WO2013073525A1 - Industrial method for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines - Google Patents

Industrial method for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines Download PDF

Info

Publication number
WO2013073525A1
WO2013073525A1 PCT/JP2012/079380 JP2012079380W WO2013073525A1 WO 2013073525 A1 WO2013073525 A1 WO 2013073525A1 JP 2012079380 W JP2012079380 W JP 2012079380W WO 2013073525 A1 WO2013073525 A1 WO 2013073525A1
Authority
WO
WIPO (PCT)
Prior art keywords
cyclopropylaminomethyl
optically active
cbz
fluoropyrrolidine
represented
Prior art date
Application number
PCT/JP2012/079380
Other languages
French (fr)
Japanese (ja)
Inventor
英之 鶴田
泰子 濁川
裕力 名倉
将徳 伏見
石井 章央
勉 南明
絢子 高木
雅士 鈴木
浩也 佐藤
Original Assignee
セントラル硝子株式会社
杏林製薬株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by セントラル硝子株式会社, 杏林製薬株式会社 filed Critical セントラル硝子株式会社
Publication of WO2013073525A1 publication Critical patent/WO2013073525A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D207/00Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/04Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
    • C07D207/10Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D207/12Oxygen or sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
    • C07B53/00Asymmetric syntheses

Definitions

  • the present invention relates to a method for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines.
  • Patent Documents 1 to 3 Methods for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines are disclosed in Patent Documents 1 to 3. Among them, the method described in Patent Document 3 is an improved method based on an industrial production method.
  • Patent Document 4 discloses an alcohol based on a combination of sulfuryl fluoride (SO 2 F 2 ) and an organic base (performed in the presence of a “salt or complex comprising an organic base and hydrogen fluoride” as necessary). A class of dehydroxyfluorination reactions has been disclosed.
  • Patent Document 3 discloses perfluoro-1-octanesulfonyl fluoride, which is relatively difficult to obtain on a large scale, and relatively expensive 1,8-diazabicyclo [5.4.0] undec-7-ene (DBU). It is necessary to use it. Further, DBU salt of perfluoro-1-octanesulfonic acid, which has been pointed out as environmentally toxic, is produced as a by-product in a quantitative manner, and its removal requires purification by column chromatography. Therefore, it was not an industrially easy manufacturing method.
  • DBU 1,8-diazabicyclo [5.4.0] undec-7-ene
  • an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector [Cbz represents a benzyloxycarbonyl group, and Ns represents a nitrobenzenesulfonyl group (the same applies hereinafter). It was found that an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product can be produced by reacting with a sulfuryl fluoride in the presence of an organic base (dehydroxyfluorination step). By selecting a nitrobenzenesulfonyl group as the amino protecting group at the 3-cyclopropylaminomethyl moiety, the desired fluorinated product can be obtained in high yield.
  • the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector which is a raw material substrate, can be suitably converted from the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector as a precursor.
  • the precursor has a hydroxyl group and an amino group in the molecule, but the amino group can be selectively protected.
  • the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector obtained in the dehydroxyfluorination step can selectively deprotect the nitrobenzenesulfonyl protecting group.
  • a series of preparations from the precursor to selective deprotection is a preferred embodiment of the present invention.
  • the desired reaction proceeds satisfactorily by performing the dehydroxyfluorination step in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
  • optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector and the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector are extremely important intermediates in the production method of the present invention. .
  • the present invention provides an industrial process for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines of the following [Invention 1] to [Invention 3].
  • An optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product comprising a step of converting to an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product represented by (dehydroxyfluorination step). Production method.
  • a step of converting to an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by (amino group protecting step) By reacting the protected optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs with sulfuryl fluoride in the presence of an organic base, the compound represented by the general formula [2]: [Wherein, Cbz and Ns are the same as those in the general formula [1].
  • a step (dehydroxyfluorination step) of converting to an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protectant represented by the above, and an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector By selectively deprotecting the nitrobenzenesulfonyl protecting group, the general formula [4]: [Wherein, Cbz is the same as the general formula [2].
  • Sulfuryl fluoride used in the dehydroxyfluorination process of the present invention is widely used as a fumigant, and the fluorosulfuric acid produced as a by-product in terms of quantity is also less environmental impact, and its salts with organic bases can be easily washed with water. It can be removed by an after-treatment operation.
  • the organic base used in the dehydroxyfluorination step of the present invention may be a relatively inexpensive one. Therefore, it is an industrially easy manufacturing method.
  • the nitrobenzenesulfonyl protecting group found in the present invention is not disclosed at all in Patent Document 3, and the desired fluorinated product can be obtained in a high yield.
  • selective deprotection to the 1-position benzyloxycarbonyl protecting group is possible.
  • optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained in the selective deprotection step is derived from a salt with an inorganic acid such as hydrogen chloride and recrystallized and purified. Goods can be obtained.
  • the present invention is a useful manufacturing method that solves the problems of the prior art at once.
  • the present invention uses a compound in which the nitrobenzenesulfonyl group of the protected optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs is substituted with a benzyl group, a benzyloxycarbonyl group and a tert-butoxycarbonyl group, respectively, as a raw material substrate. Even when this production condition was applied, the yield of the desired fluorinated product was much lower than that of the present invention (nitrobenzenesulfonyl group).
  • the production method of Invention 2 which is a preferred embodiment of the present invention, includes three steps: “1. amino group protection step”, “2. dehydroxyfluorination step” and “3. selective deprotection step”.
  • Invention 1 corresponds to “2. Dehydroxyfluorination step” of Invention 2
  • Invention 3 corresponds to a preferred embodiment in “Dehydroxyfluorination step” of Invention 1 or 2.
  • Amino group protection step This step is carried out by protecting the amino group of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] with a nitrobenzenesulfonyl group.
  • an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs represented by the formula:
  • Cbz represents a benzyloxycarbonyl group.
  • optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] can be similarly produced with reference to Patent Document 3.
  • the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] may be its enantiomer (3R, 4S).
  • the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] is an inorganic acid such as hydrogen chloride, hydrogen bromide and sulfuric acid or oxalic acid, phthalic acid and paratoluenesulfonic acid, etc. It can also be used in the form of a salt with an organic acid. Accordingly, the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protected body represented by the general formula [3] in the claims is treated as including these enantiomers and salts.
  • Amino group protection process is a general method in organic synthesis [eg, Protective Groups Organic Synthesis, Third Edition, 1999, John Wiley & Sons, Inc., The Chemical Society of Japan, 5th edition, Experimental Chemistry Course (Maruzen), etc.] This can be done by adopting Although the following method is mentioned as a specific example, Naturally it is not limited to this.
  • the nitro group of the nitrobenzenesulfonyl halide represented by the general formula [5] is substituted at the ortho, meta or para position. Of these, the ortho and para positions are preferred, and the ortho position is particularly preferred.
  • X in the nitrobenzenesulfonyl halide represented by the general formula [5] represents a halogen atom.
  • the halogen atom is fluorine, chlorine, bromine or iodine. Of these, chlorine and bromine are preferable, and chlorine is particularly preferable.
  • ortho and para-nitrobenzenesulfonyl fluoride or ortho and para-nitrobenzenesulfonyl chloride are preferable, and ortho and para-nitrobenzenesulfonyl chloride are particularly preferable.
  • Ortho and para-nitrobenzenesulfonyl chloride are commercially available and are readily available. Among these, ortho-nitrobenzenesulfonyl chloride is very preferable because it is cheaper and suitable for production on a large scale. In the present invention, ortho and para-nitrobenzenesulfonyl fluoride can also be suitably used.
  • the amount of the nitrobenzenesulfonyl halide represented by the general formula [5] is 0.7 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3]. It may be used, preferably 0.8 to 5 mol, particularly preferably 0.9 to 3 mol.
  • the base is an inorganic base such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide.
  • an inorganic base such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide.
  • Organic bases such as 0] non-5-ene and 1,8-diazabicyclo [5.4.0] undec-7-ene.
  • lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, lithium carbonate, sodium carbonate, potassium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide, triethylamine, diisopropylethylamine, pyridine, 2,6-lutidine, 2, 4,6-collidine, 4-dimethylaminopyridine, 1,5-diazabicyclo [4.3.0] non-5-ene and 1,8-diazabicyclo [5.4.0] undec-7-ene are preferred, Sodium bicarbonate, potassium bicarbonate, sodium carbonate, potassium carbonate, sodium hydroxide, potassium hydroxide, triethylamine, diisopropylethylamine, pyridine, 2,6-lutidine, 4-dimethylaminopyridine and 1,8-diazabicyclo [5.4 .0] Undeca-7-D It is particularly preferred. These bases can be used alone or in combination.
  • the amount of the base used may be 0.35 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3], preferably 0.4 to 20 mol. 0.45 to 15 mol is particularly preferable.
  • the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] is used in the form of a salt with an inorganic acid or an organic acid, use of a base necessary for neutralizing the acid is used. It is convenient to add the amount in consideration and to carry out the neutralization of the acid and the protection of the amino group continuously as one reaction.
  • the base used for acid neutralization is the same as the base described in this step.
  • Reaction solvents include aliphatic hydrocarbons such as n-hexane and n-heptane, aromatic hydrocarbons such as toluene and xylene, halogens such as methylene chloride and 1,2-dichloroethane, tetrahydrofuran and tert-butyl methyl ether Ethers such as ethyl acetate and esters such as ethyl acetate and n-butyl acetate, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide and 1,3-dimethyl-2-imidazolidinone Amides such as acetonitrile, nitriles such as acetonitrile and propionitrile, dimethyl sulfoxide, and water.
  • aliphatic hydrocarbons such as n-hexane and n-heptane
  • aromatic hydrocarbons such as toluene and x
  • reaction solvents can be used alone or in combination. This step can also be carried out in a heterogeneous system or a two-phase system of “a reaction solvent immiscible with water” and water.
  • the reaction solvent may be used in an amount of 0.05 L (liter) or more per 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3]. To 20 L is preferred, and 0.15 to 10 L is particularly preferred. This step can also be performed in a solvent-free mixture without using a reaction solvent.
  • the order of addition is not particularly limited, and an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] and a nitrobenzenesulfonyl halide represented by the general formula [5] are used as a reaction solvent.
  • an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] and a nitrobenzenesulfonyl halide represented by the general formula [5] are used as a reaction solvent.
  • the base is gradually added later, or when the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector and the base are added to the reaction solvent, the nitrobenzenesulfonyl halides and a predetermined amount of the remaining amount are added. Adding bases in portions can give good results.
  • the reaction temperature may be in the range of ⁇ 80 to + 200 ° C., preferably ⁇ 60 to + 150 ° C., particularly preferably ⁇ 40 to + 100 ° C.
  • the reaction time may be within a range of 24 hours or less, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, nuclear magnetic resonance, It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
  • an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1] can be obtained.
  • the crude product can be purified to a high purity by activated carbon treatment, recrystallization, column chromatography or the like, if necessary.
  • an inorganic acid for example, a hydrogen chloride salt or a hydrobromide salt
  • halide ions derived from the nitrobenzenesulfonyl halides shown below can cause impurities as a by-product in the dehydroxyfluorination process (see JP 2010-163422 A).
  • the target compound and the organic layer containing the nitrobenzenesulfonyl halide are mixed with ammonia, methylamine, ethylamine, dimethylamine, diethylamine, pyrrolidine.
  • a primary or secondary amine having 1 to 6 carbon atoms such as piperidine, an aqueous solution of ammonia or the amine, or a lower alcohol solution having 1 to 6 carbon atoms such as ammonia or the amine (for example, methanol solution of methylamine, ethylamine) Methanol solution, dimethylamine methanol solution, diethylamine methanol solution, methylamine ethanol solution, ethylamine ethanol solution, dimethylamine ethanol solution, diethylamine ethanol solution, pyrrolidine methanol It is effective to make it come into contact with an aqueous solution, an ethanol solution of pyrrolidine, etc., which is a preferred embodiment (the nitrobenzenesulfonyl halides can be aminolyzed or hydrolyzed to remove liberated halide ions to the aqueous layer. ).
  • the amount of ammonia or the primary or secondary amine used may be 0.1 mol or more, preferably 0.2 to 2000 mol, preferably 0.3 to 1000 mol, relative to 1 mol of unreacted nitrobenzenesulfonyl halides. Is particularly preferred.
  • Dehydroxyfluorination step This step is carried out by reacting the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protectant represented by the general formula [1] with sulfuryl fluoride in the presence of an organic base. This is a step of converting into an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the formula [2].
  • CbzNs protected body represented by the general formula [1]
  • Cbz is the same as in the general formula [3]
  • Ns represents a nitrobenzenesulfonyl group.
  • optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1] may be its enantiomer (3S, 4S). Therefore, the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1] in the claims is treated as including this enantiomer.
  • the amount of sulfuryl fluoride used may be 0.7 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1]. Is preferable, and 0.9 to 15 mol is particularly preferable.
  • the organic base is the same as the organic base described in “1. Amino group protection step”. However, it is not limited to these, The organic base generally used in organic synthesis can also be employ
  • the amount of the organic base used may be 0.7 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1].
  • 0.9 to 15 mol is particularly preferable.
  • the reaction of the protected optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs represented by the general formula [1] with sulfuryl fluoride is carried out by “from organic base and hydrogen fluoride. More preferably, it is carried out in the presence of a “salt or complex”.
  • organic base in the “salt or complex comprising an organic base and hydrogen fluoride” is the same as the organic base described in this step. The same applies to “preferred” and “particularly preferred organic base”. These organic bases of “a salt or complex comprising an organic base and hydrogen fluoride” can be used alone or in combination.
  • the molar ratio of the organic base to hydrogen fluoride in the “salt or complex comprising an organic base and hydrogen fluoride” may be used in the range of 100: 1 to 1: 100, preferably 50: 1 to 1:50, Particularly preferred is 25: 1 to 1:25.
  • the amount used when the “salt or complex comprising an organic base and hydrogen fluoride” is used is 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1].
  • the fluoride ion (F ⁇ ) may be 0.05 mol or more, preferably 0.07 to 30 mol, particularly preferably 0.09 to 15 mol.
  • reaction solvent is the same as the reaction solvent described in “1. Amino group protection step”. However, water is excluded. The same applies to “preferred” and “particularly preferred reaction solvent”. These reaction solvents can be used alone or in combination.
  • the reaction solvent may be used in an amount of 0.05 L or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1]. Preferably, 0.15 to 10 L is particularly preferable. This step can also be performed in a solvent-free mixture without using a reaction solvent.
  • the reaction temperature may be in the range of ⁇ 50 to + 200 ° C., preferably ⁇ 40 to + 150 ° C., particularly preferably ⁇ 30 to + 100 ° C.
  • the reaction time may be within a range of 48 hours, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, and nuclear magnetic resonance. It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
  • an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2] can be obtained by employing a general operation in organic synthesis.
  • the crude product can be purified to a high purity by activated carbon treatment, recrystallization, column chromatography or the like, if necessary. Since this step proceeds by the S N 2 reaction, the stereochemistry of the 4-position asymmetric carbon of the general formula [1] is reversed.
  • Selective deprotection step This step is carried out by selectively deprotecting the nitrobenzenesulfonyl protecting group of the protected optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs represented by the general formula [2]. This is a step for obtaining an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by [4].
  • optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2] may be its enantiomer (3S, 4R). Therefore, the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2] in the claims is treated as including this enantiomer.
  • the selective deprotection process is a common method in organic synthesis [for example, Protective Groups Organic Synthesis, Third Edition, 1999, John Wiley & Sons, Inc., The Chemical Society of Japan, 5th edition, Experimental Chemistry Course (Maruzen), etc. ] Can be used. Although the following method is mentioned as a specific example, Naturally it is not limited to this.
  • R in the thiols represented by the general formula [6] represents an alkyl group, a substituted alkyl group, a phenyl group or a substituted phenyl group.
  • the alkyl group is a linear or branched chain or cyclic group (having 3 or more carbon atoms) having 1 to 12 carbon atoms.
  • the substituted alkyl group and the substituted phenyl group each have a substituent in any number and in any combination on any carbon atom of the alkyl group and phenyl group. Such substituents are amino groups, hydroxyl groups, carboxyl groups and the like.
  • an alkyl group having 1 to 8 carbon atoms, a 2-hydroxyethyl group, a carboxymethyl group and a phenyl group are preferable, and a phenyl group is particularly preferable.
  • Thiophenol R is a phenyl group
  • the amount of the thiol represented by the general formula [6] is 0.7 mol or more based on 1 mol of the protected optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs represented by the general formula [2]. It is preferably 0.8 to 20 mol, particularly preferably 0.9 to 15 mol.
  • the base can be selected from the same bases listed in “1. Amino group protection step”. Among these, an inorganic base is preferable, and potassium carbonate, cesium carbonate, and lithium hydroxide are particularly preferable. These bases can be used alone or in combination. In the deprotection of the nitrobenzenesulfonyl protecting group of the amino group, the organic base 1,8-diazabicyclo [5.4.0] undec-7-ene is frequently used as the base. However, in the selective deprotection step of the present invention, milder reaction conditions can be adopted when using an inorganic base, and it is selected with respect to the 1-position benzyloxycarbonyl protecting group in good yield without side reactions. Deprotection can be performed (a preferred embodiment of the present invention). Of course, the use of an organic base in this step is not limited.
  • the amount of the base used may be 0.35 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2], preferably 0.4 to 20 mol. 0.45 to 15 mol is particularly preferable.
  • the reaction solvent is the same as the reaction solvent described in “1. Amino group protection step”. Among them, n-heptane, toluene, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, acetonitrile and dimethyl Sulfoxides are preferred, with tetrahydrofuran, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, acetonitrile and dimethyl sulfoxide being particularly preferred.
  • the reaction solvent may be used in an amount of 0.05 L or more per 1 mol of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2]. Preferably, 0.15 to 10 L is particularly preferable. This step can also be performed in a solvent-free mixture without using a reaction solvent.
  • the reaction temperature may be in the range of ⁇ 50 to + 100 ° C., preferably ⁇ 40 to + 90 ° C., particularly preferably ⁇ 30 to + 80 ° C.
  • the reaction time may be performed within 36 hours, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, nuclear magnetic resonance, It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
  • an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the general formula [4] can be obtained by employing a general operation in organic synthesis.
  • the crude product can be purified to a high purity by activated carbon treatment, recrystallization, column chromatography or the like, if necessary.
  • optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the general formula [4] may be its enantiomer (3R, 4R). Therefore, the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected body represented by the general formula [4] in the claims is treated as including these enantiomers and salts.
  • the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the general formula [4] is an inorganic acid such as hydrogen chloride, hydrogen bromide and sulfuric acid or oxalic acid, phthalic acid and paratoluenesulfonic acid, etc.
  • a high-purity product can be obtained by recrystallization and purification by inducing a salt with an organic acid (a preferred embodiment of the present invention).
  • Example 1 In a glass reaction vessel, the following formula: 25.0 g (76.5 mmol, 1.00 eq) of hydrogen chloride (HCl) salt of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the following formula: Ortho with 125 mL (1.63 L / mol) of acetonitrile -Add 17.1 g (77.2 mmol, 1.01 eq) of nitrobenzenesulfonyl chloride, soak in a refrigerant bath at -10 ° C, gradually add 16.3 g (161 mmol, 2.10 eq) of triethylamine, and stir at the same temperature for 35 minutes did.
  • HCl hydrogen chloride
  • the conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis.
  • the reaction-terminated liquid is diluted with 250 mL of toluene, washed with 125 mL of 5% aqueous sodium hydrogen carbonate solution, the recovered aqueous layer is extracted with 63.0 mL of toluene, and the combined organic layers are washed with 63.0 mL of water and washed with 10% sulfuric acid.
  • the organic layer was washed with 63.0 mL of sodium aqueous solution, and the collected organic layer was concentrated under reduced pressure.
  • the total amount of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector obtained above was 40.1 g (76.5 mmol, 1.00 eq), acetonitrile 75 0.0 mL (0.980 L / mol), 31.0 g (306 mmol, 4.00 eq) of triethylamine and 12.3 g (76.3 mmol, 0.997 eq) of triethylamine / hydrogen trifluoride were added, and immersed in a refrigerant bath at 0 ° C.
  • Example 2 In a glass reaction vessel, the following formula: 150 g (459 mmol, 1.00 eq) of a hydrogen chloride (HCl) salt of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the formula: 675 mL (1.47 L / mol) of acetonitrile and ortho-nitrobenzenesulfonyl chloride 103 g (465 mmol, 1.01 eq) was added, immersed in a 0 ° C. refrigerant bath, 98.2 g (970 mmol, 2.11 eq) of triethylamine was gradually added, and the mixture was stirred at the same temperature for 3 hours.
  • HCl hydrogen chloride
  • the conversion rate of the reaction finished liquid was 99% according to liquid chromatography analysis.
  • the reaction-terminated liquid is diluted with 1.35 L of toluene, washed with 675 mL of 5% aqueous sodium hydrogen carbonate solution, the recovered aqueous layer is extracted with 300 mL of toluene, the combined organic layers are washed with 300 mL of water, and 10% aqueous sodium sulfate solution Wash with 300 mL, concentrate the recovered organic layer under reduced pressure, and azeotrope with 300 mL of ethyl acetate and 300 mL of toluene to obtain the following formula:
  • 237 g of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by the formula:
  • the yield was quantitative (theoretical yield 218 g).
  • Example 3 In a glass reaction vessel, the following formula: 10.0 g (30.6 mmol, 1.00 eq) of hydrogen chloride (HCl) salt of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the following: 45.0 mL (1.47 L / mol) of ethyl acetate ) And 34.0 g of a 15% aqueous potassium carbonate solution (potassium carbonate 36.9 mmol, 1.21 eq), soaked in a 0 ° C. refrigerant bath, and 6.87 g (31.0 mmol, 1.01 eq) of ortho-nitrobenzenesulfonyl chloride.
  • HCl hydrogen chloride
  • Cbz protector represented by the following: 45.0 mL (1.47 L / mol) of ethyl acetate
  • 34.0 g of a 15% aqueous potassium carbonate solution (potassium carbonate 36.9 mmol, 1.21
  • reaction-terminated liquid is diluted with 15.0 mL of ethyl acetate, separated, and the recovered aqueous layer is extracted with 15.0 mL of ethyl acetate. The recovered organic layers are combined and washed twice with 10.0 mL of 5% aqueous sodium sulfate solution.
  • the conversion rate of the reaction finished liquid was 99% according to liquid chromatography analysis. 75.0 mL of 10% aqueous potassium carbonate solution was added to the reaction completed solution, extracted with 30.0 mL of ethyl acetate, the recovered aqueous layer was extracted with 15.0 mL of ethyl acetate, and the recovered organic layers were combined and 2N hydrochloric acid (containing 5% sodium chloride).
  • the total amount (30.6 mmol) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz obtained above was dissolved in 60.0 mL of ethyl acetate and 20.0 mL of n-heptane, and a refrigerant at 0 ° C. Immerse in a bath and add hydrogen chloride-methanol reagent (5-10%, manufactured by Tokyo Chemical Industry Co., Ltd.) until the pH is 3 (25.0 mL), gradually add 160 mL of n-heptane, and continue at the same temperature for 1 hour.
  • the conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis.
  • the reaction-terminated liquid is diluted with 90.0 mL of toluene, washed with 45.0 mL of 5% aqueous sodium hydrogen carbonate solution, the recovered aqueous layer is extracted with 20.0 mL of toluene, and the recovered organic layers are combined and 10.0 mL of 3% aqueous ammonia.
  • An optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by the following formula was obtained. No ortho-nitrobenzenesulfonyl chloride was detected by liquid chromatography analysis.
  • the total amount of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above (30.6 mmol) was dissolved in 90.0 mL of ethyl acetate and 270 mL of n-heptane, and placed in a 0 ° C. refrigerant bath.
  • Example 5 The reaction was carried out in the same manner as in Example 4 except that washing with 10.0 mL of 3% aqueous ammonia was stirred and contacted with 0.5 mL of 40% methylamine / methanol solution for 30 minutes. As a result, a hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the above formula was obtained in the same yield and recovery rate.
  • HCl hydrogen chloride
  • the conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis.
  • the reaction end solution was diluted with 100 mL of toluene, and extracted with 50 mL of ethyl acetate.
  • the recovered aqueous layer was extracted with 25 mL of toluene and 25 mL of ethyl acetate, and the recovered organic layers were combined and washed with 50 mL of 10% aqueous sodium sulfate. After cooling the organic layer to 15 to 20 ° C.
  • the total amount of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector obtained above (referred to as 153 mmol, 1.00 eq), 153 mL of ethyl acetate (1.0 L) / Mol) and 76.4 g (753 mmol, 4.9 eq) of triethylamine were added and immersed in a ⁇ 10 ° C. refrigerant bath.
  • Anhydrous hydrogen fluoride (11.4 g, 570 mmol, 3.7 eq) was blown from the bomb, then immersed in a 0 ° C.
  • the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected substance obtained above (76.9 g, 137 mmol, 1.00 eq), N, N-dimethylformamide (170 mL) 8 mol / L) and 57.0 g (412 mmol, 3.00 eq) of potassium carbonate, soak in a 0 ° C. refrigerant bath, add 42.4 g (385 mmol, 2.80 eq) of thiophenol, and heat to 40 ° C. Stir at temperature for 6 hours.
  • the conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis.
  • the reaction-terminated liquid was cooled to room temperature, 506 mL of water was added, and the mixture was extracted with 203 mL of ethyl acetate.
  • the recovered aqueous layer was extracted with 102 mL of ethyl acetate, and the recovered organic layers were combined, washed twice with 137 mL of 10% aqueous sodium sulfate, and back-extracted with 180 mL of 1N hydrochloric acid and 45 mL of 0.1N hydrochloric acid.
  • the total amount of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was dissolved in 270 mL of ethyl acetate, immersed in a 0 ° C. refrigerant bath, and chlorinated until the pH reached 3.
  • Hydrogen-methanol reagent (5-10%, manufactured by Tokyo Chemical Industry Co., Ltd.) was added (119 mL), and 450 mL of heptane was further added.
  • the total amount of hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was added to methanol (3 mL / g) -ethyl acetate (5 mL / g) -heptane (5 mL / g). 33.3 g of a hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the above formula was obtained. The recovery rate was 91%. Liquid chromatography purity was 99.35%.
  • optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines targeted in the present invention can be used as intermediates for medicines and agrochemicals.

Abstract

The present invention is a method for producing an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected form, comprising an amino group protection step for protecting amino groups of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protected form, a dehydroxyfluorination step for reacting the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected form obtained by the above-mentioned step with sulfuryl fluoride in the presence of an organic base, and a selective deprotection step for selective deprotection of the nitrobenzenesulfonyl protector groups of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected form obtained by the above-mentioned step (where Cbz is a benzyloxycarbonyl group and Ns is a nitrobenzenesulfonyl group).

Description

光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジン類の工業的な製造方法Industrial production method of optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines
 本発明は、光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジン類の製造方法に関する。 The present invention relates to a method for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines.
 光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジン類の製造方法は、特許文献1~3に開示されている。その中でも特許文献3に記載の方法は、工業的な製造方法を踏まえた改良法である。 Methods for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines are disclosed in Patent Documents 1 to 3. Among them, the method described in Patent Document 3 is an improved method based on an industrial production method.
 一方、特許文献4には、スルフリルフルオリド(SO22)と有機塩基との組み合わせ(必要に応じて「有機塩基とフッ化水素とからなる塩または錯体」の存在下に行う)によるアルコール類の脱ヒドロキシフッ素化反応が開示されている。 On the other hand, Patent Document 4 discloses an alcohol based on a combination of sulfuryl fluoride (SO 2 F 2 ) and an organic base (performed in the presence of a “salt or complex comprising an organic base and hydrogen fluoride” as necessary). A class of dehydroxyfluorination reactions has been disclosed.
国際公開第2003/078439号International Publication No. 2003/078439 特開2005-239617号公報JP 2005-239617 A 国際公開第2007/102567号International Publication No. 2007/102567 特開2006-290870号公報JP 2006-290870 A
 特許文献3では、大量規模での入手が比較的困難なパーフルオロ-1-オクタンスルホニルフルオリドや比較的高価な1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン(DBU)を用いる必要がある。さらに、環境毒性が指摘されているパーフルオロ-1-オクタンスルホン酸のDBU塩を量論的に副生し、その除去にはカラムクロマトグラフィーによる精製が必要である。よって、工業的に実施容易な製造方法ではなかった。 Patent Document 3 discloses perfluoro-1-octanesulfonyl fluoride, which is relatively difficult to obtain on a large scale, and relatively expensive 1,8-diazabicyclo [5.4.0] undec-7-ene (DBU). It is necessary to use it. Further, DBU salt of perfluoro-1-octanesulfonic acid, which has been pointed out as environmentally toxic, is produced as a by-product in a quantitative manner, and its removal requires purification by column chromatography. Therefore, it was not an industrially easy manufacturing method.
 一方、特許文献4によるアミノアルコール類の脱ヒドロキシフッ素化反応では、アミノ保護基の選択が重要である(特開2009-227596号公報および特開2009-286779号公報を参照)。特許文献3の類似反応においても、3-シクロプロピルアミノメチル部位のアミノ保護基の種類により、目的とするフッ素化物の収率が大きく影響されることが開示されている[高収率/ベンジル基(実施例7、16)vs.低収率/ベンジルオキシカルボニル基(実施例20)、tert-ブトキシカルボニル基(実施例22)]。 On the other hand, in the dehydroxyfluorination reaction of amino alcohols according to Patent Document 4, it is important to select an amino protecting group (see JP 2009-227596 A and JP 2009-286779 A). Also in the similar reaction of Patent Document 3, it is disclosed that the yield of the target fluorinated compound is greatly influenced by the type of amino protecting group at the 3-cyclopropylaminomethyl moiety [high yield / benzyl group. (Examples 7 and 16) vs. Low yield / benzyloxycarbonyl group (Example 20), tert-butoxycarbonyl group (Example 22)].
 この様な状況の下、工業的に実施容易な方法により光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジン類を高収率で製造するために好適なアミノ保護基を見出す必要がある。さらに、1位ベンジルオキシカルボニル保護基に対して選択的な脱保護が可能なアミノ保護基であれば、医農薬中間体としての用途が広がる。 Under such circumstances, it is necessary to find a suitable amino protecting group for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines in a high yield by an industrially easy method. Furthermore, if it is an amino protecting group capable of selective deprotection with respect to the 1-position benzyloxycarbonyl protecting group, it can be used as an intermediate for medical and agricultural chemicals.
 本発明者らは、鋭意研究の結果、光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体[Cbzはベンジルオキシカルボニル基を表し、Nsはニトロベンゼンスルホニル基を表す(以下同様)。]を有機塩基の存在下にスルフリルフルオリドと反応させることにより(脱ヒドロキシフッ素化工程)、光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体が製造できることを見出した。3-シクロプロピルアミノメチル部位のアミノ保護基としてニトロベンゼンスルホニル基を選択することにより、目的とするフッ素化物を高収率で得ることができる。 As a result of intensive studies, the present inventors have shown that an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector [Cbz represents a benzyloxycarbonyl group, and Ns represents a nitrobenzenesulfonyl group (the same applies hereinafter). It was found that an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product can be produced by reacting with a sulfuryl fluoride in the presence of an organic base (dehydroxyfluorination step). By selecting a nitrobenzenesulfonyl group as the amino protecting group at the 3-cyclopropylaminomethyl moiety, the desired fluorinated product can be obtained in high yield.
 原料基質である光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体は、前駆体として光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体から好適に変換することができる。該前駆体は分子内にヒドロキシル基とアミノ基を有するが、アミノ基を選択的に保護することができる。さらに、脱ヒドロキシフッ素化工程で得られる光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体は、ニトロベンゼンスルホニル保護基を選択的に脱保護することができる。よって、該前駆体から選択的脱保護までの一連の製造は、本発明の好ましい態様である。 The optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector, which is a raw material substrate, can be suitably converted from the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector as a precursor. The precursor has a hydroxyl group and an amino group in the molecule, but the amino group can be selectively protected. Furthermore, the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector obtained in the dehydroxyfluorination step can selectively deprotect the nitrobenzenesulfonyl protecting group. Thus, a series of preparations from the precursor to selective deprotection is a preferred embodiment of the present invention.
 さらに、脱ヒドロキシフッ素化工程を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことにより、所望の反応が良好に進行することも見出した。 Furthermore, it has also been found that the desired reaction proceeds satisfactorily by performing the dehydroxyfluorination step in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
 また、光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体および光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体は、本発明の製造方法における極めて重要な中間体である。 Further, the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector and the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector are extremely important intermediates in the production method of the present invention. .
 すなわち、本発明は、下記[発明1]~[発明3]の光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジン類の工業的な製造方法を提供する。 That is, the present invention provides an industrial process for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines of the following [Invention 1] to [Invention 3].
 [発明1]
 一般式[1]:
Figure JPOXMLDOC01-appb-C000007
[式中、Cbzはベンジルオキシカルボニル基を表し、Nsはニトロベンゼンスルホニル基を表す。]
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を有機塩基の存在下にスルフリルフルオリドと反応させることにより、一般式[2]:
Figure JPOXMLDOC01-appb-C000008
[式中、CbzおよびNsは前記一般式[1]と同じである。]
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体に変換する工程(脱ヒドロキシフッ素化工程)を含む、光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体の製造方法。
[Invention 1]
General formula [1]:
Figure JPOXMLDOC01-appb-C000007
[Wherein, Cbz represents a benzyloxycarbonyl group, and Ns represents a nitrobenzenesulfonyl group. ]
By reacting an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected compound represented by the following formula with sulfuryl fluoride in the presence of an organic base:
Figure JPOXMLDOC01-appb-C000008
[Wherein, Cbz and Ns are the same as those in the general formula [1]. ]
An optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product comprising a step of converting to an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product represented by (dehydroxyfluorination step). Production method.
 [発明2]
 一般式[3]:
Figure JPOXMLDOC01-appb-C000009
[式中、Cbzはベンジルオキシカルボニル基を表す。]
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体のアミノ基をニトロベンゼンスルホニル基で保護することにより、一般式[1]:
Figure JPOXMLDOC01-appb-C000010
[式中、Cbzは前記一般式[3]と同じであり、Nsはニトロベンゼンスルホニル基を表す。]
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体に変換する工程(アミノ基保護工程)、
 該光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を有機塩基の存在下にスルフリルフルオリドと反応させることにより、一般式[2]:
Figure JPOXMLDOC01-appb-C000011
[式中、CbzおよびNsは前記一般式[1]と同じである。]
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体に変換する工程(脱ヒドロキシフッ素化工程)、および
 該光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体のニトロベンゼンスルホニル保護基を選択的に脱保護することにより、一般式[4]:
Figure JPOXMLDOC01-appb-C000012
[式中、Cbzは前記一般式[2]と同じである。]
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を得る工程(選択的脱保護工程)を含む、光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の製造方法。
[Invention 2]
General formula [3]:
Figure JPOXMLDOC01-appb-C000009
[Wherein, Cbz represents a benzyloxycarbonyl group. ]
By protecting the amino group of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protected group represented by the following general formula [1]:
Figure JPOXMLDOC01-appb-C000010
[Wherein, Cbz is the same as in the general formula [3], and Ns represents a nitrobenzenesulfonyl group. ]
A step of converting to an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by (amino group protecting step),
By reacting the protected optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs with sulfuryl fluoride in the presence of an organic base, the compound represented by the general formula [2]:
Figure JPOXMLDOC01-appb-C000011
[Wherein, Cbz and Ns are the same as those in the general formula [1]. ]
A step (dehydroxyfluorination step) of converting to an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protectant represented by the above, and an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector By selectively deprotecting the nitrobenzenesulfonyl protecting group, the general formula [4]:
Figure JPOXMLDOC01-appb-C000012
[Wherein, Cbz is the same as the general formula [2]. ]
Production of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product comprising a step of obtaining an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by (selective deprotection step) Method.
 [発明3]
 脱ヒドロキシフッ素化工程における前記スルフリルフルオリドとの反応を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことを特徴とする、発明1または2に記載の方法。
[Invention 3]
3. The method according to claim 1 or 2, wherein the reaction with the sulfuryl fluoride in the dehydroxyfluorination step is carried out in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
 本発明の脱ヒドロキシフッ素化工程で用いるスルフリルフルオリドは燻蒸剤として広く使われており、さらに量論的に副生するフルオロ硫酸も環境負荷が少なく、その有機塩基との塩も水洗等の簡便な後処理操作で除去することができる。また、本発明の脱ヒドロキシフッ素化工程で用いる有機塩基は比較的安価なものも利用することができる。よって、工業的に実施容易な製造方法である。 Sulfuryl fluoride used in the dehydroxyfluorination process of the present invention is widely used as a fumigant, and the fluorosulfuric acid produced as a by-product in terms of quantity is also less environmental impact, and its salts with organic bases can be easily washed with water. It can be removed by an after-treatment operation. In addition, the organic base used in the dehydroxyfluorination step of the present invention may be a relatively inexpensive one. Therefore, it is an industrially easy manufacturing method.
 また、3-シクロプロピルアミノメチル部位の好適なアミノ保護基として、本発明で見出したニトロベンゼンスルホニル保護基は、特許文献3において一切開示されておらず、目的とするフッ素化物が高収率で得られるだけでなく、1位ベンジルオキシカルボニル保護基に対する選択的な脱保護も可能である。 Further, as a suitable amino protecting group at the 3-cyclopropylaminomethyl moiety, the nitrobenzenesulfonyl protecting group found in the present invention is not disclosed at all in Patent Document 3, and the desired fluorinated product can be obtained in a high yield. In addition, selective deprotection to the 1-position benzyloxycarbonyl protecting group is possible.
 さらに、選択的脱保護工程で得られる光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体は、塩化水素等の無機酸との塩に誘導して再結晶精製することにより、高純度品を得ることができる。 Furthermore, the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained in the selective deprotection step is derived from a salt with an inorganic acid such as hydrogen chloride and recrystallized and purified. Goods can be obtained.
 この様に、本発明は従来技術の問題点を一挙に解決する有用な製造方法である。 Thus, the present invention is a useful manufacturing method that solves the problems of the prior art at once.
 ちなみに、光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体のニトロベンゼンスルホニル基を、それぞれベンジル基、ベンジルオキシカルボニル基およびtert-ブトキシカルボニル基に置換した化合物を原料基質に用いて本発明の製造条件を適用しても、目的とするフッ素化物の収率は本発明(ニトロベンゼンスルホニル基)に比べて格段に低いものであった。 Incidentally, the present invention uses a compound in which the nitrobenzenesulfonyl group of the protected optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs is substituted with a benzyl group, a benzyloxycarbonyl group and a tert-butoxycarbonyl group, respectively, as a raw material substrate. Even when this production condition was applied, the yield of the desired fluorinated product was much lower than that of the present invention (nitrobenzenesulfonyl group).
 以下、本発明を詳細に説明する。本発明の範囲はこれらの説明に拘束されることはなく、以下の例示以外についても、本発明の趣旨を損なわない範囲で適宜変更し実施することができる。なお、本明細書において引用された全ての刊行物、例えば先行技術文献、及び公開公報、特許公報その他の特許文献は、参照として本明細書に組み込まれる。 Hereinafter, the present invention will be described in detail. The scope of the present invention is not limited to these descriptions, and other than the following examples, the scope of the present invention can be appropriately changed and implemented without departing from the spirit of the present invention. It should be noted that all publications cited in the present specification, for example, prior art documents, and publications, patent publications, and other patent documents are incorporated herein by reference.
 本発明の好ましい態様である発明2の製造方法は、「1.アミノ基保護工程」、「2.脱ヒドロキシフッ素化工程」および「3.選択的脱保護工程」の3工程を含む。発明1は、発明2の「2.脱ヒドロキシフッ素化工程」に対応し、発明3は、発明1または2の「脱ヒドロキシフッ素化工程」における好ましい態様に対応する。 The production method of Invention 2, which is a preferred embodiment of the present invention, includes three steps: “1. amino group protection step”, “2. dehydroxyfluorination step” and “3. selective deprotection step”. Invention 1 corresponds to “2. Dehydroxyfluorination step” of Invention 2, and Invention 3 corresponds to a preferred embodiment in “Dehydroxyfluorination step” of Invention 1 or 2.
 以下、各製造工程について詳細に説明する。 Hereinafter, each manufacturing process will be described in detail.
 1.アミノ基保護工程
 本工程は、一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体のアミノ基をニトロベンゼンスルホニル基で保護することにより、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体に変換する工程である。
1. Amino group protection step This step is carried out by protecting the amino group of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] with a nitrobenzenesulfonyl group. In the protected form of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs represented by the formula:
 一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体のCbzは、ベンジルオキシカルボニル基を表す。 In the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protected body represented by the general formula [3], Cbz represents a benzyloxycarbonyl group.
 一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体は、特許文献3を参考にして同様に製造することができる。 The optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] can be similarly produced with reference to Patent Document 3.
 一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体は、その鏡像異性体(3R,4S)でも良い。一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体は、塩化水素、臭化水素および硫酸等の無機酸またはシュウ酸、フタル酸およびパラトルエンスルホン酸等の有機酸との塩の形で用いることもできる。よって、請求項における一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体には、これらの鏡像異性体や塩も含まれるものとして扱う。 The optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] may be its enantiomer (3R, 4S). The optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] is an inorganic acid such as hydrogen chloride, hydrogen bromide and sulfuric acid or oxalic acid, phthalic acid and paratoluenesulfonic acid, etc. It can also be used in the form of a salt with an organic acid. Accordingly, the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protected body represented by the general formula [3] in the claims is treated as including these enantiomers and salts.
 アミノ基保護工程は、有機合成における一般的な方法[例えば、Protective Groups in Organic Synthesis,Third Edition,1999,John Wiley & Sons,Inc.、日本化学会編第5版実験化学講座(丸善)等]を採用することにより行うことができる。具体例として以下の方法が挙げられるが、当然これに限定されるものではない。 Amino group protection process is a general method in organic synthesis [eg, Protective Groups Organic Synthesis, Third Edition, 1999, John Wiley & Sons, Inc., The Chemical Society of Japan, 5th edition, Experimental Chemistry Course (Maruzen), etc.] This can be done by adopting Although the following method is mentioned as a specific example, Naturally it is not limited to this.
 一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体を塩基の存在下に、一般式[5]で示されるニトロベンゼンスルホニルハライド類と反応させることにより、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体に変換する(具体例)。
Figure JPOXMLDOC01-appb-C000013
[式中、ニトロ基はオルト、メタまたはパラ位に置換し、Xはハロゲン原子を表す。]
By reacting an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] with a nitrobenzenesulfonyl halide represented by the general formula [5] in the presence of a base, Conversion into a protected form of optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs represented by the formula [1] (specific example)
Figure JPOXMLDOC01-appb-C000013
[Wherein the nitro group is substituted at the ortho, meta or para position, and X represents a halogen atom. ]
 一般式[5]で示されるニトロベンゼンスルホニルハライド類のニトロ基は、オルト、メタまたはパラ位に置換する。その中でもオルトおよびパラ位が好ましく、オルト位が特に好ましい。 The nitro group of the nitrobenzenesulfonyl halide represented by the general formula [5] is substituted at the ortho, meta or para position. Of these, the ortho and para positions are preferred, and the ortho position is particularly preferred.
 一般式[5]で示されるニトロベンゼンスルホニルハライド類のXは、ハロゲン原子を表す。該ハロゲン原子は、フッ素、塩素、臭素またはヨウ素である。その中でも塩素および臭素が好ましく、塩素が特に好ましい。 X in the nitrobenzenesulfonyl halide represented by the general formula [5] represents a halogen atom. The halogen atom is fluorine, chlorine, bromine or iodine. Of these, chlorine and bromine are preferable, and chlorine is particularly preferable.
 一般式[5]で示されるニトロベンゼンスルホニルハライド類の中でも、オルトおよびパラ-ニトロベンゼンスルホニルフルオリド、もしくは、オルトおよびパラ-ニトロベンゼンスルホニルクロリドが好ましく、オルトおよびパラ-ニトロベンゼンスルホニルクロリドが特に好ましい。オルトおよびパラ-ニトロベンゼンスルホニルクロリドは、これらが市販されており、入手が容易である。この中でも、より安価であり、大量規模での製造に好適であることから、オルト-ニトロベンゼンスルホニルクロリドが極めて好ましい。なお、本発明では、オルトおよびパラ-ニトロベンゼンスルホニルフルオリドについても好適に用いることができる。 Among the nitrobenzenesulfonyl halides represented by the general formula [5], ortho and para-nitrobenzenesulfonyl fluoride or ortho and para-nitrobenzenesulfonyl chloride are preferable, and ortho and para-nitrobenzenesulfonyl chloride are particularly preferable. Ortho and para-nitrobenzenesulfonyl chloride are commercially available and are readily available. Among these, ortho-nitrobenzenesulfonyl chloride is very preferable because it is cheaper and suitable for production on a large scale. In the present invention, ortho and para-nitrobenzenesulfonyl fluoride can also be suitably used.
 一般式[5]で示されるニトロベンゼンスルホニルハライド類の使用量は、一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体1molに対して0.7mol以上を用いれば良く、0.8~5molが好ましく、0.9~3molが特に好ましい。 The amount of the nitrobenzenesulfonyl halide represented by the general formula [5] is 0.7 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3]. It may be used, preferably 0.8 to 5 mol, particularly preferably 0.9 to 3 mol.
 塩基は、炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸水素セシウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、水酸化リチウム、水酸化ナトリウム、水酸化カリウムおよび水酸化セシウム等の無機塩基、ならびにトリエチルアミン、ジイソプロピルエチルアミン、トリn-プロピルアミン、トリn-ブチルアミン、ピリジン、2,6-ルチジン、2,4,6-コリジン、4-ジメチルアミノピリジン、1,5-ジアザビシクロ[4.3.0]ノナ-5-エンおよび1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン等の有機塩基である。その中でも炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウム、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、2,6-ルチジン、2,4,6-コリジン、4-ジメチルアミノピリジン、1,5-ジアザビシクロ[4.3.0]ノナ-5-エンおよび1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エンが好ましく、炭酸水素ナトリウム、炭酸水素カリウム、炭酸ナトリウム、炭酸カリウム、水酸化ナトリウム、水酸化カリウム、トリエチルアミン、ジイソプロピルエチルアミン、ピリジン、2,6-ルチジン、4-ジメチルアミノピリジンおよび1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エンが特に好ましい。これらの塩基は単独でまたは組み合わせて用いることができる。 The base is an inorganic base such as lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, cesium hydrogen carbonate, lithium carbonate, sodium carbonate, potassium carbonate, cesium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide and cesium hydroxide. , And triethylamine, diisopropylethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, 2,6-lutidine, 2,4,6-collidine, 4-dimethylaminopyridine, 1,5-diazabicyclo [4.3. Organic bases such as 0] non-5-ene and 1,8-diazabicyclo [5.4.0] undec-7-ene. Among them, lithium hydrogen carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, lithium carbonate, sodium carbonate, potassium carbonate, lithium hydroxide, sodium hydroxide, potassium hydroxide, triethylamine, diisopropylethylamine, pyridine, 2,6-lutidine, 2, 4,6-collidine, 4-dimethylaminopyridine, 1,5-diazabicyclo [4.3.0] non-5-ene and 1,8-diazabicyclo [5.4.0] undec-7-ene are preferred, Sodium bicarbonate, potassium bicarbonate, sodium carbonate, potassium carbonate, sodium hydroxide, potassium hydroxide, triethylamine, diisopropylethylamine, pyridine, 2,6-lutidine, 4-dimethylaminopyridine and 1,8-diazabicyclo [5.4 .0] Undeca-7-D It is particularly preferred. These bases can be used alone or in combination.
 塩基の使用量は、一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体1molに対して0.35mol以上を用いれば良く、0.4~20molが好ましく、0.45~15molが特に好ましい。一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体を無機酸または有機酸との塩の形で用いる場合は、酸の中和に必要な塩基の使用量を加味して加えて、酸の中和とアミノ基の保護を1つの反応として連続的に行うことが簡便である。酸の中和に用いる塩基は、本工程に記載した塩基と同じである。 The amount of the base used may be 0.35 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3], preferably 0.4 to 20 mol. 0.45 to 15 mol is particularly preferable. When the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] is used in the form of a salt with an inorganic acid or an organic acid, use of a base necessary for neutralizing the acid is used. It is convenient to add the amount in consideration and to carry out the neutralization of the acid and the protection of the amino group continuously as one reaction. The base used for acid neutralization is the same as the base described in this step.
 反応溶媒は、n-ヘキサンおよびn-ヘプタン等の脂肪族炭化水素系、トルエンおよびキシレン等の芳香族炭化水素系、塩化メチレンおよび1,2-ジクロロエタン等のハロゲン系、テトラヒドロフランおよびtert-ブチルメチルエーテル等のエーテル系、酢酸エチルおよび酢酸n-ブチル等のエステル系、N,N-ジメチルホルムアミド、1-メチル-2-ピロリジノン、N,N-ジメチルアセトアミドおよび1,3-ジメチル-2-イミダゾリジノン等のアミド系、アセトニトリルおよびプロピオニトリル等のニトリル系、ジメチルスルホキシド、ならびに水等である。その中でもn-ヘプタン、トルエン、塩化メチレン、テトラヒドロフラン、酢酸エチル、N,N-ジメチルホルムアミド、アセトニトリル、ジメチルスルホキシドおよび水が好ましく、トルエン、塩化メチレン、テトラヒドロフラン、酢酸エチル、N,N-ジメチルホルムアミド、アセトニトリルおよび水が特に好ましい。これらの反応溶媒は単独でまたは組み合わせて用いることができる。また、本工程は不均一系、または「水と混和しない反応溶媒」と水との2相系で行うこともできる。 Reaction solvents include aliphatic hydrocarbons such as n-hexane and n-heptane, aromatic hydrocarbons such as toluene and xylene, halogens such as methylene chloride and 1,2-dichloroethane, tetrahydrofuran and tert-butyl methyl ether Ethers such as ethyl acetate and esters such as ethyl acetate and n-butyl acetate, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide and 1,3-dimethyl-2-imidazolidinone Amides such as acetonitrile, nitriles such as acetonitrile and propionitrile, dimethyl sulfoxide, and water. Of these, n-heptane, toluene, methylene chloride, tetrahydrofuran, ethyl acetate, N, N-dimethylformamide, acetonitrile, dimethyl sulfoxide and water are preferable. Toluene, methylene chloride, tetrahydrofuran, ethyl acetate, N, N-dimethylformamide, acetonitrile And water are particularly preferred. These reaction solvents can be used alone or in combination. This step can also be carried out in a heterogeneous system or a two-phase system of “a reaction solvent immiscible with water” and water.
 反応溶媒の使用量は、一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体1molに対して0.05L(リットル)以上を用いれば良く、0.1~20Lが好ましく、0.15~10Lが特に好ましい。本工程は反応溶媒を用いずに無溶媒混合物の状態で行うこともできる。 The reaction solvent may be used in an amount of 0.05 L (liter) or more per 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3]. To 20 L is preferred, and 0.15 to 10 L is particularly preferred. This step can also be performed in a solvent-free mixture without using a reaction solvent.
 添加順序は、特に制限はなく、反応溶媒に一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体と一般式[5]で示されるニトロベンゼンスルホニルハライド類を加え、後から塩基を徐々に加える場合や、反応溶媒に該光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体と塩基を加え、後から該ニトロベンゼンスルホニルハライド類と所定量の残りの塩基を分割して加える場合が、好結果をもたらすことがある。 The order of addition is not particularly limited, and an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] and a nitrobenzenesulfonyl halide represented by the general formula [5] are used as a reaction solvent. In addition, when the base is gradually added later, or when the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector and the base are added to the reaction solvent, the nitrobenzenesulfonyl halides and a predetermined amount of the remaining amount are added. Adding bases in portions can give good results.
 反応温度は、-80~+200℃の範囲で行えば良く、-60~+150℃が好ましく、-40~+100℃が特に好ましい。 The reaction temperature may be in the range of −80 to + 200 ° C., preferably −60 to + 150 ° C., particularly preferably −40 to + 100 ° C.
 反応時間は、24時間以内の範囲で行えば良く、原料基質、反応剤および反応条件により異なるため、ガスクロマトグラフィー、液体クロマトグラフィー、核磁気共鳴等の分析手段により反応の進行状況を追跡し、原料基質の減少が殆ど認められなくなった時点を終点とすることが好ましい。 The reaction time may be within a range of 24 hours or less, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, nuclear magnetic resonance, It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
 後処理は、有機合成における一般的な操作を採用することにより、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を得ることができる。粗生成物は、必要に応じて活性炭処理、再結晶、カラムクロマトグラフィー等により高い純度に精製することができる。特に、一般式[3]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体の無機酸との塩(例えば、塩化水素塩、臭化水素塩)や一般式[5]で示されるニトロベンゼンスルホニルハライド類に由来するハロゲン化物イオンが、脱ヒドロキシフッ素化工程における不純物の副生原因になる場合がある(特開2010-163422号公報を参照)。この様な場合は、目的物を含む有機層の水洗(硫酸ナトリウム等のハロゲン化物イオンを含まない無機塩の水溶液による洗浄も含む)やショートカラム等によるハロゲン化物イオンの除去が効果的である。さらに、未反応の一般式[5]で示されるニトロベンゼンスルホニルハライド類が残留する場合は、目的物と該ニトロベンゼンスルホニルハライド類を含む有機層を、アンモニアやメチルアミン、エチルアミン、ジメチルアミン、ジエチルアミン、ピロリジン、ピペリジン等の炭素数1~6の第1もしくは第2アミン、アンモニアあるいは該アミン等の水溶液またはアンモニアあるいは該アミン等の炭素数1~6の低級アルコール溶液(例えば、メチルアミンのメタノール溶液、エチルアミンのメタノール溶液、ジメチルアミンのメタノール溶液、ジエチルアミンのメタノール溶液、メチルアミンのエタノール溶液、エチルアミンのエタノール溶液、ジメチルアミンのエタノール溶液、ジエチルアミンのエタノール溶液、ピロリジンのメタノール溶液、ピロリジンのエタノール溶液等)と接触させることが効果的であり、好ましい態様である(ニトロベンゼンスルホニルハライド類をアミノリシスまたは加水分解して、遊離するハロゲン化物イオンを水層へ除去することができる)。 In the post-treatment, by employing a general operation in organic synthesis, an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1] can be obtained. The crude product can be purified to a high purity by activated carbon treatment, recrystallization, column chromatography or the like, if necessary. In particular, a salt of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the general formula [3] with an inorganic acid (for example, a hydrogen chloride salt or a hydrobromide salt) or a general formula [5] In some cases, halide ions derived from the nitrobenzenesulfonyl halides shown below can cause impurities as a by-product in the dehydroxyfluorination process (see JP 2010-163422 A). In such a case, it is effective to wash the organic layer containing the target product (including washing with an aqueous solution of an inorganic salt not containing halide ions such as sodium sulfate) or to remove halide ions using a short column or the like. Furthermore, when the unreacted nitrobenzenesulfonyl halide represented by the general formula [5] remains, the target compound and the organic layer containing the nitrobenzenesulfonyl halide are mixed with ammonia, methylamine, ethylamine, dimethylamine, diethylamine, pyrrolidine. A primary or secondary amine having 1 to 6 carbon atoms such as piperidine, an aqueous solution of ammonia or the amine, or a lower alcohol solution having 1 to 6 carbon atoms such as ammonia or the amine (for example, methanol solution of methylamine, ethylamine) Methanol solution, dimethylamine methanol solution, diethylamine methanol solution, methylamine ethanol solution, ethylamine ethanol solution, dimethylamine ethanol solution, diethylamine ethanol solution, pyrrolidine methanol It is effective to make it come into contact with an aqueous solution, an ethanol solution of pyrrolidine, etc., which is a preferred embodiment (the nitrobenzenesulfonyl halides can be aminolyzed or hydrolyzed to remove liberated halide ions to the aqueous layer. ).
 なお、上記アンモニアや上記第1もしくは第2アミンの使用量は、未反応のニトロベンゼンスルホニルハライド類1molに対して0.1mol以上を用いれば良く、0.2~2000molが好ましく、0.3~1000molが特に好ましい。 The amount of ammonia or the primary or secondary amine used may be 0.1 mol or more, preferably 0.2 to 2000 mol, preferably 0.3 to 1000 mol, relative to 1 mol of unreacted nitrobenzenesulfonyl halides. Is particularly preferred.
 2.脱ヒドロキシフッ素化工程
 本工程は、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を有機塩基の存在下にスルフリルフルオリドと反応させることにより、一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体に変換する工程である。
2. Dehydroxyfluorination step This step is carried out by reacting the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protectant represented by the general formula [1] with sulfuryl fluoride in the presence of an organic base. This is a step of converting into an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the formula [2].
 一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体のCbzは、前記一般式[3]と同じであり、Nsは、ニトロベンゼンスルホニル基を表す。 In the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected body represented by the general formula [1], Cbz is the same as in the general formula [3], and Ns represents a nitrobenzenesulfonyl group.
 一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体は、その鏡像異性体(3S,4S)でも良い。よって、請求項における一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体には、この鏡像異性体も含まれるものとして扱う。 The optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1] may be its enantiomer (3S, 4S). Therefore, the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1] in the claims is treated as including this enantiomer.
 スルフリルフルオリドの使用量は、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体1molに対して0.7mol以上を用いれば良く、0.8~20molが好ましく、0.9~15molが特に好ましい。 The amount of sulfuryl fluoride used may be 0.7 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1]. Is preferable, and 0.9 to 15 mol is particularly preferable.
 有機塩基は、「1.アミノ基保護工程」の塩基に記載した有機塩基と同じである。但し、これらに限定されず、有機合成において一般的に用いられる有機塩基も採用することができる。その中でもトリエチルアミン、ジイソプロピルエチルアミン、トリn-プロピルアミン、トリn-ブチルアミン、ピリジン、2,6-ルチジン、1,5-ジアザビシクロ[4.3.0]ノナ-5-エンおよび1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エンが好ましく、トリエチルアミン、ジイソプロピルエチルアミン、トリn-プロピルアミン、トリn-ブチルアミン、ピリジンおよび2,6-ルチジンが特に好ましい。これらの有機塩基は単独でまたは組み合わせて用いることができる。 The organic base is the same as the organic base described in “1. Amino group protection step”. However, it is not limited to these, The organic base generally used in organic synthesis can also be employ | adopted. Among them, triethylamine, diisopropylethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, 2,6-lutidine, 1,5-diazabicyclo [4.3.0] non-5-ene and 1,8-diazabicyclo [ 5.4.0] Undec-7-ene is preferred, with triethylamine, diisopropylethylamine, tri-n-propylamine, tri-n-butylamine, pyridine and 2,6-lutidine being particularly preferred. These organic bases can be used alone or in combination.
 有機塩基の使用量は、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体1molに対して0.7mol以上を用いれば良く、0.8~20molが好ましく、0.9~15molが特に好ましい。 The amount of the organic base used may be 0.7 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1]. Preferably, 0.9 to 15 mol is particularly preferable.
 脱ヒドロキシフッ素化工程においては、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体とスルフリルフルオリドとの反応を、「有機塩基とフッ化水素とからなる塩または錯体」の存在下に行うことがより好ましい。 In the dehydroxyfluorination step, the reaction of the protected optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs represented by the general formula [1] with sulfuryl fluoride is carried out by “from organic base and hydrogen fluoride. More preferably, it is carried out in the presence of a “salt or complex”.
 ここで、「有機塩基とフッ化水素とからなる塩または錯体」における有機塩基は、本工程に記載した有機塩基と同じである。“好ましい”および“特に好ましい有機塩基”も同じである。これらの「有機塩基とフッ化水素とからなる塩または錯体」の有機塩基は単独でまたは組み合わせて用いることができる。 Here, the organic base in the “salt or complex comprising an organic base and hydrogen fluoride” is the same as the organic base described in this step. The same applies to “preferred” and “particularly preferred organic base”. These organic bases of “a salt or complex comprising an organic base and hydrogen fluoride” can be used alone or in combination.
 「有機塩基とフッ化水素とからなる塩または錯体」の有機塩基とフッ化水素のmol比は、100:1から1:100の範囲で用いれば良く、50:1から1:50が好ましく、25:1から1:25が特に好ましい。アルドリッチ(Aldrich、2009-2010カタログ)から市販されている「トリエチルアミン1molとフッ化水素3molからなる錯体」または「ピリジン~30%(~10mol%)とフッ化水素~70%(~90mol%)からなる錯体」を用いるのが便利である。 The molar ratio of the organic base to hydrogen fluoride in the “salt or complex comprising an organic base and hydrogen fluoride” may be used in the range of 100: 1 to 1: 100, preferably 50: 1 to 1:50, Particularly preferred is 25: 1 to 1:25. Commercially available from Aldrich (2009-2010 catalog) “complex consisting of 1 mol of triethylamine and 3 mol of hydrogen fluoride” or “from pyridine˜30% (˜10 mol%) and hydrogen fluoride˜70% (˜90 mol%) It is convenient to use "complex".
 「有機塩基とフッ化水素とからなる塩または錯体」を用いる場合の使用量は、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体1molに対して、フッ化物イオン(F-)として0.05mol以上を用いれば良く、0.07~30molが好ましく、0.09~15molが特に好ましい。 The amount used when the “salt or complex comprising an organic base and hydrogen fluoride” is used is 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1]. The fluoride ion (F ) may be 0.05 mol or more, preferably 0.07 to 30 mol, particularly preferably 0.09 to 15 mol.
 反応溶媒は、「1.アミノ基保護工程」に記載した反応溶媒と同じである。但し、水を除く。“好ましい”および“特に好ましい反応溶媒”も同じである。これらの反応溶媒は単独でまたは組み合わせて用いることができる。 The reaction solvent is the same as the reaction solvent described in “1. Amino group protection step”. However, water is excluded. The same applies to “preferred” and “particularly preferred reaction solvent”. These reaction solvents can be used alone or in combination.
 反応溶媒の使用量は、一般式[1]で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体1molに対して0.05L以上を用いれば良く、0.1~20Lが好ましく、0.15~10Lが特に好ましい。本工程は反応溶媒を用いずに無溶媒混合物の状態で行うこともできる。 The reaction solvent may be used in an amount of 0.05 L or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector represented by the general formula [1]. Preferably, 0.15 to 10 L is particularly preferable. This step can also be performed in a solvent-free mixture without using a reaction solvent.
 反応温度は、-50~+200℃の範囲で行えば良く、-40~+150℃が好ましく、-30~+100℃が特に好ましい。 The reaction temperature may be in the range of −50 to + 200 ° C., preferably −40 to + 150 ° C., particularly preferably −30 to + 100 ° C.
 反応時間は、48時間以内の範囲で行えば良く、原料基質、反応剤および反応条件により異なるため、ガスクロマトグラフィー、液体クロマトグラフィー、核磁気共鳴等の分析手段により反応の進行状況を追跡し、原料基質の減少が殆ど認められなくなった時点を終点とすることが好ましい。 The reaction time may be within a range of 48 hours, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, and nuclear magnetic resonance. It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
 後処理は、有機合成における一般的な操作を採用することにより、一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体を得ることができる。粗生成物は、必要に応じて活性炭処理、再結晶、カラムクロマトグラフィー等により高い純度に精製することができる。本工程は、SN2反応で進行するため、前記一般式[1]の4位不斉炭素の立体化学は反転する。 In the post-treatment, an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2] can be obtained by employing a general operation in organic synthesis. The crude product can be purified to a high purity by activated carbon treatment, recrystallization, column chromatography or the like, if necessary. Since this step proceeds by the S N 2 reaction, the stereochemistry of the 4-position asymmetric carbon of the general formula [1] is reversed.
 3.選択的脱保護工程
 本工程は、一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体のニトロベンゼンスルホニル保護基を選択的に脱保護することにより、一般式[4]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を得る工程である。
3. Selective deprotection step This step is carried out by selectively deprotecting the nitrobenzenesulfonyl protecting group of the protected optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs represented by the general formula [2]. This is a step for obtaining an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by [4].
 一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体のCbzおよびNsは、前記一般式[1]と同じである。 Cbz and Ns in the protected optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs represented by the general formula [2] are the same as those in the general formula [1].
 一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体は、その鏡像異性体(3S,4R)でも良い。よって、請求項における一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体には、この鏡像異性体も含まれるものとして扱う。 The optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2] may be its enantiomer (3S, 4R). Therefore, the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2] in the claims is treated as including this enantiomer.
 選択的脱保護工程は、有機合成における一般的な方法[例えば、Protective Groups in Organic Synthesis,Third Edition,1999,John Wiley & Sons,Inc.、日本化学会編第5版実験化学講座(丸善)等]を採用することにより行うことができる。具体例として以下の方法が挙げられるが、当然これに限定されるものではない。 The selective deprotection process is a common method in organic synthesis [for example, Protective Groups Organic Synthesis, Third Edition, 1999, John Wiley & Sons, Inc., The Chemical Society of Japan, 5th edition, Experimental Chemistry Course (Maruzen), etc. ] Can be used. Although the following method is mentioned as a specific example, Naturally it is not limited to this.
 一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体を塩基の存在下に、一般式[6]で示されるチオール類と反応させることにより、一般式[4]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を製造する(具体例)。
Figure JPOXMLDOC01-appb-C000014
[式中、Rはアルキル基、置換アルキル基、フェニル基または置換フェニル基を表す。]
By reacting the protected optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs represented by the general formula [2] with a thiol represented by the general formula [6] in the presence of a base, the general formula [2] 4] The optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by 4] is produced (specific example).
Figure JPOXMLDOC01-appb-C000014
[Wherein, R represents an alkyl group, a substituted alkyl group, a phenyl group or a substituted phenyl group. ]
 一般式[6]で示されるチオール類のRは、アルキル基、置換アルキル基、フェニル基または置換フェニル基を表す。該アルキル基は、炭素数1~12の、直鎖状もしくは分枝状の鎖式または環式(炭素数3以上の場合)のものである。該置換アルキル基および置換フェニル基は、それぞれ該アルキル基およびフェニル基の、任意の炭素原子上に、任意の数および任意の組み合わせで、置換基を有する。係る置換基は、アミノ基、ヒドロキシル基、カルボキシル基等である。その中でも炭素数1~8のアルキル基、2-ヒドロキシエチル基、カルボキシメチル基およびフェニル基が好ましく、フェニル基が特に好ましい。チオフェノール(Rがフェニル基)は、反応性が高く、工業薬品として市販されている。 R in the thiols represented by the general formula [6] represents an alkyl group, a substituted alkyl group, a phenyl group or a substituted phenyl group. The alkyl group is a linear or branched chain or cyclic group (having 3 or more carbon atoms) having 1 to 12 carbon atoms. The substituted alkyl group and the substituted phenyl group each have a substituent in any number and in any combination on any carbon atom of the alkyl group and phenyl group. Such substituents are amino groups, hydroxyl groups, carboxyl groups and the like. Among these, an alkyl group having 1 to 8 carbon atoms, a 2-hydroxyethyl group, a carboxymethyl group and a phenyl group are preferable, and a phenyl group is particularly preferable. Thiophenol (R is a phenyl group) has high reactivity and is commercially available as an industrial chemical.
 一般式[6]で示されるチオール類の使用量は、一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体1molに対して0.7mol以上を用いれば良く、0.8~20molが好ましく、0.9~15molが特に好ましい。 The amount of the thiol represented by the general formula [6] is 0.7 mol or more based on 1 mol of the protected optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs represented by the general formula [2]. It is preferably 0.8 to 20 mol, particularly preferably 0.9 to 15 mol.
 塩基は、「1.アミノ基保護工程」に列挙した塩基と同じものの中から選択できる。その中でも無機塩基が好ましく、炭酸カリウム、炭酸セシウムおよび水酸化リチウムが特に好ましい。これらの塩基は単独でまたは組み合わせて用いることができる。アミノ基のニトロベンゼンスルホニル保護基の脱保護では、塩基として有機塩基の1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エンが多用されている。しかしながら、本発明の選択的脱保護工程では、無機塩基を用いる方が温和な反応条件を採用することができ、副反応を伴わずに収率良く、1位ベンジルオキシカルボニル保護基に対して選択的な脱保護を行うことができる(本発明の好ましい態様)。当然、本工程において有機塩基を用いることを制限するものではない。 The base can be selected from the same bases listed in “1. Amino group protection step”. Among these, an inorganic base is preferable, and potassium carbonate, cesium carbonate, and lithium hydroxide are particularly preferable. These bases can be used alone or in combination. In the deprotection of the nitrobenzenesulfonyl protecting group of the amino group, the organic base 1,8-diazabicyclo [5.4.0] undec-7-ene is frequently used as the base. However, in the selective deprotection step of the present invention, milder reaction conditions can be adopted when using an inorganic base, and it is selected with respect to the 1-position benzyloxycarbonyl protecting group in good yield without side reactions. Deprotection can be performed (a preferred embodiment of the present invention). Of course, the use of an organic base in this step is not limited.
 塩基の使用量は、一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体1molに対して0.35mol以上を用いれば良く、0.4~20molが好ましく、0.45~15molが特に好ましい。 The amount of the base used may be 0.35 mol or more with respect to 1 mol of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2], preferably 0.4 to 20 mol. 0.45 to 15 mol is particularly preferable.
 反応溶媒は、「1.アミノ基保護工程」に記載した反応溶媒と同じである。その中でもn-ヘプタン、トルエン、塩化メチレン、テトラヒドロフラン、N,N-ジメチルホルムアミド、1-メチル-2-ピロリジノン、N,N-ジメチルアセトアミド、1,3-ジメチル-2-イミダゾリジノン、アセトニトリルおよびジメチルスルホキシドが好ましく、テトラヒドロフラン、N,N-ジメチルホルムアミド、1-メチル-2-ピロリジノン、N,N-ジメチルアセトアミド、1,3-ジメチル-2-イミダゾリジノン、アセトニトリルおよびジメチルスルホキシドが特に好ましい。 The reaction solvent is the same as the reaction solvent described in “1. Amino group protection step”. Among them, n-heptane, toluene, methylene chloride, tetrahydrofuran, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, acetonitrile and dimethyl Sulfoxides are preferred, with tetrahydrofuran, N, N-dimethylformamide, 1-methyl-2-pyrrolidinone, N, N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, acetonitrile and dimethyl sulfoxide being particularly preferred.
 反応溶媒の使用量は、一般式[2]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体1molに対して0.05L以上を用いれば良く、0.1~20Lが好ましく、0.15~10Lが特に好ましい。本工程は反応溶媒を用いずに無溶媒混合物の状態で行うこともできる。 The reaction solvent may be used in an amount of 0.05 L or more per 1 mol of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector represented by the general formula [2]. Preferably, 0.15 to 10 L is particularly preferable. This step can also be performed in a solvent-free mixture without using a reaction solvent.
 反応温度は、-50~+100℃の範囲で行えば良く、-40~+90℃が好ましく、-30~+80℃が特に好ましい。 The reaction temperature may be in the range of −50 to + 100 ° C., preferably −40 to + 90 ° C., particularly preferably −30 to + 80 ° C.
 反応時間は、36時間以内の範囲で行えば良く、原料基質、反応剤および反応条件により異なるため、ガスクロマトグラフィー、液体クロマトグラフィー、核磁気共鳴等の分析手段により反応の進行状況を追跡し、原料基質の減少が殆ど認められなくなった時点を終点とすることが好ましい。 The reaction time may be performed within 36 hours, and varies depending on the raw material substrate, the reactants, and the reaction conditions. Therefore, the progress of the reaction is traced by analytical means such as gas chromatography, liquid chromatography, nuclear magnetic resonance, It is preferable to set the end point when the decrease in the raw material substrate is hardly recognized.
 後処理は、有機合成における一般的な操作を採用することにより、一般式[4]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を得ることができる。粗生成物は、必要に応じて活性炭処理、再結晶、カラムクロマトグラフィー等により高い純度に精製することができる。 In the post-treatment, an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the general formula [4] can be obtained by employing a general operation in organic synthesis. The crude product can be purified to a high purity by activated carbon treatment, recrystallization, column chromatography or the like, if necessary.
 一般式[4]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体のCbzは、前記一般式[2]と同じである。 Cbz of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the general formula [4] is the same as the general formula [2].
 一般式[4]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体は、その鏡像異性体(3R,4R)でも良い。よって、請求項における一般式[4]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体には、これらの鏡像異性体や塩も含まれるものとして扱う。 The optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the general formula [4] may be its enantiomer (3R, 4R). Therefore, the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected body represented by the general formula [4] in the claims is treated as including these enantiomers and salts.
 一般式[4]で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体は、塩化水素、臭化水素および硫酸等の無機酸またはシュウ酸、フタル酸およびパラトルエンスルホン酸等の有機酸との塩に誘導して再結晶精製することにより、高純度品を得ることができる(本発明の好ましい態様)。 The optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the general formula [4] is an inorganic acid such as hydrogen chloride, hydrogen bromide and sulfuric acid or oxalic acid, phthalic acid and paratoluenesulfonic acid, etc. A high-purity product can be obtained by recrystallization and purification by inducing a salt with an organic acid (a preferred embodiment of the present invention).
 実施例により本発明の実施の形態を具体的に説明するが、本発明はこれらの実施例に限定されるものではない。 EXAMPLES Embodiments of the present invention will be specifically described by way of examples, but the present invention is not limited to these examples.
 [実施例1]
 ガラス製反応容器に、下記式:
Figure JPOXMLDOC01-appb-C000015
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体の塩化水素(HCl)塩25.0g(76.5mmol、1.00eq)、アセトニトリル125mL(1.63L/mol)とオルト-ニトロベンゼンスルホニルクロリド17.1g(77.2mmol、1.01eq)を加え、-10℃の冷媒浴に浸し、トリエチルアミン16.3g(161mmol、2.10eq)を徐々に加え、同温度で35分間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液をトルエン250mLで希釈し、5%炭酸水素ナトリウム水溶液125mLで洗浄し、回収水層をトルエン63.0mLで抽出し、回収有機層を合わせて水63.0mLで洗浄し、10%硫酸ナトリウム水溶液63.0mLで洗浄し、回収有機層を減圧濃縮し、残渣を酢酸エチル125mLとトルエン125mLに溶解し、10%硫酸ナトリウム水溶液63.0mLで2回洗浄し、減圧濃縮することにより、下記式:
Figure JPOXMLDOC01-appb-C000016
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を40.1g得た。収率は定量的であった(理論収量36.4g)。1H-NMRを下に示す。
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;0.65(m、4H)、2.63(m、3H)、3.38(m、4H)、3.75(m、2H)、4.30(m、1H)、5.13(s、2H)、7.63(Ar、9H)。
[Example 1]
In a glass reaction vessel, the following formula:
Figure JPOXMLDOC01-appb-C000015
25.0 g (76.5 mmol, 1.00 eq) of hydrogen chloride (HCl) salt of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the following formula: Ortho with 125 mL (1.63 L / mol) of acetonitrile -Add 17.1 g (77.2 mmol, 1.01 eq) of nitrobenzenesulfonyl chloride, soak in a refrigerant bath at -10 ° C, gradually add 16.3 g (161 mmol, 2.10 eq) of triethylamine, and stir at the same temperature for 35 minutes did. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. The reaction-terminated liquid is diluted with 250 mL of toluene, washed with 125 mL of 5% aqueous sodium hydrogen carbonate solution, the recovered aqueous layer is extracted with 63.0 mL of toluene, and the combined organic layers are washed with 63.0 mL of water and washed with 10% sulfuric acid. The organic layer was washed with 63.0 mL of sodium aqueous solution, and the collected organic layer was concentrated under reduced pressure. The residue was dissolved in 125 mL of ethyl acetate and 125 mL of toluene, washed twice with 63.0 mL of 10% aqueous sodium sulfate solution, and concentrated under reduced pressure. formula:
Figure JPOXMLDOC01-appb-C000016
40.1 g of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by the formula: The yield was quantitative (theoretical yield 36.4 g). 1 H-NMR is shown below.
1 H-NMR (reference material; Me 4 Si, heavy solvent; CDCl 3 ), δ ppm; 0.65 (m, 4H), 2.63 (m, 3H), 3.38 (m, 4H), 3 .75 (m, 2H), 4.30 (m, 1H), 5.13 (s, 2H), 7.63 (Ar, 9H).
 ステンレス鋼(SUS)製耐圧反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体全量40.1g(76.5mmolとする、1.00eq)、アセトニトリル75.0mL(0.980L/mol)、トリエチルアミン31.0g(306mmol、4.00eq)とトリエチルアミン・3フッ化水素12.3g(76.3mmol、0.997eq)を加え、0℃の冷媒浴に浸し、スルフリルフルオリド17.0g(167mmol、2.18eq)をボンベより吹き込み、同温度で4時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液に10%炭酸カリウム水溶液230mLを加え、酢酸エチル230mLで抽出し、回収水層を酢酸エチル75.0mLで抽出し、回収有機層を合わせて2N塩酸90.0mLで洗浄し、10%食塩水75.0mLで3回洗浄し、減圧濃縮し、残渣を酢酸エチル230mLに溶解し、濾過し、減圧濃縮し、アセトニトリル75.0mLで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000017
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体を39.4g得た。収率は定量的であった(理論収量36.5g)。1H-NMRと19F-NMRを下に示す。
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;0.70(m、4H)、2.51(m、1H)、2.75(m、1H)、3.55(m、6H)、5.18(m、1H)、5.14(s、2H)、7.63(Ar、9H)。
19F-NMR(基準物質;C66、重溶媒;CDCl3)、δ ppm;-30.97(m、1F)。
In a pressure resistant reaction vessel made of stainless steel (SUS), the total amount of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector obtained above was 40.1 g (76.5 mmol, 1.00 eq), acetonitrile 75 0.0 mL (0.980 L / mol), 31.0 g (306 mmol, 4.00 eq) of triethylamine and 12.3 g (76.3 mmol, 0.997 eq) of triethylamine / hydrogen trifluoride were added, and immersed in a refrigerant bath at 0 ° C. 17.0 g (167 mmol, 2.18 eq) of sulfuryl fluoride was blown from the bomb and stirred at the same temperature for 4 hours. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. To the reaction solution, 230 mL of 10% potassium carbonate aqueous solution was added, extracted with 230 mL of ethyl acetate, the recovered aqueous layer was extracted with 75.0 mL of ethyl acetate, and the combined organic layers were washed with 90.0 mL of 2N hydrochloric acid, and 10% Wash with 3 times 75.0 mL of brine and concentrate under reduced pressure. Dissolve the residue in 230 mL of ethyl acetate, filter, concentrate under reduced pressure and azeotrope with 75.0 mL of acetonitrile to obtain the following formula:
Figure JPOXMLDOC01-appb-C000017
As a result, 39.4 g of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product represented by the formula: The yield was quantitative (theoretical yield 36.5 g). 1 H-NMR and 19 F-NMR are shown below.
1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 0.70 (m, 4H), 2.51 (m, 1H), 2.75 (m, 1H), 3 .55 (m, 6H), 5.18 (m, 1H), 5.14 (s, 2H), 7.63 (Ar, 9H).
19 F-NMR (reference material; C 6 F 6 , heavy solvent; CDCl 3 ), δ ppm; −30.97 (m, 1F).
 ガラス製反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体全量39.4g(76.5mmolとする、1.00eq)、N,N-ジメチルホルムアミド150mL(1.96L/mol)と炭酸カリウム31.7g(229mmol、2.99eq)を加え、-5℃の冷媒浴に浸し、チオフェノール21.8g(198mmol、2.59eq)を加え、0℃で3時間30分攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液に水600mLを加え、酢酸エチル600mLで抽出し、回収水層を酢酸エチル150mLで抽出し、回収有機層を合わせて10%食塩水75.0mLで2回洗浄し、減圧濃縮し、酢酸エチル75.0mLで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000018
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を53.7g得た。収率は定量的であった(理論収量22.4g)。液体クロマトグラフィー純度は96.5%であった(但し、脱保護されたNs基に由来するピークを除く)。
In a glass reaction vessel, a total amount of 39.4 g (76.5 mmol, 1.00 eq) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs obtained above, 150 mL of N, N-dimethylformamide. (1.96 L / mol) and 31.7 g (229 mmol, 2.99 eq) of potassium carbonate, soaked in a refrigerant bath at −5 ° C., and 21.8 g (198 mmol, 2.59 eq) of thiophenol were added. Stir for 3 hours 30 minutes. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. 600 mL of water was added to the reaction completed solution, extracted with 600 mL of ethyl acetate, the recovered aqueous layer was extracted with 150 mL of ethyl acetate, and the combined organic layers were washed twice with 75.0 mL of 10% brine, concentrated under reduced pressure, By azeotroping with 75.0 mL of ethyl acetate, the following formula:
Figure JPOXMLDOC01-appb-C000018
As a result, 53.7 g of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the formula: The yield was quantitative (theoretical yield 22.4 g). The purity of liquid chromatography was 96.5% (except for the peak derived from the deprotected Ns group).
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体全量53.7g(76.5mmolとする)を酢酸エチル230mLに溶解し、濾過し、0℃の冷媒浴に浸し、pHが3になるまで塩化水素-メタノール試薬(5-10%、東京化成工業株式会社製)を加え(62.0mL)、ジイソプロピルエーテル690mLを徐々に加え、同温度で1時間攪拌し、析出した結晶を濾過し、真空乾燥することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩を24.3g得た。「1.アミノ基保護工程」からのトータル収率は96%であった。液体クロマトグラフィー純度は96.5%であった。 The total amount of optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz obtained above (53.7 g, 76.5 mmol) was dissolved in 230 mL of ethyl acetate, filtered, and immersed in a 0 ° C. refrigerant bath. Then, hydrogen chloride-methanol reagent (5-10%, manufactured by Tokyo Chemical Industry Co., Ltd.) was added until the pH reached 3 (62.0 mL), 690 mL of diisopropyl ether was gradually added, and the mixture was stirred at the same temperature for 1 hour to precipitate. The crystals thus obtained were filtered and dried under vacuum to obtain 24.3 g of a hydrogen chloride (HCl) salt of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the above formula. The total yield from “1. Amino group protection step” was 96%. Liquid chromatographic purity was 96.5%.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩全量24.3gをメタノール120mLとイソプロパノール96.0mLに加温下(46℃以下)で溶解し、ジイソプロピルエーテル120mLを加え、30℃で1時間攪拌し、ジイソプロピルエーテル96.0mLを加え、同温度で30分間、0℃で1時間攪拌し、析出した結晶を濾過し、真空乾燥することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩(再結晶品)を21.3g得た。回収率は88%であった。液体クロマトグラフィー純度は98.4%であった。1H-NMRと19F-NMRを下に示す。
1H-NMR(基準物質;Me4Si、重溶媒;CDCl3)、δ ppm;0.84(m、2H)、1.24(m、2H)、2.57(m、1H)、3.13(m、4H)、3.77(m、3H)、5.12(m、2H)、5.48(m、1H)、7.32(Ar、5H)、9.86(br、2H)。
19F-NMR(基準物質;C66、重溶媒;CDCl3)、δ ppm;-31.57(m、1F)。
A total of 24.3 g of the hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was heated to 120 mL of methanol and 96.0 mL of isopropanol under heating (46 ° C. or lower). Dissolve, add 120 mL of diisopropyl ether, stir at 30 ° C. for 1 hour, add 96.0 mL of diisopropyl ether, stir at the same temperature for 30 minutes, 1 hour at 0 ° C., filter the precipitated crystals, and vacuum dry As a result, 21.3 g of hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the above formula was obtained. The recovery rate was 88%. Liquid chromatography purity was 98.4%. 1 H-NMR and 19 F-NMR are shown below.
1 H-NMR (reference material; Me 4 Si, deuterated solvent; CDCl 3 ), δ ppm; 0.84 (m, 2H), 1.24 (m, 2H), 2.57 (m, 1H), 3 .13 (m, 4H), 3.77 (m, 3H), 5.12 (m, 2H), 5.48 (m, 1H), 7.32 (Ar, 5H), 9.86 (br, 2H).
19 F-NMR (reference material; C 6 F 6 , deuterated solvent; CDCl 3 ), δ ppm; −31.57 (m, 1F).
 [実施例2]
 ガラス製反応容器に、下記式:
Figure JPOXMLDOC01-appb-C000019
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体の塩化水素(HCl)塩150g(459mmol、1.00eq)、アセトニトリル675mL(1.47L/mol)とオルト-ニトロベンゼンスルホニルクロリド103g(465mmol、1.01eq)を加え、0℃の冷媒浴に浸し、トリエチルアミン98.2g(970mmol、2.11eq)を徐々に加え、同温度で3時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より99%であった。反応終了液をトルエン1.35Lで希釈し、5%炭酸水素ナトリウム水溶液675mLで洗浄し、回収水層をトルエン300mLで抽出し、回収有機層を合わせて水300mLで洗浄し、10%硫酸ナトリウム水溶液300mLで洗浄し、回収有機層を減圧濃縮し、酢酸エチル300mLとトルエン300mLで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000020
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を237g得た。収率は定量的であった(理論収量218g)。
[Example 2]
In a glass reaction vessel, the following formula:
Figure JPOXMLDOC01-appb-C000019
150 g (459 mmol, 1.00 eq) of a hydrogen chloride (HCl) salt of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the formula: 675 mL (1.47 L / mol) of acetonitrile and ortho-nitrobenzenesulfonyl chloride 103 g (465 mmol, 1.01 eq) was added, immersed in a 0 ° C. refrigerant bath, 98.2 g (970 mmol, 2.11 eq) of triethylamine was gradually added, and the mixture was stirred at the same temperature for 3 hours. The conversion rate of the reaction finished liquid was 99% according to liquid chromatography analysis. The reaction-terminated liquid is diluted with 1.35 L of toluene, washed with 675 mL of 5% aqueous sodium hydrogen carbonate solution, the recovered aqueous layer is extracted with 300 mL of toluene, the combined organic layers are washed with 300 mL of water, and 10% aqueous sodium sulfate solution Wash with 300 mL, concentrate the recovered organic layer under reduced pressure, and azeotrope with 300 mL of ethyl acetate and 300 mL of toluene to obtain the following formula:
Figure JPOXMLDOC01-appb-C000020
As a result, 237 g of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by the formula: The yield was quantitative (theoretical yield 218 g).
 ステンレス鋼(SUS)製耐圧反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体全量237g(459mmolとする、1.00eq)、酢酸エチル460mL(1.00L/mol)、トリエチルアミン149g(1.47mol、3.20eq)とトリエチルアミン・3フッ化水素74.0g(459mmol、1.00eq)を加え、0℃の冷媒浴に浸し、スルフリルフルオリド60.0g(588mmol、1.28eq)をボンベより吹き込み、同温度で3時間、室温で1時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液に10%炭酸カリウム水溶液1.15Lを加え、酢酸エチル920mLで抽出し、回収水層を酢酸エチル150mLで抽出し、回収有機層を合わせて2N塩酸(食塩5%含有)460mLで洗浄し、5%炭酸水素ナトリウム水溶液(食塩5%含有)460mLで洗浄し、減圧濃縮し、酢酸エチル300mLとトルエン300mLで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000021
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体を234g得た。収率は定量的であった(理論収量219g)。
In a pressure resistant reaction vessel made of stainless steel (SUS), a total of 237 g (459 mmol, 1.00 eq) of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector obtained above, 460 mL of ethyl acetate (1. 00L / mol), 149 g (1.47 mol, 3.20 eq) of triethylamine and 74.0 g (459 mmol, 1.00 eq) of triethylamine / hydrogen trifluoride were added, and immersed in a refrigerant bath at 0 ° C., 60.0 g of sulfuryl fluoride. (588 mmol, 1.28 eq) was blown from the bomb and stirred at the same temperature for 3 hours and at room temperature for 1 hour. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. 1.15 L of 10% aqueous potassium carbonate solution was added to the reaction completed solution, extracted with 920 mL of ethyl acetate, the recovered aqueous layer was extracted with 150 mL of ethyl acetate, and the recovered organic layers were combined and washed with 460 mL of 2N hydrochloric acid (containing 5% salt). And washed with 460 mL of 5% aqueous sodium hydrogen carbonate solution (containing 5% sodium chloride), concentrated under reduced pressure, and azeotroped with 300 mL of ethyl acetate and 300 mL of toluene to obtain the following formula:
Figure JPOXMLDOC01-appb-C000021
As a result, 234 g of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product represented by the formula: The yield was quantitative (theoretical yield 219 g).
 ガラス製反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体全量234g(459mmolとする、1.00eq)、N,N-ジメチルホルムアミド690mL(1.50L/mol)と炭酸カリウム190g(1.37mol、2.98eq)を加え、0℃の冷媒浴に浸し、チオフェノール142g(1.29mol、2.81eq)を加え、同温度で4時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液に水1.73Lを加え、酢酸エチル1.38Lで抽出し、回収水層を酢酸エチル460mLで抽出し、回収有機層を合わせて10%食塩水460mLで2回洗浄し、減圧濃縮し、酢酸エチル300mLとトルエン300mLで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000022
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を308g得た。収率は定量的であった(理論収量134g)。液体クロマトグラフィー純度は95.2%であった(但し、脱保護されたNs基に由来するピークを除く)。
In a glass reaction vessel, a total of 234 g (459 mmol, 1.00 eq) of the protected optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs obtained above, 690 mL (1.50 L) of N, N-dimethylformamide. / Mol) and 190 g (1.37 mol, 2.98 eq) of potassium carbonate were added, immersed in a refrigerant bath at 0 ° C., 142 g (1.29 mol, 2.81 eq) of thiophenol was added, and the mixture was stirred at the same temperature for 4 hours. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. 1.73 L of water was added to the reaction completed solution, extracted with 1.38 L of ethyl acetate, the recovered aqueous layer was extracted with 460 mL of ethyl acetate, and the combined organic layers were washed twice with 460 mL of 10% brine and concentrated under reduced pressure. And azeotropically with 300 mL of ethyl acetate and 300 mL of toluene, the following formula:
Figure JPOXMLDOC01-appb-C000022
308 g of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by The yield was quantitative (theoretical yield 134 g). The purity of the liquid chromatography was 95.2% (except for the peak derived from the deprotected Ns group).
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体全量308g(459mmolとする)を酢酸エチル1.37Lに溶解し、濾過し、0℃の冷媒浴に浸し、pHが3になるまで塩化水素-メタノール試薬(5-10%、東京化成工業株式会社製)を加え(380mL)、n-ヘプタン4.11Lを徐々に加え、同温度で1時間攪拌し、析出した結晶を濾過し、n-ヘプタン200mLで3回洗浄し、真空乾燥することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩を137g得た。「1.アミノ基保護工程」からのトータル収率は91%であった。液体クロマトグラフィー純度は95.6%であった。 A total of 308 g (459 mmol) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was dissolved in 1.37 L of ethyl acetate, filtered, immersed in a 0 ° C. refrigerant bath, pH Hydrogen chloride-methanol reagent (5-10%, manufactured by Tokyo Kasei Kogyo Co., Ltd.) was added until it became 3, and 4.11 L of n-heptane was gradually added, followed by stirring at the same temperature for 1 hour to precipitate. The crystals are filtered, washed with 200 mL of n-heptane three times, and dried under vacuum to obtain a hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the above formula. 137 g was obtained. The total yield from “1. Amino group protection step” was 91%. Liquid chromatography purity was 95.6%.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩全量137gをメタノール680mLとイソプロパノール550mLに加温下(50℃以下)で溶解し、ジイソプロピルエーテル680mLを加え、35℃で2時間攪拌し、ジイソプロピルエーテル550mLを加え、同温度で1時間、0℃で1時間攪拌し、析出した結晶を濾過し、ジイソプロピルエーテル200mLで3回洗浄し、真空乾燥することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩(再結晶品)を127g得た。回収率は93%であった。液体クロマトグラフィー純度は98.5%であった。 A total of 137 g of the hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was dissolved in 680 mL of methanol and 550 mL of isopropanol under heating (50 ° C. or lower), and diisopropyl Add 680 mL of ether, stir at 35 ° C. for 2 hours, add 550 mL of diisopropyl ether, stir for 1 hour at the same temperature and 1 hour at 0 ° C., filter the precipitated crystals, wash with 200 mL of diisopropyl ether three times, and vacuum By drying, 127 g of a hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the above formula was obtained. The recovery rate was 93%. Liquid chromatography purity was 98.5%.
 [実施例3]
 ガラス製反応容器に、下記式:
Figure JPOXMLDOC01-appb-C000023
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体の塩化水素(HCl)塩10.0g(30.6mmol、1.00eq)、酢酸エチル45.0mL(1.47L/mol)と15%炭酸カリウム水溶液34.0g(炭酸カリウム36.9mmol、1.21eq)を加え、0℃の冷媒浴に浸し、オルト-ニトロベンゼンスルホニルクロリド6.87g(31.0mmol、1.01eq)と15%炭酸カリウム水溶液25.0g(炭酸カリウム27.1mmol、0.886eq)を5回に分けて加え、同温度で4時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より99%であった。反応終了液を酢酸エチル15.0mLで希釈し、分液し、回収水層を酢酸エチル15.0mLで抽出し、回収有機層を合わせて5%硫酸ナトリウム水溶液10.0mLで2回洗浄し、10%硫酸ナトリウム水溶液10.0mLで洗浄し、回収有機層を減圧濃縮し、酢酸エチル10.0mLとトルエン10.0mLで2回共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000024
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を得た。
[Example 3]
In a glass reaction vessel, the following formula:
Figure JPOXMLDOC01-appb-C000023
10.0 g (30.6 mmol, 1.00 eq) of hydrogen chloride (HCl) salt of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by the following: 45.0 mL (1.47 L / mol) of ethyl acetate ) And 34.0 g of a 15% aqueous potassium carbonate solution (potassium carbonate 36.9 mmol, 1.21 eq), soaked in a 0 ° C. refrigerant bath, and 6.87 g (31.0 mmol, 1.01 eq) of ortho-nitrobenzenesulfonyl chloride. 25.0 g of a 15% aqueous potassium carbonate solution (27.1 mmol of potassium carbonate, 0.886 eq) was added in 5 portions, followed by stirring at the same temperature for 4 hours. The conversion rate of the reaction finished liquid was 99% according to liquid chromatography analysis. The reaction-terminated liquid is diluted with 15.0 mL of ethyl acetate, separated, and the recovered aqueous layer is extracted with 15.0 mL of ethyl acetate. The recovered organic layers are combined and washed twice with 10.0 mL of 5% aqueous sodium sulfate solution. The organic layer was washed with 10.0 mL of a 10% aqueous sodium sulfate solution, the collected organic layer was concentrated under reduced pressure, and azeotroped twice with 10.0 mL of ethyl acetate and 10.0 mL of toluene to obtain the following formula:
Figure JPOXMLDOC01-appb-C000024
An optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by the following formula was obtained.
 ステンレス鋼(SUS)製耐圧反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体全量(30.6mmolとする、1.00eq)、酢酸エチル30.0mL(0.980L/mol)、トリエチルアミン9.90g(97.8mmol、3.20eq)とトリエチルアミン・3フッ化水素4.93g(30.6mmol、1.00eq)を加え、0℃の冷媒浴に浸し、過剰量のスルフリルフルオリドをボンベより吹き込み、同温度で4時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より99%であった。反応終了液に10%炭酸カリウム水溶液75.0mLを加え、酢酸エチル30.0mLで抽出し、回収水層を酢酸エチル15.0mLで抽出し、回収有機層を合わせて2N塩酸(食塩5%含有)30.0mLで洗浄し、5%炭酸水素ナトリウム水溶液(食塩5%含有)30.0mLで洗浄し、減圧濃縮し、酢酸エチルで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000025
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体を19.5g得た。収率は定量的であった(理論収量14.6g)。
In a pressure resistant reaction vessel made of stainless steel (SUS), the total amount of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector obtained above (30.6 mmol, 1.00 eq), ethyl acetate 30.0 mL (0.980 L / mol), 9.90 g (97.8 mmol, 3.20 eq) of triethylamine and 4.93 g (30.6 mmol, 1.00 eq) of triethylamine / hydrogen trifluoride were added and immersed in a refrigerant bath at 0 ° C. Then, an excessive amount of sulfuryl fluoride was blown from the cylinder and stirred at the same temperature for 4 hours. The conversion rate of the reaction finished liquid was 99% according to liquid chromatography analysis. 75.0 mL of 10% aqueous potassium carbonate solution was added to the reaction completed solution, extracted with 30.0 mL of ethyl acetate, the recovered aqueous layer was extracted with 15.0 mL of ethyl acetate, and the recovered organic layers were combined and 2N hydrochloric acid (containing 5% sodium chloride). ) Washed with 30.0 mL, washed with 30.0 mL of 5% aqueous sodium bicarbonate solution (containing 5% sodium chloride), concentrated under reduced pressure, and azeotroped with ethyl acetate to give the following formula:
Figure JPOXMLDOC01-appb-C000025
19.5 g of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product represented by the formula: The yield was quantitative (theoretical yield 14.6 g).
 ガラス製反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体全量19.5g(30.6mmolとする、1.00eq)、N,N-ジメチルホルムアミド45.0mL(1.47L/mol)と炭酸カリウム13.8g(99.8mmol、3.26eq)を加え、0℃の冷媒浴に浸し、チオフェノール9.44g(85.7mmol、2.80eq)を加え、同温度で3時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液に水113mLを加え、酢酸エチル90.0mLで抽出し、回収水層を酢酸エチル45.0mLで抽出し、回収有機層を合わせて5%食塩水45.0mLで2回洗浄し、減圧濃縮し、酢酸エチル10.0mLとトルエン10.0mLで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000026
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を得た。
In a glass reaction vessel, a total amount of 19.5 g (30.6 mmol, 1.00 eq) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs obtained above, N, N-dimethylformamide 45 0.0 mL (1.47 L / mol) and 13.8 g (99.8 mmol, 3.26 eq) of potassium carbonate were added, and immersed in a refrigerant bath at 0 ° C., 9.44 g (85.7 mmol, 2.80 eq) of thiophenol was added. In addition, the mixture was stirred at the same temperature for 3 hours. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. 113 mL of water was added to the reaction completed solution, extracted with 90.0 mL of ethyl acetate, the recovered aqueous layer was extracted with 45.0 mL of ethyl acetate, and the recovered organic layers were combined and washed twice with 45.0 mL of 5% brine, By concentrating under reduced pressure and azeotroping with 10.0 mL of ethyl acetate and 10.0 mL of toluene, the following formula:
Figure JPOXMLDOC01-appb-C000026
An optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the following formula was obtained.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体全量(30.6mmolとする)を酢酸エチル60.0mLとn-ヘプタン20.0mLに溶解し、0℃の冷媒浴に浸し、pHが3になるまで塩化水素-メタノール試薬(5-10%、東京化成工業株式会社製)を加え(25.0mL)、n-ヘプタン160mLを徐々に加え、同温度で1時間攪拌し、析出した結晶を濾過し、真空乾燥することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩を8.85g得た。「1.アミノ基保護工程」からのトータル収率は88%であった。液体クロマトグラフィー純度は96.3%であった。 The total amount (30.6 mmol) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz obtained above was dissolved in 60.0 mL of ethyl acetate and 20.0 mL of n-heptane, and a refrigerant at 0 ° C. Immerse in a bath and add hydrogen chloride-methanol reagent (5-10%, manufactured by Tokyo Chemical Industry Co., Ltd.) until the pH is 3 (25.0 mL), gradually add 160 mL of n-heptane, and continue at the same temperature for 1 hour. The mixture was stirred and the precipitated crystals were filtered and dried under vacuum to obtain 8.85 g of a hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the above formula. . The total yield from “1. Amino group protection step” was 88%. Liquid chromatography purity was 96.3%.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩全量8.85gをメタノール26.5mLと酢酸エチル17.7mLに加温下(50℃以下)で溶解し、n-ヘプタン35.4mLを加え、35℃で2時間攪拌し、n-ヘプタン17.7mLを加え、同温度で1時間、0℃で1時間攪拌し、析出した結晶を濾過し、真空乾燥することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩(再結晶品)を7.65g得た。回収率は86%であった。液体クロマトグラフィー純度は99.4%であった。 A total of 8.85 g of the hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was heated to 26.5 mL of methanol and 17.7 mL of ethyl acetate (50 ° C. 3) mL of n-heptane was added and stirred at 35 ° C. for 2 hours, 17.7 mL of n-heptane was added, and the mixture was stirred at the same temperature for 1 hour and at 0 ° C. for 1 hour. By filtration and vacuum drying, 7.65 g of a hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the above formula was obtained. The recovery rate was 86%. Liquid chromatography purity was 99.4%.
 [実施例4]
 ガラス製反応容器に、下記式:
Figure JPOXMLDOC01-appb-C000027
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体の塩化水素(HCl)塩10.0g(30.6mmol、1.00eq)、アセトニトリル45.0mL(1.47L/mol)とオルト-ニトロベンゼンスルホニルクロリド6.85g(30.9mmol、1.01eq)を加え、0℃の冷媒浴に浸し、トリエチルアミン6.50g(64.2mmol、2.10eq)を徐々に加え、同温度で2時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液をトルエン90.0mLで希釈し、5%炭酸水素ナトリウム水溶液45.0mLで洗浄し、回収水層をトルエン20.0mLで抽出し、回収有機層を合わせて3%アンモニア水10.0mLで洗浄し(30分間攪拌)、水10.0mLで洗浄し、10%硫酸ナトリウム水溶液20.0mLで2回洗浄し、回収有機層を減圧濃縮し、酢酸エチルとトルエンで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000028
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を得た。オルト-ニトロベンゼンスルホニルクロリドは液体クロマトグラフィー分析より全く検出されなかった。
[Example 4]
In a glass reaction vessel, the following formula:
Figure JPOXMLDOC01-appb-C000027
10.0 g (30.6 mmol, 1.00 eq) of hydrogen chloride (HCl) salt of the protected optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz represented by 45.0 mL (1.47 L / mol) of acetonitrile And ortho-nitrobenzenesulfonyl chloride 6.85 g (30.9 mmol, 1.01 eq) were added, immersed in a refrigerant bath at 0 ° C., and triethylamine 6.50 g (64.2 mmol, 2.10 eq) was gradually added at the same temperature. Stir for 2 hours. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. The reaction-terminated liquid is diluted with 90.0 mL of toluene, washed with 45.0 mL of 5% aqueous sodium hydrogen carbonate solution, the recovered aqueous layer is extracted with 20.0 mL of toluene, and the recovered organic layers are combined and 10.0 mL of 3% aqueous ammonia. By washing with 10.0 mL of water, washing twice with 20.0 mL of 10% aqueous sodium sulfate, and concentrating the recovered organic layer under reduced pressure and azeotroping with ethyl acetate and toluene. Following formula:
Figure JPOXMLDOC01-appb-C000028
An optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by the following formula was obtained. No ortho-nitrobenzenesulfonyl chloride was detected by liquid chromatography analysis.
 ステンレス鋼(SUS)製耐圧反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体全量(30.6mmolとする、1.00eq)、酢酸エチル30.0mL(0.980L/mol)、トリエチルアミン9.90g(97.8mmol、3.20eq)とトリエチルアミン・3フッ化水素4.93g(30.6mmol、1.00eq)を加え、0℃の冷媒浴に浸し、過剰量のスルフリルフルオリドをボンベより吹き込み、同温度で3時間、室温で1時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液に10%炭酸カリウム水溶液75.0mLを加え、酢酸エチル30.0mLで抽出し、回収水層を酢酸エチル15.0mLで抽出し、回収有機層を合わせて2N塩酸(食塩5%含有)30.0mLで洗浄し、5%炭酸水素ナトリウム水溶液(食塩5%含有)30.0mLで洗浄し、減圧濃縮し、酢酸エチルで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000029
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体を得た。
In a pressure resistant reaction vessel made of stainless steel (SUS), the total amount of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector obtained above (30.6 mmol, 1.00 eq), ethyl acetate 30.0 mL (0.980 L / mol), 9.90 g (97.8 mmol, 3.20 eq) of triethylamine and 4.93 g (30.6 mmol, 1.00 eq) of triethylamine / hydrogen trifluoride were added and immersed in a refrigerant bath at 0 ° C. Then, an excessive amount of sulfuryl fluoride was blown from the bomb and stirred at the same temperature for 3 hours and at room temperature for 1 hour. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. 75.0 mL of 10% aqueous potassium carbonate solution was added to the reaction completed solution, extracted with 30.0 mL of ethyl acetate, the recovered aqueous layer was extracted with 15.0 mL of ethyl acetate, and the recovered organic layers were combined and 2N hydrochloric acid (containing 5% sodium chloride). ) Washed with 30.0 mL, washed with 30.0 mL of 5% aqueous sodium bicarbonate solution (containing 5% sodium chloride), concentrated under reduced pressure, and azeotroped with ethyl acetate to give the following formula:
Figure JPOXMLDOC01-appb-C000029
An optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product represented by the following formula was obtained.
 ガラス製反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体全量(30.6mmolとする、1.00eq)、N,N-ジメチルホルムアミド45.0mL(1.47L/mol)と炭酸カリウム12.7g(91.9mmol、3.00eq)を加え、0℃の冷媒浴に浸し、チオフェノール9.44g(85.7mmol、2.80eq)を加え、同温度で4時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液に水113mLを加え、酢酸エチル90.0mLで抽出し、回収水層を酢酸エチル45.0mLで抽出し、回収有機層を合わせて10%食塩水30.0mLで2回洗浄し、減圧濃縮し、真空乾燥することにより、下記式:
Figure JPOXMLDOC01-appb-C000030
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を得た。
In a glass reaction vessel, the total amount of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protector obtained above (30.6 mmol, 1.00 eq), 45.0 mL of N, N-dimethylformamide ( 1.47 L / mol) and 12.7 g (91.9 mmol, 3.00 eq) of potassium carbonate were added, soaked in a refrigerant bath at 0 ° C., and 9.44 g (85.7 mmol, 2.80 eq) of thiophenol was added. Stir at temperature for 4 hours. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. To the reaction solution, 113 mL of water was added, extracted with 90.0 mL of ethyl acetate, the recovered aqueous layer was extracted with 45.0 mL of ethyl acetate, and the recovered organic layers were combined and washed twice with 30.0 mL of 10% brine, By concentration under reduced pressure and vacuum drying, the following formula:
Figure JPOXMLDOC01-appb-C000030
An optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the following formula was obtained.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体全量(30.6mmolとする)を酢酸エチル90.0mLとn-ヘプタン270mLに溶解し、0℃の冷媒浴に浸し、pHが3になるまで塩化水素-メタノール試薬(5-10%、東京化成工業株式会社製)を加え(25.0mL)、同温度で1時間攪拌し、析出した結晶を濾過し、真空乾燥することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩を8.89g得た。「1.アミノ基保護工程」からのトータル収率は88%であった。液体クロマトグラフィー純度は96.7%であった。 The total amount of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above (30.6 mmol) was dissolved in 90.0 mL of ethyl acetate and 270 mL of n-heptane, and placed in a 0 ° C. refrigerant bath. Immerse and add hydrogen chloride-methanol reagent (5-10%, manufactured by Tokyo Chemical Industry Co., Ltd.) until the pH is 3 (25.0 mL), stir at the same temperature for 1 hour, filter the precipitated crystals, and vacuum By drying, 8.89 g of hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the above formula was obtained. The total yield from “1. Amino group protection step” was 88%. The liquid chromatography purity was 96.7%.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩全量8.89gをメタノール(5mL/g)-イソプロパノール(4mL/g)-ジイソプロピルエーテル(9mL/g)から再結晶することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩(再結晶品)を8.06g得た。回収率は91%であった。液体クロマトグラフィー純度は98.4%であった。 8.89 g of the total amount of hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was added to methanol (5 mL / g) -isopropanol (4 mL / g) -diisopropyl ether ( By recrystallization from 9 mL / g), 8.06 g of hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the above formula was obtained. . The recovery rate was 91%. Liquid chromatography purity was 98.4%.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩(再結晶品)全量8.06gをメタノール(5mL/g)-イソプロパノール(4mL/g)-ジイソプロピルエーテル(9mL/g)から再結晶することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩(再々結晶品)を7.54g得た。回収率は94%であった。液体クロマトグラフィー純度は99.6%であった。 A total of 8.06 g of the hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was added to methanol (5 mL / g) -isopropanol (4 mL / g). ) -Diisopropyl ether (9 mL / g) to recrystallize the hydrogen chloride (HCl) salt (re-crystal product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the above formula. 7.54 g was obtained. The recovery rate was 94%. The liquid chromatography purity was 99.6%.
 [実施例5]
 3%アンモニア水10.0mLによる洗浄を40%メチルアミン/メタノール溶液0.5mLによる30分間攪拌接触にした他は、条件、操作等を実施例4と同様に反応を行った。その結果、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩(再結晶品)を同様の収率及び回収率で得た。
[Example 5]
The reaction was carried out in the same manner as in Example 4 except that washing with 10.0 mL of 3% aqueous ammonia was stirred and contacted with 0.5 mL of 40% methylamine / methanol solution for 30 minutes. As a result, a hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the above formula was obtained in the same yield and recovery rate.
 [実施例6]
 ガラス製反応容器に、下記式:
Figure JPOXMLDOC01-appb-C000031
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体の塩化水素(HCl)塩50.0g(153mmol、1.00eq)、酢酸エチル150mL、15%炭酸カリウム水溶液155g(168mmol、1.1eq)を加え、0℃の冷媒浴に浸し、オルト-ニトロベンゼンスルホニルクロリド34.2g(154mmol、1.01eq)および15%炭酸カリウム水溶液141g(153mmol、1.0eq)を、5回に分けて加え、同温度で4時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液をトルエン100mLで希釈し、酢酸エチル50mLを加えて抽出した。回収水層をトルエン25mLと酢酸エチル25mLで抽出し、回収有機層を合わせて10%硫酸ナトリウム水50mLにて洗浄した。有機層を15~20℃に冷却した後に40%メチルアミン/メタノール溶液5mLを加え2時間反応させた後に、有機層をイオン交換水及び高純度硫酸ナトリウム(例えばアルドリッチ社製ACSグレード)から調整した10%硫酸ナトリウム水50mLで3回洗浄した。回収有機層を減圧濃縮し、酢酸エチルとトルエンで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000032
で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体87.2gを得た。オルト-ニトロベンゼンスルホニルクロリドは液体クロマトグラフィー分析より全く検出されなかった。
[Example 6]
In a glass reaction vessel, the following formula:
Figure JPOXMLDOC01-appb-C000031
50.0 g (153 mmol, 1.00 eq) of hydrogen chloride (HCl) salt of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protector represented by formula (150), ethyl acetate 150 mL, 15% aqueous potassium carbonate solution 155 g (168 mmol, 1.1 eq), soaked in a 0 ° C refrigerant bath, and 34.2 g (154 mmol, 1.01 eq) ortho-nitrobenzenesulfonyl chloride and 141 g (153 mmol, 1.0 eq) 15% aqueous potassium carbonate solution were divided into 5 portions. And stirred at the same temperature for 4 hours. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. The reaction end solution was diluted with 100 mL of toluene, and extracted with 50 mL of ethyl acetate. The recovered aqueous layer was extracted with 25 mL of toluene and 25 mL of ethyl acetate, and the recovered organic layers were combined and washed with 50 mL of 10% aqueous sodium sulfate. After cooling the organic layer to 15 to 20 ° C. and adding 5 mL of 40% methylamine / methanol solution to react for 2 hours, the organic layer was prepared from ion-exchanged water and high-purity sodium sulfate (for example, ACS grade manufactured by Aldrich). Washed three times with 50 mL of 10% aqueous sodium sulfate. The recovered organic layer was concentrated under reduced pressure and azeotroped with ethyl acetate and toluene to give the following formula:
Figure JPOXMLDOC01-appb-C000032
Thus, 87.2 g of an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected product represented by the formula: No ortho-nitrobenzenesulfonyl chloride was detected by liquid chromatography analysis.
 ステンレス鋼(SUS)製耐圧反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体全量(153mmolとする、1.00eq)、酢酸エチル153mL(1.0L/mol)、トリエチルアミン76.4g(753mmol、4.9eq)を加え、-10℃の冷媒浴に浸した。無水フッ化水素11.4g(570mmol、3.7eq)をボンベより吹き込んだ後に、0℃の冷媒浴に浸し、過剰量のスルフリルフルオリドをボンベより吹き込み、同温度で3時間、20~25℃で1時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液に10%炭酸カリウム水溶液375mLを加え、酢酸エチル150mLで抽出し、回収水層を酢酸エチル75mLで抽出した。回収有機層を合わせて2N塩酸(食塩5%含有)125mLで洗浄し、5%炭酸水素ナトリウム水溶液(食塩5%含有)100mLで洗浄し、減圧濃縮し、酢酸エチルで共沸することにより、下記式:
Figure JPOXMLDOC01-appb-C000033
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体85.8gを得た。
In a pressure resistant reaction vessel made of stainless steel (SUS), the total amount of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protector obtained above (referred to as 153 mmol, 1.00 eq), 153 mL of ethyl acetate (1.0 L) / Mol) and 76.4 g (753 mmol, 4.9 eq) of triethylamine were added and immersed in a −10 ° C. refrigerant bath. Anhydrous hydrogen fluoride (11.4 g, 570 mmol, 3.7 eq) was blown from the bomb, then immersed in a 0 ° C. refrigerant bath, and an excess amount of sulfuryl fluoride was blown from the bomb. The same temperature was maintained for 3 hours at 20 to 25 ° C. For 1 hour. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. To the reaction solution, 375 mL of 10% aqueous potassium carbonate solution was added, extracted with 150 mL of ethyl acetate, and the recovered aqueous layer was extracted with 75 mL of ethyl acetate. The collected organic layers were combined, washed with 125 mL of 2N hydrochloric acid (containing 5% sodium chloride), washed with 100 mL of 5% aqueous sodium hydrogen carbonate solution (containing 5% sodium chloride), concentrated under reduced pressure, and azeotroped with ethyl acetate to obtain the following. formula:
Figure JPOXMLDOC01-appb-C000033
As a result, 85.8 g of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product represented by the formula:
 ガラス製反応容器に、上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体76.9g(137mmolとする、1.00eq)、N,N-ジメチルホルムアミド170mL(0.8mol/L)と炭酸カリウム57.0g(412mmol、3.00eq)を加え、0℃の冷媒浴に浸し、チオフェノール42.4g(385mmol、2.80eq)を加え、40℃に加熱し、同温度で6時間攪拌した。反応終了液の変換率は液体クロマトグラフィー分析より100%であった。反応終了液を室温に冷却後水506mLを加え、酢酸エチル203mLで抽出した。回収水層を酢酸エチル102mLで抽出し、回収有機層を合わせて10%硫酸ナトリウム水137mLで2回洗浄し、1N塩酸180mL、さらに0.1N塩酸45mLで逆抽出した。回収水層を合わせてトルエン45mLで洗浄し、20%炭酸カリウム水137mLを加えた後に酢酸エチル137mLで抽出した。回収水層を酢酸エチル69mLで抽出し、回収有機層を合わせて10%硫酸ナトリウム水45mLで洗浄した後に減圧濃縮し、真空乾燥することにより、下記式:
Figure JPOXMLDOC01-appb-C000034
で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を38.1g得た。
In a glass reaction vessel, the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected substance obtained above (76.9 g, 137 mmol, 1.00 eq), N, N-dimethylformamide (170 mL) 8 mol / L) and 57.0 g (412 mmol, 3.00 eq) of potassium carbonate, soak in a 0 ° C. refrigerant bath, add 42.4 g (385 mmol, 2.80 eq) of thiophenol, and heat to 40 ° C. Stir at temperature for 6 hours. The conversion rate of the reaction finished liquid was 100% by liquid chromatography analysis. The reaction-terminated liquid was cooled to room temperature, 506 mL of water was added, and the mixture was extracted with 203 mL of ethyl acetate. The recovered aqueous layer was extracted with 102 mL of ethyl acetate, and the recovered organic layers were combined, washed twice with 137 mL of 10% aqueous sodium sulfate, and back-extracted with 180 mL of 1N hydrochloric acid and 45 mL of 0.1N hydrochloric acid. The recovered aqueous layers were combined, washed with 45 mL of toluene, and 137 mL of 20% aqueous potassium carbonate was added, followed by extraction with 137 mL of ethyl acetate. The recovered aqueous layer was extracted with 69 mL of ethyl acetate, and the combined organic layers were combined, washed with 45 mL of 10% aqueous sodium sulfate, concentrated under reduced pressure, and vacuum dried to obtain the following formula:
Figure JPOXMLDOC01-appb-C000034
As a result, 38.1 g of an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the formula (1) was obtained.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体全量(137mmolとする)を酢酸エチル270mLに溶解し、0℃の冷媒浴に浸し、pHが3になるまで塩化水素-メタノール試薬(5-10%、東京化成工業株式会社製)を加え(119mL)、さらにヘプタン450mLを加えた。同温度で1時間攪拌し、析出した結晶を濾過し、真空乾燥することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩を36.4g得た。「1.アミノ基保護工程」からのトータル収率は81%であった。液体クロマトグラフィー純度は99.00%であった。 The total amount of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above (to 137 mmol) was dissolved in 270 mL of ethyl acetate, immersed in a 0 ° C. refrigerant bath, and chlorinated until the pH reached 3. Hydrogen-methanol reagent (5-10%, manufactured by Tokyo Chemical Industry Co., Ltd.) was added (119 mL), and 450 mL of heptane was further added. The mixture was stirred at the same temperature for 1 hour, and the precipitated crystals were filtered and dried under vacuum to obtain a hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected body represented by the above formula. 36.4 g was obtained. The total yield from “1. Amino group protection step” was 81%. Liquid chromatographic purity was 99.00%.
 上記で得られた光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩全量をメタノール(3mL/g)-酢酸エチル(5mL/g)-ヘプタン(5mL/g)から再結晶することにより、上記式で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の塩化水素(HCl)塩(再結晶品)を33.3g得た。回収率は91%であった。液体クロマトグラフィー純度は99.35%であった。 The total amount of hydrogen chloride (HCl) salt of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector obtained above was added to methanol (3 mL / g) -ethyl acetate (5 mL / g) -heptane (5 mL / g). 33.3 g of a hydrogen chloride (HCl) salt (recrystallized product) of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protected product represented by the above formula was obtained. The recovery rate was 91%. Liquid chromatography purity was 99.35%.
 本発明で対象とする光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジン類は医農薬中間体として利用できる。 The optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines targeted in the present invention can be used as intermediates for medicines and agrochemicals.

Claims (3)

  1. 一般式[1]:
    Figure JPOXMLDOC01-appb-C000001
    [式中、Cbzはベンジルオキシカルボニル基を表し、Nsはニトロベンゼンスルホニル基を表す。]
    で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を有機塩基の存在下にスルフリルフルオリドと反応させることにより、一般式[2]:
    Figure JPOXMLDOC01-appb-C000002
    [式中、CbzおよびNsは前記一般式[1]と同じである。]
    で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体に変換する工程を含む、光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体の製造方法。
    General formula [1]:
    Figure JPOXMLDOC01-appb-C000001
    [Wherein, Cbz represents a benzyloxycarbonyl group, and Ns represents a nitrobenzenesulfonyl group. ]
    By reacting an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protected compound represented by the following formula with sulfuryl fluoride in the presence of an organic base:
    Figure JPOXMLDOC01-appb-C000002
    [Wherein, Cbz and Ns are the same as those in the general formula [1]. ]
    A process for producing an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product, which comprises the step of converting to an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protected product represented by the formula:
  2. 一般式[3]:
    Figure JPOXMLDOC01-appb-C000003
    [式中、Cbzはベンジルオキシカルボニル基を表す。]
    で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbz保護体のアミノ基をニトロベンゼンスルホニル基で保護することにより、一般式[1]:
    Figure JPOXMLDOC01-appb-C000004
    [式中、Cbzは前記一般式[3]と同じであり、Nsはニトロベンゼンスルホニル基を表す。]
    で示される光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体に変換する工程、
     該光学活性3-シクロプロピルアミノメチル-4-ヒドロキシピロリジンCbzNs保護体を有機塩基の存在下にスルフリルフルオリドと反応させることにより、一般式[2]:
    Figure JPOXMLDOC01-appb-C000005
    [式中、CbzおよびNsは前記一般式[1]と同じである。]
    で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体に変換する工程、および
     該光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbzNs保護体のニトロベンゼンスルホニル保護基を選択的に脱保護することにより、一般式[4]:
    Figure JPOXMLDOC01-appb-C000006
    [式中、Cbzは前記一般式[2]と同じである。]
    で示される光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体を得る工程を含む、光学活性3-シクロプロピルアミノメチル-4-フルオロピロリジンCbz保護体の製造方法。
    General formula [3]:
    Figure JPOXMLDOC01-appb-C000003
    [Wherein, Cbz represents a benzyloxycarbonyl group. ]
    By protecting the amino group of the optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine Cbz protected group represented by the following general formula [1]:
    Figure JPOXMLDOC01-appb-C000004
    [Wherein, Cbz is the same as in the general formula [3], and Ns represents a nitrobenzenesulfonyl group. ]
    A step of converting to an optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs protectant represented by:
    By reacting the protected optically active 3-cyclopropylaminomethyl-4-hydroxypyrrolidine CbzNs with sulfuryl fluoride in the presence of an organic base, the compound represented by the general formula [2]:
    Figure JPOXMLDOC01-appb-C000005
    [Wherein, Cbz and Ns are the same as those in the general formula [1]. ]
    A step of converting to an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protectant represented by formula (1) and a nitrobenzenesulfonyl protecting group of the optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine CbzNs protectant selectively By deprotecting to general formula [4]:
    Figure JPOXMLDOC01-appb-C000006
    [Wherein, Cbz is the same as the general formula [2]. ]
    A process for producing an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector comprising the step of obtaining an optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidine Cbz protector represented by the formula:
  3. 前記スルフリルフルオリドとの反応を、有機塩基とフッ化水素とからなる塩または錯体の存在下に行うことを特徴とする、請求項1または2に記載の方法。 The method according to claim 1 or 2, wherein the reaction with the sulfuryl fluoride is carried out in the presence of a salt or complex comprising an organic base and hydrogen fluoride.
PCT/JP2012/079380 2011-11-17 2012-11-13 Industrial method for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines WO2013073525A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2011251311 2011-11-17
JP2011-251311 2011-11-17
JP2012-238378 2012-10-29
JP2012238378A JP2013126970A (en) 2011-11-17 2012-10-29 Industrial method for manufacturing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines

Publications (1)

Publication Number Publication Date
WO2013073525A1 true WO2013073525A1 (en) 2013-05-23

Family

ID=48429582

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2012/079380 WO2013073525A1 (en) 2011-11-17 2012-11-13 Industrial method for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines

Country Status (2)

Country Link
JP (1) JP2013126970A (en)
WO (1) WO2013073525A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006290870A (en) * 2005-03-18 2006-10-26 Central Glass Co Ltd Fluorination reaction using sulfuryl fluoride
WO2007102567A1 (en) * 2006-03-09 2007-09-13 Kyorin Pharmaceutical Co., Ltd. Process for production of 3,4-disubstituted pyrrolidine derivative and intermediate for the production
WO2011152354A1 (en) * 2010-05-31 2011-12-08 杏林製薬株式会社 Process for preparation of 3-substituted-4-fluoropyrrolidine derivatives

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006290870A (en) * 2005-03-18 2006-10-26 Central Glass Co Ltd Fluorination reaction using sulfuryl fluoride
WO2007102567A1 (en) * 2006-03-09 2007-09-13 Kyorin Pharmaceutical Co., Ltd. Process for production of 3,4-disubstituted pyrrolidine derivative and intermediate for the production
WO2011152354A1 (en) * 2010-05-31 2011-12-08 杏林製薬株式会社 Process for preparation of 3-substituted-4-fluoropyrrolidine derivatives

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
TETRAHEDRON LETT., vol. 46, 2005, pages 4865 - 4869 *

Also Published As

Publication number Publication date
JP2013126970A (en) 2013-06-27

Similar Documents

Publication Publication Date Title
JP5186722B2 (en) Fluorination reaction using sulfuryl fluoride
JP4940790B2 (en) Dehydroxy fluorinating agent
JP5750769B2 (en) Method for preparing 2,2-difluoroethylamine
JP5359252B2 (en) Method for producing fluorosulfuric acid esters
JP5369853B2 (en) Process for producing α-fluoro-β-amino acids
JP5374895B2 (en) Process for producing optically active fluoroamines
ES2827459T3 (en) Procedure for the preparation of apixaban
JP5240078B2 (en) Method for producing 2-fluoroacrylic acid ester
EP2383252B1 (en) Method for manufacturing hydroxyl group substitution product
JP2018531946A (en) (5S, 10S) -10-Benzyl-16-methyl-11,14,18-trioxo-15,17,19-trioxa-2,7,8-trithia-12-azahenicosane-5-aminium (E) -3 -Industrial processes for the preparation of carboxyacrylate salts
WO2013073525A1 (en) Industrial method for producing optically active 3-cyclopropylaminomethyl-4-fluoropyrrolidines
JP4675065B2 (en) Method for producing 4-fluoroproline derivative
JP4610252B2 (en) Method for producing 4-fluoroproline derivative
JP5857750B2 (en) Method for producing fluoroamines
JP2009242288A (en) METHOD FOR PRODUCING N-ALKOXYCARBONYL-tert-LEUCINE
JPH11171850A (en) Production of butyric ester derivative
JP5023443B2 (en) Method for producing 4-fluoroproline derivative
ES2699927T3 (en) Method for the preparation of N - [(6-chloropyridin-3-yl) methyl] -2,2-difluoroethane-1-amine by alkylation of 2,2-difluoroethylamine
US20100267940A1 (en) Method for Producing 4-Deoxy-4-Fluoro-D-Glucose Derivative
JP2000128857A (en) Production of aliphatic polythiol compound
WO2013011887A1 (en) Method for producing (2s, 4s)-1-hydroxyacetyl-2-aminocarbonyl-4-fluoropyrrolidine
JP2008260714A (en) Method for producing optically active haloalcohols

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12849943

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12849943

Country of ref document: EP

Kind code of ref document: A1