stirred for 20 hours under reflux. 100 ml of water was added to the reaction mixture, followed by extraction with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 1.2 g of 2-methyl-4- (4-chloro-5-methoxy-1-methyl-1H-pyrazol-3-yl) -phenol.
Figure JPOXMLDOC01-appb-I000117
1 H-NMR (CDCl 3 ) δ: 7.59 (1H, d, J = 2.0 Hz), 7.55 (1H, dd, J = 8.4, 2.0 Hz), 6.80 (1H, d, J = 8.5 Hz), 5.06 (1H, s), 4.11 (3H, s), 3.70 (3H, s), 2.28 (3H, s).
 前記合成法Aから合成法Cに準じて製造できる本テトラゾリノン化合物12から本テトラゾリノン化合物65を以下に示す。
 表中、Meはメチル基を表し、Etはエチル基を表し、OMeはメトキシ基を表し、OEtはエトキシ基を表し、Brは臭素原子を表し、Clは塩素原子を表し、Fはフッ素原子を表し、CF3はトリフルオロメチル基を表し、CNはシアノ基を表し、SMeはメチルチオ基を表し、Cyはシクロプロピル基を表す。
The tetrazolinone compound 65 to the present tetrazolinone compound 12 that can be produced according to the synthesis method C from the synthesis method A are shown below.
In the table, Me represents a methyl group, Et represents an ethyl group, OMe represents a methoxy group, OEt represents an ethoxy group, Br represents a bromine atom, Cl represents a chlorine atom, and F represents a fluorine atom. CF3 represents a trifluoromethyl group, CN represents a cyano group, SMe represents a methylthio group, and Cy represents a cyclopropyl group.
Figure JPOXMLDOC01-appb-I000118
Figure JPOXMLDOC01-appb-I000118
Figure JPOXMLDOC01-appb-T000119
Figure JPOXMLDOC01-appb-T000119
Figure JPOXMLDOC01-appb-T000120
Figure JPOXMLDOC01-appb-T000120
以下に本テトラゾリノン化合物12~65の物性データーを記す。([]は本テトラゾリノン化合物番号を表す。)
[12]H−NMR(CDCl)δ:7.80(1H,dd,J=8.0,1.4Hz),7.44(1H,dd,J=8.0,1.4Hz),7.40−7.38(2H,m),7.36(1H,dd,J=8.1,2.4Hz),6.87(1H,d,J=8.2Hz),5.33(2H,s),3.79(3H,s),3.59(3H,s),2.20(3H,s),2.10(3H,s),2.07(3H,s).[13]H−NMR(CDCl)δ:7.61(1H,dd,J=8.0,1.4Hz),7.46(1H,t,J=8.0Hz),7.41−7.39(2H,m),7.35(1H,dd,J=8.2,2.3Hz),6.88(1H,d,J=8.2Hz),5.34(2H,s),3.79(3H,s),3.59(3H,s),2.20(3H,s),2.10(3H,s),2.05(3H,s).[14]H−NMR(CDCl)δ:7.50(1H,td,J=8.2,5.8Hz),7.38(1H,s),7.37−7.31(2H,m),7.29−7.27(1H,m),6.89(1H,d,J=8.2Hz),5.30(2H,s),3.79(3H,s),3.59(3H,s),2.20(3H,s),2.09(3H,s),2.02(3H,s).[15]H−NMR(CDCl)δ:7.66(1H,dd,J=8.2,2.2Hz),7.61(1H,s),7.49−7.43(2H,m),7.28(1H,dd,J=7.1,2.1Hz),6.90(1H,d,J=8.5Hz),5.08(2H,s),3.82(3H,s),3.58(3H,s),2.85(2H,q,J=7.6Hz),2.28(3H,s),2.11(3H,s),1.28(3H,t,J=7.6Hz)[16]H−NMR(CDCl)δ:7.63(1H,dd,J=8.4,2.2Hz),7.57−7.56(1H,m),7.46(1H,t,J=8.2Hz),7.09−7.06(2H,m),6.92(1H,d,J=8.7Hz),5.29(2H,s),3.93(3H,s),3.81(3H,s),3.58(3H,s),2.28(3H,s),2.03(3H,s)[17]H−NMR(CDCl)δ:7.65(1H,dd,J=8.5,2.3Hz),7.58(1H,dd,J=1.6,0.7Hz),7.53−7.48(1H,m),7.30(2H,dd,J=17.1,7.9Hz),6.90(1H,d,J=8.5Hz),5.31(2H,s),3.81(3H,s),3.59(3H,s),2.28(3H,s),2.03(3H,s).[18]H−NMR(CDCl)δ:7.54−7.52(1H,m),7.48(1H,dd,J=8.3,2.3Hz),7.44−7.38(2H,m),7.30−7.26(1H,m),6.84(1H,d,J=8.5Hz),6.23(1H,s),5.05(2H,s),3.80(3H,s),3.61(3H,s),2.51(3H,s),2.29(3H,s),2.11(3H,s).[19]H−NMR(CDCl)δ:7.54−7.52(1H,m),7.51−7.43(3H,m),7.29−7.26(1H,m),6.85(1H,d,J=8.5Hz),6.23(1H,s),5.07(2H,s),3.80(3H,s),3.57(3H,s),2.89−2.81(2H,m),2.29(3H,s),2.10(3H,s),1.28(3H,t,J=7.6Hz).[20]H−NMR(CDCl)δ:7.49−7.43(3H,m),7.07(2H,dd,J=8.2,4.3Hz),6.87(1H,d,J=8.2Hz),6.21(1H,s),5.27(2H,s),3.92(3H,s),3.79(3H,s),3.56(3H,s),2.28(3H,s),2.02(3H,s).[21]H−NMR(CDCl)δ:7.61(1H,dd,J=8.0,1.1Hz),7.52−7.51(1H,m),7.49−7.44(2H,m),7.40(1H,dd,J=8.0,1.4Hz),6.85(1H,d,J=8.5Hz),6.23(1H,d,J=0.7Hz),5.33(2H,s),3.80(3H,s),3.57(3H,s),2.28(3H,d,J=2.5Hz),2.05(3H,s).[22]H−NMR(CDCl)δ:7.49(1H,t,J=8.2Hz),7.40−7.39(1H,m),7.37(1H,dd,J=8.5,2.3Hz),7.13−7.09(2H,m),6.94(1H,d,J=8.5Hz),5.32(2H,s),3.96(3H,s),3.87(3H,s),3.62(3H,s),2.17(3H,s),2.06(3H,s).[23]H−NMR(CDCl)δ:7.80(1H,dd,J=7.9,1.5Hz),7.45−7.35(4H,m),6.88(1H,d,J=8.5Hz),5.33(2H,s),3.85(3H,s),3.60(3H,s),2.14(3H,s),2.07(3H,s).[24]H−NMR(CDCl)δ:7.54−7.48(1H,m),7.38−7.27(4H,m),6.90(1H,d,J=8.5Hz),5.30(2H,d,J=0.7Hz),3.85(3H,s),3.60(3H,s),2.14(3H,s),2.03(3H,s).[25]H−NMR(CDCl)δ:7.92(1H,dd,J=7.0,2.2Hz),7.71−7.66(2H,m),7.40−7.35(2H,m),6.88−6.86(1H,m),5.33(2H,s),3.85(3H,s),3.53(3H,s),2.15(3H,s),2.05(3H,s).[26]H−NMR(CDCl)δ:7.54−7.54(1H,m),7.51(1H,dd,J=8.4,2.2Hz),7.45−7.40(2H,m),7.28(1H,dd,J=7.0,2.4Hz),6.87(1H,d,J=8.2Hz),6.80(1H,s),5.07(2H,s),4.01(3H,s),3.62(3H,s),2.51(3H,s),2.13(3H,s).[27]H−NMR(CDCl)δ:7.49(2H,s),7.47(1H,s),7.10−7.06(2H,m),6.90(1H,d,J=8.0Hz),6.78(1H,d,J=0.5Hz),5.29(2H,s),4.00(3H,s),3.93(3H,s),3.58(3H,s),2.03(3H,s).[28]H−NMR(CDCl)δ:7.81(1H,dd,J=7.8,1.4Hz),7.52−7.49(2H,m),7.46−7.38(2H,m),6.87(1H,d,J=8.2Hz),6.80(1H,s),5.33(2H,s),4.01(3H,s),3.59(3H,s),2.08(3H,s).[29]H−NMR(CDCl)δ:7.62(1H,dd,J=8.0,1.4Hz),7.52−7.49(2H,m),7.47(1H,t,J=8.0Hz),7.40(1H,dd,J=8.0,1.4Hz),6.87(1H,d,J=8.5Hz),6.80(1H,d,J=0.5Hz),5.34(2H,s),4.00(3H,s),3.59(3H,s),2.06(3H,s).[30]H−NMR(CDCl)δ:7.49−7.43(2H,m),7.41−7.40(1H,m),7.36(1H,d,J=8.5Hz),7.28(1H,dd,J=7.0,2.2Hz),6.88(1H,d,J=8.5Hz),5.08(2H,s),3.94(3H,s),3.71(3H,s),3.59(3H,s),2.85(2H,q,J=7.6Hz),2.13(3H,s),2.11(3H,s),1.27(3H,q,J=7.6Hz).[31]H−NMR(CDCl)δ:7.45(1H,s),7.34(1H,s),7.31(1H,dd,J=8.4,2.2Hz),7.07(1H,d,J=4.4Hz),7.05(1H,d,J=3.9Hz),6.89(1H,d,J=8.2Hz),5.26(2H,s),3.91(3H,s),3.90(3H,s),3.68(3H,s),3.56(3H,s),2.10(3H,s),2.01(3H,s).[32]H−NMR(CDCl)δ:7.80(1H,dd,J=8.0,1.0Hz),7.45−7.33(4H,m),6.87(1H,d,J=8.2Hz),5.33(2H,s),3.93(3H,d,J=0.5Hz),3.70(3H,s),3.59(3H,s),2.13(3H,s),2.07(3H,s).[33]H−NMR(CDCl)δ:7.61(1H,dd,J=8.0,1.2Hz),7.46(1H,t,J=8.0Hz),7.41−7.39(2H,m),7.34(1H,dd,J=8.5,1.9Hz),6.87(1H,d,J=8.5Hz),5.34(2H,s),3.93(3H,s),3.70(3H,s),3.59(3H,s),2.12(3H,s),2.06(3H,s).[34]H−NMR(CDCl)δ:7.52(1H,td,J=8.2,5.9Hz),7.39(1H,d,J=1.4Hz),7.37−7.28(3H,m)6.90(1H,d,J=8.5Hz),5.31(2H,d,J=0.9Hz),3.94(3H,s),3.71(3H,s),3.61(3H,s),2.14(3H,s),2.03(3H,s).[35]H−NMR(CDCl)δ:7.44−7.39(3H,m),7.37(1H,dd,J=8.3,2.3Hz),7.29−7.27(1H,m),6.87(1H,d,J=8.5Hz),5.06(2H,s),4.17−4.12(2H,m),3.71(3H,s),3.62(3H,s),2.51(3H,s),2.12(3H,s),2.11(3H,s),1.41(3H,t,J=7.0Hz).[36]H−NMR(CDCl)δ:7.49−7.43(2H,m),7.41−7.41(1H,m),7.38−7.35(1H,m),7.28(1H,dd,J=7.0,2.2Hz),6.88(1H,d,J=8.2Hz),5.07(2H,s),4.14(2H,q,J=7.1Hz),3.70(3H,s),3.58(3H,s),2.85(2H,q,J=7.6Hz),2.11(3H,s),2.10(3H,s),1.41(3H,t,J=7.1Hz),1.28(3H,t,J=7.7Hz).[37]H−NMR(CDCl)δ:7.46(1H,t,J=8.2Hz),7.37(1H,s),7.33(1H,dd,J=8.2,2.3Hz),7.08(2H,dd,J=8.1,3.8Hz),6.90(1H,d,J=8.5Hz),5.28(2H,s),4.16−4.09(2H,m),3.92(3H,s),3.70(3H,s),3.58(3H,s),2.10(3H,s),2.02(3H,s),1.40(3H,t,J=7.1Hz).[38]H−NMR(CDCl)δ:7.80(1H,dd,J=7.8,1.4Hz),7.45−7.34(4H,m),6.87(1H,d,J=8.5Hz),5.33(2H,s),4.14(2H,q,J=7.1Hz),3.70(3H,s),3.59(3H,s),2.10(3H,s),2.0
6(3H,s),1.41(3H,t,J=7.1Hz).[39]H−NMR(CDCl)δ:7.61(1H,dd,J=8.0,1.4Hz),7.46(1H,t,J=8.0Hz),7.41−7.39(2H,m),7.36−7.34(1H,m),6.87(1H,d,J=8.5Hz),5.34(2H,s),4.14(2H,q,J=7.0Hz),3.70(3H,s),3.59(3H,s),2.10(3H,s),2.05(3H,s),1.41(3H,t,J=7.1Hz).[40]H−NMR(CDCl)δ:7.53−7.47(1H,m),7.39(1H,d,J=1.6Hz),7.36−7.26(3H,m),6.88(1H,d,J=8.5Hz),5.29(2H,s),4.14(2H,q,J=7.1Hz),3.70(3H,s),3.59(3H,s),2.10(3H,s),2.02(3H,s),1.40(3H,t,J=7.1Hz).[41]H−NMR(CDCl)δ:7.51−7.44(2H,m),7.40−7.36(2H,m),7.29(1H,dd,J=7.1,2.1Hz),6.91(1H,d,J=8.5Hz),5.09(2H,s),4.03(3H,s),3.60(3H,s),2.85(2H,q,J=7.6Hz),2.34(3H,s),2.12(3H,s),1.29(3H,t,J=7.6Hz).[42]H−NMR(CDCl)δ:7.65(1H,dd,J=8.4,2.3Hz),7.58(1H,d,J=2.0Hz),7.44−7.39(2H,m),7.28−7.26(1H,m),6.89(1H,d,J=8.6Hz),5.06(2H,s),3.84(3H,s),3.62(3H,s),2.51(3H,s),2.30(3H,s),2.12(3H,s).[43]H−NMR(CDCl)δ:7.44−7.38(4H,m),7.29−7.26(1H,m),6.88(1H,d,J=8.5Hz),5.06(2H,s),3.98(3H,s),3.62(3H,s),2.51(3H,s),2.26(6H,s),2.13(3H,s).[44]H−NMR(CDCl)δ:7.49−7.42(3H,m),7.40(1H,dd,J=8.5,2.2Hz),7.28(1H,dd,J=7.0,2.0Hz),6.89(1H,d,J=8.4Hz),5.08(2H,s),3.98(3H,s),3.59(3H,s),2.85(2H,q,J=7.6Hz),2.26(6H,s),2.11(3H,s),1.28(3H,t,J=7.6Hz).[45]H−NMR(CDCl)δ:7.46(1H,t,J=8.2Hz),7.39−7.38(1H,m),7.36(1H,dd,J=8.3,2.2Hz),7.09−7.06(2H,m),6.91(1H,d,J=8.4Hz),5.28(2H,s),3.97(3H,s),3.92(3H,s),3.58(3H,s),2.25(3H,s),2.25(3H,s),2.03(3H,s).[46]H−NMR(CDCl)δ:7.62(1H,t,J=4.0Hz),7.50−7.37(4H,m),6.89(1H,d,J=8.5Hz),5.35(2H,s),3.98(3H,s),3.59(3H,s),2.26(6H,s),2.06(3H,s).[47]H−NMR(CDCl)δ:7.53−7.47(1H,m),7.41−7.40(1H,m),7.38(1H,dd,J=8.5,1.9Hz),7.33−7.26(2H,m),6.89(1H,d,J=8.4Hz),5.30(2H,s),3.98(3H,s),3.59(3H,s),2.26(3H,s),2.25(3H,s),2.02(3H,s).[48]MS:439(M+1).[49]H−NMR(CDCl)δ:7.43(1H,t,J=7.9Hz),7.40(1H,d,J=1.8Hz),7.38(1H,dd,J=8.4,2.2Hz),7.28(2H,s),6.93(1H,d,J=8.2Hz),5.29(2H,s),3.85(3H,s),3.61(3H,s),2.15(3H,s),2.14−2.12(4H,m),1.01−0.97(2H,m),0.78−0.74(2H,m).[50]H−NMR(CDCl)δ:7.44(1H,t,J=7.8Hz),7.40−7.36(2H,m),7.28(2H,d,J=7.9Hz),6.94(1H,d,J=8.4Hz),5.29(2H,s),4.03(3H,s),3.62(3H,s),2.34(3H,s),2.16−2.09(4H,m),1.02−0.97(2H,m),0.79−0.75(2H,m).[51]H−NMR(CDCl)δ:7.64−7.61(1H,m),7.58−7.57(1H,m),7.44(1H,t,J=7.8Hz),7.30−7.27(2H,m),6.94(1H,d,J=8.5Hz),5.30(2H,s),4.12(3H,s),3.71(3H,s),3.61(3H,s),2.14−2.11(4H,m),1.01−0.97(2H,m),0.79−0.76(2H,m).[52]H−NMR(CDCl)δ:7.44(1H,t,J=7.9Hz),7.41(1H,d,J=1.4Hz),7.37(1H,dd,J=8.2,2.1Hz),7.28(2H,d,J=8.0Hz),6.93(1H,d,J=8.5Hz),5.30(2H,s),3.95(3H,s),3.72(3H,s),3.62(3H,s),2.16−2.13(4H,m),2.12(3H,s),1.03−0.98(2H,m),0.79−0.75(2H,m).[53]H−NMR(CDCl)δ:7.45−7.41(2H,m),7.37(1H,dd,J=8.5,2.3Hz),7.27−7.26(2H,m),6.91(1H,d,J=8.5Hz),5.28(2H,s),4.17−4.12(2H,m),3.70(3H,s),3.60(3H,s),2.14−2.10(7H,m),1.41(3H,t,J=7.1Hz),1.00−0.96(2H,m),0.78−0.75(2H,m).[54]H−NMR(CDCl)δ:7.45−7.40(2H,m),7.37(1H,dd,J=8.4,1.7Hz),7.28−7.26(2H,m),6.92(1H,d,J=8.5Hz),5.28(2H,s),3.80(3H,s),3.60(3H,s),2.21(3H,s),2.16−2.11(4H,m),2.10(3H,s),1.01−0.96(2H,m),0.78−0.74(2H,m).[55]H−NMR(CDCl)δ:7.45−7.39(3H,m),7.28−7.26(2H,m),6.93(1H,d,J=8.5Hz),5.29(2H,s),3.99(3H,s),3.61(3H,s),2.27(6H,s),2.16−2.10(4H,m),1.00−0.97(2H,m),0.78−0.76(2H,m).[56]H−NMR(CDCl)δ:7.45−7.37(3H,m),7.29−7.27(2H,m),6.92(1H,d,J=8.4Hz),5.28(2H,s),3.74(3H,s),3.61(3H,s),2.16−2.13(1H,m),2.11(3H,s),2.09(3H,s),1.02−0.97(2H,m),0.78−0.74(2H,m).[57]H−NMR(CDCl)δ:7.43−7.36(4H,m),7.29−7.27(1H,m),6.88(1H,d,J=8.4Hz),5.06(2H,s),3.74(3H,s),3.63(3H,s),2.51(3H,s),2.12(3H,s),2.09(3H,s).[58]H−NMR(CDCl)δ:7.50−7.36(4H,m),7.29−7.27(1H,m),6.89(1H,d,J=8.6Hz),5.08(2H,s),3.74(3H,s),3.59(3H,s),2.85(2H,q,J=7.6Hz),2.11(3H,s),2.09(3H,s),1.28(3H,t,J=7.6Hz).[59]H−NMR(CDCl)δ:7.47(1H,t,J=8.3Hz),7.37(1H,s),7.35−7.33(1H,m),7.09−7.07(2H,m),6.91(1H,d,J=8.4Hz),5.29(2H,s),3.93(3H,s),3.73(3H,s),3.59(3H,s),2.08(3H,s),2.03(3H,s).[60]H−NMR(CDCl)δ:7.61(1H,d,J=2.2Hz),7.47−7.42(2H,m),7.16(1H,s),7.11(1H,d,J=8.2Hz),7.06(1H,d,J=8.5Hz),6.96(1H,d,J=8.5Hz),5.44(2H,s),3.94(3H,s),3.86(3H,s),3.63(3H,s),2.17(3H,d,J=0.7Hz).[61]H−NMR(CDCl)δ:7.66(1H,d,J=2.2Hz),7.47(1H,dd,J=8.5,2.2Hz),7.42(1H,d,J=7.8Hz),7.29(2H,t,J=8.1Hz),7.17(1H,s),6.97(1H,d,J=8.7Hz),5.43(2H,s),3.87(3H,s),3.65(3H,s),2.19−2.15(4H,m),1.04−0.99(2H,m),0.78−0.74(2H,m).[62]H−NMR(CDCl)δ:7.62(1H,dd,J=8.4,2.3Hz),7.57(1H,dd,J=2.0,0.7Hz),7.45−7.39(2H,m),7.29−7.27(1H,m),6.89(1H,d,J=8.4Hz),5.07(2H,s),4.11(3H,s),3.70(3H,s),3.62(3H,s),2.51(3H,s),2.12(3H,s).[63]H−NMR(CDCl)δ:7.62(1H,d,J=8.5Hz),7.57(1H,s),7.49−7.43(2H,m),7.29−7.27(1H,m),6.89(1H,d,J=8.5Hz),5.08(2H,s),4.11(3H,s),3.70(3H,s),3.58(3H,s),2.84(2H,q,J=7.5Hz),2.11(3H,s),1.27(3H,t,J=7.5Hz).[64]H−NMR(CDCl)δ:7.58(1H,dd,J=8.5,2.3Hz),7.53(1H,d,J=1.6Hz),7.46(1H,t,J=8.1Hz),7.09−7.06(2H,m),6.91(1H,d,J=8.7Hz),5.29(2H,s),4.10(3H,s),3.92(3H,s),3.69(3H,s),3.58(3H,s),2.03(3H,s).[65]H−NMR(CDCl)δ:7.63−7.59(2H,m),7.56(1H,dd,J=2.2,0.6Hz),7.47(1H,t,J=8.0Hz),7.40(1H,dd,J=8.0,1.4Hz),6.89(1H,d,J=8.5H),5.35(2H,s),4.11(3H,s),3.70(3H,s),3.59(3H,s),2.06(3H,s).
The physical property data of the present tetrazolinone compounds 12 to 65 are shown below. ([] Represents the tetrazolinone compound number.)
[12] 1 H-NMR (CDCl 3 ) δ: 7.80 (1H, dd, J = 8.0, 1.4 Hz), 7.44 (1H, dd, J = 8.0, 1.4 Hz) 7.40-7.38 (2H, m), 7.36 (1H, dd, J = 8.1, 2.4 Hz), 6.87 (1H, d, J = 8.2 Hz), 5. 33 (2H, s), 3.79 (3H, s), 3.59 (3H, s), 2.20 (3H, s), 2.10 (3H, s), 2.07 (3H, s) ). [13] 1 H-NMR (CDCl 3 ) δ: 7.61 (1H, dd, J = 8.0, 1.4 Hz), 7.46 (1H, t, J = 8.0 Hz), 7.41 −7.39 (2H, m), 7.35 (1H, dd, J = 8.2, 2.3 Hz), 6.88 (1H, d, J = 8.2 Hz), 5.34 (2H, s), 3.79 (3H, s), 3.59 (3H, s), 2.20 (3H, s), 2.10 (3H, s), 2.05 (3H, s). [14] 1 H-NMR (CDCl 3 ) δ: 7.50 (1H, td, J = 8.2, 5.8 Hz), 7.38 (1H, s), 7.37-7.31 (2H , M), 7.29-7.27 (1H, m), 6.89 (1H, d, J = 8.2 Hz), 5.30 (2H, s), 3.79 (3H, s), 3.59 (3H, s), 2.20 (3H, s), 2.09 (3H, s), 2.02 (3H, s). [15] 1 H-NMR (CDCl 3 ) δ: 7.66 (1H, dd, J = 8.2, 2.2 Hz), 7.61 (1H, s), 7.49-7.43 (2H M), 7.28 (1H, dd, J = 7.1, 2.1 Hz), 6.90 (1H, d, J = 8.5 Hz), 5.08 (2H, s), 3.82. (3H, s), 3.58 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.28 (3H, s), 2.11 (3H, s), 1. 28 (3H, t, J = 7.6 Hz) [16] 1 H-NMR (CDCl 3 ) δ: 7.63 (1H, dd, J = 8.4, 2.2 Hz), 7.57-7. 56 (1H, m), 7.46 (1 H, t, J = 8.2 Hz), 7.09-7.06 (2H, m), 6.92 (1H, d, J = 8.7 Hz), 5.29 (2H, s), 3. 3 (3H, s), 3.81 (3H, s), 3.58 (3H, s), 2.28 (3H, s), 2.03 (3H, s) [17] 1 H-NMR ( CDCl 3 ) δ: 7.65 (1H, dd, J = 8.5, 2.3 Hz), 7.58 (1H, dd, J = 1.6, 0.7 Hz), 7.53-7.48 (1H, m), 7.30 (2H, dd, J = 17.1, 7.9 Hz), 6.90 (1H, d, J = 8.5 Hz), 5.31 (2H, s), 3 .81 (3H, s), 3.59 (3H, s), 2.28 (3H, s), 2.03 (3H, s). [18] 1 H-NMR (CDCl 3 ) δ: 7.54-7.52 (1H, m), 7.48 (1H, dd, J = 8.3, 2.3 Hz), 7.44-7 .38 (2H, m), 7.30-7.26 (1H, m), 6.84 (1H, d, J = 8.5 Hz), 6.23 (1H, s), 5.05 (2H) , S), 3.80 (3H, s), 3.61 (3H, s), 2.51 (3H, s), 2.29 (3H, s), 2.11 (3H, s). [19] 1 H-NMR (CDCl 3 ) δ: 7.54-7.52 (1H, m), 7.51-7.43 (3H, m), 7.29-7.26 (1H, m ), 6.85 (1H, d, J = 8.5 Hz), 6.23 (1H, s), 5.07 (2H, s), 3.80 (3H, s), 3.57 (3H, s), 2.89-2.81 (2H, m), 2.29 (3H, s), 2.10 (3H, s), 1.28 (3H, t, J = 7.6 Hz). [20] 1 H-NMR (CDCl 3 ) δ: 7.49-7.43 (3H, m), 7.07 (2H, dd, J = 8.2, 4.3 Hz), 6.87 (1H , D, J = 8.2 Hz), 6.21 (1H, s), 5.27 (2H, s), 3.92 (3H, s), 3.79 (3H, s), 3.56 ( 3H, s), 2.28 (3H, s), 2.02 (3H, s). [21] 1 H-NMR (CDCl 3 ) δ: 7.61 (1H, dd, J = 8.0, 1.1 Hz), 7.52 to 7.51 (1H, m), 7.49-7 .44 (2H, m), 7.40 (1H, dd, J = 8.0, 1.4 Hz), 6.85 (1H, d, J = 8.5 Hz), 6.23 (1H, d, J = 0.7 Hz), 5.33 (2H, s), 3.80 (3H, s), 3.57 (3H, s), 2.28 (3H, d, J = 2.5 Hz), 2 .05 (3H, s). [22] 1 H-NMR (CDCl 3 ) δ: 7.49 (1H, t, J = 8.2 Hz), 7.40-7.39 (1H, m), 7.37 (1H, dd, J = 8.5, 2.3 Hz), 7.13-7.09 (2H, m), 6.94 (1H, d, J = 8.5 Hz), 5.32 (2H, s), 3.96. (3H, s), 3.87 (3H, s), 3.62 (3H, s), 2.17 (3H, s), 2.06 (3H, s). [23] 1 H-NMR (CDCl 3 ) δ: 7.80 (1H, dd, J = 7.9, 1.5 Hz), 7.45-7.35 (4H, m), 6.88 (1H , D, J = 8.5 Hz), 5.33 (2H, s), 3.85 (3H, s), 3.60 (3H, s), 2.14 (3H, s), 2.07 ( 3H, s). [24] 1 H-NMR (CDCl 3 ) δ: 7.54-7.48 (1H, m), 7.38-7.27 (4H, m), 6.90 (1H, d, J = 8) .5Hz), 5.30 (2H, d, J = 0.7 Hz), 3.85 (3H, s), 3.60 (3H, s), 2.14 (3H, s), 2.03 ( 3H, s). [25] 1 H-NMR (CDCl 3 ) δ: 7.92 (1H, dd, J = 7.0, 2.2 Hz), 7.71-7.66 (2H, m), 7.40-7 .35 (2H, m), 6.88-6.86 (1H, m), 5.33 (2H, s), 3.85 (3H, s), 3.53 (3H, s), 2. 15 (3H, s), 2.05 (3H, s). [26] 1 H-NMR (CDCl 3 ) δ: 7.54-7.54 (1H, m), 7.51 (1H, dd, J = 8.4, 2.2 Hz), 7.45-7 .40 (2H, m), 7.28 (1H, dd, J = 7.0, 2.4 Hz), 6.87 (1H, d, J = 8.2 Hz), 6.80 (1H, s) , 5.07 (2H, s), 4.01 (3H, s), 3.62 (3H, s), 2.51 (3H, s), 2.13 (3H, s). [27] 1 H-NMR (CDCl 3 ) δ: 7.49 (2H, s), 7.47 (1H, s), 7.10-7.06 (2H, m), 6.90 (1H, d, J = 8.0 Hz), 6.78 (1H, d, J = 0.5 Hz), 5.29 (2H, s), 4.00 (3H, s), 3.93 (3H, s) , 3.58 (3H, s), 2.03 (3H, s). [28] 1 H-NMR (CDCl 3 ) δ: 7.81 (1H, dd, J = 7.8, 1.4 Hz), 7.52-7.49 (2H, m), 7.46-7 .38 (2H, m), 6.87 (1H, d, J = 8.2 Hz), 6.80 (1H, s), 5.33 (2H, s), 4.01 (3H, s), 3.59 (3H, s), 2.08 (3H, s). [29] 1 H-NMR (CDCl 3 ) δ: 7.62 (1H, dd, J = 8.0, 1.4 Hz), 7.52-7.49 (2H, m), 7.47 (1H , T, J = 8.0 Hz), 7.40 (1H, dd, J = 8.0, 1.4 Hz), 6.87 (1H, d, J = 8.5 Hz), 6.80 (1H, d, J = 0.5 Hz), 5.34 (2H, s), 4.00 (3H, s), 3.59 (3H, s), 2.06 (3H, s). [30] 1 H-NMR (CDCl 3 ) δ: 7.49-7.43 (2H, m), 7.41-7.40 (1H, m), 7.36 (1H, d, J = 8) .5 Hz), 7.28 (1H, dd, J = 7.0, 2.2 Hz), 6.88 (1H, d, J = 8.5 Hz), 5.08 (2H, s), 3.94 (3H, s), 3.71 (3H, s), 3.59 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.13 (3H, s), 2. 11 (3H, s), 1.27 (3H, q, J = 7.6 Hz). [31] 1 H-NMR (CDCl 3 ) δ: 7.45 (1H, s), 7.34 (1H, s), 7.31 (1H, dd, J = 8.4, 2.2 Hz), 7.07 (1H, d, J = 4.4 Hz), 7.05 (1H, d, J = 3.9 Hz), 6.89 (1H, d, J = 8.2 Hz), 5.26 (2H) , S), 3.91 (3H, s), 3.90 (3H, s), 3.68 (3H, s), 3.56 (3H, s), 2.10 (3H, s), 2 .01 (3H, s). [32] 1 H-NMR (CDCl 3 ) δ: 7.80 (1H, dd, J = 8.0, 1.0 Hz), 7.45-7.33 (4H, m), 6.87 (1H , D, J = 8.2 Hz), 5.33 (2H, s), 3.93 (3H, d, J = 0.5 Hz), 3.70 (3H, s), 3.59 (3H, s) ), 2.13 (3H, s), 2.07 (3H, s). [33] 1 H-NMR (CDCl 3 ) δ: 7.61 (1H, dd, J = 8.0, 1.2 Hz), 7.46 (1H, t, J = 8.0 Hz), 7.41 −7.39 (2H, m), 7.34 (1H, dd, J = 8.5, 1.9 Hz), 6.87 (1H, d, J = 8.5 Hz), 5.34 (2H, s), 3.93 (3H, s), 3.70 (3H, s), 3.59 (3H, s), 2.12 (3H, s), 2.06 (3H, s). [34] 1 H-NMR (CDCl 3 ) δ: 7.52 (1H, td, J = 8.2, 5.9 Hz), 7.39 (1H, d, J = 1.4 Hz), 7.37 −7.28 (3H, m) 6.90 (1H, d, J = 8.5 Hz), 5.31 (2H, d, J = 0.9 Hz), 3.94 (3H, s), 3. 71 (3H, s), 3.61 (3H, s), 2.14 (3H, s), 2.03 (3H, s). [35] 1 H-NMR (CDCl 3 ) δ: 7.44-7.39 (3H, m), 7.37 (1H, dd, J = 8.3, 2.3 Hz), 7.29-7 .27 (1H, m), 6.87 (1H, d, J = 8.5 Hz), 5.06 (2H, s), 4.17-4.12 (2H, m), 3.71 (3H , S), 3.62 (3H, s), 2.51 (3H, s), 2.12 (3H, s), 2.11 (3H, s), 1.41 (3H, t, J = 7.0 Hz). [36] 1 H-NMR (CDCl 3 ) δ: 7.49-7.43 (2H, m), 7.41-7.41 (1H, m), 7.38-7.35 (1H, m ), 7.28 (1H, dd, J = 7.0, 2.2 Hz), 6.88 (1H, d, J = 8.2 Hz), 5.07 (2H, s), 4.14 (2H) , Q, J = 7.1 Hz), 3.70 (3H, s), 3.58 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.11 (3H, s) ), 2.10 (3H, s), 1.41 (3H, t, J = 7.1 Hz), 1.28 (3H, t, J = 7.7 Hz). [37] 1 H-NMR (CDCl 3 ) δ: 7.46 (1H, t, J = 8.2 Hz), 7.37 (1H, s), 7.33 (1H, dd, J = 8.2) , 2.3 Hz), 7.08 (2H, dd, J = 8.1, 3.8 Hz), 6.90 (1H, d, J = 8.5 Hz), 5.28 (2H, s), 4 .16-4.09 (2H, m), 3.92 (3H, s), 3.70 (3H, s), 3.58 (3H, s), 2.10 (3H, s), 2. 02 (3H, s), 1.40 (3H, t, J = 7.1 Hz). [38] 1 H-NMR (CDCl 3 ) δ: 7.80 (1H, dd, J = 7.8, 1.4 Hz), 7.45-7.34 (4H, m), 6.87 (1H , D, J = 8.5 Hz), 5.33 (2H, s), 4.14 (2H, q, J = 7.1 Hz), 3.70 (3H, s), 3.59 (3H, s) ), 2.10 (3H, s), 2.0
6 (3H, s), 1.41 (3H, t, J = 7.1 Hz). [39] 1 H-NMR (CDCl 3 ) δ: 7.61 (1H, dd, J = 8.0, 1.4 Hz), 7.46 (1H, t, J = 8.0 Hz), 7.41 -7.39 (2H, m), 7.36-7.34 (1H, m), 6.87 (1H, d, J = 8.5Hz), 5.34 (2H, s), 4.14 (2H, q, J = 7.0 Hz), 3.70 (3H, s), 3.59 (3H, s), 2.10 (3H, s), 2.05 (3H, s), 1. 41 (3H, t, J = 7.1 Hz). [40] 1 H-NMR (CDCl 3 ) δ: 7.53-7.47 (1H, m), 7.39 (1H, d, J = 1.6 Hz), 7.36-7.26 (3H M), 6.88 (1H, d, J = 8.5 Hz), 5.29 (2H, s), 4.14 (2H, q, J = 7.1 Hz), 3.70 (3H, s). ), 3.59 (3H, s), 2.10 (3H, s), 2.02 (3H, s), 1.40 (3H, t, J = 7.1 Hz). [41] 1 H-NMR (CDCl 3 ) δ: 7.51-7.44 (2H, m), 7.40-7.36 (2H, m), 7.29 (1H, dd, J = 7) .1, 2.1 Hz), 6.91 (1H, d, J = 8.5 Hz), 5.09 (2H, s), 4.03 (3H, s), 3.60 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.34 (3H, s), 2.12 (3H, s), 1.29 (3H, t, J = 7.6 Hz). [42] 1 H-NMR (CDCl 3 ) δ: 7.65 (1H, dd, J = 8.4, 2.3 Hz), 7.58 (1H, d, J = 2.0 Hz), 7.44 -7.39 (2H, m), 7.28-7.26 (1H, m), 6.89 (1H, d, J = 8.6 Hz), 5.06 (2H, s), 3.84 (3H, s), 3.62 (3H, s), 2.51 (3H, s), 2.30 (3H, s), 2.12 (3H, s). [43] 1 H-NMR (CDCl 3 ) δ: 7.44-7.38 (4H, m), 7.29-7.26 (1H, m), 6.88 (1H, d, J = 8) .5 Hz), 5.06 (2H, s), 3.98 (3H, s), 3.62 (3H, s), 2.51 (3H, s), 2.26 (6H, s), 2 .13 (3H, s). [44] 1 H-NMR (CDCl 3 ) δ: 7.49-7.42 (3H, m), 7.40 (1H, dd, J = 8.5, 2.2 Hz), 7.28 (1H , Dd, J = 7.0, 2.0 Hz), 6.89 (1H, d, J = 8.4 Hz), 5.08 (2H, s), 3.98 (3H, s), 3.59 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.26 (6H, s), 2.11 (3H, s), 1.28 (3H, t, J = 7) .6 Hz). [45] 1 H-NMR (CDCl 3 ) δ: 7.46 (1H, t, J = 8.2 Hz), 7.39-7.38 (1H, m), 7.36 (1H, dd, J = 8.3, 2.2 Hz), 7.09-7.06 (2H, m), 6.91 (1H, d, J = 8.4 Hz), 5.28 (2H, s), 3.97. (3H, s), 3.92 (3H, s), 3.58 (3H, s), 2.25 (3H, s), 2.25 (3H, s), 2.03 (3H, s) . [46] 1 H-NMR (CDCl 3 ) δ: 7.62 (1H, t, J = 4.0 Hz), 7.50-7.37 (4H, m), 6.89 (1H, d, J = 8.5 Hz), 5.35 (2H, s), 3.98 (3H, s), 3.59 (3H, s), 2.26 (6H, s), 2.06 (3H, s) . [47] 1 H-NMR (CDCl 3 ) δ: 7.53-7.47 (1H, m), 7.41-7.40 (1H, m), 7.38 (1H, dd, J = 8) .5, 1.9 Hz), 7.33-7.26 (2 H, m), 6.89 (1 H, d, J = 8.4 Hz), 5.30 (2 H, s), 3.98 (3 H) , S), 3.59 (3H, s), 2.26 (3H, s), 2.25 (3H, s), 2.02 (3H, s). [48] MS: 439 (M + 1). [49] 1 H-NMR (CDCl 3 ) δ: 7.43 (1H, t, J = 7.9 Hz), 7.40 (1H, d, J = 1.8 Hz), 7.38 (1H, dd , J = 8.4, 2.2 Hz), 7.28 (2H, s), 6.93 (1H, d, J = 8.2 Hz), 5.29 (2H, s), 3.85 (3H) , S), 3.61 (3H, s), 2.15 (3H, s), 2.14-2.12 (4H, m), 1.01-0.97 (2H, m),. 78-0.74 (2H, m). [50] 1 H-NMR (CDCl 3 ) δ: 7.44 (1H, t, J = 7.8 Hz), 7.40-7.36 (2H, m), 7.28 (2H, d, J = 7.9 Hz), 6.94 (1H, d, J = 8.4 Hz), 5.29 (2H, s), 4.03 (3H, s), 3.62 (3H, s), 2. 34 (3H, s), 2.16-2.09 (4H, m), 1.02-0.97 (2H, m), 0.79-0.75 (2H, m). [51] 1 H-NMR (CDCl 3 ) δ: 7.64-7.61 (1H, m), 7.58-7.57 (1H, m), 7.44 (1 H, t, J = 7) .8 Hz), 7.30-7.27 (2 H, m), 6.94 (1 H, d, J = 8.5 Hz), 5.30 (2 H, s), 4.12 (3 H, s), 3.71 (3H, s), 3.61 (3H, s), 2.14-2.11 (4H, m), 1.01-0.97 (2H, m), 0.79-0. 76 (2H, m). [52] 1 H-NMR (CDCl 3 ) δ: 7.44 (1H, t, J = 7.9 Hz), 7.41 (1H, d, J = 1.4 Hz), 7.37 (1H, dd , J = 8.2, 2.1 Hz), 7.28 (2H, d, J = 8.0 Hz), 6.93 (1H, d, J = 8.5 Hz), 5.30 (2H, s) , 3.95 (3H, s), 3.72 (3H, s), 3.62 (3H, s), 2.16-2.13 (4H, m), 2.12 (3H, s), 1.03-0.98 (2H, m), 0.79-0.75 (2H, m). [53] 1 H-NMR (CDCl 3 ) δ: 7.45-7.41 (2H, m), 7.37 (1H, dd, J = 8.5, 2.3 Hz), 7.27-7 .26 (2H, m), 6.91 (1H, d, J = 8.5 Hz), 5.28 (2H, s), 4.17-4.12 (2H, m), 3.70 (3H) , S), 3.60 (3H, s), 2.14-2.10 (7H, m), 1.41 (3H, t, J = 7.1 Hz), 1.00-0.96 (2H) , M), 0.78-0.75 (2H, m). [54] 1 H-NMR (CDCl 3 ) δ: 7.45-7.40 (2H, m), 7.37 (1H, dd, J = 8.4, 1.7 Hz), 7.28-7 .26 (2H, m), 6.92 (1H, d, J = 8.5 Hz), 5.28 (2H, s), 3.80 (3H, s), 3.60 (3H, s), 2.21 (3H, s), 2.16-2.11 (4H, m), 2.10 (3H, s), 1.01-0.96 (2H, m), 0.78-0. 74 (2H, m). [55] 1 H-NMR (CDCl 3 ) δ: 7.45-7.39 (3H, m), 7.28-7.26 (2H, m), 6.93 (1H, d, J = 8) .5Hz), 5.29 (2H, s), 3.99 (3H, s), 3.61 (3H, s), 2.27 (6H, s), 2.16-2.10 (4H, m), 1.00-0.97 (2H, m), 0.78-0.76 (2H, m). [56] 1 H-NMR (CDCl 3 ) δ: 7.45-7.37 (3H, m), 7.29-7.27 (2H, m), 6.92 (1H, d, J = 8) .4 Hz), 5.28 (2H, s), 3.74 (3H, s), 3.61 (3H, s), 2.16-2.13 (1H, m), 2.11 (3H, s), 2.09 (3H, s), 1.02-0.97 (2H, m), 0.78-0.74 (2H, m). [57] 1 H-NMR (CDCl 3 ) δ: 7.43-7.36 (4H, m), 7.29-7.27 (1H, m), 6.88 (1H, d, J = 8) .4 Hz), 5.06 (2H, s), 3.74 (3H, s), 3.63 (3H, s), 2.51 (3H, s), 2.12 (3H, s), 2 .09 (3H, s). [58] 1 H-NMR (CDCl 3 ) δ: 7.50-7.36 (4H, m), 7.29-7.27 (1 H, m), 6.89 (1 H, d, J = 8) .6 Hz), 5.08 (2H, s), 3.74 (3H, s), 3.59 (3H, s), 2.85 (2H, q, J = 7.6 Hz), 2.11 ( 3H, s), 2.09 (3H, s), 1.28 (3H, t, J = 7.6 Hz). [59] 1 H-NMR (CDCl 3 ) δ: 7.47 (1H, t, J = 8.3 Hz), 7.37 (1H, s), 7.35-7.33 (1H, m), 7.09-7.07 (2H, m), 6.91 (1H, d, J = 8.4 Hz), 5.29 (2H, s), 3.93 (3H, s), 3.73 ( 3H, s), 3.59 (3H, s), 2.08 (3H, s), 2.03 (3H, s). [60] 1 H-NMR (CDCl 3 ) δ: 7.61 (1H, d, J = 2.2 Hz), 7.47-7.42 (2H, m), 7.16 (1H, s), 7.11 (1H, d, J = 8.2 Hz), 7.06 (1H, d, J = 8.5 Hz), 6.96 (1H, d, J = 8.5 Hz), 5.44 (2H , S), 3.94 (3H, s), 3.86 (3H, s), 3.63 (3H, s), 2.17 (3H, d, J = 0.7 Hz). [61] 1 H-NMR (CDCl 3 ) δ: 7.66 (1H, d, J = 2.2 Hz), 7.47 (1H, dd, J = 8.5, 2.2 Hz), 7.42 (1H, d, J = 7.8 Hz), 7.29 (2H, t, J = 8.1 Hz), 7.17 (1H, s), 6.97 (1H, d, J = 8.7 Hz) , 5.43 (2H, s), 3.87 (3H, s), 3.65 (3H, s), 2.19-2.15 (4H, m), 1.04-0.99 (2H) , M), 0.78-0.74 (2H, m). [62] 1 H-NMR (CDCl 3 ) δ: 7.62 (1H, dd, J = 8.4, 2.3 Hz), 7.57 (1H, dd, J = 2.0, 0.7 Hz) 7.45-7.39 (2H, m), 7.29-7.27 (1 H, m), 6.89 (1 H, d, J = 8.4 Hz), 5.07 (2H, s) , 4.11 (3H, s), 3.70 (3H, s), 3.62 (3H, s), 2.51 (3H, s), 2.12 (3H, s). [63] 1 H-NMR (CDCl 3 ) δ: 7.62 (1H, d, J = 8.5 Hz), 7.57 (1H, s), 7.49-7.43 (2H, m), 7.29-7.27 (1H, m), 6.89 (1H, d, J = 8.5 Hz), 5.08 (2H, s), 4.11 (3H, s), 3.70 ( 3H, s), 3.58 (3H, s), 2.84 (2H, q, J = 7.5 Hz), 2.11 (3H, s), 1.27 (3H, t, J = 7. 5 Hz). [64] 1 H-NMR (CDCl 3 ) δ: 7.58 (1H, dd, J = 8.5, 2.3 Hz), 7.53 (1H, d, J = 1.6 Hz), 7.46 (1H, t, J = 8.1 Hz), 7.09-7.06 (2H, m), 6.91 (1H, d, J = 8.7 Hz), 5.29 (2H, s), 4 .10 (3H, s), 3.92 (3H, s), 3.69 (3H, s), 3.58 (3H, s), 2.03 (3H, s). [65] 1 H-NMR (CDCl 3 ) δ: 7.63-7.59 (2H, m), 7.56 (1H, dd, J = 2.2, 0.6 Hz), 7.47 (1H , T, J = 8.0 Hz), 7.40 (1H, dd, J = 8.0, 1.4 Hz), 6.89 (1H, d, J = 8.5H), 5.35 (2H, s), 4.11 (3H, s), 3.70 (3H, s), 3.59 (3H, s), 2.06 (3H, s).
 本発明組成物における本テトラゾリノン化合物の態様としては、例えば以下のものが挙げられる。
 式(1)において、RがC1−C3アルキル基またはハロゲン原子であり、Rが水素原子またはC1−C3アルキル基であり、RがC1−C3アルキル基、C1−C3アルコキシ基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
 式(1)において、RがC1−C3アルキル基またはハロゲン原子であり、Rが水素原子またはC1−C3アルキル基であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
 式(1)において、RがC1−C3アルキル基であり、Rが水素原子またはC1−C3アルキル基であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
 式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
 式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
 式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、Rがハロゲン原子であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
 式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、Rがシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
 式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、Rが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、C1−C3アルコキシ基またはシクロプロピル基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、C1−C2アルキルチオ基またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
 式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物。
As an aspect of this tetrazolinone compound in this invention composition, the following are mentioned, for example.
In Formula (1), R 1 is a C1-C3 alkyl group or a halogen atom, R 2 is a hydrogen atom or a C1-C3 alkyl group, R 3 is a C1-C3 alkyl group, a C1-C3 alkoxy group, a halogen atom An atom or a cyclopropyl group, Z 1 is a C1-C3 alkyl group, Z 2 is a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom or a cyano group, and Z 3 A tetrazolinone compound in which is a hydrogen atom, a C1-C3 alkyl group or a halogen atom.
In formula (1), R 1 is a C1-C3 alkyl group or a halogen atom, R 2 is a hydrogen atom or a C1-C3 alkyl group, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group. And Z 1 is a C1-C3 alkyl group, Z 2 is a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A tetrazolinone compound which is a C3 alkyl group or a halogen atom;
In formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom or a C1-C3 alkyl group, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group, Z 2 is 1 or more halogen atoms optionally C1-C3 may be alkyl groups having a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1-C3 alkyl group Or a tetrazolinone compound which is a halogen atom.
In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group A tetrazolinone compound in which Z 2 is a C1-C3 alkyl group, a halogen atom or a cyano group optionally having one or more halogen atoms, and Z 3 is a C1-C3 alkyl group or a halogen atom.
In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, Z 1 is a C1-C3 alkyl group, and Z 2 is one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom.
In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a halogen atom, Z 1 is a C1-C3 alkyl group, and Z 2 is 1 or more. halogen atom optionally may C1-C3 alkyl group optionally having a halogen atom or a cyano group, tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom.
In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a cyclopropyl group, Z 1 is a C1-C3 alkyl group, and Z 2 is 1 or more. halogen atoms optionally may C1-C3 alkyl group optionally having a halogen atom or a cyano group, tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom.
In formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, and R 3 may have one or more halogen atoms, a C1-C3 alkyl group, a halogen atom, C1 -C3 alkoxy group or a cyclopropyl group, Z 1 is a C1-C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl, halogen atom, a C1-C2 alkylthio group or a cyano group, Z 3 is a hydrogen atom, tetrazolinone compound is C1-C3 alkyl group or a halogen atom.
In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A tetrazolinone compound which is a C3 alkyl group or a halogen atom;
 本発明組成物の態様としては、例えば以下のものが挙げられる。 Examples of the composition of the present invention include the following.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物I~VIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group a group, Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom, A plant disease control composition comprising any one of compounds I to VI.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物Iのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group a group, Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom, A plant disease control composition containing any one of compounds I.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物IIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group a group, Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom, A plant disease control composition containing any one of compounds II.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物IIIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group a group, Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom, A plant disease control composition containing any one of compounds III.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物IVのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group a group, Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom, A plant disease control composition containing any one of compounds IV.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物Vのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group a group, Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom, A plant disease control composition containing any one of the compounds V.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子またはシクロプロピル基であり、ZがC1−C3アルキル基であり、Zが1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、ZがC1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物VIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom or a cyclopropyl group, and Z 1 is a C1-C3 alkyl group a group, Z 2 is 1 or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, a tetrazolinone compound Z 3 is a C1-C3 alkyl group or a halogen atom, A plant disease control composition containing any one of the compounds VI.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物I~VIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds I to VI.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物Iのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom, and any one of compounds I.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物IIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom, and any one of compounds II.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物IIIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds III.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物IVのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds IV.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物Vのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom, and any one of compounds V.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物VIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds VI.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物XXVIII~XXXIIIのいずれか一つとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and any one of compounds XXVIII to XXXIII.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物XXVIIIとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom, and a compound XXVIII.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物XXIXとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXIX.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物XXXとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXX.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物XXXIとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXXI.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物XXXIIとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXXII.
式(1)において、RがC1−C3アルキル基であり、Rが水素原子であり、RがC1−C3アルキル基、ハロゲン原子、またはC1−C3アルコキシ基であり、ZがC1−C3アルキル基であり、ZがC1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子またはシアノ基であり、Zが水素原子、C1−C3アルキル基またはハロゲン原子であるテトラゾリノン化合物と、化合物XXXIIIとを含有する植物病害防除組成物。 In Formula (1), R 1 is a C1-C3 alkyl group, R 2 is a hydrogen atom, R 3 is a C1-C3 alkyl group, a halogen atom, or a C1-C3 alkoxy group, and Z 1 is C1 an -C3 alkyl group, Z 2 is C1-C2 alkoxy group, one or more halogen atoms include C1-C3 may be alkyl group, a halogen atom or a cyano group, Z 3 is a hydrogen atom, C1- A plant disease control composition comprising a tetrazolinone compound which is a C3 alkyl group or a halogen atom and a compound XXXIII.
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Iとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Iとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Iとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IVとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IVとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Vとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Vとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Vとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物VIIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IXとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IXとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物IXとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Xとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Xとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物Xとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIVとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIVとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XVIIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIXとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIXとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XIXとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物とXXIIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物とXXIVとを、0.1:1の割合で含有する植物病害防除組成物
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIVとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXVIIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIXとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIXとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXIXとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIVとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIVとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXVIIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIXとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIXとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXIXとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIIとを、10:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIIIとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIIIとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIIIとを、10:1の割合で含有する植物病害防除組成物;
本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIVとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXIVとを、10:1の割合で含有する植物病害防除組成物;
本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXVとを、0.1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXVとを、1:1の割合で含有する植物病害防除組成物;
 本テトラゾリノン化合物1から本テトラゾリノン化合物65までのいずれか一化合物と化合物XXXXVとを、10:1の割合で含有する植物病害防除組成物;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound I in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound I in a ratio of 1: 1;
A plant disease control composition comprising any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound I in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound II in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound II in a ratio of 1: 1;
A plant disease control composition comprising any one compound from the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound II in a ratio of 10: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound III in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound III in a ratio of 1: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound III in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound IV in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound IV in a ratio of 1: 1;
A plant disease control composition comprising any one compound from the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound IV in a ratio of 10: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound V in a ratio of 0.1: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound V in a ratio of 1: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound V in a ratio of 10: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound VI in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound VI in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound VI in a ratio of 10: 1;
A plant disease control composition containing any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound VII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound VII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound VII in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound VIII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound VIII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound VIII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound IX in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound IX in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound IX in a ratio of 10: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound X in a ratio of 0.1: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound X in a ratio of 1: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound X in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XI in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XI in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XI in a ratio of 10: 1;
A plant disease control composition comprising any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound XII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIV in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIV in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIV in a ratio of 10: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound XV in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XV in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XV in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVI in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVI in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVI in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVII in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVIII in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVIII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XVIII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIX in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIX in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XIX in a ratio of 10: 1;
A plant disease control composition containing any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XX in a ratio of 0.1: 1;
A plant disease control composition containing any one compound from the tetrazolinone compound 1 to the tetrazolinone compound 65 and the compound XX in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XX in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXI in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXI in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXI in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXII in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and XXIII in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXIII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXIII in a ratio of 10: 1;
Plant disease control composition containing any one compound from the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and XXIV in a ratio of 0.1: 1 Any one compound from the present tetrazolinone compound 1 to the present tetrazolinone compound 65 And a compound XXIV in a ratio of 1: 1 plant disease control composition;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXIV in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXV in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXV in a ratio of 1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXV in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVI in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVI in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVI in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVII in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVIII in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVIII in a ratio of 1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXVIII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXIX in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXIX in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXIX in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXX in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXX in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXX in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXI in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXI in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXI in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXII in a ratio of 1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIV in a ratio of 0.1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIV in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIV in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXV in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXV in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXV in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVI in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVI in a ratio of 1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVI in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVIII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVIII in a ratio of 1: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXVIII in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIX in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIX in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXIX in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXX in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXX in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXX in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXI in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXI in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXI in a ratio of 10: 1;
A plant disease control composition comprising any one of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXIII in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXIII in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXIII in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXIV in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound from the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and the compound XXXXIV in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXIV in a ratio of 10: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXV in a ratio of 0.1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXV in a ratio of 1: 1;
A plant disease control composition comprising any one compound of the present tetrazolinone compound 1 to the present tetrazolinone compound 65 and compound XXXXV in a ratio of 10: 1;
 次に製剤例を示す。なお、部は重量部を表す。 Next, formulation examples are shown. In addition, a part represents a weight part.
製剤例1
 前記本発明組成物のいずれか1組成物50部、リグニンスルホン酸カルシウム3部、ラウリル硫酸マグネシウム2部及び合成含水酸化珪素45部をよく粉砕混合することにより、製剤を得る。
Formulation Example 1
A composition is obtained by thoroughly pulverizing and mixing 50 parts of any one of the compositions of the present invention, 3 parts of calcium lignin sulfonate, 2 parts of magnesium lauryl sulfate and 45 parts of synthetic silicon hydroxide.
製剤例2
 前記本発明組成物のいずれか1組成物20部とソルビタントリオレエ−ト1.5部とを、ポリビニルアルコ−ル2部を含む水溶液28.5部と混合し、湿式粉砕法で微粉砕した後、この中に、キサンタンガム0.05部及びアルミニウムマグネシウムシリケ−ト0.1部を含む水溶液40部を加え、さらにプロピレングリコ−ル10部を加えて攪拌混合し、製剤を得る。
Formulation Example 2
20 parts of any one of the compositions of the present invention and 1.5 parts of sorbitan trioleate were mixed with 28.5 parts of an aqueous solution containing 2 parts of polyvinyl alcohol, and pulverized by a wet pulverization method. Thereafter, 40 parts of an aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added thereto, and further 10 parts of propylene glycol is added and stirred to obtain a preparation.
製剤例3
 前記本発明組成物のいずれか1組成物2部、カオリンクレ−88部及びタルク10部をよく粉砕混合することにより、製剤を得る。
Formulation Example 3
A preparation is obtained by thoroughly pulverizing and mixing 2 parts of any one of the compositions of the present invention, 88 parts of kaolin clay and 10 parts of talc.
製剤例4
 前記本発明組成物のいずれか1組成物5部、ポリオキシエチレンスチリルフェニルエ−テル14部、ドデシルベンゼンスルホン酸カルシウム6部及びキシレン75部をよく混合することにより、製剤を得る。
Formulation Example 4
A formulation is obtained by thoroughly mixing 5 parts of any one of the compositions of the present invention, 14 parts of polyoxyethylene styrylphenyl ether, 6 parts of calcium dodecylbenzenesulfonate and 75 parts of xylene.
製剤例5
 前記本発明組成物のいずれか1組成物2部、合成含水酸化珪素1部、リグニンスルホン酸カルシウム2部、ベントナイト30部及びカオリンクレ−65部をよく粉砕混合した後、水を加えてよく練り合せ、造粒乾燥することにより、製剤を得る。
Formulation Example 5
Any one of the compositions of the present invention, 2 parts of composition, 1 part of synthetic hydrous silicon oxide, 2 parts of calcium lignin sulfonate, 30 parts of bentonite and 65 parts of kaolin clay are mixed and mixed well with water. The formulation is obtained by granulating and drying.
製剤例6
 前記本発明組成物のいずれか1組成物10部;ポリオキシエチレンアルキルエ−テルサルフェ−トアンモニウム塩50部を含むホワイトカ−ボン35部;及び水55部を混合し、湿式粉砕法で微粉砕することにより、製剤を得る。
Formulation Example 6
10 parts of any one of the compositions of the present invention; 35 parts of white carbon containing 50 parts of polyoxyethylene alkyl ether sulfate ammonium salt; and 55 parts of water are mixed and finely pulverized by a wet pulverization method. By doing so, a formulation is obtained.
 次に、本発明組成物が植物病害の防除に有用であることを試験例で示す。各試験での「効力」とは以下の式1で表される値を意味し、その数値によって[表5]のようにランク付けする。
「式1」
 効力=100×(X−Y)/X
X:無処理区の菌の生育度
Y:処理区の菌の生育度
Next, test examples show that the composition of the present invention is useful for controlling plant diseases. “Efficacy” in each test means a value represented by the following formula 1, and is ranked as shown in [Table 5] according to the numerical value.
"Formula 1"
Efficacy = 100 × (XY) / X
X: Growth rate of untreated bacteria Y: Growth of treated bacteria
Figure JPOXMLDOC01-appb-T000121
Figure JPOXMLDOC01-appb-T000121
試験例1 コムギ葉枯病菌(Septoria tritici)に対する防除試験
 それぞれDMSO(ジメチルスルホキシド)に所定濃度で希釈した供試化合物をタイタープレート(96ウェル)に1μl分注したのち、あらかじめコムギ葉枯病菌の分生胞子を接種したジャガイモ煎汁液体培地(PDB培地)を150μl分注した。このプレートを4日間、18℃で培養してコムギ葉枯病菌を増殖させたのち、タイタープレートの各ウェルの550nmの吸光度にて、コムギ葉枯病菌の生育度を測定した。その生育度をもとに、「式1」を用い効力を算出し、[表5]に従ってランク付けした。
その結果を[表6]から[表27]に示す。
Test Example 1 Control Trial against Wheat Leaf Blight Fungus (Septoria tritici) Each test compound diluted in DMSO (dimethyl sulfoxide) at a predetermined concentration was dispensed into a titer plate (96 well), and then the wheat leaf blight fungus was separated in advance. 150 μl of potato broth liquid medium (PDB medium) inoculated with live spores was dispensed. The plate was cultured at 18 ° C. for 4 days to grow wheat leaf blight fungi, and then the growth degree of wheat leaf blight fungi was measured by absorbance at 550 nm in each well of the titer plate. Based on the degree of growth, the efficacy was calculated using “Formula 1” and ranked according to [Table 5].
The results are shown in [Table 6] to [Table 27].
Figure JPOXMLDOC01-appb-T000122
Figure JPOXMLDOC01-appb-T000122
Figure JPOXMLDOC01-appb-T000123
Figure JPOXMLDOC01-appb-T000123
Figure JPOXMLDOC01-appb-T000124
Figure JPOXMLDOC01-appb-T000124
Figure JPOXMLDOC01-appb-T000125
Figure JPOXMLDOC01-appb-T000125
Figure JPOXMLDOC01-appb-T000126
Figure JPOXMLDOC01-appb-T000126
Figure JPOXMLDOC01-appb-T000127
Figure JPOXMLDOC01-appb-T000127
Figure JPOXMLDOC01-appb-T000128
Figure JPOXMLDOC01-appb-T000128
Figure JPOXMLDOC01-appb-T000129
Figure JPOXMLDOC01-appb-T000129
Figure JPOXMLDOC01-appb-T000130
Figure JPOXMLDOC01-appb-T000130
Figure JPOXMLDOC01-appb-T000131
Figure JPOXMLDOC01-appb-T000131
Figure JPOXMLDOC01-appb-T000132
Figure JPOXMLDOC01-appb-T000132
Figure JPOXMLDOC01-appb-T000133
Figure JPOXMLDOC01-appb-T000133
Figure JPOXMLDOC01-appb-T000134
Figure JPOXMLDOC01-appb-T000134
Figure JPOXMLDOC01-appb-T000135
Figure JPOXMLDOC01-appb-T000135
Figure JPOXMLDOC01-appb-T000136
Figure JPOXMLDOC01-appb-T000136
Figure JPOXMLDOC01-appb-T000137
Figure JPOXMLDOC01-appb-T000137
Figure JPOXMLDOC01-appb-T000138
Figure JPOXMLDOC01-appb-T000138
Figure JPOXMLDOC01-appb-T000139
Figure JPOXMLDOC01-appb-T000139
Figure JPOXMLDOC01-appb-T000140
Figure JPOXMLDOC01-appb-T000140
Figure JPOXMLDOC01-appb-T000141
Figure JPOXMLDOC01-appb-T000141
Figure JPOXMLDOC01-appb-T000142
Figure JPOXMLDOC01-appb-T000142
Figure JPOXMLDOC01-appb-T000143
試験例2
 プラスチックポットに土壌を詰め、コムギ(品種;シロガネ)を播種し、温室内で14日間生育させる。供試化合物を製剤例に準じて製剤とした後、水で希釈し所定濃度にし、該希釈液を上記コムギの葉面に充分に付着するように散布する。散布後植物を風乾し、2日後にコムギ葉枯病菌(Mycosphaerella graminicola)の分生胞子の水懸濁液(約1,000,000個/ml)を噴霧接種する。接種後はじめは18℃多湿下に3日間置き、多湿下から出して18℃恒温室にて14日間栽培する(これを処理区とする。)。その後、コムギ葉枯病の病斑面積を調査する。
一方、供試化合物の希釈液を茎葉散布しない以外は処理区と同様にコムギを栽培する(これを無処理区とする。)。その後、処理区と同様にコムギ葉枯病の病斑面積を調査する。
その結果、本テトラゾリノン化合物と本殺菌活性化合物とを含有する病害防除組成物を処理したコムギの病斑面積は無処理区の病斑面積と比較し顕著な低減が認められる。
試験例3
 プラスチックポットに土壌を詰め、ダイズ(品種;黒千石)を播種し、温室内で14日間生育させる。供試化合物を製剤例に準じて製剤とした後、水で希釈し所定濃度にし、該希釈液を上記ダイスの葉面に充分に付着するように散布する。散布後植物を風乾し、2日後にダイズさび病菌(Phakopsora pachyrhizi)の夏胞子の水懸濁液(約10,000個/ml)を噴霧接種する。接種後はじめは23℃多湿下に1日間置き、多湿下から出して23℃温室にて10日間栽培する(これを処理区とする。)。その後、ダイズさび病の病斑面積を調査する。
一方、供試化合物の希釈液を茎葉散布しない以外は処理区と同様にダイズを栽培する(これを無処理区とする。)。その後、処理区と同様にダイズさび病の病斑面積を調査する。
その結果、本テトラゾリノン化合物と本殺菌活性化合物とを含有する病害防除組成物を処理したダイズの病斑面積は無処理区の病斑面積と比較し顕著な低減が認められる。
 本発明によれば、植物病害を防除することができる。
Figure JPOXMLDOC01-appb-T000143
Test example 2
A plastic pot is filled with soil, seeded with wheat (variety: Shirogane), and grown in a greenhouse for 14 days. The test compound is made into a preparation according to the preparation example, then diluted with water to a predetermined concentration, and the diluted solution is sprayed so as to adhere sufficiently to the leaf surface of the wheat. After spraying, the plants are air-dried, and after 2 days, spray-inoculated with an aqueous suspension (about 1,000,000 cells / ml) of conidia of wheat leaf blight fungus (Mycosphaerella graminicola). At first, after inoculation, place under high humidity at 18 ° C. for 3 days, take out from high humidity and cultivate in a constant temperature room at 18 ° C. for 14 days. Then, the lesion area of wheat leaf blight is investigated.
On the other hand, wheat is cultivated in the same manner as the treated area except that the diluted solution of the test compound is not sprayed on the foliage (this is referred to as an untreated area). After that, the lesion area of wheat leaf blight is investigated as in the treatment area.
As a result, a marked decrease in the lesion area of wheat treated with the disease control composition containing the present tetrazolinone compound and the present bactericidal active compound is recognized as compared with the lesion area in the untreated area.
Test example 3
The plastic pot is filled with soil, soybean (variety: Kurosengoku) is sown and grown in a greenhouse for 14 days. The test compound is made into a preparation according to the preparation example, then diluted with water to a predetermined concentration, and the diluted solution is sprayed so as to sufficiently adhere to the leaf surface of the die. After spraying, the plants are air-dried, and after 2 days, spray-inoculated with an aqueous suspension (about 10,000 / ml) of a summer spore of soybean rust fungus (Phakopsora pachyrhizi). First, after inoculation, place under high humidity at 23 ° C. for 1 day, take out from high humidity and cultivate in a 23 ° C. greenhouse for 10 days (this will be treated). Thereafter, the lesion area of soybean rust is investigated.
On the other hand, soybeans are cultivated in the same manner as the treated group except that the diluted solution of the test compound is not sprayed on the foliage (this is referred to as the untreated group). Then, the lesion area of soybean rust is investigated as in the treatment area.
As a result, the lesion area of soybean treated with the disease control composition containing the present tetrazolinone compound and the present bactericidal active compound is remarkably reduced as compared with the lesion area in the untreated area.
According to the present invention, plant diseases can be controlled.
 本発明の組成物は、植物病害に対して優れた防除効果を示すことから、植物病害防除剤として利用することができる。。 Since the composition of the present invention exhibits an excellent control effect against plant diseases, it can be used as a plant disease control agent. .

Claims (6)

  1. 式(1)
    Figure JPOXMLDOC01-appb-I000001
    〔式中、
    は、1以上のハロゲン原子を有していてもよいC1−C3アルキル基またはハロゲン原子を表し、
    は、水素原子、ハロゲン原子またはC1−C3アルキル基を表し、
    は、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、シクロプロピル基、または1以上のハロゲン原子を有していてもよいC1−C3アルコキシ基を表し、
    は、C1−C3アルキル基を表し、
    は、水素原子、C1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、C1−C2アルキルチオ基またはシアノ基を表し、
    は、水素原子、C1−C3アルキル基またはハロゲン原子を表す。〕
    で示されるテトラゾリノン化合物と、
    群(A)より選ばれる1種以上の殺菌活性化合物とを含有する植物病害防除組成物。
     群(A):
     プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、トリアジメノール(triadimenol)、プロクロラズ(prochloraz)、ペンコナゾール(penconazole)、テブコナゾール(tebuconazole)、フルシラゾール(flusilazole)、ジニコナゾール(diniconazole)、ブロムコナゾール(bromuconazole)、エポキシコナゾール(epoxiconazole)、ジフェノコナゾール(difenoconazole)、シプロコナゾール(cyproconazole)、メトコナゾール(metconazole)、トリフルミゾール(triflumizole)、テトラコナゾール(tetraconazole)、マイクロブタニル(myclobutanil)、フェンブコナゾール(fenbuconazole)、ヘキサコナゾール(hexaconazole)、フルキンコナゾール(fluquinconazole)、トリティコナゾール(triticonazole)、ビテルタノール(bitertanol)、イマザリル(imazalil)、イプコナゾール(ipconazole)、シメコナゾール(simeconazole)、ヒメキサゾール(hymexazol)、エトリディアゾール(etridiazole)、フルトリアホール(flutriafol)、ビキサフェン(bixafen)、ベンゾビンジフルピル(benzovindiflupyr)、フルキサピロキサド(fluxapyroxad)、ペンチオピラド(penthiopyrad)、N−(1,1,3−トリメチルインダン−4−イル)−1−メチル−3−ジフルオロメチルピラゾール−4−カルボン酸アミド、
    下記式(b)で表される化合物、
    Figure JPOXMLDOC01-appb-I000002
    イソフェタミド(isofetamid)、イソピラザム(isopyrazam)、ボスカリド(boscalid)、フルオピラム(fluopyram)、セダキサン(sedaxane)、ペンフルフェン(penflufen)、フルトラニル(flutolanil)、メプロニル(mepronil)、カルボキシン(carboxin)、チフルザミド(thifluxamide)及びフラメトピル(furametpyr)からなる群。
    Formula (1)
    Figure JPOXMLDOC01-appb-I000001
    [Where,
    R 1 represents a C1-C3 alkyl group which may have one or more halogen atoms or a halogen atom,
    R 2 represents a hydrogen atom, a halogen atom or a C1-C3 alkyl group,
    R 3 represents a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a cyclopropyl group, or a C1-C3 alkoxy group optionally having one or more halogen atoms;
    Z 1 represents a C1-C3 alkyl group,
    Z 2 represents a hydrogen atom, a C1-C2 alkoxy group, a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a C1-C2 alkylthio group, or a cyano group,
    Z 3 represents a hydrogen atom, a C1-C3 alkyl group or a halogen atom. ]
    A tetrazolinone compound represented by:
    A plant disease control composition comprising one or more fungicidal active compounds selected from the group (A).
    Group (A):
    Propiconazole, Prothioconazole, Triadimenol, Prochloraz, Penconazole, Dibuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole bromconazole, epoxiconazole, difenoconazole, cyproconazole, metconazole, triflumizole, triflumizole aconazole, microbutanil, fenbuconazole, hexaconazole, fluquinconazole, triticonazole, tertanol, tertanol. ipconazole), simeconazole, hymexazole, etridiazole, flutriafol, bixafen, benzobindiflufirfulx Xapyroxad), penthiopyrad (penthiopyrad), N- (1,1,3- trimethyl indane-4-yl) -1-methyl-3-difluoromethyl-4-carboxylic acid amide,
    A compound represented by the following formula (b):
    Figure JPOXMLDOC01-appb-I000002
    Isofetamid, isopyrazam, boscalid, fluopyram, sedaxane, penflufen, fluthranil, flutronil, mepronil And furametopyr.
  2. テトラゾリノン化合物と殺菌活性化合物との重量比が、テトラゾリノン化合物/殺菌活性化合物=0.1/1~10/1である請求項1記載の植物病害防除組成物。 The plant disease control composition according to claim 1, wherein the weight ratio of the tetrazolinone compound to the bactericidal active compound is tetrazolinone compound / bactericidal active compound = 0.1 / 1 to 10/1.
  3. 式(1)
    Figure JPOXMLDOC01-appb-I000003
    〔式中、
    は、1以上のハロゲン原子を有していてもよいC1−C3アルキル基またはハロゲン原子を表し、
    は、水素原子、ハロゲン原子またはC1−C3アルキル基を表し、
    は、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、シクロプロピル基、または1以上のハロゲン原子を有していてもよいC1−C3アルコキシ基を表し、
    は、C1−C3アルキル基を表し、
    は、水素原子、C1−C2アルコキシ基、1以上のハロゲン原子を有していてもよいC1−C3アルキル基、ハロゲン原子、C1−C2アルキルチオ基またはシアノ基を表し、
    は、水素原子、C1−C3アルキル基またはハロゲン原子を表す。〕
    で示されるテトラゾリノン化合物と、群(A)より選ばれる1種以上の殺菌活性化合物との有効量を、植物又は植物を栽培する土壌に処理する工程を含む植物病害防除方法。
     群(A):
     プロピコナゾール(propiconazole)、プロチオコナゾール(prothioconazole)、トリアジメノール(triadimenol)、プロクロラズ(prochloraz)、ペンコナゾール(penconazole)、テブコナゾール(tebuconazole)、フルシラゾール(flusilazole)、ジニコナゾール(diniconazole)、ブロムコナゾール(bromuconazole)、エポキシコナゾール(epoxiconazole)、ジフェノコナゾール(difenoconazole)、シプロコナゾール(cyproconazole)、メトコナゾール(metconazole)、トリフルミゾール(triflumizole)、テトラコナゾール(tetraconazole)、マイクロブタニル(myclobutanil)、フェンブコナゾール(fenbuconazole)、ヘキサコナゾール(hexaconazole)、フルキンコナゾール(fluquinconazole)、トリティコナゾール(triticonazole)、ビテルタノール(bitertanol)、イマザリル(imazalil)、イプコナゾール(ipconazole)、シメコナゾール(simeconazole)、ヒメキサゾール(hymexazol)、エトリディアゾール(etridiazole)、フルトリアホール(flutriafol)、ビキサフェン(bixafen)、ベンゾビンジフルピル(benzovindiflupyr)、フルキサピロキサド(fluxapyroxad)、ペンチオピラド(penthiopyrad)、N−(1,1,3−トリメチルインダン−4−イル)−1−メチル−3−ジフルオロメチルピラゾール−4−カルボン酸アミド、
    下記式(b)で表される化合物、
    Figure JPOXMLDOC01-appb-I000004
    イソフェタミド(isofetamid)、イソピラザム(isopyrazam)、ボスカリド(boscalid)、フルオピラム(fluopyram)、セダキサン(sedaxane)、ペンフルフェン(penflufen)、フルトラニル(flutolanil)、メプロニル(mepronil)、カルボキシン(carboxin)、チフルザミド(thifluxamide)及びフラメトピル(furametpyr)からなる群。
    Formula (1)
    Figure JPOXMLDOC01-appb-I000003
    [Where,
    R 1 represents a C1-C3 alkyl group which may have one or more halogen atoms or a halogen atom,
    R 2 represents a hydrogen atom, a halogen atom or a C1-C3 alkyl group,
    R 3 represents a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a cyclopropyl group, or a C1-C3 alkoxy group optionally having one or more halogen atoms;
    Z 1 represents a C1-C3 alkyl group,
    Z 2 represents a hydrogen atom, a C1-C2 alkoxy group, a C1-C3 alkyl group optionally having one or more halogen atoms, a halogen atom, a C1-C2 alkylthio group, or a cyano group,
    Z 3 represents a hydrogen atom, a C1-C3 alkyl group or a halogen atom. ]
    The plant disease control method including the process of processing the effective amount of the tetrazolinone compound shown by 1 and the 1 or more types of fungicidal active compound chosen from a group (A) to the soil which grows a plant or a plant.
    Group (A):
    Propiconazole, Prothioconazole, Triadimenol, Prochloraz, Penconazole, Dibuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole, Tebuconazole bromconazole, epoxiconazole, difenoconazole, cyproconazole, metconazole, triflumizole, triflumizole aconazole, microbutanil, fenbuconazole, hexaconazole, fluquinconazole, triticonazole, tertanol, tertanol. ipconazole), simeconazole, hymexazole, etridiazole, flutriafol, bixafen, benzobindiflufirfulx Xapyroxad), penthiopyrad (penthiopyrad), N- (1,1,3- trimethyl indane-4-yl) -1-methyl-3-difluoromethyl-4-carboxylic acid amide,
    A compound represented by the following formula (b):
    Figure JPOXMLDOC01-appb-I000004
    Isofetamid, isopyrazam, boscalid, fluopyram, sedaxane, penflufen, fluthranil, flutronil, mepronil And furametopyr.
  4. テトラゾリノン化合物と殺菌活性化合物との重量比が、テトラゾリノン化合物/殺菌活性化合物=0.1/1~10/1である請求項3記載の植物病害防除方法。 The method for controlling plant diseases according to claim 3, wherein the weight ratio of the tetrazolinone compound to the bactericidal active compound is tetrazolinone compound / bactericidal active compound = 0.1 / 1 to 10/1.
  5. 植物又は植物を栽培する土壌が、コムギ又はコムギを栽培する土壌である請求項3記載の植物病害防除方法。 The plant disease control method according to claim 3, wherein the plant or the soil in which the plant is cultivated is wheat or soil in which the wheat is cultivated.
  6. 植物又は植物を栽培する土壌が、コムギ又はコムギを栽培する土壌である請求項4記載の植物病害防除方法。 The plant disease control method according to claim 4, wherein the plant or the soil in which the plant is cultivated is wheat or soil in which the wheat is cultivated.
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