WO2013068198A3 - Particle trap for euv source - Google Patents
Particle trap for euv source Download PDFInfo
- Publication number
- WO2013068198A3 WO2013068198A3 PCT/EP2012/070279 EP2012070279W WO2013068198A3 WO 2013068198 A3 WO2013068198 A3 WO 2013068198A3 EP 2012070279 W EP2012070279 W EP 2012070279W WO 2013068198 A3 WO2013068198 A3 WO 2013068198A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- particle trap
- hub
- blades
- euv source
- anchoring portion
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Abstract
There is disclosed a particle trap for a plasma EUV radiation source, a lithography apparatus comprising a particle trap and a device manufacturing method. In an embodiment, the particle trap includes a rotatable hub (44), and a plurality of blades (58) extending outwards from the hub. Each of the blades has an end anchoring portion (66) inserted into a complementary slot (68) in the hub, the end anchoring portion and slot being configured to hold the blades within the hub during rotation of the hub.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161558203P | 2011-11-10 | 2011-11-10 | |
US61/558,203 | 2011-11-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2013068198A2 WO2013068198A2 (en) | 2013-05-16 |
WO2013068198A3 true WO2013068198A3 (en) | 2013-10-03 |
Family
ID=47046589
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2012/070279 WO2013068198A2 (en) | 2011-11-10 | 2012-10-12 | Particle trap for euv source |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW201319763A (en) |
WO (1) | WO2013068198A2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10495987B2 (en) | 2017-09-28 | 2019-12-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Radiation source apparatus, EUV lithography system, and method for decreasing debris in EUV lithography system |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070023693A1 (en) * | 2004-12-28 | 2007-02-01 | Asml Netherlands B.V. | Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus |
US20080309893A1 (en) * | 2007-06-12 | 2008-12-18 | Asml Netherlands B.V. | Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device |
US20090045357A1 (en) * | 2006-03-29 | 2009-02-19 | Asml Netherlands B.V. | Contamination barrier and lithographic apparatus comprising same |
US20090073401A1 (en) * | 2007-09-14 | 2009-03-19 | Asml Netherlands B.V. | Lithographic apparatus with rotation filter device |
-
2012
- 2012-10-12 WO PCT/EP2012/070279 patent/WO2013068198A2/en active Application Filing
- 2012-10-25 TW TW101139555A patent/TW201319763A/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070023693A1 (en) * | 2004-12-28 | 2007-02-01 | Asml Netherlands B.V. | Method for filtering particles out of a beam of radiation and filter for a lithographic apparatus |
US20090045357A1 (en) * | 2006-03-29 | 2009-02-19 | Asml Netherlands B.V. | Contamination barrier and lithographic apparatus comprising same |
US20080309893A1 (en) * | 2007-06-12 | 2008-12-18 | Asml Netherlands B.V. | Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device |
US20090073401A1 (en) * | 2007-09-14 | 2009-03-19 | Asml Netherlands B.V. | Lithographic apparatus with rotation filter device |
Also Published As
Publication number | Publication date |
---|---|
WO2013068198A2 (en) | 2013-05-16 |
TW201319763A (en) | 2013-05-16 |
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