WO2013149468A1

WO2013149468A1 - Method for manufacturing color filter, color filter, and display device

Info

Publication number: WO2013149468A1
Application number: PCT/CN2012/084475
Authority: WO
Inventors: 陆金波; 张卓; 赵明; 刘宸
Original assignee: 京东方科技集团股份有限公司
Priority date: 2012-04-01
Filing date: 2012-11-12
Publication date: 2013-10-10
Also published as: CN102866531A; CN102866531B

Abstract

A method for manufacturing a color filter, the color filter, and a display device. The manufacturing method comprises: forming a black array (2) on a substrate (1); coating a pixel resin material (3) onto the substrate (1) having formed thereon the black array (2), where the pixel resin material (3) has added therein a first solvent miscible with the pixel resin material (3); performing a first thermal treatment on the substrate (1) having coated thereon the pixel resin material (3), thus allowing for evaporation of the first solvent in the pixel resin material (3) to form pores (9); by using a mask having engraved thereon a first pattern, exposing the thermally treated substrate (1), and, after development and a second thermal treatment, forming a pattern of the pixel resin layer. This method for manufacturing the filter allows for simplified process for pore-forming in a pixel area of the color filter, thus reducing manufacturing costs.

Description

Color filter manufacturing method, color filter and display device

The present disclosure relates to the field of liquid crystal display, and more particularly to a method of fabricating a color filter, a color filter, and a display device. Background technique

In order to achieve higher transmittance and brightness of the color filter, the prior art is more commonly used in the manner of opening holes in the pixel region of the color filter. In the prior art, the opening technique is realized by using a mask plate in which a microporous pattern is drawn, and micropores are formed in the pixel resin layer (color resin layer) by an exposure and development process. Such a hole opening method has a complicated process, and a specific mask is required to realize the opening of the pixel region, which is costly. Summary of the invention

The technical problem to be solved by the present disclosure is to provide a method of fabricating a color filter, a color filter, and a display device to simplify the process of opening a pixel in a pixel region of a color filter, thereby reducing production cost.

To solve the above technical problem, the present disclosure provides the following technical solutions:

A method of manufacturing a color filter, comprising:

Forming a black matrix on the substrate;

Coating a pixel resin material on a substrate on which a black matrix is formed, wherein a first solvent capable of being compatible with the pixel resin material is added to the pixel resin material;

Performing a first heat treatment on the substrate coated with the pixel resin material to cause the first solvent in the pixel resin material to volatilize to form micropores;

The first heat-treated substrate is exposed by a patterned mask, and after development and a second heat treatment, a pattern of the pixel resin layer is formed.

The above manufacturing method, further comprising:

Forming a transparent conductive layer on the black matrix and the pixel resin layer, and forming a columnar spacer on the transparent conductive layer; or

A transparent protective layer is formed on the black matrix and the pixel resin layer, a transparent conductive layer is formed on the transparent protective layer, and a columnar spacer is formed on the transparent conductive layer. The above manufacturing method, wherein the boiling point of the first solvent is lower than a predetermined threshold.

The above manufacturing method, wherein the predetermined threshold is 70 °C.

The above preparation method, wherein the first solvent is ethanol, diethyl ether, pentane, acetone or chlorine, wherein the first heat treatment has a temperature of 90-100 ° C and a time of 3-5 minutes.

The above preparation method, wherein: the temperature of the second heat treatment is 150-250 ° C, and the time is 20-60 minutes.

A color filter comprising a substrate, a black matrix formed on the substrate, and a pixel resin layer, wherein the pixel resin layer is provided with micropores formed according to the above-described fabrication method.

A liquid crystal display panel comprising the above-described color filter.

A display device comprising the above liquid crystal display panel.

Compared with the prior art, the present disclosure forms micropores on the pixel resin layer by volatilization of a solvent in a pre-baking process by mixing a solvent capable of being compatible with the pixel resin material in the pixel resin material. The process of opening holes in the pixel area is simplified, thereby reducing production costs. DRAWINGS

In order to more clearly illustrate the technical solutions of the present disclosure or the prior art, the following description of the technical solutions provided in the present disclosure or the drawings used in the prior art description will be briefly introduced. Obviously, the drawings in the following description Only some of the specific embodiments of the technical solutions of the present disclosure are illustrated, and those skilled in the art can obtain other drawings according to the drawings without any creative work.

1 is a top plan view of a color filter in an embodiment of the present disclosure;

Figure 2 is a cross-sectional view taken along line A-A' of the color filter of Figure 1;

3 is a top view of a color filter that completes a black matrix pattern in an embodiment of the present disclosure;

4 is a cross-sectional view of a color filter in which a pixel resin material is coated in an embodiment of the present disclosure; FIG. 5 is a cross-sectional view of a color filter in which a pixel resin layer is completed in an embodiment of the present disclosure;

6 is a cross-sectional view of a color filter that completes a transparent protective layer in an embodiment of the present disclosure;

7 is a cross-sectional view of a color filter that completes a transparent conductive layer in an embodiment of the present disclosure; FIG. 8 is a flow chart of a method for fabricating a color filter according to an embodiment of the present disclosure. detailed description

The technical solutions in the embodiments of the present disclosure are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present disclosure. It is obvious that the described embodiments are only a part of the embodiments of the present disclosure, and not all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present disclosure without departing from the inventive scope are the scope of the disclosure.

Embodiments of the present disclosure provide a method of fabricating a color filter by mixing a solvent capable of being compatible with a pixel resin material in a pixel resin material, and forming a micropore on the pixel resin layer by volatilization of a solvent in a pre-baking process. . The method can be realized only by extending the pre-bake time in the pre-baking stage of the existing color filter production process, which simplifies the process of opening holes in the pixel area, thereby reducing the production cost.

1 and 2 illustrate the structure of a color filter formed in an embodiment of the present disclosure. The color filter includes: a substrate 1, a black matrix 2 formed on the substrate 1, a pixel resin layer formed in a pixel region surrounded by the black matrix 2 (including a red pixel resin layer 3, a green pixel resin layer 4, and a blue pixel resin layer 5), a transparent protective layer 6 formed on the black matrix 2 and the pixel resin layer, a transparent conductive layer 7 formed on the transparent protective layer 6, and a columnar spacer 8 formed on the transparent conductive layer 7. . The micropores 9 are formed in the pixel resin layer.

Referring to FIG. 8, a method for fabricating a color filter according to an embodiment of the present disclosure may include the following steps: Step 101: Form a black matrix on a substrate, the black matrix enclosing a pixel region;

The substrate may be a glass substrate or other transparent material substrate. As shown in FIG. 3, a layer of a black matrix material made of photoresist may be spin-coated or scraped on a glass substrate, and the substrate is exposed by a patterned mask, and then exposed. The substrate was developed to obtain a pattern of a black matrix. The black matrix pattern may have a thickness of 1-5 μm.

Step 102: dispersing a solvent capable of being compatible with the pixel resin material into the pixel resin material;

Preferably, the solvent is a low boiling solvent having a boiling point of less than 70 ° C. For example, ethanol, diethyl ether, pentane, acetone or chloroform may be used.

Step 103: coating a pixel resin material to which a solvent is added on a substrate on which a black matrix is formed; and a structure of a color filter coated with a pixel resin material as shown in FIG. Fig. 4 schematically shows a solvent 10 uniformly distributed in the pixel resin material 3.

Step 104: heat-treating the substrate coated with the pixel resin material to make the pixel resin material The solvent 10 dispersed in the material 3 is volatilized to form micropores 9;

This heat treatment is the pre-baking process in the photolithography process, except that the pre-bake time is appropriately extended to allow the solvent to be sufficiently volatilized. As shown in Fig. 5, the solvent 10 uniformly distributed in the pixel resin material 3 is volatilized by heat treatment, thereby forming micropores 9.

Since the solvent can be uniformly mixed in the pixel resin material, uniform micropores can be formed. Further, it is also possible to control the amount of the solvent, i.e., the concentration thereof, to control the amount of the micropores in accordance with the desired brightness, thereby controlling the brightness.

Wherein, the heat treatment temperature may be 90-100 ° C, and the time may be 3-5 min.

Step 105: exposing the heat-treated substrate with a mask patterned with a pattern, and developing and heat-treating to form a pattern of the pixel resin layer;

First, the substrate is exposed by using a mask patterned with a pattern, and then the exposed substrate is subjected to development and heat treatment (ie, a post-baking process) to cure the pixel resin layer to form a pixel resin layer containing micropores. Graphics (as shown in Figure 5).

Wherein, the heat treatment may have a temperature of 150-250 ° C and a time of 20-60 min. In addition, the above steps 103 to 105 can be repeated, and each time the steps 103 to 105 are performed, a pixel resin layer of one color is formed. For example: a red pixel resin layer may be first coated on the substrate, and a pattern of a red pixel resin layer is formed according to the above method; then, a green pixel resin layer is coated on the substrate, and a pattern of the green pixel resin layer is formed according to the above method; A blue pixel resin layer was coated on the substrate, and a pattern of a blue pixel resin layer was formed in accordance with the above method.

Step 106: forming a transparent protective layer 6 on the substrate of step 105;

The transparent protective layer 6 (shown in Fig. 6) may be formed by a coating, baking or the like process. Step 107: forming a transparent conductive layer 7 on the substrate of step 106;

The transparent conductive layer (as shown in Fig. 7) may be formed by deposition or electroplating, and the transparent conductive layer 7 may have a thickness of 500 to 2000 persons.

Step 108: Form a column spacer 8 on the substrate on which step 107 is completed.

The columnar spacer 8 may be formed by a photolithography process. Specifically, a columnar spacer layer made of photoresist is coated on the substrate on which step 107 is completed, and a columnar spacer is finally formed by an exposure and development process. The columnar spacer may have a cross-sectional diameter of 15-20 μm connected to the color filter, and the cross-sectional diameter of the hanging spacer may be 5-10 μm; the height of the column spacer may be 5-10μπι (as shown in Figure 2).

In addition, the above steps 106 and 107 can be selected according to specific circumstances. For example, when color When the transparent protective layer is not included in the color filter, step 106 may be omitted; when the transparent conductive layer is not included in the color filter, step 107 may be omitted.

The embodiment of the present disclosure further provides a liquid crystal display panel, the liquid crystal display panel includes an array substrate, a color filter provided by the above embodiments, and a liquid crystal filled between the array substrate and the color filter. Floor.

Embodiments of the present disclosure also provide a display device including the above liquid crystal display panel.

In summary, the embodiment of the present disclosure forms micropores on the pixel resin layer by volatilization of a solvent in a pre-baking process by mixing a solvent capable of being compatible with the pixel resin material in the pixel resin material. The process of opening holes in the pixel area is simplified, thereby reducing production costs.

The above embodiments are merely illustrative of the present invention and are not to be construed as limiting the scope of the invention, and various modifications and changes can be made without departing from the spirit and scope of the invention. Equivalent technical solutions are also within the scope of the invention, and the scope of the invention is defined by the claims.

Claims

Claim

A method of fabricating a color filter, comprising:

Forming a black matrix on the substrate;

2. The manufacturing method according to claim 1, further comprising:

A transparent conductive layer is formed on the black matrix and the pixel resin layer, and a columnar spacer is formed on the transparent conductive layer.

3. The method according to claim 1, further comprising:

A transparent protective layer is formed between the black matrix and the pixel resin layer and the transparent conductive layer.

4. The method according to claim 2 or 3, characterized in that:

The first solvent has a boiling point below a predetermined threshold,

The predetermined threshold is 70 °C.

The manufacturing method according to any one of claims 1 to 4, characterized in that:

The first solvent is ethanol, diethyl ether, pentane, acetone or chloroform.

The manufacturing method according to any one of claims 1 to 5, characterized in that:

The temperature of the first heat treatment is 90-100 ° C and the time is 3-5 minutes.

The manufacturing method according to any one of claims 1 to 6, wherein:

The second heat treatment has a temperature of 150 to 250 ° C and a time of 20 to 60 minutes.

A color filter comprising a substrate, a black matrix and a pixel resin layer formed on the substrate, wherein the pixel resin layer is provided with the method of claim 1-7 Micropores formed.

A liquid crystal display panel comprising the color filter of claim 8.

A display device comprising the liquid crystal display panel of claim 9.