WO2013141422A1 - Method for forming hard layer on titanium, and talloy having hard layer formed by same - Google Patents

Method for forming hard layer on titanium, and talloy having hard layer formed by same Download PDF

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WO2013141422A1
WO2013141422A1 PCT/KR2012/002146 KR2012002146W WO2013141422A1 WO 2013141422 A1 WO2013141422 A1 WO 2013141422A1 KR 2012002146 W KR2012002146 W KR 2012002146W WO 2013141422 A1 WO2013141422 A1 WO 2013141422A1
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titanium
hard layer
layer
present
coating
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PCT/KR2012/002146
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French (fr)
Korean (ko)
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이동근
이용태
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한국기계연구원
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Priority to US13/988,348 priority Critical patent/US20130248051A1/en
Priority to PCT/KR2012/002146 priority patent/WO2013141422A1/en
Priority to JP2015503083A priority patent/JP2015519470A/en
Publication of WO2013141422A1 publication Critical patent/WO2013141422A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/20Carburising
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/24Nitriding
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/28Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in one step
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/28Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases more than one element being applied in one step
    • C23C8/30Carbo-nitriding
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/80After-treatment

Definitions

  • the present invention relates to a method for forming a hard layer on the surface layer of titanium (pure titanium and titanium alloy), and more particularly, to a method for forming a hard layer having properties of continuously changing properties at low cost on the surface layer of titanium. It relates to titanium in which a hard layer is formed by the method.
  • titanium and titanium alloys are relatively lighter than other structural materials and are widely used in the military and aerospace industries where weight reduction is essential because of their high specific strength in the temperature range from cryogenic temperatures to 400 to 500 ° C.
  • titanium has excellent corrosion resistance and biocompatibility, most biomaterials to be inserted into the human body are used.
  • titanium is capable of coloring through anodization, its use has recently been expanded in civilian products requiring various color expressions.
  • the TiN film which has been actively studied among the coating materials for improving abrasion resistance, has excellent oxidation resistance, excellent surface roughness and ductility, and is beautiful in color due to its golden color, which is widely used not only for wear but also for corrosion resistance or decoration. to be.
  • TiN film has very large volume expansion (volume expansion rate of about 64%) when TiO 2 is formed through oxidation process, it forms a large compressive stress in the formed oxide layer and causes cracks in the film. Oxidation proceeds rapidly.
  • an oxynitride material containing oxygen such as TiN x O y may be used as the surface curing film.
  • the oxynitride coating material based on the ternary composition also has excellent hardness, electrical properties, abrasion resistance, and corrosion resistance similar to the TiN coating due to the chemical bonding of atoms in the lattice and the electrical structure of the oxynitride.
  • a method of forming a titanium oxynitride film having excellent properties such as TiN x O y on the surface of the titanium alloy, nitriding, carburizing, thermal spraying, physical vapor deposition (PVD) and chemical vapor deposition (CVD; Chemical Vapor Deposition) and the like.
  • PVD methods such as ion plating, cathode arc deposition, and reactive sputtering, and CVD methods using plasma are mainly considered.
  • the PVD process can be deposited at a lower temperature than the CVD process, minimizes the change of the structure at the interface between the titanium alloy surface and the coating layer, and can form a coating layer having excellent abrasion resistance, heat resistance, oxidation resistance, and corrosion resistance.
  • the adhesion between the coating layer and the titanium alloy base is weak, the coating equipment is expensive, and the formation of the coating layer takes a long time.
  • the CVD process has the advantage of easy control of the composition and coating thickness of the coating layer, but mainly due to the deposition process at a high temperature can cause a change in the structure of the coating layer and the titanium alloy in the mechanical properties and corrosion of the titanium alloy There are disadvantages that can have a bad effect.
  • the coating layer contains a lot of pores, so it is difficult to expect sufficient physical properties such as oxidation resistance, and the coating layer formed by PVD and CVD has less pores than the spray coating, but basically It is difficult to form a dense coating layer because it has considerable defects.
  • the over-layer coating is added to the processed part of the coating layer, when the thick coating layer is formed, the dimensional change before and after the coating is significant, the necessity of post-processing increases, which leads to an increase in the manufacturing cost of the component.
  • thermo-chemical treatment TCT
  • invasive elements such as oxygen, carbon and nitrogen from the surface of titanium.
  • TCT thermo-chemical treatment
  • another object of the present invention is to provide a titanium in which a hard layer in which an invasive element such as oxygen, carbon or nitrogen obtained by the above method has a concentration gradient from the surface thereof is formed.
  • the present invention provides a method for forming a hard layer on the surface layer of titanium, comprising the steps of: (a) injecting and evacuating titanium to a vacuum heat treatment apparatus to maintain an air pressure of 10 -4 torr or less; (b) a pretreatment step of heating the titanium at 730 to 800 ° C. for 10 minutes to 5 hours to remove an oxide film formed on the surface of the titanium; (c) injecting at least one gas selected from nitrogen, oxygen, and carbon into the vacuum heat treatment apparatus and heating the titanium at 740 to 950 ° C. for 30 minutes to 20 hours, thereby gradient of concentration of the gas on the surface of the titanium alloy. Curing step to form a hard layer having a; And (d) cooling the titanium.
  • the air pressure of step (a) may be 5 ⁇ 10 -5 torr or less.
  • step (b) may be performed at 740 ⁇ 780 °C.
  • step (b) may be performed for 10 minutes to 1 hour.
  • the temperature of the step (c) may be higher than the temperature of the step (b).
  • the step (c) may be performed at 740 ⁇ 850 °C.
  • step (c) may be performed for 30 minutes to 5 hours.
  • step (d) may be cooled by a step cooling method.
  • step (d) may include an aging step of maintaining for 30 minutes to 30 hours at 500 ⁇ 800 °C.
  • the step (d) by using an over-layer coating method such as CVD method or PVD method, additionally forming a coating layer for the purpose of rubbing, color expression, etc. on the surface of titanium. It may include the step.
  • an over-layer coating method such as CVD method or PVD method
  • the titanium may be pure titanium or a titanium alloy.
  • the present invention also provides titanium and its alloys with hard layers formed by the method described above and various components utilizing this technology.
  • the oxide film removal of the titanium alloy surface, the formation of the inclined coating layer, etc. can be performed in one unit, so that the process is simplified and an excellent inclined hard layer can be obtained at low cost.
  • the hard layer formed according to the present invention is because the concentration gradient is formed from the surface of the intrusion-type element from the surface of the base material is a continuous change of physical properties between the hard layer and the base material, the peeling phenomenon at the interface does not occur.
  • the hard layer formed according to the present invention is a penetration type element is introduced into the base material, there is almost no dimensional change, so that subsequent processing is not necessary after the hardening treatment and thus economical.
  • the hard layer formed according to the present invention is an intrusion type element is injected into the crystal lattice of the base material, the defects of the thermal spray coating, PVD or CVD coating layer does not occur.
  • Example 1 is a schematic view of a cured layer forming process according to Example 1 of the present invention.
  • Figure 3 is a photograph of the observation of the surface of the hard layer formed according to Examples 1, 2 and Comparative Examples of the present invention with an optical microscope.
  • Figure 4 is a photograph of the cross-section of the hard layer and the PVD coating layer formed according to Examples 1, 2 and Comparative Examples of the present invention with a scanning electron microscope.
  • Figure 5 shows the results of measuring the surface roughness of the hard layer and the PVD coating layer formed according to Examples 1, 2 and Comparative Examples of the present invention.
  • Figure 6 shows the results of measuring the friction characteristics of the hard layer formed according to Examples 1, 2 and Comparative Examples of the present invention.
  • Figure 7 shows the results of measuring the cross-sectional hardness of the hard layer formed according to Examples 1, 2 and Comparative Examples of the present invention.
  • the inventors of the present invention found that when the surface of pure titanium and titanium alloys is coated with an over-layer coating method such as thermal spray coating, PVD, or CVD, a bilayer having a significant difference in physical properties at the interface between the titanium alloy base and the coating layer is essential. It is not only difficult to prevent the hard film from being peeled off due to external force, and the dimensional change due to the overlayer coating is inevitable, resulting in inevitable subsequent processing.Inner layers such as carburizing and sedimentation are noted. Attention was paid to the (inner-layer) coating method.
  • an over-layer coating method such as thermal spray coating, PVD, or CVD
  • the present inventors studied various inner layer coating methods, and as a result, several nanometer-thick oxide films formed on the surface of titanium when maintained at a high vacuum of 10 -4 torr or more in a specific temperature range in a vacuum chamber capable of heat treatment It can be confirmed that when the temperature range and gas pressure are maintained to facilitate the penetration of invasive elements such as nitrogen, oxygen, or carbon, in a short time, a hard layer of excellent physical properties having an inclination function can be obtained even in a short time.
  • the present invention has been reached.
  • the hard layer formed according to the present invention can prevent the separation between the coating layer and the matrix surface and the occurrence of cracking due to the external influence that may occur in the existing over-layer coating, and in particular, using a multi-step thermal diffusion surface hardening process technology.
  • the surface hardening treatment can be performed continuously without separately performing processes such as removing the oxide film and suppressing the formation of the oxide film, thereby enabling economical advantageous surface hardening while having optimal physical properties.
  • the method of forming a titanium hard layer comprises the steps of: (a) adding titanium to a vacuum heat treatment apparatus and evacuating to maintain an air pressure of 10 ⁇ 4 torr or less; (b) a pretreatment step of heating the titanium at 730 to 800 ° C. for 10 minutes to 5 hours to remove an oxide film formed on the surface of the titanium; (c) after removing the oxide film, injecting at least one gas selected from nitrogen, oxygen, and carbon into the heat treatment apparatus and heating the titanium at 740 to 950 ° C. for 30 minutes to 20 hours, thereby hardening the surface of the titanium alloy. Allowing a layer to be formed; And (d) cooling the titanium.
  • 'titanium' is used in the sense containing pure titanium and titanium alloy.
  • the degree of vacuum of the heat treatment apparatus should be lower than 1 ⁇ 10 -4 torr. If the pressure is 1 ⁇ 10 -4 torr or lower, the oxide film formed on the surface of titanium in step (b) cannot be removed cleanly. It is because the effect of the hardening process to do is not enough, It is more preferable to maintain so that the atmospheric pressure of a heat processing apparatus may be 5 * 10 ⁇ -5> torr or less.
  • the oxide film removing step should be carried out at 730 ⁇ 800 °C, if less than 730 °C the removal of the oxide film is not made sufficiently, the subsequent penetration process of intrusion type gas is long, if it exceeds 800 °C microhistological And a disadvantage in mechanical properties. More preferably, it is carried out at a temperature range of 740 °C to 780 °C.
  • the removal time in the oxide film removing step is more preferably 10 minutes to 1 hour, if less than 10 minutes is not sufficient oxide film removal, more than 1 hour is disadvantageous in terms of economic cost and mechanical properties Because.
  • the curing step may be carried out continuously with the removal of the oxide film, or may be performed by a two-stage heat treatment method performed by raising the temperature above the oxide film removal temperature, which is more preferable because the two-stage heat treatment method may shorten the curing time. . That is, the surface hardening treatment time can be considerably shortened by introducing a pretreatment process before performing the hardening heat treatment with the intruded gas element.
  • the temperature of the curing step should be carried out at 740 °C or more and can be carried out up to 850 °C depending on the depth and the required hardness of the cured layer. More preferably, it is performed at 780 ° C. or higher, which is higher than the oxide film removing step.
  • the curing treatment time is preferably 30 minutes to 20 hours, but less than 30 minutes is not enough to penetrate invasive elements such as oxygen, nitrogen, carbon, etc., and if it exceeds 20 hours, the grain size grows microscopically. This is because it is disadvantageous in terms of declining mechanical properties and economic cost.
  • the gas used for the hardening treatment is an element that can easily penetrate into the titanium crystal lattice, carbon, nitrogen, oxygen gas or a mixture thereof may be used.
  • the cooling step may be a method of furnace cooling or air cooling in the heat treatment furnace, during the cooling or air cooling, at 500 ⁇ 800 °C to evenly form the structure of the hard layer to be formed and to form a thick hard layer on the surface of the hard layer It is also possible to use a step cooling method including an aging step for 30 minutes to 30 hours.
  • the surface hardening specimen used in Example 1 of the present invention used commercially pure titanium (Gr. 2 material) having a width, length, and height of 30 mm ⁇ 25 mm ⁇ 2 mm, and the chemical composition of Gr.2 material suggested by the manufacturer. Is shown in Table 1 below.
  • the prepared titanium specimen was immersed in an acetone solution, ultrasonically cleaned and dried, and then surface hardened in the same manner as shown in FIG. 1.
  • the specimen was charged in a chamber of a gas controlled vacuum furnace (GCVF), and then decompressed to 5 ⁇ 10 ⁇ 6 torr using a vacuum pump. Subsequently, the temperature of the heat treatment furnace was raised to 750 ° C. and maintained for 30 minutes, so that the titanium oxide film having a thickness of about 10 ⁇ naturally formed on the surface of the titanium specimen could be removed by pyrolysis.
  • GCVF gas controlled vacuum furnace
  • the oxide film was removed in this manner, 100 ccm of a mixed gas of oxygen and nitrogen was injected, and the partial pressure in the chamber was adjusted so that the pressure in the chamber was maintained at 5 ⁇ 10 ⁇ 1 torr. Then, the temperature of the heat treatment furnace was raised to 800 ° C. and maintained for 3 hours to allow the injected oxygen and nitrogen elements to penetrate into the interior from the surface of the titanium specimen. After the hardening treatment was completed as described above, the titanium specimen was cooled by air cooling or furnace cooling.
  • a TiN coating layer was formed by PVD.
  • the PVD coating layer was formed using a Ti target in a nitrogen gas atmosphere at 150 ° C. for 10 minutes, and the thickness of the PVD coating layer formed was 2.1 ⁇ m.
  • Example 2 of the present invention after the specimen pretreatment and curing treatment under the same conditions using the same specimen as in Example 1 of the present invention, as shown in Figure 2, in the cooling step, homogenization of the microstructure and In order to maximize the strength and increase the thickness of the surface hard layer, an aging treatment held at 700 ° C. for 1 hour is performed, and then the hard layer is removed by air cooling (ie, step cooling). Formed.
  • the TiN coating layer was formed by PVD in order to lower the roughness of the titanium surface and to realize uniform color.
  • the PVD coating layer was formed using a Ti target in a nitrogen gas atmosphere at 150 ° C. for 10 minutes as in Example 1, and the thickness of the formed PVD coating layer was 2.1 ⁇ m.
  • Comparative Example is a TiN coating layer formed on the surface of the titanium specimen prepared in the same manner as Example 1 of the present invention by using a PVD method, the TiN coating layer is formed by using a Ti target in a nitrogen gas atmosphere at 150 °C for 10 minutes At this time, the thickness of the TiN coating layer formed was 3.4 ⁇ m.
  • the surface shape, cross-sectional shape, cross-sectional hardness, surface roughness, surface wear characteristics, and the like of the surface hard layer formed as described above were analyzed.
  • the shape of the surface was observed through an optical microscope, and the shape of the cross section was observed by a scanning electron microscope.
  • the surface roughness was measured by fixing the scan length to 9000 ⁇ m using a surface profiler (Model TENCOR P-11).
  • wear characteristics were measured using a ball on disk wear tester (J &L; Model JLTB-02 tribometer). At this time, as a counterpart, a stainless steel ball having a diameter of 1 mm was used. The friction coefficient of each specimen was measured under friction conditions of rotation radius 3mm, rotation speed 100rpm and load 1N, and the friction behavior was observed.
  • the cross-sectional hardness measured the cross-sectional hardness of the hard layer after cutting and grinding the specimen to the inclined surface. At this time, the hardness was measured from the surface of the specimen toward the matrix center while maintaining the load at 100 g for 10 seconds using a micro-Vickers hardness tester (FUTURE-TECH; Model FM-700).
  • FIG 3 is a photograph of the surface of the titanium specimen in which the hard layer was formed according to Examples 1, 2 and Comparative Examples of the present invention by an optical microscope.
  • the cross-sectional shape of the three surface-hardened specimens was observed using a scanning electron microscope.
  • the cross section was polished to an inclined surface and the diffusion hard layer was observed in FIG. 4. As shown in Figure 4, all three specimens can confirm the coating layer interface.
  • the entire surface hard layer is formed to have a thick surface hard layer of about 84 ⁇ m, including a TiN thin film layer of about 2.1 ⁇ m formed by PVD.
  • the thickest surface hard layer is formed to have a thickness of about 99 ⁇ m, including both the TiN thin film layer formed by PVD and the hard layer formed by the TCT process. .
  • the diffusion of the invasive element is promoted, and the boundary of the diffusion layer is changed obliquely, thereby preventing the thin film separation phenomenon during the abrasion test. For this reason, as shown below, the specimen according to Example 2 of the present invention exhibits the best surface friction characteristics (FIG. 6C).
  • the hard layer formed according to Example 2 Ra has a value of 0.14 ⁇ m.
  • the surface roughness is similar without significant change compared to the case where the surface hardening treatment is not performed. It can be seen that is almost similar to the comparative example in which PVD was formed directly on the titanium base material. That is, it can be seen that even if the titanium base material, or its hardening treatment or hardening treatment, the aging treatment does not significantly affect the surface roughness of the final PVD coating layer.
  • Figure 6 shows the surface friction coefficient measured by the wear test
  • Figure 6a is a comparative example
  • Figure 6b is a wear test result of the specimen formed with a cured layer by Example 1
  • Figure 6c is Example 2.
  • the friction coefficient values of the three specimens showed a significant difference in the initial change within about 3,000 cycles, and the specimen according to the comparative example reached the average friction coefficient value before 50 revolutions, unlike the specimens according to Examples 1 and 2. Shows a sharp increase.
  • the specimen according to Example 1 reached the average friction coefficient value only after reaching 500 rotations, and exhibited excellent wear resistance compared to the comparative example.
  • the specimen according to Example 2 had up to about 2,500 rotations. It has the best wear resistance with low coefficient of friction.
  • the PVD TiN layer formed by the proportional example causes the TiN layer to easily separate and fall off at the beginning of the abrasion test due to the distinct characteristic difference (i.e. hardness difference) formed between the base material and the TiN layer. It is.
  • the average coefficient of friction of CP Ti (Gr. 2), the base material of the three specimens used to analyze the wear characteristics, was about 0.7, and all three specimens showed relatively lower coefficients of friction than the untreated specimens. It is judged that the coating layer is not completely removed even up to 20,000 times due to the small load of 1N, and it is possible to obtain a certain effect of increasing the surface hardness only by physical vapor deposition. It can be seen that the wear characteristics can be obtained.
  • the surface hardness of three specimens was measured to investigate the effect of nitride on the surface of pure titanium matrix and the effect of surface treatment conditions on the specimens.
  • CP Ti Ge (Gr. 2)
  • the Vickers hardness was about 167 Hv
  • Comparative Example 373 Hv, Example 1 441 Hv, Example 2 was measured at 489 Hv, respectively. That is, it can be seen that the surface hardness increases considerably due to the formation of the hard film regardless of the method of surface hardening treatment.
  • Figure 7 shows the results of measuring the hardness change according to the cross-sectional depth from the surface of the specimens according to Comparative Example, Example 1 and Example 2 using Vickers hardness measurement.
  • the cross-sectional hardness is measured from the surface of the specimen toward the center of the matrix.
  • the cross-sectional hardness of the outermost surface portion is about 340 Hv of the specimen according to the comparative example, while the specimen according to Example 1 is 450 Hv, and the specimen according to Example 2 is 500 Hv or more, three times higher than known. The value is shown.
  • the hard layer of the specimen according to the comparative example has a thickness within a few micrometers, and after the surface hard layer, a sudden sudden decrease in hardness up to about 160 Hv, which is the standard hardness value of CP Ti, is observed.
  • the hardness decreases continuously as the depth increases from the surface.
  • the hardness value is higher than the known hardness value even at a depth of about 80 ⁇ m.
  • a hardness value higher than the known hardness value was maintained up to about 100 ⁇ m.
  • the hardness distribution results of the inclined functional hard layer is initially due to the higher internal hardness and thicker inclined functional hard layer formed in the specimen according to Example 2 when compared with the friction characteristics (Fig. 6).
  • the coefficient of friction rises the slowest and reaches more than 2,500 times, which coincides with the convergence tendency to reach the average coefficient of friction other than the hard layer.
  • the hard layer forming method according to the present invention enables formation of a hard layer having excellent physical properties in a short time as compared with the conventional hard layer forming method.

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  • Engineering & Computer Science (AREA)
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  • Chemical Vapour Deposition (AREA)

Abstract

The present invention relates to a method for forming a hard layer, having excellent and functionally gradient properties, on the surface of titanium at low cost. According to the present invention, the method for forming the hard layer comprises the steps of: (a) inserting the titanium in a heat treatment device, ventilating the same, and maintaining the air pressure to be 10-4 torr or less; (b) preprocessing the titanium by heating the same at 730 ~ 800℃ for 10 min.~ 5 hours and removing the oxide film formed on the surface of the titanium; (c) injecting one or more gases selected from nitrogen, oxygen, and carbon into the heat treatment device and heating the titanium at 740 ~ 950℃ for 30 min.~20 hours, thereby forming the hard layer, having a density nine times greater than the gas, on the surface of the talloy; and (d) cooling the titanium.

Description

타이타늄에 경질층을 형성하는 방법 및 이에 의해 형성된 경질층을 갖는 타이타늄 합금Titanium alloy having a hard layer formed by the method and the hard layer formed by the titanium
본 발명은 타이타늄(순 타이타늄 및 타이타늄 합금)의 표층에 경질층을 형성하는 방법에 관한 것으로, 보다 구체적으로는 타이타늄의 표층에 저비용으로 물성이 연속적으로 변하는 특성을 갖는 경질층을 형성하는 방법과 이 방법에 의해 경질층이 형성된 타이타늄에 관한 것이다.The present invention relates to a method for forming a hard layer on the surface layer of titanium (pure titanium and titanium alloy), and more particularly, to a method for forming a hard layer having properties of continuously changing properties at low cost on the surface layer of titanium. It relates to titanium in which a hard layer is formed by the method.
순 타이타늄 및 타이타늄 합금은 다른 구조재료에 비해 비교적 가볍고, 극저온에서부터 400~500℃의 고온까지의 온도영역에서 비강도가 높기 때문에 경량화가 필수적인 군사 및 항공우주 산업분야에 널리 이용되고 있다. 또한 내식성과 생체친화성이 우수하여 인체 내에 삽입하는 생체재료로는 대부분 타이타늄이 사용되고 있다. 또한 타이타늄은 양극산화를 통한 착색이 가능하기 때문에, 최근에는 다양한 색조발현을 필요로 하는 민수용품에서도 그 사용이 확대되고 있다.Pure titanium and titanium alloys are relatively lighter than other structural materials and are widely used in the military and aerospace industries where weight reduction is essential because of their high specific strength in the temperature range from cryogenic temperatures to 400 to 500 ° C. In addition, since titanium has excellent corrosion resistance and biocompatibility, most biomaterials to be inserted into the human body are used. In addition, since titanium is capable of coloring through anodization, its use has recently been expanded in civilian products requiring various color expressions.
이러한 타이타늄의 우수한 특성에 불구하고, 타이타늄은 경도와 내마모성이 좋지 않기 때문에 그 응용 분야가 제한되고 있어, 최근 이를 개선하기 위한 타이타늄 표면개질 처리에 대한 연구가 주목받고 있다.Despite such excellent properties of titanium, its application is limited because of its poor hardness and abrasion resistance, and recently, research on titanium surface modification treatments for improving it has attracted attention.
이와 관련하여, 타이타늄 합금의 표면특성(특히, 경도 및 내마모성)을 개선하기 위한 방법으로, 타이타늄 합금의 표면에 TiN과 같은 경질피막을 형성하는 방법이 제안되고 있다.In this regard, as a method for improving the surface properties (particularly hardness and wear resistance) of the titanium alloy, a method of forming a hard film such as TiN on the surface of the titanium alloy has been proposed.
내마모성 개선용 피막재료 중에서 활발히 연구되어 온 TiN 피막은 내산화성이 우수하고 뛰어난 표면 조도와 연성을 지니고 있으며, 색상이 황금색으로 미려하여, 내마모용뿐 아니라 내부식용 또는 장식용으로도 널리 사용되고 있는 피막재료이다.The TiN film, which has been actively studied among the coating materials for improving abrasion resistance, has excellent oxidation resistance, excellent surface roughness and ductility, and is beautiful in color due to its golden color, which is widely used not only for wear but also for corrosion resistance or decoration. to be.
그런데 TiN 피막은 산화과정을 통해 TiO2가 형성될 경우 매우 큰 부피팽창(부피팽창률 약 64%)을 하기 때문에, 형성된 산화물층에 큰 압축응력을 형성하여 피막 내에 균열을 야기하여 500℃ 이상의 고온환경에서는 급격히 산화가 진행된다는 단점을 가지고 있다.However, since TiN film has very large volume expansion (volume expansion rate of about 64%) when TiO 2 is formed through oxidation process, it forms a large compressive stress in the formed oxide layer and causes cracks in the film. Oxidation proceeds rapidly.
이러한 TiN 피막의 단점을 극복할 수 있는 방법으로, TiNxOy와 같은 산소를 포함하는 산질화물 재료가 표면 경화용 피막으로 사용될 수 있다. 3원계 조성을 기초로 하는 산질화물 피막재료도 격자 내의 원자들의 화학적 결합과 산질화물의 전기적 구조에 의해서 TiN 피막과 마찬가지로 우수한 경도와 전기적 특성, 내마모성 및 내부식성을 가지기 때문이다.As a method of overcoming the disadvantages of the TiN film, an oxynitride material containing oxygen such as TiN x O y may be used as the surface curing film. This is because the oxynitride coating material based on the ternary composition also has excellent hardness, electrical properties, abrasion resistance, and corrosion resistance similar to the TiN coating due to the chemical bonding of atoms in the lattice and the electrical structure of the oxynitride.
한편, 타이타늄 합금의 표면에 TiNxOy와 같은 우수한 특성을 가지는 타이타늄 산질화물 피막을 형성하는 방법으로는, 질화법, 침탄법, 용사법, 물리기상증착법(PVD; Physical Vapor Deposition) 및 화학기상증착법(CVD; Chemical Vapor Deposition) 등이 있다.On the other hand, as a method of forming a titanium oxynitride film having excellent properties such as TiN x O y on the surface of the titanium alloy, nitriding, carburizing, thermal spraying, physical vapor deposition (PVD) and chemical vapor deposition (CVD; Chemical Vapor Deposition) and the like.
이중에서 Ion Plating, Cathode Arc Deposition, Reactive Sputtering 등의 PVD 방법이나 플라즈마를 이용한 CVD방법이 주로 고려되고 있다.Among them, PVD methods such as ion plating, cathode arc deposition, and reactive sputtering, and CVD methods using plasma are mainly considered.
PVD 공정은 CVD 공정에 비해 낮은 온도에서 증착이 가능하며 타이타늄 합금 표면과 코팅층의 계면에서의 조직변화를 최소화할 수 있고, 내마모성, 내열성, 내산화성, 내식성 등이 우수한 코팅층을 형성할 수 있다는 장점이 있으나, 코팅층과 타이타늄 합금 기지 사이의 접착력이 약하고 코팅 장비가 고가이며 코팅층의 형성에 장시간이 소요된다는 단점이 있다.The PVD process can be deposited at a lower temperature than the CVD process, minimizes the change of the structure at the interface between the titanium alloy surface and the coating layer, and can form a coating layer having excellent abrasion resistance, heat resistance, oxidation resistance, and corrosion resistance. However, there are disadvantages in that the adhesion between the coating layer and the titanium alloy base is weak, the coating equipment is expensive, and the formation of the coating layer takes a long time.
또한, CVD 공정은 코팅층의 조성과 코팅두께의 조절이 용이하다는 장점이 있으나, 주로 고온에서 증착공정이 일어나기 때문에 코팅층과 타이타늄 합금의 계면에서 조직변화를 야기시킬 수 있어 타이타늄 합금의 기계적 특성 및 부식에 좋지 않은 영향을 줄 수 있는 단점이 있다.In addition, the CVD process has the advantage of easy control of the composition and coating thickness of the coating layer, but mainly due to the deposition process at a high temperature can cause a change in the structure of the coating layer and the titanium alloy in the mechanical properties and corrosion of the titanium alloy There are disadvantages that can have a bad effect.
한편, 전술한 모든 오버레이어(over-layer) 코팅방법으로 타이타늄 합금 표면에 그대로 경화 피막을 코팅할 경우 상대적으로 낮은 경도의 타이타늄 합금 기지층과 높은 경도의 코팅층으로 분리된 이중층(기지는 금속 특성, 코팅층은 세라믹 특성을 가짐)이 형성되어, 외부의 충격과 다축 하중 등의 조건에서 피막 분리 및 균열 등이 발생하는 문제점이 있다.On the other hand, if all of the above-described overlayer (over-layer) coating method to coat the cured coating on the titanium alloy surface as it is, a double layer separated into a relatively low hardness titanium alloy base layer and a high hardness coating layer (base metal properties, Coating layer has a ceramic characteristic) is formed, there is a problem that the film separation and cracking occurs under conditions such as external impact and multi-axial load.
또한, 용사코팅을 하는 경우에는 코팅층에 기공을 많이 포함하고 있어 충분한 내산화성 등의 물성을 기대하기 어렵고, PVD 및 CVD에 의해 형성된 코팅층도 용사코팅에 비해서는 기공이 적으나, 기본적으로 기공과 같은 결함을 상당히 가지고 있으므로 치밀한 코팅층을 형성하기 어렵다. 그리고 over-layer 코팅은 가공된 부품에 코팅층의 덧붙여지는 것이기 때문에, 두꺼운 코팅층을 형성할 경우 코팅 전후의 치수 변화가 상당하게 되므로 후가공의 필요성이 높아지며, 이는 부품의 제조비용 상승으로 이어지는 문제점이 있다.In addition, in the case of spray coating, the coating layer contains a lot of pores, so it is difficult to expect sufficient physical properties such as oxidation resistance, and the coating layer formed by PVD and CVD has less pores than the spray coating, but basically It is difficult to form a dense coating layer because it has considerable defects. And since the over-layer coating is added to the processed part of the coating layer, when the thick coating layer is formed, the dimensional change before and after the coating is significant, the necessity of post-processing increases, which leads to an increase in the manufacturing cost of the component.
또한, 침탄이나 침질과 같은 이너레이어(inner-layer) 방법의 경우, 소정 물성을 얻는데 소요되는 시간이 길어, 타이타늄 합금 기지 조직의 변화를 초래하여 기지 조직의 물성을 저하시키거나 처리비용이 증가하는 문제가 있었다.In addition, in the case of an inner-layer method such as carburization or sedimentation, it takes a long time to obtain predetermined physical properties, resulting in a change in the titanium alloy matrix structure, resulting in deterioration of the physical properties of the matrix structure or an increase in treatment cost. There was a problem.
본 발명은 전술한 종래기술의 문제점을 해결하기 위해 연구개발된 것으로서, 타이타늄의 표면으로부터 산소, 탄소 및 질소와 같은 침입형 원소를 확산침투시키는 열화학적 처리방법(Thermo-Chemical Treatment; TCT)을 통해, inner-layer 코팅층을 형성시켜 over-layer 코팅층이 갖는 문제점을 해결하고, 동시에 inner-layer 코팅층을 형성할 때 타이타늄 표면의 산화막 제거와 산화막 생성 억제 등의 별도의 공정을 수행하지 않고 연속된 1회의 처리를 단시간 수행함으로써, 우수한 물성의 경질층을 저비용으로 얻을 수 있는 타이타늄의 경질층 형성방법을 제공하는 것을 해결하고자 하는 과제로 한다.The present invention has been researched and developed in order to solve the above-described problems of the prior art, through a thermo-chemical treatment (TCT) method of diffusion penetration of invasive elements such as oxygen, carbon and nitrogen from the surface of titanium. In order to solve the problem of the over-layer coating layer by forming inner-layer coating layer and at the same time, when forming inner-layer coating layer, do not perform separate process such as removing oxide film and suppressing oxide film formation on titanium surface. By performing the treatment for a short time, it is a problem to be solved to provide a hard layer formation method of titanium which can obtain a hard layer of excellent physical properties at low cost.
또한, 본 발명의 다른 과제는 상기한 방법으로 얻어진 산소, 탄소 또는 질소와 같은 침입형 원소가 표면으로부터 농도 구배를 가지는 경질층이 형성된 타이타늄을 제공하는 것이다.In addition, another object of the present invention is to provide a titanium in which a hard layer in which an invasive element such as oxygen, carbon or nitrogen obtained by the above method has a concentration gradient from the surface thereof is formed.
상기 과제를 해결하기 위한 수단으로 본 발명은, 타이타늄의 표층에 경질층을 형성하는 방법으로, (a) 진공 열처리 장치에 타이타늄을 투입하고 배기하여 10-4 torr 이하의 기압을 유지하는 단계; (b) 상기 타이타늄을 730 ~ 800℃에서 10분 ~ 5시간 동안 가열하여 상기 타이타늄의 표면에 형성된 산화막을 제거하는 전처리 단계; (c) 상기 진공 열처리 장치에 질소, 산소, 탄소 중에서 선택된 1종 이상의 가스를 주입하고 상기 타이타늄을 740 ~ 950℃에서 30분 ~ 20시간 동안 가열하여, 상기 타이타늄 합금의 표면에 상기 가스의 농도 구배를 갖는 경질층이 형성되도록 하는 경화단계; 및 (d) 상기 타이타늄을 냉각시키는 단계;를 포함하는 방법을 제공한다.As a means for solving the above problems, the present invention provides a method for forming a hard layer on the surface layer of titanium, comprising the steps of: (a) injecting and evacuating titanium to a vacuum heat treatment apparatus to maintain an air pressure of 10 -4 torr or less; (b) a pretreatment step of heating the titanium at 730 to 800 ° C. for 10 minutes to 5 hours to remove an oxide film formed on the surface of the titanium; (c) injecting at least one gas selected from nitrogen, oxygen, and carbon into the vacuum heat treatment apparatus and heating the titanium at 740 to 950 ° C. for 30 minutes to 20 hours, thereby gradient of concentration of the gas on the surface of the titanium alloy. Curing step to form a hard layer having a; And (d) cooling the titanium.
본 발명에 따른 방법에 있어서, 상기 (a) 단계의 기압은 5×10-5 torr 이하일 수 있다.In the method according to the invention, the air pressure of step (a) may be 5 × 10 -5 torr or less.
또한, 본 발명에 따른 방법에 있어서, 상기 (b) 단계는 740 ~ 780℃에서 수행될 수 있다.In addition, in the method according to the invention, step (b) may be performed at 740 ~ 780 ℃.
또한, 본 발명에 따른 방법에 있어서, 상기 (b) 단계는 10분 ~ 1시간 동안 수행될 수 있다.In addition, in the method according to the present invention, step (b) may be performed for 10 minutes to 1 hour.
또한, 본 발명에 따른 방법에 있어서, 상기 (c) 단계의 온도가 상기 (b) 단계의 온도에 비해 높을 수 있다.In addition, in the method according to the invention, the temperature of the step (c) may be higher than the temperature of the step (b).
또한, 본 발명에 따른 방법에 있어서, 상기 (c) 단계는 740 ~ 850℃에서 수행될 수 있다.In addition, in the method according to the invention, the step (c) may be performed at 740 ~ 850 ℃.
또한, 본 발명에 따른 방법에 있어서, 상기 (c) 단계는 30분 ~ 5시간 동안 수행될 수 있다.In addition, in the method according to the present invention, step (c) may be performed for 30 minutes to 5 hours.
또한, 본 발명에 따른 방법에 있어서, 상기 (d)단계는 스텝 냉각법으로 냉각될 수 있다.In the method according to the present invention, step (d) may be cooled by a step cooling method.
또한, 본 발명에 따른 방법에 있어서, 상기 (d)단계는 500 ~ 800℃에서 30분 ~ 30 시간 동안 유지하는 시효(aging) 단계를 포함할 수 있다.In addition, in the method according to the present invention, step (d) may include an aging step of maintaining for 30 minutes to 30 hours at 500 ~ 800 ℃.
또한, 본 발명에 따른 방법에 있어서, 상기 (d)단계 후에, CVD법 또는 PVD법 등과 같은 over-layer 코팅법을 이용하여 타이타늄의 표면에 내지문, 색상발현 등을 목적으로 하는 코팅층을 추가적으로 형성하는 단계를 포함할 수 있다.In addition, in the method according to the present invention, after the step (d), by using an over-layer coating method such as CVD method or PVD method, additionally forming a coating layer for the purpose of rubbing, color expression, etc. on the surface of titanium. It may include the step.
또한, 본 발명에 따른 방법에 있어서, 상기 타이타늄은 순 타이타늄 또는 타이타늄 합금일 수 있다.In addition, in the method according to the present invention, the titanium may be pure titanium or a titanium alloy.
또한, 본 발명은 전술한 방법에 의해 형성된 경질층을 구비한 타이타늄 및 그 합금과 이 기술을 활용한 다양한 부품을 제공한다.The present invention also provides titanium and its alloys with hard layers formed by the method described above and various components utilizing this technology.
본 발명에 의하면 다음과 같은 효과를 얻을 수 있다.According to the present invention, the following effects can be obtained.
첫째, 본 발명에 따른 방법에 의하면, 종래의 침입형 가스를 침투시키는 공정에 비해 동등 이상의 물성을 단시간에 얻을 수 있어 경제적일 뿐 아니라, 가스침투에 따른 모재의 조직 변화를 막는데도 유리하다.First, according to the method according to the present invention, it is economical as compared to the conventional step of infiltrating gas can be obtained in a short time is economical, it is also advantageous to prevent the change of the structure of the base material due to gas penetration.
둘째, 본 발명의 일 실시예인 스텝 냉각 방법을 통해, 타이타늄 합금 표면에 두꺼운 경질층 및 기지조직의 제어효과를 얻을 수 있어 매우 우수한 물성을 갖는 경질층을 얻을 수 있게 된다. Second, through the step cooling method of an embodiment of the present invention, it is possible to obtain a control effect of a thick hard layer and the matrix structure on the titanium alloy surface to obtain a hard layer having very excellent physical properties.
셋째, 본 발명에 따른 방법은 타이타늄 합금 표면의 산화막 제거, 경사 코팅층의 형성 등이 하나의 장치에서 일괄적으로 수행될 수 있어, 공정이 간소화되고 저비용으로 우수한 경사 경질층을 얻을 수 있다.Third, in the method according to the present invention, the oxide film removal of the titanium alloy surface, the formation of the inclined coating layer, etc. can be performed in one unit, so that the process is simplified and an excellent inclined hard layer can be obtained at low cost.
넷째, 본 발명에 따라 형성된 경질층은 침입형 원소가 표면에서부터 모재방향으로 농도 구배가 형성되기 때문에 경질층과 모재 간에 물성의 연속적인 변화가 이루어지므로, 계면에서의 박리 현상이 발생하지 않게 된다.Fourth, the hard layer formed according to the present invention is because the concentration gradient is formed from the surface of the intrusion-type element from the surface of the base material is a continuous change of physical properties between the hard layer and the base material, the peeling phenomenon at the interface does not occur.
다섯째, 본 발명에 따라 형성된 경질층은 모재 내부에 침입형 원소가 투입된 것이므로, 치수 변화가 거의 없어 경화처리후 후속 가공처리가 필요하지 않게 되어 경제적이다.Fifth, since the hard layer formed according to the present invention is a penetration type element is introduced into the base material, there is almost no dimensional change, so that subsequent processing is not necessary after the hardening treatment and thus economical.
여섯째, 본 발명에 따라 형성된 경질층은 모재의 결정격자 내에 침입형 원소가 주입되는 것이므로, 용사코팅, PVD 또는 CVD 코팅층이 갖는 결함이 발생하지 않는다.Sixth, since the hard layer formed according to the present invention is an intrusion type element is injected into the crystal lattice of the base material, the defects of the thermal spray coating, PVD or CVD coating layer does not occur.
도 1은 본 발명의 실시예 1에 따른 경화층 형성 공정의 모식도이다.1 is a schematic view of a cured layer forming process according to Example 1 of the present invention.
도 2는 본 발명의 실시예 2에 따른 경화층 형성 공정의 모식도이다.It is a schematic diagram of the hardened layer formation process which concerns on Example 2 of this invention.
도 3은 본 발명의 실시예 1, 2 및 비교예에 따라 형성된 경질층의 표면을 광학현미경으로 관찰한 사진이다.Figure 3 is a photograph of the observation of the surface of the hard layer formed according to Examples 1, 2 and Comparative Examples of the present invention with an optical microscope.
도 4는 본 발명의 실시예 1, 2 및 비교예에 따라 형성된 경질층 및 PVD 코팅층의 단면을 주사전자현미경으로 관찰한 사진이다.Figure 4 is a photograph of the cross-section of the hard layer and the PVD coating layer formed according to Examples 1, 2 and Comparative Examples of the present invention with a scanning electron microscope.
도 5는 본 발명의 실시예 1, 2 및 비교예에 따라 형성된 경질층 및 PVD 코팅층의 표면조도를 측정한 결과를 나타낸 것이다. Figure 5 shows the results of measuring the surface roughness of the hard layer and the PVD coating layer formed according to Examples 1, 2 and Comparative Examples of the present invention.
도 6은 본 발명의 실시예 1, 2 및 비교예에 따라 형성된 경질층의 마찰 특성을 측정한 결과를 나타낸 것이다.Figure 6 shows the results of measuring the friction characteristics of the hard layer formed according to Examples 1, 2 and Comparative Examples of the present invention.
도 7는 본 발명의 실시예 1, 2 및 비교예에 따라 형성된 경질층의 단면 경도를 측정한 결과를 나타낸 것이다.Figure 7 shows the results of measuring the cross-sectional hardness of the hard layer formed according to Examples 1, 2 and Comparative Examples of the present invention.
이하, 본 발명의 바람직한 실시예에 기초하여 본 발명을 상세하게 설명하나, 본 발명이 하기 실시예에 제한되는 것은 아니다.Hereinafter, the present invention will be described in detail based on the preferred embodiments of the present invention, but the present invention is not limited to the following examples.
본 발명자들은 순 타이타늄 및 타이타늄 합금의 표면에 용사코팅, PVD, CVD와 같은 오버레이어(over-layer) 코팅법으로 코팅을 할 경우 근본적으로 타이타늄 합금 기지와 코팅층의 계면에서의 물성 차이가 현저한 이중층이 형성되어 근본적으로 외력에 의해 경질피막의 박리가 발생하는 것을 막기 어려울 뿐 아니라, 오버레이어 코팅에 따른 치수변화는 불가피한 후속 가공을 발생시키는 등의 문제점이 있음에 주목하여, 침탄이나 침질과 같은 이너레이어(inner-layer) 코팅법에 주목하였다.The inventors of the present invention found that when the surface of pure titanium and titanium alloys is coated with an over-layer coating method such as thermal spray coating, PVD, or CVD, a bilayer having a significant difference in physical properties at the interface between the titanium alloy base and the coating layer is essential. It is not only difficult to prevent the hard film from being peeled off due to external force, and the dimensional change due to the overlayer coating is inevitable, resulting in inevitable subsequent processing.Inner layers such as carburizing and sedimentation are noted. Attention was paid to the (inner-layer) coating method.
그런데 이너레이어 코팅법에 사용되는 산소, 질소 또는 탄소와 같은 침입형 원소를 타이타늄 또는 타이타늄 합금 기지에 신속하게 침투시키기 위해서는, 타이타늄 또는 타이타늄 합금의 표면에 형성된 안정된 타이타늄 산화물층을 제거할 필요가 있는데, 종래에는 산화피막을 제거하기 위한 별도의 공정을 수행하지 않고 직접 표면처리를 수행하거나, 플라즈마 질화법과 같이 저압의 질소분위기 중에서 글로우(glow) 방전을 통해 질소가스의 일부가 이온화되어 타이타늄 표면에 충돌하도록 하여, 이 과정에서 타이타늄 표면의 산화피막의 제거와 표면경화처리가 이루어지도록 하는 방법이 사용되고 있다. 그러나 이러한 방법들은 공정처리 온도가 높고, 특히 장시간의 표면처리가 이루어져야 원하는 물성을 갖는 경화층을 얻을 수 있다는 한계가 있다. 다시 말해서, 종래 방법은 장시간이 소요될 뿐 아니라 단일 공정에서 처리되지 못해 경화층 형성에 소요되는 비용이 상당히 든다.However, in order to quickly infiltrate invasive elements such as oxygen, nitrogen or carbon used in the inner layer coating method into the titanium or titanium alloy base, it is necessary to remove the stable layer of titanium oxide formed on the surface of the titanium or titanium alloy. Conventionally, a surface treatment is performed directly without performing a separate process for removing an oxide film, or a portion of nitrogen gas is ionized through a glow discharge in a low pressure nitrogen atmosphere such as plasma nitriding to impinge on the titanium surface. In this process, a method of removing the oxide film on the titanium surface and surface hardening is used. However, these methods have a high process temperature, and in particular, a long time surface treatment is required to obtain a cured layer having desired physical properties. In other words, the conventional method not only takes a long time but also can not be processed in a single process, and the cost of forming a hardened layer is considerably high.
이러한 문제점을 극복하기 위하여 본 발명자들은 다양한 이너레이어 코팅방법을 연구하였으며 그 결과, 열처리가 가능한 진공챔버 내에 특정 온도 범위에서 10-4 torr 이상의 고진공도로 유지할 경우 타이타늄의 표면에 형성된 수 나노미터 두께의 산화막을 단시간에 제거할 수 있고 이어서 질소, 산소 또는 탄소와 같은 침입형 원소의 침투가 용이하도록 온도범위 및 가스압력을 유지할 경우, 짧은 시간으로도 경사기능을 갖는 우수한 물성의 경질층이 얻어짐을 확인하고 본 발명에 이르게 되었다. 본 발명에 따라 형성된 경질층은 기존의 over-layer 코팅에서 발생할 수 있는 외부로부터의 영향에 의한 코팅층과 기지 면간 분리 및 균열 발생을 방지할 수 있으며, 특히 다단계의 열확산 표면 경질화 공정기술을 이용하여 산화막의 제거와 산화막 생성억제 등의 공정을 별도로 수행하지 않고 연속적으로 표면 경화처리가 가능하여, 최적의 물성을 가지면서도 경제적으로 유리한 표면 경화가 가능하게 된다.In order to overcome this problem, the present inventors studied various inner layer coating methods, and as a result, several nanometer-thick oxide films formed on the surface of titanium when maintained at a high vacuum of 10 -4 torr or more in a specific temperature range in a vacuum chamber capable of heat treatment It can be confirmed that when the temperature range and gas pressure are maintained to facilitate the penetration of invasive elements such as nitrogen, oxygen, or carbon, in a short time, a hard layer of excellent physical properties having an inclination function can be obtained even in a short time. The present invention has been reached. The hard layer formed according to the present invention can prevent the separation between the coating layer and the matrix surface and the occurrence of cracking due to the external influence that may occur in the existing over-layer coating, and in particular, using a multi-step thermal diffusion surface hardening process technology. The surface hardening treatment can be performed continuously without separately performing processes such as removing the oxide film and suppressing the formation of the oxide film, thereby enabling economical advantageous surface hardening while having optimal physical properties.
본 발명에 따른 타이타늄 경질층 형성방법은, (a) 진공 열처리 장치에 타이타늄을 투입하고 배기하여 10-4 torr 이하의 기압을 유지하는 단계; (b) 상기 타이타늄을 730 ~ 800℃에서 10분 ~ 5시간 동안 가열하여 상기 타이타늄의 표면에 형성된 산화막을 제거하는 전처리 단계; (c) 산화막의 제거 후, 상기 열처리 장치에 질소, 산소, 탄소 중에서 선택된 1종 이상의 가스를 주입하고 상기 타이타늄을 740 ~ 950℃에서 30분 ~ 20시간 동안 가열하여, 상기 타이타늄 합금의 표면에 경질층이 형성되도록 하는 단계; 및 (d) 상기 타이타늄을 냉각시키는 단계;를 포함하는 방법을 제공한다.The method of forming a titanium hard layer according to the present invention comprises the steps of: (a) adding titanium to a vacuum heat treatment apparatus and evacuating to maintain an air pressure of 10 −4 torr or less; (b) a pretreatment step of heating the titanium at 730 to 800 ° C. for 10 minutes to 5 hours to remove an oxide film formed on the surface of the titanium; (c) after removing the oxide film, injecting at least one gas selected from nitrogen, oxygen, and carbon into the heat treatment apparatus and heating the titanium at 740 to 950 ° C. for 30 minutes to 20 hours, thereby hardening the surface of the titanium alloy. Allowing a layer to be formed; And (d) cooling the titanium.
본 발명에 있어서, '타이타늄'이란 순 타이타늄과 타이타늄 합금을 포함하는 의미로 사용한다.In the present invention, 'titanium' is used in the sense containing pure titanium and titanium alloy.
상기 열처리 장치의 진공도는 1×10-4 torr 보다 낮은 기압이 되도록 하여야 하는데, 기압이 1×10-4 torr 이하일 경우, 상기 (b) 단계에서 타이타늄의 표면에 형성된 산화막이 깨끗하게 제거되지 못해, 후속하는 경화처리 공정의 효과가 충분하지 않기 때문이며, 열처리 장치의 기압이 5×10-5 torr 이하가 되도록 유지하는 것이 더욱 바람직하다. The degree of vacuum of the heat treatment apparatus should be lower than 1 × 10 -4 torr. If the pressure is 1 × 10 -4 torr or lower, the oxide film formed on the surface of titanium in step (b) cannot be removed cleanly. It is because the effect of the hardening process to do is not enough, It is more preferable to maintain so that the atmospheric pressure of a heat processing apparatus may be 5 * 10 <-5> torr or less.
상기 산화막 제거 단계는 730 ~ 800℃에서 수행되어야 하는데, 730℃ 미만일 경우 산화막의 제거가 충분하게 이루어지지 않아 후속되는 침입형 가스의 침투공정이 길어지게 되고, 800℃를 초과할 경우에는 미세조직학적 및 기계적 특성의 불이익이 발생하기 때문이다. 더욱 바람직하게는 740℃에서 780℃의 온도범위에서 수행되는 것이다. 또한, 상기 산화막 제거 단계에서의 제거 시간은 10분 내지 1시간이 더욱 바람직한데, 10분 미만일 경우 충분한 산화막의 제거가 이루어지지 않고, 1시간을 초과하는 것은 경제 비용적인 측면과 기계적 특성 측면에서 불리하기 때문이다.The oxide film removing step should be carried out at 730 ~ 800 ℃, if less than 730 ℃ the removal of the oxide film is not made sufficiently, the subsequent penetration process of intrusion type gas is long, if it exceeds 800 ℃ microhistological And a disadvantage in mechanical properties. More preferably, it is carried out at a temperature range of 740 ℃ to 780 ℃. In addition, the removal time in the oxide film removing step is more preferably 10 minutes to 1 hour, if less than 10 minutes is not sufficient oxide film removal, more than 1 hour is disadvantageous in terms of economic cost and mechanical properties Because.
상기 경화처리 단계는 산화막 제거와 함께 연속적으로 수행하거나, 산화막 제거 온도보다 온도를 높여서 수행하는 2단 열처리 방법으로 수행할 수 있는데, 2단 열처리 방법이 경화처리 시간을 단축시킬 수 있기 때문에 보다 바람직하다. 즉, 침입가스원소에 의한 경질화 열처리를 수행하기 이전에 전처리 공정을 도입함으로써 표면경질화 처리시간을 상당히 단축시킬 수 있다.The curing step may be carried out continuously with the removal of the oxide film, or may be performed by a two-stage heat treatment method performed by raising the temperature above the oxide film removal temperature, which is more preferable because the two-stage heat treatment method may shorten the curing time. . That is, the surface hardening treatment time can be considerably shortened by introducing a pretreatment process before performing the hardening heat treatment with the intruded gas element.
경화처리 단계의 온도는 740℃이상에서 수행되어야 하며 경화층의 깊이 및 요구 경도에 따라 850℃까지 수행할 수 있다. 보다 바람직하게는 산화막 제거단계보다 온도를 높인 780℃ 이상에서 수행되는 것이다. 또한, 경화처리시간은 30분 ~ 20시간이 바람직한데, 30분 미만일 경우 산소, 질소, 탄소 등의 침입형 원소의 침입량이 충분하지 않고, 20시간을 초과할 경우 미세조직학적으로 결정립 크기의 성장 등에 따른 기계적 특성의 하락과 경제 비용적인 측면에서 불리하기 하기 때문이다.The temperature of the curing step should be carried out at 740 ℃ or more and can be carried out up to 850 ℃ depending on the depth and the required hardness of the cured layer. More preferably, it is performed at 780 ° C. or higher, which is higher than the oxide film removing step. In addition, the curing treatment time is preferably 30 minutes to 20 hours, but less than 30 minutes is not enough to penetrate invasive elements such as oxygen, nitrogen, carbon, etc., and if it exceeds 20 hours, the grain size grows microscopically. This is because it is disadvantageous in terms of declining mechanical properties and economic cost.
또한, 상기 경화처리에 사용되는 가스는 타이타늄 결정 격자 내에 쉽게 침투할 수 있는 원소로서, 탄소, 질소, 산소 가스 또는 이들의 혼합가스가 사용될 수 있다.In addition, the gas used for the hardening treatment is an element that can easily penetrate into the titanium crystal lattice, carbon, nitrogen, oxygen gas or a mixture thereof may be used.
상기 냉각 단계는 열처리로 내의 로냉이나 공랭의 방법을 사용할 수 있으며, 로냉 또는 공랭 중에, 형성되는 경질층의 조직을 고르게 하고 경질층의 표면부에 두꺼운 경질층이 형성될 수 있도록 500 ~ 800℃에서 30분 ~ 30 시간 동안 유지하는 시효(aging) 단계를 포함하는 스텝 냉각 방식을 사용할 수도 있다.The cooling step may be a method of furnace cooling or air cooling in the heat treatment furnace, during the cooling or air cooling, at 500 ~ 800 ℃ to evenly form the structure of the hard layer to be formed and to form a thick hard layer on the surface of the hard layer It is also possible to use a step cooling method including an aging step for 30 minutes to 30 hours.
[실시예 1]Example 1
본 발명의 실시예 1에서 사용한 표면 경화용 시편은 가로, 세로 및 높이가 30mm×25mm×2mm인 상용의 순수 타이타늄(Gr.2 소재)를 사용하였으며, 제조자가 제시한 Gr.2 소재의 화학조성은 하기 표 1과 같다.The surface hardening specimen used in Example 1 of the present invention used commercially pure titanium (Gr. 2 material) having a width, length, and height of 30 mm × 25 mm × 2 mm, and the chemical composition of Gr.2 material suggested by the manufacturer. Is shown in Table 1 below.
표 1
화학성분 C Fe H N O Ti
함량(중량%) 0.05 0.3 0.008 0.02 0.2 Bal.
Table 1
Chemical composition C Fe H N O Ti
Content (% by weight) 0.05 0.3 0.008 0.02 0.2 Bal.
준비한 타이타늄 시편을 아세톤 용액에 침지시켜 초음파 세척을 하고 건조시킨 후, 도 1에 도시된 모식도와 같은 방법으로 표면 경화처리를 수행하였다.The prepared titanium specimen was immersed in an acetone solution, ultrasonically cleaned and dried, and then surface hardened in the same manner as shown in FIG. 1.
구체적으로, GCVF (Gas Controlled Vacuum Furnace)의 챔버 내에 시편을 장입한 다음, 진공펌프를 이용하여 5×10-6 torr로 감압하였다. 이어서 열처리로의 온도를 750℃까지 승온시킨 후 30분 동안 유지함으로써, 타이타늄 시편의 표면에 자연적으로 형성된 약 10Å 정도 두께의 타이타늄 산화막이 열분해에 의해 제거될 수 있도록 하였다.Specifically, the specimen was charged in a chamber of a gas controlled vacuum furnace (GCVF), and then decompressed to 5 × 10 −6 torr using a vacuum pump. Subsequently, the temperature of the heat treatment furnace was raised to 750 ° C. and maintained for 30 minutes, so that the titanium oxide film having a thickness of about 10 Å naturally formed on the surface of the titanium specimen could be removed by pyrolysis.
이와 같이 산화막이 제거되도록 한 후에, 산소와 질소의 혼합가스 100ccm을 주입한 후, 챔버 내의 압력이 5 ×10-1 torr를 유지하도록 챔버 내 분압을 조정하였다. 그리고 열처리로의 온도를 800℃까지 승온시킨 후 3시간 동안 유지함으로써, 주입된 산소 및 질소 원소가 타이타늄 시편의 표면으로부터 내부로 침투될 수 있도록 하였다. 이와 같이 경화처리가 완료된 후에는 타이타늄 시편을 공랭 또는 로냉시키는 방법을 통해 냉각시켰다.After the oxide film was removed in this manner, 100 ccm of a mixed gas of oxygen and nitrogen was injected, and the partial pressure in the chamber was adjusted so that the pressure in the chamber was maintained at 5 × 10 −1 torr. Then, the temperature of the heat treatment furnace was raised to 800 ° C. and maintained for 3 hours to allow the injected oxygen and nitrogen elements to penetrate into the interior from the surface of the titanium specimen. After the hardening treatment was completed as described above, the titanium specimen was cooled by air cooling or furnace cooling.
또한, 추가로 타이타늄 표면의 조도를 낮추고 균일한 색상 구현을 위하여 PVD법으로 TiN 코팅층을 형성하였다. PVD 코팅층은 150℃에서 10분 동안 질소가스 분위기에서 Ti 타겟을 이용하여 형성하였고 이때 형성된 PVD 코팅층의 두께는 2.1㎛였다.In addition, in order to lower the roughness of the titanium surface and to realize a uniform color, a TiN coating layer was formed by PVD. The PVD coating layer was formed using a Ti target in a nitrogen gas atmosphere at 150 ° C. for 10 minutes, and the thickness of the PVD coating layer formed was 2.1 μm.
[실시예 2]Example 2
본 발명의 실시예 2는, 본 발명의 실시예 1과 동일한 시편을 사용하여 동일한 조건으로 시편 전처리와 경화처리를 수행한 후, 도 2에 도시된 바와 같이, 냉각단계에서, 미세조직의 균질화와 강도 극대화 및 표면 경질층의 두께를 두껍게 하기 위기 위하여, 700℃에서 1시간 동안 유지하는 시효(aging) 처리를 수행한 후, 열처리로에서 시편을 꺼내어 공랭하는 방법(즉, 스텝 냉각법)으로 경질층을 형성하였다. 여기에 실시예 1과 마찬가지로, 타이타늄 표면의 조도를 낮추고 균일한 색상 구현을 위하여 PVD법으로 TiN 코팅층을 형성한 것이다. PVD 코팅층은 상기 실시예 1과 동일하게 150℃에서 10분 동안 질소가스 분위기에서 Ti 타겟을 이용하여 형성하였고 이때 형성된 PVD 코팅층의 두께는 2.1㎛였다.Example 2 of the present invention, after the specimen pretreatment and curing treatment under the same conditions using the same specimen as in Example 1 of the present invention, as shown in Figure 2, in the cooling step, homogenization of the microstructure and In order to maximize the strength and increase the thickness of the surface hard layer, an aging treatment held at 700 ° C. for 1 hour is performed, and then the hard layer is removed by air cooling (ie, step cooling). Formed. Here, as in Example 1, the TiN coating layer was formed by PVD in order to lower the roughness of the titanium surface and to realize uniform color. The PVD coating layer was formed using a Ti target in a nitrogen gas atmosphere at 150 ° C. for 10 minutes as in Example 1, and the thickness of the formed PVD coating layer was 2.1 μm.
[비교예][Comparative Example]
비교예는 본 발명의 실시예 1과 동일하게 준비한 타이타늄 시편의 표면에, PVD 방법을 이용하여 TiN 코팅층을 형성한 것으로, TiN 코팅층은 150℃에서 10분 동안 질소가스 분위기에서 Ti 타겟을 이용하여 형성하였고, 이때 형성된 TiN 코팅층의 두께는 3.4㎛였다.Comparative Example is a TiN coating layer formed on the surface of the titanium specimen prepared in the same manner as Example 1 of the present invention by using a PVD method, the TiN coating layer is formed by using a Ti target in a nitrogen gas atmosphere at 150 ℃ for 10 minutes At this time, the thickness of the TiN coating layer formed was 3.4㎛.
이상과 같이 형성한 표면 경질층의 표면 형상, 단면 형상, 단면 경도, 표면 조도, 표면 마모특성 등에 대해 분석하였다.The surface shape, cross-sectional shape, cross-sectional hardness, surface roughness, surface wear characteristics, and the like of the surface hard layer formed as described above were analyzed.
구체적으로, 표면의 형상은 광학현미경을 통해 관찰하였으며, 단면의 형상은 주사전자현미경으로 관찰하였다. 또한, 표면조도는 Surface profiler(Model TENCOR P-11)를 이용하여 스캔길이(scan length)를 9000㎛로 고정하여 측정하였다. 또한, 마모특성은 볼 온 디스크(Ball on Disk)형 마모시험기(J&L사;Model JLTB-02 tribometer)를 사용하여 측정하였는데, 이때 상대재로는 직경 1mm의 스테인리스 볼을 사용하였고, 볼과 시편이 회전반경 3mm, 회전속도 100rpm, 하중 1N의 조건하에서 마찰 마모가 일어나도록 하여 각 시편의 마찰계수를 측정하고 마찰거동을 관찰하였다. 또한, 단면의 경도는 얇은 판상 시편의 단면을 효과적으로 측정하기 위해 시편을 경사면으로 절단하여 연마한 후, 경질층의 단면 경도를 측정하였다. 이때 경도는 마이크로 비커스 경도계(FUTURE-TECH사; Model FM-700)를 이용하여 하중 100g으로 10초간 유지하면서 시편의 표면에서부터 기지(matrix) 중심부 쪽으로 측정하였다.Specifically, the shape of the surface was observed through an optical microscope, and the shape of the cross section was observed by a scanning electron microscope. In addition, the surface roughness was measured by fixing the scan length to 9000㎛ using a surface profiler (Model TENCOR P-11). In addition, wear characteristics were measured using a ball on disk wear tester (J &L; Model JLTB-02 tribometer). At this time, as a counterpart, a stainless steel ball having a diameter of 1 mm was used. The friction coefficient of each specimen was measured under friction conditions of rotation radius 3mm, rotation speed 100rpm and load 1N, and the friction behavior was observed. In addition, in order to measure the cross section of a thin plate-shaped specimen effectively, the cross-sectional hardness measured the cross-sectional hardness of the hard layer after cutting and grinding the specimen to the inclined surface. At this time, the hardness was measured from the surface of the specimen toward the matrix center while maintaining the load at 100 g for 10 seconds using a micro-Vickers hardness tester (FUTURE-TECH; Model FM-700).
표면 및 단면 조직Surface and cross-sectional organization
도 3은 본 발명의 실시예 1, 2 및 비교예에 따라 경질층을 형성한 타이타늄 시편의 표면을 광학현미경으로 관찰한 사진이다.3 is a photograph of the surface of the titanium specimen in which the hard layer was formed according to Examples 1, 2 and Comparative Examples of the present invention by an optical microscope.
도 3은 각각의 시편의 표면 형상을 광학현미경을 이용하여 각각 50배, 200배로 관찰한 결과로서, 각 시편들의 겉보기 조직은 모두 등축정 형상의 α상을 갖는 표면조직을 보였다.3 is a result of observing the surface shape of each specimen 50 times and 200 times, respectively, using an optical microscope, the apparent structure of each specimen showed a surface structure having an α phase of equiaxed crystal shape.
또한, 표면경화처리한 세 시편의 단면 형상을 주사전자현미경을 이용하여 관찰하였다. 형성된 박막층, 박막층과 모재와의 경계, 확산층 등을 좀 더 넓은 범위로 관찰하기 위해 단면을 경사면으로 연마한 후 확산경질층을 관찰하여 도 4에 나타내었다. 도 4에서 보여지는 바와 같이, 세 시편 모두 코팅층 경계면을 확인할 수 있다.In addition, the cross-sectional shape of the three surface-hardened specimens was observed using a scanning electron microscope. In order to observe the formed thin film layer, the boundary between the thin film layer and the base material, and the diffusion layer in a wider range, the cross section was polished to an inclined surface and the diffusion hard layer was observed in FIG. 4. As shown in Figure 4, all three specimens can confirm the coating layer interface.
구체적으로, 도 4a(비교예)의 경우, PVD증착에 의한 약 3.4㎛의 표면 경질층이 형성되었음을 알 수 있다. 또한 순 타이타늄 표면 위에 전처리 없이 PVD(물리증착)만 수행함으로 인해 모재와 박막층의 경계가 가장 뚜렷함을 보이고 있다. 이에 따라 표면마찰 특성도 가장 떨어진다(도 6a). 이는 모재와 코팅 층간의 접착력이 낮음에 따라 마모실험과 같은 가혹한 환경의 실험에서 박막분리 현상을 나타냄에 기인한다.Specifically, in the case of Figure 4a (comparative example), it can be seen that the surface hard layer of about 3.4㎛ by PVD deposition. In addition, only PVD (Physical Deposition) is performed on the surface of pure titanium without any pretreatment. Accordingly, the surface friction characteristics are also the lowest (Fig. 6a). This is due to the low adhesion between the base material and the coating layer, resulting in thin film separation in harsh environments such as wear tests.
도 4b(실시예 1)의 경우, PVD로 형성한 약 2.1㎛의 TiN 박막층을 포함하여 전체 표면 경질층의 두께는 약 84㎛로 두꺼운 표면 경질층을 형성하고 있다. In the case of FIG. 4B (Example 1), the entire surface hard layer is formed to have a thick surface hard layer of about 84 μm, including a TiN thin film layer of about 2.1 μm formed by PVD.
또한, 도 4c(실시예 2)의 경우, PVD로 형성한 약 2.1㎛의 TiN 박막층, TCT 공정으로 인한 경질층을 모두 포함하여 약 99㎛로 가장 두꺼운 표면 경질층을 형성하고 있음을 알 수 있다. 또한, 시효처리를 추가 수행함으로써 침입형 원소의 확산을 촉진하여 확산층의 경계가 경사적으로 변함으로써 마모시험 시 박막분리 현상을 방지할 수 있다. 이와 같은 이유로 인하여 아래와 같이, 본 발명의 실시예 2에 따른 시편이 가장 좋은 표면마찰 특성을 나타낸다(도 6c).In addition, in FIG. 4C (Example 2), it can be seen that the thickest surface hard layer is formed to have a thickness of about 99 μm, including both the TiN thin film layer formed by PVD and the hard layer formed by the TCT process. . In addition, by performing the aging treatment, the diffusion of the invasive element is promoted, and the boundary of the diffusion layer is changed obliquely, thereby preventing the thin film separation phenomenon during the abrasion test. For this reason, as shown below, the specimen according to Example 2 of the present invention exhibits the best surface friction characteristics (FIG. 6C).
표면 조도 및 표면 마찰 특성Surface Roughness and Surface Friction Characteristics
도 5는 본 발명의 실시예 1, 2 및 비교예에 따라 형성된 경질층의 형성상태와 각각의 공정 조건들이 표면에 미치는 영향과 경질층의 방향성을 조사하기 위해 표면 조도를 측정하여 산술평균조도값(Ra)으로 나타낸 결과이다.5 is an arithmetic mean roughness value by measuring the surface roughness to investigate the influence of the hard layer formed according to Examples 1, 2 and Comparative Examples of the present invention and the effect of the respective process conditions on the surface and the orientation of the hard layer It is the result shown by (Ra).
도 5에서 확인되는 바와 같이, 비교예에 따라 형성된 경질층은 Ra=0.13㎛ 값을 가지고, 실시예 1에 따라 형성된 경질층은 Ra=0.13㎛ 값을 가지며, 실시예 2에 따라 형성된 경질층은 Ra=0.14㎛ 값을 가진다.As confirmed in FIG. 5, the hard layer formed according to the comparative example had a Ra = 0.13 μm value, the hard layer formed according to Example 1 had a Ra = 0.13 μm value, and the hard layer formed according to Example 2 Ra has a value of 0.14 µm.
즉, 본 발명의 실시예 1 및 2에 따라 형성된 경질층의 표면에 PVD 코팅층을 형성한 경우, 표면 경질화처리를 하지 않은 경우에 비해 표면 조도는 큰 변화없이 유사함을 알 수 있으며, 그 결과는 타이타늄 모재에 직접 PVD를 형성한 비교예와도 거의 유사함을 알 수 있다. 즉, 타이타늄 모재나, 이의 경질화처리 또는 경질화처리후 시효처리를 수행하더라도 최종적인 PVD 코팅층의 표면 조도에는 큰 영향을 미치지 못함을 알 수 있다.That is, when the PVD coating layer is formed on the surface of the hard layer formed according to Examples 1 and 2 of the present invention, it can be seen that the surface roughness is similar without significant change compared to the case where the surface hardening treatment is not performed. It can be seen that is almost similar to the comparative example in which PVD was formed directly on the titanium base material. That is, it can be seen that even if the titanium base material, or its hardening treatment or hardening treatment, the aging treatment does not significantly affect the surface roughness of the final PVD coating layer.
표면 마찰 특성은, 대기 중 무윤활 조건하에서 SUS 볼(ball)을 상대재로 하여 마모시험을 수행하였으며, 마모시험은 초기 마모를 고려하여 왕복운동회수 20,000회까지 측정하였다.Surface friction characteristics were measured by using SUS ball as a counterpart under no lubricating conditions in the air, and the wear test was measured up to 20,000 reciprocating times considering initial wear.
도 6은 마모시험으로 측정된 표면 마찰계수를 나타낸 것으로, 도 6a는 비교예, 도 6b는 실시예 1, 도 6c는 실시예 2에 의해 경화층이 형성된 시편의 마모시험 결과이다. Figure 6 shows the surface friction coefficient measured by the wear test, Figure 6a is a comparative example, Figure 6b is a wear test result of the specimen formed with a cured layer by Example 1, Figure 6c is Example 2.
도 6a에서 확인되는 바와 같이, 비교예의 경우 평균 마찰계수 μ=0.53으로 가장 높은 마찰 계수 값을 나타내고 있다. 이에 비해, 본 발명의 실시예 1에 따른 시편의 경우 평균 마찰계수 μ=0.42이고, 실시예 2에 따른 시편의 경우 평균 마찰계수 μ=0.44로, 비교예에 비해 평균 마찰계수가 현저하게 낮았다. As shown in FIG. 6A, in the comparative example, the average friction coefficient μ = 0.53 indicates the highest friction coefficient value. In contrast, the average friction coefficient μ = 0.42 for the specimen according to Example 1 of the present invention and the average friction coefficient μ = 0.44 for the specimen according to Example 2 were significantly lower than those of the comparative example.
이러한 결과는 PVD 증착으로만 형성된 코팅층에 비해, 본 발명의 실시예에 따른 열확산법에 의한 경질화처리에 의한 모재강화, 형성된 경질층 자체의 높은 경도, 모재와 박막 사이의 우수한 접착력에 의해 기인되는 것으로 평가된다.This result is due to the strengthening of the base material by the hardening process by the thermal diffusion method according to the embodiment of the present invention, the high hardness of the formed hard layer itself, and the excellent adhesion between the base material and the thin film, compared to the coating layer formed only by PVD deposition. Is evaluated.
특히, 세 시편의 마찰계수 값은 약 3,000회 이내의 초기 변화에서는 확연한 차이를 보이는데, 비교예에 따른 시편은 실시예 1 및 2에 따른 시편과 달리 회전횟수 50회 이전에 평균마찰계수 값에 도달하는 급격한 증가 양상을 보인다.In particular, the friction coefficient values of the three specimens showed a significant difference in the initial change within about 3,000 cycles, and the specimen according to the comparative example reached the average friction coefficient value before 50 revolutions, unlike the specimens according to Examples 1 and 2. Shows a sharp increase.
이에 비해, 실시예 1에 따른 시편은 약 500회의 회전횟수에 이르러서야 평균마찰계수 값에 도달하여 비교예에 비해 우수한 내마모 특성을 나타내며, 특히 실시예 2에 따른 시편은 약 2,500회의 회전횟수까지 낮은 마찰계수 값을 가지는 가장 우수한 내마모 특성을 나타내었다.In contrast, the specimen according to Example 1 reached the average friction coefficient value only after reaching 500 rotations, and exhibited excellent wear resistance compared to the comparative example. Particularly, the specimen according to Example 2 had up to about 2,500 rotations. It has the best wear resistance with low coefficient of friction.
이는 비례예에 의해 형성된 PVD TiN층이 모재와 TiN층 사이에 형성되는 뚜렷한 특성차(즉 경도차)로 인해 TiN층이 마모시험 초기에 쉽게 분리되어 떨어져 나감으로써 초기에 마찰계수의 급격한 증가를 초래하는 것이다. This is because the PVD TiN layer formed by the proportional example causes the TiN layer to easily separate and fall off at the beginning of the abrasion test due to the distinct characteristic difference (i.e. hardness difference) formed between the base material and the TiN layer. It is.
이에 비해, 본 발명의 실시예 1 및 2에 따른 시편의 경우, TCT 공정을 통해 모재와 경질층 사이에 뚜력한 경계선이 존재하지 않는 경사기능형으로 강화되었기 때문에 박막분리가 일어나지 않는다. 한편, 실시예 2의 경우 시효처리로 인한 회복 과정을 통해 모재의 인성증가와 강도향상이 이루어지기 때문에 가장 안정적이고 느리게 평균마찰계수 값에 도달하는 것으로 보인다.In contrast, in the case of the specimens according to Examples 1 and 2 of the present invention, thin film separation does not occur since the TCT process is strengthened to a slope functional type in which no strong boundary line exists between the base material and the hard layer. Meanwhile, in the case of Example 2, since the toughness and strength of the base metal are increased through the recovery process due to the aging treatment, the average friction coefficient value seems to be reached most stably and slowly.
한편, 마모특성을 분석하기 위해 사용된 세 시편의 모재인 CP Ti (Gr. 2)의 평균 마찰계수는 약 0.7 정도로 세 시편 모두 미처리 시험편보다는 상대적으로 낮은 마찰계수 값을 나타냈다. 이는 1N의 작은 하중으로 인하여 20,000회까지도 코팅층이 완전히 제거되지 않은 것으로 판단되며 물리적 증착만으로도 표면경도가 증가되는 일정한 효과를 얻을 수 있으나, TCT 공정이나 시효처리의 단일 또는 복합처리로 인하여 더욱 향상된 표면 내마모 특성을 얻을 수 있음을 알 수 있다.On the other hand, the average coefficient of friction of CP Ti (Gr. 2), the base material of the three specimens used to analyze the wear characteristics, was about 0.7, and all three specimens showed relatively lower coefficients of friction than the untreated specimens. It is judged that the coating layer is not completely removed even up to 20,000 times due to the small load of 1N, and it is possible to obtain a certain effect of increasing the surface hardness only by physical vapor deposition. It can be seen that the wear characteristics can be obtained.
단면 경도Sectional hardness
순수 타이타늄 기지 표면에 질화물의 생성유무와 각 시편의 표면처리 조건이 질화물 생성에 미치는 영향을 고찰하기 위해 세 시편의 표면경도를 측정하였다. 표면처리가 수행되지 않은 순수 타이타늄인 CP Ti (Gr. 2)의 경우, 비커스 경도는 약 167 Hv 인데 반하여, 표면경화 처리된 세 시편의 경우, 비교예가 373 Hv, 실시예 1이 441 Hv, 실시예 2가 489 Hv로 각각 측정되었다. 즉, 표면경화 처리의 방법에 관계없이 경질피막의 형성으로 인해 표면경도가 상당히 증가함을 알 수 있다.The surface hardness of three specimens was measured to investigate the effect of nitride on the surface of pure titanium matrix and the effect of surface treatment conditions on the specimens. In the case of pure titanium without surface treatment, CP Ti (Gr. 2), the Vickers hardness was about 167 Hv, whereas for the three surface-hardened specimens, Comparative Example 373 Hv, Example 1 441 Hv, Example 2 was measured at 489 Hv, respectively. That is, it can be seen that the surface hardness increases considerably due to the formation of the hard film regardless of the method of surface hardening treatment.
그러나 CP Ti 모재에 직접 TiN 박막을 코팅한 경우보다 TCT 공정으로 모재를 먼저 강화시킨 다음 그 위에 박막코팅을 수행한 실시예 1과 2에 따른 시편의 경도가 단순한 PVD TiN층의 형성에 비해 경도를 보다 향상시킬 수 있음을 알 수 있는데, 이는 실시예 1 및 2에 따른 열처리 과정이 보다 강한 표면강도를 얻는데 효과적임을 보여준다.However, when the TiN thin film was directly coated on the CP Ti base material, the hardness of the specimens according to Examples 1 and 2 in which the base material was first strengthened by the TCT process and the thin film was coated thereon was compared with that of the PVD TiN layer. It can be seen that it can be further improved, which shows that the heat treatment process according to Examples 1 and 2 is effective in obtaining a stronger surface strength.
도 7은 비커스 경도 측정을 이용하여, 비교예, 실시예 1 및 실시예 2에 따른 시편들의 표면에서부터 단면 깊이에 따른 경도변화를 측정한 결과를 나타낸 것이다.Figure 7 shows the results of measuring the hardness change according to the cross-sectional depth from the surface of the specimens according to Comparative Example, Example 1 and Example 2 using Vickers hardness measurement.
단면경도는 시편의 표면에서부터 기지 중앙부 쪽으로 측정한 결과이다. 최외각 표면부 쪽의 단면경도는, 비교예에 따른 시편이 340 Hv 정도인데 비해, 실시예 1에 따른 시편은 450 Hv이고, 실시예 2에 따른 시편은 500 Hv 이상으로 기지의 3배 이상 높은 값을 나타내었다.The cross-sectional hardness is measured from the surface of the specimen toward the center of the matrix. The cross-sectional hardness of the outermost surface portion is about 340 Hv of the specimen according to the comparative example, while the specimen according to Example 1 is 450 Hv, and the specimen according to Example 2 is 500 Hv or more, three times higher than known. The value is shown.
또한, 비교예에 따른 시편의 경질층은 수 마이크로미터 내의 두께를 가지며, 표면경질층 이후 CP Ti의 표준 경도값인 약 160 Hv까지 불연속적인 급격한 경도 감소가 관찰된다.In addition, the hard layer of the specimen according to the comparative example has a thickness within a few micrometers, and after the surface hard layer, a sudden sudden decrease in hardness up to about 160 Hv, which is the standard hardness value of CP Ti, is observed.
이에 비해, 본 발명의 실시예 1 및 2에 따른 시편의 경우에는 표면으로부터 깊이의 증가에 따라 경도가 연속적으로 감소하는데, 실시예 1의 경우 약 80㎛의 깊이까지도 기지의 경도값보다 높은 경도값을 유지하였으며, 실시예 2의 경우 약 100㎛ 까지 기지의 경도값보다 높은 경도값을 유지하였다. 이러한 결과는 모재에 수렴한 각각의 일정 깊이만큼 질소 및 산소로 이루어진 침입형 원소가 확산되어 경질층을 형성하였음을 의미하고 이는 주사전자현미경의 단면조직 관찰결과와 일치한다.In contrast, in the case of the specimens according to Examples 1 and 2 of the present invention, the hardness decreases continuously as the depth increases from the surface. In Example 1, the hardness value is higher than the known hardness value even at a depth of about 80 μm. In the case of Example 2, a hardness value higher than the known hardness value was maintained up to about 100 μm. These results indicate that the penetration element consisting of nitrogen and oxygen was diffused to form a hard layer by a predetermined depth converged to the base metal, which is consistent with the observation of the cross-sectional structure of the scanning electron microscope.
또한, 이러한 경사기능형 경질층의 경도분포 결과는 앞서 평가 분석한 마찰특성(도 6)과 비교할 때, 실시예 2에 따른 시편이 높은 내부 경도값과 보다 두껍게 형성된 경사기능형 경질층으로 인해 초기 마찰횟수의 증가에도 불구하고 마찰계수가 가장 느리게 상승하여 2,500회 이상에 이르러서야 비로소 경질층 이외의 평균적인 마찰계수에 도달하여 수렴하는 경향과도 일치한다.In addition, the hardness distribution results of the inclined functional hard layer is initially due to the higher internal hardness and thicker inclined functional hard layer formed in the specimen according to Example 2 when compared with the friction characteristics (Fig. 6). In spite of the increase in the number of frictions, the coefficient of friction rises the slowest and reaches more than 2,500 times, which coincides with the convergence tendency to reach the average coefficient of friction other than the hard layer.
이상과 같은 마찰특성 및 경도특성 결과로부터, 본 발명에 따른 경질층 형성방법이 종래의 경질층 형성방법에 비해 우수한 물성의 경질층을 단시간 내에 형성할 수 있도록 함을 알 수 있다. From the results of friction and hardness characteristics as described above, it can be seen that the hard layer forming method according to the present invention enables formation of a hard layer having excellent physical properties in a short time as compared with the conventional hard layer forming method.

Claims (12)

  1. 타이타늄의 표층에 경질층을 형성하는 방법으로,By forming a hard layer on the surface layer of titanium,
    (a) 열처리 장치에 타이타늄을 투입하고 배기하여 기압이 10-4 torr 이하가 되도록 유지하는 단계;(a) injecting titanium into the heat treatment apparatus and evacuating to maintain the atmospheric pressure below 10 -4 torr;
    (b) 상기 타이타늄을 730 ~ 800℃에서 10분 ~ 5시간 동안 가열하여 상기 타이타늄의 표면에 형성된 산화막을 제거하는 전처리 단계;(b) a pretreatment step of heating the titanium at 730 to 800 ° C. for 10 minutes to 5 hours to remove an oxide film formed on the surface of the titanium;
    (c) 상기 열처리 장치에 질소, 산소, 탄소 중에서 선택된 1종 이상의 가스를 주입하고 상기 타이타늄을 740 ~ 950℃에서 30분 ~ 20시간 동안 가열하여, 상기 타이타늄 합금의 표면에 상기 가스의 농도 구배를 갖는 경질층이 형성되도록 하는 단계; 및(c) injecting at least one gas selected from nitrogen, oxygen, and carbon into the heat treatment apparatus and heating the titanium at 740 to 950 ° C. for 30 minutes to 20 hours to obtain a concentration gradient of the gas on the surface of the titanium alloy. Allowing a hard layer to be formed; And
    (d) 상기 타이타늄을 냉각시키는 단계;를 포함하는 방법.(d) cooling the titanium.
  2. 제 1 항에 있어서, The method of claim 1,
    상기 (a) 단계의 기압은 5×10-5 torr 이하인 것을 특징으로 하는 방법.The pressure in step (a) is characterized in that less than 5 × 10 -5 torr.
  3. 제 1 항에 있어서, The method of claim 1,
    상기 (b) 단계는 10분 ~ 1시간 동안 수행되는 것을 특징으로 하는 방법.The step (b) is characterized in that it is carried out for 10 minutes to 1 hour.
  4. 제 1 항에 있어서,The method of claim 1,
    상기 (c) 단계의 온도가 상기 (b) 단계의 온도에 비해 높을 수 있는 공정을 포함하는 것을 특징으로 하는 방법.The process of step (c) may be higher than the temperature of step (b).
  5. 제 1 항에 있어서, The method of claim 1,
    상기 (c) 단계는 740 ~ 850℃에서 수행되는 것을 특징으로 하는 방법.Step (c) is characterized in that it is carried out at 740 ~ 850 ℃.
  6. 제 1 항에 있어서, The method of claim 1,
    상기 (d) 단계는 스텝 냉각법으로 냉각되는 공정을 포함하는 것을 특징으로 하는 방법.Step (d) comprises the step of cooling by a step cooling method.
  7. 제 1 항에 있어서,The method of claim 1,
    상기 (d) 단계는 500 ~ 800℃에서 30분 ~ 30 시간 동안 유지하는 시효(aging) 단계를 포함하는 것을 특징으로 하는 방법.The step (d) is characterized in that it comprises an aging step of maintaining for 30 minutes to 30 hours at 500 ~ 800 ℃.
  8. 제 1 항에 있어서,The method of claim 1,
    상기 (d) 단계 후에, 추가로 CVD법 또는 PVD법 등과 같은 over-layer 코팅법을 이용하여 1층 이상의 코팅층을 형성하는 것을 특징으로 하는 방법.After the step (d), further characterized in that to form one or more coating layer by using an over-layer coating method such as CVD method or PVD method.
  9. 제 1 항에 있어서,The method of claim 1,
    상기 (c) 단계의 가스는 산소와 질소, 또는 탄소와 질소의 혼합가스인 것을 특징으로 하는 방법.The gas of step (c) is characterized in that the oxygen and nitrogen, or a mixture of carbon and nitrogen gas.
  10. 제 1 항 내지 제 9 항 중 어느 한 항에 있어서, The method according to any one of claims 1 to 9,
    상기 타이타늄은 순 타이타늄 또는 타이타늄 합금인 것을 특징으로 하는 방법.The titanium is pure titanium or a titanium alloy.
  11. 제 1 항 내지 제 9 항 중 어느 한 항에 기재된 방법에 의해 형성된 경질층을 구비한 타이타늄.Titanium provided with the hard layer formed by the method of any one of Claims 1-9.
  12. 제 1 항 내지 제 9 항 중 어느 한 항에 기재된 방법에 의해 형성된 경질층을 구비한 타이타늄 부품.The titanium component provided with the hard layer formed by the method of any one of Claims 1-9.
PCT/KR2012/002146 2012-03-23 2012-03-23 Method for forming hard layer on titanium, and talloy having hard layer formed by same WO2013141422A1 (en)

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