WO2014205898A1 - Pixel definition layer and manufacturing method therefor, display substrate and display device - Google Patents

Pixel definition layer and manufacturing method therefor, display substrate and display device Download PDF

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Publication number
WO2014205898A1
WO2014205898A1 PCT/CN2013/081445 CN2013081445W WO2014205898A1 WO 2014205898 A1 WO2014205898 A1 WO 2014205898A1 CN 2013081445 W CN2013081445 W CN 2013081445W WO 2014205898 A1 WO2014205898 A1 WO 2014205898A1
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Prior art keywords
pixel
substrate
pixel area
monolayer
defining layer
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PCT/CN2013/081445
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French (fr)
Chinese (zh)
Inventor
侯文军
刘则
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京东方科技集团股份有限公司
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Publication of WO2014205898A1 publication Critical patent/WO2014205898A1/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/122Pixel-defining structures or layers, e.g. banks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/17Passive-matrix OLED displays
    • H10K59/173Passive-matrix OLED displays comprising banks or shadow masks

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a pixel defining layer, a method for fabricating the same, a display substrate, and a display device.
  • Inkjet printing technology is one of the main technologies used in modern office printing.
  • researchers have begun to apply inkjet printing technology to the preparation of planar functional materials, such as preparing polymer conductive films, preparing color organic light-emitting diodes, and preparing. Thin film semiconductor devices and the like.
  • the OLED display substrate includes a base substrate 11, an anode electrode layer 12 disposed on the base substrate 11, The light-emitting function layer 13 and the cathode electrode layer 14.
  • the display substrate includes a plurality of pixel areas 31 and non-pixel areas 32, as shown in FIG.
  • the anode electrode layer includes a plurality of pixel patterns corresponding to the pixel regions, and a light-emitting function layer is formed on the anode electrode layer by inkjet printing.
  • a pixel defining layer including a pixel dividing wall is generally disposed in the non-pixel region between the pixel pattern regions, to form a plurality of In the space surrounding the pixel region, the ink-jet printed luminescent functional layer ink is applied to the surrounding space by inkjet printing, that is, ruthenium is applied on the surface of the anode electrode layer.
  • Embodiments of the present invention provide a pixel defining layer and a manufacturing method thereof, a display substrate, and a display device, wherein the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall is recessed inward at an intermediate portion, and inkjet printing A small amount of ink overflows in the recesses that are recessed inwardly of the pixel dividing wall to prevent display failure due to overflow to adjacent pixel areas.
  • Embodiments of the present invention provide a pixel defining layer, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall has a recess.
  • Embodiments of the present invention provide a method for fabricating a pixel defining layer, including:
  • a pixel defining layer is formed on the substrate, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall has a recess.
  • the boiling point of the solvent in the solution forming the pixel defining layer is below 200 C.
  • forming a pixel defining layer on the substrate is formed by inkjet printing.
  • the solvent of the ink-printing solution is dichloromethane, chloroform, tetrahydrofuran, chlorobenzene, toluene, o-dichlorobenzene, o-xylene, n-hexane, cyclohexanide, anisole, Perfluorofuran, N"N-dimethylformamide, N,N-dimethylacetamide or dimethyl sulfoxide.
  • the pixel dividing wall pattern is formed in a non-pixel area.
  • the contact angle of the droplets in the pixel region and the contact angle in the non-pixel region differ by more than 30°.
  • the patterning surface treatment of the pair of substrates is such that the surface energy of the pixel region on the substrate is different from the surface energy of the non-pixel region:
  • the substrate is subjected to self-assembly monolayer surface treatment to form a monomolecular layer in the pixel region.
  • the self-assembled monolayer surface treatment is performed on the substrate, and forming a monomolecular layer in the pixel region is specifically:
  • the substrate is subjected to self-assembly monolayer surface treatment to form a monolayer on the surface of the substrate; and the monolayer of the non-pixel region is removed.
  • the self-assembled monolayer surface treatment is performed on the substrate, and forming a monomolecular layer in the pixel region is specifically: processing the substrate by using a fluorinated silane in an inert gas environment, forming a silicon fluoride on the surface of the substrate Monolayer of germanium;
  • the non-pixel region on the substrate is irradiated with ultraviolet light by a mask to remove the silicon fluoride germanium monolayer in the non-pixel region.
  • the method further includes:
  • the monolayer of the pixel region is removed.
  • the substrate is processed using silicon germanium fluoride on the substrate.
  • Forming a monomolecular layer of fluorinated silane on the surface; irradiating the non-pixel region on the substrate with ultraviolet light by using a mask to remove the fluorinated silane monolayer in the non-pixel region, and then forming the pixel separation wall in the non-pixel region of the substrate Also included: Removes the fluorinated silane from the pixel area.
  • the silicon fluoride buffer for removing the pixel region is specifically:
  • At least the pixel area is illuminated by ultraviolet light.
  • the forming the pixel defining layer by using the ink on the substrate is specifically:
  • Embodiments of the present invention provide a display substrate including a pixel defining layer provided by an embodiment of the present invention.
  • the embodiment of the invention provides a display device, which comprises a display substrate provided by an embodiment of the invention.
  • a pixel defining layer and a manufacturing method thereof including a pixel defining layer display device, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall is recessed inward in the middle portion, such that In the process of inkjet printing, even if there is a small amount of overflow in the ink area of the pixel area, it is deposited in the groove of the pixel dividing wall, thereby avoiding overflow to the adjacent pixel unit, resulting in poor display effect.
  • 1 is a schematic structural view of an OLED display substrate;
  • FIG. 2 is a schematic top plan view of an OLED display substrate
  • FIG. 3 is a cross-sectional structural view of a display substrate according to an embodiment of the present invention.
  • FIG. 4 is a schematic diagram of a method for fabricating a pixel defining layer according to an embodiment of the present invention
  • FIG. 5 is a schematic view showing a contact angle of a droplet on a substrate and a substrate;
  • FIG. 6 is a flow chart of a specific process for forming a pixel defining layer according to an embodiment of the present invention
  • FIG. 7 is a schematic diagram of forming a silicon germanide monolayer on a surface of a substrate according to an embodiment of the present invention.
  • One is to form a fluorinated silane monolayer by using a mask pair Schematic diagram of the substrate subjected to ultraviolet light irradiation treatment;
  • FIG. 9 is a schematic diagram of forming a pixel separation wall on a non-pixel area on a substrate according to an embodiment of the present invention.
  • FIG. 10 is a flowchart of forming a pixel defining layer by inkjet printing according to an embodiment of the present invention.
  • Embodiments of the present invention provide a pixel defining layer, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall has a recess. As shown in FIG. 3, the upper surface of the pixel dividing wall 15 is recessed inward at the intermediate portion to form a groove.
  • the pixel defining layer may be a film formed by inkjet printing, which includes a pixel dividing wall pattern.
  • inkjet printing printing is performed in a specified area, but due to the fluidity of the ink of the inkjet printing, the ink of the inkjet printing may overflow to other adjacent areas, so it is necessary to form a pixel around the area where the ink is printed.
  • the OLED display substrate includes: a substrate substrate II, an anode electrode layer 12 disposed on the substrate substrate 11, a light emitting function layer 13, and a cathode electrode layer 14.
  • the display substrate includes a pixel area 31 and a non-pixel area 32, as shown in FIG.
  • the anode electrode layer includes a plurality of pixel patterns, and the pixel pattern corresponds to the pixel region, and the method of inkjet printing forms a light-emitting function layer on the anode electrode layer, because the ink printed by the ink is certain
  • the fluidity in order to reduce the flow of the printed ink to the adjacent pixel pattern area, as shown in FIG. 3, between the pixel patterns (pixel areas 31), that is, the non-pixel areas 32 form a pixel definition including the pixel dividing wall 15.
  • Each package encloses a space between the air and the space, and the ink-emitting ink function of the ink-jet ink is printed on the layer of ink, and the ink is sprayed through the inkjet ink.
  • the bag surrounds the inner space of the space, that is, sprayed and sprayed on the surface of the surface of the anode and cathode electrode layers.
  • the illuminating light function layer can be included in the package:: empty hole injection into the layer, empty hole transfer transmission layer , an electro-optic light-emitting layer, and the like, and each of the layers may be formed by using a method of printing with ink. .
  • the substrate board according to the embodiment of the present invention is a base substrate board before forming an image forming pixel division partition wall wall, which may be Therefore, the substrate substrate plate may be formed on the substrate substrate of the substrate substrate to have a plurality of thin film films or a layer structure.
  • the lining substrate substrate plate may be a glass glazing, a silicon silicon wafer, a sillimanite or the like.
  • a positive anode electrode layer layer 1122 is formed on the substrate substrate board 11!, and the present invention is embodied in the present invention.
  • the base substrate board described above is taken as an example for detailed description. .
  • the image pixel separation partition wall provided by the present invention is as shown in FIG. 33, and the upper surface surface thereof is divided in the middle intermediate portion.
  • the recesses are recessed inwardly, and are formed into a recessed groove. .
  • the ink ink water sprayed and printed like the pixel area is even if there is a small amount of flow overflowing, It will also deposit in the concave groove groove like the pixel pixel partition wall wall, so as to avoid the flow-free overflow to the adjacent pixel of the adjacent pixel. Yuan, the effect of creating a display effect is not bad.
  • the ink water of the ink is a solution solution for forming a material material defining a fixed layer of the pixel. .
  • the shape of the concave groove groove is formed in a limited manner, that is, the shape of the structure of the concave depression is formed into a plurality of various forms. For example, if it is possible to form a pixel-like partition wall wall which is formed first without a concave concave surface surface, and then passes through other other techniques to make it
  • the upper surface of the surface of the partition wall like the pixel element partition wall faces the inwardly collapsed shape and forms a concave depression.
  • the image may be passed through the texture pattern.
  • the craftsmanship is formed into a concave depression structure on the upper surface of the upper surface of the partition wall like a pixel element, or it may pass through the effect of the coffee ring, and the use of the image
  • the evaporation of the evaporation surface of each surface surface of the partition wall of the pixel pixel is not uneven
  • the uniform shape is formed into a concave depression structure, or directly printed directly (for example, such as 33DD printing technology, etc.) to form a structure having a concave depression structure Separate partition walls like pixatin. .
  • the depth of the concave depression is 2200%% to 4400%% of the height of the pixel-separated partition wall. .
  • the illustrated pixel pixel separation partition wall may also be used for display display devices for forming other others. Its other structure. .
  • the film may be formed into the color film.
  • the above-mentioned pixel pixel separation partition wall (black black matrix matrix)) is formed on the base substrate, and then the pixel in the image is further described.
  • the partition formed by the wall of the partition wall is surrounded by a space formed by red, green, green, and blue, which are different in color and color. Guarantee the pure purity of each color of each color. .
  • the type of type for the display device, and for the use of the pixel phantom separation wall for the formation of the shape is not the same as the same knot
  • the present invention provides a display substrate for a display, and includes a pixel display boundary defined by the embodiment of the present invention. Board.
  • the display device may be a display device such as a liquid crystal display, an electronic paper, an OLED (Organic Light-Emitting Diode), a PLED (Polymer Light-Emitting Diode) display, or the like.
  • a display product such as a TV, digital camera, mobile phone, tablet, etc., with any display product or component.
  • An embodiment of the present invention provides a method for fabricating a display device. As shown in FIG. 4, the method includes: Step S101: Performing a patterned surface treatment on a substrate.
  • the substrate includes a pixel area and a non-pixel area, and the pair of substrates are patterned and surface-treated such that the surface energy of the pixel area on the substrate is different from the surface energy of the non-pixel area.
  • Step S102 Form a pixel defining layer on the substrate, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall has a recess.
  • the pixel dividing wall pattern is formed in a non-pixel area, and as shown in FIG. 3, the upper surface of the pixel dividing wall 15 has a recess.
  • the expression “the upper surface of the pixel dividing wall has a depression” is not a limitation on the manner in which the groove is formed, that is, the structure of the recess is formed in various forms, for example, it may be Forming a pixel dividing wall without a concave surface, and then the other surface of the pixel dividing wall is inwardly atrophied to form a recessed structure, for example, a patterning process may be used to form a recessed structure on the upper surface of the pixel dividing wall, or by a coffee ring effect
  • the recessed structure is formed by uneven evaporation of the surface of the pixel dividing wall, or directly printed (such as 3D printing technology) into a pixel dividing wall having a concave structure.
  • forming the pixel defining layer on the substrate is formed by over inkjet printing.
  • a pixel defining layer is formed by inkjet printing as an example for detailed description.
  • there are various ways to form a pixel definition on a substrate for example, it can also be formed by a 3D printing technique.
  • the surface energy of the substrate is the sum of the dispersion component and the polar component of the substrate surface, and the size and polarity of the surface energy of the substrate can be obtained by measuring the etching angle by the measuring instrument, and different regions on the substrate. The greater the difference in the erosion angle, the greater the difference in surface energy.
  • the inkjet printed droplets differ in the etch angle of the substrate pixel region from the etched angle of the ink-printed droplets in the substrate non-pixel region by more than 30°.
  • the contact angle refers to the angle between the tangent of the gas-liquid interface at the intersection of gas, liquid and solid, and the intersection between the liquid and the solid-liquid boundary. As shown in Fig.
  • the droplets 16 printed on the substrate substrate have a contact angle of ⁇ . If 6 ⁇ 90. , the solid surface is lyophilic, that is, the liquid is relatively easy to wet the solid, and the smaller the contact angle, the better the wettability; if 6 > 90 °, the solid form
  • the difference of the etching angle is not specifically limited.
  • the contact angle of the droplet in the pixel region of the substrate and the contact angle of the droplet in the non-pixel region of the substrate may be different by 60° or In less than 30°, etc.
  • the surface of the substrate is processed such that the surface energy of the pixel region on the substrate is different from the surface energy of the non-pixel region, and the contact angle and droplet of the droplet (ink) in the pixel region of the substrate
  • the contact angles in the non-pixel regions of the substrate differ by more than 30°, including 30° as an example for detailed description.
  • the droplets generally used in the measurement of the contact angle are water. Of course, other solutions may be used.
  • the droplets are preferably inkjet inks, that is, inkjet printed pixels. A solution that defines the material of the layer.
  • self-assembled monolayer surface treatment includes wet liquid phase self-assembly monolayer surface treatment and dry gas phase self-assembly monolayer surface treatment.
  • the method of changing the surface energy of the substrate reference may be made to the prior art, which is not specifically limited in the embodiment of the present invention. Of course, when processing the substrate, the corresponding method can be adopted according to actual requirements.
  • the manufacturing process temperature of the existing flexible substrate is severe, which severely limits the fabrication of the flexible substrate.
  • the manufacturing method provided by the embodiment of the present invention does not need too high temperature, and thus can be used for Make a flexible substrate.
  • the flexible substrate may be PET (polyethylene terephthalate), PI (polyimide) or the like.
  • the substrate is patterned and surface-treated such that the surface energy of the pixel region on the substrate is different from the surface energy of the non-pixel region:
  • the substrate is subjected to self-assembly monolayer surface treatment to form a monomolecular layer in the pixel region of the substrate.
  • the self-assembled monolayer surface treatment is performed on the substrate, and forming the monomolecular layer in the pixel region of the substrate may be forming a monomolecular layer only in the pixel region of the substrate.
  • the non-pixel area on the substrate may be blocked by another device, and the monomolecular layer may be formed only in the pixel region.
  • the self-assembled monolayer surface treatment is performed on the substrate, and forming a monomolecular layer in the pixel region of the substrate is specifically:
  • the substrate is subjected to self-assembly monolayer surface treatment to form a monolayer on the surface of the substrate; and the monolayer of the non-pixel region is removed.
  • the method further includes: removing the monomolecular layer of the pixel region. Since the monomolecular layer in the pixel region is disadvantageous for the spreading of the luminescent layer material, it is preferable to remove the monomolecular layer of the pixel region after forming the pixel defining layer including the pixel dividing wall pattern.
  • the embodiment of the present invention is described in detail by using a self-assembled fluorinated silane monolayer and then forming a pixel separation wall by inkjet printing. As shown in FIG. 6, the method includes:
  • Step S201 The substrate is treated with silicon germanium fluoride in an inert gas atmosphere to form a monolayer of silicon fluoride germanium on the surface of the substrate.
  • a fluorinated silane monolayer is formed on the surface of the substrate, wherein the substrate includes a base substrate 11 and an anode electrode layer 12 disposed on the base substrate 11, the anode electrode layer including A plurality of pixel units, the single molecular layer simultaneously covering the surface of the pixel unit.
  • a method for forming a fluorinated silane monolayer on the surface of the substrate may be a method of self-assembling a monolayer in a thousand gas phase.
  • the substrate may be treated with silicon fluoride vapor to form a fluorinated silane on the surface of the substrate.
  • Molecular layer It is also possible to use a wet-phase liquid phase self-assembled monolayer surface treatment.
  • the substrate can be immersed in a liquid of silicon fluoride, and a silicon fluoride germanium monolayer can be formed on the surface of the substrate.
  • Step S202 Using a mask to irradiate the non-pixel region on the substrate with ultraviolet light to remove the silicon germanium monolayer in the non-pixel region.
  • the mask 22 includes a light transmitting region and an opaque region, so that the opaque region of the mask covers the pixel region on the substrate, and the ultraviolet light is irradiated onto the substrate through the light transmitting region.
  • the pixel region is a silicon germanide monolayer.
  • the ultraviolet light is generally irradiated by an ultraviolet ozone cleaner, and the light energy of the ultraviolet light during the irradiation can decompose the oxygen in the air to form ozone.
  • Step S203 forming a pixel dividing wall in the non-pixel area of the substrate.
  • a pixel dividing wall 15 is formed in a non-pixel area of the substrate by a method of inkjet printing.
  • Step S204 removing the silicon fluoride germanium monolayer in the pixel region.
  • the pixel region is irradiated with ultraviolet light to remove the fluorinated silane monolayer of the pixel region, as shown in FIG.
  • the fluoropolymer monomolecular layer of the pixel region may be removed by irradiating only the pixel region with ultraviolet light using a mask.
  • the ultraviolet light irradiation has no other influence on the formed pixel partition wall and other film or layer structures on the substrate, the entire substrate may be irradiated with ultraviolet light to remove the fluorinated silane monolayer in the pixel region.
  • step S102 or step S203 forming a pixel defining layer including a pixel dividing wall pattern on the substrate by inkjet printing is specifically:
  • Step Si 02i a method of forming a pixel dividing wall material in a non-pixel area by inkjet printing.
  • the solution forming the pixel dividing wall material may be a solution of an organic insulating material, which may be a solution formed by mixing an organic insulating material solute and an organic solvent.
  • the organic insulating material comprises: polyhexafluoropropylene, fluorinated parylene, fluorinated polysilyl ether, fluorinated polyimide, fluorinated polyamide, polyimide, polysiloxane, Polymethyl methacrylate, polybutyl methacrylate, cyclohexyl methacrylate, polystyrene, and the like.
  • the organic insulating material solution has a solvent boiling point of 200 C or less, including 200 ⁇ .
  • the organic solvent may be toluene having a boiling point of about 10 C.
  • the edge of the ink solution printed on the substrate is lower due to the lower vapor pressure of the solvent of the organic insulating material, and the volatilization rate is fast, so that the solution of the intermediate portion flows toward the edge, and finally the thickness of the film formed at the edge is higher than the middle portion, that is,
  • the "coffee ring" effect causes the upper surface of the printed ink solution to be recessed inwardly at the intermediate portion, thereby forming a pixel dividing wall as shown in FIG.
  • Step S1022 After the solution to be printed on the substrate forms a coffee ring structure, the solution printed in the non-pixel area is cured, and the coffee ring structure forms the recess.
  • the solution printed on the substrate forms the coffee ring structure in an environment of 20-40 °C.
  • the coffee ring is formed by evaporation of a solvent at room temperature under normal temperature. Since the coffee ring is formed by evaporating the solvent, at a lower temperature, the evaporation of the solvent is slow, and the formed coffee ring is more pronounced, that is, in the pixel. The deeper the groove formed by the partition wall surface, the more solution is deposited in the groove. It should be noted that the curing process of the inkjet printing ink solution can be cured according to a specific inkjet printing ink solution selection method.
  • the ink solution printed by the ink is taken as an example of the organic insulating material, and the solution of the organic insulating material is annealed to remove the solvent in the organic insulating material to cure the organic insulating material. It should be noted that the annealing and solidification treatment of the solution mainly changes the microstructure of the material.
  • the organic insulating material is a polymer material, and the solvent is a small molecule solvent, and the two forming solutions form a pixel defining layer including a pixel dividing wall pattern on the substrate by inkjet printing.
  • the solution of the organic insulating material is annealed to remove the small molecule solvent in the organic insulating material solution, and the pixel defining layer formed on the substrate including the pixel dividing wall pattern is a polymer organic insulating material.

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  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Ink Jet (AREA)

Abstract

Provided are a pixel definition layer and a manufacturing method therefor, a display substrate and a display device, which relate to the technical field of display and solve the problem of poor display due to the fact that a little printing ink spills over to adjacent pixel regions during existing ink-jet printing. Provided is a pixel definition layer. The pixel definition layer comprises a pattern of a pixel separation wall (15), and an upper surface of the pixel separation wall (15) has a depression.

Description

ί象素界定层及其制作方法、 显示基板及显示装置 本发明涉及显示技术领域, 尤其涉及一种像素界定层及其制作方法、 显 示基板及显示装置。 喷墨打印技术是现代办公印刷中采用的主要技术之一, 近年来, 研究人 员开始尝试把喷墨打印技术应用于平面功能材料的制备, 如制备聚合物导电 膜、 制备彩色有机发光二极管、 制备薄膜半导体器件等。  The present invention relates to the field of display technologies, and in particular, to a pixel defining layer, a method for fabricating the same, a display substrate, and a display device. Inkjet printing technology is one of the main technologies used in modern office printing. In recent years, researchers have begun to apply inkjet printing technology to the preparation of planar functional materials, such as preparing polymer conductive films, preparing color organic light-emitting diodes, and preparing. Thin film semiconductor devices and the like.
ί见有的有;机发光二极管 ( Organic Light Emitting Diode, OLED) 显示基 板, 如图 1 所示, OLED显示基板包括衬底基板 11、 设置在所述衬底基板 11上的阳极电极层 12、 发光功能层 13、 阴极电极层 14。 显示基板包括多个 像素区域 31和非像素区域 32, 如图 2所示。 在制造过程中, 阳极电极层包 括多个像素图案, 所述像素图案对应像素区域, 利用喷墨打印的方式在阳极 电极层上形成发光功能层。 然而, 由于墨水的流动性, 为了减少喷墨打印的 墨水流溢到相邻的像素图案区域, 一般在像素图案区域之间的非像素区域设 置包括像素分隔墙的像素界定层, ^以形成多个包围像素区域的空间, 喷墨 打印的发光功能层墨水通过喷墨打印的方式啧涂在所述包围空间内, 即啧涂 在阳极电极层表面。  An organic light emitting diode (OLED) display substrate, as shown in FIG. 1, the OLED display substrate includes a base substrate 11, an anode electrode layer 12 disposed on the base substrate 11, The light-emitting function layer 13 and the cathode electrode layer 14. The display substrate includes a plurality of pixel areas 31 and non-pixel areas 32, as shown in FIG. In the manufacturing process, the anode electrode layer includes a plurality of pixel patterns corresponding to the pixel regions, and a light-emitting function layer is formed on the anode electrode layer by inkjet printing. However, due to the fluidity of the ink, in order to reduce the ink flow of the inkjet printing to the adjacent pixel pattern regions, a pixel defining layer including a pixel dividing wall is generally disposed in the non-pixel region between the pixel pattern regions, to form a plurality of In the space surrounding the pixel region, the ink-jet printed luminescent functional layer ink is applied to the surrounding space by inkjet printing, that is, ruthenium is applied on the surface of the anode electrode layer.
但在实际喷墨打印过程中, 喷墨打印的墨水可能会有少量溢出, 就会流 溢在相邻的像素区域, 造成显示不良。 本发明的实施例提供一种像素界定层及其制作方法、 显示基板及显示装 置, 所述像素界定层包括像素分隔墙图案, 像素分隔墙的上表面在中间部分 向内凹陷, 喷墨打印的墨水有少量流溢会沉积在像素分隔墙向内凹陷的凹槽 内, 避免因流溢到相邻的像素区域而造成显示不良。  However, in the actual inkjet printing process, the ink of the inkjet printing may overflow a little, and it will overflow in the adjacent pixel area, resulting in poor display. Embodiments of the present invention provide a pixel defining layer and a manufacturing method thereof, a display substrate, and a display device, wherein the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall is recessed inward at an intermediate portion, and inkjet printing A small amount of ink overflows in the recesses that are recessed inwardly of the pixel dividing wall to prevent display failure due to overflow to adjacent pixel areas.
为达到上述目的, 本发明的实施例采用如下技术方案:  In order to achieve the above object, the embodiment of the present invention adopts the following technical solutions:
本发明实施例提供了一种像素界定层, 所述像素界定层包括像素分隔墙 图案, 且像素分隔墙的上表面具有凹陷。  Embodiments of the present invention provide a pixel defining layer, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall has a recess.
可选的, 所述凹陷的深度占所述像素分隔墙高度的 20%至 40%。 本发明实施例提供了一种像素界定层的制作方法, 包括: Optionally, the depth of the recess accounts for 20% to 40% of the height of the pixel dividing wall. Embodiments of the present invention provide a method for fabricating a pixel defining layer, including:
对基板进行图案化表面处理;  Performing a patterned surface treatment on the substrate;
在基板上形成像素界定层, 所述像素界定层包括像素分隔墙图案, 且像 素分隔墙的上表面具有凹陷。  A pixel defining layer is formed on the substrate, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall has a recess.
可选的, 形成所述像素界定层的溶液中溶剂的沸点在 200 C以下。 可选的, 在基板上形成像素界定层是通过喷墨打印形成的。  Optionally, the boiling point of the solvent in the solution forming the pixel defining layer is below 200 C. Optionally, forming a pixel defining layer on the substrate is formed by inkjet printing.
可选的,所述啧墨打印的溶液的溶剂为二氯甲烷、三氯甲垸、四氢呋喃、 氯苯、 甲苯、 邻二氯苯、 邻二甲苯、 正己烷、 环己垸、 苯甲醚、 全氟呋喃、 N" N二甲基甲酰胺、 N, N-二甲基乙酰胺或二甲基亚砜。  Optionally, the solvent of the ink-printing solution is dichloromethane, chloroform, tetrahydrofuran, chlorobenzene, toluene, o-dichlorobenzene, o-xylene, n-hexane, cyclohexanide, anisole, Perfluorofuran, N"N-dimethylformamide, N,N-dimethylacetamide or dimethyl sulfoxide.
可选的, 对包括像素区域与非像素区域的基板进行图案化表面处理使像 素区域的表面能与非像素区域的表面能不同;  Optionally, patterning the surface of the substrate including the pixel region and the non-pixel region to make the surface energy of the pixel region different from the surface energy of the non-pixel region;
在非像素区域形成所述像素分隔墙图案。  The pixel dividing wall pattern is formed in a non-pixel area.
可选的, 液滴在所述像素区域的接触角和在所述非像素区域的接触角相 差大于 30° 。  Optionally, the contact angle of the droplets in the pixel region and the contact angle in the non-pixel region differ by more than 30°.
可选的, 所述对基板迸行图案化表面处理使得基板上像素区域的表面能 与非像素区域的表面能大小不同具体为:  Optionally, the patterning surface treatment of the pair of substrates is such that the surface energy of the pixel region on the substrate is different from the surface energy of the non-pixel region:
对基板进行自组装单分子层表面处理, 在像素区域形成单分子层。  The substrate is subjected to self-assembly monolayer surface treatment to form a monomolecular layer in the pixel region.
可选的, 对所述基板进行自组装单分子层表面处理, 在像素区域形成单 分子层具体为:  Optionally, the self-assembled monolayer surface treatment is performed on the substrate, and forming a monomolecular layer in the pixel region is specifically:
对基板进行自组装单分子层表面处理, 在基板表面形成单分子层; 去除非像素区域的单分子层。  The substrate is subjected to self-assembly monolayer surface treatment to form a monolayer on the surface of the substrate; and the monolayer of the non-pixel region is removed.
可选的, 所述对基板进行自组装单分子层表面处理, 在像素区域形成单 分子层具体为: 在惰性气体的环境中, 利用氟化硅烷对基板进行处理, 在基 板表面形成氟化硅垸的单分子层;  Optionally, the self-assembled monolayer surface treatment is performed on the substrate, and forming a monomolecular layer in the pixel region is specifically: processing the substrate by using a fluorinated silane in an inert gas environment, forming a silicon fluoride on the surface of the substrate Monolayer of germanium;
利用掩膜板对基板上的非像素区域迸行紫外光照射去除非像素区域的氟 化硅垸单分子层。  The non-pixel region on the substrate is irradiated with ultraviolet light by a mask to remove the silicon fluoride germanium monolayer in the non-pixel region.
可选的, 在非像素区域形成像素分隔墙之后, 还包括:  Optionally, after forming the pixel separation wall in the non-pixel area, the method further includes:
去除像素区域的单分子层。  The monolayer of the pixel region is removed.
可选的, 在惰性气体的环境中, 利用氟化硅垸对基板进行处理, 在基板 表面形成氟化硅烷的单分子层; 利用掩膜板对基板上的非像素区域进行紫外 光照射, 去除非像素区域的氟化硅烷单分子层, 再在基板的非像素区域形成 像素分隔墙之后, 还包括: 去除像素区域的氟化硅烷。 Optionally, in an inert gas environment, the substrate is processed using silicon germanium fluoride on the substrate. Forming a monomolecular layer of fluorinated silane on the surface; irradiating the non-pixel region on the substrate with ultraviolet light by using a mask to remove the fluorinated silane monolayer in the non-pixel region, and then forming the pixel separation wall in the non-pixel region of the substrate Also included: Removes the fluorinated silane from the pixel area.
可选的, 所述去除像素区域的氟化硅垸具体为:  Optionally, the silicon fluoride buffer for removing the pixel region is specifically:
至少对像素区域迸行紫外光照射。  At least the pixel area is illuminated by ultraviolet light.
可选的, 所述利用啧墨 ίί印在基板上形成像素界定层具体为:  Optionally, the forming the pixel defining layer by using the ink on the substrate is specifically:
通过喷墨打印的方法在非像素区域 ίί印形成像素分隔墙材料的溶液; 待基板上打印的溶液形成咖啡环结构之后, 对非像素区域打印的溶液迸 行固化处理, 所述咖啡环结构形成为所述凹陷。  Forming a solution of the pixel dividing wall material in a non-pixel area by inkjet printing; after the solution printed on the substrate forms a coffee ring structure, the solution printed in the non-pixel area is cured, and the coffee ring structure is formed It is the depression.
可选的, 基板上打印的溶液在 2040Ό的环境中形成所述咖啡环结构。 本发明实施例提供了一种显示基板, 所述显示基板包括本发明实施例提 供的像素界定层。  Alternatively, the solution printed on the substrate forms the coffee ring structure in an environment of 2040 Torr. Embodiments of the present invention provide a display substrate including a pixel defining layer provided by an embodiment of the present invention.
本发明实施例提供了一种显示装置, 所述显示装置包括本发明实施例提 供的显示基板。  The embodiment of the invention provides a display device, which comprises a display substrate provided by an embodiment of the invention.
本发明实施例提供的一种像素界定层及其制作方法, 包括像素界定层的 显示装置, 所述像素界定层包括像素分隔墙图案, 且像素分隔墙的上表面在 中间部分向内凹陷, 这样, 喷墨打印的过程中, 像素区域啧印的墨水即使有 少量的流溢, 也会沉积在像素分隔墙的凹槽中, 从而可以避免流溢到相邻的 像素单元, 造成显示效果不良。 图 1为 OLED显示基板的结构示意图;  A pixel defining layer and a manufacturing method thereof, including a pixel defining layer display device, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall is recessed inward in the middle portion, such that In the process of inkjet printing, even if there is a small amount of overflow in the ink area of the pixel area, it is deposited in the groove of the pixel dividing wall, thereby avoiding overflow to the adjacent pixel unit, resulting in poor display effect. 1 is a schematic structural view of an OLED display substrate;
图 2为 OLED显示基板的俯视结构示意图;  2 is a schematic top plan view of an OLED display substrate;
图 3为本发明实施例提供的显示基板的剖视结构示意图;  3 is a cross-sectional structural view of a display substrate according to an embodiment of the present invention;
图 4为本发明实施例提供的一种像素界定层的制作方法示意图; 图 5为液滴在基板上与基板形成的接触角示意图;  4 is a schematic diagram of a method for fabricating a pixel defining layer according to an embodiment of the present invention; FIG. 5 is a schematic view showing a contact angle of a droplet on a substrate and a substrate;
图 6为本发明实施例提供的一种像素界定层的具体制作流程图; 图 7为本发明实施例提供的一种在基板表面形成氟化硅垸单分子层示意 图 8本发明实施例提供的一种为利用掩膜板对形成有氟化硅烷单分子层 的基板进行紫外光照射处理的示意图; FIG. 6 is a flow chart of a specific process for forming a pixel defining layer according to an embodiment of the present invention; FIG. 7 is a schematic diagram of forming a silicon germanide monolayer on a surface of a substrate according to an embodiment of the present invention. One is to form a fluorinated silane monolayer by using a mask pair Schematic diagram of the substrate subjected to ultraviolet light irradiation treatment;
图 9为本发明实施例提供的一种在基板上非像素区域形成像素分隔墙的 示意图;  FIG. 9 is a schematic diagram of forming a pixel separation wall on a non-pixel area on a substrate according to an embodiment of the present invention; FIG.
图 10为本发明实施例提供的一种喷墨打印形成像素界定层的流程图; 附图标记:  FIG. 10 is a flowchart of forming a pixel defining layer by inkjet printing according to an embodiment of the present invention;
11 -衬底基板; 12-阳极电极层; 13-发光功能层; 14阴极电极层; 15-像素 分隔墙; 16液滴; 21氟化硅垸单分子层; 22-掩膜板; 31-像素区域, 32-非像 素区域。 下面将结合本发明实施例中的附图, 对本发明实施例中的技术方案进行 清楚、 完整地描述, 显然, 所描述的实施例仅仅是本发明一部分实施例, 而 不是全部的实施例。  11 - substrate; 12 - anode electrode layer; 13 - luminescent functional layer; 14 cathode electrode layer; 15-pixel dividing wall; 16 droplets; 21 silicon germanium monolayer; Pixel area, 32-non-pixel area. The technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.
本发明实施例提供了一种像素界定层, 所述像素界定层包括像素分隔墙 图案, 且所述像素分隔墙的上表面具有凹陷。 如图 3所示, 所述像素分隔墙 15的上表面在中间部分向内凹陷形成凹槽。  Embodiments of the present invention provide a pixel defining layer, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall has a recess. As shown in FIG. 3, the upper surface of the pixel dividing wall 15 is recessed inward at the intermediate portion to form a groove.
需要说明的是, 在本发明所有实施例中, 需要阐明 "层"和 "图案"的 定义, 以及之间的关系。 其中, "层"是指利用某一种材料在基板上利用沉积 或其他工艺制作出的一层薄膜, 其包括 "图案"。 例如, 本发明实施例中, 所 述像素界定层可以是通过喷墨打印形成的一层薄膜,其包括像素分隔墙图案。 喷墨打印的过程中, 在指定的区域打印, 但由于喷墨打印的墨水的流动性, 喷墨打印的墨水可能会流溢到相邻的其他区域, 故需要在啧墨打印的区域周 围形成像素分隔墙, 以防止喷墨打印的墨水的流溢。 如图 i所示, OLED显 示基板包括: 衬底基板 I I、 设置在所述衬底基板 11上的阳极电极层 12、 发 光功能层 13、 阴极电极层 14。 其中, 显示基板包括像素区域 31和非像素区 域 32, 如图 2所示。 在 OLED显示装置制作过程中, 阳极电极层包括多个像 素图案, 所述像素图案对应像素区域, 利 ^喷墨打印的方法在阳极电极层上 形成发光功能层, 由于啧墨打印的墨水具有一定的流动性, 为了减少喷印的 墨水流溢到相邻的像素图案区域, 如图 3所示, 在像素图案 (像素区域 31 ) 之间, 即非像素区域 32形成包括像素分隔墙 15的像素界定层, 用以形成多 个个包包围围空空间间,, 喷喷墨墨打打印印的的发发光光功功能能层层墨墨水水通通过过喷喷墨墨打打印印的的方方式式喷喷涂涂在在所所述述包包 围围空空间间内内,, 即即喷喷涂涂在在阳阳极极电电极极层层表表面面。。 需需要要说说明明的的是是,, 所所述述发发光光功功能能层层可可以以 包包括括:: 空空穴穴注注入入层层、、 空空穴穴传传输输层层、、 电电致致发发光光层层等等,, 且且每每一一层层均均可可以以采采用用啧啧墨墨 打打印印的的方方法法形形成成。。 本本发发明明实实施施例例中中的的所所述述基基板板,, 是是在在形形成成像像素素分分隔隔墙墙之之前前的的 基基板板,, 其其可可以以是是衬衬底底基基板板也也可可以以是是在在衬衬底底基基板板上上形形成成有有多多个个薄薄膜膜或或层层结结构构。。 所所述述衬衬底底基基板板可可以以是是玻玻璃璃、、 硅硅片片、、 石石英英等等。。 如如图图 33所所示示,, 在在衬衬底底基基板板 11 !!上上形形 成成有有阳阳极极电电极极层层 1122,, 且且本本发发明明实实施施例例中中以以所所述述基基板板为为例例迸迸行行详详细细说说明明。。 It should be noted that in all embodiments of the present invention, it is necessary to clarify the definitions of "layer" and "pattern", and the relationship between them. Wherein, "layer" refers to a film formed by deposition or other process on a substrate using a certain material, which includes a "pattern". For example, in the embodiment of the present invention, the pixel defining layer may be a film formed by inkjet printing, which includes a pixel dividing wall pattern. In the process of inkjet printing, printing is performed in a specified area, but due to the fluidity of the ink of the inkjet printing, the ink of the inkjet printing may overflow to other adjacent areas, so it is necessary to form a pixel around the area where the ink is printed. Separate the walls to prevent ink spills from inkjet printing. As shown in FIG. 1, the OLED display substrate includes: a substrate substrate II, an anode electrode layer 12 disposed on the substrate substrate 11, a light emitting function layer 13, and a cathode electrode layer 14. The display substrate includes a pixel area 31 and a non-pixel area 32, as shown in FIG. In the manufacturing process of the OLED display device, the anode electrode layer includes a plurality of pixel patterns, and the pixel pattern corresponds to the pixel region, and the method of inkjet printing forms a light-emitting function layer on the anode electrode layer, because the ink printed by the ink is certain The fluidity, in order to reduce the flow of the printed ink to the adjacent pixel pattern area, as shown in FIG. 3, between the pixel patterns (pixel areas 31), that is, the non-pixel areas 32 form a pixel definition including the pixel dividing wall 15. Layer, used to form more Each package encloses a space between the air and the space, and the ink-emitting ink function of the ink-jet ink is printed on the layer of ink, and the ink is sprayed through the inkjet ink. The bag surrounds the inner space of the space, that is, sprayed and sprayed on the surface of the surface of the anode and cathode electrode layers. . It should be noted that the illuminating light function layer can be included in the package:: empty hole injection into the layer, empty hole transfer transmission layer , an electro-optic light-emitting layer, and the like, and each of the layers may be formed by using a method of printing with ink. . The substrate board according to the embodiment of the present invention is a base substrate board before forming an image forming pixel division partition wall wall, which may be Therefore, the substrate substrate plate may be formed on the substrate substrate of the substrate substrate to have a plurality of thin film films or a layer structure. . The lining substrate substrate plate may be a glass glazing, a silicon silicon wafer, a sillimanite or the like. . As shown in FIG. 33, a positive anode electrode layer layer 1122 is formed on the substrate substrate board 11!, and the present invention is embodied in the present invention. In the example, the base substrate board described above is taken as an example for detailed description. .
本本发发明明实实施施例例中中提提供供的的像像素素分分隔隔墙墙如如图图 33所所示示,, 其其上上表表面面在在中中间间部部分分向向 内内凹凹陷陷,, 形形成成一一个个凹凹槽槽。。 这这样样,, 喷喷墨墨打打印印的的过过程程中中,, 像像素素区区域域喷喷印印的的墨墨水水即即 使使有有少少量量的的流流溢溢,, 也也会会沉沉积积在在像像素素分分隔隔墙墙的的凹凹槽槽中中,, 从从而而可可以以避避免免流流溢溢到到相相 邻邻的的像像素素单单元元,, 造造成成显显示示效效果果不不良良。。 其其中中,, 所所述述墨墨水水为为形形成成像像素素界界定定层层的的材材 料料的的溶溶液液。。  The image pixel separation partition wall provided by the present invention is as shown in FIG. 33, and the upper surface surface thereof is divided in the middle intermediate portion. The recesses are recessed inwardly, and are formed into a recessed groove. . In this way, in the process of printing inkjet ink, the ink ink water sprayed and printed like the pixel area is even if there is a small amount of flow overflowing, It will also deposit in the concave groove groove like the pixel pixel partition wall wall, so as to avoid the flow-free overflow to the adjacent pixel of the adjacent pixel. Yuan,, the effect of creating a display effect is not bad. . Wherein, the ink water of the ink is a solution solution for forming a material material defining a fixed layer of the pixel. .
需需说说明明的的是是,, ""所所述述像像素素分分隔隔墙墙的的上上表表面面具具有有凹凹陷陷""的的表表述述并并非非是是对对所所 述述凹凹槽槽的的形形成成方方式式的的限限制制,, 即即,, 所所述述凹凹陷陷的的结结构构的的形形成成有有多多种种形形式式,, 例例如如可可 以以是是先先形形成成无无凹凹陷陷表表面面的的像像素素分分隔隔墙墙,, 再再遥遥过过其其他他工工艺艺使使得得像像素素分分隔隔墙墙的的上上 表表面面向向内内蒌蒌缩缩形形成成凹凹陷陷的的结结构构,, 例例如如可可以以是是通通过过构构图图工工艺艺在在像像素素分分隔隔墙墙的的上上 表表面面形形成成凹凹陷陷结结构构,, 或或者者通通过过咖咖啡啡环环效效应应,, 利利用用像像素素分分隔隔墙墙的的表表面面各各处处的的蒸蒸 发发不不均均匀匀形形成成凹凹陷陷结结构构,, 或或者者直直接接打打印印 ((如如 33DD打打印印技技术术等等)) 成成具具有有凹凹陷陷结结 构构的的像像素素分分隔隔墙墙等等。。  It should be noted that the description of the above-mentioned surface pixel mask of the partition wall wall having the concave depression "" is not true. The shape of the concave groove groove is formed in a limited manner, that is, the shape of the structure of the concave depression is formed into a plurality of various forms. For example, if it is possible to form a pixel-like partition wall wall which is formed first without a concave concave surface surface, and then passes through other other techniques to make it The upper surface of the surface of the partition wall like the pixel element partition wall faces the inwardly collapsed shape and forms a concave depression. For example, the image may be passed through the texture pattern. The craftsmanship is formed into a concave depression structure on the upper surface of the upper surface of the partition wall like a pixel element, or it may pass through the effect of the coffee ring, and the use of the image The evaporation of the evaporation surface of each surface surface of the partition wall of the pixel pixel is not uneven The uniform shape is formed into a concave depression structure, or directly printed directly (for example, such as 33DD printing technology, etc.) to form a structure having a concave depression structure Separate partition walls like pixatin. .
可可选选的的,, 所所述述凹凹陷陷的的深深度度占占所所述述像像素素分分隔隔墙墙高高度度的的 2200%%至至 4400%%。。  Optionally, the depth of the concave depression is 2200%% to 4400%% of the height of the pixel-separated partition wall. .
需需要要说说明明的的是是,, 所所述述像像素素分分隔隔墙墙也也可可以以用用于于形形成成其其他他的的显显示示装装置置以以及及其其 他他结结构构。。 例例如如,, 也也可可以以是是形形成成液液晶晶显显示示装装置置的的彩彩色色膜膜层层时时,, 在在形形成成所所述述彩彩色色 膜膜层层之之前前,, 在在基基板板上上形形成成上上述述像像素素分分隔隔墙墙((黑黑矩矩阵阵)),, 再再在在所所述述像像素素分分隔隔墙墙形形 成成的的包包围围空空间间分分别别形形成成红红、、 绿绿、、 蓝蓝三三种种不不同同颜颜色色的的膜膜层层,, 以以保保证证每每一一种种颜颜色色 的的纯纯净净度度。。 对对于于显显示示装装置置的的类类型型以以及及利利用用所所述述像像素素分分隔隔墙墙用用于于形形成成的的不不同同结结
Figure imgf000006_0001
It should be noted that the illustrated pixel pixel separation partition wall may also be used for display display devices for forming other others. Its other structure. . For example, when the color-colored color film layer formed by the liquid crystal display device is formed in a liquid crystal display device, the film may be formed into the color film. Before the layer layer, on the base substrate board, the above-mentioned pixel pixel separation partition wall ((black black matrix matrix)) is formed on the base substrate, and then the pixel in the image is further described. The partition formed by the wall of the partition wall is surrounded by a space formed by red, green, green, and blue, which are different in color and color. Guarantee the pure purity of each color of each color. . For the type of type for the display device, and for the use of the pixel phantom separation wall for the formation of the shape is not the same as the same knot
Figure imgf000006_0001
本本发发明明实实施施例例提提供供了了一一种种显显示示基基板板,, 包包括括本本发发明明实实施施例例提提供供的的像像素素界界定定 板。需要说明的是,所述显示装置可以为液晶显示器、电子纸、 OLED(Organic Light-Emitting Diode,有机发光二极管)、 PLED ( Polymer Light-Emitting Diode, 高分子发光二极管) 显示器等显示器件以及包括这些显示器件的电视、 数码 相机、 手机、 平板电脑等任何具有显示功能的产品或者部件。 The present invention provides a display substrate for a display, and includes a pixel display boundary defined by the embodiment of the present invention. Board. It should be noted that the display device may be a display device such as a liquid crystal display, an electronic paper, an OLED (Organic Light-Emitting Diode), a PLED (Polymer Light-Emitting Diode) display, or the like. A display product such as a TV, digital camera, mobile phone, tablet, etc., with any display product or component.
本发明实施例提供了一种显示装置的制作方法, 如图 4所示, 包括: 步骤 S101、 对基板迸行图案化表面处理。  An embodiment of the present invention provides a method for fabricating a display device. As shown in FIG. 4, the method includes: Step S101: Performing a patterned surface treatment on a substrate.
具体的, 所述基板包括像素区域和非像素区域, 所述对基板进行图案化 表面处理, 使得基板上像素区域的表面能与非像素区域的表面能大小不同。  Specifically, the substrate includes a pixel area and a non-pixel area, and the pair of substrates are patterned and surface-treated such that the surface energy of the pixel area on the substrate is different from the surface energy of the non-pixel area.
步骤 S102、 在基板上形成像素界定层, 所述像素界定层包括像素分隔墙 图案, 且所述像素分隔墙的上表面具有凹陷。 具体的, 在非像素区域形成所 述像素分隔墙图案, 如图 3所示, 所述像素分隔墙 15的上表面具有凹陷。  Step S102: Form a pixel defining layer on the substrate, the pixel defining layer includes a pixel dividing wall pattern, and an upper surface of the pixel dividing wall has a recess. Specifically, the pixel dividing wall pattern is formed in a non-pixel area, and as shown in FIG. 3, the upper surface of the pixel dividing wall 15 has a recess.
需说明的是, "所述像素分隔墙的上表面具有凹陷"的表述并非是对所 述凹槽的形成方式的限制, 即, 所述凹陷的结构的形成有多种形式, 例如可 以是先形成无凹陷表面的像素分隔墙, 再通过其他工艺使得像素分隔墙的上 表面向内萎缩形成凹陷的结构, 例如可以是通过构图工艺在像素分隔墙的上 表面形成凹陷结构, 或者通过咖啡环效应, 利用像素分隔墙的表面各处的蒸 发不均匀形成凹陷结构, 或者直接打印 (如 3D打印技术等) 成具有凹陷结 构的像素分隔墙等。  It should be noted that the expression “the upper surface of the pixel dividing wall has a depression” is not a limitation on the manner in which the groove is formed, that is, the structure of the recess is formed in various forms, for example, it may be Forming a pixel dividing wall without a concave surface, and then the other surface of the pixel dividing wall is inwardly atrophied to form a recessed structure, for example, a patterning process may be used to form a recessed structure on the upper surface of the pixel dividing wall, or by a coffee ring effect The recessed structure is formed by uneven evaporation of the surface of the pixel dividing wall, or directly printed (such as 3D printing technology) into a pixel dividing wall having a concave structure.
优选的, 在基板上形成像素界定层是遥过喷墨打印形成的。 且本发明实 施例中以通过喷墨打印形成像素界定层为例进行详细说明。 但在基板上形成 像素界定的方式有多种, 例如还可以通过 3D打印技术形成。  Preferably, forming the pixel defining layer on the substrate is formed by over inkjet printing. In the embodiment of the present invention, a pixel defining layer is formed by inkjet printing as an example for detailed description. However, there are various ways to form a pixel definition on a substrate, for example, it can also be formed by a 3D printing technique.
需要说明的是, 基板的表面能的大小是基板表面的色散分量和极性分量 之和, 可以通过测量仪测量接蝕角获得基板表面能的大小和极性, —且.基板上 的不同区域的接蝕角相差越大, 则表面能相差越大。 本发明实施例中, 喷墨 打印的液滴在所述基板像素区域的接蝕角和啧墨打印的液滴在所述基板非像 素区域的接蝕角相差大于 30° 。接触角是指在气、 液、 固 ΞΞ相交点处气-液界 面的切线穿过液体与固-液交界线之间的夹角。 如图 5 所示, 在衬底基板 Π 上打印的液滴 16, 其接触角为 θ。 若6 <90。 , 则固体表面是亲液性的, 即 液体较易湿润固体, 且其接触角越小, 湿润性越好; 若6 >90° , 则固体表 面是疏液性的, 即液体不易湿润固体, 容易在表面上移动; θ =90° , 其为湿 润与否的分界线。 需要说明的是, 疏液性和亲液性是相对的, 当基板上的表 面能不同时, 则相对而言, 一个亲液一个疏液。 需要说明的是, 本发明实施 例中对接蝕角的差值不作具体限定, 例如空气中, 液滴在基板像素区域的接 触角和液滴在基板非像素区域的接触角还可以相差 60° 或者小于 30° 等,本 发明实施例中以对基板的表面进行处理, 使得基板上像素区域的表面能和非 像素区域的表面能不同, 液滴 (墨水) 在基板像素区域的接触角与液滴在基 板非像素区域的接触角相差大于 30° , 包括 30° 为例迸行详细说明。 需要说 明的是, 在接触角测量时一般采用的液滴为水, 当然, 也可以是其他溶液, 本发明实施例中, 所述液滴优选采用喷墨打印的墨水, 即喷墨打印的像素界 定层的材料的溶液。 It should be noted that the surface energy of the substrate is the sum of the dispersion component and the polar component of the substrate surface, and the size and polarity of the surface energy of the substrate can be obtained by measuring the etching angle by the measuring instrument, and different regions on the substrate. The greater the difference in the erosion angle, the greater the difference in surface energy. In an embodiment of the invention, the inkjet printed droplets differ in the etch angle of the substrate pixel region from the etched angle of the ink-printed droplets in the substrate non-pixel region by more than 30°. The contact angle refers to the angle between the tangent of the gas-liquid interface at the intersection of gas, liquid and solid, and the intersection between the liquid and the solid-liquid boundary. As shown in Fig. 5, the droplets 16 printed on the substrate substrate , have a contact angle of θ. If 6 <90. , the solid surface is lyophilic, that is, the liquid is relatively easy to wet the solid, and the smaller the contact angle, the better the wettability; if 6 > 90 °, the solid form The surface is lyophobic, that is, the liquid does not easily wet the solid and easily moves on the surface; θ = 90°, which is the boundary line of wetness or not. It should be noted that the lyophobicity and lyophilicity are relative. When the surface energy on the substrate is different, a lyophile is relatively lyophobic. It should be noted that, in the embodiment of the present invention, the difference of the etching angle is not specifically limited. For example, in air, the contact angle of the droplet in the pixel region of the substrate and the contact angle of the droplet in the non-pixel region of the substrate may be different by 60° or In less than 30°, etc., in the embodiment of the invention, the surface of the substrate is processed such that the surface energy of the pixel region on the substrate is different from the surface energy of the non-pixel region, and the contact angle and droplet of the droplet (ink) in the pixel region of the substrate The contact angles in the non-pixel regions of the substrate differ by more than 30°, including 30° as an example for detailed description. It should be noted that the droplets generally used in the measurement of the contact angle are water. Of course, other solutions may be used. In the embodiment of the present invention, the droplets are preferably inkjet inks, that is, inkjet printed pixels. A solution that defines the material of the layer.
现有的改变基板的表面能方法有多种, 例如自组装单分子层表面处理、 紫外臭氧清洗、 自组装多分子层表面处理、 表面沉积薄膜等。 其中, 自组装 单分子层表面处理包括湿法液相自组装单分子层表面处理和干法气相自组装 单分子层表面处理。 对于改变衬底表面能的方法可以参照现有技术, 本发明 实施例不作具体限定。 当然, 在对基板进行处理时, 可以根据实际的要求, 采用相应的方法。  There are various methods for changing the surface energy of a substrate, such as self-assembled monolayer surface treatment, ultraviolet ozone cleaning, self-assembled multi-layer surface treatment, surface-deposited film, and the like. Among them, self-assembled monolayer surface treatment includes wet liquid phase self-assembly monolayer surface treatment and dry gas phase self-assembly monolayer surface treatment. For the method of changing the surface energy of the substrate, reference may be made to the prior art, which is not specifically limited in the embodiment of the present invention. Of course, when processing the substrate, the corresponding method can be adopted according to actual requirements.
需要说明的是, 现有的柔性基板在制作的过程中, 由于加工的工艺温度 要求严格, 严重限制了柔性基板的制作, 本发明实施例提供的制作方法, 无 需太高的温度, 因此可用于制作柔性基板。 所述柔性基板可以是 PET (聚对 苯二甲酸乙二酯)、 PI (聚酰亚胺) 等。  It should be noted that, in the process of manufacturing, the manufacturing process temperature of the existing flexible substrate is severe, which severely limits the fabrication of the flexible substrate. The manufacturing method provided by the embodiment of the present invention does not need too high temperature, and thus can be used for Make a flexible substrate. The flexible substrate may be PET (polyethylene terephthalate), PI (polyimide) or the like.
可选的, 对基板进行图案化表面处理, 使得基板上像素区域的表面能与 非像素区域的表面能大小不同具体为:  Optionally, the substrate is patterned and surface-treated such that the surface energy of the pixel region on the substrate is different from the surface energy of the non-pixel region:
对基板进行自组装单分子层表面处理,在基板的像素区域形成单分子层。 具体的, 对基板进行自组装单分子层表面处理, 在基板像素区域形成单 分子层可以是仅仅在基板的像素区域形成单分子层。 例如可以是利用其他设 备将基板上非像素区域进行遮挡, 仅在像素区域形成单分子层。 或者, 可选 的, 对所述基板进行自组装单分子层表面处理, 在基板像素区域形成单分子 层具体为: 对基板进行自组装单分子层表面处理, 在基板表面形成单分子层; 去除非像素区域的单分子层。 The substrate is subjected to self-assembly monolayer surface treatment to form a monomolecular layer in the pixel region of the substrate. Specifically, the self-assembled monolayer surface treatment is performed on the substrate, and forming the monomolecular layer in the pixel region of the substrate may be forming a monomolecular layer only in the pixel region of the substrate. For example, the non-pixel area on the substrate may be blocked by another device, and the monomolecular layer may be formed only in the pixel region. Alternatively, optionally, the self-assembled monolayer surface treatment is performed on the substrate, and forming a monomolecular layer in the pixel region of the substrate is specifically: The substrate is subjected to self-assembly monolayer surface treatment to form a monolayer on the surface of the substrate; and the monolayer of the non-pixel region is removed.
且通过上述步骤在基板的非像素区域形成单分子层, 利用喷墨打印的方 法在基板上形成包括像素分隔墙图案的像素界定层之后,还可以进一步包括: 去除像素区域的单分子层。 由于像素区域内的单分子层不利于发光层材料的 铺展, 因此, 在形成包括像素分隔墙图案的像素界定层之后, 优选的去除像 素区域的单分子层。  And after forming the monomolecular layer in the non-pixel region of the substrate by the above steps, after forming the pixel defining layer including the pixel dividing wall pattern on the substrate by the method of inkjet printing, the method further includes: removing the monomolecular layer of the pixel region. Since the monomolecular layer in the pixel region is disadvantageous for the spreading of the luminescent layer material, it is preferable to remove the monomolecular layer of the pixel region after forming the pixel defining layer including the pixel dividing wall pattern.
具体的, 本发明实施例以利用自组装氟化硅烷单分子层、 再通过喷墨打 印形成像素分隔墙为例进行详细说明, 如图 6所示, 包括:  Specifically, the embodiment of the present invention is described in detail by using a self-assembled fluorinated silane monolayer and then forming a pixel separation wall by inkjet printing. As shown in FIG. 6, the method includes:
步骤 S201、 在惰性气体的环境中, 利用氟化硅垸对基板进行处理, 在基 板表面形成氟化硅垸的单分子层。  Step S201: The substrate is treated with silicon germanium fluoride in an inert gas atmosphere to form a monolayer of silicon fluoride germanium on the surface of the substrate.
具体的, 如图 7所示, 在基板的表面形成氟化硅烷单分子层, 其中, 所 述基板包括衬底基板 11以及设置在衬底基板 11的阳极电极层 12, 所述阳极 电极层包括多个像素单元,则所述单分子层同时覆盖在所述像素单元的表面。 需要说明的是, 在基板表面形成氟化硅烷单分子层可以采用千法气相自组装 单分子层的方法, 例可以是利用氟化硅垸蒸汽对基板进行处理, 在基板表面 形成氟化硅烷单分子层。 也可以是采用湿法液相自组装单分子层表面处理, 例如可以将基板浸泡在氟化硅垸的液体中, 在基板表面形成氟化硅垸单分子 层。  Specifically, as shown in FIG. 7, a fluorinated silane monolayer is formed on the surface of the substrate, wherein the substrate includes a base substrate 11 and an anode electrode layer 12 disposed on the base substrate 11, the anode electrode layer including A plurality of pixel units, the single molecular layer simultaneously covering the surface of the pixel unit. It should be noted that a method for forming a fluorinated silane monolayer on the surface of the substrate may be a method of self-assembling a monolayer in a thousand gas phase. For example, the substrate may be treated with silicon fluoride vapor to form a fluorinated silane on the surface of the substrate. Molecular layer. It is also possible to use a wet-phase liquid phase self-assembled monolayer surface treatment. For example, the substrate can be immersed in a liquid of silicon fluoride, and a silicon fluoride germanium monolayer can be formed on the surface of the substrate.
歩骤 S202、 利用掩膜板对基板上的非像素区域迸行紫外光照射, 去除非 像素区域的氟化硅垸单分子层。  Step S202: Using a mask to irradiate the non-pixel region on the substrate with ultraviolet light to remove the silicon germanium monolayer in the non-pixel region.
具体的, 如图 8所示, 掩膜板 22包括透光区和不透光区, 使得掩膜板的 不透光区覆盖基板上像素区域, 紫外光通过透光区照射到基板上, 去除非像 素区域的氟化硅垸单分子层。 需要说明的是, 利 ^紫外光进行照射, 一般是 利用紫外臭氧清洗机进行的, 而紫外光在照射的过程中的光能量能将空气中 的氧气分解形成臭氧。 且由于臭氧也会对基板上的氟化硅垸单分子层产生一 定的影响, 在对基板进行紫外光照射时, 优选使得掩膜板贴近所述基板, 进 而保证通过紫外光照射仅去除非像素区域的氟化硅垸单分子层而像素区域不 受影响。 步骤 S203、 在基板的非像素区域形成像素分隔墙。 Specifically, as shown in FIG. 8, the mask 22 includes a light transmitting region and an opaque region, so that the opaque region of the mask covers the pixel region on the substrate, and the ultraviolet light is irradiated onto the substrate through the light transmitting region. Unless the pixel region is a silicon germanide monolayer. It should be noted that the ultraviolet light is generally irradiated by an ultraviolet ozone cleaner, and the light energy of the ultraviolet light during the irradiation can decompose the oxygen in the air to form ozone. Moreover, since the ozone also has a certain influence on the silicon germanide monolayer on the substrate, when the substrate is irradiated with ultraviolet light, it is preferable to make the mask close to the substrate, thereby ensuring that only non-pixels are removed by ultraviolet light irradiation. The silicon fluoride strontium monolayer in the region is not affected by the pixel region. Step S203, forming a pixel dividing wall in the non-pixel area of the substrate.
如图 9所示, 通过喷墨打印的方法, 在基板的非像素区域形成像素分隔 墙 15。  As shown in Fig. 9, a pixel dividing wall 15 is formed in a non-pixel area of the substrate by a method of inkjet printing.
步骤 S204、 去除像素区域的氟化硅垸单分子层。  Step S204, removing the silicon fluoride germanium monolayer in the pixel region.
具体的, 至少对像素区域进行紫外光照射, 去除像素区域的氟化硅烷单 分子层, 如图 3所示。 具体的, 可以是利用掩膜板仅对像素区域进行紫外光 照射, 去除像素区域的氟化硅烷单分子层。 当然, 若紫外光照射对形成的像 素分隔墙以及基板上的其他薄膜或层结构没有其他影响, 也可以对整个基板 进行紫外光照射, 迸而去除像素区域的氟化硅烷单分子层。  Specifically, at least the pixel region is irradiated with ultraviolet light to remove the fluorinated silane monolayer of the pixel region, as shown in FIG. Specifically, the fluoropolymer monomolecular layer of the pixel region may be removed by irradiating only the pixel region with ultraviolet light using a mask. Of course, if the ultraviolet light irradiation has no other influence on the formed pixel partition wall and other film or layer structures on the substrate, the entire substrate may be irradiated with ultraviolet light to remove the fluorinated silane monolayer in the pixel region.
其中, 如图 10所示, 上述步骤 S 102或步骤 S203, 利用喷墨打印在基板 上形成包括像素分隔墙图案的像素界定层具体为:  As shown in FIG. 10, in the above step S102 or step S203, forming a pixel defining layer including a pixel dividing wall pattern on the substrate by inkjet printing is specifically:
歩骤 Si 02i、 通过喷墨打印的方法在非像素区域打印形成像素分隔墙材 料的溶液。  Step Si 02i, a method of forming a pixel dividing wall material in a non-pixel area by inkjet printing.
其中, 形成像素分隔墙材料的溶液可以为有机绝缘材料的溶液, 其可以 是有机绝缘材料溶质和有机溶剂混合形成的溶液。 其中, 所述有机绝缘材料 包括: 聚六氟丙烯、 氟化聚对二甲苯、 氟化聚硅基醚、 氟化聚酰亚胺、 氟化 聚酰胺、 聚酰亚胺、 聚硅氧垸、 聚甲基丙烯酸甲酯、 聚甲基丙烯酸丁酯、 据 甲基丙烯酸环己酯、 聚苯乙烯等。 且所述有机绝缘材料溶液的溶剂沸点在 200 C以下, 包括 200 。C, 包括: 二氯甲垸、 :三氯甲烷、 四氢呋喃、 氯苯、 甲苯、 邻二氯苯、 邻二甲苯、 正己垸、 环己垸、 苯甲醚、 全氟呋喃、 N- 二甲基甲酰胺、 N, N-二甲基乙酰胺、 二甲基亚砜等。 例如所述有机溶剂可 以是甲苯,其沸点为 1 10 C左右。这样喷墨打印在基板上的墨水溶液边缘由 于有机绝缘材料溶剂的蒸汽压较低, 挥发速率快, 致使中间部分的溶液向边 缘流动, 最终在边缘形成的薄膜的厚度高于中间部分, 即通过 "咖啡环"效 应, 使得打印的墨水溶液的上表面在中间部分向内凹陷, 进而形成如图 3所 示的像素分隔墙。  The solution forming the pixel dividing wall material may be a solution of an organic insulating material, which may be a solution formed by mixing an organic insulating material solute and an organic solvent. Wherein, the organic insulating material comprises: polyhexafluoropropylene, fluorinated parylene, fluorinated polysilyl ether, fluorinated polyimide, fluorinated polyamide, polyimide, polysiloxane, Polymethyl methacrylate, polybutyl methacrylate, cyclohexyl methacrylate, polystyrene, and the like. And the organic insulating material solution has a solvent boiling point of 200 C or less, including 200 Å. C, including: chloroform, chloroform, tetrahydrofuran, chlorobenzene, toluene, o-dichlorobenzene, o-xylene, n-hexyl, cyclohexane, anisole, perfluorofuran, N-dimethyl Formamide, N, N-dimethylacetamide, dimethyl sulfoxide, and the like. For example, the organic solvent may be toluene having a boiling point of about 10 C. In this way, the edge of the ink solution printed on the substrate is lower due to the lower vapor pressure of the solvent of the organic insulating material, and the volatilization rate is fast, so that the solution of the intermediate portion flows toward the edge, and finally the thickness of the film formed at the edge is higher than the middle portion, that is, The "coffee ring" effect causes the upper surface of the printed ink solution to be recessed inwardly at the intermediate portion, thereby forming a pixel dividing wall as shown in FIG.
步骤 S1022、 待基板上打印的溶液形成咖啡环结构之后, 对非像素区域 打印的溶液进行固化处理, 所述咖啡环结构形成所述凹陷。  Step S1022: After the solution to be printed on the substrate forms a coffee ring structure, the solution printed in the non-pixel area is cured, and the coffee ring structure forms the recess.
可选的, 基板上打印的溶液在 20- 40°C的环境中形成所述咖啡环结构。优 选地, 在室温常温条件下通过溶剂的蒸发形成所述咖啡环, 由于咖啡环是通 过蒸发溶剂形成的, 因此在较低的温度下, 溶剂蒸发慢, 形成的咖啡环越明 显, 即在像素分隔墙上表面形成的凹槽越深, 在凹槽沉积的溶液就越多。 需 要说明的是, 对喷墨打印的墨水溶液进行固化处理可以根据具体的喷墨 ίί印 的墨水溶液选择不同的方法进行固化。 本发明实施例中以啧墨打印的墨水溶 液为有机绝缘材料的溶液为例进行详细说明, 则对有机绝缘材料的溶液进行 退火, 去除有机绝缘材料中的溶剂, 固化有机绝缘材料。 需要说明的是, 对 所述溶液进行退火固化处理, 主要是改变所述材料的显微结构。 本发明实施 例中, 所述有机绝缘材料是高分子材料, 而溶剂是小分子溶剂, 两者形成溶 液通过喷墨打印的方式在基板上形成包括像素分隔墙图案的像素界定层。 本 发明实施例中对所述有机绝缘材料的溶液采用退火处理, 去除有机绝缘材料 溶液中的小分子溶剂, 在基板上形成的包括像素分隔墙图案的像素界定层为 高分子的有机绝缘材料。 Alternatively, the solution printed on the substrate forms the coffee ring structure in an environment of 20-40 °C. Excellent Optionally, the coffee ring is formed by evaporation of a solvent at room temperature under normal temperature. Since the coffee ring is formed by evaporating the solvent, at a lower temperature, the evaporation of the solvent is slow, and the formed coffee ring is more pronounced, that is, in the pixel. The deeper the groove formed by the partition wall surface, the more solution is deposited in the groove. It should be noted that the curing process of the inkjet printing ink solution can be cured according to a specific inkjet printing ink solution selection method. In the embodiment of the present invention, the ink solution printed by the ink is taken as an example of the organic insulating material, and the solution of the organic insulating material is annealed to remove the solvent in the organic insulating material to cure the organic insulating material. It should be noted that the annealing and solidification treatment of the solution mainly changes the microstructure of the material. In the embodiment of the present invention, the organic insulating material is a polymer material, and the solvent is a small molecule solvent, and the two forming solutions form a pixel defining layer including a pixel dividing wall pattern on the substrate by inkjet printing. In the embodiment of the present invention, the solution of the organic insulating material is annealed to remove the small molecule solvent in the organic insulating material solution, and the pixel defining layer formed on the substrate including the pixel dividing wall pattern is a polymer organic insulating material.
以上所述, 仅为本发明的具体实施方式, 但本发明的保护范围并不局限 于此, 任何熟悉本技术领域的技术人员在本发明揭露的技术范围内, 可轻易 想到的变化或替换, 都应涵盖在本发明的保护范围之内。 因此, 本发明的保 护范围应以所述权利要求的保护范围为准。  The above is only the specific embodiment of the present invention, but the scope of the present invention is not limited thereto, and any change or replacement that can be easily conceived by those skilled in the art within the technical scope of the present invention is All should be covered by the scope of the present invention. Accordingly, the scope of the invention should be determined by the scope of the appended claims.

Claims

1、一种像素界定层,其特征在于,所述像素界定层包括像素分隔墙图案, 且像素分隔墙的上表面具有凹陷。 1. A pixel defining layer, characterized in that the pixel defining layer includes a pixel dividing wall pattern, and the upper surface of the pixel dividing wall has a depression.
2、 根据权利要求 1所述的像素界定层, 其特征在于, 所述凹陷的深度占 所述像素分隔墙高度的 20%至 40%。 2. The pixel defining layer according to claim 1, wherein the depth of the depression accounts for 20% to 40% of the height of the pixel dividing wall.
3、 一种像素界定层的制作方法, 其特征在于, 包括: 3. A method for making a pixel definition layer, which is characterized by including:
对基板进行图案化表面处理; Patterned surface treatment of substrates;
在所述基板上形成像素界定层, 所述像素界定层包括像素分隔墙图案, 且所述像素分隔墙的上表面具有凹陷。 A pixel defining layer is formed on the substrate, the pixel defining layer includes a pixel dividing wall pattern, and the upper surface of the pixel dividing wall has a recess.
4、 根据权利要求 3所述的制作方法, 其特征在于, 4. The production method according to claim 3, characterized in that,
对包括像素区域与非像素区域的基板进行图案化表面处理使所述像素区 域的表面能与所述非像素区域的表面能不同; Performing a patterned surface treatment on a substrate including a pixel area and a non-pixel area so that the surface energy of the pixel area is different from the surface energy of the non-pixel area;
在所述非像素区域形成所述像素分隔墙图案。 The pixel partition wall pattern is formed in the non-pixel area.
5、 根据权利要求 3或 4所述的制作方法, 其特征在于, 在所述基板上形 成像素界定层是通过喷墨打印形成的。 5. The manufacturing method according to claim 3 or 4, wherein the pixel defining layer is formed on the substrate by inkjet printing.
6、 根据权利要求 5所述的制作方法, 其特征在于, 形成所述像素界定层 的溶液中溶剂的沸点在 200 °C以下。 6. The manufacturing method according to claim 5, wherein the boiling point of the solvent in the solution forming the pixel defining layer is below 200°C.
7、 根据权利要求 5所述的制作方法, 其特征在于, 所述喷墨打印的溶液 的溶剂为二氯甲垸、 三氯甲烷、 四氢呋喃、 氯苯、 甲苯、 邻二氯苯、 邻二甲 苯、 正己垸、 环己烷、 苯甲醚、 全氟呋喃、 N ' N-二甲基甲酰胺、 N, N-二甲 基乙酰胺或二甲基亚砜。 7. The production method according to claim 5, wherein the solvent of the inkjet printing solution is dichloromethane, chloroform, tetrahydrofuran, chlorobenzene, toluene, o-dichlorobenzene, o-xylene , n-hexane, cyclohexane, anisole, perfluorofuran, N'N-dimethylformamide, N, N-dimethylacetamide or dimethyl sulfoxide.
8、 根据权利要求 5所述的制作方法, 其特征在于, 液滴在所述像素区域 的接触角和在所述非像素区域的接触角相差大于 30° 。 8. The production method according to claim 5, wherein the difference between the contact angle of the droplet in the pixel area and the contact angle in the non-pixel area is greater than 30°.
9、 根据权利要求 4所述的制作方法, 其特征在于, 所述对包括像素区域 与非像素区域的基板进行图案化表面处理使得基板上所述像素区域的表面能 与所述非像素区域的表面能大小不同具体为: 9. The manufacturing method according to claim 4, wherein the patterned surface treatment is performed on the substrate including the pixel area and the non-pixel area so that the surface energy of the pixel area on the substrate is consistent with that of the non-pixel area. The different sizes of surface energy are specifically:
对所述基板进行自组装单分子层表面处理, 在所述像素区域形成单分子 层。 The substrate is subjected to a self-assembled monolayer surface treatment to form a monolayer in the pixel area.
10、 根据权利要求 9所述的制作方法, 其特征在于, 对所述基板进行自 组装单分子层表面处理, 在所述像素区域形成单分子层具体为: 10. The manufacturing method according to claim 9, characterized in that, the substrate is subjected to a self-assembled monolayer surface treatment, and the formation of a monolayer in the pixel area is specifically:
对所述基板迸行自组装单分子层表面处理, 在所述基板表面形成单分子 层; Performing self-assembled monolayer surface treatment on the substrate to form a monolayer on the surface of the substrate;
去除所述非像素区域的单分子层。 Remove the monolayer of the non-pixel area.
11、 根据权利要求!0所述的制作方法, 其特征在于, 对所述基板迸行自 组装单分子层表面处理, 在所述像素区域形成单分子层具体为: 在惰性气体 的环境中, 利用氟化硅垸对所述基板进行处理, 在所述基板表面形成氟化硅 垸的单分子层; 11. According to the rights requirements! The manufacturing method described in 0 is characterized in that: performing a self-assembled monolayer surface treatment on the substrate, and forming a monolayer in the pixel area specifically includes: using silicon fluoride in an inert gas environment. The substrate is processed to form a monomolecular layer of silicon fluoride on the surface of the substrate;
利用掩膜板对所述基板上的所述非像素区域进行紫外光照射去除所述非 像素区域的氟化硅垸单分子层。 A mask is used to irradiate the non-pixel area on the substrate with ultraviolet light to remove the silicon fluoride monolayer in the non-pixel area.
12、 根据权利要求 10或 11所述的制作方法, 其特征在于, 在所述非像 素区域形成所述像素分隔墙之后, 还包括: 12. The production method according to claim 10 or 11, characterized in that, after forming the pixel separation wall in the non-pixel area, it further includes:
去除所述像素区域的单分子层。 Remove the monolayer of the pixel area.
13、 根据权利要求 12所述的制作方法, 其特征在于, 在惰性气体的环境 中, 利 ^氟化硅垸对所述基板进行处理, 在所述基板表面形成氟化硅烷的单 分子层; 利用掩膜板对所述基板上的所述非像素区域进行紫外光照射, 去除 所述非像素区域的氟化硅垸单分子层, 再在所述基板的所述非像素区域形成 所述像素分隔墙之后, 还包括: 13. The manufacturing method according to claim 12, characterized in that, in an inert gas environment, the substrate is treated with fluorinated silane to form a monomolecular layer of fluorinated silane on the surface of the substrate; Use a mask to irradiate the non-pixel area on the substrate with ultraviolet light to remove the silicon fluoride monolayer in the non-pixel area, and then form the pixel in the non-pixel area of the substrate Behind the dividing wall, also includes:
去除所述像素区域的氟化硅烷。 Fluorinated silane is removed from the pixel area.
14、 根据权利要求 13所述的制作方法, 其特征在于, 去除所述像素区域 的氟化硅烷具体为: 14. The manufacturing method according to claim 13, wherein the removal of fluorinated silane in the pixel area is specifically:
至少对所述像素区域进行紫外光照射。 At least the pixel area is irradiated with ultraviolet light.
15、 根据权利要求 5所述的制作方法, 其特征在于, 利 ^喷墨打印在所 述基板上形成所述像素界定层具体为: 15. The manufacturing method according to claim 5, wherein the pixel defining layer is formed on the substrate by inkjet printing as follows:
通过喷墨打印的方法在所述非像素区域打印形成所述像素分隔墙材料的 溶液; Print the solution forming the pixel dividing wall material in the non-pixel area by inkjet printing;
待所述基板上打印的溶液形成咖啡环结构之后, 对所述非像素区域打印 的溶液进行固化处理, 所述咖啡环结构形成为所述凹陷。 After the solution printed on the substrate forms a coffee ring structure, the solution printed on the non-pixel area is cured, and the coffee ring structure is formed into the depression.
16、 根据权利要求 15所述的制作方法, 其特征在于, 所述基板上打印的 溶液在 20- 40Ό的环境中形成所述咖啡环结构。 16. The production method according to claim 15, wherein the solution printed on the substrate forms the coffee ring structure in an environment of 20-40°C.
17、 一种显示基板, 其特征在于, 所述显示基板包括权利要求 1或 2所 述的像素界定层。 17. A display substrate, characterized in that the display substrate includes the pixel defining layer according to claim 1 or 2.
18、 一种显示装置, 其特征在于, 所述显示装置包括权利要求 17所述的 显示基板。 18. A display device, characterized in that the display device includes the display substrate according to claim 17.
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