WO2013055141A3 - Apparatus and method for surface modification of biological material - Google Patents

Apparatus and method for surface modification of biological material Download PDF

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Publication number
WO2013055141A3
WO2013055141A3 PCT/KR2012/008300 KR2012008300W WO2013055141A3 WO 2013055141 A3 WO2013055141 A3 WO 2013055141A3 KR 2012008300 W KR2012008300 W KR 2012008300W WO 2013055141 A3 WO2013055141 A3 WO 2013055141A3
Authority
WO
WIPO (PCT)
Prior art keywords
biological material
vapor deposition
deposition source
surface modification
magnetron
Prior art date
Application number
PCT/KR2012/008300
Other languages
French (fr)
Korean (ko)
Other versions
WO2013055141A2 (en
WO2013055141A9 (en
Inventor
한승희
박원웅
전준홍
최진영
문선우
Original Assignee
한국과학기술연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 한국과학기술연구원 filed Critical 한국과학기술연구원
Publication of WO2013055141A2 publication Critical patent/WO2013055141A2/en
Publication of WO2013055141A3 publication Critical patent/WO2013055141A3/en
Publication of WO2013055141A9 publication Critical patent/WO2013055141A9/en

Links

Classifications

    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/28—Materials for coating prostheses
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C23C14/205—Metallic material, boron or silicon on organic substrates by cathodic sputtering
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/02—Inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/358—Inductive energy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS

Abstract

Provided are an apparatus and method for surface modification of a biological material for improving the osteogenesis and symphysis performance of an artificial substitute such as an implant, an artificial joint or the like used in a biological material, and various parts used in the operation thereof. The apparatus for surface modification of a biological material according to the present invention comprises: a vacuum tank of which the inside is maintained to be vacuum; a magnetron vapor deposition source for generating plasma ions of a biological material, combined to the vacuum tank; a sample mounting table for mounting a sample, provided at the location facing the magnetron vapor deposition source inside the vacuum tank;a pulsed direct current power unit for supplying pulsed direct current power to the magnetron vapor deposition source so as to generate plasma ions of a biological material sputtered from the magnetron vapor deposition source; and a high voltage pulsed power unit for supplying a negative (-) high voltage pulse to the sample mounting table so as to carry out the ion injection of the plasma ions of a biological material formed from the magnetron vapor deposition source.
PCT/KR2012/008300 2011-10-12 2012-10-12 Apparatus and method for surface modification of biological material WO2013055141A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0104070 2011-10-12
KR1020110104070A KR101305382B1 (en) 2011-10-12 2011-10-12 Surface modification device for biomaterials and method thereof

Publications (3)

Publication Number Publication Date
WO2013055141A2 WO2013055141A2 (en) 2013-04-18
WO2013055141A3 true WO2013055141A3 (en) 2013-06-13
WO2013055141A9 WO2013055141A9 (en) 2013-07-25

Family

ID=48082669

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/008300 WO2013055141A2 (en) 2011-10-12 2012-10-12 Apparatus and method for surface modification of biological material

Country Status (2)

Country Link
KR (1) KR101305382B1 (en)
WO (1) WO2013055141A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200062357A (en) * 2015-07-13 2020-06-03 가부시키가이샤 상기 Tooth-surface-membrane-forming powder containing sintered apatite
KR102131101B1 (en) * 2018-04-06 2020-07-09 서울대학교 산학협력단 Method for preparation of ePTFE-based artificial vessels with enhanced hemocompatibility via selective plasma etching
KR102179122B1 (en) * 2018-07-02 2020-11-16 한국과학기술연구원 Fabrication method of bioactive polymer-implant and bioacitve polymer-implant fabricated by the same
RU2718028C1 (en) * 2019-11-14 2020-03-30 Федеральное государственное бюджетное учреждение науки Институт сильноточной электроники Сибирского отделения Российской академии наук, (ИСЭ СО РАН) Method of surface modification of articles from titanium
KR102569322B1 (en) * 2021-03-08 2023-08-25 주식회사 코렌텍 A Method of Surface Treatment for Packaged Implant through Plasma and Surface Treatment System for Packaged Implant

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080262631A1 (en) * 2004-01-19 2008-10-23 Stitching Katholieke Universiteit Method For Providing a Polymeric Implant With a Crystalline Calcium Phosphate Coating
KR20110083827A (en) * 2010-01-15 2011-07-21 한국과학기술연구원 Method of improving wear resistance of polymeric material for artificial joint and apparatus thereof
KR101055396B1 (en) * 2009-01-14 2011-08-08 한국과학기술연구원 Solid element plasma ion implantation method and apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080262631A1 (en) * 2004-01-19 2008-10-23 Stitching Katholieke Universiteit Method For Providing a Polymeric Implant With a Crystalline Calcium Phosphate Coating
KR101055396B1 (en) * 2009-01-14 2011-08-08 한국과학기술연구원 Solid element plasma ion implantation method and apparatus
KR20110083827A (en) * 2010-01-15 2011-07-21 한국과학기술연구원 Method of improving wear resistance of polymeric material for artificial joint and apparatus thereof

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JEON, J. H. ET AL., NANOTECHNOLOGY, vol. 22, June 2011 (2011-06-01), pages 1 - 6 *
MELLO, A. ET AL., BIOMED. MATER., vol. 2, 2007, pages 67 - 77 *

Also Published As

Publication number Publication date
WO2013055141A2 (en) 2013-04-18
KR101305382B1 (en) 2013-09-06
WO2013055141A9 (en) 2013-07-25
KR20130039483A (en) 2013-04-22

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