WO2015014054A1 - 取向膜的制备方法及其制备装置 - Google Patents

取向膜的制备方法及其制备装置 Download PDF

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Publication number
WO2015014054A1
WO2015014054A1 PCT/CN2013/088223 CN2013088223W WO2015014054A1 WO 2015014054 A1 WO2015014054 A1 WO 2015014054A1 CN 2013088223 W CN2013088223 W CN 2013088223W WO 2015014054 A1 WO2015014054 A1 WO 2015014054A1
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Prior art keywords
area
alignment
pretilt angle
treated
material layer
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English (en)
French (fr)
Inventor
李建
宋省勋
李鸿鹏
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Beijing BOE Optoelectronics Technology Co Ltd
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Beijing BOE Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133784—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by rubbing

Definitions

  • Embodiments of the present invention relate to a method of preparing an oriented film and a preparation apparatus therefor. Background technique
  • a liquid crystal display panel in a liquid crystal display includes two substrates and a liquid crystal layer between the two substrates.
  • the liquid crystal layer is obtained by injecting liquid crystal between the two substrates, and an electric signal is applied to the liquid crystal display panel to control the liquid crystal in the liquid crystal layer to realize image display.
  • liquid crystal molecules in the liquid crystal display panel must be aligned in a certain direction. Therefore, before the formation of the liquid crystal layer, it is necessary to form an alignment film on the two substrates separately, and then add liquid crystal molecules to the two substrates of the cassette, so that the liquid crystal molecules are aligned in a certain direction according to the alignment film.
  • the alignment film is generally formed of an organic polymer film such as a polyimide resin.
  • a rubbing method is generally employed. For example, a layer of an alignment material is coated on the substrate, and then the rubbing roller is brought into contact with the layer of the alignment material, and the rubbing roller is quickly moved in a certain direction. Since the rubbing roll is covered with a rubbing cloth having fine fluff, the surface condition of the layer of the alignment material is changed by the fine fluff on the rubbing cloth, and a uniform anchoring action is exerted on the liquid crystal molecules to form an oriented film. Thereby, the liquid crystal molecules are uniformly aligned in a certain area between the two substrates of the liquid crystal display at a certain pretilt angle.
  • a first aspect of the present invention provides a method for preparing an alignment film, comprising: forming an alignment material layer on a substrate, the alignment material layer having a region to be processed, and performing illumination treatment on the region to be processed to reduce The pretilt angle of the area to be treated is small.
  • the method includes:
  • the area to be processed is subjected to illumination processing to reduce the pretilt angle of the area to be processed.
  • the pre-tilt angle of each region of the rubbed alignment material layer is detected, and the region where the pre-tilt angle is greater than the preset value is the region to be processed further includes: obtaining a pre-tilt angle between the to-be-processed region and a preset value Difference.
  • performing illumination processing on the to-be-processed area to reduce the pretilt angle of the to-be-processed area further includes: setting illumination time, illumination according to a difference between a pretilt angle of the to-be-processed area and a preset value
  • the intensity is set according to the size of the substrate, and the illumination angle is set by using polarized light to make the pretilt angle of the to-be-processed area equal to a preset value.
  • the polarized light is ultraviolet polarized light, visible polarized light, or infrared polarized light.
  • the alignment material layer has photo-alignment properties.
  • the alignment material layer is a polyimide material having photo-alignment properties or an alignment material having a light-oriented functional group.
  • the method further comprises: cleaning the rubbed layer of the aligning material.
  • a second aspect of an embodiment of the present invention provides an apparatus for producing an oriented film, comprising a rubbing roller for rubbing an alignment material layer.
  • the device further includes: a mask plate having a light transmissive portion, wherein the light transmissive portion corresponds to the layer of the alignment material when the mask plate covers the layer of the alignment material a processing area; an illumination device, performing illumination processing on the to-be-processed area to reduce a pretilt angle of the to-be-processed area.
  • the apparatus further includes: a pretilt angle detecting device that detects a pretilt angle of each region of the layer of the alignment material rubbed by the rubbing roller, and the region where the pretilt angle is greater than a preset value is the region to be processed. The difference between the two.
  • the illumination device sets the illumination time and the illumination intensity according to the difference between the pretilt angle of the to-be-processed area and the preset value, sets the illumination angle according to the substrate size, and utilizes the polarization.
  • the light is subjected to illumination processing on the area to be processed such that the pretilt angle of the area to be processed is equal to a preset value.
  • the polarized light is ultraviolet polarized light, visible polarized light, or infrared polarized light.
  • the light transmissive portion of the mask includes a hollowed out region and/or a transparent region.
  • the alignment material layer has photo-alignment properties.
  • the alignment material layer is a polyimide material having photo-alignment properties or an alignment material having a light-oriented functional group.
  • FIG. 1 is a schematic flow chart 1 of a method for preparing an oriented film according to an embodiment of the present invention
  • FIG. 2 is a schematic flow chart 2 of a method for preparing an oriented film according to an embodiment of the present invention
  • FIG. 3 is a schematic plan view of a substrate in an embodiment of the present invention.
  • FIG. 4 is a schematic plan view of a mask covering a substrate according to an embodiment of the present invention.
  • FIG. 5 is a schematic flow chart 3 of a method for preparing an alignment film according to an embodiment of the present invention.
  • Embodiments of the present invention provide a method for preparing an oriented film. As shown in FIG. 1, the method for preparing the alignment film includes:
  • Step S101 forming an alignment material layer on the substrate, the alignment material layer having a region to be processed, and performing illumination processing on the region to be processed to reduce a pretilt angle of the region to be processed.
  • a method for preparing an alignment film comprising: forming an alignment material layer on a substrate, the alignment material layer having a region to be processed, and the to-be-processed
  • the area is subjected to illumination processing to reduce the pretilt angle of the area to be treated.
  • the pretilt angle of the area to be treated can be made to meet the preset value, and the anchoring ability of the liquid crystal molecules to be treated is improved, so that the arrangement of the liquid crystal molecules on the alignment film is uniform, and the contrast of the liquid crystal display panel is improved. Improve the user experience.
  • any desired structure and components may be provided on the substrate before the formation of the alignment material layer.
  • a thin film transistor, a pixel electrode, a common electrode, a color film, a black matrix or a spacer, or the like, or a combination of two or more of them may be disposed on the substrate as needed, and is not limited herein.
  • the step S101 further includes:
  • Step S201 coating an alignment material layer on the substrate, and rubbing the alignment material layer with a rubbing roller.
  • the anchoring ability of the liquid crystal molecules is generated everywhere in the layer of the alignment material, so that the liquid crystal molecules can be aligned in a certain direction on the layer of the alignment material.
  • the non-planar structure such as protrusions or depressions on the substrate may affect the friction effect of the rubbing roller on the layer of the alignment material, so that the protrusions or depressions or their surrounding regions cannot be sufficiently rubbed, resulting in protrusions or depressions or their surrounding regions against the liquid crystal molecules.
  • the anchoring effect is weaker than the anchoring action of the flat portion on the substrate, affecting the alignment of the liquid crystal molecules, and reducing the contrast of the liquid crystal display panel.
  • Step S202 Detect a pretilt angle of each region of the rubbed alignment material layer, and the region where the pretilt angle is greater than a preset value is a region to be processed.
  • the pretilt angle detecting device is used to detect various regions of the rubbed alignment material layer. It is possible to focus on the area of the substrate having protrusions or depressions, and the pretilt angle of the surrounding area of the protrusions or depressions.
  • the pretilt angle of the region where the rubbing material is sufficiently rubbed is equal to the preset value; the pretilt angle of the region where the rubbing is not sufficiently rubbed is larger than the preset value.
  • the preset value of the pretilt angle is small, usually no more than 5°.
  • Step S203 Perform illumination processing on the to-be-processed area to reduce a pretilt angle of the to-be-processed area.
  • the orientation material layer of the region to be treated is not sufficiently oriented.
  • the layer of the alignment material of the area to be treated can be further oriented to achieve the purpose of sufficient orientation, and the pretilt angle of the area to be treated is reduced to meet the pre-treatment. Set the value.
  • the mask is covered on the rubbed and detected layer of the alignment material, and the mask has a light-transmissive region, and the size and shape of the light-transmitting region correspond to respective regions in which the pretilt angle is greater than a preset value.
  • each pretilt angle is larger than a preset value is exposed as a to-be-processed area; an area in which other pretilt angles are equal to a preset value is covered to prevent the surface of the sufficiently rubbed area from being damaged.
  • the regions of the alignment material layer that are not sufficiently rubbed may be analyzed in advance, for which the shape of the mask is designed such that the mask has a plurality of light-transmissive regions which are hollow regions and/or transparent regions.
  • a temporary mask may be formed using a material such as photoresist after detecting a region that is not sufficiently rubbed, and a region that is not sufficiently rubbed may be exposed as a region to be treated.
  • the pretilt angle of a certain area is greater than a preset value, for example, the pretilt angle of the area is 6°
  • the appropriate illumination time and illumination intensity can be set according to the difference, so that the pretilt angle of the to-be-processed area can meet the preset value after the illumination processing.
  • the greater the difference the longer the illumination time or the greater the illumination intensity.
  • multiple batches of the area to be processed can be illuminated in batches based on the difference. That is, some of the areas to be treated having one of the differences may be illuminated by designing a mask, and then other areas to be processed having the other difference may be illuminated.
  • the area to be treated is distributed on the substrate and in various places of the layer of the oriented material after the rubbing. Therefore, it is necessary to set the illumination angle according to the size of the substrate, so that each of the areas to be treated can obtain sufficient illumination to ensure each
  • the pretilt angle of the area to be treated can approach or even be equal to the preset value, so that the liquid crystal molecules can also exhibit a uniform and consistent arrangement in the pre-tilt angles corresponding to the preset values in the areas to be treated, so as to improve the contrast of the display device and improve the contrast. Display the display effect of the device.
  • the light used for the illumination treatment is usually polarized light
  • the light source is generally a high-pressure mercury lamp, a xenon lamp, a lamp, or the like, and then a monochromatic polarized light is obtained by a filter device and a polarizer.
  • the polarized light is ultraviolet polarized light, visible polarized light or infrared polarized light.
  • the rubbed layer of the alignment material should be cleaned to prevent the presence of foreign matter on the layer of the alignment material from affecting the effect of the illumination treatment.
  • the alignment material layer is preferably a photo-alignment polyimide material such as RN-2241V2467 (product model), or the like.
  • RN-2241V2467 product model
  • An oriented material having a photo-alignment functional group is preferred.
  • any polyimide has a slight photo-alignment ability, other polyimides can also be used.
  • an alignment material layer is deposited on the color filter substrate 1, and the alignment material layer is subjected to a rubbing treatment using a rubbing roller.
  • the color filter substrate 1 is preliminarily provided with a protruding spacer 2, and after the alignment material layer is deposited on the color filter substrate 1, when the alignment material layer is rubbed by the rubbing roller, the protruding spacer 2 hindering the movement of the friction roller, causing the friction roller to be insufficiently received in a certain area around the bottom of the spacer 2, thereby reducing the anchoring ability of the liquid crystal molecules around the spacer 2, resulting in liquid crystal molecules being separated
  • the pretilt angle around the pad 2 does not coincide with the pretilt angle elsewhere, affecting the contrast of the display device.
  • the periphery of the spacer 2 which is not sufficiently rubbed becomes the area to be treated 3. As shown in Fig. 4, after the upper mask 4 is covered, the area to be treated 3 will be exposed, and the area which has been sufficiently rubbed is covered by the mask 4.
  • the color filter substrate 1 needs to be cleaned to prevent the environment or foreign matter from interfering with the light treatment.
  • the spacer 2 is spread over the color filter substrate 1, and the alignment material layer covers the entire color filter substrate 1.
  • the mask 4 is covered with the upper layer of the alignment material, it is first subjected to a rough alignment, i.e., it is ensured that the mask 4 can cover substantially the entire layer of the alignment material.
  • the relative position of the light-transmitting region 5 on the mask 4 and the area to be treated 3 is adjusted, and the light-transmitting region 5 should be just exposed to each of the regions 3 to be treated as optimal, so
  • the alignment detection and feedback that is, whether the transparent region 5 has been able to expose only the respective to-be-processed regions 3, and if this has been achieved, the fine alignment is stopped, and the illumination processing is prepared. If this is not achieved, the fine alignment will be performed again until the light-transmitting region 5 has been able to expose only the respective regions 3 to be treated.
  • the pretilt angle detecting device needs to obtain the difference between the pretilt angle of the to-be-processed area 3 and the preset value while detecting, and when the light processing is to be performed on the processing area 3, the illumination time and the illumination may be set according to the difference. strength.
  • the illumination angle such as the swing angle of the illumination device, according to the size of the color filter substrate 1.
  • the illumination device emits ultraviolet polarized light, visible polarized light or infrared polarized light
  • the area to be treated 3 receives the light emitted by the illumination device
  • the layer of the alignment material of the area to be treated 3 generates surface anisotropy, so that the pre-processed area 3 is pre-processed.
  • the inclination angle meets the preset value, and the anchoring ability of the liquid crystal molecules to be treated is improved.
  • the method for preparing the alignment film shown in FIG. 1 can also be as shown in FIG. 5, comprising: Step S301, depositing an alignment material layer on the substrate.
  • Step S302 covering a mask layer on the layer of alignment material, the mask panel having a light transmissive region, and the light transmissive region corresponding to the region to be processed.
  • Step S303 Perform illumination processing on the to-be-processed area to reduce a pretilt angle of the to-be-processed area.
  • Step S304 rubbing the layer of the alignment material subjected to the illumination treatment with a rubbing roller.
  • the area to be treated may be pre-divided, and the area to be processed is usually located on a substrate having a recessed or raised area or a recess or protrusion (e.g., a spacer of a color filter substrate).
  • the mask has light-transmissive areas, and the size and shape of the light-transmissive areas match the area to be treated. After covering the upper mask, only the area to be treated on the substrate is exposed. In the light treatment, only the area to be treated is subjected to illumination treatment, and the layer of orientation material of the area to be treated generates surface anisotropy to reduce the The pretilt angle of the area to be treated increases the anchoring ability of the area to be treated to the liquid crystal molecules.
  • the frictional roller is used to rub the layer of the alignment material, and the flat region can obtain sufficient friction.
  • the pretilt angle of the portion of the alignment material layer meets the preset value; and the sufficient frictional depression or protrusion or their surroundings cannot be obtained.
  • the crystal molecules can be arranged in a pretilt angle conforming to a preset value in each region of the alignment material layer, thereby improving the contrast of the display device.
  • the rubbed layer of the alignment material should also be cleaned, Preventing foreign matter on the layer of the alignment material, such as scraps of materials such as nylon, fiber or lint covering the friction roller, affecting the processing and processing after the substrate.
  • an apparatus for preparing an oriented film comprising a rubbing roller for rubbing an alignment material layer.
  • the apparatus further includes a mask having a light transmissive portion, the light transmissive portion corresponding to the area to be treated of the layer of oriented material when the mask is overlying the layer of oriented material.
  • the apparatus further includes an illumination device that performs illumination processing on the area to be treated to reduce the pretilt angle of the area to be treated.
  • the apparatus for preparing an oriented film in the embodiment of the present invention further includes a pretilt angle detecting device that detects a pretilt angle of each region of the layer of the alignment material rubbed by the rubbing roller, and the region where the pretilt angle is greater than a preset value is Describe the processing area.
  • the pretilt angle detecting device When detecting the pretilt angle of each region of the alignment material layer rubbed by the rubbing roller, when the pretilt angle of a certain region is found to be larger than a preset value, this region is the region to be treated.
  • the pretilt angle detecting device further obtains a difference between the pretilt angle of the to-be-processed area and a preset value, so that the illumination device sets the illumination time and the illumination intensity according to the difference.
  • the illumination device sets the illumination angle according to the size of the substrate.
  • the light emitted by the illumination device is typically polarized light.
  • the light source is generally a high-pressure mercury lamp, a xenon lamp, a lamp, or the like, and then a monochromatic polarized light is obtained by a filter device and a polarizer.
  • the polarized light is ultraviolet polarized light, visible polarized light or infrared polarized light.
  • the light transmissive portion of the reticle includes a hollowed out region and/or a transparent region.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
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  • Optics & Photonics (AREA)
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Abstract

一种取向膜的制备方法，包括：在基板（1）上形成取向材料层，取向材料层具有待处理区域（3），对待处理区域（3）进行光照处理，以减小待处理区域（3）的预倾角。还提供了一种取向膜的制备装置。

Description

取向膜的制备方法及其制备装置 技术领域
本发明的实施例涉及一种取向膜的制备方法及其制备装置。 背景技术
液晶显示器（ Liquid Crystal Display, 筒称 LCD )中的液晶显示面板包括 两块基板及该两块基板之间的液晶层。 液晶层是向两块基板之间注入液晶而 得到的， 将电信号施加到液晶显示面板上以控制液晶层中的液晶， 实现图像 显示。
为了能够得到均匀的亮度和高的对比度， 必须使液晶显示面板内的液晶 分子沿一定的方向排列。 因此， 在液晶层形成之前， 需要先在两块基板上分 别形成取向膜， 之后再滴加液晶分子并对盒两块基板， 使得液晶分子根据取 向膜沿一定的方向排列。 取向膜一般由聚酰亚胺类树脂等的有机高分子膜形 成。
为了在基板上形成取向膜， 一般采用摩擦法。 例如， 在基板上涂覆一层 取向材料层， 之后将摩擦辊与这一取向材料层接触， 并按照一定的方向快速 移动摩擦辊。 由于摩擦辊覆盖有具有细小绒毛的摩擦布， 利用摩擦布上的细 小绒毛，可使取向材料层的表面状况发生改变,对液晶分子产生均一的锚定作 用,形成取向膜。 从而， 使液晶分子在液晶显示器的两片基板之间的某一区域 内,以一定的预倾角呈现均勾、 一致的排列。
然而， 由于基板的表面不够平整， 摩擦辊无法充分接触到所有区域的取 向材料层， 使得摩擦法制得的取向膜对液晶分子的锚定能力不一致， 降低了 液晶显示面板的对比度。 发明内容
本发明实施例的第一方面提供了一种取向膜的制备方法， 包括： 在基板上形成取向材料层， 所述取向材料层具有待处理区域， 对所述待 处理区域进行光照处理， 以减小所述待处理区域的预倾角。 例如， 所述方法包括：
在所述基板上涂覆所述取向材料层， 利用摩擦辊摩擦所述取向材料层； 检测经过摩擦的取向材料层各个区域的预倾角， 所述预倾角大于预设值 的区域为待处理区域； 以及
对所述待处理区域进行光照处理， 以减小所述待处理区域的预倾角。 例如， 所述检测经过摩擦的取向材料层各个区域的预倾角， 所述预倾角 大于预设值的区域为待处理区域还包括： 获得所述待处理区域的预倾角和预 设值之间的差值。
例如， 对所述待处理区域进行光照处理， 以减小所述待处理区域的预倾 角还包括： 根据所述待处理区域的预倾角和预设值之间的差值， 设置光照时 间、 光照强度， 并根据所述基板尺寸， 设置光照角度； 利用偏振光对所述待 处理区域进行光照处理， 以使得所述待处理区域的预倾角等于预设值。
例如， 所述偏振光为紫外偏振光、 可见偏振光或红外偏振光。
例如， 所述取向材料层具有光取向性。
例如， 所述取向材料层为具有光取向性的聚酰亚胺材料， 或者具有光取 向功能基团的取向材料。
例如， 在所述对所述待处理区域进行光照处理， 以减小所述待处理区域 的预倾角之前， 所述方法还包括： 清洁经过摩擦的所述取向材料层。
本发明实施例的第二方面提供了一种取向膜的制备装置， 包括摩擦辊， 用于对取向材料层进行摩擦。 所述装置还包括： 掩膜板， 所述掩膜板具有透 光部分， 当所述掩膜板覆盖在所述取向材料层上时， 所述透光部分对应于所 述取向材料层的待处理区域； 光照设备， 对所述待处理区域进行光照处理， 以减小所述待处理区域的预倾角。
例如， 所述装置还包括： 预倾角检测设备， 检测经过所述摩擦辊摩擦的 取向材料层各个区域的预倾角， 所述预倾角大于预设值的区域为所述待处理 区域。 间的差值。
例如，所述光照设备根据所述待处理区域的预倾角和预设值之间的差值， 设置光照时间、 光照强度， 根据所述基板尺寸， 设置光照角度， 并利用偏振 光对所述待处理区域进行光照处理， 以使得所述待处理区域的预倾角等于预 设值。
例如， 所述偏振光为紫外偏振光、 可见偏振光或红外偏振光。
例如， 所述掩膜板的所述透光部分包括镂空区域和 /或透明区域。
例如， 所述取向材料层具有光取向性。
例如， 所述取向材料层为具有光取向性的聚酰亚胺材料， 或者具有光取 向功能基团的取向材料。 附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案， 下面将对实 施例描述中所需要使用的附图作筒单地介绍， 显而易见地， 下面描述中的附 图仅仅是本发明的一些实施例， 对于本领域普通技术人员来讲， 在不付出创 造性劳动的前提下， 还可以根据这些附图获得其他的附图。
图 1为本发明实施例中的取向膜的制备方法的流程示意图一；
图 2为本发明实施例中的取向膜的制备方法的流程示意图二；
图 3为本发明实施例中的基板的平面示意图；
图 4为本发明实施例中的基板上覆盖掩膜板的平面示意图； 以及 图 5为本发明实施例中的取向膜的制备方法的流程示意图三。 具体实施方式
下面将结合本发明实施例中的附图， 对本发明实施例中的技术方案进行 清楚、 完整地描述， 显然， 所描述的实施例是本发明一部分实施例， 而不是 全部的实施例。 基于本发明中的实施例， 本领域普通技术人员在没有做出创 造性劳动前提下所获得的所有其他实施例， 都属于本发明保护的范围。
本发明实施例提供一种取向膜的制备方法。 如图 1所示， 该取向膜的制 备方法包括：
步骤 S101、在基板上形成取向材料层，所述取向材料层具有待处理区域， 对所述待处理区域进行光照处理， 以减小所述待处理区域的预倾角。
在本实施例的技术方案中，提供了一种取向膜的制备方法，该方法包括： 在基板上形成取向材料层， 所述取向材料层具有待处理区域， 对所述待处理 区域进行光照处理， 以减小所述待处理区域的预倾角。 由此， 使得待处理区 域的预倾角能够符合预设值， 提高待处理区域对液晶分子的锚定能力， 使得 液晶分子在取向膜上各处的排列都一致， 提高了液晶显示面板的对比度， 提 高了用户的使用体验。
需要说明的是， 在形成所述取向材料层之前， 所述基板上可以设置有任 何所需的结构和部件。 例如，根据需要， 所述基板上可以设置有薄膜晶体管、 像素电极、 公共电极、 彩膜、 黑矩阵或隔垫物等或者它们中的两种或多种结 构的组合， 在此不做限制。
例如， 如图 2所示， 所述步骤 S101进一步包括：
步骤 S201、在所述基板上涂覆取向材料层， 利用摩擦辊摩擦所述取向材 料层。
摩擦辊摩擦过后， 取向材料层的各处会产生对液晶分子的锚定能力， 使 得液晶分子可以在取向材料层上沿一定的方向排列。
基板上具有的突起或凹陷等非平面结构会影响摩擦辊对取向材料层的摩 擦效果， 使得突起或凹陷或它们的周围区域无法得到充分的摩擦， 导致突起 或 陷或它们的周围区域对液晶分子的锚定作用弱于基板上平整部分的锚定 作用， 影响了液晶分子的排列， 降低了液晶显示面板的对比度。
步骤 S202、检测经过摩擦的取向材料层的各个区域的预倾角， 所述预倾 角大于预设值的区域为待处理区域。
例如， 运用预倾角检测设备检测经过摩擦的取向材料层的各个区域。 可 重点检测基板上具有突起或凹陷的区域、 以及突起或凹陷的周围区域的预倾 角。
通常， 在经过摩擦辊的摩擦后， 取向材料层上得到充分摩擦的区域的预 倾角等于预设值； 未得到充分摩擦的区域的预倾角大于预设值。
一般的， 预倾角的预设值很小， 通常不超过 5° 。
步骤 S203、对所述待处理区域进行光照处理， 以减小所述待处理区域的 预倾角。
由于待处理区域的取向材料层未得到充分摩擦， 因而待处理区域的取向 材料层取向不充分。 通过光照处理， 可以使待处理区域的取向材料层进一步 进行取向以达到充分取向的目的， 此时待处理区域的预倾角会减小而符合预 设值。 有的区域后， 在该经过摩擦、 检测的取向材料层上覆盖掩膜板， 该掩膜板具 有透光区域，透光区域的大小、形状都与预倾角大于预设值的各个区域对应， 露出各个预倾角大于预设值的区域作为待处理区域； 将其他预倾角等于预设 值的区域遮盖着， 防止这些已得到充分摩擦区域的表面受到破坏。
备选地， 可以预先分析取向材料层上无法充分摩擦的区域， 针对这些区 域， 设计掩膜板的形状， 使得掩膜板具有多个为镂空区域和 /或透明区域的透 光区域。 备选地， 可以在检测出来那些未能够充分摩擦的区域后， 利用光刻 胶等材质来制作临时掩膜， 将未能够充分摩擦的区域露出作为待处理区域。
例如， 当检测到某区域的预倾角大于预设值时， 例如该区域的预倾角为 6° , 还需获得所述区域的预倾角和预设值之间的差值， 便于在对这些区域 进行光照处理的时候， 能够根据所述差值，设置合适的光照时间、 光照强度， 使得在经过光照处理之后， 待处理区域的预倾角能够符合预设值。 一般地， 所述差值越大， 光照时间越长或光照强度越大。 基于这一情况， 可以根据所 述差值对多个待处理区域分批次进行光照。 也就是， 可以通过设计掩膜板先 对具有一所述差值的一些待处理区域进行光照， 然后再对具有另一所述差值 的另一些待处理区域进行光照。
通常， 待处理区域分布于基板上、 摩擦后的取向材料层的各个地方， 所 以， 还需根据所述基板尺寸， 设置光照角度， 使得每个待处理区域都能够获 得充足的光照， 保证每个待处理区域的预倾角都能趋近甚至等于预设值， 使 液晶分子在这些待处理区域也能够以符合预设值的预倾角呈现均勾、 一致的 排列， 以提高显示装置的对比度， 提高显示装置的显示效果。
另夕卜， 用于光照处理的光通常为偏振光， 光源一般采用高压汞灯、 氙灯、 素灯等， 然后通过滤光装置和起偏器获得单色偏振光。 所述偏振光为紫外 偏振光、 可见偏振光或红外偏振光。
例如， 在对所述待处理区域进行光照处理之前， 还应该清洁经过摩擦的 取向材料层， 防止取向材料层上存在异物影响光照处理的效果。
由于需要对取向材料层进行光照处理， 因而取向材料层优选比如 RN-2241V2467 (产品型号）等的具有光取向性的聚酰亚胺材料， 或者其他具 有光取向功能基团的取向材料。 但由于任何一种聚酰亚胺都具备轻微的光取 向的能力， 也可以选用其他聚酰亚胺。
下面， 以彩膜基板 1上的取向膜的制备过程为例， 对图 2所示的方法进 行举例说明。 需要说明的是， 下面的描述仅是示例性的， 并不对本发明实施 例的保护范围进行限制。
首先， 在彩膜基板 1上沉积取向材料层， 并利用摩擦辊对所述取向材料 层进行摩擦处理。
如图 3所示， 彩膜基板 1上预先设置有突起的隔垫物 2, 取向材料层沉 积在彩膜基板 1上后， 在利用摩擦辊摩擦所述取向材料层时， 突起的隔垫物 2会阻碍摩擦辊的运动， 导致隔垫物 2的底部的周围一定区域内无法充分接 受到摩擦辊的摩擦， 降低了隔垫物 2的周围对液晶分子的锚定能力， 导致液 晶分子在隔垫物 2的周围的预倾角与别处的预倾角不一致， 影响了显示装置 的对比度。
在经过预倾角检测设备的检测后， 未充分摩擦的隔垫物 2的周围会成为 待处理区域 3。 如图 4所示， 覆盖上掩膜板 4后， 待处理区域 3将会暴露出 来， 而已经充分摩擦的区域则被掩膜板 4所覆盖。
例如， 在覆盖上掩膜板 4之前， 还需要对彩膜基板 1进行洁净处理， 防 止环境或者自身异物对光照处理造成干扰。
显然， 隔垫物 2遍布彩膜基板 1 ,取向材料层覆盖整个彩膜基板 1。在将 掩膜板 4覆盖上取向材料层时， 首先要经过粗对位， 即确保掩膜板 4基本能 够覆盖整个取向材料层。 再通过细对位， 调节掩膜板 4上的透光区域 5和待 处理区域 3的相对位置， 应以透光区域 5恰好仅将各个待处理区域 3露出为 最优， 因此， 在细对位的过程中， 还需要进行对位检测和反馈， 即检测透光 区域 5是否已经能够恰好仅将各个待处理区域 3露出，若已经实现这一目的， 停止细对位， 准备进行光照处理， 若未实现这一目的， 则将再次进行细对位， 直至透光区域 5已经能够恰好仅将各个待处理区域 3露出为止。
预倾角检测设备在检测的同时， 还需获得待处理区域 3的预倾角和预设 值之间的差值， 在对待处理区域 3进行光照处理时， 可以根据该差值， 设置 光照时间、 光照强度。 此外， 由于彩膜基板 1的尺寸通常较大， 而光照设备 发出的光需要对彩膜基板 1上覆盖的取向材料层的所有待处理区域 3都照射 到， 所以还需要根据彩膜基板 1的尺寸， 设置光照角度， 例如光照设备的摆 动角度。
之后， 光照设备发出紫外偏振光、 可见偏振光或红外偏振光， 待处理区 域 3接收到光照设备发出的光， 待处理区域 3的取向材料层产生表面各向异 性， 使得待处理区域 3的预倾角符合预设值， 提高了待处理区域 3对液晶分 子的锚定能力。
另外， 对有经验的技术人员来说， 不需要经过检测， 即可预先知道哪些 地方的取向材料层在摩擦辊处理后为未充分摩擦区域即需要经过光照处理的 待处理区域。 因此， 可在摩擦前， 对这些预计中的待处理区域通过光照处理 进行预处理。基于此， 图 1所示的取向膜的制备方法还可如图 5所示， 包括： 步骤 S301、 在基板上沉积取向材料层。
步骤 S302、在所述取向材料层上覆盖掩膜板，所述掩膜板具有透光区域， 所述透光区域与所述待处理区域对应。
步骤 S303、对所述待处理区域进行光照处理， 以减小所述待处理区域的 预倾角。
步骤 S304、 利用摩擦辊摩擦经过光照处理的取向材料层。
在图 5所对应的方法中， 可预先划分出待处理区域， 通常待处理区域位 于基板上的具有凹陷或突起的区域或者凹陷或突起 (例如彩膜基板的隔垫物） 的周围。 掩膜板具有透光区域， 这些透光区域的尺寸、 形状都与待处理区域 相匹配。 在覆盖上掩膜板后， 基板上仅有待处理区域是露出的， 在光照处理 时， 仅有待处理区域会受到光照处理， 待处理区域的取向材料层产生表面各 向异性， 以减小所述待处理区域的预倾角， 提高待处理区域对液晶分子的锚 定能力。
之后， 利用摩擦辊摩擦取向材料层， 平整的区域能够得到充分的摩擦， 这部分的取向材料层的预倾角符合预设值； 而无法得到充分的摩擦的凹陷或 突起或它们的周围， 即待处理区域， 由于在摩擦前经过了预先的光照处理， 晶分子在取向材料层的各个区域都能以符合预设值的预倾角排列， 提高了显 示装置的对比度。
在利用摩擦辊摩擦取向材料层后，还应当清洁所述摩擦后的取向材料层， 防止取向材料层上的异物，如覆盖摩擦辊的尼龙、纤维或棉绒等材料的碎屑， 影响基板之后的加工、 处理。
进一步的， 在本发明实施例中， 还提供了一种取向膜的制备装置， 包括 摩擦辊， 用于对取向材料层进行摩擦。 该装置还包括掩膜板， 所述掩膜板具 有透光部分， 当所述掩膜板覆盖在取向材料层上时， 所述透光部分对应于所 述取向材料层的待处理区域。
另外， 该装置还包括光照设备， 对所述待处理区域进行光照处理， 以减 小所述待处理区域的预倾角。
进一步的，本发明实施例中的取向膜的制备装置还包括预倾角检测设备， 检测经过所述摩擦辊摩擦的取向材料层各个区域的预倾角， 所述预倾角大于 预设值的区域为所述待处理区域。
在检测经过摩擦辊摩擦的取向材料层各个区域的预倾角时， 当发现某一 区域的预倾角大于预设值时， 这一区域即为待处理区域。 所述预倾角检测设 备还获得所述待处理区域的预倾角和预设值之间的差值， 以便于所述光照设 备根据所述差值， 设置光照时间、 光照强度。 此外， 所述光照设备会根据所 述基板尺寸， 设置光照角度。 所述光照设备发出的光通常为偏振光。 在所述 光照设备中， 光源一般采用高压汞灯、 氙灯、 素灯等， 然后通过滤光装置 和起偏器获得单色偏振光。 所述偏振光为紫外偏振光、 可见偏振光或红外偏 振光。
所述掩模板的透光部分包括镂空区域和 /或透明区域。
以上所述， 仅为本发明的具体实施方式， 但本发明的保护范围并不局限 于此， 任何熟悉本技术领域的技术人员在本发明揭露的技术范围内， 可轻易 想到变化或替换， 都应涵盖在本发明的保护范围之内。 因此， 本发明的保护 范围应以所述权利要求的保护范围为准。

Claims

权利要求书
1、 一种取向膜的制备方法， 包括：
在基板上形成取向材料层， 所述取向材料层具有待处理区域， 对所述待 处理区域进行光照处理， 以减小所述待处理区域的预倾角。
2、 根据权利要求 1所述取向膜的制备方法， 其中所述方法包括： 在所述基板上涂覆所述取向材料层， 利用摩擦辊摩擦所述取向材料层； 检测经过摩擦的取向材料层各个区域的预倾角， 所述预倾角大于预设值 的区域为待处理区域； 以及
对所述待处理区域进行光照处理， 以减小所述待处理区域的预倾角。
3、根据权利要求 2所述的取向膜的制备方法，其中所述检测经过摩擦的 取向材料层各个区域的预倾角， 所述预倾角大于预设值的区域为待处理区域 还包括：
获得所述待处理区域的预倾角和预设值之间的差值。
4、根据权利要求 3所述的取向膜的制备方法，其中对所述待处理区域进 行光照处理， 以减小所述待处理区域的预倾角还包括：
根据所述待处理区域的预倾角和预设值之间的差值， 设置光照时间、 光 照强度， 并根据所述基板尺寸， 设置光照角度；
利用偏振光对所述待处理区域进行光照处理， 以使得所述待处理区域的 预倾角等于预设值。
5、 根据权利要求 4所述的取向膜的制备方法， 其中
所述偏振光为紫外偏振光、 可见偏振光或红外偏振光。
6、 根据权利要求 1-5任一项所述的取向膜的制备方法， 其中
所述取向材料层具有光取向性。
7、根据权利要求 6所述的取向膜的制备方法，其中所述取向材料层为具 有光取向性的聚酰亚胺材料， 或者具有光取向功能基团的取向材料。
8、根据权利要求 2所述的取向膜的制备方法，在所述对所述待处理区域 进行光照处理， 以减小所述待处理区域的预倾角之前， 所述方法还包括： 清 洁经过摩擦的所述取向材料层。
9、 一种取向膜的制备装置， 包括摩擦辊， 用于对取向材料层进行摩擦， 其中所述装置还包括：
掩膜板， 所述掩膜板具有透光部分， 当所述掩膜板覆盖在所述取向材料 层上时， 所述透光部分对应于所述取向材料层的待处理区域；
光照设备， 对所述待处理区域进行光照处理， 以减小所述待处理区域的 预倾角。
10、 根据权利要求 9所述的取向膜的制备装置， 其中还包括：
预倾角检测设备， 检测经过所述摩擦辊摩擦的取向材料层各个区域的预 倾角， 所述预倾角大于预设值的区域为所述待处理区域。
11、 根据权利要求 10所述的取向膜的制备装置， 其中 值。
12、 根据权利要求 11所述的取向膜的制备装置， 其中
所述光照设备根据所述待处理区域的预倾角和预设值之间的差值， 设置 光照时间、 光照强度， 根据所述基板尺寸， 设置光照角度， 并利用偏振光对 所述待处理区域进行光照处理，以使得所述待处理区域的预倾角等于预设值。
13、根据权利要求 12所述的取向膜的制备装置，其中所述偏振光为紫外 偏振光、 可见偏振光或红外偏振光。
14、 根据权利要求 9所述的取向膜的制备装置， 其中：
所述掩膜板的所述透光部分包括镂空区域和 /或透明区域。
15、根据权利要求 14所述的取向膜的制备装置，其中所述取向材料层具 有光取向性。
16、根据权利要求 15所述的取向膜的制备装置，其中所述取向材料层为 具有光取向性的聚酰亚胺材料， 或者具有光取向功能基团的取向材料。
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CN105204234B (zh) * 2015-10-28 2019-02-01 武汉华星光电技术有限公司 液晶分子的光配向方法、液晶盒的成盒制程及显示面板
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