WO2014052899A1 - Soluble precursors and solution-based processes for photovoltaics - Google Patents

Soluble precursors and solution-based processes for photovoltaics Download PDF

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Publication number
WO2014052899A1
WO2014052899A1 PCT/US2013/062418 US2013062418W WO2014052899A1 WO 2014052899 A1 WO2014052899 A1 WO 2014052899A1 US 2013062418 W US2013062418 W US 2013062418W WO 2014052899 A1 WO2014052899 A1 WO 2014052899A1
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ethyl
layer
butyl
trimethylpentyl
methylpentyl
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PCT/US2013/062418
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French (fr)
Inventor
Kyle L. Fujdala
Zhongliang Zhu
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Precursor Energetics, Inc.
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Priority claimed from US13/631,920 external-priority patent/US20130087745A1/en
Application filed by Precursor Energetics, Inc. filed Critical Precursor Energetics, Inc.
Publication of WO2014052899A1 publication Critical patent/WO2014052899A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
    • H01L31/0749—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type including a AIBIIICVI compound, e.g. CdS/CulnSe2 [CIS] heterojunction solar cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02491—Conductive materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/02623—Liquid deposition
    • H01L21/02628—Liquid deposition using solutions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/541—CuInSe2 material PV cells

Definitions

  • This invention relates to processes and compositions used to prepare semiconductor and optoelectronic materials and devices including thin film solar cells.
  • this invention relates to solution-based processes and
  • compositions and inks containing soluble polymeric precursor compounds for preparing CIGS solar cells and other solar cells The processes and compositions provide high thickness per pass for efficient manufacturing.
  • One way to make a thin film photovoltaic material is to deposit an ink that contains a CIGS polymeric precursor compound onto a substrate.
  • the ink can be converted to a thin film which ultimately can be transformed into a CIGS photovoltaic material.
  • CIGS polymeric precursor inks which contain a CIGS polymeric precursor compound that has the empirical formula
  • Cu x (Ini-yGay) v ((Si-zSe z )R)w wherein x is from 0.5 to 1.5, y is from 0 to 1, z is from 0 to 1, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, which are independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, and silyl.
  • the ratio of Cu to (In+Ga) can be deficient, i.e. less than 1, which is the predetermined ratio that is desired for a CIGS photovoltaic absorber material.
  • CIGS materials are complex, having many possible solid phases.
  • methods for large scale manufacturing of CIGS and related thin film solar cells can be difficult because of the chemical processes involved.
  • large scale processes for solar cells are unpredictable because of the difficulty in controlling numerous chemical and physical parameters involved in forming an absorber layer of suitable quality on a substrate, as well as forming the other components of an efficient solar cell assembly, both reproducibly and in high yield.
  • the solution-based process should use readily available solvents, for example hydrocarbons, and be production-friendly and relatively safe.
  • compositions and a solution-based process that can be used for making photovoltaic absorber materials for solar cells having high efficiencies and thickness of substrate film.
  • This invention relates to processes and compositions used to prepare semiconductor and optoelectronic materials and devices including thin film solar cells.
  • this invention relates to solution-based processes and
  • compositions containing polymeric precursors for preparing CIGS and other solar cells are provided.
  • a process for making a photovoltaic absorber layer on a substrate comprising:
  • the polymeric precursor compounds have the empirical formula (Cui_ x Ag x ) u (M B Y y _ t M B2 y M B3 t)((Si_ z Se z )R) w , wherein M B1 is In, M B2 is Ga, and M B3 is Al, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.6 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from alkyl groups.
  • the thickness of the layer made by one pass through steps (b) and (c), in which one deposition of ink is done is from 100 to 500 nanometers, or from 150 to 400 nanometers, or from 150 to 300 nanometers.
  • R groups are independently selected from n- butyl, sec -butyl, iso-butyl, and t-butyl.
  • R groups are a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl groups, or a mixture of n-butyl and sec- butyl groups, or a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and sec -butyl and iso-butyl groups, or a mixture of n-butyl and sec -butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl and t-butyl groups, or a mixture of sec- butyl and iso-butyl and t-butyl groups.
  • R groups are independently selected from n- pentyl, isopentyl, sec-pentyl, 1 -methylpentyl, 2-methylpentyl, 3-methylpentyl, 4- methylpentyl, 1-ethylbutyl, 2-ethylbutyl, tert-pentyl, 1 , 1 -dimethylbutyl, 1,2- dimethylbutyl, 1,3-dimethylbutyl, 2,3-dimethylbutyl, cyclopentyl, and mixtures of any of the foregoing.
  • R groups are independently selected from n- hexyl, 1 -methylhexyl, 2 -methylhexyl, 3 -methylhexyl, 4-methylhexyl, 5 -methylhexyl,
  • the polymeric precursor compounds have a ratio of atoms of Group 11 to atoms of Group 13 of 0.60, 0.61, 0.62, 0.63, 0.64, 0.65, 0.66, 0.67, 0.68, 0.69, 0.70, or 0.71, or 0.72, or 0.73, or 0.74, or 0.75, or 0.76, or 0.77, or 0.78, or 0.79, or 0.80, or 0.81, or 0.82, or 0.83, or 0.84, or 0.85, or 0.86, or 0.87, or 0.88, or 0.89, or 0.90, or 0.91, or 0.92, or 0.93, or 0.94, or 0.95, or 0.96, or 0.97, or 0.98, or 0.99.
  • the substrate has a layer of an adhesion promoter material on the electrical contact layer, wherein the adhesion promoter material is a CIGS material that is enriched in Cu so that the ratio of atoms of Cu to atoms of In and Ga, which is Cu/(In + Ga), is from 1 to 1.3, or from 1 to 1.2, or from 1 to 1.1.
  • the adhesion promoter material is a CIGS material that is enriched in Cu so that the ratio of atoms of Cu to atoms of In and Ga, which is Cu/(In + Ga), is from 1 to 1.3, or from 1 to 1.2, or from 1 to 1.1.
  • the process above further comprising repeating steps (b) and (c).
  • the process above, wherein the heating step is a process comprising converting the layer at a temperature of from 100°C to 450°C.
  • the substrate is a semiconductor, a doped semiconductor, silicon, gallium arsenide, insulators, glass, molybdenum glass, molybdenum-coated glass, silicon dioxide, titanium dioxide, zinc oxide, silicon nitride, a metal, a metal foil, molybdenum, aluminum, beryllium, cadmium, cerium, chromium, cobalt, copper, gallium, gold, lead, manganese, molybdenum, nickel, palladium, platinum, rhenium, rhodium, silver, stainless steel, steel, iron, strontium, tin, titanium, tungsten, zinc, zirconium, a metal alloy, a metal silicide, a metal carbide, a polymer, a plastic, a conductive polymer, a copolymer, a polymer blend, a polyethylene terephthalate, a polycarbonate, a polyester, a polyester film, a mylar, a poly
  • a photovoltaic absorber material made by the process above.
  • the compound is a CIGS polymeric precursor compound having the empirical formula Cu u (Ini_ y Ga y )((Si- z Se z )R) w , wherein x is 0, y is between 0 and 1 so that both In and Ga are present, and t is 0.
  • R groups are independently selected from n-butyl, sec -butyl, iso-butyl, and t-butyl.
  • R groups are independently selected from n-pentyl, isopentyl, sec-pentyl, 1 -methylpentyl, 2-methylpentyl, 3-methylpentyl, 4- methylpentyl, 1-ethylbutyl, 2-ethylbutyl, tert-pentyl, 1 , 1 -dimethylbutyl, 1,2- dimethylbutyl, 1,3-dimethylbutyl, 2,3 -dimethylbutyl, cyclopentyl, and mixtures of any of the foregoing.
  • R groups are independently selected from n-hexyl, 1 -methylhexyl, 2-methylhexyl, 3-methylhexyl, 4-methylhexyl, 5- methylhexyl, 1-ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1 -n-propylbutyl, 1-iso- propylbutyl, l-iso-propyl-2-methylpropyl, 1 -methylheptyl, 2-methylheptyl, 3- methylheptyl, 4-methylheptyl, 5 -methylheptyl, 6-methylheptyl, 1-ethylhexyl, 2- ethylhexyl, 3-ethylhexyl, 4-ethylhexyl, 1 -n-propylpentyl, 2-n-propylpentyl, 1-iso- propylpentyl, 2-iso-propyl, 2-
  • An ink for making a photovoltaic absorber material comprising one or more precursor compounds and an additive dissolved in one or more solvents.
  • the precursor compounds are polymeric precursor compounds have the empirical formula (Cui- x Ag x ) u (Ini_ y _ t Ga y Al t )((Si- z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from n-propyl, isopropyl, n-butyl, iso- butyl, sec-butyl, t-butyl, n-pentyl.
  • the additive is a compound having the one of the formulas AR4, R3A-AR3, or R 2 A-Q-AR 2 , wherein A is Si, Ge, or Sn, Q is -(CR 2 ) n -, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
  • the additive is an siloxane, germoxane or stannoxane compound having the formula (R 2 AO) x , wherein x is 2 to 8, A is Si, Ge, or Sn, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
  • the additive is at a concentration of from 0.1% to 15% (v/v), or from 0.1% to 10%, or from 0.1% to 5%.
  • the solvents are selected from aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, xylene, ethers, diethyl ether, tetrahydofuran, 2-methyltetrahydofuran, siloxanes, cyclosiloxanes, silicone fluids, acetonitrile, esters, acetates, ethyl acetate, butyl acetate, acrylates, isobornyl acrylate, ketones, acetone, methyl e
  • FIG. 1 shows an embodiment of a CIGS polymeric precursor compound that is soluble in organic solvents.
  • the structure of the polymeric precursor compound can be represented as a polymer chain of repeating units: A, which is (M A (ER)(ER) ⁇ , and B, which is (M B (ER)(ER) ⁇ , where M A is a Group 11 atom, M B is a Group 13 atom, E is a chalcogen, and R is a functional group.
  • the structure of the polymer can be represented by the formula shown in Fig. 1 that tallies the stoichiometry of the atoms and groups in the chain.
  • FIG. 2 Schematic representation of embodiments of this invention in which polymeric precursors and ink compositions are deposited onto particular substrates by methods including spraying, coating, and printing, and are used to make
  • FIG. 4 Schematic representation of steps of a process to make a layered substrate in which a single layer of a polymeric precursor is deposited on a substrate.
  • FIG. 5 Schematic representation of steps of a process to make a layered substrate in which a first layer, a second layer, and a third layer are deposited on a substrate 200.
  • the optional first layer 205 can be composed of a polymeric precursor compound enriched in the quantity of a Group 11 atom.
  • the second layer 210 may be composed of a polymeric precursor compound deficient in the quantity of a Group 1 1 atom.
  • the optional third layer 215 can be highly deficient in the quantity of a Group 11 atom.
  • the third layer 215 can be composed of one or more layers of one or more In or Ga monomer compounds.
  • FIG. 6 Schematic representation of steps of a process to make a layered substrate in which a base layer, a chalcogen layer, a balance layer, and a second chalcogen layer are deposited on a substrate.
  • FIG. 7 Schematic representation of steps of a process to make a layered substrate in which a layer containing atoms of Group 13 and a chalcogen and a second layer containing atoms of Groups 11 and 13 are deposited on a substrate.
  • the second layer can optionally contain atoms of a chalcogen.
  • FIG. 8 Schematic representation of steps of a process to make a layered substrate in which a number of layers, n, are deposited on a substrate.
  • Each deposited layer can contain atoms of any combination of Groups 11, 13, and chalcogen.
  • FIG. 9 shows an embodiment of a polymeric precursor compound. As shown in Fig. 9, the structure of the compound can be represented by the formula
  • FIG. 10 shows an embodiment of a polymeric precursor compound. As shown in Fig. 10, the structure of the compound can be represented by the formula (RE) 2 B AB ABB AB AB .
  • FIG. 1 1 Fig. 1 1 shows an embodiment of a polymeric precursor compound. As shown in Fig. 1 1, the structure of the compound can be represented by the formula (RE) 2 BA(BA) n BB.
  • FIG. 12 Fig. 12 shows an embodiment of a polymeric precursor compound. As shown in Fig. 12, the structure of the compound can be represented by the formula (RE) 2 BA(BA) n B(BA) m B.
  • FIG. 13 shows an embodiment of a polymeric precursor compound. As shown in Fig. 13, the structure of the compound can be represented by the formula cyclic (BA) 4 .
  • FIG. 14 shows a plan view micrograph of a CIGS thin film absorber material.
  • the guide marker shows 1 micron length.
  • FIG. 15 shows the I-V curve of a finished solar cell embodiment.
  • the conversion efficiency was 15.5% without using any antireflective coating.
  • FIG. 16 shows a plan view micrograph of a CIGS thin film absorber material.
  • the guide marker shows 1 micron length.
  • FIG. 17 shows the I-V curve of a finished solar cell embodiment.
  • the conversion efficiency was 15.2% without using any antireflective coating.
  • FIG. 18 Fig. 18 shows a plan view micrograph of a CIGS thin film absorber material.
  • the guide marker shows 1 micron length.
  • FIG. 19 shows the I-V curve of a finished solar cell embodiment.
  • the conversion efficiency was 15.1% without using any antireflective coating.
  • This disclosure provides methods and compositions for photovoltaic absorber for photovoltaic and electrooptical devices.
  • aspects of this disclosure present solution-based processes that can be used for making solar cells having advantageously superior efficiencies for conversion of light.
  • a solution-based process of this invention can be used for CIGS materials for solar cells.
  • Processes of this invention can provide solar cell devices having a conversion efficiency of 15% to 20% or greater, measured in the absence of any antireflective coating.
  • this invention provides methods for manufacturing solar cells that do not use reactive solvents or solutions.
  • the solution-based processes herein can advantageously use only hydrocarbon solvents.
  • this disclosure provides solution-based processes for making photovoltaic solar cells that can provide a uniform film deposited on a substrate.
  • Solution-based processes of this invention advantageously provide soluble precursor components that can be deposited by various methods in a uniform layer, thereby creating superior photovoltaic absorber films.
  • Embodiments of this disclosure include solutions in which precursor compounds are dissolved that are free from particulates.
  • the polymeric precursor compounds of this invention may be dissolved in a hydrocarbon solvent.
  • solutions of this invention for making photovoltaic absorber films in which precursor compounds are dissolved can be free from compounds containing nitrogen or phosphorous atoms.
  • solutions in which the precursor compounds are dissolved can be free from amine groups or compounds containing amines.
  • the solution in which the precursor compounds are dissolved can be free from hydrazine or hydrazine derivatives.
  • this invention provides a process for making a photovoltaic absorber layer on a substrate by depositing a layer of an ink onto the substrate, where the ink contains one or more polymeric precursor compounds, and thereafter heating the substrate.
  • the polymeric precursor compounds can have the empirical formula (Cui_ x Ag x ) u (M B1 1 _ y _ t M B2 y M B3 t)((Si_ z Se z )R) w , wherein M B1 is In, M B2 is Ga, and M B3 is Al, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.6 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from alkyl groups.
  • These polymeric precursor compounds are deficient in Group 11 atoms and have a ratio of atoms of
  • Processes of this disclosure using polymeric precursor compounds that are deficient in Group 11 atoms provide surprisingly high thickness per pass when deposited on a substrate.
  • the polymeric precursor compounds are CIGS polymeric precursor compounds having the empirical formula
  • the polymeric precursor compounds are CIGS polymeric precursor compounds having the empirical formula
  • the mobility properties of the polymeric precursor compounds are surprisingly enhanced so that a higher thickness per pass can be achieved when deposited on a substrate.
  • the R groups are a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl groups, or a mixture of n-butyl and sec- butyl groups, or a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and sec -butyl and iso-butyl groups, or a mixture of n-butyl and sec -butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl and t-butyl groups, or a mixture of sec- butyl and iso-butyl and t-butyl groups.
  • the R groups are independently selected from n- pentyl, isopentyl, sec-pentyl, 1 -methylpentyl, 2-methylpentyl, 3-methylpentyl, 4- methylpentyl, 1-ethylbutyl, 2-ethylbutyl, tert-pentyl, 1 , 1 -dimethylbutyl, 1,2- dimethylbutyl, 1,3-dimethylbutyl, 2,3-dimethylbutyl, cyclopentyl, and mixtures of any of the foregoing.
  • the R groups are independently selected from n- hexyl, 1 -methylhexyl, 2 -methylhexyl, 3 -methylhexyl, 4-methylhexyl, 5 -methylhexyl, 1-ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1-n-propylbutyl, 1-iso-propylbutyl, 1-iso- propyl-2-methylpropyl, 1-methylheptyl, 2-methylheptyl, 3-methylheptyl, 4- methylheptyl, 5-methylheptyl, 6-methylheptyl, 1 -ethylhexyl, 2-ethylhexyl, 3- ethylhexyl, 4-ethylhexyl, 1-n-propylpentyl, 2-n-propylpentyl, 1-iso-propylpentyl, 2- iso-propyl, 2- is
  • the thickness of the layer made by depositing and heating the ink containing the polymeric precursor compounds that are deficient in Group 11 atoms can be from less than 100 up to 500 nanometers or more.
  • the thickness per pass of the layer made by depositing on a substrate and heating an ink formulation of this disclosure containing one or more polymeric precursor compounds that are deficient in Group 11 atoms can be from 100 to 500 nanometers, or from 100 to 400 nanometers, or from 100 to 350 nanometers, or from 100 to 300, or from 100 to 250, or from 100 to 200, or from 100 to 150.
  • the substrate may optionally have a layer of an adhesion promoter material on the electrical contact layer, wherein the adhesion promoter material is a CIGS material that is enriched in Cu so that the ratio of atoms of Cu to atoms of In and Ga, which is Cu/(In + Ga), is from 1 to 1.3, or from 1 to 1.2, or from 1 to 1.1.
  • the adhesion promoter material can have the empirical formula Cui.o-i.3(Ini- y Ga y )Se2-2.2, and be formed by depositing and converting one or more polymeric precursor compounds to provide that stoichiometry.
  • the thickness per pass is increased so that a photovoltaic absorber material can be made in fewer passes of depositing or coating a substrate, which is a significant property for manufacturing photovoltaics.
  • a photovoltaic absorber material can be made in as few as 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, or 16 passes of depositing or coating a substrate.
  • this invention provides an ink formulation for making a photovoltaic absorber material on a substrate. It has been found that by depositing a layer of an ink onto the substrate, where the ink contains one or more polymeric precursor compounds, as discussed above, as well as an additive, that surprisingly high thickness per pass can be achieved for deposition of the ink formulation on a substrate.
  • an ink for making a photovoltaic absorber material may contain one or more precursor compounds and an additive dissolved in one or more solvents.
  • the additive can be a compound having the one of the formulas AR 4 , R 3 A-AR 3 , or R 2 A-Q-AR 2 , wherein A is Si, Ge, or Sn, Q is -(CR 2 ) n -, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
  • the additive can be S1R 4 or R 3 Si-SiR 3 , wherein each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
  • the additive may be a compound having the formula ( ⁇ 3 ⁇ 4 ⁇ ) ⁇ , wherein x is 2 to 8, A is Si, Ge, or Sn, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
  • the additive may be a diorganosiloxane compound or siloxane fluid.
  • diorganosiloxane compounds include hexamethylcyclotrisiloxane D3, octamethylcyclotetrasiloxane D4, decamethylcyclopentasiloxane D5, and dodecamethylcyclohexasiloxane D6.
  • Embodiments of this invention further provide formulations of an ink wherein the additive is at a concentration of from 0.1% to 15% (v/v), or from 0.1% to 10%, or from 0.1% to 5%.
  • An ink of this disclosure can be prepared with one or more solvents selected from aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, xylene, ethers, diethyl ether, tetrahydofuran, 2-methyltetrahydofuran, siloxanes, cyclosiloxanes, silicone fluids, acetonitrile, esters, acetates, ethyl acetate, butyl acetate, acrylates, isobornyl acrylate, ketones, acetone, methyl ethyl ketone, cyclohexanone, cyclopentanone, lactams, N-methyl pyrrolidone
  • the properties of the precursor compounds are enhanced so that the deposited films of photovoltaic absorber materials can be surprisingly uniform and defect-free, even when high thickness per pass is achieved in the process for making the films.
  • the properties of the precursor compounds are enhanced so that the deposited films of photovoltaic absorber materials can be surprisingly uniform and defect-free, even when high thickness per pass is achieved in the process for making the films.
  • fewer passes of depositing or coating a substrate are needed, which is a significant enhancement for manufacturing photovoltaics.
  • a crack-free photovoltaic layer can be made with a precursor ink of this invention in a process having a thickness per pass of from 100 to 500 nanometers, or from 100 to 400 nanometers, or from 100 to 350 nanometers, or from 100 to 300 nanometers, or from 150 to 350 nanometers, or from 150 to 250 nanometers.
  • solution-based processes of this invention for making photovoltaics and solar cells include processes in which a solution is formed by dissolving precursor molecules in a solvent.
  • a precursor molecule can be a polymeric precursor molecule, a monomer precursor molecule, or other soluble molecules.
  • the solution can be deposited on a substrate in a layer.
  • the deposited of the solution may be dried on the substrate to remove solvent, leaving behind a layer or film of precursor molecules.
  • Addition of energy to the substrate, for example by heating can be used to convert the film of precursor molecules to a material film.
  • additional layers of solution may be deposited, dried, and converted to a material film of a desired thickness.
  • additional layers of solution may be deposited, dried, and converted to a material film of a different composition than other layers or films.
  • the substrate can be annealed, for example by heating, to transform the one or more material films on the substrate into a uniform photovoltaic material. Annealing can be performed in the presence of selenium or selenium vapor.
  • a solar cell can be made with the uniform photovoltaic material on the substrate by finishing steps that are described in various examples herein.
  • a solution-based process of this invention for making photovoltaics and solar cells can include a pure solution that is formed by dissolving one or more precursor molecules in a solvent.
  • the advantageously enhanced purity of the solution can be due to the complete dissolution of the precursor molecules in the solvent, without residual particles.
  • the precursor molecules can be polymeric precursor molecules or monomer precursor molecules.
  • Embodiments of this invention provide compositions which contain one or more precursors in a liquid solution.
  • a composition may contain one or more polymeric precursor compounds dissolved in a solvent.
  • the solutions of this invention may be used to make photovoltaic materials by depositing the solution onto a substrate.
  • a solution that contains one or more dissolved precursors can be referred to as an ink or ink composition.
  • an ink can contain one or more dissolved monomer precursors or polymeric precursors.
  • An ink of this disclosure can advantageously allow precise control of the stoichiometric ratios of certain atoms in the ink because the ink can contain a dissolved polymeric precursor.
  • an ink can be made by mixing a polymeric precursor with one or more carriers.
  • the ink may be a solution of the polymeric precursors in an organic carrier.
  • the ink is a solution of the polymeric precursors in an organic carrier.
  • the carrier can include one or more organic liquids or solvents.
  • a carrier may be an organic solvent.
  • An ink can be made by providing one or more monomer precursor compounds or one or more polymeric precursor compounds, or combinations thereof, and solubilizing, dissolving, or solvating the compounds with one or more carriers.
  • An ink composition can contain dissolved precursor molecules.
  • concentration of the precursors in an ink of this disclosure can be from about 0.001% to about 99% (w/w), or from about 0.001% to about 90%, or from about 0.1% to about 90%.
  • the carrier for an ink of this disclosure may be an organic liquid or solvent.
  • Examples of a carrier for an ink of this disclosure include one or more organic solvents.
  • Embodiments of this invention further provide monomer precursor compounds and polymeric precursor compounds having enhanced solubility in one or more carriers for preparing inks.
  • the solubility of a polymeric precursor compound or monomer precursor compound can be selected by variation of the nature and molecular size and weight of one or more organic functional groups attached to the compound.
  • the solubility of a polymeric precursor compound can also be selected by variation of the molecular size and weight of the polymeric precursor compound, as well as the degree of optional cross-linking of the polymeric precursor compound.
  • Examples of a carrier for a solution of this disclosure include hydrocarbons or hydrocarbon solvents.
  • Examples of a carrier for a solution of this disclosure include aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, and mixtures thereof.
  • Ink compositions include aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, and mixtures thereof.
  • Ink compositions include aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, iso
  • An ink composition of this invention may contain any of the dopants disclosed herein, or a dopant known in the art.
  • a polymeric precursor ink composition can be prepared by dissolving one or more polymeric precursors in a solvent.
  • a solvent may be heated to dissolve a polymeric precursor compound.
  • the polymeric precursors may have a concentration of from about 0.001% to about 99% (w/w), or from about 0.001% to about 90%, or from about 0.1% to about 90%, or from about 0.1% to about 50%, or from about 0.1% to about 40%, or from about 0.1% to about 30%, or from about 0.1% to about 20%, or from about 0.1% to about 10% in the solution.
  • An ink composition may further contain an additional indium-containing compound, or an additional gallium-containing compound.
  • additional indium-containing compounds include In(SeR) 3 , wherein R is alkyl or aryl.
  • additional gallium-containing compounds include Ga(SeR)3, wherein R is alkyl or aryl.
  • an ink may further contain In(Se n Bu)3 or Ga(Se n Bu)3, or mixtures thereof.
  • an ink may contain Na(ER), where E is S or Se and R is alkyl or aryl.
  • an ink may contain NaIn(ER) 4 , NaGa(ER) 4 , LiIn(ER) 4 , LiGa(ER) 4 , KIn(ER) 4 , or KGa(ER) 4 , where E is S or Se and R is alkyl or aryl.
  • an ink may contain Cu(ER).
  • R is preferably n Bu, 3 ⁇ 4u, s Bu, or Pr.
  • an ink composition may contain In(SeR)3.
  • an ink composition may contain Ga(SeR)3.
  • an ink composition may contain In(SeR)3 and Ga(SeR)3, wherein the ratio of In : Ga in the ink is 10:90, or 20:80, or 30:70, or 40:60, or 50:50, or 60:40, or 70:30, or 80:20, or 90: 10, or any integer value between those values.
  • an ink composition may contain In(SR)3 and Ga(SR)3, wherein the ratio of In to Ga in the ink is 10:90, or 20:80, or 30:70, or 40:60, or 50:50, or 60:40, or 70:30, or 80:20, or 90: 10, or any integer value between those values.
  • an ink composition may contain any of the compounds In(SeR) 3 , Ga(SeR) 3 , In(SR) 3 and Ga(SR) 3 , wherein the overall ratio of In to Ga in the ink is 10:90, or 20:80, or 30:70, or 40:60, or 50:50, or 60:40, or 70:30, or 80:20, or 90: 10, or any integer value between those values.
  • an ink composition may contain any of the monomer compounds of this disclosure, wherein the overall ratio of In to Ga in the ink is 10:90, or 20:80, or 30:70, or 40:60, or 50:50, or 60:40, or 70:30, or 80:20, or 90: 10, or any integer value between those values.
  • the viscosity of an ink of this disclosure can be from about 0.5 centipoises (cP) to about 50 cP, or from about 0.6 to about 30 cP, or from about 1 to about 15 cP, or from about 2 to about 12 cP.
  • the viscosity of an ink of this disclosure can be from about 20 cP to about 2 x 10 6 cP, or greater.
  • the viscosity of an ink of this disclosure can be from about 20 cP to about 1 x 10 6 cP, or from about 200 cP to about 200,000 cP, or from about 200 cP to about 100,000 cP, or from about 200 cP to about 40,000 cP, or from about 200 cP to about 20,000 cP.
  • the viscosity of an ink of this disclosure can be about 1 cP, or about 2 cP, or about 5 cP, or about 20 cP, or about 100 cP, or about 500 cP, or about 1,000 cP, or about 5,000 cP, or about 10,000 cP, or about 20,000 cP, or about 30,000 cP, or about 40,000 cP.
  • An ink of this disclosure may optionally further include components such as a surfactant, a thickener, a viscosity modifier, an anti-oxidant, a crystallization promoter, or an adhesion promoter.
  • a surfactant such as sodium sulfate, sodium sulfate, sodium sulfate, sodium sulfate, sodium sulfate, sodium sulfate, sodium sulfate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium bicarbonate, sodium sulfate, sodium bicarbon
  • a polymeric precursor may exist in a liquid or flowable phase under the temperature and conditions used for deposition, coating or printing.
  • this disclosure provides processes to make a photovoltaic absorber layer by forming various layers of components on a substrate and converting the components to a material such as a thin film material.
  • a component can be an element, a compound, a precursor, a monomer, a polymeric precursor, or a material composition.
  • a photovoltaic absorber layer may be fabricated using a layer of a polymeric precursor compound.
  • the polymeric precursor compound can contain all the elements needed for the photovoltaic absorber material composition.
  • a polymeric precursor compound can be deposited on a substrate and converted to a photovoltaic material.
  • polymeric precursors for photovoltaic materials are described in WO2011/017235, WO2011/017236, WO201 1/017237, and WO201 1/017238, each of which is hereby incorporated by reference in its entirety for all purposes.
  • this disclosure provides processes for making a photovoltaic material by varying the composition of components in layers on a substrate.
  • Variations in the stoichiometry of layers of components can be made by using multiple layers of different precursor compounds having different, yet fixed stoichiometry.
  • the stoichiometry of layers can be varied by using one or more polymeric precursor compounds that can have an arbitrary, predetermined stoichiometry.
  • the stoichiometry of layers of precursors on a substrate can represent a gradient of the composition of one or more elements with respect to distance from the surface of the substrate or the ordering of layers on the substrate.
  • the layers of precursors on a substrate can be converted to a material composition by applying energy to the layered substrate article.
  • Energy can be applied using heat, light, or radiation, or by applying chemical energy.
  • a layer may be converted to a material individually, before the deposition of a succeeding layer.
  • a group of layers can be converted at the same time.
  • this disclosure provides a solution to a problem in making a photovoltaic absorber layer for an optoelectronic application such as a solar cell.
  • the problem is the inability in general to precisely control the stoichiometric quantities and ratios of metal atoms and atoms of Group 13 in a process using conventional source compounds and/or elements for making a photovoltaic absorber layer.
  • This disclosure provides a range of polymeric precursors, where each precursor can be used alone to readily prepare a layer from which a photovoltaic layer or material of any arbitrary, predetermined stoichiometry can be made.
  • a polymeric precursor compound of this disclosure is one of a range of polymer chain molecules.
  • a polymeric precursor compound is a chain molecule as shown in Fig. 1.
  • Fig. 1 shows an embodiment of a CIGS polymeric precursor compound that is soluble in organic solvents.
  • the structure of the polymeric precursor compound can be represented as a polymer chain of repeating units: A, which is (M A (ER)(ER) ⁇ , and B, which is (M B (ER)(ER) ⁇ , where M A is a Group 11 atom, M B is a Group 13 atom, E is a chalcogen, and R is a functional group.
  • the structure of the polymer can be represented by the formula shown in Fig. 1 that tallies the stoichiometry of the atoms and groups in the chain.
  • a polymeric precursor of this disclosure may be used to make a photovoltaic layer or material having any arbitrary, desired stoichiometry, where the stoichiometry can be selected in advance and is therefore specifically controlled or predetermined.
  • Photovoltaic materials of this disclosure include CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS materials, including materials that are enriched or deficient in the quantity of a certain atom, where CAIGAS refers to Cu/Ag/In/Ga/Al/S/Se, and further definitions are given below.
  • the ability to select a predetermined stoichiometry in advance means that the stoichiometry is controllable.
  • embodiments of this invention may further provide optoelectronic devices and energy conversion systems.
  • the compounds can be sprayed, deposited, or printed onto substrates and formed into absorber materials and semiconductor layers.
  • Absorber materials can be the basis for optoelectronic devices and energy conversion systems.
  • solar cell devices made by the processes disclosed herein have a conversion efficiency of 10% to 20%, or 13% to 19%, or 14% to 18%, or 15% to 17%. In further embodiments, the solar cell has a conversion efficiency of 13% to 15%, or 13% to 16%, or 13% to 17%, or 13% to 18%, or 13% to 19%, or 13% to 20%.
  • a process for making a photovoltaic absorber material having a predetermined stoichiometry on a substrate may in general require providing a precursor having the predetermined stoichiometry.
  • the photovoltaic absorber material is prepared from the precursors by one of a range of processes disclosed herein.
  • the photovoltaic absorber material can retain the precise, predetermined stoichiometry of the metal atoms of the precursors.
  • the processes disclosed herein therefore allow a photovoltaic absorber material or layer having a specific target, predetermined stoichiometry to be made using precursors of this invention.
  • the precursor having the predetermined stoichiometry for making a photovoltaic absorber material can be any precursor.
  • This disclosure provides a range of precursors having predetermined stoichiometry for making semiconductor and optoelectronic materials and devices including thin film photovoltaics and various semiconductor band gap materials having a predetermined composition or stoichiometry.
  • This disclosure provides a range of novel polymeric compounds
  • compositions, materials and methods for semiconductor and optoelectronic materials and devices including thin film photovoltaics and various semiconductor band gap materials.
  • the polymeric compounds, compositions, materials and methods of this invention can provide a precursor compound for making semiconductor and optoelectronic materials, including CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS and CAIGAS absorber layers for solar cells and other devices.
  • the source precursor compounds of this invention can be used alone, without other compounds, to prepare a layer from which CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS and CAIGAS and other materials can be made.
  • Polymeric precursor compounds may also be used in a mixture with additional compounds to control stoichiometry of a layer or material.
  • This invention provides polymeric compounds and compositions for photovoltaic applications, as well as devices and systems for energy conversion, including solar cells.
  • a solar cell device of this disclosure may have a substrate 10, an electrode layer 20, an absorber layer 30, a buffer layer 40, and a transparent conductive layer (TCO) 50.
  • TCO transparent conductive layer
  • converting refers to a process, for example a heating or thermal process, which converts one or more precursor compounds into a
  • annealing refers to a process, for example a heating or thermal process, which transforms a semiconductor material from one form into another form.
  • the polymeric compounds and compositions of this disclosure include polymeric precursor compounds and polymeric precursors for materials for preparing novel semiconductor and photovoltaic materials, films, and products.
  • this disclosure provides stable polymeric precursor compounds for making and using layered materials and photovoltaics, such as for solar cells and other uses.
  • Polymeric precursors can advantageously form a thin, uniform film.
  • a polymeric precursor is an oil or liquid that can be processed and deposited in a uniform layer on a substrate.
  • This invention provides polymeric precursors that can be used neat to make a thin film, or can be processed in an ink composition for deposition on a substrate.
  • the polymeric precursors of this invention can have superior processability to form a thin film for making photovoltaic absorber layers and solar cells.
  • the structure and properties of the polymeric compounds, compositions, and materials of this invention provide advantages in making photovoltaic layers, semiconductors, and devices regardless of the morphology, architecture, or manner of fabrication of the semiconductors or devices.
  • polymeric precursor compounds of this invention are desirable for preparing semiconductor materials and compositions.
  • a polymeric precursor may have a chain structure containing two or more different metal atoms which may be bound to each other through interactions or bridges with one or more chalcogen atoms of chalcogen-containing moieties.
  • a polymeric precursor when used in a process such as deposition, coating or printing on a substrate or surface, as well as processes involving annealing, sintering, thermal pyrolysis, and other semiconductor manufacturing processes, use of the polymeric precursors can enhance the formation of a semiconductor and its properties.
  • the stoichiometry of monovalent metal atoms and Group 13 atoms can be determined and controlled.
  • the polymeric precursor compounds can maintain the desired stoichiometry.
  • the polymeric precursors of this invention can provide enhanced control of the uniformity, stoichiometry, and properties of a semiconductor material.
  • the polymeric precursors of this disclosure are superior building blocks for semiconductor materials because they may provide atomic-level control of semiconductor structure.
  • polymeric precursor compounds, compositions and methods of this disclosure may allow direct and precise control of the stoichiometric ratios of metal atoms.
  • a polymeric precursor can be used alone, without other compounds, to readily prepare a layer from which CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS and CAIGAS materials of any arbitrary stoichiometry can be made.
  • chemically and physically uniform semiconductor layers can be prepared with polymeric precursor compounds.
  • solar cells and other products can advantageously be made in processes operating at relatively low temperatures using the polymeric precursor compounds and compositions of this disclosure.
  • the polymeric precursor compounds and compositions of this disclosure can provide enhanced processability for solar cell production.
  • Certain polymeric precursor compounds and compositions of this disclosure provide the ability to be processed at relatively low temperatures, as well as the ability to use a variety of substrates including flexible polymers in solar cells.
  • Embodiments of this invention may further provide methods and compositions for introducing alkali ions at a controlled concentration into various layers and compositions of a solar cell.
  • Alkali ions can be provided in various layers and the amount of alkali ions can be precisely controlled in making a solar cell.
  • the ability to control the precise amount and location of alkali ions advantageously allows a solar cell to be made with substrates that do not contain alkali ions.
  • substrates that do not contain alkali ions.
  • glass, ceramic or metal substrates without sodium, or with low sodium, inorganic substrates, as well as polymer substrates without alkali ions can be used, among others.
  • organic-soluble sources for alkali ions can be used as a component in ink formulations for depositing various layers.
  • Using organic-soluble source compounds for alkali ions allows complete control over the concentration of alkali ions in inks for depositing layers, and for making photovoltaic absorber layers with a precisely controlled concentration of alkali ions.
  • an ink composition may advantageously be prepared to incorporate alkali metal ions.
  • an ink composition may be prepared using an amount of Na(ER), where E is S or Se and R is alkyl or aryl. R is preferably n Bu, 3 ⁇ 4u, 3 ⁇ 4u, propyl, or hexyl.
  • an ink composition may be prepared using an amount of NaIn(ER) 4 , NaGa(ER) 4 , LiIn(ER) 4 , LiGa(ER) 4 , KIn(ER) 4 , KGa(ER) 4 , or mixtures thereof, where E is S or Se and R is alkyl or aryl. R is preferably n Bu, 3 ⁇ 4u, s Bu, propyl, or hexyl. These organic-soluble compounds can be used to control the level of alkali metal ions in an ink or deposited layer.
  • sodium can be provided in an ink at a concentration range of from about 0.01 to 5 atom percent, or from about 0.01 to 2 atom percent, or from about 0.01 to 1 atom percent by dissolving the equivalent amount of
  • NaIn(Se n Bu) 4 NaGa(Se n Bu) 4 or NaSe n Bu.
  • sodium can be provided in the process for making a polymeric precursor compound so that the sodium is incorporated into the polymeric precursor compound.
  • a layered substrate can be made by depositing a layer of a polymeric precursor compound onto the substrate.
  • the layer of the polymeric precursor compound can be a single thin layer of the compound, or a plurality of layers of the compound.
  • a process to make a layered substrate can have a step of depositing a single precursor layer 105 of a single polymeric precursor on a substrate 100.
  • the average composition of the precursor layer 105 can be deficient in the quantity of a Group 1 1 atom relative to the quantity of a Group 13 atom.
  • the precursor layer 105 can be heated to form a thin film material layer (not shown).
  • the precursor layer 105 can optionally be composed of a plurality of layers of the polymeric precursor compound. Each of the plurality of layers can be heated to form a thin film material layer before the deposition of the next layer of the polymeric precursor compound.
  • a layered substrate can have a first layer deposited on a substrate, followed by deposition of a second layer, and followed by deposition of a third layer.
  • a process to make a layered substrate can have steps of depositing a first layer 205 on a substrate 200, a second layer 210, and a third layer 215.
  • the thicknesses of the layers shown in Fig. 5 is to be taken as an example, each layer can vary in thickness, and in some embodiments layer 215 can be thicker than layer 210.
  • the first layer 205 is optional, and can be composed of a single layer or a plurality of layers of one or more polymeric precursor compounds.
  • the first layer 205 may be enriched in the quantity of a Group 11 atom.
  • the first layer 205 can be composed of a Cu-enriched polymeric precursor.
  • the first layer 205 can be heated to form a thin film material layer before the deposition of the next layer.
  • the first layer 205 may be an adhesion promoting layer.
  • the second layer 210 is deposited onto the material layer formed from the first layer 205, when present, and can be composed of a plurality of layers of one or more polymeric precursor compounds.
  • the second layer 210 may be enriched in the quantity of a Group 11 atom.
  • the second layer 210 can be composed of a Cu-enriched polymeric precursor.
  • the second layer 210 can be heated to form a thin film material layer before the deposition of the next layer.
  • the third layer 215 is optional and is deposited onto the material layer formed from the second layer 210.
  • the third layer 215 can be highly deficient in the quantity of a Group 11 atom, for example, the third layer 215 can be composed of one or more layers of one or more In or Ga monomer compounds.
  • the third layer 215 can optionally be composed of a Cu-deficient polymeric precursor.
  • the third layer 215 can be heated to form a thin film material layer.
  • the second layer 210 may be formed with precursors that are highly enriched in the quantity of a Group 1 1 atom
  • the third layer 215 may be formed from monomers containing atoms of Group 13 and no Group 1 1 atoms.
  • a monomer can be M A (ER), where M A is Cu, Ag, or Au.
  • a monomer can also be M B (ER)3, where M B is Al, Ga, or In.
  • a first layer 205 may have a thickness after heating of from about 20 to 10,000 nanometers.
  • a second layer 210 may have a thickness after heating of from about 20 to 5000 nanometers.
  • a third layer 215 may have a thickness after heating of from about 20 to 2000 nanometers.
  • a second layer 210 may have a thickness after heating of 10, 20, 50, 75, 100, 125, 150, 175, 200, 225, 250, 275, 300, 350, 400, 450, 500, 750, 1000 or 1500 nanometers.
  • a third layer 215 may have a thickness after heating of 10, 20, 50, 75, 100, 125, 150, 175, 200, 225, 250, 275, 300, 350, 400, 450, 500, 750, 1000 or 1500 nanometers.
  • the roles of certain layers may be reversed, so that the second layer 210 may be deficient in the quantity of a Group 1 1 atom, for example, the second layer 210 may be composed of In or Ga monomer compounds.
  • the third layer 215 may be highly enriched in the quantity of a Group 1 1 atom.
  • each step of heating can transform any and all layers present on the substrate into a material layer.
  • the schematic diagrams in Figs. 4-8 represent the steps of a process to make a layered substrate which ultimately may be transformed into a single thin film material layer on the substrate.
  • the schematic diagrams in Figs. 4-8 do not necessarily directly represent a product material or a substrate article formed from the process.
  • a layered substrate can have a base layer deposited on a substrate, followed by deposition of an optional chalcogen layer, a balance layer, and an additional, optional chalcogen layer.
  • a process to make a layered substrate can have steps of depositing a base layer 305 on a substrate 100, an optional chalcogen layer 310, a balance layer 315, and an additional, optional chalcogen layer 320.
  • the base layer 305 can be composed of a single layer or a plurality of layers of one or more polymeric precursor compounds. Any of the layers of the base layer 305 can be heated to form a thin film material layer before the deposition of the next layer.
  • the balance layer 315 can be composed of a plurality of layers of one or more polymeric precursor compounds. Any of the layers of the balance layer 315 can be heated to form a thin film material layer before the deposition of the next layer. Any of the layers of the balance layer 315 may be deficient in the quantity of a Group 11 atom.
  • the chalcogen layers 310 and 320 can be composed of one or more layers of one or more chalcogen sources, such as a chalcogen source compound or elemental source. The chalcogen layers 310 and 320 can be heated to form a thin film material layer.
  • the base layer 305 may be deficient in the quantity of a Group 1 1 atom and the balance layer 315 may be enriched in the quantity of a Group 11 atom.
  • a base layer 305 may have a thickness of from about 10 to 10,000 nm, or from 20 to 3000 nm.
  • a balance layer 315 may have a thickness of from about 10 to 5000 nm, or from 20 to 5000 nm.
  • the order of the base layer 305 and the balance layer 315 in Fig. 6 may be reversed, so that the composition corresponding to the balance layer 315 may be adjacent to the substrate and between the substrate and a layer having the composition of the base layer 305.
  • a layered substrate can have a first layer containing atoms of Groups 1 1 and 13 and atoms of a chalcogen deposited on a substrate, followed by deposition of a second layer containing atoms of Group 13 and atoms of a chalcogen.
  • a process to make a layered substrate can have steps of depositing a first layer 405 on a substrate 400, and a second layer 410.
  • the first layer 405 can be composed of a plurality of layers of one or more polymeric precursor compounds, or any CIS or CIGS precursor compounds. Any of the layers of the first layer 405 can be heated to form a thin film material layer before the deposition of the next layer.
  • any of the layers of the first layer 405 may be enriched in the quantity of a Group 11 atom.
  • An optional chalcogen layer may be deposited on the first layer 405.
  • the optional chalcogen layer can be heated to form a thin film material layer.
  • the first layer 405 can optionally be composed of a plurality of layers of one or more AIGS, CAIGS, CIGAS, AIGAS or CAIGAS precursor compounds.
  • the second layer 410 can be composed of a single layer or a plurality of layers of one or more compounds containing atoms of Group 13 and atoms of a chalcogen. Any of the layers of the second layer 410 can be heated to form a thin film material layer before the deposition of the next layer.
  • the order of the second layer 410 and the first layer 405 in Fig. 7 may be reversed, so that the composition corresponding to the second layer 410 may be adjacent to the substrate and between the substrate and a layer having the composition of the first layer 405.
  • a layered substrate can have a number of layers, n, deposited on a substrate.
  • a process to make a layered substrate can have steps of depositing a number of layers 502, 504, 506, 508, 510, 512, and so on, up to n layers on a substrate 100.
  • Each layer 502, 504, 506, 508, 510, 512, and so on, up to n layers can be composed of a single layer or a plurality of layers. Any of the layers can be heated to form a thin film material layer before the deposition of the next layer.
  • the layers 502, 504, 506, 508, 510, 512, and so on can each be composed of one or more polymeric precursor compounds.
  • the polymeric precursor compounds can contain any combination of atoms of Groups 1 1 and 13 with arbitrarily predetermined stoichiometry. Any of the layers can be heated to form a thin film material layer before the deposition of the next layer. Any of the layers may be deficient or enriched in the quantity of a Group 1 1 atom. Some of the layers 502, 504, 506, 508, 510, 512, and so on, can be a chalcogen layer. The chalcogen layer can be heated to form a thin film material layer. In some embodiments, the layers 502, 504, 506, 508, 510, 512, and so on, are alternating layers of one or more polymeric precursor compounds and a chalcogen layer.
  • Some of the layers 502, 504, 506, 508, 510, 512, and so on may include a layer of a polymeric precursor compound between chalcogen layers. Some of the layers 502, 504, 506, 508, 510, 512, and so on, may include a layer of a polymeric precursor compound that is deficient in a Group 11 atom between layers that are enriched in a Group 1 1 atom.
  • sodium ions may be introduced into any of the layers.
  • annealing of coated substrates may be performed for increasing the grain size of the photovoltaic absorber.
  • an annealing of coated substrates can be done to increase the grain size of a CIGS photovoltaic absorber material.
  • the CIGS grain size can be increased by annealing a pre-formed Cu-deficient CIGS material in the presence of selenium. Aspects of this invention including controlling the presence and concentration of selenium during the process for making a solar cell.
  • an annealing process for coated substrates can be performed in the presence of a chalcogen, for example selenium, or selenium vapor.
  • a chalcogen for example selenium, or selenium vapor.
  • Annealing in the presence of selenium or selenium vapor can be performed at a range of times and temperatures.
  • the temperature of the photovoltaic absorber material is held at about 450 °C for 1 minute. In certain embodiments, the temperature of the photovoltaic absorber material is held at about 525 °C.
  • the time for annealing can range from 15 seconds to 60 minutes, or from 30 seconds to five minutes.
  • the temperature for annealing can range from 400 °C to 650 °C, or from 450 °C to 550 °C.
  • the annealing process can include sodium.
  • Sodium can be introduced in an ink or a photovoltaic absorber material by using an organic- soluble sodium-containing molecule.
  • a composition or step may optionally include a chalcogen layer.
  • Chalcogen can be introduced by various processes including spraying, coating, printing, and contact transfer processes, as well as an evaporation or sputtering process, a solution process, or a melt process.
  • a chalcogen layer may be deposited with a chalcogen- containing ink.
  • An ink may contain solubilized, elemental chalcogen, or a soluble chalcogen source compound such as an alkyl chalcogenide.
  • chalcogen may also be added to an ink containing metal atoms which is used to form a metal-containing layer, as in any one of Figs. 4- 8.
  • Chalcogen may be added to an ink containing metal atoms by dissolving a chalcogen source compound or elemental chalcogen in a solvent and adding a portion of the solvent to the ink containing metal atoms.
  • Chalcogen may be added to an ink containing metal atoms by dissolving a chalcogen source compound or elemental chalcogen in the ink containing metal atoms.
  • chalcogen source compounds include organoselenides, RSeR, RSeSeR, RSeSeSeR, and R(Se) n R where R is alkyl.
  • a chalcogen source compound may be irradiated with ultraviolet light to provide selenium. Irradiation of a selenium source compound may be done in a solution, or in an ink. Irradiation of a chalcogen source compound may also be done after deposition of the compound on a substrate.
  • composition or material may optionally be subjected to a step of sulfurization or selenization.
  • Selenization may be carried out with elemental selenium or Se vapor.
  • Sulfurization may be carried out with elemental sulfur.
  • Sulfurization with I3 ⁇ 4S or selenization with H 2 Se may be carried out by using pure H 2 S or H 2 Se, respectively, or may be done by dilution in nitrogen.
  • a sulfurization or selenization step can be done at any temperature from about 200 °C to about 600 °C, or from about 200 °C to about 650 °C, or at temperatures below 200 °C.
  • One or more steps of sulfurization and selenization may be performed concurrently, or sequentially.
  • sulfurizing agents include hydrogen sulfide, hydrogen sulfide diluted with hydrogen, elemental sulfur, sulfur powder, carbon disulfide, alkyl polysulfides, dimethyl sulfide, dimethyl disulfide, and mixtures thereof.
  • selenizing agents include hydrogen selenide, hydrogen selenide diluted with hydrogen, elemental selenium, selenium powder, carbon diselenide, alkyl polyselenides, dimethyl selenide, dimethyl diselenide, and mixtures thereof.
  • Polymeric precursors include hydrogen selenide, hydrogen selenide diluted with hydrogen, elemental selenium, selenium powder, carbon diselenide, alkyl polyselenides, dimethyl selenide, dimethyl diselenide, and mixtures thereof.
  • This disclosure provides a range of polymeric precursor compounds having two or more different metal atoms and chalcogen atoms.
  • a polymeric precursor compound may contain metal certain atoms and atoms of Group 13. Any of these atoms may be bonded to one or more atoms selected from atoms of Group 15, S, Se, and Te, as well as one or more ligands.
  • a polymeric precursor compound may be a neutral compound, or an ionic form, or have a charged complex or counterion.
  • an ionic form of a polymeric precursor compound may contain a divalent metal atom, or a divalent metal atom as a counterion.
  • a polymeric precursor compound may contain atoms selected from the transition metals of Group 3 through Group 12, B, Al, Ga, In, Tl, Si, Ge, Sn, Pb, As, Sb, and Bi. Any of these atoms may be bonded to one or more atoms selected from atoms of Group 15, S, Se, and Te, as well as one or more ligands.
  • a polymeric precursor compound may contain atoms selected from Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Hg, B, Al, Ga, In, Tl, Si, Ge, Sn, Pb, and Bi. Any of these atoms may be bonded to one or more atoms selected from atoms of Group 15, S, Se, and Te, as well as one or more ligands.
  • a polymeric precursor compound may contain atoms selected from Cu, Ag, Zn, Al, Ga, In, Tl, Si, Ge, Sn, and Pb. Any of these atoms may be bonded to one or more atoms selected from atoms of Group 15, S, Se, and Te, as well as one or more ligands.
  • a polymeric precursor compound may contain atoms selected from Cu, Ag, Zn, Al, Ga, In, Tl, Si, Ge, Sn, and Pb. Any of these atoms may be bonded to one or more chalcogen atoms, as well as one or more ligands. In some variations, a polymeric precursor compound may contain atoms selected from Cu, Ag, In, Ga, and Al. Any of these atoms may be bonded to one or more atoms selected from S, Se, and Te, as well as one or more ligands.
  • Polymeric precursor structure and properties MPP
  • a polymeric precursor compound of this disclosure is stable at ambient temperatures.
  • Polymeric precursors can be used for making layered materials, optoelectronic materials, and devices.
  • Using polymeric precursors advantageously allows control of the stoichiometry, structure, and ratios of various atoms in a material, layer, or semiconductor.
  • Polymeric precursor compounds of this invention may be solids, solids with low melting temperatures, semisolids, flowable solids, gums, or rubber-like solids, oily substances, or liquids at ambient temperatures, or temperatures moderately elevated from ambient.
  • Embodiments of this disclosure that are fluids at temperatures moderately elevated from ambient can provide superior processability for production of solar cells and other products, as well as the enhanced ability to be processed on a variety of substrates including flexible substrates.
  • a polymeric precursor compound can be processed through the application of heat, light, kinetic, mechanical or other energy to be converted to a material, including a semiconductor material. In these processes, a polymeric precursor compound undergoes a transition to become a material.
  • the conversion of a polymeric precursor compound to a material can be done in processes known in the art, as well as the novel processes of this disclosure.
  • Embodiments of this invention may further provide processes for making optoelectronic materials.
  • the compound can be deposited, sprayed, or printed onto a substrate by various means. Conversion of the polymeric precursor compound to a material can be done during or after the process of depositing, spraying, or printing the compound onto the substrate.
  • a polymeric precursor compound of this disclosure may have a transition temperature below about 400 °C, or below about 300 °C, or below about 280 °C, or below about 260 °C, or below about 240 °C, or below about 220 °C, or below about 200 °C.
  • polymeric precursors of this disclosure include molecules that are processable in a flowable form at temperatures below about 100 °C.
  • a polymeric precursor can be fluid, liquid, flowable, flowable melt, or semisolid at relatively low temperatures and can be processed as a neat solid, semisolid, neat flowable liquid or melt, flowable solid, gum, rubber-like solid, oily substance, or liquid.
  • a polymeric precursor is processable as a flowable liquid or melt at a temperature below about 200 °C, or below about 180 °C, or below about 160 °C, or below about 140 °C, or below about 120 °C, or below about 100 °C, or below about 80 °C, or below about 60 °C, or below about 40 °C.
  • a polymeric precursor compound of this invention can be crystalline or amorphous, and can be soluble in various non-aqueous solvents.
  • a polymeric precursor compound may contain ligands, or ligand fragments, or portions of ligands that can be removed under mild conditions, at relatively low temperatures, and therefore provide a facile route to convert the polymeric precursor to a material or semiconductor.
  • the ligands, or some atoms of the ligands may be removable in various processes, including certain methods for depositing, spraying, and printing, as well as by application of energy.
  • This invention provides a range of polymeric precursor structures, compositions, and molecules having two or more different metal atoms.
  • a polymeric precursor compound contains atoms M B of
  • Group 13 selected from Al, Ga, In, Tl and any combination thereof.
  • the atoms M B may be any combination of atoms of Al, Ga, In, and Tl.
  • the atoms M B may be all of the same kind, or may be combinations of any two, or three, or four of the atoms of Al, Ga, In, and Tl.
  • the atoms M B may be a combination of any two of the atoms of Al, Ga, In, and Tl, for example, a combination of In and Ga,
  • the atoms M B may be a combination of In and Ga.
  • These polymeric precursor compounds further contain monovalent metal atoms M A selected from the transition metals of Group 3 through Group 12, as described above.
  • the atoms M A may be any combination of atoms of Cu, Ag, and Au.
  • the polymeric precursors of this disclosure can be considered inorganic polymers or coordination polymers.
  • polymeric precursors of this disclosure may be represented in different ways, using different formulas to describe the same structure.
  • a polymeric precursor of this disclosure may be a distribution of polymer molecules or chains.
  • the distribution may encompass molecules or chains having a range of chain lengths or molecular sizes.
  • a polymeric precursor can be a mixture of polymers, polymer molecules or chains.
  • the distribution of a polymeric precursor can be centered or weighted about a particular molecular weight or chain mass.
  • Embodiments of this invention further provide polymeric precursors that can be described as AB alternating addition copolymers.
  • the AB alternating addition copolymer is in general composed of repeat units A and B.
  • the repeat units A and B are each derived from a monomer.
  • the repeat units A and B may also be referred to as being monomers, although the empirical formula of monomer A is different from the empirical formula of repeat unit A.
  • the monomer for M A can be M A (ER), where M A is as described above.
  • the monomer for M B can be M B (ER)3, where M B is Al, Ga, In, or a combination thereof.
  • monomers of A link to monomers of B to provide a polymer chain, whether linear, cyclic, or branched, or of any other shape, that has repeat units A, each having the formula ⁇ M A (ER)2 ⁇ , and repeat units B, each having the formula ⁇ M B (ER)2 ⁇ .
  • the repeat units A and B may appear in alternating order in the chain, for example, " ⁇ .
  • a polymeric precursor may have different atoms M B selected from Al, Ga, In, or a combination thereof, where the different atoms appear in random order in the structure.
  • the polymeric precursor compounds of this invention may be made with any desired stoichiometry regarding the number of different metal atoms and Group 13 atoms, and their respective stoichiometric level or ratio.
  • the stoichiometry of a polymeric precursor compound may be controlled through the concentrations of monomers, or repeating units in the polymer chains of the precursors.
  • a polymeric precursor compound may be made with any desired stoichiometry regarding the number of different metal atoms and atoms of Group 13 and their respective stoichiometric levels or ratios.
  • this disclosure provides polymeric precursors which are inorganic AB alternating addition copolymers having one of the following Formulas 1 through 13:
  • Formulas 1 and 2 describe ionic forms that have a counterion or counterions not shown.
  • Examples of counterions include alkali metal ions, Na, Li, and K.
  • RE-B(AB) n and RE-(BA) n B may describe stable molecules under certain conditions.
  • a polymeric precursor compound of Formula 4 is shown in Fig. 9.
  • the structure of the compound can be represented by the formula (RE) 2 BABABB, wherein A is the repeat unit ⁇ M A (ER) 2 ⁇ , B is the repeat unit ⁇ M B (ER) 2 ⁇ , E is a chalcogen, and R is a functional group defined below.
  • an embodiment of a polymeric precursor compound of Formula 5 is shown in Fig. 10. As shown in Fig.
  • the structure of the compound can be represented by the formula (RE) 2 BABABBABAB, wherein A is the repeat unit ⁇ M A (ER) 2 ⁇ , B is the repeat unit ⁇ M B (ER) 2 ⁇ , E is a chalcogen, and R is a functional group defined below.
  • a polymeric precursor compound of Formula 6 is shown in Fig. 1 1.
  • the structure of the compound can be represented by the formula (RE) 2 BA(BA) n BB, wherein A is the repeat unit ⁇ M A (ER) 2 ⁇ , B is the repeat unit ⁇ M B (ER) 2 ⁇ , E is a chalcogen, and R is a functional group defined below.
  • a polymeric precursor compound of Formula 8 is shown in Fig. 12.
  • the structure of the compound can be represented by the formula (RE) 2 BA(BA) n B(BA) m B, wherein A is the repeat unit ⁇ M A (ER) 2 ⁇ , B is the repeat unit ⁇ M B (ER) 2 ⁇ , E is a chalcogen, and R is a functional group defined below.
  • a polymeric precursor compound of Formula 10 is shown in Fig. 13.
  • the structure of the compound can be represented by the formula cycllc (BA)4, wherein A is the repeat unit ⁇ M A (ER) 2 ⁇ , B is the repeat unit ⁇ M B (ER) 2 ⁇ , E is a chalcogen, and R is a functional group defined below.
  • a polymeric precursor having one of Formulas 1-8 and 11-13 may be of any length or molecular size.
  • the values of n and m can be one (1) or more.
  • the values of n and m are 2 or more, or 3 or more, or 4 or more, or 5 or more, or 6 or more, or 7 or more, or 8 or more, or 9 or more, or 10 or more.
  • n and m are independently from 2 to about one million, or from 2 to about 100,000, or from 2 to about 10,000, or from 2 to about 5000, or from 2 to about 1000, or from 2 to about 500, or from 2 to about 100, or from 2 to about 50.
  • a cyclic polymeric precursor having one of Formulas 9 or 10 may be of any molecular size.
  • the value of n may be two (2) or more.
  • the values of n and m are 2 or more, or 3 or more, or 4 or more, or 5 or more, or 6 or more, or 7 or more, or 8 or more, or 9 or more, or 10 or more.
  • n is from 2 to about 50, or from 2 to about 20, or from 2 to about 16, or from 2 to about 14, or from 2 to about 12, or from 2 to about 10, or from 2 to about 8.
  • the molecular weight of a polymeric precursor compound can be from about 1000 to 50,000, or from about 10,000 to 100,000, or from about 5000 to 500,000, or greater.
  • the repeat units ⁇ M B (ER)2 ⁇ and ⁇ M A (ER)2 ⁇ may be considered "handed" because the metal atom M A and the Group 13 atom M B appear on the left, while the chalcogen atom E appears to the right side.
  • a linear terminated chain will in general require an additional chalcogen group or groups on the left terminus, as in Formulas 1-8 and 11-13, to complete the structure.
  • a cyclic chain, as described by Formulas 9 and 10, does not require an additional chalcogen group or groups for termination.
  • structures of Formulas 1-8 and 1 1-13, where n and m are one (1) may be described as adducts.
  • adducts include (RE) 2 -BBAB, (RE) 2 -BABB, and (RE) 2 -BABBAB.
  • a polymeric precursor may include a structure that is an AABB alternating block copolymer.
  • a polymeric precursor or portions of a precursor structure may contain one or more consecutive repeat units ⁇ AABB ⁇ .
  • a polymeric precursor having an AABB alternating block copolymer may be represented by Formula 11 above.
  • this disclosure provides polymeric precursors which are inorganic AB alternating addition copolymers having the repeat units of Formula 14
  • this invention provides polymeric precursors having a number n of the repeat units of Formula 14, where n may be 1 or more, or 2 or more, or 3 or more, or 4 or more, or 5 or more, or 6 or more, or 7 or more, or 8 or more, or 9 or more, or 10 or more, or 1 1 or more, or 12 or more.
  • the AB copolymer of Formula 14 may also be represented as (AB) n or (BA) n , which represents a polymer of any chain length. Another way to represent certain AB copolymers is the formula••• ⁇ .
  • this invention provides polymeric precursors that may be represented by Formula 15
  • Formula 15 where atoms M and M are the same or different atoms of Group 13 selected from Al, Ga, In, Tl, or a combination thereof, E is S, Se, or Te, and p is one (1) or more.
  • this invention provides polymeric precursors which may be represented by Formula 16
  • this disclosure provides inorganic AB alternating copolymers which may be represented by Formula 17 AB 1 AB 2 AB 3
  • B , B , and B are repeat units containing atoms M , M , and M , respectively, which are atoms of Al, Ga, In, Tl or a combination thereof.
  • the "representative constitutional chain unit” refers to the repeating unit of the polymer chain.
  • the number and appearance of electrons, ligands, or R groups in a representative constitutional chain repeating unit does not necessarily reflect the oxidation state of the metal atom.
  • the chain repeating unit A which is ⁇ M A (ER) 2 ⁇ , arises from the monomer M A (ER), where M A is a metal atom of monovalent oxidation state 1 (I or one) as described above, or any combination of Cu, Ag and Au. It is to be understood that the repeating unit exists in the polymer chain bonded to two other repeating units, or to a repeating unit and a chain terminating unit.
  • the chain repeating unit B which is ⁇ M B (ER)2 ⁇ , arises from the monomer M B (ER)3, where M B is a Group 13 atom of trivalent oxidation state 3 (III or three) selected from Al, Ga, In, Tl, and any combination thereof, including where any one or more of those atoms are not present.
  • monomer M A (ER), and monomer M B (ER)3, combine to form an AB repeating unit, which is ⁇ M A (ER) 2 M B (ER) 2 ⁇ .
  • this disclosure provides AB alternating copolymers which may also be alternating with respect to M A or M B .
  • a polymeric precursor that is alternating with respect to M A may contain chain regions having alternating atoms M A1 and M A2 .
  • a polymeric precursor that is alternating with respect to M B may contain chain regions having alternating atoms M B1 and M B2 .
  • this disclosure provides AB alternating block copolymers which may contain one or more blocks of n repeat units, represented as (AB 1 ) ! , or where the block of repeat units contains only one kind of atom M B1 selected from Group 13.
  • a block may also be a repeat unit represented as or ( A l ) n , where the block of repeat units contains only one kind of atom M A1 .
  • a polymeric precursor of this disclosure may contain one or more blocks of repeat units having different Group 13 atoms in each block, or different atoms M A in each block.
  • a polymeric precursor may have one of the following formulas:
  • M B1 , M B2 and M B3 are atoms of Group 13, each different from the other, independently selected from Al, In, Ga, Tl, or a combination thereof, and where A 1 , A 2 and A 3 represent repeat units ⁇ M A1 (ER) 2 ⁇ , ⁇ M A2 (ER) 2 ⁇ , and ⁇ M A3 (ER) 2 ⁇ , respectively, where M A1 , M A2 and M A3 are each different from the other and are identified as described above for M A .
  • n, m, and p may be 2 or more, or 3 or more, or 4 or more, or 5 or more, or 6 or more, or 7 or more, or 8 or more, or 9 or more, or 10 or more, or 11 or more, or 12 or more.
  • an M B monomer can contain a chelating group - ERE-, for example, having the formula M B (ERE).
  • a monomer may exist in a dimeric form under ambient conditions, or a trimeric or higher form, and can be used as a reagent in such forms. It is understood that the term monomer would refer to all such forms, whether found under ambient conditions, or found during the process for synthesizing a polymeric precursor from the monomer.
  • the formulas M A (ER) and M B (ER)3, for example, should be taken to encompass the monomer in such dimeric or higher forms, if any.
  • a monomer in a dimeric or higher form, when used as a reagent can provide the monomer form.
  • polymeric precursors of this invention obtained by reacting monomers M A (ER) and M B (ER) 3 can be advantageously highly soluble in organic solvent, whereas one or more of the monomers may have been insoluble.
  • polymer and “polymeric” refer to a polymerized moiety, a polymerized monomer, a repeating chain made of repeating units, or a polymer chain or polymer molecule.
  • a polymer or polymer chain may be defined by recitation of its repeating unit or units, and may have various shapes or connectivities such as linear, branched, cyclic, and dendrimeric.
  • polymer and polymeric include homopolymers, copolymers, block copolymers, alternating polymers, terpolymers, polymers containing any number of different monomers, oligomers, networks, two-dimensional networks, three-dimensional networks, crosslinked polymers, short and long chains, high and low molecular weight polymer chains, macromolecules, and other forms of repeating structures such as dendrimers.
  • Polymers include those having linear, branched and cyclic polymer chains, and polymers having long or short branches.
  • polymeric component refers to a component of a composition, where the component is a polymer, or may form a polymer by polymerization.
  • the term polymeric component includes a polymerizable monomer or polymerizable molecule.
  • a polymeric component may have any combination of the monomers or polymers which make up any of the example polymers described herein, or may be a blend of polymers.
  • Embodiments of this invention may further provide polymeric precursors having polymer chain structures with repeating units.
  • the stoichiometry of these polymeric precursors may be precisely controlled to provide accurate levels of any desired arbitrary ratio of particular atoms.
  • Precursor compounds having controlled stoichiometry can be used to make bulk materials, layers, and semiconductor materials having controlled stoichiometry.
  • precisely controlling the stoichiometry of a polymeric precursor may be achieved by controlling the stoichiometry of the reagents, reactants, monomers or compounds used to prepare the polymeric precursor.
  • the group R in the formulas above, or a portion thereof may be a good leaving group in relation to a transition of the polymeric precursor compound at elevated temperatures or upon application of energy.
  • the functional groups R in the formulas above and in Table 1 may each be the same or different from the other and are groups attached through a carbon or non- carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • the groups R are each the same or different from the other and are alkyl groups attached through a carbon atom.
  • the monomer for M B can be represented as M B (ER 1 )3, and the monomer for M A can be represented as M A (ER 2 ), where R 1 and R 2 are the same or different and are groups attached through a carbon or non-carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • the groups R 1 and R 2 are each the same or different from the other and are alkyl groups attached through a carbon atom.
  • the monomer for M B may be M B (ER 1 )(ER 2 )2, where R 1 and R 2 are different and are groups attached through a carbon or non-carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • the groups R 1 and R 2 , of M B (ER 1 )(ER 2 )2, are different and are alkyl groups attached through a carbon atom.
  • polymeric precursor compounds advantageously do not contain a phosphine ligand, or a ligand or attached compound containing phosphorus, arsenic, or antimony, or a halogen ligand.
  • the groups R may independently be (Cl-22)alkyl groups.
  • the alkyl group may be a (Cl)alkyl (methyl), or a (C2)alkyl (ethyl), or a (C3)alkyl, or a (C4)alkyl, or a (C5)alkyl, or a (C6)alkyl, or a (C7)alkyl, or a (C8)alkyl, or a (C9)alkyl, or a (C 10)alkyl, or a (C 11 )alkyl, or a
  • (C12)alkyl or a (C13)alkyl, or a (C14)alkyl, or a (C15)alkyl, or a (C16)alkyl, or a (C17)alkyl, or a (C18)alkyl, or a (C19)alkyl, or a (C20)alkyl, or a (C21)alkyl, or a (C22)alkyl.
  • the groups R may independently be (Cl-12)alkyl groups.
  • the alkyl group may be a (Cl)alkyl (methyl), or a (C2)alkyl (ethyl), or a (C3)alkyl, or a (C4)alkyl, or a (C5)alkyl, or a (C6)alkyl, or a (C7)alkyl, or a (C8)alkyl, or a (C9)alkyl, or a (ClO)alkyl, or a (CI l)alkyl, or a (C12)alkyl.
  • the groups R may independently be (Cl-6)alkyl groups.
  • the alkyl group may be a (Cl)alkyl (methyl), or a (C2)alkyl (ethyl), or a (C3)alkyl, or a (C4)alkyl, or a (C5)alkyl, or a (C6)alkyl.
  • a polymeric precursor compound may be crystalline, or non-crystalline.
  • a polymeric precursor may be a compound comprising repeating units (M B (ER)(ER) ⁇ and (M A (ER)(ER) ⁇ , wherein M A is a monovalent metal atom selected from Cu, Au, Ag, or a combination thereof, M is an atom of Group 13, E is S, Se, or Te, and R is independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • the atoms M B in the repeating units (M B (ER)(ER) ⁇ are randomly selected from atoms of Group 13.
  • M A is Cu, Ag, or a mixture of Cu and Ag, and the atoms M B are selected from indium and gallium.
  • E may be only selenium in a polymeric precursor, and the groups R may be independently selected, for each occurrence, from (Cl-6)alkyl.
  • Embodiments of this invention may further provide polymeric precursors that are linear, branched, cyclic, or a mixture of any of the foregoing.
  • Some polymeric precursors may be a flowable liquid or melt at a temperature below about 100 °C.
  • a polymeric precursor may contain n repeating units (M B (ER)(ER) ⁇ and n repeating units (M A (ER)(ER) ⁇ , wherein n is one or more, or n is two or more, or n is three or more, or n is four or more, or n is eight or more.
  • n is from one to ten thousand, or n is from one to one thousand, or from one to five hundred, or from one to one hundred, or from one to fifty.
  • the molecular size of a polymeric precursor may be from about 500 Daltons to about 3000 kDa, or from about 500 Daltons to about 1000 kDa, or from about 500 Daltons to about 100 kDa, or from about 500 Daltons to about 50 kDa, or from about 500 Daltons to about 10 kDa. In some embodiments, the molecular size of a polymeric precursor may be greater than about 3000 kDa.
  • the repeating units (M B (ER)(ER) ⁇ and (M A (ER)(ER) ⁇ may be alternating.
  • a polymeric precursor may be described by the formula (AB) n , wherein A is the repeat unit (M A (ER)(ER) ⁇ , B is the repeat unit (M B (ER)(ER) ⁇ , n is one or more, or n is two or more, and R is independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • a polymeric precursor may have any one of the formulas (RE)2-BB(AB) n , (RE) 2 -B(AB) n B, (RE) 2 -B(AB) n B(AB) m , (RE) 2 -(BA) n BB, (RE) 2 -B(BA) n B,
  • a polymeric precursor may be a block copolymer containing one or more blocks of repeat units, wherein each block contains only one kind of atom M B .
  • a precursor compound of this disclosure may be deficient in the quantity of a Group 1 1 atom. In some embodiments, a precursor compound is deficient in the quantity of Cu.
  • a precursor compound may have the empirical formula
  • v is one, and u is 0.6, or 0.70, or 0.71, or 0.72, or 0.73, or 0.74, or 0.75, or 0.76, or 0.77, or 0.78, or 0.79, or 0.80, or 0.81, or 0.82, or 0.83, or 0.84, or 0.85, or 0.86, or 0.87, or 0.88, or 0.89, or 0.90, or 0.91, or 0.92, or 0.93, or 0.94, or 0.95, or 0.96, or 0.97, or 0.98, or 0.99.
  • y is 0.001, or 0.002.
  • t is 0.001, or 0.002.
  • the sum of y plus t is 0.001, or 0.002, or 0.003, or 0.004.
  • a CIGS absorber material for a finished solar cell may be deficient in Cu.
  • a CIGS absorber material for a finished solar cell may have a ratio of Cu to atoms of Group 13 of 0.85 to 0.95.
  • a precursor compound of this disclosure may be enriched in the quantity of a Group 1 1 atom. In some embodiments, a precursor compound is enriched in the quantity of Cu.
  • a precursor compound may have the empirical formula
  • v is one, and u is 1.1, or 1.2, or 1.3, or 1.4, or 1.5, or 1.6, or 1.7, or 1.8, or 1.9, or 2.0, or 2.1, or 2.2, or 2.3, or 2.4, or 2.5, or 2.6, or 2.7, or 2.8, or 2.9, or 3.0, or 3.1, or 3.2, or 3.3, or 3.4, or 3.5, or 3.6, or 3.7, or 3.8, or 3.9, or 4.0.
  • y is 0.001, or 0.002.
  • t is 0.001, or 0.002.
  • the sum of y plus t is 0.001, or 0.002, or 0.003, or 0.004.
  • a precursor compound may have the empirical formula
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.4, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.5, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.6, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.7, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.8, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.9, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu)u(M B1 i_ y _ t M B2 y M B3 t)v((Si- z Se z )R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.0, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.1, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.2, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.3, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.4, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.5, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.6, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.7, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.8, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu)u(M B1 i_ y _ t M B2 y M B3 t) v ((Si- z Se z )R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.9, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.0, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.1, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.2, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.3, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.4, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.5, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.6, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.7, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.8, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.9, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula (Cu)u(M B1 i_ y _ t M B2 y M B3 t)v((Si- z Se z )R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 4.0, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • a precursor compound may have the empirical formula
  • v is one, and u is 1.1, or 1.2, or 1.3, or 1.4, or 1.5, or 1.6, or 1.7, or 1.8, or 1.9, or 2.0, or 2.1, or 2.2, or 2.3, or 2.4, or 2.5, or 2.6, or 2.7, or 2.8, or 2.9, or 3.0, or 3.1, or 3.2, or 3.3, or 3.4, or 3.5, or 3.6, or 3.7, or 3.8, or 3.9, or 4.0.
  • y is 0.001, or 0.002.
  • t is 0.001, or 0.002.
  • the sum of y plus t is 0.001, or 0.002, or 0.003, or 0.004.
  • x is 0.005, 0.01, 0.02, 0.03, 0.04, 0.05, 0.1, or 0.15.
  • a precursor compound of this disclosure may be a combination of u*(l-x) equivalents of M A1 (ER), u*x equivalents of M A2 (ER), v*(l-y-t) equivalents of M B1 (ER) 3 , v*y equivalents of M B2 (ER) 3 , v*t equivalents of M B3 (ER) 3 , wherein M A1 is Cu and M A2 is Ag, M B1 , M B2 and M B3 are different atoms of Group 13, wherein the compound has the empirical formula (M A1 1 _ x M A2 x ) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from
  • a precursor compound can have the stoichiometry useful to prepare CAIGAS, CAIGS, CIGAS, CIGS, AIGAS and AIGS materials, including materials deficient or enriched in the quantity of a Group 11 atom, for example materials deficient or enriched in Cu.
  • x is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
  • a precursor compound can contain S, Se and Te.
  • a precursor compound can be a combination of w*(l-z) equivalents of M A1 (ER 1 ), w*z equivalents of M A2 (ER 2 ), x equivalents of M B1 (ER 3 ) 3 , y equivalents of M B2 (ER 4 ) 3 , t equivalents of M B3 (ER 5 ) 3 , wherein M A1 is Cu and M A2 is Ag, M , M and M are different atoms of Group 13, wherein the compound has the empirical formula (Cui_ z Ag z ) w In x Ga y Alt(ER 1 ) w( i_ z) (ER 2 ) (w*z) (ER 3 )3 X (ER 4 ) 3y (ER 5 )3t, w is from 0.5 to 1.5, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from
  • a precursor compound can have the stoichiometry useful to prepare CAIGAS, CAIGS, CIGAS, CIGS, AIGAS and AIGS materials, including materials deficient or enriched in the quantity of a Group 11 atom.
  • z is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • a precursor compound of this disclosure may be a combination of x equivalents of M A1 (ER), v*(l-y-t) equivalents of M B1 (ER)3, v*y equivalents of M B2 (ER) 3 , v*t equivalents of M B3 (ER) 3 , wherein M A1 is Cu, M B1 , M B2 and M B3 are different atoms of Group 13, wherein the compound has the empirical formula M A1 x (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein x is from 0.5 to 1.5, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroary
  • a precursor compound can have the stoichiometry useful to prepare CIGAS and CIGS materials, including materials deficient or enriched in the quantity of a Group 11 atom.
  • t is from 0.001 to 0.999.
  • a precursor compound can be a combination of z equivalents of M A1 (ER 1 ), x equivalents of M B1 (ER 3 ) 3 , y equivalents of M B2 (ER 4 ) 3 , t equivalents of M B3 (ER 5 ) 3 , wherein M A1 is Cu, M B1 , M B2 and M B3 are different atoms of Group 13, wherein the compound has the empirical formula
  • z is from 0.5 to 1.5
  • x is from 0 to 1
  • y is from 0 to 1
  • t is from 0 to 1
  • x plus y plus t is one
  • R 1 , R 2 , R 3 , R 4 and R 5 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • a precursor compound can have the stoichiometry useful to prepare CIGAS and CIGS materials, including materials deficient in the quantity of a Group 11 atom.
  • t is from 0.001 to 0.999.
  • a precursor compound of this disclosure may be a combination of u*(l-x) equivalents of M A1 (ER), u*x equivalents of M A2 (ER), v*(l-y) equivalents of
  • M B1 (ER) 3 v*y equivalents of M B2 (ER) 3 , wherein M A1 is Cu and M A2 is Ag, M B1 and M B2 are different atoms of Group 13, wherein the compound has the empirical formula (M A1 1 _ x M A2 x ) u (M B1 1 _ y M B2 y ) v ((Si_ z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • a precursor compound can have the stoichiometry useful to prepare CAIGS, CIGS and AIGS materials, including materials deficient in the quantity of a Group 11 atom.
  • x is from 0.001 to 0.999.
  • a precursor compound can be a combination of w*(l-z) equivalents of M A1 (ER 1 ), w*z equivalents of M A2 (ER 2 ), x equivalents of M B1 (ER 3 ) 3 , y equivalents of M B2 (ER 4 ) 3 , wherein M A1 is Cu and M A2 is Ag, M B1 and M B2 are different atoms of Group 13, wherein the compound has the empirical formula
  • a precursor compound can have the stoichiometry useful to prepare CAIGS, CIGS and AIGS materials, including materials deficient or enriched in the quantity of a Group 1 1 atom.
  • z is from 0.001 to 0.999.
  • a precursor compound of this disclosure may be a combination of x equivalents of M A1 (ER), v*(l-y) equivalents of M B1 (ER) 3 , v*y equivalents of M B2 (ER) 3 , wherein M A1 is Cu, M B1 and M B2 are different atoms of Group 13, wherein the compound has the empirical formula M A1 x (M B1 i_ y M B2 y ) v ((Si- z Se z )R) w , wherein x is from 0.5 to 1.5, y is from 0 to 1, z is from 0 to 1, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • a precursor compound can have the stoichiometry useful to prepare CIGS materials, including
  • a precursor compound can be a combination of z equivalents of M A1 (ER 1 ), x equivalents of M B1 (ER 2 ) 3 , y equivalents of M B2 (ER 3 ) 3 , wherein M is Cu, M and M are different atoms of Group 13, wherein the compound has the empirical formula Cu z In x Ga y (ER 1 ) z (ER 2 )3 X (ER 3 )3 y , z is from 0.5 to 1.5, x is from 0 to 1, y is from 0 to 1, x plus y is one, and wherein R 1 , R 2 , R 3 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • a precursor compound can have the stoichiometry useful to prepare CIGS materials, including materials deficient or enriched in the quantity
  • This disclosure provides a range of polymeric precursor compounds made by reacting a first monomer M B (ER 1 )3 with a second monomer M A (ER 2 ), where M A is a monovalent metal atom, M B is an atom of Group 13, E is S, Se, or Te, and R 1 and R 2 are the same or different and are independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
  • the compounds may contain n repeating units (M B (ER)(ER) ⁇ and n repeating units (M A (ER)(ER) ⁇ , wherein n is one or more, or n is two or more, and R is defined, for each occurrence, the same as R 1 and R 2 .
  • a polymeric precursor molecule can be represented by the formula
  • ⁇ Cu(Se n Bu)2(Ino.75,Ga 0 .25)(Se n Bu)2 ⁇ is composed of repeating units, where the repeating units can appear in any order, and 75% of the repeating units contain one indium atom and 25% contain one gallium atom.
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas: ⁇ Ag(Se sec Bu)4ln ⁇ ,
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas: ⁇ Cu(S t Bu)(S 1 Pr)In(S 1 Pr) 2 ⁇ ; ⁇ CuCS'BuhlnCS h ⁇ ; ⁇ CuCS l ⁇ Bu S ⁇ uh ⁇ ; ⁇ CuCSe'BuXSe' lInCSe' h ⁇ ; ⁇ CuCS'BuXSe'Bu Se'Buh ⁇ ; ⁇ CuCSe'BuXS lGaCS h ⁇ ;
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas: ⁇ Cu(Se s Bu) 2 In(Se s Bu) 2 ⁇ ;
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
  • Embodiments of this invention provide a family of polymeric precursor molecules and compositions which can be synthesized from a compound containing an atom M B of Group 13 selected from Al, Ga, In, Tl, or a combination thereof, and a compound containing a monovalent atom M A .
  • polymeric precursor compositions which can be transformed into semiconductor materials and semiconductors.
  • the polymeric precursor compositions are precursors for the formation of semiconductor materials and semiconductors.
  • the polymeric precursor compositions of this invention are non- oxide chalcogen compositions.
  • the polymeric precursor compositions are sources or precursors for the formation of absorber layers for solar cells, including CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS and CAIGAS absorber layers.
  • a polymeric precursor compound may be made with any desired
  • a polymeric precursor compound may be made by reacting monomers to produce a polymer chain.
  • the polymeric precursor formation reactions can include initiation, propagation, and termination.
  • Methods for making a polymeric precursor may include the step of contacting a compound M B (ER) 3 with a compound M A (ER), where M A , M B , E, and R are as defined above.
  • a method for making a polymeric precursor may include the step of contacting a compound M B (ER 1 )3 with a compound M A (ER 2 ), where M A , M B , and E are as defined above and the groups R 1 and R 2 of the compounds may be the same or different and are as defined above.
  • Reaction Scheme 1 M B (ER 1 ) 3 and M A (ER 2 ) are monomers that form the first adduct 1, M A (ER)2M B (ER)2.
  • Reaction Scheme 1 represents the initiation of a polymerization of monomers.
  • Reaction Scheme 1 represents the formation of the intermediate adduct AB.
  • the polymerization reaction may form polymer chains by adding monomers to the first adduct 1, so that the first adduct 1 may be a transient molecule that is not observed when a longer chain is ultimately produced.
  • the first adduct 1 becomes a repeating unit AB in the polymer chain.
  • the compounds M B (ER) 3 and M A (ER) can be generated by various reactions.
  • a compound M A (ER) can be prepared by reacting M A X with M (ER).
  • M (ER) can be prepared by reacting E with LiR to provide Li(ER).
  • Li(ER) can be acidified to provide HER, which can be reacted with Na(OR) or K(OR) to provide Na(ER) and K(ER), respectively.
  • E, R and M A are as defined above.
  • a compound M A (ER) can be prepared by reacting M A X with (RE)Si(CH 3 ) 3 .
  • the compound (RE)Si(CH 3 ) 3 can be made by reacting M + (ER) with XSi(CH 3 ) 3 , where M + is Na, Li, or K, and X is halogen.
  • a compound M A (ER) can be prepared by reacting M A 2 0 with HER.
  • Cu(ER) can be prepared by reacting (3 ⁇ 40 with HER.
  • a compound M B (ER) 3 can be prepared by reacting M B X 3 with M (ER).
  • M (ER) can be prepared as described above.
  • a compound M B (ER) 3 can be prepared by reacting M B X 3 with (RE)Si(CH 3 ) 3 .
  • the compound (RE)Si(CH 3 ) 3 can be made as described above.
  • a compound M (ER)3 can be prepared by reacting M R 3 with HER.
  • M + M B (ER)4 can optionally be used in place of a portion of the compound M B (ER)3.
  • a compound M + M B (ER)4 can be prepared by reacting M B X3 with 4 equivalents of M + (ER), where M + is Na, Li, or K, and X is halogen.
  • the compound M (ER) can be prepared as described above.
  • the propagation of the polymeric precursor can be represented in part by the formulas in Reaction Scheme 2.
  • the formulas in Reaction Scheme 2 represent only some of the reactions and additions which may occur in propagation of the polymeric precursor.
  • Reaction Scheme 2 the addition of a monomer M B (ER 1 ) 3 or M A (ER 2 ) to the first adduct 1, may produce additional adducts 2 and 3, respectively.
  • Reaction Scheme 2 represents the formation of the adduct (RE)-BAB, as well as the adduct intermediate AB-M A (ER).
  • the adducts 2 and 3 may be transient moieties that are not observed when a longer chain is ultimately produced.
  • adduct 2 may add a monomer
  • Reaction Scheme 3 represents the formation of the intermediate adduct (RE)-BAB-M A (ER) 4, as well as the adduct (RE) 2 -BBAB 6.
  • the molecules 4, 5 and 6 may be transient molecules that are not observed when a longer chain is ultimately produced.
  • adduct 1 may add to adduct 2 to form a longer chain.
  • Reaction Scheme 4 represents the formation of the adduct (RE)-BABAB 7.
  • Any of the moieties 4, 5, 6, and 7 may be transient, and may not be observed when a longer chain is ultimately produced.
  • a propagation step may provide a stable molecule.
  • moiety 6 may be a stable molecule.
  • AB alternating block copolymers as described in Formulas 18 through 23 may be prepared by sequential addition of the corresponding monomers M B1 (ER) 3 , M B2 (ER) 3 , and M B3 (ER) 3 , when present, as well as M A1 (ER), M A2 (ER), and M A3 (ER), when present, during polymerization or propagation.
  • Certain reactions or additions of the polymeric precursor propagation may include the formation of chain branches. As shown in Reaction Scheme 5, the addition of a monomer M A (ER 2 ) to the adduct molecule 2 may produce a branched chain 8.
  • the propagation of the polymeric precursor can be represented in part by the formulas in Reaction Schemes 2, 3, 4 and 5.
  • the formulas in Reaction Schemes 2, 3, 4 and 5 represent only some representative reactions and additions which may occur in propagation of the polymeric precursor.
  • Termination of the propagating polymer chain may occur by several
  • a completed polymer chain may terminate in a M B unit, but not an M A unit.
  • a chain terminating unit is a » ⁇ unit, or a (ER) 2 B" » unit.
  • the propagation of the polymeric precursor chain may terminate when either of the monomers M B (ER)3 or M A (ER) becomes depleted.
  • the propagation of the polymeric precursor chain may terminate when a growing chain represented by the formula (RE)-B B reacts with another chain having the same terminal (RE)-B unit to form a chain having the formula B BB B.
  • (RE) 2 B BB B has chain terminating units that are B units.
  • the propagation of the polymeric precursor chain may terminate when the growing chain forms a ring.
  • a propagating chain such as 5 may terminate by cyclization in which the polymer chain forms a ring.
  • a polymeric precursor compound may be a single chain, or a distribution of chains having different lengths, structures or shapes, such as branched, networked, dendrimeric, and cyclic shapes, as well as combinations of the forgoing.
  • a polymeric precursor compound may be any combination of the molecules, adducts and chains described above in Reaction Schemes 1 through 7.
  • a polymeric precursor of this disclosure may be made by the process of providing a first monomer compound having the formula M B (ER 1 )3, providing a second monomer compound having the formula M A (ER 2 ), and contacting the first monomer compound with the second monomer compound.
  • the first monomer compound may be a combination of compounds having the formulas M B1 (ER 1 ) 3 and M B2 (ER 3 ) 3 , wherein M B1 and M B2 are different atoms of Group 13, and R 1 , R 2 and R 3 are the same or different and are independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • the first monomer compound may be a combination of compounds having the formulas M B1 (ER 1 ) 3 , M B2 (ER 3 ) 3 , and M B3 (ER 4 ) 3 , wherein M B1 , M B2 and M B3 are atoms of Group 13 each different from the other, and R 3 and R 4 are defined the same as R 1 and R 2 .
  • the second monomer compound may be a combination of compounds having the formulas M A1 (ER 2 ) and M A2 (ER 3 ), wherein M A1 and M A2 are different atoms selected from Cu, Au, Ag, or a combination thereof, and R 3 is defined the same as R 1 and R 2 .
  • a method for making a polymeric precursor may include the synthesis of a compound containing two or more atoms of M B and contacting the compound with a compound M A (ER), where M A , M B , E and R are as defined above.
  • ER a compound containing two or more atoms of M B
  • M A , M B , E and R are as defined above.
  • (ER) 2 M B1 (ER) 2 M B2 (ER) 2 can be reacted with M A (ER 2 ), where M B1 and M B2 are the same or different atoms of Group 13.
  • Methods for making a polymeric precursor include embodiments in which the first monomer compound and the second monomer compound may be contacted in a process of depositing, spraying, coating, or printing. In certain embodiments, the first monomer compound and the second monomer compound may be contacted at a temperature of from about -60 °C to about 100 °C.
  • a polymeric precursor compound may be made with any desired
  • the initial or first layer 205 may be formed with precursors enriched in the quantity of Cu, and the main or second layer 210 may be highly deficient in the quantity of Cu.
  • the second layer may be deficient in the quantity of Cu so that the second layer contains no copper.
  • the initial or first layer 205 may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 is from 1.05 to 4, and the main or second layer 210 may be formed with one or more monomers M B (ER)3, where M B is a Group 13 atom. Any combination, ratio or amount of monomers of In, Ga and Al may be used to form the main or second layer 210.
  • the initial or first layer 205 may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 is 1.5, or 2.0, or 2.5, or 3.0, or 3.5, or 4.0.
  • the main or second layer 210 may be formed with any amounts of the monomers In(ER) 3 , Ga(ER) 3 , and A1(ER) 3 .
  • the initial or first layer 205 or the main or second layer 210 may contain precursors deficient in the quantity of Cu.
  • the first layer 205 or the second layer 210 may contain a polymeric precursor deficient in the quantity of Cu so that the ratio of atoms of Cu to atoms of Group 13 is 0.5, or 0.6, or 0.7, or 0.8, or 0.9, or 0.95.
  • the initial or first layer 205 or the main or second layer 210 may contain M alk M B (ER) 4 or M alk (ER), wherein M alk is Li, Na, or K, M B is In, Ga, or Al, E is sulfur or selenium, and R is alkyl or aryl, for example, NaIn(Se n Bu) 4 , or
  • the roles of the layers may be reversed, so that the initial or first layer 205 may be highly deficient in the quantity of a Group 1 1 atom, and the main or second layer 210 may be highly enriched in the quantity of a Group 1 1 atom.
  • the initial or first layer 205 may be may be formed with one or more monomers M B (ER) 3
  • the main or second layer 210 may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 is from 1.05 to 4, where M B is a Group 13 atom.
  • M B is a Group 13 atom.
  • Any combination, ratio or amount of monomers of In, Ga and Al may be used to form the initial or first layer 205.
  • the main or second layer 210 may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 is 1.5, or 2.0, or 2.5, or 3.0, or 3.5, or 4.0.
  • the initial or first layer 205 may be formed with any amounts of the monomers In(ER) 3 , Ga(ER) 3 , and A1(ER) 3 .
  • an additional layer may be formed with precursors enriched in the quantity of Cu, where the additional layer is between the initial or first layer 205 and the substrate 200.
  • the optional additional layer may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 in the optional additional layer is 1.05, or 1.1, or 1.15, or 1.2, or 1.25, or 1.3.
  • a polymeric precursor compound may be made with any desired
  • the stoichiometry of a polymeric precursor compound may be controlled through the numbers of equivalents of the monomers in the formation reactions.
  • the monomers M B1 (ER) 3 , M B2 (ER 1 ) 3 , M B3 (ER 2 ) 3 , and M B4 (ER 3 ) 3 can be used for polymerization.
  • these monomers are In(ER) 3 , Ga(ER 1 ) 3 , A1(ER 2 ) 3 , where the groups R, R x ,and R 2 are the same or different and are groups attached through a carbon or non-carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • the groups R, R 2 are each the same or different from the others and are alkyl groups attached through a carbon atom.
  • the monomers M B1 (ER)(ER 1 ) 2 , M B2 (ER 2 )(ER 3 ) 2 , and M B3 (ER 4 )(ER 5 ) 2 can be used for polymerization, where the groups R, R 1 , R 2 , R 3 , R 4 , and R 5 are each the same or different from the others and are groups attached through a carbon or non-carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, the groups R, R 1 , R 2 , R 3 , R 4 , and R 5 are each the same or different from the others and are alkyl groups attached through a carbon atom.
  • Embodiments of this invention may further provide that the stoichiometry of a polymeric precursor compound may be controlled to any desired level through the adjustment of the amounts of each of the monomers provided in the formation reactions.
  • a polymerization to form a polymeric precursor may be initiated with a mixture of monomers M A (ER 3 ), M B1 (ER 1 ) 3 , and M B2 (ER 2 ) 3 having any arbitrary ratios of stoichiometry.
  • a polymerization can be performed with a mixture of monomers in any desired amounts.
  • a polymerization to form a polymeric precursor may be initiated with a mixture of any combination of the monomers described above, where the number of equivalents of each monomer is adjusted to any arbitrary level.
  • a polymerization to form a polymeric precursor can be done using the monomers M A1 (ER 1 ), M A2 (ER 2 ), and M A3 (ER 3 ), for example, which can be contacted in any desired quantity to produce any arbitrary ratio of M A1 to M A2 to M A3 .
  • the ratio of M A to M B in the polymeric precursor can be controlled from a ratio as low as 1 :2 in the unit BAB, for example, to a ratio of 1 : 1 in an alternating
  • (AB)n polymeric precursor to a ratio of 1.5: 1 or higher.
  • the ratio of M A to M B in the polymeric precursor may be 0.5 to 1.5, or 0.5 to 1, or 1 to 1, or 1 to 0.5, or 1.5 to 0.5.
  • a polymeric precursor compound may be made with any desired stoichiometry of the number of different metal atoms and atoms of Group 13 and their respective concentration levels or ratios.
  • a polymerization to form a polymeric precursor can be done to form a polymeric precursor having any ratio of M A to M B .
  • M B1 (ER) 3 / n M B2 (ER) 3 ⁇ may be formed using the mixture of monomers m
  • any number of monomers of M A (ER) and any number of monomers of M B (ER)3 can be used in the formation reactions.
  • a polymeric precursor may be made with the monomers M A1 (ER), M A2 (ER), M A3 (ER),
  • the ratios of the atoms M A : M B in a polymeric precursor may be about 0.5 : 1 or greater, or about 0.6 : 1 or greater, or about 0.7 : 1 or greater, or about 0.8 : 1 or greater, or about 0.9 : 1 or greater, or about 0.95 : 1 or greater. In certain variations, the ratios of the atoms M A : M B in a polymeric precursor may be about
  • the ratios of the atoms M A : M B in a polymeric precursor may be from about 0.5 to about 1.2, or from about 0.6 to about 1.2, or from about 0.7 to about 1.1, or from about 0.8 to about 1.1, or from about 0.8 to about 1, or from about 0.9 to about 1. In some examples, the ratios of the atoms M A : M B in a
  • polymeric precursor may be about 0.80, or about 0.82, or about 0.84, or about 0.86, or about 0.88, or about 0.90, or about 0.92, or about 0.94, or about 0.96, or about 0.98, or about 1.00, or about 1.02, or about 1.1, or about 1.2, or about 1.3, or about 1.5.
  • the ratio refers to the sum of all atoms of M A or M B , respectively, when there are more than one kind of M A or M B , such as M A1 and M A2 and M B1 and M B2 .
  • a polymeric precursor compound having the repeating unit composition ⁇ M A (ER)2(m M B1 ,n M B2 )(ER)2 ⁇ may be formed using the mixture of monomers m M B1 (ER) 3 + n M B2 (ER) 3 + M A (ER).
  • Embodiments of this invention may further provide a polymeric precursor made from monomers of M A (ER) and M B (ER)3, where the total number of
  • a polymeric precursor may be made that is substoichiometric or deficient in atoms of M A relative to atoms of M B .
  • M A is deficient, or M A is deficient to M B refers to a composition or formula in which there are fewer atoms of M A than M B .
  • M A is enriched, or M A is enriched relative to M B refers to a composition or formula in which there are more atoms of M A than M B .
  • a polymeric precursor having the empirical formula may be formed using the mixture of
  • a precursor compound may be a combination of u*(l-x) equivalents of M A1 (ER), u*x equivalents of M A2 (ER), v*(l-y-t) equivalents of M B1 (ER) 3 , v*y equivalents of M B2 (ER) 3 , v*t equivalents of M B3 (ER) 3 , wherein M A1 is Cu and M A2 is Ag, M B1 , M B2 and M B3 are different atoms of Group 13, wherein the compound has the empirical formula (M A1 1 _ x M A2 x ) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is
  • a precursor compound may have the empirical formula (Cui-xAg x ) u (Ini_y_ t Ga y Alt) v ((Si- z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, as defined above.
  • x is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • a precursor compound may have the empirical formula (Cui-xAg x ) u (Ini_y_ t Ga y Alt) v ((Si- z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1.25, v is from 0.7 to 1.25, w is from 2 to 6, and R represents R groups, of which there are w in number, as defined above.
  • x is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • a precursor compound may have the empirical formula (Cui-xAg x ) u (Ini_y_ t Ga y Alt) v ((Si- z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.8 to 0.95, v is from 0.9 to 1.1, w is from 3.6 to 4.4, and R represents R groups, of which there are w in number, as defined above.
  • x is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • a precursor compound may be a combination of w*(l-z) equivalents of M A1 (ER 1 ), w*z equivalents of M A2 (ER 2 ), x equivalents of M B1 (ER 3 ) 3 , y equivalents of M B2 (ER 4 ) 3 , t equivalents of M B3 (ER 5 ) 3 , wherein M A1 is Cu and M A2 is Ag, M B1 , M B2 and M B3 are different atoms of Group 13, wherein the compound has the empirical formula (Cui- z Ag z ) w In x Ga y Al t (ER 1 ) w( i_
  • w is from 0.5 to 1.5
  • z is from 0 to 1
  • x is from 0 to 1
  • y is from 0 to 1
  • t is from 0 to 1
  • x plus y plus t is one
  • R 1 , R 2 , R 3 , R 4 and R 5 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • z is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • a precursor compound may have the empirical formula (Qii-zAgz ⁇ InxGayAl ⁇ ER ⁇ i ⁇ CER ⁇ CER ⁇ sxCER ⁇ yCER ⁇ st, w is from 0.5 to 1.5, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R 1 , R 2 , R 3 , R 4 and R 5 are as defined above.
  • z is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • a precursor compound may have the empirical formula (Qii-zAgz ⁇ InxGayAl ⁇ ER ⁇ i ⁇ CER ⁇ CER ⁇ sxCER ⁇ yCER ⁇ st, w is from 0.7 to 1.25, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R 1 , R 2 , R 3 , R 4 and R 5 are as defined above.
  • z is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • a precursor compound may have the empirical formula (Cu 1 _ z Ag z ) w In x Ga y Al t (ER 1 ) w(1 . z) (ER 2 ) (w * z) (ER 3 )3 X (ER 4 ) 3y (ER 5 )3t, w is from 0.8 to 0.95, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R 1 , R 2 , R 3 , R 4 and R 5 are as defined above.
  • z is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • a mixture of polymeric precursor compounds may advantageously be prepared with any desired stoichiometry of the number of different metal atoms and atoms of Group 13 and their respective stoichiometric levels or ratios.
  • a polymeric precursor compound may be any polymeric precursor compound. As shown in Reaction Scheme 12, a polymeric precursor compound may be any polymeric precursor compound.
  • Bl 1 B2 2 prepared by contacting x equivalents of M (ER ) 3 , y equivalents of M (ER ) 3 , and z equivalents of M A (ER 3 ), where M B1 and M B2 are different atoms of Group 13, x is from 0.5 to 1.5, y is from 0.5 to 1.5, and z is from 0.5 to 1.5.
  • M B1 may be In and M B2 may be Ga.
  • a polymeric precursor compound may have the empirical formula where R , R and R J are the same or each different from the other.
  • a polymeric precursor compound of this kind can be used to control the ratio of In to Ga, and make the ratio In:Ga a predetermined value.
  • a polymeric precursor composition may advantageously be prepared with any desired stoichiometry of monovalent metal atoms M A .
  • Embodiments of this invention can provide polymeric precursor compounds that may advantageously be prepared with any desired stoichiometry with respect to the number of different monovalent metal elements and their respective ratios.
  • Polymeric precursor compounds having predetermined stoichiometry may be used in a process for making a photovoltaic absorber layer having the same predetermined stoichiometry on a substrate.
  • Processes for making a photovoltaic absorber layer having predetermined stoichiometry on a substrate include depositing a precursor having the predetermined stoichiometry onto the substrate and converting the deposited precursor into a photovoltaic absorber material.
  • a polymeric precursor can be made with a
  • the amount of Cu relative to atoms of Group 13 can be a deficiency of copper, in which the ratio of Cu/In, Cu/Ga, Cu/(In+Ga), or Cu/(In+Ga+Al) is less than one.
  • the amount of Cu relative to atoms of Group 13 can reflect enrichment of copper, in which the ratio of Cu/In, Cu/Ga, Cu/(In+Ga), or Cu/(In+Ga+Al) is greater than one.
  • a polymeric precursor can be made with a
  • the amount of Ag relative to atoms of Group 13 can be a deficiency of silver, in which the ratio of Ag/In, Ag/Ga,
  • the amount of Ag relative to atoms of Group 13 can reflect enrichment of silver, in which the ratio of Ag/In, Ag/Ga, Ag/(In+Ga), or Ag/(In+Ga+Al) is greater than one.
  • a polymeric precursor can be made with a
  • the amount of Cu and Ag relative to atoms of Group 13 can be a deficiency of copper and silver, in which the ratio of (Cu+Ag)/In, (Cu+Ag)/Ga, (Cu+Ag)/(In+Ga), or (Cu+Ag)/(In+Ga+Al) is less than one.
  • the amount of Cu and Ag relative to atoms of Group 13 can reflect enrichment of copper and silver, in which the ratio of (Cu+Ag)/In, (Cu+Ag)/Ga, (Cu+Ag)/(In+Ga), or (Cu+Ag)/(In+Ga+Al) is greater than one.
  • a polymeric precursor can be made with a predetermined stoichiometry of Cu to Ag atoms where the precursor has any ratio of Cu to Ag.
  • the ratio of Cu to Ag can be from about zero, where the precursor contains little or zero copper, to a very high ratio, where the precursor contains little or zero silver.
  • polymeric precursor compounds of this invention having predetermined stoichiometry can be used to make photovoltaic materials having the stoichiometry of CIS, CIGS, AIS, AIGS, CAIS, CAIGS, or CAIGAS.
  • a precursor compound of this disclosure may be a combination of u*(l-x) equivalents of M A1 (ER), u*x equivalents of M A2 (ER), v*(l-y) equivalents of
  • M B1 (ER) 3 v*y equivalents of M B2 (ER) 3 , wherein M A1 is Cu and M A2 is Ag, M B1 and M B2 are different atoms of Group 13, wherein the compound has the empirical formula (M A1 1 _ x M A2 x ) u (M B1 1 _ y M B2 y ) v ((Si_ z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • a precursor compound can have the stoichiometry useful to prepare CAIGS, CIGS and AIGS materials, including materials deficient in the quantity of a Group 11 atom.
  • x is from 0.001 to 0.999.
  • a precursor compound can be a combination of w*(l-z) equivalents of M A1 (ER 1 ), w*z equivalents of M A2 (ER 2 ), x equivalents of M B1 (ER 3 ) 3 , y equivalents of M B2 (ER 4 ) 3 , wherein M A1 is Cu and M A2 is Ag, M B1 and M B2 are different atoms of Group 13, wherein the compound has the empirical formula (Cui- z Ag z ) w In x Ga y (ER 1 ) w( i_ Z) (ER 2 ) (w*Z) (ER 3 ) 3x (ER 4 ) 3y , w is from 0.5 to 1.5, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, x plus y is one, and wherein R 1 , R 2 , R 3 , R 4 are the same or each different, and are independently selected, for each occurrence, from alkyl
  • a precursor compound can have the stoichiometry useful to prepare CAIGS, CIGS and AIGS materials, including materials deficient in the quantity of a Group 11 atom.
  • z is from 0.001 to 0.999.
  • a precursor compound of this disclosure may be a combination of x equivalents of M A1 (ER), v*(l-y) equivalents of M B1 (ER) 3 , v*y equivalents of M B2 (ER) 3 , wherein M A1 is Cu, M B1 and M B2 are different atoms of Group 13, wherein the compound has the empirical formula M A1 x (M B1 i_ y M B2 y ) v ((Si- z Se z )R) w , wherein x is from 0.5 to 1.5, y is from 0 to 1, z is from 0 to 1, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • a precursor compound can have the stoichiometry useful to prepare CIS or CIGS
  • a precursor compound can be a combination of z equivalents of M A1 (ER 1 ), x equivalents of M B1 (ER 2 ) 3 , y equivalents of M B2 (ER 3 ) 3 , wherein M A1 is Cu, M B1 and M B2 are different atoms of Group 13, wherein the compound has the empirical formula Cu z In x Ga y (ER 1 ) z (ER 2 ) 3x (ER 3 ) 3y , z is from 0.5 to 1.5, x is from 0 to 1, y is from 0 to 1, x plus y is one, and wherein R 1 , R 2 , R 3 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • a precursor compound can have the stoichiometry useful to prepare CIS or CIGS materials, including materials de
  • a polymeric precursor compound may be prepared by contacting x equivalents of M A1 (ER 1 ), y equivalents of M A2 (ER 2 ), and z equivalents of M B (ER 3 ) 3 , where M A1 and M A2 are different monovalent metal atoms, x is from 0.5 to 1.5, y is from 0.5 to 1.5, and z is from 0.5 to 1.5.
  • M A1 may be Cu and M A2 may be Ag.
  • a polymeric precursor compound may have the empirical formula
  • a polymeric precursor compound of this kind can be used to control the ratio of Cu to Ag, and make the ratio Cu:Ag a predetermined value.
  • Embodiments of this invention can provide polymeric precursor compounds that may advantageously be prepared with any desired stoichiometry with respect to the number of different Group 13 elements and their respective ratios.
  • Polymeric precursor compounds having predetermined stoichiometry may be used in a process for making a photovoltaic absorber layer having the same predetermined
  • Processes for making a photovoltaic absorber layer having predetermined stoichiometry on a substrate include depositing a precursor having the predetermined stoichiometry onto the substrate and converting the deposited precursor into a photovoltaic absorber material.
  • polymeric precursor compounds of this invention having predetermined stoichiometry can be used to make photovoltaic materials having the stoichiometry of CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS.
  • the precursor may have predetermined stoichiometry according to the empirical formula (M A1 1 _ x M A2 x ) u (M B1 1 _ y _ t M B2 y M B3 t ) v ((Si_ z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • x is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • the precursor can have predetermined stoichiometry according to the empirical formula (Cui-xAg x ) u (Ini_y_ t Ga y Alt) v ((Si- z Se z )R) w , wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
  • x is from 0.001 to 0.999.
  • t is from 0.001 to 0.999.
  • polymeric precursors having predetermined stoichiometry can be used to make photovoltaic materials including CuGaS2, AgGaS2, AuGaS2, CuInS 2 , AgInS 2 , AuInS 2 , CuGaSe 2 , AgGaSe 2 , AuGaSe 2 , CuInSe 2 , AgInSe 2 , AuInSe 2 , CuGaTe 2 , AgGaTe 2 , AuGaTe 2 , CuInTe 2 , AgInTe 2 , AuInTe 2 , CuInGaSSe,
  • a polymeric precursor composition may include a dopant.
  • a dopant may be introduced into a polymeric precursor in the synthesis of the precursor, or alternatively, can be added to a composition or ink containing the polymeric precursor.
  • a semiconductor material or thin film of this disclosure made from a polymeric precursor may contain atoms of one or more dopants. Methods for introducing a dopant into a photovoltaic absorber layer include preparing the absorber layer with a polymeric precursor of this invention containing the dopant.
  • the quantity of a dopant in an embodiment of this disclosure can be from about 1 x 10 "7 atom percent to about 5 atom percent relative to the most abundant Group 1 1 atom, or greater.
  • a dopant can be included at a level of from about 1 * 10 16 cnf 3 to about 1 * 10 21 cnf 3 .
  • a dopant can be included at a level of from about 1 ppm to about 10,000 ppm.
  • a dopant may be an alkali metal atom including Li, Na, K, Rb, and a mixture of any of the foregoing.
  • Embodiments of this invention may further include a dopant being an alkaline earth metal atom including Be, Mg, Ca, Sr, Ba, and a mixture of any of the foregoing.
  • a dopant may be a transition metal atom from Group 3 through Group 12.
  • a dopant may be a transition metal atom from Group 5 including V, Nb, Ta, and a mixture of any of the foregoing.
  • a dopant may be a transition metal atom from Group 6 including Cr, Mo, W, and a mixture of any of the foregoing.
  • a dopant may be a transition metal atom from Group 10 including Ni, Pd, Pt, and a mixture of any of the foregoing.
  • a dopant may be a transition metal atom from Group 12 including Zn, Cd, Hg, and a mixture of any of the foregoing.
  • a dopant may be an atom from Group 14 including C, Si, Ge, Sn, Pb, and a mixture of any of the foregoing.
  • a dopant may be an atom from Group 15 including P, As, Sb, Bi, and a mixture of any of the foregoing.
  • a polymeric precursor composition may be prepared using an amount of Sb(ER) 3 , Bi(ER) 3 , or mixtures thereof, where E is S or Se and R is alkyl or aryl.
  • a dopant may be provided in a precursor as a counterion or introduced into a thin film by any of the deposition methods described herein.
  • a dopant may also be introduced into a thin film by methods known in the art including ion implantation.
  • a dopant of this disclosure may be p-type or n-type.
  • any of the foregoing dopants may be used in an ink of this invention.
  • a polymeric precursor composition may be formed as shown in Reaction Schemes 1 through 6, where one or more capping compounds are added to the reactions.
  • a capping compound may control the extent of polymer chain formation.
  • a capping compound may also be used to control the viscosity of an ink containing the polymeric precursor compound or composition, as well as its solubility and ability to from a suspension. Examples of capping compounds include inorganic or organometallic complexes which bind to repeating units A or B, or both, and prevent further chain propagation. Examples of capping compounds include
  • ligand refers to any atom or chemical moiety that can donate electron density in bonding or coordination.
  • a ligand can be monodentate, bidentate or multidentate.
  • ligand includes Lewis base ligands.
  • inorganic ligand refers to an inorganic chemical group which can bind to another atom or molecule through a non-carbon atom.
  • ligands include halogens, water, alcohols, ethers, hydroxyls, amides, carboxylates, chalcogenylates, thiocarboxylates, selenocarboxylates, tellurocarboxylates, carbonates, nitrates, phosphates, sulfates, perchlorates, oxalates, and amines.
  • chalcogenylate refers to thiocarboxylate, selenocarboxylate, and tellurocarboxylate, having the formula RCE 2 " , where E is S, Se, or Te.
  • chalcocarbamate refers to thiocarbamate, selenocarbamate, and tellurocarbamate, having the formula R 1 R 2 NCE 2 ⁇ , where E is S, Se, or Te, and R 1 and R 2 are the same or different and are hydrogen, alkyl, aryl, or an organic ligand.
  • ligands include F “ , CI “ , H 2 0, ROH, R 2 0, OH “ , RO “ , NR 2 “ , RC0 2 “ , RCE 2 “ , C0 3 2” , N0 3 “ , P0 4 3” , SO 4 2” , CIO 4 “ , C 2 0 4 2” , NH 3 , NR 3 , R 2 NH, and RNH 2 , where R is alkyl, and E is chalcogen.
  • ligands include azides, heteroaryls, thiocyanates, arylamines, arylalkylamines, nitrites, and sulfites.
  • ligands include Br “ , N 3 “ , pyridine, [SCN-] “ , ArNH 2 , N0 2 “ , and S0 3 2" where Ar is aryl.
  • ligands include cyanides or nitriles, isocyanides or isonitriles, alkylcyanides, alkylnitriles, alkylisocyanides, alkylisonitriles, arylcyanides, arylnitriles, arylisocyanides, and arylisonitriles.
  • ligands include hydrides, carbenes, carbon monoxide, isocyanates, isonitriles, thiolates, alkylthiolates, dialkylthiolates, thioethers, thiocarbamates, phosphines, alkylphosphines, arylphosphines, arylalkylphosphines, arsenines, alkylarsenines, arylarsenines, arylalkylarsenines, stilbines, alkylstilbines, arylstilbines, and arylalkylstilbines.
  • ligands include ⁇ , H “ , R “ , -CN “ , -CO, RNC, RSH, R 2 S, RS “ , -SCN “ , R 3 P, R 3 AS, RsSb, alkenes, and aryls, where each R is independently alkyl, aryl, or heteroaryl.
  • ligands examples include trioctylphosphine, trimethylvinylsilane and hexafluoroacetylacetonate.
  • ligands include nitric oxide, silyls, alkylgermyls, arylgermyls, arylalkylgermyls, alkylstannyls, arylstannyls, arylalkylstannyls, selenocyanates, selenolates, alkylselenolates, dialkylselenolates, selenoethers, selenocarbamates, tellurocyanates, tellurolates, alkyltellurolates, dialkyltellurolates, telluroethers, and tellurocarbamates.
  • ligands include chalcogenates, thiothiolates, selenothiolates, thioselenolates, selenoselenolates, alkyl thiothiolates, alkyl selenothiolates, alkyl thioselenolates, alkyl selenoselenolates, aryl thiothiolates, aryl selenothiolates, aryl thioselenolates, aryl selenoselenolates, arylalkyl thiothiolates, arylalkyl
  • ligands examples include selenoethers and telluroethers.
  • ligands include NO, O 2" , NH n R 3 _ n , PH n R 3 - n , SiR 3 " , GeR 3 " , SnR 3 “ , “ SR, " SeR, “ TeR, “ SSR, “ SeSR, “ SSeR, “ SeSeR, and RCN, where n is from 1 to 3, and each R is independently alkyl or aryl.
  • transition metals refers to atoms of Groups 3 though
  • a polymeric precursor may be used to prepare a material for use in developing semiconductor products.
  • the polymeric precursors of this invention may advantageously be used in mixtures to prepare a material with controlled or predetermined stoichiometric ratios of the metal atoms in the material.
  • processes for solar cells that avoid additional sulfurization or selenization steps may advantageously use polymeric precursor compounds and compositions of this invention.
  • a polymeric precursor may be used to prepare an absorber material for a solar cell product.
  • the absorber material may have the empirical formula
  • M A is a Group 1 1 atom selected from Cu, Ag, and Au
  • M B and M c are different Group 13 atoms selected from Al, Ga, In, Tl, or a combination thereof
  • E 1 is S or Se
  • E 2 is Se or Te
  • E 1 and E 2 are different
  • x is from 0.5 to 1.5
  • y is from 0 to 1
  • z is from 0 to 1
  • v is from 0.5 to 1.5
  • w is from 1 to 3.
  • a polymeric precursor may be used to prepare an absorber material for a solar cell product.
  • the absorber material may have the empirical formula
  • M A is a Group 1 1 atom selected from Cu, Ag, and Au
  • M B and M c are different Group 13 atoms selected from Al, Ga, In, Tl, or a combination thereof
  • E 1 is S or Se
  • E 2 is Se or Te
  • E 1 and E 2 are different
  • x is from 0.5 to 1.5
  • y is from 0 to 1
  • z is from 0 to 1
  • v is from 0.5 to 1.5
  • w is from 1 to 3.
  • a polymeric precursor may be used to prepare an absorber material for a solar cell product.
  • the absorber material may have the empirical formula
  • M A is a Group 1 1 atom selected from Cu, Ag, and Au
  • M B and M c are different Group 13 atoms selected from Al, Ga, In, Tl, or a combination thereof
  • E 1 is S or Se
  • E 2 is Se or Te
  • E 1 and E 2 are different
  • x is from 0.5 to 1.5
  • y is from 0 to 1
  • z is from 0 to 1
  • v is from 0.5 to 1.5
  • w is from 1.5 to 2.5.
  • the absorber material may be either an n-type or a p-type semiconductor, when such compound is known to exist.
  • one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula Cu x In y (Si- z Se z ) w , where x is from 0.5 to 1.5, y is from 0.5 to 1.5, z is from 0 to 1, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula Cu x In y (Si- z Se z ) w , where x is from 0.7 to 1.2, y is from 0.7 to 1.2, z is from 0 to 1, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula Cu x In y (Si- z Se z ) w , where x is from 0.7 to 1.1, y is from 0.7 to 1.1, z is from 0 to 1, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula Cu x In y (Si- z Se z ) w , where x is from 0.8 to 0.95, y is from 0.95 to 1.05, z is from 0 to 1, and w is from 1.8 to 2.2.
  • one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula Cu x In y (Si- z Se z ) w , where x is from 0.8 to 0.95, y is from 0.95 to 1.05, z is from 0 to 1, and w is from 2.0 to 2.2.
  • one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cu x (Ini_ y Ga y ) v (Si- z Se z ) w , where x is from 0.5 to 1.5, y is from 0 to 1, and z is from 0 to 1, v is from 0.5 to 1.5, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cu x (Ini_ y Ga y )v(Si- z Se z ) w , where x is from 0.7 to 1.2, y is from 0 to 1, and z is from 0 to 1, v is from 0.7 to 1.2, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula
  • one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cu x (Ini_ y Ga y ) v (Si_ z Se z ) w , where x is from 0.7 to 1.1, y is from 0 to 1, and z is from 0 to 1, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cu x (Ini_ y Ga y ) v (Si_ z Se z ) w , where x is from 0.8 to 0.95, y is from 0 to 0.5, and z is from 0 to 1, v is from 0.95 to 1.05, and w is from 1.8 to 2.2.
  • one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cu x (Ini_ y Ga y ) v (Si_ z Se z ) w , where x is from 0.8 to 0.95, y is from 0 to 0.5, and z is from 0 to 1, v is from 0.95 to 1.05, and w is from 2.0 to 2.2.
  • one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui-xAg x ) u (Ini_ y Ga y ) v (Si- z Se z ) w , where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui-xAg x ) u (Ini_ y Ga y ) v (Si- z Se z ) w , where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1.2, v is from 0.7 to 1.2, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui_ x Ag x ) u (Ini_ y Ga y ) v (Si_ z Se z ) w , where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1.1, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui-xAg x ) u (Ini_ y Ga y ) v (Si- z Se z ) w , where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0.5 to 1, u is from 0.7 to 1.1, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
  • one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui-xAg x ) u (Ini_ y Ga y ) v (Si- z Se z ) w , where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0.5 to 1, u is from 0.8 to 0.95, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
  • Embodiments of this invention may further provide polymeric precursors that can be used to prepare a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material for a solar cell product.
  • one or more polymeric precursors may be used to prepare a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material as a chemically and physically uniform layer.
  • one or more polymeric precursors may be used to prepare a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material wherein the stoichiometry of the metal atoms of the material can be controlled.
  • one or more polymeric precursors may be used to prepare a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material as a layer that may be processed at relatively low temperatures to achieve a solar cell.
  • one or more polymeric precursors may be used to prepare a
  • CIS CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material as a photovoltaic layer.
  • one or more polymeric precursors may be used to prepare a chemically and physically uniform semiconductor CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS layer on a variety of substrates, including flexible substrates.
  • Examples of an absorber material include CuGaS2, AgGaS2, AuGaS2, CuInS2, AgInS 2 , AuInS 2 , CuTlS 2 , AgTlS 2 , AuTlS 2 , CuGaSe 2 , AgGaSe 2 , AuGaSe 2 , CuInSe 2 , AgInSe 2 , AuInSe 2 , CuTlSe 2 , AgTlSe 2 , AuTlSe 2 , CuGaTe 2 , AgGaTe 2 , AuGaTe 2 , CuInTe 2 , AgInTe 2 , AuInTe 2 , CuTlTe 2 , AgTlTe 2 , and AuTlTe 2 .
  • Examples of an absorber material include CuInGaSSe, AglnGaSSe,
  • AuInGaSSe CuInTlSSe, AglnTlSSe, AuInTlSSe, CuGaTlSSe, AgGaTlSSe,
  • AuGaTlSSe CuInGaSSe, AglnGaSeTe, AuInGaSeTe, CuInTlSeTe, AglnTlSeTe, AuInTlSeTe, CuGaTlSeTe, AgGaTlSeTe, AuGaTlSeTe, CuInGaSTe, AglnGaSTe, AuInGaSTe, CuInTlSTe, AglnTlSTe, AuInTlSTe, CuGaTlSTe, AgGaTlSTe, and AuGaTlSTe.
  • the CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS layer may be used with various junction partners to produce a solar cell.
  • junction partner layers are known in the art and include CdS, ZnS, ZnSe, and CdZnS. See, for example, Martin Green, Solar Cells: Operating Principles, Technology and System Applications (1986); Richard H. Bube, Photovoltaic Materials (1998);
  • the thickness of an absorber layer may be from about 0.01 to about 20 micrometers, or from about 0.01 to about 10 micrometers, or from about
  • the thickness of an absorber layer may be from 0.01 to 5 micrometers.
  • the thickness of an absorber layer may be from 0.02 to 5 micrometers.
  • the thickness of an absorber layer may be from 0.5 to 5 micrometers.
  • the thickness of an absorber layer may be from 1 to 3 micrometers.
  • the thickness of an absorber layer may be from 100 to 10,000 nanometers.
  • the thickness of an absorber layer may be from 10 to 5000 nanometers.
  • the thickness of an absorber layer may be from 20 to 5000 nanometers.
  • a process for depositing a layer of a precursor on a substrate, article, or on another layer can have a single step for depositing a thickness of from 200 to 500 nanometers.
  • a process for depositing a layer of a precursor on a substrate, article, or on another layer can have a single step for depositing a thickness of from 250 to 350 nanometers.
  • the polymeric precursors of this invention can be used to form a layer on a substrate.
  • the substrate can have any shape.
  • Substrate layers of polymeric precursors can be used to create a photovoltaic layer or device.
  • a substrate may have an electrical contact layer.
  • the electrical contact layer can be on the surface of the substrate.
  • An electrical contact layer on a substrate can be the back contact for a solar cell or photovoltaic device.
  • Examples of an electrical contact layer include a layer of a metal or a metal foil, as well as a layer of molybdenum, aluminum, copper, gold, platinum, silver, titanium nitride, stainless steel, a metal alloy, and a combination of any of the foregoing.
  • substrates on which a polymeric precursor of this disclosure can be deposited or printed include semiconductors, doped semiconductors, silicon, gallium arsenide, insulators, glass, molybdenum glass, silicon dioxide, titanium dioxide, zinc oxide, silicon nitride, and combinations thereof.
  • a substrate may be coated with molybdenum or a molybdenum-containing compound.
  • a substrate may be pre-treated with a molybdenum- containing compound, or one or more compounds containing molybdenum and selenium.
  • substrates on which a polymeric precursor of this disclosure can be deposited or printed include metals, metal foils, molybdenum, aluminum, beryllium, cadmium, cerium, chromium, cobalt, copper, gold, manganese, nickel, palladium, platinum, rhenium, rhodium, silver, stainless steel, steel, iron, strontium, tin, titanium, tungsten, zinc, zirconium, metal alloys, metal silicides, metal carbides, and combinations thereof.
  • substrates on which a polymeric precursor of this disclosure can be deposited or printed include polymers, plastics, conductive polymers, copolymers, polymer blends, polyethylene terephthalates, polycarbonates, polyesters, polyester films, mylars, polyvinyl fluorides, polyvinylidene fluoride, polyethylenes, polyetherimides, polyethersulfones, polyetherketones, polyimides, polyvinylchlorides, acrylonitrile butadiene styrene polymers, silicones, epoxys, and combinations thereof.
  • roofing materials examples include roofing materials.
  • Examples of substrates on which a polymeric precursor of this disclosure can be deposited or printed include papers and coated papers.
  • a substrate of this disclosure can be of any shape.
  • substrates on which a polymeric precursor of this disclosure can be deposited include a shaped substrate including a tube, a cylinder, a roller, a rod, a pin, a shaft, a plane, a plate, a blade, a vane, a curved surface or a spheroid.
  • a substrate may be layered with an adhesion promoter before the deposition, coating or printing of a layer of a polymeric precursor of this invention.
  • adhesion promoters include a glass layer, a metal layer, a titanium-containing layer, a tungsten-containing layer, a tantalum-containing layer, tungsten nitride, tantalum nitride, titanium nitride, titanium nitride silicide, tantalum nitride silicide, a chromium-containing layer, a vanadium-containing layer, a nitride layer, an oxide layer, a carbide layer, and combinations thereof.
  • adhesion promoters include organic adhesion promoters such as organofunctional silane coupling agents, silanes, glycol ether acetates, ethylene glycol bis-thioglycolates, acrylates, acrylics, mercaptans, thiols, selenols, tellurols, carboxylic acids, and mixtures thereof.
  • organic adhesion promoters such as organofunctional silane coupling agents, silanes, glycol ether acetates, ethylene glycol bis-thioglycolates, acrylates, acrylics, mercaptans, thiols, selenols, tellurols, carboxylic acids, and mixtures thereof.
  • Substrates may be layered with a barrier layer before the deposition of printing of a layer of a polymeric precursor of this invention.
  • Examples of a barrier layer include a glass layer, a metal layer, a titanium- containing layer, a tungsten-containing layer, a tantalum-containing layer, tungsten nitride, tantalum nitride, titanium nitride, titanium nitride silicide, tantalum nitride silicide, and combinations thereof.
  • a substrate can be of any thickness, and can be from about 10 or 20 micrometers to about 20,000 micrometers or more in thickness.
  • the polymeric precursors of this invention can be used to make photovoltaic materials by depositing a layer onto a substrate, where the layer contains one or more polymeric precursors.
  • the deposited layer may be a film or a thin film. Substrates are described above.
  • the terms “deposit,” “depositing,” and “deposition” refer to any method for placing a compound or composition onto a surface or substrate, including spraying, coating, and printing.
  • thin film refers to a layer of atoms or molecules, or a composition layer on a substrate having a thickness of less than about 300 micrometers.
  • a deposited layer of this disclosure advantageously allows precise control of the stoichiometric ratios of certain atoms in the layer because the layer can be composed of a mixture of polymeric precursors.
  • polymeric precursors of this invention and compositions containing polymeric precursors, can be deposited onto a substrate using methods known in the art, as well as methods disclosed herein.
  • Examples of methods for depositing a polymeric precursor onto a surface or substrate include all forms of spraying, coating, and printing.
  • Solar cell layers can be made by depositing one or more polymeric precursors of this disclosure on a flexible substrate in a high throughput roll process.
  • the depositing of polymeric precursors in a high throughput roll process can be done by spraying or coating a composition containing one or more polymeric precursors, or by printing an ink containing one or more polymeric precursors of this disclosure.
  • the depositing of compounds by spraying can be done at rates from about 10 nm to 3 micrometers per minute, or from 100 nm to 2 micrometers per minute.
  • Examples of methods for depositing a polymeric precursor onto a surface or substrate include spraying, spray coating, spray deposition, spray pyrolysis, and combinations thereof.
  • Examples of methods for printing using an ink of this disclosure include printing, screen printing, inkjet printing, aerosol jet printing, ink printing, jet printing, stamp/pad printing, transfer printing, pad printing, flexographic printing, gravure printing, contact printing, reverse printing, thermal printing, lithography,
  • electrophotographic printing and combinations thereof.
  • Examples of methods for depositing a polymeric precursor onto a surface or substrate include electrodepositing, electroplating, electroless plating, bath deposition, coating, dip coating, wet coating, spin coating, knife coating, roller coating, rod coating, slot die coating, meyerbar coating, lip direct coating, capillary coating, liquid deposition, solution deposition, layer-by-layer deposition, spin casting, and solution casting.
  • polymeric precursors of this invention and ink compositions containing polymeric precursors, can be deposited onto a substrate using methods known in the art, as well as methods disclosed herein.
  • a deposited layer of this disclosure advantageously allows precise control of the stoichiometric ratios of certain atoms in the layer because the layer can be composed of a polymeric precursor.
  • Examples of methods for depositing a polymeric precursor onto a surface or substrate include all forms of spraying, coating, and printing.
  • a process for knife gap coating can be performed.
  • the gap can be from 50 to 200 ⁇ , or larger, and the knife speed can be from about 1 to 100 mm/s.
  • the substrate can be cleared using a stream from a nitrogen gas gun. Ink may be applied to the blade to fill the gap and make contact with the substrate. The ink is then coated in a single pass and the back surface is wiped or washed with toluene or organic solvent. The coated substrate can be transferred to a hot plate for conversion to a material. The conversion time can range from 40 seconds to 5 minutes or greater. The coating and conversion steps are repeated to build up a desired film thickness.
  • thickness per pass can be from 75 to 150 nm, or from 10 to 500 nm, or from 10 to 400 nm, or from 100 to 300 nm, or from 200 to 500 nm, or from 250 to 350 nm.
  • thickness per pass can be from 10 to 3000 nm, or from 10 to 2000 nm, or from 100 to 1000 nm, or from 200 to 500 nm, or from 250 to 350 nm.
  • thickness per pass can be from 10 to 3000 nm, or from 10 to 2000 nm, or from 100 to 1000 nm, or from 200 to 500 nm, or from 250 to 350 nm.
  • thickness per pass can be from 10 to 3000 nm, or from 10 to 2000 nm, or from 100 to 1000 nm, or from 200 to 500 nm, or from 250 to 350 nm.
  • thickness per pass can be from 10 to 3000 nm, or from 10 to 2000 nm, or from 100 to 1000 nm, or from 200 to 500 nm, or from 250 to 350 nm.
  • crack- free films are achieved with a process having a step with a thickness per pass of 50 nm, 75 nm, 100 nm, 200 nm, 300 nm, 350 nm, 400 nm, 500 nm, 600 nm or greater.
  • the coated substrate can be annealed after depositing any number of layers of precursors.
  • Examples of methods for depositing a polymeric precursor onto a surface or substrate include chemical vapor deposition, aerosol chemical vapor deposition, metal-organic chemical vapor deposition, organometallic chemical vapor deposition, plasma enhanced chemical vapor deposition, and combinations thereof.
  • a first polymeric precursor may be deposited onto a substrate, and subsequently a second polymeric precursor may be deposited onto the substrate.
  • a second polymeric precursor may be deposited onto the substrate.
  • several different polymeric precursors may be deposited onto the substrate to create a layer.
  • different polymeric precursors may be deposited onto a substrate simultaneously, or sequentially, whether by spraying, coating, printing, or by other methods.
  • the different polymeric precursors may be contacted or mixed before the depositing step, during the depositing step, or after the depositing step.
  • the polymeric precursors can be contacted before, during, or after the step of transporting the polymeric precursors to the substrate surface.
  • the depositing of polymeric precursors can be done in a controlled or inert atmosphere, such as in dry nitrogen and other inert gas atmospheres, as well as in a partial vacuum atmosphere.
  • Processes for depositing, spraying, coating, or printing polymeric precursors can be done at various temperatures including from about -20 °C to about 650 °C, or from about -20 °C to about 600 °C, or from about -20 °C to about 400 °C, or from about 20 °C to about 360 °C, or from about 20 °C to about 300 °C, or from about 20 °C to about 250 °C.
  • Processes for making a solar cell involving a step of transforming a polymeric precursor compound into a material or semiconductor can be performed at various temperatures including from about 100 °C to about 650 °C, or from about 150 °C to about 650 °C, or from about 250 °C to about 650 °C, or from about 300 °C to about 650 °C, or from about 400 °C to about 650 °C, or from about 300 °C to about 600 °C, or from about 300 °C to about 550 °C, or from about 300 °C to about 500 °C, or from about 300 °C to about 450 °C.
  • depositing of polymeric precursors on a substrate can be done while the substrate is heated.
  • a thin-film material may be deposited or formed on the substrate.
  • a step of converting a precursor to a material and a step of annealing can be done simultaneously.
  • a step of heating a precursor can be done before, during or after any step of depositing the precursor.
  • a substrate can be cooled after a step of heating.
  • a substrate can be cooled before, during, or after a step of depositing a precursor.
  • a substrate may be cooled to return the substrate to a lower temperature, or to room temperature, or to an operating temperature of a deposition unit.
  • Various coolants or cooling methods can be applied to cool a substrate.
  • the depositing of polymeric precursors on a substrate may be done with various apparatuses and devices known in art, as well as devices described herein.
  • the depositing of polymeric precursors can be performed using a spray nozzle with adjustable nozzle dimensions to provide a uniform spray composition and distribution.
  • Embodiments of this disclosure further contemplate articles made by depositing a layer onto a substrate, where the layer contains one or more polymeric precursors.
  • the article may be a substrate having a layer of a film, or a thin film, which is deposited, sprayed, coated, or printed onto the substrate.
  • an article may have a substrate printed with a polymeric precursor ink, where the ink is printed in a pattern on the substrate.
  • an ink can be made by dissolving a polymeric precursor in a solvent in an inert atmosphere glove box.
  • the ink can be passed through a syringe filter and deposited onto a Mo-coated glass substrate in a quantity sufficient to cover the entire substrate surface.
  • the substrate can be then spun at 1200 rpm for about
  • the coated substrate can be allowed to dry at room temperature, typically for 1- 2 minutes.
  • the coated substrate can be heated in a furnace for conversion of the polymeric molecular precursor film to a semiconductor thin film material.
  • another precursor coating may be applied to the thin film material on the substrate by repeating the procedure above. This process can be repeated to prepare additional thin film material layers on the substrate.
  • the substrate can be annealed.
  • the annealing process may include a step of heating the coated substrate at a temperature sufficient to convert the coating on the substrate to a thin film photovoltaic material.
  • the annealing process may include a step of heating the coated substrate at 400 °C for 60 min, or 500 °C for 30 min, or 550 °C for 60 min, or 550 °C for 20 min.
  • the annealing process may include an additional step of heating the coated substrate at 550 °C for 10 min, or 525 °C for 10 min, or 400 °C for 5 min.
  • Molecular precursor and polymeric precursor inks may be used to grow photovoltaic absorber layers, or other material, by using multiple inks with different compositions. In some embodiments, large grains can be achieved by using multiple inks.
  • compositions can be made, and many compositions in CIGS phase space can be made.
  • a two ink system is used.
  • any number of inks can be used.
  • a first ink may contain a molecular precursor or polymeric precursor with a predetermined composition.
  • the first ink can have a predetermined composition that is enriched in Cu.
  • Examples of a material made with a Cu-enriched ink include
  • the first ink when used by itself, could be used to generate a CIS, CGS, or CIGS material that is enriched in Cu.
  • a second ink or balance ink may contain a sufficient quantity
  • the second ink may contain a molecular precursor or polymeric precursor with a predetermined composition.
  • the second ink can have a predetermined composition that is deficient in Cu.
  • the second ink may contain a Cu-containing molecule, an In-containing molecule, or a Ga-containing molecule.
  • Examples of a material or composition that can be made by the methods of this disclosure include Cui. 0 5lni.oSe ⁇ 2 .o-2.4, Cui.iIn 0 .9Ga 0 .iSe ⁇ 2.o-2.4, Cui. 3 Ini. 0 Se ⁇ 2.o-2.4, Cui.o5lni.oGao.i5Se ⁇ 2.o-2.4, Cui.iIno.85Gao.i5Se ⁇ 2.o-2.4, Cui.iIni.oSe ⁇ 2.o-2.4,
  • Examples of a material or composition that can be made by the methods of this disclosure include Cu 0 .85lni.oSe ⁇ 2 .o-2.4, Cu 0 .95lno.9Ga 0 .iSe ⁇ 2.o-2.4, Cu 0 .87lni.oSe ⁇ 2 .o-2.4,
  • a solar cell device can be made from a photovoltaic absorber layer on a substrate by carrying out various finishing steps.
  • a finishing step includes a chemical bath treatment step.
  • the photovoltaic absorber layer can be exposed to a buffer compound.
  • a buffer compound include In 2 S3.
  • a buffer layer of CdS can be made by chemical bath deposition.
  • the TCO layer can be made from Al:ZnO (AZO).
  • the TCO layering step can include ZnO (intrinsic iZO).
  • a further finishing step is deposition of metal contacts on the TCO layer.
  • a solar cell can be finished by annealing in air, or in inert atmosphere.
  • back of the solar cell or photovoltaic absorber layer refers to the surface of the photovoltaic absorber layer which is closer to the back contact of the solar cell.
  • front of the solar cell or photovoltaic absorber layer refers to the surface of the photovoltaic absorber layer which is closer to the TCO layer of the solar cell.
  • the polymeric precursors of this invention can be used to make photovoltaic materials and solar cells of high efficiency.
  • the solar cell is a thin layer solar cell having a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS absorber layer deposited or printed on a substrate.
  • Embodiments of this invention may provide improved efficiency for solar cells used for light to electricity conversion.
  • a solar cell of this disclosure is a heterojunction device made with a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS cell.
  • the CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS layer may be used as a junction partner with a layer of, for example, cadmium sulfide, cadmium selenide, cadmium telluride, zinc sulfide, zinc selenide, or zinc telluride.
  • the absorber layer may be adjacent to a layer of MgS, MgSe, MgTe, HgS, HgSe, HgTe, A1N, A1P, AlAs, AlSb, GaN, GaP, GaAs, GaSb, InN, InP, InAs, InSb, or combinations thereof.
  • a solar cell of this disclosure is a multijunction device made with one or more stacked solar cells.
  • a solar cell device of this disclosure may have a substrate 10, an electrode layer 20, an absorber layer 30, a buffer layer 40, and a transparent conductive layer (TCO) 50.
  • the substrate 10 may be metal, plastic, glass, or ceramic.
  • the electrode layer 20 can be a molybdenum-containing layer.
  • the absorber layer 30 may be a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS layer.
  • the buffer layer 40 may be a cadmium sulfide layer.
  • the transparent conductive layer 50 can be an indium tin oxide layer or a doped zinc oxide layer.
  • a solar cell device of this disclosure may have a substrate, an electrode layer, an absorber layer, a buffer layer, an adhesion promoting layer, a junction partner layer, a transparent layer, a transparent electrode layer, a transparent conductive oxide layer, a transparent conductive polymer layer, a doped conductive polymer layer, an encapsulating layer, an anti-reflective layer, a protective layer, or a protective polymer layer.
  • an absorber layer includes a plurality of absorber layers.
  • solar cells may be made by processes using polymeric precursor compounds and compositions of this invention that advantageously avoid additional sulfurization or selenization steps.
  • a solar cell device may have a molybdenum-containing layer, or an interfacial molybdenum-containing layer.
  • a protective polymer include silicon rubbers, butyryl plastics, ethylene vinyl acetates, and combinations thereof.
  • Substrates can be made of a flexible material which can be handled in a roll.
  • the electrode layer may be a thin foil.
  • a thin film photovoltaic device may have a transparent conductor layer, a buffer layer, a p-type absorber layer, an electrode layer, and a substrate.
  • the transparent conductor layer may be a transparent conductive oxide (TCO) layer such as a zinc oxide layer, or zinc oxide layer doped with aluminum, or a carbon nanotube layer, or a tin oxide layer, or a tin oxide layer doped with fluorine, or an indium tin oxide layer, or an indium tin oxide layer doped with fluorine, while the buffer layer can be cadmium sulfide, or cadmium sulfide and high resistivity zinc oxide.
  • TCO transparent conductive oxide
  • the p-type absorber layer can be a CIGS layer, and the electrode layer can be molybdenum.
  • the transparent conductor layer can be up to about 0.5 micrometers in thickness.
  • the buffer layer can also be a cadmium sulfide n-type junction partner layer.
  • the buffer layer may be a silicon dioxide, an aluminum oxide, a titanium dioxide, or a boron oxide.
  • a solar cell can include a molybdenum selenide interface layer, which may be formed using various molybdenum-containing and selenium- containing compounds that can be added to an ink for printing, or deposited onto a substrate.
  • a thin film material photovoltaic absorber layer can be made with one or more polymeric precursors of this invention.
  • a polymeric precursor ink can be sprayed onto a stainless steel substrate using a spray pyrolysis unit in a glovebox in an inert atmosphere.
  • the spray pyrolysis unit may have an ultrasonic nebulizer, precision flow meters for inert gas carrier, and a tubular quartz reactor in a furnace.
  • the spray -coated substrate can be heated at a temperature of from about 25 °C to about 650 °C in an inert atmosphere, thereby producing a thin film material photovoltaic absorber layer.
  • a thin film material photovoltaic absorber layer can be made by providing a polymeric precursor ink which is filtered with a 0.45 micron filter, or a 0.3 micron filter.
  • the ink may be printed onto a polyethylene terephthalate substrate using a inkjet printer in a glovebox in an inert atmosphere.
  • a film of about 0.1 to 5 microns thickness can be deposited on the substrate.
  • the substrate can be removed and heated at a temperature of from about 100 °C to about 600 °C, or from about 100 °C to about 650 °C in an inert atmosphere, thereby producing a thin film material photovoltaic absorber layer.
  • a solar cell can be made by providing an electrode layer on a polyethylene terephthalate substrate.
  • a thin film material photovoltaic absorber layer can be coated onto the electrode layer as described above.
  • a buffer layer can be deposited onto the absorber layer.
  • a transparent conductive oxide layer can be deposited onto the buffer layer, thereby forming an embodiment of a solar cell.
  • Methods for making a photovoltaic absorber layer on a substrate include providing one or more polymeric precursor compounds, providing a substrate, spraying the compounds onto the substrate, and heating the substrate at a temperature of from about 100 °C to about 600 °C, or of from about 100 °C to about 650 °C in an inert atmosphere, thereby producing a photovoltaic absorber layer having a thickness of from 0.01 to 100 micrometers.
  • the spraying can be done in spray coating, spray deposition, jet deposition, or spray pyrolysis.
  • the substrate may be glass, metal, polymer, plastic, or silicon.
  • the photovoltaic absorber layer made by the methods of this disclosure may have an empirical formula Cu x (Ini_ y Ga y ) v (Si- z Se z ) w , where x is from 0.8 to 0.95, y is from 0 to 0.5, and z is from 0 to 1, v is from 0.95 to 1.05, and w is from 1.8 to 2.2. In some embodiments, w is from 2.0 to 2.2.
  • the photovoltaic absorber layer made by the methods of this disclosure may have an empirical formula empirical formula Cu x In y (Si- z Se z ) w , where x is from 0.8 to 0.95, y is from 0.95 to 1.05, z is from 0 to 1, and w is from 1.8 to 2.2.
  • Methods for making a photovoltaic absorber layer can include a step of sulfurization or selenization.
  • methods for making a photovoltaic absorber layer may include heating the compounds to a temperature of from about 20 °C to about 400 °C while depositing, spraying, coating, or printing the compounds onto the substrate.
  • Methods for making a photovoltaic absorber layer on a substrate include providing one or more polymeric precursor compounds, providing a substrate, depositing the compounds onto the substrate, and heating the substrate at a temperature of from about 100 °C to about 650 °C, or from about 100 °C to about 600 °C, or from about 100 °C to about 400 °C, or from about 100 °C to about 300 °C in an inert atmosphere, thereby producing a photovoltaic absorber layer having a thickness of from 0.01 to 100 micrometers.
  • the depositing can be done in electrodepositing, electroplating, electroless plating, bath deposition, liquid deposition, solution deposition, layer-by-layer deposition, spin casting, or solution casting.
  • the substrate may be glass, metal, polymer, plastic, or silicon.
  • Methods for making a photovoltaic absorber layer on a substrate include providing one or more polymeric precursor inks, providing a substrate, printing the inks onto the substrate, and heating the substrate at a temperature of from about 100 °C to about 600 °C, or from about 100 °C to about 650 °C in an inert atmosphere, thereby producing a photovoltaic absorber layer having a thickness of from 0.01 to
  • the printing can be done in screen printing, inkjet printing, transfer printing, flexographic printing, or gravure printing.
  • the substrate may be glass, metal, polymer, plastic, or silicon.
  • the method may further include adding to the ink an additional indium-containing compound, such as In(SeR)3, wherein R is alkyl or aryl.
  • an ink composition for depositing, spraying, or printing may contain an additional indium-containing compound, or an additional gallium- containing compound.
  • additional indium-containing compounds include In(SeR)3, wherein R is alkyl or aryl.
  • additional gallium-containing compounds include Ga(SeR)3, wherein R is alkyl or aryl.
  • an ink may further contain In(Se n Bu)3 or Ga(Se n Bu)3, or mixtures thereof.
  • an ink may contain Na(ER), where E is S or Se and R is alkyl or aryl.
  • an ink may contain NaIn(ER) 4 , NaGa(ER) 4 , LiIn(ER) 4 , LiGa(ER) 4 , KIn(ER) 4 , or KGa(ER) 4 , where E is S or Se and R is alkyl or aryl.
  • a photovoltaic device of this invention can be used, for example, to convert solar light to electricity which can be provided to a commercial power grid.
  • solar cell refers to individual solar cell as well as a solar cell array, which can combine a number of solar cells.
  • the solar cell devices of this disclosure can be manufactured in modular panels.
  • the power systems of this disclosure can be made in large or small scale, including power for a personal use, as well as on a megawatt scale for a public use.
  • a power system of this disclosure may utilize a solar cell on a movable mounting, which may be motorized to face the solar cell toward the light.
  • a solar cell may be mounted on a fixed object in an optimal orientation.
  • Solar cells can be attached in panels in which various groups of cells are electrically connected in series and in parallel to provide suitable voltage and current characteristics.
  • Solar cells can be installed on rooftops, as well as outdoor, sunlighted surfaces of all kinds. Solar cells can be combined with various kinds of roofing materials such as roofing tiles or shingles.
  • a power system can include a solar cell array and a battery storage system.
  • a power system may have a diode-containing circuit and a voltage-regulating circuit to prevent the battery storage system from draining through the solar cells or from being overcharged.
  • a power system can be used to provide power for lighting, electric vehicles, electric buses, electric airplanes, pumping water, desalinization of water, refrigeration, milling, manufacturing, and other uses.
  • Sources of silver include silver metal, Ag(I), silver nitrates, silver halides, silver chlorides, silver acetates, silver alkoxides, and mixtures thereof.
  • Sources of alkali metal ions include alkali metals, alkali metal salts, alkali metal halides, alkali metal nitrates, selenides including Na 2 Se, Li 2 Se, and K 2 Se, as well as organometallic compounds such as alkyllithium compounds.
  • Sources of copper include copper metal, Cu(I), Cu(II), copper halides, copper chlorides, copper acetates, copper alkoxides, copper alkyls, copper diketonates, copper 2,2,6,6,-tetramethyl-3,5,-heptanedionate, copper 2,4-pentanedionate, copper hexafluoroacetylacetonate, copper acetylacetonate, copper ketoesters, and mixtures thereof.
  • Sources of indium include indium metal, trialkylindium, indium halides, indium chlorides, dimethylindium chlorides, trimethylindium, indium acetylacetonates, indium hexafluoropentanedionates, indium methoxyethoxides, indium methyltrimethylacetylacetates, indium trifluoropentanedionates, and mixtures thereof.
  • Sources of gallium include gallium metal, trialkylgallium, gallium halides, gallium fluorides, gallium chlorides, gallium iodides, diethylgallium chlorides, gallium acetate, gallium 2,4-pentanedionate, gallium ethoxide, gallium 2,2,6,6,- tetramethylheptanedionate, and mixtures thereof.
  • Sources of aluminum include aluminum metal, trialkylaluminum, aluminum halides, aluminum fluorides, aluminum chlorides, aluminum iodides,
  • diethylaluminum chlorides aluminum acetate, aluminum 2,4-pentanedionate, aluminum ethoxide, aluminum 2,2,6,6,-tetramethylheptanedionate, and mixtures thereof.
  • atom percent, atom%, or at% refers to the amount of an atom with respect to the final material in which the atoms are incorporated.
  • 0.5 at% Na in CIGS refers to an amount of sodium atoms equivalent to 0.5 atom percent of the atoms in the CIGS material.
  • the term (X,Y) when referring to compounds or atoms indicates that either X or Y, or a combination thereof may be found in the formula.
  • (S,Se) indicates that atoms of either sulfur or selenium, or any combination thereof may be found.
  • the amount of each atom can be specified.
  • the notation (0.75 In,0.25 Ga) indicates that the atom specified by the symbols in the parentheses is indium in 75% of the compounds and gallium in the remaining 25% of the compounds, regardless of the identity any other atoms in the compound.
  • the term (X,Y) refers to approximately equal amounts of X and Y.
  • the atoms S, Se, and Te of Group 16 are referred to as chalcogens.
  • the letter “S” in CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS refers to sulfur or selenium or both.
  • the letter “C” in CIGS, CAIGS, CIGAS, and CAIGAS refers to copper.
  • the letter “A” in AIGS, CAIGS, AIGAS and CAIGAS which appears before the letters I and G refers to silver.
  • the letter “I” in CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS refers to indium.
  • the letter “G” in CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS refers to gallium.
  • the letter “A” in CIGAS, AIGAS and CAIGAS which appears after the letters I and G refers to aluminum.
  • CAIGAS therefore could also be represented as Cu/Ag/In/Ga/Al/S/Se.
  • CIGS, AIGS, and CAIGS include the variations C(I,G)S, A(I,G)S, and CA(I,G)S, respectively, and CIS, AIS, and CAIS, respectively, as well as CGS, AGS, and CAGS, respectively, unless described otherwise.
  • CIGAS, AIGAS and CAIGAS include the variations C(I,G,A)S,
  • CAIGAS refers to variations in which either C or Silver is zero, for example, AIGAS and CIGAS, respectively, as well as variations in which Aluminum is zero, for example, CAIGS, AIGS, and CIGS.
  • CIGS includes the terms CIGSSe and CIGSe, and these terms refer to compounds or materials containing
  • AIGS includes the terms AIGSSe and AIGSe, and these terms refer to compounds or materials containing silver/indium/gallium/sulfur/selenium, which may contain sulfur or selenium or both.
  • CAIGS includes the terms CAIGSSe and CAIGSe, and these terms refer to compounds or materials containing
  • copper/silver/indiuriVgallium/sulfur/selenium which may contain sulfur or selenium or both.
  • chalcogenide refers to a compound containing one or more chalcogen atoms bonded to one or more metal atoms.
  • alkyl refers to a hydrocarbyl radical of a saturated aliphatic group, which can be a branched or unbranched, substituted or unsubstituted aliphatic group containing from 1 to 22 carbon atoms. This definition applies to the alkyl portion of other groups such as, for example, cycloalkyl, alkoxy, alkanoyl, aralkyl, and other groups defined below.
  • cycloalkyl refers to a saturated, substituted or unsubstituted cyclic alkyl ring containing from 3 to 12 carbon atoms.
  • C(l-5)alkyl includes C(l)alkyl, C(2)alkyl, C(3)alkyl, C(4)alkyl, and C(5)alkyl.
  • C(3-22)alkyl includes C(l)alkyl, C(2)alkyl, C(3)alkyl, C(4)alkyl, C(5)alkyl, C(6)alkyl, C(7)alkyl, C(8)alkyl, C(9)alkyl, C(10)alkyl, C(l l)alkyl, C(12)alkyl, C(13)alkyl, C(14)alkyl, C(15)alkyl, C(16)alkyl, C(17)alkyl, C(18)alkyl, C(19)alkyl, C(20)alkyl, C(21)alkyl, and
  • an alkyl group may be designated by a term such as Me (methyl), Et (ethyl), Pr (any propyl group), n Pr (n-Pr, n-propyl), 'Pr (i-Pr, isopropyl), Bu (any butyl group), "Bu (n-Bu, n-butyl), 3 ⁇ 4u (i-Bu, iso-butyl), s Bu (s-Bu, sec -butyl), and l Bu (t-Bu, tert-butyl).
  • alkenyl refers to an unsaturated, branched or unbranched, substituted or unsubstituted alkyl or cycloalkyl having 2 to 22 carbon atoms and at least one carbon-carbon double bond.
  • alkynyl refers to an unsaturated, branched or unbranched, substituted or unsubstituted alkyl or cycloalkyl having 2 to 22 carbon atoms and at least one carbon-carbon triple bond.
  • alkoxy refers to an alkyl, cycloalkyl, alkenyl, or alkynyl group covalently bonded to an oxygen atom.
  • alkylamino refers to the group -NRR', where R and R' are each either hydrogen or alkyl, and at least one of R and R is alkyl.
  • Alkylamino includes groups such as piperidino wherein R and R form a ring.
  • alkylaminoalkyl refers to -alkyl-NRR.
  • aryl refers to any stable monocyclic, bicyclic, or polycyclic carbon ring system of from 4 to 12 atoms in each ring, wherein at least one ring is aromatic. Some examples of an aryl include phenyl, naphthyl, tetrahydro- naphthyl, indanyl, and biphenyl. Where an aryl substituent is bicyclic and one ring is non-aromatic, it is understood that attachment is to the aromatic ring. An aryl may be substituted or unsubstituted.
  • heteroaryl refers to any stable monocyclic, bicyclic, or polycyclic carbon ring system of from 4 to 12 atoms in each ring, wherein at least one ring is aromatic and contains from 1 to 4 heteroatoms selected from oxygen, nitrogen and sulfur. Phosphorous and selenium may be a heteroatom.
  • a heteroaryl examples include acridinyl, quinoxalinyl, pyrazolyl, indolyl, benzotriazolyl, furanyl, thienyl, benzothienyl, benzofuranyl, quinolinyl, isoquinolinyl, oxazolyl, isoxazolyl, pyrazinyl, pyridazinyl, pyridinyl, pyrimidinyl, pyrrolyl, and tetrahydroquinolinyl.
  • a heteroaryl includes the N-oxide derivative of a nitrogen- containing heteroaryl.
  • heterocycle or “heterocyclyl” as used herein refers to an aromatic or nonaromatic ring system of from five to twenty -two atoms, wherein from 1 to 4 of the ring atoms are heteroatoms selected from oxygen, nitrogen, and sulfur.
  • Phosphorous and selenium may be a heteroatom.
  • a heterocycle may be a heteroaryl or a dihydro or tetrathydro version thereof.
  • aroyl refers to an aryl radical derived from an aromatic carboxylic acid, such as a substituted benzoic acid.
  • aralkyl refers to an aryl group bonded to an alkyl group, for example, a benzyl group.
  • hydroxyl as used herein refers to -OH or -O " .
  • nitrile or “cyano” as used herein refers to -CN.
  • halogen or “halo” refers to fluoro (-F), chloro (-C1), bromo (-Br), and iodo (-1).
  • substituted refers to an atom having one or more substitutions or substituents which can be the same or different and may include a hydrogen substituent.
  • alkyl, cycloalkyl, alkenyl, alkynyl, alkoxy, alkanoyl, alkanoyloxy, alkylamino, alkylaminoalkyl, aryl, heteroaryl, heterocycle, aroyl, and aralkyl as used herein refer to groups which include substituted variations.
  • Substituted variations include linear, branched, and cyclic variations, and groups having a substituent or substituents replacing one or more hydrogens attached to any carbon atom of the group.
  • Substituents that may be attached to a carbon atom of the group include alkyl, cycloalkyl, alkenyl, alkynyl, alkoxy, alkanoyl, alkanoyloxy, alkylamino, alkylaminoalkyl, aryl, heteroaryl, heterocycle, aroyl, aralkyl, acyl, hydroxyl, cyano, halo, haloalkyl, amino, aminoacyl, alkylaminoacyl, acyloxy, aryloxy, aryloxyalkyl, mercapto, nitro, carbamyl, carbamoyl, and heterocycle.
  • ethyl includes without limitation -CH 2 CH 3 , -CHFCH 3 , -CF 2 CH 3 , -CHFCH 2 F, -CHFCHF 2 , -CHFCF 3 , -CF 2 CH 2 F, -CF 2 CHF 2 , -CF 2 CF 3 , and other variations as described above.
  • a substituent may itself be further substituted with any atom or group of atoms. It will be understood that “substitution” or “substituted with” refers to such substitution that is in accordance with permitted valence of the substituted atom and the substituent. As used herein, the term “substituted” includes all permissible substituents.
  • a compound may contain one or more chiral centers.
  • Compounds containing one or more chiral centers may include those described as an "isomer,” a “stereoisomer,” a “diastereomer,” an "enantiomer,” an “optical isomer,” or as a “racemic mixture.”
  • Conventions for stereochemical nomenclature for example the stereoisomer naming rules of Cahn, Ingold and Prelog, as well as methods for the determination of stereochemistry and the separation of stereoisomers are known in the art. See, for example, Michael B. Smith and Jerry March, March 's Advanced Organic Chemistry, 5th edition, 2001.
  • This invention encompasses any and all tautomeric, solvated or unsolvated, hydrated or unhydrated forms, as well as any atom isotope forms of the compounds and compositions disclosed herein.
  • This invention encompasses any and all crystalline polymorphs or different crystalline forms of the compounds and compositions disclosed herein.
  • CI -8 includes without limitation the species CI, C2, C3, C4, C5, C6, C7, and C8.
  • a photovoltaic absorber layer was made by the following process.
  • a photovoltaic absorber layer was made by the following process.
  • EtsSiH triethylsilane
  • a photovoltaic absorber layer was made by the following process.
  • a photovoltaic absorber layer is made by the following process.
  • a photovoltaic absorber layer was made by the following process.
  • a solar cell was made by the following process.
  • a first ink was prepared by dissolving ⁇ Cu 1 . 1 Ino.sGao.5(Se t Bu) 1 . 1 (Se n Bu)3.o ⁇ with 0.5 at% Na added supplied via NaIn(Se n Bu) 4 , in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box.
  • the resulting Cu-enriched ink was filtered through a 0.2 ⁇ PTFE syringe filter prior to use.
  • a second ink was prepared by dissolving
  • the resulting Cu-deficient ink was filtered through a 0.2 ⁇ PTFE syringe filter prior to use.
  • deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 8 minutes (pre-heated furnace) in the presence of Se vapor.
  • the resulting CIGS film had a thickness of 1.8 ⁇ .
  • the solar cell was finished by the following general procedure: treating the substrate with a chemical bath deposition (CBD) of In 2 Se 3 .
  • CBD chemical bath deposition
  • 100 mL of an aqueous stock solution of 0.025 M ⁇ (3 ⁇ 4 and 100 mL of an aqueous stock solution of 0.5 M thioacetamide were diluted in 300 mL DI water and quickly transferred to a preheated 65°C 500 mL CBD vessel.
  • the substrate was quickly transferred to the CBD vessel and soaked for 15 min at 65°C.
  • the substrate was then washed with water 3 times.
  • a buffer layer of CdS was made shortly thereafter by chemical bath deposition.
  • the substrate was placed in a 500 mL CBD vessel and pre-heated to 65°C.
  • Fig. 14 shows a plan view micrograph of the CIGS thin film of the solar cell.
  • Fig. 14 illustrates superior grain size, morphology and overall density and dispersion.
  • the solar cell current-voltage curve is shown in Fig. 15.
  • the conversion efficiency of the solar cell was 15.5%
  • the I-V performance parameters are shown in Table 2. Measurements were made under simulated AM1.5G sunlight at
  • the cell area was 0.332 cm 2 .
  • a solar cell was made by the following process.
  • a first ink was prepared by dissolving ⁇ Cui.iIno.7Gao.3(Se t Bu)i.i(Se n Bu)3.o ⁇ with 0.5 at% Na added supplied via NaIn(Se n Bu) 4 , in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box.
  • the resulting Cu-enriched ink was filtered through a 0.2 ⁇ PTFE syringe filter prior to use.
  • a second ink was prepared by dissolving ⁇ Cuo.85lno.5Ga 0 .5(SeT u)o.85(Se n Bu)3.o with 0.5 at% Na added supplied via NaIn(Se n Bu) 4 , in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box.
  • the resulting Cu-deficient ink was filtered through a 0.2 ⁇ PTFE syringe filter prior to use.
  • deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 15 minutes (pre-heated furnace) in the presence of Se vapor.
  • the resulting CIGS film had a thickness of 1.5 ⁇ .
  • the solar cell was finished by the following general procedure: treating the substrate with a chemical bath deposition (CBD) of In 2 Se 3 .
  • CBD chemical bath deposition
  • 100 mL of an aqueous stock solution of 0.025 M ⁇ (3 ⁇ 4 and 100 mL of an aqueous stock solution of 0.5 M thioacetamide were diluted in 300 mL DI water and quickly transferred to a preheated 65°C 500 mL CBD vessel.
  • the substrate was quickly transferred to the CBD vessel and soaked for 15 min at 65°C.
  • the substrate was then washed with water 3 times.
  • a buffer layer of CdS was made shortly thereafter by chemical bath deposition.
  • the substrate was placed in a 500 mL CBD vessel and pre-heated to 65°C.
  • Fig. 16 shows a plan view micrograph of the CIGS thin film of the solar cell.
  • Fig. 16 illustrates superior grain size, morphology and overall density and dispersion.
  • the solar cell current-voltage curve is shown in Fig. 17.
  • the conversion efficiency of the solar cell was 15.2%, and the I-V performance parameters are shown in Table 3. Measurements were made under simulated AM1.5G sunlight at
  • the cell area was 0.332 cm 2 .
  • a solar cell was made by the following process.
  • a first ink was prepared by dissolving ⁇ Cui.iIno.5Gao.5(SeT u)i.i(Se n Bu)3.o ⁇ with 0.5 at% Na added supplied via NaIn(Se n Bu) 4 , in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box.
  • the resulting Cu-enriched ink was filtered through a 0.2 ⁇ PTFE syringe filter prior to use.
  • a second ink was prepared by dissolving
  • Mo-coated sodalime glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 10 mm/s.
  • the wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 5 minutes to dry and to convert the polymer to a Cu-enriched CIGS material.
  • a second aliquot of ink was deposited and converted in a similar manner.
  • the resulting Cu-enriched CIGS film was annealed at 550 °C for 15 minutes in a pre-heated furnace.
  • the resulting CIGS film had a thickness of 1.5 ⁇ .
  • the solar cell was finished by the general procedure given in Example 8.
  • Fig. 18 shows a plan view micrograph of the CIGS thin film of the solar cell.
  • Fig. 18 illustrates superior grain size, morphology and overall density and dispersion.
  • the solar cell current-voltage curve is shown in Fig. 19.
  • the conversion efficiency of the solar cell was 15.1%, and the I-V performance parameters are shown in Table 4. Measurements were made under simulated AMI .5G sunlight at
  • the cell area was 0.332 cm 2 .
  • a solar cell was made by the following process.
  • a first ink was prepared by dissolving ⁇ Cui ⁇ Ino Ga 0 j(SeT u)u(Se n Bu)3.o ⁇ with 0.5 at% Na added supplied via NaIn(Se n Bu) 4 , in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box.
  • the resulting Cu-rich ink was filtered through a 0.2 ⁇ PTFE syringe filter prior to use.
  • a second ink was prepared by separately dissolving
  • the resulting CIGS film had a thickness of 1.8 ⁇ .
  • the solar cell was finished by the general procedure given in Example 8.
  • the conversion efficiency of the solar cell was 14.5%. Measurements were made under simulated AM1.5G sunlight at 1000W/m 2 and 25°C.
  • the cell area was 0.332 cm 2 .
  • a solar cell was made by the following process.
  • a first ink was prepared by dissolving ⁇ Cui.iIno.7Gao.3(SeT u)i.i(Se n Bu)3.o ⁇ with 0.5 at% Na added supplied via NaIn(Se n Bu) 4 , in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box.
  • the resulting Cu-enriched ink was filtered through a 0.2 ⁇ PTFE syringe filter prior to use.
  • a second ink was prepared by dissolving
  • the resulting CIGS film had a thickness of 1.5 ⁇ .
  • the solar cell was finished by the general procedure given in Example 8.
  • the conversion efficiency of the solar cell was 13.8%. Measurements were made under simulated AM1.5G sunlight at 1000W/m 2 and 25°C. The cell area was 0.332 cm 2 . It is significant that this measurement of the solar cell conversion efficiency was made in the absence of an antireflective coating. The conversion efficiency is expected to be significantly higher with use of an antireflective coating.
  • a solar cell was made by the following process.
  • a first ink was prepared by dissolving ⁇ Cu 1 . 1 Ino.7Gao.3(Se t Bu) 1 . 1 (Se n Bu)3.o ⁇ with 0.5 at% Na added supplied via NaIn(Se n Bu) 4 , in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box.
  • the resulting Cu-enriched ink was filtered through a 0.2 ⁇ PTFE syringe filter prior to use.
  • a second ink was prepared by dissolving
  • a third ink was prepared by dissolving
  • a fourth ink was prepared by dissolving
  • the final deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 5 minutes (pre-heated furnace) in the presence of Se vapor.
  • the resulting CIGS film had a thickness of 1.5 ⁇ .
  • the solar cell was finished by the general procedure given in Example 8.
  • the conversion efficiency of the solar cell was 13.6%. Measurements were made under simulated AM1.5G sunlight at 1000W/m 2 and 25°C.
  • the cell area was 0.332 cm 2 .

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  • Inks, Pencil-Leads, Or Crayons (AREA)

Abstract

Processes and compositions for making photovoltaic absorber materials for thin film solar cells including CIGS are disclosed. The processes and compositions achieve high thickness per pass for efficient manufacturing. Processes include depositing one or more layers of an ink onto a substrate, wherein the ink contains one or more polymeric precursor compounds. An ink for making a photovoltaic absorber material may contain one or more precursor compounds and an additive dissolved in one or more solvents, including hydrocarbon solvents.

Description

SOLUBLE PRECURSORS AND SOLUTION-BASED PROCESSES FOR
PHOTOVOLTAICS
TECHNICAL FIELD
This invention relates to processes and compositions used to prepare semiconductor and optoelectronic materials and devices including thin film solar cells. In particular, this invention relates to solution-based processes and
compositions and inks containing soluble polymeric precursor compounds for preparing CIGS solar cells and other solar cells. The processes and compositions provide high thickness per pass for efficient manufacturing. BACKGROUND
One way to make a thin film photovoltaic material, for example, a CIGS material, is to deposit an ink that contains a CIGS polymeric precursor compound onto a substrate. The ink can be converted to a thin film which ultimately can be transformed into a CIGS photovoltaic material.
For example, in WO2011/017236 A2, WO2012/037382 A2, and
PCT/US2012/028717, CIGS polymeric precursor inks are disclosed which contain a CIGS polymeric precursor compound that has the empirical formula
Cux(Ini-yGay)v((Si-zSez)R)w, wherein x is from 0.5 to 1.5, y is from 0 to 1, z is from 0 to 1, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, which are independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, and silyl. The ratio of Cu to (In+Ga) can be deficient, i.e. less than 1, which is the predetermined ratio that is desired for a CIGS photovoltaic absorber material.
Disadvantages in the production of thin film photovoltaic devices are the limited ability to control product properties through process parameters and low yields for commercial processes. Absorber layers suffer from the appearance of different solid phases, as well as imperfections in crystalline particles and the quantity of voids, cracks, and other defects in the layers.
In general, it is a significant problem to produce a relatively thick photovoltaic "thin film" on a substrate that is free of such defects in order to achieve an efficient and scalable manufacturing process for solar cells and other devices. In depositing source compounds for photovoltaics, it is desirable to have the thickness per pass above 100 nanometers.
In general, CIGS materials are complex, having many possible solid phases. Moreover, methods for large scale manufacturing of CIGS and related thin film solar cells can be difficult because of the chemical processes involved. In general, large scale processes for solar cells are unpredictable because of the difficulty in controlling numerous chemical and physical parameters involved in forming an absorber layer of suitable quality on a substrate, as well as forming the other components of an efficient solar cell assembly, both reproducibly and in high yield.
For example, there is a general need for a solution-based process for CIGS materials for solar cells. The solution-based process should use readily available solvents, for example hydrocarbons, and be production-friendly and relatively safe.
There has long been a need for compositions and a solution-based process that can be used for making photovoltaic absorber materials for solar cells having high efficiencies and thickness of substrate film.
What is needed are compounds, compositions and processes to produce materials for photovoltaic layers, especially thin film layers for solar cell devices and other products.
BRIEF SUMMARY This invention relates to processes and compositions used to prepare semiconductor and optoelectronic materials and devices including thin film solar cells. In particular, this invention relates to solution-based processes and
compositions containing polymeric precursors for preparing CIGS and other solar cells.
Embodiments of this disclosure include the following:
A process for making a photovoltaic absorber layer on a substrate comprising:
(a) providing a substrate coated with an electrical contact layer;
(b) depositing a layer of an ink onto the contact layer of the substrate, wherein the ink contains one or more polymeric precursor compounds; and
(c) heating the substrate;
wherein the polymeric precursor compounds have the empirical formula (Cui_xAgx)u(MBYy_tMB2 yMB3t)((Si_zSez)R)w, wherein MB1 is In, MB2 is Ga, and MB3 is Al, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.6 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from alkyl groups.
The process above, wherein the thickness of the layer made by one pass through steps (b) and (c), in which one deposition of ink is done, is from 100 to 500 nanometers, or from 150 to 400 nanometers, or from 150 to 300 nanometers.
The process above, wherein the polymeric precursor compounds are CIGS polymeric precursor compounds having the empirical formula
Cuu(Ini_yGay)((Si-zSez)R)w, wherein x is 0, y is between 0 and 1 so that both In and Ga are present, and t is 0.
The process above, wherein the R groups are independently selected from n- butyl, sec -butyl, iso-butyl, and t-butyl.
The process above, wherein the R groups are a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl groups, or a mixture of n-butyl and sec- butyl groups, or a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and sec -butyl and iso-butyl groups, or a mixture of n-butyl and sec -butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl and t-butyl groups, or a mixture of sec- butyl and iso-butyl and t-butyl groups.
The process above, wherein the R groups are independently selected from n- pentyl, isopentyl, sec-pentyl, 1 -methylpentyl, 2-methylpentyl, 3-methylpentyl, 4- methylpentyl, 1-ethylbutyl, 2-ethylbutyl, tert-pentyl, 1 , 1 -dimethylbutyl, 1,2- dimethylbutyl, 1,3-dimethylbutyl, 2,3-dimethylbutyl, cyclopentyl, and mixtures of any of the foregoing.
The process above, wherein the R groups are independently selected from n- hexyl, 1 -methylhexyl, 2 -methylhexyl, 3 -methylhexyl, 4-methylhexyl, 5 -methylhexyl,
1- ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1-n-propylbutyl, 1-iso-propylbutyl, 1-iso- propyl-2-methylpropyl, 1-methylheptyl, 2-methylheptyl, 3-methylheptyl, 4- methylheptyl, 5-methylheptyl, 6-methylheptyl, 1 -ethylhexyl, 2-ethylhexyl, 3- ethylhexyl, 4-ethylhexyl, 1-n-propylpentyl, 2-n-propylpentyl, 1 -iso-propylpentyl, 2- iso-propylpentyl, 1-n-butylbutyl, 1-iso-butylbutyl, 1-sec-butylbutyl, 1 -tert-butylbutyl,
2 - tert-butylbutyl, tert-butyl, l-ethyl-2-methylpropyl, 1, 1-dimethylpentyl, 1,2- dimethylpentyl, 1,3-dimethylpentyl, 1 ,4-dimethylpentyl, 2,2-dimethylpentyl, 2,3- dimethylpentyl, 2,4-dimethylpentyl, 3,3-dimethylpentyl, 3,4-dimethylpentyl, 1-ethyl- 1 -methylbutyl, l-ethyl-2-methylbutyl, l-ethyl-3-methylbutyl, 2-ethyl-l-methylbutyl, 2-ethyl-3-methylbutyl, 1,1-dimethylhexyl, 1,2-dimethylhexyl, 1,3-dimethylhexyl, 1,4- dimethylhexyl, 1,5-dimethylhexyl, 2,2-dimethylhexyl, 2,3-dimethylhexyl, 2,4- dimethylhexyl, 2,5-dimethylhexyl, 3,3-dimethylhexyl, 3,4-dimethylhexyl, 3,5- dimethylhexyl, 4,4-dimethylhexyl, 4,5-dimethylhexyl, l-ethyl-2-methylpentyl, 1- ethyl-3-methylpentyl, 1 -ethyl-4-methylpentyl, 2-ethyl-l-methylpentyl, 2-ethyl-2- methylpentyl, 2-ethyl-3-methylpentyl, 2-ethyl-4-methylpentyl, 3-ethyl-l- methylpentyl, 3-ethyl-2-methylpentyl, 3-ethyl-3-methylpentyl, 3-ethyl-4- methylpentyl, 1-n-propyl-l-methylbutyl, 1 -n-propyl-2-methylbutyl, l-n-propyl-3- methylbutyl, 1-iso-propyl-l-methylbutyl, l-iso-propyl-2-methylbutyl, l-iso-propyl-3- methylbutyl, 1,1-diethylbutyl, 1,2-diethylbutyl, 1,1,2-trimethylpropyl, 1,2,2- trimethylpropyl, 1 , 1 ,2-trimethylbutyl, 1,1,3-trimethylbutyl, 1,2,3-trimethylbutyl,
1.2.2- trimethylbutyl, 1,3,3-trimethylbutyl, 2,3,3-trimethylbutyl, 1,1,2-trimethylpentyl,
1.1.3- trimethylpentyl, 1,1,4-trimethylpentyl, 1,2,2-trimethylpentyl, 1,2,3- trimethylpentyl, 1,2,4-trimethylpentyl, 1,3,4-trimethylpentyl, 2,2,3-trimethylpentyl, 2,2,4-trimethylpentyl, 2,3,4-trimethylpentyl, 1,3,3-trimethylpentyl, 2,3,3- trimethylpentyl, 3,3,4-trimethylpentyl, 1,4,4-trimethylpentyl, 2,4,4-trimethylpentyl,
3.4.4- trimethylpentyl, 1 -ethyl- 1,2-dimethylbutyl, l-ethyl-l,3-dimethylbutyl, 1-ethyl- 2,3-dimethylbutyl, 2-ethyl-l,l-dimethylbutyl, 2-ethyl- 1,2-dimethylbutyl, 2-ethyl-l,3- dimethylbutyl, 2-ethyl-2,3-dimethylbutyl, cyclohexyl, methylcyclopentyl, methylcyclohexyl, 1,2-dimethylcyclohexyl, 1,3-dimethylcyclohexyl, 1,4- dimethylcyclohexyl, ethylcyclohexyl, and mixtures of any of the foregoing.
The process above, wherein the polymeric precursor compounds have a ratio of atoms of Group 11 to atoms of Group 13 of 0.60, 0.61, 0.62, 0.63, 0.64, 0.65, 0.66, 0.67, 0.68, 0.69, 0.70, or 0.71, or 0.72, or 0.73, or 0.74, or 0.75, or 0.76, or 0.77, or 0.78, or 0.79, or 0.80, or 0.81, or 0.82, or 0.83, or 0.84, or 0.85, or 0.86, or 0.87, or 0.88, or 0.89, or 0.90, or 0.91, or 0.92, or 0.93, or 0.94, or 0.95, or 0.96, or 0.97, or 0.98, or 0.99.
The process above, wherein the substrate has a layer of an adhesion promoter material on the electrical contact layer, wherein the adhesion promoter material is a CIGS material that is enriched in Cu so that the ratio of atoms of Cu to atoms of In and Ga, which is Cu/(In + Ga), is from 1 to 1.3, or from 1 to 1.2, or from 1 to 1.1.
The process above, further comprising applying heat, light, or radiation, or adding one or more chemical or crosslinking reagents to an ink before it is deposited.
The process above, further comprising repeating steps (b) and (c). The process above, wherein the heating step is a process comprising converting the layer at a temperature of from 100°C to 450°C.
The process above, further comprising annealing the layers at a temperature of from 450°C to 650°C, or annealing the layers at a temperature of from 450°C to 650°C in the presence of Se vapor.
The process above, wherein the inks contain from 0.01 to 2.0 atom percent sodium ions.
The process above, wherein the depositing is done by spraying, spray coating, spray deposition, spray pyrolysis, printing, screen printing, inkjet printing, aerosol jet printing, ink printing, jet printing, stamp printing, transfer printing, pad printing, flexographic printing, gravure printing, contact printing, reverse printing, thermal printing, lithography, electrophotographic printing, electrodepositing, electroplating, electroless plating, bath deposition, coating, wet coating, dip coating spin coating, knife coating, roller coating, rod coating, slot die coating, meyerbar coating, lip direct coating, capillary coating, liquid deposition, solution deposition, layer-by-layer deposition, spin casting, solution casting, or any combination of the foregoing.
The process above, wherein the substrate is a semiconductor, a doped semiconductor, silicon, gallium arsenide, insulators, glass, molybdenum glass, molybdenum-coated glass, silicon dioxide, titanium dioxide, zinc oxide, silicon nitride, a metal, a metal foil, molybdenum, aluminum, beryllium, cadmium, cerium, chromium, cobalt, copper, gallium, gold, lead, manganese, molybdenum, nickel, palladium, platinum, rhenium, rhodium, silver, stainless steel, steel, iron, strontium, tin, titanium, tungsten, zinc, zirconium, a metal alloy, a metal silicide, a metal carbide, a polymer, a plastic, a conductive polymer, a copolymer, a polymer blend, a polyethylene terephthalate, a polycarbonate, a polyester, a polyester film, a mylar, a polyvinyl fluoride, polyvinylidene fluoride, a polyethylene, a polyetherimide, a polyethersulfone, a polyetherketone, a polyimide, a polyvinylchloride, an acrylonitrile butadiene styrene polymer, a silicone, an epoxy, paper, coated paper, or a
combination of any of the foregoing.
A photovoltaic absorber material made by the process above.
A compound having the empirical formula
(Cui-xAgx)u(Ini_y_tGayAlt)((Si-zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.6 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from alkyl groups.
The compound above, wherein the compound is a CIGS polymeric precursor compound having the empirical formula Cuu(Ini_yGay)((Si-zSez)R)w, wherein x is 0, y is between 0 and 1 so that both In and Ga are present, and t is 0.
The compound above, wherein the R groups are independently selected from n-butyl, sec -butyl, iso-butyl, and t-butyl.
The compound above, wherein the R groups are independently selected from n-pentyl, isopentyl, sec-pentyl, 1 -methylpentyl, 2-methylpentyl, 3-methylpentyl, 4- methylpentyl, 1-ethylbutyl, 2-ethylbutyl, tert-pentyl, 1 , 1 -dimethylbutyl, 1,2- dimethylbutyl, 1,3-dimethylbutyl, 2,3 -dimethylbutyl, cyclopentyl, and mixtures of any of the foregoing.
The compound above, wherein the R groups are independently selected from n-hexyl, 1 -methylhexyl, 2-methylhexyl, 3-methylhexyl, 4-methylhexyl, 5- methylhexyl, 1-ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1 -n-propylbutyl, 1-iso- propylbutyl, l-iso-propyl-2-methylpropyl, 1 -methylheptyl, 2-methylheptyl, 3- methylheptyl, 4-methylheptyl, 5 -methylheptyl, 6-methylheptyl, 1-ethylhexyl, 2- ethylhexyl, 3-ethylhexyl, 4-ethylhexyl, 1 -n-propylpentyl, 2-n-propylpentyl, 1-iso- propylpentyl, 2-iso-propylpentyl, 1-n-butylbutyl, 1-iso-butylbutyl, 1-sec-butylbutyl, 1-tert-butylbutyl, 2-tert-butylbutyl, tert-butyl, l-ethyl-2-methylpropyl, 1,1- dimethylpentyl, 1,2-dimethylpentyl, 1,3 -dimethylpentyl, 1,4-dimethylpentyl, 2,2- dimethylpentyl, 2,3 -dimethylpentyl, 2,4-dimethylpentyl, 3,3-dimethylpentyl, 3,4- dimethylpentyl, 1 -ethyl- 1-methylbutyl, l-ethyl-2-methylbutyl, l-ethyl-3-methylbutyl, 2 -ethyl- 1-methylbutyl, 2-ethyl-3-methylbutyl, 1,1-dimethylhexyl, 1,2-dimethylhexyl, 1,3-dimethylhexyl, 1,4-dimethylhexyl, 1,5-dimethylhexyl, 2,2-dimethylhexyl, 2,3- dimethylhexyl, 2,4-dimethylhexyl, 2,5-dimethylhexyl, 3,3-dimethylhexyl, 3,4- dimethylhexyl, 3,5-dimethylhexyl, 4,4-dimethylhexyl, 4,5-dimethylhexyl, l-ethyl-2- methylpentyl, l-ethyl-3 -methylpentyl, 1 -ethyl-4-methylpentyl, 2-ethyl-l- methylpentyl, 2-ethyl-2-methylpentyl, 2-ethyl-3-methylpentyl, 2-ethyl-4- methylpentyl, 3 -ethyl- 1 -methylpentyl, 3-ethyl-2-methylpentyl, 3-ethyl-3- methylpentyl, 3-ethyl-4-methylpentyl, 1-n-propyl- 1-methylbutyl, 1 -n-propyl-2- methylbutyl, l-n-propyl-3-methylbutyl, 1-iso-propyl- 1-methylbutyl, l-iso-propyl-2- methylbutyl, l-iso-propyl-3-methylbutyl, 1,1-diethylbutyl, 1,2-diethylbutyl, 1,1,2- trimethylpropyl, 1,2,2-trimethylpropyl, 1,1,2-trimethylbutyl, 1,1,3-trimethylbutyl, 1,2,3-trimethylbutyl, 1 ,2,2-trimethylbutyl, 1,3,3-trimethylbutyl, 2,3,3-trimethylbutyl,
1.1.2- trimethylpentyl, 1, 1,3-trimethylpentyl, 1 , 1 ,4-trimethylpentyl, 1,2,2- trimethylpentyl, 1,2,3-trimethylpentyl, 1,2,4-trimethylpentyl, 1,3,4-trimethylpentyl,
2.2.3- trimethylpentyl, 2,2,4-trimethylpentyl, 2,3,4-trimethylpentyl, 1,3,3- trimethylpentyl, 2,3,3-trimethylpentyl, 3,3,4-trimethylpentyl, 1 ,4,4-trimethylpentyl,
2.4.4- trimethylpentyl, 3 ,4,4-trimethylpentyl, 1 -ethyl- 1,2-dimethylbutyl, 1 -ethyl- 1,3- dimethylbutyl, l-ethyl-2,3-dimethylbutyl, 2-ethyl-l, l-dimethylbutyl, 2-ethyl- 1,2- dimethylbutyl, 2-ethyl-l,3-dimethylbutyl, 2-ethyl-2,3-dimethylbutyl, cyclohexyl, methylcyclopentyl, methylcyclohexyl, 1,2-dimethylcyclohexyl, 1,3- dimethylcyclohexyl, 1 ,4-dimethylcyclohexyl, ethylcyclohexyl, and mixtures of any of the foregoing.
An ink for making a photovoltaic absorber material comprising one or more precursor compounds and an additive dissolved in one or more solvents.
The ink above, wherein the precursor compounds are polymeric precursor compounds have the empirical formula (Cui-xAgx)u(Ini_y_tGayAlt)((Si-zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from n-propyl, isopropyl, n-butyl, iso- butyl, sec-butyl, t-butyl, n-pentyl.
The ink above, wherein the additive is a compound having the one of the formulas AR4, R3A-AR3, or R2A-Q-AR2, wherein A is Si, Ge, or Sn, Q is -(CR2)n-, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
The ink above, wherein the additive is triethylsilane.
The ink above, wherein the additive is an siloxane, germoxane or stannoxane compound having the formula (R2AO)x, wherein x is 2 to 8, A is Si, Ge, or Sn, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
The ink above, wherein the additive is a diorganosiloxane compound or siloxane fluid.
The ink above, wherein the additive is a hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, or
dodecamethylcyclohexasiloxane.
The ink above, wherein the additive is at a concentration of from 0.1% to 15% (v/v), or from 0.1% to 10%, or from 0.1% to 5%. The ink of claim 23, wherein the solvents are selected from aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, xylene, ethers, diethyl ether, tetrahydofuran, 2-methyltetrahydofuran, siloxanes, cyclosiloxanes, silicone fluids, acetonitrile, esters, acetates, ethyl acetate, butyl acetate, acrylates, isobornyl acrylate, ketones, acetone, methyl ethyl ketone, cyclohexanone, cyclopentanone, lactams, N-methyl pyrrolidone, N-(2-hydroxyethyl)-pyrrolidone, cyclic acetals, cyclic ketals, aldehydes, alcohol, methanol, ethanol, isopropyl alcohol, thiols, butanol, butanediol, glycerols, alkoxyalcohols, glycols, l-methoxy-2-propanol, acetone, ethylene glycol, propylene glycol, propylene glycol laurate, ethylene glycol ethers, diethylene glycol, triethylene glycol monobutylether, propylene glycol monomethylether, 1 ,2-hexanediol, and mixtures thereof.
This summary, taken along with the detailed description of the invention, as well as the figures, the appended examples and claims, as a whole, encompass the disclosure of the invention.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 : Fig. 1 shows an embodiment of a CIGS polymeric precursor compound that is soluble in organic solvents. As shown in Fig. 1, the structure of the polymeric precursor compound can be represented as a polymer chain of repeating units: A, which is (MA(ER)(ER)}, and B, which is (MB(ER)(ER)}, where MA is a Group 11 atom, MB is a Group 13 atom, E is a chalcogen, and R is a functional group. The structure of the polymer can be represented by the formula shown in Fig. 1 that tallies the stoichiometry of the atoms and groups in the chain. FIG. 2: Schematic representation of embodiments of this invention in which polymeric precursors and ink compositions are deposited onto particular substrates by methods including spraying, coating, and printing, and are used to make
semiconductor and optoelectronic materials and devices, as well as energy conversion systems.
Schematic representation of a solar cell embodiment of this invention. FIG. 4: Schematic representation of steps of a process to make a layered substrate in which a single layer of a polymeric precursor is deposited on a substrate.
FIG. 5: Schematic representation of steps of a process to make a layered substrate in which a first layer, a second layer, and a third layer are deposited on a substrate 200. The optional first layer 205 can be composed of a polymeric precursor compound enriched in the quantity of a Group 11 atom. The second layer 210 may be composed of a polymeric precursor compound deficient in the quantity of a Group 1 1 atom. The optional third layer 215 can be highly deficient in the quantity of a Group 11 atom. For example, the third layer 215 can be composed of one or more layers of one or more In or Ga monomer compounds.
FIG. 6: Schematic representation of steps of a process to make a layered substrate in which a base layer, a chalcogen layer, a balance layer, and a second chalcogen layer are deposited on a substrate.
FIG. 7: Schematic representation of steps of a process to make a layered substrate in which a layer containing atoms of Group 13 and a chalcogen and a second layer containing atoms of Groups 11 and 13 are deposited on a substrate. The second layer can optionally contain atoms of a chalcogen.
FIG. 8: Schematic representation of steps of a process to make a layered substrate in which a number of layers, n, are deposited on a substrate. Each deposited layer can contain atoms of any combination of Groups 11, 13, and chalcogen.
FIG. 9: Fig. 9 shows an embodiment of a polymeric precursor compound. As shown in Fig. 9, the structure of the compound can be represented by the formula
(RE)2BABABB. FIG. 10: Fig. 10 shows an embodiment of a polymeric precursor compound. As shown in Fig. 10, the structure of the compound can be represented by the formula (RE)2B AB ABB AB AB . FIG. 1 1 : Fig. 1 1 shows an embodiment of a polymeric precursor compound. As shown in Fig. 1 1, the structure of the compound can be represented by the formula (RE)2BA(BA)nBB. FIG. 12: Fig. 12 shows an embodiment of a polymeric precursor compound. As shown in Fig. 12, the structure of the compound can be represented by the formula (RE)2BA(BA)nB(BA)mB.
FIG. 13: Fig. 13 shows an embodiment of a polymeric precursor compound. As shown in Fig. 13, the structure of the compound can be represented by the formula cyclic(BA)4.
FIG. 14: Fig. 14 shows a plan view micrograph of a CIGS thin film absorber material. The guide marker shows 1 micron length.
FIG. 15: Fig. 15 shows the I-V curve of a finished solar cell embodiment. The conversion efficiency was 15.5% without using any antireflective coating.
FIG. 16: Fig. 16 shows a plan view micrograph of a CIGS thin film absorber material. The guide marker shows 1 micron length.
FIG. 17: Fig. 17 shows the I-V curve of a finished solar cell embodiment. The conversion efficiency was 15.2% without using any antireflective coating. FIG. 18: Fig. 18 shows a plan view micrograph of a CIGS thin film absorber material. The guide marker shows 1 micron length.
FIG. 19: Fig. 19 shows the I-V curve of a finished solar cell embodiment. The conversion efficiency was 15.1% without using any antireflective coating. DETAILED DESCRIPTION
This disclosure provides methods and compositions for photovoltaic absorber for photovoltaic and electrooptical devices. Among other things, aspects of this disclosure present solution-based processes that can be used for making solar cells having advantageously superior efficiencies for conversion of light. A solution-based process of this invention can be used for CIGS materials for solar cells.
Processes of this invention can provide solar cell devices having a conversion efficiency of 15% to 20% or greater, measured in the absence of any antireflective coating.
In certain aspects, this invention provides methods for manufacturing solar cells that do not use reactive solvents or solutions. The solution-based processes herein can advantageously use only hydrocarbon solvents.
In some aspects, this disclosure provides solution-based processes for making photovoltaic solar cells that can provide a uniform film deposited on a substrate. Solution-based processes of this invention advantageously provide soluble precursor components that can be deposited by various methods in a uniform layer, thereby creating superior photovoltaic absorber films.
Embodiments of this disclosure include solutions in which precursor compounds are dissolved that are free from particulates.
Advantageously, the polymeric precursor compounds of this invention may be dissolved in a hydrocarbon solvent. Thus, solutions of this invention for making photovoltaic absorber films in which precursor compounds are dissolved can be free from compounds containing nitrogen or phosphorous atoms. Moreover, solutions in which the precursor compounds are dissolved can be free from amine groups or compounds containing amines. Furthermore, the solution in which the precursor compounds are dissolved can be free from hydrazine or hydrazine derivatives.
Thickness per pass with Cu-deficient polymeric precursor compounds
In some aspects, this invention provides a process for making a photovoltaic absorber layer on a substrate by depositing a layer of an ink onto the substrate, where the ink contains one or more polymeric precursor compounds, and thereafter heating the substrate. The polymeric precursor compounds can have the empirical formula (Cui_xAgx)u(MB1 1_y_tMB2 yMB3t)((Si_zSez)R)w, wherein MB1 is In, MB2 is Ga, and MB3 is Al, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.6 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from alkyl groups. These polymeric precursor compounds are deficient in Group 11 atoms and have a ratio of atoms of Group 1 1 to atoms of Group 13 of 1 or less than 1.
Processes of this disclosure using polymeric precursor compounds that are deficient in Group 11 atoms provide surprisingly high thickness per pass when deposited on a substrate.
In some embodiments, the polymeric precursor compounds are CIGS polymeric precursor compounds having the empirical formula
Cuu(MB1i_yMB2y)((Si-zSez)R)w, wherein x is 0 and Ag is not present, y is between 0 and 1, and t is 0 and MB3 is not present.
In some embodiments, the polymeric precursor compounds are CIGS polymeric precursor compounds having the empirical formula
Cuu(MB1i_yMB2y)((Si-zSez)R)w, wherein y is between 0 and 1, and t is 0 and MB3 is not present.
In certain aspects, it has found that when the R groups are independently selected from n-butyl, sec -butyl, iso-butyl, and t-butyl, the mobility properties of the polymeric precursor compounds are surprisingly enhanced so that a higher thickness per pass can be achieved when deposited on a substrate.
In some embodiments, the R groups are a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl groups, or a mixture of n-butyl and sec- butyl groups, or a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and sec -butyl and iso-butyl groups, or a mixture of n-butyl and sec -butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl and t-butyl groups, or a mixture of sec- butyl and iso-butyl and t-butyl groups.
In further embodiments, the R groups are independently selected from n- pentyl, isopentyl, sec-pentyl, 1 -methylpentyl, 2-methylpentyl, 3-methylpentyl, 4- methylpentyl, 1-ethylbutyl, 2-ethylbutyl, tert-pentyl, 1 , 1 -dimethylbutyl, 1,2- dimethylbutyl, 1,3-dimethylbutyl, 2,3-dimethylbutyl, cyclopentyl, and mixtures of any of the foregoing.
In certain embodiments, the R groups are independently selected from n- hexyl, 1 -methylhexyl, 2 -methylhexyl, 3 -methylhexyl, 4-methylhexyl, 5 -methylhexyl, 1-ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1-n-propylbutyl, 1-iso-propylbutyl, 1-iso- propyl-2-methylpropyl, 1-methylheptyl, 2-methylheptyl, 3-methylheptyl, 4- methylheptyl, 5-methylheptyl, 6-methylheptyl, 1 -ethylhexyl, 2-ethylhexyl, 3- ethylhexyl, 4-ethylhexyl, 1-n-propylpentyl, 2-n-propylpentyl, 1-iso-propylpentyl, 2- iso-propylpentyl, 1-n-butylbutyl, 1-iso-butylbutyl, 1-sec-butylbutyl, 1 -tert-butylbutyl, 2 -tert-butylbutyl, tert-butyl, l-ethyl-2-methylpropyl, 1,1-dimethylpentyl, 1,2- dimethylpentyl, 1,3-dimethylpentyl, 1 ,4-dimethylpentyl, 2,2-dimethylpentyl, 2,3- dimethylpentyl, 2,4-dimethylpentyl, 3,3-dimethylpentyl, 3,4-dimethylpentyl, 1-ethyl- 1 -methylbutyl, l-ethyl-2-methylbutyl, l-ethyl-3 -methylbutyl, 2-ethyl-l -methylbutyl, 2-ethyl-3 -methylbutyl, 1,1-dimethylhexyl, 1,2-dimethylhexyl, 1,3-dimethylhexyl, 1,4- dimethylhexyl, 1,5-dimethylhexyl, 2,2-dimethylhexyl, 2,3-dimethylhexyl, 2,4- dimethylhexyl, 2,5-dimethylhexyl, 3,3-dimethylhexyl, 3,4-dimethylhexyl, 3,5- dimethylhexyl, 4,4-dimethylhexyl, 4,5-dimethylhexyl, l-ethyl-2-methylpentyl, 1- ethyl-3-methylpentyl, 1 -ethyl-4-methylpentyl, 2-ethyl-l -methylpentyl, 2-ethyl-2- methylpentyl, 2-ethyl-3 -methylpentyl, 2-ethyl-4-methylpentyl, 3-ethyl-l- methylpentyl, 3-ethyl-2-methylpentyl, 3 -ethyl-3 -methylpentyl, 3-ethyl-4- methylpentyl, 1-n-propyl-l -methylbutyl, 1 -n-propyl-2-methylbutyl, l-n-propyl-3- methylbutyl, 1-iso-propyl-l-methylbutyl, l-iso-propyl-2-methylbutyl, l-iso-propyl-3- methylbutyl, 1,1-diethylbutyl, 1,2-diethylbutyl, 1,1,2-trimethylpropyl, 1,2,2- trimethylpropyl, 1 , 1 ,2-trimethylbutyl, 1,1,3-trimethylbutyl, 1,2,3-trimethylbutyl,
1.2.2- trimethylbutyl, 1,3,3-trimethylbutyl, 2,3,3-trimethylbutyl, 1,1,2-trimethylpentyl,
1.1.3- trimethylpentyl, 1,1,4-trimethylpentyl, 1,2,2-trimethylpentyl, 1,2,3- trimethylpentyl, 1,2,4-trimethylpentyl, 1,3,4-trimethylpentyl, 2,2,3-trimethylpentyl, 2,2,4-trimethylpentyl, 2,3,4-trimethylpentyl, 1,3,3-trimethylpentyl, 2,3,3- trimethylpentyl, 3,3,4-trimethylpentyl, 1,4,4-trimethylpentyl, 2,4,4-trimethylpentyl,
3.4.4- trimethylpentyl, 1 -ethyl- 1,2-dimethylbutyl, l-ethyl-l,3-dimethylbutyl, 1-ethyl- 2,3-dimethylbutyl, 2-ethyl-l, 1-dimethylbutyl, 2-ethyl- 1,2-dimethylbutyl, 2-ethyl-l, 3- dimethylbutyl, 2-ethyl-2,3-dimethylbutyl, cyclohexyl, methylcyclopentyl, methylcyclohexyl, 1,2-dimethylcyclohexyl, 1,3-dimethylcyclohexyl, 1,4- dimethylcyclohexyl, ethylcyclohexyl, and mixtures of any of the foregoing.
For example, as is shown in example embodiments below, the thickness of the layer made by depositing and heating the ink containing the polymeric precursor compounds that are deficient in Group 11 atoms can be from less than 100 up to 500 nanometers or more.
In some embodiments, the thickness per pass of the layer made by depositing on a substrate and heating an ink formulation of this disclosure containing one or more polymeric precursor compounds that are deficient in Group 11 atoms can be from 100 to 500 nanometers, or from 100 to 400 nanometers, or from 100 to 350 nanometers, or from 100 to 300, or from 100 to 250, or from 100 to 200, or from 100 to 150.
The substrate may optionally have a layer of an adhesion promoter material on the electrical contact layer, wherein the adhesion promoter material is a CIGS material that is enriched in Cu so that the ratio of atoms of Cu to atoms of In and Ga, which is Cu/(In + Ga), is from 1 to 1.3, or from 1 to 1.2, or from 1 to 1.1. The adhesion promoter material can have the empirical formula Cui.o-i.3(Ini-yGay)Se2-2.2, and be formed by depositing and converting one or more polymeric precursor compounds to provide that stoichiometry.
In preferred embodiments of this invention, the thickness per pass is increased so that a photovoltaic absorber material can be made in fewer passes of depositing or coating a substrate, which is a significant property for manufacturing photovoltaics.
In some embodiments, a photovoltaic absorber material can be made in as few as 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, or 16 passes of depositing or coating a substrate.
Ink formulations with additives
In some aspects, this invention provides an ink formulation for making a photovoltaic absorber material on a substrate. It has been found that by depositing a layer of an ink onto the substrate, where the ink contains one or more polymeric precursor compounds, as discussed above, as well as an additive, that surprisingly high thickness per pass can be achieved for deposition of the ink formulation on a substrate.
In some embodiments, an ink for making a photovoltaic absorber material may contain one or more precursor compounds and an additive dissolved in one or more solvents.
The additive can be a compound having the one of the formulas AR4, R3A-AR3, or R2A-Q-AR2, wherein A is Si, Ge, or Sn, Q is -(CR2)n-, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
In certain embodiments, the additive can be S1R4 or R3Si-SiR3, wherein each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl. In further embodiments, the additive may be a compound having the formula (Ι¾ΑΟ)χ, wherein x is 2 to 8, A is Si, Ge, or Sn, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
In certain embodiments, the additive may be a diorganosiloxane compound or siloxane fluid.
Examples of diorganosiloxane compounds include hexamethylcyclotrisiloxane D3, octamethylcyclotetrasiloxane D4, decamethylcyclopentasiloxane D5, and dodecamethylcyclohexasiloxane D6.
Embodiments of this invention further provide formulations of an ink wherein the additive is at a concentration of from 0.1% to 15% (v/v), or from 0.1% to 10%, or from 0.1% to 5%.
An ink of this disclosure can be prepared with one or more solvents selected from aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, xylene, ethers, diethyl ether, tetrahydofuran, 2-methyltetrahydofuran, siloxanes, cyclosiloxanes, silicone fluids, acetonitrile, esters, acetates, ethyl acetate, butyl acetate, acrylates, isobornyl acrylate, ketones, acetone, methyl ethyl ketone, cyclohexanone, cyclopentanone, lactams, N-methyl pyrrolidone, N-(2-hydroxyethyl)- pyrrolidone, cyclic acetals, cyclic ketals, aldehydes, alcohol, methanol, ethanol, isopropyl alcohol, thiols, butanol, butanediol, glycerols, alkoxyalcohols, glycols, l-methoxy-2-propanol, acetone, ethylene glycol, propylene glycol, propylene glycol laurate, ethylene glycol ethers, diethylene glycol, triethylene glycol monobutylether, propylene glycol monomethylether, 1 ,2-hexanediol, and mixtures thereof.
In preferred embodiments of this invention, the properties of the precursor compounds are enhanced so that the deposited films of photovoltaic absorber materials can be surprisingly uniform and defect-free, even when high thickness per pass is achieved in the process for making the films. In certain embodiments, because of the high quality films, and films of increased thickness that can be made, fewer passes of depositing or coating a substrate are needed, which is a significant enhancement for manufacturing photovoltaics.
For example, a crack-free photovoltaic layer can be made with a precursor ink of this invention in a process having a thickness per pass of from 100 to 500 nanometers, or from 100 to 400 nanometers, or from 100 to 350 nanometers, or from 100 to 300 nanometers, or from 150 to 350 nanometers, or from 150 to 250 nanometers.
Solution-based processes for photovoltaics
In some aspects, solution-based processes of this invention for making photovoltaics and solar cells include processes in which a solution is formed by dissolving precursor molecules in a solvent. A precursor molecule can be a polymeric precursor molecule, a monomer precursor molecule, or other soluble molecules. The solution can be deposited on a substrate in a layer. The deposited of the solution may be dried on the substrate to remove solvent, leaving behind a layer or film of precursor molecules. Addition of energy to the substrate, for example by heating, can be used to convert the film of precursor molecules to a material film. In some embodiments, additional layers of solution may be deposited, dried, and converted to a material film of a desired thickness. In further embodiments, additional layers of solution may be deposited, dried, and converted to a material film of a different composition than other layers or films. The substrate can be annealed, for example by heating, to transform the one or more material films on the substrate into a uniform photovoltaic material. Annealing can be performed in the presence of selenium or selenium vapor. A solar cell can be made with the uniform photovoltaic material on the substrate by finishing steps that are described in various examples herein.
In some aspects, a solution-based process of this invention for making photovoltaics and solar cells can include a pure solution that is formed by dissolving one or more precursor molecules in a solvent. The advantageously enhanced purity of the solution can be due to the complete dissolution of the precursor molecules in the solvent, without residual particles. The precursor molecules can be polymeric precursor molecules or monomer precursor molecules.
Embodiments of this invention provide compositions which contain one or more precursors in a liquid solution. In some embodiments, a composition may contain one or more polymeric precursor compounds dissolved in a solvent.
The solutions of this invention may be used to make photovoltaic materials by depositing the solution onto a substrate. A solution that contains one or more dissolved precursors can be referred to as an ink or ink composition. In certain aspects, an ink can contain one or more dissolved monomer precursors or polymeric precursors. An ink of this disclosure can advantageously allow precise control of the stoichiometric ratios of certain atoms in the ink because the ink can contain a dissolved polymeric precursor.
In some embodiments, an ink can be made by mixing a polymeric precursor with one or more carriers. The ink may be a solution of the polymeric precursors in an organic carrier. In some variations, the ink is a solution of the polymeric precursors in an organic carrier. The carrier can include one or more organic liquids or solvents. A carrier may be an organic solvent.
An ink can be made by providing one or more monomer precursor compounds or one or more polymeric precursor compounds, or combinations thereof, and solubilizing, dissolving, or solvating the compounds with one or more carriers.
An ink composition can contain dissolved precursor molecules. The concentration of the precursors in an ink of this disclosure can be from about 0.001% to about 99% (w/w), or from about 0.001% to about 90%, or from about 0.1% to about 90%.
The carrier for an ink of this disclosure may be an organic liquid or solvent. Examples of a carrier for an ink of this disclosure include one or more organic solvents.
Embodiments of this invention further provide monomer precursor compounds and polymeric precursor compounds having enhanced solubility in one or more carriers for preparing inks.
The solubility of a polymeric precursor compound or monomer precursor compound can be selected by variation of the nature and molecular size and weight of one or more organic functional groups attached to the compound. The solubility of a polymeric precursor compound can also be selected by variation of the molecular size and weight of the polymeric precursor compound, as well as the degree of optional cross-linking of the polymeric precursor compound.
Examples of a carrier for a solution of this disclosure include hydrocarbons or hydrocarbon solvents.
Examples of a carrier for a solution of this disclosure include aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, and mixtures thereof. Ink compositions
An ink composition of this invention may contain any of the dopants disclosed herein, or a dopant known in the art.
A polymeric precursor ink composition can be prepared by dissolving one or more polymeric precursors in a solvent. In certain embodiments, a solvent may be heated to dissolve a polymeric precursor compound. The polymeric precursors may have a concentration of from about 0.001% to about 99% (w/w), or from about 0.001% to about 90%, or from about 0.1% to about 90%, or from about 0.1% to about 50%, or from about 0.1% to about 40%, or from about 0.1% to about 30%, or from about 0.1% to about 20%, or from about 0.1% to about 10% in the solution.
An ink composition may further contain an additional indium-containing compound, or an additional gallium-containing compound. Examples of additional indium-containing compounds include In(SeR)3, wherein R is alkyl or aryl. Examples of additional gallium-containing compounds include Ga(SeR)3, wherein R is alkyl or aryl. For example, an ink may further contain In(SenBu)3 or Ga(SenBu)3, or mixtures thereof. In some embodiments, an ink may contain Na(ER), where E is S or Se and R is alkyl or aryl. In certain embodiments, an ink may contain NaIn(ER)4, NaGa(ER)4, LiIn(ER)4, LiGa(ER)4, KIn(ER)4, or KGa(ER)4, where E is S or Se and R is alkyl or aryl. In certain embodiments, an ink may contain Cu(ER). For these additional compounds, R is preferably nBu, ¾u, sBu, or Pr.
In some examples, an ink composition may contain In(SeR)3.
In further examples, an ink composition may contain Ga(SeR)3.
For example, an ink composition may contain In(SeR)3 and Ga(SeR)3, wherein the ratio of In : Ga in the ink is 10:90, or 20:80, or 30:70, or 40:60, or 50:50, or 60:40, or 70:30, or 80:20, or 90: 10, or any integer value between those values.
In another example, an ink composition may contain In(SR)3 and Ga(SR)3, wherein the ratio of In to Ga in the ink is 10:90, or 20:80, or 30:70, or 40:60, or 50:50, or 60:40, or 70:30, or 80:20, or 90: 10, or any integer value between those values.
In another example, an ink composition may contain any of the compounds In(SeR)3, Ga(SeR)3, In(SR)3 and Ga(SR)3, wherein the overall ratio of In to Ga in the ink is 10:90, or 20:80, or 30:70, or 40:60, or 50:50, or 60:40, or 70:30, or 80:20, or 90: 10, or any integer value between those values.
In another example, an ink composition may contain any of the monomer compounds of this disclosure, wherein the overall ratio of In to Ga in the ink is 10:90, or 20:80, or 30:70, or 40:60, or 50:50, or 60:40, or 70:30, or 80:20, or 90: 10, or any integer value between those values.
The viscosity of an ink of this disclosure can be from about 0.5 centipoises (cP) to about 50 cP, or from about 0.6 to about 30 cP, or from about 1 to about 15 cP, or from about 2 to about 12 cP.
The viscosity of an ink of this disclosure can be from about 20 cP to about 2 x 106 cP, or greater. The viscosity of an ink of this disclosure can be from about 20 cP to about 1 x 106 cP, or from about 200 cP to about 200,000 cP, or from about 200 cP to about 100,000 cP, or from about 200 cP to about 40,000 cP, or from about 200 cP to about 20,000 cP.
The viscosity of an ink of this disclosure can be about 1 cP, or about 2 cP, or about 5 cP, or about 20 cP, or about 100 cP, or about 500 cP, or about 1,000 cP, or about 5,000 cP, or about 10,000 cP, or about 20,000 cP, or about 30,000 cP, or about 40,000 cP.
An ink of this disclosure may optionally further include components such as a surfactant, a thickener, a viscosity modifier, an anti-oxidant, a crystallization promoter, or an adhesion promoter. Each of these components may be used in an ink of this disclosure at a level of from about 0.001% to about 10% of the ink composition.
A polymeric precursor may exist in a liquid or flowable phase under the temperature and conditions used for deposition, coating or printing.
Photovoltaic absorber layers
In one aspect, this disclosure provides processes to make a photovoltaic absorber layer by forming various layers of components on a substrate and converting the components to a material such as a thin film material. A component can be an element, a compound, a precursor, a monomer, a polymeric precursor, or a material composition.
In certain aspects, a photovoltaic absorber layer may be fabricated using a layer of a polymeric precursor compound. The polymeric precursor compound can contain all the elements needed for the photovoltaic absorber material composition. A polymeric precursor compound can be deposited on a substrate and converted to a photovoltaic material. For example, polymeric precursors for photovoltaic materials are described in WO2011/017235, WO2011/017236, WO201 1/017237, and WO201 1/017238, each of which is hereby incorporated by reference in its entirety for all purposes.
In further aspects, this disclosure provides processes for making a photovoltaic material by varying the composition of components in layers on a substrate.
Variations in the stoichiometry of layers of components can be made by using multiple layers of different precursor compounds having different, yet fixed stoichiometry. In some embodiments, the stoichiometry of layers can be varied by using one or more polymeric precursor compounds that can have an arbitrary, predetermined stoichiometry. In certain embodiments, the stoichiometry of layers of precursors on a substrate can represent a gradient of the composition of one or more elements with respect to distance from the surface of the substrate or the ordering of layers on the substrate.
The layers of precursors on a substrate can be converted to a material composition by applying energy to the layered substrate article. Energy can be applied using heat, light, or radiation, or by applying chemical energy. In some embodiments, a layer may be converted to a material individually, before the deposition of a succeeding layer. In certain embodiments, a group of layers can be converted at the same time.
In some aspects, this disclosure provides a solution to a problem in making a photovoltaic absorber layer for an optoelectronic application such as a solar cell. The problem is the inability in general to precisely control the stoichiometric quantities and ratios of metal atoms and atoms of Group 13 in a process using conventional source compounds and/or elements for making a photovoltaic absorber layer.
This disclosure provides a range of polymeric precursors, where each precursor can be used alone to readily prepare a layer from which a photovoltaic layer or material of any arbitrary, predetermined stoichiometry can be made.
A polymeric precursor compound of this disclosure is one of a range of polymer chain molecules. In one embodiment, a polymeric precursor compound is a chain molecule as shown in Fig. 1. Fig. 1 shows an embodiment of a CIGS polymeric precursor compound that is soluble in organic solvents. As shown in Fig. 1, the structure of the polymeric precursor compound can be represented as a polymer chain of repeating units: A, which is (MA(ER)(ER)}, and B, which is (MB(ER)(ER)}, where MA is a Group 11 atom, MB is a Group 13 atom, E is a chalcogen, and R is a functional group. The structure of the polymer can be represented by the formula shown in Fig. 1 that tallies the stoichiometry of the atoms and groups in the chain.
A polymeric precursor of this disclosure may be used to make a photovoltaic layer or material having any arbitrary, desired stoichiometry, where the stoichiometry can be selected in advance and is therefore specifically controlled or predetermined. Photovoltaic materials of this disclosure include CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS materials, including materials that are enriched or deficient in the quantity of a certain atom, where CAIGAS refers to Cu/Ag/In/Ga/Al/S/Se, and further definitions are given below.
In general, the ability to select a predetermined stoichiometry in advance means that the stoichiometry is controllable.
As shown in Fig. 2, embodiments of this invention may further provide optoelectronic devices and energy conversion systems. Following the synthesis of polymeric precursor compounds, the compounds can be sprayed, deposited, or printed onto substrates and formed into absorber materials and semiconductor layers.
Absorber materials can be the basis for optoelectronic devices and energy conversion systems.
In some embodiments, solar cell devices made by the processes disclosed herein have a conversion efficiency of 10% to 20%, or 13% to 19%, or 14% to 18%, or 15% to 17%. In further embodiments, the solar cell has a conversion efficiency of 13% to 15%, or 13% to 16%, or 13% to 17%, or 13% to 18%, or 13% to 19%, or 13% to 20%.
A process for making a photovoltaic absorber material having a predetermined stoichiometry on a substrate may in general require providing a precursor having the predetermined stoichiometry. The photovoltaic absorber material is prepared from the precursors by one of a range of processes disclosed herein. The photovoltaic absorber material can retain the precise, predetermined stoichiometry of the metal atoms of the precursors. The processes disclosed herein therefore allow a photovoltaic absorber material or layer having a specific target, predetermined stoichiometry to be made using precursors of this invention.
In general, the precursor having the predetermined stoichiometry for making a photovoltaic absorber material can be any precursor.
This disclosure provides a range of precursors having predetermined stoichiometry for making semiconductor and optoelectronic materials and devices including thin film photovoltaics and various semiconductor band gap materials having a predetermined composition or stoichiometry.
This disclosure provides a range of novel polymeric compounds,
compositions, materials and methods for semiconductor and optoelectronic materials and devices including thin film photovoltaics and various semiconductor band gap materials.
Among other advantages, the polymeric compounds, compositions, materials and methods of this invention can provide a precursor compound for making semiconductor and optoelectronic materials, including CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS and CAIGAS absorber layers for solar cells and other devices. In some embodiments, the source precursor compounds of this invention can be used alone, without other compounds, to prepare a layer from which CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS and CAIGAS and other materials can be made. Polymeric precursor compounds may also be used in a mixture with additional compounds to control stoichiometry of a layer or material.
This invention provides polymeric compounds and compositions for photovoltaic applications, as well as devices and systems for energy conversion, including solar cells.
As shown in Fig. 3, a solar cell device of this disclosure may have a substrate 10, an electrode layer 20, an absorber layer 30, a buffer layer 40, and a transparent conductive layer (TCO) 50.
As used herein, converting refers to a process, for example a heating or thermal process, which converts one or more precursor compounds into a
semiconductor material.
As used herein, annealing refers to a process, for example a heating or thermal process, which transforms a semiconductor material from one form into another form.
The polymeric compounds and compositions of this disclosure include polymeric precursor compounds and polymeric precursors for materials for preparing novel semiconductor and photovoltaic materials, films, and products. Among other advantages, this disclosure provides stable polymeric precursor compounds for making and using layered materials and photovoltaics, such as for solar cells and other uses.
Polymeric precursors can advantageously form a thin, uniform film. In some embodiments, a polymeric precursor is an oil or liquid that can be processed and deposited in a uniform layer on a substrate. This invention provides polymeric precursors that can be used neat to make a thin film, or can be processed in an ink composition for deposition on a substrate. The polymeric precursors of this invention can have superior processability to form a thin film for making photovoltaic absorber layers and solar cells.
In general, the structure and properties of the polymeric compounds, compositions, and materials of this invention provide advantages in making photovoltaic layers, semiconductors, and devices regardless of the morphology, architecture, or manner of fabrication of the semiconductors or devices.
The polymeric precursor compounds of this invention are desirable for preparing semiconductor materials and compositions. A polymeric precursor may have a chain structure containing two or more different metal atoms which may be bound to each other through interactions or bridges with one or more chalcogen atoms of chalcogen-containing moieties.
With this structure, when a polymeric precursor is used in a process such as deposition, coating or printing on a substrate or surface, as well as processes involving annealing, sintering, thermal pyrolysis, and other semiconductor manufacturing processes, use of the polymeric precursors can enhance the formation of a semiconductor and its properties.
Using polymeric precursor compounds in any particular semiconductor manufacturing process, the stoichiometry of monovalent metal atoms and Group 13 atoms can be determined and controlled. For processes operating at relatively low temperatures, such as certain printing, spraying, and deposition methods, the polymeric precursor compounds can maintain the desired stoichiometry. As compared to processes involving multiple sources for semiconductor preparation, the polymeric precursors of this invention can provide enhanced control of the uniformity, stoichiometry, and properties of a semiconductor material.
These advantageous features allow enhanced control over the structure of a semiconductor material made with the polymeric precursor compounds of this invention. The polymeric precursors of this disclosure are superior building blocks for semiconductor materials because they may provide atomic-level control of semiconductor structure.
The polymeric precursor compounds, compositions and methods of this disclosure may allow direct and precise control of the stoichiometric ratios of metal atoms. For example, in some embodiments, a polymeric precursor can be used alone, without other compounds, to readily prepare a layer from which CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS and CAIGAS materials of any arbitrary stoichiometry can be made.
In aspects of this invention, chemically and physically uniform semiconductor layers can be prepared with polymeric precursor compounds.
In further embodiments, solar cells and other products can advantageously be made in processes operating at relatively low temperatures using the polymeric precursor compounds and compositions of this disclosure.
The polymeric precursor compounds and compositions of this disclosure can provide enhanced processability for solar cell production.
Certain polymeric precursor compounds and compositions of this disclosure provide the ability to be processed at relatively low temperatures, as well as the ability to use a variety of substrates including flexible polymers in solar cells.
Controlling alkali ions
Embodiments of this invention may further provide methods and compositions for introducing alkali ions at a controlled concentration into various layers and compositions of a solar cell. Alkali ions can be provided in various layers and the amount of alkali ions can be precisely controlled in making a solar cell.
In some aspects, the ability to control the precise amount and location of alkali ions advantageously allows a solar cell to be made with substrates that do not contain alkali ions. For example, glass, ceramic or metal substrates without sodium, or with low sodium, inorganic substrates, as well as polymer substrates without alkali ions can be used, among others.
This disclosure provides compounds which are soluble in organic solvents and can be used as sources for alkali ions. In some aspects, organic-soluble sources for alkali ions can be used as a component in ink formulations for depositing various layers. Using organic-soluble source compounds for alkali ions allows complete control over the concentration of alkali ions in inks for depositing layers, and for making photovoltaic absorber layers with a precisely controlled concentration of alkali ions.
In some aspects, an ink composition may advantageously be prepared to incorporate alkali metal ions. For example, an ink composition may be prepared using an amount of Na(ER), where E is S or Se and R is alkyl or aryl. R is preferably nBu, ¾u, ¾u, propyl, or hexyl.
In certain embodiments, an ink composition may be prepared using an amount of NaIn(ER)4, NaGa(ER)4, LiIn(ER)4, LiGa(ER)4, KIn(ER)4, KGa(ER)4, or mixtures thereof, where E is S or Se and R is alkyl or aryl. R is preferably nBu, ¾u, sBu, propyl, or hexyl. These organic-soluble compounds can be used to control the level of alkali metal ions in an ink or deposited layer.
In certain embodiments, sodium can be provided in an ink at a concentration range of from about 0.01 to 5 atom percent, or from about 0.01 to 2 atom percent, or from about 0.01 to 1 atom percent by dissolving the equivalent amount of
NaIn(SenBu)4, NaGa(SenBu)4 or NaSenBu.
In further embodiments, sodium can be provided in the process for making a polymeric precursor compound so that the sodium is incorporated into the polymeric precursor compound.
Methods and compositions for photovoltaic absorber layers
In some aspects, a layered substrate can be made by depositing a layer of a polymeric precursor compound onto the substrate. The layer of the polymeric precursor compound can be a single thin layer of the compound, or a plurality of layers of the compound. As shown in Fig. 4, a process to make a layered substrate can have a step of depositing a single precursor layer 105 of a single polymeric precursor on a substrate 100. The average composition of the precursor layer 105 can be deficient in the quantity of a Group 1 1 atom relative to the quantity of a Group 13 atom. The precursor layer 105 can be heated to form a thin film material layer (not shown). The precursor layer 105 can optionally be composed of a plurality of layers of the polymeric precursor compound. Each of the plurality of layers can be heated to form a thin film material layer before the deposition of the next layer of the polymeric precursor compound.
In further aspects, a layered substrate can have a first layer deposited on a substrate, followed by deposition of a second layer, and followed by deposition of a third layer. As shown in Fig. 5, a process to make a layered substrate can have steps of depositing a first layer 205 on a substrate 200, a second layer 210, and a third layer 215. The thicknesses of the layers shown in Fig. 5 is to be taken as an example, each layer can vary in thickness, and in some embodiments layer 215 can be thicker than layer 210.
The first layer 205 is optional, and can be composed of a single layer or a plurality of layers of one or more polymeric precursor compounds. The first layer 205 may be enriched in the quantity of a Group 11 atom. For example, the first layer 205 can be composed of a Cu-enriched polymeric precursor. The first layer 205 can be heated to form a thin film material layer before the deposition of the next layer. In some embodiments, the first layer 205 may be an adhesion promoting layer.
The second layer 210 is deposited onto the material layer formed from the first layer 205, when present, and can be composed of a plurality of layers of one or more polymeric precursor compounds. The second layer 210 may be enriched in the quantity of a Group 11 atom. For example, the second layer 210 can be composed of a Cu-enriched polymeric precursor. The second layer 210 can be heated to form a thin film material layer before the deposition of the next layer.
The third layer 215 is optional and is deposited onto the material layer formed from the second layer 210. The third layer 215 can be highly deficient in the quantity of a Group 11 atom, for example, the third layer 215 can be composed of one or more layers of one or more In or Ga monomer compounds. The third layer 215 can optionally be composed of a Cu-deficient polymeric precursor. The third layer 215 can be heated to form a thin film material layer.
In some embodiments, the second layer 210 may be formed with precursors that are highly enriched in the quantity of a Group 1 1 atom, and the third layer 215 may be formed from monomers containing atoms of Group 13 and no Group 1 1 atoms. As described below, a monomer can be MA(ER), where MA is Cu, Ag, or Au. A monomer can also be MB(ER)3, where MB is Al, Ga, or In.
A first layer 205 may have a thickness after heating of from about 20 to 10,000 nanometers. A second layer 210 may have a thickness after heating of from about 20 to 5000 nanometers. A third layer 215 may have a thickness after heating of from about 20 to 2000 nanometers. In some embodiments, a second layer 210 may have a thickness after heating of 10, 20, 50, 75, 100, 125, 150, 175, 200, 225, 250, 275, 300, 350, 400, 450, 500, 750, 1000 or 1500 nanometers. In some embodiments, a third layer 215 may have a thickness after heating of 10, 20, 50, 75, 100, 125, 150, 175, 200, 225, 250, 275, 300, 350, 400, 450, 500, 750, 1000 or 1500 nanometers. In some embodiments, the roles of certain layers may be reversed, so that the second layer 210 may be deficient in the quantity of a Group 1 1 atom, for example, the second layer 210 may be composed of In or Ga monomer compounds. In a reversed embodiment, the third layer 215 may be highly enriched in the quantity of a Group 1 1 atom.
Each step of heating can transform any and all layers present on the substrate into a material layer. Thus, the schematic diagrams in Figs. 4-8 represent the steps of a process to make a layered substrate which ultimately may be transformed into a single thin film material layer on the substrate. The schematic diagrams in Figs. 4-8 do not necessarily directly represent a product material or a substrate article formed from the process.
In additional aspects, a layered substrate can have a base layer deposited on a substrate, followed by deposition of an optional chalcogen layer, a balance layer, and an additional, optional chalcogen layer. As shown in Fig. 6, a process to make a layered substrate can have steps of depositing a base layer 305 on a substrate 100, an optional chalcogen layer 310, a balance layer 315, and an additional, optional chalcogen layer 320. The base layer 305 can be composed of a single layer or a plurality of layers of one or more polymeric precursor compounds. Any of the layers of the base layer 305 can be heated to form a thin film material layer before the deposition of the next layer. Any of the layers of the base layer 305 may be enriched in the quantity of a Group 1 1 atom. The balance layer 315 can be composed of a plurality of layers of one or more polymeric precursor compounds. Any of the layers of the balance layer 315 can be heated to form a thin film material layer before the deposition of the next layer. Any of the layers of the balance layer 315 may be deficient in the quantity of a Group 11 atom. The chalcogen layers 310 and 320 can be composed of one or more layers of one or more chalcogen sources, such as a chalcogen source compound or elemental source. The chalcogen layers 310 and 320 can be heated to form a thin film material layer. In some embodiments, the base layer 305 may be deficient in the quantity of a Group 1 1 atom and the balance layer 315 may be enriched in the quantity of a Group 11 atom.
A base layer 305 may have a thickness of from about 10 to 10,000 nm, or from 20 to 3000 nm. A balance layer 315 may have a thickness of from about 10 to 5000 nm, or from 20 to 5000 nm. In certain embodiments, the order of the base layer 305 and the balance layer 315 in Fig. 6 may be reversed, so that the composition corresponding to the balance layer 315 may be adjacent to the substrate and between the substrate and a layer having the composition of the base layer 305.
In additional aspects, a layered substrate can have a first layer containing atoms of Groups 1 1 and 13 and atoms of a chalcogen deposited on a substrate, followed by deposition of a second layer containing atoms of Group 13 and atoms of a chalcogen. As shown in Fig. 7, a process to make a layered substrate can have steps of depositing a first layer 405 on a substrate 400, and a second layer 410. The first layer 405 can be composed of a plurality of layers of one or more polymeric precursor compounds, or any CIS or CIGS precursor compounds. Any of the layers of the first layer 405 can be heated to form a thin film material layer before the deposition of the next layer. Any of the layers of the first layer 405 may be enriched in the quantity of a Group 11 atom. An optional chalcogen layer may be deposited on the first layer 405. The optional chalcogen layer can be heated to form a thin film material layer. The first layer 405 can optionally be composed of a plurality of layers of one or more AIGS, CAIGS, CIGAS, AIGAS or CAIGAS precursor compounds. The second layer 410 can be composed of a single layer or a plurality of layers of one or more compounds containing atoms of Group 13 and atoms of a chalcogen. Any of the layers of the second layer 410 can be heated to form a thin film material layer before the deposition of the next layer.
In certain embodiments, the order of the second layer 410 and the first layer 405 in Fig. 7 may be reversed, so that the composition corresponding to the second layer 410 may be adjacent to the substrate and between the substrate and a layer having the composition of the first layer 405.
In some aspects, a layered substrate can have a number of layers, n, deposited on a substrate. As shown in Fig. 8, a process to make a layered substrate can have steps of depositing a number of layers 502, 504, 506, 508, 510, 512, and so on, up to n layers on a substrate 100. Each layer 502, 504, 506, 508, 510, 512, and so on, up to n layers can be composed of a single layer or a plurality of layers. Any of the layers can be heated to form a thin film material layer before the deposition of the next layer. The layers 502, 504, 506, 508, 510, 512, and so on, can each be composed of one or more polymeric precursor compounds. The polymeric precursor compounds can contain any combination of atoms of Groups 1 1 and 13 with arbitrarily predetermined stoichiometry. Any of the layers can be heated to form a thin film material layer before the deposition of the next layer. Any of the layers may be deficient or enriched in the quantity of a Group 1 1 atom. Some of the layers 502, 504, 506, 508, 510, 512, and so on, can be a chalcogen layer. The chalcogen layer can be heated to form a thin film material layer. In some embodiments, the layers 502, 504, 506, 508, 510, 512, and so on, are alternating layers of one or more polymeric precursor compounds and a chalcogen layer. Some of the layers 502, 504, 506, 508, 510, 512, and so on, may include a layer of a polymeric precursor compound between chalcogen layers. Some of the layers 502, 504, 506, 508, 510, 512, and so on, may include a layer of a polymeric precursor compound that is deficient in a Group 11 atom between layers that are enriched in a Group 1 1 atom.
In certain embodiments, sodium ions may be introduced into any of the layers.
Annealing processes for photovoltaic absorber materials
In some aspects, annealing of coated substrates may be performed for increasing the grain size of the photovoltaic absorber. For example, an annealing of coated substrates can be done to increase the grain size of a CIGS photovoltaic absorber material.
In some embodiments, the CIGS grain size can be increased by annealing a pre-formed Cu-deficient CIGS material in the presence of selenium. Aspects of this invention including controlling the presence and concentration of selenium during the process for making a solar cell.
In certain aspects, an annealing process for coated substrates can be performed in the presence of a chalcogen, for example selenium, or selenium vapor.
Annealing in the presence of selenium or selenium vapor can be performed at a range of times and temperatures. In some embodiments, the temperature of the photovoltaic absorber material is held at about 450 °C for 1 minute. In certain embodiments, the temperature of the photovoltaic absorber material is held at about 525 °C. The time for annealing can range from 15 seconds to 60 minutes, or from 30 seconds to five minutes. The temperature for annealing can range from 400 °C to 650 °C, or from 450 °C to 550 °C.
In additional aspects, the annealing process can include sodium. Sodium can be introduced in an ink or a photovoltaic absorber material by using an organic- soluble sodium-containing molecule. Depositing chalcogen layers
In various processes of this disclosure, a composition or step may optionally include a chalcogen layer. Chalcogen can be introduced by various processes including spraying, coating, printing, and contact transfer processes, as well as an evaporation or sputtering process, a solution process, or a melt process.
In some embodiments, a chalcogen layer may be deposited with a chalcogen- containing ink. An ink may contain solubilized, elemental chalcogen, or a soluble chalcogen source compound such as an alkyl chalcogenide.
In some embodiments, chalcogen may also be added to an ink containing metal atoms which is used to form a metal-containing layer, as in any one of Figs. 4- 8. Chalcogen may be added to an ink containing metal atoms by dissolving a chalcogen source compound or elemental chalcogen in a solvent and adding a portion of the solvent to the ink containing metal atoms. Chalcogen may be added to an ink containing metal atoms by dissolving a chalcogen source compound or elemental chalcogen in the ink containing metal atoms.
Examples of chalcogen source compounds include organoselenides, RSeR, RSeSeR, RSeSeSeR, and R(Se)nR where R is alkyl.
A chalcogen source compound may be irradiated with ultraviolet light to provide selenium. Irradiation of a selenium source compound may be done in a solution, or in an ink. Irradiation of a chalcogen source compound may also be done after deposition of the compound on a substrate.
Additional sulfurization or selenization
In various processes of this disclosure, a composition or material may optionally be subjected to a step of sulfurization or selenization.
Selenization may be carried out with elemental selenium or Se vapor.
Sulfurization may be carried out with elemental sulfur. Sulfurization with I¾S or selenization with H2Se may be carried out by using pure H2S or H2Se, respectively, or may be done by dilution in nitrogen.
A sulfurization or selenization step can be done at any temperature from about 200 °C to about 600 °C, or from about 200 °C to about 650 °C, or at temperatures below 200 °C. One or more steps of sulfurization and selenization may be performed concurrently, or sequentially.
Examples of sulfurizing agents include hydrogen sulfide, hydrogen sulfide diluted with hydrogen, elemental sulfur, sulfur powder, carbon disulfide, alkyl polysulfides, dimethyl sulfide, dimethyl disulfide, and mixtures thereof.
Examples of selenizing agents include hydrogen selenide, hydrogen selenide diluted with hydrogen, elemental selenium, selenium powder, carbon diselenide, alkyl polyselenides, dimethyl selenide, dimethyl diselenide, and mixtures thereof. Polymeric precursors
This disclosure provides a range of polymeric precursor compounds having two or more different metal atoms and chalcogen atoms.
In certain aspects, a polymeric precursor compound may contain metal certain atoms and atoms of Group 13. Any of these atoms may be bonded to one or more atoms selected from atoms of Group 15, S, Se, and Te, as well as one or more ligands.
A polymeric precursor compound may be a neutral compound, or an ionic form, or have a charged complex or counterion. In some embodiments, an ionic form of a polymeric precursor compound may contain a divalent metal atom, or a divalent metal atom as a counterion.
A polymeric precursor compound may contain atoms selected from the transition metals of Group 3 through Group 12, B, Al, Ga, In, Tl, Si, Ge, Sn, Pb, As, Sb, and Bi. Any of these atoms may be bonded to one or more atoms selected from atoms of Group 15, S, Se, and Te, as well as one or more ligands.
A polymeric precursor compound may contain atoms selected from Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Hg, B, Al, Ga, In, Tl, Si, Ge, Sn, Pb, and Bi. Any of these atoms may be bonded to one or more atoms selected from atoms of Group 15, S, Se, and Te, as well as one or more ligands.
In some embodiments, a polymeric precursor compound may contain atoms selected from Cu, Ag, Zn, Al, Ga, In, Tl, Si, Ge, Sn, and Pb. Any of these atoms may be bonded to one or more atoms selected from atoms of Group 15, S, Se, and Te, as well as one or more ligands.
In some embodiments, a polymeric precursor compound may contain atoms selected from Cu, Ag, Zn, Al, Ga, In, Tl, Si, Ge, Sn, and Pb. Any of these atoms may be bonded to one or more chalcogen atoms, as well as one or more ligands. In some variations, a polymeric precursor compound may contain atoms selected from Cu, Ag, In, Ga, and Al. Any of these atoms may be bonded to one or more atoms selected from S, Se, and Te, as well as one or more ligands. Polymeric precursor structure and properties (MPP
A polymeric precursor compound of this disclosure is stable at ambient temperatures. Polymeric precursors can be used for making layered materials, optoelectronic materials, and devices. Using polymeric precursors advantageously allows control of the stoichiometry, structure, and ratios of various atoms in a material, layer, or semiconductor.
Polymeric precursor compounds of this invention may be solids, solids with low melting temperatures, semisolids, flowable solids, gums, or rubber-like solids, oily substances, or liquids at ambient temperatures, or temperatures moderately elevated from ambient. Embodiments of this disclosure that are fluids at temperatures moderately elevated from ambient can provide superior processability for production of solar cells and other products, as well as the enhanced ability to be processed on a variety of substrates including flexible substrates.
In general, a polymeric precursor compound can be processed through the application of heat, light, kinetic, mechanical or other energy to be converted to a material, including a semiconductor material. In these processes, a polymeric precursor compound undergoes a transition to become a material. The conversion of a polymeric precursor compound to a material can be done in processes known in the art, as well as the novel processes of this disclosure.
Embodiments of this invention may further provide processes for making optoelectronic materials. Following the synthesis of a polymeric precursor compound, the compound can be deposited, sprayed, or printed onto a substrate by various means. Conversion of the polymeric precursor compound to a material can be done during or after the process of depositing, spraying, or printing the compound onto the substrate.
A polymeric precursor compound of this disclosure may have a transition temperature below about 400 °C, or below about 300 °C, or below about 280 °C, or below about 260 °C, or below about 240 °C, or below about 220 °C, or below about 200 °C. In some aspects, polymeric precursors of this disclosure include molecules that are processable in a flowable form at temperatures below about 100 °C. In certain aspects, a polymeric precursor can be fluid, liquid, flowable, flowable melt, or semisolid at relatively low temperatures and can be processed as a neat solid, semisolid, neat flowable liquid or melt, flowable solid, gum, rubber-like solid, oily substance, or liquid. In certain embodiments, a polymeric precursor is processable as a flowable liquid or melt at a temperature below about 200 °C, or below about 180 °C, or below about 160 °C, or below about 140 °C, or below about 120 °C, or below about 100 °C, or below about 80 °C, or below about 60 °C, or below about 40 °C.
A polymeric precursor compound of this invention can be crystalline or amorphous, and can be soluble in various non-aqueous solvents.
A polymeric precursor compound may contain ligands, or ligand fragments, or portions of ligands that can be removed under mild conditions, at relatively low temperatures, and therefore provide a facile route to convert the polymeric precursor to a material or semiconductor. The ligands, or some atoms of the ligands, may be removable in various processes, including certain methods for depositing, spraying, and printing, as well as by application of energy.
These advantageous features allow enhanced control over the structure of a semiconductor material made with the polymeric precursor compounds of this invention.
Polymeric precursors for semiconductors and optoelectronics (MPP
This invention provides a range of polymeric precursor structures, compositions, and molecules having two or more different metal atoms.
In some embodiments, a polymeric precursor compound contains atoms MB of
Group 13 selected from Al, Ga, In, Tl and any combination thereof.
The atoms MB may be any combination of atoms of Al, Ga, In, and Tl. The atoms MB may be all of the same kind, or may be combinations of any two, or three, or four of the atoms of Al, Ga, In, and Tl. The atoms MB may be a combination of any two of the atoms of Al, Ga, In, and Tl, for example, a combination of In and Ga,
In and Tl, Ga and Tl, In and Al, Ga and Al, and so forth. The atoms MB may be a combination of In and Ga. These polymeric precursor compounds further contain monovalent metal atoms MA selected from the transition metals of Group 3 through Group 12, as described above.
The atoms MA may be any combination of atoms of Cu, Ag, and Au.
The polymeric precursors of this disclosure can be considered inorganic polymers or coordination polymers.
The polymeric precursors of this disclosure may be represented in different ways, using different formulas to describe the same structure.
In some aspects, a polymeric precursor of this disclosure may be a distribution of polymer molecules or chains. The distribution may encompass molecules or chains having a range of chain lengths or molecular sizes. A polymeric precursor can be a mixture of polymers, polymer molecules or chains. The distribution of a polymeric precursor can be centered or weighted about a particular molecular weight or chain mass.
Embodiments of this invention further provide polymeric precursors that can be described as AB alternating addition copolymers.
The AB alternating addition copolymer is in general composed of repeat units A and B. The repeat units A and B are each derived from a monomer. The repeat units A and B may also be referred to as being monomers, although the empirical formula of monomer A is different from the empirical formula of repeat unit A.
The monomer for MA can be MA(ER), where MA is as described above.
The monomer for MB can be MB(ER)3, where MB is Al, Ga, In, or a combination thereof.
In a polymeric precursor, monomers of A link to monomers of B to provide a polymer chain, whether linear, cyclic, or branched, or of any other shape, that has repeat units A, each having the formula {MA(ER)2} , and repeat units B, each having the formula {MB(ER)2} . The repeat units A and B may appear in alternating order in the chain, for example, "·ΑΒΑΒΑΒΑΒΑΒ···.
In some embodiments, a polymeric precursor may have different atoms MB selected from Al, Ga, In, or a combination thereof, where the different atoms appear in random order in the structure.
The polymeric precursor compounds of this invention may be made with any desired stoichiometry regarding the number of different metal atoms and Group 13 atoms, and their respective stoichiometric level or ratio. The stoichiometry of a polymeric precursor compound may be controlled through the concentrations of monomers, or repeating units in the polymer chains of the precursors. A polymeric precursor compound may be made with any desired stoichiometry regarding the number of different metal atoms and atoms of Group 13 and their respective stoichiometric levels or ratios.
In some aspects, this disclosure provides polymeric precursors which are inorganic AB alternating addition copolymers having one of the following Formulas 1 through 13:
Formula 1 : (RE)2-[B(AB)n]~
Formula 2: (RE)2-[(BA)nB]~
Formula 3 : (RE)2-BB(AB)n
Formula 4: (RE)2-B(AB)nB
Formula 5 : (RE)2-B(AB)nB(AB)m
Formula 6: (RE)2-(BA)nBB
Formula 7: (RE)2-B(BA)nB
Formula 8: (RE)2-(BA)nB(BA)mB
Formula 9: cyclic(AB)n
Formula 10: cyclic(BA)n
Formula 1 1 : (RE)2-(BB)(AABB)n
Formula 12: (RE)2-(BB)(AABB)n(AB)m
Formula 13: (RE)2-(B)(AABB)n(B)(AB) where A and B are as defined above, E is S, Se, or Te, and R is defined below.
Formulas 1 and 2 describe ionic forms that have a counterion or counterions not shown. Examples of counterions include alkali metal ions, Na, Li, and K.
The formulas RE-B(AB)n and RE-(BA)nB may describe stable molecules under certain conditions.
For example, an embodiment of a polymeric precursor compound of Formula 4 is shown in Fig. 9. As shown in Fig. 9, the structure of the compound can be represented by the formula (RE)2BABABB, wherein A is the repeat unit {MA(ER)2}, B is the repeat unit {MB(ER)2}, E is a chalcogen, and R is a functional group defined below. In another example, an embodiment of a polymeric precursor compound of Formula 5 is shown in Fig. 10. As shown in Fig. 10, the structure of the compound can be represented by the formula (RE)2BABABBABAB, wherein A is the repeat unit {MA(ER)2}, B is the repeat unit {MB(ER)2}, E is a chalcogen, and R is a functional group defined below.
In a further example, an embodiment of a polymeric precursor compound of Formula 6 is shown in Fig. 1 1. As shown in Fig. 1 1, the structure of the compound can be represented by the formula (RE)2BA(BA)nBB, wherein A is the repeat unit {MA(ER)2}, B is the repeat unit {MB(ER)2}, E is a chalcogen, and R is a functional group defined below.
In another example, an embodiment of a polymeric precursor compound of Formula 8 is shown in Fig. 12. As shown in Fig. 12, the structure of the compound can be represented by the formula (RE)2BA(BA)nB(BA)mB, wherein A is the repeat unit {MA(ER)2}, B is the repeat unit {MB(ER)2}, E is a chalcogen, and R is a functional group defined below.
In a further example, an embodiment of a polymeric precursor compound of Formula 10 is shown in Fig. 13. As shown in Fig. 13, the structure of the compound can be represented by the formula cycllc(BA)4, wherein A is the repeat unit {MA(ER)2}, B is the repeat unit {MB(ER)2}, E is a chalcogen, and R is a functional group defined below.
A polymeric precursor having one of Formulas 1-8 and 11-13 may be of any length or molecular size. The values of n and m can be one (1) or more. In certain embodiments, the values of n and m are 2 or more, or 3 or more, or 4 or more, or 5 or more, or 6 or more, or 7 or more, or 8 or more, or 9 or more, or 10 or more. In some embodiments, n and m are independently from 2 to about one million, or from 2 to about 100,000, or from 2 to about 10,000, or from 2 to about 5000, or from 2 to about 1000, or from 2 to about 500, or from 2 to about 100, or from 2 to about 50.
A cyclic polymeric precursor having one of Formulas 9 or 10 may be of any molecular size. The value of n may be two (2) or more. In certain variations, the values of n and m are 2 or more, or 3 or more, or 4 or more, or 5 or more, or 6 or more, or 7 or more, or 8 or more, or 9 or more, or 10 or more. In some embodiments, for cyclic Formulas 9 and 10, n is from 2 to about 50, or from 2 to about 20, or from 2 to about 16, or from 2 to about 14, or from 2 to about 12, or from 2 to about 10, or from 2 to about 8. The molecular weight of a polymeric precursor compound can be from about 1000 to 50,000, or from about 10,000 to 100,000, or from about 5000 to 500,000, or greater.
In another aspect, the repeat units {MB(ER)2} and {MA(ER)2} may be considered "handed" because the metal atom MA and the Group 13 atom MB appear on the left, while the chalcogen atom E appears to the right side. Thus, a linear terminated chain will in general require an additional chalcogen group or groups on the left terminus, as in Formulas 1-8 and 11-13, to complete the structure. A cyclic chain, as described by Formulas 9 and 10, does not require an additional chalcogen group or groups for termination.
In certain aspects, structures of Formulas 1-8 and 1 1-13, where n and m are one (1), may be described as adducts. For example, adducts include (RE)2-BBAB, (RE)2-BABB, and (RE)2-BABBAB.
In some embodiments, a polymeric precursor may include a structure that is an AABB alternating block copolymer. For example, a polymeric precursor or portions of a precursor structure may contain one or more consecutive repeat units {AABB}. A polymeric precursor having an AABB alternating block copolymer may be represented by Formula 11 above.
In some aspects, this disclosure provides polymeric precursors which are inorganic AB alternating addition copolymers having the repeat units of Formula 14
Figure imgf000039_0001
Formula 14 where atoms MB are atoms of Group 13 selected from Al, Ga, In, and Tl, and E is S, Se, or Te.
In certain aspects, this invention provides polymeric precursors having a number n of the repeat units of Formula 14, where n may be 1 or more, or 2 or more, or 3 or more, or 4 or more, or 5 or more, or 6 or more, or 7 or more, or 8 or more, or 9 or more, or 10 or more, or 1 1 or more, or 12 or more. The AB copolymer of Formula 14 may also be represented as (AB)n or (BA)n, which represents a polymer of any chain length. Another way to represent certain AB copolymers is the formula•••ΑΒΑΒ···.
In further variations, this invention provides polymeric precursors that may be represented by Formula 15
Figure imgf000040_0001
Formula 15 where atoms M and M are the same or different atoms of Group 13 selected from Al, Ga, In, Tl, or a combination thereof, E is S, Se, or Te, and p is one (1) or more.
In further aspects, this invention provides polymeric precursors which may be represented by Formula 16
Figure imgf000040_0002
Formula 16 where atoms M and M are the same or different atoms of Group 13 selected from Al, Ga, In, Tl, or a combination thereof, atoms MA1 and MA2 are the same or different and are atoms selected from Cu, Au, Ag, and Hg, E is S, Se, or Te, and p is one (1) or more.
In another aspect, this disclosure provides inorganic AB alternating copolymers which may be represented by Formula 17 AB1AB2AB3
Formula 17
1 2 3 Bl B2 B3 where B , B , and B are repeat units containing atoms M , M , and M , respectively, which are atoms of Al, Ga, In, Tl or a combination thereof.
Certain empirical formulas for monomers and polymeric precursors of this invention are summarized in Table 1.
Table 1 : Empirical formulas for monomers, repeat units and polymeric precursors
Figure imgf000041_0001
Formula Representative Constitutional Chain Unit Description
{AABB} -^-A— A— B— B-^- AABB alternating block copolymer
A— B
fl" Cyclic polymer cyclic(AB)4 or
chain, oligomer or cyclic(BA)4
A B octamer
In Table 1, the "representative constitutional chain unit" refers to the repeating unit of the polymer chain. In general, the number and appearance of electrons, ligands, or R groups in a representative constitutional chain repeating unit does not necessarily reflect the oxidation state of the metal atom. For example, the chain repeating unit A, which is {MA(ER)2}, arises from the monomer MA(ER), where MA is a metal atom of monovalent oxidation state 1 (I or one) as described above, or any combination of Cu, Ag and Au. It is to be understood that the repeating unit exists in the polymer chain bonded to two other repeating units, or to a repeating unit and a chain terminating unit. Likewise, the chain repeating unit B, which is {MB(ER)2} , arises from the monomer MB(ER)3, where MB is a Group 13 atom of trivalent oxidation state 3 (III or three) selected from Al, Ga, In, Tl, and any combination thereof, including where any one or more of those atoms are not present. In one aspect, monomer MA(ER), and monomer MB(ER)3, combine to form an AB repeating unit, which is {MA(ER)2MB(ER)2}.
In some aspects, this disclosure provides AB alternating copolymers which may also be alternating with respect to MA or MB. A polymeric precursor that is alternating with respect to MA may contain chain regions having alternating atoms MA1 and MA2. A polymeric precursor that is alternating with respect to MB may contain chain regions having alternating atoms MB1 and MB2.
In further aspects, this disclosure provides AB alternating block copolymers which may contain one or more blocks of n repeat units, represented as (AB1)!, or where the block of repeat units contains only one kind of atom MB1 selected from Group 13. A block may also be a repeat unit represented as
Figure imgf000042_0001
or ( Al)n, where the block of repeat units contains only one kind of atom MA1. A polymeric precursor of this disclosure may contain one or more blocks of repeat units having different Group 13 atoms in each block, or different atoms MA in each block. For example, a polymeric precursor may have one of the following formulas:
Formula 18: (RE)2-BB(AB1)n(AB2)m
Formula 19: (RE)2-BB(AB1)n(AB2)m(AB1)p
Formula 20: (RE)2-BB(AB1)n(AB2)m(AB3)p or
(RE)2-BB(A1B)n(A2B)m(A3B)p
Formula 21 : (RE)2-BB(A1B)n(A2B)m
Formula 22: (RE)2-BB(A1B)n(A2B)m(A1B)p
Formula 23: (RE)2-BB(A1B)n(A2B)m(A3B)p where B1, B2 and B3 represent repeat units {MB1(ER)2}, {MB2(ER)2}, and
{MB3(ER)2}, respectively, where MB1, MB2 and MB3 are atoms of Group 13, each different from the other, independently selected from Al, In, Ga, Tl, or a combination thereof, and where A1, A2 and A3 represent repeat units {MA1(ER)2}, {MA2(ER)2}, and {MA3(ER)2}, respectively, where MA1, MA2 and MA3 are each different from the other and are identified as described above for MA. In Formulas 18 through 23, the values of n, m, and p may be 2 or more, or 3 or more, or 4 or more, or 5 or more, or 6 or more, or 7 or more, or 8 or more, or 9 or more, or 10 or more, or 11 or more, or 12 or more.
In certain embodiments, an MB monomer can contain a chelating group - ERE-, for example, having the formula MB(ERE).
In some embodiments, a monomer may exist in a dimeric form under ambient conditions, or a trimeric or higher form, and can be used as a reagent in such forms. It is understood that the term monomer would refer to all such forms, whether found under ambient conditions, or found during the process for synthesizing a polymeric precursor from the monomer. The formulas MA(ER) and MB(ER)3, for example, should be taken to encompass the monomer in such dimeric or higher forms, if any. A monomer in a dimeric or higher form, when used as a reagent can provide the monomer form.
The polymeric precursors of this invention obtained by reacting monomers MA(ER) and MB(ER)3 can be advantageously highly soluble in organic solvent, whereas one or more of the monomers may have been insoluble. As used herein, the terms "polymer" and "polymeric" refer to a polymerized moiety, a polymerized monomer, a repeating chain made of repeating units, or a polymer chain or polymer molecule. A polymer or polymer chain may be defined by recitation of its repeating unit or units, and may have various shapes or connectivities such as linear, branched, cyclic, and dendrimeric. Unless otherwise specified, the terms polymer and polymeric include homopolymers, copolymers, block copolymers, alternating polymers, terpolymers, polymers containing any number of different monomers, oligomers, networks, two-dimensional networks, three-dimensional networks, crosslinked polymers, short and long chains, high and low molecular weight polymer chains, macromolecules, and other forms of repeating structures such as dendrimers. Polymers include those having linear, branched and cyclic polymer chains, and polymers having long or short branches.
As used herein, the term "polymeric component" refers to a component of a composition, where the component is a polymer, or may form a polymer by polymerization. The term polymeric component includes a polymerizable monomer or polymerizable molecule. A polymeric component may have any combination of the monomers or polymers which make up any of the example polymers described herein, or may be a blend of polymers.
Embodiments of this invention may further provide polymeric precursors having polymer chain structures with repeating units. The stoichiometry of these polymeric precursors may be precisely controlled to provide accurate levels of any desired arbitrary ratio of particular atoms. Precursor compounds having controlled stoichiometry can be used to make bulk materials, layers, and semiconductor materials having controlled stoichiometry. In some aspects, precisely controlling the stoichiometry of a polymeric precursor may be achieved by controlling the stoichiometry of the reagents, reactants, monomers or compounds used to prepare the polymeric precursor.
For the polymeric precursors of this invention, the group R in the formulas above, or a portion thereof, may be a good leaving group in relation to a transition of the polymeric precursor compound at elevated temperatures or upon application of energy.
The functional groups R in the formulas above and in Table 1 may each be the same or different from the other and are groups attached through a carbon or non- carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, the groups R are each the same or different from the other and are alkyl groups attached through a carbon atom.
In some aspects, the monomer for MB can be represented as MB(ER1)3, and the monomer for MA can be represented as MA(ER2), where R1 and R2 are the same or different and are groups attached through a carbon or non-carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, the groups R1 and R2 are each the same or different from the other and are alkyl groups attached through a carbon atom.
In certain variations, the monomer for MB may be MB(ER1)(ER2)2, where R1 and R2 are different and are groups attached through a carbon or non-carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, the groups R1 and R2, of MB(ER1)(ER2)2, are different and are alkyl groups attached through a carbon atom.
In some embodiments, polymeric precursor compounds advantageously do not contain a phosphine ligand, or a ligand or attached compound containing phosphorus, arsenic, or antimony, or a halogen ligand.
In further embodiments, the groups R may independently be (Cl-22)alkyl groups. In these embodiments, the alkyl group may be a (Cl)alkyl (methyl), or a (C2)alkyl (ethyl), or a (C3)alkyl, or a (C4)alkyl, or a (C5)alkyl, or a (C6)alkyl, or a (C7)alkyl, or a (C8)alkyl, or a (C9)alkyl, or a (C 10)alkyl, or a (C 11 )alkyl, or a
(C12)alkyl, or a (C13)alkyl, or a (C14)alkyl, or a (C15)alkyl, or a (C16)alkyl, or a (C17)alkyl, or a (C18)alkyl, or a (C19)alkyl, or a (C20)alkyl, or a (C21)alkyl, or a (C22)alkyl.
In certain embodiments, the groups R may independently be (Cl-12)alkyl groups. In these embodiments, the alkyl group may be a (Cl)alkyl (methyl), or a (C2)alkyl (ethyl), or a (C3)alkyl, or a (C4)alkyl, or a (C5)alkyl, or a (C6)alkyl, or a (C7)alkyl, or a (C8)alkyl, or a (C9)alkyl, or a (ClO)alkyl, or a (CI l)alkyl, or a (C12)alkyl.
In certain embodiments, the groups R may independently be (Cl-6)alkyl groups. In these embodiments, the alkyl group may be a (Cl)alkyl (methyl), or a (C2)alkyl (ethyl), or a (C3)alkyl, or a (C4)alkyl, or a (C5)alkyl, or a (C6)alkyl.
A polymeric precursor compound may be crystalline, or non-crystalline.
In some embodiments, a polymeric precursor may be a compound comprising repeating units (MB(ER)(ER)} and (MA(ER)(ER)}, wherein MA is a monovalent metal atom selected from Cu, Au, Ag, or a combination thereof, M is an atom of Group 13, E is S, Se, or Te, and R is independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In certain embodiments, the atoms MB in the repeating units (MB(ER)(ER)} are randomly selected from atoms of Group 13. In certain variations, MA is Cu, Ag, or a mixture of Cu and Ag, and the atoms MB are selected from indium and gallium. E may be only selenium in a polymeric precursor, and the groups R may be independently selected, for each occurrence, from (Cl-6)alkyl.
Embodiments of this invention may further provide polymeric precursors that are linear, branched, cyclic, or a mixture of any of the foregoing. Some polymeric precursors may be a flowable liquid or melt at a temperature below about 100 °C.
In some aspects, a polymeric precursor may contain n repeating units (MB(ER)(ER)} and n repeating units (MA(ER)(ER)}, wherein n is one or more, or n is two or more, or n is three or more, or n is four or more, or n is eight or more. In some embodiments, n is from one to ten thousand, or n is from one to one thousand, or from one to five hundred, or from one to one hundred, or from one to fifty.
In further aspects, the molecular size of a polymeric precursor may be from about 500 Daltons to about 3000 kDa, or from about 500 Daltons to about 1000 kDa, or from about 500 Daltons to about 100 kDa, or from about 500 Daltons to about 50 kDa, or from about 500 Daltons to about 10 kDa. In some embodiments, the molecular size of a polymeric precursor may be greater than about 3000 kDa.
The repeating units (MB(ER)(ER)} and (MA(ER)(ER)} may be alternating. A polymeric precursor may be described by the formula (AB)n, wherein A is the repeat unit (MA(ER)(ER)}, B is the repeat unit (MB(ER)(ER)}, n is one or more, or n is two or more, and R is independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some variations, a polymeric precursor may have any one of the formulas (RE)2-BB(AB)n, (RE)2-B(AB)nB, (RE)2-B(AB)nB(AB)m, (RE)2-(BA)nBB, (RE)2-B(BA)nB,
(RE)2-(BA)nB(BA)mB, cycllc(AB)n, cycllc(BA)n, (RE)2-(BB)(AABB)n,
(RE)2-(BB)(AABB)n(AB)m, (RE)2-(B)(AABB)n(B)(AB)m, (RE)2-[B(AB)n]", and (RE)2-[(BA)nB]~, wherein A is the repeat unit (MA(ER)(ER)}, B is the repeat unit (MB(ER)(ER)}, n is one or more, or n is two or more, and m is one or more. In further aspects, a polymeric precursor may be a block copolymer containing one or more blocks of repeat units, wherein each block contains only one kind of atom MB. A precursor compound of this disclosure may be deficient in the quantity of a Group 1 1 atom. In some embodiments, a precursor compound is deficient in the quantity of Cu.
For example, a precursor compound may have the empirical formula
(Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 2.0, v is from 0.5 to 2.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups. In some embodiments, v is one, and u is 0.6, or 0.70, or 0.71, or 0.72, or 0.73, or 0.74, or 0.75, or 0.76, or 0.77, or 0.78, or 0.79, or 0.80, or 0.81, or 0.82, or 0.83, or 0.84, or 0.85, or 0.86, or 0.87, or 0.88, or 0.89, or 0.90, or 0.91, or 0.92, or 0.93, or 0.94, or 0.95, or 0.96, or 0.97, or 0.98, or 0.99. In some embodiments, y is 0.001, or 0.002. In some embodiments, t is 0.001, or 0.002. In some embodiments, the sum of y plus t is 0.001, or 0.002, or 0.003, or 0.004.
In general, a CIGS absorber material for a finished solar cell may be deficient in Cu. In some embodiments, a CIGS absorber material for a finished solar cell may have a ratio of Cu to atoms of Group 13 of 0.85 to 0.95.
A precursor compound of this disclosure may be enriched in the quantity of a Group 1 1 atom. In some embodiments, a precursor compound is enriched in the quantity of Cu.
For example, a precursor compound may have the empirical formula
(Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 2.0, v is from 0.5 to 2.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups. In some embodiments, v is one, and u is 1.1, or 1.2, or 1.3, or 1.4, or 1.5, or 1.6, or 1.7, or 1.8, or 1.9, or 2.0, or 2.1, or 2.2, or 2.3, or 2.4, or 2.5, or 2.6, or 2.7, or 2.8, or 2.9, or 3.0, or 3.1, or 3.2, or 3.3, or 3.4, or 3.5, or 3.6, or 3.7, or 3.8, or 3.9, or 4.0. In some embodiments, y is 0.001, or 0.002. In some embodiments, t is 0.001, or 0.002. In some embodiments, the sum of y plus t is 0.001, or 0.002, or 0.003, or 0.004.
For example, a precursor compound may have the empirical formula
(Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.3, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.4, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.5, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.6, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.7, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.8, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 1.9, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1i_y_tMB2 yMB3t)v((Si-zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.0, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.1, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.2, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.3, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.4, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.5, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.6, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups. For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.7, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.8, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1i_y_tMB2 yMB3t)v((Si-zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 2.9, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.0, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.1, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.2, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.3, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.4, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.5, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.6, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.7, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.8, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 3.9, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula (Cu)u(MB1i_y_tMB2 yMB3t)v((Si-zSez)R)w, wherein y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is 4.0, v is 1.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups.
For example, a precursor compound may have the empirical formula
(Cui_xAgx)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 2.0, v is from 0.5 to 2.0, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups. In some embodiments, v is one, and u is 1.1, or 1.2, or 1.3, or 1.4, or 1.5, or 1.6, or 1.7, or 1.8, or 1.9, or 2.0, or 2.1, or 2.2, or 2.3, or 2.4, or 2.5, or 2.6, or 2.7, or 2.8, or 2.9, or 3.0, or 3.1, or 3.2, or 3.3, or 3.4, or 3.5, or 3.6, or 3.7, or 3.8, or 3.9, or 4.0. In some embodiments, y is 0.001, or 0.002. In some embodiments, t is 0.001, or 0.002. In some embodiments, the sum of y plus t is 0.001, or 0.002, or 0.003, or 0.004. In some embodiments, x is 0.005, 0.01, 0.02, 0.03, 0.04, 0.05, 0.1, or 0.15.
A precursor compound of this disclosure may be a combination of u*(l-x) equivalents of MA1(ER), u*x equivalents of MA2(ER), v*(l-y-t) equivalents of MB1(ER)3, v*y equivalents of MB2(ER)3, v*t equivalents of MB3(ER)3, wherein MA1 is Cu and MA2 is Ag, MB1, MB2 and MB3 are different atoms of Group 13, wherein the compound has the empirical formula (MA1 1_xMA2 x)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CAIGAS, CAIGS, CIGAS, CIGS, AIGAS and AIGS materials, including materials deficient or enriched in the quantity of a Group 11 atom, for example materials deficient or enriched in Cu.
In some embodiments, x is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In further embodiments, a precursor compound can contain S, Se and Te. In some embodiments, a precursor compound can be a combination of w*(l-z) equivalents of MA1(ER1), w*z equivalents of MA2(ER2), x equivalents of MB1(ER3)3, y equivalents of MB2(ER4)3, t equivalents of MB3(ER5)3, wherein MA1 is Cu and MA2 is Ag, M , M and M are different atoms of Group 13, wherein the compound has the empirical formula (Cui_zAgz)wInxGayAlt(ER1)w(i_z)(ER2)(w*z)(ER3)3X(ER4)3y(ER5)3t, w is from 0.5 to 1.5, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R1, R2, R3, R4 and R5 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CAIGAS, CAIGS, CIGAS, CIGS, AIGAS and AIGS materials, including materials deficient or enriched in the quantity of a Group 11 atom. In some embodiments, z is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
A precursor compound of this disclosure may be a combination of x equivalents of MA1(ER), v*(l-y-t) equivalents of MB1(ER)3, v*y equivalents of MB2(ER)3, v*t equivalents of MB3(ER)3, wherein MA1 is Cu, MB1, MB2 and MB3 are different atoms of Group 13, wherein the compound has the empirical formula MA1 x(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein x is from 0.5 to 1.5, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CIGAS and CIGS materials, including materials deficient or enriched in the quantity of a Group 11 atom. In some embodiments, t is from 0.001 to 0.999.
In some embodiments, a precursor compound can be a combination of z equivalents of MA1(ER1), x equivalents of MB1(ER3)3, y equivalents of MB2(ER4)3, t equivalents of MB3(ER5)3, wherein MA1 is Cu, MB1, MB2 and MB3 are different atoms of Group 13, wherein the compound has the empirical formula
CuzInxGayAlt(ER1)w(i_z)(ER2)(w*z)(ER3)3x(ER4)3y(ER5)3t, z is from 0.5 to 1.5, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R1, R2, R3, R4 and R5 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CIGAS and CIGS materials, including materials deficient in the quantity of a Group 11 atom. In some embodiments, t is from 0.001 to 0.999. A precursor compound of this disclosure may be a combination of u*(l-x) equivalents of MA1(ER), u*x equivalents of MA2(ER), v*(l-y) equivalents of
MB1(ER)3, v*y equivalents of MB2(ER)3, wherein MA1 is Cu and MA2 is Ag, MB1 and MB2 are different atoms of Group 13, wherein the compound has the empirical formula (MA1 1_xMA2 x)u(MB1 1_yMB2 y)v((Si_zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CAIGS, CIGS and AIGS materials, including materials deficient in the quantity of a Group 11 atom. In some embodiments, x is from 0.001 to 0.999.
In some embodiments, a precursor compound can be a combination of w*(l-z) equivalents of MA1(ER1), w*z equivalents of MA2(ER2), x equivalents of MB1(ER3)3, y equivalents of MB2(ER4)3, wherein MA1 is Cu and MA2 is Ag, MB1 and MB2 are different atoms of Group 13, wherein the compound has the empirical formula
(Cui-zAgz)wInxGay(ER1)w(i_Z)(ER2)(w*Z)(ER3)3x(ER4)3y, w is from 0.5 to 1.5, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, x plus y is one, and wherein R1, R2, R3, R4 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CAIGS, CIGS and AIGS materials, including materials deficient or enriched in the quantity of a Group 1 1 atom. In some embodiments, z is from 0.001 to 0.999.
A precursor compound of this disclosure may be a combination of x equivalents of MA1(ER), v*(l-y) equivalents of MB1(ER)3, v*y equivalents of MB2(ER)3, wherein MA1 is Cu, MB1and MB2 are different atoms of Group 13, wherein the compound has the empirical formula MA1 x(MB1i_yMB2 y)v((Si-zSez)R)w, wherein x is from 0.5 to 1.5, y is from 0 to 1, z is from 0 to 1, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CIGS materials, including materials deficient or enriched in the quantity of a Group 1 1 atom.
In some embodiments, a precursor compound can be a combination of z equivalents of MA1(ER1), x equivalents of MB1(ER2)3, y equivalents of MB2(ER3)3, wherein M is Cu, M and M are different atoms of Group 13, wherein the compound has the empirical formula CuzInxGay(ER1)z(ER2)3X(ER3)3y, z is from 0.5 to 1.5, x is from 0 to 1, y is from 0 to 1, x plus y is one, and wherein R1, R2, R3 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CIGS materials, including materials deficient or enriched in the quantity of a Group 1 1 atom.
This disclosure provides a range of polymeric precursor compounds made by reacting a first monomer MB(ER1)3 with a second monomer MA(ER2), where MA is a monovalent metal atom, MB is an atom of Group 13, E is S, Se, or Te, and R1 and R2 are the same or different and are independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic groups. The compounds may contain n repeating units (MB(ER)(ER)} and n repeating units (MA(ER)(ER)}, wherein n is one or more, or n is two or more, and R is defined, for each occurrence, the same as R1 and R2.
A polymeric precursor molecule can be represented by the formula
(MA(ER)(ER)MB(ER)(ER)}, or {MA(ER)2MB(ER)2}, which are each understood to represent an {AB} repeating unit of a polymeric precursor (AB)n. This shorthand representation is used in the following paragraphs to describe further examples of polymeric precursors. Further, when more than one kind of atom MA or MB is present, the amount of each kind may be specified in these examples by the notation (x MA1,y MA2) or (x MB1,y MB2). For example, the polymeric compound
{Cu(SenBu)2(Ino.75,Ga0.25)(SenBu)2} is composed of repeating units, where the repeating units can appear in any order, and 75% of the repeating units contain one indium atom and 25% contain one gallium atom.
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
{Cu1.5o(SetBu)1.5(SenBu)(Ino.7Gao.25Alo.o5)(SenBu)2}
{Cu1.7o(SetBu)1.7(SenBu)(Ino.75Gao.25)(SenBu)2}
{Cu1.7o(SetBu)1.7(SesBu)(Ino.75Gao.25)(SesBu)2}
{Cu2 Se )2.oo(SenBu)(Ino.7oGao3o)(SenBu)2}
{Cu3.o(Set3u)3.o(SenBu)(Ino.7Gao )(SenBu)2}
{Cu2.5(Set3u)2 SenBu)(Ino.7oGa03o)(SenBu)2} {Οη2.ο(861Βη)2.ο(86¾η)(Ιηο.7οΟ 0.3ο)(86¾η)2}
{Οη2.ο(861Βη)2.ο(86¾η)(Ιηο.5Ο 0.5)(86¾η)2}
{Οη2.0(86ιΒη)2.ο(86ηΒη)(Ιηο.5Ο 0.5)(86ηΒη)2}
{Cu1.8oAgo.2o(SetBu)2.o(SenBu)(Ino.7Gao.2oAlo.io)(SenBu)2}.
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas: {Ag(SesecBu)4ln},
{ Ago.6(SesecBu)3.6ln} , { Ag0.9(SesBu)3.9ln} , { Agl.5(SesBu)4.5In} ,
{AgCS^BuMSe lIn}, {Cu0.5Ag0.5(SesBu)4In}, {Ag(Se¾u)4Ga},
{Ago.8(SesBu)3.8lno.2Gao.8}, {Ag(SesBu)4Ino.3Gao.7}, {Ag(SesBu)4Ino.7Gao.3}, {Ag(SesBu)4Ino.5Gao.5}, {Cu0.7Ago.i(SesBu)3.8Gao.3lno.7}, {Cuo.8Ago.2(SesBu)4In}, {Cu0.2Ago.8(SesBu)4In}, {Cuo.sAgo.XSe'BukGao.jIno.s},
{Cuo.85Ago.i(SesBu)3.95Gao.3lno.7}, {Cuo.5Ago.5(SesBu)4Gao.3lno.7},
{Ag(SesBu)3(SetBu)Gao.3lno.7}, {Cuo.8Ago.o5(SesBu)3.85Gao.3lno.7}.
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
{Cu1.4oAgo.io(SetBu)1.5(SenBu)(Ino.7Gao.25Alo.o5)(SenBu)2};
{Cu1.3oAgo.io(StBu)1.4(StBu)(Ino.85Gao.1Alo.o5)(StBu)2};
{Cu1.20Ago.1o(StBu)1.3(SnBu)(Ino.8oGao.15Alo.o5)(SnBu)2};
{Cu1.1oAgo.io(SetBu)1.2(SenBu)(Ino.75Gao.2oAlo.o5)(SenBu)2};and
{Cui.osAgo.osCS'B^LiCSe'B^CIno.TGao.zAlo. CSe'Bu),} .
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas: {Cu(StBu)(S1Pr)In(S1Pr)2}; {CuCS'BuhlnCS h} ; {CuCS l^Bu S^uh} ; {CuCSe'BuXSe' lInCSe' h} ; {CuCS'BuXSe'Bu Se'Buh} ; {CuCSe'BuXS lGaCS h} ;
{CuCSe hGaCSe h}; {CuCS'BuhGaCS h}; {CuCSe hlnCSe h};
{CuCSe'BuXSe'PrtfnCSe'Prh}; {CuCSe'BuXS'Bu S'Buh};
{CuCSe'BuXSe'PrlGaCSe'Prh}; and {CuCS'BuXS^GaCSirh}.
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
{CuCSe Se^utfn^Buh}; {Cu^BuXS^In^Prh};
{Cu^BuXS'Bu S h} ; {CuCSe^uXSe lInCSe h} ;
{CuCS'BuXSe'Bu Se'Buh} ; {CuCSe'BuXS lGaCS h} ;
{Cu^BuXS'BulGaCS h} ; {CuCSe'BuXSe'Bu Se h} ; {CuCSe'BuXSe'PrtfnCSe'Prh}; {Cu Se'BuXS'Bu S'Buh};
{CuCSe'BuXSe'Pi GaCSe'Prh}; and {Cu^BuXS^Ga^Prh}.
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
{Cu(StBu)(SiPr)(In,Ga)(SiPr)2}; {Cu(StBu)2(In,Ga)(StBu)2};
{Cu(StBu)(SnBu)(In,Ga)(SnBu)2} ; {Cu(SetBu)(SenBu)(In,Ga)(SenBu)2} ;
{Cu(StBu)(SetBu)(In,Ga)(SetBu)2} ; {Cu(SetBu)(StBu)(In,Ga)(StBu)2} ;
{Cu(SetBu)2(In,Ga)(SetBu)2} ; {Cu(StBu)2(In,Ga)(StBu)2} ;
{Cu(SetBu)2(In,Ga)(SetBu)2}; {Cu(SetBu)(SeiPr)(In,Ga)(SeiPr)2};
{Cu(SetBu)(SsBu)(In,Ga)(S¾u)2}; {Cu(SetBu)(SeiPr)(In,Ga)(SeiPr)2}; and
{Cu(StBu)(SiPr)(In,Ga)(SiPr)2}.
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
{Cu(SetBu)(SenBu)(In,Ga)(SenBu)2}; {Cu(StBu)(SiPr)(In,Ga)(SiPr)2};
{Cu(SnBu)(StBu)(In,Ga)(StBu)2}; {Cu(SenBu)(SetBu)(In,Ga)(SetBu)2};
{Cu(StBu)(SetBu)(In,Ga)(SetBu)2} ; {Cu(SetBu)(StBu)(In,Ga)(StBu)2} ;
{Cu(SnBu)(StBu)(In,Ga)(StBu)2} ; {Cu(Se¾u)(SetBu)(In,Ga)(SetBu)2} ;
{Cu(SetBu)(SeiPr)(In,Ga)(SeiPr)2}; {Cu Se'BuXS'BuXI^TlXS'Buh};
{CuCSe'B^CSe^ CGa CSe^r^; and {Cu(StBu)(SiPr)(In,Ga)(SiPr)2} .
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
{(0.85 Cu)(0.85 Se KSe^uXO In,0.3 Ga)(SenBu)2};
{(0.9 Cu)(0.9 S'BuXS'BuXO.SS In,0.15 Ga)(StBu)2};
{(0.75 Cu)(0.75 S ^BuXO-SO In,0.20 Ga)(SnBu)2};
{(0.8 Cu)(0.8 Se'BuXSe^uXO S In,0.25 Ga)(SenBu)2};
{(0.95 Cu)(0.95 S'BuXSe'BuXO O In,0.30 Ga)(SetBu)2};
{(0.98 Cu)(0.98 Se'BuXS'BuXO^OO In,0.400 Ga)(StBu)2};
{(0.835 Cu)(0.835 Se h^ Ιη,Ο.1 Ga)(SetBu)2};
{Cu S'BuMO.S In,0.2 Ga)(StBu)2}; {Cu Se'BuMO S In,0.25 Ga)(SetBu)2}; {Cu(SetBu)(SeiPr)(0.67 In,0.33 Ga)(SeiPr)2};
{Cu Se'BuXS'BuXO^S In,0.125 Ga)(S¾u)2};
{Cu(SetBu)(SeiPr)(0.99 Ιη,Ο.01 Ga)(SeiPr)2}; and
{Cu(StBu)(SiPr)(0.97 In,0.030 Ga)(SiPr)2}. Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas: {Cu(SesBu)2In(SesBu)2};
{Cu(SesBu)2Ga(SesBu)2} ; {CuCS'BuhlnCS'Buh} ; {CuCS hln^Buh} ;
{CuCSe'B^zGaCSe^z} ; {CuCSe hGaCSe'Buh} ; {Cu S hln^Buh} ;
Figure imgf000058_0001
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
{CuCSe'BuXSe' KO.S In,0.5 Ga)(SenBu)2};
{CuCSe'BuXSe' KO.VS In,0.25 Ga)(SenBu)2}; {CuCS'BuMO.VS In,0.25 GaXS'Buh}; and {CuCS'BuMO^ In l GaXS h}.
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
{Cu(Se(n-pentyl))(SenBu)(0.5 In,0.5 Ga)(SenBu)2};
{Cu(Se(n-hexyl))(SenBu)(0.75 In,0.25 Ga)(SenBu)2};
Figure imgf000058_0002
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
Figure imgf000058_0003
{Ag(StBu)(SiPr)(In,Ga)(SiPr)2} ;
{AuCS^BuXSe^ulInCSe^uh} ; {HgCS'BuXS'Prtfn^Prh} ;
{Ag(StBu)(S1Pr)(In,Ga)(S1Pr)2};
Figure imgf000058_0004
Figure imgf000058_0005
{Hg(StBu)(SiPr)(In,Ga)(SiPr)2} ;
{AgCS'BuXS'PrXO^ Ιη,Ο.1 Ga)(SiPr)2}; {Α§(8ιΒυ)2(0.85 In,0.15 GaXS'Buh};
{CuCSe'BuXSe' KO.S In,0.5 Al)(SenBu)2};
{CuCSe'B^CSe^CO.VS In,0.25 Al)(SenBu)2},
{(Ag,Au)(StBu)(SiPr)(In,Ga)(SiPr)2} ; {(CuAuXSe'BuXSe^u Se^uh} ; and {(Cu,Hg)(StBu)(SiPr)In(SiPr)2} .
Examples of polymeric precursor compounds of this disclosure include compounds having any one of the repeat unit formulas:
Figure imgf000058_0007
{(0.75 Cu,0.25 AgXSe'BuXSe^uXI^GaXS^Buh} ;
{(0.7 Cu,0.3 AgXSe'BuXS^BuXIn.GaXS^BuM ;
{(0.65 Cu,0.35 AgXSeTiuXSe^uXI^GaXSe^uh} ;
{(0.6 Cu,0.4 AgXSe'BuXS^BuXIn.GaXS^BuM ;
{(0.55 Cu,0.45 AgXSeTiuXSe^uXI^GaXSe^uh} ; and
{(0.5 Cu,0.5 Ag)(SetBu)(SenBu)(In,Ga)(SenBu)2} .
Preparation of polymeric precursors (MPP
Embodiments of this invention provide a family of polymeric precursor molecules and compositions which can be synthesized from a compound containing an atom MB of Group 13 selected from Al, Ga, In, Tl, or a combination thereof, and a compound containing a monovalent atom MA.
Advantageously facile routes for the synthesis and isolation of polymeric precursor compounds of this invention have been discovered, as described below.
This disclosure provides a range of polymeric precursor compositions which can be transformed into semiconductor materials and semiconductors. In some aspects, the polymeric precursor compositions are precursors for the formation of semiconductor materials and semiconductors.
In general, the polymeric precursor compositions of this invention are non- oxide chalcogen compositions.
In some embodiments, the polymeric precursor compositions are sources or precursors for the formation of absorber layers for solar cells, including CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS and CAIGAS absorber layers.
A polymeric precursor compound may be made with any desired
stoichiometry regarding the number of different metal atoms and atoms of Group 13 and their respective stoichiometric levels or ratios.
As discussed below, a polymeric precursor compound may be made by reacting monomers to produce a polymer chain. The polymeric precursor formation reactions can include initiation, propagation, and termination.
Methods for making a polymeric precursor may include the step of contacting a compound MB(ER)3 with a compound MA(ER), where MA, MB, E, and R are as defined above.
As shown in Reaction Scheme 1 , a method for making a polymeric precursor may include the step of contacting a compound MB(ER1)3 with a compound MA(ER2), where MA, MB, and E are as defined above and the groups R1 and R2 of the compounds may be the same or different and are as defined above.
REACTION SCHEME 1 :
initiation
MB(ER1)3 + MA(ER2) (ER2)(ER1)MB(ER1)2
In Reaction Scheme 1, MB(ER1)3 and MA(ER2) are monomers that form the first adduct 1, MA(ER)2MB(ER)2. Reaction Scheme 1 represents the initiation of a polymerization of monomers. In one aspect, Reaction Scheme 1 represents the formation of the intermediate adduct AB. In general, among other steps, the polymerization reaction may form polymer chains by adding monomers to the first adduct 1, so that the first adduct 1 may be a transient molecule that is not observed when a longer chain is ultimately produced. When additional monomers are bound to either end of the first adduct 1, then the first adduct 1 becomes a repeating unit AB in the polymer chain.
In general, to prepare a polymeric precursor, the compounds MB(ER)3 and MA(ER) can be generated by various reactions.
For example, a compound MA(ER) can be prepared by reacting MAX with M (ER). M (ER) can be prepared by reacting E with LiR to provide Li(ER). Li(ER) can be acidified to provide HER, which can be reacted with Na(OR) or K(OR) to provide Na(ER) and K(ER), respectively. In these reactions, E, R and MA are as defined above.
In another example, a compound MA(ER) can be prepared by reacting MAX with (RE)Si(CH3)3. The compound (RE)Si(CH3)3 can be made by reacting M+(ER) with XSi(CH3)3, where M+ is Na, Li, or K, and X is halogen.
In another example, a compound MA(ER) can be prepared by reacting MA 20 with HER. In particular, Cu(ER) can be prepared by reacting (¾0 with HER.
For example, a compound MB(ER)3 can be prepared by reacting MBX3 with M (ER). M (ER) can be prepared as described above.
In another example, a compound MB(ER)3 can be prepared by reacting MBX3 with (RE)Si(CH3)3. The compound (RE)Si(CH3)3 can be made as described above. In another example, a compound M (ER)3 can be prepared by reacting M R3 with HER.
Moreover, in the preparation of a polymeric precursor, a compound
M+MB(ER)4 can optionally be used in place of a portion of the compound MB(ER)3. For example, a compound M+MB(ER)4 can be prepared by reacting MBX3 with 4 equivalents of M+(ER), where M+ is Na, Li, or K, and X is halogen. The compound M (ER) can be prepared as described above.
The propagation of the polymeric precursor can be represented in part by the formulas in Reaction Scheme 2. The formulas in Reaction Scheme 2 represent only some of the reactions and additions which may occur in propagation of the polymeric precursor.
REACTION SCHEME 2: propogation
1 + MB(ER1)3
(R1E)MB(ER1)2MA(ER2)(ER1)MB(ER1)2 2 propogation
(ER2) - MA(ER2)(ER1)MB(ER1)2MA(ER2)
In Reaction Scheme 2, the addition of a monomer MB(ER1)3 or MA(ER2) to the first adduct 1, may produce additional adducts 2 and 3, respectively. In one aspect, Reaction Scheme 2 represents the formation of the adduct (RE)-BAB, as well as the adduct intermediate AB-MA(ER). In general, the adducts 2 and 3 may be transient moieties that are not observed when a longer chain is ultimately produced.
The products of the initial propagation steps may continue to add monomers in propagation. As shown in Reaction Scheme 3, adduct 2 may add a monomer
MB(ER1)3 or MA(ER2). REACTION SCHEME 3: propogation
2 + MA(ER2)
(R1E)MB(ER1)2MA(ER2)(ER1)MB(ER1)2MA(ER2) 4
+
MA(ER2)(ER1)MB(ER1)2MA(ER2)(ER1)MB(ER1)2 5
, propogation
2 + MD(ER1)3
(R1E)2MB(ER1)2MB(ER1)2MA(ER2)(ER1)MB(ER1)2 6
In one aspect, Reaction Scheme 3 represents the formation of the intermediate adduct (RE)-BAB-MA(ER) 4, as well as the adduct (RE)2-BBAB 6. In general, the molecules 4, 5 and 6 may be transient molecules that are not observed when a longer chain is ultimately produced.
Other reactions and additions which may occur include the addition of certain propagating chains to certain other propagating chains. For example, as shown in Reaction Scheme 4, adduct 1 may add to adduct 2 to form a longer chain.
REACTION SCHEME 4:
propogation
1 + 2
(R1E)MB(ER1)2MA(ER2)(ER1)MB(ER1)2MA(ER2)(ER1)MB(ER1)2 7
In one aspect, Reaction Scheme 4 represents the formation of the adduct (RE)-BABAB 7.
Any of the moieties 4, 5, 6, and 7 may be transient, and may not be observed when a longer chain is ultimately produced.
In some variations, a propagation step may provide a stable molecule. For example, moiety 6 may be a stable molecule. In general, AB alternating block copolymers as described in Formulas 18 through 23 may be prepared by sequential addition of the corresponding monomers MB1(ER)3, MB2(ER)3, and MB3(ER)3, when present, as well as MA1(ER), MA2(ER), and MA3(ER), when present, during polymerization or propagation.
Certain reactions or additions of the polymeric precursor propagation may include the formation of chain branches. As shown in Reaction Scheme 5, the addition of a monomer MA(ER2) to the adduct molecule 2 may produce a branched chain 8.
REACTION SCHEME 5:
8
Figure imgf000063_0001
The propagation of the polymeric precursor can be represented in part by the formulas in Reaction Schemes 2, 3, 4 and 5. The formulas in Reaction Schemes 2, 3, 4 and 5 represent only some representative reactions and additions which may occur in propagation of the polymeric precursor.
Termination of the propagating polymer chain may occur by several
mechanisms. In general, because of the valencies of the atoms MA and MB, a completed polymer chain may terminate in a MB unit, but not an MA unit. In some aspects, a chain terminating unit is a »··Β unit, or a (ER)2B"» unit.
In some aspects, the propagation of the polymeric precursor chain may terminate when either of the monomers MB(ER)3 or MA(ER) becomes depleted. In certain aspects, as shown in Reaction Scheme 6, the propagation of the polymeric precursor chain may terminate when a growing chain represented by the formula (RE)-B B reacts with another chain having the same terminal (RE)-B unit to form a chain having the formula B BB B.
REACTION SCHEME 6:
termination
Figure imgf000064_0001
(RE)2B ·ΒΒ ·Β
In Reaction Scheme 6, two chains have combined, where the propagation of the polymer chain is essentially terminated and the product chain
(RE)2B BB B has chain terminating units that are B units.
In further aspects, the propagation of the polymeric precursor chain may terminate when the growing chain forms a ring. As shown in Reaction Scheme 7, a propagating chain such as 5 may terminate by cyclization in which the polymer chain forms a ring.
REACTI
Figure imgf000064_0002
A polymeric precursor compound may be a single chain, or a distribution of chains having different lengths, structures or shapes, such as branched, networked, dendrimeric, and cyclic shapes, as well as combinations of the forgoing. A polymeric precursor compound may be any combination of the molecules, adducts and chains described above in Reaction Schemes 1 through 7.
A polymeric precursor of this disclosure may be made by the process of providing a first monomer compound having the formula MB(ER1)3, providing a second monomer compound having the formula MA(ER2), and contacting the first monomer compound with the second monomer compound. In some embodiments, the first monomer compound may be a combination of compounds having the formulas MB1(ER1)3 and MB2(ER3)3, wherein MB1 and MB2 are different atoms of Group 13, and R1, R2 and R3 are the same or different and are independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands.
In some variations, the first monomer compound may be a combination of compounds having the formulas MB1(ER1)3, MB2(ER3)3, and MB3(ER4)3, wherein MB1, MB2 and MB3 are atoms of Group 13 each different from the other, and R3 and R4 are defined the same as R1 and R2.
In certain aspects, the second monomer compound may be a combination of compounds having the formulas MA1(ER2) and MA2(ER3), wherein MA1 and MA2 are different atoms selected from Cu, Au, Ag, or a combination thereof, and R3 is defined the same as R1 and R2.
In further aspects, a method for making a polymeric precursor may include the synthesis of a compound containing two or more atoms of MB and contacting the compound with a compound MA(ER), where MA, MB, E and R are as defined above. For example, (ER)2MB1(ER)2MB2(ER)2 can be reacted with MA(ER2), where MB1 and MB2 are the same or different atoms of Group 13.
Methods for making a polymeric precursor include embodiments in which the first monomer compound and the second monomer compound may be contacted in a process of depositing, spraying, coating, or printing. In certain embodiments, the first monomer compound and the second monomer compound may be contacted at a temperature of from about -60 °C to about 100 °C.
Processes with polymeric precursors enriched in a Group 11 atom
A polymeric precursor compound may be made with any desired
stoichiometry with respect to the number of different metal atoms and atoms of Group 11 and their respective stoichiometric levels or ratios. In some aspects, referring to Fig. 5, the initial or first layer 205 may be formed with precursors enriched in the quantity of Cu, and the main or second layer 210 may be highly deficient in the quantity of Cu. The second layer may be deficient in the quantity of Cu so that the second layer contains no copper.
In some embodiments, the initial or first layer 205 may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 is from 1.05 to 4, and the main or second layer 210 may be formed with one or more monomers MB(ER)3, where MB is a Group 13 atom. Any combination, ratio or amount of monomers of In, Ga and Al may be used to form the main or second layer 210. For example, the initial or first layer 205 may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 is 1.5, or 2.0, or 2.5, or 3.0, or 3.5, or 4.0. The main or second layer 210 may be formed with any amounts of the monomers In(ER)3, Ga(ER)3, and A1(ER)3.
In certain embodiments, the initial or first layer 205 or the main or second layer 210 may contain precursors deficient in the quantity of Cu. For example, the first layer 205 or the second layer 210 may contain a polymeric precursor deficient in the quantity of Cu so that the ratio of atoms of Cu to atoms of Group 13 is 0.5, or 0.6, or 0.7, or 0.8, or 0.9, or 0.95.
In addition, the initial or first layer 205 or the main or second layer 210 may contain MalkMB(ER)4 or Malk(ER), wherein Malk is Li, Na, or K, MB is In, Ga, or Al, E is sulfur or selenium, and R is alkyl or aryl, for example, NaIn(SenBu)4, or
NaGa(SenBu)4.
In further aspects, the roles of the layers may be reversed, so that the initial or first layer 205 may be highly deficient in the quantity of a Group 1 1 atom, and the main or second layer 210 may be highly enriched in the quantity of a Group 1 1 atom.
In some embodiments, the initial or first layer 205 may be may be formed with one or more monomers MB(ER)3, and the main or second layer 210 may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 is from 1.05 to 4, where MB is a Group 13 atom. Any combination, ratio or amount of monomers of In, Ga and Al may be used to form the initial or first layer 205. For example, the main or second layer 210 may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 is 1.5, or 2.0, or 2.5, or 3.0, or 3.5, or 4.0. The initial or first layer 205 may be formed with any amounts of the monomers In(ER)3, Ga(ER)3, and A1(ER)3. In further aspects, an additional layer may be formed with precursors enriched in the quantity of Cu, where the additional layer is between the initial or first layer 205 and the substrate 200. The optional additional layer may be formed with precursors enriched in Cu so that the ratio of atoms of Cu to atoms of Group 13 in the optional additional layer is 1.05, or 1.1, or 1.15, or 1.2, or 1.25, or 1.3.
Controlling the stoichiometry of atoms of Group 13 in polymeric precursors
A polymeric precursor compound may be made with any desired
stoichiometry with respect to the number of different metal atoms and atoms of Group 13 and their respective stoichiometric levels or ratios.
In some embodiments, the stoichiometry of a polymeric precursor compound may be controlled through the numbers of equivalents of the monomers in the formation reactions.
In some aspects, the monomers MB1(ER)3, MB2(ER1)3, MB3(ER2)3, and MB4(ER3)3 can be used for polymerization. Examples of these monomers are In(ER)3, Ga(ER1)3, A1(ER2)3, where the groups R, Rx,and R2 are the same or different and are groups attached through a carbon or non-carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, the groups R,
Figure imgf000067_0001
R2 are each the same or different from the others and are alkyl groups attached through a carbon atom.
In further aspects, the monomers MB1(ER)(ER1)2, MB2(ER2)(ER3)2, and MB3(ER4)(ER5)2 can be used for polymerization, where the groups R, R1, R2, R3, R4, and R5 are each the same or different from the others and are groups attached through a carbon or non-carbon atom, including alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, the groups R, R1, R2, R3, R4, and R5 are each the same or different from the others and are alkyl groups attached through a carbon atom.
Embodiments of this invention may further provide that the stoichiometry of a polymeric precursor compound may be controlled to any desired level through the adjustment of the amounts of each of the monomers provided in the formation reactions.
As shown in Reaction Scheme 8, a polymerization to form a polymeric precursor may be initiated with a mixture of monomers MA(ER3), MB1(ER1)3, and MB2(ER2)3 having any arbitrary ratios of stoichiometry. REACTION SCHEME 8: m , , ^ initiation
1(ER1)3 + n MB2(ER2)3 + M (ER )
MA(ER3)(ER1 '2)(nMB 1 ,mMB2)(ER1 '2)2 V
In Reaction Scheme 8, a polymerization can be performed with a mixture of monomers in any desired amounts. In certain variations, a polymerization to form a polymeric precursor may be initiated with a mixture of any combination of the monomers described above, where the number of equivalents of each monomer is adjusted to any arbitrary level.
In some variations, a polymerization to form a polymeric precursor can be done using the monomers MA1(ER1), MA2(ER2), and MA3(ER3), for example, which can be contacted in any desired quantity to produce any arbitrary ratio of MA1 to MA2 to MA3.
In some aspects, for alternating copolymers of monomers MA(ER) and
MB(ER)3, the ratio of MA to MB in the polymeric precursor can be controlled from a ratio as low as 1 :2 in the unit BAB, for example, to a ratio of 1 : 1 in an alternating
(AB)n polymeric precursor, to a ratio of 1.5: 1 or higher. The ratio of MA to MB in the polymeric precursor may be 0.5 to 1.5, or 0.5 to 1, or 1 to 1, or 1 to 0.5, or 1.5 to 0.5. As discussed above, in further embodiments, a polymeric precursor compound may be made with any desired stoichiometry of the number of different metal atoms and atoms of Group 13 and their respective concentration levels or ratios.
In certain aspects, a polymerization to form a polymeric precursor can be done to form a polymeric precursor having any ratio of MA to MB. As shown in Reaction Scheme 9, a polymeric precursor having the composition {p MA(ER) / m
MB1(ER)3 / n MB2(ER)3} may be formed using the mixture of monomers m
MB1(ER)3 + n MB2(ER)3 + p MA(ER). REACTION SCHEME 9: m MB1(ER)3 + n MB2(ER)3 + p MA(ER)
{p M (ER) / m M (ER)3 / n Maz(ER)3} polymeric precursor
In certain variations, any number of monomers of MA(ER) and any number of monomers of MB(ER)3 can be used in the formation reactions. For example, a polymeric precursor may be made with the monomers MA1(ER), MA2(ER), MA3(ER),
MB1(ER)3, ΜΒ2(Ε^)3, MB3(ER2)3, and MB4(ER3)3, where the number of equivalents of each monomer is an independent and arbitrary amount.
For example, the ratios of the atoms MA : MB in a polymeric precursor may be about 0.5 : 1 or greater, or about 0.6 : 1 or greater, or about 0.7 : 1 or greater, or about 0.8 : 1 or greater, or about 0.9 : 1 or greater, or about 0.95 : 1 or greater. In certain variations, the ratios of the atoms MA : MB in a polymeric precursor may be about
1 : 1 or greater, or about 1.1 : 1 or greater.
In further examples, the ratios of the atoms MA : MB in a polymeric precursor may be from about 0.5 to about 1.2, or from about 0.6 to about 1.2, or from about 0.7 to about 1.1, or from about 0.8 to about 1.1, or from about 0.8 to about 1, or from about 0.9 to about 1. In some examples, the ratios of the atoms MA : MB in a
polymeric precursor may be about 0.80, or about 0.82, or about 0.84, or about 0.86, or about 0.88, or about 0.90, or about 0.92, or about 0.94, or about 0.96, or about 0.98, or about 1.00, or about 1.02, or about 1.1, or about 1.2, or about 1.3, or about 1.5. In the foregoing ratios MA : MB, the ratio refers to the sum of all atoms of MA or MB, respectively, when there are more than one kind of MA or MB, such as MA1 and MA2 and MB1 and MB2.
As shown in Reaction Scheme 10, a polymeric precursor compound having the repeating unit composition {MA(ER)2(m MB1,n MB2)(ER)2} may be formed using the mixture of monomers m MB1(ER)3 + n MB2(ER)3 + MA(ER). REACTION SCHEME 10: m MB1(ER)3 + n MB2(ER)3 + MA(ER) ·»
{MA(ER)2(m MB 1,n MB2)(ER)2} polymeric precursor repeating unit
In Reaction Scheme 10, the sum of m and n is one.
Embodiments of this invention may further provide a polymeric precursor made from monomers of MA(ER) and MB(ER)3, where the total number of
equivalents of monomers of MA(ER) is less than the total number of equivalents of monomers of MB(ER)3. In certain embodiments, a polymeric precursor may be made that is substoichiometric or deficient in atoms of MA relative to atoms of MB.
As used herein, the expression MA is deficient, or MA is deficient to MB refers to a composition or formula in which there are fewer atoms of MA than MB.
As used herein, the expression MA is enriched, or MA is enriched relative to MB refers to a composition or formula in which there are more atoms of MA than MB.
As shown in Reaction Scheme 1 1, a polymeric precursor having the empirical formula
Figure imgf000070_0001
may be formed using the mixture of
monomers MB1(ER)3, MB2(ER)3 and MA(ER).
REACTION SCHEME 1 1 : v(l-y) MB 1(ER)3 + v(y) MB2(ER)3 + x MA(ER)
{MA x(MBYyMB2 y)v(ER)w} polymeric precursor
where w can be (3v+x).
In some embodiments, a precursor compound may be a combination of u*(l-x) equivalents of MA1(ER), u*x equivalents of MA2(ER), v*(l-y-t) equivalents of MB1(ER)3, v*y equivalents of MB2(ER)3, v*t equivalents of MB3(ER)3, wherein MA1 is Cu and MA2 is Ag, MB1, MB2 and MB3 are different atoms of Group 13, wherein the compound has the empirical formula (MA1 1_xMA2 x)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, x is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In some embodiments, a precursor compound may have the empirical formula (Cui-xAgx)u(Ini_y_tGayAlt)v((Si-zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, as defined above. In some embodiments, x is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In some embodiments, a precursor compound may have the empirical formula (Cui-xAgx)u(Ini_y_tGayAlt)v((Si-zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1.25, v is from 0.7 to 1.25, w is from 2 to 6, and R represents R groups, of which there are w in number, as defined above. In some embodiments, x is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In some embodiments, a precursor compound may have the empirical formula (Cui-xAgx)u(Ini_y_tGayAlt)v((Si-zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.8 to 0.95, v is from 0.9 to 1.1, w is from 3.6 to 4.4, and R represents R groups, of which there are w in number, as defined above. In some embodiments, x is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In some embodiments, a precursor compound may be a combination of w*(l-z) equivalents of MA1(ER1), w*z equivalents of MA2(ER2), x equivalents of MB1(ER3)3, y equivalents of MB2(ER4)3, t equivalents of MB3(ER5)3, wherein MA1 is Cu and MA2 is Ag, MB1, MB2 and MB3 are different atoms of Group 13, wherein the compound has the empirical formula (Cui-zAgz)wInxGayAlt(ER1)w(i_
Z)(ER2)(w*z)(ER3)3x(ER4)3y(ER5)3t, w is from 0.5 to 1.5, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R1, R2, R3, R4 and R5 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, z is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In some embodiments, a precursor compound may have the empirical formula (Qii-zAgz^InxGayAl^ER^i^CER ^CER^sxCER^yCER^st, w is from 0.5 to 1.5, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R1, R2, R3, R4 and R5 are as defined above. In some embodiments, z is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In some embodiments, a precursor compound may have the empirical formula (Qii-zAgz^InxGayAl^ER^i^CER ^CER^sxCER^yCER^st, w is from 0.7 to 1.25, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R1, R2, R3, R4 and R5 are as defined above. In some embodiments, z is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In some embodiments, a precursor compound may have the empirical formula (Cu1_zAgz)wInxGayAlt(ER1)w(1.z)(ER2)(w*z)(ER3)3X(ER4)3y(ER5)3t, w is from 0.8 to 0.95, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, x plus y plus t is one, and wherein R1, R2, R3, R4 and R5 are as defined above. In some embodiments, z is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In further aspects, a mixture of polymeric precursor compounds may advantageously be prepared with any desired stoichiometry of the number of different metal atoms and atoms of Group 13 and their respective stoichiometric levels or ratios.
As shown in Reaction Scheme 12, a polymeric precursor compound may be
Bl 1 B2 2 prepared by contacting x equivalents of M (ER )3, y equivalents of M (ER )3, and z equivalents of MA(ER3), where MB1 and MB2 are different atoms of Group 13, x is from 0.5 to 1.5, y is from 0.5 to 1.5, and z is from 0.5 to 1.5. For example, MB1 may be In and MB2 may be Ga.
REACTION SCHEME 12:
x MB1(ER1)3 + y MB2(ER2)3 + z MA(ER3)
Figure imgf000072_0001
polymeric precursor A polymeric precursor compound may have the empirical formula
Figure imgf000073_0001
where R , R and RJ are the same or each different from the other. A polymeric precursor compound of this kind can be used to control the ratio of In to Ga, and make the ratio In:Ga a predetermined value.
Controlling the stoichiometry of monovalent metal atoms MA
In some aspects, a polymeric precursor composition may advantageously be prepared with any desired stoichiometry of monovalent metal atoms MA.
Embodiments of this invention can provide polymeric precursor compounds that may advantageously be prepared with any desired stoichiometry with respect to the number of different monovalent metal elements and their respective ratios.
Polymeric precursor compounds having predetermined stoichiometry may be used in a process for making a photovoltaic absorber layer having the same predetermined stoichiometry on a substrate. Processes for making a photovoltaic absorber layer having predetermined stoichiometry on a substrate include depositing a precursor having the predetermined stoichiometry onto the substrate and converting the deposited precursor into a photovoltaic absorber material.
In some embodiments, a polymeric precursor can be made with a
predetermined stoichiometry of Cu atoms. The amount of Cu relative to atoms of Group 13 can be a deficiency of copper, in which the ratio of Cu/In, Cu/Ga, Cu/(In+Ga), or Cu/(In+Ga+Al) is less than one. The amount of Cu relative to atoms of Group 13 can reflect enrichment of copper, in which the ratio of Cu/In, Cu/Ga, Cu/(In+Ga), or Cu/(In+Ga+Al) is greater than one.
In some embodiments, a polymeric precursor can be made with a
predetermined stoichiometry of Ag atoms. The amount of Ag relative to atoms of Group 13 can be a deficiency of silver, in which the ratio of Ag/In, Ag/Ga,
Ag/(In+Ga), or Ag/(In+Ga+Al) is less than one. The amount of Ag relative to atoms of Group 13 can reflect enrichment of silver, in which the ratio of Ag/In, Ag/Ga, Ag/(In+Ga), or Ag/(In+Ga+Al) is greater than one.
In some embodiments, a polymeric precursor can be made with a
predetermined stoichiometry of Cu and Ag atoms. The amount of Cu and Ag relative to atoms of Group 13 can be a deficiency of copper and silver, in which the ratio of (Cu+Ag)/In, (Cu+Ag)/Ga, (Cu+Ag)/(In+Ga), or (Cu+Ag)/(In+Ga+Al) is less than one.
In some embodiments, the amount of Cu and Ag relative to atoms of Group 13 can reflect enrichment of copper and silver, in which the ratio of (Cu+Ag)/In, (Cu+Ag)/Ga, (Cu+Ag)/(In+Ga), or (Cu+Ag)/(In+Ga+Al) is greater than one.
In further embodiments, a polymeric precursor can be made with a predetermined stoichiometry of Cu to Ag atoms where the precursor has any ratio of Cu to Ag. The ratio of Cu to Ag can be from about zero, where the precursor contains little or zero copper, to a very high ratio, where the precursor contains little or zero silver.
In some aspects, polymeric precursor compounds of this invention having predetermined stoichiometry can be used to make photovoltaic materials having the stoichiometry of CIS, CIGS, AIS, AIGS, CAIS, CAIGS, or CAIGAS.
A precursor compound of this disclosure may be a combination of u*(l-x) equivalents of MA1(ER), u*x equivalents of MA2(ER), v*(l-y) equivalents of
MB1(ER)3, v*y equivalents of MB2(ER)3, wherein MA1 is Cu and MA2 is Ag, MB1 and MB2 are different atoms of Group 13, wherein the compound has the empirical formula (MA1 1_xMA2 x)u(MB1 1_yMB2 y)v((Si_zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CAIGS, CIGS and AIGS materials, including materials deficient in the quantity of a Group 11 atom. In some embodiments, x is from 0.001 to 0.999.
In some embodiments, a precursor compound can be a combination of w*(l-z) equivalents of MA1(ER1), w*z equivalents of MA2(ER2), x equivalents of MB1(ER3)3, y equivalents of MB2(ER4)3, wherein MA1 is Cu and MA2 is Ag, MB1 and MB2 are different atoms of Group 13, wherein the compound has the empirical formula (Cui-zAgz)wInxGay(ER1)w(i_Z)(ER2)(w*Z)(ER3)3x(ER4)3y, w is from 0.5 to 1.5, z is from 0 to 1, x is from 0 to 1, y is from 0 to 1, x plus y is one, and wherein R1, R2, R3, R4 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CAIGS, CIGS and AIGS materials, including materials deficient in the quantity of a Group 11 atom. In some embodiments, z is from 0.001 to 0.999.
A precursor compound of this disclosure may be a combination of x equivalents of MA1(ER), v*(l-y) equivalents of MB1(ER)3, v*y equivalents of MB2(ER)3, wherein MA1 is Cu, MB1and MB2 are different atoms of Group 13, wherein the compound has the empirical formula MA1 x(MB1i_yMB2 y)v((Si-zSez)R)w, wherein x is from 0.5 to 1.5, y is from 0 to 1, z is from 0 to 1, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CIS or CIGS materials, including materials deficient or enriched in the quantity of a Group 11 atom.
In some embodiments, a precursor compound can be a combination of z equivalents of MA1(ER1), x equivalents of MB1(ER2)3, y equivalents of MB2(ER3)3, wherein MA1 is Cu, MB1and MB2 are different atoms of Group 13, wherein the compound has the empirical formula CuzInxGay(ER1)z(ER2)3x(ER3)3y, z is from 0.5 to 1.5, x is from 0 to 1, y is from 0 to 1, x plus y is one, and wherein R1, R2, R3 are the same or each different, and are independently selected, for each occurrence, from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In these embodiments, a precursor compound can have the stoichiometry useful to prepare CIS or CIGS materials, including materials deficient or enriched in the quantity of a Group 11 atom.
As shown in Reaction Scheme 13, a polymeric precursor compound may be prepared by contacting x equivalents of MA1(ER1), y equivalents of MA2(ER2), and z equivalents of MB(ER3)3, where MA1 and MA2 are different monovalent metal atoms, x is from 0.5 to 1.5, y is from 0.5 to 1.5, and z is from 0.5 to 1.5. For example, MA1 may be Cu and MA2 may be Ag. REACTION SCHEME 13: x MA1(ER1) + y MA2(ER2) + z MB(ER3)3 -
MA1 xMA2 yMB z(ER1)x(ER2)y(ER3)3z polymeric precursor
A polymeric precursor compound may have the empirical formula
Figure imgf000076_0001
where R , R and RJ are the same or each different from the other. A polymeric precursor compound of this kind can be used to control the ratio of Cu to Ag, and make the ratio Cu:Ag a predetermined value.
Controlling the stoichiometry of atoms of Group 13 in a thin film material made with a polymeric precursor
Embodiments of this invention can provide polymeric precursor compounds that may advantageously be prepared with any desired stoichiometry with respect to the number of different Group 13 elements and their respective ratios. Polymeric precursor compounds having predetermined stoichiometry may be used in a process for making a photovoltaic absorber layer having the same predetermined
stoichiometry on a substrate. Processes for making a photovoltaic absorber layer having predetermined stoichiometry on a substrate include depositing a precursor having the predetermined stoichiometry onto the substrate and converting the deposited precursor into a photovoltaic absorber material.
In some aspects, polymeric precursor compounds of this invention having predetermined stoichiometry can be used to make photovoltaic materials having the stoichiometry of CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS.
In certain embodiments, the precursor may have predetermined stoichiometry according to the empirical formula (MA1 1_xMA2 x)u(MB1 1_y_tMB2 yMB3 t)v((Si_zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, x is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In further variations, the precursor can have predetermined stoichiometry according to the empirical formula (Cui-xAgx)u(Ini_y_tGayAlt)v((Si-zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, w is from 2 to 6, and R represents R groups, of which there are w in number, independently selected from alkyl, aryl, heteroaryl, alkenyl, amido, silyl, and inorganic and organic ligands. In some embodiments, x is from 0.001 to 0.999. In some embodiments, t is from 0.001 to 0.999.
In some aspects, polymeric precursors having predetermined stoichiometry can be used to make photovoltaic materials including CuGaS2, AgGaS2, AuGaS2, CuInS2, AgInS2, AuInS2, CuGaSe2, AgGaSe2, AuGaSe2, CuInSe2, AgInSe2, AuInSe2, CuGaTe2, AgGaTe2, AuGaTe2, CuInTe2, AgInTe2, AuInTe2, CuInGaSSe,
AglnGaSSe, AuInGaSSe, CuInGaSSe, AglnGaSeTe, AuInGaSeTe, CuInGaSTe, AglnGaSTe, AuInGaSTe.
Dopants
In some embodiments, a polymeric precursor composition may include a dopant. A dopant may be introduced into a polymeric precursor in the synthesis of the precursor, or alternatively, can be added to a composition or ink containing the polymeric precursor. A semiconductor material or thin film of this disclosure made from a polymeric precursor may contain atoms of one or more dopants. Methods for introducing a dopant into a photovoltaic absorber layer include preparing the absorber layer with a polymeric precursor of this invention containing the dopant.
The quantity of a dopant in an embodiment of this disclosure can be from about 1 x 10"7 atom percent to about 5 atom percent relative to the most abundant Group 1 1 atom, or greater. In some embodiments, a dopant can be included at a level of from about 1 * 1016 cnf3 to about 1 * 1021 cnf3. A dopant can be included at a level of from about 1 ppm to about 10,000 ppm.
In some embodiments, a dopant may be an alkali metal atom including Li, Na, K, Rb, and a mixture of any of the foregoing.
Embodiments of this invention may further include a dopant being an alkaline earth metal atom including Be, Mg, Ca, Sr, Ba, and a mixture of any of the foregoing. In some embodiments, a dopant may be a transition metal atom from Group 3 through Group 12.
In some embodiments, a dopant may be a transition metal atom from Group 5 including V, Nb, Ta, and a mixture of any of the foregoing.
In some embodiments, a dopant may be a transition metal atom from Group 6 including Cr, Mo, W, and a mixture of any of the foregoing.
In some embodiments, a dopant may be a transition metal atom from Group 10 including Ni, Pd, Pt, and a mixture of any of the foregoing.
In some embodiments, a dopant may be a transition metal atom from Group 12 including Zn, Cd, Hg, and a mixture of any of the foregoing.
In some embodiments, a dopant may be an atom from Group 14 including C, Si, Ge, Sn, Pb, and a mixture of any of the foregoing.
In some embodiments, a dopant may be an atom from Group 15 including P, As, Sb, Bi, and a mixture of any of the foregoing. For example, a polymeric precursor composition may be prepared using an amount of Sb(ER)3, Bi(ER)3, or mixtures thereof, where E is S or Se and R is alkyl or aryl.
A dopant may be provided in a precursor as a counterion or introduced into a thin film by any of the deposition methods described herein. A dopant may also be introduced into a thin film by methods known in the art including ion implantation.
A dopant of this disclosure may be p-type or n-type.
Any of the foregoing dopants may be used in an ink of this invention.
Capping compounds
In some embodiments, a polymeric precursor composition may be formed as shown in Reaction Schemes 1 through 6, where one or more capping compounds are added to the reactions. A capping compound may control the extent of polymer chain formation. A capping compound may also be used to control the viscosity of an ink containing the polymeric precursor compound or composition, as well as its solubility and ability to from a suspension. Examples of capping compounds include inorganic or organometallic complexes which bind to repeating units A or B, or both, and prevent further chain propagation. Examples of capping compounds include
R2MBER, and RMB(ER)2. Ligands
As used herein, the term ligand refers to any atom or chemical moiety that can donate electron density in bonding or coordination.
A ligand can be monodentate, bidentate or multidentate.
As used herein, the term ligand includes Lewis base ligands.
As used herein, the term inorganic ligand refers to an inorganic chemical group which can bind to another atom or molecule through a non-carbon atom.
Examples of ligands include halogens, water, alcohols, ethers, hydroxyls, amides, carboxylates, chalcogenylates, thiocarboxylates, selenocarboxylates, tellurocarboxylates, carbonates, nitrates, phosphates, sulfates, perchlorates, oxalates, and amines.
As used herein, the term chalcogenylate refers to thiocarboxylate, selenocarboxylate, and tellurocarboxylate, having the formula RCE2 ", where E is S, Se, or Te.
As used herein, the term chalcocarbamate refers to thiocarbamate, selenocarbamate, and tellurocarbamate, having the formula R1R2NCE2 ~, where E is S, Se, or Te, and R1 and R2 are the same or different and are hydrogen, alkyl, aryl, or an organic ligand.
Examples of ligands include F", CI", H20, ROH, R20, OH", RO", NR2 ", RC02 ", RCE2 ", C03 2", N03 ", P04 3", SO4 2", CIO4 ", C204 2", NH3, NR3, R2NH, and RNH2, where R is alkyl, and E is chalcogen.
Examples of ligands include azides, heteroaryls, thiocyanates, arylamines, arylalkylamines, nitrites, and sulfites.
Examples of ligands include Br", N3 ", pyridine, [SCN-]", ArNH2, N02 ", and S03 2" where Ar is aryl.
Examples of ligands include cyanides or nitriles, isocyanides or isonitriles, alkylcyanides, alkylnitriles, alkylisocyanides, alkylisonitriles, arylcyanides, arylnitriles, arylisocyanides, and arylisonitriles.
Examples of ligands include hydrides, carbenes, carbon monoxide, isocyanates, isonitriles, thiolates, alkylthiolates, dialkylthiolates, thioethers, thiocarbamates, phosphines, alkylphosphines, arylphosphines, arylalkylphosphines, arsenines, alkylarsenines, arylarsenines, arylalkylarsenines, stilbines, alkylstilbines, arylstilbines, and arylalkylstilbines. Examples of ligands include Γ, H", R", -CN", -CO, RNC, RSH, R2S, RS", -SCN", R3P, R3AS, RsSb, alkenes, and aryls, where each R is independently alkyl, aryl, or heteroaryl.
Examples of ligands include trioctylphosphine, trimethylvinylsilane and hexafluoroacetylacetonate.
Examples of ligands include nitric oxide, silyls, alkylgermyls, arylgermyls, arylalkylgermyls, alkylstannyls, arylstannyls, arylalkylstannyls, selenocyanates, selenolates, alkylselenolates, dialkylselenolates, selenoethers, selenocarbamates, tellurocyanates, tellurolates, alkyltellurolates, dialkyltellurolates, telluroethers, and tellurocarbamates.
Examples of ligands include chalcogenates, thiothiolates, selenothiolates, thioselenolates, selenoselenolates, alkyl thiothiolates, alkyl selenothiolates, alkyl thioselenolates, alkyl selenoselenolates, aryl thiothiolates, aryl selenothiolates, aryl thioselenolates, aryl selenoselenolates, arylalkyl thiothiolates, arylalkyl
selenothiolates, arylalkyl thioselenolates, and arylalkyl selenoselenolates.
Examples of ligands include selenoethers and telluroethers.
Examples of ligands include NO, O2", NHnR3_n, PHnR3-n, SiR3 ", GeR3 ", SnR3 ", "SR, "SeR, "TeR, "SSR, "SeSR, "SSeR, "SeSeR, and RCN, where n is from 1 to 3, and each R is independently alkyl or aryl.
As used herein, the term transition metals refers to atoms of Groups 3 though
12 of the Periodic Table of the elements recommended by the Commission on the Nomenclature of Inorganic Chemistry and published in IUPAC Nomenclature of Inorganic Chemistry, Recommendations 2005. Photovoltaic absorber layer compositions
A polymeric precursor may be used to prepare a material for use in developing semiconductor products.
The polymeric precursors of this invention may advantageously be used in mixtures to prepare a material with controlled or predetermined stoichiometric ratios of the metal atoms in the material.
In some aspects, processes for solar cells that avoid additional sulfurization or selenization steps may advantageously use polymeric precursor compounds and compositions of this invention. A polymeric precursor may be used to prepare an absorber material for a solar cell product. The absorber material may have the empirical formula
MA x(MBi_yMc y)v(E1i_zE2 z)w, where MA is a Group 1 1 atom selected from Cu, Ag, and Au, MB and Mc are different Group 13 atoms selected from Al, Ga, In, Tl, or a combination thereof, E1 is S or Se, E2 is Se or Te, E1 and E2 are different, x is from 0.5 to 1.5, y is from 0 to 1, and z is from 0 to 1, v is from 0.5 to 1.5, and w is from 1 to 3.
A polymeric precursor may be used to prepare an absorber material for a solar cell product. The absorber material may have the empirical formula
MA x(MBi_yMc y)v(E1i_zE2 z)w, where MA is a Group 1 1 atom selected from Cu, Ag, and Au, MB and Mc are different Group 13 atoms selected from Al, Ga, In, Tl, or a combination thereof, E1 is S or Se, E2 is Se or Te, E1 and E2 are different, x is from 0.5 to 1.5, y is from 0 to 1, and z is from 0 to 1, v is from 0.5 to 1.5, and w is from 1 to 3.
A polymeric precursor may be used to prepare an absorber material for a solar cell product. The absorber material may have the empirical formula
MA x(MBi_yMc y)v(E1i_zE2 z)w, where MA is a Group 1 1 atom selected from Cu, Ag, and Au, MB and Mc are different Group 13 atoms selected from Al, Ga, In, Tl, or a combination thereof, E1 is S or Se, E2 is Se or Te, E1 and E2 are different, x is from 0.5 to 1.5, y is from 0 to 1, and z is from 0 to 1, v is from 0.5 to 1.5, and w is from 1.5 to 2.5.
The absorber material may be either an n-type or a p-type semiconductor, when such compound is known to exist.
In some embodiments, one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula CuxIny(Si-zSez)w, where x is from 0.5 to 1.5, y is from 0.5 to 1.5, z is from 0 to 1, and w is from 1.5 to 2.5.
In some aspects, one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula CuxIny(Si-zSez)w, where x is from 0.7 to 1.2, y is from 0.7 to 1.2, z is from 0 to 1, and w is from 1.5 to 2.5.
In some variations, one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula CuxIny(Si-zSez)w, where x is from 0.7 to 1.1, y is from 0.7 to 1.1, z is from 0 to 1, and w is from 1.5 to 2.5.
In certain embodiments, one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula CuxIny(Si-zSez)w, where x is from 0.8 to 0.95, y is from 0.95 to 1.05, z is from 0 to 1, and w is from 1.8 to 2.2.
In certain embodiments, one or more polymeric precursor compounds may be used to prepare a CIS layer on a substrate, wherein the layer has the empirical formula CuxIny(Si-zSez)w, where x is from 0.8 to 0.95, y is from 0.95 to 1.05, z is from 0 to 1, and w is from 2.0 to 2.2.
In some embodiments, one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cux(Ini_yGay)v(Si-zSez)w, where x is from 0.5 to 1.5, y is from 0 to 1, and z is from 0 to 1, v is from 0.5 to 1.5, and w is from 1.5 to 2.5.
In some aspects, one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cux(Ini_yGay)v(Si-zSez)w, where x is from 0.7 to 1.2, y is from 0 to 1, and z is from 0 to 1, v is from 0.7 to 1.2, and w is from 1.5 to 2.5.
In some variations, one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula
Cux(Ini_yGay)v(Si-zSez)w, where x is from 0.7 to 1.1, y is from 0 to 1, and z is from 0 to 1, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
In certain embodiments, one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cux(Ini_yGay)v(Si_zSez)w, where x is from 0.7 to 1.1, y is from 0 to 1, and z is from 0 to 1, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
In certain embodiments, one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cux(Ini_yGay)v(Si_zSez)w, where x is from 0.8 to 0.95, y is from 0 to 0.5, and z is from 0 to 1, v is from 0.95 to 1.05, and w is from 1.8 to 2.2.
In certain embodiments, one or more polymeric precursor compounds may be used to prepare a CIGS layer on a substrate, wherein the layer has the empirical formula Cux(Ini_yGay)v(Si_zSez)w, where x is from 0.8 to 0.95, y is from 0 to 0.5, and z is from 0 to 1, v is from 0.95 to 1.05, and w is from 2.0 to 2.2. In some embodiments, one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui-xAgx)u(Ini_yGay)v(Si-zSez)w, where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0 to 1, u is from 0.5 to 1.5, v is from 0.5 to 1.5, and w is from 1.5 to 2.5.
In some embodiments, one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui-xAgx)u(Ini_yGay)v(Si-zSez)w, where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1.2, v is from 0.7 to 1.2, and w is from 1.5 to 2.5.
In some embodiments, one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui_xAgx)u(Ini_yGay)v(Si_zSez)w, where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1.1, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
In some embodiments, one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui-xAgx)u(Ini_yGay)v(Si-zSez)w, where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0.5 to 1, u is from 0.7 to 1.1, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
In some embodiments, one or more polymeric precursor compounds may be used to prepare a CAIGS layer on a substrate, wherein the layer has the empirical formula (Cui-xAgx)u(Ini_yGay)v(Si-zSez)w, where x is from 0.001 to 0.999, y is from 0 to 1, z is from 0.5 to 1, u is from 0.8 to 0.95, v is from 0.7 to 1.1, and w is from 1.5 to 2.5.
Embodiments of this invention may further provide polymeric precursors that can be used to prepare a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material for a solar cell product.
In some aspects, one or more polymeric precursors may be used to prepare a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material as a chemically and physically uniform layer.
In some variations, one or more polymeric precursors may be used to prepare a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material wherein the stoichiometry of the metal atoms of the material can be controlled. In certain embodiments, one or more polymeric precursors may be used to prepare a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material as a layer that may be processed at relatively low temperatures to achieve a solar cell.
In some aspects, one or more polymeric precursors may be used to prepare a
CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS material as a photovoltaic layer.
In some variations, one or more polymeric precursors may be used to prepare a chemically and physically uniform semiconductor CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS layer on a variety of substrates, including flexible substrates.
Examples of an absorber material include CuGaS2, AgGaS2, AuGaS2, CuInS2, AgInS2, AuInS2, CuTlS2, AgTlS2, AuTlS2, CuGaSe2, AgGaSe2, AuGaSe2, CuInSe2, AgInSe2, AuInSe2, CuTlSe2, AgTlSe2, AuTlSe2, CuGaTe2, AgGaTe2, AuGaTe2, CuInTe2, AgInTe2, AuInTe2, CuTlTe2, AgTlTe2, and AuTlTe2.
Examples of an absorber material include CuInGaSSe, AglnGaSSe,
AuInGaSSe, CuInTlSSe, AglnTlSSe, AuInTlSSe, CuGaTlSSe, AgGaTlSSe,
AuGaTlSSe, CuInGaSSe, AglnGaSeTe, AuInGaSeTe, CuInTlSeTe, AglnTlSeTe, AuInTlSeTe, CuGaTlSeTe, AgGaTlSeTe, AuGaTlSeTe, CuInGaSTe, AglnGaSTe, AuInGaSTe, CuInTlSTe, AglnTlSTe, AuInTlSTe, CuGaTlSTe, AgGaTlSTe, and AuGaTlSTe.
The CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS layer may be used with various junction partners to produce a solar cell. Examples of junction partner layers are known in the art and include CdS, ZnS, ZnSe, and CdZnS. See, for example, Martin Green, Solar Cells: Operating Principles, Technology and System Applications (1986); Richard H. Bube, Photovoltaic Materials (1998);
Antonio Luque and Steven Hegedus, Handbook of Photovoltaic Science and
Engineering (2003).
In some aspects, the thickness of an absorber layer may be from about 0.01 to about 20 micrometers, or from about 0.01 to about 10 micrometers, or from about
0.05 to about 5 micrometers, or from about 0.1 to about 4 micrometers, or from about 0.1 to about 3.5 micrometers, or from about 0.1 to about 3 micrometers, or from about 0.1 to about 2.5 micrometers. In some embodiments, the thickness of an absorber layer may be from 0.01 to 5 micrometers.
In some embodiments, the thickness of an absorber layer may be from 0.02 to 5 micrometers.
In some embodiments, the thickness of an absorber layer may be from 0.5 to 5 micrometers.
In some embodiments, the thickness of an absorber layer may be from 1 to 3 micrometers.
In some embodiments, the thickness of an absorber layer may be from 100 to 10,000 nanometers.
In some embodiments, the thickness of an absorber layer may be from 10 to 5000 nanometers.
In some embodiments, the thickness of an absorber layer may be from 20 to 5000 nanometers.
In some embodiments, a process for depositing a layer of a precursor on a substrate, article, or on another layer can have a single step for depositing a thickness of from 200 to 500 nanometers.
In some embodiments, a process for depositing a layer of a precursor on a substrate, article, or on another layer can have a single step for depositing a thickness of from 250 to 350 nanometers.
Substrates
The polymeric precursors of this invention can be used to form a layer on a substrate. The substrate can have any shape. Substrate layers of polymeric precursors can be used to create a photovoltaic layer or device.
A substrate may have an electrical contact layer. The electrical contact layer can be on the surface of the substrate. An electrical contact layer on a substrate can be the back contact for a solar cell or photovoltaic device.
Examples of an electrical contact layer include a layer of a metal or a metal foil, as well as a layer of molybdenum, aluminum, copper, gold, platinum, silver, titanium nitride, stainless steel, a metal alloy, and a combination of any of the foregoing.
Examples of substrates on which a polymeric precursor of this disclosure can be deposited or printed include semiconductors, doped semiconductors, silicon, gallium arsenide, insulators, glass, molybdenum glass, silicon dioxide, titanium dioxide, zinc oxide, silicon nitride, and combinations thereof.
A substrate may be coated with molybdenum or a molybdenum-containing compound.
In some embodiments, a substrate may be pre-treated with a molybdenum- containing compound, or one or more compounds containing molybdenum and selenium.
Examples of substrates on which a polymeric precursor of this disclosure can be deposited or printed include metals, metal foils, molybdenum, aluminum, beryllium, cadmium, cerium, chromium, cobalt, copper, gold, manganese, nickel, palladium, platinum, rhenium, rhodium, silver, stainless steel, steel, iron, strontium, tin, titanium, tungsten, zinc, zirconium, metal alloys, metal silicides, metal carbides, and combinations thereof.
Examples of substrates on which a polymeric precursor of this disclosure can be deposited or printed include polymers, plastics, conductive polymers, copolymers, polymer blends, polyethylene terephthalates, polycarbonates, polyesters, polyester films, mylars, polyvinyl fluorides, polyvinylidene fluoride, polyethylenes, polyetherimides, polyethersulfones, polyetherketones, polyimides, polyvinylchlorides, acrylonitrile butadiene styrene polymers, silicones, epoxys, and combinations thereof.
Examples of substrates on which a polymeric precursor of this disclosure can be deposited or printed include roofing materials.
Examples of substrates on which a polymeric precursor of this disclosure can be deposited or printed include papers and coated papers.
A substrate of this disclosure can be of any shape. Examples of substrates on which a polymeric precursor of this disclosure can be deposited include a shaped substrate including a tube, a cylinder, a roller, a rod, a pin, a shaft, a plane, a plate, a blade, a vane, a curved surface or a spheroid.
A substrate may be layered with an adhesion promoter before the deposition, coating or printing of a layer of a polymeric precursor of this invention.
Examples of adhesion promoters include a glass layer, a metal layer, a titanium-containing layer, a tungsten-containing layer, a tantalum-containing layer, tungsten nitride, tantalum nitride, titanium nitride, titanium nitride silicide, tantalum nitride silicide, a chromium-containing layer, a vanadium-containing layer, a nitride layer, an oxide layer, a carbide layer, and combinations thereof. Examples of adhesion promoters include organic adhesion promoters such as organofunctional silane coupling agents, silanes, glycol ether acetates, ethylene glycol bis-thioglycolates, acrylates, acrylics, mercaptans, thiols, selenols, tellurols, carboxylic acids, and mixtures thereof.
Substrates may be layered with a barrier layer before the deposition of printing of a layer of a polymeric precursor of this invention.
Examples of a barrier layer include a glass layer, a metal layer, a titanium- containing layer, a tungsten-containing layer, a tantalum-containing layer, tungsten nitride, tantalum nitride, titanium nitride, titanium nitride silicide, tantalum nitride silicide, and combinations thereof.
A substrate can be of any thickness, and can be from about 10 or 20 micrometers to about 20,000 micrometers or more in thickness.
Processes for films of polymeric precursors on substrates
The polymeric precursors of this invention can be used to make photovoltaic materials by depositing a layer onto a substrate, where the layer contains one or more polymeric precursors. The deposited layer may be a film or a thin film. Substrates are described above.
As used herein, the terms "deposit," "depositing," and "deposition" refer to any method for placing a compound or composition onto a surface or substrate, including spraying, coating, and printing.
As used herein, the term "thin film" refers to a layer of atoms or molecules, or a composition layer on a substrate having a thickness of less than about 300 micrometers.
A deposited layer of this disclosure advantageously allows precise control of the stoichiometric ratios of certain atoms in the layer because the layer can be composed of a mixture of polymeric precursors.
The polymeric precursors of this invention, and compositions containing polymeric precursors, can be deposited onto a substrate using methods known in the art, as well as methods disclosed herein.
Examples of methods for depositing a polymeric precursor onto a surface or substrate include all forms of spraying, coating, and printing.
Solar cell layers can be made by depositing one or more polymeric precursors of this disclosure on a flexible substrate in a high throughput roll process. The depositing of polymeric precursors in a high throughput roll process can be done by spraying or coating a composition containing one or more polymeric precursors, or by printing an ink containing one or more polymeric precursors of this disclosure.
The depositing of compounds by spraying can be done at rates from about 10 nm to 3 micrometers per minute, or from 100 nm to 2 micrometers per minute.
Examples of methods for depositing a polymeric precursor onto a surface or substrate include spraying, spray coating, spray deposition, spray pyrolysis, and combinations thereof.
Examples of methods for printing using an ink of this disclosure include printing, screen printing, inkjet printing, aerosol jet printing, ink printing, jet printing, stamp/pad printing, transfer printing, pad printing, flexographic printing, gravure printing, contact printing, reverse printing, thermal printing, lithography,
electrophotographic printing, and combinations thereof.
Examples of methods for depositing a polymeric precursor onto a surface or substrate include electrodepositing, electroplating, electroless plating, bath deposition, coating, dip coating, wet coating, spin coating, knife coating, roller coating, rod coating, slot die coating, meyerbar coating, lip direct coating, capillary coating, liquid deposition, solution deposition, layer-by-layer deposition, spin casting, and solution casting.
The polymeric precursors of this invention, and ink compositions containing polymeric precursors, can be deposited onto a substrate using methods known in the art, as well as methods disclosed herein.
A deposited layer of this disclosure advantageously allows precise control of the stoichiometric ratios of certain atoms in the layer because the layer can be composed of a polymeric precursor.
Examples of methods for depositing a polymeric precursor onto a surface or substrate include all forms of spraying, coating, and printing.
In some embodiments, a process for knife gap coating can be performed. The gap can be from 50 to 200 μιη, or larger, and the knife speed can be from about 1 to 100 mm/s.
The substrate can be cleared using a stream from a nitrogen gas gun. Ink may be applied to the blade to fill the gap and make contact with the substrate. The ink is then coated in a single pass and the back surface is wiped or washed with toluene or organic solvent. The coated substrate can be transferred to a hot plate for conversion to a material. The conversion time can range from 40 seconds to 5 minutes or greater. The coating and conversion steps are repeated to build up a desired film thickness.
For various methods of depositing precursors, thickness per pass can be from 75 to 150 nm, or from 10 to 500 nm, or from 10 to 400 nm, or from 100 to 300 nm, or from 200 to 500 nm, or from 250 to 350 nm.
For depositing precursors by spraying, spray coating, spray deposition, spray pyro lysis, printing, screen printing, inkjet printing, aerosol jet printing, ink printing, jet printing, stamp printing, transfer printing, pad printing, flexographic printing, gravure printing, contact printing, reverse printing, thermal printing, lithography, electrophotographic printing, electrodepositing, electroplating, electroless plating, bath deposition, coating, wet coating, dip coating spin coating, knife coating, roller coating, rod coating, slot die coating, meyerbar coating, lip direct coating, capillary coating, liquid deposition, solution deposition, layer-by-layer deposition, spin casting, or solution casting, thickness per pass can be from 10 to 3000 nm, or from 10 to 2000 nm, or from 100 to 1000 nm, or from 200 to 500 nm, or from 250 to 350 nm.
For depositing precursors by coating, wet coating, dip coating spin coating, knife coating, roller coating, rod coating, slot die coating, meyerbar coating, lip direct coating, capillary coating, liquid deposition, solution deposition, layer-by-layer deposition, spin casting, or solution casting, thickness per pass can be from 10 to 3000 nm, or from 10 to 2000 nm, or from 100 to 1000 nm, or from 200 to 500 nm, or from 250 to 350 nm.
For depositing precursors by coating, knife coating, rod coating, or slot die coating, thickness per pass can be from 10 to 3000 nm, or from 10 to 2000 nm, or from 100 to 1000 nm, or from 200 to 500 nm, or from 250 to 350 nm.
For depositing precursors by coating or knife coating, thickness per pass can be from 10 to 3000 nm, or from 10 to 2000 nm, or from 100 to 1000 nm, or from 200 to 500 nm, or from 250 to 350 nm.
In certain embodiments, crack- free films are achieved with a process having a step with a thickness per pass of 50 nm, 75 nm, 100 nm, 200 nm, 300 nm, 350 nm, 400 nm, 500 nm, 600 nm or greater.
The coated substrate can be annealed after depositing any number of layers of precursors.
Examples of methods for depositing a polymeric precursor onto a surface or substrate include chemical vapor deposition, aerosol chemical vapor deposition, metal-organic chemical vapor deposition, organometallic chemical vapor deposition, plasma enhanced chemical vapor deposition, and combinations thereof.
In certain embodiments, a first polymeric precursor may be deposited onto a substrate, and subsequently a second polymeric precursor may be deposited onto the substrate. In certain embodiments, several different polymeric precursors may be deposited onto the substrate to create a layer.
In certain variations, different polymeric precursors may be deposited onto a substrate simultaneously, or sequentially, whether by spraying, coating, printing, or by other methods. The different polymeric precursors may be contacted or mixed before the depositing step, during the depositing step, or after the depositing step. The polymeric precursors can be contacted before, during, or after the step of transporting the polymeric precursors to the substrate surface.
The depositing of polymeric precursors, including by spraying, coating, and printing, can be done in a controlled or inert atmosphere, such as in dry nitrogen and other inert gas atmospheres, as well as in a partial vacuum atmosphere.
Processes for depositing, spraying, coating, or printing polymeric precursors can be done at various temperatures including from about -20 °C to about 650 °C, or from about -20 °C to about 600 °C, or from about -20 °C to about 400 °C, or from about 20 °C to about 360 °C, or from about 20 °C to about 300 °C, or from about 20 °C to about 250 °C.
Processes for making a solar cell involving a step of transforming a polymeric precursor compound into a material or semiconductor can be performed at various temperatures including from about 100 °C to about 650 °C, or from about 150 °C to about 650 °C, or from about 250 °C to about 650 °C, or from about 300 °C to about 650 °C, or from about 400 °C to about 650 °C, or from about 300 °C to about 600 °C, or from about 300 °C to about 550 °C, or from about 300 °C to about 500 °C, or from about 300 °C to about 450 °C.
In certain aspects, depositing of polymeric precursors on a substrate can be done while the substrate is heated. In these variations, a thin-film material may be deposited or formed on the substrate.
In some embodiments, a step of converting a precursor to a material and a step of annealing can be done simultaneously. In general, a step of heating a precursor can be done before, during or after any step of depositing the precursor. In some variations, a substrate can be cooled after a step of heating. In certain embodiments, a substrate can be cooled before, during, or after a step of depositing a precursor. A substrate may be cooled to return the substrate to a lower temperature, or to room temperature, or to an operating temperature of a deposition unit. Various coolants or cooling methods can be applied to cool a substrate.
The depositing of polymeric precursors on a substrate may be done with various apparatuses and devices known in art, as well as devices described herein.
In some variations, the depositing of polymeric precursors can be performed using a spray nozzle with adjustable nozzle dimensions to provide a uniform spray composition and distribution.
Embodiments of this disclosure further contemplate articles made by depositing a layer onto a substrate, where the layer contains one or more polymeric precursors. The article may be a substrate having a layer of a film, or a thin film, which is deposited, sprayed, coated, or printed onto the substrate. In certain variations, an article may have a substrate printed with a polymeric precursor ink, where the ink is printed in a pattern on the substrate.
For spin coating, an ink can be made by dissolving a polymeric precursor in a solvent in an inert atmosphere glove box. The ink can be passed through a syringe filter and deposited onto a Mo-coated glass substrate in a quantity sufficient to cover the entire substrate surface. The substrate can be then spun at 1200 rpm for about
60 s. The coated substrate can be allowed to dry at room temperature, typically for 1- 2 minutes. The coated substrate can be heated in a furnace for conversion of the polymeric molecular precursor film to a semiconductor thin film material.
After conversion of the coated substrate, another precursor coating may be applied to the thin film material on the substrate by repeating the procedure above. This process can be repeated to prepare additional thin film material layers on the substrate.
After the last thin film material layer is prepared on the substrate, the substrate can be annealed. The annealing process may include a step of heating the coated substrate at a temperature sufficient to convert the coating on the substrate to a thin film photovoltaic material. The annealing process may include a step of heating the coated substrate at 400 °C for 60 min, or 500 °C for 30 min, or 550 °C for 60 min, or 550 °C for 20 min. The annealing process may include an additional step of heating the coated substrate at 550 °C for 10 min, or 525 °C for 10 min, or 400 °C for 5 min.
Methods and compositions for photovoltaic absorber layers
Molecular precursor and polymeric precursor inks may be used to grow photovoltaic absorber layers, or other material, by using multiple inks with different compositions. In some embodiments, large grains can be achieved by using multiple inks.
The use of multiple inks allows a wide range of compositions to be manufactured in a controlled fashion. For example, many kinds of CIGS
compositions can be made, and many compositions in CIGS phase space can be made.
In some embodiments, a two ink system is used.
In further embodiments, any number of inks can be used.
In certain embodiments, a first ink may contain a molecular precursor or polymeric precursor with a predetermined composition. For example, the first ink can have a predetermined composition that is enriched in Cu.
Examples of a material made with a Cu-enriched ink include
Cu>1.oInxGa1-xSe~2.o-2.4, where x = 0-1, and Cu may be from 1.05-1.30. In some embodiments, the first can have the stoichiometry Cu>1.oInxGa1-xSe~2.o-2.4, where x = 0-1, and Cu may be from 1.05-1.30.
The first ink, when used by itself, could be used to generate a CIS, CGS, or CIGS material that is enriched in Cu.
A second ink or balance ink may contain a sufficient quantity and
stoichiometry of atoms so that when the second ink is combined with the first ink, the combination provides a total composition and stoichiometry that is the desired amount.
For example, the second ink may contain a molecular precursor or polymeric precursor with a predetermined composition. For example, the second ink can have a predetermined composition that is deficient in Cu.
In some embodiments, the second ink may contain a Cu-containing molecule, an In-containing molecule, or a Ga-containing molecule. For example, the second ink can contain Cuo.5Gai.0Se<2, Ga2.oSe~3, In2.oSe~3, Ini.4Gao.6Se~3, Cuo.3lni.0Se<2, or
Figure imgf000092_0001
Examples of a material made with the second ink include Cu<i.oInxGai_xSe~2.o- 2.4, where x = 0-1, and Cu may be from 0 - 0.75. In some embodiments, the second ink may have the stoichiometry Cu<i.oInxGai_xSe~2.o-2.4, where x = 0-1, and Cu may be from 0 - 0.75.
Examples of a material or composition that can be made by the methods of this disclosure include Cui.05lni.oSe~2.o-2.4, Cui.iIn0.9Ga0.iSe~2.o-2.4, Cui.3Ini.0Se~2.o-2.4, Cui.o5lni.oGao.i5Se~2.o-2.4, Cui.iIno.85Gao.i5Se~2.o-2.4, Cui.iIni.oSe~2.o-2.4,
Cui.iIn0.7Gao.3Se~2.o-2.4, and Cui.2In0.8oGao.ioSe~2.o-2.4.
Examples of a material or composition that can be made by the methods of this disclosure include Cu0.85lni.oSe~2.o-2.4, Cu0.95lno.9Ga0.iSe~2.o-2.4, Cu0.87lni.oSe~2.o-2.4,
CUo.97lni.oGao.l5Se~2.0-2.4, CUo.88lno.85Gao.l5Se~2.0-2.4, CUo.92lni.oSe~2.0-2.4,
Cuo.86lno.7Gao.3Se~2.o-2.4, and Cuo.94Ino.80Gao.10Se~2.o-2.4-
Finishing stages for solar cells
A solar cell device can be made from a photovoltaic absorber layer on a substrate by carrying out various finishing steps.
In some embodiments, a finishing step includes a chemical bath treatment step. In a chemical bath treatment step, the photovoltaic absorber layer can be exposed to a buffer compound. Examples of a buffer compound include In2S3.
An additional finishing step is deposition of a buffer layer. A buffer layer of CdS can be made by chemical bath deposition.
Another finishing step is deposition of a TCO layer. The TCO layer can be made from Al:ZnO (AZO). The TCO layering step can include ZnO (intrinsic iZO).
A further finishing step is deposition of metal contacts on the TCO layer.
A solar cell can be finished by annealing in air, or in inert atmosphere.
As used herein, the term "back" of the solar cell or photovoltaic absorber layer refers to the surface of the photovoltaic absorber layer which is closer to the back contact of the solar cell. The term "front" of the solar cell or photovoltaic absorber layer refers to the surface of the photovoltaic absorber layer which is closer to the TCO layer of the solar cell.
Photovoltaic devices
The polymeric precursors of this invention can be used to make photovoltaic materials and solar cells of high efficiency. In some embodiments, the solar cell is a thin layer solar cell having a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS absorber layer deposited or printed on a substrate.
Embodiments of this invention may provide improved efficiency for solar cells used for light to electricity conversion.
In some embodiments, a solar cell of this disclosure is a heterojunction device made with a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS cell. The CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS layer may be used as a junction partner with a layer of, for example, cadmium sulfide, cadmium selenide, cadmium telluride, zinc sulfide, zinc selenide, or zinc telluride. The absorber layer may be adjacent to a layer of MgS, MgSe, MgTe, HgS, HgSe, HgTe, A1N, A1P, AlAs, AlSb, GaN, GaP, GaAs, GaSb, InN, InP, InAs, InSb, or combinations thereof.
In certain variations, a solar cell of this disclosure is a multijunction device made with one or more stacked solar cells.
As shown in Fig. 3, a solar cell device of this disclosure may have a substrate 10, an electrode layer 20, an absorber layer 30, a buffer layer 40, and a transparent conductive layer (TCO) 50. The substrate 10 may be metal, plastic, glass, or ceramic. The electrode layer 20 can be a molybdenum-containing layer. The absorber layer 30 may be a CIS, CIGS, AIS, AIGS, CAIS, CAIGS, CIGAS, AIGAS or CAIGAS layer. The buffer layer 40 may be a cadmium sulfide layer. The transparent conductive layer 50 can be an indium tin oxide layer or a doped zinc oxide layer.
A solar cell device of this disclosure may have a substrate, an electrode layer, an absorber layer, a buffer layer, an adhesion promoting layer, a junction partner layer, a transparent layer, a transparent electrode layer, a transparent conductive oxide layer, a transparent conductive polymer layer, a doped conductive polymer layer, an encapsulating layer, an anti-reflective layer, a protective layer, or a protective polymer layer. In certain variations, an absorber layer includes a plurality of absorber layers.
In certain variations, solar cells may be made by processes using polymeric precursor compounds and compositions of this invention that advantageously avoid additional sulfurization or selenization steps.
In certain variations, a solar cell device may have a molybdenum-containing layer, or an interfacial molybdenum-containing layer. Examples of a protective polymer include silicon rubbers, butyryl plastics, ethylene vinyl acetates, and combinations thereof.
Substrates can be made of a flexible material which can be handled in a roll. The electrode layer may be a thin foil.
In some embodiments, a thin film photovoltaic device may have a transparent conductor layer, a buffer layer, a p-type absorber layer, an electrode layer, and a substrate. The transparent conductor layer may be a transparent conductive oxide (TCO) layer such as a zinc oxide layer, or zinc oxide layer doped with aluminum, or a carbon nanotube layer, or a tin oxide layer, or a tin oxide layer doped with fluorine, or an indium tin oxide layer, or an indium tin oxide layer doped with fluorine, while the buffer layer can be cadmium sulfide, or cadmium sulfide and high resistivity zinc oxide. The p-type absorber layer can be a CIGS layer, and the electrode layer can be molybdenum. The transparent conductor layer can be up to about 0.5 micrometers in thickness. The buffer layer can also be a cadmium sulfide n-type junction partner layer. In some embodiments, the buffer layer may be a silicon dioxide, an aluminum oxide, a titanium dioxide, or a boron oxide.
Some examples of transparent conductive oxides are given in K. Ellmer et al, Transparent Conductive Zinc Oxide, Vol. 104, Springer Series in Materials Science (2008).
In some aspects, a solar cell can include a molybdenum selenide interface layer, which may be formed using various molybdenum-containing and selenium- containing compounds that can be added to an ink for printing, or deposited onto a substrate.
A thin film material photovoltaic absorber layer can be made with one or more polymeric precursors of this invention. For example, a polymeric precursor ink can be sprayed onto a stainless steel substrate using a spray pyrolysis unit in a glovebox in an inert atmosphere. The spray pyrolysis unit may have an ultrasonic nebulizer, precision flow meters for inert gas carrier, and a tubular quartz reactor in a furnace. The spray -coated substrate can be heated at a temperature of from about 25 °C to about 650 °C in an inert atmosphere, thereby producing a thin film material photovoltaic absorber layer.
In further examples, a thin film material photovoltaic absorber layer can be made by providing a polymeric precursor ink which is filtered with a 0.45 micron filter, or a 0.3 micron filter. The ink may be printed onto a polyethylene terephthalate substrate using a inkjet printer in a glovebox in an inert atmosphere. A film of about 0.1 to 5 microns thickness can be deposited on the substrate. The substrate can be removed and heated at a temperature of from about 100 °C to about 600 °C, or from about 100 °C to about 650 °C in an inert atmosphere, thereby producing a thin film material photovoltaic absorber layer.
In some examples, a solar cell can be made by providing an electrode layer on a polyethylene terephthalate substrate. A thin film material photovoltaic absorber layer can be coated onto the electrode layer as described above. A buffer layer can be deposited onto the absorber layer. A transparent conductive oxide layer can be deposited onto the buffer layer, thereby forming an embodiment of a solar cell.
Methods for making a photovoltaic absorber layer on a substrate include providing one or more polymeric precursor compounds, providing a substrate, spraying the compounds onto the substrate, and heating the substrate at a temperature of from about 100 °C to about 600 °C, or of from about 100 °C to about 650 °C in an inert atmosphere, thereby producing a photovoltaic absorber layer having a thickness of from 0.01 to 100 micrometers. The spraying can be done in spray coating, spray deposition, jet deposition, or spray pyrolysis. The substrate may be glass, metal, polymer, plastic, or silicon.
The photovoltaic absorber layer made by the methods of this disclosure may have an empirical formula Cux(Ini_yGay)v(Si-zSez)w, where x is from 0.8 to 0.95, y is from 0 to 0.5, and z is from 0 to 1, v is from 0.95 to 1.05, and w is from 1.8 to 2.2. In some embodiments, w is from 2.0 to 2.2. The photovoltaic absorber layer made by the methods of this disclosure may have an empirical formula empirical formula CuxIny(Si-zSez)w, where x is from 0.8 to 0.95, y is from 0.95 to 1.05, z is from 0 to 1, and w is from 1.8 to 2.2. Methods for making a photovoltaic absorber layer can include a step of sulfurization or selenization.
In certain variations, methods for making a photovoltaic absorber layer may include heating the compounds to a temperature of from about 20 °C to about 400 °C while depositing, spraying, coating, or printing the compounds onto the substrate.
Methods for making a photovoltaic absorber layer on a substrate include providing one or more polymeric precursor compounds, providing a substrate, depositing the compounds onto the substrate, and heating the substrate at a temperature of from about 100 °C to about 650 °C, or from about 100 °C to about 600 °C, or from about 100 °C to about 400 °C, or from about 100 °C to about 300 °C in an inert atmosphere, thereby producing a photovoltaic absorber layer having a thickness of from 0.01 to 100 micrometers. The depositing can be done in electrodepositing, electroplating, electroless plating, bath deposition, liquid deposition, solution deposition, layer-by-layer deposition, spin casting, or solution casting. The substrate may be glass, metal, polymer, plastic, or silicon.
Methods for making a photovoltaic absorber layer on a substrate include providing one or more polymeric precursor inks, providing a substrate, printing the inks onto the substrate, and heating the substrate at a temperature of from about 100 °C to about 600 °C, or from about 100 °C to about 650 °C in an inert atmosphere, thereby producing a photovoltaic absorber layer having a thickness of from 0.01 to
100 micrometers. The printing can be done in screen printing, inkjet printing, transfer printing, flexographic printing, or gravure printing. The substrate may be glass, metal, polymer, plastic, or silicon. The method may further include adding to the ink an additional indium-containing compound, such as In(SeR)3, wherein R is alkyl or aryl.
In general, an ink composition for depositing, spraying, or printing may contain an additional indium-containing compound, or an additional gallium- containing compound. Examples of additional indium-containing compounds include In(SeR)3, wherein R is alkyl or aryl. Examples of additional gallium-containing compounds include Ga(SeR)3, wherein R is alkyl or aryl. For example, an ink may further contain In(SenBu)3 or Ga(SenBu)3, or mixtures thereof. In some embodiments, an ink may contain Na(ER), where E is S or Se and R is alkyl or aryl. In certain embodiments, an ink may contain NaIn(ER)4, NaGa(ER)4, LiIn(ER)4, LiGa(ER)4, KIn(ER)4, or KGa(ER)4, where E is S or Se and R is alkyl or aryl.
Electrical power generation and transmission
This disclosure contemplates methods for producing and delivering electrical power. A photovoltaic device of this invention can be used, for example, to convert solar light to electricity which can be provided to a commercial power grid.
As used herein, the term "solar cell" refers to individual solar cell as well as a solar cell array, which can combine a number of solar cells.
The solar cell devices of this disclosure can be manufactured in modular panels. The power systems of this disclosure can be made in large or small scale, including power for a personal use, as well as on a megawatt scale for a public use.
An important feature of the solar cell devices and power systems of this disclosure is that they can be manufactured and used with low environmental impact.
A power system of this disclosure may utilize a solar cell on a movable mounting, which may be motorized to face the solar cell toward the light.
Alternatively, a solar cell may be mounted on a fixed object in an optimal orientation.
Solar cells can be attached in panels in which various groups of cells are electrically connected in series and in parallel to provide suitable voltage and current characteristics.
Solar cells can be installed on rooftops, as well as outdoor, sunlighted surfaces of all kinds. Solar cells can be combined with various kinds of roofing materials such as roofing tiles or shingles.
A power system can include a solar cell array and a battery storage system. A power system may have a diode-containing circuit and a voltage-regulating circuit to prevent the battery storage system from draining through the solar cells or from being overcharged.
A power system can be used to provide power for lighting, electric vehicles, electric buses, electric airplanes, pumping water, desalinization of water, refrigeration, milling, manufacturing, and other uses.
Sources of elements
Sources of silver include silver metal, Ag(I), silver nitrates, silver halides, silver chlorides, silver acetates, silver alkoxides, and mixtures thereof.
Sources of alkali metal ions include alkali metals, alkali metal salts, alkali metal halides, alkali metal nitrates, selenides including Na2Se, Li2Se, and K2Se, as well as organometallic compounds such as alkyllithium compounds.
Sources of copper include copper metal, Cu(I), Cu(II), copper halides, copper chlorides, copper acetates, copper alkoxides, copper alkyls, copper diketonates, copper 2,2,6,6,-tetramethyl-3,5,-heptanedionate, copper 2,4-pentanedionate, copper hexafluoroacetylacetonate, copper acetylacetonate, copper ketoesters, and mixtures thereof.
Sources of indium include indium metal, trialkylindium, indium halides, indium chlorides, dimethylindium chlorides, trimethylindium, indium acetylacetonates, indium hexafluoropentanedionates, indium methoxyethoxides, indium methyltrimethylacetylacetates, indium trifluoropentanedionates, and mixtures thereof.
Sources of gallium include gallium metal, trialkylgallium, gallium halides, gallium fluorides, gallium chlorides, gallium iodides, diethylgallium chlorides, gallium acetate, gallium 2,4-pentanedionate, gallium ethoxide, gallium 2,2,6,6,- tetramethylheptanedionate, and mixtures thereof.
Sources of aluminum include aluminum metal, trialkylaluminum, aluminum halides, aluminum fluorides, aluminum chlorides, aluminum iodides,
diethylaluminum chlorides, aluminum acetate, aluminum 2,4-pentanedionate, aluminum ethoxide, aluminum 2,2,6,6,-tetramethylheptanedionate, and mixtures thereof.
Some sources of gallium and indium are described in International Patent Publication No. WO20080571 19.
Chemical definitions
As used herein, the term atom percent, atom%, or at% refers to the amount of an atom with respect to the final material in which the atoms are incorporated. For example, "0.5 at% Na in CIGS" refers to an amount of sodium atoms equivalent to 0.5 atom percent of the atoms in the CIGS material.
As used herein, the term (X,Y) when referring to compounds or atoms indicates that either X or Y, or a combination thereof may be found in the formula. For example, (S,Se) indicates that atoms of either sulfur or selenium, or any combination thereof may be found. Further, using this notation the amount of each atom can be specified. For example, when appearing in the chemical formula of a molecule, the notation (0.75 In,0.25 Ga) indicates that the atom specified by the symbols in the parentheses is indium in 75% of the compounds and gallium in the remaining 25% of the compounds, regardless of the identity any other atoms in the compound. In the absence of a specified amount, the term (X,Y) refers to approximately equal amounts of X and Y.
The atoms S, Se, and Te of Group 16 are referred to as chalcogens.
As used herein, the letter "S" in CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS refers to sulfur or selenium or both. The letter "C" in CIGS, CAIGS, CIGAS, and CAIGAS refers to copper. The letter "A" in AIGS, CAIGS, AIGAS and CAIGAS which appears before the letters I and G refers to silver. The letter "I" in CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS refers to indium. The letter "G" in CIGS, AIGS, CAIGS, CIGAS, AIGAS and CAIGAS refers to gallium. The letter "A" in CIGAS, AIGAS and CAIGAS which appears after the letters I and G refers to aluminum.
CAIGAS therefore could also be represented as Cu/Ag/In/Ga/Al/S/Se.
As used herein, the terms CIGS, AIGS, and CAIGS include the variations C(I,G)S, A(I,G)S, and CA(I,G)S, respectively, and CIS, AIS, and CAIS, respectively, as well as CGS, AGS, and CAGS, respectively, unless described otherwise.
The terms CIGAS, AIGAS and CAIGAS include the variations C(I,G,A)S,
A(I,G,A)S, and CA(I,G,A)S, respectively, and CIGS, AIGS, and CAIGS, respectively, as well as CGAS, AGAS, and CAGAS, respectively, unless described otherwise.
The term CAIGAS refers to variations in which either C or Silver is zero, for example, AIGAS and CIGAS, respectively, as well as variations in which Aluminum is zero, for example, CAIGS, AIGS, and CIGS.
As used herein, the term CIGS includes the terms CIGSSe and CIGSe, and these terms refer to compounds or materials containing
copper/indium/gallium/sulfur/selenium, which may contain sulfur or selenium or both. The term AIGS includes the terms AIGSSe and AIGSe, and these terms refer to compounds or materials containing silver/indium/gallium/sulfur/selenium, which may contain sulfur or selenium or both. The term CAIGS includes the terms CAIGSSe and CAIGSe, and these terms refer to compounds or materials containing
copper/silver/indiuriVgallium/sulfur/selenium, which may contain sulfur or selenium or both.
As used herein, the term "chalcogenide" refers to a compound containing one or more chalcogen atoms bonded to one or more metal atoms.
The term "alkyl" as used herein refers to a hydrocarbyl radical of a saturated aliphatic group, which can be a branched or unbranched, substituted or unsubstituted aliphatic group containing from 1 to 22 carbon atoms. This definition applies to the alkyl portion of other groups such as, for example, cycloalkyl, alkoxy, alkanoyl, aralkyl, and other groups defined below. The term "cycloalkyl" as used herein refers to a saturated, substituted or unsubstituted cyclic alkyl ring containing from 3 to 12 carbon atoms. As used herein, the term "C(l-5)alkyl" includes C(l)alkyl, C(2)alkyl, C(3)alkyl, C(4)alkyl, and C(5)alkyl. Likewise, the term "C(3-22)alkyl" includes C(l)alkyl, C(2)alkyl, C(3)alkyl, C(4)alkyl, C(5)alkyl, C(6)alkyl, C(7)alkyl, C(8)alkyl, C(9)alkyl, C(10)alkyl, C(l l)alkyl, C(12)alkyl, C(13)alkyl, C(14)alkyl, C(15)alkyl, C(16)alkyl, C(17)alkyl, C(18)alkyl, C(19)alkyl, C(20)alkyl, C(21)alkyl, and
C(22)alkyl.
As used herein, an alkyl group may be designated by a term such as Me (methyl), Et (ethyl), Pr (any propyl group), nPr (n-Pr, n-propyl), 'Pr (i-Pr, isopropyl), Bu (any butyl group), "Bu (n-Bu, n-butyl), ¾u (i-Bu, iso-butyl), sBu (s-Bu, sec -butyl), and lBu (t-Bu, tert-butyl).
The term "alkenyl" as used herein refers to an unsaturated, branched or unbranched, substituted or unsubstituted alkyl or cycloalkyl having 2 to 22 carbon atoms and at least one carbon-carbon double bond. The term "alkynyl" as used herein refers to an unsaturated, branched or unbranched, substituted or unsubstituted alkyl or cycloalkyl having 2 to 22 carbon atoms and at least one carbon-carbon triple bond.
The term "alkoxy" as used herein refers to an alkyl, cycloalkyl, alkenyl, or alkynyl group covalently bonded to an oxygen atom. The term "alkanoyl" as used herein refers to -C(=0)-alkyl, which may alternatively be referred to as "acyl." The term "alkanoyloxy" as used herein refers to -0-C(=0)-alkyl groups. The term
"alkylamino" as used herein refers to the group -NRR', where R and R' are each either hydrogen or alkyl, and at least one of R and R is alkyl. Alkylamino includes groups such as piperidino wherein R and R form a ring. The term "alkylaminoalkyl" refers to -alkyl-NRR.
The term "aryl" as used herein refers to any stable monocyclic, bicyclic, or polycyclic carbon ring system of from 4 to 12 atoms in each ring, wherein at least one ring is aromatic. Some examples of an aryl include phenyl, naphthyl, tetrahydro- naphthyl, indanyl, and biphenyl. Where an aryl substituent is bicyclic and one ring is non-aromatic, it is understood that attachment is to the aromatic ring. An aryl may be substituted or unsubstituted.
The term "heteroaryl" as used herein refers to any stable monocyclic, bicyclic, or polycyclic carbon ring system of from 4 to 12 atoms in each ring, wherein at least one ring is aromatic and contains from 1 to 4 heteroatoms selected from oxygen, nitrogen and sulfur. Phosphorous and selenium may be a heteroatom. Some examples of a heteroaryl include acridinyl, quinoxalinyl, pyrazolyl, indolyl, benzotriazolyl, furanyl, thienyl, benzothienyl, benzofuranyl, quinolinyl, isoquinolinyl, oxazolyl, isoxazolyl, pyrazinyl, pyridazinyl, pyridinyl, pyrimidinyl, pyrrolyl, and tetrahydroquinolinyl. A heteroaryl includes the N-oxide derivative of a nitrogen- containing heteroaryl.
The term "heterocycle" or "heterocyclyl" as used herein refers to an aromatic or nonaromatic ring system of from five to twenty -two atoms, wherein from 1 to 4 of the ring atoms are heteroatoms selected from oxygen, nitrogen, and sulfur.
Phosphorous and selenium may be a heteroatom. Thus, a heterocycle may be a heteroaryl or a dihydro or tetrathydro version thereof.
The term "aroyl" as used herein refers to an aryl radical derived from an aromatic carboxylic acid, such as a substituted benzoic acid. The term "aralkyl" as used herein refers to an aryl group bonded to an alkyl group, for example, a benzyl group.
The term "carboxyl" as used herein represents a group of the formula - C(=0)OH or -C(=0)0~. The terms "carbonyl" and "acyl" as used herein refer to a group in which an oxygen atom is double-bonded to a carbon atom >C=0. The term "hydroxyl" as used herein refers to -OH or -O". The term "nitrile" or "cyano" as used herein refers to -CN. The term "halogen" or "halo" refers to fluoro (-F), chloro (-C1), bromo (-Br), and iodo (-1).
The term "substituted" as used herein refers to an atom having one or more substitutions or substituents which can be the same or different and may include a hydrogen substituent. Thus, the terms alkyl, cycloalkyl, alkenyl, alkynyl, alkoxy, alkanoyl, alkanoyloxy, alkylamino, alkylaminoalkyl, aryl, heteroaryl, heterocycle, aroyl, and aralkyl as used herein refer to groups which include substituted variations. Substituted variations include linear, branched, and cyclic variations, and groups having a substituent or substituents replacing one or more hydrogens attached to any carbon atom of the group. Substituents that may be attached to a carbon atom of the group include alkyl, cycloalkyl, alkenyl, alkynyl, alkoxy, alkanoyl, alkanoyloxy, alkylamino, alkylaminoalkyl, aryl, heteroaryl, heterocycle, aroyl, aralkyl, acyl, hydroxyl, cyano, halo, haloalkyl, amino, aminoacyl, alkylaminoacyl, acyloxy, aryloxy, aryloxyalkyl, mercapto, nitro, carbamyl, carbamoyl, and heterocycle. For example, the term ethyl includes without limitation -CH2CH3, -CHFCH3, -CF2CH3, -CHFCH2F, -CHFCHF2, -CHFCF3, -CF2CH2F, -CF2CHF2, -CF2CF3, and other variations as described above. In general, a substituent may itself be further substituted with any atom or group of atoms. It will be understood that "substitution" or "substituted with" refers to such substitution that is in accordance with permitted valence of the substituted atom and the substituent. As used herein, the term "substituted" includes all permissible substituents.
In general, a compound may contain one or more chiral centers. Compounds containing one or more chiral centers may include those described as an "isomer," a "stereoisomer," a "diastereomer," an "enantiomer," an "optical isomer," or as a "racemic mixture." Conventions for stereochemical nomenclature, for example the stereoisomer naming rules of Cahn, Ingold and Prelog, as well as methods for the determination of stereochemistry and the separation of stereoisomers are known in the art. See, for example, Michael B. Smith and Jerry March, March 's Advanced Organic Chemistry, 5th edition, 2001. The compounds and structures of this disclosure are meant to encompass all possible isomers, stereoisomers, diastereomers, enantiomers, and/or optical isomers that would be understood to exist for the specified compound or structure, including any mixture, racemic or otherwise, thereof.
This invention encompasses any and all tautomeric, solvated or unsolvated, hydrated or unhydrated forms, as well as any atom isotope forms of the compounds and compositions disclosed herein.
This invention encompasses any and all crystalline polymorphs or different crystalline forms of the compounds and compositions disclosed herein.
Additional Embodiments
The priority patent documents US12/848,808, filed Aug-02-2010,
US61/326,540, filed Apr-21-2010, US61/231, 158, filed Aug-04-2009, and all publications, references, patents, patent publications and patent applications cited herein are each hereby specifically incorporated by reference in their entirety for all purposes.
While this invention has been described in relation to certain embodiments, aspects, or variations, and many details have been set forth for purposes of illustration, it will be apparent to those skilled in the art that this invention includes additional embodiments, aspects, or variations, and that some of the details described herein may be varied considerably without departing from this invention. This invention includes such additional embodiments, aspects, and variations, and any modifications and equivalents thereof. In particular, this invention includes any combination of the features, terms, or elements of the various illustrative components and examples.
The use herein of the terms "a," "an," "the" and similar terms in describing the invention, and in the claims, are to be construed to include both the singular and the plural.
The terms "comprising," "having," "include," "including" and "containing" are to be construed as open-ended terms which mean, for example, "including, but not limited to." Thus, terms such as "comprising," "having," "include," "including" and "containing" are to be construed as being inclusive, not exclusive.
Recitation of a range of values herein refers individually to each and any separate value falling within the range as if it were individually recited herein, whether or not some of the values within the range are expressly recited. For example, the range "4 to 12" includes without limitation any whole, integer, fractional, or rational value greater than or equal to 4 and less than or equal to 12, as would be understood by those skilled in the art. Specific values employed herein will be understood as exemplary and not to limit the scope of the invention.
Recitation of a range of a number of atoms herein refers individually to each and any separate value falling within the range as if it were individually recited herein, whether or not some of the values within the range are expressly recited. For example, the term "CI -8" includes without limitation the species CI, C2, C3, C4, C5, C6, C7, and C8.
Definitions of technical terms provided herein should be construed to include without recitation those meanings associated with these terms known to those skilled in the art, and are not intended to limit the scope of the invention. Definitions of technical terms provided herein shall be construed to dominate over alternative definitions in the art or definitions which become incorporated herein by reference to the extent that the alternative definitions conflict with the definition provided herein.
The examples given herein, and the exemplary language used herein are solely for the purpose of illustration, and are not intended to limit the scope of the invention. All examples and lists of examples are understood to be non-limiting.
When a list of examples is given, such as a list of compounds, molecules or compositions suitable for this invention, it will be apparent to those skilled in the art that mixtures of the listed compounds, molecules or compositions may also be suitable. EXAMPLES
EXAMPLE 1
A photovoltaic absorber layer was made by the following process. An ink containing the Cu-deficient CIGS polymeric precursor compound having the empirical formula {Cuo.ssIno.sGao.sCSe^u^.oCSe'Buto.ss} and 0.8 at% Na [from
NaIn(SenBu)4] in heptane, 50% polymeric precursor content, by weight, was prepared under inert atmosphere. The resulting ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot (0.04 mL) of the ink was deposited in a single layer onto a Mo- coated sodalime glass substrate using a knife coater (3 mm/s) in an inert atmosphere glove box. The wet substrate was heated on a pre-heated 320 °C hot plate for 3 minutes followed by heating at 530 °C in a furnace for 2 minutes. The average thickness of the resulting crack- free CIGS material film was 1 10 nm, as measured via profilometry. EXAMPLE 2
A photovoltaic absorber layer was made by the following process. An ink containing the Cu-deficient CIGS polymeric precursor compound having the empirical formula {Cuo^Ino^Gao^Se^u oCSeT^u ss} and 0.8 at% Na [from NaIn(SenBu)4] in heptane, 50% polymeric precursor content, by weight, was prepared under inert atmosphere. To this ink was added 5 vol% triethylsilane (EtsSiH). The resulting ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot (0.04 mL) of the ink was deposited in a single layer onto a Mo- coated sodalime glass substrate using a knife coater (7 mm/s) in an inert atmosphere glove box. The wet substrate was heated on a pre-heated 320 °C hot plate for 3 minutes followed by heating at 530 °C in a furnace for 2 minutes. The average thickness of the resulting crack- free CIGS material film was 140 nm, as measured via profilometry.
EXAMPLE 3
A photovoltaic absorber layer was made by the following process. An ink containing a Cu-deficient CIGS polymeric precursor compound having the empirical formula {Cuo.8lno.5Ga0.5(SenBu)i.42(SesBu)2.38} in octane, 50% polymeric precursor content, by weight, was prepared under inert atmosphere. The resulting ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot (0.04 mL) of the ink was deposited in a single layer onto a Mo- coated sodalime glass substrate using a knife coater (3 mm/s) in an inert atmosphere glove box. The wet substrate was heated on a pre-heated 150 °C hot plate for 1 minute followed by heating at 320 °C on a pre-heated hot plate for 3 minutes. The average thickness of the resulting crack- free CIGS material film was 170 nm, as measured via profilometry.
EXAMPLE 4
A photovoltaic absorber layer is made by the following process. An ink containing the Cu-deficient CIGS polymeric precursor compound having the empirical formula {Cuo.85lno.sGao.5(SenBu)i.45(SesBu)2.4} and 0.8 at% Na [from NaIn(SenBu)4] in octane, 50% polymeric precursor content, by weight, was prepared under inert atmosphere. To this ink was added 5 vol% triethylsilane (EtsSiH). The resulting ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot (0.04 mL) of the ink was deposited in a single layer onto a Mo- coated sodalime glass substrate using a knife coater (7 mm/s) in an inert atmosphere glove box. The wet substrate was heated on a pre-heated 320 °C hot plate for 3 minutes followed by heating at 530 °C in a furnace for 2 minutes. The average thickness of the resulting crack- free CIGS material film was 200 nm, as measured via profilometry.
EXAMPLE 5
A photovoltaic absorber layer was made by the following process. An ink containing the Cu-deficient CIGS polymeric precursor compound having the empirical formula {Cuo.85lno.5Ga0.5(SenBu)i.45(SesBu)2.4} and 0.8 at% Na [from
NaIn(SenBu)4] in octane, 50% polymeric precursor content, by weight, was prepared under inert atmosphere. To this ink was added 5 vol% triethylsilane (EtsSiH). The resulting ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot (0.04 mL) of the ink was deposited in a single layer onto a 100 nm layer of Cu1.1Ino.5Gao.5Se2.! on a Mo-coated sodalime glass substrate using a knife coater in an inert atmosphere glove box. The wet substrate was heated on a preheated 150 °C hot plate for 1 minute followed by heating at 320 °C on a pre-heated hot plate for 5 minutes. Five additional aliquots of the ink were deposited and heated in a like manner. The substrate was then heated in a pre-heated furnace at 530 °C for 10 minutes followed by heating at 530 °C for an additional 8 minutes while being exposed to Se vapor. The resulting annealed CIGS photovoltaic absorber film was crack- free and had a thickness of 1.3 μιη.
EXAMPLE 6
A solar cell was made by the following process.
A first ink was prepared by dissolving {Cu1.1Ino.sGao.5(SetBu)1.1(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-enriched ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
A second ink was prepared by dissolving
{Cuo.85lno.5Ga0.5(Se u)o.85(SenBu)3.o} with 0.5 at% Na added supplied via
NaIn(SenBu)4, in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box.
The resulting Cu-deficient ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot of the first ink (0.04 mL) was deposited onto a piece of 2" by 2" Mo-coated sodalime glass substrate using a knife coater (RK Instruments) in an inert atmosphere (nitrogen) glove box with a knife speed of 10 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 5 minutes to dry and convert the molecules to a Cu-enriched CIGS material. A second aliquot of ink was deposited and converted in a similar manner. The resulting Cu-enriched CIGS film was annealed at 550 °C for 15 minutes in a pre-heated furnace.
An aliquot of the second ink (0.04 mL) was deposited onto the above piece of 2" by 2" Cu-rich coated Mo/glass substrate using the knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 20 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 3 minutes to dry and convert the molecules to a Cu-deficient CIGS material. This deposition process (coat/convert) was repeated to give a total of 16 layers of the second ink and a CIGS material with overall Cu-deficient stoichiometry. The final
deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 8 minutes (pre-heated furnace) in the presence of Se vapor.
The resulting CIGS film had a thickness of 1.8 μιη.
The solar cell was finished by the following general procedure: treating the substrate with a chemical bath deposition (CBD) of In2Se3. 100 mL of an aqueous stock solution of 0.025 M Ιη(¾ and 100 mL of an aqueous stock solution of 0.5 M thioacetamide were diluted in 300 mL DI water and quickly transferred to a preheated 65°C 500 mL CBD vessel. The substrate was quickly transferred to the CBD vessel and soaked for 15 min at 65°C. The substrate was then washed with water 3 times. A buffer layer of CdS was made shortly thereafter by chemical bath deposition. The substrate was placed in a 500 mL CBD vessel and pre-heated to 65°C. 366 mL DI water and 62.5 mL ammonium hydroxide were added to the vessel. 50 mL of a stock solution of 0.015 M CdS04 and 25 mL of a stock solution of 1.5 M thiourea were added with stirring. The substrate was soaked for 16 min at 65°C. The substrate was then rinsed with DI water and 2-propanol, and blown dry with nitrogen. A TCO layer of Al:ZnO (AZO) was next deposited by sputtering in vacuum. Metal contacts were deposited on the TCO layer by sputtering.
Fig. 14 shows a plan view micrograph of the CIGS thin film of the solar cell. Fig. 14 illustrates superior grain size, morphology and overall density and dispersion.
The solar cell current-voltage curve is shown in Fig. 15. The conversion efficiency of the solar cell was 15.5%, and the I-V performance parameters are shown in Table 2. Measurements were made under simulated AM1.5G sunlight at
1000W/m2 and 25°C. The cell area was 0.332 cm2.
It is significant that this measurement of the solar cell conversion efficiency was made in the absence of an antireflective coating. The conversion efficiency is expected to be significantly higher with use of an antireflective coating.
Table 2: Performance of CIGS thin film solar cell
Figure imgf000108_0001
Figure imgf000109_0001
EXAMPLE 7
A solar cell was made by the following process.
A first ink was prepared by dissolving {Cui.iIno.7Gao.3(SetBu)i.i(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-enriched ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
A second ink was prepared by dissolving {Cuo.85lno.5Ga0.5(SeT u)o.85(SenBu)3.o with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-deficient ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot of the first ink 0.04 mL was deposited onto a piece of 2" by 2" Mo- coated sodalime glass substrate using a knife coater (RK Instruments) in an inert atmosphere (nitrogen) glove box with a knife speed of 10 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 5 minutes to dry and to convert the molecules to a Cu-enriched CIGS material. A second aliquot of ink was deposited and converted in a similar manner. The resulting Cu-rich CIGS film was annealed at 550 °C for 15 minutes in a pre-heated furnace.
An aliquot of the second ink 0.04 mL was deposited onto the above piece of 2" by 2" Cu-rich coated Mo/glass substrate using the knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 20 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 3 minutes to dry and convert the polymer to a Cu-deficient CIGS material. This deposition process (coat/convert) was repeated to give a total of 14 layers of the second ink and a CIGS material with overall Cu-deficient stoichiometry. The final
deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 15 minutes (pre-heated furnace) in the presence of Se vapor.
The resulting CIGS film had a thickness of 1.5 μιη.
The solar cell was finished by the following general procedure: treating the substrate with a chemical bath deposition (CBD) of In2Se3. 100 mL of an aqueous stock solution of 0.025 M Ιη(¾ and 100 mL of an aqueous stock solution of 0.5 M thioacetamide were diluted in 300 mL DI water and quickly transferred to a preheated 65°C 500 mL CBD vessel. The substrate was quickly transferred to the CBD vessel and soaked for 15 min at 65°C. The substrate was then washed with water 3 times. A buffer layer of CdS was made shortly thereafter by chemical bath deposition. The substrate was placed in a 500 mL CBD vessel and pre-heated to 65°C. 366 mL DI water and 62.5 mL ammonium hydroxide were added to the vessel. 50 mL of a stock solution of 0.015 M CdS04 and 25 mL of a stock solution of 1.5 M thiourea were added with stirring. The substrate was soaked for 16 min at 65°C. The substrate was then rinsed with DI water and 2-propanol, and blown dry with nitrogen. A ZnO (iZO) layer was deposited. A TCO layer of Al:ZnO (AZO) was next deposited by sputtering in vacuum. Metal contacts were deposited on the TCO layer by sputtering.
Fig. 16 shows a plan view micrograph of the CIGS thin film of the solar cell. Fig. 16 illustrates superior grain size, morphology and overall density and dispersion.
The solar cell current-voltage curve is shown in Fig. 17. The conversion efficiency of the solar cell was 15.2%, and the I-V performance parameters are shown in Table 3. Measurements were made under simulated AM1.5G sunlight at
1000W/m2 and 25°C. The cell area was 0.332 cm2.
It is significant that this measurement of the solar cell conversion efficiency was made in the absence of an antireflective coating. The conversion efficiency is expected to be significantly higher with use of an antireflective coating.
Table 3: Performance of CIGS thin film solar cell
Figure imgf000110_0001
Figure imgf000111_0001
EXAMPLE 8
A solar cell was made by the following process.
A first ink was prepared by dissolving {Cui.iIno.5Gao.5(SeT u)i.i(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-enriched ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
A second ink was prepared by dissolving
{Cuo.85lno.5Ga0.5(Se u)o.85(SenBu)3.o} with 0.5 at% Na added supplied via
NaIn(SenBu)4, in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-deficient ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot of the first ink (0.04 mL) was deposited onto a piece of 2" by 2"
Mo-coated sodalime glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 10 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 5 minutes to dry and to convert the polymer to a Cu-enriched CIGS material. A second aliquot of ink was deposited and converted in a similar manner. The resulting Cu-enriched CIGS film was annealed at 550 °C for 15 minutes in a pre-heated furnace.
An aliquot of the second ink (0.04 mL) was deposited onto the above piece of 2" by 2" Cu-rich coated Mo/glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 20 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 3 minutes to dry and convert the polymer to a Cu-deficient CIGS material. This deposition process (coat/convert) was repeated to give a total of 14 layers of the second ink and a CIGS material with overall Cu-deficient stoichiometry. The final deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 8 minutes (pre-heated furnace) in the presence of Se vapor.
The resulting CIGS film had a thickness of 1.5 μιη.
The solar cell was finished by the general procedure given in Example 8.
Fig. 18 shows a plan view micrograph of the CIGS thin film of the solar cell. Fig. 18 illustrates superior grain size, morphology and overall density and dispersion.
The solar cell current-voltage curve is shown in Fig. 19. The conversion efficiency of the solar cell was 15.1%, and the I-V performance parameters are shown in Table 4. Measurements were made under simulated AMI .5G sunlight at
1000W/m2 and 25°C. The cell area was 0.332 cm2.
It is significant that this measurement of the solar cell conversion efficiency was made in the absence of an antireflective coating. The conversion efficiency is expected to be significantly higher with use of an antireflective coating.
Table 4: Performance of CIGS thin film solar cell
Figure imgf000112_0001
EXAMPLE 9
A solar cell was made by the following process.
A first ink was prepared by dissolving {Cui^Ino Ga0j(SeT u)u(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-rich ink was filtered through a 0.2 μιη PTFE syringe filter prior to use. A second ink was prepared by separately dissolving
{Cuo.85lno.45Ga0.55(SetBu)o.85(SenBu)3.o} with 0.5 at% Na added supplied via
NaIn(SenBu)4, and {Cu0.85lno.55Gao.45(SeT3u)o.85(SenBu)3.o} with 0.5% at% Na added in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, and mixing the two solutions in equal proportions to give a resulting ink with a 50:50 In/Ga ratio in an inert atmosphere glove box. The resulting Cu-deficient ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot of the first ink (0.04 mL) was deposited onto a piece of 2" by 2" Mo-coated sodalime glass substrate using a knife coater (RK Instruments) in an inert atmosphere (nitrogen) glove box with a knife speed of 10 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 5 minutes to dry and convert the polymer to a Cu-enriched CIGS material. A second aliquot of ink was deposited and converted in a similar manner. The resulting Cu-enriched CIGS film was annealed at 550 °C for 15 minutes in a pre-heated furnace.
An aliquot of the second ink (0.04 mL) was deposited onto the above piece of 2" by 2" Cu-rich coated Mo/glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 20 mm s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 3 minutes to dry and convert the polymer to a Cu-deficient CIGS material. This deposition process
(coat/convert) was repeated to give a total of 16 layers of the second ink and a CIGS material with overall Cu-deficient stoichiometry. The final deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 11 minutes (pre-heated furnace) in the presence of Se vapor.
The resulting CIGS film had a thickness of 1.8 μιη.
The solar cell was finished by the general procedure given in Example 8. The conversion efficiency of the solar cell was 14.5%. Measurements were made under simulated AM1.5G sunlight at 1000W/m2 and 25°C. The cell area was 0.332 cm2.
It is significant that this measurement of the solar cell conversion efficiency was made in the absence of an antireflective coating. The conversion efficiency is expected to be significantly higher with use of an antireflective coating.
I l l EXAMPLE 10
A solar cell was made by the following process.
A first ink was prepared by dissolving {Cui.iIno.7Gao.3(SeT u)i.i(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-enriched ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
A second ink was prepared by dissolving
{Cuo.85lno Ga03(Se u)o.85(SenBu)3.o} with 0.8 at% Na added supplied via
NaIn(SenBu)4, in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-deficient ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot of the first ink (0.04 mL) was deposited onto a piece of 2" by 2" Mo-coated sodalime glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 10 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 5 minutes to dry and convert the polymer to a Cu-enriched CIGS material. A second aliquot of ink was deposited and converted in a similar manner. The resulting Cu-enriched CIGS film was annealed at 550 °C for 15 minutes in a pre-heated furnace.
An aliquot of the second ink (0.04 mL) was deposited onto the above piece of 2" by 2" Cu-rich coated Mo/glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 20 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 3 minutes to dry and convert the polymer to a Cu-deficient CIGS material. This deposition process
(coat/convert) was repeated to give a total of 14 layers of the second ink and a CIGS material with overall Cu-deficient stoichiometry. The final deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 8 minutes (pre-heated furnace) in the presence of Se vapor.
The resulting CIGS film had a thickness of 1.5 μιη.
The solar cell was finished by the general procedure given in Example 8. The conversion efficiency of the solar cell was 13.8%. Measurements were made under simulated AM1.5G sunlight at 1000W/m2 and 25°C. The cell area was 0.332 cm2. It is significant that this measurement of the solar cell conversion efficiency was made in the absence of an antireflective coating. The conversion efficiency is expected to be significantly higher with use of an antireflective coating.
EXAMPLE 11
A solar cell was made by the following process.
A first ink was prepared by dissolving {Cu1.1Ino.7Gao.3(SetBu)1.1(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at -50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight, in an inert atmosphere glove box. The resulting Cu-enriched ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
A second ink was prepared by dissolving
{Cuo.85lno.3oGao.7o(SetBu)o.85(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight. The resulting Cu-deficient ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
A third ink was prepared by dissolving
{Cuo.85lno.7oGa0.3o(SetBu)o.85(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight. The resulting Cu-deficient ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
A fourth ink was prepared by dissolving
{Cuo.85lno.5oGa0.5o(SetBu)o.85(SenBu)3.o} with 0.5 at% Na added supplied via NaIn(SenBu)4, in heptane at 50% polymer content, by weight, followed by dilution with heptane to -25% polymer content, by weight. The resulting Cu-poor ink was filtered through a 0.2 μιη PTFE syringe filter prior to use.
An aliquot of the first ink (0.04 mL) was deposited onto a piece of 2" by 2" Mo-coated sodalime glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 10 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 5 minutes to dry and convert the polymer to a Cu-rich CIGS material. A second aliquot of ink was deposited and converted in a similar manner. The resulting Cu-enriched CIGS film was annealed at 550 °C for 15 minutes in a pre-heated furnace. An aliquot of the second ink (0.04 mL) was deposited onto the above piece of 2" by 2" Cu-rich coated Mo/glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 20 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 3 minutes to dry and convert the polymer to a Cu-poor CIGS material. This deposition process
(coat/convert) was repeated to give a total of 2 layers of the second ink.
An aliquot of the third ink (0.04 mL) was deposited onto the above piece of 2" by 2" Cu-rich coated Mo/glass substrate using a knife coater in an inert atmosphere (nitrogen) glove box with a knife speed of 20 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 3 minutes to dry and convert the polymer to a Cu-deficient CIGS material. This deposition process (coat/convert) was repeated to give a total of 8 layers of the third ink.
An aliquot of the fourth ink (0.04 mL) was deposited onto the above piece of 2" by 2" Cu-rich coated Mo/glass substrate using a knife coater (RK Instruments) in an inert atmosphere (nitrogen) glove box with a knife speed of 20 mm/s. The wet polymer film on the substrate was transferred to a pre-heated (300 °C) hot plate for 3 minutes to dry and convert the polymer to a Cu-deficient CIGS material. This deposition process (coat/convert) was repeated to give a total of 4 layers of the second ink.
The final deposition/conversion was followed by treatment in a pre-heated furnace at 530 °C for 10 minutes and annealing at 530 °C for 5 minutes (pre-heated furnace) in the presence of Se vapor.
The resulting CIGS film had a thickness of 1.5 μιη.
The solar cell was finished by the general procedure given in Example 8. The conversion efficiency of the solar cell was 13.6%. Measurements were made under simulated AM1.5G sunlight at 1000W/m2 and 25°C. The cell area was 0.332 cm2.
It is significant that this measurement of the solar cell conversion efficiency was made in the absence of an antireflective coating. The conversion efficiency is expected to be significantly higher with use of an antireflective coating.
EXAMPLE 12
A range of polymeric molecular precursors shown in Table 5 were synthesized in an inert atmosphere according to the following general procedure. A Schlenk tube was charged in an inert atmosphere glovebox with M (ER)3 and Cu(ER). A solvent, typically toluene or benzene, was then added. The Schlenk tube was transferred to a Schlenk line and the reaction mixture was stirred at 25 °C for 1 h. In some cases, the reaction mixture was stirred at about 80 °C for up to 12 h. The solvent was removed under reduced pressure and the product was extracted with pentane. The pentane extract was filtered and the solvent was removed under reduced pressure to afford a yellow to yellow-orange product. The products ranged from being an oil, to being a semi-solid, to being a solid. Yields of 90% or greater were typical.
Table 5: Examples of polymeric molecular precursors
Figure imgf000117_0001
Figure imgf000118_0001

Claims

WHAT IS CLAIMED IS:
1. A process for making a photovoltaic absorber layer on a substrate, comprising:
(a) providing a substrate coated with an electrical contact layer;
(b) depositing a layer of an ink onto the contact layer of the substrate, wherein the ink contains one or more polymeric precursor compounds; and
(c) heating the substrate;
wherein the polymeric precursor compounds have the empirical formula (Cui_xAgx)u(MB1 1_y_tMB2 yMB3 t)((Si_zSez)R)w, wherein MB1 is In, MB2 is Ga, and MB3 is Al, x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.6 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from alkyl groups.
2. The process of claim 1, wherein the thickness of the layer made by one pass through steps (b) and (c), in which one deposition of ink is done, is from 100 to 500 nanometers, or from 150 to 400 nanometers, or from 150 to 300 nanometers.
3. The process of claim 1 , wherein the polymeric precursor compounds are CIGS polymeric precursor compounds having the empirical formula
Cuu(Ini-yGay)((Si-zSez)R)w, wherein x is 0, y is between 0 and 1 so that both In and Ga are present, and t is 0.
4. The process of claim 1, wherein the R groups are independently selected from n-butyl, sec -butyl, iso-butyl, and t-butyl.
5. The process of claim 1, wherein the R groups are a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl groups, or a mixture of n- butyl and sec-butyl groups, or a mixture of n-butyl and t-butyl groups, or a mixture of n-butyl and sec -butyl and iso-butyl groups, or a mixture of n-butyl and sec -butyl and t-butyl groups, or a mixture of n-butyl and iso-butyl and t-butyl groups, or a mixture of sec -butyl and iso-butyl and t-butyl groups.
6. The process of claim 1, wherein the R groups are independently selected from n-pentyl, isopentyl, sec-pentyl, 1-methylpentyl, 2-methylpentyl, 3- methylpentyl, 4-methylpentyl, 1 -ethylbutyl, 2-ethylbutyl, tert-pentyl, 1, 1- dimethylbutyl, 1,2-dimethylbutyl, 1,3-dimethylbutyl, 2,3-dimethylbutyl, cyclopentyl, and mixtures of any of the foregoing.
7. The process of claim 1, wherein the R groups are independently selected from n-hexyl, 1 -methylhexyl, 2 -methylhexyl, 3 -methylhexyl, 4-methylhexyl, 5 -methylhexyl, 1 -ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1-n-propylbutyl, 1-iso- propylbutyl, l-iso-propyl-2-methylpropyl, 1 -methylheptyl, 2-methylheptyl, 3- methylheptyl, 4-methylheptyl, 5 -methylheptyl, 6-methylheptyl, 1-ethylhexyl, 2- ethylhexyl, 3-ethylhexyl, 4-ethylhexyl, 1 -n-propylpentyl, 2-n-propylpentyl, 1-iso- propylpentyl, 2-iso-propylpentyl, 1-n-butylbutyl, 1-iso-butylbutyl, 1-sec-butylbutyl,
1- tert-butylbutyl, 2-tert-butylbutyl, tert-butyl, l-ethyl-2-methylpropyl, 1,1- dimethylpentyl, 1,2-dimethylpentyl, 1,3 -dimethylpentyl, 1,4-dimethylpentyl, 2,2- dimethylpentyl, 2,3 -dimethylpentyl, 2,4-dimethylpentyl, 3,3-dimethylpentyl, 3,4- dimethylpentyl, 1 -ethyl- 1-methylbutyl, l-ethyl-2-methylbutyl, l-ethyl-3-methylbutyl,
2- ethyl-l-methylbutyl, 2-ethyl-3-methylbutyl, 1,1-dimethylhexyl, 1,2-dimethylhexyl, 1,3-dimethylhexyl, 1,4-dimethylhexyl, 1,5-dimethylhexyl, 2,2-dimethylhexyl, 2,3- dimethylhexyl, 2,4-dimethylhexyl, 2,5-dimethylhexyl, 3,3-dimethylhexyl, 3,4- dimethylhexyl, 3,5-dimethylhexyl, 4,4-dimethylhexyl, 4,5-dimethylhexyl, l-ethyl-2- methylpentyl, l-ethyl-3-methylpentyl, 1 -ethyl-4-methylpentyl, 2-ethyl- 1- methylpentyl, 2-ethyl-2-methylpentyl, 2-ethyl-3-methylpentyl, 2-ethyl-4- methylpentyl, 3-ethyl-l-methylpentyl, 3-ethyl-2-methylpentyl, 3-ethyl-3- methylpentyl, 3-ethyl-4-methylpentyl, 1-n-propyl- 1-methylbutyl, 1 -n-propyl-2- methylbutyl, l-n-propyl-3-methylbutyl, 1-iso-propyl- 1-methylbutyl, l-iso-propyl-2- methylbutyl, l-iso-propyl-3-methylbutyl, 1,1-diethylbutyl, 1,2-diethylbutyl, 1,1,2- trimethylpropyl, 1,2,2-trimethylpropyl, 1,1,2-trimethylbutyl, 1,1,3-trimethylbutyl, 1,2,3-trimethylbutyl, 1 ,2,2-trimethylbutyl, 1,3,3-trimethylbutyl, 2,3,3-trimethylbutyl,
1.1.2- trimethylpentyl, 1,1,3-trimethylpentyl, 1 , 1 ,4-trimethylpentyl, 1,2,2- trimethylpentyl, 1,2,3-trimethylpentyl, 1,2,4-trimethylpentyl, 1,3,4-trimethylpentyl,
2.2.3- trimethylpentyl, 2,2,4-trimethylpentyl, 2,3,4-trimethylpentyl, 1,3,3- trimethylpentyl, 2,3,3-trimethylpentyl, 3,3,4-trimethylpentyl, 1 ,4,4-trimethylpentyl,
2.4.4- trimethylpentyl, 3,4,4-trimethylpentyl, 1 -ethyl- 1,2-dimethylbutyl, l-ethyl-1,3- dimethylbutyl, l-ethyl-2,3 -dimethylbutyl, 2-ethyl- 1,1 -dimethylbutyl, 2-ethyl- 1,2- dimethylbutyl, 2-ethyl- 1,3 -dimethylbutyl, 2-ethyl-2,3-dimethylbutyl, cyclohexyl, methylcyclopentyl, methylcyclohexyl, 1,2-dimethylcyclohexyl, 1,3- dimethylcyclohexyl, 1 ,4-dimethylcyclohexyl, ethylcyclohexyl, and mixtures of any of the foregoing.
8. The process of claim 1, wherein the polymeric precursor compounds have a ratio of atoms of Group 11 to atoms of Group 13 of 0.60, 0.61, 0.62, 0.63, 0.64, 0.65, 0.66, 0.67, 0.68, 0.69, 0.70, or 0.71, or 0.72, or 0.73, or 0.74, or 0.75, or 0.76, or 0.77, or 0.78, or 0.79, or 0.80, or 0.81, or 0.82, or 0.83, or 0.84, or 0.85, or 0.86, or 0.87, or 0.88, or 0.89, or 0.90, or 0.91, or 0.92, or 0.93, or 0.94, or 0.95, or 0.96, or 0.97, or 0.98, or 0.99.
9. The process of claim 1, wherein the substrate has a layer of an adhesion promoter material on the electrical contact layer, wherein the adhesion promoter material is a CIGS material that is enriched in Cu so that the ratio of atoms of Cu to atoms of In and Ga, which is Cu/(In + Ga), is from 1 to 1.3, or from 1 to 1.2, or from 1 to 1.1.
10. The process of claim 1, further comprising applying heat, light, or radiation, or adding one or more chemical or crosslinking reagents to an ink before it is deposited.
1 1. The process of claim 1, further comprising repeating steps (b) and (c).
12. The process of claim 1, wherein the heating step is a process comprising converting the layer at a temperature of from 100°C to 450°C.
13. The process of claim 1, further comprising annealing the layers at a temperature of from 450°C to 650°C, or annealing the layers at a temperature of from 450°C to 650°C in the presence of Se vapor.
14. The process of claim 1, wherein the inks contain from 0.01 to 2.0 atom percent sodium ions.
15. The process of claim 1, wherein the depositing is done by spraying, spray coating, spray deposition, spray pyrolysis, printing, screen printing, inkjet printing, aerosol jet printing, ink printing, jet printing, stamp printing, transfer printing, pad printing, flexographic printing, gravure printing, contact printing, reverse printing, thermal printing, lithography, electrophotographic printing, electrodepositing, electroplating, electroless plating, bath deposition, coating, wet coating, dip coating spin coating, knife coating, roller coating, rod coating, slot die coating, meyerbar coating, lip direct coating, capillary coating, liquid deposition, solution deposition, layer-by-layer deposition, spin casting, solution casting, or any combination of the foregoing.
16. The process of claim 1, wherein the substrate is a semiconductor, a doped semiconductor, silicon, gallium arsenide, insulators, glass, molybdenum glass, molybdenum-coated glass, silicon dioxide, titanium dioxide, zinc oxide, silicon nitride, a metal, a metal foil, molybdenum, aluminum, beryllium, cadmium, cerium, chromium, cobalt, copper, gallium, gold, lead, manganese, molybdenum, nickel, palladium, platinum, rhenium, rhodium, silver, stainless steel, steel, iron, strontium, tin, titanium, tungsten, zinc, zirconium, a metal alloy, a metal silicide, a metal carbide, a polymer, a plastic, a conductive polymer, a copolymer, a polymer blend, a polyethylene terephthalate, a polycarbonate, a polyester, a polyester film, a mylar, a polyvinyl fluoride, polyvinylidene fluoride, a polyethylene, a polyetherimide, a polyethersulfone, a polyetherketone, a polyimide, a polyvinylchloride, an acrylonitrile butadiene styrene polymer, a silicone, an epoxy, paper, coated paper, or a
combination of any of the foregoing.
17. A photovoltaic absorber material made by the process of any one of claims 1-16.
18. A compound having the empirical formula
(Cui-xAgx)u(Ini_y_tGayAlt)((Si-zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.6 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from alkyl groups.
19. The compound of claim 18, wherein the compound is a CIGS polymeric precursor compound having the empirical formula
Cuu(Ini_yGay)((Si-zSez)R)w, wherein x is 0, y is between 0 and 1 so that both In and Ga are present, and t is 0.
20. The compound of claim 18, wherein the R groups are independently selected from n-butyl, sec -butyl, iso-butyl, and t-butyl.
21. The compound of claim 18, wherein the R groups are independently selected from n-pentyl, isopentyl, sec-pentyl, 1-methylpentyl, 2-methylpentyl, 3- methylpentyl, 4-methylpentyl, 1 -ethylbutyl, 2-ethylbutyl, tert-pentyl, 1,1- dimethylbutyl, 1,2-dimethylbutyl, 1,3-dimethylbutyl, 2,3-dimethylbutyl, cyclopentyl, and mixtures of any of the foregoing.
22. The compound of claim 18, wherein the R groups are independently selected from n-hexyl, l-methylhexyl, 2-methylhexyl, 3-methylhexyl, 4-methylhexyl, 5-methylhexyl, 1 -ethylpentyl, 2-ethylpentyl, 3-ethylpentyl, 1-n-propylbutyl, 1-iso- propylbutyl, l-iso-propyl-2-methylpropyl, 1 -methylheptyl, 2-methylheptyl, 3- methylheptyl, 4-methylheptyl, 5 -methylheptyl, 6-methylheptyl, 1-ethylhexyl, 2- ethylhexyl, 3-ethylhexyl, 4-ethylhexyl, 1 -n-propylpentyl, 2-n-propylpentyl, 1-iso- propylpentyl, 2-iso-propylpentyl, 1-n-butylbutyl, 1-iso-butylbutyl, 1-sec-butylbutyl,
1- tert-butylbutyl, 2-tert-butylbutyl, tert-butyl, l-ethyl-2-methylpropyl, 1,1- dimethylpentyl, 1,2-dimethylpentyl, 1,3 -dimethylpentyl, 1,4-dimethylpentyl, 2,2- dimethylpentyl, 2,3 -dimethylpentyl, 2,4-dimethylpentyl, 3,3-dimethylpentyl, 3,4- dimethylpentyl, 1 -ethyl- 1-methylbutyl, l-ethyl-2-methylbutyl, l-ethyl-3-methylbutyl,
2 - ethyl- 1-methylbutyl, 2-ethyl-3-methylbutyl, 1,1-dimethylhexyl, 1,2-dimethylhexyl, 1,3-dimethylhexyl, 1,4-dimethylhexyl, 1,5-dimethylhexyl, 2,2-dimethylhexyl, 2,3- dimethylhexyl, 2,4-dimethylhexyl, 2,5-dimethylhexyl, 3,3-dimethylhexyl, 3,4- dimethylhexyl, 3,5-dimethylhexyl, 4,4-dimethylhexyl, 4,5-dimethylhexyl, l-ethyl-2- methylpentyl, l-ethyl-3-methylpentyl, 1 -ethyl-4-methylpentyl, 2-ethyl-l- methylpentyl, 2-ethyl-2-methylpentyl, 2-ethyl-3-methylpentyl, 2-ethyl-4- methylpentyl, 3 -ethyl- 1-methylpentyl, 3-ethyl-2-methylpentyl, 3-ethyl-3- methylpentyl, 3-ethyl-4-methylpentyl, 1-n-propyl- 1-methylbutyl, 1 -n-propyl-2- methylbutyl, l-n-propyl-3-methylbutyl, 1-iso-propyl- 1-methylbutyl, l-iso-propyl-2- methylbutyl, l-iso-propyl-3-methylbutyl, 1,1-diethylbutyl, 1,2-diethylbutyl, 1,1,2- trimethylpropyl, 1,2,2-trimethylpropyl, 1,1,2-trimethylbutyl, 1,1,3-trimethylbutyl, 1,2,3-trimethylbutyl, 1 ,2,2-trimethylbutyl, 1,3,3-trimethylbutyl, 2,3,3-trimethylbutyl,
1.1.2- trimethylpentyl, 1,1,3-trimethylpentyl, 1 , 1 ,4-trimethylpentyl, 1,2,2- trimethylpentyl, 1,2,3-trimethylpentyl, 1,2,4-trimethylpentyl, 1,3,4-trimethylpentyl,
2.2.3- trimethylpentyl, 2,2,4-trimethylpentyl, 2,3,4-trimethylpentyl, 1,3,3- trimethylpentyl, 2,3,3-trimethylpentyl, 3,3,4-trimethylpentyl, 1 ,4,4-trimethylpentyl,
2.4.4- trimethylpentyl, 3,4,4-trimethylpentyl, 1 -ethyl- 1,2-dimethylbutyl, l-ethyl-1,3- dimethylbutyl, l-ethyl-2,3-dimethylbutyl, 2-ethyl-l, l-dimethylbutyl, 2-ethyl-l,2- dimethylbutyl, 2-ethyl- 1,3 -dimethylbutyl, 2-ethyl-2,3-dimethylbutyl, cyclohexyl, methylcyclopentyl, methylcyclohexyl, 1,2-dimethylcyclohexyl, 1,3- dimethylcyclohexyl, 1 ,4-dimethylcyclohexyl, ethylcyclohexyl, and mixtures of any of the foregoing.
23. An ink for making a photovoltaic absorber material comprising one or more precursor compounds and an additive dissolved in one or more solvents, wherein the precursor compounds are polymeric precursor compounds have the empirical formula (Cui-xAgx)u(Ini_y_tGayAlt)((Si-zSez)R)w, wherein x is from 0 to 1, y is from 0 to 1, t is from 0 to 1, the sum of y plus t is from 0 to 1, z is from 0 to 1, u is from 0.7 to 1, w is 3+u, and R represents R groups, of which there are w in number, independently selected from n-propyl, isopropyl, n-butyl, iso-butyl, sec -butyl, t-butyl, n-pentyl.
24. The ink of claim 23, wherein the additive is a compound having the one of the formulas AR4, R3A-AR3, or R2A-Q-AR2, wherein A is Si, Ge, or Sn, Q is -(CR2)n-, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
25. The ink of claim 23, wherein the additive is triethylsilane.
26. The ink of claim 23, wherein the additive is an siloxane, germoxane or stannoxane compound having the formula (R2AO)x, wherein x is 2 to 8, A is Si, Ge, or Sn, and each R is independently selected from hydrogen, alkyl, aryl, alkenyl, and silyl.
27. The ink of claim 23, wherein the additive is a diorganosiloxane compound or siloxane fluid.
28. The ink of claim 23, wherein the additive is a
hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane,
decamethylcyclopentasiloxane, or dodecamethylcyclohexasiloxane.
29. The ink of claim 23, wherein the additive is at a concentration of from 0.1% to 15% (v/v), or from 0.1% to 10%, or from 0.1% to 5%.
30. The ink of claim 23, wherein the solvents are selected from aliphatic hydrocarbons, aromatic hydrocarbons, pentane, hexane, heptane, octane, isooctane, decane, cyclohexane, p-xylene, m-xylene, o-xylene, benzene, toluene, xylene, ethers, diethyl ether, tetrahydofuran, 2-methyltetrahydofuran, siloxanes, cyclosiloxanes, silicone fluids, acetonitrile, esters, acetates, ethyl acetate, butyl acetate, acrylates, isobornyl acrylate, ketones, acetone, methyl ethyl ketone, cyclohexanone, cyclopentanone, lactams, N-methyl pyrrolidone, N-(2-hydroxyethyl)-pyrrolidone, cyclic acetals, cyclic ketals, aldehydes, alcohol, methanol, ethanol, isopropyl alcohol, thiols, butanol, butanediol, glycerols, alkoxyalcohols, glycols, l-methoxy-2-propanol, acetone, ethylene glycol, propylene glycol, propylene glycol laurate, ethylene glycol ethers, diethylene glycol, triethylene glycol monobutylether, propylene glycol monomethylether, 1 ,2-hexanediol, and mixtures thereof.
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