WO2013187426A1 - Pest control method for harmful arthropods - Google Patents

Pest control method for harmful arthropods Download PDF

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Publication number
WO2013187426A1
WO2013187426A1 PCT/JP2013/066134 JP2013066134W WO2013187426A1 WO 2013187426 A1 WO2013187426 A1 WO 2013187426A1 JP 2013066134 W JP2013066134 W JP 2013066134W WO 2013187426 A1 WO2013187426 A1 WO 2013187426A1
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group
compound
reaction
halogen atoms
usually
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PCT/JP2013/066134
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French (fr)
Japanese (ja)
Inventor
竜也 鈴木
岩田 淳
吉彦 野倉
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住友化学株式会社
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Publication of WO2013187426A1 publication Critical patent/WO2013187426A1/en

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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01NPRESERVATION OF BODIES OF HUMANS OR ANIMALS OR PLANTS OR PARTS THEREOF; BIOCIDES, e.g. AS DISINFECTANTS, AS PESTICIDES OR AS HERBICIDES; PEST REPELLANTS OR ATTRACTANTS; PLANT GROWTH REGULATORS
    • A01N25/00Biocides, pest repellants or attractants, or plant growth regulators, characterised by their forms, or by their non-active ingredients or by their methods of application, e.g. seed treatment or sequential application; Substances for reducing the noxious effect of the active ingredients to organisms other than pests
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D263/00Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
    • C07D263/52Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings condensed with carbocyclic rings or ring systems
    • C07D263/54Benzoxazoles; Hydrogenated benzoxazoles
    • C07D263/56Benzoxazoles; Hydrogenated benzoxazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 2
    • C07D263/57Aryl or substituted aryl radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62Benzothiazoles
    • C07D277/64Benzothiazoles with only hydrocarbon or substituted hydrocarbon radicals attached in position 2
    • C07D277/66Benzothiazoles with only hydrocarbon or substituted hydrocarbon radicals attached in position 2 with aromatic rings or ring systems directly attached in position 2
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D471/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D498/00Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D498/02Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D498/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D513/00Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
    • C07D513/02Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
    • C07D513/04Ortho-condensed systems

Definitions

  • the present invention relates to a method for controlling harmful arthropods.
  • Non-Patent Document 1 Conventionally, many compounds have been known as active ingredients used in methods for controlling harmful arthropods (see, for example, Non-Patent Document 1).
  • An object of the present invention is to provide a method for controlling harmful arthropods having an excellent control effect on harmful arthropods.
  • A1 represents -NR6-, an oxygen atom or a sulfur atom
  • R 1, R 2, R 3 and R 4 are the same or different and each have one or more atoms or groups selected from C1-C3 chain hydrocarbon group optionally having one or more halogen atoms and group Z
  • R5 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group X, -OR7, -S (O) mR7, or a halogen atom
  • R5 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group X, -OR7, -S (O
  • -C6 represents an alicyclic hydrocarbon group or a hydrogen atom
  • R7 represents a C1-C3 chain hydrocarbon group which may have one or more halogen atoms or a hydrogen atom
  • m represents 0, 1 or 2
  • n represents 0, 1 or 2.
  • m represents 0, 1 or 2
  • R7 does not represent a hydrogen atom.
  • Group X C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms
  • An optionally substituted C2-C3 alkynyloxy group, a C1-C3 alkylsulfanyl group optionally having one or more halogen atoms, a C1-C3 alkylsulfinyl optionally having one or more halogen atoms A group consisting of a group, a C1-C3 alkylsulfonyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom;
  • Group Z C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, C1-C3 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A C
  • Group W C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms
  • A1 represents -NR6-, an oxygen atom or a sulfur atom
  • R 1, R 2, R 3 and R 4 are the same or different and each have one or more atoms or groups selected from C1-C3 chain hydrocarbon group optionally having one or more halogen atoms and group Z
  • R5 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group X, -OR7, -S (O) mR7, or a halogen atom
  • R6 is a C1-C3 chain hydrocarbon group
  • -C6 represents an alicyclic hydrocarbon group or a hydrogen atom
  • R7 represents a C1-C3 chain hydrocarbon group which may have one or more halogen atoms or a hydrogen atom
  • m represents 0, 1 or 2
  • n represents 0, 1 or 2.
  • m represents 0, 1 or 2
  • R7 does not represent a hydrogen atom.
  • Group X C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms
  • An optionally substituted C2-C3 alkynyloxy group, a C1-C3 alkylsulfanyl group optionally having one or more halogen atoms, a C1-C3 alkylsulfinyl optionally having one or more halogen atoms A group consisting of a group, a C1-C3 alkylsulfonyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom;
  • Group Z C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, C1-C3 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A C
  • Group W C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms
  • [3] The method for controlling harmful arthropods according to [1], wherein 0.01 to 1000 g of the compound represented by the formula (1) is used per 10 kg of plant seeds.
  • -C6 represents an alicyclic hydrocarbon group or a hydrogen atom
  • R7 represents a C1-C3 chain hydrocarbon group which may have one or more halogen atoms or a hydrogen atom
  • m represents 0, 1 or 2
  • n represents 0, 1 or 2.
  • m represents 0, 1 or 2
  • R7 does not represent a hydrogen atom.
  • Group X C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms
  • An optionally substituted C2-C3 alkynyloxy group, a C1-C3 alkylsulfanyl group optionally having one or more halogen atoms, a C1-C3 alkylsulfinyl optionally having one or more halogen atoms A group consisting of a group, a C1-C3 alkylsulfonyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom;
  • Group Z C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, C1-C3 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A C
  • Group W C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms
  • C1-C3 chain hydrocarbon group represents a linear or branched saturated or unsaturated hydrocarbon group having 1 to 3 carbon atoms, such as a methyl group, C1-C3 alkyl groups such as ethyl group, propyl group and isopropyl group; C2-C3 alkenyl groups such as vinyl group, 1-propenyl group, 2-propenyl group and 1-methylvinyl group; ethynyl group, propargyl group, 2- A C2-C3 alkynyl group such as a butynyl group may be mentioned.
  • C1-C2 chain hydrocarbon group represents a methyl group, an ethyl group, a vinyl group, or an ethynyl group.
  • C1-C3 alkyl group represents a linear or branched alkyl group having 1 to 3 carbon atoms, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group. Is mentioned.
  • C1-C2 alkyl group represents a methyl group or an ethyl group.
  • C2-C3 alkenyl group is linear or branched having 2 to 3 carbon atoms, and has one or more double bonds in the molecule.
  • C2-C3 alkynyl group refers to a linear or branched chain having 2 to 3 carbon atoms and having one or more triple bonds in the molecule.
  • a saturated hydrocarbon group is represented, and examples thereof include an ethynyl group and a propargyl group.
  • C1-C3 alkoxy group represents a group represented by a linear or branched alkyl-O— having 1 to 3 carbon atoms, such as a methoxy group or an ethoxy group. , A propyloxy group, and an isopropyloxy group.
  • C2-C3 alkenyloxy group refers to a linear or branched chain having 2 to 3 carbon atoms, and one or more double bonds in the molecule. Represents a group represented by alkenyl-O-, and examples thereof include a vinyloxy group, a 1-propenyloxy group, a 2-propenyloxy group, and a 1-methylvinyloxy group.
  • C2-C3 alkynyloxy group is linear or branched having 2 to 3 carbon atoms, and has one or more triple bonds in the molecule. It represents a group represented by alkynyl-O—, and examples thereof include an ethynyloxy group and a propargyloxy group.
  • C1-C3 alkylsulfanyl group represents a group represented by linear or branched alkyl-S— having 1 to 3 carbon atoms, such as a methylsulfanyl group, Examples thereof include an ethylsulfanyl group, a propylsulfanyl group, and an isopropylsulfanyl group.
  • C1-C3 alkylsulfinyl group represents a group represented by linear or branched alkyl-S (O) — having 1 to 3 carbon atoms. Examples thereof include a sulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, and an isopropylsulfinyl group.
  • C1-C3 alkylsulfonyl group represents a group represented by a linear or branched alkyl-S (O) 2- having 1 to 3 carbon atoms, for example, Examples include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, and an isopropylsulfonyl group.
  • C3-C6 alicyclic hydrocarbon group represents a cyclic non-aromatic hydrocarbon group having 3 to 6 carbon atoms, such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, C3-C6 cycloalkyl group such as cyclohexyl group; C3-C6 cycloalkenyl group such as cyclopropenyl group, cyclobutenyl group, cyclopentenyl group, cyclohexenyl group and the like can be mentioned.
  • C3-C6 cycloalkyl group represents a cyclic alkyl group having 3 to 6 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
  • the expression “which may have one or more atoms or groups selected from group X” means that when it has two or more atoms or groups selected from group X, The atoms or groups selected from group X may be the same as or different from each other.
  • the expression “may have one or more atoms or groups selected from group Z” means that when it has two or more atoms or groups selected from group Z, The atoms or groups selected from group Z may be the same as or different from each other.
  • the expression “may have one or more atoms or groups selected from group W” means that when it has two or more atoms or groups selected from group W, those The atoms or groups selected from group W may be the same as or different from each other.
  • the expression “may have one or more halogen atoms” means that when two or more halogen atoms are present, these halogen atoms may be the same or different from each other. May be.
  • the expression “6-membered heterocyclic group” is a 6-membered heterocyclic compound containing one or more atoms selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom in addition to the carbon atom in the ring structure. Represents a residue, and examples thereof include a 6-membered aromatic heterocyclic group and a 6-membered non-aromatic heterocyclic group.
  • Examples of the “6-membered aromatic heterocyclic group” include a pyrazinyl group, a pyrimidinyl group, a pyridyl group, and a pyridazinyl group.
  • Examples of the “6-membered non-aromatic heterocyclic group” include a piperidyl group, a morpholinyl group, a piperazinyl group, and a thiomorpholinyl group.
  • halogen atom means a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
  • examples of the “C1-C3 chain hydrocarbon group optionally having one or more atoms or groups selected from group X” include a methyl group, an ethyl group, a propyl group, and an isopropyl group.
  • examples of the “C1-C3 chain hydrocarbon group optionally having one or more halogen atoms” include a methyl group, an ethyl group, a propyl group, an isopropyl group, a trifluoromethyl group, It has one or more halogen atoms such as trichloromethyl group, 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, heptafluoroisopropyl group, etc.
  • C1-C3 alkyl group optionally having one or more halogen atoms such as vinyl group, 1-propenyl group, 2-propenyl group, 1-methylvinyl group, 1,1-difluoroallyl group and pentafluoroallyl group Group; C2-C3 alkynyl group which may have one or more halogen atoms of ethynyl group and propargyl group.
  • C2-C3 alkynyl group which may have one or more halogen atoms of ethynyl group and propargyl group.
  • Examples of the “C1-C3 alkyl group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methyl group, an ethyl group, a propyl group, an isopropyl group, a trifluoromethyl group, and a trichloromethyl group. 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, heptafluoroisopropyl group and the like.
  • examples of the “phenyl group optionally having one or more atoms or groups selected from group Z” include a phenyl group, a 2-fluorophenyl group, a 3-fluorophenyl group, 4- Fluorophenyl group, 2,3-difluorophenyl group, 2,4-difluorophenyl group, 2,5-difluorophenyl group, 2,6-difluorophenyl group, 3,4-difluorophenyl group, 3,5-difluorophenyl Group, 2,3,4,5,6-pentafluorophenyl group, 2-chlorophenyl group, 3-chlorophenyl group, 4-chlorophenyl group, 2-bromophenyl group, 3-bromophenyl group, 4-bromophenyl group, 2-iodophenyl group, 3-iodophenyl group, 4-iodophenyl group, 2-trifluorophenyl group, 2-tri
  • examples of the “6-membered heterocyclic group optionally having one or more atoms or groups selected from group Z” include group Z such as piperidyl group, morpholyl group, and thiomorpholyl group.
  • a 6-membered non-aromatic heterocyclic group optionally having one or more atoms or groups selected from: a pyrazinyl group, a 2-pyrimidinyl group, a 4-pyrimidinyl group, a 5-pyrimidinyl group, a 2-pyridyl group, 3 -Pyridyl group, 4-pyridyl group, 3-fluoro-2-pyridyl group, 4-fluoro-2-pyridyl group, 5-fluoro-2-pyridyl group, 6-fluoro-2-pyridyl group, 2-pyrimidinyl group, 6-membered ring which may have one or more atoms or groups selected from group Z such as 4-trifluoromethylpyridin-2-yl group and 5-trifluoromethylpyridin-2-yl group It includes family heterocyclic group.
  • examples of the “C1-C3 chain hydrocarbon group optionally having one or more atoms or groups selected from group W” include a methyl group, an ethyl group, a propyl group, and an isopropyl group.
  • Trifluoromethyl group Trifluoromethyl group, trichloromethyl group, 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, methoxymethyl group, ethoxymethyl group, propyloxy Group W such as methyl group, isopropyloxymethyl group, methoxyethyl group, ethoxyethyl group, propyloxyethyl group, isopropyloxyethyl group, methylsulfanylethyl group, ethylsulfanylethyl group, methylsulfinylethyl group, and methylsulfonylethyl group Having one or more atoms or groups selected from And it may be C1-C3 alkyl group; C2-C3 alkenyl which may have one or more atoms or groups selected from the group W such as vinyl group, 1-prop
  • C3-C6 alicyclic hydrocarbon group optionally having one or more atoms or groups selected from group W includes cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl Group, cyclopropenyl group, cyclobutenyl group, cyclopentenyl group, 1-cyclohexenyl group, 2-cyclohexenyl group and 3-cyclohexenyl group.
  • Examples of the “C1-C3 alkylsulfanyl group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methylsulfanyl group, an ethylsulfanyl group, a propylsulfanyl group, an isopropylsulfanyl group, and trifluoromethyl. Examples thereof include a sulfanyl group, a 2,2,2-trifluoroethylsulfanyl group, and a pentafluoroethylsulfanyl group.
  • Examples of the “C1-C3 alkylsulfinyl group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, an isopropylsulfinyl group, and trifluoromethyl. Examples thereof include a sulfinyl group, a 2,2,2-trifluoroethylsulfinyl group and a pentafluoroethylsulfinyl group.
  • Examples of the “C1-C3 alkylsulfonyl group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, an isopropylsulfonyl group, and trifluoromethyl. Examples include a sulfonyl group, a 2,2,2-trifluoroethylsulfonyl group, and a pentafluoroethylsulfonyl group.
  • Examples of the “C1-C3 alkoxy group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methoxy group, a trifluoromethoxy group, an ethoxy group, and 2,2,2-trifluoroethoxy. Group, propyloxy group and isopropyloxy group.
  • examples of the “C2-C3 alkenyloxy group optionally having one or more halogen atoms” include 2-propenyloxy group, 2-methyl-2-propenyloxy group, 3, 3 -A difluoroallyloxy group and a 3, 3- dichloroallyloxy group are mentioned.
  • Examples of the “C2-C3 alkynyloxy group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a propargyloxy group.
  • one or more means one or more and the maximum number to which atoms or groups can be bonded, unless otherwise specified.
  • Examples of the present condensed heterocyclic compound include the following compounds.
  • A1 is -NR6-, an oxygen atom or a sulfur atom
  • R5 is a C1-C3 having one C1-C3 alkoxy group which may have one or more halogen atoms.
  • a chain hydrocarbon group a compound which is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms;
  • A1 is —NR6-, an oxygen atom or a sulfur atom, A2 is N, and R5 has one C1-C3 alkoxy group which may have one or more halogen atoms.
  • a C1-C3 chain hydrocarbon group a compound which is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms;
  • A1 is -NR6-, an oxygen atom or a sulfur atom
  • R5 is a C1-C3 having one C1-C3 alkoxy group which may have one or more halogen atoms.
  • A1 is —NR 6 — or a sulfur atom
  • R 5 is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms
  • R 6 is a methyl group ;
  • A1 is —NR6-, an oxygen atom or a sulfur atom
  • A2 is N
  • R5 has one C1-C3 alkoxy group which may have one or more halogen atoms.
  • a C1-C3 chain hydrocarbon group, a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, and R6 is a methyl group;
  • A1 is -NR6- or a sulfur atom
  • A2 is N
  • R5 is a C1-C3 chain hydrocarbon group which may have one or more halogen atoms
  • R6 A compound wherein is a methyl group;
  • A1 is —NR6-
  • A2 is N
  • R5 is a C1-C2 chain hydrocarbon group optionally having one or more halogen atoms
  • R6 is a methyl group.
  • A1 is -NR6- or a sulfur atom
  • A2 is N
  • R5 is -S (O) mR7
  • R7 may have one or more halogen atoms.
  • A1 is -NR6- or a sulfur atom
  • R5 is -S (O) mR7
  • R6 is a methyl group
  • R7 may have one or more halogen atoms.
  • a compound which is a C1-C3 chain hydrocarbon group In Formula (1), A1 is —NR6- or a sulfur atom, A2 is N, R5 is —S (O) mR7, R6 is a methyl group, and R7 is one or more halogen atoms.
  • a compound which is a C1-C3 chain hydrocarbon group optionally having; In Formula (1), A1 is a sulfur atom, A2 is N, R5 is -S (O) mR7, R6 is a methyl group, and R7 has one or more halogen atoms.
  • R2, R3 and R4 are the same or different and each is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, -OR7, a halogen atom or a hydrogen atom, A compound wherein R5 is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, -OR7, or a halogen atom; In the formula (1), R2, R3 and R4 are the same or different and may have one or more halogen atoms or a C1-C2 alkyl group which may have one or more halogen atoms.
  • R5 is a 6-membered heterocyclic group optionally having one or more halogen atoms or a C1-C2 alkyl group optionally having one or more halogen atoms.
  • R2, R3 and R4 are the same or different and are a fluorine atom, a chlorine atom, a bromine atom, an iodine atom or a hydrogen atom
  • R5 is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom
  • R2, R3 and R4 are the same or different and are a fluorine atom, a chlorine atom, a bromine atom, a methyl group, a trifluoromethyl group, a trifluoromethoxy group, a pentafluoroethyl group or a hydrogen atom
  • R5 A compound in which is a fluorine atom, a chlorine atom, a bromine atom, a methyl group, a trifluoromethyl group, a trifluoromethoxy group or a pentafluoroeth
  • A1A represents -NR6A-, an oxygen atom or a sulfur atom
  • R1A, R3A and R4A are the same or different and represent a halogen atom or a hydrogen atom (provided that at least two of R1A, R3A and R4A represent a hydrogen atom)
  • R2A has one or more halogen atoms
  • a C1-C3 alkyl group which may have one, a C1-C3 alkoxy group which may have one or more halogen atoms, and a C1-C3 alkyl group which has one or more halogen atoms 6
  • R5A represents a C1-C3 alkyl group optionally having one or more halogen atoms, or -S (O) mR7A
  • R6A represents a C1-NR6A-, an oxygen atom or a sulfur atom
  • A2A represents a nitrogen atom
  • A1B represents -NR6B-, an oxygen atom or a sulfur atom
  • R1B, R3B and R4B are the same or different and represent a fluorine atom, a chlorine atom or a hydrogen atom (provided that at least two of R1B, R3B and R4B represent a hydrogen atom)
  • R2B is a C1-C3 alkyl group (particularly a methyl group, ethyl group or isopropyl group), a C1-C3 alkyl group having one or more halogen atoms (particularly a difluoromethyl group, a trifluoromethyl group, a pentafluoroethyl group, A heptafluoropropyl group, etc.) a C1-C3 alkoxy group having at least one halogen atom (especially a trifluoromethoxy group, etc.), a nitrogen-containing 6-
  • the present condensed heterocyclic compound can be produced, for example, by the following (Production Method A) to (Production Method F).
  • This condensed heterocyclic compound (1) can be produced by reacting the compound (M1) with the compound (M2). Alternatively, it can be produced by reacting the compound (M1) and the compound (M2) to produce the compound (M3) and cyclizing the compound (M3). [Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and n represent the same meaning as described above. ]
  • This condensed heterocyclic compound (1) can be produced by reacting the compound (M1) with the compound (M4). Alternatively, it can be produced by reacting the compound (M1) and the compound (M4) to produce the compound (M3) and cyclizing the compound (M3). [Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and n represent the same meaning as described above. ]
  • This fused heterocyclic compound (1) can be produced by reacting compound (M1) with compound (M5). Alternatively, it can be produced by reacting the compound (M1) and the compound (M5) to produce the compound (M6) and cyclizing the compound (M6). [Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and n represent the same meaning as described above. ]
  • Compound (2) in which A1 is a sulfur atom in formula (1) can be produced by reacting compound (M7) with a sulfurizing agent. [Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
  • the production methods (Production Method A) to (Production Method F) of the present condensed heterocyclic compound will be described in more detail below.
  • a production method from the present condensed heterocyclic compound to another condensed heterocyclic compound will be described.
  • the present condensed heterocyclic compound can be produced, for example, by the following (Production Method 1) to (Production Method 23).
  • Step (C-1) Compound (4) in which A1 is -NR6- in formula (1) can be produced by reacting compound (M12) and compound (M5) according to step (C-1).
  • R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above.
  • the reaction is usually carried out in the presence of a base, acid, sulfite or disulfite.
  • the reaction is usually performed in the presence of a solvent.
  • the base used for the reaction include bicarbonates such as sodium bicarbonate and potassium bicarbonate, carbonates such as sodium carbonate and potassium carbonate, and mixtures thereof.
  • Examples of the acid used for the reaction include sulfonic acids such as p-toluenesulfonic acid and carboxylic acids such as acetic acid.
  • Examples of the sulfite used in the reaction include sodium sulfite and potassium sulfite.
  • Examples of the disulfite used in the reaction include sodium disulfite and potassium disulfite.
  • Examples of the solvent used in the reaction include ethers such as tetrahydrofuran (hereinafter referred to as THF), ethylene glycol dimethyl ether, tert-butyl methyl ether, 1,4-dioxane, and aliphatic hydrocarbons such as hexane, heptane, and octane.
  • Aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, N, N-dimethylformamide (hereinafter referred to as DMF) ), Acid amides such as N-methylpyrrolidone (hereinafter referred to as NMP), sulfoxides such as dimethyl sulfoxide (hereinafter referred to as DMSO), nitrogen-containing aromatic compounds such as pyridine and quinoline, and the like. A mixture is mentioned.
  • the reaction can be carried out by adding an oxidizing agent as necessary.
  • the oxidizing agent used in the reaction examples include oxygen, copper (II) chloride, 2,3-dichloro-5,6-dicyano-p-benzoquinone, and the like.
  • the compound (M5) is usually 1 to 3 mol
  • the base is usually 1 to 5 mol
  • the acid is usually 1 to 5 mol
  • sulfite Is usually used in a proportion of 1 to 5 mol
  • disulfite is usually used in a proportion of 1 to 5 mol
  • oxidizing agent is usually used in a proportion of 1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of 30 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (4) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer.
  • the isolated compound (4) can be further purified by chromatography, recrystallization and the like.
  • Step A-1 Compound (4) in which A1 is —NR6- in formula (1) is produced by reacting compound (M12) and compound (M2) in the presence of a dehydration condensing agent according to step (A-1). can do. [Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, tert-butyl methyl ether, ethylene glycol dimethyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • Examples of the dehydrating condensing agent used in the reaction include 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride (hereinafter referred to as WSC), carbodiimides such as 1,3-dicyclohexylcarbodiimide, (benzotriazole- 1-yloxy) tris (dimethylamino) phosphonium hexafluorophosphate (hereinafter referred to as BOP reagent) and the like.
  • WSC 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride
  • carbodiimides such as 1,3-dicyclohexylcarbodiimide
  • BOP reagent benzotriazole- 1-yloxy tris (dimethylamino) phosphonium hexafluorophosphate
  • This reaction can also be performed by adding a catalyst as needed.
  • Examples of the catalyst used in the reaction include
  • the compound (M2) is usually in a proportion of 1 to 3 mol
  • the dehydrating condensing agent is usually in a proportion of 1 to 5 mol
  • the catalyst is usually in a proportion of 0.01 to 0.1. Used in molar proportions.
  • the reaction temperature of the reaction is usually in the range of 30 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (4) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer. The isolated compound (4) can be further purified by chromatography, recrystallization and the like.
  • the compound (M4) can be used instead of the compound (M2), and the compound (4) can be produced according to the above method.
  • the compound (M4) is usually carried out without adding a dehydrating condensation agent.
  • a base can be added as necessary.
  • the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
  • the compound (M4) is usually used in a proportion of 1 to 3 mol
  • the base is usually used in a proportion of 1 to 10 mol.
  • Step (A-3), Step (B-3) Compound (4) in which A1 is -NR6- in formula (1) can be produced by dehydrating condensation of compound (M13) according to step (A-3) or step (B-3). [Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, methanol, ethanol, propanol , Alcohols such as butanol and pentanol, and mixtures thereof.
  • an acid or a dehydrating agent can be used as necessary.
  • the acid used in the reaction include sulfonic acids such as p-toluenesulfonic acid, and carboxylic acids such as acetic acid.
  • Examples of the dehydrating agent used in the reaction include phosphorus oxychloride, acetic anhydride, trifluoroacetic anhydride, and the like. Can be mentioned.
  • an acid or a dehydrating agent is usually used at a ratio of 1 mol to 10 mol.
  • the reaction temperature of the reaction is usually in the range of 30 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (4) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (4) can be further purified by chromatography, recrystallization and the like.
  • Step (A-3), Step (B-3) Compound (4) in which A1 is -NR6- in formula (1) is produced by reacting compound (M13) in the presence of a base according to step (A-3) or step (B-3). Can do. [Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • the base used for the reaction include tripotassium phosphate.
  • the base is generally used at a ratio of 1 mol to 10 mol with respect to 1 mol of the compound (M13).
  • the reaction temperature of the reaction is usually in the range of 30 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (4) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (4) can be further purified by chromatography, recrystallization and the like.
  • Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
  • Examples of the base used in the reaction include alkali metal or alkali metal hydrides such as sodium hydride, potassium hydride and calcium hydride, inorganic bases such as sodium carbonate and potassium carbonate, or organic bases such as triethylamine. Is mentioned.
  • compound (M14) is usually used at a ratio of 1 to 5 mol per 1 mol of compound (5).
  • the base is usually used at a ratio of 1 to 3 mol with respect to 1 mol of the compound (5).
  • the reaction temperature of the reaction is usually in the range of 0 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (4) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (4) can be further purified by chromatography, recrystallization and the like.
  • Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene and dichlorobenzene, and mixtures thereof.
  • Examples of the acid used for the reaction include polyphosphoric acid and trimethylsilyl polyphosphate. The reaction is usually carried out without a solvent when polyphosphoric acid is used as the acid, but it may be carried out in a solvent.
  • the compound (M2) is usually used in a proportion of 1 to 3 mol, and the acid is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of 50 to 200 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (6) can be isolated by performing post-treatment operations such as pouring the reaction mixture into water, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (6) can be further purified by chromatography, recrystallization and the like.
  • the compound (M4) can replace with a compound (M2) and can use a compound (M4) and can manufacture a compound (6) according to the said method according to a process (B-1).
  • the compound (M4) is usually carried out without adding a dehydrating condensation agent.
  • a base can be added as necessary.
  • the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
  • the compound (M4) is usually used in a proportion of 1 to 3 mol
  • the base is usually used in a proportion of 1 to 10 mol.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • the oxidizing agent is usually used at a ratio of 1 to 3 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (6) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (6) can be further purified by chromatography, recrystallization and the like.
  • Step (A-3), Step (B-3) Compound (6) in which A1 is an oxygen atom in formula (1) is produced by reacting compound (M17) in the presence of a dehydration condensing agent according to step (A-3) or step (B-3).
  • a dehydration condensing agent according to step (A-3) or step (B-3).
  • R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above.
  • the reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, dichloromethane, chloroform, carbon tetrachloride, Examples include halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, and mixtures thereof. Of these, carbon tetrachloride can also be used as a dehydrating condensing agent.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aromatic hydrocarbons such as toluene and xylene
  • dichloromethane chloroform
  • carbon tetrachloride examples include halogenated hydrocarbons
  • Examples of the dehydrating condensing agent used in the reaction include a mixture of triphenylphosphine, a base, and carbon tetrachloride or carbon tetrabromide, a mixture of triphenylphosphine and an azodiester such as azodicarboxylic acid diethyl ester, and the like.
  • Examples of the base used in the reaction include tertiary amines such as triethylamine and diisopropylethylamine.
  • the dehydrating condensing agent is usually used at a ratio of 1 to 3 moles relative to 1 mole of the compound (M17).
  • the base When a base is used, the base is usually used at a ratio of 1 to 5 mol with respect to 1 mol of the compound (M17).
  • the reaction temperature is usually in the range of ⁇ 30 to 100 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (6) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (6) can be further purified by chromatography, recrystallization and the like.
  • Step (A-3), Step (B-3) Compound (6) in which A1 is an oxygen atom in formula (1) can be produced by reacting compound (M17) in the presence of an acid according to step (A-3) or step (B-3). It can. [Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and halogens such as dichloromethane, chloroform, and chlorobenzene. Hydrocarbons and mixtures thereof.
  • Examples of the acid include sulfonic acids such as p-toluenesulfonic acid, polyphosphoric acid, and the like. In the reaction, an acid is usually used at a ratio of 0.1 to 3 mol with respect to 1 mol of the compound (M17).
  • the reaction temperature of the reaction is usually in the range of 50 to 200 ° C.
  • the reaction time is usually in the range of 1 to 24 hours.
  • the compound (6) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (6) can be further purified by chromatography, recrystallization and the like.
  • Examples of the acid used for the reaction include sulfonic acids such as p-toluenesulfonic acid and carboxylic acids such as acetic acid.
  • Examples of the sulfite used in the reaction include sodium sulfite and potassium sulfite.
  • Examples of the disulfite used in the reaction include sodium disulfite and potassium disulfite. The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and halogenation such as chlorobenzene.
  • the reaction can be carried out by adding an oxidizing agent as necessary.
  • the oxidizing agent used in the reaction include oxygen, copper (II) chloride, 2,3-dichloro-5,6-dicyano-p-benzoquinone, and the like.
  • the ratio of the compound (M5) is usually 1 to 3 moles
  • the base is 1 to 5 moles
  • the acid is usually 1 to 5 moles
  • the sulfite is added.
  • 1 to 5 moles disulfite is usually used in 1 to 5 moles
  • oxidizing agent is usually used in 1 to 5 moles.
  • the reaction temperature of the reaction is usually in the range of 50 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (2) can be isolated by performing post-treatment operations such as addition of the reaction mixture to water, extraction with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (2) can also be purified by chromatography, recrystallization and the like.
  • the compound (M5) is usually used at a ratio of 0.5 to 3 moles and the base is usually used at a ratio of 1 to 2 moles relative to 1 mole of the compound (M18).
  • the reaction temperature of the reaction is usually in the range of 50 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (2) can be isolated by performing post-treatment operations such as addition of the reaction mixture to water, extraction with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (2) can also be purified by chromatography, recrystallization and the like.
  • Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, alcohols such as methanol and ethanol, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof.
  • Examples of the cyanating agent used in the reaction include zinc cyanide, and examples of the di (C1-C3 alkyl) zinc include dimethyl zinc, diethyl zinc, and diisopropyl zinc.
  • the palladium compound used for the reaction examples include tetrakis (triphenylphosphine) palladium.
  • the cyanating agent or di (C1-C3 alkyl) zinc is usually in a proportion of 1 to 5 mol
  • the palladium compound is usually in a proportion of 0.01 to 0.5 mol.
  • the reaction temperature of the reaction is usually in the range of 50 to 200 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (8) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (8) can be further purified by chromatography, recrystallization and the like.
  • the compound (M19) is usually used in a proportion of 1 to 10 mol, and copper iodide is usually used in a proportion of 1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of 50 to 200 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (9) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (9) can be further purified by chromatography, recrystallization and the like.
  • Nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof.
  • the base used for the reaction include alkali metal hydrides such as sodium hydride.
  • the reaction temperature of the reaction is usually in the range of 0 to 150 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (3) can be further purified by chromatography, recrystallization and the like.
  • Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
  • Examples of the base used in the reaction include alkali metal or alkaline earth metal hydrides such as sodium hydride, potassium hydride and calcium hydride, inorganic bases such as sodium carbonate and potassium carbonate, and organic bases such as triethylamine. Can be mentioned.
  • the base is usually used at a ratio of 1 to 3 mol
  • the compound (M21) is usually used at a ratio of 1 to 3 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (3) can be further purified by chromatography, recrystallization and the like.
  • the oxidizing agent is used in a proportion of 1 to 1.2 mol with respect to 1 mol of compound (3).
  • the reaction temperature is usually in the range of ⁇ 20 to 80 ° C.
  • the reaction time is usually in the range of 0.1 to 12 hours.
  • the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried,
  • a reducing agent for example, sodium sulfite, sodium thiosulfate
  • a base for example, sodium bicarbonate
  • an oxidizing agent is usually used in a ratio of 2 to 5 mol with respect to 1 mol of the compound (3).
  • the oxidizing agent is used in a ratio of 2 to 3 moles with respect to 1 mole of the compound (3).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 120 ° C.
  • the reaction time is usually in the range of 0.1 to 12 hours.
  • Compound (11) can be isolated by performing post-treatment operations such as concentration.
  • the isolated compound (11) can be further purified by chromatography, recrystallization and the like.
  • the oxidizing agent is usually used at a ratio of 1 to 4 moles relative to 1 mole of the compound (10).
  • the oxidizing agent is used in a ratio of 1 to 2 moles relative to 1 mole of the compound (10).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 120 ° C.
  • the reaction time is usually in the range of 0.1 to 12 hours.
  • Compound (11) can be isolated by performing post-treatment operations such as concentration.
  • the isolated compound (11) can be further purified by chromatography, recrystallization and the like.
  • Step (A-3), Step (B-3) Compound (2) in which A1 is a sulfur atom in formula (1) can be produced by reacting compound (M22) in the presence of an acid according to step (A-3) or step (B-3). It can. [Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and halogens such as dichloromethane, chloroform, and chlorobenzene. Hydrocarbons and mixtures thereof.
  • Examples of the acid used for the reaction include sulfonic acids such as p-toluenesulfonic acid and polyphosphoric acid. In the reaction, an acid is usually used at a ratio of 0.1 to 3 mol with respect to 1 mol of the compound (M22).
  • the reaction temperature of the reaction is usually in the range of 50 to 200 ° C.
  • the reaction time is usually in the range of 1 to 24 hours.
  • the compound (2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (2) can be further purified by chromatography, recrystallization and the like.
  • Examples of the solvent used in the reaction include aromatic hydrocarbons such as toluene and xylene, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof.
  • Examples of the thiolating agent used in the reaction include sodium sulfide, sodium sulfide nonahydrate, and thiourea.
  • Examples of the catalyst used in the reaction include copper (I) chloride, copper (I) bromide, and copper (I) iodide. This reaction can also be performed in presence of a base as needed.
  • Examples of the base used in the reaction include potassium carbonate, cesium carbonate, tripotassium phosphate, and triethylamine.
  • the thiolating agent is usually used in a proportion of 1 to 10 mol
  • the catalyst is usually used in a proportion of 0.1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of 50 to 200 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (12-a) and / or the compound (12-b) is isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. be able to.
  • the isolated compound (12-a) and / or compound (12-b) can be further purified by chromatography, recrystallization and the like.
  • Step (22-2) Compound (13) can be produced by reacting compound (12-a) and / or compound (12-b) with compound (M23) in the presence of a base.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include alcohols such as methanol and ethanol, ethers such as 1,4-dioxane, diethyl ether, THF and tert-butyl methyl ether, dichloromethane, chloroform, carbon tetrachloride, and 1,2.
  • -Halogenated hydrocarbons such as dichloroethane and chlorobenzene, aromatic hydrocarbons such as toluene, benzene and xylene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, DMF, NMP, 1,3-dimethyl
  • aprotic polar solvents such as 2-imidazolidinone and dimethyl sulfoxide
  • nitrogen-containing aromatic compounds such as pyridine and quinoline, water, and mixtures thereof.
  • Examples of the base used in the reaction include pyridine, picoline, 2,6-lutidine, diazabicycloundecene (hereinafter referred to as DBU), 1,5-diazabicyclo [4.3.0] -5-nonene, and the like. And nitrogen-containing heterocyclic compounds, tertiary amines such as triethylamine and N-ethyldiisopropylamine, and inorganic bases such as tripotassium phosphate, potassium carbonate, sodium hydride, sodium hydroxide and potassium hydroxide.
  • DBU diazabicycloundecene
  • the compound (M23) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 5 mol. It is done.
  • the reaction temperature of the reaction is usually in the range of 0 to 120 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (13) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (13) can be further purified by chromatography, recrystallization and the like.
  • Step (22-3) In compound (14), a compound wherein m is 1 or 2 can be produced by subjecting compound (13) to an oxidation reaction.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
  • the oxidizing agent used in the reaction include m-chloroperbenzoic acid or hydrogen peroxide water.
  • the reaction can be carried out in the presence of a catalyst as necessary. Examples of the catalyst used in the reaction include sodium tungstate.
  • the oxidizing agent is usually used at a ratio of 1 to 5 moles.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 120 ° C.
  • the reaction time is usually in the range of 0.1 to 12 hours.
  • a reducing agent for example, sodium sulfite, sodium thiosulfate
  • a base for example, sodium bicarbonate
  • the compound (15) in which R5 is —OR7 can be produced, for example, by the following method.
  • R1, R2, R3, R4, R7, A1, A2, V1, and n represent the same meaning as described above.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
  • Examples of the base used in the reaction include alkali metal or alkaline earth metal hydrides such as sodium hydride, potassium hydride and calcium hydride, inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate, or triethylamine. An organic base is mentioned.
  • This reaction can also be performed by adding a copper compound as necessary.
  • Examples of the copper compound used for the reaction include copper, copper (I) iodide, copper (I) bromide, and copper (I) chloride.
  • the compound (M24) is usually used in a proportion of 1 to 5 mol and the base is usually used in a proportion of 1 to 3 mol with respect to 1 mol of the compound (7).
  • the reaction temperature of the reaction is usually in the range of 20 to 250 ° C.
  • the reaction time is usually in the range of 0.1 to 48 hours.
  • the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture
  • the collected solid can be collected by filtration to isolate compound (15).
  • the isolated compound (15) can be further purified by recrystallization, chromatography or the like.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like
  • Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
  • Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, BOP reagent and the like. This reaction can also be performed by adding a catalyst as needed. Examples of the catalyst used in the reaction include HOBt.
  • the compound (M2) is usually in a proportion of 1 to 3 moles
  • the dehydrating condensing agent is usually in a proportion of 1 to 5 moles
  • the catalyst is usually in a range of 0.01 to 0.1. Used in molar proportions.
  • the reaction temperature of the reaction is usually in the range of 30 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (2) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer. The isolated compound (2) can be further purified by chromatography, recrystallization and the like.
  • the compound (M4) can replace with a compound (M2) and can use a compound (M4) and can manufacture a compound (2) according to the said method according to a process (B-1).
  • the compound (M4) is usually carried out without adding a dehydrating condensation agent.
  • a base can be added as necessary.
  • the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
  • the compound (M4) is usually used in a proportion of 1 to 3 mol
  • the base is usually used in a proportion of 1 to 10 mol.
  • Examples of the solvent used in the reaction include ethers such as 1,4-dioxane, diethyl ether, tetrahydrofuran, tert-butyl methyl ether, and diglyme, and halogenations such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, and chlorobenzene.
  • ethers such as 1,4-dioxane, diethyl ether, tetrahydrofuran, tert-butyl methyl ether, and diglyme
  • halogenations such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, and chlorobenzene.
  • Examples thereof include hydrocarbons, hydrocarbons such as toluene, benzene and xylene, nitriles such as acetonitrile, pyridines such as pyridine, picoline and lutid
  • Examples of the sulfurizing agent used in the reaction include nilin pentasulfide, Lawesson's reagent (2,4-bis- (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide) and the like. Can be mentioned.
  • the amount of the sulfiding agent used for the reaction is usually 1 mol or more per 1 mol of the compound (M7).
  • the reaction temperature of the reaction is usually in the range of 0 ° C. to 200 ° C., and the reaction time is usually in the range of 1 to 24 hours.
  • reaction mixture After completion of the reaction, the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture
  • the collected solid can be collected by filtration to isolate compound (2).
  • the isolated compound (2) can be further purified by recrystallization, chromatography or the like.
  • the intermediate of the present invention can be produced, for example, by the following method.
  • Compound (M12) can be produced by the following method. [Wherein R5, R6 and A2 represent the same meaning as described above. ]
  • Compound (M26) can be produced by reacting compound (M25) in the presence of a nitrating agent. The reaction is usually performed in the presence of a solvent. Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, acetic acid, concentrated sulfuric acid, concentrated nitric acid, water, and mixtures thereof. An example of the nitrating agent used in the reaction is concentrated nitric acid.
  • the nitrating agent is usually used at a ratio of 1 to 3 moles relative to 1 mole of the compound (M25).
  • the reaction temperature is usually in the range of ⁇ 10 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M26) can be isolated by performing post-treatment operations such as pouring the reaction mixture into water, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M26) can be further purified by chromatography, recrystallization and the like.
  • Compound (M12) can be produced by reacting compound (M26) with hydrogen in the presence of a hydrogenation catalyst.
  • the reaction is usually performed in the presence of a solvent under a hydrogen atmosphere of 1 to 100 atm.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether and 1,4-dioxane, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, water And mixtures thereof.
  • the hydrogenation catalyst used in the reaction include transition metal compounds such as palladium carbon, palladium hydroxide, Raney nickel, and platinum oxide.
  • the reaction with respect to 1 mole of the compound (M26), hydrogen is usually used at a ratio of 3 moles, and the hydrogenation catalyst is usually used at a ratio of 0.001 to 0.5 moles.
  • This reaction can also be carried out by adding an acid (such as a base) as necessary.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M12) can be isolated by performing post-treatment operations such as filtration of the reaction mixture, extraction with an organic solvent, if necessary, and drying and concentration of the organic layer.
  • the isolated compound (M12) can be further purified by chromatography, recrystallization and the like.
  • Step (A-2) Compound (M13) can be produced by reacting compound (M12) and compound (M2) in the presence of a dehydration condensing agent according to step (A-2). [Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like
  • Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
  • Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
  • the compound (M2) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 140 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M13) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M13) can be further purified by chromatography, recrystallization and the like.
  • Step (B-2) Compound (M13) can be produced by reacting compound (M12) and compound (M4) in the presence of a base according to step (B-2).
  • a base a base
  • R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • Aromatic hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof It is done.
  • the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
  • the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M13) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M13) can be further purified by chromatography, recrystallization and the like.
  • Compound (M15) can be produced by the following method. [Wherein R5 and A2 represent the same meaning as described above. ]
  • Compound (M28) can be produced by reacting compound (M27) in the presence of a nitrating agent. The reaction is usually performed in the presence of a solvent. Examples of the solvent used in the reaction include aliphatic halogenated hydrocarbons such as chloroform, acetic acid, concentrated sulfuric acid, concentrated nitric acid, water, and mixtures thereof. An example of the nitrating agent used in the reaction is concentrated nitric acid.
  • the nitrating agent is usually used at a ratio of 1 to 3 moles relative to 1 mole of the compound (M27).
  • the reaction temperature is usually in the range of ⁇ 10 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M28) can be isolated by performing post-treatment operations such as pouring the reaction mixture into water, extraction with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M28) can be further purified by chromatography, recrystallization and the like.
  • Compound (M15) can be produced by reacting compound (M28) with hydrogen in the presence of a hydrogenation catalyst.
  • the reaction is usually performed in the presence of a solvent under a hydrogen atmosphere of 1 to 100 atm.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether and 1,4-dioxane, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, water And mixtures thereof.
  • the hydrogenation catalyst used in the reaction include transition metal compounds such as palladium carbon, palladium hydroxide, Raney nickel, and platinum oxide.
  • the reaction hydrogen is usually used in a proportion of 3 mol and a hydrogenation catalyst is usually used in a proportion of 0.001 to 0.5 mol with respect to 1 mol of the compound (M28).
  • This reaction can also be carried out by adding an acid (such as a base) as necessary.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M15) can be isolated by performing post-treatment operations such as filtration of the reaction mixture, extraction with an organic solvent, if necessary, and drying and concentration of the organic layer.
  • the isolated compound (M15) can be further purified by chromatography, recrystallization and the like.
  • Step (C-2) Compound (M16) can be produced by reacting compound (M15) with compound (M5) according to step (C-2).
  • R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include alcohols such as methanol and ethanol, ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and the like. These mixtures are mentioned.
  • compound (M5) is usually used at a ratio of 1 to 3 mol per 1 mol of compound (M15).
  • This reaction can also be performed by adding an acid, a base, or the like, if necessary.
  • the reaction temperature of the reaction is usually in the range of 0 to 150 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M16) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, drying and concentration. The isolated compound (M16) can be further purified by chromatography, recrystallization and the like.
  • Step (A-2) Compound (M17) can be produced by reacting compound (M15) and compound (M2) in the presence of a dehydration condensing agent according to step (A-2). [Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like
  • Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
  • Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
  • the compound (M2) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 140 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M17) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M17) can be further purified by chromatography, recrystallization and the like.
  • Step (B-2) Compound (M17) can be produced by reacting compound (M15) and compound (M4) in the presence of a base according to step (B-2).
  • a base a base
  • R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • Aromatic hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof It is done.
  • Examples of the base used in the reaction include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine. It is done.
  • the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M17) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M17) can be further purified by chromatography, recrystallization and the like.
  • Compound (M18) can be produced by the following method. [Wherein R5 and A2 represent the same meaning as described above. ]
  • Compound (M30) can be produced by reacting compound (M29) with thiourea in the presence of a base. The reaction is usually performed in the presence of a solvent. Examples of the solvent used in the reaction include alcohols such as methanol and ethanol, water, and mixtures thereof. Examples of the base used for the reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
  • thiourea is usually used in a proportion of 0.5 to 3 mol
  • the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M30) can be isolated by post-treatment such as addition of an acid to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M30) can also be purified by chromatography, recrystallization and the like.
  • Compound (M18) can be produced by subjecting compound (M30) to a reduction reaction.
  • the reduction reaction can be performed in the presence of a reducing agent such as iron powder or zinc powder; an acid such as hydrochloric acid or acetic acid; and water.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, Examples thereof include acid amides such as DMF and NMP, and mixtures thereof.
  • the reducing agent is usually used in a proportion of 3 to 10 mol per 1 mol of the compound (M30).
  • the reaction temperature is usually in the range of 0 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M18) can be isolated by performing post-treatment operations such as addition of water to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M18) can also be purified by chromatography, recrystallization, and the like.
  • compound (M9) wherein A1 is -NR6- can be produced by reacting compound (M12) with compound (M31) in the presence of a base.
  • a base for reacting compound (M12) with compound (M31) in the presence of a base.
  • R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above.
  • the reaction is usually performed in the presence of a solvent.
  • the base used in the reaction include hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate, carbonates such as sodium carbonate and potassium carbonate, sulfites such as sodium sulfite and potassium sulfite, and mixtures thereof.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • the compound (M33) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M33) can be further purified by chromatography, recrystallization and the like.
  • Step (E-1) In compound (M10), compound (M33) in which A1 is —NR6- is obtained by reacting compound (M12) and compound (M8) in the presence of a dehydration condensing agent according to step (E-1). Can be manufactured. [Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, tert-butyl methyl ether, ethylene glycol dimethyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, tert-butyl methyl ether, ethylene glycol dimethyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like
  • Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
  • Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, BOP reagent and the like. This reaction can also be performed by adding a catalyst as needed. Examples of the catalyst used in the reaction include HOBt.
  • the compound (M8) is usually in a proportion of 1 to 3 mol
  • the dehydrating condensing agent is usually in a proportion of 1 to 5 mol
  • the catalyst is usually in a proportion of 0.01 to 0.1. Used in molar proportions.
  • the reaction temperature of the reaction is usually in the range of 30 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M33) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M33) can be further purified by chromatography, recrystallization and the like.
  • Step (E-3) In compound (M10), compound (M33) wherein A1 is -NR6- can be produced by subjecting compound (M32) to dehydration condensation according to step (E-3). [Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, methanol, ethanol, propanol , Alcohols such as butanol and pentanol, and mixtures thereof.
  • an acid or a dehydrating agent can be used as necessary.
  • the acid used in the reaction include sulfonic acids such as p-toluenesulfonic acid, and carboxylic acids such as acetic acid.
  • Examples of the dehydrating agent used in the reaction include phosphorus oxychloride, acetic anhydride, trifluoroacetic anhydride, and the like. Can be mentioned.
  • an acid or a dehydrating agent is usually used at a ratio of 1 mol to 10 mol.
  • the reaction temperature of the reaction is usually in the range of 30 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M33) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M33) can be further purified by chromatography, recrystallization and the like.
  • Step (E-3) In compound (M10), compound (M33) in which A1 is —NR6- can be produced by reacting compound (M32) in the presence of a base according to step (E-3). [Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M33) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M33) can be further purified by chromatography, recrystallization and the like.
  • Step (E-2) Compound (M32) can be produced by reacting compound (M12) and compound (M8) in the presence of a dehydration condensing agent according to step (E-2). [Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like
  • Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
  • Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
  • the compound (M8) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 140 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M32) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M32) can be further purified by chromatography, recrystallization and the like.
  • Compound (M32) can be produced by reacting compound (M12) with compound (M34) in the presence of a base.
  • a base wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • Aromatic hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof It is done.
  • the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
  • the compound (M34) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M32) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M32) can be further purified by chromatography, recrystallization and the like.
  • Step I15-1 Compound (M36) can be produced by reacting compound (M35) with compound (M20) in the presence of a base. The reaction is usually performed in the presence of a solvent.
  • Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
  • Examples of the base used for the reaction include alkali metal hydrides such as sodium hydride. In the reaction, with respect to 1 mol of the compound (M35), the compound (M20) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 150 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (M36) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M36) can be further purified by chromatography, recrystallization and the like.
  • Step I15-2) Compound (M37) can be produced by subjecting compound (M36) to a reduction reaction.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and halogenated carbonization such as dichloromethane and chloroform.
  • Examples include hydrogens and mixtures thereof.
  • the reducing agent used in the reaction include diisobutylaluminum hydride.
  • the reducing agent is usually used at a ratio of 1 to 2 moles relative to 1 mole of the compound (M36).
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 100 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (M37) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M37) can be further purified by chromatography, recrystallization and the like.
  • Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples thereof include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
  • the base used for the reaction include alkali metal hydrides such as sodium hydride. In the reaction, with respect to 1 mol of the compound (M38), the compound (M20) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 150 ° C.
  • the reaction time is usually in the range of 0.5 to 24 hours.
  • the compound (M37) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M37) can be further purified by chromatography, recrystallization and the like.
  • Step I17-1 The reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, alcohols such as methanol and ethanol, water, and a mixture thereof.
  • the base used for the reaction examples include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
  • the base is generally used at a ratio of 1 to 10 mol per 1 mol of the compound (M36).
  • the reaction temperature of the reaction is usually in the range of 0 to 120 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M39) can be isolated by performing post-treatment operations such as acidification of the reaction mixture, extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. .
  • the isolated compound (M39) can be further purified by chromatography, recrystallization and the like.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
  • the oxidizing agent used in the reaction include m-chloroperbenzoic acid or hydrogen peroxide water.
  • the reaction can be carried out in the presence of a catalyst as necessary. Examples of the catalyst used for the reaction include sodium tungstate. In the reaction, with respect to 1 mole of the compound (M36), the oxidizing agent is usually used at a ratio of 1 to 5 moles.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 120 ° C.
  • the reaction time is usually in the range of 0.1 to 12 hours.
  • the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried,
  • a reducing agent for example, sodium sulfite, sodium thiosulfate
  • a base for example, sodium bicarbonate
  • Step I17-3 The reaction is usually performed in the presence of a solvent.
  • a solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, alcohols such as methanol and ethanol, water, and a mixture thereof.
  • the base used for the reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide. In the reaction, the base is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (M40).
  • the reaction temperature of the reaction is usually in the range of 0 to 120 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the reaction mixture is acidified, and then the compound (M41) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. .
  • the isolated compound (M41) can be further purified by chromatography, recrystallization, and the like.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
  • the oxidizing agent used in the reaction include m-chloroperbenzoic acid or hydrogen peroxide water.
  • the reaction can be carried out in the presence of a catalyst as necessary. Examples of the catalyst used for the reaction include sodium tungstate. In the reaction, with respect to 1 mol of the compound (M39), the oxidizing agent is usually used at a ratio of 1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 120 ° C.
  • the reaction time is usually in the range of 0.1 to 12 hours.
  • the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried,
  • a reducing agent for example, sodium sulfite, sodium thiosulfate
  • a base for example, sodium bicarbonate
  • compound (M39) in which n is 0 can be produced by subjecting compound (M36) to a hydrolysis reaction in the presence of an acid.
  • the reaction is usually carried out using an aqueous acid solution as a solvent.
  • the acid used for the reaction include mineral acids such as hydrochloric acid, nitric acid, phosphoric acid and sulfuric acid, and carboxylic acids such as acetic acid and trifluoroacetic acid.
  • the reaction temperature of the reaction is usually in the range of 0 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M39) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M39) can be further purified by chromatography, recrystallization and the like.
  • Compound (M4) can be produced by chlorinating compound (M2) in the presence of a chlorinating agent.
  • a chlorinating agent e.g., benzyl ether, benzyl ether, benzyl ether, benzyl ether, benzyl ether, benzyl ether, benzyl ether, benzyl ether, benzyl ether, benzyl ether, ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and halogenated carbonization such as dichloromethane and chloroform. Examples include hydrogens and mixtures thereof.
  • Examples of the chlorinating agent used in the reaction include thionyl chloride and oxalyl dichloride.
  • the chlorinating agent is usually used at a ratio of 1 to 5 mol per 1 mol of the compound (M2).
  • the reaction temperature of the reaction is usually in the range of 0 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours. After completion of the reaction, the compound (M4) can be isolated by removing the solvent.
  • the compound (M45) in which A2 is a nitrogen atom can be produced, for example, by the following method.
  • R5 and R6 represent the same meaning as described above, and Xg represents a halogen atom such as a chlorine atom, a bromine atom or an iodine atom.
  • Compound (M43) can be produced by reacting compound (M42) with compound (M46). The reaction is usually performed in the presence or absence of a solvent.
  • Examples of the solvent used in the reaction include water, alcohols such as methanol and ethanol, ethers such as 1,4-dioxane, diethyl ether and THF, esters such as ethyl acetate and butyl acetate, dichloromethane, chloroform and tetrachloride.
  • Examples include carbon, halogenated hydrocarbons such as 1,2-dichloroethane, nitriles such as acetonitrile, aprotic polar solvents such as DMF, NMP, and dimethyl sulfoxide, nitrogen-containing aromatic compounds such as pyridine and quinoline, and mixtures thereof. It is done.
  • This reaction can also be performed by adding a base as necessary.
  • Examples of the base used in the reaction include nitrogen-containing heterocyclic compounds such as pyridine, picoline, 2,6-lutidine, DBU, 1,5-diazabicyclo [4.3.0] -5-nonene, triethylamine, and N-ethyl. Tertiary amines such as diisopropylamine, and inorganic bases such as potassium carbonate, cesium carbonate, sodium hydroxide and the like.
  • the compound (M46) is usually used at a ratio of 1 to 5 mol per 1 mol of the compound (M42).
  • the reaction temperature of the reaction is usually in the range of 0 to 200 ° C., and the reaction time is usually in the range of 0.1 to 24 hours.
  • the reaction mixture After completion of the reaction, the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture
  • the collected solid can be collected by filtration to isolate the compound (M43).
  • the isolated compound (M43) can be further purified by recrystallization, chromatography or the like.
  • Compound (M44) can be produced by reacting compound (M43) with a halogenating agent.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used for the reaction include water, acetic acid, 1,4-dioxane, diethyl ether, THF and other ethers, ethyl acetate, butyl acetate and other esters, dichloromethane, chloroform, carbon tetrachloride, 1,2- Examples thereof include halogenated hydrocarbons such as dichloroethane, nitriles such as acetonitrile, aprotic polar solvents such as DMF and NMP, and mixtures thereof.
  • halogenating agent used in the reaction examples include chlorinating agents such as N-chlorosuccinimide and chlorine, brominating agents such as N-bromosuccinimide and bromine, and chlorinating agents such as N-iodosuccinimide and iodine.
  • the halogenating agent is usually used in a proportion of 1 to 3 mol per 1 mol of the compound (M43).
  • the reaction temperature of the reaction is usually in the range of ⁇ 10 to 100 ° C., and the reaction time is usually in the range of 0.1 to 24 hours.
  • reaction mixture After completion of the reaction, the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture
  • the collected solid can be collected by filtration to isolate the compound (M44).
  • the isolated compound (M44) can be further purified by recrystallization, chromatography or the like.
  • Compound (M45) can be produced by reacting compound (M44) with an aminating agent in the presence of a copper compound.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include water, alcohols such as methanol and ethanol, ethers such as 1,4-dioxane, diethyl ether and THF, esters such as ethyl acetate and butyl acetate, dichloromethane, chloroform and tetrachloride.
  • Carbon, halogenated hydrocarbons such as 1,2-dichloroethane, nitriles such as acetonitrile, aprotic polar solvents such as DMF, NMP, and dimethyl sulfoxide, nitrogen-containing aromatic compounds such as pyridine and quinoline, and mixtures thereof Can be mentioned.
  • the aminating agent used in the reaction include ammonia, aqueous ammonia, and lithium amide.
  • Examples of the copper compound used in the reaction include copper, copper (I) iodide, copper (I) oxide, copper (II) oxide, acetylacetone copper (II), copper acetate (II), and copper (II) sulfate. It is done.
  • This reaction can also be performed by adding a ligand as necessary.
  • the ligand used in the reaction include acetylacetone, salen, and phenanthroline.
  • This reaction can also be performed by adding a base as necessary.
  • the base used in the reaction include nitrogen-containing heterocyclic compounds such as pyridine, picoline, 2,6-lutidine, DBU, 1,5-diazabicyclo [4.3.0] -5-nonene, triethylamine, and N-ethyl.
  • examples include tertiary amines such as diisopropylamine, and inorganic bases such as tripotassium phosphate, potassium carbonate, cesium carbonate, and sodium hydroxide.
  • the aminating agent is usually used in a proportion of 1 to 5 mol
  • the copper compound is usually used in a proportion of 0.02 to 0.5 mol per 1 mol of the compound (M44).
  • a base is used in a proportion of 1 to 5 mol if necessary.
  • the reaction temperature of the reaction is usually in the range of 30 to 200 ° C.
  • the reaction time is usually in the range of 0.1 to 48 hours.
  • the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture
  • the collected solid can be collected by filtration to isolate compound (M45).
  • the isolated compound (M45) can be further purified by recrystallization, chromatography or the like.
  • Step (A-2) Compound (M22) can be produced by reacting compound (M18) and compound (M2) in the presence of a dehydration condensing agent according to step (A-2). [Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ] The reaction is usually performed in the presence of a solvent.
  • solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane
  • aliphatic hydrocarbons such as hexane, heptane, and octane
  • aromatics such as toluene and xylene.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like
  • Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
  • Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
  • the compound (M2) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 140 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M22) can be isolated by performing post-treatment operations such as water addition to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M22) can be further purified by chromatography, recrystallization and the like.
  • Step (B-2) Compound (M22) can be produced by reacting compound (M18) and compound (M4) in the presence of a base according to step (B-2).
  • a base a base
  • R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • Aromatic hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof It is done.
  • Examples of the base used in the reaction include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine. It is done.
  • the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
  • the reaction temperature of the reaction is usually in the range of ⁇ 20 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M22) can be isolated by performing post-treatment operations such as water addition to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M22) can be further purified by chromatography, recrystallization and the like.
  • Step (E-1) Compound (M47) in which A1 is an oxygen atom in compound (M10) can be produced by reacting compound (M15) with compound (M8) according to step (E-1). [Wherein R 1, R 2, R 3, R 4, R 5, A 2, n and V 2 represent the same meaning as described above. ] Compound (M47) can be produced according to the method described in (Production Method 6) using compound (M8) in place of compound (M2).
  • Step (E-2) Compound (M48) in which A1 is an oxygen atom in compound (M9) can be produced by reacting compound (M15) with compound (M8) according to step (E-2).
  • compound (M49) in which A1 is a sulfur atom in compound (M9) can be produced by reacting compound (M18) with compound (M8).
  • R1, R2, R3, R4, R5, A2 and V2 represent the same meaning as described above.
  • Compound (M48) can be produced according to the method described in (Intermediate Production Method 6) using Compound (M8) instead of Compound (M2).
  • Compound (M49) can be produced according to the method described in (Intermediate Production Method 21) using Compound (M8) instead of Compound (M2).
  • Step (E-3) Compound (M47) wherein A1 is an oxygen atom in compound (M10) can be produced by cyclizing compound (M48) according to step (E-3). Moreover, the compound (M50) in which A1 is a sulfur atom in the compound (M10) can be produced by cyclizing the compound (M49) according to the step (E-3). [Wherein, R1, R2, R3, R4, R5, A2 and V2 represent the same meaning as described above. ] Using compound (M48) instead of compound (M17), compound (M47) can be produced according to the method described in (Production Method 8) or (Production Method 9). The compound (M50) can be produced according to the method described in (Production Method 21) using the compound (M49) instead of the compound (M22).
  • Step (F-1) Compound (M11) can be produced by reacting compound (M10) with sodium sulfide, sodium hydrogen sulfide or hydrogen sulfide according to step (F-1). [Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and V 2 represent the same meaning as described above. ] Compound (M11) can be produced according to the method described in (Production Process 16) using sodium sulfide, sodium hydrogen sulfide or hydrogen sulfide instead of compound (M20). When sodium sulfide or sodium hydrogen sulfide is used, it is usually carried out without adding a base.
  • Compound (M7) can be produced by reacting compound (M51) with compound (M2). [Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
  • Compound (M51) can be produced by subjecting compound (M29) to a reduction reaction.
  • the reduction reaction can be performed in the presence of a reducing agent such as iron powder or zinc powder; an acid such as hydrochloric acid or acetic acid; and water.
  • the reaction is usually performed in the presence of a solvent.
  • the solvent used in the reaction examples include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, Examples thereof include acid amides such as DMF and NMP, and mixtures thereof.
  • the reducing agent is usually used in a proportion of 3 to 10 mol per 1 mol of the compound (M29).
  • the reaction temperature is usually in the range of 0 to 100 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M51) can be isolated by post-treatment such as addition of water to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer.
  • the isolated compound (M51) can also be purified by chromatography, recrystallization, and the like.
  • the reaction is usually performed in the presence or absence of a solvent.
  • the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene.
  • Group hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like
  • Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
  • Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
  • the compound (M2) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
  • the reaction temperature of the reaction is usually in the range of 0 to 140 ° C.
  • the reaction time is usually in the range of 0.1 to 24 hours.
  • the compound (M7) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M7) can be further purified by chromatography, recrystallization and the like.
  • the compound (M4) can replace with a compound (M2) and a compound (M4) can be used, and a compound (M7) can also be manufactured according to the said method.
  • the compound (M4) is usually carried out without adding a dehydrating condensing agent.
  • a base can be added as necessary.
  • the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
  • the compound (M4) is usually used in a proportion of 1 to 3 mol
  • the base is usually used in a proportion of 1 to 10 mol.
  • Compound (M1) can be produced by reacting compound (M52) with an aminating agent. [Wherein, Xg, R5, A1 and A2 represent the same meaning as described above. ] Compound (M1) can be produced according to the method described in Step (I20-3) of (Intermediate Production Method 20) using Compound (M52) instead of Compound (M44).
  • R1 to R5, A1, A2, and n represent symbols in the compound represented by the formula (1).
  • the fused heterocyclic compound can be used as it is, but usually, the fused heterocyclic compound and an inert carrier are mixed, and if necessary, a surfactant or other formulation adjuvant. Is added to an emulsion, flowable agent, wettable powder, powder or the like.
  • the amount of the present condensed heterocyclic compound in the preparation containing the present condensed heterocyclic compound is usually in the range of 01% to 70% by weight, preferably 1 to 60% by weight, more preferably 5 to 50% by weight.
  • examples of the inert carrier used for formulation include a solid carrier and a liquid carrier.
  • examples of the solid support include clays (kaolin clay, diatomaceous earth, bentonite, fusami clay, acidic clay), synthetic hydrous silicon oxide, talc, ceramic, and other inorganic minerals (sericite, quartz, sulfur, activated carbon, calcium carbonate).
  • polyester resin such as nylon-6, nylon-11, nylon-66, polyamide resin, polyvinyl chloride, polyvinylidene chloride, vinyl chloride-propylene copolymer).
  • liquid carriers examples include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone, etc.), aromatic hydrocarbons.
  • alcohols methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.
  • ketones acetone, methyl ethyl ketone, cyclohexanone, etc.
  • aromatic hydrocarbons examples include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.
  • ketones acetone, methyl ethyl ket
  • Acid amides N, N-dimethylformamide, N, N-dimethylacetamide, etc.
  • halogenated hydrocarbons diichloromethane, trichloroethane, carbon tetrachloride, etc.
  • sulfoxides dimethylsulfoxide, etc.
  • propylene carbonate and vegetable oil Soybean oil, cottonseed oil, etc.
  • surfactant examples include nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyethylene glycol fatty acid ester, and the like, and alkyl sulfonate, alkyl benzene sulfonate, and alkyl sulfate.
  • nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyethylene glycol fatty acid ester, and the like
  • alkyl sulfonate alkyl benzene sulfonate
  • alkyl sulfate alkyl sulfate.
  • An ionic surfactant is mentioned.
  • formulation adjuvants include fixing agents, dispersants, colorants and stabilizers, such as casein, gelatin, saccharides (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), PAP (isopropyl acid phosphate), BHT (2,6-di-tert-butyl-4-methylphenol), BHA (2-tert- And a mixture of butyl-4-methoxyphenol and 3-tert-butyl-4-methoxyphenol).
  • fixing agents such as casein, gelatin, saccharides (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), PAP (iso
  • the harmful arthropod that can be controlled by the method of the present invention is a plant seed treated with the present condensed heterocyclic compound or a pest that damages the plant body after the plant seed germinates.
  • harmful arthropods include harmful insects, and specifically include the following.
  • Hemiptera pests Loondelphax striatellus, Japanese brown planthopper (Nilaparvata lugens), Japanese green planthopper (Sogellaella fursifera), etc .; ), Radish aphids (Brevicoryne brassicae), tulip beetle aphids (Macrosiphum euphorbiae), potato beetle aphids (Aulacorthum solani), wheat beetle aphids (Rhopalosiphumpa) Shi class, order Hemiptera (Nezara antennata), bombardier helicopter stink bug (Riptortus clavetus), spider helicopter bug (Leptocorisa chinensis), thorns Shirahoshi bug (Eysarcoris parvus), stink bugs such as brown marmorated stink bug (Halyomorpha mista), greenhouse whitefly (Trialeurodes vaporariorum ), White
  • Lepidoptera rice stem borer (Chilo suppressalis), Sankameiga (Tryporyza incertulas), leaf roller (Cnaphalocrocis medinalis), Watanomeiga (Notarcha derogata), Indian meal moth (Plodia interpunctella), the European corn borer (Ostrinia furnacalis), high Madara Roh moth (Hellula undalis), etc.
  • Thrips of the order Thrips thrips (Franklinella occidentalis), Thrips palmi, etc.
  • Diptera seedcorn maggot (Delia platura), onion maggot (Delia antiqua) Anthomyiidae such as, rice leafminer (Agromyza oryzae), rice Hime leafminer (Hydrellia griseola), tomato leafminer, (Liriomyza sativae), legume leafminer (Liriomyza trifolii) , Leafworms such as Chlamatomya horticola, and leafworms such as Chlorops oryzae.
  • Anthomyiidae such as, rice leafminer (Agromyza oryzae), rice Hime leafminer (Hydrellia griseola), tomato leafminer, (Liriomyza sativae), legume leafminer (Liriomyza trifolii) ,
  • Leafworms such as Chlamatomya horticola, and leafworms such as Chlorops oryzae.
  • Coleoptera pests Western Corn Rootworm (Diabrotica virgifera virgifera), corn rootworm such as southern corn rootworm (Diabrotica undecimpunctata howardi), cupreous chafer (Anomala cuprea), rufocuprea (Anomala rufocuprea), chafers such as Japanese beetle (Popillia japonica) Weevil such as weevil (Sitophilus zeamais), rice weevil (Lissohoptrus oryzophilus), weevil (Echinocnemus squameus), weevil (Anthonomus grandis), etc.
  • Weevil such as weevil (Sitophilus zeamais), rice weevil (Lissohoptrus oryzophilus), weevil (Echinocnemus squameus), weevil (Anthonomus grandis), etc.
  • Worms (Oulema oryzae), cucurbit leaf beetle (Aulacophora femoralis), Kisujinomihamushi (Phyllotreta striolata), Chrysomelidae such as Colorado potato beetle (Leptinotarsa decemlineata), click beetles such (Agriotes spp.), And Aoba ants backlash Staphylinidae (Paederus fuscipes).
  • seeds of the following “crop” can be treated with the present condensed heterocyclic compound.
  • Agricultural crops corn, rice, wheat, barley, rye, oat, sorghum, cotton, soybean, peanut, buckwheat, sugar beet, rapeseed, sunflower, tobacco, etc.
  • Vegetables Solanum vegetables (eggplants, tomatoes, peppers, peppers, potatoes, etc.), Cucurbitaceae vegetables (cucumbers, pumpkins, zucchini, watermelons, melons, etc.), cruciferous vegetables (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage) , Mustard, broccoli, cauliflower, etc.), asteraceae vegetables (burdock, shungiku, artichoke, lettuce, etc.), liliaceae vegetables (leek, onion, garlic, asparagus), celeryaceae vegetables (carrot, parsley, celery, American scallop, etc.) ), Red crustacean vegetables (spinach, chard, etc.), perilla vegetables (perilla, mint, basil).
  • Crop includes genetically modified crops.
  • a plant seed treated with the present condensed heterocyclic compound retains an effective amount of the present condensed heterocyclic compound in the interior or surface of the plant seed or a coating formed on the periphery of the plant seed.
  • the plant seed treatment method may take various forms, for example, a spraying process in which the present condensed heterocyclic compound is sprayed on the seed surface, a smearing process in which the present condensed heterocyclic compound is applied to the seed, an immersion process, A film coat process and a pellet coat process are mentioned.
  • a plant seed means the seed of the plant of the state before sowing to soil or the culture medium to grow.
  • the amount of the present condensed heterocyclic compound used for such plant seeds can vary depending on the type of plant, the type and occurrence of harmful arthropods to be controlled, the form of preparation, sowing time, weather conditions, etc. Is usually 0.01 to 1000 g, preferably 0.2 to 200 g, more preferably 1 to 10 g. The amount is usually 0.01 to 1000 mg, preferably 0.1 to 100 mg, per 100 plant seeds.
  • the present fused heterocyclic compound can be mixed with one or more compounds selected from the following group (A) and treated to plant seeds.
  • A-1 Neonicotinoid imidacloprid, clothianidin, thiamethoxam, dinotefuran, acetamiprid, thiacloprid and nitenpyram
  • A-2 synthetic pyrethroid acrinathrin, bifenthrin, cycloprotorin, cyfluthrin, beta-cyfluthrin, cihalothrin, lambda cihalothrin, cancer Masihalothrin, cypermethrin, alpha cypermethrin, beta cypermethrin, theta cypermethrin, zetacypermethrin, deltamethrin, etofenprox, fenpropatoline, fenvalerate, esfenvalerate, flucitrinate, fulvalinate, taufulvalinate , Halfenprox, Permethrin,
  • A-6 Other insecticides Pymetrozine, pyridalyl, pyriproxyfen, spirotetramat, sulfoxafurol and flupiradifurone
  • A-7 azoletebuconazole, metconazole, difenoconazole, triticonazole, imazalyl, triadimenol, fluquinconazole, prochloraz, prochiraz Oconazole, diniconazole, diniconazole M, cyproconazole, tetraconazole, ipconazole, trifolin, pyrifenox, phenarimol, nuarimol, oxpoconazole fumarate, pefazoate, triflumizole, azaconazole, vitertanol, bromconazole, Epoxyconazole, fenbuconazole, flusilazole, flutriazole, hexaconazole, imibenconazole, micro But
  • Compound A-13 represented by: Other fungicides fludioxonil, ethaboxam, tolcrofosmethyl and captan A-14: Other compounds 4-oxo-4-[(2-phenylethyl) amino] -butyric acid,
  • This condensed heterocyclic compound 8 1H-NMR (CDCl3) ⁇ : 8.73 (1H, d), 8.28 (1H, d), 8.22 (1H, dd), 7.83 (1H, td), 7.69 (1H, td), 7.50 (1H, dd), 4.60-4.48 (1H, m), 3.38-3.26 (1H, m), 3.05-2.95 (1H, m) , 1.77-1.71 (6H, m), 1.27 (3H, t)
  • This condensed heterocyclic compound 9 1H-NMR (CDCl3) ⁇ : 8.71 (1H, d), 8.24-8.22 (2H, m), 7.85-7.78 (2H, m), 7.55-7.52 (1H, m), 4.33-4.26 (1H, m), 3.72-3.62 (1H, m), 3.44-3.34 (1H, m), 1.77-1 .69 (6H, m), 1.28 (3H, t)
  • the present condensed heterocyclic compound 10 1H-NMR (CDCl3) ⁇ : 8.74 (1H, s), 8.31 (1H, s), 7.53-7.47 (3H, m), 7.39-7.31 (1H, m ), 3.55-3.49 (1H, m), 2.90 (2H, q), 1.25 (3H, t), 1.01-0.94 (2H, m), 0.93- 0.86 (2H, m)
  • This condensed heterocyclic compound 11 1H-NMR (CDCl3) ⁇ : 8.77 (1H, d), 8.29-8.26 (2H, m), 7.85-7.79 (2H, m), 7.72-7.67 (1H, m), 3.57-3.51 (1H, m), 3.49-3.39 (1H, m), 3.09-2.95 (1H, m), 1.34 (3H , T), 1.29-1.16 (1H, m), 1.09-0.92 (2H, m), 0.80-0.65 (1H, m)
  • This condensed heterocyclic compound 12 1H-NMR (CDCl3) ⁇ : 8.76 (1H, s), 8.27-8.22 (2H, m), 7.87-7.78 (2H, m), 7.65 (1H, dd) ), 3.60 (2H, brs), 3.39-3.33 (1H, m), 1.29 (3H, t), 1.11-1.11 (2H, m), 0.93 ( 2H, brs).
  • the present condensed heterocyclic compound 14 1H-NMR (CDCl3) ⁇ : 8.62 (1H, s), 8.26-8.23 (2H, m), 7.83 (1H, td), 7.70 (1H, td), 7. 62 (1H, dd), 6.90 (1H, t), 3.89 (3H, s), 3.42-3.32 (1H, m), 3.02-2.92 (1H, m) , 1.30 (3H, t)
  • This condensed heterocyclic compound 15 1H-NMR (CDCl3) ⁇ : 8.61 (1H, s), 8.24-8.19 (2H, m), 7.87-7.78 (2H, m), 7.58 (1H, dd) ), 6.89 (1H, t), 3.71 (3H, s), 3.43 (2H, q), 1.25 (3H, t)
  • Production Example 17 A mixture of 1.64 g of 2-ethylsulfanyl-N- (2-methylamino-5-trifluoromethylphenyl) -benzamide, 1.76 g of p-toluenesulfonic acid monohydrate and 50 ml of xylene at 150 ° C. for 1 hour, Stir with heating to reflux. To the reaction mixture cooled to room temperature, a saturated aqueous sodium hydrogen carbonate solution was poured, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over sodium sulfate, and concentrated under reduced pressure.
  • the obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanylphenyl) -1-methyl-5-trifluoromethyl-1H-benzimidazole (hereinafter referred to as the present condensed heterocyclic compound 17). 1.40 g was obtained.
  • the present condensed heterocyclic compound 17 1H-NMR (CDCl3) ⁇ : 8.12-8.10 (1H, m), 7.61-7.58 (1H, m), 7.53-7.44 (4H, m), 7.38 ⁇ 7.32 (1H, m), 3.69 (3H, s), 2.84 (2H, q), 1.22 (3H, t)
  • the present condensed heterocyclic compound 18 1H-NMR (CDCl3) ⁇ : 8.24-8.20 (1H, m), 8.10-8.07 (1H, m), 7.83-7.78 (1H, m), 7.70 -7.62 (2H, m), 7.57-7.51 (2H, m), 3.79 (3H, s), 3.36-3.26 (1H, m), 2.98-2 .88 (1H, m), 1.26 (3H, t)
  • the obtained residue was subjected to silica gel column chromatography to obtain 0.98 g of 2- (2-ethylsulfanylphenyl) -5-trifluoromethylbenzoxazole (hereinafter referred to as the present condensed heterocyclic compound 20).
  • the present condensed heterocyclic compound 20 1H-NMR (CDCl3) ⁇ : 8.19-8.15 (2H, m), 7.71-7.67 (1H, m), 7.66-7.63 (1H, m), 7.52 -7.47 (1H, m), 7.45-7.42 (1H, m), 7.31-7.27 (1H, m), 3.06 (2H, q), 1.44 (3H , T)
  • the present condensed heterocyclic compound 23 0.53 g of [5,4-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 23) was obtained.
  • the present condensed heterocyclic compound 23 1H-NMR (CDCl3) ⁇ : 8.67 (1H, s), 8.40 (1H, s), 8.25 (1H, d), 7.53 (1H, t), 7.45 (1H, d), 7.32 (1H, t), 3.08 (2H, q), 1.45 (3H, t)
  • the present condensed heterocyclic compound 24 1H-NMR (CDCl3) ⁇ : 8.73-8.72 (1H, m), 8.41-8.38 (2H, m), 8.36-8.33 (1H, m), 7.90 -7.84 (1H, m), 7.74-7.69 (1H, m), 3.45-3.35 (1H, m), 3.00-2.90 (1H, m), 1 .40 (3H, t)
  • the obtained residue was subjected to silica gel column chromatography to obtain 0.50 g of 2- (2-ethylsulfanylphenyl) -5-trifluoromethylbenzothiazole (hereinafter referred to as the present condensed heterocyclic compound 26).
  • the present condensed heterocyclic compound 26 1H-NMR (CDCl3) ⁇ : 8.41-8.39 (1H, m), 8.06-8.00 (2H, m), 7.66-7.62 (1H, m), 7.55 -7.51 (1H, m), 7.48-7.42 (1H, m), 7.37-7.32 (1H, m), 2.96 (2H, q), 1.33 (3H , T)
  • the present condensed heterocyclic compound 28 1H-NMR (CDCl3) ⁇ : 8.33-8.31 (1H, m), 8.26-8.23 (1H, m), 8.10-8.06 (1H, m), 7.81 -7.69 (4H, m), 3.75 (2H, q), 1.36 (3H, t)
  • This condensed heterocyclic compound 29 1H-NMR (CDCl3) ⁇ : 8.70 (1H, d), 8.29 (1H, d), 8.27 (1H, d), 7.84 (1H, t), 7.71 (1H, t), 7.60 (1H, d), 3.90 (3H, s), 3.43-3.33 (1H, m), 3.04-2.94 (1H, m), 1.31 (3H, t)
  • This condensed heterocyclic compound 31 1.05 g was obtained.
  • This condensed heterocyclic compound 31 1H-NMR (CDCl3) ⁇ : 8.70-8.68 (1H, m), 8.31-8.28 (1H, m), 7.43-7.38 (1H, m), 7.17 -7.13 (1H, m), 7.04-6.98 (1H, m), 3.75 (3H, s), 2.89 (2H, q), 1.26 (3H, t)
  • the present condensed heterocyclic compound 32 1H-NMR (CDCl3) ⁇ : 8.76-8.75 (1H, m), 8.31-8.30 (1H, m), 8.01-7.98 (1H, m), 7.65 -7.61 (1H, m), 7.41-7.36 (1H, m), 3.90 (3H, s), 3.47-3.37 (1H, m), 3.04-2 .94 (1H, m), 1.33 (3H, t)
  • This condensed heterocyclic compound 33 1H-NMR (CDCl3) ⁇ : 8.76-8.74 (1H, m), 8.29-8.27 (1H, m), 7.97-7.94 (1H, m), 7.60 -7.51 (2H, m), 3.72 (3H, s), 3.44 (2H, q), 1.28 (3H, t)
  • the obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine.
  • the present condensed heterocyclic compound 34 1.10 g was obtained.
  • the present condensed heterocyclic compound 34 1H-NMR (CDCl3) ⁇ : 8.75-8.73 (1H, m), 8.35-8.33 (1H, m), 7.70-7.68 (1H, m), 7.62 -7.56 (2H, m), 3.79 (3H, s), 2.95 (2H, q), 1.28 (3H, t)
  • the present condensed heterocyclic compound 36 1H-NMR (CDCl3) ⁇ : 8.68 (1H, d), 8.29-8.24 (2H, m), 7.87-7.81 (1H, m), 7.74-7.68 (1H, m), 7.61 (1H, dd), 3.91 (3H, s), 3.43-3.32 (1H, m), 3.05-2.94 (1H, m), 1.31 (3H, t)
  • the present condensed heterocyclic compound 37 1H-NMR (CDCl3) ⁇ : 8.67 (1H, d), 8.26-8.22 (2H, m), 7.87-7.81 (2H, m), 7.59-7.55 (1H, m), 3.73 (3H, s), 3.43 (2H, q), 1.26 (3H, t).
  • Trifluoromethylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 38) 0.51 g
  • 2- (2- Ethylsulfonyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as this condensed heterocyclic compound) 39 and referred to.) was obtained 0.26g.
  • the present condensed heterocyclic compound 38 1H-NMR (CDCl3) ⁇ : 8.79-8.78 (1H, m), 8.57-8.55 (1H, m), 8.35-8.34 (1H, m), 7.97 -7.94 (1H, m), 7.77 (1H, d), 3.94 (3H, s), 3.53-3.43 (1H, m), 3.07-2.98 (1H) , M), 1.36 (3H, t)
  • the present condensed heterocyclic compound 39 1H-NMR (CDCl3) ⁇ : 8.78-8.76 (1H, m), 8.51-8.49 (1H, m), 8.31-8.30 (1H, m), 8.12 -8.09 (1H, m), 7.74 (1H, d), 3.74 (3H, s), 3.48 (2H, q), 1.29 (3H, t)
  • Production Example 40 A mixture of 0.56 g of 3-amino-5- (trifluoromethyl) pyridine-2-thiol, 0.52 g of 2-ethylsulfanylbenzoic acid, 0.80 g of WSC, 39 mg of HOBt and 6 ml of pyridine was stirred at 60 ° C. for 2 hours. Water was poured into the reaction mixture allowed to cool, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
  • the present condensed heterocyclic compound 41 1H-NMR (CDCl3) ⁇ : 8.90 (1H, d), 8.49 (1H, d), 8.37 (1H, dd), 7.99 (1H, dd), 7.81 (1H, td), 7.67 (1H, td), 3.52-3.42 (1H, m), 3.01-2.92 (1H, m), 1.45 (3H, t).
  • the present condensed heterocyclic compound 42 1H-NMR (CDCl3) ⁇ : 8.92 (1H, d), 8.52 (1H, d), 8.25 (1H, dd), 7.84-7.71 (3H, m), 3. 73 (2H, q), 1.37 (3H, t).
  • Methylsulfanyl-3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 43) and 2- (2-ethylsulfinyl-phenyl) -6-trifluoromethylsulfanyl- 3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 44) was obtained.
  • the present condensed heterocyclic compound 43 1H-NMR (CDCl3) ⁇ : 8.68 (1H, d), 8.36 (1H, d), 8.21 (1H, dd), 7.87-7.77 (2H, m), 7.
  • the present condensed heterocyclic compound 45 1H-NMR (CDCl3) ⁇ : 8.77 (1H, d), 8.55 (1H, d), 8.24 (1H, dd), 7.90-7.83 (2H, m), 7. 61 (1H, dd), 3.75 (3H, s), 3.43 (2H, q), 1.26 (3H, t)
  • the present condensed heterocyclic compound 46 1H-NMR (CDCl3) ⁇ : 9.05 (1H, d), 8.65 (1H, d), 8.26-8.23 (1H, m), 7.90-7.85 (2H, m ), 7.61-7.57 (1H, m), 3.77 (3H, s), 3.41 (2H, q), 1.27 (3H, t)
  • the obtained residue was subjected to silica gel column chromatography to give 2- [2-ethylsulfanyl-4- (trifluoromethyl) phenyl] -6- (trifluoromethyl) thiazolo [5,4-b] pyridine (hereinafter, This is referred to as the present condensed heterocyclic compound 47.) 0.11 g was obtained.
  • the present condensed heterocyclic compound 47 1H-NMR (CDCl3) ⁇ : 8.90 (1H, d), 8.61 (1H, d), 8.14 (1H, d), 7.75 (1H, s), 7.58 (1H, d), 3.04 (2H, q), 1.38 (3H, t).
  • the present condensed heterocyclic compound 52 1H-NMR (CDCl3) ⁇ : 8.71-8.70 (1H, m), 8.50-8.49 (1H, m), 8.38-8.36 (1H, m), 8.12 -8.08 (1H, m), 7.74-7.71 (1H, m), 3.72 (3H, s), 3.49 (2H, q), 1.29 (3H, t).
  • the obtained residue was dissolved in a mixed solution of 7.5 mL of DMF and 30 mL of toluene, and 837 mg of p-toluenesulfonic acid was added at room temperature. The mixture was heated and stirred at 130 ° C. for 8 hours, and then allowed to cool to room temperature. Saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography. This is referred to as the present condensed heterocyclic compound 54.) 97 mg was obtained.
  • the present condensed heterocyclic compound 54 1H-NMR (CDCl3) ⁇ : 12.08-11.87 (1H, m), 8.31 (1H, s), 8.12-7.44 (4H, m), 7.42-7.30 (2H, m), 2.86 (2H, q), 1.22 (3H, t).
  • the present condensed heterocyclic compound 55 1H-NMR (CDCl3) ⁇ : 8.73-8.71 (1H, m), 8.33-8.32 (1H, m), 7.59 (1H, d), 7.50-7.47 (1H, m), 7.30 (1H, d), 3.77 (3H, s), 2.91 (2H, q), 1.27 (3H, t).
  • the present condensed heterocyclic compound 56 1H-NMR (CDCl3) ⁇ : 8.77-8.75 (1H, m), 8.39 (1H, d), 8.32-8.31 (1H, m), 7.84-7.81 (1H, m), 7.49 (1H, d), 3.91 (3H, s), 3.50-3.40 (1H, m), 3.06-2.96 (1H, m), 1.35 (3H, t).
  • the present condensed heterocyclic compound 57 1H-NMR (CDCl3) ⁇ : 8.77-8.75 (1H, m), 8.37 (1H, d), 8.31-8.29 (1H, m), 7.9-7.96. (1H, m), 7.44 (1H, d), 3.72 (3H, s), 3.44 (2H, q), 1.28 (3H, t).
  • the present condensed heterocyclic compound 58 1H-NMR (CDCl3) ⁇ : 8.77-8.74 (1H, m), 8.38-8.36 (1H, m), 8.30-8.27 (1H, m), 8.00 -7.95 (1H, m), 7.63-7.55 (1H, m), 7.43 (1H, d), 7.41-7.30 (2H, m), 3.72 (3H , S), 3.44 (2H, q), 1.28 (3H, t).
  • the residue was subjected to silica gel column chromatography, and 2- (2-ethylsulfonyl-4-trifluoromethyl-phenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed complex). 9.1 g was obtained.
  • the present condensed heterocyclic compound 60 1H-NMR (DMSO-D6) ⁇ : 14.15 (1H, brs), 8.83 (1H, s), 8.58 (1H, s), 8.41 (1H, d), 8.37 ( 1H, s), 8.19 (1H, d), 3.97 (2H, q), 1.23 (3H, t).
  • the residue was subjected to silica gel column chromatography, and the resulting crystals were washed with hexane to give 2- (2-ethylsulfonyl-phenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine.
  • the present condensed heterocyclic compound 62 2.5 g was obtained.
  • the present condensed heterocyclic compound 62 1H-NMR (CDCl3) ⁇ : 8.63 (1H, s), 8.35 (1H, s), 8.24 (1H, d), 8.09 (1H, d), 7.83 (1H, t), 7.76 (1H, t), 3.33 (2H, q), 0.88 (3H, t).
  • the present condensed heterocyclic compound 63 0.47 g, 2- (2-ethanesulfonyl-4-trifluoromethoxyphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5 -B] 0.14 g of pyridine (hereinafter referred to as the present condensed heterocyclic compound 64) was obtained.
  • the present condensed heterocyclic compound 64 1H-NMR (CDCl3) ⁇ : 8.77-8.75 (1H, m), 8.30-8.28 (1H, m), 8.09-8.07 (1H, m), 7.70 ⁇ 7.66 (1H, m), 7.63 (1H, d), 3.74 (3H, s), 3.46 (2H, q), 1.28 (3H, t).
  • Production Example 66-1 A mixture of 0.50 g of 2-amino-4-trifluoromethylphenol, 0.71 g of 2-ethylsulfanyl-4-trifluoromethylbenzoic acid, 0.65 g of WSC and 6 ml of chloroform was stirred at room temperature for 3.5 hours. Saturated aqueous ammonium chloride solution was poured into the reaction mixture, and the mixture was extracted with chloroform. The organic layer was washed with a saturated aqueous sodium bicarbonate solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure.
  • the obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfonyl-4-trifluoromethylphenyl) -5-trifluoromethylbenzoxazole (hereinafter referred to as the present condensed heterocyclic compound 130). .34 g was obtained.
  • the present condensed heterocyclic compound 130 1 H-NMR (CDCl 3 ) ⁇ : 8.54 (1H, s), 8.18-8.12 (2H, m), 8.08 (1H, dd), 7.77-7.74 (2H M), 3.90 (2H, q), 1.44 (3H, t).
  • the present condensed heterocyclic compound 66 1H-NMR (CDCl3) ⁇ : 8.51 (1H, s), 8.22 (1H, s), 7.55-7.50 (2H, m), 7.47-7.43 (1H, m ), 7.38-7.32 (1H, m), 5.81 (1H, dq), 3.76 (3H, s), 2.88 (2H, q), 1.24 (3H, t) .
  • This condensed heterocyclic compound 68 1H-NMR (CDCl3) ⁇ : 8.53 (1H, s), 8.26-8.16 (2H, m), 7.88-7.78 (2H, m), 7.59-7.53 (1H, m), 5.82 (1H, dq), 3.70 (3H, s), 3.44 (2H, q), 1.26 (3H, t).
  • This condensed heterocyclic compound 69 1H-NMR (CDCl3) ⁇ : 8.68 (1H, d), 8.29 (1H, d), 7.74-7.68 (1H, m), 7.49-7.40 (2H, m ), 3.73 (3H, s), 2.74 (2H, q), 1.06 (3H, t).
  • the present condensed heterocyclic compound 70 1H-NMR (CDCl3) ⁇ : 8.64 (1H, s), 8.24 (1H, s), 7.65 (1H, d), 7.58 (1H, t), 7.39 (1H, d), 3.72 (3H, s), 3.63-3.47 (1H, m), 3.37-3.22 (1H, m), 1.38-1.30 (3H, m) .
  • the present condensed heterocyclic compound 72 1H-NMR (CDCl3) ⁇ : 8.78-8.76 (1H, m), 8.33-8.31 (1H, m), 8.20 (1H, d), 7.81-7.78 (1H, m), 7.60 (1H, d), 3.93 (3H, s), 3.42-3.32 (1H, m), 3.02-2.92 (1H, m), 1.31 (3H, t).
  • the present condensed heterocyclic compound 76 1H-NMR (CDCl3) ⁇ : 8.73-8.72 (1H, m), 8.28-8.26 (1H, m), 7.84-7.78 (1H, m), 7.55 -7.49 (1H, m), 7.38-7.35 (1H, m), 3.77 (3H, s), 3.50-3.34 (2H, m), 1.34 (3H , T).
  • the present condensed heterocyclic compound 78 1H-NMR (CDCl3) ⁇ : 8.79-8.76 (1H, m), 8.35-8.32 (1H, m), 8.03 (1H, d), 7.87-7.80 (1H, m), 7.43 (1H, t), 3.84 (3H, d), 3.51-3.40 (1H, m), 3.13-3.02 (1H, m), 1.33 (3H, t).
  • This condensed heterocyclic compound 80 1H-NMR (CDCl3) ⁇ : 8.71-8.69 (1H, m), 8.31-8.30 (1H, m), 7.35-7.31 (2H, m), 7.19 -7.15 (1H, m), 3.76 (3H, s), 2.85 (2H, q), 2.46 (3H, s), 1.22 (3H, t).
  • the present condensed heterocyclic compound 85 1H-NMR (CDCl3) ⁇ : 8.78-8.76 (1H, m), 8.47-8.46 (1H, m), 8.31-8.30 (1H, m), 8.10 -8.07 (1H, m), 7.76 (1H, d), 3.76 (3H, s), 3.48 (2H, q), 1.28 (3H, t).
  • the present condensed heterocyclic compound 86 1H-NMR (CDCl3) ⁇ : 8.51 (1H, d), 8.19 (1H, d), 7.53-7.42 (3H, m), 7.38-7.29 (1H, m ), 3.73 (3H, s), 2.97-2.83 (4H, m), 1.33-1.19 (6H, m).
  • the present condensed heterocyclic compound 87 1H-NMR (CDCl3) ⁇ : 8.96 (1H, d), 8.54 (1H, d), 8.28-8.18 (1H, m), 7.91-7.80 (2H, m ), 7.63-7.55 (1H, m), 3.74 (3H, s), 3.43 (2H, q), 3.24 (2H, q), 1.38 (3H, t) , 1.26 (3H, t).
  • the present condensed heterocyclic compound 91 1H-NMR (CDCl3) ⁇ : 8.93 (1H, d), 8.52 (1H, d), 8.25 (1H, d), 7.78 (1H, dd), 7.67 (1H, d), 3.76 (2H, q), 1.40 (3H, t).
  • This condensed heterocyclic compound 92 1H-NMR (CDCl3) ⁇ : 8.89 (1H, d), 8.56 (1H, d), 7.56-7.42 (3H, m), 7.39-7.33 (1H, m ), 3.77 (3H, s), 2.89 (2H, q), 1.25 (3H, t).
  • This condensed heterocyclic compound 93 1H-NMR (CDCl3) ⁇ : 8.93 (1H, d), 8.53 (1H, d), 8.26 (1H, dd), 7.84 (1H, td), 7.71 (1H, td), 7.60 (1H, dd), 3.89 (3H, s), 3.42-3.32 (1H, m), 3.05-2.96 (1H, m), 1.31 (3H, t).
  • This condensed heterocyclic compound 94 1H-NMR (CDCl3) ⁇ : 8.91 (1H, d), 8.50 (1H, d), 8.23 (1H, dd), 7.87-7.80 (2H, m), 7.
  • the present condensed heterocyclic compound 96 1H-NMR (CDCl3) ⁇ : 8.09 (1H, s), 7.59-7.42 (5H, m), 7.37-7.31 (1H, m), 3.69 (3H, s) ), 2.85 (2H, q), 1.23 (3H, t).
  • This condensed heterocyclic compound 97 1H-NMR (CDCl3) ⁇ : 8.22 (1H, d), 8.07 (1H, s), 7.80 (1H, t), 7.67 (1H, t), 7.62-7. 52 (3H, m), 3.79 (3H, s), 3.37-3.26 (1H, m), 3.01-2.89 (1H, m), 1.27 (3H, t) .
  • the present condensed heterocyclic compound 100 1H-NMR (CDCl3) ⁇ : 8.69-8.68 (1H, m), 8.28-8.26 (1H, m), 8.07-8.05 (1H, m), 7.50 -7.48 (2H, m), 3.89 (3H, s), 3.44-3.33 (1H, m), 3.01-2.92 (1H, m), 2.58 (3H , S), 1.32 (3H, t).
  • the present condensed heterocyclic compound 102 1H-NMR (CDCl3) ⁇ : 8.81 (1H, d), 8.55 (1H, d), 8.07-8.00 (1H, m), 7.59-7.53 (1H, m ), 7.52-7.45 (1H, m), 7.41-7.33 (1H, m), 2.99 (2H, q), 1.35 (3H, t).
  • This condensed heterocyclic compound 103 1H-NMR (CDCl3) ⁇ : 8.85 (1H, d), 8.59 (1H, d), 8.15 (1H, d), 7.75 (1H, s), 7.59 (1H, d), 3.05 (2H, q), 1.38 (3H, t).
  • the condensed heterocyclic compound 104 1H-NMR (CDCl3) ⁇ : 8.87 (1H, d), 8.50 (1H, d), 8.28-8.22 (1H, m), 7.85-7.76 (2H, m ), 7.74-7.70 (1H, m), 3.74 (2H, q), 1.37 (3H, t).
  • the present condensed heterocyclic compound 105 1H-NMR (CDCl3) ⁇ : 8.90 (1H, s), 8.57-8.49 (2H, m), 8.07 (1H, d), 7.88 (1H, d), 3. 77 (2H, q), 1.40 (3H, t).
  • This condensed heterocyclic compound 106 1H-NMR (CDCl3) ⁇ : 8.93 (1H, d), 8.61 (1H, d), 7.45-7.34 (3H, m), 2.91 (2H, q), 1. 27 (3H, t).
  • the present condensed heterocyclic compound 107 1H-NMR (CDCl3) ⁇ : 8.95 (1H, d), 8.55 (1H, d), 8.14 (1H, dd), 7.86 (1H, dd), 7.73 (1H, t), 3.40 (2H, q), 1.28 (3H, t).
  • the present condensed heterocyclic compound 108 1H-NMR (CDCl3) ⁇ : 8.74-8.72 (1H, m), 8.28-8.26 (1H, m), 8.05-8.03 (1H, m), 7.67 ⁇ 7.64 (1H, m), 7.46 (1H, d), 3.71 (3H, s), 3.41 (2H, q), 2.88 (2H, q), 1.37 ( 3H, t), 1.26 (3H, t).
  • the present condensed heterocyclic compound 109 1H-NMR (CDCl3) ⁇ : 8.78-8.76 (1H, m), 8.46-8.44 (1H, m), 8.31-8.30 (1H, m), 8.09 -8.05 (1H, m), 7.76 (1H, d), 3.75 (3H, s), 3.48 (2H, q), 1.27 (3H, t).
  • the present condensed heterocyclic compound 110 1H-NMR (CDCl3) ⁇ : 8.69 (1H, s), 8.33 (1H, s), 8.25 (1H, dd), 8.21 (1H, dd), 7.73-7.
  • the present condensed heterocyclic compound 116 1H-NMR (CDCl3) ⁇ : 8.74-8.72 (1H, m), 8.28-8.25 (1H, m), 8.07-8.05 (1H, m), 7.69 -7.66 (1H, m), 7.47 (1H, d), 3.72 (3H, s), 3.41 (2H, q), 3.18-3.10 (1H, m), 1.37 (6H, d), 1.26 (3H, t).
  • the present condensed heterocyclic compound 120 1H-NMR (CDCl3) ⁇ : 8.71-8.69 (1H, m), 8.27-8.26 (1H, m), 8.09-8.07 (1H, m), 7.70 ⁇ 7.66 (1H, m), 7.62 (1H, d), 3.74 (3H, s), 3.47 (2H, q), 1.28 (3H, t).
  • This condensed heterocyclic compound 121 1H-NMR (CDCl3) ⁇ : 8.11 (1H, s), 7.67 (1H, s), 7.61-7.56 (3H, m), 7.53 (1H, d), 3. 70 (3H, s), 2.93 (2H, q), 1.28 (3H, t).
  • the present condensed heterocyclic compound 122 1H-NMR (CDCl3) ⁇ : 8.53 (1H, d), 8.09 (1H, s), 7.93 (1H, dd), 7.74 (1H, d), 7.64 (1H, d), 7.59 (1H, d), 3.85 (3H, s), 3.51-3.40 (1H, m), 3.06-2.97 (1H, m), 1.32 (3H, t).
  • This condensed heterocyclic compound 128 1 H-NMR (CDCl 3 ) ⁇ : 8.53 (1H, s), 8.19-8.13 (2H, m), 8.07 (1H, dd), 7.77 (1H, dd), 7.69 (1H, d), 3.91 (2H, q), 1.44 (3H, t).
  • Formulation Example 1 20 parts of one of the condensed heterocyclic compounds 1-131, 35 parts of a mixture of white carbon and polyoxyethylene alkyl ether sulfate ammonium salt (weight ratio 1: 1) and water are mixed to make a total amount of 100 parts. Each preparation is obtained by finely pulverizing by a wet pulverization method.
  • Formulation Example 2 After mixing 40 parts of this condensed heterocyclic compound 1-131, 1.5 parts of sorbitan trioleate and 28 parts of an aqueous solution containing 2 parts of polyvinyl alcohol, and finely pulverizing them by a wet pulverization method, An aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added to make a total amount of 90 parts, and further 10 parts of propylene glycol is added and mixed by stirring to obtain each preparation.
  • Formulation Example 3 By thoroughly pulverizing and mixing 10 parts of one of the condensed heterocyclic compounds 1-131, 3 parts of calcium lignin sulfonate, 2 parts of sodium lauryl sulfate, and the remainder of the synthetic silicon hydroxide, 100 parts of each wettable powder Get.
  • Test example 1 This condensed heterocyclic compound 3, 31, 39, 41, 42, 46, 48, 51, 56, 58, 64, 69, 72, 74, 78, 83, 91, 97, 104, 105, 107, 108, 109 , 120, 127, and 131 are dissolved in acetone (manufactured by Wako Pure Chemical Industries) containing 5% (W / V) Sorgen TW-20 (Daiichi Kogyo Seiyaku Co., Ltd.) so as to have a predetermined concentration.
  • acetone manufactured by Wako Pure Chemical Industries
  • W / V Sorgen TW-20
  • harmful arthropods can be controlled.

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Abstract

A pest control method for harmful arthropods uses a compound represented by formula (1) [in the formula, each symbol indicates the definition provided in the description] to treat plant seeds. Provided is a pest control method for harmful arthropods that exhibits a superior pest control effect against harmful arthropods.

Description

有害節足動物の防除方法How to control harmful arthropods
 本発明は、有害節足動物の防除方法に関する。 The present invention relates to a method for controlling harmful arthropods.
 従来、有害節足動物の防除方法において、用いられる有効成分として、多くの化合物が知られている(例えば、非特許文献1参照。)。 Conventionally, many compounds have been known as active ingredients used in methods for controlling harmful arthropods (see, for example, Non-Patent Document 1).
 本発明は、有害節足動物に対する優れた防除効力を有する有害節足動物の防除方法を提供することを課題とする。 An object of the present invention is to provide a method for controlling harmful arthropods having an excellent control effect on harmful arthropods.
 本発明者等は、有害節足動物に対する優れた防除効力を有する有害節足動物の防除方法を見出すべく検討した結果、下記式(1)で示される化合物で植物種子を処理することにより、有害節足動物を防除することができることを見出した。 As a result of studying to find a method for controlling harmful arthropods having an excellent control effect on harmful arthropods, the present inventors have found that harmful effects can be obtained by treating plant seeds with a compound represented by the following formula (1). It has been found that arthropods can be controlled.
 本発明は、以下の[1]~[4]を提供するものである。
[1] 式(1)
Figure JPOXMLDOC01-appb-I000003
[式中、
A1は−NR6−、酸素原子又は硫黄原子を表し、
A2は窒素原子又は=CH−を表し、
R1、R2、R3及びR4は同一又は相異なり、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、群Zより選ばれる1個以上の原子もしくは基を有していてもよいフェニル基、群Zより選ばれる1個以上の原子もしくは基を有していてもよい6員複素環基、−OR7、−S(O)mR7、ハロゲン原子、又は水素原子を表し(但し、R1、R2、R3及びR4のうち、少なくとも2つは水素原子を表す。)、
R5は、群Xより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、−OR7、−S(O)mR7、又はハロゲン原子を表し、
R6は群Wより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、群Wより選ばれる1個以上の原子もしくは基を有していてもよいC3−C6脂環式炭化水素基又は水素原子を表し、
R7は、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基又は水素原子を表し、
mは0、1又は2を表し、nは0、1又は2を表す。
ここで、−S(O)mR7において、mが1又は2の場合には、R7が水素原子を表すことはない。
群X:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ヒドロキシ基及びハロゲン原子からなる群。
群Z:1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ニトロ基及びハロゲン原子からなる群。
群W:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、ハロゲン原子及びヒドロキシ基からなる群。]で示される化合物で植物種子を処理する有害節足動物の防除方法。
The present invention provides the following [1] to [4].
[1] Formula (1)
Figure JPOXMLDOC01-appb-I000003
[Where:
A1 represents -NR6-, an oxygen atom or a sulfur atom,
A2 represents a nitrogen atom or = CH-,
R 1, R 2, R 3 and R 4 are the same or different and each have one or more atoms or groups selected from C1-C3 chain hydrocarbon group optionally having one or more halogen atoms and group Z An optionally substituted phenyl group, a 6-membered heterocyclic group optionally having one or more atoms or groups selected from group Z, -OR7, -S (O) mR7, a halogen atom, or a hydrogen atom; (However, at least two of R1, R2, R3 and R4 represent a hydrogen atom.),
R5 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group X, -OR7, -S (O) mR7, or a halogen atom;
R6 is a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group W, and C3 which may have one or more atoms or groups selected from group W. -C6 represents an alicyclic hydrocarbon group or a hydrogen atom,
R7 represents a C1-C3 chain hydrocarbon group which may have one or more halogen atoms or a hydrogen atom,
m represents 0, 1 or 2, and n represents 0, 1 or 2.
Here, in -S (O) mR7, when m is 1 or 2, R7 does not represent a hydrogen atom.
Group X: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms An optionally substituted C2-C3 alkynyloxy group, a C1-C3 alkylsulfanyl group optionally having one or more halogen atoms, a C1-C3 alkylsulfinyl optionally having one or more halogen atoms A group consisting of a group, a C1-C3 alkylsulfonyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom;
Group Z: C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, C1-C3 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A C1-C3 alkylsulfanyl group optionally having one or more, a C1-C3 alkylsulfinyl group optionally having one or more halogen atoms, a C1-C3 optionally having one or more halogen atoms A group consisting of an alkylsulfonyl group, a cyano group, a nitro group and a halogen atom.
Group W: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms A group consisting of a C2-C3 alkynyloxy group, a halogen atom and a hydroxy group, which may be ] The control method of the harmful arthropod which treats a plant seed with the compound shown by this.
[2] 式(1)
Figure JPOXMLDOC01-appb-I000004
[式中、
A1は−NR6−、酸素原子又は硫黄原子を表し、
A2は窒素原子又は=CH−を表し、
R1、R2、R3及びR4は同一又は相異なり、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、群Zより選ばれる1個以上の原子もしくは基を有していてもよいフェニル基、群Zより選ばれる1個以上の原子もしくは基を有していてもよい6員複素環基、−OR7、−S(O)mR7、ハロゲン原子、又は水素原子を表し(但し、R1、R2、R3及びR4のうち、少なくとも2つは水素原子を表す。)、
R5は、群Xより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、−OR7、−S(O)mR7、又はハロゲン原子を表し、
R6は群Wより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、群Wより選ばれる1個以上の原子もしくは基を有していてもよいC3−C6脂環式炭化水素基又は水素原子を表し、
R7は、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基又は水素原子を表し、
mは0、1又は2を表し、nは0、1又は2を表す。
ここで、−S(O)mR7において、mが1又は2の場合には、R7が水素原子を表すことはない。
群X:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ヒドロキシ基及びハロゲン原子からなる群。
群Z:1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ニトロ基及びハロゲン原子からなる群。
群W:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、ハロゲン原子及びヒドロキシ基からなる群。]で示される化合物で処理されてなる植物種子。
[3] 植物種子10kgに対し、式(1)で示される化合物0.01~1000gを用いる[1]に記載の有害節足動物の防除方法。
[4] 植物種子が、トウモロコシ、ワタ、ダイズ、テンサイ、ナタネ、ダイコン又はイネの種子である[1]又は[3]に記載の有害節足動物の防除方法。
[2] Formula (1)
Figure JPOXMLDOC01-appb-I000004
[Where:
A1 represents -NR6-, an oxygen atom or a sulfur atom,
A2 represents a nitrogen atom or = CH-,
R 1, R 2, R 3 and R 4 are the same or different and each have one or more atoms or groups selected from C1-C3 chain hydrocarbon group optionally having one or more halogen atoms and group Z An optionally substituted phenyl group, a 6-membered heterocyclic group optionally having one or more atoms or groups selected from group Z, -OR7, -S (O) mR7, a halogen atom, or a hydrogen atom; (However, at least two of R1, R2, R3 and R4 represent a hydrogen atom.),
R5 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group X, -OR7, -S (O) mR7, or a halogen atom;
R6 is a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group W, and C3 which may have one or more atoms or groups selected from group W. -C6 represents an alicyclic hydrocarbon group or a hydrogen atom,
R7 represents a C1-C3 chain hydrocarbon group which may have one or more halogen atoms or a hydrogen atom,
m represents 0, 1 or 2, and n represents 0, 1 or 2.
Here, in -S (O) mR7, when m is 1 or 2, R7 does not represent a hydrogen atom.
Group X: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms An optionally substituted C2-C3 alkynyloxy group, a C1-C3 alkylsulfanyl group optionally having one or more halogen atoms, a C1-C3 alkylsulfinyl optionally having one or more halogen atoms A group consisting of a group, a C1-C3 alkylsulfonyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom;
Group Z: C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, C1-C3 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A C1-C3 alkylsulfanyl group optionally having one or more, a C1-C3 alkylsulfinyl group optionally having one or more halogen atoms, a C1-C3 optionally having one or more halogen atoms A group consisting of an alkylsulfonyl group, a cyano group, a nitro group and a halogen atom.
Group W: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms A group consisting of a C2-C3 alkynyloxy group, a halogen atom and a hydroxy group, which may be ] The plant seed processed by the compound shown by this.
[3] The method for controlling harmful arthropods according to [1], wherein 0.01 to 1000 g of the compound represented by the formula (1) is used per 10 kg of plant seeds.
[4] The method for controlling harmful arthropods according to [1] or [3], wherein the plant seed is a seed of corn, cotton, soybean, sugar beet, rapeseed, radish or rice.
本発明方法は、式(1)
Figure JPOXMLDOC01-appb-I000005
[式中、
A1は−NR6−、酸素原子又は硫黄原子を表し、
A2は窒素原子又は=CH−を表し、
R1、R2、R3及びR4は同一又は相異なり、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、群Zより選ばれる1個以上の原子もしくは基を有していてもよいフェニル基、群Zより選ばれる1個以上の原子もしくは基を有していてもよい6員複素環基、−OR7、−S(O)mR7、ハロゲン原子、又は水素原子を表し(但し、R1、R2、R3及びR4のうち、少なくとも2つは水素原子を表す。)、
R5は、群Xより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、−OR7、−S(O)mR7、又はハロゲン原子を表し、
R6は群Wより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、群Wより選ばれる1個以上の原子もしくは基を有していてもよいC3−C6脂環式炭化水素基又は水素原子を表し、
R7は、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基又は水素原子を表し、
mは0、1又は2を表し、nは0、1又は2を表す。
ここで、−S(O)mR7において、mが1又は2の場合には、R7が水素原子を表すことはない。
群X:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ヒドロキシ基及びハロゲン原子からなる群。
群Z:1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ニトロ基及びハロゲン原子からなる群。
群W:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、ハロゲン原子及びヒドロキシ基からなる群。]で示される化合物(以下、本縮合複素環化合物と記す。)で植物種子を処理することを特徴とする。
The method of the present invention is represented by the formula (1)
Figure JPOXMLDOC01-appb-I000005
[Where:
A1 represents -NR6-, an oxygen atom or a sulfur atom,
A2 represents a nitrogen atom or = CH-,
R 1, R 2, R 3 and R 4 are the same or different and each have one or more atoms or groups selected from C1-C3 chain hydrocarbon group optionally having one or more halogen atoms and group Z An optionally substituted phenyl group, a 6-membered heterocyclic group optionally having one or more atoms or groups selected from group Z, -OR7, -S (O) mR7, a halogen atom, or a hydrogen atom; (However, at least two of R1, R2, R3 and R4 represent a hydrogen atom.),
R5 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group X, -OR7, -S (O) mR7, or a halogen atom;
R6 is a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group W, and C3 which may have one or more atoms or groups selected from group W. -C6 represents an alicyclic hydrocarbon group or a hydrogen atom,
R7 represents a C1-C3 chain hydrocarbon group which may have one or more halogen atoms or a hydrogen atom,
m represents 0, 1 or 2, and n represents 0, 1 or 2.
Here, in -S (O) mR7, when m is 1 or 2, R7 does not represent a hydrogen atom.
Group X: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms An optionally substituted C2-C3 alkynyloxy group, a C1-C3 alkylsulfanyl group optionally having one or more halogen atoms, a C1-C3 alkylsulfinyl optionally having one or more halogen atoms A group consisting of a group, a C1-C3 alkylsulfonyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom;
Group Z: C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, C1-C3 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A C1-C3 alkylsulfanyl group optionally having one or more, a C1-C3 alkylsulfinyl group optionally having one or more halogen atoms, a C1-C3 optionally having one or more halogen atoms A group consisting of an alkylsulfonyl group, a cyano group, a nitro group and a halogen atom.
Group W: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms A group consisting of a C2-C3 alkynyloxy group, a halogen atom and a hydroxy group, which may be The plant seed is treated with a compound represented by formula (hereinafter referred to as the present condensed heterocyclic compound).
 本明細書の記載において用いられる置換基について、例を挙げて以下に説明する。 The substituents used in the description of this specification will be described below with examples.
 本明細書において「C1−C3鎖式炭化水素基」の表記は、炭素原子数が1~3個よりなる直鎖状又は分岐鎖状の飽和又は不飽和炭化水素基を表し、例えばメチル基、エチル基、プロピル基、イソプロピル基等のC1−C3アルキル基;ビニル基、1−プロペニル基、2−プロペニル基、1−メチルビニル基等のC2−C3アルケニル基;エチニル基、プロパルギル基、2−ブチニル基等のC2−C3アルキニル基が挙げられる。「C1−C2鎖式炭化水素基」の表記は、メチル基、エチル基、ビニル基、エチニル基を表す。 In the present specification, the expression “C1-C3 chain hydrocarbon group” represents a linear or branched saturated or unsaturated hydrocarbon group having 1 to 3 carbon atoms, such as a methyl group, C1-C3 alkyl groups such as ethyl group, propyl group and isopropyl group; C2-C3 alkenyl groups such as vinyl group, 1-propenyl group, 2-propenyl group and 1-methylvinyl group; ethynyl group, propargyl group, 2- A C2-C3 alkynyl group such as a butynyl group may be mentioned. The expression “C1-C2 chain hydrocarbon group” represents a methyl group, an ethyl group, a vinyl group, or an ethynyl group.
 本明細書において「C1−C3アルキル基」の表記は、炭素原子数が1~3個よりなる直鎖状又は分岐鎖状のアルキル基を表し、例えばメチル基、エチル基、プロピル基、イソプロピル基が挙げられる。「C1−C2アルキル基」の表記は、メチル基又はエチル基を表す。 In the present specification, the expression “C1-C3 alkyl group” represents a linear or branched alkyl group having 1 to 3 carbon atoms, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group. Is mentioned. The expression “C1-C2 alkyl group” represents a methyl group or an ethyl group.
 本明細書において「C2−C3アルケニル基」の表記は、炭素原子数が2~3個よりなる直鎖状又は分岐鎖状で、且つ分子内に1個又は2個以上の二重結合を有する不飽和炭化水素基を表し、例えばビニル基、1−プロペニル基、2−プロペニル基、1−メチルビニル基が挙げられる。 In this specification, the expression “C2-C3 alkenyl group” is linear or branched having 2 to 3 carbon atoms, and has one or more double bonds in the molecule. Represents an unsaturated hydrocarbon group, and examples thereof include a vinyl group, a 1-propenyl group, a 2-propenyl group, and a 1-methylvinyl group.
 本明細書において「C2−C3アルキニル基」の表記は、炭素原子数が2~3個よりなる直鎖状又は分岐鎖状で、且つ分子内に1個又は2個以上の三重結合を有する不飽和炭化水素基を表し、例えばエチニル基、プロパルギル基が挙げられる。 In this specification, the expression “C2-C3 alkynyl group” refers to a linear or branched chain having 2 to 3 carbon atoms and having one or more triple bonds in the molecule. A saturated hydrocarbon group is represented, and examples thereof include an ethynyl group and a propargyl group.
 本明細書において「C1−C3アルコキシ基」の表記は、炭素原子数が1~3個よりなる直鎖状又は分岐鎖状のアルキル−O−で示される基を表し、例えばメトキシ基、エトキシ基、プロピルオキシ基、イソプロピルオキシ基が挙げられる。 In the present specification, the expression “C1-C3 alkoxy group” represents a group represented by a linear or branched alkyl-O— having 1 to 3 carbon atoms, such as a methoxy group or an ethoxy group. , A propyloxy group, and an isopropyloxy group.
 本明細書において「C2−C3アルケニルオキシ基」の表記は、炭素原子数が2~3個よりなる直鎖状又は分岐鎖状で、且つ分子内に1個又は2個以上の二重結合を有するアルケニル−O−で示される基を表し、例えばビニルオキシ基、1−プロペニルオキシ基、2−プロペニルオキシ基、1−メチルビニルオキシ基が挙げられる。 In this specification, the expression “C2-C3 alkenyloxy group” refers to a linear or branched chain having 2 to 3 carbon atoms, and one or more double bonds in the molecule. Represents a group represented by alkenyl-O-, and examples thereof include a vinyloxy group, a 1-propenyloxy group, a 2-propenyloxy group, and a 1-methylvinyloxy group.
 本明細書において「C2−C3アルキニルオキシ基」の表記は、炭素原子数が2~3個よりなる直鎖状又は分岐鎖状で、且つ分子内に1個又は2個以上の三重結合を有するアルキニル−O−で示される基を表し、例えばエチニルオキシ基、プロパルギルオキシ基が挙げられる。 In the present specification, the expression “C2-C3 alkynyloxy group” is linear or branched having 2 to 3 carbon atoms, and has one or more triple bonds in the molecule. It represents a group represented by alkynyl-O—, and examples thereof include an ethynyloxy group and a propargyloxy group.
 本明細書において「C1−C3アルキルスルファニル基」の表記は、炭素原子数が1~3個よりなる直鎖状又は分岐鎖状のアルキル−S−で示される基を表し、例えばメチルスルファニル基、エチルスルファニル基、プロピルスルファニル基、イソプロピルスルファニル基が挙げられる。 In the present specification, the expression “C1-C3 alkylsulfanyl group” represents a group represented by linear or branched alkyl-S— having 1 to 3 carbon atoms, such as a methylsulfanyl group, Examples thereof include an ethylsulfanyl group, a propylsulfanyl group, and an isopropylsulfanyl group.
 本明細書において「C1−C3アルキルスルフィニル基」の表記は、炭素原子数が1~3個よりなる直鎖状又は分岐鎖状のアルキル−S(O)−で示される基を表し、例えばメチルスルフィニル基、エチルスルフィニル基、プロピルスルフィニル基、イソプロピルスルフィニル基が挙げられる。 In the present specification, the expression “C1-C3 alkylsulfinyl group” represents a group represented by linear or branched alkyl-S (O) — having 1 to 3 carbon atoms. Examples thereof include a sulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, and an isopropylsulfinyl group.
 本明細書において「C1−C3アルキルスルホニル基」の表記は、炭素原子数が1~3個よりなる直鎖状又は分岐鎖状のアルキル−S(O)2−で示される基を表し、例えばメチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、イソプロピルスルホニル基が挙げられる。 In the present specification, the expression “C1-C3 alkylsulfonyl group” represents a group represented by a linear or branched alkyl-S (O) 2- having 1 to 3 carbon atoms, for example, Examples include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, and an isopropylsulfonyl group.
 本明細書において「C3−C6脂環式炭化水素基」としては、炭素原子数が3~6個よりなる環状の非芳香族炭化水素基を表し、例えばシクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等のC3−C6シクロアルキル基;シクロプロペニル基、シクロブテニル基、シクロペンテニル基、シクロヘキセニル基等のC3−C6シクロアルケニル基が挙げられる。 In the present specification, the “C3-C6 alicyclic hydrocarbon group” represents a cyclic non-aromatic hydrocarbon group having 3 to 6 carbon atoms, such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, C3-C6 cycloalkyl group such as cyclohexyl group; C3-C6 cycloalkenyl group such as cyclopropenyl group, cyclobutenyl group, cyclopentenyl group, cyclohexenyl group and the like can be mentioned.
 本明細書において「C3−C6シクロアルキル基」の表記は、炭素原子数が3~6個よりなる環状のアルキル基を表し、例えばシクロプロピル基、シクロブチル基、シクロペンチル基及びシクロヘキシル基が挙げられる。 In this specification, the expression “C3-C6 cycloalkyl group” represents a cyclic alkyl group having 3 to 6 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
 本明細書において「群Xより選ばれる1個以上の原子もしくは基を有していてもよい」の表記は、群Xより選ばれる2個以上の原子もしくは基を有している場合、それらの群Xより選ばれる原子もしくは基は互いに同一でも、又は互いに相異なっていてもよい。 In the present specification, the expression “which may have one or more atoms or groups selected from group X” means that when it has two or more atoms or groups selected from group X, The atoms or groups selected from group X may be the same as or different from each other.
 本明細書において「群Zより選ばれる1個以上の原子もしくは基を有していてもよい」の表記は、群Zより選ばれる2個以上の原子もしくは基を有している場合、それらの群Zより選ばれる原子もしくは基は互いに同一でも、又は互いに相異なっていてもよい。 In the present specification, the expression “may have one or more atoms or groups selected from group Z” means that when it has two or more atoms or groups selected from group Z, The atoms or groups selected from group Z may be the same as or different from each other.
 本明細書において「群Wより選ばれる1個以上の原子もしくは基を有していてもよい」の表記は、群Wより選ばれる2個以上の原子もしくは基を有している場合、それらの群Wより選ばれる原子もしくは基は互いに同一でも、又は互いに相異なっていてもよい。 In the present specification, the expression “may have one or more atoms or groups selected from group W” means that when it has two or more atoms or groups selected from group W, those The atoms or groups selected from group W may be the same as or different from each other.
 本明細書において「1個以上のハロゲン原子を有していてもよい」の表記は、2個以上のハロゲン原子を有している場合、それらのハロゲン原子は互いに同一でも、又は互いに相異なっていてもよい。 In the present specification, the expression “may have one or more halogen atoms” means that when two or more halogen atoms are present, these halogen atoms may be the same or different from each other. May be.
 本明細書において「6員複素環基」の表記は、環構造において、炭素原子以外に、窒素原子、酸素原子及び硫黄原子からなる群より選ばれる1個以上の原子を含む6員複素環化合物残基を表し、例えば、6員芳香族複素環基、6員非芳香族複素環基が挙げられる。
 「6員芳香族複素環基」としては、例えばピラジニル基、ピリミジニル基、ピリジル基、ピリダジニル基が挙げられる。
 「6員非芳香族複素環基」としては、例えばピペリジル基、モルフォリニル基、ピペラジニル基、チオモルフォリニル基が挙げられる。
In the present specification, the expression “6-membered heterocyclic group” is a 6-membered heterocyclic compound containing one or more atoms selected from the group consisting of a nitrogen atom, an oxygen atom and a sulfur atom in addition to the carbon atom in the ring structure. Represents a residue, and examples thereof include a 6-membered aromatic heterocyclic group and a 6-membered non-aromatic heterocyclic group.
Examples of the “6-membered aromatic heterocyclic group” include a pyrazinyl group, a pyrimidinyl group, a pyridyl group, and a pyridazinyl group.
Examples of the “6-membered non-aromatic heterocyclic group” include a piperidyl group, a morpholinyl group, a piperazinyl group, and a thiomorpholinyl group.
 本明細書において「ハロゲン原子」としては、フッ素原子、塩素原子、臭素原子及びヨウ素原子を意味する。 In the present specification, “halogen atom” means a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.
本縮合複素環化合物において「群Xより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、メトキシメチル基、エトキシメチル基、プロピルオキシメチル基、イソプロピルオキシメチル基、2−メトキシエチル基、2−エトキシエチル基、2−プロピルオキシエチル基、2−イソプロピルオキシエチル基、ジフルオロメチル基、トリフルオロメチル基、トリクロロメチル基、2−フルオロエチル基、2,2−ジフルオロエチル基、1,2,2,2−テトラフルオロエチル基、2,2,2−トリフルオロエチル基、ペンタフルオロエチル基、2−クロロ−1,1,1,3,3,3−ヘキサフルオロプロパン−2−イル基(−C(Cl)(CF3)2)、ヘプタフルオロプロピル基、ヘプタフルオロイソプロピル基、メチルスルファニルエチル基、エチルスルファニルエチル基、メチルスルフィニルエチル基、メチルスルホニルエチル基、メトキシカルボニルメチル基、シアノメチル基等の群Xより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3アルキル基; ビニル基、1−プロペニル基、2−プロペニル基、1−メチルビニル基、1,1−ジフルオロアリル基、ペンタフルオロアリル基等の群Xより選ばれる1個以上の原子もしくは基を有していてもよいC2−C3アルケニル基;エチニル基、プロパルギル基等の群Xより選ばれる1個以上の原子もしくは基を有していてもよいC2−C3アルキニル基が挙げられる。 In the present condensed heterocyclic compound, examples of the “C1-C3 chain hydrocarbon group optionally having one or more atoms or groups selected from group X” include a methyl group, an ethyl group, a propyl group, and an isopropyl group. Methoxymethyl group, ethoxymethyl group, propyloxymethyl group, isopropyloxymethyl group, 2-methoxyethyl group, 2-ethoxyethyl group, 2-propyloxyethyl group, 2-isopropyloxyethyl group, difluoromethyl group, tri Fluoromethyl group, trichloromethyl group, 2-fluoroethyl group, 2,2-difluoroethyl group, 1,2,2,2-tetrafluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group , 2-chloro-1,1,1,3,3,3-hexafluoropropan-2-yl group (—C (Cl) (C 3) 1) selected from group X such as 2), heptafluoropropyl group, heptafluoroisopropyl group, methylsulfanylethyl group, ethylsulfanylethyl group, methylsulfinylethyl group, methylsulfonylethyl group, methoxycarbonylmethyl group, cyanomethyl group A C1-C3 alkyl group optionally having one or more atoms or groups; vinyl group, 1-propenyl group, 2-propenyl group, 1-methylvinyl group, 1,1-difluoroallyl group, pentafluoroallyl group A C2-C3 alkenyl group optionally having one or more atoms or groups selected from the group X such as; having one or more atoms or groups selected from the group X such as an ethynyl group or a propargyl group; C2-C3 alkynyl group which may be mentioned is mentioned.
本縮合複素環化合物において「1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、トリフルオロメチル基、トリクロロメチル基、2−フルオロエチル基、2,2−ジフルオロエチル基、2,2,2−トリフルオロエチル基、ペンタフルオロエチル基、ヘプタフルオロイソプロピル基等の1個以上のハロゲン原子を有していてもよいC1−C3アルキル基;
ビニル基、1−プロペニル基、2−プロペニル基、1−メチルビニル基、1,1−ジフルオロアリル基、ペンタフルオロアリル基等の1個以上のハロゲン原子を有していてもよいC2−C3アルケニル基;エチニル基及びプロパルギル基の1個以上のハロゲン原子を有していてもよいC2−C3アルキニル基が挙げられる。
In the present condensed heterocyclic compound, examples of the “C1-C3 chain hydrocarbon group optionally having one or more halogen atoms” include a methyl group, an ethyl group, a propyl group, an isopropyl group, a trifluoromethyl group, It has one or more halogen atoms such as trichloromethyl group, 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, heptafluoroisopropyl group, etc. Optionally a C1-C3 alkyl group;
C2-C3 alkenyl optionally having one or more halogen atoms such as vinyl group, 1-propenyl group, 2-propenyl group, 1-methylvinyl group, 1,1-difluoroallyl group and pentafluoroallyl group Group; C2-C3 alkynyl group which may have one or more halogen atoms of ethynyl group and propargyl group.
本縮合複素環化合物において「1個以上のハロゲン原子を有していてもよいC1−C3アルキル基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、トリフルオロメチル基、トリクロロメチル基、2−フルオロエチル基、2,2−ジフルオロエチル基、2,2,2−トリフルオロエチル基、ペンタフルオロエチル基、ヘプタフルオロイソプロピル基等が挙げられる。 Examples of the “C1-C3 alkyl group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methyl group, an ethyl group, a propyl group, an isopropyl group, a trifluoromethyl group, and a trichloromethyl group. 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, heptafluoroisopropyl group and the like.
本縮合複素環化合物において「群Zより選ばれる1個以上の原子もしくは基を有していてもよいフェニル基」としては、例えばフェニル基、2−フルオロフェニル基、3−フルオロフェニル基、4−フルオロフェニル基、2,3−ジフルオロフェニル基、2,4−ジフルオロフェニル基、2,5−ジフルオロフェニル基、2,6−ジフルオロフェニル基、3,4−ジフルオロフェニル基、3,5−ジフルオロフェニル基、2,3,4,5,6−ペンタフルオロフェニル基、2−クロロフェニル基、3−クロロフェニル基、4−クロロフェニル基、2−ブロモフェニル基、3−ブロモフェニル基、4−ブロモフェニル基、2−ヨードフェニル基、3−ヨードフェニル基、4−ヨードフェニル基、2−トリフルオロメチルフェニル基、3−トリフルオロメチルフェニル基、4−トリフルオロメチルフェニル基、2−トリフルオロメトキシフェニル基、3−トリフルオロメトキシフェニル基、4−トリフルオロメトキシフェニル基、2−トリフルオロメチルスルファニルフェニル基、3−トリフルオロメチルスルファニルフェニル基、4−トリフルオロメチルスルファニルフェニル基、4−メトキシカルボニルフェニル基、4−ニトロフェニル基、4−シアノフェニル基、4−メチルアミノフェニル基、4−ジメチルアミノフェニル基、4−メチルスルフィニルフェニル基及び4−メチルスルホニルフェニル基が挙げられる。 In the present condensed heterocyclic compound, examples of the “phenyl group optionally having one or more atoms or groups selected from group Z” include a phenyl group, a 2-fluorophenyl group, a 3-fluorophenyl group, 4- Fluorophenyl group, 2,3-difluorophenyl group, 2,4-difluorophenyl group, 2,5-difluorophenyl group, 2,6-difluorophenyl group, 3,4-difluorophenyl group, 3,5-difluorophenyl Group, 2,3,4,5,6-pentafluorophenyl group, 2-chlorophenyl group, 3-chlorophenyl group, 4-chlorophenyl group, 2-bromophenyl group, 3-bromophenyl group, 4-bromophenyl group, 2-iodophenyl group, 3-iodophenyl group, 4-iodophenyl group, 2-trifluoromethylphenyl group, 3-trifluoro Oromethylphenyl group, 4-trifluoromethylphenyl group, 2-trifluoromethoxyphenyl group, 3-trifluoromethoxyphenyl group, 4-trifluoromethoxyphenyl group, 2-trifluoromethylsulfanylphenyl group, 3-trifluoro Methylsulfanylphenyl group, 4-trifluoromethylsulfanylphenyl group, 4-methoxycarbonylphenyl group, 4-nitrophenyl group, 4-cyanophenyl group, 4-methylaminophenyl group, 4-dimethylaminophenyl group, 4-methyl A sulfinylphenyl group and a 4-methylsulfonylphenyl group are mentioned.
本縮合複素環化合物において「群Zより選ばれる1個以上の原子もしくは基を有していてもよい6員複素環基」としては、例えばピペリジル基、モルフォリル基及びチオモルフォリル基等の群Zより選ばれる1個以上の原子もしくは基を有していてもよい6員非芳香族複素環基;ピラジニル基、2−ピリミジニル基、4−ピリミジニル基、5−ピリミジニル基、2−ピリジル基、3−ピリジル基、4−ピリジル基、3−フルオロ−2−ピリジル基、4−フルオロ−2−ピリジル基、5−フルオロ−2−ピリジル基、6−フルオロ−2−ピリジル基、2−ピリミジニル基、4−トリフルオロメチルピリジン−2−イル基、5−トリフルオロメチルピリジン−2−イル基等の群Zより選ばれる1個以上の原子もしくは基を有していてもよい6員芳香族複素環基が挙げられる。 In the present condensed heterocyclic compound, examples of the “6-membered heterocyclic group optionally having one or more atoms or groups selected from group Z” include group Z such as piperidyl group, morpholyl group, and thiomorpholyl group. A 6-membered non-aromatic heterocyclic group optionally having one or more atoms or groups selected from: a pyrazinyl group, a 2-pyrimidinyl group, a 4-pyrimidinyl group, a 5-pyrimidinyl group, a 2-pyridyl group, 3 -Pyridyl group, 4-pyridyl group, 3-fluoro-2-pyridyl group, 4-fluoro-2-pyridyl group, 5-fluoro-2-pyridyl group, 6-fluoro-2-pyridyl group, 2-pyrimidinyl group, 6-membered ring which may have one or more atoms or groups selected from group Z such as 4-trifluoromethylpyridin-2-yl group and 5-trifluoromethylpyridin-2-yl group It includes family heterocyclic group.
本縮合複素環化合物において「群Wより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基」としては、例えばメチル基、エチル基、プロピル基、イソプロピル基、トリフルオロメチル基、トリクロロメチル基、2−フルオロエチル基、2,2−ジフルオロエチル基、2,2,2−トリフルオロエチル基、ペンタフルオロエチル基、メトキシメチル基、エトキシメチル基、プロピルオキシメチル基、イソプロピルオキシメチル基、メトキシエチル基、エトキシエチル基、プロピルオキシエチル基、イソプロピルオキシエチル基、メチルスルファニルエチル基、エチルスルファニルエチル基、メチルスルフィニルエチル基、及びメチルスルホニルエチル基等の群Wより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3アルキル基;
ビニル基、1−プロペニル基、2−プロペニル基、1,1−ジフルオロアリル基、ペンタフルオロアリル基等の群Wより選ばれる1個以上の原子もしくは基を有していてもよいC2−C3アルケニル基;
エチニル基及びプロパルギル基等の群Wより選ばれる1個以上の原子もしくは基を有していてもよいC2−C3アルキニル基が挙げられる。
In the present condensed heterocyclic compound, examples of the “C1-C3 chain hydrocarbon group optionally having one or more atoms or groups selected from group W” include a methyl group, an ethyl group, a propyl group, and an isopropyl group. , Trifluoromethyl group, trichloromethyl group, 2-fluoroethyl group, 2,2-difluoroethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, methoxymethyl group, ethoxymethyl group, propyloxy Group W such as methyl group, isopropyloxymethyl group, methoxyethyl group, ethoxyethyl group, propyloxyethyl group, isopropyloxyethyl group, methylsulfanylethyl group, ethylsulfanylethyl group, methylsulfinylethyl group, and methylsulfonylethyl group Having one or more atoms or groups selected from And it may be C1-C3 alkyl group;
C2-C3 alkenyl which may have one or more atoms or groups selected from the group W such as vinyl group, 1-propenyl group, 2-propenyl group, 1,1-difluoroallyl group, pentafluoroallyl group, etc. Group;
C2-C3 alkynyl group which may have one or more atoms or groups selected from group W such as ethynyl group and propargyl group.
本縮合複素環化合物において「群Wより選ばれる1個以上の原子もしくは基を有していてもよいC3−C6脂環式炭化水素基」としては、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロプロペニル基、シクロブテニル基、シクロペンテニル基、1−シクロヘキセニル基、2−シクロヘキセニル基、3−シクロヘキセニル基が挙げられる。 In the present condensed heterocyclic compound, “C3-C6 alicyclic hydrocarbon group optionally having one or more atoms or groups selected from group W” includes cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl Group, cyclopropenyl group, cyclobutenyl group, cyclopentenyl group, 1-cyclohexenyl group, 2-cyclohexenyl group and 3-cyclohexenyl group.
本縮合複素環化合物において「1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基」としては、例えばメチルスルファニル基、エチルスルファニル基、プロピルスルファニル基、イソプロピルスルファニル基、トリフルオロメチルスルファニル基、2,2,2−トリフルオロエチルスルファニル基及びペンタフルオロエチルスルファニル基が挙げられる。 Examples of the “C1-C3 alkylsulfanyl group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methylsulfanyl group, an ethylsulfanyl group, a propylsulfanyl group, an isopropylsulfanyl group, and trifluoromethyl. Examples thereof include a sulfanyl group, a 2,2,2-trifluoroethylsulfanyl group, and a pentafluoroethylsulfanyl group.
本縮合複素環化合物において「1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基」としては、例えばメチルスルフィニル基、エチルスルフィニル基、プロピルスルフィニル基、イソプロピルスルフィニル基、トリフルオロメチルスルフィニル基、2,2,2−トリフルオロエチルスルフィニル基及びペンタフルオロエチルスルフィニル基が挙げられる。 Examples of the “C1-C3 alkylsulfinyl group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, an isopropylsulfinyl group, and trifluoromethyl. Examples thereof include a sulfinyl group, a 2,2,2-trifluoroethylsulfinyl group and a pentafluoroethylsulfinyl group.
本縮合複素環化合物において「1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基」としては、例えばメチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、イソプロピルスルホニル基、トリフルオロメチルスルホニル基、2,2,2−トリフルオロエチルスルホニル基及びペンタフルオロエチルスルホニル基が挙げられる。 Examples of the “C1-C3 alkylsulfonyl group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, an isopropylsulfonyl group, and trifluoromethyl. Examples include a sulfonyl group, a 2,2,2-trifluoroethylsulfonyl group, and a pentafluoroethylsulfonyl group.
本縮合複素環化合物において「1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基」としては、例えばメトキシ基、トリフルオロメトキシ基、エトキシ基、2,2,2−トリフルオロエトキシ基、プロピルオキシ基及びイソプロピルオキシ基が挙げられる。 Examples of the “C1-C3 alkoxy group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a methoxy group, a trifluoromethoxy group, an ethoxy group, and 2,2,2-trifluoroethoxy. Group, propyloxy group and isopropyloxy group.
本縮合複素環化合物において「1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基」としては、例えば2−プロペニルオキシ基、2−メチル−2−プロペニルオキシ基、3,3−ジフルオロアリルオキシ基及び3,3−ジクロロアリルオキシ基が挙げられる。 In the present condensed heterocyclic compound, examples of the “C2-C3 alkenyloxy group optionally having one or more halogen atoms” include 2-propenyloxy group, 2-methyl-2-propenyloxy group, 3, 3 -A difluoroallyloxy group and a 3, 3- dichloroallyloxy group are mentioned.
本縮合複素環化合物において「1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基」としては、例えばプロパルギルオキシ基が挙げられる。 Examples of the “C2-C3 alkynyloxy group optionally having one or more halogen atoms” in the present condensed heterocyclic compound include a propargyloxy group.
本縮合複素環化合物において「1個以上の」とは、特に断りのない限り、1個以上でありかつ原子もしくは基が結合し得る最大の個数以下を意味する。 In the present condensed heterocyclic compound, “one or more” means one or more and the maximum number to which atoms or groups can be bonded, unless otherwise specified.
 本縮合複素環化合物としては、例えば、以下の化合物が挙げられる。
 式(1)において、A1が−NR6−、酸素原子又は硫黄原子であり、R5が1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基を1個有しているC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基である化合物;
 式(1)において、A1が−NR6−又は硫黄原子であり、R5が1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基である化合物;
 式(1)において、A1が−NR6−、酸素原子又は硫黄原子であり、A2がNであり、R5が1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基を1個有しているC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基である化合物;
 式(1)において、A1が−NR6−又は硫黄原子であり、A2がNであり、R5が1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基である化合物;
 式(1)において、A1が−NR6−、酸素原子又は硫黄原子であり、R5が1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基を1個有しているC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基であり、R6がメチル基である化合物;
 式(1)において、A1が−NR6−又は硫黄原子であり、R5が1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基であり、R6がメチル基である化合物;
 式(1)において、A1が−NR6−、酸素原子又は硫黄原子であり、A2がNであり、R5が1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基を1個有しているC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基であり、R6がメチル基である化合物;
 式(1)において、A1が−NR6−又は硫黄原子であり、A2がNであり、R5が1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基であり、R6がメチル基である化合物;
 式(1)において、A1が−NR6−であり、A2がNであり、R5が1個以上のハロゲン原子を有していてもよいC1−C2鎖式炭化水素基であり、R6がメチル基である化合物;
 式(1)において、A1が−NR6−又は硫黄原子であり、R5が−S(O)mR7であり、R7がハロゲン原子を有していてもよいC1−C3鎖式炭化水素基である化合物;
 式(1)において、A1が−NR6−又は硫黄原子であり、A2がNであり、R5が−S(O)mR7であり、R7が1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基である化合物;
 式(1)において、A1が−NR6−又は硫黄原子であり、R5が−S(O)mR7であり、R6がメチル基であり、R7が1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基である化合物;
 式(1)において、A1が−NR6−又は硫黄原子であり、A2がNであり、R5が−S(O)mR7であり、R6がメチル基であり、R7が1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基である化合物;
 式(1)において、A1が硫黄原子であり、A2がNであり、R5が−S(O)mR7であり、R6がメチル基であり、R7が1個以上のハロゲン原子を有していてもよいC1−C2鎖式炭化水素基である化合物;
 式(1)において、R2、R3及びR4が同一又は相異なり、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、−OR7、ハロゲン原子又は水素原子であり、R5が1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、−OR7、又はハロゲン原子である化合物;
 式(1)において、R2、R3及びR4が同一又は相異なり、1個以上のハロゲン原子もしくは1個以上のハロゲン原子を有していてもよいC1−C2アルキル基を有していてもよい6員複素環基又は水素原子であり、R5が1個以上のハロゲン原子もしくは1個以上のハロゲン原子を有していてもよいC1−C2アルキル基を有していてもよい6員複素環基である化合物;
 式(1)において、R2、R3及びR4が同一又は相異なり、メチル基、エチル基、トリフルオロメチル基、トリフルオロメトキシ基又は水素原子であり、R5がメチル基、エチル基、トリフルオロメチル基又はトリフルオロメトキシ基である化合物;
 式(1)において、R2、R3及びR4が同一又は相異なり、フッ素原子、塩素原子、臭素原子、ヨウ素原子又は水素原子であり、R5がフッ素原子、塩素原子、臭素原子又はヨウ素原子である化合物;
 式(1)において、R2、R3及びR4が同一又は相異なり、フッ素原子、塩素原子、臭素原子、メチル基、トリフルオロメチル基、トリフルオロメトキシ基、ペンタフルオロエチル基又は水素原子であり、R5がフッ素原子、塩素原子、臭素原子、メチル基、トリフルオロメチル基、トリフルオロメトキシ基又はペンタフルオロエチル基である化合物;
 式(1)において、A1が−NR6−である化合物;
 式(1)において、A1が酸素原子である化合物;
 式(1)において、A1が硫黄原子である化合物;
 式(1)において、A2が窒素原子である化合物;
 式(1)において、A2が=CH−である化合物;
 式(1)において、R1、R3及びR4が同一又は相異なり、ハロゲン原子又は水素原子である化合物;
 式(1)において、R2が1個以上のハロゲン原子を有していてもよいC1−C3アルキル基、1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有するC1−C3アルキル基を有していてもよい6員芳香族複素環基、ハロゲン原子又は水素原子である化合物;
 式(1)において、R1、R3及びR4が同一又は相異なり、ハロゲン原子又は水素原子であり、R2が1個以上のハロゲン原子を有していてもよいC1−C3アルキル基、1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有するC1−C3アルキル基を有していてもよい6員芳香族複素環基、ハロゲン原子又は水素原子である化合物;
Examples of the present condensed heterocyclic compound include the following compounds.
In formula (1), A1 is -NR6-, an oxygen atom or a sulfur atom, and R5 is a C1-C3 having one C1-C3 alkoxy group which may have one or more halogen atoms. A chain hydrocarbon group, a compound which is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms;
In formula (1), a compound wherein A1 is -NR6- or a sulfur atom, and R5 is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms;
In the formula (1), A1 is —NR6-, an oxygen atom or a sulfur atom, A2 is N, and R5 has one C1-C3 alkoxy group which may have one or more halogen atoms. A C1-C3 chain hydrocarbon group, a compound which is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms;
In formula (1), a compound wherein A1 is -NR6- or a sulfur atom, A2 is N, and R5 is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms;
In formula (1), A1 is -NR6-, an oxygen atom or a sulfur atom, and R5 is a C1-C3 having one C1-C3 alkoxy group which may have one or more halogen atoms. A chain hydrocarbon group, a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, and a compound wherein R6 is a methyl group;
In the formula (1), A1 is —NR 6 — or a sulfur atom, R 5 is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, and R 6 is a methyl group ;
In the formula (1), A1 is —NR6-, an oxygen atom or a sulfur atom, A2 is N, and R5 has one C1-C3 alkoxy group which may have one or more halogen atoms. A C1-C3 chain hydrocarbon group, a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, and R6 is a methyl group;
In Formula (1), A1 is -NR6- or a sulfur atom, A2 is N, R5 is a C1-C3 chain hydrocarbon group which may have one or more halogen atoms, R6 A compound wherein is a methyl group;
In formula (1), A1 is —NR6-, A2 is N, R5 is a C1-C2 chain hydrocarbon group optionally having one or more halogen atoms, and R6 is a methyl group. A compound which is
In the formula (1), compounds wherein A1 is -NR6- or a sulfur atom, R5 is -S (O) mR7, and R7 is a C1-C3 chain hydrocarbon group optionally having a halogen atom ;
In Formula (1), A1 is -NR6- or a sulfur atom, A2 is N, R5 is -S (O) mR7, and R7 may have one or more halogen atoms. A compound which is a C3 chain hydrocarbon group;
In Formula (1), A1 is -NR6- or a sulfur atom, R5 is -S (O) mR7, R6 is a methyl group, and R7 may have one or more halogen atoms. A compound which is a C1-C3 chain hydrocarbon group;
In Formula (1), A1 is —NR6- or a sulfur atom, A2 is N, R5 is —S (O) mR7, R6 is a methyl group, and R7 is one or more halogen atoms. A compound which is a C1-C3 chain hydrocarbon group optionally having;
In Formula (1), A1 is a sulfur atom, A2 is N, R5 is -S (O) mR7, R6 is a methyl group, and R7 has one or more halogen atoms. A compound which is a good C1-C2 chain hydrocarbon group;
In the formula (1), R2, R3 and R4 are the same or different and each is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, -OR7, a halogen atom or a hydrogen atom, A compound wherein R5 is a C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, -OR7, or a halogen atom;
In the formula (1), R2, R3 and R4 are the same or different and may have one or more halogen atoms or a C1-C2 alkyl group which may have one or more halogen atoms. A membered heterocyclic group or a hydrogen atom, and R5 is a 6-membered heterocyclic group optionally having one or more halogen atoms or a C1-C2 alkyl group optionally having one or more halogen atoms. A compound;
In the formula (1), R2, R3 and R4 are the same or different and are a methyl group, an ethyl group, a trifluoromethyl group, a trifluoromethoxy group or a hydrogen atom, and R5 is a methyl group, an ethyl group or a trifluoromethyl group. Or a compound which is a trifluoromethoxy group;
In the formula (1), R2, R3 and R4 are the same or different and are a fluorine atom, a chlorine atom, a bromine atom, an iodine atom or a hydrogen atom, and R5 is a fluorine atom, a chlorine atom, a bromine atom or an iodine atom ;
In the formula (1), R2, R3 and R4 are the same or different and are a fluorine atom, a chlorine atom, a bromine atom, a methyl group, a trifluoromethyl group, a trifluoromethoxy group, a pentafluoroethyl group or a hydrogen atom, and R5 A compound in which is a fluorine atom, a chlorine atom, a bromine atom, a methyl group, a trifluoromethyl group, a trifluoromethoxy group or a pentafluoroethyl group;
In the formula (1), compounds wherein A1 is -NR6-;
In the formula (1), compounds wherein A1 is an oxygen atom;
In the formula (1), compounds wherein A1 is a sulfur atom;
In the formula (1), compounds wherein A2 is a nitrogen atom;
In the formula (1), compounds wherein A2 is ═CH—;
In the formula (1), compounds wherein R1, R3 and R4 are the same or different and are a halogen atom or a hydrogen atom;
In the formula (1), R2 may be a C1-C3 alkyl group optionally having one or more halogen atoms, a C1-C3 alkoxy group optionally having one or more halogen atoms, one or more A 6-membered aromatic heterocyclic group optionally having a C1-C3 alkyl group having a halogen atom, a halogen atom or a hydrogen atom;
In the formula (1), R1, R3 and R4 are the same or different and are a halogen atom or a hydrogen atom, and R2 may have one or more halogen atoms, a C1-C3 alkyl group, one or more A C1-C3 alkoxy group optionally having a halogen atom, a 6-membered aromatic heterocyclic group optionally having a C1-C3 alkyl group having one or more halogen atoms, a halogen atom or a hydrogen atom. Compound;
 式(1A)
Figure JPOXMLDOC01-appb-I000006
[式中、
A1Aは−NR6A−、酸素原子又は硫黄原子を表し、
A2Aは窒素原子又は=CH−を表し、
R1A、R3A及びR4Aは同一又は相異なり、ハロゲン原子又は水素原子を表し(但し、R1A、R3A及びR4Aのうち、少なくとも2つは水素原子を表す)、R2Aは1個以上のハロゲン原子を有していてもよいC1−C3アルキル基、1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有するC1−C3アルキル基を有していてもよい6員芳香族複素環基、ハロゲン原子又は水素原子を表し、
R5Aは1個以上のハロゲン原子を有していてもよいC1−C3アルキル基、又は−S(O)mR7Aを表し、
R6AはC1−C3アルキル基又はC3−C6シクロアルキル基を表し、
R7Aは1個以上のハロゲン原子を有していてもよいC1−C3アルキル基を表し、
mは0、1又は2を表し、nは0、1又は2を表す。]で示される化合物;
 式(1A)において、A1Aが−NR6A−である化合物;
 式(1A)において、A1Aが酸素原子である化合物;
 式(1A)において、A1Aが硫黄原子である化合物;
 式(1A)において、A2Aが窒素原子である化合物;
 式(1A)において、A2Aが=CH−である化合物;
Formula (1A)
Figure JPOXMLDOC01-appb-I000006
[Where:
A1A represents -NR6A-, an oxygen atom or a sulfur atom,
A2A represents a nitrogen atom or = CH-,
R1A, R3A and R4A are the same or different and represent a halogen atom or a hydrogen atom (provided that at least two of R1A, R3A and R4A represent a hydrogen atom), and R2A has one or more halogen atoms A C1-C3 alkyl group which may have one, a C1-C3 alkoxy group which may have one or more halogen atoms, and a C1-C3 alkyl group which has one or more halogen atoms 6 Represents a membered aromatic heterocyclic group, a halogen atom or a hydrogen atom,
R5A represents a C1-C3 alkyl group optionally having one or more halogen atoms, or -S (O) mR7A;
R6A represents a C1-C3 alkyl group or a C3-C6 cycloalkyl group,
R7A represents a C1-C3 alkyl group optionally having one or more halogen atoms,
m represents 0, 1 or 2, and n represents 0, 1 or 2. ] The compound shown by
In the formula (1A), compounds wherein A1A is —NR6A—;
In the formula (1A), compounds wherein A1A is an oxygen atom;
In the formula (1A), compounds wherein A1A is a sulfur atom;
In the formula (1A), compounds wherein A2A is a nitrogen atom;
In the formula (1A), compounds wherein A2A is ═CH—;
 式(1B)
Figure JPOXMLDOC01-appb-I000007
[式中、
A1Bは−NR6B−、酸素原子又は硫黄原子を表し、
A2Bは窒素原子又は=CH−を表し、
R1B、R3B及びR4Bは同一又は相異なり、フッ素原子、塩素原子又は水素原子を表し(但し、R1B、R3B及びR4Bのうち、少なくとも2つは水素原子を表す)、
R2BはC1−C3アルキル基(特に、メチル基、エチル基又はイソプロピル基)、1個以上のハロゲン原子を有するC1−C3アルキル基(特に、ジフルオロメチル基、トリフルオロメチル基、ペンタフルオロエチル基、ヘプタフルオロプロピル基等)、1個以上のハロゲン原子を有するC1−C3アルコキシ基(特に、トリフルオロメトキシ基等)、含窒素6員芳香族複素環基(特に、2−、3−又は4−ピリジル基、2−ピリミジニル基等)、ハロゲン原子(特に、フッ素原子、塩素原子、臭素原子等)又は水素原子を表し、
R5Bは1個以上のハロゲン原子を有するC1−C3アルキル基(特に、ジフルオロメチル基、トリフルオロメチル基、ペンタフルオロエチル基、2−クロロ−1,1,1,3,3,3−ヘキサフルオロプロパン−2−イル基(−C(Cl)(CF3)2)、ヘプタフルオロイソプロピル基等)、又は−S(O)mR7Bを表し、
R6BはC1−C3アルキル基(メチル基、エチル基、プロピル基又はイソプロピル基、特にメチル基)を表し、
R7Bは1個以上のハロゲン原子を有するC1−C3アルキル基(トリフルオロメチル基、ペンタフルオロエチル基等、特にトリフルオロメチル基)を表し、
mは0、1又は2を表し、nは0、1又は2を表す。]で示される化合物;
 式(1B)において、A1Bが−NR6B−である化合物;
 式(1B)において、A1Bが酸素原子である化合物;
 式(1B)において、A1Bが硫黄原子である化合物;
 式(1B)において、A2Bが窒素原子である化合物;
 式(1B)において、A2Bが=CH−である化合物。
 上記一般式(1A)及び(1B)で示される化合物は、一般式(1)で示される化合物に包含される。
Formula (1B)
Figure JPOXMLDOC01-appb-I000007
[Where:
A1B represents -NR6B-, an oxygen atom or a sulfur atom,
A2B represents a nitrogen atom or = CH-,
R1B, R3B and R4B are the same or different and represent a fluorine atom, a chlorine atom or a hydrogen atom (provided that at least two of R1B, R3B and R4B represent a hydrogen atom),
R2B is a C1-C3 alkyl group (particularly a methyl group, ethyl group or isopropyl group), a C1-C3 alkyl group having one or more halogen atoms (particularly a difluoromethyl group, a trifluoromethyl group, a pentafluoroethyl group, A heptafluoropropyl group, etc.) a C1-C3 alkoxy group having at least one halogen atom (especially a trifluoromethoxy group, etc.), a nitrogen-containing 6-membered aromatic heterocyclic group (especially 2-, 3- or 4- A pyridyl group, a 2-pyrimidinyl group, etc.), a halogen atom (especially a fluorine atom, a chlorine atom, a bromine atom, etc.) or a hydrogen atom,
R5B is a C1-C3 alkyl group having one or more halogen atoms (in particular, difluoromethyl group, trifluoromethyl group, pentafluoroethyl group, 2-chloro-1,1,1,3,3,3-hexafluoro A propan-2-yl group (-C (Cl) (CF3) 2), heptafluoroisopropyl group, etc.), or -S (O) mR7B,
R6B represents a C1-C3 alkyl group (methyl group, ethyl group, propyl group or isopropyl group, particularly methyl group),
R7B represents a C1-C3 alkyl group having one or more halogen atoms (a trifluoromethyl group, a pentafluoroethyl group, etc., particularly a trifluoromethyl group),
m represents 0, 1 or 2, and n represents 0, 1 or 2. ] The compound shown by
In the formula (1B), compounds wherein A1B is —NR6B—;
In the formula (1B), compounds wherein A1B is an oxygen atom;
In the formula (1B), compounds wherein A1B is a sulfur atom;
In the formula (1B), compounds wherein A2B is a nitrogen atom;
In the formula (1B), compounds wherein A2B is ═CH—.
The compounds represented by the general formulas (1A) and (1B) are included in the compound represented by the general formula (1).
 次に、本縮合複素環化合物の製造法について説明する。 Next, a method for producing the present condensed heterocyclic compound will be described.
 本縮合複素環化合物は、例えば、以下の(製造法A)~(製造法F)により製造することができる。 The present condensed heterocyclic compound can be produced, for example, by the following (Production Method A) to (Production Method F).
(製造法A)
 本縮合複素環化合物(1)は、化合物(M1)と化合物(M2)とを反応させることにより製造できる。または化合物(M1)と化合物(M2)とを反応させることにより化合物(M3)を製造し、化合物(M3)を環化させることにより製造できる。
Figure JPOXMLDOC01-appb-I000008
[式中、R1、R2、R3、R4、R5、A1、A2及びnは前記と同じ意味を表す。]
(Production method A)
This condensed heterocyclic compound (1) can be produced by reacting the compound (M1) with the compound (M2). Alternatively, it can be produced by reacting the compound (M1) and the compound (M2) to produce the compound (M3) and cyclizing the compound (M3).
Figure JPOXMLDOC01-appb-I000008
[Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and n represent the same meaning as described above. ]
 (製造法B)
 本縮合複素環化合物(1)は、化合物(M1)と化合物(M4)とを反応させることにより製造できる。または化合物(M1)と化合物(M4)とを反応させることにより化合物(M3)を製造し、化合物(M3)を環化させることにより製造できる。
Figure JPOXMLDOC01-appb-I000009
[式中、R1、R2、R3、R4、R5、A1、A2及びnは前記と同じ意味を表す。]
(Production method B)
This condensed heterocyclic compound (1) can be produced by reacting the compound (M1) with the compound (M4). Alternatively, it can be produced by reacting the compound (M1) and the compound (M4) to produce the compound (M3) and cyclizing the compound (M3).
Figure JPOXMLDOC01-appb-I000009
[Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and n represent the same meaning as described above. ]
 (製造法C)
 本縮合複素環化合物(1)は、化合物(M1)と化合物(M5)とを反応させることにより製造できる。または化合物(M1)と化合物(M5)とを反応させることにより化合物(M6)を製造し、化合物(M6)を環化させることにより製造できる。
Figure JPOXMLDOC01-appb-I000010
[式中、R1、R2、R3、R4、R5、A1、A2及びnは前記と同じ意味を表す。]
(製造法D)
 式(1)においてA1が硫黄原子である化合物(2)は、化合物(M7)と硫化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000011
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
(Production method C)
This fused heterocyclic compound (1) can be produced by reacting compound (M1) with compound (M5). Alternatively, it can be produced by reacting the compound (M1) and the compound (M5) to produce the compound (M6) and cyclizing the compound (M6).
Figure JPOXMLDOC01-appb-I000010
[Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and n represent the same meaning as described above. ]
(Production Method D)
Compound (2) in which A1 is a sulfur atom in formula (1) can be produced by reacting compound (M7) with a sulfurizing agent.
Figure JPOXMLDOC01-appb-I000011
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
 (製造法E)
 式(1)においてnが0である化合物(3)は、例えば以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000012
[式中、R1、R2、R3、R4、R5、A1及びA2は前記と同じ意味を表し、V2はフッ素原子又は塩素原子を表す。]
(Production method E)
Compound (3) in which n is 0 in formula (1) can be produced, for example, by the following method.
Figure JPOXMLDOC01-appb-I000012
[Wherein R1, R2, R3, R4, R5, A1 and A2 represent the same meaning as described above, and V2 represents a fluorine atom or a chlorine atom. ]
 (製造法F)
 式(1)においてnが0である化合物(3)は、例えば以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000013
[式中、R1、R2、R3、R4、R5、A1、A2及びV2は前記と同じ意味を表す。]
(Production Method F)
Compound (3) in which n is 0 in formula (1) can be produced, for example, by the following method.
Figure JPOXMLDOC01-appb-I000013
[Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and V 2 represent the same meaning as described above. ]
 本縮合複素環化合物の製造法(製造法A)~(製造法F)について、以下さらに詳しく説明する。また本縮合複素環化合物から別の本縮合複素環化合物への製造法についても説明する。本縮合複素環化合物は、例えば、以下の(製造法1)~(製造法23により製造することができる。 The production methods (Production Method A) to (Production Method F) of the present condensed heterocyclic compound will be described in more detail below. In addition, a production method from the present condensed heterocyclic compound to another condensed heterocyclic compound will be described. The present condensed heterocyclic compound can be produced, for example, by the following (Production Method 1) to (Production Method 23).
(製造法1)(工程(C−1))
 式(1)においてA1が−NR6−である化合物(4)は、工程(C−1)に従い、化合物(M12)と化合物(M5)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000014
[式中、R1、R2、R3、R4、R5、R6、A2及びnは前記と同じ意味を表す。]
 該反応は、通常塩基、酸、亜硫酸塩あるいは二亜硫酸塩の存在下で行われる。該反応は、通常溶媒の存在下で行われる。
 反応に用いられる塩基としては、炭酸水素ナトリウム、炭酸水素カリウム等の炭酸水素塩類、炭酸ナトリウム、炭酸カリウム等の炭酸塩類及びこれらの混合物が挙げられる。
 反応に用いられる酸としては、p−トルエンスルホン酸等のスルホン酸類、酢酸等のカルボン酸類が挙げられる。
 反応に用いられる亜硫酸塩としては、亜硫酸ナトリウム、亜硫酸カリウム等が挙げられる。
 反応に用いられる二亜硫酸塩としては、二亜硫酸ナトリウム、二亜硫酸カリウム等が挙げられる。
 反応に用いられる溶媒としては、例えばテトラヒドロフラン(以下、THFと記す。)、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、N,N−ジメチルホルムアミド(以下、DMFと記す。)、N−メチルピロリドン(以下、NMPと記す。)等の酸アミド類、ジメチルスルホキシド(以下、DMSOと記す。)等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 該反応は、必要に応じて酸化剤を加えて行うこともできる。
 反応に用いられる酸化剤としては、例えば酸素、塩化銅(II)、2,3−ジクロロ−5,6−ジシアノ−p−ベンゾキノン等が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M5)が通常1~3モルの割合、塩基が通常1~5モルの割合、酸が通常1~5モルの割合、亜硫酸塩が通常1~5モルの割合、二亜硫酸塩が通常1~5モルの割合、酸化剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(4)を単離することができる。単離された化合物(4)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production Method 1) (Step (C-1))
Compound (4) in which A1 is -NR6- in formula (1) can be produced by reacting compound (M12) and compound (M5) according to step (C-1).
Figure JPOXMLDOC01-appb-I000014
[Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ]
The reaction is usually carried out in the presence of a base, acid, sulfite or disulfite. The reaction is usually performed in the presence of a solvent.
Examples of the base used for the reaction include bicarbonates such as sodium bicarbonate and potassium bicarbonate, carbonates such as sodium carbonate and potassium carbonate, and mixtures thereof.
Examples of the acid used for the reaction include sulfonic acids such as p-toluenesulfonic acid and carboxylic acids such as acetic acid.
Examples of the sulfite used in the reaction include sodium sulfite and potassium sulfite.
Examples of the disulfite used in the reaction include sodium disulfite and potassium disulfite.
Examples of the solvent used in the reaction include ethers such as tetrahydrofuran (hereinafter referred to as THF), ethylene glycol dimethyl ether, tert-butyl methyl ether, 1,4-dioxane, and aliphatic hydrocarbons such as hexane, heptane, and octane. , Aromatic hydrocarbons such as toluene and xylene, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, N, N-dimethylformamide (hereinafter referred to as DMF) ), Acid amides such as N-methylpyrrolidone (hereinafter referred to as NMP), sulfoxides such as dimethyl sulfoxide (hereinafter referred to as DMSO), nitrogen-containing aromatic compounds such as pyridine and quinoline, and the like. A mixture is mentioned.
The reaction can be carried out by adding an oxidizing agent as necessary.
Examples of the oxidizing agent used in the reaction include oxygen, copper (II) chloride, 2,3-dichloro-5,6-dicyano-p-benzoquinone, and the like.
In the reaction, with respect to 1 mol of the compound (M12), the compound (M5) is usually 1 to 3 mol, the base is usually 1 to 5 mol, the acid is usually 1 to 5 mol, sulfite Is usually used in a proportion of 1 to 5 mol, disulfite is usually used in a proportion of 1 to 5 mol, and oxidizing agent is usually used in a proportion of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (4) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer. The isolated compound (4) can be further purified by chromatography, recrystallization and the like.
(製造法2)(工程A−1)
 式(1)においてA1が−NR6−である化合物(4)は、工程(A−1)に従い、化合物(M12)と化合物(M2)とを、脱水縮合剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000015
[式中、R1、R2、R3、R4、R5、R6、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、tert−ブチルメチルエーテル、エチレングリコールジメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 反応に用いられる脱水縮合剤としては、1−エチル−3−(3−ジメチルアミノプロピル)カルボジイミド塩酸塩(以下、WSCと記す。)、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、(ベンゾトリアゾール−1−イルオキシ)トリス(ジメチルアミノ)ホスホニウムヘキサフルオロリン酸塩(以下、BOP試薬と記す。)等が挙げられる。
 該反応は、必要に応じて触媒を加えて行うこともできる。
 反応に用いられる触媒としては、1−ヒドロキシベンゾトリアゾール(以下、HOBtと記す。)等が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M2)が通常1~3モルの割合、脱水縮合剤が通常1~5モルの割合、触媒が通常0.01~0.1モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(4)を単離することができる。単離された化合物(4)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
 また、工程(B−1)に従い、化合物(M2)に代えて化合物(M4)を用い、上記方法に準じて化合物(4)を製造することもできる。
 化合物(M4)を用いる場合は、通常脱水縮合剤を加えずに行われる。必要に応じて塩基を加えて行うこともできる。
 塩基としては、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類等が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M4)が通常1~3モルの割合、塩基が通常1~10モルの割合で用いられる。
(Production Method 2) (Step A-1)
Compound (4) in which A1 is —NR6- in formula (1) is produced by reacting compound (M12) and compound (M2) in the presence of a dehydration condensing agent according to step (A-1). can do.
Figure JPOXMLDOC01-appb-I000015
[Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, tert-butyl methyl ether, ethylene glycol dimethyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine and quinoline Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride (hereinafter referred to as WSC), carbodiimides such as 1,3-dicyclohexylcarbodiimide, (benzotriazole- 1-yloxy) tris (dimethylamino) phosphonium hexafluorophosphate (hereinafter referred to as BOP reagent) and the like.
This reaction can also be performed by adding a catalyst as needed.
Examples of the catalyst used in the reaction include 1-hydroxybenzotriazole (hereinafter referred to as HOBt).
In the reaction, with respect to 1 mol of the compound (M12), the compound (M2) is usually in a proportion of 1 to 3 mol, the dehydrating condensing agent is usually in a proportion of 1 to 5 mol, and the catalyst is usually in a proportion of 0.01 to 0.1. Used in molar proportions.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (4) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer. The isolated compound (4) can be further purified by chromatography, recrystallization and the like.
Moreover, according to the step (B-1), the compound (M4) can be used instead of the compound (M2), and the compound (4) can be produced according to the above method.
When the compound (M4) is used, it is usually carried out without adding a dehydrating condensation agent. A base can be added as necessary.
Examples of the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
In the reaction, with respect to 1 mol of the compound (M12), the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
(製造法3)(工程(A−3)、工程(B−3))
 式(1)においてA1が−NR6−である化合物(4)は、工程(A−3)又は工程(B−3)に従い、化合物(M13)を脱水縮合することにより製造することができる。
Figure JPOXMLDOC01-appb-I000016
[式中、R1、R2、R3、R4、R5、R6、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、メタノール、エタノール、プロパノール、ブタノール、ペンタノール等のアルコール類及びこれらの混合物が挙げられる。
 該反応は必要に応じて、酸又は脱水剤を用いることができる。反応に用いられる酸としては、p−トルエンスルホン酸等のスルホン酸類、酢酸等のカルボン酸類が挙げられ、反応に用いられる脱水剤としては、オキシ塩化リン、無水酢酸、トリフルオロ酢酸無水物等が挙げられる。
 該反応には、化合物(M13)1モルに対して、酸又は脱水剤が通常1モル~10モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(4)を単離することができる。単離された化合物(4)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production Method 3) (Step (A-3), Step (B-3))
Compound (4) in which A1 is -NR6- in formula (1) can be produced by dehydrating condensation of compound (M13) according to step (A-3) or step (B-3).
Figure JPOXMLDOC01-appb-I000016
[Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, methanol, ethanol, propanol , Alcohols such as butanol and pentanol, and mixtures thereof.
In the reaction, an acid or a dehydrating agent can be used as necessary. Examples of the acid used in the reaction include sulfonic acids such as p-toluenesulfonic acid, and carboxylic acids such as acetic acid. Examples of the dehydrating agent used in the reaction include phosphorus oxychloride, acetic anhydride, trifluoroacetic anhydride, and the like. Can be mentioned.
In the reaction, with respect to 1 mol of the compound (M13), an acid or a dehydrating agent is usually used at a ratio of 1 mol to 10 mol.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (4) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (4) can be further purified by chromatography, recrystallization and the like.
(製造法4)(工程(A−3)、工程(B−3))
 式(1)においてA1が−NR6−である化合物(4)は、工程(A−3)又は工程(B−3)に従い、化合物(M13)を塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000017
[式中、R1、R2、R3、R4、R5、R6、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、メタノール、エタノール、プロパノール、ブタノール、tert−ブタノール、ペンタノール等のアルコール類及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、リン酸三カリウム等が挙げられる。
 該反応には、化合物(M13)1モルに対して、塩基が通常1モル~10モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(4)を単離することができる。単離された化合物(4)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production Method 4) (Step (A-3), Step (B-3))
Compound (4) in which A1 is -NR6- in formula (1) is produced by reacting compound (M13) in the presence of a base according to step (A-3) or step (B-3). Can do.
Figure JPOXMLDOC01-appb-I000017
[Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, methanol, ethanol, propanol , Butanol, tert-butanol, pentanol and the like, and mixtures thereof.
Examples of the base used for the reaction include tripotassium phosphate.
In the reaction, the base is generally used at a ratio of 1 mol to 10 mol with respect to 1 mol of the compound (M13).
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (4) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (4) can be further purified by chromatography, recrystallization and the like.
(製造法5)
 式(1)においてA1が−NR6−である化合物(4)は、化合物(5)と化合物(M14)とを塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000018
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表し、Lは塩素原子、臭素原子、ヨウ素原子、トリフルオロメチルスルホニルオキシ基及びメチルスルホニルオキシ基等の脱離基を表し、ここでR6は群Wより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基を表す。]
 該反応は、通常溶媒の存在下で行われる。
反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水素化ナトリウム、水素化カリウム、水素化カルシウム等のアルカリ金属もしくはアルカリ士類金属の水素化物、炭酸ナトリウム、炭酸カリウム等の無機塩基、又はトリエチルアミン等の有機塩基等が挙げられる。
 該反応には、化合物(5)1モルに対して、化合物(M14)が通常1~5モルの割合で用いられる。
 該反応には、化合物(5)1モルに対して、塩基が通常1~3モルの割合で用いられる。
 該反応の反応温度は、通常0~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(4)を単離することができる。単離された化合物(4)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production method 5)
Compound (4) in which A1 is -NR6- in formula (1) can be produced by reacting compound (5) with compound (M14) in the presence of a base.
Figure JPOXMLDOC01-appb-I000018
[Wherein R 1, R 2, R 3, R 4, R 5, A 2 and n represent the same meaning as described above, and L represents a chlorine atom, bromine atom, iodine atom, trifluoromethylsulfonyloxy group, methylsulfonyloxy group, etc. And R6 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group W. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
Examples of the base used in the reaction include alkali metal or alkali metal hydrides such as sodium hydride, potassium hydride and calcium hydride, inorganic bases such as sodium carbonate and potassium carbonate, or organic bases such as triethylamine. Is mentioned.
In the reaction, compound (M14) is usually used at a ratio of 1 to 5 mol per 1 mol of compound (5).
In the reaction, the base is usually used at a ratio of 1 to 3 mol with respect to 1 mol of the compound (5).
The reaction temperature of the reaction is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (4) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (4) can be further purified by chromatography, recrystallization and the like.
(製造法6)(工程(A−1))
 式(1)においてA1が酸素原子である化合物(6)は、工程(A−1)に従い、化合物(M15)と化合物(M2)とを、酸の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000019
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下または非存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン、ジクロロベンゼン等のハロゲン化炭化水素類及びこれらの混合物が挙げられる。
 反応に用いられる酸としては、ポリリン酸やトリメチルシリルポリホスフェート等が挙げられる。
 該反応は、酸としてポリリン酸を用いる場合は通常無溶媒で行うが、溶媒中で行ってもよい。
 該反応には、化合物(M15)1モルに対して、化合物(M2)が通常1~3モルの割合、酸が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常50~200℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を水に注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(6)を単離することができる。単離された化合物(6)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
 また、化合物(M2)に代えて化合物(M4)を用い、工程(B−1)に従い、上記方法に準じて化合物(6)を製造することもできる。
 化合物(M4)を用いる場合は、通常脱水縮合剤を加えずに行われる。必要に応じて塩基を加えて行うこともできる。
 塩基としては、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類等が挙げられる。
 該反応には、化合物(M15)1モルに対して、化合物(M4)が通常1~3モルの割合、塩基が通常1~10モルの割合で用いられる。
(Manufacturing method 6) (Process (A-1))
Compound (6) in which A1 is an oxygen atom in formula (1) can be produced by reacting compound (M15) and compound (M2) in the presence of an acid according to step (A-1). it can.
Figure JPOXMLDOC01-appb-I000019
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence or absence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene and dichlorobenzene, and mixtures thereof.
Examples of the acid used for the reaction include polyphosphoric acid and trimethylsilyl polyphosphate.
The reaction is usually carried out without a solvent when polyphosphoric acid is used as the acid, but it may be carried out in a solvent.
In the reaction, with respect to 1 mol of the compound (M15), the compound (M2) is usually used in a proportion of 1 to 3 mol, and the acid is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of 50 to 200 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (6) can be isolated by performing post-treatment operations such as pouring the reaction mixture into water, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (6) can be further purified by chromatography, recrystallization and the like.
Moreover, it can replace with a compound (M2) and can use a compound (M4) and can manufacture a compound (6) according to the said method according to a process (B-1).
When the compound (M4) is used, it is usually carried out without adding a dehydrating condensation agent. A base can be added as necessary.
Examples of the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
In the reaction, with respect to 1 mol of the compound (M15), the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
(製造法7)(工程(C−3))
 式(1)においてA1が酸素原子である化合物(6)は、工程(C−3)に従い、化合物(M16)を酸化反応に付すことにより製造することができる。
Figure JPOXMLDOC01-appb-I000020
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、クロロホルム、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、メタノール、エタノール等のアルコール類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、酢酸及びこれらの混合物が挙げられる。
 反応に用いられる酸化剤としては、酢酸鉛(IV)、酸化鉛(IV)等の金属酸化剤、ヨードベンゼンジアセタート等の超原子価ヨウ素化合物等が挙げられる。
 該反応には、化合物(M16)1モルに対して、酸化剤が通常1~3モルの割合で用いられる。
 該反応の反応温度は、通常0~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(6)を単離することができる。単離された化合物(6)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Manufacturing method 7) (Process (C-3))
Compound (6) in which A1 is an oxygen atom in formula (1) can be produced by subjecting compound (M16) to an oxidation reaction according to step (C-3).
Figure JPOXMLDOC01-appb-I000020
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as dichloromethane, chloroform and chlorobenzene, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, nitriles such as acetonitrile, and acid amides such as DMF and NMP , Sulfoxides such as DMSO, acetic acid and mixtures thereof.
Examples of the oxidizing agent used in the reaction include metal oxidizing agents such as lead (IV) acetate and lead (IV) oxide, hypervalent iodine compounds such as iodobenzene diacetate, and the like.
In the reaction, with respect to 1 mol of the compound (M16), the oxidizing agent is usually used at a ratio of 1 to 3 mol.
The reaction temperature of the reaction is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (6) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (6) can be further purified by chromatography, recrystallization and the like.
(製造法8)(工程(A−3)、工程(B−3))
 式(1)においてA1が酸素原子である化合物(6)は、工程(A−3)又は工程(B−3)に従い、化合物(M17)を脱水縮合剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000021
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、クロロホルム、四塩化炭素、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類及びこれらの混合物が挙げられる。このうち、四塩化炭素は、脱水縮合剤としても用いることができる。
 反応に用いられる脱水縮合剤としては、トリフェニルホスフィンと塩基と四塩化炭素もしくは四臭化炭素との混合物、トリフェニルホスフィンとアゾジカルボン酸ジエチルエステル等のアゾジエステル類との混合物等が挙げられる。
 反応に用いられる塩基としては、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類等が挙げられる。
 該反応には、化合物(M17)1モルに対して、脱水縮合剤が通常1~3モルの割合で用いられる。塩基を用いる場合は、化合物(M17)1モルに対して、塩基が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常−30~100℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(6)を単離することができる。単離された化合物(6)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production Method 8) (Step (A-3), Step (B-3))
Compound (6) in which A1 is an oxygen atom in formula (1) is produced by reacting compound (M17) in the presence of a dehydration condensing agent according to step (A-3) or step (B-3). be able to.
Figure JPOXMLDOC01-appb-I000021
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, dichloromethane, chloroform, carbon tetrachloride, Examples include halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, and mixtures thereof. Of these, carbon tetrachloride can also be used as a dehydrating condensing agent.
Examples of the dehydrating condensing agent used in the reaction include a mixture of triphenylphosphine, a base, and carbon tetrachloride or carbon tetrabromide, a mixture of triphenylphosphine and an azodiester such as azodicarboxylic acid diethyl ester, and the like.
Examples of the base used in the reaction include tertiary amines such as triethylamine and diisopropylethylamine.
In the reaction, the dehydrating condensing agent is usually used at a ratio of 1 to 3 moles relative to 1 mole of the compound (M17). When a base is used, the base is usually used at a ratio of 1 to 5 mol with respect to 1 mol of the compound (M17).
The reaction temperature is usually in the range of −30 to 100 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (6) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (6) can be further purified by chromatography, recrystallization and the like.
(製造法9)(工程(A−3)、工程(B−3))
 式(1)においてA1が酸素原子である化合物(6)は、工程(A−3)又は工程(B−3)に従い、化合物(M17)を酸の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000022
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、クロロホルム、クロロベンゼン等のハロゲン化炭化水素類及びこれらの混合物が挙げられる。
 上記酸としては、p−トルエンスルホン酸等のスルホン酸類、ポリリン酸等が挙げられる。
 該反応には、化合物(M17)1モルに対して、酸が通常0.1~3モルの割合で用いられる。
 該反応の反応温度は、通常50~200℃の範囲である。該反応の反応時間は通常1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(6)を単離することができる。単離された化合物(6)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production Method 9) (Step (A-3), Step (B-3))
Compound (6) in which A1 is an oxygen atom in formula (1) can be produced by reacting compound (M17) in the presence of an acid according to step (A-3) or step (B-3). it can.
Figure JPOXMLDOC01-appb-I000022
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and halogens such as dichloromethane, chloroform, and chlorobenzene. Hydrocarbons and mixtures thereof.
Examples of the acid include sulfonic acids such as p-toluenesulfonic acid, polyphosphoric acid, and the like.
In the reaction, an acid is usually used at a ratio of 0.1 to 3 mol with respect to 1 mol of the compound (M17).
The reaction temperature of the reaction is usually in the range of 50 to 200 ° C. The reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (6) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (6) can be further purified by chromatography, recrystallization and the like.
(製造法10)(工程(C−1))
 式(1)においてA1が硫黄原子である化合物(2)は、工程(C−1)に従い、化合物(M18)と化合物(M5)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000023
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常塩基、酸、亜硫酸塩あるいは二亜硫酸塩の存在下で行われる。反応に用いられる塩基としては、炭酸水素ナトリウム、炭酸水素カリウム等の炭酸水素塩類、炭酸ナトリウム、炭酸カリウム等の炭酸塩類及びこれらの混合物が挙げられる。
 反応に用いられる酸としては、p−トルエンスルホン酸等のスルホン酸類、酢酸等のカルボン酸類が挙げられる。
 反応に用いられる亜硫酸塩としては、亜硫酸ナトリウム、亜硫酸カリウム等が挙げられる。
 反応に用いられる二亜硫酸塩としては、二亜硫酸ナトリウム、二亜硫酸カリウム等が挙げられる。
該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えば、THF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、N−、NMP等の酸アミド類、DMSO等のスルホキシド類、トルエン、キシレン、ニトロベンゼン等の芳香族炭化水素類及びこれらの混合物が挙げられる。
 該反応は、必要に応じて酸化剤を加えて行うこともできる。
 反応に用いられる酸化剤としては、例えば酸素、塩化銅(II)、2,3−ジクロロ−5,6−ジシアノ−p−ベンゾキノン等が挙げられる。
 該反応には、化合物(M18)1モルに対して、化合物(M5)が通常1~3モルの割合、塩基が1~5モルの割合、酸が通常1~5モルの割合、亜硫酸塩が通常1~5モルの割合、二亜硫酸塩が通常1~5モルの割合、酸化剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常50~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を水に加えた後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(2)を単離することができる。単離された化合物(2)は、クロマトグラフィー、再結晶等により精製することもできる。
(Manufacturing method 10) (Process (C-1))
Compound (2) in which A1 is a sulfur atom in formula (1) can be produced by reacting compound (M18) and compound (M5) according to step (C-1).
Figure JPOXMLDOC01-appb-I000023
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually carried out in the presence of a base, acid, sulfite or disulfite. Examples of the base used in the reaction include hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate, carbonates such as sodium carbonate and potassium carbonate, and mixtures thereof.
Examples of the acid used for the reaction include sulfonic acids such as p-toluenesulfonic acid and carboxylic acids such as acetic acid.
Examples of the sulfite used in the reaction include sodium sulfite and potassium sulfite.
Examples of the disulfite used in the reaction include sodium disulfite and potassium disulfite.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and halogenation such as chlorobenzene. Hydrocarbons, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF, N- and NMP, sulfoxides such as DMSO, and aromatic hydrocarbons such as toluene, xylene and nitrobenzene And mixtures thereof.
The reaction can be carried out by adding an oxidizing agent as necessary.
Examples of the oxidizing agent used in the reaction include oxygen, copper (II) chloride, 2,3-dichloro-5,6-dicyano-p-benzoquinone, and the like.
In the reaction, with respect to 1 mole of the compound (M18), the ratio of the compound (M5) is usually 1 to 3 moles, the base is 1 to 5 moles, the acid is usually 1 to 5 moles, and the sulfite is added. Usually, 1 to 5 moles, disulfite is usually used in 1 to 5 moles, and oxidizing agent is usually used in 1 to 5 moles.
The reaction temperature of the reaction is usually in the range of 50 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (2) can be isolated by performing post-treatment operations such as addition of the reaction mixture to water, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (2) can also be purified by chromatography, recrystallization and the like.
(製造法11)(工程(C−1))
 式(1)においてA1が硫黄原子である化合物(2)は、工程(C−1)に従い、化合物(M18)の塩酸塩と化合物(M5)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000024
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、塩基の存在下、通常溶媒の存在下で行われる。
 反応に用いられる塩基としては、例えばジイソプロピルエチルアミン、トリエチルアミン等の第三級アミンが挙げられる。
 反応に用いられる溶媒としては、例えばDMSO等のスルホキシド類、ニトロベンゼン等の芳香族炭化水素類及びこれらの混合物が挙げられる。
 該反応には、化合物(M18)1モルに対して、化合物(M5)が通常0.5~3モルの割合で用いられ、塩基が通常1~2モルの割合で用いられる。
 該反応の反応温度は、通常50~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を水に加えた後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(2)を単離することができる。単離された化合物(2)は、クロマトグラフィー、再結晶等により精製することもできる。
(Manufacturing method 11) (Process (C-1))
Compound (2) in which A1 is a sulfur atom in formula (1) can be produced by reacting hydrochloride of compound (M18) with compound (M5) according to step (C-1).
Figure JPOXMLDOC01-appb-I000024
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is carried out in the presence of a base and usually in the presence of a solvent.
Examples of the base used in the reaction include tertiary amines such as diisopropylethylamine and triethylamine.
Examples of the solvent used in the reaction include sulfoxides such as DMSO, aromatic hydrocarbons such as nitrobenzene, and mixtures thereof.
In the reaction, the compound (M5) is usually used at a ratio of 0.5 to 3 moles and the base is usually used at a ratio of 1 to 2 moles relative to 1 mole of the compound (M18).
The reaction temperature of the reaction is usually in the range of 50 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (2) can be isolated by performing post-treatment operations such as addition of the reaction mixture to water, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (2) can also be purified by chromatography, recrystallization and the like.
(製造法12)
 式(1)においてR5がシアノ基又はC1−C3アルキル基である化合物(8)は、化合物(7)とシアノ化剤又はジ(C1−C3アルキル)亜鉛とを、パラジウム化合物の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000025
[式中、R1、R2、R3、R4、A1、A2及びnは前記と同じ意味を表し、V1は臭素原子又はヨウ素原子等の脱離基を表し、R5zはシアノ基又はC1−C3アルキル基を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、メタノール、エタノール等のアルコール類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類及びこれらの混合物が挙げられる。
 反応に用いられるシアノ化剤としては、例えばシアン化亜鉛が挙げられ、ジ(C1−C3アルキル)亜鉛としては、例えば、ジメチル亜鉛、ジエチル亜鉛、ジイソプロピル亜鉛が挙げられる。
 反応に用いられるパラジウム化合物としては、テトラキス(トリフェニルフォスフィン)パラジウム等が挙げられる。
 該反応には、化合物(7)1モルに対して、シアノ化剤又はジ(C1−C3アルキル)亜鉛が通常1~5モルの割合、パラジウム化合物が通常0.01~0.5モルの割合で用いられる。
 該反応の反応温度は、通常50~200℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(8)を単離することができる。単離された化合物(8)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production method 12)
Compound (8) in which R5 in formula (1) is a cyano group or a C1-C3 alkyl group is obtained by reacting compound (7) with a cyanating agent or di (C1-C3 alkyl) zinc in the presence of a palladium compound. Can be manufactured.
Figure JPOXMLDOC01-appb-I000025
[Wherein R1, R2, R3, R4, A1, A2 and n represent the same meaning as described above, V1 represents a leaving group such as a bromine atom or an iodine atom, and R5z represents a cyano group or a C1-C3 alkyl group. Represents. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, alcohols such as methanol and ethanol, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof.
Examples of the cyanating agent used in the reaction include zinc cyanide, and examples of the di (C1-C3 alkyl) zinc include dimethyl zinc, diethyl zinc, and diisopropyl zinc.
Examples of the palladium compound used for the reaction include tetrakis (triphenylphosphine) palladium.
In the reaction, with respect to 1 mol of the compound (7), the cyanating agent or di (C1-C3 alkyl) zinc is usually in a proportion of 1 to 5 mol, and the palladium compound is usually in a proportion of 0.01 to 0.5 mol. Used in
The reaction temperature of the reaction is usually in the range of 50 to 200 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (8) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (8) can be further purified by chromatography, recrystallization and the like.
(製造法13)
 式(1)においてR5がC1−C3パーフルオロアルキル基である化合物(9)は、化合物(7)と化合物(M19)とを、ヨウ化銅の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000026
[式中、R1、R2、R3、R4、A1、A2、n及びV1は前記と同じ意味を表し、RfはC1−C3パーフルオロアルキル基を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばトルエン、キシレン等の芳香族炭化水素類、DMF、NMP等の酸アミド類及びこれらの混合物が挙げられる。
 該反応には、化合物(7)1モルに対して、化合物(M19)が通常1~10モルの割合、ヨウ化銅が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常50~200℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(9)を単離することができる。単離された化合物(9)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production method 13)
Compound (9) in which R5 is a C1-C3 perfluoroalkyl group in formula (1) can be produced by reacting compound (7) and compound (M19) in the presence of copper iodide. .
Figure JPOXMLDOC01-appb-I000026
[Wherein R1, R2, R3, R4, A1, A2, n and V1 represent the same meaning as described above, and Rf represents a C1-C3 perfluoroalkyl group. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include aromatic hydrocarbons such as toluene and xylene, acid amides such as DMF and NMP, and mixtures thereof.
In the reaction, with respect to 1 mol of the compound (7), the compound (M19) is usually used in a proportion of 1 to 10 mol, and copper iodide is usually used in a proportion of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 50 to 200 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (9) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (9) can be further purified by chromatography, recrystallization and the like.
(製造法14)(工程(E−4))
 式(1)においてnが0である化合物(3)は、工程(E−4)に従い、化合物(M10)と化合物(M20)とを、塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000027
[式中、R1、R2、R3、R4、R5、A1、A2及びV2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えば水、THF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、メタノール、エタノール等のアルコール類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水素化ナトリウム等のアルカリ金属水素化物類が挙げられる。
 該反応には、化合物(M10)1モルに対して、化合物(M20)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常0~150℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(3)を単離することができる。単離された化合物(3)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Manufacturing method 14) (Process (E-4))
Compound (3) in which n is 0 in formula (1) can be produced by reacting compound (M10) and compound (M20) in the presence of a base according to step (E-4). .
Figure JPOXMLDOC01-appb-I000027
[Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and V 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include water, THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, ethers such as 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, alcohols such as methanol and ethanol. Nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof.
Examples of the base used for the reaction include alkali metal hydrides such as sodium hydride.
In the reaction, with respect to 1 mol of the compound (M10), the compound (M20) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of 0 to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (3) can be further purified by chromatography, recrystallization and the like.
(製造法15)(工程(F−2))
 式(1)においてnが0である化合物(3)は、工程(F−2)に従い、化合物(M11)と化合物(M21)とを塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000028
[式中、R1、R2、R3、R4、R5、A1、A2及びLは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水素化ナトリウム、水素化カリウム、水素化カルシウム等のアルカリ金属もしくはアルカリ土類金属の水素化物、炭酸ナトリウム、炭酸カリウム等の無機塩基、又はトリエチルアミン等の有機塩基が挙げられる。
 該反応には、化合物(M11)1モルに対して、塩基が通常1~3モルの割合、化合物(M21)が通常1~3モルの割合で用いられる。
 該反応の反応温度は、通常0~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(3)を単離することができる。単離された化合物(3)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Manufacturing method 15) (Process (F-2))
Compound (3) in which n is 0 in formula (1) can be produced by reacting compound (M11) and compound (M21) in the presence of a base according to step (F-2).
Figure JPOXMLDOC01-appb-I000028
[Wherein R 1, R 2, R 3, R 4, R 5, A 1, A 2 and L represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
Examples of the base used in the reaction include alkali metal or alkaline earth metal hydrides such as sodium hydride, potassium hydride and calcium hydride, inorganic bases such as sodium carbonate and potassium carbonate, and organic bases such as triethylamine. Can be mentioned.
In the reaction, with respect to 1 mol of the compound (M11), the base is usually used at a ratio of 1 to 3 mol, and the compound (M21) is usually used at a ratio of 1 to 3 mol.
The reaction temperature of the reaction is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours. After completion of the reaction, the compound (3) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (3) can be further purified by chromatography, recrystallization and the like.
(製造法16)
 式(1)においてnが1である化合物(10)は、化合物(3)を酸化反応に付すことにより製造することができる。
Figure JPOXMLDOC01-appb-I000029
[式中、R1、R2、R3、R4、R5、A1及びA2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール等のアルコール類、酢酸、水及びこれらの混合物が挙げられる。
 反応に用いられる酸化剤としては、例えば過ヨウ素酸ナトリウム又はm−クロロ過安息香酸が挙げられる。
 該反応には、化合物(3)1モルに対して、酸化剤が通常1~3モルの割合で用いられる。好ましくは、化合物(3)1モルに対して、酸化剤が1~1.2モルの割合で用いられる。
 該反応の反応温度は、通常−20~80℃の範囲である。該反応の反応時間は通常0.1~12時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄し、乾燥、濃縮する等の後処理操作を行うことにより、化合物(10)を単離することができる。単離された化合物(10)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production Method 16)
Compound (10) in which n is 1 in formula (1) can be produced by subjecting compound (3) to an oxidation reaction.
Figure JPOXMLDOC01-appb-I000029
[Wherein R 1, R 2, R 3, R 4, R 5, A 1 and A 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
Examples of the oxidizing agent used in the reaction include sodium periodate and m-chloroperbenzoic acid.
In the reaction, an oxidizing agent is usually used at a ratio of 1 to 3 moles relative to 1 mole of the compound (3). Preferably, the oxidizing agent is used in a proportion of 1 to 1.2 mol with respect to 1 mol of compound (3).
The reaction temperature is usually in the range of −20 to 80 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried, The compound (10) can be isolated by performing post-treatment operations such as concentration. The isolated compound (10) can be further purified by chromatography, recrystallization and the like.
(製造法17)
 式(1)においてnが2である化合物(11)は、化合物(3)を酸化剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000030
[式中、R1、R2、R3、R4、R5、A1及びA2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール等のアルコール類、酢酸、水及びこれらの混合物が挙げられる。
 反応に用いられる酸化剤としては、例えばm−クロロ過安息香酸又は過酸化水素水が挙げられる。
 該反応には、化合物(3)1モルに対して、酸化剤が通常2~5モルの割合で用いられる。好ましくは、化合物(3)1モルに対して、酸化剤が2~3モルの割合で用いられる。
 該反応の反応温度は、通常−20~120℃の範囲である。該反応の反応時間は通常0.1~12時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄し、乾燥、濃縮する等の後処理操作を行うことにより、化合物(11)を単離することができる。単離された化合物(11)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production Method 17)
Compound (11) wherein n is 2 in formula (1) can be produced by reacting compound (3) in the presence of an oxidizing agent.
Figure JPOXMLDOC01-appb-I000030
[Wherein, R1, R2, R3, R4, R5, A1 and A2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
Examples of the oxidizing agent used in the reaction include m-chloroperbenzoic acid or hydrogen peroxide water.
In the reaction, an oxidizing agent is usually used in a ratio of 2 to 5 mol with respect to 1 mol of the compound (3). Preferably, the oxidizing agent is used in a ratio of 2 to 3 moles with respect to 1 mole of the compound (3).
The reaction temperature of the reaction is usually in the range of −20 to 120 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried, Compound (11) can be isolated by performing post-treatment operations such as concentration. The isolated compound (11) can be further purified by chromatography, recrystallization and the like.
(製造法18)
 式(1)においてnが2である化合物(11)は、化合物(10)を酸化剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000031
[式中、R1、R2、R3、R4、R5、A1及びA2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール等のアルコール類、酢酸、水及びこれらの混合物が挙げられる。
 反応に用いられる酸化剤としては、例えばm−クロロ過安息香酸又は過酸化水素水が挙げられる。
 該反応には、化合物(10)1モルに対して、酸化剤が通常1~4モルの割合で用いられる。好ましくは、化合物(10)1モルに対して、酸化剤が1~2モルの割合で用いられる。
 該反応の反応温度は、通常−20~120℃の範囲である。該反応の反応時間は通常0.1~12時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄し、乾燥、濃縮する等の後処理操作を行うことにより、化合物(11)を単離することができる。単離された化合物(11)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production method 18)
Compound (11) in which n is 2 in formula (1) can be produced by reacting compound (10) in the presence of an oxidizing agent.
Figure JPOXMLDOC01-appb-I000031
[Wherein, R1, R2, R3, R4, R5, A1 and A2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
Examples of the oxidizing agent used in the reaction include m-chloroperbenzoic acid or hydrogen peroxide water.
In the reaction, the oxidizing agent is usually used at a ratio of 1 to 4 moles relative to 1 mole of the compound (10). Preferably, the oxidizing agent is used in a ratio of 1 to 2 moles relative to 1 mole of the compound (10).
The reaction temperature of the reaction is usually in the range of −20 to 120 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried, Compound (11) can be isolated by performing post-treatment operations such as concentration. The isolated compound (11) can be further purified by chromatography, recrystallization and the like.
(製造法19)(工程(A−3)、工程(B−3))
 式(1)においてA1が硫黄原子である化合物(2)は、工程(A−3)又は工程(B−3)に従い、化合物(M22)を酸の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000032
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、クロロホルム、クロロベンゼン等のハロゲン化炭化水素類及びこれらの混合物が挙げられる。
 反応に用いられる酸としては、例えばp−トルエンスルホン酸等のスルホン酸類、ポリリン酸が挙げられる。
 該反応には、化合物(M22)1モルに対して、酸が通常0.1~3モルの割合で用いられる。
 該反応の反応温度は、通常50~200℃の範囲である。該反応の反応時間は通常1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(2)を単離することができる。単離された化合物(2)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production Method 19) (Step (A-3), Step (B-3))
Compound (2) in which A1 is a sulfur atom in formula (1) can be produced by reacting compound (M22) in the presence of an acid according to step (A-3) or step (B-3). it can.
Figure JPOXMLDOC01-appb-I000032
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and halogens such as dichloromethane, chloroform, and chlorobenzene. Hydrocarbons and mixtures thereof.
Examples of the acid used for the reaction include sulfonic acids such as p-toluenesulfonic acid and polyphosphoric acid.
In the reaction, an acid is usually used at a ratio of 0.1 to 3 mol with respect to 1 mol of the compound (M22).
The reaction temperature of the reaction is usually in the range of 50 to 200 ° C. The reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the compound (2) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (2) can be further purified by chromatography, recrystallization and the like.
(製造法20)
 式(1)において、R5が−SHで示される化合物(12−a)、化合物(12−a)のジスルフィド体化合物である化合物(12−b)、R5が−SR7で示される化合物(13)、R5が−S(O)mR7で示される化合物(14)は、例えば以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000033
[式中、R1、R2、R3、R4、R7、A1、A2、n、m、V1及びLは前記と同じ意味を表す。]
工程(22−1)
 化合物(12−a)及び/又は化合物(12−b)は、化合物(7)とチオール化剤とを、触媒の存在下反応させることにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばトルエン、キシレン等の芳香族炭化水素類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、及びこれらの混合物が挙げられる。
 反応に用いられるチオール化剤としては、例えば硫化ナトリウム、硫化ナトリウム9水和物、チオウレアが挙げられる。
 反応に用いられる触媒としては、例えば塩化銅(I)、臭化銅(I)、ヨウ化銅(I)が挙げられる。
 該反応は必要に応じて塩基の存在下で行うこともできる。
 反応に用いられる塩基としては、例えば炭酸カリウム、炭酸セシウム、リン酸三カリウム、トリエチルアミンが挙げられる。
 該反応には、化合物(7)1モルに対して、チオール化剤が通常1~10モルの割合、触媒が通常0.1~5モルの割合で用いられる。
 該反応の反応温度は、通常50~200℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(12−a)及び/又は化合物(12−b)を単離することができる。単離された化合物(12−a)及び/又は化合物(12−b)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Production method 20)
In formula (1), compound (12-a) wherein R5 is represented by -SH, compound (12-b) which is a disulfide compound of compound (12-a), compound (13) wherein R5 is represented by -SR7 The compound (14) wherein R5 is -S (O) mR7 can be produced, for example, by the following method.
Figure JPOXMLDOC01-appb-I000033
[Wherein R1, R2, R3, R4, R7, A1, A2, n, m, V1 and L represent the same meaning as described above. ]
Step (22-1)
Compound (12-a) and / or compound (12-b) can be produced by reacting compound (7) with a thiolating agent in the presence of a catalyst.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include aromatic hydrocarbons such as toluene and xylene, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof.
Examples of the thiolating agent used in the reaction include sodium sulfide, sodium sulfide nonahydrate, and thiourea.
Examples of the catalyst used in the reaction include copper (I) chloride, copper (I) bromide, and copper (I) iodide.
This reaction can also be performed in presence of a base as needed.
Examples of the base used in the reaction include potassium carbonate, cesium carbonate, tripotassium phosphate, and triethylamine.
In the reaction, with respect to 1 mol of the compound (7), the thiolating agent is usually used in a proportion of 1 to 10 mol, and the catalyst is usually used in a proportion of 0.1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 50 to 200 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (12-a) and / or the compound (12-b) is isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. be able to. The isolated compound (12-a) and / or compound (12-b) can be further purified by chromatography, recrystallization and the like.
工程(22−2)
 化合物(13)は、化合物(12−a)及び/又は化合物(12−b)と化合物(M23)とを塩基の存在下に反応させることにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えば、メタノール、エタノール等のアルコール類、1,4−ジオキサン、ジエチルエーテル、THF、tert−ブチルメチルエーテル等のエーテル類、ジクロロメタン、クロロホルム、四塩化炭素、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素類、トルエン、ベンゼン、キシレン等の芳香族炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP、1,3−ジメチル−2−イミダゾリジノン、ジメチルスルホキシド等の非プロトン性極性溶媒、ピリジン、キノリン等の含窒素芳香族化合物類、水およびこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えばピリジン、ピコリン、2,6−ルチジン、ジアザビシクロウンデセン(以下、DBUと記す。)、1,5−ジアザビシクロ〔4.3.0〕−5−ノネン等の含窒素複素環化合物、トリエチルアミン、N−エチルジイソプロピルアミン等の第3級アミン、リン酸三カリウム、炭酸カリウム、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム等の無機塩基が挙げられる。
 該反応には、化合物(12−a)及び/又は化合物(12−b)1モルに対して、化合物(M23)が通常1~10モルの割合、塩基が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常0~120℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(13)を単離することができる。単離された化合物(13)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
Step (22-2)
Compound (13) can be produced by reacting compound (12-a) and / or compound (12-b) with compound (M23) in the presence of a base.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include alcohols such as methanol and ethanol, ethers such as 1,4-dioxane, diethyl ether, THF and tert-butyl methyl ether, dichloromethane, chloroform, carbon tetrachloride, and 1,2. -Halogenated hydrocarbons such as dichloroethane and chlorobenzene, aromatic hydrocarbons such as toluene, benzene and xylene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, DMF, NMP, 1,3-dimethyl Examples thereof include aprotic polar solvents such as 2-imidazolidinone and dimethyl sulfoxide, nitrogen-containing aromatic compounds such as pyridine and quinoline, water, and mixtures thereof.
Examples of the base used in the reaction include pyridine, picoline, 2,6-lutidine, diazabicycloundecene (hereinafter referred to as DBU), 1,5-diazabicyclo [4.3.0] -5-nonene, and the like. And nitrogen-containing heterocyclic compounds, tertiary amines such as triethylamine and N-ethyldiisopropylamine, and inorganic bases such as tripotassium phosphate, potassium carbonate, sodium hydride, sodium hydroxide and potassium hydroxide.
In the reaction, with respect to 1 mol of the compound (12-a) and / or the compound (12-b), the compound (M23) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 5 mol. It is done.
The reaction temperature of the reaction is usually in the range of 0 to 120 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (13) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (13) can be further purified by chromatography, recrystallization and the like.
工程(22−3)
 化合物(14)において、mが1又は2である化合物は、化合物(13)を酸化反応に付すことにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール等のアルコール類、酢酸、水及びこれらの混合物が挙げられる。
 反応に用いられる酸化剤としては、例えばm−クロロ過安息香酸又は過酸化水素水が挙げられる。
 該反応は必要に応じて触媒の存在下で行うこともできる。
 反応に用いられる触媒としては、例えばタングステン酸ナトリウムが挙げられる。
 該反応には、化合物(13)1モルに対して、酸化剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常−20~120℃の範囲である。該反応の反応時間は通常0.1~12時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄し、乾燥、濃縮する等の後処理操作を行うことにより、化合物(14)を単離することができる。単離された化合物(14)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
Step (22-3)
In compound (14), a compound wherein m is 1 or 2 can be produced by subjecting compound (13) to an oxidation reaction.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
Examples of the oxidizing agent used in the reaction include m-chloroperbenzoic acid or hydrogen peroxide water.
The reaction can be carried out in the presence of a catalyst as necessary.
Examples of the catalyst used in the reaction include sodium tungstate.
In the reaction, with respect to 1 mole of the compound (13), the oxidizing agent is usually used at a ratio of 1 to 5 moles.
The reaction temperature of the reaction is usually in the range of −20 to 120 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried, Compound (14) can be isolated by post-treatment such as concentration. The isolated compound (14) can be further purified by chromatography, recrystallization and the like.
(製造法21)
 式(1)において、R5が−OR7である化合物(15)は、例えば以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000034
[式中、R1、R2、R3、R4、R7、A1、A2、V1及びnは前記と同じ意味を表す。]
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水素化ナトリウム、水素化カリウム、水素化カルシウム等のアルカリ金属もしくはアルカリ土類金属の水素化物、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩基、又はトリエチルアミン等の有機塩基が挙げられる。
 該反応は、必要に応じて銅化合物を加えて行うこともできる。
 反応に用いられる銅化合物としては、例えば銅、ヨウ化銅(I)、臭化銅(I)、塩化銅(I)が挙げられる。
 該反応には、化合物(7)1モルに対して、化合物(M24)が通常1~5モルの割合で用いられ、塩基が通常1~3モルの割合で用いられる。
 該反応の反応温度は、通常20~250℃の範囲である。該反応の反応時間は通常0.1~48時間の範囲である。反応終了後は、反応混合物を水に注加してから有機溶媒抽出し、有機層を濃縮する;反応混合物を水に注加して生じた固体を濾過により集める;または、反応混合物中に生成した固体を濾過により集めることにより化合物(15)を単離することができる。単離された化合物(15)は、再結晶、クロマトグラフィ−等により更に精製することもできる。
(Production method 21)
In the formula (1), the compound (15) in which R5 is —OR7 can be produced, for example, by the following method.
Figure JPOXMLDOC01-appb-I000034
[Wherein, R1, R2, R3, R4, R7, A1, A2, V1, and n represent the same meaning as described above. ]
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
Examples of the base used in the reaction include alkali metal or alkaline earth metal hydrides such as sodium hydride, potassium hydride and calcium hydride, inorganic bases such as sodium carbonate, potassium carbonate and cesium carbonate, or triethylamine. An organic base is mentioned.
This reaction can also be performed by adding a copper compound as necessary.
Examples of the copper compound used for the reaction include copper, copper (I) iodide, copper (I) bromide, and copper (I) chloride.
In the reaction, the compound (M24) is usually used in a proportion of 1 to 5 mol and the base is usually used in a proportion of 1 to 3 mol with respect to 1 mol of the compound (7).
The reaction temperature of the reaction is usually in the range of 20 to 250 ° C. The reaction time is usually in the range of 0.1 to 48 hours. After completion of the reaction, the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture The collected solid can be collected by filtration to isolate compound (15). The isolated compound (15) can be further purified by recrystallization, chromatography or the like.
(製造法22)(工程(A−1))
 式(1)においてA1が硫黄原子である化合物(2)は、工程(A−1)に従い、化合物(M18)と化合物(M2)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000035
 [式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、tert−ブチルメチルエーテル、エチレングリコールジメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 反応に用いられる脱水縮合剤としては、WSC、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、BOP試薬等が挙げられる。
 該反応は、必要に応じて触媒を加えて行うこともできる。
 反応に用いられる触媒としては、HOBt等が挙げられる。
 該反応には、化合物(M18)1モルに対して、化合物(M2)が通常1~3モルの割合、脱水縮合剤が通常1~5モルの割合、触媒が通常0.01~0.1モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(2)を単離することができる。単離された化合物(2)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
 また、化合物(M2)に代えて化合物(M4)を用い、工程(B−1)に従い、上記方法に準じて化合物(2)を製造することもできる。
 化合物(M4)を用いる場合は、通常脱水縮合剤を加えずに行われる。必要に応じて塩基を加えて行うこともできる。
 塩基としては、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類等が挙げられる。
 該反応には、化合物(M18)1モルに対して、化合物(M4)が通常1~3モルの割合、塩基が通常1~10モルの割合で用いられる。
(Manufacturing method 22) (Process (A-1))
Compound (2) in which A1 is a sulfur atom in formula (1) can be produced by reacting compound (M18) and compound (M2) according to step (A-1).
Figure JPOXMLDOC01-appb-I000035
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, tert-butyl methyl ether, ethylene glycol dimethyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, BOP reagent and the like.
This reaction can also be performed by adding a catalyst as needed.
Examples of the catalyst used in the reaction include HOBt.
In the reaction, with respect to 1 mole of the compound (M18), the compound (M2) is usually in a proportion of 1 to 3 moles, the dehydrating condensing agent is usually in a proportion of 1 to 5 moles, and the catalyst is usually in a range of 0.01 to 0.1. Used in molar proportions.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (2) can be isolated by performing post-treatment operations such as adding water to the reaction mixture, extracting with an organic solvent, and drying and concentrating the organic layer. The isolated compound (2) can be further purified by chromatography, recrystallization and the like.
Moreover, it can replace with a compound (M2) and can use a compound (M4) and can manufacture a compound (2) according to the said method according to a process (B-1).
When the compound (M4) is used, it is usually carried out without adding a dehydrating condensation agent. A base can be added as necessary.
Examples of the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
In the reaction, with respect to 1 mol of the compound (M18), the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
(製造法23)(製造法D)
 式(1)においてA1が硫黄原子である化合物(2)は、(製造法D)に従い化合物(M7)と硫化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000036
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、溶媒の存在下または非存在下で行われる。
 反応に用いられる溶媒としては、例えば1,4−ジオキサン、ジエチルエーテル、テトラヒドロフラン、tert−ブチルメチルエーテル、ジグライム等のエーテル、ジクロロメタン、クロロホルム、四塩化炭素、1,2−ジクロロエタン、クロロベンゼン等のハロゲン化炭化水素、トルエン、ベンゼン、キシレン等の炭化水素、アセトニトリル等のニトリル、ピリジン、ピコリン、ルチジン等のピリジンおよびこれらの混合物が挙げられる。
 該反応に用いられる硫化剤としては、五硫化ニリン、ローソン試薬(2,4−ビス−(4−メトキシフェニル)−1,3−ジチア−2,4−ジホスフェタン−2,4−ジスルフィド)等が挙げられる。
 該反応に用いられる硫化剤の量は、化合物(M7)1モルに対して、通常1モル以上である。
 該反応の反応温度は、通常、0℃~200℃の範囲であり、反応時間は、通常、1~24時間の範囲である。
 反応終了後は、反応混合物を水に注加してから有機溶媒抽出し、有機層を濃縮する;反応混合物を水に注加して生じた固体を濾過により集める;または、反応混合物中に生成した固体を濾過により集めることにより化合物(2)を単離することができる。単離された化合物(2)は、再結晶、クロマトグラフィ−等により更に精製することもできる。
(Production Method 23) (Production Method D)
Compound (2) in which A1 is a sulfur atom in formula (1) can be produced by reacting compound (M7) with a sulfurizing agent according to (Production Method D).
Figure JPOXMLDOC01-appb-I000036
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is performed in the presence or absence of a solvent.
Examples of the solvent used in the reaction include ethers such as 1,4-dioxane, diethyl ether, tetrahydrofuran, tert-butyl methyl ether, and diglyme, and halogenations such as dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, and chlorobenzene. Examples thereof include hydrocarbons, hydrocarbons such as toluene, benzene and xylene, nitriles such as acetonitrile, pyridines such as pyridine, picoline and lutidine, and mixtures thereof.
Examples of the sulfurizing agent used in the reaction include nilin pentasulfide, Lawesson's reagent (2,4-bis- (4-methoxyphenyl) -1,3-dithia-2,4-diphosphetan-2,4-disulfide) and the like. Can be mentioned.
The amount of the sulfiding agent used for the reaction is usually 1 mol or more per 1 mol of the compound (M7).
The reaction temperature of the reaction is usually in the range of 0 ° C. to 200 ° C., and the reaction time is usually in the range of 1 to 24 hours.
After completion of the reaction, the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture The collected solid can be collected by filtration to isolate compound (2). The isolated compound (2) can be further purified by recrystallization, chromatography or the like.
 本発明の中間体は、例えば下記の方法により製造することができる。
(中間体製造法1)
 化合物(M12)は、以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000037
[式中、R5、R6及びA2は前記と同じ意味を表す。]
(工程1)
 化合物(M26)は、化合物(M25)をニトロ化剤の存在下で反応させることにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類、酢酸、濃硫酸、濃硝酸、水及びこれらの混合物が挙げられる。
 反応に用いられるニトロ化剤としては、例えば濃硝酸が挙げられる。
 該反応には、化合物(M25)1モルに対して、ニトロ化剤が通常1~3モルの割合で用いられる。
 該反応の反応温度は、通常−10~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を水に注加し、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M26)を単離することができる。単離された化合物(M26)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
The intermediate of the present invention can be produced, for example, by the following method.
(Intermediate production method 1)
Compound (M12) can be produced by the following method.
Figure JPOXMLDOC01-appb-I000037
[Wherein R5, R6 and A2 represent the same meaning as described above. ]
(Process 1)
Compound (M26) can be produced by reacting compound (M25) in the presence of a nitrating agent.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, acetic acid, concentrated sulfuric acid, concentrated nitric acid, water, and mixtures thereof.
An example of the nitrating agent used in the reaction is concentrated nitric acid.
In the reaction, the nitrating agent is usually used at a ratio of 1 to 3 moles relative to 1 mole of the compound (M25).
The reaction temperature is usually in the range of −10 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M26) can be isolated by performing post-treatment operations such as pouring the reaction mixture into water, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M26) can be further purified by chromatography, recrystallization and the like.
(工程2)
 化合物(M12)は、化合物(M26)と水素とを、水素添加触媒の存在下に反応させることにより製造することができる。
 該反応は、通常、1~100気圧の水素雰囲気下、溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、酢酸エチル、酢酸ブチル等のエステル類、メタノール、エタノール等のアルコール類、水及びこれらの混合物が挙げられる。
 反応に用いられる水素添加触媒としては、例えばパラジウム炭素、水酸化パラジウム、ラネーニッケル、酸化白金等の遷移金属化合物が挙げられる。
 該反応には、化合物(M26)1モルに対して、水素が通常3モルの割合、水素添加触媒が通常0.001~0.5モルの割合で用いられる。
 該反応は、必要に応じて酸(塩基等)を加えて行うこともできる。
 該反応の反応温度は、通常−20~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物をろ過し、必要に応じて有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M12)を単離することができる。単離された化合物(M12)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Process 2)
Compound (M12) can be produced by reacting compound (M26) with hydrogen in the presence of a hydrogenation catalyst.
The reaction is usually performed in the presence of a solvent under a hydrogen atmosphere of 1 to 100 atm.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether and 1,4-dioxane, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, water And mixtures thereof.
Examples of the hydrogenation catalyst used in the reaction include transition metal compounds such as palladium carbon, palladium hydroxide, Raney nickel, and platinum oxide.
In the reaction, with respect to 1 mole of the compound (M26), hydrogen is usually used at a ratio of 3 moles, and the hydrogenation catalyst is usually used at a ratio of 0.001 to 0.5 moles.
This reaction can also be carried out by adding an acid (such as a base) as necessary.
The reaction temperature of the reaction is usually in the range of −20 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M12) can be isolated by performing post-treatment operations such as filtration of the reaction mixture, extraction with an organic solvent, if necessary, and drying and concentration of the organic layer. The isolated compound (M12) can be further purified by chromatography, recrystallization and the like.
(中間体製造法2)(工程(A−2))
 化合物(M13)は、化合物(M12)と化合物(M2)とを、工程(A−2)に従い、脱水縮合剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000038
[式中、R1、R2、R3、R4、R5、R6、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 反応に用いられる脱水縮合剤としては、例えばWSC、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、BOP試薬が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M2)が通常1~3モルの割合、脱水縮合剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常0~140℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M13)を単離することができる。単離された化合物(M13)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 2) (Step (A-2))
Compound (M13) can be produced by reacting compound (M12) and compound (M2) in the presence of a dehydration condensing agent according to step (A-2).
Figure JPOXMLDOC01-appb-I000038
[Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
In the reaction, with respect to 1 mol of the compound (M12), the compound (M2) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 0 to 140 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M13) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M13) can be further purified by chromatography, recrystallization and the like.
(中間体製造法3)(工程(B−2))
 化合物(M13)は、化合物(M12)と化合物(M4)とを、工程(B−2)に従い、塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000039
[式中、R1、R2、R3、R4、R5、R6、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類及びこれらの混合物が挙げられる。
 上記塩基としては、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類等が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M4)が通常1~3モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常−20~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M13)を単離することができる。単離された化合物(M13)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 3) (Step (B-2))
Compound (M13) can be produced by reacting compound (M12) and compound (M4) in the presence of a base according to step (B-2).
Figure JPOXMLDOC01-appb-I000039
[Wherein, R 1, R 2, R 3, R 4, R 5, R 6, A 2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Aromatic hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof It is done.
Examples of the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
In the reaction, with respect to 1 mol of the compound (M12), the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M13) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M13) can be further purified by chromatography, recrystallization and the like.
(中間体製造法4)
 化合物(M15)は、以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000040
[式中、R5及びA2は前記と同じ意味を表す。]
(工程1)
 化合物(M28)は、化合物(M27)をニトロ化剤の存在下で反応させることにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばクロロホルム等の脂肪族ハロゲン化炭化水素類、酢酸、濃硫酸、濃硝酸、水及びこれらの混合物が挙げられる。
 反応に用いられるニトロ化剤としては、例えば濃硝酸が挙げられる。
 該反応には、化合物(M27)1モルに対して、ニトロ化剤が通常1~3モルの割合で用いられる。
 該反応の反応温度は、通常−10~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を水に注加し、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M28)を単離することができる。単離された化合物(M28)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate production method 4)
Compound (M15) can be produced by the following method.
Figure JPOXMLDOC01-appb-I000040
[Wherein R5 and A2 represent the same meaning as described above. ]
(Process 1)
Compound (M28) can be produced by reacting compound (M27) in the presence of a nitrating agent.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include aliphatic halogenated hydrocarbons such as chloroform, acetic acid, concentrated sulfuric acid, concentrated nitric acid, water, and mixtures thereof.
An example of the nitrating agent used in the reaction is concentrated nitric acid.
In the reaction, the nitrating agent is usually used at a ratio of 1 to 3 moles relative to 1 mole of the compound (M27).
The reaction temperature is usually in the range of −10 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M28) can be isolated by performing post-treatment operations such as pouring the reaction mixture into water, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M28) can be further purified by chromatography, recrystallization and the like.
(工程2)
 化合物(M15)は、化合物(M28)と水素とを、水素添加触媒の存在下に反応させることにより製造することができる。
 該反応は、通常1~100気圧の水素雰囲気下、溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、酢酸エチル、酢酸ブチル等のエステル類、メタノール、エタノール等のアルコール類、水及びこれらの混合物が挙げられる。
 反応に用いられる水素添加触媒としては、例えばパラジウム炭素、水酸化パラジウム、ラネーニッケル、酸化白金等の遷移金属化合物が挙げられる。
 該反応には、化合物(M28)1モルに対して、水素が通常3モルの割合、水素添加触媒が通常0.001~0.5モルの割合で用いられる。
 該反応は、必要に応じて酸(塩基等)を加えて行うこともできる。
 該反応の反応温度は、通常−20~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物をろ過し、必要に応じて有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M15)を単離することができる。単離された化合物(M15)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Process 2)
Compound (M15) can be produced by reacting compound (M28) with hydrogen in the presence of a hydrogenation catalyst.
The reaction is usually performed in the presence of a solvent under a hydrogen atmosphere of 1 to 100 atm.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether and 1,4-dioxane, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, water And mixtures thereof.
Examples of the hydrogenation catalyst used in the reaction include transition metal compounds such as palladium carbon, palladium hydroxide, Raney nickel, and platinum oxide.
In the reaction, hydrogen is usually used in a proportion of 3 mol and a hydrogenation catalyst is usually used in a proportion of 0.001 to 0.5 mol with respect to 1 mol of the compound (M28).
This reaction can also be carried out by adding an acid (such as a base) as necessary.
The reaction temperature of the reaction is usually in the range of −20 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M15) can be isolated by performing post-treatment operations such as filtration of the reaction mixture, extraction with an organic solvent, if necessary, and drying and concentration of the organic layer. The isolated compound (M15) can be further purified by chromatography, recrystallization and the like.
(中間体製造法5)(工程(C−2))
 化合物(M16)は、化合物(M15)と化合物(M5)とを、工程(C−2)に従い、反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000041
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばメタノール、エタノール等のアルコール類、THF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類及びこれらの混合物が挙げられる。
 該反応には、化合物(M15)1モルに対して、化合物(M5)が通常1~3モルの割合で用いられる。
 該反応は、必要に応じて酸や塩基等を加えて行うこともできる。
 該反応の反応温度は、通常0~150℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、乾燥、濃縮する等の後処理操作を行うことにより、化合物(M16)を単離することができる。単離された化合物(M16)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 5) (Step (C-2))
Compound (M16) can be produced by reacting compound (M15) with compound (M5) according to step (C-2).
Figure JPOXMLDOC01-appb-I000041
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include alcohols such as methanol and ethanol, ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and the like. These mixtures are mentioned.
In the reaction, compound (M5) is usually used at a ratio of 1 to 3 mol per 1 mol of compound (M15).
This reaction can also be performed by adding an acid, a base, or the like, if necessary.
The reaction temperature of the reaction is usually in the range of 0 to 150 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M16) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, drying and concentration. The isolated compound (M16) can be further purified by chromatography, recrystallization and the like.
(中間体製造法6)(工程(A−2))
 化合物(M17)は、化合物(M15)と化合物(M2)とを、工程(A−2)に従い、脱水縮合剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000042
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 反応に用いられる脱水縮合剤としては、例えばWSC、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、BOP試薬が挙げられる。
 該反応には、化合物(M15)1モルに対して、化合物(M2)が通常1~3モルの割合、脱水縮合剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常0~140℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M17)を単離することができる。単離された化合物(M17)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 6) (Step (A-2))
Compound (M17) can be produced by reacting compound (M15) and compound (M2) in the presence of a dehydration condensing agent according to step (A-2).
Figure JPOXMLDOC01-appb-I000042
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
In the reaction, with respect to 1 mol of the compound (M15), the compound (M2) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 0 to 140 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M17) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M17) can be further purified by chromatography, recrystallization and the like.
(中間体製造法7)(工程(B−2))
 化合物(M17)は、化合物(M15)と化合物(M4)とを、工程(B−2)に従い、塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000043
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類等が挙げられる。
 該反応には、化合物(M15)1モルに対して、化合物(M4)が通常1~3モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常−20~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M17)を単離することができる。単離された化合物(M17)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 7) (Step (B-2))
Compound (M17) can be produced by reacting compound (M15) and compound (M4) in the presence of a base according to step (B-2).
Figure JPOXMLDOC01-appb-I000043
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Aromatic hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof It is done.
Examples of the base used in the reaction include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine. It is done.
In the reaction, with respect to 1 mol of the compound (M15), the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M17) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M17) can be further purified by chromatography, recrystallization and the like.
(中間体製造法8)
 化合物(M18)は、以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000044
[式中、R5及びA2は前記と同じ意味を表す。]
(工程1)
 化合物(M30)は、化合物(M29)とチオウレアとを塩基の存在下で反応させることにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばメタノール、エタノール等のアルコール類、水及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物が挙げられる。
 該反応には、化合物(M29)1モルに対して、チオウレアが通常0.5~3モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常0~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に酸を加えた後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M30)を単離することができる。単離された化合物(M30)は、クロマトグラフィー、再結晶等により精製することもできる。
(Intermediate production method 8)
Compound (M18) can be produced by the following method.
Figure JPOXMLDOC01-appb-I000044
[Wherein R5 and A2 represent the same meaning as described above. ]
(Process 1)
Compound (M30) can be produced by reacting compound (M29) with thiourea in the presence of a base.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include alcohols such as methanol and ethanol, water, and mixtures thereof.
Examples of the base used for the reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
In the reaction, with respect to 1 mol of the compound (M29), thiourea is usually used in a proportion of 0.5 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M30) can be isolated by post-treatment such as addition of an acid to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M30) can also be purified by chromatography, recrystallization and the like.
(工程2)
 化合物(M18)は、化合物(M30)を還元反応に付すことにより製造することができる。
 該還元反応は、例えば鉄粉、亜鉛粉等の還元剤;塩酸、酢酸等の酸;および水の存在下で行うことができる。
 該反応は通常溶媒の存在下で行われる。
 該反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、酢酸エチル、酢酸ブチル等のエステル類、メタノール、エタノール等のアルコール類、DMF、NMP等の酸アミド類及びこれらの混合物が挙げられる。
 該反応には、化合物(M30)1モルに対して、還元剤が通常3~10モルの割合で用いられる。
 該反応の反応温度は通常0~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を加えた後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M18)を単離することができる。単離された化合物(M18)は、クロマトグラフィー、再結晶等により精製することもできる。
(Process 2)
Compound (M18) can be produced by subjecting compound (M30) to a reduction reaction.
The reduction reaction can be performed in the presence of a reducing agent such as iron powder or zinc powder; an acid such as hydrochloric acid or acetic acid; and water.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, Examples thereof include acid amides such as DMF and NMP, and mixtures thereof.
In the reaction, the reducing agent is usually used in a proportion of 3 to 10 mol per 1 mol of the compound (M30).
The reaction temperature is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M18) can be isolated by performing post-treatment operations such as addition of water to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M18) can also be purified by chromatography, recrystallization, and the like.
(中間体製造法9)
 化合物(M10)において、A1が−NR6−である化合物(M33)は、化合物(M12)と化合物(M31)とを塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000045
[式中、R1、R2、R3、R4、R5、R6、A2及びV2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる塩基としては、炭酸水素ナトリウム、炭酸水素カリウム等の炭酸水素塩類、炭酸ナトリウム、炭酸カリウム等の炭酸塩類、亜硫酸ナトリウム、亜硫酸カリウム等の亜硫酸塩類及びこれらの混合物が挙げられる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M31)が通常1~3モルの割合、塩基が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M33)を単離することができる。単離された化合物(M33)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate production method 9)
In compound (M10), compound (M33) wherein A1 is -NR6- can be produced by reacting compound (M12) with compound (M31) in the presence of a base.
Figure JPOXMLDOC01-appb-I000045
[Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the base used in the reaction include hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate, carbonates such as sodium carbonate and potassium carbonate, sulfites such as sodium sulfite and potassium sulfite, and mixtures thereof.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
In the reaction, with respect to 1 mol of the compound (M12), the compound (M31) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M33) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M33) can be further purified by chromatography, recrystallization and the like.
(中間体製造法10)(工程(E−1))
 化合物(M10)において、A1が−NR6−である化合物(M33)は、化合物(M12)と化合物(M8)とを、工程(E−1)に従い、脱水縮合剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000046
[式中、R1、R2、R3、R4、R5、R6、A2及びV2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、tert−ブチルメチルエーテル、エチレングリコールジメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 反応に用いられる脱水縮合剤としては、WSC、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、BOP試薬等が挙げられる。
該反応は、必要に応じて触媒を加えて行うこともできる。
反応に用いられる触媒としては、HOBt等が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M8)が通常1~3モルの割合、脱水縮合剤が通常1~5モルの割合、触媒が通常0.01~0.1モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M33)を単離することができる。単離された化合物(M33)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 10) (Step (E-1))
In compound (M10), compound (M33) in which A1 is —NR6- is obtained by reacting compound (M12) and compound (M8) in the presence of a dehydration condensing agent according to step (E-1). Can be manufactured.
Figure JPOXMLDOC01-appb-I000046
[Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, tert-butyl methyl ether, ethylene glycol dimethyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, BOP reagent and the like.
This reaction can also be performed by adding a catalyst as needed.
Examples of the catalyst used in the reaction include HOBt.
In the reaction, with respect to 1 mol of the compound (M12), the compound (M8) is usually in a proportion of 1 to 3 mol, the dehydrating condensing agent is usually in a proportion of 1 to 5 mol, and the catalyst is usually in a proportion of 0.01 to 0.1. Used in molar proportions.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M33) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M33) can be further purified by chromatography, recrystallization and the like.
(中間体製造法11)(工程(E−3))
 化合物(M10)において、A1が−NR6−である化合物(M33)は、工程(E−3)に従い、化合物(M32)を脱水縮合することにより製造することができる。
Figure JPOXMLDOC01-appb-I000047
[式中、R1、R2、R3、R4、R5、R6、A2及びV2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、メタノール、エタノール、プロパノール、ブタノール、ペンタノール等のアルコール類及びこれらの混合物が挙げられる。
 該反応は必要に応じて、酸又は脱水剤を用いることができる。反応に用いられる酸としては、p−トルエンスルホン酸等のスルホン酸類、酢酸等のカルボン酸類が挙げられ、反応に用いられる脱水剤としては、オキシ塩化リン、無水酢酸、トリフルオロ酢酸無水物等が挙げられる。
 該反応には、化合物(M32)1モルに対して、酸又は脱水剤が通常1モル~10モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M33)を単離することができる。単離された化合物(M33)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 11) (Step (E-3))
In compound (M10), compound (M33) wherein A1 is -NR6- can be produced by subjecting compound (M32) to dehydration condensation according to step (E-3).
Figure JPOXMLDOC01-appb-I000047
[Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, methanol, ethanol, propanol , Alcohols such as butanol and pentanol, and mixtures thereof.
In the reaction, an acid or a dehydrating agent can be used as necessary. Examples of the acid used in the reaction include sulfonic acids such as p-toluenesulfonic acid, and carboxylic acids such as acetic acid. Examples of the dehydrating agent used in the reaction include phosphorus oxychloride, acetic anhydride, trifluoroacetic anhydride, and the like. Can be mentioned.
In the reaction, with respect to 1 mol of the compound (M32), an acid or a dehydrating agent is usually used at a ratio of 1 mol to 10 mol.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M33) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M33) can be further purified by chromatography, recrystallization and the like.
(中間体製造法12)(工程(E−3))
 化合物(M10)において、A1が−NR6−である化合物(M33)は、工程(E−3)に従い、化合物(M32)を塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000048
[式中、R1、R2、R3、R4、R5、R6、A2及びV2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、メタノール、エタノール、プロパノール、ブタノール、tert−ブタノール、ペンタノール等のアルコール類及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、リン酸三カリウム等が挙げられる。
 該反応には、化合物(M32)1モルに対して、塩基が通常1モル~10モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M33)を単離することができる。単離された化合物(M33)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate production method 12) (Step (E-3))
In compound (M10), compound (M33) in which A1 is —NR6- can be produced by reacting compound (M32) in the presence of a base according to step (E-3).
Figure JPOXMLDOC01-appb-I000048
[Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, methanol, ethanol, propanol , Butanol, tert-butanol, pentanol and the like, and mixtures thereof.
Examples of the base used for the reaction include tripotassium phosphate.
In the reaction, with respect to 1 mol of the compound (M32), the base is generally used at a ratio of 1 mol to 10 mol.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M33) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M33) can be further purified by chromatography, recrystallization and the like.
(中間体製造法13)(工程(E−2))
 化合物(M32)は、化合物(M12)と化合物(M8)とを、工程(E−2)に従い、脱水縮合剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000049
[式中、R1、R2、R3、R4、R5、R6、A2及びV2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 反応に用いられる脱水縮合剤としては、例えばWSC、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、BOP試薬が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M8)が通常1~3モルの割合、脱水縮合剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常0~140℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M32)を単離することができる。単離された化合物(M32)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate production method 13) (Step (E-2))
Compound (M32) can be produced by reacting compound (M12) and compound (M8) in the presence of a dehydration condensing agent according to step (E-2).
Figure JPOXMLDOC01-appb-I000049
[Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
In the reaction, with respect to 1 mol of the compound (M12), the compound (M8) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 0 to 140 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M32) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M32) can be further purified by chromatography, recrystallization and the like.
(中間体製造法14)
 化合物(M32)は、化合物(M12)と化合物(M34)とを、塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000050
[式中、R1、R2、R3、R4、R5、R6、A2及びV2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類及びこれらの混合物が挙げられる。
 上記塩基としては、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類等が挙げられる。
 該反応には、化合物(M12)1モルに対して、化合物(M34)が通常1~3モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常−20~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M32)を単離することができる。単離された化合物(M32)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate production method 14)
Compound (M32) can be produced by reacting compound (M12) with compound (M34) in the presence of a base.
Figure JPOXMLDOC01-appb-I000050
[Wherein R 1, R 2, R 3, R 4, R 5, R 6, A 2 and V 2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Aromatic hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof It is done.
Examples of the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
In the reaction, with respect to 1 mol of the compound (M12), the compound (M34) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M32) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M32) can be further purified by chromatography, recrystallization and the like.
(中間体製造法15)
 化合物(M5)のうち、nが0である化合物(M37)は、以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000051
[式中、R1、R2、R3、R4及びV2は前記と同じ意味を表す。]
(工程I15−1)
 化合物(M36)は、化合物(M35)と化合物(M20)とを、塩基の存在下に反応させることにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水素化ナトリウム等のアルカリ金属水素化物類が挙げられる。
 該反応には、化合物(M35)1モルに対して、化合物(M20)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常0~150℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M36)を単離することができる。単離された化合物(M36)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate production method 15)
Among compounds (M5), compound (M37) in which n is 0 can be produced by the following method.
Figure JPOXMLDOC01-appb-I000051
[Wherein, R1, R2, R3, R4 and V2 represent the same meaning as described above. ]
(Step I15-1)
Compound (M36) can be produced by reacting compound (M35) with compound (M20) in the presence of a base.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
Examples of the base used for the reaction include alkali metal hydrides such as sodium hydride.
In the reaction, with respect to 1 mol of the compound (M35), the compound (M20) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of 0 to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (M36) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M36) can be further purified by chromatography, recrystallization and the like.
(工程I15−2)
 化合物(M37)は、化合物(M36)を還元反応に付すことにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、クロロホルム等のハロゲン化炭化水素類及びこれらの混合物が挙げられる。
 反応に用いられる還元剤としては、例えば水素化ジイソブチルアルミニウムが挙げられる。
 該反応には、化合物(M36)1モルに対して、還元剤が通常1~2モルの割合で用いられる。
 該反応の反応温度は、通常−20~100℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M37)を単離することができる。単離された化合物(M37)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Step I15-2)
Compound (M37) can be produced by subjecting compound (M36) to a reduction reaction.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and halogenated carbonization such as dichloromethane and chloroform. Examples include hydrogens and mixtures thereof.
Examples of the reducing agent used in the reaction include diisobutylaluminum hydride.
In the reaction, the reducing agent is usually used at a ratio of 1 to 2 moles relative to 1 mole of the compound (M36).
The reaction temperature of the reaction is usually in the range of −20 to 100 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (M37) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M37) can be further purified by chromatography, recrystallization and the like.
(中間体製造法16)
 化合物(M5)のうち、nが0である化合物(M37)は、化合物(M38)と化合物(M20)とを、塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000052
[式中、R1、R2、R3、R4及びV2は前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水素化ナトリウム等のアルカリ金属水素化物類等が挙げられる。
 該反応には、化合物(M38)1モルに対して、化合物(M20)が通常1~10モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常0~150℃の範囲である。該反応の反応時間は通常0.5~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M37)を単離することができる。単離された化合物(M37)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 16)
Among compounds (M5), compound (M37) in which n is 0 can be produced by reacting compound (M38) and compound (M20) in the presence of a base.
Figure JPOXMLDOC01-appb-I000052
[Wherein R1, R2, R3, R4 and V2 represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, nitriles such as acetonitrile, DMF, Examples thereof include acid amides such as NMP, sulfoxides such as DMSO, and mixtures thereof.
Examples of the base used for the reaction include alkali metal hydrides such as sodium hydride.
In the reaction, with respect to 1 mol of the compound (M38), the compound (M20) is usually used in a proportion of 1 to 10 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of 0 to 150 ° C. The reaction time is usually in the range of 0.5 to 24 hours.
After completion of the reaction, the compound (M37) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M37) can be further purified by chromatography, recrystallization and the like.
(中間体製造法17)
 化合物(M2)のうち、nが0である化合物(M39)は、化合物(M36)を塩基の存在下、加水分解反応させることにより製造することができ、nが1又は2である化合物(M41)は下記の方法で製造することができる。
Figure JPOXMLDOC01-appb-I000053
[式中、R1、R2、R3及びR4は前記と同じ意味を表し、rは1又は2を表す。]
(工程I17−1)
該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、メタノール、エタノール等のアルコール類、水及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物が挙げられる。
 該反応には、化合物(M36)1モルに対して、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常0~120℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応液を酸性にした後、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M39)を単離することができる。単離された化合物(M39)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 17)
Among the compounds (M2), the compound (M39) in which n is 0 can be produced by hydrolyzing the compound (M36) in the presence of a base, and the compound (M41) in which n is 1 or 2. ) Can be produced by the following method.
Figure JPOXMLDOC01-appb-I000053
[Wherein R 1, R 2, R 3 and R 4 represent the same meaning as described above, and r represents 1 or 2. ]
(Step I17-1)
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, alcohols such as methanol and ethanol, water, and a mixture thereof.
Examples of the base used for the reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
In the reaction, the base is generally used at a ratio of 1 to 10 mol per 1 mol of the compound (M36).
The reaction temperature of the reaction is usually in the range of 0 to 120 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M39) can be isolated by performing post-treatment operations such as acidification of the reaction mixture, extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. . The isolated compound (M39) can be further purified by chromatography, recrystallization and the like.
(工程I17−2)
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール等のアルコール類、酢酸、水及びこれらの混合物が挙げられる。
 反応に用いられる酸化剤としては、例えばm−クロロ過安息香酸又は過酸化水素水が挙げられる。
 該反応は必要に応じて触媒の存在下で行うこともできる。
 反応に用いられる触媒としては、例えばタングステン酸ナトリウムが挙げられる。
 該反応には、化合物(M36)1モルに対して、酸化剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常−20~120℃の範囲である。該反応の反応時間は通常0.1~12時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄し、乾燥、濃縮する等の後処理操作を行うことにより、化合物(M40)を単離することができる。単離された化合物(M40)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Process I17-2)
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
Examples of the oxidizing agent used in the reaction include m-chloroperbenzoic acid or hydrogen peroxide water.
The reaction can be carried out in the presence of a catalyst as necessary.
Examples of the catalyst used for the reaction include sodium tungstate.
In the reaction, with respect to 1 mole of the compound (M36), the oxidizing agent is usually used at a ratio of 1 to 5 moles.
The reaction temperature of the reaction is usually in the range of −20 to 120 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried, The compound (M40) can be isolated by performing post-treatment operations such as concentration. The isolated compound (M40) can be further purified by chromatography, recrystallization and the like.
(工程I17−3)
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、メタノール、エタノール等のアルコール類、水及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、例えば水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物が挙げられる。
 該反応には、化合物(M40)1モルに対して、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常0~120℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応液を酸性にした後、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M41)を単離することができる。単離された化合物(M41)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Step I17-3)
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, alcohols such as methanol and ethanol, water, and a mixture thereof.
Examples of the base used for the reaction include alkali metal hydroxides such as sodium hydroxide and potassium hydroxide.
In the reaction, the base is usually used at a ratio of 1 to 10 mol per 1 mol of the compound (M40).
The reaction temperature of the reaction is usually in the range of 0 to 120 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the reaction mixture is acidified, and then the compound (M41) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. . The isolated compound (M41) can be further purified by chromatography, recrystallization, and the like.
(工程I17−4)
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばジクロロメタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール等のアルコール類、酢酸、水及びこれらの混合物が挙げられる。
 反応に用いられる酸化剤としては、例えばm−クロロ過安息香酸又は過酸化水素水が挙げられる。
 該反応は必要に応じて触媒の存在下で行うこともできる。
 反応に用いられる触媒としては、例えばタングステン酸ナトリウムが挙げられる。
 該反応には、化合物(M39)1モルに対して、酸化剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常−20~120℃の範囲である。該反応の反応時間は通常0.1~12時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を必要に応じて還元剤(例えば亜硫酸ナトリウム、チオ硫酸ナトリウム)の水溶液、塩基(例えば炭酸水素ナトリウム)の水溶液で洗浄し、乾燥、濃縮する等の後処理操作を行うことにより、化合物(M41)を単離することができる。単離された化合物(M41)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Process I17-4)
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform, alcohols such as methanol and ethanol, acetic acid, water, and mixtures thereof.
Examples of the oxidizing agent used in the reaction include m-chloroperbenzoic acid or hydrogen peroxide water.
The reaction can be carried out in the presence of a catalyst as necessary.
Examples of the catalyst used for the reaction include sodium tungstate.
In the reaction, with respect to 1 mol of the compound (M39), the oxidizing agent is usually used at a ratio of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of −20 to 120 ° C. The reaction time is usually in the range of 0.1 to 12 hours.
After completion of the reaction, the reaction mixture is extracted with an organic solvent, and the organic layer is washed with an aqueous solution of a reducing agent (for example, sodium sulfite, sodium thiosulfate) or an aqueous solution of a base (for example, sodium bicarbonate) as necessary, dried, The compound (M41) can be isolated by performing post-treatment operations such as concentration. The isolated compound (M41) can be further purified by chromatography, recrystallization, and the like.
(中間体製造法18)
 化合物(M2)のうち、nが0である化合物(M39)は、化合物(M36)を酸の存在下、加水分解反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000054
[式中、R1、R2、R3及びR4は前記と同じ意味を表す。]
 該反応は、通常酸の水溶液を溶媒として行われる。
 反応に用いられる酸としては、例えば塩酸、硝酸、リン酸、硫酸等の鉱酸類、酢酸、トリフルオロ酢酸等のカルボン酸類が挙げられる。
 該反応の反応温度は、通常0~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M39)を単離することができる。単離された化合物(M39)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 18)
Among compounds (M2), compound (M39) in which n is 0 can be produced by subjecting compound (M36) to a hydrolysis reaction in the presence of an acid.
Figure JPOXMLDOC01-appb-I000054
[Wherein R1, R2, R3 and R4 have the same meaning as described above. ]
The reaction is usually carried out using an aqueous acid solution as a solvent.
Examples of the acid used for the reaction include mineral acids such as hydrochloric acid, nitric acid, phosphoric acid and sulfuric acid, and carboxylic acids such as acetic acid and trifluoroacetic acid.
The reaction temperature of the reaction is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M39) can be isolated by performing post-treatment operations such as extraction of the reaction mixture with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M39) can be further purified by chromatography, recrystallization and the like.
(中間体製造法19)
 化合物(M4)は、化合物(M2)を塩素化剤の存在下、塩素化させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000055
[式中、R1、R2、R3、R4及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、クロロホルム等のハロゲン化炭化水素類及びこれらの混合物が挙げられる。
 反応に用いられる塩素化剤としては、塩化チオニル、二塩化オキサリル等が挙げられる。
 該反応には、化合物(M2)1モルに対して、塩素化剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常0~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、溶媒を留去することにより、化合物(M4)を単離することができる。
(Intermediate Production Method 19)
Compound (M4) can be produced by chlorinating compound (M2) in the presence of a chlorinating agent.
Figure JPOXMLDOC01-appb-I000055
[Wherein R1, R2, R3, R4 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aromatic hydrocarbons such as toluene and xylene, and halogenated carbonization such as dichloromethane and chloroform. Examples include hydrogens and mixtures thereof.
Examples of the chlorinating agent used in the reaction include thionyl chloride and oxalyl dichloride.
In the reaction, the chlorinating agent is usually used at a ratio of 1 to 5 mol per 1 mol of the compound (M2).
The reaction temperature of the reaction is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M4) can be isolated by removing the solvent.
(中間体製造法20)
 化合物(M12)のうち、A2が窒素原子である化合物(M45)は、例えば以下の方法により製造することができる。
Figure JPOXMLDOC01-appb-I000056
[式中、R5及びR6は前記と同じ意味を表し、Xgは塩素原子、臭素原子又はヨウ素原子等のハロゲン原子を表す。]
(工程I20−1)
 化合物(M43)は、化合物(M42)と化合物(M46)とを反応させることにより製造することができる。
 該反応は、通常溶媒の存在下あるいは非存在下で行われる。
 反応に用いられる溶媒としては、例えば水、メタノール、エタノール等のアルコール類、1,4−ジオキサン、ジエチルエーテル、THF等のエーテル類、酢酸エチル、酢酸ブチル等のエステル類、ジクロロメタン、クロロホルム、四塩化炭素、1,2−ジクロロエタン等のハロゲン化炭化水素、アセトニトリル等のニトリル、DMF、NMP、ジメチルスルホキシド等の非プロトン性極性溶媒、ピリジン、キノリン等の含窒素芳香族化合物類およびこれらの混合物が挙げられる。
 該反応は、必要に応じて塩基を加えて行うこともできる。
 反応に用いられる塩基としては、例えばピリジン、ピコリン、2,6−ルチジン、DBU、1,5−ジアザビシクロ〔4.3.0〕−5−ノネン等の含窒素複素環化合物、トリエチルアミン、N−エチルジイソプロピルアミン等の第3級アミン、炭酸カリウム、炭酸セシウム、水酸化ナトリウム等の無機塩基が挙げられる。
 化合物(M42)1モルに対して、化合物(M46)が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常0~200℃の範囲であり、反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物を水に注加してから有機溶媒抽出し、有機層を濃縮する;反応混合物を水に注加して生じた固体を濾過により集める;または、反応混合物中に生成した固体を濾過により集めることにより化合物(M43)を単離することができる。単離された化合物(M43)は、再結晶、クロマトグラフィー等により更に精製することもできる。
(Intermediate production method 20)
Among the compounds (M12), the compound (M45) in which A2 is a nitrogen atom can be produced, for example, by the following method.
Figure JPOXMLDOC01-appb-I000056
[Wherein, R5 and R6 represent the same meaning as described above, and Xg represents a halogen atom such as a chlorine atom, a bromine atom or an iodine atom. ]
(Process I20-1)
Compound (M43) can be produced by reacting compound (M42) with compound (M46).
The reaction is usually performed in the presence or absence of a solvent.
Examples of the solvent used in the reaction include water, alcohols such as methanol and ethanol, ethers such as 1,4-dioxane, diethyl ether and THF, esters such as ethyl acetate and butyl acetate, dichloromethane, chloroform and tetrachloride. Examples include carbon, halogenated hydrocarbons such as 1,2-dichloroethane, nitriles such as acetonitrile, aprotic polar solvents such as DMF, NMP, and dimethyl sulfoxide, nitrogen-containing aromatic compounds such as pyridine and quinoline, and mixtures thereof. It is done.
This reaction can also be performed by adding a base as necessary.
Examples of the base used in the reaction include nitrogen-containing heterocyclic compounds such as pyridine, picoline, 2,6-lutidine, DBU, 1,5-diazabicyclo [4.3.0] -5-nonene, triethylamine, and N-ethyl. Tertiary amines such as diisopropylamine, and inorganic bases such as potassium carbonate, cesium carbonate, sodium hydroxide and the like.
The compound (M46) is usually used at a ratio of 1 to 5 mol per 1 mol of the compound (M42).
The reaction temperature of the reaction is usually in the range of 0 to 200 ° C., and the reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture The collected solid can be collected by filtration to isolate the compound (M43). The isolated compound (M43) can be further purified by recrystallization, chromatography or the like.
(工程I20−2)
 化合物(M44)は、化合物(M43)とハロゲン化剤とを反応させることにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えば水、酢酸、1,4−ジオキサン、ジエチルエーテル、THF等のエーテル類、酢酸エチル、酢酸ブチル等のエステル類、ジクロロメタン、クロロホルム、四塩化炭素、1,2−ジクロロエタン等のハロゲン化炭化水素、アセトニトリル等のニトリル類、DMF、NMP等の非プロトン性極性溶媒およびこれらの混合物が挙げられる。
 反応に用いられるハロゲン化剤としては、例えばN−クロロスクシンイミド、塩素等の塩素化剤、N−ブロモスクシンイミド、臭素等の臭素化剤、N−ヨードスクシンイミド、ヨウ素等の塩素化剤が挙げられる。
 化合物(M43)1モルに対して、ハロゲン化剤が通常1~3モルの割合で用いられる。
 該反応の反応温度は、通常−10~100℃の範囲であり、反応時間は通常0.1~24時の範囲である。
 反応終了後は、反応混合物を水に注加してから有機溶媒抽出し、有機層を濃縮する;反応混合物を水に注加して生じた固体を濾過により集める;または、反応混合物中に生成した固体を濾過により集めることにより化合物(M44)を単離することができる。単離された化合物(M44)は、再結晶、クロマトグラフィ−等により更に精製することもできる。
(Process I20-2)
Compound (M44) can be produced by reacting compound (M43) with a halogenating agent.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used for the reaction include water, acetic acid, 1,4-dioxane, diethyl ether, THF and other ethers, ethyl acetate, butyl acetate and other esters, dichloromethane, chloroform, carbon tetrachloride, 1,2- Examples thereof include halogenated hydrocarbons such as dichloroethane, nitriles such as acetonitrile, aprotic polar solvents such as DMF and NMP, and mixtures thereof.
Examples of the halogenating agent used in the reaction include chlorinating agents such as N-chlorosuccinimide and chlorine, brominating agents such as N-bromosuccinimide and bromine, and chlorinating agents such as N-iodosuccinimide and iodine.
The halogenating agent is usually used in a proportion of 1 to 3 mol per 1 mol of the compound (M43).
The reaction temperature of the reaction is usually in the range of −10 to 100 ° C., and the reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture The collected solid can be collected by filtration to isolate the compound (M44). The isolated compound (M44) can be further purified by recrystallization, chromatography or the like.
(工程I20−3)
 化合物(M45)は、化合物(M44)とアミノ化剤とを銅化合物の存在下で反応させることにより製造することができる。
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えば水、メタノール、エタノール等のアルコール類、1,4−ジオキサン、ジエチルエーテル、THF等のエーテル類、酢酸エチル、酢酸ブチル等のエステル類、ジクロロメタン、クロロホルム、四塩化炭素、1,2−ジクロロエタン等のハロゲン化炭化水素、アセトニトリル等のニトリル類、DMF、NMP、ジメチルスルホキシド等の非プロトン性極性溶媒、ピリジン、キノリン等の含窒素芳香族化合物類およびこれらの混合物が挙げられる。
 反応に用いられるアミノ化剤としては、例えばアンモニア、アンモニア水、リチウムアミドが挙げられる。
 反応に用いられる銅化合物としては、例えば銅、ヨウ化銅(I)、酸化銅(I)、酸化銅(II)、アセチルアセトン銅(II)、酢酸銅(II)、硫酸銅(II)が挙げられる。
 該反応は、必要に応じて配位子を加えて行うこともできる。
 反応に用いられる配位子としては、例えばアセチルアセトン、サレン、フェナントロリンが挙げられる。
 該反応は、必要に応じて塩基を加えて行うこともできる。
 反応に用いられる塩基としては、例えばピリジン、ピコリン、2,6−ルチジン、DBU、1,5−ジアザビシクロ〔4.3.0〕−5−ノネン等の含窒素複素環化合物、トリエチルアミン、N−エチルジイソプロピルアミン等の第3級アミン、りん酸三カリウム、炭酸カリウム、炭酸セシウム、水酸化ナトリウム等の無機塩基が挙げられる。
 化合物(M44)1モルに対して、アミノ化剤が通常1~5モルの割合で用いられ、銅化合物が通常0.02~0.5モルの割合で用いられ、必要に応じて配位子が0.02~2モルの割合で用いられ、必要に応じて塩基が1~5モルの割合で用いられる。
 該反応の反応温度は、通常30~200℃の範囲であり、反応時間は通常0.1~48時間の範囲である。
 反応終了後は、反応混合物を水に注加してから有機溶媒抽出し、有機層を濃縮する;反応混合物を水に注加して生じた固体を濾過により集める;または、反応混合物中に生成した固体を濾過により集めることにより化合物(M45)を単離することができる。単離された化合物(M45)は、再結晶、クロマトグラフィ−等により更に精製することもできる。
(Process I20-3)
Compound (M45) can be produced by reacting compound (M44) with an aminating agent in the presence of a copper compound.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include water, alcohols such as methanol and ethanol, ethers such as 1,4-dioxane, diethyl ether and THF, esters such as ethyl acetate and butyl acetate, dichloromethane, chloroform and tetrachloride. Carbon, halogenated hydrocarbons such as 1,2-dichloroethane, nitriles such as acetonitrile, aprotic polar solvents such as DMF, NMP, and dimethyl sulfoxide, nitrogen-containing aromatic compounds such as pyridine and quinoline, and mixtures thereof Can be mentioned.
Examples of the aminating agent used in the reaction include ammonia, aqueous ammonia, and lithium amide.
Examples of the copper compound used in the reaction include copper, copper (I) iodide, copper (I) oxide, copper (II) oxide, acetylacetone copper (II), copper acetate (II), and copper (II) sulfate. It is done.
This reaction can also be performed by adding a ligand as necessary.
Examples of the ligand used in the reaction include acetylacetone, salen, and phenanthroline.
This reaction can also be performed by adding a base as necessary.
Examples of the base used in the reaction include nitrogen-containing heterocyclic compounds such as pyridine, picoline, 2,6-lutidine, DBU, 1,5-diazabicyclo [4.3.0] -5-nonene, triethylamine, and N-ethyl. Examples include tertiary amines such as diisopropylamine, and inorganic bases such as tripotassium phosphate, potassium carbonate, cesium carbonate, and sodium hydroxide.
The aminating agent is usually used in a proportion of 1 to 5 mol, and the copper compound is usually used in a proportion of 0.02 to 0.5 mol per 1 mol of the compound (M44). Is used in a proportion of 0.02 to 2 mol, and a base is used in a proportion of 1 to 5 mol if necessary.
The reaction temperature of the reaction is usually in the range of 30 to 200 ° C., and the reaction time is usually in the range of 0.1 to 48 hours.
After completion of the reaction, the reaction mixture is poured into water and then extracted with an organic solvent, and the organic layer is concentrated; the reaction mixture is poured into water and the resulting solid is collected by filtration; or formed in the reaction mixture The collected solid can be collected by filtration to isolate compound (M45). The isolated compound (M45) can be further purified by recrystallization, chromatography or the like.
(中間体製造法21)(工程(A−2))
 化合物(M22)は、化合物(M18)と化合物(M2)とを、工程(A−2)に従い、脱水縮合剤の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000057
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 反応に用いられる脱水縮合剤としては、例えばWSC、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、BOP試薬が挙げられる。
 該反応には、化合物(M18)1モルに対して、化合物(M2)が通常1~3モルの割合、脱水縮合剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常0~140℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M22)を単離することができる。単離された化合物(M22)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 21) (Step (A-2))
Compound (M22) can be produced by reacting compound (M18) and compound (M2) in the presence of a dehydration condensing agent according to step (A-2).
Figure JPOXMLDOC01-appb-I000057
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
In the reaction, with respect to 1 mol of the compound (M18), the compound (M2) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 0 to 140 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M22) can be isolated by performing post-treatment operations such as water addition to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M22) can be further purified by chromatography, recrystallization and the like.
(中間体製造法22)(工程(B−2))
 化合物(M22)は、化合物(M18)と化合物(M4)とを、工程(B−2)に従い、塩基の存在下に反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000058
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
 該反応は、通常溶媒の存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類及びこれらの混合物が挙げられる。
 反応に用いられる塩基としては、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類等が挙げられる。
 該反応には、化合物(M18)1モルに対して、化合物(M4)が通常1~3モルの割合、塩基が通常1~10モルの割合で用いられる。
 該反応の反応温度は、通常−20~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M22)を単離することができる。単離された化合物(M22)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
(Intermediate Production Method 22) (Step (B-2))
Compound (M22) can be produced by reacting compound (M18) and compound (M4) in the presence of a base according to step (B-2).
Figure JPOXMLDOC01-appb-I000058
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Aromatic hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, and mixtures thereof It is done.
Examples of the base used in the reaction include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine. It is done.
In the reaction, with respect to 1 mol of the compound (M18), the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
The reaction temperature of the reaction is usually in the range of −20 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M22) can be isolated by performing post-treatment operations such as water addition to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M22) can be further purified by chromatography, recrystallization and the like.
(中間体製造例23)(工程(E−1))
 化合物(M10)においてA1が酸素原子である化合物(M47)は、工程(E−1)に従い、化合物(M15)と化合物(M8)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000059
 [式中、R1、R2、R3、R4、R5、A2、n及びV2は前記と同じ意味を表す。]
 化合物(M2)に代えて化合物(M8)を用い、(製造法6)記載の方法に準じて、化合物(M47)を製造することができる。
(Intermediate Production Example 23) (Step (E-1))
Compound (M47) in which A1 is an oxygen atom in compound (M10) can be produced by reacting compound (M15) with compound (M8) according to step (E-1).
Figure JPOXMLDOC01-appb-I000059
[Wherein R 1, R 2, R 3, R 4, R 5, A 2, n and V 2 represent the same meaning as described above. ]
Compound (M47) can be produced according to the method described in (Production Method 6) using compound (M8) in place of compound (M2).
(中間体製造例24)(工程(E−2))
 化合物(M9)においてA1が酸素原子である化合物(M48)は、工程(E−2)に従い、化合物(M15)と化合物(M8)とを反応させることにより製造することができる。また化合物(M9)においてA1が硫黄原子である化合物(M49)は、化合物(M18)と化合物(M8)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000060
 [式中、R1、R2、R3、R4、R5、A2及びV2は前記と同じ意味を表す。]
 化合物(M2)に代えて化合物(M8)を用い、(中間体製造法6)記載の方法に準じて、化合物(M48)を製造することができる。
 化合物(M2)に代えて化合物(M8)を用い、(中間体製造法21)記載の方法に準じて、化合物(M49)を製造することができる。
(Intermediate Production Example 24) (Step (E-2))
Compound (M48) in which A1 is an oxygen atom in compound (M9) can be produced by reacting compound (M15) with compound (M8) according to step (E-2). In addition, compound (M49) in which A1 is a sulfur atom in compound (M9) can be produced by reacting compound (M18) with compound (M8).
Figure JPOXMLDOC01-appb-I000060
[Wherein, R1, R2, R3, R4, R5, A2 and V2 represent the same meaning as described above. ]
Compound (M48) can be produced according to the method described in (Intermediate Production Method 6) using Compound (M8) instead of Compound (M2).
Compound (M49) can be produced according to the method described in (Intermediate Production Method 21) using Compound (M8) instead of Compound (M2).
(中間体製造例25)(工程(E−3))
 化合物(M10)においてA1が酸素原子である化合物(M47)は、工程(E−3)に従い、化合物(M48)を環化させることにより製造することができる。また化合物(M10)においてA1が硫黄原子である化合物(M50)は、工程(E−3)に従い、化合物(M49)を環化させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000061
 [式中、R1、R2、R3、R4、R5、A2及びV2は前記と同じ意味を表す。]
 化合物(M17)に代えて化合物(M48)を用い、(製造法8)あるいは(製造法9)記載の方法に準じて、化合物(M47)を製造することができる。
 化合物(M22)に代えて化合物(M49)を用い、(製造法21)記載の方法に準じて、化合物(M50)を製造することができる。
(Intermediate Production Example 25) (Step (E-3))
Compound (M47) wherein A1 is an oxygen atom in compound (M10) can be produced by cyclizing compound (M48) according to step (E-3). Moreover, the compound (M50) in which A1 is a sulfur atom in the compound (M10) can be produced by cyclizing the compound (M49) according to the step (E-3).
Figure JPOXMLDOC01-appb-I000061
[Wherein, R1, R2, R3, R4, R5, A2 and V2 represent the same meaning as described above. ]
Using compound (M48) instead of compound (M17), compound (M47) can be produced according to the method described in (Production Method 8) or (Production Method 9).
The compound (M50) can be produced according to the method described in (Production Method 21) using the compound (M49) instead of the compound (M22).
(中間体製造法26)(工程(F−1))
 化合物(M11)は、工程(F−1)に従い、化合物(M10)と硫化ナトリウム、硫化水素ナトリウム又は硫化水素とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000062
[式中、R1、R2、R3、R4、R5、A1、A2及びV2は前記と同じ意味を表す。]
 化合物(M20)に代えて硫化ナトリウム、硫化水素ナトリウム又は硫化水素を用い、(製造法16)記載の方法に準じて、化合物(M11)を製造することができる。
 硫化ナトリウム、硫化水素ナトリウムを用いる場合は、通常塩基を加えずに行われる。
(Intermediate Production Method 26) (Step (F-1))
Compound (M11) can be produced by reacting compound (M10) with sodium sulfide, sodium hydrogen sulfide or hydrogen sulfide according to step (F-1).
Figure JPOXMLDOC01-appb-I000062
[Wherein, R 1, R 2, R 3, R 4, R 5, A 1, A 2 and V 2 represent the same meaning as described above. ]
Compound (M11) can be produced according to the method described in (Production Process 16) using sodium sulfide, sodium hydrogen sulfide or hydrogen sulfide instead of compound (M20).
When sodium sulfide or sodium hydrogen sulfide is used, it is usually carried out without adding a base.
(中間体製造法27)(製造法D)
 化合物(M7)は、化合物(M51)と化合物(M2)とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000063
[式中、R1、R2、R3、R4、R5、A2及びnは前記と同じ意味を表す。]
(工程I27−1)
 化合物(M51)は、化合物(M29)を還元反応に付すことにより製造することができる。
 該還元反応は、例えば鉄粉、亜鉛粉等の還元剤;塩酸、酢酸等の酸;および水の存在下で行うことができる。
 該反応は通常溶媒の存在下で行われる。
 該反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、酢酸エチル、酢酸ブチル等のエステル類、メタノール、エタノール等のアルコール類、DMF、NMP等の酸アミド類及びこれらの混合物が挙げられる。
 該反応には、化合物(M29)1モルに対して、還元剤が通常3~10モルの割合で用いられる。
 該反応の反応温度は通常0~100℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を加えた後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M51)を単離することができる。単離された化合物(M51)は、クロマトグラフィー、再結晶等により精製することもできる。
(工程I27−2)
 該反応は、通常溶媒の存在下あるいは非存在下で行われる。
 反応に用いられる溶媒としては、例えばTHF、エチレングリコールジメチルエーテル、tert−ブチルメチルエーテル、1,4−ジオキサン等のエーテル類、ヘキサン、ヘプタン、オクタン等の脂肪族炭化水素類、トルエン、キシレン等の芳香族炭化水素類、クロロベンゼン等のハロゲン化炭化水素類、酢酸エチル、酢酸ブチル等のエステル類、アセトニトリル等のニトリル類、DMF、NMP等の酸アミド類、DMSO等のスルホキシド類、ピリジン、キノリン等の含窒素芳香族化合物類及びこれらの混合物が挙げられる。
 反応に用いられる脱水縮合剤としては、例えばWSC、1,3−ジシクロヘキシルカルボジイミド等のカルボジイミド類、BOP試薬が挙げられる。
 該反応には、化合物(M51)1モルに対して、化合物(M2)が通常1~3モルの割合、脱水縮合剤が通常1~5モルの割合で用いられる。
 該反応の反応温度は、通常0~140℃の範囲である。該反応の反応時間は通常0.1~24時間の範囲である。
 反応終了後は、反応混合物に水を注加した後、有機溶媒で抽出し、有機層を乾燥、濃縮する等の後処理操作を行うことにより、化合物(M7)を単離することができる。単離された化合物(M7)は、クロマトグラフィー、再結晶等によりさらに精製することもできる。
 また、化合物(M2)に代えて化合物(M4)を用い、上記方法に準じて化合物(M7)を製造することもできる。
 化合物(M4)を用いる場合は、通常脱水縮合剤を加えずに行われる。必要に応じて塩基を加えて行うこともできる。
 塩基としては、炭酸ナトリウム、炭酸カリウム等のアルカリ金属炭酸塩類、トリエチルアミン、ジイソプロピルエチルアミン等の第3級アミン類及びピリジン、4−ジメチルアミノピリジン等の含窒素芳香族化合物類等が挙げられる。
 該反応には、化合物(M51)1モルに対して、化合物(M4)が通常1~3モルの割合、塩基が通常1~10モルの割合で用いられる。
(Intermediate Production Method 27) (Production Method D)
Compound (M7) can be produced by reacting compound (M51) with compound (M2).
Figure JPOXMLDOC01-appb-I000063
[Wherein, R1, R2, R3, R4, R5, A2 and n represent the same meaning as described above. ]
(Process I27-1)
Compound (M51) can be produced by subjecting compound (M29) to a reduction reaction.
The reduction reaction can be performed in the presence of a reducing agent such as iron powder or zinc powder; an acid such as hydrochloric acid or acetic acid; and water.
The reaction is usually performed in the presence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, esters such as ethyl acetate and butyl acetate, alcohols such as methanol and ethanol, Examples thereof include acid amides such as DMF and NMP, and mixtures thereof.
In the reaction, the reducing agent is usually used in a proportion of 3 to 10 mol per 1 mol of the compound (M29).
The reaction temperature is usually in the range of 0 to 100 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M51) can be isolated by post-treatment such as addition of water to the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M51) can also be purified by chromatography, recrystallization, and the like.
(Process I27-2)
The reaction is usually performed in the presence or absence of a solvent.
Examples of the solvent used in the reaction include ethers such as THF, ethylene glycol dimethyl ether, tert-butyl methyl ether, and 1,4-dioxane, aliphatic hydrocarbons such as hexane, heptane, and octane, and aromatics such as toluene and xylene. Group hydrocarbons, halogenated hydrocarbons such as chlorobenzene, esters such as ethyl acetate and butyl acetate, nitriles such as acetonitrile, acid amides such as DMF and NMP, sulfoxides such as DMSO, pyridine, quinoline and the like Examples thereof include nitrogen-containing aromatic compounds and mixtures thereof.
Examples of the dehydrating condensing agent used in the reaction include WSC, carbodiimides such as 1,3-dicyclohexylcarbodiimide, and BOP reagent.
In the reaction, with respect to 1 mol of the compound (M51), the compound (M2) is usually used in a proportion of 1 to 3 mol, and the dehydrating condensing agent is usually used in a proportion of 1 to 5 mol.
The reaction temperature of the reaction is usually in the range of 0 to 140 ° C. The reaction time is usually in the range of 0.1 to 24 hours.
After completion of the reaction, the compound (M7) can be isolated by performing post-treatment operations such as pouring water into the reaction mixture, extraction with an organic solvent, and drying and concentration of the organic layer. The isolated compound (M7) can be further purified by chromatography, recrystallization and the like.
Moreover, it can replace with a compound (M2) and a compound (M4) can be used, and a compound (M7) can also be manufactured according to the said method.
When the compound (M4) is used, it is usually carried out without adding a dehydrating condensing agent. A base can be added as necessary.
Examples of the base include alkali metal carbonates such as sodium carbonate and potassium carbonate, tertiary amines such as triethylamine and diisopropylethylamine, and nitrogen-containing aromatic compounds such as pyridine and 4-dimethylaminopyridine.
In the reaction, with respect to 1 mol of the compound (M51), the compound (M4) is usually used in a proportion of 1 to 3 mol, and the base is usually used in a proportion of 1 to 10 mol.
(中間体製造法28)
 化合物(M1)は、化合物(M52)とアミノ化剤とを反応させることにより製造することができる。
Figure JPOXMLDOC01-appb-I000064
[式中、Xg、R5、A1及びA2は前記と同じ意味を表す。]
 化合物(M44)に代えて化合物(M52)を用い、(中間体製造法20)の工程(I20−3)記載の方法に準じて、化合物(M1)を製造することができる。
(Intermediate Production Method 28)
Compound (M1) can be produced by reacting compound (M52) with an aminating agent.
Figure JPOXMLDOC01-appb-I000064
[Wherein, Xg, R5, A1 and A2 represent the same meaning as described above. ]
Compound (M1) can be produced according to the method described in Step (I20-3) of (Intermediate Production Method 20) using Compound (M52) instead of Compound (M44).
 次に、本縮合複素環化合物の具体例を以下に示す。表中、R1~R5、A1、A2及びnは、式(1)で示される化合物中の記号を示す。 Next, specific examples of the present condensed heterocyclic compound are shown below. In the table, R1 to R5, A1, A2, and n represent symbols in the compound represented by the formula (1).
Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000065
Figure JPOXMLDOC01-appb-T000066
Figure JPOXMLDOC01-appb-T000066
Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000067
Figure JPOXMLDOC01-appb-T000068
Figure JPOXMLDOC01-appb-I000069
Figure JPOXMLDOC01-appb-T000068
Figure JPOXMLDOC01-appb-I000069
(上記の〔表1〕~〔表4〕において、Meはメチル基を表し、Etはエチル基を表し、iPrはイソプロピル基を表し、CycPrはシクロプロピル基を表す。) (In the above [Table 1] to [Table 4], Me represents a methyl group, Et represents an ethyl group, iPr represents an isopropyl group, and CycPr represents a cyclopropyl group.)
 本発明において、本縮合複素環化合物は、そのままで用いることもできるが、通常は、本縮合複素環化合物と不活性担体とを混合し、必要に応じて界面活性剤やその他の製剤用補助剤を添加して、乳剤、フロアブル剤、水和剤、粉剤等に製剤化されて用いられる。
 かかる本縮合複素環化合物を含有する製剤における、本縮合複素環化合物の量は、通常01%~70重量%、好ましくは1~60重量%、より好ましくは5~50重量%の範囲である。
In the present invention, the fused heterocyclic compound can be used as it is, but usually, the fused heterocyclic compound and an inert carrier are mixed, and if necessary, a surfactant or other formulation adjuvant. Is added to an emulsion, flowable agent, wettable powder, powder or the like.
The amount of the present condensed heterocyclic compound in the preparation containing the present condensed heterocyclic compound is usually in the range of 01% to 70% by weight, preferably 1 to 60% by weight, more preferably 5 to 50% by weight.
 製剤化の際に用いられる不活性担体としては、固体担体、液体担体が挙げられる。前記の固体担体としては、例えば粘土類(カオリンクレー、珪藻土、ベントナイト、フバサミクレー、酸性白土等)、合成含水酸化珪素、タルク、セラミック、その他の無機鉱物(セリサイト、石英、硫黄、活性炭、炭酸カルシウム、水和シリカ等)、化学肥料(硫安、燐安、硝安、尿素、塩安等)等の微粉末及び粒状物等、並びに合成樹脂(ポリプロピレン、ポリアクリロニトリル、ポリメタクリル酸メチル、ポリエチレンテレフタレート等のポリエステル樹脂、ナイロン−6、ナイロン−11、ナイロン−66等のナイロン樹脂、ポリアミド樹脂、ポリ塩化ビニル、ポリ塩化ビニリデン、塩化ビニル−プロピレン共重合体等)があげられる。 Examples of the inert carrier used for formulation include a solid carrier and a liquid carrier. Examples of the solid support include clays (kaolin clay, diatomaceous earth, bentonite, fusami clay, acidic clay), synthetic hydrous silicon oxide, talc, ceramic, and other inorganic minerals (sericite, quartz, sulfur, activated carbon, calcium carbonate). , Hydrated silica, etc.), fine powders and granules of chemical fertilizers (ammonium sulfate, phosphorous acid, ammonium nitrate, urea, ammonium chloride, etc.), and synthetic resins (polypropylene, polyacrylonitrile, polymethyl methacrylate, polyethylene terephthalate, etc.) Polyester resin, nylon resin such as nylon-6, nylon-11, nylon-66, polyamide resin, polyvinyl chloride, polyvinylidene chloride, vinyl chloride-propylene copolymer).
 液体担体としては、例えば水、アルコール類(メタノール、エタノール、イソプロピルアルコール、ブタノール、ヘキサノール、ベンジルアルコール、エチレングリコール、プロピレングリコール、フェノキシエタノール等)、ケトン類(アセトン、メチルエチルケトン、シクロヘキサノン等)、芳香族炭化水素類(トルエン、キシレン、エチルベンゼン、ドデシルベンゼン、フェニルキシリルエタン、メチルナフタレン等)、脂肪族炭化水素類(ヘキサン、シクロヘキサン、灯油、軽油等)、エステル類(酢酸エチル、酢酸ブチル、ミリスチン酸イソプロピル、オレイン酸エチル、アジピン酸ジイソプロピル、アジピン酸ジイソブチル、プロピレングリコールモノメチルエーテルアセテート等)、ニトリル類(アセトニトリル、イソブチロニトリル等)、エーテル類(ジイソプロピルエーテル、1,4−ジオキサン、エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル、ジエチレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、3−メトキシ−3−メチル−1−ブタノール等)、酸アミド類(N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド等)、ハロゲン化炭化水素類(ジクロロメタン、トリクロロエタン、四塩化炭素等)、スルホキシド類(ジメチルスルホキシド等)、炭酸プロピレン及び植物油(大豆油、綿実油等)が挙げられる。 Examples of liquid carriers include water, alcohols (methanol, ethanol, isopropyl alcohol, butanol, hexanol, benzyl alcohol, ethylene glycol, propylene glycol, phenoxyethanol, etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone, etc.), aromatic hydrocarbons. (Toluene, xylene, ethylbenzene, dodecylbenzene, phenylxylylethane, methylnaphthalene, etc.), aliphatic hydrocarbons (hexane, cyclohexane, kerosene, light oil, etc.), esters (ethyl acetate, butyl acetate, isopropyl myristate, Ethyl oleate, diisopropyl adipate, diisobutyl adipate, propylene glycol monomethyl ether acetate, etc.), nitriles (acetonitrile, isobutyrate) Nitriles), ethers (diisopropyl ether, 1,4-dioxane, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol monomethyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, 3-methoxy-3-methyl-1-butanol, etc. ), Acid amides (N, N-dimethylformamide, N, N-dimethylacetamide, etc.), halogenated hydrocarbons (dichloromethane, trichloroethane, carbon tetrachloride, etc.), sulfoxides (dimethylsulfoxide, etc.), propylene carbonate and vegetable oil (Soybean oil, cottonseed oil, etc.).
 界面活性剤としては、例えばポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルアリールエーテル、ポリエチレングリコール脂肪酸エステル、等の非イオン界面活性剤、及びアルキルスルホン酸塩、アルキルベンゼンスルホン酸塩、アルキル硫酸塩当の陰イオン界面活性剤が挙げられる。 Examples of the surfactant include nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl ether, polyethylene glycol fatty acid ester, and the like, and alkyl sulfonate, alkyl benzene sulfonate, and alkyl sulfate. An ionic surfactant is mentioned.
 その他の製剤用補助剤としては、固着剤、分散剤、着色剤及び安定剤等、具体的には例えばカゼイン、ゼラチン、糖類(でんぷん、アラビアガム、セルロース誘導体、アルギン酸等)、リグニン誘導体、ベントナイト、合成水溶性高分子(ポリビニルアルコール、ポリビニルピロリドン、ポリアクリル酸類等)、PAP(酸性りん酸イソプロピル)、BHT(2,6−ジ−tert−ブチル−4−メチルフェノール)、BHA(2−tert−ブチル−4−メトキシフェノールと3−tert−ブチル−4−メトキシフェノールとの混合物)が挙げられる。 Examples of other formulation adjuvants include fixing agents, dispersants, colorants and stabilizers, such as casein, gelatin, saccharides (starch, gum arabic, cellulose derivatives, alginic acid, etc.), lignin derivatives, bentonite, Synthetic water-soluble polymers (polyvinyl alcohol, polyvinylpyrrolidone, polyacrylic acids, etc.), PAP (isopropyl acid phosphate), BHT (2,6-di-tert-butyl-4-methylphenol), BHA (2-tert- And a mixture of butyl-4-methoxyphenol and 3-tert-butyl-4-methoxyphenol).
 本発明方法によって防除することができる有害節足動物とは、本縮合複素環化合物で処理されてなる植物種子、又は、該植物種子が発芽した後の植物体を食害する害虫である。かかる有害節足動物としては、例えば、有害昆虫類が挙げられ、具体的には以下のものが挙げられる。 The harmful arthropod that can be controlled by the method of the present invention is a plant seed treated with the present condensed heterocyclic compound or a pest that damages the plant body after the plant seed germinates. Examples of such harmful arthropods include harmful insects, and specifically include the following.
半翅目害虫:ヒメトビウンカ(Laodelphax striatellus)、トビイロウンカ(Nilaparvata lugens)、セジロウンカ(Sogatella furcifera)等のウンカ類、ツマグロヨコバイ(Nephotettix cincticeps)等のヨコバイ類、ワタアブラムシ(Aphis gossypii)、モモアカアブラムシ(Myzus persicae)、ダイコンアブラムシ(Brevicoryne brassicae)、チューリップヒゲナガアブラムシ(Macrosiphum euphorbiae)、ジャガイモヒゲナガアブラムシ(Aulacorthum solani)、ムギクビレアブラムシ(Rhopalosiphum padi)等のアブラムシ類、アオクサカメムシ(Nezara antennata)、ホソヘリカメムシ(Riptortus clavetus)、クモヘリカメムシ(Leptocorisa chinensis)、トゲシラホシカメムシ(Eysarcoris parvus)、クサギカメムシ(Halyomorpha mista)等のカメムシ類、オンシツコナジラミ(Trialeurodes vaporariorum)、タバココナジラミ(Bemisia tabaci)等のコナジラミ類。 Hemiptera pests: Loondelphax striatellus, Japanese brown planthopper (Nilaparvata lugens), Japanese green planthopper (Sogellaella fursifera), etc .; ), Radish aphids (Brevicoryne brassicae), tulip beetle aphids (Macrosiphum euphorbiae), potato beetle aphids (Aulacorthum solani), wheat beetle aphids (Rhopalosiphumpa) Shi class, order Hemiptera (Nezara antennata), bombardier helicopter stink bug (Riptortus clavetus), spider helicopter bug (Leptocorisa chinensis), thorns Shirahoshi bug (Eysarcoris parvus), stink bugs such as brown marmorated stink bug (Halyomorpha mista), greenhouse whitefly (Trialeurodes vaporariorum ), Whiteflies such as tobacco whitefly (Bemisia tabaci).
 鱗翅目害虫:ニカメイガ(Chilo suppressalis)、サンカメイガ(Tryporyza incertulas)、コブノメイガ(Cnaphalocrocis medinalis)、ワタノメイガ(Notarcha derogata)、ノシメマダラメイガ(Plodia interpunctella)、アワノメイガ(Ostrinia furnacalis)、ハイマダラノメイガ(Hellula undalis)等のメイガ類、ハスモンヨトウ(Spodoptera litura)、シロイチモジヨトウ(Spodoptera exigua)、アワヨトウ(Pseudaletia separata)、ヨトウガ(Mamestra brassicae)、タマナヤガ(Agrotis ipsilon),タマナギンウワバ(Plusia nigrisigna),トリコプルシア属、ヘリオティス属、ヘリコベルパ属等のヤガ類、モンシロチョウ(Pieris rapae)等のシロチョウ類、マメシンクイガ(Leguminivora glycinivorella)、アズキサヤムシガ(Matsumuraeses azukivora)等のハマキガ類、コナガ(Plutella xylostella)等のスガ類。 Lepidoptera: rice stem borer (Chilo suppressalis), Sankameiga (Tryporyza incertulas), leaf roller (Cnaphalocrocis medinalis), Watanomeiga (Notarcha derogata), Indian meal moth (Plodia interpunctella), the European corn borer (Ostrinia furnacalis), high Madara Roh moth (Hellula undalis), etc. Japanese medusa, Spodoptera litra, Spodoptera exigua, Pseudoteria sepata, Mamestra brassicae, Atamara tis ipsilon, Tamiaginuawaba (Plusia nigrisigna), Trichopulsia spp., Heliotis spp., Helicoberpa spp. Suga, such as Ponella xylostella.
アザミウマ目害虫:ミカンキイロアザミウマ(Frankliniella occidentalis)、ミナミキイロアザミウマ(Thrips palmi)、チャノキイロアザミウマ(Scirtothrips dorsalis)、ネギアザミウマ(Thrips tabaci)、ヒラズハナアザミウマ(Frankliniella intonsa)等のアザミウマ類。 Thrips of the order Thrips thrips (Franklinella occidentalis), Thrips palmi, etc.
双翅目害虫:タネバエ(Delia platura)、タマネギバエ(Delia antiqua)等のハナバエ類、イネハモグリバエ(Agromyza oryzae)、イネヒメハモグリバエ(Hydrellia griseola)、トマトハモグリバエ、(Liriomyza sativae)、マメハモグリバエ(Liriomyza trifolii)、ナモグリバエ(Chromatomyia horticola)等のハモグリバエ類、イネキモグリバエ(Chlorops oryzae)等のキモグリバエ類。 Diptera: seedcorn maggot (Delia platura), onion maggot (Delia antiqua) Anthomyiidae such as, rice leafminer (Agromyza oryzae), rice Hime leafminer (Hydrellia griseola), tomato leafminer, (Liriomyza sativae), legume leafminer (Liriomyza trifolii) , Leafworms such as Chlamatomya horticola, and leafworms such as Chlorops oryzae.
鞘翅目害虫:ウエスタンコーンルートワーム(Diabrotica virgifera virgifera)、サザンコーンルートワーム(Diabrotica undecimpunctata howardi)等のコーンルートワーム類、ドウガネブイブイ(Anomala cuprea)、ヒメコガネ(Anomala rufocuprea)、マメコガネ(Popillia japonica)等のコガネムシ類、メイズウィービル(Sitophilus zeamais)、イネミズゾウムシ(Lissorhoptrus oryzophilus)、イネゾウムシ(Echinocnemus squameus)、ワタミゾウムシ(Anthonomus grandis)等のゾウムシ類、イネドロオイムシ(Oulema oryzae)、ウリハムシ(Aulacophora femoralis)、キスジノミハムシ(Phyllotreta striolata)、コロラドハムシ(Leptinotarsa decemlineata)等のハムシ類、コメツキムシ類(Agriotes spp.)、およびアオバアリガタハネカクシ(Paederus fuscipes)。 Coleoptera pests: Western Corn Rootworm (Diabrotica virgifera virgifera), corn rootworm such as southern corn rootworm (Diabrotica undecimpunctata howardi), cupreous chafer (Anomala cuprea), rufocuprea (Anomala rufocuprea), chafers such as Japanese beetle (Popillia japonica) Weevil such as weevil (Sitophilus zeamais), rice weevil (Lissohoptrus oryzophilus), weevil (Echinocnemus squameus), weevil (Anthonomus grandis), etc. Worms (Oulema oryzae), cucurbit leaf beetle (Aulacophora femoralis), Kisujinomihamushi (Phyllotreta striolata), Chrysomelidae such as Colorado potato beetle (Leptinotarsa decemlineata), click beetles such (Agriotes spp.), And Aoba ants backlash Staphylinidae (Paederus fuscipes).
 本発明においては、本縮合複素環化合物で下記「作物」の種子を処理することができる。
 農作物:トウモロコシ、イネ、コムギ、オオムギ、ライムギ、エンバク、ソルガム、ワタ、ダイズ、ピーナッツ、ソバ、テンサイ、ナタネ、ヒマワリ、タバコ等。
 野菜;ナス科野菜(ナス、トマト、ピーマン、トウガラシ、ジャガイモ等)、ウリ科野菜(キュウリ、カボチャ、ズッキーニ、スイカ、メロン等)、アブラナ科野菜(ダイコン、カブ、セイヨウワサビ、コールラビ、ハクサイ、キャベツ、カラシナ、ブロッコリー、カリフラワー等)、キク科野菜(ゴボウ、シュンギク、アーティチョーク、レタス等)、ユリ科野菜(ネギ、タマネギ、ニンニク、アスパラガス)、セリ科野菜(ニンジン、パセリ、セロリ、アメリカボウフウ等)、アカザ科野菜(ホウレンソウ、フダンソウ等)、シソ科野菜(シソ、ミント、バジル等)。
In the present invention, seeds of the following “crop” can be treated with the present condensed heterocyclic compound.
Agricultural crops: corn, rice, wheat, barley, rye, oat, sorghum, cotton, soybean, peanut, buckwheat, sugar beet, rapeseed, sunflower, tobacco, etc.
Vegetables: Solanum vegetables (eggplants, tomatoes, peppers, peppers, potatoes, etc.), Cucurbitaceae vegetables (cucumbers, pumpkins, zucchini, watermelons, melons, etc.), cruciferous vegetables (radish, turnip, horseradish, kohlrabi, Chinese cabbage, cabbage) , Mustard, broccoli, cauliflower, etc.), asteraceae vegetables (burdock, shungiku, artichoke, lettuce, etc.), liliaceae vegetables (leek, onion, garlic, asparagus), celeryaceae vegetables (carrot, parsley, celery, American scallop, etc.) ), Red crustacean vegetables (spinach, chard, etc.), perilla vegetables (perilla, mint, basil).
 「作物」には、遺伝子組換え作物も含まれる。 “Crop” includes genetically modified crops.
 本発明において、本縮合複素環化合物で処理されてなる植物種子は、植物種子の内部又は表面、或いは、植物種子の周囲に形成された被覆部に、本縮合複素環化合物の有効量を保持している。植物種子の処理方法としては、種々の形態を採り得るが、例えば、本縮合複素環化合物を種子表面に吹きつける吹きつけ処理、本縮合複素環化合物を種子に塗布する塗沫処理、浸漬処理、フィルムコート処理及びペレットコート処理が挙げられる。なお、本発明において、植物種子とは、土壌あるいは栽培する培地に播種する前の状態の植物の種子を意味する。 In the present invention, a plant seed treated with the present condensed heterocyclic compound retains an effective amount of the present condensed heterocyclic compound in the interior or surface of the plant seed or a coating formed on the periphery of the plant seed. ing. The plant seed treatment method may take various forms, for example, a spraying process in which the present condensed heterocyclic compound is sprayed on the seed surface, a smearing process in which the present condensed heterocyclic compound is applied to the seed, an immersion process, A film coat process and a pellet coat process are mentioned. In addition, in this invention, a plant seed means the seed of the plant of the state before sowing to soil or the culture medium to grow.
 かかる植物種子に対する本縮合複素環化合物の使用量は、植物の種類、防除対象である有害節足動物の種類や発生程度、製剤形態、播種時期、気象条件等によって変化させ得るが、植物種子10kgに対して、通常0.01~1000g、好ましくは0.2~200g、より好ましくは1~10gである。植物種子100粒に対しては、通常0.01~1000mg、好ましくは0.1~100mgである。
 本発明において、本縮合複素環化合物は、下記群(A)から選ばれる1種以上の化合物と混合し、植物種子に処理することができる。
群(A)
A−1:ネオニコチノイド
イミダクロプリド、クロチアニジン、チアメトキサム、ジノテフラン、アセタミプリド、チアクロプリド及びニテンピラム
A−2:合成ピレスロイド
アクリナトリン、ビフェントリン、シクロプロトリン、シフルトリン、ベータ−シフルトリン、シハロトリン、ラムダシハロトリン、ガンマシハロトリン、シペルメトリン、アルファシペルメトリン、ベータシペルメトリン、シータシペルメトリン、ゼータシペルメトリン、デルタメトリン、エトフェンプロックス、フェンプロパトリン、フェンバレレート、エスフェンバレレート、フルシトリネート、フルバリネート、タウフルバリネート、ハルフェンプロックス、ペルメトリン、シラフルオフェン、テフルトリン、トラロメトリン及びプロトリフェンビュート
A−3:フェニルピラゾール
エチプロール、フィプロニル、アセトプロール、バニリプロール、ピリプロール及びピラフルプロール
A−4:マクロライド
アバメクチン、エマメクチン、エマメクチン安息香酸塩、ミルベメクチン、ドラメクチン及びレピメクチン
A−5:ジアミド
フルベンジアミド及び下記式(2)で示される化合物
式(2)
Figure JPOXMLDOC01-appb-I000070
[式(2)において、R1がメチル基又は臭素原子、R2が臭素原子、塩素原子又はシアノ基、R3がメチル基、1−シクロプロピルエチル基又はメトキシカルボニルアミノ基、R4が水素原子又はエチル基を示す。]
A−6:その他殺虫剤
 ピメトロジン、ピリダリル、ピリプロキシフェン、スピロテトラマト、スルホキサフロル及びフルピラジフロン
A−7:アゾール
テブコナゾール、メトコナゾール、ジフェノコナゾール、トリチコナゾール、イマザリル、トリアジメノール、フルキンコナゾール、プロクロラズ、プロチオコナゾール、ジニコナゾール、ジニコナゾールM、シプロコナゾール、テトラコナゾール、イプコナゾール、トリホリン、ピリフェノックス、フェナリモル、ヌアリモール、オキスポコナゾールフマル酸塩、ペフラゾエート、トリフルミゾール、アザコナゾール、ビテルタノール、ブロムコナゾール、エポキシコナゾール、フェンブコナゾール、フルシラゾール、フルトリアホール、ヘキサコナゾール、イミベンコナゾール、ミクロブタニル、ペンコナゾール、プロピコナゾール、シメコナゾール及びトリアジメホン
A−8:ストロビルリン
クレソキシムメチル、アゾキシストロビン、ピラクロストロビン、ピコキシストロビン、エネストロビン、トリフロキシストロビン、ジモキシストロビン、フルオキサストロビン、オリサストロビン、ファモキサドン、フェナミドン、メトミノストロビン及び下記式(3)で示される化合物
式(3)
Figure JPOXMLDOC01-appb-I000071
A−9:フェニルアミド
メタラキシル、メタラキシル−M、フララキシル−M、ベナラキシル、ベナラキシル−M、オフレース及びオキサジキシル
A−10:イネいもち病防除化合物
プロベナゾール、チアジニル、トリシクラゾール、ピロキロン、カスガマイシン塩酸塩、フェリムゾン、イソチアニル、フサライド及びテブフロキン
A−11:イネ紋枯病防除化合物
ペンシクロン、フラメトピル及びバリダマイシン
A−12:カルボキサミド
カルボキシン、フルトラニル、ペンチオピラド、フルオピラム、ペンフルフェン、セダキサン、フルキサピロキサド及び下記式(4)で示される化合物
式(4)
Figure JPOXMLDOC01-appb-I000072
〔式中、
R1は水素原子又はメチル基を表し、
R2はメチル基、ジフルオロメチル基又はトリフルオロメチル基を表す。〕
で示される化合物
A−13:その他殺菌剤
フルジオキソニル、エタボキサム、トルクロホスメチル及びキャプタン
A−14:その他の化合物
4−オキソ−4−[(2−フェニルエチル)アミノ]−酪酸、
The amount of the present condensed heterocyclic compound used for such plant seeds can vary depending on the type of plant, the type and occurrence of harmful arthropods to be controlled, the form of preparation, sowing time, weather conditions, etc. Is usually 0.01 to 1000 g, preferably 0.2 to 200 g, more preferably 1 to 10 g. The amount is usually 0.01 to 1000 mg, preferably 0.1 to 100 mg, per 100 plant seeds.
In the present invention, the present fused heterocyclic compound can be mixed with one or more compounds selected from the following group (A) and treated to plant seeds.
Group (A)
A-1: Neonicotinoid imidacloprid, clothianidin, thiamethoxam, dinotefuran, acetamiprid, thiacloprid and nitenpyram A-2: synthetic pyrethroid acrinathrin, bifenthrin, cycloprotorin, cyfluthrin, beta-cyfluthrin, cihalothrin, lambda cihalothrin, cancer Masihalothrin, cypermethrin, alpha cypermethrin, beta cypermethrin, theta cypermethrin, zetacypermethrin, deltamethrin, etofenprox, fenpropatoline, fenvalerate, esfenvalerate, flucitrinate, fulvalinate, taufulvalinate , Halfenprox, Permethrin, Silafluophene, Tefluthrin, Tralomethrin and Protrifen Butte A 3: phenylpyrazole etiprole, fipronil, acetoprole, vaniliprole, pyriprole and pyrafluprolol A-4: macrolide abamectin, emamectin, emamectin benzoate, milbemectin, doramectin and lepimectin A-5: diamide fulvendiamide and the following formula ( Compound formula (2) represented by 2)
Figure JPOXMLDOC01-appb-I000070
[In the formula (2), R1 is a methyl group or bromine atom, R2 is a bromine atom, chlorine atom or cyano group, R3 is a methyl group, 1-cyclopropylethyl group or methoxycarbonylamino group, R4 is a hydrogen atom or ethyl group Indicates. ]
A-6: Other insecticides Pymetrozine, pyridalyl, pyriproxyfen, spirotetramat, sulfoxafurol and flupiradifurone A-7: azoletebuconazole, metconazole, difenoconazole, triticonazole, imazalyl, triadimenol, fluquinconazole, prochloraz, prochiraz Oconazole, diniconazole, diniconazole M, cyproconazole, tetraconazole, ipconazole, trifolin, pyrifenox, phenarimol, nuarimol, oxpoconazole fumarate, pefazoate, triflumizole, azaconazole, vitertanol, bromconazole, Epoxyconazole, fenbuconazole, flusilazole, flutriazole, hexaconazole, imibenconazole, micro Butanyl, penconazole, propiconazole, cimeconazole, and triazimephone A-8: strobilurin resoxime methyl, azoxystrobin, pyraclostrobin, picoxystrobin, enestrobine, trifloxystrobin, dimoxystrobin, floxastrobin, orizastrobin , Famoxadone, phenamidon, metminostrobin, and a compound represented by the following formula (3)
Figure JPOXMLDOC01-appb-I000071
A-9: Phenylamide metalaxyl, metalaxyl-M, furaxyl-M, benalaxyl, benalaxyl-M, off race and oxadixyl A-10: rice blast control compound probenazole, thiazinyl, tricyclazole, pyroxylone, kasugamycin hydrochloride, felimzone, isothianyl , Fusalide and tebufloquine A-11: rice blight control compound pencyclon, furametopil and validamycin A-12: carboxamido carboxin, flutolanil, penthiopyrad, fluopyram, penflufen, sedaxane, fluxapilox and the following formula (4) Compound formula (4)
Figure JPOXMLDOC01-appb-I000072
[Where,
R1 represents a hydrogen atom or a methyl group,
R2 represents a methyl group, a difluoromethyl group or a trifluoromethyl group. ]
Compound A-13 represented by: Other fungicides fludioxonil, ethaboxam, tolcrofosmethyl and captan A-14: Other compounds 4-oxo-4-[(2-phenylethyl) amino] -butyric acid,
 以下、本発明を製造例、参考製造例、製剤例及び試験例等によりさらに詳しく説明するが、本発明はこれらの例のみに限定されるものではない。
 まず、本縮合複素環化合物の製造について、製造例を示す。
Hereinafter, although this invention is demonstrated in more detail by a manufacture example, a reference manufacture example, a formulation example, a test example, etc., this invention is not limited only to these examples.
First, a manufacture example is shown about manufacture of this condensed heterocyclic compound.
 以下、本縮合複素環化合物の製造例を示すが、本縮合複素環化合物はこれらの例のみに限定されるものではない。 Hereinafter, production examples of the present condensed heterocyclic compound will be shown, but the present condensed heterocyclic compound is not limited to these examples.
製造例1
 N2−メチル−5−トリフルオロメチルピリジン−2,3−ジアミン1.0g、2−エチルスルファニルベンズアルデヒド0.96g、亜硫酸水素ナトリウム1.80g及びDMF10mlの混合物を、160℃で5時間加熱撹拌した。反応混合物を氷冷し、水を添加し析出した結晶をろ取し、水、次いでヘキサンで洗浄した。得られた結晶を、減圧下乾燥し、2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物1と記す。)1.09gを得た。
本縮合複素環化合物1
Figure JPOXMLDOC01-appb-I000073
1H−NMR(CDCl3)δ:8.72−8.70(1H,m),8.33−8.31(1H,m),7.56−7.49(2H,m),7.47−7.43(1H,m),7.39−7.34(1H,m),3.77(3H,s),2.87(2H,q),1.24(3H,t)
Production Example 1
N2- methyl-5-trifluoromethyl-2,3-diamine 1.0 g, 2-ethylsulfanyl benzaldehyde 0.96 g, a mixture of sodium bisulfite 1.80g and 10 ml of DMF, and stirred for 5 hours at 160 ° C.. The reaction mixture was ice-cooled, water was added, and the precipitated crystals were collected by filtration, and washed with water and then hexane. The obtained crystals were dried under reduced pressure to give 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound). 1)) 1.09 g was obtained.
This condensed heterocyclic compound 1
Figure JPOXMLDOC01-appb-I000073
1H-NMR (CDCl3) δ: 8.72-8.70 (1H, m), 8.33-8.31 (1H, m), 7.56-7.49 (2H, m), 7.47 -7.43 (1H, m), 7.39-7.34 (1H, m), 3.77 (3H, s), 2.87 (2H, q), 1.24 (3H, t)
製造例2
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン0.25g、過ヨウ素酸ナトリウム0.24g、メタノール6ml、水2ml及びTHF0.8mlの混合物を室温で20分間撹拌した後、50℃まで昇温し、さらに1.5時間加熱撹拌した。氷冷した反応混合物に、水を添加した後、析出した結晶をろ取した。ろ取した結晶を酢酸エチルに溶解し、飽和チオ硫酸ナトリウム水溶液、飽和炭酸水素ナトリウム水溶液、飽和食塩水で順次洗浄後、有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をヘキサンで洗浄し、2−(2−エチルスルフィニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物2と記す。)0.20gを得た。
本縮合複素環化合物2
Figure JPOXMLDOC01-appb-I000074
1H−NMR(CDCl3)δ:8.76−8.74(1H,m),8.32−8.30(1H,m),8.27−8.24(1H,m),7.86−7.81(1H,m),7.72−7.68(1H,m),7.62−7.59(1H,m),3.89(3H,s),3.42−3.31(1H,m),3.02−2.92(1H,m),1.31(3H,t)
Production Example 2
2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine 0.25 g, sodium periodate 0.24 g, methanol 6 ml, water 2 ml and THF0 .8 ml of the mixture was stirred at room temperature for 20 minutes, then heated to 50 ° C., and further heated and stirred for 1.5 hours. Water was added to the ice-cooled reaction mixture, and the precipitated crystals were collected by filtration. The crystals collected by filtration were dissolved in ethyl acetate, washed successively with saturated aqueous sodium thiosulfate solution, saturated aqueous sodium hydrogen carbonate solution and saturated brine, and then the organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was washed with hexane, and 2- (2-ethylsulfinylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 2). 0.20 g was obtained.
This condensed heterocyclic compound 2
Figure JPOXMLDOC01-appb-I000074
1H-NMR (CDCl3) δ: 8.76-8.74 (1H, m), 8.32-8.30 (1H, m), 8.27-8.24 (1H, m), 7.86 -7.81 (1H, m), 7.72-7.68 (1H, m), 7.62-7.59 (1H, m), 3.89 (3H, s), 3.42-3 .31 (1H, m), 3.02-2.92 (1H, m), 1.31 (3H, t)
製造例3
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン0.25g及びクロロホルム3mlの混合物に、氷冷下3−クロロ過安息香酸(純度65%以上)0.43gを加えた後、室温まで昇温し、1時間撹拌した。氷冷下、反応混合物にクロロホルムを加えた後、飽和チオ硫酸ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、次いで飽和食塩水で洗浄し、硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた結晶をヘキサン、次いでメチル−tert−ブチルエーテルで洗浄し、2−(2−エチルスルホニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物3と記す。)0.27gを得た。
本縮合複素環化合物3
Figure JPOXMLDOC01-appb-I000075
1H−NMR(CDCl3)δ:8.75−8.73(1H,m),8.29−8.27(1H,m),8.25−8.21(1H,m),7.87−7.79(2H,m),7.58−7.55(1H,m),3.72(3H,s),3.42(2H,q),1.26(3H,t)
Production Example 3
2-Chloroperbenzoic acid was added to a mixture of 0.25 g of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine and 3 ml of chloroform under ice cooling. After adding 0.43 g (purity 65% or more), the mixture was warmed to room temperature and stirred for 1 hour. Chloroform was added to the reaction mixture under ice-cooling, saturated aqueous sodium thiosulfate solution was added, and the mixture was extracted with ethyl acetate. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and then with saturated brine, dried over sodium sulfate, and concentrated under reduced pressure. The obtained crystals were washed with hexane and then with methyl-tert-butyl ether to give 2- (2-ethylsulfonylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as “(2-ethylsulfonylphenyl) -3-methyl-tert-butyl ether)” This is referred to as the present condensed heterocyclic compound 3.) 0.27 g was obtained.
This condensed heterocyclic compound 3
Figure JPOXMLDOC01-appb-I000075
1H-NMR (CDCl3) δ: 8.75-8.73 (1H, m), 8.29-8.27 (1H, m), 8.25-8.21 (1H, m), 7.87 -7.79 (2H, m), 7.58-7.55 (1H, m), 3.72 (3H, s), 3.42 (2H, q), 1.26 (3H, t)
製造例4
 N2−エチル−5−トリフルオロメチルピリジン−2,3−ジアミン700mg、2−エチルスルファニル安息香酸690mg及びピリジン20mlの混合物に、室温下、WSC720mgを加え、95℃に昇温した後に10時間加熱撹拌した。室温まで冷却した反応混合物に、飽和炭酸ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。
 得られた残渣をキシレン20mlに溶解し、p−トルエンスルホン酸一水和物1.6gを加えた。この混合物を170℃まで昇温し、9.5時間加熱撹拌した。室温まで冷却した反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、3−エチル−2−(2−エチルスルファニルフェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物4と記す。)295mgを得た。
本縮合複素環化合物4
Figure JPOXMLDOC01-appb-I000076
1H−NMR(CDCl3)δ:8.70(1H,s),8.32(1H,s),7.60−7.30(4H,m),4.25(2H,q),2.89(2H,q),1.35−1.30(3H,m),1.27−1.21(3H,m)
Production Example 4
To a mixture of 700 mg of N2-ethyl-5-trifluoromethylpyridine-2,3-diamine, 690 mg of 2-ethylsulfanylbenzoic acid and 20 ml of pyridine, 720 mg of WSC was added at room temperature. did. Saturated aqueous sodium carbonate solution was added to the reaction mixture cooled to room temperature, and the mixture was extracted with ethyl acetate. The organic layer was dried over sodium sulfate and concentrated under reduced pressure.
The obtained residue was dissolved in 20 ml of xylene, and 1.6 g of p-toluenesulfonic acid monohydrate was added. The mixture was heated to 170 ° C. and stirred with heating for 9.5 hours. A saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture cooled to room temperature, and the mixture was extracted with ethyl acetate. The organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 3-ethyl-2- (2-ethylsulfanylphenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed complex). This is referred to as ring compound 4.) 295 mg was obtained.
This condensed heterocyclic compound 4
Figure JPOXMLDOC01-appb-I000076
1H-NMR (CDCl3) δ: 8.70 (1H, s), 8.32 (1H, s), 7.60-7.30 (4H, m), 4.25 (2H, q), 2. 89 (2H, q), 1.35-1.30 (3H, m), 1.27-1.21 (3H, m)
製造例5及び6
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて3−エチル−2−(2−エチルスルファニルフェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンを用いて、製造例32及び33記載の方法に準じて、2−(2−エチルスルフィニルフェニル)−3−エチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物5と記す。)140mg、及び2−(2−エチルスルホニルフェニル)−3−エチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物6と記す。)60mgを得た。
本縮合複素環化合物5
Figure JPOXMLDOC01-appb-I000077
1H−NMR(CDCl3)δ:8.75(1H,d),8.31(1H,d),8.24(1H,dd),7.84(1H,dt),7.70(1H,dt),7.58(1H,dd),4.35(2H,q),3.43−3.30(1H,m),3.06−2.94(1H,m),1.41(3H,t),1.30(3H,t)
本縮合複素環化合物6
Figure JPOXMLDOC01-appb-I000078
1H−NMR(CDCl3)δ:8.71(1H,d),8.32(1H,d),7.56−7.47(2H,m),7.43(1H,dd),7.39−7.31(1H,m),4.25(2H,q),2.89(2H,q),1.32(3H,t),1.25(3H,t)
Production Examples 5 and 6
Instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 3-ethyl-2- (2-ethylsulfanylphenyl) ) -6-Trifluoromethyl-3H-imidazo [4,5-b] pyridine and 2- (2-ethylsulfinylphenyl) -3-ethyl-6 according to the methods described in Preparation Examples 32 and 33 -Trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 5) 140 mg, and 2- (2-ethylsulfonylphenyl) -3-ethyl-6-trifluoro 60 mg of methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 6) was obtained.
This condensed heterocyclic compound 5
Figure JPOXMLDOC01-appb-I000077
1H-NMR (CDCl3) δ: 8.75 (1H, d), 8.31 (1H, d), 8.24 (1H, dd), 7.84 (1H, dt), 7.70 (1H, dt), 7.58 (1H, dd), 4.35 (2H, q), 3.43-3.30 (1H, m), 3.06-2.94 (1H, m), 1.41 (3H, t), 1.30 (3H, t)
This condensed heterocyclic compound 6
Figure JPOXMLDOC01-appb-I000078
1H-NMR (CDCl3) δ: 8.71 (1H, d), 8.32 (1H, d), 7.56-7.47 (2H, m), 7.43 (1H, dd), 7. 39-7.31 (1H, m), 4.25 (2H, q), 2.89 (2H, q), 1.32 (3H, t), 1.25 (3H, t)
製造例7
 N2−エチル−5−トリフルオロメチル−ピリジン−2,3−ジアミンに代えてN2−イソプロピル−5−トリフルオロメチル−ピリジン−2,3−ジアミンを用い、製造例4記載の方法に準じて、2−(2−エチルスルファニルフェニル)−3−イソプロピル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物7と記す。)130mgを得た。
本縮合複素環化合物7
Figure JPOXMLDOC01-appb-I000079
1H−NMR(CDCl3)δ:8.68(1H,d),8.28(1H,d),7.55−7.47(2H,m),7.39−7.31(2H,m),4.40−4.33(1H,m),2.91(2H,q),1.77−1.66(6H,m),1.25(3H,t)
Production Example 7
According to the method described in Preparation Example 4, using N2-isopropyl-5-trifluoromethyl-pyridine-2,3-diamine instead of N2-ethyl-5-trifluoromethyl-pyridine-2,3-diamine, 130 mg of 2- (2-ethylsulfanylphenyl) -3-isopropyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 7) was obtained.
This condensed heterocyclic compound 7
Figure JPOXMLDOC01-appb-I000079
1H-NMR (CDCl3) δ: 8.68 (1H, d), 8.28 (1H, d), 7.55-7.47 (2H, m), 7.39-7.31 (2H, m ), 4.40-4.33 (1H, m), 2.91 (2H, q), 1.77-1.66 (6H, m), 1.25 (3H, t)
製造例8および9
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−3−イソプロピル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例32及び33記載の方法に準じて、2−(2−エチルスルフィニルフェニル)−3−イソプロピル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物8と記す。)60mg、及び2−(2−エチルスルホニルフェニル)−3−イソプロピル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物9と記す。)55mgを得た。
本縮合複素環化合物8
Figure JPOXMLDOC01-appb-I000080
1H−NMR(CDCl3)δ:8.73(1H,d),8.28(1H,d),8.22(1H,dd),7.83(1H,td),7.69(1H,td),7.50(1H,dd),4.60−4.48(1H,m),3.38−3.26(1H,m),3.05−2.95(1H,m),1.77−1.71(6H,m),1.27(3H,t)
本縮合複素環化合物9
Figure JPOXMLDOC01-appb-I000081
1H−NMR(CDCl3)δ:8.71(1H,d),8.24−8.22(2H,m),7.85−7.78(2H,m),7.55−7.52(1H,m),4.33−4.26(1H,m),3.72−3.62(1H,m),3.44−3.34(1H,m),1.77−1.69(6H,m),1.28(3H,t)
Production Examples 8 and 9
Instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -3- 2- (2-Ethylsulfinylphenyl) -3-isopropyl-6-, using isopropyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, according to the methods described in Preparation Examples 32 and 33 60 mg of trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 8), and 2- (2-ethylsulfonylphenyl) -3-isopropyl-6-trifluoromethyl 55 mg of -3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 9) was obtained.
This condensed heterocyclic compound 8
Figure JPOXMLDOC01-appb-I000080
1H-NMR (CDCl3) δ: 8.73 (1H, d), 8.28 (1H, d), 8.22 (1H, dd), 7.83 (1H, td), 7.69 (1H, td), 7.50 (1H, dd), 4.60-4.48 (1H, m), 3.38-3.26 (1H, m), 3.05-2.95 (1H, m) , 1.77-1.71 (6H, m), 1.27 (3H, t)
This condensed heterocyclic compound 9
Figure JPOXMLDOC01-appb-I000081
1H-NMR (CDCl3) δ: 8.71 (1H, d), 8.24-8.22 (2H, m), 7.85-7.78 (2H, m), 7.55-7.52 (1H, m), 4.33-4.26 (1H, m), 3.72-3.62 (1H, m), 3.44-3.34 (1H, m), 1.77-1 .69 (6H, m), 1.28 (3H, t)
製造例10
 N2−エチル−5−トリフルオロメチル−ピリジン−2,3−ジアミンに代えてN2−シクロプロピル−5−トリフルオロメチル−ピリジン−2,3−ジアミンを用い、製造例4記載の方法に準じて、3−シクロプロピル−2−(2−エチルスルファニルフェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物10と記す。)280mgを得た。
本縮合複素環化合物10
Figure JPOXMLDOC01-appb-I000082
1H−NMR(CDCl3)δ:8.74(1H,s),8.31(1H,s),7.53−7.47(3H,m),7.39−7.31(1H,m),3.55−3.49(1H,m),2.90(2H,q),1.25(3H,t),1.01−0.94(2H,m),0.93−0.86(2H,m)
Production Example 10
In accordance with the method described in Preparation Example 4, using N2-cyclopropyl-5-trifluoromethyl-pyridine-2,3-diamine instead of N2-ethyl-5-trifluoromethyl-pyridine-2,3-diamine , 280 mg of 3-cyclopropyl-2- (2-ethylsulfanylphenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 10) was obtained. .
The present condensed heterocyclic compound 10
Figure JPOXMLDOC01-appb-I000082
1H-NMR (CDCl3) δ: 8.74 (1H, s), 8.31 (1H, s), 7.53-7.47 (3H, m), 7.39-7.31 (1H, m ), 3.55-3.49 (1H, m), 2.90 (2H, q), 1.25 (3H, t), 1.01-0.94 (2H, m), 0.93- 0.86 (2H, m)
製造例11および12
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて3−シクロプロピル−2−(2−エチルスルファニルフェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例32及び33記載の方法に準じて、3−シクロプロピル−2−(2−エチルスルフィニルフェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物11と記す。)114mg、及び3−シクロプロピル−2−(2−エチルスルホニルフェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物12と記す。)109mgを得た。
本縮合複素環化合物11
Figure JPOXMLDOC01-appb-I000083
1H−NMR(CDCl3)δ:8.77(1H,d),8.29−8.26(2H,m),7.85−7.79(2H,m),7.72−7.67(1H,m),3.57−3.51(1H,m),3.49−3.39(1H,m),3.09−2.95(1H,m),1.34(3H,t),1.29−1.16(1H,m),1.09−0.92(2H,m),0.80−0.65(1H,m)
本縮合複素環化合物12
Figure JPOXMLDOC01-appb-I000084
1H−NMR(CDCl3)δ:8.76(1H,s),8.27−8.22(2H,m),7.87−7.78(2H,m),7.65(1H,dd),3.60(2H,brs),3.39−3.33(1H,m),1.29(3H,t),1.11−1.11(2H,m),0.93(2H,brs).
Production Examples 11 and 12
Instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 3-cyclopropyl-2- (2-ethylsulfanyl) 3-cyclopropyl-2- (2-ethylsulfinylphenyl)-using phenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine according to the methods described in Preparation Examples 32 and 33 114 mg of 6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 11), and 3-cyclopropyl-2- (2-ethylsulfonylphenyl) -6- 109 mg of trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 12) was obtained.
This condensed heterocyclic compound 11
Figure JPOXMLDOC01-appb-I000083
1H-NMR (CDCl3) δ: 8.77 (1H, d), 8.29-8.26 (2H, m), 7.85-7.79 (2H, m), 7.72-7.67 (1H, m), 3.57-3.51 (1H, m), 3.49-3.39 (1H, m), 3.09-2.95 (1H, m), 1.34 (3H , T), 1.29-1.16 (1H, m), 1.09-0.92 (2H, m), 0.80-0.65 (1H, m)
This condensed heterocyclic compound 12
Figure JPOXMLDOC01-appb-I000084
1H-NMR (CDCl3) δ: 8.76 (1H, s), 8.27-8.22 (2H, m), 7.87-7.78 (2H, m), 7.65 (1H, dd) ), 3.60 (2H, brs), 3.39-3.33 (1H, m), 1.29 (3H, t), 1.11-1.11 (2H, m), 0.93 ( 2H, brs).
製造例13
 2−(2−エチルスルファニルフェニル)−3−メチル−3H−イミダゾ[4,5−b]ピリジン−6−カルバルデヒド122mg、クロロホルム3mlの混合物に、氷冷下、ビス(2−メトキシエチル)アミノサルファトリフルオリド700μlを加えた。室温まで昇温し、3時間撹拌した。反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、クロロホルム及び酢酸エチルで順次抽出した。有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、6−ジフルオロメチル−2−(2−エチルスルファニルフェニル)−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物13と記す。)49mgを得た。
本縮合複素環化合物13
Figure JPOXMLDOC01-appb-I000085
1H−NMR(CDCl3)δ:8.59(1H,s),8.23(1H,s),7.56−7.43(3H,m),7.38−7.33(1H,m),6.88(1H,t),3.77(3H,s),2.87(2H,q),1.23(3H,t)
Production Example 13
To a mixture of 2- (2-ethylsulfanylphenyl) -3-methyl-3H-imidazo [4,5-b] pyridine-6-carbaldehyde 122 mg and chloroform 3 ml was added bis (2-methoxyethyl) amino under ice cooling. 700 μl of sulfatrifluoride was added. The mixture was warmed to room temperature and stirred for 3 hours. Saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture, and the mixture was extracted successively with chloroform and ethyl acetate. The organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 6-difluoromethyl-2- (2-ethylsulfanylphenyl) -3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic ring). It is described as Compound 13.) 49 mg was obtained.
This condensed heterocyclic compound 13
Figure JPOXMLDOC01-appb-I000085
1H-NMR (CDCl3) δ: 8.59 (1H, s), 8.23 (1H, s), 7.56-7.43 (3H, m), 7.38-7.33 (1H, m ), 6.88 (1H, t), 3.77 (3H, s), 2.87 (2H, q), 1.23 (3H, t)
製造例14および15
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて6−ジフルオロメチル−2−(2−エチルスルファニルフェニル)−3−メチル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例32及び33記載の方法に準じて、6−ジフルオロメチル−2−(2−エチルスルフィニルフェニル)−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物14と記す。)110mg及び6−ジフルオロメチル−2−(2−エチルスルホニルフェニル)−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物15と記す。)101mgを得た。
本縮合複素環化合物14
Figure JPOXMLDOC01-appb-I000086
1H−NMR(CDCl3)δ:8.62(1H,s),8.26−8.23(2H,m),7.83(1H,td),7.70(1H,td),7.62(1H,dd),6.90(1H,t),3.89(3H,s),3.42−3.32(1H,m),3.02−2.92(1H,m),1.30(3H,t)
本縮合複素環化合物15
Figure JPOXMLDOC01-appb-I000087
1H−NMR(CDCl3)δ:8.61(1H,s),8.24−8.19(2H,m),7.87−7.78(2H,m),7.58(1H,dd),6.89(1H,t),3.71(3H,s),3.43(2H,q),1.25(3H,t)
Production Examples 14 and 15
Instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 6-difluoromethyl-2- (2-ethylsulfanyl) Using phenyl) -3-methyl-3H-imidazo [4,5-b] pyridine, according to the methods described in Preparation Examples 32 and 33, 6-difluoromethyl-2- (2-ethylsulfinylphenyl) -3- 110 mg of methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 14) and 6-difluoromethyl-2- (2-ethylsulfonylphenyl) -3-methyl-3H-imidazo 101 mg of [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 15) was obtained.
The present condensed heterocyclic compound 14
Figure JPOXMLDOC01-appb-I000086
1H-NMR (CDCl3) δ: 8.62 (1H, s), 8.26-8.23 (2H, m), 7.83 (1H, td), 7.70 (1H, td), 7. 62 (1H, dd), 6.90 (1H, t), 3.89 (3H, s), 3.42-3.32 (1H, m), 3.02-2.92 (1H, m) , 1.30 (3H, t)
This condensed heterocyclic compound 15
Figure JPOXMLDOC01-appb-I000087
1H-NMR (CDCl3) δ: 8.61 (1H, s), 8.24-8.19 (2H, m), 7.87-7.78 (2H, m), 7.58 (1H, dd) ), 6.89 (1H, t), 3.71 (3H, s), 3.43 (2H, q), 1.25 (3H, t)
製造例16
 6−ブロモ−2−(2−エチルスルファニルフェニル)−3−メチル−3H−イミダゾ[4,5−b]ピリジン500mg、NMP24ml、キシレン10ml、ヨウ化銅1.1g及びペンタフルオロプロピオン酸ナトリウム1.1gの混合物を170℃に加熱し、3日間加熱撹拌した。室温まで冷却した反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、tert−ブチルメチルエ−テルで抽出した。有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニルフェニル)−3−メチル−6−ペンタフルオロエチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物16と記す。)43mgを得た。
本縮合複素環化合物16
Figure JPOXMLDOC01-appb-I000088
1H−NMR(CDCl3)δ:8.66(1H,d),8.30(1H,d),7.56−7.49(2H,m),7.47−7.43(1H,m),7.38−7.34(1H,m),3.78(3H,s),2.88(2H,q),1.24(3H,t)
Production Example 16
6-bromo-2- (2-ethylsulfanylphenyl) -3-methyl-3H-imidazo [4,5-b] pyridine 500 mg, NMP 24 ml, xylene 10 ml, copper iodide 1.1 g and sodium pentafluoropropionate a mixture of 1g was heated to 170 ° C., the mixture was heated with stirring for 3 days. To the reaction mixture cooled to room temperature, a saturated aqueous sodium hydrogen carbonate solution was poured, and the mixture was extracted with tert-butyl methyl ether. The organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanylphenyl) -3-methyl-6-pentafluoroethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed complex). referred to as cyclic compound 16.) was obtained 43 mg.
The present condensed heterocyclic compound 16
Figure JPOXMLDOC01-appb-I000088
1H-NMR (CDCl3) δ: 8.66 (1H, d), 8.30 (1H, d), 7.56-7.49 (2H, m), 7.47-7.43 (1H, m ), 7.38-7.34 (1H, m), 3.78 (3H, s), 2.88 (2H, q), 1.24 (3H, t)
製造例17
 2−エチルスルファニル−N−(2−メチルアミノ−5−トリフルオロメチルフェニル)−ベンズアミド1.64g、p−トルエンスルホン酸一水和物1.76g及びキシレン50mlの混合物を150℃で1時間、加熱還流下撹拌した。室温まで冷却した反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液及び飽和食塩水で洗浄した後、硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニルフェニル)−1−メチル−5−トリフルオロメチル−1H−ベンズイミダゾール(以下、本縮合複素環化合物17と記す。)1.40gを得た。
本縮合複素環化合物17
Figure JPOXMLDOC01-appb-I000089
1H−NMR(CDCl3)δ:8.12−8.10(1H,m),7.61−7.58(1H,m),7.53−7.44(4H,m),7.38−7.32(1H,m),3.69(3H,s),2.84(2H,q),1.22(3H,t)
Production Example 17
A mixture of 1.64 g of 2-ethylsulfanyl-N- (2-methylamino-5-trifluoromethylphenyl) -benzamide, 1.76 g of p-toluenesulfonic acid monohydrate and 50 ml of xylene at 150 ° C. for 1 hour, Stir with heating to reflux. To the reaction mixture cooled to room temperature, a saturated aqueous sodium hydrogen carbonate solution was poured, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanylphenyl) -1-methyl-5-trifluoromethyl-1H-benzimidazole (hereinafter referred to as the present condensed heterocyclic compound 17). 1.40 g was obtained.
The present condensed heterocyclic compound 17
Figure JPOXMLDOC01-appb-I000089
1H-NMR (CDCl3) δ: 8.12-8.10 (1H, m), 7.61-7.58 (1H, m), 7.53-7.44 (4H, m), 7.38 −7.32 (1H, m), 3.69 (3H, s), 2.84 (2H, q), 1.22 (3H, t)
製造例18
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−1−メチル−5−トリフルオロメチル−1H−ベンズイミダゾールを用いて、製造例2記載の方法に準じて2−(2−エチルスルフィニルフェニル)−1−メチル−5−トリフルオロメチル−1H−ベンズイミダゾール(以下、本縮合複素環化合物18と記す。)0.30gを得た。
本縮合複素環化合物18
Figure JPOXMLDOC01-appb-I000090
1H−NMR(CDCl3)δ:8.24−8.20(1H,m),8.10−8.07(1H,m),7.83−7.78(1H,m),7.70−7.62(2H,m),7.57−7.51(2H,m),3.79(3H,s),3.36−3.26(1H,m),2.98−2.88(1H,m),1.26(3H,t)
Production Example 18
Instead of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -1-methyl-5 Using trifluoromethyl-1H-benzimidazole, 2- (2-ethylsulfinylphenyl) -1-methyl-5-trifluoromethyl-1H-benzimidazole (hereinafter, this condensation) according to the method described in Production Example 2 This is referred to as heterocyclic compound 18.) 0.30 g was obtained.
The present condensed heterocyclic compound 18
Figure JPOXMLDOC01-appb-I000090
1H-NMR (CDCl3) δ: 8.24-8.20 (1H, m), 8.10-8.07 (1H, m), 7.83-7.78 (1H, m), 7.70 -7.62 (2H, m), 7.57-7.51 (2H, m), 3.79 (3H, s), 3.36-3.26 (1H, m), 2.98-2 .88 (1H, m), 1.26 (3H, t)
製造例19
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−1−メチル−5−トリフルオロメチル−1H−ベンズイミダゾールを用いて、製造例3記載の方法に準じて2−(2−エチルスルホニルフェニル)−1−メチル−5−トリフルオロメチル−1H−ベンズイミダゾール(以下、本縮合複素環化合物19と記す。)0.24gを得た。
本縮合複素環化合物19
Figure JPOXMLDOC01-appb-I000091
1H−NMR(CDCl3)δ:8.24−8.20(1H,m),8.07−8.05(1H,m),7.84−7.77(2H,m),7.64−7.61(1H,m),7.57−7.54(1H,m),7.53−7.49(1H,m),3.63(3H,s),3.46−3.34(2H,m),1.23(3H,t)
Production Example 19
Instead of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -1-methyl-5 Using trifluoromethyl-1H-benzimidazole, 2- (2-ethylsulfonylphenyl) -1-methyl-5-trifluoromethyl-1H-benzimidazole (hereinafter, this condensation) according to the method described in Production Example 3 This is referred to as heterocyclic compound 19.) 0.24 g was obtained.
The present condensed heterocyclic compound 19
Figure JPOXMLDOC01-appb-I000091
1H-NMR (CDCl3) δ: 8.24-8.20 (1H, m), 8.07-8.05 (1H, m), 7.84-7.77 (2H, m), 7.64 -7.61 (1H, m), 7.57-7.54 (1H, m), 7.53-7.49 (1H, m), 3.63 (3H, s), 3.46-3 .34 (2H, m), 1.23 (3H, t)
製造例20
 2−アミノ−4−トリフルオロメチル−フェノール0.97g、2−エチルスルファニル安息香酸1.10g、WSC1.27g、HOBt37mg及びピリジン5mlの混合物を、115℃で2.5時間加熱還流下撹拌した。一晩静置した後、再び115℃で6時間加熱還流下撹拌した。室温まで冷却した反応混合物に、水を注加し、酢酸エチルで抽出した。有機層を水、飽和炭酸水素ナトリウム水溶液及び飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥させた後、減圧下濃縮した。
 得られた残渣、p−トルエンスルホン酸一水和物2.09g及びキシレン50mlの混合物を、153℃で2時間加熱還流下撹拌した。室温まで冷却した反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を飽和炭酸水素ナトリウム水溶液、水、10%クエン酸溶液、水、飽和炭酸水素ナトリウム水溶液、飽和食塩水で順次洗浄し、硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニルフェニル)−5−トリフルオロメチルベンズオキサゾール(以下、本縮合複素環化合物20と記す。)0.98gを得た。
本縮合複素環化合物20
Figure JPOXMLDOC01-appb-I000092
1H−NMR(CDCl3)δ:8.19−8.15(2H,m),7.71−7.67(1H,m),7.66−7.63(1H,m),7.52−7.47(1H,m),7.45−7.42(1H,m),7.31−7.27(1H,m),3.06(2H,q),1.44(3H,t)
Production Example 20
A mixture of 0.97 g of 2-amino-4-trifluoromethyl-phenol, 1.10 g of 2-ethylsulfanylbenzoic acid, 1.27 g of WSC, 37 mg of HOBt and 5 ml of pyridine was stirred at 115 ° C. for 2.5 hours with heating under reflux. After leaving still overnight, the mixture was again stirred at 115 ° C. for 6 hours with heating under reflux. Water was poured into the reaction mixture cooled to room temperature, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with water, saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over sodium sulfate, and concentrated under reduced pressure.
A mixture of the obtained residue, 2.09 g of p-toluenesulfonic acid monohydrate and 50 ml of xylene was stirred at 153 ° C. for 2 hours with heating under reflux. To the reaction mixture cooled to room temperature, a saturated aqueous sodium hydrogen carbonate solution was poured, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution, water, 10% citric acid solution, water, saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 0.98 g of 2- (2-ethylsulfanylphenyl) -5-trifluoromethylbenzoxazole (hereinafter referred to as the present condensed heterocyclic compound 20).
The present condensed heterocyclic compound 20
Figure JPOXMLDOC01-appb-I000092
1H-NMR (CDCl3) δ: 8.19-8.15 (2H, m), 7.71-7.67 (1H, m), 7.66-7.63 (1H, m), 7.52 -7.47 (1H, m), 7.45-7.42 (1H, m), 7.31-7.27 (1H, m), 3.06 (2H, q), 1.44 (3H , T)
製造例21
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−5−トリフルオロメチルベンズオキサゾールを用い、製造例2記載の方法に準じて、2−(2−エチルスルフィニルフェニル)−5−トリフルオロメチルベンズオキサゾール(以下、本縮合複素環化合物21と記す。)0.27gを得た。
本縮合複素環化合物21
Figure JPOXMLDOC01-appb-I000093
1H−NMR(CDCl3)δ:8.35−8.30(2H,m),8.12−8.10(1H,m),7.85−7.79(1H,m),7.75−7.66(3H,m),3.48−3.38(1H,m),3.00−2.90(1H,m),1.41(3H,t)
Production Example 21
Instead of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -5-trifluoromethylbenz Using oxazole, 0.27 g of 2- (2-ethylsulfinylphenyl) -5-trifluoromethylbenzoxazole (hereinafter referred to as the present condensed heterocyclic compound 21) was obtained according to the method described in Production Example 2. .
This condensed heterocyclic compound 21
Figure JPOXMLDOC01-appb-I000093
1H-NMR (CDCl3) δ: 8.35-8.30 (2H, m), 8.12-8.10 (1H, m), 7.85-7.79 (1H, m), 7.75 -7.66 (3H, m), 3.48-3.38 (1H, m), 3.00-2.90 (1H, m), 1.41 (3H, t)
製造例22
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−5−トリフルオロメチルベンズオキサゾールを用い、製造例3記載の方法に準じて、2−(2−エチルスルホニルフェニル)−5−トリフルオロメチルベンズオキサゾール(以下、本縮合複素環化合物22と記す。)0.24gを得た。
本縮合複素環化合物22
Figure JPOXMLDOC01-appb-I000094
1H−NMR(CDCl3)δ:8.28−8.24(1H,m),8.11−8.09(1H,m),7.99−7.95(1H,m),7.85−7.77(2H,m),7.72−7.70(2H,m),3.82(2H,q),1.40(3H,t)
Production Example 22
Instead of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -5-trifluoromethylbenz Using oxazole, 0.24 g of 2- (2-ethylsulfonylphenyl) -5-trifluoromethylbenzoxazole (hereinafter referred to as the present condensed heterocyclic compound 22) was obtained according to the method described in Production Example 3. .
The present condensed heterocyclic compound 22
Figure JPOXMLDOC01-appb-I000094
1H-NMR (CDCl3) δ: 8.28-8.24 (1H, m), 8.11-8.09 (1H, m), 7.99-7.95 (1H, m), 7.85 -7.77 (2H, m), 7.72-7.70 (2H, m), 3.82 (2H, q), 1.40 (3H, t)
製造例23
 2−エチルスルファニルフェニル−N−(2−ヒドロキシ−5−トリフルオロメチルピリジン−3−イル)−ベンズアミド0.92g、オキシ塩化リン5mlの混合物を120℃まで昇温し、加熱還流下撹拌した。室温まで冷却した反応混合物に、一晩静置した。再び120℃まで昇温し、2時間加熱還流下撹拌した。室温まで冷却した反応混合物に、水を注加し、析出した固体をろ取し、水及びヘキサンで洗浄した後、乾燥させ、2−(2−エチルスルファニルフェニル)−6−トリフルオロメチルオキサゾロ[5,4−b]ピリジン(以下、本縮合複素環化合物23と記す。)0.53gを得た。
本縮合複素環化合物23
Figure JPOXMLDOC01-appb-I000095
1H−NMR(CDCl3)δ:8.67(1H,s),8.40(1H,s),8.25(1H,d),7.53(1H,t),7.45(1H,d),7.32(1H,t),3.08(2H,q),1.45(3H,t)
Production Example 23
A mixture of 0.92 g of 2-ethylsulfanylphenyl-N- (2-hydroxy-5-trifluoromethylpyridin-3-yl) -benzamide and 5 ml of phosphorus oxychloride was heated to 120 ° C. and stirred with heating under reflux. The reaction mixture cooled to room temperature was left overnight. The temperature was raised again to 120 ° C., and the mixture was stirred for 2 hours under reflux. Water was poured into the reaction mixture cooled to room temperature, and the precipitated solid was collected by filtration, washed with water and hexane, dried, and 2- (2-ethylsulfanylphenyl) -6-trifluoromethyloxazolo. 0.53 g of [5,4-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 23) was obtained.
The present condensed heterocyclic compound 23
Figure JPOXMLDOC01-appb-I000095
1H-NMR (CDCl3) δ: 8.67 (1H, s), 8.40 (1H, s), 8.25 (1H, d), 7.53 (1H, t), 7.45 (1H, d), 7.32 (1H, t), 3.08 (2H, q), 1.45 (3H, t)
製造例24
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−6−トリフルオロメチルオキサゾロ[5,4−b]ピリジンを用い、製造例2記載の方法に準じて、2−(2−エチルスルフィニルフェニル)−6−トリフルオロメチルオキサゾロ[5,4−b]ピリジン(以下、本縮合複素環化合物24と記す。)0.17gを得た。
本縮合複素環化合物24
Figure JPOXMLDOC01-appb-I000096
1H−NMR(CDCl3)δ:8.73−8.72(1H,m),8.41−8.38(2H,m),8.36−8.33(1H,m),7.90−7.84(1H,m),7.74−7.69(1H,m),3.45−3.35(1H,m),3.00−2.90(1H,m),1.40(3H,t)
Production Example 24
Instead of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -6-trifluoromethyloxa 2- (2-ethylsulfinylphenyl) -6-trifluoromethyloxazolo [5,4-b] pyridine (hereinafter, referred to as “Production Example 2”) using zolo [5,4-b] pyridine. This is referred to as the present condensed heterocyclic compound 24.) 0.17 g was obtained.
The present condensed heterocyclic compound 24
Figure JPOXMLDOC01-appb-I000096
1H-NMR (CDCl3) δ: 8.73-8.72 (1H, m), 8.41-8.38 (2H, m), 8.36-8.33 (1H, m), 7.90 -7.84 (1H, m), 7.74-7.69 (1H, m), 3.45-3.35 (1H, m), 3.00-2.90 (1H, m), 1 .40 (3H, t)
製造例25
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−6−トリフルオロメチルオキサゾロ[5,4−b]ピリジンを用い、製造例3記載の方法に準じて、2−(2−エチルスルホニルフェニル)−6−トリフルオロメチルオキサゾロ[5,4−b]ピリジン(以下、本縮合複素環化合物25と記す。)0.19gを得た。
本縮合複素環化合物25
Figure JPOXMLDOC01-appb-I000097
1H−NMR(CDCl3)δ:8.75−8.73(1H,m),8.40−8.37(1H,m),8.29−8.26(1H,m),8.05−8.02(1H,m),7.89−7.81(2H,m),3.81(2H,q),1.43(3H,t)
Production Example 25
Instead of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -6-trifluoromethyloxa 2- (2-ethylsulfonylphenyl) -6-trifluoromethyloxazolo [5,4-b] pyridine (hereinafter, referred to as “Production Example 3”) using zolo [5,4-b] pyridine. This is referred to as the present condensed heterocyclic compound 25.) 0.19 g was obtained.
This condensed heterocyclic compound 25
Figure JPOXMLDOC01-appb-I000097
1H-NMR (CDCl3) δ: 8.75-8.73 (1H, m), 8.40-8.37 (1H, m), 8.29-8.26 (1H, m), 8.05 -8.02 (1H, m), 7.89-7.81 (2H, m), 3.81 (2H, q), 1.43 (3H, t)
製造例26
 2−アミノ−4−トリフルオロメチルベンゼンチオール塩酸塩1.08g、2−エチルスルファニル安息香酸塩化物1.04g及びTHF10mLの混合物を、室温で3時間攪拌した。反応混合物に炭酸水素ナトリウム0.43gを加え、室温で8時間攪拌した。反応混合物に飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を水で洗浄し、硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニルフェニル)−5−トリフルオロメチルベンゾチアゾール(以下、本縮合複素環化合物26と記す。)0.50gを得た。
本縮合複素環化合物26
Figure JPOXMLDOC01-appb-I000098
1H−NMR(CDCl3)δ:8.41−8.39(1H,m),8.06−8.00(2H,m),7.66−7.62(1H,m),7.55−7.51(1H,m),7.48−7.42(1H,m),7.37−7.32(1H,m),2.96(2H,q),1.33(3H,t)
Production Example 26
A mixture of 1.08 g of 2-amino-4-trifluoromethylbenzenethiol hydrochloride, 1.04 g of 2-ethylsulfanylbenzoic acid chloride and 10 mL of THF was stirred at room temperature for 3 hours. To the reaction mixture, 0.43 g of sodium hydrogen carbonate was added and stirred at room temperature for 8 hours. Saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 0.50 g of 2- (2-ethylsulfanylphenyl) -5-trifluoromethylbenzothiazole (hereinafter referred to as the present condensed heterocyclic compound 26).
The present condensed heterocyclic compound 26
Figure JPOXMLDOC01-appb-I000098
1H-NMR (CDCl3) δ: 8.41-8.39 (1H, m), 8.06-8.00 (2H, m), 7.66-7.62 (1H, m), 7.55 -7.51 (1H, m), 7.48-7.42 (1H, m), 7.37-7.32 (1H, m), 2.96 (2H, q), 1.33 (3H , T)
製造例27
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−5−トリフルオロメチルベンゾチアゾールを用い、製造例2記載の方法に準じて、2−(2−エチルスルフィニルフェニル)−5−トリフルオロメチルベンゾチアゾール(以下、本縮合複素環化合物27と記す。)0.25gを得た。
本縮合複素環化合物27
Figure JPOXMLDOC01-appb-I000099
1H−NMR(CDCl3)δ:8.36−8.32(1H,m),8.32−8.30(1H,m),8.08−8.05(1H,m),7.97−7.94(1H,m),7.80−7.75(1H,m),7.71−7.68(1H,m),7.66−7.61(1H,m),3.56−3.45(1H,m),3.02−2.93(1H,m),1.46(3H,t)
Production Example 27
Instead of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -5-trifluoromethylbenzo Using thiazole, 0.25 g of 2- (2-ethylsulfinylphenyl) -5-trifluoromethylbenzothiazole (hereinafter referred to as the present condensed heterocyclic compound 27) was obtained according to the method described in Production Example 2. .
This condensed heterocyclic compound 27
Figure JPOXMLDOC01-appb-I000099
1H-NMR (CDCl3) δ: 8.36-8.32 (1H, m), 8.32-8.30 (1H, m), 8.08-8.05 (1H, m), 7.97 -7.94 (1H, m), 7.80-7.75 (1H, m), 7.71-7.68 (1H, m), 7.66-7.61 (1H, m), 3 .56-3.45 (1H, m), 3.02-2.93 (1H, m), 1.46 (3H, t)
製造例28
 2−(2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−5−トリフルオロメチルベンゾチアゾールを用い、製造例3記載の方法に準じて、2−(2−エチルスルホニルフェニル)−5−トリフルオロメチルベンゾチアゾール(以下、本縮合複素環化合物28と記す。)0.30gを得た。
本縮合複素環化合物28
Figure JPOXMLDOC01-appb-I000100
1H−NMR(CDCl3)δ:8.33−8.31(1H,m),8.26−8.23(1H,m),8.10−8.06(1H,m),7.81−7.69(4H,m),3.75(2H,q),1.36(3H,t)
Production Example 28
Instead of 2- (2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -5-trifluoromethylbenzo Using thiazole, 0.30 g of 2- (2-ethylsulfonylphenyl) -5-trifluoromethylbenzothiazole (hereinafter referred to as the present condensed heterocyclic compound 28) was obtained according to the method described in Production Example 3. .
The present condensed heterocyclic compound 28
Figure JPOXMLDOC01-appb-I000100
1H-NMR (CDCl3) δ: 8.33-8.31 (1H, m), 8.26-8.23 (1H, m), 8.10-8.06 (1H, m), 7.81 -7.69 (4H, m), 3.75 (2H, q), 1.36 (3H, t)
製造例29及び30
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニル−フェニル)−3−メチル−6−ペンタフルオロエチル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例32及び33記載の方法に準じて、2−(2−エチルスルフィニル−フェニル)−3−メチル−6−ペンタフルオロエチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物29と記す。)27mg及び2−(2−エチルスルホニルフェニル)−3−メチル−6−ペンタフルオロエチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物30と記す。)31mgを得た。
本縮合複素環化合物29
Figure JPOXMLDOC01-appb-I000101
1H−NMR(CDCl3)δ:8.70(1H,d),8.29(1H,d),8.27(1H,d),7.84(1H,t),7.71(1H,t),7.60(1H,d),3.90(3H,s),3.43−3.33(1H,m),3.04−2.94(1H,m),1.31(3H,t)
本縮合複素環化合物30
Figure JPOXMLDOC01-appb-I000102
1H−NMR(CDCl3)δ:8.69(1H,s),8.25(1H,s),8.23−8.22(1H,m),7.88−7.79(2H,m),7.59−7.52(1H,m),3.72(3H,s),3.43(2H,q),1.26(3H,t)
Production Examples 29 and 30
2- (2-ethylsulfanyl-4-phenyl) -3 instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine Using 2-methyl-6-pentafluoroethyl-3H-imidazo [4,5-b] pyridine, according to the method described in Preparation Examples 32 and 33, 2- (2-ethylsulfinyl-phenyl) -3-methyl- 27 mg of 6-pentafluoroethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 29) and 2- (2-ethylsulfonylphenyl) -3-methyl-6-pentafluoro 31 mg of ethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 30) was obtained.
This condensed heterocyclic compound 29
Figure JPOXMLDOC01-appb-I000101
1H-NMR (CDCl3) δ: 8.70 (1H, d), 8.29 (1H, d), 8.27 (1H, d), 7.84 (1H, t), 7.71 (1H, t), 7.60 (1H, d), 3.90 (3H, s), 3.43-3.33 (1H, m), 3.04-2.94 (1H, m), 1.31 (3H, t)
This condensed heterocyclic compound 30
Figure JPOXMLDOC01-appb-I000102
1H-NMR (CDCl3) δ: 8.69 (1H, s), 8.25 (1H, s), 8.23-8.22 (1H, m), 7.88-7.79 (2H, m ), 7.59-7.52 (1H, m), 3.72 (3H, s), 3.43 (2H, q), 1.26 (3H, t)
製造例31
 N2−メチル−5−トリフルオロメチルピリジン−2,3−ジアミン1.14g、2−エチルスルファニル−4−フルオロ安息香酸1.44g、WSC1.02g及びピリジン12mlの混合物を、120℃で1.5時間加熱撹拌した。室温まで冷却した反応混合物に、水を注加し、酢酸エチルで抽出した。有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。
 得られた残渣にp−トルエンスルホン酸3.42g、キシレン10ml及びNMP2mlを加え、Dean−Stark装置を用いて水を除去しながら150℃で4.5時間加熱還流下撹拌した。室温まで冷却した反応混合物に水を注加し、酢酸エチルで抽出した。有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物31と記す。)1.05gを得た。
本縮合複素環化合物31
Figure JPOXMLDOC01-appb-I000103
1H−NMR(CDCl3)δ:8.70−8.68(1H,m),8.31−8.28(1H,m),7.43−7.38(1H,m),7.17−7.13(1H,m),7.04−6.98(1H,m),3.75(3H,s),2.89(2H,q),1.26(3H,t)
Production Example 31
A mixture of 1.14 g N2-methyl-5-trifluoromethylpyridine-2,3-diamine, 1.44 g 2-ethylsulfanyl-4-fluorobenzoic acid, 1.02 g WSC and 12 ml pyridine was added at 120 ° C. Stir for hours. Water was poured into the reaction mixture cooled to room temperature, and the mixture was extracted with ethyl acetate. The organic layer was dried over magnesium sulfate and concentrated under reduced pressure.
To the obtained residue, 3.42 g of p-toluenesulfonic acid, 10 ml of xylene and 2 ml of NMP were added, and the mixture was stirred while heating under reflux at 150 ° C. for 4.5 hours while removing water using a Dean-Stark apparatus. Water was poured into the reaction mixture cooled to room temperature, and the mixture was extracted with ethyl acetate. The organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as “(2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6H-imidazo [4,5-b] pyridine”). This is referred to as the present condensed heterocyclic compound 31.) 1.05 g was obtained.
This condensed heterocyclic compound 31
Figure JPOXMLDOC01-appb-I000103
1H-NMR (CDCl3) δ: 8.70-8.68 (1H, m), 8.31-8.28 (1H, m), 7.43-7.38 (1H, m), 7.17 -7.13 (1H, m), 7.04-6.98 (1H, m), 3.75 (3H, s), 2.89 (2H, q), 1.26 (3H, t)
製造例32及び33
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン0.85g及びクロロホルム12mlの混合物に、氷冷下3−クロロ過安息香酸(純度65%以上)0.81gを添加した後、室温まで昇温し、30分間撹拌した。反応混合物に飽和炭酸水素ナトリウム水溶液及び飽和チオ硫酸ナトリウム水溶液を注加し、クロロホルムで抽出した。有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルフィニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物32と記す。)0.33g、及び2−(2−エチルスルホニル4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物33と記す。)0.52gを得た。
本縮合複素環化合物32
Figure JPOXMLDOC01-appb-I000104
1H−NMR(CDCl3)δ:8.76−8.75(1H,m),8.31−8.30(1H,m),8.01−7.98(1H,m),7.65−7.61(1H,m),7.41−7.36(1H,m),3.90(3H,s),3.47−3.37(1H,m),3.04−2.94(1H,m),1.33(3H,t)
本縮合複素環化合物33
Figure JPOXMLDOC01-appb-I000105
1H−NMR(CDCl3)δ:8.76−8.74(1H,m),8.29−8.27(1H,m),7.97−7.94(1H,m),7.60−7.51(2H,m),3.72(3H,s),3.44(2H,q),1.28(3H,t)
Production Examples 32 and 33
To a mixture of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (0.85 g) and chloroform (12 ml) was added 3- After adding 0.81 g of chloroperbenzoic acid (purity 65% or more), the mixture was warmed to room temperature and stirred for 30 minutes. Saturated aqueous sodium hydrogen carbonate solution and saturated aqueous sodium thiosulfate solution were added to the reaction mixture, and the mixture was extracted with chloroform. The organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfinyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as “(2-ethylsulfinyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine”). This is referred to as the present condensed heterocyclic compound 32.) 0.33 g, and 2- (2-ethylsulfonyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (Hereinafter referred to as the present condensed heterocyclic compound 33.) 0.52 g was obtained.
The present condensed heterocyclic compound 32
Figure JPOXMLDOC01-appb-I000104
1H-NMR (CDCl3) δ: 8.76-8.75 (1H, m), 8.31-8.30 (1H, m), 8.01-7.98 (1H, m), 7.65 -7.61 (1H, m), 7.41-7.36 (1H, m), 3.90 (3H, s), 3.47-3.37 (1H, m), 3.04-2 .94 (1H, m), 1.33 (3H, t)
This condensed heterocyclic compound 33
Figure JPOXMLDOC01-appb-I000105
1H-NMR (CDCl3) δ: 8.76-8.74 (1H, m), 8.29-8.27 (1H, m), 7.97-7.94 (1H, m), 7.60 -7.51 (2H, m), 3.72 (3H, s), 3.44 (2H, q), 1.28 (3H, t)
製造例34
 エチルメルカプタンナトリウム塩(80%)0.35g及びDMF9mlの混合物に、氷冷下、2−(2−フルオロ−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン1.0gのDMF溶液を滴下した後、室温まで昇温し、室温で30分間撹拌した。反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物34と記す。)1.10gを得た。
本縮合複素環化合物34
Figure JPOXMLDOC01-appb-I000106
1H−NMR(CDCl3)δ:8.75−8.73(1H,m),8.35−8.33(1H,m),7.70−7.68(1H,m),7.62−7.56(2H,m),3.79(3H,s),2.95(2H,q),1.28(3H,t)
Production Example 34
To a mixture of 0.35 g of ethyl mercaptan sodium salt (80%) and 9 ml of DMF was added 2- (2-fluoro-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [ 4,5-b] DMF solution of 1.0 g of pyridine was dropped, and then the mixture was warmed to room temperature and stirred at room temperature for 30 minutes. Saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine. (Hereinafter referred to as the present condensed heterocyclic compound 34) 1.10 g was obtained.
The present condensed heterocyclic compound 34
Figure JPOXMLDOC01-appb-I000106
1H-NMR (CDCl3) δ: 8.75-8.73 (1H, m), 8.35-8.33 (1H, m), 7.70-7.68 (1H, m), 7.62 -7.56 (2H, m), 3.79 (3H, s), 2.95 (2H, q), 1.28 (3H, t)
製造例35
 2−(2−エチルスルファニル−フェニル)−6−ヨード−3−メチル−3H−イミダゾ[4,5−b]ピリジン311mg、ヨウ化銅1.5g、ヘプタフルオロ酪酸ナトリウム1.8g、NMP5mL及びキシレン25mLの混合物を、150℃にて12時間加熱撹拌した。室温まで冷却した反応混合物に、飽和炭酸水素ナトリウム水溶液及び28%アンモニア水を注加し、tert−ブチルメチルエーテルで抽出した。合わせた有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−フェニル)−6−ヘプタフルオロプロピル
−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物35と記す。)118mgを得た。
本縮合複素環化合物35
Figure JPOXMLDOC01-appb-I000107
1H−NMR(CDCl3)δ:8.65(1H,d),8.29(1H,d),7.56−7.51(2H,m),7.48−7.43(1H,m),7.38−7.34(1H,m),3.78(3H,s),2.89(2H,q),1.25(3H,t)
Production Example 35
2- (2-Ethylsulfanyl-phenyl) -6-iodo-3-methyl-3H-imidazo [4,5-b] pyridine 311 mg, copper iodide 1.5 g, sodium heptafluorobutyrate 1.8 g, NMP 5 mL and xylene 25 mL of the mixture was heated and stirred at 150 ° C. for 12 hours. To the reaction mixture cooled to room temperature, a saturated aqueous sodium hydrogen carbonate solution and 28% aqueous ammonia were added, and the mixture was extracted with tert-butyl methyl ether. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (2-ethylsulfanyl-phenyl) -6-heptafluoropropyl-3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound). 35.) 118 mg was obtained.
This condensed heterocyclic compound 35
Figure JPOXMLDOC01-appb-I000107
1H-NMR (CDCl3) δ: 8.65 (1H, d), 8.29 (1H, d), 7.56-7.51 (2H, m), 7.48-7.43 (1H, m ), 7.38-7.34 (1H, m), 3.78 (3H, s), 2.89 (2H, q), 1.25 (3H, t)
製造例36及び37
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニル−フェニル)−6−ヘプタフルオロプロピル−3−メチル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例32及び33記載の方法に準じて、2−(2−エチルスルフィニル−フェニル)−6−ヘプタフルオロプロピル−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物36と記す。)及び2−(2−エチルスルホニルフェニル)−6−ヘプタフルオロプロピル−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物37と記す。)を得た。
本縮合複素環化合物36
Figure JPOXMLDOC01-appb-I000108
1H−NMR(CDCl3)δ:8.68(1H,d),8.29−8.24(2H,m),7.87−7.81(1H,m),7.74−7.68(1H,m),7.61(1H,dd),3.91(3H,s),3.43−3.32(1H,m),3.05−2.94(1H,m),1.31(3H,t)
本縮合複素環化合物37
Figure JPOXMLDOC01-appb-I000109
1H−NMR(CDCl3)δ:8.67(1H,d),8.26−8.22(2H,m),7.87−7.81(2H,m),7.59−7.55(1H,m),3.73(3H,s),3.43(2H,q),1.26(3H,t).
Production Examples 36 and 37
Instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanyl-phenyl) -6 2- (2-Ethylsulfinyl-phenyl) -6-heptafluoro using -heptafluoropropyl-3-methyl-3H-imidazo [4,5-b] pyridine according to the method described in Production Examples 32 and 33 Propyl-3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 36) and 2- (2-ethylsulfonylphenyl) -6-heptafluoropropyl-3-methyl -3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 37) was obtained.
The present condensed heterocyclic compound 36
Figure JPOXMLDOC01-appb-I000108
1H-NMR (CDCl3) δ: 8.68 (1H, d), 8.29-8.24 (2H, m), 7.87-7.81 (1H, m), 7.74-7.68 (1H, m), 7.61 (1H, dd), 3.91 (3H, s), 3.43-3.32 (1H, m), 3.05-2.94 (1H, m), 1.31 (3H, t)
The present condensed heterocyclic compound 37
Figure JPOXMLDOC01-appb-I000109
1H-NMR (CDCl3) δ: 8.67 (1H, d), 8.26-8.22 (2H, m), 7.87-7.81 (2H, m), 7.59-7.55 (1H, m), 3.73 (3H, s), 3.43 (2H, q), 1.26 (3H, t).
製造例38及び39
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例32及び33記載の方法に準じて、2−(2−エチルスルフィニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物38と記す。)0.51g、及び2−(2−エチルスルホニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物39と記す。)0.26gを得た。
本縮合複素環化合物38
Figure JPOXMLDOC01-appb-I000110
1H−NMR(CDCl3)δ:8.79−8.78(1H,m),8.57−8.55(1H,m),8.35−8.34(1H,m),7.97−7.94(1H,m),7.77(1H,d),3.94(3H,s),3.53−3.43(1H,m),3.07−2.98(1H,m),1.36(3H,t)
本縮合複素環化合物39
Figure JPOXMLDOC01-appb-I000111
1H−NMR(CDCl3)δ:8.78−8.76(1H,m),8.51−8.49(1H,m),8.31−8.30(1H,m),8.12−8.09(1H,m),7.74(1H,d),3.74(3H,s),3.48(2H,q),1.29(3H,t)
Production Examples 38 and 39
Instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanyl-4-trifluoro 2- (2-Ethylsulfinyl-4-methyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine was used according to the methods described in Preparation Examples 32 and 33. Trifluoromethylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 38) 0.51 g, and 2- (2- Ethylsulfonyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as this condensed heterocyclic compound) 39 and referred to.) Was obtained 0.26g.
The present condensed heterocyclic compound 38
Figure JPOXMLDOC01-appb-I000110
1H-NMR (CDCl3) δ: 8.79-8.78 (1H, m), 8.57-8.55 (1H, m), 8.35-8.34 (1H, m), 7.97 -7.94 (1H, m), 7.77 (1H, d), 3.94 (3H, s), 3.53-3.43 (1H, m), 3.07-2.98 (1H) , M), 1.36 (3H, t)
The present condensed heterocyclic compound 39
Figure JPOXMLDOC01-appb-I000111
1H-NMR (CDCl3) δ: 8.78-8.76 (1H, m), 8.51-8.49 (1H, m), 8.31-8.30 (1H, m), 8.12 -8.09 (1H, m), 7.74 (1H, d), 3.74 (3H, s), 3.48 (2H, q), 1.29 (3H, t)
製造例40
 3−アミノ−5−(トリフルオロメチル)ピリジン−2−チオール0.56g、2−エチルスルファニル安息香酸0.52g、WSC0.80g、HOBt39mg及びピリジン6mlの混合物を、60℃で2時間撹拌した。放冷した反応混合物に水を注加し、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下濃縮した。
 得られた残渣、p−トルエンスルホン酸一水和物0.65g及びN−メチルピロリジノン5mLの混合物を、150℃で2時間加熱撹拌した。放冷した反応混合物に水を注加し、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニルフェニル)−6−(トリフルオロメチル)チアゾロ[5,4−b]ピリジン(以下、本縮合複素環化合物40と記す。)0.38gを得た。
本縮合複素環化合物40
Figure JPOXMLDOC01-appb-I000112
1H−NMR(CDCl3)δ:8.86(1H,d),8.57(1H,d),8.03(1H,dd),7.55(1H,dd),7.48(1H,td),7.36(1H,td),2.98(2H,q),1.34(3H,t).
Production Example 40
A mixture of 0.56 g of 3-amino-5- (trifluoromethyl) pyridine-2-thiol, 0.52 g of 2-ethylsulfanylbenzoic acid, 0.80 g of WSC, 39 mg of HOBt and 6 ml of pyridine was stirred at 60 ° C. for 2 hours. Water was poured into the reaction mixture allowed to cool, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure.
A mixture of the obtained residue, p-toluenesulfonic acid monohydrate 0.65 g and N-methylpyrrolidinone 5 mL was stirred with heating at 150 ° C. for 2 hours. Water was poured into the reaction mixture allowed to cool, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanylphenyl) -6- (trifluoromethyl) thiazolo [5,4-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 40). .) 0.38 g was obtained.
The present condensed heterocyclic compound 40
Figure JPOXMLDOC01-appb-I000112
1H-NMR (CDCl3) δ: 8.86 (1H, d), 8.57 (1H, d), 8.03 (1H, dd), 7.55 (1H, dd), 7.48 (1H, td), 7.36 (1H, td), 2.98 (2H, q), 1.34 (3H, t).
製造例41および42
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルフェニル)−6−(トリフルオロメチル)チアゾロ[5,4−b]ピリジンを用い、製造例32及び33記載の方法に準じて、2−(2−エチルスルフィニルフェニル)−6−(トリフルオロメチル)チアゾロ[5,4−b]ピリジン(以下、本縮合複素環化合物41と記す。)0.13g、及び2−(2−エチルスルホニルフェニル)−6−(トリフルオロメチル)チアゾロ[5,4−b]ピリジン(以下、本縮合複素環化合物42と記す。)0.14gを得た。
本縮合複素環化合物41
Figure JPOXMLDOC01-appb-I000113
1H−NMR(CDCl3)δ:8.90(1H,d),8.49(1H,d),8.37(1H,dd),7.99(1H,dd),7.81(1H,td),7.67(1H,td),3.52−3.42(1H,m),3.01−2.92(1H,m),1.45(3H,t).
本縮合複素環化合物42
Figure JPOXMLDOC01-appb-I000114
1H−NMR(CDCl3)δ:8.92(1H,d),8.52(1H,d),8.25(1H,dd),7.84−7.71(3H,m),3.73(2H,q),1.37(3H,t).
Production Examples 41 and 42
Instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfanylphenyl) -6- 2- (2-Ethylsulfinylphenyl) -6- (trifluoromethyl) thiazolo [5, using (trifluoromethyl) thiazolo [5,4-b] pyridine according to the method described in Production Examples 32 and 33 4-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 41) 0.13 g, and 2- (2-ethylsulfonylphenyl) -6- (trifluoromethyl) thiazolo [5,4-b] pyridine ( Hereinafter, this is referred to as the present condensed heterocyclic compound 42.) 0.14 g was obtained.
The present condensed heterocyclic compound 41
Figure JPOXMLDOC01-appb-I000113
1H-NMR (CDCl3) δ: 8.90 (1H, d), 8.49 (1H, d), 8.37 (1H, dd), 7.99 (1H, dd), 7.81 (1H, td), 7.67 (1H, td), 3.52-3.42 (1H, m), 3.01-2.92 (1H, m), 1.45 (3H, t).
The present condensed heterocyclic compound 42
Figure JPOXMLDOC01-appb-I000114
1H-NMR (CDCl3) δ: 8.92 (1H, d), 8.52 (1H, d), 8.25 (1H, dd), 7.84-7.71 (3H, m), 3. 73 (2H, q), 1.37 (3H, t).
製造例43および44
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニル−フェニル)−3−メチル−6−トリフルオロメチルスルファニル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例32及び33記載の方法に準じて、2−(2−エチルスルホニルフェニル)−6−トリフルオロメチルスルファニル−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物43と記す。)及び2−(2−エチルスルフィニル−フェニル)−6−トリフルオロメチルスルファニル−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物44と記す。)を得た。
本縮合複素環化合物43
Figure JPOXMLDOC01-appb-I000115
1H−NMR(CDCl3)δ:8.68(1H,d),8.36(1H,d),8.21(1H,dd),7.87−7.77(2H,m),7.59(1H,dd),3.71(3H,s),3.44(2H,q),1.24(3H,t)
本縮合複素環化合物44
Figure JPOXMLDOC01-appb-I000116
1H−NMR(CDCl3)δ:8.69(1H,d),8.38(1H,d),8.25(1H,dd),7.86−7.80(1H,m),7.72−7.67(1H,m),7.60(1H,dd),3.88(3H,s),3.43−3.31(1H,m),3.03−2.92(1H,m),1.31(3H,t)
Production Examples 43 and 44
2- (2-ethylsulfanyl-4-phenyl) -3 instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine 2- (2-ethylsulfonylphenyl) -6-trifluoro-methyl-6-trifluoromethylsulfanyl-3H-imidazo [4,5-b] pyridine was used according to the method described in Preparation Examples 32 and 33. Methylsulfanyl-3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 43) and 2- (2-ethylsulfinyl-phenyl) -6-trifluoromethylsulfanyl- 3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 44) was obtained.
The present condensed heterocyclic compound 43
Figure JPOXMLDOC01-appb-I000115
1H-NMR (CDCl3) δ: 8.68 (1H, d), 8.36 (1H, d), 8.21 (1H, dd), 7.87-7.77 (2H, m), 7. 59 (1H, dd), 3.71 (3H, s), 3.44 (2H, q), 1.24 (3H, t)
The present condensed heterocyclic compound 44
Figure JPOXMLDOC01-appb-I000116
1H-NMR (CDCl3) δ: 8.69 (1H, d), 8.38 (1H, d), 8.25 (1H, dd), 7.86-7.80 (1H, m), 7. 72-7.67 (1H, m), 7.60 (1H, dd), 3.88 (3H, s), 3.43-3.31 (1H, m), 3.03-2.92 ( 1H, m), 1.31 (3H, t)
製造例45および46
 2−(2−エチルスルファニル−4−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルホニルフェニル)−6−トリフルオロメチルスルファニル−3−メチル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例32及び33記載の方法に準じて、2−(2−エチルスルホニルフェニル)−6−トリフルオロメチルスルフィニル−3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物45と記す。)及び2−(2−エチルスルホニルフェニル)−6−トリフルオロメチルスルホニル3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物46と記す。)を得た。
本縮合複素環化合物45
Figure JPOXMLDOC01-appb-I000117
1H−NMR(CDCl3)δ:8.77(1H,d),8.55(1H,d),8.24(1H,dd),7.90−7.83(2H,m),7.61(1H,dd),3.75(3H,s),3.43(2H,q),1.26(3H,t)
本縮合複素環化合物46
Figure JPOXMLDOC01-appb-I000118
1H−NMR(CDCl3)δ:9.05(1H,d),8.65(1H,d),8.26−8.23(1H,m),7.90−7.85(2H,m),7.61−7.57(1H,m),3.77(3H,s),3.41(2H,q),1.27(3H,t)
Production Examples 45 and 46
Instead of 2- (2-ethylsulfanyl-4-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine, 2- (2-ethylsulfonylphenyl) -6- 2- (2-Ethylsulfonylphenyl) -6-trifluoromethyl using trifluoromethylsulfanyl-3-methyl-3H-imidazo [4,5-b] pyridine according to the methods described in Preparation Examples 32 and 33 Sulfinyl-3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 45) and 2- (2-ethylsulfonylphenyl) -6-trifluoromethylsulfonyl 3-methyl -3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 46) was obtained.
The present condensed heterocyclic compound 45
Figure JPOXMLDOC01-appb-I000117
1H-NMR (CDCl3) δ: 8.77 (1H, d), 8.55 (1H, d), 8.24 (1H, dd), 7.90-7.83 (2H, m), 7. 61 (1H, dd), 3.75 (3H, s), 3.43 (2H, q), 1.26 (3H, t)
The present condensed heterocyclic compound 46
Figure JPOXMLDOC01-appb-I000118
1H-NMR (CDCl3) δ: 9.05 (1H, d), 8.65 (1H, d), 8.26-8.23 (1H, m), 7.90-7.85 (2H, m ), 7.61-7.57 (1H, m), 3.77 (3H, s), 3.41 (2H, q), 1.27 (3H, t)
製造例47
 2−[2−フルオロ−4−(トリフルオロメチル)フェニル]−6−(トリフルオロメチル)チアゾロ[5,4−b]ピリジン0.18gとDMF2mlの混合物に、氷冷下、ナトリウムチオメトキシド63mgを加え、室温で4時間攪拌した。反応混合物に水を注加し、酢酸エチルで抽出した。有機層を水洗した後、無水硫酸マグネシウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−[2−エチルスルファニル−4−(トリフルオロメチル)フェニル]−6−(トリフルオロメチル)チアゾロ[5,4−b]ピリジン(以下、本縮合複素環化合物47と記す。)0.11gを得た。
本縮合複素環化合物47
Figure JPOXMLDOC01-appb-I000119
1H−NMR(CDCl3)δ:8.90(1H,d),8.61(1H,d),8.14(1H,d),7.75(1H,s),7.58(1H,d),3.04(2H,q),1.38(3H,t).
Production Example 47
2- [2-Fluoro-4- (trifluoromethyl) phenyl] -6- (trifluoromethyl) thiazolo [5,4-b] pyridine (0.18 g) and DMF (2 ml) were mixed with sodium thiomethoxide under ice-cooling. 63 mg was added and stirred at room temperature for 4 hours. Water was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with water, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- [2-ethylsulfanyl-4- (trifluoromethyl) phenyl] -6- (trifluoromethyl) thiazolo [5,4-b] pyridine (hereinafter, This is referred to as the present condensed heterocyclic compound 47.) 0.11 g was obtained.
The present condensed heterocyclic compound 47
Figure JPOXMLDOC01-appb-I000119
1H-NMR (CDCl3) δ: 8.90 (1H, d), 8.61 (1H, d), 8.14 (1H, d), 7.75 (1H, s), 7.58 (1H, d), 3.04 (2H, q), 1.38 (3H, t).
製造例48
 2−[2−エチルスルファニル−4−(トリフルオロメチル)フェニル]−6−(トリフルオロメチル)チアゾロ[5,4−b]ピリジン0.11g及びクロロホルム3mlの混合物に、3−クロロ過安息香酸(純度65%以上)0.13gを添加した後、室温で12時間撹拌した。反応混合物をクロロホルムで希釈し、10%チオ硫酸ナトリウム水溶液及び飽和炭酸水素ナトリウム水溶液で順次洗浄した後、無水硫酸マグネシウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−[2−エチルスルホニル4−(トリフルオロメチル)フェニル]−6−(トリフルオロメチル)チアゾロ[5,4−b]ピリジン(以下、本縮合複素環化合物48と記す。)0.11gを得た。
本縮合複素環化合物48
Figure JPOXMLDOC01-appb-I000120
1H−NMR(CDCl3)δ:8.95(1H,s),8.55(1H,s),8.52(1H,s),8.07(1H,d),7.88(1H,d),3.77(2H,q),1.40(3H,t).
Production Example 48
3-Chloroperbenzoic acid was added to a mixture of 0.11 g of 2- [2-ethylsulfanyl-4- (trifluoromethyl) phenyl] -6- (trifluoromethyl) thiazolo [5,4-b] pyridine and 3 ml of chloroform. After adding 0.13 g (purity 65% or more), the mixture was stirred at room temperature for 12 hours. The reaction mixture was diluted with chloroform, washed successively with 10% aqueous sodium thiosulfate solution and saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous magnesium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography, and 2- [2-ethylsulfonyl 4- (trifluoromethyl) phenyl] -6- (trifluoromethyl) thiazolo [5,4-b] pyridine (hereinafter referred to as the present). This is referred to as a condensed heterocyclic compound 48.) 0.11 g was obtained.
This condensed heterocyclic compound 48
Figure JPOXMLDOC01-appb-I000120
1H-NMR (CDCl3) δ: 8.95 (1H, s), 8.55 (1H, s), 8.52 (1H, s), 8.07 (1H, d), 7.88 (1H, d), 3.77 (2H, q), 1.40 (3H, t).
製造例49
 2−(2−エチルスルファニル−フェニル)−3−メチル−3H−イミダゾ[4,5−b]ピリジン−6−チオール535mg、ヨードメタン166μL及びエタノール5mLの混合物に、室温下水酸化カリウム200mgを加え5時間撹拌した。この反応混合物に、飽和塩化アンモニウム水溶液を加え、酢酸エチルで抽出した。合わせた有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−フェニル)−3−メチル−6−メチルスルファニル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物49と記す。)515mgを得た。
本縮合複素環化合物49
1H−NMR(CDCl3)δ:8.46(1H,d),8.10(1H,d),7.52−7.42(3H,m),7.37−7.26(1H,m),3.73(3H,s),2.86(2H,q),2.54(3H,s),1.22(3H,t)
Production Example 49
To a mixture of 535 mg 2- (2-ethylsulfanyl-phenyl) -3-methyl-3H-imidazo [4,5-b] pyridine-6-thiol, 166 μL iodomethane and 5 mL ethanol, 200 mg potassium hydroxide was added at room temperature for 5 hours. Stir. To this reaction mixture was added saturated aqueous ammonium chloride solution, and the mixture was extracted with ethyl acetate. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanyl-phenyl) -3-methyl-6-methylsulfanyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 49). 515 mg was obtained.
This condensed heterocyclic compound 49
1H-NMR (CDCl3) δ: 8.46 (1H, d), 8.10 (1H, d), 7.52-7.42 (3H, m), 7.37-7.26 (1H, m ), 3.73 (3H, s), 2.86 (2H, q), 2.54 (3H, s), 1.22 (3H, t)
製造例50
 2−(2−エチルスルファニル−フェニル)−3−メチル−6−メチルスルファニル−3H−イミダゾ[4,5−b]ピリジン363mg、クロロホルム5mLの混合物に、氷冷下69~75%3−クロロ過安息香酸1.13gを加えた。混合物を室温まで昇温し、5時間攪拌した後、飽和炭酸水素ナトリウム水溶液及び飽和チオ硫酸ナトリウム水溶液を加注し、クロロホルムで抽出した。合わせた有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルホニルフェニル)−6−メチルスルホニル3−メチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物50と記す。)356mgを得た。
本縮合複素環化合物50
Figure JPOXMLDOC01-appb-I000122
1H−NMR(CDCl3)δ:9.02(1H,d),8.58(1H,d),8.23(1H,dd),7.90−7.81(2H,m),7.59(1H,dd),3.74(3H,s),3.42(2H,q),3.19(3H,s),1.26(3H,t).
Production Example 50
To a mixture of 363 mg of 2- (2-ethylsulfanyl-phenyl) -3-methyl-6-methylsulfanyl-3H-imidazo [4,5-b] pyridine and 5 mL of chloroform was added 69-75% 3-chloroperoxide under ice-cooling. 1.13 g of benzoic acid was added. The mixture was warmed to room temperature and stirred for 5 hours, and then a saturated aqueous sodium bicarbonate solution and a saturated aqueous sodium thiosulfate solution were added thereto, and the mixture was extracted with chloroform. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfonylphenyl) -6-methylsulfonyl-3-methyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 50). ) 356 mg was obtained.
This condensed heterocyclic compound 50
Figure JPOXMLDOC01-appb-I000122
1H-NMR (CDCl3) δ: 9.02 (1H, d), 8.58 (1H, d), 8.23 (1H, dd), 7.90-7.81 (2H, m), 7. 59 (1H, dd), 3.74 (3H, s), 3.42 (2H, q), 3.19 (3H, s), 1.26 (3H, t).
製造例51
 2−(2−エチルスルファニル−フェニル)−6−ヨード−3−メチル−3H−イミダゾ[4,5−b]ピリジンに代えて2−(2−エチルスルファニルー4−トリフルオロメチルフェニル)−6−ヨード−3−メチル−3H−イミダゾ[4,5−b]ピリジンを用い、製造例103記載の方法に準じて、化合物301Aを得た。
 化合物301Aを0.94g、DMF13mlの混合物を−50℃まで冷却し、CF3Iガスを過剰量バブリングし、DMFに溶解させた。内温が−40℃を超えない速度でテトラキスジメチルアミノエチレンジアミン1.2mlを滴下した。その後、1時間かけて−10℃まで昇温し、−10℃でさらに1時間撹拌した。反応混合物に水を注加し、室温まで昇温後、酢酸エチルで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチルスルファニル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物51と記す。)0.68gを得た。
本縮合複素環化合物51
Figure JPOXMLDOC01-appb-I000123
1H−NMR(CDCl3)δ:8.66(1H,d)8.39(1H,d),7.67−7.64(1H,m),7.59−7.52(2H,m),3.75(3H,s),2.94(2H,q),1.27(3H,t).
Production Example 51
2- (2-ethylsulfanyl-4-trifluoromethylphenyl) -6 instead of 2- (2-ethylsulfanyl-phenyl) -6-iodo-3-methyl-3H-imidazo [4,5-b] pyridine Compound 301A was obtained according to the method described in Production Example 103 using iodo-3-methyl-3H-imidazo [4,5-b] pyridine.
A mixture of 0.94 g of Compound 301A and 13 ml of DMF was cooled to −50 ° C., CF 3 I gas was bubbled in excess and dissolved in DMF. 1.2 ml of tetrakisdimethylaminoethylenediamine was added dropwise at a rate such that the internal temperature did not exceed -40 ° C. Then, it heated up to -10 degreeC over 1 hour, and also stirred at -10 degreeC for 1 hour. Water was poured into the reaction mixture, and the mixture was warmed to room temperature and extracted with ethyl acetate. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethylsulfanyl-3H-imidazo [4,5-b]. 0.68 g of pyridine (hereinafter referred to as the present condensed heterocyclic compound 51) was obtained.
This condensed heterocyclic compound 51
Figure JPOXMLDOC01-appb-I000123
1H-NMR (CDCl3) δ: 8.66 (1H, d) 8.39 (1H, d), 7.67-7.64 (1H, m), 7.59-7.52 (2H, m) , 3.75 (3H, s), 2.94 (2H, q), 1.27 (3H, t).
製造例52
 2−(2−エチルスルファニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチルスルファニル−3H−イミダゾ[4,5−b]ピリジン及びクロロホルム5mlの混合物に、氷冷下、69%3−クロロ過安息香酸1.05gを加えた後、室温まで昇温し、1.5時間撹拌した。その後、飽和炭酸水素ナトリウム水溶液及び飽和チオ硫酸ナトリウム水溶液を注加し、クロロホルムで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルホニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチルスルファニル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物52と記す。)0.20gを得た。
本縮合複素環化合物52
Figure JPOXMLDOC01-appb-I000124
1H−NMR(CDCl3)δ:8.71−8.70(1H,m),8.50−8.49(1H,m),8.38−8.36(1H,m),8.12−8.08(1H,m),7.74−7.71(1H,m),3.72(3H,s),3.49(2H,q),1.29(3H,t).
Production Example 52
To a mixture of 2- (2-ethylsulfanyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethylsulfanyl-3H-imidazo [4,5-b] pyridine and 5 ml of chloroform was added 69. After adding 1.05 g of% 3-chloroperbenzoic acid, the mixture was warmed to room temperature and stirred for 1.5 hours. Thereafter, a saturated aqueous sodium hydrogen carbonate solution and a saturated aqueous sodium thiosulfate solution were added, and the mixture was extracted with chloroform. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfonyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethylsulfanyl-3H-imidazo [4,5-b]. 0.20 g of pyridine (hereinafter referred to as the present condensed heterocyclic compound 52) was obtained.
The present condensed heterocyclic compound 52
Figure JPOXMLDOC01-appb-I000124
1H-NMR (CDCl3) δ: 8.71-8.70 (1H, m), 8.50-8.49 (1H, m), 8.38-8.36 (1H, m), 8.12 -8.08 (1H, m), 7.74-7.71 (1H, m), 3.72 (3H, s), 3.49 (2H, q), 1.29 (3H, t).
製造例53
 2−(2−エチルスルホニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチルスルフィニル−3H−イミダゾ[4,5−b]ピリジン0.26g、タングステン酸ナトリウム二水和物36mg、30%過酸化水素水1ml及びアセトニトリル5mlの混合物を、加熱還流下4.5時間撹拌した。室温まで冷却した反応混合物に水を注加し、酢酸エチルで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルホニル−4−トリフルオロメチルフェニル)−3−メチル−6−トリフルオロメチルスルホニル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物53と記す。)0.24gを得た。
本縮合複素環化合物53
Figure JPOXMLDOC01-appb-I000125
1H−NMR(CDCl3)δ:9.08−9.07(1H,m),8.68−8.66(1H,m),8.52−8.50(1H,m),8.16−8.12(1H,m),7.76−7.73(1H,m),3.78(3H,s),3.46(2H,q),1.30(3H,t)
Production Example 53
2- (2-ethylsulfonyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethylsulfinyl-3H-imidazo [4,5-b] pyridine 0.26 g, sodium tungstate dihydrate 36 mg Then, a mixture of 1 ml of 30% aqueous hydrogen peroxide and 5 ml of acetonitrile was stirred for 4.5 hours while heating under reflux. Water was poured into the reaction mixture cooled to room temperature, and the mixture was extracted with ethyl acetate. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfonyl-4-trifluoromethylphenyl) -3-methyl-6-trifluoromethylsulfonyl-3H-imidazo [4,5-b]. 0.24 g of pyridine (hereinafter referred to as the present condensed heterocyclic compound 53) was obtained.
This condensed heterocyclic compound 53
Figure JPOXMLDOC01-appb-I000125
1H-NMR (CDCl3) δ: 9.08-9.07 (1H, m), 8.68-8.66 (1H, m), 8.52-8.50 (1H, m), 8.16 -8.12 (1H, m), 7.76-7.73 (1H, m), 3.78 (3H, s), 3.46 (2H, q), 1.30 (3H, t)
製造例54
 4−(1,2,2,2−テトラフルオロ−1−トリフルオロメチル−エチル)−ベンゼン−1,2−ジアミン552mg、2−エチルスルファニル安息香酸401mg、ピリジン27mLの混合物に、室温下1−エチル−3−(3−ジメチルアミノプロピル)カルボジイミド塩酸塩422mg、1−ヒドロキシベンゾトリアゾール27mgを加えた。室温下5時間した後、この反応混合物を水で希釈し、酢酸エチルで抽出した。合わせた有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた残渣をDMF7.5mLとトルエン30mLの混合溶液に溶解し、室温下、p−トルエンスルホン酸837mgを加えた。この混合物を130℃にて8時間加熱撹拌した後、室温まで放冷した。この反応混合物に飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。合わせた有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−フェニル)−5−(1,2,2,2−テトラフルオロ−1−トリフルオロメチル−エチル)−1H−ベンゾイミダゾール(以下、本縮合複素環化合物54と記す。)97mgを得た。
本縮合複素環化合物54
Figure JPOXMLDOC01-appb-I000126
1H−NMR(CDCl3)δ:12.08−11.87(1H,m),8.31(1H,s),8.12−7.44(4H,m),7.42−7.30(2H,m),2.86(2H,q),1.22(3H,t).
Production Example 54
To a mixture of 552 mg of 4- (1,2,2,2-tetrafluoro-1-trifluoromethyl-ethyl) -benzene-1,2-diamine, 401 mg of 2-ethylsulfanylbenzoic acid and 27 mL of pyridine, 422 mg of ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride and 27 mg of 1-hydroxybenzotriazole were added. After 5 hours at room temperature, the reaction mixture was diluted with water and extracted with ethyl acetate. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was dissolved in a mixed solution of 7.5 mL of DMF and 30 mL of toluene, and 837 mg of p-toluenesulfonic acid was added at room temperature. The mixture was heated and stirred at 130 ° C. for 8 hours, and then allowed to cool to room temperature. Saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography. This is referred to as the present condensed heterocyclic compound 54.) 97 mg was obtained.
The present condensed heterocyclic compound 54
Figure JPOXMLDOC01-appb-I000126
1H-NMR (CDCl3) δ: 12.08-11.87 (1H, m), 8.31 (1H, s), 8.12-7.44 (4H, m), 7.42-7.30 (2H, m), 2.86 (2H, q), 1.22 (3H, t).
製造例55
 エチルメルカプタンナトリウム塩(80%)0.63g及びDMF10mlの混合物に、氷冷下、2−(4−ブロモ−2−フルオロフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン2.08gのDMF溶液を滴下した後、室温まで昇温し、30分間撹拌した。反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(4−ブロモ−2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物55と記す。)1.57gを得た。
本縮合複素環化合物55
Figure JPOXMLDOC01-appb-I000127
1H−NMR(CDCl3)δ:8.73−8.71(1H,m),8.33−8.32(1H,m),7.59(1H,d),7.50−7.47(1H,m),7.30(1H,d),3.77(3H,s),2.91(2H,q),1.27(3H,t).
Production Example 55
To a mixture of 0.63 g of ethyl mercaptan sodium salt (80%) and 10 ml of DMF was added 2- (4-bromo-2-fluorophenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4, under ice cooling. 5-b] 2.08 g of DMF in pyridine was added dropwise, and the mixture was warmed to room temperature and stirred for 30 minutes. Saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (4-bromo-2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as “(2-bromo-4-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine”). This is referred to as the present condensed heterocyclic compound 55.) 1.57 g was obtained.
The present condensed heterocyclic compound 55
Figure JPOXMLDOC01-appb-I000127
1H-NMR (CDCl3) δ: 8.73-8.71 (1H, m), 8.33-8.32 (1H, m), 7.59 (1H, d), 7.50-7.47 (1H, m), 7.30 (1H, d), 3.77 (3H, s), 2.91 (2H, q), 1.27 (3H, t).
製造例56および57
 2−(4−ブロモ−2−エチルスルファニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン0.40g及びクロロホルム5mlの混合物に、氷冷下3−クロロ過安息香酸(純度65%以上)0.29gを添加した後、室温まで昇温し、2時間撹拌した。反応混合物に飽和炭酸水素ナトリウム水溶液及び飽和チオ硫酸ナトリウム水溶液を注加し、クロロホルムで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(4−ブロモ−2−エチルスルフィニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物56と記す。)0.26g、及び2−(4−ブロモ−2−エチルスルホニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物57と記す。)0.17gを得た。
本縮合複素環化合物56
Figure JPOXMLDOC01-appb-I000128
1H−NMR(CDCl3)δ:8.77−8.75(1H,m),8.39(1H,d),8.32−8.31(1H,m),7.84−7.81(1H,m),7.49(1H,d),3.91(3H,s),3.50−3.40(1H,m),3.06−2.96(1H,m),1.35(3H,t).
本縮合複素環化合物57
Figure JPOXMLDOC01-appb-I000129
1H−NMR(CDCl3)δ:8.77−8.75(1H,m),8.37(1H,d),8.31−8.29(1H,m),7.99−7.96(1H,m),7.44(1H,d),3.72(3H,s),3.44(2H,q),1.28(3H,t).
Production Examples 56 and 57
To a mixture of 2- (4-bromo-2-ethylsulfanylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (0.40 g) and chloroform (5 ml) was added 3- After adding 0.29 g of chloroperbenzoic acid (purity 65% or more), the mixture was warmed to room temperature and stirred for 2 hours. Saturated aqueous sodium hydrogen carbonate solution and saturated aqueous sodium thiosulfate solution were added to the reaction mixture, and the mixture was extracted with chloroform. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography, and 2- (4-bromo-2-ethylsulfinylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as “(2-bromo-4-ethylsulfinylphenyl) -3-methyl)” And this condensed heterocyclic compound 56.) 0.26 g and 2- (4-bromo-2-ethylsulfonylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] 0.17 g of pyridine (hereinafter referred to as the present condensed heterocyclic compound 57) was obtained.
The present condensed heterocyclic compound 56
Figure JPOXMLDOC01-appb-I000128
1H-NMR (CDCl3) δ: 8.77-8.75 (1H, m), 8.39 (1H, d), 8.32-8.31 (1H, m), 7.84-7.81 (1H, m), 7.49 (1H, d), 3.91 (3H, s), 3.50-3.40 (1H, m), 3.06-2.96 (1H, m), 1.35 (3H, t).
The present condensed heterocyclic compound 57
Figure JPOXMLDOC01-appb-I000129
1H-NMR (CDCl3) δ: 8.77-8.75 (1H, m), 8.37 (1H, d), 8.31-8.29 (1H, m), 7.9-7.96. (1H, m), 7.44 (1H, d), 3.72 (3H, s), 3.44 (2H, q), 1.28 (3H, t).
製造例58
 2−(4−ブロモ−2−エチルスルホニルフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン0.20g、2−トリブチルスタンニルピリミジン0.17g、テトラキストリフェニルホスフィンパラジウム27mg及びトルエン5mlの混合物を、窒素雰囲気下、5.5時間加熱還流した。室温まで冷却した後、2−トリブチルスタンニルピリミジン0.17g、テトラキストリフェニルホスフィンパラジウム27mgを添加し、加熱還流下さらに8時間撹拌した。室温まで冷却した後、水を注加し、酢酸エチルで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−[2−エチルスルホニル−4−(ピリミジン−2−イル)−フェニル]−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物58と記す。)0.20gを得た。
本縮合複素環化合物58
Figure JPOXMLDOC01-appb-I000130
1H−NMR(CDCl3)δ:8.77−8.74(1H,m),8.38−8.36(1H,m),8.30−8.27(1H,m),8.00−7.95(1H,m),7.63−7.55(1H,m),7.43(1H,d),7.41−7.30(2H,m),3.72(3H,s),3.44(2H,q),1.28(3H,t).
Production Example 58
2- (4-Bromo-2-ethylsulfonylphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine 0.20 g, 2-tributylstannylpyrimidine 0.17 g, tetrakis A mixture of 27 mg of triphenylphosphine palladium and 5 ml of toluene was heated to reflux under a nitrogen atmosphere for 5.5 hours. After cooling to room temperature, 0.17 g of 2-tributylstannylpyrimidine and 27 mg of tetrakistriphenylphosphine palladium were added, and the mixture was further stirred for 8 hours with heating under reflux. After cooling to room temperature, water was added and extracted with ethyl acetate. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography, and 2- [2-ethylsulfonyl-4- (pyrimidin-2-yl) -phenyl] -3-methyl-6-trifluoromethyl-3H-imidazo [4, 5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 58) 0.20 g was obtained.
The present condensed heterocyclic compound 58
Figure JPOXMLDOC01-appb-I000130
1H-NMR (CDCl3) δ: 8.77-8.74 (1H, m), 8.38-8.36 (1H, m), 8.30-8.27 (1H, m), 8.00 -7.95 (1H, m), 7.63-7.55 (1H, m), 7.43 (1H, d), 7.41-7.30 (2H, m), 3.72 (3H , S), 3.44 (2H, q), 1.28 (3H, t).
製造例59−1
 5−トリフルオロメチル−ピリジン−2−イルアミン65gおよびクロロホルム100mL混合物に、氷水冷却下N−ブロモスクシンイミド71gを5回に分けて加えた。室温まで昇温し1時間撹拌した後に、80℃まで加熱し30分間加熱撹拌した。室温まで放冷後、飽和チオ硫酸ナトリウム水溶液および飽和炭酸水素ナトリウム水溶液を注加し、クロロホルムで抽出した。合わせた有機層を硫酸ナトリウムで乾燥後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、3−ブロモ−5−トリフルオロメチル−ピリジン−2−イルアミン96gを得た。
3−ブロモ−5−トリフルオロメチル−ピリジン−2−イルアミン
Figure JPOXMLDOC01-appb-I000131
1H−NMR(CDCl3)δ:8.27(1H,d),7.86(1H,d),5.38(2H,brs).
Production Example 59-1
To a mixture of 65 g of 5-trifluoromethyl-pyridin-2-ylamine and 100 mL of chloroform, 71 g of N-bromosuccinimide was added in 5 portions under cooling with ice water. After heating up to room temperature and stirring for 1 hour, it heated to 80 degreeC and heated and stirred for 30 minutes. After cooling to room temperature, a saturated aqueous sodium thiosulfate solution and a saturated aqueous sodium hydrogen carbonate solution were added, and the mixture was extracted with chloroform. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 96 g of 3-bromo-5-trifluoromethyl-pyridin-2-ylamine.
3-Bromo-5-trifluoromethyl-pyridin-2-ylamine
Figure JPOXMLDOC01-appb-I000131
1H-NMR (CDCl3) δ: 8.27 (1H, d), 7.86 (1H, d), 5.38 (2H, brs).
 製造例59−2
3−ブロモ−5−トリフルオロメチル−ピリジン−2−イルアミン40g、アセチルアセトン銅(II)2.2g、アセチルアセトン6.6g、炭酸セシウム59g、NMP105mLをオートクレーブ反応装置に加え、氷冷下28%アンモニア水溶液25mLを加えた。密封後、110℃まで昇温し、12時間加熱撹拌した。室温まで氷冷後、反応混合物を水で希釈し、酢酸エチルで抽出した。合わせた有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、5−トリフルオロメチル−ピリジン−2,3−ジアミン15gを得た。5−トリフルオロメチル−ピリジン−2,3−ジアミン
Figure JPOXMLDOC01-appb-I000132
1H−NMR(CDCl3)δ:7.93(1H,d),7.04(1H,d),4.71(2H,brs),3.46(2H,brs).
Production Example 59-2
3-Bromo-5-trifluoromethyl-pyridin-2-ylamine 40 g, acetylacetone copper (II) 2.2 g, acetylacetone 6.6 g, cesium carbonate 59 g, and NMP 105 mL were added to an autoclave reactor, and 28% aqueous ammonia solution was cooled with ice. 25 mL was added. After sealing, the temperature was raised to 110 ° C. and heated and stirred for 12 hours. After cooling to room temperature with ice, the reaction mixture was diluted with water and extracted with ethyl acetate. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 15 g of 5-trifluoromethyl-pyridine-2,3-diamine. 5-Trifluoromethyl-pyridine-2,3-diamine
Figure JPOXMLDOC01-appb-I000132
1H-NMR (CDCl3) δ: 7.93 (1H, d), 7.04 (1H, d), 4.71 (2H, brs), 3.46 (2H, brs).
 製造例59−3
 2−フルオロー4−トリフルオロメチルベンズアルデヒド15.1g及びDMF61mlの混合物に、氷冷下ナトリウムエタンチオラート(90%)7.35gを加え、室温で6時間攪拌した。反応混合物を水に注加し、酢酸エチルで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−ホルミル−5−トリフルオロメチルフェニルエチルスルフィド11.8gを得た。
2−ホルミル−5−トリフルオロメチルフェニルエチルスルフィド
Figure JPOXMLDOC01-appb-I000133
1H−NMR(CDCl3)δ:10.41(1H,s),7.94(1H,d),7.63(1H,s),7.53(1H,d),3.04(2H,q),1.41(3H,t).
Production Example 59-3
7.35 g of sodium ethanethiolate (90%) was added to a mixture of 15.1 g of 2-fluoro-4-trifluoromethylbenzaldehyde and 61 ml of DMF, and the mixture was stirred at room temperature for 6 hours. The reaction mixture was poured into water and extracted with ethyl acetate. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain 11.8 g of 2-formyl-5-trifluoromethylphenylethyl sulfide.
2-Formyl-5-trifluoromethylphenyl ethyl sulfide
Figure JPOXMLDOC01-appb-I000133
1H-NMR (CDCl3) δ: 10.41 (1H, s), 7.94 (1H, d), 7.63 (1H, s), 7.53 (1H, d), 3.04 (2H, q), 1.41 (3H, t).
 製造例59−4
 5−トリフルオロメチル−ピリジン−2,3−ジアミン8.6g、2−ホルミル−5−トリフルオロメチルフェニルエチルスルフィド11g、およびDMF67mLの混合物に、室温下にて亜硫酸水素ナトリウム6.1gを加えた。100℃にて3時間加熱撹拌した後、塩化銅(II)二水和物1gを加え、さらに100℃にて1時間加熱攪拌した。室温まで放冷後、この反応混合物を水に加え、酢酸エチル抽出した。合わせた有機層を硫酸ナトリウムで乾燥し、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、黄色い粉末固体を得た。これを熱ヘキサンで洗浄することで2−(2−エチルスルファニル−4−トリフルオロメチル−フェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物59と記す。)12gを得た。
本縮合複素環化合物59
Figure JPOXMLDOC01-appb-I000134
1H−NMR(CDCl3)δ:12.79(1H,brs),8.72(1H,brs),8.49−8.34(2H,m),7.79(1H,s),7.64(1H,d),3.00(2H,q),1.31(3H,t).
Production Example 59-4
To a mixture of 8.6 g of 5-trifluoromethyl-pyridine-2,3-diamine, 11 g of 2-formyl-5-trifluoromethylphenylethyl sulfide, and 67 mL of DMF, 6.1 g of sodium bisulfite was added at room temperature. . After heating and stirring at 100 ° C. for 3 hours, 1 g of copper (II) chloride dihydrate was added, and the mixture was further heated and stirred at 100 ° C. for 1 hour. After cooling to room temperature, this reaction mixture was added to water and extracted with ethyl acetate. The combined organic layers were dried over sodium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography to obtain a yellow powdered solid. This was washed with hot hexane to give 2- (2-ethylsulfanyl-4-trifluoromethyl-phenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocycle). This is referred to as compound 59.) 12 g were obtained.
This condensed heterocyclic compound 59
Figure JPOXMLDOC01-appb-I000134
1H-NMR (CDCl3) δ: 12.79 (1H, brs), 8.72 (1H, brs), 8.49-8.34 (2H, m), 7.79 (1H, s), 7. 64 (1H, d), 3.00 (2H, q), 1.31 (3H, t).
製造例60
 2−(2−エチルスルファニル−4−トリフルオロメチル−フェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン12gおよびクロロホルム111mLの混合物に、氷冷下69~75%3−クロロ過安息香酸8.0gを加えた。混合物を室温まで昇温し、0.5時間攪拌した後、飽和炭酸水素ナトリウム水溶液および飽和チオ硫酸ナトリウム水溶液を注加し、クロロホルムで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルホニル−4−トリフルオロメチル−フェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物60と記す。)9.1gを得た。
本縮合複素環化合物60
Figure JPOXMLDOC01-appb-I000135
1H−NMR(DMSO−D6)δ:14.15(1H,brs),8.83(1H,s),8.58(1H,s),8.41(1H,d),8.37(1H,s),8.19(1H,d),3.97(2H,q),1.23(3H,t).
Production Example 60
To a mixture of 12 g of 2- (2-ethylsulfanyl-4-trifluoromethyl-phenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine and 111 mL of chloroform was added 69 to 75% 3 under ice cooling. -8.0 g of chloroperbenzoic acid was added. The mixture was warmed to room temperature and stirred for 0.5 hour, and then a saturated aqueous sodium bicarbonate solution and a saturated aqueous sodium thiosulfate solution were added, and the mixture was extracted with chloroform. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and 2- (2-ethylsulfonyl-4-trifluoromethyl-phenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed complex). 9.1 g was obtained.
The present condensed heterocyclic compound 60
Figure JPOXMLDOC01-appb-I000135
1H-NMR (DMSO-D6) δ: 14.15 (1H, brs), 8.83 (1H, s), 8.58 (1H, s), 8.41 (1H, d), 8.37 ( 1H, s), 8.19 (1H, d), 3.97 (2H, q), 1.23 (3H, t).
製造例61
 N−(2−アミノ−5−トリフルオロメチルピリジン−3−イル)−2−エチルスルファニル−ベンズアミド200mg、tert−ブチルアルコ−ル1ml及びTHF9mlの混合物を80℃で加熱撹拌し、ここに、60%水素化ナトリウム(油性)56mgを加えた。この混合物を80℃で2時間加熱撹拌した後、60%水素化ナトリウム(油性)56mgを加えた。さらに同温で2時間加熱撹拌した後、60%水素化ナトリウム(油性)56mgを加え、同温で2時間加熱撹拌した。反応混合物を室温まで冷却した後、溶媒を留去し、飽和塩化アンモニウム水溶液を加え、酢酸エチルで抽出した。有機層を硫酸ナトリウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニルフェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物61と記す。)132mgを得た。
本縮合複素環化合物61
Figure JPOXMLDOC01-appb-I000136
1H−NMR(CDCl3)δ:8.67(1H,d),8.51−8.48(1H,m),8.33(1H,d),7.66−7.61(1H,m),7.51−7.46(2H,m),2.93(2H,q),1.27(3H,t)
Production Example 61
A mixture of 200 mg of N- (2-amino-5-trifluoromethylpyridin-3-yl) -2-ethylsulfanyl-benzamide, 1 ml of tert-butyl alcohol and 9 ml of THF was heated and stirred at 80 ° C., and 60% 56 mg of sodium hydride (oily) was added. The mixture was heated and stirred at 80 ° C. for 2 hours, and 56 mg of 60% sodium hydride (oily) was added. Furthermore, after stirring with heating at the same temperature for 2 hours, 56 mg of 60% sodium hydride (oily) was added, and the mixture was heated with stirring at the same temperature for 2 hours. The reaction mixture was cooled to room temperature, the solvent was evaporated, saturated aqueous ammonium chloride solution was added, and the mixture was extracted with ethyl acetate. The organic layer was dried over sodium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanylphenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine (hereinafter referred to as the present condensed heterocyclic compound 61 and 132 mg was obtained.
The present condensed heterocyclic compound 61
Figure JPOXMLDOC01-appb-I000136
1H-NMR (CDCl3) δ: 8.67 (1H, d), 8.51-8.48 (1H, m), 8.33 (1H, d), 7.66-7.61 (1H, m ), 7.51-7.46 (2H, m), 2.93 (2H, q), 1.27 (3H, t)
製造例62
 2−(2−エチルスルファニルフェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン2.28g及びクロロホルム20mlの混合物に、、氷冷下69~75%3−クロロ過安息香酸8.0gを加えた。混合物を室温まで昇温し、0.5時間攪拌した後、飽和炭酸水素ナトリウム水溶液および飽和チオ硫酸ナトリウム水溶液を注加し、クロロホルムで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。残渣をシリカゲルカラムクロマトグラフィーに付し、得られた結晶をヘキサンで洗浄することにより、2−(2−エチルスルホニル−フェニル)−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物62と記す。)2.5gを得た。
本縮合複素環化合物62
Figure JPOXMLDOC01-appb-I000137
1H−NMR(CDCl3)δ:8.63(1H,s),8.35(1H,s),8.24(1H,d),8.09(1H,d),7.83(1H,t),7.76(1H,t),3.33(2H,q),0.88(3H,t).
Production Example 62
To a mixture of 2.28 g of 2- (2-ethylsulfanylphenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine and 20 ml of chloroform was added 69-75% 3-chloroperbenzoic acid under ice cooling. 8.0 g of acid was added. The mixture was warmed to room temperature and stirred for 0.5 hour, and then a saturated aqueous sodium bicarbonate solution and a saturated aqueous sodium thiosulfate solution were added, and the mixture was extracted with chloroform. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The residue was subjected to silica gel column chromatography, and the resulting crystals were washed with hexane to give 2- (2-ethylsulfonyl-phenyl) -6-trifluoromethyl-3H-imidazo [4,5-b] pyridine. (Hereinafter referred to as the present condensed heterocyclic compound 62.) 2.5 g was obtained.
The present condensed heterocyclic compound 62
Figure JPOXMLDOC01-appb-I000137
1H-NMR (CDCl3) δ: 8.63 (1H, s), 8.35 (1H, s), 8.24 (1H, d), 8.09 (1H, d), 7.83 (1H, t), 7.76 (1H, t), 3.33 (2H, q), 0.88 (3H, t).
製造例63および64
 エチルメルカプタンナトリウム塩(80%)0.31g及びDMF9mlの混合物に、氷冷下、2−(2−フルオロ−4−トリフルオロメトキシフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン1.02gを添加した後、室温まで昇温し、2時間撹拌した。反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−4−トリフルオロメトキシフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンと2−(2−フルオロ−4−トリフルオロメトキシフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジンの混合物(約3:1)0.82gを得た。
 得られた混合物及びクロロホルム4mlの混合物に、氷冷下3−クロロ過安息香酸(純度65%以上)0.45gを添加した後、室温まで昇温し、2時間撹拌した。反応混合物に飽和炭酸水素ナトリウム水溶液及び飽和チオ硫酸ナトリウム水溶液を注加し、クロロホルムで抽出した。合わせた有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルフィニル−4−トリフルオロメトキシフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物63と記す。)0.47g、2−(2−エタンスルフォニル−4−トリフルオロメトキシフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物64と記す。)0.14gを得た。
本縮合複素環化合物63
Figure JPOXMLDOC01-appb-I000138
1H−NMR(CDCl3)δ:8.78−8.76(1H,m),8.33−8.31(1H,m),8.14−8.12(1H,m),7.68(1H,d),7.54−7.50(1H,m),3.93(3H,s),3.49−3.39(1H,m),3.06−2.96(1H,m),1.33(3H,t).
本縮合複素環化合物64
Figure JPOXMLDOC01-appb-I000139
1H−NMR(CDCl3)δ:8.77−8.75(1H,m),8.30−8.28(1H,m),8.09−8.07(1H,m),7.70−7.66(1H,m),7.63(1H,d),3.74(3H,s),3.46(2H,q),1.28(3H,t).
Production Examples 63 and 64
To a mixture of 0.31 g of ethyl mercaptan sodium salt (80%) and 9 ml of DMF was added ice-cooled 2- (2-fluoro-4-trifluoromethoxyphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [ After adding 1.05 g of 4,5-b] pyridine, the mixture was warmed to room temperature and stirred for 2 hours. Saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanyl-4-trifluoromethoxyphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine. And 0.82 g of a mixture (approximately 3: 1) of 2- (2-fluoro-4-trifluoromethoxyphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine It was.
After adding 0.45 g of 3-chloroperbenzoic acid (purity 65% or more) to the mixture of the obtained mixture and 4 ml of chloroform under ice cooling, the mixture was warmed to room temperature and stirred for 2 hours. Saturated aqueous sodium hydrogen carbonate solution and saturated aqueous sodium thiosulfate solution were added to the reaction mixture, and the mixture was extracted with chloroform. The combined organic layers were dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfinyl-4-trifluoromethoxyphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine. (Hereinafter referred to as the present condensed heterocyclic compound 63.) 0.47 g, 2- (2-ethanesulfonyl-4-trifluoromethoxyphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5 -B] 0.14 g of pyridine (hereinafter referred to as the present condensed heterocyclic compound 64) was obtained.
The present condensed heterocyclic compound 63
Figure JPOXMLDOC01-appb-I000138
1H-NMR (CDCl3) δ: 8.78-8.76 (1H, m), 8.33-8.31 (1H, m), 8.14-8.12 (1H, m), 7.68 (1H, d), 7.54-7.50 (1H, m), 3.93 (3H, s), 3.49-3.39 (1H, m), 3.06-2.96 (1H , M), 1.33 (3H, t).
The present condensed heterocyclic compound 64
Figure JPOXMLDOC01-appb-I000139
1H-NMR (CDCl3) δ: 8.77-8.75 (1H, m), 8.30-8.28 (1H, m), 8.09-8.07 (1H, m), 7.70 −7.66 (1H, m), 7.63 (1H, d), 3.74 (3H, s), 3.46 (2H, q), 1.28 (3H, t).
製造例65
2−(2−エチルスルフィニル−4−トリフルオロメトキシフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン0.34g、塩化ジルコニウム0.36g、ヨウ化ナトリウム0.47g及びアセトニトリル8mlの混合物を2時間、加熱還流下撹拌した。室温まで冷却した後、反応混合物に、飽和炭酸水素ナトリウム水溶液を注加し、酢酸エチルで抽出した。有機層を硫酸マグネシウムで乾燥させた後、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−4−トリフルオロメトキシフェニル)−3−メチル−6−トリフルオロメチル−3H−イミダゾ[4,5−b]ピリジン(以下、本縮合複素環化合物65と記す。)0.29gを得た。
本縮合複素環化合物65
Figure JPOXMLDOC01-appb-I000140
1H−NMR(CDCl3)δ:8.74−8.72(1H,m),8.33−8.32(1H,m),7.48(1H,d),7.29−7.27(1H,m),7.21−7.17(1H,m),3.79(3H,s),2.92(2H,q),1.29(3H,t).
製造例66—1
 2−アミノ−4−トリフルオロメチルフェノール0.50g、2−エチルスルファニル−4−トリフルオロメチル安息香酸0.71g、WSC0.65g及びクロロホルム6mlの混合物を、室温で3時間半撹拌した。反応混合物に飽和塩化アンモニウム水溶液を注加し、クロロホルムで抽出した。有機層を飽和炭酸水素ナトリウム水溶液及び飽和塩水で水洗した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−エチルスルファニル−4−トリフルオロメチル−N−[2−ヒドロキシ−5−トリフルオロメチルフェニル]ベンズアミド0.57gを得た。
2−エチルスルファニル−4−トリフルオロメチル−N−[2−ヒドロキシ−5−トリフルオロメチルフェニル]ベンズアミド
Figure JPOXMLDOC01-appb-I000141
H−NMR(CDCl)δ:9.33(1H,brs),8.87(1H,s),8.03(1H,d),7.75(1H,s),7.62(1H,d),7.57(1H,s),7.44(1H,d),7.14(1H,d),3.05(2H,q),1.36(3H,t)
製造例66−2
 2−エチルスルファニル−4−トリフルオロメチル−N−[2−ヒドロキシ−5−トリフルオロメチルフェニル]ベンズアミド0.56g、ジ−2−メトキシエチルアゾジカルボキシレート(以下、DMEADと記す)0.40g、トリフェニルホスフィン0.39g及びTHF15mlの混合物を、室温で30分間及び50℃で1時間攪拌した。室温まで放冷した反応混合物を減圧下濃縮した後に水を注加し、酢酸エチルで抽出した。有機層を飽和塩水で水洗した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニル−4−トリフルオロメチルフェニル)−5−トリフルオロメチルベンズオキサゾール0.52gを得た。
2−(2−エチルスルファニル−4−トリフルオロメチルフェニル)−5−トリフルオロメチルベンズオキサゾール
H−NMR(CDCl)δ:8.29(1H,d),8.19(1H,d),7.75−7.66(2H,m),7.63(1H,s),7.51(1H,dd),3.10(2H,q),1.47(3H,t).
製造例66−3
 2−(2−エチルスルファニル−4−トリフルオロメチルフェニル)−5−トリフルオロメチルベンズオキサゾール0.35g及びクロロホルム10mlの混合物に、氷冷下、m−クロロ過安息香酸(純度65%以上)0.46gを添加した後、室温で1時間半撹拌した。反応混合物に10%亜硫酸ナトリウム水溶液を加え、クロロホルムで抽出した。有機層を飽和炭酸水素ナトリウム水溶液で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルホニル−4−トリフルオロメチルフェニル)−5−トリフルオロメチルベンズオキサゾール(以下、本縮合複素環化合物130と記す。)0.34gを得た。
本縮合複素環化合物130
Figure JPOXMLDOC01-appb-I000143
H−NMR(CDCl)δ:8.54(1H,s),8.18−8.12(2H,m),8.08(1H,dd),7.77−7.74(2H,m),3.90(2H,q),1.44(3H,t).
製造例67−1
 2−エチルスルファニル安息香酸1.2g、クロロホルム10ml及びDMF0.1mlの混合物に、塩化オキサリル1.1mlを加え、室温で1時間攪拌した。反応混合物を減圧下濃縮し、反応混合物にTHF10mlを加えた。これを2−アミノ−4−(トリフルオロメチルスルファニル)フェノール1.38g及びTHF15mlの混合物に氷冷下で加え、室温で2時間攪拌した。反応混合物に水を加え、クロロホルムで抽出した。有機層を飽和炭酸水素ナトリウム水溶液及び飽和塩水で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮することにより、2−エチルスルファニル−N−[2−ヒドロキシ−5−(トリフルオロメチルスルファニル)フェニル]ベンズアミド1.78gを得た。
2−エチルスルファニル−N−[2−ヒドロキシ−5−(トリフルオロメチルスルファニル)フェニル]ベンズアミド
Figure JPOXMLDOC01-appb-I000144
H−NMR(CDCl)δ:9.89(1H,s),9.71(1H,s),8.05(1H,dd),7.58(1H,dd),7.51(1H,ddd),7.48−7.41(3H,m),7.12(1H,d),2.99(2H,q),1.31(3H,t).
製造例67−2
 2−エチルスルファニル−N−[2−ヒドロキシ−5−(トリフルオロメチルスルファニル)フェニル]ベンズアミド1.78g、DMEAD1.79g、トリフェニルホスフィン1.88g及びTHF20mlの混合物を、室温で30分間及び50℃で1時間攪拌した。室温まで放冷した反応混合物を減圧下濃縮した後に水を注加し、酢酸エチルで抽出した。有機層を飽和塩水で水洗した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルファニルフェニル)−5−(トリフルオロメチルスルファニル)ベンズオキサゾール1.33gを得た。
2−(2−エチルスルファニルフェニル)−5−(トリフルオロメチルスルファニル)ベンズオキサゾール
Figure JPOXMLDOC01-appb-I000145
H−NMR(CDCl)δ:8.21(1H,d),8.17(1H,dd),7.67(1H,dd),7.64(1H,d),7.52−7.46(1H,m),7.43(1H,dd),7.31−7.27(1H,m),3.07(2H,q),1.45(3H,t).
製造例67−3
 2−(2−エチルスルファニルフェニル)−5−(トリフルオロメチルスルファニル)ベンズオキサゾール1.15g及びクロロホルム25mlの混合物に、氷冷下、m−クロロ過安息香酸(純度65%以上)2.04gを添加した後、室温で1日間半撹拌した。反応混合物に10%亜硫酸ナトリウム水溶液を加え、クロロホルムで抽出した。有機層を飽和炭酸水素ナトリウム水溶液で洗浄した後、無水硫酸ナトリウムで乾燥し、減圧下濃縮した。得られた残渣をシリカゲルカラムクロマトグラフィーに付し、2−(2−エチルスルホニルフェニル)−5−(トリフルオロメチルスルファニル)ベンズオキサゾール0.38g及び2−(2−エチルスルホニルフェニル)−5−(トリフルオロメチルスルフィニル)ベンズオキサゾール(以下、本縮合複素環化合物131と記す。)0.55gを得た。
2−(2−エチルスルホニルフェニル)−5−(トリフルオロメチルスルファニル)ベンズオキサゾール
Figure JPOXMLDOC01-appb-I000146
H−NMR(CDCl)δ:8.28−8.24(1H,m),8.16−8.13(1H,m),7.99−7.95(1H,m),7.85−7.76(2H,m),7.73(1H,dd),7.66(1H,d),3.83(2H,q),1.40(3H,t).
本縮合複素環化合物131
Figure JPOXMLDOC01-appb-I000147
H−NMR(CDCl)δ:8.30−8.25(2H,m),8.01−7.97(1H,m),7.87−7.79(4H,m),3.82(2H,q),1.41(3H,t).
Production Example 65
2- (2-Ethylsulfinyl-4-trifluoromethoxyphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine 0.34 g, zirconium chloride 0.36 g, sodium iodide A mixture of 0.47 g and 8 ml of acetonitrile was stirred with heating under reflux for 2 hours. After cooling to room temperature, saturated aqueous sodium hydrogen carbonate solution was poured into the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was dried over magnesium sulfate and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfanyl-4-trifluoromethoxyphenyl) -3-methyl-6-trifluoromethyl-3H-imidazo [4,5-b] pyridine. (Hereinafter referred to as the present condensed heterocyclic compound 65.) 0.29 g was obtained.
This condensed heterocyclic compound 65
Figure JPOXMLDOC01-appb-I000140
1H-NMR (CDCl3) δ: 8.74-8.72 (1H, m), 8.33-8.32 (1H, m), 7.48 (1H, d), 7.29-7.27 (1H, m), 7.21-7.17 (1H, m), 3.79 (3H, s), 2.92 (2H, q), 1.29 (3H, t).
Production Example 66-1
A mixture of 0.50 g of 2-amino-4-trifluoromethylphenol, 0.71 g of 2-ethylsulfanyl-4-trifluoromethylbenzoic acid, 0.65 g of WSC and 6 ml of chloroform was stirred at room temperature for 3.5 hours. Saturated aqueous ammonium chloride solution was poured into the reaction mixture, and the mixture was extracted with chloroform. The organic layer was washed with a saturated aqueous sodium bicarbonate solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 0.57 g of 2-ethylsulfanyl-4-trifluoromethyl-N- [2-hydroxy-5-trifluoromethylphenyl] benzamide.
2-Ethylsulfanyl-4-trifluoromethyl-N- [2-hydroxy-5-trifluoromethylphenyl] benzamide
Figure JPOXMLDOC01-appb-I000141
1 H-NMR (CDCl 3 ) δ: 9.33 (1H, brs), 8.87 (1H, s), 8.03 (1H, d), 7.75 (1H, s), 7.62 ( 1H, d), 7.57 (1H, s), 7.44 (1H, d), 7.14 (1H, d), 3.05 (2H, q), 1.36 (3H, t)
Production Example 66-2
2-ethylsulfanyl-4-trifluoromethyl-N- [2-hydroxy-5-trifluoromethylphenyl] benzamide 0.56 g, di-2-methoxyethyl azodicarboxylate (hereinafter referred to as DMEAD) 0.40 g A mixture of 0.39 g of triphenylphosphine and 15 ml of THF was stirred at room temperature for 30 minutes and at 50 ° C. for 1 hour. The reaction mixture allowed to cool to room temperature was concentrated under reduced pressure, water was poured, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 0.52 g of 2- (2-ethylsulfanyl-4-trifluoromethylphenyl) -5-trifluoromethylbenzoxazole.
2- (2-Ethylsulfanyl-4-trifluoromethylphenyl) -5-trifluoromethylbenzoxazole
1 H-NMR (CDCl 3 ) δ: 8.29 (1H, d), 8.19 (1H, d), 7.75-7.66 (2H, m), 7.63 (1H, s), 7.51 (1H, dd), 3.10 (2H, q), 1.47 (3H, t).
Production Example 66-3
To a mixture of 2- (2-ethylsulfanyl-4-trifluoromethylphenyl) -5-trifluoromethylbenzoxazole 0.35 g and chloroform 10 ml, m-chloroperbenzoic acid (purity 65% or more) 0 After adding .46 g, the mixture was stirred at room temperature for 1.5 hours. A 10% aqueous sodium sulfite solution was added to the reaction mixture, and the mixture was extracted with chloroform. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 2- (2-ethylsulfonyl-4-trifluoromethylphenyl) -5-trifluoromethylbenzoxazole (hereinafter referred to as the present condensed heterocyclic compound 130). .34 g was obtained.
The present condensed heterocyclic compound 130
Figure JPOXMLDOC01-appb-I000143
1 H-NMR (CDCl 3 ) δ: 8.54 (1H, s), 8.18-8.12 (2H, m), 8.08 (1H, dd), 7.77-7.74 (2H M), 3.90 (2H, q), 1.44 (3H, t).
Production Example 67-1
To a mixture of 1.2 g of 2-ethylsulfanylbenzoic acid, 10 ml of chloroform and 0.1 ml of DMF, 1.1 ml of oxalyl chloride was added and stirred at room temperature for 1 hour. The reaction mixture was concentrated under reduced pressure, and 10 ml of THF was added to the reaction mixture. This was added to a mixture of 1.38 g of 2-amino-4- (trifluoromethylsulfanyl) phenol and 15 ml of THF under ice cooling, and the mixture was stirred at room temperature for 2 hours. Water was added to the reaction mixture, and the mixture was extracted with chloroform. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution and saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure to give 2-ethylsulfanyl-N- [2-hydroxy-5- (trifluoromethylsulfanyl). 1.78 g of phenyl] benzamide were obtained.
2-Ethylsulfanyl-N- [2-hydroxy-5- (trifluoromethylsulfanyl) phenyl] benzamide
Figure JPOXMLDOC01-appb-I000144
1 H-NMR (CDCl 3 ) δ: 9.89 (1H, s), 9.71 (1H, s), 8.05 (1H, dd), 7.58 (1H, dd), 7.51 ( 1H, ddd), 7.48-7.41 (3H, m), 7.12 (1H, d), 2.99 (2H, q), 1.31 (3H, t).
Production Example 67-2
A mixture of 1.78 g of 2-ethylsulfanyl-N- [2-hydroxy-5- (trifluoromethylsulfanyl) phenyl] benzamide, 1.79 g of DMEAD, 1.88 g of triphenylphosphine and 20 ml of THF is stirred for 30 minutes at room temperature and 50 ° C. For 1 hour. The reaction mixture allowed to cool to room temperature was concentrated under reduced pressure, water was poured, and the mixture was extracted with ethyl acetate. The organic layer was washed with saturated brine, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to obtain 1.33 g of 2- (2-ethylsulfanylphenyl) -5- (trifluoromethylsulfanyl) benzoxazole.
2- (2-Ethylsulfanylphenyl) -5- (trifluoromethylsulfanyl) benzoxazole
Figure JPOXMLDOC01-appb-I000145
1 H-NMR (CDCl 3 ) δ: 8.21 (1H, d), 8.17 (1H, dd), 7.67 (1H, dd), 7.64 (1H, d), 7.52- 7.46 (1H, m), 7.43 (1H, dd), 7.31-7.27 (1H, m), 3.07 (2H, q), 1.45 (3H, t).
Production Example 67-3
To a mixture of 1.15 g of 2- (2-ethylsulfanylphenyl) -5- (trifluoromethylsulfanyl) benzoxazole and 25 ml of chloroform, 2.04 g of m-chloroperbenzoic acid (purity 65% or more) was added under ice cooling. After the addition, the mixture was stirred at room temperature for one and a half days. A 10% aqueous sodium sulfite solution was added to the reaction mixture, and the mixture was extracted with chloroform. The organic layer was washed with a saturated aqueous sodium hydrogen carbonate solution, dried over anhydrous sodium sulfate, and concentrated under reduced pressure. The obtained residue was subjected to silica gel column chromatography to give 0.38 g of 2- (2-ethylsulfonylphenyl) -5- (trifluoromethylsulfanyl) benzoxazole and 2- (2-ethylsulfonylphenyl) -5- ( 0.55 g of trifluoromethylsulfinyl) benzoxazole (hereinafter referred to as the present condensed heterocyclic compound 131) was obtained.
2- (2-Ethylsulfonylphenyl) -5- (trifluoromethylsulfanyl) benzoxazole
Figure JPOXMLDOC01-appb-I000146
1 H-NMR (CDCl 3 ) δ: 8.28-8.24 (1H, m), 8.16-8.13 (1H, m), 7.9-7.95 (1H, m), 7 .85-7.76 (2H, m), 7.73 (1H, dd), 7.66 (1H, d), 3.83 (2H, q), 1.40 (3H, t).
This condensed heterocyclic compound 131
Figure JPOXMLDOC01-appb-I000147
1 H-NMR (CDCl 3 ) δ: 8.30-8.25 (2H, m), 8.01-7.97 (1H, m), 7.87-7.79 (4H, m), 3 .82 (2H, q), 1.41 (3H, t).
以下、表3および表4に記載の本縮合複素環化合物の1H−NMRデータを示す。
本縮合複素環化合物66
1H−NMR(CDCl3)δ:8.51(1H,s),8.22(1H,s),7.55−7.50(2H,m),7.47−7.43(1H,m),7.38−7.32(1H,m),5.81(1H,dq),3.76(3H,s),2.88(2H,q),1.24(3H,t).
本縮合複素環化合物67
1H−NMR(CDCl3)δ:8.55(1H,d),8.26(1H,d),8.21(1H,d),7.83(1H,t),7.69(1H,t),7.60(1H,d),5.84(1H,dq),3.88(3H,s),3.42−3.30(1H,m),3.03−2.91(1H,m),1.33−1.25(3H,m).
本縮合複素環化合物68
1H−NMR(CDCl3)δ:8.53(1H,s),8.26−8.16(2H,m),7.88−7.78(2H,m),7.59−7.53(1H,m),5.82(1H,dq),3.70(3H,s),3.44(2H,q),1.26(3H,t).
本縮合複素環化合物69
1H−NMR(CDCl3)δ:8.68(1H,d),8.29(1H,d),7.74−7.68(1H,m),7.49−7.40(2H,m),3.73(3H,s),2.74(2H,q),1.06(3H,t).
本縮合複素環化合物70
1H−NMR(CDCl3)δ:8.64(1H,s),8.24(1H,s),7.65(1H,d),7.58(1H,t),7.39(1H,d),3.72(3H,s),3.63−3.47(1H,m),3.37−3.22(1H,m),1.38−1.30(3H,m).
本縮合複素環化合物71
1H−NMR(CDCl3)δ:8.74−8.72(1H,m),8.33−8.32(1H,m),7.52−7.49(1H,m),7.47−7.43(2H,m),3.79(3H,s),2.85(2H,q),1.23(3H,t).
本縮合複素環化合物72
1H−NMR(CDCl3)δ:8.78−8.76(1H,m),8.33−8.31(1H,m),8.20(1H,d),7.81−7.78(1H,m),7.60(1H,d),3.93(3H,s),3.42−3.32(1H,m),3.02−2.92(1H,m),1.31(3H,t).
本縮合複素環化合物73
1H−NMR(CDCl3)δ:8.76−8.75(1H,m),8.29−8.28(1H,m),8.16(1H,d),7.80−7.77(1H,m),7.57(1H,d),3.75(3H,s),3.40(2H,q),1.26(3H,t).
本縮合複素環化合物74
1H−NMR(CDCl3)δ:8.74−8.72(1H,m),8.33−8.31(1H,m),7.51−7.45(1H,m),7.36−7.31(2H,m),3.75(3H,s),2.78(2H,q),1.10(3H,t).
本縮合複素環化合物75
1H−NMR(CDCl3)δ:8.73−8.71(1H,m),8.29−8.27(1H,m),7.70−7.64(1H,m),7.44−7.38(1H,m),7.33(1H,d),3.81(3H,s),3.53−3.43(1H,m),3.42−3.31(1H,m),1.33(3H,t).
本縮合複素環化合物76
1H−NMR(CDCl3)δ:8.73−8.72(1H,m),8.28−8.26(1H,m),7.84−7.78(1H,m),7.55−7.49(1H,m),7.38−7.35(1H,m),3.77(3H,s),3.50−3.34(2H,m),1.34(3H,t).
本縮合複素環化合物77
1H−NMR(CDCl3)δ:8.74−8.72(1H,m),8.37−8.35(1H,m),7.54−7.48(1H,m),7.27−7.24(1H,m),7.09−7.03(1H,m),3.77(3H,d),2.93(2H,q),1.28(3H,t).
本縮合複素環化合物78
1H−NMR(CDCl3)δ:8.79−8.76(1H,m),8.35−8.32(1H,m),8.03(1H,d),7.87−7.80(1H,m),7.43(1H,t),3.84(3H,d),3.51−3.40(1H,m),3.13−3.02(1H,m),1.33(3H,t).
本縮合複素環化合物79
1H−NMR(CDCl3)δ:8.77−8.75(1H,m),8.32−8.30(1H,m),8.07−8.04(1H,m),7.86−7.80(1H,m),7.62−7.57(1H,m),3.76(3H,s),3.69−3.58(1H,m),3.41−3.31(1H,m),1.29(3H,t).
本縮合複素環化合物80
1H−NMR(CDCl3)δ:8.71−8.69(1H,m),8.31−8.30(1H,m),7.35−7.31(2H,m),7.19−7.15(1H,m),3.76(3H,s),2.85(2H,q),2.46(3H,s),1.22(3H,t).
本縮合複素環化合物81
1H−NMR(CDCl3)δ:8.74−8.73(1H,m),8.30−8.28(1H,m),8.06−8.05(1H,m),7.49−7.48(2H,m),3.88(3H,s),3.42−3.32(1H,m),3.00−2.90(1H,m),2.58(3H,s),1.32(3H,t).
本縮合複素環化合物82
1H−NMR(CDCl3)δ:8.74−8.72(1H,m),8.27−8.26(1H,m),8.03−8.02(1H,m),7.64−7.61(1H,m),7.44(1H,d),3.70(3H,s),3.41(2H,q),2.59(3H,s),1.26(3H,t).
本縮合複素環化合物83
1H−NMR(CDCl3)δ:8.75−8.74(1H,m),8.35−8.34(1H,m),7.66−7.65(1H,m),7.61−7.55(2H,m),3.80(3H,s),2.95(2H,q),1.28(3H,t).
本縮合複素環化合物84
1H−NMR(CDCl3)δ:8.80−8.78(1H,m),8.54−8.53(1H,m),8.35−8.34(1H,m),7.95−7.91(1H,m),7.79(1H,d),3.95(3H,s),3.52−3.41(1H,m),3.09−2.99(1H,m),1.33(3H,t).
本縮合複素環化合物85
1H−NMR(CDCl3)δ:8.78−8.76(1H,m),8.47−8.46(1H,m),8.31−8.30(1H,m),8.10−8.07(1H,m),7.76(1H,d),3.76(3H,s),3.48(2H,q),1.28(3H,t).
本縮合複素環化合物86
1H−NMR(CDCl3)δ:8.51(1H,d),8.19(1H,d),7.53−7.42(3H,m),7.38−7.29(1H,m),3.73(3H,s),2.97−2.83(4H,m),1.33−1.19(6H,m).
本縮合複素環化合物87
1H−NMR(CDCl3)δ:8.96(1H,d),8.54(1H,d),8.28−8.18(1H,m),7.91−7.80(2H,m),7.63−7.55(1H,m),3.74(3H,s),3.43(2H,q),3.24(2H,q),1.38(3H,t),1.26(3H,t).
本縮合複素環化合物88
1H−NMR(CDCl3)δ:8.53(1H,d),8.23(1H,d),7.54−7.42(3H,m),7.38−7.29(1H,m),3.74(3H,s),3.33−3.22(1H,m),2.87(2H,q),1.30(6H,d),1.24(3H,t).
本縮合複素環化合物89
1H−NMR(CDCl3)δ:8.92(1H,d),8.51(1H,d),8.22(1H,dd),7.92−7.81(2H,m),7.62(1H,dd),3.75(3H,s),3.43(2H,q),3.36−3.26(1H,m),1.38(6H,d),1.26(3H,t).
本縮合複素環化合物90
1H−NMR(CDCl3)δ:8.69−8.68(1H,m),8.33−8.31(1H,m),7.70−7.68(1H,m),7.62−7.55(2H,m),3.79(3H,s),2.97(2H,q),1.29(3H,t).
本縮合複素環化合物91
1H−NMR(CDCl3)δ:8.93(1H,d),8.52(1H,d),8.25(1H,d),7.78(1H,dd),7.67(1H,d),3.76(2H,q),1.40(3H,t).
本縮合複素環化合物92
1H−NMR(CDCl3)δ:8.89(1H,d),8.56(1H,d),7.56−7.42(3H,m),7.39−7.33(1H,m),3.77(3H,s),2.89(2H,q),1.25(3H,t).
本縮合複素環化合物93
1H−NMR(CDCl3)δ:8.93(1H,d),8.53(1H,d),8.26(1H,dd),7.84(1H,td),7.71(1H,td),7.60(1H,dd),3.89(3H,s),3.42−3.32(1H,m),3.05−2.96(1H,m),1.31(3H,t).
本縮合複素環化合物94
1H−NMR(CDCl3)δ:8.91(1H,d),8.50(1H,d),8.23(1H,dd),7.87−7.80(2H,m),7.56(1H,dd),3.71(3H,s),3.45(2H,q),1.26(3H,t).
本縮合複素環化合物95
1H−NMR(CDCl3)δ:8.72−8.70(1H,m),8.51−8.49(1H,m),8.29−8.27(1H,m),8.13−8.09(1H,m),7.74−7.71(1H,m),3.74(3H,s),3.49(2H,q),1.29(3H,t).
本縮合複素環化合物96
1H−NMR(CDCl3)δ:8.09(1H,s),7.59−7.42(5H,m),7.37−7.31(1H,m),3.69(3H,s),2.85(2H,q),1.23(3H,t).
本縮合複素環化合物97
1H−NMR(CDCl3)δ:8.22(1H,d),8.07(1H,s),7.80(1H,t),7.67(1H,t),7.62−7.52(3H,m),3.79(3H,s),3.37−3.26(1H,m),3.01−2.89(1H,m),1.27(3H,t).
本縮合複素環化合物98
1H−NMR(CDCl3)δ:8.20−8.18(1H,m),8.06(1H,s),7.82−7.74(2H,m),7.59−7.52(3H,m),3.61(3H,s),3.43(2H,brs),1.22(3H,t).
本縮合複素環化合物99
1H−NMR(CDCl3)δ:8.65−8.64(1H,m),8.29−8.28(1H,m),7.35−7.31(2H,m),7.18−7.15(1H,m),3.76(3H,s),2.86(2H,q),2.46(3H,s),1.23(3H,t).
本縮合複素環化合物100
1H−NMR(CDCl3)δ:8.69−8.68(1H,m),8.28−8.26(1H,m),8.07−8.05(1H,m),7.50−7.48(2H,m),3.89(3H,s),3.44−3.33(1H,m),3.01−2.92(1H,m),2.58(3H,s),1.32(3H,t).
本縮合複素環化合物101
1H−NMR(CDCl3)δ:8.68−8.66(1H,m),8.25−8.23(1H,m),8.04−8.02(1H,m),7.65−7.61(1H,m),7.45−7.42(1H,m),3.71(3H,s),3.47−3.38(2H,m),2.59(3H,s),1.26(3H,t).
本縮合複素環化合物102
1H−NMR(CDCl3)δ:8.81(1H,d),8.55(1H,d),8.07−8.00(1H,m),7.59−7.53(1H,m),7.52−7.45(1H,m),7.41−7.33(1H,m),2.99(2H,q),1.35(3H,t).
本縮合複素環化合物103
1H−NMR(CDCl3)δ:8.85(1H,d),8.59(1H,d),8.15(1H,d),7.75(1H,s),7.59(1H,d),3.05(2H,q),1.38(3H,t).
本縮合複素環化合物104
1H−NMR(CDCl3)δ:8.87(1H,d),8.50(1H,d),8.28−8.22(1H,m),7.85−7.76(2H,m),7.74−7.70(1H,m),3.74(2H,q),1.37(3H,t).
本縮合複素環化合物105
1H−NMR(CDCl3)δ:8.90(1H,s),8.57−8.49(2H,m),8.07(1H,d),7.88(1H,d),3.77(2H,q),1.40(3H,t).
本縮合複素環化合物106
1H−NMR(CDCl3)δ:8.93(1H,d),8.61(1H,d),7.45−7.34(3H,m),2.91(2H,q),1.27(3H,t).
本縮合複素環化合物107
1H−NMR(CDCl3)δ:8.95(1H,d),8.55(1H,d),8.14(1H,dd),7.86(1H,dd),7.73(1H,t),3.40(2H,q),1.28(3H,t).
本縮合複素環化合物108
1H−NMR(CDCl3)δ:8.74−8.72(1H,m),8.28−8.26(1H,m),8.05−8.03(1H,m),7.67−7.64(1H,m),7.46(1H,d),3.71(3H,s),3.41(2H,q),2.88(2H,q),1.37(3H,t),1.26(3H,t).
本縮合複素環化合物109
1H−NMR(CDCl3)δ:8.78−8.76(1H,m),8.46−8.44(1H,m),8.31−8.30(1H,m),8.09−8.05(1H,m),7.76(1H,d),3.75(3H,s),3.48(2H,q),1.27(3H,t).
本縮合複素環化合物110
1H−NMR(CDCl3)δ:8.69(1H,s),8.33(1H,s),8.25(1H,dd),8.21(1H,dd),7.73−7.58(2H,m),3.47−3.36(1H,m),3.13−3.01(1H,m),1.57−0.71(3H,m).
本縮合複素環化合物111
1H−NMR(CDCl3)δ:8.76(1H,d),8.51(1H,d),8.29(1H,d),8.10(1H,dd),7.74(1H,d),4.22(2H,q),3.55(2H,q),1.42(3H,t),1.30(3H,t).
本縮合複素環化合物112
1H−NMR(CDCl3)δ:8.13(1H,s),7.67(1H,s),7.62(1H,d),7.59−7.57(2H,m),7.52(1H,d),3.70(3H,s),2.92(2H,q),1.27(3H,t).
本縮合複素環化合物113
1H−NMR(CDCl3)δ:8.53(1H,s),8.10(1H,s),7.93(1H,d),7.75(1H,d),7.65(1H,d),7.57(1H,d),3.85(3H,s),3.52−3.41(1H,m),3.05−2.95(1H,m),1.32(3H,t).
本縮合複素環化合物114
1H−NMR(CDCl3)δ:8.48(1H,s),8.10−8.05(2H,m),7.74(1H,d),7.62(1H,d),7.53(1H,d),3.63(3H,s),3.47(2H,q),1.25(3H,t).
本縮合複素環化合物115
1H−NMR(CDCl3)δ:8.83−8.74(3H,m),8.54(1H,dd),8.31−8.29(1H,m),7.95−7.86(2H,m),7.68(1H,d),7.41−7.37(1H,m),3.75(3H,s),3.49(2H,q),1.30(3H,t).
本縮合複素環化合物116
1H−NMR(CDCl3)δ:8.74−8.72(1H,m),8.28−8.25(1H,m),8.07−8.05(1H,m),7.69−7.66(1H,m),7.47(1H,d),3.72(3H,s),3.41(2H,q),3.18−3.10(1H,m),1.37(6H,d),1.26(3H,t).
本縮合複素環化合物117
1H−NMR(CDCl3)δ:8.77−8.75(1H,m),8.38−8.36(1H,m),8.31−8.29(1H,m),8.02−7.99(1H,m),7.69(1H,d),6.85(1H,t),3.73(3H,s),3.54−3.33(2H,m),1.28(3H,t).
本縮合複素環化合物118
1H−NMR(CDCl3)δ:8.68−8.66(1H,m),8.31−8.30(1H,m),7.48(1H,d),7.29−7.26(1H,m),7.21−7.17(1H,m),3.80(3H,s),2.93(2H,q),1.29(3H,t).
本縮合複素環化合物119
1H−NMR(CDCl3)δ:8.72−8.71(1H,m),8.30−8.29(1H,m),8.14−8.12(1H,m),7.68(1H,d),7.55−7.51(1H,m),3.93(3H,s),3.50−3.40(1H,m),3.08−2.98(1H,m),1.33(3H,t).
本縮合複素環化合物120
1H−NMR(CDCl3)δ:8.71−8.69(1H,m),8.27−8.26(1H,m),8.09−8.07(1H,m),7.70−7.66(1H,m),7.62(1H,d),3.74(3H,s),3.47(2H,q),1.28(3H,t).
本縮合複素環化合物121
1H−NMR(CDCl3)δ:8.11(1H,s),7.67(1H,s),7.61−7.56(3H,m),7.53(1H,d),3.70(3H,s),2.93(2H,q),1.28(3H,t).
本縮合複素環化合物122
1H−NMR(CDCl3)δ:8.53(1H,d),8.09(1H,s),7.93(1H,dd),7.74(1H,d),7.64(1H,d),7.59(1H,d),3.85(3H,s),3.51−3.40(1H,m),3.06−2.97(1H,m),1.32(3H,t).
本縮合複素環化合物123
1H−NMR(CDCl3)δ:8.49(1H,d),8.10−8.04(2H,m),7.73(1H,d),7.60(1H,d),7.55(1H,d),3.64(3H,s),3.47(2H,q),1.25(3H,t).
本縮合複素環化合物124
1H−NMR(CDCl3)δ:9.06−9.04(1H,m),8.87(1H,d),8.77−8.75(1H,m),8.59(1H,dd),8.31−8.30(1H,m),8.14−8.11(1H,m),8.07−8.04(1H,m),7.72(1H,d),3.76(3H,s),3.51(2H,q),1.31(3H,t).
本縮合複素環化合物125
1H−NMR(CDCl3)δ:8.67−8.66(1H,m),8.40−8.39(1H,m),7.47(1H,d),7.29−7.26(1H,m),7.21−7.16(1H,m),3.78(3H,s),2.93(2H,q),1.29(3H,t).
本縮合複素環化合物126
1H−NMR(CDCl3)δ:8.71(1H,d),8.39(1H,d),8.13−8.12(1H,m),7.67(1H,d),7.54−7.50(1H,m),3.91(3H,s),3.49−3.39(1H,m),3.06−2.96(1H,m),1.33(3H,t).
本縮合複素環化合物127
1H−NMR(CDCl3)δ:8.70(1H,d),8.36(1H,d),8.09−8.07(1H,m),7.70−7.66(1H,m),7.62(1H,d),3.72(3H,s),3.46(2H,q),1.28(3H,t).
本縮合複素環化合物128
H−NMR(CDCl)δ:8.53(1H,s),8.19−8.13(2H,m),8.07(1H,dd),7.77(1H,dd),7.69(1H,d),3.91(2H,q),1.44(3H,t).
本縮合複素環化合物129
H−NMR(CDCl)δ:8.54(1H,s),8.33(1H,s),8.17(1H,d),8.10(1H,d),7.89(2H,s),3.91(2H,q),1.45(3H,t).
Hereinafter, 1H-NMR data of the present condensed heterocyclic compounds described in Table 3 and Table 4 are shown.
The present condensed heterocyclic compound 66
1H-NMR (CDCl3) δ: 8.51 (1H, s), 8.22 (1H, s), 7.55-7.50 (2H, m), 7.47-7.43 (1H, m ), 7.38-7.32 (1H, m), 5.81 (1H, dq), 3.76 (3H, s), 2.88 (2H, q), 1.24 (3H, t) .
The present condensed heterocyclic compound 67
1H-NMR (CDCl3) δ: 8.55 (1H, d), 8.26 (1H, d), 8.21 (1H, d), 7.83 (1H, t), 7.69 (1H, t), 7.60 (1H, d), 5.84 (1H, dq), 3.88 (3H, s), 3.42-3.30 (1H, m), 3.03-2.91. (1H, m), 1.33-1.25 (3H, m).
This condensed heterocyclic compound 68
1H-NMR (CDCl3) δ: 8.53 (1H, s), 8.26-8.16 (2H, m), 7.88-7.78 (2H, m), 7.59-7.53 (1H, m), 5.82 (1H, dq), 3.70 (3H, s), 3.44 (2H, q), 1.26 (3H, t).
This condensed heterocyclic compound 69
1H-NMR (CDCl3) δ: 8.68 (1H, d), 8.29 (1H, d), 7.74-7.68 (1H, m), 7.49-7.40 (2H, m ), 3.73 (3H, s), 2.74 (2H, q), 1.06 (3H, t).
The present condensed heterocyclic compound 70
1H-NMR (CDCl3) δ: 8.64 (1H, s), 8.24 (1H, s), 7.65 (1H, d), 7.58 (1H, t), 7.39 (1H, d), 3.72 (3H, s), 3.63-3.47 (1H, m), 3.37-3.22 (1H, m), 1.38-1.30 (3H, m) .
The present condensed heterocyclic compound 71
1H-NMR (CDCl3) δ: 8.74-8.72 (1H, m), 8.33-8.32 (1H, m), 7.52-7.49 (1H, m), 7.47 -7.43 (2H, m), 3.79 (3H, s), 2.85 (2H, q), 1.23 (3H, t).
The present condensed heterocyclic compound 72
1H-NMR (CDCl3) δ: 8.78-8.76 (1H, m), 8.33-8.31 (1H, m), 8.20 (1H, d), 7.81-7.78 (1H, m), 7.60 (1H, d), 3.93 (3H, s), 3.42-3.32 (1H, m), 3.02-2.92 (1H, m), 1.31 (3H, t).
This condensed heterocyclic compound 73
1H-NMR (CDCl3) δ: 8.76-8.75 (1H, m), 8.29-8.28 (1H, m), 8.16 (1H, d), 7.80-7.77 (1H, m), 7.57 (1H, d), 3.75 (3H, s), 3.40 (2H, q), 1.26 (3H, t).
The present condensed heterocyclic compound 74
1H-NMR (CDCl3) δ: 8.74-8.72 (1H, m), 8.33-8.31 (1H, m), 7.51-7.45 (1H, m), 7.36 -7.31 (2H, m), 3.75 (3H, s), 2.78 (2H, q), 1.10 (3H, t).
This condensed heterocyclic compound 75
1H-NMR (CDCl3) δ: 8.73-8.71 (1H, m), 8.29-8.27 (1H, m), 7.70-7.64 (1H, m), 7.44 −7.38 (1H, m), 7.33 (1H, d), 3.81 (3H, s), 3.53-3.43 (1H, m), 3.42 to 3.31 (1H) , M), 1.33 (3H, t).
The present condensed heterocyclic compound 76
1H-NMR (CDCl3) δ: 8.73-8.72 (1H, m), 8.28-8.26 (1H, m), 7.84-7.78 (1H, m), 7.55 -7.49 (1H, m), 7.38-7.35 (1H, m), 3.77 (3H, s), 3.50-3.34 (2H, m), 1.34 (3H , T).
This condensed heterocyclic compound 77
1H-NMR (CDCl3) δ: 8.74-8.72 (1H, m), 8.37-8.35 (1H, m), 7.54-7.48 (1H, m), 7.27 -7.24 (1H, m), 7.09-7.03 (1H, m), 3.77 (3H, d), 2.93 (2H, q), 1.28 (3H, t).
The present condensed heterocyclic compound 78
1H-NMR (CDCl3) δ: 8.79-8.76 (1H, m), 8.35-8.32 (1H, m), 8.03 (1H, d), 7.87-7.80 (1H, m), 7.43 (1H, t), 3.84 (3H, d), 3.51-3.40 (1H, m), 3.13-3.02 (1H, m), 1.33 (3H, t).
This condensed heterocyclic compound 79
1H-NMR (CDCl3) δ: 8.77-8.75 (1H, m), 8.32-8.30 (1H, m), 8.07-8.04 (1H, m), 7.86 -7.80 (1H, m), 7.62-7.57 (1H, m), 3.76 (3H, s), 3.69-3.58 (1H, m), 3.41-3 .31 (1H, m), 1.29 (3H, t).
This condensed heterocyclic compound 80
1H-NMR (CDCl3) δ: 8.71-8.69 (1H, m), 8.31-8.30 (1H, m), 7.35-7.31 (2H, m), 7.19 -7.15 (1H, m), 3.76 (3H, s), 2.85 (2H, q), 2.46 (3H, s), 1.22 (3H, t).
This condensed heterocyclic compound 81
1H-NMR (CDCl3) δ: 8.74-8.73 (1H, m), 8.30-8.28 (1H, m), 8.06-8.05 (1H, m), 7.49 -7.48 (2H, m), 3.88 (3H, s), 3.42 -3.32 (1H, m), 3.00-2.90 (1H, m), 2.58 (3H) , S), 1.32 (3H, t).
This condensed heterocyclic compound 82
1H-NMR (CDCl3) δ: 8.74-8.72 (1H, m), 8.27-8.26 (1H, m), 8.03-8.02 (1H, m), 7.64 -7.61 (1H, m), 7.44 (1H, d), 3.70 (3H, s), 3.41 (2H, q), 2.59 (3H, s), 1.26 ( 3H, t).
This condensed heterocyclic compound 83
1H-NMR (CDCl3) δ: 8.75-8.74 (1H, m), 8.35-8.34 (1H, m), 7.66-7.65 (1H, m), 7.61 -7.55 (2H, m), 3.80 (3H, s), 2.95 (2H, q), 1.28 (3H, t).
This condensed heterocyclic compound 84
1H-NMR (CDCl3) δ: 8.80-8.78 (1H, m), 8.54-8.53 (1H, m), 8.35-8.34 (1H, m), 7.95 -7.91 (1H, m), 7.79 (1H, d), 3.95 (3H, s), 3.52-3.41 (1H, m), 3.09-2.99 (1H) , M), 1.33 (3H, t).
The present condensed heterocyclic compound 85
1H-NMR (CDCl3) δ: 8.78-8.76 (1H, m), 8.47-8.46 (1H, m), 8.31-8.30 (1H, m), 8.10 -8.07 (1H, m), 7.76 (1H, d), 3.76 (3H, s), 3.48 (2H, q), 1.28 (3H, t).
The present condensed heterocyclic compound 86
1H-NMR (CDCl3) δ: 8.51 (1H, d), 8.19 (1H, d), 7.53-7.42 (3H, m), 7.38-7.29 (1H, m ), 3.73 (3H, s), 2.97-2.83 (4H, m), 1.33-1.19 (6H, m).
The present condensed heterocyclic compound 87
1H-NMR (CDCl3) δ: 8.96 (1H, d), 8.54 (1H, d), 8.28-8.18 (1H, m), 7.91-7.80 (2H, m ), 7.63-7.55 (1H, m), 3.74 (3H, s), 3.43 (2H, q), 3.24 (2H, q), 1.38 (3H, t) , 1.26 (3H, t).
This condensed heterocyclic compound 88
1H-NMR (CDCl3) δ: 8.53 (1H, d), 8.23 (1H, d), 7.54-7.42 (3H, m), 7.38-7.29 (1H, m ), 3.74 (3H, s), 3.33-3.22 (1H, m), 2.87 (2H, q), 1.30 (6H, d), 1.24 (3H, t) .
This condensed heterocyclic compound 89
1H-NMR (CDCl3) δ: 8.92 (1H, d), 8.51 (1H, d), 8.22 (1H, dd), 7.92-7.81 (2H, m), 7. 62 (1H, dd), 3.75 (3H, s), 3.43 (2H, q), 3.36-3.26 (1H, m), 1.38 (6H, d), 1.26 (3H, t).
The present condensed heterocyclic compound 90
1H-NMR (CDCl3) δ: 8.69-8.68 (1H, m), 8.33-8.31 (1H, m), 7.70-7.68 (1H, m), 7.62 -7.55 (2H, m), 3.79 (3H, s), 2.97 (2H, q), 1.29 (3H, t).
The present condensed heterocyclic compound 91
1H-NMR (CDCl3) δ: 8.93 (1H, d), 8.52 (1H, d), 8.25 (1H, d), 7.78 (1H, dd), 7.67 (1H, d), 3.76 (2H, q), 1.40 (3H, t).
This condensed heterocyclic compound 92
1H-NMR (CDCl3) δ: 8.89 (1H, d), 8.56 (1H, d), 7.56-7.42 (3H, m), 7.39-7.33 (1H, m ), 3.77 (3H, s), 2.89 (2H, q), 1.25 (3H, t).
This condensed heterocyclic compound 93
1H-NMR (CDCl3) δ: 8.93 (1H, d), 8.53 (1H, d), 8.26 (1H, dd), 7.84 (1H, td), 7.71 (1H, td), 7.60 (1H, dd), 3.89 (3H, s), 3.42-3.32 (1H, m), 3.05-2.96 (1H, m), 1.31 (3H, t).
This condensed heterocyclic compound 94
1H-NMR (CDCl3) δ: 8.91 (1H, d), 8.50 (1H, d), 8.23 (1H, dd), 7.87-7.80 (2H, m), 7. 56 (1H, dd), 3.71 (3H, s), 3.45 (2H, q), 1.26 (3H, t).
This condensed heterocyclic compound 95
1H-NMR (CDCl3) δ: 8.72-8.70 (1H, m), 8.51-8.49 (1H, m), 8.29-8.27 (1H, m), 8.13 -8.09 (1H, m), 7.74-7.71 (1H, m), 3.74 (3H, s), 3.49 (2H, q), 1.29 (3H, t).
The present condensed heterocyclic compound 96
1H-NMR (CDCl3) δ: 8.09 (1H, s), 7.59-7.42 (5H, m), 7.37-7.31 (1H, m), 3.69 (3H, s) ), 2.85 (2H, q), 1.23 (3H, t).
This condensed heterocyclic compound 97
1H-NMR (CDCl3) δ: 8.22 (1H, d), 8.07 (1H, s), 7.80 (1H, t), 7.67 (1H, t), 7.62-7. 52 (3H, m), 3.79 (3H, s), 3.37-3.26 (1H, m), 3.01-2.89 (1H, m), 1.27 (3H, t) .
This condensed heterocyclic compound 98
1H-NMR (CDCl3) δ: 8.20-8.18 (1H, m), 8.06 (1H, s), 7.82-7.74 (2H, m), 7.59-7.52 (3H, m), 3.61 (3H, s), 3.43 (2H, brs), 1.22 (3H, t).
This condensed heterocyclic compound 99
1H-NMR (CDCl3) δ: 8.65-8.64 (1H, m), 8.29-8.28 (1H, m), 7.35-7.31 (2H, m), 7.18 -7.15 (1H, m), 3.76 (3H, s), 2.86 (2H, q), 2.46 (3H, s), 1.23 (3H, t).
The present condensed heterocyclic compound 100
1H-NMR (CDCl3) δ: 8.69-8.68 (1H, m), 8.28-8.26 (1H, m), 8.07-8.05 (1H, m), 7.50 -7.48 (2H, m), 3.89 (3H, s), 3.44-3.33 (1H, m), 3.01-2.92 (1H, m), 2.58 (3H , S), 1.32 (3H, t).
This condensed heterocyclic compound 101
1H-NMR (CDCl3) δ: 8.68-8.66 (1H, m), 8.25-8.23 (1H, m), 8.04-8.02 (1H, m), 7.65 -7.61 (1H, m), 7.45-7.42 (1H, m), 3.71 (3H, s), 3.47-3.38 (2H, m), 2.59 (3H , S), 1.26 (3H, t).
The present condensed heterocyclic compound 102
1H-NMR (CDCl3) δ: 8.81 (1H, d), 8.55 (1H, d), 8.07-8.00 (1H, m), 7.59-7.53 (1H, m ), 7.52-7.45 (1H, m), 7.41-7.33 (1H, m), 2.99 (2H, q), 1.35 (3H, t).
This condensed heterocyclic compound 103
1H-NMR (CDCl3) δ: 8.85 (1H, d), 8.59 (1H, d), 8.15 (1H, d), 7.75 (1H, s), 7.59 (1H, d), 3.05 (2H, q), 1.38 (3H, t).
The condensed heterocyclic compound 104
1H-NMR (CDCl3) δ: 8.87 (1H, d), 8.50 (1H, d), 8.28-8.22 (1H, m), 7.85-7.76 (2H, m ), 7.74-7.70 (1H, m), 3.74 (2H, q), 1.37 (3H, t).
The present condensed heterocyclic compound 105
1H-NMR (CDCl3) δ: 8.90 (1H, s), 8.57-8.49 (2H, m), 8.07 (1H, d), 7.88 (1H, d), 3. 77 (2H, q), 1.40 (3H, t).
This condensed heterocyclic compound 106
1H-NMR (CDCl3) δ: 8.93 (1H, d), 8.61 (1H, d), 7.45-7.34 (3H, m), 2.91 (2H, q), 1. 27 (3H, t).
The present condensed heterocyclic compound 107
1H-NMR (CDCl3) δ: 8.95 (1H, d), 8.55 (1H, d), 8.14 (1H, dd), 7.86 (1H, dd), 7.73 (1H, t), 3.40 (2H, q), 1.28 (3H, t).
The present condensed heterocyclic compound 108
1H-NMR (CDCl3) δ: 8.74-8.72 (1H, m), 8.28-8.26 (1H, m), 8.05-8.03 (1H, m), 7.67 −7.64 (1H, m), 7.46 (1H, d), 3.71 (3H, s), 3.41 (2H, q), 2.88 (2H, q), 1.37 ( 3H, t), 1.26 (3H, t).
The present condensed heterocyclic compound 109
1H-NMR (CDCl3) δ: 8.78-8.76 (1H, m), 8.46-8.44 (1H, m), 8.31-8.30 (1H, m), 8.09 -8.05 (1H, m), 7.76 (1H, d), 3.75 (3H, s), 3.48 (2H, q), 1.27 (3H, t).
The present condensed heterocyclic compound 110
1H-NMR (CDCl3) δ: 8.69 (1H, s), 8.33 (1H, s), 8.25 (1H, dd), 8.21 (1H, dd), 7.73-7. 58 (2H, m), 3.47-3.36 (1H, m), 3.13-3.01 (1H, m), 1.57-0.71 (3H, m).
This condensed heterocyclic compound 111
1H-NMR (CDCl3) δ: 8.76 (1H, d), 8.51 (1H, d), 8.29 (1H, d), 8.10 (1H, dd), 7.74 (1H, d), 4.22 (2H, q), 3.55 (2H, q), 1.42 (3H, t), 1.30 (3H, t).
This condensed heterocyclic compound 112
1H-NMR (CDCl3) δ: 8.13 (1H, s), 7.67 (1H, s), 7.62 (1H, d), 7.59-7.57 (2H, m), 7. 52 (1H, d), 3.70 (3H, s), 2.92 (2H, q), 1.27 (3H, t).
This condensed heterocyclic compound 113
1H-NMR (CDCl3) δ: 8.53 (1H, s), 8.10 (1H, s), 7.93 (1H, d), 7.75 (1H, d), 7.65 (1H, d), 7.57 (1H, d), 3.85 (3H, s), 3.52-3.41 (1H, m), 3.05-2.95 (1H, m), 1.32 (3H, t).
This condensed heterocyclic compound 114
1H-NMR (CDCl3) δ: 8.48 (1H, s), 8.10-8.05 (2H, m), 7.74 (1H, d), 7.62 (1H, d), 7. 53 (1H, d), 3.63 (3H, s), 3.47 (2H, q), 1.25 (3H, t).
This condensed heterocyclic compound 115
1H-NMR (CDCl3) δ: 8.83-8.74 (3H, m), 8.54 (1H, dd), 8.31-8.29 (1H, m), 7.95-7.86 (2H, m), 7.68 (1H, d), 7.41-7.37 (1H, m), 3.75 (3H, s), 3.49 (2H, q), 1.30 ( 3H, t).
The present condensed heterocyclic compound 116
1H-NMR (CDCl3) δ: 8.74-8.72 (1H, m), 8.28-8.25 (1H, m), 8.07-8.05 (1H, m), 7.69 -7.66 (1H, m), 7.47 (1H, d), 3.72 (3H, s), 3.41 (2H, q), 3.18-3.10 (1H, m), 1.37 (6H, d), 1.26 (3H, t).
The present condensed heterocyclic compound 117
1H-NMR (CDCl3) δ: 8.77-8.75 (1H, m), 8.38-8.36 (1H, m), 8.31-8.29 (1H, m), 8.02 -7.99 (1H, m), 7.69 (1H, d), 6.85 (1H, t), 3.73 (3H, s), 3.54-3.33 (2H, m), 1.28 (3H, t).
This condensed heterocyclic compound 118
1H-NMR (CDCl3) δ: 8.68-8.66 (1H, m), 8.31-8.30 (1H, m), 7.48 (1H, d), 7.29-7.26 (1H, m), 7.21-7.17 (1H, m), 3.80 (3H, s), 2.93 (2H, q), 1.29 (3H, t).
This condensed heterocyclic compound 119
1H-NMR (CDCl3) δ: 8.72-8.71 (1H, m), 8.30-8.29 (1H, m), 8.14-8.12 (1H, m), 7.68 (1H, d), 7.55-7.51 (1H, m), 3.93 (3H, s), 3.50-3.40 (1H, m), 3.08-2.98 (1H , M), 1.33 (3H, t).
The present condensed heterocyclic compound 120
1H-NMR (CDCl3) δ: 8.71-8.69 (1H, m), 8.27-8.26 (1H, m), 8.09-8.07 (1H, m), 7.70 −7.66 (1H, m), 7.62 (1H, d), 3.74 (3H, s), 3.47 (2H, q), 1.28 (3H, t).
This condensed heterocyclic compound 121
1H-NMR (CDCl3) δ: 8.11 (1H, s), 7.67 (1H, s), 7.61-7.56 (3H, m), 7.53 (1H, d), 3. 70 (3H, s), 2.93 (2H, q), 1.28 (3H, t).
The present condensed heterocyclic compound 122
1H-NMR (CDCl3) δ: 8.53 (1H, d), 8.09 (1H, s), 7.93 (1H, dd), 7.74 (1H, d), 7.64 (1H, d), 7.59 (1H, d), 3.85 (3H, s), 3.51-3.40 (1H, m), 3.06-2.97 (1H, m), 1.32 (3H, t).
This condensed heterocyclic compound 123
1H-NMR (CDCl3) δ: 8.49 (1H, d), 8.10-8.04 (2H, m), 7.73 (1H, d), 7.60 (1H, d), 7. 55 (1H, d), 3.64 (3H, s), 3.47 (2H, q), 1.25 (3H, t).
The condensed heterocyclic compound 124
1H-NMR (CDCl3) δ: 9.06-9.04 (1H, m), 8.87 (1H, d), 8.77-8.75 (1H, m), 8.59 (1H, dd ), 8.31-8.30 (1H, m), 8.14-8.11 (1H, m), 8.07-8.04 (1H, m), 7.72 (1H, d), 3.76 (3H, s), 3.51 (2H, q), 1.31 (3H, t).
This condensed heterocyclic compound 125
1H-NMR (CDCl3) δ: 8.67-8.66 (1H, m), 8.40-8.39 (1H, m), 7.47 (1H, d), 7.29-7.26 (1H, m), 7.21-7.16 (1H, m), 3.78 (3H, s), 2.93 (2H, q), 1.29 (3H, t).
The present condensed heterocyclic compound 126
1H-NMR (CDCl3) δ: 8.71 (1H, d), 8.39 (1H, d), 8.13-8.12 (1H, m), 7.67 (1H, d), 7. 54-7.50 (1H, m), 3.91 (3H, s), 3.49-3.39 (1H, m), 3.06-2.96 (1H, m), 1.33 ( 3H, t).
The present condensed heterocyclic compound 127
1H-NMR (CDCl3) δ: 8.70 (1H, d), 8.36 (1H, d), 8.09-8.07 (1H, m), 7.70-7.66 (1H, m ), 7.62 (1H, d), 3.72 (3H, s), 3.46 (2H, q), 1.28 (3H, t).
This condensed heterocyclic compound 128
1 H-NMR (CDCl 3 ) δ: 8.53 (1H, s), 8.19-8.13 (2H, m), 8.07 (1H, dd), 7.77 (1H, dd), 7.69 (1H, d), 3.91 (2H, q), 1.44 (3H, t).
The present condensed heterocyclic compound 129
1 H-NMR (CDCl 3 ) δ: 8.54 (1H, s), 8.33 (1H, s), 8.17 (1H, d), 8.10 (1H, d), 7.89 ( 2H, s), 3.91 (2H, q), 1.45 (3H, t).
 次に、製剤例を示す。 Next, formulation examples are shown.
製剤例1
 本縮合複素環化合物1~131のうち1種を20部、ホワイトカーボンとポリオキシエチレンアルキルエーテルサルフェートアンモニウム塩との混合物(重量割合1:1)35部並びに水を混合し全量を100部とし、湿式粉砕法で微粉砕することにより、各々の製剤を得る。
Formulation Example 1
20 parts of one of the condensed heterocyclic compounds 1-131, 35 parts of a mixture of white carbon and polyoxyethylene alkyl ether sulfate ammonium salt (weight ratio 1: 1) and water are mixed to make a total amount of 100 parts. Each preparation is obtained by finely pulverizing by a wet pulverization method.
製剤例2
 本縮合複素環化合物1~131のうち1種を40部、ソルビタントリオレエート1.5部、並びにポリビニルアルコール2部を含む水溶液28部を混合し、湿式粉砕法で微粉砕した後、この中にキサンタンガム0.05部及びアルミニウムマグネシウムシリケート0.1部を含む水溶液を加え全量を90部とし、さらにプロピレングリコール10部を加えて攪拌混合し、各々の製剤を得る。
Formulation Example 2
After mixing 40 parts of this condensed heterocyclic compound 1-131, 1.5 parts of sorbitan trioleate and 28 parts of an aqueous solution containing 2 parts of polyvinyl alcohol, and finely pulverizing them by a wet pulverization method, An aqueous solution containing 0.05 part of xanthan gum and 0.1 part of aluminum magnesium silicate is added to make a total amount of 90 parts, and further 10 parts of propylene glycol is added and mixed by stirring to obtain each preparation.
製剤例3
 本縮合複素環化合物1~131のうち1種を10部、リグニンスルホン酸カルシウム3部、ラウリル硫酸ナトリウム2部、並びに合成含水酸化珪素残部をよく粉砕混合することにより、各々の水和剤100部を得る。
Formulation Example 3
By thoroughly pulverizing and mixing 10 parts of one of the condensed heterocyclic compounds 1-131, 3 parts of calcium lignin sulfonate, 2 parts of sodium lauryl sulfate, and the remainder of the synthetic silicon hydroxide, 100 parts of each wettable powder Get.
 次に本縮合複素環化合物の植物種子への適用例を示す。 Next, application examples of the present condensed heterocyclic compound to plant seeds will be shown.
 適用例1
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれソルガム乾燥種子100kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて200ml塗沫処理することにより、各処理種子を得る。
Application example 1
Each flowable formulation prepared in Formulation Example 1 or 2 was subjected to 200 ml of smear treatment using a rotary seed treatment machine (seed dresser, manufactured by Hans-Ulrich Hege GmbH) for 100 kg of dried sorghum seeds, respectively. Obtain treated seeds.
 適用例2
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれトウモロコシ乾燥種子10kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて10ml塗沫処理することにより、各処理種子を得る。
Application example 2
Each of the flowable preparations prepared in Preparation Example 1 or 2 is subjected to 10 ml smearing treatment for each 10 kg of dried corn seed using a rotary seed processing machine (seed dresser, Hans-Ulrich Hege GmbH). Obtain treated seeds.
 適用例3
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれトウモロコシ乾燥種子10kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて40ml塗沫処理することにより、各処理種子を得る。
Application example 3
Each flowable preparation produced in Formulation Example 1 or 2 is subjected to 40 ml of smear treatment using a rotary seed treatment machine (seed dresser, manufactured by Hans-Ulrich Hege GmbH) for 10 kg of dried corn seeds, respectively. Obtain treated seeds.
 適用例4
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれトウモロコシ乾燥種子10kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて100ml塗沫処理することにより、各処理種子を得る。
Application example 4
Each flowable preparation produced in Formulation Example 1 or 2 is subjected to 100 ml smearing treatment for each 10 kg of dried corn seed using a rotary seed processing machine (seed dresser, Hans-Ulrich Hege GmbH). Obtain treated seeds.
 適用例5
 製剤例3にて作製した各水和剤を、トウモロコシ乾燥種子10kgに対し、50g粉衣処理することにより、処理種子を得る。
Application example 5
Each wettable powder prepared in Formulation Example 3 is treated with 50 g of powder for 10 kg of dried corn seed to obtain treated seeds.
 適用例6
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれダイズ乾燥種子10kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて20ml塗沫処理することにより、各処理種子を得る。
Application example 6
Each of the flowable preparations prepared in Preparation Example 1 or 2 was subjected to a 20 ml smearing treatment for each 10 kg of dried soybean seeds using a rotary seed processing machine (seed dresser, Hans-Ulrich Hege GmbH). Obtain treated seeds.
 適用例7
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれダイズ乾燥種子10kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて100ml沫処理することにより、各処理種子を得る。
Application example 7
Each of the flowable preparations prepared in Preparation Example 1 or 2 is treated with 100 ml of each seed by using a rotary seed treatment machine (seed dresser, manufactured by Hans-Ulrich Hege GmbH) on 10 kg of dried soybean seeds. Get seeds.
 適用例8
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれワタ乾燥種子10kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて50ml塗沫処理することにより、各処理種子を得る。
Application Example 8
Each flowable preparation prepared in Formulation Example 1 or 2 was subjected to 50 ml smearing treatment on a dry seed 10 kg using a rotary seed treatment machine (seed dresser, Hans-Ulrich Hege GmbH). Obtain treated seeds.
 適用例9
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれナタネ乾燥種子10kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて50ml塗沫処理することにより、各処理種子を得る。
Application Example 9
Each flowable preparation produced in Formulation Example 1 or 2 was subjected to 50 ml smearing treatment on a dry seed of rapeseed 10 kg using a rotary seed treatment machine (seed dresser, Hans-Ulrich Hege GmbH). Obtain treated seeds.
 適用例10
 製剤例1あるいは2にて作製した各フロアブル製剤を、それぞれナタネ乾燥種子10kgに対し、回転式種子処理機(シードドレッサー、Hans−Ulrich Hege GmbH製)を用いて10ml塗沫処理することにより、各処理種子を得る。
Application Example 10
Each of the flowable preparations prepared in Formulation Example 1 or 2 is subjected to 10 ml of smear treatment using a rotary seed treatment machine (seed dresser, manufactured by Hans-Ulrich Hege GmbH) for 10 kg of rapeseed dry seeds, respectively. Obtain treated seeds.
 次に、本発明方法の有害節足動物防除効力を試験例により示す。 Next, the harmful arthropod controlling effect of the method of the present invention will be shown by test examples.
試験例1
 本縮合複素環化合物3、31、39、41、42、46、48、51、56、58、64、69、72、74、78、83、91、97、104、105、107、108、109、120、127、および131を、所定濃度になるようにソルゲンTW−20(第一工業製薬製)を5%(W/V)含むアセトン(和光純薬工業製)で溶解し、試験用薬液を調製した。
 ダイコン種子(Raphanus sativas var.longipinnatus)9粒(合計重量約0.16g)を、2ml容ポリプロピレン製マイクロチューブ(アズワン製)に入れ、そこに上記試験用薬液を18μL加えたのち、攪拌機(商品名:VORTEX−GENIE2、Scientific industries製)でマイクロチューブ内の種子を振とう・撹拌した。種子全体に薬液を均一に行き渡らせたのち、種子を風乾させた。
 10gの培土(商品名:愛菜一号、片倉チッカリン製)を充填した90ml容プラスチックカップに水を5ml加え、そこに上記種子を3粒播種した。
 播種4日後に、1カップあたりコナガ3齢幼虫(Plutella xylostella)を10頭ずつ放飼し、ナイロンゴースで蓋をした。これを処理区と呼ぶ。
 一方、本縮合複素環化合物をソルゲンTW−20(第一工業製薬製)を5%(W/V)含むアセトン(和光純薬工業製)に溶解させなかったこと以外は、処理区と同様にダイコンを播種し、幼虫を放飼した後、蓋をした。これを無処理区と呼ぶ。
 放飼2日後に幼虫の生死を観察し、その観察結果から、式1)によって死虫率を算出した。なお、試験は2反復で行った。その平均値を表5、表6及び表7に示す。
 式1):死虫率(%)=(供試虫数−生存虫数)/供試虫数×100
Test example 1
This condensed heterocyclic compound 3, 31, 39, 41, 42, 46, 48, 51, 56, 58, 64, 69, 72, 74, 78, 83, 91, 97, 104, 105, 107, 108, 109 , 120, 127, and 131 are dissolved in acetone (manufactured by Wako Pure Chemical Industries) containing 5% (W / V) Sorgen TW-20 (Daiichi Kogyo Seiyaku Co., Ltd.) so as to have a predetermined concentration. Was prepared.
Nine radish seeds (Raphanus sativas var. Longipinnatus) (total weight of about 0.16 g) were placed in a 2 ml polypropylene microtube (manufactured by ASONE), and 18 μL of the above test chemical was added thereto, followed by a stirrer (trade name) : VORTEX-GENIE2, manufactured by Scientific industries), the seeds in the microtube were shaken and stirred. After the chemical solution was evenly distributed throughout the seeds, the seeds were air-dried.
5 ml of water was added to a 90 ml plastic cup filled with 10 g of cultivated soil (trade name: Aina Ichigo, manufactured by Katakura Chikkarin), and three seeds were seeded there.
Four days after sowing, ten third instar larvae (Plutella xylostella) were released per cup and covered with nylon goose. This is called a processing zone.
On the other hand, except that this fused heterocyclic compound was not dissolved in acetone (manufactured by Wako Pure Chemical Industries, Ltd.) containing 5% (W / V) of Sorgen TW-20 (Daiichi Kogyo Seiyaku) After seeding radish and releasing larvae, they were covered. This is called an untreated section.
Two days after release, larvae were observed for viability, and the mortality rate was calculated from the observation results using Equation 1). The test was repeated twice. The average values are shown in Table 5, Table 6 and Table 7.
Formula 1): Death rate (%) = (number of test insects−number of surviving insects) / number of test insects × 100
Figure JPOXMLDOC01-appb-T000148
Figure JPOXMLDOC01-appb-T000148
Figure JPOXMLDOC01-appb-T000149
Figure JPOXMLDOC01-appb-T000149
Figure JPOXMLDOC01-appb-T000150
Figure JPOXMLDOC01-appb-T000150
 本発明の有害節足動物の防除方法によれば、有害節足動物を防除することが可能となる。 According to the method for controlling harmful arthropods of the present invention, harmful arthropods can be controlled.

Claims (4)

  1. 式(1)
    Figure JPOXMLDOC01-appb-I000001
    [式中、
    A1は−NR6−、酸素原子又は硫黄原子を表し、
    A2は窒素原子又は=CH−を表し、
    R1、R2、R3及びR4は同一又は相異なり、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、群Zより選ばれる1個以上の原子もしくは基を有していてもよいフェニル基、群Zより選ばれる1個以上の原子もしくは基を有していてもよい6員複素環基、−OR7、−S(O)mR7、ハロゲン原子、又は水素原子を表し(但し、R1、R2、R3及びR4のうち、少なくとも2つは水素原子を表す。)、
    R5は、群Xより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、−OR7、−S(O)mR7、又はハロゲン原子を表し、
    R6は群Wより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、群Wより選ばれる1個以上の原子もしくは基を有していてもよいC3−C6脂環式炭化水素基又は水素原子を表し、
    R7は、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基又は水素原子を表し、
    mは0、1又は2を表し、nは0、1又は2を表す。
    ここで、−S(O)mR7において、mが1又は2の場合には、R7が水素原子を表すことはない。
    群X:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ヒドロキシ基及びハロゲン原子からなる群。
    群Z:1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ニトロ基及びハロゲン原子からなる群。
    群W:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、ハロゲン原子及びヒドロキシ基からなる群。]
    で示される化合物で植物種子を処理する有害節足動物の防除方法。
    Formula (1)
    Figure JPOXMLDOC01-appb-I000001
    [Where:
    A1 represents -NR6-, an oxygen atom or a sulfur atom,
    A2 represents a nitrogen atom or = CH-,
    R 1, R 2, R 3 and R 4 are the same or different and each have one or more atoms or groups selected from C1-C3 chain hydrocarbon group optionally having one or more halogen atoms and group Z An optionally substituted phenyl group, a 6-membered heterocyclic group optionally having one or more atoms or groups selected from group Z, -OR7, -S (O) mR7, a halogen atom, or a hydrogen atom; (However, at least two of R1, R2, R3 and R4 represent a hydrogen atom.),
    R5 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group X, -OR7, -S (O) mR7, or a halogen atom;
    R6 is a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group W, and C3 which may have one or more atoms or groups selected from group W. -C6 represents an alicyclic hydrocarbon group or a hydrogen atom,
    R7 represents a C1-C3 chain hydrocarbon group which may have one or more halogen atoms or a hydrogen atom,
    m represents 0, 1 or 2, and n represents 0, 1 or 2.
    Here, in -S (O) mR7, when m is 1 or 2, R7 does not represent a hydrogen atom.
    Group X: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms An optionally substituted C2-C3 alkynyloxy group, a C1-C3 alkylsulfanyl group optionally having one or more halogen atoms, a C1-C3 alkylsulfinyl optionally having one or more halogen atoms A group consisting of a group, a C1-C3 alkylsulfonyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom;
    Group Z: C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, C1-C3 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A C1-C3 alkylsulfanyl group optionally having one or more, a C1-C3 alkylsulfinyl group optionally having one or more halogen atoms, a C1-C3 optionally having one or more halogen atoms A group consisting of an alkylsulfonyl group, a cyano group, a nitro group and a halogen atom.
    Group W: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms A group consisting of a C2-C3 alkynyloxy group, a halogen atom and a hydroxy group, which may be ]
    A method for controlling harmful arthropods, which comprises treating plant seeds with a compound represented by
  2. 式(1)
    Figure JPOXMLDOC01-appb-I000002
    [式中、
    A1は−NR6−、酸素原子又は硫黄原子を表し、
    A2は窒素原子又は=CH−を表し、
    R1、R2、R3及びR4は同一又は相異なり、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、群Zより選ばれる1個以上の原子もしくは基を有していてもよいフェニル基、群Zより選ばれる1個以上の原子もしくは基を有していてもよい6員複素環基、−OR7、−S(O)mR7、ハロゲン原子、又は水素原子を表し(但し、R1、R2、R3及びR4のうち、少なくとも2つは水素原子を表す。)、
    R5は、群Xより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、−OR7、−S(O)mR7、又はハロゲン原子を表し、
    R6は群Wより選ばれる1個以上の原子もしくは基を有していてもよいC1−C3鎖式炭化水素基、群Wより選ばれる1個以上の原子もしくは基を有していてもよいC3−C6脂環式炭化水素基又は水素原子を表し、
    R7は、1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基又は水素原子を表し、
    mは0、1又は2を表し、nは0、1又は2を表す。ここで、−S(O)mR7において、mが1又は2の場合には、R7が水素原子を表すことはない。
    群X:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ヒドロキシ基及びハロゲン原子からなる群。
    群Z:1個以上のハロゲン原子を有していてもよいC1−C3鎖式炭化水素基、1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルファニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルフィニル基、1個以上のハロゲン原子を有していてもよいC1−C3アルキルスルホニル基、シアノ基、ニトロ基及びハロゲン原子からなる群。
    群W:1個以上のハロゲン原子を有していてもよいC1−C3アルコキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルケニルオキシ基、1個以上のハロゲン原子を有していてもよいC2−C3アルキニルオキシ基、ハロゲン原子及びヒドロキシ基からなる群。]で示される化合物で処理されてなる植物種子。
    Formula (1)
    Figure JPOXMLDOC01-appb-I000002
    [Where:
    A1 represents -NR6-, an oxygen atom or a sulfur atom,
    A2 represents a nitrogen atom or = CH-,
    R 1, R 2, R 3 and R 4 are the same or different and each have one or more atoms or groups selected from C1-C3 chain hydrocarbon group optionally having one or more halogen atoms and group Z An optionally substituted phenyl group, a 6-membered heterocyclic group optionally having one or more atoms or groups selected from group Z, -OR7, -S (O) mR7, a halogen atom, or a hydrogen atom; (However, at least two of R1, R2, R3 and R4 represent a hydrogen atom.),
    R5 represents a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group X, -OR7, -S (O) mR7, or a halogen atom;
    R6 is a C1-C3 chain hydrocarbon group which may have one or more atoms or groups selected from group W, and C3 which may have one or more atoms or groups selected from group W. -C6 represents an alicyclic hydrocarbon group or a hydrogen atom,
    R7 represents a C1-C3 chain hydrocarbon group which may have one or more halogen atoms or a hydrogen atom,
    m represents 0, 1 or 2, and n represents 0, 1 or 2. Here, in -S (O) mR7, when m is 1 or 2, R7 does not represent a hydrogen atom.
    Group X: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms An optionally substituted C2-C3 alkynyloxy group, a C1-C3 alkylsulfanyl group optionally having one or more halogen atoms, a C1-C3 alkylsulfinyl optionally having one or more halogen atoms A group consisting of a group, a C1-C3 alkylsulfonyl group optionally having one or more halogen atoms, a cyano group, a hydroxy group, and a halogen atom;
    Group Z: C1-C3 chain hydrocarbon group optionally having one or more halogen atoms, C1-C3 alkoxy group optionally having one or more halogen atoms, one or more halogen atoms A C1-C3 alkylsulfanyl group optionally having one or more, a C1-C3 alkylsulfinyl group optionally having one or more halogen atoms, a C1-C3 optionally having one or more halogen atoms A group consisting of an alkylsulfonyl group, a cyano group, a nitro group and a halogen atom.
    Group W: C1-C3 alkoxy group optionally having one or more halogen atoms, C2-C3 alkenyloxy group optionally having one or more halogen atoms, having one or more halogen atoms A group consisting of a C2-C3 alkynyloxy group, a halogen atom and a hydroxy group, which may be ] The plant seed processed by the compound shown by this.
  3. 植物種子10kgに対し、式(1)で示される化合物0.01~1000gを用いる請求項1に記載の有害節足動物の防除方法。 The method for controlling harmful arthropods according to claim 1, wherein 0.01 to 1000 g of the compound represented by the formula (1) is used per 10 kg of plant seeds.
  4. 植物種子が、トウモロコシ、ワタ、ダイズ、テンサイ、ナタネ、ダイコン又はイネの種子である請求項1又は3に記載の有害節足動物の防除方法。 The method for controlling harmful arthropods according to claim 1 or 3, wherein the plant seeds are seeds of corn, cotton, soybean, sugar beet, rapeseed, radish or rice.
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