WO2015029643A1 - Coloring photosensitive resin composition, cured film, color filter, method for producing color filter, solid-state imaging element and image display device - Google Patents

Coloring photosensitive resin composition, cured film, color filter, method for producing color filter, solid-state imaging element and image display device Download PDF

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Publication number
WO2015029643A1
WO2015029643A1 PCT/JP2014/069234 JP2014069234W WO2015029643A1 WO 2015029643 A1 WO2015029643 A1 WO 2015029643A1 JP 2014069234 W JP2014069234 W JP 2014069234W WO 2015029643 A1 WO2015029643 A1 WO 2015029643A1
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group
pigment
carbon atoms
substituent
general formula
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PCT/JP2014/069234
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French (fr)
Japanese (ja)
Inventor
和也 尾田
陽樹 稲部
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富士フイルム株式会社
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Priority to KR1020177033705A priority Critical patent/KR101943339B1/en
Priority to KR1020167001753A priority patent/KR20160022900A/en
Publication of WO2015029643A1 publication Critical patent/WO2015029643A1/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B1/00Dyes with anthracene nucleus not condensed with any other ring
    • C09B1/16Amino-anthraquinones
    • C09B1/20Preparation from starting materials already containing the anthracene nucleus
    • C09B1/206Dyes with amino groups substituted by heterocyclic radicals
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B25/00Quinophthalones
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B29/00Monoazo dyes prepared by diazotising and coupling
    • C09B29/32Monoazo dyes prepared by diazotising and coupling from coupling components containing a reactive methylene group
    • C09B29/33Aceto- or benzoylacetylarylides
    • C09B29/335Aceto- or benzoylacetylarylides free of acid groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B48/00Quinacridones
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present invention relates to a colored photosensitive resin composition suitable for producing a color filter used for a liquid crystal display element (LCD), a solid-state imaging element (CCD, CMOS, etc.), and a colored region produced by the composition.
  • the present invention relates to a color filter having a color filter, a solid-state imaging device having the color filter, and an image display device such as an organic LED liquid crystal display device.
  • Patent Documents 1 and 2 describe red colored photosensitive resin compositions having a plurality of dye carriers (pigments), for example, as colored photosensitive resin compositions used in color filters.
  • JP 2010-61150 A Patent No. 5210286
  • JP 2005-181384 A Patent No. 4538220
  • the present invention solves such a problem, and even if it contains a plurality of pigments, the spectral variation of the spectrum is small, and the colored photosensitive resin composition is excellent in the resolution of fine patterns, and the colored photosensitive resin composition
  • the present invention relates to a cured film, a color filter, a manufacturing method of a color filter, a solid-state imaging device, and an image display device using an object.
  • the present inventors have found that the above problem can be solved by using a predetermined resin having a weight average molecular weight of 38000 or less.
  • the above problem has been solved by the following means ⁇ 1>, preferably ⁇ 2> to ⁇ 17>.
  • Colored photosensitivity containing (A) pigment, (B) pigment, and (C) a resin containing an acid group and having a weight average molecular weight of 38000 or less, (D) a pigment dispersant, and (E) a pigment derivative.
  • the pigment is at least one selected from a red pigment and an orange pigment, and (A) the mass ratio of the red pigment to the pigment (red pigment / (A) pigment) is It is 0.3 or more, and the (B) pigment comprises at least one selected from a green pigment, a blue pigment and a black pigment, and the mass ratio of the (B) pigment to the total pigment contained in the colored photosensitive resin composition A colored photosensitive resin composition, wherein ((B) pigment / total pigment) is 0.005 to 0.25.
  • a pigment dispersant is (D-1) a polymer (POH) having a hydroxyl group at at least one terminal or a polymer (PNH 2 ) having a primary amino group at at least one terminal; A carboxylic acid-based dispersant obtained by reacting a tricarboxylic acid anhydride or a tetracarboxylic dianhydride; (D-2) a phosphoric acid-based dispersant represented by the following general formula (3); (D-3) At least one selected from a copolymer containing a structural unit represented by any one of the general formula (1) and the following general formula (2), and (D-4) a graft copolymer containing a nitrogen atom in the main chain
  • R 3 represents a polyester structure having a number average molecular weight of 400 to 30,000, and y represents 1 or 2. When y is 2, a plurality of R 3 may be the same. May be different.
  • R 1 to R 6 each represents a hydrogen atom or a monovalent organic group
  • X 1 and X 2 represent —CO—
  • L 1 and L 2 each represent a single bond or a divalent organic linking group
  • a 1 and A 2 Each represents a monovalent organic group
  • m and n each represents an integer of 2 to 8, and p and q each represents an integer of 1 to 100.
  • the pigment derivative is at least one of a pigment derivative represented by the general formula (I), a pigment derivative represented by the general formula (II), and a pigment derivative represented by the general formula (III)
  • Dye represents an n-valent organic dye residue
  • X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 — or —CH 2 NHCOCH 2 NH—Y 2.
  • Y 2 represents an optionally substituted alkylene group or arylene group
  • Y 1 represents —NH— or —O—
  • Z represents a hydroxyl group when n represents 1.
  • each represents a hydroxyl group, an alkoxy group, or a group represented by the following general formula (I-1)
  • R 1 and R 2 each represents an alkyl group which may have a substituent, optionally R 1 and R 2 are bonded to each other to form a heterocyclic ring containing a nitrogen atom .m is an integer of 1-6, If .n represents an integer of 1 to 4 is 2 or more, plural X, Y 1, R 1, and R 2, respectively, may be the same or may be different.
  • Y 3 represents —NH— or —O—.
  • R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 May be bonded to each other to form a heterocyclic ring containing a nitrogen atom, and m represents an integer of 1 to 6.
  • Dye represents an optionally substituted quinophthalone residue
  • X 1 represents —NR′SO 2 —, —SO 2 NR′—, —CONR′—, —CH 2 NR′COCH 2 NR′— or —NR′CO—
  • X 2 may have a substituent, an arylene group having 6 to 20 carbon atoms, or a substituent Represents a heteroaromatic group having 4 to 20 carbon atoms, and these groups are bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO—.
  • X 3 represents —NR′— or —O—
  • R ′ represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or a substituent.
  • R 8 represents an optionally substituted nitrogen-containing heterocyclic residue
  • R 9 , R 10 and R 11 are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or Represents an aryl group having 6 to 20 carbon atoms which may have a substituent
  • n represents an integer of 0 to 20.
  • a and B is represented by the following general formula (II-1). is the group, the group represented by the following general formula (II-2), -O- ( CH 2) n-R 8, is -OR 9 or -NR 10 R 11, t is 1 to 3 If .t represents an integer of 2 or more, a plurality of X 1, X 2, X 3 , A, and B may be the same or different.)
  • Y 1 represents —NR′— or —O—
  • Y 2 represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, or a substituent.
  • An alkenylene group having 2 to 20 carbon atoms which may be substituted, or an arylene group having 6 to 20 carbon atoms which may have a substituent, and these groups are represented by —NR′—, —O— , —SO 2 —, and —CO— may be bonded to each other through a divalent linking group, R ′ is a hydrogen atom, and may have a substituent and has 1 to 20 carbon atoms.
  • R 1 and R 2 represent an alkyl group, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.
  • Z 1 is a single bond connecting the triazine ring and the nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ′′ —, —NR ′.
  • G is an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or a substituent Represents an arylene group having 6 to 20 carbon atoms which may have a group, and R ′ and R ′′ each represents a hydrogen atom and an alkyl group having 1 to 20 carbon atoms which may have a substituent.
  • R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent.
  • alkyl group of R 7 is - 1 carbon atoms, which may have a substituent group 20, Alternatively, it represents an alkenyl group having 2 to 20 carbon atoms which may have a substituent.
  • A represents a component capable of forming an azo pigment together with XY.
  • X represents a single bond or a group selected from divalent linking groups in the following group A.
  • Y represents a group represented by the following general formula (III-2).
  • A represents 1 or 2.
  • the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 6> comprising at least one selected from Pigment Orange 71.
  • the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 7> further comprising a polymerizable compound having four or more polymerizable groups.
  • the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 8> further comprising a fluorine-based surfactant.
  • ⁇ 11> The colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 10>, further comprising a yellow pigment.
  • ⁇ 12> The colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 11>, which is used for forming a colored region of a color filter.
  • ⁇ 13> A cured film obtained by curing the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 12>.
  • ⁇ 14> a step of applying the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 12> on a support to form a colored photosensitive resin composition layer; and a colored photosensitive resin composition layer
  • a method for producing a color filter which comprises a step of exposing the substrate to a pattern and a step of developing and removing unexposed portions to form a colored pattern.
  • ⁇ 15> A step of applying the colored photosensitive resin composition according to any one of ⁇ 1> to ⁇ 12> on a support to form a colored photosensitive resin composition layer and curing to form a colored layer Including a step of forming a photoresist layer on the colored layer, a step of patterning the photoresist layer by exposure and development to obtain a resist pattern, and a step of dry etching the colored layer using the resist pattern as an etching mask A method for manufacturing a filter.
  • ⁇ 16> A color filter having the cured film according to ⁇ 13>, or a color filter manufactured by the method for manufacturing a color filter according to ⁇ 14> or ⁇ 15>.
  • ⁇ 17> A solid-state imaging device or an image display device having the color filter according to ⁇ 16>.
  • a colored photosensitive resin composition excellent in spectral variability and fine pattern resolution, a cured film, a color filter, a method for producing a color filter, a solid using the colored photosensitive resin composition, a solid An image sensor and an image display device can be provided.
  • the total solid content means the total mass of components excluding the solvent from the total composition of the colored photosensitive resin composition.
  • the description which does not describe substitution and unsubstituted includes the thing which has a substituent with the thing which does not have a substituent.
  • the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • “radiation” in the present specification means, for example, an emission line spectrum of a mercury lamp, far ultraviolet rays represented by excimer laser, extreme ultraviolet rays (EUV light), X-rays, electron beams, and the like. In the present specification, light means actinic rays or radiation.
  • exposure in this specification is not only exposure with far-ultraviolet rays such as mercury lamps and excimer lasers, X-rays, EUV light, but also drawing with particle beams such as electron beams and ion beams. Are also included in the exposure.
  • (meth) acrylate represents both and / or acrylate and methacrylate
  • (meth) acryl represents both and / or acryl and “(meth) acrylic”
  • "Acryloyl” represents both and / or acryloyl and methacryloyl.
  • “monomer” and “monomer” are synonymous.
  • the monomer in this specification is distinguished from an oligomer and a polymer, and refers to a compound having a weight average molecular weight of 2,000 or less.
  • the polymerizable compound means a compound having a polymerizable functional group, and may be a monomer or a polymer.
  • the polymerizable functional group refers to a group that participates in a polymerization reaction.
  • a weight average molecular weight and a number average molecular weight are defined as a polystyrene conversion value by GPC measurement.
  • the weight average molecular weight (Mw) and the number average molecular weight (Mn) are, for example, HLC-8220 (manufactured by Tosoh Corporation), and TSKgel Super AWM-H (manufactured by Tosoh Corporation, 6) as a column.
  • 0.0 mm ID ⁇ 15.0 cm) can be determined by using a 10 mmol / L lithium bromide NMP (N-methylpyrrolidinone) solution as the eluent.
  • Me in the chemical formula represents a methyl group
  • Et represents an ethyl group
  • Pr represents a propyl group
  • Bu represents a butyl group
  • Ph represents a phenyl group
  • process is not limited to an independent process, and is included in the term if the intended action of the process is achieved even when it cannot be clearly distinguished from other processes. .
  • the colored photosensitive resin composition of the present invention (hereinafter sometimes simply referred to as “the composition of the present invention”) is an (A) pigment, (B) pigment, and (C) an acid group having a weight average molecular weight of 38000 or less.
  • a colored photosensitive resin composition comprising: (D) a pigment dispersant, and (E) a pigment derivative, wherein (A) the pigment comprises at least one selected from a red pigment and an orange pigment And (A) the mass ratio of the red pigment to the pigment (red pigment / (A) pigment) is 0.3 or more, and (B) the pigment is at least one selected from a green pigment, a blue pigment and a black pigment It consists of seeds, and the mass ratio of (B) pigment to all pigments contained in the composition ((B) pigment / total pigment) is 0.005 to 0.25.
  • the transmitted light can be controlled by adding at least one (B) pigment selected from a green pigment, a blue pigment and a black pigment to the (A) pigment containing the red pigment as an essential component.
  • the added (B) pigment was aggregated and the spectrum was changed.
  • this subject could be solved by using resin whose weight average molecular weight is 38000 or less as (C) resin.
  • C resin whose weight average molecular weight is 38000 or less as (C) resin.
  • a litho residue could also be reduced.
  • the composition of this invention it turned out that the one where the pigment density
  • the composition of the present invention will be described in detail.
  • the (A) pigment in the present invention comprises at least one selected from a red pigment and an orange pigment, and the mass ratio of the red pigment to the (A) pigment (red pigment / (A) pigment) is 0.3 or more. It is. That is, a red pigment may be included as an essential component, and an orange pigment may be further included.
  • the mass ratio of the red pigment to the pigment (red pigment / (A) pigment) is preferably 0.4 or more, and more preferably 0.44 or more.
  • various conventionally known red pigments can be used.
  • the red pigment preferably has a high transmittance.
  • red pigments monoazo lake pigments, disazo pigments, naphthol pigments, naphthol lake pigments, pyrazolone pigments, BONA lake pigments, xanthene lake pigments, thioindigo pigments, perylene pigments, condensed azo pigments, anthraquinone lake pigments, benzimidazo Ron pigments, quinacridone pigments, diketopyrrolopyrrole pigments, azomethine metal complex pigments and the like.
  • Specific examples include C.I. I.
  • Pigment® Red 122, 177, 209, 224, 254 is preferably used, and at least one red pigment selected from the group consisting of C.I. I. Pigment Red254 and / or C.I. I. Pigment Red177 is more preferable.
  • Orange pigments include monoazo pigments, naphthol pigments, pyrazolone pigments, benzimidazolone pigments, disazo pigments, naphthol lake pigments, naphthalene sulfonic acid lake pigments, perinone pigments, quinacridone pigments, anthraquinone pigments, isoindolinone pigments, isoindoline. Pigments, azomethine metal complex pigments, diketopyrrolopyrrole pigments and the like. Specific examples include C.I. I.
  • Pigment Orange 1 2, 3, 5, 4, 24, 38, 74, 13, 34, 36, 60, 62, 64, 72, 15, 16, 17, 46, 19, 43, 48, 49, 51, 61 , 66, 68, 71, 73, 81 and the like can be used.
  • I. Pigment® Orange 71 is preferable.
  • the pigment is C.I. I. Pigment Red254, C.I. I. Pigment Red177 and C.I. I. It is preferable to include at least one selected from Pigment Orange 71.
  • the content of the pigment (A) in the composition of the present invention is preferably 10 to 70% by mass, more preferably based on all components (solid content) excluding the solvent contained in the colored photosensitive resin composition. It is 20 to 60% by mass, and more preferably 30 to 60% by mass.
  • the pigment may be composed of one kind of pigment, or may be composed of two or more kinds of pigments. When two or more types are included, the total amount is preferably within the above range.
  • the (B) pigment used in the present invention comprises at least one selected from a green pigment, a blue pigment, and a black pigment.
  • a green pigment, blue pigment, and black pigment used in the present invention various conventionally known green pigments, blue pigments, and black pigments can be used.
  • the green pigment, blue pigment, and black pigment preferably have high transmittance.
  • green pigments examples include phthalocyanine pigments, azomethine metal complex pigments, and the like. I. Pigment Green 1, 4, 7, 8, 36, 58, etc. can be used.
  • blue pigments examples include naphthol AS pigments, phthalocyanine pigments, dyed lake pigments, and anthraquinone pigments.
  • Preferable examples include phthalocyanine pigments.
  • I. Pigment Blue1, 25, 26, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 17: 1, 24: 1, 56, 60, etc. can be used.
  • black pigments include C.I. I. Pigment Black 6, 7, 12, 20, 31, 32, PO71, PO38, carbon black, carbon, titanium black, aniline black, anthraquinone black pigment, perylene black pigment, iron oxide, titanium oxide alone or in combination
  • the mixture include a combination of carbon and titanium black (the mass ratio of carbon to titanium black is preferably in the range of 100: 0 to 100: 60).
  • titanium black, carbon black, C.I. I. Pigment Black PO71 and PO38 are preferable.
  • the content of the pigment (B) in the composition of the present invention is preferably 0.1 to 60 parts by mass, more preferably 0.2 to 50 parts by mass, and still more preferably 100 parts by mass of the (A) pigment. Is 0.3 to 40 parts by mass.
  • (B) 1 type of pigments may be contained in the composition of this invention, and may be contained 2 or more types. When two or more types are included, the total amount is preferably within the above range.
  • composition of the present invention may contain other pigments and dyes without departing from the spirit of the present invention.
  • examples of other pigments include yellow pigments, brown pigments and purple pigments.
  • yellow pigments examples include monoazo pigments, monoazo lake pigments, disazo pigments, anthraquinone pigments, monoazopyrazolone pigments, condensed azo pigments, isoindoline pigments, benzimidazolone pigments, azomethine metal complex pigments, quinophthalone pigments, and quinoxaline pigments.
  • monoazo pigments monoazo lake pigments, disazo pigments, anthraquinone pigments, monoazopyrazolone pigments, condensed azo pigments, isoindoline pigments, benzimidazolone pigments, azomethine metal complex pigments, quinophthalone pigments, and quinoxaline pigments.
  • monoazo pigments examples include monoazo pigments, monoazo lake pigments, disazo pigments, anthraquinone pigments, monoazopyrazolone pigments, condensed azo pigments, isoindoline pigments, benzimidazolone pigments, azomethin
  • the content of the yellow pigment in the composition of the present invention is preferably 0 to 60 parts by mass, more preferably 10 to 50 parts by mass, and further preferably 20 to 40 parts by mass with respect to 100 parts by mass of the pigment (A). It is. Only one kind of yellow pigment may be contained in the composition of the present invention, or two or more kinds thereof may be contained. When two or more types are included, the total amount is preferably within the above range.
  • pigments used in the present invention for example, those described in paragraph No. 0053 of JP2013-068814A can be employed. These other pigments are preferably 1% by mass or less of the total pigments. Moreover, the dye may be included in the range which does not deviate from the meaning of this invention.
  • the primary particle size of the pigment used in the present invention is preferably 100 nm or less from the viewpoint of color unevenness and contrast, and is preferably 5 nm or more from the viewpoint of dispersion stability. preferable.
  • the primary particle size of the pigment is more preferably 5 to 75 nm, further preferably 5 to 55 nm, and particularly preferably 5 to 35 nm. In the present invention, a particularly good effect can be exhibited in combination with a pigment having a primary particle size in the range of 5 to 35 nm.
  • the primary particle size of the pigment can be measured by a known method such as an electron microscope.
  • the mass ratio of the (B) pigment to the total pigment contained in the composition ((B) pigment / total pigment) is 0.005 to 0.25, and 0.005 to 0.00. 2, more preferably 0.005 to 0.1, and still more preferably 0.005 to 0.05.
  • all pigments is intended to include other pigments such as (A) pigments, (B) pigments, and yellow pigments.
  • the total of (A) pigment and (B) pigment preferably occupies 60% by mass or more of the total pigment, and the total of (A) pigment, (B) pigment and yellow pigment is 90% by mass of the total pigment. It is more preferable to occupy% or more.
  • the concentration of all pigments is preferably 30% by mass or more, more preferably 35% by mass or more, and 40% by mass or more with respect to the total solid content of the composition. More preferably. Although there is no restriction
  • the composition of the present invention comprises (C) a resin containing an acid group and having a weight average molecular weight of 38000 or less (hereinafter also referred to as (C) resin).
  • (C) resin By having resin, aggregation of a pigment can be suppressed and it can suppress that spectroscopy changes. It is also possible to reduce litho residue.
  • the (C) resin that can be used in the composition of the present invention is a linear organic polymer, and is a molecule (preferably a molecule having an acrylic copolymer or a styrene copolymer as the main chain). ) Having at least one group that promotes alkali solubility in (C) resin.
  • polyhydroxystyrene resins, polysiloxane resins, acrylic resins, acrylamide resins, and acryl / acrylamide copolymer resins are preferable.
  • acrylic resins and acrylamide resins are preferable.
  • Resins and acrylic / acrylamide copolymer resins are preferred.
  • Examples of the acid group (group that promotes alkali solubility) contained in the resin (C) include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group, but it is soluble in an organic solvent and weakly alkaline. Those that can be developed with an aqueous solution are preferred, and (meth) acrylic acid is particularly preferred. These acid groups may be used alone or in combination of two or more.
  • a monomer having an acid group and / or a monomer capable of imparting an acid group after polymerization (hereinafter also referred to as “monomer for introducing an acid group”) May be polymerized as a monomer component.
  • the monomer that can give an acid group after polymerization include, for example, a monomer having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, a monomer having an epoxy group such as glycidyl (meth) acrylate, and 2-isocyanatoethyl (meth). And monomers having an isocyanate group such as acrylate.
  • These monomers for introducing an acid group may be only one type or two or more types.
  • a treatment for imparting an acid group as described later is required after the polymerization.
  • (C) For the production of the resin, for example, a known radical polymerization method can be applied. Polymerization conditions such as temperature, pressure, type and amount of radical initiator, type of solvent, and the like when the (C) resin is produced by the radical polymerization method can be easily set by those skilled in the art. It can also be determined.
  • a polymer having a carboxylic acid in the side chain is preferable, such as a methacrylic acid copolymer, an acrylic acid copolymer, an itaconic acid copolymer, and a crotonic acid copolymer.
  • acid anhydrides to polymers, maleic acid copolymers, partially esterified maleic acid copolymers, alkali-soluble phenolic resins such as novolak resins, acidic cellulose derivatives with carboxylic acids in the side chain, and polymers with hydroxyl groups Can be mentioned.
  • a copolymer of (meth) acrylic acid and another monomer copolymerizable therewith is suitable as the (C) resin.
  • examples of other monomers copolymerizable with (meth) acrylic acid include alkyl (meth) acrylates, aryl (meth) acrylates, and vinyl compounds.
  • alkyl (meth) acrylate and aryl (meth) acrylate methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, pentyl (meth) acrylate,
  • vinyl compounds such as hexyl (meth) acrylate, octyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, tolyl (meth) acrylate, naphthyl (meth) acrylate, cyclohexyl (meth) acrylate, styrene, ⁇ -methylstyrene, vinyltoluene, glycidyl methacrylate, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, tetrahydrofurfury
  • the resin contains a polymer (a) obtained by polymerizing a monomer component essentially comprising a compound represented by the following general formula (ED) (hereinafter sometimes referred to as “ether dimer”). Is also preferable.
  • ED general formula
  • R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.
  • the colored photosensitive resin composition of this invention can form the cured coating film which was extremely excellent also in heat resistance and transparency.
  • the hydrocarbon group having 1 to 25 carbon atoms which may have a substituent represented by R 1 and R 2 is not particularly limited.
  • Linear or branched alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, tert-amyl, stearyl, lauryl, 2-ethylhexyl; aryl groups such as phenyl; Alicyclic groups such as cyclohexyl, tert-butylcyclohexyl, dicyclopentadienyl, tricyclodecanyl, isobornyl, adamantyl and 2-methyl-2-adamantyl; substituted with alkoxy such as 1-methoxyethyl and 1-ethoxyethyl An alkyl group substituted with an aryl group such as benzyl; and the like.
  • an acid such as methyl, ethyl, cyclohexyl, benzyl or the like, or a primary or secondary carbon substituent which is
  • ether dimer examples include dimethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, diethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, (N-propyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (isopropyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (n-butyl) ) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (isobutyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (tert-butyl) -2, 2 ′-[oxybis (methylene)] bis-2-propenoate, di (tert-butyl) -2, 2 ′-[oxybis (methylene)] bis-2-propenoate, di (tert-butyl)
  • dimethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, diethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, dicyclohexyl-2,2′- [Oxybis (methylene)] bis-2-propenoate and dibenzyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate are preferred.
  • These ether dimers may be only one kind or two or more kinds.
  • the structure derived from the compound represented by the general formula (ED) may be copolymerized with other monomers.
  • an ethylenically unsaturated monomer (a) represented by the following formula (X) as a monomer to be copolymerized with the (C) resin.
  • Formula (X) (In Formula (X), R 1 represents a hydrogen atom or a methyl group, R 2 represents an alkylene group having 2 to 10 carbon atoms, and R 3 represents a hydrogen atom or a benzene ring which may contain a benzene ring. And represents an alkyl group of 20. n represents an integer of 1 to 15.)
  • the alkylene group of R 2 preferably has 2 to 3 carbon atoms.
  • the alkyl group of R 3 has 1 to 20 carbon atoms, more preferably 1 to 10, and the alkyl group of R 3 may contain a benzene ring.
  • the carbon number of the alkyl group of R 3 is 1 to 10
  • the alkyl group becomes an obstacle and suppresses the approach between the resins and promotes adsorption / orientation to the pigment.
  • the steric hindrance effect becomes high and shows a tendency to prevent even the adsorption / orientation of the benzene ring to the pigment. This tendency becomes more prominent as the carbon chain length of the alkyl group of R 3 becomes longer.
  • alkyl group containing a benzene ring represented by R 3 include a benzyl group and a 2-phenyl (iso) propyl group.
  • Examples of the ethylenically unsaturated monomer (a) include phenol ethylene oxide (EO) modified (meth) acrylate, paracumylphenol EO or propylene oxide (PO) modified (meth) acrylate, and nonylphenol EO modified (meth).
  • Examples thereof include acrylate, PO-modified (meth) acrylate of nonylphenol, and the like.
  • EO or PO-modified (meth) acrylate of paracumylphenol is not only effective for the ⁇ -electron of the benzene ring, but also its steric effect, which is better for coloring materials such as pigments. Since the adsorption / orientation plane can be formed, the dispersion effect is higher.
  • a compound having a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond in a copolymer of a polymerizable monomer having 2 to 6 hydroxyl groups and another polymerizable monomer A resin obtained by reacting is preferably used.
  • the polymerizable monomer (a1) having 2 or more and 6 or less hydroxyl groups is preferably a compound having 2 or more and 6 or less hydroxyl groups and an ethylenically unsaturated double bond, for example, the following general formula (Y)
  • the monomer shown by can be used.
  • the other polymerizable monomer (a2) constituting such a copolymer is a polymerizable monomer copolymerizable with the polymerizable monomer (a1) having 2 to 6 hydroxyl groups, and the above-described polymerizable monomer. And monomers. These polymerizable monomers can be used individually by 1 type or in mixture of 2 or more types.
  • (C) resin having a polymerizable group may be used.
  • the (C) resin having a polymerizable group a (C) resin containing an allyl group, a (meth) acryl group, an allyloxyalkyl group or the like in the side chain is useful.
  • the above-described polymer containing a polymerizable group include a dial NR series (manufactured by Mitsubishi Rayon Co., Ltd.), Photomer 6173 (COOH-containing polyurethane acrylic oligomer.
  • Diamond Shamrock Co.Ltd. Biscote R-264, KS resist 106 (all manufactured by Osaka Organic Chemical Industry Co., Ltd.), Cyclomer P series, Plaxel CF200 series (all manufactured by Daicel Chemical Industries, Ltd.), Ebecryl 3800 (manufactured by Daicel UCB Co., Ltd.), and the like.
  • an isocyanate group and an OH group are reacted in advance to leave one unreacted isocyanate group, and a compound containing a (meth) acryloyl group and an acrylic resin containing a carboxyl group Containing urethane-modified polymerizable double bond-containing acrylic resin obtained by reaction with carboxylic acid, unsaturated group-containing acrylic resin containing carboxyl group-containing acrylic resin and compound having both epoxy group and polymerizable double bond in the molecule Acrylic resin, acid pendant epoxy acrylate resin, OH group-containing acrylic resin and polymerizable double bond-containing acrylic resin obtained by reacting polymerizable double bond, OH group-containing acrylic resin and isocyanate A resin obtained by reacting a compound having a polymerizable group with JP-A-2002-229207 And resins obtained by subjecting a resin having a side chain with an ester group having a leaving group such as a halogen atom or a
  • (C) Resin is particularly preferably a benzyl (meth) acrylate / (meth) acrylic acid copolymer or a multi-component copolymer composed of benzyl (meth) acrylate / (meth) acrylic acid / other monomers.
  • the acid value of the resin is preferably 10 to 200 mgKOH / g, more preferably 20 to 180 mgKOH / g, and even more preferably 30 to 160 mgKOH / g.
  • the weight average molecular weight (Mw) of the (C) resin is 38000 or less, preferably 30,000 or less, more preferably 25,000, and most preferably 21,000. Although there is no restriction
  • the amount of the ethylenically unsaturated double bond contained in the resin is indicated by “ethylenically unsaturated double bond equivalent”.
  • the double bond equivalent is defined by the following formula and is a measure of the amount of double bonds contained in the molecule. If the resin has the same molecular weight, the smaller the double bond equivalent value, The amount of introduction increases.
  • [Ethylenically unsaturated double bond equivalent] [Molecular weight of repeating structural unit] / [Number of ethylenically unsaturated double bonds in repeating structural unit]
  • the ethylenically unsaturated double bond equivalent of the resin in the present invention is preferably 200 to 2,000, more preferably 300 to 1,000.
  • the content of the resin (C) in the composition of the present invention is preferably 25% by mass or less, more preferably 1 to 20% by mass, and further preferably 1 to 15% by mass with respect to the total solid content of the composition. It is particularly preferably 1 to 10% by mass.
  • the composition of this invention may contain only 1 type (C) resin, and may contain 2 or more types. When two or more types are included, the total amount is preferably within the above range.
  • the composition of the present invention may contain a resin having an acid group having a weight average molecular weight exceeding 38000 within a range not departing from the gist of the present invention. It is preferable that the compounding quantity of such resin is 5 mass% or less of the compounding quantity of (C) resin.
  • the composition of the present invention contains (D) a pigment dispersant (hereinafter, also simply referred to as “dispersant”).
  • a pigment dispersant hereinafter, also simply referred to as “dispersant”.
  • known dispersants can be widely used.
  • the description in paragraph numbers 0049 to 0055 of JP2013-077009A can be referred to, and the contents thereof are incorporated in the present specification.
  • (D) as a pigment dispersant (D-1) a polymer having a hydroxyl group at one end (POH) or a polymer having a primary amino group at one end (PNH 2 ) and a tricarboxylic acid anhydride or A compound obtained by reacting with tetracarboxylic dianhydride, (D-2) a copolymer containing a structural unit represented by any one of the following general formula (1) and the following general formula (2); D-3) at least selected from a compound containing a phosphate ester represented by the following general formula (3), and (D-4) a compound containing a nitrogen atom in the main chain represented by the following general formula (4)
  • One type is preferably used. By using such a compound, the effects of the present invention are more effectively exhibited.
  • (D-1) to (D-4) will be described.
  • composition of the present invention comprises (D-1) a polymer (POH) having a hydroxyl group at at least one terminal or a polymer (PNH 2 ) having a primary amino group at at least one terminal, and a tricarboxylic acid anhydride.
  • POH polymer having at least one terminal hydroxyl group
  • PNH 2 polymer having at least one terminal primary amino group
  • a tricarboxylic acid anhydride or a tricarboxylic acid anhydride
  • Carboxylic acid dispersants include a polymer having a hydroxyl group at at least one terminal (POH) or a polymer having a primary amino group at at least one terminal (PNH 2 ), a tricarboxylic acid anhydride or a tetracarboxylic acid dicarboxylic acid. It can be obtained by reacting with an anhydride.
  • POH and PNH 2 preferably have a hydroxyl group or a primary amino group at one end.
  • Preferred examples of the polymer having a hydroxyl group at at least one terminal (POH) or the polymer having a primary amino group at at least one terminal (PNH 2 ) include those represented by the general formula (II) Is preferred.
  • Y 1 represents a monovalent terminal group having 1 to 20 carbon atoms, 0 to 12 oxygen atoms, and 0 to 3 nitrogen atoms
  • X 2 represents —O—, —S— Or —N (R b ) —
  • R b represents a hydrogen atom or a linear or branched alkyl group having 1 to 18 carbon atoms
  • G 1 is a repeating group represented by —R 11 O—
  • G 2 represents a repeating unit represented by —C ( ⁇ O) R 12 O—
  • G 3 represents a unit represented by —C ( ⁇ O) R 13 C ( ⁇ O) —OR 14 O—.
  • R 11 represents a linear or branched alkylene group having 2 to 8 carbon atoms, or a cycloalkylene group having 3 to 8 carbon atoms
  • R 12 represents a linear chain having 1 to 8 carbon atoms. or branched alkylene group, or an cycloalkylene group having a carbon number of 4 ⁇ 8
  • R 13 represents a linear or branched alkylene group having 2 to 6 carbon atoms, a carbon Linear or branched alkenylene group having 2 to 6, an arylene group of a cycloalkylene group, or a C 6-20 carbon atoms 3 ⁇
  • R 14 are, -CH (R 15) -CH ( R 16) - represents, R 1 5 and R 16 are either hydrogen atom while the other alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, 6 to 20 carbon atoms An aryl group, an alkyloxymethylene group having 1 to 20 carbon atoms
  • Y 1 represents a monovalent terminal group having 1 to 20 carbon atoms, 0 to 12 oxygen atoms, and 0 to 3 nitrogen atoms. From the viewpoints of reducing the viscosity and storage stability of the pigment dispersion, it is preferable that the alkyl group is a branched or branched alkyl group.
  • Y 1 preferably has an ethylenically unsaturated double bond.
  • active energy ray curability can be imparted to the (D-1) dispersant.
  • Y 1 is preferably a linear or branched alkyl group having 1 to 7 carbon atoms or has an ethylenically unsaturated double bond.
  • a group having an ethylenically unsaturated double bond examples include a vinyl group and a (meth) acryloyl group, and a (meth) acryloyl group is preferable.
  • the type of the group having a double bond may be one type or a plurality of types.
  • X 2 represents —O—, —S—, or —N (R b ) —, preferably —O— or —N (R b ) —.
  • R b represents a hydrogen atom or a linear or branched alkyl group having 1 to 18 carbon atoms.
  • the linear or branched alkyl group having 1 to 18 carbon atoms an alkyl group having 1 to 6 carbon atoms is preferable. Specific examples include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, tert-butyl group, neopentyl group, n-hexyl group, cyclohexyl group and the like.
  • Z 1 represents —OH or —NH 2, and preferably —OH.
  • G 1 represents a repeating unit represented by —R 11 O—
  • R 11 represents a linear or branched alkylene group having 2 to 8 carbon atoms or a cycloalkylene group having 3 to 8 carbon atoms.
  • Specific examples of the alkylene group or cycloalkylene group represented by R 11 include an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a cyclopentylene group, and a cyclohexylene group.
  • G 2 represents a repeating unit represented by —C ( ⁇ O) R 12 O—, wherein R 12 is a linear or branched alkylene group having 1 to 8 carbon atoms, or a cycloalkylene having 4 to 8 carbon atoms. Represents a group.
  • R 12 is a linear or branched alkylene group having 1 to 8 carbon atoms, or a cycloalkylene having 4 to 8 carbon atoms.
  • Specific examples of the alkylene group or cycloalkylene group represented by R 12 include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a cyclopentylene group, and a cyclohexylene group.
  • G 3 represents a repeating unit represented by —C ( ⁇ O) R 13 C ( ⁇ O) —OR 14 O—, wherein R 13 is a linear or branched alkylene group having 2 to 6 carbon atoms, carbon It represents a linear or branched alkenylene group having 2 to 6 carbon atoms, a cycloalkylene group having 3 to 20 carbon atoms, or an arylene group having 6 to 20 carbon atoms.
  • alkylene group or cycloalkylene group represented by R 13 include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a cyclopentylene group, and a cyclohexylene group.
  • alkenylene group represented by R 13 include an ethenylene group, a propenylene group, a butenylene group, a pentenylene group, a hexenylene group, and the like.
  • arylene group represented by R 13 include a phenylene group, a naphthylene group, and an anthracenylene group.
  • R 14 represents —CH (R 15 ) —CH (R 16 ) —.
  • One of R 15 and R 16 is a hydrogen atom, and the other is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an alkyl moiety having 1 carbon atom.
  • An alkyloxymethylene group of -20, an alkenyloxymethylene group having 2-20 carbon atoms in the alkenyl moiety, an aryloxymethylene group in which the aryl moiety has 6-20 carbon atoms, and the aryl moiety may be substituted with a halogen atom, Or represents an N-methylene-phthalimide group.
  • an alkyl group having 1 to 20 carbon atoms an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable.
  • Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
  • the alkenyl group having 2 to 20 carbon atoms is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 6 carbon atoms. Specific examples include an ethenyl group, a propenyl group, a butenyl group, a pentenyl group, and a hexenyl group.
  • the aryl group having 6 to 20 carbon atoms is preferably an aryl group having 6 to 10 carbon atoms, and specific examples include a phenyl group, a naphthyl group, and an anthracenyl group.
  • the alkyloxymethylene group having 1 to 20 carbon atoms in the alkyl moiety is an embodiment in which an oxymethylene group is bonded to the alkyl group having 1 to 20 carbon atoms represented by R 14 , and the alkyl group having 1 to 20 carbon atoms is , R 14 represents the same as the alkyl group having 1 to 20 carbon atoms, and the preferred range is also the same.
  • the alkenyloxymethylene group having 2 to 20 carbon atoms in the alkenyl moiety is an embodiment in which an oxymethylene group is bonded to the alkenyl group having 2 to 20 carbon atoms represented by R 14 , and the alkenyl group having 2 to 20 carbon atoms is , R 14 represents the same as the alkenyl group having 2 to 20 carbon atoms, and the preferred range is also the same.
  • the aryloxymethylene group having 6 to 20 carbon atoms in the aryl moiety is an embodiment in which an oxymethylene group is bonded to the aryl group having 6 to 20 carbon atoms represented by R 14 , and the aryl group having 6 to 20 carbon atoms is , R 14 represents the same as the aryl group having 6 to 20 carbon atoms, and the preferred range is also the same.
  • Specific examples of the alkylene group or cycloalkylene group represented by R 17 include an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a cyclopentylene group, and a cyclohexylene group.
  • R 12 and R 13 have the same meanings as R 12 and R 13 described above, and preferred ranges are also the same.
  • the compound represented by the general formula (II) As a method for synthesizing the compound represented by the general formula (II), it can be synthesized by a known method. For example, the description in paragraphs 0047 to 0082 of JP-A-2007-131832 can be referred to, and the contents thereof are described in the present specification. Embedded in the book.
  • the carboxylic acid dispersant used in the present invention a carboxylic acid dispersant obtained by ring-opening addition with an ⁇ -caprolactone compound and a ⁇ -valerolactone compound is preferably used.
  • a preferred form of the polymer having at least one terminal hydroxyl group (POH) or the polymer having at least one terminal amino acid group (PNH 2 ) is, for example, represented by the general formula (III). Those are also preferable.
  • Y 1 represents a monovalent terminal group having 1 to 20 carbon atoms, 0 to 12 oxygen atoms, and 0 to 3 nitrogen atoms
  • X 2 represents —O—, —S— Or —N (R b ) —, wherein Rb represents a hydrogen atom or a linear or branched alkyl group having 1 to 18 carbon atoms, and Z 1 represents —OH or —NH 2 .
  • G 4 and G 5 each represent a repeating unit represented by C ( ⁇ O) R 12 O—, wherein R 12 is a linear or branched alkylene group having 1 to 8 carbon atoms, or 4 to 8 carbon atoms. Represents a cycloalkylene group. However, R 12 in R 12 and G 5 in G 4 are mutually different groups.
  • R 20 represents —C ( ⁇ O) R 12 .
  • m4 represents an integer of 5 to 60
  • m5 represents an integer of 5 to 60.
  • the arrangement of the repeating units G 4 and G 5 in the general formula (III) is not limited to the order thereof, and in the polymer represented by the general formula (III), between the group X 2 and the group Z 1 Indicates that the repeating units G 4 and G 5 are included in an arbitrary order, and these repeating units G 4 and G 5 may be either random type or block type, respectively. )
  • Y 1 is the formula (II) in the same meaning as Y 1, and preferred ranges are also the same.
  • Y 1 is preferably a linear or branched alkyl group having 1 to 7 carbon atoms, or has an ethylenically unsaturated double bond.
  • X 2 has the general formula (II) in the same meaning as X 2, and preferred ranges are also the same.
  • Z 1 has the general formula (II) in the same meaning as Z 1 in the preferred range is also the same.
  • G 4 and G 5 each represent a repeating unit represented by C ( ⁇ O) R 12 O—, wherein R 12 is a linear or branched alkylene group having 1 to 8 carbon atoms, or 4 to 8 carbon atoms. Represents a cycloalkylene group.
  • R 12 in R 12 and G 5 in G 4 are mutually different groups.
  • G 4 and G 5 are synonymous with G 2 in the general formula (II), and preferred ranges thereof are also the same.
  • R 12 in the general formula (III) has the same meaning as the general formula (II) R 12 in the preferred ranges are also the same.
  • R 20 represents —C ( ⁇ O) R 12 .
  • R 12 has the same meaning as R 12 in formula (II), and the preferred range is also the same.
  • the compound represented by the general formula (III) As a method for synthesizing the compound represented by the general formula (III), it can be synthesized by a known method. For example, the description in paragraphs 0046 to 0087 of JP 2010-189514 A can be referred to, and the contents thereof are described in the present specification. Embedded in the book.
  • the carboxylic acid dispersant used in the present invention a carboxylic acid dispersant obtained by ring-opening addition with an ⁇ -caprolactone compound and a ⁇ -valerolactone compound is preferably used.
  • Tricarboxylic anhydride or tetracarboxylic dianhydride examples include an aliphatic tricarboxylic acid anhydride or an aromatic tricarboxylic acid anhydride.
  • Examples of the aliphatic tricarboxylic acid anhydride include 3-carboxymethylglutaric acid anhydride, 1,2,4-butanetricarboxylic acid-1,2-anhydride, cis-propene-1,2,3-tricarboxylic acid- 1,2-anhydride, 1,3,4-cyclopentanetricarboxylic acid anhydride and the like.
  • aromatic tricarboxylic acid anhydride examples include benzene tricarboxylic acid anhydride (1,2,3-benzenetricarboxylic acid anhydride, trimellitic acid anhydride (1,2,4-benzenetricarboxylic acid anhydride), etc.), Naphthalene tricarboxylic acid anhydride (1,2,4-naphthalene tricarboxylic acid anhydride, 1,4,5-naphthalene tricarboxylic acid anhydride, 2,3,6-naphthalene tricarboxylic acid anhydride, 1,2,8-naphthalene tricarboxylic acid Acid anhydride, etc.), 3,4,4′-benzophenone tricarboxylic acid anhydride, 3,4,4′-biphenyl ether tricarboxylic acid anhydride, 3,4,4′-biphenyl tricarboxylic acid anhydride, 2′-biphenyltricarboxylic acid anhydride,
  • an aromatic tricarboxylic acid anhydride is preferable among the above.
  • tetracarboxylic dianhydride examples include aliphatic tetracarboxylic dianhydrides, aromatic tetracarboxylic dianhydrides, and polycyclic tetracarboxylic dianhydrides.
  • Examples of the aliphatic tetracarboxylic dianhydride include 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, and 1,3-dimethyl.
  • aromatic tetracarboxylic dianhydride examples include pyromellitic dianhydride, ethylene glycol ditrimellitic anhydride ester, propylene glycol ditrimellitic anhydride ester, butylene glycol ditrimellitic anhydride ester, 3, 3 ', 4,4'-benzophenonetetracarboxylic dianhydride, 2,2', 3,3'-benzophenonetetracarboxylic dianhydride, 3,3 ', 4,4'-biphenylsulfonetetracarboxylic dianhydride 2,2 ′, 3,3′-biphenylsulfonetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride Anhydride, 3,3 ′, 4,4′-biphenyl ether tetracarboxylic dianhydride
  • polycyclic tetracarboxylic dianhydride examples include 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene succinic dianhydride, 3,4-dicarboxy-1,2 , 3,4-tetrahydro-6-methyl-1-naphthalene succinic dianhydride.
  • aromatic tetracarboxylic dianhydride is preferable among the above.
  • the tricarboxylic acid anhydride or tetracarboxylic dianhydride used in the present invention is not limited to the compounds exemplified above, and may have any structure. These may be used alone or in combination. What is preferably used in the present invention is an aromatic tricarboxylic acid anhydride or an aromatic tetracarboxylic acid dianhydride from the viewpoint of reducing the viscosity of the pigment dispersion or various inks.
  • pyromellitic dianhydride 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 9,9-bis (3,4-dicarboxyphenyl) fluorene dianhydride, 2, 3,6,7-naphthalenetetracarboxylic dianhydride, ethylene glycol ditrimellitic anhydride ester and trimellitic anhydride are preferred.
  • the carboxylic acid-based dispersant in the present invention is a hydroxyl group of “polymer having a hydroxyl group at at least one terminal (POH)” or the above-mentioned polymer having a primary amino group at at least one terminal (PNH 2 ).
  • POH polymer having a hydroxyl group at at least one terminal
  • PNH 2 polymer having a primary amino group at at least one terminal
  • the number of moles of the hydroxyl group of the polymer (POH) or the primary amino group of the polymer (PNH 2 ) is ⁇ H>, and the number of moles of the carboxylic acid anhydride group of the tricarboxylic anhydride or tetracarboxylic dianhydride is ⁇ N. >,
  • the remaining acid anhydride may be hydrolyzed with a necessary amount of water and used.
  • a catalyst may be used for the reaction of the polymer (POH) or polymer (PNH 2 ) with the tricarboxylic acid anhydride or tetracarboxylic dianhydride.
  • a tertiary amine compound can be used.
  • triethylamine, triethylenediamine, N, N-dimethylbenzylamine, N-methylmorpholine, 1,8-diazabicyclo- [5.4.0] -7- Examples include undecene and 1,5-diazabicyclo- [4.3.0] -5-nonene.
  • the reaction of the polymer (POH) or polymer (PNH 2 ) with the tricarboxylic acid anhydride or tetracarboxylic dianhydride may be performed without a solvent, or an appropriate dehydrated organic solvent may be used. After completion of the reaction, the solvent used in the reaction can be removed by an operation such as distillation, or can be used as it is as a part of the product of the dispersant.
  • the reaction temperature of the polymer (POH) or polymer (PNH 2 ) and the tricarboxylic acid anhydride or tetracarboxylic dianhydride is the case where “polymer having at least one terminal hydroxyl group (POH)” is used. Is preferably performed in the range of 80 ° C. to 180 ° C., more preferably 90 ° C. to 160 ° C. When the reaction temperature is less than 80 ° C., the reaction rate is slow. When the reaction temperature exceeds 180 ° C., the acid anhydride that has reacted and opened a ring may form a cyclic anhydride again, and the reaction may be difficult to complete.
  • a “polymer having a primary amino group at at least one end (PNH 2 )” it is preferably performed in the range of 0 to 150 ° C., more preferably 10 to 100 ° C. If it is less than 0 ° C., the reaction may not proceed, and if it exceeds 150 ° C., imidation may occur.
  • composition of the present invention preferably has (D-2) a phosphoric acid dispersant represented by the general formula (3).
  • R 3 represents a polyester structure having a number average molecular weight of 400 to 30000, and y represents 1 or 2. When y is 2, a plurality of R 3 may be the same or different. May be good.
  • R 3 represents a polyester structure having a number average molecular weight of 400 to 30,000, and when y is 2, a plurality of R 3 may be the same or different.
  • the number average molecular weight of the polyester structure is more preferably 1900 to 10000, still more preferably 400 to 3000, and particularly preferably 2000 to 3000. If it is less than 400, it cannot be used because it lacks pigment dispersibility.
  • polyester structure examples include polyester structures having a polyester group obtained by ring-opening polymerization of a lactone monomer, a styrene group, an acryloyl group, a cyanoacryloyl group, a methacryloyl group, a vinyl ether group, and the like.
  • the resulting polyester group is preferred.
  • R 3 preferably has a polyester structure obtained by ring-opening polymerization of two or more different lactone monomers.
  • R 3 may be a single type of phosphate ester, or a plurality of types of phosphate esters composed of different R 3 may be used.
  • R 3 of the phosphoric acid dispersant represented by the general formula (3) has a polycaprolactone structure having a number average molecular weight of 400 to 10,000 because the pigment dispersibility is good. More preferably, it is 400 to 3000.
  • R 3 of the phosphoric acid dispersant represented by the general formula (3) is preferably represented by the following general formula (11).
  • Formula (11) R 12 —O—R 13 — (O—R 14 ) S (Wherein R 12 represents an alkylene group, R 13 represents a trihydric or higher polyhydric alcohol structure, R 14 represents an acryloyl group, a cyanoacryloyl group, or a methacryloyl group, and s represents 2 or more.)
  • R 12 is preferably an alkylene group having 8 or less carbon atoms. Further, from the viewpoint of pigment dispersibility, s is preferably 2 or more. In this case, R 14 may be a different group. s is more preferably 2 to 5, and 2 is particularly preferable.
  • Examples of the trihydric or higher polyhydric alcohol used in R 13 include glycerin, propyl alcohol, pentaerythritol, and dipentaerythritol. Particularly preferred are trivalent to hexavalent ones.
  • the acid value of the phosphoric acid dispersant is preferably 10 to 500 mgKOH / g, more preferably 30 to 350 mgKOH / g, and further preferably 120 to 200 mgKOH / g.
  • the phosphoric acid dispersant can be produced by a known method.
  • the description in paragraphs 0037 to 0051 of JP-A-2007-231107 can be referred to, and the contents thereof are incorporated herein.
  • a phosphoric acid dispersant obtained by ring-opening addition of ⁇ -caprolactone and ⁇ -valerolactone is preferably used.
  • composition of the present invention comprises (D-3) the following general formula (1) And a copolymer containing a structural unit represented by any of the following general formula (2).
  • R 1 to R 6 each represents a hydrogen atom or a monovalent organic group
  • X 1 and X 2 represent —CO—
  • L 1 and L 2 each represent a single bond or a divalent organic linking group
  • a 1 and A 2 Each represents a monovalent organic group
  • m and n each represents an integer of 2 to 8
  • p and q each represents an integer of 1 to 100.
  • R 1 to R 6 each represents a hydrogen atom or a monovalent organic group.
  • a substituted or unsubstituted alkyl group is preferable.
  • an alkyl group having 1 to 12 carbon atoms is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, and an alkyl group having 1 to 4 carbon atoms is particularly preferable.
  • alkyl group has a substituent
  • substituents include a hydroxy group, an alkoxy group (preferably having 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms), a methoxy group, an ethoxy group, and a cyclohexyloxy group.
  • Specific examples of preferred alkyl groups include methyl, ethyl, propyl, n-butyl, i-butyl, t-butyl, n-hexyl, cyclohexyl, 2-hydroxyethyl, Examples thereof include a 3-hydroxypropyl group, a 2-hydroxypropyl group, and a 2-methoxyethyl group.
  • R 1 , R 2 , R 4 , and R 5 are preferably hydrogen atoms, and R 3 and R 6 are each a hydrogen atom or a methyl group on the pigment surface. It is most preferable from the viewpoint of adsorption efficiency.
  • X 1 and X 2 each represent —CO—, —C ( ⁇ O) O—, —CONH—, —OC ( ⁇ O) —, or a phenylene group. . Among them, —C ( ⁇ O) O—, —CONH—, and a phenylene group are preferable from the viewpoint of adsorptivity to the pigment, and —C ( ⁇ O) O— is most preferable.
  • L 1 and L 2 each represent a single bond or a divalent organic linking group.
  • the divalent organic linking group is preferably a substituted or unsubstituted alkylene group or a divalent organic linking group comprising the alkylene group and a hetero atom or a partial structure containing a hetero atom.
  • the alkylene group is preferably an alkylene group having 1 to 12 carbon atoms, more preferably an alkylene group having 1 to 8 carbon atoms, and particularly preferably an alkylene group having 1 to 4 carbon atoms.
  • hetero atom in the partial structure containing a hetero atom an oxygen atom, a nitrogen atom, and a sulfur atom are mentioned, for example, Among these, an oxygen atom and a nitrogen atom are preferable.
  • preferable alkylene groups include a methylene group, an ethylene group, a propylene group, a trimethylene group, and a tetramethylene group.
  • examples of the substituent include a hydroxy group.
  • the divalent organic linking group includes a hetero atom or a hetero atom selected from —C ( ⁇ O) —, —OC ( ⁇ O) —, and —NHC ( ⁇ O) — at the end of the above alkylene group.
  • a compound having a partial structure and linked to an adjacent oxygen atom via the heteroatom or a partial structure containing a heteroatom is preferable from the viewpoint of adsorptivity to the pigment.
  • the adjacent oxygen atom means an oxygen atom that binds to L 1 in the general formula (1) and L 2 in the general formula (2) on the side chain end side.
  • a 1 and A 2 each represent a monovalent organic group.
  • the monovalent organic group a hydroxyl group, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group is preferable.
  • preferable alkyl groups include linear, branched, and cyclic alkyl groups having 1 to 20 carbon atoms.
  • Specific examples thereof include a methyl group, an ethyl group, a propyl group, Butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, hexadecyl, octadecyl, eicosyl, isopropyl, isobutyl, s-butyl, Examples thereof include t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group and 2-norbornyl group.
  • a monovalent non-metallic atomic group other than hydrogen is used as the substituent of the substituted alkyl group.
  • Preferred examples include halogen atoms (—F, —Br, —Cl, —I), hydroxyl groups, alkoxy groups.
  • aryloxy group mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, amino group, N-alkylamino group, N, N-dialkylamino group, N-arylamino group, N, N-diaryl Amino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkylcarbamoyloxy group, N, N-diarylcarbamoyloxy Group, N-alkyl-N-arylcarbamoyloxy group, alkylsulfoxy Arylsulfoxy group, acyloxy group, acylthio group, acylamino group, N-alkylacylamino group, N-arylacylamino group, ure
  • alkylaryl phosphono group (aryl) 2), alkylaryl phosphono group (-OPO 3 (alkyl) (aryl )), monoalkyl phosphono Alkoxy group (-OPO 3 H (alkyl)) and its conjugated base group (hereinafter referred to as alkylphosphonato group), monoarylphosphono group (-OPO 3 H (aryl)) and its conjugated base group (hereinafter And cyano group, nitro group, aryl group, heteroaryl group, alkenyl group, alkynyl group, and silyl group.
  • alkyl group in these substituents include the alkyl groups described above, and these may further have a substituent.
  • substituents examples include alkoxy group, aryloxy group, alkylthio group, arylthio group, N, N-dialkylamino group, N, N-diarylamino group, N-alkyl-N-arylamino group, acyloxy group, aryl group, hetero
  • An aryl group, an alkenyl group, an alkynyl group, and a silyl group are preferable from the viewpoint of dispersion stability.
  • aryl group examples include phenyl, biphenyl, naphthyl, tolyl, xylyl, mesityl, cumenyl, chlorophenyl, bromophenyl, chloromethylphenyl, hydroxyphenyl, methoxyphenyl, ethoxy Phenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group, methylthiophenyl group, phenylthiophenyl group, methylaminophenyl group, dimethylaminophenyl group, acetylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl group, Ethoxyphenylcarbonyl group, phenoxycarbonylphenyl group, N-phenylcarbamoylphenyl group, phenyl group, cyanophenyl group, sulfophenyl group, sulfonatophen
  • a 1 and A 2 from the viewpoint of dispersion stability and developability, a straight chain having 1 to 20 carbon atoms, a branched structure having 3 to 20 carbon atoms, and a carbon number having 5 to 20 carbon atoms.
  • Cyclic alkyl groups are preferable, linear alkyl groups having 4 to 15 carbon atoms, branched alkyl groups having 4 to 15 carbon atoms, and cyclic alkyl groups having 6 to 10 carbon atoms are more preferable. Even more preferred are linear alkyl groups of 6 to 10 and branched alkyl groups of 6 to 12 carbon atoms.
  • n and n each represent an integer of 2 to 8. From the viewpoint of dispersion stability and developability, 4 to 6 is preferable, and 5 is most preferable.
  • p and q each represent an integer of 1 to 100. Two or more different p and different q may be mixed. p and q are preferably 5 to 60, more preferably 5 to 40, and still more preferably 5 to 20 from the viewpoints of dispersion stability and developability.
  • the copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) includes the repeating unit represented by the general formula (1) from the viewpoint of dispersion stability. Those are preferred.
  • the repeating unit represented by the general formula (1) is more preferably a repeating unit represented by the following general formula (1) -2.
  • R 1 to R 3 each represents a hydrogen atom or a monovalent organic group
  • La represents an alkylene group having 2 to 10 carbon atoms
  • Lb represents —C ( ⁇ O) — or —NHC ( ⁇ O) —
  • a 1 represents a monovalent organic group
  • m represents an integer of 2 to 8
  • p represents an integer of 1 to 100 .
  • the repeating unit represented by the general formula (1), (2), or (1) -2 is a simple unit represented by the following general formula (i), (ii), or (i) -2, respectively.
  • the polymer is introduced as a repeating unit of the polymer compound by polymerization or copolymerization.
  • R 1 to R 6 each represent a hydrogen atom or a monovalent organic group
  • X 1 and X 2 are each — CO—, —C ( ⁇ O) O—, —CONH—, —OC ( ⁇ O) —, or a phenylene group
  • L 1 and L 2 each represents a single bond or a divalent organic linking group
  • La represents an alkylene group having 2 to 10 carbon atoms
  • Lb represents —C ( ⁇ O) — or —NHC ( ⁇ O) —
  • a 1 and A 2 each represents a monovalent group.
  • m and n each represents an integer of 2 to 8
  • p and q each represents an integer of 1 to 100.
  • the copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) is selected from the repeating units represented by any one of the general formulas (1) and (2). It is sufficient that at least one type of repeating unit is included, and only one type may be included, or two or more types may be included.
  • the inclusion of the repeating unit represented by any of the general formulas (1) and (2) is not particularly limited, but when the total repeating unit contained in the polymer is 100% by mass, the repeating unit represented by any one of the general formulas (1) and (2) is 5% by mass or more.
  • the content is preferably 50% by mass, more preferably 50% by mass to 80% by mass.
  • the copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) is a monomer having a functional group capable of adsorbing to the pigment for the purpose of enhancing adsorption to the pigment.
  • Specific examples of the monomer having a functional group capable of adsorbing to the pigment include a monomer having an acidic group, a monomer having an organic dye structure or a heterocyclic structure, a monomer having a basic nitrogen atom, and an ionic group.
  • a monomer etc. can be mentioned. Of these, monomers having an acidic group, and monomers having an organic dye structure or a heterocyclic structure are preferable from the viewpoint of adsorption to the pigment.
  • Examples of the monomer having an acidic group include a vinyl monomer having a carboxyl group and a vinyl monomer having a sulfonic acid group.
  • Examples of the vinyl monomer having a carboxyl group include (meth) acrylic acid, vinyl benzoic acid, maleic acid, maleic acid monoalkyl ester, fumaric acid, itaconic acid, crotonic acid, cinnamic acid, and acrylic acid dimer.
  • an addition reaction product of a monomer having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate and a cyclic anhydride such as maleic anhydride, phthalic anhydride, succinic anhydride, cyclohexanedicarboxylic anhydride, ⁇ - Carboxy-polycaprolactone mono (meth) acrylate and the like can also be used.
  • a cyclic anhydride such as maleic anhydride, phthalic anhydride, succinic anhydride, cyclohexanedicarboxylic anhydride, ⁇ - Carboxy-polycaprolactone mono (meth) acrylate and the like
  • anhydride containing monomers such as maleic anhydride, itaconic anhydride, and citraconic anhydride, as a precursor of a carboxyl group.
  • Examples of the vinyl monomer having a sulfonic acid group include 2-acrylamido-2-methylpropanesulfonic acid, and examples of the vinyl monomer having a phosphoric acid group include phosphoric acid mono (2-acryloyloxyethyl ester) and phosphoric acid mono (1-methyl-2-acryloyloxyethyl ester) and the like.
  • the copolymer containing a structural unit represented by any one of the general formula (1) and the following general formula (2) preferably contains a repeating unit derived from a monomer having an acidic group as described above.
  • the copolymer containing the structural unit represented by any of the general formula (1) and the following general formula (2) may contain only one type of repeating unit derived from a monomer having an acidic group. And two or more types may be included.
  • the content of the repeating unit derived from the monomer having an acidic group is preferably 50 mgKOH / g or more. And particularly preferably 50 mg KOH / g to 200 mg KOH / g. That is, in terms of suppressing the formation of precipitates in the developer, the content of the repeating unit derived from the monomer having an acidic group is preferably 50 mgKOH / g or more.
  • secondary aggregates which are aggregates of primary particles of pigment, or to effectively weaken the cohesive force of secondary aggregates, repeating units derived from monomers having acidic groups
  • the content of is preferably 50 mgKOH / g to 200 mgKOH / g.
  • Examples of the monomer having an organic dye structure or a heterocyclic structure include, for example, specific monomers, maleimides, and maleimide derivatives described in JP-A-2009-256572, paragraph numbers 0048 to 0070. 1 type selected from a group is mentioned.
  • Examples of the monomer having a basic nitrogen atom include (meth) acrylic acid ester, N, N-dimethylaminoethyl (meth) acrylate, N, N-dimethylaminopropyl (meth) acrylate, and (meth) acrylic acid.
  • N'-dimethylaminoethyl) methacrylamide N- (N ', N'-diethylaminoethyl) acrylamide, N- (N', N'-diethylaminoethyl) methacrylamide, N- (N ', N'-dimethylamino) Propyl) acrylamide, N- (N ′, N′-dimethylaminopropyl) methacrylamide, N- (N ′, N′-diethylaminopropyl) acrylamide, N- (N ′, N′-diethylaminopropyl) methacrylamide, 2 -(N, N-dimethylamino) ethyl (meth) acrylamide, 2- (N, N-diethylamino) ethyl (meth) Acrylamide, 3- (N, N-diethylamino) propyl (meth) acrylamide, 3- (N, N-dimethyl
  • a monomer having a urea group, a urethane group, a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, or a hydroxyl group include the monomers described in paragraph No. 0095 of JP2012-173356A, the contents of which are incorporated herein.
  • Examples of the monomer having an ionic group include vinyl monomers having an ionic group (anionic vinyl monomers and cationic vinyl monomers).
  • Examples of the anionic vinyl monomer include alkali metal salts of vinyl monomers having the acidic group and salts of organic amines (eg, tertiary amines such as triethylamine and dimethylaminoethanol).
  • the nitrogen-containing vinyl monomer is an alkyl halide (alkyl group: C1-18, halogen atom: chlorine atom, bromine atom or iodine atom); benzyl halide such as benzyl chloride or benzyl bromide; methanesulfonic acid Alkyl sulfonic acid ester (alkyl group: C1-18); aryl sulfonic acid alkyl ester such as benzenesulfonic acid, toluenesulfonic acid (alkyl group: C1-18); dialkyl sulfate (alkyl group: C1-4), etc. Quaternized, dialkyl diallyl ammo The presence or absence salts.
  • alkyl halide alkyl group: C1-18, halogen atom: chlorine atom, bromine atom or iodine atom
  • benzyl halide such as benzyl chloride or benzyl bromide
  • the monomer having a functional group capable of adsorbing to the pigment can be appropriately selected according to the type of the pigment to be dispersed, and these may be used alone or in combination of two or more.
  • the copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) further includes a repeating unit derived from a copolymerizable vinyl monomer as long as the effect is not impaired. May be included.
  • vinyl monomer which can be used here, For example, (meth) acrylic acid esters, crotonic acid esters, vinyl esters, maleic acid diesters, fumaric acid diesters, itaconic acid diesters, ( Preference is given to meth) acrylamides, vinyl ethers, esters of vinyl alcohol, styrenes, (meth) acrylonitrile and the like. Specific examples of such vinyl monomers include the following compounds. In addition, in this specification, when showing either or both of "acryl and methacryl", it may describe as "(meth) acryl".
  • Examples of (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate , Isobutyl (meth) acrylate, t-butyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, 2- (meth) acrylic acid 2- Ethylhexyl, t-octyl (meth) acrylate, dodecyl (meth) acrylate, octadecyl (meth) acrylate, acetoxyethyl (meth) acrylate, acetoacetoxyethyl (meth) acrylate, phenyl
  • Examples of crotonic acid esters include butyl crotonate and hexyl crotonate.
  • Examples of vinyl esters include vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methoxyacetate, vinyl benzoate, and the like.
  • Examples of maleic acid diesters include dimethyl maleate, diethyl maleate, and dibutyl maleate.
  • Examples of the fumaric acid diesters include dimethyl fumarate, diethyl fumarate, and dibutyl fumarate.
  • Examples of itaconic acid diesters include dimethyl itaconate, diethyl itaconate, and dibutyl itaconate.
  • (Meth) acrylamides include (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide, Nn-butyl (Meth) acrylamide, Nt-butyl (meth) acrylamide, N-cyclohexyl (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N- Examples include diethyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-benzyl (meth) acrylamide, (meth) acryloylmorpholine, diacetone acrylamide, and the like.
  • Examples of vinyl ethers include methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, and methoxyethyl vinyl ether.
  • Examples of styrenes include styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, butyl styrene, hydroxy styrene, methoxy styrene, butoxy styrene, acetoxy styrene, chlorostyrene, dichlorostyrene, bromostyrene, chloromethyl
  • Examples thereof include styrene, hydroxystyrene protected with a group that can be deprotected by an acidic substance (for example, t-Boc and the like), methyl vinylbenzoate, and ⁇ -methylstyrene.
  • a preferred embodiment of the copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) is represented by at least the general formula (i), (ii), or (i) -2. And a monomer having an acidic group, or a monomer having an organic dye structure or a heterocyclic structure, and more preferably represented by at least the general formula (i) -2. And a monomer having an acid group are copolymerized. According to this embodiment, it is possible to provide a composition that is excellent in pigment adsorption and excellent in developability.
  • the composition of the present invention preferably has (D-4) a graft copolymer containing a nitrogen atom in the main chain.
  • the graft copolymer containing a nitrogen atom in the main chain preferably has a repeating unit represented by the formula (A) and / or a repeating unit represented by the formula (B).
  • R 1 represents an alkylene group having 1 to 5 carbon atoms
  • A represents a hydrogen atom or any of the following formulas (C) to (E).
  • R 1 represents a linear or branched alkylene group having 1 to 5 carbon atoms such as methylene, ethylene or propylene, preferably 2 to 3 carbon atoms, more preferably ethylene. It is a group.
  • A represents a hydrogen atom or any one of the following formulas (C) to (E), preferably formula (C).
  • R ⁇ 1 > and A are synonymous with R ⁇ 1 > and A in formula (A).
  • W 1 represents a linear or branched alkylene group having 2 to 10 carbon atoms, and among them, an alkylene group having 4 to 7 carbon atoms such as butylene, pentylene, hexylene and the like is preferable.
  • p represents an integer of 1 to 20, preferably an integer of 5 to 10.
  • Y 1 represents a divalent linking group. Among them, an alkylene group having 1 to 4 carbon atoms such as ethylene and propylene and an alkyleneoxy group having 1 to 4 carbon atoms such as ethyleneoxy and propyleneoxy are included. preferable.
  • W 2 represents a linear or branched alkylene group having 2 to 10 carbon atoms such as ethylene, propylene and butylene, and among them, an alkylene group having 2 to 3 carbon atoms such as ethylene and propylene is preferable.
  • Y 2 represents a hydrogen atom or —CO—R 2 (R 2 represents an alkyl group having 1 to 10 carbon atoms such as ethyl, propyl, butyl, pentyl, hexyl, etc .; To 5 alkyl groups are preferred).
  • q represents an integer of 1 to 20, preferably an integer of 5 to 10.
  • W 3 represents an alkyl group having 1 to 50 carbon atoms or a hydroxyalkyl group having 1 to 50 carbon atoms having 1 to 5 hydroxyl groups.
  • an alkyl group having 10 to 20 carbon atoms such as stearyl A C10-20 hydroxyalkyl group having 1-2 hydroxyl groups such as monohydroxystearyl is preferred.
  • the content of the repeating unit represented by the formula (A) or (B) in the “graft copolymer containing nitrogen atom” is preferably higher, and is usually 50 mol% or more, preferably 70 mol%. That's it.
  • the repeating unit represented by the formula (A) and the repeating unit represented by the formula (B) may be both present, and the content ratio is not particularly limited, but the repeating unit represented by the formula (A) It is preferable to contain a large amount of.
  • the total number of repeating units represented by the formula (A) or the formula (B) is usually 1 to 100, preferably 10 to 70, more preferably 20 to 50.
  • repeating units other than Formula (A) and Formula (B) may be included, and examples of other repeating units include an alkylene group and an alkyleneoxy group.
  • the “graft copolymer containing a nitrogen atom” preferably has —NH 2 and —R 1 —NH 2 (R 1 is as defined above for R 1 ) at the ends.
  • the “graft copolymer containing nitrogen atom” may have a main chain which is linear or branched.
  • the amine value of the graft copolymer is usually 5 mgKOH / g to 100 mgKOH / g, preferably 10 mgKOH / g to 70 mgKOH / g, more preferably 15 mgKOH / g to 40 mgKOH / g or less.
  • the amine value is 5 mgKOH / g or more, the dispersion stability can be further improved, and the viscosity can be further stabilized.
  • the residue can be further suppressed, and a decrease in electrical characteristics after the liquid crystal panel is formed can be further suppressed.
  • the weight average molecular weight of the above “graft copolymer containing nitrogen atom” measured by GPC is preferably from 3000 to 100,000, particularly preferably from 5,000 to 50,000.
  • the weight average molecular weight is 3000 or more, aggregation of the coloring material can be further suppressed, and higher viscosity and gelation can be further suppressed.
  • it is 100,000 or less, the viscosity increase of the copolymer itself can be further suppressed, and the lack of solubility in the organic solvent can be further suppressed.
  • the molecular weight of the dispersant used in the present invention is preferably 2,000 to 50,000, more preferably 5,000 to 30,000 in terms of weight average molecular weight (Mw).
  • the content of the (C) pigment dispersant is preferably 10 to 100 parts by mass, more preferably 15 to 80 parts by mass with respect to 100 parts by mass of the total pigment. Only 1 type of dispersing agent may be contained in the composition of this invention, and may be contained 2 or more types. When two or more types are included, the total amount is preferably within the above range.
  • the (A) pigment and the (B) pigment may be separately dispersed or co-dispersed. Preferably, the (A) pigment and the (B) pigment are separately dispersed.
  • the composition of the present invention has (E) a pigment derivative.
  • the pigment derivative is preferably a compound having a structure in which a part of the pigment is substituted with a basic group.
  • pigments for constituting the pigment derivative quinoline pigments, benzimidazolone pigments, isoindoline pigments, diketopyrrolopyrrole pigments, azo pigments, phthalocyanine pigments, anthraquinone pigments, quinacridone pigments Examples include pigments, dioxazine pigments, perinone pigments, perylene pigments, thioindigo pigments, isoindoline pigments, isoindolinone pigments, quinophthalone pigments, selenium pigments, and metal complex pigments.
  • the pigment derivative is preferably a quinoline-based, benzimidazolone-based, or isoindoline-based pigment derivative, and more preferably a benzimidazolone-based pigment derivative, and more
  • an amino group is preferable.
  • examples of such a compound include the following compounds.
  • Examples of the pigment derivative (E) used in the present invention include a pigment derivative represented by the following general formula (I), a pigment derivative represented by the general formula (II), and a pigment derivative represented by the general formula (III). It is preferable that there is at least one.
  • the pigment derivative represented by the following general formula (I), the pigment derivative represented by the general formula (II), and the pigment derivative represented by the general formula (III) will be described.
  • Dye represents an n-valent organic dye residue
  • X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 — or —CH 2 NHCOCH 2 NH—Y 2.
  • represents an optionally substituted alkylene group or arylene group
  • Y 1 represents —NH— or —O—
  • Z represents a hydroxyl group when n represents 1.
  • each represents a hydroxyl group, an alkoxy group, or a group represented by the following general formula (I-1)
  • R 1 and R 2 each represents an alkyl group which may have a substituent, optionally R 1 and R 2 are bonded to each other to form a heterocyclic ring containing a nitrogen atom
  • m is an integer of 1-6
  • Y 3 represents —NH— or —O—.
  • R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 May be bonded to each other to form a heterocyclic ring containing a nitrogen atom
  • m represents an integer of 1 to 6.
  • Dye represents an n-valent organic dye residue.
  • the organic dye residue include a chromogenic group in the pigment as described above, a similar structure, or a partial structure thereof.
  • a skeleton having an azo group a skeleton having a urea structure, a skeleton having an amide structure
  • Examples include a structure containing one or more partial structures selected from a skeleton having a cyclic amide structure, an aromatic ring having a heteroatom-containing 5-membered ring, and an aromatic ring having a heteroatom-containing 6-membered ring, and Dye Is a substituent containing these organic dye residues.
  • the dye preferably has a pigment mother nucleus structure, or a pigment mother nucleus structure and an aromatic ring, a nitrogen-containing aromatic ring, an oxygen-containing aromatic ring, or a sulfur-containing aromatic ring, and the amino group has a pigment mother nucleus structure, an aromatic ring It is bonded directly or through a linking group to any of the ring, nitrogen-containing aromatic ring, oxygen-containing aromatic ring and sulfur-containing aromatic ring.
  • quinoline residue benzimidazolone residue, isoindoline residue, diketopyrrolopyrrole residue, azo residue, phthalocyanine residue, anthraquinone residue, quinacridone residue , Dioxazine residue, perinone residue, perylene residue, thioindigo residue, isoindoline residue, isoindolinone residue, quinophthalone residue, selenium residue, metal complex residue, etc. Is mentioned.
  • organic dye residue represented by Dye include a copper phthalocyanine residue and the following organic dye residues.
  • * represents a binding site with X in the general formula (I).
  • monoazo dyes having a benzimidazolone skeleton are preferable.
  • X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 — or —CH 2 NHCOCH 2 NH—Y 2 —, and preferably a single bond.
  • Y 2 represents an alkylene group or an arylene group which may have a substituent.
  • the alkylene group is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 6 carbon atoms, and still more preferably an alkylene group having 1 to 3 carbon atoms. Specific examples include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, and a hexylene group.
  • the alkylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • the arylene group is preferably an arylene group having 6 to 20 carbon atoms, and more preferably an arylene group having 6 to 10 carbon atoms. Specific examples include a phenylene group, a naphthylene group, and an anthracenylene group.
  • the alkylene group and the arylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • Y 1 represents —NH— or —O—, preferably —NH—.
  • R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 may be bonded to each other to form a heterocyclic ring containing a nitrogen atom.
  • the alkyl group an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable. Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
  • the alkyl group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • R 1 and R 2 preferably represent an alkyl group which may have the same substituent.
  • n represents an integer of 1 to 6, preferably 1 to 4, and more preferably 1 to 3.
  • n represents an integer of 1 to 4, preferably 1 to 3, and more preferably 1 or 2.
  • Z is a hydroxyl group, an alkoxy group, a group represented by the following general formula (I-1), or —NH—X-Dye (X is the same as X in the general formula (I) when n represents 1. And n represents an integer of 2 to 4, each represents a hydroxyl group, an alkoxy group, or a group represented by the following general formula (I-1).
  • Z is preferably a group represented by the following general formula (I-1) or —NH—XQ, preferably a group represented by the following general formula (I-1). Is more preferable.
  • Z is preferably a group represented by the following general formula (I-1).
  • Formula (I-1) (In General Formula (I-1), Y 3 represents —NH— or —O—.
  • R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 May be bonded to each other to form a heterocyclic ring containing a nitrogen atom, and m represents an integer of 1 to 6.
  • Y 3 represents —NH— or —O—, preferably —NH—.
  • Y 3 preferably represents the same group as Y 1 in formula (I).
  • R 1 and R 2 in general formula (I-1) each represents an alkyl group which may have a substituent, and have the same meaning as R 1 and R 2 in general formula (I), and the preferred ranges are also the same It is.
  • R 1 and R 2 preferably represent an alkyl group which may have the same substituent.
  • R 1 and R 2 in the general formula (I-1) is preferably also have the same substituents as R 1 and R 2 in the general formula (I) represents an alkyl group.
  • M represents an integer of 1 to 6, preferably 1 to 4, and more preferably 1 to 3.
  • m preferably represents the same integer as m in formula (I).
  • Dye represents an optionally substituted quinophthalone residue
  • X 1 represents —NR′SO 2 —, —SO 2 NR′—, —CONR′—, —CH 2 NR′COCH 2 NR′— or —NR′CO—
  • X 2 may have a substituent, an arylene group having 6 to 20 carbon atoms, or a substituent Represents a heteroaromatic group having 4 to 20 carbon atoms, and these groups are bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO—.
  • X 3 represents —NR′— or —O—
  • R ′ represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or a substituent.
  • R 8 represents an optionally substituted nitrogen-containing heterocyclic residue
  • R 9 , R 10 and R 11 are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or Represents an aryl group having 6 to 20 carbon atoms which may have a substituent
  • n represents an integer of 0 to 20.
  • a and B is represented by the following general formula (II-1). is the group, the group represented by the following general formula (II-2), -O- ( CH 2) n-R 8, is -OR 9 or -NR 10 R 11, t is 1 to 3 If .t represents an integer of 2 or more, a plurality of X 1, X 2, X 3 , A, and B may be the same or different.)
  • Y 1 represents —NR′— or —O—
  • Y 2 represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, or a substituent.
  • An alkenylene group having 2 to 20 carbon atoms which may be substituted, or an arylene group having 6 to 20 carbon atoms which may have a substituent, and these groups are represented by —NR′—, —O— , —SO 2 —, and —CO— may be bonded to each other through a divalent linking group, R ′ is a hydrogen atom, and may have a substituent and has 1 to 20 carbon atoms.
  • R 1 and R 2 represent an alkyl group, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.
  • Z 1 is a single bond connecting the triazine ring and the nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ′′ —, —NR ′.
  • G is an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or a substituent Represents an arylene group having 6 to 20 carbon atoms which may have a group, and R ′ and R ′′ each represents a hydrogen atom and an alkyl group having 1 to 20 carbon atoms which may have a substituent.
  • R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent.
  • alkyl group of R 7 is - 1 carbon atoms, which may have a substituent group 20, Alternatively, it represents an alkenyl group having 2 to 20 carbon atoms which may have a substituent.
  • Dye represents the quinophthalone residue which may have a substituent.
  • the quinophthalone residue is specifically represented by the following general formula (II-3).
  • Formula (II-3) (In General Formula (II-3), D and E are each formed with a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, a benzene ring to which D and E are bonded, and having a substituent.
  • Good aromatic or heterocyclic group hydroxyl group, alkoxy group having 1 to 3 carbon atoms, carboxyl group or salt thereof, ester having 1 to 20 carbon atoms, amide having 1 to 20 carbon atoms, sulfone group or salt thereof, sulfamoyl Represents any group selected from a group, —NR′R ′′ —, and a nitro group.
  • R ′ and R ′′ each have a hydrogen atom or a substituent and each have 1 carbon atom.
  • D and E are each a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, a benzene ring to which D and E are bonded, an aromatic or heterocyclic group which may have a substituent, hydroxyl group Groups, alkoxy groups having 1 to 3 carbon atoms (for example, methoxy group, ethoxy group, propoxy group), carboxyl groups or salts thereof, esters having 1 to 20 carbon atoms, amides having 1 to 20 carbon atoms, sulfone groups or salts thereof , A sulfamoyl group, —NR′R ′′ —, and a nitro group.
  • R ′ and R ′′ are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or a substituted group.
  • An aryl group having 6 to 20 carbon atoms which may have a group.
  • the alkyl group having 1 to 20 carbon atoms an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable.
  • Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
  • the aromatic ring group or the heterocyclic group include a phenyl group, a naphthyl group, a thiophene ring group, a pyridine ring group, and a pyrrole ring group.
  • the aromatic or heterocyclic group represented by D and E the alkyl group having 1 to 20 carbon atoms, the alkenyl group having 2 to 20 carbon atoms and the aryl group having 6 to 20 carbon atoms represented by R ′ and R ′′ are: It may have a substituent, and examples of the substituent include the groups described in the section of the substituent. Among these, it is preferable that D and E are a hydrogen atom and a halogen atom.
  • P represents an integer of 0 to 4, more preferably an integer of 1 to 4, and still more preferably 4.
  • q represents an integer calculated by 4-p, specifically, preferably an integer of 0 to 3, more preferably 2 to 3, and still more preferably 4.
  • the binding site with X 1 in the general formula (II) is not particularly limited, but the 5th or 8th position of the quinoline skeleton in the quinophthalone residue is preferably a binding site, and the 8th position is a binding site. Is more preferable.
  • X 1 is, -NR'SO 2 -, - SO 2 NR '-, - CONR' -, - CH 2 NR'COCH 2 NR'-, or -NR'CO- represent, —NR′SO 2 — is preferred.
  • t is 2 or more, the plurality of X 1 may be the same or different.
  • R ′ in X 1 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, Alternatively, it represents an aryl group having 6 to 20 carbon atoms which may have a substituent, and a hydrogen atom is preferable.
  • the alkyl group having 1 to 20 carbon atoms is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms.
  • Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
  • the alkenyl group having 2 to 20 carbon atoms is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 6 carbon atoms.
  • Specific examples include an ethenyl group, a propenyl group, a butenyl group, a pentenyl group, and a hexenyl group.
  • the aryl group having 6 to 20 carbon atoms is preferably an aryl group having 6 to 10 carbon atoms, and specific examples include a phenyl group, a naphthyl group, and an anthracenyl group. These may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • X 2 is an arylene group having 6 to 20 carbon atoms which may have a substituent, or a heteroaromatic ring having 4 to 20 carbon atoms which may have a substituent. And these groups may be bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO— (R ′ represents the above X 1). It is synonymous with R ′ in the middle, and the preferred range is also the same. When t is 2 or more, the plurality of X 2 may be the same or different.
  • the arylene group having 6 to 20 carbon atoms is preferably an arylene group having 6 to 10 carbon atoms, and specific examples thereof include a phenylene group, a naphthylene group, and an anthracenylene group.
  • the heteroaromatic group having 4 to 20 carbon atoms is preferably a heteroaromatic group having 4 to 10 carbon atoms, and specific examples include a thiophene ring group, a pyridine ring group, and a pyrrole ring group. These may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • X 3 represents —NR′— or —O—, preferably —NR′—.
  • t is 2 or more, the plurality of X 3 may be the same or different.
  • R ′ has the same meaning as R ′ above, and the preferred range is also the same.
  • a and B are groups represented by the following general formula (II-1) or (II-2), —O— (CH 2 ) n —R 8 , —OR 9 , —NR 10 R, respectively.
  • 11 represents a group selected from —Cl, —F or —X 3 —X 2 —X 1 —Dye, and one of A and B is represented by the following general formula (II-1) or (II-2): Or a group represented by —O— (CH 2 ) n —R 8 , —OR 9 , or —NR 10 R 11 .
  • a and B are preferably groups represented by the following general formula (II-1) or the following general formula (II-2), and A and B are represented by the following general formula (II-1) or the following general formula ( More preferably, it is a group represented by II-2), and A and B are the same group.
  • R 8 represents an optionally substituted nitrogen-containing heterocyclic residue, and specific examples thereof include a pyrrole ring residue and a pyridine ring residue.
  • R 9 , R 10 and R 11 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkyl group having 2 to 20 carbon atoms which may have a substituent. It represents an alkenyl group or an aryl group having 6 to 20 carbon atoms which may have a substituent.
  • R 9 , R 10 and R 11 have the same meaning as R ′ described above, and the preferred ranges are also the same.
  • Formula (II-1) (In General Formula (II-1), Y 1 represents —NR′— or —O—, and Y 2 represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, or a substituent.
  • An alkenylene group having 2 to 20 carbon atoms which may be substituted, or an arylene group having 6 to 20 carbon atoms which may have a substituent, and these groups are represented by —NR′—, —O— , —SO 2 —, and —CO— may be bonded to each other through a divalent linking group, R ′ is a hydrogen atom, and may have a substituent and has 1 to 20 carbon atoms.
  • R 1 and R 2 each represents an alkyl group, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.
  • An alkenyl group (R 1 and R 2 together form a further nitrogen atom, heterocyclic structure which may be substituted include an oxygen atom or a sulfur atom may be formed.
  • Y 1 represents —NR′— or —O—, preferably —NR′—.
  • R ′ has the same meaning as R ′ above, and the preferred range is also the same.
  • Y 2 may have an optionally substituted alkylene group having 1 to 20 carbon atoms, an optionally substituted alkenylene group having 2 to 20 carbon atoms, or an optionally substituted group. And an arylene group having 6 to 20 carbon atoms, and these groups are bonded to each other through a divalent linking group selected from —NR′—, —O—, —SO 2 —, and —CO—.
  • R ′ has the same meaning as R ′ above, and the preferred range is also the same).
  • the alkylene group having 1 to 20 carbon atoms is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 6 carbon atoms, and further preferably an alkylene group having 1 to 3 carbon atoms. Specific examples include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, and a hexylene group.
  • the alkylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • the alkenylene group having 2 to 20 carbon atoms is preferably an alkenylene group having 1 to 10 carbon atoms, more preferably an alkenylene group having 1 to 6 carbon atoms, and further preferably an alkenylene group having 1 to 3 carbon atoms. Specific examples include an ethenylene group, a propenylene group, a butenylene group, a pentenylene group, and a hexenylene group.
  • the alkenylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • the arylene group having 6 to 20 carbon atoms is preferably an arylene group having 6 to 20 carbon atoms, and more preferably an arylene group having 6 to 10 carbon atoms. Specific examples include a phenylene group, a naphthylene group, and an anthracenylene group.
  • the arylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • R 1 and R 2 each represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent (R 1 and R 2 may be combined to form an optionally substituted heterocyclic structure containing a nitrogen, oxygen or sulfur atom.
  • the alkyl group having 1 to 20 carbon atoms is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms.
  • Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
  • the alkenyl group having 2 to 20 carbon atoms is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 6 carbon atoms.
  • Specific examples include an ethenyl group, a propenyl group, a butenyl group, a pentenyl group, and a hexenyl group.
  • These groups may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
  • R 1 and R 2 preferably represent the same group.
  • Z 1 is a single bond connecting a triazine ring and a nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ′′ —, —NR '-G-SO 2- , -NR'-G-SO 2 NR''-, -O-G-CO-, -O-G-CONR'-, -O-G-SO 2 -or -O- G—SO 2 NR′—, wherein G is an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or Represents an arylene group having 6 to 20 carbon atoms which may have a substituent, and R ′ and R ′′ each represent a hydrogen atom and an alkyl having 1 to 20 carbon atoms which may have a substituent.
  • R 3 represents an optionally substituted alkenyl group having 2 to 20 carbon atoms or an optionally substituted aryl group having 6 to 20 carbon atoms
  • R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 to 20 carbon atoms that may have a substituent.
  • R 7 represents an alkyl group having 1 to 20 carbon atoms which may have a substituent or a substituted group.
  • Z 1 is a single bond connecting a triazine ring and a nitrogen atom, —NR′—, —NR′—G—CO—, NR′—G—CONR ′′ —, —NR′—G—SO 2 —, —NR ′ -G-SO 2 NR '' - , - O-G-CO -, - O-G-CONR '-, - O-G-SO 2 - or -O-G-SO 2 NR'- represent single Bonding is preferred.
  • R ′ and R ′′ are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, Alternatively, it represents an aryl group having 6 to 20 carbon atoms which may have a substituent.
  • R ′ and R ′′ have the same meaning as R ′ in formula (II-1), and the preferred range is also the same.
  • G represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or an optionally substituted carbon. It represents an arylene group having a number of 6 to 20.
  • G has the same meaning as Y 2 in formula (II-1), and the preferred range is also the same.
  • R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent. Represents an alkenyl group having ⁇ 20 or an aryl group having 6 to 20 carbon atoms which may have a substituent.
  • R 3 , R 4 , R 5 , and R 6 have the same meanings as R ′ in formula (II-1), and the preferred ranges are also the same.
  • R 7 represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent.
  • R 7 has the same meaning as R 1 in formula (II-1), and the preferred range is also the same.
  • T in the general formula (II) represents an integer of 1 to 3, preferably 1 or 2, and more preferably 1.
  • A represents a component capable of forming an azo pigment together with XY.
  • A can be arbitrarily selected as long as it is a compound capable of forming an azo pigment by coupling with a diazonium compound. Specific examples of A will be shown below, but the present invention is not limited to these specific examples.
  • X represents a single bond (meaning that Y is directly connected to —N ⁇ N—) or a group selected from divalent linking groups in the following group A.
  • Y represents a group represented by the following general formula (III-2).
  • Z represents an alkylene group having 1 to 5 carbon atoms, preferably an alkylene group having 2 to 3 carbon atoms.
  • R 2 represents an alkyl group having 1 to 4 carbon atoms or a 5- or 6-membered saturated heterocyclic ring containing a nitrogen atom.
  • R 2 represents a 5- or 6-membered saturated heterocyclic ring containing a nitrogen atom, a heterocyclic ring represented by the following structural formula is preferable.
  • Z and —NR 2 may each have a lower alkyl group or an alkoxy group as a substituent.
  • a represents 1 or 2, preferably 2.
  • (E) pigment derivative in this invention As content of (E) pigment derivative in this invention, it is preferable that they are 0.5 mass part or more and 50 mass parts or less with respect to 100 mass parts of all the pigments, and it is 1 mass part or more and 25 mass parts or less. Is more preferable. Only one pigment derivative may be contained in the composition of the present invention, or two or more pigment derivatives may be contained therein. When two or more types are included, the total amount is preferably within the above range. Moreover, about the (A) pigment and the (B) pigment, the same pigment derivative may be used, respectively, and a different pigment derivative may be used. Moreover, a pigment derivative may be used for both the (A) pigment and the (B) pigment, or only one of them may be used.
  • composition of this invention it is preferable that 80 mass% or more of the pigment derivative used for (A) pigment and (B) pigment is common.
  • composition of the present invention is further in the range that does not impair the effects of the present invention, and further (F) a photopolymerization initiator, (G) a polymerizable compound, and (H) polymerizable to a side chain.
  • Other components such as a resin having a double bond, an organic solvent, and a crosslinking agent may be included.
  • the composition of this invention may contain a photoinitiator from a viewpoint of the further sensitivity improvement.
  • the photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of the polymerizable compound described later, and can be appropriately selected from known photopolymerization initiators. For example, those having photosensitivity to visible light from the ultraviolet region are preferable. Further, it may be an activator that generates some action with a photoexcited sensitizer and generates an active radical, or may be an initiator that initiates cationic polymerization according to the type of monomer.
  • the photopolymerization initiator preferably contains at least one compound having a molecular extinction coefficient of at least about 50 within a range of about 300 to 800 nm (more preferably 330 to 500 nm).
  • the photopolymerization initiator examples include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.), acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime.
  • halogenated hydrocarbon derivatives for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.
  • acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime.
  • oxime compounds oxime polymerization initiators
  • derivatives organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, and hydroxyacetophenones.
  • trihalomethyltriazine compounds trihalomethyltriazine compounds, benzyldimethylketal compounds, ⁇ -hydroxyketone compounds, ⁇ -aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triallylimidazole dimers, oniums
  • compounds selected from the group consisting of compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds and derivatives thereof, cyclopentadiene-benzene-iron complexes and salts thereof, halomethyloxadiazole compounds, and 3-aryl substituted coumarin compounds are preferred.
  • trihalomethyltriazine compounds More preferred are trihalomethyltriazine compounds, ⁇ -aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, oxime compounds, triallylimidazole dimers, triarylimidazole compounds, benzimidazole compounds, onium compounds, benzophenone compounds, and acetophenone compounds.
  • At least one compound selected from the group consisting of a trihalomethyltriazine compound, an ⁇ -aminoketone compound, an oxime compound, a triarylimidazole compound, a benzophenone compound, a triarylimidazole compound, and a benzimidazole compound is particularly preferable.
  • the triarylimidazole compound may be a mixture with benzimidazole.
  • examples of the trihalomethyltriazine compound include the following compounds. Note that Ph is a phenyl group.
  • Examples of the triarylimidazole compound and the benzimidazole compound include the following compounds.
  • a commercially available product can be used as the trihalomethyltriazine compound, for example, TAZ-107 (manufactured by Midori Chemical Co., Ltd.) can also be used.
  • TAZ-107 manufactured by Midori Chemical Co., Ltd.
  • an oxime compound as the polymerization initiator.
  • a stepper exposure machine is used for exposure for curing.
  • this exposure machine may be damaged by halogen, and the addition amount of the polymerization initiator needs to be kept low. Therefore, in view of these points, it is most preferable to use an oxime compound as the photopolymerization initiator (F) in order to form a fine pattern such as a solid-state imaging device.
  • halogenated hydrocarbon compound having a triazine skeleton examples include those described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), a compound described in British Patent No. 1388492, a compound described in JP-A-53-133428, a compound described in German Patent No. 3333724, F.I. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), compound described in JP-A-62-258241, compound described in JP-A-5-281728, compound described in JP-A-5-34920, US Pat. No. 4,221,976 And the compounds described in the book.
  • Examples of the compound described in US Pat. No. 4,221,976 include compounds having an oxadiazole skeleton (for example, 2-trichloromethyl-5-phenyl-1,3,4-oxadiazole, 2- Trichloromethyl-5- (4-chlorophenyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1,3,4-oxadiazole, 2-trichloromethyl-5 -(2-naphthyl) -1,3,4-oxadiazole, 2-tribromomethyl-5-phenyl-1,3,4-oxadiazole, 2-tribromomethyl-5- (2-naphthyl) -1,3,4-oxadiazole; 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (4-chlorostyryl) ) -1,3,4-oxadiazole, 2-trichlor
  • photopolymerization initiators other than those mentioned above, polyhalogen compounds (for example, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane, etc.), N-phenylglycine, etc.
  • polyhalogen compounds for example, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane, etc.
  • N-phenylglycine etc.
  • acylphosphine oxides for example, bis (2,4 , 6-Trimethylbenzoyl) -phenylphos Zinc oxide, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethyl-pentylphenylphosphine oxide, Lucirin TPO, etc.
  • metallocenes for example, bis ( ⁇ 5-2,4-cyclopentadien-1-yl)- Bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium, ⁇ 5-cyclopentadienyl- ⁇ 6-cumenyl-iron (1 +)-hexafluorophosphate (1-), etc.
  • Examples thereof include compounds described in JP-A Nos. 53-133428, 57-1819, 57-6096, and US Pat.
  • ketone compound examples include benzophenone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 4-methoxybenzophenone, 2-chlorobenzophenone, 4-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone, 2-ethoxycarbonylbenzophenone, benzophenonetetracarboxylic acid or tetramethyl ester thereof, 4,4′-bis (dialkylamino) benzophenones (eg, 4,4′-bis (dimethylamino) benzophenone, 4,4′-bisdicyclohexyl) Amino) benzophenone, 4,4'-bis (diethylamino) benzophenone, 4,4'-bis (dihydroxyethylamino) benzophenone, 4-methoxy-4'-dimethylamino Benzophenone, 4,4'-dimethoxybenzophenone, 4-dimethylaminobenzophen
  • hydroxyacetophenone compounds As the photopolymerization initiator, hydroxyacetophenone compounds, aminoacetophenone compounds, and acylphosphine compounds can also be suitably used. More specifically, for example, aminoacetophenone initiators described in JP-A-10-291969 and acylphosphine oxide initiators described in Japanese Patent No. 4225898 can also be used.
  • hydroxyacetophenone-based initiator IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, IRGACURE-127 (trade names: all manufactured by BASF) can be used.
  • aminoacetophenone-based initiator commercially available products IRGACURE-907, IRGACURE-369, IRGACURE-379, IRGACURE-OXE379 (trade names: all manufactured by BASF) can be used.
  • aminoacetophenone-based initiator compounds described in JP-A-2009-191179 whose absorption wavelength is matched with a long wave light source of 365 nm or 405 nm can also be used.
  • acylphosphine initiator commercially available products such as IRGACURE-819 and DAROCUR-TPO (trade names: both manufactured by BASF) can be used.
  • More preferable examples of the photopolymerization initiator include oxime compounds.
  • Specific examples of the oxime compound include compounds described in JP-A No. 2001-233842, compounds described in JP-A No. 2000-80068, and compounds described in JP-A No. 2006-342166.
  • oxime compounds examples include J.M. C. S. Perkin II (1979) pp. 1653-1660), J.M. C. S. Perkin II (1979) pp. 156-162, Journal of Photopolymer Science and Technology (1995) pp. 202-232, compounds described in JP-A No. 2000-66385, compounds described in JP-A Nos. 2000-80068, JP-T 2004-534797, JP-A No. 2006-342166, and the like.
  • IRGACURE-OXE01 manufactured by BASF
  • IRGACURE-OXE02 manufactured by BASF
  • oxime compounds other than those described above compounds described in JP-A-2009-519904 in which an oxime is linked to the carbazole N-position, compounds described in US Pat. No. 7,626,957 in which a hetero substituent is introduced into the benzophenone moiety, Compounds described in Japanese Patent Application Laid-Open No. 2010-15025 and US Patent Publication No. 2009-292039, in which a nitro group is introduced into the dye moiety, a ketoxime compound described in International Patent Publication No. 2009-131189, a triazine skeleton and an oxime skeleton in the same molecule
  • a compound described in US Pat. No. 7,556,910 contained therein a compound described in JP-A-2009-221114 having an absorption maximum at 405 nm and good sensitivity to a g-line light source, and the like may be used.
  • cyclic oxime compounds described in JP-A-2007-231000 and JP-A-2007-322744 can also be suitably used for the cyclic oxime compounds described in JP-A-2007-231000 and JP-A-2007-322744.
  • cyclic oxime compounds in particular, cyclic oxime compounds fused to carbazole dyes described in JP2010-32985A and JP2010-185072A have high light absorptivity and high sensitivity. preferable.
  • the compounds described in JP-A-2009-242469 having an unsaturated bond at a specific site of the oxime compound can be preferably used because high sensitivity can be achieved by regenerating the active radical from the polymerization inert radical. it can.
  • an oxime compound having a specific substituent as disclosed in JP 2007-26997A and an oxime compound having a thioaryl group as disclosed in JP 2009-191061 A can be given.
  • the oxime compound that is a photopolymerization initiator is preferably a compound represented by the following general formula (OX-1).
  • the oxime N—O bond may be an (E) oxime compound, a (Z) oxime compound, or a mixture of (E) and (Z) isomers. .
  • R and B each represent a monovalent substituent
  • A represents a divalent organic group
  • Ar represents an aryl group.
  • the monovalent substituent represented by R is preferably a monovalent nonmetallic atomic group.
  • the monovalent nonmetallic atomic group include an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic group, an alkylthiocarbonyl group, and an arylthiocarbonyl group.
  • these groups may have one or more substituents.
  • the substituent mentioned above may be further substituted by another substituent.
  • substituents examples include a halogen atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, an acyloxy group, an acyl group, an alkyl group, and an aryl group.
  • an alkyl group having 1 to 30 carbon atoms is preferable. Specifically, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group, an octadecyl group, an isopropyl group , Isobutyl, sec-butyl, tert-butyl, 1-ethylpentyl, cyclopentyl, cyclohexyl, trifluoromethyl, 2-ethylhexyl, phenacyl, 1-naphthoylmethyl, 2-naphthoyl Methyl group, 4-methylsulfanylphenacyl group, 4-phenylsulfanylphenacyl group, 4-dimethylaminophenacyl group, 4-cyanophenacyl group, 4-methylphenacyl
  • the aryl group is preferably an aryl group having 6 to 30 carbon atoms, and specifically includes a phenyl group, a biphenyl group, a 1-naphthyl group, a 2-naphthyl group, a 9-anthryl group, a 9-phenanthryl group, and a 1-pyrenyl group.
  • the acyl group is preferably an acyl group having 2 to 20 carbon atoms, and specifically includes an acetyl group, a propanoyl group, a butanoyl group, a trifluoroacetyl group, a pentanoyl group, a benzoyl group, a 1-naphthoyl group, and a 2-naphthoyl group.
  • the alkoxycarbonyl group is preferably an alkoxycarbonyl group having 2 to 20 carbon atoms, and specifically includes a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, a hexyloxycarbonyl group, an octyloxycarbonyl group, a decyl group. Examples thereof include an oxycarbonyl group, an octadecyloxycarbonyl group, and a trifluoromethyloxycarbonyl group.
  • aryloxycarbonyl group examples include phenoxycarbonyl group, 1-naphthyloxycarbonyl group, 2-naphthyloxycarbonyl group, 4-methylsulfanylphenyloxycarbonyl group, 4-phenylsulfanylphenyloxycarbonyl group, 4-dimethylamino.
  • heterocyclic group an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom is preferable.
  • thienyl group benzo [b] thienyl group, naphtho [2,3-b] thienyl group, thiantenyl group, furyl group, pyranyl group, isobenzofuranyl group, chromenyl group, xanthenyl group, phenoxathiyl Nyl group, 2H-pyrrolyl group, pyrrolyl group, imidazolyl group, pyrazolyl group, pyridyl group, pyrazinyl group, pyrimidinyl group, pyridazinyl group, indolizinyl group, isoindolyl group, 3H-indolyl group, indolyl group, 1H-indazolyl group, purinyl group 4
  • alkylthiocarbonyl group examples include a methylthiocarbonyl group, a propylthiocarbonyl group, a butylthiocarbonyl group, a hexylthiocarbonyl group, an octylthiocarbonyl group, a decylthiocarbonyl group, an octadecylthiocarbonyl group, and a trifluoromethylthiocarbonyl group.
  • a methylthiocarbonyl group a propylthiocarbonyl group, a butylthiocarbonyl group, a hexylthiocarbonyl group, an octylthiocarbonyl group, a decylthiocarbonyl group, an octadecylthiocarbonyl group, and a trifluoromethylthiocarbonyl group.
  • arylthiocarbonyl group examples include a 1-naphthylthiocarbonyl group, a 2-naphthylthiocarbonyl group, a 4-methylsulfanylphenylthiocarbonyl group, a 4-phenylsulfanylphenylthiocarbonyl group, and a 4-dimethylaminophenylthiocarbonyl group.
  • the monovalent substituent represented by B represents an aryl group, a heterocyclic group, an arylcarbonyl group, or a heterocyclic carbonyl group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
  • Y, X, and n have the same meanings as Y, X, and n in General Formula (OX-2) described later, and preferred examples are also the same.
  • examples of the divalent organic group represented by A include an alkylene group having 1 to 12 carbon atoms, a cycloalkylene group, and an alkynylene group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent. Among them, A in the formula (OX-1) is an unsubstituted alkylene group, an alkyl group (for example, a methyl group, an ethyl group, a tert-butyl group, dodecyl) from the viewpoint of increasing sensitivity and suppressing coloring due to heating.
  • an alkyl group for example, a methyl group, an ethyl group, a tert-butyl group, dodecyl
  • alkylene group alkenyl group (eg vinyl group, allyl group) alkylene group, aryl group (eg phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl) Group, a phenanthryl group, and a styryl group) are preferable.
  • alkenyl group eg vinyl group, allyl group
  • aryl group eg phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl
  • a phenanthryl group e.g., phenanthryl group
  • styryl group alkylene group substituted alkylene group
  • alkenyl group eg vinyl group, allyl group
  • aryl group eg phenyl group, p-tolyl group, xylyl group, cumenyl group, naphth
  • the aryl group represented by Ar is preferably an aryl group having 6 to 30 carbon atoms, and may have a substituent.
  • substituents include the same substituents as those introduced into the substituted aryl group mentioned above as specific examples of the aryl group which may have a substituent.
  • a substituted or unsubstituted phenyl group is preferable from the viewpoint of increasing sensitivity and suppressing coloring due to heating.
  • the oxime compound is preferably a compound represented by the following general formula (OX-2).
  • R and X each represent a monovalent substituent
  • a and Y each represent a divalent organic group
  • Ar represents an aryl group
  • n is an integer of 0 to 5 is there.
  • R, A and Ar in the general formula (OX-2) have the same meanings as R, A and Ar in the general formula (OX-1), and preferred examples thereof are also the same.
  • the monovalent substituent represented by X includes an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyloxy group, an acyl group, an alkoxycarbonyl group, an amino group, and a heterocyclic ring.
  • X in the general formula (OX-2) is preferably an alkyl group from the viewpoint of solvent solubility and improvement of absorption efficiency in the long wavelength region.
  • n represents an integer of 0 to 5, and an integer of 0 to 2 is preferable.
  • examples of the divalent organic group represented by Y include the following structures.
  • “*” represents a bonding position between Y and an adjacent carbon atom in the formula (OX-2).
  • the oxime compound is preferably a compound represented by the following general formula (OX-3) or (OX-4).
  • R and X each represent a monovalent substituent
  • A represents a divalent organic group
  • Ar represents an aryl group
  • n represents 0 to 5 Is an integer.
  • R, X, A, Ar, and n in the general formula (OX-3) or (OX-4) have the same meanings as R, X, A, Ar, and n in the general formula (OX-2), respectively.
  • the preferred examples are also the same.
  • the oxime compound has a maximum absorption wavelength in a wavelength region of 350 nm to 500 nm, preferably has an absorption wavelength in a wavelength region of 360 nm to 480 nm, and particularly preferably has a high absorbance at 365 nm and 455 nm.
  • the molar extinction coefficient at 365 nm or 405 nm of the oxime compound is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, more preferably 5,000 to 200, from the viewpoint of sensitivity. Is particularly preferred.
  • a known method can be used for the molar extinction coefficient of the compound. Specifically, for example, 0.01 g of an ultraviolet-visible spectrophotometer (Vary Inc., Carry-5 spectrophotometer) is used with an ethyl acetate solvent. It is preferable to measure at a concentration of / L.
  • the photopolymerization initiator used in the present invention may be used in combination of two or more as required.
  • content of (F) photoinitiator is 0.1 mass% or more and 10 mass% or less with respect to the total solid of a composition. More preferably, it is 0.5 mass% or more and 5 mass% or less, More preferably, it is 1 mass% or more and 3 mass% or less. Within this range, better sensitivity and pattern formability can be obtained.
  • the composition of the present invention may contain a polymerizable compound.
  • known polymerizable compounds that can be cross-linked by radicals, acids, and heat can be used, and examples thereof include polymerizable compounds containing an ethylenically unsaturated bond, cyclic ether (epoxy, oxetane), methylol and the like.
  • the polymerizable compound is suitably selected from compounds having at least one terminal ethylenically unsaturated bond, preferably two or more, from the viewpoint of sensitivity.
  • a polyfunctional polymerizable compound having 4 or more functional groups (a polymerizable compound having 4 or more polymerizable groups) is preferable, and a polyfunctional polymerizable compound having 5 or more functional groups is more preferable.
  • Such compound groups are widely known in the industrial field, and these can be used without particular limitation in the present invention. These may be in any chemical form such as, for example, monomers, prepolymers, ie dimers, trimers and oligomers or mixtures thereof and oligomers thereof.
  • the polymeric compound in this invention may be used individually by 1 type, and may use 2 or more types together.
  • examples of monomers and prepolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, amides, And multimers thereof, preferably esters of unsaturated carboxylic acids and aliphatic polyhydric alcohol compounds, amides of unsaturated carboxylic acids and aliphatic polyhydric amine compounds, and multimers thereof. is there.
  • unsaturated carboxylic acids for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.
  • esters thereof for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.
  • esters thereof for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.
  • a dehydration condensation reaction product with a functional carboxylic acid is also preferably used.
  • an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an isocyanate group or an epoxy group with a monofunctional or polyfunctional alcohol, amine, or thiol, and a halogen group A substitution reaction product of an unsaturated carboxylic acid ester or amide having a detachable substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable.
  • compounds described in paragraphs [0095] to [0108] of JP-A-2009-288705 can be preferably used in the present invention.
  • the polymerizable compound is also preferably a compound having at least one addition-polymerizable ethylene group and having an ethylenically unsaturated group having a boiling point of 100 ° C. or higher under normal pressure.
  • monofunctional acrylates and methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, trimethylolethanetri ( (Meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, hexanediol ( (
  • polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid, and mixtures thereof.
  • a polyfunctional (meth) acrylate obtained by reacting a polyfunctional carboxylic acid with a compound having a cyclic ether group such as glycidyl (meth) acrylate and an ethylenically unsaturated group can also be used.
  • fluorene rings described in JP 2010-160418 A, JP 2010-129825 A, JP 4364216 A, etc., and ethylenically unsaturated groups.
  • a compound having two or more functions, a cardo resin can also be used.
  • radically polymerizable monomers represented by the following general formulas (MO-1) to (MO-5) can also be suitably used.
  • T is an oxyalkylene group
  • the terminal on the carbon atom side is bonded to R.
  • n is 0 to 14, and m is 1 to 8.
  • a plurality of R and T present in one molecule may be the same or different.
  • at least one of a plurality of Rs is —OC ( ⁇ O) CH ⁇ CH 2 or —OC A group represented by ( ⁇ O) C (CH 3 ) ⁇ CH 2 is represented.
  • Specific examples of the polymerizable compounds represented by the general formulas (MO-1) to (MO-5) include compounds described in paragraphs 0248 to 0251 of JP-A-2007-2699779. It can be suitably used in the invention.
  • dipentaerythritol triacrylate (KAYARAD D-330 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (KAYARAD D-320 as a commercial product); Nippon Kayaku Co., Ltd.
  • dipentaerythritol penta (meth) acrylate (as a commercial product, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (as a commercial product, KAYARAD DPHA; Nippon Kayaku Co., Ltd.) KAYARAD RP-1040 manufactured by Nippon Kayaku Co., Ltd., A-DPH-12E manufactured by Shin-Nakamura Chemical Co., Ltd.), and a structure in which these (meth) acryloyl groups are mediated by ethylene glycol and propylene glycol residues .
  • These oligomer types can also be used.
  • Preferred embodiments of the polymerizable compound are shown below.
  • the polymerizable compound is a polyfunctional monomer and may have an acid group such as a carboxyl group, a sulfonic acid group, or a phosphoric acid group. If the ethylenic compound has an unreacted carboxyl group as in the case of a mixture as described above, this can be used as it is. Non-aromatic carboxylic acid anhydrides may be reacted to introduce acid groups.
  • non-aromatic carboxylic acid anhydride examples include tetrahydrophthalic anhydride, alkylated tetrahydrophthalic anhydride, hexahydrophthalic anhydride, alkylated hexahydrophthalic anhydride, succinic anhydride, anhydrous Maleic acid is mentioned.
  • the monomer having an acid group is an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, and a non-aromatic carboxylic acid anhydride is reacted with an unreacted hydroxyl group of the aliphatic polyhydroxy compound.
  • a polyfunctional monomer having an acid group is preferable, and in this ester, the aliphatic polyhydroxy compound is pentaerythritol and / or dipentaerythritol.
  • Examples of commercially available products include M-510 and M-520 as polybasic acid-modified acrylic oligomers manufactured by Toagosei Co., Ltd.
  • a preferable acid value of the polyfunctional monomer having an acid group is 0.1 to 40 mgKOH / g, and particularly preferably 5 to 30 mgKOH / g. If the acid value of the polyfunctional monomer is too low, the developing dissolution properties are lowered, and if it is too high, the production and handling are difficult, the photopolymerization performance is lowered, and the curability such as the surface smoothness of the pixel is deteriorated. Therefore, when two or more polyfunctional monomers having different acid groups are used in combination, or when a polyfunctional monomer having no acid group is used in combination, the acid value of the entire polyfunctional monomer should be adjusted to be within the above range. Is preferred.
  • polyfunctional monomer having a caprolactone structure is not particularly limited as long as it has a caprolactone structure in the molecule.
  • R 1 represents a hydrogen atom or a methyl group
  • m represents an integer of 1 or 2
  • “*” represents a bond
  • R 1 represents a hydrogen atom or a methyl group, and “*” represents a bond.
  • the polyfunctional monomer which has a caprolactone structure can be used individually or in mixture of 2 or more types.
  • the specific monomer in the present invention is preferably at least one selected from the group of compounds represented by the following general formula (Z-4) or (Z-5).
  • E represents — ((CH 2 ) yCH 2 O) — or — ((CH 2 ) yCH (CH 3 ) O) —, respectively.
  • Y each represents an integer of 0 to 10
  • X represents an acryloyl group, a methacryloyl group, a hydrogen atom, or a carboxyl group, respectively.
  • the total number of acryloyl groups and methacryloyl groups is 3 or 4
  • each m represents an integer of 0 to 10
  • the total of each m is an integer of 0 to 40.
  • any one of X is a carboxyl group.
  • the total number of acryloyl groups and methacryloyl groups is 5 or 6, each n represents an integer of 0 to 10, and the total of each n is an integer of 0 to 60. However, when the total of each n is 0, any one of X is a carboxyl group.
  • m is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
  • the total of each m is preferably an integer of 2 to 40, more preferably an integer of 2 to 16, and particularly preferably an integer of 4 to 8.
  • n is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
  • the total of each n is preferably an integer of 3 to 60, more preferably an integer of 3 to 24, and particularly preferably an integer of 6 to 12.
  • — ((CH 2 ) yCH 2 O) — or — ((CH 2 ) yCH (CH 3 ) O) — represents an oxygen atom side.
  • a form in which the terminal of X is bonded to X is preferred.
  • the compounds represented by the general formula (Z-4) or the general formula (Z-5) may be used alone or in combination of two or more.
  • a form in which all six Xs are acryloyl groups is preferable.
  • the total content of the compound represented by the general formula (Z-4) or the general formula (Z-5) in the polymerizable compound is preferably 20% by mass or more, and more preferably 50% by mass or more.
  • the compound represented by the general formula (Z-4) or the general formula (Z-5) is a conventionally known process, in which ethylene oxide or propylene oxide is opened to pentaerythritol or dipentaerythritol. It can be synthesized from a step of bonding a ring-opening skeleton by an addition reaction and a step of introducing a (meth) acryloyl group by reacting, for example, (meth) acryloyl chloride with a terminal hydroxyl group of the ring-opening skeleton. Each step is a well-known step, and a person skilled in the art can easily synthesize a compound represented by the general formula (i) or (ii).
  • pentaerythritol derivatives and / or dipentaerythritol derivatives are more preferable.
  • Specific examples include compounds represented by the following formulas (a) to (f) (hereinafter also referred to as “exemplary compounds (a) to (f)”).
  • exemplary compounds (a), (f) b), (e) and (f) are preferred.
  • Examples of commercially available polymerizable compounds represented by the general formulas (Z-4) and (Z-5) include SR-494, a tetrafunctional acrylate having four ethyleneoxy chains manufactured by Sartomer, Nippon Kayaku Examples thereof include DPCA-60, which is a hexafunctional acrylate having six pentyleneoxy chains, and TPA-330, which is a trifunctional acrylate having three isobutyleneoxy chains.
  • polymerizable compound examples include urethane acrylates as described in JP-B-48-41708, JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765. Also suitable are urethane compounds having an ethylene oxide skeleton as described in JP-B-58-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418. Furthermore, addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238 are described as polymerizable compounds.
  • polymerizable compounds include urethane oligomers UAS-10, UAB-140 (Sanyo Kokusaku Pulp Co., Ltd.), UA-7200 (Shin Nakamura Chemical Co., Ltd., DPHA-40H (Nippon Kayaku Co., Ltd.), UA- 306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha), trimethylolpropane triacrylate (commercially available products are A-TMPT; manufactured by Shin-Nakamura Chemical Co., Ltd.), etc. It is done.
  • cyclic ether examples include those having an epoxy group such as bisphenol A type epoxy resin, JER-827, JER-828, JER-834, JER-1001, JER-1002, JER-1003.
  • JER-1055, JER-1007, JER-1009, JER-1010 manufactured by Japan Epoxy Resin Co., Ltd.
  • EPICLON 860, EPICLON 1050, EPICLON 1051, EPICLON 1055 manufactured by DIC Corporation
  • bisphenol F As type epoxy resins, JER-806, JER-807, JER-4004, JER-4005, JER-4007, JER-4010 (above, manufactured by Japan Epoxy Resins Co., Ltd.), EPICLON83 EPICLON 835 (above, manufactured by DIC Corporation), LCE-21, RE-602S (above, manufactured by Nippon Kayaku Co., Ltd.), etc., and phenol novolac type epoxy resins such as JER-152, JER-154, JER -157S70, JER-157S65 (above, manufactured by Japan Epoxy Resin Co., Ltd.), EPICLON® N-740, EPICLON® N-
  • EPICLON N-660, EPICLON N-665, EPICLON N-670, EPICLON ⁇ N-673, EPICLON N-680, EPICLON N-690 (above, manufactured by DIC Corporation), EOCN-1020 (Below (Manufactured by Nippon Kayaku Co., Ltd.), as aliphatic epoxy resins, ADEKA RESIN EP-4080S, EP-4085S, EP-4088S (above, manufactured by ADEKA) Celoxide 2021P, Celoxide 2081, Celoxide 2083, Celoxide 2085, EHPE-3150 (1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct of 2,2-bis (hydroxymethyl) -1-butanol), EPOLEEAD PB 3600, PB 4700 (above, Daicel) Chemical Industry Co., Ltd.), Denacol® EX-211L, EX-212L, EX-214L, EX-216
  • the details of usage methods can be arbitrarily set according to the final performance design of the colored photosensitive resin composition.
  • a structure having a high unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable.
  • those having three or more functional groups are preferable, and further, different functional groups / different polymerizable groups (for example, acrylic ester, methacrylate ester, styrene). It is also effective to adjust both sensitivity and strength by using a compound of a vinyl compound or a vinyl ether compound).
  • the developability of the colored photosensitive resin composition can be adjusted, and an excellent pattern forming ability can be obtained.
  • selection and use of a polymerizable compound is also required for compatibility and dispersibility with other components (for example, a photopolymerization initiator, a dispersion, an alkali-soluble resin, etc.) contained in the composition of the present invention.
  • the method is an important factor.
  • the compatibility may be improved by using a low-purity compound or using two or more kinds in combination.
  • a specific structure may be selected from the viewpoint of improving adhesion to a hard surface such as a support.
  • the content of the polymerizable compound is preferably 5 to 40% by mass, more preferably 5 to 30% by mass with respect to the total solid content in the composition. 5 to 20% by mass is particularly preferable.
  • Resin having a polymerizable double bond in the side chain ⁇ (H) Resin having a polymerizable double bond in the side chain
  • a resin having a polymerizable double bond in the side chain may be contained.
  • the composition of the present invention can be cured more effectively.
  • the resin having a polymerizable double bond in the side chain is not particularly limited as long as it has a polymerizable double bond in the side chain, but the polymerizable monomer having 2 to 6 hydroxyl groups (p) And a copolymer (a) with other polymerizable monomer (q), a resin obtained by reacting a functional group capable of reacting with a hydroxyl group and a compound (b) having an ethylenically unsaturated double bond Is preferred.
  • the polymerizable monomer having 2 to 6 hydroxyl groups constituting the resin having a polymerizable double bond in the side chain (p) has 2 to 6 hydroxyl groups and an ethylenically unsaturated double bond.
  • a monomer represented by the following general formula (1) can be used.
  • General formula (1) (Wherein R 1 and R 4 each represent a hydrogen atom or an optionally substituted alkyl group having 1 to 5 carbon atoms, R 2 represents an alkylene group having 1 to 4 carbon atoms, and R 3 represents 1 carbon atom) Represents an alkylene group of 1 to 4 or a single bond, and n represents an integer of 2 to 6.
  • Examples of the monomer represented by the general formula (1) include monoesters of polyhydric alcohols having an ethylenically unsaturated double bond, and glycerol mono (meth) acrylate is preferred.
  • the other polymerizable monomer (q) is a polymerizable monomer copolymerizable with the polymerizable monomer (p) having 2 to 6 hydroxyl groups.
  • N-vinylpyrrolidone styrene and its derivatives, styrenes such as ⁇ -methylstyrene
  • acrylamides such as (meth) acrylamide, methylol (meth) acrylamide, alkoxymethylol (meth) acrylamide, diacetone (meth) acrylamide
  • examples include (meth) acrylonitrile, other vinyl compounds such as ethylene, propylene, butylene, vinyl chloride, and vinyl acetate, and macromonomers such as polymethyl methacrylate macromonomer and polystyrene macromonomer. These monomers can be used individually by 1 type or in mixture of 2 or more types.
  • the copolymerization ratio of the polymerizable monomer (p) having 2 to 6 hydroxyl groups and the other polymerizable monomer (q) is preferably 5 to 95% by weight: 95 to 5% by weight, 70% by weight: More preferably, it is 70 to 30% by weight.
  • the copolymerization ratio of the polymerizable monomer (p) is less than 5% by weight, the number of ethylenically unsaturated double bonds that can be introduced is small, the double bond equivalent value is large, and sufficient sensitivity can be obtained. Can not.
  • a copolymer (a) of a polymerizable monomer (p) having 2 to 6 hydroxyl groups and another polymerizable monomer (q) can be produced by a known method. No. 156930, paragraph 0013 can be referred to, the contents of which are incorporated herein.
  • the resin having a polymerizable double bond in the side chain is obtained by reacting the copolymer (a) with a functional group capable of reacting with a hydroxyl group and a compound (b) having an ethylenically unsaturated double bond. Is obtained.
  • the compound (b) having a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond include an isocyanate group and a carboxyl group, and an isocyanate group is particularly preferred from the viewpoint of reactivity.
  • Specific examples of the compound having an isocyanate group and an ethylenically unsaturated double bond include 2-acryloylethyl isocyanate and 2-methacryloylethyl isocyanate.
  • Specific examples of the compound having a carboxyl group and an ethylenically unsaturated double bond include acrylic acid, methacrylic acid, and maleic anhydride.
  • the amount of the ethylenically unsaturated double bond introduced into the copolymer (a) via a hydroxyl group is indicated by the “ethylenically unsaturated double bond equivalent” of the resulting resin.
  • the ethylenically unsaturated double bond equivalent of the resin obtained here is preferably 200 to 2,000, and more preferably 300 to 900.
  • the ratio of the polymerizable monomer (p) for introducing the ethylenically unsaturated double bond is increased, and a sufficient amount of the polymerizable monomer (for maintaining various properties) ( q) cannot be copolymerized.
  • the weight average molecular weight (Mw) of the (H) resin is preferably 2000 to 200000, more preferably 5000 to 50000, from the viewpoint of good dispersibility of the composition of the present invention.
  • the reaction between the copolymer (a) and the compound (b) having a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond can be carried out by a known method, for example, JP-A-2005-156930. Reference can be made to the description of paragraph 0016 of the publication, the contents of which are incorporated herein.
  • the content of the resin having a polymerizable double bond in the side chain is 100 parts by mass of the resin component.
  • the content is preferably 30 to 100% by mass, more preferably 40 to 90% by mass, and further preferably 50 to 80% by mass.
  • One type of resin having a polymerizable double bond in the side chain may be contained in the composition of the present invention, or two or more types may be contained. When two or more types are included, the total amount is preferably within the above range.
  • the composition of the present invention may contain an organic solvent.
  • the organic solvent is basically not particularly limited as long as the solubility of each component and the coating property of the colored photosensitive resin composition are satisfied, but in particular, the solubility and coating of ultraviolet absorbers, alkali-soluble resins and dispersants, etc. Is preferably selected in consideration of safety and safety.
  • organic solvents examples include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and ethyl lactate.
  • Alkyl oxyacetates eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate)
  • alkyl 3-oxypropionate Esters eg, methyl 3-oxypropionate, ethyl 3-oxypropionate, etc.
  • Oxypropionic acid alkyl esters eg, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc.
  • ethers For example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether Acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate and the like, and ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-heptanone, and aromatic hydrocarbons such as Tolue And xylene are preferable.
  • ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-heptanone, and aromatic hydrocarbons
  • organic solvents are preferably mixed in two or more types from the viewpoints of solubility of the ultraviolet absorber and the alkali-soluble resin, improvement of the coated surface, and the like.
  • It is a mixed solution composed of two or more selected from carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, and propylene glycol methyl ether acetate.
  • the content of the organic solvent in the composition is preferably such that the total solid concentration of the composition is 5 to 80% by mass, more preferably 5 to 60% by mass, from the viewpoint of applicability. 50% by mass is particularly preferred.
  • the crosslinking agent is not particularly limited as long as the film can be cured by a crosslinking reaction.
  • at least selected from (a) an epoxy resin, (b) a methylol group, an alkoxymethyl group, and an acyloxymethyl group.
  • a phenol compound, a naphthol compound, or a hydroxyanthracene compound can be used.
  • polyfunctional epoxy resins are preferred.
  • the description in paragraphs 0134 to 0147 of JP-A No. 2004-295116 can be referred to.
  • the blending amount of the crosslinking agent is not particularly defined, but is preferably 2 to 30% by mass, more preferably 3 to 20% by mass, based on the total solid content of the composition. preferable.
  • the composition of the present invention may contain only one type of cross-linking agent, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
  • -Polymerization inhibitor- In the composition of the present invention, it is desirable to add a small amount of a polymerization inhibitor in order to prevent unnecessary thermal polymerization of the polymerizable compound during the production or storage of the composition.
  • the polymerization inhibitor that can be used in the present invention include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6- tert-butylphenol), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like.
  • the addition amount of the polymerization inhibitor is preferably about 0.01 to about 5% by mass with respect to the mass of the whole composition.
  • the composition of the present invention may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
  • Various surfactants may be added to the composition of the present invention from the viewpoint of further improving coatability.
  • various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
  • the composition of the present invention contains a fluorosurfactant
  • the liquid properties (particularly fluidity) when prepared as a coating liquid are further improved. Sex can be improved more. That is, when a film is formed using a coating liquid to which a composition containing a fluorosurfactant is applied, the wettability to the coated surface is reduced by reducing the interfacial tension between the coated surface and the coating liquid. Is improved, and the coating property to the coated surface is improved. For this reason, even when a thin film of about several ⁇ m is formed with a small amount of liquid, it is effective in that it is possible to more suitably form a film having a uniform thickness with small thickness unevenness.
  • the fluorine content in the fluorosurfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass.
  • a fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of coating film thickness and liquid-saving properties, and has good solubility in the composition.
  • fluorosurfactant examples include Megafac F171, F172, F173, F176, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, F780, F781 (above DIC Corporation), Florard FC430, FC431, FC171 (above, Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC1068, SC-381, SC-383, S393, KH-40 (above, manufactured by Asahi Glass Co., Ltd.) and the like.
  • nonionic surfactant examples include glycerol, trimethylolpropane, trimethylolethane, and ethoxylates and propoxylates thereof (for example, glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene Stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester (Pluronic L10, L31, L61, L62 manufactured by BASF, 10R5, 17R2, 25R2, Tetronic 304, 701, 704, 901, 904, 150R1) Solsperse 20000 (Lubrizol Japan Co., Ltd.), and the like.
  • cationic surfactant examples include phthalocyanine derivatives (trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.), organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 (manufactured by Kyoeisha Chemical Co., Ltd.) and W001 (manufactured by Yusho Co., Ltd.).
  • phthalocyanine derivatives trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.
  • organosiloxane polymer KP341 manufactured by Shin-Etsu Chemical Co., Ltd.
  • (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 manufactured by Kyoeisha Chemical Co., Ltd.
  • W001 manufactured by Yusho Co., Ltd.
  • anionic surfactants include W004, W005, W017 (manufactured by Yusho Co., Ltd.) and the like.
  • silicone surfactant examples include “Toray Silicone DC3PA”, “Toray Silicone SH7PA”, “Toray Silicone DC11PA”, “Tore Silicone SH21PA”, “Tore Silicone SH28PA”, “Toray Silicone” manufactured by Toray Dow Corning Co., Ltd.
  • the addition amount of the surfactant is preferably 0.001 to 2.0% by mass, more preferably 0.005 to 2.0% by mass with respect to the total mass of the composition. 1.0% by mass.
  • the composition of the present invention may contain only one type of surfactant or two or more types of surfactant. When two or more types are included, the total amount is preferably within the above range.
  • additives for example, fillers, adhesion promoters, antioxidants, ultraviolet absorbers, anti-aggregation agents, and the like can be blended with the composition of the present invention as necessary.
  • these additives include those described in paragraphs 0155 to 0156 of JP-A No. 2004-295116.
  • the composition of the present invention may contain a sensitizer and a light stabilizer described in paragraph 0078 of JP-A No. 2004-295116, and a thermal polymerization inhibitor described in paragraph 0081 of the same publication.
  • the following compounds are preferably used as the ultraviolet absorber.
  • Organic carboxylic acid, organic carboxylic anhydride-- may contain an organic carboxylic acid having a molecular weight of 1000 or less and / or an organic carboxylic acid anhydride.
  • Specific examples of the organic carboxylic acid compound include aliphatic carboxylic acids and aromatic carboxylic acids.
  • aliphatic carboxylic acids include monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, glycolic acid, acrylic acid, methacrylic acid, oxalic acid, malonic acid, succinic acid, Examples thereof include dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, cyclohexanedicarboxylic acid, cyclohexenedicarboxylic acid, itaconic acid, citraconic acid, maleic acid and fumaric acid, and tricarboxylic acids such as tricarbaryl acid and aconitic acid.
  • monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, glycolic acid, acrylic acid, methacrylic acid, oxalic acid, malonic acid, succinic acid
  • aromatic carboxylic acid examples include carboxylic acids in which a carboxyl group is directly bonded to a phenyl group such as benzoic acid and phthalic acid, and carboxylic acids in which a carboxyl group is bonded to the phenyl group through a carbon bond.
  • carboxylic acids in which a carboxyl group is directly bonded to a phenyl group such as benzoic acid and phthalic acid
  • carboxylic acids in which a carboxyl group is bonded to the phenyl group through a carbon bond examples of the aromatic carboxylic acid.
  • those having a molecular weight of 600 or less, particularly those having a molecular weight of 50 to 500 specifically maleic acid, malonic acid, succinic acid, and itaconic acid are preferred.
  • organic carboxylic acid anhydrides include aliphatic carboxylic acid anhydrides and aromatic carboxylic acid anhydrides. Specific examples include acetic anhydride, trichloroacetic anhydride, trifluoroacetic anhydride, and tetrahydrophthalic anhydride. Succinic anhydride, maleic anhydride, citraconic anhydride, itaconic anhydride, glutaric anhydride, 1,2-cyclohexene dicarboxylic anhydride, n-octadecyl succinic anhydride, 5-norbornene-2,3-dicarboxylic anhydride, etc. An aliphatic carboxylic acid anhydride is mentioned.
  • aromatic carboxylic acid anhydride examples include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and naphthalic anhydride. Of these, those having a molecular weight of 600 or less, particularly those having a molecular weight of 50 to 500, specifically maleic anhydride, succinic anhydride, citraconic anhydride, and itaconic anhydride are preferred.
  • the amount of these organic carboxylic acid and / or organic carboxylic acid anhydride is usually 0.01 to 10% by weight in the total solid content. %, Preferably 0.03 to 5% by weight, more preferably 0.05 to 3% by weight.
  • the composition of the present invention is prepared by mixing the aforementioned components.
  • the components constituting the composition may be combined at once, or may be sequentially combined after each component is dissolved and dispersed in a solvent.
  • the composition may be prepared by dissolving and dispersing all components in a solvent at the same time. If necessary, each component may be suitably used as two or more solutions / dispersions at the time of use (at the time of application). ) May be mixed to prepare a composition.
  • the pigment can be dispersed by mixing (A) a dispersion in which the pigment is dispersed with a dispersant and (B) a dispersion in which the pigment is dispersed with the dispersant.
  • the composition prepared as described above is preferably filtered after using a filter having a pore size of about 0.01 to 3.0 ⁇ m, more preferably about 0.05 to 0.5 ⁇ m, and then used. be able to.
  • the composition of the present invention can form a cured film having excellent heat resistance and color characteristics, it is suitably used for forming a color pattern (colored layer) of a color filter.
  • the composition of the present invention is preferably used for forming a colored pattern such as a color filter used in a solid-state imaging device (for example, CCD, CMOS, etc.) or an image display device such as a liquid crystal display device (LCD). it can. Furthermore, it can be suitably used as a production application for printing ink, inkjet ink, paint, and the like.
  • a color filter for a solid-state imaging device such as a CCD and a CMOS can be suitably used as a production application.
  • the pattern forming method of the present invention includes a colored photosensitive resin composition layer forming step of forming (applying) the colored photosensitive resin composition of the present invention on a support to form a colored photosensitive resin composition layer, It includes an exposure step of exposing the colored photosensitive resin composition layer in a pattern-like manner, and a pattern formation step of developing and removing unexposed portions to form a colored pattern.
  • the pattern forming method of the present invention can be suitably applied to the formation of a colored pattern (pixel) included in a color filter.
  • the support for forming a pattern by the pattern forming method of the present invention is not particularly limited as long as it is a support applicable to pattern formation in addition to a plate-like material such as a substrate.
  • the manufacturing method of the color filter of this invention applies the pattern formation method of this invention, and includes the process of forming a colored pattern on a support body using the pattern formation method of this invention. That is, the method for producing a color filter of the present invention applies the pattern forming method of the present invention.
  • the colored photosensitive resin composition layer of the present invention is applied to a support to form a colored photosensitive resin composition layer.
  • a step of baking the colored photosensitive resin composition layer pre-baking step
  • a step of baking the developed colored pattern post-baking step
  • these steps may be collectively referred to as a pattern forming step.
  • the color filter of the present invention can be suitably obtained by the above production method.
  • the color filter for the solid-state imaging device may be simply referred to as “color filter”.
  • the manufacturing method of the color filter of the present invention applies the pattern forming method of the present invention, and includes forming a colored pattern on the substrate using the pattern forming method of the present invention.
  • the colored photosensitive resin composition layer is formed by applying the composition of the present invention on the support.
  • a solid-state imaging in which an imaging element (light receiving element) such as a CCD (Charge Coupled Device) or a CMOS (Complementary Metal-Oxide Semiconductor) is provided on a substrate (for example, a silicon substrate).
  • An element substrate can be used.
  • the colored pattern in the present invention may be formed on the imaging element forming surface side (front surface) of the solid-state imaging element substrate, or may be formed on the imaging element non-forming surface side (back surface).
  • a light shielding film may be provided between the colored patterns in the solid-state image sensor or on the back surface of the substrate for the solid-state image sensor.
  • an undercoat layer may be provided on the support for improving adhesion with the upper layer, preventing diffusion of substances, or flattening the substrate surface.
  • composition of the present invention As a method for applying the composition of the present invention on the support, various coating methods such as slit coating, ink jet method, spin coating, cast coating, roll coating, screen printing method and the like can be applied.
  • the colored photosensitive resin composition layer coated on the support can be dried (prebaked) at a temperature of 50 ° C. to 140 ° C. for 10 seconds to 300 seconds using a hot plate, oven or the like.
  • the colored photosensitive resin composition layer formed in the colored photosensitive resin composition layer forming step is subjected to pattern exposure through a mask having a predetermined mask pattern using an exposure device such as a stepper, for example. Thereby, a cured film is obtained.
  • radiation light
  • ultraviolet rays such as g-line and i-line are particularly preferable (particularly preferably i-line).
  • Irradiation dose is more preferably 30 ⁇ 1500mJ / cm 2 is preferably 50 ⁇ 1000mJ / cm 2, and most preferably 80 ⁇ 500mJ / cm 2.
  • the thickness of the cured film is preferably 1.0 ⁇ m or less, more preferably 0.1 to 0.9 ⁇ m, and further preferably 0.2 to 0.8 ⁇ m. It is preferable to set the film thickness to 1.0 ⁇ m or less because high resolution and high adhesion can be obtained.
  • a cured film having a thin film thickness of 0.7 ⁇ m or less can also be suitably formed, and the obtained cured film is developed in a pattern forming process described later, thereby forming a thin film.
  • the coloring pattern excellent in developability, surface roughness suppression, and pattern shape can be obtained.
  • the colored photosensitive resin composition layer in the light unirradiated portion in the exposure step is eluted in the alkaline aqueous solution, and only the photocured portion remains.
  • the developer is preferably an organic alkali developer that does not cause damage to the underlying image sensor or circuit.
  • the development temperature is usually 20 to 30 ° C., and the development time is conventionally 20 to 90 seconds. In order to remove the residue more, it may be carried out for 120 to 180 seconds in recent years. Furthermore, in order to further improve residue removability, the process of shaking off the developer every 60 seconds and further supplying a new developer may be repeated several times.
  • alkaline agent used in the developer examples include ammonia water, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide.
  • Organic alkaline compounds such as choline, pyrrole, piperidine, 1,8-diazabicyclo- [5,4,0] -7-undecene, and the concentration of these alkaline agents is 0.001 to 10% by mass, preferably An alkaline aqueous solution diluted with pure water so as to be 0.01 to 1% by mass is preferably used as the developer.
  • an inorganic alkali may be used for the developer, and as the inorganic alkali, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium oxalate, sodium metaoxalate and the like are preferable.
  • a developer composed of such an alkaline aqueous solution it is generally washed (rinsed) with pure water after development.
  • post-bake heat treatment after drying. If a multicolor coloring pattern is formed, the said process can be repeated sequentially for every color, and a cured film can be manufactured. Thereby, a color filter is obtained.
  • the post-baking is a heat treatment after development for complete curing, and a heat curing treatment is usually performed at 100 to 240 ° C., preferably 200 to 240 ° C.
  • This post-bake treatment is performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), a high-frequency heater, or the like so that the coating film after development is in the above-described condition. be able to.
  • Dry etching can be performed by using an etching gas for the colored layer with the patterned photoresist layer as a mask. Specifically, a positive or negative radiation sensitive composition is applied onto the colored layer and dried to form a photoresist layer. In the formation of the photoresist layer, it is preferable to further perform a pre-bake treatment. In particular, as a process for forming a photoresist, a mode in which heat treatment after exposure (PEB) and heat treatment after development (post-bake treatment) are desirable.
  • PEB heat treatment after exposure
  • post-bake treatment post-bake treatment
  • a positive type radiation sensitive composition As the photoresist, for example, a positive type radiation sensitive composition is used.
  • positive type radiation sensitive composition positive type photo sensitive to radiation such as ultraviolet rays (g rays, h rays, i rays), deep ultraviolet rays including excimer lasers, electron beams, ion beams and X rays.
  • a positive resist composition suitable for resist can be used.
  • the radiation g-line, h-line and i-line are preferable, and i-line is particularly preferable.
  • a composition containing a quinonediazide compound and an alkali-soluble resin is preferable.
  • a positive radiation-sensitive composition containing a quinonediazide compound and an alkali-soluble resin indicates that a quinonediazide group is decomposed by irradiation with light having a wavelength of 500 nm or less to produce a carboxyl group, resulting in alkali-solubility from an alkali-insoluble state. It is what you use. Since this positive photoresist has remarkably excellent resolution, it is used for manufacturing integrated circuits such as ICs and LSIs.
  • the quinonediazide compound include a naphthoquinonediazide compound.
  • Examples of commercially available products include FHi622BC (manufactured by FUJIFILM Electronics Materials).
  • the thickness of the photoresist layer is preferably from 0.1 to 3 ⁇ m, more preferably from 0.2 to 2.5 ⁇ m, still more preferably from 0.3 to 2 ⁇ m.
  • the application of the photoresist layer can be suitably performed using the above-described application method in the colored layer.
  • a resist pattern (patterned photoresist layer) provided with a group of resist through holes is formed.
  • the formation of the resist pattern is not particularly limited, and can be performed by appropriately optimizing a conventionally known photolithography technique.
  • a resist through hole group in the photoresist layer By providing a resist through hole group in the photoresist layer by exposure and development, a resist pattern as an etching mask used in the next etching is provided on the colored layer.
  • the exposure of the photoresist layer is performed by exposing the positive-type or negative-type radiation-sensitive composition with g-line, h-line, i-line, etc., preferably i-line, through a predetermined mask pattern. Can do. After the exposure, the photoresist is removed in accordance with a region where a colored pattern is to be formed by developing with a developer.
  • any developer can be used as long as it dissolves the exposed portion of the positive resist and the uncured portion of the negative resist without affecting the colored layer containing the colorant.
  • Combinations of solvents and alkaline aqueous solutions can be used.
  • an alkaline aqueous solution prepared by dissolving an alkaline compound so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 5% by mass is suitable.
  • alkaline compounds include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, Examples include pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene.
  • alkaline aqueous solution is used as a developing solution, generally a washing process is performed with water after development.
  • the resist pattern as an etching mask, patterning is performed by dry etching so that a through hole group is formed in the colored layer. Thereby, a colored pattern is formed.
  • the through hole group is provided in a checkered pattern in the colored layer. Therefore, the first colored pattern in which the through hole group is provided in the colored layer has a plurality of square-shaped first colored pixels in a checkered pattern.
  • Dry etching is preferably performed in the following manner from the viewpoint of forming a pattern cross section closer to a rectangle and reducing damage to the support.
  • a mixed gas of fluorine-based gas and oxygen gas (O 2 ) the first stage etching is performed up to a region (depth) where the support is not exposed, and after this first stage etching, nitrogen gas ( N 2 ) and oxygen gas (O 2 ), and a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed.
  • N 2 nitrogen gas
  • O 2 oxygen gas
  • a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed.
  • the form containing these is preferable.
  • a specific method of dry etching and the first stage etching, second stage etching, and over-etching will be described.
  • Dry etching is performed by obtaining etching conditions in advance by the following method.
  • (1) The etching rate (nm / min) in the first stage etching and the etching rate (nm / min) in the second stage etching are calculated respectively.
  • (2) The time for etching the desired thickness in the first stage etching and the time for etching the desired thickness in the second stage etching are respectively calculated.
  • (3) The first-stage etching is performed according to the etching time calculated in (2).
  • the second stage etching is performed according to the etching time calculated in (2).
  • the etching time may be determined by endpoint detection, and the second stage etching may be performed according to the determined etching time.
  • Overetching time is calculated with respect to the total time of (3) and (4), and overetching is performed.
  • the mixed gas used in the first stage etching step preferably contains a fluorine-based gas and an oxygen gas (O 2 ) from the viewpoint of processing the organic material that is the film to be etched into a rectangular shape.
  • the first stage etching process can avoid damage to the support body by etching to a region where the support body is not exposed.
  • the second etching step and the over-etching step may be performed by etching the region where the support is not exposed by the mixed gas of fluorine-based gas and oxygen gas in the first etching process, and then damaging the support. From the viewpoint of avoidance, it is preferable to perform the etching process using a mixed gas of nitrogen gas and oxygen gas.
  • the ratio between the etching amount in the first stage etching process and the etching amount in the second stage etching process is preferably in the range of more than 0% and not more than 50%. 10 to 20% is more preferable.
  • the etching amount is an amount calculated from the difference between the remaining film thickness to be etched and the film thickness before etching.
  • the etching preferably includes an over-etching process.
  • the overetching process is preferably performed by setting an overetching ratio. Moreover, it is preferable to calculate the overetching ratio from the etching process time to be performed first.
  • the over-etching ratio can be arbitrarily set, but it is preferably 30% or less of the etching processing time in the etching process, and preferably 5 to 25% from the viewpoint of etching resistance of the photoresist and maintaining the rectangularity of the pattern to be etched. Is more preferable, and 10 to 15% is particularly preferable.
  • the resist pattern that is, etching mask
  • the removal of the resist pattern preferably includes a step of applying a stripping solution or a solvent on the resist pattern so that the resist pattern can be removed, and a step of removing the resist pattern using cleaning water.
  • Examples of the step of applying a stripping solution or solvent on the resist pattern so that the resist pattern can be removed include, for example, a step of applying a stripping solution or solvent on at least the resist pattern and stagnating for a predetermined time to perform paddle development Can be mentioned.
  • time to make stripping solution or a solvent stagnant It is preferable that it is several dozen seconds to several minutes.
  • examples of the step of removing the resist pattern using the cleaning water include a step of removing the resist pattern by spraying the cleaning water onto the resist pattern from a spray type or shower type spray nozzle.
  • the washing water pure water can be preferably used.
  • examples of the injection nozzle include an injection nozzle in which the entire support is included in the injection range, and an injection nozzle that is a movable injection nozzle and in which the movable range includes the entire support. When the spray nozzle is movable, the resist pattern is more effectively removed by moving the support pattern from the center of the support to the end of the support more than twice during the process of removing the resist pattern and spraying the cleaning water. be able to.
  • the stripping solution generally contains an organic solvent, but may further contain an inorganic solvent.
  • organic solvents include 1) hydrocarbon compounds, 2) halogenated hydrocarbon compounds, 3) alcohol compounds, 4) ether or acetal compounds, 5) ketones or aldehyde compounds, and 6) ester compounds.
  • the stripping solution preferably contains a nitrogen-containing compound, and more preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound.
  • the acyclic nitrogen-containing compound is preferably an acyclic nitrogen-containing compound having a hydroxyl group.
  • Specific examples include monoisopropanolamine, diisopropanolamine, triisopropanolamine, N-ethylethanolamine, N, N-dibutylethanolamine, N-butylethanolamine, monoethanolamine, diethanolamine, and triethanolamine.
  • Preferred are monoethanolamine, diethanolamine and triethanolamine, and more preferred is monoethanolamine (H 2 NCH 2 CH 2 OH).
  • cyclic nitrogen-containing compounds include isoquinoline, imidazole, N-ethylmorpholine, ⁇ -caprolactam, quinoline, 1,3-dimethyl-2-imidazolidinone, ⁇ -picoline, ⁇ -picoline, ⁇ -picoline, 2- Preferred examples include pipecoline, 3-pipecoline, 4-pipecoline, piperazine, piperidine, pyrazine, pyridine, pyrrolidine, N-methyl-2-pyrrolidone, N-phenylmorpholine, 2,4-lutidine, and 2,6-lutidine.
  • NMP N-methyl-2-pyrrolidone
  • NMP N-methyl-2-pyrrolidone
  • the stripping solution preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound.
  • acyclic nitrogen-containing compound at least one selected from monoethanolamine, diethanolamine, and triethanolamine, and cyclic
  • the nitrogen-containing compound preferably includes at least one selected from N-methyl-2-pyrrolidone and N-ethylmorpholine, and more preferably includes monoethanolamine and N-methyl-2-pyrrolidone.
  • a deposit means an etching product deposited and deposited on the side wall of a colored layer.
  • the content of the non-cyclic nitrogen-containing compound is 9 parts by weight or more and 11 parts by weight or less with respect to 100 parts by weight of the stripping solution, and the content of the cyclic nitrogen-containing compound is 100 parts by weight of the stripping solution. On the other hand, what is 65 to 70 mass parts is desirable. Further, the stripping solution is preferably obtained by diluting a mixture of an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound with pure water.
  • the manufacturing method of this invention may have a well-known process as a manufacturing method of the color filter for solid-state image sensors as a process other than the above as needed.
  • a curing step of curing the formed colored pattern by heating and / or exposure may be included as necessary. Good.
  • the composition according to the present invention when used, for example, clogging of a nozzle or a piping part of a coating apparatus discharge part, contamination due to adhesion, sedimentation, or drying of a colored photosensitive resin composition or pigment in the coating machine occurs. There is a case. Therefore, in order to efficiently clean the contamination caused by the composition of the present invention, it is preferable to use the solvent related to the present composition as the cleaning liquid.
  • the cleaning liquids described in JP2007-2101A, JP2007-2102A, JP2007-281523A, etc. can also be suitably used for cleaning and removing the composition according to the present invention.
  • alkylene glycol monoalkyl ether carboxylates and alkylene glycol monoalkyl ethers are preferred. These solvents may be used alone or in combination of two or more.
  • the mass ratio of the solvent having a hydroxyl group and the solvent having no hydroxyl group is from 1/99 to 99/1, preferably from 10/90 to 90/10, more preferably from 20/80 to 80/20.
  • a mixed solvent of propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME) the ratio is particularly preferably 60/40.
  • a surfactant related to the present composition described above may be added to the cleaning liquid.
  • the color filter of the present invention uses the composition of the present invention, exposure with excellent exposure margin can be performed, and the formed colored pattern (colored pixel) has excellent pattern shape, pattern surface roughness and development. Since the residue in the portion is suppressed, the color characteristics are excellent.
  • the color filter of the present invention can be suitably used for a solid-state imaging device such as a CCD or CMOS, and is particularly suitable for a CCD or CMOS having a high resolution exceeding 1 million pixels.
  • the color filter for a solid-state imaging device of the present invention can be used as a color filter disposed between, for example, a light receiving portion of each pixel constituting a CCD or CMOS and a microlens for condensing light.
  • the size (pattern width) of the colored pattern (colored pixel) is preferably 2.5 ⁇ m or less, more preferably 2.0 ⁇ m or less, and particularly preferably 1.7 ⁇ m or less.
  • the solid-state imaging device of the present invention includes the above-described color filter of the present invention.
  • the configuration of the solid-state imaging device of the present invention is a configuration provided with the color filter in the present invention, and is not particularly limited as long as it is a configuration that functions as a solid-state imaging device. .
  • a transfer electrode comprising a plurality of photodiodes and polysilicon constituting a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) is provided on a support, and the photodiode and the transfer electrode are provided on the support.
  • a solid-state imaging device CCD image sensor, CMOS image sensor, etc.
  • light collecting means for example, a microlens, etc., the same applies hereinafter
  • the color filter of the present invention can be used not only for the solid-state imaging device but also for an image display device such as a liquid crystal display device or an organic EL display device, and is particularly suitable for use in a liquid crystal display device.
  • the liquid crystal display device provided with the color filter of the present invention can display a high-quality image with a good display image color and excellent display characteristics.
  • display devices For the definition of display devices and details of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, Kogyo Kenkyukai, 1990)”, “Display Device (Junsho Ibuki, Industrial Books Co., Ltd.) Issued in the first year).
  • the liquid crystal display device is described, for example, in “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, Industrial Research Co., Ltd., published in 1994)”.
  • the liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
  • the color filter of the present invention may be used in a color TFT liquid crystal display device.
  • the color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”.
  • the present invention is applied to a liquid crystal display device with a wide viewing angle, such as a horizontal electric field driving method such as IPS and a pixel division method such as MVA, STN, TN, VA, OCS, FFS, and R-OCB. it can.
  • the color filter in the present invention can be used for a bright and high-definition COA (Color-filter On Array) system.
  • COA Color-filter On Array
  • the required characteristics for the color filter layer require the required characteristics for the interlayer insulating film, that is, the low dielectric constant and the resistance to the stripping solution, in addition to the normal required characteristics as described above.
  • the color filter of the present invention since a dye multimer excellent in hue is used, the color purity, light transmittance, etc. are good and the color pattern (pixel) is excellent in hue, so the resolution is high and the long-term durability is excellent.
  • a COA type liquid crystal display device can be provided.
  • a resin film may be provided on the color filter layer.
  • the liquid crystal display device provided with the color filter of the present invention includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film.
  • the color filter of the present invention can be applied to a liquid crystal display device composed of these known members.
  • these components for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market (Kentaro Shima CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” Fuji Chimera Research Institute, Ltd., published in 2003) ”.
  • backlighting SID meeting Digest 1380 (2005) (A. Konno et.al), Monthly Display December 2005, pages 18-24 (Yasuhiro Shima), pages 25-30 (Takaaki Yagi), etc. Are listed.
  • the color filter according to the present invention When the color filter according to the present invention is used in a liquid crystal display device, a high contrast can be realized when combined with a conventionally known three-wavelength tube of a cold cathode tube, and further, red, green and blue LED light sources (RGB-LED).
  • RGB-LED red, green and blue LED light sources
  • the solution was added dropwise to obtain a photosensitive transparent resin solution. After cooling to room temperature, about 2 g of the photosensitive transparent resin solution was sampled and heated and dried at 180 ° C. for 20 minutes to measure the non-volatile content. With reference to this, the non-volatile content was added to the previously synthesized photosensitive transparent resin solution.
  • a solution of a photosensitive resin was prepared by adding cyclohexanone so that the amount of the resin was 20% by weight.
  • the obtained photosensitive transparent resin 1 (resin 1) had a weight average molecular weight Mw of 21000 and an ethylenically unsaturated double bond equivalent of 470.
  • the acid value was 50 mgKOH / g.
  • Resins 2 and 3 were obtained in the same manner as in Synthesis Example 1 except that the type and amount of reagent used were changed.
  • Resin 2 has a weight average molecular weight of 11,000, an acid value of 150 mgKOH / g, and does not contain an ethylenically unsaturated double bond.
  • Resin 3 had a weight average molecular weight of 12,000, an acid value of 37 mgKOH / g, and an ethylenically unsaturated double bond equivalent of 963.
  • (C) Resins 4-7 were obtained by changing the reaction time in the synthesis of resin 1.
  • the weight average molecular weight of Resin 4 was 8000, the acid value was 50 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 470.
  • the weight average molecular weight of the resin 5 was 38000, the acid value was 50 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 470.
  • the weight average molecular weight of the resin 6 was 40000, the acid value was 150 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 470.
  • the weight average molecular weight of the resin 7 was 100,000, the acid value was 50 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 470.
  • Resins 10 and 11 were obtained by changing the reaction time in the synthesis of resin 2.
  • the resin 10 has a weight average molecular weight of 42,000, an acid value of 150 mgKOH / g, and does not contain an ethylenically unsaturated double bond.
  • Resin 11 has a weight average molecular weight of 75,000, an acid value of 150 mgKOH / g, and does not contain an ethylenically unsaturated double bond.
  • Resins 12 and 13 were obtained by changing the reaction time in the synthesis of resin 3.
  • the weight average molecular weight of the resin 12 was 45000, the acid value was 37 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 963.
  • the weight average molecular weight of the resin 13 was 62000, the acid value was 37 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 963.
  • the pigment dispersant 2 which is a phosphoric acid type dispersant represented by the said General formula (3).
  • the acid value of the obtained pigment dispersant 2 was 166.
  • the pigment dispersion is further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.). I did it.
  • This dispersion treatment was repeated 10 times to obtain a red pigment dispersion.
  • red pigment dispersion containing orange pigment > 1.38 parts by weight of red pigment (CI Pigment Red254), 3.02 parts by weight of red pigment (CI Pigment Red177), 1.23 parts by weight of yellow pigment (CI Pigment Yellow 139) , 5.44 parts by mass of an orange pigment (CI Pigment Orange 71), 1.23 parts of the pigment derivative shown in Table 1 below, 6.80 parts by mass of the pigment dispersant shown in Table 1 below, and PGMEA
  • a mixed liquid composed of 80.90 parts by mass was mixed and dispersed by a bead mill (zirconia beads 0.3 mm diameter) for 3 hours to prepare a pigment dispersion.
  • This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a red pigment dispersion containing an orange pigment.
  • This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism.
  • This dispersion treatment was repeated 10 times to obtain a green pigment dispersion.
  • Table 1 C.I. I. Pigment Green 36 containing a green pigment dispersion is used as PG36, C.I. I. The case of using a green pigment dispersion containing Pigment Green 7 was designated as PG7.
  • This dispersion treatment was repeated 10 times to obtain a blue pigment dispersion.
  • a mixed liquid comprising 20.34 parts by mass of a black pigment (titanium black or carbon black), 10.40 parts by mass of a pigment dispersant shown in Table 1 below, and 69.26 parts by mass of PGMEA
  • a pigment dispersion was prepared by mixing and dispersing for 3 hours using (zirconia beads 0.3 mm diameter). This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism.
  • Titanium black was prepared by the method described in paragraph number 0387 of JP2012-150468A.
  • carbon black the one described in paragraph number 0267 of JP2011-203506A was used.
  • Table 1 the case of using a black pigment dispersion containing titanium black was described as titanium black, and the case of using a black pigment dispersion containing carbon black as carbon black.
  • This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism.
  • This dispersion treatment was repeated 10 times to obtain a co-dispersion liquid containing a red pigment and a black pigment.
  • (B) / total pigment concentration 0.048, in the case of black pigment dispersion 1.80 parts
  • (B) / total pigment concentration 0.048, in the case of green pigment dispersion 4.08 parts
  • (B) / total pigment concentration 0.048, in the case of blue pigment dispersion 3.83 parts ⁇ resin (the one described in Table 1) 1.90 parts ⁇ polymerizable compound (A-DPH-12E, Shin-Nakamura Chemical Co., Ltd.) 0.56 parts Photopolymerization initiator (OXE-02, manufactured by BASF) 0.80 parts Surfactant (Megafac F-781, manufactured by DIC Corporation) 0% PGMEA solution) 4.17 parts PGMEA 21.26 parts p-methoxyphenol 0.003 parts
  • Pigment dispersant 5 Disperbyk 111, manufactured by Big Chemie Japan
  • (B) / (total pigment) represents (amount of black pigment, green pigment or blue pigment) / (total amount of all pigments) (unit: mass ratio).
  • (D) Pigment dispersant (for A) indicates the type of pigment dispersant used in the red pigment dispersion, and (D) Pigment dispersant (for B) is a black pigment dispersion or a green pigment dispersion. Or the kind of pigment dispersant used for the blue pigment dispersion is shown. The same applies to pigment derivatives.
  • TMAH tetramethylammonium hydroxide
  • the silicon wafer with the undercoat layer used for evaluation was produced as follows. On an 8-inch silicon wafer, CT-4000L (manufactured by FUJIFILM Electronics Materials Co., Ltd.) is uniformly applied by spin coating to form a coating film, and the formed coating film is processed in an oven at 220 ° C. for 1 hour. Then, the coating film was cured to form an undercoat layer. The spin coating speed was adjusted so that the thickness of the coating film after the heat treatment was about 0.1 ⁇ m.
  • the photosensitive resin composition of Comparative Example which contains a resin containing an acid group, but the weight average molecular weight of the resin is not 38000 or less, has large spectral fluctuations and more litho residues. .
  • the photosensitive resin composition of a comparative example is inferior to fine pattern resolution.
  • the photosensitive resin composition of the example having (C) a resin containing an acid group and having a weight average molecular weight of 38000 or less has a small spectral fluctuation (excellent spectral variability), and is more It was found that there was little residue.
  • the photosensitive resin composition of an Example is excellent in fine pattern resolution.

Abstract

Provided are: a coloring photosensitive resin composition which has small spectral variation and enables achievement of excellent resolution of a fine pattern; and a cured film, a color filter, a method for producing a color filter, a solid-state imaging element and an image display device, each of which utilizes the coloring photosensitive resin composition. This coloring photosensitive resin composition contains (A) a pigment, (B) another pigment, (C) a resin which has a weight average molecular weight of 38,000 or less and contains an acid group, (D) a pigment dispersant and (E) a pigment derivative. The pigment (A) is composed of at least one pigment that is selected from among red pigments and orange pigments, and the mass ratio of a red pigment relative to the pigment (A), namely (red pigment)/(pigment (A)) is 0.3 or more. The pigment (B) is composed of at least one pigment that is selected from among green pigments, blue pigments and black pigments, and the mass ratio of the pigment (B) relative to all the pigments contained in the composition, namely (pigment (B)/all pigments) is 0.005-0.25.

Description

着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置Colored photosensitive resin composition, cured film, color filter, method for producing color filter, solid-state imaging device, and image display device
 本発明は、液晶表示素子(LCD)や固体撮像素子(CCD、CMOSなど)等に用いられるカラーフィルタを作製するのに好適な着色感光性樹脂組成物、前記組成物により作製された着色領域を有するカラーフィルタ、および、前記カラーフィルタを有する固体撮像素子、有機LED用液晶表示装置などの画像表示装置に関する。 The present invention relates to a colored photosensitive resin composition suitable for producing a color filter used for a liquid crystal display element (LCD), a solid-state imaging element (CCD, CMOS, etc.), and a colored region produced by the composition. The present invention relates to a color filter having a color filter, a solid-state imaging device having the color filter, and an image display device such as an organic LED liquid crystal display device.
 近年、パーソナルコンピュータ、特に大画面液晶テレビの発達に伴い、液晶ディスプレイ(LCD)、とりわけカラー液晶ディスプレイの需要が増加する傾向にある。更なる高画質化の要求から有機ELディスプレイの普及も待ち望まれている。一方、デジタルカメラ、カメラ付き携帯電話の普及から、CCDイメージセンサーなどの固体撮像素子も需要が大きく伸びている。
 これらのディスプレイや光学素子のキーデバイスとしてカラーフィルタが使用されており、更なる高画質化の要求とともにコストダウンへの要求が高まっている。このようなカラーフィルタは、通常、赤(R)、緑(G)、および青(B)の3原色の着色パターンを備えており、表示デバイスや撮像素子において、通過する光を3原色へ分画する役割を果たしている。
In recent years, with the development of personal computers, particularly large-screen liquid crystal televisions, the demand for liquid crystal displays (LCD), especially color liquid crystal displays, has been increasing. The spread of organic EL displays is also awaited due to the demand for higher image quality. On the other hand, with the widespread use of digital cameras and camera-equipped mobile phones, the demand for solid-state imaging devices such as CCD image sensors has greatly increased.
Color filters are used as key devices for these displays and optical elements, and the demand for cost reduction is increasing along with the demand for higher image quality. Such a color filter is usually provided with a coloring pattern of three primary colors of red (R), green (G), and blue (B), and in a display device or an image sensor, light passing therethrough is divided into three primary colors. It plays a role to draw.
 カラーフィルタに使用されている着色感光性樹脂組成物としては、例えば、複数の色素担体(顔料)を有する赤色着色感光性樹脂組成物が特許文献1および2に記載されている。 Patent Documents 1 and 2 describe red colored photosensitive resin compositions having a plurality of dye carriers (pigments), for example, as colored photosensitive resin compositions used in color filters.
特開2010-61150号公報(特許第5210286号)JP 2010-61150 A (Patent No. 5210286) 特開2005-181384号公報(特許第4538220号)JP 2005-181384 A (Patent No. 4538220)
 特許文献1および2のように、赤色の透過光、分光を制御、調整するためには、複数の色素担体を用いる方法、すなわち赤色顔料に緑色顔料、青色顔料、および黒色顔料のうち1種以上の顔料を添加、混合する方法が知られている。
 しかしながら、複数の顔料を混合させた後に経時すると、添加した緑色顔料、青色顔料および黒色顔料が凝集し、分光が変動してしまうという問題があることが分かった。さらに、顔料が凝集してしまうと、微細パターンの解像性が劣るという問題もある。
As in Patent Documents 1 and 2, in order to control and adjust red transmitted light and spectrum, a method using a plurality of dye carriers, that is, one or more of a red pigment, a green pigment, a blue pigment, and a black pigment A method of adding and mixing the above pigments is known.
However, it has been found that when a plurality of pigments are mixed with time, the added green pigment, blue pigment, and black pigment are aggregated and the spectrum is changed. Furthermore, when the pigment is aggregated, there is a problem that the resolution of the fine pattern is inferior.
 本発明は、かかる課題を解決するものであって、複数の顔料を含んでいても分光の変動が小さいとともに、微細パターンの解像性に優れる着色感光性樹脂組成物、前記着色感光性樹脂組成物を利用した、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置に関する。 The present invention solves such a problem, and even if it contains a plurality of pigments, the spectral variation of the spectrum is small, and the colored photosensitive resin composition is excellent in the resolution of fine patterns, and the colored photosensitive resin composition The present invention relates to a cured film, a color filter, a manufacturing method of a color filter, a solid-state imaging device, and an image display device using an object.
 本発明者らは詳細に検討した結果、重量平均分子量が38000以下の所定の樹脂を用いることにより、上記課題を解決しうることを見出した。
 具体的には、下記手段<1>により、好ましくは、<2>~<17>により、上記課題は解決された。
<1>(A)顔料、(B)顔料、および(C)酸基を含有し重量平均分子量が38000以下である樹脂、(D)顔料分散剤、および(E)顔料誘導体を含む着色感光性樹脂組成物であって、(A)顔料は、赤色顔料および橙色顔料から選択される少なくとも1種からなり、かつ、(A)顔料に対する赤色顔料の質量比(赤色顔料/(A)顔料)が0.3以上であり、(B)顔料は、緑色顔料、青色顔料および黒色顔料から選択される少なくとも1種からなり、着色感光性樹脂組成物に含まれる全顔料に対する(B)顔料の質量比((B)顔料/全顔料)が0.005~0.25であることを特徴とする着色感光性樹脂組成物。
<2>(D)顔料分散剤が、(D-1)少なくとも一つの末端に水酸基を有する重合体(POH)もしくは少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2)と、トリカルボン酸無水物もしくはテトラカルボン酸二無水物とを反応させてなるカルボン酸系分散剤、(D-2)下記一般式(3)で表されるリン酸系分散剤、(D-3)下記一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体、および(D-4)主鎖に窒素原子を含むグラフト共重合体から選択される少なくとも1種である、<1>に記載の着色感光性樹脂組成物。
Figure JPOXMLDOC01-appb-C000010
(一般式(3)中、R3は数平均分子量400~30000のポリエステル構造を表し、yは1または2を表す。yが2の場合、複数のR3は、それぞれ、同一であっても異なっていてもよい。)
Figure JPOXMLDOC01-appb-C000011
(一般式(1)および(2)中、R1~R6は、それぞれ、水素原子、又は1価の有機基を表し、X1及びX2は、それぞれ、-CO-、-C(=O)O-、-CONH-、-OC(=O)-、又はフェニレン基を表し、L1及びL2は、それぞれ、単結合、又は2価の有機連結基を表し、A1及びA2は、それぞれ、1価の有機基を表し、m及びnは、それぞれ、2~8の整数を表し、p及びqは、それぞれ、1~100の整数を表す。)
<3>(E)顔料誘導体が、一般式(I)で表される顔料誘導体、一般式(II)で表される顔料誘導体、および一般式(III)で表される顔料誘導体の少なくとも1種である、<1>または<2>に記載の着色感光性樹脂組成物。
Figure JPOXMLDOC01-appb-C000012
(一般式(I)中、Dyeはn価の有機色素残基を表し、Xは単結合、-CONH-Y2-、-SO2NH-Y2-または-CH2NHCOCH2NH-Y2-(Y2は置換基を有していても良いアルキレン基またはアリーレン基を表す。)を表し、Y1は-NH-または-O-を表し、Zは、nが1を表す場合は水酸基、アルコキシ基、下記一般式(I-1)で表される基、または-NH-X-Dye(Xは一般式(I)中のXと同義である)を表し、nが2~4の整数を表す場合はそれぞれ水酸基、アルコキシ基、または下記一般式(I-1)で表される基を表し、R1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、R1とR2が互いに結合して窒素原子を含むヘテロ環を形成してもよい。mは1~6の整数を表し、nは1~4の整数を表す。nが2以上の場合、複数のX、Y1、R1、およびR2は、それぞれ、同一であってもよく、異なっていてもよい。)
Figure JPOXMLDOC01-appb-C000013
(一般式(I-1)中、Y3は-NH-または-O-を表す。R1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、R1とR2が互いに結合して窒素原子を含むヘテロ環を形成してもよい。mは1~6の整数を表す)
Figure JPOXMLDOC01-appb-C000014
(一般式(II)中、Dyeは置換基を有していてもよいキノフタロン残基を表し、X1は、-NR’SO2-、-SO2NR’-、-CONR’-、-CH2NR’COCH2NR’-、または-NR’CO-を表し、X2は、置換基を有していてもよい炭素数が6~20のアリーレン基、または置換基を有していてもよい炭素数が4~20の複素芳香環基を表し、これらの基は、-NR’-、-O-、-SO2-または-CO-から選ばれる2価の連結基で相互に結合されていてもよい。X3は、-NR’-または-O-を表す。R’は、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。AおよびBは、それぞれ、下記一般式(II-1)で表される基、下記一般式(II-2)で表される基、-O-(CH2n-R8、-OR9、-NR1011、-Cl、-Fおよび-X3-X2-X1-Dyeから選ばれる基を表し、R8は置換されていてもよい含窒素複素環残基を表し、R9、R10、R11は、それぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基または置換基を有していてもよい炭素数が6~20のアリール基を表し、nは0~20の整数を表す。AおよびBのいずれか一方は、下記一般式(II-1)で表される基、下記一般式(II-2)で表される基、-O-(CH2)n-R8、-OR9または-NR1011であり、tは1~3の整数を表す。tが2以上の場合、複数のX1、X2、X3、A、およびBは同一であってもよく、異なっていてもよい。)
Figure JPOXMLDOC01-appb-C000015
(一般式(II-1)中、Y1は-NR’-または-O-を表し、Y2は置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基、または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、これらの基は、-NR’-、-O-、-SO2-、-CO-から選ばれる2価の連結基で相互に結合されていてもよい。R’は、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R1およびR2はそれぞれ、置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す。R1とR2が一体となって、更なる窒素原子、酸素原子または硫黄原子を含み置換されていてもよい複素環構造を形成してもよい。
一般式(II-2)中、Z1はトリアジン環と窒素原子を結ぶ単結合、-NR’-、-NR’-G-CO-、-NR’-G-CONR’’-、-NR’-G-SO2-、-NR’-G-SO2NR’’-、-O-G-CO-、-O-G-CONR’-、-O-G-SO2-または-O-G-SO2NR’-を表し、Gは置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、R’およびR’’は、それぞれ水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R3、R4、R5、およびR6はそれぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表し、R7は置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す。)
一般式(III)
Figure JPOXMLDOC01-appb-C000016
(一般式(III)中、Aは、X-Yとともにアゾ顔料を形成しうる成分を表す。Xは、単結合、または下記群A中の二価の連結基から選択される基を表す。Yは、下記一般式(III-2)で表される基を表す。)
群A:
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
(一般式(III-2)中、Zは、炭素数1~5のアルキレン基を表し、R2は、炭素数1~4のアルキル基、または窒素原子を含む5または6員飽和ヘテロ環を表す。aは1または2を表す。*はXとの結合部位を表す。)
<4>(A)顔料が橙色顔料を含む、<1>~<3>のいずれかに記載の着色感光性樹脂組成物。
<5>全顔料の合計濃度が、着色感光性樹脂組成物の全固形分に対して、30質量%以上である、<1>~<4>のいずれかに記載の着色感光性樹脂組成物。
<6>(C)酸基を含有し重量平均分子量が38000以下である樹脂の含有量が、組成物の全固形分に対して25質量%以下である、<1>~<5>のいずれかに記載の着色感光性樹脂組成物。
<7>(A)顔料が、C.I.Pigment Red254、C.I.Pigment Red177およびC.I.Pigment Orange71から選択される少なくとも1種を含む、<1>~<6>のいずれかに記載の着色感光性樹脂組成物。
<8>さらに、重合性基を4つ以上有する重合性化合物を含む、<1>~<7>のいずれかに記載の着色感光性樹脂組成物。
<9>さらに、フッ素系界面活性剤を含む、<1>~<8>のいずれかに記載の着色感光性樹脂組成物。
<10>さらに、オキシム系重合開始剤を含む、<1>~<9>のいずれかに記載の着色感光性樹脂組成物。
<11>さらに、黄色顔料を含む、<1>~<10>のいずれかに記載の着色感光性樹脂組成物。
<12>カラーフィルタの着色領域形成に用いられる<1>~<11>のいずれかに記載の着色感光性樹脂組成物。
<13><1>~<12>のいずれかに記載の着色感光性樹脂組成物を硬化してなる硬化膜。
<14><1>~<12>のいずれかに記載の着色感光性樹脂組成物を支持体上に適用して着色感光性樹脂組成物層を形成する工程と、着色感光性樹脂組成物層をパターン状に露光する工程と、未露光部を現像除去して着色パターンを形成する工程とを含むカラーフィルタの製造方法。
<15><1>~<12>のいずれかに記載の着色感光性樹脂組成物を支持体上に適用して着色感光性樹脂組成物層を形成し、硬化して着色層を形成する工程、着色層上にフォトレジスト層を形成する工程、露光および現像することによりフォトレジスト層をパターニングしてレジストパターンを得る工程、およびレジストパターンをエッチングマスクとして着色層をドライエッチングする工程を含む、カラーフィルタの製造方法。
<16><13>に記載の硬化膜を有するカラーフィルタ、または<14>または<15>に記載のカラーフィルタの製造方法によって製造したカラーフィルタ。
<17><16>に記載のカラーフィルタを有する固体撮像素子または画像表示装置。
As a result of detailed studies, the present inventors have found that the above problem can be solved by using a predetermined resin having a weight average molecular weight of 38000 or less.
Specifically, the above problem has been solved by the following means <1>, preferably <2> to <17>.
<1> Colored photosensitivity containing (A) pigment, (B) pigment, and (C) a resin containing an acid group and having a weight average molecular weight of 38000 or less, (D) a pigment dispersant, and (E) a pigment derivative. (A) The pigment is at least one selected from a red pigment and an orange pigment, and (A) the mass ratio of the red pigment to the pigment (red pigment / (A) pigment) is It is 0.3 or more, and the (B) pigment comprises at least one selected from a green pigment, a blue pigment and a black pigment, and the mass ratio of the (B) pigment to the total pigment contained in the colored photosensitive resin composition A colored photosensitive resin composition, wherein ((B) pigment / total pigment) is 0.005 to 0.25.
<2> (D) a pigment dispersant is (D-1) a polymer (POH) having a hydroxyl group at at least one terminal or a polymer (PNH 2 ) having a primary amino group at at least one terminal; A carboxylic acid-based dispersant obtained by reacting a tricarboxylic acid anhydride or a tetracarboxylic dianhydride; (D-2) a phosphoric acid-based dispersant represented by the following general formula (3); (D-3) At least one selected from a copolymer containing a structural unit represented by any one of the general formula (1) and the following general formula (2), and (D-4) a graft copolymer containing a nitrogen atom in the main chain The colored photosensitive resin composition according to <1>, which is a seed.
Figure JPOXMLDOC01-appb-C000010
(In general formula (3), R 3 represents a polyester structure having a number average molecular weight of 400 to 30,000, and y represents 1 or 2. When y is 2, a plurality of R 3 may be the same. May be different.)
Figure JPOXMLDOC01-appb-C000011
(In the general formulas (1) and (2), R 1 to R 6 each represents a hydrogen atom or a monovalent organic group, and X 1 and X 2 represent —CO—, —C (= O) represents O—, —CONH—, —OC (═O) —, or a phenylene group, and L 1 and L 2 each represent a single bond or a divalent organic linking group, and A 1 and A 2 Each represents a monovalent organic group, m and n each represents an integer of 2 to 8, and p and q each represents an integer of 1 to 100.)
<3> (E) The pigment derivative is at least one of a pigment derivative represented by the general formula (I), a pigment derivative represented by the general formula (II), and a pigment derivative represented by the general formula (III) The colored photosensitive resin composition according to <1> or <2>.
Figure JPOXMLDOC01-appb-C000012
(In the general formula (I), Dye represents an n-valent organic dye residue, X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 — or —CH 2 NHCOCH 2 NH—Y 2. — (Y 2 represents an optionally substituted alkylene group or arylene group), Y 1 represents —NH— or —O—, and Z represents a hydroxyl group when n represents 1. Represents an alkoxy group, a group represented by the following general formula (I-1), or —NH—X-Dye (where X is as defined for X in the general formula (I)), and n is 2 to 4. In the case of representing an integer, each represents a hydroxyl group, an alkoxy group, or a group represented by the following general formula (I-1), R 1 and R 2 each represents an alkyl group which may have a substituent, optionally R 1 and R 2 are bonded to each other to form a heterocyclic ring containing a nitrogen atom .m is an integer of 1-6, If .n represents an integer of 1 to 4 is 2 or more, plural X, Y 1, R 1, and R 2, respectively, may be the same or may be different.)
Figure JPOXMLDOC01-appb-C000013
(In General Formula (I-1), Y 3 represents —NH— or —O—. R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 May be bonded to each other to form a heterocyclic ring containing a nitrogen atom, and m represents an integer of 1 to 6.
Figure JPOXMLDOC01-appb-C000014
(In the general formula (II), Dye represents an optionally substituted quinophthalone residue, and X 1 represents —NR′SO 2 —, —SO 2 NR′—, —CONR′—, —CH 2 NR′COCH 2 NR′— or —NR′CO—, wherein X 2 may have a substituent, an arylene group having 6 to 20 carbon atoms, or a substituent Represents a heteroaromatic group having 4 to 20 carbon atoms, and these groups are bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO—. X 3 represents —NR′— or —O—, and R ′ represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or a substituent. An alkenyl group having 2 to 20 carbon atoms which may be substituted, or an aryl group having 6 to 20 carbon atoms which may have a substituent. It is B, and a group represented by the following general formula (II-1), a group represented by the following general formula (II-2), -O- ( CH 2) n -R 8, -OR 9, - NR 10 R 11 , —Cl, —F and —X 3 —X 2 —X 1 —Dye represent a group, R 8 represents an optionally substituted nitrogen-containing heterocyclic residue, R 9 , R 10 and R 11 are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or Represents an aryl group having 6 to 20 carbon atoms which may have a substituent, and n represents an integer of 0 to 20. One of A and B is represented by the following general formula (II-1). is the group, the group represented by the following general formula (II-2), -O- ( CH 2) n-R 8, is -OR 9 or -NR 10 R 11, t is 1 to 3 If .t represents an integer of 2 or more, a plurality of X 1, X 2, X 3 , A, and B may be the same or different.)
Figure JPOXMLDOC01-appb-C000015
(In General Formula (II-1), Y 1 represents —NR′— or —O—, and Y 2 represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, or a substituent. An alkenylene group having 2 to 20 carbon atoms which may be substituted, or an arylene group having 6 to 20 carbon atoms which may have a substituent, and these groups are represented by —NR′—, —O— , —SO 2 —, and —CO— may be bonded to each other through a divalent linking group, R ′ is a hydrogen atom, and may have a substituent and has 1 to 20 carbon atoms. R 1 and R 2 represent an alkyl group, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. Each of the alkyl groups having 1 to 20 carbon atoms which may have a substituent, or 2 to 2 carbon atoms which may have a substituent. .R 1 and R 2 representing the 0 alkenyl groups together, further nitrogen atom, heterocyclic structure which may be substituted include an oxygen atom or a sulfur atom may be formed.
In general formula (II-2), Z 1 is a single bond connecting the triazine ring and the nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ″ —, —NR ′. —G—SO 2 —, —NR′—G—SO 2 NR ″ —, —O—G—CO—, —O—G—CONR′—, —O—G—SO 2 — or —O—G —SO 2 NR′—, G is an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or a substituent Represents an arylene group having 6 to 20 carbon atoms which may have a group, and R ′ and R ″ each represents a hydrogen atom and an alkyl group having 1 to 20 carbon atoms which may have a substituent. Represents an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent. an alkenyl group having 1-20 or carbon atoms, which may have a substituent or an aryl group of 6 to 20, alkyl group of R 7 is - 1 carbon atoms, which may have a substituent group 20, Alternatively, it represents an alkenyl group having 2 to 20 carbon atoms which may have a substituent. )
Formula (III)
Figure JPOXMLDOC01-appb-C000016
(In the general formula (III), A represents a component capable of forming an azo pigment together with XY. X represents a single bond or a group selected from divalent linking groups in the following group A. Y represents a group represented by the following general formula (III-2).)
Group A:
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
(In the general formula (III-2), Z represents an alkylene group having 1 to 5 carbon atoms, and R 2 represents an alkyl group having 1 to 4 carbon atoms or a 5- or 6-membered saturated heterocyclic ring containing a nitrogen atom. A represents 1 or 2. * represents a binding site with X.)
<4> (A) The colored photosensitive resin composition according to any one of <1> to <3>, wherein the pigment contains an orange pigment.
<5> The colored photosensitive resin composition according to any one of <1> to <4>, wherein the total concentration of all pigments is 30% by mass or more based on the total solid content of the colored photosensitive resin composition. .
<6> (C) Any one of <1> to <5>, wherein the content of the resin containing an acid group and having a weight average molecular weight of 38000 or less is 25% by mass or less based on the total solid content of the composition A colored photosensitive resin composition according to claim 1.
<7> (A) The pigment is C.I. I. Pigment Red254, C.I. I. Pigment Red177 and C.I. I. The colored photosensitive resin composition according to any one of <1> to <6>, comprising at least one selected from Pigment Orange 71.
<8> The colored photosensitive resin composition according to any one of <1> to <7>, further comprising a polymerizable compound having four or more polymerizable groups.
<9> The colored photosensitive resin composition according to any one of <1> to <8>, further comprising a fluorine-based surfactant.
<10> The colored photosensitive resin composition according to any one of <1> to <9>, further comprising an oxime polymerization initiator.
<11> The colored photosensitive resin composition according to any one of <1> to <10>, further comprising a yellow pigment.
<12> The colored photosensitive resin composition according to any one of <1> to <11>, which is used for forming a colored region of a color filter.
<13> A cured film obtained by curing the colored photosensitive resin composition according to any one of <1> to <12>.
<14> a step of applying the colored photosensitive resin composition according to any one of <1> to <12> on a support to form a colored photosensitive resin composition layer; and a colored photosensitive resin composition layer A method for producing a color filter, which comprises a step of exposing the substrate to a pattern and a step of developing and removing unexposed portions to form a colored pattern.
<15> A step of applying the colored photosensitive resin composition according to any one of <1> to <12> on a support to form a colored photosensitive resin composition layer and curing to form a colored layer Including a step of forming a photoresist layer on the colored layer, a step of patterning the photoresist layer by exposure and development to obtain a resist pattern, and a step of dry etching the colored layer using the resist pattern as an etching mask A method for manufacturing a filter.
<16> A color filter having the cured film according to <13>, or a color filter manufactured by the method for manufacturing a color filter according to <14> or <15>.
<17> A solid-state imaging device or an image display device having the color filter according to <16>.
 本発明によれば、分光の変動性、微細パターンの解像性に優れる着色感光性樹脂組成物、前記着色感光性樹脂組成物を利用した、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置を提供可能となる。 According to the present invention, a colored photosensitive resin composition excellent in spectral variability and fine pattern resolution, a cured film, a color filter, a method for producing a color filter, a solid using the colored photosensitive resin composition, a solid An image sensor and an image display device can be provided.
 以下において、本発明の内容について詳細に説明する。尚、本願明細書において「~」とはその前後に記載される数値を下限値および上限値として含む意味で使用される。 本明細書において、全固形分とは、着色感光性樹脂組成物の全組成から溶剤を除いた成分の総質量をいう。 Hereinafter, the contents of the present invention will be described in detail. In the present specification, “to” is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value. In the present specification, the total solid content means the total mass of components excluding the solvent from the total composition of the colored photosensitive resin composition.
 本明細書における基(原子団)の表記に於いて、置換および無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば、「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
 また、本明細書中における「放射線」とは、例えば、水銀灯の輝線スペクトル、エキシマレーザーに代表される遠紫外線、極紫外線(EUV光)、X線、電子線等を意味する。また、本明細書において光とは、活性光線または放射線を意味する。本明細書中における「露光」とは、特に断らない限り、水銀灯、エキシマレーザーに代表される遠紫外線、X線、EUV光などによる露光のみならず、電子線、イオンビーム等の粒子線による描画も露光に含める。
In the description of the group (atomic group) in this specification, the description which does not describe substitution and unsubstituted includes the thing which has a substituent with the thing which does not have a substituent. For example, the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In addition, “radiation” in the present specification means, for example, an emission line spectrum of a mercury lamp, far ultraviolet rays represented by excimer laser, extreme ultraviolet rays (EUV light), X-rays, electron beams, and the like. In the present specification, light means actinic rays or radiation. Unless otherwise specified, “exposure” in this specification is not only exposure with far-ultraviolet rays such as mercury lamps and excimer lasers, X-rays, EUV light, but also drawing with particle beams such as electron beams and ion beams. Are also included in the exposure.
 また、本明細書において、“(メタ)アクリレート”はアクリレートおよびメタクリレートの双方、または、いずれかを表し、“(メタ)アクリル”はアクリルおよびメタクリルの双方、または、いずれかを表し、“(メタ)アクリロイル”はアクリロイルおよびメタクリロイルの双方、または、いずれかを表す。
 また、本明細書において、“単量体”と“モノマー”とは同義である。本明細書における単量体は、オリゴマーおよびポリマーと区別され、重量平均分子量が2,000以下の化合物をいう。本明細書において、重合性化合物とは、重合性官能基を有する化合物のことをいい、単量体であっても、ポリマーであってもよい。重合性官能基とは、重合反応に関与する基を言う。
 本明細書において、重量平均分子量および数平均分子量は、GPC測定によるポリスチレン換算値として定義される。本明細書において、重量平均分子量(Mw)及び数平均分子量(Mn)は、例えば、HLC-8220(東ソー(株)製)を用い、カラムとしてTSKgel Super AWM―H(東ソー(株)製、6.0mmID×15.0cm)を、溶離液として10mmol/L リチウムブロミドNMP(N-メチルピロリジノン)溶液を用いることによって求めることができる。
In this specification, “(meth) acrylate” represents both and / or acrylate and methacrylate, “(meth) acryl” represents both and / or acryl and “(meth) acrylic” ) "Acryloyl" represents both and / or acryloyl and methacryloyl.
In the present specification, “monomer” and “monomer” are synonymous. The monomer in this specification is distinguished from an oligomer and a polymer, and refers to a compound having a weight average molecular weight of 2,000 or less. In the present specification, the polymerizable compound means a compound having a polymerizable functional group, and may be a monomer or a polymer. The polymerizable functional group refers to a group that participates in a polymerization reaction.
In this specification, a weight average molecular weight and a number average molecular weight are defined as a polystyrene conversion value by GPC measurement. In this specification, the weight average molecular weight (Mw) and the number average molecular weight (Mn) are, for example, HLC-8220 (manufactured by Tosoh Corporation), and TSKgel Super AWM-H (manufactured by Tosoh Corporation, 6) as a column. 0.0 mm ID × 15.0 cm) can be determined by using a 10 mmol / L lithium bromide NMP (N-methylpyrrolidinone) solution as the eluent.
 本明細書において、化学式中のMeはメチル基を、Etはエチル基を、Prはプロピル基を、Buはブチル基を、Phはフェニル基をそれぞれ示す。 In this specification, Me in the chemical formula represents a methyl group, Et represents an ethyl group, Pr represents a propyl group, Bu represents a butyl group, and Ph represents a phenyl group.
 本明細書において「工程」との語は、独立した工程だけではなく、他の工程と明確に区別できない場合であってもその工程の所期の作用が達成されれば、本用語に含まれる。 In this specification, the term “process” is not limited to an independent process, and is included in the term if the intended action of the process is achieved even when it cannot be clearly distinguished from other processes. .
<着色感光性樹脂組成物>
 本発明の着色感光性樹脂組成物(以下、単に、「本発明の組成物」ということがある)は、(A)顔料、(B)顔料、(C)重量平均分子量が38000以下の酸基を含有する樹脂、(D)顔料分散剤、および(E)顔料誘導体を含む着色感光性樹脂組成物であって、(A)顔料は、赤色顔料および橙色顔料から選択される少なくとも1種からなり、かつ、(A)顔料に対する赤色顔料の質量比(赤色顔料/(A)顔料)が0.3以上であり、(B)顔料は、緑色顔料、青色顔料および黒色顔料から選択される少なくとも1種からなり、前記組成物に含まれる全顔料に対する(B)顔料の質量比((B)顔料/全顔料)が0.005~0.25であることを特徴とする。
<Colored photosensitive resin composition>
The colored photosensitive resin composition of the present invention (hereinafter sometimes simply referred to as “the composition of the present invention”) is an (A) pigment, (B) pigment, and (C) an acid group having a weight average molecular weight of 38000 or less. A colored photosensitive resin composition comprising: (D) a pigment dispersant, and (E) a pigment derivative, wherein (A) the pigment comprises at least one selected from a red pigment and an orange pigment And (A) the mass ratio of the red pigment to the pigment (red pigment / (A) pigment) is 0.3 or more, and (B) the pigment is at least one selected from a green pigment, a blue pigment and a black pigment It consists of seeds, and the mass ratio of (B) pigment to all pigments contained in the composition ((B) pigment / total pigment) is 0.005 to 0.25.
 赤色顔料を必須成分とする(A)顔料に、緑色顔料、青色顔料および黒色顔料から選択される少なくとも1種の(B)顔料を添加することによって、透過光を制御できる。このような場合、添加した(B)顔料が凝集し、分光が変動してしまっていた。本発明では、(C)樹脂として、重量平均分子量が38000以下の樹脂を用いることでかかる課題を解決しうることを見出した。さらに、リソ残渣も低減できることを見出した。特に、本発明の組成物では、固形分中の顔料濃度が高い方がこれらの効果が効果的に発揮される傾向にあることが分かった。
 以下、本発明の組成物について詳細に説明する。
The transmitted light can be controlled by adding at least one (B) pigment selected from a green pigment, a blue pigment and a black pigment to the (A) pigment containing the red pigment as an essential component. In such a case, the added (B) pigment was aggregated and the spectrum was changed. In this invention, it discovered that this subject could be solved by using resin whose weight average molecular weight is 38000 or less as (C) resin. Furthermore, it discovered that a litho residue could also be reduced. In particular, in the composition of this invention, it turned out that the one where the pigment density | concentration in solid content is high exists in the tendency for these effects to be exhibited effectively.
Hereinafter, the composition of the present invention will be described in detail.
<<(A)顔料>>
 本発明における(A)顔料は、赤色顔料および橙色顔料から選択される少なくとも1種からなり、かつ、(A)顔料に対する赤色顔料の質量比(赤色顔料/(A)顔料)が0.3以上である。すなわち、赤色顔料を必須成分として含み、さらに、橙色顔料を含んでいても良い。(A)顔料に対する赤色顔料の質量比(赤色顔料/(A)顔料)は0.4以上であることが好ましく、0.44以上であることがより好ましい。 本発明で使用する赤色顔料としては、従来公知の種々の赤色顔料を用いることができる。前記赤色顔料としては、高透過率であることが好ましい。
<< (A) Pigment >>
The (A) pigment in the present invention comprises at least one selected from a red pigment and an orange pigment, and the mass ratio of the red pigment to the (A) pigment (red pigment / (A) pigment) is 0.3 or more. It is. That is, a red pigment may be included as an essential component, and an orange pigment may be further included. (A) The mass ratio of the red pigment to the pigment (red pigment / (A) pigment) is preferably 0.4 or more, and more preferably 0.44 or more. As the red pigment used in the present invention, various conventionally known red pigments can be used. The red pigment preferably has a high transmittance.
 赤色顔料としては、モノアゾレーキ顔料、ジスアゾ顔料、ナフトール系顔料、ナフトールレーキ系顔料、ピラゾロン顔料、BONAレーキ顔料、キサンテンレーキ顔料、チオインジゴ顔料、ペリレン顔料、縮合アゾ顔料、アントラキノン顔料、アントラキノンレーキ顔料、ベンズイミダゾロン顔料、キナクリドン顔料、ジケトピロロピロール顔料、アゾメチン金属錯体顔料等が挙げられ、具体的には、例えば、C.I.Pigment Red 7、9、14、41、48:1、48:2、48:3、48:4、81:1、81:2、81:3、97、122、123、144、146、149、168、169、177、178、180、181、184、185、187、192、200、202、208、209、210、215、216、217、220、223、224、226、227、228、240、246、254、255、264、272等の赤色顔料を用いることができる。特に、色相と明度のバランスの点からC.I.Pigment Red122、177、209、224、254からなる群から選ばれる少なくとも1種の赤色顔料を用いることが好ましく、C.I.Pigment Red254および/またはC.I.Pigment Red177がさらに好ましい。 As red pigments, monoazo lake pigments, disazo pigments, naphthol pigments, naphthol lake pigments, pyrazolone pigments, BONA lake pigments, xanthene lake pigments, thioindigo pigments, perylene pigments, condensed azo pigments, anthraquinone lake pigments, benzimidazo Ron pigments, quinacridone pigments, diketopyrrolopyrrole pigments, azomethine metal complex pigments and the like. Specific examples include C.I. I. Pigment Red 7, 9, 14, 41, 48: 1, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 97, 122, 123, 144, 146, 149, 168, 169, 177, 178, 180, 181, 184, 185, 187, 192, 200, 202, 208, 209, 210, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, Red pigments such as 246, 254, 255, 264, and 272 can be used. In particular, from the viewpoint of the balance between hue and lightness, C.I. I. Pigment® Red 122, 177, 209, 224, 254 is preferably used, and at least one red pigment selected from the group consisting of C.I. I. Pigment Red254 and / or C.I. I. Pigment Red177 is more preferable.
 橙色顔料としては、モノアゾ顔料、ナフトール系顔料、ピラゾロン顔料、ベンズイミダゾロン顔料、ジスアゾ顔料、ナフトールレーキ顔料、ナフタレンスルホン酸レーキ顔料、ペリノン顔料、キナクリドン顔料、アントラキノン系顔料、イソインドリノン顔料、イソインドリン系顔料、アゾメチン金属錯体顔料、ジケトピロロピロール顔料等が挙げられ、具体的には、例えば、C.I.Pigment Orenge1、2、3、5、4、24、38、74、13、34、36、60、62、64、72、15、16、17、46、19、43、48、49、51、61、66、68、71、73、81等を用いることができ、中でも、C.I.Pigment Orenge71が好ましい。 Orange pigments include monoazo pigments, naphthol pigments, pyrazolone pigments, benzimidazolone pigments, disazo pigments, naphthol lake pigments, naphthalene sulfonic acid lake pigments, perinone pigments, quinacridone pigments, anthraquinone pigments, isoindolinone pigments, isoindoline. Pigments, azomethine metal complex pigments, diketopyrrolopyrrole pigments and the like. Specific examples include C.I. I. Pigment Orange 1, 2, 3, 5, 4, 24, 38, 74, 13, 34, 36, 60, 62, 64, 72, 15, 16, 17, 46, 19, 43, 48, 49, 51, 61 , 66, 68, 71, 73, 81 and the like can be used. I. Pigment® Orange 71 is preferable.
 (A)顔料は、C.I.Pigment Red254、C.I.Pigment Red177およびC.I.Pigment Orange71から選択される少なくとも1種を含むことが好ましい。 (A) The pigment is C.I. I. Pigment Red254, C.I. I. Pigment Red177 and C.I. I. It is preferable to include at least one selected from Pigment Orange 71.
 本発明の組成物における(A)顔料の含有量は、着色感光性樹脂組成物に含有される溶剤を除いた全成分(固形分)に対して、10~70質量%が好ましく、より好ましくは20~60質量%であり、さらに好ましくは30~60質量%である。
 (A)顔料は、1種類の顔料で構成されていてもよいし、2種類以上の顔料で構成されていてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
The content of the pigment (A) in the composition of the present invention is preferably 10 to 70% by mass, more preferably based on all components (solid content) excluding the solvent contained in the colored photosensitive resin composition. It is 20 to 60% by mass, and more preferably 30 to 60% by mass.
(A) The pigment may be composed of one kind of pigment, or may be composed of two or more kinds of pigments. When two or more types are included, the total amount is preferably within the above range.
<<(B)顔料>>
 本発明で用いる(B)顔料は、緑色顔料、青色顔料および黒色顔料から選択される少なくとも1種からなる。
 本発明で使用する緑色顔料、青色顔料、および黒色顔料としては、従来公知の種々の緑色顔料、青色顔料、および黒色顔料を用いることができる。緑色顔料、青色顔料、および黒色顔料としては、高透過率であることが好ましい。
<< (B) Pigment >>
The (B) pigment used in the present invention comprises at least one selected from a green pigment, a blue pigment, and a black pigment.
As the green pigment, blue pigment, and black pigment used in the present invention, various conventionally known green pigments, blue pigments, and black pigments can be used. The green pigment, blue pigment, and black pigment preferably have high transmittance.
 緑色顔料としては、フタロシアニン顔料、アゾメチン金属錯体顔料等が挙げられ、具体的には、例えば、C.I.Pigment Green 1、4、7、8、36、58等を用いることができる。 Examples of green pigments include phthalocyanine pigments, azomethine metal complex pigments, and the like. I. Pigment Green 1, 4, 7, 8, 36, 58, etc. can be used.
 青色顔料としては、ナフトールAS顔料、フタロシアニン顔料、染付けレーキ顔料、アントラキノン系顔料等が挙げられる。好ましくは、フタロシアニン系顔料等が挙げられ、具体的には、C.I.Pigment Blue1、25、26、15、15:1、15:2、15:3、15:4、15:6、16、17:1、24:1、56、60等を用いることができる。 Examples of blue pigments include naphthol AS pigments, phthalocyanine pigments, dyed lake pigments, and anthraquinone pigments. Preferable examples include phthalocyanine pigments. I. Pigment Blue1, 25, 26, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 17: 1, 24: 1, 56, 60, etc. can be used.
 黒色顔料としては、例えば、C.I.Pigment Black6、7、12、20、31、32、PO71、PO38、カーボンブラック、カーボン、チタンブラック、アニリンブラック、アントラキノン系黒色顔料、ペリレン系黒色顔料、酸化鉄、酸化チタン単独または混合が用いられ、混合したものとしては、例えば、カーボンとチタンブラックとの組合せ(カーボンとチタンブラックとの質量比は、100:0~100:60の範囲が好ましい。)などが挙げられる。これらの中でも、チタンブラック、カーボンブラック、C.I.Pigment Black PO71、PO38が好ましい。 Examples of black pigments include C.I. I. Pigment Black 6, 7, 12, 20, 31, 32, PO71, PO38, carbon black, carbon, titanium black, aniline black, anthraquinone black pigment, perylene black pigment, iron oxide, titanium oxide alone or in combination, Examples of the mixture include a combination of carbon and titanium black (the mass ratio of carbon to titanium black is preferably in the range of 100: 0 to 100: 60). Among these, titanium black, carbon black, C.I. I. Pigment Black PO71 and PO38 are preferable.
 本発明の組成物の(B)顔料の含有量は、(A)顔料100質量部に対し、0.1~60質量部が好ましく、より好ましくは0.2~50質量部であり、さらに好ましくは0.3~40質量部である。
 (B)顔料は、本発明の組成物中に1種のみ含まれていても良いし、2種以上含まれていても良い。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
The content of the pigment (B) in the composition of the present invention is preferably 0.1 to 60 parts by mass, more preferably 0.2 to 50 parts by mass, and still more preferably 100 parts by mass of the (A) pigment. Is 0.3 to 40 parts by mass.
(B) 1 type of pigments may be contained in the composition of this invention, and may be contained 2 or more types. When two or more types are included, the total amount is preferably within the above range.
<<他の顔料および染料>>
 本発明の組成物は、本発明の趣旨を逸脱しない範囲で、他の顔料および染料を含んでいてもよい。他の顔料としては、黄色顔料、茶色顔料、紫色顔料等が例示される。
<< Other pigments and dyes >>
The composition of the present invention may contain other pigments and dyes without departing from the spirit of the present invention. Examples of other pigments include yellow pigments, brown pigments and purple pigments.
 黄色顔料としては、モノアゾ顔料、モノアゾレーキ顔料、ジスアゾ顔料、アントラキノン顔料、モノアゾピラゾロン顔料、縮合アゾ顔料、イソインドリン顔料、ベンズイミダゾロン顔料、アゾメチン金属錯体顔料、キノフタロン顔料、キノキサリン顔料等が挙げられ、具体的には、例えば、C.I.Pigment Yellow 1、2、3、4、5、6、10、12、13、14、15、16、17、18、20、24、31、32、34、35、35:1、36、36:1、37、37:1、40、42、43、53、55、60、61、62、63、65、73、74、77、81、83、86、93、94、95、97、98、100、101、104、106、108、109、110、113、114、115、116、117、118、119、120、123、125、126、127、128、129、137、138、139、147、148、150、151、152、153、154、155、156、161、162、164、166、167、168、169、170、171、172、173、174、175、176、177、179、180、181、182、185、187、188、193、194、199、213、214等の黄色顔料を用いることができる。本発明では、C.I.Pigment Yellow139が特に好ましい。 Examples of yellow pigments include monoazo pigments, monoazo lake pigments, disazo pigments, anthraquinone pigments, monoazopyrazolone pigments, condensed azo pigments, isoindoline pigments, benzimidazolone pigments, azomethine metal complex pigments, quinophthalone pigments, and quinoxaline pigments. Specifically, for example, C.I. I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 1 Yellow pigments such as 75, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214 can be used. In the present invention, C.I. I. Pigment Yellow 139 is particularly preferable.
 本発明の組成物の黄色顔料の含有量は、(A)顔料100質量部に対し、0~60質量部が好ましく、より好ましくは10~50質量部であり、さらに好ましくは20~40質量部である。
 黄色顔料は、本発明の組成物中に1種のみ含まれていても良いし、2種以上含まれていても良い。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
The content of the yellow pigment in the composition of the present invention is preferably 0 to 60 parts by mass, more preferably 10 to 50 parts by mass, and further preferably 20 to 40 parts by mass with respect to 100 parts by mass of the pigment (A). It is.
Only one kind of yellow pigment may be contained in the composition of the present invention, or two or more kinds thereof may be contained. When two or more types are included, the total amount is preferably within the above range.
 その他、本発明で用いられる他の顔料としては、例えば、特開2013-068814号公報の段落番号0053に記載のものを採用できる。これらの他の顔料は、全顔料の1質量%以下であることが好ましい。また、本発明の趣旨を逸脱しない範囲で染料を含んでいても良い。 In addition, as other pigments used in the present invention, for example, those described in paragraph No. 0053 of JP2013-068814A can be employed. These other pigments are preferably 1% by mass or less of the total pigments. Moreover, the dye may be included in the range which does not deviate from the meaning of this invention.
 本発明で用いる顔料の一次粒子サイズは、カラーフィルタ用として用いる場合には、色ムラやコントラストの観点から、100nm以下であることが好ましく、また、分散安定性の観点から5nm以上であることが好ましい。顔料の一次粒子サイズとしてより好ましくは、5~75nmであり、さらに好ましくは5~55nmであり、特に好ましくは5~35nmである。本発明では、5~35nmの範囲の一次粒子サイズを有する顔料との組み合わせにおいて、特に良好な効果を発揮することができる。
 顔料の一次粒子サイズは、電子顕微鏡等の公知の方法で測定することができる。
When used for a color filter, the primary particle size of the pigment used in the present invention is preferably 100 nm or less from the viewpoint of color unevenness and contrast, and is preferably 5 nm or more from the viewpoint of dispersion stability. preferable. The primary particle size of the pigment is more preferably 5 to 75 nm, further preferably 5 to 55 nm, and particularly preferably 5 to 35 nm. In the present invention, a particularly good effect can be exhibited in combination with a pigment having a primary particle size in the range of 5 to 35 nm.
The primary particle size of the pigment can be measured by a known method such as an electron microscope.
<<顔料比>>
 また、本発明の組成物は、組成物に含まれる全顔料に対する(B)顔料の質量比((B)顔料/全顔料)が0.005~0.25であり、0.005~0.2が好ましく、0.005~0.1がより好ましく、0.005~0.05がさらに好ましい。(B)顔料濃度を上記範囲内となるように調整することで、顔料の凝集を抑制し、分光が変動してしまうことを抑制することができる。
 ここで、全顔料とは、(A)顔料、(B)顔料および黄色顔料等の他の顔料を含む趣旨である。本発明では、(A)顔料と(B)顔料の合計が、全顔料の60質量%以上を占めることが好ましく、(A)顔料と(B)顔料と黄色顔料の合計が全顔料の90質量%以上を占めることがより好ましい。
<< Pigment ratio >>
In the composition of the present invention, the mass ratio of the (B) pigment to the total pigment contained in the composition ((B) pigment / total pigment) is 0.005 to 0.25, and 0.005 to 0.00. 2, more preferably 0.005 to 0.1, and still more preferably 0.005 to 0.05. (B) By adjusting the pigment concentration so as to be within the above range, aggregation of the pigment can be suppressed and the spectrum can be prevented from fluctuating.
Here, the term “all pigments” is intended to include other pigments such as (A) pigments, (B) pigments, and yellow pigments. In the present invention, the total of (A) pigment and (B) pigment preferably occupies 60% by mass or more of the total pigment, and the total of (A) pigment, (B) pigment and yellow pigment is 90% by mass of the total pigment. It is more preferable to occupy% or more.
 本発明の組成物は、全顔料の濃度は、組成物の全固形分に対して、30質量%以上であることが好ましく、35質量%以上であることがより好ましく、40質量%以上であることがさらに好ましい。上限については特に制限はないが、例えば55質量%以下である。顔料濃度を上記範囲内となるように調整することで、顔料の凝集を抑制し、分光が変動してしまうことをより効果的に抑制することができる。 In the composition of the present invention, the concentration of all pigments is preferably 30% by mass or more, more preferably 35% by mass or more, and 40% by mass or more with respect to the total solid content of the composition. More preferably. Although there is no restriction | limiting in particular about an upper limit, For example, it is 55 mass% or less. By adjusting the pigment concentration to be within the above range, the aggregation of the pigment can be suppressed, and the spectral fluctuation can be more effectively suppressed.
<<(C)酸基を含有し重量平均分子量が38000以下である樹脂>>
 本発明の組成物は、(C)酸基を含有し重量平均分子量が38000以下である樹脂(以下、(C)樹脂ともいう)を有する。(C)樹脂を有することで、顔料の凝集を抑制し、分光が変動してしまうことを抑制することができる。また、リソ残渣を低減させることも可能となる。
<< (C) resin containing acid groups and having a weight average molecular weight of 38000 or less >>
The composition of the present invention comprises (C) a resin containing an acid group and having a weight average molecular weight of 38000 or less (hereinafter also referred to as (C) resin). (C) By having resin, aggregation of a pigment can be suppressed and it can suppress that spectroscopy changes. It is also possible to reduce litho residue.
 本発明の組成物で用いることができる(C)樹脂としては、線状有機高分子重合体であって、分子(好ましくは、アクリル系共重合体、スチレン系共重合体を主鎖とする分子)中に少なくとも1つのアルカリ可溶性を促進する基を有する(C)樹脂の中から適宜選択することができる。耐熱性の観点からは、ポリヒドロキシスチレン系樹脂、ポリシロキサン系樹脂、アクリル系樹脂、アクリルアミド系樹脂、アクリル/アクリルアミド共重合体樹脂が好ましく、現像性制御の観点からは、アクリル系樹脂、アクリルアミド系樹脂、アクリル/アクリルアミド共重合体樹脂が好ましい。 The (C) resin that can be used in the composition of the present invention is a linear organic polymer, and is a molecule (preferably a molecule having an acrylic copolymer or a styrene copolymer as the main chain). ) Having at least one group that promotes alkali solubility in (C) resin. From the viewpoint of heat resistance, polyhydroxystyrene resins, polysiloxane resins, acrylic resins, acrylamide resins, and acryl / acrylamide copolymer resins are preferable. From the viewpoint of development control, acrylic resins and acrylamide resins are preferable. Resins and acrylic / acrylamide copolymer resins are preferred.
 (C)樹脂が含有する酸基(アルカリ可溶性を促進する基)としては、例えば、カルボキシル基、リン酸基、スルホン酸基、フェノール性水酸基などが挙げられるが、有機溶剤に可溶で弱アルカリ水溶液により現像可能なものが好ましく、(メタ)アクリル酸が特に好ましいものとして挙げられる。これら酸基は、1種のみであってもよいし、2種以上であってもよい。 Examples of the acid group (group that promotes alkali solubility) contained in the resin (C) include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group, but it is soluble in an organic solvent and weakly alkaline. Those that can be developed with an aqueous solution are preferred, and (meth) acrylic acid is particularly preferred. These acid groups may be used alone or in combination of two or more.
 (C)樹脂に酸基を導入するには、例えば、酸基を有するモノマーおよび/または重合後に酸基を付与しうるモノマー(以下「酸基を導入するための単量体」と称することもある。)を、単量体成分として重合するようにすればよい。重合後に酸基を付与しうるモノマーとしては、例えば、2-ヒドロキシエチル(メタ)アクリレート等の水酸基を有するモノマー、グリシジル(メタ)アクリレート等のエポキシ基を有するモノマー、2-イソシアナートエチル(メタ)アクリレート等のイソシアネート基を有するモノマー等が挙げられる。これら酸基を導入するための単量体は、1種のみであってもよいし、2種以上であってもよい。
 なお、重合後に酸基を付与しうるモノマーを単量体成分として酸基を導入する場合には、重合後に例えば後述するような酸基を付与するための処理が必要となる。
(C) In order to introduce an acid group into the resin, for example, a monomer having an acid group and / or a monomer capable of imparting an acid group after polymerization (hereinafter also referred to as “monomer for introducing an acid group”) May be polymerized as a monomer component. Examples of the monomer that can give an acid group after polymerization include, for example, a monomer having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate, a monomer having an epoxy group such as glycidyl (meth) acrylate, and 2-isocyanatoethyl (meth). And monomers having an isocyanate group such as acrylate. These monomers for introducing an acid group may be only one type or two or more types.
In addition, when introducing an acid group using a monomer capable of imparting an acid group after polymerization as a monomer component, for example, a treatment for imparting an acid group as described later is required after the polymerization.
 (C)樹脂の製造には、例えば、公知のラジカル重合法による方法を適用することができる。ラジカル重合法で(C)樹脂を製造する際の温度、圧力、ラジカル開始剤の種類およびその量、溶媒の種類等々の重合条件は、当業者において容易に設定可能であり、実験的に条件を定めるようにすることもできる。 (C) For the production of the resin, for example, a known radical polymerization method can be applied. Polymerization conditions such as temperature, pressure, type and amount of radical initiator, type of solvent, and the like when the (C) resin is produced by the radical polymerization method can be easily set by those skilled in the art. It can also be determined.
 (C)樹脂として用いられる線状有機高分子重合体としては、側鎖にカルボン酸を有するポリマーが好ましく、メタクリル酸共重合体、アクリル酸共重合体、イタコン酸共重合体、クロトン酸共重合体、マレイン酸共重合体、部分エステル化マレイン酸共重合体、ノボラック型樹脂などのアルカリ可溶性フェノール樹脂等、並びに側鎖にカルボン酸を有する酸性セルロース誘導体、水酸基を有するポリマーに酸無水物を付加させたもの挙げられる。特に、(メタ)アクリル酸と、これと共重合可能な他の単量体との共重合体が、(C)樹脂として好適である。(メタ)アクリル酸と共重合可能な他の単量体としては、アルキル(メタ)アクリレート、アリール(メタ)アクリレート、ビニル化合物などが挙げられる。アルキル(メタ)アクリレートおよびアリール(メタ)アクリレートとしては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、オクチル(メタ)アクリレート、フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート、トリル(メタ)アクリレート、ナフチル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート等、ビニル化合物としては、スチレン、α-メチルスチレン、ビニルトルエン、グリシジルメタクリレート、アクリロニトリル、ビニルアセテート、N-ビニルピロリドン、テトラヒドロフルフリルメタクリレート、ポリスチレンマクロモノマー、ポリメチルメタクリレートマクロモノマー等、特開平10-300922号公報に記載のN位置換マレイミドモノマーとして、N―フェニルマレイミド、N-シクロヘキシルマレイミド等を挙げることができる。なお、これらの(メタ)アクリル酸と共重合可能な他の単量体は1種のみであってもよいし、2種以上であってもよい。 (C) As the linear organic high molecular polymer used as the resin, a polymer having a carboxylic acid in the side chain is preferable, such as a methacrylic acid copolymer, an acrylic acid copolymer, an itaconic acid copolymer, and a crotonic acid copolymer. Add acid anhydrides to polymers, maleic acid copolymers, partially esterified maleic acid copolymers, alkali-soluble phenolic resins such as novolak resins, acidic cellulose derivatives with carboxylic acids in the side chain, and polymers with hydroxyl groups Can be mentioned. In particular, a copolymer of (meth) acrylic acid and another monomer copolymerizable therewith is suitable as the (C) resin. Examples of other monomers copolymerizable with (meth) acrylic acid include alkyl (meth) acrylates, aryl (meth) acrylates, and vinyl compounds. As alkyl (meth) acrylate and aryl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, pentyl (meth) acrylate, Examples of vinyl compounds such as hexyl (meth) acrylate, octyl (meth) acrylate, phenyl (meth) acrylate, benzyl (meth) acrylate, tolyl (meth) acrylate, naphthyl (meth) acrylate, cyclohexyl (meth) acrylate, styrene, α-methylstyrene, vinyltoluene, glycidyl methacrylate, acrylonitrile, vinyl acetate, N-vinylpyrrolidone, tetrahydrofurfuryl methacrylate, polystyrene Macromonomer, polymethylmethacrylate macromonomer, as N-position-substituted maleimide monomer described in JP-A-10-300922, may be mentioned N- phenylmaleimide, an N- cyclohexyl maleimide and the like. In addition, only 1 type may be sufficient as the other monomer copolymerizable with these (meth) acrylic acids, and 2 or more types may be sufficient as it.
 (C)樹脂としては、下記一般式(ED)で示される化合物(以下「エーテルダイマー」と称することもある。)を必須とする単量体成分を重合してなるポリマー(a)を含むことも好ましい。 (C) The resin contains a polymer (a) obtained by polymerizing a monomer component essentially comprising a compound represented by the following general formula (ED) (hereinafter sometimes referred to as “ether dimer”). Is also preferable.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 一般式(ED)中、R1およびR2は、それぞれ独立して、水素原子または置換基を有していてもよい炭素数1~25の炭化水素基を表す。 In general formula (ED), R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.
 これにより、本発明の着色感光性樹脂組成物は、耐熱性とともに透明性にも極めて優れた硬化塗膜を形成しうる。前記エーテルダイマーを示す前記一般式(ED)中、R1およびR2で表される置換基を有していてもよい炭素数1~25の炭化水素基としては、特に制限はないが、例えば、メチル、エチル、n-プロピル、イソプロピル、n-ブチル、イソブチル、tert-ブチル、tert-アミル、ステアリル、ラウリル、2-エチルヘキシル等の直鎖状または分岐状のアルキル基;フェニル等のアリール基;シクロヘキシル、tert-ブチルシクロヘキシル、ジシクロペンタジエニル、トリシクロデカニル、イソボルニル、アダマンチル、2-メチル-2-アダマンチル等の脂環式基;1-メトキシエチル、1-エトキシエチル等のアルコキシで置換されたアルキル基;ベンジル等のアリール基で置換されたアルキル基;等が挙げられる。これらの中でも特に、メチル、エチル、シクロヘキシル、ベンジル等のような酸や熱で脱離しにくい1級または2級炭素の置換基が耐熱性の点で好ましい。 Thereby, the colored photosensitive resin composition of this invention can form the cured coating film which was extremely excellent also in heat resistance and transparency. In the general formula (ED) representing the ether dimer, the hydrocarbon group having 1 to 25 carbon atoms which may have a substituent represented by R 1 and R 2 is not particularly limited. Linear or branched alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, tert-butyl, tert-amyl, stearyl, lauryl, 2-ethylhexyl; aryl groups such as phenyl; Alicyclic groups such as cyclohexyl, tert-butylcyclohexyl, dicyclopentadienyl, tricyclodecanyl, isobornyl, adamantyl and 2-methyl-2-adamantyl; substituted with alkoxy such as 1-methoxyethyl and 1-ethoxyethyl An alkyl group substituted with an aryl group such as benzyl; and the like. Among these, an acid such as methyl, ethyl, cyclohexyl, benzyl or the like, or a primary or secondary carbon substituent which is difficult to be removed by heat is preferable from the viewpoint of heat resistance.
 前記エーテルダイマーの具体例としては、例えば、ジメチル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジエチル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(n-プロピル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(イソプロピル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(n-ブチル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(イソブチル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(tert-ブチル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(tert-アミル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(ステアリル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(ラウリル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(2-エチルヘキシル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(1-メトキシエチル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(1-エトキシエチル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジベンジル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジフェニル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジシクロヘキシル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(tert-ブチルシクロヘキシル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(ジシクロペンタジエニル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(トリシクロデカニル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(イソボルニル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジアダマンチル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジ(2-メチル-2-アダマンチル)-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート等が挙げられる。これらの中でも特に、ジメチル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジエチル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジシクロヘキシル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエート、ジベンジル-2,2'-[オキシビス(メチレン)]ビス-2-プロペノエートが好ましい。これらエーテルダイマーは、1種のみであってもよいし、2種以上であってもよい。前記一般式(ED)で示される化合物由来の構造体は、その他の単量体を共重合させてもよい。 Specific examples of the ether dimer include dimethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, diethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, (N-propyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (isopropyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (n-butyl) ) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (isobutyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (tert-butyl) -2, 2 ′-[oxybis (methylene)] bis-2-propenoate, di (tert-amyl) -2,2 ′-[oxybis (methylene)] bis-2-pro Noate, di (stearyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (lauryl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (2- Ethylhexyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (1-methoxyethyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (1-ethoxy) Ethyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, dibenzyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, diphenyl-2,2 ′-[oxybis (methylene) )] Bis-2-propenoate, dicyclohexyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (tert-butyl) Dicyclohexyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (dicyclopentadienyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (tri Cyclodecanyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, di (isobornyl) -2,2 ′-[oxybis (methylene)] bis-2-propenoate, diadamantyl-2,2 Examples include '-[oxybis (methylene)] bis-2-propenoate and di (2-methyl-2-adamantyl) -2,2'-[oxybis (methylene)] bis-2-propenoate. Among these, dimethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, diethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, dicyclohexyl-2,2′- [Oxybis (methylene)] bis-2-propenoate and dibenzyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate are preferred. These ether dimers may be only one kind or two or more kinds. The structure derived from the compound represented by the general formula (ED) may be copolymerized with other monomers.
 上記の他、(C)樹脂に共重合させる単量体として下記式(X)で示されるエチレン性不飽和単量体(a)を含むことが好ましい。
式(X)
Figure JPOXMLDOC01-appb-C000020
(式(X)において、R1は、水素原子またはメチル基を表し、R2は炭素数2~10のアルキレン基を表し、R3は、水素原子またはベンゼン環を含んでもよい炭素数1~20のアルキル基を表す。nは1~15の整数を表す。)
In addition to the above, it is preferable to include an ethylenically unsaturated monomer (a) represented by the following formula (X) as a monomer to be copolymerized with the (C) resin.
Formula (X)
Figure JPOXMLDOC01-appb-C000020
(In Formula (X), R 1 represents a hydrogen atom or a methyl group, R 2 represents an alkylene group having 2 to 10 carbon atoms, and R 3 represents a hydrogen atom or a benzene ring which may contain a benzene ring. And represents an alkyl group of 20. n represents an integer of 1 to 15.)
 上記式(X)において、R2のアルキレン基の炭素数は、2~3であることが好ましい。また、R3のアルキル基の炭素数は1~20であるが、より好ましくは1~10であり、R3のアルキル基はベンゼン環を含んでもよい。R3のアルキル基の炭素数が1~10のときはアルキル基が障害となり樹脂同士の接近を抑制し、顔料への吸着/配向を促進するが、炭素数が10を超えると、アルキル基の立体障害効果が高くなり、ベンゼン環の顔料への吸着/配向までをも妨げる傾向を示す。この傾向は、R3のアルキル基の炭素鎖長が長くなるに従い顕著となり、炭素数が20を超えると、ベンゼン環の吸着/配向が極端に低下する。R3で表されるベンゼン環を含むアルキル基としては、ベンジル基、2-フェニル(イソ)プロピル基等を挙げることができる。 In the above formula (X), the alkylene group of R 2 preferably has 2 to 3 carbon atoms. The alkyl group of R 3 has 1 to 20 carbon atoms, more preferably 1 to 10, and the alkyl group of R 3 may contain a benzene ring. When the carbon number of the alkyl group of R 3 is 1 to 10, the alkyl group becomes an obstacle and suppresses the approach between the resins and promotes adsorption / orientation to the pigment. However, when the carbon number exceeds 10, The steric hindrance effect becomes high and shows a tendency to prevent even the adsorption / orientation of the benzene ring to the pigment. This tendency becomes more prominent as the carbon chain length of the alkyl group of R 3 becomes longer. When the carbon number exceeds 20, the adsorption / orientation of the benzene ring is extremely reduced. Examples of the alkyl group containing a benzene ring represented by R 3 include a benzyl group and a 2-phenyl (iso) propyl group.
 エチレン性不飽和単量体(a)としては、フェノールのエチレンオキサイド(EO)変性(メタ)アクリレート、パラクミルフェノールのEOまたはプロピレンオキサイド(PO)変性(メタ)アクリレート、ノニルフェノールのEO変性(メタ)アクリレート、ノニルフェノールのPO変性(メタ)アクリレート等が挙げられる。これら化合物のうち、パラクミルフェノールのEOまたはPO変性(メタ)アクリレートは、上記ベンゼン環のπ電子の効果ばかりでなく、その立体的な効果も加わり、顔料などの着色材に対してより良好な吸着/配向面を形成することができるので、より分散効果が高い。 Examples of the ethylenically unsaturated monomer (a) include phenol ethylene oxide (EO) modified (meth) acrylate, paracumylphenol EO or propylene oxide (PO) modified (meth) acrylate, and nonylphenol EO modified (meth). Examples thereof include acrylate, PO-modified (meth) acrylate of nonylphenol, and the like. Among these compounds, EO or PO-modified (meth) acrylate of paracumylphenol is not only effective for the π-electron of the benzene ring, but also its steric effect, which is better for coloring materials such as pigments. Since the adsorption / orientation plane can be formed, the dispersion effect is higher.
 また、本発明では、2個以上6個以下の水酸基を有する重合性モノマーと他の重合性モノマーとの共重合体に、水酸基と反応可能な官能基及びエチレン性不飽和二重結合を有する化合物を反応させてなる樹脂も好ましく用いられる。2個以上6個以下の水酸基を有する重合性モノマー(a1)は、好ましくは、2個以上6個以下の水酸基及びエチレン性不飽和二重結合を有する化合物であり、例えば下記一般式(Y)で示されるモノマーを用いることができる。 Further, in the present invention, a compound having a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond in a copolymer of a polymerizable monomer having 2 to 6 hydroxyl groups and another polymerizable monomer A resin obtained by reacting is preferably used. The polymerizable monomer (a1) having 2 or more and 6 or less hydroxyl groups is preferably a compound having 2 or more and 6 or less hydroxyl groups and an ethylenically unsaturated double bond, for example, the following general formula (Y) The monomer shown by can be used.
 一般式(Y)
CH21 =C(OH)-COO-R2(CHR3n4
(式中、R1及びR4はそれぞれ独立に水素原子、炭素数1~5の置換されてもよいアルキル基を表し、R2は炭素数1~4のアルキレン基を表し、R3は炭素数1~4のアルキレン基、または直接結合を表し、nは2以上6以下の整数を表す。)
 上記一般式(Y)で示されるモノマーとしては、エチレン性不飽和二重結合を有する多価アルコールのモノエステルなどが挙げられるが、好ましいのはグリセロールモノ(メタ)アクリレートである。
General formula (Y)
CH 2 R 1 ═C (OH) —COO—R 2 (CHR 3 ) n R 4
(Wherein R 1 and R 4 each independently represents a hydrogen atom or an optionally substituted alkyl group having 1 to 5 carbon atoms, R 2 represents an alkylene group having 1 to 4 carbon atoms, and R 3 represents a carbon atom) Represents an alkylene group of 1 to 4 or a direct bond, and n represents an integer of 2 to 6.
Examples of the monomer represented by the general formula (Y) include monoesters of polyhydric alcohols having an ethylenically unsaturated double bond, and glycerol mono (meth) acrylate is preferred.
 このような共重合体を構成する他の重合性モノマー(a2)は、2個以上6個以下の水酸基を有する重合性モノマー(a1)と共重合可能な重合性モノマーであり、上述の重合性モノマーなどが挙げられる。これらの重合性モノマーは、1種を単独で、または2種以上を混合して用いることができる。 The other polymerizable monomer (a2) constituting such a copolymer is a polymerizable monomer copolymerizable with the polymerizable monomer (a1) having 2 to 6 hydroxyl groups, and the above-described polymerizable monomer. And monomers. These polymerizable monomers can be used individually by 1 type or in mixture of 2 or more types.
 また、本発明における着色感光性樹脂組成物の架橋効率を向上させるために、重合性基を有した(C)樹脂を使用してもよい。重合性基を有した(C)樹脂としては、アリル基、(メタ)アクリル基、アリルオキシアルキル基等を側鎖に含有した(C)樹脂等が有用である。上述の重合性基を含有するポリマーの例としては、ダイヤナ-ルNRシリーズ(三菱レイヨン株式会社製)、Photomer6173(COOH含有 polyurethane acrylic oligomer. Diamond Shamrock Co.Ltd.,製)、ビスコートR-264、KSレジスト106(いずれも大阪有機化学工業株式会社製)、サイクロマーPシリーズ、プラクセル CF200シリーズ(いずれもダイセル化学工業株式会社製)、Ebecryl3800(ダイセルユーシービー株式会社製)などが挙げられる。これら重合性基を含有する(C)樹脂としては、予めイソシアネート基とOH基を反応させ、未反応のイソシアネート基を1つ残し、かつ(メタ)アクリロイル基を含む化合物とカルボキシル基を含むアクリル樹脂との反応によって得られるウレタン変性した重合性二重結合含有アクリル樹脂、カルボキシル基を含むアクリル樹脂と分子内にエポキシ基および重合性二重結合を共に有する化合物との反応によって得られる不飽和基含有アクリル樹脂、酸ペンダント型エポキシアクリレート樹脂、OH基を含むアクリル樹脂と重合性二重結合を有する2塩基酸無水物を反応させた重合性二重結合含有アクリル樹脂、OH基を含むアクリル樹脂とイソシアネートと重合性基を有する化合物を反応させた樹脂、特開2002-229207号公報および特開2003-335814号公報に記載されるα位またはβ位にハロゲン原子或いはスルホネート基などの脱離基を有するエステル基を側鎖に有する樹脂を、塩基性処理することで得られる樹脂などが好ましい。 Further, in order to improve the crosslinking efficiency of the colored photosensitive resin composition in the present invention, (C) resin having a polymerizable group may be used. As the (C) resin having a polymerizable group, a (C) resin containing an allyl group, a (meth) acryl group, an allyloxyalkyl group or the like in the side chain is useful. Examples of the above-described polymer containing a polymerizable group include a dial NR series (manufactured by Mitsubishi Rayon Co., Ltd.), Photomer 6173 (COOH-containing polyurethane acrylic oligomer. Diamond Shamrock Co.Ltd.), Biscote R-264, KS resist 106 (all manufactured by Osaka Organic Chemical Industry Co., Ltd.), Cyclomer P series, Plaxel CF200 series (all manufactured by Daicel Chemical Industries, Ltd.), Ebecryl 3800 (manufactured by Daicel UCB Co., Ltd.), and the like. As the (C) resin containing these polymerizable groups, an isocyanate group and an OH group are reacted in advance to leave one unreacted isocyanate group, and a compound containing a (meth) acryloyl group and an acrylic resin containing a carboxyl group Containing urethane-modified polymerizable double bond-containing acrylic resin obtained by reaction with carboxylic acid, unsaturated group-containing acrylic resin containing carboxyl group-containing acrylic resin and compound having both epoxy group and polymerizable double bond in the molecule Acrylic resin, acid pendant epoxy acrylate resin, OH group-containing acrylic resin and polymerizable double bond-containing acrylic resin obtained by reacting polymerizable double bond, OH group-containing acrylic resin and isocyanate A resin obtained by reacting a compound having a polymerizable group with JP-A-2002-229207 And resins obtained by subjecting a resin having a side chain with an ester group having a leaving group such as a halogen atom or a sulfonate group at the α-position or β-position described in JP-A-2003-335814, etc. Is preferred.
 (C)樹脂としては、特に、ベンジル(メタ)アクリレート/(メタ)アクリル酸共重合体やベンジル(メタ)アクリレート/(メタ)アクリル酸/他のモノマーからなる多元共重合体が好適である。この他、2-ヒドロキシエチルメタクリレートを共重合したもの、特開平7-140654号公報に記載の2-ヒドロキシプロピル(メタ)アクリレート/ポリスチレンマクロモノマー/ベンジルメタクリレート/メタクリル酸共重合体、2-ヒドロキシ-3-フェノキシプロピルアクリレート/ポリメチルメタクリレートマクロモノマー/ベンジルメタクリレート/メタクリル酸共重合体、2-ヒドロキシエチルメタクリレート/ポリスチレンマクロモノマー/メチルメタクリレート/メタクリル酸共重合体、2-ヒドロキシエチルメタクリレート/ポリスチレンマクロモノマー/ベンジルメタクリレート/メタクリル酸共重合体などが挙げられ、特に好ましくはメタクリル酸ベンジル/メタクリル酸の共重合体等が挙げられる。 (C) Resin is particularly preferably a benzyl (meth) acrylate / (meth) acrylic acid copolymer or a multi-component copolymer composed of benzyl (meth) acrylate / (meth) acrylic acid / other monomers. In addition, copolymers of 2-hydroxyethyl methacrylate, 2-hydroxypropyl (meth) acrylate / polystyrene macromonomer / benzyl methacrylate / methacrylic acid copolymer described in JP-A-7-140654, 2-hydroxy- 3-phenoxypropyl acrylate / polymethyl methacrylate macromonomer / benzyl methacrylate / methacrylic acid copolymer, 2-hydroxyethyl methacrylate / polystyrene macromonomer / methyl methacrylate / methacrylic acid copolymer, 2-hydroxyethyl methacrylate / polystyrene macromonomer / Examples thereof include benzyl methacrylate / methacrylic acid copolymers, and particularly preferred are benzyl methacrylate / methacrylic acid copolymers.
 (C)樹脂としては、特開2012-208494号公報段落0558~0571(対応する米国特許出願公開第2012/0235099号明細書の[0685]~[0700])以降の記載を参酌でき、これらの内容は本願明細書に組み込まれる。
 さらに、特開2012-32767号公報に記載の段落番号0029~0063に記載の共重合体(B)および実施例で用いられている(C)樹脂、特開2012-208474号公報の段落番号0088~0098に記載のバインダー樹脂および実施例で用いられているバインダー樹脂、特開2012-137531号公報の段落番号0022~0032に記載のバインダー樹脂および実施例で用いられているバインダー樹脂、特開2013-024934号公報の段落番号0132~0143に記載のバインダー樹脂および実施例で用いられているバインダー樹脂、特開2011-242752号公報の段落番号0092~0098および実施例で用いられているバインダー樹脂、特開2012-032770号公報の段落番号0030~0072に記載のバインダー樹脂を用いること好ましい。これらの内容は本願明細書に組み込まれる。より具体的には、下記の樹脂が好ましい。
As the resin (C), paragraphs 0558 to 0571 of JP2012-208494A (corresponding to [0685] to [0700] of the corresponding US Patent Application Publication No. 2012/0235099) can be referred to. The contents are incorporated herein.
Further, the copolymer (B) described in paragraphs 0029 to 0063 described in JP2012-32767A and the resin (C) used in the examples, paragraph number 0088 of JP2012-208474A. To 0098 and the binder resin used in the examples, the binder resin described in paragraphs 0022 to 0032 of JP2012-137531A, the binder resin used in the examples, and JP2013 No. 024934, paragraphs 0132 to 0143, and binder resins used in Examples, Japanese Unexamined Patent Publication No. 2011-242752, paragraphs 0092 to 0098 and binder resins used in Examples, Paragraph No. 0030 of JP2012-032770A It preferred to use a binder resin according to 0072. These contents are incorporated herein. More specifically, the following resins are preferable.
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
 (C)樹脂の酸価としては10~200mgKOH/gが好ましく、20~180mgKOH/gであることがより好ましく、30~160mgKOH/gであることがさらに好ましい。
 また、(C)樹脂の重量平均分子量(Mw)としては、38000以下であり、30,000以下が好ましく、25,000がさらに好ましく、21,000が最も好ましい。下限については特に制限はないが、2000以上が好ましく、8000以上がより好ましい。
(C) The acid value of the resin is preferably 10 to 200 mgKOH / g, more preferably 20 to 180 mgKOH / g, and even more preferably 30 to 160 mgKOH / g.
The weight average molecular weight (Mw) of the (C) resin is 38000 or less, preferably 30,000 or less, more preferably 25,000, and most preferably 21,000. Although there is no restriction | limiting in particular about a minimum, 2000 or more are preferable and 8000 or more are more preferable.
 (C)樹脂が有するエチレン性不飽和二重結合の量は、「エチレン性不飽和二重結合当量」により示される。二重結合当量とは、下記式で定義され、分子中に含まれる二重結合量の尺度となるものであり、同じ分子量の樹脂であれば、二重結合当量の数値が小さいほど二重結合の導入量が多くなる。
[エチレン性不飽和二重結合当量]=[繰り返し構成単位の分子量]/[繰り返し構成単位中のエチレン性不飽和二重結合の数]
 本発明における樹脂のエチレン性不飽和二重結合当量は200~2,000であることが好ましく、300~1000であることがより好ましい。
(C) The amount of the ethylenically unsaturated double bond contained in the resin is indicated by “ethylenically unsaturated double bond equivalent”. The double bond equivalent is defined by the following formula and is a measure of the amount of double bonds contained in the molecule. If the resin has the same molecular weight, the smaller the double bond equivalent value, The amount of introduction increases.
[Ethylenically unsaturated double bond equivalent] = [Molecular weight of repeating structural unit] / [Number of ethylenically unsaturated double bonds in repeating structural unit]
The ethylenically unsaturated double bond equivalent of the resin in the present invention is preferably 200 to 2,000, more preferably 300 to 1,000.
 本発明の組成物における(C)樹脂の含有量は、組成物の全固形分に対して、25質量%以下が好ましく、1~20質量%がより好ましく、さらに好ましくは1~15質量%であり、特に好ましくは1~10質量%である。
 本発明の組成物は、(C)樹脂を、1種類のみを含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
The content of the resin (C) in the composition of the present invention is preferably 25% by mass or less, more preferably 1 to 20% by mass, and further preferably 1 to 15% by mass with respect to the total solid content of the composition. It is particularly preferably 1 to 10% by mass.
The composition of this invention may contain only 1 type (C) resin, and may contain 2 or more types. When two or more types are included, the total amount is preferably within the above range.
 本発明の組成物は、本発明の趣旨を逸脱しない範囲内で、重量平均分子量が38000を超える酸基を有する樹脂を含んでいても良い。このような樹脂の配合量は(C)樹脂の配合量の5質量%以下であることが好ましい。 The composition of the present invention may contain a resin having an acid group having a weight average molecular weight exceeding 38000 within a range not departing from the gist of the present invention. It is preferable that the compounding quantity of such resin is 5 mass% or less of the compounding quantity of (C) resin.
<<(D)顔料分散剤>>
 本発明の組成物は、(D)顔料分散剤(以下、単に「分散剤」ともいう)を含有する。本発明に用いうる分散剤としては、公知の分散剤を広く採用することができる。例えば、特開2013-077009号公報の段落番号0049~0055の記載を参酌でき、これらの内容は本願明細書に組み込まれる。
<< (D) Pigment Dispersant >>
The composition of the present invention contains (D) a pigment dispersant (hereinafter, also simply referred to as “dispersant”). As the dispersant that can be used in the present invention, known dispersants can be widely used. For example, the description in paragraph numbers 0049 to 0055 of JP2013-077009A can be referred to, and the contents thereof are incorporated in the present specification.
 本発明では、(D)顔料分散剤として、(D-1)片末端に水酸基を有する重合体(POH)若しくは片末端に1級アミノ基を有する重合体(PNH2)とトリカルボン酸無水物若しくはテトラカルボン酸二無水物とを反応させて得られた化合物、(D-2)下記一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体、(D-3)下記一般式(3)で表されるリン酸エステルを含む化合物、および(D-4)下記一般式(4)で表される主鎖に窒素原子を含む化合物から選択される少なくとも1種を用いることが好ましい。このような化合物を用いることにより、本発明の効果がより効果的に発揮される。以下、(D-1)~(D-4)について説明する。 In the present invention, (D) as a pigment dispersant, (D-1) a polymer having a hydroxyl group at one end (POH) or a polymer having a primary amino group at one end (PNH 2 ) and a tricarboxylic acid anhydride or A compound obtained by reacting with tetracarboxylic dianhydride, (D-2) a copolymer containing a structural unit represented by any one of the following general formula (1) and the following general formula (2); D-3) at least selected from a compound containing a phosphate ester represented by the following general formula (3), and (D-4) a compound containing a nitrogen atom in the main chain represented by the following general formula (4) One type is preferably used. By using such a compound, the effects of the present invention are more effectively exhibited. Hereinafter, (D-1) to (D-4) will be described.
-(D-1)少なくとも一つの末端に水酸基を有する重合体(POH)若しくは少なくとも一つの末端に1級アミノ基を有する重合体(PNH2)とトリカルボン酸無水物若しくはテトラカルボン酸二無水物とを反応させてなるカルボン酸系分散剤-
 本発明の組成物は、(D-1)少なくとも一つの末端に水酸基を有する重合体(POH)もしくは少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2)と、トリカルボン酸無水物もしくはテトラカルボン酸二無水物とを反応させてなるカルボン酸系分散剤を有することが好ましい。
-(D-1) a polymer having at least one terminal hydroxyl group (POH) or a polymer having at least one terminal primary amino group (PNH 2 ) and a tricarboxylic acid anhydride or tetracarboxylic acid dianhydride; Carboxylic acid-based dispersant made by reacting
The composition of the present invention comprises (D-1) a polymer (POH) having a hydroxyl group at at least one terminal or a polymer (PNH 2 ) having a primary amino group at at least one terminal, and a tricarboxylic acid anhydride. Or it is preferable to have a carboxylic acid type | system | group dispersing agent formed by making a tetracarboxylic dianhydride react.
 カルボン酸系分散剤は、少なくとも一つの末端に水酸基を有する重合体(POH)もしくは少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2)と、トリカルボン酸無水物もしくはテトラカルボン酸二無水物とを反応させて得ることができる。(POH)および(PNH2)は、片末端に水酸基または第1級アミノ基を有することが好ましい。 Carboxylic acid dispersants include a polymer having a hydroxyl group at at least one terminal (POH) or a polymer having a primary amino group at at least one terminal (PNH 2 ), a tricarboxylic acid anhydride or a tetracarboxylic acid dicarboxylic acid. It can be obtained by reacting with an anhydride. (POH) and (PNH 2 ) preferably have a hydroxyl group or a primary amino group at one end.
(少なくとも一つの末端に水酸基を有する重合体(POH)、少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2))
 少なくとも一つの末端に水酸基を有する重合体(POH)もしくは少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2)の好ましい形態としては、例えば、一般式(II)で表されるものが好ましい。
Figure JPOXMLDOC01-appb-C000023
(一般式(II)中、Y1は、炭素数1~20、酸素数0~12、および窒素数0~3の1価の末端基を表し、X2は、-O-、-S-、又は-N(Rb)-を表し、Rbは水素原子又は炭素原子数1~18の直鎖状若しくは分岐状のアルキル基を表す。G1は、-R11O-で示される繰り返し単位を表し、G2は、-C(=O)R12O-で示される繰り返し単位を表し、G3は、-C(=O)R13C(=O)-OR14O-で示される繰り返し単位を表し、R11は炭素数2~8の直鎖状若しくは分岐状のアルキレン基、又は炭素数3~8のシクロアルキレン基を表し、R12は炭素数1~8の直鎖状若しくは分岐状のアルキレン基、又は炭素数4~8のシクロアルキレン基を表し、R13は炭素数2~6の直鎖状若しくは分岐状のアルキレン基、炭素数2~6の直鎖状若しくは分岐状のアルケニレン基、炭素数3~20のシクロアルキレン基、又は炭素数6~20のアリーレン基を表し、R14は、-CH(R15)-CH(R16)-を表し、R1 5およびR16は、どちらか一方が水素原子であり、もう一方が炭素数1~20のアルキル基、炭素数2~20のアルケニル基、炭素数6~20のアリール基、アルキル部分の炭素数が1~20のアルキルオキシメチレン基、アルケニル部分の炭素数が2~20のアルケニルオキシメチレン基、アリール部分の炭素数が6~20でアリール部分がハロゲン原子で置換されていてもよいアリールオキシメチレン基、またはN-メチレン-フタルイミド基を表す。Z1は、-OH、または-NH2を表し、R17は、炭素数2~8の直鎖状若しくは分岐状のアルキレン基、炭素数3~8のシクロアルキレン基、-C(=O)R12-、又は-C(=O)R13C(=O)-OR14-を表す。m1は0~100の整数を表し、m2は0~60の整数を表し、m3は0~30の整数を表す。但し、m1+m2+m3は1以上100以下である。一般式(II)における前記繰り返し単位G1~G3の配置は、その順序を限定するものではなく、一般式(II)で表される重合体において、基X2と基R17との間に繰り返し単位G1~G3が任意の順序で含まれていることを示し、更に、それらの繰り返し単位G1~G3は、それぞれランダム型又はブロック型のどちらでもよい。)
(Polymer having at least one terminal hydroxyl group (POH), polymer having at least one terminal primary amino group (PNH 2 ))
Preferred examples of the polymer having a hydroxyl group at at least one terminal (POH) or the polymer having a primary amino group at at least one terminal (PNH 2 ) include those represented by the general formula (II) Is preferred.
Figure JPOXMLDOC01-appb-C000023
(In the general formula (II), Y 1 represents a monovalent terminal group having 1 to 20 carbon atoms, 0 to 12 oxygen atoms, and 0 to 3 nitrogen atoms, and X 2 represents —O—, —S— Or —N (R b ) —, wherein R b represents a hydrogen atom or a linear or branched alkyl group having 1 to 18 carbon atoms, G 1 is a repeating group represented by —R 11 O— G 2 represents a repeating unit represented by —C (═O) R 12 O—, and G 3 represents a unit represented by —C (═O) R 13 C (═O) —OR 14 O—. R 11 represents a linear or branched alkylene group having 2 to 8 carbon atoms, or a cycloalkylene group having 3 to 8 carbon atoms, and R 12 represents a linear chain having 1 to 8 carbon atoms. or branched alkylene group, or an cycloalkylene group having a carbon number of 4 ~ 8, R 13 represents a linear or branched alkylene group having 2 to 6 carbon atoms, a carbon Linear or branched alkenylene group having 2 to 6, an arylene group of a cycloalkylene group, or a C 6-20 carbon atoms 3 ~ 20, R 14 are, -CH (R 15) -CH ( R 16) - represents, R 1 5 and R 16 are either hydrogen atom while the other alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, 6 to 20 carbon atoms An aryl group, an alkyloxymethylene group having 1 to 20 carbon atoms in the alkyl moiety, an alkenyloxymethylene group having 2 to 20 carbon atoms in the alkenyl moiety, an aryl moiety having 6 to 20 carbon atoms, and the aryl moiety substituted with a halogen atom Represents an optionally substituted aryloxymethylene group or N-methylene-phthalimide group, Z 1 represents —OH or —NH 2 , and R 17 represents a linear or branched group having 2 to 8 carbon atoms. No Killen group, a cycloalkylene group having a carbon number of 3 ~ 8, -C (= O ) R 12 -, or -C (= O) R 13 C (= O) -OR 14 - is .m1 representing a 0-100 M2 represents an integer of 0 to 60, and m3 represents an integer of 0 to 30. However, m1 + m2 + m3 is 1 or more and 100 or less, and the repeating units G 1 to G 3 in the general formula (II) The arrangement does not limit the order, and in the polymer represented by the general formula (II), the repeating units G 1 to G 3 are included in any order between the group X 2 and the group R 17. Further, the repeating units G 1 to G 3 may be either random type or block type, respectively. )
 Y1は、炭素数1~20、酸素数0~12、および窒素数0~3の1価の末端基を表し、酸素数および窒素数が0であり、炭素数が1~18の直鎖状若しくは分岐状のアルキル基であることが、顔料分散体の低粘度化及び保存安定性の観点から好ましい。 Y 1 represents a monovalent terminal group having 1 to 20 carbon atoms, 0 to 12 oxygen atoms, and 0 to 3 nitrogen atoms. From the viewpoints of reducing the viscosity and storage stability of the pigment dispersion, it is preferable that the alkyl group is a branched or branched alkyl group.
 また別の形態として、Y1がエチレン性不飽和二重結合を有することが好ましい。この場合、(D-1)分散剤に活性エネルギー線硬化性を付与することができる。また、m2=0、m3=0の場合、Y1は炭素数1~7の直鎖状若しくは分岐状のアルキル基であるか、もしくはエチレン性不飽和二重結合を有することが好ましい。
 エチレン性不飽和二重結合を有するにはエチレン性不飽和二重結合を有する基を有する必要がある。このような基としては例えば、ビニル基、又は(メタ)アクリロイル基などが挙げられるが、好ましいのは(メタ)アクリロイル基である。これら二重結合を有する基の種類は、一種類でもよいし、複数種類でもよい。
In another embodiment, Y 1 preferably has an ethylenically unsaturated double bond. In this case, active energy ray curability can be imparted to the (D-1) dispersant. When m2 = 0 and m3 = 0, Y 1 is preferably a linear or branched alkyl group having 1 to 7 carbon atoms or has an ethylenically unsaturated double bond.
In order to have an ethylenically unsaturated double bond, it is necessary to have a group having an ethylenically unsaturated double bond. Examples of such a group include a vinyl group and a (meth) acryloyl group, and a (meth) acryloyl group is preferable. The type of the group having a double bond may be one type or a plurality of types.
 X2は、-O-、-S-、または-N(Rb)-を表し、-O-または-N(Rb)-が好ましい。
 Rbは水素原子又は炭素数1~18の直鎖状若しくは分岐状のアルキル基を表す。炭素数1~18の直鎖状若しくは分岐状のアルキル基としては、炭素数1~6のアルキル基が好ましい。具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ネオペンチル基、n-へキシル基、シクロヘキシル基等が挙げられる。
X 2 represents —O—, —S—, or —N (R b ) —, preferably —O— or —N (R b ) —.
R b represents a hydrogen atom or a linear or branched alkyl group having 1 to 18 carbon atoms. As the linear or branched alkyl group having 1 to 18 carbon atoms, an alkyl group having 1 to 6 carbon atoms is preferable. Specific examples include methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, tert-butyl group, neopentyl group, n-hexyl group, cyclohexyl group and the like.
 Z1は、-OH、または-NH2を表し、-OHが好ましい。 Z 1 represents —OH or —NH 2, and preferably —OH.
 G1は、-R11O-で示される繰り返し単位を表し、R11は炭素数2~8の直鎖状若しくは分岐状のアルキレン基、又は炭素数3~8のシクロアルキレン基を表す。R11が表わす具体的なアルキレン基またはシクロアルキレン基は、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基、シクロペンチレン基、シクロヘキシレン基などが挙げられる。 G 1 represents a repeating unit represented by —R 11 O—, and R 11 represents a linear or branched alkylene group having 2 to 8 carbon atoms or a cycloalkylene group having 3 to 8 carbon atoms. Specific examples of the alkylene group or cycloalkylene group represented by R 11 include an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a cyclopentylene group, and a cyclohexylene group.
 G2は、-C(=O)R12O-で示される繰り返し単位を表し、R12は炭素数1~8の直鎖状若しくは分岐状のアルキレン基、又は炭素数4~8のシクロアルキレン基を表す。R12が表わす具体的なアルキレン基またはシクロアルキレン基は、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基、シクロペンチレン基、シクロヘキシレン基などが挙げられる。 G 2 represents a repeating unit represented by —C (═O) R 12 O—, wherein R 12 is a linear or branched alkylene group having 1 to 8 carbon atoms, or a cycloalkylene having 4 to 8 carbon atoms. Represents a group. Specific examples of the alkylene group or cycloalkylene group represented by R 12 include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a cyclopentylene group, and a cyclohexylene group.
 G3は、-C(=O)R13C(=O)-OR14O-で示される繰り返し単位を表し、R13は炭素数2~6の直鎖状若しくは分岐状のアルキレン基、炭素数2~6の直鎖状若しくは分岐状のアルケニレン基、炭素数3~20のシクロアルキレン基、又は炭素数6~20のアリーレン基を表す。R13が表わす具体的なアルキレン基またはシクロアルキレン基は、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基、シクロペンチレン基、シクロヘキシレン基などが挙げられる。R13が表わす具体的なアルケニレン基としては、エテニレン基、プロぺニレン基、ブテニレン基、ペンテニレン基、ヘキセニレン基などが挙げられる。R13が表わす具体的なアリーレン基としては、フェニレン基、ナフチレン基、アントラセニレン基などが挙げられる。
 R14は、-CH(R15)-CH(R16)-を表す。R15およびR16は、一方が水素原子であり、他方が炭素数1~20のアルキル基、炭素数2~20のアルケニル基、炭素数6~20のアリール基、アルキル部分の炭素数が1~20のアルキルオキシメチレン基、アルケニル部分の炭素数が2~20のアルケニルオキシメチレン基、アリール部分の炭素数が6~20でアリール部分がハロゲン原子で置換されていてもよいアリールオキシメチレン基、またはN-メチレン-フタルイミド基を表す。
 炭素数1~20のアルキル基としては、炭素数1~10のアルキル基が好ましく、炭素数1~6のアルキル基がより好ましい。具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ネオペンチル基、n-へキシル基、n-オクチル基等が挙げられる。
 前記炭素数2~20のアルケニル基としては、炭素数2~10のアルケニル基が好ましく、炭素数2~6のアルケニル基がより好ましい。具体的には、エテニル基、プロペニル基、ブテニル基、ペンテニル基、ヘキセニル基などが挙げられる。
 前記炭素数6~20のアリール基としては、炭素数6~10のアリール基が好ましく、具体的には、フェニル基、ナフチル基、アントラセニル基などが挙げられる。
 前記アルキル部分の炭素数が1~20のアルキルオキシメチレン基は、R14が表わす炭素数1~20のアルキル基にオキシメチレン基が結合した態様であり、前記炭素数1~20のアルキル基は、R14が表わす炭素数1~20のアルキル基と同義であり、好ましい範囲も同様である。
 前記アルケニル部分の炭素数が2~20のアルケニルオキシメチレン基は、R14が表わす炭素数2~20のアルケニル基にオキシメチレン基が結合した態様であり、前記炭素数2~20のアルケニル基は、R14が表わす炭素数2~20のアルケニル基と同義であり、好ましい範囲も同様である。
 前記アリール部分の炭素数が6~20のアリールオキシメチレン基は、R14が表わす炭素数6~20のアリール基にオキシメチレン基が結合した態様であり、前記炭素数6~20のアリール基は、R14が表わす炭素数6~20のアリール基と同義であり、好ましい範囲も同様である。
G 3 represents a repeating unit represented by —C (═O) R 13 C (═O) —OR 14 O—, wherein R 13 is a linear or branched alkylene group having 2 to 6 carbon atoms, carbon It represents a linear or branched alkenylene group having 2 to 6 carbon atoms, a cycloalkylene group having 3 to 20 carbon atoms, or an arylene group having 6 to 20 carbon atoms. Specific examples of the alkylene group or cycloalkylene group represented by R 13 include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a cyclopentylene group, and a cyclohexylene group. Specific examples of the alkenylene group represented by R 13 include an ethenylene group, a propenylene group, a butenylene group, a pentenylene group, a hexenylene group, and the like. Specific examples of the arylene group represented by R 13 include a phenylene group, a naphthylene group, and an anthracenylene group.
R 14 represents —CH (R 15 ) —CH (R 16 ) —. One of R 15 and R 16 is a hydrogen atom, and the other is an alkyl group having 1 to 20 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, or an alkyl moiety having 1 carbon atom. An alkyloxymethylene group of -20, an alkenyloxymethylene group having 2-20 carbon atoms in the alkenyl moiety, an aryloxymethylene group in which the aryl moiety has 6-20 carbon atoms, and the aryl moiety may be substituted with a halogen atom, Or represents an N-methylene-phthalimide group.
As the alkyl group having 1 to 20 carbon atoms, an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable. Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
The alkenyl group having 2 to 20 carbon atoms is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 6 carbon atoms. Specific examples include an ethenyl group, a propenyl group, a butenyl group, a pentenyl group, and a hexenyl group.
The aryl group having 6 to 20 carbon atoms is preferably an aryl group having 6 to 10 carbon atoms, and specific examples include a phenyl group, a naphthyl group, and an anthracenyl group.
The alkyloxymethylene group having 1 to 20 carbon atoms in the alkyl moiety is an embodiment in which an oxymethylene group is bonded to the alkyl group having 1 to 20 carbon atoms represented by R 14 , and the alkyl group having 1 to 20 carbon atoms is , R 14 represents the same as the alkyl group having 1 to 20 carbon atoms, and the preferred range is also the same.
The alkenyloxymethylene group having 2 to 20 carbon atoms in the alkenyl moiety is an embodiment in which an oxymethylene group is bonded to the alkenyl group having 2 to 20 carbon atoms represented by R 14 , and the alkenyl group having 2 to 20 carbon atoms is , R 14 represents the same as the alkenyl group having 2 to 20 carbon atoms, and the preferred range is also the same.
The aryloxymethylene group having 6 to 20 carbon atoms in the aryl moiety is an embodiment in which an oxymethylene group is bonded to the aryl group having 6 to 20 carbon atoms represented by R 14 , and the aryl group having 6 to 20 carbon atoms is , R 14 represents the same as the aryl group having 6 to 20 carbon atoms, and the preferred range is also the same.
 R17は、炭素数2~8の直鎖状若しくは分岐状のアルキレン基、炭素数3~8のシクロアルキレン基、-C(=O)R12-、又は-C(=O)R13C(=O)-OR14-を表す。R17が表わす具体的なアルキレン基またはシクロアルキレン基は、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基、シクロペンチレン基、シクロヘキシレン基などが挙げられる。R12およびR13は、前述のR12およびR13と同義であり、好ましい範囲も同様である。 R 17 represents a linear or branched alkylene group having 2 to 8 carbon atoms, a cycloalkylene group having 3 to 8 carbon atoms, —C (═O) R 12 —, or —C (═O) R 13 C (= O) —OR 14 — is represented. Specific examples of the alkylene group or cycloalkylene group represented by R 17 include an ethylene group, a propylene group, a butylene group, a pentylene group, a hexylene group, a cyclopentylene group, and a cyclohexylene group. R 12 and R 13 have the same meanings as R 12 and R 13 described above, and preferred ranges are also the same.
 一般式(II)で表される化合物の合成方法としては、公知の方法で合成することができ、例えば特開2007-131832号公報の段落0047~0082の記載を参酌でき、この内容は本明細書に組み込まれる。
 本発明で用いるカルボン酸系分散剤としては、ε-カプロラクトン系化合物、およびδ-バレロラクトン系化合物との開環付加によって得られるカルボン酸系分散剤を用いることが好ましい。
As a method for synthesizing the compound represented by the general formula (II), it can be synthesized by a known method. For example, the description in paragraphs 0047 to 0082 of JP-A-2007-131832 can be referred to, and the contents thereof are described in the present specification. Embedded in the book.
As the carboxylic acid dispersant used in the present invention, a carboxylic acid dispersant obtained by ring-opening addition with an ε-caprolactone compound and a δ-valerolactone compound is preferably used.
 また、少なくとも一つの末端に水酸基を有する重合体(POH)もしくは少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2)の好ましい形態としては、例えば、一般式(III)で表されるものも好ましい。
Figure JPOXMLDOC01-appb-C000024
(一般式(III)中、Y1は、炭素数1~20、酸素数0~12、および窒素数0~3の1価の末端基を表し、X2は、-O-、-S-、または-N(Rb)-を表し、Rbは水素原子又は炭素数1~18の直鎖状若しくは分岐状のアルキル基を表す。Z1は、-OH、または-NH2を表す。
 G4およびG5は、それぞれC(=O)R12O-で示される繰り返し単位を表し、R12は炭素数1~8の直鎖状若しくは分岐状のアルキレン基、又は炭素数4~8のシクロアルキレン基を表す。ただし、G4中のR12およびG5中のR12は互いに異なる基である。R20は-C(=O)R12を表す。m4は5~60の整数を表し、m5は5~60の整数を表す。一般式(III)における前記繰り返し単位G4、G5の配置は、その順序を限定するものではなく、一般式(III)で表される重合体において、基X2と基Z1との間に繰り返し単位G4、G5が任意の順序で含まれていることを示し、更に、それらの繰り返し単位G4、G5は、それぞれランダム型又はブロック型のどちらでもよい。)
A preferred form of the polymer having at least one terminal hydroxyl group (POH) or the polymer having at least one terminal amino acid group (PNH 2 ) is, for example, represented by the general formula (III). Those are also preferable.
Figure JPOXMLDOC01-appb-C000024
(In the general formula (III), Y 1 represents a monovalent terminal group having 1 to 20 carbon atoms, 0 to 12 oxygen atoms, and 0 to 3 nitrogen atoms, and X 2 represents —O—, —S— Or —N (R b ) —, wherein Rb represents a hydrogen atom or a linear or branched alkyl group having 1 to 18 carbon atoms, and Z 1 represents —OH or —NH 2 .
G 4 and G 5 each represent a repeating unit represented by C (═O) R 12 O—, wherein R 12 is a linear or branched alkylene group having 1 to 8 carbon atoms, or 4 to 8 carbon atoms. Represents a cycloalkylene group. However, R 12 in R 12 and G 5 in G 4 are mutually different groups. R 20 represents —C (═O) R 12 . m4 represents an integer of 5 to 60, and m5 represents an integer of 5 to 60. The arrangement of the repeating units G 4 and G 5 in the general formula (III) is not limited to the order thereof, and in the polymer represented by the general formula (III), between the group X 2 and the group Z 1 Indicates that the repeating units G 4 and G 5 are included in an arbitrary order, and these repeating units G 4 and G 5 may be either random type or block type, respectively. )
 一般式(III)中、Y1は、一般式(II)中のY1と同義であり、好ましい範囲も同様である。m5=0の場合、Y1は炭素数1~7の直鎖状若しくは分岐状のアルキル基であるか、もしくはエチレン性不飽和二重結合を有することが好ましい。 In the general formula (III), Y 1 is the formula (II) in the same meaning as Y 1, and preferred ranges are also the same. When m5 = 0, Y 1 is preferably a linear or branched alkyl group having 1 to 7 carbon atoms, or has an ethylenically unsaturated double bond.
 一般式(III)中、X2は、一般式(II)中のX2と同義であり、好ましい範囲も同様である。
 一般式(III)中、Z1は、一般式(II)中のZ1と同義であり、好ましい範囲も同様である。
In the general formula (III), X 2 has the general formula (II) in the same meaning as X 2, and preferred ranges are also the same.
In the general formula (III), Z 1 has the general formula (II) in the same meaning as Z 1 in the preferred range is also the same.
 G4およびG5は、それぞれC(=O)R12O-で示される繰り返し単位を表し、R12は炭素数1~8の直鎖状若しくは分岐状のアルキレン基、又は炭素数4~8のシクロアルキレン基を表す。ただし、G4中のR12およびG5中のR12は互いに異なる基である。G4およびG5は、一般式(II)中のG2と同義であり、好ましい範囲も同様である。一般式(III)中のR12は、一般式(II)中のR12と同義であり、好ましい範囲も同様である。 G 4 and G 5 each represent a repeating unit represented by C (═O) R 12 O—, wherein R 12 is a linear or branched alkylene group having 1 to 8 carbon atoms, or 4 to 8 carbon atoms. Represents a cycloalkylene group. However, R 12 in R 12 and G 5 in G 4 are mutually different groups. G 4 and G 5 are synonymous with G 2 in the general formula (II), and preferred ranges thereof are also the same. R 12 in the general formula (III) has the same meaning as the general formula (II) R 12 in the preferred ranges are also the same.
 R20は-C(=O)R12を表す。前記R12は、一般式(II)中のR12と同義であり、好ましい範囲も同様である。 R 20 represents —C (═O) R 12 . R 12 has the same meaning as R 12 in formula (II), and the preferred range is also the same.
 一般式(III)で表される化合物の合成方法としては、公知の方法で合成することができ、例えば特開2010-189514号公報の段落0046~0087の記載を参酌でき、この内容は本明細書に組み込まれる。
 本発明で用いるカルボン酸系分散剤としては、ε-カプロラクトン系化合物、およびδ-バレロラクトン系化合物との開環付加によって得られるカルボン酸系分散剤を用いることが好ましい。
As a method for synthesizing the compound represented by the general formula (III), it can be synthesized by a known method. For example, the description in paragraphs 0046 to 0087 of JP 2010-189514 A can be referred to, and the contents thereof are described in the present specification. Embedded in the book.
As the carboxylic acid dispersant used in the present invention, a carboxylic acid dispersant obtained by ring-opening addition with an ε-caprolactone compound and a δ-valerolactone compound is preferably used.
 (トリカルボン酸無水物もしくはテトラカルボン酸二無水物)
 トリカルボン酸無水物としては、まず、脂肪族トリカルボン酸無水物、又は芳香族トリカルボン酸無水物が挙げられる。
(Tricarboxylic anhydride or tetracarboxylic dianhydride)
Examples of the tricarboxylic acid anhydride include an aliphatic tricarboxylic acid anhydride or an aromatic tricarboxylic acid anhydride.
 脂肪族トリカルボン酸無水物としては、例えば、3-カルボキシメチルグルタル酸無水物、1,2,4-ブタントリカルボン酸-1,2-無水物、cis-プロペン-1,2,3-トリカルボン酸-1,2-無水物、1,3,4-シクロペンタントリカルボン酸無水物などが挙げられる。 Examples of the aliphatic tricarboxylic acid anhydride include 3-carboxymethylglutaric acid anhydride, 1,2,4-butanetricarboxylic acid-1,2-anhydride, cis-propene-1,2,3-tricarboxylic acid- 1,2-anhydride, 1,3,4-cyclopentanetricarboxylic acid anhydride and the like.
 芳香族トリカルボン酸無水物としては、例えば、ベンゼントリカルボン酸無水物(1,2,3-ベンゼントリカルボン酸無水物、トリメリット酸無水物(1,2,4-ベンゼントリカルボン酸無水物)など)、ナフタレントリカルボン酸無水物(1,2,4-ナフタレントリカルボン酸無水物、1,4,5-ナフタレントリカルボン酸無水物、2,3,6-ナフタレントリカルボン酸無水物、1,2,8-ナフタレントリカルボン酸無水物など)、3,4,4'-ベンゾフェノントリカルボン酸無水物、3,4,4'-ビフェニルエーテルトリカルボン酸無水物、3,4,4'-ビフェニルトリカルボン酸無水物、2,3,2'-ビフェニルトリカルボン酸無水物、3,4,4'-ビフェニルメタントリカルボン酸無水物、3,4,4'-ビフェニルスルホントリカルボン酸無水物などが挙げられる。 Examples of the aromatic tricarboxylic acid anhydride include benzene tricarboxylic acid anhydride (1,2,3-benzenetricarboxylic acid anhydride, trimellitic acid anhydride (1,2,4-benzenetricarboxylic acid anhydride), etc.), Naphthalene tricarboxylic acid anhydride (1,2,4-naphthalene tricarboxylic acid anhydride, 1,4,5-naphthalene tricarboxylic acid anhydride, 2,3,6-naphthalene tricarboxylic acid anhydride, 1,2,8-naphthalene tricarboxylic acid Acid anhydride, etc.), 3,4,4′-benzophenone tricarboxylic acid anhydride, 3,4,4′-biphenyl ether tricarboxylic acid anhydride, 3,4,4′-biphenyl tricarboxylic acid anhydride, 2′-biphenyltricarboxylic acid anhydride, 3,4,4′-biphenylmethanetricarboxylic acid anhydride, 3,4,4′-biphenyl Sulfonic tricarboxylic acid anhydrides.
 トリカルボン酸無水物を使用する場合、上記のうち芳香族トリカルボン酸無水物が好ましい。 When using a tricarboxylic acid anhydride, an aromatic tricarboxylic acid anhydride is preferable among the above.
 テトラカルボン酸二無水物としては、例えば、脂肪族テトラカルボン酸二無水物、芳香族テトラカルボン酸二無水物、又は多環式テトラカルボン酸二無水物が挙げられる。 Examples of the tetracarboxylic dianhydride include aliphatic tetracarboxylic dianhydrides, aromatic tetracarboxylic dianhydrides, and polycyclic tetracarboxylic dianhydrides.
 脂肪族テトラカルボン酸二無水物としては、例えば、1,2,3,4-ブタンテトラカルボン酸二無水物、1,2,3,4-シクロブタンテトラカルボン酸二無水物、1,3-ジメチル-1,2,3,4-シクロブタンテトラカルボン酸二無水物、1,2,3,4-シクロペンタンテトラカルボン酸二無水物、2,3,5-トリカルボキシシクロペンチル酢酸二無水物、2,3,5,6-テトラカルボキシシクロヘキサン二無水物、2,3,5,6-テトラカルボキシノルボルナン二無水物、3,5,6-トリカルボキシノルボルナン-2-酢酸二無水物、2,3,4,5-テトラヒドロフランテトラカルボン酸二無水物、5-(2,5-ジオキソテトラヒドロフラル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸二無水物、ビシクロ[2,2,2]-オクト-7-エン-2,3,5,6-テトラカルボン酸二無水物などを挙げることができる。 Examples of the aliphatic tetracarboxylic dianhydride include 1,2,3,4-butanetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, and 1,3-dimethyl. -1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 2,3,5-tricarboxycyclopentylacetic dianhydride, 2, 3,5,6-tetracarboxycyclohexane dianhydride, 2,3,5,6-tetracarboxynorbornane dianhydride, 3,5,6-tricarboxynorbornane-2-acetic acid dianhydride, 2,3,4 , 5-tetrahydrofurantetracarboxylic dianhydride, 5- (2,5-dioxotetrahydrofural) -3-methyl-3-cyclohexene-1,2-dicarboxylic dianhydride Bicyclo [2,2,2] - such oct-7-ene-2,3,5,6-tetracarboxylic acid dianhydride can be mentioned.
 芳香族テトラカルボン酸二無水物としては、例えば、ピロメリット酸二無水物、エチレングリコールジ無水トリメリット酸エステル、プロピレングリコールジ無水トリメリット酸エステル、ブチレングリコールジ無水トリメリット酸エステル、3,3',4,4'-ベンゾフェノンテトラカルボン酸二無水物、2,2',3,3'-ベンゾフェノンテトラカルボン酸二無水物、3,3',4,4'-ビフェニルスルホンテトラカルボン酸二無水物、2,2',3,3'-ビフェニルスルホンテトラカルボン酸二無水物、1,4,5,8-ナフタレンテトラカルボン酸二無水物、2,3,6,7-ナフタレンテトラカルボン酸二無水物、3,3',4,4'-ビフェニルエーテルテトラカルボン酸二無水物、3,3',4,4'-ジメチルジフェニルシランテトラカルボン酸二無水物、3,3',4,4'-テトラフェニルシランテトラカルボン酸二無水物、1,2,3,4-フランテトラカルボン酸二無水物、4,4'-ビス(3,4-ジカルボキシフェノキシ)ジフェニルスルフィド二無水物、4,4'-ビス(3,4-ジカルボキシフェノキシ)ジフェニルスルホン二無水物、4,4'-ビス(3,4-ジカルボキシフェノキシ)ジフェニルプロパン二無水物、3,3',4,4'-パーフルオロイソプロピリデンジフタル酸二無水物、3,3',4,4'-ビフェニルテトラカルボン酸二無水物、ビス(フタル酸)フェニルホスフィンオキサイド二無水物、p-フェニレン-ビス(トリフェニルフタル酸)二無水物、m-フェニレン-ビス(トリフェニルフタル酸)二無水物、ビス(トリフェニルフタル酸)-4,4'-ジフェニルエーテル二無水物、ビス(トリフェニルフタル酸)-4,4'-ジフェニルメタン二無水物、9,9-ビス(3,4-ジカルボキシフェニル)フルオレン二無水物、9,9-ビス[4-(3,4-ジカルボキシフェノキシ)フェニル]フルオレン二無水物などを挙げることができる。 Examples of the aromatic tetracarboxylic dianhydride include pyromellitic dianhydride, ethylene glycol ditrimellitic anhydride ester, propylene glycol ditrimellitic anhydride ester, butylene glycol ditrimellitic anhydride ester, 3, 3 ', 4,4'-benzophenonetetracarboxylic dianhydride, 2,2', 3,3'-benzophenonetetracarboxylic dianhydride, 3,3 ', 4,4'-biphenylsulfonetetracarboxylic dianhydride 2,2 ′, 3,3′-biphenylsulfonetetracarboxylic dianhydride, 1,4,5,8-naphthalenetetracarboxylic dianhydride, 2,3,6,7-naphthalenetetracarboxylic dianhydride Anhydride, 3,3 ′, 4,4′-biphenyl ether tetracarboxylic dianhydride, 3,3 ′, 4,4′-dimethyldiphenylsilane Lacarboxylic acid dianhydride, 3,3 ′, 4,4′-tetraphenylsilane tetracarboxylic acid dianhydride, 1,2,3,4-furantetracarboxylic acid dianhydride, 4,4′-bis (3 , 4-Dicarboxyphenoxy) diphenyl sulfide dianhydride, 4,4′-bis (3,4-dicarboxyphenoxy) diphenylsulfone dianhydride, 4,4′-bis (3,4-dicarboxyphenoxy) diphenyl Propane dianhydride, 3,3 ', 4,4'-perfluoroisopropylidene diphthalic dianhydride, 3,3', 4,4'-biphenyltetracarboxylic dianhydride, bis (phthalic acid) phenyl Phosphine oxide dianhydride, p-phenylene-bis (triphenylphthalic acid) dianhydride, m-phenylene-bis (triphenylphthalic acid) dianhydride, bis (triphenylphthalic acid) ) -4,4′-diphenyl ether dianhydride, bis (triphenylphthalic acid) -4,4′-diphenylmethane dianhydride, 9,9-bis (3,4-dicarboxyphenyl) fluorene dianhydride, 9 , 9-bis [4- (3,4-dicarboxyphenoxy) phenyl] fluorene dianhydride.
 多環式テトラカルボン酸二無水物としては、例えば、3,4-ジカルボキシ-1,2,3,4-テトラヒドロ-1-ナフタレンコハク酸二無水物、3,4-ジカルボキシ-1,2,3,4-テトラヒドロ-6-メチル-1-ナフタレンコハク酸二無水物などを挙げることができる。 Examples of the polycyclic tetracarboxylic dianhydride include 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene succinic dianhydride, 3,4-dicarboxy-1,2 , 3,4-tetrahydro-6-methyl-1-naphthalene succinic dianhydride.
 テトラカルボン酸二無水物を使用する場合、上記のうち芳香族テトラカルボン酸二無水物が好ましい。 When tetracarboxylic dianhydride is used, aromatic tetracarboxylic dianhydride is preferable among the above.
 本発明で使用されるトリカルボン酸無水物またはテトラカルボン酸二無水物は、前記に例示した化合物に限らず、どのような構造をしていてもかまわない。これらは単独で用いても、併用してもかまわない。本発明に好ましく使用されるものは、顔料分散体又は各種インクの低粘度化の観点から芳香族トリカルボン酸無水物若しくは芳香族テトラカルボン酸二無水物である。更には、ピロメリット酸二無水物、3,3′,4,4′-ビフェニルテトラカルボン酸二無水物、9,9-ビス(3,4-ジカルボキシフェニル)フルオレン二酸無水物、2,3,6,7-ナフタレンテトラカルボン酸二無水物、エチレングリコールジ無水トリメリット酸エステル、トリメリット酸無水物が好ましい。 The tricarboxylic acid anhydride or tetracarboxylic dianhydride used in the present invention is not limited to the compounds exemplified above, and may have any structure. These may be used alone or in combination. What is preferably used in the present invention is an aromatic tricarboxylic acid anhydride or an aromatic tetracarboxylic acid dianhydride from the viewpoint of reducing the viscosity of the pigment dispersion or various inks. Further, pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 9,9-bis (3,4-dicarboxyphenyl) fluorene dianhydride, 2, 3,6,7-naphthalenetetracarboxylic dianhydride, ethylene glycol ditrimellitic anhydride ester and trimellitic anhydride are preferred.
(少なくとも一つの末端に水酸基を有する重合体(POH)もしくは少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2)と、トリカルボン酸無水物もしくはテトラカルボン酸二無水物との反応)
 本発明におけるカルボン酸系分散剤は、「少なくとも一つの末端に水酸基を有する重合体(POH)」の水酸基、又は前記の「少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2)」の1級アミノ基と、トリカルボン酸無水物またはテトラカルボン酸二無水物の無水物基とを反応させることによって得ることができる。
(Reaction of polymer having at least one terminal hydroxyl group (POH) or polymer having at least one terminal primary amino group (PNH 2 ) with tricarboxylic acid anhydride or tetracarboxylic acid dianhydride)
The carboxylic acid-based dispersant in the present invention is a hydroxyl group of “polymer having a hydroxyl group at at least one terminal (POH)” or the above-mentioned polymer having a primary amino group at at least one terminal (PNH 2 ). Can be obtained by reacting a tricarboxylic acid anhydride or a tetracarboxylic dianhydride anhydride group.
 重合体(POH)の水酸基又は重合体(PNH2)の1級アミノ基のモル数を<H>、トリカルボン酸無水物またはテトラカルボン酸二無水物のカルボン酸無水物基のモル数を<N>としたとき、反応比率は0.5<<H>/<N><1.2が好ましく、更に好ましくは0.7<<H>/<N><1.1、最も好ましくは<H>/<N>=1の場合である。<H>/<N><1で反応させる場合は、残存する酸無水物を必要量の水で加水分解して使用してもよい。 The number of moles of the hydroxyl group of the polymer (POH) or the primary amino group of the polymer (PNH 2 ) is <H>, and the number of moles of the carboxylic acid anhydride group of the tricarboxylic anhydride or tetracarboxylic dianhydride is <N. >, The reaction ratio is preferably 0.5 <H> / <N><1.2, more preferably 0.7 <H> / <N><1.1, and most preferably <H This is a case where> / <N> = 1. When the reaction is carried out with <H> / <N><1, the remaining acid anhydride may be hydrolyzed with a necessary amount of water and used.
 重合体(POH)又は重合体(PNH2)と、トリカルボン酸無水物またはテトラカルボン酸二無水物との反応には触媒を用いてもかまわない。触媒としては、例えば、3級アミン系化合物が使用でき、例えばトリエチルアミン、トリエチレンジアミン、N,N-ジメチルベンジルアミン、N-メチルモルホリン、1,8-ジアザビシクロ-[5.4.0]-7-ウンデセン、1,5-ジアザビシクロ-[4.3.0]-5-ノネン等が挙げられる。 A catalyst may be used for the reaction of the polymer (POH) or polymer (PNH 2 ) with the tricarboxylic acid anhydride or tetracarboxylic dianhydride. As the catalyst, for example, a tertiary amine compound can be used. For example, triethylamine, triethylenediamine, N, N-dimethylbenzylamine, N-methylmorpholine, 1,8-diazabicyclo- [5.4.0] -7- Examples include undecene and 1,5-diazabicyclo- [4.3.0] -5-nonene.
 重合体(POH)又は重合体(PNH2)と、トリカルボン酸無水物またはテトラカルボン酸二無水物との反応は無溶剤で行ってもよいし、適当な脱水有機溶媒を使用してもよい。反応に使用した溶媒は、反応終了後、蒸留等の操作により取り除くか、あるいはそのまま分散剤の製品の一部として使用することもできる。 The reaction of the polymer (POH) or polymer (PNH 2 ) with the tricarboxylic acid anhydride or tetracarboxylic dianhydride may be performed without a solvent, or an appropriate dehydrated organic solvent may be used. After completion of the reaction, the solvent used in the reaction can be removed by an operation such as distillation, or can be used as it is as a part of the product of the dispersant.
 重合体(POH)又は重合体(PNH2)と、トリカルボン酸無水物またはテトラカルボン酸二無水物との反応温度は、「少なくとも一つの末端に水酸基を有する重合体(POH)」を使用する場合は好ましくは80℃~180℃、より好ましくは90℃~160℃の範囲で行う。反応温度が80℃未満では反応速度が遅く、180℃を超えると反応して開環した酸無水物が、再度環状無水物を生成し、反応が終了しにくくなる場合がある。また、「少なくとも一つの末端に第1級アミノ基を有する重合体(PNH2)」を使用する場合は、好ましくは0~150℃、より好ましくは10℃~100℃の範囲で行う。0℃未満では反応が進まない場合があり、150℃を超えるとイミド化する場合があり好ましくない。 The reaction temperature of the polymer (POH) or polymer (PNH 2 ) and the tricarboxylic acid anhydride or tetracarboxylic dianhydride is the case where “polymer having at least one terminal hydroxyl group (POH)” is used. Is preferably performed in the range of 80 ° C. to 180 ° C., more preferably 90 ° C. to 160 ° C. When the reaction temperature is less than 80 ° C., the reaction rate is slow. When the reaction temperature exceeds 180 ° C., the acid anhydride that has reacted and opened a ring may form a cyclic anhydride again, and the reaction may be difficult to complete. In the case of using a “polymer having a primary amino group at at least one end (PNH 2 )”, it is preferably performed in the range of 0 to 150 ° C., more preferably 10 to 100 ° C. If it is less than 0 ° C., the reaction may not proceed, and if it exceeds 150 ° C., imidation may occur.
-(D-2)一般式(3)で表されるリン酸系分散剤-
 本発明の組成物は、(D-2)一般式(3)で表されるリン酸系分散剤を有することが好ましい。
-(D-2) Phosphoric acid dispersant represented by the general formula (3)-
The composition of the present invention preferably has (D-2) a phosphoric acid dispersant represented by the general formula (3).
一般式(3)
Figure JPOXMLDOC01-appb-C000025
(一般式(3)中、R3は数平均分子量400~30000のポリエステル構造を表し、yは1または2を表す。yが2の場合、複数のR3は同一であっても異なっていてもよい。)
General formula (3)
Figure JPOXMLDOC01-appb-C000025
(In the general formula (3), R 3 represents a polyester structure having a number average molecular weight of 400 to 30000, and y represents 1 or 2. When y is 2, a plurality of R 3 may be the same or different. May be good.)
 R3は数平均分子量400~30000のポリエステル構造を表し、yが2の場合、複数のR3は同一であっても異なっていてもよい。前記ポリエステル構造の数平均分子量は、より好ましくは1900~10000であり、更に好ましくは400~3000であり、特に好ましくは2000~3000である。400未満の場合は顔料分散能に欠けるため、用いることができない。 R 3 represents a polyester structure having a number average molecular weight of 400 to 30,000, and when y is 2, a plurality of R 3 may be the same or different. The number average molecular weight of the polyester structure is more preferably 1900 to 10000, still more preferably 400 to 3000, and particularly preferably 2000 to 3000. If it is less than 400, it cannot be used because it lacks pigment dispersibility.
 ポリエステル構造としては、ラクトンモノマーを開環重合して得られるポリエステル基、スチレン基、アクリロイル基、シアノアクリロイル基、メタクリロイル基、ビニルエーテル基等を有するポリエステル構造が挙げられ、ラクトンモノマーを開環重合して得られるポリエステル基が好ましい。
 また、yが2の場合、R3は、2種以上の異なるラクトンモノマーを開環重合して得られるポリエステル構造であることが好ましい。
Examples of the polyester structure include polyester structures having a polyester group obtained by ring-opening polymerization of a lactone monomer, a styrene group, an acryloyl group, a cyanoacryloyl group, a methacryloyl group, a vinyl ether group, and the like. The resulting polyester group is preferred.
When y is 2, R 3 preferably has a polyester structure obtained by ring-opening polymerization of two or more different lactone monomers.
 一般式(3)で表されるリン酸系分散剤は、R3が単一種のリン酸エステルでも良いし、異なるR3からなるリン酸エステルを複数種用いても良い。また、y=1のリン酸系分散剤単独でも良いし、y=1のリン酸系分散剤とy=2のリン酸系分散剤との混合物でもよい。
 一般式(3)で示されるリン酸エステルはy=1のリン酸系分散剤とy=2のリン酸系分散剤との存在比が100:0~100:30であると、顔料分散性が良好になり好ましい。
In the phosphate dispersant represented by the general formula (3), R 3 may be a single type of phosphate ester, or a plurality of types of phosphate esters composed of different R 3 may be used. Moreover, the phosphoric acid type | system | group dispersing agent of y = 1 may be individual, and the mixture of the phosphoric acid type dispersing agent of y = 1 and the phosphoric acid type dispersing agent of y = 2 may be sufficient.
When the phosphoric acid ester represented by the general formula (3) has an abundance ratio of the phosphoric acid dispersant with y = 1 and the phosphoric acid dispersant with y = 2 from 100: 0 to 100: 30, the pigment dispersibility Is preferable.
 また、一般式(3)で示されるリン酸系分散剤のR3が、数平均分子量400~10000のポリカプロラクトン構造であると、顔料分散性が良好になり好ましい。より好ましくは400~3000である。 In addition, it is preferable that R 3 of the phosphoric acid dispersant represented by the general formula (3) has a polycaprolactone structure having a number average molecular weight of 400 to 10,000 because the pigment dispersibility is good. More preferably, it is 400 to 3000.
 更に一般式(3)で示されるリン酸系分散剤のR3は、好ましくは下記一般式(11)で示される。
一般式(11)
12-O-R13-(O-R14S
(式中、R12はアルキレン基、R13は3価以上の多価アルコール構造を表し、R14はアクリロイル基、シアノアクリロイル基、メタクリロイル基を表し、sは2以上を表す。)
Furthermore, R 3 of the phosphoric acid dispersant represented by the general formula (3) is preferably represented by the following general formula (11).
Formula (11)
R 12 —O—R 13 — (O—R 14 ) S
(Wherein R 12 represents an alkylene group, R 13 represents a trihydric or higher polyhydric alcohol structure, R 14 represents an acryloyl group, a cyanoacryloyl group, or a methacryloyl group, and s represents 2 or more.)
 R12は炭素数8以下のアルキレン基が好ましい。また、顔料分散性の観点からsは2以上が好ましい。この場合、R14は互いに異なる基を用いても良い。sは2~5が更に好ましく、2が特に好ましい。 R 12 is preferably an alkylene group having 8 or less carbon atoms. Further, from the viewpoint of pigment dispersibility, s is preferably 2 or more. In this case, R 14 may be a different group. s is more preferably 2 to 5, and 2 is particularly preferable.
 R13で用いられる3価以上の多価アルコールとしてはグリセリン、プロピルアルコール、ペンタエリスリトール、ジペンタエリスリトール等が挙げられる。特に3~6価のものが好ましい。 Examples of the trihydric or higher polyhydric alcohol used in R 13 include glycerin, propyl alcohol, pentaerythritol, and dipentaerythritol. Particularly preferred are trivalent to hexavalent ones.
 リン酸系分散剤の酸価は、10~500mgKOH/gが好ましく、30~350mgKOH/gがより好ましく、120~200mgKOH/gがさらに好ましい。 The acid value of the phosphoric acid dispersant is preferably 10 to 500 mgKOH / g, more preferably 30 to 350 mgKOH / g, and further preferably 120 to 200 mgKOH / g.
 リン酸系分散剤の製造は、公知の方法で製造することができ、例えば特開2007-231107号公報の段落0037~0051の記載を参酌でき、この内容は本明細書に組み込まれる。
 本発明で用いるリン酸系分散剤としては、ε-カプロラクトンとδ-バレロラクトンとの開環付加によって得られるリン酸系分散剤を用いることが好ましい。
The phosphoric acid dispersant can be produced by a known method. For example, the description in paragraphs 0037 to 0051 of JP-A-2007-231107 can be referred to, and the contents thereof are incorporated herein.
As the phosphoric acid dispersant used in the present invention, a phosphoric acid dispersant obtained by ring-opening addition of ε-caprolactone and δ-valerolactone is preferably used.
-(D-3)一般式(1)および一般式(2)のいずれかで表される構造単位を含む共重合体- 本発明の組成物は、(D-3)下記一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体を有することが好ましい。
Figure JPOXMLDOC01-appb-C000026
-(D-3) a copolymer containing a structural unit represented by either general formula (1) or general formula (2)-The composition of the present invention comprises (D-3) the following general formula (1) And a copolymer containing a structural unit represented by any of the following general formula (2).
Figure JPOXMLDOC01-appb-C000026
 上記一般式(1)及び(2)中、R1~R6は、それぞれ、水素原子、又は1価の有機基を表し、X1及びX2は、それぞれ、-CO-、-C(=O)O-、-CONH-、-OC(=O)-、又はフェニレン基を表し、L1及びL2は、それぞれ、単結合、又は2価の有機連結基を表し、A1及びA2は、それぞれ、1価の有機基を表し、m及びnは、それぞれ、2~8の整数を表し、p及びqは、それぞれ、1~100の整数を表す。 In the above general formulas (1) and (2), R 1 to R 6 each represents a hydrogen atom or a monovalent organic group, and X 1 and X 2 represent —CO—, —C (= O) represents O—, —CONH—, —OC (═O) —, or a phenylene group, and L 1 and L 2 each represent a single bond or a divalent organic linking group, and A 1 and A 2 Each represents a monovalent organic group, m and n each represents an integer of 2 to 8, and p and q each represents an integer of 1 to 100.
 一般式(1)及び(2)中、R1~R6は、それぞれ、水素原子、又は1価の有機基を表す。1価の有機基としては、置換若しくは無置換のアルキル基が好ましい。アルキル基としては、炭素数1~12のアルキル基が好ましく、炭素数1~8のアルキル基がより好ましく、炭素数1~4のアルキル基が特に好ましい。
 アルキル基が置換基を有する場合、該置換基としては、例えば、ヒドロキシ基、アルコキシ基(炭素数1~5が好ましく、炭素数1~3がより好ましい。)メトキシ基、エトキシ基、シクロヘキシロキシ基等が挙げられる。
 好ましいアルキル基として、具体的には、例えば、メチル基、エチル基、プロピル基、n-ブチル基、i-ブチル基、t-ブチル基、n-ヘキシル基、シクロヘキシル基、2-ヒドロキシエチル基、3-ヒドロキシプロピル基、2-ヒドロキシプロピル基、2-メトキシエチル基が挙げられる。
一般式(1)及び(2)中、R1、R2、R4、及びR5としては、水素原子が好ましく、R3及びR6としては、水素原子又はメチル基が、顔料表面への吸着効率の点からも最も好ましい。
In general formulas (1) and (2), R 1 to R 6 each represents a hydrogen atom or a monovalent organic group. As the monovalent organic group, a substituted or unsubstituted alkyl group is preferable. As the alkyl group, an alkyl group having 1 to 12 carbon atoms is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, and an alkyl group having 1 to 4 carbon atoms is particularly preferable.
When the alkyl group has a substituent, examples of the substituent include a hydroxy group, an alkoxy group (preferably having 1 to 5 carbon atoms, more preferably 1 to 3 carbon atoms), a methoxy group, an ethoxy group, and a cyclohexyloxy group. Etc.
Specific examples of preferred alkyl groups include methyl, ethyl, propyl, n-butyl, i-butyl, t-butyl, n-hexyl, cyclohexyl, 2-hydroxyethyl, Examples thereof include a 3-hydroxypropyl group, a 2-hydroxypropyl group, and a 2-methoxyethyl group.
In general formulas (1) and (2), R 1 , R 2 , R 4 , and R 5 are preferably hydrogen atoms, and R 3 and R 6 are each a hydrogen atom or a methyl group on the pigment surface. It is most preferable from the viewpoint of adsorption efficiency.
 一般式(1)及び(2)中、X1及びX2は、それぞれ、-CO-、-C(=O)O-、-CONH-、-OC(=O)-、又はフェニレン基を表す。中でも、-C(=O)O-、-CONH-、フェニレン基が、顔料への吸着性の観点で好ましく、-C(=O)O-が最も好ましい。 In the general formulas (1) and (2), X 1 and X 2 each represent —CO—, —C (═O) O—, —CONH—, —OC (═O) —, or a phenylene group. . Among them, —C (═O) O—, —CONH—, and a phenylene group are preferable from the viewpoint of adsorptivity to the pigment, and —C (═O) O— is most preferable.
 一般式(1)及び(2)中、L1及びL2は、それぞれ、単結合、又は2価の有機連結基を表す。2価の有機連結基としては、置換若しくは無置換のアルキレン基や、該アルキレン基とヘテロ原子又はヘテロ原子を含む部分構造とからなる2価の有機連結基が好ましい。ここで、アルキレン基としては、炭素数1~12のアルキレン基が好ましく、炭素数1~8のアルキレン基が更に好ましく、炭素数1~4のアルキレン基が特に好ましい。また、ヘテロ原子を含む部分構造におけるヘテロ原子としては、例えば、酸素原子、窒素原子、硫黄原子が挙げられ、中でも、酸素原子、窒素原子が好ましい。
 好ましいアルキレン基として、具体的には、例えば、メチレン基、エチレン基、プロピレン基、トリメチレン基、テトラメチレン基が挙げられる。
 アルキレン基が置換基を有する場合、該置換基としては、例えば、ヒドロキシ基等が挙げられる。
 2価の有機連結基としては、上記のアルキレン基の末端に、-C(=O)-、-OC(=O)-、-NHC(=O)-から選ばれるヘテロ原子又はヘテロ原子を含む部分構造を有し、該ヘテロ原子又はヘテロ原子を含む部分構造を介して、隣接した酸素原子と連結したものが、顔料への吸着性の点から好ましい。ここで、隣接した酸素原子とは、一般式(1)におけるL1、及び一般式(2)におけるL2に対し、側鎖末端側で結合する酸素原子を意味する。
In general formulas (1) and (2), L 1 and L 2 each represent a single bond or a divalent organic linking group. The divalent organic linking group is preferably a substituted or unsubstituted alkylene group or a divalent organic linking group comprising the alkylene group and a hetero atom or a partial structure containing a hetero atom. Here, the alkylene group is preferably an alkylene group having 1 to 12 carbon atoms, more preferably an alkylene group having 1 to 8 carbon atoms, and particularly preferably an alkylene group having 1 to 4 carbon atoms. Moreover, as a hetero atom in the partial structure containing a hetero atom, an oxygen atom, a nitrogen atom, and a sulfur atom are mentioned, for example, Among these, an oxygen atom and a nitrogen atom are preferable.
Specific examples of preferable alkylene groups include a methylene group, an ethylene group, a propylene group, a trimethylene group, and a tetramethylene group.
When the alkylene group has a substituent, examples of the substituent include a hydroxy group.
The divalent organic linking group includes a hetero atom or a hetero atom selected from —C (═O) —, —OC (═O) —, and —NHC (═O) — at the end of the above alkylene group. A compound having a partial structure and linked to an adjacent oxygen atom via the heteroatom or a partial structure containing a heteroatom is preferable from the viewpoint of adsorptivity to the pigment. Here, the adjacent oxygen atom means an oxygen atom that binds to L 1 in the general formula (1) and L 2 in the general formula (2) on the side chain end side.
 一般式(1)及び(2)中、A1及びA2は、それぞれ、1価の有機基を表す。1価の有機基としては、ヒドロキシル基、置換若しくは非置換のアルキル基、又は、置換若しくは非置換のアリール基が好ましい。
 好ましいアルキル基の例としては、炭素原子数が1から20までの直鎖状、分岐状、及び環状のアルキル基を挙げることができ、その具体例としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ウンデシル基、ドデシル基、トリデシル基、ヘキサデシル基、オクタデシル基、エイコシル基、イソプロピル基、イソブチル基、s-ブチル基、t-ブチル基、イソペンチル基、ネオペンチル基、1-メチルブチル基、イソヘキシル基、2-エチルヘキシル基、2-メチルヘキシル基、シクロヘキシル基、シクロペンチル基、2-ノルボルニル基を挙げることができる。
In general formulas (1) and (2), A 1 and A 2 each represent a monovalent organic group. As the monovalent organic group, a hydroxyl group, a substituted or unsubstituted alkyl group, or a substituted or unsubstituted aryl group is preferable.
Examples of preferable alkyl groups include linear, branched, and cyclic alkyl groups having 1 to 20 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, Butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, hexadecyl, octadecyl, eicosyl, isopropyl, isobutyl, s-butyl, Examples thereof include t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group and 2-norbornyl group.
 置換アルキル基の置換基としては、水素を除く1価の非金属原子団の基が用いられ、好ましい例としては、ハロゲン原子(-F、-Br、-Cl、-I)、ヒドロキシル基、アルコキシ基、アリーロキシ基、メルカプト基、アルキルチオ基、アリールチオ基、アルキルジチオ基、アリールジチオ基、アミノ基、N-アルキルアミノ基、N,N-ジアルキルアミノ基、N-アリールアミノ基、N,N-ジアリールアミノ基、N-アルキル-N-アリールアミノ基、アシルオキシ基、カルバモイルオキシ基、N-アルキルカルバモイルオキシ基、N-アリールカルバモイルオキシ基、N,N-ジアルキルカルバモイルオキシ基、N,N-ジアリールカルバモイルオキシ基、N-アルキル-N-アリールカルバモイルオキシ基、アルキルスルホキシ基、アリールスルホキシ基、アシルオキシ基、アシルチオ基、アシルアミノ基、N-アルキルアシルアミノ基、N-アリールアシルアミノ基、ウレイド基、N'-アルキルウレイド基、N',N'-ジアルキルウレイド基、N'-アリールウレイド基、N',N'-ジアリールウレイド基、N'-アルキル-N'-アリールウレイド基、N-アルキルウレイド基、N-アリールウレイド基、N'-アルキル-N-アルキルウレイド基、N'-アルキル-N-アリールウレイド基、N',N'-ジアルキル-N-アルキルウレイド基、N',N'-ジアルキル-N-アリールウレイド基、N'-アリール-N-アルキルウレイド基、N'-アリール-N-アリールウレイド基、N',N'-ジアリール-N-アルキルウレイド基、N',N'-ジアリール-N-アリールウレイド基、N'-アルキル-N'-アリール-N-アルキルウレイド基、N'-アルキル-N'-アリール-N-アリールウレイド基、アルコキシカルボニルアミノ基、アリーロキシカルボニルアミノ基、N-アルキル-N-アルコキシカルボニルアミノ基、N-アルキル-N-アリーロキシカルボニルアミノ基、N-アリール-N-アルコキシカルボニルアミノ基、N-アリール-N-アリーロキシカルボニルアミノ基、ホルミル基、アシル基、カルボキシル基、アルコキシカルボニル基、アリーロキシカルボニル基、カルバモイル基、N-アルキルカルバモイル基、N,N-ジアルキルカルバモイル基、N-アリールカルバモイル基、N,N-ジアリールカルバモイル基、N-アルキル-N-アリールカルバモイル基、アルキルスルフィニル基、アリールスルフィニル基、アルキルスルホニル基、アリールスルホニル基、スルホ基(-SO3H)及びその共役塩基基(以下、スルホナト基と称す)、アルコキシスルホニル基、アリーロキシスルホニル基、スルフィナモイル基、N-アルキルスルフィナモイル基、N,N-ジアルキルスルフィナモイル基、N-アリールスルフィナモイル基、N,N-ジアリールスルフィナモイル基、N-アルキル-N-アリールスルフィナモイル基、スルファモイル基、N-アルキルスルファモイル基、N,N-ジアルキルスルファモイル基、N-アリールスルファモイル基、N,N-ジアリールスルファモイル基、N-アルキル-N-アリールスルファモイル基、ホスホノ基(-PO32)及びその共役塩基基(以下、ホスホナト基と称す)、ジアルキルホスホノ基(-PO3(alkyl)2)、ジアリールホスホノ基(-PO3(aryl)2)、アルキルアリールホスホノ基(-PO3(alkyl)(aryl))、モノアルキルホスホノ基(-PO3H(alkyl))及びその共役塩基基(以後、アルキルホスホナト基と称す)、モノアリールホスホノ基(-PO3H(aryl))及びその共役塩基基(以後、アリールホスホナト基と称す)、ホスホノオキシ基(-OPO32)及びその共役塩基基(以後、ホスホナトオキシ基と称す)、ジアルキルホスホノオキシ基(-OPO3(alkyl)2)、ジアリールホスホノオキシ基(-OPO3(aryl)2)、アルキルアリールホスホノオキシ基(-OPO3(alkyl)(aryl))、モノアルキルホスホノオキシ基(-OPO3H(alkyl))及びその共役塩基基(以後、アルキルホスホナトオキシ基と称す)、モノアリールホスホノオキシ基(-OPO3H(aryl))及びその共役塩基基(以後、アリールホスホナトオキシ基と称す)、シアノ基、ニトロ基、アリール基、ヘテロアリール基、アルケニル基、アルキニル基、シリル基が挙げられる。
 これらの置換基における、アルキル基の具体例としては、前述のアルキル基が挙げられ、これらは更に置換基を有していてもよい。
As the substituent of the substituted alkyl group, a monovalent non-metallic atomic group other than hydrogen is used. Preferred examples include halogen atoms (—F, —Br, —Cl, —I), hydroxyl groups, alkoxy groups. Group, aryloxy group, mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, amino group, N-alkylamino group, N, N-dialkylamino group, N-arylamino group, N, N-diaryl Amino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkylcarbamoyloxy group, N, N-diarylcarbamoyloxy Group, N-alkyl-N-arylcarbamoyloxy group, alkylsulfoxy Arylsulfoxy group, acyloxy group, acylthio group, acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N′-alkylureido group, N ′, N′-dialkylureido group, N '-Arylureido group, N', N'-diarylureido group, N'-alkyl-N'-arylureido group, N-alkylureido group, N-arylureido group, N'-alkyl-N-alkylureido group N′-alkyl-N-arylureido group, N ′, N′-dialkyl-N-alkylureido group, N ′, N′-dialkyl-N-arylureido group, N′-aryl-N-alkylureido group N′-aryl-N-arylureido group, N ′, N′-diaryl-N-alkylureido group, N ′, N′-diaryl-N-aryluree Id group, N′-alkyl-N′-aryl-N-alkylureido group, N′-alkyl-N′-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxycarbonylamino group, N-alkyl- N-alkoxycarbonylamino group, N-alkyl-N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N-aryloxycarbonylamino group, formyl group, acyl group, carboxyl group , Alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N-diarylcarbamoyl group, N-alkyl-N-arylcarbamoyl group An alkylsulfinyl group, Arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, sulfo group (—SO 3 H) and its conjugate base group (hereinafter referred to as sulfonate group), alkoxysulfonyl group, aryloxysulfonyl group, sulfinamoyl group, N-alkyls Rufinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl group, N-alkyl-N-arylsulfinamoyl group, sulfamoyl group, N-alkyl Sulfamoyl group, N, N-dialkylsulfamoyl group, N-arylsulfamoyl group, N, N-diarylsulfamoyl group, N-alkyl-N-arylsulfamoyl group, phosphono group (—PO 3 H 2) and its conjugated base group (hereinafter referred to as phosphonato group), Zia Kiruhosuhono group (-PO 3 (alkyl) 2) , diaryl phosphono group (-PO 3 (aryl) 2) , alkyl aryl phosphono group (-PO 3 (alkyl) (aryl )), monoalkyl phosphono group (- PO 3 H (alkyl)) and its conjugate base group (hereinafter referred to as alkylphosphonate group), monoarylphosphono group (—PO 3 H (aryl)) and its conjugate base group (hereinafter referred to as arylphosphonate group) ), Phosphonooxy group (—OPO 3 H 2 ) and its conjugate base group (hereinafter referred to as phosphonatoxy group), dialkylphosphonooxy group (—OPO 3 (alkyl) 2 ), diarylphosphonooxy group (—OPO 3). (aryl) 2), alkylaryl phosphono group (-OPO 3 (alkyl) (aryl )), monoalkyl phosphono Alkoxy group (-OPO 3 H (alkyl)) and its conjugated base group (hereinafter referred to as alkylphosphonato group), monoarylphosphono group (-OPO 3 H (aryl)) and its conjugated base group (hereinafter And cyano group, nitro group, aryl group, heteroaryl group, alkenyl group, alkynyl group, and silyl group.
Specific examples of the alkyl group in these substituents include the alkyl groups described above, and these may further have a substituent.
 置換基としては、アルコキシ基、アリーロキシ基、アルキルチオ基、アリールチオ基、N,N-ジアルキルアミノ基、N,N-ジアリールアミノ基、N-アルキル-N-アリールアミノ基、アシルオキシ基、アリール基、ヘテロアリール基、アルケニル基、アルキニル基、シリル基が、分散安定性の点から好ましい。 Examples of the substituent include alkoxy group, aryloxy group, alkylthio group, arylthio group, N, N-dialkylamino group, N, N-diarylamino group, N-alkyl-N-arylamino group, acyloxy group, aryl group, hetero An aryl group, an alkenyl group, an alkynyl group, and a silyl group are preferable from the viewpoint of dispersion stability.
 アリール基の具体例としては、フェニル基、ビフェニル基、ナフチル基、トリル基、キシリル基、メシチル基、クメニル基、クロロフェニル基、ブロモフェニル基、クロロメチルフェニル基、ヒドロキシフェニル基、メトキシフェニル基、エトキシフェニル基、フェノキシフェニル基、アセトキシフェニル基、ベンゾイロキシフェニル基、メチルチオフェニル基、フェニルチオフェニル基、メチルアミノフェニル基、ジメチルアミノフェニル基、アセチルアミノフェニル基、カルボキシフェニル基、メトキシカルボニルフェニル基、エトキシフェニルカルボニル基、フェノキシカルボニルフェニル基、N-フェニルカルバモイルフェニル基、フェニル基、シアノフェニル基、スルホフェニル基、スルホナトフェニル基、ホスフォノフェニル基、ホスフォナトフェニル基等を挙げることができる。 Specific examples of the aryl group include phenyl, biphenyl, naphthyl, tolyl, xylyl, mesityl, cumenyl, chlorophenyl, bromophenyl, chloromethylphenyl, hydroxyphenyl, methoxyphenyl, ethoxy Phenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group, methylthiophenyl group, phenylthiophenyl group, methylaminophenyl group, dimethylaminophenyl group, acetylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl group, Ethoxyphenylcarbonyl group, phenoxycarbonylphenyl group, N-phenylcarbamoylphenyl group, phenyl group, cyanophenyl group, sulfophenyl group, sulfonatophenyl group, phosphonophenyl , Can be exemplified phosphonophenyl phenyl group.
 A1及びA2としては、分散安定性、現像性の点から、炭素原子数1から20までの直鎖状、炭素原子数3から20までの分岐状、並びに炭素原子数5から20までの環状のアルキル基が好ましく、炭素原子数4から15までの直鎖状、炭素原子数4から15までの分岐状、並びに炭素原子数6から10までの環状のアルキル基がより好ましく、炭素原子数6から10までの直鎖状、炭素原子数6から12までの分岐状のアルキル基が更に好ましい。 As A 1 and A 2 , from the viewpoint of dispersion stability and developability, a straight chain having 1 to 20 carbon atoms, a branched structure having 3 to 20 carbon atoms, and a carbon number having 5 to 20 carbon atoms. Cyclic alkyl groups are preferable, linear alkyl groups having 4 to 15 carbon atoms, branched alkyl groups having 4 to 15 carbon atoms, and cyclic alkyl groups having 6 to 10 carbon atoms are more preferable. Even more preferred are linear alkyl groups of 6 to 10 and branched alkyl groups of 6 to 12 carbon atoms.
 一般式(1)及び(2)中、m及びnは、それぞれ、2~8の整数を表す。分散安定性、現像性の点から、4~6が好ましく、5が最も好ましい。 In general formulas (1) and (2), m and n each represent an integer of 2 to 8. From the viewpoint of dispersion stability and developability, 4 to 6 is preferable, and 5 is most preferable.
 一般式(1)及び(2)中、p及びqは、それぞれ、1~100の整数を表す。pの異なるもの、qの異なるものが2種以上、混合されてもよい。p及びqは、分散安定性、現像性の点から、5~60が好ましく、5~40がより好ましく、5~20が更に好ましい。 In general formulas (1) and (2), p and q each represent an integer of 1 to 100. Two or more different p and different q may be mixed. p and q are preferably 5 to 60, more preferably 5 to 40, and still more preferably 5 to 20 from the viewpoints of dispersion stability and developability.
 一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体としては、分散安定性の点から、前記一般式(1)で表される繰り返し単位を含むものが好ましい。 The copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) includes the repeating unit represented by the general formula (1) from the viewpoint of dispersion stability. Those are preferred.
 また、一般式(1)で表される繰り返し単位としては、下記一般式(1)-2で表される繰り返し単位であることがより好ましい。 The repeating unit represented by the general formula (1) is more preferably a repeating unit represented by the following general formula (1) -2.
一般式(1)-2
Figure JPOXMLDOC01-appb-C000027
General formula (1) -2
Figure JPOXMLDOC01-appb-C000027
 上記一般式(1)-2中、R1~R3は、それぞれ、水素原子、又は1価の有機基を表し、Laは、炭素数2~10のアルキレン基を表し、Lbは、-C(=O)-、又は-NHC(=O)-を表し、A1は、1価の有機基を表し、mは、2~8の整数を表し、pは、1~100の整数を表す。 In the general formula (1) -2, R 1 to R 3 each represents a hydrogen atom or a monovalent organic group, La represents an alkylene group having 2 to 10 carbon atoms, and Lb represents —C (═O) — or —NHC (═O) —, A 1 represents a monovalent organic group, m represents an integer of 2 to 8, and p represents an integer of 1 to 100 .
 一般式(1)、(2)、又は、(1)-2で表される繰り返し単位は、それぞれ、下記一般式(i)、(ii)、又は、(i)-2で表される単量体を、重合或いは共重合することにより、高分子化合物の繰り返し単位として導入される。 The repeating unit represented by the general formula (1), (2), or (1) -2 is a simple unit represented by the following general formula (i), (ii), or (i) -2, respectively. The polymer is introduced as a repeating unit of the polymer compound by polymerization or copolymerization.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
 上記一般式(i)、(ii)、及び(i)-2中、R1~R6は、それぞれ、水素原子、又は1価の有機基を表し、X1及びX2は、それぞれ、-CO-、-C(=O)O-、-CONH-、-OC(=O)-、又はフェニレン基を表し、L1及びL2は、それぞれ、単結合、又は2価の有機連結基を表し、Laは、炭素数2~10のアルキレン基を表し、Lbは、-C(=O)-、又は-NHC(=O)-を表し、A1及びA2は、それぞれ、1価の有機基を表し、m及びnは、それぞれ、2~8の整数を表し、p及びqは、それぞれ、1~100の整数を表す。 In the general formulas (i), (ii), and (i) -2, R 1 to R 6 each represent a hydrogen atom or a monovalent organic group, and X 1 and X 2 are each — CO—, —C (═O) O—, —CONH—, —OC (═O) —, or a phenylene group, and L 1 and L 2 each represents a single bond or a divalent organic linking group. La represents an alkylene group having 2 to 10 carbon atoms, Lb represents —C (═O) — or —NHC (═O) —, and A 1 and A 2 each represents a monovalent group. Represents an organic group, m and n each represents an integer of 2 to 8, and p and q each represents an integer of 1 to 100.
 以下に、一般式(i)、(ii)、又は(i)-2で表される単量体の好ましい具体例としては、特開2012-173356号公報の段落番号0081~0084に記載の単量体(XA-1)~(XA-23)が例示されるが、本発明はこれらに制限されるものではない。 In the following, preferred specific examples of the monomer represented by the general formula (i), (ii), or (i) -2 are those described in paragraphs 0081 to 0084 of JP2012-173356A. Examples of the monomers (XA-1) to (XA-23) are shown, but the present invention is not limited thereto.
 一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体は、一般式(1)及び(2)のいずれかで表される繰り返し単位から選択される少なくとも1種の繰り返し単位を含んでいればよく、1種のみ含むものであってもよいし、2種以上を含んでもよい。 The copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) is selected from the repeating units represented by any one of the general formulas (1) and (2). It is sufficient that at least one type of repeating unit is included, and only one type may be included, or two or more types may be included.
 また、一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体において、一般式(1)及び(2)のいずれかで表される繰り返し単位の含有量は、特に制限はないが、重合体に含有される全繰り返し単位を100質量%とした場合に、一般式(1)及び(2)のいずれかで表される繰り返し単位を5質量%以上含有することが好ましく、50質量%含有することがより好ましく、50質量%~80質量%含有することが更に好ましい。 Moreover, in the copolymer containing the structural unit represented by either the general formula (1) or the following general formula (2), the inclusion of the repeating unit represented by any of the general formulas (1) and (2) The amount is not particularly limited, but when the total repeating unit contained in the polymer is 100% by mass, the repeating unit represented by any one of the general formulas (1) and (2) is 5% by mass or more. The content is preferably 50% by mass, more preferably 50% by mass to 80% by mass.
 前記一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体は、顔料への吸着を高める目的で、顔料に吸着し得る官能基を有する単量体と、前述の一般式(i)、(ii)、(i)-2で表される単量体と、を共重合した高分子化合物であることが好ましい。
 顔料に吸着し得る官能基を有する単量体としては、具体的には、酸性基を有するモノマー、有機色素構造或いは複素環構造を有するモノマー、塩基性窒素原子を有するモノマー、イオン性基を有するモノマーなどを挙げることができる。中でも、顔料への吸着力の点で、酸性基を有するモノマー、有機色素構造或いは複素環構造を有するモノマー、が好ましい。
The copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) is a monomer having a functional group capable of adsorbing to the pigment for the purpose of enhancing adsorption to the pigment. And a polymer compound obtained by copolymerizing the above-described monomers represented by the general formulas (i), (ii), and (i) -2.
Specific examples of the monomer having a functional group capable of adsorbing to the pigment include a monomer having an acidic group, a monomer having an organic dye structure or a heterocyclic structure, a monomer having a basic nitrogen atom, and an ionic group. A monomer etc. can be mentioned. Of these, monomers having an acidic group, and monomers having an organic dye structure or a heterocyclic structure are preferable from the viewpoint of adsorption to the pigment.
 酸性基を有するモノマーの例としては、カルボキシル基を有するビニルモノマーやスルホン酸基を有するビニルモノマーが挙げられる。
 カルボキシル基を有するビニルモノマーとして、(メタ)アクリル酸、ビニル安息香酸、マレイン酸、マレイン酸モノアルキルエステル、フマル酸、イタコン酸、クロトン酸、桂皮酸、アクリル酸ダイマーなどが挙げられる。また、2-ヒドロキシエチル(メタ)アクリレートなどの水酸基を有する単量体と無水マレイン酸、無水フタル酸、無水コハク酸、シクロヘキサンジカルボン酸無水物のような環状無水物との付加反応物、ω-カルボキシ-ポリカプロラクトンモノ(メタ)アクリレートなども利用できる。また、カルボキシル基の前駆体として無水マレイン酸、無水イタコン酸、無水シトラコン酸などの無水物含有モノマーを用いてもよい。なおこれらの内では、未露光部の現像除去性の観点から2-ヒドロキシエチル(メタ)アクリレートなどの水酸基を有する単量体と無水マレイン酸、無水フタル酸、無水コハク酸、シクロヘキサンジカルボン酸無水物のような環状無水物との付加反応物が好ましい。
Examples of the monomer having an acidic group include a vinyl monomer having a carboxyl group and a vinyl monomer having a sulfonic acid group.
Examples of the vinyl monomer having a carboxyl group include (meth) acrylic acid, vinyl benzoic acid, maleic acid, maleic acid monoalkyl ester, fumaric acid, itaconic acid, crotonic acid, cinnamic acid, and acrylic acid dimer. Further, an addition reaction product of a monomer having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate and a cyclic anhydride such as maleic anhydride, phthalic anhydride, succinic anhydride, cyclohexanedicarboxylic anhydride, ω- Carboxy-polycaprolactone mono (meth) acrylate and the like can also be used. Moreover, you may use anhydride containing monomers, such as maleic anhydride, itaconic anhydride, and citraconic anhydride, as a precursor of a carboxyl group. Of these, monomers having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate and maleic anhydride, phthalic anhydride, succinic anhydride, cyclohexanedicarboxylic anhydride from the viewpoint of developing removability of unexposed areas. An addition reaction product with a cyclic anhydride such as
 また、スルホン酸基を有するビニルモノマーとして、2-アクリルアミド-2-メチルプロパンスルホン酸などが挙げられ、リン酸基を有するビニルモノマーとして、リン酸モノ(2-アクリロイルオキシエチルエステル)、リン酸モノ(1-メチル-2-アクリロイルオキシエチルエステル)などが挙げられる。 Examples of the vinyl monomer having a sulfonic acid group include 2-acrylamido-2-methylpropanesulfonic acid, and examples of the vinyl monomer having a phosphoric acid group include phosphoric acid mono (2-acryloyloxyethyl ester) and phosphoric acid mono (1-methyl-2-acryloyloxyethyl ester) and the like.
 一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体は、上述のような酸性基を有するモノマーに由来する繰り返し単位を含むことが好ましい。このような繰り返し単位を含むことにより、本発明の組成物を着色感光性樹脂組成物に適用した場合において、未露光部の現像除去性に優れる。 The copolymer containing a structural unit represented by any one of the general formula (1) and the following general formula (2) preferably contains a repeating unit derived from a monomer having an acidic group as described above. By including such a repeating unit, when the composition of the present invention is applied to a colored photosensitive resin composition, the development removability of an unexposed portion is excellent.
 一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体は、酸性基を有するモノマーに由来する繰り返し単位を、1種のみ含むものであってもよいし、2種以上を含んでもよい。
 一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体において、酸性基を有するモノマーに由来する繰り返し単位の含有量は、好ましくは50mgKOH/g以上であり、特に好ましくは50mgKOH/g~200mgKOH/gである。即ち、現像液中での析出物の生成抑制という点では、酸性基を有するモノマーに由来する繰り返し単位の含有量は50mgKOH/g以上であることが好ましい。顔料の1次粒子の凝集体である2次凝集体の生成を効果的に抑制、或いは、2次凝集体の凝集力を効果的に弱めるためには、酸性基を有するモノマーに由来する繰り返し単位の含有量は50mgKOH/g~200mgKOH/gであることが好ましい。
The copolymer containing the structural unit represented by any of the general formula (1) and the following general formula (2) may contain only one type of repeating unit derived from a monomer having an acidic group. And two or more types may be included.
In the copolymer including the structural unit represented by any one of the general formula (1) and the following general formula (2), the content of the repeating unit derived from the monomer having an acidic group is preferably 50 mgKOH / g or more. And particularly preferably 50 mg KOH / g to 200 mg KOH / g. That is, in terms of suppressing the formation of precipitates in the developer, the content of the repeating unit derived from the monomer having an acidic group is preferably 50 mgKOH / g or more. In order to effectively suppress the formation of secondary aggregates, which are aggregates of primary particles of pigment, or to effectively weaken the cohesive force of secondary aggregates, repeating units derived from monomers having acidic groups The content of is preferably 50 mgKOH / g to 200 mgKOH / g.
 前記有機色素構造或いは複素環構造を有するモノマーとしては、例えば、特開2009-256572号公報の段落番号0048~段落番号0070に記載されている、特定の単量体、マレイミド、及びマレイミド誘導体からなる群より選択される1種が挙げられる。 Examples of the monomer having an organic dye structure or a heterocyclic structure include, for example, specific monomers, maleimides, and maleimide derivatives described in JP-A-2009-256572, paragraph numbers 0048 to 0070. 1 type selected from a group is mentioned.
 前記塩基性窒素原子を有するモノマーとしては、(メタ)アクリル酸エステルとして、(メタ)アクリル酸N,N-ジメチルアミノエチル、(メタ)アクリル酸N,N-ジメチルアミノプロピル、(メタ)アクリル酸1-(N,N-ジメチルアミノ)-1,1-ジメチルメチル、(メタ)アクリル酸N,N-ジメチルアミノヘキシル、(メタ)アクリル酸N,N-ジエチルアミノエチル、(メタ)アクリル酸N,N-ジイソプロピルアミノエチル、(メタ)アクリル酸N,N-ジ-n-ブチルアミノエチル、(メタ)アクリル酸N,N-ジ-i-ブチルアミノエチル、(メタ)アクリル酸モルホリノエチル、(メタ)アクリル酸ピペリジノエチル、(メタ)アクリル酸1-ピロリジノエチル、(メタ)アクリル酸N,N-メチル-2-ピロリジルアミノエチル及び(メタ)アクリル酸N,N-メチルフェニルアミノエチルなどが挙げられ、(メタ)アクリルアミド類として、N-(N',N'-ジメチルアミノエチル)アクリルアミド、N-(N',N'-ジメチルアミノエチル)メタクリルアミド、N-(N',N'-ジエチルアミノエチル)アクリルアミド、N-(N',N'-ジエチルアミノエチル)メタクリルアミド、N-(N',N'-ジメチルアミノプロピル)アクリルアミド、N-(N',N'-ジメチルアミノプロピル)メタクリルアミド、N-(N',N'-ジエチルアミノプロピル)アクリルアミド、N-(N',N'-ジエチルアミノプロピル)メタクリルアミド、2-(N,N-ジメチルアミノ)エチル(メタ)アクリルアミド、2-(N,N-ジエチルアミノ)エチル(メタ)アクリルアミド、3-(N,N-ジエチルアミノ)プロピル(メタ)アクリルアミド、3-(N,N-ジメチルアミノ)プロピル(メタ)アクリルアミド、1-(N,N-ジメチルアミノ)-1,1-ジメチルメチル(メタ)アクリルアミド及び6-(N,N-ジエチルアミノ)ヘキシル(メタ)アクリルアミド、モルホリノ(メタ)アクリルアミド、ピペリジノ(メタ)アクリルアミド、N-メチル-2-ピロリジル(メタ)アクリルアミドなどが挙げられ、スチレン類として、N,N-ジメチルアミノスチレン、N,N-ジメチルアミノメチルスチレン等、が挙げられる。 Examples of the monomer having a basic nitrogen atom include (meth) acrylic acid ester, N, N-dimethylaminoethyl (meth) acrylate, N, N-dimethylaminopropyl (meth) acrylate, and (meth) acrylic acid. 1- (N, N-dimethylamino) -1,1-dimethylmethyl, N, N-dimethylaminohexyl (meth) acrylate, N, N-diethylaminoethyl (meth) acrylate, N (meth) acrylic acid, N-diisopropylaminoethyl, N, N-di-n-butylaminoethyl (meth) acrylate, N, N-di-i-butylaminoethyl (meth) acrylate, morpholinoethyl (meth) acrylate, (meth ) Piperidinoethyl acrylate, 1-pyrrolidinoethyl (meth) acrylate, N, N-methyl-2-pyro (meth) acrylate And (meth) acrylamides include N- (N ′, N′-dimethylaminoethyl) acrylamide, N- (N ′, N, N-methylaminoethyl). N'-dimethylaminoethyl) methacrylamide, N- (N ', N'-diethylaminoethyl) acrylamide, N- (N', N'-diethylaminoethyl) methacrylamide, N- (N ', N'-dimethylamino) Propyl) acrylamide, N- (N ′, N′-dimethylaminopropyl) methacrylamide, N- (N ′, N′-diethylaminopropyl) acrylamide, N- (N ′, N′-diethylaminopropyl) methacrylamide, 2 -(N, N-dimethylamino) ethyl (meth) acrylamide, 2- (N, N-diethylamino) ethyl (meth) Acrylamide, 3- (N, N-diethylamino) propyl (meth) acrylamide, 3- (N, N-dimethylamino) propyl (meth) acrylamide, 1- (N, N-dimethylamino) -1,1-dimethylmethyl Examples include (meth) acrylamide and 6- (N, N-diethylamino) hexyl (meth) acrylamide, morpholino (meth) acrylamide, piperidino (meth) acrylamide, N-methyl-2-pyrrolidyl (meth) acrylamide, and styrenes. N, N-dimethylaminostyrene, N, N-dimethylaminomethylstyrene and the like.
 また、ウレア基、ウレタン基、配位性酸素原子を有する、炭素数4以上の炭化水素基、アルコキシシリル基、エポキシ基、イソシアネート基、水酸基を有するモノマーを用いることも可能である。具体的には、特開2012-173356号公報の段落番号0095に記載のモノマーを挙げることができ、これらの内容は本願明細書に組み込まれる。 It is also possible to use a monomer having a urea group, a urethane group, a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, or a hydroxyl group. Specific examples include the monomers described in paragraph No. 0095 of JP2012-173356A, the contents of which are incorporated herein.
 イオン性基を有するモノマーとしては、イオン性基を有するビニルモノマー(アニオン性ビニルモノマー、カチオン性ビニルモノマー)が挙げられる。この例としては、アニオン性ビニルモノマーとして、前記酸性基を有するビニルモノマーのアルカリ金属塩や、有機アミン(例えば、トリエチルアミン、ジメチルアミノエタノール等の3級アミン)の塩などが挙げられ、カチオン性ビニルモノマーとしては、前記含窒素ビニルモノマーを、ハロゲン化アルキル(アルキル基:C1~18、ハロゲン原子:塩素原子、臭素原子又はヨウ素原子);塩化ベンジル、臭化ベンジル等のハロゲン化ベンジル;メタンスルホン酸等のアルキルスルホン酸エステル(アルキル基:C1~18);ベンゼンスルホン酸、トルエンスルホン酸等のアリールスルホン酸アルキルエステル(アルキル基:C1~18);硫酸ジアルキル(アルキル基:C1~4)等で4級化させたもの、ジアルキルジアリルアンモニウム塩などが挙げられる。 Examples of the monomer having an ionic group include vinyl monomers having an ionic group (anionic vinyl monomers and cationic vinyl monomers). Examples of the anionic vinyl monomer include alkali metal salts of vinyl monomers having the acidic group and salts of organic amines (eg, tertiary amines such as triethylamine and dimethylaminoethanol). As the monomer, the nitrogen-containing vinyl monomer is an alkyl halide (alkyl group: C1-18, halogen atom: chlorine atom, bromine atom or iodine atom); benzyl halide such as benzyl chloride or benzyl bromide; methanesulfonic acid Alkyl sulfonic acid ester (alkyl group: C1-18); aryl sulfonic acid alkyl ester such as benzenesulfonic acid, toluenesulfonic acid (alkyl group: C1-18); dialkyl sulfate (alkyl group: C1-4), etc. Quaternized, dialkyl diallyl ammo The presence or absence salts.
 顔料に吸着し得る官能基を有するモノマーは、分散する顔料の種類に応じて、適宜選択することができ、これらは単独で用いてもよく、2種以上を併用してもよい。 The monomer having a functional group capable of adsorbing to the pigment can be appropriately selected according to the type of the pigment to be dispersed, and these may be used alone or in combination of two or more.
 一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体は、その効果を損なわない範囲において、更に、共重合可能なビニルモノマーに由来する繰り返し単位を含んでいてもよい。 The copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) further includes a repeating unit derived from a copolymerizable vinyl monomer as long as the effect is not impaired. May be included.
 ここで使用可能なビニルモノマーとしては、特に制限されないが、例えば、(メタ)アクリル酸エステル類、クロトン酸エステル類、ビニルエステル類、マレイン酸ジエステル類、フマル酸ジエステル類、イタコン酸ジエステル類、(メタ)アクリルアミド類、ビニルエーテル類、ビニルアルコールのエステル類、スチレン類、(メタ)アクリロニトリルなどが好ましい。このようなビニルモノマーの具体例としては、例えば以下のような化合物が挙げられる。なお、本明細書において「アクリル、メタクリル」のいずれか或いは双方を示す場合「(メタ)アクリル」と記載することがある。 Although it does not restrict | limit especially as a vinyl monomer which can be used here, For example, (meth) acrylic acid esters, crotonic acid esters, vinyl esters, maleic acid diesters, fumaric acid diesters, itaconic acid diesters, ( Preference is given to meth) acrylamides, vinyl ethers, esters of vinyl alcohol, styrenes, (meth) acrylonitrile and the like. Specific examples of such vinyl monomers include the following compounds. In addition, in this specification, when showing either or both of "acryl and methacryl", it may describe as "(meth) acryl".
 (メタ)アクリル酸エステル類の例としては、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n-プロピル、(メタ)アクリル酸イソプロピル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸t-ブチル、(メタ)アクリル酸n-ヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸t-ブチルシクロヘキシル、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸t-オクチル、(メタ)アクリル酸ドデシル、(メタ)アクリル酸オクタデシル、(メタ)アクリル酸アセトキシエチル、(メタ)アクリル酸アセトアセトキシエチル、(メタ)アクリル酸フェニル、(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-メトキシエチル、(メタ)アクリル酸2-エトキシエチル、(メタ)アクリル酸2-(2-メトキシエトキシ)エチル、(メタ)アクリル酸3-フェノキシ-2-ヒドロキシプロピル、(メタ)アクリル酸ベンジル、(メタ)アクリル酸ジエチレングリコールモノメチルエーテル、(メタ)アクリル酸ジエチレングリコールモノエチルエーテル、(メタ)アクリル酸トリエチレングリコールモノメチルエーテル、(メタ)アクリル酸トリエチレングリコールモノエチルエーテル、(メタ)アクリル酸ポリエチレングリコールモノメチルエーテル、(メタ)アクリル酸ポリエチレングリコールモノエチルエーテル、(メタ)アクリル酸β-フェノキシエトキシエチル、(メタ)アクリル酸ノニルフェノキシポリエチレングリコール、(メタ)アクリル酸ジシクロペンテニル、(メタ)アクリル酸ジシクロペンテニルオキシエチル、(メタ)アクリル酸トリフロロエチル、(メタ)アクリル酸オクタフロロペンチル、(メタ)アクリル酸パーフロロオクチルエチル、(メタ)アクリル酸ジシクロペンタニル、(メタ)アクリル酸トリブロモフェニル、(メタ)アクリル酸トリブロモフェニルオキシエチルなどが挙げられる。 Examples of (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate , Isobutyl (meth) acrylate, t-butyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, 2- (meth) acrylic acid 2- Ethylhexyl, t-octyl (meth) acrylate, dodecyl (meth) acrylate, octadecyl (meth) acrylate, acetoxyethyl (meth) acrylate, acetoacetoxyethyl (meth) acrylate, phenyl (meth) acrylate, ( 2-hydroxyethyl (meth) acrylate, 2-methoxy (meth) acrylate Chill, 2-ethoxyethyl (meth) acrylate, 2- (2-methoxyethoxy) ethyl (meth) acrylate, 3-phenoxy-2-hydroxypropyl (meth) acrylate, benzyl (meth) acrylate, (meth ) Acrylic acid diethylene glycol monomethyl ether, (meth) acrylic acid diethylene glycol monoethyl ether, (meth) acrylic acid triethylene glycol monomethyl ether, (meth) acrylic acid triethylene glycol monoethyl ether, (meth) acrylic acid polyethylene glycol monomethyl ether, (Meth) acrylic acid polyethylene glycol monoethyl ether, (meth) acrylic acid β-phenoxyethoxyethyl, (meth) acrylic acid nonylphenoxypolyethylene glycol, (meth) acrylic acid di Cyclopentenyl, dicyclopentenyloxyethyl (meth) acrylate, trifluoroethyl (meth) acrylate, octafluoropentyl (meth) acrylate, perfluorooctylethyl (meth) acrylate, dicyclopenta (meth) acrylate Nyl, tribromophenyl (meth) acrylate, tribromophenyloxyethyl (meth) acrylate, and the like.
 クロトン酸エステル類の例としては、クロトン酸ブチル、及びクロトン酸ヘキシル等が挙げられる。
 ビニルエステル類の例としては、ビニルアセテート、ビニルプロピオネート、ビニルブチレート、ビニルメトキシアセテート、及び安息香酸ビニルなどが挙げられる。
マレイン酸ジエステル類の例としては、マレイン酸ジメチル、マレイン酸ジエチル、及びマレイン酸ジブチルなどが挙げられる。
 フマル酸ジエステル類の例としては、フマル酸ジメチル、フマル酸ジエチル、及びフマル酸ジブチルなどが挙げられる。
 イタコン酸ジエステル類の例としては、イタコン酸ジメチル、イタコン酸ジエチル、及びイタコン酸ジブチルなどが挙げられる。
Examples of crotonic acid esters include butyl crotonate and hexyl crotonate.
Examples of vinyl esters include vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methoxyacetate, vinyl benzoate, and the like.
Examples of maleic acid diesters include dimethyl maleate, diethyl maleate, and dibutyl maleate.
Examples of the fumaric acid diesters include dimethyl fumarate, diethyl fumarate, and dibutyl fumarate.
Examples of itaconic acid diesters include dimethyl itaconate, diethyl itaconate, and dibutyl itaconate.
 (メタ)アクリルアミド類としては、(メタ)アクリルアミド、N-メチル(メタ)アクリルアミド、N-エチル(メタ)アクリルアミド、N-プロピル(メタ)アクリルアミド、N-イソプロピル(メタ)アクリルアミド、N-n-ブチル(メタ)アクリルアミド、N-t-ブチル(メタ)アクリルアミド、N-シクロヘキシル(メタ)アクリルアミド、N-(2-メトキシエチル)(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N,N-ジエチル(メタ)アクリルアミド、N-フェニル(メタ)アクリルアミド、N-ベンジル(メタ)アクリルアミド、(メタ)アクリロイルモルホリン、ジアセトンアクリルアミドなどが挙げられる。 (Meth) acrylamides include (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide, Nn-butyl (Meth) acrylamide, Nt-butyl (meth) acrylamide, N-cyclohexyl (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N- Examples include diethyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-benzyl (meth) acrylamide, (meth) acryloylmorpholine, diacetone acrylamide, and the like.
 ビニルエーテル類の例としては、メチルビニルエーテル、ブチルビニルエーテル、ヘキシルビニルエーテル、及びメトキシエチルビニルエーテルなどが挙げられる。
 スチレン類の例としては、スチレン、メチルスチレン、ジメチルスチレン、トリメチルスチレン、エチルスチレン、イソプロピルスチレン、ブチルスチレン、ヒドロキシスチレン、メトキシスチレン、ブトキシスチレン、アセトキシスチレン、クロロスチレン、ジクロロスチレン、ブロモスチレン、クロロメチルスチレン、酸性物質により脱保護可能な基(例えばt-Bocなど)で保護されたヒドロキシスチレン、ビニル安息香酸メチル、及びα-メチルスチレンなどが挙げられる。
Examples of vinyl ethers include methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, and methoxyethyl vinyl ether.
Examples of styrenes include styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, butyl styrene, hydroxy styrene, methoxy styrene, butoxy styrene, acetoxy styrene, chlorostyrene, dichlorostyrene, bromostyrene, chloromethyl Examples thereof include styrene, hydroxystyrene protected with a group that can be deprotected by an acidic substance (for example, t-Boc and the like), methyl vinylbenzoate, and α-methylstyrene.
 一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体の好ましい態様は、少なくとも一般式(i)、(ii)、又は(i)-2で表される単量体と、酸性基を有するモノマー、又は有機色素構造或いは複素環構造を有するモノマーと、を共重合したもので、更に好ましくは、少なくとも前述の一般式(i)-2で表される単量体と、酸基を有するモノマーと、を共重合したものである。
 この態様により、顔料吸着により優れ、且つ、現像性により優れた組成物を与えることができる。
A preferred embodiment of the copolymer containing the structural unit represented by any one of the general formula (1) and the following general formula (2) is represented by at least the general formula (i), (ii), or (i) -2. And a monomer having an acidic group, or a monomer having an organic dye structure or a heterocyclic structure, and more preferably represented by at least the general formula (i) -2. And a monomer having an acid group are copolymerized.
According to this embodiment, it is possible to provide a composition that is excellent in pigment adsorption and excellent in developability.
 本発明においては、(D-3)分散剤として、以下に示すものが特に好ましい。 In the present invention, the following (D-3) dispersants are particularly preferable.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
 -(D-4)主鎖に窒素原子を含むグラフト共重合体-
 本発明の組成物は、(D-4)主鎖に窒素原子を含むグラフト共重合体を有することが好ましい。主鎖に窒素原子を含有するグラフト共重合体としては、式(A)で表される繰り返し単位または/及び式(B)で表される繰り返し単位を有することが好ましい。
Figure JPOXMLDOC01-appb-C000031
-(D-4) Graft copolymer containing nitrogen atom in main chain-
The composition of the present invention preferably has (D-4) a graft copolymer containing a nitrogen atom in the main chain. The graft copolymer containing a nitrogen atom in the main chain preferably has a repeating unit represented by the formula (A) and / or a repeating unit represented by the formula (B).
Figure JPOXMLDOC01-appb-C000031
(式(A)中、R1は炭素数1~5のアルキレン基を表し、Aは水素原子または下記式(C)~(E)のいずれかを表す。) (In the formula (A), R 1 represents an alkylene group having 1 to 5 carbon atoms, and A represents a hydrogen atom or any of the following formulas (C) to (E).)
 上記式(A)中、R1は、メチレン、エチレン、プロピレン等の直鎖状または分岐状の 炭素数1~5のアルキレン基を表し、好ましくは炭素数2~3であり、更に好ましくはエチレン基である。Aは水素原子または下記式(C)~(E)のいずれかを表すが、好ましくは式(C)である。 In the above formula (A), R 1 represents a linear or branched alkylene group having 1 to 5 carbon atoms such as methylene, ethylene or propylene, preferably 2 to 3 carbon atoms, more preferably ethylene. It is a group. A represents a hydrogen atom or any one of the following formulas (C) to (E), preferably formula (C).
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
 上記式(B)中、R1及びAは、式(A)中のR1及びAと同義である。 In said formula (B), R < 1 > and A are synonymous with R < 1 > and A in formula (A).
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 上記式(C)中、W1は炭素数2~10の直鎖状または分岐状のアルキレン基を表し、中でもブチレン、ペンチレン、ヘキシレン等の炭素数4~7のアルキレン基が好ましい。pは1~20の整数を表し、好ましくは5~10の整数である。 In the above formula (C), W 1 represents a linear or branched alkylene group having 2 to 10 carbon atoms, and among them, an alkylene group having 4 to 7 carbon atoms such as butylene, pentylene, hexylene and the like is preferable. p represents an integer of 1 to 20, preferably an integer of 5 to 10.
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
 上記式(D)中、Y1は2価の連結基を表し、中でもエチレン、プロピレン等の炭素数1~4のアルキレン基とエチレンオキシ、プロピレンオキシ等の炭素数1~4のアルキレンオキシ基が好ましい。W2はエチレン、プロピレン、ブチレン等の直鎖状または分岐状の炭素数2~10のアルキレン基を表し、中でもエチレン、プロピレン等の炭素数2~3のアルキレン基が好ましい。Y2は水素原子または-CO-R2(R2はエチル、プロピル、ブチル、ペンチル、ヘキシル等の炭素数1~10のアルキル基を表し、中でもエチル、プロピル、ブチル、ペンチル等の炭素数2~5のアルキル基が好ましい)を表す。qは、1~20の整数を表し、好ましくは5~10の整数である。 In the above formula (D), Y 1 represents a divalent linking group. Among them, an alkylene group having 1 to 4 carbon atoms such as ethylene and propylene and an alkyleneoxy group having 1 to 4 carbon atoms such as ethyleneoxy and propyleneoxy are included. preferable. W 2 represents a linear or branched alkylene group having 2 to 10 carbon atoms such as ethylene, propylene and butylene, and among them, an alkylene group having 2 to 3 carbon atoms such as ethylene and propylene is preferable. Y 2 represents a hydrogen atom or —CO—R 2 (R 2 represents an alkyl group having 1 to 10 carbon atoms such as ethyl, propyl, butyl, pentyl, hexyl, etc .; To 5 alkyl groups are preferred). q represents an integer of 1 to 20, preferably an integer of 5 to 10.
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
 上記式(E)中、W3は炭素数1~50のアルキル基または水酸基を1~5有する炭素数1~50のヒドロキシアルキル基を表し、中でもステアリル等の炭素数10~20のアルキル基、モノヒドロキシステアリル等の水酸基を1~2個有する炭素数10~20のヒドロキシアルキル基が好ましい。
 前記「窒素原子を含有するグラフト共重合体」における式(A)または(B)で表される繰り返し単位の含有率は、高い方が好ましく、通常50モル%以上であり、好ましくは70モル%以上である。式(A)で表される繰り返し単位と、式(B)で表される繰り返し単位の、両方を併有してもよく、その含有比率に特に制限は無いが、式(A)の繰り返し単位の方を多く含有していた方が好ましい。式(A)または式(B)で表される繰り返し単位の合計数は、通常1~100、好ましくは10~70、更に好ましくは20~50である。また、式(A)及び式(B)以外の繰り返し単位を含んでいてもよく、他の繰り返し単位としては、例えばアルキレン基、アルキレンオキシ基などが例示できる。前記「窒素原子を含有するグラフト共重合体」は、その末端が-NH2及び-R1-NH2(R1は、前記R1と同義)のものが好ましい。
In the above formula (E), W 3 represents an alkyl group having 1 to 50 carbon atoms or a hydroxyalkyl group having 1 to 50 carbon atoms having 1 to 5 hydroxyl groups. Among them, an alkyl group having 10 to 20 carbon atoms such as stearyl, A C10-20 hydroxyalkyl group having 1-2 hydroxyl groups such as monohydroxystearyl is preferred.
The content of the repeating unit represented by the formula (A) or (B) in the “graft copolymer containing nitrogen atom” is preferably higher, and is usually 50 mol% or more, preferably 70 mol%. That's it. The repeating unit represented by the formula (A) and the repeating unit represented by the formula (B) may be both present, and the content ratio is not particularly limited, but the repeating unit represented by the formula (A) It is preferable to contain a large amount of. The total number of repeating units represented by the formula (A) or the formula (B) is usually 1 to 100, preferably 10 to 70, more preferably 20 to 50. Moreover, repeating units other than Formula (A) and Formula (B) may be included, and examples of other repeating units include an alkylene group and an alkyleneoxy group. The “graft copolymer containing a nitrogen atom” preferably has —NH 2 and —R 1 —NH 2 (R 1 is as defined above for R 1 ) at the ends.
 尚、前記「窒素原子を含有するグラフト共重合体」は、主鎖が直鎖状であっても分岐していてもよい。該グラフト共重合体のアミン価は、通常5mgKOH/g~100mgKOH/gであり、好ましくは10mgKOH/g~70mgKOH/gであり、更に好ましくは15mgKOH/g~40mgKOH/g以下である。
 アミン価が5mgKOH/g以上であると、分散安定性をより向上させることができ、粘度をより安定にすることができる。アミン価が100mgKOH/g以下であると、残渣をより抑制でき、液晶パネルを形成した後の電気特性の低下をより抑制できる。
The “graft copolymer containing nitrogen atom” may have a main chain which is linear or branched. The amine value of the graft copolymer is usually 5 mgKOH / g to 100 mgKOH / g, preferably 10 mgKOH / g to 70 mgKOH / g, more preferably 15 mgKOH / g to 40 mgKOH / g or less.
When the amine value is 5 mgKOH / g or more, the dispersion stability can be further improved, and the viscosity can be further stabilized. When the amine value is 100 mgKOH / g or less, the residue can be further suppressed, and a decrease in electrical characteristics after the liquid crystal panel is formed can be further suppressed.
 上記「窒素原子を含有するグラフト共重合体」のGPCで測定した重量平均分子量としては、3000~100000が好ましく、5000~50000が特に好ましい。重量平均分子量が3000以上であると、色材の凝集をより抑制でき、高粘度化やゲル化をより抑制できる。100000以下であると、共重合体自体の高粘度化をより抑制でき、また有機溶媒への溶解性の不足をより抑制できる。 The weight average molecular weight of the above “graft copolymer containing nitrogen atom” measured by GPC is preferably from 3000 to 100,000, particularly preferably from 5,000 to 50,000. When the weight average molecular weight is 3000 or more, aggregation of the coloring material can be further suppressed, and higher viscosity and gelation can be further suppressed. When it is 100,000 or less, the viscosity increase of the copolymer itself can be further suppressed, and the lack of solubility in the organic solvent can be further suppressed.
 本発明においては、(D-4)分散剤として、以下に示すものが特に好ましい。
Figure JPOXMLDOC01-appb-C000036
In the present invention, the following (D-4) dispersants are particularly preferable.
Figure JPOXMLDOC01-appb-C000036
 上記(D-4)分散剤の合成方法は、公知の方法が採用でき、例えば特公昭63-30057号公報に記載の方法を用いることができる。 As the method for synthesizing the above (D-4) dispersant, a known method can be adopted, for example, a method described in JP-B-63-30057 can be used.
 本発明で用いる分散剤の分子量は、重量平均分子量(Mw)で2、000~50,000が好ましく、5,000~30,000がより好ましい。
 (C)顔料分散剤の含有量は、全顔料100質量部に対して、10~100質量部であることが好ましく、15~80質量部であることがより好ましい。
 分散剤は、本発明の組成物中に1種のみ含まれていても良いし、2種以上含まれていても良い。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
 また、(A)顔料と(B)顔料について、それぞれ、同じ分散剤を用いても良いし、異なる分散剤を用いても良い。(A)顔料と(B)顔料について、それぞれ、別に分散させてもよいし、共分散させてもよく、好ましくは、(A)顔料と(B)顔料について、別に分散させる態様である。
The molecular weight of the dispersant used in the present invention is preferably 2,000 to 50,000, more preferably 5,000 to 30,000 in terms of weight average molecular weight (Mw).
The content of the (C) pigment dispersant is preferably 10 to 100 parts by mass, more preferably 15 to 80 parts by mass with respect to 100 parts by mass of the total pigment.
Only 1 type of dispersing agent may be contained in the composition of this invention, and may be contained 2 or more types. When two or more types are included, the total amount is preferably within the above range.
Moreover, about (A) pigment and (B) pigment, respectively, the same dispersing agent may be used and a different dispersing agent may be used. The (A) pigment and the (B) pigment may be separately dispersed or co-dispersed. Preferably, the (A) pigment and the (B) pigment are separately dispersed.
<<(E)顔料誘導体>>
 本発明の組成物は、(E)顔料誘導体を有する。(E)顔料誘導体としては、顔料の一部分を、塩基性基で置換した構造を有する化合物であることが好ましい。(E)顔料誘導体を構成するための顔料としては、キノリン系顔料、ベンズイミダゾロン系顔料、イソインドリン系顔料、ジケトピロロピロール系顔料、アゾ系顔料、フタロシアニン系顔料、アントラキノン系顔料、キナクリドン系顔料、ジオキサジン系顔料、ペリノン系顔料、ペリレン系顔料、チオインジゴ系顔料、イソインドリン系顔料、イソインドリノン系顔料、キノフタロン系顔料、スレン系顔料、金属錯体系顔料等が挙げられる。
 (E)顔料誘導体としては、キノリン系、ベンズイミダゾロン系、イソインドリン系の顔料誘導体が好ましく、ベンズイミダゾロン系の顔料誘導体がさらに好ましい。
<< (E) Pigment derivative >>
The composition of the present invention has (E) a pigment derivative. (E) The pigment derivative is preferably a compound having a structure in which a part of the pigment is substituted with a basic group. (E) As pigments for constituting the pigment derivative, quinoline pigments, benzimidazolone pigments, isoindoline pigments, diketopyrrolopyrrole pigments, azo pigments, phthalocyanine pigments, anthraquinone pigments, quinacridone pigments Examples include pigments, dioxazine pigments, perinone pigments, perylene pigments, thioindigo pigments, isoindoline pigments, isoindolinone pigments, quinophthalone pigments, selenium pigments, and metal complex pigments.
(E) The pigment derivative is preferably a quinoline-based, benzimidazolone-based, or isoindoline-based pigment derivative, and more preferably a benzimidazolone-based pigment derivative.
 顔料誘導体が有する塩基性基としては、アミノ基が好ましい。このような化合物として、例えば、以下のような化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000037
As a basic group which a pigment derivative has, an amino group is preferable. Examples of such a compound include the following compounds.
Figure JPOXMLDOC01-appb-C000037
 本発明で用いる(E)顔料誘導体としては、下記一般式(I)で表される顔料誘導体、一般式(II)で表される顔料誘導体、および一般式(III)で表される顔料誘導体の少なくとも1種であることが好ましい。以下、下記一般式(I)で表される顔料誘導体、一般式(II)で表される顔料誘導体、および一般式(III)で表される顔料誘導体について説明する。 Examples of the pigment derivative (E) used in the present invention include a pigment derivative represented by the following general formula (I), a pigment derivative represented by the general formula (II), and a pigment derivative represented by the general formula (III). It is preferable that there is at least one. Hereinafter, the pigment derivative represented by the following general formula (I), the pigment derivative represented by the general formula (II), and the pigment derivative represented by the general formula (III) will be described.
-一般式(I)で表される顔料誘導体-
Figure JPOXMLDOC01-appb-C000038
(一般式(I)中、Dyeはn価の有機色素残基を表し、Xは単結合、-CONH-Y2-、-SO2NH-Y2-または-CH2NHCOCH2NH-Y2-(Y2は置換基を有していても良いアルキレン基またはアリーレン基を表す。)を表し、Y1は-NH-または-O-を表し、Zは、nが1を表す場合は水酸基、アルコキシ基、下記一般式(I-1)で表される基、または-NH-X-Dye(Xは一般式(I)中のXと同義である)を表し、nが2~4の整数を表す場合はそれぞれ水酸基、アルコキシ基、または下記一般式(I-1)で表される基を表し、R1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、R1とR2が互いに結合して窒素原子を含むヘテロ環を形成してもよい。mは1~6の整数を表し、nは1~4の整数を表す。nが2以上の場合、複数のX、Y1、R1、およびR2は、それぞれ、同一であってもよく、異なっていてもよい。)
Figure JPOXMLDOC01-appb-C000039
(一般式(I-1)中、Y3は-NH-または-O-を表す。R1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、R1とR2が互いに結合して窒素原子を含むヘテロ環を形成してもよい。mは1~6の整数を表す)
-Pigment derivatives represented by the general formula (I)-
Figure JPOXMLDOC01-appb-C000038
(In the general formula (I), Dye represents an n-valent organic dye residue, X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 — or —CH 2 NHCOCH 2 NH—Y 2. — (Y 2 represents an optionally substituted alkylene group or arylene group), Y 1 represents —NH— or —O—, and Z represents a hydroxyl group when n represents 1. Represents an alkoxy group, a group represented by the following general formula (I-1), or —NH—X-Dye (where X is as defined for X in the general formula (I)), and n is 2 to 4. In the case of representing an integer, each represents a hydroxyl group, an alkoxy group, or a group represented by the following general formula (I-1), R 1 and R 2 each represents an alkyl group which may have a substituent, optionally R 1 and R 2 are bonded to each other to form a heterocyclic ring containing a nitrogen atom .m is an integer of 1-6, If .n represents an integer of 1 to 4 is 2 or more, plural X, Y 1, R 1, and R 2, respectively, may be the same or may be different.)
Figure JPOXMLDOC01-appb-C000039
(In General Formula (I-1), Y 3 represents —NH— or —O—. R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 May be bonded to each other to form a heterocyclic ring containing a nitrogen atom, and m represents an integer of 1 to 6.
 Dyeはn価の有機色素残基を表す。有機色素残基としては、前記の如く顔料における発色原子団、その類似構造、或いは部分構造が挙げられ、具体的には、アゾ基を有する骨格、ウレア構造を有する骨格、アミド構造を有する骨格、環状アミド構造を有する骨格、ヘテロ原子含有5員環を有する芳香族環、及び、ヘテロ原子含有6員環を有する芳香族環から選択される1種以上の部分構造を含む構造が挙げられ、Dyeはこれらの有機色素残基を含む置換基である。
 Dyeとしては、好ましくは顔料母核構造、又は顔料母核構造と芳香環、或いは含窒素芳香環、或いは含酸素芳香環、或いは含硫黄芳香環を有し、アミノ基は顔料母核構造、芳香環、含窒素芳香環、含酸素芳香環、含硫黄芳香環のいずれかに直接或いは連結基により結合されている。具体的には、キノリン系残基、ベンズイミダゾロン系残基、イソインドリン系残基、ジケトピロロピロール系残基、アゾ系残基、フタロシアニン系残基、アントラキノン系残基、キナクリドン系残基、ジオキサジン系残基、ペリノン系残基、ペリレン系残基、チオインジゴ系残基、イソインドリン系残基、イソインドリノン系残基、キノフタロン系残基、スレン系残基、金属錯体系残基等が挙げられる。
Dye represents an n-valent organic dye residue. Examples of the organic dye residue include a chromogenic group in the pigment as described above, a similar structure, or a partial structure thereof. Specifically, a skeleton having an azo group, a skeleton having a urea structure, a skeleton having an amide structure, Examples include a structure containing one or more partial structures selected from a skeleton having a cyclic amide structure, an aromatic ring having a heteroatom-containing 5-membered ring, and an aromatic ring having a heteroatom-containing 6-membered ring, and Dye Is a substituent containing these organic dye residues.
The dye preferably has a pigment mother nucleus structure, or a pigment mother nucleus structure and an aromatic ring, a nitrogen-containing aromatic ring, an oxygen-containing aromatic ring, or a sulfur-containing aromatic ring, and the amino group has a pigment mother nucleus structure, an aromatic ring It is bonded directly or through a linking group to any of the ring, nitrogen-containing aromatic ring, oxygen-containing aromatic ring and sulfur-containing aromatic ring. Specifically, quinoline residue, benzimidazolone residue, isoindoline residue, diketopyrrolopyrrole residue, azo residue, phthalocyanine residue, anthraquinone residue, quinacridone residue , Dioxazine residue, perinone residue, perylene residue, thioindigo residue, isoindoline residue, isoindolinone residue, quinophthalone residue, selenium residue, metal complex residue, etc. Is mentioned.
 Dyeが表す有機色素残基としては、具体的には、銅フタロシアニン残基、以下の有機色素残基などが挙げられる。式中、*は一般式(I)中のXとの結合部位を表す。
Figure JPOXMLDOC01-appb-C000040
Specific examples of the organic dye residue represented by Dye include a copper phthalocyanine residue and the following organic dye residues. In the formula, * represents a binding site with X in the general formula (I).
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
 これらの中でも、ベンズイミダゾロン骨格を有するモノアゾ色素が好ましい。 Among these, monoazo dyes having a benzimidazolone skeleton are preferable.
 Xは、単結合、-CONH-Y2-、-SO2NH-Y2-または-CH2NHCOCH2NH-Y2-を表し、単結合が好ましい。
 Y2は置換基を有していても良いアルキレン基またはアリーレン基を表す。前記アルキレン基としては、炭素数1~10のアルキレン基が好ましく、炭素数1~6のアルキレン基がより好ましく、炭素数1~3のアルキレン基がさらに好ましい。具体的には、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基などが挙げられる。アルキレン基は、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
 前記アリーレン基としては、炭素数6~20のアリーレン基が好ましく、炭素数6~10のアリーレン基がより好ましい。具体的には、フェニレン基、ナフチレン基、アントラセニレン基などが挙げられる。
 アルキレン基およびアリーレン基は、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 — or —CH 2 NHCOCH 2 NH—Y 2 —, and preferably a single bond.
Y 2 represents an alkylene group or an arylene group which may have a substituent. The alkylene group is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 6 carbon atoms, and still more preferably an alkylene group having 1 to 3 carbon atoms. Specific examples include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, and a hexylene group. The alkylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
The arylene group is preferably an arylene group having 6 to 20 carbon atoms, and more preferably an arylene group having 6 to 10 carbon atoms. Specific examples include a phenylene group, a naphthylene group, and an anthracenylene group.
The alkylene group and the arylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
 Y1は-NH-または-O-を表し、-NH-が好ましい。 Y 1 represents —NH— or —O—, preferably —NH—.
 R1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、R1とR2が互いに結合して窒素原子を含むヘテロ環を形成してもよい。
 前記アルキル基としては、炭素数1~10のアルキル基が好ましく、炭素数1~6のアルキル基がより好ましい。具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ネオペンチル基、n-へキシル基、n-オクチル基等が挙げられる。アルキル基は、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
 R1およびR2は同一の置換基を有していてもよいアルキル基を表すことが好ましい。
R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 may be bonded to each other to form a heterocyclic ring containing a nitrogen atom.
As the alkyl group, an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable. Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group. The alkyl group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
R 1 and R 2 preferably represent an alkyl group which may have the same substituent.
 mは1~6の整数を表し、1~4が好ましく、1~3がより好ましい。
 nは1~4の整数を表し、1~3が好ましく、1または2がより好ましい。
m represents an integer of 1 to 6, preferably 1 to 4, and more preferably 1 to 3.
n represents an integer of 1 to 4, preferably 1 to 3, and more preferably 1 or 2.
 Zは、nが1を表す場合は水酸基、アルコキシ基、下記一般式(I-1)で表される基、または-NH-X-Dye(Xは一般式(I)中のXと同義である)を表し、nが2~4の整数を表す場合はそれぞれ水酸基、アルコキシ基、または下記一般式(I-1)で表される基を表す。
 nが1を表す場合、Zは、下記一般式(I-1)で表される基、または-NH-X-Qが好ましく、下記一般式(I-1)で表される基であることがより好ましい。
 nが2~4の整数を表す場合、Zは、下記一般式(I-1)で表される基であることが好ましい。
Z is a hydroxyl group, an alkoxy group, a group represented by the following general formula (I-1), or —NH—X-Dye (X is the same as X in the general formula (I) when n represents 1. And n represents an integer of 2 to 4, each represents a hydroxyl group, an alkoxy group, or a group represented by the following general formula (I-1).
When n represents 1, Z is preferably a group represented by the following general formula (I-1) or —NH—XQ, preferably a group represented by the following general formula (I-1). Is more preferable.
When n represents an integer of 2 to 4, Z is preferably a group represented by the following general formula (I-1).
一般式(I-1)
Figure JPOXMLDOC01-appb-C000044
(一般式(I-1)中、Y3は-NH-または-O-を表す。R1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、R1とR2が互いに結合して窒素原子を含むヘテロ環を形成してもよい。mは1~6の整数を表す)
Formula (I-1)
Figure JPOXMLDOC01-appb-C000044
(In General Formula (I-1), Y 3 represents —NH— or —O—. R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 May be bonded to each other to form a heterocyclic ring containing a nitrogen atom, and m represents an integer of 1 to 6.
 Y3は-NH-または-O-を表し、-NH-が好ましい。Y3は一般式(I)におけるY1と同一の基を表すことが好ましい。 Y 3 represents —NH— or —O—, preferably —NH—. Y 3 preferably represents the same group as Y 1 in formula (I).
 一般式(I-1)におけるR1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、一般式(I)におけるR1およびR2と同義であり、好ましい範囲も同様である。一般式(I-1)におけるR1およびR2は、同一の置換基を有していてもよいアルキル基を表すことが好ましい。また、一般式(I-1)におけるR1およびR2は、一般式(I)におけるR1およびR2と同一の置換基を有していてもよいアルキル基を表すことが好ましい。 R 1 and R 2 in general formula (I-1) each represents an alkyl group which may have a substituent, and have the same meaning as R 1 and R 2 in general formula (I), and the preferred ranges are also the same It is. In the general formula (I-1), R 1 and R 2 preferably represent an alkyl group which may have the same substituent. Further, R 1 and R 2 in the general formula (I-1) is preferably also have the same substituents as R 1 and R 2 in the general formula (I) represents an alkyl group.
 mは1~6の整数を表し、1~4が好ましく、1~3がより好ましい。mは一般式(I)におけるmと同一の整数を表すことが好ましい。 M represents an integer of 1 to 6, preferably 1 to 4, and more preferably 1 to 3. m preferably represents the same integer as m in formula (I).
 以下、本発明に用いられる顔料誘導体の具体例を示すが、本発明はこれらに限定されるものではない。 Hereinafter, specific examples of the pigment derivative used in the present invention will be shown, but the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057
-一般式(II)で表される顔料誘導体-
一般式(II)
Figure JPOXMLDOC01-appb-C000058
(一般式(II)中、Dyeは置換基を有していてもよいキノフタロン残基を表し、X1は、-NR’SO2-、-SO2NR’-、-CONR’-、-CH2NR’COCH2NR’-、または-NR’CO-を表し、X2は、置換基を有していてもよい炭素数が6~20のアリーレン基、または置換基を有していてもよい炭素数が4~20の複素芳香環基を表し、これらの基は、-NR’-、-O-、-SO2-または-CO-から選ばれる2価の連結基で相互に結合されていてもよい。X3は、-NR’-または-O-を表す。R’は、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。AおよびBは、それぞれ、下記一般式(II-1)で表される基、下記一般式(II-2)で表される基、-O-(CH2n-R8、-OR9、-NR1011、-Cl、-Fおよび-X3-X2-X1-Dyeから選ばれる基を表し、R8は置換されていてもよい含窒素複素環残基を表し、R9、R10、R11は、それぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基または置換基を有していてもよい炭素数が6~20のアリール基を表し、nは0~20の整数を表す。AおよびBのいずれか一方は、下記一般式(II-1)で表される基、下記一般式(II-2)で表される基、-O-(CH2)n-R8、-OR9または-NR1011であり、tは1~3の整数を表す。tが2以上の場合、複数のX1、X2、X3、A、およびBは同一であってもよく、異なっていてもよい。)
Figure JPOXMLDOC01-appb-C000059
(一般式(II-1)中、Y1は-NR’-または-O-を表し、Y2は置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基、または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、これらの基は、-NR’-、-O-、-SO2-、-CO-から選ばれる2価の連結基で相互に結合されていてもよい。R’は、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R1およびR2はそれぞれ、置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す。R1とR2が一体となって、更なる窒素原子、酸素原子または硫黄原子を含み置換されていてもよい複素環構造を形成してもよい。
一般式(II-2)中、Z1はトリアジン環と窒素原子を結ぶ単結合、-NR’-、-NR’-G-CO-、-NR’-G-CONR’’-、-NR’-G-SO2-、-NR’-G-SO2NR’’-、-O-G-CO-、-O-G-CONR’-、-O-G-SO2-または-O-G-SO2NR’-を表し、Gは置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、R’およびR’’は、それぞれ水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R3、R4、R5、およびR6はそれぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表し、R7は置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す。)
-Pigment derivatives represented by general formula (II)-
Formula (II)
Figure JPOXMLDOC01-appb-C000058
(In the general formula (II), Dye represents an optionally substituted quinophthalone residue, and X 1 represents —NR′SO 2 —, —SO 2 NR′—, —CONR′—, —CH 2 NR′COCH 2 NR′— or —NR′CO—, wherein X 2 may have a substituent, an arylene group having 6 to 20 carbon atoms, or a substituent Represents a heteroaromatic group having 4 to 20 carbon atoms, and these groups are bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO—. X 3 represents —NR′— or —O—, and R ′ represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or a substituent. An alkenyl group having 2 to 20 carbon atoms which may be substituted, or an aryl group having 6 to 20 carbon atoms which may have a substituent. It is B, and a group represented by the following general formula (II-1), a group represented by the following general formula (II-2), -O- ( CH 2) n -R 8, -OR 9, - NR 10 R 11 , —Cl, —F and —X 3 —X 2 —X 1 —Dye represent a group, R 8 represents an optionally substituted nitrogen-containing heterocyclic residue, R 9 , R 10 and R 11 are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or Represents an aryl group having 6 to 20 carbon atoms which may have a substituent, and n represents an integer of 0 to 20. One of A and B is represented by the following general formula (II-1). is the group, the group represented by the following general formula (II-2), -O- ( CH 2) n-R 8, is -OR 9 or -NR 10 R 11, t is 1 to 3 If .t represents an integer of 2 or more, a plurality of X 1, X 2, X 3 , A, and B may be the same or different.)
Figure JPOXMLDOC01-appb-C000059
(In General Formula (II-1), Y 1 represents —NR′— or —O—, and Y 2 represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, or a substituent. An alkenylene group having 2 to 20 carbon atoms which may be substituted, or an arylene group having 6 to 20 carbon atoms which may have a substituent, and these groups are represented by —NR′—, —O— , —SO 2 —, and —CO— may be bonded to each other through a divalent linking group, R ′ is a hydrogen atom, and may have a substituent and has 1 to 20 carbon atoms. R 1 and R 2 represent an alkyl group, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. Each of the alkyl groups having 1 to 20 carbon atoms which may have a substituent, or 2 to 2 carbon atoms which may have a substituent. .R 1 and R 2 representing the 0 alkenyl groups together, further nitrogen atom, heterocyclic structure which may be substituted include an oxygen atom or a sulfur atom may be formed.
In general formula (II-2), Z 1 is a single bond connecting the triazine ring and the nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ″ —, —NR ′. —G—SO 2 —, —NR′—G—SO 2 NR ″ —, —O—G—CO—, —O—G—CONR′—, —O—G—SO 2 — or —O—G —SO 2 NR′—, G is an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or a substituent Represents an arylene group having 6 to 20 carbon atoms which may have a group, and R ′ and R ″ each represents a hydrogen atom and an alkyl group having 1 to 20 carbon atoms which may have a substituent. Represents an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent. R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent. an alkenyl group having 1-20 or carbon atoms, which may have a substituent or an aryl group of 6 to 20, alkyl group of R 7 is - 1 carbon atoms, which may have a substituent group 20, Alternatively, it represents an alkenyl group having 2 to 20 carbon atoms which may have a substituent. )
 一般式(II)中、Dyeは、置換基を有していてもよいキノフタロン残基を表す。キノフタロン残基としては、具体的には以下の一般式(II-3)で表される。
一般式(II-3)
Figure JPOXMLDOC01-appb-C000060
(一般式(II-3)中、DおよびEはそれぞれ、水素原子、ハロゲン原子、炭素数1~20のアルキル基、DおよびEが結合したベンゼン環とともに形成し、置換基を有してもよい芳香環基または複素環基、ヒドロキシル基、炭素数1~3のアルコキシル基、カルボキシル基あるいはその塩あるいは炭素数1~20のエステルあるいは炭素数1~20のアミド、スルホン基あるいはその塩、スルファモイル基、-NR’R’’-、ニトロ基から選ばれるいずれかの基を表す。式中、R’およびR’’は、それぞれ、水素原子、置換基を有していてもよく炭素数1~20のアルキル基、置換基を有していてもよい炭素数2~20のアルケニル基または置換基を有していてもよい炭素数6~20のアリール基を表す。pは0~4の整数を表し、qは4-pで算出される整数を表す。*は、一般式(II)におけるX1との結合部位を表す。)
In general formula (II), Dye represents the quinophthalone residue which may have a substituent. The quinophthalone residue is specifically represented by the following general formula (II-3).
Formula (II-3)
Figure JPOXMLDOC01-appb-C000060
(In General Formula (II-3), D and E are each formed with a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, a benzene ring to which D and E are bonded, and having a substituent. Good aromatic or heterocyclic group, hydroxyl group, alkoxy group having 1 to 3 carbon atoms, carboxyl group or salt thereof, ester having 1 to 20 carbon atoms, amide having 1 to 20 carbon atoms, sulfone group or salt thereof, sulfamoyl Represents any group selected from a group, —NR′R ″ —, and a nitro group. In the formula, R ′ and R ″ each have a hydrogen atom or a substituent and each have 1 carbon atom. Represents an alkyl group having ˜20, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent, p is 0 to 4 Represents an integer, q is 4- In an integer calculated. * Represents the binding site to X 1 in the general formula (II).)
 DおよびEはそれぞれ、水素原子、ハロゲン原子、炭素数1~20のアルキル基、DおよびEが結合したベンゼン環とともに形成し、置換基を有してもよい芳香環基または複素環基、ヒドロキシル基、炭素数1~3のアルコキシル基(例えば、メトキシ基、エトキシ基、プロポキシ基)、カルボキシル基あるいはその塩あるいは炭素数1~20のエステルあるいは炭素数1~20のアミド、スルホン基あるいはその塩、スルファモイル基、-NR’R’’-、ニトロ基から選ばれるいずれかの基を表す。R’およびR’’は、それぞれ、水素原子、置換基を有していてもよく炭素数1~20のアルキル基、置換基を有していてもよい炭素数2~20のアルケニル基または置換基を有していてもよい炭素数6~20のアリール基を表す。
 炭素数1~20のアルキル基としては、炭素数1~10のアルキル基が好ましく、炭素数1~6のアルキル基がより好ましい。具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ネオペンチル基、n-へキシル基、n-オクチル基等が挙げられる。
 芳香環基または複素環基としては、例えば、フェニル基、ナフチル基、チオフェン環基、ピリジン環基、ピロール環基などが挙げられる。
 DおよびEが表わす芳香環基または複素環基、R’およびR’’が表わす炭素数1~20のアルキル基、炭素数2~20のアルケニル基、および炭素数6~20のアリール基は、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
 これらの中でも、DおよびEは、水素原子、ハロゲン原子であることが好ましい。
D and E are each a hydrogen atom, a halogen atom, an alkyl group having 1 to 20 carbon atoms, a benzene ring to which D and E are bonded, an aromatic or heterocyclic group which may have a substituent, hydroxyl group Groups, alkoxy groups having 1 to 3 carbon atoms (for example, methoxy group, ethoxy group, propoxy group), carboxyl groups or salts thereof, esters having 1 to 20 carbon atoms, amides having 1 to 20 carbon atoms, sulfone groups or salts thereof , A sulfamoyl group, —NR′R ″ —, and a nitro group. R ′ and R ″ are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or a substituted group. An aryl group having 6 to 20 carbon atoms which may have a group.
As the alkyl group having 1 to 20 carbon atoms, an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable. Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
Examples of the aromatic ring group or the heterocyclic group include a phenyl group, a naphthyl group, a thiophene ring group, a pyridine ring group, and a pyrrole ring group.
The aromatic or heterocyclic group represented by D and E, the alkyl group having 1 to 20 carbon atoms, the alkenyl group having 2 to 20 carbon atoms and the aryl group having 6 to 20 carbon atoms represented by R ′ and R ″ are: It may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
Among these, it is preferable that D and E are a hydrogen atom and a halogen atom.
 pは、0~4の整数を表し、1~4の整数がより好ましく、4がさらに好ましい。qは、4-pで算出される整数を表し、具体的には、0~3の整数が好ましく、2~3がより好ましく、4がさらに好ましい。 P represents an integer of 0 to 4, more preferably an integer of 1 to 4, and still more preferably 4. q represents an integer calculated by 4-p, specifically, preferably an integer of 0 to 3, more preferably 2 to 3, and still more preferably 4.
 一般式(II)におけるX1との結合部位としては、特に制限はないが、キノフタロン残基中のキノリン骨格の5位または8位が結合部位であることが好ましく8位が結合部位であることがより好ましい。 The binding site with X 1 in the general formula (II) is not particularly limited, but the 5th or 8th position of the quinoline skeleton in the quinophthalone residue is preferably a binding site, and the 8th position is a binding site. Is more preferable.
 一般式(II)中、X1は、-NR’SO2-、-SO2NR’-、-CONR’-、-CH2NR’COCH2NR’-、または-NR’CO-を表し、-NR’SO2-が好ましい。なお、tが2以上の場合、複数のX1は同一であってもよく、異なっていてもよい。 In formula (II), X 1 is, -NR'SO 2 -, - SO 2 NR '-, - CONR' -, - CH 2 NR'COCH 2 NR'-, or -NR'CO- represent, —NR′SO 2 — is preferred. When t is 2 or more, the plurality of X 1 may be the same or different.
 上記X1中のR’は、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表し、水素原子が好ましい。
 前記炭素数が1~20のアルキル基としては、炭素数1~10のアルキル基が好ましく、炭素数1~6のアルキル基がより好ましい。具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ネオペンチル基、n-へキシル基、n-オクチル基等が挙げられる。
 前記炭素数2~20のアルケニル基としては、炭素数2~10のアルケニル基が好ましく、炭素数2~6のアルケニル基がより好ましい。具体的には、エテニル基、プロペニル基、ブテニル基、ペンテニル基、ヘキセニル基などが挙げられる。
 前記炭素数6~20のアリール基としては、炭素数6~10のアリール基が好ましく、具体的には、フェニル基、ナフチル基、アントラセニル基などが挙げられる。
 これらは、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
R ′ in X 1 is a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, Alternatively, it represents an aryl group having 6 to 20 carbon atoms which may have a substituent, and a hydrogen atom is preferable.
The alkyl group having 1 to 20 carbon atoms is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms. Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
The alkenyl group having 2 to 20 carbon atoms is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 6 carbon atoms. Specific examples include an ethenyl group, a propenyl group, a butenyl group, a pentenyl group, and a hexenyl group.
The aryl group having 6 to 20 carbon atoms is preferably an aryl group having 6 to 10 carbon atoms, and specific examples include a phenyl group, a naphthyl group, and an anthracenyl group.
These may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
 一般式(II)中、X2は、置換基を有していてもよい炭素数が6~20のアリーレン基、または置換基を有していてもよい炭素数が4~20の複素芳香環基を表し、これらの基は、-NR’-、-O-、-SO2-または-CO-から選ばれる2価の連結基で相互に結合されていてもよい(R’は上記X1中のR’と同義であり、好ましい範囲も同様である。)。なお、tが2以上の場合、複数のX2は同一であってもよく、異なっていてもよい。
 炭素数6~20のアリーレン基は、炭素数6~10のアリーレン基が好ましく、具体的には、フェニレン基、ナフチレン基、アントラセニレン基などが挙げられる。
 炭素数4~20の複素芳香環基は、炭素数4~10の複素芳香環基が好ましく、具体的には、チオフェン環基、ピリジン環基、ピロール環基などが挙げられる。
 これらは、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
In general formula (II), X 2 is an arylene group having 6 to 20 carbon atoms which may have a substituent, or a heteroaromatic ring having 4 to 20 carbon atoms which may have a substituent. And these groups may be bonded to each other by a divalent linking group selected from —NR′—, —O—, —SO 2 — or —CO— (R ′ represents the above X 1). It is synonymous with R ′ in the middle, and the preferred range is also the same. When t is 2 or more, the plurality of X 2 may be the same or different.
The arylene group having 6 to 20 carbon atoms is preferably an arylene group having 6 to 10 carbon atoms, and specific examples thereof include a phenylene group, a naphthylene group, and an anthracenylene group.
The heteroaromatic group having 4 to 20 carbon atoms is preferably a heteroaromatic group having 4 to 10 carbon atoms, and specific examples include a thiophene ring group, a pyridine ring group, and a pyrrole ring group.
These may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
 X3は、-NR’-または-O-を表し、-NR’-が好ましい。なお、tが2以上の場合、複数のX3は同一であってもよく、異なっていてもよい。R’は上記R’と同義であり、好ましい範囲も同様である。 X 3 represents —NR′— or —O—, preferably —NR′—. When t is 2 or more, the plurality of X 3 may be the same or different. R ′ has the same meaning as R ′ above, and the preferred range is also the same.
 AおよびBは、それぞれ、下記一般式(II-1)もしくは下記一般式(II-2)で表される基、-O-(CH2n-R8、-OR9、-NR1011、-Cl、-Fまたは-X3-X2-X1-Dyeから選ばれる基を表し、AおよびBのいずれか一方は、下記一般式(II-1)もしくは(II-2)で表される基、-O-(CH2)n-R8、-OR9、または-NR1011である。中でも、AおよびBは、ともに下記一般式(II-1)または下記一般式(II-2)で表される基が好ましく、AおよびBは下記一般式(II-1)または下記一般式(II-2)で表される基であり、かつAおよびBが同一の基であることがより好ましい。 A and B are groups represented by the following general formula (II-1) or (II-2), —O— (CH 2 ) n —R 8 , —OR 9 , —NR 10 R, respectively. 11 represents a group selected from —Cl, —F or —X 3 —X 2 —X 1 —Dye, and one of A and B is represented by the following general formula (II-1) or (II-2): Or a group represented by —O— (CH 2 ) n —R 8 , —OR 9 , or —NR 10 R 11 . Among them, A and B are preferably groups represented by the following general formula (II-1) or the following general formula (II-2), and A and B are represented by the following general formula (II-1) or the following general formula ( More preferably, it is a group represented by II-2), and A and B are the same group.
 R8は置換されていてもよい含窒素複素環残基を表し、具体的には、ピロール環残基、ピリジン環残基などが挙げられる。
 R9、R10、R11は、それぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R9、R10、R11は、上記R’と同義であり、好ましい範囲も同様である。
R 8 represents an optionally substituted nitrogen-containing heterocyclic residue, and specific examples thereof include a pyrrole ring residue and a pyridine ring residue.
R 9 , R 10 and R 11 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkyl group having 2 to 20 carbon atoms which may have a substituent. It represents an alkenyl group or an aryl group having 6 to 20 carbon atoms which may have a substituent. R 9 , R 10 and R 11 have the same meaning as R ′ described above, and the preferred ranges are also the same.
一般式(II-1)
Figure JPOXMLDOC01-appb-C000061
(一般式(II-1)中、Y1は-NR’-または-O-を表し、Y2は置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基、または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、これらの基は、-NR’-、-O-、-SO2-、-CO-から選ばれる2価の連結基で相互に結合されていてもよい。R’は、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R1、R2はそれぞれ、置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す(R1とR2が一体となって、更なる窒素原子、酸素原子または硫黄原子を含み置換されていてもよい複素環構造を形成してもよい。)
Formula (II-1)
Figure JPOXMLDOC01-appb-C000061
(In General Formula (II-1), Y 1 represents —NR′— or —O—, and Y 2 represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, or a substituent. An alkenylene group having 2 to 20 carbon atoms which may be substituted, or an arylene group having 6 to 20 carbon atoms which may have a substituent, and these groups are represented by —NR′—, —O— , —SO 2 —, and —CO— may be bonded to each other through a divalent linking group, R ′ is a hydrogen atom, and may have a substituent and has 1 to 20 carbon atoms. R 1 and R 2 each represents an alkyl group, an optionally substituted alkenyl group having 2 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. In each case, the alkyl group having 1 to 20 carbon atoms which may have a substituent, or 2 to 20 carbon atoms which may have a substituent. An alkenyl group (R 1 and R 2 together form a further nitrogen atom, heterocyclic structure which may be substituted include an oxygen atom or a sulfur atom may be formed.)
 Y1は-NR’-または-O-を表し、-NR’-が好ましい。R’は上記R’と同義であり、好ましい範囲も同様である。 Y 1 represents —NR′— or —O—, preferably —NR′—. R ′ has the same meaning as R ′ above, and the preferred range is also the same.
 Y2は置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基、または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、これらの基は、-NR’-、-O-、-SO2-、-CO-から選ばれる2価の連結基で相互に結合されていてもよい(R’は上記R’と同義であり、好ましい範囲も同様である。)。
 前記炭素数が1~20のアルキレン基としては、炭素数1~10のアルキレン基が好ましく、炭素数1~6のアルキレン基がより好ましく、炭素数1~3のアルキレン基がさらに好ましい。具体的には、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基などが挙げられる。アルキレン基は、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
 前記炭素数が2~20のアルケニレン基としては、炭素数1~10のアルケニレン基が好ましく、炭素数1~6のアルケニレン基がより好ましく、炭素数1~3のアルケニレン基がさらに好ましい。具体的には、エテニレン基、プロぺニレン基、ブテニレン基、ペンテニレン基、ヘキセニレン基などが挙げられる。アルケニレン基は、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
 前記炭素数が6~20のアリーレン基としては、炭素数6~20のアリーレン基が好ましく、炭素数6~10のアリーレン基がより好ましい。具体的には、フェニレン基、ナフチレン基、アントラセニレン基などが挙げられる。アリーレン基は、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。
Y 2 may have an optionally substituted alkylene group having 1 to 20 carbon atoms, an optionally substituted alkenylene group having 2 to 20 carbon atoms, or an optionally substituted group. And an arylene group having 6 to 20 carbon atoms, and these groups are bonded to each other through a divalent linking group selected from —NR′—, —O—, —SO 2 —, and —CO—. (R ′ has the same meaning as R ′ above, and the preferred range is also the same).
The alkylene group having 1 to 20 carbon atoms is preferably an alkylene group having 1 to 10 carbon atoms, more preferably an alkylene group having 1 to 6 carbon atoms, and further preferably an alkylene group having 1 to 3 carbon atoms. Specific examples include a methylene group, an ethylene group, a propylene group, a butylene group, a pentylene group, and a hexylene group. The alkylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
The alkenylene group having 2 to 20 carbon atoms is preferably an alkenylene group having 1 to 10 carbon atoms, more preferably an alkenylene group having 1 to 6 carbon atoms, and further preferably an alkenylene group having 1 to 3 carbon atoms. Specific examples include an ethenylene group, a propenylene group, a butenylene group, a pentenylene group, and a hexenylene group. The alkenylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
The arylene group having 6 to 20 carbon atoms is preferably an arylene group having 6 to 20 carbon atoms, and more preferably an arylene group having 6 to 10 carbon atoms. Specific examples include a phenylene group, a naphthylene group, and an anthracenylene group. The arylene group may have a substituent, and examples of the substituent include the groups described in the section of the substituent.
 R1、R2はそれぞれ、置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す(R1とR2が一体となって、更なる窒素原子、酸素原子または硫黄原子を含み置換されていてもよい複素環構造を形成してもよい。
 前記炭素数が1~20のアルキル基としては、炭素数1~10のアルキル基が好ましく、炭素数1~6のアルキル基がより好ましい。具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ネオペンチル基、n-へキシル基、n-オクチル基等が挙げられる。
 前記炭素数2~20のアルケニル基としては、炭素数2~10のアルケニル基が好ましく、炭素数2~6のアルケニル基がより好ましい。具体的には、エテニル基、プロペニル基、ブテニル基、ペンテニル基、ヘキセニル基などが挙げられる。
 これらの基は、置換基を有していてもよく、置換基としては、前記置換基の項で述べた基が挙げられる。R1、R2は、同一の基を表すことが好ましい。
R 1 and R 2 each represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent (R 1 and R 2 may be combined to form an optionally substituted heterocyclic structure containing a nitrogen, oxygen or sulfur atom.
The alkyl group having 1 to 20 carbon atoms is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms. Specific examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tert-butyl group, a neopentyl group, an n-hexyl group, and an n-octyl group.
The alkenyl group having 2 to 20 carbon atoms is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 6 carbon atoms. Specific examples include an ethenyl group, a propenyl group, a butenyl group, a pentenyl group, and a hexenyl group.
These groups may have a substituent, and examples of the substituent include the groups described in the section of the substituent. R 1 and R 2 preferably represent the same group.
一般式(II-2)
Figure JPOXMLDOC01-appb-C000062
(一般式(II-2)中、Z1はトリアジン環と窒素原子を結ぶ単結合、-NR’-、-NR’-G-CO-、-NR’-G-CONR’’-、-NR’-G-SO2-、-NR’-G-SO2NR’’-、-O-G-CO-、-O-G-CONR’-、-O-G-SO2-または-O-G-SO2NR’-を表し、Gは置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、R’およびR’’は、それぞれ水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R3、R4、R5、およびR6はそれぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表し、R7は置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す。)
Formula (II-2)
Figure JPOXMLDOC01-appb-C000062
(In the general formula (II-2), Z 1 is a single bond connecting a triazine ring and a nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ″ —, —NR '-G-SO 2- , -NR'-G-SO 2 NR''-, -O-G-CO-, -O-G-CONR'-, -O-G-SO 2 -or -O- G—SO 2 NR′—, wherein G is an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or Represents an arylene group having 6 to 20 carbon atoms which may have a substituent, and R ′ and R ″ each represent a hydrogen atom and an alkyl having 1 to 20 carbon atoms which may have a substituent. R 3 represents an optionally substituted alkenyl group having 2 to 20 carbon atoms or an optionally substituted aryl group having 6 to 20 carbon atoms R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 to 20 carbon atoms that may have a substituent. Or an aryl group having 6 to 20 carbon atoms which may have a substituent, and R 7 represents an alkyl group having 1 to 20 carbon atoms which may have a substituent or a substituted group. Represents an alkenyl group having 2 to 20 carbon atoms which may have a group.)
 Z1はトリアジン環と窒素原子を結ぶ単結合、-NR’-、-NR’-G-CO-、NR’-G-CONR’’-、-NR’-G-SO2-、-NR’-G-SO2NR’’-、-O-G-CO-、-O-G-CONR’-、-O-G-SO2-または-O-G-SO2NR’-を表し、単結合が好ましい。
 R’およびR’’は、それぞれ水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R’およびR’’は、一般式(II-1)中のR’と同義であり、好ましい範囲も同様である。
 Gは置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基または置換基を有していてもよい炭素数が6~20のアリーレン基を表す。Gは、一般式(II-1)におけるY2と同義であり、好ましい範囲も同様である。
Z 1 is a single bond connecting a triazine ring and a nitrogen atom, —NR′—, —NR′—G—CO—, NR′—G—CONR ″ —, —NR′—G—SO 2 —, —NR ′ -G-SO 2 NR '' - , - O-G-CO -, - O-G-CONR '-, - O-G-SO 2 - or -O-G-SO 2 NR'- represent single Bonding is preferred.
R ′ and R ″ are each a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted alkenyl group having 2 to 20 carbon atoms, Alternatively, it represents an aryl group having 6 to 20 carbon atoms which may have a substituent. R ′ and R ″ have the same meaning as R ′ in formula (II-1), and the preferred range is also the same.
G represents an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or an optionally substituted carbon. It represents an arylene group having a number of 6 to 20. G has the same meaning as Y 2 in formula (II-1), and the preferred range is also the same.
 R3、R4、R5、およびR6はそれぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。R3、R4、R5、およびR6は、一般式(II-1)中のR’と同義であり、好ましい範囲も同様である。 R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent. Represents an alkenyl group having ˜20 or an aryl group having 6 to 20 carbon atoms which may have a substituent. R 3 , R 4 , R 5 , and R 6 have the same meanings as R ′ in formula (II-1), and the preferred ranges are also the same.
 R7は置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す。R7は、一般式(II-1)中のR1と同義であり、好ましい範囲も同様である。 R 7 represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent. R 7 has the same meaning as R 1 in formula (II-1), and the preferred range is also the same.
 一般式(II)におけるtは、1~3の整数を表し、1または2が好ましく、1がより好ましい。 T in the general formula (II) represents an integer of 1 to 3, preferably 1 or 2, and more preferably 1.
 以下、本発明に用いられる一般式(II)で表される顔料誘導体の具体例を示すが、本発明はこれらに限定されるものではない。 Hereinafter, specific examples of the pigment derivative represented by the general formula (II) used in the present invention are shown, but the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000064
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000067
Figure JPOXMLDOC01-appb-C000067
-一般式(III)で表される顔料誘導体-
Figure JPOXMLDOC01-appb-C000068
-Pigment derivatives represented by the general formula (III)-
Figure JPOXMLDOC01-appb-C000068
 一般式(III)中、Aは、X-Yとともにアゾ顔料を形成しうる成分を表す。前記Aは、ジアゾニウム化合物とカップリングしてアゾ顔料を形成しうる化合物であれば、任意に選択することができる。以下に、前記Aの具体例を示すが、本発明はこれらの具体例に何ら限定されるものではない。 In general formula (III), A represents a component capable of forming an azo pigment together with XY. A can be arbitrarily selected as long as it is a compound capable of forming an azo pigment by coupling with a diazonium compound. Specific examples of A will be shown below, but the present invention is not limited to these specific examples.
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-C000070
Figure JPOXMLDOC01-appb-C000070
 前記一般式(III)中、Xは、単結合(Yが-N=N-に直結していることを意味する。)、又は下記群A中の二価の連結基から選択される基を表す。 In the general formula (III), X represents a single bond (meaning that Y is directly connected to —N═N—) or a group selected from divalent linking groups in the following group A. To express.
Figure JPOXMLDOC01-appb-C000071
Figure JPOXMLDOC01-appb-C000071
 前記一般式(III)中、Yは、下記一般式(III-2)で表される基を表す。 In the general formula (III), Y represents a group represented by the following general formula (III-2).
Figure JPOXMLDOC01-appb-C000072
Figure JPOXMLDOC01-appb-C000072
 一般式(III-2)中、Zは、炭素数1~5のアルキレン基を表し、好ましくは炭素数2~3のアルキレン基を表す。R2は、炭素数1~4のアルキル基、または窒素原子を含む5または6員飽和ヘテロ環を表す。R2が、窒素原子を含む5または6員飽和ヘテロ環を表す場合、下記構造式で表されるヘテロ環が好ましい。 In the general formula (III-2), Z represents an alkylene group having 1 to 5 carbon atoms, preferably an alkylene group having 2 to 3 carbon atoms. R 2 represents an alkyl group having 1 to 4 carbon atoms or a 5- or 6-membered saturated heterocyclic ring containing a nitrogen atom. When R 2 represents a 5- or 6-membered saturated heterocyclic ring containing a nitrogen atom, a heterocyclic ring represented by the following structural formula is preferable.
Figure JPOXMLDOC01-appb-C000073
Figure JPOXMLDOC01-appb-C000073
 前記一般式(III-2)における、Z及び-NR2は、それぞれ、低級アルキル基、アルコキシ基を置換基として有していてもよい。前記一般式(III-2)中、aは、1又は2を表し、好ましくは2を表す。 In the general formula (III-2), Z and —NR 2 may each have a lower alkyl group or an alkoxy group as a substituent. In the general formula (III-2), a represents 1 or 2, preferably 2.
以下に、前記一般式(III)で表される化合物の具体例(具体例1~22)を示すが、本発明はこれらの具体例に何ら限定されるものではない。 Specific examples (specific examples 1 to 22) of the compound represented by the general formula (III) are shown below, but the present invention is not limited to these specific examples.
Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000074
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000075
Figure JPOXMLDOC01-appb-C000076
Figure JPOXMLDOC01-appb-C000076
Figure JPOXMLDOC01-appb-C000077
Figure JPOXMLDOC01-appb-C000077
Figure JPOXMLDOC01-appb-C000078
Figure JPOXMLDOC01-appb-C000078
 本発明における(E)顔料誘導体の含有量としては、全顔料100質量部に対して、0.5質量部以上50質量部以下であることが好ましく、1質量部以上25質量部以下であることがより好ましい。
 顔料誘導体は、本発明の組成物中に1種のみ含まれていても良いし、2種以上含まれていても良い。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
 また、(A)顔料と(B)顔料について、それぞれ、同じ顔料誘導体を用いても良いし、異なる顔料誘導体を用いても良い。また、(A)顔料と(B)顔料の両方に顔料誘導体を用いても良いし、一方のみに用いても良い。本発明の組成物では、(A)顔料と(B)顔料に用いられる顔料誘導体の80質量%以上が共通することが好ましい。このような構成とすることにより、組成物の粘度の増加を抑制し、かつ、相溶性が良くなり、発明の効果がより効果的に発揮される。
As content of (E) pigment derivative in this invention, it is preferable that they are 0.5 mass part or more and 50 mass parts or less with respect to 100 mass parts of all the pigments, and it is 1 mass part or more and 25 mass parts or less. Is more preferable.
Only one pigment derivative may be contained in the composition of the present invention, or two or more pigment derivatives may be contained therein. When two or more types are included, the total amount is preferably within the above range.
Moreover, about the (A) pigment and the (B) pigment, the same pigment derivative may be used, respectively, and a different pigment derivative may be used. Moreover, a pigment derivative may be used for both the (A) pigment and the (B) pigment, or only one of them may be used. In the composition of this invention, it is preferable that 80 mass% or more of the pigment derivative used for (A) pigment and (B) pigment is common. By setting it as such a structure, the increase in the viscosity of a composition is suppressed and compatibility becomes good and the effect of invention is exhibited more effectively.
<<他の成分>>
 本発明の組成物は、上述の各成分に加えて、本発明の効果を損なわない範囲で、さらに、(F)光重合開始剤、(G)重合性化合物、(H)側鎖に重合性二重結合を有する樹脂、有機溶剤、架橋剤などの他の成分を含んでいてもよい。
<< other ingredients >>
In addition to the components described above, the composition of the present invention is further in the range that does not impair the effects of the present invention, and further (F) a photopolymerization initiator, (G) a polymerizable compound, and (H) polymerizable to a side chain. Other components such as a resin having a double bond, an organic solvent, and a crosslinking agent may be included.
<<(F)光重合開始剤>>
 本発明の組成物は、さらなる感度向上の観点から光重合開始剤を含有してもよい。
 前記光重合開始剤としては、後述する重合性化合物の重合を開始する能力を有する限り、特に制限はなく、公知の光重合開始剤の中から適宜選択することができる。例えば、紫外線領域から可視の光線に対して感光性を有するものが好ましい。また、光励起された増感剤と何らかの作用を生じ、活性ラジカルを生成する活性剤であってもよく、モノマーの種類に応じてカチオン重合を開始させるような開始剤であってもよい。
 また、前記光重合開始剤は、約300~800nm(330~500nmがより好ましい。)の範囲内に少なくとも約50の分子吸光係数を有する化合物を、少なくとも1種含有していることが好ましい。
<< (F) Photopolymerization initiator >>
The composition of this invention may contain a photoinitiator from a viewpoint of the further sensitivity improvement.
The photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of the polymerizable compound described later, and can be appropriately selected from known photopolymerization initiators. For example, those having photosensitivity to visible light from the ultraviolet region are preferable. Further, it may be an activator that generates some action with a photoexcited sensitizer and generates an active radical, or may be an initiator that initiates cationic polymerization according to the type of monomer.
The photopolymerization initiator preferably contains at least one compound having a molecular extinction coefficient of at least about 50 within a range of about 300 to 800 nm (more preferably 330 to 500 nm).
 前記光重合開始剤としては、例えば、ハロゲン化炭化水素誘導体(例えば、トリアジン骨格を有するもの、オキサジアゾール骨格を有するもの、など)、アシルホスフィンオキサイド等のアシルホスフィン化合物、ヘキサアリールビイミダゾール、オキシム誘導体等のオキシム化合物(オキシム系重合開始剤)、有機過酸化物、チオ化合物、ケトン化合物、芳香族オニウム塩、ケトオキシムエーテル、アミノアセトフェノン化合物、ヒドロキシアセトフェノンなどが挙げられる。 Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.), acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime. Examples include oxime compounds (oxime polymerization initiators) such as derivatives, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, and hydroxyacetophenones.
 また、露光感度の観点から、トリハロメチルトリアジン化合物、ベンジルジメチルケタール化合物、α-ヒドロキシケトン化合物、α-アミノケトン化合物、アシルホスフィン化合物、フォスフィンオキサイド化合物、メタロセン化合物、オキシム化合物、トリアリルイミダゾールダイマー、オニウム化合物、ベンゾチアゾール化合物、ベンゾフェノン化合物、アセトフェノン化合物およびその誘導体、シクロペンタジエン-ベンゼン-鉄錯体およびその塩、ハロメチルオキサジアゾール化合物、3-アリール置換クマリン化合物からなる群より選択される化合物が好ましい。 From the viewpoint of exposure sensitivity, trihalomethyltriazine compounds, benzyldimethylketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triallylimidazole dimers, oniums Compounds selected from the group consisting of compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds and derivatives thereof, cyclopentadiene-benzene-iron complexes and salts thereof, halomethyloxadiazole compounds, and 3-aryl substituted coumarin compounds are preferred.
 さらに好ましくは、トリハロメチルトリアジン化合物、α-アミノケトン化合物、アシルホスフィン化合物、フォスフィンオキサイド化合物、オキシム化合物、トリアリルイミダゾールダイマー、トリアリールイミダゾール化合物、ベンゾイミダゾール化合物、オニウム化合物、ベンゾフェノン化合物、アセトフェノン化合物であり、トリハロメチルトリアジン化合物、α-アミノケトン化合物、オキシム化合物、トリアリールイミダゾール化合物、ベンゾフェノン化合物、トリアリールイミダゾール化合物、ベンゾイミダゾール化合物からなる群より選ばれる少なくとも一種の化合物が特に好ましい。また、トリアリールイミダゾール化合物は、ベンゾイミダゾールとの混合物であってもよい。
 具体的には、トリハロメチルトリアジン化合物としては、以下の化合物が例示される。なお、Phはフェニル基である。
Figure JPOXMLDOC01-appb-C000079
 トリアリールイミダゾール化合物、ベンゾイミダゾール化合物としては、以下の化合物が例示される。
Figure JPOXMLDOC01-appb-C000080
More preferred are trihalomethyltriazine compounds, α-aminoketone compounds, acylphosphine compounds, phosphine oxide compounds, oxime compounds, triallylimidazole dimers, triarylimidazole compounds, benzimidazole compounds, onium compounds, benzophenone compounds, and acetophenone compounds. At least one compound selected from the group consisting of a trihalomethyltriazine compound, an α-aminoketone compound, an oxime compound, a triarylimidazole compound, a benzophenone compound, a triarylimidazole compound, and a benzimidazole compound is particularly preferable. The triarylimidazole compound may be a mixture with benzimidazole.
Specifically, examples of the trihalomethyltriazine compound include the following compounds. Note that Ph is a phenyl group.
Figure JPOXMLDOC01-appb-C000079
Examples of the triarylimidazole compound and the benzimidazole compound include the following compounds.
Figure JPOXMLDOC01-appb-C000080
 トリハロメチルトリアジン化合物としては、市販品も使用でき、例えば、TAZ-107(みどり化学社製)を用いることもできる。
 特に、本発明の組成物を固体撮像素子が備えるカラーフィルタの作製に使用する場合には、微細なパターンをシャープな形状で形成する必要があるために、硬化性とともに未露光部に残渣がなく現像されることが重要である。このような観点からは、重合開始剤としてはオキシム化合物を使用することが特に好ましい。特に、固体撮像素子において微細なパターンを形成する場合、硬化用露光にステッパー露光機を用いるが、この露光機はハロゲンにより損傷される場合があり、重合開始剤の添加量も低く抑える必要があるため、これらの点を考慮すれば、固体撮像素子の如き微細パターンを形成するには(F)光重合開始剤としては、オキシム化合物を用いるのが最も好ましい。
A commercially available product can be used as the trihalomethyltriazine compound, for example, TAZ-107 (manufactured by Midori Chemical Co., Ltd.) can also be used.
In particular, when the composition of the present invention is used for the production of a color filter included in a solid-state imaging device, it is necessary to form a fine pattern with a sharp shape. It is important that it be developed. From such a viewpoint, it is particularly preferable to use an oxime compound as the polymerization initiator. In particular, when forming a fine pattern in a solid-state imaging device, a stepper exposure machine is used for exposure for curing. However, this exposure machine may be damaged by halogen, and the addition amount of the polymerization initiator needs to be kept low. Therefore, in view of these points, it is most preferable to use an oxime compound as the photopolymerization initiator (F) in order to form a fine pattern such as a solid-state imaging device.
 前記トリアジン骨格を有するハロゲン化炭化水素化合物としては、例えば、若林ら著、Bull.Chem.Soc.Japan,42、2924(1969)記載の化合物、英国特許第1388492号明細書記載の化合物、特開昭53-133428号公報記載の化合物、独国特許第3337024号明細書記載の化合物、F.C.SchaeferなどによるJ.Org.Chem.;29、1527(1964)記載の化合物、特開昭62-58241号公報記載の化合物、特開平5-281728号公報記載の化合物、特開平5-34920号公報記載化合物、米国特許第4212976号明細書に記載されている化合物、などが挙げられる。 Examples of the halogenated hydrocarbon compound having a triazine skeleton include those described in Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), a compound described in British Patent No. 1388492, a compound described in JP-A-53-133428, a compound described in German Patent No. 3333724, F.I. C. J. Schaefer et al. Org. Chem. 29, 1527 (1964), compound described in JP-A-62-258241, compound described in JP-A-5-281728, compound described in JP-A-5-34920, US Pat. No. 4,221,976 And the compounds described in the book.
 前記米国特許第4212976号明細書に記載されている化合物としては、例えば、オキサジアゾール骨格を有する化合物(例えば、2-トリクロロメチル-5-フェニル-1,3,4-オキサジアゾール、2-トリクロロメチル-5-(4-クロロフェニル)-1,3,4-オキサジアゾール、2-トリクロロメチル-5-(1-ナフチル)-1,3,4-オキサジアゾール、2-トリクロロメチル-5-(2-ナフチル)-1,3,4-オキサジアゾール、2-トリブロモメチル-5-フェニル-1,3,4-オキサジアゾール、2-トリブロモメチル-5-(2-ナフチル)-1,3,4-オキサジアゾール;2-トリクロロメチル-5-スチリル-1,3,4-オキサジアゾール、2-トリクロロメチル-5-(4-クロロスチリル)-1,3,4-オキサジアゾール、2-トリクロロメチル-5-(4-メトキシスチリル)-1,3,4-オキサジアゾール、2-トリクロロメチル-5-(1-ナフチル)-1,3,4-オキサジアゾール、2-トリクロロメチル-5-(4-n-ブトキシスチリル)-1,3,4-オキサジアゾール、2-トリブロモメチル-5-スチリル-1,3,4-オキサジアゾールなど)などが挙げられる。 Examples of the compound described in US Pat. No. 4,221,976 include compounds having an oxadiazole skeleton (for example, 2-trichloromethyl-5-phenyl-1,3,4-oxadiazole, 2- Trichloromethyl-5- (4-chlorophenyl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1,3,4-oxadiazole, 2-trichloromethyl-5 -(2-naphthyl) -1,3,4-oxadiazole, 2-tribromomethyl-5-phenyl-1,3,4-oxadiazole, 2-tribromomethyl-5- (2-naphthyl) -1,3,4-oxadiazole; 2-trichloromethyl-5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (4-chlorostyryl) ) -1,3,4-oxadiazole, 2-trichloromethyl-5- (4-methoxystyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (1-naphthyl) -1 , 3,4-oxadiazole, 2-trichloromethyl-5- (4-n-butoxystyryl) -1,3,4-oxadiazole, 2-tribromomethyl-5-styryl-1,3,4 -Oxadiazole and the like).
 また、上記以外の光重合開始剤として、アクリジン誘導体(例えば、9-フェニルアクリジン、1,7-ビス(9,9’-アクリジニル)ヘプタンなど)、N-フェニルグリシンなど、ポリハロゲン化合物(例えば、四臭化炭素、フェニルトリブロモメチルスルホン、フェニルトリクロロメチルケトンなど)、クマリン類(例えば、3-(2-ベンゾフラノイル)-7-ジエチルアミノクマリン、3-(2-ベンゾフロイル)-7-(1-ピロリジニル)クマリン、3-ベンゾイル-7-ジエチルアミノクマリン、3-(2-メトキシベンゾイル)-7-ジエチルアミノクマリン、3-(4-ジメチルアミノベンゾイル)-7-ジエチルアミノクマリン、3,3’-カルボニルビス(5,7-ジ-n-プロポキシクマリン)、3,3’-カルボニルビス(7-ジエチルアミノクマリン)、3-ベンゾイル-7-メトキシクマリン、3-(2-フロイル)-7-ジエチルアミノクマリン、3-(4-ジエチルアミノシンナモイル)-7-ジエチルアミノクマリン、7-メトキシ-3-(3-ピリジルカルボニル)クマリン、3-ベンゾイル-5,7-ジプロポキシクマリン、7-ベンゾトリアゾール-2-イルクマリン、また、特開平5-19475号公報、特開平7-271028号公報、特開2002-363206号公報、特開2002-363207号公報、特開2002-363208号公報、特開2002-363209号公報などに記載のクマリン化合物など)、アシルホスフィンオキサイド類(例えば、ビス(2,4,6-トリメチルベンゾイル)-フェニルホスフィンオキサイド、ビス(2,6-ジメトキシベンゾイル)-2,4,4-トリメチル-ペンチルフェニルホスフィンオキサイド、LucirinTPOなど)、メタロセン類(例えば、ビス(η5-2,4-シクロペンタジエン-1-イル)-ビス(2,6-ジフロロ-3-(1H-ピロール-1-イル)-フェニル)チタニウム、η5-シクロペンタジエニル-η6-クメニル-アイアン(1+)-ヘキサフロロホスフェート(1-)など)、特開昭53-133428号公報、特公昭57-1819号公報、同57-6096号公報、および米国特許第3615455号明細書に記載された化合物などが挙げられる。 Further, as photopolymerization initiators other than those mentioned above, polyhalogen compounds (for example, 9-phenylacridine, 1,7-bis (9,9′-acridinyl) heptane, etc.), N-phenylglycine, etc. Carbon tetrabromide, phenyl tribromomethyl sulfone, phenyl trichloromethyl ketone, etc.), coumarins (eg, 3- (2-benzofuranoyl) -7-diethylaminocoumarin, 3- (2-benzofuroyl) -7- (1 -Pyrrolidinyl) coumarin, 3-benzoyl-7-diethylaminocoumarin, 3- (2-methoxybenzoyl) -7-diethylaminocoumarin, 3- (4-dimethylaminobenzoyl) -7-diethylaminocoumarin, 3,3'-carbonylbis (5,7-di-n-propoxycoumarin), 3,3'-ca Bonylbis (7-diethylaminocoumarin), 3-benzoyl-7-methoxycoumarin, 3- (2-furoyl) -7-diethylaminocoumarin, 3- (4-diethylaminocinnamoyl) -7-diethylaminocoumarin, 7-methoxy-3 -(3-pyridylcarbonyl) coumarin, 3-benzoyl-5,7-dipropoxycoumarin, 7-benzotriazol-2-ylcoumarin, JP-A-5-19475, JP-A-7-271028, JP No. 2002-363206, JP-A No. 2002-363207, JP-A No. 2002-363208, JP-A No. 2002-363209, etc.), acylphosphine oxides (for example, bis (2,4 , 6-Trimethylbenzoyl) -phenylphos Zinc oxide, bis (2,6-dimethoxybenzoyl) -2,4,4-trimethyl-pentylphenylphosphine oxide, Lucirin TPO, etc.), metallocenes (for example, bis (η5-2,4-cyclopentadien-1-yl)- Bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium, η5-cyclopentadienyl-η6-cumenyl-iron (1 +)-hexafluorophosphate (1-), etc.) Examples thereof include compounds described in JP-A Nos. 53-133428, 57-1819, 57-6096, and US Pat. No. 3,615,455.
 前記ケトン化合物としては、例えば、ベンゾフェノン、2-メチルベンゾフェノン、3-メチルベンゾフェノン、4-メチルベンゾフェノン、4-メトキシベンゾフェノン、2-クロロベンゾフェノン、4-クロロベンゾフェノン、4-ブロモベンゾフェノン、2-カルボキシベンゾフェノン、2-エトキシカルボニルベンゾフェノン、ベンゾフェノンテトラカルボン酸またはそのテトラメチルエステル、4,4’-ビス(ジアルキルアミノ)ベンゾフェノン類(例えば、4,4’-ビス(ジメチルアミノ)ベンゾフェノン、4,4’-ビスジシクロヘキシルアミノ)ベンゾフェノン、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、4,4’-ビス(ジヒドロキシエチルアミノ)ベンゾフェノン、4-メトキシ-4’-ジメチルアミノベンゾフェノン、4,4’-ジメトキシベンゾフェノン、4-ジメチルアミノベンゾフェノン、4-ジメチルアミノアセトフェノン、ベンジル、アントラキノン、2-tert-ブチルアントラキノン、2-メチルアントラキノン、フェナントラキノン、キサントン、チオキサントン、2-クロロ-チオキサントン、2,4-ジエチルチオキサントン、フルオレノン、2-ベンジル-ジメチルアミノ-1-(4-モルホリノフェニル)-1-ブタノン、2-メチル-1-〔4-(メチルチオ)フェニル〕-2-モルホリノ-1-プロパノン、2-ヒドロキシ-2-メチル-〔4-(1-メチルビニル)フェニル〕プロパノールオリゴマー、ベンゾイン、ベンゾインエーテル類(例えば、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインプロピルエーテル、ベンゾインイソプロピルエーテル、ベンゾインフェニルエーテル、ベンジルジメチルケタール)、アクリドン、クロロアクリドン、N-メチルアクリドン、N-ブチルアクリドン、N-ブチル-クロロアクリドンなどが挙げられる。 Examples of the ketone compound include benzophenone, 2-methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 4-methoxybenzophenone, 2-chlorobenzophenone, 4-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone, 2-ethoxycarbonylbenzophenone, benzophenonetetracarboxylic acid or tetramethyl ester thereof, 4,4′-bis (dialkylamino) benzophenones (eg, 4,4′-bis (dimethylamino) benzophenone, 4,4′-bisdicyclohexyl) Amino) benzophenone, 4,4'-bis (diethylamino) benzophenone, 4,4'-bis (dihydroxyethylamino) benzophenone, 4-methoxy-4'-dimethylamino Benzophenone, 4,4'-dimethoxybenzophenone, 4-dimethylaminobenzophenone, 4-dimethylaminoacetophenone, benzyl, anthraquinone, 2-tert-butylanthraquinone, 2-methylanthraquinone, phenanthraquinone, xanthone, thioxanthone, 2-chloro -Thioxanthone, 2,4-diethylthioxanthone, fluorenone, 2-benzyl-dimethylamino-1- (4-morpholinophenyl) -1-butanone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino -1-propanone, 2-hydroxy-2-methyl- [4- (1-methylvinyl) phenyl] propanol oligomer, benzoin, benzoin ethers (for example, benzoin methyl ether, benzoin ethyl ether) , Benzoin propyl ether, benzoin isopropyl ether, benzoin phenyl ether, benzyl dimethyl ketal), acridone, chloro acridone, N- methyl acridone, N- butyl acridone, N- butyl - such as chloro acrylic pyrrolidone.
 光重合開始剤としては、ヒドロキシアセトフェノン化合物、アミノアセトフェノン化合物、および、アシルホスフィン化合物も好適に用いることができる。より具体的には、例えば、特開平10-291969号公報に記載のアミノアセトフェノン系開始剤、特許第4225898号公報に記載のアシルホスフィンオキシド系開始剤も用いることができる。
 ヒドロキシアセトフェノン系開始剤としては、IRGACURE-184、DAROCUR-1173、IRGACURE-500、IRGACURE-2959,IRGACURE-127(商品名:いずれもBASF社製)を用いることができる。アミノアセトフェノン系開始剤としては、市販品であるIRGACURE-907、IRGACURE-369、および、IRGACURE-379、IRGACURE-OXE379(商品名:いずれもBASF社製)を用いることができる。アミノアセトフェノン系開始剤として、365nmまたは405nm等の長波光源に吸収波長がマッチングされた特開2009-191179公報に記載の化合物も用いることができる。また、アシルホスフィン系開始剤としては市販品であるIRGACURE-819やDAROCUR-TPO(商品名:いずれもBASF社製)を用いることができる。
As the photopolymerization initiator, hydroxyacetophenone compounds, aminoacetophenone compounds, and acylphosphine compounds can also be suitably used. More specifically, for example, aminoacetophenone initiators described in JP-A-10-291969 and acylphosphine oxide initiators described in Japanese Patent No. 4225898 can also be used.
As the hydroxyacetophenone-based initiator, IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, IRGACURE-127 (trade names: all manufactured by BASF) can be used. As the aminoacetophenone-based initiator, commercially available products IRGACURE-907, IRGACURE-369, IRGACURE-379, IRGACURE-OXE379 (trade names: all manufactured by BASF) can be used. As the aminoacetophenone-based initiator, compounds described in JP-A-2009-191179 whose absorption wavelength is matched with a long wave light source of 365 nm or 405 nm can also be used. As the acylphosphine initiator, commercially available products such as IRGACURE-819 and DAROCUR-TPO (trade names: both manufactured by BASF) can be used.
 光重合開始剤として、より好ましくはオキシム化合物が挙げられる。オキシム化合物の具体例としては、特開2001-233842号公報記載の化合物、特開2000-80068号公報記載の化合物、特開2006-342166号公報記載の化合物を用いることができる。 More preferable examples of the photopolymerization initiator include oxime compounds. Specific examples of the oxime compound include compounds described in JP-A No. 2001-233842, compounds described in JP-A No. 2000-80068, and compounds described in JP-A No. 2006-342166.
 本発明における光重合開始剤として好適に用いられるオキシム誘導体等のオキシム化合物としては、例えば、3-ベンゾイロキシイミノブタン-2-オン、3-アセトキシイミノブタン-2-オン、3-プロピオニルオキシイミノブタン-2-オン、2-アセトキシイミノペンタン-3-オン、2-アセトキシイミノ-1-フェニルプロパン-1-オン、2-ベンゾイロキシイミノ-1-フェニルプロパン-1-オン、3-(4-トルエンスルホニルオキシ)イミノブタン-2-オン、および2-エトキシカルボニルオキシイミノ-1-フェニルプロパン-1-オンなどが挙げられる。 Examples of oxime compounds such as oxime derivatives that are preferably used as the photopolymerization initiator in the present invention include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, and 3-propionyloxyimino. Butan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3- (4 -Toluenesulfonyloxy) iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, and the like.
 オキシム化合物としては、J.C.S.Perkin II(1979年)pp.1653-1660)、J.C.S.Perkin II(1979年)pp.156-162、Journal of Photopolymer Science and Technology(1995年)pp.202-232、特開2000-66385号公報記載の化合物、特開2000-80068号公報、特表2004-534797号公報、特開2006-342166号公報の各公報に記載の化合物等が挙げられる。
 市販品ではIRGACURE-OXE01(BASF社製)、IRGACURE-OXE02(BASF社製)も好適に用いられる。
Examples of oxime compounds include J.M. C. S. Perkin II (1979) pp. 1653-1660), J.M. C. S. Perkin II (1979) pp. 156-162, Journal of Photopolymer Science and Technology (1995) pp. 202-232, compounds described in JP-A No. 2000-66385, compounds described in JP-A Nos. 2000-80068, JP-T 2004-534797, JP-A No. 2006-342166, and the like.
As commercially available products, IRGACURE-OXE01 (manufactured by BASF) and IRGACURE-OXE02 (manufactured by BASF) are also preferably used.
 また上記記載以外のオキシム化合物として、カルバゾールN位にオキシムが連結した特表2009-519904号公報に記載の化合物、ベンゾフェノン部位にヘテロ置換基が導入された米国特許第7626957号公報に記載の化合物、色素部位にニトロ基が導入された特開2010-15025号公報および米国特許公開2009-292039号記載の化合物、国際公開特許2009-131189号公報に記載のケトオキシム化合物、トリアジン骨格とオキシム骨格を同一分子内に含有する米国特許7556910号公報に記載の化合物、405nmに吸収極大を有しg線光源に対して良好な感度を有する特開2009-221114号公報記載の化合物、などを用いてもよい。 Further, as oxime compounds other than those described above, compounds described in JP-A-2009-519904 in which an oxime is linked to the carbazole N-position, compounds described in US Pat. No. 7,626,957 in which a hetero substituent is introduced into the benzophenone moiety, Compounds described in Japanese Patent Application Laid-Open No. 2010-15025 and US Patent Publication No. 2009-292039, in which a nitro group is introduced into the dye moiety, a ketoxime compound described in International Patent Publication No. 2009-131189, a triazine skeleton and an oxime skeleton in the same molecule A compound described in US Pat. No. 7,556,910 contained therein, a compound described in JP-A-2009-221114 having an absorption maximum at 405 nm and good sensitivity to a g-line light source, and the like may be used.
 好ましくはさらに、特開2007-231000号公報、および、特開2007-322744号公報に記載される環状オキシム化合物に対しても好適に用いることができる。環状オキシム化合物の中でも、特に特開2010-32985号公報、特開2010-185072号公報に記載されるカルバゾール色素に縮環した環状オキシム化合物は、高い光吸収性を有し高感度化の観点から好ましい。
 また、オキシム化合物の特定部位に不飽和結合を有する特開2009-242469号公報に記載の化合物も、重合不活性ラジカルから活性ラジカルを再生することで高感度化を達成でき好適に使用することができる。
Preferably, it can also be suitably used for the cyclic oxime compounds described in JP-A-2007-231000 and JP-A-2007-322744. Among cyclic oxime compounds, in particular, cyclic oxime compounds fused to carbazole dyes described in JP2010-32985A and JP2010-185072A have high light absorptivity and high sensitivity. preferable.
Further, the compounds described in JP-A-2009-242469 having an unsaturated bond at a specific site of the oxime compound can be preferably used because high sensitivity can be achieved by regenerating the active radical from the polymerization inert radical. it can.
 最も好ましくは、特開2007-269779号公報に示される特定置換基を有するオキシム化合物や、特開2009-191061号公報に示されるチオアリール基を有するオキシム化合物が挙げられる。
 具体的には、光重合開始剤であるオキシム化合物としては、下記一般式(OX-1)で表される化合物が好ましい。なお、オキシムのN-O結合が(E)体のオキシム化合物であっても、(Z)体のオキシム化合物であっても、(E)体と(Z)体との混合物であってもよい。
Most preferably, an oxime compound having a specific substituent as disclosed in JP 2007-26997A and an oxime compound having a thioaryl group as disclosed in JP 2009-191061 A can be given.
Specifically, the oxime compound that is a photopolymerization initiator is preferably a compound represented by the following general formula (OX-1). The oxime N—O bond may be an (E) oxime compound, a (Z) oxime compound, or a mixture of (E) and (Z) isomers. .
Figure JPOXMLDOC01-appb-C000081
Figure JPOXMLDOC01-appb-C000081
 一般式(OX-1)中、RおよびBはそれぞれ一価の置換基を表し、Aは二価の有機基を表し、Arはアリール基を表す。
 一般式(OX-1)中、Rで表される一価の置換基としては、一価の非金属原子団であることが好ましい。
 前記一価の非金属原子団としては、アルキル基、アリール基、アシル基、アルコキシカルボニル基、アリールオキシカルボニル基、複素環基、アルキルチオカルボニル基、アリールチオカルボニル基等が挙げられる。また、これらの基は、1以上の置換基を有していてもよい。また、前述した置換基は、さらに他の置換基で置換されていてもよい。
 置換基としてはハロゲン原子、アリールオキシ基、アルコキシカルボニル基またはアリールオキシカルボニル基、アシルオキシ基、アシル基、アルキル基、アリール基等が挙げられる。
In general formula (OX-1), R and B each represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group.
In the general formula (OX-1), the monovalent substituent represented by R is preferably a monovalent nonmetallic atomic group.
Examples of the monovalent nonmetallic atomic group include an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic group, an alkylthiocarbonyl group, and an arylthiocarbonyl group. Moreover, these groups may have one or more substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
Examples of the substituent include a halogen atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, an acyloxy group, an acyl group, an alkyl group, and an aryl group.
 アルキル基としては、炭素数1~30のアルキル基が好ましく、具体的には、メチル基、エチル基、プロピル基、ブチル基、ヘキシル基、オクチル基、デシル基、ドデシル基、オクタデシル基、イソプロピル基、イソブチル基、sec-ブチル基、tert-ブチル基、1-エチルペンチル基、シクロペンチル基、シクロヘキシル基、トリフルオロメチル基、2-エチルヘキシル基、フェナシル基、1-ナフトイルメチル基、2-ナフトイルメチル基、4-メチルスルファニルフェナシル基、4-フェニルスルファニルフェナシル基、4-ジメチルアミノフェナシル基、4-シアノフェナシル基、4-メチルフェナシル基、2-メチルフェナシル基、3-フルオロフェナシル基、3-トリフルオロメチルフェナシル基、および、3-ニトロフェナシル基が例示できる。 As the alkyl group, an alkyl group having 1 to 30 carbon atoms is preferable. Specifically, a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group, an octadecyl group, an isopropyl group , Isobutyl, sec-butyl, tert-butyl, 1-ethylpentyl, cyclopentyl, cyclohexyl, trifluoromethyl, 2-ethylhexyl, phenacyl, 1-naphthoylmethyl, 2-naphthoyl Methyl group, 4-methylsulfanylphenacyl group, 4-phenylsulfanylphenacyl group, 4-dimethylaminophenacyl group, 4-cyanophenacyl group, 4-methylphenacyl group, 2-methylphenacyl group, 3-fluorophena Sil group, 3-trifluoromethylphenacyl group, and 3-nitro Enashiru group can be exemplified.
 アリール基としては、炭素数6~30のアリール基が好ましく、具体的には、フェニル基、ビフェニル基、1-ナフチル基、2-ナフチル基、9-アンスリル基、9-フェナントリル基、1-ピレニル基、5-ナフタセニル基、1-インデニル基、2-アズレニル基、9-フルオレニル基、ターフェニル基、クオーターフェニル基、o-トリル基、m-トリル基、p-トリル基、キシリル基、o-クメニル基、m-クメニル基およびp-クメニル基、メシチル基、ペンタレニル基、ビナフタレニル基、ターナフタレニル基、クオーターナフタレニル基、ヘプタレニル基、ビフェニレニル基、インダセニル基、フルオランテニル基、アセナフチレニル基、アセアントリレニル基、フェナレニル基、フルオレニル基、アントリル基、ビアントラセニル基、ターアントラセニル基、クオーターアントラセニル基、アントラキノリル基、フェナントリル基、トリフェニレニル基、ピレニル基、クリセニル基、ナフタセニル基、プレイアデニル基、ピセニル基、ペリレニル基、ペンタフェニル基、ペンタセニル基、テトラフェニレニル基、ヘキサフェニル基、ヘキサセニル基、ルビセニル基、コロネニル基、トリナフチレニル基、ヘプタフェニル基、ヘプタセニル基、ピラントレニル基、並びに、オバレニル基が例示できる。 The aryl group is preferably an aryl group having 6 to 30 carbon atoms, and specifically includes a phenyl group, a biphenyl group, a 1-naphthyl group, a 2-naphthyl group, a 9-anthryl group, a 9-phenanthryl group, and a 1-pyrenyl group. Group, 5-naphthacenyl group, 1-indenyl group, 2-azurenyl group, 9-fluorenyl group, terphenyl group, quarterphenyl group, o-tolyl group, m-tolyl group, p-tolyl group, xylyl group, o- Cumenyl, m-cumenyl and p-cumenyl, mesityl, pentarenyl, binaphthalenyl, turnanaphthalenyl, quarternaphthalenyl, heptaenyl, biphenylenyl, indacenyl, fluoranthenyl, acenaphthylenyl, aceanthrylyl Nyl group, phenalenyl group, fluorenyl group, anthryl group, biantra Nyl group, teranthracenyl group, quarteranthracenyl group, anthraquinolyl group, phenanthryl group, triphenylenyl group, pyrenyl group, chrysenyl group, naphthacenyl group, preadenyl group, picenyl group, perylenyl group, pentaphenyl group, pentacenyl group, Examples thereof include a tetraphenylenyl group, a hexaphenyl group, a hexacenyl group, a ruvicenyl group, a coronenyl group, a trinaphthylenyl group, a heptaphenyl group, a heptacenyl group, a pyranthrenyl group, and an ovalenyl group.
 アシル基としては、炭素数2~20のアシル基が好ましく、具体的には、アセチル基、プロパノイル基、ブタノイル基、トリフルオロアセチル基、ペンタノイル基、ベンゾイル基、1-ナフトイル基、2-ナフトイル基、4-メチルスルファニルベンゾイル基、4-フェニルスルファニルベンゾイル基、4-ジメチルアミノベンゾイル基、4-ジエチルアミノベンゾイル基、2-クロロベンゾイル基、2-メチルベンゾイル基、2-メトキシベンゾイル基、2-ブトキシベンゾイル基、3-クロロベンゾイル基、3-トリフルオロメチルベンゾイル基、3-シアノベンゾイル基、3-ニトロベンゾイル基、4-フルオロベンゾイル基、4-シアノベンゾイル基、および、4-メトキシベンゾイル基が例示できる。 The acyl group is preferably an acyl group having 2 to 20 carbon atoms, and specifically includes an acetyl group, a propanoyl group, a butanoyl group, a trifluoroacetyl group, a pentanoyl group, a benzoyl group, a 1-naphthoyl group, and a 2-naphthoyl group. 4-methylsulfanylbenzoyl group, 4-phenylsulfanylbenzoyl group, 4-dimethylaminobenzoyl group, 4-diethylaminobenzoyl group, 2-chlorobenzoyl group, 2-methylbenzoyl group, 2-methoxybenzoyl group, 2-butoxybenzoyl Group, 3-chlorobenzoyl group, 3-trifluoromethylbenzoyl group, 3-cyanobenzoyl group, 3-nitrobenzoyl group, 4-fluorobenzoyl group, 4-cyanobenzoyl group, and 4-methoxybenzoyl group can be exemplified. .
 アルコキシカルボニル基としては、炭素数2~20のアルコキシカルボニル基が好ましく、具体的には、メトキシカルボニル基、エトキシカルボニル基、プロポキシカルボニル基、ブトキシカルボニル基、ヘキシルオキシカルボニル基、オクチルオキシカルボニル基、デシルオキシカルボニル基、オクタデシルオキシカルボニル基、および、トリフルオロメチルオキシカルボニル基が例示できる。 The alkoxycarbonyl group is preferably an alkoxycarbonyl group having 2 to 20 carbon atoms, and specifically includes a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, a hexyloxycarbonyl group, an octyloxycarbonyl group, a decyl group. Examples thereof include an oxycarbonyl group, an octadecyloxycarbonyl group, and a trifluoromethyloxycarbonyl group.
 アリールオキシカルボニル基として具体的には、フェノキシカルボニル基、1-ナフチルオキシカルボニル基、2-ナフチルオキシカルボニル基、4-メチルスルファニルフェニルオキシカルボニル基、4-フェニルスルファニルフェニルオキシカルボニル基、4-ジメチルアミノフェニルオキシカルボニル基、4-ジエチルアミノフェニルオキシカルボニル基、2-クロロフェニルオキシカルボニル基、2-メチルフェニルオキシカルボニル基、2-メトキシフェニルオキシカルボニル基、2-ブトキシフェニルオキシカルボニル基、3-クロロフェニルオキシカルボニル基、3-トリフルオロメチルフェニルオキシカルボニル基、3-シアノフェニルオキシカルボニル基、3-ニトロフェニルオキシカルボニル基、4-フルオロフェニルオキシカルボニル基、4-シアノフェニルオキシカルボニル基、および、4-メトキシフェニルオキシカルボニル基が例示できる。 Specific examples of the aryloxycarbonyl group include phenoxycarbonyl group, 1-naphthyloxycarbonyl group, 2-naphthyloxycarbonyl group, 4-methylsulfanylphenyloxycarbonyl group, 4-phenylsulfanylphenyloxycarbonyl group, 4-dimethylamino. Phenyloxycarbonyl group, 4-diethylaminophenyloxycarbonyl group, 2-chlorophenyloxycarbonyl group, 2-methylphenyloxycarbonyl group, 2-methoxyphenyloxycarbonyl group, 2-butoxyphenyloxycarbonyl group, 3-chlorophenyloxycarbonyl group 3-trifluoromethylphenyloxycarbonyl group, 3-cyanophenyloxycarbonyl group, 3-nitrophenyloxycarbonyl group, 4-fluoropheny Oxycarbonyl group, 4-cyanophenyl oxycarbonyl group, and, 4-methoxy phenyloxy carbonyl group can be exemplified.
 複素環基としては、窒素原子、酸素原子、硫黄原子若しくはリン原子を含む、芳香族または脂肪族の複素環が好ましい。
 具体的には、チエニル基、ベンゾ[b]チエニル基、ナフト[2,3-b]チエニル基、チアントレニル基、フリル基、ピラニル基、イソベンゾフラニル基、クロメニル基、キサンテニル基、フェノキサチイニル基、2H-ピロリル基、ピロリル基、イミダゾリル基、ピラゾリル基、ピリジル基、ピラジニル基、ピリミジニル基、ピリダジニル基、インドリジニル基、イソインドリル基、3H-インドリル基、インドリル基、1H-インダゾリル基、プリニル基、4H-キノリジニル基、イソキノリル基、キノリル基、フタラジニル基、ナフチリジニル基、キノキサリニル基、キナゾリニル基、シンノリニル基、プテリジニル基、4aH-カルバゾリル基、カルバゾリル基、β-カルボリニル基、フェナントリジニル基、アクリジニル基、ペリミジニル基、フェナントロリニル基、フェナジニル基、フェナルサジニル基、イソチアゾリル基、フェノチアジニル基、イソキサゾリル基、フラザニル基、フェノキサジニル基、イソクロマニル基、クロマニル基、ピロリジニル基、ピロリニル基、イミダゾリジニル基、イミダゾリニル基、ピラゾリジニル基、ピラゾリニル基、ピペリジル基、ピペラジニル基、インドリニル基、イソインドリニル基、キヌクリジニル基、モルホリニル基、および、チオキサントリル基が例示できる。
As the heterocyclic group, an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom is preferable.
Specifically, thienyl group, benzo [b] thienyl group, naphtho [2,3-b] thienyl group, thiantenyl group, furyl group, pyranyl group, isobenzofuranyl group, chromenyl group, xanthenyl group, phenoxathiyl Nyl group, 2H-pyrrolyl group, pyrrolyl group, imidazolyl group, pyrazolyl group, pyridyl group, pyrazinyl group, pyrimidinyl group, pyridazinyl group, indolizinyl group, isoindolyl group, 3H-indolyl group, indolyl group, 1H-indazolyl group, purinyl group 4H-quinolidinyl group, isoquinolyl group, quinolyl group, phthalazinyl group, naphthyridinyl group, quinoxalinyl group, quinazolinyl group, cinnolinyl group, pteridinyl group, 4aH-carbazolyl group, carbazolyl group, β-carbolinyl group, phenanthridinyl group, acridinyl group Group Midinyl group, phenanthrolinyl group, phenazinyl group, phenalsadinyl group, isothiazolyl group, phenothiazinyl group, isoxazolyl group, furazanyl group, phenoxazinyl group, isochromanyl group, chromanyl group, pyrrolidinyl group, pyrrolinyl group, imidazolidinyl group, imidazolinyl group, pyrazolidinyl group, pyrazolidinyl group Examples include a group, pyrazolinyl group, piperidyl group, piperazinyl group, indolinyl group, isoindolinyl group, quinuclidinyl group, morpholinyl group, and thioxanthryl group.
 アルキルチオカルボニル基として具体的には、メチルチオカルボニル基、プロピルチオカルボニル基、ブチルチオカルボニル基、ヘキシルチオカルボニル基、オクチルチオカルボニル基、デシルチオカルボニル基、オクタデシルチオカルボニル基、および、トリフルオロメチルチオカルボニル基が例示できる。 Specific examples of the alkylthiocarbonyl group include a methylthiocarbonyl group, a propylthiocarbonyl group, a butylthiocarbonyl group, a hexylthiocarbonyl group, an octylthiocarbonyl group, a decylthiocarbonyl group, an octadecylthiocarbonyl group, and a trifluoromethylthiocarbonyl group. Can be illustrated.
 アリールチオカルボニル基として具体的には、1-ナフチルチオカルボニル基、2-ナフチルチオカルボニル基、4-メチルスルファニルフェニルチオカルボニル基、4-フェニルスルファニルフェニルチオカルボニル基、4-ジメチルアミノフェニルチオカルボニル基、4-ジエチルアミノフェニルチオカルボニル基、2-クロロフェニルチオカルボニル基、2-メチルフェニルチオカルボニル基、2-メトキシフェニルチオカルボニル基、2-ブトキシフェニルチオカルボニル基、3-クロロフェニルチオカルボニル基、3-トリフルオロメチルフェニルチオカルボニル基、3-シアノフェニルチオカルボニル基、3-ニトロフェニルチオカルボニル基、4-フルオロフェニルチオカルボニル基、4-シアノフェニルチオカルボニル基、および、4-メトキシフェニルチオカルボニル基が挙げられる。 Specific examples of the arylthiocarbonyl group include a 1-naphthylthiocarbonyl group, a 2-naphthylthiocarbonyl group, a 4-methylsulfanylphenylthiocarbonyl group, a 4-phenylsulfanylphenylthiocarbonyl group, and a 4-dimethylaminophenylthiocarbonyl group. 4-diethylaminophenylthiocarbonyl group, 2-chlorophenylthiocarbonyl group, 2-methylphenylthiocarbonyl group, 2-methoxyphenylthiocarbonyl group, 2-butoxyphenylthiocarbonyl group, 3-chlorophenylthiocarbonyl group, 3-triphenyl Fluoromethylphenylthiocarbonyl group, 3-cyanophenylthiocarbonyl group, 3-nitrophenylthiocarbonyl group, 4-fluorophenylthiocarbonyl group, 4-cyanophenylthiocarbonyl group And, and a 4-methoxyphenylthiocarbonyl group.
 一般式(OX-1)中、Bで表される一価の置換基としては、アリール基、複素環基、アリールカルボニル基、または、複素環カルボニル基を表す。また、これらの基は1以上の置換基を有していてもよい。置換基としては、前述した置換基が例示できる。また、前述した置換基は、さらに他の置換基で置換されていてもよい。 In the general formula (OX-1), the monovalent substituent represented by B represents an aryl group, a heterocyclic group, an arylcarbonyl group, or a heterocyclic carbonyl group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
 なかでも、特に好ましくは以下に示す構造である。
 下記の構造中、Y、X、および、nは、それぞれ、後述する一般式(OX-2)におけるY、X、および、nと同義であり、好ましい例も同様である。
Of these, the structures shown below are particularly preferred.
In the following structure, Y, X, and n have the same meanings as Y, X, and n in General Formula (OX-2) described later, and preferred examples are also the same.
Figure JPOXMLDOC01-appb-C000082
Figure JPOXMLDOC01-appb-C000082
 前記式(OX-1)中、Aで表される二価の有機基としては、炭素数1~12のアルキレン基、シクロアルキレン基、アルキニレン基が挙げられる。また、これらの基は1以上の置換基を有していてもよい。置換基としては、前述した置換基が例示できる。また、前述した置換基は、さらに他の置換基で置換されていてもよい。
 中でも、式(OX-1)におけるAとしては、感度を高め、加熱経時による着色を抑制する点から、無置換のアルキレン基、アルキル基(例えば、メチル基、エチル基、tert-ブチル基、ドデシル基)で置換されたアルキレン基、アルケニル基(例えば、ビニル基、アリル基)で置換されたアルキレン基、アリール基(例えば、フェニル基、p-トリル基、キシリル基、クメニル基、ナフチル基、アンスリル基、フェナントリル基、スチリル基)で置換されたアルキレン基が好ましい。
In the formula (OX-1), examples of the divalent organic group represented by A include an alkylene group having 1 to 12 carbon atoms, a cycloalkylene group, and an alkynylene group. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
Among them, A in the formula (OX-1) is an unsubstituted alkylene group, an alkyl group (for example, a methyl group, an ethyl group, a tert-butyl group, dodecyl) from the viewpoint of increasing sensitivity and suppressing coloring due to heating. Group) substituted alkylene group, alkenyl group (eg vinyl group, allyl group) alkylene group, aryl group (eg phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl) Group, a phenanthryl group, and a styryl group) are preferable.
 前記式(OX-1)中、Arで表されるアリール基としては、炭素数6~30のアリール基が好ましく、また、置換基を有していてもよい。置換基としては、先に置換基を有していてもよいアリール基の具体例として挙げた置換アリール基に導入された置換基と同様のものが例示できる。
 なかでも、感度を高め、加熱経時による着色を抑制する点から、置換または無置換のフェニル基が好ましい。
In the formula (OX-1), the aryl group represented by Ar is preferably an aryl group having 6 to 30 carbon atoms, and may have a substituent. Examples of the substituent include the same substituents as those introduced into the substituted aryl group mentioned above as specific examples of the aryl group which may have a substituent.
Of these, a substituted or unsubstituted phenyl group is preferable from the viewpoint of increasing sensitivity and suppressing coloring due to heating.
 式(OX-1)においては、前記式(OX-1)中のArとそれに隣接するSとで形成される「SAr」の構造が、以下に示す構造であることが感度の点で好ましい。なお、Meはメチル基を表し、Etはエチル基を表す。 In the formula (OX-1), it is preferable in terms of sensitivity that the structure of “SAr” formed by Ar in the formula (OX-1) and S adjacent thereto is a structure shown below. Me represents a methyl group, and Et represents an ethyl group.
Figure JPOXMLDOC01-appb-C000083
Figure JPOXMLDOC01-appb-C000083
 オキシム化合物は、下記一般式(OX-2)で表される化合物であることが好ましい。 The oxime compound is preferably a compound represented by the following general formula (OX-2).
Figure JPOXMLDOC01-appb-C000084
Figure JPOXMLDOC01-appb-C000084
 一般式(OX-2)中、RおよびXはそれぞれ一価の置換基を表し、AおよびYはそれぞれ二価の有機基を表し、Arはアリール基を表し、nは0~5の整数である。一般式(OX-2)におけるR、A、およびArは、一般式(OX-1)におけるR、A、およびArと同義であり、好ましい例も同様である。 In general formula (OX-2), R and X each represent a monovalent substituent, A and Y each represent a divalent organic group, Ar represents an aryl group, and n is an integer of 0 to 5 is there. R, A and Ar in the general formula (OX-2) have the same meanings as R, A and Ar in the general formula (OX-1), and preferred examples thereof are also the same.
 一般式(OX-2)中、Xで表される一価の置換基としては、アルキル基、アリール基、アルコキシ基、アリールオキシ基、アシルオキシ基、アシル基、アルコキシカルボニル基、アミノ基、複素環基、ハロゲン原子が挙げられる。また、これらの基は1以上の置換基を有していてもよい。置換基としては、前述した置換基が例示できる。また、前述した置換基は、さらに他の置換基で置換されていてもよい。 In the general formula (OX-2), the monovalent substituent represented by X includes an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an acyloxy group, an acyl group, an alkoxycarbonyl group, an amino group, and a heterocyclic ring. Group and halogen atom. These groups may have one or more substituents. Examples of the substituent include the above-described substituents. Moreover, the substituent mentioned above may be further substituted by another substituent.
 これらの中でも、一般式(OX-2)におけるXとしては、溶剤溶解性と長波長領域の吸収効率向上の点から、アルキル基が好ましい。
 また、式(2)におけるnは、0~5の整数を表し、0~2の整数が好ましい。
Among these, X in the general formula (OX-2) is preferably an alkyl group from the viewpoint of solvent solubility and improvement of absorption efficiency in the long wavelength region.
In the formula (2), n represents an integer of 0 to 5, and an integer of 0 to 2 is preferable.
 一般式(OX-2)中、Yで表される二価の有機基としては、以下に示す構造が挙げられる。なお、以下に示される基において、「*」は、前記式(OX-2)において、Yと隣接する炭素原子との結合位置を示す。 In the general formula (OX-2), examples of the divalent organic group represented by Y include the following structures. In the groups shown below, “*” represents a bonding position between Y and an adjacent carbon atom in the formula (OX-2).
Figure JPOXMLDOC01-appb-C000085
Figure JPOXMLDOC01-appb-C000085
 中でも、高感度化の観点から、下記に示す構造が好ましい。 Of these, the following structures are preferable from the viewpoint of increasing sensitivity.
Figure JPOXMLDOC01-appb-C000086
Figure JPOXMLDOC01-appb-C000086
 さらにオキシム化合物は、下記一般式(OX-3)または(OX-4)で表される化合物であることが好ましい。 Furthermore, the oxime compound is preferably a compound represented by the following general formula (OX-3) or (OX-4).
Figure JPOXMLDOC01-appb-C000087
Figure JPOXMLDOC01-appb-C000087
 一般式(OX-3)または(OX-4)中、RおよびXはそれぞれ一価の置換基を表し、Aは二価の有機基を表し、Arはアリール基を表し、nは0~5の整数である。)
 一般式(OX-3)または(OX-4)におけるR、X、A、Ar、および、nは、前記一般式(OX-2)におけるR、X、A、Ar、および、nとそれぞれ同義であり、好ましい例も同様である。
In general formula (OX-3) or (OX-4), R and X each represent a monovalent substituent, A represents a divalent organic group, Ar represents an aryl group, and n represents 0 to 5 Is an integer. )
R, X, A, Ar, and n in the general formula (OX-3) or (OX-4) have the same meanings as R, X, A, Ar, and n in the general formula (OX-2), respectively. The preferred examples are also the same.
 好適に用いられるオキシム化合物の具体例(C-4)~(C-13)を以下に示すが、本発明はこれらに限定されるものではない。 Specific examples (C-4) to (C-13) of oxime compounds that can be suitably used are shown below, but the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-C000088
Figure JPOXMLDOC01-appb-C000088
 オキシム化合物は、350nm~500nmの波長領域に極大吸収波長を有するものであり、360nm~480nmの波長領域に吸収波長を有するものであることが好ましく、365nmおよび455nmの吸光度が高いものが特に好ましい。 The oxime compound has a maximum absorption wavelength in a wavelength region of 350 nm to 500 nm, preferably has an absorption wavelength in a wavelength region of 360 nm to 480 nm, and particularly preferably has a high absorbance at 365 nm and 455 nm.
 オキシム化合物は、365nmまたは405nmにおけるモル吸光係数は、感度の観点から、1,000~300,000であることが好ましく、2,000~300,000であることがより好ましく、5,000~200,000であることが特に好ましい。
 化合物のモル吸光係数は、公知の方法を用いることができるが、具体的には、例えば、紫外可視分光光度計(Varian社製Carry-5 spectrophotometer)にて、酢酸エチル溶媒を用い、0.01g/Lの濃度で測定することが好ましい。
The molar extinction coefficient at 365 nm or 405 nm of the oxime compound is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, more preferably 5,000 to 200, from the viewpoint of sensitivity. Is particularly preferred.
A known method can be used for the molar extinction coefficient of the compound. Specifically, for example, 0.01 g of an ultraviolet-visible spectrophotometer (Vary Inc., Carry-5 spectrophotometer) is used with an ethyl acetate solvent. It is preferable to measure at a concentration of / L.
 本発明に用いられる光重合開始剤は、必要に応じて、2種以上を組み合わせて使用しても良い。 The photopolymerization initiator used in the present invention may be used in combination of two or more as required.
 本発明の組成物が(F)光重合開始剤を含有する場合、(F)光重合開始剤の含有量は、組成物の全固形分に対し0.1質量%以上10質量%以下であることが好ましく、より好ましくは0.5質量%以上5質量%以下、さらに好ましくは1質量%以上3質量%以下である。この範囲で、より良好な感度とパターン形成性が得られる。 When the composition of this invention contains (F) photoinitiator, content of (F) photoinitiator is 0.1 mass% or more and 10 mass% or less with respect to the total solid of a composition. More preferably, it is 0.5 mass% or more and 5 mass% or less, More preferably, it is 1 mass% or more and 3 mass% or less. Within this range, better sensitivity and pattern formability can be obtained.
<<(G)重合性化合物>>
 本発明の組成物は、重合性化合物を含有していてもよい。本発明では、ラジカル、酸、熱により架橋可能な公知の重合性化合物を用いることができ、例えば、エチレン性不飽和結合、環状エーテル(エポキシ、オキセタン)、メチロール等を含む重合性化合物が挙げられる。重合性化合物は、感度の観点から、末端エチレン性不飽和結合を少なくとも1個、好ましくは2個以上有する化合物から好適に選ばれる。中でも、4官能以上の多官能重合性化合物(重合性基を4つ以上有する重合性化合物)が好ましく、5官能以上の多官能重合性化合物がさらに好ましい。
<< (G) polymerizable compound >>
The composition of the present invention may contain a polymerizable compound. In the present invention, known polymerizable compounds that can be cross-linked by radicals, acids, and heat can be used, and examples thereof include polymerizable compounds containing an ethylenically unsaturated bond, cyclic ether (epoxy, oxetane), methylol and the like. . The polymerizable compound is suitably selected from compounds having at least one terminal ethylenically unsaturated bond, preferably two or more, from the viewpoint of sensitivity. Among them, a polyfunctional polymerizable compound having 4 or more functional groups (a polymerizable compound having 4 or more polymerizable groups) is preferable, and a polyfunctional polymerizable compound having 5 or more functional groups is more preferable.
 このような化合物群は当該産業分野において広く知られているものであり、本発明においてはこれらを特に限定なく用いることができる。これらは、例えば、モノマー、プレポリマー、すなわち2量体、3量体およびオリゴマーまたはそれらの混合物並びにそれらのオリゴマーなどの化学的形態のいずれであってもよい。本発明における重合性化合物は一種単独で用いてもよいし、2種以上を併用してもよい。 Such compound groups are widely known in the industrial field, and these can be used without particular limitation in the present invention. These may be in any chemical form such as, for example, monomers, prepolymers, ie dimers, trimers and oligomers or mixtures thereof and oligomers thereof. The polymeric compound in this invention may be used individually by 1 type, and may use 2 or more types together.
 より具体的には、モノマーおよびそのプレポリマーの例としては、不飽和カルボン酸(例えば、アクリル酸、メタクリル酸、イタコン酸、クロトン酸、イソクロトン酸、マレイン酸など)やそのエステル類、アミド類、並びにこれらの多量体が挙げられ、好ましくは、不飽和カルボン酸と脂肪族多価アルコール化合物とのエステル、および不飽和カルボン酸と脂肪族多価アミン化合物とのアミド類、並びにこれらの多量体である。また、ヒドロキシル基やアミノ基、メルカプト基等の求核性置換基を有する不飽和カルボン酸エステル或いはアミド類と、単官能若しくは多官能イソシアネート類或いはエポキシ類との付加反応物や、単官能若しくは多官能のカルボン酸との脱水縮合反応物等も好適に使用される。また、イソシアネート基やエポキシ基等の親電子性置換基を有する不飽和カルボン酸エステル或いはアミド類と、単官能若しくは多官能のアルコール類、アミン類、チオール類との付加反応物、さらに、ハロゲン基やトシルオキシ基等の脱離性置換基を有する不飽和カルボン酸エステル或いはアミド類と、単官能若しくは多官能のアルコール類、アミン類、チオール類との置換反応物も好適である。また、別の例として、上記の不飽和カルボン酸の代わりに、不飽和ホスホン酸、スチレン等のビニルベンゼン誘導体、ビニルエーテル、アリルエーテル等に置き換えた化合物群を使用することも可能である。
 これらの具体的な化合物としては、特開2009-288705号公報の段落番号〔0095〕~〔0108〕に記載されている化合物を本発明においても好適に用いることができる。
More specifically, examples of monomers and prepolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), esters thereof, amides, And multimers thereof, preferably esters of unsaturated carboxylic acids and aliphatic polyhydric alcohol compounds, amides of unsaturated carboxylic acids and aliphatic polyhydric amine compounds, and multimers thereof. is there. Also, addition reaction products of monofunctional or polyfunctional isocyanates or epoxies with unsaturated carboxylic acid esters or amides having a nucleophilic substituent such as hydroxyl group, amino group, mercapto group, monofunctional or polyfunctional. A dehydration condensation reaction product with a functional carboxylic acid is also preferably used. In addition, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an isocyanate group or an epoxy group with a monofunctional or polyfunctional alcohol, amine, or thiol, and a halogen group A substitution reaction product of an unsaturated carboxylic acid ester or amide having a detachable substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable. As another example, it is also possible to use a compound group in which an unsaturated phosphonic acid, a vinylbenzene derivative such as styrene, vinyl ether, allyl ether or the like is used instead of the unsaturated carboxylic acid.
As these specific compounds, compounds described in paragraphs [0095] to [0108] of JP-A-2009-288705 can be preferably used in the present invention.
 また、前記重合性化合物としては、少なくとも1個の付加重合可能なエチレン基を有する、常圧下で100℃以上の沸点を持つエチレン性不飽和基を持つ化合物も好ましい。その例としては、ポリエチレングリコールモノ(メタ)アクリレート、ポリプロピレングリコールモノ(メタ)アクリレート、フェノキシエチル(メタ)アクリレート等の単官能のアクリレートやメタアクリレート;ポリエチレングリコールジ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、ヘキサンジオール(メタ)アクリレート、トリメチロールプロパントリ(アクリロイルオキシプロピル)エーテル、トリ(アクリロイロキシエチル)イソシアヌレート、グリセリンやトリメチロールエタン等の多官能アルコールにエチレンオキサイドやプロピレンオキサイドを付加させた後(メタ)アクリレート化したもの、特公昭48-41708号公報、特公昭50-6034号公報、特開昭51-37193号公報に記載されているようなウレタン(メタ)アクリレート類、特開昭48-64183号公報、特公昭49-43191号公報、特公昭52-30490号公報に記載されているポリエステルアクリレート類、エポキシ樹脂と(メタ)アクリル酸との反応生成物であるエポキシアクリレート類等の多官能のアクリレートやメタアクリレートおよびこれらの混合物を挙げることができる。
 多官能カルボン酸にグリシジル(メタ)アクリレート等の環状エーテル基とエチレン性不飽和基を有する化合物を反応させ得られる多官能(メタ)アクリレートなども挙げることができる。
 また、その他の好ましい重合性化合物として、特開2010-160418号公報、特開2010-129825号公報、特許第4364216号明細書等に記載される、フルオレン環を有し、エチレン性不飽和基を2官能以上有する化合物、カルド樹脂も使用することが可能である。
The polymerizable compound is also preferably a compound having at least one addition-polymerizable ethylene group and having an ethylenically unsaturated group having a boiling point of 100 ° C. or higher under normal pressure. Examples include monofunctional acrylates and methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, trimethylolethanetri ( (Meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, hexanediol ( (Meth) acrylate, trimethylolpropane tri (acryloyloxypropyl) ether, tri (acryloyloxyethyl) iso Polyfunctional alcohols such as nurate, glycerin and trimethylolethane added with ethylene oxide or propylene oxide and then (meth) acrylated, Japanese Patent Publication No. 48-41708, Japanese Patent Publication No. 50-6034, JP Urethane (meth) acrylates as described in JP-A-51-37193, polyester acrylates described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490 And polyfunctional acrylates and methacrylates such as epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid, and mixtures thereof.
A polyfunctional (meth) acrylate obtained by reacting a polyfunctional carboxylic acid with a compound having a cyclic ether group such as glycidyl (meth) acrylate and an ethylenically unsaturated group can also be used.
As other preferable polymerizable compounds, there are fluorene rings described in JP 2010-160418 A, JP 2010-129825 A, JP 4364216 A, etc., and ethylenically unsaturated groups. A compound having two or more functions, a cardo resin can also be used.
 また、常圧下で100℃以上の沸点を有し、少なくとも1個の付加重合可能なエチレン性不飽和基を持つ化合物としては、特開2008-292970号公報の段落番号[0254]~[0257]に記載の化合物も好適である。 As compounds having a boiling point of 100 ° C. or higher under normal pressure and having at least one addition-polymerizable ethylenically unsaturated group, paragraphs [0254] to [0257] of JP-A-2008-292970 are disclosed. Also suitable are the compounds described in.
 上記のほか、下記一般式(MO-1)~(MO-5)で表される、ラジカル重合性モノマーも好適に用いることができる。なお、式中、Tがオキシアルキレン基の場合には、炭素原子側の末端がRに結合する。 In addition to the above, radically polymerizable monomers represented by the following general formulas (MO-1) to (MO-5) can also be suitably used. In the formula, when T is an oxyalkylene group, the terminal on the carbon atom side is bonded to R.
Figure JPOXMLDOC01-appb-C000089
Figure JPOXMLDOC01-appb-C000089
Figure JPOXMLDOC01-appb-C000090
Figure JPOXMLDOC01-appb-C000090
 前記一般式において、nは0~14であり、mは1~8である。一分子内に複数存在するR、T、は、各々同一であっても、異なっていてもよい。
 前記一般式(MO-1)~(MO-5)で表される重合性化合物の各々において、複数存在するRの少なくとも1つは、-OC(=O)CH=CH2、または、-OC(=O)C(CH3)=CH2で表される基を表す。
 前記一般式(MO-1)~(MO-5)で表される重合性化合物の具体例としては、特開2007-269779号公報の段落番号0248~段落番号0251に記載されている化合物を本発明においても好適に用いることができる。
In the above general formula, n is 0 to 14, and m is 1 to 8. A plurality of R and T present in one molecule may be the same or different.
In each of the polymerizable compounds represented by the general formulas (MO-1) to (MO-5), at least one of a plurality of Rs is —OC (═O) CH═CH 2 or —OC A group represented by (═O) C (CH 3 ) ═CH 2 is represented.
Specific examples of the polymerizable compounds represented by the general formulas (MO-1) to (MO-5) include compounds described in paragraphs 0248 to 0251 of JP-A-2007-2699779. It can be suitably used in the invention.
 また、特開平10-62986号公報において一般式(1)および(2)としてその具体例と共に記載の前記多官能アルコールにエチレンオキサイドやプロピレンオキサイドを付加させた後に(メタ)アクリレート化した化合物も、重合性化合物として用いることができる。 Further, compounds obtained by adding (meth) acrylate after adding ethylene oxide or propylene oxide to the polyfunctional alcohol described in JP-A-10-62986 as general formulas (1) and (2) together with specific examples thereof are also provided. It can be used as a polymerizable compound.
 中でも、重合性化合物としては、ジペンタエリスリトールトリアクリレート(市販品としてはKAYARAD D-330;日本化薬株式会社製)、ジペンタエリスリトールテトラアクリレート(市販品としてはKAYARAD D-320;日本化薬株式会社製)ジペンタエリスリトールペンタ(メタ)アクリレート(市販品としてはKAYARAD D-310;日本化薬株式会社製)、ジペンタエリスリトールヘキサ(メタ)アクリレート(市販品としてはKAYARAD DPHA;日本化薬株式会社製、KAYARAD RP-1040;日本化薬株式会社製、A-DPH-12E;新中村化学社製)、およびこれらの(メタ)アクリロイル基がエチレングリコール、プロピレングリコール残基を介している構造が好ましい。これらのオリゴマータイプも使用できる。以下に好ましい重合性化合物の態様を示す。 Among them, as the polymerizable compound, dipentaerythritol triacrylate (KAYARAD D-330 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (KAYARAD D-320 as a commercial product); Nippon Kayaku Co., Ltd. Company-made) dipentaerythritol penta (meth) acrylate (as a commercial product, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (as a commercial product, KAYARAD DPHA; Nippon Kayaku Co., Ltd.) KAYARAD RP-1040 manufactured by Nippon Kayaku Co., Ltd., A-DPH-12E manufactured by Shin-Nakamura Chemical Co., Ltd.), and a structure in which these (meth) acryloyl groups are mediated by ethylene glycol and propylene glycol residues . These oligomer types can also be used. Preferred embodiments of the polymerizable compound are shown below.
 重合性化合物としては、多官能モノマーであって、カルボキシル基、スルホン酸基、リン酸基等の酸基を有していてもよい。エチレン性化合物が、上記のように混合物である場合のように未反応のカルボキシル基を有するものであれば、これをそのまま利用することができるが、必要において、上述のエチレン性化合物のヒドロキシル基に非芳香族カルボン酸無水物を反応させて酸基を導入してもよい。この場合、使用される非芳香族カルボン酸無水物の具体例としては、無水テトラヒドロフタル酸、アルキル化無水テトラヒドロフタル酸、無水ヘキサヒドロフタル酸、アルキル化無水ヘキサヒドロフタル酸、無水コハク酸、無水マレイン酸が挙げられる。 The polymerizable compound is a polyfunctional monomer and may have an acid group such as a carboxyl group, a sulfonic acid group, or a phosphoric acid group. If the ethylenic compound has an unreacted carboxyl group as in the case of a mixture as described above, this can be used as it is. Non-aromatic carboxylic acid anhydrides may be reacted to introduce acid groups. In this case, specific examples of the non-aromatic carboxylic acid anhydride used include tetrahydrophthalic anhydride, alkylated tetrahydrophthalic anhydride, hexahydrophthalic anhydride, alkylated hexahydrophthalic anhydride, succinic anhydride, anhydrous Maleic acid is mentioned.
 本発明において、酸基を有するモノマーとしては、脂肪族ポリヒドロキシ化合物と不飽和カルボン酸とのエステルであり、脂肪族ポリヒドロキシ化合物の未反応のヒドロキシル基に非芳香族カルボン酸無水物を反応させて酸基を持たせた多官能モノマーが好ましく、特に好ましくは、このエステルにおいて、脂肪族ポリヒドロキシ化合物がペンタエリスリトールおよび/またはジペンタエリスリトールであるものである。市販品としては、例えば、東亞合成株式会社製の多塩基酸変性アクリルオリゴマーとして、M-510、M-520などが挙げられる。 In the present invention, the monomer having an acid group is an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, and a non-aromatic carboxylic acid anhydride is reacted with an unreacted hydroxyl group of the aliphatic polyhydroxy compound. A polyfunctional monomer having an acid group is preferable, and in this ester, the aliphatic polyhydroxy compound is pentaerythritol and / or dipentaerythritol. Examples of commercially available products include M-510 and M-520 as polybasic acid-modified acrylic oligomers manufactured by Toagosei Co., Ltd.
 これらのモノマーは1種を単独で用いてもよいが、製造上、単一の化合物を用いることは難しいことから、2種以上を混合して用いてもよい。また、必要に応じてモノマーとして酸基を有しない多官能モノマーと酸基を有する多官能モノマーを併用してもよい。
 酸基を有する多官能モノマーの好ましい酸価としては、0.1~40mgKOH/gであり、特に好ましくは5~30mgKOH/gである。多官能モノマーの酸価が低すぎると現像溶解特性が落ち、高すぎると製造や取扱いが困難になり光重合性能が落ち、画素の表面平滑性等の硬化性が劣るものとなる。従って、異なる酸基の多官能モノマーを2種以上併用する場合、或いは酸基を有しない多官能モノマーを併用する場合、全体の多官能モノマーとしての酸価が上記範囲に入るように調整することが好ましい。
These monomers may be used alone, but since it is difficult to use a single compound in production, two or more kinds may be mixed and used. Moreover, you may use together the polyfunctional monomer which does not have an acid group as a monomer, and the polyfunctional monomer which has an acid group as needed.
A preferable acid value of the polyfunctional monomer having an acid group is 0.1 to 40 mgKOH / g, and particularly preferably 5 to 30 mgKOH / g. If the acid value of the polyfunctional monomer is too low, the developing dissolution properties are lowered, and if it is too high, the production and handling are difficult, the photopolymerization performance is lowered, and the curability such as the surface smoothness of the pixel is deteriorated. Therefore, when two or more polyfunctional monomers having different acid groups are used in combination, or when a polyfunctional monomer having no acid group is used in combination, the acid value of the entire polyfunctional monomer should be adjusted to be within the above range. Is preferred.
 また、重合性モノマーとして、カプロラクトン構造を有する多官能性単量体を含有することも好ましい態様である。
 カプロラクトン構造を有する多官能性単量体としては、その分子内にカプロラクトン構造を有する限り特に限定されるものではないが、例えば、トリメチロールエタン、ジトリメチロールエタン、トリメチロールプロパン、ジトリメチロールプロパン、ペンタエリスリトール、ジペンタエリスリトール、トリペンタエリスリトール、グリセリン、ジグリセロール、トリメチロールメラミン等の多価アルコールと、(メタ)アクリル酸およびε-カプロラクトンをエステル化することにより得られる、ε-カプロラクトン変性多官能(メタ)アクリレートを挙げることができる。なかでも下記一般式(Z-1)で表されるカプロラクトン構造を有する多官能性単量体が好ましい。
Moreover, it is also a preferable aspect to contain a polyfunctional monomer having a caprolactone structure as the polymerizable monomer.
The polyfunctional monomer having a caprolactone structure is not particularly limited as long as it has a caprolactone structure in the molecule. For example, trimethylolethane, ditrimethylolethane, trimethylolpropane, ditrimethylolpropane, penta Ε-caprolactone-modified polyfunctionality obtained by esterifying polyhydric alcohols such as erythritol, dipentaerythritol, tripentaerythritol, glycerin, diglycerol, trimethylolmelamine, (meth) acrylic acid and ε-caprolactone ( Mention may be made of (meth) acrylates. Among these, a polyfunctional monomer having a caprolactone structure represented by the following general formula (Z-1) is preferable.
Figure JPOXMLDOC01-appb-C000091
Figure JPOXMLDOC01-appb-C000091
 一般式(Z-1)中、6個のRは全てが下記一般式(Z-2)で表される基であるか、または6個のRのうち1~5個が下記一般式(Z-2)で表される基であり、残余が下記一般式(Z-3)で表される基である。 In the general formula (Z-1), all six R are groups represented by the following general formula (Z-2), or 1 to 5 of the six R are represented by the following general formula (Z -2), and the remainder is a group represented by the following general formula (Z-3).
Figure JPOXMLDOC01-appb-C000092
Figure JPOXMLDOC01-appb-C000092
 一般式(Z-2)中、R1は水素原子またはメチル基を示し、mは1または2の整数を示し、「*」は結合手であることを示す。 In general formula (Z-2), R 1 represents a hydrogen atom or a methyl group, m represents an integer of 1 or 2, and “*” represents a bond.
Figure JPOXMLDOC01-appb-C000093
Figure JPOXMLDOC01-appb-C000093
 一般式(Z-3)中、R1は水素原子またはメチル基を示し、「*」は結合手であることを示す。) In general formula (Z-3), R 1 represents a hydrogen atom or a methyl group, and “*” represents a bond. )
 このようなカプロラクトン構造を有する多官能性単量体は、例えば、日本化薬(株)からKAYARAD DPCAシリーズとして市販されており、DPCA-20(上記式(1)~(3)においてm=1、式(2)で表される基の数=2、R1が全て水素原子である化合物)、DPCA-30(同式、m=1、式(2)で表される基の数=3、R1が全て水素原子である化合物)、DPCA-60(同式、m=1、式(2)で表される基の数=6、R1が全て水素原子である化合物)、DPCA-120(同式においてm=2、式(2)で表される基の数=6、R1が全て水素原子である化合物)等を挙げることができる。
 本発明において、カプロラクトン構造を有する多官能性単量体は、単独でまたは2種以上を混合して使用することができる。
Such a polyfunctional monomer having a caprolactone structure is commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series, and DPCA-20 (m = 1 in the above formulas (1) to (3)). , Number of groups represented by formula (2) = 2, a compound in which R 1 is all hydrogen atoms, DPCA-30 (same formula, m = 1, number of groups represented by formula (2) = 3 , Compounds in which R 1 is all hydrogen atoms), DPCA-60 (formula, m = 1, number of groups represented by formula (2) = 6, compounds in which R 1 is all hydrogen atoms), DPCA- 120 (a compound in which m = 2 in the same formula, the number of groups represented by formula (2) = 6, and all R 1 are hydrogen atoms).
In this invention, the polyfunctional monomer which has a caprolactone structure can be used individually or in mixture of 2 or more types.
 また、本発明における特定モノマーとしては、下記一般式(Z-4)または(Z-5)で表される化合物の群から選択される少なくとも1種であることも好ましい。 In addition, the specific monomer in the present invention is preferably at least one selected from the group of compounds represented by the following general formula (Z-4) or (Z-5).
Figure JPOXMLDOC01-appb-C000094
Figure JPOXMLDOC01-appb-C000094
 前記一般式(Z-4)および(Z-5)中、Eは、それぞれ、-((CH2)yCH2O)-、または-((CH2)yCH(CH3)O)-を表し、yは、それぞれ0~10の整数を表し、Xは、それぞれ、アクリロイル基、メタクリロイル基、水素原子、またはカルボキシル基を表す。
 前記一般式(Z-4)中、アクリロイル基およびメタクリロイル基の合計は3個または4個であり、mはそれぞれ0~10の整数を表し、各mの合計は0~40の整数である。但し、各mの合計が0の場合、Xのうちいずれか1つはカルボキシル基である。
 前記一般式(ii)中、アクリロイル基およびメタクリロイル基の合計は5個または6個であり、nはそれぞれ0~10の整数を表し、各nの合計は0~60の整数である。但し、各nの合計が0の場合、Xのうちいずれか1つはカルボキシル基である。
In the general formulas (Z-4) and (Z-5), E represents — ((CH 2 ) yCH 2 O) — or — ((CH 2 ) yCH (CH 3 ) O) —, respectively. , Y each represents an integer of 0 to 10, and X represents an acryloyl group, a methacryloyl group, a hydrogen atom, or a carboxyl group, respectively.
In the general formula (Z-4), the total number of acryloyl groups and methacryloyl groups is 3 or 4, each m represents an integer of 0 to 10, and the total of each m is an integer of 0 to 40. However, when the total of each m is 0, any one of X is a carboxyl group.
In the general formula (ii), the total number of acryloyl groups and methacryloyl groups is 5 or 6, each n represents an integer of 0 to 10, and the total of each n is an integer of 0 to 60. However, when the total of each n is 0, any one of X is a carboxyl group.
 前記一般式(Z-4)中、mは、0~6の整数が好ましく、0~4の整数がより好ましい。
また、各mの合計は、2~40の整数が好ましく、2~16の整数がより好ましく、4~8の整数が特に好ましい。
 前記一般式(Z-5)中、nは、0~6の整数が好ましく、0~4の整数がより好ましい。
 また、各nの合計は、3~60の整数が好ましく、3~24の整数がより好ましく、6~12の整数が特に好ましい。
 また、一般式(Z-4)または一般式(Z-5)中の-((CH2)yCH2O)-または-((CH2)yCH(CH3)O)-は、酸素原子側の末端がXに結合する形態が好ましい。
In the general formula (Z-4), m is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
The total of each m is preferably an integer of 2 to 40, more preferably an integer of 2 to 16, and particularly preferably an integer of 4 to 8.
In the general formula (Z-5), n is preferably an integer of 0 to 6, and more preferably an integer of 0 to 4.
The total of each n is preferably an integer of 3 to 60, more preferably an integer of 3 to 24, and particularly preferably an integer of 6 to 12.
In general formula (Z-4) or general formula (Z-5), — ((CH 2 ) yCH 2 O) — or — ((CH 2 ) yCH (CH 3 ) O) — represents an oxygen atom side. A form in which the terminal of X is bonded to X is preferred.
 前記一般式(Z-4)または一般式(Z-5)で表される化合物は1種単独で用いてもよいし、2種以上併用してもよい。特に、一般式(ii)において、6個のX全てがアクリロイル基である形態が好ましい。 The compounds represented by the general formula (Z-4) or the general formula (Z-5) may be used alone or in combination of two or more. In particular, in the general formula (ii), a form in which all six Xs are acryloyl groups is preferable.
 また、一般式(Z-4)または一般式(Z-5)で表される化合物の重合性化合物中における全含有量としては、20質量%以上が好ましく、50質量%以上がより好ましい。 The total content of the compound represented by the general formula (Z-4) or the general formula (Z-5) in the polymerizable compound is preferably 20% by mass or more, and more preferably 50% by mass or more.
 前記一般式(Z-4)または一般式(Z-5)で表される化合物は、従来公知の工程である、ペンタエリスリト-ルまたはジペンタエリスリト-ルにエチレンオキシドまたはプロピレンオキシドを開環付加反応により開環骨格を結合する工程と、開環骨格の末端水酸基に、例えば(メタ)アクリロイルクロライドを反応させて(メタ)アクリロイル基を導入する工程と、から合成することができる。各工程は良く知られた工程であり、当業者は容易に一般式(i)または(ii)で表される化合物を合成することができる。 The compound represented by the general formula (Z-4) or the general formula (Z-5) is a conventionally known process, in which ethylene oxide or propylene oxide is opened to pentaerythritol or dipentaerythritol. It can be synthesized from a step of bonding a ring-opening skeleton by an addition reaction and a step of introducing a (meth) acryloyl group by reacting, for example, (meth) acryloyl chloride with a terminal hydroxyl group of the ring-opening skeleton. Each step is a well-known step, and a person skilled in the art can easily synthesize a compound represented by the general formula (i) or (ii).
 前記一般式(Z-4)または一般式(Z-5)で表される化合物の中でも、ペンタエリスリトール誘導体および/またはジペンタエリスリトール誘導体がより好ましい。
 具体的には、下記式(a)~(f)で表される化合物(以下、「例示化合物(a)~(f)」ともいう。)が挙げられ、中でも、例示化合物(a)、(b)、(e)、(f)が好ましい。
Among the compounds represented by the general formula (Z-4) or the general formula (Z-5), pentaerythritol derivatives and / or dipentaerythritol derivatives are more preferable.
Specific examples include compounds represented by the following formulas (a) to (f) (hereinafter also referred to as “exemplary compounds (a) to (f)”). Among them, exemplary compounds (a), (f) b), (e) and (f) are preferred.
Figure JPOXMLDOC01-appb-C000095
Figure JPOXMLDOC01-appb-C000095
Figure JPOXMLDOC01-appb-C000096
Figure JPOXMLDOC01-appb-C000096
 一般式(Z-4)、(Z-5)で表される重合性化合物の市販品としては、例えばサートマー社製のエチレンオキシ鎖を4個有する4官能アクリレートであるSR-494、日本化薬株式会社製のペンチレンオキシ鎖を6個有する6官能アクリレートであるDPCA-60、イソブチレンオキシ鎖を3個有する3官能アクリレートであるTPA-330などが挙げられる。 Examples of commercially available polymerizable compounds represented by the general formulas (Z-4) and (Z-5) include SR-494, a tetrafunctional acrylate having four ethyleneoxy chains manufactured by Sartomer, Nippon Kayaku Examples thereof include DPCA-60, which is a hexafunctional acrylate having six pentyleneoxy chains, and TPA-330, which is a trifunctional acrylate having three isobutyleneoxy chains.
 また、重合性化合物としては、特公昭48-41708号公報、特開昭51-37193号公報、特公平2-32293号公報、特公平2-16765号公報に記載されているようなウレタンアクリレート類や、特公昭58-49860号公報、特公昭56-17654号公報、特公昭62-39417号公報、特公昭62-39418号公報記載のエチレンオキサイド系骨格を有するウレタン化合物類も好適である。さらに、重合性化合物として、特開昭63-277653号公報、特開昭63-260909号公報、特開平1-105238号公報に記載される、分子内にアミノ構造やスルフィド構造を有する付加重合性化合物類を用いることによって、非常に感光スピードに優れた硬化性組成物を得ることができる。
 重合性化合物の市販品としては、ウレタンオリゴマーUAS-10、UAB-140(山陽国策パルプ社製)、UA-7200」(新中村化学社製、DPHA-40H(日本化薬社製)、UA-306H、UA-306T、UA-306I、AH-600、T-600、AI-600(共栄社製)、トリメチロールプロパントリアクリレート(市販品としてはA-TMPT;新中村化学社製)、などが挙げられる。
Examples of the polymerizable compound include urethane acrylates as described in JP-B-48-41708, JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765. Also suitable are urethane compounds having an ethylene oxide skeleton as described in JP-B-58-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418. Furthermore, addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238 are described as polymerizable compounds. By using the compounds, it is possible to obtain a curable composition having an extremely excellent photosensitive speed.
Commercially available polymerizable compounds include urethane oligomers UAS-10, UAB-140 (Sanyo Kokusaku Pulp Co., Ltd.), UA-7200 (Shin Nakamura Chemical Co., Ltd., DPHA-40H (Nippon Kayaku Co., Ltd.), UA- 306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha), trimethylolpropane triacrylate (commercially available products are A-TMPT; manufactured by Shin-Nakamura Chemical Co., Ltd.), etc. It is done.
 環状エーテル(エポキシ、オキセタン)としては、例えば、エポキシ基を有するものとしては、ビスフェノールA型エポキシ樹脂として、JER-827、JER-828、JER-834、JER-1001、JER-1002、JER-1003、JER-1055、JER-1007、JER-1009、JER-1010(以上、ジャパンエポキシレジン(株)製)、EPICLON860、EPICLON1050、EPICLON1051、EPICLON1055(以上、DIC(株)製)等であり、ビスフェノールF型エポキシ樹脂として、JER-806、JER-807、JER-4004、JER-4005、JER-4007、JER-4010(以上、ジャパンエポキシレジン(株)製)、EPICLON830、EPICLON835(以上、DIC(株)製)、LCE-21、RE-602S(以上、日本化薬(株)製)等であり、フェノールノボラック型エポキシ樹脂として、JER-152、JER-154、JER-157S70、JER-157S65、(以上、ジャパンエポキシレジン(株)製)、EPICLON N-740、EPICLON N-770、EPICLON N-775(以上、DIC(株)製)等であり、クレゾールノボラック型エポキシ樹脂として、EPICLON N-660、EPICLON N-665、EPICLON N-670、EPICLON N-673、EPICLON N-680、EPICLON N-690、EPICLON N-695(以上、DIC(株)製)、EOCN-1020(以上、日本化薬(株)製)、脂肪族エポキシ樹脂として、ADEKA RESIN EP-4080S、同EP-4085S、同EP-4088S(以上、(株)ADEKA製)セロキサイド2021P、セロキサイド2081、セロキサイド2083、セロキサイド2085、EHPE-3150(2,2-ビス(ヒドロキシメチル)-1-ブタノールの1,2-エポキシ-4-(2-オキシラニル)シクロヘキサン付加物)、EPOLEAD PB 3600、同PB 4700(以上、ダイセル化学工業(株)製)、デナコール EX-211L、EX-212L、EX-214L、EX-216L、EX-321L、EX-850L(以上、ナガセケムテックス(株)製)、ADEKA RESIN EP-4000S、同EP-4003S、同EP-4010S、同EP-4011S(以上、(株)ADEKA製)、NC-2000、NC-3000、NC-7300、XD-1000、EPPN-501、EPPN-502(以上、(株)ADEKA製)、JER-1031S(ジャパンエポキシレジン(株)製)等が挙げられる。このような重合性化合物は、ドライエッチング法でパターンを形成する場合に好適である。 Examples of the cyclic ether (epoxy, oxetane) include those having an epoxy group such as bisphenol A type epoxy resin, JER-827, JER-828, JER-834, JER-1001, JER-1002, JER-1003. , JER-1055, JER-1007, JER-1009, JER-1010 (manufactured by Japan Epoxy Resin Co., Ltd.), EPICLON 860, EPICLON 1050, EPICLON 1051, EPICLON 1055 (manufactured by DIC Corporation), etc., and bisphenol F As type epoxy resins, JER-806, JER-807, JER-4004, JER-4005, JER-4007, JER-4010 (above, manufactured by Japan Epoxy Resins Co., Ltd.), EPICLON83 EPICLON 835 (above, manufactured by DIC Corporation), LCE-21, RE-602S (above, manufactured by Nippon Kayaku Co., Ltd.), etc., and phenol novolac type epoxy resins such as JER-152, JER-154, JER -157S70, JER-157S65 (above, manufactured by Japan Epoxy Resin Co., Ltd.), EPICLON® N-740, EPICLON® N-770, EPICLON® N-775 (above, manufactured by DIC Corp.), etc. As resins, EPICLON N-660, EPICLON N-665, EPICLON N-670, EPICLON 、 N-673, EPICLON N-680, EPICLON N-690 (above, manufactured by DIC Corporation), EOCN-1020 (Below (Manufactured by Nippon Kayaku Co., Ltd.), as aliphatic epoxy resins, ADEKA RESIN EP-4080S, EP-4085S, EP-4088S (above, manufactured by ADEKA) Celoxide 2021P, Celoxide 2081, Celoxide 2083, Celoxide 2085, EHPE-3150 (1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct of 2,2-bis (hydroxymethyl) -1-butanol), EPOLEEAD PB 3600, PB 4700 (above, Daicel) Chemical Industry Co., Ltd.), Denacol® EX-211L, EX-212L, EX-214L, EX-216L, EX-321L, EX-850L (above, manufactured by Nagase ChemteX Corp.), ADEKA® RESIN® EP-4000S, EP-4003S, EP-4010S, EP 4011S (above, manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (above, manufactured by ADEKA Corporation), JER-1031S (Japan Epoxy) Resin Co., Ltd.). Such a polymerizable compound is suitable for forming a pattern by a dry etching method.
 これらの重合性化合物について、その構造、単独使用か併用か、添加量等の使用方法の詳細は、着色感光性樹脂組成物の最終的な性能設計にあわせて任意に設定できる。例えば、感度の観点では、1分子あたりの不飽和基含量が多い構造が好ましく、多くの場合は2官能以上が好ましい。また、着色感光性樹脂組成物により形成された硬化膜の強度を高める観点では、3官能以上のものがよく、さらに、異なる官能基数・異なる重合性基(例えばアクリル酸エステル、メタクリル酸エステル、スチレン系化合物、ビニルエーテル系化合物)のものを併用することで、感度と強度の両方を調節する方法も有効である。さらに、3官能以上のものでエチレンオキサイド鎖長の異なる重合性化合物を併用することが、着色感光性樹脂組成物の現像性を調節することができ、優れたパターン形成能が得られるという点で好ましい。
 また、本発明の組成物に含有される他の成分(例えば、光重合開始剤、被分散体、アルカリ可溶性樹脂等)との相溶性、分散性に対しても、重合性化合物の選択・使用法は重要な要因であり、例えば、低純度化合物の使用や2種以上の併用により相溶性を向上させうることがある。また、支持体などの硬質表面との密着性を向上させる観点で特定の構造を選択することもあり得る。
About these polymeric compounds, the details of usage methods, such as the structure, single use, combined use, and addition amount, can be arbitrarily set according to the final performance design of the colored photosensitive resin composition. For example, from the viewpoint of sensitivity, a structure having a high unsaturated group content per molecule is preferable, and in many cases, a bifunctional or higher functionality is preferable. Further, from the viewpoint of increasing the strength of the cured film formed from the colored photosensitive resin composition, those having three or more functional groups are preferable, and further, different functional groups / different polymerizable groups (for example, acrylic ester, methacrylate ester, styrene). It is also effective to adjust both sensitivity and strength by using a compound of a vinyl compound or a vinyl ether compound). Furthermore, in combination with tri- or more functional polymerizable compounds having different ethylene oxide chain lengths, the developability of the colored photosensitive resin composition can be adjusted, and an excellent pattern forming ability can be obtained. preferable.
In addition, selection and use of a polymerizable compound is also required for compatibility and dispersibility with other components (for example, a photopolymerization initiator, a dispersion, an alkali-soluble resin, etc.) contained in the composition of the present invention. The method is an important factor. For example, the compatibility may be improved by using a low-purity compound or using two or more kinds in combination. In addition, a specific structure may be selected from the viewpoint of improving adhesion to a hard surface such as a support.
 本発明の組成物が(G)重合性化合物を有する場合、重合性化合物の含有量は、組成物中の全固形分に対して5~40質量%が好ましく、5~30質量%がさらに好ましく、5~20質量%が特に好ましい。 When the composition of the present invention has (G) a polymerizable compound, the content of the polymerizable compound is preferably 5 to 40% by mass, more preferably 5 to 30% by mass with respect to the total solid content in the composition. 5 to 20% by mass is particularly preferable.
<<(H)側鎖に重合性二重結合を有する樹脂>>
 本発明では、さらに、必要に応じて側鎖に重合性二重結合を有する樹脂を含有させてもよい。側鎖に重合性二重結合を有する樹脂をさらに含有させることで、本発明の組成物をより効果的に硬化させることが可能となる。
<< (H) Resin having a polymerizable double bond in the side chain >>
In the present invention, if necessary, a resin having a polymerizable double bond in the side chain may be contained. By further containing a resin having a polymerizable double bond in the side chain, the composition of the present invention can be cured more effectively.
 (H)側鎖に重合性二重結合を有する樹脂としては、側鎖に重合性二重結合を有していれば特に制限はないが、2~6の水酸基を有する重合性モノマー(p)と、他の重合性モノマー(q)との共重合体(a)に、水酸基と反応可能な官能基とエチレン性不飽和二重結合を有する化合物(b)を反応させてなる樹脂であることが好ましい。 (H) The resin having a polymerizable double bond in the side chain is not particularly limited as long as it has a polymerizable double bond in the side chain, but the polymerizable monomer having 2 to 6 hydroxyl groups (p) And a copolymer (a) with other polymerizable monomer (q), a resin obtained by reacting a functional group capable of reacting with a hydroxyl group and a compound (b) having an ethylenically unsaturated double bond Is preferred.
 (H)側鎖に重合性二重結合を有する樹脂を構成する2~6の水酸基を有する重合性モノマー(p)は、2個以上6個以下の水酸基及びエチレン性不飽和二重結合を有する化合物であり、例えば下記一般式(1)で示されるモノマーを用いることができる。 (H) The polymerizable monomer having 2 to 6 hydroxyl groups constituting the resin having a polymerizable double bond in the side chain (p) has 2 to 6 hydroxyl groups and an ethylenically unsaturated double bond. For example, a monomer represented by the following general formula (1) can be used.
一般式(1)
Figure JPOXMLDOC01-appb-C000097
(式中、R1及びR4はそれぞれ水素原子、炭素数1~5の置換されてもよいアルキル基を表し、R2は炭素数1~4のアルキレン基を表し、R3は炭素数1~4のアルキレン基、または単結合を表し、nは2以上6以下の整数を表す。)
 上記一般式(1)で示されるモノマーとしては、エチレン性不飽和二重結合を有する多価アルコールのモノエステルなどが挙げられるが、好ましいのはグリセロールモノ(メタ)アクリレートである。
General formula (1)
Figure JPOXMLDOC01-appb-C000097
(Wherein R 1 and R 4 each represent a hydrogen atom or an optionally substituted alkyl group having 1 to 5 carbon atoms, R 2 represents an alkylene group having 1 to 4 carbon atoms, and R 3 represents 1 carbon atom) Represents an alkylene group of 1 to 4 or a single bond, and n represents an integer of 2 to 6.
Examples of the monomer represented by the general formula (1) include monoesters of polyhydric alcohols having an ethylenically unsaturated double bond, and glycerol mono (meth) acrylate is preferred.
 他の重合性モノマー(q)は、2~6の水酸基を有する重合性モノマー(p)と共重合可能な重合性モノマーであり、例えば、(メタ)アクリル酸、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、tert-ブチル(メタ)アクリレート、ベンジル(メタ)アクリレート、フェニル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、テトラヒドロフルフリル(メタ)アクリレート等の(メタ)アクリル酸エステル類;N-ビニルピロリドン;スチレンおよびその誘導体、α-メチルスチレン等のスチレン類;(メタ)アクリルアミド、メチロール(メタ)アクリルアミド、アルコキシメチロール(メタ)アクリルアミド、ジアセトン(メタ)アクリルアミド等のアクリルアミド類;(メタ)アクリロニトリル、エチレン、プロピレン、ブチレン、塩化ビニル、酢酸ビニル等のその他のビニル化合物、およびポリメチルメタクリレートマクロモノマー、ポリスチレンマクロモノマーなどのマクロモノマー類などが挙げられる。これらのモノマーは、1種を単独で、または2種以上を混合して用いることができる。 The other polymerizable monomer (q) is a polymerizable monomer copolymerizable with the polymerizable monomer (p) having 2 to 6 hydroxyl groups. For example, (meth) acrylic acid, methyl (meth) acrylate, ethyl ( (Meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, benzyl (meth) acrylate, phenyl (meth) acrylate, cyclohexyl ( (Meth) acrylates such as (meth) acrylate, phenoxyethyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, isobornyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, etc. N-vinylpyrrolidone; styrene and its derivatives, styrenes such as α-methylstyrene; acrylamides such as (meth) acrylamide, methylol (meth) acrylamide, alkoxymethylol (meth) acrylamide, diacetone (meth) acrylamide; Examples include (meth) acrylonitrile, other vinyl compounds such as ethylene, propylene, butylene, vinyl chloride, and vinyl acetate, and macromonomers such as polymethyl methacrylate macromonomer and polystyrene macromonomer. These monomers can be used individually by 1 type or in mixture of 2 or more types.
 また、2~6の水酸基を有する重合性モノマー(p)と他の重合性モノマー(q)との共重合比は、5~95重量%:95~5重量%であることが好ましく、30~70重量%:70~30重量%であることがより好ましい。重合性モノマー(p)の共重合比が5重量%未満の場合は、導入できるエチレン性不飽和二重結合の数が少なく、二重結合当量の数値が大きくなり、十分な感度を得ることができない。95重量%を越える場合は、多くのエチレン性不飽和二重結合を導入することが可能となるが、重合性モノマー(q)の比率が低くなるため、分散安定性、溶解性、耐薬品性等の物性を維持することが困難となる。 The copolymerization ratio of the polymerizable monomer (p) having 2 to 6 hydroxyl groups and the other polymerizable monomer (q) is preferably 5 to 95% by weight: 95 to 5% by weight, 70% by weight: More preferably, it is 70 to 30% by weight. When the copolymerization ratio of the polymerizable monomer (p) is less than 5% by weight, the number of ethylenically unsaturated double bonds that can be introduced is small, the double bond equivalent value is large, and sufficient sensitivity can be obtained. Can not. When it exceeds 95% by weight, it is possible to introduce many ethylenically unsaturated double bonds, but since the ratio of the polymerizable monomer (q) is low, the dispersion stability, solubility, and chemical resistance are reduced. It becomes difficult to maintain physical properties such as these.
 2~6の水酸基を有する重合性モノマー(p)と、他の重合性モノマー(q)との共重合体(a)の製造は、公知の方法で製造することができ、例えば特開2005-156930号公報の段落0013の記載を参酌でき、この内容は本明細書に組み込まれる。 A copolymer (a) of a polymerizable monomer (p) having 2 to 6 hydroxyl groups and another polymerizable monomer (q) can be produced by a known method. No. 156930, paragraph 0013 can be referred to, the contents of which are incorporated herein.
 (H)側鎖に重合性二重結合を有する樹脂は、前記共重合体(a)に、水酸基と反応可能な官能基とエチレン性不飽和二重結合を有する化合物(b)を反応させることにより得られる。水酸基と反応可能な官能基とエチレン性不飽和二重結合を有する化合物(b)としては、イソシアネート基、カルボキシル基等が挙げられるが、特に反応性の点でイソシアネート基が好ましい。
 イソシアネート基及びエチレン性不飽和二重結合を有する化合物として具体的には、2-アクリロイルエチルイソシアネート、2-メタクリロイルエチルイソシアネート等が挙げられる。また、カルボキシル基及びエチレン性不飽和二重結合を有する化合物として具体的には、アクリル酸、メタクリル酸、無水マレイン酸が挙げられる。
(H) The resin having a polymerizable double bond in the side chain is obtained by reacting the copolymer (a) with a functional group capable of reacting with a hydroxyl group and a compound (b) having an ethylenically unsaturated double bond. Is obtained. Examples of the compound (b) having a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond include an isocyanate group and a carboxyl group, and an isocyanate group is particularly preferred from the viewpoint of reactivity.
Specific examples of the compound having an isocyanate group and an ethylenically unsaturated double bond include 2-acryloylethyl isocyanate and 2-methacryloylethyl isocyanate. Specific examples of the compound having a carboxyl group and an ethylenically unsaturated double bond include acrylic acid, methacrylic acid, and maleic anhydride.
 共重合体(a)に水酸基を介して導入されるエチレン性不飽和二重結合の量は、得られる樹脂の「エチレン性不飽和二重結合当量」により示される。 ここで得られる樹脂のエチレン性不飽和二重結合当量は200~2,000であることが好ましく、300~900であることがより好ましい。樹脂の二重結合当量が200未満の場合は、エチレン性不飽和二重結合を導入させる重合性モノマー(p)の比率が高くなり、諸特性を維持するのに十分な量の重合性モノマー(q)を共重合させることができない。2,000を越える場合は、エチレン性不飽和二重結合の数が少ないため十分な感度を得ることができない。
 また、前記(H)樹脂の重量平均分子量(Mw)は、本発明の組成物の分散性が良好な点から、好ましくは2000~200000、より好ましくは5000~50000である。
The amount of the ethylenically unsaturated double bond introduced into the copolymer (a) via a hydroxyl group is indicated by the “ethylenically unsaturated double bond equivalent” of the resulting resin. The ethylenically unsaturated double bond equivalent of the resin obtained here is preferably 200 to 2,000, and more preferably 300 to 900. When the double bond equivalent of the resin is less than 200, the ratio of the polymerizable monomer (p) for introducing the ethylenically unsaturated double bond is increased, and a sufficient amount of the polymerizable monomer (for maintaining various properties) ( q) cannot be copolymerized. When it exceeds 2,000, sufficient sensitivity cannot be obtained because the number of ethylenically unsaturated double bonds is small.
The weight average molecular weight (Mw) of the (H) resin is preferably 2000 to 200000, more preferably 5000 to 50000, from the viewpoint of good dispersibility of the composition of the present invention.
 共重合体(a)と、水酸基と反応可能な官能基とエチレン性不飽和二重結合を有する化合物(b)との反応は、公知の方法で行うことができ、例えば特開2005-156930号公報の段落0016の記載を参酌でき、この内容は本明細書に組み込まれる。 The reaction between the copolymer (a) and the compound (b) having a functional group capable of reacting with a hydroxyl group and an ethylenically unsaturated double bond can be carried out by a known method, for example, JP-A-2005-156930. Reference can be made to the description of paragraph 0016 of the publication, the contents of which are incorporated herein.
 本発明の組成物が(H)側鎖に重合性二重結合を有する樹脂を含有する場合、(H)側鎖に重合性二重結合を有する樹脂の含有量は、樹脂成分100質量部に対して、30~100質量%が好ましく、より好ましくは40~90質量%であり、さらに好ましくは50~80質量%である。
 (H)側鎖に重合性二重結合を有する樹脂は、本発明の組成物中に1種のみ含まれていても良いし、2種以上含まれていても良い。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
When the composition of the present invention contains (H) a resin having a polymerizable double bond in the side chain, (H) the content of the resin having a polymerizable double bond in the side chain is 100 parts by mass of the resin component. On the other hand, the content is preferably 30 to 100% by mass, more preferably 40 to 90% by mass, and further preferably 50 to 80% by mass.
(H) One type of resin having a polymerizable double bond in the side chain may be contained in the composition of the present invention, or two or more types may be contained. When two or more types are included, the total amount is preferably within the above range.
-有機溶剤-
 本発明の組成物は、有機溶剤を含有してもよい。
 有機溶剤は、各成分の溶解性や着色感光性樹脂組成物の塗布性を満足すれば基本的には特に制限はないが、特に紫外線吸収剤、アルカリ可溶性樹脂や分散剤等の溶解性、塗布性、安全性を考慮して選ばれることが好ましい。また、本発明における組成物を調製する際には、少なくとも2種類の有機溶剤を含むことが好ましい。
-Organic solvent-
The composition of the present invention may contain an organic solvent.
The organic solvent is basically not particularly limited as long as the solubility of each component and the coating property of the colored photosensitive resin composition are satisfied, but in particular, the solubility and coating of ultraviolet absorbers, alkali-soluble resins and dispersants, etc. Is preferably selected in consideration of safety and safety. Moreover, when preparing the composition in this invention, it is preferable that at least 2 type of organic solvent is included.
 有機溶剤としては、エステル類として、例えば、酢酸エチル、酢酸-n-ブチル、酢酸イソブチル、ギ酸アミル、酢酸イソアミル、酢酸イソブチル、プロピオン酸ブチル、酪酸イソプロピル、酪酸エチル、酪酸ブチル、乳酸メチル、乳酸エチル、オキシ酢酸アルキル(例:オキシ酢酸メチル、オキシ酢酸エチル、オキシ酢酸ブチル(例えば、メトキシ酢酸メチル、メトキシ酢酸エチル、メトキシ酢酸ブチル、エトキシ酢酸メチル、エトキシ酢酸エチル等))、3-オキシプロピオン酸アルキルエステル類(例:3-オキシプロピオン酸メチル、3-オキシプロピオン酸エチル等(例えば、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル等))、2-オキシプロピオン酸アルキルエステル類(例:2-オキシプロピオン酸メチル、2-オキシプロピオン酸エチル、2-オキシプロピオン酸プロピル等(例えば、2-メトキシプロピオン酸メチル、2-メトキシプロピオン酸エチル、2-メトキシプロピオン酸プロピル、2-エトキシプロピオン酸メチル、2-エトキシプロピオン酸エチル))、2-オキシ-2-メチルプロピオン酸メチルおよび2-オキシ-2-メチルプロピオン酸エチル(例えば、2-メトキシ-2-メチルプロピオン酸メチル、2-エトキシ-2-メチルプロピオン酸エチル等)、ピルビン酸メチル、ピルビン酸エチル、ピルビン酸プロピル、アセト酢酸メチル、アセト酢酸エチル、2-オキソブタン酸メチル、2-オキソブタン酸エチル等、並びに、エーテル類として、例えば、ジエチレングリコールジメチルエーテル、テトラヒドロフラン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、メチルセロソルブアセテート、エチルセロソルブアセテート、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート等、並びに、ケトン類として、例えば、メチルエチルケトン、シクロヘキサノン、2-ヘプタノン、3-ヘプタノン等、並びに、芳香族炭化水素類として、例えば、トルエン、キシレン等が好適に挙げられる。 Examples of organic solvents include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and ethyl lactate. , Alkyl oxyacetates (eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate)), alkyl 3-oxypropionate Esters (eg, methyl 3-oxypropionate, ethyl 3-oxypropionate, etc. (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.) )) 2 Oxypropionic acid alkyl esters (eg, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc. (eg, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2-methoxy) Propyl propionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), methyl 2-oxy-2-methylpropionate and ethyl 2-oxy-2-methylpropionate (for example, 2-methoxy-2- Methyl methyl propionate, ethyl 2-ethoxy-2-methylpropionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, etc. And ethers For example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether Acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate and the like, and ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-heptanone, and aromatic hydrocarbons such as Tolue And xylene are preferable.
 これらの有機溶剤は、紫外線吸収剤およびアルカリ可溶性樹脂の溶解性、塗布面状の改良などの観点から、2種以上を混合することも好ましい。この場合、特に好ましくは、上記の3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エチルセロソルブアセテート、乳酸エチル、ジエチレングリコールジメチルエーテル、酢酸ブチル、3-メトキシプロピオン酸メチル、2-ヘプタノン、シクロヘキサノン、エチルカルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールメチルエーテル、およびプロピレングリコールメチルエーテルアセテートから選択される2種以上で構成される混合溶液である。 These organic solvents are preferably mixed in two or more types from the viewpoints of solubility of the ultraviolet absorber and the alkali-soluble resin, improvement of the coated surface, and the like. In this case, particularly preferably, the above-mentioned methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl It is a mixed solution composed of two or more selected from carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, and propylene glycol methyl ether acetate.
 有機溶剤の組成物中における含有量は、塗布性の観点から、組成物の全固形分濃度が5~80質量%になる量とすることが好ましく、5~60質量%がさらに好ましく、10~50質量%が特に好ましい。 The content of the organic solvent in the composition is preferably such that the total solid concentration of the composition is 5 to 80% by mass, more preferably 5 to 60% by mass, from the viewpoint of applicability. 50% by mass is particularly preferred.
-架橋剤-
 本発明の組成物に補足的に架橋剤を用い、組成物を硬化させてなる硬化膜の硬度をより高めることもできる。
 架橋剤としては、架橋反応により膜硬化を行なえるものであれば、特に限定はなく、例えば、(a)エポキシ樹脂、(b)メチロール基、アルコキシメチル基、およびアシロキシメチル基から選ばれる少なくとも1種の置換基で置換された、メラミン化合物、グアナミン化合物、グリコールウリル化合物またはウレア化合物、(c)メチロール基、アルコキシメチル基、およびアシロキシメチル基から選ばれる少なくとも1種の置換基で置換された、フェノール化合物、ナフトール化合物またはヒドロキシアントラセン化合物、が挙げられる。中でも、多官能エポキシ樹脂が好ましい。
 架橋剤の具体例などの詳細については、特開2004-295116号公報の段落0134~0147の記載を参照することができる。
 本発明の組成物中に架橋剤を含有する場合、架橋剤の配合量は、特に定めるものではないが、組成物の全固形分の2~30質量%が好ましく、3~20質量%がより好ましい。
 本発明の組成物は、架橋剤を、1種類のみを含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
-Crosslinking agent-
It is also possible to supplement the composition of the present invention with a crosslinking agent to further increase the hardness of a cured film obtained by curing the composition.
The crosslinking agent is not particularly limited as long as the film can be cured by a crosslinking reaction. For example, at least selected from (a) an epoxy resin, (b) a methylol group, an alkoxymethyl group, and an acyloxymethyl group. Substituted with at least one substituent selected from a melamine compound, a guanamine compound, a glycoluril compound or a urea compound, (c) a methylol group, an alkoxymethyl group, and an acyloxymethyl group substituted with one kind of substituent In addition, a phenol compound, a naphthol compound, or a hydroxyanthracene compound can be used. Of these, polyfunctional epoxy resins are preferred.
For details such as specific examples of the crosslinking agent, the description in paragraphs 0134 to 0147 of JP-A No. 2004-295116 can be referred to.
When the composition of the present invention contains a crosslinking agent, the blending amount of the crosslinking agent is not particularly defined, but is preferably 2 to 30% by mass, more preferably 3 to 20% by mass, based on the total solid content of the composition. preferable.
The composition of the present invention may contain only one type of cross-linking agent, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
-重合禁止剤-
 本発明の組成物においては、前記組成物の製造中または保存中において、重合性化合物の不要な熱重合を阻止するために、少量の重合禁止剤を添加することが望ましい。
 本発明に用いうる重合禁止剤としては、ハイドロキノン、p-メトキシフェノール、ジ-tert-ブチル-p-クレゾール、ピロガロール、tert-ブチルカテコール、ベンゾキノン、4,4’-チオビス(3-メチル-6-tert-ブチルフェノール)、2,2’-メチレンビス(4-メチル-6-tert-ブチルフェノール)、N-ニトロソフェニルヒドロキシアミン第一セリウム塩等が挙げられる。
 本発明の組成物中に重合禁止剤を含有する場合、重合禁止剤の添加量は、全組成物の質量に対して、約0.01~約5質量%が好ましい。
 本発明の組成物は、重合禁止剤を、1種類のみを含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
-Polymerization inhibitor-
In the composition of the present invention, it is desirable to add a small amount of a polymerization inhibitor in order to prevent unnecessary thermal polymerization of the polymerizable compound during the production or storage of the composition.
Examples of the polymerization inhibitor that can be used in the present invention include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6- tert-butylphenol), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt and the like.
When a polymerization inhibitor is contained in the composition of the present invention, the addition amount of the polymerization inhibitor is preferably about 0.01 to about 5% by mass with respect to the mass of the whole composition.
The composition of the present invention may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more types are included, the total amount is preferably within the above range.
-界面活性剤-
 本発明の組成物には、塗布性をより向上させる観点から、各種の界面活性剤を添加してもよい。界面活性剤としては、フッ素系界面活性剤、ノニオン系界面活性剤、カチオン系界面活性剤、アニオン系界面活性剤、シリコーン系界面活性剤などの各種界面活性剤を使用できる。
-Surfactant-
Various surfactants may be added to the composition of the present invention from the viewpoint of further improving coatability. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
 特に、本発明の組成物は、フッ素系界面活性剤を含有することで、塗布液として調製したときの液特性(特に、流動性)がより向上することから、塗布厚の均一性や省液性をより改善することができる。
 即ち、フッ素系界面活性剤を含有する組成物を適用した塗布液を用いて膜形成する場合においては、被塗布面と塗布液との界面張力を低下させることにより、被塗布面への濡れ性が改善され、被塗布面への塗布性が向上する。このため、少量の液量で数μm程度の薄膜を形成した場合であっても、厚みムラの小さい均一厚の膜形成をより好適に行える点で有効である。
In particular, since the composition of the present invention contains a fluorosurfactant, the liquid properties (particularly fluidity) when prepared as a coating liquid are further improved. Sex can be improved more.
That is, when a film is formed using a coating liquid to which a composition containing a fluorosurfactant is applied, the wettability to the coated surface is reduced by reducing the interfacial tension between the coated surface and the coating liquid. Is improved, and the coating property to the coated surface is improved. For this reason, even when a thin film of about several μm is formed with a small amount of liquid, it is effective in that it is possible to more suitably form a film having a uniform thickness with small thickness unevenness.
 フッ素系界面活性剤中のフッ素含有率は、3~40質量%が好適であり、より好ましくは5~30質量%であり、特に好ましくは7~25質量%である。フッ素含有率がこの範囲内であるフッ素系界面活性剤は、塗布膜の厚さの均一性や省液性の点で効果的であり、組成物中における溶解性も良好である。 The fluorine content in the fluorosurfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. A fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of coating film thickness and liquid-saving properties, and has good solubility in the composition.
 フッ素系界面活性剤としては、例えば、メガファックF171、同F172、同F173、同F176、同F177、同F141、同F142、同F143、同F144、同R30、同F437、同F475、同F479、同F482、同F554、同F780、同F781(以上、DIC(株)製)、フロラードFC430、同FC431、同FC171(以上、住友スリーエム(株)製)、サーフロンS-382、同SC-101、同SC-103、同SC-104、同SC-105、同SC1068、同SC-381、同SC-383、同S393、同KH-40(以上、旭硝子(株)製)等が挙げられる。 Examples of the fluorosurfactant include Megafac F171, F172, F173, F176, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780, F780, F781 (above DIC Corporation), Florard FC430, FC431, FC171 (above, Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC1068, SC-381, SC-383, S393, KH-40 (above, manufactured by Asahi Glass Co., Ltd.) and the like.
 ノニオン系界面活性剤として具体的には、グリセロール、トリメチロールプロパン、トリメチロールエタン並びにそれらのエトキシレートおよびプロポキシレート(例えば、グリセロールプロポキシレート、グリセリンエトキシレート等)、ポリオキシエチレンラウリルエーテル、ポリオキシエチレンステアリルエーテル、ポリオキシエチレンオレイルエーテル、ポリオキシエチレンオクチルフェニルエーテル、ポリオキシエチレンノニルフェニルエーテル、ポリエチレングリコールジラウレート、ポリエチレングリコールジステアレート、ソルビタン脂肪酸エステル(BASF社製のプルロニックL10、L31、L61、L62、10R5、17R2、25R2、テトロニック304、701、704、901、904、150R1)、ソルスパース20000(日本ルーブリゾール(株))等が挙げられる。 Specific examples of the nonionic surfactant include glycerol, trimethylolpropane, trimethylolethane, and ethoxylates and propoxylates thereof (for example, glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene Stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester (Pluronic L10, L31, L61, L62 manufactured by BASF, 10R5, 17R2, 25R2, Tetronic 304, 701, 704, 901, 904, 150R1) Solsperse 20000 (Lubrizol Japan Co., Ltd.), and the like.
 カチオン系界面活性剤として具体的には、フタロシアニン誘導体(商品名:EFKA-745、森下産業(株)製)、オルガノシロキサンポリマーKP341(信越化学工業(株)製)、(メタ)アクリル酸系(共)重合体ポリフローNo.75、No.90、No.95(共栄社化学(株)製)、W001(裕商(株)製)等が挙げられる。 Specific examples of the cationic surfactant include phthalocyanine derivatives (trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.), organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 (manufactured by Kyoeisha Chemical Co., Ltd.) and W001 (manufactured by Yusho Co., Ltd.).
 アニオン系界面活性剤として具体的には、W004、W005、W017(裕商(株)社製)等が挙げられる。 Specific examples of anionic surfactants include W004, W005, W017 (manufactured by Yusho Co., Ltd.) and the like.
 シリコーン系界面活性剤としては、例えば、東レ・ダウコーニング(株)製「トーレシリコーンDC3PA」、「トーレシリコーンSH7PA」、「トーレシリコーンDC11PA」,「トーレシリコーンSH21PA」,「トーレシリコーンSH28PA」、「トーレシリコーンSH29PA」、「トーレシリコーンSH30PA」、「トーレシリコーンSH8400」、モメンティブ・パフォーマンス・マテリアルズ社製「TSF-4440」、「TSF-4300」、「TSF-4445」、「TSF-4460」、「TSF-4452」、信越シリコーン株式会社製「KP341」、「KF6001」、「KF6002」、ビックケミー社製「BYK307」、「BYK323」、「BYK330」等が挙げられる。
 界面活性剤は、1種のみを用いてもよいし、2種類以上を組み合わせてもよい。
 本発明の組成物に界面活性剤を含有する場合、界面活性剤の添加量は、組成物の全質量に対して、0.001~2.0質量%が好ましく、より好ましくは0.005~1.0質量%である。
 本発明の組成物は、界面活性剤を、1種類のみを含んでいてもよいし、2種類以上含んでいてもよい。2種類以上含む場合は、その合計量が上記範囲となることが好ましい。
Examples of the silicone surfactant include “Toray Silicone DC3PA”, “Toray Silicone SH7PA”, “Toray Silicone DC11PA”, “Tore Silicone SH21PA”, “Tore Silicone SH28PA”, “Toray Silicone” manufactured by Toray Dow Corning Co., Ltd. Silicone SH29PA, Torre Silicone SH30PA, Torre Silicone SH8400, Momentive Performance Materials TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF -4552 "," KP341 "," KF6001 "," KF6002 "manufactured by Shin-Etsu Silicone Co., Ltd.," BYK307 "," BYK323 "," BYK330 "manufactured by BYK Chemie.
Only one type of surfactant may be used, or two or more types may be combined.
When a surfactant is contained in the composition of the present invention, the addition amount of the surfactant is preferably 0.001 to 2.0% by mass, more preferably 0.005 to 2.0% by mass with respect to the total mass of the composition. 1.0% by mass.
The composition of the present invention may contain only one type of surfactant or two or more types of surfactant. When two or more types are included, the total amount is preferably within the above range.
-その他の添加物-
 本発明の組成物には、必要に応じて、各種添加物、例えば、充填剤、密着促進剤、酸化防止剤、紫外線吸収剤、凝集防止剤等を配合することができる。これらの添加物としては、特開2004-295116号公報の段落0155~0156に記載のものを挙げることができる。
 本発明の組成物においては、特開2004-295116号公報の段落0078に記載の増感剤や光安定剤、同公報の段落0081に記載の熱重合防止剤を含有することができる。
 紫外線吸収剤としては、具体的に以下の化合物を用いることが好ましい。
Figure JPOXMLDOC01-appb-C000098
-Other additives-
Various additives, for example, fillers, adhesion promoters, antioxidants, ultraviolet absorbers, anti-aggregation agents, and the like can be blended with the composition of the present invention as necessary. Examples of these additives include those described in paragraphs 0155 to 0156 of JP-A No. 2004-295116.
The composition of the present invention may contain a sensitizer and a light stabilizer described in paragraph 0078 of JP-A No. 2004-295116, and a thermal polymerization inhibitor described in paragraph 0081 of the same publication.
Specifically, the following compounds are preferably used as the ultraviolet absorber.
Figure JPOXMLDOC01-appb-C000098
--有機カルボン酸、有機カルボン酸無水物--
 本発明の組成物は、分子量1000以下の有機カルボン酸、および/または有機カルボン酸無水物を含有していてもよい。
 有機カルボン酸化合物としては、具体的には、脂肪族カルボン酸または芳香族カルボン酸が挙げられる。脂肪族カルボン酸としては、例えば、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸、ピバル酸、カプロン酸、グリコール酸、アクリル酸、メタクリル酸等のモノカルボン酸、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、シクロヘキサンジカルボン酸、シクロヘキセンジカルボン酸、イタコン酸、シトラコン酸、マレイン酸、フマル酸等のジカルボン酸、トリカルバリル酸、アコニット酸等のトリカルボン酸等が挙げられる。また、芳香族カルボン酸としては、例えば、安息香酸、フタル酸等のフェニル基に直接カルボキシル基が結合したカルボン酸、およびフェニル基から炭素結合を介してカルボキシル基が結合したカルボン酸類が挙げられる。これらの中では、特に分子量600以下、とりわけ分子量50~500のもの、具体的には、例えば、マレイン酸、マロン酸、コハク酸、イタコン酸が好ましい。
--- Organic carboxylic acid, organic carboxylic anhydride--
The composition of the present invention may contain an organic carboxylic acid having a molecular weight of 1000 or less and / or an organic carboxylic acid anhydride.
Specific examples of the organic carboxylic acid compound include aliphatic carboxylic acids and aromatic carboxylic acids. Examples of aliphatic carboxylic acids include monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, glycolic acid, acrylic acid, methacrylic acid, oxalic acid, malonic acid, succinic acid, Examples thereof include dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, cyclohexanedicarboxylic acid, cyclohexenedicarboxylic acid, itaconic acid, citraconic acid, maleic acid and fumaric acid, and tricarboxylic acids such as tricarbaryl acid and aconitic acid. Examples of the aromatic carboxylic acid include carboxylic acids in which a carboxyl group is directly bonded to a phenyl group such as benzoic acid and phthalic acid, and carboxylic acids in which a carboxyl group is bonded to the phenyl group through a carbon bond. Of these, those having a molecular weight of 600 or less, particularly those having a molecular weight of 50 to 500, specifically maleic acid, malonic acid, succinic acid, and itaconic acid are preferred.
 有機カルボン酸無水物としては、例えば、脂肪族カルボン酸無水物、芳香族カルボン酸無水物が挙げられ、具体的には、例えば、無水酢酸、無水トリクロロ酢酸、無水トリフルオロ酢酸、無水テトラヒドロフタル酸、無水コハク酸、無水マレイン酸、無水シトラコン酸、無水イタコン酸、無水グルタル酸、無水1,2-シクロヘキセンジカルボン酸、無水n-オクタデシルコハク酸、無水5-ノルボルネン-2,3-ジカルボン酸等の脂肪族カルボン酸無水物が挙げられる。芳香族カルボン酸無水物としては、例えば、無水フタル酸、トリメリット酸無水物、ピロメリット酸無水物、無水ナフタル酸等が挙げられる。これらの中では、特に分子量600以下、とりわけ分子量50~500のもの、具体的には、例えば、無水マレイン酸、無水コハク酸、無水シトラコン酸、無水イタコン酸が好ましい。 Examples of organic carboxylic acid anhydrides include aliphatic carboxylic acid anhydrides and aromatic carboxylic acid anhydrides. Specific examples include acetic anhydride, trichloroacetic anhydride, trifluoroacetic anhydride, and tetrahydrophthalic anhydride. Succinic anhydride, maleic anhydride, citraconic anhydride, itaconic anhydride, glutaric anhydride, 1,2-cyclohexene dicarboxylic anhydride, n-octadecyl succinic anhydride, 5-norbornene-2,3-dicarboxylic anhydride, etc. An aliphatic carboxylic acid anhydride is mentioned. Examples of the aromatic carboxylic acid anhydride include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and naphthalic anhydride. Of these, those having a molecular weight of 600 or less, particularly those having a molecular weight of 50 to 500, specifically maleic anhydride, succinic anhydride, citraconic anhydride, and itaconic anhydride are preferred.
 本発明の組成物に有機カルボン酸、有機カルボン酸無水物を含有する場合、これらの有機カルボン酸および/または有機カルボン酸無水物の添加量は、通常、全固形分中0.01~10重量%、好ましくは0.03~5重量%、より好ましくは0.05~3重量%の範囲である。
 これら分子量1000以下の有機カルボン酸、および/または有機カルボン酸無水物を添加することによって、高いパターン密着性を保ちながら、組成物の未溶解物の残存をより一層低減することが可能である。
When the composition of the present invention contains an organic carboxylic acid and an organic carboxylic acid anhydride, the amount of these organic carboxylic acid and / or organic carboxylic acid anhydride is usually 0.01 to 10% by weight in the total solid content. %, Preferably 0.03 to 5% by weight, more preferably 0.05 to 3% by weight.
By adding these organic carboxylic acids and / or organic carboxylic acid anhydrides having a molecular weight of 1000 or less, it is possible to further reduce the remaining undissolved material of the composition while maintaining high pattern adhesion.
<着色感光性樹脂組成物の調製方法>
 本発明の組成物は、前述の成分を混合することで調製される。
 なお、組成物の調製に際しては、組成物を構成する各成分を一括配合してもよいし、各成分を溶剤に溶解・分散した後に逐次配合してもよい。また、配合する際の投入順序や作業条件は特に制約を受けない。例えば、全成分を同時に溶剤に溶解・分散して組成物を調製してもよいし、必要に応じては、各成分を適宜2つ以上の溶液・分散液としておいて、使用時(塗布時)にこれらを混合して組成物として調製してもよい。
<Preparation method of colored photosensitive resin composition>
The composition of the present invention is prepared by mixing the aforementioned components.
In preparing the composition, the components constituting the composition may be combined at once, or may be sequentially combined after each component is dissolved and dispersed in a solvent. In addition, there are no particular restrictions on the charging order and working conditions when blending. For example, the composition may be prepared by dissolving and dispersing all components in a solvent at the same time. If necessary, each component may be suitably used as two or more solutions / dispersions at the time of use (at the time of application). ) May be mixed to prepare a composition.
 本発明では、顔料を分散剤で分散させた後、他の成分と配合することが好ましい。顔料の分散は、(A)顔料を分散剤で分散させた分散液と、(B)顔料を分散剤で分散させた分散液とを混合することで分散させることができる。
 上記のようにして調製された組成物は、好ましくは、孔径0.01~3.0μm、より好ましくは孔径0.05~0.5μm程度のフィルタなどを用いて濾別した後、使用に供することができる。
In the present invention, it is preferable to mix the pigment with other components after dispersing the pigment with the dispersant. The pigment can be dispersed by mixing (A) a dispersion in which the pigment is dispersed with a dispersant and (B) a dispersion in which the pigment is dispersed with the dispersant.
The composition prepared as described above is preferably filtered after using a filter having a pore size of about 0.01 to 3.0 μm, more preferably about 0.05 to 0.5 μm, and then used. be able to.
 本発明の組成物は、耐熱性および色特性に優れた硬化膜を形成することができるため、カラーフィルタの着色パターン(着色層)を形成するために好適に用いられる。また、本発明の組成物は、固体撮像素子(例えば、CCD、CMOS等)や、液晶表示装置(LCD)などの画像表示装置に用いられるカラーフィルタなどの着色パターン形成用として好適に用いることができる。さらに、印刷インキ、インクジェットインキおよび塗料などの作製用途としても好適に用いることができる。なかでも、CCDおよびCMOS等の固体撮像素子用のカラーフィルタを作製用途として好適に用いることができる。 Since the composition of the present invention can form a cured film having excellent heat resistance and color characteristics, it is suitably used for forming a color pattern (colored layer) of a color filter. The composition of the present invention is preferably used for forming a colored pattern such as a color filter used in a solid-state imaging device (for example, CCD, CMOS, etc.) or an image display device such as a liquid crystal display device (LCD). it can. Furthermore, it can be suitably used as a production application for printing ink, inkjet ink, paint, and the like. In particular, a color filter for a solid-state imaging device such as a CCD and a CMOS can be suitably used as a production application.
<硬化膜、パターン形成方法、カラーフィルタおよびカラーフィルタの製造方法>
 次に、本発明における着色硬化膜、パターン形成方法およびカラーフィルタについて、その製造方法を通じて詳述する。
<Curing film, pattern forming method, color filter, and color filter manufacturing method>
Next, the colored cured film, the pattern forming method, and the color filter in the present invention will be described in detail through the manufacturing method.
 本発明のパターン形成方法は、本発明の着色感光性樹脂組成物を支持体上に付与(適用)して着色感光性樹脂組成物層を形成する着色感光性樹脂組成物層形成工程と、前記着色感光性樹脂組成物層をパターン様に露光する露光工程と、未露光部を現像除去して着色パターンを形成するパターン形成工程と、を含むことを特徴とする。本発明のパターン形成方法は、カラーフィルタが有する着色パターン(画素)の形成に好適に適用することができる。 The pattern forming method of the present invention includes a colored photosensitive resin composition layer forming step of forming (applying) the colored photosensitive resin composition of the present invention on a support to form a colored photosensitive resin composition layer, It includes an exposure step of exposing the colored photosensitive resin composition layer in a pattern-like manner, and a pattern formation step of developing and removing unexposed portions to form a colored pattern. The pattern forming method of the present invention can be suitably applied to the formation of a colored pattern (pixel) included in a color filter.
 本発明のパターン形成方法によりパターンを形成する支持体としては、基板等の板状物の他、パターン形成に適用しうる支持体であれば特に限定されない。 The support for forming a pattern by the pattern forming method of the present invention is not particularly limited as long as it is a support applicable to pattern formation in addition to a plate-like material such as a substrate.
 以下、本発明のパターン形成方法における各工程については、固体撮像素子用カラーフィルタの製造方法を通じて詳細に説明するが、本発明はこの方法に限定されるものではない。 Hereinafter, each step in the pattern forming method of the present invention will be described in detail through a method for manufacturing a color filter for a solid-state imaging device, but the present invention is not limited to this method.
 本発明のカラーフィルタの製造方法は、本発明のパターン形成方法を適用するものであり、本発明のパターン形成方法を用いて、支持体上に着色パターンを形成する工程を含む。
 即ち、本発明のカラーフィルタの製造方法は、本発明のパターン形成方法を適用するものであり、本発明の着色感光性樹脂組成物を支持体上に付与して着色感光性樹脂組成物層を形成する着色感光性樹脂組成物層形成工程と、前記着色感光性樹脂組成物層をパターン様に露光する露光工程と、未露光部を現像除去して着色パターンを形成するパターン形成工程と、を含むことを特徴とする。さらに、必要に応じて、着色感光性樹脂組成物層をベークする工程(プリベーク工程)、および、現像された着色パターンをベークする工程(ポストベーク工程)を設けてもよい。以下、これらの工程をあわせて、パターン形成工程ということがある。
 本発明のカラーフィルタは、上記製造方法により好適に得ることができる。
 以下、固体撮像素子用カラーフィルタを単に「カラーフィルタ」ということがある。
The manufacturing method of the color filter of this invention applies the pattern formation method of this invention, and includes the process of forming a colored pattern on a support body using the pattern formation method of this invention.
That is, the method for producing a color filter of the present invention applies the pattern forming method of the present invention. The colored photosensitive resin composition layer of the present invention is applied to a support to form a colored photosensitive resin composition layer. A colored photosensitive resin composition layer forming step to be formed; an exposure step of exposing the colored photosensitive resin composition layer in a pattern-like manner; and a pattern forming step of developing and removing unexposed portions to form a colored pattern. It is characterized by including. Further, if necessary, a step of baking the colored photosensitive resin composition layer (pre-baking step) and a step of baking the developed colored pattern (post-baking step) may be provided. Hereinafter, these steps may be collectively referred to as a pattern forming step.
The color filter of the present invention can be suitably obtained by the above production method.
Hereinafter, the color filter for the solid-state imaging device may be simply referred to as “color filter”.
 本発明のパターン形成方法における各工程については、本発明のカラーフィルタの製造方法を通じて以下に詳述する。 Each step in the pattern forming method of the present invention will be described in detail below through the color filter manufacturing method of the present invention.
 本発明のカラーフィルタの製造方法は、本発明のパターン形成方法を適用するものであり、本発明のパターン形成方法を用いて、基板上に着色パターンを形成することを含む。 The manufacturing method of the color filter of the present invention applies the pattern forming method of the present invention, and includes forming a colored pattern on the substrate using the pattern forming method of the present invention.
<着色感光性樹脂組成物層を形成する工程>
 着色感光性樹脂組成物層を形成する工程では、支持体上に、本発明の組成物を付与して着色感光性樹脂組成物層を形成する。
<Step of forming a colored photosensitive resin composition layer>
In the step of forming the colored photosensitive resin composition layer, the colored photosensitive resin composition layer is formed by applying the composition of the present invention on the support.
 本工程に用いうる支持体としては、例えば、基板(例えば、シリコン基板)上にCCD(Charge Coupled Device)やCMOS(Complementary Metal-Oxide Semiconductor)等の撮像素子(受光素子)が設けられた固体撮像素子用基板を用いることができる。
 本発明における着色パターンは、固体撮像素子用基板の撮像素子形成面側(おもて面)に形成されてもよいし、撮像素子非形成面側(裏面)に形成されてもよい。
 固体撮像素子における着色パターンの間や、固体撮像素子用基板の裏面には、遮光膜が設けられていてもよい。
 また、支持体上には、必要により、上部の層との密着改良、物質の拡散防止或いは基板表面の平坦化のために下塗り層を設けてもよい。
As a support that can be used in this step, for example, a solid-state imaging in which an imaging element (light receiving element) such as a CCD (Charge Coupled Device) or a CMOS (Complementary Metal-Oxide Semiconductor) is provided on a substrate (for example, a silicon substrate). An element substrate can be used.
The colored pattern in the present invention may be formed on the imaging element forming surface side (front surface) of the solid-state imaging element substrate, or may be formed on the imaging element non-forming surface side (back surface).
A light shielding film may be provided between the colored patterns in the solid-state image sensor or on the back surface of the substrate for the solid-state image sensor.
Further, if necessary, an undercoat layer may be provided on the support for improving adhesion with the upper layer, preventing diffusion of substances, or flattening the substrate surface.
 支持体上への本発明の組成物の付与方法としては、スリット塗布、インクジェット法、回転塗布、流延塗布、ロール塗布、スクリーン印刷法等の各種の塗布方法を適用することができる。 As a method for applying the composition of the present invention on the support, various coating methods such as slit coating, ink jet method, spin coating, cast coating, roll coating, screen printing method and the like can be applied.
 支持体上に塗布された着色感光性樹脂組成物層の乾燥(プリベーク)は、ホットプレート、オーブン等で50℃~140℃の温度で10秒~300秒で行うことができる。 The colored photosensitive resin composition layer coated on the support can be dried (prebaked) at a temperature of 50 ° C. to 140 ° C. for 10 seconds to 300 seconds using a hot plate, oven or the like.
<<フォトリソグラフィ法でパターン形成する場合>>
-露光工程-
 露光工程では、着色感光性樹脂組成物層形成工程において形成された着色感光性樹脂組成物層を、例えば、ステッパー等の露光装置を用い、所定のマスクパターンを有するマスクを介してパターン露光する。これにより、硬化膜が得られる。
 露光に際して用いることができる放射線(光)としては、特に、g線、i線等の紫外線が好ましく(特に好ましくはi線)用いられる。照射量(露光量)は30~1500mJ/cm2が好ましく50~1000mJ/cm2がより好ましく、80~500mJ/cm2が最も好ましい。
<< When pattern is formed by photolithography >>
-Exposure process-
In the exposure step, the colored photosensitive resin composition layer formed in the colored photosensitive resin composition layer forming step is subjected to pattern exposure through a mask having a predetermined mask pattern using an exposure device such as a stepper, for example. Thereby, a cured film is obtained.
As radiation (light) that can be used for exposure, ultraviolet rays such as g-line and i-line are particularly preferable (particularly preferably i-line). Irradiation dose (exposure dose) is more preferably 30 ~ 1500mJ / cm 2 is preferably 50 ~ 1000mJ / cm 2, and most preferably 80 ~ 500mJ / cm 2.
 硬化膜の膜厚は1.0μm以下であることが好ましく、0.1~0.9μmであることがより好ましく、0.2~0.8μmであることがさらに好ましい。
 膜厚を、1.0μm以下とすることにより、高解像性、高密着性を得られるため、好ましい。
 また、本工程においては、0.7μm以下の薄い膜厚を有する硬化膜も好適に形成することができ、得られた硬化膜を、後述するパターン形成工程にて現像処理することで、薄膜でありながらも、現像性、表面荒れ抑制、およびパターン形状に優れた着色パターンを得ることができる。
The thickness of the cured film is preferably 1.0 μm or less, more preferably 0.1 to 0.9 μm, and further preferably 0.2 to 0.8 μm.
It is preferable to set the film thickness to 1.0 μm or less because high resolution and high adhesion can be obtained.
In addition, in this step, a cured film having a thin film thickness of 0.7 μm or less can also be suitably formed, and the obtained cured film is developed in a pattern forming process described later, thereby forming a thin film. Although it exists, the coloring pattern excellent in developability, surface roughness suppression, and pattern shape can be obtained.
<<<パターン形成工程>>>
 次いでアルカリ現像処理を行うことにより、露光工程における光未照射部分の着色感光性樹脂組成物層がアルカリ水溶液に溶出し、光硬化した部分だけが残る。
 現像液としては、下地の撮像素子や回路などにダメージを起さない、有機アルカリ現像液が望ましい。現像温度としては通常20~30℃であり、現像時間は、従来20~90秒であった。より残渣を除去するため、近年では120~180秒実施する場合もある。さらには、より残渣除去性を向上するため、現像液を60秒ごとに振り切り、さらに新たに現像液を供給する工程を数回繰り返す場合もある。
<<< Pattern formation process >>>
Next, by performing an alkali development treatment, the colored photosensitive resin composition layer in the light unirradiated portion in the exposure step is eluted in the alkaline aqueous solution, and only the photocured portion remains.
The developer is preferably an organic alkali developer that does not cause damage to the underlying image sensor or circuit. The development temperature is usually 20 to 30 ° C., and the development time is conventionally 20 to 90 seconds. In order to remove the residue more, it may be carried out for 120 to 180 seconds in recent years. Furthermore, in order to further improve residue removability, the process of shaking off the developer every 60 seconds and further supplying a new developer may be repeated several times.
 現像液に用いるアルカリ剤としては、例えば、アンモニア水、エチルアミン、ジエチルアミン、ジメチルエタノールアミン、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、テトラプロピルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、ベンジルトリメチルアンモニウムヒドロキシド、コリン、ピロール、ピペリジン、1,8-ジアザビシクロ-[5、4、0]-7-ウンデセンなどの有機アルカリ性化合物が挙げられ、これらのアルカリ剤を濃度が0.001~10質量%、好ましくは0.01~1質量%となるように純水で希釈したアルカリ性水溶液が現像液として好ましく使用される。
 なお、現像液には無機アルカリを用いてもよく、無機アルカリとしては、例えば、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸水素ナトリウム、硅酸ナトリウム、メタ硅酸ナトリウムなどが好ましい。
 なお、このようなアルカリ性水溶液からなる現像液を使用した場合には、一般に現像後純水で洗浄(リンス)する。
Examples of the alkaline agent used in the developer include ammonia water, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide. Organic alkaline compounds such as choline, pyrrole, piperidine, 1,8-diazabicyclo- [5,4,0] -7-undecene, and the concentration of these alkaline agents is 0.001 to 10% by mass, preferably An alkaline aqueous solution diluted with pure water so as to be 0.01 to 1% by mass is preferably used as the developer.
In addition, an inorganic alkali may be used for the developer, and as the inorganic alkali, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium oxalate, sodium metaoxalate and the like are preferable.
In the case where a developer composed of such an alkaline aqueous solution is used, it is generally washed (rinsed) with pure water after development.
 次いで、乾燥を施した後に加熱処理(ポストベーク)を行うことが好ましい。多色の着色パターンを形成するのであれば、色ごとに前記工程を順次繰り返して硬化皮膜を製造することができる。これによりカラーフィルタが得られる。
 ポストベークは、硬化を完全なものとするための現像後の加熱処理であり、通常100~240℃、好ましくは200~240℃の熱硬化処理を行う。
 このポストベーク処理は、現像後の塗布膜を、上記条件になるようにホットプレートやコンベクションオーブン(熱風循環式乾燥機)、高周波加熱機等の加熱手段を用いて、連続式あるいはバッチ式で行うことができる。
Next, it is preferable to perform heat treatment (post-bake) after drying. If a multicolor coloring pattern is formed, the said process can be repeated sequentially for every color, and a cured film can be manufactured. Thereby, a color filter is obtained.
The post-baking is a heat treatment after development for complete curing, and a heat curing treatment is usually performed at 100 to 240 ° C., preferably 200 to 240 ° C.
This post-bake treatment is performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), a high-frequency heater, or the like so that the coating film after development is in the above-described condition. be able to.
<<ドライエッチング法でパターン形成する場合>>
 ドライエッチングは、着色層を、パターニングされたフォトレジスト層をマスクとしてエッチングガスを用いて行うことができる。具体的には、着色層上にポジ型またはネガ型の感放射線性組成物を塗布し、これを乾燥させることによりフォトレジスト層を形成する。フォトレジスト層の形成においては、さらにプリベーク処理を施すことが好ましい。特に、フォトレジストの形成プロセスとしては、露光後の加熱処理(PEB)、現像後の加熱処理(ポストベーク処理)を実施する形態が望ましい。
<< When pattern is formed by dry etching method >>
Dry etching can be performed by using an etching gas for the colored layer with the patterned photoresist layer as a mask. Specifically, a positive or negative radiation sensitive composition is applied onto the colored layer and dried to form a photoresist layer. In the formation of the photoresist layer, it is preferable to further perform a pre-bake treatment. In particular, as a process for forming a photoresist, a mode in which heat treatment after exposure (PEB) and heat treatment after development (post-bake treatment) are desirable.
 フォトレジストとしては、例えば、ポジ型の感放射線性組成物が用いられる。このポジ型の感放射線性組成物としては、紫外線(g線、h線、i線)、エキシマー・レーザー等を含む遠紫外線、電子線、イオンビームおよびX線等の放射線に感応するポジ型フォトレジスト用に好適なポジ型レジスト組成物が使用できる。放射線のうち、g線、h線、i線が好ましく、中でもi線が好ましい。
 具体的には、ポジ型の感放射線性組成物として、キノンジアジド化合物およびアルカリ可溶性樹脂を含有する組成物が好ましい。キノンジアジド化合物およびアルカリ可溶性樹脂を含有するポジ型の感放射線性組成物は、500nm以下の波長の光照射によりキノンジアジド基が分解してカルボキシル基を生じ、結果としてアルカリ不溶状態からアルカリ可溶性になることを利用するものである。このポジ型フォトレジストは解像力が著しく優れているので、ICやLSI等の集積回路の作製に用いられている。キノンジアジド化合物としては、ナフトキノンジアジド化合物が挙げられる。市販品としては例えばFHi622BC」(富士フイルムエレクトロニクスマテリアルズ社製)などが挙げられる。
As the photoresist, for example, a positive type radiation sensitive composition is used. As this positive type radiation sensitive composition, positive type photo sensitive to radiation such as ultraviolet rays (g rays, h rays, i rays), deep ultraviolet rays including excimer lasers, electron beams, ion beams and X rays. A positive resist composition suitable for resist can be used. Of the radiation, g-line, h-line and i-line are preferable, and i-line is particularly preferable.
Specifically, as the positive radiation sensitive composition, a composition containing a quinonediazide compound and an alkali-soluble resin is preferable. A positive radiation-sensitive composition containing a quinonediazide compound and an alkali-soluble resin indicates that a quinonediazide group is decomposed by irradiation with light having a wavelength of 500 nm or less to produce a carboxyl group, resulting in alkali-solubility from an alkali-insoluble state. It is what you use. Since this positive photoresist has remarkably excellent resolution, it is used for manufacturing integrated circuits such as ICs and LSIs. Examples of the quinonediazide compound include a naphthoquinonediazide compound. Examples of commercially available products include FHi622BC (manufactured by FUJIFILM Electronics Materials).
 フォトレジスト層の厚みとしては、0.1~3μmが好ましく、0.2~2.5μmがより好ましく、0.3~2μmがさらに好ましい。なお、フォトレジスト層の塗布は、既述の着色層における塗布方法を用いて好適に行なえる。 The thickness of the photoresist layer is preferably from 0.1 to 3 μm, more preferably from 0.2 to 2.5 μm, still more preferably from 0.3 to 2 μm. In addition, the application of the photoresist layer can be suitably performed using the above-described application method in the colored layer.
 次いで、フォトレジスト層を露光、現像することにより、レジスト貫通孔群が設けられたレジストパターン(パターニングされたフォトレジスト層)を形成する。レジストパターンの形成は、特に制限なく、従来公知のフォトリソグラフィーの技術を適宜最適化して行なうことができる。露光、現像によりフォトレジスト層に、レジスト貫通孔群が設けられることによって、次のエッチングで用いられるエッチングマスクとしてのレジストパターンが、着色層上に設けられる。 Next, by exposing and developing the photoresist layer, a resist pattern (patterned photoresist layer) provided with a group of resist through holes is formed. The formation of the resist pattern is not particularly limited, and can be performed by appropriately optimizing a conventionally known photolithography technique. By providing a resist through hole group in the photoresist layer by exposure and development, a resist pattern as an etching mask used in the next etching is provided on the colored layer.
 フォトレジスト層の露光は、所定のマスクパターンを介して、ポジ型またはネガ型の感放射線性組成物に、g線、h線、i線等、好ましくはi線で露光を施すことにより行なうことができる。露光後は、現像液で現像処理することにより、着色パターンを形成しようとする領域に合わせてフォトレジストが除去される。 The exposure of the photoresist layer is performed by exposing the positive-type or negative-type radiation-sensitive composition with g-line, h-line, i-line, etc., preferably i-line, through a predetermined mask pattern. Can do. After the exposure, the photoresist is removed in accordance with a region where a colored pattern is to be formed by developing with a developer.
 前記現像液としては、着色剤を含む着色層には影響を与えず、ポジレジストの露光部およびネガレジストの未硬化部を溶解するものであればいずれも使用可能であり、例えば、種々の有機溶剤の組み合わせやアルカリ性の水溶液を用いることができる。アルカリ性の水溶液としては、アルカリ性化合物を濃度が0.001~10質量%、好ましくは0.01~5質量%となるように溶解して調製されたアルカリ性水溶液が好適である。アルカリ性化合物は、例えば、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム,硅酸ナトリウム、メタ硅酸ナトリウム、アンモニア水、エチルアミン、ジエチルアミン、ジメチルエタノールアミン、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、コリン、ピロール、ピペリジン、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン等が挙げられる。尚、アルカリ性水溶液を現像液として用いた場合は、一般に現像後に水で洗浄処理が施される。 Any developer can be used as long as it dissolves the exposed portion of the positive resist and the uncured portion of the negative resist without affecting the colored layer containing the colorant. Combinations of solvents and alkaline aqueous solutions can be used. As the alkaline aqueous solution, an alkaline aqueous solution prepared by dissolving an alkaline compound so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 5% by mass is suitable. Examples of alkaline compounds include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, Examples include pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene. In addition, when alkaline aqueous solution is used as a developing solution, generally a washing process is performed with water after development.
 次に、レジストパターンをエッチングマスクとして、着色層に貫通孔群が形成されるようにドライエッチングによりパターニングする。これにより、着色パターンが形成される。貫通孔群は、着色層に、市松状に設けられている。よって、着色層に貫通孔群が設けられてなる第1着色パターンは、複数の四角形状の第1着色画素を市松状に有している。 Next, using the resist pattern as an etching mask, patterning is performed by dry etching so that a through hole group is formed in the colored layer. Thereby, a colored pattern is formed. The through hole group is provided in a checkered pattern in the colored layer. Therefore, the first colored pattern in which the through hole group is provided in the colored layer has a plurality of square-shaped first colored pixels in a checkered pattern.
 ドライエッチングとしては、パターン断面をより矩形に近く形成する観点や支持体へのダメージをより低減する観点から、以下の形態で行なうのが好ましい。
 フッ素系ガスと酸素ガス(O2)との混合ガスを用い、支持体が露出しない領域(深さ)までエッチングを行なう第1段階のエッチングと、この第1段階のエッチングの後に、窒素ガス(N2)と酸素ガス(O2)との混合ガスを用い、好ましくは支持体が露出する領域(深さ)付近までエッチングを行なう第2段階のエッチングと、支持体が露出した後に行なうオーバーエッチングとを含む形態が好ましい。以下、ドライエッチングの具体的手法、並びに第1段階のエッチング、第2段階のエッチング、およびオーバーエッチングについて説明する。
Dry etching is preferably performed in the following manner from the viewpoint of forming a pattern cross section closer to a rectangle and reducing damage to the support.
Using a mixed gas of fluorine-based gas and oxygen gas (O 2 ), the first stage etching is performed up to a region (depth) where the support is not exposed, and after this first stage etching, nitrogen gas ( N 2 ) and oxygen gas (O 2 ), and a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed. The form containing these is preferable. Hereinafter, a specific method of dry etching and the first stage etching, second stage etching, and over-etching will be described.
 ドライエッチングは、下記手法により事前にエッチング条件を求めて行なう。
 (1)第1段階のエッチングにおけるエッチングレート(nm/min)と、第2段階のエッチングにおけるエッチングレート(nm/min)とをそれぞれ算出する。(2)第1段階のエッチングで所望の厚さをエッチングする時間と、第2段階のエッチングで所望の厚さをエッチングする時間とをそれぞれ算出する。(3)前記(2)で算出したエッチング時間に従って第1段階のエッチングを実施する。(4)前記(2)で算出したエッチング時間に従って第2段階のエッチングを実施する。あるいはエンドポイント検出でエッチング時間を決定し、決定したエッチング時間に従って第2段階のエッチングを実施してもよい。(5)前記(3)、(4)の合計時間に対してオーバーエッチング時間を算出し、オーバーエッチングを実施する。
Dry etching is performed by obtaining etching conditions in advance by the following method.
(1) The etching rate (nm / min) in the first stage etching and the etching rate (nm / min) in the second stage etching are calculated respectively. (2) The time for etching the desired thickness in the first stage etching and the time for etching the desired thickness in the second stage etching are respectively calculated. (3) The first-stage etching is performed according to the etching time calculated in (2). (4) The second stage etching is performed according to the etching time calculated in (2). Alternatively, the etching time may be determined by endpoint detection, and the second stage etching may be performed according to the determined etching time. (5) Overetching time is calculated with respect to the total time of (3) and (4), and overetching is performed.
 前記第1段階のエッチング工程で用いる混合ガスとしては、被エッチング膜である有機材料を矩形に加工する観点から、フッ素系ガスおよび酸素ガス(O2)を含むことが好ましい。また、第1段階のエッチング工程は、支持体が露出しない領域までエッチングする形態にすることで、支持体のダメージを回避することができる。また、前記第2段階のエッチング工程および前記オーバーエッチング工程は、第1段階のエッチング工程でフッ素系ガスおよび酸素ガスの混合ガスにより支持体が露出しない領域までエッチングを実施した後、支持体のダメージ回避の観点から、窒素ガスおよび酸素ガスの混合ガスを用いてエッチング処理を行なうのが好ましい。 The mixed gas used in the first stage etching step preferably contains a fluorine-based gas and an oxygen gas (O 2 ) from the viewpoint of processing the organic material that is the film to be etched into a rectangular shape. In addition, the first stage etching process can avoid damage to the support body by etching to a region where the support body is not exposed. The second etching step and the over-etching step may be performed by etching the region where the support is not exposed by the mixed gas of fluorine-based gas and oxygen gas in the first etching process, and then damaging the support. From the viewpoint of avoidance, it is preferable to perform the etching process using a mixed gas of nitrogen gas and oxygen gas.
 第1段階のエッチング工程でのエッチング量と、第2段階のエッチング工程でのエッチング量との比率は、第1段階のエッチング工程でのエッチング処理による矩形性を損なわないように決定することが重要である。なお、全エッチング量(第1段階のエッチング工程でのエッチング量と第2段階のエッチング工程でのエッチング量との総和)中における後者の比率は、0%より大きく50%以下である範囲が好ましく、10~20%がより好ましい。エッチング量とは、被エッチング膜の残存する膜厚とエッチング前の膜厚との差から算出される量のことをいう。 It is important to determine the ratio between the etching amount in the first stage etching process and the etching amount in the second stage etching process so as not to impair the rectangularity due to the etching process in the first stage etching process. It is. The latter ratio in the total etching amount (the sum of the etching amount in the first-stage etching process and the etching amount in the second-stage etching process) is preferably in the range of more than 0% and not more than 50%. 10 to 20% is more preferable. The etching amount is an amount calculated from the difference between the remaining film thickness to be etched and the film thickness before etching.
 また、エッチングは、オーバーエッチング処理を含むことが好ましい。オーバーエッチング処理は、オーバーエッチング比率を設定して行なうことが好ましい。また、オーバーエッチング比率は、初めに行なうエッチング処理時間より算出することが好ましい。オーバーエッチング比率は任意に設定できるが、フォトレジストのエッチング耐性と被エッチングパターンの矩形性維持の点で、エッチング工程におけるエッチング処理時間の30%以下であることが好ましく、5~25%であることがより好ましく、10~15%であることが特に好ましい。 Further, the etching preferably includes an over-etching process. The overetching process is preferably performed by setting an overetching ratio. Moreover, it is preferable to calculate the overetching ratio from the etching process time to be performed first. The over-etching ratio can be arbitrarily set, but it is preferably 30% or less of the etching processing time in the etching process, and preferably 5 to 25% from the viewpoint of etching resistance of the photoresist and maintaining the rectangularity of the pattern to be etched. Is more preferable, and 10 to 15% is particularly preferable.
 次いで、エッチング後に残存するレジストパターン(すなわちエッチングマスク)を除去する。レジストパターンの除去は、レジストパターン上に剥離液または溶剤を付与して、レジストパターンを除去可能な状態にする工程と、レジストパターンを洗浄水を用いて除去する工程とを含むことが好ましい。 Next, the resist pattern (that is, etching mask) remaining after etching is removed. The removal of the resist pattern preferably includes a step of applying a stripping solution or a solvent on the resist pattern so that the resist pattern can be removed, and a step of removing the resist pattern using cleaning water.
 レジストパターン上に剥離液または溶剤を付与し、レジストパターンを除去可能な状態にする工程としては、例えば、剥離液または溶剤を少なくともレジストパターン上に付与し、所定の時間停滞させてパドル現像する工程を挙げることができる。剥離液または溶剤を停滞させる時間としては、特に制限はないが、数十秒から数分であることが好ましい。 Examples of the step of applying a stripping solution or solvent on the resist pattern so that the resist pattern can be removed include, for example, a step of applying a stripping solution or solvent on at least the resist pattern and stagnating for a predetermined time to perform paddle development Can be mentioned. Although there is no restriction | limiting in particular as time to make stripping solution or a solvent stagnant, It is preferable that it is several dozen seconds to several minutes.
 また、レジストパターンを洗浄水を用いて除去する工程としては、例えば、スプレー式またはシャワー式の噴射ノズルからレジストパターンに洗浄水を噴射して、レジストパターンを除去する工程を挙げることができる。洗浄水としては、純水を好ましく用いることができる。また、噴射ノズルとしては、その噴射範囲内に支持体全体が包含される噴射ノズルや、可動式の噴射ノズルであってその可動範囲が支持体全体を包含する噴射ノズルを挙げることができる。噴射ノズルが可動式の場合、レジストパターンを除去する工程中に支持体中心部から支持体端部までを2回以上移動して洗浄水を噴射することで、より効果的にレジストパターンを除去することができる。 Further, examples of the step of removing the resist pattern using the cleaning water include a step of removing the resist pattern by spraying the cleaning water onto the resist pattern from a spray type or shower type spray nozzle. As the washing water, pure water can be preferably used. Further, examples of the injection nozzle include an injection nozzle in which the entire support is included in the injection range, and an injection nozzle that is a movable injection nozzle and in which the movable range includes the entire support. When the spray nozzle is movable, the resist pattern is more effectively removed by moving the support pattern from the center of the support to the end of the support more than twice during the process of removing the resist pattern and spraying the cleaning water. be able to.
 剥離液は、一般には有機溶剤を含有するが、無機溶媒をさらに含有してもよい。有機溶剤としては、例えば、1)炭化水素系化合物、2)ハロゲン化炭化水素系化合物、3)アルコール系化合物、4)エーテルまたはアセタール系化合物、5)ケトンまたはアルデヒド系化合物、6)エステル系化合物、7)多価アルコール系化合物、8)カルボン酸またはその酸無水物系化合物、9)フェノール系化合物、10)含窒素化合物、11)含硫黄化合物、12)含フッ素化合物が挙げられる。剥離液としては、含窒素化合物を含有することが好ましく、非環状含窒素化合物と環状含窒素化合物とを含むことがより好ましい。 The stripping solution generally contains an organic solvent, but may further contain an inorganic solvent. Examples of organic solvents include 1) hydrocarbon compounds, 2) halogenated hydrocarbon compounds, 3) alcohol compounds, 4) ether or acetal compounds, 5) ketones or aldehyde compounds, and 6) ester compounds. 7) polyhydric alcohol compounds, 8) carboxylic acids or acid anhydride compounds thereof, 9) phenol compounds, 10) nitrogen compounds, 11) sulfur compounds, and 12) fluorine compounds. The stripping solution preferably contains a nitrogen-containing compound, and more preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound.
 非環状含窒素化合物としては、水酸基を有する非環状含窒素化合物であることが好ましい。具体的には、例えば、モノイソプロパノールアミン、ジイソプロパノールアミン、トリイソプロパノールアミン、N-エチルエタノールアミン、N,N-ジブチルエタノールアミン、N-ブチルエタノールアミン、モノエタノールアミン、ジエタノールアミン、トリエタノールアミンなどが挙げられ、好ましくはモノエタノールアミン、ジエタノールアミン、トリエタノールアミンであり、より好ましくはモノエタノールアミン(H2NCH2CH2OH)である。また、環状含窒素化合物としては、イソキノリン、イミダゾール、N-エチルモルホリン、ε-カプロラクタム、キノリン、1,3-ジメチル-2-イミダゾリジノン、α-ピコリン、β-ピコリン、γ-ピコリン、2-ピペコリン、3-ピペコリン、4-ピペコリン、ピペラジン、ピペリジン、ピラジン、ピリジン、ピロリジン、N-メチル-2-ピロリドン、N-フェニルモルホリン、2,4-ルチジン、2,6-ルチジンなどが挙げられ、好ましくは、N-メチル-2-ピロリドン、N-エチルモルホリンであり、より好ましくはN-メチル-2-ピロリドン(NMP)である。 The acyclic nitrogen-containing compound is preferably an acyclic nitrogen-containing compound having a hydroxyl group. Specific examples include monoisopropanolamine, diisopropanolamine, triisopropanolamine, N-ethylethanolamine, N, N-dibutylethanolamine, N-butylethanolamine, monoethanolamine, diethanolamine, and triethanolamine. Preferred are monoethanolamine, diethanolamine and triethanolamine, and more preferred is monoethanolamine (H 2 NCH 2 CH 2 OH). Examples of cyclic nitrogen-containing compounds include isoquinoline, imidazole, N-ethylmorpholine, ε-caprolactam, quinoline, 1,3-dimethyl-2-imidazolidinone, α-picoline, β-picoline, γ-picoline, 2- Preferred examples include pipecoline, 3-pipecoline, 4-pipecoline, piperazine, piperidine, pyrazine, pyridine, pyrrolidine, N-methyl-2-pyrrolidone, N-phenylmorpholine, 2,4-lutidine, and 2,6-lutidine. Are N-methyl-2-pyrrolidone and N-ethylmorpholine, more preferably N-methyl-2-pyrrolidone (NMP).
 剥離液は、非環状含窒素化合物と環状含窒素化合物とを含むことが好ましいが、中でも、非環状含窒素化合物として、モノエタノールアミン、ジエタノールアミン、およびトリエタノールアミンから選ばれる少なくとも1種と、環状含窒素化合物として、N-メチル-2-ピロリドンおよびN-エチルモルホリンから選ばれる少なくとも1種とを含むことがより好ましく、モノエタノールアミンとN-メチル-2-ピロリドンとを含むことがさらに好ましい。 The stripping solution preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound. Among these, as the acyclic nitrogen-containing compound, at least one selected from monoethanolamine, diethanolamine, and triethanolamine, and cyclic The nitrogen-containing compound preferably includes at least one selected from N-methyl-2-pyrrolidone and N-ethylmorpholine, and more preferably includes monoethanolamine and N-methyl-2-pyrrolidone.
 剥離液で除去するときには、第1着色パターンの上に形成されたレジストパターンが除去されていればよく、第1着色パターンの側壁にエッチング生成物であるデポ物が付着している場合でも、前記デポ物が完全に除去されていなくてもよい。デポ物とは、エッチング生成物が着色層の側壁に付着し堆積したものをいう。 When removing with a stripping solution, the resist pattern formed on the first colored pattern only needs to be removed, and even when a deposit that is an etching product adheres to the side wall of the first colored pattern, The deposit may not be completely removed. A deposit means an etching product deposited and deposited on the side wall of a colored layer.
 剥離液としては、非環状含窒素化合物の含有量が、剥離液100質量部に対して9質量部以上11質量部以下であって、環状含窒素化合物の含有量が、剥離液100質量部に対して65質量部以上70質量部以下であるものが望ましい。また、剥離液は、非環状含窒素化合物と環状含窒素化合物との混合物を純水で希釈したものが好ましい。 As the stripping solution, the content of the non-cyclic nitrogen-containing compound is 9 parts by weight or more and 11 parts by weight or less with respect to 100 parts by weight of the stripping solution, and the content of the cyclic nitrogen-containing compound is 100 parts by weight of the stripping solution. On the other hand, what is 65 to 70 mass parts is desirable. Further, the stripping solution is preferably obtained by diluting a mixture of an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound with pure water.
 なお、本発明の製造方法は、必要に応じ、上記以外の工程として、固体撮像素子用カラーフィルタの製造方法として公知の工程を有していてもよい。例えば、上述した、着色感光性樹脂組成物層形成工程、露光工程およびパターン形成工程を行った後に、必要により、形成された着色パターンを加熱および/または露光により硬化する硬化工程を含んでいてもよい。 In addition, the manufacturing method of this invention may have a well-known process as a manufacturing method of the color filter for solid-state image sensors as a process other than the above as needed. For example, after performing the above-mentioned colored photosensitive resin composition layer forming step, exposure step and pattern forming step, a curing step of curing the formed colored pattern by heating and / or exposure may be included as necessary. Good.
 また、本発明に係る組成物を用いる場合、例えば、塗布装置吐出部のノズルや配管部の目詰まりや塗布機内への着色感光性樹脂組成物や顔料の付着・沈降・乾燥による汚染等が生じる場合がある。そこで、本発明の組成物によってもたらされた汚染を効率よく洗浄するためには、前掲の本組成物に関する溶剤を洗浄液として用いることが好ましい。また、特開平7-128867号公報、特開平7-146562号公報、特開平8-278637号公報、特開2000-273370号公報、特開2006-85140号公報、特開2006-291191号公報、特開2007-2101号公報、特開2007-2102号公報、特開2007-281523号公報などに記載の洗浄液も本発明に係る組成物の洗浄除去として好適に用いることができる。
 上記のうち、アルキレングリコールモノアルキルエーテルカルボキシレートおよびアルキレングリコールモノアルキルエーテルが好ましい。
 これら溶媒は、単独で用いても2種以上を混合して用いてもよい。2種以上を混合する場合、水酸基を有する溶剤と水酸基を有しない溶剤とを混合することが好ましい。水酸基を有する溶剤と水酸基を有しない溶剤との質量比は、1/99~99/1、好ましくは10/90~90/10、さらに好ましくは20/80~80/20である。プロピレングリコールモノメチルエーテルアセテート(PGMEA)とプロピレングリコールモノメチルエーテル(PGME)の混合溶剤で、その比率が60/40であることが特に好ましい。なお、汚染物に対する洗浄液の浸透性を向上させるために、洗浄液には前掲の本組成物に関する界面活性剤を添加してもよい。
Further, when the composition according to the present invention is used, for example, clogging of a nozzle or a piping part of a coating apparatus discharge part, contamination due to adhesion, sedimentation, or drying of a colored photosensitive resin composition or pigment in the coating machine occurs. There is a case. Therefore, in order to efficiently clean the contamination caused by the composition of the present invention, it is preferable to use the solvent related to the present composition as the cleaning liquid. Also, JP-A-7-128867, JP-A-7-146562, JP-A-8-278737, JP-A-2000-273370, JP-A-2006-85140, JP-A-2006-291191, The cleaning liquids described in JP2007-2101A, JP2007-2102A, JP2007-281523A, etc. can also be suitably used for cleaning and removing the composition according to the present invention.
Of the above, alkylene glycol monoalkyl ether carboxylates and alkylene glycol monoalkyl ethers are preferred.
These solvents may be used alone or in combination of two or more. When mixing 2 or more types, it is preferable to mix the solvent which has a hydroxyl group, and the solvent which does not have a hydroxyl group. The mass ratio of the solvent having a hydroxyl group and the solvent having no hydroxyl group is from 1/99 to 99/1, preferably from 10/90 to 90/10, more preferably from 20/80 to 80/20. In a mixed solvent of propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME), the ratio is particularly preferably 60/40. In addition, in order to improve the permeability of the cleaning liquid with respect to contaminants, a surfactant related to the present composition described above may be added to the cleaning liquid.
 本発明のカラーフィルタは、本発明の組成物を用いているため、露光マージンに優れた露光ができると共に、形成された着色パターン(着色画素)は、パターン形状に優れ、パターン表面の荒れや現像部における残渣が抑制されていることから、色特性に優れたものとなる。
 本発明のカラーフィルタは、CCD、CMOS等の固体撮像素子に好適に用いることができ、特に100万画素を超えるような高解像度のCCDやCMOS等に好適である。本発明の固体撮像素子用カラーフィルタは、例えば、CCDまたはCMOSを構成する各画素の受光部と、集光するためのマイクロレンズと、の間に配置されるカラーフィルタとして用いることができる。
Since the color filter of the present invention uses the composition of the present invention, exposure with excellent exposure margin can be performed, and the formed colored pattern (colored pixel) has excellent pattern shape, pattern surface roughness and development. Since the residue in the portion is suppressed, the color characteristics are excellent.
The color filter of the present invention can be suitably used for a solid-state imaging device such as a CCD or CMOS, and is particularly suitable for a CCD or CMOS having a high resolution exceeding 1 million pixels. The color filter for a solid-state imaging device of the present invention can be used as a color filter disposed between, for example, a light receiving portion of each pixel constituting a CCD or CMOS and a microlens for condensing light.
 なお、本発明のカラーフィルタにおける着色パターン(着色画素)の膜厚としては、2.0μm以下が好ましく、1.0μm以下がより好ましく、0.7μm以下がさらに好ましい。
 また、着色パターン(着色画素)のサイズ(パターン幅)としては、2.5μm以下が好ましく、2.0μm以下がより好ましく、1.7μm以下が特に好ましい。
In addition, as a film thickness of the coloring pattern (color pixel) in the color filter of this invention, 2.0 micrometers or less are preferable, 1.0 micrometer or less is more preferable, and 0.7 micrometer or less is further more preferable.
Further, the size (pattern width) of the colored pattern (colored pixel) is preferably 2.5 μm or less, more preferably 2.0 μm or less, and particularly preferably 1.7 μm or less.
[固体撮像素子]
 本発明の固体撮像素子は、既述の本発明のカラーフィルタを備える。本発明の固体撮像素子の構成としては、本発明におけるカラーフィルタが備えられた構成であり、固体撮像素子として機能する構成であれば特に限定はないが、例えば、以下のような構成が挙げられる。
[Solid-state imaging device]
The solid-state imaging device of the present invention includes the above-described color filter of the present invention. The configuration of the solid-state imaging device of the present invention is a configuration provided with the color filter in the present invention, and is not particularly limited as long as it is a configuration that functions as a solid-state imaging device. .
 支持体上に、固体撮像素子(CCDイメージセンサー、CMOSイメージセンサー、等)の受光エリアを構成する複数のフォトダイオードおよびポリシリコン等からなる転送電極を有し、前記フォトダイオードおよび前記転送電極上にフォトダイオードの受光部のみ開口したタングステン等からなる遮光膜を有し、遮光膜上に遮光膜全面およびフォトダイオード受光部を覆うように形成された窒化シリコン等からなるデバイス保護膜を有し、前記デバイス保護膜上に、本発明の固体撮像素子用カラーフィルタを有する構成である。
 さらに、前記デバイス保護層上であってカラーフィルタの下(支持体に近い側)に集光手段(例えば、マイクロレンズ等。以下同じ)を有する構成や、カラーフィルタ上に集光手段を有する構成等であってもよい。
A transfer electrode comprising a plurality of photodiodes and polysilicon constituting a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) is provided on a support, and the photodiode and the transfer electrode are provided on the support. Having a light-shielding film made of tungsten or the like that is opened only in the light-receiving part of the photodiode, and having a device protective film made of silicon nitride or the like formed on the light-shielding film so as to cover the entire surface of the light-shielding film and the photodiode light-receiving part, It is the structure which has the color filter for solid-state image sensors of this invention on a device protective film.
Further, a configuration having light collecting means (for example, a microlens, etc., the same applies hereinafter) on the device protective layer and under the color filter (on the side close to the support), or a structure having the light collecting means on the color filter Etc.
[画像表示装置]
 本発明のカラーフィルタは、前記固体撮像素子のみならず、液晶表示装置や有機EL表示装置などの、画像表示装置に用いることができ、特に液晶表示装置の用途に好適である。本発明のカラーフィルタを備えた液晶表示装置は、表示画像の色合いが良好で表示特性に優れた高画質画像を表示することができる。
[Image display device]
The color filter of the present invention can be used not only for the solid-state imaging device but also for an image display device such as a liquid crystal display device or an organic EL display device, and is particularly suitable for use in a liquid crystal display device. The liquid crystal display device provided with the color filter of the present invention can display a high-quality image with a good display image color and excellent display characteristics.
 表示装置の定義や各表示装置の詳細については、例えば「電子ディスプレイデバイス(佐々木 昭夫著、(株)工業調査会 1990年発行)」、「ディスプレイデバイス(伊吹 順章著、産業図書(株)平成元年発行)」などに記載されている。また、液晶表示装置については、例えば「次世代液晶ディスプレイ技術(内田 龍男編集、(株)工業調査会 1994年発行)」に記載されている。本発明が適用できる液晶表示装置に特に制限はなく、例えば、上記の「次世代液晶ディスプレイ技術」に記載されている色々な方式の液晶表示装置に適用できる。 For the definition of display devices and details of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, Kogyo Kenkyukai, 1990)”, “Display Device (Junsho Ibuki, Industrial Books Co., Ltd.) Issued in the first year). The liquid crystal display device is described, for example, in “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, Industrial Research Co., Ltd., published in 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
 本発明のカラーフィルタは、カラーTFT方式の液晶表示装置に用いてもよい。カラーTFT方式の液晶表示装置については、例えば「カラーTFT液晶ディスプレイ(共立出版(株)1996年発行)」に記載されている。さらに、本発明はIPSなどの横電界駆動方式、MVAなどの画素分割方式などの視野角が拡大された液晶表示装置や、STN、TN、VA、OCS、FFS、およびR-OCB等にも適用できる。
 また、本発明におけるカラーフィルタは、明るく高精細なCOA(Color-filter On Array)方式にも供することが可能である。COA方式の液晶表示装置にあっては、カラーフィルタ層に対する要求特性は、前述のような通常の要求特性に加えて、層間絶縁膜に対する要求特性、すなわち低誘電率および剥離液耐性が必要とされることがある。本発明のカラーフィルタにおいては、色相に優れた染料多量体を用いることから、色純度、光透過性などが良好で着色パターン(画素)の色合いに優れるので、解像度が高く長期耐久性に優れたCOA方式の液晶表示装置を提供することができる。なお、低誘電率の要求特性を満足するためには、カラーフィルタ層の上に樹脂被膜を設けてもよい。
 これらの画像表示方式については、例えば、「EL、PDP、LCDディスプレイ-技術と市場の最新動向-(東レリサーチセンター調査研究部門 2001年発行)」の43ページなどに記載されている。
The color filter of the present invention may be used in a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Furthermore, the present invention is applied to a liquid crystal display device with a wide viewing angle, such as a horizontal electric field driving method such as IPS and a pixel division method such as MVA, STN, TN, VA, OCS, FFS, and R-OCB. it can.
In addition, the color filter in the present invention can be used for a bright and high-definition COA (Color-filter On Array) system. In the case of a COA type liquid crystal display device, the required characteristics for the color filter layer require the required characteristics for the interlayer insulating film, that is, the low dielectric constant and the resistance to the stripping solution, in addition to the normal required characteristics as described above. Sometimes. In the color filter of the present invention, since a dye multimer excellent in hue is used, the color purity, light transmittance, etc. are good and the color pattern (pixel) is excellent in hue, so the resolution is high and the long-term durability is excellent. A COA type liquid crystal display device can be provided. In order to satisfy the required characteristics of a low dielectric constant, a resin film may be provided on the color filter layer.
These image display methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends (issued in 2001 by Toray Research Center Research Division)".
 本発明におけるカラーフィルタを備えた液晶表示装置は、本発明におけるカラーフィルタ以外に、電極基板、偏光フィルム、位相差フィルム、バックライト、スペーサ、視野角保障フィルムなど様々な部材から構成される。本発明のカラーフィルタは、これらの公知の部材で構成される液晶表示装置に適用することができる。これらの部材については、例えば、「'94液晶ディスプレイ周辺材料・ケミカルズの市場(島 健太郎 (株)シーエムシー 1994年発行)」、「2003液晶関連市場の現状と将来展望(下巻)(表良吉(株)富士キメラ総研、2003年発行)」に記載されている。
 バックライトに関しては、SID meeting Digest 1380(2005)(A.Konno et.al)や、月刊ディスプレイ 2005年12月号の18~24ページ(島 康裕)、同25~30ページ(八木隆明)などに記載されている。
In addition to the color filter of the present invention, the liquid crystal display device provided with the color filter of the present invention includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film. The color filter of the present invention can be applied to a liquid crystal display device composed of these known members. Regarding these components, for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market (Kentaro Shima CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” Fuji Chimera Research Institute, Ltd., published in 2003) ”.
Regarding backlighting, SID meeting Digest 1380 (2005) (A. Konno et.al), Monthly Display December 2005, pages 18-24 (Yasuhiro Shima), pages 25-30 (Takaaki Yagi), etc. Are listed.
 本発明におけるカラーフィルタを液晶表示装置に用いると、従来公知の冷陰極管の三波長管と組み合わせたときに高いコントラストを実現できるが、さらに、赤、緑、青のLED光源(RGB-LED)をバックライトとすることによって輝度が高く、また、色純度の高い色再現性の良好な液晶表示装置を提供することができる。 When the color filter according to the present invention is used in a liquid crystal display device, a high contrast can be realized when combined with a conventionally known three-wavelength tube of a cold cathode tube, and further, red, green and blue LED light sources (RGB-LED). By using as a backlight, a liquid crystal display device having high luminance and high color purity and good color reproducibility can be provided.
 以下に実施例を挙げて本発明をさらに具体的に説明する。以下の実施例に示す材料、使用量、割合、処理内容、処理手順等は、本発明の趣旨を逸脱しない限り、適宜、変更することができる。従って、本発明の範囲は以下に示す具体例に限定されるものではない。なお、特に断りのない限り、「%」および「部」は質量基準である。 The present invention will be described more specifically with reference to the following examples. The materials, amounts used, ratios, processing details, processing procedures, and the like shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Unless otherwise specified, “%” and “parts” are based on mass.
<(C)樹脂1の合成(合成例1)>
 反応容器にシクロヘキサノン570部を入れ、この反応容器に窒素ガスを注入しながら80 ℃ に加熱して、同温度でメタクリル酸23.0部、メチルメタクリレート23.0部、ベンジルメタクリレート35.0部、単量体(a)としてパラクミルフェノールエチレンオキサイド変性アクリレート(東亜合成株式会社製「アロニックスM110 」)22.0部、グリセロールモノメタクリレート48.0部、2,2 '-アゾビスイソブチロニトリル3.0部の混合物を1時間かけて滴下して重合反応を行った。滴下終了後、さらに80 ℃で3時間反応させた後、アゾビスイソブチロニトリル1.0部をシクロヘキサノン50部に溶解させた溶液をこの反応容器に添加し、さらに80 ℃で1時間反応を続けて、透明樹脂共重合体溶液を得た。次に、得られた透明樹脂共重合体溶液336部に対して、2-メタクリロイルエチルイソシアネート33.0部、ラウリン酸ジブチル錫0.4部、シクロヘキサノン130.0部の混合物を70 ℃で3時間かけて滴下して感光性透明樹脂溶液を得た。室温まで冷却した後、感光性透明樹脂溶液約2gをサンプリングして180 ℃ 、20分加熱乾燥して不揮発分を測定し、これを参考にして、先に合成した感光性透明樹脂溶液に不揮発分が20重量%になるようにシクロヘキサノンを添加して感光性樹脂の溶液を調製した。得られた感光性透明樹脂1(樹脂1)の重量平均分子量Mwは21000、エチレン性不飽和二重結合当量は470であった。酸価は50mgKOH/gであった。
Figure JPOXMLDOC01-appb-C000099
<Synthesis of (C) Resin 1 (Synthesis Example 1)>
570 parts of cyclohexanone was placed in a reaction vessel and heated to 80 ° C. while injecting nitrogen gas into the reaction vessel. At the same temperature, 23.0 parts of methacrylic acid, 23.0 parts of methyl methacrylate, 35.0 parts of benzyl methacrylate, As the monomer (a), 22.0 parts of paracumylphenol ethylene oxide modified acrylate (“Aronix M110” manufactured by Toa Gosei Co., Ltd.), 48.0 parts of glycerol monomethacrylate, 2,2′-azobisisobutyronitrile 3 0.0 part of the mixture was added dropwise over 1 hour to carry out the polymerization reaction. After completion of the dropwise addition, the mixture was further reacted at 80 ° C. for 3 hours, and then a solution prepared by dissolving 1.0 part of azobisisobutyronitrile in 50 parts of cyclohexanone was added to the reaction vessel, and further reacted at 80 ° C. for 1 hour. Subsequently, a transparent resin copolymer solution was obtained. Next, a mixture of 33.0 parts of 2-methacryloylethyl isocyanate, 0.4 parts of dibutyltin laurate and 130.0 parts of cyclohexanone was added to 336 parts of the obtained transparent resin copolymer solution at 70 ° C. for 3 hours. The solution was added dropwise to obtain a photosensitive transparent resin solution. After cooling to room temperature, about 2 g of the photosensitive transparent resin solution was sampled and heated and dried at 180 ° C. for 20 minutes to measure the non-volatile content. With reference to this, the non-volatile content was added to the previously synthesized photosensitive transparent resin solution. A solution of a photosensitive resin was prepared by adding cyclohexanone so that the amount of the resin was 20% by weight. The obtained photosensitive transparent resin 1 (resin 1) had a weight average molecular weight Mw of 21000 and an ethylenically unsaturated double bond equivalent of 470. The acid value was 50 mgKOH / g.
Figure JPOXMLDOC01-appb-C000099
<(C)樹脂2および3の合成>
 使用する試薬の種類及び仕込み量を変えた以外は上記合成例1と同様の方法で、(C)樹脂2および3を得た。樹脂2は、重量平均分子量が11000であり、酸価が150mgKOH/gであり、エチレン性不飽和二重結合を含まない。樹脂3は、重量平均分子量が12000であり、酸価が37mgKOH/gであり、エチレン性不飽和二重結合当量が963であった。
Figure JPOXMLDOC01-appb-C000100
Figure JPOXMLDOC01-appb-C000101
<Synthesis of (C) Resins 2 and 3>
Resins 2 and 3 (C) were obtained in the same manner as in Synthesis Example 1 except that the type and amount of reagent used were changed. Resin 2 has a weight average molecular weight of 11,000, an acid value of 150 mgKOH / g, and does not contain an ethylenically unsaturated double bond. Resin 3 had a weight average molecular weight of 12,000, an acid value of 37 mgKOH / g, and an ethylenically unsaturated double bond equivalent of 963.
Figure JPOXMLDOC01-appb-C000100
Figure JPOXMLDOC01-appb-C000101
<(C)樹脂4~7の合成>
 (C)樹脂1の合成において、反応時間を変更することによって、(C)樹脂4~7を得た。樹脂4の重量平均分子量は8000であり、酸価は50mgKOH/g、エチレン性不飽和二重結合当量は470であった。樹脂5の重量平均分子量は38000であり、酸価は50mgKOH/g、エチレン性不飽和二重結合当量は470であった。樹脂6の重量平均分子量は40000であり、酸価は150mgKOH/g、エチレン性不飽和二重結合当量は470であった。樹脂7の重量平均分子量は100000であり、酸価は50mgKOH/g、エチレン性不飽和二重結合当量は470であった。
<Synthesis of (C) Resins 4-7>
(C) Resins 4 to 7 were obtained by changing the reaction time in the synthesis of resin 1. The weight average molecular weight of Resin 4 was 8000, the acid value was 50 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 470. The weight average molecular weight of the resin 5 was 38000, the acid value was 50 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 470. The weight average molecular weight of the resin 6 was 40000, the acid value was 150 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 470. The weight average molecular weight of the resin 7 was 100,000, the acid value was 50 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 470.
<(C)樹脂8および9の合成>
 特許第5210286号公報の段落番号0043の記載を参照して、比較樹脂を合成した。具体的には、メタクリル酸 20.0部、メチルメタクリレート 10.0部、n-ブチルメタクリレート 55.0部、2-ヒドロキシエチルメタクリレート 15.0部を構成要素として樹脂8及び樹脂9を得た。樹脂8および9の重量平均分子量は、それぞれ、40000、100000であった。
<Synthesis of (C) Resins 8 and 9>
A comparative resin was synthesized with reference to the description in paragraph No. 0043 of Japanese Patent No. 5210286. Specifically, Resin 8 and Resin 9 were obtained with 20.0 parts of methacrylic acid, 10.0 parts of methyl methacrylate, 55.0 parts of n-butyl methacrylate, and 15.0 parts of 2-hydroxyethyl methacrylate. The weight average molecular weights of Resins 8 and 9 were 40,000 and 100,000, respectively.
<(C)樹脂10~11の合成>
 (C)樹脂2の合成において、反応時間を変更することによって、(C)樹脂10および11を得た。樹脂10は、重量平均分子量が42000であり、酸価が150mgKOH/gであり、エチレン性不飽和二重結合を含まない。樹脂11は、重量平均分子量が75000であり、酸価が150mgKOH/gであり、エチレン性不飽和二重結合を含まない。
<Synthesis of (C) Resins 10 to 11>
(C) Resins 10 and 11 were obtained by changing the reaction time in the synthesis of resin 2. The resin 10 has a weight average molecular weight of 42,000, an acid value of 150 mgKOH / g, and does not contain an ethylenically unsaturated double bond. Resin 11 has a weight average molecular weight of 75,000, an acid value of 150 mgKOH / g, and does not contain an ethylenically unsaturated double bond.
<(C)樹脂12~13の合成>
 (C)樹脂3の合成において、反応時間を変更することによって、(C)樹脂12および13を得た。樹脂12の重量平均分子量は45000であり、酸価は37mgKOH/gであり、エチレン性不飽和二重結合当量は963であった。樹脂13の重量平均分子量は62000であり、酸価は37mgKOH/gであり、エチレン性不飽和二重結合当量は963であった。
<(C) Synthesis of Resins 12-13>
(C) Resins 12 and 13 were obtained by changing the reaction time in the synthesis of resin 3. The weight average molecular weight of the resin 12 was 45000, the acid value was 37 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 963. The weight average molecular weight of the resin 13 was 62000, the acid value was 37 mgKOH / g, and the ethylenically unsaturated double bond equivalent was 963.
<(D)顔料分散剤1の合成>
 ガス導入管、温度計、コンデンサ、攪拌機を備えた反応容器に、1-ドデカノール62.6部、ε-カプロラクトン287.4部、触媒としてモノブチルスズ(IV)オキシド0.1部を仕込み、窒素ガスで置換した後、120℃で4時間加熱、撹拌した。次いで、固形分測定により98%が反応したことを確認した後、ここに無水ピロメリット酸36.6部を加え、120℃で2時間反応させた。酸価の測定により、98%以上の酸無水物がハーフエステル化していることを確認した後、反応を終了して顔料分散剤1を得た。得られた顔料分散剤1の酸価は49mgKOH/gであった。
<Synthesis of (D) Pigment Dispersant 1>
A reaction vessel equipped with a gas introduction tube, a thermometer, a condenser, and a stirrer is charged with 62.6 parts of 1-dodecanol, 287.4 parts of ε-caprolactone, and 0.1 part of monobutyltin (IV) oxide as a catalyst. Then, the mixture was heated and stirred at 120 ° C. for 4 hours. Subsequently, after confirming that 98% had reacted by solid content measurement, 36.6 parts of pyromellitic anhydride was added here, and it was made to react at 120 degreeC for 2 hours. After confirming that 98% or more of the acid anhydride had been half-esterified by measuring the acid value, the reaction was terminated to obtain Pigment Dispersant 1. The acid value of the obtained pigment dispersant 1 was 49 mgKOH / g.
<(D)顔料分散剤2の合成>
 ガス導入管、温度計、コンデンサ、攪拌機を備えた反応容器に、ラウリルアルコール186g、ε-カプロラクトンモノマー571g、テトラブチルチタネート0.6gを仕込み、窒素ガスで置換した後、120℃で3時間加熱、撹拌した。カプロラクトンモノマーの消失を、テトラハイドロフランを溶離液とするGPC(ゲルパーミエーションクロマトグラフィ)のRI検出器により確認した。この反応容器を40℃以下に冷却した後、オルトリン酸換算含有量116%のポリリン酸84.5gと混合し、徐々に昇温し、80℃で6時間、攪拌しながら加熱した。これにより、上記一般式(3)で表されるリン酸系分散剤である顔料分散剤2を得た。上記一般式(3)において、R3の数平均分子量が760、y=1と2の存在比が100:12であった。得られた顔料分散剤2の酸価は166であった。
<Synthesis of (D) Pigment Dispersant 2>
A reaction vessel equipped with a gas introduction tube, a thermometer, a condenser, and a stirrer was charged with 186 g of lauryl alcohol, 571 g of ε-caprolactone monomer and 0.6 g of tetrabutyl titanate, and replaced with nitrogen gas, and then heated at 120 ° C. for 3 hours. Stir. The disappearance of the caprolactone monomer was confirmed by a GPC (gel permeation chromatography) RI detector using tetrahydrofuran as an eluent. After cooling this reaction container to 40 degrees C or less, it mixed with 84.5 g of polyphosphoric acid of 116% orthophosphoric acid content, heated up gradually, and heated at 80 degreeC for 6 hours, stirring. This obtained the pigment dispersant 2 which is a phosphoric acid type dispersant represented by the said General formula (3). In the general formula (3), the number average molecular weight of R 3 was 760, and the abundance ratio of y = 1 and 2 was 100: 12. The acid value of the obtained pigment dispersant 2 was 166.
<赤色顔料分散液の調製>
 赤色顔料(C.I.Pigment Red254)を7.75質量部、黄色顔料(C.I.Pigment Yellow139)を2.33質量部、下記表1に示した顔料誘導体を1.12部、下記表1に示した顔料分散剤を7.34質量部、PGMEAを81.46質量部、含んで構成される混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。この顔料分散液に対して、その後さらに、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2000kg/cm3の圧力下で流量500g/minとして分散処理を行なった。この分散処理を10回繰り返し、赤色顔料分散液を得た。
<Preparation of red pigment dispersion>
7.75 parts by weight of a red pigment (CI Pigment Red254), 2.33 parts by weight of a yellow pigment (CI Pigment Yellow 139), 1.12 parts of a pigment derivative shown in Table 1 below, A mixed liquid containing 7.34 parts by mass of the pigment dispersant shown in 1 and 81.46 parts by mass of PGMEA was mixed and dispersed by a bead mill (zirconia beads 0.3 mm diameter) for 3 hours to obtain a pigment. A dispersion was prepared. Thereafter, the pigment dispersion is further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.). I did it. This dispersion treatment was repeated 10 times to obtain a red pigment dispersion.
<橙色顔料を含む赤色顔料分散液の調製>
 赤色顔料(C.I.Pigment Red254)を1.38質量部、赤色顔料(C.I.Pigment Red177)を3.02質量部、黄色顔料(C.I.Pigment Yellow139)を1.23質量部、橙色顔料(C.I.Pigment Orange71)を5.44質量部、下記表1に示した顔料誘導体を1.23部、下記表1に示した顔料分散剤を6.80質量部、PGMEAを80.90質量部、含んで構成される混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。この顔料分散液をその後さらに、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2000kg/cm3の圧力下で流量500g/minとして分散処理した。この分散処理を10回繰り返し、橙色顔料を含む赤色顔料分散液を得た。
<Preparation of red pigment dispersion containing orange pigment>
1.38 parts by weight of red pigment (CI Pigment Red254), 3.02 parts by weight of red pigment (CI Pigment Red177), 1.23 parts by weight of yellow pigment (CI Pigment Yellow 139) , 5.44 parts by mass of an orange pigment (CI Pigment Orange 71), 1.23 parts of the pigment derivative shown in Table 1 below, 6.80 parts by mass of the pigment dispersant shown in Table 1 below, and PGMEA A mixed liquid composed of 80.90 parts by mass was mixed and dispersed by a bead mill (zirconia beads 0.3 mm diameter) for 3 hours to prepare a pigment dispersion. This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a red pigment dispersion containing an orange pigment.
<緑色顔料分散液の調製>
 緑色顔料(C.I.Pigment Green36またはC.I.Pigment Green7)を8.96質量部、下記表1に示した顔料誘導体を1.00部、下記表1に示した顔料分散剤を5.95質量部、PGMEAを84.10質量部、含んで構成される混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。この顔料分散液をその後さらに、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2000kg/cm3の圧力下で流量500g/minとして分散処理した。この分散処理を10回繰り返し、緑色顔料分散液を得た。表1において、C.I.Pigment Green36を含む緑色顔料分散液を用いた場合をPG36と、C.I.Pigment Green7を含む緑色顔料分散液を用いた場合をPG7と示した。
<Preparation of green pigment dispersion>
8.96 parts by mass of a green pigment (CI Pigment Green 36 or CI Pigment Green 7), 1.00 parts of the pigment derivative shown in Table 1 below, and 5. 5 of the pigment dispersant shown in Table 1 below. A mixed liquid containing 95 parts by mass and 84.10 parts by mass of PGMEA was mixed and dispersed by a bead mill (zirconia beads 0.3 mm diameter) for 3 hours to prepare a pigment dispersion. This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a green pigment dispersion. In Table 1, C.I. I. Pigment Green 36 containing a green pigment dispersion is used as PG36, C.I. I. The case of using a green pigment dispersion containing Pigment Green 7 was designated as PG7.
<青色顔料分散液の調製>
 青色顔料(C.I.Pigment Blue15:6)を9.54質量部、下記表1に示した顔料誘導体を1.06部、下記表1に示した顔料分散剤を3.17質量部、PGMEAを68.98質量部、シクロヘキサノンを17.25質量部、含んで構成される混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。この顔料分散液をその後さらに、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2000kg/cm3の圧力下で流量500g/minとして分散処理した。この分散処理を10回繰り返し、青色顔料分散液を得た。下記表1では、この青色顔料分散液を用いた場合をPB15:6と示した。
<Preparation of blue pigment dispersion>
9.54 parts by mass of a blue pigment (CI Pigment Blue 15: 6), 1.06 parts of a pigment derivative shown in Table 1 below, 3.17 parts by mass of a pigment dispersant shown in Table 1 below, PGMEA Was mixed and dispersed in a bead mill (zirconia beads 0.3 mm diameter) for 3 hours to prepare a pigment dispersion. This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a blue pigment dispersion. In Table 1 below, the case of using this blue pigment dispersion is indicated as PB15: 6.
<黒色顔料分散液の調製>
 黒色顔料(チタンブラックまたはカーボンブラック)を20.34質量部、下記表1に示した顔料分散剤を10.40質量部、PGMEAを69.26質量部、含んで構成される混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。この顔料分散液をその後さらに、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2000kg/cm3の圧力下で流量500g/minとして分散処理した。この分散処理を10回繰り返し、黒色顔料分散液を得た。チタンブラックは特開2012-150468号公報の段落番号0387に記載の方法で作成した。カーボンブラックは、特開2011-203506号公報の段落番号0267に記載のものを用いた。表1において、チタンブラックを含む黒色顔料分散液を用いた場合をチタンブラックと、カーボンブラックを含む黒色顔料分散液を用いた場合をカーボンブラックと記載した。
<Preparation of black pigment dispersion>
A mixed liquid comprising 20.34 parts by mass of a black pigment (titanium black or carbon black), 10.40 parts by mass of a pigment dispersant shown in Table 1 below, and 69.26 parts by mass of PGMEA A pigment dispersion was prepared by mixing and dispersing for 3 hours using (zirconia beads 0.3 mm diameter). This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a black pigment dispersion. Titanium black was prepared by the method described in paragraph number 0387 of JP2012-150468A. As the carbon black, the one described in paragraph number 0267 of JP2011-203506A was used. In Table 1, the case of using a black pigment dispersion containing titanium black was described as titanium black, and the case of using a black pigment dispersion containing carbon black as carbon black.
<赤色顔料と黒色顔料を含む共分散液の調製例((B)/全顔料濃度=0.048の場合)>
 赤色顔料を7.56質量部、黄色顔料を2.27質量部、黒色顔料を0.49質量部、下記表1に示した顔料誘導体を1.09部、下記表1に示した顔料分散剤を7.41質量部、PGMEAを81.17質量部、含んで構成される混合液を、ビーズミル(ジルコニアビーズ0.3mm径)により3時間混合及び分散して、顔料分散液を調製した。この顔料分散液をその後さらに、減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製)を用いて、2000kg/cm3の圧力下で流量500g/minとして分散処理した。この分散処理を10回繰り返し、赤色顔料と黒色顔料を含む共分散液を得た。
<Example of preparation of co-dispersing liquid containing red pigment and black pigment ((B) / total pigment concentration = 0.048)>
7.56 parts by mass of a red pigment, 2.27 parts by mass of a yellow pigment, 0.49 parts by mass of a black pigment, 1.09 parts of a pigment derivative shown in Table 1 below, and a pigment dispersant shown in Table 1 below Was mixed and dispersed with a bead mill (zirconia beads 0.3 mm diameter) for 3 hours to prepare a pigment dispersion. This pigment dispersion was then further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain a co-dispersion liquid containing a red pigment and a black pigment.
<赤色顔料と緑色顔料を含む共分散液、赤色顔料と青色顔料を含む共分散液>
 上記と同様にして、赤色顔料と緑色顔料を含む共分散液、赤色顔料と青色顔料を含む共分散液も同様に比率が合うように調製した。
<Co-dispersing liquid containing red pigment and green pigment, co-dispersing liquid containing red pigment and blue pigment>
In the same manner as described above, a co-dispersion liquid containing a red pigment and a green pigment and a co-dispersion liquid containing a red pigment and a blue pigment were similarly prepared so that the ratios were matched.
<感光性樹脂組成物の調製(処方1)>
 上記で得られた顔料分散液を用い、下記組成となるよう各成分を混合、撹拌して、感光性樹脂組成物を調製した。
・赤色顔料分散液                          54.63部
・黒色、青色または緑色分散液
 (B)/全顔料濃度が表1の値となるように添加量を調整した。
 例えば、(B)/全顔料濃度=0.048、黒色顔料分散液の場合    1.35部
 例えば、(B)/全顔料濃度=0.048、緑色顔料分散液の場合    3.07部
 例えば、(B)/全顔料濃度=0.048、青色顔料分散液の場合    2.89部
・樹脂(表1に記載のものを用いた)                  0.61部
・重合性化合物(KAYARAD RP-1040、日本化薬(株)製)  3.10部
・光重合開始剤(OXE-01、BASF社製)             0.34部
・界面活性剤(メガファックF-781、DIC(株)製、0.2% EEP溶液)                              4.17部
・PGMEA                            30.91部
・EEP                               4.89部
・p-メトキシフェノール                      0.003部
<Preparation of photosensitive resin composition (Formulation 1)>
Using the pigment dispersion obtained above, each component was mixed and stirred so as to have the following composition to prepare a photosensitive resin composition.
-Red pigment dispersion 54.63 parts-Black, blue or green dispersion (B) / The amount added was adjusted so that the total pigment concentration was the value shown in Table 1.
For example, (B) / total pigment concentration = 0.048, in the case of black pigment dispersion 1.35 parts. For example, (B) / total pigment concentration = 0.048, in the case of green pigment dispersion 3.07 parts. (B) / total pigment concentration = 0.048, in the case of blue pigment dispersion 2.89 parts · resin (using the one shown in Table 1) 0.61 part · polymerizable compound (KAYARAD RP-1040, Japan 3.10 parts ・ Photopolymerization initiator (OXE-01, manufactured by BASF Corp.) 0.34 parts ・ Surfactant (Megafac F-781, manufactured by DIC Corporation, 0.2%) EEP solution) 4.17 parts · PGMEA 30.91 parts · EEP 4.89 parts · p-methoxyphenol 0.003 parts
<感光性樹脂組成物の調製(処方2)>
 上記で得られた顔料分散液を用い、下記組成となるよう各成分を混合、撹拌して、感光性樹脂組成物を調製した。
・橙色顔料を含む赤色顔料分散液                   67.24部
・黒色、青色または緑色分散液
 (B)/全顔料濃度が表1の値となるように添加量を調整した。
 例えば、(B)/全顔料濃度=0.048、黒色顔料分散液の場合    1.80部
 例えば、(B)/全顔料濃度=0.048、緑色顔料分散液の場合    4.08部
 例えば、(B)/全顔料濃度=0.048、青色顔料分散液の場合    3.83部
・樹脂(表1に記載のものを用いた)                  1.90部
・重合性化合物(A-DPH-12E、新中村化学工業(株)製)     0.56部
・光重合開始剤(OXE-02、BASF社製)             0.80部
・界面活性剤(メガファックF-781、DIC(株)製、1.0% PGMEA溶液)                            4.17部
・PGMEA                            21.26部
・p-メトキシフェノール                      0.003部
<Preparation of photosensitive resin composition (Formulation 2)>
Using the pigment dispersion obtained above, each component was mixed and stirred so as to have the following composition to prepare a photosensitive resin composition.
-Red pigment dispersion containing orange pigment 67.24 parts-Black, blue or green dispersion (B) / The addition amount was adjusted so that the total pigment concentration was the value shown in Table 1.
For example, (B) / total pigment concentration = 0.048, in the case of black pigment dispersion 1.80 parts For example, (B) / total pigment concentration = 0.048, in the case of green pigment dispersion 4.08 parts (B) / total pigment concentration = 0.048, in the case of blue pigment dispersion 3.83 parts · resin (the one described in Table 1) 1.90 parts · polymerizable compound (A-DPH-12E, Shin-Nakamura Chemical Co., Ltd.) 0.56 parts Photopolymerization initiator (OXE-02, manufactured by BASF) 0.80 parts Surfactant (Megafac F-781, manufactured by DIC Corporation) 0% PGMEA solution) 4.17 parts PGMEA 21.26 parts p-methoxyphenol 0.003 parts
<感光性樹脂組成物の調製(処方3)((B)/全顔料濃度=0.048の場合)>
 上記で得られた顔料分散液を用い、下記組成となるよう各成分を混合、撹拌して、感光性樹脂組成物を調製した。
・共分散液                             55.98部
・樹脂(表1に記載のものを用いた)                  0.61部
・重合性化合物(KAYARAD RP-1040、日本化薬(株)製)  3.10部
・光重合開始剤(OXE-01、BASF社製)             0.34部
・界面活性剤(メガファックF-781、DIC(株)製、0.2% EEP溶液)                              4.17部
・PGMEA                            30.91部
・EEP                               4.89部
・p-メトキシフェノール                      0.003部
<Preparation of photosensitive resin composition (formulation 3) ((B) / total pigment concentration = 0.048)>
Using the pigment dispersion obtained above, each component was mixed and stirred so as to have the following composition to prepare a photosensitive resin composition.
-Co-dispersing liquid 55.98 parts-Resin (using the one listed in Table 1) 0.61 parts-Polymerizable compound (KAYARAD RP-1040, Nippon Kayaku Co., Ltd.) 3.10 parts-Photopolymerization Initiator (OXE-01, manufactured by BASF) 0.34 parts ・ Surfactant (Megafac F-781, manufactured by DIC Corporation, 0.2% EEP solution) 4.17 parts ・ PGMEA 30.91 parts ・EEP 4.89 parts p-methoxyphenol 0.003 parts
顔料分散剤3
Figure JPOXMLDOC01-appb-C000102
顔料分散剤4
Figure JPOXMLDOC01-appb-C000103
Pigment dispersant 3
Figure JPOXMLDOC01-appb-C000102
Pigment dispersant 4
Figure JPOXMLDOC01-appb-C000103
顔料分散剤5:Disperbyk111、ビックケミー・ジャパン社製 Pigment dispersant 5: Disperbyk 111, manufactured by Big Chemie Japan
顔料誘導体1
Figure JPOXMLDOC01-appb-C000104
顔料誘導体2
Figure JPOXMLDOC01-appb-C000105
顔料誘導体3
Figure JPOXMLDOC01-appb-C000106
顔料誘導体4
Figure JPOXMLDOC01-appb-C000107
Pigment derivative 1
Figure JPOXMLDOC01-appb-C000104
Pigment derivative 2
Figure JPOXMLDOC01-appb-C000105
Pigment derivative 3
Figure JPOXMLDOC01-appb-C000106
Pigment derivative 4
Figure JPOXMLDOC01-appb-C000107
Figure JPOXMLDOC01-appb-T000108
 上記表1において、(B)/(全顔料)は、(黒色顔料、緑色顔料または青色顔料の量)/(全顔料の合計量)(単位:質量比)を示している。
 (D)顔料分散剤(A用)は、赤色顔料分散液に用いた顔料分散剤の種類を示しており、(D)顔料分散剤(B用)は、黒色顔料分散液、緑色顔料分散液または青色顔料分散液に用いた顔料分散剤の種類を示している。顔料誘導体についても同様である。
Figure JPOXMLDOC01-appb-T000108
In Table 1 above, (B) / (total pigment) represents (amount of black pigment, green pigment or blue pigment) / (total amount of all pigments) (unit: mass ratio).
(D) Pigment dispersant (for A) indicates the type of pigment dispersant used in the red pigment dispersion, and (D) Pigment dispersant (for B) is a black pigment dispersion or a green pigment dispersion. Or the kind of pigment dispersant used for the blue pigment dispersion is shown. The same applies to pigment derivatives.
<評価>
<<分光透過率の測定>>
 得られた感光性樹脂組成物を、塗布後の膜厚が1.0μmになるように、ガラスウェハ(基板)上にスピンコート法で塗布し、その後ホットプレート上で、100℃で2分間加熱した。さらに、ホットプレート上で200℃で8分間加熱し、着色感光性樹脂組成物層を形成した。
 この着色感光性樹脂組成物層が形成された基板に対して、分光光度計MCPD-3000(大塚電子(株)製)を用いて、分光透過率を測定した。650nmの分光透過率を表2に示す。
<Evaluation>
<< Measurement of spectral transmittance >>
The obtained photosensitive resin composition is applied on a glass wafer (substrate) by spin coating so that the film thickness after application is 1.0 μm, and then heated at 100 ° C. for 2 minutes on a hot plate. did. Furthermore, it heated for 8 minutes at 200 degreeC on the hotplate, and the colored photosensitive resin composition layer was formed.
The spectral transmittance of the substrate on which the colored photosensitive resin composition layer was formed was measured using a spectrophotometer MCPD-3000 (manufactured by Otsuka Electronics Co., Ltd.). The spectral transmittance at 650 nm is shown in Table 2.
<<液経時45℃/1週間後の分光>>
 上記で得られた実施例及び比較例の感光性樹脂組成物を45℃で1週間経時させ、次いで、0.60μmフィルタでろ過した後に、上記と同様に分光透過率を測定した。また、液経時前の分光透過率と液経時後の分光透過率の差を算出し、以下の基準で評価した。
~判定基準~
6:分光透過率差分<0.1ポイント
5:0.1ポイント≦分光透過率差分<0.5ポイント
4:0.5ポイント≦分光透過率差分<1.0ポイント
3:1.0ポイント≦分光透過率差分<2.0ポイント
2:2.0ポイント≦分光透過率差分<3.0ポイント
1:5ポイント≦分光透過率差分 
<< Liquid aging at 45 ° C / spectrum after 1 week >>
The photosensitive resin compositions of Examples and Comparative Examples obtained above were aged at 45 ° C. for 1 week, then filtered through a 0.60 μm filter, and the spectral transmittance was measured in the same manner as described above. Further, the difference between the spectral transmittance before the liquid aging and the spectral transmittance after the liquid aging was calculated and evaluated according to the following criteria.
~ Criteria ~
6: Spectral transmittance difference <0.1 point 5: 0.1 point ≦ Spectral transmittance difference <0.5 point 4: 0.5 point ≦ Spectral transmittance difference <1.0 point 3: 1.0 point ≦ Spectral transmittance difference <2.0 points 2: 2.0 points ≦ Spectral transmittance difference <3.0 points 1: 5 points ≦ Spectral transmittance difference
<<液経時45℃/1週間後の微細パターンリソ残渣>>
 得られた感光性樹脂組成物を45℃で1週間経時させた後に、後述のように作製した下塗り層付シリコンウェハ上に塗布後の膜厚が1.0μmになるようにスピンコーターを用いて塗布し、100℃のホットプレートを用いて120秒間加熱処理(プリベーク)を行った。
 次いで、i線ステッパー露光装置FPA-3000i5+(Canon(株)製)を使用して、365nmの波長で2.0μm四方のアイランドパターンマスクを通してパターンサイズが2.0μm四方になるように露光量を調整して露光した。
 その後、露光された塗布膜が形成されている下塗り層付シリコンウェハを、水酸化テトラメチルアンモニウム(TMAH)0.3%水溶液を用い、23℃で60秒間パドル現像を行った。その後、スピンシャワーにてリンスを行い、さらに純水にて水洗し、200℃のホットプレートを用いて480秒間加熱処理(ポストベーク)を行い、2.0μm四方のアイランドパターンが形成された単色カラーフィルタを得た。
 得られた2.0μm四方のアイランドパターンに対して、測長SEM(S-4800、日立社製)を用いて、パターン周辺の残渣を観察し以下の基準で評価した。なお、感光性樹脂組成物の調製直後(液経時前)には、いずれの感光性樹脂組成物を用いても残渣は観察されず、良好なパターンが形成されていた。
~判定基準~
6:残渣は観察されない。
5:残渣がごくわずかに観察される。
4:残渣がわずかに観察される。
3:残渣が観察されるが、実用上問題ないレベルである。
2:残渣が観察され、実用できないレベルである。
1:パターン周辺の下地上一面に残渣が観察される。
<< Liquid pattern 45 ° C / fine pattern litho residue after 1 week >>
The obtained photosensitive resin composition was aged at 45 ° C. for 1 week, and then applied onto a silicon wafer with an undercoat layer produced as described later using a spin coater so that the film thickness after application was 1.0 μm. It apply | coated and heat-processed (prebaked) for 120 second using the 100 degreeC hotplate.
Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), the exposure amount is adjusted so that the pattern size becomes 2.0 μm square through a 2.0 μm square island pattern mask at a wavelength of 365 nm. And exposed.
Thereafter, paddle development was performed on the silicon wafer with the undercoat layer on which the exposed coating film was formed using a 0.3% aqueous solution of tetramethylammonium hydroxide (TMAH) at 23 ° C. for 60 seconds. After that, rinsing with a spin shower, further washing with pure water, and heat treatment (post-baking) for 480 seconds using a 200 ° C. hot plate, a monochrome color in which an island pattern of 2.0 μm square is formed. A filter was obtained.
With respect to the obtained 2.0 μm square island pattern, a length measurement SEM (S-4800, manufactured by Hitachi, Ltd.) was used to observe residues around the pattern and evaluated according to the following criteria. In addition, immediately after preparation of the photosensitive resin composition (before liquid aging), no residue was observed even if any photosensitive resin composition was used, and a favorable pattern was formed.
~ Criteria ~
6: No residue is observed.
5: Very little residue is observed.
4: A residue is slightly observed.
3: Although a residue is observed, it is a level which is satisfactory practically.
2: A residue is observed and is a level which cannot be used practically.
1: Residue is observed on the entire surface below the pattern.
<<下塗り層付シリコンウェハの作製方法>>
 評価に用いた下塗り層付シリコンウェハは、以下のようにして作製した。
 8インチシリコンウェハ上に、CT-4000L(富士フイルムエレクトロニクスマテリアルズ(株)製)をスピンコートで均一に塗布して塗布膜を形成し、形成された塗布膜を220℃のオーブンで1時間処理し、塗布膜を硬化させ、下塗り層とした。尚、スピンコートの塗布回転数は、前記加熱処理後の塗布膜の膜厚が約0.1μmとなるように調整した。
<< Method for producing silicon wafer with undercoat layer >>
The silicon wafer with the undercoat layer used for evaluation was produced as follows.
On an 8-inch silicon wafer, CT-4000L (manufactured by FUJIFILM Electronics Materials Co., Ltd.) is uniformly applied by spin coating to form a coating film, and the formed coating film is processed in an oven at 220 ° C. for 1 hour. Then, the coating film was cured to form an undercoat layer. The spin coating speed was adjusted so that the thickness of the coating film after the heat treatment was about 0.1 μm.
Figure JPOXMLDOC01-appb-T000109
Figure JPOXMLDOC01-appb-T000109
 上記表2から、酸基を含有する樹脂を含むものの、その樹脂の重量平均分子量が38000以下でない比較例の感光性樹脂組成物は、分光の変動が大きく、さらにリソ残渣が多いことが分かった。このように、比較例の感光性樹脂組成物は、微細パターン解像性に劣ることが分かった。
 これらに対し、(C)酸基を含有し、重量平均分子量が38000以下である樹脂を有する実施例の感光性樹脂組成物は、分光の変動が小さく(分光の変動性に優れ)、さらにリソ残渣が少ないことが分かった。このように、実施例の感光性樹脂組成物は、微細パターン解像性に優れることが分かった。
From Table 2 above, it was found that the photosensitive resin composition of Comparative Example, which contains a resin containing an acid group, but the weight average molecular weight of the resin is not 38000 or less, has large spectral fluctuations and more litho residues. . Thus, it turned out that the photosensitive resin composition of a comparative example is inferior to fine pattern resolution.
On the other hand, the photosensitive resin composition of the example having (C) a resin containing an acid group and having a weight average molecular weight of 38000 or less has a small spectral fluctuation (excellent spectral variability), and is more It was found that there was little residue. Thus, it turned out that the photosensitive resin composition of an Example is excellent in fine pattern resolution.

Claims (18)

  1.  (A)顔料、(B)顔料、(C)酸基を含有し重量平均分子量が38000以下である樹脂、(D)顔料分散剤、および(E)顔料誘導体を含む着色感光性樹脂組成物であって、
     前記(A)顔料は、赤色顔料および橙色顔料から選択される少なくとも1種からなり、かつ、前記(A)顔料に対する赤色顔料の質量比が0.3以上であり、
     前記(B)顔料は、緑色顔料、青色顔料および黒色顔料から選択される少なくとも1種からなり、
     前記着色感光性樹脂組成物に含まれる全顔料に対する前記(B)顔料の質量比が0.005~0.25であることを特徴とする着色感光性樹脂組成物。
    A colored photosensitive resin composition comprising (A) a pigment, (B) a pigment, (C) a resin having an acid group and a weight average molecular weight of 38000 or less, (D) a pigment dispersant, and (E) a pigment derivative. There,
    The (A) pigment comprises at least one selected from a red pigment and an orange pigment, and the mass ratio of the red pigment to the (A) pigment is 0.3 or more,
    The (B) pigment comprises at least one selected from a green pigment, a blue pigment and a black pigment,
    A colored photosensitive resin composition, wherein a mass ratio of the pigment (B) to the total pigment contained in the colored photosensitive resin composition is 0.005 to 0.25.
  2.  前記(D)顔料分散剤が、
     (D-1)少なくとも一つの末端に水酸基を有する重合体もしくは少なくとも一つの末端に第1級アミノ基を有する重合体と、トリカルボン酸無水物もしくはテトラカルボン酸二無水物とを反応させてなるカルボン酸系分散剤、
     (D-2)下記一般式(3)で表されるリン酸系分散剤、
     (D-3)下記一般式(1)および下記一般式(2)のいずれかで表される構造単位を含む共重合体、並びに、
     (D-4)主鎖に窒素原子を含むグラフト共重合体、
     から選択される少なくとも1種である、請求項1に記載の着色感光性樹脂組成物。
    Figure JPOXMLDOC01-appb-C000001
     一般式(3)中、R3は数平均分子量400~30000のポリエステル構造を表し、yは1または2を表す。yが2の場合、複数のR3は、それぞれ、同一であっても異なっていてもよい。
    Figure JPOXMLDOC01-appb-C000002
     一般式(1)および(2)中、R1~R6は、それぞれ、水素原子、又は1価の有機基を表し、
     X1及びX2は、それぞれ、-CO-、-C(=O)O-、-CONH-、-OC(=O)-、又はフェニレン基を表し、
     L1及びL2は、それぞれ、単結合、又は2価の有機連結基を表し、
     A1及びA2は、それぞれ、1価の有機基を表し、
     m及びnは、それぞれ、2~8の整数を表し、
     p及びqは、それぞれ、1~100の整数を表す。
    The (D) pigment dispersant is
    (D-1) A carboxylic acid obtained by reacting a polymer having a hydroxyl group at at least one terminal or a polymer having a primary amino group at at least one terminal with a tricarboxylic acid anhydride or tetracarboxylic dianhydride. Acid dispersants,
    (D-2) a phosphoric acid dispersant represented by the following general formula (3):
    (D-3) a copolymer containing a structural unit represented by any one of the following general formula (1) and the following general formula (2), and
    (D-4) a graft copolymer containing a nitrogen atom in the main chain;
    The colored photosensitive resin composition of Claim 1 which is at least 1 sort (s) selected from these.
    Figure JPOXMLDOC01-appb-C000001
    In the general formula (3), R 3 represents a polyester structure having a number average molecular weight of 400 to 30,000, and y represents 1 or 2. When y is 2, the plurality of R 3 may be the same or different.
    Figure JPOXMLDOC01-appb-C000002
    In the general formulas (1) and (2), R 1 to R 6 each represent a hydrogen atom or a monovalent organic group,
    X 1 and X 2 each represent —CO—, —C (═O) O—, —CONH—, —OC (═O) —, or a phenylene group,
    L 1 and L 2 each represent a single bond or a divalent organic linking group,
    A 1 and A 2 each represent a monovalent organic group,
    m and n each represents an integer of 2 to 8,
    p and q each represents an integer of 1 to 100.
  3.  前記(E)顔料誘導体が、
     一般式(I)で表される顔料誘導体、
     一般式(II)で表される顔料誘導体、および
     一般式(III)で表される顔料誘導体、
     の少なくとも1種である、請求項1または2に記載の着色感光性樹脂組成物。
    Figure JPOXMLDOC01-appb-C000003
     一般式(I)中、Dyeはn価の有機色素残基を表し、
     Xは単結合、-CONH-Y2-、-SO2NH-Y2-または-CH2NHCOCH2NH-Y2-を表し、Y2は置換基を有していても良いアルキレン基またはアリーレン基を表し、
     Y1は-NH-または-O-を表し、
     Zは、nが1を表す場合は水酸基、アルコキシ基、下記一般式(I-1)で表される基、または-NH-X-Dyeを表し、Xは一般式(I)中のXと同義であり、nが2~4の整数を表す場合はそれぞれ水酸基、アルコキシ基、または下記一般式(I-1)で表される基を表し、
     R1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、R1とR2が互いに結合して窒素原子を含むヘテロ環を形成してもよい。
     mは1~6の整数を表し、nは1~4の整数を表す。
     nが2以上の場合、複数のX、Y1、R1、およびR2は、それぞれ、同一であってもよく、異なっていてもよい。
    Figure JPOXMLDOC01-appb-C000004
     一般式(I-1)中、Y3は-NH-または-O-を表す。
     R1およびR2はそれぞれ、置換基を有していても良いアルキル基を表し、R1とR2が互いに結合して窒素原子を含むヘテロ環を形成してもよい。mは1~6の整数を表す。
    Figure JPOXMLDOC01-appb-C000005
     一般式(II)中、Dyeは置換基を有していてもよいキノフタロン残基を表し、
     X1は、-NR’SO2-、-SO2NR’-、-CONR’-、-CH2NR’COCH2NR’-、または-NR’CO-を表し、X2は、置換基を有していてもよい炭素数が6~20のアリーレン基、または置換基を有していてもよい炭素数が4~20の複素芳香環基を表し、これらの基は、-NR’-、-O-、-SO2-または-CO-から選ばれる2価の連結基で相互に結合されていてもよい。R’は、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。
     X3は、-NR’-または-O-を表す。

     AおよびBは、それぞれ、下記一般式(II-1)で表される基、下記一般式(II-2)で表される基、-O-(CH2n-R8、-OR9、-NR1011、-Cl、-Fおよび-X3-X2-X1-Dyeから選ばれる基を表し、R8は置換されていてもよい含窒素複素環残基を表し、R9、R10、R11は、それぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基または置換基を有していてもよい炭素数が6~20のアリール基を表し、nは0~20の整数を表す。
     AおよびBのいずれか一方は、下記一般式(II-1)で表される基、下記一般式(II-2)で表される基、-O-(CH2)n-R8、-OR9または-NR1011であり、tは1~3の整数を表す。tが2以上の場合、複数のX1、X2、X3、A、およびBは同一であってもよく、異なっていてもよい。
    Figure JPOXMLDOC01-appb-C000006
     一般式(II-1)中、Y1は-NR’-または-O-を表し、
     Y2は置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基、または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、これらの基は、-NR’-、-O-、-SO2-、-CO-から選ばれる2価の連結基で相互に結合されていてもよい。R’は、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。
     R1およびR2はそれぞれ、置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す。R1とR2が一体となって、更なる窒素原子、酸素原子または硫黄原子を含み置換されていてもよい複素環構造を形成してもよい。
     一般式(II-2)中、Z1はトリアジン環と窒素原子を結ぶ単結合、-NR’-、-NR’-G-CO-、-NR’-G-CONR’’-、-NR’-G-SO2-、-NR’-G-SO2NR’’-、-O-G-CO-、-O-G-CONR’-、-O-G-SO2-または-O-G-SO2NR’-を表し、Gは置換基を有していてもよい炭素数が1~20のアルキレン基、置換基を有していてもよい炭素数が2~20のアルケニレン基または置換基を有していてもよい炭素数が6~20のアリーレン基を表し、R’およびR’’は、それぞれ水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表す。
     R3、R4、R5、およびR6はそれぞれ、水素原子、置換基を有していてもよい炭素数が1~20のアルキル基、置換基を有していてもよい炭素数が2~20のアルケニル基、または置換基を有していてもよい炭素数が6~20のアリール基を表し、R7は置換基を有していてもよい炭素数が1~20のアルキル基、または置換基を有していてもよい炭素数が2~20のアルケニル基を表す。
    一般式(III)
    Figure JPOXMLDOC01-appb-C000007
     一般式(III)中、Aは、X-Yとともにアゾ顔料を形成しうる成分を表す。
     Xは、単結合、または下記群A中の二価の連結基から選択される基を表す。
     Yは、下記一般式(III-2)で表される基を表す。
    群A:
    Figure JPOXMLDOC01-appb-C000008
    Figure JPOXMLDOC01-appb-C000009
     一般式(III-2)中、Zは、炭素数1~5のアルキレン基を表し、
     R2は、炭素数1~4のアルキル基、または窒素原子を含む5または6員飽和ヘテロ環を表す。 aは1または2を表す。*はXとの結合部位を表す。
    The (E) pigment derivative is
    A pigment derivative represented by the general formula (I),
    A pigment derivative represented by the general formula (II), and a pigment derivative represented by the general formula (III),
    The colored photosensitive resin composition according to claim 1 or 2, which is at least one of the following.
    Figure JPOXMLDOC01-appb-C000003
    In general formula (I), Dye represents an n-valent organic dye residue,
    X represents a single bond, —CONH—Y 2 —, —SO 2 NH—Y 2 — or —CH 2 NHCOCH 2 NH—Y 2 —, and Y 2 represents an alkylene group or arylene which may have a substituent. Represents a group,
    Y 1 represents —NH— or —O—,
    Z represents a hydroxyl group, an alkoxy group, a group represented by the following general formula (I-1), or —NH—X-Dye when n represents 1, and X represents X in the general formula (I) When n represents an integer of 2 to 4, it represents a hydroxyl group, an alkoxy group, or a group represented by the following general formula (I-1),
    R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 may be bonded to each other to form a heterocyclic ring containing a nitrogen atom.
    m represents an integer of 1 to 6, and n represents an integer of 1 to 4.
    When n is 2 or more, the plurality of X, Y 1 , R 1 , and R 2 may be the same or different.
    Figure JPOXMLDOC01-appb-C000004
    In general formula (I-1), Y 3 represents —NH— or —O—.
    R 1 and R 2 each represents an alkyl group which may have a substituent, and R 1 and R 2 may be bonded to each other to form a heterocyclic ring containing a nitrogen atom. m represents an integer of 1 to 6.
    Figure JPOXMLDOC01-appb-C000005
    In general formula (II), Dye represents an optionally substituted quinophthalone residue,
    X 1 is, -NR'SO 2 -, - SO 2 NR '-, - CONR' -, - CH 2 NR'COCH 2 NR'-, or -NR'CO- represents, X 2 is a substituent An arylene group having 6 to 20 carbon atoms which may have, or a heteroaromatic group having 4 to 20 carbon atoms which may have a substituent, and these groups are represented by —NR′—, They may be bonded to each other through a divalent linking group selected from —O—, —SO 2 —, and —CO—. R ′ has a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or a substituent. And an aryl group having 6 to 20 carbon atoms which may be present.
    X 3 represents —NR′— or —O—.

    A and B are each a group represented by the following general formula (II-1), a group represented by the following general formula (II-2), —O— (CH 2 ) n —R 8 , —OR 9 , —NR 10 R 11 , —Cl, —F and —X 3 —X 2 —X 1 —Dye, R 8 represents an optionally substituted nitrogen-containing heterocyclic residue, R 9 , R 10 and R 11 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl having 2 to 20 carbon atoms which may have a substituent. Represents an aryl group having 6 to 20 carbon atoms which may have a group or a substituent, and n represents an integer of 0 to 20.
    One of A and B is a group represented by the following general formula (II-1), a group represented by the following general formula (II-2), —O— (CH 2 ) n—R 8 , — OR 9 or —NR 10 R 11 , and t represents an integer of 1 to 3. When t is 2 or more, the plurality of X 1 , X 2 , X 3 , A, and B may be the same or different.
    Figure JPOXMLDOC01-appb-C000006
    In general formula (II-1), Y 1 represents —NR′— or —O—,
    Y 2 may have an optionally substituted alkylene group having 1 to 20 carbon atoms, an optionally substituted alkenylene group having 2 to 20 carbon atoms, or an optionally substituted group. And an arylene group having 6 to 20 carbon atoms, and these groups are bonded to each other through a divalent linking group selected from —NR′—, —O—, —SO 2 —, and —CO—. Also good. R ′ has a hydrogen atom, an alkyl group having 1 to 20 carbon atoms which may have a substituent, an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or a substituent. And an aryl group having 6 to 20 carbon atoms which may be present.
    R 1 and R 2 each represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, or an alkenyl group having 2 to 20 carbon atoms which may have a substituent. R 1 and R 2 may be combined to form an optionally substituted heterocyclic structure containing a nitrogen, oxygen or sulfur atom.
    In general formula (II-2), Z 1 is a single bond connecting the triazine ring and the nitrogen atom, —NR′—, —NR′—G—CO—, —NR′—G—CONR ″ —, —NR ′. —G—SO 2 —, —NR′—G—SO 2 NR ″ —, —O—G—CO—, —O—G—CONR′—, —O—G—SO 2 — or —O—G —SO 2 NR′—, G is an alkylene group having 1 to 20 carbon atoms which may have a substituent, an alkenylene group having 2 to 20 carbon atoms which may have a substituent, or a substituent Represents an arylene group having 6 to 20 carbon atoms which may have a group, and R ′ and R ″ each represents a hydrogen atom and an alkyl group having 1 to 20 carbon atoms which may have a substituent. Represents an alkenyl group having 2 to 20 carbon atoms which may have a substituent, or an aryl group having 6 to 20 carbon atoms which may have a substituent.
    R 3 , R 4 , R 5 , and R 6 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or 2 carbon atoms that may have a substituent. an alkenyl group having 1-20 or carbon atoms, which may have a substituent or an aryl group of 6 to 20, alkyl group of R 7 is - 1 carbon atoms, which may have a substituent group 20, Alternatively, it represents an alkenyl group having 2 to 20 carbon atoms which may have a substituent.
    Formula (III)
    Figure JPOXMLDOC01-appb-C000007
    In general formula (III), A represents a component capable of forming an azo pigment together with XY.
    X represents a single bond or a group selected from divalent linking groups in the following group A.
    Y represents a group represented by the following general formula (III-2).
    Group A:
    Figure JPOXMLDOC01-appb-C000008
    Figure JPOXMLDOC01-appb-C000009
    In the general formula (III-2), Z represents an alkylene group having 1 to 5 carbon atoms,
    R 2 represents an alkyl group having 1 to 4 carbon atoms or a 5- or 6-membered saturated heterocyclic ring containing a nitrogen atom. a represents 1 or 2. * Represents a binding site with X.
  4.  前記(A)顔料が橙色顔料を含む、請求項1~3のいずれか1項に記載の着色感光性樹脂組成物。
    The colored photosensitive resin composition according to any one of claims 1 to 3, wherein the (A) pigment contains an orange pigment.
  5.  全顔料の合計濃度が、前記着色感光性樹脂組成物の全固形分に対して、30質量%以上である、請求項1~4のいずれか1項に記載の着色感光性樹脂組成物。
    The colored photosensitive resin composition according to any one of claims 1 to 4, wherein the total concentration of all pigments is 30% by mass or more based on the total solid content of the colored photosensitive resin composition.
  6.  前記(C)酸基を含有し重量平均分子量が38000以下である樹脂の含有量が、前記着色感光性樹脂組成物の全固形分に対して25質量%以下である、請求項1~5のいずれか1項に記載の着色感光性樹脂組成物。
    The content of the resin (C) having an acid group and a weight average molecular weight of 38000 or less is 25% by mass or less based on the total solid content of the colored photosensitive resin composition. The colored photosensitive resin composition of any one of Claims 1.
  7.  前記(A)顔料が、C.I.Pigment Red254、C.I.Pigment Red177およびC.I.Pigment Orange71から選択される少なくとも1種を含む、請求項1~6のいずれか1項に記載の着色感光性樹脂組成物。
    The pigment (A) is C.I. I. Pigment Red254, C.I. I. Pigment Red177 and C.I. I. The colored photosensitive resin composition according to any one of claims 1 to 6, comprising at least one selected from Pigment Orange 71.
  8.  さらに、重合性基を4つ以上有する重合性化合物を含む、請求項1~7のいずれか1項に記載の着色感光性樹脂組成物。
    The colored photosensitive resin composition according to any one of claims 1 to 7, further comprising a polymerizable compound having four or more polymerizable groups.
  9.  さらに、フッ素系界面活性剤を含む、請求項1~8のいずれか1項に記載の着色感光性樹脂組成物。
    The colored photosensitive resin composition according to any one of claims 1 to 8, further comprising a fluorine-based surfactant.
  10.  さらに、オキシム系重合開始剤を含む、請求項1~9のいずれか1項に記載の着色感光性樹脂組成物。
    The colored photosensitive resin composition according to any one of claims 1 to 9, further comprising an oxime polymerization initiator.
  11.  さらに、黄色顔料を含む、請求項1~10のいずれか1項に記載の着色感光性樹脂組成物。
    The colored photosensitive resin composition according to any one of claims 1 to 10, further comprising a yellow pigment.
  12.  カラーフィルタの着色領域形成に用いられる請求項1~11のいずれか1項に記載の着色感光性樹脂組成物。
    The colored photosensitive resin composition according to any one of claims 1 to 11, which is used for forming a colored region of a color filter.
  13.  請求項1~12のいずれか1項に記載の着色感光性樹脂組成物を硬化してなる硬化膜。
    A cured film obtained by curing the colored photosensitive resin composition according to any one of claims 1 to 12.
  14.  請求項1~12のいずれか1項に記載の着色感光性樹脂組成物を支持体上に適用して着色感光性樹脂組成物層を形成する工程と、
     前記着色感光性樹脂組成物層をパターン状に露光する工程と、
     未露光部を現像除去して着色パターンを形成する工程と、
     を含むカラーフィルタの製造方法。
    Applying the colored photosensitive resin composition according to any one of claims 1 to 12 on a support to form a colored photosensitive resin composition layer;
    Exposing the colored photosensitive resin composition layer in a pattern;
    A step of developing and removing an unexposed portion to form a colored pattern;
    A method for producing a color filter comprising:
  15.  請求項1~12のいずれか1項に記載の着色感光性樹脂組成物を支持体上に適用して着色感光性樹脂組成物層を形成し、硬化して着色層を形成する工程、
     前記着色層上にフォトレジスト層を形成する工程、
     露光および現像することにより前記フォトレジスト層をパターニングしてレジストパターンを得る工程、および
     前記レジストパターンをエッチングマスクとして前記着色層をドライエッチングする工程、
     を含む、カラーフィルタの製造方法。
    Applying the colored photosensitive resin composition according to any one of claims 1 to 12 on a support to form a colored photosensitive resin composition layer and curing to form a colored layer;
    Forming a photoresist layer on the colored layer;
    Patterning the photoresist layer by exposure and development to obtain a resist pattern; and dry etching the colored layer using the resist pattern as an etching mask;
    A method for producing a color filter, comprising:
  16.  請求項13に記載の硬化膜を有するカラーフィルタ。
    A color filter having the cured film according to claim 13.
  17.  請求項14または15に記載のカラーフィルタの製造方法によって製造したカラーフィルタ。
    The color filter manufactured by the manufacturing method of the color filter of Claim 14 or 15.
  18.  請求項16または17に記載のカラーフィルタを有する固体撮像素子または画像表示装置。 A solid-state imaging device or an image display device having the color filter according to claim 16 or 17.
PCT/JP2014/069234 2013-08-28 2014-07-18 Coloring photosensitive resin composition, cured film, color filter, method for producing color filter, solid-state imaging element and image display device WO2015029643A1 (en)

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