WO2013190293A1 - Coating for printing plates - Google Patents
Coating for printing plates Download PDFInfo
- Publication number
- WO2013190293A1 WO2013190293A1 PCT/GB2013/051594 GB2013051594W WO2013190293A1 WO 2013190293 A1 WO2013190293 A1 WO 2013190293A1 GB 2013051594 W GB2013051594 W GB 2013051594W WO 2013190293 A1 WO2013190293 A1 WO 2013190293A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- plate
- layer
- printing
- nicr
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 122
- 239000011248 coating agent Substances 0.000 title claims abstract description 113
- 238000000034 method Methods 0.000 claims abstract description 27
- 230000008569 process Effects 0.000 claims abstract description 13
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 27
- 229910001120 nichrome Inorganic materials 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 25
- 150000004767 nitrides Chemical class 0.000 claims description 20
- 239000011651 chromium Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- 229910003218 Ni3N Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 6
- 238000007733 ion plating Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 229910018487 Ni—Cr Inorganic materials 0.000 claims description 4
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 4
- 238000005240 physical vapour deposition Methods 0.000 claims description 4
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 230000007797 corrosion Effects 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 claims description 3
- 229910000599 Cr alloy Inorganic materials 0.000 claims description 2
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 239000000788 chromium alloy Substances 0.000 claims description 2
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 claims description 2
- 230000001737 promoting effect Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 24
- 239000000976 ink Substances 0.000 description 14
- 229910019912 CrN Inorganic materials 0.000 description 9
- 230000008901 benefit Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 230000000712 assembly Effects 0.000 description 3
- 238000000429 assembly Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 208000036366 Sensation of pressure Diseases 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000009419 refurbishment Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/003—Preparing for use and conserving printing surfaces of intaglio formes, e.g. application of a wear-resistant coating, such as chrome, on the already-engraved plate or cylinder; Preparing for reuse, e.g. removing of the Ballard shell; Correction of the engraving
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/16—Curved printing plates, especially cylinders
- B41N1/20—Curved printing plates, especially cylinders made of metal or similar inorganic compounds, e.g. plasma coated ceramics, carbides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/038—Treatment with a chromium compound, a silicon compound, a phophorus compound or a compound of a metal of group IVB; Hydrophilic coatings obtained by hydrolysis of organometallic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/351—Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/02—Cover layers; Protective layers
Definitions
- the invention to which this application relates is to the provision of a coating which has particular benefits when applied to a surface of a plate to be used in a printing proces s, with the plate surface including etchings therein for use in the printing process .
- the plate is for use in the intaglio printing process in which the image to be printed is etched into the plate surface and the etched portions are filled with ink and any exces s ink is wiped from the plate surface prior to the printing of the etched image onto a sheet of material such as paper.
- printing proces ses such as the intaglio process is well known, as is the use of the intaglio proces s for the high security printing of sheet material such as the printing of banknotes and packaging for ant-counterfeiting purposes, and printing of high definition images.
- the same can become worn and the surfaces of the same can collect residue from the ink and/or other substances which may be left on the same due to insufficient wiping clean and/or portions of the ink remaining on the plate following the printing process.
- the build up of residue can cause imperfections in the printed sheets which are applied such that the printing plate may eventually have to be redefined in terms of the etched image and/or cleaned more thoroughly, or even replaced for refurbishment, all of which can cause a delay in the printing procedure and/or the plate may need to be discarded.
- mechanical damage to the plate including scratches and the trans fer of micro particle inclusions from the ink, can also result in image degradation, both in terms of definition and colour.
- Flexibility may also be required when mounting the plates in the coating apparatus if they require to be held in a curved shape on a holder and this can cause unacceptable stres s in a coating applied to the surface, resulting in cracking and ultimately delamination from the surface.
- a further problem is that a wiping action is required to be repeatedly performed across the surface in order to remove any exces s ink and this wiping action can have an abrasive effect on the coating material such that relatively quickly the coating and any benefits therefrom are removed.
- a yet further problem is to ensure that the coating applied is resistant to potential corrosive effects of the inks which are applied to the same whilst ensuring that the accuracy of the etched image is maintained. High pres sures during the printing proces s will cause repeated flexure of coated plate, which will induce fatigue failure. It is therefore known that while the coating applied must be relatively tough, the same must have good adhesion to the plate and cannot be too hard or brittle.
- the aim of the present invention is therefore to provide a coating for application to a plate for use in a printing process and which coating allows the longevity of the usage of the plate to be maximised whilst ensuring that the clarity o f the image on the plate and the print which is achieved is at least maintained at an acceptable level during the desired service of the plate.
- a plate for use in a printing procedure said plate having a coating applied by a physical vapour deposition technique to at least one face thereof, said coating may include, but is not limited to, a metal nitride layer.
- the coating includes a metal nitride but also includes other materials, said materials applied to provide certain desired characteristics for the coating.
- the coating includes a layer in contact with the surface of the plate which acts as an adhesion layer for the coating.
- this layer is of chromium or a chromium alloy such as so called nickel chrome.
- the coating layer includes any or any combination of Cr 2 N, CrN, Ni 3 N, and a nitride of a nickel chromium alloy Ni x Cr y N 2 . also referred to herein as NiCr(N) .
- the metal nitride includes nickel and in a preferred embodiment the material is Nickel Chromium Nitride (NiCr(N)) .
- the coating comprises an adhesion and corrosion resistance promoting Cr layer or a Cr/NiCr layer followed by a blended Cr-NiCr layer followed by a CrN/NiCrN layer and then a NiCr(N) layer which forms the external surface of the coated plate.
- the surfaces to be coated are provided to come into contact with an ink and means to apply the ink and remove any exces s ink therefrom as part of a wiping action.
- the coating typically at least those surfaces of the plate which are to be wiped and/or have ink applied thereto are provided with the coating.
- the surface of the plate to which the coating is applied includes an etched image therein which is to be applied to a sheet material in a printing process .
- the sheet material once printed, is further proces sed to form one or more banknotes .
- the printing proces s is an intaglio printing proces s.
- the coating is applied using a Physical Vapour Deposition (PVD) coating process and more preferably a reactive Closed Field Unbalanced Magnetron Sputter Ion Plating proces s.
- PVD Physical Vapour Deposition
- a coating applied to a surface of a plate for use in a printing proces s to form an external surface thereof said coating including an outer surface of a metal nitride, said metal nitride having a structure with a highly oriented basal plane arrangement.
- the metal nitride has a highly oriented configuration in that the maj ority of the basal planes are substantially parallel with the surface to which the material is applied. Preferably the whole coating is so oriented.
- the material used to form at least the outer surface of the coating is Nickel Chromium nitride.
- a coating applied using Closed Field Unbalanced Magnetron Sputter Ion Plating apparatus and the coating has at least one layer which is of high orientation of the basal planes to lie parallel with the surface of the surface of the printing plate to which the coating is applied.
- the coating is multi layered and at least the outer layer of the coating has high orientation of the basal planes.
- the at least outer layer includes or comprises Cr 2 N.
- a method for the application of a coating to a surface of a printing plate on which an image is etched, said coating including a metal nitride said method comprising the steps of sputtering nickel or a nickel alloy in a nitrogen atmosphere to produce a metal or alloy nitride structure on the surface to be coated, said material sputtered from a NiCr target in a nitrogen atmosphere, and characterised in that the coating is applied in an oriented manner such that more than 50% of the basal planes of the structure are substantially parallel to the surface of the printing plate to which the coating is applied.
- any of the coatings, Cr 2 N, Ni 3 N, NiCr(N), deposited using reactive CFUBMSIP in accordance with the invention are smooth and have dense structures, and are tough with requisite hardness and corrosion resistance.
- the coating application sputtering method produces smooth external surface with a dense form and with a minimum areal density of defects.
- the Closed Field arrangement of Unbalanced magnetrons in the apparatus gives very high ion current densities during in situ bombardment cleaning and during the coating proces s hence producing the very adherent, dense coatings.
- the coating is applied to a thicknes s in the range of 0.5-5 microns.
- the coating is applied at a temperature in the range of 100 to 400 degrees Celsius.
- Figure 1 illustrates a printing plate of the type in relation to which the current invention may be utilised
- Figure 2 illustrates a cros s section along line AA of the printing plate of Figure 1 in accordance with one embodiment of the invention.
- Figure 3 illustrates apparatus suitable for applying the coating in accordance with the invention.
- FIGS 1 and 2 illustrate a plate for use in a printing proces s in accordance with the invention.
- the plate 25 comprises a first surface 26 on which is formed an etched image 28 which is filled with ink during the process and which allows the image to be printed onto sheet material, in this case using the known intaglio printing procedure.
- the image shown is that of a face of a banknote. It is this surface 26 which is required to be coated in order to allow the life of the plate to be increased relative to a non-coated surface or a surface which has an inferior coating applied thereto.
- the coating is shown in more detail in Figure 2 and in a larger scale than in use, for ease of illustration, in which there is shown the surface 26 on which the coating is applied.
- the coating comprises a first layer 30 of Cr alone or Cr/NiCr followed by a blended layer 32 o f Cr-NiCr followed in turn by a layer 34 of CrN/NiCr(N) and then a final external layer 36 of NiCr(N) which forms the external face 38 of the coating.
- Figure 3 illustrates apparatus referred to as a closed field unbalanced magnetron sputter ion plating apparatus which is subject to protection in the applicant's patent GB2258343 and reference is hereby made to the contents of that patent.
- FIG. 3 there is illustrated the apparatus in plan and in a schematic manner in a form which can be used for a batch coating proces s. However, in-line coating proces ses may equally be used to apply the coating in accordance with the invention.
- a coating chamber 2 in which there is disposed two sets of opposing unbalanced magnetrons 4,6; 8,10.
- Each of the unbalanced magnetrons include a target 12 of suitable material to allow the coating to be formed.
- the magnetrons are arranged to operate in a closed field configuration in that the magnetrons are arranged around a carrier 9 in the chamber 2 which is centrally spaced relative to the magnetrons .
- the magnetrons are arranged so that adj acent magnetrons have outer magnetic assemblies 14 of opposite polarity, to those adj acent thereto hence allowing magnetic field lines to link adj acent magnetrons so as to produce a substantially closed ring of magnetic flux which substantially traps all electrons generated in the system and increases the level of ionisation surrounding the carrier. It should be appreciated that some of the unbalanced magnetrons may be replaced by arrays of magnets with suitable magnetic configuration to retain the closed filed of magnetic flux in the coating chamber. In another embodiment, as long as at least one magnetron is of opposite polarity to the remaining magnetrons and/or magnetic assemblies in the coating chamber then benefits of the closed field configuration still apply, in accordance with the teaching in the applicant's patent GB2258343.
- the carrier 9 is provided in the form of a drum driven to rotate about axis 13 and on the external surface 1 1 of which can be mounted the devices or items to be coated.
- the devices are mounted such that the surface of the same which is to be coated, faces towards the unbalanced magnetrons and magnetic assemblies, if present.
- Inlet means are provided to allow the selective introduction of working gases into the chamber and pumps are provided in order to allow the pres sure in the chamber to be controlled.
- At least one, but typically two Cr targets are utilised 12' and an NiCr material target or targets 12" is/are utilised in the closed field arrangement.
- a multilayer coating is applied to the surface or surfaces of the item to be coated and which item is positioned within the coating apparatus to be exposed to the deposited material.
- a suitable reactive gas to be introduced into the coating chamber in this case would be nitrogen in addition to the inert gas, Ar.
- a coating structure of CrN/NiCr(N) CrN/NiCr(N) is deposited by the sequential operation of the deposition means to cause the sputtering of material from either set of targets 12' or 12" to form the inner and outer layers respectively and co-sputtering of targets 12', 12" of required to form the middle layer.
- a CrN containing coating which is applicable to printing plates.
- a Ni 3 N coating can be applied or yet further a NiCr(N) coating.
- coatings comprising a series of layers can be applied to form the coating, such as those comprising CrN and Ni 3 N layers or CrN and NiCr(N) layers, or multilayer coatings comprising CrN, Ni 3 N and NiCr(N) layers.
- any hard metal nitride, carbo nitride, oxide, or oxynitride can be utilised to advantage in accordance with the invention.
- the plates to be coated are mounted, and typically "wrapped" around a cylindrical drum in a coating chamber in which there are provided a series of unbalanced magnetrons arranged in a closed field configuration.
- the magnetrons include targets of Cr and NiCr.
- a plasma cleaning operation is performed initially to clean the surface which is to be coated with Ar gas being introduced into the chamber.
- Material is deposited firstly from the Cr target or from a combination of Cr and NiCr to apply the initial layer onto the surface of the plate which is to be coated and this is found to improve adhesion of the coating to the surface and reduce stres ses in the coating which is formed. This is then followed by the combined operation of the apparatus to provide a blended coating to be formed from the material from both targets and to allow a graded coating to be formed.
- the pressure in the coating chamber is in the region of 1.0E-3 torr, with the thicknes s of the coating being in the range of 0.5- 5 microns.
- a bias voltage is applied to the plates during the coating application and a temperature in the region o f 350degrees Celsius is maintained during the coating application.
- the power to operate the targets is preferably a switched-mode DC supply.
- the bias power to the plate is preferably a pulsed switched-mode DC supply which is found to provide improved coating enhancement.
- the introduction of nitrogen gas into the coating chamber is controlled using a feedback loop control.
- the coating which is applied has a hardnes s in the range of 1000- 1 800Hv, measured using a ultra-micro hardness dynamic hardnes s tester, such as a Fischerscope EM300 instrument operated with a peak load of 50mN.
- the multi layered coating tends to exhibit enhanced in comparison with single layer coatings .
- the wiping action on the coating the corrosive nature of the ink applied thereto and/or the flexing of the plate can all cause damage to the coating, the combination of hardnes s, wear resistance properties and ability to withstand stres ses of the coating applied in accordance with the invention are important advantages.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
The invention relates to the provision of plates for use in printing processes and to the coating of at least one of the surfaces of the same to reduce the wear and improve the clarity of the etched image on said surface and thereby improve the printing obtained. A coating is applied which can be multilayered to provide a combination of hardness and wear resistance properties and the ability to withstand stresses on the coating applied during the printing process.
Description
Coating for printing plates
The invention to which this application relates is to the provision of a coating which has particular benefits when applied to a surface of a plate to be used in a printing proces s, with the plate surface including etchings therein for use in the printing process . In particular, although not neces sarily exclusively, the plate is for use in the intaglio printing process in which the image to be printed is etched into the plate surface and the etched portions are filled with ink and any exces s ink is wiped from the plate surface prior to the printing of the etched image onto a sheet of material such as paper.
The use of printing proces ses such as the intaglio process is well known, as is the use of the intaglio proces s for the high security printing of sheet material such as the printing of banknotes and packaging for ant-counterfeiting purposes, and printing of high definition images.
Over time of use of the printing plates, which are typically formed of, for example, nickel alloys or copper plated stainless steels, the same can become worn and the surfaces of the same can collect residue from the ink and/or other substances which may be left on the same due to insufficient wiping clean and/or portions of the ink remaining on the plate following the printing process. Over time the build up of residue can cause imperfections in the printed sheets which are applied such that the printing plate may eventually have to be redefined in terms of the etched image and/or cleaned more thoroughly, or even replaced for refurbishment, all of which can cause a delay in the printing procedure and/or the plate may need to be discarded. Additionally, in multiple processes where individual colours are applied sequentially, such degradation may result in gradual changes to the colour of the resulting image. Mechanical damage to the plate, including scratches and the trans fer of micro
particle inclusions from the ink, can also result in image degradation, both in terms of definition and colour.
It is known to apply a coating on at least the surface of the plate to which the ink is applied and in which the etched image is formed and the known coatings are formed of chromium and applied by electroplating. However, this coating, whilst effective in protecting the plate surface, is found to be environmentally unfriendly due to the pollutants which are created during the coating proces s and/or the subsequent discarding of the plates . Attempts at using other coatings have so far failed due to the specific problems relating to the plates and the coating of the same. These problems include the fact that the plates are required to be flexible during installation and use. Flexibility may also be required when mounting the plates in the coating apparatus if they require to be held in a curved shape on a holder and this can cause unacceptable stres s in a coating applied to the surface, resulting in cracking and ultimately delamination from the surface. A further problem is that a wiping action is required to be repeatedly performed across the surface in order to remove any exces s ink and this wiping action can have an abrasive effect on the coating material such that relatively quickly the coating and any benefits therefrom are removed. A yet further problem is to ensure that the coating applied is resistant to potential corrosive effects of the inks which are applied to the same whilst ensuring that the accuracy of the etched image is maintained. High pres sures during the printing proces s will cause repeated flexure of coated plate, which will induce fatigue failure. It is therefore known that while the coating applied must be relatively tough, the same must have good adhesion to the plate and cannot be too hard or brittle.
The aim of the present invention is therefore to provide a coating for application to a plate for use in a printing process and which coating allows the longevity of the usage of the plate
to be maximised whilst ensuring that the clarity o f the image on the plate and the print which is achieved is at least maintained at an acceptable level during the desired service of the plate.
In a first aspect of the invention there is provided a plate for use in a printing procedure, said plate having a coating applied by a physical vapour deposition technique to at least one face thereof, said coating may include, but is not limited to, a metal nitride layer.
In an alternative embodiment the coating includes a metal nitride but also includes other materials, said materials applied to provide certain desired characteristics for the coating.
In one embodiment the coating includes a layer in contact with the surface of the plate which acts as an adhesion layer for the coating. In one embodiment this layer is of chromium or a chromium alloy such as so called nickel chrome.
In one embodiment the coating layer includes any or any combination of Cr2N, CrN, Ni3N, and a nitride of a nickel chromium alloy NixCryN2 . also referred to herein as NiCr(N) .
Preferably the metal nitride includes nickel and in a preferred embodiment the material is Nickel Chromium Nitride (NiCr(N)) .
In one embodiment the coating comprises an adhesion and corrosion resistance promoting Cr layer or a Cr/NiCr layer followed by a blended Cr-NiCr layer followed by a CrN/NiCrN layer and then a NiCr(N) layer which forms the external surface of the coated plate.
In one embodiment the surfaces to be coated are provided to come into contact with an ink and means to apply the ink and remove any exces s ink therefrom as part of a wiping action. Typically at least those surfaces of the plate which are to be
wiped and/or have ink applied thereto are provided with the coating.
Typically the surface of the plate to which the coating is applied includes an etched image therein which is to be applied to a sheet material in a printing process .
In one embodiment the sheet material, once printed, is further proces sed to form one or more banknotes .
In one embodiment the printing proces s is an intaglio printing proces s.
Typically the coating is applied using a Physical Vapour Deposition (PVD) coating process and more preferably a reactive Closed Field Unbalanced Magnetron Sputter Ion Plating proces s.
In a further aspect of the invention there is provided a coating applied to a surface of a plate for use in a printing proces s to form an external surface thereof, said coating including an outer surface of a metal nitride, said metal nitride having a structure with a highly oriented basal plane arrangement.
In one embodiment the metal nitride has a highly oriented configuration in that the maj ority of the basal planes are substantially parallel with the surface to which the material is applied. Preferably the whole coating is so oriented.
In one embodiment the material used to form at least the outer surface of the coating is Nickel Chromium nitride.
In a further aspect of the invention, there is provided a coating applied using Closed Field Unbalanced Magnetron Sputter Ion Plating apparatus and the coating has at least one layer which is of high orientation of the basal planes to lie parallel with the
surface of the surface of the printing plate to which the coating is applied.
In one embodiment the coating is multi layered and at least the outer layer of the coating has high orientation of the basal planes.
In one embodiment the at least outer layer includes or comprises Cr2N.
In a further aspect of the invention there is provided a method for the application of a coating to a surface of a printing plate on which an image is etched, said coating including a metal nitride, said method comprising the steps of sputtering nickel or a nickel alloy in a nitrogen atmosphere to produce a metal or alloy nitride structure on the surface to be coated, said material sputtered from a NiCr target in a nitrogen atmosphere, and characterised in that the coating is applied in an oriented manner such that more than 50% of the basal planes of the structure are substantially parallel to the surface of the printing plate to which the coating is applied.
Typically, any of the coatings, Cr2N, Ni3N, NiCr(N), deposited using reactive CFUBMSIP in accordance with the invention, are smooth and have dense structures, and are tough with requisite hardness and corrosion resistance.
In one embodiment the coating application sputtering method produces smooth external surface with a dense form and with a minimum areal density of defects. Typically the Closed Field arrangement of Unbalanced magnetrons in the apparatus gives very high ion current densities during in situ bombardment cleaning and during the coating proces s hence producing the very adherent, dense coatings.
In one embodiment the coating is applied to a thicknes s in the range of 0.5-5 microns.
In one embodiment the coating is applied at a temperature in the range of 100 to 400 degrees Celsius.
A specific embodiment of the invention is now described with reference to the accompanying drawings; wherein
Figure 1 illustrates a printing plate of the type in relation to which the current invention may be utilised;
Figure 2 illustrates a cros s section along line AA of the printing plate of Figure 1 in accordance with one embodiment of the invention; and
Figure 3 illustrates apparatus suitable for applying the coating in accordance with the invention.
Figures 1 and 2 illustrate a plate for use in a printing proces s in accordance with the invention. The plate 25 comprises a first surface 26 on which is formed an etched image 28 which is filled with ink during the process and which allows the image to be printed onto sheet material, in this case using the known intaglio printing procedure. In this example, the image shown is that of a face of a banknote. It is this surface 26 which is required to be coated in order to allow the life of the plate to be increased relative to a non-coated surface or a surface which has an inferior coating applied thereto.
The coating is shown in more detail in Figure 2 and in a larger scale than in use, for ease of illustration, in which there is shown the surface 26 on which the coating is applied. The coating comprises a first layer 30 of Cr alone or Cr/NiCr followed by a blended layer 32 o f Cr-NiCr followed in turn by a
layer 34 of CrN/NiCr(N) and then a final external layer 36 of NiCr(N) which forms the external face 38 of the coating.
Figure 3 illustrates apparatus referred to as a closed field unbalanced magnetron sputter ion plating apparatus which is subject to protection in the applicant's patent GB2258343 and reference is hereby made to the contents of that patent.
In Figure 3 there is illustrated the apparatus in plan and in a schematic manner in a form which can be used for a batch coating proces s. However, in-line coating proces ses may equally be used to apply the coating in accordance with the invention. In this apparatus there is provided a coating chamber 2 in which there is disposed two sets of opposing unbalanced magnetrons 4,6; 8,10. Each of the unbalanced magnetrons include a target 12 of suitable material to allow the coating to be formed. The magnetrons are arranged to operate in a closed field configuration in that the magnetrons are arranged around a carrier 9 in the chamber 2 which is centrally spaced relative to the magnetrons . The magnetrons are arranged so that adj acent magnetrons have outer magnetic assemblies 14 of opposite polarity, to those adj acent thereto hence allowing magnetic field lines to link adj acent magnetrons so as to produce a substantially closed ring of magnetic flux which substantially traps all electrons generated in the system and increases the level of ionisation surrounding the carrier. It should be appreciated that some of the unbalanced magnetrons may be replaced by arrays of magnets with suitable magnetic configuration to retain the closed filed of magnetic flux in the coating chamber. In another embodiment, as long as at least one magnetron is of opposite polarity to the remaining magnetrons and/or magnetic assemblies in the coating chamber then benefits of the closed field configuration still apply, in accordance with the teaching in the applicant's patent GB2258343.
The carrier 9 is provided in the form of a drum driven to rotate about axis 13 and on the external surface 1 1 of which can be mounted the devices or items to be coated. The devices are mounted such that the surface of the same which is to be coated, faces towards the unbalanced magnetrons and magnetic assemblies, if present.
Inlet means are provided to allow the selective introduction of working gases into the chamber and pumps are provided in order to allow the pres sure in the chamber to be controlled.
In operation, power is applied to the magnetrons under controlled conditions via power supplies 20, 21 , 22, 23 rotating carrier receive coating flux material from the targets as they pass the same and as a result the layer of the material is built up to the required thicknes s of coating. The carrier is insulated from the body of the machine to allow it to float electrically (or for a bias voltage to be applied) .
In accordance with the invention, at least one, but typically two Cr targets are utilised 12' and an NiCr material target or targets 12" is/are utilised in the closed field arrangement. By the selective operation of the deposition means a multilayer coating is applied to the surface or surfaces of the item to be coated and which item is positioned within the coating apparatus to be exposed to the deposited material. A suitable reactive gas to be introduced into the coating chamber in this case would be nitrogen in addition to the inert gas, Ar. In this example a coating structure of CrN/NiCr(N) CrN/NiCr(N) is deposited by the sequential operation of the deposition means to cause the sputtering of material from either set of targets 12' or 12" to form the inner and outer layers respectively and co-sputtering of targets 12', 12" of required to form the middle layer.
Thus in accordance with the invention there is provided a CrN containing coating which is applicable to printing plates. In an alternative embodiment a Ni3N coating can be applied or yet further a NiCr(N) coating.
As described above by the selective operation of the coating apparatus coatings comprising a series of layers can be applied to form the coating, such as those comprising CrN and Ni3N layers or CrN and NiCr(N) layers, or multilayer coatings comprising CrN, Ni3N and NiCr(N) layers.
It should therefore be appreciated that in accordance with the invention, any hard metal nitride, carbo nitride, oxide, or oxynitride can be utilised to advantage in accordance with the invention.
A specific example of the invention is now described in a non limiting manner.
The plates to be coated are mounted, and typically "wrapped" around a cylindrical drum in a coating chamber in which there are provided a series of unbalanced magnetrons arranged in a closed field configuration. The magnetrons include targets of Cr and NiCr. A plasma cleaning operation is performed initially to clean the surface which is to be coated with Ar gas being introduced into the chamber.
Material is deposited firstly from the Cr target or from a combination of Cr and NiCr to apply the initial layer onto the surface of the plate which is to be coated and this is found to improve adhesion of the coating to the surface and reduce stres ses in the coating which is formed. This is then followed by the combined operation of the apparatus to provide a blended coating to be formed from the material from both targets and to allow a graded coating to be formed.
The pressure in the coating chamber is in the region of 1.0E-3 torr, with the thicknes s of the coating being in the range of 0.5- 5 microns.
Typically a bias voltage is applied to the plates during the coating application and a temperature in the region o f 350degrees Celsius is maintained during the coating application. The power to operate the targets is preferably a switched-mode DC supply. The bias power to the plate is preferably a pulsed switched-mode DC supply which is found to provide improved coating enhancement.
During the coating procedure the introduction of nitrogen gas into the coating chamber is controlled using a feedback loop control.
The coating which is applied has a hardnes s in the range of 1000- 1 800Hv, measured using a ultra-micro hardness dynamic hardnes s tester, such as a Fischerscope EM300 instrument operated with a peak load of 50mN.
Typically the multi layered coating tends to exhibit enhanced in comparison with single layer coatings . As the wiping action on the coating, the corrosive nature of the ink applied thereto and/or the flexing of the plate can all cause damage to the coating, the combination of hardnes s, wear resistance properties and ability to withstand stres ses of the coating applied in accordance with the invention are important advantages.
Claims
1. A plate for use in a printing procedure, said plate having a coating applied by a physical vapour deposition coating proces s to at least one face thereof which includes an etched image, said coating including a metal nitride layer.
2. A plate according to claim 1 , wherein said plate coating includes at least one further material
3. A plate according to claim 1 wherein the coating includes a layer in contact with the surface of the plate which acts as an adhesion layer for the coating.
4. A plate according to claim 3 wherein the layer is of chromium or a chromium alloy.
5. A plate according to claim 1 wherein the metal nitride layer includes any, or any combination, o f Cr2N, CrN, Ni3N, and/or a nitride of a nickel chromium alloy NixCryN2
6. A plate according to claim 1 wherein the metal nitride includes nickel.
7 A plate according to claim 6 wherein the nickel is provided as Nickel Chromium Nitride (NiCr(N)) .
8. A plate according to claim 1 wherein the coating includes an adhesion and corrosion resistance promoting Cr layer or a Cr/NiCr layer followed by a blended Cr-NiCr layer followed by a CrN/NiCrN layer and then a NiCr(N) layer.
9 A plate according to claim 8 wherein the NiCr(N) layer forms the external surface of the coated plate.
10. A plate according to any of the preceding claims wherein the surfaces to be coated are those which come into contact with an ink in the printing procedure, means to apply the ink and remove any excess ink therefrom as part of a wiping action.
1 1. A plate according to claim 10 wherein at least those surfaces of the plate which are to be wiped and/or have ink applied thereto are provided with the coating.
12. A plate according to claim 1 wherein the etched image is to be applied to a sheet material in a printing process .
13. A plate according to claim 1 wherein the printing proces s is an intaglio printing process .
14. A plate according to claim 1 wherein the coating is applied using reactive Closed Field Unbalanced Magnetron Sputter Ion Plating.
1 5. A coating applied to a surface of a plate for use in a printing proces s to form an external surface thereof, said coating including an outer surface of a metal nitride, said metal nitride having a structure with a highly oriented basal plane arrangement.
16. A coating according to claim 1 5 wherein the metal nitride has a highly oriented configuration in that the majority of the basal planes are substantially parallel with the surface to which the material is applied.
17. A coating according to claim 1 5 wherein the material used to form at least the outer surface of the coating is Nickel Chromium nitride.
18. A coating applied using a closed field unbalanced magnetron sputter ion plating apparatus and the coating has at least one
layer which has high orientation of the basal planes to lie substantially parallel with the surface of a printing plate to which the coating is applied.
1 9. A coating according to claim 1 8 wherein the coating is multi layered and at least the outer layer of the coating has high orientation of the basal planes .
20. A coating according to claim 1 8 wherein the at least outer layer includes or comprises Cr2N.
21. A method for the application of a coating to a surface of a printing plate on which an image is etched, said coating including a metal nitride, said method comprising the steps of sputtering nickel or a nickel alloy in a nitrogen atmosphere to produce a metal or alloy nitride structure on the surface to be coated, said material sputtered from a NiCr target in a nitrogen atmosphere, and characterised in that the coating is applied in an oriented manner such that more than 50% of the basal planes of the structure are substantially parallel to the surface of the printing plate to which the coating is applied.
22. A method according to claim 21 wherein the coating includes any, or any combination of, Cr2N, Ni3N, NiCr(N), and are deposited using reactive a CFUBMSIP system.
23. A method according to claim 21 wherein the coating is applied in a thicknes s in the range of 0.5-5 microns.
24. A method according to claim 21 wherein the coating is applied at a temperature in the range of 100 to 400 degrees Celsius.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1210746.2 | 2012-06-18 | ||
GB201210746A GB2504923A (en) | 2012-06-18 | 2012-06-18 | Printing plate having a metal nitride protective layer |
Publications (1)
Publication Number | Publication Date |
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WO2013190293A1 true WO2013190293A1 (en) | 2013-12-27 |
Family
ID=46641068
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/GB2013/051594 WO2013190293A1 (en) | 2012-06-18 | 2013-06-19 | Coating for printing plates |
Country Status (2)
Country | Link |
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GB (1) | GB2504923A (en) |
WO (1) | WO2013190293A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103879167A (en) * | 2014-03-13 | 2014-06-25 | 北京中钞钞券设计制版有限公司 | Printing plate materials and preparing method thereof |
EP3284610A4 (en) * | 2015-04-14 | 2018-12-19 | Think Laboratory Co., Ltd. | Gravure cylinder and manufacturing method thereof |
EP3878659A1 (en) * | 2020-03-09 | 2021-09-15 | Emea Inor Eood | Coated intaglio printed plate |
CN115679279A (en) * | 2021-07-30 | 2023-02-03 | 广东振华科技股份有限公司 | Hard film printing plate and preparation method thereof |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102016201137B4 (en) * | 2016-01-27 | 2018-12-27 | Kba-Metalprint Gmbh | Device for printing hollow bodies |
DE102021002867A1 (en) * | 2021-06-02 | 2022-12-08 | Giesecke+Devrient Currency Technology Gmbh | Extended shelf life intaglio printing plate and method of making same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2258343A (en) | 1990-03-17 | 1993-02-03 | D G Teer Coating Services Limi | Magnetron sputter ion plating |
WO2005110698A2 (en) * | 2004-05-14 | 2005-11-24 | Teer Coatings Limited | Coating with hard wear and non-stick characteristics |
CN101181848A (en) * | 2007-12-27 | 2008-05-21 | 中国印钞造币总公司 | Gravure edition as well as making method and vacuum deposition film-plating apparatus thereof |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE1014623A3 (en) * | 2000-06-17 | 2004-02-03 | Preparation of pad printing plates, by applying coating using physical vapour deposition following etching | |
KR100535113B1 (en) * | 2003-12-18 | 2005-12-07 | 한국조폐공사 | A Photosensitive Polymer-based Relief Printing Plate Having Vapor Deposition Layer Thereon and A Method for Preparing the Same |
EP2514594A1 (en) * | 2011-04-18 | 2012-10-24 | KBA-NotaSys SA | Intaglio printing plate, method of manufacturing the same and use thereof |
-
2012
- 2012-06-18 GB GB201210746A patent/GB2504923A/en not_active Withdrawn
-
2013
- 2013-06-19 WO PCT/GB2013/051594 patent/WO2013190293A1/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2258343A (en) | 1990-03-17 | 1993-02-03 | D G Teer Coating Services Limi | Magnetron sputter ion plating |
WO2005110698A2 (en) * | 2004-05-14 | 2005-11-24 | Teer Coatings Limited | Coating with hard wear and non-stick characteristics |
CN101181848A (en) * | 2007-12-27 | 2008-05-21 | 中国印钞造币总公司 | Gravure edition as well as making method and vacuum deposition film-plating apparatus thereof |
CN101181848B (en) * | 2007-12-27 | 2011-04-06 | 中国印钞造币总公司 | Gravure edition as well as making method and vacuum deposition film-plating apparatus thereof |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103879167A (en) * | 2014-03-13 | 2014-06-25 | 北京中钞钞券设计制版有限公司 | Printing plate materials and preparing method thereof |
EP3284610A4 (en) * | 2015-04-14 | 2018-12-19 | Think Laboratory Co., Ltd. | Gravure cylinder and manufacturing method thereof |
EP3878659A1 (en) * | 2020-03-09 | 2021-09-15 | Emea Inor Eood | Coated intaglio printed plate |
CN115679279A (en) * | 2021-07-30 | 2023-02-03 | 广东振华科技股份有限公司 | Hard film printing plate and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
GB2504923A (en) | 2014-02-19 |
GB201210746D0 (en) | 2012-08-01 |
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