WO2013038335A2 - Systems and methods for accelerating particles - Google Patents

Systems and methods for accelerating particles Download PDF

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WO2013038335A2
WO2013038335A2 PCT/IB2012/054717 IB2012054717W WO2013038335A2 WO 2013038335 A2 WO2013038335 A2 WO 2013038335A2 IB 2012054717 W IB2012054717 W IB 2012054717W WO 2013038335 A2 WO2013038335 A2 WO 2013038335A2
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electrodes
confinement
potential difference
accelerating particles
alternately placed
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WO2013038335A3 (en
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Krupakar Murali Subramanian
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Krupakar Murali Subramanian
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H5/00Direct voltage accelerators; Accelerators using single pulses
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H15/00Methods or devices for acceleration of charged particles not otherwise provided for, e.g. wakefield accelerators

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Particle Accelerators (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The present invention involves systems and methods for accelerating particles owing to a potential difference, said system comprising, a) at least one cathode part adapted to form at least a cathode electrode; b) at least one anode part adapted to form at least an anode electrode; characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes; c) at least an insulator between two adjacent electrodes, thereby preventing a direct path for electricity to flow between said electrodes; d) a confinement adapted to house said electrodes and said insulator; and e) at least one power supply unit.

Description

SYSTEMS AND METHODS FOR ACCELERATING PARTICLES.
FIELD OF INVENTION:
This invention relates to the field of electrical and electronic systems and methods.
Particularly, the present invention relates to systems and methods for accelerating particles owing to potential difference created by alternately placed electrodes.
Specifically, this invention relates to a system for accelerating particles employing two electrodes that have a potential difference between them to accelerate particles towards an electrode such that the accelerated particles may or may not be intercepted by an electrode; or such particles may be accelerated toward or away from a focal point of the device.
BACKGROUND OF THE INVENTION:
A conventional system for accelerating charged ions or particles towards a focal point or inertial electrostatic confinement (100) is shown in FIGURE 1 of the accompanying drawings. A potential difference is created by placing a small inner grid (10) within a larger, concentric outer grid (20), and supplying a high voltage feed (40) to the inner grid. Usually the inner grid (10) is the negative electrode, at high voltage, and the outer grid (20) is the positive electrode. The outer grid (20) may be a spherical outer chamber. When the outer grid (20) is a solid surface sphere, it may also act as a vacuum chamber. If the outer grid (20) is a non-solid surface sphere, the outer grid (20) is contained in a separate vacuum chamber (30).
The inner grid (10) is usually in the form of a spherical wire grid. The inner grid (10) is typically supported by an insulating stalk (50). The insulating stalk (50) is a conduit for a high voltage feed (40) to pass through and be connected to the inner grid (10).
A vacuum is formed within a separate chamber (30). The outer grid (20) or vacuum chamber (30) is filled with a fill gas.
A confinement is conventionally operated at a reduced pressure with a fill gas that is typically, but not limited to, deuterium, tritium or any combination thereof. The fill gas provides a source of ions, which are formed in situ when the potential is applied, so that any gas capable of ionization can be used. Ions can also be introduced into the device from devices such as but not limited to an ion gun, particle beam or any other known ion source that may inject the ions into a neutral fill gas.
When the confinement is placed in the vacuum chamber and a high voltage feed (40) is applied to the inner grid (10), ions are formed from the fill gas by the flow of electrons between the outer grid (20) and the inner grid (10). A voltage of 10 kV to 100 MV for example may be applied to the inner grid (10) with 20 kV to 200 kV DC may more commonly be applied. An electrical potential is thus created between the outer grid (20) and the inner grid (10). Fill gas ions are then accelerated from the space between the outer grid (20) and the inner grid (10) towards the inner grid (10). These ions either pass through the inner grid (10) towards the focal point of the system or impact the structure of the inner grid (10), or these ions run into each other or collide with the ambient neutral gas.
Referring O. E. Lavrent'ev's paper titled, "Electrostatic and electromagnetic high- temperature plasma traps", translated by T. J. Dolan, University of Missouri-Rolla, Missouri, pg. 33, we adapt the section on Spherical focusing of particles. In this section, O. E. Lavrent'ev shows how the spherical focusing occurs in an IEC (Inertial electrostatic confinement) device. Owing to the directed motion of particles in an IEC device the density grows proportional to 1/r2 down to some radius r0, which characterizes the accuracy of the spherical focusing. The energy yield from nuclear reactions is proportional to the product of the plasma volume times the square of the plasma density, so it grows as 1/ro with improvement of the focusing (for the same
Figure imgf000003_0001
Where Ef is the energy released per nuclear reaction, Of is the nuclear reaction cross- section, Vi is the ion velocity, ¾(r) is the ion density, na = ¾(R) is the ion density near s given by
Figure imgf000003_0002
This focusing factor accounts for the growth of ion density towards the centre. For the situation where the ions are focused to a radius r0 and the density given by
Figure imgf000004_0001
the focusing factor becomes
Figure imgf000004_0002
The accuracy of spherical focusing is determined by the conditions under which the ions are accelerated between the electrodes and by coulomb scattering of the particles. Use of ideal ion optics can eliminate defocusing of ions by the grid. Then the minimum radius ro will be determined solely by coulomb collisions. Large angle scattering at the anticipated energies and densities is unlikely. Multiple small-angle scatterings must be accounted for statistically. The influence of coulomb scattering on the accuracy of the charged particle radial motion will decrease with proximity to the centre of the sphere; and at the very centre, where the plasma density is a maximum, this influence will be zero (since the scattering changes only the radius to which particle will move after the collision). The mean square angle of ion declination from exact radial motion can be determined from the following expression:
{e2 ) = m4 \n qni (R)L / E1 2 (5)
Where Θ « ro/R is the planar angle of deviation of the charged particle trajectory from perfect radial motion, hiq is the coulomb logarithm, ¾(R) is the plasma density near the grid, L = R/2y is the mean free path for an ion until a collision with the grid, γ is the grid transparency coefficient, and F¾ is the injected ion energy. From the relation of the angular deviation and the density of the centre of the scattered plasma we have ni (R) / ni (r0) = r0 2 /R2 = qn^L /E 2 (6)
This prior art document finds the maximum attainable density at the centre of the sphere, limited by coulomb scattering of the particles. ε I ne" \nqL = 1.67 x l018£,.2 /L cm'3 (7)
For Ei = 100 keV, R = 50 cm, γ = 10~2 (a 1% loss of charged particles to the grid is assumed), then
n imax = 1019 cm"3 (8) Thus the plasma density attainable at the centre with electrostatic thermal insulation can exceed the plasma density at the grid by several orders of magnitude, and approach the density of a gas at normal atmospheric pressure, but with a plasma temperature exceeding 100 million degrees. The heat flux from the above plasma is very great, being more than 1012 W/cm2. Due to the spherical focusing the heat load on the grid is significantly less, and is not catastrophic for the grid material. The efficiency of the electrostatic thermal insulation can be estimated from the ratio of the total energy flux from the plasma to the energy losses on the grid
E 2
K =— (9)
πε \n q - ni (R)R
This equation predicts linear growth of efficiency (of thermal insulation) with decrease in density of particles. Hence, conventional systems are worked under progressively lower pressures.
However, creation of low pressure and maintenance of it requires elaborate vacuum pump systems. The process is not only costly but also cumbersome and may also delay the process. Incorrect positioning of the vacuum pump may also be detrimental to the overall system and the associated processes.
Hence, there is a necessity of a system which may be worked at a high pressure which may be close to atmospheric pressure, thus eliminating the requirement of expensive turbomolecular pumps and possibly the roughing pump as well; wherein the system may also not require any replenishment for a longer period of time.
OBJECTS OF THE INVENTION: An object of the invention is to provide an IEC system and method which is adapted to work at pressures lower than atmospheric pressure or close to atmospheric pressure or higher than atmospheric pressure.
Another object of the invention is to provide an IEC system with insulated electrodes suitable for high voltage operation.
Yet another object of the invention is to provide an IEC system and method which eliminates or mitigates the use of vacuum pumps.
Yet another object of the invention is to mitigate or eliminate premature high voltage breakdown at any pressure within the said system.
Still another object of the invention is to provide an IEC system and method which is adapted to work without replenishment for a relatively longer period of time
SUMMARY OF THE INVENTION:
The present invention involves systems and methods for accelerating particles owing to a potential difference created by alternately placed electrodes, wherein the system comprises of one or more cathode part, one or more anode part, a confinement, and a power supply unit, wherein a high pressure may be maintained within the said confinement. Further, to increase the efficiency the power supply unit may supply high voltage to the said cathode which may be in the range of million volts or higher and not excluding lower voltages beyond 20 kV. Furthermore, potential difference between the cathode part and the anode part may accelerate particles towards an electrode such that the accelerated particles may or may not be intercepted by an electrode; or such particles may be accelerated toward or away from a focal point of the device.
According to a preferred embodiment of this invention, there is provided a system for accelerating particles owing to a potential difference, said system comprises, a) at least one cathode part adapted to form at least a cathode electrode;
b) at least one anode part adapted to form at least an anode electrode; characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) at least an insulator between two adjacent electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) a confinement adapted to house said electrodes and said insulator; and e) at least one power supply unit.
According to a another embodiment of this invention, there is provided a system for accelerating particles owing to a potential difference, said system comprises, a) at least one cathode part adapted to form at least a cathode electrode;
b) at least one anode part adapted to form at least an anode electrode;
characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) at least an insulator between two adjacent electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) a confinement adapted to house said electrodes and said insulator; and e) at least one power supply unit.
wherein a pressure is maintained with the said confinement.
Typically, said confinement being maintained at a pressure which is at, around, or higher than or lower than atmospheric pressure confinement.
Typically, said system comprises a cylindrical chamber adapted to be said confinement.
Typically, said at least an anode part and at least a cathode part are electrically conductive and electrically connected wire loops, respectively.
Alternatively, said at least an anode part and at least a cathode part are electrically conductive and electrically connected sheets of metal or a coil or several loops of grids either connected together or disconnected and placed next to each other.
Typically, said at least an anode part and at least a cathode part are electrically conductive and electrically connected parts enabled to induce direction of current selected from a group of combination of directions consisting of clockwise flow and anticlockwise flow, with said parts having same directions of flow or different directions of flow or any combinations of directions of flow.
Typically, said system comprises RF signal generating means adapted to generate RF signals for use by said system such that a displacement current flows between said electrodes for keeping said system and device operational.
Typically, said system comprises an extended confinement provisioned by increasing its length and placing electrodes such that there is an alternative placement of said anode part and said cathode part placement along said confinement, such that the distance of separation between said anode part and said cathode part is governed by breakdown voltage.
Typically, said electrodes being insulated metal loops or insulated metal strips.
Typically, said electrodes being insulated metal loops or strips with an RF voltage or pulsed voltage being applied to these grids.
Typically, said system comprises a reflector plate adapted to be located at both ends of said confinement to help confine plasmas.
Typically, said system comprises electrodes spaced apart from each other in a predefined manner of spacing for effective functioning of said system in said confinement, said spacing being determined by a group of parameters consisting of gas, chamber pressure, chamber material applied voltage, applied frequency and electrode materials.
Alternatively, said electrodes are linearly staggered electrodes in said confinement, characterised in that, each of said cathode electrodes being offset, linearly, to an operative top part of said confinement with reference to the axis of the confinement and each of said anode electrodes being offset, linearly, to an operative bottom part of the confinement with reference to the axis of said confinement. Alternatively, said electrodes are linearly staggered electrodes in said confinement, characterised in that, each of said anode electrodes being offset, linearly, to an operative top part of said confinement with reference to the axis of the confinement and each of said cathode electrodes being offset, linearly, to an operative bottom part of the confinement with reference to the axis of said confinement.
Alternatively, said electrodes are angularly staggered electrodes in said confinement, characterised in that, each of said cathode electrodes being offset, angularly, to a predetermined angle with reference to the axis of said confinement and each of said anode electrodes being offset, angularly, with reference to the axis of said confinement.
Preferably, said electrodes are less than 100% transparent.
Preferably, said electrodes are cooled through forced convection.
Typically, said electrodes are comprised of shapes or cross-sections selected from a group of shapes or cross-section shaped consisting of any of the n-sided polygon, where n (is an integer) = 3 to infinity (infinity corresponds to a circle).
Typically, said electrodes are comprised of shapes such as but not limited to cylindrical, conical, tubular, helical, cube, rounded cube, rounded cuboid, elliptical, hyperbolic, parabolic, annulus.
Typically, said confinement being a cylindrical confinement is a linear cylindrical confinement.
Alternatively, said confinement being a cylindrical confinement is a non-linear cylindrical confinement, said cylinder adapted to follow a shape selected from a group of shapes consisting of curved shapes, spiral shapes, zig-zag shapes, helical shape, helical shape with varying pitch and / or radii, femat curve, Fibonacci spiral, or the like. Typically, said system comprises magnetic fields around said confinement in order to keep the ions from hitting various surfaces within the said confinement.
Typically, said magnetic fields are generated using either permanent magnets or electromagnets or any combination thereof.
Typically, said confinement being a cylindrical device such that different cylindrical devices are used in combinations for use with different gas mixtures to produce a spectrum of neutrons.
Typically, said electrode being surrounded by a 'feed-through', which is filled with matter which may have high standoff voltage.
Preferably, said electrode being surrounded by a 'feed-through', which is filled with matter which may have high standoff voltage, said feed-through comprising a material adapted to prevent leakage, said material being selected from a group consisting of an O-ring, a packing, a toric joint, a gasket, a mechanical seal of any viscoelastic, and an elastic material.
Typically, said high pressure maintained in said confinement of said system is more than 10 microns (1 x 10~2 torr).
Typically, said system for accelerating particles has a straight line configuration.
Preferably, said system for accelerating particles has a straight line configuration which is fabricated as segments that are arranged into curvilinear shapes selected from a group consisting of curved, spiral, zig-zag, helical, Fibonacci spiral, and Fermat curve.
Typically, wherein said power supply unit supplies voltages or radio frequency signals selected from a group consisting of DC, AC, in phase, out of phase, delayed, without delay, offset voltages modulated between multiple signals, and unmodulated between multiple signals. Alternatively, said system comprises signal generating means adapted to generate signals for use by said system, said signals being selected from a group of signal types consisting of unmodulated signals, modulated signals, modulated signals with multiple frequencies applicable to electrodes simultaneously, modulated signals with multiple frequencies applicable to electrodes separately, modulated signals with intermixed frequency signals, in phase signals, out of phase signals, pulse waveforms, waveforms applied to offset voltages, offset by different voltages (AC or DC) or any combination thereof.
Typically, said confinement being a conducting material or non-conducting material or partial or semi conducting material based confinement.
Typically, each of said electrodes being a purely conducting material or purely conducting material covered with non-conducting material or partial or semi conducting material, based electrode.
Alternatively, said system comprises a spherical chamber adapted to be said confinement.
Typically, said system comprises RF signal generating means adapted to generate RF signals for use by said system, said RF power being used is selected from a group of frequencies consisting of single frequency and a mixture of several frequencies super imposed or applied to different sets of coils along said chamber.
Typically, said at least an anode part comprises a positive voltage applied to said at least an anode part instead of grounding it in order to divide the voltage between two electrodes and in order to reduce stress on insulators.
Typically, said system comprises coils adapted to generate RF plasma and / or magnetic fields being embedded inside said confinement, said confinement being a chamber confinement made from insulating material.
Typically, said system comprises coils adapted to generate RF plasma and / or magnetic fields, said coils being hollow tubes cooled through forced convection. Typically, said system comprises steady state high voltage supply unit adapted to provide steady state high voltage (HV) to said at least a cathode part.
Typically, said system comprises pulsed high voltage supply unit adapted to provide pulsed HV to said at least a cathode part.
Typically, said system comprises coils adapted to generate RF plasma and / or magnetic fields to said at least a cathode part, whether separately or overlaid on the cathode voltage (steady state or pulsed).
Alternatively, said system comprises coils adapted to generate RF plasma and / or magnetic fields being embedded outside said confinement being a chamber confinement made from insulating material.
Alternatively, said system comprises coils adapted to generate RF plasma and / or magnetic fields being sandwiched within a groove between an inner insulator chamber confinement and an outer insulator chamber confinement.
Typically, said confinement is a confinement chamber made of transparent or translucent material.
Typically, said confinement comprises a single light source or several such sources of sufficiently high energy placed in close vicinity of said chamber, said light from said sources being adapted to ionize the ambient gas within said chamber.
Typically the said light source could be placed inside the first chamber if the chamber were opaque to the said light or alternately, outside the first chamber if the chamber were transparent or translucent to the said light or if the said first chamber is opaque, the said chamber is provided with a provision such as but not limited to a window for the purpose of letting the light into or out of the system. Typically the second chamber surrounding the first chamber would reflect the light from this source or the light from the first chamber back into the first chamber so as to enhance the ionization fraction of the plasma confined by the first chamber.
Typically, said confinement comprises a first chamber a second chamber, said second chamber being adapted to surround said first chamber.
Alternatively, said confinement comprises a first chamber a second chamber, said second chamber being adapted to surround said first chamber, and wherein, said second chamber being coated with reflecting material to reflect back any light escaping from said first transparent or translucent confinement chamber.
Typically, said system is filled with gas.
Typically, said system being filled with fine particles suspended in the fluid medium within the chamber or generally the gas, the said gas being selected from a group of gases consisting of air, Deuterium (D), Tritium(T), DT, D2, T2, Helium, any molecule represented by:
CaHbDeTdAAeBBfCCgDDhEEiFFjGGkHHaimJJnKKoLLpMMqN .OOsPPtQQu v where C is carbon, D is deuterium, T is tritium, H is hydrogen, the symbols AA, BB, CC, DD, EE, FF, GG, HH, II, JJ, KK, LL, MM, NN, 00, PP, QQ, RR represent either same or different element(s) or their isotopes from the periodic table (for instance, AA could symbolically represent silicon, EE could represent fluorine and HH could once again represent fluorine (same element as EE) SieFiFi, when e = 1 , i = 1 , j = 3 the compound this stated formula represents is SiF4) that form a chemical bond with the remaining elements in the compound, with the small letters a,b,c,d,e,f,g,h,i,j,k,l,m,n,o,p,q,r,s,t,u,v are integers that take any value from 0 to 30 representing the number of atoms (to which it is a subscript, for instance a = 1 , b = 0, c = 4, d..r = 0, represents CD4, deuterated methane), the said compounds may be prepared using any other combination of isotopes of the said elements and could be mixtures of more than one gas or could be fine particles suspended in the fluid medium or any combination thereof. Typically, said confinement has gas in it at the appropriate pressure, pressure being determined based on applied voltage, applied frequency, chamber material, chamber dimensions and electrode dimensions.
Typically, said chamber has gas in it at an appropriate pressure for operation, wherein the term operation means, nuclear fusion reactions occur within the system.
Preferably, said confinement having high pressure being a confinement having pressure higher than 10 microns (1 x 10~2 torr) or closer to or higher than the atmospheric pressure.
Typically, at least a part of the said electrode part is an insulated electrode part.
Typically, at least a cathode part is an insulated cathode part.
Alternatively, said at least an anode part is an insulated anode part.
Typically, said system comprises a pulsed high voltage generation means adapted to apply pulsed high voltage to said system.
Alternatively, said system comprises a spherical chamber adapted to be said confinement, said spherical chamber being made from a material selected from a group of materials consisting of conductor such as but not limited to aluminum, stainless steel, Inconel alloy, or semiconductor such as but not limited to silicon, germanium or insulator such as but not limited to glass, quartz, polymer and ceramic chamber or any combination thereof.
Alternatively, said system comprises an outer metal enclosure that may not be vacuum sealed, but is capable of reflecting at least some light or is at least a Faraday cage to prevent at least some RF signals from escaping the said system.
Alternatively, said system comprises a plurality of high voltage stalks supporting said at least a cathode part. According to this invention, there is also provided a method for accelerating particles owing to a potential difference, said method comprises the steps of:
a) providing at least one cathode part adapted to form at least a cathode electrode; b) providing at least one anode part adapted to form at least an anode electrode; characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) providing at least an insulator between at least two electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) applying high power to at least an electrode part, wherein the said high power is supplied through a power supply unit; and
e) creating a potential difference between the cathode part and the anode part; wherein a particle is accelerated towards or away from a focal point of the confinement or the electrodes.
According to this invention, there is also provided a method for accelerating particles owing to a potential difference, said method comprises the steps of:
a) providing at least one cathode part adapted to form at least a cathode electrode; b) providing at least one anode part adapted to form at least an anode electrode; characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) providing at least an insulator between at least two electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) maintaining a high pressure within a confinement;
e) supplying electricity through at least one surrounding material, wherein surrounding material is selected from a group consisting of conducting material, non-conducting material, and partial or semi conducting material;
f) applying high power to at least electrode part, wherein the said high power is supplied through a power supply unit; and
g) creating a potential difference between the cathode part and the anode part; wherein a particle is accelerated towards or away from a focal point of the confinement or the electrodes.
Typically, said step of maintaining a high pressure comprises the step of maintaining an atmospheric pressure in said confinement. Typically, said step of providing at least an anode part and providing at least a cathode part comprises the step of providing electrically conductive and electrically connected metal loops, or plates respectively.
Alternatively, said step of providing at least an anode part and providing at least a cathode part comprises the step of providing electrically conductive and electrically connected sheets of metal or a coil or several loops of grids placed next to each other and either electrically connected or electrically isolated.
Typically, said step of providing at least an anode part and providing at least a cathode part comprises the step of providing electrically conductive and electrically connected parts enabled to induce direction of current selected from a group of combination of directions consisting of clockwise flow and anticlockwise flow, with said parts having same directions of flow or different directions of flow or any combinations of directions of flow.
Typically, said method comprises the step of generating means RF signals for use by said method such that a displacement current flows between said electrodes.
Typically, said method comprises the step of providing an extended confinement provisioned by increasing its length and placing electrodes such that there is an alternative placement of said anode part and said cathode part placement along said confinement, such that the distance of separation between said anode part and said cathode part is governed by breakdown voltage.
Typically, said method comprises the step of providing a reflector plate adapted to be located at both ends of said confinement to help confine plasmas.
Typically, said method comprises the step of providing electrodes spaced apart from each other in a pre-defined manner of spacing for effective functioning of said method in said confinement, said spacing being determined by a group of parameters consisting of gas, chamber pressure, chamber material applied voltage, applied frequency and electrode materials. Alternatively, said method comprises the step of providing electrodes such that said electrodes are linearly staggered electrodes in said confinement, characterised in that, each of said cathode electrodes being offset, linearly, to an operative top part of said confinement with reference to the axis of the confinement and each of said anode electrodes being offset, linearly, to an operative bottom part of the confinement with reference to the axis of said confinement.
Alternatively, said method comprises the step of providing electrodes such that said electrodes are linearly staggered electrodes in said confinement, characterised in that, each of said anode electrodes being offset, linearly, to an operative top part of said confinement with reference to the axis of the confinement and each of said cathode electrodes being offset, linearly, to an operative bottom part of the confinement with reference to the axis of said confinement.
Alternatively, said method comprises the step of providing electrodes such that said electrodes are angularly staggered electrodes in said confinement, characterised in that, each of said cathode electrodes being offset, angularly, to a pre-determined angle with reference to the axis of said confinement and each of said anode electrodes being offset, angularly, with reference to the axis of said confinement.
Typically, said method comprises provisioning magnetic fields around said confinement in order to keep the ions from hitting the surface of said confinement.
Typically, said step of providing at least one high power supply unit comprises the step of supplying voltages or radio frequency signals selected from a group consisting of in phase, out of phase, delayed, without delay, modulated between multiple signals, offset signals and unmodulated between multiple signals.
Alternatively, said method comprises a step of generating signals for use by said method, said signals being selected from a group of signal types consisting of unmodulated signals, modulated signals, modulated signals with multiple frequencies applicable to electrodes simultaneously, modulated signals with multiple frequencies applicable to electrodes separately, modulated signals with intermixed frequency signals, in phase signals, out of phase signals, pulse waveforms, waveforms applied to offset voltages, offset by different voltages (AC or DC) or any combination thereof.
Typically, said method comprises the step of generating means RF signals for use by said method, said RF power being used is selected from a group of frequencies consisting of single frequency and a mixture of several frequencies super imposed or applied to different sets of coils along said chamber.
Typically, said step of providing at least one anode part comprises a step of applying positive voltage applied to said at least an anode part instead of grounding it in order to divide the voltage between two electrodes and in order to reduce stress on the insulators.
Typically, said method comprises a step of generating means RF plasma and / or magnetic fields, using coils, for use by said method, said coils being embedded inside said confinement, said confinement being a chamber made of insulating material such as but not limited to glass, quartz, ceramic, or semiconductor material.
Typically, said method comprises a step of generating means RF plasma and / or magnetic fields, using coils, for use by said method, said coils being hollow tubes cooled through forced convection.
Typically, said method comprises a step of providing steady state high voltage supply unit adapted to provide steady state high voltage to the said cathode or anode part.
Typically, said method comprises a step of providing pulsed high voltage supply unit adapted to provide pulsed HV to the said cathode part.
Typically, said method comprising a step of generating means RF plasma and / or magnetic fields, using coils, to said at least a cathode part, whether separately or overlaid on the cathode voltage (steady state or pulsed).
Alternatively, said method comprises a step of generating means RF plasma and / or magnetic fields, using coils, for use by said method, said coils being embedded outside said confinement, said confinement being made of insulating material such as but not limited to glass, quartz, ceramic or semiconducting material.
Alternatively, said method comprises a step of generating means RF plasma and / or magnetic fields, using coils, for use by said method, said coils being sandwiched within a groove between an inner confinement made of insulating material and an outer confinement made of insulating material.
Typically, the said insulating material is such as but not limited to glass, quartz, ceramic or any combination thereof.
Typically, the said semiconducting material is such as but not limited to silicon, germanium, carbon (diamond) or any combination thereof.
Typically, said step of maintaining a high pressure within a confinement comprises a step of maintaining a high pressure within a confinement chamber made of transparent or translucent material.
Typically, said step of maintaining a high pressure within a confinement comprises a step of providing a single light source or several such sources of sufficiently high energy placed in close vicinity of said chamber, said light from said sources being adapted to ionize the ambient gas within said chamber.
Typically, said step of maintaining a high pressure within a confinement comprises a step of providing a first chamber a second chamber, said second chamber being adapted to surround said first chamber.
Alternatively, said step of maintaining a high pressure within a confinement comprises a step of providing a first chamber, a second chamber, said second chamber being adapted to surround said first chamber, and wherein, said second chamber being coated with reflecting material to reflect back light escaping from said first transparent or translucent confinement.
Typically, said method comprises a step of being filled with gas. Typically, said system being filled with fine particles suspended in the fluid medium within the chamber or generally the gas, the said gas being selected from a group of gases consisting of air, Deuterium (D), Tritium(T), DT, D2, T2, Helium, any molecule represented by CaHbDcTdAAeBBfCCgDDhEEiFFjGGkHHiIImJJnKK0LLpMMqN r (where C is carbon, D is deuterium, T is tritium, H is hydrogen, the symbols AA, BB, CC, DD, EE, FF, GG, HH, II, JJ, KK, LL, MM, and N represent either same or different element(s) or their isotopes from the periodic table (for instance, AA could symbolically represent silicon, EE could represent fluorine and HH could once again represent fluorine (same element as EE) SieFiFi, when e = 1, i = 1, j = 3 the compound this stated formula represents is S1F4) that form a chemical bond with the remaining elements in the compound, with the small letters a,b,c,d,e,f,g,h,i,j,k,l,m,n,o,p,q,r are integers that take any value from 0 to 30 representing the number of atoms (to which it is a subscript, for instance a = 1, b = 0, c = 4, d..r = 0, represents CD4, deuterated methane), the said compounds may be prepared using any other combination of isotopes of the said elements and could be mixtures of more than one gas or could be fine particles suspended in the fluid medium or any combination thereof.
Typically, said step of providing at least one cathode part and providing at least one anode part comprises a step of providing said electrodes of shapes being selected from a group of shapes consisting of spherical, cubical, conical, parallelepiped, discshaped, wire-grid, wire -mesh, wire-loop or any combination thereof.
Typically, said step of maintaining appropriate pressure within the confinement to ensure operation of the device. The said system is said to be operational when it produces radiation.
Preferably, said step of maintaining a high pressure within a confinement comprises a step of having pressure higher than 10 microns (1 x 10" torr) or closer to or higher than the atmospheric pressure. Typically, the said device geometry with insulating material between the electrodes improves the high voltage performance of the said device at any pressure of operation by mitigating or eliminating high voltage breakdown.
Typically, said step of providing some insulation on at least one electrode part comprises a step of providing insulation on at least a cathode part.
Alternatively, said step of providing some insulation to at least one electrode part comprises a step of providing insulation on at least an anode part.
Alternatively, said step of providing insulation on at least one electrode part comprises a step of providing insulation on at least a cathode part and an insulation on at least an anode part.
Typically, said method comprises a step of applying pulsed high voltage to said system.
Alternatively, said method comprises a step of providing a spherical chamber adapted to be said confinement, said spherical chamber being made from a material selected from a group of materials consisting of an insulator such as but not limited to glass, quartz, and ceramic chamber or any combination thereof.
Alternatively, said method comprises a step of providing an outer metal enclosure that may not be vacuum sealed, but is at least Faraday cage to prevent RF signals from escaping said system.
Alternatively, said method comprises a step of providing plurality of high voltage stalks supporting said at least a cathode part.
BRIEF DESCRIPTION OF THE ACCOMPAYING DRAWINGS:
Figure 1 illustrates a schematic conventional system for accelerating charged ions or particles towards a focal point or inertial electrostatic confinement. The invention will now be described in relation to the accompanying drawings, in which:
Figure 2 illustrates an example of a schematic drawing of a cylindrical IEC device;
Figures 2a, 2b, and 2c illustrate an example of a various schematic drawings of a cylindrical IEC device;
Figure 2d illustrates an example of the coils are embedded inside the glass enclosure;
Figure 2e illustrates an example of the coils outside the insulator (glass) chamber;
Figure 3 illustrates an example of a schematic (infinite) extension of the cylindrical device of Figure 2 by alternating the electrodes;
Figure 4a illustrates an example of a schematic drawing of alternating electrodes with leads on either end, providing maximum standoff voltage in air;
Figure 4b illustrates an example of a schematic drawing of electric leads separated and placed on the same side to make more room at the bottom and having all the electrodes/leads conveniently on the same side;
Figure 5 illustrates an example of various cross-sections of the electrodes; Figure 6 illustrates an example of various shapes of the confinement; Figure 7 illustrates a spiral source;
Figure 8 illustrate a helix shape of the confinement with varying pitch and radius; Figure 9 illustrates a Fermat curve of the confinement; Figure 10 illustrates a Fibonacci spiral of the confinement; Figure 1 1 illustrates an exemplary embodiment of the system;
Figure 12 illustrates another exemplary embodiment of the system of this invention.
Figures 13a, 13b, and 13c illustrate various schematic drawings of a spherical IEC device; with possible combination of distribution of insulating material around the electrodes.
Figure 14(a) shows a set of coils or simply a single coil that is embedded within the glass outer vacuum chamber;
Figure 14(b) shows a similar configuration, but the outer grid wires are placed outside the glass/quartz chamber walls;
Figure 15 shows an IEC device with two HV stalks supporting the cathode;
Figure 16 illustrates a cross-section of the HV stalk Feedthrough along with the double-cap oil seal;
Figure 17 illustrates a tube holding the HV stalk;
Figure 18 illustrates a metal plate placed in front of a tube connecting the chamber to the vacuum pump;
Figure 19 illustrates a parallel plate anode and cathode arrangement;
Figure 20 illustrates a 2D representation of parallel plate configuration, showing the maximum angle of release (after a fusion event); and
Figure 21 illustrates a 3D representation of spherical IEC configuration, showing the electrodes, chamber, the mean free path and the concentric distribution of ions within the device.
DETAILED DESCRIPTION OF THE ACCOMPAYING DRAWINGS: Figure 1 illustrates a schematic conventional system for accelerating charged ions or particles towards a focal point or inertial electrostatic confinement (100). Its construction and working is explained, above.
According to this invention, there is provided a system and method for accelerating particles.
The present invention in a preferred embodiment provides systems and methods for accelerating particles owing to a potential difference created by alternately placed electrodes, wherein the system comprises of one or more cathode part, one or more anode part, a confinement, and a high power supply unit, wherein a high pressure may be maintained within the said confinement. Further, to increase the efficiency the high power supply unit may supply high voltage to the said cathode which may be in the range of million volts or higher and not excluding lower voltages beyond 20 kV. Furthermore, potential difference between the cathode part and the anode part may accelerate particles towards an electrode such that the accelerated particles may or may not be intercepted by an electrode; or such particles may be accelerated toward or away from a focal point of the device.
In an embodiment of the invention, a method for accelerating particles owing to a potential difference created by alternately placed electrodes comprises the steps of; a) at least one cathode part adapted to form at least a cathode electrode;
b) at least one anode part adapted to form at least an anode electrode;
characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) at least an insulator between two adjacent electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) a confinement adapted to house said electrodes and said insulator; and e) at least one power supply unit.
In an embodiment of the invention, a method for accelerating particles owing to a potential difference created by alternately placed electrodes comprises the steps of; a) providing at least one cathode part adapted to form at least a cathode electrode;
b) providing at least one anode part adapted to form at least an anode electrode; characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) providing at least an insulator between at least two electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) applying high power to at least an electrode part, wherein the said high power is supplied through a power supply unit; and
e) creating a potential difference between the cathode part and the anode part; wherein a particle is accelerated towards or away from a focal point of the confinement or the electrodes.
Figure 2 illustrates a schematic drawing of a cylindrical IEC device (200) in accordance with the system of this invention.
In accordance with an embodiment of this invention, there is provided a cylindrical chamber (212). The IEC device of this system comprises this cylindrical chamber. The anode and cathode parts are located inside this cylindrical chamber. The cylindrical chamber may be made of material such as but not limited to conductor, insulator, or semiconductor. The cylindrical chamber may also be made of conducting material surrounding by insulator, or insulator surrounded by conductor or alternate layers of insulators and conductors. The cylindrical tube may also be made of semiconducting material surrounded by either insulator or conductor, or any combination thereof that could form multiple layers.
In accordance with another embodiment of this invention, there is provided at least an anode part (214) and at least a cathode part (216). At least an anode part and at least a cathode part, typically, are wire loops, respectively. Typically, they are electrically conductive and electrically connected wire loops. A current may be forced through the wire loop that protects the grids from ion bombardment by deflecting them away from the grid as they approach them (grid wires) using the magnetic fields generated by such currents. A high voltage is applied to the same grids, while currents continue to flow across the wires. The direction of current could be any combination - the anodes may have clockwise flow, the cathode may have anticlockwise flow, or the two electrodes may have same flow or any combination thereof.
Alternatively, the wires could be replaced with sheets of metal or a coil or several loops of grids placed next to each other that that may or may not be electrically connected.
In accordance with yet another embodiment of this invention, there is provided at least an insulator (218) between two adjacent electrodes. This prevents a direct path for electricity to flow between electrodes.
Reference number 220 refers to current leads.
The system and device of this invention uses RF signals. Hence, a displacement current will flow between the electrodes that will keep the system and device operational. Due to this, electron losses will be greatly mitigated. Also, very high voltage operation (depending on the standoff voltage of the insulator used) will be possible in a compact geometry. Further, power consumed will be minimal and device over heating will not occur in this geometry. Additional system cooling will not be needed.
In accordance with yet another embodiment of this invention, the length of the cylindrical device can be indefinitely extended by alternating the anode and cathode placement along the tube. The distance of separation between the electrodes would be governed by the a distance separation factor such as but not limited to applied voltage, chamber pressure, gas composition, electrode shape, electrode material, applied frequency, ramp rate of the applied voltage. The said electrodes could also be insulated and an RF voltage or pulsed voltage could be applied to these grids.
In accordance with still another embodiment of this invention, a reflector plate may be used at both ends of the cylindrical device to help confine the plasmas. Alternately, the confinement tube has to be extended to compensate for the absence of a reflecting plate. Extending the confinement tube on either end beyond the electrode placement zone would allow the ions to re-circulate in the region rather than being lost through collisions with the chamber walls.
Alternately, strong magnetic fields generated using electromagnets or permanent magnets could be used to reflect the ions from the extremities of the confinement chamber.
Figures 2a, 2b, and 2c illustrate various schematic drawings of a cylindrical IEC device (200) in accordance with the system of this invention. These various schematic drawings depict variations in the configuration / assembly of the cylindrical IEC device. A cylindrical device is an approximation of a line source of radiation when compared to a spherical device that is a volume source that is closer to a point source. F power used, as in the case of cylindrical or spherical IEC devices could either be a single frequency or a mixture of several frequencies super imposed or applied to different set of coils along the vacuum chamber walls. These configurations would provide same advantages to cylindrical IEC devices as to spherical IEC devices. These cylindrical and spherical devices can also be operated in a mode where a positive voltage is applied to the anode instead of simply grounding it. This divides the voltage between two electrodes and reduce the stress on the insulators.
Figure 2d illustrates the coils are embedded inside the glass enclosure (214) and Figure 2e illustrates the coils outside the glass chamber (214). The coils could be used to generate RF plasma within the chamber. Some of these coils could also be used to generate magnetic fields to confine the plasma. Any combination of the above described combination could also be used. Although the figures 2a, 2b, 2c, 2d, and 2e do not show the vacuum seal, gas inlet ports or the insulators used to isolate the leads, the same can be easily designed by those skilled in the art. The above configurations can be achieved using any number of combinations of chamber, electrical leads, insulators etc.
Figure 3 illustrates a schematic (infinite) extension of the cylindrical device of Figure 2 by alternating the electrodes. A reflector is not shown in the figure at either ends but can be used optionally. The spacing dl, d2, and d3 are critical for the effective functioning of the cylindrical device (212). These spacings are dependent on the gas, chamber pressure, chamber material (for surface breakdown), electrode materials, applied voltages, applied frequencies and can be determined experimentally by those skilled in the art. One way to mitigate the air-breakdown issues is to have the electrodes on either end of the device (to maximize it) or could simply stagger the electrodes at an angle as shown in Figures 4a and 4b of the accompanying drawings.
Figure 4a illustrates a schematic drawing of alternating electrodes with leads on either end, providing maximum standoff voltage in air. Figure 4b illustrates a schematic drawing of electric leads separated and placed on the same side to make more room at the bottom and having all the electrodes/leads conveniently on the same side. The electrodes (loops) could be less than 100% transparent and could be cooled through forced convection, if necessary.
In accordance with an exemplary embodiment, as illustrated in Figure 5 of the accompanying drawings, the electrodes could have any of the cross-sections, circular, helical, cube, rounded cube, rounded cuboid, annulus etc. any of the n-sided polygon, where n = 3 to infinity (infinity corresponds to a circle). The cylindrical source need not be linear. The cylinder could follow any shape, curved, spiral, zig-zag or the like as illustrated in Figure 6 of the accompanying drawings. A spiral source (as illustrated in Figure 7 of the accompanying drawings) could be used as a "surface source". As the number of spirals increases, the surface area covered increases. A helix like structure could be used to surround a device. The electrodes could be placed either on top or bottom or both.
Further, a helix (as illustrated in Figure 8 of the accompanying drawings) with varying pitch and radius is one of the possibilities with the cylindrical source. A helix could tilt or follow a curve to surround an object that is either on the axis or is displaced with respect to it. The electrodes could be placed on the outside or inside (or both) of the spiral. A Fermat curve (as illustrated in Figure 9 of the accompanying drawings) is another possibility. Also, Fibonacci spiral (as illustrated in Figure 10 of the accompanying drawings) is yet another variation. At the centre, there could be a single point of origin or multiple points of origin. Still further, magnetic fields could be used around the cylindrical device to keep the ions from hitting the surface of the chamber. Furthermore, when several electrodes are used in close proximity, any curve could be approximated by a combination of straight lines and a cylindrical source would approximate these straight line sources but still follow the curve prescribed. Magnetic fields could be generated either by permanent magnets or coils carrying appropriate currents.
In yet another embodiment, the cylindrical device could be arranged as shown in Figure 1 1 of the accompanying drawings, wherein, the linear rods (222) form the device and the helical intertwining strips (224) could either be structural components or electrode provisions. The pitch, spacing radius etc. could be varied.
Different cylindrical devices used in combinations could essentially use same or different gas mixtures to produce a spectrum of neutrons. Typically, the said gas being selected from a group of gases consisting of air, Deuterium (D), Tritium(T), DT, D2, T2, Helium, any molecule represented by CaHbDcTdAAeBBfCCgDDhEEiFFjGGkHHaimJJnKKoLLpMMqN , (where C is carbon, D is deuterium, T is tritium, H is hydrogen, the symbols AA, BB, CC, DD, EE, FF, GG, HH, II, JJ, KK, LL, MM, and N represent either same or different element(s) or their isotopes from the periodic table (for instance, AA could symbolically represent silicon, EE could represent fluorine and HH could once again represent fluorine (same element as EE) SieFiFi, when e = 1, i = 1, j = 3 the compound this stated formula represents is S1F4) that form a chemical bond with the remaining elements in the compound, with the small letters a,b,c,d,e,f,g,h,i,j,k,l,m,n,o,p,q,r are integers that take any value from 0 to 30 representing the number of atoms (to which it is a subscript, for instance a = 1, b = 0, c = 4, d..r = 0, represents CD4, deuterated methane), the said compounds may be prepared using any other combination of isotopes of the said elements and could be mixtures of more than one gas or could be fine particles suspended in the fluid medium or any combination thereof.
Figure 12 illustrates another exemplary embodiment of the system of this invention.
Each of the tubes (226) could be cylindrical IEC devices with electrodes connected at the ends; they could also be separated. A voltage V applied to the electrodes (for instance, applied to an inductor connected to an electrode to exploit di/dt) that could at least be varied in amplitude and amplify the voltage to be in the fusion relevant regime, that is 2kV and higher.
Signals, applied to the electrodes (214, 216) could also be modulated by other signals, essentially multiple frequencies could be applied to the electrodes simultaneously or separately. Two or more frequency signals could be intermixed. Signals could be in phase or out of phase or could also be offset by different voltages (AC or DC) or any combination thereof. The said signals could be applied to the cathode part or anode part or both.
In an embodiment of the invention, the confinement chamber is made of transparent or translucent material. A single light source or several such sources of sufficiently high energy are placed in the close vicinity of the chamber. The light from these sources will help ionize the ambient gas within the chamber.
In another embodiment of the invention a second chamber may be provided to surround the said first confinement chamber. The said second chamber need not necessarily be air tight, however the inside surface of the said second chamber could be coated with reflecting material to reflect back light escaping from the said first transparent or translucent confinement chamber.
In an embodiment of the invention, the electricity supplied to one or more cathode part or one or more anode part of a system may be supplied in a clockwise or counterclockwise direction or in any combination thereof.
In an embodiment of the invention, the confinement of the systems in accordance with the invention may include a part enclosed within a cathode part or an anode part.
In an embodiment of the invention, the confinement or one or more cathode part or one or more anode part of the systems in accordance with the invention may be a conducting material or non-conducting material or partial or semi conducting material, which may include but is not limited to metals, non-metals, alloys, insulators, glass, quartz, ceramic, fibre glass, mica, graphite, carbon fibers, carbon nanotubes, or any other nano materials or any combination thereof.
In an embodiment of the invention, the confinement or one or more cathode part or one or more anode part of the systems in accordance with the invention may be further surrounded by one or more layers of conducting material or non-conducting material or partial or semi conducting material which may include but is not limited to metals, non-metals, alloys, insulators, glass, quartz, ceramic, fibre glass, mica, graphite, carbon nanotubes, carbon fibers, other nanomaterials or any combination thereof.
In an embodiment of the invention, one (or more) cathode part(s) or one (or more) anode part(s) may be used which may establish uniform distribution of electricity or energy flux or particles or any combination thereof.
In an embodiment of the invention, one or more cathode part or one or more anode part of the systems in accordance with the invention may be further surrounded by a compartment, hereinafter referred to as a 'feed-through', which may optionally or additionally be filled with matter which may have high standoff voltage such as but not limited to oil or boron nitride or any combination thereof.
In an embodiment of the invention, one or more feed-through may have one or more O-ring, or packing, or toric joint, or a gasket, or a mechanical seal of any viscoelastic or elastic material which may prevent leakage.
In an embodiment of the invention, the confinement of the system in accordance with the invention may be filled with a fill gas which may include but is not limited to air,, Deuterium (D), Tritium(T), DT, D2, T2, Helium, any molecule represented by CaHbDcTdAAeBBfCCgDDhEEiFFjGGkHHIIImJJnKKoLLpMMqNNr (where C is carbon, D is deuterium, T is tritium, H is hydrogen, the symbols AA, BB, CC, DD, EE, FF, GG, HH, II, JJ, KK, LL, MM, and NN represent either same or different element(s) or their isotopes from the periodic table (for instance, AA could symbolically represent silicon, EE could represent fluorine and HH could once again represent fluorine (same element as EE) SieFiFl, when e = 1, i = 1, j = 3 the compound this stated formula represents is SiF4) that form a chemical bond with the remaining elements in the compound, with the small letters a,b,c,d,e,f,g,h,i,j,k,l,m,n,o,p,q,r are integers that take any value from 0 to 30 representing the number of atoms (to which it is a subscript, for instance a = 1 , b = 0, c = 4, d..r = 0, represents CD4, deuterated methane), the said compounds may be prepared using any other combination of isotopes of the said elements and could be mixtures of more than one gas or could be fine particles suspended in the fluid medium or any combination thereof.
In an embodiment of the invention, one or more cathode part or one or more anode part may be cooled by circulation of a cooling agent which may include any gas or liquid or materials in suspension or colloid but is not limited to air, water, nitrogen, hydrogen, Freon, helium or any combination thereof.
In an embodiment of the invention, one or more cathode part or one or more anode part may be in a staggered configuration, wherein alternate cathode part or anode part are oriented in different directions; wherein the orientations may include but is not limited to opposite direction or placed at an angle with each other, or any combination thereof.
In an embodiment of the invention, the electrodes of the system of the invention may independently have various cross-sectional shapes such as an n-sided polygon where 'n' is an integer = 3 to infinity (infinity refers to a circle).
In an embodiment of the invention, a cathode or an anode of a system of the invention may independently have various shapes such as but not limited to sphere, cubical, conical, parallelepiped, parabolic, hyperbolic, elliptic, disc-shaped, wire-grid, wire- mesh, wire-loop or any variation or combination thereof.
In an embodiment of the invention, systems of the invention provides for a power supply unit which may include, but is not limited to, application of high voltage or by application of time varying voltage also known as AC (alternating current) voltage or F (radio frequency) energy or modulated voltages, offset voltages, superimposed voltages or any combination thereof. In an embodiment of the invention, the pressure maintained in a confinement could be any pressure suitable for operation of the device. The suitability of the pressure is determined experimentally based on the fusion rate.
In an embodiment of the invention, systems of the invention further provides for electromagnetic radiation for gas excitation; or acceleration of particles either as constant flux, or as time varying flux of particles; or electromagnetic radiation or any combination thereof.
In an embodiment of the invention, the pressure maintained in a confinement could be any pressure suitable for operation of the said device.
In an embodiment of the invention, the pressure maintained in a confinement of the systems of the invention may be higher than 10 microns (1 x 10" Torr), preferably around 100 mTorr, more preferably around 1 Torr, most preferably closer to or higher than the atmospheric pressure (760 Torr).
In an embodiment of the invention, the system may additionally or optionally be provided with a magnetic field generator for applying a constant or time varying magnetic field in a direction which may be substantially along a principle axis, and an annular plasma layer that comprises a circulating beam of ions. In an embodiment of the invention, the said magnetic field generator may comprise a current coil. The system may further be provided with mirror coils that may increase the magnitude of the applied magnetic fields at the end of the confinement to reflect ions away from the chamber walls.
In an embodiment of the invention, the magnetic field may be generated by various materials such as but not limited to coils; or electromagnets; or permanent magnets; or electromagnets; with ferromagnetic, or diamagnetic material as core or any combination thereof. In an embodiment of the invention, the system for accelerating particles may have a straight line configuration which may be fabricated as segments that can be arranged in parallel or curvilinear shapes.
In an embodiment of the invention, the confinement or one or more cathode part or one or more anode part may optionally or additionally be of a curvilinear shape which may include but is not limited to curved, spiral, zig-zag, helical, Fibonacci spiral, Fermat curve, or any combination thereof.
In an embodiment of the invention, the cathode part or the anode part in accordance to the system may independently be located at uniform or non-uniform intervals or distances or gaps.
In an embodiment of the invention, the intervals or distances or gaps between the cathode part and the anode part may be determined additionally or optionally based on the pressure inside the confinement, or the material of the confinement, or the material of the anode part or the cathode part, applied voltages, applied frequencies or any combination thereof.
Figures 13a, 13b, and 13c illustrate various schematic drawings of a spherical IEC device (300) in accordance with the system of this invention. These various schematic drawings depict variations in the configuration / assembly of the spherical IEC device with various combinations of insulating material covering the electrodes.
In accordance with an embodiment of this invention, there is provided at least an anode part (314) and at least a cathode part (316).
In accordance with yet another embodiment of this invention, there is provided at least an insulator (318) between two adjacent electrodes. This prevents a direct path for electricity to flow between electrodes.
Reference number 320 refers to current leads. Reference numeral 322 refers to vacuum chamber in which at least an anode part (314) and at least a cathode part (316) are enclosed.
Figure 13a illustrates a schematic embodiment of a spherical IEC device, wherein at least some part of the anode is covered by an insulator. The outer grid can be made of insulated wires (or discs/plates) where in at least some part of it may be covered by an insulator or is a solid or is a solid conductor, or a solid insulator or solid conductor with insulation on its inner surface. Insulation such as various ceramic coatings (alumina, silicon nitride etc) may be used. This coating prevents a direct current path between the central cathode and the outer anode. An RF signal is applied to the insulated anode to generate ionization in its vicinity. The chamber itself could either be grounded (as shown) or could be left floating. The device may be operated in either pulsed mode, where a high voltage pulse is applied to the cathode or in steady state mode, where a constant high voltage is applied to the central cathode. RF signal can also be imposed on the cathode, where in the RF signal is overlaid on the high -Ve (negative) voltage or the pulsed signal applied to the cathode. The same is true for the anode as well. This distribution of voltages between the anode and cathode reduces the electric field stresses on the insulators.
Figure 13b illustrates a schematic embodiment of a spherical IEC device, wherein the at least a cathode part is an insulated at least a cathode part. The cathode is made of insulated wire mesh, or is a solid target with insulated coating on it. In this mode the device can be operated only in pulsed mode. RF signal is still applied to the outer grid (anode) or electron emission filaments are used to ionize the ambient gas within the vacuum chamber. Once again the chamber is either grounded or can be left floating.
Figure 13c illustrates a schematic embodiment of a spherical IEC device, wherein the at least an anode part is an insulated anode part and also wherein the at least a cathode part is an insulated at least a cathode part. Both inner and outer electrodes are coated with insulating material. Similarly the inner chamber walls could either be coated with insulating material or could be simply left bare without any coatings.
The various spherical devices as shown in Figures 13a, 13b, and 13c of the accompanying drawings show various modes of operation. These modes of operation decreases the electron currents, the most significant would be for the device represented by figure 13c of the accompanying drawings. This is because there would be no path for an electron to leave the cathode or anode and reach the other electrode. However, when pulsed high voltage is applied the ambient plasma will feel the applied voltage and will be accelerated towards the cathode until the applied field is compensated by the charge buildup on the surface of the cathode. The repeated pulses that could be applied to the cathode would ensure an average fusion rate in the chamber depending on the pulse repetition rate.
In accordance with an embodiment of this invention, there is provided a spherical chamber (312). The IEC device of this system comprises this spherical chamber. The anode and cathode parts are located inside this spherical chamber. The spherical chamber may be made from an insulating material such as but not limited to glass, quartz, or ceramic or a semiconducting material such as but not limited to silicon or germainium or any conductor or any combination thereof.
Figure 14(a) shows a set of coils (324) or simply a single coil that is embedded within the glass outer vacuum chamber (312). An RF outer signal (326) (few Hz to hundreds of GHz frequency) is applied to the coil (324). Since the coil is closer to the inner wall, it would couple with the plasma generated within the chamber and generate a uniform plasma within the chamber (312). Furthermore, the coils need not be directly embedded into glass, they could simply be sandwiched within a groove on either glass enclosure (inner or outer). The coils could be hollow tubes that could be cooled through forced convection if necessary. Such a cooling system would remove the unnecessary heat from the system. Either a steady state HV or a pulsed HV signal is applied to the cathode and the ions from the plasma get accelerated towards the cathode and cause fusion either with recirculating ions or the ambient background gas. Furthermore, RF signal may also be applied to the cathode either separately or overlaid on the cathode voltage (steady state or pulsed). In other words the cathode voltage could be modulated as desired.
Figure 14(b) shows a similar configuration as figure 14(a), but the outer grid wires (324) are placed outside the glass/quartz chamber walls (312). This would still cause the RF power (326) to couple with the plasma inside the chamber (312). However, at lower frequencies (few kHz frequency) the coils might generate plasma outside the chamber which is undesirable. Hence high frequency operation might be necessary in this mode, although it does not preclude the low frequency operation. Either of these configurations would require an outer metal enclosure that doesn't have to be vacuum sealed, but would have to at least be a faraday cage to prevent RF signals from escaping the device. The major advantage of this configuration is that there is no direct path for the ions or electrons from one electrode to the other. This would result in decreased power consumption and hence efficient operation of the device.
Figure 15 shows an IEC device with two HV stalks (320a) supporting the cathode (316). This configuration allows a more even (symmetric) distribution of the E-fields within the chamber. Such a distribution would result in a uniform ion flow across the chamber that would improve the efficiency of the device. The ion recirculation path would be more consistent. As explained earlier, either the anode part may be insulated or the cathode part may be insulated or both may be insulated.
Figure 16 illustrates a cross-section of the HV stalk Feedthrough along with the double-cap oil seal. The HV Feedthrough chamber in figure 16 is filled with oil (high voltage standoff oil) to prevent discharge voltage from breaking down to the walls of the Feedthrough. It could also be filled with Boron Nitride powder if so chosen. However, it is of utmost importance to prevent the oil from leaking into the vacuum chamber below. In the first configuration shown in Figure 17 a single O-ring (412) is used to prevent the oil from leaking into the chamber. A plastic cap applies downward pressure on the o-ring that squishes down and creates a vacuum seal. The radius of curvature (Ri = Central conductor radius r0) is introduced on the metal tube that holds the HV stalk. This homogenizes the E-fields around the stalk insulation and prevents premature breakdowns.
Figure 16, in this configuration two o-rings are used to hermetically seal the HV stalk and prevent the oil from leaking into the chamber. The double seal provides additional friction and also additional seal. The lower o-ring could touch the HV stalk, however, they do not have to touch the HV stalk and this could be an advantage especially if a radius of curvature has to be introduced on the tube holding the HV stalk as shown in the figure 17 of the accompanying drawings. In an embodiment of the invention, a vacuum pump placement in an IEC device is critical. Incorrect placement would be detrimental, especially if proper valves and tubes are not used. Furthermore, many devices in use today place the vacuum chamber at the bottom for ease of operation. However, a metal plate is place in front of the tube connecting the chamber to the vacuum pump, as shown in figure 18 of the accompanying drawings. This tends to slow the pumping speed. However, if a vacuum pump is placed sideways; either directly or using a bent tube, one could get better pumping speeds. Using a bent tube is better since it would prevent the electron or ion beams from directly reaching the pump. Furthermore, any dust particles or pieces of loose structural material will not reach the pump if a bent tube is used or if the position is not at the bottom where the gravity would direct the particles towards the pump. Furthermore, any dust particles or pieces of equipment that might fall into the confinement will not reach the pump if a bent tube is used.
The said system also improves the operation at lower pressure by mitigating or eliminating high voltage breakdown. This is accomplished by providing a high voltage insulation to prevent a direct pathway for the electrons between the electrodes or between the electrodes and the confinement.
The present invention also improves the operation at lower pressures (below 10~2 torr) by mitigating or eliminating high voltage breakdown. This is accomplished by providing a high voltage insulation to prevent a direct pathway for the electrons between the electrodes or between the electrodes and the ground.
In accordance with a method of functioning of the system of this invention, mean free path calculations are explained below:
The following simplifications are done to aid in the computation of the fusion rate (flux) from the proposed device:
1. Both species of particles have the same radius, 'a'.
2. The background particles of type 1 are slow and can be considered stationary with respect to the type 2 particles. 3. Type 2 may be charged; the mutual attraction between the uncharged and charged particles is small.
4. The E-field applied is uniform and it accelerates only the type 2 particles.
5. As the test particles scatters off the background particles, it will move along random directions, but is eventually guided by the ambient E- fields.
6. The test particle will collide with every background particle of type 1, the centre of which lies on approximately a cylinder having a cross-sectional area, 'σ'. This cylinder will be irregular, with a kink in its axis wherever the test particle has collided with a background gas atom.
7. Collisions occur at the end of one mean free path.
Consider a gas consisting of elastic hard spheres of type 1 into which a test particle of type 2 with final velocity V is introduced.
In a time interval, 't' a test particle starting with zero initial velocity is accelerated by the ambient E-fields.
F = Eq = ma (10) The acceleration a = Eq/m (1 1)
The distance covered by the particle in time 't' is calculated from
1 2 Eq 2
-at =—t
2 2m (12)
This is the length of the cylinder and its cross-sectional area σ as it collides with other particles, the centres of which lie on the surface of this cylindrical volume.
If there are ni particles of type 1 per unit volume, the number with centres on the cylinder swept out by the test particle is equal to the number of collisions, and is given by the product of this number density and the volume of the cylinder swept out is given by Number of collisions = η1σ
This is the number of elastic collisions that would occur if the applied E-field were low.
Since collisions occur at the end of one mean free path, we may obtain the final velocity of the particle accelerated in the electric field prior to collision.
Eq
(14)
2m where u (initial velocity) = 0, and E is a function of grid separation distance 'x', E = E(x)
For uncharged particles the velocity in eqn.(5) is given by a Maxwellian distribution, and the cross-section σ in eqn.(4) is often velocity dependent.
An energy dependent reaction rate coefficient similar to <σν> is given by:
1 p00
< σν >=— \ (v)vf(v)dv
n J- (15)
Where fly) is the Maxwellian distribution given by:
Figure imgf000040_0001
The above function is not applicable to the present situation as the velocity is no longer independent of direction. It is entirely dependent on the magnitude and direction of the applied E-field.
Figure 19 illustrates a parallel plate anode and cathode arrangement. The initial ions impinging a slab of neutrals undergo nuclear fusion reactions. When one particle of type 1 (ion) hits a particle of type 2 (neutral), assuming that the chamber pressure is adjusted to optimize the mean free path such that the ions are accelerated to a high potential within one mean free path and that would lead to nuclear fusion.
The flux of particles interacting with the slab that survive on the other side, moving towards the negative plate, is given by
Τ, = Τ0αΧ (17) where, 'X' is the distance from the point of interaction to the cathode, a depends on the reaction cross-section (σ), the neutral number density of the gas (n), ionization fraction (ξ), and the direction (angle of release) of the ions (θ' = 2π/θ, the fraction of the angle in which the ions are released, see figure 2).
Figure imgf000041_0001
Where n = neutral density in m"3,
Assuming that the ions are born at the surface of the anode,
In the second slab, we have x = L - λ m eqn (17)
Hence,
Γ2 = T0a{L - X).
Γ3 = Toa(L - 2A)
TN = roa[L - (N - l)A] However, the total flux reaching the cathode is given by rr =∑r, = r ∑[z - (N-i) ]
1 1 (20)
Where N = L/λ (nearest integer rounded to lower value).
The aim, now, is to determine the dependence on the angle Θ in equation 20.
If it is assumed that the particles are scattered upon collision, one will have to take into consideration the angle at which the particles are released. In the figure 2, the angle Θ represents the maximum angle at which ions are born and can still interact with neutrals in the chamber. Any ions born at an angle greater than this value are lost and will not reach the cathode. Although some of the ions would still cause reactions prior to leaving the enclosed region, the assumption we made give us a lower limit to the fusion reactions that we would observe from the device.
The calculations are now performed in 2D:
Figure 20 illustrates a 2D representation of parallel plate configuration, showing the maximum angle of release (after a fusion event). h
Where Θ, = tan"1 (21)
(L - mi? )
nii = 1, 2, 3 (L/λ) we observe that when n; = L/λ we have Θ; = 90°
Substituting eqn.(21) into eqn. (20) we have ΓΓ - {mi - 1)1]
Figure imgf000043_0001
Y0n 2, ( L - {m^
Figure imgf000043_0002
Where N = L/λ (approximated to the nearest lower integer).
In 3D, the flux is computed by assuming concentric spherical shells. These calculations are the closest to the physical system and are provided here to show approximately how the system behaves. The original system could differ in its performance from the sequence of steps described herein, but the description provided here is only to promote a basic understanding of the performance of the device.
Figure 21 illustrates a 3D representation of spherical IEC configuration, showing the electrodes, chamber, the mean free path and the concentric distribution of ions within the device.
Volume of the shell = ^
The number of particles in this volume number density (n) x volume
Figure imgf000043_0003
, = YoaR Y2 = Y^a(R - A) Γ3 = Yo"a(R - 2A)
YN = Y0 N'a{R - NX) where N = (R r)/x
(23) However, Γ0 is dependent on ionization fraction 'ξ', the density (n) and volume (V) given by:
Figure imgf000044_0001
Similarly, for the second concentric spherical shell we have,
Figure imgf000044_0002
And so on.
Figure imgf000044_0003
Equation (7) can be generalized as follows:
= To N'a(R - Νλ) = ηξ—[ϋΐ - (Νλ)3 ] · a - (R - Νλ) where α = η,σ.θ
Assuming near perfect convergence, then θ « 2π, hence
Figure imgf000044_0004
For the region within the cathode of radius 'r' there is no electrostatic potential to accelerate the ions and hence the flux is dependent on the initial conditions (initial flux entering the region). Further, the ions converging towards the centre will see an electrostatic space charge buildup that will slow down the ions. However, this space charge will not have any effect on the charge-exchanged neutrals. Ignoring the slowdown very close to the geometric centre of the device, the flux into the cathode can be calculated as follows: Tc=T1 +T2+... + TN=^TN
» (27)
This flux enters the cathode region and the resulting flux emanating from the cathode region as a result is given by:
Γ · V..
r ■ Γ
3 (28)
The total flux (number of fusion reactions) from the spherical chamber is then given by the sum of equations (11) & (12).
Figure imgf000045_0001
An
• ([R3-(N )3]-(R-N))
Figure imgf000045_0002
This is the minimum flux to be expected from the device during a single pulse of sufficiently high voltage. Several observations could be made from this equation. Firstly, the total flux is directly proportional to (at least):
1. The square of the density (n)
2. The ionization fraction (ξ)
3. Cube of the radius of the cathode (r) and
4. 4th power of the chamber radius ( )
5. Since the mean free path decreases with increasing applied voltage, the number of steps (N) increases and so will the flux. It is important to understand that the above equation (29) gives the lower limit of the possible neutron rate for a sufficiently high voltage applied at sufficiently high ramp rate. Depending on the gas used, chamber pressure, applied voltage, applied frequency, electrode material, chamber material and ionization source, the performance of the device will vary and can be accordingly designed.
Furthermore, the ions that slow down at the centre of the cathode form a plasma target for the oncoming ions and charge exchanged neutrals. Although this convergence has been ignored in the present calculations, the net result would only increase the final flux tally.
The inherent assumption in the above derivation is that the chamber dimension is comparable to one Debye length or larger, given by: f KT
R≥An
4me j (30)
Since the applied voltage pulse is in several hundreds of kilovolts (sometimes as high as several million volts), this would mean that a relatively high density is possible in a modest chamber dimension. A higher neutral density is desirable because the number of reactions increase with increasing density at higher applied voltage, as stated earlier.
For the Debye shielding to be statistically valid, the minimum density of the particles is given by:
Νη =— ηλ 1380 ^
3 n (31)
where Te is in °K.
One of the reasons for the difficulty in achieving very high voltages is not possible in the IEC devices currently under investigation around the world is due to breakdown between the grids or between the grids and the chamber walls. Moreover, the electron current from the cathode also increases with the applied voltage in these devices.
In one embodiment of the present invention, the grids are covered with insulating material. This will prevent the direct path for electrons from the electrode to other electrodes or the chamber walls. However, the electrons would slow the ions as the charge builds up. To compensate for this the ramp rate of the applied high voltage should be very high. The exact values depend on several factors such as but not limited to chamber pressure, chamber dimensions, chamber material, grid dimensions, grid material. These parameters can be determined experimentally by those skilled in the art.
In another embodiment of the invention the inside walls of the confinement chamber is covered with or are made of insulating material. The ionizing coils are placed outside the chamber and these coils electromagnetically couple with neutrals within chamber and ionize them. This way, the external coils are completely isolated from the central electrode and very high voltages can be applied to the central electrode without causing a breakdown. The breakdown voltage of the material used as insulator between the electrodes or between the electrodes and the chamber or coils would determine the maximum applicable voltage in the chamber. The high voltage stalk is however designed to at least withstand the applied voltages.
In an embodiment of the invention, some electrodes have high voltage, while others have RF voltage applied to them interchangeably.
In an embodiment of the invention, the system for accelerating particles in a curvilinear source configuration.
In an embodiment of the invention, the system for accelerating particles in an elongated zone or multiple zone segments in the case of a curvilinear geometry within a reactor vessel.
In an embodiment of the invention, various and multiple voltages or RF signals of various shapes; in phase or out of phase, with or without delay, modulated or unmodulated between multiple signals, may additionally or optionally applied concurrently, simultaneously or in parallel to the cathode part or the anode part or the confinement or any combination thereof.
The term "spherical" used in describing the shape of the electrodes or the confinement also includes other variations of this shape such as but not limited to elliptical, elongated, hyperbolic, parabolic, cubic, cuboid, or any other closed or open shape that promotes the particle acceleration between the electrodes or between the electrodes and the confinement.
In an embodiment of the invention, the cathode part or the anode part of the systems in accordance with the invention may be reversed to change the cathode part into anode part and anode part into cathode part.
The term "particles" which may be accelerated using one or more of the systems of the present invention may include but is not limited to molecules, atoms, negatively charged particles, positively charged particles, protons, photons, electrons, metastable particles, atomic nuclei, or any combination thereof.
The term "electrode" for the purpose of this invention may include but is not limited to a cathode part, an anode part, or any combination thereof.
The term cathode part represents any part that is at relatively lower voltage compared to another electrode in the system.
The term anode part represents any part that is at relatively higher voltage compared to another electrode in the system.
The term alternately placed include but is not limited to any of individual or collectively placed arrangement of electrodes in the system. For instance, electrodes with ascending or descending voltages could be placed next to each other.
The process steps, method steps, protocols or the like may be described in a sequential order, such processes, methods and protocols may be configured to work in alternate orders. In other words, any sequence or order of steps that may be described does not necessarily indicate a requirement that the steps be performed in that order. The steps of processes described herein may be performed in any order practical. Further, some steps may be performed simultaneously, in parallel, or concurrently.
The term "alternately placed" includes but is not limited to any of the individually placed or collective arrangement where electrodes individually or collectively in groups are placed in the system. For instance, electrodes with ascending or descending voltages could be placed next to each other.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises" or "comprising," when used in this specification, specify the presence of stated features, integers, steps, operations, elements, or components, but do not preclude or rule out the presence or addition of one or more other features, integers, steps, operations, elements, components, or groups thereof.
The aim of this specification is to describe the invention without limiting the invention to any one embodiment or specific collection of features. Person skilled in the relevant art may realize the variations from the specific embodiments that will nonetheless fall within the scope of the invention.
It may be appreciated that various other modifications and changes may be made to the embodiment described without departing from the spirit and scope of the invention.
Example:
A cylindrical confinement is proposed where the anode parts and cathode parts are wire loops. A coil of wire which may also be called the "guard wire" surrounds the wire loops. Current flowing through the guard-wire protect the anode parts and cathode parts from ion bombardment by deflecting them away from the wire loops as they approach the wire loops. A high power in the form of F voltage is applied to the wire loops, while currents continue to flow across the wire loops. The length of the cylindrical confinement has been extended by and alternate anode parts and cathode parts has been placed along the cylinder. Extending the cylinder on either end beyond the anode parts and the cathode parts allows the ions to re-circulate in the region rather than and reduce loss through collisions with the walls of the cylinder.

Claims

I CLAIM,
1. A system for accelerating particles owing to a potential difference, said system comprising,
a) at least one cathode part adapted to form at least a cathode electrode;
b) at least one anode part adapted to form at least an anode electrode;
characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) at least an insulator between two adjacent electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) a confinement adapted to house said electrodes and said insulator; and e) at least one power supply unit.
2. A system for accelerating particles owing to a potential difference, said system comprising,
a) at least one cathode part adapted to form at least a cathode electrode; b) at least one anode part adapted to form at least an anode electrode;
characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) at least an insulator between two adjacent electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) a confinement adapted to house said electrodes and said insulator; and e) at least one power supply unit;
wherein a pressure is maintained with the said confinement.
3. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said confinement is maintained at pressure lower than atmospheric pressure.
4. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement is maintained at pressure higher than atmospheric pressure.
5. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement is maintained at atmospheric pressure.
6. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said pressure maintained in said confinement of said system is any pressure at which the device produces radiation.
7. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising a cylindrical chamber adapted to be said confinement.
8. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said confinement is enclosed within a second confinement adapted to reflect light escaping from the said confinement of the system.
9. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said at least a electrode part is an insulated electrode part.
10. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said electrodes being insulated solid or hollow metal loops or insulated solid or hollow metal strips
1 1. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein the said system for accelerating particles has a straight line configuration.
12. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said system being a a non-linear cylindrical confinement, adapted to follow a shape selected from a group of shapes comprising curved shapes, spiral shapes, zig-zag shapes, helical shape, helical shape with varying pitch and / or radii, Fermat curve, Fibonacci spiral, and the like.
13. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein wherein said high power supply unit supplies voltages or radio frequency signals selected from a group consisting of in phase, out of phase, delayed, without delay, modulated between multiple signals, and unmodulated between multiple signals.
14. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising signal generating means adapted to generate signals for use by said system, said signals being selected from a group of signal types consisting of unmodulated signals, modulated signals, modulated signals with multiple frequencies applicable to electrodes simultaneously, modulated signals with multiple frequencies applicable to electrodes separately, modulated signals with intermixed frequency signals, in phase signals, out of phase signals, pulse waveforms, waveforms applied to offset voltages, offset by different voltages (AC or DC) and any combination thereof.
15. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement being a conducting material or non-conducting material or partial or semi conducting material based confinement.
16. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein each of said electrodes being a purely conducting material or purely conducting material covered with non-conducting material or partial or semi conducting material, based electrode.
17. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprise a spherical chamber adapted to be said confinement.
18. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said electrode being surrounded by a 'feed-through', which is filled with matter which have high standoff voltage.
19. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said electrode being surrounded by a 'feed-through', which is filled with matter which have high standoff voltage, said feed-through comprising a material adapted to prevent leakage, said material being selected from a group consisting of an O-ring, a packing, a toric joint, a gasket, a mechanical seal of any viscoelastic, and an elastic material.
20. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said confinement is a confinement chamber made of transparent or translucent material.
21. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said shape of electrodes is selected from a group consisting spherical, circular, cylindrical, cubical, cuboid, conical, elliptical, vertically elongated sphere, horizontally elongated sphere, hyperbolic, parabolic, parallelepiped, and any combination thereof optionally having rounded edges.
22. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said electrodes are made from complete or partial metal discs, wire-grid, wire-mesh, wire-loop and any combination thereof, wherein the said electrodes is optionally covered with at least one layer of a material selected from insulator, conductor and semiconductor.
23. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said at least an anode part and at least a cathode part is are optionally electrically conductive and electrically connected.
24. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said at least an anode part and at least a cathode part is selected from sheets of metal, a coil, wire loops, several loops of grids insulated solid metal loops, insulated hollow metal loops, insulated solid metal strips, and insulated hollow metal strips optionally connected together and placed next to each other.
25. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said at least an anode part and at least a cathode part are electrically conductive and electrically connected parts enabled to induce direction of current selected from a group of combination of directions consisting of clockwise flow and anticlockwise flow, with said parts having same directions of flow or different directions of flow and a combinations of directions of flow.
26. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising radio frequency ( F) signal generating means adapted to generate RF signals for use by said system such that a displacement current flows between said electrodes for keeping said system and device operational.
27. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising an extended confinement provisioned by increasing its length and placing electrodes such that there is an alternative placement of said anode part and said cathode part placement along said confinement, such that the distance of separation between said anode part and said cathode part is governed by a distance separation factor selected from a group comprising gas composition, chamber pressure, applied voltage, applied frequency, electrode dimentions, electrode material, chamber material and any combination thereof.
28. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein voltage selected from RF voltage, pulsed voltage, direct current (DC) voltage, and any combination thereof being applied to the said electrodes.
29. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising a reflector plate adapted to be located at both ends of said confinement to help confine plasmas.
30. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising electrodes spaced apart from each other in a pre-defined manner of spacing for effective functioning of said system in said confinement, said spacing being determined by a group of parameters consisting of gas, chamber pressure, chamber material, applied voltage, applied frequency, electrode dimensions and electrode material.
31. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said electrodes are linearly staggered electrodes in said confinement, characterised in that, each of said cathode electrodes being offset, linearly, to an operative top part of said confinement with reference to the axis of the confinement and each of said anode electrodes being offset, linearly, to an operative bottom part of the confinement with reference to the axis of said confinement.
32. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said electrodes are linearly staggered electrodes in said confinement, characterised in that, each of said anode electrodes being offset, linearly, to an operative top part of said confinement with reference to the axis of the confinement and each of said cathode electrodes being offset, linearly, to an operative bottom part of the confinement with reference to the axis of said confinement.
33. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said electrodes are angularly staggered electrodes in said confinement, characterised in that, each of said cathode electrodes being offset, angularly, to a pre-determined angle with reference to the axis of said confinement and each of said anode electrodes being offset, angularly, with reference to the axis of said confinement.
34. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein various components of the said system are less than 100% transparent.
35. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein various components of the said system are cooled through forced convection.
36. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said electrodes are comprised of shapes having cross-sections selected from a group of cross- section shaped consisting of conical, helical, cube, rounded cube, rounded cuboid, annulus, any of the n-sided polygon, where n = 3 to infinity (infinity corresponds to a circle).
37. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement being a cylindrical confinement is a linear cylindrical confinement.
38. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising magnetic fields around said confinement in order to keep the ions from hitting various surface within the said confinement.
39. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement being a cylindrical confinement such that different cylindrical devices are used in combinations for use with different gas mixtures to produce a spectrum of neutrons.
40. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising RF signal generating means adapted to generate RF signals for use by said system, said RF power being used is selected from a group of frequencies consisting of single frequency and a mixture of several frequencies super imposed or applied to different sets of coils along said chamber.
41. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said at least an anode part comprising a positive voltage applied to said at least an anode part and said at least a cathode part comprising a negative voltage applied to said at least an cathode part, in order to divide the voltage between two electrodes and in order to reduce stress on insulators.
42. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising coils adapted to generate RF plasma and / or magnetic fields being embedded inside or outside the said confinement, said confinement being made of insulating, conducting or semiconducting material.
43. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising coils adapted to generate RF plasma and / or magnetic fields.
44. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising steady state voltage supply unit adapted to provide steady state voltage to said at least a cathode part.
45. A system for accelerating particles where at least a cathode part or at least a anode part or the confinement is covered by insulating material that helps high voltage operation wherein said pressure maintained in the confinement is determined by the desired operational parameters applied voltage, applied frequency, dimensions of chamber, dimensions of the electrodes.
46. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising pulsed high voltage supply unit adapted to provide pulsed HV to said at least a cathode part.
47. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising coils adapted to generate RF plasma and / or magnetic fields to said at least a electrode part, whether separately or overlaid on the electrode voltage (steady state or pulsed).
48. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising coils adapted to generate RF plasma and / or magnetic fields being embedded outside said confinement, said confinement being a chamber confinement made of insulating material.
49. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising coils adapted to generate RF plasma and / or magnetic fields being sandwiched within a groove between an inner insulator chamber confinement and an outer insulator chamber confinement.
50. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement comprises a single light source or several such sources of sufficiently high energy placed in close vicinity of said chamber, said light from said sources being adapted to ionize the ambient gas within said chamber.
51. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement comprises a first chamber a second chamber, said second chamber being adapted to surround said first chamber.
52. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement comprises a first chamber a second chamber, said second chamber being adapted to surround said first chamber, and, wherein said second chamber being coated with reflecting material to reflect back light escaping from said first transparent or translucent confinement chamber.
53. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising an outer reflecting enclosure, the said reflecting enclosure is a reflector of light that impedes radiation from leaving the said system.
54. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said system being filled with gas.
55. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 , wherein said system being filled with gas, the said gas being selected from a group of gases consisting of air, Deuterium (D), Tritium(T), DT, D2, T2, Helium, any molecule represented by CaH DcTdAAeBBfCCgDDhEEiFFjGGkHHiIImJJnKK0LLpMMqN r (where C is carbon, D is deuterium, T is tritium, H is hydrogen, the symbols AA, BB, CC, DD, EE, FF, GG, HH, II, JJ, KK, LL, MM, and N represent either same or different element(s) or their isotopes from the periodic table that form a chemical bond with the remaining elements in the said compound, with the small letters a,b,c,d,e,f,g,h,i,j,k,l,m,n,o,p,q,r are integers that take any value from 0 to 30 representing the number of atoms of the said element, the said compounds is prepared using any other combination of isotopes of the said elements and could be mixtures of more than one gas or could be fine particles suspended in the fluid medium, and any combination thereof.
56. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said confinement having insulators around at least one electrode parts to mitigate the high voltage breakdown at any chamber pressure.
57. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said at least an anode part is an insulated at least an anode part.
58. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said at least a cathode part and said at least an anode part is an insulated at least a cathode part and an insulated at least an anode part, respectively.
59. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising a pulsed high voltage generation means adapted to apply pulsed high voltage to said system.
60. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising a spherical chamber adapted to be said confinement, said spherical chamber being made from a material selected from a group of materials consisting of insulator selected from of insulator(s) or conductor(s) or semiconductor(s) and a combination thereof.
61. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising an outer metal enclosure that need not be vacuum sealed, but is a reflector of light selected from a Faraday cage to prevent RF signals from escaping said system.
62. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system comprising a plurality of high voltage stalks supporting said at least an electrode part.
63. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 wherein said at least an electrode part or said at least the confinement part is covered with insulating material that helps high voltage operation.
64. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said pressure maintained in the confinement is determined by the amount of radiation produced by the device.
65. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system has at least one vacuum pump that helps maintain the desired pressure by increasing or reducing the pressure within the confinement.
66. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1, wherein said system has at least one vacuum pump, the said vacuum pump is placed away from the bottom position of the chamber.
67. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 wherein, said system has at least one fluid pump that helps maintain the desired pressure. The said fluid pump could either pressurize the said confinement to increase the pressure within the confinement or evacuate it to reduce the pressure within the confinement.
68. A system for accelerating particles owing to a potential difference created by alternately placed electrodes, as claimed in claim 1 wherein, said system has at least one fluid pump, the said fluid pump is placed away from the bottom position of the chamber.
69. A method for accelerating particles owing to a potential difference, said method comprising the steps of:
a) providing at least one cathode part adapted to form at least a cathode electrode;
b) providing at least one anode part adapted to form at least an anode electrode;
characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
c) providing at least an insulator between two adjacent electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
d) applying high power to at least an electrode part, wherein the said high power is supplied through a power supply unit; and
e) creating a potential difference between the cathode part and the anode part; wherein a particle is accelerated towards or away from a focal point of the confinement or the electrodes.
70. A method for accelerating particles owing to a potential difference, said method comprising the steps of:
a) providing at least one cathode part adapted to form at least a cathode electrode;
b) providing at least one anode part adapted to form at least an anode electrode;
c) characterised in that, said at least one cathode part and said at least one anode part are alternatively placed electrodes;
d) providing at least an insulator between two adjacent electrodes, thereby preventing a direct path for electricity to flow between said electrodes;
e) maintaining a pressure which is near atmospheric pressure or higher, within a confinement; f) supplying electricity through at least one surrounding material, wherein surrounding material is selected from a group consisting of conducting material, non-conducting material, and partial or semi conducting material; g) applying high power to at least cathode part, wherein the said high power is supplied through a power supply unit; and
h) creating a potential difference between the cathode part and the anode part; i) wherein a particle is accelerated towards or away from a focal point of the confinement or the electrodes.
PCT/IB2012/054717 2011-09-13 2012-09-11 Systems and methods for accelerating particles WO2013038335A2 (en)

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