WO2013144691A3 - Laser apparatus and extreme-ultraviolet light generation system using the same - Google Patents

Laser apparatus and extreme-ultraviolet light generation system using the same Download PDF

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Publication number
WO2013144691A3
WO2013144691A3 PCT/IB2013/000181 IB2013000181W WO2013144691A3 WO 2013144691 A3 WO2013144691 A3 WO 2013144691A3 IB 2013000181 W IB2013000181 W IB 2013000181W WO 2013144691 A3 WO2013144691 A3 WO 2013144691A3
Authority
WO
WIPO (PCT)
Prior art keywords
extreme
laser apparatus
same
ultraviolet light
generation system
Prior art date
Application number
PCT/IB2013/000181
Other languages
French (fr)
Other versions
WO2013144691A2 (en
Inventor
Osamu Wakabayashi
Krzysztof Nowak
Original Assignee
Gigaphoton Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2012271082A external-priority patent/JP2013214708A/en
Application filed by Gigaphoton Inc. filed Critical Gigaphoton Inc.
Publication of WO2013144691A2 publication Critical patent/WO2013144691A2/en
Publication of WO2013144691A3 publication Critical patent/WO2013144691A3/en
Priority to US14/455,701 priority Critical patent/US9407052B2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2316—Cascaded amplifiers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/023—Catoptric systems, e.g. image erecting and reversing system for extending or folding an optical path, e.g. delay lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

An amplifier PAκ including a plurality of discharge tubes and a MOPA laser apparatus including a master oscillator as a seed laser configured to output a pulsed laser beam, at least one of said amplifier PAκ comprising a plurality of discharge tubes provided on a designated path of the pulsed laser beam, and an optical system comprising mirrors arranged between said discharge tubes and/or said at least one amplifiers when more than one, to steer the seed laser beam so that it travels along the designed path.
PCT/IB2013/000181 2012-03-30 2013-02-13 Amplifier, laser apparatus, and extreme ultraviolet light generation system WO2013144691A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US14/455,701 US9407052B2 (en) 2012-03-30 2014-08-08 Amplifier, laser apparatus, and extreme ultraviolet light generation system

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201261618296P 2012-03-30 2012-03-30
US61/618,296 2012-03-30
JP2012-271082 2012-12-12
JP2012271082A JP2013214708A (en) 2012-03-30 2012-12-12 Laser device, laser system, and extreme ultraviolet light generation apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US14/455,701 Continuation US9407052B2 (en) 2012-03-30 2014-08-08 Amplifier, laser apparatus, and extreme ultraviolet light generation system

Publications (2)

Publication Number Publication Date
WO2013144691A2 WO2013144691A2 (en) 2013-10-03
WO2013144691A3 true WO2013144691A3 (en) 2014-02-06

Family

ID=49261343

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2013/000181 WO2013144691A2 (en) 2012-03-30 2013-02-13 Amplifier, laser apparatus, and extreme ultraviolet light generation system

Country Status (1)

Country Link
WO (1) WO2013144691A2 (en)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0732168A2 (en) * 1995-03-15 1996-09-18 Sumitomo Electric Industries, Limited Method and device for focusing laser beam
US5574328A (en) * 1993-12-07 1996-11-12 Nippondenso Co., Ltd Light source apparatus
US6173000B1 (en) * 1999-07-08 2001-01-09 R. Jeffrey Balla Oscillator and amplifier for dual discharge tube excimer laser
US6665327B1 (en) * 1996-10-30 2003-12-16 Trumpf Gmbh & Co. Gas laser device
US20080069157A1 (en) * 2006-08-29 2008-03-20 Tatsuya Ariga Driver laser for extreme ultra violet light source device
WO2008061516A1 (en) * 2006-11-25 2008-05-29 Trumpf Laser- Und Systemtechnik Gmbh Method and device for adjusting the beam diameter of a laser beam passing through an optical element by means of temperature changes
US20090232171A1 (en) * 2008-03-12 2009-09-17 Tamotsu Abe Laser system
WO2009136393A1 (en) * 2008-05-06 2009-11-12 Elbit Systems Ltd. Wide angle helmet mounted display system
US20090316746A1 (en) * 2008-06-12 2009-12-24 Nowak Krzysztof Slab type laser apparatus
US20100193710A1 (en) * 2008-10-16 2010-08-05 Osamu Wakabayashi Laser apparatus and extreme ultraviolet light source apparatus
WO2011115025A1 (en) * 2010-03-15 2011-09-22 Gigaphoton Inc. Regenerative amplifier, laser apparatus, and extreme ultraviolet light generation system

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5574328A (en) * 1993-12-07 1996-11-12 Nippondenso Co., Ltd Light source apparatus
EP0732168A2 (en) * 1995-03-15 1996-09-18 Sumitomo Electric Industries, Limited Method and device for focusing laser beam
US6665327B1 (en) * 1996-10-30 2003-12-16 Trumpf Gmbh & Co. Gas laser device
US6173000B1 (en) * 1999-07-08 2001-01-09 R. Jeffrey Balla Oscillator and amplifier for dual discharge tube excimer laser
US20080069157A1 (en) * 2006-08-29 2008-03-20 Tatsuya Ariga Driver laser for extreme ultra violet light source device
WO2008061516A1 (en) * 2006-11-25 2008-05-29 Trumpf Laser- Und Systemtechnik Gmbh Method and device for adjusting the beam diameter of a laser beam passing through an optical element by means of temperature changes
US20090232171A1 (en) * 2008-03-12 2009-09-17 Tamotsu Abe Laser system
WO2009136393A1 (en) * 2008-05-06 2009-11-12 Elbit Systems Ltd. Wide angle helmet mounted display system
US20090316746A1 (en) * 2008-06-12 2009-12-24 Nowak Krzysztof Slab type laser apparatus
US20100193710A1 (en) * 2008-10-16 2010-08-05 Osamu Wakabayashi Laser apparatus and extreme ultraviolet light source apparatus
WO2011115025A1 (en) * 2010-03-15 2011-09-22 Gigaphoton Inc. Regenerative amplifier, laser apparatus, and extreme ultraviolet light generation system

Also Published As

Publication number Publication date
WO2013144691A2 (en) 2013-10-03

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