WO2014117254A1 - Cleaning apparatus, radiation source module and fluid treatment system - Google Patents

Cleaning apparatus, radiation source module and fluid treatment system Download PDF

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Publication number
WO2014117254A1
WO2014117254A1 PCT/CA2014/000063 CA2014000063W WO2014117254A1 WO 2014117254 A1 WO2014117254 A1 WO 2014117254A1 CA 2014000063 W CA2014000063 W CA 2014000063W WO 2014117254 A1 WO2014117254 A1 WO 2014117254A1
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WO
WIPO (PCT)
Prior art keywords
cleaning apparatus
radiation source
fluid
apparatus defined
jet
Prior art date
Application number
PCT/CA2014/000063
Other languages
French (fr)
Inventor
George Traubenberg
Original Assignee
Trojan Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Trojan Technologies filed Critical Trojan Technologies
Publication of WO2014117254A1 publication Critical patent/WO2014117254A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122Incoherent waves
    • B01J19/123Ultraviolet light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • B08B3/024Cleaning by means of spray elements moving over the surface to be cleaned
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/30Treatment of water, waste water, or sewage by irradiation
    • C02F1/32Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325Irradiation devices or lamp constructions
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/32Details relating to UV-irradiation devices
    • C02F2201/322Lamp arrangement
    • C02F2201/3225Lamps immersed in an open channel, containing the liquid to be treated
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00Apparatus for treatment of water, waste water or sewage
    • C02F2201/32Details relating to UV-irradiation devices
    • C02F2201/324Lamp cleaning installations, e.g. brushes

Definitions

  • the present invention relates to a fluid treatment system. In another of its aspects, the present invention relates to a cleaning apparatus. In yet another of its aspects, the present invention relates to a radiation source module containing the cleaning apparatus. In another of its aspects, the present invention relates to a method of removing fouling materials from an exterior surface of a radiation source assembly. Other aspects of the invention will become apparent to those of skill in the art upon reviewing the present specification.
  • Fluid treatment systems are known generally in the art.
  • Such systems include an array of UV lamp frames which include several UV lamps each of which are mounted within sleeves which extend between and are supported by a pair of legs which are attached to a cross-piece.
  • the so-supported sleeves (containing the UV lamps) are immersed into a fluid to be treated which is then irradiated as required.
  • the amount of radiation to which the fluid is exposed is determined by the proximity of the fluid to the lamps, the output wattage of the lamps and the fluid's flow rate past the lamps.
  • one or more UV sensors may be employed to monitor the UV output of the lamps and the fluid level is typically controlled, to some extent, downstream of the treatment device by means of level gates or the like.
  • the sleeves surrounding the UV lamps periodically become fouled with foreign materials, inhibiting their ability to transmit UV radiation to the fluid.
  • the occurrence of such fouling may be determined from historical operating data or by measurements from the UV sensors. Once fouling has reached a certain point, the sleeves must be cleaned to remove the fouling materials and optimize system performance.
  • UV lamp modules are employed in an open, channel system (e.g., such as the one described and illustrated in Maarschalkerweerd #1 Patents), one or more of the modules may be removed while the system continues to operate, and the removed frames may be immersed in a bath of suitable cleaning solution (e.g., a mild acid) which may be air-agitated to remove fouling materials.
  • suitable cleaning solution e.g., a mild acid
  • the cleaning system comprises a cleaning carriage engaging a portion of the exterior of a radiation source assembly including a radiation source (e.g., a UV lamp).
  • the cleaning carriage is movable between: (i) a retracted position wherein a first portion of radiation source assembly is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the first portion of the radiation source assembly is completely or partially covered by the cleaning carriage.
  • the cleaning carriage includes a chamber in contact with the first portion of the radiation source assembly. The chamber is supplied with a cleaning solution suitable for removing undesired materials from the first portion of the radiation source assembly.
  • the radiation source is disposed in the fluid to be treated in a manner such that the longitudinal axis of the radiation source is in a transverse (e.g., orthogonal vertical orientation of the radiation sources) relationship with respect to the direction of fluid flow past the radiation source. See, for example, any one of:
  • fouling material often takes the form of elongate debris (e.g., hair, condoms, string, algae and other string-like material) which catches on the exterior surface of the radiation sources and remains there. Failure to adequately remove such fouling material leads to a number of problems, including one or more of the following:
  • the above mentioned fluid treatment systems do not teach a cleaning system capable of adequately and reliably removing such fouling material (e.g., elongate debris as discussed above) from the exterior surface of the radiation sources and/or other submerged surfaces in the fluid treatment system during operation of the system (i.e., without the need to cease operation of the system to remove the fouling material).
  • fouling material e.g., elongate debris as discussed above
  • the present invention provides a cleaning apparatus for removing debris from an elongate surface in a fluid treatment system, the cleaning apparatus comprising at least one jet element configured to generate a differential fluid current in a plane that is non-normal to a longitudinal axis of the elongate surface to cause the debris to be removed from the elongate surface.
  • the invention also relates to a radiation source module and to a fluid treatment system incorporating this cleaning apparatus.
  • the present invention relates to a method for removing elongate debris from an exterior surface of at least one radiation source assembly in a fluid treatment system as defined in the immediately preceding paragraph comprising the steps of:
  • the present invention relates to a method for removing elongate debris from a surface in a fluid treatment system comprising the steps of:
  • Steps (i) and (ii) are conducted concurrently. In a second embodiment Steps (i) and (ii) are conducted sequentially.
  • present inventors have discovered a novel cleaning apparatus for use in a fluid treatment system for removing elongate debris from a surface of the fluid treatment system.
  • the "surface of the fluid treatment system” may be any surface on or near which elongate debris is likely to reside.
  • the "surface” may be comprised in portion of the fluid treatment system such as a sensor, a support element, a drive element, a radiation source assembly and the like.
  • present cleaning apparatus comprises one or more annular wiping elements making it particularly suitable for use with cylindrical (e.g., rounded) elements and the like.
  • the preferred embodiment of the cleaning apparatus further comprises of motive element configured to cause relative movement between elongate debris and contact with the elongate surface and the at least one jet element of the cleaning apparatus, the motive element being movable between the retracted position and an extended position.
  • the motive element is coupled to a wiping element and the fluid jet element of the cleaning apparatus is relatively fixed.
  • the present cleaning apparatus is particularly advantageous for removing elongate debris from one or more radiation source assemblies disposed in the fluid treatment system.
  • the preferred approach utilized in the present cleaning apparatus is to include the motive element which is moved along the exterior of the radiation source assembly. At least one jet element of the cleaning apparatus is disposed near the distal portion of the radiation source assemblies.
  • the motive element As the motive element is moved from the first (retracted) position to a second (extended) position, it will tend to push the elongate debris toward a distal portion of the radiation source assembly. This action causes the elongate debris to be moved into the differential fluid current generated by the cleaning apparatus. When this happens, the differential fluid current will act to cause the elongate debris to separate or float the elongate debris away from the radiation source assembly. When this happens, the flow of fluid through the fluid treatment system will naturally carry the separated or floating elongate debris away from the radiation source assembly and downstream there from.
  • the present cleaning apparatus allows for removing problematic debris such as elongate debris during regular operation of the fluid treatment system and without the need to shut down the system for servicing to remove the elongate debris.
  • the present cleaning apparatus may or may not be incorporated in a radiation source module that contains one or more radiation source assemblies. In other words, it is possible to directly implement the present cleaning apparatus in a fluid treatment system.
  • the present cleaning apparatus is particularly well suited for implementation in a fluid treatment system wherein the radiation source assemblies are disposed transverse (e.g., vertical or angle with a distal portion of the radiation source assemblies projection above the flow of fluid) to the direction of fluid flow through the fluid treatment system.
  • Figure 1 illustrates a perspective view, in partial cross-section, of a first preferred embodiment of the present radiation source module
  • Figure 2 illustrates a top view, in partial cross- section, of the radiation source module illustrated in Figure 1 ;
  • Figure 3 is a sectional view along line III-III in Figure 2;
  • Figures 4-5 illustrate a perspective view, in partial cross-section, of a second preferred embodiment of the present radiation source module
  • Figure 6 illustrates a perspective view, in partial cross-section, of a third preferred embodiment of the present radiation source module
  • Figures 7-14 illustrate, in a sequential manner, a perspective view of actuation of a portion of the cleaning apparatus illustrated in the radiation source module illustrated in Figure 6;
  • Figures 15-16 illustrates a perspective view, in partial cross-section, of a fourth preferred embodiment of the present radiation source module
  • Figure 17 illustrates a bottom view of the radiation source module illustrated in Figures
  • Figure 18 illustrates a perspective view, in partial cross-section, of a fifth preferred embodiment of the present radiation source module
  • Figure 19 illustrates a perspective view, in partial cross-section, of a sixth preferred embodiment of the present radiation source module
  • Figure 20 illustrates an enlarged perspective view, in partial cross-section, of the radiation source module illustrated in Figures 15-17 having debris accumulated thereon;
  • Figures 21 and 22 illustrate, in a sequential manner, removable of the debris in the radiation source module illustrated in Figure 20;
  • Figures 23-27 illustrate various views of the use of jet element in the present cleaning apparatus to remove debris from a radiation source assembly.
  • the present invention relates to a cleaning apparatus for removing debris from an elongate surface in a fluid treatment system, the cleaning apparatus comprising at least one jet element configured to generate a differential fluid current in a plane that is non- normal to a longitudinal axis of the elongate surface to cause the debris to be removed from the elongate surface.
  • Preferred embodiments of the cleaning apparatus may include any one or a combination of any two or more of any of the following features:
  • At least one jet element is disposed adjacent to the elongate surface
  • the at least one jet element is disposed upstream with respect to the elongate surface
  • the at least one jet element is disposed downstream with respect to the elongate surface
  • the at least one jet element is configured to generate a differential fluid current comprising fluid being treated by the fluid treatment system
  • the at least one jet element is configured to generate a differentia] fluid current comprising only fluid being treated by the fluid treatment system; the at least one jet element is configured to generate a pressurized differential fluid current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a pressurized differential liquid current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a pressurized differential water current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a pressurized differential gaseous current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a pressurized differential air current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a substantially fan-shaped press
  • the wiping element comprises a seal for sealing engagement with the portion of the surface, the seal for removing at least a portion of undesired materials from the surface when the wiping element is moved from the first position to the second position;
  • the wiping element comprises a chamber for surrounding a portion of the surface
  • the wiping element further comprises an inlet for introduction of a cleaning solution to the chamber
  • the wiping element is configured for contact with at least a portion of an exterior an elongate substantially cylindrical element
  • the wiping element is configured for contact with at least a portion of an exterior an elongate element having a rounded surface
  • the wiping element is configured for contact with at least a portion of an exterior of the motive element
  • the wiping element is configured for contact with at least a portion of an exterior of a radiation source assembly disposed in the fluid treatment system.
  • the cleaning apparatus may be incorporated in a radiation source module that comprises a frame having a first support member and at least one radiation source assembly extending from the first support member, the at least one radiation source assembly comprising a radiation source; and may include any one, or a combination of any two or more, of the following features:
  • the radiation source module further comprises means to position the radiation source module in the fluid treatment system; the at least one radiation source assembly is in sealing engagement with the first support member; the first support member is coupled to a proximal portion of the at least one radiation source assembly; the frame further comprises a second support member opposed to and laterally spaced from the first support member, at least a portion of the at least one radiation source assembly disposed between each of the first support member and the second support member; the second support member is coupled to a distal portion of the at least one radiation source assembly; the second support member comprises a recessed portion configured to receive the distal portion of the at least one radiation source assembly; the at least one jet element is disposed on the second support member; the at least one jet element is disposed on a fluid contacting surface of the second support member; the at least one jet element is disposed in the recessed portion of the second support member; one or jet elements are disposed on a fluid contacting surface of the second support member and one or more jet elements are disposed in the recessed portion of the second support member; the radiation
  • the radiation source module further comprises a pump element to feed pressurized liquid to the at least one jet element of the cleaning apparatus;
  • the radiation source module further comprises a pump element to feed pressurized water to the at least one jet element of the cleaning apparatus;
  • the radiation source module further comprises a pump element to feed pressurized water being treated by the fluid treatment system to the at least one jet element of the cleaning apparatus;
  • the frame further comprises a third support member interconnecting the first support member and the second support member;
  • the frame further comprises a power supply for controlling the radiation source
  • the radiation source assembly comprises a protective sleeve surrounding the radiation source
  • the protective sleeve comprises a quartz sleeve
  • the protective sleeve has an open end in sealed engagement with an opening in the first support member and a closed end supported by the second support member;
  • the radiation source module may be incorporated in a fluid treatment system that may include any one or a combination of any two or more of any of the following features: • the fluid treatment zone is comprised in an open channel for receiving the flow of fluid;
  • the fluid treatment zone is comprised in a closed channel for receiving the flow of fluid
  • the at least one radiation source assembly is elongate and has a longitudinal axis disposed at an angle with respect to the direction of fluid flow through the fluid treatment zone;
  • the at least one radiation source assembly is elongate and has a longitudinal axis disposed substantially parallel to the direction of fluid flow through the fluid treatment zone;
  • the at least one radiation source assembly is elongate and has a longitudinal axis disposed orthogonal to the direction of fluid flow through the fluid treatment zone;
  • the at least one radiation source assembly is elongate and is disposed substantially vertically in the fluid treatment zone.
  • Radiation source module 100 comprises a pair of supports 102 which are configured to enable radiation source module 100 to be rotatably removable in an open channel containing a flow of fluid such as any in of the fluid treatment systems described above.
  • Radiation source module 100 comprises a pair of support legs 105,1 10 which interconnect a header 112 and a footer 1 14. As will be apparent to those of ordinary skill in the art, a pair of support legs opposite to support legs 105,1 10 are not shown for clarity.
  • baffle plates 117,119 span the width of radiation source module 100 and radiation source module 110 is intended, in a preferred embodiment, to span the width of an open channel (not shown for clarity) in which radiation source module 100 is disposed.
  • the use and function of baffle plates 117,119 is described in more detail in, for example, International Publication No. WO 2008/019490 [Traubenberg et al.].
  • header 112 and footer 114 Disposed between header 112 and footer 114 are a series of radiation source assemblies 120.
  • the distal portions of radiation source assemblies 120 are disposed in a series of apertures.
  • the proximal portions of radiation source assemblies 120 are connected to and supported by header 112. Additional details on the construction and components in module header 120 may be found in co-pending United States provisional patent application International Publication No. WO 2010/1 15276 [Traubenberg et al.].
  • Each radiation source assembly 120 may comprise a radiation source (not shown for clarity) disposed in a radiation transparent protective sleeve.
  • the radiation source is an ultraviolet (UV) radiation source.
  • a cleaning apparatus 125 comprises a series of wiping elements 130 engaged to the exterior of each radiation source assembly 120 - preferably each wiping element 130 also functions as a cleaning element.
  • Cleaning apparatus 125 is connected to a drive element (not shown for clarity) which is configured to move cleaning apparatus 125 from a first, retracted position (sometimes referred to as the "parked position") near header 1 12 to a second, extended position (sometimes referred to as the "in use position” or “use position”) near footer 114. While the precise nature of a drive element is not particularly restricted, it is preferred that the drive element is of the type illustrated in United States patent 6,342,188 [Pearcey et al.], the type illustrated in International Publication No.
  • Fluid jet elements are configured to emit a jet of fluid that acts as a differential fluid current in a planed that is non- normal to a longitudinal axis of radiation source assembly 120 as will be described in more detail below with reference to Figures 2 and 3.
  • fluid jet elements 135 are oriented at an angle B with respect to arrow A which represents the direction of fluid flow through the fluid treatment system.
  • this angle is up to about 90°, more preferably in the range of from about 30° to about 60°, most preferably about 45°.
  • jet elements 135 it is possible to orient jet elements 135 such that they generate a differential fluid current that is parallel to the direction of fluid flow represented by arrow A. In either case, it is highly preferred that the differential fluid current produced by fluid jet elements is contained in a plane that is adjacent or in tangential contact with radiation source assemblies 120.
  • each jet element 135 generates a substantially fan-shaped fluid current.
  • the sweep of the fan-shape is at an angle C.
  • angle C is in the range from about 30° to about 90°, more preferably from about 45° to about 60°, most preferably about 50°.
  • cleaning apparatus 125 has been modified to include a debris shield element 127.
  • cleaning apparatus 125 having debris shield element 127 is in a retracted position such that it is parked between baffle plates 1 17,119.
  • the primary reason the debris is "stapled" to radiation source assembly 120 is because bulk fluid velocity acts on the debris in the form of surface drag - i.e., the water pulls on the debris.
  • the drag coefficient of the debris combined with the fluid velocity over compensates for the pressure of the water holding the debris against radiation source assembly 120.
  • debris shield element 127 is configured so as to shield debris downstream there from. This creates an effect of reducing fluid velocity (and/or fluid pressure) downstream of debris shield element 127 thereby reducing the above-described effect of the drag on the debris.
  • the shield tends to protect fluid jet element 135 by reducing opposed fluid current.
  • debris shield element 127a is movable from a first position above cleaning apparatus 125 to a second position below cleaning apparatus 125. This movement is achieved via a pair of arms 128,129 which are configured to pivot as shown in Figure 6.
  • cleaning apparatus 125 comprises a latch 140 which is connected to a pair of springs 142,144. As shown, a portion of latch 140 passes through an aperture in debris shield element 127a.
  • Latch 140 further comprises an end portion 146. As further shown, a dog element 148 is disposed on the upper surface of footer 1 14.
  • end portion 146 of latch 140 contacts dog element 148 - see Figure 8.
  • end portion 146 of latch 140 moves down the face of dog element 148 with the result that latch element 140 is biased away from debris shield element 127a allowing debris shield element 127a to pivot downward to contact footer 114 - see Figure 9.
  • jet elements 135 generate a differential fluid current (discussed below) to remove debris 10 from radiation source assemblies 120.
  • FIGs 16-17 illustrate a modified radiation source assembly 100a.
  • radiation source assembly 100 There are two modifications made to radiation source assembly 100 illustrated with reference to Figures 1-14.
  • the recess portions in footer 1 14 have been modified to include supplementary fluid jet elements 135a to remove any debris that may accumulate in those recessed portions.
  • the modified radiation source module 100b is shown in Figure 18.
  • the modification is to omit debris shield element 127 and 127a referred to above.
  • baffle plates 150 have been disposed on footer 114 to create a similar effect as debris shield element 127 and 127a described above when debris is being removed from radiation source assemblies 120a.
  • module lOOd includes a cleaning element 210 which cleans a perforated feed inlet 215 which draws fluid being treated into submersible pump 200.
  • scraper element 210 wipes the perforated fluid inlet 215 of submersible pump 200 thereby mitigating or obviating blockage fluid input to submersible pump 200.
  • Figures 20-22 illustrate removable of debris 10a that is accumulated in recesses in footer 1 14 that support radiation source assemblies 120a.
  • Figure 20 illustrates accumulation of debris 10a.
  • Figure 21 illustrates actuation of fluid jet elements 135a to float debris 10a above footer 114.
  • Figure 22 illustrates actuation of fluid jet elements 135 to create a differential fluid current that floats or pushes debris 10a away from radiation source assemblies 120a once debris shield element 127 is moved away from footer 114, the flow of fluid passing past radiation source assemblies 120a carries debris 10a away from radiation source assemblies 120a.
  • the cleaning apparatus of the present invention comprises fluid jet element that generates a differential fluid curr3nt in a plane that is in a non-normal relationship with respect to a longitudinal axis of an elongate surface containing elongate debris.
  • the elongate surface is at least the exterior surface of a radiation source assembly.
  • differential fluid current is intended to mean a fluid current that is created differentially with respect to flow of fluid through the fluid treatment system. By this, it is meant that the fluid current is generated in a direction that is other than the direction of fluid flow through the fluid treatment system.
  • the fluid current can be in a plane that is parallel to but directed upstream with respect to the direction of fluid flow through the fluid treatment system or the plane may be angled with respect to the direction of fluid flow through the fluid treatment system. The point is, a fluid current should not be directed in a manner coterminous with the direction of fluid flow through the fluid treatment system. In this manner, the fluid current is "differential" with respect to the direction of fluid flow through the fluid treatment system.
  • Figure 23 illustrates elongate debris 10 which has been "trapped” or “caught” on a radiation source assembly 120. In a sense, elongate debris 10 has been "stapled” onto radiation source assembly 120 by the fluid flowing in the direction of arrow A.
  • a differential fluid current is generated from fluid jet element 135 - see Figure 24.
  • the differential fluid current is in a plane containing four vectors. That plane is angled with respect to the direction of fluid flow as shown by arrow A.
  • the effect of the differential fluid current shown in Figure 24 is to lift or separate debris 10 with respect to radiation source assembly 120. This creates downstream movement of one portion of debris 10 which, coupled with the force of fluid flow past radiation source assembly 120 facilitates removal of debris 10.
  • FIG. 25-27 A similar effect is shown in Figures 25-27.
  • a pair of jet elements 135 are used on opposite sides of radiation source assembly 120.
  • Each fluid jet element 135 creates a differential fluid current in a plane that contact radiation source assembly 120 in a tangential manner on either side thereof.
  • the creation of these differential fluid currents on either side of radiation source assembly 120 serves to lift and/or carry debris 10 away from radiation source 120 in a manner that one end of debris 10 moves downstream relative to the other end of debris 10 and, coupled with the force of fluid flow past radiation source assembly 120, debris 10 is removed from radiation source assembly 120 and is carried away from radiation source assembly 120 in a downstream direction - see Figure 27.
  • the differential fluid current is generated in a manner which contacts adjacent to or tangentially with respect to the elongate surface (e.g., the radiation source assembly) containing the elongate debris.

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  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

There is described a cleaning apparatus for a surface (e.g., a radiation source assembly) in a fluid treatment system. A preferred embodiment of the cleaning apparatus comprises: at least one jet element configured to generate a differential fluid current in a plane that is non-normal to a longitudinal axis of the elongate surface to cause the debris to be removed from the elongate surface. This preferred embodiment of the present cleaning apparatus is particularly advantageous for removing elongate debris from one or more radiation source assemblies disposed in the fluid treatment system. It is preferred to include in the cleaning apparatus a wiping element that is translated between a first position and a second position. As the wiping element is moved from the first position to the second position, it will tend to push the elongate debris toward a distal portion of the radiation source assembly and into the path of the differential fluid current generated by the cleaning apparatus. The differential fluid current will tend to cause the elongate debris to be lifted and/or carried away from the radiation source assembly such that the flow of fluid will carry the elongate debris past the radiation source assembly.

Description

CLEANING APPARATUS. RADIATION SOURCE MODULE AND
FLUID TREATMENT SYSTEM
CROSS-REFERENCE TO RELATED APPLICATION
[0001] The present application claims the benefit under 35 U.S.C. §119(e) of provisional patent application S.N. 61/849,847, filed February 4, 2013, the contents of which are hereby incorporated by reference.
BACKGROUND OF THE INVENTION FIELD OF THE INVENTION
[0002] In one of its aspects, the present invention relates to a fluid treatment system. In another of its aspects, the present invention relates to a cleaning apparatus. In yet another of its aspects, the present invention relates to a radiation source module containing the cleaning apparatus. In another of its aspects, the present invention relates to a method of removing fouling materials from an exterior surface of a radiation source assembly. Other aspects of the invention will become apparent to those of skill in the art upon reviewing the present specification.
DESCRIPTION OF THE PRIOR ART
[0003] Fluid treatment systems are known generally in the art.
[0004] For example, United States patents 4,482,809, 4,872,980 and 5,006,244 [all in the name of Maarschalkerweerd and hereinafter referred to as the Maarschalkerweerd #1 Patents] all describe gravity fed fluid treatment systems which employ ultraviolet (UV) radiation.
[0005] Such systems include an array of UV lamp frames which include several UV lamps each of which are mounted within sleeves which extend between and are supported by a pair of legs which are attached to a cross-piece. The so-supported sleeves (containing the UV lamps) are immersed into a fluid to be treated which is then irradiated as required. The amount of radiation to which the fluid is exposed is determined by the proximity of the fluid to the lamps, the output wattage of the lamps and the fluid's flow rate past the lamps. Typically, one or more UV sensors may be employed to monitor the UV output of the lamps and the fluid level is typically controlled, to some extent, downstream of the treatment device by means of level gates or the like.
[0006] Depending on the quality of the fluid which is being treated, the sleeves surrounding the UV lamps periodically become fouled with foreign materials, inhibiting their ability to transmit UV radiation to the fluid. For a given installation, the occurrence of such fouling may be determined from historical operating data or by measurements from the UV sensors. Once fouling has reached a certain point, the sleeves must be cleaned to remove the fouling materials and optimize system performance.
[0007] If the UV lamp modules are employed in an open, channel system (e.g., such as the one described and illustrated in Maarschalkerweerd #1 Patents), one or more of the modules may be removed while the system continues to operate, and the removed frames may be immersed in a bath of suitable cleaning solution (e.g., a mild acid) which may be air-agitated to remove fouling materials. This practice was regarded by many in the field as inefficient, labourious and inconvenient.
[0008] In many cases, once installed, one of the largest maintenance costs associated with prior art fluid treatment systems is often the cost of cleaning the sleeves about the radiation sources.
[0009] United States patents 5,418,370, 5,539,210 and RE36,896 [all in the name of Maarschalkerweerd and hereinafter referred to as the Maarschalkerweerd #2 Patents] all describe an improved cleaning system, particularly advantageous for use in gravity fed fluid treatment systems which employ UV radiation. Generally, the cleaning system comprises a cleaning carriage engaging a portion of the exterior of a radiation source assembly including a radiation source (e.g., a UV lamp). The cleaning carriage is movable between: (i) a retracted position wherein a first portion of radiation source assembly is exposed to a flow of fluid to be treated, and (ii) an extended position wherein the first portion of the radiation source assembly is completely or partially covered by the cleaning carriage. The cleaning carriage includes a chamber in contact with the first portion of the radiation source assembly. The chamber is supplied with a cleaning solution suitable for removing undesired materials from the first portion of the radiation source assembly.
[0010] The cleaning system described in the Maarschalkerweerd #2 Patents represented a significant advance in the art, especially when implemented in the radiation source module and fluid treatment system illustrated in these patents.
[0011] In recent years, there has been interest in the so-called "transverse-to-flow" fluid treatment systems. In these systems, the radiation source is disposed in the fluid to be treated in a manner such that the longitudinal axis of the radiation source is in a transverse (e.g., orthogonal vertical orientation of the radiation sources) relationship with respect to the direction of fluid flow past the radiation source. See, for example, any one of:
International Publication Number WO 2004/000735 [Traubenberg et al.];
International Publication Number WO 2008/055344 [Ma et al.];
International Publication Number WO 2008/019490 [Traubenberg et al.];
United States patent 7,408,174 [From et al.]; and
United States provisional patent application S.N. 61/193,686 [Penhale et al.], filed December 16, 2008.
[0012] When these fluid treatment systems have been implemented there is a problem of buildup of fouling materials on the exterior surface of the radiation sources. This is particularly a problem in the treatment of municipal waste water where such fouling materials have not been removed upstream of the UV disinfection system. The fouling material often takes the form of elongate debris (e.g., hair, condoms, string, algae and other string-like material) which catches on the exterior surface of the radiation sources and remains there. Failure to adequately remove such fouling material leads to a number of problems, including one or more of the following:
• reduced radiation dose delivered to the flow of fluid; • promotion of build-up of more fouling material;
• increased hydraulic head loss of the flow fluid passes through the fluid treatment zone;
• increased pressure/stress on a radiation source assembly; and
• potential damage to equipment.
To the knowledge of the present inventors, the above mentioned fluid treatment systems do not teach a cleaning system capable of adequately and reliably removing such fouling material (e.g., elongate debris as discussed above) from the exterior surface of the radiation sources and/or other submerged surfaces in the fluid treatment system during operation of the system (i.e., without the need to cease operation of the system to remove the fouling material).
[0013] Accordingly, it would be desirable to have a fluid treatment system capable of removing such fouling material during operation of the system.
SUMMARY OF THE INVENTION
[0014] It is an object of the present invention to obviate or mitigate at least one of the above- mentioned disadvantages of the prior art.
[0015] It is another object of the present invention to provide a novel cleaning apparatus.
[0016] It is another object of the present invention to provide a novel radiation source module for use in a fluid treatment system.
[0017] It is another object of the present invention to provide a novel fluid treatment system.
[0018] Accordingly, in one of its aspects, the present invention provides a cleaning apparatus for removing debris from an elongate surface in a fluid treatment system, the cleaning apparatus comprising at least one jet element configured to generate a differential fluid current in a plane that is non-normal to a longitudinal axis of the elongate surface to cause the debris to be removed from the elongate surface. [0019] The invention also relates to a radiation source module and to a fluid treatment system incorporating this cleaning apparatus.
[0020] In yet another of its aspects, the present invention relates to a method for removing elongate debris from an exterior surface of at least one radiation source assembly in a fluid treatment system as defined in the immediately preceding paragraph comprising the steps of:
(i) translating the wiping element from the first position toward the second position; and
(ii) causing the at least one jet element to generate the different fluid current to remove at least a portion of the elongate debris.
[0021] In yet another of its aspects, the present invention relates to a method for removing elongate debris from a surface in a fluid treatment system comprising the steps of:
(i) causing relative movement between the elongate debris and the at least one jet element of the cleaning apparatus; and
(ii) causing the at least one jet element to generate the different fluid current to remove at least a portion of the elongate debris.
[0022] In a first embodiment, Steps (i) and (ii) are conducted concurrently. In a second embodiment Steps (i) and (ii) are conducted sequentially.
[0023] Thus, the present inventors have discovered a novel cleaning apparatus for use in a fluid treatment system for removing elongate debris from a surface of the fluid treatment system. The "surface of the fluid treatment system" may be any surface on or near which elongate debris is likely to reside. Thus, the "surface" may be comprised in portion of the fluid treatment system such as a sensor, a support element, a drive element, a radiation source assembly and the like. In a preferred embodiment, present cleaning apparatus comprises one or more annular wiping elements making it particularly suitable for use with cylindrical (e.g., rounded) elements and the like.
[0024] The preferred embodiment of the cleaning apparatus further comprises of motive element configured to cause relative movement between elongate debris and contact with the elongate surface and the at least one jet element of the cleaning apparatus, the motive element being movable between the retracted position and an extended position. In one particularly preferred embodiment of the invention, the motive element is coupled to a wiping element and the fluid jet element of the cleaning apparatus is relatively fixed.
[0025] Thus, the present cleaning apparatus is particularly advantageous for removing elongate debris from one or more radiation source assemblies disposed in the fluid treatment system. The preferred approach utilized in the present cleaning apparatus is to include the motive element which is moved along the exterior of the radiation source assembly. At least one jet element of the cleaning apparatus is disposed near the distal portion of the radiation source assemblies. As the motive element is moved from the first (retracted) position to a second (extended) position, it will tend to push the elongate debris toward a distal portion of the radiation source assembly. This action causes the elongate debris to be moved into the differential fluid current generated by the cleaning apparatus. When this happens, the differential fluid current will act to cause the elongate debris to separate or float the elongate debris away from the radiation source assembly. When this happens, the flow of fluid through the fluid treatment system will naturally carry the separated or floating elongate debris away from the radiation source assembly and downstream there from.
[0026] Thus, the present cleaning apparatus allows for removing problematic debris such as elongate debris during regular operation of the fluid treatment system and without the need to shut down the system for servicing to remove the elongate debris. The present cleaning apparatus may or may not be incorporated in a radiation source module that contains one or more radiation source assemblies. In other words, it is possible to directly implement the present cleaning apparatus in a fluid treatment system.
[0027] The present cleaning apparatus is particularly well suited for implementation in a fluid treatment system wherein the radiation source assemblies are disposed transverse (e.g., vertical or angle with a distal portion of the radiation source assemblies projection above the flow of fluid) to the direction of fluid flow through the fluid treatment system. BRIEF DESCRIPTION OF THE DRAWINGS
[0028] Embodiments of the present invention will be described with reference to the accompanying drawings, wherein like reference numerals denote like parts, and in which:
Figure 1 illustrates a perspective view, in partial cross-section, of a first preferred embodiment of the present radiation source module;
Figure 2 illustrates a top view, in partial cross- section, of the radiation source module illustrated in Figure 1 ;
Figure 3 is a sectional view along line III-III in Figure 2;
Figures 4-5 illustrate a perspective view, in partial cross-section, of a second preferred embodiment of the present radiation source module;
Figure 6 illustrates a perspective view, in partial cross-section, of a third preferred embodiment of the present radiation source module;
Figures 7-14 illustrate, in a sequential manner, a perspective view of actuation of a portion of the cleaning apparatus illustrated in the radiation source module illustrated in Figure 6;
Figures 15-16 illustrates a perspective view, in partial cross-section, of a fourth preferred embodiment of the present radiation source module;
Figure 17 illustrates a bottom view of the radiation source module illustrated in Figures
15-16;
Figure 18 illustrates a perspective view, in partial cross-section, of a fifth preferred embodiment of the present radiation source module;
Figure 19 illustrates a perspective view, in partial cross-section, of a sixth preferred embodiment of the present radiation source module; Figure 20 illustrates an enlarged perspective view, in partial cross-section, of the radiation source module illustrated in Figures 15-17 having debris accumulated thereon;
Figures 21 and 22 illustrate, in a sequential manner, removable of the debris in the radiation source module illustrated in Figure 20; and
Figures 23-27 illustrate various views of the use of jet element in the present cleaning apparatus to remove debris from a radiation source assembly.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0029] In one of its aspects, the present invention relates to a cleaning apparatus for removing debris from an elongate surface in a fluid treatment system, the cleaning apparatus comprising at least one jet element configured to generate a differential fluid current in a plane that is non- normal to a longitudinal axis of the elongate surface to cause the debris to be removed from the elongate surface. Preferred embodiments of the cleaning apparatus may include any one or a combination of any two or more of any of the following features:
• at least one jet element is disposed adjacent to the elongate surface;
• the at least one jet element is disposed upstream with respect to the elongate surface;
• the at least one jet element is disposed downstream with respect to the elongate surface;
• the at least one jet element is configured to generate a differential fluid current comprising fluid being treated by the fluid treatment system;
• the at least one jet element is configured to generate a differentia] fluid current comprising only fluid being treated by the fluid treatment system; the at least one jet element is configured to generate a pressurized differential fluid current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a pressurized differential liquid current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a pressurized differential water current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a pressurized differential gaseous current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a pressurized differential air current in a plane that is non-normal to the longitudinal axis of the elongate surface; the at least one jet element is configured to generate a substantially fan-shaped pressurized differential fluid current in the plane; the substantially fan-shaped pressured fluid current has a spray angle in the range of from about 30° to about 90°; the substantially fan-shaped pressured fluid current has a spray angle in the range of from about 45° to about 60°; the substantially fan-shaped pressured fluid current has a spray angle of about 50°; the at least one jet element is configured to orient an edge of the substantially fan- shaped pressurized differential fluid current substantially perpendicular to the longitudinal axis of the elongate surface; the at least one jet element is configured to orient the plane containing the differential fluid current parallel to or at an angle with respect to a direction of fluid flow through the fluid treatment system; the at least one jet element is configured to orient the plane containing the differential fluid current parallel to a direction of fluid flow through the fluid treatment system; the at least one jet element is configured to orient the plane containing the differential fluid current at an angle with respect to a direction of fluid flow through the fluid treatment system; the angle is less than about 90°; the angle is in the range of from about 30° to about 60°; the angle is about 45°; the at least one jet element comprises a nozzle having an opening of from about 0.125 to about 0.5 inches; the at least one jet element comprises a nozzle having an opening of from about 0.2 to about 0.3 inches; the at least one jet element is configured to emit the differential fluid current at a pressure of less than about 100 psi; the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 5 to about 50 psi; the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 5 to about 40 psi; the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 10 to about 40 psi; the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 15 to about 40 psi; the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 20 to about 40 psi; the cleaning apparatus comprises a pluarility of jet elements; the cleaning apparatus further comprises a motive element configured to cause relative movement between elongate debris in contact with the elongate surface and the at least one jet element, the motive element movable between a retracted position and an extended position; the at least one jet element is stationary; the motive element comprises a debris shielding element coupled to the motive element; the debris shielding element is coupled to an upstream portion of the motive element; the debris shielding element is configured to reduce flow in a region downstream from the debris shielding element when the debris shielding element is in the extended position; the motive element is configured to move the debris shielding element between a first, raised position and a second, lowered position; the debris shielding element is configured such that, when the motive element is in the extended position and the debris shielding element is in the second, lowered position, fluid flow is reduced downstream of the debris shielding element; the debris translation element comprises at least one wiping element; the debris translation element comprises a plurality of wiping elements; the plurality of wiping elements is arranged in parallel with respect to one another; the plurality of wiping elements is disposed in a carriage element coupled to the motive element; the wiping element comprises a cleaning element configured to remove at least a portion of undesired materials from the portion of the surface; • the cleaning element comprises a scraper element for scraping at least a portion of undesired materials from the surface when the wiping element is moved from the first position to the second position;
• the wiping element comprises a seal for sealing engagement with the portion of the surface, the seal for removing at least a portion of undesired materials from the surface when the wiping element is moved from the first position to the second position;
• the wiping element comprises a chamber for surrounding a portion of the surface;
• the wiping element further comprises an inlet for introduction of a cleaning solution to the chamber;
• the wiping element is configured for contact with at least a portion of an exterior an elongate substantially cylindrical element;
• the wiping element is configured for contact with at least a portion of an exterior an elongate element having a rounded surface;
• the wiping element is configured for contact with at least a portion of an exterior of the motive element; and/or
• the wiping element is configured for contact with at least a portion of an exterior of a radiation source assembly disposed in the fluid treatment system.
[0030] The cleaning apparatus may be incorporated in a radiation source module that comprises a frame having a first support member and at least one radiation source assembly extending from the first support member, the at least one radiation source assembly comprising a radiation source; and may include any one, or a combination of any two or more, of the following features:
• the radiation source module further comprises means to position the radiation source module in the fluid treatment system; the at least one radiation source assembly is in sealing engagement with the first support member; the first support member is coupled to a proximal portion of the at least one radiation source assembly; the frame further comprises a second support member opposed to and laterally spaced from the first support member, at least a portion of the at least one radiation source assembly disposed between each of the first support member and the second support member; the second support member is coupled to a distal portion of the at least one radiation source assembly; the second support member comprises a recessed portion configured to receive the distal portion of the at least one radiation source assembly; the at least one jet element is disposed on the second support member; the at least one jet element is disposed on a fluid contacting surface of the second support member; the at least one jet element is disposed in the recessed portion of the second support member; one or jet elements are disposed on a fluid contacting surface of the second support member and one or more jet elements are disposed in the recessed portion of the second support member; the radiation source module further comprises a pump element to feed pressurized fluid to the at least one jet element of the cleaning apparatus; • the radiation source module further comprises a pump element to feed pressurized fluid being treated by the fluid treatment system to the at least one jet element of the cleaning apparatus;
• the radiation source module further comprises a pump element to feed pressurized liquid to the at least one jet element of the cleaning apparatus;
• the radiation source module further comprises a pump element to feed pressurized water to the at least one jet element of the cleaning apparatus;
• the radiation source module further comprises a pump element to feed pressurized water being treated by the fluid treatment system to the at least one jet element of the cleaning apparatus;
• the frame further comprises a third support member interconnecting the first support member and the second support member;
• the frame further comprises a power supply for controlling the radiation source;
• the radiation source assembly comprises a protective sleeve surrounding the radiation source;
• the protective sleeve comprises a quartz sleeve;
• the protective sleeve has an open end in sealed engagement with an opening in the first support member and a closed end supported by the second support member; and/or
• the open end is sealed to prevent fluid ingress into the module.
[0031] The radiation source module may be incorporated in a fluid treatment system that may include any one or a combination of any two or more of any of the following features: • the fluid treatment zone is comprised in an open channel for receiving the flow of fluid;
• the fluid treatment zone is comprised in a closed channel for receiving the flow of fluid;
• the at least one radiation source assembly is elongate and has a longitudinal axis disposed at an angle with respect to the direction of fluid flow through the fluid treatment zone;
• the at least one radiation source assembly is elongate and has a longitudinal axis disposed substantially parallel to the direction of fluid flow through the fluid treatment zone;
• the at least one radiation source assembly is elongate and has a longitudinal axis disposed orthogonal to the direction of fluid flow through the fluid treatment zone; and/or
• the at least one radiation source assembly is elongate and is disposed substantially vertically in the fluid treatment zone.
[0032] With reference to Figure 1, there is illustrated a radiation source module 100.
[0033] Radiation source module 100 comprises a pair of supports 102 which are configured to enable radiation source module 100 to be rotatably removable in an open channel containing a flow of fluid such as any in of the fluid treatment systems described above. Radiation source module 100 comprises a pair of support legs 105,1 10 which interconnect a header 112 and a footer 1 14. As will be apparent to those of ordinary skill in the art, a pair of support legs opposite to support legs 105,1 10 are not shown for clarity.
[0034] The combination of support lets 105,110, header 112 and footer 114 define a fluid treatment zone 1 15 through which fluid flows in the direction of arrow A. Disposed in a upstream portion of header 112 is a baffle plate 1 17 and disposed in a downstream portion of header 1 12 is a baffle plate 1 19. As shown, baffle plates 117,119 span the width of radiation source module 100 and radiation source module 110 is intended, in a preferred embodiment, to span the width of an open channel (not shown for clarity) in which radiation source module 100 is disposed. The use and function of baffle plates 117,119 is described in more detail in, for example, International Publication No. WO 2008/019490 [Traubenberg et al.].
[0035] Disposed between header 112 and footer 114 are a series of radiation source assemblies 120. The distal portions of radiation source assemblies 120 are disposed in a series of apertures. The proximal portions of radiation source assemblies 120 are connected to and supported by header 112. Additional details on the construction and components in module header 120 may be found in co-pending United States provisional patent application International Publication No. WO 2010/1 15276 [Traubenberg et al.].
[0036] Each radiation source assembly 120 may comprise a radiation source (not shown for clarity) disposed in a radiation transparent protective sleeve. Preferably, the radiation source is an ultraviolet (UV) radiation source.
[0037] A cleaning apparatus 125 comprises a series of wiping elements 130 engaged to the exterior of each radiation source assembly 120 - preferably each wiping element 130 also functions as a cleaning element. Cleaning apparatus 125 is connected to a drive element (not shown for clarity) which is configured to move cleaning apparatus 125 from a first, retracted position (sometimes referred to as the "parked position") near header 1 12 to a second, extended position (sometimes referred to as the "in use position" or "use position") near footer 114. While the precise nature of a drive element is not particularly restricted, it is preferred that the drive element is of the type illustrated in United States patent 6,342,188 [Pearcey et al.], the type illustrated in International Publication No. WO 2010/102383 [Penhale et al.] or United States provisional patent application S.N. 61/734,479 [Zhu et al.], filed December 7, 2012. Details of connections and operation of drive element may also be found in Pearcey et al., Penhale et al. and Zhu et al.
[0038] Disposed on footer 1 14 are a series of fluid jet elements 135. Fluid jet elements are configured to emit a jet of fluid that acts as a differential fluid current in a planed that is non- normal to a longitudinal axis of radiation source assembly 120 as will be described in more detail below with reference to Figures 2 and 3.
[0039] As shown in Figures 2 and 3, fluid jet elements 135 are oriented at an angle B with respect to arrow A which represents the direction of fluid flow through the fluid treatment system. Preferably, this angle is up to about 90°, more preferably in the range of from about 30° to about 60°, most preferably about 45°. Alternatively, it is possible to orient jet elements 135 such that they generate a differential fluid current that is parallel to the direction of fluid flow represented by arrow A. In either case, it is highly preferred that the differential fluid current produced by fluid jet elements is contained in a plane that is adjacent or in tangential contact with radiation source assemblies 120.
[0040] With reference to Figure 3, it can be seen that each jet element 135 generates a substantially fan-shaped fluid current. The sweep of the fan-shape is at an angle C. Preferably, angle C is in the range from about 30° to about 90°, more preferably from about 45° to about 60°, most preferably about 50°.
[0041] With reference to Figure 1, it can be seen that, as cleaning apparatus 125 is moved toward footer 1 14, it tends to push elongate debris 10 toward fluid jet element 135. The action of fluid jet elements 135 on debris 10 will be discussed in more detail below.
[0042] With reference to Figures 4-5, there is illustrated a modification to cleaning apparatus 125. Specifically, cleaning apparatus 125 has been modified to include a debris shield element 127.
[0043] As can be seen in Figure 4, cleaning apparatus 125 having debris shield element 127 is in a retracted position such that it is parked between baffle plates 1 17,119. The primary reason the debris is "stapled" to radiation source assembly 120 is because bulk fluid velocity acts on the debris in the form of surface drag - i.e., the water pulls on the debris. The drag coefficient of the debris combined with the fluid velocity over compensates for the pressure of the water holding the debris against radiation source assembly 120. With reference to Figure 5, as cleaning apparatus 125 is extended toward footer 114, it will tend to push debris 10 toward footer 1 14. As shown, debris shield element 127 is configured so as to shield debris downstream there from. This creates an effect of reducing fluid velocity (and/or fluid pressure) downstream of debris shield element 127 thereby reducing the above-described effect of the drag on the debris. In addition, the shield tends to protect fluid jet element 135 by reducing opposed fluid current.
[0044] With reference to Figures 6-14, there is illustrated a modified version of debris shield element 127. Specifically, in the embodiments illustrated in Figures 6-14, debris shield element 127a is movable from a first position above cleaning apparatus 125 to a second position below cleaning apparatus 125. This movement is achieved via a pair of arms 128,129 which are configured to pivot as shown in Figure 6.
[0045] With reference to Figures 7-14, a pivoting action of debris shield 127a will be described in detail. Thus, as shown, cleaning apparatus 125 comprises a latch 140 which is connected to a pair of springs 142,144. As shown, a portion of latch 140 passes through an aperture in debris shield element 127a.
[0046] Latch 140 further comprises an end portion 146. As further shown, a dog element 148 is disposed on the upper surface of footer 1 14.
[0047] With reference to Figure 7, it can be seen that cleaning apparatus 125 has been moved from its parked position (Figure 4) such that it is near footer 114.
[0048] As this movement is continued, end portion 146 of latch 140 contacts dog element 148 - see Figure 8. As this movement is continued, end portion 146 of latch 140 moves down the face of dog element 148 with the result that latch element 140 is biased away from debris shield element 127a allowing debris shield element 127a to pivot downward to contact footer 114 - see Figure 9. In this position, jet elements 135 generate a differential fluid current (discussed below) to remove debris 10 from radiation source assemblies 120.
[0049] Once debris removal has been completed, continued movement of cleaning apparatus 125 results in end portion 146 of latch 140 clearing dog element 148 as shown in Figure 10. The continued downward motion of cleaning apparatus 125 also resets the shield in the upper or start position. When cleaning apparatus 125 is moved upward toward the parking position spring 144 tends to bias latch 140 toward debris shield element 127a. With continued movement of cleaning apparatus 125 in an upward direction, debris shield element 127a is raised until latch 140 is biased into the aperture in debris shield element 127a - see Figures 11-14.
[0050] Figures 16-17 illustrate a modified radiation source assembly 100a. There are two modifications made to radiation source assembly 100 illustrated with reference to Figures 1-14. First, radiation source assemblies 120a are angled from a vertical orientation (Figures 1-14) to an angled configuration. Second, the recess portions in footer 1 14 have been modified to include supplementary fluid jet elements 135a to remove any debris that may accumulate in those recessed portions.
[0051] The modified radiation source module 100b is shown in Figure 18. Here, the modification is to omit debris shield element 127 and 127a referred to above. In the illustrated embodiment, baffle plates 150 have been disposed on footer 114 to create a similar effect as debris shield element 127 and 127a described above when debris is being removed from radiation source assemblies 120a.
[0052] With reference to Figure 19, a further modified radiation source assembly lOOd is shown. In the illustrated embodiment, the principle modification is to include a submersible pump 200 which serves to recycle fluid being treated to jet element 135. This arrangement omits the need to use fresh water (or air) in a pressurized feed line (not shown for clarity) connected to fluid jet elements 135. In a highly preferred embodiment, module lOOd includes a cleaning element 210 which cleans a perforated feed inlet 215 which draws fluid being treated into submersible pump 200. Thus, each time a cleaning cycle is effected, scraper element 210 wipes the perforated fluid inlet 215 of submersible pump 200 thereby mitigating or obviating blockage fluid input to submersible pump 200.
[0053] Figures 20-22 illustrate removable of debris 10a that is accumulated in recesses in footer 1 14 that support radiation source assemblies 120a. Figure 20 illustrates accumulation of debris 10a. Figure 21 illustrates actuation of fluid jet elements 135a to float debris 10a above footer 114. Figure 22 illustrates actuation of fluid jet elements 135 to create a differential fluid current that floats or pushes debris 10a away from radiation source assemblies 120a once debris shield element 127 is moved away from footer 114, the flow of fluid passing past radiation source assemblies 120a carries debris 10a away from radiation source assemblies 120a.
[0054] As described above, the cleaning apparatus of the present invention comprises fluid jet element that generates a differential fluid curr3nt in a plane that is in a non-normal relationship with respect to a longitudinal axis of an elongate surface containing elongate debris. In a highly preferred embodiment of the invention, the elongate surface is at least the exterior surface of a radiation source assembly.
[0055] The term "differential fluid current, as used throughout this specification, is intended to mean a fluid current that is created differentially with respect to flow of fluid through the fluid treatment system. By this, it is meant that the fluid current is generated in a direction that is other than the direction of fluid flow through the fluid treatment system. Thus, the fluid current can be in a plane that is parallel to but directed upstream with respect to the direction of fluid flow through the fluid treatment system or the plane may be angled with respect to the direction of fluid flow through the fluid treatment system. The point is, a fluid current should not be directed in a manner coterminous with the direction of fluid flow through the fluid treatment system. In this manner, the fluid current is "differential" with respect to the direction of fluid flow through the fluid treatment system.
[0056] Figure 23 illustrates elongate debris 10 which has been "trapped" or "caught" on a radiation source assembly 120. In a sense, elongate debris 10 has been "stapled" onto radiation source assembly 120 by the fluid flowing in the direction of arrow A.
[0057] When it is desired to remove debris 10 from radiation source assembly 120, a differential fluid current is generated from fluid jet element 135 - see Figure 24. In the illustrated embodiment, the differential fluid current is in a plane containing four vectors. That plane is angled with respect to the direction of fluid flow as shown by arrow A. The effect of the differential fluid current shown in Figure 24 is to lift or separate debris 10 with respect to radiation source assembly 120. This creates downstream movement of one portion of debris 10 which, coupled with the force of fluid flow past radiation source assembly 120 facilitates removal of debris 10.
[0058] A similar effect is shown in Figures 25-27. In this case, a pair of jet elements 135 are used on opposite sides of radiation source assembly 120. Each fluid jet element 135 creates a differential fluid current in a plane that contact radiation source assembly 120 in a tangential manner on either side thereof. As shown in Figure 26, the creation of these differential fluid currents on either side of radiation source assembly 120 serves to lift and/or carry debris 10 away from radiation source 120 in a manner that one end of debris 10 moves downstream relative to the other end of debris 10 and, coupled with the force of fluid flow past radiation source assembly 120, debris 10 is removed from radiation source assembly 120 and is carried away from radiation source assembly 120 in a downstream direction - see Figure 27.
[0059] In the present cleaning apparatus, it is highly preferred that the differential fluid current is generated in a manner which contacts adjacent to or tangentially with respect to the elongate surface (e.g., the radiation source assembly) containing the elongate debris.
[0060] While this invention has been described with reference to illustrative embodiments and examples, the description is not intended to be construed in a limiting sense. Thus, various modifications of the illustrative embodiments, as well as other embodiments of the invention, will be apparent to persons skilled in the art upon reference to this description. It is therefore contemplated that the appended claims will cover any such modifications or embodiments.
[0061] All publications, patents and patent applications referred to herein are incorporated by reference in their entirety to the same extent as if each individual publication, patent or patent application was specifically and individually indicated to be incorporated by reference in its entirety.

Claims

What is claimed is:
1. A cleaning apparatus for removing debris from an elongate surface in a fluid treatment system, the cleaning apparatus comprising at least one jet element configured to generate a differential fluid current in a plane that is non-normal to a longitudinal axis of the elongate surface to cause the debris to be removed from the elongate surface.
2. The cleaning apparatus defined in Claim 1, wherein the at least one jet element is disposed adjacent to the elongate surface.
3. The cleaning apparatus defined in Claim 1, wherein the at least one jet element is disposed upstream with respect to the elongate surface.
4. The cleaning apparatus defined in Claim 1, wherein the at least one jet element is disposed downstream with respect to the elongate surface.
5. The cleaning apparatus defined in Claims 1-4, wherein the at least one jet element is configured to generate a differential fluid current comprising fluid being treated by the fluid treatment system.
6. The cleaning apparatus defined in Claims 1-4, wherein the at least one jet element is configured to generate a differential fluid current comprising only fluid being treated by the fluid treatment system.
7. The cleaning apparatus defined in claims 1-4, wherein the at least one jet element is configured to generate a pressurized differential fluid current in a plane that is non-normal to the longitudinal axis of the elongate surface.
8. The cleaning apparatus defined in claims 1-4, wherein the at least one jet element is configured to generate a pressurized differential liquid current in a plane that is non-normal to the longitudinal axis of the elongate surface.
9. The cleaning apparatus defined in claims 1-4, wherein the at least one jet element is configured to generate a pressurized differential water current in a plane that is non-normal to the longitudinal axis of the elongate surface.
10. The cleaning apparatus defined in claims 1-4, wherein the at least one jet element is configured to generate a pressurized differential gaseous current in a plane that is non-normal to the longitudinal axis of the elongate surface.
11. The cleaning apparatus defined in claims 1-4, wherein the at least one jet element is configured to generate a pressurized differential air current in a plane that is non-normal to the longitudinal axis of the elongate surface.
12. The cleaning apparatus defined in claims 1-11, wherein the at least one jet element is configured to generate a substantially fan-shaped pressurized differential fluid current in the plane.
13. The cleaning apparatus defined in claim 12 the substantially fan-shaped pressured fluid current has a spray angle in the range of from about 30° to about 90°.
14. The cleaning apparatus defined in claim 12 the substantially fan-shaped pressured fluid current has a spray angle in the range of from about 45° to about 60°.
15. The cleaning apparatus defined in claim 12 the substantially fan-shaped pressured fluid current has a spray angle of about 50°.
16. The cleaning apparatus defined in claims 12-15, wherein the at least one jet element is configured to orient an edge of the substantially fan-shaped pressurized differential fluid current substantially perpendicular to the longitudinal axis of the elongate surface.
17. The cleaning apparatus defined in claims 1-16, wherein the at least one jet element is configured to orient the plane containing the differential fluid current parallel to or at an angle with respect to a direction of fluid flow through the fluid treatment system.
18. The cleaning apparatus defined in claims 1-16, wherein the at least one jet element is configured to orient the plane containing the differential fluid current parallel to a direction of fluid flow through the fluid treatment system.
19. The cleaning apparatus defined in claims 1-16, wherein the at least one jet element is configured to orient the plane containing the differential fluid current at an angle with respect to a direction of fluid flow through the fluid treatment system.
20. The cleaning apparatus defined in claim 19, wherein the angle is less than about 90°.
21. The cleaning apparatus defined in claim 19, wherein the angle is in the range of from about 30° to about 60°.
22. The cleaning apparatus defined in claim 19, wherein the angle is about 45°.
23. The cleaning apparatus defined in claims 1-22, wherein the at least one jet element comprises a nozzle having an opening of from about 0.125 to about 0.5 inches.
24. The cleaning apparatus defined in claims 1-22, wherein the at least one jet element comprises a nozzle having an opening of from about 0.2 to about 0.3 inches.
25. The cleaning apparatus defined in claims 1-24, wherein the at least one jet element is configured to emit the differential fluid current at a pressure of less than about 100 psi.
26. The cleaning apparatus defined in claims 1-24, wherein the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 5 to about 50 psi.
27. The cleaning apparatus defined in claims 1-24, wherein the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 10 to about 40 psi.
28. The cleaning apparatus defined in claims 1-24, wherein the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 10 to about 40 psi.
29. The cleaning apparatus defined in claims 1-24, wherein the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 15 to about 40 psi.
30. The cleaning apparatus defined in claims 1-24, wherein the at least one jet element is configured to emit the differential fluid current at a pressure in the range of from about 20 to about 40 psi.
31. The cleaning apparatus defined in claims 1 -30, comprising a plurality of jet elements.
32. The cleaning apparatus defined in claims 1-31, further comprising a motive element configured to cause relative movement between elongate debris in contact with the elongate surface and the at least one jet element, the motive element movable between a retracted position and an extended position.
33. The cleaning apparatus defined in Claim 32, wherein the at least one jet element is stationary.
34. The cleaning apparatus defined in Claims 32-33, wherein the motive element comprises a debris shielding element coupled to the motive element.
35. The cleaning apparatus defined in Claim 34, wherein the debris shielding element is coupled to an upstream portion of the motive element.
36. The cleaning apparatus defined in Claims 34-35, wherein the debris shielding element is configured to reduce flow in a region downstream from the debris shielding element when the debris shielding element is in the extended position.
37. The cleaning apparatus defined in Claims 34-36, wherein the motive element is configured to move the debris shielding element between a first, raised position and a second, lowered position.
38. The cleaning apparatus defined in Claim 37, wherein the debris shielding element is configured such that, when the motive element is in the extended position and the debris shielding element is in the second, lowered position, fluid flow is reduced downstream of the debris shielding element.
39. The cleaning apparatus defined in Claims 32-38, wherein the debris translation element comprises at least one wiping element.
40. The cleaning apparatus defined in Claims 32-38, wherein the debris translation element comprises a plurality of wiping elements.
41. The cleaning apparatus defined in Claim 40, wherein the plurality of wiping elements is arranged in parallel with respect to one another.
42. The cleaning apparatus defined in Claims 40-41, wherein the plurality of wiping elements is disposed in a carriage element coupled to the motive element.
43. The cleaning apparatus defined in Claims 39-42, wherein the wiping element comprises a cleaning element configured to remove at least a portion of undesired materials from the portion of the surface.
44. The cleaning apparatus defined in Claim 43, wherein the cleaning element comprises a scraper element for scraping at least a portion of undesired materials from the surface when the wiping element is moved from the first position to the second position.
45. The cleaning apparatus defined in Claims 39-44, wherein the wiping element comprises a seal for sealing engagement with the portion of the surface, the seal for removing at least a portion of undesired materials from the surface when the wiping element is moved from the first position to the second position.
46. The cleaning apparatus defined in Claims 39-45, wherein the wiping element comprises a chamber for surrounding a portion of the surface.
47. The cleaning apparatus defined in Claim 46, wherein the wiping element further comprises an inlet for introduction of a cleaning solution to the chamber.
48. The cleaning apparatus defined in Claims 39-47, wherein the wiping element is configured for contact with at least a portion of an exterior an elongate substantially cylindrical element.
49. The cleaning apparatus defined in Claims 39-47, wherein the wiping element is configured for contact with at least a portion of an exterior an elongate element having a rounded surface.
50. The cleaning apparatus defined in Claims 32-49, wherein the wiping element is configured for contact with at least a portion of an exterior of the motive element.
51. The cleaning apparatus defined in Claims 32-49, wherein the wiping element is configured for contact with at least a portion of an exterior of a radiation source assembly disposed in the fluid treatment system.
52. A radiation source module for use in a fluid treatment system, the module comprising: a frame having a first support member;
at least one radiation source assembly extending from the first support member, the at least one radiation source assembly comprising a radiation source; and
the cleaning apparatus defined in any one of Claims 1-51.
53. The radiation source module defined in Claim 52, further comprising means to position the radiation source module in the fluid treatment system.
54. The radiation source module defined in any one of Claims 52-53, wherein the at least one radiation source assembly is in sealing engagement with the first support member.
55. The radiation source module defined in Claim 52, wherein the first support member is coupled to a proximal portion of the at least one radiation source assembly.
56. The radiation source module defined in Claims 52-55, wherein the frame further comprises a second support member opposed to and laterally spaced from the first support member, at least a portion of the at least one radiation source assembly disposed between each of the first support member and the second support member.
57. The radiation source module defined in Claim 56, wherein the second support member is coupled to a distal portion of the at least one radiation source assembly.
58. The radiation source module defined in Claim 56, wherein the second support member comprises a recess portion configured to receive the distal portion of the at least one radiation source assembly.
59. The radiation source module defined in Claims 56-58, wherein the at least one jet element is disposed on the second support member.
60. The radiation source module defined in Claims 56-59, wherein the at least one jet element is disposed on a fluid contacting surface of the second support member.
61. The radiation source module defined in Claim 59, wherein the at least one jet element is disposed in the recess portion of the second support member.
62. The radiation source module defined in Claims 56-59, wherein one or more jet elements are disposed on a fluid contacting surface of the second support member and one or more jet elements are disposed in the recess portion of the second support member.
63. The radiation source module defined in Claims 52-62, further comprising a pump element to feed pressurized fluid to the at least one jet element of the cleaning apparatus.
64. The radiation source module defined in Claims 52-62, further comprising a pump element to feed pressurized fluid being treated by the fluid treatment system to the at least one jet element of the cleaning apparatus.
65. The radiation source module defined in Claims 52-62, further comprising a pump element to feed pressurized liquid to the at least one jet element of the cleaning apparatus.
66. The radiation source module defined in Claims 52-62, further comprising a pump element to feed pressurized water to the at least one jet element of the cleaning apparatus.
67. The radiation source module defined in Claims 52-62, further comprising a pump element to feed pressurized water being treated by the fluid treatment system to the at least one jet element of the cleaning apparatus.
68. The radiation source module defined in Claims 56-67, the frame further comprises a third support member interconnecting the first support member and the second support member.
69. The radiation source module defined Claims 52-68, wherein the frame further comprises a power supply for controlling the radiation source.
70. The radiation source module defined Claims 52-69, wherein the radiation source assembly comprises a protective sleeve surrounding the radiation source.
71. The radiation source module defined in Claim 70, wherein the protective sleeve comprises a quartz sleeve.
72. The radiation source module defined in any one of Claims 71, wherein the protective sleeve has an open end in sealed engagement with an opening in the first support member and a closed end supported by the second support member.
73. The radiation source module defined in Claim 72, wherein the open end is sealed to prevent fluid ingress into the module.
74. A fluid treatment system comprising a fluid treatment zone for receiving a flow of fluid and at least one radiation source module defined in any one of Claims 52-73, wherein the at least one radiation source module is configured such that the at least one radiation source assembly is disposed in the fluid treatment zone.
75. The fluid treatment system defined in Claim 74, wherein the fluid treatment zone is comprised in an open channel for receiving the flow of fluid.
76. The fluid treatment system defined in Claim 74, wherein the fluid treatment zone is comprised in a closed channel for receiving the flow of fluid.
77. The fluid treatment system defined in any one of Claims 74-76, wherein the at least one radiation source assembly is elongate and has a longitudinal axis disposed at an angle with respect to the direction of fluid flow through the fluid treatment zone.
78. The fluid treatment system defined in any one of Claims 74-76, wherein the at least one radiation source assembly is elongate and has a longitudinal axis disposed substantially parallel to the direction of fluid flow through the fluid treatment zone.
79. The fluid treatment system defined in any one of Claims 74-76, wherein the at least one radiation source assembly is elongate and has a longitudinal axis disposed orthogonal to the direction of fluid flow through the fluid treatment zone.
80. The fluid treatment system defined in any one of Claims 74-76, wherein the at least one radiation source assembly is elongate and is disposed substantially vertically in the fluid treatment zone.
81. A method for removing elongate debris from a surface in a fluid treatment system as defined in any one of Claims 74-80 comprising the steps of.
(i) causing relative movement between the elongate debris and the at least one jet element of the cleaning apparatus; and
(ii) causing the at least one jet element to generate the differential fluid current to remove at least a portion of the elongate debris.
82. The method defined in Claim 81, wherein Step (i) comprises translating the elongate debris along the surface toward the at least one jet element of the cleaning apparatus
83. The method defined in Claims 81-82, wherein Steps (i) and (ii) are conducted concurrently.
84. The method defined in Claims 81-82, wherein Steps (i) and (ii) are conducted sequentially.
85. The method defined in Claims 81-84, wherein the surface is an exterior surface of a radiation source assembly in the fluid treatment system.
86. The method defined in Claims 81-84, wherein the surface is an exterior surface of a radiation sensor in the fluid treatment system.
87. The method defined in Claims 81-84, wherein the surface is an exterior surface of a drive element in the fluid treatment system.
PCT/CA2014/000063 2013-02-04 2014-02-03 Cleaning apparatus, radiation source module and fluid treatment system WO2014117254A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2239925A1 (en) * 1993-03-05 1994-09-06 Trojan Technologies Inc. Fluid treatment system and process
KR100961910B1 (en) * 2009-12-16 2010-06-10 정삼규 Air thrusting brush washer for ultraviolet light emitter of sterilizer
WO2010102383A1 (en) * 2009-03-13 2010-09-16 Trojan Technologies Cleaning apparatus, radiation source module and fluid treatment system
US20120216843A1 (en) * 2009-09-02 2012-08-30 Xylem Ip Holdings Llc Uv disinfection system with contactless cleaning

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2239925A1 (en) * 1993-03-05 1994-09-06 Trojan Technologies Inc. Fluid treatment system and process
WO2010102383A1 (en) * 2009-03-13 2010-09-16 Trojan Technologies Cleaning apparatus, radiation source module and fluid treatment system
US20120216843A1 (en) * 2009-09-02 2012-08-30 Xylem Ip Holdings Llc Uv disinfection system with contactless cleaning
KR100961910B1 (en) * 2009-12-16 2010-06-10 정삼규 Air thrusting brush washer for ultraviolet light emitter of sterilizer

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